WO2020045897A1 - Phthalonitrile-based resin having improved impact strength - Google Patents

Phthalonitrile-based resin having improved impact strength Download PDF

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Publication number
WO2020045897A1
WO2020045897A1 PCT/KR2019/010708 KR2019010708W WO2020045897A1 WO 2020045897 A1 WO2020045897 A1 WO 2020045897A1 KR 2019010708 W KR2019010708 W KR 2019010708W WO 2020045897 A1 WO2020045897 A1 WO 2020045897A1
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Prior art keywords
group
formula
compound
phthalonitrile
independently
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PCT/KR2019/010708
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French (fr)
Korean (ko)
Inventor
이승희
김상우
김영대
고은호
Original Assignee
주식회사 엘지화학
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Priority claimed from KR1020190102574A external-priority patent/KR102218559B1/en
Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority to US16/977,379 priority Critical patent/US11932727B2/en
Priority to EP19855813.2A priority patent/EP3741791B1/en
Priority to CN201980017402.3A priority patent/CN111819221B/en
Priority to JP2020545659A priority patent/JP6935119B2/en
Publication of WO2020045897A1 publication Critical patent/WO2020045897A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/02Polyamines
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/02Polyamines

Definitions

  • the present invention relates to a phthalonitrile resin.
  • Phtharonitrile-based resins are known as thermosetting resins excellent in heat resistance and flame retardancy.
  • the resin composition in which phthalonitrile-based resins and additives such as glass fibers and carbon fibers are mixed may be used as a durable material for airplanes, ships, automobiles, and the like.
  • Phtharonitrile-based resins are generally formed by polymerization and high temperature curing by applying a phthalonitrile compound having two or more phthalonitrile groups and a curing agent thereof.
  • the phthalonitrile compound has many aromatic groups and has high rigidity and large molecular weight.
  • the prepolymer formed by the mixture of the phthalonitrile compound and the curing agent or by reaction of the mixture has a very narrow process window.
  • the process window is a measure of the processability of the resin, the processing temperature (T p ) and the temperature at which the prepolymer formed by the reaction of the mixture of the phthalonitrile monomer and the curing agent or the mixture is present in a processable state and curing It may be expressed as an absolute value of the difference T c -T p of the temperature T c .
  • the phthalonitrile resin has a disadvantage that the mechanical properties such as impact strength are very weak because the phthalonitrile resin has a hardened structure by the triazine produced through high temperature curing.
  • the present invention is to provide a phthalonitrile-based resin having excellent workability and improved impact strength.
  • the phthalonitrile compound is 4,4'-bis (3,4-dicyanophenoxy) diphenyl oxide (4,4'-bis (3,4-dicyanophenoxy) diphenyloxide) represented by the formula (1)
  • 4,4'-bis (3,4-dicyanophenoxy) biphenyl represented by 2 comprises 4,4'-bis (3,4-dicyanophenoxy) biphenyl in a weight ratio of 30:70 to 90:10 doing,
  • Phtharonitrile-based resins are provided:
  • the phthalonitrile compound is 4,4'-bis (3,4-dicyanophenoxy) diphenyl oxide (4,4'-bis (3,4-dicyanophenoxy) diphenyloxide) represented by the formula (1)
  • 4,4'-bis (3,4-dicyanophenoxy) biphenyl represented by 2 comprises 4,4'-bis (3,4-dicyanophenoxy) biphenyl in a weight ratio of 30:70 to 90:10 doing,
  • Phtharonitrile-based resins are provided:
  • the phthalonitrile-based resin formed by applying the phthalonitrile compounds represented by the formulas (1) and (2) in a weight ratio of 30:70 to 90:10 exhibits excellent workability and improved impact strength. It was confirmed that.
  • the phthalonitrile-based resin having the above characteristics makes it possible to provide a durable agent that can be more suitably used in airplanes, ships, automobiles and the like.
  • the phthalonitrile-based resin may be provided from a polymerizable composition comprising a phthalonitrile compound and a curing agent.
  • PN1 4,4'-bis (3,4-dicyanophenoxy) diphenyl oxide represented by Chemical Formula 1 (4,4'-bis (3,4-dicyanophenoxy) diphenyloxide, hereinafter " PN1 ") and 4,4'-bis (3,4-dicyanophenoxy) biphenyl represented by Chemical Formula 2 (4,4'-bis (3,4-dicyanophenoxy) biphenyl, hereinafter referred to as "PN2"
  • PN2 4,4'-bis (3,4-dicyanophenoxy) biphenyl
  • the weight ratio (PN1: PN2) of PN1 and PN2 is 30:70 to 90:10, or 35:65 to 90:10, or 30:70 to 85:15, or 40:60 to 90:10. Or 30:70 to 75:25, or 50:50 to 90:10, or 30:70 to 60:40, or 40:60 to 85:15, or 40:60 to 75:25.
  • the weight ratio (PN1: PN2) of PN1 and PN2 is 30:70, or 35:65, or 40:60, or 45:55, or 50:50, or 55:45, or 60:40, or 65:35, or 70:30, or 75:25, or 80:20, or 85:15, or 90:10.
  • the PN1 is preferably contained in 30% by weight or more of the phthalonitrile compound.
  • the PN 2 is preferably contained in 10% by weight or more of the phthalonitrile compound.
  • the curing agent is not particularly limited as long as it can react with the phthalonitrile compound to form a phthalonitrile resin.
  • one or more compounds selected from the group consisting of amine compounds, hydroxy compounds and imide compounds may be used as the curing agent.
  • the amine compound, the hydroxy compound, and the imide compound mean each compound including at least one amino group, hydroxy group, and imide group in a molecule.
  • the curing agent may be an imide compound represented by Formula 3 below:
  • M is a tetravalent radical derived from an aliphatic, alicyclic or aromatic compound
  • X 1 and X 2 are each independently a divalent radical derived from an alkylene group, an alkylidene group, or an aromatic compound,
  • n is a number of 1 or more.
  • the imide-based compound represented by the formula (3) has an imide structure in the molecule, thereby exhibiting excellent heat resistance, so that it is excessively contained in the polymerizable composition or adversely affects physical properties even when the polymerizable composition is processed or cured at a high temperature. Do not cause defects such as voids that may be caused.
  • M may be a tetravalent radical derived from an aliphatic, alicyclic or aromatic compound.
  • radicals formed by leaving four hydrogen atoms in a molecule may each have a structure in which a carbon atom of the carbonyl group of Formula 3 is connected.
  • alkanes, alkenes, or alkynes straight or branched alkanes, alkenes, or alkynes can be exemplified.
  • alkanes, alkenes, or alkynes having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms may be used.
  • the alkanes, alkenes, or alkynes may be optionally substituted by one or more substituents.
  • Examples of the alicyclic compound include hydrocarbon compounds having a non-aromatic ring structure having 3 to 20 carbon atoms, 3 to 16 carbon atoms, 3 to 12 carbon atoms, 3 to 8 carbon atoms, or 3 to 4 carbon atoms.
  • Such an alicyclic hydrocarbon compound may include at least one hetero atom, such as oxygen or nitrogen, as a ring constituent atom, and may be optionally substituted with one or more substituents if necessary.
  • aromatic compound benzene, the compound containing benzene, or derivatives thereof can be illustrated.
  • compound including the benzene a compound having a structure in which two or more benzene rings are condensed while sharing one or two carbon atoms, or connected by a directly linked structure or an appropriate linker.
  • L 1 to L 8 may be each independently a single bond, —O—, an alkylene group, or an alkylidene group, and Ar 1 and Ar 2 may each independently be an arylene group.
  • the aromatic compound may include, for example, 6 to 30, 6 to 28, 6 to 27, 6 to 25, 6 to 20 or 6 to 12 carbon atoms. It may be substituted by one or more substituents if necessary.
  • the number of carbon atoms of the said aromatic compound is the number including the carbon atom which exists in the linker, when the compound contains the above-mentioned linker.
  • M may be a tetravalent radical derived from alkanes, alkenes, or alkynes, or may be a tetravalent radical derived from a compound represented by one of the following Formulas 4 to 9.
  • R 40 to R 45 are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group.
  • R 50 to R 57 are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group.
  • R 60 to R 69 are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group,
  • a single bond means a case where an atom is not present in a portion thereof. Therefore, when X in Formula 12 is a single bond, it means a case where an atom is not present in the moiety represented by X. In this case, the benzene rings on both sides of X may be directly connected to form a biphenyl structure.
  • L 5 - in L 1 to L 5 are each independently, having 1 to 12 carbon atoms, having 1 to 8 carbon atoms, or carbon atoms can be an 1 alkylene group or alkylidene of 1 to 4, wherein the alkylene group or alkylidene group is a substituted or unsubstituted It may be.
  • L 6 and L 8 may be -O-
  • L 7 has 1 to 12 carbon atoms, and 1 to 1 carbon atoms.
  • Ar 1 and Ar 2 may be a phenylene group, in which case L 6 and L 8 based on L 7 may be connected to the ortho, meta or para position of the phenylene, respectively.
  • R 70 to R 73 are each independently hydrogen, an alkyl group, or an alkoxy group, two of R 70 to R 73 may be connected to each other to form an alkylene group,
  • A is an alkylene group or alkenylene group, wherein the alkylene group or alkenylene group of A may contain one or more oxygen atoms as a hetero atom.
  • R 80 to R 83 are each independently hydrogen, an alkyl group, or an alkoxy group, and A is an alkylene group.
  • R 90 to R 99 are each independently hydrogen, an alkyl group, or an alkoxy group.
  • the tetravalent radical derived from the compound represented by the above formulas (4) to (9) is formed by directly leaving the substituents of the above formulas (4) to (9), or in the examples of the substituents, an alkyl group, an alkoxy group, an aryl group, an alkylene group or an alkenylene group
  • the hydrogen atom to which it belongs may leave and formed.
  • the tetravalent radical when the tetravalent radical is derived from a compound of Formula 4, at least one, at least two, at least three or four of R 40 to R 45 of Formula 4 form a radical or R 40
  • R 40 to R 45 of Formula 4 To a hydrogen atom of the alkyl group, alkoxy group, or aryl group present in R 45 may be released to form a radical.
  • Forming a radical in the above may mean that the site is connected to the carbon atom of the carbonyl group of Formula 4 as described above.
  • R 60 to R 69 of formula 6 are each independently hydrogen, an alkyl group, an alkoxy group or an aryl group, at least one, at least two, at least three Or more than four may form a radical linked to formula (3).
  • Each of which does not form a radical in the above may be hydrogen, an alkyl group or an alkoxy group, or may be hydrogen or an alkyl group.
  • any two of R 67 to R 69 and any two of R 62 to R 64 may form the radical, and the other substituents are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group, It may be a hydrogen, an alkyl group or an alkoxy group, or may be a hydrogen or an alkyl group.
  • the compound represented by Formula 4 may be benzene or 1,2,4,5-tetraalkylbenzene.
  • the compound represented by Chemical Formula 6 may be biphenyl, or a compound represented by any one of the following Chemical Formulas A to F:
  • the compound represented by Formula 7 may be a cycloalkane having 4 to 8 carbon atoms such as cyclohexane, a cycloalkene having 4 to 8 carbon atoms such as cyclohexene which may be substituted with one or more alkyl groups, or any one of the following Formulas G to I It may be a compound represented by the formula:
  • the compound represented by Chemical Formula 8 may be represented by Chemical Formula J or a compound in which at least one hydrogen of the compound represented by Chemical Formula J is substituted with an alkyl group:
  • X 1 and X 2 may each independently be a divalent radical derived from an aromatic compound.
  • X 1 and X 2 may each independently be a divalent radical derived from an aromatic compound having 6 to 40 carbon atoms. The divalent radical derived from the said aromatic compound is replaced by the content mentioned above.
  • X 1 and X 2 may each independently be a divalent radical derived from a compound represented by any one of Formulas 10 to 12:
  • R 100 to R 105 are each independently hydrogen, an alkyl group, an alkoxy group, an aryl group, a hydroxy group, or a carboxyl group;
  • R 110 to R 119 are each independently hydrogen, an alkyl group, an alkoxy group, an aryl group, a hydroxy group, or a carboxyl group,
  • R 120 to R 129 are each independently hydrogen, an alkyl group, an alkoxy group, an aryl group, a hydroxy group, or a carboxyl group.
  • the divalent radical derived from the compound represented by the formulas (10) to (12) is formed by directly leaving the substituents of the formulas (10) to (12), or in the examples of the substituents, an alkyl group, an alkoxy group, an aryl group, an alkylene group or an alkenylene group
  • the hydrogen atom to which it belongs may leave and formed.
  • the substitution position of the amine group based on the site linked to N in X 1 of Chemical Formula 3 may be represented by ortho ( ortho, meta or para position, and the substitution position of the amine group based on the site linked to N in X 2 of Formula 3 is also ortho, meta or para. (para) location.
  • any one of R 117 to R 119 of Formula 11 and R 112 to R 114 of Formula 11 is connected to the nitrogen atom of Formula 3 To form radicals.
  • Other substituents other than the substituents forming the radicals may each independently be hydrogen, an alkyl group, an alkoxy group or an aryl group, a hydrogen, an alkyl group or an alkoxy group, or may be a hydrogen or an alkyl group.
  • the compound represented by Formula 10 is benzene which may be substituted with at least one hydroxy group or carboxyl group.
  • the compound represented by Formula 11 may be a biphenyl which may be substituted with at least one hydroxy group or a carboxyl group, a compound which may be substituted with at least one hydroxy group or a carboxyl group while being represented by any one of Formulas A to F, or the following Formula A compound which may be substituted with at least one hydroxyl group or carboxyl group, represented by K or M:
  • the compound represented by Chemical Formula 12 is a compound represented by the following Chemical Formula N, or at least one of hydrogen of the compound represented by the following Chemical Formula N is substituted with a hydroxyl group or a carboxyl group:
  • the alkyl group may be an alkyl group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms, unless otherwise specified.
  • the alkyl group may be linear, branched, or cyclic and may be substituted by one or more substituents if necessary.
  • the alkoxy group may be an alkoxy group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms, unless otherwise specified.
  • the alkoxy group may be linear, branched, or cyclic and may be substituted by one or more substituents if necessary.
  • an aryl group may mean a monovalent moiety derived from the aforementioned aromatic compound, unless otherwise specified.
  • an alkylene group or an alkylidene group is an alkylene group or an alkylidene group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms, unless otherwise specified. Can mean.
  • the alkylene group or alkylidene group may be linear, branched, or cyclic.
  • the alkylene group or alkylidene group may be optionally substituted with one or more substituents.
  • substituent which may be optionally substituted with an aliphatic compound, an alicyclic compound, an aromatic compound, an alkyl group, an alkoxy group, an aryl group, an alkylene group, or an alkylidene group, halogen, glycine such as chlorine or fluorine Epoxy groups, such as a dill group, an epoxy alkyl group, a glycidoxy alkyl group, or an alicyclic epoxy group, an acryloyl group, a methacryloyl group, an isocyanate group, a thiol group, an alkyl group, an alkoxy group, an aryl group, etc. can be illustrated.
  • n means the number of imide repeating units and is one or more. Specifically, n is 1 to 200, 1 to 150, 1 to 100, 1 to 90, 1 to 80, 1 to 70, 1 to 60, 1 to 50, 1 to 40, 1 to 30, 1 to 20, Or a number in the range of 1 to 10.
  • the curing agent may be a compound represented by Formula C1 or Formula C2:
  • L 1 to L 8 are each independently a direct bond, -O-, or a C 1-5 alkylene group
  • Ar 1 and Ar 2 are each independently a C 6-30 arylene group
  • R 90 to R 99 each independently is hydrogen, an alkoxy group, an aryl group, a hydroxy group of a C 6-30 alkyl group, C 1-5 of C 1-5, or a carboxyl group.
  • the compound represented by Chemical Formula 3 may be synthesized according to a known method for synthesizing an organic compound, and the specific manner thereof is not particularly limited.
  • the compound represented by Formula 3 may be formed by a dehydration condensation reaction between a dianhydride compound and a diamine compound.
  • Compound represented by the formula (3) has a high boiling point, does not volatilize or decompose at high temperature, thereby maintaining a stable curability of the polymerizable composition, voids that may adversely affect the physical properties during high temperature processing or curing ( void).
  • the compound represented by Chemical Formula 3 may have a decomposition temperature of 300 ° C. or higher, 350 ° C. or higher, 400 ° C. or higher, or 500 ° C. or higher.
  • the decomposition temperature may mean a temperature at which the decomposition rate of the compound represented by Formula 3 is maintained in a range of 10% or less, 5% or less, or 1% or less.
  • the upper limit of the decomposition temperature is not particularly limited, but may be, for example, about 1000 ° C. or less.
  • the compound represented by the formula (3) is a process window of the reactive or polymerizable composition itself, i.e., melting of the polymerizable composition or the prepolymer formed therefrom by the selection of X 1 or X 2 which is M or a linker of the core. Since the difference between temperature and hardening temperature can be adjusted easily, it can act as a hardening
  • the amount of the curing agent may be adjusted in a range that can ensure the curability to be imparted to the polymerizable composition for providing the phthalonitrile-based resin.
  • the curing agent may be included in a molar ratio of 0.01 to 1.5 moles per mole of the phthalonitrile compound.
  • the process window may be narrowed, resulting in poor processability or high temperature curing conditions. And, when the molar ratio of the curing agent is lowered, the curing property may be insufficient.
  • the polymerizable composition for providing the phthalonitrile-based resin may further include an additive depending on the application field and use of the phthalonitrile-based resin.
  • the kind of the additive is not particularly limited.
  • the content of the additive may be adjusted within a range that does not inhibit the physical properties of the phthalonitrile-based resin.
  • the additives include reinforcing fibers such as metal fibers, carbon fibers, glass fibers, aramid fibers, potassium titanate fibers, celluloid fibers, sepiolite fibers, ceramic fibers, and acrylic fibers; Inorganic fillers such as barium sulfate, calcium carbonate, zirconia, alumina, zirconium silicate, and silicon carbide; Lubricants such as graphite, polytetrafluoroethylene, tungsten disulfide, molybdenum disulfide, milled carbon fiber, and the like may be applied.
  • reinforcing fibers such as metal fibers, carbon fibers, glass fibers, aramid fibers, potassium titanate fibers, celluloid fibers, sepiolite fibers, ceramic fibers, and acrylic fibers
  • Inorganic fillers such as barium sulfate, calcium carbonate, zirconia, alumina, zirconium silicate, and silicon carbide
  • Lubricants such as graphit
  • the phthalonitrile-based resin has a repeating unit formed by the reaction of the phthalonitrile compound and the curing agent of the above-described characteristics, it may exhibit improved impact strength while having excellent workability.
  • the phthalonitrile-based resin may have an impact strength of 350 MPa or more according to ASTM D256 (23 ° C.) test method.
  • the phthalonitrile-based resin is 350 MPa or more, or 350 MPa to 500 MPa, or 400 MPa to 500 MPa, or 400 MPa to 490 MPa, or 420 MPa to 490 according to ASTM D256 (23 °C) test method MPa, or 420 MPa to 480 MPa, or 430 MPa to 480 MPa, or 430 MPa to 480 MPa.
  • the phthalonitrile-based resin may have a process window of 50 ° C. or more.
  • the process window of the phthalonitrile-based resin may be 50 ° C or more, or 50 ° C to 210 ° C, or 55 ° C to 205 ° C.
  • the process window is a measure of the processability of the resin, the difference between the processing temperature (T p ) and the curing temperature (T c ) (T c -T p ), which is the temperature at which the phthalonitrile resin exists in a processable state. It can be expressed as the absolute value of.
  • the processing temperature (T p ) means a temperature at which the phthalonitrile-based resin exists in a processable state, and may be exemplified as a glass transition temperature (T g ) or a melting temperature (T m ).
  • the curing temperature (T c ) may be exemplified as an exothermic onset temp. (T o ) of the phthalonitrile-based resin.
  • a molded article manufactured using the phthalonitrile-based resin is provided.
  • the phthalonitrile-based resin makes it possible to provide a molded article having excellent impact strength.
  • Examples of the molded article include durable materials such as airplanes, ships, and automobiles.
  • the molded article may be prepared by heating a prepolymer containing the phthalonitrile-based resin to form a desired formation and then curing it. Processing and curing methods for the production of the molded article can be carried out in a known manner.
  • the phthalonitrile-based resin according to the present invention has excellent processability and improved impact strength, and thus can be more suitably used as a durable material for airplanes, ships, automobiles, and the like.
  • PN1 compound (4,4'-bis (3,4-dicyanophenoxy) diphenyloxide) represented by the following formula (1) was obtained in a yield of 91% by weight.
  • PN2 compound (4,4'-bis (3,4-dicyanophenoxy) biphenyl) represented by the following Chemical Formula 2 was obtained in a yield of 90% by weight.
  • a mixture of 75 wt% of the PN1 compound of Preparation Example 1 and 25 wt% of the PN2 compound of Preparation Example 2 was prepared.
  • the CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
  • the polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
  • a mixture of 60 wt% of the PN1 compound of Preparation Example 1 and 40 wt% of the PN2 compound of Preparation Example 2 was prepared.
  • the CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
  • the polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
  • a mixture of 50 wt% of the PN1 compound of Preparation Example 1 and 50 wt% of the PN2 compound of Preparation Example 2 was prepared.
  • the CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
  • the polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
  • a mixture of 40 wt% of the PN1 compound of Preparation Example 1 and 60 wt% of the PN2 compound of Preparation Example 2 was prepared.
  • the CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
  • the polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
  • a mixture of 30 wt% of the PN1 compound of Preparation Example 1 and 70 wt% of the PN2 compound of Preparation Example 2 was prepared.
  • the CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
  • the polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
  • a mixture of 90 wt% of the PN1 compound of Preparation Example 1 and 10 wt% of the PN2 compound of Preparation Example 2 was prepared.
  • the CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
  • the polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
  • PN1 compound of Preparation Example 1 was prepared as a phthalonitrile compound.
  • the CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
  • the polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
  • the PN2 compound of Preparation Example 2 was prepared as a phthalonitrile compound.
  • the CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
  • the polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
  • a mixture of 10 wt% of the PN1 compound of Preparation Example 1 and 90 wt% of the PN2 compound of Preparation Example 2 was prepared.
  • the CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
  • the polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
  • a mixture of 25 wt% of the PN1 compound of Preparation Example 1 and 75 wt% of the PN2 compound of Preparation Example 2 was prepared.
  • the CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
  • the polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
  • a mixture of 95 wt% of the PN1 compound of Preparation Example 1 and 5 wt% of the PN2 compound of Preparation Example 2 was prepared.
  • the CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
  • the polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
  • Test Example 1 One Nuclear magnetic resonance (H-NMR) analysis
  • Test Example 2 Differential scanning calorimetry (DSC) analysis
  • the DSC analysis was carried out in an N 2 flow atmosphere using a TA instrument company's Q20 system while heating up at a rate of temperature rise of 10 ° C./minute from 35 ° C. to 450 ° C.
  • the impact strength (IS) of the phthalonitrile-based resin was measured according to the ASTM D256 (23 °C) test method using a digital impact tester (QM (700A)). .
  • the results are shown in Table 1 below.
  • the phthalonitrile-based resin according to the embodiments it is confirmed that the process window is wide but excellent impact strength and there is no void in the resin.

Abstract

The present invention relates to a phthalonitrile-based resin. The phthalonitrile-based resin, according to the present invention, has excellent processability and improved impact strength, and thus may be more adequately used as a durable material for planes, ships, automobiles, etc.

Description

향상된 충격 강도를 갖는 프탈로니트릴계 수지Phtharonitrile-based resin with improved impact strength
관련 출원과의 상호 인용Cross Citation with Related Applications
본 출원은 2018년 8월 28일자 한국 특허 출원 제10-2018-0101457호 및 2019년 8월 21일자 한국 특허 출원 제10-2019-0102574호에 기초한 우선권의 이익을 주장하며, 해당 한국 특허 출원들의 문헌에 개시된 모든 내용은 본 명세서의 일부로서 포함된다.This application claims the benefit of priority based on Korean Patent Application No. 10-2018-0101457 dated August 28, 2018 and Korean Patent Application No. 10-2019-0102574 dated August 21, 2019. All content disclosed in the literature is included as part of this specification.
본 발명은 프탈로니트릴계 수지에 관한 것이다.The present invention relates to a phthalonitrile resin.
프탈로니트릴계 수지는 내열성과 난연성이 뛰어난 열경화성 수지로 알려져 있다. 프탈로니트릴계 수지와 유리 섬유, 탄소 섬유 등의 첨가제가 혼합된 수지 조성물은 비행기, 선박, 자동차 등에 내구재로써 사용될 수 있다.Phtharonitrile-based resins are known as thermosetting resins excellent in heat resistance and flame retardancy. The resin composition in which phthalonitrile-based resins and additives such as glass fibers and carbon fibers are mixed may be used as a durable material for airplanes, ships, automobiles, and the like.
프탈로니트릴계 수지는 일반적으로 두 개 이상의 프탈로니트릴기를 갖는 프탈로니트릴 화합물 및 이의 경화제를 적용한 중합 및 고온 경화에 의해 형성된다.Phtharonitrile-based resins are generally formed by polymerization and high temperature curing by applying a phthalonitrile compound having two or more phthalonitrile groups and a curing agent thereof.
일반적으로 상기 프탈로니트릴 화합물은 많은 방향족 그룹을 가져 높은 경직성과 큰 분자량을 갖는다. 그에 따라, 상기 프탈로니트릴 화합물과 경화제의 혼합물 또는 그 혼합물의 반응에 의해 형성되는 프리폴리머(prepolymer)는 매우 좁은 프로세스 윈도우(process window)를 가진다.Generally, the phthalonitrile compound has many aromatic groups and has high rigidity and large molecular weight. Thus, the prepolymer formed by the mixture of the phthalonitrile compound and the curing agent or by reaction of the mixture has a very narrow process window.
상기 프로세스 윈도우는 수지의 가공성을 나타내는 하나의 척도로서, 상기 프탈로니트릴 모노머 및 경화제의 혼합물 또는 그 혼합물의 반응에 의해 형성되는 프리폴리머가 가공 가능한 상태로 존재하는 온도인 가공 온도(Tp)와 경화 온도(Tc)의 차이(Tc-Tp)의 절대값으로 표시될 수 있다.The process window is a measure of the processability of the resin, the processing temperature (T p ) and the temperature at which the prepolymer formed by the reaction of the mixture of the phthalonitrile monomer and the curing agent or the mixture is present in a processable state and curing It may be expressed as an absolute value of the difference T c -T p of the temperature T c .
프탈로니트릴 수지는 고온 경화를 통해 생성되는 트리아진에 의해 견고한 경화 구조를 갖기 때문에, 충격 강도 등의 기계적 특성이 매우 약하다는 단점이 있다.The phthalonitrile resin has a disadvantage that the mechanical properties such as impact strength are very weak because the phthalonitrile resin has a hardened structure by the triazine produced through high temperature curing.
따라서, 상기 프탈로니트릴계 수지의 적용 가능 범위를 확장하기 위해서는 가공성 확보를 위한 프로세스 윈도우의 개선과 함께 충격 강도의 보완이 요구된다.Therefore, in order to expand the applicable range of the phthalonitrile-based resin, it is required to supplement the impact strength with the improvement of the process window for securing the workability.
본 발명은 우수한 가공성과 향상된 충격 강도를 갖는 프탈로니트릴계 수지를 제공하기 위한 것이다.The present invention is to provide a phthalonitrile-based resin having excellent workability and improved impact strength.
본 발명에 따르면, 프탈로니트릴 화합물 및 경화제의 반응에 의해 형성된 반복 단위를 갖는 수지로서,According to the present invention, as a resin having a repeating unit formed by the reaction of a phthalonitrile compound and a curing agent,
상기 프탈로니트릴 화합물은 하기 화학식 1로 표시되는 4,4'-비스(3,4-디시아노페녹시)디페닐옥사이드(4,4'-bis(3,4-dicyanophenoxy)diphenyloxide) 및 하기 화학식 2로 표시되는 4,4'-비스(3,4-디시아노페녹시)비페닐 (4,4'-bis(3,4-dicyanophenoxy)biphenyl)을 30:70 내지 90:10의 중량비로 포함하는,The phthalonitrile compound is 4,4'-bis (3,4-dicyanophenoxy) diphenyl oxide (4,4'-bis (3,4-dicyanophenoxy) diphenyloxide) represented by the formula (1) 4,4'-bis (3,4-dicyanophenoxy) biphenyl represented by 2 comprises 4,4'-bis (3,4-dicyanophenoxy) biphenyl in a weight ratio of 30:70 to 90:10 doing,
프탈로니트릴계 수지가 제공된다:Phtharonitrile-based resins are provided:
[화학식 1][Formula 1]
Figure PCTKR2019010708-appb-I000001
,
Figure PCTKR2019010708-appb-I000001
,
[화학식 2][Formula 2]
Figure PCTKR2019010708-appb-I000002
.
Figure PCTKR2019010708-appb-I000002
.
이하, 발명의 구현 예에 따른 프탈로니트릴계 수지에 대해 상세히 설명한다.Hereinafter, the phthalonitrile-based resin according to the embodiment of the present invention will be described in detail.
그에 앞서, 본 명세서에서 명시적인 언급이 없는 한, 전문용어는 단지 특정 실시예를 언급하기 위한 것이며, 본 발명을 한정하는 것을 의도하지 않는다.Prior to this, the terminology is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention unless expressly stated otherwise.
본 명세서에서 사용되는 단수 형태들은 문구들이 이와 명백히 반대의 의미를 나타내지 않는 한 복수 형태들도 포함한다.As used herein, the singular forms “a,” “an,” and “the” include plural forms as well, unless the phrases clearly indicate the opposite.
본 명세서에서 사용되는 "포함"의 의미는 특정 특성, 영역, 정수, 단계, 동작, 요소 및/또는 성분을 구체화하며, 다른 특정 특성, 영역, 정수, 단계, 동작, 요소, 성분 및/또는 군의 존재나 부가를 제외시키는 것은 아니다.As used herein, the meaning of "comprising" embodies a particular property, region, integer, step, operation, element, and / or component, and other specific properties, region, integer, step, operation, element, component, and / or group. It does not exclude the presence or addition of.
I. 프탈로니트릴계 수지I. Phtharonitrile Resin
발명의 일 구현 예에 따르면,According to one embodiment of the invention,
프탈로니트릴 화합물 및 경화제의 반응에 의해 형성된 반복 단위를 갖는 수지로서,As resin which has a repeating unit formed by reaction of a phthalonitrile compound and a hardening | curing agent,
상기 프탈로니트릴 화합물은 하기 화학식 1로 표시되는 4,4'-비스(3,4-디시아노페녹시)디페닐옥사이드(4,4'-bis(3,4-dicyanophenoxy)diphenyloxide) 및 하기 화학식 2로 표시되는 4,4'-비스(3,4-디시아노페녹시)비페닐 (4,4'-bis(3,4-dicyanophenoxy)biphenyl)을 30:70 내지 90:10의 중량비로 포함하는,The phthalonitrile compound is 4,4'-bis (3,4-dicyanophenoxy) diphenyl oxide (4,4'-bis (3,4-dicyanophenoxy) diphenyloxide) represented by the formula (1) 4,4'-bis (3,4-dicyanophenoxy) biphenyl represented by 2 comprises 4,4'-bis (3,4-dicyanophenoxy) biphenyl in a weight ratio of 30:70 to 90:10 doing,
프탈로니트릴계 수지가 제공된다:Phtharonitrile-based resins are provided:
[화학식 1][Formula 1]
Figure PCTKR2019010708-appb-I000003
,
Figure PCTKR2019010708-appb-I000003
,
[화학식 2][Formula 2]
Figure PCTKR2019010708-appb-I000004
.
Figure PCTKR2019010708-appb-I000004
.
본 발명자들의 계속적인 연구 결과, 상기 화학식 1 및 2로 표시되는 프탈로니트릴 화합물을 30:70 내지 90:10의 중량비로 적용하여 형성된 프탈로니트릴계 수지는 우수한 가공성을 가지면서도 향상된 충격 강도를 나타낼 수 있음이 확인되었다.As a result of continuous research by the present inventors, the phthalonitrile-based resin formed by applying the phthalonitrile compounds represented by the formulas (1) and (2) in a weight ratio of 30:70 to 90:10 exhibits excellent workability and improved impact strength. It was confirmed that.
상기 특성을 갖는 프탈로니트릴계 수지는 비행기, 선박, 자동차 등에 보다 적합하게 사용될 수 있는 내구제의 제공을 가능케 한다.The phthalonitrile-based resin having the above characteristics makes it possible to provide a durable agent that can be more suitably used in airplanes, ships, automobiles and the like.
상기 프탈로니트릴계 수지는 프탈로니트릴 화합물 및 경화제를 포함하는 중합성 조성물로부터 제공될 수 있다.The phthalonitrile-based resin may be provided from a polymerizable composition comprising a phthalonitrile compound and a curing agent.
(1) 프탈로니트릴 화합물(1) phthalonitrile compound
상기 프탈로니트릴 화합물로는 상기 화학식 1로 표시되는 4,4'-비스(3,4-디시아노페녹시)디페닐옥사이드(4,4'-bis(3,4-dicyanophenoxy)diphenyloxide, 이하 "PN1"이라 함) 및 상기 화학식 2로 표시되는 4,4'-비스(3,4-디시아노페녹시)비페닐 (4,4'-bis(3,4-dicyanophenoxy)biphenyl, 이하 "PN2"라 함)이 30:70 내지 90:10의 중량비로 포함된다.As the phthalonitrile compound, 4,4'-bis (3,4-dicyanophenoxy) diphenyl oxide represented by Chemical Formula 1 (4,4'-bis (3,4-dicyanophenoxy) diphenyloxide, hereinafter " PN1 ") and 4,4'-bis (3,4-dicyanophenoxy) biphenyl represented by Chemical Formula 2 (4,4'-bis (3,4-dicyanophenoxy) biphenyl, hereinafter referred to as "PN2" The weight ratio of 30:70 to 90:10.
바람직하게는, 상기 PN1 및 PN2의 중량비(PN1:PN2)는 30:70 내지 90:10, 혹은 35:65 내지 90:10, 혹은 30:70 내지 85:15, 혹은 40:60 내지 90:10, 혹은 30:70 내지 75:25, 혹은 50:50 내지 90:10, 혹은 30:70 내지 60:40, 혹은 40:60 내지 85:15, 혹은 40:60 내지 75:25일 수 있다.Preferably, the weight ratio (PN1: PN2) of PN1 and PN2 is 30:70 to 90:10, or 35:65 to 90:10, or 30:70 to 85:15, or 40:60 to 90:10. Or 30:70 to 75:25, or 50:50 to 90:10, or 30:70 to 60:40, or 40:60 to 85:15, or 40:60 to 75:25.
구체적으로, 상기 PN1 및 PN2의 중량비(PN1:PN2)는 30:70, 혹은 35:65, 혹은 40:60, 혹은 45:55, 혹은 50:50, 혹은 55:45, 혹은 60:40, 혹은 65:35, 혹은 70:30, 혹은 75:25, 혹은 80:20, 혹은 85:15, 혹은 90:10일 수 있다.Specifically, the weight ratio (PN1: PN2) of PN1 and PN2 is 30:70, or 35:65, or 40:60, or 45:55, or 50:50, or 55:45, or 60:40, or 65:35, or 70:30, or 75:25, or 80:20, or 85:15, or 90:10.
가공성 및 충격 강도의 향상 효과의 충분한 발현을 위하여, 상기 PN1은 상기 프탈로니트릴 화합물 중 30 중량% 이상으로 포함되는 것이 바람직하다. 다만, 상기 PN1의 함량이 너무 높아질 경우 상기 프탈리니트릴계 수지의 충격 강도가 저하될 수 있다. 그러므로, 상기 PN2는 상기 프탈로니트릴 화합물 중 10 중량% 이상으로 포함되는 것이 바람직하다.In order to sufficiently express the effect of improving the processability and impact strength, the PN1 is preferably contained in 30% by weight or more of the phthalonitrile compound. However, when the content of the PN1 is too high, the impact strength of the phthalinitrile-based resin may be lowered. Therefore, the PN 2 is preferably contained in 10% by weight or more of the phthalonitrile compound.
(2) 경화제(2) curing agent
상기 경화제는 상기 프탈로니트릴 화합물과 반응하여 프탈로니트릴 수지를 형성할 수 있는 것이라면 그 종류가 특별히 제한되지 않는다.The curing agent is not particularly limited as long as it can react with the phthalonitrile compound to form a phthalonitrile resin.
예를 들어, 상기 경화제로 아민계 화합물, 히드록시계 화합물 및 이미드계 화합물로 이루어진 군으로부터 선택된 1종 이상의 화합물이 사용될 수 있다.For example, one or more compounds selected from the group consisting of amine compounds, hydroxy compounds and imide compounds may be used as the curing agent.
상기 아민계 화합물, 히드록시계 화합물 및 이미드계 화합물은 각각 분자 내 적어도 하나 이상의 아미노기, 히드록시기 및 이미드기를 포함하는 화합물을 의미한다.The amine compound, the hydroxy compound, and the imide compound mean each compound including at least one amino group, hydroxy group, and imide group in a molecule.
바람직하게는, 상기 경화제는 하기 화학식 3으로 표시되는 이미드계 화합물일 수 있다:Preferably, the curing agent may be an imide compound represented by Formula 3 below:
[화학식 3][Formula 3]
Figure PCTKR2019010708-appb-I000005
Figure PCTKR2019010708-appb-I000005
상기 화학식 3에서,In Chemical Formula 3,
M은 지방족, 지환족 또는 방향족 화합물 유래의 4가 라디칼이고,M is a tetravalent radical derived from an aliphatic, alicyclic or aromatic compound,
X1 및 X2는 각각 독립적으로, 알킬렌기, 알킬리덴기, 또는 방향족 화합물 유래의 2가 라디칼이고,X 1 and X 2 are each independently a divalent radical derived from an alkylene group, an alkylidene group, or an aromatic compound,
n은 1 이상의 수이다.n is a number of 1 or more.
상기 화학식 3으로 표시되는 이미드계 화합물은 분자 내에 이미드 구조를 포함함으로써, 우수한 내열성을 나타내어 상기 중합성 조성물 내 과량 포함되거나, 혹은 중합성 조성물이 높은 온도에서 가공 또는 경화되는 경우에도 물성에 악영향을 미칠 수 있는 보이드(void) 등의 결함을 유발하지 않도록 한다.The imide-based compound represented by the formula (3) has an imide structure in the molecule, thereby exhibiting excellent heat resistance, so that it is excessively contained in the polymerizable composition or adversely affects physical properties even when the polymerizable composition is processed or cured at a high temperature. Do not cause defects such as voids that may be caused.
상기 화학식 3에서, M은 지방족, 지환족 또는 방향족 화합물 유래의 4가 라디칼일 수 있다. 상기 지방족, 지환족 또는 방향족 화합물에서 분자 내 4 개의 수소 원자가 이탈되어 형성된 라디칼이 각각 상기 화학식 3의 카보닐기의 탄소 원자와 연결되는 구조를 가질 수 있다.In Formula 3, M may be a tetravalent radical derived from an aliphatic, alicyclic or aromatic compound. In the aliphatic, alicyclic or aromatic compound, radicals formed by leaving four hydrogen atoms in a molecule may each have a structure in which a carbon atom of the carbonyl group of Formula 3 is connected.
구체적으로, 상기 지방족 화합물로는, 직쇄형 또는 분지쇄형인 알칸, 알켄, 또는 알킨이 예시될 수 있다. 상기 지방족 화합물로는, 탄소수 2 내지 20, 탄소수 2 내지 16, 탄소수 2 내지 12, 탄소수 2 내지 8, 또는 탄소수 2 내지 4의 알칸, 알켄, 또는 알킨이 사용될 수 있다. 상기 알칸, 알켄, 또는 알킨은 임의로 하나 이상의 치환기에 의해 치환되어 있을 수 있다.Specifically, as the aliphatic compound, straight or branched alkanes, alkenes, or alkynes can be exemplified. As the aliphatic compound, alkanes, alkenes, or alkynes having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms may be used. The alkanes, alkenes, or alkynes may be optionally substituted by one or more substituents.
상기 지환족 화합물로는, 탄소수 3 내지 20, 탄소수 3 내지 16, 탄소수 3 내지 12, 탄소수 3 내지 8, 또는 탄소수 3 내지 4의 비방향족 고리 구조를 포함하는 탄화수소 화합물이 예시될 수 있다. 이러한 지환족 탄화수소 화합물은 고리 구성 원자로서, 산소 또는 질소와 같은 헤테로 원자를 적어도 하나 포함할 수도 있으며, 필요한 경우에 임의로 하나 이상의 치환기로 치환되어 있을 수 있다.Examples of the alicyclic compound include hydrocarbon compounds having a non-aromatic ring structure having 3 to 20 carbon atoms, 3 to 16 carbon atoms, 3 to 12 carbon atoms, 3 to 8 carbon atoms, or 3 to 4 carbon atoms. Such an alicyclic hydrocarbon compound may include at least one hetero atom, such as oxygen or nitrogen, as a ring constituent atom, and may be optionally substituted with one or more substituents if necessary.
상기 방향족 화합물로는, 벤젠, 또는 벤젠을 포함하는 화합물, 또는 이들의 유도체가 예시될 수 있다. 상기 벤젠을 포함하는 화합물로는, 2 개 이상의 벤젠 고리가 하나 또는 2 개의 탄소 원자를 공유하면서 축합되어 있거나, 직접 연결된 구조 또는 적절한 링커(linker)에 의해 연결되어 있는 구조의 화합물을 의미한다.As said aromatic compound, benzene, the compound containing benzene, or derivatives thereof can be illustrated. As the compound including the benzene, a compound having a structure in which two or more benzene rings are condensed while sharing one or two carbon atoms, or connected by a directly linked structure or an appropriate linker.
상기 2개의 벤젠 고리를 연결하는 것에 적용되는 링커로는, 알킬렌기, 알킬리덴기, -O-, -S-, -C(=O)-, -S(=O)-, -S(=O)2-, -C(=O)-O-L1-O-C(=O)-, -L2-C(=O)-O-L3-, -L4-O-C(=O)-L5-, 또는 -L6-Ar1-L7-Ar2-L8- 등이 예시될 수 있다.Examples of linkers applied to linking the two benzene rings include an alkylene group, an alkylidene group, -O-, -S-, -C (= 0)-, -S (= 0)-, and -S (= O) 2- , -C (= O) -OL 1 -OC (= O)-, -L 2 -C (= O) -OL 3- , -L 4 -OC (= O) -L 5- , Or -L 6 -Ar 1 -L 7 -Ar 2 -L 8 -and the like.
상기에서 L1 내지 L8은 각각 독립적으로, 단일 결합, -O-, 알킬렌기, 또는 알킬리덴기이고, Ar1 및 Ar2는 각각 독립적으로 아릴렌기일 수 있다.L 1 to L 8 may be each independently a single bond, —O—, an alkylene group, or an alkylidene group, and Ar 1 and Ar 2 may each independently be an arylene group.
상기 방향족 화합물은, 예를 들어, 6개 내지 30개, 6개 내지 28개, 6개 내지 27개, 6개 내지 25개, 6개 내지 20개 또는 6개 내지 12개의 탄소 원자를 포함할 수 있고, 필요한 경우에 하나 이상의 치환기에 의해 치환되어 있을 수 있다. 상기 방향족 화합물의 탄소 원자의 수는, 그 화합물이 전술한 링커를 포함하는 경우에, 그 링커에 존재하는 탄소 원자도 포함한 수이다.The aromatic compound may include, for example, 6 to 30, 6 to 28, 6 to 27, 6 to 25, 6 to 20 or 6 to 12 carbon atoms. It may be substituted by one or more substituents if necessary. The number of carbon atoms of the said aromatic compound is the number including the carbon atom which exists in the linker, when the compound contains the above-mentioned linker.
구체적으로, 상기 화학식 3에서 M은 알칸, 알켄, 또는 알킨 유래의 4가 라디칼이거나, 또는 하기 화학식 4 내지 9 중 어느 하나로 표시되는 화합물 유래의 4가 라디칼일 수 있다.Specifically, in Formula 3, M may be a tetravalent radical derived from alkanes, alkenes, or alkynes, or may be a tetravalent radical derived from a compound represented by one of the following Formulas 4 to 9.
[화학식 4][Formula 4]
Figure PCTKR2019010708-appb-I000006
Figure PCTKR2019010708-appb-I000006
상기 화학식 4에서, R40 내지 R45는 각각 독립적으로, 수소, 알킬기, 알콕시기, 또는 아릴기이다.In Formula 4, R 40 to R 45 are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group.
[화학식 5][Formula 5]
Figure PCTKR2019010708-appb-I000007
Figure PCTKR2019010708-appb-I000007
상기 화학식 5에서, R50 내지 R57은 각각 독립적으로, 수소, 알킬기, 알콕시기, 또는 아릴기이다.In Formula 5, R 50 to R 57 are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group.
[화학식 6][Formula 6]
Figure PCTKR2019010708-appb-I000008
Figure PCTKR2019010708-appb-I000008
상기 화학식 6에서,In Chemical Formula 6,
R60 내지 R69는 각각 독립적으로, 수소, 알킬기, 알콕시기, 또는 아릴기이고,R 60 to R 69 are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group,
X는 단일 결합, 알킬렌기, 알킬리덴기, -O-, -S-, -C(=O)-, -S(=O)-, -S(=O)2-, -C(=O)-O-L1-O-C(=O)-, -L2-C(=O)-O-L3-, -L4-O-C(=O)-L5-, 또는 -L6-Ar1-L7-Ar2-L8-이며, 여기에서 L1 내지 L8는 각각 독립적으로, 단일 결합, -O-, 알킬렌기, 또는 알킬리덴기이고, Ar1 및 Ar2는 각각 독립적으로 아릴렌기이다.X is a single bond, an alkylene group, an alkylidene group, -O-, -S-, -C (= O)-, -S (= O)-, -S (= O) 2- , -C (= O ) -OL 1 -OC (= O)-, -L 2 -C (= O) -OL 3- , -L 4 -OC (= O) -L 5- , or -L 6 -Ar 1 -L 7 -Ar 2 -L 8- , wherein L 1 to L 8 are each independently a single bond, -O-, an alkylene group, or an alkylidene group, and Ar 1 and Ar 2 are each independently an arylene group.
본 명세서에서 단일 결합은 그 부분에 원자가 존재하지 않은 경우를 의미한다. 따라서, 상기 화학식 12에서 X가 단일 결합인 경우, X로 표시되는 부분에 원자가 존재하지 않은 경우를 의미하고, 이 경우, X의 양측의 벤젠 고리는 직접 연결되어 비페닐 구조를 형성할 수 있다.In the present specification, a single bond means a case where an atom is not present in a portion thereof. Therefore, when X in Formula 12 is a single bond, it means a case where an atom is not present in the moiety represented by X. In this case, the benzene rings on both sides of X may be directly connected to form a biphenyl structure.
상기 화학식 6에서, 상기 X 중에서 -C(=O)-O-L1-O-C(=O)-, -L2-C(=O)-O-L3-, 또는 -L4-O-C(=O)-L5-에서 L1 내지 L5는 각각 독립적으로, 탄소수 1 내지 12, 탄소수 1 내지 8, 또는 탄소수 1 내지 4의 알킬렌기 또는 알킬리덴기일 수 있고, 상기 알킬렌기 또는 알킬리덴기는 치환 또는 비치환되어 있을 수 있다.In Chemical Formula 6, -C (= 0) -OL 1 -OC (= 0)-, -L 2 -C (= 0) -OL 3- , or -L 4 -OC (= 0)-in X. L 5 - in L 1 to L 5 are each independently, having 1 to 12 carbon atoms, having 1 to 8 carbon atoms, or carbon atoms can be an 1 alkylene group or alkylidene of 1 to 4, wherein the alkylene group or alkylidene group is a substituted or unsubstituted It may be.
또한, 화학식 6의 X 중에서 - L6-Ar1-L7-Ar2-L8-에서, 상기에서 L6 및 L8은 -O-일 수 있고, L7은 탄소수 1 내지 12, 탄소수 1 내지 8, 또는 탄소수 1 내지 4의 알킬렌기 또는 알킬리덴기일 수 있으며, 상기 알킬렌기 또는 알킬리덴기는 치환 또는 비치환되어 있을 수 있다. 상기에서 Ar1 및 Ar2는 페닐렌기일 수 있고, 이러한 경우에 L7을 기준으로 상기 L6 및 L8은 각각 상기 페닐렌의 오소, 메타 또는 파라 위치에 연결되어 있을 수 있다.In addition, in X of Chemical Formula 6, -L 6 -Ar 1 -L 7 -Ar 2 -L 8- , in which L 6 and L 8 may be -O-, L 7 has 1 to 12 carbon atoms, and 1 to 1 carbon atoms. Or an alkylene group or an alkylidene group having 1 to 4 carbon atoms, and the alkylene group or alkylidene group may be substituted or unsubstituted. Ar 1 and Ar 2 may be a phenylene group, in which case L 6 and L 8 based on L 7 may be connected to the ortho, meta or para position of the phenylene, respectively.
[화학식 7][Formula 7]
Figure PCTKR2019010708-appb-I000009
Figure PCTKR2019010708-appb-I000009
상기 화학식 7에서,In Chemical Formula 7,
R70 내지 R73은 각각 독립적으로, 수소, 알킬기, 또는 알콕시기이되, R70 내지 R73 중 2개는 서로 연결되어 알킬렌기를 형성할 수 있고,R 70 to R 73 are each independently hydrogen, an alkyl group, or an alkoxy group, two of R 70 to R 73 may be connected to each other to form an alkylene group,
A는 알킬렌기 또는 알케닐렌기이되, A의 알킬렌기 또는 알케닐렌기는 헤테로 원자로서 하나 이상의 산소 원자를 포함할 수 있다.A is an alkylene group or alkenylene group, wherein the alkylene group or alkenylene group of A may contain one or more oxygen atoms as a hetero atom.
[화학식 8][Formula 8]
Figure PCTKR2019010708-appb-I000010
Figure PCTKR2019010708-appb-I000010
상기 화학식 8에서, R80 내지 R83은 각각 독립적으로, 수소, 알킬기, 또는 알콕시기이고, A는 알킬렌기이다.In Formula 8, R 80 to R 83 are each independently hydrogen, an alkyl group, or an alkoxy group, and A is an alkylene group.
[화학식 9][Formula 9]
Figure PCTKR2019010708-appb-I000011
Figure PCTKR2019010708-appb-I000011
상기 화학식 9에서, R90 내지 R99는 각각 독립적으로, 수소, 알킬기, 또는 알콕시기이다.In Formula 9, R 90 to R 99 are each independently hydrogen, an alkyl group, or an alkoxy group.
상기 화학식 4 내지 9로 표시되는 화합물 유래의 4가 라디칼은, 상기 화학식 4 내지 9의 치환기가 직접 이탈되어 형성되거나, 혹은 상기 치환기의 예들 중 알킬기, 알콕시기, 아릴기, 알킬렌기 또는 알케닐렌기에 속하는 수소 원자가 이탈되어 형성될 수도 있다.The tetravalent radical derived from the compound represented by the above formulas (4) to (9) is formed by directly leaving the substituents of the above formulas (4) to (9), or in the examples of the substituents, an alkyl group, an alkoxy group, an aryl group, an alkylene group or an alkenylene group The hydrogen atom to which it belongs may leave and formed.
예를 들어, 상기 4가 라디칼이 화학식 4의 화합물로부터 유래하는 경우, 화학식 4의 R40 내지 R45 중 1개 이상, 2개 이상, 3개 이상 또는 4개가 라디칼을 형성하거나, 혹은 상기 R40 내지 R45에 존재하는 알킬기, 알콕시기, 또는 아릴기의 수소 원자가 이탈되어 라디칼이 형성될 수 있다. 상기에서 라디칼을 형성한다는 것은, 상술한 바와 같이 그 부위가 화학식 4의 카보닐기의 탄소 원자에 연결되는 것을 의미할 수 있다.For example, when the tetravalent radical is derived from a compound of Formula 4, at least one, at least two, at least three or four of R 40 to R 45 of Formula 4 form a radical or R 40 To a hydrogen atom of the alkyl group, alkoxy group, or aryl group present in R 45 may be released to form a radical. Forming a radical in the above may mean that the site is connected to the carbon atom of the carbonyl group of Formula 4 as described above.
또한, 상기 4가 라디칼이 화학식 6의 화합물로부터 유래하는 경우, 화학식 6의 R60 내지 R69는 각각 독립적으로, 수소, 알킬기, 알콕시기 또는 아릴기이되, 1개 이상, 2개 이상, 3개 이상 또는 4개는 화학식 3에 연결되는 라디칼을 형성할 수 있다. 상기에서 라디칼을 형성하지 않는 각각은 수소, 알킬기 또는 알콕시기이거나, 수소 또는 알킬기일 수 있다. 하나의 예시에서 화학식 6에서는 R67 내지 R69 중 어느 2 개와 R62 내지 R64 중 어느 2 개가 상기 라디칼을 형성할 수 있고, 다른 치환기는 각각 독립적으로 수소, 알킬기, 알콕시기 또는 아릴기이거나, 수소, 알킬기 또는 알콕시기이거나, 또는 수소 또는 알킬기일 수 있다.In addition, when the tetravalent radical is derived from the compound of formula 6, R 60 to R 69 of formula 6 are each independently hydrogen, an alkyl group, an alkoxy group or an aryl group, at least one, at least two, at least three Or more than four may form a radical linked to formula (3). Each of which does not form a radical in the above may be hydrogen, an alkyl group or an alkoxy group, or may be hydrogen or an alkyl group. In one example, in Formula 6, any two of R 67 to R 69 and any two of R 62 to R 64 may form the radical, and the other substituents are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group, It may be a hydrogen, an alkyl group or an alkoxy group, or may be a hydrogen or an alkyl group.
비제한적인 예로, 상기 화학식 4로 표시되는 화합물은 벤젠 또는 1,2,4,5-테트라알킬벤젠일 수 있다.As a non-limiting example, the compound represented by Formula 4 may be benzene or 1,2,4,5-tetraalkylbenzene.
비제한적인 예로, 상기 화학식 6으로 표시되는 화합물은 비페닐이나, 또는 하기 화학식 A 내지 F 중 어느 하나의 화학식으로 표시되는 화합물일 수 있다:As a non-limiting example, the compound represented by Chemical Formula 6 may be biphenyl, or a compound represented by any one of the following Chemical Formulas A to F:
[화학식 A][Formula A]
Figure PCTKR2019010708-appb-I000012
,
Figure PCTKR2019010708-appb-I000012
,
[화학식 B][Formula B]
Figure PCTKR2019010708-appb-I000013
,
Figure PCTKR2019010708-appb-I000013
,
[화학식 C][Formula C]
Figure PCTKR2019010708-appb-I000014
,
Figure PCTKR2019010708-appb-I000014
,
[화학식 D][Formula D]
Figure PCTKR2019010708-appb-I000015
,
Figure PCTKR2019010708-appb-I000015
,
[화학식 E][Formula E]
Figure PCTKR2019010708-appb-I000016
,
Figure PCTKR2019010708-appb-I000016
,
[화학식 F]Formula F]
Figure PCTKR2019010708-appb-I000017
.
Figure PCTKR2019010708-appb-I000017
.
상기 화학식 7로 표시되는 화합물은 사이클로헥산과 같은 탄소수 4 내지 8의 사이클로알칸, 하나 이상의 알킬기로 치환되어 있을 수 있는 사이클로헥센과 같은 탄소수 4 내지 8의 사이클로알켄, 또는 하기 화학식 G 내지 I 중 어느 하나의 화학식으로 표시되는 화합물일 수 있다:The compound represented by Formula 7 may be a cycloalkane having 4 to 8 carbon atoms such as cyclohexane, a cycloalkene having 4 to 8 carbon atoms such as cyclohexene which may be substituted with one or more alkyl groups, or any one of the following Formulas G to I It may be a compound represented by the formula:
[화학식 G][Formula G]
Figure PCTKR2019010708-appb-I000018
,
Figure PCTKR2019010708-appb-I000018
,
[화학식 H][Formula H]
Figure PCTKR2019010708-appb-I000019
,
Figure PCTKR2019010708-appb-I000019
,
[화학식 I][Formula I]
Figure PCTKR2019010708-appb-I000020
.
Figure PCTKR2019010708-appb-I000020
.
상기 화학식 8로 표시되는 화합물은 하기 화학식 J로 표시되거나, 또는 하기 화학식 J로 표시되는 화합물의 수소 중 적어도 하나가 알킬기로 치환되어 있는 화합물일 수 있다:The compound represented by Chemical Formula 8 may be represented by Chemical Formula J or a compound in which at least one hydrogen of the compound represented by Chemical Formula J is substituted with an alkyl group:
[화학식 J][Formula J]
Figure PCTKR2019010708-appb-I000021
.
Figure PCTKR2019010708-appb-I000021
.
상기 화학식 3에서, X1 및 X2는 각각 독립적으로, 방향족 화합물 유래의 2가 라디칼일 수 있다. 예를 들어, X1 및 X2는 각각 독립적으로, 탄소수 6 내지 40의 방향족 화합물 유래의 2가 라디칼일 수 있다. 상기 방향족 화합물 유래의 2가 라디칼에 대해서는 앞서 설명한 내용으로 갈음한다.In Formula 3, X 1 and X 2 may each independently be a divalent radical derived from an aromatic compound. For example, X 1 and X 2 may each independently be a divalent radical derived from an aromatic compound having 6 to 40 carbon atoms. The divalent radical derived from the said aromatic compound is replaced by the content mentioned above.
구체적으로, 상기 화학식 3에서 X1 및 X2는 각각 독립적으로, 하기 화학식 10 내지 12 중 어느 하나로 표시되는 화합물 유래의 2가 라디칼일 수 있다:Specifically, in Formula 3, X 1 and X 2 may each independently be a divalent radical derived from a compound represented by any one of Formulas 10 to 12:
[화학식 10][Formula 10]
Figure PCTKR2019010708-appb-I000022
Figure PCTKR2019010708-appb-I000022
상기 화학식 10에서, R100 내지 R105는 각각 독립적으로, 수소, 알킬기, 알콕시기, 아릴기, 히드록시기, 또는 카르복실기이다;In Formula 10, R 100 to R 105 are each independently hydrogen, an alkyl group, an alkoxy group, an aryl group, a hydroxy group, or a carboxyl group;
[화학식 11][Formula 11]
Figure PCTKR2019010708-appb-I000023
Figure PCTKR2019010708-appb-I000023
상기 화학식 11에서,In Chemical Formula 11,
R110 내지 R119는 각각 독립적으로, 수소, 알킬기, 알콕시기, 아릴기, 히드록시기, 또는 카르복실기이고,R 110 to R 119 are each independently hydrogen, an alkyl group, an alkoxy group, an aryl group, a hydroxy group, or a carboxyl group,
X'는 단일 결합, 알킬렌기, 알킬리덴기, -O-, -S-, -C(=O)-, -NRa-, -S(=O)-, -S(=O)2-, -L9-Ar3-L10- 또는 -L11-Ar4-L12-Ar5-L13-이며, 여기에서 Ra는 수소, 알킬기, 알콕시기, 또는 아릴기이고, L9 내지 L13은 각각 독립적으로, 단일 결합, -O-, 알킬렌기, 또는 알킬리덴기이고, Ar3 내지 Ar5는 각각 독립적으로 아릴렌기이다;X 'is -C (= O) a single bond, an alkylene group, an alkylidene group, -O-, -S-, -, -S (= O) - - -NR a,, -S (= O) 2 - , -L 9 -Ar 3 -L 10 -or -L 11 -Ar 4 -L 12 -Ar 5 -L 13- , wherein R a is hydrogen, an alkyl group, an alkoxy group, or an aryl group, and L 9 to L 13 are each independently a single bond, —O—, an alkylene group, or an alkylidene group, and Ar 3 to Ar 5 are each independently an arylene group;
[화학식 12][Formula 12]
Figure PCTKR2019010708-appb-I000024
Figure PCTKR2019010708-appb-I000024
상기 화학식 12에서, R120 내지 R129는 각각 독립적으로, 수소, 알킬기, 알콕시기, 아릴기, 히드록시기, 또는 카르복실기이다.In Formula 12, R 120 to R 129 are each independently hydrogen, an alkyl group, an alkoxy group, an aryl group, a hydroxy group, or a carboxyl group.
상기 화학식 10 내지 12로 표시되는 화합물 유래의 2가 라디칼은, 상기 화학식 10 내지 12의 치환기가 직접 이탈되어 형성되거나, 혹은 상기 치환기의 예들 중 알킬기, 알콕시기, 아릴기, 알킬렌기 또는 알케닐렌기에 속하는 수소 원자가 이탈되어 형성될 수도 있다.The divalent radical derived from the compound represented by the formulas (10) to (12) is formed by directly leaving the substituents of the formulas (10) to (12), or in the examples of the substituents, an alkyl group, an alkoxy group, an aryl group, an alkylene group or an alkenylene group The hydrogen atom to which it belongs may leave and formed.
예를 들어, 상기 2가 라디칼이 상기 화학식 10으로 표시되는 화합물로부터 유래하고, 그 예로 페닐렌인 경우, 화학식 3의 X1에서 N에 연결되는 부위를 기준으로 한 아민기의 치환 위치는 오소(ortho), 메타(meta) 또는 파라(para) 위치일 수 있고, 화학식 3의 X2에서 N에 연결되는 부위를 기준으로 한 아민기의 치환 위치는 역시 오소(ortho), 메타(meta) 또는 파라(para) 위치일 수 있다.For example, when the divalent radical is derived from the compound represented by Chemical Formula 10, and, for example, phenylene, the substitution position of the amine group based on the site linked to N in X 1 of Chemical Formula 3 may be represented by ortho ( ortho, meta or para position, and the substitution position of the amine group based on the site linked to N in X 2 of Formula 3 is also ortho, meta or para. (para) location.
또한, 상기 2가 라디칼이 상기 화학식 11로 표시되는 화합물로부터 유래하는 경우, 화학식 11의 R117 내지 R119 중 어느 하나와 화학식 11의 R112 내지 R114 중 어느 하나가 화학식 3의 질소 원자에 연결되는 라디칼을 형성할 수 있다. 상기 라디칼을 형성하는 치환기를 제외한 다른 치환기는 각각 독립적으로 수소, 알킬기, 알콕시기 또는 아릴기이거나, 수소, 알킬기 또는 알콕시기이거나, 또는 수소 또는 알킬기일 수 있다.In addition, when the divalent radical is derived from the compound represented by Formula 11, any one of R 117 to R 119 of Formula 11 and R 112 to R 114 of Formula 11 is connected to the nitrogen atom of Formula 3 To form radicals. Other substituents other than the substituents forming the radicals may each independently be hydrogen, an alkyl group, an alkoxy group or an aryl group, a hydrogen, an alkyl group or an alkoxy group, or may be a hydrogen or an alkyl group.
비제한적인 예로, 상기 화학식 10으로 표시되는 화합물은 적어도 하나의 히드록시기 또는 카복실기로 치환되어 있을 수 있는 벤젠이다.As a non-limiting example, the compound represented by Formula 10 is benzene which may be substituted with at least one hydroxy group or carboxyl group.
상기 화학식 11로 표시되는 화합물은 적어도 하나의 히드록시기 또는 카복실기로 치환되어 있을 수 있는 비페닐, 상기 화학식 A 내지 F 중 어느 하나로 표시되면서 적어도 하나의 히드록시기 또는 카복실기로 치환되어 있을 수 있는 화합물, 또는 하기 화학식 K 또는 M으로 표시되면서 적어도 하나의 히드록시기 또는 카복실기로 치환되어 있을 수 있는 화합물이다:The compound represented by Formula 11 may be a biphenyl which may be substituted with at least one hydroxy group or a carboxyl group, a compound which may be substituted with at least one hydroxy group or a carboxyl group while being represented by any one of Formulas A to F, or the following Formula A compound which may be substituted with at least one hydroxyl group or carboxyl group, represented by K or M:
[화학식 K][Formula K]
Figure PCTKR2019010708-appb-I000025
,
Figure PCTKR2019010708-appb-I000025
,
[화학식 L][Formula L]
Figure PCTKR2019010708-appb-I000026
,
Figure PCTKR2019010708-appb-I000026
,
[화학식 M][Formula M]
Figure PCTKR2019010708-appb-I000027
.
Figure PCTKR2019010708-appb-I000027
.
상기 화학식 12로 표시되는 화합물은 하기 화학식 N으로 표시되거나, 또는 하기 화학식 N으로 표시되는 화합물의 수소 중 적어도 하나가 히드록시기 또는 카복실기로 치환되어 있는 화합물이다:The compound represented by Chemical Formula 12 is a compound represented by the following Chemical Formula N, or at least one of hydrogen of the compound represented by the following Chemical Formula N is substituted with a hydroxyl group or a carboxyl group:
[화학식 N][Formula N]
Figure PCTKR2019010708-appb-I000028
.
Figure PCTKR2019010708-appb-I000028
.
본 명세서에서, 알킬기는, 특별히 달리 규정하지 않는 한, 탄소수 1 내지 20, 탄소수 1 내지 16, 탄소수 1 내지 12, 탄소수 1 내지 8, 또는 탄소수 1 내지 4의 알킬기일 수 있다. 상기 알킬기는 직쇄형, 분지쇄형, 또는 고리형일 수 있으며, 필요한 경우에 하나 이상의 치환기에 의해 치환되어 있을 수 있다.In the present specification, the alkyl group may be an alkyl group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms, unless otherwise specified. The alkyl group may be linear, branched, or cyclic and may be substituted by one or more substituents if necessary.
본 명세서에서, 알콕시기는, 특별히 달리 규정하지 않는 한, 탄소수 1 내지 20, 탄소수 1 내지 16, 탄소수 1 내지 12, 탄소수 1 내지 8, 또는 탄소수 1 내지 4의 알콕시기일 수 있다. 상기 알콕시기는 직쇄형, 분지쇄형, 또는 고리형일 수 있으며, 필요한 경우에 하나 이상의 치환기에 의해 치환되어 있을 수 있다.In the present specification, the alkoxy group may be an alkoxy group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms, unless otherwise specified. The alkoxy group may be linear, branched, or cyclic and may be substituted by one or more substituents if necessary.
본 명세서에서, 아릴기는, 특별히 달리 규정하지 않는 한, 전술한 방향족 화합물로부터 유래된 1가 잔기를 의미할 수 있다.In the present specification, an aryl group may mean a monovalent moiety derived from the aforementioned aromatic compound, unless otherwise specified.
본 명세서에서, 알킬렌기 또는 알킬리덴기는, 특별히 달리 규정하지 않는 한, 탄소수 1 내지 20, 탄소수 1 내지 16, 탄소수 1 내지 12, 탄소수 1 내지 8, 또는 탄소수 1 내지 4의 알킬렌기 또는 알킬리덴기를 의미할 수 있다. 상기 알킬렌기 또는 알킬리덴기는 직쇄형, 분지쇄형, 또는 고리형일 수 있다. 또한, 상기 알킬렌기 또는 알킬리덴기는 임의적으로 하나 이상의 치환기로 치환되어 있을 수 있다.In the present specification, an alkylene group or an alkylidene group is an alkylene group or an alkylidene group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms, unless otherwise specified. Can mean. The alkylene group or alkylidene group may be linear, branched, or cyclic. In addition, the alkylene group or alkylidene group may be optionally substituted with one or more substituents.
본 명세서에서, 지방족 화합물, 지환족 화합물, 방향족 화합물, 알킬기, 알콕시기, 아릴기, 알킬렌기, 또는 알킬리덴기 등에 임의적으로 치환되어 있을 수 있는 치환기로는, 염소 또는 불소 등의 할로겐, 글리시딜기, 에폭시알킬기, 글리시독시알킬기 또는 지환식 에폭시기 등의 에폭시기, 아크릴로일기, 메타크릴로일기, 이소시아네이트기, 티올기, 알킬기, 알콕시기, 또는 아릴기 등이 예시될 수 있다.In the present specification, as the substituent which may be optionally substituted with an aliphatic compound, an alicyclic compound, an aromatic compound, an alkyl group, an alkoxy group, an aryl group, an alkylene group, or an alkylidene group, halogen, glycine such as chlorine or fluorine Epoxy groups, such as a dill group, an epoxy alkyl group, a glycidoxy alkyl group, or an alicyclic epoxy group, an acryloyl group, a methacryloyl group, an isocyanate group, a thiol group, an alkyl group, an alkoxy group, an aryl group, etc. can be illustrated.
상기 화학식 3에서, n은 이미드 반복 단위의 개수를 의미하며, 1 이상의 수이다. 구체적으로, 상기 n은 1 내지 200, 1 내지 150, 1 내지 100, 1 내지 90, 1 내지 80, 1 내지 70, 1 내지 60, 1 내지 50, 1 내지 40, 1 내지 30, 1 내지 20, 또는 1 내지 10 범위 내의 수일 수 있다.In Chemical Formula 3, n means the number of imide repeating units and is one or more. Specifically, n is 1 to 200, 1 to 150, 1 to 100, 1 to 90, 1 to 80, 1 to 70, 1 to 60, 1 to 50, 1 to 40, 1 to 30, 1 to 20, Or a number in the range of 1 to 10.
비제한적인 예로, 상기 경화제는 하기 화학식 C1 또는 하기 화학식 C2로 표시되는 화합물일 수 있다:As a non-limiting example, the curing agent may be a compound represented by Formula C1 or Formula C2:
[화학식 C1][Formula C1]
Figure PCTKR2019010708-appb-I000029
Figure PCTKR2019010708-appb-I000029
[화학식 C2][Formula C2]
Figure PCTKR2019010708-appb-I000030
Figure PCTKR2019010708-appb-I000030
상기 화학식 C1 및 C2에서,In Chemical Formulas C1 and C2,
X 및 X'는 각각 독립적으로 직접 결합, C1-5의 알킬렌기, -O-, -S-, -C(=O)-, -S(=O)-, -S(=O)2-, -C(=O)-O-L1-O-C(=O)-, -L2-C(=O)-O-L3-, -L4-O-C(=O)-L5-, 또는 -L6-Ar1-L7-Ar2-L8-이며; 여기에서 상기 L1 내지 L8는 각각 독립적으로 직접 결합, -O-, 또는 C1-5의 알킬렌기이고; 상기 Ar1 및 Ar2는 각각 독립적으로 C6-30의 아릴렌기이고,X and X 'are each independently a direct bond, a C 1-5 alkylene group, -O-, -S-, -C (= O)-, -S (= O)-, -S (= O) 2 -, -C (= O) -OL 1 -OC (= O)-, -L 2 -C (= O) -OL 3- , -L 4 -OC (= O) -L 5- , or -L 6 -Ar 1 -L 7 -Ar 2 -L 8- ; Wherein L 1 to L 8 are each independently a direct bond, -O-, or a C 1-5 alkylene group; Ar 1 and Ar 2 are each independently a C 6-30 arylene group,
R90 내지 R99는 각각 독립적으로 수소, C1-5의 알킬기, C1-5의 알콕시기, C6-30의 아릴기, 히드록시기, 또는 카르복실기이다.R 90 to R 99 each independently is hydrogen, an alkoxy group, an aryl group, a hydroxy group of a C 6-30 alkyl group, C 1-5 of C 1-5, or a carboxyl group.
상기 화학식 3로 표시되는 화합물은 공지의 유기 화합물의 합성법에 따라 합성할 수 있으며, 그 구체적인 방식은 특별히 제한되지 않는다. 예를 들어, 화학식 3으로 표시되는 화합물은 디안하이드라이드(dianhydride) 화합물과 디아민 화합물의 탈수 축합 반응에 의해 형성할 수 있다.The compound represented by Chemical Formula 3 may be synthesized according to a known method for synthesizing an organic compound, and the specific manner thereof is not particularly limited. For example, the compound represented by Formula 3 may be formed by a dehydration condensation reaction between a dianhydride compound and a diamine compound.
상기 화학식 3으로 표시되는 화합물은 높은 비점을 가져서, 고온에서 휘발 내지는 분해되지 않으며, 이에 따라 중합성 조성물의 경화성이 안정적으로 유지되면서, 고온의 가공 내지는 경화 과정에서 물성에 악영향을 줄 수 있는 보이드(void)를 형성하지 않는다.Compound represented by the formula (3) has a high boiling point, does not volatilize or decompose at high temperature, thereby maintaining a stable curability of the polymerizable composition, voids that may adversely affect the physical properties during high temperature processing or curing ( void).
이에 따라 상기 화학식 3으로 표시되는 화합물은, 분해 온도가 300 ℃ 이상, 350 ℃ 이상, 400 ℃ 이상 또는 500 ℃ 이상일 수 있다. 상기 분해 온도는, 상기 화학식 3으로 표시되는 화합물의 분해율이 10 % 이하, 혹은 5 % 이하, 혹은 1 % 이하의 범위로 유지되는 온도를 의미할 수 있다. 상기 분해 온도의 상한은 특별히 제한되지 않으나, 예를 들어 약 1000 ℃ 이하일 수 있다.Accordingly, the compound represented by Chemical Formula 3 may have a decomposition temperature of 300 ° C. or higher, 350 ° C. or higher, 400 ° C. or higher, or 500 ° C. or higher. The decomposition temperature may mean a temperature at which the decomposition rate of the compound represented by Formula 3 is maintained in a range of 10% or less, 5% or less, or 1% or less. The upper limit of the decomposition temperature is not particularly limited, but may be, for example, about 1000 ° C. or less.
상기 화학식 3으로 표시되는 화합물은, 코어의 M이나 링커인 X1 또는 X2의 선택에 의하여 반응성 내지는 중합성 조성물 자체의 프로세스 윈도우(process window), 즉 상기 중합성 조성물 또는 그로부터 형성되는 프리폴리머의 용융 온도와 경화 온도의 차이를 용이하게 조절할 수 있어서, 용도에 따라 다양한 물성의 경화제로서 작용할 수 있다.The compound represented by the formula (3) is a process window of the reactive or polymerizable composition itself, i.e., melting of the polymerizable composition or the prepolymer formed therefrom by the selection of X 1 or X 2 which is M or a linker of the core. Since the difference between temperature and hardening temperature can be adjusted easily, it can act as a hardening | curing agent of various physical properties according to a use.
상기 경화제의 함량은 상기 프탈로니트릴계 수지의 제공을 위한 중합성 조성물에 부여하고자 하는 경화성이 확보될 수 있는 범위에서 조절될 수 있다.The amount of the curing agent may be adjusted in a range that can ensure the curability to be imparted to the polymerizable composition for providing the phthalonitrile-based resin.
비제한적인 예로, 상기 경화제는 상기 프탈로니트릴 화합물 1 몰 당 0.01 몰 내지 1.5 몰의 몰 비로 포함될 수 있다.As a non-limiting example, the curing agent may be included in a molar ratio of 0.01 to 1.5 moles per mole of the phthalonitrile compound.
상기 경화제의 몰 비가 높아지면 프로세스 윈도우가 좁아져 가공성이 떨어지거나 고온의 경화 조건이 요구될 수 있다. 그리고, 상기 경화제의 몰 비가 낮아지면 경화성이 불충분해질 수 있다.If the molar ratio of the curing agent is high, the process window may be narrowed, resulting in poor processability or high temperature curing conditions. And, when the molar ratio of the curing agent is lowered, the curing property may be insufficient.
(3) 첨가제(3) additive
상기 프탈로니트릴계 수지의 제공을 위한 중합성 조성물에는, 상기 프탈로니트릴계 수지의 적용 분야 및 용도 등에 따라 첨가제가 더 포함될 수 있다.The polymerizable composition for providing the phthalonitrile-based resin may further include an additive depending on the application field and use of the phthalonitrile-based resin.
상기 첨가제의 종류는 특별히 한정되지 않는다. 그리고, 상기 첨가제의 함량은 상기 프탈로니트릴계 수지의 물성을 저해하지 않는 범위 내에서 조절될 수 있다.The kind of the additive is not particularly limited. In addition, the content of the additive may be adjusted within a range that does not inhibit the physical properties of the phthalonitrile-based resin.
비제한적인 예로, 상기 첨가제로는, 금속 섬유, 탄소 섬유, 유리 섬유, 아라미드 섬유, 티탄산칼륨 섬유, 셀룰로이드 섬유, 해포석(sepiolite) 섬유, 세라믹 섬유, 및 아크릴 섬유와 같은 강화 섬유; 황산바륨, 탄산칼슘, 지르코니아, 알루미나, 지르코늄 실리케이트, 및 실리콘 카바이드와 같은 무기 충전제; 흑연(graphite), 폴리테트라플루오로에틸렌(polytetrafluoroethylene), 이황화텅스텐(tungsten disulfide), 이황화몰리브덴(molybdenum disulfide), 및 분쇄 탄소 섬유(milled carbon fiber)와 같은 윤활제 등이 적용될 수 있다.As a non-limiting example, the additives include reinforcing fibers such as metal fibers, carbon fibers, glass fibers, aramid fibers, potassium titanate fibers, celluloid fibers, sepiolite fibers, ceramic fibers, and acrylic fibers; Inorganic fillers such as barium sulfate, calcium carbonate, zirconia, alumina, zirconium silicate, and silicon carbide; Lubricants such as graphite, polytetrafluoroethylene, tungsten disulfide, molybdenum disulfide, milled carbon fiber, and the like may be applied.
(4) 프탈로니트릴계 수지의 물성(4) Physical properties of phthalonitrile resin
상기 프탈로니트릴계 수지는 상술한 특성의 프탈로니트릴 화합물 및 경화제의 반응에 의해 형성된 반복 단위를 가짐에 따라, 우수한 가공성을 가지면서도 향상된 충격 강도를 나타낼 수 있다.As the phthalonitrile-based resin has a repeating unit formed by the reaction of the phthalonitrile compound and the curing agent of the above-described characteristics, it may exhibit improved impact strength while having excellent workability.
일 예로, 상기 프탈로니트릴계 수지는 ASTM D256 (23℃) 시험법에 따른 350 MPa 이상의 충격 강도를 가질 수 있다.For example, the phthalonitrile-based resin may have an impact strength of 350 MPa or more according to ASTM D256 (23 ° C.) test method.
구체적으로, 상기 프탈로니트릴계 수지는 ASTM D256 (23℃) 시험법에 따른 350 MPa 이상, 혹은 350 MPa 내지 500 MPa, 혹은 400 MPa 내지 500 MPa, 혹은 400 MPa 내지 490 MPa, 혹은 420 MPa 내지 490 MPa, 혹은 420 MPa 내지 480 MPa, 혹은 430 MPa 내지 480 MPa, 혹은 430 MPa 내지 480 MPa의 충격 강도를 가질 수 있다.Specifically, the phthalonitrile-based resin is 350 MPa or more, or 350 MPa to 500 MPa, or 400 MPa to 500 MPa, or 400 MPa to 490 MPa, or 420 MPa to 490 according to ASTM D256 (23 ℃) test method MPa, or 420 MPa to 480 MPa, or 430 MPa to 480 MPa, or 430 MPa to 480 MPa.
상기 프탈로니트릴계 수지는 50 ℃ 이상의 프로세스 윈도우를 가질 수 있다.The phthalonitrile-based resin may have a process window of 50 ° C. or more.
구체적으로, 상기 프탈로니트릴계 수지의 프로세스 윈도우는 50 ℃ 이상, 혹은 50 ℃ 내지 210 ℃, 혹은 55 ℃ 내지 205 ℃일 수 있다.Specifically, the process window of the phthalonitrile-based resin may be 50 ° C or more, or 50 ° C to 210 ° C, or 55 ° C to 205 ° C.
상기 프로세스 윈도우는 수지의 가공성을 나타내는 하나의 척도로서, 상기 프탈로니트릴 수지가 가공 가능한 상태로 존재하는 온도인 가공 온도(Tp)와 경화 온도(Tc)의 차이(Tc-Tp)의 절대값으로 표시될 수 있다.The process window is a measure of the processability of the resin, the difference between the processing temperature (T p ) and the curing temperature (T c ) (T c -T p ), which is the temperature at which the phthalonitrile resin exists in a processable state. It can be expressed as the absolute value of.
상기 가공 온도(Tp)는 상기 프탈로니트릴계 수지가 가공 가능한 상태로 존재하는 온도를 의미하는 것으로, 유리전이 온도(Tg) 또는 용융 온도(Tm)로 예시될 수 있다.The processing temperature (T p ) means a temperature at which the phthalonitrile-based resin exists in a processable state, and may be exemplified as a glass transition temperature (T g ) or a melting temperature (T m ).
상기 경화 온도(Tc)는 상기 프탈로니트릴계 수지의 발열 개시 온도(exothermic onset temp., To)로 예시될 수 있다.The curing temperature (T c ) may be exemplified as an exothermic onset temp. (T o ) of the phthalonitrile-based resin.
II. 성형품II. Molded article
발명의 다른 일 구현 예에 따르면, 상기 프탈로니트릴계 수지를 사용하여 제조된 성형품이 제공된다.According to another embodiment of the present invention, a molded article manufactured using the phthalonitrile-based resin is provided.
상기 프탈로니트릴계 수지는 우수한 충격 강도를 갖는 성형품의 제공을 가능하게 한다. 상기 성형품으로는 비행기, 선박, 자동차 등의 내구재를 예로 들 수 있다.The phthalonitrile-based resin makes it possible to provide a molded article having excellent impact strength. Examples of the molded article include durable materials such as airplanes, ships, and automobiles.
상기 성형품은 상기 프탈로니트릴계 수지를 포함한 프리폴리머를 가열하여 목적하는 형성으로 성형한 후 이를 경화시켜 제조될 수 있다. 상기 성형품의 제조를 위한 가공 및 경화 방법 등은 공지된 방식에 따라 수행될 수 있다.The molded article may be prepared by heating a prepolymer containing the phthalonitrile-based resin to form a desired formation and then curing it. Processing and curing methods for the production of the molded article can be carried out in a known manner.
본 발명에 따른 프탈로니트릴계 수지는 우수한 가공성과 향상된 충격 강도를 가져, 비행기, 선박, 자동차 등에 내구재로써 보다 적합하게 사용될 수 있다.The phthalonitrile-based resin according to the present invention has excellent processability and improved impact strength, and thus can be more suitably used as a durable material for airplanes, ships, automobiles, and the like.
도 1 내지 도 3은 각각 제조예 1 내지 3에 따른 화합물에 대한 1H-NMR 데이터를 나타낸 것이다.1 to 3 show 1 H-NMR data for the compounds according to Preparation Examples 1 to 3, respectively.
이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예들을 제시한다. 그러나 하기의 실시예들은 발명을 예시하기 위한 것일 뿐, 본 발명을 이들만으로 한정하는 것은 아니다.Hereinafter, preferred embodiments will be presented to aid in understanding the present invention. However, the following examples are only for illustrating the invention, and the present invention is not limited thereto.
제조예 1. 프탈로니트릴 화합물(PN1)의 합성Preparation Example 1 Synthesis of Phtharonitrile Compound (PN1)
4,4'-디하이드록시비페닐 에테르 25.3 g 및 145.0 g의 DMF(dimethyl formamide)를 3넥 RBF(3 neck round bottom flast)에 투입하고, 상온에서 교반하여 용해시켰다. 상기에 4-니트로프탈로니트릴 43.3 g을 추가하고, DMF 70.0 g을 추가한 후 교반하여 용해시켰다. 이어서 탄산칼륨 36.3 g 및 DMF 30.0 g을 함께 투입한 후에 교반하면서 온도를 85 ℃까지 승온하였다. 5 시간 정도 반응시킨 후에 상온까지 냉각시킨다. 냉각된 반응 용액을 0.2 N 염산 수용액에 부어 중화 침전하였다. 필터링 후에 물로 세척하였다. 필터링된 반응물을 100 ℃의 진공 오븐에서 하루 동안 건조시켰다. 물과 잔류 용매를 제거한 후에, 하기 화학식 1로 표시되는 PN1 화합물(4,4'-bis(3,4-dicyanophenoxy)diphenyloxide)를 91 중량%의 수율로 수득하였다.25.3 g of 4,4'-dihydroxybiphenyl ether and 145.0 g of dimethyl formamide (DMF) were added to a three neck round bottom flast (RBF), followed by stirring at room temperature to dissolve. 43.3 g of 4-nitrophthalonitrile were added to the above, and 70.0 g of DMF was added thereto, followed by stirring to dissolve it. Subsequently, after adding 36.3 g of potassium carbonate and 30.0 g of DMF together, the temperature was raised to 85 ° C. while stirring. After reacting for about 5 hours, the mixture is cooled to room temperature. The cooled reaction solution was poured into 0.2 N aqueous hydrochloric acid and neutralized to precipitate. After filtering it was washed with water. The filtered reaction was dried in a vacuum oven at 100 ° C. for one day. After removing water and residual solvent, PN1 compound (4,4'-bis (3,4-dicyanophenoxy) diphenyloxide) represented by the following formula (1) was obtained in a yield of 91% by weight.
상기 PN1 화합물에 대한 1H-NMR 분석 결과를 도 1에 나타내었다. 1 H-NMR analysis of the PN1 compound is shown in FIG. 1.
[화학식 1][Formula 1]
Figure PCTKR2019010708-appb-I000031
Figure PCTKR2019010708-appb-I000031
제조예 2. 프탈로니트릴 화합물(PN2)의 합성Preparation Example 2 Synthesis of Phtharonitrile Compound (PN2)
4,4'-디하이드록시비페닐 23.3 g 및 140 g의 DMF(dimethyl formamide)를 3넥 RBF(3 neck round bottom flast)에 투입하고, 상온에서 교반하여 용해시켰다. 상기에 4-니트로프탈로니트릴 43.3 g을 추가하고, DMF 70.0 g을 추가한 후 교반하여 용해시켰다. 이어서 탄산칼륨 36.3 g 및 DMF 30.0 g을 함께 투입한 후에 교반하면서 온도를 85 ℃까지 승온하였다. 5 시간 정도 반응시킨 후에 상온까지 냉각시킨다. 냉각된 반응 용액을 0.2 N 염산 수용액에 부어 중화 침전하였다. 필터링 후에 물로 세척하였다. 필터링된 반응물을 100 ℃의 진공 오븐에서 하루 동안 건조시켰다. 물과 잔류 용매를 제거한 후에 하기 화학식 2로 표시되는 PN2 화합물(4,4'-bis(3,4-dicyanophenoxy)biphenyl)을 90 중량%의 수율로 수득하였다.23.3 g of 4,4′-dihydroxybiphenyl and 140 g of dimethyl formamide (DMF) were added to a three neck round bottom flast (RBF), followed by stirring at room temperature to dissolve. 43.3 g of 4-nitrophthalonitrile were added to the above, and 70.0 g of DMF was added thereto, followed by stirring to dissolve it. Subsequently, after adding 36.3 g of potassium carbonate and 30.0 g of DMF together, the temperature was raised to 85 ° C. while stirring. After reacting for about 5 hours, the mixture is cooled to room temperature. The cooled reaction solution was poured into 0.2 N aqueous hydrochloric acid solution to neutralize precipitation. After filtering it was washed with water. The filtered reaction was dried in a vacuum oven at 100 ° C. for one day. After removing water and residual solvent, a PN2 compound (4,4'-bis (3,4-dicyanophenoxy) biphenyl) represented by the following Chemical Formula 2 was obtained in a yield of 90% by weight.
상기 PN2 화합물에 대한 1H-NMR 분석 결과를 도 2에 나타내었다. 1 H-NMR analysis of the PN2 compound is shown in FIG. 2.
[화학식 2][Formula 2]
Figure PCTKR2019010708-appb-I000032
Figure PCTKR2019010708-appb-I000032
제조예 3. 경화제(CA1)의 합성Preparation Example 3 Synthesis of Curing Agent (CA1)
하기 화학식 a의 화합물 24 g 및 NMP(N-methyl-pyrrolidone) 45 g을 3넥 RBF(3 neck round bottom flask)에 투입하고, 상온에서 교반하여 용해시켰다. 워터 배스(water bath)로 상기를 냉각시키고, 하기 화학식 b의 화합물 12.4 g을 서서히 3 번에 나누어 45 g의 NMP와 함께 투입하였다. 투입된 화합물이 모두 용해되면, azeotrope를 위해 반응물에 툴루엔 18 g을 투입하였다. Dean-Stark 장치와 리플럭스 콘덴서를 설치하고, Dean-Stark 장치에 톨루엔을 투입하여 채웠다. 탈수 축합 촉매로 피리딘 4.2 mL를 투입하고, 온도를 170 ℃까지 승온시키고, 3 시간 동안 교반하였다.24 g of a compound of Formula a and 45 g of N-methyl-pyrrolidone (NMP) were added to a three neck round bottom flask (RBF), and stirred at room temperature to dissolve. The above was cooled by a water bath, and 12.4 g of the compound of the formula b was slowly added in three portions with 45 g of NMP. When all the compound added dissolved, 18 g of toluene was added to the reaction for azeotrope. The Dean-Stark device and the reflux condenser were installed, and toluene was charged to the Dean-Stark device. 4.2 mL of pyridine was added as a dehydration condensation catalyst, the temperature was raised to 170 ° C, and stirred for 3 hours.
이미드 고리가 형성되면서 발생되는 물을 Dean-Stark 장치로 제거해 주면서 2 시간 동안 추가 교반하고, 잔류 톨루엔과 피리딘을 제거하였다. 반응 생성물을 상온까지 냉각하고, 메탄올에 침전시켜서 회수하였다. 회수된 침전물을 메탄올로 추출하여 잔류 반응물을 제거하고, 진공 오븐에서 건조하여 화학식 c로 표시되는 CA1 화합물을 81 중량%의 수율로 수득하였다.Water generated while the imide ring was formed was further stirred for 2 hours while being removed by the Dean-Stark apparatus, and residual toluene and pyridine were removed. The reaction product was cooled to room temperature and recovered by precipitation in methanol. The recovered precipitate was extracted with methanol to remove residual reactants and dried in a vacuum oven to yield the CA1 compound represented by the formula (c) in a yield of 81% by weight.
상기 CA1 화합물에 대한 1H-NMR 분석 결과를 도 3에 나타내었다. 1 H-NMR analysis of the CA1 compound is shown in FIG. 3.
[화학식 a][Formula a]
Figure PCTKR2019010708-appb-I000033
Figure PCTKR2019010708-appb-I000033
[화학식 b][Formula b]
Figure PCTKR2019010708-appb-I000034
Figure PCTKR2019010708-appb-I000034
[화학식 c][Formula c]
Figure PCTKR2019010708-appb-I000035
Figure PCTKR2019010708-appb-I000035
실시예 1Example 1
프탈로니트릴 화합물로 상기 제조예 1의 PN1 화합물 75 중량% 및 상기 제조예 2의 PN2 화합물 25 중량%의 혼합물을 준비하였다.As a phthalonitrile compound, a mixture of 75 wt% of the PN1 compound of Preparation Example 1 and 25 wt% of the PN2 compound of Preparation Example 2 was prepared.
상기 제조예 3의 CA1 화합물을 상기 프탈로니트릴 화합물 1 몰 당 0.15 몰이 되도록 혼합하여 중합성 조성물을 제조하였다.The CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
상기 중합성 조성물을 오븐에서 220 ℃, 250 ℃, 280 ℃, 및 310 ℃의 온도로 총 3 시간 동안의 가열을 통해 경화시켜, 프탈로니트릴계 수지를 제조하였다.The polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
실시예 2Example 2
프탈로니트릴 화합물로 상기 제조예 1의 PN1 화합물 60 중량% 및 상기 제조예 2의 PN2 화합물 40 중량%의 혼합물을 준비하였다.As a phthalonitrile compound, a mixture of 60 wt% of the PN1 compound of Preparation Example 1 and 40 wt% of the PN2 compound of Preparation Example 2 was prepared.
상기 제조예 3의 CA1 화합물을 상기 프탈로니트릴 화합물 1 몰 당 0.15 몰이 되도록 혼합하여 중합성 조성물을 제조하였다.The CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
상기 중합성 조성물을 오븐에서 220 ℃, 250 ℃, 280 ℃, 및 310 ℃의 온도로 총 3 시간 동안의 가열을 통해 경화시켜, 프탈로니트릴계 수지를 제조하였다.The polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
실시예 3Example 3
프탈로니트릴 화합물로 상기 제조예 1의 PN1 화합물 50 중량% 및 상기 제조예 2의 PN2 화합물 50 중량%의 혼합물을 준비하였다.As a phthalonitrile compound, a mixture of 50 wt% of the PN1 compound of Preparation Example 1 and 50 wt% of the PN2 compound of Preparation Example 2 was prepared.
상기 제조예 3의 CA1 화합물을 상기 프탈로니트릴 화합물 1 몰 당 0.15 몰이 되도록 혼합하여 중합성 조성물을 제조하였다.The CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
상기 중합성 조성물을 오븐에서 220 ℃, 250 ℃, 280 ℃, 및 310 ℃의 온도로 총 3 시간 동안의 가열을 통해 경화시켜, 프탈로니트릴계 수지를 제조하였다.The polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
실시예 4Example 4
프탈로니트릴 화합물로 상기 제조예 1의 PN1 화합물 40 중량% 및 상기 제조예 2의 PN2 화합물 60 중량%의 혼합물을 준비하였다.As a phthalonitrile compound, a mixture of 40 wt% of the PN1 compound of Preparation Example 1 and 60 wt% of the PN2 compound of Preparation Example 2 was prepared.
상기 제조예 3의 CA1 화합물을 상기 프탈로니트릴 화합물 1 몰 당 0.15 몰이 되도록 혼합하여 중합성 조성물을 제조하였다.The CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
상기 중합성 조성물을 오븐에서 220 ℃, 250 ℃, 280 ℃, 및 310 ℃의 온도로 총 3 시간 동안의 가열을 통해 경화시켜, 프탈로니트릴계 수지를 제조하였다.The polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
실시예 5Example 5
프탈로니트릴 화합물로 상기 제조예 1의 PN1 화합물 30 중량% 및 상기 제조예 2의 PN2 화합물 70 중량%의 혼합물을 준비하였다.As a phthalonitrile compound, a mixture of 30 wt% of the PN1 compound of Preparation Example 1 and 70 wt% of the PN2 compound of Preparation Example 2 was prepared.
상기 제조예 3의 CA1 화합물을 상기 프탈로니트릴 화합물 1 몰 당 0.15 몰이 되도록 혼합하여 중합성 조성물을 제조하였다.The CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
상기 중합성 조성물을 오븐에서 220 ℃, 250 ℃, 280 ℃, 및 310 ℃의 온도로 총 3 시간 동안의 가열을 통해 경화시켜, 프탈로니트릴계 수지를 제조하였다.The polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
실시예 6Example 6
프탈로니트릴 화합물로 상기 제조예 1의 PN1 화합물 90 중량% 및 상기 제조예 2의 PN2 화합물 10 중량%의 혼합물을 준비하였다.As a phthalonitrile compound, a mixture of 90 wt% of the PN1 compound of Preparation Example 1 and 10 wt% of the PN2 compound of Preparation Example 2 was prepared.
상기 제조예 3의 CA1 화합물을 상기 프탈로니트릴 화합물 1 몰 당 0.15 몰이 되도록 혼합하여 중합성 조성물을 제조하였다.The CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
상기 중합성 조성물을 오븐에서 220 ℃, 250 ℃, 280 ℃, 및 310 ℃의 온도로 총 3 시간 동안의 가열을 통해 경화시켜, 프탈로니트릴계 수지를 제조하였다.The polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
비교예 1Comparative Example 1
프탈로니트릴 화합물로 상기 제조예 1의 PN1 화합물을 준비하였다.PN1 compound of Preparation Example 1 was prepared as a phthalonitrile compound.
상기 제조예 3의 CA1 화합물을 상기 프탈로니트릴 화합물 1 몰 당 0.15 몰이 되도록 혼합하여 중합성 조성물을 제조하였다.The CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
상기 중합성 조성물을 오븐에서 220 ℃, 250 ℃, 280 ℃, 및 310 ℃의 온도로 총 3 시간 동안의 가열을 통해 경화시켜, 프탈로니트릴계 수지를 제조하였다.The polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
비교예 2Comparative Example 2
프탈로니트릴 화합물로 상기 제조예 2의 PN2 화합물을 준비하였다.The PN2 compound of Preparation Example 2 was prepared as a phthalonitrile compound.
상기 제조예 3의 CA1 화합물을 상기 프탈로니트릴 화합물 1 몰 당 0.15 몰이 되도록 혼합하여 중합성 조성물을 제조하였다.The CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
상기 중합성 조성물을 오븐에서 220 ℃, 250 ℃, 280 ℃, 및 310 ℃의 온도로 총 3 시간 동안의 가열을 통해 경화시켜, 프탈로니트릴계 수지를 제조하였다.The polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
비교예 3Comparative Example 3
프탈로니트릴 화합물로 상기 제조예 1의 PN1 화합물 10 중량% 및 상기 제조예 2의 PN2 화합물 90 중량%의 혼합물을 준비하였다.As a phthalonitrile compound, a mixture of 10 wt% of the PN1 compound of Preparation Example 1 and 90 wt% of the PN2 compound of Preparation Example 2 was prepared.
상기 제조예 3의 CA1 화합물을 상기 프탈로니트릴 화합물 1 몰 당 0.15 몰이 되도록 혼합하여 중합성 조성물을 제조하였다.The CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
상기 중합성 조성물을 오븐에서 220 ℃, 250 ℃, 280 ℃, 및 310 ℃의 온도로 총 3 시간 동안의 가열을 통해 경화시켜, 프탈로니트릴계 수지를 제조하였다.The polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
비교예 4Comparative Example 4
프탈로니트릴 화합물로 상기 제조예 1의 PN1 화합물 25 중량% 및 상기 제조예 2의 PN2 화합물 75 중량%의 혼합물을 준비하였다.As a phthalonitrile compound, a mixture of 25 wt% of the PN1 compound of Preparation Example 1 and 75 wt% of the PN2 compound of Preparation Example 2 was prepared.
상기 제조예 3의 CA1 화합물을 상기 프탈로니트릴 화합물 1 몰 당 0.15 몰이 되도록 혼합하여 중합성 조성물을 제조하였다.The CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
상기 중합성 조성물을 오븐에서 220 ℃, 250 ℃, 280 ℃, 및 310 ℃의 온도로 총 3 시간 동안의 가열을 통해 경화시켜, 프탈로니트릴계 수지를 제조하였다.The polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
비교예 5Comparative Example 5
프탈로니트릴 화합물로 상기 제조예 1의 PN1 화합물 95 중량% 및 상기 제조예 2의 PN2 화합물 5 중량%의 혼합물을 준비하였다.As a phthalonitrile compound, a mixture of 95 wt% of the PN1 compound of Preparation Example 1 and 5 wt% of the PN2 compound of Preparation Example 2 was prepared.
상기 제조예 3의 CA1 화합물을 상기 프탈로니트릴 화합물 1 몰 당 0.15 몰이 되도록 혼합하여 중합성 조성물을 제조하였다.The CA1 compound of Preparation Example 3 was mixed to be 0.15 mol per mol of the phthalonitrile compound to prepare a polymerizable composition.
상기 중합성 조성물을 오븐에서 220 ℃, 250 ℃, 280 ℃, 및 310 ℃의 온도로 총 3 시간 동안의 가열을 통해 경화시켜, 프탈로니트릴계 수지를 제조하였다.The polymerizable composition was cured by heating in an oven at a temperature of 220 ° C., 250 ° C., 280 ° C., and 310 ° C. for a total of 3 hours to prepare a phthalonitrile-based resin.
시험예 1: Test Example 1: 1One H-NMR(nuclear magnetic resonance) 분석Nuclear magnetic resonance (H-NMR) analysis
상기 제조예 1 내지 3에서 합성한 화합물에 대해 1H-NMR 분석을 실시하였다. 그 결과를 도 1 내지 도 3에 나타내었다. 1 H-NMR analysis was performed on the compounds synthesized in Preparation Examples 1 to 3. The results are shown in FIGS. 1 to 3.
상기 1H-NMR 분석은 Agilent사의 500 MHz NMR 장비를 사용하여 제조사의 매뉴얼대로 수행하였다. NMR 측정을 위한 샘플은 화합물을 DMSO(dimethyl sulfoxide)-d6에 용해시켜 제조하였다.The 1 H-NMR analysis was performed according to the manufacturer's manual using Agilent's 500 MHz NMR equipment. Samples for NMR measurements were prepared by dissolving the compound in dimethyl sulfoxide (dSO) -d6.
시험예 2: DSC (differential scanning calorimetry) 분석Test Example 2: Differential scanning calorimetry (DSC) analysis
상기 실시예 및 비교예에서 얻은 프탈로니트릴계 수지에 대해 DSC 분석을 실시하였다. DSC thermogram으로부터 유리전이 온도(Tg), 용융 온도(Tm), 및 발열 개시 온도(exothermic onset temp., To)에 관한 정보를 얻었다. 그 결과를 아래 표 1에 나타내었다. 표 1에서 프로세스 윈도우(PW)는 Tg 및 Tm 중 더 작은 값과 To의 차이의 절대값이다.DSC analysis was performed on the phthalonitrile resins obtained in Examples and Comparative Examples. Information on the glass transition temperature (T g ), the melting temperature (T m ), and the exothermic onset temperature (exothermic onset temp., T o ) was obtained from the DSC thermogram. The results are shown in Table 1 below. In Table 1, the process window PW is the absolute value of the difference between T o and the smaller of T g and T m .
상기 DSC 분석은 TA instrument사의 Q20 시스템을 이용하여 35 ℃에서 450 ℃까지 10 ℃/분의 승온 속도로 승온하면서 N2 flow 분위기에서 수행하였다.The DSC analysis was carried out in an N 2 flow atmosphere using a TA instrument company's Q20 system while heating up at a rate of temperature rise of 10 ° C./minute from 35 ° C. to 450 ° C.
시험예 3: 충격 강도 측정Test Example 3: Impact Strength Measurement
ASTM D256 규격의 노치가 없는 시편을 제작한 후 Digital impact tester (QM(700A))를 이용하여, ASTM D256 (23℃) 시험법에 따라 상기 프탈로니트릴계 수지의 충격 강도(IS)를 측정하였다. 그 결과를 아래 표 1에 나타내었다.After preparing the specimens of the ASTM D256 standard notched, the impact strength (IS) of the phthalonitrile-based resin was measured according to the ASTM D256 (23 ℃) test method using a digital impact tester (QM (700A)). . The results are shown in Table 1 below.
시험예 4: 경화 후 수지의 상태 관찰Test Example 4: Observation of Resin State after Curing
상기 실시예 및 비교예에서 얻은 프탈로니트릴계 수지에 보이드(void)가 존재하는지 여부를 육안으로 관찰하였다.It was visually observed whether or not voids were present in the phthalonitrile-based resins obtained in Examples and Comparative Examples.
상대 평가를 통해, 보이드가 존재하지 않을 경우 "○", 다수의 보이드가 존재할 경우 "X", 약간의 보이드가 존재할 경우 "△"으로 분류하였다. 그 결과를 아래 표 1에 나타내었다.Relative evaluation classified "○" when no void was present, "X" when there were a large number of voids, and "△" when some voids were present. The results are shown in Table 1 below.
Figure PCTKR2019010708-appb-T000001
Figure PCTKR2019010708-appb-T000001
상기 표 1을 참조하면, 상기 실시예들에 따른 프탈로니트릴계 수지는 프로세스 윈도우가 넓으면서도 우수한 충격강도를 가지며 수지 내에 보이드가 존재하지 않는 것으로 확인된다.Referring to Table 1, the phthalonitrile-based resin according to the embodiments it is confirmed that the process window is wide but excellent impact strength and there is no void in the resin.

Claims (7)

  1. 프탈로니트릴 화합물 및 경화제의 반응에 의해 형성된 반복 단위를 갖는 수지로서,As resin which has a repeating unit formed by reaction of a phthalonitrile compound and a hardening | curing agent,
    상기 프탈로니트릴 화합물은 하기 화학식 1로 표시되는 4,4'-비스(3,4-디시아노페녹시)디페닐옥사이드(4,4'-bis(3,4-dicyanophenoxy)diphenyloxide) 및 하기 화학식 2로 표시되는 4,4'-비스(3,4-디시아노페녹시)비페닐 (4,4'-bis(3,4-dicyanophenoxy)biphenyl)을 30:70 내지 90:10의 중량비로 포함하는,The phthalonitrile compound is 4,4'-bis (3,4-dicyanophenoxy) diphenyl oxide (4,4'-bis (3,4-dicyanophenoxy) diphenyloxide) represented by the formula (1) 4,4'-bis (3,4-dicyanophenoxy) biphenyl represented by 2 comprises 4,4'-bis (3,4-dicyanophenoxy) biphenyl in a weight ratio of 30:70 to 90:10 doing,
    프탈로니트릴계 수지:Phtharonitrile-based resins:
    [화학식 1][Formula 1]
    Figure PCTKR2019010708-appb-I000036
    ,
    Figure PCTKR2019010708-appb-I000036
    ,
    [화학식 2][Formula 2]
    Figure PCTKR2019010708-appb-I000037
    .
    Figure PCTKR2019010708-appb-I000037
    .
  2. 제 1 항에 있어서,The method of claim 1,
    상기 경화제는 하기 화학식 3으로 표시되는 이미드계 화합물인, 프탈로니트릴계 수지:Phtharonitrile-based resin, wherein the curing agent is an imide compound represented by the following formula (3):
    [화학식 3][Formula 3]
    Figure PCTKR2019010708-appb-I000038
    Figure PCTKR2019010708-appb-I000038
    상기 화학식 3에서,In Chemical Formula 3,
    M은 지방족, 지환족 또는 방향족 화합물 유래의 4가 라디칼이고,M is a tetravalent radical derived from an aliphatic, alicyclic or aromatic compound,
    X1 및 X2는 각각 독립적으로, 알킬렌기, 알킬리덴기, 또는 방향족 화합물 유래의 2가 라디칼이고,X 1 and X 2 are each independently a divalent radical derived from an alkylene group, an alkylidene group, or an aromatic compound,
    n은 1 이상의 수이다.n is a number of 1 or more.
  3. 제 2 항에 있어서,The method of claim 2,
    상기 화학식 3에서 M은 알칸, 알켄, 또는 알킨 유래의 4가 라디칼이거나, 또는 하기 화학식 4 내지 9 중 어느 하나로 표시되는 화합물 유래의 4가 라디칼인, 프탈로니트릴계 수지:In Formula 3, M is a tetravalent radical derived from alkanes, alkenes, or alkynes, or a tetravalent radical derived from a compound represented by any one of the following Formulas 4 to 9, a phthalonitrile-based resin:
    [화학식 4][Formula 4]
    Figure PCTKR2019010708-appb-I000039
    Figure PCTKR2019010708-appb-I000039
    상기 화학식 4에서, R40 내지 R45는 각각 독립적으로, 수소, 알킬기, 알콕시기, 또는 아릴기이다;In Formula 4, R 40 to R 45 are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group;
    [화학식 5][Formula 5]
    Figure PCTKR2019010708-appb-I000040
    Figure PCTKR2019010708-appb-I000040
    상기 화학식 5에서, R50 내지 R57은 각각 독립적으로, 수소, 알킬기, 알콕시기, 또는 아릴기이다;In Formula 5, R 50 to R 57 are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group;
    [화학식 6][Formula 6]
    Figure PCTKR2019010708-appb-I000041
    Figure PCTKR2019010708-appb-I000041
    상기 화학식 6에서,In Chemical Formula 6,
    R60 내지 R69는 각각 독립적으로, 수소, 알킬기, 알콕시기, 또는 아릴기이고,R 60 to R 69 are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group,
    X는 단일 결합, 알킬렌기, 알킬리덴기, -O-, -S-, -C(=O)-, -S(=O)-, -S(=O)2-, -C(=O)-O-L1-O-C(=O)-, -L2-C(=O)-O-L3-, -L4-O-C(=O)-L5-, 또는 -L6-Ar1-L7-Ar2-L8-이며, 여기에서 L1 내지 L8는 각각 독립적으로, 단일 결합, -O-, 알킬렌기, 또는 알킬리덴기이고, Ar1 및 Ar2는 각각 독립적으로 아릴렌기이다;X is a single bond, an alkylene group, an alkylidene group, -O-, -S-, -C (= O)-, -S (= O)-, -S (= O) 2- , -C (= O ) -OL 1 -OC (= O)-, -L 2 -C (= O) -OL 3- , -L 4 -OC (= O) -L 5- , or -L 6 -Ar 1 -L 7 -Ar 2 -L 8- , wherein L 1 to L 8 are each independently a single bond, -O-, an alkylene group, or an alkylidene group, and Ar 1 and Ar 2 are each independently an arylene group;
    [화학식 7][Formula 7]
    Figure PCTKR2019010708-appb-I000042
    Figure PCTKR2019010708-appb-I000042
    상기 화학식 7에서,In Chemical Formula 7,
    R70 내지 R73은 각각 독립적으로, 수소, 알킬기, 또는 알콕시기이되, R70 내지 R73 중 2개는 서로 연결되어 알킬렌기를 형성할 수 있고,R 70 to R 73 are each independently hydrogen, an alkyl group, or an alkoxy group, two of R 70 to R 73 may be connected to each other to form an alkylene group,
    A는 알킬렌기 또는 알케닐렌기이되, A의 알킬렌기 또는 알케닐렌기는 헤테로 원자로서 하나 이상의 산소 원자를 포함할 수 있다;A is an alkylene group or alkenylene group, wherein the alkylene group or alkenylene group of A may contain one or more oxygen atoms as a hetero atom;
    [화학식 8][Formula 8]
    Figure PCTKR2019010708-appb-I000043
    Figure PCTKR2019010708-appb-I000043
    상기 화학식 8에서,In Chemical Formula 8,
    R80 내지 R83은 각각 독립적으로, 수소, 알킬기, 또는 알콕시기이고,R 80 to R 83 are each independently hydrogen, an alkyl group, or an alkoxy group,
    A는 알킬렌기이다;A is an alkylene group;
    [화학식 9][Formula 9]
    Figure PCTKR2019010708-appb-I000044
    Figure PCTKR2019010708-appb-I000044
    상기 화학식 9에서,In Chemical Formula 9,
    R90 내지 R99는 각각 독립적으로, 수소, 알킬기, 또는 알콕시기이다.R 90 to R 99 are each independently hydrogen, an alkyl group, or an alkoxy group.
  4. 제 2 항에 있어서,The method of claim 2,
    상기 화학식 3에서 X1 및 X2는 각각 독립적으로 탄소수 6 내지 40의 방향족 화합물 유래의 2가 라디칼인, 프탈로니트릴계 수지.X 1 and X 2 in Formula 3 are each independently a divalent radical derived from an aromatic compound having 6 to 40 carbon atoms, phthalonitrile-based resin.
  5. 제 2 항에 있어서,The method of claim 2,
    상기 화학식 3에서 X1 및 X2는 각각 독립적으로 하기 화학식 10 내지 12 중 어느 하나로 표시되는 화합물 유래의 2가 라디칼인, 프탈로니트릴계 수지:In Formula 3, X 1 and X 2 are each independently a divalent radical derived from a compound represented by any one of Formulas 10 to 12, phthalonitrile-based resin:
    [화학식 10][Formula 10]
    Figure PCTKR2019010708-appb-I000045
    Figure PCTKR2019010708-appb-I000045
    상기 화학식 10에서,In Chemical Formula 10,
    R100 내지 R105는 각각 독립적으로, 수소, 알킬기, 알콕시기, 아릴기, 히드록시기, 또는 카르복실기이다;R 100 to R 105 are each independently hydrogen, an alkyl group, an alkoxy group, an aryl group, a hydroxy group, or a carboxyl group;
    [화학식 11][Formula 11]
    Figure PCTKR2019010708-appb-I000046
    Figure PCTKR2019010708-appb-I000046
    상기 화학식 11에서,In Chemical Formula 11,
    R110 내지 R119는 각각 독립적으로, 수소, 알킬기, 알콕시기, 아릴기, 히드록시기, 또는 카르복실기이고,R 110 to R 119 are each independently hydrogen, an alkyl group, an alkoxy group, an aryl group, a hydroxy group, or a carboxyl group,
    X'는 단일 결합, 알킬렌기, 알킬리덴기, -O-, -S-, -C(=O)-, -NRa-, -S(=O)-, -S(=O)2-, -L9-Ar3-L10- 또는 -L11-Ar4-L12-Ar5-L13-이며, 여기에서 Ra는 수소, 알킬기, 알콕시기, 또는 아릴기이고, L9 내지 L13은 각각 독립적으로, 단일 결합, -O-, 알킬렌기, 또는 알킬리덴기이고, Ar3 내지 Ar5는 각각 독립적으로 아릴렌기이다;X 'is -C (= O) a single bond, an alkylene group, an alkylidene group, -O-, -S-, -, -S (= O) - - -NR a,, -S (= O) 2 - , -L 9 -Ar 3 -L 10 -or -L 11 -Ar 4 -L 12 -Ar 5 -L 13- , wherein R a is hydrogen, an alkyl group, an alkoxy group, or an aryl group, and L 9 to L 13 is each independently a single bond, —O—, an alkylene group, or an alkylidene group, and Ar 3 to Ar 5 are each independently an arylene group;
    [화학식 12][Formula 12]
    Figure PCTKR2019010708-appb-I000047
    Figure PCTKR2019010708-appb-I000047
    상기 화학식 12에서,In Chemical Formula 12,
    R120 내지 R129는 각각 독립적으로, 수소, 알킬기, 알콕시기, 아릴기, 히드록시기, 또는 카르복실기이다.R 120 to R 129 are each independently hydrogen, an alkyl group, an alkoxy group, an aryl group, a hydroxy group, or a carboxyl group.
  6. 제 1 항에 있어서,The method of claim 1,
    ASTM D256 (23℃) 시험법에 따른 350 MPa 내지 500 MPa의 충격 강도를 가지는, 프탈로니트릴계 수지.Phtharonitrile-based resin having an impact strength of 350 MPa to 500 MPa according to the ASTM D256 (23 ° C.) test method.
  7. 제 1 항의 프탈로니트릴계 수지를 사용하여 제조된 성형품.A molded article manufactured using the phthalonitrile-based resin of claim 1.
PCT/KR2019/010708 2018-08-28 2019-08-22 Phthalonitrile-based resin having improved impact strength WO2020045897A1 (en)

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CN201980017402.3A CN111819221B (en) 2018-08-28 2019-08-22 Phthalonitrile-based resins with improved impact strength
JP2020545659A JP6935119B2 (en) 2018-08-28 2019-08-22 Phthalonitrile resin with improved impact strength

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KR20010030872A (en) * 1997-10-02 2001-04-16 더 거번먼트 오브 더 유나이티드 스테이츠 오브 아메리카, 애즈 레프리젠티드 바이 더 세크러테리 오브 더 네이비 네이벌 리서치 래보러토리 Fiber-reinforced phthalonitrile composite cured with low-reactivity aromatic amine curing agent
CN102936340A (en) * 2012-11-30 2013-02-20 吉林大学 Bisphthalonitrile resin/aromatic amine organic montmorillonite nano composite material and preparation method thereof
KR20160115543A (en) * 2015-03-27 2016-10-06 주식회사 엘지화학 Polymerizable composition
KR20170065954A (en) * 2015-12-04 2017-06-14 주식회사 엘지화학 Polymerizable composition
WO2017169738A1 (en) * 2016-03-30 2017-10-05 株式会社ダイセル Thermosetting compound

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KR20010030872A (en) * 1997-10-02 2001-04-16 더 거번먼트 오브 더 유나이티드 스테이츠 오브 아메리카, 애즈 레프리젠티드 바이 더 세크러테리 오브 더 네이비 네이벌 리서치 래보러토리 Fiber-reinforced phthalonitrile composite cured with low-reactivity aromatic amine curing agent
CN102936340A (en) * 2012-11-30 2013-02-20 吉林大学 Bisphthalonitrile resin/aromatic amine organic montmorillonite nano composite material and preparation method thereof
KR20160115543A (en) * 2015-03-27 2016-10-06 주식회사 엘지화학 Polymerizable composition
KR20170065954A (en) * 2015-12-04 2017-06-14 주식회사 엘지화학 Polymerizable composition
WO2017169738A1 (en) * 2016-03-30 2017-10-05 株式会社ダイセル Thermosetting compound

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