WO2020041961A1 - 显示面板及显示装置 - Google Patents

显示面板及显示装置 Download PDF

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Publication number
WO2020041961A1
WO2020041961A1 PCT/CN2018/102635 CN2018102635W WO2020041961A1 WO 2020041961 A1 WO2020041961 A1 WO 2020041961A1 CN 2018102635 W CN2018102635 W CN 2018102635W WO 2020041961 A1 WO2020041961 A1 WO 2020041961A1
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WO
WIPO (PCT)
Prior art keywords
water blocking
thickness
blocking layer
layer
display panel
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Application number
PCT/CN2018/102635
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English (en)
French (fr)
Inventor
陈国峰
吕竟枫
彭蓉
Original Assignee
深圳市柔宇科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市柔宇科技有限公司 filed Critical 深圳市柔宇科技有限公司
Priority to PCT/CN2018/102635 priority Critical patent/WO2020041961A1/zh
Priority to CN201880094115.8A priority patent/CN112640087A/zh
Publication of WO2020041961A1 publication Critical patent/WO2020041961A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate

Definitions

  • the present invention relates to the field of display technology, and in particular, to a display panel and a display device.
  • OLEDs Organic electroluminescence displays
  • the water blocking layer is usually a single-layer structure made of one material. In this way, it is easy to cause the problem of stress accumulation and fracture.
  • an embodiment of the present invention discloses a display panel and a display device.
  • a display panel includes a water blocking structure.
  • the water blocking structure includes a substrate and at least two water blocking layers stacked on the substrate.
  • a display device includes the display panel as described above.
  • the display panel, the manufacturing method thereof and the display device provided by the present invention provide at least two water blocking layers on the substrate, and the at least two water blocking layers can buffer each other when the display panel is bent.
  • the stress makes the water blocking structure difficult to break, and improves the bending resistance of the display panel.
  • FIG. 1 is a schematic diagram of a laminated structure of a display panel with a water blocking structure according to an embodiment of the present invention.
  • FIG. 2 is a schematic diagram of a laminated structure of a water blocking structure provided by a first embodiment of the present invention.
  • FIG. 3 is a schematic diagram of the reflectance of the water blocking structure corresponding to the sixth group provided in the first embodiment to visible light.
  • FIG. 4 is a schematic diagram of the reflectance of the second water blocking structure corresponding to the second group provided in the second embodiment to visible light.
  • FIG. 5 is a schematic diagram of a laminated structure of a water blocking structure provided by a third embodiment of the present invention.
  • FIG. 6 is a schematic diagram of the reflectance of the second water blocking structure corresponding to the second group provided in the third embodiment with respect to visible light.
  • FIG. 7 is a schematic diagram of the reflectance of the water blocking structure corresponding to the second group to visible light provided in the fourth embodiment.
  • FIG. 8 is a schematic stacking diagram of a water blocking structure provided by a fifth embodiment of the present invention.
  • FIG. 9 is a schematic diagram of the reflectance of a second water blocking structure corresponding to the second group provided in the fifth embodiment to visible light.
  • FIG. 10 is a schematic diagram of the reflectance of the water blocking structure corresponding to the fourth group provided in the sixth embodiment to visible light.
  • FIG. 11 is a schematic stacking diagram of a water blocking structure provided by a seventh embodiment of the present invention.
  • FIG. 12 is a schematic diagram of the reflectance of the water blocking structure corresponding to the first group provided in the seventh embodiment to visible light.
  • FIG. 13 is a schematic diagram of the reflectance of the water blocking structure corresponding to the second group provided in the eighth embodiment to visible light.
  • FIG. 14 is a schematic diagram of the reflectance of visible light with respect to the second group of water blocking structures provided in the ninth embodiment.
  • a display panel includes a water blocking structure.
  • the water blocking structure includes a substrate and at least two water blocking layers stacked on the substrate. Since the water blocking structure includes at least two water blocking layers, the at least two water blocking layers can mutually buffer the stress generated when the display panel is bent, so that the water blocking structure is not easily broken.
  • the at least two water blocking layers are convenient for adjusting the stress problem generated when the display panel is bent, and the bending resistance of the display panel is improved.
  • FIG. 1 is a schematic diagram of a laminated structure of a display panel 10 with a water blocking structure according to an embodiment of the present invention.
  • the display panel 10 includes a display function layer 11, a water blocking structure 13, and a polarizing layer 15 which are stacked in this order.
  • the water blocking structure 13 is used to prevent moisture from entering the display functional layer 11.
  • the polarizing layer 15 is used to reduce external ambient light reflection and ensure the display effect of the display panel 10.
  • the display panel 10 is an AMOLED flexible display panel.
  • the display functional layer 11 includes an array substrate 112, a color filter substrate 114, and an organic light emitting layer 116.
  • the array substrate 112, the color filter substrate 114, and the organic light emitting layer 116 are sequentially stacked.
  • the array substrate 112 is disposed adjacent to the water blocking structure 13.
  • the water blocking structure 13 includes a substrate 131 and a water blocking layer 133 provided on the substrate 131.
  • the polarizing layer 15 is disposed on a side of the substrate 131 away from the water blocking layer 133.
  • the array substrate 112 is disposed adjacent to the water blocking layer 133 of the water blocking structure 13.
  • the number of the water blocking layers 133 is at least two (only two are shown by way of example in FIG. 1).
  • the at least two water blocking layers 133 are stacked on the substrate 131 to facilitate the adjustment of the display panel 10 when it is bent. Stress reduces the possibility of the display panel 10 breaking due to bending.
  • the water blocking structure 13 provided by the embodiment of the present invention needs to satisfy a low reflectivity (not more than 10%, more preferably, while achieving the required water blocking performance (usually water blocking is less than 10 -4 gm 2 / day). 6%) to avoid strong external light from reflecting on the display panel 10.
  • the substrate 131 is a flexible transparent substrate, and the flexible transparent substrate is made of polyimide (PI) material.
  • the material of the water blocking layer 133 is selected from SiOx and SiNx. Since the water blocking structure of the water blocking structure 13 needs to satisfy less than 10 -4 gm 2 / day, the thickness of the substrate 131 is selected to be 10 ⁇ m, and the thickness of the SiOx is selected to be in the range of SiNx thickness selection range is
  • the water blocking structure 13 must satisfy the water blocking performance requirement, and also need to satisfy the reflectance not greater than 6%.
  • the reflectivity of a thin film is related to the refractive index and thickness of each layer of material.
  • the water blocking structure 13 is a multi-layer structure, in which the refractive index of the material of the substrate 131 is 1.6, the refractive index of SiOx is 1.48 to 1.50, and the refractive index of SiNx is 2.1 to 2.5.
  • the Fresnel coefficient can be used to obtain the reflectivity of the single-layer film, and then the recursive method can be used to obtain the reflectance of the multi-layer film (for specific methods, see: Lin Xiaoyan, Calculation, Journal of Xinyang Normal University: Natural Science Edition, Vol. 24, No. 1, January 2011). Of course, it is not limited to the above method to obtain the reflectance of the water blocking structure 13.
  • the substrate (TH) is the thickness of the substrate 131
  • SiOx (TH) is the thickness of the SiOx material for the water blocking layer 133
  • SiNx (TH) is the thickness of the SiNx material for the water blocking layer 133
  • R% is the water blocking structure 13 Reflectivity for visible light.
  • the reflectance of the substrate 131 having a thickness of 10 ⁇ m is 4.79%; in the corresponding water blocking structure 13 of the second group, the thickness of the substrate 131 with a thickness of 10 ⁇ m is When the water-blocking layer 133 made of SiOx is used, the reflectance of the water-blocking structure 13 is reduced to 3.50%. In the corresponding water-blocking structure 13 of the third group, the thickness of When the water blocking layer 133 made of SiOx is used, the reflectance of the water blocking structure 13 is increased to 17.64%. Obviously, compared to SiOx, SiNx has a greater impact on the optical path.
  • the reflectance involved in the embodiments of the present invention is the average reflectance of each group of data corresponding structure in each band of visible light.
  • the water blocking layer 133 made of SiOx is located between the substrate 131 and the water blocking layer 133 made of SiNx. From the data of groups 4 to 6 in Table 1, it can be obtained that the increase in the thickness of SiOx can reduce the reflectance of the water blocking structure 13 to some extent, and the presence of SiNx improves the reflectance of the water blocking structure 13.
  • water blocking structure 13 is described under different laminated structures or thicknesses through specific embodiments.
  • FIG. 2 is a schematic diagram of a laminated structure of a water blocking structure according to a first embodiment of the present invention.
  • the water blocking structure 13 includes a substrate 131 and two water blocking layers 133.
  • the two water blocking layers 133 include a first water blocking layer 1331 and a second water blocking layer 1333.
  • the first water blocking layer 1331 is in phase with the substrate 131. Ortho set.
  • the first water blocking layer 1331 is made of SiOx
  • the second water blocking layer 1333 is made of SiNx.
  • the thickness of the substrate 131 is 10 ⁇ m, and the thickness of the first water blocking layer (SiOx) 1331 is The thickness of the second water blocking layer (SiNx) 1333 is in the range of
  • FIG. 3 is a schematic diagram of visible light reflectance of the sixth group of corresponding water blocking structures provided in the first embodiment.
  • the horizontal axis is the incident light wavelength
  • the vertical axis is the reflectance
  • the visible light is the incident light.
  • the incident angle is 0 degrees
  • the wavelength of the optical reflectance falls between 380nm and 780nm (the reflectance graphs in other embodiments are similar, and will not be described below). It can be seen from Table 2 that when the thickness of the second water blocking layer 1333 is between to In between, the overall reflectance can be less than or equal to 6%.
  • the material and thickness of the water-blocking layer 133 are not limited.
  • the material of the water-blocking layer 133 may be an inorganic material or an inorganic-organic mixed material.
  • the refractive index of the first water blocking layer 1331 is smaller than the refractive index of the second water blocking layer 1333.
  • the thickness of the first water blocking layer 1331 is greater than the thickness of the second water blocking layer 1333.
  • the thickness of the first water blocking layer 1331 is greater than 5 times the thickness of the second water blocking layer 1333.
  • the water blocking structure 13 provided by the second embodiment of the present invention is substantially similar to the water blocking structure 13 provided by the first embodiment, except that the thickness of the first water blocking layer (SiOx) 1331 is
  • Table 3 is a reflectance table for visible light of the water blocking structure provided in the third embodiment.
  • the thickness of the substrate 131 is 10 ⁇ m
  • the thickness of the first water blocking layer (SiOx) 1331 is
  • the thickness of the second water blocking layer (SiNx) 1333 is in the range of At this time, the reflectance (R%) of the water blocking structure 13 is not more than 6%.
  • FIG. 4 is a schematic diagram of the reflectance of visible light with respect to the second group of water blocking structures provided in the second embodiment.
  • FIG. 5 is a schematic diagram of a laminated structure of a water blocking structure according to a third embodiment of the present invention.
  • the water blocking structure 13 provided by the third embodiment of the present invention is substantially similar to the water blocking structure 13 provided by the first embodiment, except that the second water blocking layer (SiNx) 1333 is disposed adjacent to the substrate 131.
  • SiNx second water blocking layer
  • the thickness of the substrate 131 is 10 ⁇ m, and the thickness of the first water blocking layer (SiOx) 1331 is The thickness of the second water blocking layer (SiNx) 1333 is in the range of At this time, the reflectance (R%) of the water blocking structure 13 is not more than 6%.
  • FIG. 6 is a schematic diagram of the reflectance of the water blocking structure corresponding to the second group provided in the third embodiment to visible light.
  • the water blocking structure 13 provided by the fourth embodiment of the present invention is substantially similar to the water blocking structure 13 provided by the third embodiment, except that the thickness of the first water blocking layer (SiOx) 1331 is
  • the thickness of the substrate 131 is 10 ⁇ m, and the thickness of the first water blocking layer (SiOx) 1331 is The thickness of the second water blocking layer (SiNx) 1333 is in the range of At this time, the reflectance (R%) of the water blocking structure 13 is not more than 6%.
  • FIG. 7 is a schematic diagram of the reflectance of the second water blocking structure corresponding to the second group provided in the fourth embodiment to visible light.
  • Table 5 Visible light reflectance table of the water blocking structure provided in the fourth embodiment
  • FIG. 8 is a schematic stacking diagram of a water blocking structure provided by a fifth embodiment of the present invention.
  • the water blocking structure 13 includes a substrate 131 and four water blocking layers 133.
  • the four water blocking layers 133 include two first water blocking layers 1331 and two second water blocking layers 1333.
  • the first water blocking layers 1331 and the second The water blocking layers 1333 are alternately provided.
  • the first water blocking layer 1331 is made of SiOx
  • the second water blocking layer 1333 is made of SiNx.
  • the four water blocking layers 133 include a first film layer group 135 and a second film layer group 137.
  • Each of the first film layer group 135 and the second film layer group 137 includes a first water blocking layer 1331 and a second water blocking layer.
  • the first water blocking layer 1331 of the first film layer group 135 is disposed adjacent to the substrate 131.
  • the thickness of the substrate 131 is 10 ⁇ m.
  • the thickness of the first water blocking layer (SiOx) 1331 of the first film layer group 135 and the first water blocking layer (SiOx) 1331 of the second film layer group 137 are both
  • the total thickness of the second water blocking layer (SiNx) 1333 of the first film layer group 135 and the second water blocking layer (SiNx) of the second film layer group 137 is in the range of In this case, the reflectance (R%) of the water blocking structure 13 is not greater than 6%.
  • the thickness range of the second water blocking layer (SiNx) 1333 of the first film layer group 135 Thickness range of the second water blocking layer (SiNx) 1333 of the second film layer group 137
  • the reflectance (R%) of the water blocking structure 13 is not greater than 6%.
  • the thickness of the second water blocking layer 1333 of the first film layer group 135 is greater than the thickness of the second water blocking layer 1333 of the second film layer group 137.
  • FIG. 9 is a schematic diagram of the reflectance of the water blocking structure corresponding to the second group provided in the fifth embodiment to visible light.
  • Table 6 Table of reflectance of the water blocking structure provided in the fifth embodiment to visible light
  • the water blocking structure 13 provided by the sixth embodiment of the present invention is substantially similar to the water blocking structure 13 provided by the fifth embodiment, except that the first water blocking layer (SiOx) 1331 and the second film layer of the first film layer group 135 The thickness of the first water blocking layer (SiOx) 1331 of group 137 is all
  • Table 7 is a reflectance table for visible light of the water blocking structure provided in the sixth embodiment.
  • the thickness of the substrate 131 is 101 ⁇ m.
  • the thickness of the first water blocking layer (SiOx) 1331 of the first film layer group 135 and the first water blocking layer (SiOx) 1331 of the second film layer group 137 are both
  • the total thickness of the second water blocking layer (SiNx) 1333 of the first film layer group 135 and the second water blocking layer (SiNx) of the second film layer group 137 is in the range of In this case, the reflectance (R%) of the water blocking structure 13 is not greater than 6%. .
  • the thickness of the second water blocking layer (SiNx) 1333 of the first film layer group 135 is in the range of The thickness of the second water blocking layer (SiNx) 1333 of the second film layer group 135 is In this case, the reflectance (R%) of the water blocking structure 13 is not greater than 6%.
  • FIG. 10 is a schematic diagram of the reflectance of the water blocking structure corresponding to the fourth group provided in the sixth embodiment to visible light.
  • FIG. 11 is a schematic stacking diagram of a water blocking structure provided by a seventh embodiment of the present invention.
  • the water blocking structure 13 provided by the seventh embodiment of the present invention is substantially similar to the water blocking structure 13 provided by the fifth embodiment, except that the second water blocking layer 1333 of the first film layer group 135 is disposed adjacent to the substrate 131.
  • the thickness of the substrate 131 is 10 ⁇ m.
  • the thickness of the first water blocking layer (SiOx) 1331 of the first film layer group 135 and the thickness of the first water blocking layer (SiOx) 1331 of the second film layer group 137 are both
  • the total thickness of the second water blocking layer (SiNx) 1333 of the first film layer group 135 and the second water blocking layer (SiNx) 1333 of the second film layer group 137 is The reflectance (R%) that satisfies the water blocking structure 13 is not more than 6%. .
  • the thickness range of the second water blocking layer (SiNx) 1333 of the first film layer group 135 The thickness of the second water blocking layer (SiNx) 1333 of the second film layer group 135 is In this case, the reflectance (R%) of the water blocking structure 13 is not greater than 6%.
  • FIG. 12 is a schematic diagram of the reflectance of the water blocking structure corresponding to the first group provided in the seventh embodiment to visible light.
  • the thickness of the second water blocking layer 1333 of the first film layer group 135 is smaller than the thickness of the second water blocking layer 1333 of the second film layer group 137.
  • the water blocking structure 13 provided by the eighth embodiment of the present invention is substantially similar to the water blocking structure 13 provided by the seventh embodiment, except that the selected thickness range of the second water blocking layer (SiNx) 1333 of the first film layer group 135 is The thickness of the second water blocking layer (SiNx) 1333 of the second film layer group 137 is in the range of
  • Table 9 is a reflectance table for visible light of the water blocking structure provided in the eighth embodiment.
  • the thickness of the substrate 131 is 10 ⁇ m.
  • the thickness of the first water blocking layer (SiOx) 1331 of the first film layer group 135 and the thickness of the first water blocking layer (SiOx) 1331 of the second film layer group 137 are both
  • the total thickness of the second water blocking layer (SiNx) 1333 of the first film layer group 135 and the second water blocking layer (SiNx) 1333 of the second film layer group 137 is 1
  • the reflectance (R%) of the water blocking structure 13 is not greater than 6%. .
  • the thickness range of the second water blocking layer (SiNx) 1333 of the first film layer group 135 The thickness of the second water blocking layer (SiNx) 1333 of the second film layer group 137 is The reflectance (R%) that satisfies the water blocking structure 13 is not more than 6%.
  • FIG. 13 is a schematic diagram of the reflectance of the water blocking structure corresponding to the second group provided in the eighth embodiment to visible light.
  • Table 9 Visible light reflectance table of the water blocking structure provided in the eighth embodiment
  • the water blocking structure 13 provided by the ninth embodiment of the present invention is substantially similar to the water blocking structure 13 provided by the eighth embodiment, except that the thickness of the first water blocking layer (SiOx) 1331 of the first film layer group 135 is the same as that of the second The thickness of the first water blocking layer (SiOx) 1331 of the film layer group 137 is all
  • Table 10 is a reflectance table for visible light of the water blocking structure provided in the ninth embodiment.
  • the thickness of the substrate 131 is 10 ⁇ m.
  • the thickness of the first water blocking layer (SiOx) 1333 of the first film layer group 135 and the first water blocking layer (SiOx) 1331 of the second film layer group 137 are both
  • the total thickness of the second water blocking layer (SiNx) 1333 of the first film layer group 135 and the second water blocking layer (SiNx) 1333 of the second film layer group 137 is In this case, the reflectance (R%) of the water blocking structure 13 is not greater than 6%.
  • the thickness range of the second water blocking layer (SiNx) 1333 of the first film layer group 135 The thickness of the second water blocking layer (SiNx) 1333 of the second film layer group 135 is In this case, the reflectance (R%) of the water blocking structure 13 is not greater than 6%.
  • FIG. 14 is a schematic diagram of the reflectance of the water blocking structure corresponding to the second group provided in the ninth embodiment to visible light.
  • the present invention also provides a display device including the display panel according to any one of the first to ninth embodiments.
  • adjacent water blocking layers can mutually buffer the stress generated when the display panel is bent. So that the water blocking structure is not easily broken. That is, the at least two water blocking layers are convenient for adjusting the stress problem generated when the display panel is bent, and the possibility that the display panel is broken due to bending is reduced.
  • the first water blocking layer 1331 is made of SiNx material
  • the second water blocking layer 1333 is made of SiOx. The thickness and the stack of the first water blocking layer 1331 and the second water blocking layer 1333 are stacked. Sequence matching makes the water blocking structure have excellent water blocking performance and low reflectivity.
  • the thickness and material of the substrate 131 are not limited, and the thickness of each first water blocking layer 1331 is in the range of A thickness range of each of the second water blocking layers 1333 is
  • the first water blocking layer 1331 is disposed adjacent to the substrate, and the thickness of the second water blocking layer 1333 is in the range of
  • the second water blocking layer 1333 is disposed adjacent to the substrate 131, and the thickness of the second water blocking layer 1333 is in the range of
  • the at least two water blocking layers 133 include a first film layer group 135 and a second film layer group 137, and each of the first film layer group 135 and the second film layer group 137 includes a laminate.
  • the first water blocking layer 1331 and the second water blocking layer 1333 are provided.
  • the first water blocking layer 1331 of the first film layer group 135 is disposed adjacent to the substrate 131, and the second water blocking layer 1333 of the first film layer group 137 and the first water blocking layer 1333 are disposed adjacent to the substrate 131.
  • the total thickness of the second water blocking layer 1333 of the two film layer group 137 is in the range of For example, the thickness of the substrate 131 is 10 ⁇ m, and the thickness of the first water blocking layer 1331 of the first film layer group 135 and the first water blocking layer 1331 of the second film layer group 137 are both
  • the total thickness range of the second water blocking layer 1333 of the first film layer group 135 and the second water blocking layer 1333 of the second film layer group 137 is When the thickness of the second water blocking layer 1333 of the first film layer group 135 is A thickness range of the second water blocking layer 1333 of the second film layer group 137 is
  • the second water blocking layer 1333 of the first film layer group 137 is disposed adjacent to the substrate 131, and the second water blocking layer 1333 of the first film layer group 137 and the first The total thickness of the second water blocking layer 1333 of the two film layer group 137 is in the range of The thickness of the second water blocking layer 1333 of the first film layer group 137 is in the range of A thickness range of the second water blocking layer 1333 of the second film layer group 137 is
  • the thickness of the substrate 131 is 10 ⁇ m
  • the number of the first water blocking layer 1331 may be three or more
  • the number of the second water blocking layer 1333 may be three or more
  • the first water blocking layer 1331 and the second water blocking layer 1331 may be arranged overlapping.
  • the number of the first water blocking layer 1331 may be two, the number of the second water blocking layer 1333 may be one, and the second water blocking layer 1333 is disposed between the two first water blocking layers 1331. .
  • the material and thickness of the water blocking layer 133 are not limited.
  • the material of the water blocking layer 133 may be an inorganic material or an inorganic organic mixed material, such as one of SiOx, SiNx, LiF, MgF, and MgO. One or a combination.

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Abstract

一种显示面板（10）和具有显示面板（10）的显示装置，显示面板（10）包括阻水结构（13），阻水结构（13）包括衬底（131）及层叠设置于衬底（131）上的至少两个阻水层（133）。由于阻水结构（13）包括至少两个阻水层（133），方便调整弯折显示面板（10）时产生的应力问题，降低显示面板（10）因弯折断裂的可能性。

Description

显示面板及显示装置 技术领域
本发明涉及显示技术领域，特别涉及一种显示面板及显示装置。
背景技术
有机电致发光显示器(OLED)由于其具有反应快、色域广、轻薄、能够实现柔性化等特点，已逐渐成为显示器的主流。由于有机材料以及金属等对水氧极其敏感，通常还需在显示器设置阻水层，避免水分入侵，影响显示器的寿命。阻水层通常是由一种材料制成的单层结构，如此，易造成应力积累易断裂的问题。
发明内容
为解决上述问题，本发明实施例公开一种显示面板及显示装置。
一种显示面板，包括阻水结构，所述阻水结构包括衬底及层叠设置于所述衬底上的至少两个阻水层。
一种显示装置，包括如上所述的显示面板。
本发明提供的显示面板及其制作方法以及显示装置，通过提供在衬底上设置至少两个阻水层，所述至少两个阻水层之间能够相互缓冲弯折所述显示面板时产生的应力，使得所述阻水结构不容易断裂，提高所述显示面板的耐弯折性能。
附图说明
为了更清楚地说明本发明实施例中的技术方案，下面将对实施例中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明实施方式提供的具阻水结构的显示面板的叠层结构示意图。
图2为本发明第一实施方式提供的阻水结构的叠层结构示意图。
图3为第一实施方式中提供的第6组对应的阻水结构对于可见光的反射率示意图。
图4为第二实施方式中提供的第2组对应的阻水结构对于可见光的反射率示意图。
图5为本发明第三实施方式提供的阻水结构的叠层结构示意图。
图6为第三实施方式中提供的第2组对应的阻水结构对于可见光的反射率示意图。
图7为第四实施方式中提供的第2组对应的阻水结构对于可见光的反射率示意图。
图8为本发明第五实施方式提供的阻水结构的堆叠示意图。
图9为第五实施方式中提供的第2组对应的阻水结构对于可见光的反射率示意图。
图10为第六实施方式中提供的第4组对应的阻水结构对于可见光的反射率示意图。
图11为本发明第七实施方式提供的阻水结构的堆叠示意图。
图12为第七实施方式中提供的第1组对应的阻水结构对于可见光的反射率示意图。
图13为第八实施方式中提供的第2组对应的阻水结构对于可见光的反射率示意图。
图14为第九实施方式中提供的第2组对应的阻水结构对于可见光的反射率示意图。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性 劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
一种显示面板，包括阻水结构，所述阻水结构包括衬底及层叠设置于所述衬底上的至少两个阻水层。由于阻水结构包括至少两个阻水层，所述至少两个阻水层之间能够相互缓冲弯折所述显示面板时产生的应力，使得所述阻水结构不容易断裂。所述至少两个阻水层方便调整弯折显示面板时产生的应力问题，提高所述显示面板的耐弯折性能。
请参阅图1，为本发明实施方式提供的具阻水结构的显示面板10的叠层结构示意图。显示面板10包括依次层叠设置的显示功能层11、阻水结构13及偏振层15。阻水结构13用于防止水分侵入显示功能层11。偏振层15用于减小外界环境光反射，确保显示面板10的显示效果。
显示面板10为AMOLED柔性显示面板。显示功能层11包括阵列基板112、彩色滤光基板114及有机发光层116。阵列基板112、彩色滤光基板114及有机发光层116依次层叠设置。阵列基板112与阻水结构13相邻设置。
阻水结构13包括衬底131及设于衬底131上的阻水层133。偏振层15设于衬底131远离阻水层133的一侧。阵列基板112与阻水结构13的阻水层133相邻设置。阻水层133的数量至少为两个(图1中仅示例性地示出两个)，所述至少两个阻水层133层叠设置于衬底131上，以方便调整弯折显示面板10时的应力，降低显示面板10因弯折断裂的可能性。
现有的阻水结构均未考虑到反射率的问题，使得显示面板的整体反射率偏高，影响显示效果。因此，本发明实施方式提供的阻水结构13在达到要求的阻水性能(通常阻水性小于10 -4gm 2/day)的同时，还需满足低反射率(不大于10％，更优选地6％)，以避免外界环境光会在显示面板10上形成强烈的反射。
衬底131为柔性透明衬底，所述柔性透明衬底采用聚酰亚胺(Polyimide，PI)材料。本实施方式中，阻水层133的材料选用SiOx及SiNx。由于阻水结构13的阻水性需满足小于10 -4gm 2/day，衬底131的厚度选为10μm，SiOx的厚度选用范围为
Figure PCTCN2018102635-appb-000001
SiNx的厚度选用范围为
Figure PCTCN2018102635-appb-000002
如上所述，阻水结构13在满足阻水性能要求的同时，还需满足反射率不大于6％。根据薄膜光学理论，薄膜的反射率与各层材料的折射率及厚度相关。阻水结构13为多层结构，其中，衬底131材料的折射率为1.6，SiOx的折射 率为1.48～1.50，SiNx的折射率为2.1～2.5。对于阻水结构13的反射率，可采用菲涅尔系数得到单层膜的反射率，然后用递推法求得多层膜的反射率(具体方法可参：林小燕，多层膜反射率的计算，信阳师范学院学报：自然科学版，第24卷第1期，2011年1月)的方法进行求取。当然，并不限于上述方法求取阻水结构13的反射率。
请参表格1，为阻水结构中衬底及阻水层对于可见光的反射率表。其中，衬底(TH)为衬底131的厚度，SiOx(TH)为阻水层133采用SiOx材料的厚度，SiNx(TH)为阻水层133采用SiNx材料的厚度，R％为阻水结构13对于可见光的反射率。
表格1中，第1组对应的衬底结构中，厚度为10μm的衬底131的反射率为4.79％；第2组对应的阻水结构13中，在10μm的衬底131上搭配厚度为
Figure PCTCN2018102635-appb-000003
的SiOx制成的阻水层133时，阻水结构13的反射率降低到3.50％；第3组对应的阻水结构13中，在10μm的衬底131上搭配厚度为
Figure PCTCN2018102635-appb-000004
的SiOx制成的阻水层133时，阻水结构13的反射率提高到17.64％。显然，相较于SiOx，SiNx对于光路的影响更大。本发明各实施例中涉及的反射率，为每组数据对应结构对于可见光的各波段下的平均反射率。
第4组-第6组对应的阻水结构13中，由SiOx制成的阻水层133位于衬底131与由SiNx制成的阻水层133之间。从表格1的第4组-第6组数据能够得到，SiOx随着厚度的增加在一定程度上能够降低阻水结构13的反射率，而SiNx的存在提高了阻水结构13的反射率。
表格1 阻水结构中衬底及阻水层对于可见光的反射率表
Figure PCTCN2018102635-appb-000005
以下通过具体实施例对阻水结构13在不同的叠层结构或厚度下进行说明。
第一实施方式
请参阅图2，为本发明第一实施方式提供的阻水结构的叠层结构示意图。阻水结构13包括衬底131及两个阻水层133，两个阻水层133包括第一阻水层1331及第二阻水层1333，其中，第一阻水层1331与衬底131相邻设置。第一阻水层1331的制成材料为SiOx，第二阻水层1333的制成材料为SiNx。
请参表格2，为第一实施方式中提供的阻水结构对于可见光的反射率表。衬底131的厚度为10μm，第一阻水层(SiOx)1331的厚度为
Figure PCTCN2018102635-appb-000006
第二阻水层(SiNx)1333的厚度范围为
Figure PCTCN2018102635-appb-000007
请参阅图3，为第一实施方式中提供的第6组对应的阻水结构对于可见光的反射率示意图，其中，横轴坐标为入射光波长，纵轴坐标为反射率，采用可见光为入射光，入射角度为0度，光学反射率波长落于380nm～780nm(其他实施例中的反射率图类似，以下不再作说明)。由表格2可看出，当第二阻水层1333的厚度在
Figure PCTCN2018102635-appb-000008
至
Figure PCTCN2018102635-appb-000009
之间时，整体的反射率才能小于或等于6％。
表格2 第一实施方式提供的阻水结构对于可见光的反射率表
Figure PCTCN2018102635-appb-000010
在一实施方式中，不限定阻水层133的材料及厚度，阻水层133的制成材料可以为无机材料或无机有机的混合材料，阻水层133的制成材料具备隔绝水 氧性能，所述第一阻水层1331的折射率小于所述第二阻水层1333的折射率。
在一实施方式中，所述第一阻水层1331的厚度大于所述第二阻水层1333的厚度。
在一实施方式中，所述第一阻水层1331的厚度大于所述第二阻水层1333厚度的5倍。
第二实施方式
本发明第二实施方式提供的阻水结构13与第一实施方式提供的阻水结构13大致相似，不同在于，第一阻水层(SiOx)1331的厚度为
Figure PCTCN2018102635-appb-000011
请参阅表格3，为第三实施方式中提供的阻水结构对于可见光的反射率表。衬底131的厚度为10μm，第一阻水层(SiOx)1331的厚度为
Figure PCTCN2018102635-appb-000012
第二阻水层(SiNx)1333的厚度范围为
Figure PCTCN2018102635-appb-000013
时，阻水结构13的反射率(R％)不大于6％。
请参阅图4，为第二实施方式中提供的第2组对应的阻水结构对于可见光的反射率示意图。
表格3 第二实施方式中提供的阻水结构对于可见光的反射率表
Figure PCTCN2018102635-appb-000014
第三实施方式
请参阅图5，为本发明第三实施方式提供的阻水结构的叠层结构示意图。本发明第三实施方式提供的阻水结构13与第一实施方式提供的阻水结构13大致相似，不同在于，第二阻水层(SiNx)1333与衬底131相邻设置。
请参阅表格4，为第三实施方式中提供的阻水结构对于可见光的反射率表。 衬底131的厚度为10μm，第一阻水层(SiOx)1331的厚度为
Figure PCTCN2018102635-appb-000015
第二阻水层(SiNx)1333的厚度范围为
Figure PCTCN2018102635-appb-000016
时，阻水结构13的反射率(R％)不大于6％。
请参阅图6，为第三实施方式中提供的第2组对应的阻水结构对于可见光的反射率示意图。
表格4 第三实施方式中提供的阻水结构对于可见光的反射率表
Figure PCTCN2018102635-appb-000017
第四实施方式
本发明第四实施方式提供的阻水结构13与第三实施方式提供的阻水结构13大致相似，不同在于，第一阻水层(SiOx)1331的厚度为
Figure PCTCN2018102635-appb-000018
请参阅表格5，为第四实施方式中提供的阻水结构对于可见光的反射率表。衬底131的厚度为10μm，第一阻水层(SiOx)1331的厚度为
Figure PCTCN2018102635-appb-000019
第二阻水层(SiNx)1333的厚度范围为
Figure PCTCN2018102635-appb-000020
时，阻水结构13的反射率(R％)不大于6％。
请参阅图7，第四实施方式中提供的第2组对应的阻水结构对于可见光的反射率示意图。
表格5 第四实施方式中提供的阻水结构对于可见光的反射率表
Figure PCTCN2018102635-appb-000021
第五实施方式
请参阅图8，为本发明第五实施方式提供的阻水结构的堆叠示意图。阻水结构13包括衬底131及四个阻水层133，四个阻水层133包括两个第一阻水层1331及两个第二阻水层1333，第一阻水层1331与第二阻水层1333交替设置。第一阻水层1331的制成材料为SiOx，第二阻水层1333的制成材料为SiNx。四个阻水层133包括第一膜层组135及第二膜层组137，第一膜层组135及第二膜层组137均包括层叠设置的第一阻水层1331与第二阻水层1333。其中，第一膜层组135的第一阻水层1331与衬底131相邻设置。
请参阅表格6，为第五实施方式中提供的阻水结构对于可见光的反射率表。衬底131的厚度为10μm，第一膜层组135的第一阻水层(SiOx)1331及第二膜层组137的第一阻水层(SiOx)1331的厚度均为
Figure PCTCN2018102635-appb-000022
第一膜层组135的第二阻水层(SiNx)1333与第二膜层组137的第二阻水层(SiNx)的总厚度范围为
Figure PCTCN2018102635-appb-000023
时，满足阻水结构13的反射率(R％)不大于6％。更为具体的，第一膜层组135的第二阻水层(SiNx)1333的厚度范围
Figure PCTCN2018102635-appb-000024
第二膜层组137的第二阻水层(SiNx)1333的厚度范围
Figure PCTCN2018102635-appb-000025
时，满足阻水结构13的反射率(R％)不大于6％。其中，第一膜层组135的第二阻水层1333的厚度大于所述第二膜层组137的第二阻水层1333的厚度。
请参阅图9，为第五实施方式中提供的第2组对应的阻水结构对于可见光的反射率示意图。
表格6 第五实施方式中提供的阻水结构对于可见光的反射率表
Figure PCTCN2018102635-appb-000026
第六实施方式
本发明第六实施方式提供的阻水结构13与第五实施方式提供的阻水结构13大致相似，不同在于，第一膜层组135的第一阻水层(SiOx)1331及第二膜层组137的第一阻水层(SiOx)1331的厚度均为
Figure PCTCN2018102635-appb-000027
请参阅表格7，为第六实施方式中提供的阻水结构对于可见光的反射率表。衬底131的厚度为101μm，第一膜层组135的第一阻水层(SiOx)1331及第二膜层组137的第一阻水层(SiOx)1331的厚度均为
Figure PCTCN2018102635-appb-000028
第一膜层组135的第二阻水层(SiNx)1333与第二膜层组137的第二阻水层(SiNx)的总厚度范围为
Figure PCTCN2018102635-appb-000029
时，满足阻水结构13的反射率(R％)不大于6％。。更为具体的，第一膜层组135的第二阻水层(SiNx)1333的厚度范围为
Figure PCTCN2018102635-appb-000030
第二膜层组135的第二阻水层(SiNx)1333的厚度为
Figure PCTCN2018102635-appb-000031
时，满足阻水结构13的反射率(R％)不大于6％。
请参阅图10，为第六实施方式中提供的第4组对应的阻水结构对于可见光的反射率示意图。
表格7 第六实施方式中提供的阻水结构对于可见光的反射率表
Figure PCTCN2018102635-appb-000032
第七实施方式
请参阅图11，为本发明第七实施方式提供的阻水结构的堆叠示意图。本发明第七实施方式提供的阻水结构13与第五实施方式提供的阻水结构13大致相似，不同在于，第一膜层组135的第二阻水层1333与衬底131相邻设置。
请参阅表格8，为第七实施方式中提供的阻水结构对于可见光的反射率表。衬底131的厚度为10μm，第一膜层组135的第一阻水层(SiOx)1331的厚度及第二膜层组137的第一阻水层(SiOx)1331的厚度均为
Figure PCTCN2018102635-appb-000033
第一膜层组135的第二阻水层(SiNx)1333与第二膜层组137的第二阻水层(SiNx)1333的总厚度范围为
Figure PCTCN2018102635-appb-000034
满足阻水结构13的反射率(R％)不大于6％。。更为具体的，第一膜层组135的第二阻水层(SiNx)1333的厚度范围
Figure PCTCN2018102635-appb-000035
第二膜层组135的第二阻水层(SiNx)1333的厚度为
Figure PCTCN2018102635-appb-000036
时，满足阻水结构13的反射率(R％)不大于6％。
请参阅图12，为第七实施方式中提供的第1组对应的阻水结构对于可见光的反射率示意图。其中，第一膜层组135的第二阻水层1333的厚度小于所述第二膜层组137的第二阻水层1333的厚度。
表格8 第七实施方式中提供的阻水结构对于可见光的反射率表
Figure PCTCN2018102635-appb-000037
第八实施方式
本发明第八实施方式提供的阻水结构13与第七实施方式提供的阻水结构13大致相似，不同在于，第一膜层组135的第二阻水层(SiNx)1333的选用厚度范围为
Figure PCTCN2018102635-appb-000038
第二膜层组137的第二阻水层(SiNx)1333的选用厚度范围为
Figure PCTCN2018102635-appb-000039
请参阅表格9，为第八实施方式中提供的阻水结构对于可见光的反射率表。 衬底131的厚度为10μm，第一膜层组135的第一阻水层(SiOx)1331的厚度及第二膜层组137的第一阻水层(SiOx)1331的厚度均为
Figure PCTCN2018102635-appb-000040
第一膜层组135的第二阻水层(SiNx)1333与第二膜层组137的第二阻水层(SiNx)1333的总厚度范围为1
Figure PCTCN2018102635-appb-000041
时，满足阻水结构13的反射率(R％)不大于6％。。更为具体的，第一膜层组135的第二阻水层(SiNx)1333的厚度范围
Figure PCTCN2018102635-appb-000042
第二膜层组137的第二阻水层(SiNx)1333的厚度为
Figure PCTCN2018102635-appb-000043
满足阻水结构13的反射率(R％)不大于6％。
请参阅图13，为第八实施方式中提供的第2组对应的阻水结构对于可见光的反射率示意图。
表格9 第八实施方式中提供的阻水结构对于可见光的反射率表
Figure PCTCN2018102635-appb-000044
第九实施方式
本发明第九实施方式提供的阻水结构13与第八实施方式提供的阻水结构13大致相似，不同在于，第一膜层组135的第一阻水层(SiOx)1331的厚度与第二膜层组137的第一阻水层(SiOx)1331的厚度均为
Figure PCTCN2018102635-appb-000045
请参阅表格10，为第九实施方式中提供的阻水结构对于可见光的反射率表。衬底131的厚度为10μm，第一膜层组135的第一阻水层(SiOx)1333及第二膜层组137的第一阻水层(SiOx)1331的厚度均为
Figure PCTCN2018102635-appb-000046
第一膜层组135的第二阻水层(SiNx)1333与第二膜层组137的第二阻水层(SiNx)1333的总厚度范围为
Figure PCTCN2018102635-appb-000047
时，满足阻水结构13的反射率(R％)不大于6％。更为具体的，第一膜层组135的第二阻水层(SiNx)1333的厚度范围
Figure PCTCN2018102635-appb-000048
第二膜层组135的第二阻水层(SiNx)1333的厚度为
Figure PCTCN2018102635-appb-000049
时，满足阻 水结构13的反射率(R％)不大于6％。
表格10 第九实施方式中提供的阻水结构对于可见光的反射率表
Figure PCTCN2018102635-appb-000050
请参阅图14，为第九实施方式中提供的第2组对应的阻水结构对于可见光的反射率示意图。
本发明还提供一种显示装置，其包括第一实施方式至第九实施方式任意一种所述的显示面板。
本发明提供的显示面板及其制作方法以及显示装置，通过提供在衬底131上设置至少两个阻水层，相邻的阻水层之间能够相互缓冲弯折所述显示面板时产生的应力，使得所述阻水结构不容易断裂。即所述至少两个阻水层方便调整弯折显示面板时产生的应力问题，降低所述显示面板因弯折断裂的可能性。此外，第一阻水层1331的制成材料为SiNx材料，所述第二阻水层1333的制成材料为SiOx，通过对第一阻水层1331及第二阻水层1333厚度及叠层顺序搭配，使阻水结构具优良的阻水性能及低反射率。
在一实施方式中，不限定衬底131的厚度及材料，每个第一阻水层1331的厚度范围为
Figure PCTCN2018102635-appb-000051
每个所述第二阻水层1333的厚度范围为
Figure PCTCN2018102635-appb-000052
在一实施方式中，所述第一阻水层1331与所述衬底相邻设置，所述第二阻水层1333的厚度范围为
Figure PCTCN2018102635-appb-000053
在一实施方式中，所述第二阻水层1333与所述衬底131相邻设置，所述第二阻水层1333的厚度范围为
Figure PCTCN2018102635-appb-000054
在一实施方式中，所述至少两个阻水层133包括第一膜层组135及第二膜 层组137，所述第一膜层组135及所述第二膜层组137均包括层叠设置的第一阻水层1331及第二阻水层1333。
在一实施方式中，所述第一膜层组135的第一阻水层1331与所述衬底131相邻设置，所述第一膜层组137的第二阻水层1333与所述第二膜层组137的第二阻水层1333总厚度范围为
Figure PCTCN2018102635-appb-000055
例如，所述衬底131的厚度为10μm，所述第一膜层组135的第一阻水层1331及所述第二膜层组137的第一阻水层1331的厚度均为
Figure PCTCN2018102635-appb-000056
所述第一膜层组135的第二阻水层1333与所述第二膜层组137的第二阻水层1333总厚度范围为
Figure PCTCN2018102635-appb-000057
当所述第一膜层组135的第二阻水层1333的厚度范围为
Figure PCTCN2018102635-appb-000058
所述第二膜层组137的第二阻水层1333的厚度范围为
Figure PCTCN2018102635-appb-000059
在一实施方式中，所述第一膜层组137的第二阻水层1333与所述衬底131相邻设置，所述第一膜层组137的第二阻水层1333与所述第二膜层组137的第二阻水层1333总厚度范围为
Figure PCTCN2018102635-appb-000060
其中，所述第一膜层组137的第二阻水层1333的厚度范围为
Figure PCTCN2018102635-appb-000061
所述第二膜层组137的第二阻水层1333的厚度范围为
Figure PCTCN2018102635-appb-000062
例如，所述衬底131的厚度为10μm，所述第一膜层组135的第一阻水层1331及所述第二膜层组137的第一阻水层1333的厚度均为
Figure PCTCN2018102635-appb-000063
所述第一膜层组135的第二阻水层1333与所述第二膜层组137的第二阻水层1333总厚度范围为
Figure PCTCN2018102635-appb-000064
当所述第一膜层组135的第二阻水层1333的厚度范围为
Figure PCTCN2018102635-appb-000065
所述第二膜层组135的第二阻水层1333的厚度范围为
Figure PCTCN2018102635-appb-000066
当所述第一膜层组135的第二阻水层1333的厚度范围为
Figure PCTCN2018102635-appb-000067
所述第二膜层组137的第二阻水层1333的厚度范围为
Figure PCTCN2018102635-appb-000068
又例如，所述衬底131的厚度为10μm，所述第一膜层组135的第一阻水层1331及所述第二膜层组137的第一阻水层1331的厚度均为
Figure PCTCN2018102635-appb-000069
所述第一膜层组137的第二阻水层1333与所述第二膜层组137的第二阻水层1333总厚度为
Figure PCTCN2018102635-appb-000070
在一实施方式中，第一阻水层1331的数量可以为3个或3个以上，第二阻水层1333的数量可以为3个或3个以上，第一阻水层1331与第二阻水层1333交叠设置。
在一实施方式中，第一阻水层1331的数量可以为2个，第二阻水层1333 的数量可以为1个，第二阻水层1333设于两个第一阻水层1331之间。
在一实施方式中，不限定阻水层133的材料及厚度，阻水层133的制成材料可以为无机材料或无机有机的混合材料，例如SiOx、SiNx、LiF、MgF、MgO中的其中之一或组合。
以上所述是本发明的优选实施例，应当指出，对于本技术领域的普通技术人员来说，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也视为本发明的保护范围。

Claims (19)

  1. 一种显示面板，其特征在于，包括阻水结构，所述阻水结构包括衬底及层叠设置于所述衬底上的至少两个阻水层。
  2. 如权利要求1所述的显示面板，其特征在于，所述至少两个阻水层包括第一阻水层及第二阻水层，所述第一阻水层与所述第二阻水层交替设置，其中一个第一阻水层与所述衬底相邻设置，或者，其中一个第二阻水层与所述衬底相邻设置。
  3. 如权利要求2所述的显示面板，其特征在于，所述第一阻水层的制成材料为SiOx，所述第二阻水层的制成材料为SiNx。
  4. 如权利要求3所述的显示面板，其特征在于，所述阻水结构的反射率不大于6％。
  5. 如权利要求4所述的显示面板，其特征在于，所述阻水结构的阻水性小于10 -4gm 2/day。
  6. 如权利要求4所述的显示面板，其特征在于，所述第一阻水层的折射率小于所述第二阻水层的折射率。
  7. 如权利要求6所述的显示面板，其特征在于，所述第一阻水层的厚度大于所述第二阻水层的厚度。
  8. 如权利要求7所述的显示面板，其特征在于，所述第一阻水层的厚度大于所述第二阻水层厚度的5倍。
  9. 如权利要求7所述的显示面板，其特征在于，所述第一阻水层的厚度范围为
    Figure PCTCN2018102635-appb-100001
  10. 如权利要求9所述的显示面板，其特征在于，所述第二阻水层的厚度范围为
    Figure PCTCN2018102635-appb-100002
  11. 如权利要求1所述的显示面板，其特征在于，所述至少两个阻水层包括第一膜层组及第二膜层组，所述第一膜层组及所述第二膜层组均包括层叠设置的第一阻水层及第二阻水层。
  12. 如权利要求11所述的显示面板，其特征在于，所述第一膜层组的第一阻水层与所述衬底相邻设置，所述第一膜层组的第二阻水层与所述第二膜层组的第二阻水层总厚度范围为
    Figure PCTCN2018102635-appb-100003
  13. 如权利要求12所述的显示面板，其特征在于，所述第一膜层组的第二阻水层的厚度大于所述第二膜层组的第二阻水层的厚度。
  14. 如权利要求13所述的显示面板，其特征在于，所述第一膜层组的第二阻水层的厚度范围为
    Figure PCTCN2018102635-appb-100004
    所述第二膜层组的第二阻水层的厚度范围为
    Figure PCTCN2018102635-appb-100005
  15. 如权利要求11所述的显示面板，其特征在于，所述第一膜层组的第二阻水层与所述衬底相邻设置，所述第一膜层组的第二阻水层与所述第二膜层组的第二阻水层总厚度范围为
    Figure PCTCN2018102635-appb-100006
  16. 如权利要求15所述的显示面板，其特征在于，所述第一膜层组的第二阻水层的厚度范围为
    Figure PCTCN2018102635-appb-100007
    所述第二膜层组的第二阻水层的厚度范围为
    Figure PCTCN2018102635-appb-100008
  17. 如权利要求16所述的显示面板，其特征在于，所述第一膜层组的第二阻水层与所述第二膜层组的第二阻水层的厚度差大于或等于0并小于或等于
    Figure PCTCN2018102635-appb-100009
  18. 如权利要求1所述的显示面板，其特征在于，所述显示面板还包括分别设于所述阻水结构两侧的显示功能层及偏振层，所述偏振层与所述阻水结构的衬底相邻设置。
  19. 一种显示装置，其特征在于，包括如权利要求1-18项任意一项所述的显示面板。
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