WO2020026692A1 - Light-emitting semiconductor device - Google Patents

Light-emitting semiconductor device Download PDF

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Publication number
WO2020026692A1
WO2020026692A1 PCT/JP2019/026628 JP2019026628W WO2020026692A1 WO 2020026692 A1 WO2020026692 A1 WO 2020026692A1 JP 2019026628 W JP2019026628 W JP 2019026628W WO 2020026692 A1 WO2020026692 A1 WO 2020026692A1
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WO
WIPO (PCT)
Prior art keywords
light emitting
semiconductor light
layer
emitting device
emitting element
Prior art date
Application number
PCT/JP2019/026628
Other languages
French (fr)
Japanese (ja)
Inventor
裕輝 田沼
Original Assignee
ローム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ローム株式会社 filed Critical ローム株式会社
Priority to JP2020534128A priority Critical patent/JP7382325B2/en
Publication of WO2020026692A1 publication Critical patent/WO2020026692A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/58Optical field-shaping elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/62Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]

Definitions

  • the present disclosure relates to a semiconductor light emitting device.
  • Patent Document 1 discloses an example of a conventional semiconductor light emitting device.
  • the semiconductor light emitting device disclosed in the document includes a semiconductor laser element, which is an example of a semiconductor light emitting element, a substrate on which the semiconductor light emitting element is mounted, a case surrounding the semiconductor light emitting element, and a light-transmitting cover for closing the case.
  • the light from the semiconductor light emitting element is directly visually recognized by the naked eye.
  • the cover has a diffusion function or the like, damage to the cover or the like may lead to direct visual recognition of light from the semiconductor light emitting device.
  • the present disclosure has been conceived under the circumstances described above, and it is an object of the present disclosure to provide a semiconductor light emitting device capable of suppressing direct viewing of light from a semiconductor light emitting element caused by damage to a cover. Make it an issue.
  • a semiconductor light emitting device includes a semiconductor light emitting element, a base member and a conductive portion, a support that supports the semiconductor light emitting element, and a semiconductor that overlaps with the semiconductor light emitting element when viewed in a first direction. And a cover for transmitting light from the light emitting element.
  • the cover includes a base layer for transmitting light from the semiconductor light emitting element and a conductive layer disposed on the base layer.
  • FIG. 1 is a perspective view illustrating a semiconductor light emitting device according to a first embodiment of the present disclosure.
  • 1 is a plan view illustrating a semiconductor light emitting device according to a first embodiment of the present disclosure.
  • FIG. 1 is a main part plan view illustrating a semiconductor light emitting device according to a first embodiment of the present disclosure.
  • 1 is a bottom view illustrating a semiconductor light emitting device according to a first embodiment of the present disclosure.
  • FIG. 5 is a sectional view taken along line VV in FIG. 2.
  • FIG. 6 is a cross-sectional view along the line VI-VI in FIG. 2.
  • FIG. 7 is a sectional view taken along the line VII-VII in FIG. 2.
  • FIG. 7 is a sectional view taken along the line VIII-VIII in FIG. 2.
  • FIG. 5 is a sectional view taken along line VV in FIG. 2.
  • FIG. 6 is a cross-sectional view along the line VI-VI in FIG. 2.
  • FIG. 7 is
  • FIG. 3 is a sectional view taken along line IX-IX in FIG. 2.
  • FIG. 3 is an enlarged sectional view of a main part along line XX of FIG. 2.
  • 1 is an enlarged sectional perspective view showing a semiconductor light emitting element of a semiconductor light emitting device according to a first embodiment of the present disclosure.
  • FIG. 2 is an enlarged sectional view of a main part showing a semiconductor light emitting element of the semiconductor light emitting device according to the first embodiment of the present disclosure.
  • 1 is a system configuration diagram illustrating an example of an electronic device using a semiconductor light emitting device according to a first embodiment of the present disclosure. It is a principal part expanded sectional view which shows the modification of a cover.
  • FIG. 3 is a sectional view taken along line IX-IX in FIG. 2.
  • FIG. 3 is an enlarged sectional view of a main part along line XX of FIG. 2.
  • 1 is an enlarged sectional perspective view showing a semiconductor light emitting element of a semiconductor
  • FIG. 4 is a plan view illustrating a first modification of the semiconductor light emitting device according to the first embodiment of the present disclosure. It is a top view showing the semiconductor light emitting device concerning a 2nd embodiment of this indication.
  • FIG. 17 is a sectional view taken along the line XVII-XVII in FIG. 16.
  • FIG. 11 is a cross-sectional view illustrating a first modification of the semiconductor light emitting device according to the second embodiment of the present disclosure. It is a top view showing the semiconductor light emitting device concerning a 3rd embodiment of this indication.
  • FIG. 20 is a sectional view taken along the line XX-XX in FIG. It is a sectional view showing the semiconductor light emitting device concerning a fourth embodiment of the present disclosure.
  • FIG. 24 is a cross-sectional view of FIG. 23 taken along the line XXIV-XXIV.
  • the semiconductor light emitting device A1 of the present embodiment includes a support 1, a semiconductor light emitting element 4, a cover 5, wires 61 and 62, and a sealing resin 71.
  • FIG. 1 is a perspective view showing the semiconductor light emitting device A1.
  • FIG. 2 is a plan view showing the semiconductor light emitting device A1.
  • FIG. 3 is a main part plan view showing the semiconductor light emitting device A1.
  • FIG. 4 is a bottom view showing the semiconductor light emitting device A1.
  • FIG. 5 is a sectional view taken along line VV in FIG.
  • FIG. 6 is a sectional view taken along the line VI-VI in FIG.
  • FIG. 7 is a sectional view taken along the line VII-VII of FIG.
  • FIG. 8 is a sectional view taken along line VIII-VIII in FIG.
  • FIG. 9 is a sectional view taken along the line IX-IX of FIG.
  • FIG. 10 is an enlarged sectional view of a main part along line XX of FIG.
  • FIG. 10 is an enlarged sectional view of a main part along line XX of FIG.
  • FIG. 10 is an enlarged sectional view of a main part along line XX
  • FIG. 11 is an enlarged sectional perspective view showing the semiconductor light emitting element 4 of the semiconductor light emitting device A1.
  • FIG. 12 is an enlarged sectional view of a main part showing the semiconductor light emitting element 4 of the semiconductor light emitting device A1.
  • the z direction corresponds to a first direction of the present disclosure
  • the y direction corresponds to a second direction of the present disclosure
  • the x direction corresponds to a third direction of the present disclosure.
  • the support 1 of the present embodiment includes a first surface 11, a second surface 12, a third surface 13, a fourth surface 14, a fifth surface 15, a sixth surface 16, a seventh surface 17, an eighth surface 18, It has ninth surface 19, tenth surface 1a, eleventh surface 1b, and twelfth surface 1c.
  • the first surface 11 is a surface that faces one side in the z direction (upper side in FIG. 5).
  • the second surface 12 is a surface facing the other side in the z direction opposite to the first surface 11 (a lower side in the drawing in FIG. 5).
  • the third surface 13 is a surface facing one side in the z direction (upper side in the drawing in FIG. 5) similarly to the first surface 11, and is more distant from the second surface 12 than the first surface 11.
  • the fourth surface 14 is interposed between the first surface 11 and the third surface 13, and in the present embodiment, is connected to the first surface 11 and the third surface 13.
  • the fourth surface 14 is an annular shape surrounding the first surface 11 when viewed in the z direction.
  • the fourth surface 14 is inclined such that the distance between the opposing portions increases in the z direction from the first surface 11 to the third surface 13.
  • the fifth surface 15 is located between the first surface 11 and the third surface 13 in the z direction, and faces one side in the y direction (the right side in FIGS. 6 to 9). In the illustrated example, the fifth surface 15 is connected to the first surface 11 and the third surface 13.
  • the sixth surface 16 is located between the first surface 11 and the third surface 13 in the z direction, and faces the other side in the y direction (the left side in FIGS. 6 to 9). In the illustrated example, the sixth surface 16 is connected to the first surface 11 and the third surface 13.
  • the seventh surface 17 is located between the first surface 11 and the third surface 13 in the z direction, and faces one side in the x direction (left side in FIG. 5). In the illustrated example, the seventh surface 17 is connected to the first surface 11 and the third surface 13.
  • the eighth surface 18 is located between the first surface 11 and the third surface 13 in the z direction, and faces the other side in the x direction (the right side in FIG. 5). In the illustrated example, the eighth surface 18 is connected to the first surface 11 and the third surface 13.
  • the ninth surface 19 faces one side in the z direction, and is located between the first surface 11 and the third surface 13 in the z direction.
  • the ninth surface 19 is provided at the same position as the first surface 11 in the z direction.
  • the ninth surface 19 is disposed on the other side in the x direction with respect to the first surface 11 when viewed in the z direction (the right side in FIGS. 3 and 5).
  • the tenth surface 1a is interposed between the ninth surface 19 and the third surface 13 in the z direction, and is connected to the ninth surface 19 and the third surface 13 in the present embodiment.
  • the tenth surface 1a has an annular shape surrounding the ninth surface 19 when viewed in the z direction.
  • the tenth surface 1a is inclined such that the distance between the opposing portions increases in the z direction from the ninth surface 19 toward the third surface 13.
  • the eleventh surface 1b faces one side in the z direction, and is located between the first surface 11 and the third surface 13 in the z direction.
  • the eleventh surface 1b is provided at the same position as the first surface 11 in the z direction.
  • the eleventh surface 1b is arranged on the other side in the x direction with respect to the first surface 11 when viewed in the z direction (the right side in FIGS. 3 and 5), and on the other side in the y direction with respect to the ninth surface 19.
  • the twelfth surface 1c is interposed between the eleventh surface 1b and the third surface 13 in the z direction, and is connected to the eleventh surface 1b and the third surface 13 in the present embodiment.
  • the twelfth surface 1c is an annular shape surrounding the eleventh surface 1b when viewed in the z direction.
  • the twelfth surface 1c is inclined so that the distance between the opposing portions increases from the eleventh surface 1b toward the third surface 13 in the z direction.
  • the configuration of the support 1 is not particularly limited, and in the present embodiment, the support 1 includes the base material 2 and the conductive portion 3.
  • the base material 2 is made of an insulating material, and for example, an epoxy resin, a silicone resin, or the like is appropriately used.
  • the substrate 2 of the present embodiment includes a first surface 21, a second surface 22, a third surface 23, a fourth surface 24, a fifth surface 25, a sixth surface 26, a seventh surface 27, an eighth surface 28, It has a tenth surface 2a and a twelfth surface 2c.
  • the first surface 21 faces one side in the z direction and forms a part of the first surface 11.
  • the second surface 22 faces the other side in the z direction, and forms a part of the second surface 12.
  • the third surface 23 faces one side in the z direction, and forms the third surface 13.
  • the fourth surface 24 is located between the first surface 21 and the third surface 23 in the z direction, and forms the fourth surface 14.
  • the fifth surface 25 faces one side in the y direction, and forms the fifth surface 15.
  • the sixth surface 16 faces the other side in the y direction, and forms the sixth surface 16.
  • the seventh surface 27 faces one side in the x direction, and forms the seventh surface 17.
  • the eighth surface 28 faces the other side in the x direction, and forms the eighth surface 18.
  • the tenth surface 2a is located between the ninth surface 19 and the third surface 13 (third surface 23) in the z direction, and forms the tenth surface 1a.
  • the twelfth surface 2c is located between the eleventh surface 1b and the third surface 13 (third surface 23) in the z direction, and forms the twelfth surface 1c.
  • the conductive portion 3 forms a conduction path between the semiconductor light emitting element 4 and the outside of the semiconductor light emitting device A1.
  • the first lead 31, the second lead 32, the third lead 33, and the fourth Includes leads 34.
  • the first lead 31, the second lead 32, the third lead 33, and the fourth lead 34 are made of a metal such as Cu, Fe, and Ni.
  • the first lead 31 has a first surface 311, a second surface 312, a main portion 315, an edge portion 316, and a plurality of extending portions 317.
  • the first surface 311 is a surface facing one side in the z direction, and forms a part of the first surface 11. When viewed in the z direction, a part of the first surface 311 is exposed in a region surrounded by the fourth surface 14.
  • the second surface 312 is a surface facing the other side in the z direction opposite to the first surface 311 and forms a part of the second surface 12. In the illustrated example, the second surface 312 is smaller than the first surface 311 when viewed in the z direction, and is included in the first surface 311.
  • the main portion 315 is a portion having the first surface 311 and the second surface 312, and is a portion where both the first surface 311 and the second surface 312 overlap when viewed in the z direction.
  • the edge portion 316 is a portion surrounding the main portion 315 when viewed in the z direction, and has a part of the first surface 311. The other side in the z direction of the edge 316 is covered with the base material 2.
  • the plurality of extending portions 317 extend outward from the edge 316 when viewed in the z direction.
  • the extension part 317 has a part of the first surface 311.
  • the other side in the z direction of the extension portion 317 is covered with the base material 2.
  • the first lead 31 has three extensions 317.
  • One extension portion 317 has reached the fifth surface 25 of the base material 2, has an end surface flush with the fifth surface 25, and is exposed from the fifth surface 25.
  • the other extension 317 reaches the sixth surface 26 of the base material 2, has an end surface flush with the sixth surface 26, and is exposed from the sixth surface 26.
  • Still another extension 317 has reached the seventh surface 27 of the base material 2, has an end surface flush with the seventh surface 27, and is exposed from the seventh surface 27.
  • the second lead 32 is spaced apart from the first lead 31 on the other side in the x direction.
  • the second lead 32 has a first surface 321, a second surface 322, a main portion 325, an edge 326, and a plurality of extending portions 327.
  • the first surface 321 is a surface facing one side in the z direction, and forms a part of the first surface 11. When viewed in the z direction, a part of the first surface 321 is exposed in a region surrounded by the fourth surface 14.
  • the second surface 322 is a surface facing the other side in the z direction opposite to the first surface 321 and forms a part of the second surface 12. In the illustrated example, the second surface 322 is smaller than the first surface 321 when viewed in the z direction, and is included in the first surface 321.
  • the main portion 325 is a portion having the first surface 321 and the second surface 322, and is a portion where both the first surface 321 and the second surface 322 overlap in the z direction.
  • the edge portion 326 is a portion surrounding the main portion 325 when viewed in the z direction, and has a part of the first surface 321. The other side in the z direction of the edge 326 is covered with the base material 2.
  • the plurality of extending portions 327 extend outward from the edge 326 in the z direction.
  • the extension part 327 has a part of the first surface 321.
  • the other side of the extension 327 in the z direction is covered with the base material 2.
  • the second lead 32 has two extensions 327.
  • One extension 327 reaches the fifth surface 25 of the base material 2, has an end surface flush with the fifth surface 25, and is exposed from the fifth surface 25.
  • the other extension 327 reaches the sixth surface 26 of the base material 2, has an end surface flush with the sixth surface 26, and is exposed from the sixth surface 26.
  • the third lead 33 is arranged on the other side in the x direction with respect to the second lead 32.
  • the third lead 33 has a first surface 331, a second surface 332, a main portion 335, an edge portion 336, and a plurality of extending portions 337.
  • the first surface 331 is a surface facing one side in the z direction, and forms the ninth surface 19. When viewed in the z direction, a part of the first surface 331 is exposed in a region surrounded by the tenth surface 1a (the tenth surface 2a).
  • the second surface 332 is a surface facing the other side in the z direction on the opposite side to the first surface 331 and forms a part of the second surface 12. In the illustrated example, the second surface 332 is smaller than the first surface 331 when viewed in the z direction, and is included in the first surface 331.
  • the main portion 335 is a portion having the first surface 331 and the second surface 332, and is a portion where both the first surface 331 and the second surface 332 overlap in the z direction.
  • the edge portion 336 is a portion surrounding the main portion 335 when viewed in the z direction, and has a part of the first surface 331.
  • the other side of the edge 336 in the z direction is covered with the base material 2.
  • the plurality of extending portions 337 extend outward from the edge 336 when viewed in the z direction.
  • the extension 337 has a part of the first surface 331.
  • the other side in the z direction of the extension 337 is covered with the base material 2.
  • the third lead 33 has two extending portions 337.
  • One extension 337 has reached the fifth surface 25 of the base material 2, has an end surface flush with the fifth surface 25, and is exposed from the fifth surface 25.
  • the other extension 337 has reached the eighth surface 28 of the substrate 2, has an end surface flush with the eighth surface 28, and is exposed from the eighth surface 28.
  • the fourth lead 34 is spaced apart from the second lead 32 on the other side in the x direction, and is spaced apart from the third lead 33 on the other side in the y direction.
  • the fourth lead 34 has a first surface 341, a second surface 342, a main portion 345, an edge 346, and a plurality of extending portions 347.
  • the first surface 341 is a surface that faces one side in the z direction, and constitutes an eleventh surface 1b. When viewed in the z direction, a part of the first surface 341 is exposed in a region surrounded by the twelfth surface 1c (the twelfth surface 1c).
  • the second surface 342 is a surface facing the other side in the z direction opposite to the first surface 341 and forms a part of the second surface 12.
  • the second surface 342 is smaller than the first surface 341 when viewed in the z direction, and is included in the first surface 341.
  • the main portion 345 is a portion having the first surface 341 and the second surface 342, and is a portion where both the first surface 341 and the second surface 342 overlap when viewed in the z direction.
  • the edge portion 346 is a portion surrounding the main portion 345 when viewed in the z direction, and has a part of the first surface 341.
  • the other side in the z direction of the edge 346 is covered with the base material 2.
  • the plurality of extending portions 347 extend outward from the edge 346 when viewed in the z direction.
  • the extension part 347 has a part of the first surface 341.
  • the other side in the z direction of the extension 347 is covered with the base material 2.
  • the fourth lead 34 has two extensions 347.
  • One extension 347 reaches the sixth surface 26 of the base material 2, has an end surface flush with the sixth surface 26, and is exposed from the sixth surface 26.
  • the other extension 347 reaches the eighth surface 28 of the base material 2, has an end surface flush with the eighth surface 28, and is exposed from the eighth surface 28.
  • the semiconductor light emitting element 4 is a light source in the semiconductor light emitting device A1, and emits light in a predetermined wavelength band.
  • the specific configuration of the semiconductor light emitting device 4 is not particularly limited, and may be a semiconductor laser device, an LED device, or the like.
  • the semiconductor light emitting device 4 is a semiconductor laser device, and employs a VCSEL device.
  • the semiconductor light emitting element 4 is die-bonded to the first surface 311 (first surface 11) of the first lead 31 of the conductive part 3 by a conductive bonding material 48.
  • the conductive bonding material 48 is, for example, an Ag paste or a solder.
  • the light from the semiconductor light emitting element 4 is emitted to one side in the z direction.
  • the semiconductor light emitting element 4 is provided with the first electrode 41 and a plurality of light emitting regions 460 in plan view.
  • the plurality of light emitting regions 460 are discretely arranged in regions other than the first electrode 41 in a plan view of the semiconductor light emitting device 4.
  • the semiconductor light emitting device 4 of the present example has a first electrode 41, a second electrode 42, a second substrate 451, a fourth semiconductor layer 452, an active layer 453, a fifth semiconductor layer 454, A plurality of light emitting regions 460 are provided, including a current confinement layer 455, an insulating layer 456, and a conductive layer 457.
  • FIG. 12 shows an enlarged portion including one light emitting region 460.
  • the second substrate 451 is made of a semiconductor.
  • the semiconductor forming the second substrate 451 is, for example, n-type GaAs.
  • the semiconductor forming the second substrate 451 may be other than GaAs.
  • the active layer 453 is made of, for example, a compound semiconductor that emits light in a 980 nm band (hereinafter, referred to as “ ⁇ a”) by spontaneous emission and stimulated emission.
  • the active layer 453 is located between the fourth semiconductor layer 452 and the fifth semiconductor layer 454.
  • the multi-quantum well structure is formed by alternately stacking undoped GaAs well layers and undoped AlGaAs barrier layers (barrier layers). For example, undoped Al 0.35 Ga 0.65 As barrier layers and undoped GaAs well layers are alternately and repeatedly formed for two to six periods.
  • the fourth semiconductor layer 452 is typically a DBR (Distributed Bragg Reflector) layer, and is formed on the second substrate 451.
  • the fourth semiconductor layer 452 is made of a semiconductor having the first conductivity type.
  • the first conductivity type is an n-type.
  • the fourth semiconductor layer 452 is configured as a DBR for efficiently reflecting light emitted from the active layer 453.
  • the fourth semiconductor layer 452 is formed by stacking a plurality of pairs of two layers each of which is an AlGaAs layer having a thickness of ⁇ a / 4 and has a different reflectance.
  • the fourth semiconductor layer 452 has, for example, an n-type Al 0.16 Ga 0.84 As layer (low Al composition layer) having a thickness of, for example, 600 ° and a relatively low Al composition, and a thickness of, for example, 700 °.
  • An n-type Al 0.92 Ga 0.16 As layer having a relatively high Al composition (high Al composition layer) is alternately and repeatedly laminated for a plurality of cycles (for example, 20 cycles).
  • the n-type Al 0.16 Ga 0.84 As layer and the n-type Al 0.92 Ga 0.16 As layer have, for example, 2 ⁇ 10 17 cm ⁇ 3 to 3 ⁇ 10 18 cm ⁇ 3 and 2 ⁇ 10 17 cm ⁇ 3 to 3 ⁇ 10, respectively.
  • An n-type impurity (for example, Si) is doped at a concentration of 18 cm -3 .
  • the fifth semiconductor layer 454 is typically a DBR layer and is made of a semiconductor having the second conductivity type.
  • the second conductivity type is p-type.
  • the first conductivity type may be p-type and the second conductivity type may be n-type.
  • the fourth semiconductor layer 452 is located between the fifth semiconductor layer 454 and the second substrate 451.
  • the fifth semiconductor layer 454 is configured as a DBR for efficiently reflecting light emitted from the active layer 453. More specifically, the fifth semiconductor layer 454 is formed by stacking a plurality of pairs of two layers each of which is an AlGaAs layer having a thickness of ⁇ a / 4 and has a different reflectance.
  • the fifth semiconductor layer 454 includes, for example, a p-type Al 0.16 Ga 0.84 As layer (low Al composition layer) having a relatively low Al composition and a p-type Al 0.92 Ga 0.16 As layer (high Al composition) having a relatively high Al composition. (A composition layer) are alternately and repeatedly laminated for a plurality of cycles (for example, 20 cycles).
  • the current confinement layer 455 is located in the fifth semiconductor layer 454.
  • the current constriction layer 455 contains a large amount of Al, for example, and is made of a layer that is easily oxidized.
  • the current confinement layer 455 is formed by oxidizing this easily oxidizable layer.
  • the current confinement layer 455 is not necessarily formed by oxidation, but may be formed by another method (for example, ion implantation).
  • An opening 4551 is formed in the current confinement layer 455. A current flows through the opening 4551.
  • the insulating layer 456 is formed on the fifth semiconductor layer 454. Insulating layer 456 is made of, for example, SiO 2 . An opening 4561 is formed in the insulating layer 456.
  • the conductive layer 457 is formed on the insulating layer 456.
  • the conductive layer 457 is made of a conductive material (for example, metal).
  • the conductive layer 457 is electrically connected to the fifth conductive layer 354 through the opening 4561 of the insulating layer 456.
  • the conductive layer 457 has an opening 4571.
  • the light emitting region 460 is a region from which light from the active layer 453 is emitted directly or after reflection.
  • the light emitting region 460 has an annular shape in plan view, but the shape is not particularly limited.
  • the light emitting region 460 is formed by stacking the above-described fifth semiconductor layer 454, the current confinement layer 455, the insulating layer 456, and the conductive layer 457. And the like are provided. In the light-emitting region 460, light from the active layer 453 is emitted through the opening 4571 of the conductive layer 457.
  • the first electrode 41 is made of, for example, a metal, and is electrically connected to the fifth semiconductor layer 454.
  • the second electrode 42 is formed on the back surface of the second substrate 451, and is made of, for example, metal.
  • the second electrode 42 is die-bonded to the first surface 311 by a conductive bonding material 48 such as a paste or a solder containing a metal such as Ag. Thereby, the second electrode 42 is electrically connected to the first lead 31 of the conductive portion 3.
  • the wire 49 is connected to the first electrode 41 of the semiconductor light emitting device 4 and the first surface 321 of the second lead 32, as shown in FIGS.
  • the material of the wire 49 is not particularly limited, and is made of, for example, Au. In the present embodiment, four wires 49 are provided in parallel with each other. However, the number and arrangement of the wires 49 are not particularly limited.
  • the cover 5 covers the semiconductor light emitting element 4 when viewed in the z direction and transmits light from the semiconductor light emitting element 4.
  • the cover 5 includes a base layer 51, a diffusion layer 52, and a conductive layer 53.
  • the cover 5 is joined to the third surface 13 (third surface 23) of the support 1 by, for example, a joining material 57.
  • the bonding material 57 is, for example, an insulating adhesive made of a resin material.
  • the base layer 51 is made of a material such as glass that transmits light from the semiconductor light emitting element 4.
  • the base layer 51 is made of transparent glass.
  • the shape and the like of the base layer 51 are not particularly limited, and are rectangular in the present embodiment.
  • the diffusion layer 52 is disposed on the base material layer 51 and is a layer that diffuses and transmits light from the semiconductor light emitting element 4.
  • An example of the diffusion layer 52 is an epoxy resin layer that has been subjected to an optical process for realizing a diffusion function.
  • the diffusion layer 52 is provided on the surface of the base layer 51 facing the semiconductor light emitting element 4. In the illustrated example, the diffusion layer 52 is provided on one entire surface of the base layer 51.
  • the conductive layer 53 is disposed on the base layer 51 and is a layer made of a conductor. In the illustrated example, the conductive layer 53 is provided on the opposite side of the base layer 51 from the diffusion layer 52. In FIG. 2, the conductive layer 53 is hatched for convenience of understanding.
  • the conductive layer 53 of the present embodiment has pad portions 531 and 532 and a wiring portion 533.
  • the pad portions 531 and 532 are connection portions with the conductive portion 3.
  • the pad portions 531 and 532 are formed in the base layer 51 at a portion closer to the other side in the x direction.
  • the pad portion 531 and the pad portion 532 are arranged apart from each other in the y direction.
  • the wiring portion 533 is connected to the pad portion 531 and the pad portion 532, and is a portion for electrically connecting the pad portion 531 and the pad portion 532.
  • the shape of the wiring portion 533 is not particularly limited, and in the illustrated example, the wiring portion 533 includes the first portion 5331, the second portion 5332, the third portion 5333, the fourth portion 5334, the fifth portion 5335, and the sixth portion. It has a portion 5336, a seventh portion 5337, an eighth portion 5338, and a ninth portion 5339.
  • the pad portion 5311 is connected to the pad portion 531 and extends from the pad portion 531 to one side in the y direction.
  • the second portion 5332 is connected to the first portion 5331 and extends in the x direction.
  • the third portion 5333 is connected to the second portion 5332 and extends in the y direction.
  • the fourth portion 5334 is connected to the third portion 5333 and extends in the x direction.
  • the fifth portion 5335 is connected to the fourth portion 5334 and extends in the y direction.
  • the sixth portion 5336 is connected to the fifth portion 5335 and extends in the x direction.
  • the seventh portion 5337 is connected to the sixth portion 5336, and extends in the y direction.
  • the eighth portion 5338 is connected to the seventh portion 5337 and extends in the x direction.
  • the ninth portion 5339 is connected to the eighth portion 5338 and the pad portion 532, and extends in the y direction.
  • the conductive layer 53 is provided at a position retracted from the semiconductor light emitting element 4 when viewed in the z direction.
  • the conductive layer 53 includes a portion (second portion 5332) located on one side in the y direction and a portion located on one side in the x direction (third portion 5333) with respect to the semiconductor light emitting element 4 when viewed in the z direction.
  • the conductive layer 53 has portions (second portion 5332 and fourth portion 5334) located on both sides in the y direction with respect to the semiconductor light emitting device 4.
  • the conductive layer 53 has portions (third portion 5333 and fifth portion 5335) located on both sides in the x direction with respect to the semiconductor light emitting device 4.
  • the illustrated wiring portion 533 of the conductive layer 53 has a shape surrounding the semiconductor light emitting element 4 when viewed in the z direction.
  • the pad portions 531 and 532 overlap the third surface 13 when viewed in the z direction.
  • the first portion 5331, the second portion 5332, the third portion 5333, the fourth portion 5334, the eighth portion 5338, and the ninth portion 5339 overlap the third surface 13 when viewed in the z direction.
  • the fifth portion 5335, the sixth portion 5336, and the seventh portion 5337 overlap the first surface 11 when viewed in the z direction.
  • the conductive layer 53 of the present embodiment includes a first layer 53a and a second layer 53b.
  • the first layer 53a is formed directly on the base material layer 51.
  • the second layer 53b is formed on the first layer 53a.
  • the material of the first layer 53a and the second layer 53b is not particularly limited.
  • the material of the first layer 53a is, for example, Ti, and the material of the second layer 53b is, for example, Au.
  • the first layer 53a and the second layer 53b are formed, for example, by plating or the like. In the illustrated example, the first layer 53a is formed of one plating layer, and the second layer 53b is formed of a plurality of plating layers.
  • the pad portion 531 includes a first layer 53a and a second layer 53b including a plurality of plating layers. The same applies to the second part 5332.
  • the wiring portion 533 includes a first layer 53a and a second layer 53b including, for example, only one plating layer. Thus, the thickness of the pad portions 531 and 532 is larger than the thickness of the wiring portion 533.
  • the wire 61 is connected to the first surface 331 (the ninth surface 19) of the third lead 33 and the pad portion 531 as shown in FIGS.
  • the material of the wire 61 is not particularly limited, and is made of, for example, Au.
  • the wire 62 is connected to the first surface 341 (the eleventh surface 1b) of the fourth lead 34 and the pad 532, as shown in FIGS.
  • the material of the wire 62 is not particularly limited, and is made of, for example, Au.
  • the sealing resin 71 is made of an insulating resin such as a silicone resin or an epoxy resin.
  • the sealing resin 71 covers the wires 61 and 62.
  • the sealing resin 71 is filled in the concave portion defined by the ninth surface 19 and the tenth surface 1a and the concave portion defined by the eleventh surface 1b and the twelfth surface 1c. .
  • the sealing resin 71 covers the pad portion 531 and the pad portion 532, and exposes most of the wiring portion 533.
  • FIG. 13 is a system configuration diagram showing an example of an electronic apparatus using the semiconductor light emitting device A1.
  • the electronic device C1 shown in the figure has a semiconductor light emitting device A1 and a controller Ct.
  • the semiconductor light emitting device A1 and the controller Ct are mounted on, for example, a circuit board (not shown).
  • the second lead 32 is electrically connected to the anode electrode of the semiconductor light emitting element 4
  • the first lead 31 is electrically connected to the cathode electrode of the semiconductor light emitting element 4.
  • the third lead 33 and the fourth lead 34 are electrically connected to the conductive layer 53 of the cover 5.
  • the first lead 31, the second lead 32, the third lead 33, and the fourth lead 34 are connected to the controller Ct via wiring.
  • the controller Ct performs light emission control of the semiconductor light emitting element 4 and detection control of the conduction state of the conductive layer 53.
  • the controller Ct can stop the light emission of the semiconductor light emitting element 4, for example. Therefore, it is possible to prevent the light from the semiconductor light emitting element 4 caused by the damage of the cover 5 from being directly viewed.
  • the conductive layer 53 is made of metal. Therefore, the cost can be reduced as compared with the case where the conductive layer 53 is formed using ITO or the like.
  • the conductive layer 53 is provided at a position retracted from the semiconductor light emitting element 4 when viewed in the z direction. Therefore, it is possible to prevent the metal 53 from blocking the light emitted from the semiconductor light emitting element 4.
  • the conductive layer 53 includes a portion (second portion 5332) located on one side in the y direction with respect to the semiconductor light emitting element 4 and a portion located on one side in the x direction (third portion 5333) when viewed in the z direction. And Accordingly, it is possible to detect both the case where the base layer 51 has a crack along the x direction and the case where the base layer 51 has a crack along the y direction.
  • the conductive layer 53 has portions (second portion 5332 and fourth portion 5334) located on both sides in the y direction with respect to the semiconductor light emitting device 4.
  • the conductive layer 53 has portions (third portion 5333 and fifth portion 5335) located on both sides in the x direction with respect to the semiconductor light emitting device 4.
  • the pad portion 531 and the pad portion 532 are thicker than the wiring portion 533. Thereby, the wire 61 and the wire 62 can be more reliably bonded. Further, since the wiring portion 533 is relatively thin, the wiring portion 533 can be more quickly disconnected when a crack or the like occurs in the base material layer 51.
  • the wire 61 is connected to the third lead 33, and the wire 62 is connected to the fourth lead 34.
  • the second surface 332 of the third lead 33 and the second surface 342 of the fourth lead 34 constitute the second surface 12 of the support 1 and are exposed. This allows the conductive layer 53 to be appropriately connected to a controller or the like (not shown) when the semiconductor light emitting device A1 is mounted.
  • FIGS. 14 to 24 show modifications and other embodiments of the present disclosure.
  • the same or similar elements as those in the above embodiment are denoted by the same reference numerals as those in the above embodiment.
  • FIG. 14 shows a modification of the cover 5.
  • the cover 5 of the present example is different from the cover 5 of the above-described example in the configuration of the conductive layer 53.
  • the second layer 53b is provided on a part of the conductive layer 53.
  • the pad section 531 and the pad section 532 have a first layer 53a and a second layer 53b.
  • the wiring section 533 is composed of only the second layer 53b and does not include the first layer 53a.
  • the wiring section 533 is composed of only the first layer 53a.
  • the first layer 53a is made of, for example, Ti
  • Ti is a material that is more brittle than Au, which is the material of the second layer 53b. Accordingly, when a crack or the like occurs in the base material layer 51, it is preferable to disconnect the wiring portion 533 more quickly.
  • FIG. 15 shows a first modification of the semiconductor light emitting device A1.
  • the semiconductor light emitting device A11 of this example has a wiring portion 533 different from the wiring portion 533 of the semiconductor light emitting device A1.
  • the wiring portion 533 of this example includes a first portion 5331, a second portion 5332, a third portion 5333, a fourth portion 5334, and a ninth portion 5339, and the above-described fifth portion 5335, sixth portion 5336, It does not have the seventh part 5337 and the eighth part 5338.
  • the fourth part 5334 is connected to the third part 5333 and the ninth part 5339.
  • the conductive layer 53 of this example has portions (second portion 5332 and fourth portion 5334) located on both sides in the y direction with respect to the semiconductor light emitting device 4.
  • the conductive layer 53 has a portion (third portion 5333) located on one side in the x direction with respect to the semiconductor light emitting device 4.
  • the illustrated wiring portion 533 of the conductive portion 3 has a shape surrounding the semiconductor light emitting element 4 on three sides when viewed in the z direction.
  • the semiconductor light emitting device A11 according to the present embodiment can also suppress direct viewing of light from the semiconductor light emitting element 4 due to damage to the cover 5.
  • the shape of the conductive layer 53 (the wiring portion 533) is not particularly limited.
  • FIG. 16 and 17 show a semiconductor light emitting device according to the second embodiment of the present disclosure.
  • FIG. 16 is a plan view showing a semiconductor light emitting device A2 of the present embodiment.
  • FIG. 17 is a sectional view taken along the line XVI-XVI in FIG.
  • the support 1 does not have the ninth surface 19, the tenth surface 1a, the eleventh surface 1b, and the twelfth surface 1c in the semiconductor light emitting device A1 described above.
  • the conductive portion 3 has a columnar portion 371 and a columnar portion 372.
  • the columnar portion 371 overlaps with the third lead 33 when viewed in the z direction, and penetrates the base material 2 from the third surface 23 (the third surface 13) to the first surface 331 of the third lead 33.
  • the columnar portion 371 is made of, for example, the same material (Cu or the like) as the third lead 33.
  • the columnar portion 371 is joined to the third lead 33 by, for example, eutectic joining.
  • the columnar portion 372 overlaps the fourth lead 34 as viewed in the z direction, and penetrates the substrate 2 from the third surface 23 (the third surface 13) to the first surface 341 of the base 34.
  • the columnar portion 372 is made of, for example, the same material (Cu or the like) as the fourth lead 34.
  • the columnar portion 372 is joined to the fourth lead 34 by, for example, eutectic joining.
  • the diffusion layer 52 and the conductive layer 53 are provided on the surface of the base layer 51 facing the semiconductor light emitting element 4.
  • the diffusion layer 52 is provided so as to overlap the semiconductor light emitting element 4 when viewed in the z direction, and is separated from the conductive layer 53.
  • the wiring portion 533 of the conductive layer 53 has a shape surrounding the semiconductor light emitting element 4 when viewed in the z direction, similarly to the wiring portion 533 of the above-described embodiment.
  • the wiring portion 533 has a shape surrounding the diffusion layer 52 when viewed in the z direction.
  • the second part 5332, the third part 5333, and the fourth part 5334 overlap the first surface 11 when viewed in the z direction.
  • the fifth portion 5335, the sixth portion 5336, and the seventh portion 5337 overlap with the third surface 13 when viewed in the z direction.
  • the pad portion 531 and the columnar portion 371 are joined by the conductive joining material 59 and are electrically connected to each other.
  • the conductive bonding material 59 is, for example, an Ag paste or a solder.
  • the pad portion 532 and the columnar portion 372 are similarly joined by the conductive joining material 59 and are electrically connected to each other.
  • FIG. 18 is a sectional view showing a first modification of the semiconductor light emitting device A2.
  • the diffusion layer 52 is interposed between the base layer 51 and the conductive layer 53.
  • the diffusion layer 52 is formed on one entire surface of the base layer 51.
  • the diffusion layer 52 made of an epoxy resin layer has a larger coefficient of thermal expansion than the base layer 51 made of glass or the like, and is easily deformed by heat.
  • the conductive layer 53 is a layer containing Au, for example, it has excellent ductility. Therefore, the conductive layer 53 can easily follow the thermal deformation of the diffusion layer 52, and it is possible to suppress disconnection of the conductive layer 53 due to a temperature change, and it is erroneously detected that a crack has occurred in the cover 5 (base layer 51). Can be avoided.
  • FIG. 19 and 20 show a semiconductor light emitting device according to the third embodiment of the present disclosure.
  • FIG. 19 is a plan view showing the semiconductor light emitting device A3 of the present embodiment.
  • FIG. 20 is a sectional view taken along line XX-XX in FIG.
  • the support 1 of the present embodiment includes the first surface 11, the second surface 12, the third surface 13, the fourth surface 14, the fifth surface 15, the sixth surface 16, and the first surface 11, the second surface 12, and the third surface 13 of the support 1 of the semiconductor light emitting device A2. It has a thirteenth surface 1d and a fourteenth surface 1e in addition to the seventh surface 17 and the eighth surface 18.
  • the thirteenth surface 1d is a surface facing one side in the z direction similarly to the first surface 11, and is located between the first surface 11 and the third surface 13 in the z direction.
  • the thirteenth surface 1d is an annular shape surrounding the first surface 11 and the fourth surface 14 when viewed in the z direction.
  • the fourteenth surface 1e is located between the thirteenth surface 1d and the third surface 13 in the z direction, and is connected to the thirteenth surface 1d and the third surface 13 in the illustrated example.
  • the fourteenth surface 1e is inclined such that the distance between the opposing portions increases in the z direction from the thirteenth surface 1d toward the third surface 13.
  • the base material 2 of the present embodiment has a thirteenth surface 2d and a fourteenth surface 2e.
  • the thirteenth surface 2d is a surface constituting the thirteenth surface 1d.
  • the fourteenth surface 2e is a surface that constitutes the fourteenth surface 1e.
  • the cover 5 of the present embodiment includes a base layer 51, a diffusion layer 52, a conductive layer 53, and a base layer 54.
  • a conductive layer 53 is formed on a surface of the base layer 51 facing the semiconductor light emitting element 4.
  • the base material layer 51 is joined to the third surface 13 of the support 1 by a joining material 57.
  • the pad 531 of the conductive layer 53 is conductively connected to the column 371, and the pad 532 is conductively connected to the column 372.
  • the base layer 54 is made of a material such as glass that transmits light from the semiconductor light emitting element 4.
  • the base layer 54 is made of transparent glass.
  • the shape and the like of the base layer 54 are not particularly limited, and are rectangular in the present embodiment.
  • the diffusion layer 52 is formed on the surface of the base layer 54 facing the semiconductor light emitting element 4, and is formed on one entire surface of the base layer 54.
  • the base material layer 54 is joined to the thirteenth surface 1 d of the support 1 by a joining material 58.
  • the base layer 51 and the base layer 54 both overlap the semiconductor light emitting element 4 when viewed in the z direction.
  • the cover 5 is not limited to the configuration in which the diffusion layer 52 and the conductive layer 53 are formed on the same member.
  • FIG. 21 is a cross-sectional view illustrating a semiconductor light emitting device A4 according to the fourth embodiment of the present disclosure.
  • the support 1 of the present embodiment has a similar structure to the support 1 of the semiconductor light emitting device A1, but has a specific structure different from that of the semiconductor light emitting device A1, and is formed of a so-called multilayer wiring board.
  • the base material 2 of the present embodiment includes a first layer 201 and a second layer 202.
  • the first layer 201 and the second layer 202 are each made of an insulating material, for example, glass epoxy resin.
  • the conductive part 3 includes a first part 381, a second part 382, a third part 383, a fifth part 385, a sixth part 386, a seventh part 387, a ninth part 389, a tenth part 38a, and an eleventh part 38b.
  • the first part 381, the second part 382, the third part 383, the fifth part 385, the sixth part 386, the seventh part 387, the ninth part 389, the tenth part 38a and the eleventh part 38b are made of metal, For example, it is made of a plating layer of Cu, Ni, Au or the like.
  • the first portion 381 is formed on the first layer 201, and has the same shape, size, and arrangement as viewed in the z direction, for example, as the first surface 311 of the semiconductor light emitting device A1.
  • the second portion 382 is formed on the first layer 201, and has the same shape, size, and arrangement as viewed in the z direction, for example, as the first surface 321 of the semiconductor light emitting device A1.
  • the third portion 383 is formed on the first layer 201, and has the same shape, size, and arrangement as viewed in the z direction, for example, as the first surface 331 of the semiconductor light emitting device A1.
  • the semiconductor light emitting device A1 may further include a portion having the same shape, size, and arrangement as the first surface 341 in the semiconductor light emitting device A1 when viewed in the z direction.
  • the fifth portion 385 is formed on the second surface 22 of the first layer 201, and has the same shape, size, and arrangement as viewed in the z direction, for example, as the second surface 312 of the semiconductor light emitting device A1.
  • the sixth portion 386 is formed on the second surface 22 of the first layer 201, and has the same shape, size, and arrangement as viewed in the z direction, for example, as the second surface 322 of the semiconductor light emitting device A1.
  • the seventh portion 387 is formed on the second surface 22 of the first layer 201, and has the same shape, size, and arrangement as viewed in the z direction, for example, as the second surface 332 of the semiconductor light emitting device A1.
  • the semiconductor light emitting device A1 may further include a portion having the same shape, size, and arrangement as the second surface 342 in the semiconductor light emitting device A1 as viewed in the z direction.
  • the ninth part 389 penetrates the first layer 201 in the z direction, and is connected to the first part 381 and the fifth part 385.
  • the tenth portion 38a penetrates the first layer 201 in the z direction, and is connected to the second portion 382 and the sixth portion 386.
  • the eleventh part 38b penetrates the first layer 201 in the z direction, and is connected to the third part 383 and the seventh part 387.
  • the shape, size and arrangement in the z direction are the same as those of the first surface 341 in the semiconductor light emitting device A1
  • the shape, size and arrangement in the z direction are the same as the second surface 342 in the semiconductor light emitting device A1. It may further have a part connected to a certain part.
  • the specific structure of the support 1 is not limited at all.
  • FIG. 22 is a cross-sectional view illustrating a semiconductor light emitting device A5 according to the fifth embodiment of the present disclosure.
  • the support 1 of this embodiment has a similar structure to the support 1 of the semiconductor light emitting device A1, but has a specific structure different from that of the semiconductor light emitting device A1, and is made of a so-called ceramic wiring board.
  • the base material 2 of the present embodiment includes a first layer 201, a second layer 202, and a third layer 203.
  • the first layer 201, the second layer 202, and the third layer 203 are each made of a ceramic such as alumina.
  • the fourth surface 10, the tenth surface 1a, and the twelfth surface 1c of the present embodiment have a shape along the z direction.
  • the configuration of the conductive section 3 is similar to, for example, the conductive section 3 in the semiconductor light emitting device A4.
  • the specific structure of the support 1 is not limited at all.
  • FIG. 23 is a plan view showing a semiconductor light emitting device A6 according to the sixth embodiment of the present disclosure
  • FIG. 24 is a cross-sectional view taken along the line XXIV-XXIV of FIG.
  • the semiconductor light emitting device A6 of the present embodiment includes a light receiving element 8.
  • the conductive portion 3 of the present embodiment includes a fifth lead 35 and a sixth lead 36.
  • the fifth lead 35 is spaced apart from the first lead 31 on one side in the x direction.
  • the fifth lead 35 has a first surface 351, a second surface 352, a main portion 355, an edge 356, and a plurality of extending portions 357.
  • the first surface 351 is a surface facing one side in the z direction, and forms the first surface 11. When viewed in the z direction, a part of the first surface 351 is exposed to a region surrounded by the fourth surface 14 (the fourth surface 24).
  • the second surface 352 is a surface facing the other side in the z direction opposite to the first surface 351 and forms a part of the second surface 12. In the illustrated example, the second surface 352 is smaller than the first surface 351 when viewed in the z direction, and is included in the first surface 351.
  • the main portion 355 is a portion having the first surface 351 and the second surface 352, and is a portion where both the first surface 351 and the second surface 352 overlap in the z direction.
  • the edge portion 356 is a portion surrounding the main portion 355 when viewed in the z direction, and has a part of the first surface 351.
  • the other side in the z direction of the edge 356 is covered with the base material 2.
  • the plurality of extending portions 357 extend outward from the edge 356 when viewed in the z direction.
  • the extension 357 has a part of the first surface 351.
  • the other side in the z direction of the extension 357 is covered with the base material 2.
  • the fifth lead 35 has two extensions 357.
  • One extension 357 has reached the fifth surface 25 of the base material 2, has an end surface flush with the fifth surface 25, and is exposed from the fifth surface 25.
  • the other extension 357 reaches the seventh surface 27 of the base material 2, has an end surface flush with the seventh surface 27, and is exposed from the seventh surface 27.
  • the sixth lead 36 is spaced apart from the first lead 31 on one side in the x direction, and is spaced apart from the fifth lead 35 on the other side in the y direction.
  • the sixth lead 36 has a first surface 361, a second surface 362, a main portion 365, an edge 366, and a plurality of extending portions 367.
  • the first surface 361 is a surface facing one side in the z direction, and forms the first surface 11. When viewed in the z direction, a part of the first surface 361 is exposed in a region surrounded by the fourth surface 14 (the fourth surface 24).
  • the second surface 362 is a surface facing the other side in the z direction opposite to the first surface 361 and forms a part of the second surface 12. In the illustrated example, the second surface 362 is smaller than the first surface 361 when viewed in the z direction, and is included in the first surface 361.
  • the main portion 365 is a portion having the first surface 361 and the second surface 362, and is a portion where both the first surface 361 and the second surface 362 overlap in the z direction.
  • the edge 366 is a portion surrounding the main portion 365 when viewed in the z direction, and has a part of the first surface 361.
  • the other side of the edge 366 in the z direction is covered with the base material 2.
  • the plurality of extending portions 367 extend outward from the edge 366 when viewed in the z direction.
  • the extension 367 has a part of the first surface 361.
  • the other side of the extension 367 in the z direction is covered with the base material 2.
  • the sixth lead 36 has two extensions 367.
  • One extension 367 reaches the sixth surface 26 of the base material 2, has an end surface flush with the sixth surface 26, and is exposed from the sixth surface 26.
  • the other extension 367 reaches the seventh surface 27 of the substrate 2, has an end surface flush with the seventh surface 27, and is exposed from the seventh surface 27.
  • the light receiving element 8 is an element having a photoelectric conversion function of generating electromotive force by receiving light emitted from the semiconductor light emitting element 4.
  • the light receiving element 8 is die-bonded to the first surface 351 of the fifth lead 35 by a conductive bonding material 88 such as a paste or a solder containing a metal such as Ag.
  • the light receiving element 8 is connected to the first surface 361 of the sixth lead 36 by a wire 89.
  • the wire 89 is made of a metal such as Au, for example, and is bonded to the light receiving element 8 and the first surface 361, respectively.
  • the wiring portion 533 (third portion 5333) of the conductive layer 53 overlaps the light receiving element 8 when viewed in the z direction.
  • the provision of the light receiving element 8 enables the light emitting state of the semiconductor light emitting element 4 to be monitored from the output signal of the light receiving element 8.
  • the third portion 5333 overlaps with the light receiving element 8 when viewed in the z direction.
  • part of the light from the semiconductor light emitting element 4 can be reflected by the third portion 5333 (wiring portion 533) made of metal and directed to the light receiving element 8. Therefore, the light emission state of the light receiving element 8 can be monitored with higher accuracy.
  • the semiconductor light emitting device according to the present disclosure is not limited to the embodiments described above.
  • the specific configuration of each part of the semiconductor light emitting device according to the present disclosure can be variously changed in design.
  • [Appendix 1] A semiconductor light emitting device; Having a substrate and a conductive portion, a support for supporting the semiconductor light emitting element, A cover that overlaps with the semiconductor light emitting element when viewed in a first direction and transmits light from the semiconductor light emitting element; The semiconductor light emitting device, wherein the cover includes a base layer that transmits light from the semiconductor light emitting element and a conductive layer disposed on the base layer.
  • the conductive layer is provided at a position retracted from the semiconductor light emitting element when viewed in the first direction.
  • the conductive layer has a portion positioned on one side in a second direction perpendicular to the first direction with respect to the semiconductor light emitting element when viewed in the first direction, and in any of the first direction and the second direction. 3.
  • Appendix 5 5.
  • the semiconductor light emitting device according to any one of supplementary notes 3 to 5, wherein the conductive layer is made of a metal.
  • Appendix 7 7. The semiconductor light emitting device according to claim 6, wherein the conductive layer includes a pad portion that is a connection portion with the conductive portion, and a wiring portion connected to the pad portion.
  • Appendix 8 8. The semiconductor light emitting device according to claim 7, wherein a thickness of the pad portion is larger than a thickness of the wiring portion.
  • Appendix 9 9. The semiconductor light emitting device according to claim 8, wherein the conductive layer includes a first layer and a second layer stacked on each other.
  • Appendix 10 The semiconductor light emitting device according to claim 9, wherein the first layer is exposed from the second layer in the wiring section.
  • [Appendix 11] The semiconductor light emitting device according to any one of supplementary notes 3 to 10, wherein the cover includes a diffusion layer that diffuses light from the semiconductor light emitting element.
  • Appendix 12] The semiconductor light emitting device according to claim 11, wherein the conductive layer is disposed on a side opposite to the diffusion layer with the base layer interposed therebetween.
  • Appendix 13] The semiconductor light emitting device according to claim 11, wherein the conductive layer is arranged on the same side as the diffusion layer with respect to the base layer.
  • [Appendix 14] The semiconductor light emitting device according to claim 13, wherein the diffusion layer is separated from the conductive layer when viewed in the first direction.
  • the support has a first surface on which the semiconductor light emitting element is arranged and faces the first direction, a second surface facing the opposite side to the first surface, a first surface facing the same side as the first surface and the first surface. A third surface surrounding the first surface and a fourth surface interposed between the first surface and the third surface in the first direction as viewed from the first direction;
  • the semiconductor light emitting device according to any one of supplementary notes 3 to 14, wherein the cover is supported on the third surface.
  • the semiconductor light emitting device according to any one of supplementary notes 3 to 14, wherein the cover is supported on the third surface.
  • the semiconductor light emitting device includes a columnar portion that is electrically connected to the conductive layer and penetrates the base material in the first direction.
  • the semiconductor light emitting element is a VCSEL element.

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Abstract

This light-emitting semiconductor device A1 comprises: a semiconductor light emitting element 4; a support 1 that has a base 2 and an electrically conductive part 3, and that supports the semiconductor light emitting element 4; and a cover 5 that overlaps the semiconductor light emitting element 4 in the z axis direction, and that transmits light from the semiconductor light emitting element 4, wherein the cover 5 includes a base layer 51 that transmits light from the semiconductor light emitting element 4 and that is placed on the base 51 layer. By using such a configuration, it is possible to suppress direct viewing of light from the semiconductor light emitting element due to damage to the cover.

Description

半導体発光装置Semiconductor light emitting device
 本開示は、半導体発光装置に関する。 The present disclosure relates to a semiconductor light emitting device.
 半導体発光素子を光源として備えた半導体発光装置が広く提案されている。特許文献1には、従来の半導体発光装置の一例が開示されている。同文献に開示された半導体発光装置は、半導体発光素子の一例である半導体レーザ素子と、半導体発光素子が搭載された基板と、半導体発光素子を囲むケースと、ケースを塞ぐ透光性を有するカバーとを備えている。 半導体 A semiconductor light emitting device including a semiconductor light emitting element as a light source has been widely proposed. Patent Document 1 discloses an example of a conventional semiconductor light emitting device. The semiconductor light emitting device disclosed in the document includes a semiconductor laser element, which is an example of a semiconductor light emitting element, a substrate on which the semiconductor light emitting element is mounted, a case surrounding the semiconductor light emitting element, and a light-transmitting cover for closing the case. And
特開2015-123378号公報JP-A-2015-123378
 半導体発光素子からの光は、肉眼で直接視認することは好ましくない。カバーが拡散機能を有する等の場合には、カバーの損傷等が半導体発光素子からの光を直接視認してしまうことに繋がりかねない。 光 It is not preferable that the light from the semiconductor light emitting element is directly visually recognized by the naked eye. In the case where the cover has a diffusion function or the like, damage to the cover or the like may lead to direct visual recognition of light from the semiconductor light emitting device.
 本開示は、上記した事情のもとで考え出されたものであって、カバーの損傷に起因した半導体発光素子からの光を直接視認することを抑制可能な半導体発光装置を提供することをその課題とする。 The present disclosure has been conceived under the circumstances described above, and it is an object of the present disclosure to provide a semiconductor light emitting device capable of suppressing direct viewing of light from a semiconductor light emitting element caused by damage to a cover. Make it an issue.
 本開示によって提供される半導体発光装置は、半導体発光素子と、基材および導電部を有し、前記半導体発光素子を支持する支持体と、第1方向視において前記半導体発光素子に重なり且つ前記半導体発光素子からの光を透過させるカバーと、を備えており、前記カバーは、前記半導体発光素子からの光を透過させる基材層および前記基材層上に配置された導電層を含む。 A semiconductor light emitting device provided by the present disclosure includes a semiconductor light emitting element, a base member and a conductive portion, a support that supports the semiconductor light emitting element, and a semiconductor that overlaps with the semiconductor light emitting element when viewed in a first direction. And a cover for transmitting light from the light emitting element. The cover includes a base layer for transmitting light from the semiconductor light emitting element and a conductive layer disposed on the base layer.
 本開示のその他の特徴および利点は、添付図面を参照して以下に行う詳細な説明によって、より明らかとなろう。 Other features and advantages of the present disclosure will become more apparent from the detailed description given below with reference to the accompanying drawings.
本開示の第1実施形態に係る半導体発光装置を示す斜視図である。1 is a perspective view illustrating a semiconductor light emitting device according to a first embodiment of the present disclosure. 本開示の第1実施形態に係る半導体発光装置を示す平面図である。1 is a plan view illustrating a semiconductor light emitting device according to a first embodiment of the present disclosure. 本開示の第1実施形態に係る半導体発光装置を示す要部平面図である。FIG. 1 is a main part plan view illustrating a semiconductor light emitting device according to a first embodiment of the present disclosure. 本開示の第1実施形態に係る半導体発光装置を示す底面図である。1 is a bottom view illustrating a semiconductor light emitting device according to a first embodiment of the present disclosure. 図2のV-V線に沿う断面図である。FIG. 5 is a sectional view taken along line VV in FIG. 2. 図2のVI-VI線に沿う断面図である。FIG. 6 is a cross-sectional view along the line VI-VI in FIG. 2. 図2のVII-VII線に沿う断面図である。FIG. 7 is a sectional view taken along the line VII-VII in FIG. 2. 図2のVIII-VIII線に沿う断面図である。FIG. 7 is a sectional view taken along the line VIII-VIII in FIG. 2. 図2のIX-IX線に沿う断面図である。FIG. 3 is a sectional view taken along line IX-IX in FIG. 2. 図2のX-X線に沿う要部拡大断面図である。FIG. 3 is an enlarged sectional view of a main part along line XX of FIG. 2. 本開示の第1実施形態に係る半導体発光装置の半導体発光素子を示す拡大断面斜視図である。1 is an enlarged sectional perspective view showing a semiconductor light emitting element of a semiconductor light emitting device according to a first embodiment of the present disclosure. 本開示の第1実施形態に係る半導体発光装置の半導体発光素子を示す要部拡大断面図である。FIG. 2 is an enlarged sectional view of a main part showing a semiconductor light emitting element of the semiconductor light emitting device according to the first embodiment of the present disclosure. 本開示の第1実施形態に係る半導体発光装置が用いられた電子機器の一例を示すシステム構成図である。1 is a system configuration diagram illustrating an example of an electronic device using a semiconductor light emitting device according to a first embodiment of the present disclosure. カバーの変形例を示す要部拡大断面図である。It is a principal part expanded sectional view which shows the modification of a cover. 本開示の第1実施形態に係る半導体発光装置の第1変形例を示す平面図である。FIG. 4 is a plan view illustrating a first modification of the semiconductor light emitting device according to the first embodiment of the present disclosure. 本開示の第2実施形態に係る半導体発光装置を示す平面図である。It is a top view showing the semiconductor light emitting device concerning a 2nd embodiment of this indication. 図16のXVII-XVII線に沿う断面図である。FIG. 17 is a sectional view taken along the line XVII-XVII in FIG. 16. 本開示の第2実施形態に係る半導体発光装置の第1変形例を示す断面図である。FIG. 11 is a cross-sectional view illustrating a first modification of the semiconductor light emitting device according to the second embodiment of the present disclosure. 本開示の第3実施形態に係る半導体発光装置を示す平面図である。It is a top view showing the semiconductor light emitting device concerning a 3rd embodiment of this indication. 図19のXX-XX線に沿う断面図である。FIG. 20 is a sectional view taken along the line XX-XX in FIG. 本開示の第4実施形態に係る半導体発光装置を示す断面図である。It is a sectional view showing the semiconductor light emitting device concerning a fourth embodiment of the present disclosure. 本開示の第5実施形態に係る半導体発光装置を示す断面図である。It is a sectional view showing the semiconductor light emitting device concerning a 5th embodiment of this indication. 本開示の第6実施形態に係る半導体発光装置を示す平面図である。It is a top view showing the semiconductor light emitting device concerning a 6th embodiment of this indication. 図23のXXIV-XXIV線に沿う断面図である。FIG. 24 is a cross-sectional view of FIG. 23 taken along the line XXIV-XXIV.
 以下、本開示の好ましい実施の形態につき、図面を参照して具体的に説明する。 Hereinafter, preferred embodiments of the present disclosure will be specifically described with reference to the drawings.
 本開示における「第1」、「第2」、「第3」等の用語は、単にラベルとして用いたものであり、必ずしもそれらの対象物に順列を付することを意図していない。 用語 Terms such as “first”, “second”, and “third” in the present disclosure are used simply as labels and are not necessarily intended to permutate those objects.
<第1実施形態>
 図1~図12は、本開示の第1実施形態に係る半導体発光装置を示している。本実施形態の半導体発光装置A1は、支持体1、半導体発光素子4、カバー5、ワイヤ61,62および封止樹脂71を備えている。
<First embodiment>
1 to 12 show a semiconductor light emitting device according to a first embodiment of the present disclosure. The semiconductor light emitting device A1 of the present embodiment includes a support 1, a semiconductor light emitting element 4, a cover 5, wires 61 and 62, and a sealing resin 71.
 図1は、半導体発光装置A1を示す斜視図である。図2は、半導体発光装置A1を示す平面図である。図3は、半導体発光装置A1を示す要部平面図である。図4は、半導体発光装置A1を示す底面図である。図5は、図2のV-V線に沿う断面図である。図6は、図2のVI-VI線に沿う断面図である。図7は、図2のVII-VII線に沿う断面図である。図8は、図2のVIII-VIII線に沿う断面図である。図9は、図2のIX-IX線に沿う断面図である。図10は、図2のX-X線に沿う要部拡大断面図である。図11は、半導体発光装置A1の半導体発光素子4を示す拡大断面斜視図である。図12は、半導体発光装置A1の半導体発光素子4を示す要部拡大断面図である。これらの図において、z方向は、本開示の第1方向に相当し、y方向は、本開示の第2方向に相当し、x方向は、本開示の第3方向に相当する。 FIG. 1 is a perspective view showing the semiconductor light emitting device A1. FIG. 2 is a plan view showing the semiconductor light emitting device A1. FIG. 3 is a main part plan view showing the semiconductor light emitting device A1. FIG. 4 is a bottom view showing the semiconductor light emitting device A1. FIG. 5 is a sectional view taken along line VV in FIG. FIG. 6 is a sectional view taken along the line VI-VI in FIG. FIG. 7 is a sectional view taken along the line VII-VII of FIG. FIG. 8 is a sectional view taken along line VIII-VIII in FIG. FIG. 9 is a sectional view taken along the line IX-IX of FIG. FIG. 10 is an enlarged sectional view of a main part along line XX of FIG. FIG. 11 is an enlarged sectional perspective view showing the semiconductor light emitting element 4 of the semiconductor light emitting device A1. FIG. 12 is an enlarged sectional view of a main part showing the semiconductor light emitting element 4 of the semiconductor light emitting device A1. In these drawings, the z direction corresponds to a first direction of the present disclosure, the y direction corresponds to a second direction of the present disclosure, and the x direction corresponds to a third direction of the present disclosure.
 本実施形態の支持体1は、第1面11、第2面12、第3面13、第4面14、第5面15、第6面16、第7面17、第8面18、第9面19、第10面1a、第11面1bおよび第12面1cを有する。 The support 1 of the present embodiment includes a first surface 11, a second surface 12, a third surface 13, a fourth surface 14, a fifth surface 15, a sixth surface 16, a seventh surface 17, an eighth surface 18, It has ninth surface 19, tenth surface 1a, eleventh surface 1b, and twelfth surface 1c.
 第1面11は、z方向一方側(図5における図中上側)を向く面である。第2面12は、第1面11とは反対側のz方向他方側(図5における図中下側)を向く面である。第3面13は、第1面11と同じくz方向一方側(図5における図中上側)を向く面であり、第2面12に対して第1面11よりも離間している。第4面14は、第1面11と第3面13との間に介在しており、本実施形態においては、第1面11および第3面13に繋がっている。第4面14は、z方向視において第1面11を囲む環状である。また、第4面14は、対向し合う部分同士の距離がz方向において第1面11から第3面13に向かうほど大きくなるように傾いている。 The first surface 11 is a surface that faces one side in the z direction (upper side in FIG. 5). The second surface 12 is a surface facing the other side in the z direction opposite to the first surface 11 (a lower side in the drawing in FIG. 5). The third surface 13 is a surface facing one side in the z direction (upper side in the drawing in FIG. 5) similarly to the first surface 11, and is more distant from the second surface 12 than the first surface 11. The fourth surface 14 is interposed between the first surface 11 and the third surface 13, and in the present embodiment, is connected to the first surface 11 and the third surface 13. The fourth surface 14 is an annular shape surrounding the first surface 11 when viewed in the z direction. The fourth surface 14 is inclined such that the distance between the opposing portions increases in the z direction from the first surface 11 to the third surface 13.
 第5面15は、z方向において第1面11と第3面13との間に位置しており、y方向一方側(図6~図9における図中右側)を向く面である。図示された例においては、第5面15は、第1面11および第3面13に繋がっている。第6面16は、z方向において第1面11と第3面13との間に位置しており、y方向他方側(図6~図9における図中左側)を向く面である。図示された例においては、第6面16は、第1面11および第3面13に繋がっている。 The fifth surface 15 is located between the first surface 11 and the third surface 13 in the z direction, and faces one side in the y direction (the right side in FIGS. 6 to 9). In the illustrated example, the fifth surface 15 is connected to the first surface 11 and the third surface 13. The sixth surface 16 is located between the first surface 11 and the third surface 13 in the z direction, and faces the other side in the y direction (the left side in FIGS. 6 to 9). In the illustrated example, the sixth surface 16 is connected to the first surface 11 and the third surface 13.
 第7面17は、z方向において第1面11と第3面13との間に位置しており、x方向一方側(図5における図中左側)を向く面である。図示された例においては、第7面17は、第1面11および第3面13に繋がっている。第8面18は、z方向において第1面11と第3面13との間に位置しており、x方向他方側(図5における図中右側)を向く面である。図示された例においては、第8面18は、第1面11および第3面13に繋がっている。 The seventh surface 17 is located between the first surface 11 and the third surface 13 in the z direction, and faces one side in the x direction (left side in FIG. 5). In the illustrated example, the seventh surface 17 is connected to the first surface 11 and the third surface 13. The eighth surface 18 is located between the first surface 11 and the third surface 13 in the z direction, and faces the other side in the x direction (the right side in FIG. 5). In the illustrated example, the eighth surface 18 is connected to the first surface 11 and the third surface 13.
 第9面19は、z方向一方側を向いており、z方向において第1面11と第3面13との間に位置している。図示された例においては、第9面19は、z方向において第1面11と同じ位置に設けられている。第9面19は、z方向視において第1面11に対してx方向他方側(図3および図5における図中右側)に配置されている。第10面1aは、z方向において第9面19と第3面13との間に介在しており、本実施形態においては、第9面19および第3面13に繋がっている。第10面1aは、z方向視において第9面19を囲む環状である。また、第10面1aは、対向し合う部分同士の距離がz方向において第9面19から第3面13に向かうほど大きくなるように傾いている。 9The ninth surface 19 faces one side in the z direction, and is located between the first surface 11 and the third surface 13 in the z direction. In the illustrated example, the ninth surface 19 is provided at the same position as the first surface 11 in the z direction. The ninth surface 19 is disposed on the other side in the x direction with respect to the first surface 11 when viewed in the z direction (the right side in FIGS. 3 and 5). The tenth surface 1a is interposed between the ninth surface 19 and the third surface 13 in the z direction, and is connected to the ninth surface 19 and the third surface 13 in the present embodiment. The tenth surface 1a has an annular shape surrounding the ninth surface 19 when viewed in the z direction. The tenth surface 1a is inclined such that the distance between the opposing portions increases in the z direction from the ninth surface 19 toward the third surface 13.
 第11面1bは、z方向一方側を向いており、z方向において第1面11と第3面13との間に位置している。図示された例においては、第11面1bは、z方向において第1面11と同じ位置に設けられている。第11面1bは、z方向視において第1面11に対してx方向他方側(図3および図5における図中右側)に配置されており、第9面19に対してy方向他方側に配置されている。第12面1cは、z方向において第11面1bと第3面13との間に介在しており、本実施形態においては、第11面1bおよび第3面13に繋がっている。第12面1cは、z方向視において第11面1bを囲む環状である。また、第12面1cは、対向し合う部分同士の距離がz方向において第11面1bから第3面13に向かうほど大きくなるように傾いている。 11The eleventh surface 1b faces one side in the z direction, and is located between the first surface 11 and the third surface 13 in the z direction. In the illustrated example, the eleventh surface 1b is provided at the same position as the first surface 11 in the z direction. The eleventh surface 1b is arranged on the other side in the x direction with respect to the first surface 11 when viewed in the z direction (the right side in FIGS. 3 and 5), and on the other side in the y direction with respect to the ninth surface 19. Are located. The twelfth surface 1c is interposed between the eleventh surface 1b and the third surface 13 in the z direction, and is connected to the eleventh surface 1b and the third surface 13 in the present embodiment. The twelfth surface 1c is an annular shape surrounding the eleventh surface 1b when viewed in the z direction. The twelfth surface 1c is inclined so that the distance between the opposing portions increases from the eleventh surface 1b toward the third surface 13 in the z direction.
 支持体1の構成は特に限定されず、本実施形態においては、支持体1は、基材2および導電部3を含む。 構成 The configuration of the support 1 is not particularly limited, and in the present embodiment, the support 1 includes the base material 2 and the conductive portion 3.
 基材2は、絶縁性材料からなり、たとえばエポキシ樹脂、シリコーン樹脂等が適宜用いられる。本実施形態の基材2は、第1面21、第2面22、第3面23、第4面24、第5面25、第6面26、第7面27、第8面28、第10面2aおよび第12面2cを有する。 The base material 2 is made of an insulating material, and for example, an epoxy resin, a silicone resin, or the like is appropriately used. The substrate 2 of the present embodiment includes a first surface 21, a second surface 22, a third surface 23, a fourth surface 24, a fifth surface 25, a sixth surface 26, a seventh surface 27, an eighth surface 28, It has a tenth surface 2a and a twelfth surface 2c.
 第1面21は、z方向一方側を向いており、第1面11の一部を構成する。第2面22は、z方向他方側を向いており、第2面12の一部を構成する。第3面23は、z方向一方側を向いており、第3面13を構成する。第4面24は、z方向において第1面21と第3面23との間に位置しており、第4面14を構成する。第5面25は、y方向一方側を向いており、第5面15を構成する。第6面16は、y方向他方側を向いており、第6面16を構成する。第7面27は、x方向一方側を向いており、第7面17を構成する。第8面28は、x方向他方側を向いており、第8面18を構成する。第10面2aは、z方向において第9面19と第3面13(第3面23)との間に位置しており、第10面1aを構成する。第12面2cは、z方向において第11面1bと第3面13(第3面23)との間に位置しており、第12面1cを構成する。 The first surface 21 faces one side in the z direction and forms a part of the first surface 11. The second surface 22 faces the other side in the z direction, and forms a part of the second surface 12. The third surface 23 faces one side in the z direction, and forms the third surface 13. The fourth surface 24 is located between the first surface 21 and the third surface 23 in the z direction, and forms the fourth surface 14. The fifth surface 25 faces one side in the y direction, and forms the fifth surface 15. The sixth surface 16 faces the other side in the y direction, and forms the sixth surface 16. The seventh surface 27 faces one side in the x direction, and forms the seventh surface 17. The eighth surface 28 faces the other side in the x direction, and forms the eighth surface 18. The tenth surface 2a is located between the ninth surface 19 and the third surface 13 (third surface 23) in the z direction, and forms the tenth surface 1a. The twelfth surface 2c is located between the eleventh surface 1b and the third surface 13 (third surface 23) in the z direction, and forms the twelfth surface 1c.
 導電部3は、半導体発光素子4と半導体発光装置A1の外部との導通経路を構成するものであり、本実施液体においては、第1リード31、第2リード32、第3リード33および第4リード34を含む。第1リード31、第2リード32、第3リード33および第4リード34は、たとえばCu,Fe,Ni等の金属からなる。 The conductive portion 3 forms a conduction path between the semiconductor light emitting element 4 and the outside of the semiconductor light emitting device A1. In the present embodiment, the first lead 31, the second lead 32, the third lead 33, and the fourth Includes leads 34. The first lead 31, the second lead 32, the third lead 33, and the fourth lead 34 are made of a metal such as Cu, Fe, and Ni.
 第1リード31は、第1面311、第2面312、主部315、縁部316および複数の延出部317を有する。第1面311は、z方向一方側を向く面であり、第1面11の一部を構成している。z方向視において、第1面311の一部は、第4面14に囲まれた領域に露出している。第2面312は、第1面311とは反対側のz方向他方側を向く面であり、第2面12の一部を構成する。図示された例においては、第2面312は、z方向視において第1面311よりも小さく、第1面311に内包されている。 The first lead 31 has a first surface 311, a second surface 312, a main portion 315, an edge portion 316, and a plurality of extending portions 317. The first surface 311 is a surface facing one side in the z direction, and forms a part of the first surface 11. When viewed in the z direction, a part of the first surface 311 is exposed in a region surrounded by the fourth surface 14. The second surface 312 is a surface facing the other side in the z direction opposite to the first surface 311 and forms a part of the second surface 12. In the illustrated example, the second surface 312 is smaller than the first surface 311 when viewed in the z direction, and is included in the first surface 311.
 主部315は、第1面311および第2面312を有する部位であり、z方向視において第1面311および第2面312の双方が重なる部位である。縁部316は、z方向視において主部315を囲む部位であり、第1面311の一部を有する。縁部316のz方向他方側部分は、基材2によって覆われている。複数の延出部317は、z方向視において縁部316から外方に延出している。延出部317は、第1面311の一部を有する。延出部317のz方向他方側部分は、基材2によって覆われている。図示された例においては、第1リード31は、3つの延出部317を有する。1つの延出部317は、基材2の第5面25に到達しており、端面が第5面25と面一であり、第5面25から露出している。他の1つの延出部317は、基材2の第6面26に到達しており、端面が第6面26と面一であり、第6面26から露出している。さらに他の1つの延出部317は、基材2の第7面27に到達しており、端面が第7面27と面一であり、第7面27から露出している。 The main portion 315 is a portion having the first surface 311 and the second surface 312, and is a portion where both the first surface 311 and the second surface 312 overlap when viewed in the z direction. The edge portion 316 is a portion surrounding the main portion 315 when viewed in the z direction, and has a part of the first surface 311. The other side in the z direction of the edge 316 is covered with the base material 2. The plurality of extending portions 317 extend outward from the edge 316 when viewed in the z direction. The extension part 317 has a part of the first surface 311. The other side in the z direction of the extension portion 317 is covered with the base material 2. In the illustrated example, the first lead 31 has three extensions 317. One extension portion 317 has reached the fifth surface 25 of the base material 2, has an end surface flush with the fifth surface 25, and is exposed from the fifth surface 25. The other extension 317 reaches the sixth surface 26 of the base material 2, has an end surface flush with the sixth surface 26, and is exposed from the sixth surface 26. Still another extension 317 has reached the seventh surface 27 of the base material 2, has an end surface flush with the seventh surface 27, and is exposed from the seventh surface 27.
 第2リード32は、第1リード31に対してx方向他方側に離間して配置されている。第2リード32は、第1面321、第2面322、主部325、縁部326および複数の延出部327を有する。第1面321は、z方向一方側を向く面であり、第1面11の一部を構成している。z方向視において、第1面321の一部は、第4面14に囲まれた領域に露出している。第2面322は、第1面321とは反対側のz方向他方側を向く面であり、第2面12の一部を構成する。図示された例においては、第2面322は、z方向視において第1面321よりも小さく、第1面321に内包されている。 The second lead 32 is spaced apart from the first lead 31 on the other side in the x direction. The second lead 32 has a first surface 321, a second surface 322, a main portion 325, an edge 326, and a plurality of extending portions 327. The first surface 321 is a surface facing one side in the z direction, and forms a part of the first surface 11. When viewed in the z direction, a part of the first surface 321 is exposed in a region surrounded by the fourth surface 14. The second surface 322 is a surface facing the other side in the z direction opposite to the first surface 321 and forms a part of the second surface 12. In the illustrated example, the second surface 322 is smaller than the first surface 321 when viewed in the z direction, and is included in the first surface 321.
 主部325は、第1面321および第2面322を有する部位であり、z方向視において第1面321および第2面322の双方が重なる部位である。縁部326は、z方向視において主部325を囲む部位であり、第1面321の一部を有する。縁部326のz方向他方側部分は、基材2によって覆われている。複数の延出部327は、z方向視において縁部326から外方に延出している。延出部327は、第1面321の一部を有する。延出部327のz方向他方側部分は、基材2によって覆われている。図示された例においては、第2リード32は、2つの延出部327を有する。1つの延出部327は、基材2の第5面25に到達しており、端面が第5面25と面一であり、第5面25から露出している。他の1つの延出部327は、基材2の第6面26に到達しており、端面が第6面26と面一であり、第6面26から露出している。 The main portion 325 is a portion having the first surface 321 and the second surface 322, and is a portion where both the first surface 321 and the second surface 322 overlap in the z direction. The edge portion 326 is a portion surrounding the main portion 325 when viewed in the z direction, and has a part of the first surface 321. The other side in the z direction of the edge 326 is covered with the base material 2. The plurality of extending portions 327 extend outward from the edge 326 in the z direction. The extension part 327 has a part of the first surface 321. The other side of the extension 327 in the z direction is covered with the base material 2. In the illustrated example, the second lead 32 has two extensions 327. One extension 327 reaches the fifth surface 25 of the base material 2, has an end surface flush with the fifth surface 25, and is exposed from the fifth surface 25. The other extension 327 reaches the sixth surface 26 of the base material 2, has an end surface flush with the sixth surface 26, and is exposed from the sixth surface 26.
 第3リード33は、第2リード32に対してx方向他方側に離間して配置されている。第3リード33は、第1面331、第2面332、主部335、縁部336および複数の延出部337を有する。第1面331は、z方向一方側を向く面であり、第9面19を構成している。z方向視において、第1面331の一部は、第10面1a(第10面2a)に囲まれた領域に露出している。第2面332は、第1面331とは反対側のz方向他方側を向く面であり、第2面12の一部を構成する。図示された例においては、第2面332は、z方向視において第1面331よりも小さく、第1面331に内包されている。 The third lead 33 is arranged on the other side in the x direction with respect to the second lead 32. The third lead 33 has a first surface 331, a second surface 332, a main portion 335, an edge portion 336, and a plurality of extending portions 337. The first surface 331 is a surface facing one side in the z direction, and forms the ninth surface 19. When viewed in the z direction, a part of the first surface 331 is exposed in a region surrounded by the tenth surface 1a (the tenth surface 2a). The second surface 332 is a surface facing the other side in the z direction on the opposite side to the first surface 331 and forms a part of the second surface 12. In the illustrated example, the second surface 332 is smaller than the first surface 331 when viewed in the z direction, and is included in the first surface 331.
 主部335は、第1面331および第2面332を有する部位であり、z方向視において第1面331および第2面332の双方が重なる部位である。縁部336は、z方向視において主部335を囲む部位であり、第1面331の一部を有する。縁部336のz方向他方側部分は、基材2によって覆われている。複数の延出部337は、z方向視において縁部336から外方に延出している。延出部337は、第1面331の一部を有する。延出部337のz方向他方側部分は、基材2によって覆われている。図示された例においては、第3リード33は、2つの延出部337を有する。1つの延出部337は、基材2の第5面25に到達しており、端面が第5面25と面一であり、第5面25から露出している。他の1つの延出部337は、基材2の第8面28に到達しており、端面が第8面28と面一であり、第8面28から露出している。 The main portion 335 is a portion having the first surface 331 and the second surface 332, and is a portion where both the first surface 331 and the second surface 332 overlap in the z direction. The edge portion 336 is a portion surrounding the main portion 335 when viewed in the z direction, and has a part of the first surface 331. The other side of the edge 336 in the z direction is covered with the base material 2. The plurality of extending portions 337 extend outward from the edge 336 when viewed in the z direction. The extension 337 has a part of the first surface 331. The other side in the z direction of the extension 337 is covered with the base material 2. In the illustrated example, the third lead 33 has two extending portions 337. One extension 337 has reached the fifth surface 25 of the base material 2, has an end surface flush with the fifth surface 25, and is exposed from the fifth surface 25. The other extension 337 has reached the eighth surface 28 of the substrate 2, has an end surface flush with the eighth surface 28, and is exposed from the eighth surface 28.
 第4リード34は、第2リード32に対してx方向他方側に離間して配置されており、第3リード33に対してy方向他方側に離間して配置されている。第4リード34は、第1面341、第2面342、主部345、縁部346および複数の延出部347を有する。第1面341は、z方向一方側を向く面であり、第11面1bを構成している。z方向視において、第1面341の一部は、第12面1c(第12面1c)に囲まれた領域に露出している。第2面342は、第1面341とは反対側のz方向他方側を向く面であり、第2面12の一部を構成する。図示された例においては、第2面342は、z方向視において第1面341よりも小さく、第1面341に内包されている。 (4) The fourth lead 34 is spaced apart from the second lead 32 on the other side in the x direction, and is spaced apart from the third lead 33 on the other side in the y direction. The fourth lead 34 has a first surface 341, a second surface 342, a main portion 345, an edge 346, and a plurality of extending portions 347. The first surface 341 is a surface that faces one side in the z direction, and constitutes an eleventh surface 1b. When viewed in the z direction, a part of the first surface 341 is exposed in a region surrounded by the twelfth surface 1c (the twelfth surface 1c). The second surface 342 is a surface facing the other side in the z direction opposite to the first surface 341 and forms a part of the second surface 12. In the illustrated example, the second surface 342 is smaller than the first surface 341 when viewed in the z direction, and is included in the first surface 341.
 主部345は、第1面341および第2面342を有する部位であり、z方向視において第1面341および第2面342の双方が重なる部位である。縁部346は、z方向視において主部345を囲む部位であり、第1面341の一部を有する。縁部346のz方向他方側部分は、基材2によって覆われている。複数の延出部347は、z方向視において縁部346から外方に延出している。延出部347は、第1面341の一部を有する。延出部347のz方向他方側部分は、基材2によって覆われている。図示された例においては、第4リード34は、2つの延出部347を有する。1つの延出部347は、基材2の第6面26に到達しており、端面が第6面26と面一であり、第6面26から露出している。他の1つの延出部347は、基材2の第8面28に到達しており、端面が第8面28と面一であり、第8面28から露出している。 The main portion 345 is a portion having the first surface 341 and the second surface 342, and is a portion where both the first surface 341 and the second surface 342 overlap when viewed in the z direction. The edge portion 346 is a portion surrounding the main portion 345 when viewed in the z direction, and has a part of the first surface 341. The other side in the z direction of the edge 346 is covered with the base material 2. The plurality of extending portions 347 extend outward from the edge 346 when viewed in the z direction. The extension part 347 has a part of the first surface 341. The other side in the z direction of the extension 347 is covered with the base material 2. In the illustrated example, the fourth lead 34 has two extensions 347. One extension 347 reaches the sixth surface 26 of the base material 2, has an end surface flush with the sixth surface 26, and is exposed from the sixth surface 26. The other extension 347 reaches the eighth surface 28 of the base material 2, has an end surface flush with the eighth surface 28, and is exposed from the eighth surface 28.
 半導体発光素子4は、半導体発光装置A1における光源であり、所定の波長帯の光を発する。半導体発光素子4の具体的構成は特に限定されず、半導体レーザ素子やLED素子等である。本実施形態においては、半導体発光素子4は、半導体レーザ素子であり、VCSEL素子が採用されている。半導体発光素子4は、導電部3の第1リード31の第1面311(第1面11)に導電性接合材48によってダイボンディングされている。導電性接合材48は、たとえば、Agペーストまたははんだである。半導体発光素子4からの光は、おおむねz方向一方側に出射される。 The semiconductor light emitting element 4 is a light source in the semiconductor light emitting device A1, and emits light in a predetermined wavelength band. The specific configuration of the semiconductor light emitting device 4 is not particularly limited, and may be a semiconductor laser device, an LED device, or the like. In the present embodiment, the semiconductor light emitting device 4 is a semiconductor laser device, and employs a VCSEL device. The semiconductor light emitting element 4 is die-bonded to the first surface 311 (first surface 11) of the first lead 31 of the conductive part 3 by a conductive bonding material 48. The conductive bonding material 48 is, for example, an Ag paste or a solder. The light from the semiconductor light emitting element 4 is emitted to one side in the z direction.
 図3に示すように、半導体発光素子4は、平面視において第1電極41と複数の発光領域460が設けられている。複数の発光領域460は、半導体発光素子4の平面視において第1電極41を除く領域に離散配置されている。 半導体 As shown in FIG. 3, the semiconductor light emitting element 4 is provided with the first electrode 41 and a plurality of light emitting regions 460 in plan view. The plurality of light emitting regions 460 are discretely arranged in regions other than the first electrode 41 in a plan view of the semiconductor light emitting device 4.
 図11および図12に示すように、本例の半導体発光素子4は、第1電極41、第2電極42、第2基板451、第4半導体層452、活性層453、第5半導体層454、電流狭窄層455、絶縁層456および導電層457を備え、複数の発光領域460が形成されている。なお、同図に示す構成例は、半導体発光素子4としてのVCSEL素子の一例であり、本構成に限定されるものではない。図12は、1つの発光領域460を含む部分を拡大して示している。 As shown in FIGS. 11 and 12, the semiconductor light emitting device 4 of the present example has a first electrode 41, a second electrode 42, a second substrate 451, a fourth semiconductor layer 452, an active layer 453, a fifth semiconductor layer 454, A plurality of light emitting regions 460 are provided, including a current confinement layer 455, an insulating layer 456, and a conductive layer 457. It should be noted that the configuration example shown in the figure is an example of a VCSEL element as the semiconductor light emitting element 4, and is not limited to this configuration. FIG. 12 shows an enlarged portion including one light emitting region 460.
 第2基板451は、は半導体よりなる。第2基板451を構成する半導体は、たとえば、n型のGaAsである。第2基板451を構成する半導体は、GaAs以外であってもよい。 The second substrate 451 is made of a semiconductor. The semiconductor forming the second substrate 451 is, for example, n-type GaAs. The semiconductor forming the second substrate 451 may be other than GaAs.
 活性層453は、自然放出および誘導放出によって、たとえば、980nm帯(以下、「λa」とする)の波長の光を放出する化合物半導体により構成されている。活性層453は、第4半導体層452と第5半導体層454との間に位置している。本実施形態においては、アンドープのGaAs井戸層とアンドープのAlGaAs障壁層(バリア層)とを交互に積層した多重量子井戸構造により構成されている。たとえば、アンドープAl0.35Ga0.65As障壁層とアンドープGaAs井戸層とが交互に繰り返し2~6周期形成されている。 The active layer 453 is made of, for example, a compound semiconductor that emits light in a 980 nm band (hereinafter, referred to as “λa”) by spontaneous emission and stimulated emission. The active layer 453 is located between the fourth semiconductor layer 452 and the fifth semiconductor layer 454. In the present embodiment, the multi-quantum well structure is formed by alternately stacking undoped GaAs well layers and undoped AlGaAs barrier layers (barrier layers). For example, undoped Al 0.35 Ga 0.65 As barrier layers and undoped GaAs well layers are alternately and repeatedly formed for two to six periods.
 第4半導体層452は、典型的にはDBR(Distributed Bragg Reflector)層であり、第2基板451に形成されている。第4半導体層452は第1導電型を有する半導体よりなる。本例では第1導電型はn型である。第4半導体層452は、活性層453から発せられる光を効率よく反射させるためのDBRとして構成されている。第4半導体層452は、厚さλa/4のAlGaAs層であってそれぞれ反射率が異なる2層からなるペアを、複数段重ね合わせることにより構成されている。より具体的には、第4半導体層452は、たとえば600Åの厚さを有する相対的にAl組成が低いn型Al0.16Ga0.84As層(低Al組成層)と、たとえば700Åの厚さを有する相対的にAl組成が高いn型Al0.92Ga0.16As層(高Al組成層)とを交互に複数周期(たとえば、20周期)繰り返し積層して構成されている。n型Al0.16Ga0.84As層およびn型Al0.92Ga0.16As層には、それぞれ、たとえば2×1017cm-3~3×1018cm-3および2×1017cm-3~3×1018cm-3の濃度で、n型不純物(たとえば、Si)がドープされている。 The fourth semiconductor layer 452 is typically a DBR (Distributed Bragg Reflector) layer, and is formed on the second substrate 451. The fourth semiconductor layer 452 is made of a semiconductor having the first conductivity type. In this example, the first conductivity type is an n-type. The fourth semiconductor layer 452 is configured as a DBR for efficiently reflecting light emitted from the active layer 453. The fourth semiconductor layer 452 is formed by stacking a plurality of pairs of two layers each of which is an AlGaAs layer having a thickness of λa / 4 and has a different reflectance. More specifically, the fourth semiconductor layer 452 has, for example, an n-type Al 0.16 Ga 0.84 As layer (low Al composition layer) having a thickness of, for example, 600 ° and a relatively low Al composition, and a thickness of, for example, 700 °. An n-type Al 0.92 Ga 0.16 As layer having a relatively high Al composition (high Al composition layer) is alternately and repeatedly laminated for a plurality of cycles (for example, 20 cycles). The n-type Al 0.16 Ga 0.84 As layer and the n-type Al 0.92 Ga 0.16 As layer have, for example, 2 × 10 17 cm −3 to 3 × 10 18 cm −3 and 2 × 10 17 cm −3 to 3 × 10, respectively. An n-type impurity (for example, Si) is doped at a concentration of 18 cm -3 .
 第5半導体層454は、典型的にはDBR層であり、第2導電型を有する半導体よりなる。本例では第2導電型はp型である。本実施形態とは異なり、第1導電型がp型であり、第2導電型がn型であってもよい。第5半導体層454および第2基板451の間に、第4半導体層452が位置している。第5半導体層454は、活性層453から発せられる光を効率よく反射させるためのDBRとして構成されている。より具体的には、第5半導体層454は、厚さλa/4のAlGaAs層であってそれぞれ反射率が異なる2層からなるペアを、複数段重ね合わせることにより構成されている。第5半導体層454は、たとえば、相対的にAl組成が低いp型Al0.16Ga0.84As層(低Al組成層)と、相対的にAl組成が高いp型Al0.92Ga0.16As層(高Al組成層)とが交互に複数周期(たとえば、20周期)繰り返し積層して構成されている。 The fifth semiconductor layer 454 is typically a DBR layer and is made of a semiconductor having the second conductivity type. In this example, the second conductivity type is p-type. Unlike the present embodiment, the first conductivity type may be p-type and the second conductivity type may be n-type. The fourth semiconductor layer 452 is located between the fifth semiconductor layer 454 and the second substrate 451. The fifth semiconductor layer 454 is configured as a DBR for efficiently reflecting light emitted from the active layer 453. More specifically, the fifth semiconductor layer 454 is formed by stacking a plurality of pairs of two layers each of which is an AlGaAs layer having a thickness of λa / 4 and has a different reflectance. The fifth semiconductor layer 454 includes, for example, a p-type Al 0.16 Ga 0.84 As layer (low Al composition layer) having a relatively low Al composition and a p-type Al 0.92 Ga 0.16 As layer (high Al composition) having a relatively high Al composition. (A composition layer) are alternately and repeatedly laminated for a plurality of cycles (for example, 20 cycles).
 電流狭窄層455は、第5半導体層454内に位置している。電流狭窄層455はたとえばAlを多く含み、酸化しやすい層からなる。電流狭窄層455は、この酸化しやすい層を酸化することにより形成される。電流狭窄層455は、酸化によって形成される必要は必ずしもなく、その他の方法(たとえばイオン注入)によって形成されてもよい。電流狭窄層455には開口4551が形成されている。開口4551を電流が流れる。 The current confinement layer 455 is located in the fifth semiconductor layer 454. The current constriction layer 455 contains a large amount of Al, for example, and is made of a layer that is easily oxidized. The current confinement layer 455 is formed by oxidizing this easily oxidizable layer. The current confinement layer 455 is not necessarily formed by oxidation, but may be formed by another method (for example, ion implantation). An opening 4551 is formed in the current confinement layer 455. A current flows through the opening 4551.
 絶縁層456は第5半導体層454に形成されている。絶縁層456は、たとえば、SiO2よりなる。絶縁層456には、開口4561が形成されている。 The insulating layer 456 is formed on the fifth semiconductor layer 454. Insulating layer 456 is made of, for example, SiO 2 . An opening 4561 is formed in the insulating layer 456.
 導電層457は、絶縁層456に形成されている。導電層457は導電材料(たとえば金属)よりなる。導電層457は、絶縁層456の開口4561を通じて第5導電層354に導通している。導電層457は、開口4571を有する。 The conductive layer 457 is formed on the insulating layer 456. The conductive layer 457 is made of a conductive material (for example, metal). The conductive layer 457 is electrically connected to the fifth conductive layer 354 through the opening 4561 of the insulating layer 456. The conductive layer 457 has an opening 4571.
 発光領域460は、活性層453からの光が直接または反射の後に出射される領域である。本例においては、発光領域460は、平面視円環形状であるが、その形状は特に限定されない。発光領域460は、上述した第5半導体層454、電流狭窄層455、絶縁層456および導電層457が積層され、電流狭窄層455の開口4551、絶縁層456の開口4561および導電層457の開口4571等が形成されることにより設けられている。発光領域460においては、活性層453からの光が、導電層457の開口4571を通じて出射される。 (4) The light emitting region 460 is a region from which light from the active layer 453 is emitted directly or after reflection. In the present example, the light emitting region 460 has an annular shape in plan view, but the shape is not particularly limited. The light emitting region 460 is formed by stacking the above-described fifth semiconductor layer 454, the current confinement layer 455, the insulating layer 456, and the conductive layer 457. And the like are provided. In the light-emitting region 460, light from the active layer 453 is emitted through the opening 4571 of the conductive layer 457.
 第1電極41は、たとえば金属からなり、第5半導体層454に導通している。第2電極42は、第2基板451の裏面に形成されており、たとえば金属からなる。第2電極42は、たとえばAg等の金属を含むペーストまたははんだ等の導電性接合材48によって第1面311にダイボンディングされている。これにより、第2電極42は、導電部3の第1リード31と導通している。 The first electrode 41 is made of, for example, a metal, and is electrically connected to the fifth semiconductor layer 454. The second electrode 42 is formed on the back surface of the second substrate 451, and is made of, for example, metal. The second electrode 42 is die-bonded to the first surface 311 by a conductive bonding material 48 such as a paste or a solder containing a metal such as Ag. Thereby, the second electrode 42 is electrically connected to the first lead 31 of the conductive portion 3.
 ワイヤ49は、図3および図5に示すように、半導体発光素子4の第1電極41と第2リード32の第1面321とに接続されている。ワイヤ49の材質は特に限定されず、たとえばAuからなる。本実施形態においては、4本のワイヤ49が互いに並列に設けられている。ただし、ワイヤ49の本数や配置は特に限定されない。 The wire 49 is connected to the first electrode 41 of the semiconductor light emitting device 4 and the first surface 321 of the second lead 32, as shown in FIGS. The material of the wire 49 is not particularly limited, and is made of, for example, Au. In the present embodiment, four wires 49 are provided in parallel with each other. However, the number and arrangement of the wires 49 are not particularly limited.
 カバー5は、半導体発光素子4をz方向視において塞ぐとともに、半導体発光素子4からの光を透過させるものである。本実施形態においては、カバー5は、基材層51、拡散層52および導電層53を含む。カバー5は、たとえば接合材57によって支持体1の第3面13(第3面23)に接合されている。接合材57は、たとえば樹脂材料からなる絶縁性の接着剤である。 The cover 5 covers the semiconductor light emitting element 4 when viewed in the z direction and transmits light from the semiconductor light emitting element 4. In the present embodiment, the cover 5 includes a base layer 51, a diffusion layer 52, and a conductive layer 53. The cover 5 is joined to the third surface 13 (third surface 23) of the support 1 by, for example, a joining material 57. The bonding material 57 is, for example, an insulating adhesive made of a resin material.
 基材層51は、ガラス等の半導体発光素子4からの光を透過させる材料からなる。本実施形態においては、基材層51は、透明なガラスからなる。基材層51の形状等は特に限定されず、本実施形態においては矩形状である。 The base layer 51 is made of a material such as glass that transmits light from the semiconductor light emitting element 4. In the present embodiment, the base layer 51 is made of transparent glass. The shape and the like of the base layer 51 are not particularly limited, and are rectangular in the present embodiment.
 拡散層52は、基材層51上に配置されており、半導体発光素子4からの光を拡散させつつ透過させる層である。拡散層52としては、拡散機能を実現する光学処理が施されたエポキシ樹脂層が挙げられる。本実施形態においては、拡散層52は、基材層51のうち半導体発光素子4と対向する面に設けられている。また、図示された例においては、拡散層52は、基材層51の片面全面に設けられている。 The diffusion layer 52 is disposed on the base material layer 51 and is a layer that diffuses and transmits light from the semiconductor light emitting element 4. An example of the diffusion layer 52 is an epoxy resin layer that has been subjected to an optical process for realizing a diffusion function. In the present embodiment, the diffusion layer 52 is provided on the surface of the base layer 51 facing the semiconductor light emitting element 4. In the illustrated example, the diffusion layer 52 is provided on one entire surface of the base layer 51.
 導電層53は、基材層51上に配置されており、導電体からなる層である。図示された例においては、導電層53は、基材層51を挟んで拡散層52とは反対側に設けられている。図2においては、理解の便宜上、導電層53にハッチングを付している。本実施形態の導電層53は、パッド部531,532および配線部533を有する。 The conductive layer 53 is disposed on the base layer 51 and is a layer made of a conductor. In the illustrated example, the conductive layer 53 is provided on the opposite side of the base layer 51 from the diffusion layer 52. In FIG. 2, the conductive layer 53 is hatched for convenience of understanding. The conductive layer 53 of the present embodiment has pad portions 531 and 532 and a wiring portion 533.
 パッド部531、532は、導電部3との接続箇所である。パッド部531,532は、基材層51のx方向他方寄り部分に形成されている。パッド部531とパッド部532とは、y方向に離間して配置されている。 (4) The pad portions 531 and 532 are connection portions with the conductive portion 3. The pad portions 531 and 532 are formed in the base layer 51 at a portion closer to the other side in the x direction. The pad portion 531 and the pad portion 532 are arranged apart from each other in the y direction.
 配線部533は、パッド部531とパッド部532とに接続されており、パッド部531とパッド部532とを導通させる部分である。配線部533の形状は特に限定されず、図示された例においては、配線部533は、第1部5331、第2部5332、第3部5333、第4部5334、第5部5335、第6部5336、第7部5337、第8部5338および第9部5339を有する。 The wiring portion 533 is connected to the pad portion 531 and the pad portion 532, and is a portion for electrically connecting the pad portion 531 and the pad portion 532. The shape of the wiring portion 533 is not particularly limited, and in the illustrated example, the wiring portion 533 includes the first portion 5331, the second portion 5332, the third portion 5333, the fourth portion 5334, the fifth portion 5335, and the sixth portion. It has a portion 5336, a seventh portion 5337, an eighth portion 5338, and a ninth portion 5339.
 図2に示すように、パッド部5311は、パッド部531に繋がっており、パッド部531からy方向一方側に延びている。第2部5332は、第1部5331に繋がっており、x方向に延びている。第3部5333は、第2部5332に繋がっており、y方向に延びている。第4部5334は、第3部5333に繋がっており、x方向に延びている。第5部5335は、第4部5334に繋がっており、y方向に延びている。第6部5336は、第5部5335に繋がっており、x方向に延びている。第7部5337は、第6部5336に繋がっており、y方向に延びている。第8部5338は、第7部5337に繋がっており、x方向に延びている。第9部5339は、第8部5338およびパッド部532に繋がっており、y方向に延びている。 パ ッ ド As shown in FIG. 2, the pad portion 5311 is connected to the pad portion 531 and extends from the pad portion 531 to one side in the y direction. The second portion 5332 is connected to the first portion 5331 and extends in the x direction. The third portion 5333 is connected to the second portion 5332 and extends in the y direction. The fourth portion 5334 is connected to the third portion 5333 and extends in the x direction. The fifth portion 5335 is connected to the fourth portion 5334 and extends in the y direction. The sixth portion 5336 is connected to the fifth portion 5335 and extends in the x direction. The seventh portion 5337 is connected to the sixth portion 5336, and extends in the y direction. The eighth portion 5338 is connected to the seventh portion 5337 and extends in the x direction. The ninth portion 5339 is connected to the eighth portion 5338 and the pad portion 532, and extends in the y direction.
 図2に示すように、導電層53は、z方向視において半導体発光素子4から退避した位置に設けられている。導電層53は、z方向視において、半導体発光素子4に対してy方向一方側に位置する部分(第2部5332)と、x方向一方側に位置する部分(第3部5333)と、を有する。さらに、導電層53は、半導体発光素子4に対してy方向両側に位置する部分(第2部5332および第4部5334)を有する。また、導電層53は、半導体発光素子4に対してx方向両側に位置する部分(第3部5333および第5部5335)を有する。図示された導電層53の配線部533は、z方向視において半導体発光素子4を囲む形状である。 導電 As shown in FIG. 2, the conductive layer 53 is provided at a position retracted from the semiconductor light emitting element 4 when viewed in the z direction. The conductive layer 53 includes a portion (second portion 5332) located on one side in the y direction and a portion located on one side in the x direction (third portion 5333) with respect to the semiconductor light emitting element 4 when viewed in the z direction. Have. Further, the conductive layer 53 has portions (second portion 5332 and fourth portion 5334) located on both sides in the y direction with respect to the semiconductor light emitting device 4. The conductive layer 53 has portions (third portion 5333 and fifth portion 5335) located on both sides in the x direction with respect to the semiconductor light emitting device 4. The illustrated wiring portion 533 of the conductive layer 53 has a shape surrounding the semiconductor light emitting element 4 when viewed in the z direction.
 本例においては、パッド部531,532は、z方向視において第3面13と重なっている。また、第1部5331、第2部5332、第3部5333、第4部5334、第8部5338および第9部5339は、z方向視において第3面13と重なっている。一方、第5部5335、第6部5336および第7部5337は、z方向視において第1面11と重なっている。 In the present example, the pad portions 531 and 532 overlap the third surface 13 when viewed in the z direction. The first portion 5331, the second portion 5332, the third portion 5333, the fourth portion 5334, the eighth portion 5338, and the ninth portion 5339 overlap the third surface 13 when viewed in the z direction. On the other hand, the fifth portion 5335, the sixth portion 5336, and the seventh portion 5337 overlap the first surface 11 when viewed in the z direction.
 図10に示すように、本実施形態の導電層53は、第1層53aおよび第2層53bを含む。第1層53aは、基材層51上に直接形成されている。第2層53bは、第1層53a上に形成されている。第1層53aおよび第2層53bの材質は特に限定されない。第1層53aの材質としては、例えばTiが挙げられ、第2層53bの材質としては例えばAuが挙げられる。第1層53aおよび第2層53bは、たとえばめっき等によって形成される。図示された例においては、第1層53aは、1層のめっき層で形成されており、第2層53bは、複数層のめっき層で形成されている。パッド部531は、第1層53aと複数のめっき層からなる第2層53bとによって構成されている。第2部5332も同様である。配線部533は、第1層53aとたとえば1層のみのめっき層からなる第2層53bによって構成されている。これにより、パッド部531,532の厚さは、配線部533の厚さよりも厚い。 よ う As shown in FIG. 10, the conductive layer 53 of the present embodiment includes a first layer 53a and a second layer 53b. The first layer 53a is formed directly on the base material layer 51. The second layer 53b is formed on the first layer 53a. The material of the first layer 53a and the second layer 53b is not particularly limited. The material of the first layer 53a is, for example, Ti, and the material of the second layer 53b is, for example, Au. The first layer 53a and the second layer 53b are formed, for example, by plating or the like. In the illustrated example, the first layer 53a is formed of one plating layer, and the second layer 53b is formed of a plurality of plating layers. The pad portion 531 includes a first layer 53a and a second layer 53b including a plurality of plating layers. The same applies to the second part 5332. The wiring portion 533 includes a first layer 53a and a second layer 53b including, for example, only one plating layer. Thus, the thickness of the pad portions 531 and 532 is larger than the thickness of the wiring portion 533.
 ワイヤ61は、図2および図5に示すように、第3リード33の第1面331(第9面19)とパッド部531とに接続されている。ワイヤ61の材質は特に限定されず、たとえばAuからなる。 The wire 61 is connected to the first surface 331 (the ninth surface 19) of the third lead 33 and the pad portion 531 as shown in FIGS. The material of the wire 61 is not particularly limited, and is made of, for example, Au.
 ワイヤ62は、図2および図5に示すように、第4リード34の第1面341(第11面1b)とパッド部532とに接続されている。ワイヤ62の材質は特に限定されず、たとえばAuからなる。 The wire 62 is connected to the first surface 341 (the eleventh surface 1b) of the fourth lead 34 and the pad 532, as shown in FIGS. The material of the wire 62 is not particularly limited, and is made of, for example, Au.
 封止樹脂71は、たとえばシリコーン樹脂やエポキシ樹脂等の絶縁性樹脂からなる。封止樹脂71は、ワイヤ61およびワイヤ62を覆っている。図示された例においては、封止樹脂71は、第9面19および第10面1aによって規定された凹部と、第11面1bおよび第12面1cとによって規定された凹部とに充填されている。封止樹脂71は、パッド部531およびパッド部532を覆っており、配線部533の大部分を露出させている。 The sealing resin 71 is made of an insulating resin such as a silicone resin or an epoxy resin. The sealing resin 71 covers the wires 61 and 62. In the illustrated example, the sealing resin 71 is filled in the concave portion defined by the ninth surface 19 and the tenth surface 1a and the concave portion defined by the eleventh surface 1b and the twelfth surface 1c. . The sealing resin 71 covers the pad portion 531 and the pad portion 532, and exposes most of the wiring portion 533.
 図13は、半導体発光装置A1が用いられた電子機器の一例を示すシステム構成図である。同図に示された電子機器C1は、半導体発光装置A1およびコントローラCtを有する。半導体発光装置A1およびコントローラCtは、たとえば図示しない回路基板に搭載されている。半導体発光装置A1では、第2リード32が半導体発光素子4のアノード電極に導通しており、第1リード31が半導体発光素子4のカソード電極に導通している。また、第3リード33および第4リード34が、カバー5の導電層53に導通している。 FIG. 13 is a system configuration diagram showing an example of an electronic apparatus using the semiconductor light emitting device A1. The electronic device C1 shown in the figure has a semiconductor light emitting device A1 and a controller Ct. The semiconductor light emitting device A1 and the controller Ct are mounted on, for example, a circuit board (not shown). In the semiconductor light emitting device A1, the second lead 32 is electrically connected to the anode electrode of the semiconductor light emitting element 4, and the first lead 31 is electrically connected to the cathode electrode of the semiconductor light emitting element 4. Further, the third lead 33 and the fourth lead 34 are electrically connected to the conductive layer 53 of the cover 5.
 第1リード31、第2リード32、第3リード33および第4リード34は、配線を介してコントローラCtに接続されている。コントローラCtは、半導体発光素子4の発光制御および導電層53の導通状態の検知制御を行う。 (4) The first lead 31, the second lead 32, the third lead 33, and the fourth lead 34 are connected to the controller Ct via wiring. The controller Ct performs light emission control of the semiconductor light emitting element 4 and detection control of the conduction state of the conductive layer 53.
 次に、半導体発光装置A1の作用について説明する。 Next, the operation of the semiconductor light emitting device A1 will be described.
 本実施形態によれば、本実施形態によれば、カバー5の基材層51に亀裂等の損傷が生じると、導電層53に亀裂を生じうる。これにより、導電層53が断線状態となるなど、導通状態が変化する。この変化を、たとえば図14に示すコントローラCtによって検知することにより、カバー5になんらかの不具合が生じたと判断することが可能である。これにより、コントローラCtは、たとえば半導体発光素子4の発光を停止することができる。したがって、カバー5の損傷に起因した半導体発光素子4からの光を直接視認することを抑制することができる。 According to the present embodiment, according to the present embodiment, if the base layer 51 of the cover 5 is damaged such as a crack, the conductive layer 53 may be cracked. Accordingly, the conduction state changes such that the conductive layer 53 is disconnected. By detecting this change by, for example, the controller Ct shown in FIG. 14, it is possible to determine that some trouble has occurred in the cover 5. Thereby, the controller Ct can stop the light emission of the semiconductor light emitting element 4, for example. Therefore, it is possible to prevent the light from the semiconductor light emitting element 4 caused by the damage of the cover 5 from being directly viewed.
 導電層53は、金属からなる。このため、ITO等を用いて導電層53を形成する場合と比べて、低コスト化を図ることができる。 The conductive layer 53 is made of metal. Therefore, the cost can be reduced as compared with the case where the conductive layer 53 is formed using ITO or the like.
 導電層53は、z方向視において半導体発光素子4から退避した位置に設けられている。このため、金属からなる53が、半導体発光素子4から出射された光を遮ってしまうことを抑制することができる。また、導電層53は、z方向視において、半導体発光素子4に対してy方向一方側に位置する部分(第2部5332)と、x方向一方側に位置する部分(第3部5333)と、を有する。これにより、基材層51にx方向に沿う亀裂が生じた場合とy方向に沿う亀裂が生じた場合との双方を検出することが可能である。さらに、導電層53は、半導体発光素子4に対してy方向両側に位置する部分(第2部5332および第4部5334)を有する。また、導電層53は、半導体発光素子4に対してx方向両側に位置する部分(第3部5333および第5部5335)を有する。これにより、亀裂の検出をより確実に行うことができる。 The conductive layer 53 is provided at a position retracted from the semiconductor light emitting element 4 when viewed in the z direction. Therefore, it is possible to prevent the metal 53 from blocking the light emitted from the semiconductor light emitting element 4. The conductive layer 53 includes a portion (second portion 5332) located on one side in the y direction with respect to the semiconductor light emitting element 4 and a portion located on one side in the x direction (third portion 5333) when viewed in the z direction. And Accordingly, it is possible to detect both the case where the base layer 51 has a crack along the x direction and the case where the base layer 51 has a crack along the y direction. Further, the conductive layer 53 has portions (second portion 5332 and fourth portion 5334) located on both sides in the y direction with respect to the semiconductor light emitting device 4. The conductive layer 53 has portions (third portion 5333 and fifth portion 5335) located on both sides in the x direction with respect to the semiconductor light emitting device 4. Thereby, crack detection can be performed more reliably.
 パッド部531およびパッド部532は、配線部533よりも厚さが厚い。これにより、ワイヤ61およびワイヤ62をより確実にボンディングすることができる。また、配線部533が相対的に薄いことにより、基材層51に亀裂等が生じた際に、より速やかに配線部533を断線させることができる。 (4) The pad portion 531 and the pad portion 532 are thicker than the wiring portion 533. Thereby, the wire 61 and the wire 62 can be more reliably bonded. Further, since the wiring portion 533 is relatively thin, the wiring portion 533 can be more quickly disconnected when a crack or the like occurs in the base material layer 51.
 ワイヤ61は、第3リード33に接続されており、ワイヤ62は、第4リード34に接続されている。第3リード33の第2面332および第4リード34の第2面342は、支持体1の第2面12を構成しており、露出している。これにより、半導体発光装置A1を実装する際に導電層53を図外のコントローラ等に適切に接続することができる。 The wire 61 is connected to the third lead 33, and the wire 62 is connected to the fourth lead 34. The second surface 332 of the third lead 33 and the second surface 342 of the fourth lead 34 constitute the second surface 12 of the support 1 and are exposed. This allows the conductive layer 53 to be appropriately connected to a controller or the like (not shown) when the semiconductor light emitting device A1 is mounted.
 半導体発光素子4が第1リード31に搭載されていることにおり、半導体発光素子4の発光時の熱を、第1リード31の第2面312から外部へと逃がすことができる。 (4) Since the semiconductor light emitting element 4 is mounted on the first lead 31, heat at the time of light emission of the semiconductor light emitting element 4 can be released from the second surface 312 of the first lead 31 to the outside.
 図14~図24は、本開示の変形例および他の実施形態を示している。なお、これらの図において、上記実施形態と同一または類似の要素には、上記実施形態と同一の符号を付している。 FIGS. 14 to 24 show modifications and other embodiments of the present disclosure. In these drawings, the same or similar elements as those in the above embodiment are denoted by the same reference numerals as those in the above embodiment.
 図14は、カバー5の変形例を示している。本例のカバー5は、導電層53の構成が上述した例のカバー5と異なっている。本例においては、第2層53bが、導電層53の一部に設けられている。具体的には、パッド部531およびパッド部532は、第1層53aおよび第2層53bを有する。一方、配線部533は、第2層53bのみからなり、第1層53aを含まない。 FIG. 14 shows a modification of the cover 5. The cover 5 of the present example is different from the cover 5 of the above-described example in the configuration of the conductive layer 53. In this example, the second layer 53b is provided on a part of the conductive layer 53. Specifically, the pad section 531 and the pad section 532 have a first layer 53a and a second layer 53b. On the other hand, the wiring section 533 is composed of only the second layer 53b and does not include the first layer 53a.
 本例によれば、配線部533は、第1層53aのみからなる。第1層53aが、たとえばTiからなる場合、Tiは、たとえば第2層53bの材質であるAuよりも脆い材質である。これにより、基材層51に亀裂等が生じた際に、より速やかに配線部533を断線させるのに好ましい。 According to the present example, the wiring section 533 is composed of only the first layer 53a. When the first layer 53a is made of, for example, Ti, for example, Ti is a material that is more brittle than Au, which is the material of the second layer 53b. Accordingly, when a crack or the like occurs in the base material layer 51, it is preferable to disconnect the wiring portion 533 more quickly.
<第1実施形態 第1変形例>
 図15は、半導体発光装置A1の第1変形例を示している。本例の半導体発光装置A11は、半導体発光装置A1における配線部533とは異なる配線部533を有する。
<First Embodiment First Modification>
FIG. 15 shows a first modification of the semiconductor light emitting device A1. The semiconductor light emitting device A11 of this example has a wiring portion 533 different from the wiring portion 533 of the semiconductor light emitting device A1.
 本例の配線部533は、第1部5331、第2部5332、第3部5333、第4部5334および第9部5339を有しており、上述した第5部5335、第6部5336、第7部5337および第8部5338を有さない。第4部5334は、第3部5333と第9部5339とに繋がっている。本例の導電層53は、半導体発光素子4に対してy方向両側に位置する部分(第2部5332および第4部5334)を有する。また、導電層53は、半導体発光素子4に対してx方向一方側に位置する部分(第3部5333)を有する。図示された導電部3の配線部533は、z方向視において半導体発光素子4を三方において囲む形状である。 The wiring portion 533 of this example includes a first portion 5331, a second portion 5332, a third portion 5333, a fourth portion 5334, and a ninth portion 5339, and the above-described fifth portion 5335, sixth portion 5336, It does not have the seventh part 5337 and the eighth part 5338. The fourth part 5334 is connected to the third part 5333 and the ninth part 5339. The conductive layer 53 of this example has portions (second portion 5332 and fourth portion 5334) located on both sides in the y direction with respect to the semiconductor light emitting device 4. The conductive layer 53 has a portion (third portion 5333) located on one side in the x direction with respect to the semiconductor light emitting device 4. The illustrated wiring portion 533 of the conductive portion 3 has a shape surrounding the semiconductor light emitting element 4 on three sides when viewed in the z direction.
 本例の半導体発光装置A11によっても、カバー5の損傷に起因した半導体発光素子4からの光を直接視認することを抑制することができる。本変形例から理解されるように、導電層53(配線部533)の形状は特に限定されない。 も The semiconductor light emitting device A11 according to the present embodiment can also suppress direct viewing of light from the semiconductor light emitting element 4 due to damage to the cover 5. As understood from the present modification, the shape of the conductive layer 53 (the wiring portion 533) is not particularly limited.
<第2実施形態>
 図16および図17は、本開示の第2実施形態に係る半導体発光装置を示している。図16は、本実施形態の半導体発光装置A2を示す平面図である。図17は、図16のXVI-XVI線に沿う断面図である。
<Second embodiment>
16 and 17 show a semiconductor light emitting device according to the second embodiment of the present disclosure. FIG. 16 is a plan view showing a semiconductor light emitting device A2 of the present embodiment. FIG. 17 is a sectional view taken along the line XVI-XVI in FIG.
 本実施形態においては、支持体1が、上述した半導体発光装置A1における第9面19、第10面1a、第11面1bおよび第12面1cを有していない。また、導電部3が、柱状部371および柱状部372を有する。 In the present embodiment, the support 1 does not have the ninth surface 19, the tenth surface 1a, the eleventh surface 1b, and the twelfth surface 1c in the semiconductor light emitting device A1 described above. Further, the conductive portion 3 has a columnar portion 371 and a columnar portion 372.
 柱状部371は、z方向視において第3リード33と重なっており、基材2を第3面23(第3面13)から第3リード33の第1面331まで貫通している。柱状部371は、たとえば第3リード33と同じ材質(Cu等)からなる。柱状部371は、たとえば共晶接合によって第3リード33に接合されている。 The columnar portion 371 overlaps with the third lead 33 when viewed in the z direction, and penetrates the base material 2 from the third surface 23 (the third surface 13) to the first surface 331 of the third lead 33. The columnar portion 371 is made of, for example, the same material (Cu or the like) as the third lead 33. The columnar portion 371 is joined to the third lead 33 by, for example, eutectic joining.
 柱状部372は、z方向視において第4リード34と重なっており、基材2を第3面23(第3面13)から34の第1面341まで貫通している。柱状部372は、たとえば第4リード34と同じ材質(Cu等)からなる。柱状部372は、たとえば共晶接合によって第4リード34に接合されている。 The columnar portion 372 overlaps the fourth lead 34 as viewed in the z direction, and penetrates the substrate 2 from the third surface 23 (the third surface 13) to the first surface 341 of the base 34. The columnar portion 372 is made of, for example, the same material (Cu or the like) as the fourth lead 34. The columnar portion 372 is joined to the fourth lead 34 by, for example, eutectic joining.
 本実施形態のカバー5は、拡散層52および導電層53が、基材層51のうち半導体発光素子4と対向する面に設けられている。拡散層52は、z方向視において半導体発光素子4と重なるように設けられており、導電層53から離間している。導電層53の配線部533は、上述した実施形態の配線部533と同様に、z方向視において半導体発光素子4を囲む形状である。また、配線部533は、z方向視において拡散層52を囲む形状である。また、本実施形態においては、第2部5332、第3部5333および第4部5334は、z方向視において第1面11と重なっている。また、第5部5335、第6部5336および第7部5337は、z方向視において第3面13と重なっている。 カ バ ー In the cover 5 of the present embodiment, the diffusion layer 52 and the conductive layer 53 are provided on the surface of the base layer 51 facing the semiconductor light emitting element 4. The diffusion layer 52 is provided so as to overlap the semiconductor light emitting element 4 when viewed in the z direction, and is separated from the conductive layer 53. The wiring portion 533 of the conductive layer 53 has a shape surrounding the semiconductor light emitting element 4 when viewed in the z direction, similarly to the wiring portion 533 of the above-described embodiment. The wiring portion 533 has a shape surrounding the diffusion layer 52 when viewed in the z direction. In the present embodiment, the second part 5332, the third part 5333, and the fourth part 5334 overlap the first surface 11 when viewed in the z direction. The fifth portion 5335, the sixth portion 5336, and the seventh portion 5337 overlap with the third surface 13 when viewed in the z direction.
 パッド部531と柱状部371とは、導電性接合材59によって接合されており、互いに導通している。導電性接合材59は、たとえばAgペーストやはんだである。また、パッド部532と柱状部372とは、同様に、導電性接合材59によって接合されており、互いに導通している。 The pad portion 531 and the columnar portion 371 are joined by the conductive joining material 59 and are electrically connected to each other. The conductive bonding material 59 is, for example, an Ag paste or a solder. The pad portion 532 and the columnar portion 372 are similarly joined by the conductive joining material 59 and are electrically connected to each other.
 このような実施形態によっても、カバー5の損傷に起因した半導体発光素子4からの光を直接視認することを抑制することができる。また、柱状部371および柱状部372によって導電層53と第3リード33および第4リード34とを導通させることにより、導電層53への導通経路の低抵抗化を図ることができる。これは、配線部533の断線発生、すなわち基材層51の亀裂発生をより高精度に検出するのに好ましい。 According to such an embodiment as well, it is possible to prevent the light from the semiconductor light emitting element 4 caused by the damage of the cover 5 from being directly viewed. In addition, by conducting the conductive layer 53 to the third lead 33 and the fourth lead 34 by the columnar portions 371 and 372, the resistance of the conduction path to the conductive layer 53 can be reduced. This is preferable for detecting the occurrence of disconnection of the wiring portion 533, that is, the occurrence of cracks in the base material layer 51 with higher accuracy.
<第2実施形態 第1変形例>
 図18は、半導体発光装置A2の第1変形例を示す断面図である。本例においては、基材層51と導電層53との間に拡散層52が介在している。拡散層52は、基材層51の片面の全面に形成されている。
<Second Embodiment First Modification>
FIG. 18 is a sectional view showing a first modification of the semiconductor light emitting device A2. In this example, the diffusion layer 52 is interposed between the base layer 51 and the conductive layer 53. The diffusion layer 52 is formed on one entire surface of the base layer 51.
 このような変形例によっても、カバー5の損傷に起因した半導体発光素子4からの光を直接視認することを抑制することができる。また、たとえばエポキシ樹脂層からなる拡散層52は、ガラス等からなる基材層51と比べて熱膨張率が大きく、熱変形しやすい。また、導電層53が、たとえばAuを含む層である場合、延性に優れる。したがって、導電層53が拡散層52の熱変形に追従しやすく、温度変化によって導電層53が断線することを抑制可能であり、カバー5(基材層51)に亀裂が生じたと誤検出することを回避することができる。 に よ っ て According to such a modification as well, it is possible to prevent the light from the semiconductor light emitting element 4 caused by damage to the cover 5 from being directly viewed. Further, for example, the diffusion layer 52 made of an epoxy resin layer has a larger coefficient of thermal expansion than the base layer 51 made of glass or the like, and is easily deformed by heat. When the conductive layer 53 is a layer containing Au, for example, it has excellent ductility. Therefore, the conductive layer 53 can easily follow the thermal deformation of the diffusion layer 52, and it is possible to suppress disconnection of the conductive layer 53 due to a temperature change, and it is erroneously detected that a crack has occurred in the cover 5 (base layer 51). Can be avoided.
<第3実施形態>
 図19および図20は、本開示の第3実施形態に係る半導体発光装置を示している。図19は、本実施形態の半導体発光装置A3を示す平面図である。図20は、図19のXX-XX線に沿う断面図である。
<Third embodiment>
19 and 20 show a semiconductor light emitting device according to the third embodiment of the present disclosure. FIG. 19 is a plan view showing the semiconductor light emitting device A3 of the present embodiment. FIG. 20 is a sectional view taken along line XX-XX in FIG.
 本実施形態の支持体1は、半導体発光装置A2の支持体1が有する第1面11、第2面12、第3面13、第4面14、第5面15、第6面16、第7面17および第8面18に加えて、第13面1dおよび第14面1eを有する。 The support 1 of the present embodiment includes the first surface 11, the second surface 12, the third surface 13, the fourth surface 14, the fifth surface 15, the sixth surface 16, and the first surface 11, the second surface 12, and the third surface 13 of the support 1 of the semiconductor light emitting device A2. It has a thirteenth surface 1d and a fourteenth surface 1e in addition to the seventh surface 17 and the eighth surface 18.
 第13面1dは、第1面11と同様にz方向一方側を向く面であり、z方向において第1面11と第3面13との間に位置している。第13面1dは、z方向視において第1面11および第4面14を囲む環状である。第14面1eは、z方向において第13面1dと第3面13との間に位置しており、図示された例においては、第13面1dと第3面13とに繋がっている。第14面1eは、対向し合う部分同士の距離がz方向において第13面1dから第3面13に向かうほど大きくなるように傾いている。 13The thirteenth surface 1d is a surface facing one side in the z direction similarly to the first surface 11, and is located between the first surface 11 and the third surface 13 in the z direction. The thirteenth surface 1d is an annular shape surrounding the first surface 11 and the fourth surface 14 when viewed in the z direction. The fourteenth surface 1e is located between the thirteenth surface 1d and the third surface 13 in the z direction, and is connected to the thirteenth surface 1d and the third surface 13 in the illustrated example. The fourteenth surface 1e is inclined such that the distance between the opposing portions increases in the z direction from the thirteenth surface 1d toward the third surface 13.
 本実施形態の基材2は、第13面2dおよび第14面2eを有する。第13面2dは、第13面1dを構成する面である。第14面2eは、第14面1eを構成する面である。
The base material 2 of the present embodiment has a thirteenth surface 2d and a fourteenth surface 2e. The thirteenth surface 2d is a surface constituting the thirteenth surface 1d. The fourteenth surface 2e is a surface that constitutes the fourteenth surface 1e.
 本実施形態のカバー5は、基材層51、拡散層52、導電層53および基材層54を含む。基材層51のうち半導体発光素子4と対向する面には、導電層53が形成されている。基材層51は、接合材57によって支持体1の第3面13に接合されている。また、導電層53のパッド部531は柱状部371に導通接合されており、パッド部532は、柱状部372に導通接合されている。 カ バ ー The cover 5 of the present embodiment includes a base layer 51, a diffusion layer 52, a conductive layer 53, and a base layer 54. A conductive layer 53 is formed on a surface of the base layer 51 facing the semiconductor light emitting element 4. The base material layer 51 is joined to the third surface 13 of the support 1 by a joining material 57. The pad 531 of the conductive layer 53 is conductively connected to the column 371, and the pad 532 is conductively connected to the column 372.
 基材層54は、ガラス等の半導体発光素子4からの光を透過させる材料からなる。本実施形態においては、基材層54は、透明なガラスからなる。基材層54の形状等は特に限定されず、本実施形態においては矩形状である。本実施形態においては、拡散層52は、基材層54のうち半導体発光素子4と対向する面に形成されており、基材層54の片面全面に形成されている。基材層54は、接合材58によって支持体1の第13面1dに接合されている。基材層51および基材層54は、ともにz方向視において半導体発光素子4と重なる。 The base layer 54 is made of a material such as glass that transmits light from the semiconductor light emitting element 4. In the present embodiment, the base layer 54 is made of transparent glass. The shape and the like of the base layer 54 are not particularly limited, and are rectangular in the present embodiment. In the present embodiment, the diffusion layer 52 is formed on the surface of the base layer 54 facing the semiconductor light emitting element 4, and is formed on one entire surface of the base layer 54. The base material layer 54 is joined to the thirteenth surface 1 d of the support 1 by a joining material 58. The base layer 51 and the base layer 54 both overlap the semiconductor light emitting element 4 when viewed in the z direction.
 このような実施形態によっても、カバー5の損傷に起因した半導体発光素子4からの光を直接視認することを抑制することができる。また、本実施形態から理解されるように、カバー5は、拡散層52と導電層53とが、同一の部材に形成された構成に限定されない。 According to such an embodiment as well, it is possible to prevent the light from the semiconductor light emitting element 4 caused by the damage of the cover 5 from being directly viewed. Further, as understood from the present embodiment, the cover 5 is not limited to the configuration in which the diffusion layer 52 and the conductive layer 53 are formed on the same member.
<第4実施形態>
 図21は、本開示の第4実施形態に係る半導体発光装置A4を示す断面図である。本実施形態の支持体1は、半導体発光装置A1の支持体1と類似の構成であるものの、具体的構造が異なり、いわゆる多層配線基板からなる。
<Fourth embodiment>
FIG. 21 is a cross-sectional view illustrating a semiconductor light emitting device A4 according to the fourth embodiment of the present disclosure. The support 1 of the present embodiment has a similar structure to the support 1 of the semiconductor light emitting device A1, but has a specific structure different from that of the semiconductor light emitting device A1, and is formed of a so-called multilayer wiring board.
 本実施形態の基材2は、第1層201および第2層202を含む。第1層201および第2層202は、それぞれ絶縁性材料からなり、たとえばガラスエポキシ樹脂からなる。 基材 The base material 2 of the present embodiment includes a first layer 201 and a second layer 202. The first layer 201 and the second layer 202 are each made of an insulating material, for example, glass epoxy resin.
 導電部3は、第1部381、第2部382、第3部383、第5部385、第6部386、第7部387、第9部389、第10部38aおよび第11部38bを有する。第1部381、第2部382、第3部383、第5部385、第6部386、第7部387、第9部389、第10部38aおよび第11部38bは、金属からなり、たとえばCu,Ni,Au等のめっき層からなる。 The conductive part 3 includes a first part 381, a second part 382, a third part 383, a fifth part 385, a sixth part 386, a seventh part 387, a ninth part 389, a tenth part 38a, and an eleventh part 38b. Have. The first part 381, the second part 382, the third part 383, the fifth part 385, the sixth part 386, the seventh part 387, the ninth part 389, the tenth part 38a and the eleventh part 38b are made of metal, For example, it is made of a plating layer of Cu, Ni, Au or the like.
 第1部381は、第1層201上に形成されており、たとえば半導体発光装置A1における第1面311とz方向視における形状、大きさや配置が同じである。第2部382は、第1層201上に形成されており、たとえば半導体発光装置A1における第1面321とz方向視における形状、大きさや配置が同じである。第3部383は、第1層201上に形成されており、たとえば半導体発光装置A1における第1面331とz方向視における形状、大きさや配置が同じである。なお、z方向視における形状、大きさや配置が半導体発光装置A1における第1面341と同じである部位をさらに有してもよい。 The first portion 381 is formed on the first layer 201, and has the same shape, size, and arrangement as viewed in the z direction, for example, as the first surface 311 of the semiconductor light emitting device A1. The second portion 382 is formed on the first layer 201, and has the same shape, size, and arrangement as viewed in the z direction, for example, as the first surface 321 of the semiconductor light emitting device A1. The third portion 383 is formed on the first layer 201, and has the same shape, size, and arrangement as viewed in the z direction, for example, as the first surface 331 of the semiconductor light emitting device A1. The semiconductor light emitting device A1 may further include a portion having the same shape, size, and arrangement as the first surface 341 in the semiconductor light emitting device A1 when viewed in the z direction.
 第5部385は、第1層201の第2面22上に形成されており、たとえば半導体発光装置A1における第2面312とz方向視における形状、大きさや配置が同じである。第6部386は、第1層201の第2面22上に形成されており、たとえば半導体発光装置A1における第2面322とz方向視における形状、大きさや配置が同じである。第7部387は、第1層201の第2面22上に形成されており、たとえば半導体発光装置A1における第2面332とz方向視における形状、大きさや配置が同じである。なお、z方向視における形状、大きさや配置が半導体発光装置A1における第2面342と同じである部位をさらに有してもよい。 The fifth portion 385 is formed on the second surface 22 of the first layer 201, and has the same shape, size, and arrangement as viewed in the z direction, for example, as the second surface 312 of the semiconductor light emitting device A1. The sixth portion 386 is formed on the second surface 22 of the first layer 201, and has the same shape, size, and arrangement as viewed in the z direction, for example, as the second surface 322 of the semiconductor light emitting device A1. The seventh portion 387 is formed on the second surface 22 of the first layer 201, and has the same shape, size, and arrangement as viewed in the z direction, for example, as the second surface 332 of the semiconductor light emitting device A1. The semiconductor light emitting device A1 may further include a portion having the same shape, size, and arrangement as the second surface 342 in the semiconductor light emitting device A1 as viewed in the z direction.
 第9部389は、第1層201をz方向に貫通しており、第1部381と第5部385とに繋がっている。第10部38aは、第1層201をz方向に貫通しており、第2部382と第6部386とに繋がっている。第11部38bは、第1層201をz方向に貫通しており、第3部383と第7部387とに繋がっている。なお、z方向視における形状、大きさや配置が半導体発光装置A1における第1面341と同じである部位と、z方向視における形状、大きさや配置が半導体発光装置A1における第2面342と同じである部位とに繋がる部位をさらに有してもよい。 9The ninth part 389 penetrates the first layer 201 in the z direction, and is connected to the first part 381 and the fifth part 385. The tenth portion 38a penetrates the first layer 201 in the z direction, and is connected to the second portion 382 and the sixth portion 386. The eleventh part 38b penetrates the first layer 201 in the z direction, and is connected to the third part 383 and the seventh part 387. It should be noted that the shape, size and arrangement in the z direction are the same as those of the first surface 341 in the semiconductor light emitting device A1, and the shape, size and arrangement in the z direction are the same as the second surface 342 in the semiconductor light emitting device A1. It may further have a part connected to a certain part.
 このような実施形態によっても、カバー5の損傷に起因した半導体発光素子4からの光を直接視認することを抑制することができる。また、本実施形態から理解されるように、支持体1の具体的構造は、何ら限定されない。 According to such an embodiment as well, it is possible to prevent the light from the semiconductor light emitting element 4 caused by the damage of the cover 5 from being directly viewed. Further, as understood from the present embodiment, the specific structure of the support 1 is not limited at all.
<第5実施形態>
 図22は、本開示の第5実施形態に係る半導体発光装置A5を示す断面図である。本実施形態の支持体1は、半導体発光装置A1の支持体1と類似の構成であるものの、具体的構造が異なり、いわゆるセラミック配線基板からなる。
<Fifth embodiment>
FIG. 22 is a cross-sectional view illustrating a semiconductor light emitting device A5 according to the fifth embodiment of the present disclosure. The support 1 of this embodiment has a similar structure to the support 1 of the semiconductor light emitting device A1, but has a specific structure different from that of the semiconductor light emitting device A1, and is made of a so-called ceramic wiring board.
 本実施形態の基材2は、第1層201、第2層202および第3層203を含む。第1層201、第2層202および第3層203は、それぞれアルミナ等のセラミックスからなる。本実施形態の第4面14、第10面1aおよび第12面1cは、z方向に沿った形状である。導電部3の構成は、たとえば半導体発光装置A4における導電部3と類似の構成である。 基材 The base material 2 of the present embodiment includes a first layer 201, a second layer 202, and a third layer 203. The first layer 201, the second layer 202, and the third layer 203 are each made of a ceramic such as alumina. The fourth surface 10, the tenth surface 1a, and the twelfth surface 1c of the present embodiment have a shape along the z direction. The configuration of the conductive section 3 is similar to, for example, the conductive section 3 in the semiconductor light emitting device A4.
 このような実施形態によっても、カバー5の損傷に起因した半導体発光素子4からの光を直接視認することを抑制することができる。また、また、本実施形態から理解されるように、支持体1の具体的構造は、何ら限定されない。 According to such an embodiment as well, it is possible to prevent the light from the semiconductor light emitting element 4 caused by the damage of the cover 5 from being directly viewed. Further, as understood from the present embodiment, the specific structure of the support 1 is not limited at all.
<第6実施形態>
 図23は、本開示の第6実施形態に係る半導体発光装置A6を示す平面図であり、図24は、図23のXXIV-XXIV線に沿う断面図である。本実施形態の半導体発光装置A6は、受光素子8を備える。
<Sixth embodiment>
FIG. 23 is a plan view showing a semiconductor light emitting device A6 according to the sixth embodiment of the present disclosure, and FIG. 24 is a cross-sectional view taken along the line XXIV-XXIV of FIG. The semiconductor light emitting device A6 of the present embodiment includes a light receiving element 8.
 本実施形態の導電部3は、第5リード35および第6リード36を含む。 導電 The conductive portion 3 of the present embodiment includes a fifth lead 35 and a sixth lead 36.
 第5リード35は、第1リード31に対してx方向一方側に離間して配置されている。第5リード35は、第1面351、第2面352、主部355、縁部356および複数の延出部357を有する。第1面351は、z方向一方側を向く面であり、第1面11を構成している。z方向視において、第1面351の一部は、第4面14(第4面24)に囲まれた領域に露出している。第2面352は、第1面351とは反対側のz方向他方側を向く面であり、第2面12の一部を構成する。図示された例においては、第2面352は、z方向視において第1面351よりも小さく、第1面351に内包されている。 (5) The fifth lead 35 is spaced apart from the first lead 31 on one side in the x direction. The fifth lead 35 has a first surface 351, a second surface 352, a main portion 355, an edge 356, and a plurality of extending portions 357. The first surface 351 is a surface facing one side in the z direction, and forms the first surface 11. When viewed in the z direction, a part of the first surface 351 is exposed to a region surrounded by the fourth surface 14 (the fourth surface 24). The second surface 352 is a surface facing the other side in the z direction opposite to the first surface 351 and forms a part of the second surface 12. In the illustrated example, the second surface 352 is smaller than the first surface 351 when viewed in the z direction, and is included in the first surface 351.
 主部355は、第1面351および第2面352を有する部位であり、z方向視において第1面351および第2面352の双方が重なる部位である。縁部356は、z方向視において主部355を囲む部位であり、第1面351の一部を有する。縁部356のz方向他方側部分は、基材2によって覆われている。複数の延出部357は、z方向視において縁部356から外方に延出している。延出部357は、第1面351の一部を有する。延出部357のz方向他方側部分は、基材2によって覆われている。図示された例においては、第5リード35は、2つの延出部357を有する。1つの延出部357は、基材2の第5面25に到達しており、端面が第5面25と面一であり、第5面25から露出している。他の1つの延出部357は、基材2の第7面27に到達しており、端面が第7面27と面一であり、第7面27から露出している。 The main portion 355 is a portion having the first surface 351 and the second surface 352, and is a portion where both the first surface 351 and the second surface 352 overlap in the z direction. The edge portion 356 is a portion surrounding the main portion 355 when viewed in the z direction, and has a part of the first surface 351. The other side in the z direction of the edge 356 is covered with the base material 2. The plurality of extending portions 357 extend outward from the edge 356 when viewed in the z direction. The extension 357 has a part of the first surface 351. The other side in the z direction of the extension 357 is covered with the base material 2. In the illustrated example, the fifth lead 35 has two extensions 357. One extension 357 has reached the fifth surface 25 of the base material 2, has an end surface flush with the fifth surface 25, and is exposed from the fifth surface 25. The other extension 357 reaches the seventh surface 27 of the base material 2, has an end surface flush with the seventh surface 27, and is exposed from the seventh surface 27.
 第6リード36は、第1リード31に対してx方向一方側に離間して配置されており、第5リード35に対してy方向他方側に離間して配置されている。第6リード36は、第1面361、第2面362、主部365、縁部366および複数の延出部367を有する。第1面361は、z方向一方側を向く面であり、第1面11を構成している。z方向視において、第1面361の一部は、第4面14(第4面24)に囲まれた領域に露出している。第2面362は、第1面361とは反対側のz方向他方側を向く面であり、第2面12の一部を構成する。図示された例においては、第2面362は、z方向視において第1面361よりも小さく、第1面361に内包されている。 (6) The sixth lead 36 is spaced apart from the first lead 31 on one side in the x direction, and is spaced apart from the fifth lead 35 on the other side in the y direction. The sixth lead 36 has a first surface 361, a second surface 362, a main portion 365, an edge 366, and a plurality of extending portions 367. The first surface 361 is a surface facing one side in the z direction, and forms the first surface 11. When viewed in the z direction, a part of the first surface 361 is exposed in a region surrounded by the fourth surface 14 (the fourth surface 24). The second surface 362 is a surface facing the other side in the z direction opposite to the first surface 361 and forms a part of the second surface 12. In the illustrated example, the second surface 362 is smaller than the first surface 361 when viewed in the z direction, and is included in the first surface 361.
 主部365は、第1面361および第2面362を有する部位であり、z方向視において第1面361および第2面362の双方が重なる部位である。縁部366は、z方向視において主部365を囲む部位であり、第1面361の一部を有する。縁部366のz方向他方側部分は、基材2によって覆われている。複数の延出部367は、z方向視において縁部366から外方に延出している。延出部367は、第1面361の一部を有する。延出部367のz方向他方側部分は、基材2によって覆われている。図示された例においては、第6リード36は、2つの延出部367を有する。1つの延出部367は、基材2の第6面26に到達しており、端面が第6面26と面一であり、第6面26から露出している。他の1つの延出部367は、基材2の第7面27に到達しており、端面が第7面27と面一であり、第7面27から露出している。 The main portion 365 is a portion having the first surface 361 and the second surface 362, and is a portion where both the first surface 361 and the second surface 362 overlap in the z direction. The edge 366 is a portion surrounding the main portion 365 when viewed in the z direction, and has a part of the first surface 361. The other side of the edge 366 in the z direction is covered with the base material 2. The plurality of extending portions 367 extend outward from the edge 366 when viewed in the z direction. The extension 367 has a part of the first surface 361. The other side of the extension 367 in the z direction is covered with the base material 2. In the example shown, the sixth lead 36 has two extensions 367. One extension 367 reaches the sixth surface 26 of the base material 2, has an end surface flush with the sixth surface 26, and is exposed from the sixth surface 26. The other extension 367 reaches the seventh surface 27 of the substrate 2, has an end surface flush with the seventh surface 27, and is exposed from the seventh surface 27.
 受光素子8は、半導体発光素子4から発せられる光を受光することによって起電力を生じる光電変換機能を有する素子である。受光素子8は、たとえばAg等の金属を含むペーストまたははんだ等の導電性接合材88によって第5リード35の第1面351にダイボンディングされている。また、受光素子8は、ワイヤ89によって第6リード36の第1面361に接続されている。ワイヤ89は、たとえばAu等の金属からなり、受光素子8と第1面361とにそれぞれボンディングされている。 The light receiving element 8 is an element having a photoelectric conversion function of generating electromotive force by receiving light emitted from the semiconductor light emitting element 4. The light receiving element 8 is die-bonded to the first surface 351 of the fifth lead 35 by a conductive bonding material 88 such as a paste or a solder containing a metal such as Ag. The light receiving element 8 is connected to the first surface 361 of the sixth lead 36 by a wire 89. The wire 89 is made of a metal such as Au, for example, and is bonded to the light receiving element 8 and the first surface 361, respectively.
 本実施形態においては、導電層53の配線部533(第3部5333)が、z方向視において受光素子8と重なっている。 In the present embodiment, the wiring portion 533 (third portion 5333) of the conductive layer 53 overlaps the light receiving element 8 when viewed in the z direction.
 このような実施形態によっても、カバー5の損傷に起因した半導体発光素子4からの光を直接視認することを抑制することができる。また、受光素子8を備えることにより、受光素子8の出力信号から、半導体発光素子4の発光状態を監視することができる。また、z方向視において第3部5333(配線部533)が受光素子8と重なっている。これにより、半導体発光素子4からの光の一部を、金属からなる第3部5333(配線部533)によって反射し、受光素子8へと向かわせることが可能である。したがって、受光素子8の発光状態の監視をより高精度に行うことができる。 According to such an embodiment as well, it is possible to prevent the light from the semiconductor light emitting element 4 caused by the damage of the cover 5 from being directly viewed. Further, the provision of the light receiving element 8 enables the light emitting state of the semiconductor light emitting element 4 to be monitored from the output signal of the light receiving element 8. Further, the third portion 5333 (the wiring portion 533) overlaps with the light receiving element 8 when viewed in the z direction. Thus, part of the light from the semiconductor light emitting element 4 can be reflected by the third portion 5333 (wiring portion 533) made of metal and directed to the light receiving element 8. Therefore, the light emission state of the light receiving element 8 can be monitored with higher accuracy.
 本開示に係る半導体発光装置は、上述した実施形態に限定されるものではない。本開示に係る半導体発光装置の各部の具体的な構成は、種々に設計変更自在である。 半導体 The semiconductor light emitting device according to the present disclosure is not limited to the embodiments described above. The specific configuration of each part of the semiconductor light emitting device according to the present disclosure can be variously changed in design.
  〔付記1〕
 半導体発光素子と、
 基材および導電部を有し、前記半導体発光素子を支持する支持体と、
 第1方向視において前記半導体発光素子に重なり且つ前記半導体発光素子からの光を透過させるカバーと、を備えており、
 前記カバーは、前記半導体発光素子からの光を透過させる基材層および前記基材層上に配置された導電層を含む、半導体発光装置。
  〔付記2〕
 前記導電層は、前記第1方向視において前記半導体発光素子から退避した位置に設けられている、付記1に記載の半導体発光装置。
  〔付記3〕
 前記導電層は、前記第1方向視において、前記半導体発光素子に対して前記第1方向と直角である第2方向一方側に位置する部分と、前記第1方向および前記第2方向のいずれに対しても直角である第3方向一方側に位置する部分と、を有する、付記2に記載の半導体発光装置。
  〔付記4〕
 前記導電層は、前記半導体発光素子に対して前記第2方向両側に位置する部分を有する、付記3に記載の半導体発光装置。
  〔付記5〕
 前記導電層は、前記半導体発光素子に対して前記第3方向両側に位置する部分を有する、付記4に記載の半導体発光装置。
  〔付記6〕
 前記導電層は、金属からなる、付記3ないし5のいずれかに記載の半導体発光装置。
  〔付記7〕
 前記導電層は、前記導電部との接続箇所であるパッド部と、前記パッド部に繋がる配線部とを含む、付記6に記載の半導体発光装置。
  〔付記8〕
 前記パッド部の厚さは、前記配線部の厚さよりも厚い、付記7に記載の半導体発光装置。
  〔付記9〕
 前記導電層は、互いに積層された第1層および第2層を含む、付記8に記載の半導体発光装置。
  〔付記10〕
 前記配線部において、前記第1層は、前記第2層から露出している、付記9に記載の半導体発光装置。
  〔付記11〕
 前記カバーは、前記半導体発光素子からの光を拡散させる拡散層を含む、付記3ないし10のいずれかに記載の半導体発光装置。
  〔付記12〕
 前記導電層は、前記基材層を挟んで前記拡散層とは反対側に配置されている、付記11に記載の半導体発光装置。
  〔付記13〕
 前記導電層は、前記基材層に対して前記拡散層と同じ側に配置されている、付記11に記載の半導体発光装置。
  〔付記14〕
 前記拡散層は、前記第1方向視において前記導電層から離間している、付記13に記載の半導体発光装置。
  〔付記15〕
 前記支持体は、前記半導体発光素子が配置され且つ前記第1方向を向く第1面、前記第1面とは反対側を向く第2面、前記第1面と同じ側を向き且つ前記第1面よりも前記第2面から離間するとともに前記第1方向視において前記第1面を囲む第3面および前記第1面と前記第3面との間に介在する第4面を有し、
 前記カバーは、前記第3面に支持されている、付記3ないし14のいずれかに記載の半導体発光装置。
  〔付記16〕
 前記導電層と前記導電部とに接続されたワイヤを備える、付記15に記載の半導体発光装置。
  〔付記17〕
 前記導電部は、前記導電層に導通し、且つ前記基材を前記第1方向に貫通する柱状部を含む、付記15に記載の半導体発光装置。
  〔付記18〕
 前記半導体発光素子は、VCSEL素子である、付記1ないし17のいずれかに記載の半導体発光装置。
[Appendix 1]
A semiconductor light emitting device;
Having a substrate and a conductive portion, a support for supporting the semiconductor light emitting element,
A cover that overlaps with the semiconductor light emitting element when viewed in a first direction and transmits light from the semiconductor light emitting element;
The semiconductor light emitting device, wherein the cover includes a base layer that transmits light from the semiconductor light emitting element and a conductive layer disposed on the base layer.
[Appendix 2]
The semiconductor light emitting device according to claim 1, wherein the conductive layer is provided at a position retracted from the semiconductor light emitting element when viewed in the first direction.
[Appendix 3]
The conductive layer has a portion positioned on one side in a second direction perpendicular to the first direction with respect to the semiconductor light emitting element when viewed in the first direction, and in any of the first direction and the second direction. 3. The semiconductor light emitting device according to claim 2, further comprising: a portion located on one side in a third direction that is also at a right angle.
[Appendix 4]
The semiconductor light emitting device according to claim 3, wherein the conductive layer has portions located on both sides in the second direction with respect to the semiconductor light emitting element.
[Appendix 5]
5. The semiconductor light emitting device according to claim 4, wherein the conductive layer has portions located on both sides in the third direction with respect to the semiconductor light emitting element.
[Appendix 6]
6. The semiconductor light emitting device according to any one of supplementary notes 3 to 5, wherein the conductive layer is made of a metal.
[Appendix 7]
7. The semiconductor light emitting device according to claim 6, wherein the conductive layer includes a pad portion that is a connection portion with the conductive portion, and a wiring portion connected to the pad portion.
[Appendix 8]
8. The semiconductor light emitting device according to claim 7, wherein a thickness of the pad portion is larger than a thickness of the wiring portion.
[Appendix 9]
9. The semiconductor light emitting device according to claim 8, wherein the conductive layer includes a first layer and a second layer stacked on each other.
[Appendix 10]
The semiconductor light emitting device according to claim 9, wherein the first layer is exposed from the second layer in the wiring section.
[Appendix 11]
The semiconductor light emitting device according to any one of supplementary notes 3 to 10, wherein the cover includes a diffusion layer that diffuses light from the semiconductor light emitting element.
[Appendix 12]
The semiconductor light emitting device according to claim 11, wherein the conductive layer is disposed on a side opposite to the diffusion layer with the base layer interposed therebetween.
[Appendix 13]
The semiconductor light emitting device according to claim 11, wherein the conductive layer is arranged on the same side as the diffusion layer with respect to the base layer.
[Appendix 14]
The semiconductor light emitting device according to claim 13, wherein the diffusion layer is separated from the conductive layer when viewed in the first direction.
[Appendix 15]
The support has a first surface on which the semiconductor light emitting element is arranged and faces the first direction, a second surface facing the opposite side to the first surface, a first surface facing the same side as the first surface and the first surface. A third surface surrounding the first surface and a fourth surface interposed between the first surface and the third surface in the first direction as viewed from the first direction;
The semiconductor light emitting device according to any one of supplementary notes 3 to 14, wherein the cover is supported on the third surface.
[Appendix 16]
16. The semiconductor light emitting device according to claim 15, further comprising a wire connected to the conductive layer and the conductive portion.
[Appendix 17]
16. The semiconductor light emitting device according to claim 15, wherein the conductive portion includes a columnar portion that is electrically connected to the conductive layer and penetrates the base material in the first direction.
[Appendix 18]
The semiconductor light emitting device according to any one of supplementary notes 1 to 17, wherein the semiconductor light emitting element is a VCSEL element.

Claims (18)

  1.  半導体発光素子と、
     基材および導電部を有し、前記半導体発光素子を支持する支持体と、
     第1方向視において前記半導体発光素子に重なり且つ前記半導体発光素子からの光を透過させるカバーと、を備えており、
     前記カバーは、前記半導体発光素子からの光を透過させる基材層および前記基材層上に配置された導電層を含む、半導体発光装置。
    A semiconductor light emitting device;
    Having a substrate and a conductive portion, a support for supporting the semiconductor light emitting element,
    A cover that overlaps with the semiconductor light emitting element when viewed in a first direction and transmits light from the semiconductor light emitting element;
    The semiconductor light emitting device, wherein the cover includes a base layer that transmits light from the semiconductor light emitting element and a conductive layer disposed on the base layer.
  2.  前記導電層は、前記第1方向視において前記半導体発光素子から退避した位置に設けられている、請求項1に記載の半導体発光装置。 The semiconductor light emitting device according to claim 1, wherein the conductive layer is provided at a position retracted from the semiconductor light emitting element when viewed in the first direction.
  3.  前記導電層は、前記第1方向視において、前記半導体発光素子に対して前記第1方向と直角である第2方向一方側に位置する部分と、前記第1方向および前記第2方向のいずれに対しても直角である第3方向一方側に位置する部分と、を有する、請求項2に記載の半導体発光装置。 The conductive layer has a portion positioned on one side in a second direction perpendicular to the first direction with respect to the semiconductor light emitting element when viewed in the first direction, and in any of the first direction and the second direction. 3. The semiconductor light emitting device according to claim 2, further comprising: a portion located on one side in a third direction that is also at a right angle.
  4.  前記導電層は、前記半導体発光素子に対して前記第2方向両側に位置する部分を有する、請求項3に記載の半導体発光装置。 The semiconductor light emitting device according to claim 3, wherein the conductive layer has portions located on both sides in the second direction with respect to the semiconductor light emitting element.
  5.  前記導電層は、前記半導体発光素子に対して前記第3方向両側に位置する部分を有する、請求項4に記載の半導体発光装置。 The semiconductor light emitting device according to claim 4, wherein the conductive layer has portions located on both sides in the third direction with respect to the semiconductor light emitting element.
  6.  前記導電層は、金属からなる、請求項3ないし5のいずれかに記載の半導体発光装置。 6. The semiconductor light emitting device according to claim 3, wherein the conductive layer is made of a metal.
  7.  前記導電層は、前記導電部との接続箇所であるパッド部と、前記パッド部に繋がる配線部とを含む、請求項6に記載の半導体発光装置。 7. The semiconductor light emitting device according to claim 6, wherein the conductive layer includes a pad portion that is a connection portion with the conductive portion, and a wiring portion connected to the pad portion.
  8.  前記パッド部の厚さは、前記配線部の厚さよりも厚い、請求項7に記載の半導体発光装置。 8. The semiconductor light emitting device according to claim 7, wherein the thickness of the pad portion is larger than the thickness of the wiring portion.
  9.  前記導電層は、互いに積層された第1層および第2層を含む、請求項8に記載の半導体発光装置。 The semiconductor light emitting device according to claim 8, wherein the conductive layer includes a first layer and a second layer stacked on each other.
  10.  前記配線部において、前記第1層は、前記第2層から露出している、請求項9に記載の半導体発光装置。 The semiconductor light emitting device according to claim 9, wherein the first layer is exposed from the second layer in the wiring section.
  11.  前記カバーは、前記半導体発光素子からの光を拡散させる拡散層を含む、請求項3ないし10のいずれかに記載の半導体発光装置。 11. The semiconductor light emitting device according to claim 3, wherein the cover includes a diffusion layer that diffuses light from the semiconductor light emitting element.
  12.  前記導電層は、前記基材層を挟んで前記拡散層とは反対側に配置されている、請求項11に記載の半導体発光装置。 The semiconductor light emitting device according to claim 11, wherein the conductive layer is disposed on the opposite side of the base layer from the diffusion layer.
  13.  前記導電層は、前記基材層に対して前記拡散層と同じ側に配置されている、請求項11に記載の半導体発光装置。 The semiconductor light emitting device according to claim 11, wherein the conductive layer is arranged on the same side as the diffusion layer with respect to the base layer.
  14.  前記拡散層は、前記第1方向視において前記導電層から離間している、請求項13に記載の半導体発光装置。 The semiconductor light emitting device according to claim 13, wherein the diffusion layer is separated from the conductive layer when viewed in the first direction.
  15.  前記支持体は、前記半導体発光素子が配置され且つ前記第1方向を向く第1面、前記第1面とは反対側を向く第2面、前記第1面と同じ側を向き且つ前記第1面よりも前記第2面から離間するとともに前記第1方向視において前記第1面を囲む第3面および前記第1面と前記第3面との間に介在する第4面を有し、
     前記カバーは、前記第3面に支持されている、請求項3ないし14のいずれかに記載の半導体発光装置。
    The support has a first surface on which the semiconductor light emitting element is arranged and faces the first direction, a second surface facing the opposite side to the first surface, a first surface facing the same side as the first surface and the first surface. A third surface surrounding the first surface and a fourth surface interposed between the first surface and the third surface in the first direction as viewed from the first direction;
    15. The semiconductor light emitting device according to claim 3, wherein said cover is supported by said third surface.
  16.  前記導電層と前記導電部とに接続されたワイヤを備える、請求項15に記載の半導体発光装置。 16. The semiconductor light emitting device according to claim 15, further comprising: a wire connected to the conductive layer and the conductive portion.
  17.  前記導電部は、前記導電層に導通し、且つ前記基材を前記第1方向に貫通する柱状部を含む、請求項15に記載の半導体発光装置。 The semiconductor light emitting device according to claim 15, wherein the conductive portion includes a columnar portion that is electrically connected to the conductive layer and penetrates the base in the first direction.
  18.  前記半導体発光素子は、VCSEL素子である、請求項1ないし17のいずれかに記載の半導体発光装置。 18. The semiconductor light emitting device according to claim 1, wherein the semiconductor light emitting device is a VCSEL device.
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US11955768B2 (en) 2020-04-07 2024-04-09 Nichia Corporation Light-emitting device

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WO2018043096A1 (en) * 2016-09-01 2018-03-08 日機装株式会社 Optical semiconductor device and optical semiconductor device production method

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Publication number Priority date Publication date Assignee Title
WO2021039199A1 (en) * 2019-08-30 2021-03-04 ソニーセミコンダクタソリューションズ株式会社 Semiconductor laser drive device, electronic apparatus, and method for manufacturing semiconductor laser drive device
US11955768B2 (en) 2020-04-07 2024-04-09 Nichia Corporation Light-emitting device

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