WO2020012723A1 - Mems element and shutter device employing same - Google Patents

Mems element and shutter device employing same Download PDF

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Publication number
WO2020012723A1
WO2020012723A1 PCT/JP2019/011811 JP2019011811W WO2020012723A1 WO 2020012723 A1 WO2020012723 A1 WO 2020012723A1 JP 2019011811 W JP2019011811 W JP 2019011811W WO 2020012723 A1 WO2020012723 A1 WO 2020012723A1
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WO
WIPO (PCT)
Prior art keywords
actuator
opening
substrate
driven member
silicon layer
Prior art date
Application number
PCT/JP2019/011811
Other languages
French (fr)
Japanese (ja)
Inventor
万里夫 木内
Original Assignee
住友精密工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住友精密工業株式会社 filed Critical 住友精密工業株式会社
Priority to JP2020529988A priority Critical patent/JP7158479B2/en
Publication of WO2020012723A1 publication Critical patent/WO2020012723A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B9/00—Exposure-making shutters; Diaphragms
    • G03B9/08—Shutters
    • G03B9/10—Blade or disc rotating or pivoting about axis normal to its plane

Definitions

  • the present invention relates to a MEMS element and a shutter device using the same.
  • a shutter device that blocks and opens a predetermined optical path has been known.
  • a displacement enlarging mechanism that is a driving unit of the shutter device described in Patent Document 1 is a so-called MEMS (Micro Electro Mechanical Systems) element that includes a shutter and an actuator that drives the shutter.
  • the displacement enlarging mechanism includes a fixed part provided on an SOI (Silicon On Insulator) substrate, first and second actuators which are thermal actuators connected to the fixed part, and a first actuator connected to the first actuator at a base end side.
  • the apparatus includes one beam, a second beam having a base end connected to the second actuator, and a driven member connected to the front ends of the first and second beams and functioning as a shutter.
  • the first and second beams have, on the distal end side, a juxtaposed portion arranged in parallel with each other, and the first actuator pushes the moving portion via the first beam, while the second actuator pushes the moving portion via the second beam.
  • a force acts on the driven member in a direction opposite to the first actuator.
  • the driven members are driven by adding the driving forces of the first and second beams respectively driven by the first and second actuators. The optical path is blocked or opened by the displacement of the driven driven member.
  • the displacement enlarging mechanism as described above is often fixed to a submount which is a support member via an adhesive in order to secure mechanical strength and the like.
  • a submount which is a support member via an adhesive in order to secure mechanical strength and the like.
  • inorganic materials such as ceramics are often used in consideration of heat dissipation and strength.
  • a thermosetting resin is used as the adhesive, and the two members are joined at a temperature not exceeding 200 ° C.
  • the submount and silicon which is the main component material of the displacement magnifying mechanism
  • the stress applied in the extending direction of the actuator works to extend or contract the entire length of the actuator.
  • the driven member functioning as a shutter may be displaced from a predetermined position via the first and second beams connected to these actuators. is there.
  • the driven member is moved to a predetermined position. It may be displaced from the position.
  • the shutter device is designed to allow such displacement of the driven member.
  • further miniaturization and improvement in performance of the shutter device have been demanded, and it is required to reduce the displacement.
  • the present invention has been made in view of the above point, and an object of the present invention is to provide a MEMS element in which rigidity of a fixed portion, particularly rigidity in an extending direction of an actuator is increased, and a shutter device using the same.
  • a MEMS element includes a substrate, a fixed portion provided on the substrate, an opening provided on the fixed portion, an actuator having both ends connected to the fixed portion, A beam whose base end is connected to the actuator and extends in parallel with the upper surface of the substrate, a driven member connected to the front end of the beam, and the opening are divided in plan view, while both ends are fixed.
  • a support portion connected to a portion and arranged in parallel with the actuator, wherein the actuator, the beam, the driven member, and the support portion are arranged in the opening in a plan view.
  • the rigidity of the fixed portion in the extending direction of the actuator can be increased by dividing the opening provided in the fixed portion and providing the support portion arranged in parallel with the actuator. Further, by increasing the rigidity of the fixing portion, the driven member is prevented from being displaced to an unintended position, and can be stably held at a predetermined position.
  • another MEMS element includes a substrate, a fixing portion provided on the substrate, an opening provided on the fixing portion, and both ends connected to the fixing portion, and the opening is a first opening.
  • a first support portion that is divided into a second opening and an actuator having both ends connected to the fixed portion in the first opening in plan view, and a base end connected to the actuator,
  • a first beam extending in parallel with the upper surface of the substrate and a driven member connected to a tip end of the first beam are arranged, and both ends of the first beam are connected to the fixed portion in plan view.
  • the first support portion is located forward in plan view. It extends in a direction intersecting the first and second beams.
  • the rigidity of the fixing portion can be increased, and the first and second covers can be provided.
  • the driving members can be prevented from being displaced to unintended positions, and can be stably held at predetermined positions.
  • a shutter device includes the MEMS element described above, a first electrode provided on an upper surface of the fixed portion, and at least electrically connected to one end of the actuator, and a first electrode provided on an upper surface of the fixed portion. And a second electrode electrically connected to at least the other end of the actuator, wherein the driven member cuts off and opens an optical path.
  • the actuator when a voltage is applied between the first electrode and the second electrode, the actuator is driven, and the driven member is displaced via the beam connected to the actuator, thereby providing a predetermined optical path. Can be opened and closed. Further, since the driven member can be stably held at a predetermined position, the opening and blocking performance of the optical path can be maintained at a high level.
  • the driven member can be stably held. Further, according to the shutter device of the present invention, the driven member can be stably held at the predetermined position, so that the opening / closing performance of the optical path functioning as a shutter can be kept high.
  • FIG. 2 is a schematic sectional view taken along line II-II in FIG. 1. It is explanatory drawing of one manufacturing process of a shutter device.
  • FIG. 3B is an explanatory view showing a continuation of the step shown in FIG. 3A.
  • FIG. 3C is an explanatory view showing a continuation of the step shown in FIG. 3B.
  • FIG. 3C is an explanatory view showing a continuation of the step shown in FIG. 3C.
  • FIG. 3D is an explanatory view showing a continuation of the step shown in FIG. 3D.
  • 9 is a plan view of a shutter device according to Modification 1.
  • FIG. 3 is a perspective view illustrating a main part of the shutter device.
  • FIG. 7 is an enlarged view of a portion surrounded by a broken line in FIG. 6.
  • FIG. 13 is a plan view of a shutter device according to a second modification. 13 is a plan view of a shutter device according to Modification Example 3.
  • FIG. It is a plane schematic diagram of the actuator concerning Embodiment 3 of the present invention.
  • FIG. 1 is a plan view of the shutter device according to the first embodiment of the present invention
  • FIG. 2 is a cross-sectional view taken along line II-II of FIG. It should be noted that the dimensions, thickness, and detailed shape of each member depicted in the drawings are different from actual ones.
  • the shutter device 500 has a rectangular overall shape in a plan view, and includes an SOI substrate 200 (hereinafter, may be simply referred to as the substrate 200), a submount 400, and It has an adhesive 300 provided between the lower surface of the fixing portion 1 provided on the substrate 200 and the upper surface of the submount 400.
  • the substrate 200 includes a first silicon layer 210 formed of single crystal silicon, an insulating layer 220 formed of SiO 2 , and a second silicon layer 230 formed of single crystal silicon, which are stacked in this order. It is configured.
  • a fixed portion 1 and an opening 2 inside the fixed portion 1 are formed in the substrate 200.
  • the fixed portion 1 forms a part of a shutter device 500 and a displacement magnifying mechanism 510 described later, and has a rectangular shutter in plan view.
  • the overall shape of the device 500 and the displacement magnifying mechanism 510 is defined.
  • the submount 400 is a support member that mechanically supports the substrate 200, and is made of, for example, ceramic or the like. Further, the submount 400 is provided with a light passage port 401 for passing light incident in the thickness direction thereof.
  • the adhesive 300 is a joining member for joining the substrate 200 and the submount 400, and is made of, for example, an epoxy-based thermosetting resin.
  • the adhesive material 300 is provided so as not to cover the light passage opening 401 and to overlap with the fixing portion 1 in a plan view so as to securely join the substrate 200 and the submount 400.
  • the adhesive 300 may be made of another material, for example, a silicone resin.
  • the shutter device 500 is a so-called MEMS shutter
  • the displacement enlarging mechanism 510 which is a driving unit of the shutter, is a MEMS element obtained by processing the substrate 200 using micromachining technology that applies semiconductor fine processing technology.
  • the shutter device 500 further includes an actuator 3 having both ends connected to the fixed portion 1 and a beam 5 having a base end connected to the actuator 3 and extending parallel to the upper surface of the substrate 200.
  • the shutter device 500 includes an actuator 4 provided separately from the actuator 3 (hereinafter, may be referred to as another actuator 4), and a base end side connected to the actuator 4 so as to be parallel to the upper surface of the substrate 200.
  • the shutter device 500 includes a connecting member 8 that connects the beam 5 and the beam 6, and a supporting portion that is connected in parallel to the actuators 3 and 4 with both ends connected to the fixed portion 1 and divides the opening 2 in a plan view. 9 and a first electrode 101 and a second electrode 102 disposed on the upper surface of the fixing portion 1.
  • the actuators 3, 4, the beams 5, 6, the driven member 7, the connecting member 8, and the support 9 are arranged in the opening 2 in plan view.
  • the substrate 200 and the above-described structure provided on the substrate 200 may be further referred to as a displacement enlarging mechanism 510 including the submount 400 and the adhesive 300.
  • the longitudinal direction of the beam 5 is defined as the X direction
  • the longitudinal directions of the actuators 3 and 4 are defined as the Y direction
  • the thickness direction of the shutter device 500 that is, the thickness direction of the substrate 200 and the submount 400 is defined as the Z direction.
  • the left side in FIG. 1 may be simply called the left side
  • the right side in FIG. 1 may be simply called the right side
  • the upper side in FIG. 1 may be simply referred to as the upper side
  • the lower side in FIG. 1 may be simply referred to as the lower side
  • the upper side in FIG. 2 may be called an upper surface
  • the lower side in FIG. 2 may be called a lower surface.
  • the fixed part 1, the actuators 3, 4, the beams 5, 6, the driven member 7, the connecting member 8, and the support part 9 are integrally formed of a silicon material.
  • the first base member 1a and the second base member 1b constituting the fixing portion 1 have a laminated structure of the first silicon layer 210, the insulating layer 220, and the second silicon layer 230 except for the peripheral portion, and the opening 2
  • the actuators 3 and 4 the beams 5 and 6, which are movable members, the insulating layer 220 and the second silicon layer 230 on the lower surfaces of the driven members 7 and the connecting members 8 are removed in a manufacturing process described later. Therefore, only the first silicon layer 210 remains in the actuators 3 and 4, the beams 5 and 6, the driven member 7, and the connecting member 8.
  • the support portion 9 only the second silicon layer 230 is left, and the insulating layer 220 and the first silicon layer 210 on the upper surface are removed in the same manufacturing process.
  • the fixing portion 1 is a rectangular member in a plan view having a first base member 1a and a second base member 1b arranged to face each other in the Y direction.
  • the first base member 1a and the second base member 1b are separated in the Y direction in the first silicon layer 210, as described above, they are connected to one in the insulating layer 220 and the second silicon layer 230.
  • the relative positions of the first base member 1a and the second base member 1b are fixed. Therefore, the first base member 1a and the second base member 1b can support movable members such as the actuators 3, 4, the beams 5, 6, and the driven member 7.
  • the fixed portion 1 functions as a frame that supports the movable member by being shaped so as to occupy as large an area as possible while securing the movable range of the movable member.
  • the actuator 3 is a rod-shaped drive beam extending in the Y direction.
  • the upper end 3a is provided on the first silicon layer 210 of the first base member 1a, and the lower end 3c is provided on the first silicon layer 210 of the second base member 1b. Connected to each other.
  • the intermediate portion 3b of the actuator 3 is connected to the beam 5.
  • the initial shape of the actuator 3 is slightly bent such that the intermediate portion 3 b projects to the left in the X direction, which is the driving direction, or is entirely in the X direction. It is slightly curved to bulge to the left.
  • the actuator 4 is a rod-shaped drive beam extending in the Y direction.
  • the upper end 4a is provided on the first silicon layer 210 of the first base member 1a
  • the lower end 4c is provided on the first silicon layer 210 of the second base member 1b.
  • an intermediate portion 4 b of the actuator 4 is connected to the beam 6.
  • the initial shape of the actuator 4 is slightly bent such that the intermediate portion 4 b projects rightward in the X direction, which is the driving direction, or is entirely in the X direction. It is slightly curved to bulge to the right.
  • the actuators 3 and 4 are thermal actuators that generate heat when a current flows and thermally expand in the Y direction, which is their respective extending directions. Further, as described above, since the actuators 3 and 4 are bent or curved along the X direction which is the driving direction, the actuators 3 and 4 are bent or bent to the opposite side to the driving direction during thermal expansion due to heating. Does not bend. Therefore, the actuators 3 and 4 can be reliably bent or curved in a desired driving direction.
  • the actuator 3 is disposed on the left side in the X direction in the shutter device 500, and the actuator 4 is disposed on the right side in the X direction, and the actuator 3 and the actuator 4 face each other in plan view.
  • the beam 5 is a rod-shaped member extending in the X direction.
  • the first end 5 a of the beam 5 is connected to the intermediate part 3 b of the actuator 3.
  • the second end 5 b of the beam 5 is connected to the driven member 7.
  • the first end 5a of the beam 5 may be referred to as the base end of the beam 5, and the second end 5b of the beam 5 may be referred to as the distal end of the beam 5.
  • the beam 6 is a member having a folded structure.
  • the first member 6a extends from the intermediate portion 4b of the actuator 4 to the vicinity of the intermediate portion 3a of the actuator 3, and the beam 6 extends from the third end 6e of the first member 6a toward the actuator 4.
  • the second member 6b folded back.
  • the first end 6c of the first member 6a is connected to the intermediate part 4b of the actuator 4.
  • the fourth end 6f of the second member 6b is connected to the driven member 7.
  • the first end 6c of the first member 6a may be referred to as the base end of the beam 6
  • the fourth end 6f of the second member 6b may be referred to as the end of the beam 6.
  • the second member 6b is a rod-shaped member extending to the right in the X direction from the third end 6e of the first member 6a and having substantially the same width as the beam 5.
  • the second member 6b is arranged in parallel in the Y direction, which is a direction intersecting with the beam 5, with a distance from the beam 5.
  • “the beam 5 and the second member 6b of the beam 6 are arranged in parallel (in parallel)” means that the beam 5 and the second member 6b of the beam 6 maintain a substantially parallel relationship. It is that it is arranged.
  • a portion where the beam 5 and the second member 6b of the beam 6 are arranged in parallel with each other may be referred to as a parallel arrangement portion 600.
  • the beam 5 and the second member 6b of the beam 6 are connected to the driven member 7 from the same direction in parallel.
  • the beam 5 and the second member 6b of the beam 6 are arranged in parallel at the connection portion between the beam 5 and the beam 6 and the driven member 7 by bending the distal end side of the beam 5.
  • the beam 5 and the second member 6b of the beam 6 are connected in parallel at the connection portion between the beam 5 and the driven member 7. Placed in The beam 5 pulls the driven member 7 from the second end 5b in the direction in which the beam 5 extends, while the beam 6 is driven by pushing the driven member 7 in the direction in which the beam 6 extends from the fourth end 6f.
  • the member 7 is driven. As described later, the second members 6b of the beams 5 and 6 are driven by the actuators 3 and 4, respectively, and elastically deform to move the driven member 7 to another position on the XY plane. Conversely, the beam 5 may push the driven member 7 while the beam 6 pulls the driven member 7.
  • the first member 6 a is a member partially having, for example, a semi-arc shape that bypasses the driven member 7.
  • the first member 6a extends leftward in the X direction from the first end 6c, is folded downward at the second end 6d in the Y direction, and is connected to the second member 6b.
  • the first member 6a has a high-rigidity region at least in part so as to have higher rigidity than the second member 6b, and is formed, for example, wide. As will be described later, even when the beam 6 is driven by the actuator 4, the first member 6a is hardly elastically deformed and retains its shape to transmit the driving force of the actuator 4 to the second member 6b.
  • a part of the first member 6a may be made thicker than the second member 6b, or a metal film may be formed on a part of the first member 6a.
  • the first member 6a has a lightening structure 6g. By forming the lightening structure 6g, the effect of reducing the mass of the beam 6 and increasing the resonance frequency can be obtained. Further, by providing the lightening structure 6g in the first member 6a, the surface area of the beam 6 increases. Accordingly, heat radiation from the beam 6 is promoted, and heat transmitted from the actuator 4 which is a thermal actuator to the driven member 7 can be reduced.
  • the driven member 7 is a substantially circular member connected to the second end 5 b of the beam 5 and the fourth end 6 f of the beam 6, in other words, to the distal end side of the parallel arrangement portion 600.
  • the beams 5 and 6 move in a direction parallel to the upper surface (XY plane) of the substrate 200.
  • a metal film 7a for example, an Au / Ti film is formed on the entire surface of the driven member 7.
  • the driven member 7 functions as a shutter that blocks and opens an optical path of incident light (not shown). Therefore, the driven member 7 is formed in a planar shape slightly larger than the cross section of the optical path.
  • the driven member 7 when the driven member 7 is driven by the actuators 3 and 4, the driven member 7 is displaced so as to cover all or a part of the light passage opening 401 provided in the submount 400 in plan view.
  • the planar shape of the driven member 7 is preferably equal to or larger than the planar shape of the light passage opening 401. .
  • the connecting member 8 is a hairpin-shaped member that connects the beam 5 and the beam 6 to each other.
  • the connecting member 8 extends upward in the Y direction from one end, which is a connecting portion with the beam 5, and is folded back. It is connected to one member 6a, specifically, the second end 6d of the first member 6a.
  • the actuators 3 and 4 are thermal actuators
  • the heat transmitted to the beams 5 and 6 from the actuators 3 and 4 is also radiated by the connecting member 8, so that the heat to the driven member 7 is Transmission can be prevented.
  • the driving amount of the first end 6c of the beam 6 by the actuator 4 is not greatly reduced.
  • the extending direction of the connecting member 8 may not be a direction substantially perpendicular to the beams 5 and 6, and may be a direction intersecting the beams 5 and 6, but when the actuators 3 and 4 are driven.
  • the support portion 9 is a member made of the second silicon layer 230.
  • the upper end in the Y direction is formed on the second silicon layer 230 of the first base member 1a, and the lower end is formed on the second silicon layer 230 of the second base member 1b.
  • Each is connected.
  • the support portion 9 is arranged in parallel with the actuators 3 and 4, and is arranged so as to divide the opening 2 in the X direction in plan view. Further, the support portions 9 are arranged at predetermined intervals below the beams 5 and 6 formed of the first silicon layer 210 in the Z direction, in this case, at intervals corresponding to the thickness of the insulating layer 220. ing.
  • the first electrode 101 is a metal film formed on the upper surface of the first base member 1a
  • the second electrode 102 is a metal film formed on the upper surface of the second base member 1b.
  • an Au / Ti film is used as the metal film.
  • the shutter device 500 is driven by applying a voltage between the first electrode 101 and the second electrode 102.
  • a voltage is applied between the first electrode 101 and the second electrode 102, a current flows to the actuator 3 and the actuator 4 through the first base member 1a and the second base member 1b.
  • Joule heat is generated in the actuators 3 and 4 made of the silicon material, and the actuators 3 and 4 are instantaneously heated to 400 to 500 ° C.
  • the actuator 3 thermally expands by being heated so that the entire length is extended. Since the positions of the upper end portion 3a and the lower end portion 3c of the actuator 3 are fixed by the fixing portion 1, the intermediate portion 3b is pushed to the left in the X direction, which is the direction in which the intermediate portion 3b protrudes in advance.
  • the actuator 4 also thermally expands by being heated so that the entire length is extended. Since the positions of the upper end portion 4a and the lower end portion 4c of the actuator 4 are fixed by the fixing portion 1, the intermediate portion 4b is pushed out to the right in the X direction, which is the direction in which the intermediate portion 4b protrudes in advance.
  • the beam 5 connected to the intermediate portion 3b is pulled to the left in the X direction as a whole.
  • the intermediate portion 4b of the actuator 4 is pushed rightward in the X direction, the beam 6 connected thereto is pulled entirely rightward in the X direction. That is, the relative positions of the first end 5a of the beam 5 and the first end 6c of the beam 6 change in directions away from each other.
  • the first member 6a of the beam 6 hardly elastically deforms, so most of the pulling force by the beam 6 is concentrated on the third end 6e and the second member 6b To the right to push right in the X direction.
  • the second member 6b of the beam 5 and the beam 6 arranged in parallel the beam 5 is pulled to the left in the X direction, and the second member 6b of the beam 6 is pushed to the right in the X direction.
  • the second end 5b and the fourth end 6f of the beam 6 are driven obliquely downward to the left on the XY plane, and the second members 6b of the beam 5 and the beam 6 are largely bent or bent with different curvatures.
  • the fourth end 6f pushes the driven member 7 while the second end 5b of the beam 5 pulls the driven member 7, so that the driven member 7 can pass through the light provided on the submount 400 in plan view. It is pushed out to a position overlapping the mouth 401.
  • the beam 5 connected to the intermediate portion 3b is pulled back to the right in the X direction as a whole.
  • the beam 6 connected thereto is pulled back to the left in the X direction as a whole. That is, the relative position of the first end 5a of the beam 5 and the first end 6c of the beam 6 change in a direction approaching each other.
  • the first member 6a of the beam 6 is hardly elastically deformed, so that most of the drawing force by the beam 6 is concentrated on the third end 6e and the second member 6b In the X direction to the left.
  • the beam 5 is pushed rightward in the X direction, and the second member 6b of the beam 6 is pulled leftward in the X direction.
  • the second end 5b and the fourth end 6f of the beam 6 are pushed back obliquely rightward on the XY plane, and the curved or bent second member 6b of the beam 5 and the beam 6 returns to the original substantially linear shape,
  • the driven member 7 returns to the position on the XY plane shown in FIG.
  • the beam 5 may push the driven member 7 while the beam 6 pulls the driven member 7 by reversing the bending or bending directions of the actuator 3 and the actuator 4.
  • the driven member 7 functions as a shutter that blocks and opens an optical path (not shown).
  • an optical path (not shown) is opened in a state where the driven member 7 is not driven by the actuators 3 and 4, and the optical path is blocked at the driven position. May block an unillustrated optical path at a position not driven by the actuator 3 and the actuator 4 and open the optical path at a driven position. In that case, it goes without saying that the position of the light passage opening 401 provided in the submount 400 is changed.
  • the shutter is a concept including an optical attenuator that blocks and opens a part of the optical path in addition to blocking and opening the optical path.
  • 3A to 3E show a manufacturing process of the shutter device according to the present embodiment. 3A to 3E correspond to the cross-sectional views shown in FIG.
  • an SOI substrate 200 including a first silicon layer 210, an insulating layer 220, and a second silicon layer 230 is prepared.
  • the thickness of the first silicon layer 210 is 30 ⁇ m
  • the thickness of the insulating layer 220 is 1 ⁇ m
  • the thickness of the second silicon layer 230 is 250 ⁇ m.
  • the first silicon layer 210 is subjected to an etching process, and the original shape of the fixed portion 1, the actuators 3 and 4, the beams 5 and 6, the driven member 7, and the connecting member are formed on the first silicon layer 210. 8 are integrally formed.
  • the lightening structure 6g provided on the first member 6a of the beam 6 is formed simultaneously with the etching of the first silicon layer 210.
  • a laser scribe method is used when the plurality of displacement magnifying mechanisms 510 formed on the SOI substrate 200 are singulated into chips. In this method, the energy of the irradiated laser light needs to be absorbed by single crystal silicon.
  • the first silicon layer 210 in the divided region of the chip is also removed at this stage.
  • the method of singulation is not particularly limited. For example, dicing may be performed, or singulation may be performed by etching in the steps shown in FIGS. 3A to 3D.
  • the first electrode 101 is formed on the surface of the first base member 1a
  • the second electrode 102 is formed on the surface of the second base member 1b
  • the metal film 7a is formed on the surface of the driven member 7.
  • the first and second electrodes 101 and 102 and the metal film 7a are, for example, Au / Ti films made of 20 nm thick Ti and 300 nm thick Au.
  • the dummy device 800 is attached to the first silicon layer 210 with the wax 700 as shown in FIG. , That is, the insulating layer 220 and the second silicon layer 230 are etched.
  • a mask (not shown) is formed at a predetermined position on the back surface of the second silicon layer 230 in order to leave a portion corresponding to the support portion 9.
  • the SOI substrate 200 is left on the fixed portion 1, and the first silicon layer is formed on the other movable members such as the actuator 3, the actuator 4, the beam 5, the beam 6, the driven member 7 and the connecting member 8 Only 210 is left. Further, only the second silicon layer 230 is left on the support portion 9.
  • a portion of the insulating layer 220 corresponding to the support portion 9 may be removed using a mask (not shown).
  • the wax 700 and the dummy wafer 800 are removed.
  • the chip on which the displacement enlarging mechanism 510 is formed is singulated.
  • the chip on which the displacement enlarging mechanism 510 is formed is placed on the submount 400 on which the adhesive 300 is placed at a predetermined position, and the submount 400 is placed via the adhesive 300. And the chip.
  • the adhesive 300 is disposed on the submount 400 so as to be located below the fixing unit 1 in the Z direction. Further, the adhesive 300 is brought into contact with the back surface of the chip by applying a predetermined load, and the adhesive 300 is heated at a predetermined temperature, for example, 120 ° C. to 180 ° C. if the adhesive 300 is an epoxy-based thermosetting resin. The submount 400 and the chip are joined by thermosetting. Thus, the shutter device 500 is completed.
  • the displacement enlarging mechanism 510 which is the MEMS element according to the present embodiment, includes the substrate 200, the fixed portion 1 provided on the substrate 200, the opening 2 provided on the fixed portion 1, and both ends fixed. It has an actuator 3 connected to the unit 1 and another actuator 4 connected at both ends to the fixed unit 1 and separated from the actuator 3.
  • the displacement magnifying mechanism 510 includes a beam 5 whose base end is connected to the actuator 3 and extends in parallel with the upper surface of the substrate 200, and a beam 5 whose base end is connected to another actuator 4 and extends in parallel with the upper surface of the substrate. And a driven member 7 connected to the distal end side of the beam 5 and the other beam 6.
  • the displacement magnifying mechanism 510 has a support portion 9 which divides the opening 2 in a plan view and has both ends connected to the fixed portion 1 and arranged in parallel with the actuators 3 and 4.
  • the beams 5, 6, the driven member 7, and the support portion 9 are arranged in the opening 2 in plan view.
  • the rigidity of the fixed portion 1 in which the opening 2 is formed particularly, the rigidity in the Y direction, which is the direction in which the actuators 3 and 4 extend, can be increased.
  • the driven member 7 can be prevented from being displaced to an unintended position, and the performance of the shutter device 500 is prevented from deteriorating in opening and blocking the optical path of incident light. it can. This will be further described.
  • the actuators 3 and 4 when a predetermined stress or more is applied to the fixed portion 1 of the displacement enlarging mechanism 510 in the extending direction of the actuators 3 and 4 in this case, in the Y direction, the actuators 3 and 4 have their full lengths. Deform so as to expand or contract.
  • both ends of the actuators 3 and 4 when the opening 2 is provided in the fixed portion 1 and both ends of the actuators 3 and 4 are respectively connected to the inner peripheral edge of the opening 2, both ends which are connection portions with the fixed portion 1 Since there is no structure for mechanically supporting the actuators 3 and 4 except for the portions, the actuators 3 and 4 can easily expand or contract when a predetermined stress or more in the Y direction is applied to the fixed portion 1.
  • a phenomenon in which a stress in the Y direction is applied to the fixing portion 1 can occur, for example, when the substrate 200 and the submount 400 having different thermal expansion coefficients are joined by heat treatment. Further, even if the single-crystal silicon, which is a main constituent material of the substrate 200, and the submount 400 have substantially the same thermal expansion coefficient, if the single-crystal silicon and the adhesive 300 have significantly different thermal expansion coefficients, the submount 400 may be fixed. There may be a case where a predetermined stress or more is applied to the portion 1 in the Y direction. Further, the present invention is not limited to these, and as described above, a stress greater than or equal to a predetermined value may be applied to the fixing portion 1 in the Y direction even temporarily due to an external impact.
  • the actuators 3 and 4 are thermal actuators that generate heat when a current flows and thermally expand in the Y direction, which is the extending direction, the change in their overall lengths is caused by the actuators 3 and 4 being driven by a predetermined amount, respectively. It has the same meaning as what was done. That is, the displacement of the actuators 3 and 4 is enlarged by the movement of the beams 5 and 6, and the driven member 7 connected to the distal ends of the beams 5 and 6 is displaced from a predetermined position.
  • the displacement magnifying mechanism 510 shown in the present embodiment has the parallel arrangement portion 600 in which the beams 5 and 6 connected to the actuators 3 and 4, respectively, are arranged in the opposite directions by the beams 5 and 6 from the same side in the X direction.
  • the driven member 7 connected to the distal end side of the parallel arrangement portion 600 is displaced.
  • the displacement of the driven member 7 is increased even when the fixed portion 1 to which the actuators 3 and 4 are connected is slightly deformed in the extending direction of the actuators 3 and 4 due to stress or the like. Will be done.
  • the opening 2 is divided in a plan view, and the supporting portions 9 having both ends connected to the fixing portion 1 are arranged in parallel with the actuators 3 and 4, so that the fixing portion 1 is stressed. An attempt to deform in the Y direction can be suppressed. This prevents the lengths of the actuators 3 and 4 from unintentionally changing, and allows the driven member 7 to be stably held at a predetermined position.
  • the support portion 9 is arranged so as to divide the opening 2 substantially at the center in the X direction.
  • the portion extending in the X direction of the first base member 1a and the second base member 1b of the fixing portion 1 is viewed as a kind of beam, the beam whose both ends are fixed is most greatly deformed in the central portion. Therefore, by disposing the support portion 9 at a position corresponding to this portion, that is, a position passing substantially in the center of the opening 2 in the X direction, the deformation of the fixed portion 1 due to stress is effectively suppressed. be able to.
  • the arrangement of the support portion 9 in the opening 2 is not particularly limited thereto, and may be arranged on the side closer to the actuator 3 or on the side closer to the actuator 4. It is sufficient that the support portion 9 is disposed at a position where the rigidity of the fixed portion 1 in the Y direction can be increased.
  • the support 9 is provided below the beams 5 and 6 in the Z direction at a predetermined interval from the beams 5 and 6. Thus, even when the beams 5 and 6 are driven by the actuators 3 and 4, respectively, the movement of the beams 5 and 6 is not hindered. Therefore, the driven member 7 can be displaced by a desired amount.
  • the substrate 200 constituting the displacement magnifying mechanism 510 has a first silicon layer 210, an insulating layer 220, and a second silicon layer 230 laminated in this order, and the beams 5, 6 and the actuators 3, 4
  • the supporting portion 9 is constituted by the second silicon layer 230 while being constituted by the silicon layer 210.
  • the supporting portions 9 can be easily arranged at a predetermined interval below the beams 5 and 6 in the Z direction.
  • the displacement magnifying mechanism 510 of the present embodiment is provided between the lower surface of the fixed part 1 and the upper surface of the submount 400, and a submount 400 which is a support member for supporting the substrate 200.
  • the bonding material 400 may further include an adhesive 300 that is a bonding member that bonds the bonding material 400 to the bonding material 400.
  • the shutter device 500 is provided on the upper surface of the first base member 1a of the fixed portion 1 and the displacement enlargement mechanism (MEMS element) 510, and the upper end portions 3a and 4a of the actuators 3 and 4.
  • the first electrode 101 is electrically connected to each of the first and second base members 1b of the fixed part 1, and is electrically connected to the lower ends 3c and 4c of the actuators 3 and 4, respectively.
  • the second electrode 102, and the driven member 7 blocks and opens the optical path.
  • the actuators 3 and 4 are driven, respectively, and the beam connected to the actuators 3 and 4
  • the displacement amount of the driven member 7 can be increased, and a predetermined optical path can be reliably opened and blocked.
  • the driven member 7 can be stably held at a predetermined position, the opening and blocking performance of the optical path of the incident light can be maintained high.
  • VOA variable optical attenuator
  • FIG. 4 is a plan view of the shutter device according to the present modification.
  • the same parts as those in the first embodiment are denoted by the same reference numerals, and detailed description is omitted.
  • the configuration according to the present modification illustrated in FIG. 4 and the configuration according to the first embodiment differ in that the number of actuators arranged in the opening 2 and the base end of the beam 5 are connected to the first base member 1a. different.
  • the actuator 3 may be omitted. Also in this case, the beam 6 driven by the actuator 4 pushes the driven member 7, and the beam 5 receiving the driving force from the actuator 4 via the connecting member 8 pulls the driven member 7, thereby driving the driven member 7. The member 7 is pushed out to a position overlapping with the light passage opening 401 provided in the submount 400 in plan view.
  • the rigidity of the fixed portion 1 in the Y direction is increased by the support portion 9 to prevent the entire length of the actuator 4 from being unintentionally changed, and to stably hold the driven member 7 at a predetermined position. be able to.
  • the first end 5a of the beam 5 may be connected to the second base member 1b instead of the first base member 1a.
  • the actuator 4 may be omitted in place of the actuator 3.
  • the driven member 7 can be stably held at a predetermined position by preventing the overall length of the actuator 3 from being changed unintentionally.
  • the first end 6c of the beam 6 is connected to the first base member 1a or the second base member 1b.
  • the beam 6 is not directly connected to the member that generates heat, and heat radiation does not need to be considered so much. Therefore, the lightening structure 6g in the first member 6a may not be formed.
  • the adhesive 300 is not provided between the lower surface of the second base member 1b and the submount 400. However, as shown in FIG. 1, the adhesive 300 may be provided at the corresponding location.
  • FIG. 5 is a plan view of the shutter device according to the present embodiment
  • FIG. 6 is a perspective view of a main part of the shutter device
  • FIG. 7 is an enlarged view of a portion surrounded by a broken line in FIG. .
  • the same parts as those in the first embodiment are denoted by the same reference numerals, and detailed description is omitted.
  • the opening 20 provided in the fixing portion 10 is divided into the first opening 21 and the second opening 22 by the first support portion 161.
  • the first to fourth actuators 30, 90, 40, 110, the first to fourth beams 50, 120, 60, 130, and the first and second driven members 70, 140 are respectively the first and second driven members 70, 140 shown in FIG. It is composed of a silicon layer 210.
  • a metal film corresponding to the metal film 7a shown in FIG. 2 is formed on the entire upper surface of the first driven member 70 and the entire upper surface of the second driven member 140.
  • the first driven member 70 may be referred to as a driven member 70.
  • the fixing portion 10 has a first base member 11 and a second base member 12, and a third base member 13 arranged to face these in the Y direction.
  • the first to third base members 11 to 13 are similar to the first base member 1a and the second base member 1b described in the first embodiment except for the peripheral portion, except for the second silicon layer 230, the insulating layer 220, and the first silicon member.
  • the layers 210 are stacked in this order. Note that the first base member 11 and the second base member 12 are separated in the X direction in the first silicon layer 210, but are connected together in the insulating layer 220 and the second silicon layer 230.
  • the first base member 11 and the third base member 13, and the second base member 12 and the third base member 230 are separated in the Y direction in the first silicon layer 210, but are separated in the insulating layer 220 and the second silicon layer. In 230, they are connected to one. Therefore, the relative positions of the first to third base members 11 to 13 are fixed, and the first to third base members 11 to 13 can support the movable member in the displacement enlarging mechanism 520.
  • the fixed portion 10 functions as a frame that supports the movable member by being shaped so as to occupy as large an area as possible while securing the movable range of the movable member.
  • the first silicon layer 210 of the first base member 11 is in the X direction with the first silicon layer 210 of the second base member 12 and in the Y direction with the first silicon layer 210 of the third base member 230.
  • the third electrode 173 is electrically insulated and separated from each other.
  • the first support portion 161 has one end connected to the boundary between the first base member 11 and the second base member 12 and the other end connected to the third base member 13, and forms the opening 20 with the first opening 21 and the second opening 21. 22.
  • the first supporting portion 161 is a member extending in the Y direction, and most of the member has the same structure as the substrate 200, that is, a laminated structure of the second silicon layer 230, the insulating layer 220, and the first silicon layer 210. However, as shown in FIGS. 6 and 7, at the upper end in the Y direction connected to the boundary between the first base member 11 and the second base member 12, the first silicon layer 210 is removed, and the insulating layer 220 is removed. And a second silicon layer 230.
  • the first support portion 161 is physically separated from the first silicon layer 210 of the first base member 11 and the first silicon layer 210 of the second base member 12.
  • the first support portion 161 is electrically insulated from the first electrode 171 provided on the upper surface of the first base member 11.
  • the first support 161 is electrically insulated from the second electrode 172 provided on the upper surface of the second base member 12.
  • the first support portion 161 and the first actuator 30 (hereinafter, referred to as the actuator 30) so as not to hinder the displacement of their intermediate portions.
  • the distance between the first support portion 161 and the second actuator 90 in the X direction needs to be set appropriately.
  • the distance between the first support 161 and the first actuator 30 in the X direction and the distance between the first support 161 and the second actuator 90 in the X direction are the same. May be different from each other.
  • the second difference is that a set of actuators, a set of beams, and a driven member are arranged in the first opening 21 and the second opening 22, respectively.
  • the first actuator 30 whose both ends are connected to the fixed portion 10, and the base end side is connected to the intermediate portion of the first actuator 30, and extends to the left in the X direction and extends downward in the Y direction.
  • a first beam 50 having a folded first member 51 and a second member 52 extending rightward in the X direction from the left end in the X direction of the first member 51 is disposed.
  • both ends are connected to the fixed portion 10, and a third actuator 40 provided opposite to the first actuator with the first beam 50 interposed therebetween is provided with a base end side.
  • the third actuator 40 It is connected to an intermediate portion of the third actuator 40, is spaced apart from the second member 52 of the first beam 50 in the Y direction, and is arranged in parallel with the second member 52, while extending in parallel with the upper surface of the substrate 200.
  • the third beam 60 is disposed. Further, in the first opening 21, a first driven member 70 connected to the distal ends of the first beam 50 and the third beam 60, and a first connection that connects the first beam 50 and the third beam 60.
  • a member 80 is arranged. Further, the submount 400 is provided with a first light passage opening 401 communicating with the first opening 21.
  • the various members arranged in the first opening 21 respectively correspond to the members arranged in the opening 2 of the shutter device 500 shown in FIG.
  • the first actuator 30 corresponds to the actuator 4
  • the third actuator 40 corresponds to the actuator 3.
  • the first beam 50 corresponds to the beam 6
  • the third beam 60 corresponds to the beam 5
  • the first driven member 70 corresponds to the driven member 7
  • the first connecting member 80 corresponds to the connecting member 8, respectively.
  • the functions of each member are the same between the members in the corresponding relationship. Therefore, when a voltage is applied between the first electrode 171 and the third electrode 173, a current flows through each of the first and third actuators 30, 40, and the intermediate portion of the first actuator 30 is pushed rightward in the X direction.
  • the intermediate portion of the third actuator 40 is pushed to the left in the X direction.
  • the first beam 50 pushes the first driven member 70 rightward in the X direction
  • the third beam 60 drives the first driven member 70 to pull leftward in the X direction.
  • the first driven member 70 is displaced obliquely to the lower left, and is pushed out to a position overlapping the first light passage opening 401 provided in the submount 400 in plan view.
  • members corresponding to the various members arranged in the first opening 21 are arranged symmetrically with respect to the first support portion 161.
  • the second actuator 90 is disposed symmetrically with the first actuator 30 with respect to the first support 161.
  • the fourth actuator 110 is line-symmetric with the third actuator 40
  • the second beam 120 is line-symmetric with the first beam 50
  • the fourth beam 130 are arranged in line symmetry with the third beam 60, respectively.
  • the second driven member 140 is disposed symmetrically with the first driven member 70 and the second connecting member 150 is disposed symmetrically with the first connecting member 80 with respect to the first support portion 161.
  • a second light passage 402 is provided on the submount 400 in line symmetry with the first light passage 401 with respect to the first support 161.
  • the first driven member 70 and the second driven member 140 are arranged at the same predetermined intervals in the X direction with respect to the first support 161.
  • the first driven member 70 and the second driven member 140 are arranged with the first support portion 161 interposed therebetween and close to the first support portion 161.
  • the distance between the first support portion 161 and the first driven member 70 in the X direction and the distance between the first support portion 161 and the second driven member 140 in the X direction are the same. , These intervals may be different from each other.
  • the distance between the center of the first light passage 401 and the center of the second light passage 402 in the X direction is set to about several hundred ⁇ m to 1 mm, and the first light passage 401 and the second light passage
  • the diameter of each of 402 is set to about several hundred ⁇ m, for example, about 250 ⁇ m.
  • each member is the same between members that are disposed in line symmetry with respect to the first support portion 161.
  • the driving and displacement directions of each member are reversed with respect to the first support 161. Therefore, when a voltage is applied between the second electrode 172 and the third electrode 173, a current flows through the second and fourth actuators 90 and 110, respectively, and the intermediate portion of the second actuator 90 is pushed to the left in the X direction. As a result, the intermediate portion of the fourth actuator 110 is pushed rightward in the X direction.
  • the second beam 120 pushes the second driven member 140 to the left in the X direction, and the fourth beam 130 drives the second driven member 140 to pull to the right in the X direction.
  • the second driven member 140 is displaced obliquely to the lower right, and is pushed out to a position overlapping with the second light passage opening 402 provided in the submount 400 in plan view.
  • the displacement magnifying mechanism 520 which is the MEMS element according to the present embodiment, includes the substrate 200, the fixing portion 10 provided on the substrate 200, and both ends connected to the fixing portion 10, and the opening 20 is formed in the first position. It has a first support portion 161 divided into an opening 21 and a second opening.
  • a first actuator 30 (actuator 30) having both ends connected to the fixed portion 10 and a second end connected to the fixed portion 10 and provided separately from the first actuator 30 in the first opening 21 in plan view.
  • three actuators 40 are actuators.
  • the base end is connected to the first actuator 30, the first beam 50 extending parallel to the upper surface of the substrate 200, and the base end is connected to the third actuator 40, A third beam 60 extending in parallel with the upper surface of the substrate 200, and a first driven member 70 (driven member 70) connected to the first beam 50 and the distal end side of the third beam 60 are arranged. I have.
  • a second actuator 90 having both ends connected to the fixed portion 10 and a fourth actuator having both ends connected to the fixed portion 10 and provided separately from the second actuator 90 in the second opening 22 in plan view. 110 and are arranged. Further, in the second opening 22 in plan view, the base end side is connected to the second actuator 90, the second beam 120 extending parallel to the upper surface of the substrate 200, and the base end side is connected to the fourth actuator 110, A fourth beam 130 extending parallel to the upper surface of the substrate 200, and a second beam 120 and a second driven member 140 connected to the tip end of the fourth beam 130 are arranged. Further, the second and fourth actuators 90 and 110, the second and fourth beams 120 and 130, and the second driven member 140 are arranged in the second opening 22 in plan view.
  • the first support 161 extends in the Y direction that intersects the first beam 50 and the second beam 120 in plan view.
  • the rigidity of the fixed portion 10, particularly, the first support portion 161 that divides the opening 20 into the first opening 21 and the second opening 22 in plan view is provided.
  • the rigidity in the Y direction which is the direction in which the first to fourth actuators 30, 90, 40, 110 extend, can be increased.
  • the first and second driven members 70 and 140 can be prevented from being displaced to unintended positions, respectively, and the incident light can be prevented.
  • opening and closing of the optical path it is possible to suppress a decrease in performance of the shutter device 500.
  • the substrate 200 has a laminated structure in which a first silicon layer 210, an insulating layer 220, and a second silicon layer 230 are laminated in this order, as in the first embodiment, and the first to fourth beams are formed.
  • 50, 120, 60, 130 and the first to fourth actuators 30, 90, 40, 110 are each formed of a first silicon layer 210.
  • the first support portion 161 is connected to the fixed portion 10 at one end, specifically, except for the upper end in the Y direction connected to the boundary between the first base member 11 and the second base member 12, It has the same laminated structure as the substrate 200.
  • the first silicon layer 210 is removed from the upper end in the Y direction of the first support portion 161, and the second silicon layer 230 and the insulating layer 220 are stacked.
  • the first support portion 161 since most of the first support portion 161 has the same laminated structure as the substrate 200, for example, the first support portion 161 has a stronger structure than the support portion 9 shown in the first embodiment, and the fixing portion 10 in the Y direction The rigidity can be increased. Further, since the first silicon layer 210 is removed at the upper end in the Y direction of the first support 161, the first support 161 is electrically connected to the first to third electrodes 171 to 173 as described above. Insulated. Therefore, there is no possibility that an unintended short circuit occurs between the first to third electrodes 171 to 173 via the first support portion 161.
  • the first to fourth actuators 30, 90, 40, and 110 are thermal actuators that generate heat when a current flows and thermally expand in the Y direction, which is the extending direction.
  • the first actuator 30 and the second actuator 90 are arranged at a predetermined distance from the first support portion 161 in the X direction.
  • the first actuator 30 is disposed closer to the first support 161 than the first driven member 70
  • the second actuator 90 is disposed closer to the first support 161 than the second driven member 140. ing.
  • thermal crosstalk generated between the first actuator 30 and the second actuator 90 is provided. Can be suppressed.
  • one of the first actuator 30 and the second actuator 90 is in a driving state, while the other is in a non-driving state.
  • the intermediate portion bends or curves so as to approach the second actuator 90, which is the other actuator.
  • the respective temperatures reach several hundred degrees Celsius.
  • the first actuator 30 heated to a high temperature as described above approaches the second actuator 90 more than a predetermined distance
  • the heat generation propagates to the second actuator 90, and the second actuator 90 is deformed so as to extend the entire length. Resulting in.
  • This corresponds to the above-mentioned thermal crosstalk. Due to this thermal crosstalk, the second driven member 140 is displaced to an unintended position, and unintended light leaks from the second light passage opening 402 or a part of light to be passed is blocked. Or
  • the first actuator 30 and the second actuator 90 close to the first support 161
  • the above-described thermal crosstalk is suppressed, and the first and second driven members are driven.
  • the members 70 and 140 can be prevented from being displaced to unintended positions, and the performance of the shutter device 500 can be prevented from deteriorating in opening and blocking the optical path of incident light.
  • the first support 161 has the same laminated structure as the substrate 200 except for the upper end in the Y direction, so that the first silicon layer 210 of the first support 161 and the first silicon layer 210 formed of the first silicon layer 210 are formed.
  • the second actuators 30 and 90 can be closely opposed to each other, and the heat generated by the first actuator 30 or the second actuator 90 can be transferred to the third base via the first silicon layer 210 of the first support 161. It can be dissipated from the member 13.
  • the displacement magnifying mechanism 520 of the present embodiment is provided in the fixed part 10, and each of the first opening 21 and the second opening 22 divided by the first support part 161 has two actuators, The two beams connected to each other and the driven members respectively connected to the distal ends of the two beams are arranged, and these driven members, that is, the first and second driven members 70 and 140 are The first support 161 and the first support 161 are arranged at a predetermined interval in the X direction.
  • the interval between incident lights that is, the distance between the first light passage 401 and the second light passage 402 is reduced.
  • the intervals need to be closer.
  • the interval between two incident lights needs to be larger than the lengths of the beams 5 and 6 in the X direction. Since the length of the beams 5 and 6 is about several mm, there has been a problem that the distance between the two incident lights cannot be reduced any more.
  • the first driven member 70 and the second driven member 140 are provided by providing two openings 21 and 22 in the same substrate 200 and disposing the above-described set in each of the openings 21 and 22.
  • the distance in the X direction between the first light passage opening 401 and the second light passage opening 402 can be reduced to 1 mm or less.
  • the size of the shutter device 500 can be reduced.
  • the disposition accuracy of each member in the displacement enlarging mechanism 520 particularly the first driven member 70 and the second
  • the arrangement accuracy of each member can be improved.
  • the opening and blocking performance of the incident light in the shutter device 500 can be maintained high.
  • first driven member 70 and the second driven member 140 are disposed so as to be line-symmetric with respect to the first support portion 161 in a plan view, and the first actuator 30 and the second actuator 90 , Are arranged so as to be line-symmetric with respect to the first support portion 161 in plan view.
  • the third actuator 40 and the fourth actuator 110 are disposed so as to be line-symmetric with respect to the first support portion 161 in a plan view, and the third actuator 40 is provided in the first support portion more than the first actuator 30.
  • the fourth actuator 110 is disposed farther from the first support portion 161 than the second actuator 90.
  • the design of the displacement enlarging mechanism 520 and the shutter device 500 can be simplified, and the interval between the incident lights can be easily reduced. Further, the first driven member 70 and the second driven member 140, and furthermore, the first light passing port 401 and the second light passing port 402 arranged at the positions after these displacement are moved to the first support portion 161.
  • the first support portion 161 can be used as an alignment mark, and can be accurately positioned with respect to the VOA or the like. It can be easily implemented.
  • FIG. 8 is a plan view of the shutter device according to the present modification.
  • the same parts as those in the second embodiment are denoted by the same reference numerals, and detailed description is omitted.
  • the second support 162 is provided in the first opening 21 and the third support 163 is provided in the second opening 22 in plan view. Different in that. Further, the second support portion 162 has both ends connected to the fixed portion 10 and is arranged in parallel with the first actuator 30. The third support portion 163 has both ends connected to the fixed portion 10 and is in parallel with the second actuator 90. Are located in
  • the rigidity of the fixed portion 10 cannot be maintained at a value higher than the predetermined value by the first support portion 161 alone.
  • the rigidity of the fixing portion 10 particularly, the rigidity in the Y direction around the first opening 21 and The rigidity in the Y direction around the second opening 22 can be increased.
  • the rigidity of the fixed portion 10 is increased, so that the first and second driven members 70 and 140 can be prevented from being displaced to unintended positions, respectively, as in the second embodiment.
  • the performance of the shutter device 500 can be kept high.
  • the second and third support portions 162 and 163 are formed of the second silicon layer 230, similarly to the support portion 9 shown in FIGS. Therefore, the second support portion 162 is provided below the first and third beams 50 and 60 in the Z direction at a predetermined interval from the first and third beams 50 and 60, and the third support portion 163 is The second and fourth beams 120 and 130 are provided at a predetermined interval below the second and fourth beams 120 and 130 in the Z direction.
  • the second support portion 162 below the first and third beams 50 and 60 in the Z direction, the first and third beams 50 and 60 are driven by the first and third actuators 30 and 40, respectively. In this case, the movement of the first and third beams 50 and 60 is not hindered. Therefore, the first driven member 70 can be displaced by a desired amount.
  • the second support portion 163 below the second and fourth beams 120 and 130 in the Z direction, the second and fourth beams 120 and 130 are driven by the second and fourth actuators 90 and 110, respectively. In this case, the movement of the second and fourth beams 120 and 130 is not hindered. Therefore, the second driven member 140 can be displaced by a desired amount.
  • the arrangement of the second support portion 162 in the first opening 21 is not particularly limited to this, and may be arranged on the side closer to the first actuator 30 or on the side closer to the third actuator 40. It may be arranged.
  • the arrangement of the third support portion 163 in the second opening 22 is not particularly limited to this, and may be arranged on the side closer to the second actuator 90 or on the side closer to the fourth actuator 110. May be arranged. It is sufficient that the second and third support portions 162 and 163 are arranged at positions where the rigidity of the fixing portion 10 in the Y direction can be increased.
  • FIG. 9 is a plan view of a shutter device according to the present modification.
  • the same parts as those in the second embodiment are denoted by the same reference numerals, and detailed description is omitted.
  • the configuration according to the present modification differs from the configuration according to the second embodiment in that the number of actuators disposed in the first opening 21 and the base end of the third beam 60 are connected to the first base member 11. . Also, the difference is that the number of actuators arranged in the second opening 22 and the base end of the fourth beam 120 are connected to the second base member 12.
  • the third actuator 40 and the fourth actuator 110 may be omitted.
  • the first beam 50 driven by the first actuator 30 pushes the first driven member 70 to the right in the X direction, and the first actuator 30 through the first connecting member 80.
  • the driven member 70 overlaps with the light passage opening 401 provided in the submount 400 in plan view. Pushed into position.
  • the second beam 120 driven by the second actuator 90 pushes the second driven member 140 to the left in the X direction, and is driven by the second actuator 90 via the second connecting member 150.
  • the fourth beam 130 that receives the force pulls the first driven member 70 to the right in the X direction the second driven member 140 overlaps with the light passage 402 provided in the submount 400 in plan view. It is pushed out to.
  • the base end of the third beam 60 may be connected to the third base member 13 instead of the first base member 11.
  • the base end of the fourth beam 130 may be connected to the third base member 13 instead of the second base member 12.
  • the first and second actuators 30, 90 are prevented from being unintentionally changed in length, and the first and second driven members 70, 140 are stably held at predetermined positions. be able to.
  • the displacement enlarging mechanism 520 and the shutter device 500 shown in FIGS. 5 to 9 can be obtained through the same manufacturing steps as shown in FIGS. 3A to 3E. Further, the second and third support portions 162 and 163 may be omitted according to the required rigidity of the fixing portion 10.
  • FIGS. 10A and 10B are schematic plan views of the actuator.
  • FIG. 10A shows the planar shape of the actuator according to the present embodiment
  • FIG. 10B shows the planar shape of the actuator for comparison.
  • the actuator 180 shown in FIG. 10 corresponds to the actuator 3 shown in FIG.
  • the same portions as those in the first embodiment are denoted by the same reference numerals, and detailed description is omitted.
  • each of the actuators 3, 4, 30, 90, 40, and 110 shown in Embodiments 1 and 2 including Modifications 1 to 3 generates heat when a current flows, and extends in the Y direction, which is the extending direction.
  • This is a thermal actuator that thermally expands.
  • these actuators are formed of the first silicon layer 210 which is single crystal silicon, plastic deformation does not usually occur at a temperature of about 500 ° C.
  • the plastic deformation may occur due to the heat generated during the driving depending on the stress applied from the fixing portions 1 and 10 and the shape of the actuator itself. There is. Further, if the actuator is driven a plurality of times over a long period of time without being deformed by one drive, plastic deformation may occur. When such plastic deformation occurs, not only does the displacement amount of the actuator not reach the predetermined amount, but in extreme cases, the actuator may be damaged. In other words, the reliability of the actuator may be reduced.
  • the inventors of the present application have found that mainly focusing on the shape of the actuator and defining the width of the actuator as described later, the above-described inconvenience and the reduction in reliability can be reduced.
  • the fact that a large temperature distribution can occur in the actuator 181 for comparison will be described.
  • width when the width of the actuator 181 in the X direction (hereinafter, simply referred to as “width”) is a constant value W3, the current density is constant, and therefore the upper end 181a and the lower end of the actuator 181 are fixed. Both the portion 181b and the intermediate portion 181b generate heat similarly.
  • the upper end 181a is connected to the first base member 1a, and the lower end 181b is connected to the second base member 1b. Since the second base members 1a and 1b are sufficiently large in both surface area and volume with respect to the actuator 181, they also function as heat sinks for dissipating heat generated in the actuator 181.
  • the base end of the beam 5 is connected to the intermediate portion 181b of the actuator 181.
  • the beam 5 itself is smaller in both surface area and volume than the first and second base members 1a and 1b, and is sufficient as a heat sink. Does not function. Therefore, the temperature of the intermediate portion 181b of the actuator 181 rises significantly as compared with the upper end portion 181a and the lower end portion 181c. For this reason, in the intermediate portion 181b, the stress that can cause plastic deformation is smaller than in other portions. In addition, when the actuator 181 is driven, the largest deformation is in the vicinity of the intermediate portion 181b. For this reason, it can be said that the stress is increased in the intermediate portion 181b, and the possibility of plastic deformation is highest.
  • the actuator 180 of the present embodiment is configured so that the width continuously changes as shown in FIG. Specifically, the width is continuously reduced from the middle portion 180b of the actuator 180 to the upper end portion 180a which is a connection portion with the first base member 1a. Further, the width is continuously reduced from the intermediate portion 180b of the actuator 180 to the lower end portion 180c which is a connection portion with the second base member 1b.
  • the temperature of the intermediate portion 180b may be highest when the actuator 180 is driven.
  • the width W1 of the intermediate portion 180b is made larger than another portion, for example, the width W2 near the connection portion with the first base member 1a.
  • the heat density can be reduced by lowering the current density. Accordingly, it is possible to suppress a rise in temperature in the intermediate portion 180b and to make it difficult for plastic deformation to occur even when a certain stress is applied to the actuator 180.
  • the width W1 of the intermediate portion 180b larger than other portions, the rigidity at the portion can be increased and the influence of stress can be reduced.
  • the driven member 7 can be displaced by a desired amount without impairing the driving force of the beam 5 in the X direction.
  • the rotation amount of the intermediate portion 180b prevents the driving amount of the driven member 7 from being reduced. can do.
  • the actuator 180 when the cross-sectional area of the intermediate portion 180b is set to be larger than the cross-sectional areas of the other portions, the current density decreases and the surface area increases, so that the effect of suppressing a rise in temperature increases.
  • a processing step of the actuator is added to the manufacturing steps shown in FIGS. 3A to 3E.
  • the actuator 180 corresponding to the actuator 3 shown in FIG. 1 has been described as an example.
  • the feature of the actuator 180 that is, the width in the X direction from the intermediate portion 180b to the connection portion from the fixed portion 1
  • the shape that continuously decreases toward the upper end portion 180a and the lower end portion 180b is applicable to all of the actuators according to the first and second embodiments including the first to third modifications.
  • the actuator 180 may be applied to only one of the two actuators. Further, when the beam 6 is connected to the fixed unit 1 instead of the actuator, 3, the actuator 180 may be applied.
  • Each of the support portions 9 shown in the first embodiment and the first modification extends along the Y direction, but may be inclined from the Y direction. Further, a plurality of openings may be arranged in the opening 2. When a plurality of the support portions 9 are arranged in the opening 2, they may be parallel to each other or may be arranged so as to form a predetermined angle. They may be integrated so as to intersect.
  • the second and third support portions 162 and 163 shown in Modifications 2 and 3 both extend along the Y direction, but may be inclined from the Y direction. Further, a plurality of second support portions 162 may be arranged in the first opening 21, a plurality of third support portions 163 may be arranged in the second opening 22, or both of them are satisfied.
  • the second support portions 162 When a plurality of the second support portions 162 are arranged in the first opening 21, they may be parallel to each other or may be arranged so as to form a predetermined angle. They may be integrated so as to intersect. The same applies to a case where a plurality of third support portions 163 are arranged in the second opening 22.
  • the support portion 9 and the second and third support portions 162 and 163 are made of the second silicon layer 230.
  • the width in the X direction is the required rigidity or deformation of the fixed portion 1 or 10. It can be appropriately changed according to the allowable amount and the like.
  • the support portion 9 and the second and third support portions 162 and 163 may be processed so that the thickness in the Z direction is smaller than that of the second silicon layer 230.
  • the distance between the beams 5 and 6 and the support 9 in the Z direction is about 1 ⁇ m, which is the thickness of the insulating layer 220.
  • the beams 5, 6 and the like may collide with the support portion 9 and the like due to electrostatic attraction and the like generated between them.
  • the beams 5 and 6 may be damaged, and even if the impact is weak, the beams 5 and 6 and the support 9 may be fixed. When such sticking occurs, the displacement magnifying mechanism 510 and, consequently, the shutter device 500 do not operate normally.
  • a portion of the insulating layer 220 corresponding to the support portion 9 is removed using a mask (not shown), and a portion corresponding to the support portion 9 is removed.
  • the second silicon layer 230 may be removed by a predetermined thickness from the upper side in the Z direction.
  • the number of beams connected to the driven member 7 or 70 is set to two. You may make it connect to the driving member 7 or 70. In that case, for example, the beam is driven by one actuator, and the driven member 7 is displaced. Further, the first silicon layer 210 constituting the driven member 7 and the first and second driven members 70 and 140 is removed by a predetermined thickness so that these members are thinner than the first silicon layer 210. It may be. By doing so, the mass of the driven member 7 and the first and second driven members 70 and 140 can be reduced, and the resonance frequency can be improved.
  • the adhesive 300 may not be provided between the lower surface of the second base member 1b and the submount 400.
  • the adhesive 300 may not be provided between the lower surface of the third base member 13 and the submount 400.
  • an adhesive 300 is provided between the lower surface of the second base member 1b and the submount 400, and the adhesive 300 is provided between the lower surface of the first base member 1b and the submount 400. May not be provided.
  • an adhesive 300 is provided between the lower surface of the third base member 13 and the submount 400, and the lower surface of the first and second base members 11 and 12 is connected to the submount 400.
  • the adhesive 300 may not be provided between the two.
  • the features of the actuator 180 according to the third embodiment are also applicable to the configuration illustrated in FIGS. 1 and 4 in which the support 9 is not provided. Further, in the configuration shown in FIGS. 8 and 9, the present invention is also applicable to a case where the second support portion 162 and the third support portion 163 are not provided. Further, it is also possible to form a new embodiment by combining the components described in the above-mentioned modified examples and the embodiments.
  • the MEMS element of the present invention can stably hold the driven member at a predetermined position by increasing the rigidity of the fixed portion, and is thus useful when applied to a shutter device.

Abstract

A displacement enlarging mechanism 510 comprising a MEMS element includes: a base board 200; a fixed portion 1 provided on the base board 200; an opening 2 provided in the fixed portion 1; an actuator 3 of which both ends are connected to the fixed portion 1; a beam 5 of which a base end side is connected to the actuator 3, and which extends parallel to an upper surface of the base board 200; a driven member 7 connected to a distal end side of the beam 5; and a supporting portion 9 which divides the opening 2 in a plan view, while being disposed parallel to the actuator 3 and having both ends thereof connected to the fixed portion 1. The actuator 3, the beam 5, the driven member 7, and the supporting portion 9 are disposed within the opening 2 in a plan view.

Description

ＭＥＭＳ素子及びそれを用いたシャッタ装置MEMS element and shutter device using the same
　本発明は、ＭＥＭＳ素子及びそれを用いたシャッタ装置に関する。 The present invention relates to a MEMS element and a shutter device using the same.
　従前より、所定の光路を遮断及び開通させるシャッタ装置が知られている。例えば、特許文献１に記載のシャッタ装置の駆動部である変位拡大機構は、シャッタと、シャッタを駆動するアクチュエータとを含んだ、いわゆるＭＥＭＳ（Micro Electro Mechanical Systems）素子である。変位拡大機構は、ＳＯＩ（Silicon On Insulator）基板に設けられた固定部と、固定部に接続された熱式アクチュエータである第１及び第２アクチュエータと、基端側が第１アクチュエータに接続された第１ビームと、基端側が第２アクチュエータに接続された第２ビームと、第１及び第２ビームの先端側に接続され、シャッタとして機能する被駆動部材と、を備えている。第１及び第２ビームは先端側に、互いに並列に配置された並列配置部を有し、第１アクチュエータは第１ビームを介して移動部を押す一方、第２アクチュエータは第２ビームを介して被駆動部材に第１アクチュエータとは反対方向に力を作用する。このように構成されたシャッタ装置は、第１及び第２アクチュエータにそれぞれ駆動される第１及び第２ビームの駆動力が足し合わされて被駆動部材が駆動される。駆動された被駆動部材の変位により、光路が遮断または開通される。 A shutter device that blocks and opens a predetermined optical path has been known. For example, a displacement enlarging mechanism that is a driving unit of the shutter device described in Patent Document 1 is a so-called MEMS (Micro Electro Mechanical Systems) element that includes a shutter and an actuator that drives the shutter. The displacement enlarging mechanism includes a fixed part provided on an SOI (Silicon On Insulator) substrate, first and second actuators which are thermal actuators connected to the fixed part, and a first actuator connected to the first actuator at a base end side. The apparatus includes one beam, a second beam having a base end connected to the second actuator, and a driven member connected to the front ends of the first and second beams and functioning as a shutter. The first and second beams have, on the distal end side, a juxtaposed portion arranged in parallel with each other, and the first actuator pushes the moving portion via the first beam, while the second actuator pushes the moving portion via the second beam. A force acts on the driven member in a direction opposite to the first actuator. In the shutter device configured as described above, the driven members are driven by adding the driving forces of the first and second beams respectively driven by the first and second actuators. The optical path is blocked or opened by the displacement of the driven driven member.
特許第６２１６４８５号公報Japanese Patent No. 6216485
　ところで、上記のような変位拡大機構は、多くの場合、機械的強度を確保等するために、接着材を介して支持部材であるサブマウントに固定される。サブマウントは放熱性や強度等を考慮してセラミック等の無機材料が多く利用されている。また、この場合には、接着材として熱硬化性樹脂が用いられ、２００℃を越えない程度の温度で２つの部材の接合が行われる。 変 位 By the way, the displacement enlarging mechanism as described above is often fixed to a submount which is a support member via an adhesive in order to secure mechanical strength and the like. For the submount, inorganic materials such as ceramics are often used in consideration of heat dissipation and strength. In this case, a thermosetting resin is used as the adhesive, and the two members are joined at a temperature not exceeding 200 ° C.
　しかし、サブマウントと変位拡大機構の主要構成材料であるシリコンとは熱膨張係数が異なるため、両者を接合した後に、熱膨張係数の違いによって、変位拡大機構に応力が加わる。この応力のうち、アクチュエータの延在方向に加わる応力は、アクチュエータの全長を伸長または収縮させるように働く。このように第１及び第２アクチュエータが伸長または収縮すると、これらのアクチュエータにそれぞれ接続された第１及び第２ビームを介してシャッタとして機能する被駆動部材が所定の位置から変位してしまうことがある。 However, since the submount and silicon, which is the main component material of the displacement magnifying mechanism, have different coefficients of thermal expansion, stress is applied to the displacement magnifying mechanism due to the difference in the coefficient of thermal expansion after joining the two. Among these stresses, the stress applied in the extending direction of the actuator works to extend or contract the entire length of the actuator. When the first and second actuators extend or contract in this manner, the driven member functioning as a shutter may be displaced from a predetermined position via the first and second beams connected to these actuators. is there.
　また、上記のように、定常的に応力が加わる場合だけでなく、外部から衝撃が加わった場合にも、固定部にアクチュエータの延在方向に沿った力が加わると、被駆動部材が所定の位置から変位してしまうことがある。 In addition, as described above, not only when the stress is constantly applied but also when an external impact is applied, when the force along the extending direction of the actuator is applied to the fixed portion, the driven member is moved to a predetermined position. It may be displaced from the position.
　通常、このような被駆動部材の変位を許容してシャッタ装置の設計がなされるが、近年、シャッタ装置に関して、さらなる小型化や性能向上が要求されており、上記の変位を低減することが求められてきている。 Normally, the shutter device is designed to allow such displacement of the driven member. However, in recent years, further miniaturization and improvement in performance of the shutter device have been demanded, and it is required to reduce the displacement. Have been
　本発明はかかる点に鑑みてなされたもので、その目的は、固定部の剛性、特にアクチュエータの延在方向の剛性を高めたＭＥＭＳ素子及びそれを用いたシャッタ装置を提供することにある。 The present invention has been made in view of the above point, and an object of the present invention is to provide a MEMS element in which rigidity of a fixed portion, particularly rigidity in an extending direction of an actuator is increased, and a shutter device using the same.
　上記目的を達成するため、本発明に係るＭＥＭＳ素子は、基板と、前記基板に設けられた固定部と、前記固定部に設けられた開口と、両端が前記固定部に接続されたアクチュエータと、基端側が前記アクチュエータに接続され、前記基板の上面と平行に延在するビームと、前記ビームの先端側に接続された被駆動部材と、平面視で前記開口を分割する一方、両端が前記固定部に接続されて前記アクチュエータと並列に配置された支持部と、を有し、前記アクチュエータと前記ビームと前記被駆動部材と前記支持部とは、平面視で前記開口内に配置されている。 In order to achieve the above object, a MEMS element according to the present invention includes a substrate, a fixed portion provided on the substrate, an opening provided on the fixed portion, an actuator having both ends connected to the fixed portion, A beam whose base end is connected to the actuator and extends in parallel with the upper surface of the substrate, a driven member connected to the front end of the beam, and the opening are divided in plan view, while both ends are fixed. A support portion connected to a portion and arranged in parallel with the actuator, wherein the actuator, the beam, the driven member, and the support portion are arranged in the opening in a plan view.
　この構成によれば、固定部に設けられた開口を分割し、アクチュエータと並列に配置された支持部を設けることにより、アクチュエータの延在方向における固定部の剛性を高めることができる。また、固定部の剛性が高められることにより、被駆動部材が意図しない位置に変位するのを防止して、所定の位置に安定して保持できる。 According to this configuration, the rigidity of the fixed portion in the extending direction of the actuator can be increased by dividing the opening provided in the fixed portion and providing the support portion arranged in parallel with the actuator. Further, by increasing the rigidity of the fixing portion, the driven member is prevented from being displaced to an unintended position, and can be stably held at a predetermined position.
　また、本発明に係る別のＭＥＭＳ素子は、基板と、前記基板に設けられた固定部と、前記固定部に設けられた開口と、両端が前記固定部に接続され、前記開口を第１開口と第２開口とに分割する第１支持部と、を有し、平面視で前記第１開口内に、両端が前記固定部に接続されたアクチュエータと、基端側が前記アクチュエータに接続され、前記基板の上面と平行に延在する第１ビームと、前記第１ビームの先端側に接続された被駆動部材と、が配置され、平面視で前記第２開口内に、両端が前記固定部に接続された第２アクチュエータと、基端側が前記第２アクチュエータに接続され、前記基板の上面と平行に延在する第２ビームと、前記第２ビームの先端側に接続された第２被駆動部材と、が配置され、前記第１支持部は、平面視で前記第１及び第２ビームと交差する方向に延在している。 Further, another MEMS element according to the present invention includes a substrate, a fixing portion provided on the substrate, an opening provided on the fixing portion, and both ends connected to the fixing portion, and the opening is a first opening. And a first support portion that is divided into a second opening and an actuator having both ends connected to the fixed portion in the first opening in plan view, and a base end connected to the actuator, A first beam extending in parallel with the upper surface of the substrate and a driven member connected to a tip end of the first beam are arranged, and both ends of the first beam are connected to the fixed portion in plan view. A connected second actuator, a second beam having a base end connected to the second actuator and extending parallel to an upper surface of the substrate, and a second driven member connected to a tip end of the second beam And the first support portion is located forward in plan view. It extends in a direction intersecting the first and second beams.
　この構成によれば、固定部に設けられた開口を第１開口と第２開口とに分割する第１支持部を設けることにより、固定部の剛性を高めることができ、第１及び第２被駆動部材がそれぞれ意図しない位置に変位するのを防止して、所定の位置に安定して保持できる。 According to this configuration, by providing the first support portion that divides the opening provided in the fixing portion into the first opening and the second opening, the rigidity of the fixing portion can be increased, and the first and second covers can be provided. The driving members can be prevented from being displaced to unintended positions, and can be stably held at predetermined positions.
　本発明に係るシャッタ装置は、上記のＭＥＭＳ素子と、前記固定部の上面に配設され、少なくとも前記アクチュエータの一端に電気的に接続された第１電極と、前記固定部の上面に配設され、少なくとも前記アクチュエータの他端に電気的に接続された第２電極と、を備え、前記被駆動部材で光路を遮断及び開通させる。 A shutter device according to the present invention includes the MEMS element described above, a first electrode provided on an upper surface of the fixed portion, and at least electrically connected to one end of the actuator, and a first electrode provided on an upper surface of the fixed portion. And a second electrode electrically connected to at least the other end of the actuator, wherein the driven member cuts off and opens an optical path.
　この構成によれば、第１電極と第２電極との間に電圧が印加されると、アクチュエータが駆動し、アクチュエータに接続されたビームを介して被駆動部材が変位することで、所定の光路を開通及び遮断することができる。また、被駆動部材を所定の位置に安定して保持できるため、光路の開通及び遮断性能を高く維持できる。 According to this configuration, when a voltage is applied between the first electrode and the second electrode, the actuator is driven, and the driven member is displaced via the beam connected to the actuator, thereby providing a predetermined optical path. Can be opened and closed. Further, since the driven member can be stably held at a predetermined position, the opening and blocking performance of the optical path can be maintained at a high level.
　以上説明したように、本発明に係るＭＥＭＳ素子によれば、被駆動部材を安定して保持できる。また、本発明に係るシャッタ装置によれば、被駆動部材を所定の位置に安定して保持できるため、シャッタとして機能する光路の開通及び遮断性能を高く維持できる。 As described above, according to the MEMS element of the present invention, the driven member can be stably held. Further, according to the shutter device of the present invention, the driven member can be stably held at the predetermined position, so that the opening / closing performance of the optical path functioning as a shutter can be kept high.
本発明の実施形態１に係るシャッタ装置の平面図である。It is a top view of the shutter device concerning Embodiment 1 of the present invention. 図１のＩＩ－ＩＩ線における断面模式図である。FIG. 2 is a schematic sectional view taken along line II-II in FIG. 1. シャッタ装置の一の製造工程の説明図である。It is explanatory drawing of one manufacturing process of a shutter device. 図３Ａに示す工程の続きを示す説明図である。FIG. 3B is an explanatory view showing a continuation of the step shown in FIG. 3A. 図３Ｂに示す工程の続きを示す説明図である。FIG. 3C is an explanatory view showing a continuation of the step shown in FIG. 3B. 図３Ｃに示す工程の続きを示す説明図である。FIG. 3C is an explanatory view showing a continuation of the step shown in FIG. 3C. 図３Ｄに示す工程の続きを示す説明図である。FIG. 3D is an explanatory view showing a continuation of the step shown in FIG. 3D. 変形例１に係るシャッタ装置の平面図である。9 is a plan view of a shutter device according to Modification 1. FIG. 本発明の実施形態２に係るシャッタ装置の平面図である。It is a top view of the shutter device concerning Embodiment 2 of the present invention. シャッタ装置の要部を示す斜視図である。FIG. 3 is a perspective view illustrating a main part of the shutter device. 図６の破線で囲まれた部分の拡大図である。FIG. 7 is an enlarged view of a portion surrounded by a broken line in FIG. 6. 変形例２に係るシャッタ装置の平面図である。FIG. 13 is a plan view of a shutter device according to a second modification. 変形例３に係るシャッタ装置の平面図である。13 is a plan view of a shutter device according to Modification Example 3. FIG. 本発明の実施形態３に係るアクチュエータの平面模式図である。It is a plane schematic diagram of the actuator concerning Embodiment 3 of the present invention.
　以下、本発明の実施形態を図面に基づいて詳細に説明する。以下の好ましい実施形態の説明は、本質的に例示に過ぎず、本発明、その適用物或いはその用途を制限することを意図するものでは全くない。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. The following description of preferred embodiments is merely exemplary in nature and is in no way intended to limit the invention, its applications, or its uses.
　（実施形態１）
　［シャッタ装置の構成］
　図１は、本発明の実施形態１に係るシャッタ装置の平面図を、図２は、図１のＩＩ－ＩＩ線における断面図を示す。なお、図面に描かれた各部材の寸法、厚さ、細部の詳細形状などは実際のものとは異なっている。 (Embodiment 1)
[Configuration of Shutter Device]
FIG. 1 is a plan view of the shutter device according to the first embodiment of the present invention, and FIG. 2 is a cross-sectional view taken along line II-II of FIG. It should be noted that the dimensions, thickness, and detailed shape of each member depicted in the drawings are different from actual ones.
　図１に示すように、例えば、シャッタ装置５００は、平面視で矩形の全体形状を有しており、ＳＯＩ基板２００（以下、単に基板２００と呼ぶことがある。）と、サブマウント４００と、基板２００に設けられた固定部１の下面とサブマウント４００の上面との間に設けられた接着材３００とを有している。基板２００は、単結晶シリコンで形成された第１シリコン層２１０と、ＳｉＯ２で形成された絶縁層２２０と、単結晶シリコンで形成された第２シリコン層２３０と、がこの順で積層されて構成されている。 As shown in FIG. 1, for example, the shutter device 500 has a rectangular overall shape in a plan view, and includes an SOI substrate 200 (hereinafter, may be simply referred to as the substrate 200), a submount 400, and It has an adhesive 300 provided between the lower surface of the fixing portion 1 provided on the substrate 200 and the upper surface of the submount 400. The substrate 200 includes a first silicon layer 210 formed of single crystal silicon, an insulating layer 220 formed of SiO 2 , and a second silicon layer 230 formed of single crystal silicon, which are stacked in this order. It is configured.
　基板２００には、固定部１と固定部１の内側に開口２とが形成されており、固定部１は、シャッタ装置５００及び後述する変位拡大機構５１０の一部をなし、平面視矩形のシャッタ装置５００及び変位拡大機構５１０の全体形状を規定している。 A fixed portion 1 and an opening 2 inside the fixed portion 1 are formed in the substrate 200. The fixed portion 1 forms a part of a shutter device 500 and a displacement magnifying mechanism 510 described later, and has a rectangular shutter in plan view. The overall shape of the device 500 and the displacement magnifying mechanism 510 is defined.
　サブマウント４００は、基板２００を機械的に支持する支持部材であり、例えば、セラミック等からなる。また、サブマウント４００には、その厚さ方向に入射する光を通過させるための光通過口４０１が設けられている。また、接着材３００は、基板２００とサブマウント４００とを接合するための接合部材であり、例えば、エポキシ系の熱硬化性樹脂からなる。接着材３００は、光通過口４０１にかからないように、また、基板２００とサブマウント４００とを確実に接合するために、平面視で固定部１と重なるように配設されている。なお、接着材３００は、他の材料、例えば、シリコーン系樹脂を用いてもよい。 The submount 400 is a support member that mechanically supports the substrate 200, and is made of, for example, ceramic or the like. Further, the submount 400 is provided with a light passage port 401 for passing light incident in the thickness direction thereof. The adhesive 300 is a joining member for joining the substrate 200 and the submount 400, and is made of, for example, an epoxy-based thermosetting resin. The adhesive material 300 is provided so as not to cover the light passage opening 401 and to overlap with the fixing portion 1 in a plan view so as to securely join the substrate 200 and the submount 400. The adhesive 300 may be made of another material, for example, a silicone resin.
　また、シャッタ装置５００は、いわゆるＭＥＭＳシャッタであって、シャッタの駆動部である変位拡大機構５１０は、半導体微細加工技術を応用したマイクロマシニング技術を用いて基板２００を加工して得られるＭＥＭＳ素子である（図３Ａ～３Ｅ参照）。変位拡大機構５１０として、シャッタ装置５００は、さらに、両端が固定部１に接続されたアクチュエータ３と、基端側がアクチュエータ３に接続され、基板２００の上面と平行に延在するビーム５と、を有している。また、シャッタ装置５００は、アクチュエータ３と離間して設けられたアクチュエータ４（以下、別のアクチュエータ４と呼ぶことがある。）と、基端側がアクチュエータ４に接続され、基板２００の上面と平行に延在するビーム６（以下、別のビーム６と呼ぶことがある。）と、ビーム５及びビーム６の先端側に接続された被駆動部材７と、を有している。なお、本実施形態では、アクチュエータ４は、ビーム５を挟んでアクチュエータ３と反対側に設けられている。さらに、シャッタ装置５００は、ビーム５とビーム６とを連結する連結部材８と、両端が固定部１に接続されてアクチュエータ３，４と並列に配置され、平面視で開口２を分割する支持部９と、固定部１の上面に配設された第１電極１０１及び第２電極１０２と、を有している。なお、アクチュエータ３，４とビーム５，６と被駆動部材７と連結部材８と支持部９とは、平面視で開口２内に配置されている。また、以降の説明において、基板２００及び基板２００に設けられた上記の構造に対し、さらにサブマウント４００と接着材３００とを含んで、変位拡大機構５１０と呼ぶことがある。 Further, the shutter device 500 is a so-called MEMS shutter, and the displacement enlarging mechanism 510, which is a driving unit of the shutter, is a MEMS element obtained by processing the substrate 200 using micromachining technology that applies semiconductor fine processing technology. (See FIGS. 3A-3E). As the displacement magnifying mechanism 510, the shutter device 500 further includes an actuator 3 having both ends connected to the fixed portion 1 and a beam 5 having a base end connected to the actuator 3 and extending parallel to the upper surface of the substrate 200. Have. In addition, the shutter device 500 includes an actuator 4 provided separately from the actuator 3 (hereinafter, may be referred to as another actuator 4), and a base end side connected to the actuator 4 so as to be parallel to the upper surface of the substrate 200. It has an extending beam 6 (hereinafter sometimes referred to as another beam 6) and a driven member 7 connected to the distal end of the beam 5 and the beam 6. In the present embodiment, the actuator 4 is provided on the opposite side of the beam 3 from the actuator 3. Further, the shutter device 500 includes a connecting member 8 that connects the beam 5 and the beam 6, and a supporting portion that is connected in parallel to the actuators 3 and 4 with both ends connected to the fixed portion 1 and divides the opening 2 in a plan view. 9 and a first electrode 101 and a second electrode 102 disposed on the upper surface of the fixing portion 1. The actuators 3, 4, the beams 5, 6, the driven member 7, the connecting member 8, and the support 9 are arranged in the opening 2 in plan view. Further, in the following description, the substrate 200 and the above-described structure provided on the substrate 200 may be further referred to as a displacement enlarging mechanism 510 including the submount 400 and the adhesive 300.
　以下、説明の便宜上、ビーム５の長手方向をＸ方向、アクチュエータ３，４の長手方向をＹ方向、シャッタ装置５００の厚さ方向、つまり、基板２００及びサブマウント４００の厚さ方向をＺ方向と称する。なお、Ｘ方向において、図１における左側を単に左側、図１における右側を単に右側と呼ぶこともある。Ｙ方向において、図１における上側を単に上側、図１における下側を単に下側と呼ぶこともある。Ｚ方向において、図２における上側を上面、図２における下側を下面と呼ぶこともある。 Hereinafter, for convenience of description, the longitudinal direction of the beam 5 is defined as the X direction, the longitudinal directions of the actuators 3 and 4 are defined as the Y direction, and the thickness direction of the shutter device 500, that is, the thickness direction of the substrate 200 and the submount 400 is defined as the Z direction. Name. In the X direction, the left side in FIG. 1 may be simply called the left side, and the right side in FIG. 1 may be simply called the right side. In the Y direction, the upper side in FIG. 1 may be simply referred to as the upper side, and the lower side in FIG. 1 may be simply referred to as the lower side. In the Z direction, the upper side in FIG. 2 may be called an upper surface, and the lower side in FIG. 2 may be called a lower surface.
　シャッタ装置５００において、固定部１、アクチュエータ３，４、ビーム５,６、被駆動部材７、連結部材８及び支持部９は、シリコン素材で一体成形されている。なお、固定部１を構成する第１ベース部材１ａ及び第２ベース部材１ｂは、周縁部を除いて第１シリコン層２１０と絶縁層２２０と第２シリコン層２３０との積層構造であり、開口２内では、可動部材であるアクチュエータ３，４、ビーム５,６、被駆動部材７及び連結部材８の下面の絶縁層２２０及び第２シリコン層２３０は後述する製造工程において除去される。よって、アクチュエータ３，４、ビーム５,６、被駆動部材７及び連結部材８では、第１シリコン層２１０のみが残される。また、支持部９では、第２シリコン層２３０のみが残され、その上面の絶縁層２２０と第１シリコン層２１０とは、同じ製造工程において除去される。 In the shutter device 500, the fixed part 1, the actuators 3, 4, the beams 5, 6, the driven member 7, the connecting member 8, and the support part 9 are integrally formed of a silicon material. The first base member 1a and the second base member 1b constituting the fixing portion 1 have a laminated structure of the first silicon layer 210, the insulating layer 220, and the second silicon layer 230 except for the peripheral portion, and the opening 2 Inside, the actuators 3 and 4, the beams 5 and 6, which are movable members, the insulating layer 220 and the second silicon layer 230 on the lower surfaces of the driven members 7 and the connecting members 8 are removed in a manufacturing process described later. Therefore, only the first silicon layer 210 remains in the actuators 3 and 4, the beams 5 and 6, the driven member 7, and the connecting member 8. In the support portion 9, only the second silicon layer 230 is left, and the insulating layer 220 and the first silicon layer 210 on the upper surface are removed in the same manufacturing process.
　固定部１は、Ｙ方向に対向して配置された第１ベース部材１ａ及び第２ベース部材１ｂを有した平面視で矩形状の部材である。なお、第１ベース部材１ａ及び第２ベース部材１ｂは、第１シリコン層２１０においてそれぞれＹ方向に分かれているが、前述したように、絶縁層２２０及び第２シリコン層２３０では１つに繋がっており、第１ベース部材１ａ及び第２ベース部材１ｂの相対位置は固定されている。よって、第１ベース部材１ａ及び第２ベース部材１ｂでアクチュエータ３，４やビーム５，６や被駆動部材７等の可動部材を支持することができる。 The fixing portion 1 is a rectangular member in a plan view having a first base member 1a and a second base member 1b arranged to face each other in the Y direction. Although the first base member 1a and the second base member 1b are separated in the Y direction in the first silicon layer 210, as described above, they are connected to one in the insulating layer 220 and the second silicon layer 230. The relative positions of the first base member 1a and the second base member 1b are fixed. Therefore, the first base member 1a and the second base member 1b can support movable members such as the actuators 3, 4, the beams 5, 6, and the driven member 7.
　このように、固定部１は、可動部材の可動域を確保しつつできるだけ広い面積を占めるような形状にされていることで、可動部材を支持するフレームとして機能している。 As described above, the fixed portion 1 functions as a frame that supports the movable member by being shaped so as to occupy as large an area as possible while securing the movable range of the movable member.
　アクチュエータ３は、Ｙ方向に伸びた棒状の駆動ビームであり、上端部３ａは、第１ベース部材１ａの第１シリコン層２１０に、下端部３ｃは、第２ベース部材１ｂの第１シリコン層２１０にそれぞれ接続されている。また、アクチュエータ３の中間部３ｂはビーム５に接続されている。また、アクチュエータ３に電流が流れていない場合、言いかえると、アクチュエータ３の初期形状は、中間部３ｂがその駆動方向であるＸ方向左側に突出するようにわずかに屈曲、あるいは全体的にＸ方向左側に膨らむようにわずかに湾曲している。 The actuator 3 is a rod-shaped drive beam extending in the Y direction. The upper end 3a is provided on the first silicon layer 210 of the first base member 1a, and the lower end 3c is provided on the first silicon layer 210 of the second base member 1b. Connected to each other. The intermediate portion 3b of the actuator 3 is connected to the beam 5. When no current flows through the actuator 3, in other words, the initial shape of the actuator 3 is slightly bent such that the intermediate portion 3 b projects to the left in the X direction, which is the driving direction, or is entirely in the X direction. It is slightly curved to bulge to the left.
　アクチュエータ４は、Ｙ方向に伸びた棒状の駆動ビームであり、上端部４ａは、第１ベース部材１ａの第１シリコン層２１０に、下端部４ｃは、第２ベース部材１ｂの第１シリコン層２１０にそれぞれ接続されている。また、アクチュエータ４の中間部４ｂはビーム６に接続されている。また、アクチュエータ４に電流が流れていない場合、言いかえると、アクチュエータ４の初期形状は、中間部４ｂがその駆動方向であるＸ方向右側に突出するようにわずかに屈曲、あるいは全体的にＸ方向右側に膨らむようにわずかに湾曲している。 The actuator 4 is a rod-shaped drive beam extending in the Y direction. The upper end 4a is provided on the first silicon layer 210 of the first base member 1a, and the lower end 4c is provided on the first silicon layer 210 of the second base member 1b. Connected to each other. Further, an intermediate portion 4 b of the actuator 4 is connected to the beam 6. When no current flows through the actuator 4, in other words, the initial shape of the actuator 4 is slightly bent such that the intermediate portion 4 b projects rightward in the X direction, which is the driving direction, or is entirely in the X direction. It is slightly curved to bulge to the right.
　アクチュエータ３及びアクチュエータ４は電流が流れることで発熱して各々の延在方向であるＹ方向に熱膨張する熱式アクチュエータである。また、上記のように、アクチュエータ３，４がその駆動方向であるＸ方向に沿って屈曲あるいは湾曲していることにより、加熱による熱膨張時に、アクチュエータ３，４が駆動方向と反対側に屈曲あるいは湾曲することがない。従って、所望の駆動方向に向かってアクチュエータ３，４を確実に屈曲あるいは湾曲させることができる。 The actuators 3 and 4 are thermal actuators that generate heat when a current flows and thermally expand in the Y direction, which is their respective extending directions. Further, as described above, since the actuators 3 and 4 are bent or curved along the X direction which is the driving direction, the actuators 3 and 4 are bent or bent to the opposite side to the driving direction during thermal expansion due to heating. Does not bend. Therefore, the actuators 3 and 4 can be reliably bent or curved in a desired driving direction.
　また、図１に示すように、アクチュエータ３はシャッタ装置５００においてＸ方向左側に配置され、アクチュエータ４はＸ方向右側に配置され、アクチュエータ３とアクチュエータ４とは平面視で対向している。 As shown in FIG. 1, the actuator 3 is disposed on the left side in the X direction in the shutter device 500, and the actuator 4 is disposed on the right side in the X direction, and the actuator 3 and the actuator 4 face each other in plan view.
　ビーム５は、Ｘ方向に延びる棒状の部材である。ビーム５の第１端部５ａはアクチュエータ３の中間部３ｂに接続されている。また、ビーム５の第２端部５ｂは被駆動部材７に接続されている。なお、以降の説明において、ビーム５の第１端部５ａをビーム５の基端と、ビーム５の第２端部５ｂをビーム５の先端とそれぞれ呼ぶことがある。 The beam 5 is a rod-shaped member extending in the X direction. The first end 5 a of the beam 5 is connected to the intermediate part 3 b of the actuator 3. The second end 5 b of the beam 5 is connected to the driven member 7. In the following description, the first end 5a of the beam 5 may be referred to as the base end of the beam 5, and the second end 5b of the beam 5 may be referred to as the distal end of the beam 5.
　ビーム６は、折り返し構造を有する部材であり、アクチュエータ４の中間部４ｂからアクチュエータ３の中間部３ａの近傍まで伸びる第１部材６ａと、第１部材６ａの第３端部６ｅからアクチュエータ４の方へ折り返された第２部材６ｂとを備えている。第１部材６ａの第１端部６ｃは、アクチュエータ４の中間部４ｂに接続されている。また、第２部材６ｂの第４端部６ｆは、被駆動部材７に接続されている。なお、以降の説明において、第１部材６ａの第１端部６ｃをビーム６の基端と、第２部材６ｂの第４端部６ｆをビーム６の先端とそれぞれ呼ぶことがある。 The beam 6 is a member having a folded structure. The first member 6a extends from the intermediate portion 4b of the actuator 4 to the vicinity of the intermediate portion 3a of the actuator 3, and the beam 6 extends from the third end 6e of the first member 6a toward the actuator 4. And the second member 6b folded back. The first end 6c of the first member 6a is connected to the intermediate part 4b of the actuator 4. The fourth end 6f of the second member 6b is connected to the driven member 7. In the following description, the first end 6c of the first member 6a may be referred to as the base end of the beam 6, and the fourth end 6f of the second member 6b may be referred to as the end of the beam 6.
　第２部材６ｂは、第１部材６ａの第３端部６ｅからＸ方向右側に伸びた、ビーム５とほぼ同じ幅の棒状の部材である。第２部材６ｂは、ビーム５と交差する方向であるＹ方向にビーム５と離間して並列に配置されている。なお、以降の説明も含めて「ビーム５とビーム６の第２部材６ｂとが並列（に）配置されている」とは、ビーム５とビームの第２部材６ｂとが略平行関係を保って配置されているということである。また、ビーム５とビーム６の第２部材６ｂとが互いに並列に配置された部分を並列配置部６００と称することがある。すなわち、ビーム５とビーム６の第２部材６ｂとは並列して同じ方向から被駆動部材７に接続されている。言いかえると、ビーム５の先端側が折り返されることにより、ビーム５及びビーム６と被駆動部材７との接続部分において、ビーム５とビーム６の第２部材６ｂとが並列に配置される。異なる言い方をすれば、ビーム６の第２部材６ｂの先端側が折り返されることにより、ビーム５及びビーム６と被駆動部材７との接続部分において、ビーム５とビーム６の第２部材６ｂとが並列に配置される。ビーム５は第２端部５ｂからビーム５の延在方向へ被駆動部材７を引く一方、ビーム６は第４端部６ｆからビーム６の延在方向へ被駆動部材７を押すことで被駆動部材７を駆動させる。後述するように、ビーム５及びビーム６の第２部材６ｂは、アクチュエータ３及びアクチュエータ４によりそれぞれ駆動されて弾性変形して被駆動部材７をＸＹ平面上の別の位置へと移動させる。なお、上記とは逆に、ビーム５が被駆動部材７を押す一方、ビーム６が被駆動部材７を引くようにしてもよい。 The second member 6b is a rod-shaped member extending to the right in the X direction from the third end 6e of the first member 6a and having substantially the same width as the beam 5. The second member 6b is arranged in parallel in the Y direction, which is a direction intersecting with the beam 5, with a distance from the beam 5. In addition, including the following description, “the beam 5 and the second member 6b of the beam 6 are arranged in parallel (in parallel)” means that the beam 5 and the second member 6b of the beam 6 maintain a substantially parallel relationship. It is that it is arranged. Further, a portion where the beam 5 and the second member 6b of the beam 6 are arranged in parallel with each other may be referred to as a parallel arrangement portion 600. That is, the beam 5 and the second member 6b of the beam 6 are connected to the driven member 7 from the same direction in parallel. In other words, the beam 5 and the second member 6b of the beam 6 are arranged in parallel at the connection portion between the beam 5 and the beam 6 and the driven member 7 by bending the distal end side of the beam 5. In other words, when the distal end side of the second member 6b of the beam 6 is folded, the beam 5 and the second member 6b of the beam 6 are connected in parallel at the connection portion between the beam 5 and the driven member 7. Placed in The beam 5 pulls the driven member 7 from the second end 5b in the direction in which the beam 5 extends, while the beam 6 is driven by pushing the driven member 7 in the direction in which the beam 6 extends from the fourth end 6f. The member 7 is driven. As described later, the second members 6b of the beams 5 and 6 are driven by the actuators 3 and 4, respectively, and elastically deform to move the driven member 7 to another position on the XY plane. Conversely, the beam 5 may push the driven member 7 while the beam 6 pulls the driven member 7.
　第１部材６ａは、被駆動部材７を迂回するような例えば半弧状の形状を一部に有する部材である。第１部材６ａは、第１端部６ｃからＸ方向左側に延びて第２端部６ｄでＹ方向下側に折り返されて第２部材６ｂに接続されている。また、第１部材６ａは、第２部材６ｂよりも剛性が高くなるように高剛性領域を少なくとも一部に有し、例えば幅広に形成されている。後述するように、ビーム６がアクチュエータ４により駆動されても、第１部材６ａはほとんど弾性変形せずにその形状を留めてアクチュエータ４の駆動力を第２部材６ｂへと伝達する。なお、高剛性領域を設けるにあたって、第１部材６ａの一部を第２部材６ｂよりも厚くしたり、第１部材６ａの一部に金属膜を成膜するなどしてもよい。また、第１部材６ａには肉抜き構造６ｇが形成されている。肉抜き構造６ｇを形成することにより、ビーム６の質量が小さくなり、共振周波数が高くなるという効果が得られる。さらに、第１部材６ａに肉抜き構造６ｇを設けることにより、ビーム６の表面積が増加する。このことにより、ビーム６からの放熱が促進され、熱式アクチュエータであるアクチュエータ４から被駆動部材７に伝わる熱を緩和することができる。 The first member 6 a is a member partially having, for example, a semi-arc shape that bypasses the driven member 7. The first member 6a extends leftward in the X direction from the first end 6c, is folded downward at the second end 6d in the Y direction, and is connected to the second member 6b. The first member 6a has a high-rigidity region at least in part so as to have higher rigidity than the second member 6b, and is formed, for example, wide. As will be described later, even when the beam 6 is driven by the actuator 4, the first member 6a is hardly elastically deformed and retains its shape to transmit the driving force of the actuator 4 to the second member 6b. In providing the high rigidity region, a part of the first member 6a may be made thicker than the second member 6b, or a metal film may be formed on a part of the first member 6a. The first member 6a has a lightening structure 6g. By forming the lightening structure 6g, the effect of reducing the mass of the beam 6 and increasing the resonance frequency can be obtained. Further, by providing the lightening structure 6g in the first member 6a, the surface area of the beam 6 increases. Accordingly, heat radiation from the beam 6 is promoted, and heat transmitted from the actuator 4 which is a thermal actuator to the driven member 7 can be reduced.
　被駆動部材７は、ビーム５の第２端部５ｂ及びビーム６の第４端部６ｆ、言いかえると、並列配置部６００の先端側に連結された略円形の部材であり、アクチュエータ３，４によってビーム５，６がそれぞれ駆動されるときに、基板２００の上面（ＸＹ平面）と平行な方向に移動する。また、また、被駆動部材７の表面全体に金属膜７ａ、例えば、Ａｕ／Ｔｉ膜が形成されている。シャッタ装置５００において、被駆動部材７は、図示しない入射光の光路を遮断及び開通させるシャッタとして機能する。従って、被駆動部材７は、当該光路の断面よりも一回り大きい平面形状に形成されている。また、アクチュエータ３，４によって被駆動部材７が駆動されるとき、被駆動部材７は、平面視で、サブマウント４００に設けられた光通過口４０１の全部または一部を覆うように変位する。シャッタ装置５００が入射光の光路を完全に遮断するように設計されている場合は、被駆動部材７の平面形状は、光通過口４０１の平面形状と同じ大きさかあるいはそれ以上とするのが好ましい。 The driven member 7 is a substantially circular member connected to the second end 5 b of the beam 5 and the fourth end 6 f of the beam 6, in other words, to the distal end side of the parallel arrangement portion 600. When the beams 5 and 6 are driven, the beams 5 and 6 move in a direction parallel to the upper surface (XY plane) of the substrate 200. Further, a metal film 7a, for example, an Au / Ti film is formed on the entire surface of the driven member 7. In the shutter device 500, the driven member 7 functions as a shutter that blocks and opens an optical path of incident light (not shown). Therefore, the driven member 7 is formed in a planar shape slightly larger than the cross section of the optical path. Further, when the driven member 7 is driven by the actuators 3 and 4, the driven member 7 is displaced so as to cover all or a part of the light passage opening 401 provided in the submount 400 in plan view. When the shutter device 500 is designed to completely block the optical path of the incident light, the planar shape of the driven member 7 is preferably equal to or larger than the planar shape of the light passage opening 401. .
　連結部材８は、ビーム５とビーム６とを互いに連結するヘアピン形状の部材であり、ビーム５との連結部である一端からＹ方向上側に延在して折り返され、他端がビーム６の第１部材６ａ、具体的には、第１部材６ａの第２端部６ｄに連結されている。このような連結部材８を設けることにより、ビーム６の第１端部６ｃがアクチュエータ４によって駆動したとき、ビーム６の第１部材６ａが第１端部６ｃを軸としてＸＹ平面上で反時計回りに若干回転するのを防止し、被駆動部材７の変位量をより大きくすることができる。また、本実施形態に示すように、アクチュエータ３，４が熱式アクチュエータの場合、アクチュエータ３，４からビーム５，６にそれぞれ伝わる熱が連結部材８でも放熱されるため被駆動部材７への熱伝達が防止できる。また、アクチュエータ４によるビーム６の第１端部６ｃの駆動量を大きく軽減させることがない。なお、連結部材８の延在方向は、ビーム５及びビーム６と略垂直方向でなくてもよく、ビーム５やビーム６と交差する方向であればよいが、アクチュエータ３，４を駆動させた場合に、アクチュエータ３に接触しないように、アクチュエータ３との間隔を適切にあけて配置する必要がある。 The connecting member 8 is a hairpin-shaped member that connects the beam 5 and the beam 6 to each other. The connecting member 8 extends upward in the Y direction from one end, which is a connecting portion with the beam 5, and is folded back. It is connected to one member 6a, specifically, the second end 6d of the first member 6a. By providing such a connecting member 8, when the first end 6c of the beam 6 is driven by the actuator 4, the first member 6a of the beam 6 rotates counterclockwise on the XY plane about the first end 6c. And the displacement of the driven member 7 can be further increased. Further, as shown in the present embodiment, when the actuators 3 and 4 are thermal actuators, the heat transmitted to the beams 5 and 6 from the actuators 3 and 4 is also radiated by the connecting member 8, so that the heat to the driven member 7 is Transmission can be prevented. Further, the driving amount of the first end 6c of the beam 6 by the actuator 4 is not greatly reduced. Note that the extending direction of the connecting member 8 may not be a direction substantially perpendicular to the beams 5 and 6, and may be a direction intersecting the beams 5 and 6, but when the actuators 3 and 4 are driven. In addition, it is necessary to provide an appropriate distance from the actuator 3 so as not to contact the actuator 3.
　支持部９は、第２シリコン層２３０からなる部材であり、Ｙ方向の上端部が第１ベース部材１ａの第２シリコン層２３０に、下端部が第２ベース部材１ｂの第２シリコン層２３０にそれぞれ接続されている。また、支持部９は、アクチュエータ３，４と並列に配置され、平面視で開口２をＸ方向で分割するように配置されている。また、支持部９は、第１シリコン層２１０で構成されたビーム５，６のＺ方向下方に所定の間隔、この場合は、絶縁層２２０の厚さに相当する分の間隔をあけて配置されている。 The support portion 9 is a member made of the second silicon layer 230. The upper end in the Y direction is formed on the second silicon layer 230 of the first base member 1a, and the lower end is formed on the second silicon layer 230 of the second base member 1b. Each is connected. The support portion 9 is arranged in parallel with the actuators 3 and 4, and is arranged so as to divide the opening 2 in the X direction in plan view. Further, the support portions 9 are arranged at predetermined intervals below the beams 5 and 6 formed of the first silicon layer 210 in the Z direction, in this case, at intervals corresponding to the thickness of the insulating layer 220. ing.
　第１電極１０１は、第１ベース部材１ａの上面に形成された金属膜であり、第２電極１０２は、第２ベース部材１ｂの上面に形成された金属膜である。当該金属膜として、例えば、Ａｕ／Ｔｉ膜を用いる。 The first electrode 101 is a metal film formed on the upper surface of the first base member 1a, and the second electrode 102 is a metal film formed on the upper surface of the second base member 1b. For example, an Au / Ti film is used as the metal film.
　［シャッタ装置の動作］
　続いて、このように構成されたシャッタ装置５００の動作について説明する。 [Operation of shutter device]
Next, the operation of the shutter device 500 configured as described above will be described.
　シャッタ装置５００は、第１電極１０１と第２電極１０２との間に電圧を印加することで駆動される。第１電極１０１と第２電極１０２との間に電圧が印加されると、第１ベース部材１ａ及び第２ベース部材１ｂを通じてアクチュエータ３及びアクチュエータ４に電流が流れる。このとき、シリコン素材でできたアクチュエータ３及びアクチュエータ４にジュール熱が発生し、アクチュエータ３及びアクチュエータ４は一瞬のうちに４００～５００℃に加熱される。 The shutter device 500 is driven by applying a voltage between the first electrode 101 and the second electrode 102. When a voltage is applied between the first electrode 101 and the second electrode 102, a current flows to the actuator 3 and the actuator 4 through the first base member 1a and the second base member 1b. At this time, Joule heat is generated in the actuators 3 and 4 made of the silicon material, and the actuators 3 and 4 are instantaneously heated to 400 to 500 ° C.
　アクチュエータ３は、加熱されることにより全長が伸びるように熱膨張する。アクチュエータ３の上端部３ａ及び下端部３ｃは固定部１により位置が固定されているため、中間部３ｂはあらかじめ突出している方向であるＸ方向左側へ押し出される。 (4) The actuator 3 thermally expands by being heated so that the entire length is extended. Since the positions of the upper end portion 3a and the lower end portion 3c of the actuator 3 are fixed by the fixing portion 1, the intermediate portion 3b is pushed to the left in the X direction, which is the direction in which the intermediate portion 3b protrudes in advance.
　アクチュエータ４もまた、加熱されることにより全長が伸びるように熱膨張する。アクチュエータ４の上端部４ａ及び下端部４ｃは固定部１により位置が固定されているため、中間部４ｂはあらかじめ突出している方向であるＸ方向右側へ押し出される。 (4) The actuator 4 also thermally expands by being heated so that the entire length is extended. Since the positions of the upper end portion 4a and the lower end portion 4c of the actuator 4 are fixed by the fixing portion 1, the intermediate portion 4b is pushed out to the right in the X direction, which is the direction in which the intermediate portion 4b protrudes in advance.
　アクチュエータ３の中間部３ｂがＸ方向左側へ押し出されると、それに接続されているビーム５が全体的にＸ方向左側へ引っ張られる。また、アクチュエータ４の中間部４ｂがＸ方向右側へ押し出されると、それに接続されているビーム６が全体的にＸ方向右側へ引っ張られる。すなわち、ビーム５の第１端部５ａ及びビーム６の第１端部６ｃは、互いに遠ざかる方向に相対位置が変化する。 When the intermediate portion 3b of the actuator 3 is pushed to the left in the X direction, the beam 5 connected to the intermediate portion 3b is pulled to the left in the X direction as a whole. Further, when the intermediate portion 4b of the actuator 4 is pushed rightward in the X direction, the beam 6 connected thereto is pulled entirely rightward in the X direction. That is, the relative positions of the first end 5a of the beam 5 and the first end 6c of the beam 6 change in directions away from each other.
　ビーム６が全体的にＸ方向右側へ引っ張られても、ビーム６の第１部材６ａはほとんど弾性変形しないため、ビーム６による引っ張り力のほとんどは第３端部６ｅに集中して第２部材６ｂをＸ方向右側へ押し出す力に変化する。この結果、並列配置されたビーム５及びビーム６の第２部材６ｂにおいて、ビーム５がＸ方向左側へ引っ張られ、ビーム６の第２部材６ｂがＸ方向右側へ押し出されることで、ビーム５の第２端部５ｂ及びビーム６の第４端部６ｆがＸＹ平面上で左斜め下へ駆動され、ビーム５及びビーム６の第２部材６ｂはそれぞれ異なる曲率で大きく湾曲又は屈曲し、ビーム６の第４端部６ｆが被駆動部材７を押す一方、ビーム５の第２端部５ｂが被駆動部材７を引くことで、被駆動部材７は、平面視で、サブマウント４００に設けられた光通過口４０１と重なる位置へ押し出される。 Even if the beam 6 is pulled to the right in the X direction as a whole, the first member 6a of the beam 6 hardly elastically deforms, so most of the pulling force by the beam 6 is concentrated on the third end 6e and the second member 6b To the right to push right in the X direction. As a result, in the second member 6b of the beam 5 and the beam 6 arranged in parallel, the beam 5 is pulled to the left in the X direction, and the second member 6b of the beam 6 is pushed to the right in the X direction. The second end 5b and the fourth end 6f of the beam 6 are driven obliquely downward to the left on the XY plane, and the second members 6b of the beam 5 and the beam 6 are largely bent or bent with different curvatures. The fourth end 6f pushes the driven member 7 while the second end 5b of the beam 5 pulls the driven member 7, so that the driven member 7 can pass through the light provided on the submount 400 in plan view. It is pushed out to a position overlapping the mouth 401.
　一方、第１電極１０１と第２電極１０２との間で電圧が印加されなくなると、アクチュエータ３及びアクチュエータ４に電流が流れなくなり、アクチュエータ３及びアクチュエータ４は急速に自然冷却され、それまで伸びていた全長が元に戻る。このとき、Ｘ方向左側へ押し出されていたアクチュエータ３の中間部３ｂはＸ方向右側へ引き戻され、また、Ｘ方向右側へ押し出されていたアクチュエータ４の中間部４ｂはＸ方向左側へ引き戻される。 On the other hand, when no voltage is applied between the first electrode 101 and the second electrode 102, no current flows through the actuators 3 and 4, and the actuators 3 and 4 are rapidly cooled naturally and extended up to that point. The full length is restored. At this time, the intermediate portion 3b of the actuator 3 pushed to the left in the X direction is pulled back to the right in the X direction, and the intermediate portion 4b of the actuator 4 pushed to the right in the X direction is pulled back to the left in the X direction.
　アクチュエータ３の中間部３ｂがＸ方向右側へ引き戻されると、それに接続されているビーム５が全体的にＸ方向右側へ引き戻される。また、アクチュエータ４の中間部４ｂがＸ方向左側へ引き戻されると、それに接続されているビーム６が全体的にＸ方向左側へ引き戻される。すなわち、ビーム５の第１端部５ａ及びビーム６の第１端部６ｃは、互いに近づく方向に相対位置が変化する。 When the intermediate portion 3b of the actuator 3 is pulled back to the right in the X direction, the beam 5 connected to the intermediate portion 3b is pulled back to the right in the X direction as a whole. When the intermediate portion 4b of the actuator 4 is pulled back to the left in the X direction, the beam 6 connected thereto is pulled back to the left in the X direction as a whole. That is, the relative position of the first end 5a of the beam 5 and the first end 6c of the beam 6 change in a direction approaching each other.
　ビーム６が全体的にＸ方向左側へ引き戻されても、ビーム６の第１部材６ａはほとんど弾性変形しないため、ビーム６による引き込み力のほとんどは第３端部６ｅに集中して第２部材６ｂをＸ方向左側へ引っ張る力に変化する。この結果、並列配置されたビーム５及びビーム６の第２部材６ｂにおいて、ビーム５がＸ方向右側へ押し込まれ、ビーム６の第２部材６ｂがＸ方向左側へ引っ張られることで、ビーム５の第２端部５ｂ及びビーム６の第４端部６ｆがＸＹ平面上で右斜め上へ押し戻され、湾曲又は屈曲していたビーム５及びビーム６の第２部材６ｂは元の略直線状に戻り、被駆動部材７は、図１に示すＸＹ平面上の位置に戻る。 Even if the beam 6 is entirely pulled back to the left in the X direction, the first member 6a of the beam 6 is hardly elastically deformed, so that most of the drawing force by the beam 6 is concentrated on the third end 6e and the second member 6b In the X direction to the left. As a result, in the second member 6b of the beam 5 and the beam 6 arranged in parallel, the beam 5 is pushed rightward in the X direction, and the second member 6b of the beam 6 is pulled leftward in the X direction. The second end 5b and the fourth end 6f of the beam 6 are pushed back obliquely rightward on the XY plane, and the curved or bent second member 6b of the beam 5 and the beam 6 returns to the original substantially linear shape, The driven member 7 returns to the position on the XY plane shown in FIG.
　なお、アクチュエータ３及びアクチュエータ４の屈曲または湾曲方向をそれぞれ反対にすることで、ビーム５が被駆動部材７を押す一方、ビーム６が被駆動部材７を引くようにしてもよい。 The beam 5 may push the driven member 7 while the beam 6 pulls the driven member 7 by reversing the bending or bending directions of the actuator 3 and the actuator 4.
　上記のように、第１電極１０１及び第２電極１０２への電圧印加（シャッタ装置５００の駆動状態）及び解除（シャッタ装置５００の被駆動状態）を切り替えることで、ＸＹ平面上における被駆動部材７の位置が切り替わる。このことにより、被駆動部材７は、図略の光路を遮断及び開通させるシャッタとして機能する。本実施形態では、被駆動部材７がアクチュエータ３及びアクチュエータ４によって駆動されていない状態で図略の光路を開通し、駆動された位置で当該光路を遮断するようにしているが、被駆動部材７がアクチュエータ３及びアクチュエータ４によって駆動されていない位置で図略の光路を遮断し、駆動された位置で当該光路を開通させてもよい。その場合は、サブマウント４００に設けられた光通過口４０１の位置が変更されることは言うまでもない。また、シャッタは、光路を遮断及び開通させる以外にも光路の一部を遮断及び開通させる光減衰器を含む概念である。 As described above, by switching the voltage application (the driving state of the shutter device 500) and the release (the driven state of the shutter device 500) to the first electrode 101 and the second electrode 102, the driven member 7 on the XY plane is switched. Is switched. Thus, the driven member 7 functions as a shutter that blocks and opens an optical path (not shown). In the present embodiment, an optical path (not shown) is opened in a state where the driven member 7 is not driven by the actuators 3 and 4, and the optical path is blocked at the driven position. May block an unillustrated optical path at a position not driven by the actuator 3 and the actuator 4 and open the optical path at a driven position. In that case, it goes without saying that the position of the light passage opening 401 provided in the submount 400 is changed. Further, the shutter is a concept including an optical attenuator that blocks and opens a part of the optical path in addition to blocking and opening the optical path.
　［シャッタ装置の製造方法］
　続いて、シャッタ装置５００の製造方法について説明する。図３Ａ～３Ｅは、本実施形態に係るシャッタ装置の製造工程を示す。なお、図３Ａ～３Ｅに描かれた各製造工程の図は、図２に示す断面図に対応する。 [Method of Manufacturing Shutter Device]
Subsequently, a method for manufacturing the shutter device 500 will be described. 3A to 3E show a manufacturing process of the shutter device according to the present embodiment. 3A to 3E correspond to the cross-sectional views shown in FIG.
　まず、図３Ａに示すように、第１シリコン層２１０、絶縁層２２０、及び第２シリコン層２３０からなるＳＯＩ基板２００を用意する。例えば、第１シリコン層２１０の厚さは３０μｍ、絶縁層２２０の厚さは１μｍ、第２シリコン層２３０の厚さは２５０μｍである。 First, as shown in FIG. 3A, an SOI substrate 200 including a first silicon layer 210, an insulating layer 220, and a second silicon layer 230 is prepared. For example, the thickness of the first silicon layer 210 is 30 μm, the thickness of the insulating layer 220 is 1 μm, and the thickness of the second silicon layer 230 is 250 μm.
　次に、図３Ｂに示すように第１シリコン層２１０をエッチング処理して、第１シリコン層２１０に、固定部１の原形、アクチュエータ３，４、ビーム５，６、被駆動部材７及び連結部材８を一体形成する。なお、図３Ｂでは、便宜上、これらの部材の一部のみ描かれている。また、ビーム６の第１部材６ａに設けられた肉抜き構造６ｇは、第１シリコン層２１０のエッチング時に同時に形成される。また、本実施形態において、ＳＯＩ基板２００に形成された複数の変位拡大機構５１０をチップに個片化するときに、レーザスクライブ法を用いる。この方法では、照射したレーザ光のエネルギーが単結晶シリコンに吸収される必要がある。第２シリコン層２３０にレーザ光を吸収させるため、この段階で、チップの分割領域にある第１シリコン層２１０もあわせて除去する。なお、個片化の方法は特にこれに限定されず、例えば、ダイシングによってもよいし、図３Ａ～図３Ｄに示す工程において、エッチングにより個片化を行ってもよい。 Next, as shown in FIG. 3B, the first silicon layer 210 is subjected to an etching process, and the original shape of the fixed portion 1, the actuators 3 and 4, the beams 5 and 6, the driven member 7, and the connecting member are formed on the first silicon layer 210. 8 are integrally formed. In FIG. 3B, only some of these members are illustrated for convenience. The lightening structure 6g provided on the first member 6a of the beam 6 is formed simultaneously with the etching of the first silicon layer 210. In the present embodiment, a laser scribe method is used when the plurality of displacement magnifying mechanisms 510 formed on the SOI substrate 200 are singulated into chips. In this method, the energy of the irradiated laser light needs to be absorbed by single crystal silicon. In order to make the second silicon layer 230 absorb laser light, the first silicon layer 210 in the divided region of the chip is also removed at this stage. The method of singulation is not particularly limited. For example, dicing may be performed, or singulation may be performed by etching in the steps shown in FIGS. 3A to 3D.
　さらに、第１ベース部材１ａの表面に第１電極１０１が形成され、第２ベース部材１ｂの表面に第２電極１０２が形成され、被駆動部材７の表面に金属膜７ａが形成される。第１及び第２電極１０１，１０２及び金属膜７ａは、例えば、厚さ２０ｎｍのＴｉ及び厚さ３００ｎｍのＡｕからなるＡｕ／Ｔｉ膜である。 {Circle around (1)} Further, the first electrode 101 is formed on the surface of the first base member 1a, the second electrode 102 is formed on the surface of the second base member 1b, and the metal film 7a is formed on the surface of the driven member 7. The first and second electrodes 101 and 102 and the metal film 7a are, for example, Au / Ti films made of 20 nm thick Ti and 300 nm thick Au.
　第１シリコン層２１０にシャッタ装置５００及び変位拡大機構５１０の原形が形成されると、次に、図３Ｃに示すように、第１シリコン層２１０にワックス７００でダミーウエハ８００を貼り合わせてシャッタ装置５００の裏面の層、すなわち、絶縁層２２０及び第２シリコン層２３０をエッチング処理する。なお、この場合、支持部９に対応する部分を残すために、図示しないマスクを第２シリコン層２３０の裏面の所定の位置に形成する。このエッチング処理により、固定部１にはＳＯＩ基板２００が残され、その他の可動部材であるアクチュエータ３、アクチュエータ４、ビーム５、ビーム６、被駆動部材部７及び連結部材８には第１シリコン層２１０のみが残される。また、支持部９には第２シリコン層２３０のみが残される。なお、図３Ｂに示す工程で、図示しないマスクを用いて、支持部９に対応する部分の絶縁層２２０を除去するようにしてもよい。 After the original shapes of the shutter device 500 and the displacement enlarging mechanism 510 are formed on the first silicon layer 210, the dummy device 800 is attached to the first silicon layer 210 with the wax 700 as shown in FIG. , That is, the insulating layer 220 and the second silicon layer 230 are etched. In this case, a mask (not shown) is formed at a predetermined position on the back surface of the second silicon layer 230 in order to leave a portion corresponding to the support portion 9. By this etching process, the SOI substrate 200 is left on the fixed portion 1, and the first silicon layer is formed on the other movable members such as the actuator 3, the actuator 4, the beam 5, the beam 6, the driven member 7 and the connecting member 8 Only 210 is left. Further, only the second silicon layer 230 is left on the support portion 9. In the step shown in FIG. 3B, a portion of the insulating layer 220 corresponding to the support portion 9 may be removed using a mask (not shown).
　次に、図３Ｄに示すように、ワックス７００及びダミーウエハ８００を除去する。また、変位拡大機構５１０が形成されたチップの個片化も行う。 Next, as shown in FIG. 3D, the wax 700 and the dummy wafer 800 are removed. In addition, the chip on which the displacement enlarging mechanism 510 is formed is singulated.
　最後に、図３Ｅに示すように、所定の位置に接着材３００が配置されたサブマウント４００の上に、変位拡大機構５１０が形成されたチップを配置し、接着材３００を介してサブマウント４００とチップとを接合する。なお、図１，２に示すように、接着材３００は固定部１のＺ方向下方に位置するようにサブマウント４００上に配置される。また、所定の荷重をかけてチップの裏面に接着材３００を接触させ、所定の温度、例えば、接着材３００がエポキシ系の熱硬化性樹脂であれば、１２０℃～１８０℃で接着材３００を熱硬化させることで、サブマウント４００とチップとを接合する。このようにして、シャッタ装置５００が完成する。 Finally, as shown in FIG. 3E, the chip on which the displacement enlarging mechanism 510 is formed is placed on the submount 400 on which the adhesive 300 is placed at a predetermined position, and the submount 400 is placed via the adhesive 300. And the chip. As shown in FIGS. 1 and 2, the adhesive 300 is disposed on the submount 400 so as to be located below the fixing unit 1 in the Z direction. Further, the adhesive 300 is brought into contact with the back surface of the chip by applying a predetermined load, and the adhesive 300 is heated at a predetermined temperature, for example, 120 ° C. to 180 ° C. if the adhesive 300 is an epoxy-based thermosetting resin. The submount 400 and the chip are joined by thermosetting. Thus, the shutter device 500 is completed.
　［効果等］
　以上説明したように、本実施形態に係るＭＥＭＳ素子である変位拡大機構５１０は、基板２００と、基板２００に設けられた固定部１と、固定部１に設けられた開口２と、両端が固定部１に接続されたアクチュエータ３と、両端が固定部１に接続され、アクチュエータ３と離間して設けられた別のアクチュエータ４と、を有している。また、変位拡大機構５１０は、基端側がアクチュエータ３に接続され、基板２００の上面と平行に延在するビーム５と、基端側が別のアクチュエータ４に接続され、基板の上面と平行に延在する別のビーム６と、ビーム５及び別のビーム６の先端側に接続された被駆動部材７と、を有している。 [Effects]
As described above, the displacement enlarging mechanism 510, which is the MEMS element according to the present embodiment, includes the substrate 200, the fixed portion 1 provided on the substrate 200, the opening 2 provided on the fixed portion 1, and both ends fixed. It has an actuator 3 connected to the unit 1 and another actuator 4 connected at both ends to the fixed unit 1 and separated from the actuator 3. In addition, the displacement magnifying mechanism 510 includes a beam 5 whose base end is connected to the actuator 3 and extends in parallel with the upper surface of the substrate 200, and a beam 5 whose base end is connected to another actuator 4 and extends in parallel with the upper surface of the substrate. And a driven member 7 connected to the distal end side of the beam 5 and the other beam 6.
　また、変位拡大機構５１０は、平面視で開口２を分割する一方、両端が固定部１に接続されてアクチュエータ３，４と並列に配置された支持部９を有しており、アクチュエータ３，４とビーム５，６と被駆動部材７と支持部９とは、平面視で開口２内に配置されている。 In addition, the displacement magnifying mechanism 510 has a support portion 9 which divides the opening 2 in a plan view and has both ends connected to the fixed portion 1 and arranged in parallel with the actuators 3 and 4. The beams 5, 6, the driven member 7, and the support portion 9 are arranged in the opening 2 in plan view.
　変位拡大機構５１０をこのように構成することで、開口２が形成された固定部１の剛性、特に、アクチュエータ３，４の延在方向であるＹ方向の剛性を高めることができる。また、固定部１の剛性が高められることにより、被駆動部材７が意図しない位置に変位するのを防止でき、入射光の光路の開通及び遮断に関し、シャッタ装置５００の性能が低下するのを抑制できる。このことについて、さらに説明する。 By configuring the displacement enlarging mechanism 510 in this manner, the rigidity of the fixed portion 1 in which the opening 2 is formed, particularly, the rigidity in the Y direction, which is the direction in which the actuators 3 and 4 extend, can be increased. In addition, since the rigidity of the fixed portion 1 is increased, the driven member 7 can be prevented from being displaced to an unintended position, and the performance of the shutter device 500 is prevented from deteriorating in opening and blocking the optical path of incident light. it can. This will be further described.
　前述したように、変位拡大機構５１０の固定部１に対して、アクチュエータ３，４の延在方向、この場合は、Ｙ方向に所定以上の応力が加わると、アクチュエータ３，４は、それぞれの全長が伸長または収縮するように変形する。特に、本実施形態に示すように、固定部１に開口２を設け、アクチュエータ３，４の両端がそれぞれ、開口２の内周縁に接続されている場合、固定部１との接続部分である両端部を除いて、アクチュエータ３，４を機械的に支持する構造がないため、固定部１に所定以上のＹ方向の応力が加わると、アクチュエータ３，４は容易に伸長または収縮しうる。 As described above, when a predetermined stress or more is applied to the fixed portion 1 of the displacement enlarging mechanism 510 in the extending direction of the actuators 3 and 4 in this case, in the Y direction, the actuators 3 and 4 have their full lengths. Deform so as to expand or contract. In particular, as shown in the present embodiment, when the opening 2 is provided in the fixed portion 1 and both ends of the actuators 3 and 4 are respectively connected to the inner peripheral edge of the opening 2, both ends which are connection portions with the fixed portion 1 Since there is no structure for mechanically supporting the actuators 3 and 4 except for the portions, the actuators 3 and 4 can easily expand or contract when a predetermined stress or more in the Y direction is applied to the fixed portion 1.
　固定部１に対してＹ方向の応力が加わる現象は、例えば、互いに熱膨張係数の異なる基板２００とサブマウント４００とを熱処理により接合する場合に起こりうる。また、基板２００の主要構成材料である単結晶シリコンとサブマウント４００との熱膨張係数が同程度であっても、単結晶シリコンと接着材３００との熱膨張係数が大きく異なる場合には、固定部１に対して、Ｙ方向に所定以上の応力が加わる場合もある。また、これらに限られず、外部からの衝撃により、一時的にでも、固定部１に対して、Ｙ方向に所定以上の応力が加わる場合もあることも前述したとおりである。特に、アクチュエータ３，４は、電流が流れることで発熱して延在方向であるＹ方向に熱膨張する熱式アクチュエータであるため、これらの全長の変化は、アクチュエータ３，４がそれぞれ所定量駆動されたことと同じ意味を持つ。つまり、アクチュエータ３，４の変位量が、ビーム５，６の運動によって拡大され、ビーム５，６の先端側に接続された被駆動部材７が所定の位置から変位してしまう。特に、本実施形態に示す変位拡大機構５１０は、アクチュエータ３，４にそれぞれ接続されたビーム５，６が並列配置部６００を有し、Ｘ方向の同じ側から、ビーム５，６によって互いに反対方向に力を受けることで、並列配置部６００の先端側に接続された被駆動部材７が変位する。このような変位拡大機構５１０では、アクチュエータ３，４が接続された固定部１が、応力等によりアクチュエータ３，４の延在方向へわずかに変形することでも、被駆動部材７の変位量が拡大されてしまう。 (4) A phenomenon in which a stress in the Y direction is applied to the fixing portion 1 can occur, for example, when the substrate 200 and the submount 400 having different thermal expansion coefficients are joined by heat treatment. Further, even if the single-crystal silicon, which is a main constituent material of the substrate 200, and the submount 400 have substantially the same thermal expansion coefficient, if the single-crystal silicon and the adhesive 300 have significantly different thermal expansion coefficients, the submount 400 may be fixed. There may be a case where a predetermined stress or more is applied to the portion 1 in the Y direction. Further, the present invention is not limited to these, and as described above, a stress greater than or equal to a predetermined value may be applied to the fixing portion 1 in the Y direction even temporarily due to an external impact. In particular, since the actuators 3 and 4 are thermal actuators that generate heat when a current flows and thermally expand in the Y direction, which is the extending direction, the change in their overall lengths is caused by the actuators 3 and 4 being driven by a predetermined amount, respectively. It has the same meaning as what was done. That is, the displacement of the actuators 3 and 4 is enlarged by the movement of the beams 5 and 6, and the driven member 7 connected to the distal ends of the beams 5 and 6 is displaced from a predetermined position. In particular, the displacement magnifying mechanism 510 shown in the present embodiment has the parallel arrangement portion 600 in which the beams 5 and 6 connected to the actuators 3 and 4, respectively, are arranged in the opposite directions by the beams 5 and 6 from the same side in the X direction. , The driven member 7 connected to the distal end side of the parallel arrangement portion 600 is displaced. In such a displacement enlargement mechanism 510, the displacement of the driven member 7 is increased even when the fixed portion 1 to which the actuators 3 and 4 are connected is slightly deformed in the extending direction of the actuators 3 and 4 due to stress or the like. Will be done.
　一方、本実施形態によれば、平面視で開口２を分割し、両端がそれぞれ固定部１に接続された支持部９をアクチュエータ３，４と並列に配置することで、応力によって固定部１がＹ方向に変形しようとするのを抑制することができる。このことにより、アクチュエータ３，４の全長が意図せずに変化するのを防止して、被駆動部材７を所定の位置に安定して保持することができる。 On the other hand, according to the present embodiment, the opening 2 is divided in a plan view, and the supporting portions 9 having both ends connected to the fixing portion 1 are arranged in parallel with the actuators 3 and 4, so that the fixing portion 1 is stressed. An attempt to deform in the Y direction can be suppressed. This prevents the lengths of the actuators 3 and 4 from unintentionally changing, and allows the driven member 7 to be stably held at a predetermined position.
　なお、支持部９は、開口２をＸ方向の略中央で分割するように配置されている。固定部１の第１ベース部材１ａ及び第２ベース部材１ｂのうち、Ｘ方向に延びる部分を一種の梁として見ると、両端が固定された梁が最も大きく変形するのは中央部分である。よって、この部分に対応した位置、つまり、開口２のＸ方向での略中央を通る位置に支持部９を配置することにより、応力によって固定部１が変形しようとするのを効果的に抑制することができる。ただし、開口２内での支持部９の配置は特にこれに限定されず、アクチュエータ３に寄った側に配置されていてもよいし、アクチュエータ４に寄った側に配置されていてもよい。固定部１のＹ方向の剛性を高められる位置に支持部９が配置されていればよい。 支持 Note that the support portion 9 is arranged so as to divide the opening 2 substantially at the center in the X direction. When the portion extending in the X direction of the first base member 1a and the second base member 1b of the fixing portion 1 is viewed as a kind of beam, the beam whose both ends are fixed is most greatly deformed in the central portion. Therefore, by disposing the support portion 9 at a position corresponding to this portion, that is, a position passing substantially in the center of the opening 2 in the X direction, the deformation of the fixed portion 1 due to stress is effectively suppressed. be able to. However, the arrangement of the support portion 9 in the opening 2 is not particularly limited thereto, and may be arranged on the side closer to the actuator 3 or on the side closer to the actuator 4. It is sufficient that the support portion 9 is disposed at a position where the rigidity of the fixed portion 1 in the Y direction can be increased.
　支持部９は、ビーム５，６と所定の間隔をあけてビーム５，６のＺ方向下方に設けられている。このことにより、アクチュエータ３，４によってビーム５，６がそれぞれ駆動された場合にも、ビーム５，６の動きが妨げられることがない。よって、被駆動部材７を所望の量、変位させることができる。 The support 9 is provided below the beams 5 and 6 in the Z direction at a predetermined interval from the beams 5 and 6. Thus, even when the beams 5 and 6 are driven by the actuators 3 and 4, respectively, the movement of the beams 5 and 6 is not hindered. Therefore, the driven member 7 can be displaced by a desired amount.
　また、変位拡大機構５１０を構成する基板２００は、第１シリコン層２１０と絶縁層２２０と第２シリコン層２３０とがこの順で積層されてなり、ビーム５，６及びアクチュエータ３，４は第１シリコン層２１０で構成される一方、支持部９は第２シリコン層２３０で構成されている。このことにより、支持部９を所定の間隔をあけてビーム５，６のＺ方向下方に容易に配置することができる。 Further, the substrate 200 constituting the displacement magnifying mechanism 510 has a first silicon layer 210, an insulating layer 220, and a second silicon layer 230 laminated in this order, and the beams 5, 6 and the actuators 3, 4 On the other hand, the supporting portion 9 is constituted by the second silicon layer 230 while being constituted by the silicon layer 210. Thus, the supporting portions 9 can be easily arranged at a predetermined interval below the beams 5 and 6 in the Z direction.
　また、本実施形態の変位拡大機構５１０には、基板２００を支持する支持部材であるサブマウント４００と、固定部１の下面とサブマウント４００の上面との間に設けられ、基板２００とサブマウント４００とを接合する接合部材である接着材３００とをさらに含んでいてもよい。 Further, the displacement magnifying mechanism 510 of the present embodiment is provided between the lower surface of the fixed part 1 and the upper surface of the submount 400, and a submount 400 which is a support member for supporting the substrate 200. The bonding material 400 may further include an adhesive 300 that is a bonding member that bonds the bonding material 400 to the bonding material 400.
　サブマウント４００と基板２００との熱膨張係数に差があると、基板２００に設けられた固定部１に応力が加わって変形しやすくなるが、本実施形態によれば、支持部９によって固定部１の剛性を高めることで、アクチュエータ３，４の全長が意図せずに変化するのを防止して、被駆動部材７を所定の位置に安定して保持することができる。 If there is a difference in the coefficient of thermal expansion between the submount 400 and the substrate 200, stress is applied to the fixing portion 1 provided on the substrate 200, and the fixing portion 1 is easily deformed. By increasing the rigidity of the actuator 1, it is possible to prevent the total length of the actuators 3 and 4 from being changed unintentionally, and to stably hold the driven member 7 at a predetermined position.
　また、本実施形態に係るシャッタ装置５００は、上記の変位拡大機構（ＭＥＭＳ素子）５１０と、固定部１の第１ベース部材１ａの上面に配設され、アクチュエータ３，４の上端部３ａ，４ａのそれぞれに電気的に接続された第１電極１０１と、固定部１の第２ベース部材１ｂの上面に配設され、アクチュエータ３，４の下端部３ｃ，４ｃのそれぞれに電気的に接続された第２電極１０２と、を備え、被駆動部材７で光路を遮断及び開通させる。 Further, the shutter device 500 according to the present embodiment is provided on the upper surface of the first base member 1a of the fixed portion 1 and the displacement enlargement mechanism (MEMS element) 510, and the upper end portions 3a and 4a of the actuators 3 and 4. The first electrode 101 is electrically connected to each of the first and second base members 1b of the fixed part 1, and is electrically connected to the lower ends 3c and 4c of the actuators 3 and 4, respectively. And the second electrode 102, and the driven member 7 blocks and opens the optical path.
　シャッタ装置５００をこのように構成することで、第１電極１０１と第２電極１０２との間に電圧が印加されると、アクチュエータ３，４がそれぞれ駆動し、アクチュエータ３，４に接続されたビーム５，６を介して被駆動部材７が変位することで、被駆動部材７の変位量を大きくでき、所定の光路を確実に開通及び遮断することができる。また、被駆動部材７を所定の位置に安定して保持できるため、入射光の光路の開通及び遮断性能を高く維持できる。また、このようなシャッタ装置５００を、光波長多重伝送装置等に組み込まれる可変光減衰器（ＶＯＡ：Variable Optical Attenuator）に用いると、所定の要求仕様に従って、ＶＯＡを通過する光の全部または一部を開通及び遮断できるため、高性能の光波長多重伝送装置等を実現できる。 With this configuration of the shutter device 500, when a voltage is applied between the first electrode 101 and the second electrode 102, the actuators 3 and 4 are driven, respectively, and the beam connected to the actuators 3 and 4 When the driven member 7 is displaced via the switches 5 and 6, the displacement amount of the driven member 7 can be increased, and a predetermined optical path can be reliably opened and blocked. Further, since the driven member 7 can be stably held at a predetermined position, the opening and blocking performance of the optical path of the incident light can be maintained high. Further, when such a shutter device 500 is used in a variable optical attenuator (VOA) incorporated in an optical wavelength division multiplex transmission device or the like, all or a part of light passing through the VOA according to a predetermined required specification. Can be opened and closed, so that a high-performance optical wavelength division multiplexing transmission device or the like can be realized.
　＜変形例１＞
　図４は、本変形例に係るシャッタ装置の平面図を示す。なお、本変形例において、実施形態１と同様の箇所については、同一の符号を付して詳細な説明を省略する。 <Modification 1>
FIG. 4 is a plan view of the shutter device according to the present modification. In this modification, the same parts as those in the first embodiment are denoted by the same reference numerals, and detailed description is omitted.
　図４に示す本変形例に係る構成と、実施形態１に示す構成とでは、開口２内に配置されたアクチュエータの個数及びビーム５の基端が第１ベース部材１ａに接続されている点で異なる。 The configuration according to the present modification illustrated in FIG. 4 and the configuration according to the first embodiment differ in that the number of actuators arranged in the opening 2 and the base end of the beam 5 are connected to the first base member 1a. different.
　このように、シャッタ装置５００において、アクチュエータ３を省略してもよい。この場合にも、アクチュエータ４に駆動されたビーム６が被駆動部材７を押し、連結部材８を介してアクチュエータ４からの駆動力を受けたビーム５が被駆動部材７を引くことで、被駆動部材７は、平面視で、サブマウント４００に設けられた光通過口４０１と重なる位置へ押し出される。また、支持部９によって、固定部１のＹ方向の剛性を高められ、アクチュエータ４の全長が意図せずに変化するのを防止して、被駆動部材７を所定の位置に安定して保持することができる。 As described above, in the shutter device 500, the actuator 3 may be omitted. Also in this case, the beam 6 driven by the actuator 4 pushes the driven member 7, and the beam 5 receiving the driving force from the actuator 4 via the connecting member 8 pulls the driven member 7, thereby driving the driven member 7. The member 7 is pushed out to a position overlapping with the light passage opening 401 provided in the submount 400 in plan view. In addition, the rigidity of the fixed portion 1 in the Y direction is increased by the support portion 9 to prevent the entire length of the actuator 4 from being unintentionally changed, and to stably hold the driven member 7 at a predetermined position. be able to.
　なお、ビーム５の第１端部５ａを第１ベース部材１ａではなく第２ベース部材１ｂに接続してもよい。また、図示しないが、アクチュエータ３の代わりにアクチュエータ４を省略してもよい。この場合にも、アクチュエータ３の全長が意図せずに変化するのを防止して、被駆動部材７を所定の位置に安定して保持することができる。なお、アクチュエータ４が省略される場合には、ビーム６の第１端部６ｃが第１ベース部材１ａまたは第２ベース部材１ｂに接続される。また、この場合に、ビーム６は発熱する部材に直接接続されておらず、放熱をあまり考慮しなくてもよいため、第１部材６ａにおける肉抜き構造６ｇは形成されていなくてもよい。 The first end 5a of the beam 5 may be connected to the second base member 1b instead of the first base member 1a. Although not shown, the actuator 4 may be omitted in place of the actuator 3. Also in this case, the driven member 7 can be stably held at a predetermined position by preventing the overall length of the actuator 3 from being changed unintentionally. When the actuator 4 is omitted, the first end 6c of the beam 6 is connected to the first base member 1a or the second base member 1b. Further, in this case, the beam 6 is not directly connected to the member that generates heat, and heat radiation does not need to be considered so much. Therefore, the lightening structure 6g in the first member 6a may not be formed.
　なお、本変形例において、第２ベース部材１ｂの下面とサブマウント４００との間に接着材３００を設けていないが、図１に示すように、当該箇所に接着材３００を設けてもよい。 In this modification, the adhesive 300 is not provided between the lower surface of the second base member 1b and the submount 400. However, as shown in FIG. 1, the adhesive 300 may be provided at the corresponding location.
　（実施形態２）
　図５は、本実施形態に係るシャッタ装置の平面図を、図６は、シャッタ装置の要部の斜視図をそれぞれ示し、図７は、図６の破線で囲まれた部分の拡大図を示す。なお、本実施形態において、実施形態１と同様の箇所については、同一の符号を付して詳細な説明を省略する。 (Embodiment 2)
5 is a plan view of the shutter device according to the present embodiment, FIG. 6 is a perspective view of a main part of the shutter device, and FIG. 7 is an enlarged view of a portion surrounded by a broken line in FIG. . In the present embodiment, the same parts as those in the first embodiment are denoted by the same reference numerals, and detailed description is omitted.
　本実施形態に示す構成と実施形態１に示す構成とでは、まず、固定部１０に設けられた開口２０が第１支持部１６１によって第１開口２１と第２開口２２とに分割されている点で異なる。なお、第１～第４アクチュエータ３０，９０，４０，１１０、第１～第４ビーム５０，１２０，６０，１３０、第１及び第２被駆動部材７０，１４０は、それぞれ図２に示す第１シリコン層２１０で構成されている。また、図示しないが、第１被駆動部材７０の上面全体及び第２被駆動部材１４０の上面全体には、図２に示す金属膜７ａに相当する金属膜が形成されている。なお、以降の説明において、第１被駆動部材７０を被駆動部材７０と呼ぶことがある。 In the configuration shown in the present embodiment and the configuration shown in the first embodiment, first, the opening 20 provided in the fixing portion 10 is divided into the first opening 21 and the second opening 22 by the first support portion 161. Different. The first to fourth actuators 30, 90, 40, 110, the first to fourth beams 50, 120, 60, 130, and the first and second driven members 70, 140 are respectively the first and second driven members 70, 140 shown in FIG. It is composed of a silicon layer 210. Although not shown, a metal film corresponding to the metal film 7a shown in FIG. 2 is formed on the entire upper surface of the first driven member 70 and the entire upper surface of the second driven member 140. In the following description, the first driven member 70 may be referred to as a driven member 70.
　固定部１０は、第１ベース部材１１及び第２ベース部材１２と、これらとＹ方向に対向して配置された第３ベース部材１３とを有している。第１～第３ベース部材１１～１３は、実施形態１に示す第１ベース部材１ａ及び第２ベース部材１ｂと同様に、周縁部を除いて第２シリコン層２３０と絶縁層２２０と第１シリコン層２１０とがこの順に積層されてなる。なお、第１ベース部材１１及び第２ベース部材１２は、第１シリコン層２１０においてそれぞれＸ方向に分かれているが、絶縁層２２０及び第２シリコン層２３０では１つに繋がっている。また、第１ベース部材１１と第３ベース部材１３及び第２ベース部材１２と第３ベース部材２３０は、第１シリコン層２１０においてそれぞれＹ方向に分かれているが、絶縁層２２０及び第２シリコン層２３０では１つに繋がっている。このため、第１～第３ベース部材１１～１３の相対位置は固定されており、第１～第３ベース部材１１～１３で変位拡大機構５２０内の可動部材を支持することができる。また、固定部１０は、可動部材の可動域を確保しつつできるだけ広い面積を占めるような形状にされていることで、可動部材を支持するフレームとして機能している。 The fixing portion 10 has a first base member 11 and a second base member 12, and a third base member 13 arranged to face these in the Y direction. The first to third base members 11 to 13 are similar to the first base member 1a and the second base member 1b described in the first embodiment except for the peripheral portion, except for the second silicon layer 230, the insulating layer 220, and the first silicon member. The layers 210 are stacked in this order. Note that the first base member 11 and the second base member 12 are separated in the X direction in the first silicon layer 210, but are connected together in the insulating layer 220 and the second silicon layer 230. The first base member 11 and the third base member 13, and the second base member 12 and the third base member 230 are separated in the Y direction in the first silicon layer 210, but are separated in the insulating layer 220 and the second silicon layer. In 230, they are connected to one. Therefore, the relative positions of the first to third base members 11 to 13 are fixed, and the first to third base members 11 to 13 can support the movable member in the displacement enlarging mechanism 520. In addition, the fixed portion 10 functions as a frame that supports the movable member by being shaped so as to occupy as large an area as possible while securing the movable range of the movable member.
　また、前述したように、第１ベース部材１１の第１シリコン層２１０は、第２ベース部材１２の第１シリコン層２１０とＸ方向で、第３ベース部材２３０の第１シリコン層２１０とＹ方向でそれぞれ物理的に分離されている。従って、第１ベース部材１１の上面に配設された第１電極１７１と、第２ベース部材１２の上面に配設された第２電極１７２と、第３ベース部材１３の上面に配設された第３電極１７３とは、互いに電気的に絶縁分離されている。 Also, as described above, the first silicon layer 210 of the first base member 11 is in the X direction with the first silicon layer 210 of the second base member 12 and in the Y direction with the first silicon layer 210 of the third base member 230. Are physically separated from each other. Accordingly, the first electrode 171 provided on the upper surface of the first base member 11, the second electrode 172 provided on the upper surface of the second base member 12, and the first electrode 171 provided on the upper surface of the third base member 13. The third electrode 173 is electrically insulated and separated from each other.
　第１支持部１６１は、一端が第１ベース部材１１と第２ベース部材１２との境界部に、他端が第３ベース部材１３にそれぞれ接続され、開口２０を第１開口２１と第２開口２２とに分割している。第１支持部１６１はＹ方向に延在した部材であり、その大部分は基板２００と同じ構造、つまり、第２シリコン層２３０と絶縁層２２０と第１シリコン層２１０との積層構造である。ただし、図６，７に示すように、第１ベース部材１１と第２ベース部材１２との境界部に接続されたＹ方向上端部では、第１シリコン層２１０が除去されており、絶縁層２２０と第２シリコン層２３０との２層構造となっている。よって、第１支持部１６１は、第１ベース部材１１の第１シリコン層２１０及び第２ベース部材１２の第１シリコン層２１０と物理的に分離されている。このことにより、第１支持部１６１は、第１ベース部材１１の上面に配設された第１電極１７１と電気的に絶縁されている。同様に、第１支持部１６１は、第２ベース部材１２の上面に配設された第２電極１７２と電気的に絶縁されている。 The first support portion 161 has one end connected to the boundary between the first base member 11 and the second base member 12 and the other end connected to the third base member 13, and forms the opening 20 with the first opening 21 and the second opening 21. 22. The first supporting portion 161 is a member extending in the Y direction, and most of the member has the same structure as the substrate 200, that is, a laminated structure of the second silicon layer 230, the insulating layer 220, and the first silicon layer 210. However, as shown in FIGS. 6 and 7, at the upper end in the Y direction connected to the boundary between the first base member 11 and the second base member 12, the first silicon layer 210 is removed, and the insulating layer 220 is removed. And a second silicon layer 230. Therefore, the first support portion 161 is physically separated from the first silicon layer 210 of the first base member 11 and the first silicon layer 210 of the second base member 12. Thus, the first support portion 161 is electrically insulated from the first electrode 171 provided on the upper surface of the first base member 11. Similarly, the first support 161 is electrically insulated from the second electrode 172 provided on the upper surface of the second base member 12.
　なお、後述する第１アクチュエータ３０や第２アクチュエータ９０が駆動されたとき、それらの中間部の変位を妨げないように、第１支持部１６１と第１アクチュエータ３０（以下、アクチュエータ３０と呼ぶことがある。）とのＸ方向の間隔及び第１支持部１６１と第２アクチュエータ９０とのＸ方向の間隔は、それぞれ適切に設定する必要がある。なお、本実施形態において、第１支持部１６１と第１アクチュエータ３０とのＸ方向の間隔及び第１支持部１６１と第２アクチュエータ９０とのＸ方向の間隔はそれぞれ同じであるが、これらの間隔を互いに異なるようにしてもよい。 When the first actuator 30 and the second actuator 90, which will be described later, are driven, the first support portion 161 and the first actuator 30 (hereinafter, referred to as the actuator 30) so as not to hinder the displacement of their intermediate portions. The distance between the first support portion 161 and the second actuator 90 in the X direction needs to be set appropriately. In the present embodiment, the distance between the first support 161 and the first actuator 30 in the X direction and the distance between the first support 161 and the second actuator 90 in the X direction are the same. May be different from each other.
　次に異なるのは、第１開口２１内、第２開口２２内にそれぞれ一組のアクチュエータと一組のビームと被駆動部材とがセットとなって配置されている点である。例えば、第１開口２１内には、両端が固定部１０に接続された第１アクチュエータ３０と、基端側が第１アクチュエータ３０の中間部に接続され、Ｘ方向左側に延びてＹ方向下側に折り返された第１部材５１と、第１部材５１のＸ方向左側端部からＸ方向右側に延びる第２部材５２とを有する第１ビーム５０とが配置されている。また、第１開口２１内には、両端が固定部１０に接続されるとともに、第１ビーム５０を挟んで第１アクチュエータと反対側に対向して設けられた第３アクチュエータ４０と、基端側が第３アクチュエータ４０の中間部に接続され、Ｙ方向に第１ビーム５０の第２部材５２と離間し、かつ第２部材５２と並列に配置される一方、基板２００の上面と平行に延在する第３ビーム６０と、が配置されている。さらに、第１開口２１内には、第１ビーム５０及び第３ビーム６０の先端側に接続された第１被駆動部材７０と、第１ビーム５０と第３ビーム６０とを連結する第１連結部材８０が配置されている。また、サブマウント４００には、第１開口２１と連通した第１光通過口４０１が設けられている。 The second difference is that a set of actuators, a set of beams, and a driven member are arranged in the first opening 21 and the second opening 22, respectively. For example, in the first opening 21, the first actuator 30 whose both ends are connected to the fixed portion 10, and the base end side is connected to the intermediate portion of the first actuator 30, and extends to the left in the X direction and extends downward in the Y direction. A first beam 50 having a folded first member 51 and a second member 52 extending rightward in the X direction from the left end in the X direction of the first member 51 is disposed. In the first opening 21, both ends are connected to the fixed portion 10, and a third actuator 40 provided opposite to the first actuator with the first beam 50 interposed therebetween is provided with a base end side. It is connected to an intermediate portion of the third actuator 40, is spaced apart from the second member 52 of the first beam 50 in the Y direction, and is arranged in parallel with the second member 52, while extending in parallel with the upper surface of the substrate 200. The third beam 60 is disposed. Further, in the first opening 21, a first driven member 70 connected to the distal ends of the first beam 50 and the third beam 60, and a first connection that connects the first beam 50 and the third beam 60. A member 80 is arranged. Further, the submount 400 is provided with a first light passage opening 401 communicating with the first opening 21.
　第１開口２１内に配置された各種部材は、それぞれ、図１に示すシャッタ装置５００の開口２内に配置された部材に対応している。例えば、第１アクチュエータ３０はアクチュエータ４に、第３アクチュエータ４０はアクチュエータ３にそれぞれ対応している。また、第１ビーム５０はビーム６に、第３ビーム６０はビーム５に、第１被駆動部材７０は被駆動部材７に、第１連結部材８０は連結部材８にそれぞれ対応している。また、対応関係にある部材間で、各部材が有する機能は同じである。従って、第１電極１７１と第３電極１７３との間に電圧が印加されると、第１及び第３アクチュエータ３０，４０にそれぞれ電流が流れ、第１アクチュエータ３０の中間部はＸ方向右側に押し出され、第３アクチュエータ４０の中間部はＸ方向左側に押し出される。このことにより、第１ビーム５０は第１被駆動部材７０をＸ方向右側に押し、第３ビーム６０は第１被駆動部材７０をＸ方向左側に引くように駆動する。その結果、第１被駆動部材７０は、斜め左下に変位し、平面視で、サブマウント４００に設けられた第１光通過口４０１と重なる位置へ押し出される。 各種 The various members arranged in the first opening 21 respectively correspond to the members arranged in the opening 2 of the shutter device 500 shown in FIG. For example, the first actuator 30 corresponds to the actuator 4, and the third actuator 40 corresponds to the actuator 3. The first beam 50 corresponds to the beam 6, the third beam 60 corresponds to the beam 5, the first driven member 70 corresponds to the driven member 7, and the first connecting member 80 corresponds to the connecting member 8, respectively. Further, the functions of each member are the same between the members in the corresponding relationship. Therefore, when a voltage is applied between the first electrode 171 and the third electrode 173, a current flows through each of the first and third actuators 30, 40, and the intermediate portion of the first actuator 30 is pushed rightward in the X direction. As a result, the intermediate portion of the third actuator 40 is pushed to the left in the X direction. Thus, the first beam 50 pushes the first driven member 70 rightward in the X direction, and the third beam 60 drives the first driven member 70 to pull leftward in the X direction. As a result, the first driven member 70 is displaced obliquely to the lower left, and is pushed out to a position overlapping the first light passage opening 401 provided in the submount 400 in plan view.
　一方、第２開口２２内には、第１開口２１内に配置された各種部材とそれぞれ対応する部材が、第１支持部１６１に対して線対称に配置されている。例えば、第２開口２２内には、第２アクチュエータ９０が第１支持部１６１に対して第１アクチュエータ３０と線対称に配置されている。同様に、第２開口２２内には、第１支持部１６１に対して第４アクチュエータ１１０が第３アクチュエータ４０と線対称に、第２ビーム１２０が第１ビーム５０と線対称に、第４ビーム１３０が第３ビーム６０と線対称にそれぞれ配置されている。また、第１支持部１６１に対して第２被駆動部材１４０が第１被駆動部材７０と線対称に、第２連結部材１５０が第１連結部材８０と線対称にそれぞれ配置されている。さらに、サブマウント４００には、第２光通過口４０２が第１支持部１６１に対して第１光通過口４０１と線対称に設けられている。また、図５，６から明らかなように、第１被駆動部材７０と第２被駆動部材１４０とは、第１支持部１６１とＸ方向に所定の同じ間隔をあけてそれぞれ配置されている。また、別の見方をすると、第１被駆動部材７０と第２被駆動部材１４０とは、第１支持部１６１を挟んで、かつ第１支持部１６１に近接してそれぞれ配置されている。なお、本実施形態において、第１支持部１６１と第１被駆動部材７０とのＸ方向の間隔及び第１支持部１６１と第２被駆動部材１４０とのＸ方向の間隔はそれぞれ同じであるが、これらの間隔を互いに異なるようにしてもよい。また、第１光通過口４０１の中心と第２光通過口４０２の中心とのＸ方向の間隔は数百μｍ～１ｍｍ程度に設定されており、第１光通過口４０１及び第２光通過口４０２の直径はそれぞれ数百μｍ程度、例えば、２５０μｍ程度に設定されている。 On the other hand, in the second opening 22, members corresponding to the various members arranged in the first opening 21 are arranged symmetrically with respect to the first support portion 161. For example, in the second opening 22, the second actuator 90 is disposed symmetrically with the first actuator 30 with respect to the first support 161. Similarly, in the second opening 22, the fourth actuator 110 is line-symmetric with the third actuator 40, the second beam 120 is line-symmetric with the first beam 50, and the fourth beam 130 are arranged in line symmetry with the third beam 60, respectively. Further, the second driven member 140 is disposed symmetrically with the first driven member 70 and the second connecting member 150 is disposed symmetrically with the first connecting member 80 with respect to the first support portion 161. Further, a second light passage 402 is provided on the submount 400 in line symmetry with the first light passage 401 with respect to the first support 161. As is clear from FIGS. 5 and 6, the first driven member 70 and the second driven member 140 are arranged at the same predetermined intervals in the X direction with respect to the first support 161. From another point of view, the first driven member 70 and the second driven member 140 are arranged with the first support portion 161 interposed therebetween and close to the first support portion 161. In the present embodiment, the distance between the first support portion 161 and the first driven member 70 in the X direction and the distance between the first support portion 161 and the second driven member 140 in the X direction are the same. , These intervals may be different from each other. The distance between the center of the first light passage 401 and the center of the second light passage 402 in the X direction is set to about several hundred μm to 1 mm, and the first light passage 401 and the second light passage The diameter of each of 402 is set to about several hundred μm, for example, about 250 μm.
　また、第１支持部１６１に対して互いに線対称となる配置関係にある部材間では、各部材が有する機能は同様である。ただし、各部材の駆動及び変位方向は第１支持部１６１に対して反転している。従って、第２電極１７２と第３電極１７３との間に電圧が印加されると、第２及び第４アクチュエータ９０，１１０にそれぞれ電流が流れ、第２アクチュエータ９０の中間部はＸ方向左側に押し出され、第４アクチュエータ１１０の中間部はＸ方向右側に押し出される。このことにより、第２ビーム１２０は第２被駆動部材１４０をＸ方向左側に押し、第４ビーム１３０は第２被駆動部材１４０をＸ方向右側に引くように駆動する。その結果、第２被駆動部材１４０は、斜め右下に変位し、平面視で、サブマウント４００に設けられた第２光通過口４０２と重なる位置へ押し出される。 機能 In addition, the functions of each member are the same between members that are disposed in line symmetry with respect to the first support portion 161. However, the driving and displacement directions of each member are reversed with respect to the first support 161. Therefore, when a voltage is applied between the second electrode 172 and the third electrode 173, a current flows through the second and fourth actuators 90 and 110, respectively, and the intermediate portion of the second actuator 90 is pushed to the left in the X direction. As a result, the intermediate portion of the fourth actuator 110 is pushed rightward in the X direction. Thus, the second beam 120 pushes the second driven member 140 to the left in the X direction, and the fourth beam 130 drives the second driven member 140 to pull to the right in the X direction. As a result, the second driven member 140 is displaced obliquely to the lower right, and is pushed out to a position overlapping with the second light passage opening 402 provided in the submount 400 in plan view.
　以上説明したように、本実施形態に係るＭＥＭＳ素子である変位拡大機構５２０は、基板２００と、基板２００に設けられた固定部１０と、両端が固定部１０に接続され、開口２０を第１開口２１と第２開口とに分割する第１支持部１６１と、を有している。平面視で第１開口２１内に、両端が固定部１０に接続された第１アクチュエータ３０（アクチュエータ３０）と、両端が固定部１０に接続され、第１アクチュエータ３０と離間して設けられた第３アクチュエータ４０と、が配置されている。また、平面視で第１開口２１内に、基端側が第１アクチュエータ３０に接続され、基板２００の上面と平行に延在する第１ビーム５０と、基端側が第３アクチュエータ４０に接続され、基板２００の上面と平行に延在する第３ビーム６０と、第１ビーム５０及び第３ビーム６０の先端側に接続された第１被駆動部材７０（被駆動部材７０）と、が配置されている。 As described above, the displacement magnifying mechanism 520, which is the MEMS element according to the present embodiment, includes the substrate 200, the fixing portion 10 provided on the substrate 200, and both ends connected to the fixing portion 10, and the opening 20 is formed in the first position. It has a first support portion 161 divided into an opening 21 and a second opening. A first actuator 30 (actuator 30) having both ends connected to the fixed portion 10 and a second end connected to the fixed portion 10 and provided separately from the first actuator 30 in the first opening 21 in plan view. And three actuators 40. In the first opening 21 in plan view, the base end is connected to the first actuator 30, the first beam 50 extending parallel to the upper surface of the substrate 200, and the base end is connected to the third actuator 40, A third beam 60 extending in parallel with the upper surface of the substrate 200, and a first driven member 70 (driven member 70) connected to the first beam 50 and the distal end side of the third beam 60 are arranged. I have.
　また、平面視で第２開口２２内に、両端が固定部１０に接続された第２アクチュエータ９０と、両端が固定部１０に接続され、第２アクチュエータ９０と離間して設けられた第４アクチュエータ１１０と、が配置されている。また、平面視で第２開口２２内に、基端側が第２アクチュエータ９０に接続され、基板２００の上面と平行に延在する第２ビーム１２０と、基端側が第４アクチュエータ１１０に接続され、基板２００の上面と平行に延在する第４ビーム１３０と、第２ビーム１２０及び第４ビーム１３０の先端側に接続された第２被駆動部材１４０と、が配置されている。また、第２及び第４アクチュエータ９０，１１０と、第２及び第４ビーム１２０，１３０と、第２被駆動部材１４０とは、平面視で第２開口２２内に配置されている。第１支持部１６１は、平面視で第１ビーム５０及び第２ビーム１２０と交差するＹ方向に延在している。 In addition, a second actuator 90 having both ends connected to the fixed portion 10 and a fourth actuator having both ends connected to the fixed portion 10 and provided separately from the second actuator 90 in the second opening 22 in plan view. 110 and are arranged. Further, in the second opening 22 in plan view, the base end side is connected to the second actuator 90, the second beam 120 extending parallel to the upper surface of the substrate 200, and the base end side is connected to the fourth actuator 110, A fourth beam 130 extending parallel to the upper surface of the substrate 200, and a second beam 120 and a second driven member 140 connected to the tip end of the fourth beam 130 are arranged. Further, the second and fourth actuators 90 and 110, the second and fourth beams 120 and 130, and the second driven member 140 are arranged in the second opening 22 in plan view. The first support 161 extends in the Y direction that intersects the first beam 50 and the second beam 120 in plan view.
　本実施形態の変位拡大機構５２０によれば、平面視で開口２０を第１開口２１と第２開口２２とに分割する第１支持部１６１を設けることで、固定部１０の剛性、特に、第１～第４アクチュエータ３０，９０，４０，１１０の延在方向であるＹ方向の剛性を高めることができる。また、固定部１０の剛性が高められることにより、実施形態１に示すのと同様に、第１及び第２被駆動部材７０、１４０がそれぞれ意図しない位置に変位するのを防止でき、入射光の光路の開通及び遮断に関し、シャッタ装置５００の性能が低下するのを抑制できる。 According to the displacement magnifying mechanism 520 of the present embodiment, the rigidity of the fixed portion 10, particularly, the first support portion 161 that divides the opening 20 into the first opening 21 and the second opening 22 in plan view, is provided. The rigidity in the Y direction, which is the direction in which the first to fourth actuators 30, 90, 40, 110 extend, can be increased. Also, by increasing the rigidity of the fixing portion 10, similarly to the first embodiment, the first and second driven members 70 and 140 can be prevented from being displaced to unintended positions, respectively, and the incident light can be prevented. Regarding opening and closing of the optical path, it is possible to suppress a decrease in performance of the shutter device 500.
　また、基板２００は、実施形態１に示すのと同様に、第１シリコン層２１０と絶縁層２２０と第２シリコン層２３０とがこの順で積層された積層構造であり、第１～第４ビーム５０，１２０，６０，１３０と第１～第４アクチュエータ３０，９０，４０，１１０とはそれぞれ第１シリコン層２１０で構成されている。一方、第１支持部１６１は固定部１０に接続された一端部、具体的には、第１ベース部材１１と第２ベース部材１２との境界部に接続されたＹ方向上端部を除いて、基板２００と同じ積層構造である。また、第１支持部１６１のＹ方向上端部は、第１シリコン層２１０が除去されており、第２シリコン層２３０と絶縁層２２０とが積層されてなる。 The substrate 200 has a laminated structure in which a first silicon layer 210, an insulating layer 220, and a second silicon layer 230 are laminated in this order, as in the first embodiment, and the first to fourth beams are formed. 50, 120, 60, 130 and the first to fourth actuators 30, 90, 40, 110 are each formed of a first silicon layer 210. On the other hand, the first support portion 161 is connected to the fixed portion 10 at one end, specifically, except for the upper end in the Y direction connected to the boundary between the first base member 11 and the second base member 12, It has the same laminated structure as the substrate 200. In addition, the first silicon layer 210 is removed from the upper end in the Y direction of the first support portion 161, and the second silicon layer 230 and the insulating layer 220 are stacked.
　本実施形態によれば、第１支持部１６１の大部分が基板２００と同じ積層構造であるため、例えば、実施形態１に示す支持部９よりも強固な構造となり、固定部１０のＹ方向の剛性を高めることができる。また、第１支持部１６１のＹ方向上端部で第１シリコン層２１０が除去されることで、前述したように、第１支持部１６１は、第１～第３電極１７１～１７３と互いに電気的に絶縁分離される。このため、第１支持部１６１を介して、第１～第３電極１７１～１７３間で意図しない短絡を生じるおそれがない。 According to the present embodiment, since most of the first support portion 161 has the same laminated structure as the substrate 200, for example, the first support portion 161 has a stronger structure than the support portion 9 shown in the first embodiment, and the fixing portion 10 in the Y direction The rigidity can be increased. Further, since the first silicon layer 210 is removed at the upper end in the Y direction of the first support 161, the first support 161 is electrically connected to the first to third electrodes 171 to 173 as described above. Insulated. Therefore, there is no possibility that an unintended short circuit occurs between the first to third electrodes 171 to 173 via the first support portion 161.
　また、第１～第４アクチュエータ３０，９０，４０，１１０はそれぞれ、電流が流れることで発熱して延在方向であるＹ方向に熱膨張する熱式アクチュエータである。第１アクチュエータ３０と第２アクチュエータ９０とは、第１支持部１６１とＸ方向に所定の間隔をあけてそれぞれ配置されている。また、第１アクチュエータ３０は第１被駆動部材７０よりも第１支持部１６１に近い側に、第２アクチュエータ９０は第２被駆動部材１４０よりも第１支持部１６１に近い側にそれぞれ配置されている。 {Circle around (1)} The first to fourth actuators 30, 90, 40, and 110 are thermal actuators that generate heat when a current flows and thermally expand in the Y direction, which is the extending direction. The first actuator 30 and the second actuator 90 are arranged at a predetermined distance from the first support portion 161 in the X direction. In addition, the first actuator 30 is disposed closer to the first support 161 than the first driven member 70, and the second actuator 90 is disposed closer to the first support 161 than the second driven member 140. ing.
　本実施形態によれば、第１及び第２アクチュエータ３０，９０を、それぞれ第１支持部１６１に近づけて設けることで、第１アクチュエータ３０と第２アクチュエータ９０との間で発生する熱的クロストークを抑制することができる。 According to the present embodiment, by providing the first and second actuators 30 and 90 close to the first support 161, thermal crosstalk generated between the first actuator 30 and the second actuator 90 is provided. Can be suppressed.
　２つの入射光の光路をそれぞれ独立に開通及び遮断する場合、第１アクチュエータ３０及び第２アクチュエータ９０の一方は駆動状態であるのに対し、他方は非駆動状態である。また、一方のアクチュエータ、例えば、第１アクチュエータ３０が駆動されると、その中間部は他方のアクチュエータである第２アクチュエータ９０に近づくように屈曲または湾曲する。 In the case where the optical paths of the two incident lights are independently opened and blocked, one of the first actuator 30 and the second actuator 90 is in a driving state, while the other is in a non-driving state. When one of the actuators, for example, the first actuator 30 is driven, the intermediate portion bends or curves so as to approach the second actuator 90, which is the other actuator.
　一方、前述したように、第１アクチュエータ３０や第２アクチュエータ９０が駆動されると、それぞれの温度は数百℃に達する。例えば、このように高温に熱せられた第１アクチュエータ３０が第２アクチュエータ９０に所定の間隔よりも近づくと、その発熱が第２アクチュエータ９０に伝搬し、全長が伸びるように第２アクチュエータ９０が変形してしまう。これが、上記の熱的クロストークにあたる。この熱的クロストークが生じることにより、第２被駆動部材１４０が意図しない位置に変位し、第２光通過口４０２から意図しない光が漏れ出たり、あるいは通過させるべき光の一部が遮断されたりするおそれがある。 On the other hand, as described above, when the first actuator 30 and the second actuator 90 are driven, the respective temperatures reach several hundred degrees Celsius. For example, when the first actuator 30 heated to a high temperature as described above approaches the second actuator 90 more than a predetermined distance, the heat generation propagates to the second actuator 90, and the second actuator 90 is deformed so as to extend the entire length. Resulting in. This corresponds to the above-mentioned thermal crosstalk. Due to this thermal crosstalk, the second driven member 140 is displaced to an unintended position, and unintended light leaks from the second light passage opening 402 or a part of light to be passed is blocked. Or
　本実施形態によれば、第１支持部１６１に近接させて第１アクチュエータ３０と第２アクチュエータ９０とを配置することで、上記の熱的クロストークを抑制して、第１及び第２被駆動部材７０、１４０がそれぞれ意図しない位置に変位するのを防止でき、入射光の光路の開通及び遮断に関し、シャッタ装置５００の性能が低下するのを抑制できる。 According to the present embodiment, by disposing the first actuator 30 and the second actuator 90 close to the first support 161, the above-described thermal crosstalk is suppressed, and the first and second driven members are driven. The members 70 and 140 can be prevented from being displaced to unintended positions, and the performance of the shutter device 500 can be prevented from deteriorating in opening and blocking the optical path of incident light.
　特に、Ｙ方向上端部を除き、第１支持部１６１を基板２００と同じ積層構造とすることで、第１支持部１６１の第１シリコン層２１０と、第１シリコン層２１０で構成された第１及び第２アクチュエータ３０，９０とを近接して対向させることができ、第１支持部１６１の第１シリコン層２１０を介して、第１アクチュエータ３０または第２アクチュエータ９０で発生した熱を第３ベース部材１３から放散させることができる。 In particular, the first support 161 has the same laminated structure as the substrate 200 except for the upper end in the Y direction, so that the first silicon layer 210 of the first support 161 and the first silicon layer 210 formed of the first silicon layer 210 are formed. And the second actuators 30 and 90 can be closely opposed to each other, and the heat generated by the first actuator 30 or the second actuator 90 can be transferred to the third base via the first silicon layer 210 of the first support 161. It can be dissipated from the member 13.
　また、本実施形態の変位拡大機構５２０は、固定部１０に設けられ、第１支持部１６１によって互いに分割された第１開口２１と第２開口２２の各々に、２つのアクチュエータと、これらアクチュエータにそれぞれ接続された２つのビームと、２つのビームの先端側にそれぞれに接続された被駆動部材とを配置し、これらの被駆動部材、つまり、第１及び第２被駆動部材７０，１４０は、第１支持部１６１とＸ方向に所定の間隔をあけてそれぞれ配置されている。このことにより、異なる光路の光を近接させて変位拡大機構５２０に入射させることができるとともに、これらの入射光を開通及び遮断するシャッタ装置５００を簡便な構成で実現できる。 Further, the displacement magnifying mechanism 520 of the present embodiment is provided in the fixed part 10, and each of the first opening 21 and the second opening 22 divided by the first support part 161 has two actuators, The two beams connected to each other and the driven members respectively connected to the distal ends of the two beams are arranged, and these driven members, that is, the first and second driven members 70 and 140 are The first support 161 and the first support 161 are arranged at a predetermined interval in the X direction. Thus, it is possible to make the light of different optical paths approach each other and make it incident on the displacement enlarging mechanism 520, and it is possible to realize the shutter device 500 for opening and blocking these incident lights with a simple configuration.
　ＶＯＡ等において、異なる光路の光を開通及び遮断するシャッタアレイを使用する場合、装置を小型化するために、入射光の間隔、つまり、第１光通過口４０１と第２光通過口４０２との間隔を近づける必要がある。しかし、実施形態１に示すシャッタ装置５００を並置してシャッタアレイを構成する場合、２つの入射光の間隔を、Ｘ方向でビーム５，６の長さよりも大きく取る必要がある。ビーム５，６の長さは数ｍｍ程度あるため、これ以上に２つの入射光の間隔を近づけられないという問題があった。 In a VOA or the like, when a shutter array that opens and blocks light in different optical paths is used, in order to reduce the size of the apparatus, the interval between incident lights, that is, the distance between the first light passage 401 and the second light passage 402 is reduced. The intervals need to be closer. However, when a shutter array is configured by juxtaposing the shutter devices 500 according to the first embodiment, the interval between two incident lights needs to be larger than the lengths of the beams 5 and 6 in the X direction. Since the length of the beams 5 and 6 is about several mm, there has been a problem that the distance between the two incident lights cannot be reduced any more.
　一方、本実施形態によれば、同じ基板２００に対して２つの開口２１，２２を設け、その各々に、上記のセットを配置することで、第１被駆動部材７０と第２被駆動部材１４０とのＸ方向の間隔、ひいては、第１光通過口４０１と第２光通過口４０２とのＸ方向の間隔を１ｍｍ以下に近づけることが可能となり、異なる光路の光が入射される変位拡大機構５２０及びシャッタ装置５００の小型化が図れる。 On the other hand, according to the present embodiment, the first driven member 70 and the second driven member 140 are provided by providing two openings 21 and 22 in the same substrate 200 and disposing the above-described set in each of the openings 21 and 22. In the X direction, and furthermore, the distance in the X direction between the first light passage opening 401 and the second light passage opening 402 can be reduced to 1 mm or less. In addition, the size of the shutter device 500 can be reduced.
　また、実施形態１に示すシャッタ装置５００を並置してシャッタアレイを構成する場合、組立公差を考慮すると、変位拡大機構５２０内の各部材の配置精度、特に第１被駆動部材７０と第２被駆動部材１４０との間の位置精度や、第１及び第２光通過口４０１，４０２に対する第１及び第２被駆動部材７０，１４０の配置精度を高めるには限界があった。一方、本実施形態によれば、一つの基板２００に第１及び第２被駆動部材７０，１４０を有する変位拡大機構５２０を形成することで、各部材の配置精度を高めることができる。このことにより、シャッタ装置５００における入射光の開通及び遮断性能を高く維持することができる。 When a shutter array is configured by juxtaposing the shutter devices 500 according to the first embodiment, the disposition accuracy of each member in the displacement enlarging mechanism 520, particularly the first driven member 70 and the second There is a limit in improving the positional accuracy with respect to the driving member 140 and the arrangement accuracy of the first and second driven members 70 and 140 with respect to the first and second light passing ports 401 and 402. On the other hand, according to the present embodiment, by forming the displacement enlarging mechanism 520 having the first and second driven members 70 and 140 on one substrate 200, the arrangement accuracy of each member can be improved. Thus, the opening and blocking performance of the incident light in the shutter device 500 can be maintained high.
　また、第１被駆動部材７０と第２被駆動部材１４０とは、平面視で、第１支持部１６１に対して線対称となるように配置され、第１アクチュエータ３０と第２アクチュエータ９０とは、平面視で、第１支持部１６１に対して線対称となるように配置されている。また、第３アクチュエータ４０と第４アクチュエータ１１０とは、平面視で、第１支持部１６１に対して線対称となるように配置され、第３アクチュエータ４０は第１アクチュエータ３０よりも第１支持部１６１から遠い側に、かつ第４アクチュエータ１１０は第２アクチュエータ９０よりも第１支持部１６１から遠い側にそれぞれ配置されている。 Further, the first driven member 70 and the second driven member 140 are disposed so as to be line-symmetric with respect to the first support portion 161 in a plan view, and the first actuator 30 and the second actuator 90 , Are arranged so as to be line-symmetric with respect to the first support portion 161 in plan view. In addition, the third actuator 40 and the fourth actuator 110 are disposed so as to be line-symmetric with respect to the first support portion 161 in a plan view, and the third actuator 40 is provided in the first support portion more than the first actuator 30. The fourth actuator 110 is disposed farther from the first support portion 161 than the second actuator 90.
　このようにすることで、変位拡大機構５２０及びシャッタ装置５００の設計を簡便にでき、かつ、入射光の間隔を簡便に近づけることができる。また、第１被駆動部材７０と第２被駆動部材１４０、ひいては、これらの変位後の位置に配置された第１光通過口４０１と第２光通過口４０２とを第１支持部１６１に対して線対称に配置することで、ＶＯＡ等に変位拡大機構５２０やシャッタ装置５００を実装する場合に、例えば、第１支持部１６１を位置合わせマークとでき、ＶＯＡ等に対して正確な位置にかつ簡便に実装できる。 こ と By doing so, the design of the displacement enlarging mechanism 520 and the shutter device 500 can be simplified, and the interval between the incident lights can be easily reduced. Further, the first driven member 70 and the second driven member 140, and furthermore, the first light passing port 401 and the second light passing port 402 arranged at the positions after these displacement are moved to the first support portion 161. When the displacement enlarging mechanism 520 and the shutter device 500 are mounted on a VOA or the like, for example, the first support portion 161 can be used as an alignment mark, and can be accurately positioned with respect to the VOA or the like. It can be easily implemented.
　＜変形例２＞
　図８は、本変形例に係るシャッタ装置の平面図を示す。なお、本変形例において、実施形態２と同様の箇所については、同一の符号を付して詳細な説明を省略する。 <Modification 2>
FIG. 8 is a plan view of the shutter device according to the present modification. In this modification, the same parts as those in the second embodiment are denoted by the same reference numerals, and detailed description is omitted.
　本変形例に示す構成と実施形態２に示す構成とでは、平面視で、第１開口２１内に第２支持部１６２が、第２開口２２内に第３支持部１６３がそれぞれ設けられている点で異なる。また、第２支持部１６２は、両端が固定部１０に接続されて第１アクチュエータ３０と並列に配置され、第３支持部１６３は、両端が固定部１０に接続されて第２アクチュエータ９０と並列に配置されている。 In the configuration shown in the present modified example and the configuration shown in the second embodiment, the second support 162 is provided in the first opening 21 and the third support 163 is provided in the second opening 22 in plan view. Different in that. Further, the second support portion 162 has both ends connected to the fixed portion 10 and is arranged in parallel with the first actuator 30. The third support portion 163 has both ends connected to the fixed portion 10 and is in parallel with the second actuator 90. Are located in
　変位拡大機構５２０のサイズあるいは第１開口２１及び第２開口２２のサイズによっては、第１支持部１６１のみで固定部１０の剛性を所定値以上に高く維持できない場合がある。一方、本変形例によれば、上記のように第２支持部１６２と第３支持部１６３とを設けることにより、固定部１０の剛性、特に、第１開口２１の周囲におけるＹ方向の剛性及び第２開口２２の周囲におけるＹ方向の剛性を高めることができる。このように、固定部１０の剛性が高められることで、実施形態２に示すのと同様に、第１及び第２被駆動部材７０、１４０がそれぞれ意図しない位置に変位するのを防止でき、入射光の光路の開通及び遮断に関し、シャッタ装置５００の性能を高く維持することができる。 剛性 Depending on the size of the displacement magnifying mechanism 520 or the sizes of the first opening 21 and the second opening 22, the rigidity of the fixed portion 10 cannot be maintained at a value higher than the predetermined value by the first support portion 161 alone. On the other hand, according to the present modification, by providing the second support portion 162 and the third support portion 163 as described above, the rigidity of the fixing portion 10, particularly, the rigidity in the Y direction around the first opening 21 and The rigidity in the Y direction around the second opening 22 can be increased. As described above, the rigidity of the fixed portion 10 is increased, so that the first and second driven members 70 and 140 can be prevented from being displaced to unintended positions, respectively, as in the second embodiment. Regarding opening and blocking of the optical path of light, the performance of the shutter device 500 can be kept high.
　また、第２及び第３支持部１６２，１６３は、図１，２に示す支持部９と同様に、第２シリコン層２３０で構成されている。よって、第２支持部１６２は、第１及び第３ビーム５０，６０と所定の間隔をあけて第１及び第３ビーム５０，６０のＺ方向下方に設けられ、第３支持部１６３は、第２及び第４ビーム１２０，１３０と所定の間隔をあけて第２及び第４ビーム１２０，１３０のＺ方向下方に設けられている。 {Circle around (2)} The second and third support portions 162 and 163 are formed of the second silicon layer 230, similarly to the support portion 9 shown in FIGS. Therefore, the second support portion 162 is provided below the first and third beams 50 and 60 in the Z direction at a predetermined interval from the first and third beams 50 and 60, and the third support portion 163 is The second and fourth beams 120 and 130 are provided at a predetermined interval below the second and fourth beams 120 and 130 in the Z direction.
　また、第２支持部１６２を第１及び第３ビーム５０，６０のＺ方向下方に配置することで、第１及び第３アクチュエータ３０，４０によって第１及び第３ビーム５０，６０がそれぞれ駆動された場合にも、第１及び第３ビーム５０，６０の動きが妨げられることがない。よって、第１被駆動部材７０を所望の量、変位させることができる。同様に、第２支持部１６３を第２及び第４ビーム１２０，１３０のＺ方向下方に配置することで、第２及び第４アクチュエータ９０，１１０によって第２及び第４ビーム１２０，１３０がそれぞれ駆動された場合にも、第２及び第４ビーム１２０，１３０の動きが妨げられることがない。よって、第２被駆動部材１４０を所望の量、変位させることができる。 Further, by disposing the second support portion 162 below the first and third beams 50 and 60 in the Z direction, the first and third beams 50 and 60 are driven by the first and third actuators 30 and 40, respectively. In this case, the movement of the first and third beams 50 and 60 is not hindered. Therefore, the first driven member 70 can be displaced by a desired amount. Similarly, by disposing the second support portion 163 below the second and fourth beams 120 and 130 in the Z direction, the second and fourth beams 120 and 130 are driven by the second and fourth actuators 90 and 110, respectively. In this case, the movement of the second and fourth beams 120 and 130 is not hindered. Therefore, the second driven member 140 can be displaced by a desired amount.
　なお、第２及び第３支持部１６２，１６３を、第１及び第２開口２１，２２のＸ方向での略中央を通る位置にそれぞれ配置することにより、固定部１０が変形しようとするのを効果的に抑制することができることは、実施形態１に示したのと同様である。なお、第１開口２１内での第２支持部１６２の配置は特にこれに限定されず、第１アクチュエータ３０に寄った側に配置されていてもよいし、第３アクチュエータ４０に寄った側に配置されていてもよい。同様に、第２開口２２内での第３支持部１６３の配置は特にこれに限定されず、第２アクチュエータ９０に寄った側に配置されていてもよいし、第４アクチュエータ１１０に寄った側に配置されていてもよい。固定部１０のＹ方向の剛性を高められる位置に第２及び第３支持部１６２，１６３がそれぞれ配置されていればよい。 By arranging the second and third support portions 162 and 163 at positions substantially passing through the centers of the first and second openings 21 and 22 in the X direction, it is possible to prevent the fixing portion 10 from deforming. What can be effectively suppressed is the same as that shown in the first embodiment. The arrangement of the second support portion 162 in the first opening 21 is not particularly limited to this, and may be arranged on the side closer to the first actuator 30 or on the side closer to the third actuator 40. It may be arranged. Similarly, the arrangement of the third support portion 163 in the second opening 22 is not particularly limited to this, and may be arranged on the side closer to the second actuator 90 or on the side closer to the fourth actuator 110. May be arranged. It is sufficient that the second and third support portions 162 and 163 are arranged at positions where the rigidity of the fixing portion 10 in the Y direction can be increased.
　＜変形例３＞
　図９は、本変形例に係るシャッタ装置の平面図を示す。なお、本変形例において、実施形態２と同様の箇所については、同一の符号を付して詳細な説明を省略する。 <Modification 3>
FIG. 9 is a plan view of a shutter device according to the present modification. In this modification, the same parts as those in the second embodiment are denoted by the same reference numerals, and detailed description is omitted.
　本変形例に係る構成と実施形態２に示す構成とでは、第１開口２１内に配置されたアクチュエータの個数及び第３ビーム６０の基端が第１ベース部材１１に接続されている点で異なる。また、第２開口２２内に配置されたアクチュエータの個数及び第４ビーム１２０の基端が第２ベース部材１２に接続されている点で異なる。 The configuration according to the present modification differs from the configuration according to the second embodiment in that the number of actuators disposed in the first opening 21 and the base end of the third beam 60 are connected to the first base member 11. . Also, the difference is that the number of actuators arranged in the second opening 22 and the base end of the fourth beam 120 are connected to the second base member 12.
　このように、シャッタ装置５００において、第３アクチュエータ４０及び第４アクチュエータ１１０を省略してもよい。この場合にも、第１開口２１内で、第１アクチュエータ３０に駆動された第１ビーム５０が第１被駆動部材７０をＸ方向右側に押し、第１連結部材８０を介して第１アクチュエータ３０からの駆動力を受けた第３ビーム６０が第１被駆動部材７０をＸ方向左側に引くことで、被駆動部材７０は、平面視で、サブマウント４００に設けられた光通過口４０１と重なる位置へ押し出される。また、第２開口２２内で、第２アクチュエータ９０に駆動された第２ビーム１２０が第２被駆動部材１４０をＸ方向左側に押し、第２連結部材１５０を介して第２アクチュエータ９０からの駆動力を受けた第４ビーム１３０が第１被駆動部材７０をＸ方向右側に引くことで、第２被駆動部材１４０は、平面視で、サブマウント４００に設けられた光通過口４０２と重なる位置へ押し出される。 As described above, in the shutter device 500, the third actuator 40 and the fourth actuator 110 may be omitted. Also in this case, in the first opening 21, the first beam 50 driven by the first actuator 30 pushes the first driven member 70 to the right in the X direction, and the first actuator 30 through the first connecting member 80. When the third beam 60 having received the driving force from the first pulls the first driven member 70 to the left in the X direction, the driven member 70 overlaps with the light passage opening 401 provided in the submount 400 in plan view. Pushed into position. Further, in the second opening 22, the second beam 120 driven by the second actuator 90 pushes the second driven member 140 to the left in the X direction, and is driven by the second actuator 90 via the second connecting member 150. When the fourth beam 130 that receives the force pulls the first driven member 70 to the right in the X direction, the second driven member 140 overlaps with the light passage 402 provided in the submount 400 in plan view. It is pushed out to.
　なお、第３ビーム６０の基端を第１ベース部材１１ではなく第３ベース部材１３に接続してもよい。同様に、第４ビーム１３０の基端を第２ベース部材１２ではなく第３ベース部材１３に接続してもよい。この場合にも、第１及び第２アクチュエータ３０，９０の全長が意図せずに変化するのを防止して、第１及び第２被駆動部材７０，１４０を所定の位置に安定して保持することができる。 The base end of the third beam 60 may be connected to the third base member 13 instead of the first base member 11. Similarly, the base end of the fourth beam 130 may be connected to the third base member 13 instead of the second base member 12. Also in this case, the first and second actuators 30, 90 are prevented from being unintentionally changed in length, and the first and second driven members 70, 140 are stably held at predetermined positions. be able to.
　なお、特に説明しないが、図５～図９に示す変位拡大機構５２０及びシャッタ装置５００が、図３Ａ～３Ｅに示すのと同様の製造工程を経て得られることは言うまでもない。また、要求される固定部１０の剛性に応じて、第２及び第３支持部１６２，１６３を省略してもよい。 Although not particularly described, it goes without saying that the displacement enlarging mechanism 520 and the shutter device 500 shown in FIGS. 5 to 9 can be obtained through the same manufacturing steps as shown in FIGS. 3A to 3E. Further, the second and third support portions 162 and 163 may be omitted according to the required rigidity of the fixing portion 10.
　（実施形態３）
　図１０は、アクチュエータの平面模式図を示し、（ａ）図は、本実施形態に係るアクチュエータの平面形状を、（ｂ）図は、比較のためのアクチュエータの平面形状をそれぞれ示す。なお、図１０に示すアクチュエータ１８０は、図１に示すアクチュエータ３に対応している。また、本実施形態において、実施形態１と同様の箇所については、同一の符号を付して詳細な説明を省略する。 (Embodiment 3)
FIGS. 10A and 10B are schematic plan views of the actuator. FIG. 10A shows the planar shape of the actuator according to the present embodiment, and FIG. 10B shows the planar shape of the actuator for comparison. The actuator 180 shown in FIG. 10 corresponds to the actuator 3 shown in FIG. Further, in the present embodiment, the same portions as those in the first embodiment are denoted by the same reference numerals, and detailed description is omitted.
　前述したように、変形例１～３を含む実施形態１，２に示すアクチュエータ３，４，３０，９０，４０，１１０はいずれも、電流が流れることで発熱し、延在方向であるＹ方向に熱膨張する熱式アクチュエータである。また、これらのアクチュエータは、単結晶シリコンである第１シリコン層２１０で構成されているため、５００℃程度の温度では、通常、塑性変形は起こらない。 As described above, each of the actuators 3, 4, 30, 90, 40, and 110 shown in Embodiments 1 and 2 including Modifications 1 to 3 generates heat when a current flows, and extends in the Y direction, which is the extending direction. This is a thermal actuator that thermally expands. Further, since these actuators are formed of the first silicon layer 210 which is single crystal silicon, plastic deformation does not usually occur at a temperature of about 500 ° C.
　しかし、単結晶シリコンからなる部材においても、所定の応力が加わることで塑性変形を生じうる。また、部材の温度が高くなるほど、内部の欠陥の運動等に起因して、塑性変形を生じる応力は低下する。従って、実施形態１，２等に示すアクチュエータ３，４，３０，９０，４０，１１０においても、固定部１，１０から加わる応力や自身の形状によっては、駆動中の発熱で塑性変形を生じるおそれがある。また、１回の駆動で変形しなくても長期的に複数回にわたってアクチュエータを駆動させることで、塑性変形を生じるおそれがある。このような塑性変形が生じると、アクチュエータの変位量が所定量に達しなくなるだけでなく、極端な場合には、アクチュエータが破損してしまうおそれがあった。言いかえると、アクチュエータの信頼性を低下させるおそれがあった。 However, even in a member made of single crystal silicon, plastic deformation may occur when a predetermined stress is applied. Further, as the temperature of the member increases, the stress that causes plastic deformation decreases due to the movement of internal defects and the like. Therefore, in the actuators 3, 4, 30, 90, 40, and 110 shown in the first and second embodiments, the plastic deformation may occur due to the heat generated during the driving depending on the stress applied from the fixing portions 1 and 10 and the shape of the actuator itself. There is. Further, if the actuator is driven a plurality of times over a long period of time without being deformed by one drive, plastic deformation may occur. When such plastic deformation occurs, not only does the displacement amount of the actuator not reach the predetermined amount, but in extreme cases, the actuator may be damaged. In other words, the reliability of the actuator may be reduced.
　そこで、本願発明者等は、主にアクチュエータの形状に着目し、アクチュエータの幅を後述するように規定することで、上記の不具合や信頼性低下を低減できることを見出した。まず、最初に、比較のためのアクチュエータ１８１において、大きな温度分布が生じうることを説明する。 Therefore, the inventors of the present application have found that mainly focusing on the shape of the actuator and defining the width of the actuator as described later, the above-described inconvenience and the reduction in reliability can be reduced. First, the fact that a large temperature distribution can occur in the actuator 181 for comparison will be described.
　図１０の（ｂ）図に示すように、アクチュエータ１８１のＸ方向の幅（以下、単に幅という）を一定の値Ｗ３とすると、電流密度は一定であるため、アクチュエータ１８１の上端部１８１ａ、下端部１８１ｂ及び中間部１８１ｂともに同様に発熱する。一方、上端部１８１ａは第１ベース部材１ａに、下端部１８１ｂは第２ベース部材１ｂにそれぞれ接続されている。第２ベース部材１ａ，１ｂは、アクチュエータ１８１に対して表面積、体積ともに十分に大きいため、アクチュエータ１８１で発生した熱を放散するヒートシンクとしても機能する。 As shown in FIG. 10B, when the width of the actuator 181 in the X direction (hereinafter, simply referred to as “width”) is a constant value W3, the current density is constant, and therefore the upper end 181a and the lower end of the actuator 181 are fixed. Both the portion 181b and the intermediate portion 181b generate heat similarly. On the other hand, the upper end 181a is connected to the first base member 1a, and the lower end 181b is connected to the second base member 1b. Since the second base members 1a and 1b are sufficiently large in both surface area and volume with respect to the actuator 181, they also function as heat sinks for dissipating heat generated in the actuator 181.
　一方、アクチュエータ１８１の中間部１８１ｂにはビーム５の基端が接続されているが、ビーム５自体は、第１及び第２ベース部材１ａ，１ｂに比べて表面積、体積ともに小さく、ヒートシンクとして十分な機能を果たさない。このため、アクチュエータ１８１の中間部１８１ｂは、上端部１８１ａ、下端部１８１ｃに比べて温度が大きく上昇する。このため、中間部１８１ｂでは、塑性変形を生じうる応力が他の部分に比べて小さくなっている。加えて、アクチュエータ１８１が駆動されたときに、最も変形量が大きいのは中間部１８１ｂの近傍である。このため、中間部１８１ｂでは応力が高まり、塑性変形を生じるおそれが最も高くなると言える。 On the other hand, the base end of the beam 5 is connected to the intermediate portion 181b of the actuator 181. The beam 5 itself is smaller in both surface area and volume than the first and second base members 1a and 1b, and is sufficient as a heat sink. Does not function. Therefore, the temperature of the intermediate portion 181b of the actuator 181 rises significantly as compared with the upper end portion 181a and the lower end portion 181c. For this reason, in the intermediate portion 181b, the stress that can cause plastic deformation is smaller than in other portions. In addition, when the actuator 181 is driven, the largest deformation is in the vicinity of the intermediate portion 181b. For this reason, it can be said that the stress is increased in the intermediate portion 181b, and the possibility of plastic deformation is highest.
　そこで、本実施形態のアクチュエータ１８０では、図１０の（ａ）図に示すように、幅が連続的に変化するように構成されている。具体的には、アクチュエータ１８０の中間部１８０ｂから第１ベース部材１ａとの接続部である上端部１８０ａにかけて、幅が連続的に減少するように構成されている。また、アクチュエータ１８０の中間部１８０ｂから第２ベース部材１ｂとの接続部である下端部１８０ｃにかけて、幅が連続的に減少するように構成されている。 Therefore, the actuator 180 of the present embodiment is configured so that the width continuously changes as shown in FIG. Specifically, the width is continuously reduced from the middle portion 180b of the actuator 180 to the upper end portion 180a which is a connection portion with the first base member 1a. Further, the width is continuously reduced from the intermediate portion 180b of the actuator 180 to the lower end portion 180c which is a connection portion with the second base member 1b.
　アクチュエータ１８０をこのように構成することで、アクチュエータ１８０が塑性変形するのを抑制して、その信頼性を高めることができる。このことについてさらに説明する。 By configuring the actuator 180 in this manner, plastic deformation of the actuator 180 can be suppressed, and the reliability of the actuator 180 can be increased. This will be further described.
　前述したように、アクチュエータ１８０の駆動時に、中間部１８０ｂの温度が最も高くなるおそれがある。一方、本実施形態によれば、中間部１８０ｂの幅Ｗ１が他の部分、例えば、第１ベース部材１ａとの接続部近傍の幅Ｗ２よりも太くなるようにすることで、中間部１８０ｂでの電流密度を低下させて、発熱量を抑制することができる。このことにより、中間部１８０ｂでの温度上昇を抑制し、一定の応力がアクチュエータ１８０に加わった場合にも、塑性変形を生じにくくすることができる。また、中間部１８０ｂの幅Ｗ１が他の部分よりも太くなるようにすることで、当該部分での剛性を高め、応力の影響を低減することができる。また、中間部１８０ｂがＸＹ平面回りに回転しようとするのを抑制できるため、ビーム５のＸ方向への駆動力を損なわず、被駆動部材７を所望の量、変位させることができる。特に、アクチュエータ３と交差するビーム５に接続された被駆動部材７が、当該ビーム５と交差する方向へ移動する場合には、中間部１８０ｂの回転による被駆動部材７の駆動量の低減を防止することができる。なお、アクチュエータ１８０において、中間部１８０ｂの断面積を他の部分の断面積よりも大きくなるようにすると、電流密度が低下するとともに表面積が増加し、温度の上昇抑制効果が高くなる。ただし、中間部１８０ｂの幅Ｗ１だけでなく厚さも変更しようすると、図３Ａ～３Ｅに示す製造工程において、アクチュエータの加工工程が追加される。 As described above, the temperature of the intermediate portion 180b may be highest when the actuator 180 is driven. On the other hand, according to the present embodiment, the width W1 of the intermediate portion 180b is made larger than another portion, for example, the width W2 near the connection portion with the first base member 1a. The heat density can be reduced by lowering the current density. Accordingly, it is possible to suppress a rise in temperature in the intermediate portion 180b and to make it difficult for plastic deformation to occur even when a certain stress is applied to the actuator 180. In addition, by making the width W1 of the intermediate portion 180b larger than other portions, the rigidity at the portion can be increased and the influence of stress can be reduced. Further, since the rotation of the intermediate portion 180b about the XY plane can be suppressed, the driven member 7 can be displaced by a desired amount without impairing the driving force of the beam 5 in the X direction. In particular, when the driven member 7 connected to the beam 5 intersecting with the actuator 3 moves in the direction intersecting the beam 5, the rotation amount of the intermediate portion 180b prevents the driving amount of the driven member 7 from being reduced. can do. In the actuator 180, when the cross-sectional area of the intermediate portion 180b is set to be larger than the cross-sectional areas of the other portions, the current density decreases and the surface area increases, so that the effect of suppressing a rise in temperature increases. However, if it is desired to change not only the width W1 but also the thickness of the intermediate portion 180b, a processing step of the actuator is added to the manufacturing steps shown in FIGS. 3A to 3E.
　なお、本実施形態では、図１に示すアクチュエータ３に対応するアクチュエータ１８０を例に取って説明したが、アクチュエータ１８０の特徴、すなわち、Ｘ方向の幅が中間部１８０ｂから固定部１との接続部である上端部１８０ａ及び下端部１８０ｂにかけて連続的に減少している形状は、変形例１～３を含む実施形態１，２に示すアクチュエータのすべてに適用可能である。しかし、実施形態１、２では２つのアクチュエータのうち一方のみに、アクチュエータ１８０が適用されていてもよく、さらには、ビーム６がアクチュエータではなく、固定部１に接続されている場合には、アクチュエータ３にアクチュエータ１８０を適用してもよい。 In the present embodiment, the actuator 180 corresponding to the actuator 3 shown in FIG. 1 has been described as an example. However, the feature of the actuator 180, that is, the width in the X direction from the intermediate portion 180b to the connection portion from the fixed portion 1 The shape that continuously decreases toward the upper end portion 180a and the lower end portion 180b is applicable to all of the actuators according to the first and second embodiments including the first to third modifications. However, in the first and second embodiments, the actuator 180 may be applied to only one of the two actuators. Further, when the beam 6 is connected to the fixed unit 1 instead of the actuator, 3, the actuator 180 may be applied.
　（その他の実施形態）
　実施形態１及び変形例１に示す支持部９はいすれもＹ方向に沿って延在しているが、Ｙ方向から傾斜していてもよい。また、開口２内に複数配置されていてもよい。支持部９が開口２内に複数配置される場合は、互いに平行であってもよいし、所定の角度をなすように配置されていてもよい。交わるように一体化されていてもよい。同様に、変形例２，３に示す第２及び第３支持部１６２，１６３はいすれもＹ方向に沿って延在しているが、Ｙ方向から傾斜していてもよい。また、第２支持部１６２が第１開口２１内に複数配置されていてもよいし、第３支持部１６３が第２開口２２内に複数配置されていてもよいし、その両方を満たしていてもよい。第２支持部１６２が第１開口２１内に複数配置される場合は、互いに平行であってもよいし、所定の角度をなすように配置されていてもよい。交わるように一体化されていてもよい。第３支持部１６３が第２開口２２内に複数配置される場合も同様である。 (Other embodiments)
Each of the support portions 9 shown in the first embodiment and the first modification extends along the Y direction, but may be inclined from the Y direction. Further, a plurality of openings may be arranged in the opening 2. When a plurality of the support portions 9 are arranged in the opening 2, they may be parallel to each other or may be arranged so as to form a predetermined angle. They may be integrated so as to intersect. Similarly, the second and third support portions 162 and 163 shown in Modifications 2 and 3 both extend along the Y direction, but may be inclined from the Y direction. Further, a plurality of second support portions 162 may be arranged in the first opening 21, a plurality of third support portions 163 may be arranged in the second opening 22, or both of them are satisfied. Is also good. When a plurality of the second support portions 162 are arranged in the first opening 21, they may be parallel to each other or may be arranged so as to form a predetermined angle. They may be integrated so as to intersect. The same applies to a case where a plurality of third support portions 163 are arranged in the second opening 22.
　また、支持部９や第２及び第３支持部１６２，１６３は第２シリコン層２３０で構成されているが、これらのＸ方向の幅は、必要とされる固定部１または１０の剛性や変形許容量等に応じて適宜変更されうる。また、Ｚ方向の厚さが第２シリコン層２３０よりも薄くなるように支持部９や第２及び第３支持部１６２，１６３を加工してもよい。例えば、ビーム５，６と支持部９とのＺ方向の間隔は絶縁層２２０の厚さである１μｍ程度であるから、外力、例えば、外部からの衝撃や、ビーム５，６と支持部９との間に生じる静電引力等によって、ビーム５，６等が支持部９等に衝突することが起こりうる。この衝撃が強ければビーム５，６が破損してしまうし、仮に、衝撃が弱くても、ビーム５，６等と支持部９等が固着してしまう場合がある。このような固着が生じると、変位拡大機構５１０、ひいてはシャッタ装置５００が正常に動作しなくなる。このような不具合を回避するために、例えば、図３Ｂに示す工程で、図示しないマスクを用いて、支持部９に対応する部分の絶縁層２２０を除去するとともに、支持部９に対応する部分の第２シリコン層２３０をＺ方向上側から所定の厚さだけ除去するようにしてもよい。 The support portion 9 and the second and third support portions 162 and 163 are made of the second silicon layer 230. The width in the X direction is the required rigidity or deformation of the fixed portion 1 or 10. It can be appropriately changed according to the allowable amount and the like. Further, the support portion 9 and the second and third support portions 162 and 163 may be processed so that the thickness in the Z direction is smaller than that of the second silicon layer 230. For example, the distance between the beams 5 and 6 and the support 9 in the Z direction is about 1 μm, which is the thickness of the insulating layer 220. The beams 5, 6 and the like may collide with the support portion 9 and the like due to electrostatic attraction and the like generated between them. If the impact is strong, the beams 5 and 6 may be damaged, and even if the impact is weak, the beams 5 and 6 and the support 9 may be fixed. When such sticking occurs, the displacement magnifying mechanism 510 and, consequently, the shutter device 500 do not operate normally. In order to avoid such inconveniences, for example, in a step shown in FIG. 3B, a portion of the insulating layer 220 corresponding to the support portion 9 is removed using a mask (not shown), and a portion corresponding to the support portion 9 is removed. The second silicon layer 230 may be removed by a predetermined thickness from the upper side in the Z direction.
　なお、各変形例を含む各実施形態に示すＭＥＭＳ素子である変位拡大機構５１０，５２０において、被駆動部材７または７０に接続されるビームの本数を２本としたが、１本のビームが被駆動部材７または７０に接続されるようにしてもよい。その場合、例えば、１本のアクチュエータによって当該ビームが駆動されて被駆動部材７が変位する。また、被駆動部材７や第１及び第２被駆動部材７０，１４０を構成する第１シリコン層２１０を所定の厚さだけ除去して、これらの部材が第１シリコン層２１０よりも薄くなるようにしてもよい。このようにすることで、被駆動部材７や第１及び第２被駆動部材７０，１４０の質量を低減でき、共振周波数を向上させることができる。 In the displacement magnifying mechanisms 510 and 520, which are the MEMS elements shown in the embodiments including the modified examples, the number of beams connected to the driven member 7 or 70 is set to two. You may make it connect to the driving member 7 or 70. In that case, for example, the beam is driven by one actuator, and the driven member 7 is displaced. Further, the first silicon layer 210 constituting the driven member 7 and the first and second driven members 70 and 140 is removed by a predetermined thickness so that these members are thinner than the first silicon layer 210. It may be. By doing so, the mass of the driven member 7 and the first and second driven members 70 and 140 can be reduced, and the resonance frequency can be improved.
　また、基板２００とサブマウント４００との間で所望の接合強度が確保されていれば、図１に示す構成において、図４に示すように第２ベース部材１ｂの下面とサブマウント４００との間に接着材３００を設けなくてもよい。同様に、図５，８，９に示す構成において、第３ベース部材１３の下面とサブマウント４００との間に接着材３００を設けなくてもよい。あるいは、図１，４に示す構成において、第２ベース部材１ｂの下面とサブマウント４００との間に接着材３００を設け、第１ベース部材１ｂの下面とサブマウント４００との間に接着材３００を設けないようにしてもよい。同様に、図５，８，９に示す構成において、第３ベース部材１３の下面とサブマウント４００との間に接着材３００を設け、第１及び第２ベース部材１１，１２下面とサブマウント４００との間に接着材３００を設けないようにしてもよい。 In addition, if a desired bonding strength is secured between the substrate 200 and the submount 400, in the configuration shown in FIG. 1, between the lower surface of the second base member 1b and the submount 400 as shown in FIG. The adhesive 300 may not be provided. Similarly, in the configuration shown in FIGS. 5, 8, and 9, the adhesive 300 may not be provided between the lower surface of the third base member 13 and the submount 400. Alternatively, in the configuration shown in FIGS. 1 and 4, an adhesive 300 is provided between the lower surface of the second base member 1b and the submount 400, and the adhesive 300 is provided between the lower surface of the first base member 1b and the submount 400. May not be provided. Similarly, in the configuration shown in FIGS. 5, 8, and 9, an adhesive 300 is provided between the lower surface of the third base member 13 and the submount 400, and the lower surface of the first and second base members 11 and 12 is connected to the submount 400. The adhesive 300 may not be provided between the two.
　また、実施形態３に示すアクチュエータ１８０の特徴は、図１及び図４に示す構成において、支持部９が設けられていない場合にも適用可能である。また、図８及び図９に示す構成において、第２支持部１６２及び第３支持部１６３が設けられていない場合にも適用可能である。また、上記の変形例及び実施形態で説明した各構成要素を組み合わせて、新たな実施形態とすることも可能である。 The features of the actuator 180 according to the third embodiment are also applicable to the configuration illustrated in FIGS. 1 and 4 in which the support 9 is not provided. Further, in the configuration shown in FIGS. 8 and 9, the present invention is also applicable to a case where the second support portion 162 and the third support portion 163 are not provided. Further, it is also possible to form a new embodiment by combining the components described in the above-mentioned modified examples and the embodiments.
　本発明のＭＥＭＳ素子は、固定部の剛性を高めることで、被駆動部材を所定の位置に安定して保持できるため、シャッタ装置に適用する上で有用である。 The MEMS element of the present invention can stably hold the driven member at a predetermined position by increasing the rigidity of the fixed portion, and is thus useful when applied to a shutter device.
１　　　　固定部
１ａ　　　第１ベース部材
１ｂ　　　第２ベース部材
２　　　　開口
３　　　　アクチュエータ
４　　　　アクチュエータ（別のアクチュエータ）
５　　　　ビーム
６　　　　ビーム（別のビーム）
６ａ　　　第１部材
６ｂ　　　第２部材
７　　　　被駆動部材
８　　　　連結部材
９　　　　支持部
１０　　　固定部
１１　　　第１ベース部材
１２　　　第２ベース部材
１３　　　第３ベース部材
２０　　　開口
２１　　　第１開口
２２　　　第２開口
３０　　　第１アクチュエータ（アクチュエータ）
４０　　　第３アクチュエータ
５０　　　第１ビーム
６０　　　第３ビーム
７０　　　第１被駆動部材（被駆動部材）
８０　　　第１連結部材
９０　　　第２アクチュエータ
１０１　　第１電極
１０２　　第２電極
１１０　　第４アクチュエータ
１２０　　第２ビーム
１３０　　第４ビーム
１４０　　第２被駆動部材
１５０　　第２連結部材
１６１～１６３　　第１～第３支持部
１７１～１７３　　第１～第３電極
１８０　　アクチュエータ
１８０ａ　アクチュエータ１８０の上端部
１８０ｂ　アクチュエータ１８０の中間部
１８０ｃ　アクチュエータ１８０の下端部
２００　　ＳＯＩ基板（基板）
２１０　　第１シリコン層
２２０　　絶縁層
２３０　　第２シリコン層
３００　　接着材（接合部材）
４００　　サブマウント（支持部材）
４０１　　光通過口（第１光通過口）
４０２　　第２光通過口
５００　　シャッタ装置
５１０，５２０　　変位拡大機構（ＭＥＭＳ素子） DESCRIPTION OF SYMBOLS 1 Fixed part 1a 1st base member 1b 2nd base member 2 Opening 3 Actuator 4 Actuator (another actuator)
5 beams 6 beams (another beam)
6a first member 6b second member 7 driven member 8 connecting member 9 supporting portion 10 fixing portion 11 first base member 12 second base member 13 third base member 20 opening 21 first opening 22 second opening 30 first actuator (Actuator)
40 third actuator 50 first beam 60 third beam 70 first driven member (driven member)
80 first connecting member 90 second actuator 101 first electrode 102 second electrode 110 fourth actuator 120 second beam 130 fourth beam 140 second driven member 150 second connecting member 161 to 163 first to third support portions 171 to 173 First to third electrodes 180 Actuator 180a Upper end 180b of actuator 180 Middle part 180c of actuator 180 Lower end 200 of actuator 180 SOI substrate (substrate)
210 First silicon layer 220 Insulating layer 230 Second silicon layer 300 Adhesive (joining member)
400 submount (supporting member)
401 Light passage (first light passage)
402 Second light passage port 500 Shutter device 510, 520 Displacement magnifying mechanism (MEMS element)

Claims (12)

  1. 　基板と、
    　前記基板に設けられた固定部と、
    　前記固定部に設けられた開口と、
    　両端が前記固定部に接続されたアクチュエータと、
    　基端側が前記アクチュエータに接続され、前記基板の上面と平行に延在するビームと、
    　前記ビームの先端側に接続された被駆動部材と、
    　平面視で前記開口を分割する一方、両端が前記固定部に接続されて前記アクチュエータと並列に配置された支持部と、を有し、
    　前記アクチュエータと前記ビームと前記被駆動部材と前記支持部とは、平面視で前記開口内に配置されているＭＥＭＳ素子。     Board and
    A fixing portion provided on the substrate,
    An opening provided in the fixing portion,
    An actuator having both ends connected to the fixed portion,
    A beam connected proximally to the actuator and extending parallel to a top surface of the substrate;
    A driven member connected to the distal end side of the beam,
    While dividing the opening in a plan view, a support portion having both ends connected to the fixed portion and arranged in parallel with the actuator,
    The MEMS element, wherein the actuator, the beam, the driven member, and the support are arranged in the opening in plan view.
  2. 　両端が前記固定部に接続され、前記アクチュエータと離間して設けられた別のアクチュエータと、
    　基端側が前記別のアクチュエータに接続され、前記基板の上面と平行に延在する別のビームと、をさらに有し、
    　前記別のアクチュエータ及び前記別のビームは、平面視で前記開口内に配置されており、
    　前記被駆動部材は、前記ビーム及び別のビームの先端側に接続されている請求項１に記載のＭＥＭＳ素子。     Both ends are connected to the fixed portion, another actuator provided separately from the actuator,
    A further beam connected proximally to the another actuator, the beam extending parallel to a top surface of the substrate.
    The another actuator and the another beam are arranged in the opening in a plan view,
    The MEMS device according to claim 1, wherein the driven member is connected to a front end side of the beam and another beam.
  3. 　前記支持部は前記ビームと所定の間隔をあけて前記ビームの下方に設けられている請求項１または２に記載のＭＥＭＳ素子。 The MEMS device according to claim 1 or 2, wherein the support portion is provided below the beam at a predetermined interval from the beam.
  4. 　前記基板は、第１シリコン層と絶縁層と第２シリコン層とがこの順で積層されてなり、
    　前記ビーム及び前記アクチュエータは前記第１シリコン層で構成される一方、前記支持部は前記第２シリコン層で構成されている請求項１に記載のＭＥＭＳ素子。     The substrate includes a first silicon layer, an insulating layer, and a second silicon layer stacked in this order,
    The MEMS device according to claim 1, wherein the beam and the actuator are formed of the first silicon layer, while the support is formed of the second silicon layer.
  5. 　基板と、
    　前記基板に設けられた固定部と、
    　前記固定部に設けられた開口と、
    　両端が前記固定部に接続され、前記開口を第１開口と第２開口とに分割する第１支持部と、を有し、
    　平面視で前記第１開口内に、
    　両端が前記固定部に接続されたアクチュエータと、
    　基端側が前記アクチュエータに接続され、前記基板の上面と平行に延在する第１ビームと、
    　前記第１ビームの先端側に接続された被駆動部材と、が配置され、
    　平面視で前記第２開口内に、
    　両端が前記固定部に接続された第２アクチュエータと、
    　基端側が前記第２アクチュエータに接続され、前記基板の上面と平行に延在する第２ビームと、
    　前記第２ビームの先端側に接続された第２被駆動部材と、が配置され、
    　前記第１支持部は、平面視で前記第１及び第２ビームと交差する方向に延在しているＭＥＭＳ素子。     Board and
    A fixing portion provided on the substrate,
    An opening provided in the fixing portion,
    A first support portion having both ends connected to the fixing portion and dividing the opening into a first opening and a second opening;
    Within the first opening in plan view,
    An actuator having both ends connected to the fixed portion,
    A first beam having a proximal end connected to the actuator and extending parallel to an upper surface of the substrate;
    A driven member connected to the distal end side of the first beam,
    Within the second opening in plan view,
    A second actuator having both ends connected to the fixed portion,
    A second beam having a proximal end connected to the second actuator and extending parallel to an upper surface of the substrate;
    A second driven member connected to the distal end side of the second beam,
    The MEMS element, wherein the first support portion extends in a direction intersecting the first and second beams in plan view.
  6. 　両端が前記固定部に接続されて前記アクチュエータと並列に配置された第２支持部と、
    　両端が前記固定部に接続されて前記第２アクチュエータと並列に配置された第３支持部と、をさらに有し、
    　前記第２支持部は、前記第１開口内に、前記第１ビームと所定の間隔をあけて前記第１ビームの下方に設けられ、
    　前記第３支持部は、前記第２開口内に、前記第２ビームと所定の間隔をあけて前記第２ビームの下方に設けられている請求項５に記載のＭＥＭＳ素子。     A second support portion having both ends connected to the fixed portion and arranged in parallel with the actuator;
    A third support portion having both ends connected to the fixed portion and arranged in parallel with the second actuator,
    The second support portion is provided below the first beam at a predetermined distance from the first beam in the first opening,
    The MEMS device according to claim 5, wherein the third support portion is provided in the second opening below the second beam at a predetermined interval from the second beam.
  7. 　両端が前記固定部に接続され、前記アクチュエータと離間して設けられた第３アクチュエータと、
    　基端側が前記第３アクチュエータに接続され、前記基板の上面と平行に延在する第３ビームと、
    　両端が前記固定部に接続され、前記第２アクチュエータと離間して設けられた第４アクチュエータと、
    　基端側が前記第４アクチュエータに接続され、前記基板の上面と平行に延在する第４ビームと、をさらに有し、
    　前記第３アクチュエータ及び前記第３ビームは、平面視で前記第１開口内に配置され、前記被駆動部材は、前記第１及び第３ビームの先端側に接続されており、
    　前記第４アクチュエータ及び前記第４ビームは、平面視で前記第２開口内に配置され、前記第２被駆動部材は、前記第２及び第４ビームの先端側に接続されている請求項５または６に記載のＭＥＭＳ素子。     A third actuator having both ends connected to the fixed portion and provided separately from the actuator;
    A third beam having a proximal end connected to the third actuator and extending parallel to an upper surface of the substrate;
    A fourth actuator having both ends connected to the fixed portion and provided separately from the second actuator;
    A fourth beam connected to the fourth actuator at a proximal end thereof and extending in parallel with the upper surface of the substrate.
    The third actuator and the third beam are disposed in the first opening in a plan view, and the driven member is connected to distal ends of the first and third beams,
    The said 4th actuator and the said 4th beam are arrange | positioned in the said 2nd opening in planar view, and the said 2nd driven member is connected to the front-end | tip side of the said 2nd and 4th beam. 7. The MEMS device according to 6.
  8. 　前記基板は、第１シリコン層と絶縁層と第２シリコン層とがこの順で積層された積層構造であり、
    　前記アクチュエータ及び前記第２アクチュエータは前記第１シリコン層で構成され、
    　前記第１支持部は前記固定部に接続された一端部を除き、前記基板と同じ積層構造であり、前記一端部は前記第２シリコン層と前記絶縁層とが積層されてなる請求項５に記載のＭＥＭＳ素子。     The substrate has a laminated structure in which a first silicon layer, an insulating layer, and a second silicon layer are laminated in this order;
    The actuator and the second actuator are configured by the first silicon layer,
    The said 1st support part has the same laminated structure as the said board | substrate except the one end connected to the said fixed part, The said one end is laminated | stacked with the said 2nd silicon layer and the said insulating layer. The MEMS device according to the above.
  9. 　前記アクチュエータは、電流が流れることで発熱して延在方向に熱膨張する熱式アクチュエータである請求項１または５に記載のＭＥＭＳ素子。 The MEMS element according to claim 1 or 5, wherein the actuator is a thermal actuator that generates heat when a current flows and thermally expands in an extending direction.
  10. 　前記アクチュエータの幅は、前記ビームとの接続部または前記第１ビームとの接続部から前記固定部との接続部にかけて連続的に減少している請求項９に記載のＭＥＭＳ素子。 The MEMS device according to claim 9, wherein the width of the actuator continuously decreases from a connection portion with the beam or a connection portion with the first beam to a connection portion with the fixed portion.
  11. 　前記基板を支持する支持部材と、
    　前記固定部の下面と前記支持部材の表面との間に設けられ、前記基板と前記支持部材とを接合する接合部材と、をさらに有する請求項１ないし１０のいずれかに記載のＭＥＭＳ素子。     A support member for supporting the substrate,
    The MEMS device according to claim 1, further comprising: a joining member provided between a lower surface of the fixing portion and a surface of the support member, for joining the substrate and the support member.
  12. 　請求項１ないし１１のいずれか１項に記載のＭＥＭＳ素子と、
    　前記固定部の上面に配設され、少なくとも前記アクチュエータの一端に電気的に接続された第１電極と、
    　前記固定部の上面に配設され、少なくとも前記アクチュエータの他端に電気的に接続された第２電極と、を備え、
    　前記被駆動部材で光路を遮断及び開通させるシャッタ装置。     A MEMS device according to any one of claims 1 to 11,
    A first electrode disposed on the upper surface of the fixing portion and electrically connected to at least one end of the actuator;
    A second electrode disposed on the upper surface of the fixing unit and electrically connected to at least the other end of the actuator;
    A shutter device for blocking and opening an optical path by the driven member.
PCT/JP2019/011811 2018-07-09 2019-03-20 Mems element and shutter device employing same WO2020012723A1 (en)

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JP2005527384A (en) * 2001-08-07 2005-09-15 ヒューレット・パッカード・カンパニー Microelectromechanical element with reinforced support beam and method of forming a reinforced support beam in a microelectromechanical system (MEMS)
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