WO2019245238A1

WO2019245238A1 - Mask pack comprising symmetric upper and lower halves

Info

Publication number: WO2019245238A1
Application number: PCT/KR2019/007205
Authority: WO
Inventors: 최영권; 김완중; 우용호; 안선용; 신병모; 구자윤; 김호열
Original assignee: 코스맥스 주식회사; 코스맥스아이큐어 주식회사
Priority date: 2018-06-18
Filing date: 2019-06-14
Publication date: 2019-12-26
Also published as: KR102107381B1; KR20190142622A

Abstract

The present invention provides a structure of a mask pack divided into upper and lower halves. The present invention provides a mask pack divided into upper and lower halves, the mask pack comprising: a first release paper; a first mask laminated on the release paper; and a second mask laminated on the first mask, wherein the first mask and the second mask have common multiple incision patterns. According to the present invention, a mask pack symmetrically divided in half is applicable to an asymmetric facial element.

Description

Top and bottom half mask pack with symmetry

The present invention relates to a mask pack, and more particularly, to a mask pack having a mask separated vertically.

Skin care mask is a product that attaches a substance to the skin to make it clean and beautiful, and then removes or rinses it after a certain time. Skincare masks are nonwoven, dry and hydrogel type masks depending on the formulation.

In general, the skincare mask of the mask pack contains active substances or cosmetics containing various ingredients useful for the skin such as moisturizers and whitening agents, and is used by attaching to the face for a certain time to absorb a large amount of the skin deeply. have. To this end, the skin care mask has a variety of forms having a circular shape or a face shape so as to be covered on the face to be massaged, such as a nonwoven fabric or a film.

For example, there are various types of masks such as a single sheet-type mask covering the entire face with one mask, a partial mask covering a part such as the upper half or the lower half of the face, and an upper and lower detachable masks respectively covering the upper half or the lower half of the face. .

The upper and lower detachable masks have the advantage of being able to be in close contact with the skin stably along the facial curvature, but the opening pattern or the incision pattern corresponding to the facial dentition of the face is asymmetrical, so it must be designed and manufactured separately for the upper mask and the lower mask. I have a problem.

In order to solve the problems of the prior art, an object of the present invention is to provide a removable mask pack.

Another object of the present invention is to provide a top and bottom half mask pack having a symmetrical structure.

In addition, an object of the present invention is to provide a vertical half mask mask pack having a common incision pattern.

It is also an object of the present invention to provide a symmetric incision pattern design suitable for application to face elements which are asymmetrical up and down.

Moreover, an object of this invention is to provide the mask pack structure which can be manufactured by a simple manufacturing process.

The present invention to achieve the above technical problem, the first release paper; A first mask laminated on the release paper; And a second mask stacked on the first mask, wherein the first mask and the second mask have a plurality of common incision patterns.

The present invention also provides a first release paper; A first mask laminated on the release paper; A second release paper stacked on the first mask; And a second mask stacked on the second release paper, wherein the first mask and the second mask have a plurality of common incision patterns.

The present invention also provides a first release paper; A first mask laminated on the release paper; A second mask laminated on the first release paper; And a second release paper stacked on the second mask, wherein the first mask and the second mask have a plurality of common incision patterns.

In the present invention, at least a part of the plurality of incision patterns is a soothing pattern formed at a position corresponding to the eyes, nose, and mouth of the face, and at least a part of the plurality of incision patterns is disposed at positions other than the eyes, nose, and mouth. Dummy pattern.

In the present invention, at least one of the first mask and the second mask may include a hydrogel or a nonwoven fabric.

In addition, in the present invention, the release paper, the first mask, and the second mask may have a common outer circumference, and the outer circumference may be a semicircle.

In the present invention, the plurality of incision patterns may include a U-shaped linear pattern.

According to the present invention, it is possible to provide a detachable mask pack having a simple structure and which can be manufactured by a simple process.

In addition, the half mask mask pack of the vertical symmetry structure of the present invention has the advantage that it can be applied to an asymmetric face element.

1 is a schematic diagram showing a mask pack according to an embodiment of the present invention.

2 is an exploded perspective view of a mask pack according to an embodiment of the present invention.

3 is a view showing a state of use of the mask pack according to an embodiment of the present invention.

4 is a schematic view showing a mask pack according to another embodiment of the present invention.

5 is a schematic diagram showing a mask pack according to another embodiment of the present invention.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

1 is a schematic view showing a mask pack according to an embodiment of the present invention, Figure 2 is an exploded perspective view.

As shown, the mask pack 100 has a laminated structure of the first release paper 110, the first mask 120, and the second mask 130.

Further, in the present invention, the first and second masks contain components such as active substances or drugs useful for the skin, such as moisturizers and whitening agents, and adhesive components, and are molded into a sheet. The first and / or second mask may further include a reinforcement such as a nonwoven fabric or a mesh. Of course, the first and / or second mask may be implemented in the form of a film without reinforcing material. For example, hydrogel is an example of a film without reinforcement. In the present invention, the first and second masks may be implemented to include the same material or the same component. Alternatively, the first and second masks may be implemented to include different materials and / or different components.

In the present invention, the first release paper 110, the first mask 120, and the second mask 130 constituting the mask pack 100 have an outer circumference along an upper or lower contour half of the face. For example, the outer circumference may include an arc portion and a straight portion, and for example, may be semicircular. As shown in the drawing, the first mask and the second mask are equally cut into portions corresponding to the respective regions in which the face contour is divided up and down and has the same appearance, that is, a common outer circumference. For example, the first mask may be used as an upper face mask, and the second mask may be used as a lower face mask.

Preferably, the first and second masks are provided with a plurality of incision patterns. In the present invention, the incision patterns of the first and second masks are common. In addition, the first release paper 110 of the mask pack 100 may be provided with a cutout pattern common to the first and second masks. A cutting pattern common to the first release paper, the first mask, and the second mask may be formed by a cutting mold penetrating the mask pack 100 up and down.

2, the

cut patterns

112, 114A, 114B, and 116 of the first release paper, the

cut patterns

122, 124A, 124B, and 126 of the first mask, and the

cut patterns

132, 134A, and 134B of the second mask. , 136 is shown.

Facial elements such as eyes and nose are symmetrical but asymmetrical up and down. Nevertheless, the present invention has an incision pattern that makes it applicable to an asymmetrical face element while applying a symmetrical common pattern to a mask separated from above.

In the present invention, as the incision pattern, various shapes by straight lines, curves, faces, or a combination thereof may be used. Preferably, in the present invention, the cut pattern is a line pattern formed by a straight line, a curved line, or a combination thereof.

According to an aspect of the present invention to be described later, some of the plurality of incision patterns of the first mask and the second mask is a soothing pattern corresponding to the position corresponding to the face elements such as eyes, nose and mouth, while the other part It is disposed at a position that does not correspond to the face element and acts as a dummy pattern. Therefore, the calming pattern of the corresponding position can provide an open state to facial elements such as eyes, nose and mouth while providing a close state to provide intact contact with the skin at the position acting as a dummy pattern. For this purpose, the incision patterns may be formed in a foldable or bendable pattern. For example, the incision pattern may be a linear incision pattern such as a U-type or a V-type.

3 is a view showing a wearing state of the mask pack according to an embodiment of the present invention.

Referring to FIG. 3, the first mask 120 and the second mask 130 are disposed on the top and bottom of the face, respectively.

As shown in the drawing, the semi-circular first mask 120 and the second mask 130 are disposed to abut the straight portion. This allows the incision patterns of each mask to be arranged in line symmetry with a straight line as a reference line.

In the worn state, the

incision patterns

124A and 124B of the first mask are a calming pattern that can open the eye corresponding to the eye position of the face, whereas the incision patterns 134A of the second mask that are corresponding dummy patterns. 134 B) has no facial elements underneath and covers the skin in this state. In addition, the incision pattern 122 of the second mask may be open in correspondence with the tip of the nose, while the same incision pattern 132 of the first mask is disposed in the dorsal position to contact the skin. In addition, the incision pattern 136 of the second mask may be opened corresponding to the mouth position, while the corresponding dummy pattern 126 of the first mask is disposed in the dummy position.

Conventionally, incision patterns arranged at corresponding positions such as eyes, nose, and mouth have been implemented in the same surface pattern as the opening. However, when a common pattern is applied to the upper and lower half masks as in the present invention, the opening pattern provides a non-contact state with the skin at the dummy position. However, the calming

patterns

132, 124A, and 124B disposed at the placement positions of the eyes, nose, and mouth among the U-shaped incision patterns as shown are converted into the openable state by bending or folding, and are disposed at the dummy positions. In the case of acting as the

dummy patterns

126, 122, 134A, and 134B, close contact with the skin may be ensured.

The upper and lower half-type mask packs of the present invention described above can be manufactured by a simpler manufacturing process. When the fabric on which the first mask sheet, the second mask sheet and the release paper are laminated is cut with a cutting mold in which an incision pattern is embossed, an incision pattern and a cutting are simultaneously performed to obtain an upper mask and a lower mask having the same incision pattern and appearance. I can manufacture it at a stretch.

Referring to FIG. 4, similar to that described with reference to FIG. 1, the mask pack has a structure in which the first mask 120 and the second mask 130 are stacked on the first release paper 110. However, the second release paper 140 is provided between the first mask 120 and the second mask 130 and is different from the mask pack described with reference to FIG. 1. Although the plurality of

incision patterns

132, 134A, 134B, and 136 on the second mask 130 are illustrated in the illustrated figure, as described above, the incision pattern penetrates the laminated structure and is common to the lower layers. .

Meanwhile, in the mask pack structure described with reference to FIG. 4, the additional release paper 140 facilitates the separation of the first mask and the second mask to facilitate convenience of use. In addition, the mask pack structure of FIG. 5 has the advantage that the formation and cutting of the incision pattern may be simultaneously performed by one cutting die, similarly to the mask pack described with reference to FIG. 1.

Referring to FIG. 5, the mask pack has a structure in which the first mask 120 and the second mask 130 are stacked on the first release paper 110. However, it is different from the mask pack described with reference to FIG. 1 in that an additional release paper 150 is provided on the second mask 130. In addition, the second release paper 150 may serve to protect the mask.

Although the plurality of

cutout patterns

152, 154A, 154B, and 156 on the second release paper 150 are shown in the figure, the cutout pattern is a pattern common to the lower layers through the laminated structure as well.

As described above, the mask pack of the present invention has been described as a vertical separation type, but the present invention may be applied to a structure in which the upper mask and the lower mask are integrally connected and stacked by folding. At this time, a common incision pattern including a true pattern and a dummy pattern may be implemented in a simple manner similar to that described above.

As mentioned above, although the present invention has been described in detail through the embodiments of the present invention, the above description is for illustrating the present invention and the present invention is not limited thereto. Without departing from the appended claims and the gist of the present invention, those of ordinary skill in the art should be regarded as falling within the scope of the present invention to the extent that various modifications can be made.

The present invention is applicable to skin care products.

Claims

First release paper;

A first mask laminated on the release paper; And

A second mask laminated on the first mask,

The upper and lower half mask packs, wherein the first mask and the second mask have a plurality of common incision patterns.
First release paper;

A first mask laminated on the release paper;

A second release paper stacked on the first mask; And

A second mask laminated on the second release paper,

The upper and lower half mask packs, wherein the first mask and the second mask have a plurality of common incision patterns.
First release paper;

A first mask laminated on the release paper;

A second mask laminated on the first release paper; And

A second release paper stacked on the second mask,

The upper and lower half mask packs, wherein the first mask and the second mask have a plurality of common incision patterns.
The method according to any one of claims 1 to 3,

At least a portion of the plurality of incision patterns is a half upper and lower half mask pack, characterized in that the calming pattern is formed in a position corresponding to the eyes, nose and mouth of the face.
The method according to any one of claims 1 to 3,

At least a portion of the plurality of incision patterns is a vertical half mask mask pack, characterized in that the dummy pattern disposed in positions other than the eyes, nose and mouth.
The method according to any one of claims 1 to 3,

The at least one half mask mask pack, characterized in that at least one of the first mask and the second mask comprises a hydrogel.
The method according to any one of claims 1 to 3,

At least one of the first mask and the second mask is a top and bottom half mask pack, characterized in that the non-woven fabric.
The method according to any one of claims 1 to 3,

And the release paper, the first mask, and the second mask have a common outer circumference.
The method of claim 7, wherein

The outer periphery is a semi-circular mask pack, characterized in that the semicircle.
The method of claim 1,

The upper and lower half mask packs, wherein the plurality of cutout patterns include a U-shaped linear pattern.