KR102107381B1 - Mask Pack with Symmetric Upper and Lower Halves - Google Patents

Abstract

The present invention discloses a structure of a vertical mask pack. The present invention is a first release paper; A first mask laminated on the release paper; And a second mask stacked on the first mask, wherein the first mask and the second mask have a plurality of common incision patterns. According to the present invention, the symmetrical half-part mask pack has the advantage of being applicable to asymmetric facial elements.

Description

Mask Pack with Symmetric Upper and Lower Halves

The present invention relates to a mask pack, and more particularly, to a mask pack having a vertically separated mask.

A skin care mask is a product that attaches a substance that is helpful for beauty to the surface of the skin to cleanse and clean the skin, and then remove or rinse after a certain period of time. Skin care masks include non-woven, dry, and hydrogel-type masks depending on the formulation.

In general, the skin care mask of the mask pack contains active substances or cosmetics containing various ingredients useful for the skin such as moisturizers, whitening agents, etc., and is used as a method of attaching to the face for a certain time to absorb a large amount of skin deeply have. To this end, the skin care mask has various shapes having a circular shape or a face shape so that it can be covered over a face to be massaged, such as a nonwoven fabric or film.

Exemplarily, various types of masks exist, such as a single sheet-like mask covering the entire face with a single mask, a partial mask covering a portion such as the upper or lower face, and an upper and lower separable mask for covering the upper or lower face, respectively. .

The upper and lower separable masks have the advantage of being able to stably adhere to the skin along the facial curvature, but since the opening pattern or incision pattern corresponding to the facial features of the face is asymmetric, it has to be designed and manufactured separately from the upper mask or the lower mask. Have a problem.

KR 20-2015-0000063 A KR 20-2016-0003495 A KR 20-2010-0004035 A

In order to solve the problems of the prior art, the present invention aims to provide a separate mask pack.

It is also an object of the present invention to provide a symmetrical upper and lower half-shape mask pack.

It is also an object of the present invention to provide an upper and lower half-shape mask pack having a common incision pattern.

It is also an object of the present invention to provide a symmetrical incision pattern design suitable for application to an asymmetric face element.

It is also an object of the present invention to provide a mask pack structure that can be manufactured by a simple manufacturing process.

In order to achieve the above technical problem, the present invention, the first release paper; A first mask laminated on the release paper; And a second mask stacked on the first mask, wherein the first mask and the second mask have a plurality of common incision patterns.

In addition, the present invention is a first release paper; A first mask laminated on the release paper; A second release paper stacked on the first mask; And a second mask stacked on the second release paper, wherein the first mask and the second mask have a plurality of common incision patterns, and provide a vertical half-shape mask pack.

In addition, the present invention is a first release paper; A first mask laminated on the release paper; A second mask laminated on the first release paper; And a second release paper stacked on the second mask, wherein the first mask and the second mask have a plurality of common cut-off patterns, and provide a vertical half-shape mask pack.

In the present invention, at least a portion of the plurality of incision patterns is a calm pattern formed at positions corresponding to the eyes, nose, and mouth of the face, and at least a portion of the plurality of incision patterns are arranged at positions other than the eyes, nose, and mouth. It is a dummy pattern.

In the present invention, at least one of the first mask and the second mask may include a hydrogel or a nonwoven fabric.

In addition, in the present invention, the release paper, the first mask and the second mask may have a common outer periphery, and the outer periphery may be a semicircle.

In the present invention, the plurality of incision patterns may include a U-shaped linear pattern.

According to the present invention, it is possible to provide a separable mask pack that has a simple structure and can be manufactured by a simple process.

In addition, the half-shape mask pack of the vertically symmetrical structure of the present invention has the advantage that it can be applied to an asymmetric facial element.

1 is a schematic diagram showing a mask pack according to an embodiment of the present invention.
2 is an exploded perspective view of a mask pack according to an embodiment of the present invention.
3 is a view showing a state of use of the mask pack according to an embodiment of the present invention.
4 is a schematic diagram showing a mask pack according to another embodiment of the present invention.
5 is a schematic diagram showing a mask pack according to another embodiment of the present invention.

Hereinafter, the present invention will be described by describing preferred embodiments of the present invention with reference to the drawings.

1 is a schematic view showing a mask pack according to an embodiment of the present invention, Figure 2 is an exploded perspective view.

As illustrated, the mask pack 100 has a stacked structure of a first release paper 110, a first mask 120, and a second mask 130.

In addition, in the present invention, the first and second masks contain ingredients such as a moisturizing agent and a whitening agent, which are useful for skin, drugs, and adhesive components, and are molded into a sheet shape. The first and / or second mask may further include a reinforcement material such as a nonwoven fabric or a mesh. Of course, unlike this, the first and / or second mask may be implemented in a film form without a reinforcing material. For example, a hydrogel is an example of a film without reinforcement. In the present invention, the first and second masks may be implemented to include the same material or the same component, or alternatively may be implemented to include different materials and / or different components.

In the present invention, the first release paper 110, the first mask 120, and the second mask 130 constituting the mask pack 100 have an outer circumference along the upper or lower contour that divides the face. Illustratively, the outer circumference may include an arc portion and a straight portion, and may be, for example, semicircular. As illustrated, the first mask and the second mask are equally cut into portions corresponding to each region of which the face contour is divided up and down, and have the same appearance, that is, a common periphery. For example, the first mask may be used as an upper face mask, and the second mask may be used as a lower face mask.

Preferably, the first and second masks are provided with a plurality of incision patterns. In the present invention, the incision patterns of the first and second masks are common. In addition, the first release paper 110 of the mask pack 100 may be provided with an incision pattern common to the first and second masks. The incision pattern common to the first release paper, the first mask, and the second mask may be formed by a cutting mold penetrating the mask pack 100 vertically.

In Figure 2, the first release paper cut patterns 112, 114A, 114B, 116, the first mask cut patterns 122, 124A, 124B, 126 and the second mask cut patterns 132, 134A, 134B , 136).

Facial elements such as eyes and nose have symmetrical left and right, but are asymmetrical up and down. Nevertheless, the present invention has an incision pattern that is applicable to asymmetric facial elements while applying a symmetrical common pattern to the upper and lower separated masks.

In the present invention, various shapes by a straight line, a curved line, a surface, or a combination thereof may be used as the incision pattern. Preferably, in the present invention, a line pattern by a straight line, a curve, or a combination thereof is used as the incision pattern.

According to an aspect of the present invention described below, some of the plurality of incision patterns of the first mask and the second mask are calm patterns corresponding to positions corresponding to facial elements such as eyes, nose, and mouth, while others are It is arranged at a position that does not correspond to the face element, and acts as a dummy pattern. Therefore, the sedation pattern of the corresponding position can provide an open state for facial elements such as eyes, nose and mouth, and at the same time, a position acting as a dummy pattern can provide a close contact state for providing full contact with the skin. To this end, the incision patterns may be formed in a foldable or bendable pattern. For example, the incision pattern may be a linear incision pattern such as a U-shape or a V-shape.

3 is a view showing a wearing state of a mask pack according to an embodiment of the present invention.

Referring to FIG. 3, a state in which the first mask 120 and the second mask 130 are disposed above and below the face, respectively.

As illustrated, the first mask 120 and the second mask 130 in the shape of a semicircle in a worn state are arranged such that the straight portion abuts them. This allows the incision patterns of each mask to be arranged in a line-symmetrical form with a straight line as a reference line.

In the wearing state, the incision patterns 124A and 124B of the first mask are calm patterns that enable the eyes to be opened corresponding to the eye position of the face, while the incision patterns 134A of the second mask, which are the corresponding dummy patterns, 134 B) has no facial elements at the bottom and covers the skin in this state. In addition, the incision pattern 122 of the second mask may be opened corresponding to the tip of the nose, while the same incision pattern 132 of the first mask is disposed at the nostril position to contact the skin. In addition, the incision pattern 136 of the second mask may be opened corresponding to the mouth position, while the corresponding dummy pattern 126 of the first mask is disposed in the dummy position.

Conventionally, an incision pattern disposed at a corresponding position such as an eye, nose, and mouth has been embodied as a surface pattern such as an opening. However, when a common pattern is applied to the upper and lower half-segmented masks as in the present invention, the pore pattern provides a non-contact state with the skin in a dummy position. However, among the U-shaped incision patterns as shown, the calm patterns 132, 124A, and 124B disposed at the placement positions of the eyes, nose, and mouth are converted to an open state by actions such as bending or folding, and placed in a dummy position When it acts as a dummy pattern 126, 122, 134A, 134B, it can ensure close contact with the skin.

The above-mentioned half-mask type mask pack of the present invention can be manufactured by a simpler manufacturing process. When the first mask sheet, the second mask sheet, and the release paper-laminated fabric are cut with a cutting mold in which an incision pattern is embossed, the incision pattern and cutting are simultaneously performed, thereby forming an upper mask and a lower mask having the same incision pattern and appearance. It will be able to manufacture all at once.

4 is a schematic diagram showing a mask pack according to another embodiment of the present invention.

Referring to FIG. 4, similar to that described with reference to FIG. 1, the mask pack has a structure in which the first mask 120 and the second mask 130 are stacked on the first release paper 110. However, the second release sheet 140 is provided between the first mask 120 and the second mask 130 and is different from the mask pack described with reference to FIG. 1. In the illustrated drawing, a plurality of incision patterns 132, 134A, 134B, and 136 on the second mask 130 are illustrated, but as described above, this incision pattern penetrates the lamination structure and is a pattern common to lower layers. .

Meanwhile, in the mask pack structure described with reference to FIG. 4, the additional release paper 140 has an advantage of facilitating the separation of the first mask and the second mask to help ease of use. In addition, the mask pack structure of FIG. 5 has an advantage that, like the mask pack described with reference to FIG. 1, the cutting pattern can be simultaneously formed and cut by one cutting mold.

5 is a schematic diagram showing a mask pack according to another embodiment of the present invention.

Referring to FIG. 5, the mask pack has a structure in which the first mask 120 and the second mask 130 are stacked on the first release paper 110. However, it differs from the mask pack described with reference to FIG. 1 in that an additional release sheet 150 is provided on the second mask 130. The second release paper 150 that is additionally provided serves to protect the mask.

Although the plurality of incision patterns 152, 154A, 154B, and 156 on the second release paper 150 are shown in the illustrated drawing, the incision pattern is a pattern common to lower layers through the stacked structure.

As described above, although the mask pack of the present invention has been described as a top and bottom separation type, the present invention can also be applied to a structure in which the upper mask and the lower mask are integrally connected and stacked by folding. Again, a common incision pattern including a calm pattern and a dummy pattern can be implemented in a simple manner similar to that described above.

As described above, the present invention has been described through the embodiments of the present invention, but the above description is only illustrative of the present invention, and the present invention is not limited thereto. Any person having ordinary knowledge in the field to which the present invention pertains without departing from the scope of the appended claims and the present invention should be regarded as belonging to the scope of the present invention to the extent that various changes can be implemented.

100 mask pack
110, 140, 150 release paper
112, 114A, 114B, 116 incision patterns
120 first mask
122, 124A, 124B, 126 incision patterns
130 second mask
132, 134A, 134B, 136 incision patterns

Claims (10)

First release paper;
A first mask laminated on the release paper; And
And a second mask stacked on the first mask,
The first mask and the second mask have a plurality of common incision patterns,
Some of the plurality of incision patterns is a calm pattern corresponding to the position of the eye, nose or mouth, and the other pattern is a dummy pattern that does not correspond to the position of the eye, nose or mouth,
The plurality of incision patterns is a vertical incision type mask pack characterized in that the linear incision pattern. First release paper;
A first mask laminated on the release paper;
A second release paper stacked on the first mask; And
It includes a second mask laminated on the second release paper,
The first mask and the second mask have a plurality of common incision patterns,
Some of the plurality of incision patterns is a calm pattern corresponding to the position of the eye, nose or mouth, and the other pattern is a dummy pattern that does not correspond to the position of the eye, nose or mouth,
The plurality of incision patterns is a vertical incision type mask pack characterized in that the linear incision pattern. First release paper;
A first mask laminated on the release paper;
A second mask laminated on the first release paper; And
It includes a second release paper laminated on the second mask,
The first mask and the second mask have a plurality of common incision patterns,
Some of the plurality of incision patterns is a calm pattern corresponding to the position of the eye, nose or mouth, and the other pattern is a dummy pattern that does not correspond to the position of the eye, nose or mouth,
The plurality of incision patterns is a vertical incision type mask pack characterized in that the linear incision pattern. delete delete The method according to any one of claims 1 to 3,
At least one of the first mask and the second mask is a vertical half-half mask pack comprising a hydrogel. The method according to any one of claims 1 to 3,
At least one of the first mask and the second mask comprises a non-woven upper and lower half-type mask pack. The method according to any one of claims 1 to 3,
The release paper, the first mask, and the second mask is a vertical half-shape mask pack characterized in that it has a common outer periphery. The method of claim 8,
The outer circumference is a semicircle mask pack, characterized in that the semicircle. According to claim 1,
The plural incision patterns include a U-shaped linear pattern and a vertical half-shape mask pack.

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