WO2019227782A1 - 量子点水凝胶、量子点图案化及转印方法 - Google Patents

量子点水凝胶、量子点图案化及转印方法 Download PDF

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WO2019227782A1
WO2019227782A1 PCT/CN2018/106339 CN2018106339W WO2019227782A1 WO 2019227782 A1 WO2019227782 A1 WO 2019227782A1 CN 2018106339 W CN2018106339 W CN 2018106339W WO 2019227782 A1 WO2019227782 A1 WO 2019227782A1
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quantum dot
hydrogel
patterning
quantum
film
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PCT/CN2018/106339
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French (fr)
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周淼
李冬泽
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深圳市华星光电技术有限公司
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Priority to US16/312,997 priority Critical patent/US20190369487A1/en
Publication of WO2019227782A1 publication Critical patent/WO2019227782A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • C08J3/03—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in aqueous media
    • C08J3/075—Macromolecular gels
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/207—Filters comprising semiconducting materials
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/24—Homopolymers or copolymers of amides or imides
    • C08J2333/26—Homopolymers or copolymers of acrylamide or methacrylamide
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/30—Sulfur-, selenium- or tellurium-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/32—Phosphorus-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/10—Encapsulated ingredients

Definitions

  • the invention relates to the field of display technology, in particular to a quantum dot hydrogel, a quantum dot patterning, and a transfer method.
  • Quantum dots are a kind of ultra-small-sized semiconductor materials with direct band-gap transition luminescence, which have quantum size effects.
  • the more common quantum dots are binary, multi-component, doped, core-shell nanoparticles, such as II-VI, II-V, III-V, and I-III-VI, with narrow fluorescence emission peaks and chromaticity Pure, high brightness and good stability. Therefore, semiconductor quantum dots have very important applications in the fields of lighting, displays, lasers, and biological fluorescent labels.
  • QDs quantum dots
  • QD films quantum dot films
  • QDPR quantum dot photoresists
  • QDINK quantum dot inks
  • quantum dots to color filter (CF) substrates is mainly patterned using quantum dot photoresistance yellow light process or quantum dot ink inkjet printing (IJP) technology. Because the quantum dots need to be cured by ultraviolet (UV) during the yellow light process, and the initiators required for photoresist curing will increase the surface defects of the quantum dots and affect the fluorescence efficiency; while quantum dot inks adjust viscosity Some poor solvents for quantum dots will also be introduced, causing the quantum dots to aggregate or block the nozzle. Therefore, the applicability of the quantum dot color filter is limited.
  • UV ultraviolet
  • the object of the present invention is to provide a quantum dot hydrogel, a method of patterning and transferring quantum dots, encapsulating the quantum dots in a hydrogel channel, protecting the surface ligands of the quantum dots, and improving the optical stability of the quantum dots. Suitable for industrial production.
  • the present invention provides a method for patterning a quantum dot, including:
  • Step 10 Load a quantum dot material with a high temperature resistant hydrogel material to form a quantum dot hydrogel
  • Step 20 forming a quantum dot hydrogel film on a metal substrate
  • Step 30 Cover the surface of the quantum dot hydrogel film with a patterning mold, and perform a nanoimprinting patterning process to obtain a patterned quantum dot hydrogel film.
  • the hydrogel material includes one or more of polyacrylamide and its derivatives.
  • the hydrogel material is polyP (AM-SSS-NVP).
  • the quantum dot material includes a light-emitting core and an inorganic protective shell;
  • the light-emitting core includes one or more of green light materials ZnCdSe 2 , InP, and Cd 2 SSe, or the light-emitting core includes a red light material One or more of CdSe, Cd 2 SeTe, and InAs;
  • the inorganic protective shell layer includes one or more of CdS, ZnSe, ZnCdS 2 , ZnS, and ZnO.
  • Step 10 includes:
  • the quantum dot hydrogel was purified.
  • the invention also provides a quantum dot transfer method, including:
  • the upper substrate is instantaneously heated at a high temperature to separate the quantum dot hydrogel film from the upper substrate.
  • a bank is prepared on the color filter substrate by using a yellow light process in advance.
  • the color filter substrate is subjected to a planarization process.
  • the quantum dot hydrogel film is a red quantum dot hydrogel film or a green quantum dot hydrogel film.
  • the invention also provides a quantum dot hydrogel, comprising: a high temperature resistant hydrogel material, and a quantum dot loaded by the high temperature resistant hydrogel material.
  • the hydrogel material used in the quantum dot hydrogel, the quantum dot patterning, and the transfer method of the present invention has low price, high utilization rate, and is suitable for industrial production.
  • the quantum dot hydrogel structure in the present invention maintains the quantum dot to the maximum extent.
  • the surface ligand coverage reduces the fluorescence loss of the quantum dots during the manufacturing process.
  • the use of quantum dot color filters can improve the fluorescence efficiency of optical devices.
  • FIG. 1 is a mechanism diagram of loading a quantum dot in a hydrogel of the present invention
  • FIG. 3 is a schematic diagram of an implementation process of a preferred embodiment of a quantum dot patterning method according to the present invention.
  • FIG. 4 is a schematic diagram of a transfer process of a quantum dot transfer method according to a preferred embodiment of the present invention.
  • the invention provides a quantum dot hydrogel, which mainly includes a high temperature resistant hydrogel material, and a quantum dot loaded by the high temperature resistant hydrogel material.
  • the hydrogel materials involved in the present invention include polyacrylamide and its derivative hydrogel microspheres, films, etc., by introducing bulky side groups, charged groups, and sulfonic acid groups into temperature-sensitive hydrogel molecules Modification methods such as monomers and hydrophobic monomers can improve their temperature resistance.
  • the decomposition temperature of such a hydrogel according to the present invention is preferably higher than 300 ° C. In the suspension polymerization process, an appropriate amount of toluene and petroleum ether are added to the oil phase to achieve the purpose of preparing porous structure polymer microspheres.
  • a quantum dot material is loaded with a high temperature resistant hydrogel P (AM-SSS-NVP) as a hydrogel material.
  • the hydrogel microspheres are made of acrylamide (AM), p-styrene sulfonic acid.
  • Sodium (SSS) and N-vinylpyrrolidone (NVP) as raw materials can be prepared by suspension polymerization.
  • the molecular formula of the hydrogel is as follows:
  • the quantum dot material involved in the present invention may include a luminescent core, the green light material may include one or more of ZnCdSe 2 , InP, and Cd 2 SSe, and the red light material may include one or more of CdSe, Cd 2 SeTe, and InAs;
  • the inorganic protective shell layer may include one or more combinations of CdS, ZnSe, ZnCdS 2 , ZnS, ZnO and other materials.
  • FIG. 1 is a mechanism diagram of a quantum gel loaded quantum dot of the present invention.
  • the invention provides a method for preparing a quantum dot hydrogel.
  • the invention adopts a hydrogel to load quantum dots, and mainly uses the photoluminescence of a quantum dot material and a hydrogel material, such as P (AM-SSS-NVP) filling. Properties, high temperature resistance and chemical resistance, to achieve the purpose of improving the optical stability of the quantum dots.
  • the loading process mainly includes three steps: removing water from the hydrogel material; loading the quantum dot material into the hydrogel material; and purifying the quantum dot hydrogel.
  • loading quantum dots with P (AM-SSS-NVP) as a hydrogel material may include:
  • the quantum dot hydrogel of the present invention filled with quantum dots in the hydrogel microspheres, can not only maintain the stability of the organic ligands on the surface of the quantum dots, but also improve its acid-base stability and maintain the original excellent optical properties.
  • the invention wraps the quantum dots in the hydrogel pores, which can protect the surface ligands of the quantum dots, maintain the quantum dot surface ligand coverage to the maximum, and reduce the fluorescence loss of the quantum dots during the manufacturing process.
  • FIG. 2 is a flowchart of a quantum dot patterning method according to the present invention
  • FIG. 3 is a schematic diagram of an implementation process of a preferred embodiment of the method, mainly including:
  • Step 10 Load a quantum dot material with a high temperature resistant hydrogel material to form a quantum dot hydrogel
  • the specific process can refer to the preparation method of the aforementioned quantum dot hydrogel.
  • Step 20 forming a quantum dot hydrogel film on a metal substrate
  • the template structure for patterning the quantum dot hydrogel film is shown in FIG. 2.
  • the mold substrate 1 is made of metal and is mainly used for the heating process when the quantum dot hydrogel film 2 on the substrate 1 is peeled off.
  • the film formation process may be specifically: spin-coated quantum dot hydrogel microsphere dispersion liquid on the metal substrate 1, and the solvent is volatilized at 100 ° C. to form the quantum dot hydrogel film 2.
  • Step 30 Cover the patterned mold on the surface of the quantum dot hydrogel film, and perform a nanoimprinting patterning process to obtain a patterned quantum dot hydrogel film;
  • the patterning mold (upper substrate) 3 can be covered on the surface of the quantum dot hydrogel film 2 to perform a nanoimprinting patterning process.
  • the present invention also provides an embodiment of a quantum dot transfer method.
  • the method mainly includes: combining an upper substrate provided with a patterned quantum dot hydrogel film with a color
  • the filter substrate is bonded in position; the upper substrate is heated at high temperature for an instant to separate the quantum dot hydrogel film from the upper substrate.
  • the patterned quantum dot hydrogel film may be a red quantum dot hydrogel film or a green quantum dot hydrogel film, or another quantum dot hydrogel film.
  • FIG. 4 it is a schematic diagram of a transfer process of a quantum dot transfer method according to a preferred embodiment of the present invention.
  • the quantum dot hydrogel transfer mainly includes a four-step process:
  • the upper substrate 100 provided with the patterned red quantum dot (QD-R) hydrogel film 101 and the color filter (CF) substrate 200 are aligned and aligned; a yellow light process is used in advance for the color filter.
  • Bank 201 is prepared on the sheet substrate 200;
  • the upper substrate (metal material) 100 is instantaneously high-temperature heated to above 250 ° C.
  • the red quantum dot hydrogel film 101 is separated from the upper substrate 100 and transferred to the color filter substrate 200;
  • the upper substrate 103 provided with the patterned green quantum dot (QD-G) hydrogel film 102 is aligned with the color filter (CF) substrate 200, and the green quantum dot hydrogel is formed in the same process.
  • the film 102 is transferred onto the color filter substrate 200;
  • the color filter substrate 200 is planarized to form a flat layer 202.
  • a nanogel imprinting technology is used to pattern the hydrogel; a microporous hydrogel is used to "load" the quantum dots to perform quantum dots. Pattern transfer; the hydrogel material used in the present invention is low in price and high in utilization rate, and is suitable for industrial production; the quantum dot hydrogel structure in the present invention maintains the quantum ligand surface ligand coverage to the greatest extent and reduces the quantum dots during the manufacturing process.
  • the loss of fluorescence, used in quantum dot color filters can improve the fluorescence efficiency of optical devices.
  • the quantum dot hydrogel, quantum dot patterning and transfer method of the present invention relates to a microporous hydrogel material for loading and transfer of quantum dots.
  • the loading characteristics of quantum dots on the hydrogel material are used.
  • a highly stable quantum dot hydrogel composite is prepared, and then the quantum dot hydrogel film coated on the substrate surface is patterned using nano-imprint technology, and the patterned quantum dot hydrogel substrate and color filters are used.
  • the substrates are aligned, and the hydrogel-side substrate is peeled off, so as to achieve the purpose of transferring the patterned quantum dot hydrogel.
  • the quantum dot hydrogels and preparation methods, quantum dot patterning, and transfer methods in the foregoing embodiments of the present invention are applicable not only to quantum dot materials, but also to other colloidal nanomaterials (Au, Ag, Cu, or other Oxides, semiconductor colloidal nanomaterials). According to the foregoing embodiments, those skilled in the art can understand that by replacing other colloidal nanomaterials such as metal nanoparticles such as Au, Ag, Cu, or other oxide nanoparticles, semiconductor colloidal nanoparticles, etc. in the foregoing embodiments of the present invention, For quantum dot materials, the present invention also provides examples of colloidal nanomaterial hydrogels, methods for preparing the same, patterning, and transfer methods.
  • the corresponding colloidal nanomaterial hydrogels mainly include: high temperature resistant hydrogel materials, and The colloidal nanomaterial loaded on the high temperature resistant hydrogel material, and the colloidal nanomaterial hydrogel can also be patterned and transferred like the quantum dot hydrogel of the present invention.
  • the hydrogel material used in the quantum dot hydrogel, the quantum dot patterning, and the transfer method of the present invention has low price, high utilization rate, and is suitable for industrial production.
  • the quantum dot hydrogel structure in the present invention maintains the quantum dot to the maximum extent.
  • the surface ligand coverage reduces the fluorescence loss of the quantum dots during the manufacturing process.
  • the use of quantum dot color filters can improve the fluorescence efficiency of optical devices.

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Abstract

一种量子点水凝胶、量子点图案化及转印方法。该量子点图案化方法包括：步骤10、以耐高温水凝胶材料装载量子点材料，形成量子点水凝胶；步骤20、在金属基板（1）上形成量子点水凝胶薄膜（2）；步骤30、将图案化模具（3）覆盖在量子点水凝胶薄膜（2）表面，进行纳米压印图案化制程，得到图案化量子点水凝胶薄膜。以及一种量子点图案化及转印方法。其中量子点水凝胶、量子点图案化及转印方法所用水凝胶材料价格低廉，利用率高，适合工业生产；量子点水凝胶结构最大限度保持量子点表面配体覆盖率，降低量子点在制程过程中的荧光损失，用于量子点彩色滤光片可提高光学器件荧光效率。

Description

量子点水凝胶、量子点图案化及转印方法 技术领域
本发明涉及显示技术领域，尤其涉及一种量子点水凝胶、量子点图案化及转印方法。
背景技术
量子点是一种直接带隙跃迁发光的超小尺寸半导体材料，具有量子尺寸效应。比较常见的量子点主要有II-VI族、II-V族、III-V族以及I-III-VI族等二元、多元、掺杂、核壳纳米粒子，其荧光发射峰窄、色度纯，亮度高，稳定性好。因此，半导体量子点在照明、显示器、激光器以及生物荧光标记等领域都有着十分重要的应用。
量子点(QDs)在显示技术领域的研究是近十年的热点，目前量子点已经用于量子点薄膜(QD Film)、量子点光刻胶(QDPR)、量子点墨水(QDINK)等项目的开发，其目的是利用量子点的高荧光效率、窄发射光谱的优点，改善显示器件的光学性质，提高亮度和色域，降低能耗等。
将量子点应用于彩色滤光片(CF)基板，主要是采用量子点光阻黄光制程或量子点墨水的喷墨打印(IJP)技术使其图案化。由于量子点在黄光制程的过程中需要经过紫外线(UV)固化，且光阻固化所需引发剂等均会增加量子点的表面缺陷，对荧光效率造成影响；而量子点墨水在调节粘度时也会引入一些量子点的不良溶剂，造成量子点聚集或阻塞喷头的现象。因此，量子点彩色滤光片的应用性受到了限制。
发明内容
因此，本发明的目的在于提供一种量子点水凝胶、量子点图案化及转印方法，将量子点包裹在水凝胶孔道内，保护量子点表面配体，提高量子点光学稳定性，适合工业生产。
为实现上述目的，本发明提供了一种量子点图案化方法，包括：
步骤10、以耐高温水凝胶材料装载量子点材料，形成量子点水凝胶；
步骤20、在金属基板上形成量子点水凝胶薄膜；
步骤30、将图案化模具覆盖在量子点水凝胶薄膜表面，进行纳米压印图案化制程，得到图案化量子点水凝胶薄膜。
其中，所述水凝胶材料包括聚丙烯酰胺及其衍生物类中的一种或多种。
其中，所述水凝胶材料为聚P(AM-SSS-NVP)。
其中，所述量子点材料包括发光核及无机保护壳层；所述发光核包括绿光材料ZnCdSe 2，InP，及Cd 2SSe中的一种或多种，或者所述发光核包括红光材料CdSe，Cd 2SeTe，及InAs中的一种或多种；所述无机保护壳层包括CdS，ZnSe，ZnCdS 2，ZnS，及ZnO中的一种或多种。
其中，步骤10包括：
将水凝胶材料除水；
将量子点材料装载于水凝胶材料中；
将量子点水凝胶提纯。
本发明还提供了一种量子点转印方法，包括：
将设有图案化量子点水凝胶薄膜的上基板与彩色滤光片基板对位贴合；
对上基板进行瞬间高温加热，使量子点水凝胶薄膜与上基板分离。
其中，预先采用黄光制程在所述彩色滤光片基板上制备好堤岸。
其中，对彩色滤光片基板进行平坦化处理。
其中，所述量子点水凝胶薄膜为红色量子点水凝胶薄膜或者绿色量子点水凝胶薄膜。
本发明还提供了一种量子点水凝胶，包括：耐高温水凝胶材料，以及由所述耐高温水凝胶材料所装载的量子点。
综上，本发明的量子点水凝胶、量子点图案化及转印方法所用水凝胶材料价格低廉，利用率高，适合工业生产；本发明中量子点水凝胶结构最大限度保持量子点表面配体覆盖率，降低量子点在制程过程中的荧光损失，用于量子点彩色滤光片可提高光学器件荧光效率。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其他有益效果显而易见。
附图中，
图1为本发明水凝胶装载量子点机制图；
图2为本发明量子点图案化方法的流程图；
图3为本发明量子点图案化方法一较佳实施例的实施过程示意图；
图4为本发明量子点转印方法一较佳实施例的转印制程示意图。
具体实施方式
本发明提供了一种量子点水凝胶，主要包括耐高温水凝胶材料，以及由所述耐高温水凝胶材料所装载的量子点。本发明所涉及的水凝胶材料包括聚丙烯酰胺及其衍生物类水凝胶微球、薄膜等，通过在温度敏感的水凝胶分子中引入庞大侧基、带电基团、含磺酸基单体和疏水单体等改性方法可以提高其耐温能力。本发明所涉及的此类水凝胶分解温度优选高于300℃。在悬浮聚合过程中，在油相中加入适量甲苯与石油醚，以达到制备多孔结构高分子聚合物微球的目的。
在本发明一实施例中，以耐高温水凝胶P(AM-SSS-NVP)为水凝胶材料装载量子点材料，该水凝胶微球以丙烯酰胺(AM)、对苯乙烯磺酸钠(SSS)和N-乙烯基吡咯烷酮(NVP)为原料，可以用悬浮聚合的方式制备，水凝胶分子式如下：
Figure PCTCN2018106339-appb-000001
本发明涉及的量子点材料可以包括发光核，绿光材料可以包括ZnCdSe 2，InP，Cd 2SSe中一种或多种，红光材料包括CdSe，Cd 2SeTe，InAs中一种或多种；无机保护壳层，可以包括CdS，ZnSe，ZnCdS 2，ZnS，ZnO等材料的一种或多种组合。
参见图1，其为本发明水凝胶装载量子点机制图。本发明提供了量子点水凝胶的制备方法，本发明采用水凝胶装载量子点，主要利用量子点材料的光致发光与水凝胶材料，具体如P(AM-SSS-NVP)的填充性、耐高温以及耐药特性，达到提高量子点光学稳定性的目的。
装载过程主要包括三步：将水凝胶材料除水；将量子点材料装载于水凝胶材料中；将量子点水凝胶提纯。
在一实施例中，以P(AM-SSS-NVP)作为水凝胶材料装载量子点，具体可以包括：
首先，将水凝胶微球浸泡于四氢呋喃，并搅拌1小时，离心后弃去上 清液，再次分散于四氢呋喃(THF)中，如此洗涤三次以上，浸入THF放置过夜，以保证除水完全；
然后，通过离心机离心，将干燥的水凝胶微球用少量THF润湿，加入量子点材料，分散于氯仿中，搅拌24小时，此时量子点材料已被装载在水凝胶微球中；
最后，在4000r/min的离心机中离心10分钟，弃去上清液，将装载量子点的纳米微球提纯。
本发明的量子点水凝胶将量子点填充于水凝胶微球，既可以保持量子点表面有机配体的稳定性，又可以提高其酸碱稳定性，保持原有的优异的光学性质。本发明将量子点包裹在水凝胶孔道内，可以保护量子点表面配体，最大限度保持量子点表面配体覆盖率，降低量子点在制程过程中的荧光损失。
参见图2及图3，图2为本发明量子点图案化方法的流程图，图3为该方法一较佳实施例的实施过程示意图，主要包括：
步骤10、以耐高温水凝胶材料装载量子点材料，形成量子点水凝胶；
具体过程可参照前述量子点水凝胶的制备方法。
步骤20、在金属基板上形成量子点水凝胶薄膜；
用于量子点水凝胶薄膜图案化的模板结构如图2所示，模具基板1为金属材质，主要用以剥离基板1上的量子点水凝胶薄膜2时的加热制程。成膜过程具体可以为：在金属基板1上旋涂量子点水凝胶微球分散液，在100℃下挥发溶剂形成量子点水凝胶薄膜2。
步骤30、将图案化模具覆盖在量子点水凝胶薄膜表面，进行纳米压印图案化制程，得到图案化量子点水凝胶薄膜；
具体可以为将图案化模具(上基板)3覆盖在量子点水凝胶薄膜2表面，进行纳米压印图案化制程。
根据上述实施例得到的图案化量子点水凝胶薄膜，本发明还提供了量子点转印方法的实施例，该方法主要包括：将设有图案化量子点水凝胶薄膜的上基板与彩色滤光片基板对位贴合；对上基板进行瞬间高温加热，使量子点水凝胶薄膜与上基板分离。图案化量子点水凝胶薄膜可以为红色量子点水凝胶薄膜或者绿色量子点水凝胶薄膜，或者其他量子点水凝胶薄膜。
参见图4，其为本发明量子点转印方法一较佳实施例的转印制程示意图。在图4所示具体实施例中，量子点水凝胶转印主要可以包括四步制程：
首先将设有图案化的红色量子点(QD-R)水凝胶薄膜101的上基板100与彩色滤光片(CF)基板200对位贴合；预先采用黄光制程在所述彩色滤 光片基板200上制备好堤岸(Bank)201；
对上基板(金属材质)100进行瞬间高温加热至250℃以上，红色量子点水凝胶薄膜101与上基板100分离，转印至彩色滤光片基板200；
通过将设有图案化的绿色量子点(QD-G)水凝胶薄膜102的上基板103与彩色滤光片(CF)基板200对位贴合，以同样的制程将绿色量子点水凝胶薄膜102转印至彩色滤光片基板200上；
最后对彩色滤光片基板200进行平坦化处理，形成平坦层202。
本发明量子点水凝胶、量子点图案化及转印方法中，利用纳米压印技术对水凝胶进行图案化处理；利用微孔水凝胶对量子点的“装载”性对量子点进行图案化转印；本发明所用水凝胶材料价格低廉，利用率高，适合工业生产；本发明中量子点水凝胶结构最大限度保持量子点表面配体覆盖率，降低量子点在制程过程中的荧光损失，用于量子点彩色滤光片可提高光学器件荧光效率。
本发明的量子点水凝胶、量子点图案化及转印方法，涉及了一种用于量子点装载及转印的微孔水凝胶材料，首先利用水凝胶材料对量子点的装载特性制备高稳定性的量子点水凝胶复合材料，然后利用纳米压印技术将涂布在基板表面的量子点水凝胶薄膜图案化处理，将图案化的量子点水凝胶基板与彩色滤光片基板对位，剥离水凝胶侧基板，从而达到转印图案化量子点水凝胶的目的。
本发明前述实施例中所涉及的量子点水凝胶及其制备方法、量子点图案化及转印方法不仅适用于量子点材料，还适用于其他胶体纳米材料(Au、Ag、Cu、或其他氧化物、半导体胶体纳米材料)。根据前述实施例，本领域技术人员可以理解，通过以其他胶体纳米材料如Au、Ag、Cu等金属纳米粒子、或其他氧化物纳米粒子、半导体胶体纳米粒子等来代替本发明前述实施例中的量子点材料，本发明同样提供了胶体纳米材料水凝胶及其制备方法、图案化及转印方法的实施例，相应的胶体纳米材料水凝胶主要包括：耐高温水凝胶材料，以及由所述耐高温水凝胶材料所装载的胶体纳米材料，并且该胶体纳米材料水凝胶也可如本发明的量子点水凝胶一样进行图案化及转印。
综上，本发明的量子点水凝胶、量子点图案化及转印方法所用水凝胶材料价格低廉，利用率高，适合工业生产；本发明中量子点水凝胶结构最大限度保持量子点表面配体覆盖率，降低量子点在制程过程中的荧光损失，用于量子点彩色滤光片可提高光学器件荧光效率。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术 方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明后附的权利要求的保护范围。

Claims (10)

  1. 一种量子点图案化方法，包括：
    步骤10、以耐高温水凝胶材料装载量子点材料，形成量子点水凝胶；
    步骤20、在金属基板上形成量子点水凝胶薄膜；
    步骤30、将图案化模具覆盖在量子点水凝胶薄膜表面，进行纳米压印图案化制程，得到图案化量子点水凝胶薄膜。
  2. 如权利要求1所述的量子点图案化方法，其中，所述水凝胶材料包括聚丙烯酰胺及其衍生物类中的一种或多种。
  3. 如权利要求1所述的量子点图案化方法，其中，所述水凝胶材料为聚P(AM-SSS-NVP)。
  4. 如权利要求1所述的量子点图案化方法，其中，所述量子点材料包括发光核及无机保护壳层；所述发光核包括绿光材料ZnCdSe2，InP，及Cd2SSe中的一种或多种，或者所述发光核包括红光材料CdSe，Cd2SeTe，及InAs中的一种或多种；所述无机保护壳层包括CdS，ZnSe，ZnCdS2，ZnS，及ZnO中的一种或多种。
  5. 如权利要求1所述的量子点图案化方法，其中，步骤10包括：
    将水凝胶材料除水；
    将量子点材料装载于水凝胶材料中；
    将量子点水凝胶提纯。
  6. 一种量子点转印方法，包括：
    将设有图案化量子点水凝胶薄膜的上基板与彩色滤光片基板对位贴合；
    对上基板进行瞬间高温加热，使量子点水凝胶薄膜与上基板分离。
  7. 如权利要求6所述的量子点转印方法，还包括预先采用黄光制程在所述彩色滤光片基板上制备好堤岸。
  8. 如权利要求6所述的量子点转印方法，还包括对彩色滤光片基板进行平坦化处理。
  9. 如权利要求6所述的量子点转印方法，其中，所述量子点水凝胶薄膜为红色量子点水凝胶薄膜或者绿色量子点水凝胶薄膜。
  10. 一种量子点水凝胶，包括：耐高温水凝胶材料，以及由所述耐高温水凝胶材料所装载的量子点。
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030099887A1 (en) * 2001-11-23 2003-05-29 Lu Chun Fu Color filters for liquid crystal display panels and method of producing the same
CN101435991A (zh) * 2007-11-15 2009-05-20 北京京东方光电科技有限公司 彩色滤光片的制造方法
CN102016814A (zh) * 2005-06-17 2011-04-13 北卡罗来纳大学查珀尔希尔分校 纳米粒子制备方法、系统及材料
CN105278153A (zh) * 2015-11-13 2016-01-27 深圳市华星光电技术有限公司 量子点彩膜基板的制备方法及量子点彩膜基板
CN105504364A (zh) * 2016-01-28 2016-04-20 安徽大学 一种高强度荧光水凝胶及其制备方法
CN105974654A (zh) * 2016-07-22 2016-09-28 京东方科技集团股份有限公司 显示基板的制备方法及显示基板、显示装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101250313B (zh) * 2008-03-19 2010-12-08 中国科学院化学研究所 纳米粒子复合物及其制备方法
CN103554925A (zh) * 2013-10-09 2014-02-05 北京理工大学 一种量子点掺杂的凝胶、其制备及应用
CN104945855A (zh) * 2014-03-24 2015-09-30 Tcl集团股份有限公司 一种量子点/环氧树脂微球及其制备方法及彩色转化膜
CN105425540B (zh) * 2016-01-04 2019-11-05 京东方科技集团股份有限公司 量子点膜及其制备方法、量子点膜的图案化方法及显示器

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030099887A1 (en) * 2001-11-23 2003-05-29 Lu Chun Fu Color filters for liquid crystal display panels and method of producing the same
CN102016814A (zh) * 2005-06-17 2011-04-13 北卡罗来纳大学查珀尔希尔分校 纳米粒子制备方法、系统及材料
CN101435991A (zh) * 2007-11-15 2009-05-20 北京京东方光电科技有限公司 彩色滤光片的制造方法
CN105278153A (zh) * 2015-11-13 2016-01-27 深圳市华星光电技术有限公司 量子点彩膜基板的制备方法及量子点彩膜基板
CN105504364A (zh) * 2016-01-28 2016-04-20 安徽大学 一种高强度荧光水凝胶及其制备方法
CN105974654A (zh) * 2016-07-22 2016-09-28 京东方科技集团股份有限公司 显示基板的制备方法及显示基板、显示装置

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