WO2019161636A1 - 彩膜基板及其制作方法 - Google Patents

彩膜基板及其制作方法 Download PDF

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Publication number
WO2019161636A1
WO2019161636A1 PCT/CN2018/096294 CN2018096294W WO2019161636A1 WO 2019161636 A1 WO2019161636 A1 WO 2019161636A1 CN 2018096294 W CN2018096294 W CN 2018096294W WO 2019161636 A1 WO2019161636 A1 WO 2019161636A1
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Prior art keywords
color resist
secondary color
resist
color
resistance
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PCT/CN2018/096294
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English (en)
French (fr)
Inventor
胡云钦
Original Assignee
惠科股份有限公司
重庆惠科金渝光电科技有限公司
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Priority to US16/327,062 priority Critical patent/US20210325722A1/en
Publication of WO2019161636A1 publication Critical patent/WO2019161636A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/52—RGB geometrical arrangements

Definitions

  • Embodiments of the present disclosure relate to display technologies, and in particular, to a color film substrate and a method of fabricating the same.
  • RGBW liquid crystal display technology is to add white sub-pixel (W) sub-pixels to traditional RGB pixels composed of red (R) sub-pixels, green (G) sub-pixels, and blue (B) sub-pixels, and then apply corresponding Sub-pixel imaging technology, which arranges the corresponding sub-pixels accordingly. This ensures that images that are not visible to the human eye are generated without loss of display power and brightness.
  • the RGBW pixel design is brighter and has a higher resolution than the traditional RGB pixel design.
  • Embodiments of the present disclosure provide a color film substrate and a method of fabricating the same to achieve a manufacturing cost of saving a color film substrate.
  • Embodiments of the present disclosure provide a color filter substrate including: a substrate substrate; and a plurality of pixel units.
  • the plurality of pixel units are disposed on the base substrate and arranged in an array, a first side of the array extends along a first direction, and a second side of the matrix extends along a second direction, the first The direction is substantially perpendicular to the second direction.
  • Each of the pixel units includes a first color resist, a second color resist, a third color resist, and a fourth color resist.
  • the fourth color resist includes a first secondary color resistance, a second secondary color resistance, and a third secondary color resistance, the first secondary color resistance, the second secondary color resistance, and the third The area of the secondary color resistance is equal.
  • the first secondary color resistance and the first color resistance are made of a first material
  • the second secondary color resistance and the second color resistance are made of a second material
  • the third secondary color resistance is
  • the third color resist is made of a third material.
  • Embodiments of the present disclosure provide a color filter substrate including: a substrate substrate, an opaque layer formed of an opaque material disposed on the substrate, and a pixel unit.
  • a first opening, a second opening, a third opening, and a fourth opening exposing the base substrate, wherein the fourth opening is composed of a first area, a second area, and a third area .
  • the pixel unit is composed of a first color resist, a second color resist, a third color resist, a first sub color resist, a second sub color resist, and a third sub color resist.
  • the first color resist is disposed in the first opening
  • the second color resist is disposed in the second opening
  • the third color resist is disposed in the third opening
  • the color resistance is disposed in the first region of the fourth opening
  • the second sub color resist is disposed in the second region of the fourth opening
  • the third sub color resist is disposed in the third region of the fourth opening.
  • the first opening, the second opening, the third opening, and the fourth opening are sequentially arranged along the first direction.
  • the first region, the second region, and the third region of the fourth opening are equal in area.
  • the first sub color resist and the first color resist are made of a first material
  • the second sub color resist and the second color resist are made of a second material
  • the third sub color resist is The third color resist is made of a third material.
  • the embodiment of the present disclosure further provides a method for fabricating a color filter substrate, comprising: providing a substrate; forming an opaque material layer on the substrate; forming the substrate on the opaque material layer a plurality of sets of openings of the substrate, wherein the plurality of sets of openings are arranged in an array, a first side of the array extends along a first direction, and a second side of the matrix extends along a second direction, the first direction and The second direction is substantially perpendicular, each set of openings includes a first opening, a second opening, a third opening, and a fourth opening, the first opening, the second opening, the third opening, and the fourth opening along the second direction Aligning sequentially, the fourth opening includes a first region, a second region, and a third region; the first opening and the first region of the fourth opening in each of the sets of openings simultaneously form a first color resist using the first material And a first secondary color resist; a second region in each of the sets of openings and a second region of the fourth opening
  • the color film substrate provided by the embodiment of the present disclosure includes a first color resist, a second color resist, a third color resist, and a fourth color resist
  • the fourth color resist includes a first secondary color resist, a second secondary color resist, and a first color resist.
  • the three secondary color resists, the first secondary color resist and the first color resist are made of the same material
  • the second secondary color resist and the second color resist are made of the same material
  • the resistor is made of the same material.
  • the first color resistance is red color resistance
  • the red color resistance is red light
  • the second color resistance is green color resistance
  • the green color resistance is green light.
  • the third color resistance is blue color resistance, and the outgoing light passing through the blue color resistance is blue light; in the prior art, the fourth color resistance is white color resistance, and the white light resistance is white light.
  • the prior art requires coating four color resist materials on the base substrate of the color filter substrate.
  • the first secondary color resist is made of the same material as the red color resist
  • the second secondary color resist is made of the same material as the green color resist
  • the third secondary color resist is made of the blue color resist.
  • the red light is emitted through the first secondary color resisting light
  • the green light is emitted through the second secondary color resisting light
  • the blue light is emitted through the third secondary color resisting light
  • the areas of the color resist, the second secondary color resist, and the third secondary color resist are equal, so that the emitted light passing through the first secondary color resist emits red light, the emitted light passing through the second secondary color resist emits green light, and The emitted light that has passed through the third secondary color resist emits blue light and is emitted as white light.
  • the embodiment of the present disclosure only needs to apply three color resist materials on the base substrate of the color film substrate, thereby achieving the effect of saving the manufacturing cost of the color film substrate.
  • FIG. 1 is a schematic top plan view of a color filter substrate according to an embodiment of the present disclosure.
  • FIG. 2 is a schematic enlarged view of the S1 region of FIG. 1.
  • FIG. 2 is a schematic enlarged view of the S1 region of FIG. 1.
  • FIG. 3 is a schematic view showing another enlarged structure of the S1 region of FIG. 1.
  • FIG. 4 is a schematic view showing another enlarged structure of the S1 region of FIG. 1.
  • FIG. 5 is a schematic view showing another enlarged structure of the S1 region of FIG. 1.
  • Fig. 6 is a schematic view showing another enlarged structure of the S1 region of Fig. 1.
  • Fig. 7 is a schematic view showing another enlarged structure of the S1 region of Fig. 1.
  • FIG. 8 to FIG. 11 are schematic diagrams showing the fabrication of a color filter substrate according to an embodiment of the present disclosure.
  • FIG. 1 is a schematic top plan view of a color filter substrate according to an embodiment of the present disclosure
  • FIG. 2 is a schematic enlarged view of the S1 region of FIG. 1 and 2
  • the color filter substrate includes a base substrate 10 and a plurality of pixel units 20 on the base substrate 10.
  • the plurality of pixel units 20 are arranged in an array along the first direction and the second direction, and the first direction and the second direction intersect.
  • Each of the pixel units 20 includes a first color resist 21, a second color resist 22, a third color resist 23, and a fourth color resist 24.
  • the fourth color resist 24 includes a first secondary color resist 241, a second secondary color resist 242, and a third secondary color resist 243.
  • the areas of the first secondary color resist 241, the second secondary color resist 242, and the third secondary color resist 243 are equal.
  • the first secondary color resist 241 and the first color resist 21 are made of the same material, and the second secondary color resist 242 and the second color resist 22 are made of the same material, and the third secondary color resist 243 and the third color resist. 23 made of the same material.
  • the color film substrate provided by the embodiment of the present disclosure includes a first color resist 21, a second color resist 22, a third color resist 23 and a fourth color resist 24, and the fourth color resist 24 includes a first secondary color resist 241 and a second color.
  • the secondary color resist 242 and the third secondary color resist 243, the first secondary color resist 241 and the first color resist 21 are made of the same material, and the second secondary color resist 242 and the second color resist 22 are made of the same material.
  • the third secondary color resist 243 and the third color resist 23 are made of the same material.
  • the first color resist 21 is a red color resist
  • the red light resisting light is red light
  • the second color resist 22 is a green color resist
  • the green color resisting light is green light
  • the third color resist is emitted
  • 23 is a blue color resistance
  • the light emitted through the blue color resistance is blue light.
  • the fourth color resistance is white color resistance, and the light emitted through the white color resistance is white light.
  • the first color resist 21 is a red color resist
  • the second color resist 22 is a green color resist
  • the third color resist 23 is a blue color resist
  • the first secondary color resist 241 is a red color resist.
  • the two secondary color resists 242 are green color resists
  • the third secondary color resists 243 are blue color resists.
  • the emitted light passing through the first secondary color resist 241 emits red light
  • the outgoing light passing through the second secondary color resist 242 emits green light
  • the outgoing light passing through the third secondary color resist 243 emits blue light.
  • the outgoing light passing through the first secondary color resist 241 emits red light and passes through the second secondary color.
  • the emitted light of the resistor 242 emits green light and the outgoing light that has passed through the third secondary color resist 243 emits blue light and the emitted light is white light.
  • the shapes of the first color resist 21, the second color resist 22, the third color resist 23, and the fourth color resist 24 are all rectangular, and the first color resist 21, the second color resist 22, and the second color resist
  • the longitudinal directions of the three color resists 23 and the fourth color resist 24 extend in the first direction, and the short sides of the first color resist 21, the second color resist 22, the third color resist 23, and the fourth color resist 24 are all along The second direction extends.
  • the first color resist 21, the second color resist 22, the third color resist 23, and the fourth color resist 24 are sequentially arranged in the second direction. That is, in the second direction, the second color resist 22 is located between the first color resist 21 and the third color resist 23, and the third color resist 23 is located between the second color resist 22 and the fourth color resist 24.
  • the plurality of pixel units 20 are repeatedly arranged along the second direction, and the plurality of pixel units 20 are also repeatedly arranged along the first direction.
  • the plurality of pixel units 20 are on the substrate.
  • the substrates 10 are arranged in a matrix.
  • the first pixel unit 201 and the second pixel unit 202 are adjacent, and the fourth color resist 24 and the second pixel unit in the first pixel unit 201 are adjacent.
  • the first color resists 21 in 202 are adjacent.
  • “A and B adjacent” in the present disclosure means that the distance between A and B is less than a set threshold, and A and B may be in direct contact or there may be other objects between A and B.
  • the color filter substrate further includes a black matrix 30.
  • the black matrix 30 is provided with a grid-shaped open area.
  • the first color resist 21, the second color resist 22, the third color resist 23, and the fourth color resist 24 are distributed in the opening region of the grid-like distribution (within the gap of the black matrix 30).
  • the first secondary color resist 241 in the first pixel unit 201 is adjacent to the first color resist 21 in the second pixel unit 202.
  • the first secondary color resist 241 in the first pixel unit 201 and the first color resist 21 in the second pixel unit 202 are separated by the black matrix 30.
  • the distance between the first secondary color resist 241 and the first color resist 21 in the second pixel unit 202 is less than a set threshold.
  • the first secondary color resistance 241 in the first pixel unit 201 is very close to the first color resistance 21 in the second pixel unit 202. It can be understood that since the first secondary color resist 241 and the first color resist 21 are made of the same material, the third secondary color resist 243 and the third color resist 23 are made of the same material, so each first is set.
  • the secondary color resist 241 is adjacent to the first color resist 21 in the pixel unit 20 in contact with the pixel unit 20 in which it is located, and each of the third secondary color resists 243 and the third color resist 23 in the pixel unit 20 therewith Adjacent, the patterning process in the process of producing a color film substrate can be simplified.
  • the present disclosure provides some examples of the shapes of the first secondary color resist, the second secondary color resist, and the third secondary color resist, and their distribution in the fourth color resist, but is not a limitation of the present disclosure, and those skilled in the art Variations can be obtained from these examples given in this disclosure.
  • each fourth color resist 24 the shapes of the first secondary color resist 241, the second secondary color resist 242, and the third secondary color resist 243 are all rectangular, and the first secondary color resist 241.
  • the longitudinal directions of the second secondary color resist 242 and the third secondary color resist 243 both extend in the first direction, and the first secondary color resist 241, the second secondary color resist 242, and the third secondary color resist 243 The short side directions all extend in the second direction.
  • the first secondary color resist 241, the second secondary color resist 242 and the third secondary color resist 243 are sequentially arranged in the second direction, and in the second direction, the second secondary color resist 242 is located in the first secondary color Between the resistor 241 and the third secondary color resist 243.
  • the first secondary color resist 241, the second secondary color resist 242, and the third secondary color resist 243 may have the same shape, the same short side length, and the same long side length, the first secondary color resist 241, the first The sum of the short side lengths of the two secondary color resists 242 and the third secondary color resist 243 is equal to the short side length of the fourth color resist 24.
  • FIG. 3 is a schematic view showing another enlarged structure of the S1 region in FIG. 1.
  • the first secondary color resist 241, the second secondary color resist 242, and the third time The shape of the color resist 243 is rectangular. Alternatively, the shapes of the first secondary color resist 241, the second secondary color resist 242, and the third secondary color resist 243 are all square.
  • the first secondary color resist 241, the second secondary color resist 242 and the third secondary color resist 243 are sequentially arranged in the first direction, and the second secondary color resist 242 is located in the first secondary color resist in the first direction. Between 241 and the third secondary color resist 243.
  • the shapes of the first secondary color resist 241 and the second secondary color resist 242 are The rectangular shape, the longitudinal direction of the first secondary color resist 241 and the second secondary color resist 242 all extend in the first direction, and the short side directions of the first secondary color resist 241 and the second secondary color resist 242 are both Extend in two directions.
  • the sum of the short sides of the first secondary color resist 241 and the short sides of the second secondary color resist 242 is equal to the short side length of the fourth color resist 24.
  • the shape of the third secondary color resist 243 is a rectangle, and optionally, the shape of the third secondary color resist 243 is a square.
  • the first secondary color resist 241 and the second secondary color resist 242 are symmetrically disposed, and the sum of the short side length of the first secondary color resist 241 and the short side length of the second secondary color resist 242 is equal to the third secondary The length of the side where the color resist 243 is in contact with the first secondary color resist 241 and the second secondary color resist 242.
  • FIG. 5 is a schematic view showing another enlarged structure of the S1 region of FIG. 1.
  • the shapes of the first secondary color resist 241 and the third secondary color resist 243 are both
  • the shape of the second secondary color resist 242 is an isosceles triangle.
  • the first secondary color resist 241 and the third secondary color resist 243 are axially symmetrically distributed with respect to the vertical line L1 of the bottom edge of the second secondary color resist 242, and the vertical line L1 of the bottom side of the second secondary color resist 242 Extending in the first direction.
  • the sum of the bottom edges of the first secondary color resist 241 and the third secondary color resist 243 is equal to the short side length of the fourth color resist 24, and the base length of the second secondary color resist 242 is also the same as that of the fourth color resist 24.
  • the short sides are equal in length.
  • the length of one right-angled side of the first secondary color resist 241 is equal to the length of the long side of the fourth color resist 24, and similarly, the third secondary color resist 243 is on the side of the first secondary color resist 241 symmetrically disposed with respect to L1. The length is also equal to the length of the long side of the fourth color resist 24.
  • FIG. 6 is a schematic view showing another enlarged structure of the S1 region of FIG. 1.
  • the shapes of the first secondary color resist 241 and the third secondary color resist 243 are both
  • the shape of the second secondary color resist 242 is an isosceles triangle.
  • the first secondary color resist 241 and the third secondary color resist 243 are axially symmetrically distributed with respect to the vertical line L2 of the bottom edge of the second secondary color resist 242, and the vertical line L2 of the bottom side of the second secondary color resist 242 Extending in the second direction.
  • the lengths of the bottom sides of the first secondary color resist 241 and the third secondary color resist 243 are equal to the length of the short side of the fourth color resist 24, and the height of the second secondary color resist 242 is also the short side of the fourth color resist. The length is equal.
  • FIG. 7 is a schematic view showing another enlarged structure of the S1 region of FIG. 1.
  • the shapes of the first secondary color resist 241 and the third secondary color resist 243 are both
  • the shape of the second secondary color resist 242 is a parallelogram.
  • the first secondary color resist 241, the second secondary color resist 242 and the third secondary color resist 243 are sequentially arranged in the first direction, and the second secondary color resist 242 is located in the first secondary color resist in the first direction. Between 241 and the third secondary color resist 243.
  • the base lengths of the first secondary color resist 241 and the third secondary color resist 243 are both equal to the short side length of the fourth color resist 24, and the first secondary color resist 241 and the third secondary color resist 243 are related to the second
  • the geometric center of the secondary color resist 242 is centrally symmetric.
  • the geometric center of the second secondary color resist 242 is the intersection of its two diagonal lines.
  • the present disclosure also provides another color film substrate.
  • the color filter substrate includes: a base substrate, an opaque layer formed of an opaque material disposed on the base substrate, and a pixel unit.
  • a first opening, a second opening, a third opening, and a fourth opening exposing the base substrate, wherein the fourth opening is composed of a first area, a second area, and a third area .
  • the pixel unit is composed of a first color resist, a second color resist, a third color resist, a first sub color resist, a second sub color resist, and a third sub color resist.
  • the first color resist is disposed in the first opening
  • the second color resist is disposed in the second opening
  • the third color resist is disposed in the third opening
  • the color resistance is disposed in the first region of the fourth opening
  • the second sub color resist is disposed in the second region of the fourth opening
  • the third sub color resist is disposed in the third region of the fourth opening.
  • the first opening, the second opening, the third opening, and the fourth opening are sequentially arranged along the first direction.
  • the first region, the second region, and the third region of the fourth opening are equal in area.
  • the first sub color resist and the first color resist are made of a first material
  • the second sub color resist and the second color resist are made of a second material
  • the third sub color resist is The third color resist is made of a third material.
  • the first opening, the second opening, the third opening, and the fourth opening are both rectangular, and the first area, the second area, and the third area of the fourth opening are both rectangular and along The second direction is sequentially arranged.
  • Embodiments of the present disclosure also provide a method of fabricating a color film substrate.
  • 8 to 11 are plan views of various stages of the method of fabricating the color filter substrate. Referring to FIGS. 8 to 11 and FIG. 2, a method of fabricating a color filter substrate includes the following steps.
  • a substrate substrate 10 is provided.
  • the first color resist 21 and the first secondary color resist 241 are simultaneously formed on the base substrate 10 using the first material.
  • the second color resist 22 and the second secondary color resist 242 are simultaneously formed on the base substrate 10 using the second material.
  • the third color resist 23 and the third secondary color resist 243 are simultaneously formed on the base substrate 10 using the third material.
  • the first secondary color resist 241, the second secondary color resist 242, and the third secondary color resist 243 constitute a fourth color resist 24, and the first secondary color resist 241, the second secondary color resist 242, and the third time The areas of the color resists 243 are equal.
  • the first secondary color resist 241 and the first color resist 21 are formed by the same material in the same process, and the second secondary color resist 242 and the second color resist are formed.
  • 22 is formed by the same material in the same process
  • the third secondary color resist 243 and the third color resist 23 are formed by the same material in the same process
  • the first secondary color resist 241 and the second secondary color resist are formed.
  • 242 and the third secondary color resist 243 constitute a fourth color resist 24, and the first color resist 21, the second color resist 22, the third color resist 23, and the fourth color resist 24 constitute one pixel unit 20, and the plurality of pixel units 20
  • the arrays can be arranged in an array on the array substrate 10 (Figs.
  • the first color resist 21 is a red color resist
  • the second color resist 22 is a green color resist
  • the third color resist 23 is a blue color resist.
  • a black matrix 30 is formed on the base substrate 10.
  • the black matrix 30 includes a plurality of open regions, and the plurality of open regions expose the base substrate 10.
  • the first color resist 21, the second color resist 22, the third color resist 23, and the fourth color resist 24 are formed in a plurality of open regions of the black matrix 30.
  • the first secondary color resist 241 of each pixel unit 20 is adjacent to the first color resist 21 in the adjacent pixel unit 20, and each third secondary color The resistor 243 is adjacent to the third color resistor 23 in the same pixel unit 20.
  • the advantage of this arrangement is that the patterning process in the process of producing a color film substrate can be simplified.
  • the present disclosure also provides a method of fabricating another color film substrate. As shown in FIGS. 8 to 11, the method for fabricating the color filter substrate includes the following steps.
  • a base substrate 10 is provided.
  • an opaque material layer 30 is formed on the base substrate 10.
  • a plurality of sets of openings exposing the base substrate 10 are formed on the opaque material layer.
  • the plurality of sets of openings are arranged in an array, the first side of the array extends along a first direction, the second side of the matrix extends along a second direction, the first direction and the second direction are substantially perpendicular,
  • Each set of openings includes a first opening, a second opening, a third opening, and a fourth opening, the first opening, the second opening, the third opening and the fourth opening are sequentially arranged along the second direction, the fourth opening
  • the first area, the second area, and the third area are included.
  • a second material in the second opening and the fourth opening of each of the sets of openings simultaneously forms a second color resist 22 and a second secondary color resist 242 using a second material.
  • a third material in the third opening and the fourth opening in each of the sets of openings simultaneously forms a third color resist 23 and a third secondary color resist 243.
  • the first area of the fourth opening, the second area and the third area are equal in area.
  • the first opening, the second opening, the third opening, and the fourth opening are equal in area.
  • the opaque material is absent between the first secondary color resist, the second secondary color resist, and the third secondary color resist.
  • each of the first secondary color resists is separated from the corresponding first color resist by the opaque material, each third secondary color resist and third The color resistance is separated by the opaque material.

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Abstract

本公开提供一种彩膜基板及其制作方法，彩膜基板包括：衬底基板；多个像素单元，位于所述衬底基板一侧，且沿第一方向和第二方向呈阵列排布，所述第一方向和所述第二方向交叉；任一所述像素单元包括第一色阻、第二色阻、第三色阻和第四色阻；所述第四色阻包括第一次级色阻、第二次级色阻和第三次级色阻，所述第一次级色阻、所述第二次级色阻和所述第三次级色阻的面积相等；所述第一次级色阻与所述第一色阻采用同种材料制作，所述第二次级色阻与所述第二色阻采用同种材料制作，所述第三次级色阻与所述第三色阻采用同种材料制作。本公开实现了节省彩膜基板的制作成本。

Description

彩膜基板及其制作方法
本申请要求在2018年2月26日提交中国专利局、申请号为201810162681.X的中国专利申请的优先权，该申请的全部内容通过引用结合在本申请中。
技术领域
本公开实施例涉及显示技术，尤其涉及一种彩膜基板及其制作方法。
背景技术
RGBW液晶显示技术的原理是将白色子像素(W)子像素添加到由红(R)子像素、绿(G)子像素、蓝(B)子像素组成的传统RGB像素中，然后应用相应的子像素成像技术，对那些子像素进行相应的排列。这样就能够确保生成那些不能被人眼所看见的图像时，不会损耗显示屏功率以及亮度源。RGBW像素设计相对于传统的RGB像素设计显示屏更明亮、分辨率更高。
但是，制造RGBW四色子像素，需要在彩膜基板的衬底基板上涂布四种色阻材料，因此导致基板物料成本上升，并且制造过程也比较复杂。
发明内容
本公开实施例提供一种彩膜基板及其制作方法，以实现节省彩膜基板的制作成本。
本公开实施例提供一种彩膜基板，包括：衬底基板；以及多个像素单元。
所述多个像素单元位于所述衬底基板上，且呈阵列排布，所述阵列的第一 边沿着第一方向延伸，所述矩阵的第二边沿着第二方向延伸，所述第一方向和所述第二方向基本垂直。每个所述像素单元包括第一色阻、第二色阻、第三色阻和第四色阻。所述第四色阻包括第一次级色阻、第二次级色阻和第三次级色阻，所述第一次级色阻、所述第二次级色阻和所述第三次级色阻的面积相等。所述第一次级色阻与所述第一色阻采用第一材料制作，所述第二次级色阻与所述第二色阻采用第二材料制作，所述第三次级色阻与所述第三色阻采用第三材料制作。
本公开实施例提供一种彩膜基板，包括：衬底基板、设置在所述衬底基板上的由不透光材料形成不透光层、以及像素单元。
所述不透光层上形成有暴露所述衬底基板的第一开口、第二开口、第三开口和第四开口，所述第四开口由第一区域、第二区域和第三区域组成。
所述像素单元由第一色阻、第二色阻、第三色阻、第一子色阻、第二子色阻和第三子色阻组成。所述第一色阻设置于所述第一开口内，所述第二色阻设置于所述第二开口内，所述第三色阻设置于所述第三开口内，所述第一子色阻设置于所述第四开口的第一区域，所述第二子色阻设置于第四开口的第二区域，所述第三子色阻设置于第四开口的第三区域。
所述第一开口、第二开口、第三开口和第四开口沿着第一方向依次排列。所述第四开口的第一区域、第二区域和第三区域面积相等。所述第一子色阻与所述第一色阻采用第一材料制成，所述第二子色阻与所述第二色阻采用第二材料制成，所述第三子色阻与所述第三色阻采用第三材料制成。
本公开实施例还提供一种彩膜基板的制作方法，包括：提供一衬底基板；在衬底基板上形成不透光材料层；在所述不透光材料层上形成暴露所述衬底基板的多组开口，其中，所述多组开口呈阵列排布，所述阵列的第一边沿着第一 方向延伸，所述矩阵的第二边沿着第二方向延伸，所述第一方向和所述第二方向基本垂直，每组开口包括第一开口、第二开口、第三开口和第四开口，所述第一开口，第二开口，第三开口和第四开口沿着第二方向依次排列，所述第四开口包括第一区域、第二区域和第三区域；在所述每组开口中的第一开口和第四开口的第一区域采用第一材料同时形成第一色阻和第一次级色阻；在所述每组开口中的第二开口和第四开口的第二区域采用第二材料同时形成第二色阻和第二次级色阻；以及在所述每组开口中的第三开口和第四开口的第三区域采用第三材料同时形成第三色阻和第三次级色阻。第四开口的第一区域，第二区域和第三区域面积相等。
本公开实施例提供的彩膜基板包括第一色阻、第二色阻、第三色阻和第四色阻，第四色阻包括第一次级色阻、第二次级色阻和第三次级色阻，第一次级色阻与第一色阻采用同种材料制作，第二次级色阻与第二色阻采用同种材料制作，第三次级色阻与第三色阻采用同种材料制作，示例性地，第一色阻为红色色阻，经过红色色阻的出射光为红光；第二色阻为绿色色阻，经过绿色色阻的出射光为绿光；第三色阻为蓝色色阻，经过蓝色色阻的出射光为蓝光；现有技术中第四色阻为白色色阻，经过白色色阻的出射光为白光。在制作彩膜基板时，现有技术需要在彩膜基板的衬底基板上涂布四种色阻材料。本公开的一个示例中，第一次级色阻采用与红色色阻相同的材料制作，第二次级色阻采用与绿色色阻相同的材料制作，第三次级色阻采用与蓝色色阻相同的材料制作，经过第一次级色阻的出射光发出红光，经过第二次级色阻的出射光发出绿光，经过第三次级色阻的出射光发出蓝光，由于第一次级色阻、第二次级色阻和第三次级色阻的面积相等，所以经过第一次级色阻的出射光发出红光、经过第二次级色阻的出射光发出绿光以及经过第三次级色阻的出射光发出蓝光混合后的出射光 为白光。在制作彩膜基板时，本公开实施例仅需要在彩膜基板的衬底基板上涂布三种色阻材料，从而实现了节省彩膜基板的制作成本的效果。
附图说明
图1为本公开实施例提供的一种彩膜基板的俯视结构示意图。
图2为图1中S1区域的一种放大结构示意图。
图3为图1中S1区域的另一种放大结构示意图。
图4为图1中S1区域的另一种放大结构示意图。
图5为图1中S1区域的另一种放大结构示意图。
图6为图1中S1区域的另一种放大结构示意图。
图7为图1中S1区域的另一种放大结构示意图。
图8～图11为本公开实施例提供的一种彩膜基板的制作示意图。
具体实施方式
下面结合附图和实施例对本公开作进一步的详细说明。可以理解的是，此处所描述的具体实施例仅仅用于解释本公开，而非对本公开的限定。另外还需要说明的是，为了便于描述，附图中仅示出了与本公开相关的部分而非全部结构。
图1为本公开实施例提供的一种彩膜基板的俯视结构示意图，图2为图1中S1区域的一种放大结构示意图。结合图1和图2所示，彩膜基板包括衬底基板10和位于衬底基板10上的多个像素单元20。多个像素单元20沿第一方向和第二方向呈阵列排布，第一方向和第二方向交叉。每个像素单元20包括第一色阻21、第二色阻22、第三色阻23和第四色阻24。第四色阻24包括第一次级色阻241、第二 次级色阻242和第三次级色阻243。第一次级色阻241、第二次级色阻242和第三次级色阻243的面积相等。第一次级色阻241与第一色阻21采用同种材料制作，第二次级色阻242与第二色阻22采用同种材料制作，第三次级色阻243与第三色阻23采用同种材料制作。
本公开实施例提供的彩膜基板包括第一色阻21、第二色阻22、第三色阻23和第四色阻24，第四色阻24包括第一次级色阻241、第二次级色阻242和第三次级色阻243，第一次级色阻241与第一色阻21采用同种材料制作，第二次级色阻242与第二色阻22采用同种材料制作，第三次级色阻243与第三色阻23采用同种材料制作。示例性地，第一色阻21为红色色阻，经过红色色阻的出射光为红光；第二色阻22为绿色色阻，经过绿色色阻的出射光为绿光；第三色阻23为蓝色色阻，经过蓝色色阻的出射光为蓝光。相关技术中第四色阻为白色色阻，经过白色色阻的出射光为白光。在制作彩膜基板时，需要在彩膜基板的衬底基板上涂布四种色阻材料。本公开的一个示例中，第一色阻21为红色色阻，第二色阻22为绿色色阻，第三色阻23为蓝色色阻，第一次级色阻241为红色色阻，第二次级色阻242为绿色色阻，第三次级色阻243为蓝色色阻。经过第一次级色阻241的出射光发出红光，经过第二次级色阻242的出射光发出绿光，经过第三次级色阻243的出射光发出蓝光。由于第一次级色阻241、第二次级色阻242和第三次级色阻243的面积相等，所以经过第一次级色阻241的出射光发出红光、经过第二次级色阻242的出射光发出绿光以及经过第三次级色阻243的出射光发出蓝光混合后的出射光为白光。在制作彩膜基板时，本公开实施例仅需要在彩膜基板的衬底基板10上涂布三种色阻材料，从而实现了节省彩膜基板的制作成本的效果。
可选地，参考图2，第一色阻21、第二色阻22、第三色阻23和第四色阻24的形状均为长方形，第一色阻21、第二色阻22、第三色阻23和第四色阻24的长边 方向均沿第一方向延伸，第一色阻21、第二色阻22、第三色阻23和第四色阻24的短边方向均沿第二方向延伸。
可选地，参考图2，在每个像素单元20中，第一色阻21、第二色阻22、第三色阻23和第四色阻24沿第二方向顺次排列。即，沿第二方向上，第二色阻22位于第一色阻21和第三色阻23之间，第三色阻23位于第二色阻22和第四色阻24之间。
可选地，参考图1和图2，沿第二方向上多个像素单元20重复排列，沿第一方向上多个像素单元20也重复排列，整体而言，多个像素单元20在衬底基板10上呈矩阵排列。示例性地，由于像素单元20沿第二方向重复排列，第一个像素单元201和第二个像素单元202相邻，第一个像素单元201中的第四色阻24与第二个像素单元202中的第一色阻21相邻。需要说明的是，本公开中“A与B相邻”指的是A与B之间的距离小于设定阈值，A与B可以直接接触或者A与B之间有其他物体。
可选地，参考图2，彩膜基板还包括黑矩阵30。黑矩阵30上设置有网格状分布的开口区域。第一色阻21、第二色阻22、第三色阻23和第四色阻24分布在网格状分布的开口区域内(黑矩阵30的空隙内)。
可选地，参考图2，第一个像素单元201中的第一次级色阻241与第二个像素单元202中的第一色阻21相邻。第一个像素单元201中的第一次级色阻241与第二个像素单元202中的第一色阻21被黑矩阵30隔开。第一个像素单元201中的第一次级色阻241与第二个像素单元202中的第一色阻21之间无其他色阻或次级色阻，且第一个像素单元201中的第一次级色阻241与第二个像素单元202中的第一色阻21之间的距离小于设定阈值。即第一个像素单元201中的第一次级色阻241非常接近第二个像素单元202中的第一色阻21。可以理解的是，由于第一次级色阻 241和第一色阻21采用相同的材料制作，第三次级色阻243和第三色阻23采用相同的材料制作，因此设置每个第一次级色阻241和与之所在像素单元20相接触的像素单元20中的第一色阻21相邻，每个第三次级色阻243和与之所在像素单元20中第三色阻23相邻，可以简化彩膜基板制作过程中的构图工艺。
本公开提供第一次级色阻、第二次级色阻和第三次级色阻的形状以及它们在第四色阻中的分布的一些示例，但并非对本公开的限定，本领域技术人员可以根据本公开给出的这些示例得到变形。
参考图2，每个第四色阻24中，第一次级色阻241、第二次级色阻242和第三次级色阻243的形状均为长方形，第一次级色阻241、第二次级色阻242和第三次级色阻243的长边方向均沿第一方向延伸，第一次级色阻241、第二次级色阻242和第三次级色阻243的短边方向均沿第二方向延伸。第一次级色阻241、第二次级色阻242和第三次级色阻243沿第二方向顺次排列，沿第二方向上，第二次级色阻242位于第一次级色阻241和第三次级色阻243之间。第一次级色阻241、第二次级色阻242和第三次级色阻243可以具有相同的形状、相同的短边长度和相同的长边长度，第一次级色阻241、第二次级色阻242和第三次级色阻243的短边长度之和等于第四色阻24的短边长度。
图3为图1中S1区域的另一种放大结构示意图，如图3所示，每个第四色阻24中，第一次级色阻241、第二次级色阻242和第三次级色阻243的形状均为矩形，可选地，第一次级色阻241、第二次级色阻242和第三次级色阻243的形状均为正方形。第一次级色阻241、第二次级色阻242和第三次级色阻243沿第一方向顺次排列，第二次级色阻242沿第一方向上位于第一次级色阻241和第三次级色阻243之间。第一次级色阻241中平行于第一方向的边长、第二次级色阻242中平行于第一方向的边长、第三次级色阻243中平行于第一方向的边长三者之和，与第四 色阻24的长边长度相等。
图4为图1中S1区域的另一种放大结构示意图，如图4所示，每个第四色阻24中，第一次级色阻241和第二次级色阻242的形状均为长方形，第一次级色阻241和第二次级色阻242的长边方向均沿第一方向延伸，第一次级色阻241和第二次级色阻242的短边方向均沿第二方向延伸。第一次级色阻241的短边和第二次级色阻242的短边的长度之和等于第四色阻24的短边长度。第三次级色阻243的形状为矩形，可选地，第三次级色阻243的形状为正方形。第一次级色阻241和第二次级色阻242对称设置，且第一次级色阻241的短边长度和第二次级色阻242的短边长度之和，等于第三次级色阻243与第一次级色阻241以及第二次级色阻242相接触的边的长度。
图5为图1中S1区域的另一种放大结构示意图，如图5所示，每个第四色阻24中，第一次级色阻241和第三次级色阻243的形状均为直角梯形，第二次级色阻242的形状为等腰三角形。第一次级色阻241和第三次级色阻243，关于第二次级色阻242的底边中垂线L1呈轴对称分布，第二次级色阻242的底边中垂线L1沿第一方向延伸。第一次级色阻241和第三次级色阻243的底边之和等于第四色阻24的短边长度，第二次级色阻242的底边长度也与第四色阻24的短边长度相等。第一次级色阻241的一条直角边的长度等于第四色阻24的长边长度，同理，第三次级色阻243与第一次级色阻241关于L1对称设置的一条边的长度也与第四色阻24的长边长度相等。
图6为图1中S1区域的另一种放大结构示意图，如图6所示，每个第四色阻24中，第一次级色阻241和第三次级色阻243的形状均为直角梯形，第二次级色阻242的形状为等腰三角形。第一次级色阻241和第三次级色阻243，关于第二次级色阻242的底边中垂线L2呈轴对称分布，第二次级色阻242的底边中垂线L2沿第 二方向延伸。第一次级色阻241和第三次级色阻243的底边长度均与第四色阻24的短边长度相等，第二次级色阻242的高也与第四色阻的短边长度相等。
图7为图1中S1区域的另一种放大结构示意图，如图7所示，每个第四色阻24中，第一次级色阻241和第三次级色阻243的形状均为直角梯形，第二次级色阻242的形状为平行四边形。第一次级色阻241、第二次级色阻242和第三次级色阻243沿第一方向顺次排列，第二次级色阻242沿第一方向上位于第一次级色阻241和第三次级色阻243之间。第一次级色阻241和第三次级色阻243的底边长度均与第四色阻24的短边长度相等，第一次级色阻241与第三次级色阻243关于第二次级色阻242的几何中心呈中心对称。第二次级色阻242的几何中心为其两条对角线的交点。
本公开还提供另一种彩膜基板。该彩膜基板包括：衬底基板、设置在所述衬底基板上的由不透光材料形成不透光层、以及像素单元。
所述不透光层上形成有暴露所述衬底基板的第一开口、第二开口、第三开口和第四开口，所述第四开口由第一区域、第二区域和第三区域组成。
所述像素单元由第一色阻、第二色阻、第三色阻、第一子色阻、第二子色阻和第三子色阻组成。所述第一色阻设置于所述第一开口内，所述第二色阻设置于所述第二开口内，所述第三色阻设置于所述第三开口内，所述第一子色阻设置于所述第四开口的第一区域，所述第二子色阻设置于第四开口的第二区域，所述第三子色阻设置于第四开口的第三区域。
所述第一开口、第二开口、第三开口和第四开口沿着第一方向依次排列。所述第四开口的第一区域、第二区域和第三区域面积相等。所述第一子色阻与所述第一色阻采用第一材料制成，所述第二子色阻与所述第二色阻采用第二材料制成，所述第三子色阻与所述第三色阻采用第三材料制成。
在一个实施例中，所述第一开口、第二开口、第三开口和第四开口均为矩形，所述第四开口的第一区域、第二区域和第三区域均为矩形并沿着所述第二方向依次排列。
本公开实施例还提供一种彩膜基板的制作方法。图8～图11为该彩膜基板的制作方法的各个阶段的俯视图。参考图8～图11以及图2，彩膜基板的制作方法包括如下步骤。
在第一步，提供一衬底基板10。
在第二步，在衬底基板10上采用第一材料同时形成第一色阻21和第一次级色阻241。
在第三步，在衬底基板10上采用第二材料同时形成第二色阻22和第二次级色阻242。
在第四步，在衬底基板10上采用第三材料同时形成第三色阻23和第三次级色阻243。
第一次级色阻241、第二次级色阻242和第三次级色阻243构成第四色阻24，且第一次级色阻241、第二次级色阻242和第三次级色阻243的面积相等。
本公开实施例提供的彩膜基板的制作方法中，第一次级色阻241与第一色阻21采用同种材料在同一工艺制程中形成，第二次级色阻242与第二色阻22采用同种材料在同一工艺制程中形成，第三次级色阻243与第三色阻23采用同种材料在同一工艺制程中形成，第一次级色阻241、第二次级色阻242和第三次级色阻243构成第四色阻24，第一色阻21、第二色阻22、第三色阻23和第四色阻24构成一个像素单元20，多个像素单元20可以在阵列基板10上阵列排布(图8～图11示例性地给出部分像素单元20的制作)。相对于相关技术中需要在彩膜基板的衬底基板10上涂布四种色阻材料来说，本公开实施例仅需要在彩膜基板的衬底基板10 上涂布三种色阻材料，从而实现了节省彩膜基板的制作成本的效果。
可选地，参考图8～图11以及图2，第一色阻21为红色色阻，第二色阻22为绿色色阻，第三色阻23为蓝色色阻。
可选地，参考图8～图11以及图2，在提供一衬底基板10之后，在衬底基板10上形成黑矩阵30。黑矩阵30包括多个开口区域，多个开口区域暴露出衬底基板10。第一色阻21、第二色阻22、第三色阻23和第四色阻24形成在黑矩阵30的多个开口区域。
可选地，参考图8～图11以及图2，每个像素单元20的第一次级色阻241和相邻像素单元20中的第一色阻21相邻，每个第三次级色阻243和同一个像素单元20中第三色阻23相邻。这样设置的好处是，可以简化彩膜基板制作过程中的构图工艺。
本公开还提供另一种彩膜基板的制作方法。如图8～图11所示，该彩膜基板的制作方法包括如下步骤。
首先，提供一衬底基板10。
之后，在衬底基板上10形成不透光材料层30。
之后，在所述不透光材料层上形成暴露所述衬底基板10的多组开口。所述多组开口呈阵列排布，所述阵列的第一边沿着第一方向延伸，所述矩阵的第二边沿着第二方向延伸，所述第一方向和所述第二方向基本垂直，每组开口包括第一开口、第二开口、第三开口和第四开口，所述第一开口，第二开口，第三开口和第四开口沿着第二方向依次排列，所述第四开口包括第一区域、第二区域和第三区域。
之后，在所述每组开口中的第一开口和第四开口的第一区域采用第一材料同时形成第一色阻21和第一次级色阻241。
之后，在所述每组开口中的第二开口和第四开口的第二区域采用第二材料同时形成第二色阻22和第二次级色阻242。
之后，在所述每组开口中的第三开口和第四开口的第三区域采用第三材料同时形成第三色阻23和第三次级色阻243。
第四开口的第一区域，第二区域和第三区域面积相等。
在一个实施例中，在每组开口中，第一开口、第二开口、第三开口和第四开口面积相等。
在一个实施例中，在同一个第四开口中，第一次级色阻、第二次级色阻和第三次级色阻之间没有所述不透光材料。
在一个实施例中，沿着所述第二方向，每个第一次级色阻与对应的第一色阻被所述不透光材料隔开，每个第三次级色阻和第三色阻被所述不透光材料隔开。
注意，上述仅为本公开的较佳实施例及所运用技术原理。本领域技术人员会理解，本公开不限于这里所述的特定实施例，对本领域技术人员来说能够进行各种明显的变化、重新调整、相互结合和替代而不会脱离本公开的保护范围。因此，虽然通过以上实施例对本公开进行了较为详细的说明，但是本公开不仅仅限于以上实施例，在不脱离本公开构思的情况下，还可以包括更多其他等效实施例，而本公开的范围由所附的权利要求范围决定。

Claims (20)

  1. 一种彩膜基板，包括：
    衬底基板；以及
    多个像素单元，位于所述衬底基板上，且呈阵列排布，所述阵列的第一边沿着第一方向延伸，所述矩阵的第二边沿着第二方向延伸，所述第一方向和所述第二方向交叉，
    其中，每个所述像素单元包括第一色阻、第二色阻、第三色阻和第四色阻；
    所述第四色阻包括第一次级色阻、第二次级色阻和第三次级色阻，所述第一次级色阻、所述第二次级色阻和所述第三次级色阻的面积相等；
    所述第一次级色阻与所述第一色阻采用第一材料制作，所述第二次级色阻与所述第二色阻采用第二材料制作，所述第三次级色阻与所述第三色阻采用第三材料制作。
  2. 根据权利要求1所述的彩膜基板，其中，所述第一色阻、所述第二色阻、所述第三色阻和所述第四色阻的形状均为具有长边和短边的长方形；
    所述第一色阻、所述第二色阻、所述第三色阻和所述第四色阻的长边方向均沿所述第一方向延伸，所述第一色阻、所述第二色阻、所述第三色阻和所述第四色阻的短边方向均沿所述第二方向延伸；
    在每个所述像素单元中，所述第一色阻、所述第二色阻、所述第三色阻和所述第四色阻沿所述第二方向依次排列。
  3. 根据权利要求1所述的彩膜基板，其中，每个像素单元中的所述第一次级色阻和相邻像素单元中的第一色阻相邻；
    在每个像素单元中，第三次级色阻和所述第三色阻相邻。
  4. 根据权利要求1所述的彩膜基板，其中，每个像素单元中，所述第一次级色阻、所述第二次级色阻和所述第三次级色阻的形状均为具有长边和短边的 长方形；
    所述第一次级色阻、所述第二次级色阻和所述第三次级色阻的长边方向均沿所述第一方向延伸，所述第一次级色阻、所述第二次级色阻和所述第三次级色阻的短边方向均沿所述第二方向延伸；
    所述第一次级色阻、所述第二次级色阻和所述第三次级色阻沿所述第二方向依次排列。
  5. 根据权利要求3所述的彩膜基板，其中，每个像素单元中，所述第一次级色阻、所述第二次级色阻和所述第三次级色阻的形状均为具有长边和短边的长方形；
    所述第一次级色阻、所述第二次级色阻和所述第三次级色阻的长边方向均沿所述第一方向延伸，所述第一次级色阻、所述第二次级色阻和所述第三次级色阻的短边方向均沿所述第二方向延伸；
    所述第一次级色阻、所述第二次级色阻和所述第三次级色阻沿所述第二方向依次排列。
  6. 根据权利要求1所述的彩膜基板，其中，每个像素单元中，所述第一次级色阻、所述第二次级色阻和所述第三次级色阻的形状均为矩形；
    所述第一次级色阻、所述第二次级色阻和所述第三次级色阻沿第一方向依次排列。
  7. 根据权利要求3所述的彩膜基板，其中，每个像素单元中，所述第一次级色阻、所述第二次级色阻和所述第三次级色阻的形状均为矩形；
    所述第一次级色阻、所述第二次级色阻和所述第三次级色阻沿第一方向依次排列。
  8. 根据权利要求1所述的彩膜基板，其中，每个像素单元中，所述第一次 级色阻和所述第二次级色阻的形状均为具有长边和短边的长方形；所述第一次级色阻和所述第二次级色阻的长边方向均沿第一方向延伸，所述第一次级色阻和所述第二次级色阻的短边方向均沿第二方向延伸；所述第三次级色阻的形状为矩形；
    所述第一次级色阻和所述第二次级色阻对称设置，且所述第一次级色阻的短边长度和所述第二次级色阻的短边长度之和，等于所述第三次级色阻与所述第一次级色阻以及所述第二次级色阻相接触的边的长度。
  9. 根据权利要求3所述的彩膜基板，其中，每个像素单元中，所述第一次级色阻和所述第二次级色阻的形状均为具有长边和短边的长方形；所述第一次级色阻和所述第二次级色阻的长边方向均沿第一方向延伸，所述第一次级色阻和所述第二次级色阻的短边方向均沿第二方向延伸；所述第三次级色阻的形状为矩形；
    所述第一次级色阻和所述第二次级色阻对称设置，且所述第一次级色阻的短边长度和所述第二次级色阻的短边长度之和，等于所述第三次级色阻与所述第一次级色阻以及所述第二次级色阻相接触的边的长度。
  10. 根据权利要求1所述的彩膜基板，其中，每个像素单元中，所述第一次级色阻和所述第三次级色阻的形状均为直角梯形，所述第二次级色阻的形状为等腰三角形；
    所述第一次级色阻和所述第三次级色阻，关于所述第二次级色阻的底边中垂线呈轴对称分布；
    所述第二次级色阻的底边中垂线沿所述第一方向延伸。
  11. 根据权利要求3所述的彩膜基板，其中，每个像素单元中，所述第一次级色阻和所述第三次级色阻的形状均为直角梯形，所述第二次级色阻的形状 为等腰三角形；
    所述第一次级色阻和所述第三次级色阻，关于所述第二次级色阻的底边中垂线呈轴对称分布；
    所述第二次级色阻的底边中垂线沿所述第一方向延伸。
  12. 根据权利要求1所述的彩膜基板，其中，每个像素单元中，所述第一次级色阻和所述第三次级色阻的形状均为直角梯形，所述第二次级色阻的形状为等腰三角形；
    所述第一次级色阻和所述第三次级色阻，关于所述第二次级色阻的底边中垂线呈轴对称分布；
    所述第二次级色阻的底边中垂线沿所述第二方向延伸。
  13. 根据权利要求3所述的彩膜基板，其中，每个像素单元中，所述第一次级色阻和所述第三次级色阻的形状均为直角梯形，所述第二次级色阻的形状为等腰三角形；
    所述第一次级色阻和所述第三次级色阻，关于所述第二次级色阻的底边中垂线呈轴对称分布；
    所述第二次级色阻的底边中垂线沿所述第二方向延伸。
  14. 根据权利要求1所述的彩膜基板，其中，每个像素单元中，所述第一次级色阻和所述第三次级色阻的形状均为直角梯形，所述第二次级色阻的形状为平行四边形；
    所述第一次级色阻、所述第二次级色阻和所述第三次级色阻沿所述第一方向顺次排列。
  15. 一种彩膜基板，包括：
    衬底基板；
    设置在所述衬底基板上的由不透光材料形成不透光层，其中，所述不透光层上形成有暴露所述衬底基板的第一开口、第二开口、第三开口和第四开口，所述第四开口由第一区域、第二区域和第三区域组成；以及
    像素单元，由第一色阻、第二色阻、第三色阻、第一子色阻、第二子色阻和第三子色阻组成，其中，所述第一色阻设置于所述第一开口内，所述第二色阻设置于所述第二开口内，所述第三色阻设置于所述第三开口内，所述第一子色阻设置于所述第四开口的第一区域，所述第二子色阻设置于第四开口的第二区域，所述第三子色阻设置于第四开口的第三区域；
    其中，所述第一开口、第二开口、第三开口和第四开口沿着第一方向依次排列，所述第四开口的第一区域、第二区域和第三区域面积相等，所述第一子色阻与所述第一色阻采用第一材料制成，所述第二子色阻与所述第二色阻采用第二材料制成，所述第三子色阻与所述第三色阻采用第三材料制成。
  16. 根据权利要求15所述的彩膜基板，其中，所述第一开口、第二开口、第三开口和第四开口均为矩形，所述第四开口的第一区域、第二区域和第三区域均为矩形并沿着所述第二方向依次排列。
  17. 一种彩膜基板的制作方法，包括：
    提供一衬底基板；
    在衬底基板上形成不透光材料层；
    在所述不透光材料层上形成暴露所述衬底基板的多组开口，其中，所述多组开口呈阵列排布，所述阵列的第一边沿着第一方向延伸，所述矩阵的第二边沿着第二方向延伸，所述第一方向和所述第二方向基本垂直，每组开口包括第一开口、第二开口、第三开口和第四开口，所述第一开口，第二开口，第三开口和第四开口沿着第二方向依次排列，所述第四开口包括第一区域、第二区域 和第三区域；
    在所述每组开口中的第一开口和第四开口的第一区域采用第一材料同时形成第一色阻和第一次级色阻；
    在所述每组开口中的第二开口和第四开口的第二区域采用第二材料同时形成第二色阻和第二次级色阻；以及
    在所述每组开口中的第三开口和第四开口的第三区域采用第三材料同时形成第三色阻和第三次级色阻；
    其中，第四开口的第一区域，第二区域和第三区域面积相等。
  18. 根据权利要求17所述的制作方法，其中，在每组开口中，第一开口、第二开口、第三开口和第四开口面积相等。
  19. 根据权利要求17所述的制作方法，其中，在同一个第四开口中，第一次级色阻、第二次级色阻和第三次级色阻之间没有所述不透光材料。
  20. 根据权利要求17所述的制作方法，其中，沿着所述第二方向，每个第一次级色阻与对应的第一色阻被所述不透光材料隔开，每个第三次级色阻和第三色阻被所述不透光材料隔开。
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