WO2019135483A1 - Liquid supply device for maintaining fixed pressure - Google Patents

Liquid supply device for maintaining fixed pressure Download PDF

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Publication number
WO2019135483A1
WO2019135483A1 PCT/KR2018/013525 KR2018013525W WO2019135483A1 WO 2019135483 A1 WO2019135483 A1 WO 2019135483A1 KR 2018013525 W KR2018013525 W KR 2018013525W WO 2019135483 A1 WO2019135483 A1 WO 2019135483A1
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WO
WIPO (PCT)
Prior art keywords
pressure
vessel
liquid
gas
nitrogen
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PCT/KR2018/013525
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French (fr)
Korean (ko)
Inventor
이연범
임택규
임근복
조호준
김성수
안철수
김철영
양승화
Original Assignee
씨앤지하이테크 주식회사
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Application filed by 씨앤지하이테크 주식회사 filed Critical 씨앤지하이테크 주식회사
Priority to CN201880083003.2A priority Critical patent/CN111656503B/en
Publication of WO2019135483A1 publication Critical patent/WO2019135483A1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking

Definitions

  • the present invention relates to a fixed pressure holding liquid supply apparatus and a liquid supply method using the same. More particularly, the present invention relates to a fixed pressure holding liquid supply apparatus for supplying a main pressure (N 2 ) gas to a vessel holding a liquid supplied at a variable liquid supply pressure, And nitrogen (N 2 ) gas pressurizing means for fine pressure adjustment are installed, and the pressure in the vessel is monitored in real time to control the operation, so that it is possible to maintain a fixed pressure of the final supply end and to supply highly stable chemicals.
  • N 2 main pressure
  • N 2 nitrogen
  • the apparatus for supplying liquid in various industrial field production lines such as semiconductors and LCDs includes a pressure regulator, Type flow meter and various sensors are used in combination.
  • the liquid pressure regulator discharges the liquid discharged from the pump at a high pressure and supplies the pressure to the pro pump at a proper pressure.
  • the liquid pressure regulator discharges the liquid at a predetermined pressure in a state where the inlet pressure of the liquid varies in various ways. , Which is a must have for the safe operation of countless machines.
  • the pressure regulator should choose the product that best suits the job you are looking for. The important considerations include type, material, inlet and outlet pressure, flow conditions, temperature, pressure, size, and other limitations.
  • the differential pressure type flowmeter has a simple structure and can be applied to any liquid, gas, or vapor, and has been widely used as industrial flowmeter for a long time.
  • the basic structure of the differential pressure type flow meter is composed of a tightening mechanism and a differential pressure detector.
  • a tightening mechanism is provided in the middle of a pipe through which the fluid flows, if the flow passage area is narrowed, a pressure difference occurs before and after the resistance due to the resistance generated in the tightening mechanism.
  • pressure differentials ie differential pressure and flow, which can be expressed by Bernoulli's principle.
  • the differential pressure meter is based on this principle.
  • the differential pressure detector can be largely divided into a pneumatic type, an electronic type, and an optical type according to a transmission system and a measurement principle. It is dominant.
  • an electronic flow meter is a relatively reliable flow meter that measures the flow rate and the flow rate by the electromotive force generated by the electromagnetic induction law when the liquid moves, but the price is low, such as the high price of tens of millions of won.
  • Another object of the present invention is to provide a fixed pressure maintaining liquid supply device capable of supplying stable medicines by constantly measuring pressure in real time by a pressure sensor inside the vessel and a chemical piping, .
  • a fixed pressure holding liquid supply apparatus comprising:
  • Main liquid supply means fluidly connected to the vessel for supplying a predetermined amount of constant-pressure holding liquid to the vessel;
  • a primary pressure means for supplying a main nitrogen (N 2) gas to maintain a predetermined fixing pressure in the vessel;
  • N 2 gas is additionally supplied or exhausted to finely adjust the differential pressure between the supply pressure of the liquid and the fixing pressure of the main nitrogen (N 2 ) gas,
  • a secondary pressurizing means for maintaining the secondary pressurizing means;
  • a level sensor installed in the vessel for sensing the level of the liquid in the vessel
  • An output stage pressure maintaining means for maintaining a discharge pressure of the liquid discharged from the vessel constant
  • the fixed pressure holding liquid supply apparatus further includes overpressure prevention exhaust means for forcibly exhausting nitrogen (N 2 ) gas from the vessel to the outside when an abnormal overpressure is detected in the vessel.
  • the control unit turns off the operation of the fifth pump and the output stage automatic valve of the output stage pressure maintaining means until the liquid level of the liquid in the vessel reaches a certain level by starting the operation of the fixed pressure holding liquid supply device, Continuously stopping the supply of the liquid to the working end and maintaining the liquid inlet automatic valve of the main liquid supply means in the open state continuously to continuously supply the liquid at the predetermined pressure preset in the vessel S1);
  • the controller determines whether the liquid level in the vessel has reached a minimum level LL;
  • step S2 when the liquid level in the vessel rises above the minimum level LL, the operation of the output stage automatic valve is turned on to supply liquid from the vessel to the next working stage Step S3;
  • step S4 when the liquid level in the vessel reaches the maximum water level H or more, the main liquid inlet automatic valve is turned off to stop the liquid supply to the vessel, in the state, the step (S5) in which the primary biasing means is operating supplying nitrogen (N 2) gas of a certain fixed pressure in the vessel;
  • step S5 the supply pressure of the liquid supplied from the main liquid inlet pressure sensor of the main liquid supply means and the supply pressure of the main nitrogen (N 2 ) gas delivered from the nitrogen gas pressure sensor of the primary pressurizing means Determining whether a sum of the pressures is greater than a target pressure preset in the vessel (S6);
  • step (S6) if the sum of the supply pressure to the main nitrogen (N 2) supply pressure of the gas in the liquid below the target pressure, and operates the third pump of the secondary pressurizing means nitrogen gas supply by opening an automatic valve for adding supply a fine pressure adjustment nitrogen (N 2) gas into the vessel (S7-1);
  • step (S6) if the sum of the supply pressure to the main nitrogen (N 2) supply pressure of the gas in the liquid is greater than the target pressure, the nitrogen gas supply for the auto-valve-off (off) and the exhaust pump by operation of the pump 4 and opens the automatic valve for the nitrogen gas exhaust step (S7-2) for evacuating the nitrogen (N 2) gas from the vessel;
  • an excessive over-pressure sensing within said vessel comprising the steps of: by opening the overpressure protection means exhaust the exhaust force a nitrogen (N 2) gas to the outside (S9-1);
  • step S9-2 it is determined whether the liquid level in the vessel has reached the low level L (S10);
  • step S10 when the liquid level in the vessel reaches the low water level L, the nitrogen gas exhaust automatic valve is turned off and the liquid inlet automatic valve is opened to restart the supply of the liquid (S11) of supplying the fixed pressure holding liquid.
  • the semiconductor, LCD, and fixed pressure holding liquid supply apparatus for industrial manufacture according to the present invention are directly connected to the main supply pipe and supplied with the medicine, Is operated so as to maintain a constant fixed pressure of the final supply end by the joint action of the primary pressurizing means and the nitrogen gas pressurizing means for fine adjustment, so that it is possible to supply highly stable chemicals, thereby increasing the operating rate of the equipment, An improvement effect can be obtained.
  • the pressure is continuously measured by the pressure sensor inside the vessel and the chemical piping, and when the pressure abnormality occurs, rapid evacuation is made, and stable supply of the medicine is made possible.
  • FIG. 1 is a diagram schematically showing the overall configuration of a fixed pressure holding liquid supply apparatus according to a preferred embodiment of the present invention
  • FIG 2 is a schematic block diagram of the fixed pressure holding liquid supply apparatus shown in Figure 1;
  • FIGS. 3A and 3B are flowcharts of a fixed pressure holding liquid supplying method performed using the fixed pressure holding liquid supplying apparatus shown in FIGS. 1 and 2.
  • FIG. 3A and 3B are flowcharts of a fixed pressure holding liquid supplying method performed using the fixed pressure holding liquid supplying apparatus shown in FIGS. 1 and 2.
  • FIG. 1 and 2 show a configuration of a fixed pressure holding liquid supply apparatus according to a preferred embodiment of the present invention.
  • a fixed pressure holding liquid supply apparatus 100 includes a vessel 10 for receiving a liquid which maintains a constant pressure constantly; Main liquid supply means (20) fluidly connected to the vessel (10) for supplying a suitable amount of constant - pressure maintaining liquid to the vessel (10); Said fluid being connected to the vessel (10), a primary pressure means for supplying a main nitrogen (N 2) gas to a vessel 10 for holding a predetermined fixed pressure (30); A nitrogen (N 2 ) gas is further supplied or exhausted to finely adjust the pressure difference between the supply pressure of the liquid and the fixing pressure of the main nitrogen (N 2 ) gas, Secondary pressure means (40) for maintaining the pressure in the second chamber (10) constant; An overpressure prevention exhaust means (50) for forcibly exhausting nitrogen (N 2 ) gas from the vessel (10) to the outside when abnormal overpressure is detected in the vessel (10); A level sensor 60 installed in the vessel 10 to sense the level of the liquid in the vessel 10; An output stage pressure maintaining means (70) for keeping the discharge pressure of the liquid discharged from the vessel
  • the main liquid supply means 20 includes a first pump 22 for pumping a constant pressure maintaining liquid into the vessel 10 and a second pump 22 extending between the first pump 22 and the vessel 10
  • a main liquid inlet automatic valve 24 installed in the first conduit 21, and a main liquid inlet pressure sensor 26.
  • the primary pressurizing means 30 includes a second pump 32 for pumping main nitrogen N 2 gas into the vessel 10 while maintaining a constant holding pressure, And a main nitrogen gas pressure sensor (36) installed in a second conduit (21) extending between the vessels (10).
  • the second pressing means (40) is a third pump 42, included, and the third pump 42 and the vessel 10 for pumping a fine pressure adjustment nitrogen (N 2) gas into the vessel (10) And an automatic valve 44 for supplying nitrogen gas, which is installed in the third conduit 41 extending between the first and second conduits.
  • the secondary pressurizing means 40 includes a fourth pump 48 serving as an exhaust pump for exhausting a part of nitrogen (N 2 ) gas supplied into the vessel 10, a fourth pump 48 serving as an exhaust pump for exhausting a part of nitrogen And an automatic valve for exhausting nitrogen gas 46 installed in a fourth conduit 45 extending between the first and second conduits 10,
  • the overpressure prevention exhaust means 50 includes a relief valve that is installed in a separate conduit (not shown) that is in fluid connection with the vessel 10 and extends to the outside. When the overpressure in the vessel 10 is detected (N 2 ) gas to the outside.
  • the output-stage pressure maintaining means 70 includes a fifth pump 72 for performing a pumping operation to supply the liquid discharged from the vessel 10 to a customer, for example, a mixing chamber (not shown) And an integrated flow meter 73, an output stage auto valve 74, a regulator 75, and an output stage 72 provided in the fifth conduit 71 extending between the fifth pump 72 and the vessel 10, And a pressure sensor 76.
  • a device for supplying liquid in various industrial field production lines such as semiconductors and LCDs must supply a liquid while maintaining a constant outlet pressure even if the inlet pressure of the liquid changes. That is, when the supply pressure of the introduction liquid introduced into the apparatus for supplying the liquid changes, it is important to keep the outlet pressure of the liquid constant since the amount of the discharged liquid changes.
  • FIGS. 3A and 3B are flowcharts of a fixed pressure holding liquid supplying method performed using the fixed pressure holding liquid supplying apparatus shown in Figs. 1 and 2.
  • Fig. 3A and 3B are flowcharts of a fixed pressure holding liquid supplying method performed using the fixed pressure holding liquid supplying apparatus shown in Figs. 1 and 2.
  • the vessel 10 of the liquid supply apparatus 100 receives a liquid introduced at a variable liquid supply pressure to maintain a constant pressure,
  • the pressure in the vessel 10 is set to a desired predetermined pressure.
  • the target pressure inside the vessel 10 can be set to 1 kgf / cm 2.
  • the main liquid supply means 20 supplies liquid into the vessel 10 at a predetermined pressure.
  • the main liquid supply means 20 supplies liquid at a pressure of 0.7 kgf / cm 2, which is lower than the target pressure inside the vessel 10 do. That is, the first pump 22 of the main liquid supply means 20 is operated in response to a signal applied from the control unit 80, and the main liquid input terminal AUTO installed on the downstream side of the first pump 22 in the first conduit 21, The main liquid inlet end pressure sensor 26 provided downstream of the first pump 22 in the first conduit 21 is connected to the vessel 22 from the first pump 22 to the vessel 10 The pressure of the liquid supplied to the liquid-liquid separator is detected.
  • the controller 80 controls the fifth pump 72 of the output stage pressure maintaining means 70 and the output stage 70 of the output stage pressure maintaining means 70 until the liquid level of the liquid in the vessel 10 reaches a certain level,
  • the liquid inlet-side automatic valve 24 of the main liquid supply means 20 is kept in the continuously open state (i.e., the state in which the supply of the liquid to the mixing chamber (not shown) is stopped by turning off the operation of the auto- So as to continuously supply liquid into the vessel 10 (step S1).
  • Step S2 When the level sensor 60 provided in the vessel 10 senses the liquid level in the vessel 10 and sends a level sensing signal to the controller 80, the controller 80 determines whether the liquid level in the vessel 10 is the lowest level LL ) (Step S2).
  • the controller 80 controls the fifth pump 72 and the output stage automatic valve (not shown) of the output stage pressure maintaining means 70, 74 of the main liquid supply means 20 is turned off and the liquid input end auto-valve 24 of the main liquid supply means 20 is turned to the next operation stage, for example, in a state in which the supply of the liquid to the mixing chamber (not shown) So that the liquid is continuously supplied into the vessel 10.
  • the output stage automatic valve 74 of the output stage pressure maintaining means 70 is operated to maintain the open state, 10) to a mixing chamber (not shown) which is the next working stage (step S3).
  • the controller 80 operates the fifth pump 72 of the output stage pressure maintaining means 70 and opens the output stage auto-valve 74 to release liquid from the vessel 10 through the fifth conduit 71, And fed to the mixing chamber (not shown) of the next working stage.
  • the integrated flow meter 73 installed in the fifth conduit 71 calculates a proper amount of liquid supplied from the vessel 10 to the outside, and the regulator 75 calculates the amount of liquid supplied from the outlet of the liquid supplied from the vessel 10 to the outside
  • the pressure is maintained at an appropriate pressure, for example, 0.7 kgf / cm 2.
  • An output end pressure sensor 76 disposed downstream of the regulator 75 senses the pressure of the discharged liquid and sends it to the control unit 80. This operation of the output stage pressure maintaining means 70 is always performed unless the liquid level in the vessel 10 drops below the minimum level LL and the liquid in which the constant holding pressure is maintained is supplied to the next working stage And supply it to the liquid consumer.
  • the liquid for the fixed pressure holding is continuously supplied into the vessel 10 by the first pump 22 so that the liquid level in the vessel 10 (L) or more.
  • step S4 when the water level sensor 60 installed in the vessel 10 senses the liquid level in the vessel 10 and sends a water level sensing signal to the controller 80, the controller 80 determines whether the liquid level in the vessel 10 is the highest It is determined whether or not the water level H has been reached (step S4).
  • the main liquid inlet automatic valve 24 is kept open to continuously supply the liquid to the vessel 10 Supply.
  • the main liquid inlet auto-valve 24 is turned off to maintain the closed state according to the signal from the controller 80, ). ≪ / RTI > In this state, to supply a primary pressure means (30), nitrogen (N 2) of a certain fixed pressure in the operating gas in accordance with the signal supplied from the control unit 80 to the vessel 10 (step S5). That is, the second pump 32 is operated in accordance with the signal from the control unit 80 to supply the nitrogen (N 2 ) gas to the vessel 10. At this time, the second pump 32 The nitrogen gas pressure sensor 36 installed downstream of the second pump 32 senses the pressure of nitrogen (N 2 ) gas supplied from the second pump 32 to the vessel 10.
  • control unit 80 calculates the supply pressure of the liquid delivered from the main liquid input end pressure sensor 26 and the supply pressure of the main nitrogen (N 2 ) gas delivered from the nitrogen gas pressure sensor 36, (N 2 ) gas for fine pressure control is further supplied to the vessel 10 or the nitrogen (N 2 ) gas pressure in the vessel 10 is exhausted.
  • control unit 80 controls the supply pressure of the liquid supplied from the main liquid input end pressure sensor 26 and the supply pressure of the main nitrogen (N 2 ) gas delivered from the nitrogen gas pressure sensor 36, It is determined whether or not the sum is greater than a target pressure set in the vessel 10 (step S6).
  • the third pump 42 is operated, The gas supply auto valve 44 is opened to additionally supply nitrogen (N 2 ) gas for fine pressure control into the vessel 10 (step S7-1).
  • the nitrogen gas supply auto valve 44 As an exhaust pump is operated and the nitrogen gas exhausting valve 46 is opened to remove nitrogen (N 2 ) gas from the vessel 10 (Step S7-2).
  • control unit 80 opens the relief valve 50 to perform a function of forcibly evacuating the nitrogen (N 2 ) gas to the outside (Step S9-1 ).
  • control unit 80 keeps the relief valve 50 kept closed (step S9-2).
  • control unit 80 determines whether the liquid level in the vessel 10 has reached the low water level L by the exhaust operation of the nitrogen gas exhausting auto-valve 46 (step S10).
  • the nitrogen gas exhausting automatic valve 46 (N 2 ) gas is exhausted from the vessel 10.
  • the nitrogen gas exhausting automatic valve 46 Off state to maintain the closed state.
  • the liquid inlet automatic valve 24 is opened according to the signal from the control unit 80 to resume the supply of the liquid (S11).
  • the fixed pressure holding liquid supplying method using the fixed pressure holding liquid supplying apparatus 100 repeatedly performs the respective steps in the form of a closed loop,
  • the supply pressure of the liquid which changes due to external influences is kept constant at the final supply end by the cooperative action of the primary pressurizing means and the nitrogen gas pressurizing means for fine adjustment.

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Abstract

Disclosed are a liquid supply device for maintaining a fixed pressure and a liquid supply method using the same. The liquid supply device for maintaining a fixed pressure is capable of economically supplying chemicals very stably by maintaining a constant fixed pressure at a final supply stage in such a manner that a main nitrogen (N2) gas supply means and a nitrogen (N2) gas pressurizing means for finely adjusting a pressure are installed in a vessel that accommodates a liquid supplied at a variable liquid supply pressure, and the operation is controlled by monitoring the pressure inside the vessel in real time. A liquid which is maintained at a constant pressure is received in the vessel (10) of the liquid supply device (100) for maintaining a fixed pressure, an appropriate amount of liquid for maintaining a constant pressure is supplied to the vessel (10) by means of the main liquid supply means (20), the main nitrogen (N2) gas for maintaining a constant fixed pressure is supplied to the vessel (10) by means of a primary pressurizing means (30), a nitrogen (N2) gas is additionally supplied or discharged so as to finely adjust a pressure difference between the supply pressure of the liquid and the fixed pressure of the main nitrogen (N2) gas by means of a secondary pressurizing means (40), a liquid level in the vessel (10) is detected by a water level sensor (60), and an discharging pressure of the liquid to be discharged from the vessel (10) is kept constant by an output stage pressure maintaining means (70).

Description

고정압력유지 액체 공급장치Fixed pressure holding liquid supply device
본 발명은 고정압력유지 액체공급장치 및 이를 이용한 액체 공급방법에 관한 것으로, 더욱 상세하게는 가변적인 액체의 공급압력으로 공급되는 액체를 수용하는 베셀(vessel)에 메인 질소(N2)가스 공급수단과 미세압력조정용 질소(N2)가스 가압수단을 설치하고 상기 베셀 내부의 압력을 실시간 모니터링하여 작동을 제어함으로써, 최종 공급단의 일정 고정압력을 유지시켜 매우 안정적인 약품 공급이 가능하고 장비의 가동율을 상승시켜 생산량 증대와 품질향상이 가능한 경제적인 고정압력유지 액체공급장치에 관한 것이다.The present invention relates to a fixed pressure holding liquid supply apparatus and a liquid supply method using the same. More particularly, the present invention relates to a fixed pressure holding liquid supply apparatus for supplying a main pressure (N 2 ) gas to a vessel holding a liquid supplied at a variable liquid supply pressure, And nitrogen (N 2 ) gas pressurizing means for fine pressure adjustment are installed, and the pressure in the vessel is monitored in real time to control the operation, so that it is possible to maintain a fixed pressure of the final supply end and to supply highly stable chemicals. To an economical fixed pressure maintaining liquid supply device capable of increasing the production amount and improving the quality.
반도체, LCD 등의 각종 산업현장 제조라인에서 액체를 공급하는 장치는 재료 공급 압력이 불안전하고 너무 높을 때 공급 압력을 안정시키고 감압 효과로 인한 정밀한 디스펜싱 작업을 구현하기 위해서 펌핑장치 이외에 압력 레귤레이터, 차압식 유량계 및 각종 센서들을 조합하여 사용하고 있다.In order to stabilize the supply pressure when the supply pressure of the material is too high, and to realize the precision dispensing operation due to the decompression effect, the apparatus for supplying liquid in various industrial field production lines such as semiconductors and LCDs includes a pressure regulator, Type flow meter and various sensors are used in combination.
액체 압력레귤레이터는 펌프에서 고압으로 토출된 액체를 감압하여 적정압으로 프로 펌프에 공급해 토출하는데, 액체의 공급압력(Inlet Pressure)이 다양하게 변화하는 상황에서 일정한 출구압력(Outlet Pressure)을 유지하는 장치로서, 수 없이 많은 장비를 안전하게 작동하기 위해 반드시 필요한 장비다. 압력 레귤레이터는 사용자가 원하는 작업에 가장 적합한 제품을 선택하는 것이 바람직한데, 이때 중요한 고려사항으로는 종류, 재질, 입구 및 출구 압력, 유량 조건, 온도, 압력, 크기, 기타 제한 사항 등이 있다.The liquid pressure regulator discharges the liquid discharged from the pump at a high pressure and supplies the pressure to the pro pump at a proper pressure. The liquid pressure regulator discharges the liquid at a predetermined pressure in a state where the inlet pressure of the liquid varies in various ways. , Which is a must have for the safe operation of countless machines. The pressure regulator should choose the product that best suits the job you are looking for. The important considerations include type, material, inlet and outlet pressure, flow conditions, temperature, pressure, size, and other limitations.
차압식 유량계는 구조가 간단하고 액체, 기체, 증기 어느 것에도 적용이 가능하며, 오래전부터 공업용 유량계로 광범위하게 사용되어 왔다. 차압식 유량계의 기본구성은 조임기구와 차압 검출기로 구성되는데, 유체가 흐르는 관로 중간에 조임기구를 설치하여 유체의 통과면적으로 좁게 하면 조임기구에 발생하는 저항에 의하여 그 전후에 압력차가 발생하고, 이 압력차, 즉 차압과 유량과의 사이에는 베르누이의 원리에 의하여 표현할 수 있는 일정한 관계식이 있다. 이 원리를 이용한 것이 차압식 유량계이다. 차압을 발생시키는 센서로는 대표적인 것이 벤츄리 튜브, 오리피스, 유동노즐 V-Cone 등이 있고, 상기 차압검출기는 전송방식, 측정원리에 따라 공기식, 전자식, 광학식으로 크게 나눌 수 있으며, 현재는 전자식이 주종을 이루고 있다.The differential pressure type flowmeter has a simple structure and can be applied to any liquid, gas, or vapor, and has been widely used as industrial flowmeter for a long time. The basic structure of the differential pressure type flow meter is composed of a tightening mechanism and a differential pressure detector. When a tightening mechanism is provided in the middle of a pipe through which the fluid flows, if the flow passage area is narrowed, a pressure difference occurs before and after the resistance due to the resistance generated in the tightening mechanism. There is a constant relationship between pressure differentials, ie differential pressure and flow, which can be expressed by Bernoulli's principle. The differential pressure meter is based on this principle. The differential pressure detector can be largely divided into a pneumatic type, an electronic type, and an optical type according to a transmission system and a measurement principle. It is dominant.
그런데, 전술한 바와 같은 종래의 액체 공급장치는 주로 액체를 메인 공급배관에서 직접 공급하는 방식으로, 메인 액체 공급의 승압, 감압의 압력 변화나 메인배관에 수개의 장비를 동시에 연결하여 사용시 메인 공급 압력의 변화로 인하여 액체 공급량의 불규칙한 변화가 많이 발생하여 액체 공급과 후속 공정의 품질에 있어서 문제점이 빈번하게 발생하였다. However, in the conventional liquid supply apparatus as described above, mainly liquid is supplied directly from the main supply line, and several equipments are simultaneously connected to the pressure change of the main liquid supply and the pressure decrease or main pipe, Due to the change of the amount of the liquid supply, irregular changes occur frequently in the liquid supply and the quality of the subsequent process.
또한, 종래의 액체 공급장치를 구성하는 유량계의 종류를 선택할 때 제대로 기능하는 센서를 선택하는 대신에 더 저렴한 가격의 장비를 사용하여 그 장비의 레벨에 맞추는 방식이 빈번하게 시도되고 있는데, 이로 인하여 잘못된 측정에 의한 유지 보수 또는 교체 비용으로 더 많이 비용을 쓰게 되는 문제점이 발생하고 있다. 특히, 전자유량계는 액체가 이동할 때 전자유도법칙으로 발생되는 기전력으로 유량과 유속을 측정하는 상대적으로 신뢰성이 높은 유량계이지만, 가격이 몇천만원대에 달하는 등 고가여서 경제성이 떨어진다. Also, instead of choosing a functioning sensor to select the type of flow meter that constitutes a conventional liquid supply device, a method of adjusting the level of the equipment using a lower cost device is frequently attempted, There is a problem that the maintenance or replacement by the measurement causes a higher cost. In particular, an electronic flow meter is a relatively reliable flow meter that measures the flow rate and the flow rate by the electromotive force generated by the electromagnetic induction law when the liquid moves, but the price is low, such as the high price of tens of millions of won.
따라서, 종래의 액체 공급장치의 문제점을 해결하여 출구압력을 일정한 고정압력으로 유지하여 안정적인 약품공급이 가능하고 경제성이 있는 관련장비의 개발이 시급한 실정이다. Therefore, it is urgent to develop a related apparatus which can solve the problems of the conventional liquid supply apparatus and maintain the outlet pressure at a fixed pressure to provide a stable supply of medicines, and which is economical.
본 발명이 해결하고자 하는 기술적 과제는, 메인 공급용 파이프에 직접 연결하여 약품을 공급받는 기존의 구조와는 달리, 가변적인 액체의 공급압력으로 공급되는 액체를 수용하는 베셀(vessel)에 메인 질소(N2)가스 공급수단과 미세압력조정용 질소(N2)가스 가압수단을 설치하고 상기 베셀 내부의 압력을 실시간 모니터링하여 작동을 제어함으로써, 메인 공급 압력의 대외적인 영향으로 변화하는 압력에도 불구하고 최종 공급단의 일정 고정압력을 유지시키도록 작동되어 매우 안정적인 약품 공급이 가능하고 장비의 가동율을 상승시켜 생산량 증대와 품질이 향상되는 고정압력유지 액체 공급장치를 제공하려는 것이다. SUMMARY OF THE INVENTION It is an object of the present invention to provide an apparatus and a method for supplying main liquid to a main vessel through a vessel accommodating a liquid supplied at a variable liquid supply pressure, N 2 ) gas supply means and nitrogen (N 2 ) gas pressurizing means for fine pressure adjustment are provided to monitor the pressure inside the vessel in real time to control the operation thereof, so that even if the pressure changes due to the external influence of the main supply pressure, And to provide a fixed pressure maintaining liquid supply device which is operated so as to maintain a constant fixed pressure of the supply end so as to supply highly stable chemicals and to increase the operation rate of the equipment to thereby increase the production amount and quality.
또한, 본 발명이 해결하고자 하는 기술적 과제는, 상기 베셀 내부와 약품 배관 내의 압력 감지센서에 의해 압력이 실시간 지속적으로 측정되고 압력 이상 발생시 신속한 배기가 이루어져 안정적인 약품의 공급이 가능한 고정압력유지 액체 공급장치를 제공하려는 것이다.Another object of the present invention is to provide a fixed pressure maintaining liquid supply device capable of supplying stable medicines by constantly measuring pressure in real time by a pressure sensor inside the vessel and a chemical piping, .
전술한 바와 같은 기술적 과제를 해결하기 위해서, 본 발명의 제1 양태에 따르면, 본 발명은, 고정압력유지 액체 공급장치로서,According to a first aspect of the present invention, there is provided a fixed pressure holding liquid supply apparatus comprising:
지속적으로 일정압력을 유지시키는 액체를 수용하는 베셀(vessel);A vessel for receiving a liquid that maintains a constant pressure;
상기 베셀에 유체 연결되고, 적정량의 일정압력유지용 액체를 상기 베셀로 공급하기 위한 메인 액체공급수단;Main liquid supply means fluidly connected to the vessel for supplying a predetermined amount of constant-pressure holding liquid to the vessel;
상기 베셀에 유체 연결되고, 일정 고정압력을 유지하는 메인 질소(N2)가스를 상기 베셀에 공급하기 위한 1차 가압수단; And a fluid connection to said vessel, a primary pressure means for supplying a main nitrogen (N 2) gas to maintain a predetermined fixing pressure in the vessel;
상기 베셀에 유체 연결되고, 상기 액체의 공급압력과 상기 메인 질소(N2)가스의 고정압력과의 차압을 세밀하게 조정하도록 질소(N2)가스를 추가 공급하거나 배기하여 상기 베셀 내의 압력을 일정하게 유지하기 위한 2차 가압수단;(N 2 ) gas is additionally supplied or exhausted to finely adjust the differential pressure between the supply pressure of the liquid and the fixing pressure of the main nitrogen (N 2 ) gas, A secondary pressurizing means for maintaining the secondary pressurizing means;
상기 베셀에 설치되어 상기 베셀내 액체의 수위를 감지하는 수위센서; A level sensor installed in the vessel for sensing the level of the liquid in the vessel;
상기 베셀로부터 배출되는 액체의 배출압력을 일정하게 유지하기 위한 출력단 압력유지수단; 및 An output stage pressure maintaining means for maintaining a discharge pressure of the liquid discharged from the vessel constant; And
상기 고정압력유지 액체 공급장치의 전체적인 작동을 제어하는 제어장치;를 포함하는 것을 특징으로 하는 고정압력유지 액체 공급장치를 제공한다.And a control device for controlling the overall operation of the fixed pressure holding liquid supply device.
상기 고정압력유지 액체 공급장치는, 상기 베셀내에서 이상과압이 감지되는 경우 상기 베셀로부터 질소(N2)가스를 외부로 강제 배기시키기 위한 과압방지 배기수단을 더 포함하는 것을 특징으로 한다.The fixed pressure holding liquid supply apparatus further includes overpressure prevention exhaust means for forcibly exhausting nitrogen (N 2 ) gas from the vessel to the outside when an abnormal overpressure is detected in the vessel.
또한, 전술한 바와 같은 기술적 과제를 해결하기 위해서, 본 발명의 제2 양태에 따르면, 본 발명은, 전술한 바와 같은 고정압력유지 액체 공급장치를 이용한 고정압력유지 액체 공급방법으로서,According to a second aspect of the present invention, there is provided a fixed pressure holding liquid supplying method using the fixed pressure holding liquid supplying apparatus as described above,
상기 고정압력유지 액체 공급장치가 작동을 개시하여 상기 베셀내의 액체 수위가 일정 수위에 도달할 때까지 상기 제어부는 상기 출력단 압력유지수단의 제5 펌프 및 출력단 오토밸브의 작동을 오프(off)시켜서 다음 작업단 쪽으로의 액체 공급을 중단시키고, 이러한 상태에서 상기 메인 액체공급수단의 액체입력단 오토밸브를 계속 개방된 상태로 유지하여 상기 베셀내로 미리 설정한 소정의 압력으로 액체 공급을 계속적으로 수행하는 단계(S1);The control unit turns off the operation of the fifth pump and the output stage automatic valve of the output stage pressure maintaining means until the liquid level of the liquid in the vessel reaches a certain level by starting the operation of the fixed pressure holding liquid supply device, Continuously stopping the supply of the liquid to the working end and maintaining the liquid inlet automatic valve of the main liquid supply means in the open state continuously to continuously supply the liquid at the predetermined pressure preset in the vessel S1);
상기 베셀에 설치된 상기 수위센서가 상기 베셀내의 액체 수위를 감지하여 수위감지신호를 상기 제어부로 보내면, 상기 제어부는 상기 베셀내의 액체 수위가 최저수위(LL)에 도달하였는지 여부를 판단하는 단계;When the level sensor installed in the vessel senses the liquid level in the vessel and sends a level sensing signal to the controller, the controller determines whether the liquid level in the vessel has reached a minimum level LL;
상기 단계(S2)의 수행 결과, 상기 베셀내의 액체 수위가 최저수위(LL) 이상으로 상승하게 되는 경우, 상기 출력단 오토밸브의 작동을 온(on) 시켜서 상기 베셀로부터 다음 작업단으로 액체를 공급하는 단계(S3); As a result of the step S2, when the liquid level in the vessel rises above the minimum level LL, the operation of the output stage automatic valve is turned on to supply liquid from the vessel to the next working stage Step S3;
상기 단계(S3) 후에, 상기 베셀내의 액체 수위가 최고수위(H)에 도달하였는지 여부를 판단하는 단계(S4);(S4) after the step (S3) whether or not the liquid level in the vessel has reached a maximum water level (H);
상기 단계(S4)의 수행 결과, 상기 베셀내의 액체 수위가 최고수위(H) 이상에 도달하게 되는 경우, 상기 메인 액체입력단 오토밸브가 오프(off)되어 상기 베셀로의 액체공급이 중단되고, 이러한 상태에서, 상기 1차 가압수단이 작동하여 일정한 고정압력의 질소(N2)가스를 상기 베셀로 공급하는 단계(S5); As a result of the step S4, when the liquid level in the vessel reaches the maximum water level H or more, the main liquid inlet automatic valve is turned off to stop the liquid supply to the vessel, in the state, the step (S5) in which the primary biasing means is operating supplying nitrogen (N 2) gas of a certain fixed pressure in the vessel;
상기 단계(S5) 후에, 상기 메인 액체공급수단의 메인 액체입력단 압력센서로부터 전달되는 액체의 공급압력과 상기 1차 가압수단의 질소가스 압력센서로부터 전달되는 메인 질소(N2)가스의 공급압력을 기초로 하여 이들 압력의 합이 상기 베셀내에 기설정한 목표압력보다 큰지 여부를 판단하는 단계(S6); After the step S5, the supply pressure of the liquid supplied from the main liquid inlet pressure sensor of the main liquid supply means and the supply pressure of the main nitrogen (N 2 ) gas delivered from the nitrogen gas pressure sensor of the primary pressurizing means Determining whether a sum of the pressures is greater than a target pressure preset in the vessel (S6);
상기 단계(S6)의 수행 결과, 액체의 공급압력과 메인 질소(N2)가스의 공급압력의 합이 상기 목표압력에 미달하는 경우, 상기 2차 가압수단의 제3 펌프를 작동시키고 질소가스 공급용 오토밸브를 개방시켜서 상기 베셀내로 미세압력 조절용 질소(N2)가스를 추가 공급하는 단계(S7-1);Result of executing the step (S6), if the sum of the supply pressure to the main nitrogen (N 2) supply pressure of the gas in the liquid below the target pressure, and operates the third pump of the secondary pressurizing means nitrogen gas supply by opening an automatic valve for adding supply a fine pressure adjustment nitrogen (N 2) gas into the vessel (S7-1);
상기 단계(S6)의 수행 결과, 액체의 공급압력과 메인 질소(N2)가스의 공급압력의 합이 상기 목표압력을 초과하는 경우, 상기 질소가스 공급용 오토밸브를 오프(off)시키고 배기펌프인 제4 펌프를 작동시키고 질소가스 배기용 오토밸브를 개방시켜서 상기 베셀로부터 질소(N2)가스를 배기시키는 단계(S7-2);Result of executing the step (S6), if the sum of the supply pressure to the main nitrogen (N 2) supply pressure of the gas in the liquid is greater than the target pressure, the nitrogen gas supply for the auto-valve-off (off) and the exhaust pump by operation of the pump 4 and opens the automatic valve for the nitrogen gas exhaust step (S7-2) for evacuating the nitrogen (N 2) gas from the vessel;
상기 베셀내에서 미리 설정한 압력에 해당하는 지나친 과압이 감지되는지 여부를 판단하는 단계(S8);A step (S8) of judging whether excessive overpressure corresponding to a preset pressure is detected in the vessel;
상기 단계(S8)의 수행 결과, 상기 베셀내에서 지나친 과압이 감지되는 경우, 과압방지 배기수단을 개방시켜서 질소(N2)가스를 외부에 강제 배기시키는 단계(S9-1); If the result of executing the step (S8), an excessive over-pressure sensing within said vessel, comprising the steps of: by opening the overpressure protection means exhaust the exhaust force a nitrogen (N 2) gas to the outside (S9-1);
상기 단계(S8)의 수행 결과, 상기 베셀내의 지나친 과압이 감지되지 않는 경우, 상기 과압방지 배기수단을 계속 폐쇄된 상태로 유지시키는 단계(S9-2);(S9-2) when the excessive overpressure in the vessel is not detected as a result of the step (S8), the overpressure prevention exhaust means is kept closed;
상기 단계(S9-2) 후에, 상기 베셀내의 액체 수위가 저수위(L)에 도달하였는지 여부를 판단하는 단계(S10); 그리고After the step S9-2, it is determined whether the liquid level in the vessel has reached the low level L (S10); And
상기 단계(S10)의 수행 결과, 상기 베셀내의 액체 수위가 저수위(L)에 도달하는 경우, 상기 질소가스 배기용 오토밸브를 오프(off)시키고 상기 액체입력단 오토밸브를 개방하여 액체의 공급을 재개하는 단계(S11);를 포함하는 것을 특징으로 하는 고정압력유지 액체 공급방법을 제공한다.As a result of the step S10, when the liquid level in the vessel reaches the low water level L, the nitrogen gas exhaust automatic valve is turned off and the liquid inlet automatic valve is opened to restart the supply of the liquid (S11) of supplying the fixed pressure holding liquid.
이상에서 설명한 바와 같이, 본 발명에 따른 반도체,LCD 및 산업 제조용 고정압력유지 액체 공급장치는 메인 공급용 파이프에 직접 연결하여 약품을 공급 받는 구조와는 달리, 메인 공급 압력의 대외적인 영향에 의해 변화하는 압력을 1차 가압수단 및 미세 조정용 질소가스 가압 수단의 공동작용에 의해 최종 공급단의 일정 고정압력을 유지하도록 작동됨으로써, 매우 안정적인 약품 공급이 가능하여 장비의 가동율을 상승시켜 생산량 증대와 품질이 향상되는 효과를 얻을 수 있다. 또한, 베셀 내부와 약품 배관내의 압력 감지센서에 의해 압력이 계속적으로 측정되고 압력 이상 발생시 신속한 배기가 이루어져 안정적인 약품의 공급이 가능하게 된다.As described above, unlike the structure in which the semiconductor, LCD, and fixed pressure holding liquid supply apparatus for industrial manufacture according to the present invention are directly connected to the main supply pipe and supplied with the medicine, Is operated so as to maintain a constant fixed pressure of the final supply end by the joint action of the primary pressurizing means and the nitrogen gas pressurizing means for fine adjustment, so that it is possible to supply highly stable chemicals, thereby increasing the operating rate of the equipment, An improvement effect can be obtained. In addition, the pressure is continuously measured by the pressure sensor inside the vessel and the chemical piping, and when the pressure abnormality occurs, rapid evacuation is made, and stable supply of the medicine is made possible.
도 1은 본 발명의 바람직한 실시 예에 따른 고정압력유지 액체 공급장치의 전체적인 구성을 도식적으로 나타낸 도면;BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a diagram schematically showing the overall configuration of a fixed pressure holding liquid supply apparatus according to a preferred embodiment of the present invention; Fig.
도 2는 도 1에 도시된 고정압력유지 액체 공급장치의 개략적인 블록 다이어그램; 및Figure 2 is a schematic block diagram of the fixed pressure holding liquid supply apparatus shown in Figure 1; And
도 3a 및 도 3b는 도 1 및 2에 도시된 고정압력유지 액체 공급장치를 이용하여 수행되는 고정압력유지 액체 공급방법의 순서도.FIGS. 3A and 3B are flowcharts of a fixed pressure holding liquid supplying method performed using the fixed pressure holding liquid supplying apparatus shown in FIGS. 1 and 2. FIG.
본 출원의 도면과 그 상세한 설명은 단지 본 발명의 실시 예들에 관한 것이다. 여기에서 발표한 기구 및 방식들의 장점 및 다른 특징들은 본 발명의 대표적인 실시 예를 나타낸 첨부도면들을 참조한 상세한 설명을 통해서 해당 기술분야의 숙련된 당업자에게 보다 명백해질 것이다. 다르게 강조하지 않는 한, 도면을 통해서 유사하거나 대응하는 요소들은 유사하거나 대응하는 참조부호들로서 나타내어질 것이다. The drawings of the present application and the detailed description thereof relate only to embodiments of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Advantages and other features of the devices and methods disclosed herein will become more apparent to those of ordinary skill in the art from a detailed description of the accompanying drawings which illustrate exemplary embodiments of the invention. Unless otherwise specified, like or corresponding elements throughout the drawings will be represented by like or corresponding reference numerals.
본 발명의 적어도 하나의 실시 예를 상세하게 설명하기 전, 본 발명은 하기의 명세서에 발표하거나 도면에 나타낸 구성 및 부품들의 배열로 본 출원에서 한정되지 않음을 이해할 수 있을 것이다. 본 발명은 다른 실시 예들이 가능하고 다양한 방식으로 실행 및 수행될 수 있다. 또한, 여기에 채용된 어법과 용어는 설명을 목적으로 한 것으로서 제한하는 것으로 간주되지 않음을 알 수 있을 것이다. Before explaining at least one embodiment of the present invention in detail, it will be understood that the present invention is not limited by the present application, either as presented in the following specification or as an arrangement of components and parts shown in the drawings. The invention is capable of other embodiments and of being practiced and carried out in various ways. It is also to be understood that the phraseology and terminology employed herein is for the purpose of description and is not to be considered as limiting.
이하, 첨부도면들을 참조하여 본 발명의 바람직한 실시 예에 따른 고정압력유지 액체 공급장치 및 이를 이용한 고정압력유지 액체 공급방법에 대해 상세히 설명한다.Hereinafter, a fixed pressure holding liquid supplying apparatus and a fixed pressure holding liquid supplying method using the same according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings.
도 1 및 도 2에는 본 발명의 바람직한 실시 예에 따른 고정압력유지 액체 공급장치의 구성이 나타나 있다.1 and 2 show a configuration of a fixed pressure holding liquid supply apparatus according to a preferred embodiment of the present invention.
도 1 및 도 2를 참조하면, 고정압력유지 액체 공급장치(100)는, 지속적으로 일정압력을 유지시키는 액체를 수용하는 베셀(vessel)(10); 상기 베셀(10)에 유체 연결되고, 적정량의 일정압력유지용 액체를 상기 베셀(10)로 공급하기 위한 메인 액체공급수단(20); 상기 베셀(10)에 유체 연결되고, 일정 고정압력을 유지하는 메인 질소(N2)가스를 베셀(10)에 공급하기 위한 1차 가압수단(30); 상기 베셀(10)에 유체 연결되고, 상기 액체의 공급압력과 상기 메인 질소(N2)가스의 고정압력과의 차압을 세밀하게 조정하도록 질소(N2)가스를 추가 공급하거나 배기하여 상기 베셀(10) 내의 압력을 일정하게 유지하기 위한 2차 가압수단(40); 상기 베셀(10)내에서 이상과압이 감지되는 경우 상기 베셀(10)로부터 질소(N2)가스를 외부로 강제배기시키는 과압방지 배기수단(50); 상기 베셀(10)에 설치되어 베셀(10)내 액체의 수위를 감지하는 수위센서(60); 상기 베셀(10)로부터 배출되는 액체의 배출압력을 일정하게 유지하기 위한 출력단 압력유지수단(70); 및 상기 고정압력유지 액체 공급장치(100)의 전체적인 작동을 제어하는 제어장치(80);를 포함한다.Referring to FIGS. 1 and 2, a fixed pressure holding liquid supply apparatus 100 includes a vessel 10 for receiving a liquid which maintains a constant pressure constantly; Main liquid supply means (20) fluidly connected to the vessel (10) for supplying a suitable amount of constant - pressure maintaining liquid to the vessel (10); Said fluid being connected to the vessel (10), a primary pressure means for supplying a main nitrogen (N 2) gas to a vessel 10 for holding a predetermined fixed pressure (30); A nitrogen (N 2 ) gas is further supplied or exhausted to finely adjust the pressure difference between the supply pressure of the liquid and the fixing pressure of the main nitrogen (N 2 ) gas, Secondary pressure means (40) for maintaining the pressure in the second chamber (10) constant; An overpressure prevention exhaust means (50) for forcibly exhausting nitrogen (N 2 ) gas from the vessel (10) to the outside when abnormal overpressure is detected in the vessel (10); A level sensor 60 installed in the vessel 10 to sense the level of the liquid in the vessel 10; An output stage pressure maintaining means (70) for keeping the discharge pressure of the liquid discharged from the vessel (10) constant; And a control device (80) for controlling the overall operation of the fixed pressure holding liquid supply device (100).
상기 메인 액체공급수단(20)은 일정압력 유지용 액체를 베셀(10)내로 펌핑하기 위한 제1 펌프(22)를 포함하고, 상기 제1 펌프(22)와 상기 베셀(10) 사이에서 연장되는 제1 도관(21)에 설치되는 메인 액체입력단 오토밸브(24), 및 메인 액체입력단 압력센서(26)를 포함한다. The main liquid supply means 20 includes a first pump 22 for pumping a constant pressure maintaining liquid into the vessel 10 and a second pump 22 extending between the first pump 22 and the vessel 10 A main liquid inlet automatic valve 24 installed in the first conduit 21, and a main liquid inlet pressure sensor 26.
상기 1차 가압수단(30)은 일정 고정압력을 유지하는 메인 질소(N2)가스를 베셀(10)내로 펌핑하기 위한 제2 펌프(32)를 포함하고, 상기 제2 펌프(32)와 상기 베셀(10) 사이에서 연장되는 제2 도관(21)에 설치되는 메인 질소가스 압력센서(36)를 포함한다. The primary pressurizing means 30 includes a second pump 32 for pumping main nitrogen N 2 gas into the vessel 10 while maintaining a constant holding pressure, And a main nitrogen gas pressure sensor (36) installed in a second conduit (21) extending between the vessels (10).
상기 2차 가압수단(40)은 미세 압력조정용 질소(N2)가스를 베셀(10)내로 펌핑하기 위한 제3 펌프(42)를 포함하고, 상기 제3 펌프(42)와 상기 베셀(10) 사이에서 연장되는 제3 도관(41)에 설치되는 질소가스 공급용 오토밸브(44)를 포함한다. 또한, 상기 2차 가압수단(40)은 베셀(10)내로 공급된 질소(N2)가스의 일부를 배기하기 위한 배기펌프인 제4 펌프(48), 상기 제4 펌프(48)와 상기 베셀(10) 사이에서 연장되는 제4 도관(45)에 설치되는 질소가스 배기용 오토밸브(46)를 포함한다.The second pressing means (40) is a third pump 42, included, and the third pump 42 and the vessel 10 for pumping a fine pressure adjustment nitrogen (N 2) gas into the vessel (10) And an automatic valve 44 for supplying nitrogen gas, which is installed in the third conduit 41 extending between the first and second conduits. The secondary pressurizing means 40 includes a fourth pump 48 serving as an exhaust pump for exhausting a part of nitrogen (N 2 ) gas supplied into the vessel 10, a fourth pump 48 serving as an exhaust pump for exhausting a part of nitrogen And an automatic valve for exhausting nitrogen gas 46 installed in a fourth conduit 45 extending between the first and second conduits 10,
상기 과압방지 배기수단(50)은 베셀(10)과 유체 연결되어 외부로 연장되는 별도의 도관(도시되지 않음)에 설치되는 릴리프 밸브로 이루어지며, 앞서 설명한 바와 같이 베셀(10)내의 과압이 감지되는 경우 질소(N2)가스를 외부에 배기시키는 기능을 수행한다. The overpressure prevention exhaust means 50 includes a relief valve that is installed in a separate conduit (not shown) that is in fluid connection with the vessel 10 and extends to the outside. When the overpressure in the vessel 10 is detected (N 2 ) gas to the outside.
상기 출력단 압력유지수단(70)은, 베셀(10)로부터 배출되는 액체를 다음 작업단의 수요처, 예를 들어 믹싱 챔버(도시되지 않음)로 공급하기 위해 펌핑작업을 수행하는 제5 펌프(72)를 포함하고, 상기 제5 펌프(72)와 상기 베셀(10) 사이에서 연장되는 제5 도관(71)에 설치되는 적산 유량계(73), 출력단 오토밸브(74), 레귤레이터(75), 및 출력단 압력센서(76)를 포함한다. The output-stage pressure maintaining means 70 includes a fifth pump 72 for performing a pumping operation to supply the liquid discharged from the vessel 10 to a customer, for example, a mixing chamber (not shown) And an integrated flow meter 73, an output stage auto valve 74, a regulator 75, and an output stage 72 provided in the fifth conduit 71 extending between the fifth pump 72 and the vessel 10, And a pressure sensor 76.
하기에서는 전술한 바와 같이 구성된 고정압력유지 액체 공급장치(100)를 이용한 고정압력유지 액체 공급방법에 대해 설명한다.In the following, a fixed pressure holding liquid supplying method using the fixed pressure holding liquid supplying apparatus 100 configured as described above will be described.
일반적으로, 반도체, LCD 등의 각종 산업현장 제조라인에서 액체를 공급하는 장치는 액체의 공급압력(Inlet Pressure)이 변하더라도 일정한 출구압력(Outlet Pressure)을 유지하면서 액체를 공급해야 한다. 즉, 액체를 공급하는 장치내로 도입되는 도입 액체의 공급압력이 변하면, 배출되는 액체의 양도 변하기 때문에 액체의 출구압력을 일정하게 유지시키는 것이 중요하다.In general, a device for supplying liquid in various industrial field production lines such as semiconductors and LCDs must supply a liquid while maintaining a constant outlet pressure even if the inlet pressure of the liquid changes. That is, when the supply pressure of the introduction liquid introduced into the apparatus for supplying the liquid changes, it is important to keep the outlet pressure of the liquid constant since the amount of the discharged liquid changes.
도 3a 및 3b는 도 1 및 2에 도시된 고정압력유지 액체 공급장치를 이용하여 수행되는 고정압력유지 액체 공급방법의 순서도이다.Figs. 3A and 3B are flowcharts of a fixed pressure holding liquid supplying method performed using the fixed pressure holding liquid supplying apparatus shown in Figs. 1 and 2. Fig.
도 3a 및 3b를 참조하면, 앞서 언급한 바와 같이 액체 공급장치(100)의 베셀(10)은 가변적인 액체의 공급압력으로 도입되는 액체를 수용하여 지속적으로 일정압력을 유지시키는 역할을 하게 되는데, 이를 위해서 베셀(10)내의 압력은 원하는 소정의 압력으로 설정된다. 예를 들어, 베셀(10) 내부의 목표압력을 1kgf/㎠으로 설정할 수 있다.Referring to FIGS. 3A and 3B, as described above, the vessel 10 of the liquid supply apparatus 100 receives a liquid introduced at a variable liquid supply pressure to maintain a constant pressure, To this end, the pressure in the vessel 10 is set to a desired predetermined pressure. For example, the target pressure inside the vessel 10 can be set to 1 kgf / cm 2.
설명의 편의를 위하여, 본 발명에 따른 고정압력유지 액체 공급장치(100)가 최초로 작동을 개시하는 상태로부터 설명한다. For convenience of explanation, a description will be given from a state where the fixed pressure holding liquid supply apparatus 100 according to the present invention starts its operation for the first time.
상기 메인 액체공급수단(20)은 미리 설정한 소정의 압력으로 베셀(10)내로 액체를 공급하게 되는데, 예를 들어 베셀(10) 내부의 목표압력보다 낮은 0.7kgf/㎠의 압력으로 액체를 공급한다. 즉, 제어부(80)로부터 인가되는 신호에 따라 메인 액체공급수단(20)의 제1 펌프(22)를 작동시키고 제1 도관(21)에서 제1 펌프(22)의 하류에 설치된 메인 액체입력단 오토밸브(24)를 개방하여 액체를 공급하게 되는데, 이때 제1 도관(21)에서 제1 펌프(22)의 하류에 설치된 메인 액체입력단 압력센서(26)는 제1 펌프(22)로부터 베셀(10)쪽으로 공급되는 액체의 압력을 감지하게 된다. The main liquid supply means 20 supplies liquid into the vessel 10 at a predetermined pressure. For example, the main liquid supply means 20 supplies liquid at a pressure of 0.7 kgf / cm 2, which is lower than the target pressure inside the vessel 10 do. That is, the first pump 22 of the main liquid supply means 20 is operated in response to a signal applied from the control unit 80, and the main liquid input terminal AUTO installed on the downstream side of the first pump 22 in the first conduit 21, The main liquid inlet end pressure sensor 26 provided downstream of the first pump 22 in the first conduit 21 is connected to the vessel 22 from the first pump 22 to the vessel 10 The pressure of the liquid supplied to the liquid-liquid separator is detected.
고정압력유지 액체 공급장치(100)가 작동을 개시하여 베셀(10)내의 액체 수위가 일정 수위에 도달할 때까지는 제어부(80)는 출력단 압력유지수단(70)의 제5 펌프(72) 및 출력단 오토밸브(74)의 작동을 오프(off)시켜서 믹싱 챔버(도시되지 않음)쪽으로의 액체 공급을 중단시킨 상태하에서, 메인 액체공급수단(20)의 액체입력단 오토밸브(24)를 계속 개방된 상태로 유지하여 베셀(10)내로 계속적인 액체 공급이 이루어지게 한다(단계 S1).The controller 80 controls the fifth pump 72 of the output stage pressure maintaining means 70 and the output stage 70 of the output stage pressure maintaining means 70 until the liquid level of the liquid in the vessel 10 reaches a certain level, The liquid inlet-side automatic valve 24 of the main liquid supply means 20 is kept in the continuously open state (i.e., the state in which the supply of the liquid to the mixing chamber (not shown) is stopped by turning off the operation of the auto- So as to continuously supply liquid into the vessel 10 (step S1).
베셀(10)에 설치된 수위센서(60)가 베셀(10)내의 액체 수위를 감지하여 수위감지신호를 제어부(80)로 보내면, 제어부(80)는 베셀(10)내의 액체 수위가 최저수위(LL)에 도달하였는지 여부를 판단한다(단계 S2).When the level sensor 60 provided in the vessel 10 senses the liquid level in the vessel 10 and sends a level sensing signal to the controller 80, the controller 80 determines whether the liquid level in the vessel 10 is the lowest level LL ) (Step S2).
만약, 베셀(10)내의 액체 수위가 최저수위(LL)에 미달하는 경우, 상기 단계 S1에서와 같이 제어부(80)는 출력단 압력유지수단(70)의 제5 펌프(72) 및 출력단 오토밸브(74)의 작동을 오프(off)시켜서 다음 작업단, 예를 들어 믹싱 챔버(도시되지 않음)쪽으로의 액체 공급을 중단시킨 상태하에서, 메인 액체공급수단(20)의 액체입력단 오토밸브(24)를 계속 개방된 상태로 유지하여 베셀(10)내로 계속적인 액체 공급이 이루어지게 한다.If the liquid level in the vessel 10 is below the minimum level LL, the controller 80 controls the fifth pump 72 and the output stage automatic valve (not shown) of the output stage pressure maintaining means 70, 74 of the main liquid supply means 20 is turned off and the liquid input end auto-valve 24 of the main liquid supply means 20 is turned to the next operation stage, for example, in a state in which the supply of the liquid to the mixing chamber (not shown) So that the liquid is continuously supplied into the vessel 10.
만약, 베셀(10)내의 액체 수위가 최저수위(LL) 이상으로 상승하게 되면, 출력단 압력유지수단(70)의 출력단 오토밸브(74)를 작동시켜서 개방된 상태를 유지하게 되고, 이에 의해 베셀(10)로부터 다음 작업단인 믹싱 챔버(도시되지 않음)로 액체를 공급하게 된다(단계 S3). If the liquid level in the vessel 10 rises above the minimum level LL, the output stage automatic valve 74 of the output stage pressure maintaining means 70 is operated to maintain the open state, 10) to a mixing chamber (not shown) which is the next working stage (step S3).
즉, 제어부(80)는 출력단 압력유지수단(70)의 제5 펌프(72)를 작동시키고 출력단 오토밸브(74)를 개방시켜서 베셀(10)로부터 액체를 제5 도관(71)을 거쳐서 예를 들어 다음 작업단의 믹싱 챔버(도시되지 않음)쪽으로 공급하게 된다. 이때, 제5 도관(71)에 설치된 적산유량계(73)는 베셀(10)로부터 외부로 공급되는 액체의 적정 공급량을 계산하고, 레귤레이터(75)는 베셀(10)로부터 외부로 공급되는 액체의 출구압력을 적정압력, 예를 들어 0.7kgf/㎠로 조절하여 유지시킨다. 레귤레이터(75)의 하류에 배치된 출력단 압력센서(76)는 배출 액체의 압력을 감지하여 제어부(80)로 송출한다. 출력단 압력유지수단(70)의 이와 같은 동작은 베셀(10)내의 액체 수위가 최저수위(LL) 밑으로 떨어지지 않는 한, 항시적으로 이루어지며, 일정 고정압력이 유지되는 액체를 다음 작업단의 공급액체 수요처로 공급하게 되는 것이다.That is, the controller 80 operates the fifth pump 72 of the output stage pressure maintaining means 70 and opens the output stage auto-valve 74 to release liquid from the vessel 10 through the fifth conduit 71, And fed to the mixing chamber (not shown) of the next working stage. At this time, the integrated flow meter 73 installed in the fifth conduit 71 calculates a proper amount of liquid supplied from the vessel 10 to the outside, and the regulator 75 calculates the amount of liquid supplied from the outlet of the liquid supplied from the vessel 10 to the outside The pressure is maintained at an appropriate pressure, for example, 0.7 kgf / cm 2. An output end pressure sensor 76 disposed downstream of the regulator 75 senses the pressure of the discharged liquid and sends it to the control unit 80. This operation of the output stage pressure maintaining means 70 is always performed unless the liquid level in the vessel 10 drops below the minimum level LL and the liquid in which the constant holding pressure is maintained is supplied to the next working stage And supply it to the liquid consumer.
메인 액체입력단 오토밸브(24)는 계속적으로 개방된 상태를 유지하므로, 제1 펌프(22)에 의해서 고정압력유지용 액체가 베셀(10)내로 계속 공급되고, 이에 의해 베셀(10)내의 액체수위는 저수위(L) 이상으로 상승하게 된다. The liquid for the fixed pressure holding is continuously supplied into the vessel 10 by the first pump 22 so that the liquid level in the vessel 10 (L) or more.
다음에는, 베셀(10)에 설치된 수위센서(60)가 베셀(10)내의 액체 수위를 감지하여 수위감지신호를 제어부(80)로 보내면, 제어부(80)는 베셀(10)내의 액체 수위가 최고수위(H)에 도달하였는지 여부를 판단한다(단계 S4).Next, when the water level sensor 60 installed in the vessel 10 senses the liquid level in the vessel 10 and sends a water level sensing signal to the controller 80, the controller 80 determines whether the liquid level in the vessel 10 is the highest It is determined whether or not the water level H has been reached (step S4).
만약, 베셀(10)내의 액체 수위가 최고수위(H)에 도달하지 않았다면, 앞서 언급한 바와 같이 메인 액체입력단 오토밸브(24)를 개방된 상태로 계속 유지하여 액체를 계속적으로 베셀(10)로 공급한다. If the liquid level in the vessel 10 does not reach the maximum water level H, the main liquid inlet automatic valve 24 is kept open to continuously supply the liquid to the vessel 10 Supply.
만약 액체 수위가 고수위(H) 이상에 도달하게 되면, 제어부(80)로부터 인가되는 신호에 따라 메인 액체입력단 오토밸브(24)가 오프(off)되어 폐쇄된 상태를 유지하게 되고 이에 의해 베셀(10)로의 액체공급을 중단시킨다. 이러한 상태에서, 제어부(80)로부터 인가되는 신호에 따라 1차 가압수단(30)이 작동하여 일정한 고정압력의 질소(N2)가스를 베셀(10)로 공급하게 된다(단계 S5). 즉, 제어부(80)로부터 인가되는 신호에 따라 제2 펌프(32)를 작동시켜서 질소(N2)가스를 베셀(10)로 공급하게 되는데, 이때 제2 도관(31)에서 제2 펌프(32)의 하류에 설치된 질소가스 압력센서(36)는 제2 펌프(32)로부터 베셀(10)쪽으로 공급되는 질소(N2)가스의 압력을 감지하게 된다. If the liquid level reaches the high water level H or higher, the main liquid inlet auto-valve 24 is turned off to maintain the closed state according to the signal from the controller 80, ). ≪ / RTI > In this state, to supply a primary pressure means (30), nitrogen (N 2) of a certain fixed pressure in the operating gas in accordance with the signal supplied from the control unit 80 to the vessel 10 (step S5). That is, the second pump 32 is operated in accordance with the signal from the control unit 80 to supply the nitrogen (N 2 ) gas to the vessel 10. At this time, the second pump 32 The nitrogen gas pressure sensor 36 installed downstream of the second pump 32 senses the pressure of nitrogen (N 2 ) gas supplied from the second pump 32 to the vessel 10.
한편, 제어부(80)는 메인 액체입력단 압력센서(26)로부터 전달되는 액체의 공급압력과 질소가스 압력센서(36)로부터 전달되는 메인 질소(N2)가스의 공급압력을 계산하여 2차 가압수단(40)를 작동시켜서 베셀(10)로 미세압력 조절용 질소(N2)가스를 추가 공급하거나 또는 베셀(10)내의 질소(N2)가스 압력을 배기시킨다. On the other hand, the control unit 80 calculates the supply pressure of the liquid delivered from the main liquid input end pressure sensor 26 and the supply pressure of the main nitrogen (N 2 ) gas delivered from the nitrogen gas pressure sensor 36, (N 2 ) gas for fine pressure control is further supplied to the vessel 10 or the nitrogen (N 2 ) gas pressure in the vessel 10 is exhausted.
즉, 제어부(80)는 메인 액체입력단 압력센서(26)로부터 전달되는 액체의 공급압력과 질소가스 압력센서(36)로부터 전달되는 메인 질소(N2)가스의 공급압력을 기초로 하여 이들 압력의 합이 베셀(10)내에 기설정한 목표압력보다 큰지 여부를 판단한다(단계 S6). That is, the control unit 80 controls the supply pressure of the liquid supplied from the main liquid input end pressure sensor 26 and the supply pressure of the main nitrogen (N 2 ) gas delivered from the nitrogen gas pressure sensor 36, It is determined whether or not the sum is greater than a target pressure set in the vessel 10 (step S6).
만약, 액체의 공급압력과 메인 질소(N2)가스의 공급압력의 합이 베셀(10) 내부의 목표압력, 예를 들어 1kgf/㎠에 미달하는 경우에는 제3 펌프(42)를 작동시키고 질소가스 공급용 오토밸브(44)를 개방시켜서 베셀(10)내로 미세압력 조절용 질소(N2)가스를 추가 공급한다(단계 S7-1). If the sum of the supply pressure of the liquid and the supply pressure of the main nitrogen N 2 gas is less than the target pressure in the vessel 10, for example 1 kgf / cm 2, the third pump 42 is operated, The gas supply auto valve 44 is opened to additionally supply nitrogen (N 2 ) gas for fine pressure control into the vessel 10 (step S7-1).
만약, 공급액체의 공급압력과 메인 질소(N2)가스의 공급압력의 합이 베셀(10) 내부의 목표압력, 예를 들어 1kgf/㎠를 초과하는 경우에는, 질소가스 공급용 오토밸브(44)는 오프(off)시켜서 폐쇄된 상태를 유지하고, 배기펌프인 제4 펌프(48)를 작동시키고 질소가스 배기용 오토밸브(46)를 개방시켜서 베셀(10)로부터 질소(N2)가스를 배기시킨다(단계 S7-2). If the sum of the supply pressure of the supply liquid and the supply pressure of the main nitrogen N 2 gas exceeds the target pressure in the vessel 10, for example 1 kgf / cm 2, the nitrogen gas supply auto valve 44 The fourth pump 48 as an exhaust pump is operated and the nitrogen gas exhausting valve 46 is opened to remove nitrogen (N 2 ) gas from the vessel 10 (Step S7-2).
베셀(10)내의 질소(N2)가스 압력을 외부로 배기시키기 위한 질소가스 배기용 오토밸브(46)의 작동과는 별도로, 제어부(80)는 베셀(10)내에 2차 가압수단(40)에 의해 조절할 수 있는 범위를 넘어설 정도의 지나친 과압, 즉 미리 설정한 압력수준에 해당하는 과압이 감지되는지 여부를 판단한다(단계 S8), Second pressing means in a nitrogen (N 2) operation and separately, the control unit 80 of the automatic valve 46 for nitrogen gas exhaust for evacuating the gas pressure to the outside is the vessel 10 in the vessel 10, 40, It is judged whether or not overpressure corresponding to a predetermined overpressure level exceeding the range that can be controlled by the pressure sensor (step S8)
만약, 베셀(10)내에서 지나친 과압이 감지되는 경우, 제어부(80)는 릴리프 밸브(50)를 개방시켜서 질소(N2)가스를 외부에 강제 배기시키는 기능을 수행하게 된다(단계 S9-1). If excessive overpressure is detected in the vessel 10, the control unit 80 opens the relief valve 50 to perform a function of forcibly evacuating the nitrogen (N 2 ) gas to the outside (Step S9-1 ).
만약, 베셀(10)내에서 지나친 과압이 감지되지 않는 경우에는, 제어부(80)는 릴리프 밸브(50)를 계속 폐쇄된 상태로 유지시킨다(단계 S9-2). If excessive overpressure is not detected in the vessel 10, the control unit 80 keeps the relief valve 50 kept closed (step S9-2).
다음으로, 제어부(80)는 질소가스 배기용 오토밸브(46)의 배기 작동에 의해 베셀(10)내의 액체 수위가 저수위(L)에 도달하였는지 여부를 판단한다(단계 S10). Next, the control unit 80 determines whether the liquid level in the vessel 10 has reached the low water level L by the exhaust operation of the nitrogen gas exhausting auto-valve 46 (step S10).
만약, 베셀(10)에 설치된 수위센서(60)가 베셀(10)내의 액체 수위를 감지하여 액체 수위가 저수위(L)에 도달하지 않은 경우에는, 앞서 설명한 바와 같이 질소가스 배기용 오토밸브(46)를 개방시켜서 베셀(10)로부터 질소(N2)가스를 배기시키는 동작을 계속 수행하게 된다. If the water level sensor 60 provided in the vessel 10 senses the liquid level in the vessel 10 and the liquid level does not reach the low level L, the nitrogen gas exhausting automatic valve 46 (N 2 ) gas is exhausted from the vessel 10.
만약, 베셀(10)에 설치된 수위센서(60)가 베셀(10)내의 액체 수위를 감지하여 액체 수위가 저수위(L)에 도달하는 경우, 앞서 설명한 바와 같이 질소가스 배기용 오토밸브(46)를 오프(off)시켜서 폐쇄된 상태를 유지한다. 이와 함께, 제어부(80)로부터 인가되는 신호에 따라 액체입력단 오토밸브(24)가 개방되어 액체의 공급을 재개하게 된다(S11).If the water level sensor 60 installed in the vessel 10 senses the liquid level in the vessel 10 and the liquid level reaches the low level L, the nitrogen gas exhausting automatic valve 46 Off state to maintain the closed state. At the same time, the liquid inlet automatic valve 24 is opened according to the signal from the control unit 80 to resume the supply of the liquid (S11).
이상에서 설명한 바와 같이, 본 발명의 바람직한 실시 예에 따른 고정압력유지 액체 공급장치(100)를 이용한 고정압력유지 액체 공급방법은 각각의 단계들을 폐루프의 형태로 반복적으로 수행하여, 메인 공급 압력의 대외적인 영향에 의해 변화하는 액체의 공급압력을 1차 가압수단 및 미세 조정용 질소가스 가압 수단의 협동작용에 의해 최종 공급단에서 일정하게 유지시킨다. As described above, the fixed pressure holding liquid supplying method using the fixed pressure holding liquid supplying apparatus 100 according to the preferred embodiment of the present invention repeatedly performs the respective steps in the form of a closed loop, The supply pressure of the liquid which changes due to external influences is kept constant at the final supply end by the cooperative action of the primary pressurizing means and the nitrogen gas pressurizing means for fine adjustment.
이상에서는 본 발명의 바람직한 실시 예를 참조하여 설명하였지만, 해당 기술분야의 숙련된 당업자라면 하기의 특허청구범위에 기재된 본 발명의 사상 및 영역으로부터 벗어나지 않는 범위 내에서 본 발명을 다양하게 수정 및 변경시킬 수 있음을 이해할 수 있을 것이다.While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. It can be understood that it is possible.

Claims (6)

  1. 고정압력유지 액체 공급장치(100)로서,As the fixed pressure holding liquid supply apparatus (100)
    지속적으로 일정압력을 유지시키는 액체를 수용하는 베셀(vessel)(10);A vessel 10 for receiving a liquid which maintains a constant pressure;
    상기 베셀(10)에 유체 연결되고, 적정량의 일정압력유지용 액체를 상기 베셀(10)로 공급하기 위한 메인 액체공급수단(20);Main liquid supply means (20) fluidly connected to the vessel (10) for supplying a suitable amount of constant - pressure maintaining liquid to the vessel (10);
    상기 베셀(10)에 유체 연결되고, 일정 고정압력을 유지하는 메인 질소(N2)가스를 상기 베셀(10)에 공급하기 위한 1차 가압수단(30); Said vessel being in fluid communication (10), a main nitrogen to maintain a constant fixing pressure (N 2) 1 primary pressure means (30) for supplying the gas to the vessel (10);
    상기 베셀(10)에 유체 연결되고, 상기 액체의 공급압력과 상기 메인 질소(N2)가스의 고정압력과의 차압을 세밀하게 조정하도록 질소(N2)가스를 추가 공급하거나 배기하여 상기 베셀(10) 내의 압력을 일정하게 유지하기 위한 2차 가압수단(40);A nitrogen (N 2 ) gas is further supplied or exhausted to finely adjust the pressure difference between the supply pressure of the liquid and the fixing pressure of the main nitrogen (N 2 ) gas, Secondary pressure means (40) for maintaining the pressure in the second chamber (10) constant;
    상기 베셀(10)에 설치되어 상기 베셀(10)내 액체의 수위를 감지하는 수위센서(60); A level sensor 60 installed in the vessel 10 to sense the level of the liquid in the vessel 10;
    상기 베셀(10)로부터 배출되는 액체의 배출압력을 일정하게 유지하기 위한 출력단 압력유지수단(70); 및 An output stage pressure maintaining means (70) for keeping the discharge pressure of the liquid discharged from the vessel (10) constant; And
    상기 고정압력유지 액체 공급장치(100)의 전체적인 작동을 제어하는 제어장치(80);A control device (80) for controlling the overall operation of the fixed pressure holding liquid supply device (100);
    를 포함하는 것을 특징으로 하는 고정압력유지 액체 공급장치.Pressure-holding liquid supply device.
  2. 제 1 항에 있어서, The method according to claim 1,
    상기 베셀(10)내에서 이상과압이 감지되는 경우 상기 베셀(10)로부터 질소(N2)가스를 외부로 강제 배기시키기 위한 과압방지 배기수단(50)을 더 포함하는 것을 특징으로 하는 고정압력유지 액체 공급장치.Maintaining a fixed pressure, characterized in that it further comprises a nitrogen (N 2) over-pressure preventing the exhaust means (50) for forcibly exhausting the gas to the outside from the vessel 10 if the above over-pressure is detected within said vessel (10) Liquid supply.
  3. 제 1 항에 있어서, The method according to claim 1,
    상기 메인 액체공급수단(20)은 일정압력 유지용 액체를 상기 베셀(10)내로 펌핑하기 위한 제1 펌프(22), 상기 제1 펌프(22)와 상기 베셀(10) 사이에서 연장되는 제1 도관(21)에 설치되는 메인 액체입력단 오토밸브(24), 및 메인 액체입력단 압력센서(26)를 포함하는 것을 특징으로 하는 고정압력유지 액체 공급장치.The main liquid supply means 20 includes a first pump 22 for pumping a constant pressure maintaining liquid into the vessel 10, a first pump 22 for extending between the first pump 22 and the vessel 10, A main liquid inlet automatic valve (24) installed in the conduit (21), and a main liquid inlet pressure sensor (26).
  4. 제 1 항에 있어서, The method according to claim 1,
    상기 1차 가압수단(30)은 일정 고정압력을 유지하는 질소(N2)가스를 상기 베셀(10)내로 펌핑하기 위한 제2 펌프(32), 상기 제2 펌프(32)와 상기 베셀(10) 사이에서 연장되는 제2 도관(21)에 설치되는 메인 질소가스 압력센서(36)를 포함하는 것을 특징으로 하는 고정압력유지 액체 공급장치.The primary pressurizing means 30 includes a second pump 32 for pumping nitrogen (N 2 ) gas maintaining a constant fixed pressure into the vessel 10, a second pump 32 for pumping the gas to the vessel 10 And a main nitrogen gas pressure sensor (36) installed in a second conduit (21) extending between the first conduit (21) and the second conduit (21).
  5. 제 1 항에 있어서, The method according to claim 1,
    상기 2차 가압수단(40)은 미세 압력조정용 질소(N2)가스를 상기 베셀(10)내로 펌핑하기 위한 제3 펌프(42), 상기 제3 펌프(42)와 상기 베셀(10) 사이에서 연장되는 제3 도관(41)에 설치되는 질소가스 공급용 오토밸브(44), 상기 베셀(10)내로 공급된 질소(N2)가스의 일부를 배기하기 위한 제4 펌프(48), 및 상기 제4 펌프(48)와 상기 베셀(10) 사이에서 연장되는 제4 도관(45)에 설치되는 질소가스 배기용 오토밸브(46)를 포함하는 것을 특징으로 하는 고정압력유지 액체 공급장치.The secondary pressurizing means 40 includes a third pump 42 for pumping nitrogen (N 2 ) gas for fine pressure regulation into the vessel 10, a third pump 42 for pumping nitrogen A fourth pump 48 for exhausting a part of nitrogen (N 2 ) gas supplied into the vessel 10, and a second pump 48 for exhausting a part of nitrogen And an automatic valve for exhausting nitrogen gas (46) installed in a fourth conduit (45) extending between the fourth pump (48) and the vessel (10).
  6. 제 1 항에 있어서, The method according to claim 1,
    상기 출력단 압력유지수단(70)은, 상기 베셀(10)로부터 배출되는 액체를 수요처로 공급하기 위해 펌핑작업을 수행하는 제5 펌프(72), 상기 제5 펌프(72)와 상기 베셀(10) 사이에서 연장되는 제5 도관(71)에 설치되는 적산 유량계(73), 출력단 오토밸브(74), 레귤레이터(75), 및 출력단 압력센서(76)를 포함하는 것을 특징으로 하는 고정압력유지 액체 공급장치.The output-stage pressure maintaining means 70 includes a fifth pump 72 for performing a pumping operation to supply the liquid discharged from the vessel 10 to a customer, a fifth pump 72 connected to the fifth pump 72, And an output port pressure sensor (76), which is provided on a fifth conduit (71) extending between the output port (71) and the output port (71), an output stage automatic valve (74), a regulator Device.
PCT/KR2018/013525 2018-01-02 2018-11-08 Liquid supply device for maintaining fixed pressure WO2019135483A1 (en)

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