WO2019130586A1 - Prepreg mica tape, coil for rotating electrical machine, and method for manufacturing same - Google Patents

Prepreg mica tape, coil for rotating electrical machine, and method for manufacturing same Download PDF

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Publication number
WO2019130586A1
WO2019130586A1 PCT/JP2017/047386 JP2017047386W WO2019130586A1 WO 2019130586 A1 WO2019130586 A1 WO 2019130586A1 JP 2017047386 W JP2017047386 W JP 2017047386W WO 2019130586 A1 WO2019130586 A1 WO 2019130586A1
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WIPO (PCT)
Prior art keywords
group
mica tape
prepreg mica
general formula
prepreg
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PCT/JP2017/047386
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French (fr)
Japanese (ja)
Inventor
駿介 長井
貴耶 山本
西山 雅也
斉藤 晃一
敬二 福島
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日立化成株式会社
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Priority to PCT/JP2017/047386 priority Critical patent/WO2019130586A1/en
Publication of WO2019130586A1 publication Critical patent/WO2019130586A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B17/00Insulators or insulating bodies characterised by their form
    • H01B17/56Insulating bodies
    • H01B17/60Composite insulating bodies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/02Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
    • H01B3/04Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances mica
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/40Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes epoxy resins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B7/00Insulated conductors or cables characterised by their form
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F5/00Coils
    • H01F5/06Insulation of windings
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K3/00Details of windings
    • H02K3/32Windings characterised by the shape, form or construction of the insulation

Definitions

  • the present invention relates to a prepreg mica tape, a coil for a rotating electrical machine, and a method of manufacturing the same.
  • a prepreg (resin rich) mica tape composed of a resin, mica and a backing material is often used.
  • a method is often used in which an inorganic filler having a thermal conductivity higher than that of a resin and mica is added to the tape.
  • the cured product of the prepreg mica tape has a high glass transition temperature. Therefore, for example, in WO 2015/053374, BF 3 monoethylamine complex is used as a curing agent for epoxy resin.
  • BF 3 monoethylamine complex When BF 3 monoethylamine complex is used as a curing agent for epoxy resin, it is possible to realize a high glass transition temperature of a cured product of a prepreg mica tape, but there are problems in coil production. For example, a hydrostatic pressing method has become mainstream as a method of manufacturing a coil. However, in this method, since it takes time to press in the coil molding process, it is necessary to prolong the gel time of the resin. However, when BF 3 monoethylamine complex is used, the gel time of the resin tends to be short.
  • One embodiment of the present invention has been made in view of the above-described conventional circumstances, and is capable of forming a cured product having a high glass transition temperature, and capable of securing a long gel time, and a rotating electrical machine using the same. It aims at providing a coil and its manufacturing method.
  • the specific means for achieving the said subject are as follows.
  • backing material Provided on one surface side of the backing, and mica, and a thermosetting resin, SbF 6 -, PF 6 - , BF 4 - and (Rf) b PF 6-b - (Rf 80% or more of the hydrogen And M represents a fluorine atom-substituted alkyl group, and b represents an integer of 1 to 5.
  • a curing agent containing any of the following as an anionic species Prepreg mica tape.
  • R 1 and R 2 each independently represent an alkyl group, a phenyl group, a benzyl group, a naphthyl group or a naphthylmethyl group.
  • R 3 independently represents an alkyl group, a hydroxy group, Carboxy group, alkoxy group, aryloxy group, alkylcarbonyl group, arylcarbonyl group, aralkylcarbonyl group, aralkylcarbonyl group, alkoxycarbonyl group, aryloxycarbonyl group, aralkyloxycarbonyl group, alkylcarbonyloxy group, arylcarbonyloxy group, aralkylcarbonyloxy group , Alkoxycarbonyloxy group, aryloxycarbonyloxy group, aralkyloxycarbonyloxy group, arylthiocarbonyl group, arylthio group, alkylthio group, aryl group, heterocyclic hydrocarbon group, alkylsulfonyl group
  • R 1 represents an alkyl group, a benzyl group, a naphthyl group or naphthylmethyl group of 1 to 4 carbon atoms
  • R 2 is .
  • R 4 represents an alkyl group having 1 to 4 carbon atoms Represents a hydrogen atom, an R-CO- group or an R-SO 2 -group (R represents an alkyl group having 1 to 4 carbon atoms which may be substituted with one or more halogen atoms).
  • R 5 independently represents an alkyl group having 1 to 4 carbon atoms or a halogen atom, and m represents an integer of 0 to 4.
  • R 4 in the general formula (II) is an R—CO— group (R represents an alkyl group having 1 to 4 carbon atoms which may be substituted with one or more halogen atoms)
  • Prepreg mica tape described in ⁇ 4> Prepreg mica tape described in ⁇ 4>.
  • R 1 in the general formula (II) is an alkyl group having 1 to 4 carbon atoms.
  • the anion species, SbF 6 - and is ⁇ 1> prepreg mica tape according to any one of - ⁇ 6>.
  • thermosetting resin contains an epoxy resin.
  • thermosetting resin contains an epoxy resin.
  • thermosetting resin contains an epoxy resin.
  • a coil for a rotating electrical machine having a.
  • ⁇ 10> A step of forming a laminate of a prepreg mica tape according to any one of ⁇ 1> to ⁇ 8>, covering at least a part of the outer periphery of the coil conductor. Curing the laminate of the prepreg mica tape to form an insulating layer; The manufacturing method of the coil for rotary electric machines which has.
  • a prepreg mica tape capable of forming a cured product having a high glass transition temperature and capable of securing a long gel time, a coil for a rotating electrical machine using the same, and a method of manufacturing the same are provided. it can.
  • the present invention is not limited to the following disclosure.
  • the constituent elements including element steps and the like
  • the term “step” includes, in addition to steps independent of other steps, such steps as long as the purpose of the step is achieved even if it can not be clearly distinguished from other steps.
  • numerical values described before and after “to” are included in the numerical range indicated using “to” as the minimum value and the maximum value, respectively.
  • each component may contain a plurality of corresponding substances.
  • the content or content of each component is the total content or content of the plurality of substances present in the composition unless otherwise specified.
  • particles corresponding to each component may contain a plurality of types.
  • the particle diameter of each component means the value for the mixture of the plurality of particles present in the composition unless otherwise specified.
  • layer may mean that when the region in which the layer is present is observed, it is formed in only a part of the region, in addition to the case where the region is entirely formed. included.
  • laminate in the present disclosure refers to stacking layers, two or more layers may be combined, and two or more layers may be removable.
  • Prepreg mica tape >> The prepreg mica tape of the present disclosure is provided on a backing material, on one side of the backing material, and mica, thermosetting resin, SbF 6 ⁇ , PF 6 ⁇ , BF 4 ⁇ and (Rf) b PF 6-b - (.
  • Rf represents an alkyl group in which at least 80% of the hydrogen is substituted with a fluorine atom, b is of an integer of 1 to 5)
  • a curing agent comprising any of the anionic species (hereinafter, specific cure And (d) may be referred to as an agent)).
  • the mica-containing layer of the prepreg mica tape of the present disclosure contains a specific curing agent as a curing agent for a thermosetting resin, the prepreg mica tape of the present disclosure can form a cured product having a high glass transition temperature and is long It is presumed that gel time can be secured.
  • Prepreg mica tape is also referred to as resin rich mica tape. That is, the composition containing the thermosetting resin is contained in a large amount in advance in the entire prepreg mica tape, and the impregnation varnish is not required to be injected.
  • the content of the composition containing the thermosetting resin is generally in the range of about 15% by mass to 50% by mass relative to the total mass of the prepreg mica tape as described in JP-A-2010-197363. Is set according to the usage.
  • the prepreg mica tape can be wound on the coil conductor or the like while applying tension, so a compressive force resulting from this tension is applied to the mica-containing layer in the prepreg state.
  • the thickness of the prepreg mica tape is preferably 200 ⁇ m to 400 ⁇ m, and more preferably 250 ⁇ m to 350 ⁇ m.
  • the average thickness of the prepreg mica tape is obtained by measuring the thickness at 10 points using a micrometer (MDC-SB, Mitutoyo Co., Ltd.) and calculating the arithmetic average value thereof.
  • the configuration of the prepreg mica tape of the present disclosure may be any one having a backing material and a mica-containing layer provided on one surface side of the backing material, and may have other layers as necessary. Good. As other layers, a boron nitride-containing layer including a boron nitride provided on one side of the backing material, a thermosetting resin, and a curing agent for curing the thermosetting resin, and a mica-containing layer of the backing material are provided.
  • the protective layer (protective film) provided in the outermost surface of the other side, an adhesive layer, etc. are mentioned.
  • the order of the boron nitride-containing layer and the mica-containing layer provided on one side of the backing material is not particularly limited, and the backing material
  • the boron nitride-containing layer and the mica-containing layer may be sequentially formed, or the backing material, the mica-containing layer and the boron nitride-containing layer may be sequentially formed.
  • the prepreg mica tape of the present disclosure has a boron nitride-containing layer as another layer, a boron nitride-containing layer and a mica-containing layer are provided in this order on one surface side of the backing material from the viewpoint of easiness of production. Is preferred.
  • the prepreg mica tape of the present disclosure has a boron nitride-containing layer as another layer
  • the prepreg mica tape can have high thermal conductivity and combine good flexibility and high withstand voltage.
  • the reason why a prepreg mica tape having a boron nitride-containing layer has high thermal conductivity and has both good flexibility and high insulation withstand voltage is not clear, but is presumed as follows. Since boron nitride contained in the boron nitride-containing layer is a filler exhibiting high thermal conductivity, it is presumed that a prepreg mica tape having a boron nitride-containing layer containing boron nitride has high thermal conductivity.
  • boron nitride since the hardness of boron nitride is about half or less compared to that of alumina, it is presumed that it exhibits better flexibility as compared with a prepreg mica tape using alumina as a high thermal conductivity filler. Furthermore, by separately providing the boron nitride-containing layer and the mica-containing layer, it is possible to prevent the boron nitride particles from being mixed between the mica pieces. When the boron nitride particles are mixed between the mica pieces, the current path may be shortened and the insulation withstand voltage of the prepreg mica tape may be lowered.
  • the boron nitride particles are prevented from mixing between mica pieces, so that the current path is unlikely to be short. Therefore, it is surmised that a prepreg mica tape having a boron nitride-containing layer comes to have a high insulation withstand voltage. Furthermore, by providing both the boron nitride-containing layer and the mica-containing layer on one side of the backing material, the workability at the time of taping the prepreg mica tape to a coil conductor or the like is improved.
  • the mica-containing layer according to the present disclosure contains mica, a thermosetting resin and a specific curing agent.
  • the mica-containing layer according to the present disclosure may contain other components other than the mica, the thermosetting resin, and the specific curing agent, as necessary. As other components, various additives can be mentioned, for example.
  • the thickness of the mica-containing layer is not particularly limited, and is preferably in the range of 100 ⁇ m to 250 ⁇ m, and more preferably in the range of 110 ⁇ m to 230 ⁇ m.
  • the thickness of the mica-containing layer For the thickness of the mica-containing layer, observe a secondary electron image at an accelerating voltage of 10 kV under high vacuum after depositing platinum on a cross section of a prepreg mica tape using a scanning electron microscope (SEM) (for example, Philips, XL30) You can ask for it by doing.
  • SEM scanning electron microscope
  • the mica-containing layer preferably does not contain any other inorganic filler (such as boron nitride) other than mica, which is used as required. 3 mass% or less is preferable, as for the content rate of other inorganic fillers other than mica which occupy the whole quantity of the inorganic filler contained in a mica containing layer, 2 mass% or less is more preferable, 1 mass% or less is more preferable, and 0 Particularly preferred is mass%.
  • any other inorganic filler such as boron nitride
  • 3 mass% or less is preferable, as for the content rate of other inorganic fillers other than mica which occupy the whole quantity of the inorganic filler contained in a mica containing layer, 2 mass% or less is more preferable, 1 mass% or less is more preferable, and 0 Particularly preferred is mass%.
  • the boron nitride-containing layer used as needed contains boron nitride, a thermosetting resin, and a curing agent for curing the thermosetting resin.
  • the boron nitride-containing layer may optionally contain other components other than boron nitride, a thermosetting resin and a curing agent. As other components, various additives can be mentioned, for example.
  • the thickness of the boron nitride-containing layer is not particularly limited, and is preferably in the range of 80 ⁇ m to 200 ⁇ m.
  • the thickness of the boron nitride-containing layer after depositing platinum on a cross section of a prepreg mica tape using a scanning electron microscope (SEM) (for example, Philips, XL30), secondary electron images are obtained at an acceleration voltage of 10 kV under high vacuum It can be determined by observing.
  • SEM scanning electron microscope
  • the boron nitride-containing layer may contain other inorganic fillers other than boron nitride.
  • the content of boron nitride in the total amount of the inorganic filler contained in the boron nitride-containing layer is preferably 90% by mass to 100% by mass, more preferably 95% by mass to 100% by mass, and 98% by mass. More preferably, it is% to 100% by mass.
  • examples of the other inorganic fillers include alumina, magnesium oxide, aluminum nitride, silicon nitride, silicon oxide and the like.
  • a cloth obtained by using all or part of fibers made of an organic material may be used.
  • the organic material used to obtain the cloth include aramid, polyamide, polyimide, polyester and the like.
  • the fibers composed of an organic material may be used as warp, weft or both.
  • Inorganic fibers such as glass fibers may be used as fibers other than fibers composed of organic materials.
  • a glass cloth using glass fiber and an organic polymer film may be used in combination.
  • a glass cloth formed of glass fibers can also be used.
  • unfired hard mica, fired hard mica, unfired soft mica, fired soft mica, synthetic mica, flake mica, etc. can be used.
  • unfired hard mica as mica from the viewpoint of price and availability.
  • the proportion of mica pieces having a particle diameter of 2.8 mm or more when sifted using a JIS standard sieve is 50% by mass or more, and 55% by mass The content is more preferably 60% by mass or more. If the proportion of mica pieces having a particle diameter of 2.8 mm or more is 50% by mass or more, mica paper can stand on its own even without fibrils. It is advantageous to the heat conductivity that it does not put fibrilt.
  • the measurement of the particle size of the mica pieces is carried out according to the following method. 1% by mass of mica to be measured is added to 20 g of pure water, and the mica is dispersed by an ultrasonic dispersion machine to prepare a dispersion. After the dispersion is applied on the film, the film is placed on a hot plate and dried at 110 ° C. for 30 minutes. After drying, the particle size of mica is measured by visually observing the size of mica pieces on the film. Moreover, the ratio (mass reference
  • one type of mica may be used alone, or two or more types may be used in combination.
  • two or more types of mica are used in combination, for example, when two or more types of mica having the same component but different average particle sizes are used, the case where two or more types of mica having the same average particle size but different components are used, and the average particle size and There are cases where two or more kinds of different types of mica are used.
  • thermosetting resin As the thermosetting resin used in the present disclosure, epoxy resin, phenol resin, urea resin, melamine resin, unsaturated polyester resin, cyanate ester resin, polyimide resin, bismaleimide triazine resin, phenol aralkyl resin, etc. It can be used alone or in combination of two or more. Among the thermosetting resins, epoxy resins are preferred. As the epoxy resin, for example, bisphenol A epoxy resin, bisphenol F epoxy resin, phenol novolac epoxy resin, cresol novolac epoxy resin and alicyclic epoxy resin can be used alone or in combination of two or more kinds. .
  • thermosetting resin contained in the boron nitride-containing layer is the same as or different from the thermosetting resin contained in the mica-containing layer. It is also preferable that it is the same.
  • SbF 6 ⁇ , PF 6 ⁇ , BF 4 ⁇ and (Rf) b PF 6-b ⁇ (Rf represents an alkyl group in which 80% or more of hydrogen is substituted with a fluorine atom) B is not particularly limited as long as it contains any of 1 to 5) as an anionic species.
  • Rf) b PF 6-b - in Rf may each be the same or different.
  • Rf CF 3 , C 2 F 5 , (CF 3 ) 2 CF, C 3 F 7 , C 4 F 9 , (CF 3 ) 2 CFCF 2 , CF 3 CF 2 (CF 3 ) CF, (CF 3 )
  • the curing agent contained in the boron nitride-containing layer may be the same as or different from the curing agent contained in the mica-containing layer, and is the same Is preferred.
  • a curing agent other curing agents other than the specific curing agent may be used in combination.
  • curing agents include polyfunctional novolac resins, cresol novolac resins, polyfunctional phenol compounds such as aminotriazine novolac resins, amine compounds such as dicyandiamide, diaminodiphenylmethane, diaminodiphenylsulfone, phthalic anhydride, pyromellitic anhydride, and maleic anhydride Examples thereof include acid and acid anhydrides such as maleic anhydride copolymer.
  • the ratio of the specific curing agent to the curing agent is preferably 80% by mass to 100% by mass, more preferably 90% by mass to 100% by mass, and further preferably 95% by mass to 100% by mass. preferable.
  • the cationic species to be paired with the anionic species contained in the curing agent is not particularly limited, and aromatic sulfonium cations, aromatic iodonium cations and the like can be used.
  • the cationic species preferably contains an aromatic sulfonium cation from the viewpoint of the curing agent's potential.
  • the aromatic sulfonium cation contained as a cationic species in the curing agent is preferably a cationic species represented by the following general formula (I).
  • R 1 and R 2 each independently represent an alkyl group, a phenyl group, a benzyl group, a naphthyl group or a naphthylmethyl group.
  • Each R 3 independently represents an alkyl group, a hydroxy group, a carboxy group, an alkoxy group, an aryloxy group, an alkylcarbonyl group, an arylcarbonyl group, an aralkylcarbonyl group, an alkoxycarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an aralkyloxycarbonyl group, Alkyl carbonyloxy group, aryl carbonyloxy group, aralkyl carbonyloxy group, alkoxy carbonyloxy group, aryloxy carbonyloxy group, aralkyl oxy carbonyloxy group, arylthio carbonyl group, arylthio group, alkylthio group, aryl group, heterocyclic carbonization
  • examples of the alkyl group represented by R 1 to R 3 include a linear alkyl group having 1 to 18 carbon atoms, a branched alkyl group having 1 to 18 carbon atoms, and a cycloalkenyl having 3 to 18 carbon atoms.
  • An alkyl group etc. are mentioned.
  • Specific examples of the linear alkyl group having 1 to 18 carbon atoms include methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, n-octyl group, n-decyl group and n-dodecyl group.
  • branched alkyl group having 1 to 18 carbon atoms include an isopropyl group, an isobutyl group, a sec-butyl group, a t-butyl group, an isopentyl group, a neopentyl group, a t-pentyl group, an isohexyl group and an isooctadecyl group.
  • cycloalkyl group having 3 to 18 carbon atoms include cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, 4-decylcyclohexyl group and the like.
  • Examples of the alkoxy group represented by R 3 in the general formula (I) include a linear or branched alkoxy group having 1 to 18 carbon atoms. Specifically as an alkoxy group, a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, an isobutoxy group, a sec-butoxy group, a t-butoxy group, a hexyloxy group, a decyloxy group, a dodecyloxy group, an octadecyloxy group. And the like.
  • Examples of the aryloxy group represented by R 3 in the general formula (I) include aryloxy groups having 6 to 10 carbon atoms. Specific examples of the aryloxy group include phenoxy group and naphthyloxy group.
  • examples of the alkylcarbonyl group represented by R 3 include linear or branched alkylcarbonyl groups having 2 to 18 carbon atoms. Specifically as an alkylcarbonyl group, an acetyl group, a propionyl group, a butanoyl group, a 2-methylpropionyl group, a heptanoyl group, a 2-methylbutanoyl group, a 3-methylbutanoyl group, an octanoyl group, a decanoyl group, a dodecanoyl group, Octadecanoyl group etc. are mentioned.
  • examples of the arylcarbonyl group represented by R 3 include arylcarbonyl groups having 7 to 11 carbon atoms. Specific examples of the arylcarbonyl group include benzoyl group and naphthoyl group.
  • Examples of the aralkylcarbonyl group represented by R 3 in the general formula (I) include lower alkylcarbonyl groups substituted with an aryl group having 6 to 10 carbon atoms.
  • Specific examples of the aralkylcarbonyl group include benzylcarbonyl group, 2-methylbenzylcarbonyl group, 1-naphthylmethylcarbonyl group, 2-naphthylmethylcarbonyl group and the like.
  • alkoxycarbonyl group represented by R 3 in the general formula (I) examples include a linear or branched alkoxycarbonyl group having 2 to 19 carbon atoms.
  • Specific examples of the alkoxycarbonyl group include methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, sec-butoxycarbonyl, t-butoxycarbonyl, octyloxycarbonyl Groups, tetradecyloxycarbonyl group, octadecyloxycarbonyl group and the like.
  • Examples of the aryloxycarbonyl group represented by R 3 in the general formula (I) include an aryloxycarbonyl group having 7 to 11 carbon atoms. Specific examples of the aryloxycarbonyl group include phenoxy carbonyl group and naphthoxycarbonyl group.
  • examples of the aralkyloxycarbonyl group represented by R 3 include a lower alkoxycarbonyl group substituted with an aryl group having 6 to 10 carbon atoms.
  • Specific examples of the aralkyloxycarbonyl group include benzyloxycarbonyl group, 2-methylbenzyloxycarbonyl group, 1-naphthylmethyloxycarbonyl group, 2-naphthylmethyloxycarbonyl group and the like.
  • examples of the alkylcarbonyloxy group represented by R 3 include linear or branched alkylcarbonyloxy groups having 2 to 19 carbon atoms. Specifically as an alkyl carbonyloxy group, an acetoxy group, an ethyl carbonyloxy group, a propyl carbonyloxy group, an isopropyl carbonyloxy group, a butyl carbonyloxy group, an isobutyl carbonyloxy group, a sec-butyl carbonyloxy group, a t-butyl carbonyloxy group Groups, octyl carbonyloxy group, tetradecyl carbonyloxy group, octadecyl carbonyloxy group and the like.
  • Examples of the arylcarbonyloxy group represented by R 3 in the general formula (I) include arylcarbonyloxy groups having 7 to 11 carbon atoms. Specific examples of the arylcarbonyloxy group include benzoyloxy group and naphthoyloxy group.
  • examples of the aralkylcarbonyloxy group represented by R 3 include lower alkylcarbonyloxy groups substituted with aryl groups having 6 to 10 carbon atoms.
  • Specific examples of the aralkylcarbonyloxy group include benzylcarbonyloxy group, 2-methylbenzylcarbonyloxy group, 1-naphthylmethylcarbonyloxy group, 2-naphthylmethylcarbonyloxy group and the like.
  • alkoxycarbonyloxy group represented by R 3 in the general formula (I) examples include a linear or branched alkoxycarbonyloxy group having 2 to 19 carbon atoms.
  • Specific examples of the alkoxycarbonyloxy group include methoxycarbonyloxy group, ethoxycarbonyloxy group, propoxycarbonyloxy group, isopropoxycarbonyloxy group, butoxycarbonyloxy group, isobutoxycarbonyloxy group, sec-butoxycarbonyloxy group, t And -butoxycarbonyloxy group, octyloxycarbonyloxy group, tetradecyloxycarbonyloxy group, octadecyloxycarbonyloxy group and the like.
  • Examples of the aryloxycarbonyloxy group represented by R 3 in the general formula (I) include an aryloxycarbonyloxy group having 7 to 11 carbon atoms. Specific examples of the aryloxycarbonyloxy group include phenoxycarbonyloxy group and naphthoxycarbonyloxy group.
  • examples of the aralkyloxycarbonyloxy group represented by R 3 include lower alkoxycarbonyloxy groups substituted with an aryl group having 6 to 10 carbon atoms.
  • Specific examples of the aralkyloxycarbonyloxy group include benzyloxycarbonyloxy group, 2-methylbenzyloxycarbonyloxy group, 1-naphthylmethyloxycarbonyloxy group, 2-naphthylmethyloxycarbonyloxy group and the like.
  • Examples of the arylthiocarbonyl group represented by R 3 in the general formula (I) include arylthiocarbonyl groups having 7 to 11 carbon atoms. Specific examples of the arylthiocarbonyl group include phenylthiocarbonyl group and naphthylthiocarbonyl group.
  • Examples of the arylthio group represented by R 3 in the general formula (I) include arylthio groups having 6 to 20 carbon atoms.
  • Specific examples of the arylthio group include phenylthio group, 2-methylphenylthio group, 3-methylphenylthio group, 4-methylphenylthio group, 2-chlorophenylthio group, 3-chlorophenylthio group, 4-chlorophenylthio group, 2-bromophenylthio group, 3-bromophenylthio group, 4-bromophenylthio group, 2-fluorophenylthio group, 3-fluorophenylthio group, 4-fluorophenylthio group, 2-hydroxyphenylthio group, 4 -Hydroxyphenylthio group, 2-methoxyphenylthio group, 4-methoxyphenylthio group, 1-naphthylthio group, 2-naphthylthio group, 4-
  • examples of the alkylthio group represented by R 3 include linear or branched alkylthio groups having 1 to 18 carbon atoms.
  • Specific examples of the alkylthio group include methylthio group, ethylthio group, propylthio group, isopropylthio group, butylthio group, isobutylthio group, sec-butylthio group, t-butylthio group, pentylthio group, isopentylthio group, neopentylthio group.
  • Examples of the aryl group represented by R 3 in the general formula (I) include aryl groups having 6 to 10 carbon atoms. Specific examples of the aryl group include phenyl group, tolyl group, dimethylphenyl group and naphthyl group.
  • heterocyclic hydrocarbon group represented by R 3 in the general formula (I) examples include heterocyclic hydrocarbon groups having 4 to 20 carbon atoms.
  • Specific examples of the heterocyclic hydrocarbon group include thienyl group, furanyl group, pyranyl group, pyrrolyl group, oxazolyl group, thiazolyl group, pyridyl group, pyrimidyl group, pyrazinyl group, indolyl group, benzofuranyl group, benzothienyl group, quinolyl.
  • examples of the alkylsulfinyl group represented by R 3 include linear or branched alkylsulfinyl groups having 1 to 18 carbon atoms.
  • Specific examples of the alkylsulfinyl group include methylsulfinyl group, ethylsulfinyl group, propylsulfinyl group, isopropylsulfinyl group, butylsulfinyl group, isobutylsulfinyl group, sec-butylsulfinyl group, t-butylsulfinyl group, pentylsulfinyl group, iso Examples thereof include pentylsulfinyl group, neopentylsulfinyl group, t-pentylsulfinyl group, octylsulfinyl group, isooctadecylsulfinyl group and the like
  • examples of the arylsulfinyl group represented by R 3 include arylsulfinyl groups having 6 to 10 carbon atoms.
  • Specific examples of the arylsulfinyl group include phenylsulfinyl group, tolylsulfinyl group, and naphthylsulfinyl group.
  • examples of the alkylsulfonyl group represented by R 3 include a linear or branched alkylsulfonyl group having 1 to 18 carbon atoms.
  • Specific examples of the alkylsulfonyl group include methylsulfonyl group, ethylsulfonyl group, propylsulfonyl group, isopropylsulfonyl group, butylsulfonyl group, isobutylsulfonyl group, sec-butylsulfonyl group, t-butylsulfonyl group, pentylsulfonyl group, iso Examples thereof include pentyl sulfonyl group, neopentyl sulfonyl group, t-pentyl sulfonyl group, octyl sulfonyl group, octadecyl sulfon
  • Examples of the arylsulfonyl group represented by R 3 in the general formula (I) include an arylsulfonyl group having 6 to 10 carbon atoms. Specific examples of the arylsulfonyl group include phenylsulfonyl group, tolylsulfonyl group (tosyl group), and naphthylsulfonyl group.
  • examples of the alkylsulfonyloxy group represented by R 3 include linear or branched alkylsulfonyloxy groups having 1 to 18 carbon atoms. Specifically, as the alkylsulfonyloxy group, methylsulfonyloxy group, ethylsulfonyloxy group, propylsulfonyloxy group, isopropylsulfonyloxy group, butylsulfonyloxy group, isobutylsulfonyloxy group, sec-butylsulfonyloxy group, t-butyl A sulfonyloxy group, a pentyl sulfonyloxy group, an isopentyl sulfonyloxy group, a neopentyl sulfonyloxy group, a t-pentyl sulfonyloxy group, an octyl s
  • Examples of the arylsulfonyloxy group represented by R 3 in the general formula (I) include an arylsulfonyloxy group having 6 to 10 carbon atoms. Specific examples of the arylsulfonyloxy group include phenylsulfonyloxy group, tolylsulfonyloxy group, and naphthylsulfonyloxy group.
  • examples of the amino group represented by R 3 include an amino group (—NH 2 ), a substituted amino group having 1 to 15 carbon atoms, and the like.
  • a substituted amino group methylamino group, dimethylamino group, ethylamino group, methylethylamino group, diethylamino group, n-propylamino group, methyl-n-propylamino group, ethyl-n-propylamino group
  • Examples of the halogen atom represented by R 3 in the general formula (I) include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
  • n represents the number of R 3 and is preferably an integer of 0 to 5, more preferably 0 to 3, still more preferably 0 to 2, particularly preferably 0 or 1 It is.
  • Each group represented by R 1 to R 3 may further have a substituent.
  • substituents include an alkyl group, an aryl group, an amino group, a cyano group, a nitro group, a halogen atom and the like.
  • the cation represented by the general formula (I) is preferably a cation represented by the general formula (II).
  • R 1 represents an alkyl group having 1 to 4 carbon atoms, a benzyl group, a naphthyl group or a naphthylmethyl group
  • R 2 represents an alkyl group having 1 to 4 carbon atoms
  • R 4 is a hydrogen atom, R-CO- group or R-SO 2 -group (R represents an alkyl group having 1 to 4 carbon atoms which may be substituted by one or more halogen atoms).
  • R 5 independently represents an alkyl group having 1 to 4 carbon atoms or a halogen atom.
  • m is an integer of 0 to 4;
  • alkyl group having 1 to 4 carbon atoms in R 1 , R 2 , R 4 or R 5 include methyl, ethyl, n-propyl, isopropyl and n- Examples thereof include a butyl group, an isobutyl group, a sec-butyl group and a t-butyl group.
  • m is an integer of 0 to 4, preferably 0 to 3, more preferably 0 to 2, and still more preferably 0 or 1.
  • R 4 is an R-CO- group or an R-SO 2 -group (R is an alkyl group having 1 to 4 carbon atoms which may be substituted with one or more halogen atoms Is preferable, and R-CO- group is more preferable.
  • R-CO- group represented as R 4 is more preferably an acetyl group.
  • R 4 is an R-CO- group
  • specific examples of the R 4 O- group are those having 2 to 5 carbon atoms of the specific examples when R 3 in the general formula (I) is an alkylcarbonyloxy group It is similar to Also, specific examples of the R 4 O- group when R 4 is a R-SO 2 -group are the carbon numbers of the specific examples when R 3 in the general formula (I) is an alkylsulfonyloxy group It is similar to that of 1 to 4.
  • R 1 is preferably an alkyl group, a naphthyl group or a naphthylmethyl group, more preferably an alkyl group having 1 to 4 carbon atoms, and a methyl group It is further preferred that In general formula (I) or general formula (II), the preferable combination of R 1 and R 2, R 1 and R 2 are both include a combination of a methyl group.
  • the content of the curing agent is not particularly limited.
  • the ratio of the curing agent to the thermosetting resin is preferably 0.001 to 0.05 in mass ratio (curing agent / thermosetting resin). From the viewpoint of increasing the glass transition temperature of the cured product, it is more preferable to set it to 0.004 to 0.05, and from the viewpoint of increasing the gel time, it is more preferable to set it to 0.004 to 0.015, and the catalyst From the viewpoint of reducing the amount used, it is particularly preferable to set it to 0.004 to 0.01.
  • boron nitride may be used as a means for increasing the thermal conductivity of the prepreg mica tape.
  • boron nitride contained in the boron nitride-containing layer include hexagonal boron nitride (h-BN), cubic boron nitride (c-BN), wurtzite boron nitride and the like.
  • hexagonal boron nitride (h-BN) is preferable.
  • the boron nitride may be a primary particle of boron nitride formed in a scaly shape or a secondary particle formed by aggregating such primary particles.
  • the average particle diameter of boron nitride is preferably 1 ⁇ m to 40 ⁇ m, more preferably 5 ⁇ m to 20 ⁇ m, and still more preferably 5 ⁇ m to 10 ⁇ m.
  • the average particle diameter of boron nitride is 1 ⁇ m or more, the thermal conductivity and the insulation withstand voltage tend to be further improved. It can suppress that the anisotropy of the heat conductivity by the anisotropy of particle shape becomes it large that the average particle diameter of boron nitride is 40 micrometers or less is too large.
  • the average particle size of boron nitride can be measured by using a laser diffraction / scattering particle size distribution measuring apparatus (for example, Microtrac MT3000II, Nikkiso Co., Ltd.). After the boron nitride powder is introduced into pure water, it is dispersed by an ultrasonic dispersion machine. The particle size distribution of boron nitride is measured by measuring the particle size distribution of this dispersion. Based on the particle size distribution, the average particle size is determined as the particle size corresponding to 50% of the volume accumulation from the small diameter side.
  • a laser diffraction / scattering particle size distribution measuring apparatus for example, Microtrac MT3000II, Nikkiso Co., Ltd.
  • One type of boron nitride may be used alone, or two or more types may be used in combination.
  • two or more types of boron nitride are used in combination, for example, when using two or more types of boron nitride having the same component and different average particle sizes, the case of using two or more types of boron nitride having the same average particle size and different components The case where two or more types of boronitrides different in particle diameter and type are used may be mentioned.
  • the boron nitride content is 10% by volume to 50% of the total amount of the solid content excluding the backing material and mica contained in the prepreg mica tape. It is preferably volume%, more preferably 15 volume% to 35 volume%. If the content of boron nitride is 10% by volume or more, the thermal conductivity of the prepreg mica tape tends to be further improved. If the content of boron nitride is 50% by volume or less, the filling of the boron nitride into the resin tends to be difficult.
  • the additives used in the present disclosure may include various additives generally used in resin compositions, such as coupling agents, elastomers, antioxidants, anti-aging agents, stabilizers, flame retardants, thickeners and the like. it can.
  • the content of these additives is not particularly limited as long as the effects of the present disclosure are not impaired.
  • a curing retarder can be used for the purpose of suppressing the curing rate of the curing agent.
  • the content of the curing retarder can be appropriately set according to the curing rate, and is not particularly limited as long as the effects of the present disclosure are not impaired.
  • the prepreg mica tape may be produced through any process, and a conventionally known production method can be applied.
  • a resin varnish preparing step of preparing a resin varnish in which a thermosetting resin, a curing agent and boron nitride and other materials used as needed are mixed in a solvent includes a laminating step of laminating a backing material and mica paper to obtain a laminate, and an applying step of applying a resin varnish from the backing material side of the laminate.
  • the resin varnish contains boron nitride
  • the resin may be diluted with a solvent in order to fill the thermosetting resin with boron nitride.
  • a solvent to be used it is suitably selected from the organic solvent used normally. Specifically, solvents such as methyl ethyl ketone, methanol and cyclohexanone can be mentioned.
  • the resin varnish contains boron nitride
  • the resin varnish is applied to one surface side of the backing material, and the resin varnish is dried to form a boron nitride-containing layer.
  • the portion which was the mica paper is a mica-containing layer Be done.
  • thermosetting resin and the curing agent in the mica-containing layer and the heat in the boron nitride-containing layer of the prepreg mica tape produced through the above steps Both the curable resin and the curing agent are of the same type originating from the thermosetting resin and the curing agent contained in the resin varnish.
  • the resin varnish contains boron nitride
  • the resin varnish when the resin varnish is applied to one surface side of the backing material in the coating step, when a cloth such as glass cloth is used as the backing material, part of the resin varnish is the backing material It may exude to the other side of the By drying this, a boron nitride-containing layer may be formed on the other surface side of the backing material.
  • a prepreg mica tape having a boron nitride-containing layer formed on the other side of the backing material is also included in the scope of the prepreg mica tape of the present disclosure.
  • the prepreg mica tape of the present disclosure can be used to form an insulating layer of a coil conductor.
  • the prepreg mica tape of the present disclosure can also be used as a heat-resistant, electrically-insulating, heat-radiating spacer, for example, as a material for improving the heat radiation of a power transistor heat-dissipating insulating plate.
  • the coil for a rotating electrical machine of the present disclosure has a coil conductor, and an insulating layer including a cured product of the laminate of the prepreg mica tape of the present disclosure and covering at least a part of the outer periphery of the coil conductor.
  • the insulating layer contained in the coil for a rotating electrical machine of the present disclosure includes the cured product of the laminate of the prepreg mica tape of the present disclosure, so the glass transition temperature of the insulating layer can be increased. Therefore, the coil for a rotating electrical machine of the present disclosure is excellent in heat resistance.
  • the material, shape, size and the like of the coil conductor used for the coil for a rotating electrical machine of the present disclosure are not particularly limited, and can be selected according to the application and the like of the coil for a rotating electrical machine.
  • the method of manufacturing a coil for a rotating electrical machine comprises the steps of forming a laminate of the prepreg mica tape of the present disclosure covering at least a part of the outer periphery of the coil conductor, curing the laminate of the prepreg mica tape and insulating Forming a layer.
  • the process in particular of forming the laminated body of a prepreg mica tape is not restrict
  • the prepreg mica tape may be wound multiple times so that parts (for example, a half of the width of the prepreg mica tape) overlap each other.
  • the step of forming the insulating layer is not particularly limited, and a method which is usually performed can be employed.
  • a thermosetting resin is cured by heating and pressing a coil conductor covered at least a part of the outer periphery with a laminate of a prepreg mica tape or after vacuum treatment, thereby curing a thermosetting resin and a prepreg mica tape Are integrated to form an insulating layer.
  • the prepreg mica tape of the present disclosure can ensure a long gel time, so the method of manufacturing a coil for a rotating electrical machine of the present disclosure can extend the pressing time.
  • Example 1 Preparation of mica paper mica (a content of mica pieces having a particle diameter of 2.8 mm or more is 63% by mass) is dispersed in water to form mica particles, which are made into paper by a paper machine and mica having an average thickness of 0.13 mm Paper was made.
  • the average thickness of mica paper was obtained by measuring the thickness of 10 points using a micrometer (Mitutoyo, MDC-SB) and calculating the arithmetic average value thereof.
  • Preparation of Prepreg Mica Tape The obtained resin varnish was applied to a glass cloth (SOHYO Co., Ltd., WEA 03G 103) with a roll coater, and was further bonded to mica paper. After drying, it was cut into a width of 30 mm to form a prepreg mica tape.
  • the average thickness of the obtained prepreg mica tape was 280 ⁇ m.
  • the average thickness of the prepreg mica tape was determined by measuring the thickness of 10 points using a micrometer (Mitutoyo, MDC-SB) and calculating the arithmetic average value thereof.
  • the average thickness of the prepreg mica tape was measured by the same method.
  • the gel time of the obtained resin varnish was measured using a rheometer (Anton Pearl, MCR 301, frequency 1 Hz, swing angle 1%, temperature 120 ° C.). The point at which the storage elastic modulus value exceeded the loss elastic modulus value was defined as the gelation point for 0 minutes when the retention at 120 ° C. was started, and the gel time was determined as the gel time. As the gel time of the resin varnish becomes longer, the gel time of the prepreg mica tape also becomes longer.
  • a cured product of the obtained resin varnish was prepared by placing an appropriate amount of resin varnish on an aluminum cup and heating at 170 ° C. for 10 hours.
  • the visco-elastic property of the cured product of the resin varnish is measured using a visco-elastic device (TA Instrumental, RSAG2, frequency 10 Hz, load 50 g, heating rate 5 ° C./min), and the peak top temperature of tan ⁇ is glass transition temperature
  • a visco-elastic device T Instrumental, RSAG2, frequency 10 Hz, load 50 g, heating rate 5 ° C./min
  • the visco-elastic characteristics of the obtained prepreg mica tape cured product are measured using a visco-elastic device (TA Instrumental, RSAG2, frequency 10 Hz, load 50 g, heating rate 5 ° C./min), and the peak top temperature of tan ⁇ As the glass transition temperature.
  • a visco-elastic device T Instrumental, RSAG2, frequency 10 Hz, load 50 g, heating rate 5 ° C./min
  • the peak top temperature of tan ⁇ As the glass transition temperature.
  • Thermal conductivity The heat resistance value of the mica tape cured product was measured for the obtained prepreg mica tape cured product, using a heat resistance device (Yayodo Tester Co., Ltd., YST-901S). The thermal conductivity (W / (m ⁇ K)) was calculated by back-calculating the obtained thermal resistance value.
  • Comparative Example 1 Except for using the BF 3 monoethylamine complex as the curing agent, it was prepared and evaluated in the same manner as in Example 1.
  • Comparative Example 2 The same preparation and evaluation as in Comparative Example 1 were carried out except that the amount of the curing agent used was 4.3 parts by mass.
  • a prepreg mica tape having a high glass transition temperature, a long gel time, and a good coil moldability can be provided.
  • either high glass transition temperature or long gel time can not be satisfied.

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Abstract

This prepreg mica tape has: a backing material; and a mica-containing layer which is provided to one surface side of the backing material and which comprises mica, a thermosetting resin, and a curing agent that contains, as an anion species, one of SbF6 -, PF6 -, BF4 -, or (Rf)bPF6-b - (wherein, Rf represents an alkyl group in which at least 80% of hydrogen atoms are substituted by fluorine atoms, and b represents an integer between 1 and 5).

Description

プリプレグマイカテープ、回転電機用コイル及びその製造方法Prepreg mica tape, coil for rotating electrical machine and method of manufacturing the same
 本発明は、プリプレグマイカテープ、回転電機用コイル及びその製造方法に関する。 The present invention relates to a prepreg mica tape, a coil for a rotating electrical machine, and a method of manufacturing the same.
 絶縁層を備えるコイルの外側に水素ガス又は空気を通して冷却する間接冷却の方式を採用する発電機の分野では、コイルの絶縁層の厚み方向の高熱伝導化が望まれている。
 コイルの絶縁層として、樹脂とマイカと裏打ち材とからなるプリプレグ(レジンリッチ)マイカテープがよく用いられている。プリプレグマイカテープの熱伝導率を高めるためには、多くの場合、テープの中に樹脂及びマイカよりも熱伝導率の高い無機フィラーを加える手法が用いられている。
 一方、コイルの信頼性の向上を目的に、プリプレグマイカテープの硬化物が高ガラス転移温度であることが望まれている。そのため、例えば、国際公開2015/053374号では、エポキシ樹脂の硬化剤としてBFモノエチルアミン錯体が用いられている。
In the field of a generator employing a method of indirect cooling in which hydrogen gas or air is cooled to the outside of a coil provided with an insulating layer, high thermal conductivity in the thickness direction of the insulating layer of the coil is desired.
As an insulating layer of a coil, a prepreg (resin rich) mica tape composed of a resin, mica and a backing material is often used. In order to increase the thermal conductivity of a prepreg mica tape, a method is often used in which an inorganic filler having a thermal conductivity higher than that of a resin and mica is added to the tape.
On the other hand, in order to improve the reliability of the coil, it is desired that the cured product of the prepreg mica tape has a high glass transition temperature. Therefore, for example, in WO 2015/053374, BF 3 monoethylamine complex is used as a curing agent for epoxy resin.
 エポキシ樹脂の硬化剤としてBFモノエチルアミン錯体を用いると、プリプレグマイカテープの硬化物の高ガラス転移温度化を実現することができるが、コイル製造上の課題が見られる。
 例えば、コイルの製造方法として、静水圧プレス法が主流となっている。しかし、この手法では、コイル成型過程で時間をかけてプレスをするため、樹脂のゲルタイムを長時間化する必要がある。しかし、BFモノエチルアミン錯体を用いると、樹脂のゲルタイムが短くなる傾向があった。
 本発明の一形態は上記従来の事情に鑑みてなされたものであり、高いガラス転移温度を有する硬化物を形成可能であり、長いゲルタイムを確保可能なプリプレグマイカテープ並びにそれを用いた回転電機用コイル及びその製造方法を提供することを目的とする。
When BF 3 monoethylamine complex is used as a curing agent for epoxy resin, it is possible to realize a high glass transition temperature of a cured product of a prepreg mica tape, but there are problems in coil production.
For example, a hydrostatic pressing method has become mainstream as a method of manufacturing a coil. However, in this method, since it takes time to press in the coil molding process, it is necessary to prolong the gel time of the resin. However, when BF 3 monoethylamine complex is used, the gel time of the resin tends to be short.
One embodiment of the present invention has been made in view of the above-described conventional circumstances, and is capable of forming a cured product having a high glass transition temperature, and capable of securing a long gel time, and a rotating electrical machine using the same. It aims at providing a coil and its manufacturing method.
 前記課題を達成するための具体的手段は以下の通りである。
  <1> 裏打ち材と、
 前記裏打ち材の一方の面側に設けられ、マイカと、熱硬化性樹脂と、SbF 、PF 、BF 及び(Rf)PF6-b (Rfは水素の80%以上がフッ素原子で置換されたアルキル基を示し、bは1~5の整数を示す。)のいずれかをアニオン種として含む硬化剤と、を含むマイカ含有層と、
を有するプリプレグマイカテープ。
  <2> 前記硬化剤に含まれるカチオン種が、芳香族スルホニウムカチオンを含む<1>に記載のプリプレグマイカテープ。
  <3> 前記芳香族スルホニウムカチオンが、下記一般式(I)で表されるカチオン種である<2>に記載のプリプレグマイカテープ。
The specific means for achieving the said subject are as follows.
<1> backing material,
Provided on one surface side of the backing, and mica, and a thermosetting resin, SbF 6 -, PF 6 - , BF 4 - and (Rf) b PF 6-b - (Rf 80% or more of the hydrogen And M represents a fluorine atom-substituted alkyl group, and b represents an integer of 1 to 5. A curing agent containing any of the following as an anionic species:
Prepreg mica tape.
<2> The prepreg mica tape according to <1>, wherein the cationic species contained in the curing agent contains an aromatic sulfonium cation.
The prepreg mica tape as described in <2> whose <3> above-mentioned aromatic sulfonium cation is a cation seed | species represented with the following general formula (I).
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
(一般式(I)において、R及びRは各々独立に、アルキル基、フェニル基、ベンジル基、ナフチル基又はナフチルメチル基を示す。Rは、各々独立に、アルキル基、ヒドロキシ基、カルボキシ基、アルコキシ基、アリールオキシ基、アルキルカルボニル基、アリールカルボニル基、アラルキルカルボニル基、アルコキシカルボニル基、アリールオキシカルボニル基、アラルキルオキシカルボニル基、アルキルカルボニルオキシ基、アリールカルボニルオキシ基、アラルキルカルボニルオキシ基、アルコキシカルボニルオキシ基、アリールオキシカルボニルオキシ基、アラルキルオキシカルボニルオキシ基、アリールチオカルボニル基、アリールチオ基、アルキルチオ基、アリール基、複素環式炭化水素基、アルキルスルフィニル基、アリールスルフィニル基、アルキルスルホニル基、アリールスルホニル基、アルキルスルホニルオキシ基、アリールスルホニルオキシ基、ヒドロキシ(ポリ)アルキレンオキシ基、アミノ基、シアノ基、ニトロ基又はハロゲン原子を示す。nは0~5の整数を示す。)
  <4> 前記一般式(I)で表されるカチオン種が、下記一般式(II)で表されるカチオン種である<3>に記載のプリプレグマイカテープ。
(In the general formula (I), R 1 and R 2 each independently represent an alkyl group, a phenyl group, a benzyl group, a naphthyl group or a naphthylmethyl group. R 3 independently represents an alkyl group, a hydroxy group, Carboxy group, alkoxy group, aryloxy group, alkylcarbonyl group, arylcarbonyl group, aralkylcarbonyl group, aralkylcarbonyl group, alkoxycarbonyl group, aryloxycarbonyl group, aralkyloxycarbonyl group, alkylcarbonyloxy group, arylcarbonyloxy group, aralkylcarbonyloxy group , Alkoxycarbonyloxy group, aryloxycarbonyloxy group, aralkyloxycarbonyloxy group, arylthiocarbonyl group, arylthio group, alkylthio group, aryl group, heterocyclic hydrocarbon group, alkylsulfinyl group And arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, alkylsulfonyloxy group, arylsulfonyloxy group, hydroxy (poly) alkyleneoxy group, amino group, cyano group, nitro group or halogen atom, n is 0 to 5 Indicates an integer.)
<4> The prepreg mica tape according to <3>, wherein the cationic species represented by the general formula (I) is a cationic species represented by the following general formula (II).
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
(一般式(II)において、Rは炭素数が1~4のアルキル基、ベンジル基、ナフチル基又はナフチルメチル基を示し、Rは炭素数が1~4のアルキル基を示す。Rは水素原子、R-CO-基又はR-SO-基(Rは、1又は2以上のハロゲン原子で置換されていてもよい炭素数が1~4のアルキル基を示す。)を示す。Rは、各々独立に、炭素数が1~4のアルキル基又はハロゲン原子を示す。mは0~4の整数を示す。)
  <5> 一般式(II)におけるRが、R-CO-基(Rは、1又は2以上のハロゲン原子で置換されていてもよい炭素数が1~4のアルキル基を示す。)である<4>に記載のプリプレグマイカテープ。
  <6> 一般式(II)におけるRが、炭素数が1~4のアルキル基である<4>又は<5>に記載のプリプレグマイカテープ。
  <7> 前記アニオン種が、SbF である<1>~<6>のいずれか1項に記載のプリプレグマイカテープ。
  <8> 前記熱硬化性樹脂が、エポキシ樹脂を含む<1>~<7>のいずれか1項に記載のプリプレグマイカテープ。
  <9> コイル導体と、
 <1>~<8>のいずれか1項に記載のプリプレグマイカテープの積層体の硬化物を含み前記コイル導体の外周の少なくとも一部を覆うように配置された絶縁層と、
を有する回転電機用コイル。
  <10> コイル導体の外周の少なくとも一部を覆う、<1>~<8>のいずれか1項に記載のプリプレグマイカテープの積層体を形成する工程と、
 前記プリプレグマイカテープの積層体を硬化して絶縁層を形成する工程と、
を有する回転電機用コイルの製造方法。
(In the general formula (II), R 1 represents an alkyl group, a benzyl group, a naphthyl group or naphthylmethyl group of 1 to 4 carbon atoms, R 2 is .R 4 represents an alkyl group having 1 to 4 carbon atoms Represents a hydrogen atom, an R-CO- group or an R-SO 2 -group (R represents an alkyl group having 1 to 4 carbon atoms which may be substituted with one or more halogen atoms). Each R 5 independently represents an alkyl group having 1 to 4 carbon atoms or a halogen atom, and m represents an integer of 0 to 4.)
<5> R 4 in the general formula (II) is an R—CO— group (R represents an alkyl group having 1 to 4 carbon atoms which may be substituted with one or more halogen atoms) Prepreg mica tape described in <4>.
<6> The prepreg mica tape according to <4> or <5>, wherein R 1 in the general formula (II) is an alkyl group having 1 to 4 carbon atoms.
<7> the anion species, SbF 6 - and is <1> prepreg mica tape according to any one of - <6>.
<8> The prepreg mica tape according to any one of <1> to <7>, wherein the thermosetting resin contains an epoxy resin.
<9> coil conductor,
An insulating layer including the cured product of the laminate of prepreg mica tapes according to any one of <1> to <8> and disposed to cover at least a part of the outer periphery of the coil conductor.
A coil for a rotating electrical machine having a.
<10> A step of forming a laminate of a prepreg mica tape according to any one of <1> to <8>, covering at least a part of the outer periphery of the coil conductor.
Curing the laminate of the prepreg mica tape to form an insulating layer;
The manufacturing method of the coil for rotary electric machines which has.
 本発明の一形態によれば、高いガラス転移温度を有する硬化物を形成可能であり、長いゲルタイムを確保可能なプリプレグマイカテープ並びにそれを用いた回転電機用コイル及びその製造方法を提供することができる。 According to one aspect of the present invention, a prepreg mica tape capable of forming a cured product having a high glass transition temperature and capable of securing a long gel time, a coil for a rotating electrical machine using the same, and a method of manufacturing the same are provided. it can.
 以下、本発明のプリプレグマイカテープ、回転電機用コイル及びその製造方法を実施するための形態について詳細に説明する。但し、本発明は以下の開示に限定されるものではない。以下の開示において、その構成要素(要素ステップ等も含む)は、特に明示した場合を除き、必須ではない。数値及びその範囲についても同様であり、本発明を制限するものではない。
 本開示において「工程」との語には、他の工程から独立した工程に加え、他の工程と明確に区別できない場合であってもその工程の目的が達成されれば、当該工程も含まれる。
 本開示において「~」を用いて示された数値範囲には、「~」の前後に記載される数値がそれぞれ最小値及び最大値として含まれる。
 本開示中に段階的に記載されている数値範囲において、一つの数値範囲で記載された上限値又は下限値は、他の段階的な記載の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲において、その数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。
 本開示において各成分は該当する物質を複数種含んでいてもよい。組成物中に各成分に該当する物質が複数種存在する場合、各成分の含有率又は含有量は、特に断らない限り、組成物中に存在する当該複数種の物質の合計の含有率又は含有量を意味する。
 本開示において各成分に該当する粒子は複数種含んでいてもよい。組成物中に各成分に該当する粒子が複数種存在する場合、各成分の粒子径は、特に断らない限り、組成物中に存在する当該複数種の粒子の混合物についての値を意味する。
 本開示において「層」との語には、当該層が存在する領域を観察したときに、当該領域の全体に形成されている場合に加え、当該領域の一部にのみ形成されている場合も含まれる。
 本開示において「積層」との語は、層を積み重ねることを示し、二以上の層が結合されていてもよく、二以上の層が着脱可能であってもよい。
Hereinafter, a form for carrying out a prepreg mica tape, a coil for a rotating electrical machine, and a method for manufacturing the same of the present invention will be described in detail. However, the present invention is not limited to the following disclosure. In the following disclosure, the constituent elements (including element steps and the like) are not essential unless otherwise specified. The same applies to numerical values and ranges thereof, and does not limit the present invention.
In the present disclosure, the term “step” includes, in addition to steps independent of other steps, such steps as long as the purpose of the step is achieved even if it can not be clearly distinguished from other steps. .
In the present disclosure, numerical values described before and after “to” are included in the numerical range indicated using “to” as the minimum value and the maximum value, respectively.
The upper limit value or the lower limit value described in one numerical value range may be replaced with the upper limit value or the lower limit value of the other stepwise description numerical value range in the numerical value range described stepwise in the present disclosure. . In addition, in the numerical range described in the present disclosure, the upper limit value or the lower limit value of the numerical range may be replaced with the value shown in the example.
In the present disclosure, each component may contain a plurality of corresponding substances. When a plurality of substances corresponding to each component are present in the composition, the content or content of each component is the total content or content of the plurality of substances present in the composition unless otherwise specified. Means quantity.
In the present disclosure, particles corresponding to each component may contain a plurality of types. When there are a plurality of particles corresponding to each component in the composition, the particle diameter of each component means the value for the mixture of the plurality of particles present in the composition unless otherwise specified.
In the present disclosure, the term “layer” may mean that when the region in which the layer is present is observed, it is formed in only a part of the region, in addition to the case where the region is entirely formed. included.
The term "laminate" in the present disclosure refers to stacking layers, two or more layers may be combined, and two or more layers may be removable.
<<プリプレグマイカテープ>>
 本開示のプリプレグマイカテープは、裏打ち材と、前記裏打ち材の一方の面側に設けられ、マイカと、熱硬化性樹脂と、SbF 、PF 、BF 及び(Rf)PF6-b (Rfは水素の80%以上がフッ素原子で置換されたアルキル基を示し、bは1~5の整数を示す。)のいずれかをアニオン種として含む硬化剤(以下、特定硬化剤と称することがある。)と、を含むマイカ含有層と、を有する。
 本開示のプリプレグマイカテープが有するマイカ含有層は熱硬化性樹脂の硬化剤として特定硬化剤を含むことから、本開示のプリプレグマイカテープは高いガラス転移温度を有する硬化物を形成可能であり、長いゲルタイムを確保可能になると推察される。
<< Prepreg mica tape >>
The prepreg mica tape of the present disclosure is provided on a backing material, on one side of the backing material, and mica, thermosetting resin, SbF 6 , PF 6 , BF 4 and (Rf) b PF 6-b - (. Rf represents an alkyl group in which at least 80% of the hydrogen is substituted with a fluorine atom, b is of an integer of 1 to 5) a curing agent comprising any of the anionic species (hereinafter, specific cure And (d) may be referred to as an agent)).
Since the mica-containing layer of the prepreg mica tape of the present disclosure contains a specific curing agent as a curing agent for a thermosetting resin, the prepreg mica tape of the present disclosure can form a cured product having a high glass transition temperature and is long It is presumed that gel time can be secured.
 プリプレグマイカテープはレジンリッチマイカテープとも言われる。すなわち、熱硬化性樹脂を含む組成物がプリプレグマイカテープ全体に予め多量に含有されており、含浸ワニスを注入不要とするものである。この熱硬化性樹脂を含む組成物の含有率は、特開2010-193673号公報に記載されるように、一般的にプリプレグマイカテープの総質量に対しておよそ15質量%~50質量%の範囲で使用用途に応じて設定される。
 プリプレグマイカテープをコイル導体等にテーピングする際、張力をかけながらプリプレグマイカテープをコイル導体等に巻き付けることができるので、この張力に起因する圧縮力が、プリプレグ状態のマイカ含有層に加わる。これにより、プリプレグマイカテープを巻き付けられたコイル導体等を加熱処理等する際にマイカ含有層に存在する樹脂成分の移動がより効果的に行われ、マイカ含有層のマイカ密度は高くなるので、本開示のプリプレグマイカテープの絶縁材としての電気絶縁性をより効果的に発揮させることができる。
Prepreg mica tape is also referred to as resin rich mica tape. That is, the composition containing the thermosetting resin is contained in a large amount in advance in the entire prepreg mica tape, and the impregnation varnish is not required to be injected. The content of the composition containing the thermosetting resin is generally in the range of about 15% by mass to 50% by mass relative to the total mass of the prepreg mica tape as described in JP-A-2010-197363. Is set according to the usage.
When the prepreg mica tape is taped on a coil conductor or the like, the prepreg mica tape can be wound on the coil conductor or the like while applying tension, so a compressive force resulting from this tension is applied to the mica-containing layer in the prepreg state. As a result, when the coil conductor or the like wound with the prepreg mica tape is subjected to heat treatment or the like, the transfer of the resin component present in the mica containing layer is more effectively performed, and the mica density of the mica containing layer is increased. The electrical insulation as the insulating material of the disclosed prepreg mica tape can be more effectively exhibited.
 プリプレグマイカテープの厚みは、200μm~400μmが好ましく、250μm~350μmがより好ましい。
 プリプレグマイカテープの平均厚みは、マイクロメーター(MDC-SB、株式会社ミツトヨ)を用いて10点の厚みを測定し、その算術平均値として求める。
The thickness of the prepreg mica tape is preferably 200 μm to 400 μm, and more preferably 250 μm to 350 μm.
The average thickness of the prepreg mica tape is obtained by measuring the thickness at 10 points using a micrometer (MDC-SB, Mitutoyo Co., Ltd.) and calculating the arithmetic average value thereof.
<プリプレグマイカテープの層構成>
 本開示のプリプレグマイカテープの構成は、裏打ち材と、裏打ち材の一方の面側に設けられるマイカ含有層と、を有するものであればよく、必要に応じてその他の層を有していてもよい。その他の層としては、裏打ち材の一方の面側に設けられる窒化ホウ素と熱硬化性樹脂と熱硬化性樹脂を硬化する硬化剤とを含む窒化ホウ素含有層、裏打ち材のマイカ含有層が設けられた側の最表面に設けられる保護層(保護フィルム)、接着層等が挙げられる。
 本開示のプリプレグマイカテープがその他の層として窒化ホウ素含有層を有する場合、裏打ち材の一方の面側に設けられる窒化ホウ素含有層及びマイカ含有層の順番は特に限定されるものではなく、裏打ち材、窒化ホウ素含有層及びマイカ含有層の順に構成されてもよいし、裏打ち材、マイカ含有層及び窒化ホウ素含有層の順に構成されてもよい。
 本開示のプリプレグマイカテープがその他の層として窒化ホウ素含有層を有する場合、製造の容易性の観点から、裏打ち材の一方の面側に、窒化ホウ素含有層とマイカ含有層とがこの順に設けられることが好ましい。
<Layer Configuration of Prepreg Mica Tape>
The configuration of the prepreg mica tape of the present disclosure may be any one having a backing material and a mica-containing layer provided on one surface side of the backing material, and may have other layers as necessary. Good. As other layers, a boron nitride-containing layer including a boron nitride provided on one side of the backing material, a thermosetting resin, and a curing agent for curing the thermosetting resin, and a mica-containing layer of the backing material are provided. The protective layer (protective film) provided in the outermost surface of the other side, an adhesive layer, etc. are mentioned.
When the prepreg mica tape of the present disclosure has a boron nitride-containing layer as another layer, the order of the boron nitride-containing layer and the mica-containing layer provided on one side of the backing material is not particularly limited, and the backing material The boron nitride-containing layer and the mica-containing layer may be sequentially formed, or the backing material, the mica-containing layer and the boron nitride-containing layer may be sequentially formed.
When the prepreg mica tape of the present disclosure has a boron nitride-containing layer as another layer, a boron nitride-containing layer and a mica-containing layer are provided in this order on one surface side of the backing material from the viewpoint of easiness of production. Is preferred.
 本開示のプリプレグマイカテープがその他の層として窒化ホウ素含有層を有する場合、プリプレグマイカテープは、高い熱伝導率を有し、良好な柔軟性及び高い絶縁耐電圧を兼ね備えることができる。窒化ホウ素含有層を有するプリプレグマイカテープが高い熱伝導率を有し、良好な柔軟性及び高い絶縁耐電圧を兼ね備える理由は明確ではないが、以下のように推察される。
 窒化ホウ素含有層に含まれる窒化ホウ素は高い熱伝導性を示すフィラーであるため、窒化ホウ素を含む窒化ホウ素含有層を有するプリプレグマイカテープは、高い熱伝導率を有すると推察される。
 また、窒化ホウ素はアルミナに比較して硬度がおよそ半分以下であるため、アルミナを高熱伝導フィラーとして用いたプリプレグマイカテープに比較して、良好な柔軟性を示すようになると推察される。
 さらに、窒化ホウ素含有層とマイカ含有層とを個別に設けることで、窒化ホウ素粒子がマイカ片間に混入するのを防止することができる。窒化ホウ素粒子がマイカ片間に混入すると、電流のパスが短くなるためプリプレグマイカテープの絶縁耐電圧が落ちることがある。しかし、窒化ホウ素含有層を有するプリプレグマイカテープでは窒化ホウ素粒子がマイカ片間に混入するのが防止されるため、電流のパスが短くなりにくい。そのため、窒化ホウ素含有層を有するプリプレグマイカテープは高い絶縁耐電圧を備えるようになると推察される。
 さらに、窒化ホウ素含有層とマイカ含有層とを共に裏打ち材の一方の面側に設けることで、プリプレグマイカテープをコイル導体等にテーピングする際の作業性が向上する。
When the prepreg mica tape of the present disclosure has a boron nitride-containing layer as another layer, the prepreg mica tape can have high thermal conductivity and combine good flexibility and high withstand voltage. The reason why a prepreg mica tape having a boron nitride-containing layer has high thermal conductivity and has both good flexibility and high insulation withstand voltage is not clear, but is presumed as follows.
Since boron nitride contained in the boron nitride-containing layer is a filler exhibiting high thermal conductivity, it is presumed that a prepreg mica tape having a boron nitride-containing layer containing boron nitride has high thermal conductivity.
In addition, since the hardness of boron nitride is about half or less compared to that of alumina, it is presumed that it exhibits better flexibility as compared with a prepreg mica tape using alumina as a high thermal conductivity filler.
Furthermore, by separately providing the boron nitride-containing layer and the mica-containing layer, it is possible to prevent the boron nitride particles from being mixed between the mica pieces. When the boron nitride particles are mixed between the mica pieces, the current path may be shortened and the insulation withstand voltage of the prepreg mica tape may be lowered. However, in the prepreg mica tape having the boron nitride-containing layer, the boron nitride particles are prevented from mixing between mica pieces, so that the current path is unlikely to be short. Therefore, it is surmised that a prepreg mica tape having a boron nitride-containing layer comes to have a high insulation withstand voltage.
Furthermore, by providing both the boron nitride-containing layer and the mica-containing layer on one side of the backing material, the workability at the time of taping the prepreg mica tape to a coil conductor or the like is improved.
-マイカ含有層-
 本開示に係るマイカ含有層は、マイカと熱硬化性樹脂と特定硬化剤とを含む。本開示に係るマイカ含有層は、必要に応じてマイカ、熱硬化性樹脂及び特定硬化剤以外のその他の成分を含有してもよい。その他の成分としては、例えば、各種添加剤を挙げることができる。
 マイカ含有層の厚みは、特に限定されるものではなく、100μm~250μmの範囲であることが好ましく、110μm~230μmの範囲であることがより好ましい。
 マイカ含有層の厚みは、走査型電子顕微鏡(SEM)(例えば、Philips社、XL30)を用いて、プリプレグマイカテープの断面をプラチナ蒸着後、高真空下、加速電圧10kVで二次電子像を観察することで求めることができる。
-Mica containing layer-
The mica-containing layer according to the present disclosure contains mica, a thermosetting resin and a specific curing agent. The mica-containing layer according to the present disclosure may contain other components other than the mica, the thermosetting resin, and the specific curing agent, as necessary. As other components, various additives can be mentioned, for example.
The thickness of the mica-containing layer is not particularly limited, and is preferably in the range of 100 μm to 250 μm, and more preferably in the range of 110 μm to 230 μm.
For the thickness of the mica-containing layer, observe a secondary electron image at an accelerating voltage of 10 kV under high vacuum after depositing platinum on a cross section of a prepreg mica tape using a scanning electron microscope (SEM) (for example, Philips, XL30) You can ask for it by doing.
 マイカ含有層中には、必要に応じて用いられるマイカ以外のその他の無機フィラー(窒化ホウ素等)が含有されていないことが好ましい。マイカ含有層中に含有される無機フィラーの全量に占めるマイカ以外のその他の無機フィラーの含有率は、3質量%以下が好ましく、2質量%以下がより好ましく、1質量%以下がさらに好ましく、0質量%であることが特に好ましい。 The mica-containing layer preferably does not contain any other inorganic filler (such as boron nitride) other than mica, which is used as required. 3 mass% or less is preferable, as for the content rate of other inorganic fillers other than mica which occupy the whole quantity of the inorganic filler contained in a mica containing layer, 2 mass% or less is more preferable, 1 mass% or less is more preferable, and 0 Particularly preferred is mass%.
-窒化ホウ素含有層-
 必要に応じて用いられる窒化ホウ素含有層は、窒化ホウ素と、熱硬化性樹脂と、熱硬化性樹脂を硬化する硬化剤とを含む。窒化ホウ素含有層は、必要に応じて窒化ホウ素、熱硬化性樹脂及び硬化剤以外のその他の成分を含有してもよい。その他の成分としては、例えば、各種添加剤を挙げることができる。
 窒化ホウ素含有層の厚みは、特に限定されるものではなく、80μm~200μmの範囲であることが好ましい。
 窒化ホウ素含有層の厚みは、走査型電子顕微鏡(SEM)(例えば、Philips社、XL30)を用いて、プリプレグマイカテープの断面をプラチナ蒸着後、高真空下、加速電圧10kVで二次電子像を観察することで求めることができる。
-Boron nitride containing layer-
The boron nitride-containing layer used as needed contains boron nitride, a thermosetting resin, and a curing agent for curing the thermosetting resin. The boron nitride-containing layer may optionally contain other components other than boron nitride, a thermosetting resin and a curing agent. As other components, various additives can be mentioned, for example.
The thickness of the boron nitride-containing layer is not particularly limited, and is preferably in the range of 80 μm to 200 μm.
For the thickness of the boron nitride-containing layer, after depositing platinum on a cross section of a prepreg mica tape using a scanning electron microscope (SEM) (for example, Philips, XL30), secondary electron images are obtained at an acceleration voltage of 10 kV under high vacuum It can be determined by observing.
 窒化ホウ素含有層には、窒化ホウ素以外のその他の無機フィラーが含有されていてもよい。窒化ホウ素含有層に含有される無機フィラーの全量に占める窒化ホウ素の含有率は、90質量%~100質量%であることが好ましく、95質量%~100質量%であることがより好ましく、98質量%~100質量%であることがさらに好ましい。窒化ホウ素含有層に窒化ホウ素以外のその他の無機フィラーが含有される場合のその他の無機フィラーとしては、アルミナ、酸化マグネシウム、窒化アルミニウム、窒化ケイ素、酸化ケイ素等が挙げられる。 The boron nitride-containing layer may contain other inorganic fillers other than boron nitride. The content of boron nitride in the total amount of the inorganic filler contained in the boron nitride-containing layer is preferably 90% by mass to 100% by mass, more preferably 95% by mass to 100% by mass, and 98% by mass. More preferably, it is% to 100% by mass. When the boron nitride-containing layer contains other inorganic fillers other than boron nitride, examples of the other inorganic fillers include alumina, magnesium oxide, aluminum nitride, silicon nitride, silicon oxide and the like.
<プリプレグマイカテープの構成材料>
 以下、本開示のプリプレグマイカテープを構成する裏打ち材、マイカ、熱硬化性樹脂、特定硬化剤及び必要に応じて用いられるその他の材料について説明する。
<Material of prepreg mica tape>
Hereinafter, the backing material, the mica, the thermosetting resin, the specific curing agent, and other materials used as needed, which constitute the prepreg mica tape of the present disclosure, will be described.
-裏打ち材-
 本開示で用いられる裏打ち材としては、例えば、有機材料で構成される繊維を全部又は一部用いて得られるクロス(cloth)を用いてもよい。クロスを得るのに使用される有機材料としては、アラミド、ポリアミド、ポリイミド、ポリエステル等が挙げられる。有機材料で構成される繊維を一部用いる場合には、有機材料で構成される繊維を縦糸、横糸又はその両方として用いてもよい。有機材料で構成される繊維以外の他の繊維として、ガラス繊維等の無機繊維を用いてもよい。ガラス繊維を用いたガラスクロスと有機高分子フィルムとを併用してもよい。裏打ち材としては、ガラス繊維で形成されたガラスクロスを用いることもできる。
-Backing material-
As the backing material used in the present disclosure, for example, a cloth obtained by using all or part of fibers made of an organic material may be used. Examples of the organic material used to obtain the cloth include aramid, polyamide, polyimide, polyester and the like. When a part of fibers composed of an organic material is used, the fibers composed of an organic material may be used as warp, weft or both. Inorganic fibers such as glass fibers may be used as fibers other than fibers composed of organic materials. A glass cloth using glass fiber and an organic polymer film may be used in combination. As the backing material, a glass cloth formed of glass fibers can also be used.
-マイカ-
 マイカ含有層に含有されるマイカとしては、未焼成硬質マイカ、焼成硬質マイカ、未焼成軟質マイカ、焼成軟質マイカ、合成マイカ、フレークマイカ等を用いることができる。これらの中でも、価格及び入手のしやすさの観点からマイカとして未焼成硬質マイカを用いることが好ましい。
 また、絶縁性向上の観点から、マイカは、JIS標準篩を用いて篩い分けしたときの粒子径が2.8mm以上のマイカ片の割合が、50質量%以上であることが好ましく、55質量%以上であることがより好ましく、60質量%以上であることがさらに好ましい。粒子径が2.8mm以上のマイカ片の割合が50質量%以上であれば、フィブリット無しでもマイカペーパーは自立できる。フィブリットを入れない方が熱伝導率に有利である。
-Mica-
As the mica contained in the mica-containing layer, unfired hard mica, fired hard mica, unfired soft mica, fired soft mica, synthetic mica, flake mica, etc. can be used. Among these, it is preferable to use unfired hard mica as mica from the viewpoint of price and availability.
Further, from the viewpoint of improving the insulating property, it is preferable that the proportion of mica pieces having a particle diameter of 2.8 mm or more when sifted using a JIS standard sieve is 50% by mass or more, and 55% by mass The content is more preferably 60% by mass or more. If the proportion of mica pieces having a particle diameter of 2.8 mm or more is 50% by mass or more, mica paper can stand on its own even without fibrils. It is advantageous to the heat conductivity that it does not put fibrilt.
 マイカ片の粒子径の測定は、具体的には、下記方法に従って実施する。
 純水20gに、測定対象のマイカを1質量%添加し、超音波分散機でマイカを分散して分散液を調製する。分散液をフィルムの上に塗布した後に、フィルムをホットプレートの上に乗せ、110℃で30分乾燥を行う。乾燥後、目視でフィルム上のマイカ片のサイズを観察することでマイカの粒子径を測定する。
 また、粒子径が2.8mm以上のマイカ片の割合(質量基準)は、下記方法により測定される。
 ロータップ型篩振動機に備え付けた目開き2.8mmのJIS標準篩を用い、これらの篩を15分間に亘って振動(ハンマー打数:60回/分)させながら1.2gのマイカを篩に通して分級し、分級前の試料質量に対する2.8mmの篩に残る粗粒の割合から、2.8mm以上のマイカ片の割合(質量基準)が求められる。
Specifically, the measurement of the particle size of the mica pieces is carried out according to the following method.
1% by mass of mica to be measured is added to 20 g of pure water, and the mica is dispersed by an ultrasonic dispersion machine to prepare a dispersion. After the dispersion is applied on the film, the film is placed on a hot plate and dried at 110 ° C. for 30 minutes. After drying, the particle size of mica is measured by visually observing the size of mica pieces on the film.
Moreover, the ratio (mass reference | standard) of the mica piece whose particle diameter is 2.8 mm or more is measured by the following method.
Using a JIS standard sieve with an aperture of 2.8 mm, equipped with a low-tapping sieve vibrator, pass 1.2 g of mica through the sieve while vibrating (the number of hammer strokes: 60 times / minute) over 15 minutes. The ratio (mass standard) of mica pieces of 2.8 mm or more is determined from the ratio of coarse particles remaining on the sieve of 2.8 mm with respect to the sample weight before classification.
 本開示においては、マイカの1種類を単独で使用してもよいし、2種類以上を併用して用いてもよい。なお、マイカを2種類以上併用するとは、例えば、同じ成分で平均粒子径が異なるマイカを2種類以上用いる場合、平均粒子径が同じで成分の異なるマイカを2種類以上用いる場合並びに平均粒子径及び種類の異なるマイカを2種類以上用いる場合が挙げられる。 In the present disclosure, one type of mica may be used alone, or two or more types may be used in combination. When two or more types of mica are used in combination, for example, when two or more types of mica having the same component but different average particle sizes are used, the case where two or more types of mica having the same average particle size but different components are used, and the average particle size and There are cases where two or more kinds of different types of mica are used.
-熱硬化性樹脂-
 本開示で用いられる熱硬化性樹脂としては、エポキシ樹脂、フェノール樹脂、尿素樹脂、メラミン樹脂、不飽和ポリエステル樹脂、シアン酸エステル樹脂、ポリイミド樹脂、ビスマレイミド・トリアジン樹脂、フェノール・アラルキル樹脂等を、単独で又は2種類以上組み合わせて用いることができる。
 熱硬化性樹脂の中でも、エポキシ樹脂が好ましい。エポキシ樹脂としては、例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂及び脂環式エポキシ樹脂を単独で又は2種類以上を組み合わせて用いることができる。
 本開示のプリプレグマイカテープがその他の層として窒化ホウ素含有層を有する場合、窒化ホウ素含有層に含まれる熱硬化性樹脂はマイカ含有層に含まれる熱硬化性樹脂と同じであっても異なっていてもよく、同じであることが好ましい。
-Thermosetting resin-
As the thermosetting resin used in the present disclosure, epoxy resin, phenol resin, urea resin, melamine resin, unsaturated polyester resin, cyanate ester resin, polyimide resin, bismaleimide triazine resin, phenol aralkyl resin, etc. It can be used alone or in combination of two or more.
Among the thermosetting resins, epoxy resins are preferred. As the epoxy resin, for example, bisphenol A epoxy resin, bisphenol F epoxy resin, phenol novolac epoxy resin, cresol novolac epoxy resin and alicyclic epoxy resin can be used alone or in combination of two or more kinds. .
When the prepreg mica tape of the present disclosure has a boron nitride-containing layer as another layer, the thermosetting resin contained in the boron nitride-containing layer is the same as or different from the thermosetting resin contained in the mica-containing layer. It is also preferable that it is the same.
-硬化剤-
 本開示で用いられる硬化剤としては、SbF 、PF 、BF 及び(Rf)PF6-b (Rfは水素の80%以上がフッ素原子で置換されたアルキル基を示し、bは1~5の整数を示す。)のいずれかをアニオン種として含むものであれば特に限定されない。
 (Rf)PF6-b におけるRfはそれぞれ同一であっても異なっていてもよい。
 Rfとしては、CF、C、(CFCF、C、C、(CFCFCF、CFCF(CF)CF、(CFC等の、水素原子の100%がフッ素原子で置換された直鎖又は分枝状の炭素数1~4のアルキル基(パーフルオロアルキル基)であってもよい。(Rf)PF6-b (フッ化アルキルフルオロリン酸イオン)としては、[(CPF、[(CPF、[((CFCF)PF、[((CFCF)PF、[((CFCFCFPF、[((CFCFCFPF等が挙げられる。
 アニオン種としては、硬化剤の安定性の観点からSbF であることが好ましい。
 本開示のプリプレグマイカテープがその他の層として窒化ホウ素含有層を有する場合、窒化ホウ素含有層に含まれる硬化剤はマイカ含有層に含まれる硬化剤と同じであっても異なっていてもよく、同じであることが好ましい。
 硬化剤としては、特定硬化剤以外のその他の硬化剤が併用されてもよい。その他の硬化剤としては、フェノールノボラック樹脂、クレゾールノボラック樹脂、アミノトリアジンノボラック樹脂等の多官能フェノール化合物、ジシアンジアミド、ジアミノジフェニルメタン、ジアミノジフェニルスルホン等のアミン化合物、無水フタル酸、無水ピロメリット酸、無水マレイン酸、無水マレイン酸共重合体等の酸無水物などが挙げられる。
 硬化剤に占める特定硬化剤の割合は、80質量%~100質量%であることが好ましく、90質量%~100質量%であることがより好ましく、95質量%~100質量%であることがさらに好ましい。
-Hardener-
As the curing agent used in the present disclosure, SbF 6 , PF 6 , BF 4 and (Rf) b PF 6-b (Rf represents an alkyl group in which 80% or more of hydrogen is substituted with a fluorine atom) B is not particularly limited as long as it contains any of 1 to 5) as an anionic species.
(Rf) b PF 6-b - in Rf may each be the same or different.
As Rf, CF 3 , C 2 F 5 , (CF 3 ) 2 CF, C 3 F 7 , C 4 F 9 , (CF 3 ) 2 CFCF 2 , CF 3 CF 2 (CF 3 ) CF, (CF 3 ) A linear or branched alkyl group having 1 to 4 carbon atoms (perfluoroalkyl group) in which 100% of hydrogen atoms are substituted by fluorine atoms, such as 3 C, may be used. (Rf) b PF 6-b - The (fluorinated alkyl fluorophosphate ion), [(C 2 F 5 ) 3 PF 3] -, [(C 3 F 7) 3 PF 3] -, [(( CF 3 ) 2 CF) 3 PF 3 ] - , [((CF 3 ) 2 CF) 2 PF 4 ] - , [(CF 3 ) 2 CFCF 2 ) 3 PF 3 ] - , [((CF 3 ) 2 ) CFCF 2) 2 PF 4] -, and the like.
Examples of the anionic species, SbF 6 from the viewpoint of stability of the curing agent - preferably a.
When the prepreg mica tape of the present disclosure has a boron nitride-containing layer as another layer, the curing agent contained in the boron nitride-containing layer may be the same as or different from the curing agent contained in the mica-containing layer, and is the same Is preferred.
As a curing agent, other curing agents other than the specific curing agent may be used in combination. Other curing agents include polyfunctional novolac resins, cresol novolac resins, polyfunctional phenol compounds such as aminotriazine novolac resins, amine compounds such as dicyandiamide, diaminodiphenylmethane, diaminodiphenylsulfone, phthalic anhydride, pyromellitic anhydride, and maleic anhydride Examples thereof include acid and acid anhydrides such as maleic anhydride copolymer.
The ratio of the specific curing agent to the curing agent is preferably 80% by mass to 100% by mass, more preferably 90% by mass to 100% by mass, and further preferably 95% by mass to 100% by mass. preferable.
 硬化剤に含まれるアニオン種と対をなすカチオン種としては特に限定されるものではなく、芳香族スルホニウムカチオン、芳香族ヨードニウムカチオン等を用いることができる。これらの中でも、硬化剤の潜在性の観点からカチオン種は芳香族スルホニウムカチオンを含むことが好ましい。 The cationic species to be paired with the anionic species contained in the curing agent is not particularly limited, and aromatic sulfonium cations, aromatic iodonium cations and the like can be used. Among these, the cationic species preferably contains an aromatic sulfonium cation from the viewpoint of the curing agent's potential.
 硬化剤にカチオン種として含まれる芳香族スルホニウムカチオンは、下記一般式(I)で表されるカチオン種であることが好ましい。 The aromatic sulfonium cation contained as a cationic species in the curing agent is preferably a cationic species represented by the following general formula (I).
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
 一般式(I)において、R及びRは各々独立に、アルキル基、フェニル基、ベンジル基、ナフチル基又はナフチルメチル基を示す。Rは、各々独立に、アルキル基、ヒドロキシ基、カルボキシ基、アルコキシ基、アリールオキシ基、アルキルカルボニル基、アリールカルボニル基、アラルキルカルボニル基、アルコキシカルボニル基、アリールオキシカルボニル基、アラルキルオキシカルボニル基、アルキルカルボニルオキシ基、アリールカルボニルオキシ基、アラルキルカルボニルオキシ基、アルコキシカルボニルオキシ基、アリールオキシカルボニルオキシ基、アラルキルオキシカルボニルオキシ基、アリールチオカルボニル基、アリールチオ基、アルキルチオ基、アリール基、複素環式炭化水素基、アルキルスルフィニル基、アリールスルフィニル基、アルキルスルホニル基、アリールスルホニル基、アルキルスルホニルオキシ基、アリールスルホニルオキシ基、ヒドロキシ(ポリ)アルキレンオキシ基、アミノ基、シアノ基、ニトロ基又はハロゲン原子を示す。nは0~5の整数を示す。 In General Formula (I), R 1 and R 2 each independently represent an alkyl group, a phenyl group, a benzyl group, a naphthyl group or a naphthylmethyl group. Each R 3 independently represents an alkyl group, a hydroxy group, a carboxy group, an alkoxy group, an aryloxy group, an alkylcarbonyl group, an arylcarbonyl group, an aralkylcarbonyl group, an alkoxycarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an aralkyloxycarbonyl group, Alkyl carbonyloxy group, aryl carbonyloxy group, aralkyl carbonyloxy group, alkoxy carbonyloxy group, aryloxy carbonyloxy group, aralkyl oxy carbonyloxy group, arylthio carbonyl group, arylthio group, alkylthio group, aryl group, heterocyclic carbonization Hydrogen group, alkylsulfinyl group, arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, alkylsulfonyloxy group, arylsulfonyloxy group, Hydroxy (poly) alkylene oxy group, amino group, cyano group, nitro group or halogen atom is shown. n is an integer of 0 to 5;
 一般式(I)において、R~Rで示されるアルキル基としては、炭素数1~18の直鎖アルキル基、炭素数1~18の分枝鎖アルキル基、炭素数3~18のシクロアルキル基等が挙げられる。
 炭素数1~18の直鎖アルキル基として具体的には、メチル基、エチル基、n-プロピル基、n-ブチル基、n-ペンチル基、n-オクチル基、n-デシル基、n-ドデシル基、n-テトラデシル基、n-ヘキサデシル基、n-オクタデシル基等が挙げられる。
 炭素数1~18の分枝鎖アルキル基として具体的には、イソプロピル基、イソブチル基、sec-ブチル基、t-ブチル基、イソペンチル基、ネオペンチル基、t-ペンチル基、イソヘキシル基、イソオクタデシル基等が挙げられる。
 炭素数3~18のシクロアルキル基として具体的には、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、4-デシルシクロヘキシル基等が挙げられる。
In the general formula (I), examples of the alkyl group represented by R 1 to R 3 include a linear alkyl group having 1 to 18 carbon atoms, a branched alkyl group having 1 to 18 carbon atoms, and a cycloalkenyl having 3 to 18 carbon atoms. An alkyl group etc. are mentioned.
Specific examples of the linear alkyl group having 1 to 18 carbon atoms include methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, n-octyl group, n-decyl group and n-dodecyl group. Groups, n-tetradecyl group, n-hexadecyl group, n-octadecyl group and the like.
Specific examples of the branched alkyl group having 1 to 18 carbon atoms include an isopropyl group, an isobutyl group, a sec-butyl group, a t-butyl group, an isopentyl group, a neopentyl group, a t-pentyl group, an isohexyl group and an isooctadecyl group. Etc.
Specific examples of the cycloalkyl group having 3 to 18 carbon atoms include cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, 4-decylcyclohexyl group and the like.
 一般式(I)において、Rで示されるアルコキシ基としては、炭素数1~18の直鎖又は分枝鎖アルコキシ基等が挙げられる。
 アルコキシ基として具体的には、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、ブトキシ基、イソブトキシ基、sec-ブトキシ基、t-ブトキシ基、ヘキシルオキシ基、デシルオキシ基、ドデシルオキシ基、オクタデシルオキシ基等が挙げられる。
Examples of the alkoxy group represented by R 3 in the general formula (I) include a linear or branched alkoxy group having 1 to 18 carbon atoms.
Specifically as an alkoxy group, a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, an isobutoxy group, a sec-butoxy group, a t-butoxy group, a hexyloxy group, a decyloxy group, a dodecyloxy group, an octadecyloxy group. And the like.
 一般式(I)において、Rで示されるアリールオキシ基としては、炭素数6~10のアリールオキシ基等が挙げられる。
 アリールオキシ基として具体的には、フェノキシ基、ナフチルオキシ基等が挙げられる。
Examples of the aryloxy group represented by R 3 in the general formula (I) include aryloxy groups having 6 to 10 carbon atoms.
Specific examples of the aryloxy group include phenoxy group and naphthyloxy group.
 一般式(I)において、Rで示されるアルキルカルボニル基としては、炭素数2~18の直鎖又は分枝鎖アルキルカルボニル基等が挙げられる。
 アルキルカルボニル基として具体的には、アセチル基、プロピオニル基、ブタノイル基、2-メチルプロピオニル基、ヘプタノイル基、2-メチルブタノイル基、3-メチルブタノイル基、オクタノイル基、デカノイル基、ドデカノイル基、オクタデカノイル基等が挙げられる。
In the general formula (I), examples of the alkylcarbonyl group represented by R 3 include linear or branched alkylcarbonyl groups having 2 to 18 carbon atoms.
Specifically as an alkylcarbonyl group, an acetyl group, a propionyl group, a butanoyl group, a 2-methylpropionyl group, a heptanoyl group, a 2-methylbutanoyl group, a 3-methylbutanoyl group, an octanoyl group, a decanoyl group, a dodecanoyl group, Octadecanoyl group etc. are mentioned.
 一般式(I)において、Rで示されるアリールカルボニル基としては、炭素数7~11のアリールカルボニル基等が挙げられる。
 アリールカルボニル基として具体的には、ベンゾイル基、ナフトイル基等が挙げられる。
In the general formula (I), examples of the arylcarbonyl group represented by R 3 include arylcarbonyl groups having 7 to 11 carbon atoms.
Specific examples of the arylcarbonyl group include benzoyl group and naphthoyl group.
 一般式(I)において、Rで示されるアラルキルカルボニル基としては、炭素数6~10のアリール基で置換されている低級アルキルカルボニル基等が挙げられる。
 アラルキルカルボニル基として具体的には、ベンジルカルボニル基、2-メチルベンジルカルボニル基、1-ナフチルメチルカルボニル基、2-ナフチルメチルカルボニル基等が挙げられる。
Examples of the aralkylcarbonyl group represented by R 3 in the general formula (I) include lower alkylcarbonyl groups substituted with an aryl group having 6 to 10 carbon atoms.
Specific examples of the aralkylcarbonyl group include benzylcarbonyl group, 2-methylbenzylcarbonyl group, 1-naphthylmethylcarbonyl group, 2-naphthylmethylcarbonyl group and the like.
 一般式(I)において、Rで示されるアルコキシカルボニル基としては、炭素数2~19の直鎖又は分枝鎖アルコキシカルボニル基等が挙げられる。
 アルコキシカルボニル基として具体的には、メトキシカルボニル基、エトキシカルボニル基、プロポキシカルボニル基、イソプロポキシカルボニル基、ブトキシカルボニル基、イソブトキシカルボニル基、sec-ブトキシカルボニル基、t-ブトキシカルボニル基、オクチロキシカルボニル基、テトラデシルオキシカルボニル基、オクタデシロキシカルボニル基等が挙げられる。
Examples of the alkoxycarbonyl group represented by R 3 in the general formula (I) include a linear or branched alkoxycarbonyl group having 2 to 19 carbon atoms.
Specific examples of the alkoxycarbonyl group include methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, sec-butoxycarbonyl, t-butoxycarbonyl, octyloxycarbonyl Groups, tetradecyloxycarbonyl group, octadecyloxycarbonyl group and the like.
 一般式(I)において、Rで示されるアリールオキシカルボニル基としては、炭素数7~11のアリールオキシカルボニル基等が挙げられる。
 アリールオキシカルボニル基として具体的には、フェノキシカルボニル基、ナフトキシカルボニル基等が挙げられる。
Examples of the aryloxycarbonyl group represented by R 3 in the general formula (I) include an aryloxycarbonyl group having 7 to 11 carbon atoms.
Specific examples of the aryloxycarbonyl group include phenoxy carbonyl group and naphthoxycarbonyl group.
 一般式(I)において、Rで示されるアラルキルオキシカルボニル基としては、炭素数6~10のアリール基で置換されている低級アルコキシカルボニル基等が挙げられる。
 アラルキルオキシカルボニル基として具体的には、ベンジルオキシカルボニル基、2-メチルベンジルオキシカルボニル基、1-ナフチルメチルオキシカルボニル基、2-ナフチルメチルオキシカルボニル基等が挙げられる。
In the general formula (I), examples of the aralkyloxycarbonyl group represented by R 3 include a lower alkoxycarbonyl group substituted with an aryl group having 6 to 10 carbon atoms.
Specific examples of the aralkyloxycarbonyl group include benzyloxycarbonyl group, 2-methylbenzyloxycarbonyl group, 1-naphthylmethyloxycarbonyl group, 2-naphthylmethyloxycarbonyl group and the like.
 一般式(I)において、Rで示されるアルキルカルボニルオキシ基としては、炭素数2~19の直鎖又は分枝鎖アルキルカルボニルオキシ基等が挙げられる。
 アルキルカルボニルオキシ基として具体的には、アセトキシ基、エチルカルボニルオキシ基、プロピルカルボニルオキシ基、イソプロピルカルボニルオキシ基、ブチルカルボニルオキシ基、イソブチルカルボニルオキシ基、sec-ブチルカルボニルオキシ基、t-ブチルカルボニルオキシ基、オクチルカルボニルオキシ基、テトラデシルカルボニルオキシ基、オクタデシルカルボニルオキシ基等が挙げられる。
In the general formula (I), examples of the alkylcarbonyloxy group represented by R 3 include linear or branched alkylcarbonyloxy groups having 2 to 19 carbon atoms.
Specifically as an alkyl carbonyloxy group, an acetoxy group, an ethyl carbonyloxy group, a propyl carbonyloxy group, an isopropyl carbonyloxy group, a butyl carbonyloxy group, an isobutyl carbonyloxy group, a sec-butyl carbonyloxy group, a t-butyl carbonyloxy group Groups, octyl carbonyloxy group, tetradecyl carbonyloxy group, octadecyl carbonyloxy group and the like.
 一般式(I)において、Rで示されるアリールカルボニルオキシ基としては、炭素数7~11のアリールカルボニルオキシ基等が挙げられる。
 アリールカルボニルオキシ基として具体的には、ベンゾイルオキシ基、ナフトイルオキシ基等が挙げられる。
Examples of the arylcarbonyloxy group represented by R 3 in the general formula (I) include arylcarbonyloxy groups having 7 to 11 carbon atoms.
Specific examples of the arylcarbonyloxy group include benzoyloxy group and naphthoyloxy group.
 一般式(I)において、Rで示されるアラルキルカルボニルオキシ基としては、炭素数6~10のアリール基で置換されている低級アルキルカルボニルオキシ基等が挙げられる。
 アラルキルカルボニルオキシ基として具体的には、ベンジルカルボニルオキシ基、2-メチルベンジルカルボニルオキシ基、1-ナフチルメチルカルボニルオキシ基、2-ナフチルメチルカルボニルオキシ基等が挙げられる。
In the general formula (I), examples of the aralkylcarbonyloxy group represented by R 3 include lower alkylcarbonyloxy groups substituted with aryl groups having 6 to 10 carbon atoms.
Specific examples of the aralkylcarbonyloxy group include benzylcarbonyloxy group, 2-methylbenzylcarbonyloxy group, 1-naphthylmethylcarbonyloxy group, 2-naphthylmethylcarbonyloxy group and the like.
 一般式(I)において、Rで示されるアルコキシカルボニルオキシ基としては、炭素数2~19の直鎖又は分枝鎖アルコキシカルボニルオキシ基等が挙げられる。
 アルコキシカルボニルオキシ基として具体的には、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、プロポキシカルボニルオキシ基、イソプロポキシカルボニルオキシ基、ブトキシカルボニルオキシ基、イソブトキシカルボニルオキシ基、sec-ブトキシカルボニルオキシ基、t-ブトキシカルボニルオキシ基、オクチロキシカルボニルオキシ基、テトラデシルオキシカルボニルオキシ基、オクタデシロキシカルボニルオキシ基等が挙げられる。
Examples of the alkoxycarbonyloxy group represented by R 3 in the general formula (I) include a linear or branched alkoxycarbonyloxy group having 2 to 19 carbon atoms.
Specific examples of the alkoxycarbonyloxy group include methoxycarbonyloxy group, ethoxycarbonyloxy group, propoxycarbonyloxy group, isopropoxycarbonyloxy group, butoxycarbonyloxy group, isobutoxycarbonyloxy group, sec-butoxycarbonyloxy group, t And -butoxycarbonyloxy group, octyloxycarbonyloxy group, tetradecyloxycarbonyloxy group, octadecyloxycarbonyloxy group and the like.
 一般式(I)において、Rで示されるアリールオキシカルボニルオキシ基としては、炭素数7~11のアリールオキシカルボニルオキシ基等が挙げられる。
 アリールオキシカルボニルオキシ基として具体的には、フェノキシカルボニルオキシ基、ナフトキシカルボニルオキシ基等が挙げられる。
Examples of the aryloxycarbonyloxy group represented by R 3 in the general formula (I) include an aryloxycarbonyloxy group having 7 to 11 carbon atoms.
Specific examples of the aryloxycarbonyloxy group include phenoxycarbonyloxy group and naphthoxycarbonyloxy group.
 一般式(I)において、Rで示されるアラルキルオキシカルボニルオキシ基としては、炭素数6~10のアリール基で置換されている低級アルコキシカルボニルオキシ基等が挙げられる。
 アラルキルオキシカルボニルオキシ基として具体的には、ベンジルオキシカルボニルオキシ基、2-メチルベンジルオキシカルボニルオキシ基、1-ナフチルメチルオキシカルボニルオキシ基、2-ナフチルメチルオキシカルボニルオキシ基等が挙げられる。
In the general formula (I), examples of the aralkyloxycarbonyloxy group represented by R 3 include lower alkoxycarbonyloxy groups substituted with an aryl group having 6 to 10 carbon atoms.
Specific examples of the aralkyloxycarbonyloxy group include benzyloxycarbonyloxy group, 2-methylbenzyloxycarbonyloxy group, 1-naphthylmethyloxycarbonyloxy group, 2-naphthylmethyloxycarbonyloxy group and the like.
 一般式(I)において、Rで示されるアリールチオカルボニル基としては、炭素数7~11のアリールチオカルボニル基等が挙げられる。
 アリールチオカルボニル基として具体的には、フェニルチオカルボニル基、ナフチルチオカルボニル基等が挙げられる。
Examples of the arylthiocarbonyl group represented by R 3 in the general formula (I) include arylthiocarbonyl groups having 7 to 11 carbon atoms.
Specific examples of the arylthiocarbonyl group include phenylthiocarbonyl group and naphthylthiocarbonyl group.
 一般式(I)において、Rで示されるアリールチオ基としては、炭素数6~20のアリールチオ基等が挙げられる。
 アリールチオ基として具体的には、フェニルチオ基、2-メチルフェニルチオ基、3-メチルフェニルチオ基、4-メチルフェニルチオ基、2-クロロフェニルチオ基、3-クロロフェニルチオ基、4-クロロフェニルチオ基、2-ブロモフェニルチオ基、3-ブロモフェニルチオ基、4-ブロモフェニルチオ基、2-フルオロフェニルチオ基、3-フルオロフェニルチオ基、4-フルオロフェニルチオ基、2-ヒドロキシフェニルチオ基、4-ヒドロキシフェニルチオ基、2-メトキシフェニルチオ基、4-メトキシフェニルチオ基、1-ナフチルチオ基、2-ナフチルチオ基、4-[4-(フェニルチオ)ベンゾイル]フェニルチオ基、4-[4-(フェニルチオ)フェノキシ]フェニルチオ基、4-[4-(フェニルチオ)フェニル]フェニルチオ基、4-(フェニルチオ)フェニルチオ基、4-ベンゾイルフェニルチオ基、4-ベンゾイル-2-クロロフェニルチオ基、4-ベンゾイル-3-クロロフェニルチオ基、4-ベンゾイル-3-メチルチオフェニルチオ基、4-ベンゾイル-2-メチルチオフェニルチオ基、4-(4-メチルチオベンゾイル)フェニルチオ基、4-(2-メチルチオベンゾイル)フェニルチオ基、4-(p-メチルベンゾイル)フェニルチオ基、4-(p-エチルベンゾイル)フェニルチオ基、4-(p-イソプロピルベンゾイル)フェニルチオ基、4-(p-t-ブチルベンゾイル)フェニルチオ基等が挙げられる。
Examples of the arylthio group represented by R 3 in the general formula (I) include arylthio groups having 6 to 20 carbon atoms.
Specific examples of the arylthio group include phenylthio group, 2-methylphenylthio group, 3-methylphenylthio group, 4-methylphenylthio group, 2-chlorophenylthio group, 3-chlorophenylthio group, 4-chlorophenylthio group, 2-bromophenylthio group, 3-bromophenylthio group, 4-bromophenylthio group, 2-fluorophenylthio group, 3-fluorophenylthio group, 4-fluorophenylthio group, 2-hydroxyphenylthio group, 4 -Hydroxyphenylthio group, 2-methoxyphenylthio group, 4-methoxyphenylthio group, 1-naphthylthio group, 2-naphthylthio group, 4- [4- (phenylthio) benzoyl] phenylthio group, 4- [4- (phenylthio) group ) Phenoxy] phenylthio group, 4- [4- (phenylthio) phenyl] 4- (phenylthio) phenylthio group, 4-benzoylphenylthio group, 4-benzoyl-2-chlorophenylthio group, 4-benzoyl-3-chlorophenylthio group, 4-benzoyl-3-methylthiophenylthio group, 4 -Benzoyl-2-methylthiophenylthio group, 4- (4-methylthiobenzoyl) phenylthio group, 4- (2-methylthiobenzoyl) phenylthio group, 4- (p-methylbenzoyl) phenylthio group, 4- (p-ethylbenzoyl) And the like), phenylthio group, 4- (p-isopropylbenzoyl) phenylthio group, 4- (pt-butylbenzoyl) phenylthio group and the like.
 一般式(I)において、Rで示されるアルキルチオ基としては、炭素数1~18の直鎖又は分枝鎖アルキルチオ基等が挙げられる。
 アルキルチオ基として具体的には、メチルチオ基、エチルチオ基、プロピルチオ基、イソプロピルチオ基、ブチルチオ基、イソブチルチオ基、sec-ブチルチオ基、t-ブチルチオ基、ペンチルチオ基、イソペンチルチオ基、ネオペンチルチオ基、t-ペンチルチオ基、オクチルチオ基、デシルチオ基、ドデシルチオ基、イソオクタデシルチオ基等が挙げられる。
In the general formula (I), examples of the alkylthio group represented by R 3 include linear or branched alkylthio groups having 1 to 18 carbon atoms.
Specific examples of the alkylthio group include methylthio group, ethylthio group, propylthio group, isopropylthio group, butylthio group, isobutylthio group, sec-butylthio group, t-butylthio group, pentylthio group, isopentylthio group, neopentylthio group. And t-pentylthio group, octylthio group, decylthio group, dodecylthio group, isooctadecylthio group and the like.
 一般式(I)において、Rで示されるアリール基としては、炭素数6~10のアリール基等が挙げられる。
 アリール基として具体的には、フェニル基、トリル基、ジメチルフェニル基、ナフチル基等が挙げられる。
Examples of the aryl group represented by R 3 in the general formula (I) include aryl groups having 6 to 10 carbon atoms.
Specific examples of the aryl group include phenyl group, tolyl group, dimethylphenyl group and naphthyl group.
 一般式(I)において、Rで示される複素環式炭化水素基としては、炭素数4~20の複素環式炭化水素基等が挙げられる。
 複素環式炭化水素基として具体的には、チエニル基、フラニル基、ピラニル基、ピロリル基、オキサゾリル基、チアゾリル基、ピリジル基、ピリミジル基、ピラジニル基、インドリル基、ベンゾフラニル基、ベンゾチエニル基、キノリル基、イソキノリル基、キノキサリニル基、キナゾリニル基、カルバゾリル基、アクリジニル基、フェノチアジニル基、フェナジニル基、キサンテニル基、チアントレニル基、フェノキサジニル基、フェノキサチイニル基、クロマニル基、イソクロマニル基、ジベンゾチエニル基、キサントニル基、チオキサントニル基、ジベンゾフラニル基等が挙げられる。
Examples of the heterocyclic hydrocarbon group represented by R 3 in the general formula (I) include heterocyclic hydrocarbon groups having 4 to 20 carbon atoms.
Specific examples of the heterocyclic hydrocarbon group include thienyl group, furanyl group, pyranyl group, pyrrolyl group, oxazolyl group, thiazolyl group, pyridyl group, pyrimidyl group, pyrazinyl group, indolyl group, benzofuranyl group, benzothienyl group, quinolyl. Group, isoquinolyl group, quinoxalinyl group, quinazolinyl group, carbazolyl group, acridinyl group, phenothiazinyl group, phenazinyl group, xanthenyl group, tianthrenyl group, phenoxazinyl group, phenoxatinyl group, chromanyl group, isochromanyl group, dibenzothienyl group, xanthonyl group Groups, thioxanthonyl groups, dibenzofuranyl groups and the like.
 一般式(I)において、Rで示されるアルキルスルフィニル基としては、炭素数1~18の直鎖又は分枝鎖アルキルスルフィニル基等が挙げられる。
 アルキルスルフィニル基として具体的には、メチルスルフィニル基、エチルスルフィニル基、プロピルスルフィニル基、イソプロピルスルフィニル基、ブチルスルフィニル基、イソブチルスルフィニル基、sec-ブチルスルフィニル基、t-ブチルスルフィニル基、ペンチルスルフィニル基、イソペンチルスルフィニル基、ネオペンチルスルフィニル基、t-ペンチルスルフィニル基、オクチルスルフィニル基、イソオクタデシルスルフィニル基等が挙げられる。
In the general formula (I), examples of the alkylsulfinyl group represented by R 3 include linear or branched alkylsulfinyl groups having 1 to 18 carbon atoms.
Specific examples of the alkylsulfinyl group include methylsulfinyl group, ethylsulfinyl group, propylsulfinyl group, isopropylsulfinyl group, butylsulfinyl group, isobutylsulfinyl group, sec-butylsulfinyl group, t-butylsulfinyl group, pentylsulfinyl group, iso Examples thereof include pentylsulfinyl group, neopentylsulfinyl group, t-pentylsulfinyl group, octylsulfinyl group, isooctadecylsulfinyl group and the like.
 一般式(I)において、Rで示されるアリールスルフィニル基としては、炭素数6~10のアリールスルフィニル基等が挙げられる。
 アリールスルフィニル基として具体的には、フェニルスルフィニル基、トリルスルフィニル基、ナフチルスルフィニル基等が挙げられる。
In the general formula (I), examples of the arylsulfinyl group represented by R 3 include arylsulfinyl groups having 6 to 10 carbon atoms.
Specific examples of the arylsulfinyl group include phenylsulfinyl group, tolylsulfinyl group, and naphthylsulfinyl group.
 一般式(I)において、Rで示されるアルキルスルホニル基としては、炭素数1~18の直鎖又は分枝鎖アルキルスルホニル基等が挙げられる。
 アルキルスルホニル基として具体的には、メチルスルホニル基、エチルスルホニル基、プロピルスルホニル基、イソプロピルスルホニル基、ブチルスルホニル基、イソブチルスルホニル基、sec-ブチルスルホニル基、t-ブチルスルホニル基、ペンチルスルホニル基、イソペンチルスルホニル基、ネオペンチルスルホニル基、t-ペンチルスルホニル基、オクチルスルホニル基、オクタデシルスルホニル基等が挙げられる。
In the general formula (I), examples of the alkylsulfonyl group represented by R 3 include a linear or branched alkylsulfonyl group having 1 to 18 carbon atoms.
Specific examples of the alkylsulfonyl group include methylsulfonyl group, ethylsulfonyl group, propylsulfonyl group, isopropylsulfonyl group, butylsulfonyl group, isobutylsulfonyl group, sec-butylsulfonyl group, t-butylsulfonyl group, pentylsulfonyl group, iso Examples thereof include pentyl sulfonyl group, neopentyl sulfonyl group, t-pentyl sulfonyl group, octyl sulfonyl group, octadecyl sulfonyl group and the like.
 一般式(I)において、Rで示されるアリールスルホニル基としては、炭素数6~10のアリールスルホニル基等が挙げられる。
 アリールスルホニル基として具体的には、フェニルスルホニル基、トリルスルホニル基(トシル基)、ナフチルスルホニル基等が挙げられる。
Examples of the arylsulfonyl group represented by R 3 in the general formula (I) include an arylsulfonyl group having 6 to 10 carbon atoms.
Specific examples of the arylsulfonyl group include phenylsulfonyl group, tolylsulfonyl group (tosyl group), and naphthylsulfonyl group.
 一般式(I)において、Rで示されるアルキルスルホニルオキシ基としては、炭素数1~18の直鎖又は分枝鎖アルキルスルホニルオキシ基等が挙げられる。
 アルキルスルホニルオキシ基として具体的には、メチルスルホニルオキシ基、エチルスルホニルオキシ基、プロピルスルホニルオキシ基、イソプロピルスルホニルオキシ基、ブチルスルホニルオキシ基、イソブチルスルホニルオキシ基、sec-ブチルスルホニルオキシ基、t-ブチルスルホニルオキシ基、ペンチルスルホニルオキシ基、イソペンチルスルホニルオキシ基、ネオペンチルスルホニルオキシ基、t-ペンチルスルホニルオキシ基、オクチルスルホニルオキシ基、オクタデシルスルホニルオキシ基等が挙げられる。
In the general formula (I), examples of the alkylsulfonyloxy group represented by R 3 include linear or branched alkylsulfonyloxy groups having 1 to 18 carbon atoms.
Specifically, as the alkylsulfonyloxy group, methylsulfonyloxy group, ethylsulfonyloxy group, propylsulfonyloxy group, isopropylsulfonyloxy group, butylsulfonyloxy group, isobutylsulfonyloxy group, sec-butylsulfonyloxy group, t-butyl A sulfonyloxy group, a pentyl sulfonyloxy group, an isopentyl sulfonyloxy group, a neopentyl sulfonyloxy group, a t-pentyl sulfonyloxy group, an octyl sulfonyloxy group, an octadecyl sulfonyloxy group and the like can be mentioned.
 一般式(I)において、Rで示されるアリールスルホニルオキシ基としては、炭素数6~10のアリールスルホニルオキシ基等が挙げられる。
 アリールスルホニルオキシ基として具体的には、フェニルスルホニルオキシ基、トリルスルホニルオキシ基、ナフチルスルホニルオキシ基等が挙げられる。
Examples of the arylsulfonyloxy group represented by R 3 in the general formula (I) include an arylsulfonyloxy group having 6 to 10 carbon atoms.
Specific examples of the arylsulfonyloxy group include phenylsulfonyloxy group, tolylsulfonyloxy group, and naphthylsulfonyloxy group.
 一般式(I)において、Rで示されるヒドロキシ(ポリ)アルキレンオキシ基としては、[HO(-AO)-(AOはエチレンオキシ基及びプロピレンオキシ基の少なくとも一方を示し、qは1~5の整数を示す。)]で表されるヒドロキシ(ポリ)アルキレンオキシ基等が挙げられる。 In the general formula (I), as the hydroxy (poly) alkyleneoxy group represented by R 3 , [HO (-AO) q- (AO represents at least one of an ethyleneoxy group and a propyleneoxy group, and q is 1 to The integer of 5 is shown.)], Etc. are mentioned.
 一般式(I)において、Rで示されるアミノ基としては、アミノ基(-NH)、炭素数1~15の置換アミノ基等が挙げられる。
 置換アミノ基として具体的には、メチルアミノ基、ジメチルアミノ基、エチルアミノ基、メチルエチルアミノ基、ジエチルアミノ基、n-プロピルアミノ基、メチル-n-プロピルアミノ基、エチル-n-プロピルアミノ基、イソプロピルアミノ基、イソプロピルメチルアミノ基、イソプロピルエチルアミノ基、ジイソプロピルアミノ基、フェニルアミノ基、ジフェニルアミノ基、メチルフェニルアミノ基、エチルフェニルアミノ基、n-プロピルフェニルアミノ基、イソプロピルフェニルアミノ基等が挙げられる。
In the general formula (I), examples of the amino group represented by R 3 include an amino group (—NH 2 ), a substituted amino group having 1 to 15 carbon atoms, and the like.
Specifically as a substituted amino group, methylamino group, dimethylamino group, ethylamino group, methylethylamino group, diethylamino group, n-propylamino group, methyl-n-propylamino group, ethyl-n-propylamino group Isopropylamino, isopropylmethylamino, isopropylethylamino, diisopropylamino, phenylamino, diphenylamino, methylphenylamino, ethylphenylamino, n-propylphenylamino, isopropylphenylamino and the like It can be mentioned.
 一般式(I)において、Rで示されるハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられる。 Examples of the halogen atom represented by R 3 in the general formula (I) include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
 式(1)において、nはRの個数を示し、0~5の整数であることが好ましく、より好ましくは0~3であり、さらに好ましくは0~2であり、特に好ましくは0又は1である。 In the formula (1), n represents the number of R 3 and is preferably an integer of 0 to 5, more preferably 0 to 3, still more preferably 0 to 2, particularly preferably 0 or 1 It is.
 R~Rで示される各基はさらに置換基を有していてもよい。置換基の具体例としては、アルキル基、アリール基、アミノ基、シアノ基、ニトロ基、ハロゲン原子等を挙げることができる。 Each group represented by R 1 to R 3 may further have a substituent. Specific examples of the substituent include an alkyl group, an aryl group, an amino group, a cyano group, a nitro group, a halogen atom and the like.
 一般式(I)で表されるカチオンとしては、一般式(II)で表されるカチオンであることが好ましい。 The cation represented by the general formula (I) is preferably a cation represented by the general formula (II).
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
 一般式(II)において、Rは炭素数が1~4のアルキル基、ベンジル基、ナフチル基又はナフチルメチル基を示し、Rは炭素数が1~4のアルキル基を示す。Rは水素原子、R-CO-基又はR-SO-基(Rは、1又は2以上のハロゲン原子で置換されていてもよい炭素数が1~4のアルキル基を示す。)を示す。Rは、各々独立に、炭素数が1~4のアルキル基又はハロゲン原子を示す。mは0~4の整数を示す。 In the general formula (II), R 1 represents an alkyl group having 1 to 4 carbon atoms, a benzyl group, a naphthyl group or a naphthylmethyl group, and R 2 represents an alkyl group having 1 to 4 carbon atoms. R 4 is a hydrogen atom, R-CO- group or R-SO 2 -group (R represents an alkyl group having 1 to 4 carbon atoms which may be substituted by one or more halogen atoms). Show. Each R 5 independently represents an alkyl group having 1 to 4 carbon atoms or a halogen atom. m is an integer of 0 to 4;
 一般式(II)において、R、R、R又はRにおける炭素数が1~4のアルキル基の具体例としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、t-ブチル基等が挙げられる。mは0~4の整数を示し、好ましくは0~3であり、より好ましくは0~2であり、さらに好ましくは0又は1である。 In the general formula (II), specific examples of the alkyl group having 1 to 4 carbon atoms in R 1 , R 2 , R 4 or R 5 include methyl, ethyl, n-propyl, isopropyl and n- Examples thereof include a butyl group, an isobutyl group, a sec-butyl group and a t-butyl group. m is an integer of 0 to 4, preferably 0 to 3, more preferably 0 to 2, and still more preferably 0 or 1.
 一般式(II)において、Rは、R-CO-基又はR-SO-基(Rは、1又は2以上のハロゲン原子で置換されていてもよい炭素数が1~4のアルキル基を示す。)であることが好ましく、R-CO-基であることがより好ましい。Rとして示されるR-CO-基としては、アセチル基であることがさらに好ましい。
 RがR-CO-基である場合のRO-基の具体例は、一般式(I)におけるRがアルキルカルボニルオキシ基である場合の具体例のうちの炭素数が2~5のものと同様である。また、RがR-SO-基である場合のRO-基の具体例は、一般式(I)におけるRがアルキルスルホニルオキシ基である場合の具体例のうちの炭素数が1~4のものと同様である。
In the general formula (II), R 4 is an R-CO- group or an R-SO 2 -group (R is an alkyl group having 1 to 4 carbon atoms which may be substituted with one or more halogen atoms Is preferable, and R-CO- group is more preferable. The R-CO- group represented as R 4 is more preferably an acetyl group.
When R 4 is an R-CO- group, specific examples of the R 4 O- group are those having 2 to 5 carbon atoms of the specific examples when R 3 in the general formula (I) is an alkylcarbonyloxy group It is similar to Also, specific examples of the R 4 O- group when R 4 is a R-SO 2 -group are the carbon numbers of the specific examples when R 3 in the general formula (I) is an alkylsulfonyloxy group It is similar to that of 1 to 4.
 一般式(I)又は一般式(II)において、Rは、アルキル基、ナフチル基又はナフチルメチル基であることが好ましく、炭素数が1~4のアルキル基であることがより好ましく、メチル基であることがさらに好ましい。
 また、一般式(I)又は一般式(II)において、R及びRの好ましい組み合わせとしては、R及びRが共にメチル基の組み合わせが挙げられる。
In the general formula (I) or the general formula (II), R 1 is preferably an alkyl group, a naphthyl group or a naphthylmethyl group, more preferably an alkyl group having 1 to 4 carbon atoms, and a methyl group It is further preferred that
In general formula (I) or general formula (II), the preferable combination of R 1 and R 2, R 1 and R 2 are both include a combination of a methyl group.
 特定硬化剤の具体例としては、ジメチル-p-アセトキシフェニルスルホニウム=ヘキサフルオロアンチモナート、ベンジルメチルp-ヒドロキシフェニルスルホニウム=ヘキサフルオロアンチモナート、ジメチルアセトキシフェニルスルホニウム=フッ素化アルキルフルオロホスフェート等が挙げられる。 Specific examples of the specific curing agent include dimethyl-p-acetoxyphenylsulfonium = hexafluoroantimonate, benzylmethyl p-hydroxyphenylsulfonium = hexafluoroantimonate, dimethylacetoxyphenylsulfonium = fluorinated alkyl fluorophosphate and the like.
 硬化剤の含有率は特に限定されない。硬化剤と熱硬化性樹脂との割合が、質量比(硬化剤/熱硬化性樹脂)で0.001~0.05とすることが好ましい。硬化物の高ガラス転移温度化の観点から、0.004~0.05とすることがより好ましく、ゲルタイムの長時間化の観点から、0.004~0.015とすることがさらに好ましく、触媒使用量の低減の観点から、0.004~0.01とすることが特に好ましい。 The content of the curing agent is not particularly limited. The ratio of the curing agent to the thermosetting resin is preferably 0.001 to 0.05 in mass ratio (curing agent / thermosetting resin). From the viewpoint of increasing the glass transition temperature of the cured product, it is more preferable to set it to 0.004 to 0.05, and from the viewpoint of increasing the gel time, it is more preferable to set it to 0.004 to 0.015, and the catalyst From the viewpoint of reducing the amount used, it is particularly preferable to set it to 0.004 to 0.01.
-窒化ホウ素-
 プリプレグマイカテープの高熱伝導化の手段として、窒化ホウ素を用いてもよい。
 窒化ホウ素含有層に含有される窒化ホウ素としては、六方晶窒化ホウ素(h-BN)、立方晶窒化ホウ素(c-BN)、ウルツ鉱型窒化ホウ素等が挙げられる。これらの中でも、六方晶窒化ホウ素(h-BN)が好ましい。窒化ホウ素は、鱗片状に形成されている窒化ホウ素の一次粒子であっても、このような一次粒子が凝集されて形成された二次粒子であってもよい。
-Boron Nitride-
Boron nitride may be used as a means for increasing the thermal conductivity of the prepreg mica tape.
Examples of boron nitride contained in the boron nitride-containing layer include hexagonal boron nitride (h-BN), cubic boron nitride (c-BN), wurtzite boron nitride and the like. Among these, hexagonal boron nitride (h-BN) is preferable. The boron nitride may be a primary particle of boron nitride formed in a scaly shape or a secondary particle formed by aggregating such primary particles.
 窒化ホウ素の平均粒子径は、1μm~40μmのものが好ましく、5μm~20μmのものがより好ましく、5μm~10μmのものがさらに好ましい。
 窒化ホウ素の平均粒子径が1μm以上であると、熱伝導率及び絶縁耐電圧がより向上する傾向がある。窒化ホウ素の平均粒子径が40μm以下であると、粒子形状の異方性による熱伝導率の異方性が大きくなりすぎることが抑制できる。
The average particle diameter of boron nitride is preferably 1 μm to 40 μm, more preferably 5 μm to 20 μm, and still more preferably 5 μm to 10 μm.
When the average particle diameter of boron nitride is 1 μm or more, the thermal conductivity and the insulation withstand voltage tend to be further improved. It can suppress that the anisotropy of the heat conductivity by the anisotropy of particle shape becomes it large that the average particle diameter of boron nitride is 40 micrometers or less is too large.
 窒化ホウ素の平均粒子径は、レーザー回折散乱方式粒度分布測定装置(例えば、マイクロトラック MT3000II、日機装株式会社)を用いることで測定可能である。純水中に窒化ホウ素粉末を投入した後に、超音波分散機で分散する。この分散液の粒子径分布を測定することで窒化ホウ素の粒子径分布が測定される。粒子径分布に基づいて、平均粒子径は、小径側からの体積累積50%に対応する粒子径として求められる。 The average particle size of boron nitride can be measured by using a laser diffraction / scattering particle size distribution measuring apparatus (for example, Microtrac MT3000II, Nikkiso Co., Ltd.). After the boron nitride powder is introduced into pure water, it is dispersed by an ultrasonic dispersion machine. The particle size distribution of boron nitride is measured by measuring the particle size distribution of this dispersion. Based on the particle size distribution, the average particle size is determined as the particle size corresponding to 50% of the volume accumulation from the small diameter side.
 窒化ホウ素は、1種類を単独で使用してもよいし、2種類以上を併用して用いてもよい。なお、窒化ホウ素を2種類以上併用するとは、例えば、同じ成分で平均粒子径が異なる窒化ホウ素を2種類以上用いる場合、平均粒子径が同じで成分の異なる窒化ホウ素を2種類以上用いる場合並びに平均粒子径及び種類の異なる窒化ホウ素を2種類以上用いる場合が挙げられる。 One type of boron nitride may be used alone, or two or more types may be used in combination. When two or more types of boron nitride are used in combination, for example, when using two or more types of boron nitride having the same component and different average particle sizes, the case of using two or more types of boron nitride having the same average particle size and different components The case where two or more types of boron nitrides different in particle diameter and type are used may be mentioned.
 本開示のプリプレグマイカテープが窒化ホウ素含有層を有する場合、窒化ホウ素の含有率は、プリプレグマイカテープに含有される裏打ち材とマイカを除く全固形分の合計量に対して、10体積%~50体積%であることが好ましく、15体積%~35体積%であることがより好ましい。窒化ホウ素の含有率が10体積%以上であれば、プリプレグマイカテープの熱伝導率がより向上する傾向にある。窒化ホウ素の含有率が50体積%以下であれば、窒化ホウ素の樹脂への充填が困難になりにくい傾向にある。 When the prepreg mica tape of the present disclosure has a boron nitride-containing layer, the boron nitride content is 10% by volume to 50% of the total amount of the solid content excluding the backing material and mica contained in the prepreg mica tape. It is preferably volume%, more preferably 15 volume% to 35 volume%. If the content of boron nitride is 10% by volume or more, the thermal conductivity of the prepreg mica tape tends to be further improved. If the content of boron nitride is 50% by volume or less, the filling of the boron nitride into the resin tends to be difficult.
-添加剤-
 本開示で用いられる添加剤としては、カップリング剤、エラストマ、酸化防止剤、老化防止剤、安定剤、難燃剤、増粘剤等の、樹脂組成物に一般に用いられる各種添加剤を挙げることができる。これらの添加剤の含有量は、本開示の効果を損なわない範囲であれば特に制限されない。
 また、硬化剤の硬化速度抑制を目的として、硬化遅延剤を利用することができる。硬化遅延剤の含有量は、硬化速度に応じて適宜設定でき、本開示の効果を損なわない範囲であれば特に制限されない。
-Additive-
The additives used in the present disclosure may include various additives generally used in resin compositions, such as coupling agents, elastomers, antioxidants, anti-aging agents, stabilizers, flame retardants, thickeners and the like. it can. The content of these additives is not particularly limited as long as the effects of the present disclosure are not impaired.
In addition, a curing retarder can be used for the purpose of suppressing the curing rate of the curing agent. The content of the curing retarder can be appropriately set according to the curing rate, and is not particularly limited as long as the effects of the present disclosure are not impaired.
<プリプレグマイカテープの製造方法>
 プリプレグマイカテープは、いかなる工程を経て製造されたものであってもよく、従来から公知の製造方法を適用することができる。
 プリプレグマイカテープの製造方法の一例としては、熱硬化性樹脂と硬化剤と必要に応じて用いられる窒化ホウ素その他の材料とが溶剤に混合された樹脂ワニスを準備する樹脂ワニス準備工程と、樹脂ワニスを裏打ち材の一方の面側に塗布する塗布工程と、裏打ち材における樹脂ワニスの塗布された面側にマイカペーパーを貼り合わせる貼付工程と、を経る方法が挙げられる。
 プリプレグマイカテープの製造方法の他の一例としては、熱硬化性樹脂と硬化剤と必要に応じて用いられる窒化ホウ素その他の材料とが溶剤に混合された樹脂ワニスを準備する樹脂ワニス準備工程と、裏打ち材とマイカペーパーとを積層して積層体を得る積層工程と、積層体の裏打ち材側から樹脂ワニスを付与する付与工程と、を経る方法が挙げられる。   
<Production method of prepreg mica tape>
The prepreg mica tape may be produced through any process, and a conventionally known production method can be applied.
As an example of a method for producing a prepreg mica tape, a resin varnish preparing step of preparing a resin varnish in which a thermosetting resin, a curing agent and boron nitride and other materials used as needed are mixed in a solvent, and a resin varnish And the pasting process of pasting mica paper on the side of the backing material on which the resin varnish is applied.
As another example of a method for producing a prepreg mica tape, a resin varnish preparing step of preparing a resin varnish in which a thermosetting resin, a curing agent and boron nitride and other materials used as needed are mixed in a solvent, The method includes a laminating step of laminating a backing material and mica paper to obtain a laminate, and an applying step of applying a resin varnish from the backing material side of the laminate.
 樹脂ワニスが窒化ホウ素を含む場合、熱硬化性樹脂の中に窒化ホウ素を充填するために溶剤で樹脂を希釈してもよい。用いられる溶剤としては、通常用いられる有機溶剤から適宜選択される。具体的には、メチルエチルケトン、メタノール、シクロヘキサノン等の溶剤を挙げることができる。 When the resin varnish contains boron nitride, the resin may be diluted with a solvent in order to fill the thermosetting resin with boron nitride. As a solvent to be used, it is suitably selected from the organic solvent used normally. Specifically, solvents such as methyl ethyl ketone, methanol and cyclohexanone can be mentioned.
 樹脂ワニスが窒化ホウ素を含む場合、塗布工程において、裏打ち材の一方の面側に樹脂ワニスが塗布され、これが乾燥されることで、窒化ホウ素含有層が形成される。裏打ち材における樹脂ワニスの塗布された面側に貼り合わせられたマイカペーパーに、樹脂ワニスに含まれる熱硬化性樹脂及び硬化剤を含浸させることで、該マイカペーパーであった箇所がマイカ含有層とされる。 When the resin varnish contains boron nitride, in the coating step, the resin varnish is applied to one surface side of the backing material, and the resin varnish is dried to form a boron nitride-containing layer. By impregnating the mica paper laminated on the coated side of the resin varnish in the backing material with the thermosetting resin and the curing agent contained in the resin varnish, the portion which was the mica paper is a mica-containing layer Be done.
 本開示のプリプレグマイカテープがマイカ含有層と共に窒化ホウ素含有層を有する場合、上記工程を経て製造されるプリプレグマイカテープにおけるマイカ含有層中の熱硬化性樹脂及び硬化剤と窒化ホウ素含有層中の熱硬化性樹脂及び硬化剤は、共に、樹脂ワニスに含有される熱硬化性樹脂及び硬化剤をその起源とする同じ種類のものとされる。
 また、樹脂ワニスが窒化ホウ素を含む場合、塗布工程において樹脂ワニスが裏打ち材の一方の面側に塗布される際、裏打ち材としてガラスクロス等のクロスを用いると、樹脂ワニスの一部が裏打ち材の他方の面側ににじみ出ることがある。これを乾燥させることで裏打ち材の他方の面側にも窒化ホウ素含有層が形成されることがある。裏打ち材の他方の面側にも窒化ホウ素含有層が形成されたプリプレグマイカテープも、本開示のプリプレグマイカテープの範囲に含まれる。
When the prepreg mica tape of the present disclosure has a boron nitride-containing layer together with a mica-containing layer, the thermosetting resin and the curing agent in the mica-containing layer and the heat in the boron nitride-containing layer of the prepreg mica tape produced through the above steps Both the curable resin and the curing agent are of the same type originating from the thermosetting resin and the curing agent contained in the resin varnish.
In addition, when the resin varnish contains boron nitride, when the resin varnish is applied to one surface side of the backing material in the coating step, when a cloth such as glass cloth is used as the backing material, part of the resin varnish is the backing material It may exude to the other side of the By drying this, a boron nitride-containing layer may be formed on the other surface side of the backing material. A prepreg mica tape having a boron nitride-containing layer formed on the other side of the backing material is also included in the scope of the prepreg mica tape of the present disclosure.
 本開示のプリプレグマイカテープは、コイル導体の絶縁層の形成に用いることができる。また、本開示のプリプレグマイカテープは、耐熱電気絶縁放熱スペーサーとして、例えば、パワートランジスタ放熱用絶縁板において放熱性を向上するための材料としても使用することができる。 The prepreg mica tape of the present disclosure can be used to form an insulating layer of a coil conductor. The prepreg mica tape of the present disclosure can also be used as a heat-resistant, electrically-insulating, heat-radiating spacer, for example, as a material for improving the heat radiation of a power transistor heat-dissipating insulating plate.
<<回転電機用コイル>>
 本開示の回転電機用コイルは、コイル導体と、本開示のプリプレグマイカテープの積層体の硬化物を含み前記コイル導体の外周の少なくとも一部を覆うように配置された絶縁層と、を有する。
 本開示の回転電機用コイルに含まれる絶縁層は本開示のプリプレグマイカテープの積層体の硬化物を含むため、絶縁層のガラス転移温度を高くすることができる。そのため、本開示の回転電機用コイルは耐熱性に優れる。
 本開示の回転電機用コイルに用いられるコイル導体の材質、形状、大きさ等は特に制限されず、回転電機用コイルの用途等に応じて選択できる。
<< Coil for electric rotating machine >>
The coil for a rotating electrical machine of the present disclosure has a coil conductor, and an insulating layer including a cured product of the laminate of the prepreg mica tape of the present disclosure and covering at least a part of the outer periphery of the coil conductor.
The insulating layer contained in the coil for a rotating electrical machine of the present disclosure includes the cured product of the laminate of the prepreg mica tape of the present disclosure, so the glass transition temperature of the insulating layer can be increased. Therefore, the coil for a rotating electrical machine of the present disclosure is excellent in heat resistance.
The material, shape, size and the like of the coil conductor used for the coil for a rotating electrical machine of the present disclosure are not particularly limited, and can be selected according to the application and the like of the coil for a rotating electrical machine.
<<回転電機用コイルの製造方法>>
 本開示の回転電機用コイルの製造方法は、コイル導体の外周の少なくとも一部を覆う、本開示のプリプレグマイカテープの積層体を形成する工程と、前記プリプレグマイカテープの積層体を硬化して絶縁層を形成する工程と、を有する。
 プリプレグマイカテープの積層体を形成する工程は特に制限されず、通常行われる方法を採用することができる。例えば、コイル導体の外周に、マイカテープを巻き付ける方法が挙げられる。この場合、プリプレグマイカテープを一部(例えば、プリプレグマイカテープの幅の半分の部分)が互いに重なるように複数回巻き付けてもよい。
 絶縁層を形成する工程は特に制限されず、通常行われる方法を採用することができる。例えば、プリプレグマイカテープの積層体で外周の少なくとも一部を覆われたコイル導体を加熱及び加圧するか又は真空処理をした後に加熱及び加圧することにより、熱硬化性樹脂を硬化させてプリプレグマイカテープを一体化させ、絶縁層を形成する方法が挙げられる。
 本開示のプリプレグマイカテープは長いゲルタイムを確保可能であるため、本開示の回転電機用コイル製造方法では、加圧時間を長くすることができる。
<< Method of manufacturing coil for rotary electric machine >>
The method of manufacturing a coil for a rotating electrical machine according to the present disclosure comprises the steps of forming a laminate of the prepreg mica tape of the present disclosure covering at least a part of the outer periphery of the coil conductor, curing the laminate of the prepreg mica tape and insulating Forming a layer.
The process in particular of forming the laminated body of a prepreg mica tape is not restrict | limited, The method normally performed can be employ | adopted. For example, there is a method of winding mica tape around the outer periphery of the coil conductor. In this case, the prepreg mica tape may be wound multiple times so that parts (for example, a half of the width of the prepreg mica tape) overlap each other.
The step of forming the insulating layer is not particularly limited, and a method which is usually performed can be employed. For example, a thermosetting resin is cured by heating and pressing a coil conductor covered at least a part of the outer periphery with a laminate of a prepreg mica tape or after vacuum treatment, thereby curing a thermosetting resin and a prepreg mica tape Are integrated to form an insulating layer.
The prepreg mica tape of the present disclosure can ensure a long gel time, so the method of manufacturing a coil for a rotating electrical machine of the present disclosure can extend the pressing time.
 以下、本開示を実施例により具体的に説明するが、本開示はこれらの実施例に限定されるものではない。 Hereinafter, the present disclosure will be specifically described by way of examples, but the present disclosure is not limited to these examples.
<実施例1>
(1)マイカペーパーの作製
 マイカ(粒子径が2.8mm以上のマイカ片の含有率は63質量%)を水中に分散してマイカ粒子とし、抄紙機にて抄造し平均厚み0.13mmのマイカペーパーを作製した。マイカペーパーの平均厚みは、マイクロメーター(株式会社ミツトヨ、MDC-SB)を用いて10点の厚みを測定し、その算術平均値として求めた。
Example 1
(1) Preparation of mica paper mica (a content of mica pieces having a particle diameter of 2.8 mm or more is 63% by mass) is dispersed in water to form mica particles, which are made into paper by a paper machine and mica having an average thickness of 0.13 mm Paper was made. The average thickness of mica paper was obtained by measuring the thickness of 10 points using a micrometer (Mitutoyo, MDC-SB) and calculating the arithmetic average value thereof.
(2)樹脂ワニスの調製
 エポキシ樹脂(ダウ・ケミカル日本株式会社、商品名「DEN438」)143質量部と、硬化剤としてジメチル-p-アセトキシフェニルスルホニウム=ヘキサフルオロアンチモナート1.0質量部と、溶剤としてメチルエチルケトン(和光純薬工業株式会社)173質量部とを混合した。その後、窒化ホウ素144質量部(平均粒子径5μm、デンカ株式会社、商品名「SP-3」)を加えてさらに混合し樹脂ワニスを得た。
 なお、樹脂ワニスの全固形分体積中の窒化ホウ素の含有率は、35体積%であった。
(2) Preparation of resin varnish 143 parts by mass of epoxy resin (Dow Chemical Japan Ltd., trade name "DEN 438") and 1.0 parts by mass of dimethyl-p-acetoxyphenylsulfonium = hexafluoroantimonate as a curing agent, As a solvent, 173 parts by mass of methyl ethyl ketone (Wako Pure Chemical Industries, Ltd.) was mixed. Thereafter, 144 parts by mass of boron nitride (average particle diameter: 5 μm, Denka Co., Ltd., trade name “SP-3”) was added and further mixed to obtain a resin varnish.
In addition, the content rate of boron nitride in the total solid volume of a resin varnish was 35 volume%.
(3)プリプレグマイカテープの作製
 得られた樹脂ワニスをロールコーターでガラスクロス(株式会社双洋、WEA 03G 103)へ塗布し、さらにマイカペーパーと貼り合わせた。乾燥後、幅30mmに切断しプリプレグマイカテープを形成した。得られたプリプレグマイカテープの平均厚みは280μmであった。なお、プリプレグマイカテープの平均厚みは、マイクロメーター(株式会社ミツトヨ、MDC-SB)を用いて10点の厚みを測定し、その算術平均値として求めた。以下、同様の方法によりプリプレグマイカテープの平均厚みを測定した。
(3) Preparation of Prepreg Mica Tape The obtained resin varnish was applied to a glass cloth (SOHYO Co., Ltd., WEA 03G 103) with a roll coater, and was further bonded to mica paper. After drying, it was cut into a width of 30 mm to form a prepreg mica tape. The average thickness of the obtained prepreg mica tape was 280 μm. The average thickness of the prepreg mica tape was determined by measuring the thickness of 10 points using a micrometer (Mitutoyo, MDC-SB) and calculating the arithmetic average value thereof. Hereinafter, the average thickness of the prepreg mica tape was measured by the same method.
(4)プリプレグマイカテープ硬化物の作製
 上述の方法によって得たプリプレグマイカテープを圧力10MPa、110℃で10分加熱した。その後、圧力10MPa、170℃で60分加熱し、プリプレグマイカテープ硬化物を得た。得られたプリプレグマイカテープ硬化物の平均厚みは180μmであった。なお、プリプレグマイカテープ硬化物の平均厚みは、マイクロメーター(株式会社ミツトヨ、MDC-SB)を用いて10点の厚みを測定し、その算術平均値として求めた。
(4) Preparation of prepreg mica tape cured product The prepreg mica tape obtained by the above-described method was heated at 110 ° C. for 10 minutes under a pressure of 10 MPa. Then, the pressure was 10 MPa and heating was performed at 170 ° C. for 60 minutes to obtain a prepreg mica tape cured product. The average thickness of the obtained prepreg mica tape cured product was 180 μm. The average thickness of the cured prepreg mica tape was determined by measuring the thickness of 10 points using a micrometer (Mitutoyo, MDC-SB) and calculating the arithmetic average value thereof.
<評価>
 上記で得られた樹脂ワニス、プリプレグマイカテープ及びプリプレグマイカテープ硬化物について、以下のような評価を行った。結果を表1に示す。
<Evaluation>
The following evaluation was performed about the resin varnish obtained above, a prepreg mica tape, and a prepreg mica tape hardened | cured material. The results are shown in Table 1.
(樹脂ワニスのゲルタイム)
 得られた樹脂ワニスのゲルタイムは、レオメータ(アントンパール社、MCR301、周波数1Hz、振り角1%、温度120℃)を用いて測定した。120℃での保持を開始した時点を0分、貯蔵弾性率の値が損失弾性率の値を越えた点をゲル化点とし、ゲル化に至るまでの時間をゲルタイムとした。樹脂ワニスのゲルタイムが長くなるとプリプレグマイカテープのゲルタイムも長くなる。
(Geltime of resin varnish)
The gel time of the obtained resin varnish was measured using a rheometer (Anton Pearl, MCR 301, frequency 1 Hz, swing angle 1%, temperature 120 ° C.). The point at which the storage elastic modulus value exceeded the loss elastic modulus value was defined as the gelation point for 0 minutes when the retention at 120 ° C. was started, and the gel time was determined as the gel time. As the gel time of the resin varnish becomes longer, the gel time of the prepreg mica tape also becomes longer.
(樹脂ワニスの硬化物のガラス転移温度)
 得られた樹脂ワニスの硬化物は、アルミカップ上に適量の樹脂ワニスを入れ、170℃で10時間の条件で加熱することで作製した。樹脂ワニスの硬化物の粘弾性特性を、粘弾性装置(TA Instrumental社、RSAG2、周波数10Hz、荷重50g、昇温速度5℃/分)を用いて測定し、tanδのピークトップ温度をガラス転移温度とした。
(Glass transition temperature of cured resin varnish)
A cured product of the obtained resin varnish was prepared by placing an appropriate amount of resin varnish on an aluminum cup and heating at 170 ° C. for 10 hours. The visco-elastic property of the cured product of the resin varnish is measured using a visco-elastic device (TA Instrumental, RSAG2, frequency 10 Hz, load 50 g, heating rate 5 ° C./min), and the peak top temperature of tan δ is glass transition temperature And
(プリプレグマイカテープ硬化物のガラス転移温度)
 得られたプリプレグマイカテープ硬化物について、粘弾性特性を、粘弾性装置(TA Instrumental社、RSAG2、周波数10Hz、荷重50g、昇温速度5℃/分)を用いて測定し、tanδのピークトップ温度をガラス転移温度とした。
(Glass transition temperature of prepreg mica tape cured product)
The visco-elastic characteristics of the obtained prepreg mica tape cured product are measured using a visco-elastic device (TA Instrumental, RSAG2, frequency 10 Hz, load 50 g, heating rate 5 ° C./min), and the peak top temperature of tan δ As the glass transition temperature.
(熱伝導率)
 得られたプリプレグマイカテープ硬化物について、熱抵抗装置(ヤマヨ試験器有限会社、YST-901S)を用いて、マイカテープ硬化物の熱抵抗値を測定した。得られた熱抵抗値を逆算することによって、熱伝導率(W/(m・K))を算出した。
(Thermal conductivity)
The heat resistance value of the mica tape cured product was measured for the obtained prepreg mica tape cured product, using a heat resistance device (Yayodo Tester Co., Ltd., YST-901S). The thermal conductivity (W / (m · K)) was calculated by back-calculating the obtained thermal resistance value.
<実施例2>
 硬化剤としてジメチルアセトキシフェニルスルホニウム=フッ素化アルキルフルオロホスフェートを用いた以外は、実施例1と同様に作製及び評価した。
Example 2
It produced and evaluated like Example 1 except having used dimethyl acetoxy phenyl sulfonium = fluorinated alkyl fluorophosphate as a hardening agent.
<実施例3>
 硬化剤としてベンジルメチルp-ヒドロキシフェニルスルホニウム=ヘキサフルオロアンチモナートを用いた以外は、実施例1と同様に作製及び評価した。
Example 3
The same preparation and evaluation as in Example 1 were carried out except that benzyl methyl p-hydroxyphenyl sulfonium = hexafluoroantimonate was used as a curing agent.
<比較例1>
 硬化剤としてBFモノエチルアミン錯体を用いた以外は、実施例1と同様に作製及び評価した。
Comparative Example 1
Except for using the BF 3 monoethylamine complex as the curing agent, it was prepared and evaluated in the same manner as in Example 1.
<比較例2>
 硬化剤の使用量を4.3質量部とした以外は、比較例1と同様に作製及び評価した。
Comparative Example 2
The same preparation and evaluation as in Comparative Example 1 were carried out except that the amount of the curing agent used was 4.3 parts by mass.
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000007
 表1において「-」は、該当する成分を含有しないことを意味する。 In Table 1, "-" means that the corresponding component is not contained.
 表1の評価結果から明らかなように、本開示によれば、高いガラス転移温度を有し、ゲルタイムが長く、良好なコイル成型性を発現するプリプレグマイカテープを提供することができる。比較例では、高いガラス転移温度又は長いゲルタイムのいずれかを満足することができない。 As apparent from the evaluation results in Table 1, according to the present disclosure, a prepreg mica tape having a high glass transition temperature, a long gel time, and a good coil moldability can be provided. In the comparative example, either high glass transition temperature or long gel time can not be satisfied.
 本明細書に記載された全ての文献、特許出願、及び技術規格は、個々の文献、特許出願、及び技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書中に参照により取り込まれる。 All documents, patent applications, and technical standards described herein are as specific and distinct as when individual documents, patent applications, and technical standards are incorporated by reference. Incorporated herein by reference.

Claims (10)

  1.  裏打ち材と、
     前記裏打ち材の一方の面側に設けられ、マイカと、熱硬化性樹脂と、SbF 、PF 、BF 及び(Rf)PF6-b (Rfは水素の80%以上がフッ素原子で置換されたアルキル基を示し、bは1~5の整数を示す。)のいずれかをアニオン種として含む硬化剤と、を含むマイカ含有層と、
    を有するプリプレグマイカテープ。
    Backing material,
    Provided on one surface side of the backing, and mica, and a thermosetting resin, SbF 6 -, PF 6 - , BF 4 - and (Rf) b PF 6-b - (Rf 80% or more of the hydrogen And M represents a fluorine atom-substituted alkyl group, and b represents an integer of 1 to 5. A curing agent containing any of the following as an anionic species:
    Prepreg mica tape.
  2.  前記硬化剤に含まれるカチオン種が、芳香族スルホニウムカチオンを含む請求項1に記載のプリプレグマイカテープ。 The prepreg mica tape according to claim 1, wherein the cationic species contained in the curing agent contains an aromatic sulfonium cation.
  3.  前記芳香族スルホニウムカチオンが、下記一般式(I)で表されるカチオン種である請求項2に記載のプリプレグマイカテープ。
    Figure JPOXMLDOC01-appb-C000001

    (一般式(I)において、R及びRは各々独立に、アルキル基、フェニル基、ベンジル基、ナフチル基又はナフチルメチル基を示す。Rは、各々独立に、アルキル基、ヒドロキシ基、カルボキシ基、アルコキシ基、アリールオキシ基、アルキルカルボニル基、アリールカルボニル基、アラルキルカルボニル基、アルコキシカルボニル基、アリールオキシカルボニル基、アラルキルオキシカルボニル基、アルキルカルボニルオキシ基、アリールカルボニルオキシ基、アラルキルカルボニルオキシ基、アルコキシカルボニルオキシ基、アリールオキシカルボニルオキシ基、アラルキルオキシカルボニルオキシ基、アリールチオカルボニル基、アリールチオ基、アルキルチオ基、アリール基、複素環式炭化水素基、アルキルスルフィニル基、アリールスルフィニル基、アルキルスルホニル基、アリールスルホニル基、アルキルスルホニルオキシ基、アリールスルホニルオキシ基、ヒドロキシ(ポリ)アルキレンオキシ基、アミノ基、シアノ基、ニトロ基又はハロゲン原子を示す。nは0~5の整数を示す。)
    The prepreg mica tape according to claim 2, wherein the aromatic sulfonium cation is a cationic species represented by the following general formula (I).
    Figure JPOXMLDOC01-appb-C000001

    (In the general formula (I), R 1 and R 2 each independently represent an alkyl group, a phenyl group, a benzyl group, a naphthyl group or a naphthylmethyl group. R 3 independently represents an alkyl group, a hydroxy group, Carboxy group, alkoxy group, aryloxy group, alkylcarbonyl group, arylcarbonyl group, aralkylcarbonyl group, aralkylcarbonyl group, alkoxycarbonyl group, aryloxycarbonyl group, aralkyloxycarbonyl group, alkylcarbonyloxy group, arylcarbonyloxy group, aralkylcarbonyloxy group , Alkoxycarbonyloxy group, aryloxycarbonyloxy group, aralkyloxycarbonyloxy group, arylthiocarbonyl group, arylthio group, alkylthio group, aryl group, heterocyclic hydrocarbon group, alkylsulfinyl group And arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, alkylsulfonyloxy group, arylsulfonyloxy group, hydroxy (poly) alkyleneoxy group, amino group, cyano group, nitro group or halogen atom, n is 0 to 5 Indicates an integer.)
  4.  前記一般式(I)で表されるカチオン種が、下記一般式(II)で表されるカチオン種である請求項3に記載のプリプレグマイカテープ。
    Figure JPOXMLDOC01-appb-C000002

    (一般式(II)において、Rは炭素数が1~4のアルキル基、ベンジル基、ナフチル基又はナフチルメチル基を示し、Rは炭素数が1~4のアルキル基を示す。Rは水素原子、R-CO-基又はR-SO-基(Rは、1又は2以上のハロゲン原子で置換されていてもよい炭素数が1~4のアルキル基を示す。)を示す。Rは、各々独立に、炭素数が1~4のアルキル基又はハロゲン原子を示す。mは0~4の整数を示す。)
    The prepreg mica tape according to claim 3, wherein the cationic species represented by the general formula (I) is a cationic species represented by the following general formula (II).
    Figure JPOXMLDOC01-appb-C000002

    (In the general formula (II), R 1 represents an alkyl group, a benzyl group, a naphthyl group or naphthylmethyl group of 1 to 4 carbon atoms, R 2 is .R 4 represents an alkyl group having 1 to 4 carbon atoms Represents a hydrogen atom, an R-CO- group or an R-SO 2 -group (R represents an alkyl group having 1 to 4 carbon atoms which may be substituted with one or more halogen atoms). Each R 5 independently represents an alkyl group having 1 to 4 carbon atoms or a halogen atom, and m represents an integer of 0 to 4.)
  5.  一般式(II)におけるRが、R-CO-基(Rは、1又は2以上のハロゲン原子で置換されていてもよい炭素数が1~4のアルキル基を示す。)である請求項4に記載のプリプレグマイカテープ。 The R 4 in the general formula (II) is an R-CO- group (R represents an alkyl group having 1 to 4 carbon atoms which may be substituted by one or more halogen atoms). The prepreg mica tape according to 4.
  6.  一般式(II)におけるRが、炭素数が1~4のアルキル基である請求項4又は請求項5に記載のプリプレグマイカテープ。 The prepreg mica tape according to claim 4 or 5, wherein R 1 in the general formula (II) is an alkyl group having 1 to 4 carbon atoms.
  7.  前記アニオン種が、SbF である請求項1~請求項6のいずれか1項に記載のプリプレグマイカテープ。 The anionic species, SbF 6 - prepreg mica tape according to any one of claims 1 to 6.
  8.  前記熱硬化性樹脂が、エポキシ樹脂を含む請求項1~請求項7のいずれか1項に記載のプリプレグマイカテープ。 The prepreg mica tape according to any one of claims 1 to 7, wherein the thermosetting resin contains an epoxy resin.
  9.  コイル導体と、
     請求項1~請求項8のいずれか1項に記載のプリプレグマイカテープの積層体の硬化物を含み前記コイル導体の外周の少なくとも一部を覆うように配置された絶縁層と、
    を有する回転電機用コイル。
    Coil conductor,
    An insulating layer that includes a cured product of the laminate of prepreg mica tapes according to any one of claims 1 to 8, and is disposed to cover at least a part of the outer periphery of the coil conductor.
    A coil for a rotating electrical machine having a.
  10.  コイル導体の外周の少なくとも一部を覆う、請求項1~請求項8のいずれか1項に記載のプリプレグマイカテープの積層体を形成する工程と、
     前記プリプレグマイカテープの積層体を硬化して絶縁層を形成する工程と、
    を有する回転電機用コイルの製造方法。
    A process of forming a laminate of a prepreg mica tape according to any one of claims 1 to 8, which covers at least a part of the outer periphery of the coil conductor.
    Curing the laminate of the prepreg mica tape to form an insulating layer;
    The manufacturing method of the coil for rotary electric machines which has.
PCT/JP2017/047386 2017-12-28 2017-12-28 Prepreg mica tape, coil for rotating electrical machine, and method for manufacturing same WO2019130586A1 (en)

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56123625A (en) * 1980-01-29 1981-09-28 Siemens Ag Insulating tape for manufacturing insulating sleeve for electric conductor
JPH05191942A (en) * 1992-01-09 1993-07-30 Hitachi Ltd Manufacture of electric apparatus winding
JP2000149662A (en) * 1998-11-05 2000-05-30 Hitachi Ltd Insulation mica tape and generator coil using the same
JP2002528853A (en) * 1998-10-16 2002-09-03 イソボルタ・エスターライヒツシエ・イゾリールシユトツフベルケ・アクチエンゲゼルシヤフト Method for producing impregnable fine mica tape mixed with accelerator
WO2014109167A1 (en) * 2013-01-10 2014-07-17 三菱電機株式会社 Insulation tape, method for producing same and stator coil
JP2014527686A (en) * 2011-07-20 2014-10-16 シーメンス アクチエンゲゼルシヤフトSiemens Aktiengesellschaft Method for producing tape for electrical insulation system
WO2015053374A1 (en) * 2013-10-09 2015-04-16 日立化成株式会社 Prepreg mica tape and coil using same
JP2016165808A (en) * 2015-03-09 2016-09-15 日立化成株式会社 Prepreg mica tape

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56123625A (en) * 1980-01-29 1981-09-28 Siemens Ag Insulating tape for manufacturing insulating sleeve for electric conductor
JPH05191942A (en) * 1992-01-09 1993-07-30 Hitachi Ltd Manufacture of electric apparatus winding
JP2002528853A (en) * 1998-10-16 2002-09-03 イソボルタ・エスターライヒツシエ・イゾリールシユトツフベルケ・アクチエンゲゼルシヤフト Method for producing impregnable fine mica tape mixed with accelerator
JP2000149662A (en) * 1998-11-05 2000-05-30 Hitachi Ltd Insulation mica tape and generator coil using the same
JP2014527686A (en) * 2011-07-20 2014-10-16 シーメンス アクチエンゲゼルシヤフトSiemens Aktiengesellschaft Method for producing tape for electrical insulation system
WO2014109167A1 (en) * 2013-01-10 2014-07-17 三菱電機株式会社 Insulation tape, method for producing same and stator coil
WO2015053374A1 (en) * 2013-10-09 2015-04-16 日立化成株式会社 Prepreg mica tape and coil using same
JP2016165808A (en) * 2015-03-09 2016-09-15 日立化成株式会社 Prepreg mica tape

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