WO2019113754A1 - Touch-control panel, and pressure touch-control sensing structure and touch-control pressure determination method therefor - Google Patents

Touch-control panel, and pressure touch-control sensing structure and touch-control pressure determination method therefor Download PDF

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Publication number
WO2019113754A1
WO2019113754A1 PCT/CN2017/115498 CN2017115498W WO2019113754A1 WO 2019113754 A1 WO2019113754 A1 WO 2019113754A1 CN 2017115498 W CN2017115498 W CN 2017115498W WO 2019113754 A1 WO2019113754 A1 WO 2019113754A1
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Prior art keywords
layer
touch
pressure
conductive layer
sensing structure
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PCT/CN2017/115498
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French (fr)
Chinese (zh)
Inventor
陈羿恺
邱创弘
Original Assignee
深圳市柔宇科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 深圳市柔宇科技有限公司 filed Critical 深圳市柔宇科技有限公司
Priority to PCT/CN2017/115498 priority Critical patent/WO2019113754A1/en
Priority to CN201780096978.4A priority patent/CN111356972A/en
Priority to TW107144462A priority patent/TW201928634A/en
Publication of WO2019113754A1 publication Critical patent/WO2019113754A1/en

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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Definitions

  • the present invention relates to the field of touch, and more particularly to a touch panel and a pressure touch sensing structure thereof and a touch pressure judging method.
  • the main principle of the third dimension touch is to use a spacer design to mount the pressure sensing component on different layers of substrates.
  • OCA internal optical adhesive
  • the pressure sensing is a four-point sensing method. If the design of the shaped panel is performed, the accuracy of the sensing will be greatly reduced.
  • the technical problem to be solved by the present invention is to provide a touch panel capable of sensing the touch pressure and a pressure touch sensing structure thereof and a touch pressure judging method.
  • the technical solution adopted by the present invention to solve the technical problem is to construct a pressure touch sensing structure of a touch panel, which comprises a substrate, a TFT layer, an OLED layer, and a passivation layer which are sequentially stacked and distributed.
  • the pressure touch sensing structure includes a pressure sensing structure;
  • the pressure sensing structure includes a first conductive layer, a dielectric layer, and a second conductive layer which are sequentially stacked and distributed;
  • the first conductive layer, the dielectric layer, and the second conductive layer are sequentially disposed in a section between the substrate and the passivation layer;
  • the first conductive layer, the dielectric layer, and the second conductive layer are sequentially stacked to form the pressure sensing layer, the substrate, the pressure sensing layer, the TFT layer, the OLED layer, and the passivation layer Stack settings in turn.
  • the first conductive layer, the dielectric layer, and the second conductive layer are sequentially stacked to form the pressure sensing layer; the substrate, the TFT layer, the OLED layer, the pressure sensing layer, and the passivation layer Stack settings in turn.
  • the substrate, the first conductive layer, the TFT layer, the OLED layer, the second conductive layer, and the passivation layer are sequentially stacked, and the dielectric layer is formed on the TFT layer or the OLED layer.
  • the first conductive layer is formed by sputtering using at least one of an electrically conductive metal, a metal alloy, and a metal oxide;
  • the second conductive layer is formed by sputtering using at least one of an electrically conductive metal, a metal alloy, and a metal oxide.
  • the metal comprises one of aluminum, silver, copper, molybdenum, tin, zinc, gold, titanium, and antimony.
  • the metal oxide comprises at least one of indium tin oxide and indium zinc oxide.
  • the dielectric layer is formed of one of physical vapor deposition, chemical vapor deposition, evaporation, sputtering, and liquid deposition of an organic material; or
  • the dielectric layer is formed of one of physical material deposition, chemical vapor deposition, evaporation, sputtering, and liquid deposition from an inorganic material.
  • the passivation layer comprises one layer or is formed of a plurality of layers, and each layer is formed of one of physical material or inorganic material by physical vapor deposition, chemical vapor deposition, evaporation, sputtering, liquid deposition.
  • the organic material comprises at least one of polyethylene terephthalate, polyethylene, and polyethylene naphthalate.
  • the inorganic material comprises at least one of silicon oxide and silicon nitride.
  • the substrate is a glass substrate, or polyethylene terephthalate, polyethylene naphthalate, polyethylene succinate, polyimide, fiber reinforced composite A substrate formed from one of the materials.
  • a touch panel includes the pressure touch sensing structure.
  • the touch panel is a flexible flexible touch panel.
  • the touch panel further includes a processor electrically connected to the first conductive layer and the second conductive layer, respectively, the processor acquires a capacitance signal, and calculates a touch pressure.
  • a touch pressure sensing method is adopted, and the touch pressure sensing method includes:
  • the touch pressure applied by the force applying member is obtained.
  • the method further comprises the steps of:
  • the touch panel and the pressure touch sensing structure and the touch pressure determining method of the present invention have the following beneficial effects: the touch panel and the pressure touch sensing structure thereof in the embodiment of the present invention are externally disposed on the passivation layer.
  • the touch panel and the pressure touch sensing structure thereof in the embodiment of the present invention are externally disposed on the passivation layer.
  • the coordinates of the touch position on the touch panel can be obtained, so that three dimensions can be sensed by the touch.
  • the pressure sensing structure can be distributed on the touch panel over the entire surface, and the capacitance signal can be separately formed in the touch area, so that each position on the hard touch panel and the flexible touch panel can be touched. The touch pressure is sensed.
  • FIG. 1 is a cross-sectional structural view of a touch panel with a pressure touch sensing structure according to a first embodiment of the present invention
  • FIG. 2 is a schematic view showing the capacitance of the touch panel of FIG. 1 before and after being touched;
  • FIG. 3 is a cross-sectional structural view of a touch panel with a pressure touch sensing structure in a second embodiment of the present invention
  • FIG. 4 is a schematic diagram of capacitance of the touch panel of FIG. 3 before and after being touched;
  • FIG. 5 is a cross-sectional structural view of a touch panel with a pressure touch sensing structure according to a third embodiment of the present invention.
  • FIG. 6 is a schematic diagram of capacitance of the touch panel of FIG. 5 before and after being touched;
  • FIG. 7 is a schematic flow chart of a touch pressure judging method using a pressure touch sensing structure according to the present invention.
  • the touch panel 10 in a preferred embodiment of the present invention includes a substrate 11 , a TFT layer 12 (TFT: Thin Film Transistor), and an OLED layer 13 (OLED: Organic Light-).
  • the touch panel 10 further includes a pressure touch sensing structure 15 including a pressure sensing structure, and the pressure sensing structure includes a stacking structure.
  • the first conductive layer 151, the dielectric layer 152, and the second conductive layer 153 are sequentially distributed in a section between the substrate 11 and the passivation layer 14.
  • the passivation layer 14 is pressed, according to the change in capacitance between the first conductive layer 151 and the second conductive layer 153 and the capacitance change between the second conductive layer 153 and the biasing member 20 on the passivation layer 14, The touch pressure applied by the force applying member 20 is released.
  • the substrate 11 is a glass substrate, and other components on the touch panel 10 can be formed on the glass substrate.
  • the substrate 11 may be made of polyethylene terephthalate (abbreviation: PET), polyethylene naphthalate (PEN), polyethylene succinate ( Abbreviation: PES), polyimide (abbreviation: PI), fiber reinforced composite material (abbreviation: FRP) formed in one of the materials.
  • PET polyethylene terephthalate
  • PEN polyethylene naphthalate
  • PES polyethylene succinate
  • PI polyimide
  • FRP fiber reinforced composite material
  • the process of the TFT layer 12 and the OLED layer 13 can be a common process of the TFT and the OLED, and the ordinary touch panel 10 and the flexible flexible touch panel 10 can be satisfied.
  • the passivation layer 14 is formed of an insulating material such as an organic material or an inorganic material, and is disposed on the outermost layer of the panel to protect the panel and withstand external touch pressure.
  • the first conductive layer 151, the dielectric layer 152, and the second conductive layer 153 are sequentially stacked to form a pressure sensing layer 15', and the first conductive layer 151 and the second conductive layer 153 are formed. They are respectively formed of a conductive material and can conduct electricity.
  • the dielectric layer 152 is usually formed of an insulating material, and a capacitance can be formed between the first conductive layer 151 and the second conductive layer 153.
  • the touch panel 10 further includes a processor electrically connected to the first conductive layer 151 and the second conductive layer 153, respectively, the processor acquires a capacitance signal, and calculates a touch pressure, and at the same time, according to the touch
  • the processor acquires a capacitance signal, and calculates a touch pressure, and at the same time, according to the touch
  • the horizontal and vertical coordinates of the touch position on the touch panel and the position change in the thickness direction of the touch panel 10 are obtained, thereby enabling Touch can achieve three dimensions of sensing.
  • the pressure sensing structure can be distributed on the touch panel and can form a separate capacitive signal in the touch area, so that each position on the hard touch panel and the flexible touch panel can be sensed during touch. Touch pressure.
  • the substrate 11, the pressure sensing layer 15', the TFT layer 12, the OLED layer 13, and the passivation layer 14 are sequentially stacked, and when the passivation layer 14 is pressed by an external touch, according to the first conductive layer 151, The change in capacitance between the second conductive layer 153 and the change in capacitance between the second conductive layer 153 and the urging member 20 on the passivation layer 14 yield the touch pressure applied by the urging member 20.
  • the pressure sensing mechanism of the pressure sensing structure is as follows: when the passivation layer 14 is pressed by an external force, the deformation caused by the dielectric layer 152 causes a change in the capacitance value to perform force. Discrimination.
  • the process is as follows: when no pressure is applied initially, the single point capacitance value between the first conductive layer 151 and the second conductive layer 153 is C1;
  • the capacitance between the force applying member 20 and the second conductive layer 153 is C3, between the first conductive layer 151 and the second conductive layer 153.
  • the capacitance of the capacitor is C2. Therefore, the capacitance of the single point at the position of the urging member 20 is C2+C3, and the capacitance of the single conductive layer 151 is 1/C2+1/C3.
  • the values of C2 and C3 follow the capacitance formula:
  • dielectric coefficient, which changes with the material of the dielectric layer 152
  • the force exerted by the area in turn, the force value of the pressure sensing structure.
  • Another more precise way is to establish a database of pressures for the pressure-sensing structure that is produced, and then establish a relationship between the capacitance value and the force to determine the force received.
  • the first conductive layer 151 is formed by sputtering of an electrically conductive metal
  • the second conductive layer 153 is also formed by sputtering of a conductive metal
  • the metal for sputtering includes aluminum, silver, One of copper, molybdenum, tin, zinc, gold, titanium, and antimony.
  • the material used to form the first conductive layer 151 and the second conductive layer 153 is a metal material commonly used in semiconductor manufacturing.
  • the conductive metal alloy may be formed by a sputtering process to form the first conductive layer 151, the second conductive layer 153, and the metal alloy.
  • the components may include two or more of aluminum, silver, copper, molybdenum, tin, zinc, gold, titanium, ruthenium, and the like.
  • the conductive metal oxide may be formed by a sputtering process to form the first conductive layer 151, the second conductive layer 153, and the metal oxide.
  • the metal oxide may be included, and a combination of plural kinds may also be included.
  • the dielectric layer 152 is formed by an organic material using a physical vapor deposition process.
  • the dielectric layer 152 can also be one of chemical vapor deposition, evaporation, sputtering, and liquid deposition. Process formation.
  • the dielectric layer 152 is formed of an inorganic material by one of physical vapor deposition, chemical vapor deposition, evaporation, sputtering, or liquid deposition.
  • the passivation layer 14 may be formed of one of physical material or inorganic material by physical vapor deposition, chemical vapor deposition, evaporation, sputtering, or liquid deposition, and the passivation layer 14 may be formed only by one layer or organic material or inorganic. The material is formed into a multilayer stack to form a passivation layer 14.
  • the above organic materials include one of polyethylene terephthalate (abbreviation: PET), polyethylene (abbreviation: PE), and polyethylene naphthalate (abbreviation: PEN).
  • PET polyethylene terephthalate
  • PE polyethylene
  • PEN polyethylene naphthalate
  • a plurality of combinations may be employed; the inorganic material includes one of silicon oxide and silicon nitride, or a combination of the two.
  • the pressure touch sensing structure After the pressure touch sensing structure obtains the horizontal and vertical coordinates of the touch position on the touch panel 10, the position change in the thickness direction of the touch panel 10, and the touch pressure of the touch position, the information is transmitted to the read.
  • the chip, the read chip is passed to the motherboard, and the motherboard transmits the information to the processor for processing, and then transmits it to the display screen for corresponding display on the display screen.
  • the pressure sensing structure also includes a first conductive layer 151, a dielectric layer 152, and a second conductive layer 153, with respect to the first embodiment.
  • the conductive layer 151, the dielectric layer 152, and the second conductive layer 153 are sequentially stacked to form a pressure sensing layer 15'.
  • the pressure sensing layer 15' in this embodiment is disposed between the OLED layer 13 and the passivation layer 14, the substrate 11, the TFT layer 12, the OLED layer 13, and the pressure sensing layer 15'. And the passivation layer 14 is laminated in this order.
  • the pressure sensing in the second embodiment is specifically as follows;
  • the single point capacitance value between the first conductive layer 151 and the second conductive layer 153 is C1;
  • the capacitance between the force applying member 20 and the second conductive layer 153 is C3, between the first conductive layer 151 and the second conductive layer 153.
  • the capacitance of the capacitor is C2. Therefore, the capacitance of the single point at the position of the urging member 20 is C2+C3, and the capacitance of the single conductive layer 151 is 1/C2+1/C3.
  • the values of C2 and C3 follow the capacitance formula:
  • dielectric coefficient, which changes with the material of the dielectric layer 152
  • the force exerted by the area in turn, the force value of the pressure sensing structure.
  • the pressure sensing structure includes a first conductive layer 151, a dielectric layer 152, and a second conductive layer 153 with respect to the first and second embodiments.
  • the substrate 11, the first conductive layer 151, the TFT layer 12, the OLED layer 13, the second conductive layer 153, and the passivation layer 14 are sequentially stacked, and the dielectric layer is laminated.
  • 152 is formed on the TFT layer 12 or the OLED layer 13.
  • the TFT layer 12 and the OLED layer 13 are sequentially formed on the first conductive layer 151.
  • the TFT layer 12 or the OLED layer 13 there is a one-step process for the organic material.
  • the inorganic material is formed into a dielectric layer 152 by one of physical vapor deposition, chemical vapor deposition, evaporation, sputtering, or liquid deposition, and the dielectric layer 152 is formed in the TFT layer 12 or the OLED layer 13.
  • the second conductive layer 153 is formed on the OLED layer 13, and finally the passivation layer 14 is formed on the second conductive layer 153.
  • the dielectric layer 152 in this embodiment belongs to the TFT layer 12 or the OLED layer 13 and may be located on the side of the TFT layer 12 adjacent to the first conductive layer 151, in contact with the first conductive layer 151, or in the OLED layer 13.
  • the side surface adjacent to the second conductive layer 153 may be in contact with the second conductive layer 153 or may not be in contact with the first conductive layer 151 and the second conductive layer 153.
  • the dielectric layer 152 in this embodiment may form a capacitance between the first conductive layer 151 and the second conductive layer 153.
  • FIG. 6 and FIG. 4 the process description of the mechanism of pressure sensing on the pressure sensing structure in the first and second embodiments is as shown in FIG. 6.
  • the pressure sensing in the third embodiment is specifically as follows;
  • the single point capacitance value between the first conductive layer 151 and the second conductive layer 153 is C1;
  • the capacitance between the force applying member 20 and the second conductive layer 153 is C3, between the first conductive layer 151 and the second conductive layer 153.
  • the capacitance of the capacitor is C2. Therefore, the capacitance of the single point at the position of the urging member 20 is C2+C3, and the capacitance of the single conductive layer 151 is 1/C2+1/C3.
  • the values of C2 and C3 follow the capacitance formula:
  • dielectric coefficient, which changes with the material of the dielectric layer 152
  • the force exerted by the area in turn, the force value of the pressure sensing structure.
  • the touch pressure determination method using the pressure touch sensing structure includes the following steps:
  • the touch pressure applied by the urging member 20 is obtained.
  • the position change in the direction of the touch pressure can be obtained, that is, the position change in the thickness direction of the touch panel 10 can be obtained.
  • touch pressure determination method may further include the following steps:

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Abstract

Provided are a touch-control panel, and a pressure touch-control sensing structure and a touch-control pressure determination method therefor. The touch-control panel (10) comprises a substrate (11), a TFT layer (12), an OLED layer (13) and a passivation layer (14) that are sequentially distributed in a laminated manner. The pressure touch-control sensing structure comprises a pressure sensing structure (15). The pressure sensing structure (15) comprises a first conductive layer (151), a dielectric layer (152) and a second conductive layer (153) that are sequentially distributed in a laminated manner. The first conductive layer (151), the dielectric layer (152) and the second conductive layer (153) are sequentially distributed in a region located between the substrate (11) and the passivation layer (14). When the passivation layer (14) is pressed, according to a change in the capacitance between the first conductive layer (151) and the second conductive layer (153) and a change in the capacitance between the second conductive layer (153) and a force application member (20) on the passivation layer (14), a touch-control pressure applied by the force application member (20) is obtained. The pressure sensing structure (15) can be entirely distributed on the touch-control panel (10), and can independently form a capacitance signal in a touch-control area, such that each location can sense a touch-control pressure during touch control.

Description

触控面板及其压力触控传感结构和触控压力判断方法Touch panel and pressure touch sensing structure thereof and touch pressure judging method 技术领域Technical field
本发明涉及触控领域,更具体地说,涉及一种触控面板及其压力触控传感结构和触控压力判断方法。The present invention relates to the field of touch, and more particularly to a touch panel and a pressure touch sensing structure thereof and a touch pressure judging method.
背景技术Background technique
相关技术中的二维触控应用于触控面板上的功能已发展多年,为适应消费产品新的需求,美国苹果公司提出第三维度触控概念,即为二维触控功能加上压力感测。The function of the two-dimensional touch applied to the touch panel in the related art has been developed for many years. In order to meet the new demand of the consumer product, the American company proposed a third-dimensional touch concept, which adds pressure to the two-dimensional touch function. Measurement.
第三维度触控主要原理是采用隔层设计,将压力感测组件安装在不同层基板上,当表面承受按压力道时,可透过内部光学胶(OCA)的胶材间隙变化,得知按压力量大小及位置,改善荧幕边缘可能反应不够精准灵活的缺点,并具备温度补偿功能,可抵消温度变化对感测结果产生的影响。The main principle of the third dimension touch is to use a spacer design to mount the pressure sensing component on different layers of substrates. When the surface is subjected to the pressure channel, the gap between the adhesives of the internal optical adhesive (OCA) can be changed. Pressing the size and position of the force, improving the shortcomings of the screen edge may not be accurate and flexible, and with temperature compensation, can offset the impact of temperature changes on the sensing results.
上述方法存在以下问题: The above method has the following problems:
1.     受限于压力感测机构,使产品机构设计较为复杂,产品整体无法薄化。 1. Limited by the pressure sensing mechanism, the design of the product organization is more complicated, and the product as a whole cannot be thinned.
2.     无法同时感测显示屏上的各点压力。 2. It is not possible to sense the pressure at each point on the display at the same time.
3.     无法应用于软性面板,来实现可绕的特性。 3. Cannot be applied to soft panels to achieve wrapable features.
其压力感测为外围四点的感测方式,若进行异形面板之设计,将使感测的精准度大大降低。The pressure sensing is a four-point sensing method. If the design of the shaped panel is performed, the accuracy of the sensing will be greatly reduced.
技术问题technical problem
本发明要解决的技术问题在于,提供一种能感测触控压力大小的触控面板及其压力触控传感结构和触控压力判断方法。The technical problem to be solved by the present invention is to provide a touch panel capable of sensing the touch pressure and a pressure touch sensing structure thereof and a touch pressure judging method.
技术解决方案Technical solution
本发明解决其技术问题所采用的技术方案是:构造一种触控面板的压力触控传感结构,所述触控面板包括依次层叠分布的基材、TFT层、OLED层、以及钝化层,所述压力触控传感结构包括压力感应结构;The technical solution adopted by the present invention to solve the technical problem is to construct a pressure touch sensing structure of a touch panel, which comprises a substrate, a TFT layer, an OLED layer, and a passivation layer which are sequentially stacked and distributed. The pressure touch sensing structure includes a pressure sensing structure;
所述压力感应结构包括依次层叠分布的第一导电层、介电质层、以及第二导电层;The pressure sensing structure includes a first conductive layer, a dielectric layer, and a second conductive layer which are sequentially stacked and distributed;
所述第一导电层、介电质层、以及第二导电层依顺序分布在位于所述基材和所述钝化层之间的区间;The first conductive layer, the dielectric layer, and the second conductive layer are sequentially disposed in a section between the substrate and the passivation layer;
在所述钝化层受压时,根据所述第一导电层、第二导电层之间的电容变化以及所述第二导电层到所述钝化层上的施力件之间的电容变化,得出所述施力件施加的触控压力。When the passivation layer is pressed, according to a change in capacitance between the first conductive layer and the second conductive layer and a change in capacitance between the second conductive layer and a biasing member on the passivation layer The touch pressure applied by the force applying member is obtained.
优选地,所述第一导电层、介电质层、以及第二导电层依次层叠设置,形成所述压力感应层,所述基材、压力感应层、TFT层、OLED层、以及钝化层依次层叠设置。Preferably, the first conductive layer, the dielectric layer, and the second conductive layer are sequentially stacked to form the pressure sensing layer, the substrate, the pressure sensing layer, the TFT layer, the OLED layer, and the passivation layer Stack settings in turn.
优选地,所述第一导电层、介电质层、以及第二导电层依次层叠设置,形成所述压力感应层;所述基材、TFT层、OLED层、压力感应层、以及钝化层依次层叠设置。Preferably, the first conductive layer, the dielectric layer, and the second conductive layer are sequentially stacked to form the pressure sensing layer; the substrate, the TFT layer, the OLED layer, the pressure sensing layer, and the passivation layer Stack settings in turn.
所述基材、第一导电层、TFT层、OLED层、第二导电层、以及钝化层依次层叠设置,所述介电质层形成于所述TFT层或OLED层。 The substrate, the first conductive layer, the TFT layer, the OLED layer, the second conductive layer, and the passivation layer are sequentially stacked, and the dielectric layer is formed on the TFT layer or the OLED layer.
优选地,所述第一导电层由可导电的金属、金属合金、金属氧化物中的至少一种采用溅镀形成;Preferably, the first conductive layer is formed by sputtering using at least one of an electrically conductive metal, a metal alloy, and a metal oxide;
所述第二导电层由可导电的金属、金属合金、金属氧化物中的至少一种采用溅镀形成。The second conductive layer is formed by sputtering using at least one of an electrically conductive metal, a metal alloy, and a metal oxide.
优选地,所述金属包括铝、银、铜、钼、锡、锌、金、钛、钕中的一种。Preferably, the metal comprises one of aluminum, silver, copper, molybdenum, tin, zinc, gold, titanium, and antimony.
优选地,所述金属氧化物包括氧化铟锡、铟氧化锌中的至少一种。Preferably, the metal oxide comprises at least one of indium tin oxide and indium zinc oxide.
优选地,所述介电质层由有机材料采用物理气相沉积、化学气相沉积,蒸镀、溅镀、液相沉积中的一种形成;或,Preferably, the dielectric layer is formed of one of physical vapor deposition, chemical vapor deposition, evaporation, sputtering, and liquid deposition of an organic material; or
所述介电质层由无机材料采用物理气相沉积、化学气相沉积,蒸镀、溅镀、液相沉积中的一种形成。The dielectric layer is formed of one of physical material deposition, chemical vapor deposition, evaporation, sputtering, and liquid deposition from an inorganic material.
优选地,所述钝化层包括一层或由多层形成,且每层由有机材料或无机材料采用物理气相沉积、化学气相沉积,蒸镀、溅镀、液相沉积中的一种形成。Preferably, the passivation layer comprises one layer or is formed of a plurality of layers, and each layer is formed of one of physical material or inorganic material by physical vapor deposition, chemical vapor deposition, evaporation, sputtering, liquid deposition.
优选地,所述有机材料包括聚对苯二甲酸乙二醇酯、聚乙烯、聚萘二甲酸乙二醇酯中的至少一种。Preferably, the organic material comprises at least one of polyethylene terephthalate, polyethylene, and polyethylene naphthalate.
优选地,所述无机材料包括氧化硅、氮化硅中的至少一种。Preferably, the inorganic material comprises at least one of silicon oxide and silicon nitride.
优选地,所述基材为玻璃基板,或,聚对苯二甲酸乙二醇酯、聚萘二甲酸乙二醇酯、聚丁二酸乙二醇酯、聚酰亚胺、纤维增强复合材料中的其中一种材质形成的基材。Preferably, the substrate is a glass substrate, or polyethylene terephthalate, polyethylene naphthalate, polyethylene succinate, polyimide, fiber reinforced composite A substrate formed from one of the materials.
一种触控面板,包括所述的压力触控传感结构。A touch panel includes the pressure touch sensing structure.
优选地,所述触控面板为可弯曲的柔性触控面板。Preferably, the touch panel is a flexible flexible touch panel.
优选地,所述触控面板还包括分别与所述第一导电层、第二导电层电性连接的处理器,所述处理器获取电容信号,并计算得出触控压力。Preferably, the touch panel further includes a processor electrically connected to the first conductive layer and the second conductive layer, respectively, the processor acquires a capacitance signal, and calculates a touch pressure.
一种触控压力判断方法,采用所述的压力触控传感结构,所述触控压力判断方法包括:A touch pressure sensing method is adopted, and the touch pressure sensing method includes:
对所述钝化层外侧触控;Touching the outside of the passivation layer;
获得触控前后所述第一导电层、第二导电层之间的电容变化以及所述第二导电层到触控位置上的施力件之间的电容变化;Obtaining a change in capacitance between the first conductive layer and the second conductive layer before and after the touch and a change in capacitance between the second conductive layer and the force applying member on the touch position;
根据电容变化,得出所述施力件施加的触控压力。According to the change of the capacitance, the touch pressure applied by the force applying member is obtained.
优选地,还包括以下步骤:Preferably, the method further comprises the steps of:
根据触控位置在所述第一导电层、第二导电层上对应的感应点,判断受压位置在触控面板上的坐标位置。Determining a coordinate position of the pressed position on the touch panel according to the corresponding sensing point on the first conductive layer and the second conductive layer of the touch position.
有益效果Beneficial effect
实施本发明的触控面板及其压力触控传感结构和触控压力判断方法,具有以下有益效果:本发明实施例中的触控面板及其压力触控传感结构在钝化层被外部触控受压时,根据第一导电层、第二导电层之间的电容变化以及第二导电层到钝化层上的施力件之间的电容变化,通过相应的计算即可得出施力件施加的触控压力。The touch panel and the pressure touch sensing structure and the touch pressure determining method of the present invention have the following beneficial effects: the touch panel and the pressure touch sensing structure thereof in the embodiment of the present invention are externally disposed on the passivation layer. When the touch is pressed, according to the change of the capacitance between the first conductive layer and the second conductive layer and the change of the capacitance between the second conductive layer and the force applying member on the passivation layer, the corresponding calculation can be used to obtain the application. The touch pressure applied by the force member.
同时,还可根据触控时触发到第一导电层、第二导电层的感应点位置,得出触控位置在触控面板上的坐标,从而能通过触控能实现三个维度的感应。At the same time, according to the position of the sensing point triggered by the touch to the first conductive layer and the second conductive layer, the coordinates of the touch position on the touch panel can be obtained, so that three dimensions can be sensed by the touch.
进一步地,压力感应结构可以整面分布在触控面板上,且能在触控所在区域单独的形成电容信号,让硬质触控面板和柔性触控面板上的每个位置均能在触控时感应到触控压力。Further, the pressure sensing structure can be distributed on the touch panel over the entire surface, and the capacitance signal can be separately formed in the touch area, so that each position on the hard touch panel and the flexible touch panel can be touched. The touch pressure is sensed.
附图说明DRAWINGS
下面将结合附图及实施例对本发明作进一步说明,附图中:The present invention will be further described below in conjunction with the accompanying drawings and embodiments, in which:
图1是本发明第一实施例中带有压力触控传感结构的触控面板的剖面结构示意图;1 is a cross-sectional structural view of a touch panel with a pressure touch sensing structure according to a first embodiment of the present invention;
图2是图1中的触控面板在被触控前后的电容示意图;2 is a schematic view showing the capacitance of the touch panel of FIG. 1 before and after being touched;
图3是本发明第二实施例中带有压力触控传感结构的触控面板的剖面结构示意图;3 is a cross-sectional structural view of a touch panel with a pressure touch sensing structure in a second embodiment of the present invention;
图4是图3中的触控面板在被触控前后的电容示意图;4 is a schematic diagram of capacitance of the touch panel of FIG. 3 before and after being touched;
图5是本发明第三实施例中带有压力触控传感结构的触控面板的剖面结构示意图;5 is a cross-sectional structural view of a touch panel with a pressure touch sensing structure according to a third embodiment of the present invention;
图6是图5中的触控面板在被触控前后的电容示意图;6 is a schematic diagram of capacitance of the touch panel of FIG. 5 before and after being touched;
图7是本发明采用压力触控传感结构的触控压力判断方法的流程示意图。FIG. 7 is a schematic flow chart of a touch pressure judging method using a pressure touch sensing structure according to the present invention.
本发明的最佳实施方式BEST MODE FOR CARRYING OUT THE INVENTION
为了对本发明的技术特征、目的和效果有更加清楚的理解,现对照附图详细说明本发明的具体实施方式。For a better understanding of the technical features, objects and effects of the present invention, the embodiments of the present invention are described in detail with reference to the accompanying drawings.
如图1所示,本发明一个优选实施例中的触控面板10包括依次层叠分布的基材11、TFT层12(TFT:Thin Film Transistor,薄膜晶体管)、OLED层13(OLED:Organic Light-Emitting Diode,有机发光二极管)、以及钝化层14,进一步地,触控面板10还包括压力触控传感结构15,压力触控传感结构15包括压力感应结构,压力感应结构包括依次层叠分布的第一导电层151、介电质层152、以及第二导电层153。As shown in FIG. 1 , the touch panel 10 in a preferred embodiment of the present invention includes a substrate 11 , a TFT layer 12 (TFT: Thin Film Transistor), and an OLED layer 13 (OLED: Organic Light-). The touch panel 10 further includes a pressure touch sensing structure 15 including a pressure sensing structure, and the pressure sensing structure includes a stacking structure. The first conductive layer 151, the dielectric layer 152, and the second conductive layer 153.
第一导电层151、介电质层152、以及第二导电层153依顺序分布在位于基材11和钝化层14之间的区间。在钝化层14受压时,根据第一导电层151、第二导电层153之间的电容变化以及第二导电层153到钝化层14上的施力件20之间的电容变化,得出施力件20施加的触控压力。The first conductive layer 151, the dielectric layer 152, and the second conductive layer 153 are sequentially distributed in a section between the substrate 11 and the passivation layer 14. When the passivation layer 14 is pressed, according to the change in capacitance between the first conductive layer 151 and the second conductive layer 153 and the capacitance change between the second conductive layer 153 and the biasing member 20 on the passivation layer 14, The touch pressure applied by the force applying member 20 is released.
通常,基材11为玻璃材质的基板,触控面板10上其他部件可以在玻璃基板上分别形成。Generally, the substrate 11 is a glass substrate, and other components on the touch panel 10 can be formed on the glass substrate.
在其他实施例中,基材11可为由聚对苯二甲酸乙二醇酯(简称:PET)、聚萘二甲酸乙二醇酯(简称:PEN)、聚丁二酸乙二醇酯(简称:PES)、聚酰亚胺(简称:PI)、纤维增强复合材料(简称:FRP)中的其中一种材质形成。In other embodiments, the substrate 11 may be made of polyethylene terephthalate (abbreviation: PET), polyethylene naphthalate (PEN), polyethylene succinate ( Abbreviation: PES), polyimide (abbreviation: PI), fiber reinforced composite material (abbreviation: FRP) formed in one of the materials.
TFT层12、OLED层13的制程可为TFT、OLED通用的制程,满足普通触控面板10及可弯曲的柔性触控面板10即可。The process of the TFT layer 12 and the OLED layer 13 can be a common process of the TFT and the OLED, and the ordinary touch panel 10 and the flexible flexible touch panel 10 can be satisfied.
钝化层14采用有机材料、无机材料等绝缘材料形成,设置在面板的最外层用来保护面板,并承受外界的触控压力。The passivation layer 14 is formed of an insulating material such as an organic material or an inorganic material, and is disposed on the outermost layer of the panel to protect the panel and withstand external touch pressure.
在本发明的第一实施例中,第一导电层151、介电质层152、以及第二导电层153依次层叠设置,形成压力感应层15',第一导电层151、第二导电层153分别由导电材质形成,能进行导电,介电质层152通常由绝缘材料形成,在第一导电层151、第二导电层153之间可以形成电容。In the first embodiment of the present invention, the first conductive layer 151, the dielectric layer 152, and the second conductive layer 153 are sequentially stacked to form a pressure sensing layer 15', and the first conductive layer 151 and the second conductive layer 153 are formed. They are respectively formed of a conductive material and can conduct electricity. The dielectric layer 152 is usually formed of an insulating material, and a capacitance can be formed between the first conductive layer 151 and the second conductive layer 153.
进一步地,触控面板10还包括分别与第一导电层151、第二导电层153电性连接的处理器,处理器获取电容信号,并计算得出触控压力,同时,还可根据触控时触发到第一导电层151、第二导电层153的感应点位置,得出触控位置在触控面板上的横向、纵向的坐标及在触控面板10厚度方向的位置变化,从而能通过触控能实现三个维度的感应。Further, the touch panel 10 further includes a processor electrically connected to the first conductive layer 151 and the second conductive layer 153, respectively, the processor acquires a capacitance signal, and calculates a touch pressure, and at the same time, according to the touch When the position of the sensing point of the first conductive layer 151 and the second conductive layer 153 is triggered, the horizontal and vertical coordinates of the touch position on the touch panel and the position change in the thickness direction of the touch panel 10 are obtained, thereby enabling Touch can achieve three dimensions of sensing.
压力感应结构可以整面分布在触控面板上,且能在触控所在区域单独的形成电容信号,让硬质触控面板和柔性触控面板上的每个位置均能在触控时感应到触控压力。The pressure sensing structure can be distributed on the touch panel and can form a separate capacitive signal in the touch area, so that each position on the hard touch panel and the flexible touch panel can be sensed during touch. Touch pressure.
进一步的,基材11、压力感应层15'、TFT层12、OLED层13、以及钝化层14依次层叠设置,在钝化层14被外部触控受压时,根据第一导电层151、第二导电层153之间的电容变化以及第二导电层153到钝化层14上的施力件20之间的电容变化,得出施力件20施加的触控压力。Further, the substrate 11, the pressure sensing layer 15', the TFT layer 12, the OLED layer 13, and the passivation layer 14 are sequentially stacked, and when the passivation layer 14 is pressed by an external touch, according to the first conductive layer 151, The change in capacitance between the second conductive layer 153 and the change in capacitance between the second conductive layer 153 and the urging member 20 on the passivation layer 14 yield the touch pressure applied by the urging member 20.
如图2所示,压力感应结构的压力传感之机制如下:在钝化层14受外力施压时,借由介电质层152所产生的形变,而造成电容值改变,来进行力的判别。 As shown in FIG. 2, the pressure sensing mechanism of the pressure sensing structure is as follows: when the passivation layer 14 is pressed by an external force, the deformation caused by the dielectric layer 152 causes a change in the capacitance value to perform force. Discrimination.
具体地过程如下,一开始未施以压力时,第一导电层151、第二导电层153之间的单点电容值为C1;Specifically, the process is as follows: when no pressure is applied initially, the single point capacitance value between the first conductive layer 151 and the second conductive layer 153 is C1;
当通过手指或其他施力件20在钝化层14上给予一定压力时,施力件20到第二导电层153之间的电容为C3,第一导电层151到第二导电层153之间的电容为C2,因此,施力件20所在位置的单点之电容值为C2+C3,对第一导电层151的感应点,其单点之电容值为1/C2+1/C3,而C2、C3的数值遵循电容公式为:When a certain pressure is applied to the passivation layer 14 by the finger or other force applying member 20, the capacitance between the force applying member 20 and the second conductive layer 153 is C3, between the first conductive layer 151 and the second conductive layer 153. The capacitance of the capacitor is C2. Therefore, the capacitance of the single point at the position of the urging member 20 is C2+C3, and the capacitance of the single conductive layer 151 is 1/C2+1/C3. The values of C2 and C3 follow the capacitance formula:
              C=εε 0A/d C=εε 0 A/d
其中:among them:
ε:介电质系数,随介电质层152的材料变化而改变 ε: dielectric coefficient, which changes with the material of the dielectric layer 152
ε 0:真空介电质系数 ε 0 : vacuum dielectric coefficient
A:电容面积 A: Capacitance area
d:所夹之介电质的厚度 d: the thickness of the dielectric sandwiched
由原本已知电容面积A及材料之介电质系数ε,及量测到的电容值信号,可以反推介电质层152的厚度改变量Δd,再由力学公式F=kΔd,求得其单位面积所受之力,进而得到对此压力感应结构之受力值。 From the originally known capacitance area A and the dielectric coefficient ε of the material, and the measured capacitance value signal, the thickness change amount Δd of the electric layer 152 can be reversed, and the unit is obtained by the mechanical formula F=kΔd. The force exerted by the area, in turn, the force value of the pressure sensing structure.
另一更精准之方式为对于制作出的压力感应结构,进行所受压力之数据库建立,进而建立出电容值与受力之关系,来进行所受之力量的判别。Another more precise way is to establish a database of pressures for the pressure-sensing structure that is produced, and then establish a relationship between the capacitance value and the force to determine the force received.
进一步地,在本实施例中,第一导电层151由可导电的金属采用溅镀形成,第二导电层153也可由可导电的金属采用溅镀形成,溅镀用的金属包括铝、银、铜、钼、锡、锌、金、钛、钕中的一种。通常,形成第一导电层151、第二导电层153所用的材料为半导体制程上常使用的金属材料。Further, in this embodiment, the first conductive layer 151 is formed by sputtering of an electrically conductive metal, and the second conductive layer 153 is also formed by sputtering of a conductive metal, and the metal for sputtering includes aluminum, silver, One of copper, molybdenum, tin, zinc, gold, titanium, and antimony. Generally, the material used to form the first conductive layer 151 and the second conductive layer 153 is a metal material commonly used in semiconductor manufacturing.
可以理解地,为了让第一导电层151、第二导电层153能导电,还可将可导电的金属合金用溅镀的工艺制作形成第一导电层151、第二导电层153,金属合金的组分可包括铝、银、铜、钼、锡、锌、金、钛、钕等中的两种或多种。It can be understood that, in order to make the first conductive layer 151 and the second conductive layer 153 conductive, the conductive metal alloy may be formed by a sputtering process to form the first conductive layer 151, the second conductive layer 153, and the metal alloy. The components may include two or more of aluminum, silver, copper, molybdenum, tin, zinc, gold, titanium, ruthenium, and the like.
进一步地,为了让第一导电层151、第二导电层153能导电,还可将可导电的金属氧化物采用溅镀的工艺制作形成第一导电层151、第二导电层153,金属氧化物可以包括氧化铟锡、铟氧化锌中的一种,也可包括多种的组合。Further, in order to make the first conductive layer 151 and the second conductive layer 153 conductive, the conductive metal oxide may be formed by a sputtering process to form the first conductive layer 151, the second conductive layer 153, and the metal oxide. One of indium tin oxide and indium zinc oxide may be included, and a combination of plural kinds may also be included.
本实施例中,介电质层152由有机材料采用物理气相沉积工艺形成,当然,可以理解地,介电质层152也可采用化学气相沉积,蒸镀、溅镀、液相沉积中的一种工艺形成。In this embodiment, the dielectric layer 152 is formed by an organic material using a physical vapor deposition process. Of course, it can be understood that the dielectric layer 152 can also be one of chemical vapor deposition, evaporation, sputtering, and liquid deposition. Process formation.
介电质层152由无机材料采用物理气相沉积、化学气相沉积,蒸镀、溅镀、液相沉积中的一种形成。The dielectric layer 152 is formed of an inorganic material by one of physical vapor deposition, chemical vapor deposition, evaporation, sputtering, or liquid deposition.
钝化层14可由有机材料或无机材料采用物理气相沉积、化学气相沉积,蒸镀、溅镀、液相沉积中的一种形成,钝化层14可以只形成一层,也可由有机材料或无机材料形成多层堆叠后形成钝化层14。The passivation layer 14 may be formed of one of physical material or inorganic material by physical vapor deposition, chemical vapor deposition, evaporation, sputtering, or liquid deposition, and the passivation layer 14 may be formed only by one layer or organic material or inorganic. The material is formed into a multilayer stack to form a passivation layer 14.
进一步地,上述的有机材料包括聚对苯二甲酸乙二醇酯(简称:PET)、聚乙烯(简称:PE)、聚萘二甲酸乙二醇酯(简称:PEN)中的一种,也可由多种组合;无机材料包括氧化硅、氮化硅中的一种,也可由这两种组合。Further, the above organic materials include one of polyethylene terephthalate (abbreviation: PET), polyethylene (abbreviation: PE), and polyethylene naphthalate (abbreviation: PEN). A plurality of combinations may be employed; the inorganic material includes one of silicon oxide and silicon nitride, or a combination of the two.
在压力触控传感结构获得触控位置在触控面板10上的横向、纵向的坐标及在触控面板10厚度方向的位置变化、触控位置的触控压力等信息后,传递给读取芯片,读取芯片在传递给主板,主板再将这些信息传递给处理器处理后,传递给显示屏,在显示屏上进行对应的显示。After the pressure touch sensing structure obtains the horizontal and vertical coordinates of the touch position on the touch panel 10, the position change in the thickness direction of the touch panel 10, and the touch pressure of the touch position, the information is transmitted to the read. The chip, the read chip is passed to the motherboard, and the motherboard transmits the information to the processor for processing, and then transmits it to the display screen for corresponding display on the display screen.
如图3所示,在本发明的第二实施例中,相对于上述第一实施例,压力感应结构也是包括第一导电层151、介电质层152、以及第二导电层153,第一导电层151、介电质层152、以及第二导电层153依次层叠设置,形成压力感应层15'。As shown in FIG. 3, in the second embodiment of the present invention, the pressure sensing structure also includes a first conductive layer 151, a dielectric layer 152, and a second conductive layer 153, with respect to the first embodiment. The conductive layer 151, the dielectric layer 152, and the second conductive layer 153 are sequentially stacked to form a pressure sensing layer 15'.
与第一实施例不同的是,本实施例中的压力感应层15'是设置在OLED层13和钝化层14之间,基材11、TFT层12、OLED层13、压力感应层15'、以及钝化层14依次层叠设置。Different from the first embodiment, the pressure sensing layer 15' in this embodiment is disposed between the OLED layer 13 and the passivation layer 14, the substrate 11, the TFT layer 12, the OLED layer 13, and the pressure sensing layer 15'. And the passivation layer 14 is laminated in this order.
在钝化层14受压时,根据第一导电层151、第二导电层153之间的电容变化以及第二导电层153到钝化层14上的施力件20之间的电容变化,得出施力件20施加的触控压力。When the passivation layer 14 is pressed, according to the change in capacitance between the first conductive layer 151 and the second conductive layer 153 and the capacitance change between the second conductive layer 153 and the biasing member 20 on the passivation layer 14, The touch pressure applied by the force applying member 20 is released.
参考图2第一实施例中对压力感应结构的压力传感之机制的过程描述,如图4所示,第二实施例中压力传感具体地过程如下;Referring to the process description of the mechanism of pressure sensing of the pressure sensing structure in the first embodiment of FIG. 2, as shown in FIG. 4, the pressure sensing in the second embodiment is specifically as follows;
一开始未施以压力时,第一导电层151、第二导电层153之间的单点电容值为C1;When no pressure is applied initially, the single point capacitance value between the first conductive layer 151 and the second conductive layer 153 is C1;
当通过手指或其他施力件20在钝化层14上给予一定压力时,施力件20到第二导电层153之间的电容为C3,第一导电层151到第二导电层153之间的电容为C2,因此,施力件20所在位置的单点之电容值为C2+C3,对第一导电层151的感应点,其单点之电容值为1/C2+1/C3,而C2、C3的数值遵循电容公式为:When a certain pressure is applied to the passivation layer 14 by the finger or other force applying member 20, the capacitance between the force applying member 20 and the second conductive layer 153 is C3, between the first conductive layer 151 and the second conductive layer 153. The capacitance of the capacitor is C2. Therefore, the capacitance of the single point at the position of the urging member 20 is C2+C3, and the capacitance of the single conductive layer 151 is 1/C2+1/C3. The values of C2 and C3 follow the capacitance formula:
              C=εε 0A/d C=εε 0 A/d
其中:among them:
ε:介电质系数,随介电质层152的材料变化而改变 ε: dielectric coefficient, which changes with the material of the dielectric layer 152
ε 0:真空介电质系数 ε 0 : vacuum dielectric coefficient
A:电容面积 A: Capacitance area
d:所夹之介电质的厚度 d: the thickness of the dielectric sandwiched
由原本已知电容面积A及材料之介电质系数ε,及量测到的电容值信号,可以反推介电质层152的厚度改变量Δd,再由力学公式F=kΔd,求得其单位面积所受之力,进而得到对此压力感应结构之受力值。From the originally known capacitance area A and the dielectric coefficient ε of the material, and the measured capacitance value signal, the thickness change amount Δd of the electric layer 152 can be reversed, and the unit is obtained by the mechanical formula F=kΔd. The force exerted by the area, in turn, the force value of the pressure sensing structure.
如图5所示,在本发明的第三实施例中,相对于上述第一、第二实施例,压力感应结构包括第一导电层151、介电质层152、以及第二导电层153,与第一、第二实施例中不同的是,基材11、第一导电层151、TFT层12、OLED层13、第二导电层153、以及钝化层14依次层叠设置,介电质层152形成于TFT层12或OLED层13。As shown in FIG. 5, in the third embodiment of the present invention, the pressure sensing structure includes a first conductive layer 151, a dielectric layer 152, and a second conductive layer 153 with respect to the first and second embodiments. Different from the first and second embodiments, the substrate 11, the first conductive layer 151, the TFT layer 12, the OLED layer 13, the second conductive layer 153, and the passivation layer 14 are sequentially stacked, and the dielectric layer is laminated. 152 is formed on the TFT layer 12 or the OLED layer 13.
第一导电层151形成在基材11上后,再依次在第一导电层151上形成TFT层12、OLED层13,在形成TFT层12或OLED层13时,会有一步工艺是将有机材料或无机材料采用物理气相沉积、化学气相沉积,蒸镀、溅镀、液相沉积中的一种形成介电质层152,让介电质层152形成于TFT层12或OLED层13中。After the first conductive layer 151 is formed on the substrate 11, the TFT layer 12 and the OLED layer 13 are sequentially formed on the first conductive layer 151. When the TFT layer 12 or the OLED layer 13 is formed, there is a one-step process for the organic material. Or the inorganic material is formed into a dielectric layer 152 by one of physical vapor deposition, chemical vapor deposition, evaporation, sputtering, or liquid deposition, and the dielectric layer 152 is formed in the TFT layer 12 or the OLED layer 13.
第二导电层153形成于OLED层13上,最后再在第二导电层153上形成钝化层14。The second conductive layer 153 is formed on the OLED layer 13, and finally the passivation layer 14 is formed on the second conductive layer 153.
本实施例中的介电质层152是属于TFT层12或OLED层13,可以位于TFT层12与第一导电层151相邻的侧面,与第一导电层151接触,也可位于OLED层13与第二导电层153相邻的侧面,与第二导电层153接触,也可均不与第一导电层151、第二导电层153接触。The dielectric layer 152 in this embodiment belongs to the TFT layer 12 or the OLED layer 13 and may be located on the side of the TFT layer 12 adjacent to the first conductive layer 151, in contact with the first conductive layer 151, or in the OLED layer 13. The side surface adjacent to the second conductive layer 153 may be in contact with the second conductive layer 153 or may not be in contact with the first conductive layer 151 and the second conductive layer 153.
在触控钝化层14时,本实施例中的介电质层152会在第一导电层151、第二导电层153之间可以形成电容。参考图2、图4对第一、第二实施例中对压力感应结构的压力传感之机制的过程描述,如图6所示,第三实施例中压力传感具体地过程如下;When the passivation layer 14 is touched, the dielectric layer 152 in this embodiment may form a capacitance between the first conductive layer 151 and the second conductive layer 153. Referring to FIG. 2 and FIG. 4, the process description of the mechanism of pressure sensing on the pressure sensing structure in the first and second embodiments is as shown in FIG. 6. The pressure sensing in the third embodiment is specifically as follows;
一开始未施以压力时,第一导电层151、第二导电层153之间的单点电容值为C1;When no pressure is applied initially, the single point capacitance value between the first conductive layer 151 and the second conductive layer 153 is C1;
当通过手指或其他施力件20在钝化层14上给予一定压力时,施力件20到第二导电层153之间的电容为C3,第一导电层151到第二导电层153之间的电容为C2,因此,施力件20所在位置的单点之电容值为C2+C3,对第一导电层151的感应点,其单点之电容值为1/C2+1/C3,而C2、C3的数值遵循电容公式为:When a certain pressure is applied to the passivation layer 14 by the finger or other force applying member 20, the capacitance between the force applying member 20 and the second conductive layer 153 is C3, between the first conductive layer 151 and the second conductive layer 153. The capacitance of the capacitor is C2. Therefore, the capacitance of the single point at the position of the urging member 20 is C2+C3, and the capacitance of the single conductive layer 151 is 1/C2+1/C3. The values of C2 and C3 follow the capacitance formula:
              C=εε 0A/d C=εε 0 A/d
其中:among them:
ε:介电质系数,随介电质层152的材料变化而改变 ε: dielectric coefficient, which changes with the material of the dielectric layer 152
ε 0:真空介电质系数 ε 0 : vacuum dielectric coefficient
A:电容面积 A: Capacitance area
d:所夹之介电质的厚度 d: the thickness of the dielectric sandwiched
由原本已知电容面积A及材料之介电质系数ε,及量测到的电容值信号,可以反推介电质层152的厚度改变量Δd,再由力学公式F=kΔd,求得其单位面积所受之力,进而得到对此压力感应结构之受力值。From the originally known capacitance area A and the dielectric coefficient ε of the material, and the measured capacitance value signal, the thickness change amount Δd of the electric layer 152 can be reversed, and the unit is obtained by the mechanical formula F=kΔd. The force exerted by the area, in turn, the force value of the pressure sensing structure.
如图7所示,进一步地,采用压力触控传感结构的触控压力判断方法包括以下步骤:As shown in FIG. 7, further, the touch pressure determination method using the pressure touch sensing structure includes the following steps:
对钝化层14外侧触控;Touching the outside of the passivation layer 14;
获得触控前后第一导电层151、第二导电层153之间的电容变化以及第二导电层153到触控位置上的施力件20之间的电容变化;Obtaining a change in capacitance between the first conductive layer 151 and the second conductive layer 153 before and after the touch and a change in capacitance between the second conductive layer 153 and the biasing member 20 at the touch position;
根据电容变化,得出施力件20施加的触控压力。According to the change in capacitance, the touch pressure applied by the urging member 20 is obtained.
根据获得的触控压力,可以得出在触控压力方向的位置变化,即可以得出在触控面板10厚度方向的位置变化。According to the obtained touch pressure, the position change in the direction of the touch pressure can be obtained, that is, the position change in the thickness direction of the touch panel 10 can be obtained.
另外,触控压力判断方法还可包括以下步骤:In addition, the touch pressure determination method may further include the following steps:
根据触控位置在第一导电层151、第二导电层153上对应的感应点,判断受压位置在触控面板10上的坐标位置,即还可在判断触控压力的同时,还可获得触控位置在触控面板上横向和纵向的坐标。Determining the coordinate position of the pressed position on the touch panel 10 according to the corresponding sensing point on the first conductive layer 151 and the second conductive layer 153 of the touch position, that is, while determining the touch pressure, The horizontal and vertical coordinates of the touch position on the touch panel.
可以理解地,上述各技术特征可以任意组合使用而不受限制。It will be understood that each of the above technical features may be used in any combination without limitation.
以上所述仅为本发明的实施例,并非因此限制本发明的专利范围,凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换,或直接或间接运用在其他相关的技术领域,均同理包括在本发明的专利保护范围内。The above is only the embodiment of the present invention, and is not intended to limit the scope of the invention, and the equivalent structure or equivalent process transformation of the present invention and the contents of the drawings may be directly or indirectly applied to other related technologies. The fields are all included in the scope of patent protection of the present invention.

Claims (17)

  1. 一种触控面板的压力触控传感结构,其特征在于,所述触控面板(10)包括依次层叠分布的基材(11)、TFT层(12)、OLED层(13)、以及钝化层(14),所述压力触控传感结构(15)包括压力感应结构;A touch touch sensing structure of a touch panel, characterized in that the touch panel (10) comprises a substrate (11), a TFT layer (12), an OLED layer (13), and a blunt layer which are sequentially stacked. The layer (14), the pressure touch sensing structure (15) comprises a pressure sensing structure;
    所述压力感应结构包括依次层叠分布的第一导电层(151)、介电质层(152)、以及第二导电层(153);The pressure sensing structure includes a first conductive layer (151), a dielectric layer (152), and a second conductive layer (153) which are sequentially stacked and distributed;
    所述第一导电层(151)、介电质层(152)、以及第二导电层(153)依顺序分布在位于所述基材(11)和所述钝化层(14)之间的区间;The first conductive layer (151), the dielectric layer (152), and the second conductive layer (153) are sequentially disposed between the substrate (11) and the passivation layer (14). Interval
    在所述钝化层(14)受压时,根据所述第一导电层(151)、第二导电层(153)之间的电容变化以及所述第二导电层(153)到所述钝化层(14)上的施力件(20)之间的电容变化,得出所述施力件(20)施加的触控压力。When the passivation layer (14) is pressed, according to a change in capacitance between the first conductive layer (151) and the second conductive layer (153) and the second conductive layer (153) to the blunt The change in capacitance between the force applying members (20) on the layer (14) results in the touch pressure applied by the force applying member (20).
  2. 根据权利要求1所述的压力触控传感结构,其特征在于,所述第一导电层(151)、介电质层(152)、以及第二导电层(153)依次层叠设置,形成所述压力感应层(15');The pressure touch sensing structure according to claim 1, wherein the first conductive layer (151), the dielectric layer (152), and the second conductive layer (153) are sequentially stacked to form a structure. Pressure sensing layer (15');
    所述基材(11)、压力感应层(15')、TFT层(12)、OLED层(13)、以及钝化层(14)依次层叠设置。 The substrate (11), the pressure sensing layer (15'), the TFT layer (12), the OLED layer (13), and the passivation layer (14) are sequentially stacked.
  3. 根据权利要求1所述的压力触控传感结构,其特征在于,所述第一导电层(151)、介电质层(152)、以及第二导电层(153)依次层叠设置,形成所述压力感应层(15');The pressure touch sensing structure according to claim 1, wherein the first conductive layer (151), the dielectric layer (152), and the second conductive layer (153) are sequentially stacked to form a structure. Pressure sensing layer (15');
    所述基材(11)、TFT层(12)、OLED层(13)、压力感应层(15')、以及钝化层(14)依次层叠设置。The substrate (11), the TFT layer (12), the OLED layer (13), the pressure sensing layer (15'), and the passivation layer (14) are laminated in this order.
  4. 根据权利要求1所述的压力触控传感结构,其特征在于,所述基材(11)、第一导电层(151)、TFT层(12)、OLED层(13)、第二导电层(153)、以及钝化层(14)依次层叠设置,所述介电质层(152)形成于所述TFT层(12)或OLED层(13)。The pressure touch sensing structure according to claim 1, wherein the substrate (11), the first conductive layer (151), the TFT layer (12), the OLED layer (13), and the second conductive layer are provided. (153), and a passivation layer (14) are sequentially stacked, and the dielectric layer (152) is formed on the TFT layer (12) or the OLED layer (13).
  5. 根据权利要求1至4任一项所述的压力触控传感结构,其特征在于,所述第一导电层(151)由可导电的金属、金属合金、金属氧化物中的至少一种采用溅镀形成;The pressure touch sensing structure according to any one of claims 1 to 4, wherein the first conductive layer (151) is made of at least one of a conductive metal, a metal alloy, and a metal oxide. Sputtering formation;
    所述第二导电层(153)由可导电的金属、金属合金、金属氧化物中的至少一种采用溅镀形成。The second conductive layer (153) is formed by sputtering using at least one of an electrically conductive metal, a metal alloy, and a metal oxide.
  6. 根据权利要求5所述的压力触控传感结构,其特征在于,所述金属包括铝、银、铜、钼、锡、锌、金、钛、钕中的一种。The pressure touch sensing structure according to claim 5, wherein the metal comprises one of aluminum, silver, copper, molybdenum, tin, zinc, gold, titanium, and tantalum.
  7. 根据权利要求5所述的压力触控传感结构,其特征在于,所述金属氧化物包括氧化铟锡、铟氧化锌中的至少一种。The pressure touch sensing structure according to claim 5, wherein the metal oxide comprises at least one of indium tin oxide and indium zinc oxide.
  8. 根据权利要求1所述的压力触控传感结构,其特征在于,所述介电质层(152)由有机材料采用物理气相沉积、化学气相沉积,蒸镀、溅镀、液相沉积中的一种形成;或,The pressure touch sensing structure according to claim 1, wherein the dielectric layer (152) is made of organic materials by physical vapor deposition, chemical vapor deposition, evaporation, sputtering, liquid deposition. a form; or,
    所述介电质层(152)由无机材料采用物理气相沉积、化学气相沉积,蒸镀、溅镀、液相沉积中的一种形成。The dielectric layer (152) is formed of an inorganic material by one of physical vapor deposition, chemical vapor deposition, evaporation, sputtering, and liquid deposition.
  9. 根据权利要求1所述的压力触控传感结构,其特征在于,所述钝化层(14)包括一层或由多层形成,且每层由有机材料或无机材料采用物理气相沉积、化学气相沉积,蒸镀、溅镀、液相沉积中的一种形成。The pressure touch sensing structure according to claim 1, wherein the passivation layer (14) comprises one layer or is formed of a plurality of layers, and each layer is formed by physical vapor deposition or chemistry from an organic material or an inorganic material. One of vapor deposition, evaporation, sputtering, and liquid deposition.
  10. 根据权利要求8或9所述的压力触控传感结构,其特征在于,所述有机材料包括聚对苯二甲酸乙二醇酯、聚乙烯、聚萘二甲酸乙二醇酯中的至少一种。The pressure touch sensing structure according to claim 8 or 9, wherein the organic material comprises at least one of polyethylene terephthalate, polyethylene, and polyethylene naphthalate. Kind.
  11. 根据权利要求8或9所述的压力触控传感结构,其特征在于,所述无机材料包括氧化硅、氮化硅中的至少一种。The pressure touch sensing structure according to claim 8 or 9, wherein the inorganic material comprises at least one of silicon oxide and silicon nitride.
  12. 根据权利要求1至4、8、9任一项所述的压力触控传感结构,其特征在于,所述基材(11)为玻璃基板,或,聚对苯二甲酸乙二醇酯、聚萘二甲酸乙二醇酯、聚丁二酸乙二醇酯、聚酰亚胺、纤维增强复合材料中的其中一种材质形成的基材(11)。The pressure touch sensing structure according to any one of claims 1 to 4, 8, or 9, wherein the substrate (11) is a glass substrate, or polyethylene terephthalate, A substrate (11) formed of one of polyethylene naphthalate, polyethylene succinate, polyimide, and fiber reinforced composite.
  13. 一种触控面板,其特征在于,包括权利要求1至12任一项所述的压力触控传感结构。A touch panel comprising the pressure touch sensing structure according to any one of claims 1 to 12.
  14. 根据权利要求13所述的触控面板,其特征在于,所述触控面板(10)为可弯曲的柔性触控面板(10)。The touch panel according to claim 13, wherein the touch panel (10) is a flexible flexible touch panel (10).
  15. 根据权利要求13或14所述的触控面板,其特征在于,所述触控面板(10)还包括分别与所述第一导电层(151)、第二导电层(153)电性连接的处理器,所述处理器获取电容信号,并计算得出触控压力。The touch panel according to claim 13 or 14, wherein the touch panel (10) further comprises an electrical connection with the first conductive layer (151) and the second conductive layer (153), respectively. a processor that acquires a capacitive signal and calculates a touch pressure.
  16. 一种触控压力判断方法,其特征在于,采用权利要求1至12任一项所述的压力触控传感结构,所述触控压力判断方法包括:A touch pressure sensing method according to any one of claims 1 to 12, wherein the touch pressure determining method comprises:
    对所述钝化层(14)外侧触控;Touching the outside of the passivation layer (14);
    获得触控前后所述第一导电层(151)、第二导电层(153)之间的电容变化以及所述第二导电层(153)到触控位置上的施力件(20)之间的电容变化;Obtaining a change in capacitance between the first conductive layer (151) and the second conductive layer (153) before and after the touch, and between the second conductive layer (153) to the force applying member (20) at the touch position Capacitance change;
    根据电容变化,得出所述施力件(20)施加的触控压力。According to the change of the capacitance, the touch pressure applied by the force applying member (20) is obtained.
  17. 根据权利要求16所述的触控压力判断方法,其特征在于,还包括以下步骤:The touch pressure judging method according to claim 16, further comprising the steps of:
    根据触控位置在所述第一导电层(151)、第二导电层(153)上对应的感应点,判断受压位置在触控面板(10)上的坐标位置。The coordinate position of the pressed position on the touch panel (10) is determined according to the corresponding sensing points on the first conductive layer (151) and the second conductive layer (153) of the touch position.
PCT/CN2017/115498 2017-12-11 2017-12-11 Touch-control panel, and pressure touch-control sensing structure and touch-control pressure determination method therefor WO2019113754A1 (en)

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