WO2019054450A1 - Method for producing dialkyl dihydronaphthalene derivative - Google Patents

Method for producing dialkyl dihydronaphthalene derivative Download PDF

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WO2019054450A1
WO2019054450A1 PCT/JP2018/034020 JP2018034020W WO2019054450A1 WO 2019054450 A1 WO2019054450 A1 WO 2019054450A1 JP 2018034020 W JP2018034020 W JP 2018034020W WO 2019054450 A1 WO2019054450 A1 WO 2019054450A1
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group
formula
alkyl group
compound
compound represented
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PCT/JP2018/034020
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French (fr)
Japanese (ja)
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鈴木 雄太
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持田製薬株式会社
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Priority to JP2019542289A priority Critical patent/JP7134982B2/en
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C1/00Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon
    • C07C1/32Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon starting from compounds containing hetero-atoms other than or in addition to oxygen or halogen
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C13/00Cyclic hydrocarbons containing rings other than, or in addition to, six-membered aromatic rings
    • C07C13/28Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof
    • C07C13/32Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings
    • C07C13/47Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings with a bicyclo ring system containing ten carbon atoms
    • C07C13/48Completely or partially hydrogenated naphthalenes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63Esters of sulfonic acids
    • C07C309/72Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/73Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings

Definitions

  • the present invention provides a 1,1-dialkyl-1,2,3,4-tetrahydronaphthalen-2-yl sulfonate derivative represented by the formula (TH-2), and a formula (I) via the formula (TH-2)
  • the present invention relates to a method for producing a 1,1-dialkyl-1,2-dihydronaphthalene derivative represented by
  • the 1-amino-2-hydroxy-4,4-dialkyl-1,2,3,4-tetrahydronaphthalene represented by the formula (i) is a tropomyosin receptor kinase A (TrkA) represented by the formula (X) It is a compound used when producing a compound having an inhibitory action.
  • the compound of formula (I) can be produced from the compound of formula (I) by an oxidation reaction (epoxidation) and subsequent hydroamination reaction, so the compound of formula (I) is a compound of formula (X) It is an intermediate for synthesis.
  • One of the compounds represented by the formula (I), 1,1-dimethyl-1,2-dihydronaphthalene (formula (I-a-1)), can be prepared by combining various prior art documents. It can manufacture by the manufacturing method shown to Scheme 2).
  • the compound of the formula (I) can be produced according to the method for producing the compound of the above formula (I-a-1) represented by the above (Scheme 2).
  • steps that may cause safety problems in large-scale synthesis or industrial production ⁇ step 2> dialkylation reaction at low temperature, ⁇ step 4> benzylic An oxidation reaction using peroxide is included. Therefore, when considering the large scale synthesis or industrial production of the compound of the formula (I), it is required to find a novel production method different from the above production method.
  • Non-patent Document 6 As a 1,1-dialkyl-1,2,3,4-tetrahydronaphthalen-2-yl sulfonate derivative, 7-methoxy-1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4- Although methyl benzene sulfonate is known (Non-patent Document 6), its use as a compound for producing a derivative represented by formula (I) is not known.
  • An object of the present invention is to provide a novel production method for producing a compound represented by formula (I) without using the production method of (Scheme 2).
  • a 1,1-dialkyl-1,2,3,4-tetrahydronaphthalen-2-yl sulfonate derivative represented by the following formula (TH-2) is found, and the formula (TH-2) is used.
  • a method for producing a 1,1-dialkyl-1,2-dihydronaphthalene derivative represented by the following formula (I) in a high yield, a short process, and easily, and the present invention is completed based on this finding. It came to (In formula (I) or formula (TH-2), the definitions of p, E, R 1 , R 2a and R 2b are the same as the definitions in the first aspect of the present invention described later.)
  • the present invention relates to a sulfonate derivative represented by the formula (TH-2) as an intermediate for synthesizing a compound having a TrkA inhibitory activity represented by the formula (X), and a compound represented by the formula (TH-2)
  • the present invention relates to a process for producing a 1,1-dialkyl-1,2-dihydronaphthalene derivative represented by the formula (I).
  • the present invention can provide an industrially advantageous production method with high yield, short process, and easy, and has high industrial utility.
  • the present invention provides a sulfonate derivative represented by the following formula (TH-2) shown in the following embodiment, and a 1,1-dialkyl-1 represented by the following formula (I) via the formula (TH-2) ,
  • TH-2 sulfonate derivative
  • I 1,1-dialkyl-1
  • exemplary embodiments of the present invention may be as follows [1] to [11].
  • a first aspect of the present invention is a compound represented by the following formula (TH-2): [In the formula (TH-2), p is an integer of 0 to 4; Each R 1 independently represents a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1-6 alkyl group, a cyanated C 1-6 alkyl group, a halogenated C 1 ⁇ 6 alkoxy group, C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group, a mono / di C 2 ⁇ 7 alkanoylamino group, carboxamido group, or a group selected from C 1 ⁇ 6 alkoxycarbonyl group; R 2a And R 2b is each independently a C 1-6 alkyl group; And E is a group selected from p-tol
  • p is preferably an integer of 0 to 3; more preferably an integer of 0 to 2; still more preferably Is an integer of 0.
  • R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy C 1-6 alkyl group, a carboxamide group, or a C 1 ⁇ 6 alkoxycarbonyl group; more preferably, a halogen atom, or a C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group; more preferably, a fluorine atom, a bromine atom, or methoxy It is a methyl group.
  • R 2a and / or R 2b is preferably a methyl group.
  • E is a p-toluenesulfonyl group, a benzenesulfonyl group, or a methanesulfonyl group; more preferably, p -Toluenesulfonyl group.
  • p is an integer of 0; R 2a and / or R 2b is a methyl group; E is And p-toluenesulfonyl group.
  • a second aspect of the present invention is a compound represented by the following formula (TH-2a):
  • R 1a and R 1b are each independently a hydrogen atom, a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1- 6 alkyl group, cyanated C 1 ⁇ 6 alkyl group, a halogenated C 1 ⁇ 6 alkoxy group, C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group, mono / di C 2 ⁇ 7 alkanoylamino group, carboxamido group, or a C A group selected from 1 to 6 alkoxycarbonyl groups;
  • R 2a and R 2b are each independently a C 1-6 alkyl group;
  • E is a group selected from p-toluenesulfonyl group, benzenesulfonyl group, p-nitrobenzenes
  • R 2a and / or R 2b is preferably a methyl group.
  • E is p-toluenesulfonyl group, benzenesulfonyl group or methanesulfonyl group; more preferably p -Toluenesulfonyl group.
  • R 2a and / or R 2b is a methyl group
  • E is a p-toluenesulfonyl group.
  • R 1a and R 1b are a hydrogen atom; and R 2a and / or R 2b are , A methyl group; E is a p-toluenesulfonyl group.
  • a third aspect of the present invention is a method as a preferable compound in the compound of the formula (TH-2) of the aspect [1] or the compound of the formula (TH-2a) of the aspect [2] below
  • a more preferable compound is 1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4-methylbenzenesulfonate, or a salt thereof, or They are solvates.
  • the fourth aspect of the present invention is a compound of the following formula (I): [In the formula (I), p is an integer of 0 to 4; Each R 1 independently represents a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1-6 alkyl group, a cyanated C 1-6 alkyl group, a halogenated C 1 ⁇ 6 alkoxy group, C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group, a mono / di C 2 ⁇ 7 alkanoylamino group, carboxamido group, or a group selected from C 1 ⁇ 6 alkoxycarbonyl group; R 2a And R 2b are each independently a C 1-6 alkyl group], a method of producing a compound represented by Formula (TH-1): [In the formula (TH-1), p, R 1 , R 2a and R 2b are the same as the groups defined in
  • p is preferably an integer of 0 to 3; more preferably an integer of 0 to 2; Preferably, it is an integer of 0.
  • R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy C 1-6 It is an alkyl group, a carboxamido group, or a C 1-6 alkoxycarbonyl group; more preferably a halogen atom or a C 1-6 alkoxy C 1-6 alkyl group; still more preferably a fluorine atom, a bromine atom, or It is a methoxymethyl group.
  • R 1 s may be the same or different.
  • R 2a and / or R 2b is preferably a methyl group.
  • E is preferably p-toluenesulfonyl group, benzenesulfonyl group, or methanesulfonyl group; more preferably p-toluenesulfonyl group.
  • the sulfonylating agent is p-toluenesulfonyl chloride, p-toluenesulfone Acid anhydride, benzenesulfonyl chloride, p-nitrobenzenesulfonyl chloride, 2,4-dinitrobenzenesulfonyl chloride, methanesulfonyl chloride, or trifluoromethanesulfonic acid anhydride; more preferably p-toluenesulfonyl chloride, p-toluene Sulfonic acid anhydride, benzene sulfonyl chloride or methane sulfonyl chloride; more preferably p-toluene sulfonyl chloride or p-toluene sulfonic acid
  • the basic solvent is pyridine, triethylamine, N, N-diisopropylethylamine Or 2,6-lutidine; more preferably pyridine.
  • reaction temperature is 0 ° C. to room temperature.
  • the base is potassium tert-butoxide, sodium tert-butoxide, sodium ethoxy Sodium hydride or 1,8-diazabicyclo [5.4.0] -7-undecene (DBU); more preferably potassium tert-butoxide or sodium tert-butoxide; still more preferably It is potassium tert-butoxide.
  • the solvent not involved in the reaction is tert-butyl alcohol, dimethyl sulfoxide (DMSO) or N-methyl pyrrolidone (NMP); more preferably tert-butyl alcohol.
  • reaction temperature is from room temperature to 80.degree.
  • p is an integer of 0 to 2;
  • R 1 is a fluorine atom, a bromine atom, or a methoxymethyl group R 2a and / or R 2b is a methyl group;
  • the sulfonylating agent is p-toluenesulfonyl chloride, the basic solvent is pyridine, and the reaction temperature is 0 C. to room temperature;
  • the base is potassium tert-butoxide, the solvent is tert-butyl alcohol, and the reaction temperature is room temperature to 80.degree.
  • p is an integer of 0; and R 2a and / or R 2b is a methyl group;
  • the sulfonylating agent is p-toluenesulfonyl chloride
  • the basic solvent is pyridine
  • the reaction temperature is from 0 ° C. to room temperature
  • the base is potassium
  • the solvent is tert-butyl alcohol, and the reaction temperature is from room temperature to 80.degree.
  • a fifth aspect of the present invention is a compound of the following formula (Ia): [In formula (I-a), R 1a and R 1b are each independently a hydrogen atom, a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1- 6 alkyl group, cyanated C 1 ⁇ 6 alkyl group, a halogenated C 1 ⁇ 6 alkoxy group, C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group, mono / di C 2 ⁇ 7 alkanoylamino group, carboxamido group, or a C
  • R 2a and R 2b each independently represents a C 1 to 6 alkyl group, which is a group selected from 1 to 6 alkoxycarbonyl groups;
  • Formula (TH-1a) [In Formula (TH-1a), R 1a , R 1b , R 2a and R
  • TH-2a [Wherein, in the formula (TH-2a), R 1a , R 1b , R 2a and R 2b are the same as the group defined in the formula (I-a); E is a p-toluenesulfonyl group, A step of obtaining a compound represented by a benzenesulfonyl group, a p-nitrobenzenesulfonyl group, a 2,4-dinitrobenzenesulfonyl group, a methanesulfonyl group, or a trifluoromethanesulfonyl group] (step [5] -1) And a compound represented by the formula (TH-2a) and the base, in a solvent which does not participate in the reaction, from 0 ° C. to the compound represented by the formula (TH-2a) and the base The reaction is carried out at a temperature at which the mixed solution refluxes to obtain a compound represented by the formula (Ia) (step [5]
  • R 1a and R 1 b are preferably each independently a hydrogen atom, a halogen atom, a hydroxy C 1 6 alkyl group, C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group, a carboxamide group, or a C 1 ⁇ 6 alkoxycarbonyl group; more preferably, R 1a is a hydrogen atom, a halogen atom, or a C 1 ⁇ 6 alkoxy A C 1-6 alkyl group, R 1b is a hydrogen atom or a halogen atom; more preferably, R 1a is a hydrogen atom, a fluorine atom, a bromine atom or a methoxymethyl group, and R 1b is a hydrogen atom A combination of R 1a and R 1b which is an atom, a fluorine atom or a bromine atom, more specifically (R 1a , R
  • R 2a and / or R 2b is preferably a methyl group.
  • E is preferably p-toluenesulfonyl group, benzenesulfonyl group or methanesulfonyl group; more preferably Is a p-toluenesulfonyl group.
  • the sulfonylating agent is p-toluenesulfonyl chloride, p- Toluenesulfonic anhydride, benzenesulfonyl chloride, p-nitrobenzenesulfonyl chloride, 2,4-dinitrobenzenesulfonyl chloride, methanesulfonyl chloride, or trifluoromethanesulfonic anhydride; more preferably p-toluenesulfonyl chloride, p -Toluenesulfonic acid anhydride, benzenesulfonyl chloride, or methanesulfonyl chloride; more preferably p-toluenesulfonyl chloride or p-toluenesulfonic acid anhydride, benzenesulfonyl chloride, or methanesulfonyl chloride; more preferably p-tolu
  • the basic solvent is pyridine, triethylamine, N, N- Diisopropylethylamine or 2,6-lutidine; more preferably pyridine.
  • Step [5-6] In (Step [5] -1) of the process for producing a compound of Formula (I-a) according to Aspect [5], preferably, the reaction temperature is 0 ° C. to room temperature.
  • the base is potassium tert-butoxide, sodium tert-butoxide, Sodium ethoxide, sodium hydride or 1,8-diazabicyclo [5.4.0] -7-undecene (DBU); more preferably potassium tert-butoxide, sodium tert-butoxide or sodium ethoxide More preferably potassium tert-butoxide.
  • the solvent not involved in the reaction is tert-butyl alcohol, dimethyl Sulfoxide (DMSO) or N-methyl pyrrolidone (NMP); more preferably tert-butyl alcohol.
  • reaction temperature is from room temperature to 80.degree.
  • the sulfonylating agent is p-toluenesulfonyl chloride
  • the basic solvent is pyridine
  • the reaction temperature is C. to room temperature;
  • the base is potassium tert-butoxide
  • the solvent is tert-butyl alcohol
  • the reaction temperature is room temperature to 80.degree.
  • R 1a and R 1b are hydrogen atoms; and R 2a and / or R 2b are methyl groups
  • the sulfonylating agent is p-toluenesulfonyl chloride
  • the basic solvent is pyridine
  • the reaction temperature is from 0 ° C. to room temperature
  • the base is potassium tert-butoxide
  • the solvent is tert-butyl alcohol
  • the reaction temperature is from room temperature to 80.degree.
  • a sixth aspect of the present invention relates to a compound represented by the following formula (TH-2): [In the formula (TH-2), p is an integer of 0 to 4; Each R 1 independently represents a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1-6 alkyl group, a cyanated C 1-6 alkyl group, a halogenated C 1 ⁇ 6 alkoxy group, C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group, a mono / di C 2 ⁇ 7 alkanoylamino group, carboxamido group, or a group selected from C 1 ⁇ 6 alkoxycarbonyl group; R 2a And R 2b are each independently a C 1-6 alkyl group; E is a p-toluenesulfonyl group, a benzenesulfonyl group, a p-nitrobenz
  • p is preferably an integer of 0 to 3; more preferably an integer of 0 to 2 More preferably an integer of 0.
  • R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy C 1 1-6 alkyl group, a carboxamide group, or a C 1 - 6 alkoxycarbonyl group; more preferably, a halogen atom, or a C 1 - 6 alkoxy C 1 - 6 alkyl group; more preferably, a fluorine atom, a bromine atom Or a methoxymethyl group.
  • R 1 s may be the same or different.
  • R 2a and / or R 2b is preferably a methyl group.
  • E is preferably p-toluenesulfonyl group, benzenesulfonyl group or methanesulfonyl group; more preferably Is a p-toluenesulfonyl group.
  • the sulfonylating agent is p-toluenesulfonyl chloride, p-toluenesulfonic acid anhydride, benzenesulfonyl chloride P-nitrobenzenesulfonyl chloride, 2,4-dinitrobenzenesulfonyl chloride, methanesulfonyl chloride, or trifluoromethanesulfonic acid anhydride; more preferably p-toluenesulfonyl chloride, p-toluenesulfonic acid anhydride, benzenesulfonyl More preferably, p-toluenesulfonyl chloride or p-toluenesulfonic acid anhydride; and particularly preferably p-toluenesulfonyl chloride.
  • the basic solvent is pyridine, triethylamine, N, N-diisopropylethylamine, or 2,6-lutidine More preferably pyridine.
  • the reaction temperature is 0 ° C. to room temperature.
  • p is an integer of 0 to 2;
  • R 1 is a fluorine atom, a bromine atom, or methoxy R 2a and / or R 2b is a methyl group;
  • the sulfonylating agent is p-toluenesulfonyl chloride, the basic solvent is pyridine, and the reaction temperature is from 0 ° C. to room temperature.
  • p is an integer of 0; R 2a and / or R 2b is a methyl group; sulfonyl
  • the agent is p-toluenesulfonyl chloride, the basic solvent is pyridine, and the reaction temperature is 0 ° C. to room temperature.
  • a seventh aspect of the present invention provides a compound represented by formula (TH-2a):
  • R 1a and R 1b are each independently a hydrogen atom, a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1- 6 alkyl group, cyanated C 1 ⁇ 6 alkyl group, a halogenated C 1 ⁇ 6 alkoxy group, C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group, mono / di C 2 ⁇ 7 alkanoylamino group, carboxamido group, or a C It is a group selected from 1-6 alkoxycarbonyl group; R 2a and R 2b are each independently a C 1-6 alkyl group; E is, p- toluenesulfonyl group, a benzenesulfonyl group, p- nitrobenzene A method of
  • R 1a and R 1b are preferably each independently a hydrogen atom, a halogen atom, a hydroxy C 1 6 alkyl group, C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group, a carboxamide group, or a C 1 ⁇ 6 alkoxycarbonyl group; more preferably, R 1a is a hydrogen atom, a halogen atom, or a C 1 ⁇ 6 alkoxy A C 1-6 alkyl group, R 1b is a hydrogen atom or a halogen atom; more preferably, R 1a is a hydrogen atom, a fluorine atom, a bromine atom or a methoxymethyl group, and R 1b is a hydrogen atom A combination of R 1a and R 1b which is an atom, a fluorine atom or a bromine atom, more specifically (R 1a , R 1
  • R 2a and / or R 2b is preferably a methyl group.
  • E is preferably p-toluenesulfonyl group, benzenesulfonyl group, or methanesulfonyl group; more preferably Is a p-toluenesulfonyl group.
  • the sulfonylating agent is p-toluenesulfonyl chloride, p-toluenesulfonic acid anhydride, benzenesulfonyl chloride P-nitrobenzenesulfonyl chloride, 2,4-dinitrobenzenesulfonyl chloride, methanesulfonyl chloride, or trifluoromethanesulfonic acid anhydride; more preferably p-toluenesulfonyl chloride, p-toluenesulfonic acid anhydride, benzenesulfonyl More preferably, p-toluenesulfonyl chloride or p-toluenesulfonic acid anhydride; and particularly preferably p-toluenesulfonyl chloride.
  • the basic solvent is pyridine, triethylamine, N, N-diisopropylethylamine, or 2,6-lutidine More preferably pyridine.
  • the reaction temperature is 0 ° C. to room temperature.
  • R 2a and / or R 2b is a methyl group
  • the sulfonylating agent is p-toluenesulfonyl chloride
  • the basic solvent is pyridine
  • the reaction temperature is from 0 ° C. to room temperature.
  • R 1a and R 1b are hydrogen atoms; and R 2a and / or R 2b is a methyl group
  • the sulfonylating agent is p-toluenesulfonyl chloride, the basic solvent is pyridine, and the reaction temperature is from 0 ° C. to room temperature.
  • the eighth aspect of the present invention is a compound of the following formula (I): [In the formula (I), p is an integer of 0 to 4; Each R 1 independently represents a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1-6 alkyl group, a cyanated C 1-6 alkyl group, a halogenated C 1 ⁇ 6 alkoxy group, C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group, a mono / di C 2 ⁇ 7 alkanoylamino group, carboxamido group, or a group selected from C 1 ⁇ 6 alkoxycarbonyl group; R 2a And R 2b are each independently a C 1-6 alkyl group], and a method of producing a compound represented by the formula (TH-2): [Wherein, in the formula (TH-2), p, R 1 , R 2a and R 2b are the same
  • p is preferably an integer of 0 to 3; more preferably an integer of 0 to 2; Preferably, it is an integer of 0.
  • R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy C 1-6 It is an alkyl group, a carboxamido group, or a C 1-6 alkoxycarbonyl group; more preferably a halogen atom or a C 1-6 alkoxy C 1-6 alkyl group; still more preferably a fluorine atom, a bromine atom, or It is a methoxymethyl group.
  • R 1 s may be the same or different.
  • R 2a and / or R 2b is preferably a methyl group.
  • E is preferably p-toluenesulfonyl group, benzenesulfonyl group or methanesulfonyl group; more preferably p-toluenesulfonyl group.
  • the base is potassium tert-butoxide, sodium tert-butoxide, sodium ethoxide, sodium hydride or 1,1 8-diazabicyclo [5.4.0] -7-undecene (DBU); more preferably potassium tert-butoxide or sodium tert-butoxide; still more preferably potassium tert-butoxide.
  • DBU 1,1 8-diazabicyclo [5.4.0] -7-undecene
  • the solvent not involved in the reaction is tert-butyl alcohol, dimethyl sulfoxide (DMSO), or N-methylpyrrolidone ( NMP); more preferably tert-butyl alcohol.
  • the reaction temperature is from room temperature to 80 ° C.
  • p is an integer of 0 to 2;
  • R 1 is a fluorine atom, a bromine atom, or a methoxymethyl group R 2a and / or R 2b is a methyl group;
  • the base is potassium tert-butoxide, the solvent is tert-butyl alcohol, and the reaction temperature is from room temperature to 80 ° C.
  • p is an integer of 0; R 2a or R 2b is a methyl group; the base is potassium tert- It is a butoxide, the solvent is tert-butyl alcohol, and the reaction temperature is from room temperature to 80 ° C.
  • a ninth aspect of the present invention relates to a compound represented by the following formula (Ia):
  • R 1a and R 1b are each independently a hydrogen atom, a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1- 6 alkyl group, cyanated C 1 ⁇ 6 alkyl group, a halogenated C 1 ⁇ 6 alkoxy group, C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group, mono / di C 2 ⁇ 7 alkanoylamino group, carboxamido group, or a C
  • R 1a and R 1 b are preferably each independently a hydrogen atom, a halogen atom, a hydroxy C 1 6 alkyl group, C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group, a carboxamide group, or a C 1 ⁇ 6 alkoxycarbonyl group; more preferably, R 1a is a hydrogen atom, a halogen atom, or a C 1 ⁇ 6 alkoxy A C 1-6 alkyl group, R 1b is a hydrogen atom or a halogen atom; more preferably, R 1a is a hydrogen atom, a fluorine atom, a bromine atom or a methoxymethyl group, and R 1b is a hydrogen atom A combination of R 1a and R 1b which is an atom, a fluorine atom or a bromine atom, more specifically (R 1a , R
  • R 2a and / or R 2b is preferably a methyl group.
  • E is preferably p-toluenesulfonyl group, benzenesulfonyl group or methanesulfonyl group; more preferably Is a p-toluenesulfonyl group.
  • the base is potassium tert-butoxide, sodium tert-butoxide, sodium ethoxide, sodium hydride or 1,8-diazabicyclo [5.4.0] -7-undecene (DBU); more preferably potassium tert-butoxide, sodium tert-butoxide or sodium ethoxide; still more preferably potassium tert- It is a butoxide.
  • the solvent not involved in the reaction is tert-butyl alcohol, dimethyl sulfoxide (DMSO), or N-methyl Pyrrolidone (NMP); more preferably tert-butyl alcohol.
  • the reaction temperature is from room temperature to 80 ° C.
  • R 2a and / or R 2b is a methyl group
  • the base is potassium tert-butoxide
  • the solvent is tert-butyl alcohol
  • the reaction temperature is from room temperature to 80 ° C.
  • R 1a and R 1b are hydrogen atoms; and R 2a and / or R 2b are methyl groups
  • the base is potassium tert-butoxide, the solvent is tert-butyl alcohol, and the reaction temperature is from room temperature to 80 ° C.
  • a tenth aspect of the present invention relates to p, E, R 1 , R 2a and p in the formulas (TH-1), (TH-2) and (I) in the following (Scheme 6):
  • R 2b is the same group as defined in the above aspect [4];
  • the reaction conditions of step [1] -1 and step [1] -2 are the same as the reaction conditions in the above aspect [4] The same is applied to a process for producing a 1,1-dialkyl-1,2-dihydronaphthalene derivative represented by formula (I) and an intermediate of the process.
  • the eleventh aspect of the present invention relates to E, R 1a , R 1b in formulas (TH-1a), (TH-2a) and (Ia) in the following (Scheme 7):
  • R 2a and R 2b are the same groups as defined in the above aspect [5];
  • reaction conditions of step [2] -1 and step [2] -2 are those in the above aspect [5] And the reaction conditions are the same as in the reaction conditions, and a process for producing the 1,1-dialkyl-1,2-dihydronaphthalene derivative represented by the formula (Ia) and an intermediate of the process.
  • halogen atom includes, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
  • halogenated in the “halogenated C 1-6 alkyl group” and the like means several, preferably 1 to 5 of the aforementioned “halogen atoms” as a substituent. It means that you may have.
  • cyanated in “cyanated C 1-6 alkyl” and the like has several, preferably 1 to 5 "cyano groups” as a substituent. Means that it may be
  • C 1-6 alkyl group is, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, isopentyl, neopentyl, Or a group such as hexyl.
  • halogenated C 1-6 alkyl group means that the “C 1-6 alkyl” is optionally substituted with several, preferably 1 to 5 halogen atoms.
  • a group such as fluoromethyl, difluoromethyl, trifluoromethyl, 2,2,2-trifluoroethyl, 1,1,2,2-tetrafluoroethyl or pentafluoroethyl. It can be mentioned.
  • the “cyanated C 1-6 alkyl group” is an optionally substituted “C 1-6 alkyl” with several, preferably 1 to 5 cyano. Groups such as cyanomethyl, 1-cyanoethyl or 2-cyanoethyl.
  • the "C 1-6 alkoxy group” represents an alkoxy in which the aforementioned "C 1-6 alkyl” is bonded to an oxygen atom, and examples thereof include methoxy, ethoxy, propoxy and iso. Groups such as propoxy, butoxy, isobutoxy, sec-butoxy, tert-butoxy, pentyloxy or hexyloxy can be mentioned.
  • halogenated C 1-6 alkoxy group refers to a halogenated alkoxy in which the aforementioned “halogenated C 1-6 alkyl” is bonded to an oxygen atom, for example, fluoro Groups such as methoxy, difluoromethoxy, trifluoromethoxy, 2,2,2-trifluoroethoxy, or 1,1,2,2-tetrafluoroethoxy, pentafluoroethoxy and the like can be mentioned.
  • the "C 1 ⁇ 6 alkoxy C 1 ⁇ 6 alkyl group” means a group wherein the above “C 1 ⁇ 6 alkoxy” is substituted into the “C 1 ⁇ 6 alkyl” Do.
  • the "C 1-6 alkoxy C 1-6 alkyl” is, for example, methoxymethyl, methoxyethyl, ethoxymethyl, ethoxyethyl, 1,1-dimethoxymethyl or 1, Examples include 1-diethoxyethyl and the like.
  • the term "mono / di C 2 ⁇ 7 alkanoylamino group", one or two hydrogen atoms on the nitrogen atom of the "amino group”, "C 1 ⁇ 6 alkyl "Amino group substituted by -C (O)-group” means, for example, acetamide, propionamide, butyramide, isobutyramide, valeramide, isovaleramide, pivalamide, hexanamide, heptaneamide, cyclopropanecarboxamide, cyclobutanecarboxamide And groups such as cyclopentane carboxamide, cyclohexane carboxamide, 2-methylcyclopropane carboxamide, or diacetamide.
  • C 1-6 alkoxycarbonyl group is a group in which the hydrogen atom of the “carboxy group (—COOH)” is substituted with the above “C 1-6 alkyl group”, ie,
  • ester group means, for example, groups such as methoxycarbonyl (methyl ester), ethoxycarbonyl (ethyl ester) or tert-butoxycarbonyl (tert-butyl ester).
  • the “sulfonyl group” is a methanesulfonyl group, p-toluenesulfonyl group, benzenesulfonyl group, p-nitrobenzenesulfonyl group, 2,4-dinitrobenzenesulfonyl group, methane Groups such as a sulfonyl group or a trifluoromethanesulfonyl group can be mentioned.
  • the sulfonyl group described above is not necessarily limited.
  • sulfonylating agent means one capable of replacing the hydroxy group of the target compound with a sulfonyl group, for example, p-toluene as a sulfonylating agent
  • examples thereof include sulfonyl chloride, p-toluenesulfonic acid anhydride, benzene sulfonyl chloride, p-nitrobenzene sulfonyl chloride, 2,4-dinitrobenzene sulfonyl chloride, methanesulfonyl chloride, trifluoromethanesulfonic acid anhydride and the like.
  • it is not necessarily limited to the sulfonylating agent described above.
  • the “basic solvent” for example, pyridine, triethylamine, N, N-diisopropylethylamine, 2,6-lutidine, tributylamine, cyclohexyldimethylamine, or N-methyl Basic solvents which do not affect the reaction, such as morpholine, may be mentioned. However, it is not necessarily limited to the basic solvent described above. As these solvents, one type of solvent may be used alone, or two or more types of solvents may be appropriately selected and mixed and used at an appropriate ratio.
  • the “base” is, for example, lithium hydroxide, sodium hydroxide, potassium hydroxide, magnesium hydroxide, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, calcium carbonate, unless otherwise specified.
  • the “solvent not involved in the reaction” is, for example, water, cyclohexane, hexane, benzene, chlorobenzene, toluene, xylene, methanol, ethanol, 1-propanol, 2-propanol, tert-butyl alcohol, N , N-dimethylformamide (DMF), N, N-dimethylacetamide, N-methylpyrrolidone (NMP), hexamethylphosphoryl triamide, 1,3-dimethyl-2-imidazolidinone, dimethylsulfoxide (DMSO), acetonitrile , Propionitrile, diethyl ether, diisopropyl ether, diphenyl ether, methyl tert-butyl ether (MTBE), tetrahydrofuran, 2-methyltetrahydrofuran, 1,4-dioxane, 1,2-dimethoxyethane , Me
  • variable substituent when a cyclic group is substituted by a variable substituent, it means that the variable substituent is not bonded to a specific carbon atom of the cyclic group.
  • variable substituent R x in the following formula A means that any of carbon atoms i, ii, iii or iv in the formula A can be substituted.
  • Optical isomers may exist in the hydroxyl group in the formula (TH-1) of the compound in the present specification.
  • the formula (TH-1) includes isomers represented by (R) -isomer and (S) -isomer.
  • the formulas (TH-2), (TH-1a) and (TH-2a) also mean that isomers represented by (R) -isomer and (S) -isomer are included.
  • the compounds of the present invention may form an acid addition salt or form a salt with a base, depending on the type of substituent.
  • Such salts are not particularly limited as long as they are pharmaceutically acceptable salts, and examples thereof include metal salts, ammonium salts, salts with organic bases, salts with inorganic acids, salts with organic acids, basicity, Or salts with acidic amino acids.
  • Preferred examples of the metal salt include, for example, alkali metal salts such as lithium salt, sodium salt, potassium salt and cesium salt, alkaline earth metal salts such as calcium salt, magnesium salt and barium salt, aluminum salt and the like (For example, in addition to mono salts, disodium salts and dipotassium salts are also included).
  • Preferred examples of the salts with organic bases include, for example, methylamine, ethylamine, t-butylamine, t-octylamine, diethylamine, trimethylamine, triethylamine, cyclohexylamine, dicyclohexylamine, dibenzylamine, ethanolamine, diethanolamine, triamine Ethanolamine, piperidine, morpholine, pyridine, picoline, lysine, arginine, ornithine, ethylenediamine, N-methylglucamine, glucosamine, phenylglycine alkyl ester, guanidine, 2,6-lutidine, ethanolamine, diethanolamine, triethanolamine, N And salts with N, N'-dibenzylethylenediamine and the like.
  • salts with inorganic acids include salts with hydrochloric acid, hydrobromic acid, hydroiodic acid, nitric acid, sulfuric acid, phosphoric acid and the like.
  • Preferred examples of salts with organic acids are, for example, formic acid, acetic acid, trifluoroacetic acid, propionic acid, butyric acid, valeric acid, enanthate, capric acid, myristic acid, palmitic acid, stearic acid, lactic acid, sorbic acid, Salts with aliphatic monocarboxylic acids such as mandelic acid, salts with aliphatic dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, fumaric acid, fumaric acid, maleic acid, malic acid and tartaric acid, aliphatic tricarboxylic acids such as citric acid Salts with acids, salts with aromatic monocarboxylic acids such as benzoic acid and salicylic acid, salts of aromatic dicarbox
  • Salts with organic carboxylic acids salts with organic sulfonic acids such as methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, etc., aspartic acid, Acid addition salts with acidic amino acids such as phosphate and the like.
  • Preferred examples of salts with basic amino acids include salts with arginine, lysine, ornithine and the like
  • preferred examples of salts with acidic amino acids include salts with aspartic acid, glutamic acid and the like Can be mentioned. Among these, pharmaceutically acceptable salts are preferred.
  • inorganic salts such as alkali metal salts (eg, sodium salt, potassium salt etc.), alkaline earth metal salts (eg, calcium salt, magnesium salt, barium salt etc.), Ammonium salts and the like
  • salts with inorganic acids such as hydrochloric acid, hydrobromic acid, nitric acid, sulfuric acid, phosphoric acid, or acetic acid, phthalic acid, fumaric acid
  • organic acids such as oxalic acid, tartaric acid, maleic acid, citric acid, succinic acid, methanesulfonic acid, p-toluenesulfonic acid and the like.
  • the salt is formed into a desired salt by, for example, mixing a solution containing the compound of the present invention and an appropriate amount of an acid or a base according to a conventional method, followed by fractional filtration, or the mixed solvent is distilled off. It can be obtained by
  • the compound of the present invention or a salt thereof may form a solvate with a solvent such as water, ethanol, glycerol and the like.
  • a solvent such as water, ethanol, glycerol and the like.
  • solvate refers to a molecular complex comprising the compound of the present invention and one or more pharmaceutically acceptable solvent molecules (eg, water, ethanol, etc.).
  • solvent molecules eg, water, ethanol, etc.
  • hydrate When the solvent molecule is water, it is particularly referred to as "hydrate”.
  • the compounds in the present specification may be geometrical isomers (geometrical isomers), configurational isomers (configurational isomers), tautomers (tautomeric isomers), optical isomers (optical isomers), stereoisomers (diastereomers)
  • geometrical isomers geometrical isomers
  • configurational isomers configurational isomers
  • tautomers tautomeric isomers
  • optical isomers optical isomers
  • stereoisomers diastereomers
  • each isomer may be a single compound by a synthesis method known per se, a separation method. It can be obtained as one compound.
  • a synthesis method known per se such as (1) fractional recrystallization method, (2) diastereomer method, (3) chiral column method and the like can be mentioned.
  • Optical resolution agents include, for example, (+)-mandelic acid, (-)-mandelic acid, (+)-tartaric acid, (-)-tartaric acid, (+)-1-phenethylamine, (-)-1-phenethylamine, Cinchonin, (-)-cinchonidin, brucine etc. may be mentioned.
  • Diastereomer method A mixture of racemates is covalently bonded (reacted) to an optical resolution agent to form a mixture of diastereomers, which is then subjected to ordinary separation means (eg, fractional recrystallization, silica gel column chromatography After separation into optically pure diastereomers via HPLC (high performance liquid chromatography) etc., and then optical purification by removing the optical resolution agent by chemical treatment such as hydrolysis reaction. Is a method of obtaining various optical isomers.
  • ordinary separation means eg, fractional recrystallization, silica gel column chromatography After separation into optically pure diastereomers via HPLC (high performance liquid chromatography) etc.
  • HPLC high performance liquid chromatography
  • a compound of the present invention when a compound of the present invention has a hydroxyl group or a primary or secondary amino group in the molecule, the compound and an optically active organic acid (eg, MTPA [ ⁇ -methoxy- ⁇ - (trifluoromethyl) phenylacetic acid], By subjecting (-)-menthoxyacetic acid etc. and the like to a condensation reaction, diastereomers of ester or amide form can be obtained, respectively.
  • the compound of the present invention when the compound of the present invention has a carboxy group in the molecule, the compound and an optically active amine or alcohol reagent are subjected to a condensation reaction to obtain an amide form or an ester form of the diastereomer, respectively.
  • Each of the above separated diastereomers is converted to an optical isomer of the original compound by acid hydrolysis or basic hydrolysis reaction.
  • Chiral column method A method of direct optical resolution by subjecting a racemate or a salt thereof to chromatography on a chiral column (column for separating optical isomers).
  • HPLC high performance liquid chromatography
  • a mixture of optical isomers is added to a chiral column such as CHIRAL series manufactured by Daicel, water, various buffers (eg, phosphate buffer),
  • the optical isomers can be separated by developing using an organic solvent (eg, ethanol, methanol, isopropanol, acetonitrile, trifluoroacetic acid, diethylamine) alone or as a mixed solution.
  • separation can be performed using a chiral column such as CP-Chirasil-DeX CB (manufactured by GL Sciences Inc.).
  • the compounds herein may also be crystalline.
  • crystals single crystals or a mixture of crystals are included in the compounds of the present invention.
  • crystals of the compound in the present specification have crystal polymorphism, any crystal form is also included in the compound of the present invention.
  • co-crystals or co-crystal salts are two or more unique at room temperature, each having different physical properties (eg, structure, melting point, heat of fusion, hygroscopicity, solubility, stability, etc.) Mean crystalline substance composed of solid.
  • the co-crystal or co-crystal salt can be produced according to a co-crystallization method known per se.
  • Compounds herein include isotopes (eg, isotopes of hydrogen, isotopes of carbon such as 2 H and 3 H, isotopes of chlorine such as 11 C, 13 C, and 14 C, 36 Cl, etc. , Fluorine isotopes, 18 F, iodine isotopes, 123 I and 125 I, nitrogen isotopes, 13 N and 15 N, oxygen isotopes, such as 15 O, 17 O, and 18 O Also included are compounds labeled or substituted with isotopes of phosphorus, such as 32 P, and isotopes of sulfur, such as 35 S).
  • isotopes eg, isotopes of hydrogen, isotopes of carbon such as 2 H and 3 H, isotopes of chlorine such as 11 C, 13 C, and 14 C, 36 Cl, etc.
  • Compounds of the present invention that are labeled or substituted with certain isotopes are, for example, Positron Emission Tomography (PET).
  • PET Positron Emission Tomography
  • Compounds of the present invention that are labeled or substituted with certain isotopic labels are useful in drug and / or substrate tissue distribution studies.
  • 3 H and 14 C are useful for the research purpose in that they are easy to label or replace and easy to detect.
  • Isotopically labeled compounds of the present invention may be obtained by conventional techniques known to those skilled in the art or by methods analogous to the synthetic methods described in the examples below. Also, instead of unlabeled compounds, the isotope labeled compounds obtained can be used for pharmacological experiments.
  • the temperature at which the mixed solution containing the compound represented by the above formula (TH-1) and the sulfonylating agent is refluxed from 0 ° C. “from 0 ° C. to the above formula (TH-2) A temperature at which the mixed solution containing the compound represented by the above and the base refluxes, "from 0 ° C to the mixed solution containing the compound represented by the formula (TH-1a) and the sulfonylating agent,
  • the meaning of “temperature” and “the temperature at which the mixed solution containing the compound represented by the above formula (TH-2a) and the base is refluxed from 0 ° C.” means each mixed solution (from 0 ° C.)
  • solvent refers to any temperature within the range of the reflux temperature.
  • room temperature means laboratory, laboratory temperature, etc., usually about 1 ° C. to about 30 ° C., preferably usually about 5 ° C. to about 30 ° C. More preferably, it exhibits a temperature of usually about 15 ° C. to about 25 ° C., more preferably 20 ⁇ 3 ° C.
  • one type of solvent may be used alone, or two or more types of solvents may be mixed and used at an appropriate ratio, as appropriate selected according to the reaction conditions.
  • the steps of extraction, drying, purification and the like of the compound may be appropriately performed by a known method.
  • the reaction time in each step may be appropriately selected as long as the reaction sufficiently proceeds, unless otherwise specified.
  • the compound represented by the formula (TH-1) and a solvate thereof are generally known compounds which can be easily obtained from commercially available compounds or commercially available compounds by a production method known in the literature as a starting material or a synthetic intermediate. It can be easily produced by combining chemical production methods, and can be produced, for example, according to the representative production methods shown below.
  • the definitions of p, R 1 , R 2a and R 2b are described in the embodiments [1] to [4] unless otherwise specified. Are identical to their respective definitions.
  • the compounds of formula (SM-2) and formula (KT-1) may form a salt, and such a salt is pharmaceutically acceptable. It is not particularly limited as long as it is a salt to be obtained, and examples thereof include metal salts, ammonium salts, salts with organic bases, salts with inorganic acids, salts with organic acids, salts with basic or acidic amino acids, and the like.
  • the metal salt include, for example, alkali metal salts such as lithium salt, sodium salt, potassium salt and cesium salt, alkaline earth metal salts such as calcium salt, magnesium salt and barium salt, aluminum salt and the like (For example, in addition to mono salts, disodium salts and dipotassium salts are also included).
  • Preferred examples of the salts with organic bases include, for example, methylamine, ethylamine, t-butylamine, t-octylamine, diethylamine, trimethylamine, triethylamine, cyclohexylamine, dicyclohexylamine, dibenzylamine, ethanolamine, diethanolamine, triamine Ethanolamine, piperidine, morpholine, pyridine, picoline, lysine, arginine, ornithine, ethylenediamine, N-methylglucamine, glucosamine, phenylglycine alkyl ester, guanidine, 2,6-lutidine, ethanolamine, diethanolamine, triethanolamine, N And salts with N, N'-dibenzylethylenediamine and the like.
  • salts with inorganic acids include salts with hydrochloric acid, hydrobromic acid, hydroiodic acid, nitric acid, sulfuric acid, phosphoric acid and the like.
  • Preferred examples of salts with organic acids are, for example, formic acid, acetic acid, trifluoroacetic acid, propionic acid, butyric acid, valeric acid, enanthate, capric acid, myristic acid, palmitic acid, stearic acid, lactic acid, sorbic acid, Salts with aliphatic monocarboxylic acids such as mandelic acid, salts with aliphatic dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, fumaric acid, fumaric acid, maleic acid, malic acid and tartaric acid, aliphatic tricarboxylic acids such as citric acid Salts with acids, salts with aromatic monocarboxylic acids such as benzoic acid and salicylic acid, salts of aromatic dicarbox
  • Salts with organic carboxylic acids salts with organic sulfonic acids such as methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, etc., aspartic acid, Acid addition salts with acidic amino acids such as phosphate and the like.
  • Preferred examples of salts with basic amino acids include salts with arginine, lysine, ornithine and the like
  • preferred examples of salts with acidic amino acids include salts with aspartic acid, glutamic acid and the like Can be mentioned. Among these, pharmaceutically acceptable salts are preferred.
  • inorganic salts such as alkali metal salts (eg, sodium salt, potassium salt etc.), alkaline earth metal salts (eg, calcium salt, magnesium salt, barium salt etc.), Ammonium salts and the like
  • salts with inorganic acids such as hydrochloric acid, hydrobromic acid, nitric acid, sulfuric acid, phosphoric acid, or acetic acid, phthalic acid, fumaric acid
  • organic acids such as oxalic acid, tartaric acid, maleic acid, citric acid, succinic acid, methanesulfonic acid, p-toluenesulfonic acid and the like.
  • the compound of the formula (KT-1) can be used in the next reaction as the reaction liquid or as a crude product, but from the reaction mixture It can be separated and can be easily purified by a means known per se, such as extraction, concentration, neutralization, filtration, distillation, recrystallization, chromatography and the like.
  • the compound of the formula (SM-2) and the formula (KT-1) has a hydroxyl group (alcoholic hydroxyl group, phenolic hydroxyl group, heterocyclic hydroxyl group etc.) as a substituent
  • a hydroxyl group alcoholic hydroxyl group, phenolic hydroxyl group, heterocyclic hydroxyl group etc.
  • reactive groups such as an amino group, a carboxy group and a thiol group
  • these groups can be appropriately protected, and the protective groups can be removed at an appropriate stage.
  • the method for introducing and removing such protective groups may be appropriately selected depending on the type of the protected group or the protective group.
  • Protective Groups in Organic Synthesis Protective Groups in Organic
  • Greene et al. Synthesis The fourth edition, 2007, can be carried out by the method described in the book of John Wiley & Sons (John Wiley & Sons).
  • the reaction conditions in the production method are as follows unless otherwise specified.
  • the reaction temperature is not limited as long as it is in the range of ⁇ 78 ° C. to the temperature at which the solvent refluxes.
  • the reaction time is not limited as long as the reaction proceeds sufficiently, unless otherwise specified.
  • range from -78 ° C to the temperature at which the solvent refluxes at the above reaction temperature means a temperature within the range from -78 ° C to the temperature at which the solvent (or mixed solvent) used for the reaction is refluxed. .
  • a temperature at which the solvent refluxes from -78 ° C means a temperature within the range of -78 ° C to a temperature at which methanol refluxes.
  • at a temperature from ⁇ 78 ° C. to reflux of the reaction solution means any temperature within the range from ⁇ 78 ° C. to a temperature at which the reaction solution refluxes.
  • each step in the process for producing a compound of the formula (TH-1) described below can be carried out without solvent, or by dissolving or suspending the starting compound in a solvent not involved in an appropriate reaction before the reaction.
  • the solvent not involved in the reaction include water, cyclohexane, hexane, benzene, chlorobenzene, toluene, xylene, methanol, ethanol, 1-propanol, 2-propanol, tert-butyl alcohol, N, N-dimethylformamide (for example) DMF), N, N-dimethylacetamide, N-methylpyrrolidone (NMP), hexamethylphosphoric triamide, 1,3-dimethyl-2-imidazolidinone, dimethyl sulfoxide, acetonitrile, propionitrile, diethyl ether, diisopropyl Ether, diphenyl ether, methyl tert-butyl ether (MTBE),
  • solvents may be used alone, or may be appropriately selected according to the reaction conditions, and two or more solvents may be mixed and used in an appropriate ratio. These solvents are suitably selected according to reaction conditions.
  • a solvent not involved in the reaction or “a solvent inert to the reaction”
  • one type of solvent may be used alone.
  • two or more solvents may be mixed and used at an appropriate ratio, which is appropriately selected according to the reaction conditions.
  • Examples of the base (or deacidifying agent) used in each step in the method for producing a compound of the formula (TH-1) described below include, for example, lithium hydroxide, sodium hydroxide, potassium hydroxide, magnesium hydroxide, carbonate Lithium, sodium carbonate, potassium carbonate, cesium carbonate, calcium carbonate, sodium hydrogen carbonate, tripotassium phosphate, sodium acetate, cesium fluoride, triethylamine, N, N-diisopropylethylamine, tributylamine, cyclohexyldimethylamine, pyridine, lutidine, 4-dimethylaminopyridine (DMAP), N, N-dimethylaniline, N-methylpiperidine, N-methylpyrrolidine, N-methylmorpholine, 1,5-diazabicyclo [4.3.0] -5-nonene, 1, 4-Diazabicyclo [2.2.2] octane, 1,8 Diazabicyclo [5.4.0] -7-
  • the acid or acid catalyst used in each step in the process for producing the compound of the formula (TH-1) described below is, for example, hydrochloric acid, sulfuric acid, nitric acid, hydrobromic acid, phosphoric acid, acetic acid, trifluoroacetic acid, Oxalic acid, phthalic acid, fumaric acid, tartaric acid, maleic acid, citric acid, succinic acid, methanesulfonic acid, p-toluenesulfonic acid, 10-camphorsulfonic acid, boron trifluoride ether complex, zinc iodide, anhydrous aluminum chloride And anhydrous zinc chloride, anhydrous iron chloride and the like. However, it is not necessarily limited to what was described above. These acids or acid catalysts are suitably selected according to reaction conditions.
  • a base such as sodium tert-butoxide
  • a solvent which does not participate in the reaction such as tert-butyl alcohol, tetrahydrofuran, toluene, dimethyl sulfoxide (DMSO), N-methylpyrrolidone (NMP) or the like in the presence or absence of a sodium salt, from 0 ° C. to a temperature at which the solvent refluxes
  • a base such as sodium tert-butoxide
  • DMSO dimethyl sulfoxide
  • NMP N-methylpyrrolidone
  • ⁇ Step 2> [Production Method A] Using a compound represented by the formula (KT-1) obtained in ⁇ Step 1>, known methods in the literature, for example, “Experimental Chemical Lecture 4th Edition 26 Organic Synthesis VIII Sodium borohydride, lithium borohydride, hydrogenated diisobutylaluminum hydride (DIBAH), hydrogenation according to the method described in “Analytical synthesis, reduction, sugar, labeling compound”, page 234-245, 1992, Maruzen ”, etc.
  • DIBAH diisobutylaluminum hydride
  • the formula (TH-1a) corresponding to the lower formula of the formula (TH-1) can be produced according to the production method of the above formula (TH-1).
  • ⁇ Step 2> [Production Method B] Using a compound represented by the formula (EP-1) obtained in ⁇ Step 1>, known methods in the literature, for example, “Journal of the Chemical Society, Perkin Transactions 1, p 2807 The solvent is refluxed from 0 ° C. using ammonia water, a mixed solution of ammonia water / ethanol, a mixed solution of ammonia water / 7 N ammonia-methanol solution, etc. according to the method described in “2810, 1983”. The reaction can be carried out at temperature to produce a compound of formula (i). The compound of the formula (i) thus obtained can be resolved into chiral compounds by the above-mentioned optical resolution method.
  • JEOL JNM-ECX400 FT-NMR (Nippon Electron) was used for measurement of nuclear magnetic resonance spectrum (NMR).
  • M means molecular weight
  • RT means retention time
  • [M + H] + means molecular ion peak.
  • room temperature usually refers to a temperature of about 1 ° C to about 30 ° C.
  • ⁇ Step 3> Synthesis of 1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4-methylbenzenesulfonate: (Example 1) p-toluenesulfonyl chloride (32.5 g) was added to a solution of the compound (15 g) obtained in ⁇ Step 2> in pyridine (75 mL) under ice-water cooling, and stirred at room temperature for 40 hours did. To the reaction mixture was added 1N aqueous sodium hydroxide solution (100 mL) under ice-water cooling, and the mixture was stirred at room temperature for 30 minutes. Water was added to the mixture and extracted with tert-butyl methyl ether.
  • ⁇ Step 4> Synthesis of 1,1-dimethyl-1,2-dihydronaphthalene:
  • Example 1 To a solution of the compound (24 g) obtained in ⁇ Step 3> in tert-butyl alcohol (120 mL) was added potassium tert-butoxide (16.5 g) at room temperature, Heated for time. Water was added to the reaction solution, and extracted twice with tert-butyl methyl ether. The organic layer was washed with brine and dried over sodium sulfate. The solvent was evaporated under reduced pressure to give the title compound (11.0 g, 92%) as a yellow oil.

Abstract

Provided is a novel method for producing a compound represented by formula (I). The present invention relates to a method for producing a compound represented by formula (TH-2), and a compound represented by formula (I) via formula (TH-2). Accordingly, a method for producing a 1,1-dialkyl-1,2-dihydronaphthalene derivative and an intermediate of said method are provided.

Description

ジアルキルジヒドロナフタレン誘導体の製造方法Method for producing dialkyl dihydronaphthalene derivative
 本発明は、式(TH-2)で表される1,1-ジアルキル-1,2,3,4-テトラヒドロナフタレン-2-イル スルホネート誘導体、および式(TH-2)を経由する式(I)で表される1,1-ジアルキル-1,2-ジヒドロナフタレン誘導体の製造方法に関する。 The present invention provides a 1,1-dialkyl-1,2,3,4-tetrahydronaphthalen-2-yl sulfonate derivative represented by the formula (TH-2), and a formula (I) via the formula (TH-2) The present invention relates to a method for producing a 1,1-dialkyl-1,2-dihydronaphthalene derivative represented by
 式(i)で表される1-アミノ-2-ヒドロキシ-4,4-ジアルキル-1,2,3,4-テトラヒドロナフタレンは、式(X)で表されるトロポミオシン受容体キナーゼA(TrkA)阻害作用を有する化合物を製造する際に用いる化合物である。式(i)の化合物は、式(I)の化合物より、酸化反応(エポキシ化)、続くヒドロアミノ化反応により製造する事ができることから、式(I)の化合物は、式(X)の化合物を合成する為の中間体となる。 The 1-amino-2-hydroxy-4,4-dialkyl-1,2,3,4-tetrahydronaphthalene represented by the formula (i) is a tropomyosin receptor kinase A (TrkA) represented by the formula (X) It is a compound used when producing a compound having an inhibitory action. The compound of formula (I) can be produced from the compound of formula (I) by an oxidation reaction (epoxidation) and subsequent hydroamination reaction, so the compound of formula (I) is a compound of formula (X) It is an intermediate for synthesis.
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 式(I)で表される化合物の1つである、1,1-ジメチル-1,2-ジヒドロナフタレン(式(I-a-1))は、各種先行技術文献を組み合わせることにより、下記(Scheme2)に示す製造方法により製造する事ができる。 One of the compounds represented by the formula (I), 1,1-dimethyl-1,2-dihydronaphthalene (formula (I-a-1)), can be prepared by combining various prior art documents. It can manufacture by the manufacturing method shown to Scheme 2).
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
(Scheme2)の各工程の反応及び引用文献:
<工程1>エステル化反応:例,「Organic Letters, 4(18), p3079-3081, 2002年」(非特許文献1)
<工程2>ジアルキル化反応:例,「Organic & Biomolecular Chemistry, 9(7), p2258-2265, 2011年」(非特許文献2)
<工程3>環化反応:例,「Tetrahedron Letters, 54(32), p4330-4332, 2013年」(非特許文献3)
<工程4>酸化反応:例,「Chemistry Letters, 70(10), p1042-1043, 2013年」(非特許文献4)
<工程5>還元反応:例,「Synlett, 27(5), p789-793, 2016年」(非特許文献5)
<工程6>脱水反応:例,「国際公開2014/078454号パンフレット」(特許文献1)
Reaction of each process of (Scheme 2) and cited reference:
<Step 1> Esterification Reaction: For example, "Organic Letters, 4 (18), p 3079-3081, 2002" (Non-patent Document 1)
<Step 2> Dialkylation reaction: For example, "Organic & Biomolecular Chemistry, 9 (7), p 2258-2265, 2011" (Non-Patent Document 2)
<Step 3> Cyclization reaction: Example, "Tetrahedron Letters, 54 (32), p 4330-4332, 2013" (Non-patent Document 3)
<Step 4> Oxidation Reaction: For example, “Chemistry Letters, 70 (10), p 1042-1043, 2013” (Non-patent Document 4)
<Step 5> Reductive reaction: For example, "Synlett, 27 (5), p 789-793, 2016" (Non-Patent Document 5)
<Step 6> Dehydration: For example, "International Publication 2014/078454 Pamphlet" (Patent Document 1)
 式(I)の化合物は、前記(Scheme2)で示される上記式(I-a-1)の化合物の製造方法に準じて製造する事が可能である。しかし、当該製造方法を用いる場合には、その大量合成又は工業的生産にて、安全性の問題が懸念され得る工程(<工程2>低温下でのジアルキル化反応、<工程4>ベンジル位の過酸化物を用いる酸化反応等)が含まれている。従って、式(I)の化合物の大量合成もしくは工業的生産を考えた場合には、前記製造方法とは異なる新規な製造方法を見出すことが求められている。 The compound of the formula (I) can be produced according to the method for producing the compound of the above formula (I-a-1) represented by the above (Scheme 2). However, when the production method is used, there are steps that may cause safety problems in large-scale synthesis or industrial production (<step 2> dialkylation reaction at low temperature, <step 4> benzylic An oxidation reaction using peroxide is included. Therefore, when considering the large scale synthesis or industrial production of the compound of the formula (I), it is required to find a novel production method different from the above production method.
 また、式(I)で表される1,1-ジアルキル-1,2-ジヒドロナフタレン誘導体を、短工程で効率良く大量合成する製造方法は知られていない。 In addition, there is no known production method for efficiently synthesizing a large amount of 1,1-dialkyl-1,2-dihydronaphthalene derivatives represented by the formula (I) in a short step.
 よって、前記の課題を克服し、式(I)の化合物の大量合成もしくは工業的生産に適した効率的な製造方法の確立が望まれていた。 Accordingly, it has been desired to establish an efficient production method suitable for large-scale synthesis or industrial production of the compound of formula (I) to overcome the above-mentioned problems.
 1,1-ジアルキル-1,2,3,4-テトラヒドロナフタレン-2-イル スルホネート誘導体として、7-メトキシ-1,1-ジメチル-1,2,3,4-テトラヒドロナフタレン-2-イル 4-メチルベンゼンスルホネートが知られている(非特許文献6)が、式(I)で表される誘導体を製造する為の化合物としての使用は知られていない。 As a 1,1-dialkyl-1,2,3,4-tetrahydronaphthalen-2-yl sulfonate derivative, 7-methoxy-1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4- Although methyl benzene sulfonate is known (Non-patent Document 6), its use as a compound for producing a derivative represented by formula (I) is not known.
国際公開2014/078454号パンフレットInternational Publication 2014/078454 Brochure
 式(I)で表される1,1-ジアルキル-1,2-ジヒドロナフタレン誘導体の大量合成もしくは工業的生産に適した効率的な製造方法、とりわけ、当該誘導体の大量製造もしくは工業的生産するにあたり、前記(Scheme2)の製造方法を用いる事なく、式(I)で表される化合物を製造する新規な製造方法の提供を目的とする。 An efficient production method suitable for large-scale synthesis or industrial production of a 1,1-dialkyl-1,2-dihydronaphthalene derivative represented by the formula (I), particularly, on the large-scale production or industrial production of the derivative An object of the present invention is to provide a novel production method for producing a compound represented by formula (I) without using the production method of (Scheme 2).
 本発明者らは、上記の課題を解決すべく、鋭意研究を重ねてきた。その結果、下記式(TH-2)で表される1,1-ジアルキル-1,2,3,4-テトラヒドロナフタレン-2-イル スルホネート誘導体を見い出し、又、当該式(TH-2)を経由し、収率良く、短工程、かつ容易に下記式(I)で表される1,1-ジアルキル-1,2-ジヒドロナフタレン誘導体を製造する方法を見い出し、この知見に基づいて本発明を完成するに至った。
Figure JPOXMLDOC01-appb-C000011
(式(I)または式(TH-2)中、p、E、R1、R2a及びR2bの定義は、後述する本発明の第1の態様中の定義と同一である。)
The present inventors have intensively studied to solve the above-mentioned problems. As a result, a 1,1-dialkyl-1,2,3,4-tetrahydronaphthalen-2-yl sulfonate derivative represented by the following formula (TH-2) is found, and the formula (TH-2) is used. A method for producing a 1,1-dialkyl-1,2-dihydronaphthalene derivative represented by the following formula (I) in a high yield, a short process, and easily, and the present invention is completed based on this finding. It came to
Figure JPOXMLDOC01-appb-C000011
(In formula (I) or formula (TH-2), the definitions of p, E, R 1 , R 2a and R 2b are the same as the definitions in the first aspect of the present invention described later.)
 本発明は、式(X)で表されるTrkA阻害作用を有する化合物を合成する為の中間体となる式(TH-2)で表されるスルホネート誘導体、及び式(TH-2)を経由する式(I)で表される1,1-ジアルキル-1,2-ジヒドロナフタレン誘導体の製造方法に関する。本発明は、収率良く、短工程、かつ容易な工業的に有利な製造方法を提供することができ、産業上の有用性が高い。 The present invention relates to a sulfonate derivative represented by the formula (TH-2) as an intermediate for synthesizing a compound having a TrkA inhibitory activity represented by the formula (X), and a compound represented by the formula (TH-2) The present invention relates to a process for producing a 1,1-dialkyl-1,2-dihydronaphthalene derivative represented by the formula (I). The present invention can provide an industrially advantageous production method with high yield, short process, and easy, and has high industrial utility.
 本発明は、以下の態様に示される下記式(TH-2)で表されるスルホネート誘導体、及び式(TH-2)を経由する下記式(I)で表される1,1-ジアルキル-1,2-ジヒドロナフタレン誘導体の製造方法に関する。より具体的に、本発明の例示的な態様は、以下の〔1〕~〔11〕のとおりであり得る。 The present invention provides a sulfonate derivative represented by the following formula (TH-2) shown in the following embodiment, and a 1,1-dialkyl-1 represented by the following formula (I) via the formula (TH-2) , A method of producing a 2-dihydronaphthalene derivative. More specifically, exemplary embodiments of the present invention may be as follows [1] to [11].
〔1〕下記式(TH-2):
Figure JPOXMLDOC01-appb-C000012
[式(TH-2)中、p、E、R1、R2a及びR2bは、後述する本発明の第1の態様中に定義されている基と同じ基である]で表される化合物、又はその塩、又はそれらの溶媒和物。
[1] the following formula (TH-2):
Figure JPOXMLDOC01-appb-C000012
[Wherein p, E, R 1 , R 2a and R 2b in the formula (TH-2) are the same groups as the groups defined in the first aspect of the present invention described later] Or a salt thereof, or a solvate thereof.
〔2〕下記式(TH-2a):
Figure JPOXMLDOC01-appb-C000013
[式(TH-2a)中、E、R1a、R1b、R2a及びR2bは、後述する本発明の第2の態様中に定義されている基と同じ基である]で表される化合物、又はその塩、又はそれらの溶媒和物。
[2] the following formula (TH-2a):
Figure JPOXMLDOC01-appb-C000013
[Wherein E, R 1a , R 1b , R 2a and R 2b in the formula (TH-2a) are the same groups as the groups defined in the second aspect of the present invention described later] A compound, or a salt thereof, or a solvate thereof.
〔3〕1,1-ジメチル-1,2,3,4-テトラヒドロナフタレン-2-イル 4-メチルベンゼンスルホネート、又はその塩、又はそれらの溶媒和物。 [3] 1,1-Dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4-methylbenzenesulfonate, or a salt thereof, or a solvate thereof.
〔4〕下記式(I):
Figure JPOXMLDOC01-appb-C000014
[式(I)中、p、R1、R2a及びR2bは、後述する本発明の第4の態様中に定義されている基と同じ基である]で表される化合物を製造する方法。
[4] the following formula (I):
Figure JPOXMLDOC01-appb-C000014
A method for producing a compound represented by [wherein p, R 1 , R 2a and R 2b in the formula (I) are the same groups as the groups defined in the fourth embodiment of the present invention described later] .
〔5〕下記式(I-a):
Figure JPOXMLDOC01-appb-C000015
[式(I-a)中、R1a、R1b、R2a及びR2bは、後述する本発明の第5の態様中に定義されている基と同じ基である]で表される化合物を製造する方法。
[5] the following formula (I-a):
Figure JPOXMLDOC01-appb-C000015
[Wherein, in the formula (Ia), R 1a , R 1b , R 2a and R 2b are the same groups as the groups defined in the fifth aspect of the present invention described later] How to manufacture.
〔6〕下記式(TH-2):
Figure JPOXMLDOC01-appb-C000016
[式(TH-2)中、p、E、R1、R2a及びR2bは、後述する本発明の第6の態様中に定義されている基と同じ基である]で表される化合物を製造する方法。
[6] Following Formula (TH-2):
Figure JPOXMLDOC01-appb-C000016
[Wherein, in the formula (TH-2), p, E, R 1 , R 2a and R 2b are the same groups as the groups defined in the sixth aspect of the present invention described later] How to manufacture.
〔7〕下記式(TH-2a):
Figure JPOXMLDOC01-appb-C000017
[式(TH-2a)中、E、R1a、R1b、R2a及びR2bは、後述する本発明の第7の態様中に定義されている基と同じ基である]で表される化合物を製造する方法。
[7] the following formula (TH-2a):
Figure JPOXMLDOC01-appb-C000017
[Wherein E, R 1a , R 1b , R 2a and R 2b in the formula (TH-2a) are the same groups as the groups defined in the seventh aspect of the present invention described later] How to make a compound.
〔8〕下記式(I):
Figure JPOXMLDOC01-appb-C000018
[式(I)中、p、R1、R2a及びR2bは、後述する本発明の第4の態様中に定義されている基と同じ基である]で表される化合物を、式(TH-2)で表される化合物より製造する方法。
[8] The following formula (I):
Figure JPOXMLDOC01-appb-C000018
[Wherein, in the formula (I), p, R 1 , R 2a and R 2b are the same groups as the groups defined in the fourth embodiment of the present invention described later] A method of producing from a compound represented by TH-2).
〔9〕下記式(I-a):
Figure JPOXMLDOC01-appb-C000019
[式(I-a)中、R1a、R1b、R2a及びR2bは、後述する本発明の第5の態様中に定義されている基と同じ基である]で表される化合物を、式(TH-2a)で表される化合物より製造する方法。
[9] the following formula (I-a):
Figure JPOXMLDOC01-appb-C000019
[Wherein, in the formula (Ia), R 1a , R 1b , R 2a and R 2b are the same groups as the groups defined in the fifth aspect of the present invention described later] A method of producing from a compound represented by formula (TH-2a).
〔10〕下記(Scheme4)中[(Scheme4)中、p、E、R1、R2a及びR2bは、後述する本発明の第4の態様中に定義されている基と同じ基であり;各工程の反応条件は、後述する本発明の第4の態様中の各工程の反応条件と同じである]の、式(I)で表される化合物の製造方法、及び当該製造方法における中間体。
Figure JPOXMLDOC01-appb-C000020
[10] [(Scheme 4) in the following (Scheme 4), p, E, R 1 , R 2a and R 2b are the same groups as the groups defined in the fourth embodiment of the present invention described later; The reaction conditions of each step are the same as the reaction conditions of each step in the fourth aspect of the present invention described later], a method for producing a compound represented by formula (I), and an intermediate in the production method .
Figure JPOXMLDOC01-appb-C000020
〔11〕下記(Scheme5)中[(Scheme5)中、E、R1a、R1b、R2a及びR2bは、後述する本発明の第5の態様中に定義されている基と同じ基であり;各工程の反応条件は、後述する本発明の第5の態様中の各工程の反応条件と同じである]の、式(I-a)で表される化合物の製造方法、及び当該製造方法における中間体。
Figure JPOXMLDOC01-appb-C000021
[11] [(Scheme 5) in the following (Scheme 5), E, R 1a , R 1b , R 2a and R 2b are the same groups as the groups defined in the fifth aspect of the present invention described later A process for producing a compound represented by the formula (Ia), wherein the reaction conditions for the respective steps are the same as the reaction conditions for the respective steps in the fifth aspect of the present invention described later, and the process for the production Intermediates in.
Figure JPOXMLDOC01-appb-C000021
[本発明の態様]
 本発明の例示的な態様は、より具体的には、以下の態様[1]~[7]のとおりであり得る。
[1]本発明の第1の態様は、下記式(TH-2):
Figure JPOXMLDOC01-appb-C000022
[式(TH-2)中、pは、0~4の整数であり;
1は、各々独立して、ハロゲン原子、シアノ基、C1~6アルキル基、ハロゲン化C1~6アルキル基、ヒドロキシC1~6アルキル基、シアノ化C1~6アルキル基、ハロゲン化C1~6アルコキシ基、C1~6アルコキシC1~6アルキル基、モノ/ジC2~7アルカノイルアミノ基、カルボキサミド基、又はC1~6アルコキシカルボニル基から選ばれる基であり;R2a及びR2bは、各々独立して、C1~6アルキル基であり;
Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基から選ばれる基である]で表される化合物、又はその塩、又はそれらの溶媒和物である。
Aspects of the Invention
An exemplary aspect of the present invention may be more specifically as the following aspects [1] to [7].
[1] A first aspect of the present invention is a compound represented by the following formula (TH-2):
Figure JPOXMLDOC01-appb-C000022
[In the formula (TH-2), p is an integer of 0 to 4;
Each R 1 independently represents a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1-6 alkyl group, a cyanated C 1-6 alkyl group, a halogenated C 1 ~ 6 alkoxy group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, a mono / di C 2 ~ 7 alkanoylamino group, carboxamido group, or a group selected from C 1 ~ 6 alkoxycarbonyl group; R 2a And R 2b is each independently a C 1-6 alkyl group;
And E is a group selected from p-toluenesulfonyl group, benzenesulfonyl group, p-nitrobenzenesulfonyl group, 2,4-dinitrobenzenesulfonyl group, methanesulfonyl group, or trifluoromethanesulfonyl group. Or a salt thereof, or a solvate thereof.
[1-1]前記態様[1]の前記式(TH-2)の化合物において、pは、好ましくは、0~3の整数であり;より好ましくは、0~2の整数であり;更に好ましくは、0の整数である。 [1-1] In the compound of the above formula (TH-2) of the above aspect [1], p is preferably an integer of 0 to 3; more preferably an integer of 0 to 2; still more preferably Is an integer of 0.
[1-2]前記態様[1]の前記式(TH-2)の化合物において、R1は、好ましくは、ハロゲン原子、ヒドロキシC1~6アルキル基、C1~6アルコキシC1~6アルキル基、カルボキサミド基、又はC1~6アルコキシカルボニル基であり;より好ましくは、ハロゲン原子、又はC1~6アルコキシC1~6アルキル基であり;更に好ましくは、フッ素原子、臭素原子、又はメトキシメチル基である。 [1-2] In the compound of the formula (TH-2) according to the above aspect [1], R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy C 1-6 alkyl group, a carboxamide group, or a C 1 ~ 6 alkoxycarbonyl group; more preferably, a halogen atom, or a C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group; more preferably, a fluorine atom, a bromine atom, or methoxy It is a methyl group.
[1-3]前記態様[1]の前記式(TH-2)の化合物において、R2a及び/又はR2bは、好ましくは、メチル基である。 [1-3] In the compound of the formula (TH-2) according to the aspect [1], R 2a and / or R 2b is preferably a methyl group.
[1-4]前記態様[1]の前記式(TH-2)の化合物において、好ましくは、Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、又はメタンスルホニル基であり;より好ましくは、p-トルエンスルホニル基である。 [1-4] In the compound of the above formula (TH-2) of the above aspect [1], preferably, E is a p-toluenesulfonyl group, a benzenesulfonyl group, or a methanesulfonyl group; more preferably, p -Toluenesulfonyl group.
[1-5]前記態様[1]の前記式(TH-2)の化合物において、好ましくは、pは、0の整数であり;R2a及び/又はR2bは、メチル基であり;Eは、p-トルエンスルホニル基である。 [1-5] In the compound of the above formula (TH-2) of the above aspect [1], preferably p is an integer of 0; R 2a and / or R 2b is a methyl group; E is And p-toluenesulfonyl group.
[2]本発明の第2の態様は、下記式(TH-2a):
Figure JPOXMLDOC01-appb-C000023
[式(TH-2a)中、R1a及びR1bは、各々独立して、水素原子、ハロゲン原子、シアノ基、C1~6アルキル基、ハロゲン化C1~6アルキル基、ヒドロキシC1~6アルキル基、シアノ化C1~6アルキル基、ハロゲン化C1~6アルコキシ基、C1~6アルコキシC1~6アルキル基、モノ/ジC2~7アルカノイルアミノ基、カルボキサミド基、又はC1~6アルコキシカルボニル基から選ばれる基であり;
2a及びR2bは、各々独立して、C1~6アルキル基であり;
Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基から選ばれる基である]で表される化合物、又はその塩、又はそれらの溶媒和物である。
[2] A second aspect of the present invention is a compound represented by the following formula (TH-2a):
Figure JPOXMLDOC01-appb-C000023
[In Formula (TH-2a), R 1a and R 1b are each independently a hydrogen atom, a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1- 6 alkyl group, cyanated C 1 ~ 6 alkyl group, a halogenated C 1 ~ 6 alkoxy group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, mono / di C 2 ~ 7 alkanoylamino group, carboxamido group, or a C A group selected from 1 to 6 alkoxycarbonyl groups;
R 2a and R 2b are each independently a C 1-6 alkyl group;
And E is a group selected from p-toluenesulfonyl group, benzenesulfonyl group, p-nitrobenzenesulfonyl group, 2,4-dinitrobenzenesulfonyl group, methanesulfonyl group, or trifluoromethanesulfonyl group. Or a salt thereof, or a solvate thereof.
[2-1]前記態様[2]の前記式(TH-2a)の化合物において、R1a及びR1bは、好ましくは、各々独立して、水素原子、ハロゲン原子、ヒドロキシC1~6アルキル基、C1~6アルコキシC1~6アルキル基、カルボキサミド基、又はC1~6アルコキシカルボニル基であり;より好ましくは、R1aは、水素原子、ハロゲン原子、又はC1~6アルコキシC1~6アルキル基であり、R1bは、水素原子又はハロゲン原子であり;更に好ましくは、R1aは、水素原子、フッ素原子、臭素原子、又はメトキシメチル基であり、R1bは、水素原子、フッ素原子、又は臭素原子であり、より具体的にはR1a及びR1bの組合せは、(R1a、R1b)=(水素原子、水素原子)、(水素原子、臭素原子)、(臭素原子、水素原子)、(メトキシメチル基、水素原子)、(フッ素原子、水素原子)、(水素原子、フッ素原子)、(フッ素原子、フッ素原子)であり;特に好ましくは、R1a及びR1bは、水素原子である。 [2-1] In the compound of the formula (TH-2a) according to the above aspect [2], R 1a and R 1b are preferably each independently a hydrogen atom, a halogen atom, or a hydroxy C 1-6 alkyl group And C 1-6 alkoxy C 1-6 alkyl group, carboxamido group or C 1-6 alkoxycarbonyl group; more preferably, R 1a is a hydrogen atom, a halogen atom or C 1-6 alkoxy C 1 -C 6 6 alkyl group, R 1b is a hydrogen atom or a halogen atom; more preferably, R 1a is a hydrogen atom, a fluorine atom, a bromine atom or a methoxymethyl group, and R 1b is a hydrogen atom, a fluorine atom And the combination of R 1a and R 1b is (R 1a , R 1b ) = (hydrogen atom, hydrogen atom), (hydrogen atom, bromine atom), (bromine atom, Hydrogen atom), (methoxymethyl group, hydrogen atom) (Fluorine atom, hydrogen atom), be (hydrogen atom, a fluorine atom), (a fluorine atom, a fluorine atom); particularly preferably, R 1a and R 1b is hydrogen atom.
[2-2]前記態様[2]の前記式(TH-2a)の化合物において、R2a及び/又はR2bは、好ましくは、メチル基である。 [2-2] In the compound of the formula (TH-2a) of the aspect [2], R 2a and / or R 2b is preferably a methyl group.
[2-3]前記態様[2]の前記式(TH-2a)の化合物において、好ましくは、Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、又はメタンスルホニル基であり;より好ましくは、p-トルエンスルホニル基である。 [2-3] In the compound of the above formula (TH-2a) of the above aspect [2], preferably, E is p-toluenesulfonyl group, benzenesulfonyl group or methanesulfonyl group; more preferably p -Toluenesulfonyl group.
[2-4]前記態様[1]の前記式(TH-2)の化合物において、好ましくは、R1a及びR1bの組合せは、(R1a、R1b)=(水素原子、水素原子)、(水素原子、臭素原子)、(臭素原子、水素原子)、(メトキシメチル基、水素原子)、(フッ素原子、水素原子)、(水素原子、フッ素原子)、(フッ素原子、フッ素原子)であり;R2a及び/又はR2bは、メチル基であり;Eは、p-トルエンスルホニル基である。 [2-4] In the compound of the formula (TH-2) according to the above aspect [1], preferably, a combination of R 1a and R 1b is (R 1a , R 1b ) = (hydrogen atom, hydrogen atom), (Hydrogen atom, bromine atom), (bromine atom, hydrogen atom), (methoxymethyl group, hydrogen atom), (fluorine atom, hydrogen atom), (hydrogen atom, fluorine atom), (fluorine atom, fluorine atom) R 2a and / or R 2b is a methyl group; E is a p-toluenesulfonyl group.
[2-4-1]前記態様[2-4]の前記式(TH-2)の化合物において、より好ましくは、R1a及びR1bは、水素原子であり;R2a及び/又はR2bは、メチル基であり;Eは、p-トルエンスルホニル基である。 [2-4-1] In the compound of the formula (TH-2) according to the aspect [2-4], more preferably, R 1a and R 1b are a hydrogen atom; and R 2a and / or R 2b are , A methyl group; E is a p-toluenesulfonyl group.
[3]本発明の第3の態様は、前記態様[1]の前記式(TH-2)又は前記態様[2]の前記式(TH-2a)の化合物における、好ましい化合物としての、以下に列挙される化合物、又はその塩、又はそれらの溶媒和物である。
1,1-ジメチル-1,2,3,4-テトラヒドロナフタレン-2-イル 4-メチルベンゼンスルホネート;
6-フルオロ-1,1-ジメチル-1,2,3,4-テトラヒドロナフタレン-2-イル 4-メチルベンゼンスルホネート;
7-フルオロ-1,1-ジメチル-1,2,3,4-テトラヒドロナフタレン-2-イル 4-メチルベンゼンスルホネート;
6,7-ジフルオロ-1,1-ジメチル-1,2,3,4-テトラヒドロナフタレン-2-イル 4-メチルベンゼンスルホネート;
6-ブロモ-1,1-ジメチル-1,2,3,4-テトラヒドロナフタレン-2-イル 4-メチルベンゼンスルホネート;
7-ブロモ-1,1-ジメチル-1,2,3,4-テトラヒドロナフタレン-2-イル 4-メチルベンゼンスルホネート;
6-(メトキシメチル)-1,1-ジメチル-1,2,3,4-テトラヒドロナフタレン-2-イル 4-メチルベンゼンスルホネート。
[3] A third aspect of the present invention is a method as a preferable compound in the compound of the formula (TH-2) of the aspect [1] or the compound of the formula (TH-2a) of the aspect [2] below The listed compounds, or salts thereof, or solvates thereof.
1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4-methylbenzenesulfonate;
6-fluoro-1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4-methylbenzenesulfonate;
7-fluoro-1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4-methylbenzenesulfonate;
6,7-Difluoro-1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4-methylbenzenesulfonate;
6-bromo-1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4-methylbenzenesulfonate;
7-bromo-1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4-methylbenzenesulfonate;
6- (Methoxymethyl) -1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4-methylbenzenesulfonate.
[3-1]前記態様[3]の化合物において、より好ましい化合物は、1,1-ジメチル-1,2,3,4-テトラヒドロナフタレン-2-イル 4-メチルベンゼンスルホネート、又はその塩、又はそれらの溶媒和物である。 [3-1] In the compound of the above aspect [3], a more preferable compound is 1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4-methylbenzenesulfonate, or a salt thereof, or They are solvates.
[4]本発明の第4の態様は、下記式(I):
Figure JPOXMLDOC01-appb-C000024
[式(I)中、pは、0~4の整数であり;
1は、各々独立して、ハロゲン原子、シアノ基、C1~6アルキル基、ハロゲン化C1~6アルキル基、ヒドロキシC1~6アルキル基、シアノ化C1~6アルキル基、ハロゲン化C1~6アルコキシ基、C1~6アルコキシC1~6アルキル基、モノ/ジC2~7アルカノイルアミノ基、カルボキサミド基、又はC1~6アルコキシカルボニル基から選ばれる基であり;R2a及びR2bは、各々独立して、C1~6アルキル基である]で表される化合物を製造する方法であって、
 式(TH-1):
Figure JPOXMLDOC01-appb-C000025
[式(TH-1)中、p、R1、R2a及びR2bは、前記式(I)中に定義されている基と同じであり(式(TH-1)の一般的製造方法は、後述する式(TH-1)の製造方法を参照)]で表される化合物と、スルホニル化剤とを、塩基性溶媒中に加え、前記式(TH-1)で表される化合物と前記スルホニル化剤とを含む混合溶液を形成し、0℃から前記式(TH-1)で表される化合物と前記スルホニル化剤とを含む前記混合溶液が還流する温度で反応を行い、式(TH-2): 
Figure JPOXMLDOC01-appb-C000026
[式(TH-2)中、p、R1、R2a及びR2bは、前記式(I)中に定義されている基と同じであり;Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基から選ばれる基である]で表される化合物を得る工程(工程[4]-1)、及び
 式(TH-2)で表される化合物と、塩基とを、反応に関与しない溶媒中に加え、前記式(TH-2)で表される化合物と前記塩基とを含む混合溶液を形成し、0℃から前記式(TH-2)で表される化合物と前記塩基とを含む前記混合溶液が還流する温度で反応を行い、式(I)で表される化合物を得る工程(工程[4]-2)を含む製造方法である。
[4] The fourth aspect of the present invention is a compound of the following formula (I):
Figure JPOXMLDOC01-appb-C000024
[In the formula (I), p is an integer of 0 to 4;
Each R 1 independently represents a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1-6 alkyl group, a cyanated C 1-6 alkyl group, a halogenated C 1 ~ 6 alkoxy group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, a mono / di C 2 ~ 7 alkanoylamino group, carboxamido group, or a group selected from C 1 ~ 6 alkoxycarbonyl group; R 2a And R 2b are each independently a C 1-6 alkyl group], a method of producing a compound represented by
Formula (TH-1):
Figure JPOXMLDOC01-appb-C000025
[In the formula (TH-1), p, R 1 , R 2a and R 2b are the same as the groups defined in the above-mentioned formula (I) (a general production method of the formula (TH-1) is A compound represented by the formula (TH-1) and a sulfonylating agent are added to a basic solvent, and the compound represented by the formula (TH-1) and the above A mixed solution containing a sulfonylating agent is formed, and the reaction is performed at a temperature at which the mixed solution containing the compound represented by the formula (TH-1) and the sulfonylating agent is refluxed from 0 ° C. -2):
Figure JPOXMLDOC01-appb-C000026
[Wherein, in the formula (TH-2), p, R 1 , R 2a and R 2b are the same as the groups defined in the above formula (I); E is a p-toluenesulfonyl group, a benzenesulfonyl group , A step selected from the group consisting of p-nitrobenzenesulfonyl group, 2,4-dinitrobenzenesulfonyl group, methanesulfonyl group, and trifluoromethanesulfonyl group] (step [4] -1), The compound represented by the formula (TH-2) and a base are added to a solvent not involved in the reaction to form a mixed solution containing the compound represented by the formula (TH-2) and the base, A step of reacting at 0 ° C. to a temperature at which the mixed solution containing the base and the compound represented by the formula (TH-2) refluxes to obtain a compound represented by the formula (I) (step [4] -2).
[4-1]前記態様[4]の前記式(I)の化合物の製造方法において、pは、好ましくは、0~3の整数であり;より好ましくは、0~2の整数であり;更に好ましくは、0の整数である。 [4-1] In the method for producing a compound of the formula (I) according to the above aspect [4], p is preferably an integer of 0 to 3; more preferably an integer of 0 to 2; Preferably, it is an integer of 0.
[4-2]前記態様[4]の前記式(I)の化合物の製造方法において、R1は、好ましくは、ハロゲン原子、ヒドロキシC1~6アルキル基、C1~6アルコキシC1~6アルキル基、カルボキサミド基、又はC1~6アルコキシカルボニル基であり;より好ましくは、ハロゲン原子、又はC1~6アルコキシC1~6アルキル基であり;更に好ましくは、フッ素原子、臭素原子、又はメトキシメチル基である。R1が複数ある場合、R1は同じでも異なっていてもよい。 [4-2] In the method for producing a compound of the formula (I) according to the above aspect [4], R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy C 1-6 It is an alkyl group, a carboxamido group, or a C 1-6 alkoxycarbonyl group; more preferably a halogen atom or a C 1-6 alkoxy C 1-6 alkyl group; still more preferably a fluorine atom, a bromine atom, or It is a methoxymethyl group. When there are multiple R 1 s , R 1 s may be the same or different.
[4-3]前記態様[4]の前記式(I)の化合物の製造方法において、R2a及び/又はR2bは、好ましくは、メチル基である。 [4-3] In the method for producing the compound of the formula (I) according to the above aspect [4], R 2a and / or R 2b is preferably a methyl group.
[4-4]前記態様[4]の前記式(I)の化合物の製造方法において、Eは、好ましくは、p-トルエンスルホニル基、ベンゼンスルホニル基、又はメタンスルホニル基であり;より好ましくは、p-トルエンスルホニル基である。 [4-4] In the method for producing a compound of the formula (I) according to the above aspect [4], E is preferably p-toluenesulfonyl group, benzenesulfonyl group, or methanesulfonyl group; more preferably p-toluenesulfonyl group.
[4-5]前記態様[4]の前記式(I)の化合物の製造方法の(工程[4]-1)において、好ましくは、スルホニル化剤は、p-トルエンスルホニルクロリド、p-トルエンスルホン酸無水物、ベンゼンスルホニルクロリド、p-ニトロベンゼンスルホニルクロリド、2,4-ジニトロベンゼンスルホニルクロリド、メタンスルホニルクロリド、又はトリフルオロメタンスルホン酸無水物であり;より好ましくは、p-トルエンスルホニルクロリド、p-トルエンスルホン酸無水物、ベンゼンスルホニルクロリド、又はメタンスルホニルクロリドであり;更に好ましくは、p-トルエンスルホニルクロリド、又はp-トルエンスルホン酸無水物であり;特に好ましくは、p-トルエンスルホニルクロリドである。 [4-5] In (Step [4] -1) of the process for producing a compound of Formula (I) according to Aspect [4], preferably, the sulfonylating agent is p-toluenesulfonyl chloride, p-toluenesulfone Acid anhydride, benzenesulfonyl chloride, p-nitrobenzenesulfonyl chloride, 2,4-dinitrobenzenesulfonyl chloride, methanesulfonyl chloride, or trifluoromethanesulfonic acid anhydride; more preferably p-toluenesulfonyl chloride, p-toluene Sulfonic acid anhydride, benzene sulfonyl chloride or methane sulfonyl chloride; more preferably p-toluene sulfonyl chloride or p-toluene sulfonic acid anhydride; and particularly preferably p-toluene sulfonyl chloride.
[4-6]前記態様[4]の前記式(I)の化合物の製造方法の(工程[4]-1)において、好ましくは、塩基性溶媒は、ピリジン、トリエチルアミン、N,N-ジイソプロピルエチルアミン、又は2,6-ルチジンであり;より好ましくは、ピリジンである。 [4-6] In (Step [4] -1) of the process for producing a compound of Formula (I) according to Aspect [4], preferably, the basic solvent is pyridine, triethylamine, N, N-diisopropylethylamine Or 2,6-lutidine; more preferably pyridine.
[4-7]前記態様[4]の前記式(I)の化合物の製造方法の(工程[4]-1)において、好ましくは、反応温度は0℃から室温である。 [4-7] In (Step [4] -1) of the process for producing a compound of Formula (I) according to Aspect [4], preferably, the reaction temperature is 0 ° C. to room temperature.
[4-8]前記態様[4]の前記式(I)の化合物の製造方法の(工程[4]-2)において、好ましくは、塩基は、カリウムtert-ブトキシド、ナトリウムtert-ブトキシド、ナトリウムエトキシド、水素化ナトリウム、又は1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)であり;より好ましくは、カリウムtert-ブトキシド、又はナトリウムtert-ブトキシドであり;更に好ましくは、カリウムtert-ブトキシドである。 [4-8] In (Step [4] -2) of the process for producing a compound of Formula (I) according to Aspect [4], preferably, the base is potassium tert-butoxide, sodium tert-butoxide, sodium ethoxy Sodium hydride or 1,8-diazabicyclo [5.4.0] -7-undecene (DBU); more preferably potassium tert-butoxide or sodium tert-butoxide; still more preferably It is potassium tert-butoxide.
[4-9]前記態様[4]の前記式(I)の化合物の製造方法の(工程[4]-2)において、好ましくは、反応に関与しない溶媒は、tert-ブチルアルコール、ジメチルスルホキシド(DMSO)、又はN-メチルピロリドン(NMP)であり;より好ましくは、tert-ブチルアルコールである。 [4-9] In (Step [4] -2) of the process for producing a compound of Formula (I) according to Aspect [4], preferably, the solvent not involved in the reaction is tert-butyl alcohol, dimethyl sulfoxide ( DMSO) or N-methyl pyrrolidone (NMP); more preferably tert-butyl alcohol.
[4-10]前記態様[4]の前記式(I)の化合物の製造方法の(工程[4]-2)において、好ましくは、反応温度は室温から80℃である。 [4-10] In (Step [4] -2) of the process for producing a compound of Formula (I) according to Aspect [4], preferably, the reaction temperature is from room temperature to 80.degree.
[4-11]前記態様[4]の前記式(I)の化合物の製造方法において、好ましくは、pは0~2の整数であり;R1は、フッ素原子、臭素原子、又はメトキシメチル基であり;R2a及び/又はR2bはメチル基であり;(工程[4]-1)において、スルホニル化剤はp-トルエンスルホニルクロリドであり、塩基性溶媒はピリジンであり、反応温度は0℃から室温であり;(工程[4]-2)において、塩基はカリウムtert-ブトキシドであり、溶媒はtert-ブチルアルコールであり、反応温度は室温から80℃である。 [4-11] In the method for producing a compound of the formula (I) according to the aspect [4], preferably, p is an integer of 0 to 2; R 1 is a fluorine atom, a bromine atom, or a methoxymethyl group R 2a and / or R 2b is a methyl group; in (Step [4] -1), the sulfonylating agent is p-toluenesulfonyl chloride, the basic solvent is pyridine, and the reaction temperature is 0 C. to room temperature; (Step [4] -2), the base is potassium tert-butoxide, the solvent is tert-butyl alcohol, and the reaction temperature is room temperature to 80.degree.
[4-12]前記態様[4]の前記式(I)の化合物の製造方法において、好ましくは、pは0の整数であり;R2a及び/又はR2bはメチル基であり;(工程[4]-1)において、スルホニル化剤はp-トルエンスルホニルクロリドであり、塩基性溶媒はピリジンであり、反応温度は0℃から室温であり;(工程[4]-2)において、塩基はカリウムtert-ブトキシドであり、溶媒はtert-ブチルアルコールであり、反応温度は室温から80℃である。 [4-12] In the method for producing a compound of the formula (I) according to the aspect [4], preferably, p is an integer of 0; and R 2a and / or R 2b is a methyl group; In 4] -1), the sulfonylating agent is p-toluenesulfonyl chloride, the basic solvent is pyridine, and the reaction temperature is from 0 ° C. to room temperature; in (Step [4] -2), the base is potassium The solvent is tert-butyl alcohol, and the reaction temperature is from room temperature to 80.degree.
[5]本発明の第5の態様は、下記式(I-a):
Figure JPOXMLDOC01-appb-C000027
[式(I-a)中、R1a及びR1bは、各々独立して、水素原子、ハロゲン原子、シアノ基、C1~6アルキル基、ハロゲン化C1~6アルキル基、ヒドロキシC1~6アルキル基、シアノ化C1~6アルキル基、ハロゲン化C1~6アルコキシ基、C1~6アルコキシC1~6アルキル基、モノ/ジC2~7アルカノイルアミノ基、カルボキサミド基、又はC1~6アルコキシカルボニル基から選ばれる基であり;R2a及びR2bは、各々独立して、C1~6アルキル基である]で表される化合物を製造する方法であって、
 式(TH-1a):
Figure JPOXMLDOC01-appb-C000028
[式(TH-1a)中、R1a、R1b、R2a及びR2bは、前記式(I-a)中に定義されている基と同じであり(式(TH-1a)の製造方法は、後述する式(TH-1)の製造方法に準じる)]で表される化合物と、スルホニル化剤とを、塩基性溶媒中に加え、前記式(TH-1a)で表される化合物と前記スルホニル化剤とを含む混合溶液を形成し、0℃から前記式(TH-1a)で表される化合物と前記スルホニル化剤とを含む前記混合溶液が還流する温度で反応を行い、式(TH-2a): 
Figure JPOXMLDOC01-appb-C000029
[式(TH-2a)中、R1a、R1b、R2a及びR2bは、前記式(I-a)中に定義されている基と同じであり;Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基から選ばれる基である]で表される化合物を得る工程(工程[5]-1)、及び
 式(TH-2a)で表される化合物と、塩基とを、反応に関与しない溶媒中で、0℃から前記式(TH-2a)で表される化合物と前記塩基とを含む前記混合溶液が還流する温度で反応を行い、式(I-a)で表される化合物を得る工程(工程[5]-2)を含む製造方法である。
[5] A fifth aspect of the present invention is a compound of the following formula (Ia):
Figure JPOXMLDOC01-appb-C000027
[In formula (I-a), R 1a and R 1b are each independently a hydrogen atom, a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1- 6 alkyl group, cyanated C 1 ~ 6 alkyl group, a halogenated C 1 ~ 6 alkoxy group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, mono / di C 2 ~ 7 alkanoylamino group, carboxamido group, or a C A method of producing a compound represented by the formula: R 2a and R 2b each independently represents a C 1 to 6 alkyl group, which is a group selected from 1 to 6 alkoxycarbonyl groups;
Formula (TH-1a):
Figure JPOXMLDOC01-appb-C000028
[In Formula (TH-1a), R 1a , R 1b , R 2a and R 2b are the same as the groups defined in Formula (I-a) above (a method for producing Formula (TH-1a) Is the same as the method for producing formula (TH-1) described later) and a sulfonylating agent in a basic solvent, and A mixed solution containing the sulfonylating agent is formed, and the reaction is performed at a temperature at which the mixed solution containing the compound represented by the formula (TH-1a) and the sulfonylating agent is refluxed from 0 ° C. TH-2a):
Figure JPOXMLDOC01-appb-C000029
[Wherein, in the formula (TH-2a), R 1a , R 1b , R 2a and R 2b are the same as the group defined in the formula (I-a); E is a p-toluenesulfonyl group, A step of obtaining a compound represented by a benzenesulfonyl group, a p-nitrobenzenesulfonyl group, a 2,4-dinitrobenzenesulfonyl group, a methanesulfonyl group, or a trifluoromethanesulfonyl group] (step [5] -1) And a compound represented by the formula (TH-2a) and the base, in a solvent which does not participate in the reaction, from 0 ° C. to the compound represented by the formula (TH-2a) and the base The reaction is carried out at a temperature at which the mixed solution refluxes to obtain a compound represented by the formula (Ia) (step [5] -2).
[5-1]前記態様[5]の前記式(I-a)の化合物の製造方法において、R1a及びR1bは、好ましくは、各々独立して、水素原子、ハロゲン原子、ヒドロキシC1~6アルキル基、C1~6アルコキシC1~6アルキル基、カルボキサミド基、又はC1~6アルコキシカルボニル基であり;より好ましくは、R1aは、水素原子、ハロゲン原子、又はC1~6アルコキシC1~6アルキル基であり、R1bは、水素原子又はハロゲン原子であり;更に好ましくは、R1aは、水素原子、フッ素原子、臭素原子、又はメトキシメチル基であり、R1bは、水素原子、フッ素原子、又は臭素原子であり、より具体的にはR1a及びR1bの組合せは、(R1a、R1b)=(水素原子、水素原子)、(水素原子、臭素原子)、(臭素原子、水素原子)、(メトキシメチル基、水素原子)、(フッ素原子、水素原子)、(水素原子、フッ素原子)、(フッ素原子、フッ素原子)であり;特に好ましくは、R1a及びR1bは水素原子である。 [5-1] In the method for producing a compound of the formula (I-a) according to the above aspect [5], R 1a and R 1 b are preferably each independently a hydrogen atom, a halogen atom, a hydroxy C 1 6 alkyl group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, a carboxamide group, or a C 1 ~ 6 alkoxycarbonyl group; more preferably, R 1a is a hydrogen atom, a halogen atom, or a C 1 ~ 6 alkoxy A C 1-6 alkyl group, R 1b is a hydrogen atom or a halogen atom; more preferably, R 1a is a hydrogen atom, a fluorine atom, a bromine atom or a methoxymethyl group, and R 1b is a hydrogen atom A combination of R 1a and R 1b which is an atom, a fluorine atom or a bromine atom, more specifically (R 1a , R 1b ) = (hydrogen atom, hydrogen atom), (hydrogen atom, bromine atom), Bromine atom, hydrogen atom), (methoxymethyl group, hydrogen) Child), it is a (fluorine atom, hydrogen atom), (hydrogen atom, a fluorine atom), (a fluorine atom, a fluorine atom); Particularly preferably, R 1a and R 1b is hydrogen atom.
[5-2]前記態様[5]の前記式(I-a)の化合物の製造方法において、R2a及び/又はR2bは、好ましくは、メチル基である。 [5-2] In the method for producing a compound of the formula (Ia) according to the aspect [5], R 2a and / or R 2b is preferably a methyl group.
[5-3]前記態様[5]の前記式(I-a)の化合物の製造方法において、Eは、好ましくは、p-トルエンスルホニル基、ベンゼンスルホニル基、又はメタンスルホニル基であり;より好ましくは、p-トルエンスルホニル基である。 [5-3] In the method for producing a compound of the formula (I-a) according to the aspect [5], E is preferably p-toluenesulfonyl group, benzenesulfonyl group or methanesulfonyl group; more preferably Is a p-toluenesulfonyl group.
[5-4]前記態様[5]の前記式(I-a)の化合物の製造方法の(工程[5]-1)において、好ましくは、スルホニル化剤は、p-トルエンスルホニルクロリド、p-トルエンスルホン酸無水物、ベンゼンスルホニルクロリド、p-ニトロベンゼンスルホニルクロリド、2,4-ジニトロベンゼンスルホニルクロリド、メタンスルホニルクロリド、又はトリフルオロメタンスルホン酸無水物であり;より好ましくは、p-トルエンスルホニルクロリド、p-トルエンスルホン酸無水物、ベンゼンスルホニルクロリド、又はメタンスルホニルクロリドであり;更に好ましくは、p-トルエンスルホニルクロリド、又はp-トルエンスルホン酸無水物であり;特に好ましくは、p-トルエンスルホニルクロリドである。 [5-4] In (Step [5] -1) of the process for producing a compound of Formula (I-a) according to Aspect [5], preferably, the sulfonylating agent is p-toluenesulfonyl chloride, p- Toluenesulfonic anhydride, benzenesulfonyl chloride, p-nitrobenzenesulfonyl chloride, 2,4-dinitrobenzenesulfonyl chloride, methanesulfonyl chloride, or trifluoromethanesulfonic anhydride; more preferably p-toluenesulfonyl chloride, p -Toluenesulfonic acid anhydride, benzenesulfonyl chloride, or methanesulfonyl chloride; more preferably p-toluenesulfonyl chloride or p-toluenesulfonic acid anhydride; particularly preferably p-toluenesulfonyl chloride .
[5-5]前記態様[5]の前記式(I-a)の化合物の製造方法の(工程[5]-1)において、好ましくは、塩基性溶媒は、ピリジン、トリエチルアミン、N,N-ジイソプロピルエチルアミン、又は2,6-ルチジンであり;より好ましくは、ピリジンである。 [5-5] In (Step [5] -1) of the process for producing a compound of Formula (I-a) according to Aspect [5], preferably, the basic solvent is pyridine, triethylamine, N, N- Diisopropylethylamine or 2,6-lutidine; more preferably pyridine.
[5-6]前記態様[5]の前記式(I-a)の化合物の製造方法の(工程[5]-1)において、好ましくは、反応温度は0℃から室温である。 [5-6] In (Step [5] -1) of the process for producing a compound of Formula (I-a) according to Aspect [5], preferably, the reaction temperature is 0 ° C. to room temperature.
[5-7]前記態様[5]の前記式(I-a)の化合物の製造方法の(工程[5]-2)において、好ましくは、塩基は、カリウムtert-ブトキシド、ナトリウムtert-ブトキシド、ナトリウムエトキシド、水素化ナトリウム、又は1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)であり;より好ましくは、カリウムtert-ブトキシド、ナトリウムtert-ブトキシド、又はナトリウムエトキシドであり;更に好ましくは、カリウムtert-ブトキシドである。 [5-7] In (Step [5] -2) of the process for producing a compound of Formula (I-a) according to Aspect [5], preferably, the base is potassium tert-butoxide, sodium tert-butoxide, Sodium ethoxide, sodium hydride or 1,8-diazabicyclo [5.4.0] -7-undecene (DBU); more preferably potassium tert-butoxide, sodium tert-butoxide or sodium ethoxide More preferably potassium tert-butoxide.
[5-8]前記態様[5]の前記式(I-a)の化合物の製造方法の(工程[5]-2)において、好ましくは、反応に関与しない溶媒は、tert-ブチルアルコール、ジメチルスルホキシド(DMSO)、又はN-メチルピロリドン(NMP)であり;より好ましくは、tert-ブチルアルコールである。 [5-8] In (Step [5] -2) of the process for producing a compound of Formula (I-a) according to Aspect [5], preferably, the solvent not involved in the reaction is tert-butyl alcohol, dimethyl Sulfoxide (DMSO) or N-methyl pyrrolidone (NMP); more preferably tert-butyl alcohol.
[5-9]前記態様[5]の前記式(I-a)の化合物の製造方法の(工程[5]-2)において、好ましくは、反応温度は室温から80℃である。 [5-9] In (Step [5] -2) of the method for producing a compound of Formula (I-a) according to Aspect [5], preferably, the reaction temperature is from room temperature to 80.degree.
[5-10]前記態様[5]の前記式(I-a)の化合物の製造方法において、好ましくは、R1a及びR1bの組合せは、(R1a、R1b)=(水素原子、水素原子)、(水素原子、臭素原子)、(臭素原子、水素原子)、(メトキシメチル基、水素原子)、(フッ素原子、水素原子)、(水素原子、フッ素原子)、(フッ素原子、フッ素原子)であり;R2a及び/又はR2bはメチル基であり;(工程[5]-1)において、スルホニル化剤はp-トルエンスルホニルクロリドであり、塩基性溶媒はピリジンであり、反応温度は0℃から室温であり;(工程[5]-2)において、塩基はカリウムtert-ブトキシドであり、溶媒はtert-ブチルアルコールであり、反応温度は室温から80℃である。 [5-10] In the method for producing a compound of the formula (Ia) according to the above aspect [5], preferably, the combination of R 1a and R 1b is (R 1a , R 1b ) = (hydrogen atom, hydrogen Atom), (hydrogen atom, bromine atom), (bromine atom, hydrogen atom), (methoxymethyl group, hydrogen atom), (fluorine atom, hydrogen atom), (hydrogen atom, fluorine atom), (fluorine atom, fluorine atom) R 2a and / or R 2b is a methyl group; in (Step [5] -1), the sulfonylating agent is p-toluenesulfonyl chloride, the basic solvent is pyridine, and the reaction temperature is C. to room temperature; (Step [5] -2), the base is potassium tert-butoxide, the solvent is tert-butyl alcohol, and the reaction temperature is room temperature to 80.degree.
[5-11]前記態様[5]の前記式(I-a)の化合物の製造方法において、好ましくは、R1a及びR1bは水素原子であり;R2a及び/又はR2bはメチル基であり;(工程[5]-1)において、スルホニル化剤はp-トルエンスルホニルクロリドであり、塩基性溶媒はピリジンであり、反応温度は0℃から室温であり;(工程[5]-2)において、塩基はカリウムtert-ブトキシドであり、溶媒はtert-ブチルアルコールであり、反応温度は室温から80℃である。 [5-11] In the method for producing a compound of the formula (Ia) according to the above aspect [5], preferably, R 1a and R 1b are hydrogen atoms; and R 2a and / or R 2b are methyl groups (Step [5] -1), the sulfonylating agent is p-toluenesulfonyl chloride, the basic solvent is pyridine, and the reaction temperature is from 0 ° C. to room temperature; (step [5] -2) In the above, the base is potassium tert-butoxide, the solvent is tert-butyl alcohol, and the reaction temperature is from room temperature to 80.degree.
[6]本発明の第6の態様は、下記式(TH-2):
Figure JPOXMLDOC01-appb-C000030
[式(TH-2)中、pは、0~4の整数であり;
1は、各々独立して、ハロゲン原子、シアノ基、C1~6アルキル基、ハロゲン化C1~6アルキル基、ヒドロキシC1~6アルキル基、シアノ化C1~6アルキル基、ハロゲン化C1~6アルコキシ基、C1~6アルコキシC1~6アルキル基、モノ/ジC2~7アルカノイルアミノ基、カルボキサミド基、又はC1~6アルコキシカルボニル基から選ばれる基であり;R2a及びR2bは、各々独立して、C1~6アルキル基であり;Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基から選ばれる基である]で表される化合物を製造する方法であって、式(TH-1):
Figure JPOXMLDOC01-appb-C000031
[式(TH-1)中、p、R1、R2a及びR2bは、前記式(TH-2)中に定義されている基と同じであり]で表される化合物とスルホニル化剤とを塩基性溶媒中に加え、前記式(TH-1)で表される化合物と前記スルホニル化剤とを含む混合溶液を形成し、0℃から前記式(TH-1)で表される化合物と前記スルホニル化剤とを含む前記混合溶液が還流する温度で反応を行い、式(TH-2)で表される化合物を得る製造方法である。
[6] A sixth aspect of the present invention relates to a compound represented by the following formula (TH-2):
Figure JPOXMLDOC01-appb-C000030
[In the formula (TH-2), p is an integer of 0 to 4;
Each R 1 independently represents a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1-6 alkyl group, a cyanated C 1-6 alkyl group, a halogenated C 1 ~ 6 alkoxy group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, a mono / di C 2 ~ 7 alkanoylamino group, carboxamido group, or a group selected from C 1 ~ 6 alkoxycarbonyl group; R 2a And R 2b are each independently a C 1-6 alkyl group; E is a p-toluenesulfonyl group, a benzenesulfonyl group, a p-nitrobenzenesulfonyl group, a 2,4-dinitrobenzenesulfonyl group, a methanesulfonyl group Or a method selected from trifluoromethanesulfonyl group], and a method for producing a compound represented by the formula (TH-1):
Figure JPOXMLDOC01-appb-C000031
[In the formula (TH-1), p, R 1 , R 2a and R 2b are the same as the group defined in the above formula (TH-2)] and a sulfonylating agent In a basic solvent to form a mixed solution containing the compound represented by the formula (TH-1) and the sulfonylating agent, and from 0 ° C. to the compound represented by the formula (TH-1) The reaction is carried out at a temperature at which the mixed solution containing the sulfonylating agent is refluxed to obtain a compound represented by the formula (TH-2).
[6-1]前記態様[6]の前記式(TH-2)の化合物の製造方法において、pは、好ましくは、0~3の整数であり;より好ましくは、0~2の整数であり;更に好ましくは、0の整数である。 [6-1] In the method for producing a compound of the formula (TH-2) according to the above aspect [6], p is preferably an integer of 0 to 3; more preferably an integer of 0 to 2 More preferably an integer of 0.
[6-2]前記態様[6]の前記式(TH-2)の化合物の製造方法において、R1は、好ましくは、ハロゲン原子、ヒドロキシC1~6アルキル基、C1~6アルコキシC1~6アルキル基、カルボキサミド基、又はC1~6アルコキシカルボニル基であり;より好ましくは、ハロゲン原子、又はC1~6アルコキシC1~6アルキル基であり;更に好ましくは、フッ素原子、臭素原子、又はメトキシメチル基である。R1が複数ある場合、R1は同じでも異なっていてもよい。 [6-2] In the method for producing a compound of the formula (TH-2) according to the above aspect [6], R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy C 1 1-6 alkyl group, a carboxamide group, or a C 1 - 6 alkoxycarbonyl group; more preferably, a halogen atom, or a C 1 - 6 alkoxy C 1 - 6 alkyl group; more preferably, a fluorine atom, a bromine atom Or a methoxymethyl group. When there are multiple R 1 s , R 1 s may be the same or different.
[6-3]前記態様[6]の前記式(TH-2)の化合物の製造方法において、R2a及び/又はR2bは、好ましくは、メチル基である。 [6-3] In the method for producing a compound of the formula (TH-2) according to the above aspect [6], R 2a and / or R 2b is preferably a methyl group.
[6-4]前記態様[6]の前記式(TH-2)の化合物の製造方法において、Eは、好ましくは、p-トルエンスルホニル基、ベンゼンスルホニル基、又はメタンスルホニル基であり;より好ましくは、p-トルエンスルホニル基である。 [6-4] In the method for producing a compound of the formula (TH-2) according to the above aspect [6], E is preferably p-toluenesulfonyl group, benzenesulfonyl group or methanesulfonyl group; more preferably Is a p-toluenesulfonyl group.
[6-5]前記態様[6]の前記式(TH-2)の化合物の製造方法において、好ましくは、スルホニル化剤は、p-トルエンスルホニルクロリド、p-トルエンスルホン酸無水物、ベンゼンスルホニルクロリド、p-ニトロベンゼンスルホニルクロリド、2,4-ジニトロベンゼンスルホニルクロリド、メタンスルホニルクロリド、又はトリフルオロメタンスルホン酸無水物であり;より好ましくは、p-トルエンスルホニルクロリド、p-トルエンスルホン酸無水物、ベンゼンスルホニルクロリド、又はメタンスルホニルクロリドであり;更に好ましくは、p-トルエンスルホニルクロリド、又はp-トルエンスルホン酸無水物であり;特に好ましくは、p-トルエンスルホニルクロリドである。 [6-5] In the method for producing a compound of the formula (TH-2) according to the above aspect [6], preferably, the sulfonylating agent is p-toluenesulfonyl chloride, p-toluenesulfonic acid anhydride, benzenesulfonyl chloride P-nitrobenzenesulfonyl chloride, 2,4-dinitrobenzenesulfonyl chloride, methanesulfonyl chloride, or trifluoromethanesulfonic acid anhydride; more preferably p-toluenesulfonyl chloride, p-toluenesulfonic acid anhydride, benzenesulfonyl More preferably, p-toluenesulfonyl chloride or p-toluenesulfonic acid anhydride; and particularly preferably p-toluenesulfonyl chloride.
[6-6]前記態様[6]の前記式(TH-2)の化合物の製造方法において、好ましくは、塩基性溶媒は、ピリジン、トリエチルアミン、N,N-ジイソプロピルエチルアミン、又は2,6-ルチジンであり;より好ましくは、ピリジンである。 [6-6] In the method for producing a compound of the formula (TH-2) according to the above aspect [6], preferably, the basic solvent is pyridine, triethylamine, N, N-diisopropylethylamine, or 2,6-lutidine More preferably pyridine.
[6-7]前記態様[6]の前記式(TH-2)の化合物の製造方法において、好ましくは、反応温度は0℃から室温である。 [6-7] In the method for producing a compound of the formula (TH-2) according to the above aspect [6], preferably, the reaction temperature is 0 ° C. to room temperature.
[6-8]前記態様[6]の前記式(TH-2)の化合物の製造方法において、好ましくは、pは0~2の整数であり;R1は、フッ素原子、臭素原子、又はメトキシメチル基であり;R2a及び/又はR2bはメチル基であり;スルホニル化剤はp-トルエンスルホニルクロリドであり、塩基性溶媒はピリジンであり、反応温度は0℃から室温である。 [6-8] In the method for producing a compound of the formula (TH-2) according to the above aspect [6], preferably, p is an integer of 0 to 2; R 1 is a fluorine atom, a bromine atom, or methoxy R 2a and / or R 2b is a methyl group; the sulfonylating agent is p-toluenesulfonyl chloride, the basic solvent is pyridine, and the reaction temperature is from 0 ° C. to room temperature.
[6-9]前記態様[6]の前記式(TH-2)の化合物の製造方法において、好ましくは、pは0の整数であり;R2a及び/又はR2bはメチル基であり;スルホニル化剤はp-トルエンスルホニルクロリドであり、塩基性溶媒はピリジンであり、反応温度は0℃から室温である。 [6-9] In the method for producing a compound of the formula (TH-2) according to the above aspect [6], preferably, p is an integer of 0; R 2a and / or R 2b is a methyl group; sulfonyl The agent is p-toluenesulfonyl chloride, the basic solvent is pyridine, and the reaction temperature is 0 ° C. to room temperature.
[7]本発明の第7の態様は、下記式(TH-2a):
Figure JPOXMLDOC01-appb-C000032
[式(TH-2a)中、R1a及びR1bは、各々独立して、水素原子、ハロゲン原子、シアノ基、C1~6アルキル基、ハロゲン化C1~6アルキル基、ヒドロキシC1~6アルキル基、シアノ化C1~6アルキル基、ハロゲン化C1~6アルコキシ基、C1~6アルコキシC1~6アルキル基、モノ/ジC2~7アルカノイルアミノ基、カルボキサミド基、又はC1~6アルコキシカルボニル基から選ばれる基であり;R2a及びR2bは、各々独立して、C1~6アルキル基であり;Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基から選ばれる基である]で表される化合物を製造する方法であって、式(TH-1a):
Figure JPOXMLDOC01-appb-C000033
[式(TH-1a)中、R1a、R1b、R2a及びR2bは、前記式(TH-2a)中に定義されている基と同じであり(式(TH-1a)の製造方法は、後述する式(TH-1)の製造方法に準じる)]で表される化合物とスルホニル化剤とを塩基性溶媒中に加え、前記式(TH-1a)で表される化合物と前記スルホニル化剤とを含む混合溶液を形成し、0℃から前記式(TH-1a)で表される化合物と前記スルホニル化剤とを含む前記混合溶液が還流する温度で反応を行い、式(TH-2a)で表される化合物を得る製造方法である。
[7] A seventh aspect of the present invention provides a compound represented by formula (TH-2a):
Figure JPOXMLDOC01-appb-C000032
[In Formula (TH-2a), R 1a and R 1b are each independently a hydrogen atom, a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1- 6 alkyl group, cyanated C 1 ~ 6 alkyl group, a halogenated C 1 ~ 6 alkoxy group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, mono / di C 2 ~ 7 alkanoylamino group, carboxamido group, or a C It is a group selected from 1-6 alkoxycarbonyl group; R 2a and R 2b are each independently a C 1-6 alkyl group; E is, p- toluenesulfonyl group, a benzenesulfonyl group, p- nitrobenzene A method of producing a compound represented by the formula (TH-1a), which is a group selected from a sulfonyl group, a 2,4-dinitrobenzenesulfonyl group, a methanesulfonyl group, and a trifluoromethanesulfonyl group;
Figure JPOXMLDOC01-appb-C000033
[In the formula (TH-1a), R 1a , R 1b , R 2a and R 2b are the same as the groups defined in the above-mentioned formula (TH-2a) (a method for producing the formula (TH-1a) The compound represented by the formula (TH-1a) and the sulfonyl are added by adding a compound represented by the formula (TH-1) described below and a sulfonylating agent to a basic solvent, The reaction is performed at a temperature at which the mixed solution containing the compound represented by the formula (TH-1a) and the sulfonylating agent is refluxed from 0 ° C. It is a manufacturing method which obtains the compound represented by 2a).
[7-1]前記態様[7]の前記式(TH-2a)の化合物の製造方法において、R1a及びR1bは、好ましくは、各々独立して、水素原子、ハロゲン原子、ヒドロキシC1~6アルキル基、C1~6アルコキシC1~6アルキル基、カルボキサミド基、又はC1~6アルコキシカルボニル基であり;より好ましくは、R1aは、水素原子、ハロゲン原子、又はC1~6アルコキシC1~6アルキル基であり、R1bは、水素原子又はハロゲン原子であり;更に好ましくは、R1aは、水素原子、フッ素原子、臭素原子、又はメトキシメチル基であり、R1bは、水素原子、フッ素原子、又は臭素原子であり、より具体的にはR1a及びR1bの組合せは、(R1a、R1b)=(水素原子、水素原子)、(水素原子、臭素原子)、(臭素原子、水素原子)、(メトキシメチル基、水素原子)、(フッ素原子、水素原子)、(水素原子、フッ素原子)、(フッ素原子、フッ素原子)であり;特に好ましくは、R1a及びR1bは水素原子である。 [7-1] In the method for producing a compound of the formula (TH-2a) according to the above aspect [7], R 1a and R 1b are preferably each independently a hydrogen atom, a halogen atom, a hydroxy C 1 6 alkyl group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, a carboxamide group, or a C 1 ~ 6 alkoxycarbonyl group; more preferably, R 1a is a hydrogen atom, a halogen atom, or a C 1 ~ 6 alkoxy A C 1-6 alkyl group, R 1b is a hydrogen atom or a halogen atom; more preferably, R 1a is a hydrogen atom, a fluorine atom, a bromine atom or a methoxymethyl group, and R 1b is a hydrogen atom A combination of R 1a and R 1b which is an atom, a fluorine atom or a bromine atom, more specifically (R 1a , R 1b ) = (hydrogen atom, hydrogen atom), (hydrogen atom, bromine atom), Bromine atom, hydrogen atom), (methoxymethyl group, Atom), (fluorine atom, hydrogen atom), (hydrogen atom, a fluorine atom), it is (fluorine atom, a fluorine atom); particularly preferably, R 1a and R 1b is hydrogen atom.
[7-2]前記態様[7]の前記式(TH-2a)の化合物の製造方法において、R2a及び/又はR2bは、好ましくは、メチル基である。 [7-2] In the method of producing a compound of the formula (TH-2a) according to the above aspect [7], R 2a and / or R 2b is preferably a methyl group.
[7-3]前記態様[7]の前記式(TH-2a)の化合物の製造方法において、Eは、好ましくは、p-トルエンスルホニル基、ベンゼンスルホニル基、又はメタンスルホニル基であり;より好ましくは、p-トルエンスルホニル基である。 [7-3] In the method for producing a compound of the formula (TH-2a) according to the above aspect [7], E is preferably p-toluenesulfonyl group, benzenesulfonyl group, or methanesulfonyl group; more preferably Is a p-toluenesulfonyl group.
[7-4]前記態様[7]の前記式(TH-2a)の化合物の製造方法において、好ましくは、スルホニル化剤は、p-トルエンスルホニルクロリド、p-トルエンスルホン酸無水物、ベンゼンスルホニルクロリド、p-ニトロベンゼンスルホニルクロリド、2,4-ジニトロベンゼンスルホニルクロリド、メタンスルホニルクロリド、又はトリフルオロメタンスルホン酸無水物であり;より好ましくは、p-トルエンスルホニルクロリド、p-トルエンスルホン酸無水物、ベンゼンスルホニルクロリド、又はメタンスルホニルクロリドであり;更に好ましくは、p-トルエンスルホニルクロリド、又はp-トルエンスルホン酸無水物であり;特に好ましくは、p-トルエンスルホニルクロリドである。 [7-4] In the method for producing a compound of the formula (TH-2a) according to the above aspect [7], preferably, the sulfonylating agent is p-toluenesulfonyl chloride, p-toluenesulfonic acid anhydride, benzenesulfonyl chloride P-nitrobenzenesulfonyl chloride, 2,4-dinitrobenzenesulfonyl chloride, methanesulfonyl chloride, or trifluoromethanesulfonic acid anhydride; more preferably p-toluenesulfonyl chloride, p-toluenesulfonic acid anhydride, benzenesulfonyl More preferably, p-toluenesulfonyl chloride or p-toluenesulfonic acid anhydride; and particularly preferably p-toluenesulfonyl chloride.
[7-5]前記態様[7]の前記式(TH-2a)の化合物の製造方法において、好ましくは、塩基性溶媒は、ピリジン、トリエチルアミン、N,N-ジイソプロピルエチルアミン、又は2,6-ルチジンであり;より好ましくは、ピリジンである。 [7-5] In the method for producing a compound of the formula (TH-2a) according to the above aspect [7], preferably, the basic solvent is pyridine, triethylamine, N, N-diisopropylethylamine, or 2,6-lutidine More preferably pyridine.
[7-6]前記態様[7]の前記式(TH-2a)の化合物の製造方法において、好ましくは、反応温度は0℃から室温である。 [7-6] In the method for producing a compound of the formula (TH-2a) according to the above aspect [7], preferably, the reaction temperature is 0 ° C. to room temperature.
[7-7]前記態様[7]の前記式(TH-2a)の化合物の製造方法において、好ましくは、R1a及びR1bの組合せは、(R1a、R1b)=(水素原子、水素原子)、(水素原子、臭素原子)、(臭素原子、水素原子)、(メトキシメチル基、水素原子)、(フッ素原子、水素原子)、(水素原子、フッ素原子)、(フッ素原子、フッ素原子)であり;R2a及び/又はR2bはメチル基であり;スルホニル化剤はp-トルエンスルホニルクロリドであり、塩基性溶媒はピリジンであり、反応温度は0℃から室温である。 [7-7] In the method for producing a compound of the formula (TH-2a) according to the above aspect [7], preferably, the combination of R 1a and R 1b is (R 1a , R 1b ) = (hydrogen atom, hydrogen Atom), (hydrogen atom, bromine atom), (bromine atom, hydrogen atom), (methoxymethyl group, hydrogen atom), (fluorine atom, hydrogen atom), (hydrogen atom, fluorine atom), (fluorine atom, fluorine atom) R 2a and / or R 2b is a methyl group; the sulfonylating agent is p-toluenesulfonyl chloride, the basic solvent is pyridine, and the reaction temperature is from 0 ° C. to room temperature.
[7-8]前記態様[7]の前記式(TH-2a)の化合物の製造方法において、好ましくは、R1a及びR1bは水素原子であり;R2a及び/又はR2bはメチル基であり;スルホニル化剤はp-トルエンスルホニルクロリドであり、塩基性溶媒はピリジンであり、反応温度は0℃から室温である。 [7-8] In the method for producing a compound of the formula (TH-2a) according to the above aspect [7], preferably, R 1a and R 1b are hydrogen atoms; and R 2a and / or R 2b is a methyl group The sulfonylating agent is p-toluenesulfonyl chloride, the basic solvent is pyridine, and the reaction temperature is from 0 ° C. to room temperature.
[8]本発明の第8の態様は、下記式(I):
Figure JPOXMLDOC01-appb-C000034
[式(I)中、pは、0~4の整数であり;
1は、各々独立して、ハロゲン原子、シアノ基、C1~6アルキル基、ハロゲン化C1~6アルキル基、ヒドロキシC1~6アルキル基、シアノ化C1~6アルキル基、ハロゲン化C1~6アルコキシ基、C1~6アルコキシC1~6アルキル基、モノ/ジC2~7アルカノイルアミノ基、カルボキサミド基、又はC1~6アルコキシカルボニル基から選ばれる基であり;R2a及びR2bは、各々独立して、C1~6アルキル基である]で表される化合物を製造する方法であって、式(TH-2): 
Figure JPOXMLDOC01-appb-C000035
[式(TH-2)中、p、R1、R2a及びR2bは、前記式(I)中に定義されている基と同じであり;Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基から選ばれる基である]で表される化合物と、塩基とを、反応に関与しない溶媒中に加え、前記式(TH-2)で表される化合物と前記塩基とを含む混合溶液を形成し、0℃から前記式(TH-2)で表される化合物と前記塩基とを含む前記混合溶液が還流する温度で反応を行い、式(I)で表される化合物を得る製造方法である。
[8] The eighth aspect of the present invention is a compound of the following formula (I):
Figure JPOXMLDOC01-appb-C000034
[In the formula (I), p is an integer of 0 to 4;
Each R 1 independently represents a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1-6 alkyl group, a cyanated C 1-6 alkyl group, a halogenated C 1 ~ 6 alkoxy group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, a mono / di C 2 ~ 7 alkanoylamino group, carboxamido group, or a group selected from C 1 ~ 6 alkoxycarbonyl group; R 2a And R 2b are each independently a C 1-6 alkyl group], and a method of producing a compound represented by the formula (TH-2):
Figure JPOXMLDOC01-appb-C000035
[Wherein, in the formula (TH-2), p, R 1 , R 2a and R 2b are the same as the groups defined in the above formula (I); E is a p-toluenesulfonyl group, a benzenesulfonyl group , A p-nitrobenzenesulfonyl group, a 2,4-dinitrobenzenesulfonyl group, a methanesulfonyl group, or a trifluoromethanesulfonyl group] and a base in a solvent not involved in the reaction In addition, a mixed solution containing the compound represented by the formula (TH-2) and the base is formed, and the mixed solution including the compound represented by the formula (TH-2) and the base from 0 ° C. The reaction is carried out at a reflux temperature to obtain a compound represented by the formula (I).
[8-1]前記態様[8]の前記式(I)の化合物の製造方法において、pは、好ましくは、0~3の整数であり;より好ましくは、0~2の整数であり;更に好ましくは、0の整数である。 [8-1] In the method for producing the compound of the formula (I) according to the embodiment [8], p is preferably an integer of 0 to 3; more preferably an integer of 0 to 2; Preferably, it is an integer of 0.
[8-2]前記態様[8]の前記式(I)の化合物の製造方法において、R1は、好ましくは、ハロゲン原子、ヒドロキシC1~6アルキル基、C1~6アルコキシC1~6アルキル基、カルボキサミド基、又はC1~6アルコキシカルボニル基であり;より好ましくは、ハロゲン原子、又はC1~6アルコキシC1~6アルキル基であり;更に好ましくは、フッ素原子、臭素原子、又はメトキシメチル基である。R1が複数ある場合、R1は同じでも異なっていてもよい。 [8-2] In the method for producing a compound of the formula (I) according to the aspect [8], R 1 is preferably a halogen atom, a hydroxy C 1-6 alkyl group, a C 1-6 alkoxy C 1-6 It is an alkyl group, a carboxamido group, or a C 1-6 alkoxycarbonyl group; more preferably a halogen atom or a C 1-6 alkoxy C 1-6 alkyl group; still more preferably a fluorine atom, a bromine atom, or It is a methoxymethyl group. When there are multiple R 1 s , R 1 s may be the same or different.
[8-3]前記態様[8]の前記式(I)の化合物の製造方法において、R2a及び/又はR2bは、好ましくは、メチル基である。 [8-3] In the method for producing a compound of the formula (I) according to the embodiment [8], R 2a and / or R 2b is preferably a methyl group.
[8-4]前記態様[8]の前記式(I)の化合物の製造方法において、Eは、好ましくは、p-トルエンスルホニル基、ベンゼンスルホニル基、又はメタンスルホニル基であり;より好ましくは、p-トルエンスルホニル基である。 [8-4] In the method for producing a compound of the formula (I) according to the embodiment [8], E is preferably p-toluenesulfonyl group, benzenesulfonyl group or methanesulfonyl group; more preferably p-toluenesulfonyl group.
[8-5]前記態様[8]の前記式(I)の化合物の製造方法において、好ましくは、塩基は、カリウムtert-ブトキシド、ナトリウムtert-ブトキシド、ナトリウムエトキシド、水素化ナトリウム、又は1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)であり;より好ましくは、カリウムtert-ブトキシド、又はナトリウムtert-ブトキシドであり;更に好ましくは、カリウムtert-ブトキシドである。 [8-5] In the method for producing a compound of the formula (I) according to the above aspect [8], preferably, the base is potassium tert-butoxide, sodium tert-butoxide, sodium ethoxide, sodium hydride or 1,1 8-diazabicyclo [5.4.0] -7-undecene (DBU); more preferably potassium tert-butoxide or sodium tert-butoxide; still more preferably potassium tert-butoxide.
[8-6]前記態様[8]の前記式(I)の化合物の製造方法において、好ましくは、反応に関与しない溶媒は、tert-ブチルアルコール、ジメチルスルホキシド(DMSO)、又はN-メチルピロリドン(NMP)であり;より好ましくは、tert-ブチルアルコールである。 [8-6] In the method for producing a compound of the formula (I) according to the above aspect [8], preferably, the solvent not involved in the reaction is tert-butyl alcohol, dimethyl sulfoxide (DMSO), or N-methylpyrrolidone ( NMP); more preferably tert-butyl alcohol.
[8-7]前記態様[8]の前記式(I)の化合物の製造方法において、好ましくは、反応温度は室温から80℃である。 [8-7] In the method for producing a compound of the formula (I) according to the above aspect [8], preferably, the reaction temperature is from room temperature to 80 ° C.
[8-8]前記態様[8]の前記式(I)の化合物の製造方法において、好ましくは、pは0~2の整数であり;R1は、フッ素原子、臭素原子、又はメトキシメチル基であり;R2a及び/又はR2bはメチル基であり;塩基はカリウムtert-ブトキシドであり、溶媒はtert-ブチルアルコールであり、反応温度は室温から80℃である。 [8-8] In the method for producing a compound of the formula (I) according to the embodiment [8], preferably, p is an integer of 0 to 2; R 1 is a fluorine atom, a bromine atom, or a methoxymethyl group R 2a and / or R 2b is a methyl group; the base is potassium tert-butoxide, the solvent is tert-butyl alcohol, and the reaction temperature is from room temperature to 80 ° C.
[8-9]前記態様[8]の前記式(I)の化合物の製造方法において、好ましくは、pは0の整数であり;R2a又はR2bはメチル基であり;塩基はカリウムtert-ブトキシドであり、溶媒はtert-ブチルアルコールであり、反応温度は室温から80℃である。 [8-9] In the method for producing a compound of the formula (I) according to the embodiment [8], preferably, p is an integer of 0; R 2a or R 2b is a methyl group; the base is potassium tert- It is a butoxide, the solvent is tert-butyl alcohol, and the reaction temperature is from room temperature to 80 ° C.
[9]本発明の第9の態様は、下記式(I-a):
Figure JPOXMLDOC01-appb-C000036
[式(I-a)中、R1a及びR1bは、各々独立して、水素原子、ハロゲン原子、シアノ基、C1~6アルキル基、ハロゲン化C1~6アルキル基、ヒドロキシC1~6アルキル基、シアノ化C1~6アルキル基、ハロゲン化C1~6アルコキシ基、C1~6アルコキシC1~6アルキル基、モノ/ジC2~7アルカノイルアミノ基、カルボキサミド基、又はC1~6アルコキシカルボニル基から選ばれる基であり;R2a及びR2bは、各々独立して、C1~6アルキル基である]で表される化合物を製造する方法であって、式(TH-2a): 
Figure JPOXMLDOC01-appb-C000037
[式(TH-2a)中、R1a、R1b、R2a及びR2bは、前記式(I-a)中に定義されている基と同じであり;Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基から選ばれる基である]で表される化合物と塩基とを、反応に関与しない溶媒中で、0℃から前記式(TH-2a)で表される化合物と前記塩基とを含む前記混合溶液が還流する温度で反応を行い、式(I-a)で表される化合物を得る製造方法である。
[9] A ninth aspect of the present invention relates to a compound represented by the following formula (Ia):
Figure JPOXMLDOC01-appb-C000036
[In formula (I-a), R 1a and R 1b are each independently a hydrogen atom, a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1- 6 alkyl group, cyanated C 1 ~ 6 alkyl group, a halogenated C 1 ~ 6 alkoxy group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, mono / di C 2 ~ 7 alkanoylamino group, carboxamido group, or a C A method for producing a compound represented by the formula: TH wherein R 2a and R 2b are each independently a C 1-6 alkyl group, which is a group selected from 1 to 6 alkoxycarbonyl groups; -2a):
Figure JPOXMLDOC01-appb-C000037
[Wherein, in the formula (TH-2a), R 1a , R 1b , R 2a and R 2b are the same as the group defined in the formula (I-a); E is a p-toluenesulfonyl group, A solvent which does not take part in the reaction between the compound represented by the formula: benzenesulfonyl group, p-nitrobenzenesulfonyl group, 2,4-dinitrobenzenesulfonyl group, methanesulfonyl group, or trifluoromethanesulfonyl group] The reaction is carried out at a temperature at which the mixed solution containing a compound represented by the formula (TH-2a) and the base is refluxed from 0 ° C. to a compound represented by formula (Ia). It is a method.
[9-1]前記態様[9]の前記式(I-a)の化合物の製造方法において、R1a及びR1bは、好ましくは、各々独立して、水素原子、ハロゲン原子、ヒドロキシC1~6アルキル基、C1~6アルコキシC1~6アルキル基、カルボキサミド基、又はC1~6アルコキシカルボニル基であり;より好ましくは、R1aは、水素原子、ハロゲン原子、又はC1~6アルコキシC1~6アルキル基であり、R1bは、水素原子又はハロゲン原子であり;更に好ましくは、R1aは、水素原子、フッ素原子、臭素原子、又はメトキシメチル基であり、R1bは、水素原子、フッ素原子、又は臭素原子であり、より具体的にはR1a及びR1bの組合せは、(R1a、R1b)=(水素原子、水素原子)、(水素原子、臭素原子)、(臭素原子、水素原子)、(メトキシメチル基、水素原子)、(フッ素原子、水素原子)、(水素原子、フッ素原子)、(フッ素原子、フッ素原子)であり;特に好ましくは、R1a及びR1bは水素原子である。 [9-1] In the method for producing a compound of the formula (I-a) according to the above aspect [9], R 1a and R 1 b are preferably each independently a hydrogen atom, a halogen atom, a hydroxy C 1 6 alkyl group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, a carboxamide group, or a C 1 ~ 6 alkoxycarbonyl group; more preferably, R 1a is a hydrogen atom, a halogen atom, or a C 1 ~ 6 alkoxy A C 1-6 alkyl group, R 1b is a hydrogen atom or a halogen atom; more preferably, R 1a is a hydrogen atom, a fluorine atom, a bromine atom or a methoxymethyl group, and R 1b is a hydrogen atom A combination of R 1a and R 1b which is an atom, a fluorine atom or a bromine atom, more specifically (R 1a , R 1b ) = (hydrogen atom, hydrogen atom), (hydrogen atom, bromine atom), Bromine atom, hydrogen atom), (methoxymethyl group, hydrogen) Child), it is a (fluorine atom, hydrogen atom), (hydrogen atom, a fluorine atom), (a fluorine atom, a fluorine atom); Particularly preferably, R 1a and R 1b is hydrogen atom.
[9-2]前記態様[9]の前記式(I-a)の化合物の製造方法において、R2a及び/又はR2bは、好ましくは、メチル基である。 [9-2] In the method of producing a compound of the formula (Ia) according to the aspect [9], R 2a and / or R 2b is preferably a methyl group.
[9-3]前記態様[9]の前記式(I-a)の化合物の製造方法において、Eは、好ましくは、p-トルエンスルホニル基、ベンゼンスルホニル基、又はメタンスルホニル基であり;より好ましくは、p-トルエンスルホニル基である。 [9-3] In the method for producing a compound of the formula (I-a) according to the above aspect [9], E is preferably p-toluenesulfonyl group, benzenesulfonyl group or methanesulfonyl group; more preferably Is a p-toluenesulfonyl group.
[9-4]前記態様[9]の前記式(I-a)の化合物の製造方法において、好ましくは、塩基は、カリウムtert-ブトキシド、ナトリウムtert-ブトキシド、ナトリウムエトキシド、水素化ナトリウム、又は1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)であり;より好ましくは、カリウムtert-ブトキシド、ナトリウムtert-ブトキシド、又はナトリウムエトキシドであり;更に好ましくは、カリウムtert-ブトキシドである。 [9-4] In the method for producing a compound of the formula (I-a) according to the above aspect [9], preferably, the base is potassium tert-butoxide, sodium tert-butoxide, sodium ethoxide, sodium hydride or 1,8-diazabicyclo [5.4.0] -7-undecene (DBU); more preferably potassium tert-butoxide, sodium tert-butoxide or sodium ethoxide; still more preferably potassium tert- It is a butoxide.
[9-5]前記態様[9]の前記式(I-a)の化合物の製造方法において、好ましくは、反応に関与しない溶媒は、tert-ブチルアルコール、ジメチルスルホキシド(DMSO)、又はN-メチルピロリドン(NMP)であり;より好ましくは、tert-ブチルアルコールである。 [9-5] In the method for producing a compound of the formula (I-a) according to the above aspect [9], preferably, the solvent not involved in the reaction is tert-butyl alcohol, dimethyl sulfoxide (DMSO), or N-methyl Pyrrolidone (NMP); more preferably tert-butyl alcohol.
[9-6]前記態様[9]の前記式(I-a)の化合物の製造方法において、好ましくは、反応温度は室温から80℃である。 [9-6] In the method for producing a compound of the formula (Ia) according to the above aspect [9], preferably, the reaction temperature is from room temperature to 80 ° C.
[9-7]前記態様[9]の前記式(I-a)の化合物の製造方法において、好ましくは、R1a及びR1bの組合せは、(R1a、R1b)=(水素原子、水素原子)、(水素原子、臭素原子)、(臭素原子、水素原子)、(メトキシメチル基、水素原子)、(フッ素原子、水素原子)、(水素原子、フッ素原子)、(フッ素原子、フッ素原子)であり;R2a及び/又はR2bはメチル基であり;塩基はカリウムtert-ブトキシドであり、溶媒はtert-ブチルアルコールであり、反応温度は室温から80℃である。 [9-7] In the method for producing a compound of the formula (I-a) according to the above aspect [9], preferably, a combination of R 1a and R 1b is (R 1a , R 1b ) = (hydrogen atom, hydrogen Atom), (hydrogen atom, bromine atom), (bromine atom, hydrogen atom), (methoxymethyl group, hydrogen atom), (fluorine atom, hydrogen atom), (hydrogen atom, fluorine atom), (fluorine atom, fluorine atom) R 2a and / or R 2b is a methyl group; the base is potassium tert-butoxide, the solvent is tert-butyl alcohol, and the reaction temperature is from room temperature to 80 ° C.
[9-8]前記態様[9]の前記式(I-a)の化合物の製造方法において、好ましくは、R1a及びR1bは水素原子であり;R2a及び/又はR2bはメチル基であり;塩基はカリウムtert-ブトキシドであり、溶媒はtert-ブチルアルコールであり、反応温度は室温から80℃である。 [9-8] In the method for producing a compound of the formula (I-a) according to the above aspect [9], preferably, R 1a and R 1b are hydrogen atoms; and R 2a and / or R 2b are methyl groups The base is potassium tert-butoxide, the solvent is tert-butyl alcohol, and the reaction temperature is from room temperature to 80 ° C.
[10]本発明の第10の態様は、下記(Scheme6)中[(Scheme6)中、式(TH-1)、(TH-2)及び(I)におけるp、E、R1、R2a及びR2bは、前記態様[4]中に定義されている基と同じ基であり;工程[1]-1及び工程[1]-2の反応条件は、前記態様[4]中の反応条件と同じである]の、式(I)で表される1,1-ジアルキル-1,2-ジヒドロナフタレン誘導体の製造方法及び当該製造方法の中間体である。
Figure JPOXMLDOC01-appb-C000038
[10] A tenth aspect of the present invention relates to p, E, R 1 , R 2a and p in the formulas (TH-1), (TH-2) and (I) in the following (Scheme 6): R 2b is the same group as defined in the above aspect [4]; the reaction conditions of step [1] -1 and step [1] -2 are the same as the reaction conditions in the above aspect [4] The same is applied to a process for producing a 1,1-dialkyl-1,2-dihydronaphthalene derivative represented by formula (I) and an intermediate of the process.
Figure JPOXMLDOC01-appb-C000038
[11]本発明の第11の態様は、下記(Scheme7)中[(Scheme7)中、式(TH-1a)、(TH-2a)及び(I-a)におけるE、R1a、R1b、R2a及びR2bは、前記態様[5]中に定義されている基と同じ基であり;工程[2]-1及び工程[2]-2の反応条件は、前記態様[5]中の反応条件と同じである]の、式(I-a)で表される1,1-ジアルキル-1,2-ジヒドロナフタレン誘導体の製造方法及び当該製造方法の中間体である。
Figure JPOXMLDOC01-appb-C000039
[11] The eleventh aspect of the present invention relates to E, R 1a , R 1b in formulas (TH-1a), (TH-2a) and (Ia) in the following (Scheme 7): R 2a and R 2b are the same groups as defined in the above aspect [5]; reaction conditions of step [2] -1 and step [2] -2 are those in the above aspect [5] And the reaction conditions are the same as in the reaction conditions, and a process for producing the 1,1-dialkyl-1,2-dihydronaphthalene derivative represented by the formula (Ia) and an intermediate of the process.
Figure JPOXMLDOC01-appb-C000039
 以下に、上記態様[1]~[11]の各式中の各基について具体的に説明する。
 以下に、本明細書中の、上記式(TH-1)、式(TH-2)、式(I)及びそれらの下位概念に該当する式等中の各基について具体的に説明する。
 本発明の化合物に関する説明において、例えば「C1~6」とは、構成炭素原子数が1から6であることを示し、特に断らない限り、直鎖、分枝鎖又は環状の基の総炭素原子数を表す。鎖状の基と環状の基を含む基については「鎖と環の総炭素原子数」を意味する。
Hereinafter, each group in each formula of the above aspects [1] to [11] will be specifically described.
In the following, each group in the formulas (TH-1), (TH-2), (I) and formulas in the subgenus thereof in the present specification will be specifically described.
In the description of the compound of the present invention, for example, “C 1-6 ” indicates that the number of carbon atoms is 1 to 6, and unless otherwise specified, the total carbon of a linear, branched or cyclic group Represents the number of atoms. For a group containing a chain group and a cyclic group, it means "the total number of carbon atoms in the chain and ring".
 本明細書中、特に断りのない限り、「ハロゲン原子」としては、例えば、フッ素原子、塩素原子、臭素原子、又はヨウ素原子等が挙げられる。
 本明細書中、特に断りのない限り、「ハロゲン化C1~6アルキル基」等における「ハロゲン化」とは、置換基として数個の、好ましくは1~5個の前記「ハロゲン原子」を有していてもよいことを意味する。
 本明細書中、特に断りのない限り、「シアノ化C1~6アルキル」等における「シアノ化」とは、置換基として数個の、好ましくは1~5個の「シアノ基」を有していてもよいことを意味する。
In the present specification, unless otherwise specified, the "halogen atom" includes, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
In the present specification, unless otherwise specified, “halogenated” in the “halogenated C 1-6 alkyl group” and the like means several, preferably 1 to 5 of the aforementioned “halogen atoms” as a substituent. It means that you may have.
In the present specification, unless otherwise specified, "cyanated" in "cyanated C 1-6 alkyl" and the like has several, preferably 1 to 5 "cyano groups" as a substituent. Means that it may be
 本明細書中、特に断りのない限り、「C1~6アルキル基」としては、例えば、メチル、エチル、プロピル、イソプロピル、ブチル、イソブチル、sec-ブチル、tert-ブチル、ペンチル、イソペンチル、ネオペンチル、又はヘキシル等の基が挙げられる。 In the present specification, unless otherwise specified, the "C 1-6 alkyl group" is, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, isopentyl, neopentyl, Or a group such as hexyl.
 本明細書中、特に断りのない限り、「ハロゲン化C1~6アルキル基」とは、前記「C1~6アルキル」が数個の、好ましくは1~5個のハロゲン原子で任意に置換されている基を意味し、例えば、フルオロメチル、ジフルオロメチル、トリフルオロメチル、2,2,2-トリフルオロエチル、1,1,2,2-テトラフルオロエチル、又はペンタフルオロエチル等の基が挙げられる。 In the present specification, unless otherwise specified, the “halogenated C 1-6 alkyl group” means that the “C 1-6 alkyl” is optionally substituted with several, preferably 1 to 5 halogen atoms. A group such as fluoromethyl, difluoromethyl, trifluoromethyl, 2,2,2-trifluoroethyl, 1,1,2,2-tetrafluoroethyl or pentafluoroethyl. It can be mentioned.
 本明細書中、特に断りのない限り、「ヒドロキシC1~6アルキル基」とは、前記「C1~6アルキル」が数個の、好ましくは1~5個の水酸基で任意に置換されている基を意味し、例えば、ヒドロキシメチル、2-ヒドロキシエチル、3-ヒドロキシプロピル、又は2,2-ジメチル-2-ヒドロキシエチル(=2-ヒドロキシ-2-メチルプロピル)等の基が挙げられる。
 本明細書中、特に断りのない限り、「シアノ化C1~6アルキル基」とは、前記「C1~6アルキル」が数個の、好ましくは1~5個のシアノで任意に置換されている基を意味し、例えば、シアノメチル、1-シアノエチル、又は2-シアノエチル等の基が挙げられる。
In the present specification, unless otherwise specified, the "hydroxy C 1-6 alkyl group" means that the aforementioned "C 1-6 alkyl" is optionally substituted with several, preferably 1 to 5 hydroxyl groups. And groups such as hydroxymethyl, 2-hydroxyethyl, 3-hydroxypropyl or 2,2-dimethyl-2-hydroxyethyl (= 2-hydroxy-2-methylpropyl).
In the present specification, unless otherwise specified, the “cyanated C 1-6 alkyl group” is an optionally substituted “C 1-6 alkyl” with several, preferably 1 to 5 cyano. Groups such as cyanomethyl, 1-cyanoethyl or 2-cyanoethyl.
 本明細書中、特に断りのない限り、「C1~6アルコキシ基」とは、前記した「C1~6アルキル」が酸素原子に結合したアルコキシを表し、例えば、メトキシ、エトキシ、プロポキシ、イソプロポキシ、ブトキシ、イソブトキシ、sec-ブトキシ、tert-ブトキシ、ペンチルオキシ、又はヘキシルオキシ等の基が挙げられる。
 本明細書中、特に断りのない限り、「ハロゲン化C1~6アルコキシ基」とは、前記した「ハロゲン化C1~6アルキル」が酸素原子に結合したハロゲン化アルコキシを表し、例えば、フルオロメトキシ、ジフルオロメトキシ、トリフルオロメトキシ、2,2,2-トリフルオロエトキシ、又は1,1,2,2-テトラフルオロエトキシ、ペンタフルオロエトキシ等の基が挙げられる。
In the present specification, unless otherwise specified, the "C 1-6 alkoxy group" represents an alkoxy in which the aforementioned "C 1-6 alkyl" is bonded to an oxygen atom, and examples thereof include methoxy, ethoxy, propoxy and iso. Groups such as propoxy, butoxy, isobutoxy, sec-butoxy, tert-butoxy, pentyloxy or hexyloxy can be mentioned.
In the present specification, unless otherwise specified, the “halogenated C 1-6 alkoxy group” refers to a halogenated alkoxy in which the aforementioned “halogenated C 1-6 alkyl” is bonded to an oxygen atom, for example, fluoro Groups such as methoxy, difluoromethoxy, trifluoromethoxy, 2,2,2-trifluoroethoxy, or 1,1,2,2-tetrafluoroethoxy, pentafluoroethoxy and the like can be mentioned.
 本明細書中、特に断りのない限り、「C1~6アルコキシC1~6アルキル基」とは、前記「C1~6アルコキシ」が前記「C1~6アルキル」に置換した基を意味する。本明細書中、特に断りのない限り、「C1~6アルコキシC1~6アルキル」としては、例えば、メトキシメチル、メトキシエチル、エトキシメチル、エトキシエチル、1,1-ジメトキシメチル、又は1,1-ジエトキシエチル等の基が挙げられる。 Herein, unless otherwise specified, the "C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group" means a group wherein the above "C 1 ~ 6 alkoxy" is substituted into the "C 1 ~ 6 alkyl" Do. In the present specification, unless otherwise specified, the "C 1-6 alkoxy C 1-6 alkyl" is, for example, methoxymethyl, methoxyethyl, ethoxymethyl, ethoxyethyl, 1,1-dimethoxymethyl or 1, Examples include 1-diethoxyethyl and the like.
 本明細書中、特に断りのない限り、「モノ/ジC2~7アルカノイルアミノ基」とは、「アミノ基」の窒素原子上の一つ又は二つの水素原子が、「C1~6アルキル-C(O)-基」で置換したアミノ基を意味し、例えば、アセトアミド、プロピオンアミド、ブチルアミド、イソブチルアミド、バレルアミド、イソバレルアミド、ピバルアミド、ヘキサンアミド、ヘプタンアミド、シクロプロパンカルボキサミド、シクロブタンカルボキサミド、シクロペンタンカルボキサミド、シクロヘキサンカルボキサミド、2-メチルシクロプロパンカルボキサミド、又はジアセトアミド等の基が挙げられる。 Herein, unless otherwise indicated, the term "mono / di C 2 ~ 7 alkanoylamino group", one or two hydrogen atoms on the nitrogen atom of the "amino group", "C 1 ~ 6 alkyl "Amino group substituted by -C (O)-group" means, for example, acetamide, propionamide, butyramide, isobutyramide, valeramide, isovaleramide, pivalamide, hexanamide, heptaneamide, cyclopropanecarboxamide, cyclobutanecarboxamide And groups such as cyclopentane carboxamide, cyclohexane carboxamide, 2-methylcyclopropane carboxamide, or diacetamide.
 本明細書中、特に断りのない限り、「C1~6アルコキシカルボニル基」とは、「カルボキシ基(-COOH)」の水素原子が前記「C1~6アルキル基」に置換した基、即ち「エステル基」を意味し、例えば、メトキシカルボニル(メチルエステル)、エトキシカルボニル(エチルエステル)、又はtert-ブトキシカルボニル(tert-ブチルエステル)等の基が挙げられる。 In the present specification, unless otherwise specified, the “C 1-6 alkoxycarbonyl group” is a group in which the hydrogen atom of the “carboxy group (—COOH)” is substituted with the above “C 1-6 alkyl group”, ie, The term "ester group" means, for example, groups such as methoxycarbonyl (methyl ester), ethoxycarbonyl (ethyl ester) or tert-butoxycarbonyl (tert-butyl ester).
 本明細書前記態様中、特に断りのない限り、「スルホニル基」としては、メタンスルホニル基、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基等の基が挙げられる。但し、上記に記載したスルホニル基に必ずしも限定されるわけではない。 In the above embodiments of the present specification, unless otherwise specified, the “sulfonyl group” is a methanesulfonyl group, p-toluenesulfonyl group, benzenesulfonyl group, p-nitrobenzenesulfonyl group, 2,4-dinitrobenzenesulfonyl group, methane Groups such as a sulfonyl group or a trifluoromethanesulfonyl group can be mentioned. However, the sulfonyl group described above is not necessarily limited.
 本明細書前記態様中、特に断りのない限り、「スルホニル化剤」は、対象化合物のヒドロキシ基をスルホニル基へと置換することのできるものを意味し、例えば、スルホニル化剤として、p-トルエンスルホニルクロリド、p-トルエンスルホン酸無水物、ベンゼンスルホニルクロリド、p-ニトロベンゼンスルホニルクロリド、2,4-ジニトロベンゼンスルホニルクロリド、メタンスルホニルクロリド、又はトリフルオロメタンスルホン酸無水物等が挙げられる。但し、上記に記載したスルホニル化剤に必ずしも限定されるわけではない。 In the above embodiment, unless otherwise specified, "sulfonylating agent" means one capable of replacing the hydroxy group of the target compound with a sulfonyl group, for example, p-toluene as a sulfonylating agent Examples thereof include sulfonyl chloride, p-toluenesulfonic acid anhydride, benzene sulfonyl chloride, p-nitrobenzene sulfonyl chloride, 2,4-dinitrobenzene sulfonyl chloride, methanesulfonyl chloride, trifluoromethanesulfonic acid anhydride and the like. However, it is not necessarily limited to the sulfonylating agent described above.
 本明細書前記態様中、特に断らない限り、「塩基性溶媒」としては、例えば、ピリジン、トリエチルアミン、N,N-ジイソプロピルエチルアミン、2,6-ルチジン、トリブチルアミン、シクロヘキシルジメチルアミン、又はN-メチルモルホリン等の当該反応に影響がでない塩基性溶媒が挙げられる。但し、上記に記載した塩基性溶媒に必ずしも限定されるわけではない。これらの溶媒は、一種の溶媒を単独で用いてもよく、又は適宜選択し二種以上の溶媒を適宜の割合で混合して用いてもよい。 In the above embodiments, unless otherwise specified, as the "basic solvent", for example, pyridine, triethylamine, N, N-diisopropylethylamine, 2,6-lutidine, tributylamine, cyclohexyldimethylamine, or N-methyl Basic solvents which do not affect the reaction, such as morpholine, may be mentioned. However, it is not necessarily limited to the basic solvent described above. As these solvents, one type of solvent may be used alone, or two or more types of solvents may be appropriately selected and mixed and used at an appropriate ratio.
 本明細書前記態様中、特に断らない限り、「塩基」としては、例えば、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化マグネシウム、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、炭酸カルシウム、炭酸水素ナトリウム、リン酸三カリウム、酢酸ナトリウム、フッ化セシウム、トリエチルアミン、N,N-ジイソプロピルエチルアミン、トリブチルアミン、シクロヘキシルジメチルアミン、ピリジン、ルチジン、4-ジメチルアミノピリジン(DMAP)、N,N-ジメチルアニリン、N-メチルピペリジン、N-メチルピロリジン、N-メチルモルホリン、1,5-ジアザビシクロ[4.3.0]-5-ノネン、1,4-ジアザビシクロ[2.2.2]オクタン、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)、イミダゾール、ナトリウムメトキシド、ナトリウムエトキシド、カリウムtert-ブトキシド、ナトリウムtert-ブトキシド、水素化ナトリウム、水素化カリウム、ナトリウムアミド、リチウムジイソプロピルアミド、リチウムヘキサメチルジシラジド、メチルリチウム、n-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム等の塩基が挙げられる。但し、上記に記載した塩基に必ずしも限定されるわけではない。 In the above specification, unless otherwise specified, the "base" is, for example, lithium hydroxide, sodium hydroxide, potassium hydroxide, magnesium hydroxide, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, calcium carbonate, unless otherwise specified. Sodium bicarbonate, tripotassium phosphate, sodium acetate, cesium fluoride, triethylamine, N, N-diisopropylethylamine, tributylamine, cyclohexyldimethylamine, pyridine, lutidine, 4-dimethylaminopyridine (DMAP), N, N- Dimethylaniline, N-methylpiperidine, N-methylpyrrolidine, N-methylmorpholine, 1,5-diazabicyclo [4.3.0] -5-nonene, 1,4-diazabicyclo [2.2.2] octane, 1 , 8-Diazabicyclo [5.4.0] -7-c Decene (DBU), imidazole, sodium methoxide, sodium ethoxide, potassium tert-butoxide, sodium tert-butoxide, sodium hydride, potassium hydride, sodium amide, lithium diisopropylamide, lithium hexamethyldisilazide, methyllithium, Bases such as n-butyllithium, sec-butyllithium, tert-butyllithium and the like can be mentioned. However, it is not necessarily limited to the bases described above.
 本明細書前記態様中、「反応に関与しない溶媒」は、例えば、水、シクロヘキサン、ヘキサン、ベンゼン、クロロベンゼン、トルエン、キシレン、メタノール、エタノール、1-プロパノール、2-プロパノール、tert-ブチルアルコール、N,N-ジメチルホルムアミド(DMF)、N,N-ジメチルアセトアミド、N-メチルピロリドン(NMP)、ヘキサメチルホスホリックトリアミド、1,3‐ジメチル‐2‐イミダゾリジノン、ジメチルスルホキシド(DMSO)、アセトニトリル、プロピオニトリル、ジエチルエーテル、ジイソプロピルエーテル、ジフェニルエーテル、メチルtert-ブチルエーテル(MTBE)、テトラヒドロフラン、2-メチルテトラヒドロフラン、1,4-ジオキサン、1,2-ジメトキシエタン、酢酸メチル、酢酸エチル、酢酸ブチル、アセトン、メチルエチルケトン、ジクロロメタン、クロロホルム、四塩化炭素、及び1,2-ジクロロエタン等から選ばれる当該反応に影響がでない溶媒が挙げられる。但し、上記に記載した溶媒に必ずしも限定されるわけではない。これらの溶媒は、溶媒は、一種の溶媒を単独で用いてもよく、又は適宜選択し二種以上の溶媒を適宜の割合で混合して用いてもよい。 In the above embodiments of the present specification, the “solvent not involved in the reaction” is, for example, water, cyclohexane, hexane, benzene, chlorobenzene, toluene, xylene, methanol, ethanol, 1-propanol, 2-propanol, tert-butyl alcohol, N , N-dimethylformamide (DMF), N, N-dimethylacetamide, N-methylpyrrolidone (NMP), hexamethylphosphoryl triamide, 1,3-dimethyl-2-imidazolidinone, dimethylsulfoxide (DMSO), acetonitrile , Propionitrile, diethyl ether, diisopropyl ether, diphenyl ether, methyl tert-butyl ether (MTBE), tetrahydrofuran, 2-methyltetrahydrofuran, 1,4-dioxane, 1,2-dimethoxyethane , Methyl acetate, ethyl acetate, butyl acetate, acetone, methyl ethyl ketone, dichloromethane, chloroform, carbon tetrachloride, and the solvent does not affect to the reaction selected from 1,2-dichloroethane and the like. However, it is not necessarily limited to the solvent described above. As these solvents, one type of solvent may be used alone, or two or more types of solvents may be appropriately selected and mixed and used at an appropriate ratio.
 本明細書中、特に断りのない限り、環状基に可変置換基が置換している場合、該可変置換基は環状基の特定の炭素原子に結合されていない事を意味する。例えば、下記式Aにおける可変置換基Rxは、該式Aにおける炭素原子i、ii、iii、またはivの何れかに置換する事ができる事を意味する。
Figure JPOXMLDOC01-appb-C000040
In the present specification, unless otherwise specified, when a cyclic group is substituted by a variable substituent, it means that the variable substituent is not bonded to a specific carbon atom of the cyclic group. For example, the variable substituent R x in the following formula A means that any of carbon atoms i, ii, iii or iv in the formula A can be substituted.
Figure JPOXMLDOC01-appb-C000040
 本明細書中の化合物の式(TH-1)における水酸基には、光学異性体が存在し得る。本明細書中、特に断りが無い限り、式(TH-1)には(R)体及び(S)体で表される異性体が含まれることを意味する。又、同様に式(TH-2)、式(TH-1a)及び式(TH-2a)についても、(R)体及び(S)体で表される異性体が含まれることを意味する。 Optical isomers may exist in the hydroxyl group in the formula (TH-1) of the compound in the present specification. In the present specification, unless otherwise specified, it is meant that the formula (TH-1) includes isomers represented by (R) -isomer and (S) -isomer. Similarly, the formulas (TH-2), (TH-1a) and (TH-2a) also mean that isomers represented by (R) -isomer and (S) -isomer are included.
Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041
 本発明の化合物は、置換基の種類によって、酸付加塩を形成する場合や塩基との塩を形成する場合がある。かかる塩としては、製薬学的に許容し得る塩であれば特に限定されないが、例えば、金属塩、アンモニウム塩、有機塩基との塩、無機酸との塩、有機酸との塩、塩基性、又は酸性アミノ酸との塩などが挙げられる。金属塩の好適な例としては、例えば、リチウム塩、ナトリウム塩、カリウム塩、セシウム塩などのアルカリ金属塩、カルシウム塩、マグネシウム塩、バリウム塩などのアルカリ土類金属塩、アルミニウム塩などが挙げられる(例えば、モノ塩の他、二ナトリウム塩、二カリウム塩も含む)。有機塩基との塩の好適な例としては、例えば、メチルアミン、エチルアミン、t-ブチルアミン、t-オクチルアミン、ジエチルアミン、トリメチルアミン、トリエチルアミン、シクロヘキシルアミン、ジシクロヘキシルアミン、ジベンジルアミン、エタノールアミン、ジエタノールアミン、トリエタノールアミン、ピペリジン、モルホリン、ピリジン、ピコリン、リシン、アルギニン、オルニチン、エチレンジアミン、N-メチルグルカミン、グルコサミン、フェニルグリシンアルキルエステル、グアニジン、2,6-ルチジン、エタノールアミン、ジエタノールアミン、トリエタノールアミン、N,N'-ジベンジルエチレンジアミン等との塩が挙げられる。無機酸との塩の好適な例としては、例えば、塩酸、臭化水素酸、よう化水素酸、硝酸、硫酸、リン酸等との塩が挙げられる。有機酸との塩の好適な例としては、例えば、ギ酸、酢酸、トリフルオロ酢酸、プロピオン酸、酪酸、吉草酸、エナント酸、カプリン酸、ミリスチン酸、パルミチン酸、ステアリン酸、乳酸、ソルビン酸、マンデル酸等の脂肪族モノカルボン酸等との塩、シュウ酸、マロン酸、コハク酸、フマル酸、マレイン酸、リンゴ酸、酒石酸等の脂肪族ジカルボン酸との塩、クエン酸等の脂肪族トリカルボン酸との塩、安息香酸、サリチル酸等の芳香族モノカルボン酸との塩、フタル酸等の芳香族ジカルボン酸の塩、桂皮酸、グリコール酸、ピルビン酸、オキシル酸、サリチル酸、N-アセチルシステイン等の有機カルボン酸との塩、メタンスルホン酸、ベンゼンスルホン酸、p-トルエンスルホン酸等の有機スルホン酸との塩、アスパラギン酸、グルタミン酸等の酸性アミノ酸類との酸付加塩が挙げられる。塩基性アミノ酸との塩の好適な例としては、例えば、アルギニン、リジン、オルニチンなどとの塩が挙げられ、酸性アミノ酸との塩の好適な例としては、例えば、アスパラギン酸、グルタミン酸などとの塩が挙げられる。このうち、薬学的に許容し得る塩が好ましい。例えば、化合物内に酸性官能基を有する場合にはアルカリ金属塩(例、ナトリウム塩、カリウム塩など)、アルカリ土類金属塩(例、カルシウム塩、マグネシウム塩、バリウム塩など)などの無機塩、アンモニウム塩など、又、化合物内に塩基性官能基を有する場合には、例えば、塩酸、臭化水素酸、硝酸、硫酸、リン酸など無機酸との塩、又は酢酸、フタル酸、フマル酸、シュウ酸、酒石酸、マレイン酸、クエン酸、コハク酸、メタンスルホン酸、p-トルエンスルホン酸などの有機酸との塩が挙げられる。 The compounds of the present invention may form an acid addition salt or form a salt with a base, depending on the type of substituent. Such salts are not particularly limited as long as they are pharmaceutically acceptable salts, and examples thereof include metal salts, ammonium salts, salts with organic bases, salts with inorganic acids, salts with organic acids, basicity, Or salts with acidic amino acids. Preferred examples of the metal salt include, for example, alkali metal salts such as lithium salt, sodium salt, potassium salt and cesium salt, alkaline earth metal salts such as calcium salt, magnesium salt and barium salt, aluminum salt and the like (For example, in addition to mono salts, disodium salts and dipotassium salts are also included). Preferred examples of the salts with organic bases include, for example, methylamine, ethylamine, t-butylamine, t-octylamine, diethylamine, trimethylamine, triethylamine, cyclohexylamine, dicyclohexylamine, dibenzylamine, ethanolamine, diethanolamine, triamine Ethanolamine, piperidine, morpholine, pyridine, picoline, lysine, arginine, ornithine, ethylenediamine, N-methylglucamine, glucosamine, phenylglycine alkyl ester, guanidine, 2,6-lutidine, ethanolamine, diethanolamine, triethanolamine, N And salts with N, N'-dibenzylethylenediamine and the like. Preferred examples of salts with inorganic acids include salts with hydrochloric acid, hydrobromic acid, hydroiodic acid, nitric acid, sulfuric acid, phosphoric acid and the like. Preferred examples of salts with organic acids are, for example, formic acid, acetic acid, trifluoroacetic acid, propionic acid, butyric acid, valeric acid, enanthate, capric acid, myristic acid, palmitic acid, stearic acid, lactic acid, sorbic acid, Salts with aliphatic monocarboxylic acids such as mandelic acid, salts with aliphatic dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, fumaric acid, fumaric acid, maleic acid, malic acid and tartaric acid, aliphatic tricarboxylic acids such as citric acid Salts with acids, salts with aromatic monocarboxylic acids such as benzoic acid and salicylic acid, salts of aromatic dicarboxylic acids such as phthalic acid, cinnamic acid, glycolic acid, pyruvic acid, oxylic acid, salicylic acid, N-acetylcysteine, etc. Salts with organic carboxylic acids, salts with organic sulfonic acids such as methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, etc., aspartic acid, Acid addition salts with acidic amino acids such as phosphate and the like. Preferred examples of salts with basic amino acids include salts with arginine, lysine, ornithine and the like, and preferred examples of salts with acidic amino acids include salts with aspartic acid, glutamic acid and the like Can be mentioned. Among these, pharmaceutically acceptable salts are preferred. For example, when the compound has an acidic functional group, inorganic salts such as alkali metal salts (eg, sodium salt, potassium salt etc.), alkaline earth metal salts (eg, calcium salt, magnesium salt, barium salt etc.), Ammonium salts and the like, and when having a basic functional group in the compound, for example, salts with inorganic acids such as hydrochloric acid, hydrobromic acid, nitric acid, sulfuric acid, phosphoric acid, or acetic acid, phthalic acid, fumaric acid, And salts with organic acids such as oxalic acid, tartaric acid, maleic acid, citric acid, succinic acid, methanesulfonic acid, p-toluenesulfonic acid and the like.
 前記塩は、常法に従い、例えば、本発明の化合物と適量の酸もしくは塩基を含む溶液を混合することにより目的の塩を形成させた後に分別濾取するか、もしくは該混合溶媒を留去することにより得ることができる。又、本発明の化合物又はその塩は、水、エタノール、グリセロール等の溶媒と溶媒和物を形成し得る。
 塩に関する総説として、Handbook of Pharmaceutical Salts: Properties, Selection, and Use、Stahl&Wermuth(Wiley-VCH、2002)が出版されており、本書に詳細な記載がなされている。
The salt is formed into a desired salt by, for example, mixing a solution containing the compound of the present invention and an appropriate amount of an acid or a base according to a conventional method, followed by fractional filtration, or the mixed solvent is distilled off. It can be obtained by In addition, the compound of the present invention or a salt thereof may form a solvate with a solvent such as water, ethanol, glycerol and the like.
As a review on salts, Handbook of Pharmaceutical Salts: Properties, Selection, and Use, Stahl & Wermuth (Wiley-VCH, 2002) have been published, and a detailed description is made in this document.
 本明細書中の化合物は、非溶媒和形態もしくは溶媒和形態で存在することがあり得る。本明細書において、「溶媒和物」は、本発明の化合物と1種または複数の薬学的に許容される溶媒分子(例えば、水、エタノール等)を含む分子複合体を意味する。前記溶媒分子が水であるとき、特に「水和物」と言う。 The compounds herein may exist in unsolvated or solvated forms. As used herein, "solvate" refers to a molecular complex comprising the compound of the present invention and one or more pharmaceutically acceptable solvent molecules (eg, water, ethanol, etc.). When the solvent molecule is water, it is particularly referred to as "hydrate".
 本明細書中の化合物が、幾何異性体(ジオメトリカルアイソマー)、配置異性体(コンフィギュレーショナルアイソマー)、互変異性体(トウトメリックアイソマー)、光学異性体(オプティカルアイソマー)、立体異性体(ジアステレオマー)、位置異性体(レジオアイソマー)、回転異性体(ロテイショナルアイソマー)などの異性体を有する場合には、いずれか一方の異性体も混合物も本発明の化合物に包含される。 The compounds in the present specification may be geometrical isomers (geometrical isomers), configurational isomers (configurational isomers), tautomers (tautomeric isomers), optical isomers (optical isomers), stereoisomers (diastereomers) In the case of having an isomer such as a mer), a regioisomer (regioisomer) or a rotamer (rotational isomer), either one isomer or a mixture is also encompassed in the compound of the present invention.
 本明細書中の化合物に、幾何異性体、配置異性体、立体異性体、配座異性体等が存在する場合には、公知の手段によりそれぞれを単離することができる。 When geometric isomers, configurational isomers, stereoisomers, conformers and the like are present in the compound in the present specification, each can be isolated by known means.
 本明細書中の化合物が、光学異性体、立体異性体、位置異性体、回転異性体、互変異性体を含有する場合には、自体公知の合成手法、分離手法により各々の異性体を単一の化合物として得ることができる。例えば、光学分割法としては、自体公知の方法、例えば、(1)分別再結晶法、(2)ジアステレオマー法、(3)キラルカラム法等が挙げられる。 When the compounds in the present specification contain optical isomers, stereoisomers, regioisomers, rotamers or tautomers, each isomer may be a single compound by a synthesis method known per se, a separation method. It can be obtained as one compound. For example, as the optical resolution method, a method known per se, such as (1) fractional recrystallization method, (2) diastereomer method, (3) chiral column method and the like can be mentioned.
(1)分別再結晶法:ラセミ体に対して光学分割剤をイオン結合させることにより結晶性のジアステレオマーを得た後、これを分別再結晶法によって分離し、所望により、中和工程を経てフリーの光学的に純粋な化合物を得る方法である。光学分割剤としては、例えば、(+)-マンデル酸、(-)-マンデル酸、(+)-酒石酸、(-)-酒石酸、(+)-1-フェネチルアミン、(-)-1-フェネチルアミン、シンコニン、(-)-シンコニジン、ブルシン等が挙げられる。 (1) Fractional Recrystallization Method: A crystalline diastereomer is obtained by ionically binding an optical resolution agent to a racemate, and then separated by the fractional recrystallization method, if necessary, the neutralization step It is a method of obtaining free optically pure compounds. Optical resolution agents include, for example, (+)-mandelic acid, (-)-mandelic acid, (+)-tartaric acid, (-)-tartaric acid, (+)-1-phenethylamine, (-)-1-phenethylamine, Cinchonin, (-)-cinchonidin, brucine etc. may be mentioned.
(2)ジアステレオマー法:ラセミ体の混合物に光学分割剤を共有結合(反応)させ、ジアステレオマーの混合物とした後、これを通常の分離手段(例、分別再結晶、シリカゲルカラムクロマトグラフィー、HPLC(高速液体クロマトグラフィー)等)等を経て光学的に純粋なジアステレオマーへ分離した後、加水分解反応等の化学的な処理により、光学分割剤を除去することにより、光学的に純粋な光学異性体を得る方法である。例えば、本発明の化合物分子内に水酸基または1級、2級アミノ基を有する場合、該化合物と光学活性な有機酸(例、MTPA〔α-メトキシ-α-(トリフルオロメチル)フェニル酢酸〕、(-)-メントキシ酢酸等)等とを縮合反応に付すことにより、それぞれエステル体またはアミド体のジアステレオマーが得られる。一方、本発明の化合物分子内にカルボキシ基を有する場合、該化合物と光学活性アミンまたはアルコール試薬とを縮合反応に付すことにより、それぞれアミド体またはエステル体のジアステレオマーが得られる。上記の分離された各ジアステレオマーは、酸加水分解または塩基性加水分解反応に付すことにより、元の化合物の光学異性体に変換される。 (2) Diastereomer method: A mixture of racemates is covalently bonded (reacted) to an optical resolution agent to form a mixture of diastereomers, which is then subjected to ordinary separation means (eg, fractional recrystallization, silica gel column chromatography After separation into optically pure diastereomers via HPLC (high performance liquid chromatography) etc., and then optical purification by removing the optical resolution agent by chemical treatment such as hydrolysis reaction. Is a method of obtaining various optical isomers. For example, when a compound of the present invention has a hydroxyl group or a primary or secondary amino group in the molecule, the compound and an optically active organic acid (eg, MTPA [α-methoxy-α- (trifluoromethyl) phenylacetic acid], By subjecting (-)-menthoxyacetic acid etc. and the like to a condensation reaction, diastereomers of ester or amide form can be obtained, respectively. On the other hand, when the compound of the present invention has a carboxy group in the molecule, the compound and an optically active amine or alcohol reagent are subjected to a condensation reaction to obtain an amide form or an ester form of the diastereomer, respectively. Each of the above separated diastereomers is converted to an optical isomer of the original compound by acid hydrolysis or basic hydrolysis reaction.
(3)キラルカラム法:ラセミ体またはその塩をキラルカラム(光学異性体分離用カラム)でのクロマトグラフィーに付すことで、直接光学分割する方法である。例えば、高速液体クロマトグラフィー(High performance liquid chromatography:HPLC)の場合、ダイセル社製CHIRALシリーズ等のキラルカラムに光学異性体の混合物を添加し、水、種々の緩衝液(例、リン酸緩衝液)、有機溶媒(例、エタノール、メタノール、イソプロパノール、アセトニトリル、トリフルオロ酢酸、ジエチルアミン)を単独で、または混合した溶液として用いて、展開させることにより、光学異性体を分離することができる。また、例えば、ガスクロマトグラフィーの場合、CP-Chirasil-DeX CB(ジーエルサイエンス社製)等のキラルカラムを使用して分離することができる。 (3) Chiral column method: A method of direct optical resolution by subjecting a racemate or a salt thereof to chromatography on a chiral column (column for separating optical isomers). For example, in the case of high performance liquid chromatography (HPLC), a mixture of optical isomers is added to a chiral column such as CHIRAL series manufactured by Daicel, water, various buffers (eg, phosphate buffer), The optical isomers can be separated by developing using an organic solvent (eg, ethanol, methanol, isopropanol, acetonitrile, trifluoroacetic acid, diethylamine) alone or as a mixed solution. Also, for example, in the case of gas chromatography, separation can be performed using a chiral column such as CP-Chirasil-DeX CB (manufactured by GL Sciences Inc.).
 本明細書中の化合物は、結晶となり得る場合もある。結晶である場合、その結晶形が単一であっても結晶形混合物であっても本発明の化合物に包含される。また、本明細書中の化合物の結晶に、結晶多形がある場合には、いずれの結晶型も本発明の化合物に包含される。 The compounds herein may also be crystalline. In the case of crystals, single crystals or a mixture of crystals are included in the compounds of the present invention. In addition, when crystals of the compound in the present specification have crystal polymorphism, any crystal form is also included in the compound of the present invention.
 本明細書中の化合物は、薬学的に許容され得る共結晶または共結晶塩であってもよい。ここで、共結晶または共結晶塩とは、各々が異なる物理的特性(例えば、構造、融点、融解熱、吸湿性、溶解性および安定性等)を持つ、室温で二種またはそれ以上の独特な固体から構成される結晶性物質を意味する。共結晶または共結晶塩は、自体公知の共結晶化法に従い製造することができる。 The compounds herein may be pharmaceutically acceptable co-crystals or co-crystal salts. Here, co-crystals or co-crystal salts are two or more unique at room temperature, each having different physical properties (eg, structure, melting point, heat of fusion, hygroscopicity, solubility, stability, etc.) Mean crystalline substance composed of solid. The co-crystal or co-crystal salt can be produced according to a co-crystallization method known per se.
 本明細書中の化合物には、同位元素(例えば、水素の同位体、2Hおよび3Hなど、炭素の同位体、11C、13C、および14Cなど、塩素の同位体、36Clなど、フッ素の同位体、18Fなど、ヨウ素の同位体、123Iおよび125Iなど、窒素の同位体、13Nおよび15Nなど、酸素の同位体、15O、17O、および18Oなど、リンの同位体、32Pなど、ならびに硫黄の同位体、35Sなど)で標識、又は置換された化合物も包含される。 Compounds herein include isotopes (eg, isotopes of hydrogen, isotopes of carbon such as 2 H and 3 H, isotopes of chlorine such as 11 C, 13 C, and 14 C, 36 Cl, etc. , Fluorine isotopes, 18 F, iodine isotopes, 123 I and 125 I, nitrogen isotopes, 13 N and 15 N, oxygen isotopes, such as 15 O, 17 O, and 18 O Also included are compounds labeled or substituted with isotopes of phosphorus, such as 32 P, and isotopes of sulfur, such as 35 S).
 ある種の同位元素(例えば、11C、18F、15O、および13Nなどの陽電子放出同位元素)で標識または置換された本発明の化合物は、例えば、陽電子断層法(Positron Emission Tomography;PET)において使用するトレーサー(PETトレーサー)として用いることができ、医療診断などの分野において有用である。 Compounds of the present invention that are labeled or substituted with certain isotopes (eg, positron emitting isotopes such as 11 C, 18 F, 15 O, and 13 N) are, for example, Positron Emission Tomography (PET). Can be used as a tracer (PET tracer) used in the above, and is useful in the field of medical diagnosis and the like.
 ある種の同位体標識で標識または置換された本発明の化合物は、薬物および/または基質の組織分布研究において有用である。例えば、3Hおよび14Cは、それらの標識または置換が容易であり、かつ検出手段が容易である点から、該研究目的において有用である。 Compounds of the present invention that are labeled or substituted with certain isotopic labels are useful in drug and / or substrate tissue distribution studies. For example, 3 H and 14 C are useful for the research purpose in that they are easy to label or replace and easy to detect.
 同位体標識された本発明の化合物は、当業者に知られている通常の技法によって、または後述の実施例に記載する合成方法に類似する方法によって得る事ができる。また、非標識化合物の代わりに、得られた同位体標識化合物を薬理実験に用いる事ができる。 Isotopically labeled compounds of the present invention may be obtained by conventional techniques known to those skilled in the art or by methods analogous to the synthetic methods described in the examples below. Also, instead of unlabeled compounds, the isotope labeled compounds obtained can be used for pharmacological experiments.
 本発明の製造方法において、「0℃から前記式(TH-1)で表される化合物と前記スルホニル化剤とを含む前記混合溶液が還流する温度」、「0℃から前記式(TH-2)で表される化合物と前記塩基とを含む前記混合溶液が還流する温度」、「0℃から前記式(TH-1a)で表される化合物と前記スルホニル化剤とを含む前記混合溶液が還流する温度」、及び「0℃から前記式(TH-2a)で表される化合物と前記塩基とを含む前記混合溶液が還流する温度」の意味する処は、それぞれ、0℃から各混合溶液(溶媒)が還流する温度迄の範囲内の任意の温度を意味する。
 なお、本明細書において、特に断らない限り、「室温」とは、実験室、研究室等の温度の意味であり、通常約1℃から約30℃、好ましくは通常約5℃から約30℃、より好ましくは通常約15℃から約25℃、更に好ましくは20±3℃の温度を示すものとする。
In the production method of the present invention, “the temperature at which the mixed solution containing the compound represented by the above formula (TH-1) and the sulfonylating agent is refluxed from 0 ° C.”, “from 0 ° C. to the above formula (TH-2) A temperature at which the mixed solution containing the compound represented by the above and the base refluxes, "from 0 ° C to the mixed solution containing the compound represented by the formula (TH-1a) and the sulfonylating agent, The meaning of “temperature” and “the temperature at which the mixed solution containing the compound represented by the above formula (TH-2a) and the base is refluxed from 0 ° C.” means each mixed solution (from 0 ° C.) The term "solvent" refers to any temperature within the range of the reflux temperature.
In the present specification, unless otherwise specified, "room temperature" means laboratory, laboratory temperature, etc., usually about 1 ° C. to about 30 ° C., preferably usually about 5 ° C. to about 30 ° C. More preferably, it exhibits a temperature of usually about 15 ° C. to about 25 ° C., more preferably 20 ± 3 ° C.
 本発明の製造方法において、使用する溶媒は、一種の溶媒を単独で用いてもよく、又は反応条件により適宜選択し二種以上の溶媒を適宜の割合で混合して用いてもよい。
 本発明の製造方法において、化合物の抽出、乾燥、精製等の工程は、周知の方法で適宜行い得る。
 本発明の製造方法において、各工程における反応時間は、特に断らない限り、反応が十分に進行する時間であればよく、適宜選択し得る。
In the production method of the present invention, one type of solvent may be used alone, or two or more types of solvents may be mixed and used at an appropriate ratio, as appropriate selected according to the reaction conditions.
In the production method of the present invention, the steps of extraction, drying, purification and the like of the compound may be appropriately performed by a known method.
In the production method of the present invention, the reaction time in each step may be appropriately selected as long as the reaction sufficiently proceeds, unless otherwise specified.
[本明細書中の式(TH-1)で表される化合物の製造方法]
 以下に、本発明における、式(TH-1)で表される化合物の製造方法について詳細に説明する。式(TH-1)で表される化合物及びその溶媒和物は、市販化合物又は市販化合物から文献公知の製造方法により容易に得ることが出来る化合物を出発原料若しくは合成中間体として、既知の一般的化学的な製造方法を組み合わせることで容易に製造することが可能であり、例えば、以下に示す代表的な製造方法に従い製造することができる。
 尚、式(SM-2)及び式(KT-1)の式中におけるp、R1、R2a及びR2bの定義は、特に断らない限り、前記態様[1]ないし[4]に記載された各々の定義と同一である。
Figure JPOXMLDOC01-appb-C000042
[Method for producing compound represented by the formula (TH-1) in the present specification]
Hereinafter, the method for producing the compound represented by the formula (TH-1) in the present invention will be described in detail. The compound represented by the formula (TH-1) and a solvate thereof are generally known compounds which can be easily obtained from commercially available compounds or commercially available compounds by a production method known in the literature as a starting material or a synthetic intermediate. It can be easily produced by combining chemical production methods, and can be produced, for example, according to the representative production methods shown below.
In the formulas (SM-2) and (KT-1), the definitions of p, R 1 , R 2a and R 2b are described in the embodiments [1] to [4] unless otherwise specified. Are identical to their respective definitions.
Figure JPOXMLDOC01-appb-C000042
 式(TH-1)の化合物の製造方法において、式(SM-2)及び式(KT-1)の化合物は、塩を形成していてもよく、かかる塩としては、製薬学的に許容し得る塩であれば特に限定されないが、例えば、金属塩、アンモニウム塩、有機塩基との塩、無機酸との塩、有機酸との塩、塩基性、又は酸性アミノ酸との塩などが挙げられる。金属塩の好適な例としては、例えば、リチウム塩、ナトリウム塩、カリウム塩、セシウム塩などのアルカリ金属塩、カルシウム塩、マグネシウム塩、バリウム塩などのアルカリ土類金属塩、アルミニウム塩などが挙げられる(例えば、モノ塩の他、二ナトリウム塩、二カリウム塩も含む)。有機塩基との塩の好適な例としては、例えば、メチルアミン、エチルアミン、t-ブチルアミン、t-オクチルアミン、ジエチルアミン、トリメチルアミン、トリエチルアミン、シクロヘキシルアミン、ジシクロヘキシルアミン、ジベンジルアミン、エタノールアミン、ジエタノールアミン、トリエタノールアミン、ピペリジン、モルホリン、ピリジン、ピコリン、リシン、アルギニン、オルニチン、エチレンジアミン、N-メチルグルカミン、グルコサミン、フェニルグリシンアルキルエステル、グアニジン、2,6-ルチジン、エタノールアミン、ジエタノールアミン、トリエタノールアミン、N,N'-ジベンジルエチレンジアミン等との塩が挙げられる。無機酸との塩の好適な例としては、例えば、塩酸、臭化水素酸、よう化水素酸、硝酸、硫酸、リン酸等との塩が挙げられる。有機酸との塩の好適な例としては、例えば、ギ酸、酢酸、トリフルオロ酢酸、プロピオン酸、酪酸、吉草酸、エナント酸、カプリン酸、ミリスチン酸、パルミチン酸、ステアリン酸、乳酸、ソルビン酸、マンデル酸等の脂肪族モノカルボン酸等との塩、シュウ酸、マロン酸、コハク酸、フマル酸、マレイン酸、リンゴ酸、酒石酸等の脂肪族ジカルボン酸との塩、クエン酸等の脂肪族トリカルボン酸との塩、安息香酸、サリチル酸等の芳香族モノカルボン酸との塩、フタル酸等の芳香族ジカルボン酸の塩、桂皮酸、グリコール酸、ピルビン酸、オキシル酸、サリチル酸、N-アセチルシステイン等の有機カルボン酸との塩、メタンスルホン酸、ベンゼンスルホン酸、p-トルエンスルホン酸等の有機スルホン酸との塩、アスパラギン酸、グルタミン酸等の酸性アミノ酸類との酸付加塩が挙げられる。塩基性アミノ酸との塩の好適な例としては、例えば、アルギニン、リジン、オルニチンなどとの塩が挙げられ、酸性アミノ酸との塩の好適な例としては、例えば、アスパラギン酸、グルタミン酸などとの塩が挙げられる。このうち、薬学的に許容し得る塩が好ましい。例えば、化合物内に酸性官能基を有する場合にはアルカリ金属塩(例、ナトリウム塩、カリウム塩など)、アルカリ土類金属塩(例、カルシウム塩、マグネシウム塩、バリウム塩など)などの無機塩、アンモニウム塩など、又、化合物内に塩基性官能基を有する場合には、例えば、塩酸、臭化水素酸、硝酸、硫酸、リン酸など無機酸との塩、又は酢酸、フタル酸、フマル酸、シュウ酸、酒石酸、マレイン酸、クエン酸、コハク酸、メタンスルホン酸、p-トルエンスルホン酸などの有機酸との塩が挙げられる。 In the method for producing the compound of formula (TH-1), the compounds of formula (SM-2) and formula (KT-1) may form a salt, and such a salt is pharmaceutically acceptable. It is not particularly limited as long as it is a salt to be obtained, and examples thereof include metal salts, ammonium salts, salts with organic bases, salts with inorganic acids, salts with organic acids, salts with basic or acidic amino acids, and the like. Preferred examples of the metal salt include, for example, alkali metal salts such as lithium salt, sodium salt, potassium salt and cesium salt, alkaline earth metal salts such as calcium salt, magnesium salt and barium salt, aluminum salt and the like (For example, in addition to mono salts, disodium salts and dipotassium salts are also included). Preferred examples of the salts with organic bases include, for example, methylamine, ethylamine, t-butylamine, t-octylamine, diethylamine, trimethylamine, triethylamine, cyclohexylamine, dicyclohexylamine, dibenzylamine, ethanolamine, diethanolamine, triamine Ethanolamine, piperidine, morpholine, pyridine, picoline, lysine, arginine, ornithine, ethylenediamine, N-methylglucamine, glucosamine, phenylglycine alkyl ester, guanidine, 2,6-lutidine, ethanolamine, diethanolamine, triethanolamine, N And salts with N, N'-dibenzylethylenediamine and the like. Preferred examples of salts with inorganic acids include salts with hydrochloric acid, hydrobromic acid, hydroiodic acid, nitric acid, sulfuric acid, phosphoric acid and the like. Preferred examples of salts with organic acids are, for example, formic acid, acetic acid, trifluoroacetic acid, propionic acid, butyric acid, valeric acid, enanthate, capric acid, myristic acid, palmitic acid, stearic acid, lactic acid, sorbic acid, Salts with aliphatic monocarboxylic acids such as mandelic acid, salts with aliphatic dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, fumaric acid, fumaric acid, maleic acid, malic acid and tartaric acid, aliphatic tricarboxylic acids such as citric acid Salts with acids, salts with aromatic monocarboxylic acids such as benzoic acid and salicylic acid, salts of aromatic dicarboxylic acids such as phthalic acid, cinnamic acid, glycolic acid, pyruvic acid, oxylic acid, salicylic acid, N-acetylcysteine, etc. Salts with organic carboxylic acids, salts with organic sulfonic acids such as methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, etc., aspartic acid, Acid addition salts with acidic amino acids such as phosphate and the like. Preferred examples of salts with basic amino acids include salts with arginine, lysine, ornithine and the like, and preferred examples of salts with acidic amino acids include salts with aspartic acid, glutamic acid and the like Can be mentioned. Among these, pharmaceutically acceptable salts are preferred. For example, when the compound has an acidic functional group, inorganic salts such as alkali metal salts (eg, sodium salt, potassium salt etc.), alkaline earth metal salts (eg, calcium salt, magnesium salt, barium salt etc.), Ammonium salts and the like, and when having a basic functional group in the compound, for example, salts with inorganic acids such as hydrochloric acid, hydrobromic acid, nitric acid, sulfuric acid, phosphoric acid, or acetic acid, phthalic acid, fumaric acid, And salts with organic acids such as oxalic acid, tartaric acid, maleic acid, citric acid, succinic acid, methanesulfonic acid, p-toluenesulfonic acid and the like.
 また、式(TH-1)の化合物の製造方法において、式(KT-1)の化合物は、反応液のままか粗製物として次の反応に用いることもできるが、常法に従って反応混合物から単離することもでき、それ自体が公知の手段、例えば、抽出、濃縮、中和、濾過、蒸留、再結晶、クロマトグラフィーなどの分離手段により容易に精製することができる。 Further, in the method for producing the compound of the formula (TH-1), the compound of the formula (KT-1) can be used in the next reaction as the reaction liquid or as a crude product, but from the reaction mixture It can be separated and can be easily purified by a means known per se, such as extraction, concentration, neutralization, filtration, distillation, recrystallization, chromatography and the like.
 式(TH-1)の化合物の製造方法において、式(SM-2)及び式(KT-1)の化合物が変換可能な官能基(例えば、カルボキシ基、アミノ基、水酸基、カルボニル基、メルカプト基、C1~6アルコキシカルボニル基、C6~14アリールオキシカルボニル基、C7~20アラルキルオキシカルボニル基、スルホ基(-SO2OH)、ハロゲン原子等)を含む場合、これらの官能基を、例えば、ラーロック(Richard C.Larock)らの、コンプリヘンシブ・オルガニック・トランスフォーメーション(Comprehensive Organic Transformations)、第2版、1999年10月刊、ウィリー ビーシーエッチ(Wiley-VCH)社、の成書に記載の方法等に準じて、変換することができる。 In the method for producing the compound of the formula (TH-1), functional groups (for example, carboxy group, amino group, hydroxyl group, carbonyl group, mercapto group) to which the compounds of the formula (SM-2) and the formula (KT-1) can be converted , C 1 ~ 6 alkoxycarbonyl group, C 6 ~ 14 aryloxycarbonyl group, C 7 ~ 20 aralkyloxycarbonyl group, a sulfo group (-SO 2 OH), when containing a halogen atom, etc.), these functional groups, For example, in the book written by Richard C. Larock et al., Comprehensive Organic Transformations, Second Edition, October 1999, Wiley-VCH, Inc. It can be converted according to the method described.
 また、式(TH-1)の化合物の製造方法において、式(SM-2)及び式(KT-1)の化合物に置換基として水酸基(アルコール性水酸基、フェノール性水酸基、複素環水酸基等)、アミノ基、カルボキシ基、チオール基等の反応性基がある場合には、これらの基を適宜保護し、適当な段階で当該保護基を除去することもできる。こうした保護基の導入・除去の方法は、保護される基あるいは保護基の種類により適宜行われるが、例えば、グリーン(Greene)らの『プロテクティブ・グループス・イン・オーガニック・シンセシス(Protective Groups in Organic Synthesis) 第4版、2007年、ジョン ウィリー アンド サンズ(John Wiley & Sons)』の成書に記載の方法により行うことができる。 Further, in the method for producing the compound of the formula (TH-1), the compound of the formula (SM-2) and the formula (KT-1) has a hydroxyl group (alcoholic hydroxyl group, phenolic hydroxyl group, heterocyclic hydroxyl group etc.) as a substituent When there are reactive groups such as an amino group, a carboxy group and a thiol group, these groups can be appropriately protected, and the protective groups can be removed at an appropriate stage. The method for introducing and removing such protective groups may be appropriately selected depending on the type of the protected group or the protective group. For example, Protective Groups in Organic Synthesis (Protective Groups in Organic) by Greene et al. Synthesis) The fourth edition, 2007, can be carried out by the method described in the book of John Wiley & Sons (John Wiley & Sons).
 下記に述べる式(TH-1)の化合物の製造方法において、製造方法中の反応条件については、特に断らない限り、以下の如きとする。反応温度は、-78℃から溶媒が還流する温度の範囲であれば、限定されない。又、反応時間は、特に断らない限り、反応が十分に進行する時間であれば、限定されない。
 前記反応温度における、「-78℃から溶媒が還流する温度の範囲」の意味する処は、-78℃から反応に用いる溶媒(又は混合溶媒)が還流する温度迄の範囲内の温度を意味する。例えば、溶媒にメタノールを用いる場合、「-78℃から溶媒が還流する温度で」とは、-78℃からメタノールが還流する温度迄の範囲内の温度を意味する。また、同様に「-78℃から反応溶液が還流する温度で」とは、-78℃から反応溶液が還流する温度迄の範囲内の任意の温度を意味する。
In the method for producing a compound of the formula (TH-1) described below, the reaction conditions in the production method are as follows unless otherwise specified. The reaction temperature is not limited as long as it is in the range of −78 ° C. to the temperature at which the solvent refluxes. Further, the reaction time is not limited as long as the reaction proceeds sufficiently, unless otherwise specified.
The term "range from -78 ° C to the temperature at which the solvent refluxes" at the above reaction temperature means a temperature within the range from -78 ° C to the temperature at which the solvent (or mixed solvent) used for the reaction is refluxed. . For example, when methanol is used as the solvent, "at a temperature at which the solvent refluxes from -78 ° C" means a temperature within the range of -78 ° C to a temperature at which methanol refluxes. Similarly, “at a temperature from −78 ° C. to reflux of the reaction solution” means any temperature within the range from −78 ° C. to a temperature at which the reaction solution refluxes.
 また、下記に述べる式(TH-1)の化合物の製造方法中の各工程は、無溶媒で、あるいは反応前に原料化合物を適当な反応に関与しない溶媒に溶解又は懸濁して行うことができる。前記、反応に関与しない溶媒としては、例えば、水、シクロヘキサン、ヘキサン、ベンゼン、クロロベンゼン、トルエン、キシレン、メタノール、エタノール、1-プロパノール、2-プロパノール、tert-ブチルアルコール、N,N-ジメチルホルムアミド(DMF)、N,N-ジメチルアセトアミド、N-メチルピロリドン(NMP)、ヘキサメチルホスホリックトリアミド、1,3‐ジメチル‐2‐イミダゾリジノン、ジメチルスルホキシド、アセトニトリル、プロピオニトリル、ジエチルエーテル、ジイソプロピルエーテル、ジフェニルエーテル、メチルtert-ブチルエーテル(MTBE)、テトラヒドロフラン、2-メチルテトラヒドロフラン、1,4-ジオキサン、1,2-ジメトキシエタン、酢酸メチル、酢酸エチル、酢酸ブチル、アセトン、メチルエチルケトン、ジクロロメタン、クロロホルム、四塩化炭素、1,2-ジクロロエタン、トリエチルアミン、N,N-ジイソプロピルエチルアミン、ピリジン、ルチジン、無水酢酸、ギ酸、酢酸、プロピオン酸、トリフルオロ酢酸、メタンスルホン酸、塩酸、及び硫酸等が挙げられる。これらの溶媒は、単独で用いることも可能であり、又は反応条件により適宜選択し二種以上の溶媒を適宜の割合で混合して用いることも可能である。これらの溶媒は、反応条件に応じて適宜選択される。
 本明細書の製造方法中、特に断らない限り、「反応に関与しない溶媒」又は「反応に不活性な溶媒」と記載した場合、使用する溶媒は、一種の溶媒を単独で用いてもよく、又は反応条件により適宜選択し二種以上の溶媒を適宜の割合で混合して用いてもよいことを意味する。
In addition, each step in the process for producing a compound of the formula (TH-1) described below can be carried out without solvent, or by dissolving or suspending the starting compound in a solvent not involved in an appropriate reaction before the reaction. . Examples of the solvent not involved in the reaction include water, cyclohexane, hexane, benzene, chlorobenzene, toluene, xylene, methanol, ethanol, 1-propanol, 2-propanol, tert-butyl alcohol, N, N-dimethylformamide (for example) DMF), N, N-dimethylacetamide, N-methylpyrrolidone (NMP), hexamethylphosphoric triamide, 1,3-dimethyl-2-imidazolidinone, dimethyl sulfoxide, acetonitrile, propionitrile, diethyl ether, diisopropyl Ether, diphenyl ether, methyl tert-butyl ether (MTBE), tetrahydrofuran, 2-methyltetrahydrofuran, 1,4-dioxane, 1,2-dimethoxyethane, methyl acetate, ethyl acetate Butyl acetate, acetone, methyl ethyl ketone, dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane, triethylamine, N, N-diisopropylethylamine, pyridine, lutidine, acetic anhydride, formic acid, acetic acid, propionic acid, trifluoroacetic acid, methane sulfone Acids, hydrochloric acid, sulfuric acid and the like can be mentioned. These solvents may be used alone, or may be appropriately selected according to the reaction conditions, and two or more solvents may be mixed and used in an appropriate ratio. These solvents are suitably selected according to reaction conditions.
In the production method of the present specification, unless otherwise specified, when describing as “a solvent not involved in the reaction” or “a solvent inert to the reaction”, one type of solvent may be used alone. Alternatively, it means that two or more solvents may be mixed and used at an appropriate ratio, which is appropriately selected according to the reaction conditions.
 下記に述べる式(TH-1)の化合物の製造方法中の各工程で用いられる塩基(又は脱酸剤)としては、例えば、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化マグネシウム、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、炭酸カルシウム、炭酸水素ナトリウム、リン酸三カリウム、酢酸ナトリウム、フッ化セシウム、トリエチルアミン、N,N-ジイソプロピルエチルアミン、トリブチルアミン、シクロヘキシルジメチルアミン、ピリジン、ルチジン、4-ジメチルアミノピリジン(DMAP)、N,N-ジメチルアニリン、N-メチルピペリジン、N-メチルピロリジン、N-メチルモルホリン、1,5-ジアザビシクロ[4.3.0]-5-ノネン、1,4-ジアザビシクロ[2.2.2]オクタン、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)、イミダゾール、ナトリウムメトキシド、ナトリウムエトキシド、カリウムtert-ブトキシド、ナトリウムtert-ブトキシド、水素化ナトリウム、水素化カリウム、ナトリウムアミド、リチウムジイソプロピルアミド、リチウムヘキサメチルジシラジド、メチルリチウム、n-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム等が挙げられる。但し、上記に記載したものに必ずしも限定されるわけではない。これらの塩基は、反応条件に応じて適宜選択される。 Examples of the base (or deacidifying agent) used in each step in the method for producing a compound of the formula (TH-1) described below include, for example, lithium hydroxide, sodium hydroxide, potassium hydroxide, magnesium hydroxide, carbonate Lithium, sodium carbonate, potassium carbonate, cesium carbonate, calcium carbonate, sodium hydrogen carbonate, tripotassium phosphate, sodium acetate, cesium fluoride, triethylamine, N, N-diisopropylethylamine, tributylamine, cyclohexyldimethylamine, pyridine, lutidine, 4-dimethylaminopyridine (DMAP), N, N-dimethylaniline, N-methylpiperidine, N-methylpyrrolidine, N-methylmorpholine, 1,5-diazabicyclo [4.3.0] -5-nonene, 1, 4-Diazabicyclo [2.2.2] octane, 1,8 Diazabicyclo [5.4.0] -7-undecene (DBU), imidazole, sodium methoxide, sodium ethoxide, potassium tert-butoxide, sodium tert-butoxide, sodium hydride, potassium hydride, sodium amide, lithium diisopropylamide And lithium hexamethyldisilazide, methyllithium, n-butyllithium, sec-butyllithium, tert-butyllithium and the like. However, it is not necessarily limited to what was described above. These bases are suitably selected according to reaction conditions.
 下記に述べる式(TH-1)の化合物の製造方法中の各工程で用いられる酸、又は酸触媒は、例えば、塩酸、硫酸、硝酸、臭化水素酸、リン酸、酢酸、トリフルオロ酢酸、シュウ酸、フタル酸、フマル酸、酒石酸、マレイン酸、クエン酸、コハク酸、メタンスルホン酸、p-トルエンスルホン酸、10-カンファースルホン酸、三フッ化ホウ素エーテル錯体、ヨウ化亜鉛、無水塩化アルミニウム、無水塩化亜鉛、無水塩化鉄等が挙げられる。但し、上記に記載したものに必ずしも限定されるわけではない。これらの酸又は酸触媒は、反応条件に応じて適宜選択される。 The acid or acid catalyst used in each step in the process for producing the compound of the formula (TH-1) described below is, for example, hydrochloric acid, sulfuric acid, nitric acid, hydrobromic acid, phosphoric acid, acetic acid, trifluoroacetic acid, Oxalic acid, phthalic acid, fumaric acid, tartaric acid, maleic acid, citric acid, succinic acid, methanesulfonic acid, p-toluenesulfonic acid, 10-camphorsulfonic acid, boron trifluoride ether complex, zinc iodide, anhydrous aluminum chloride And anhydrous zinc chloride, anhydrous iron chloride and the like. However, it is not necessarily limited to what was described above. These acids or acid catalysts are suitably selected according to reaction conditions.
[製造方法A]式(TH-1)で表される化合物の製造方法:
Figure JPOXMLDOC01-appb-C000043
[Production Method A] A method for producing a compound represented by the formula (TH-1):
Figure JPOXMLDOC01-appb-C000043
<工程1> 式(SM-2)で表される化合物及び式(RG-1)(式(RG-1)中、Xはハロゲン原子を表す)で表される化合物[式(SM-2)及び式(RG-1)の化合物は、市販化合物、又は市販化合物から文献公知の製造方法により製造できる化合物である]を用いて、文献公知の方法、例えば、『Journal of the American Chemical Society(ジャーナル・オブ・ザ・アメリカン・ケミカル・ソサエティ)、115(23)、p10628-36、1993年』等に記載された方法に準じて、水酸化カリウム、水酸化ナトリウム、水素化ナトリウム、カリウムtert-ブトキシド、ナトリウムtert-ブトキシド等の塩基存在下、テトラブチルアンモニウム硫酸水素塩等のアンモニウム塩の存在下又は非存在下、tert-ブチルアルコール、テトラヒドロフラン、トルエン、ジメチルスルホキシド(DMSO)、N-メチルピロリドン(NMP)等の反応に関与しない溶媒中、0℃から溶媒が還流する温度で反応を行い、式(KT-1)で表される化合物を製造することができる。 <Step 1> Compound Represented by Formula (SM-2) and Compound Represented by Formula (RG-1) (In Formula (RG-1), X Represents a Halogen Atom) [Formula (SM-2) And a compound of the formula (RG-1) is a commercially available compound, or a compound which can be produced from the commercially available compound according to a known production method in the literature] using a method known in the literature, for example, Journal of the American Chemical Society (Journal · Potassium hydroxide, sodium hydroxide, sodium hydride, potassium tert-butoxide according to the method described in “The American Chemical Society”, 115 (23), p10628-36, 1993 ”and the like. Such as tetrabutylammonium hydrogen sulfate in the presence of a base such as sodium tert-butoxide In a solvent which does not participate in the reaction such as tert-butyl alcohol, tetrahydrofuran, toluene, dimethyl sulfoxide (DMSO), N-methylpyrrolidone (NMP) or the like in the presence or absence of a sodium salt, from 0 ° C. to a temperature at which the solvent refluxes The reaction can be carried out to produce a compound represented by the formula (KT-1).
<工程2> [製造方法A]<工程1>で得られる式(KT-1)で表される化合物を用いて、文献公知の方法、例えば、『実験化学講座 第4版 26 有機合成VIII 不斉合成・還元・糖・標識化合物、234-245頁、1992年、丸善』等に記載された方法に準じて、水素化ホウ素ナトリウム、水素化ホウ素リチウム、水素化ジイソブチルアルミニウム(DIBAH)、水素化リチウムアルミニウム(LAH)、ボラン-テトラヒドロフラン(BH3・THF)、ボラン-ジメチルスルフィド(BH3・Me2S)等の還元剤存在下、ジエチルエーテル、テトラヒドロフラン、1,2-ジメトキシエタン、1,4-ジオキサン、メタノール、エタノール、2-プロパノール等反応に関与しない溶媒中、もしくはこれらの混合溶媒中、0℃から溶媒が還流する温度で反応を行い、式(TH-1)で表される化合物を製造することができる。 <Step 2> [Production Method A] Using a compound represented by the formula (KT-1) obtained in <Step 1>, known methods in the literature, for example, “Experimental Chemical Lecture 4th Edition 26 Organic Synthesis VIII Sodium borohydride, lithium borohydride, hydrogenated diisobutylaluminum hydride (DIBAH), hydrogenation according to the method described in “Analytical synthesis, reduction, sugar, labeling compound”, page 234-245, 1992, Maruzen ”, etc. Diethyl ether, tetrahydrofuran, 1,2-dimethoxyethane, 1,4 in the presence of reducing agents such as lithium aluminum (LAH), borane-tetrahydrofuran (BH 3 · THF), borane-dimethyl sulfide (BH 3 · Me 2 S) -In a solvent not involved in the reaction, such as dioxane, methanol, ethanol, 2-propanol, or a mixed solvent thereof From the solvent to carry out the reaction at a temperature at which reflux can be produced a compound represented by the formula (TH-1).
 尚、式(TH-1)の下位式に当たる式(TH-1a)は、上記式(TH-1)の製造方法に準じて製造する事ができる。 The formula (TH-1a) corresponding to the lower formula of the formula (TH-1) can be produced according to the production method of the above formula (TH-1).
 以下に、本発明において得られる式(I)の化合物より式(i)で表される1-アミノ-2-ヒドロキシ-4,4-ジアルキル-1,2,3,4-テトラヒドロナフタレンへの製造方法について詳細に説明する。
[製造方法B][式(i)で表される化合物の製造方法]
 尚、式(EP-1)及び式(i)の式中におけるp、R1、R2a及びR2bの定義は、特に断らない限り、前記態様[1]ないし[4]に記載された各々の定義と同一である。
Figure JPOXMLDOC01-appb-C000044
Preparation of 1-amino-2-hydroxy-4,4-dialkyl-1,2,3,4-tetrahydronaphthalene represented by formula (i) from the compound of formula (I) obtained in the present invention The method will be described in detail.
[Production Method B] [Method for Producing Compound Represented by Formula (i)]
The definitions of p, R 1 , R 2a and R 2b in the formulas of the formula (EP-1) and the formula (i) are the respective ones described in the embodiments [1] to [4] unless otherwise specified. It is identical to the definition of
Figure JPOXMLDOC01-appb-C000044
<工程1> 式(I)で表される化合物を用いて、文献公知の方法、例えば、『実験化学講座 第4版 20 有機合成V 酸化反応、276‐280頁、1992年、丸善』に記載された方法に準じて、過酸化水素水(H22)、m-クロロ過安息香酸(MCPBA)、トリフルオロ過酢酸(CF3COOOH)、オキソン(登録商標)(DuPont)又はtert-ブチルヒドロペルオキシド(TBHP)等の過酸又は過酸化物の存在下、ジクロロメタン、クロロホルム、トルエン、ベンゼン、アセトニトリル、アセトン、水等の反応に関与しない溶媒中、又はこれらの混合溶媒中、0℃から溶媒が還流する温度で反応を行い、式(EP-1)で表される化合物を製造することができる。 <Step 1> Using a compound represented by the formula (I), the method is known in the literature, for example, described in “Experimental Chemistry Lecture 4th Edition 20 Organic Synthesis V Oxidation Reaction, p.276-280, 1992, Maruzen” Hydrogen peroxide (H 2 O 2 ), m-chloroperbenzoic acid (MCPBA), trifluoroperacetic acid (CF 3 COOOH), Oxone (registered trademark) (DuPont) or tert-butyl according to the method described In a solvent which does not participate in the reaction such as dichloromethane, chloroform, toluene, benzene, acetonitrile, acetone, water or the like in the presence of a peracid or peroxide such as hydroperoxide (TBHP) or a mixed solvent thereof from 0 ° C. The reaction can be carried out at a temperature at which the compound refluxes to produce a compound represented by the formula (EP-1).
<工程2> [製造方法B]<工程1>で得られる式(EP-1)で表される化合物を用いて、文献公知の方法、例えば、『Journal of the Chemical Society, Perkin Transactions 1,p2807-2810,1983年』に記載された方法に準じて、アンモニア水、アンモニア水/エタノールの混合溶液、アンモニア水/7規定アンモニア-メタノール溶液の混合溶液等を用いて、0℃から溶媒が還流する温度で反応を行い、式(i)で表される化合物を製造することができる。得られた式(i)の化合物は、前述した光学分割方法にて、キラル化合物に分割する事ができる。 <Step 2> [Production Method B] Using a compound represented by the formula (EP-1) obtained in <Step 1>, known methods in the literature, for example, “Journal of the Chemical Society, Perkin Transactions 1, p 2807 The solvent is refluxed from 0 ° C. using ammonia water, a mixed solution of ammonia water / ethanol, a mixed solution of ammonia water / 7 N ammonia-methanol solution, etc. according to the method described in “2810, 1983”. The reaction can be carried out at temperature to produce a compound of formula (i). The compound of the formula (i) thus obtained can be resolved into chiral compounds by the above-mentioned optical resolution method.
[製造方法C][式(i-a)で表される化合物の製造方法]
 式(I)の下位式に当たる式(I-a)を用いて、上記[製造方法B]に準じて、式(i-a)の化合物を製造する事ができる。又、得られた式(i-a)の化合物は、前述した光学分割方法にて、キラル化合物に分割する事ができる。
 尚、式(EP-1-a)及び式(i-a)の式中におけるR1a、R1b、R2a及びR2bの定義は、特に断らない限り、前記態様[1]ないし[5]に記載された各々の定義と同一である。
[Production Method C] [Method for Producing Compound Represented by Formula (i-a)]
The compound of the formula (ia) can be produced according to the above-mentioned [Production method B] using the formula (Ia) corresponding to the subformula of the formula (I). Further, the compound of the formula (ia) obtained can be resolved into a chiral compound by the above-mentioned optical resolution method.
In the formulas (EP-1-a) and (ia), the definitions of R 1a , R 1b , R 2a and R 2b are the above embodiments [1] to [5] unless otherwise specified. It is identical to each definition described in.
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000045
 次に、本発明をさらに詳細に説明するために実施例をあげるが、これらの例は単なる実施であって、本発明を限定するものではなく、また本発明の範囲を逸脱しない範囲で変化させてもよい。 EXAMPLES The following examples are provided to further illustrate the present invention in detail, but these examples are merely examples, and do not limit the scope of the present invention, and do not limit the scope of the present invention. May be
 核磁気共鳴スペクトル(NMR)の測定には、JEOL JNM-ECX400 FT-NMR(日本電子)を用いた。液体クロマトグラフィー-質量分析スペクトル(LC-Mass)は以下の方法で測定した。[UPLC]Waters AQUITY UPLCシステム及びBEH C18カラム(2.1mm×50mm、1.7μm)(Waters)を用い、アセトニトリル:0.05%トリフルオロ酢酸水溶液=5:95(0分)~95:5(1.0分)~95:5(1.6分)~5:95(2.0分)の移動相及びグラジエント条件を用いた。 JEOL JNM-ECX400 FT-NMR (Nippon Electron) was used for measurement of nuclear magnetic resonance spectrum (NMR). Liquid chromatography-mass spectrometry (LC-Mass) was measured by the following method. [UPLC] Waters AQUITY UPLC system and BEH C18 column (2.1 mm × 50 mm, 1.7 μm) (Waters), acetonitrile: 0.05% aqueous trifluoroacetic acid solution 5: 95 (0 min) to 95: 5 Mobile phases and gradient conditions from (1.0 min) to 95: 5 (1.6 min) to 5:95 (2.0 min) were used.
 1H-NMRデータ中、NMRシグナルのパターンで、sはシングレット、dはダブレット、tはトリプレット、qはカルテット、mはマルチプレット、brはブロード、Jはカップリング定数、Hzはヘルツ、CDCl3は重クロロホルム、DMSO-D6は重ジメチルスルホキシド、CD3ODは重メタノールを意味する。1H-NMRデータ中、水酸基(OH)、アミノ基(NH2)、カルボキシル基(COOH)のプロトン等、ブロードバンドであるため確認ができないシグナルについては、データに記載していない。 In 1 H-NMR data, s is singlet, d is doublet, t is triplet, q is quartet, m is multiplet, br is broad, J is coupling constant, Hz is hertz, CDCl 3 Is heavy chloroform, DMSO-D 6 is heavy dimethyl sulfoxide, and CD 3 OD is heavy methanol. In the 1 H-NMR data, signals that can not be identified because of broadband such as hydroxyl group (OH), amino group (NH 2 ), proton of carboxyl group (COOH), etc. are not described in the data.
 LC-Massデータ中、Mは分子量、RTは保持時間、[M+H]+,[M+Na]+は分子イオンピークを意味する。 In LC-Mass data, M means molecular weight, RT means retention time, [M + H] + , [M + Na] + means molecular ion peak.
 実施例中の「室温」は、通常約1℃から約30℃の温度を示すものとする。 In the examples, "room temperature" usually refers to a temperature of about 1 ° C to about 30 ° C.
(実施例1) 1,1-ジメチル-1,2-ジヒドロナフタレンの合成:
<工程1> 1,1-ジメチル-3,4-ジヒドロナフタレン-2(1H)-オンの合成:
 テトラブチルアンモニウム硫酸水素塩(13.9 g)と50%水酸化カリウム水溶液(75.0 g)のテトラヒドロフラン(93.5 mL)溶液に、氷水冷下、市販の3,4-ジヒドロナフタレン-2(1H)-オン(CAS番号530-93-8)(37.5 g)とヨードメタン(40.1 mL)のテトラヒドロフラン(93.5 mL)溶液を滴下し、室温で1時間攪拌した。反応液に水を加え、tert-ブチルメチルエーテルで二回抽出、有機層を1規定塩酸で洗浄し、硫酸ナトリウムで乾燥した。減圧下溶媒を留去することにより標記化合物の粗生成物を褐色油状物として得た。
LCMS: m/z 175 [M+H]+、UPLC保持時間: 1.02分
Example 1 Synthesis of 1,1-Dimethyl-1,2-dihydronaphthalene:
<Step 1> Synthesis of 1,1-Dimethyl-3,4-dihydronaphthalen-2 (1H) -one:
Commercially available 3,4-dihydronaphthalene-2 in a solution of tetrabutylammonium hydrogen sulfate (13.9 g) and 50% aqueous potassium hydroxide (75.0 g) in tetrahydrofuran (93.5 mL) under ice-water cooling A solution of (1H) -one (CAS number 530-93-8) (37.5 g) and iodomethane (40.1 mL) in tetrahydrofuran (93.5 mL) was added dropwise, and the mixture was stirred at room temperature for 1 hour. Water was added to the reaction solution, extraction was performed twice with tert-butyl methyl ether, and the organic layer was washed with 1 N hydrochloric acid and dried over sodium sulfate. The solvent was evaporated under reduced pressure to give a crude product of the title compound as a brown oil.
LCMS: m / z 175 [M + H] + , UPLC retention time: 1.02 minutes
<工程2> 1,1-ジメチル-1,2,3,4-テトラヒドロナフタレン-2-オールの合成:
(実施例1)<工程1>で得た粗生成物のメタノール(223.5 mL)溶液に、氷水冷下、水素化ホウ素ナトリウム(9.7 g)を2回に分けて加え、室温で1時間攪拌した。反応液に水(100 mL)を加えた後、減圧下メタノールを留去し、得られた残渣をtert-ブチルメチルエーテルで2回、tert-ブチルメチルエーテル/酢酸エチル=1/1混合液で1回抽出した。有機相にヘプタンを加え減圧濃縮し、得られた残渣にtert-ブチルメチルエーテル/ヘプタン=1/2(100 mL)混合液を加え、氷水冷下3時間撹拌した後、析出した固体を濾取することにより標記化合物(37.2 g、82 %)を白色固体として得た。
LCMS: m/z 175 [M+H]+、UPLC保持時間: 0.94分
<Step 2> Synthesis of 1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-ol:
(Example 1) Sodium borohydride (9.7 g) was added in two portions to a solution of the crude product obtained in <Step 1> in methanol (223.5 mL) under ice-water cooling, Stir for 1 hour. After water (100 mL) was added to the reaction solution, methanol was distilled off under reduced pressure, and the obtained residue was treated twice with tert-butyl methyl ether with tert-butyl methyl ether / ethyl acetate = 1/1 mixed solution It extracted once. Heptane is added to the organic phase, and the mixture is concentrated under reduced pressure. A mixed solution of tert-butyl methyl ether / heptane = 1/2 (100 mL) is added to the obtained residue and stirred for 3 hours under ice water cooling. The title compound (37.2 g, 82%) was obtained as a white solid.
LCMS: m / z 175 [M + H] + , UPLC retention time: 0.94 minutes
<工程3> 1,1-ジメチル-1,2,3,4-テトラヒドロナフタレン-2-イル 4-メチルベンゼンスルホネートの合成:
(実施例1)<工程2>で得られた化合物(15 g)のピリジン(75 mL)溶液に、氷水冷下、p-トルエンスルホニルクロリド(32.5 g)を加え、室温で40時間撹拌した。反応液に氷水冷下、1規定水酸化ナトリウム水溶液(100 mL)を加え、室温で30分撹拌した。本混合物に水を加え、tert-ブチルメチルエーテルで抽出した。有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下溶媒を留去することにより標記化合物(24.5 g、87 %)を白色固体として得た。
LCMS: m/z 331 [M+H]+、UPLC保持時間: 1.27分
*(CDCl3) δ: 7.81 (2H, d, J = 8 Hz), 7.32 (2H, d, J = 8 Hz), 7.24 (1H, d, J = 8 Hz), 7.16-7.06 (2H, m), 7.02 (1H, d, J = 8 Hz), 4.69 (1H, dd, J = 6, 5 Hz), 2.94 (1H, dt, J = 17, 7 Hz), 2.78 (1H, dt, J = 17, 7 Hz), 2.44 (3H, s), 2.12-2.07 (2H, m), 1.24 (3H, s), 1.20 (3H, s)
<Step 3> Synthesis of 1,1-dimethyl-1,2,3,4-tetrahydronaphthalen-2-yl 4-methylbenzenesulfonate:
(Example 1) p-toluenesulfonyl chloride (32.5 g) was added to a solution of the compound (15 g) obtained in <Step 2> in pyridine (75 mL) under ice-water cooling, and stirred at room temperature for 40 hours did. To the reaction mixture was added 1N aqueous sodium hydroxide solution (100 mL) under ice-water cooling, and the mixture was stirred at room temperature for 30 minutes. Water was added to the mixture and extracted with tert-butyl methyl ether. The organic layer was washed with brine and dried over sodium sulfate. The solvent was evaporated under reduced pressure to give the title compound (24.5 g, 87%) as a white solid.
LCMS: m / z 331 [M + H] + , UPLC retention time: 1.27 minutes * (CDCl 3 ) δ: 7.81 (2H, d, J = 8 Hz), 7.32 (2H, d, J = 8 Hz), 7.24 (1 H, d, J = 8 Hz), 7.16-7.06 (2 H, m), 7.02 (1 H, d, J = 8 Hz), 4.69 (1 H , Dd, J = 6, 5 Hz), 2. 94 (1 H, dt, J = 17, 7 Hz), 2. 78 (1 H, dt, J = 17, 7 Hz), 2. 44 (3 H, s) ), 2.12-2.07 (2H, m), 1.24 (3H, s), 1.20 (3H, s)
<工程4> 1,1-ジメチル-1,2-ジヒドロナフタレンの合成:
(実施例1)<工程3>で得られた化合物(24 g)のtert-ブチルアルコール(120 mL)溶液に、室温下、カリウムtert-ブトキシド(16.5 g)を加え、80℃で16時間加熱した。反応液に水を加え、tert-ブチルメチルエーテルで二回抽出した。有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下溶媒を留去することにより標記化合物(11.0 g、92 %)を黄色油状物として得た。
MS-ESI(m/z)[M+H]+=159(保持時間1.25分):[UPLC][メソッドA]Waters AQUITY UPLCシステムおよびCAPCELL Pakカラム(2.0mm×50mm、3μm)(資生堂)を用い、メタノール:0.05%トリフルオロ酢酸水溶液=5:95(0分)~95:5(1.0分)~95:5(1.6分)~5:95(2.0分)の移動相およびグラジエント条件を用いた。
(CDCl3) δ: 7.30 (1H, d, J = 7 Hz), 7.22-7.12 (2H, m), 7.04 (1H, dd, J = 7, 2 Hz), 6.48-6.43 (1H, m), 5.97-5.91 (1H, m), 2.26 (2H, dd, J = 4, 2 Hz), 1.28 (6H, s)。
<Step 4> Synthesis of 1,1-dimethyl-1,2-dihydronaphthalene:
Example 1 To a solution of the compound (24 g) obtained in <Step 3> in tert-butyl alcohol (120 mL) was added potassium tert-butoxide (16.5 g) at room temperature, Heated for time. Water was added to the reaction solution, and extracted twice with tert-butyl methyl ether. The organic layer was washed with brine and dried over sodium sulfate. The solvent was evaporated under reduced pressure to give the title compound (11.0 g, 92%) as a yellow oil.
MS-ESI (m / z) [M + H] + = 159 (retention time 1.25 min): [UPLC] [Method A] Waters AQUITY UPLC system and CAPCELL Pak column (2.0 mm × 50 mm, 3 μm) (Shiseido) Methanol: 0.05% aqueous trifluoroacetic acid solution 5: 95 (0 minutes) to 95: 5 (1.0 minutes) to 95: 5 (1.6 minutes) to 5: 95 (2.0 minutes) Mobile phase and gradient conditions were used.
(CDCl 3 ) δ: 7.30 (1 H, d, J = 7 Hz), 7.22-7.12 (2 H, m), 7.04 (1 H, dd, J = 7, 2 Hz), 6 .48-6.43 (1 H, m), 5.97-5.91 (1 H, m), 2.26 (2 H, dd, J = 4, 2 Hz), 1.28 (6 H, s).
 本発明によれば、式(I)で表される化合物の、短工程、かつ工業的生産に適した製造方法が提供される。また、式(TH-2)で表される当該製造方法における有用な合成中間体が提供される。 According to the present invention, there is provided a process which is suitable for short-step and industrial production of a compound represented by formula (I). In addition, useful synthetic intermediates in the production method represented by formula (TH-2) are provided.

Claims (4)

  1.  式(TH-2):
    Figure JPOXMLDOC01-appb-I000001
    [式(TH-2)中、pは、0~4であり;
    1は、各々独立して、ハロゲン原子、シアノ基、C1~6アルキル基、ハロゲン化C1~6アルキル基、ヒドロキシC1~6アルキル基、シアノ化C1~6アルキル基、ハロゲン化C1~6アルコキシ基、C1~6アルコキシC1~6アルキル基、モノ/ジC2~7アルカノイルアミノ基、カルボキサミド基、又はC1~6アルコキシカルボニル基から選ばれる基であり;R2a及びR2bは、各々独立して、C1~6アルキル基であり;
    Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基から選ばれる基である]で表される化合物、又はその塩、又はそれらの溶媒和物。
    Formula (TH-2):
    Figure JPOXMLDOC01-appb-I000001
    [In the formula (TH-2), p is 0 to 4;
    Each R 1 independently represents a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1-6 alkyl group, a cyanated C 1-6 alkyl group, a halogenated C 1 ~ 6 alkoxy group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, a mono / di C 2 ~ 7 alkanoylamino group, carboxamido group, or a group selected from C 1 ~ 6 alkoxycarbonyl group; R 2a And R 2b is each independently a C 1-6 alkyl group;
    And E is a group selected from p-toluenesulfonyl group, benzenesulfonyl group, p-nitrobenzenesulfonyl group, 2,4-dinitrobenzenesulfonyl group, methanesulfonyl group, or trifluoromethanesulfonyl group. Or a salt thereof, or a solvate thereof.
  2.  式(TH-2a):
    Figure JPOXMLDOC01-appb-I000002
    [式(TH-2a)中、
    1a及びR1bは、各々独立して、水素原子、ハロゲン原子、シアノ基、C1~6アルキル基、ハロゲン化C1~6アルキル基、ヒドロキシC1~6アルキル基、シアノ化C1~6アルキル基、ハロゲン化C1~6アルコキシ基、C1~6アルコキシC1~6アルキル基、モノ/ジC2~7アルカノイルアミノ基、カルボキサミド基、又はC1~6アルコキシカルボニル基から選ばれる基であり;
    2a及びR2bは、各々独立して、C1~6アルキル基であり;
    Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基から選ばれる基である]である化合物、又はその塩、又はそれらの溶媒和物。
    Formula (TH-2a):
    Figure JPOXMLDOC01-appb-I000002
    [In the formula (TH-2a),
    R 1a and R 1b are each independently a hydrogen atom, a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1-6 alkyl group, a cyanated C 1- 6 alkyl group, a halogenated C 1 ~ 6 alkoxy group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, and a mono- / di-C 2 ~ 7 alkanoylamino group, carboxamido group, or a C 1 ~ 6 alkoxycarbonyl group Is the basis;
    R 2a and R 2b are each independently a C 1-6 alkyl group;
    And E is a group selected from p-toluenesulfonyl group, benzenesulfonyl group, p-nitrobenzenesulfonyl group, 2,4-dinitrobenzenesulfonyl group, methanesulfonyl group, or trifluoromethanesulfonyl group, or a compound thereof A salt, or a solvate thereof.
  3.  下記式(I):
    Figure JPOXMLDOC01-appb-I000003
    [式(I)中、pは、0~4の整数であり;
    1は、各々独立して、ハロゲン原子、シアノ基、C1~6アルキル基、ハロゲン化C1~6アルキル基、ヒドロキシC1~6アルキル基、シアノ化C1~6アルキル基、ハロゲン化C1~6アルコキシ基、C1~6アルコキシC1~6アルキル基、モノ/ジC2~7アルカノイルアミノ基、カルボキサミド基、又はC1~6アルコキシカルボニル基から選ばれる基であり;R2a及びR2bは、各々独立して、C1~6アルキル基である]で表される化合物を製造する方法であって、
     下記式(TH-1):
    Figure JPOXMLDOC01-appb-I000004
    [式(TH-1)中、p、R1、R2a及びR2bは、前記式(I)中の定義と同じである]で表される化合物と、スルホニル化剤を、塩基性溶媒中に加え、前記式(TH-1)で表される化合物と前記スルホニル化剤とを含む混合溶液を形成し、0℃から前記式(TH-1)で表される化合物と前記スルホニル化剤とを含む前記混合溶液が還流する温度で反応を行い、式(TH-2): 
    Figure JPOXMLDOC01-appb-I000005
    [式(TH-2)中、p、R1、R2a及びR2bは、前記式(I)中の定義と同じであり;Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基から選ばれる基である]で表される化合物を得る工程、及び
     前記式(TH-2)で表される化合物と、塩基とを、反応に関与しない溶媒中に加え、前記式(TH-2)で表される化合物と前記塩基とを含む混合溶液を形成し、0℃から前記式(TH-2)で表される化合物と前記塩基とを含む前記混合溶液が還流する温度で反応を行い、式(I)で表される化合物を得る工程
    を含む製造方法。
    The following formula (I):
    Figure JPOXMLDOC01-appb-I000003
    [In the formula (I), p is an integer of 0 to 4;
    Each R 1 independently represents a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1-6 alkyl group, a cyanated C 1-6 alkyl group, a halogenated C 1 ~ 6 alkoxy group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, a mono / di C 2 ~ 7 alkanoylamino group, carboxamido group, or a group selected from C 1 ~ 6 alkoxycarbonyl group; R 2a And R 2b are each independently a C 1-6 alkyl group], a method of producing a compound represented by
    Following formula (TH-1):
    Figure JPOXMLDOC01-appb-I000004
    [Wherein, in the formula (TH-1), p, R 1 , R 2a and R 2b are the same as the definition in the above-mentioned formula (I)] and a sulfonylating agent in a basic solvent To form a mixed solution containing the compound represented by the formula (TH-1) and the sulfonylating agent, and from 0.degree. C. to the compound represented by the formula (TH-1) and the sulfonylating agent. The reaction is carried out at a temperature at which the mixed solution containing
    Figure JPOXMLDOC01-appb-I000005
    [Wherein, in the formula (TH-2), p, R 1 , R 2a and R 2b are as defined in the formula (I); E represents a p-toluenesulfonyl group, a benzenesulfonyl group, p-nitrobenzene A step of obtaining a compound represented by the formula (TH-2), which is a group selected from a sulfonyl group, a 2,4-dinitrobenzenesulfonyl group, a methanesulfonyl group, and a trifluoromethanesulfonyl group; And a base are added to a solvent not involved in the reaction to form a mixed solution containing the compound represented by the formula (TH-2) and the base, and from 0 ° C. to the formula (TH-2) A process comprising: reacting at a temperature at which the mixed solution containing the compound represented by the base and the base is refluxed to obtain the compound represented by the formula (I).
  4.  下記式(I-a):
    Figure JPOXMLDOC01-appb-I000006
    [式(I-a)中、R1a及びR1bは、各々独立して、水素原子、ハロゲン原子、シアノ基、C1~6アルキル基、ハロゲン化C1~6アルキル基、ヒドロキシC1~6アルキル基、シアノ化C1~6アルキル基、ハロゲン化C1~6アルコキシ基、C1~6アルコキシC1~6アルキル基、モノ/ジC2~7アルカノイルアミノ基、カルボキサミド基、又はC1~6アルコキシカルボニル基から選ばれる基であり;R2a及びR2bは、各々独立して、C1~6アルキル基である]で表される化合物を製造する方法であって、
     下記式(TH-1a):
    Figure JPOXMLDOC01-appb-I000007
    [式(TH-1a)中、R1a、R1b、R2a及びR2bは、前記式(I-a)中の定義と同じである]で表される化合物と、スルホニル化剤を、塩基性溶媒中に加え、前記式(TH-1a)で表される化合物と前記スルホニル化剤とを含む混合溶液を形成し、0℃から前記式(TH-1a)で表される化合物と前記スルホニル化剤とを含む前記混合溶液が還流する温度で反応を行い、式(TH-2a): 
    Figure JPOXMLDOC01-appb-I000008
    [式(TH-2a)中、R1a、R1b、R2a及びR2bは、前記式(I-a)中の定義と同じであり;Eは、p-トルエンスルホニル基、ベンゼンスルホニル基、p-ニトロベンゼンスルホニル基、2,4-ジニトロベンゼンスルホニル基、メタンスルホニル基、又はトリフルオロメタンスルホニル基から選ばれる基である]で表される化合物を得る工程、及び 前記式(TH-2a)で表される化合物と、塩基とを、反応に関与しない溶媒中に加え、前記式(TH-2a)で表される化合物と前記塩基とを含む混合溶液を形成し、0℃から前記式(TH-2a)で表される化合物と前記塩基とを含む前記混合溶液が還流する温度で反応を行い、式(I-a)で表される化合物を得る工程
    を含む製造方法。
    The following formula (I-a):
    Figure JPOXMLDOC01-appb-I000006
    [In formula (I-a), R 1a and R 1b are each independently a hydrogen atom, a halogen atom, a cyano group, a C 1-6 alkyl group, a halogenated C 1-6 alkyl group, a hydroxy C 1- 6 alkyl group, cyanated C 1 ~ 6 alkyl group, a halogenated C 1 ~ 6 alkoxy group, C 1 ~ 6 alkoxy C 1 ~ 6 alkyl group, mono / di C 2 ~ 7 alkanoylamino group, carboxamido group, or a C A method of producing a compound represented by the formula: R 2a and R 2b each independently represents a C 1 to 6 alkyl group, which is a group selected from 1 to 6 alkoxycarbonyl groups;
    Following formula (TH-1a):
    Figure JPOXMLDOC01-appb-I000007
    [Wherein, in the formula (TH-1a), R 1a , R 1b , R 2a and R 2b are the same as the definition in the above formula (I-a)], a sulfonylating agent, a base Forming a mixed solution containing the compound represented by the formula (TH-1a) and the sulfonylating agent in an organic solvent, and the compound represented by the formula (TH-1a) and the sulfonyl from 0 ° C. The reaction is carried out at a temperature at which the mixture solution containing the agent is refluxed, and the formula (TH-2a):
    Figure JPOXMLDOC01-appb-I000008
    [Wherein, in the formula (TH-2a), R 1a , R 1b , R 2a and R 2b are the same as the definition in the formula (I-a); E is a p-toluenesulfonyl group, a benzenesulfonyl group, a step of obtaining a compound represented by the above formula (TH-2a), which is a group selected from p-nitrobenzenesulfonyl group, 2,4-dinitrobenzenesulfonyl group, methanesulfonyl group, and trifluoromethanesulfonyl group; Compound and a base are added to a solvent not involved in the reaction to form a mixed solution containing the compound represented by the formula (TH-2a) and the base; A production method comprising the step of reacting at a temperature at which the mixed solution containing the compound represented by 2a) and the base is refluxed to obtain a compound represented by the formula (Ia).
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