WO2019026821A1 - Dispositif d'affichage - Google Patents

Dispositif d'affichage Download PDF

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Publication number
WO2019026821A1
WO2019026821A1 PCT/JP2018/028392 JP2018028392W WO2019026821A1 WO 2019026821 A1 WO2019026821 A1 WO 2019026821A1 JP 2018028392 W JP2018028392 W JP 2018028392W WO 2019026821 A1 WO2019026821 A1 WO 2019026821A1
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Prior art keywords
layer
organic
display device
inorganic
organic layer
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PCT/JP2018/028392
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English (en)
Japanese (ja)
Inventor
越智　貴志
石田　守
通 園田
亨 妹尾
剛 平瀬
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シャープ株式会社
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Publication of WO2019026821A1 publication Critical patent/WO2019026821A1/fr

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/873—Encapsulations
    • H10K59/8731—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H05B33/04—Sealing arrangements, e.g. against humidity
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/871—Self-supporting sealing arrangements

Definitions

  • the present invention relates to a display device.
  • organic EL display devices using organic EL (electroluminescence) elements have attracted attention as display devices replacing liquid crystal display devices.
  • organic EL display device a laminated structure in which an organic EL element, various films and the like are laminated on a flexible resin substrate is adopted, and an organic EL display device which can be repeatedly bent has been proposed.
  • Patent Document 1 includes a pair of flexible substrates overlapping via a display element, and at least one of the pair of substrates includes a plurality of glass fibers extending along one direction. Disclosed is a display device wherein the flexibility in one direction is less than the flexibility in the other direction crossing one direction.
  • the organic EL display device which can be repeatedly bent, since the rigidity of the panel becomes small when it is thinned and it becomes easy to bend against an external force, the organic EL display can be made, for example, by bending beyond the limit. There is a possibility that film breakage may occur in the inorganic layer that constitutes the internal laminated structure of the device.
  • This invention is made in view of this point, The place made as the objective is to suppress the film
  • a display device includes a flexible light emitting display element formed of a laminate including a plurality of inorganic layers, and a light emitting display element provided on one surface side of the light emitting display element.
  • a display device comprising a device main body comprising an organic layer and a second organic layer provided on the other surface side of the light emitting display element, wherein a neutral surface of the device main body is provided with the plurality of inorganic layers.
  • the distance to the surface on the side of the first organic layer of the inorganic uppermost layer closest to the first organic layer is d a ( ⁇ 0), and the distance from the neutral plane of the device body to the first inorganic layer is d a 2
  • the lower limit value of the film thickness of the first organic layer and the second organic layer is and -d a /0.011+d a, is the larger of the d b /0.011+d a
  • the first organic layer of the inorganic uppermost layer closest to the first organic layer among the plurality of inorganic layers from the neutral plane of the device main body provided with the first organic layer, the light emitting display element and the second organic layer Let the distance to the surface on the side be d a ( ⁇ 0), and the distance from the neutral plane of the device body to the surface of the inorganic lower layer closest to the second organic layer among the plurality of inorganic layers
  • d b > 0
  • the lower limit of the film thickness of the first organic layer and the second organic layer is -d a /0.011+d a
  • FIG. 1 is a plan view of a pixel structure of the organic EL display device according to the first embodiment of the present invention.
  • FIG. 2 is a cross-sectional view of the organic EL display taken along the line II-II in FIG.
  • FIG. 3 is an equivalent circuit diagram of an organic EL element layer constituting the organic EL display device according to the first embodiment of the present invention.
  • FIG. 4 is a cross-sectional view of an organic EL layer constituting the organic EL display device according to the first embodiment of the present invention.
  • FIG. 5 is a schematic view showing a laminated structure of the organic EL display device schematically illustrated in order to design the organic EL display device according to the first embodiment of the present invention.
  • FIG. 1 is a plan view of a pixel structure of the organic EL display device according to the first embodiment of the present invention.
  • FIG. 2 is a cross-sectional view of the organic EL display taken along the line II-II in FIG.
  • FIG. 3 is an equivalent circuit diagram of an
  • FIG. 6 is a schematic view of a bending tester used to design the organic EL display device according to the first embodiment of the present invention.
  • FIG. 7 is a table showing the results of a bending test performed to design the organic EL display device according to the first embodiment of the present invention.
  • FIG. 8 is a schematic view of a bent state of the organic EL display device schematically illustrated in order to design the organic EL display device according to the first embodiment of the present invention.
  • FIG. 9 shows the thickness of the first organic layer derived in order to design the organic EL display device according to the first embodiment of the present invention, and from the neutral plane with respect to the distance between the inorganic top layer and the inorganic bottom layer. It is a graph which shows the relationship with the ratio of the distance to the upper layer.
  • FIG. 9 shows the thickness of the first organic layer derived in order to design the organic EL display device according to the first embodiment of the present invention, and from the neutral plane with respect to the distance between the inorganic top layer and the inorganic bottom layer
  • FIG. 10 shows the relationship between the lower limit value of the film thickness of the first organic layer derived for designing the organic EL display device according to the first embodiment of the present invention and the distance between the inorganic uppermost layer and the inorganic lowermost layer.
  • FIG. FIG. 11 is a table showing the contents of Experimental Example 1 and Comparative Example 1 which were specifically carried out in the organic EL display device according to the first embodiment of the present invention.
  • FIG. 12 is a cross-sectional view of the organic EL display device according to the second embodiment of the present invention.
  • FIG. 13 is a table showing the contents of Example 2 and Comparative Example 2 specifically performed in the organic EL display device according to the second embodiment of the present invention.
  • FIG. 14 is a cross-sectional view of the organic EL display device according to the third embodiment of the present invention.
  • FIG. 15 is a table showing the contents of Example 3 and Comparative Example 3 which were specifically carried out in the organic EL display device according to the third embodiment of the present invention.
  • FIG. 16 is a cross-sectional view of the organic EL display device according to the fourth embodiment of the present invention.
  • FIG. 17 is a table showing the contents of Examples 4 to 6 and Comparative Examples 4 to 7 which are specifically carried out in the organic EL display device according to the fourth embodiment of the present invention.
  • FIG. 18 is a cross-sectional view of the organic EL display device according to the fifth embodiment of the present invention.
  • FIG. 19 is a table showing the contents of Examples 7 to 9 and Comparative Examples 8 to 11 performed specifically in the organic EL display device according to the fifth embodiment of the present invention.
  • FIG. 1 is a plan view of the pixel structure of the organic EL display device 50a of the present embodiment.
  • FIG. 2 is a cross-sectional view of the organic EL display device 50a taken along the line II-II in FIG.
  • FIG. 3 is an equivalent circuit diagram of the organic EL element layer 20 constituting the organic EL display device 50a.
  • FIG. 4 is a cross-sectional view of the organic EL layer 17 constituting the organic EL display device 50a.
  • the organic EL display device 50a is, as shown in FIG. 2, an organic EL display device 30a provided as a light emitting display device, and a first organic material provided on one surface side (upper side in the drawing) of the organic EL display device 30a.
  • a layer Ha and a second organic layer Hb provided on the other surface side (lower side in the drawing) of the organic EL display element 30a are provided.
  • a plurality of sub-pixels P are arranged in a matrix. Further, in the display area of the organic EL display device 50a, as shown in FIG.
  • a sub-pixel P having Lg and a sub-pixel P having a blue light emitting region Lb for performing gradation display of blue are provided adjacent to each other.
  • one pixel is formed by three adjacent sub-pixels P having a red light emitting region Lr, a green light emitting region Lg, and a blue light emitting region Lb.
  • the organic EL display element 30 a has a base coat layer 10 a, an organic EL element layer 20 provided on the surface side of the base coat layer 10 a, and a filling provided in order on the surface side of the organic EL element layer 20.
  • the layer 21, the moisture-proof layer 22, the color filter 23, the moisture-proof layer 24, the color filter substrate 25, the adhesive layer 26, and the touch panel 27 are provided.
  • the base coat layer 10 a is formed of, for example, a single layer film or a laminated film of an inorganic insulating film such as silicon nitride, silicon oxide, or silicon oxynitride.
  • the organic EL element layer 20 includes a plurality of second TFTs 13 b sequentially provided on the surface side of the resin substrate layer 10 via the base coat layer 10 a, a protective insulating film 14, a plurality of first electrodes 15, and an edge.
  • a cover 16, a plurality of organic EL layers 17, a second electrode 18 and a sealing film 19 are provided.
  • the organic EL element layer 20 is provided so as to extend parallel to each other in the longitudinal direction with a plurality of gate lines 11 provided so as to extend parallel to each other in the lateral direction in the drawing.
  • a plurality of source lines 12a and a plurality of power supply lines 12b adjacent to the respective source lines 12a and extending parallel to each other are provided.
  • the organic EL element layer 20 includes a plurality of first TFTs 13 a provided for each sub-pixel P, and a plurality of second TFTs 13 b described above provided for each sub-pixel P.
  • a plurality of capacitors 13 c provided for each sub-pixel P are provided.
  • the first TFT 13a is connected to the corresponding gate line 11 and source line 12a as shown in FIG. Further, as shown in FIG. 3, the second TFT 13 b is connected to the corresponding first TFT 13 a and the power supply line 12 b. Further, as shown in FIG. 3, the capacitor 13c is connected to the corresponding first TFT 13a and the power supply line 12b.
  • the first TFT 13a and the second TFT 13b are, for example, a semiconductor layer provided in an island shape on the base coat film 10a, a gate insulating film provided so as to cover the semiconductor layer, and a semiconductor layer on the gate insulating film.
  • the top gate type first TFT 13a and the second TFT 13b are illustrated in this embodiment, the first TFT 13a and the second TFT 13b may be bottom gate type TFTs.
  • the capacitor 13c includes one electrode formed in the same layer by the same material as the gate line 11, the other electrode formed in the same layer by the same material as the source line 12a and the power supply line 12b, It is comprised by the interlayer insulation film provided between a pair of electrodes.
  • the protective insulating film 14 is provided so as to cover other than a part of the drain electrode of each second TFT 13b.
  • the protective insulating film 14 is made of, for example, a colorless and transparent organic resin material such as an acrylic resin.
  • the plurality of first electrodes 15 are provided in a matrix on the surface side of the protective insulating film 14 so as to correspond to the plurality of sub-pixels P, as shown in FIG.
  • the first electrode 15 is connected to the drain electrode of each second TFT 13 b via a contact hole formed in the protective insulating film 14.
  • the first electrode 14 has a function of injecting holes into the organic EL layer 17.
  • the first electrode 14 is more preferably formed of a material having a large work function in order to improve the hole injection efficiency to the organic EL layer 17.
  • the first electrode 15 for example, silver (Ag), aluminum (Al), vanadium (V), cobalt (Co), nickel (Ni), tungsten (W), gold (Au) , Calcium (Ca), titanium (Ti), yttrium (Y), sodium (Na), ruthenium (Ru), manganese (Mn), indium (In), magnesium (Mg), lithium (Li), ytterbium (Yb) And metal materials such as lithium fluoride (LiF).
  • the material which comprises the 1st electrode 15 is magnesium (Mg) / copper (Cu), magnesium (Mg) / silver (Ag), sodium (Na) / potassium (K), astatine (At) / oxidation, for example Astatine (AtO 2 ), lithium (Li) / aluminum (Al), lithium (Li) / calcium (Ca) / aluminum (Al), or lithium fluoride (LiF) / calcium (Ca) / aluminum (Al), etc. It may be an alloy.
  • the material constituting the first electrode 15 is, for example, a conductive oxide such as tin oxide (SnO), zinc oxide (ZnO), indium tin oxide (ITO), indium zinc oxide (IZO) or the like. It may be. Further, the first electrode 15 may be formed by laminating a plurality of layers made of the above materials. In addition, as a material with a large work function, indium tin oxide (ITO), indium zinc oxide (IZO), etc. are mentioned, for example.
  • the edge cover 16 is provided in a grid shape so as to cover the peripheral portion of each first electrode 15.
  • silicon nitride SiN x (x is a positive number)
  • silicon oxide SiO 2
  • trisilicon tetranitride Si 3 N 4
  • silicon oxynitride Inorganic films such as a ride (SiNO)
  • organic films such as a polyimide resin, an acrylic resin, a polysiloxane resin, and a novolak resin, are mentioned.
  • the plurality of organic EL layers 17 are disposed on the surface side of each first electrode 15 and provided in a matrix so as to correspond to the plurality of sub-pixels P.
  • the organic EL layer 17 is provided with a hole injection layer 1, a hole transport layer 2, a light emitting layer 3, an electron transport layer 4 and an electron sequentially provided on the surface side of the first electrode 14.
  • An injection layer 5 is provided.
  • the hole injection layer 1 is also called an anode buffer layer, and has the function of improving the hole injection efficiency from the first electrode 15 to the organic EL layer 17 by bringing the energy levels of the first electrode 15 and the organic EL layer 17 closer to each other.
  • the material constituting the hole injection layer for example, triazole derivative, oxadiazole derivative, imidazole derivative, polyarylalkane derivative, pyrazoline derivative, phenylenediamine derivative, oxazole derivative, styrylanthracene derivative, fluorenone derivative, Hydrazone derivatives, stilbene derivatives and the like can be mentioned.
  • the hole transport layer 2 has a function of improving the transport efficiency of holes from the first electrode 15 to the organic EL layer 17.
  • a material constituting the hole transport layer 2 for example, porphyrin derivative, aromatic tertiary amine compound, styrylamine derivative, polyvinylcarbazole, poly-p-phenylenevinylene, polysilane, triazole derivative, oxadiazole Derivative, imidazole derivative, polyarylalkane derivative, pyrazoline derivative, pyrazolone derivative, phenylenediamine derivative, arylamine derivative, amine-substituted chalcone derivative, oxazole derivative, styrylanthracene derivative, fluorenone derivative, hydrazone derivative, stilbene derivative, hydrogenated amorphous silicon, Hydrogenated amorphous silicon carbide, zinc sulfide, zinc selenide and the like can be mentioned.
  • the light emitting layer 3 holes and electrons are injected from the first electrode 15 and the second electrode 18 respectively, and holes and electrons are recombined when a voltage is applied by the first electrode 15 and the second electrode 18. It is an area.
  • the light emitting layer 3 is formed of a material having high light emission efficiency.
  • a metal oxinoid compound [8-hydroxy quinoline metal complex], a naphthalene derivative, an anthracene derivative, a diphenyl ethylene derivative, a vinylacetone derivative, a triphenylamine derivative, a butadiene derivative, a coumarin derivative, for example , Benzoxazole derivative, oxadiazole derivative, oxazole derivative, benzimidazole derivative, thiadiazole derivative, benzthiazole derivative, styryl derivative, styrylamine derivative, bisstyrylbenzene derivative, trisstyrylbenzene derivative, perylene derivative, perinone derivative, aminopyrene derivative, Pyridine derivatives, rhodamine derivatives, aquidin derivatives, phenoxazone, quinacridone derivatives, rubrene, poly-p-phenylene vinylet , Polysilane, and the like.
  • the electron transport layer 4 has a function of efficiently moving electrons to the light emitting layer 3.
  • a material constituting the electron transport layer 4 for example, as an organic compound, oxadiazole derivative, triazole derivative, benzoquinone derivative, naphthoquinone derivative, anthraquinone derivative, tetracyanoanthraquinodimethane derivative, diphenoquinone derivative, fluorenone derivative And silole derivatives, metal oxinoid compounds and the like.
  • the electron injection layer 5 has a function of bringing the energy levels of the second electrode 18 and the organic EL layer 17 closer to each other and improving the efficiency with which electrons are injected from the second electrode 18 to the organic EL layer 17.
  • the drive voltage of the organic EL element 17 can be lowered.
  • the electron injection layer 5 is also called a cathode buffer layer.
  • lithium fluoride (LiF), magnesium fluoride (MgF 2 ), calcium fluoride (CaF 2 ), strontium fluoride (SrF 2 ), barium fluoride Inorganic alkali compounds such as (BaF 2 ), aluminum oxide (Al 2 O 3 ), strontium oxide (SrO) and the like can be mentioned.
  • the second electrode 18 is provided so as to cover the organic EL layers 17 and the edge cover 16 and be common to the plurality of sub-pixels P.
  • the second electrode 18 has a function of injecting electrons into the organic EL layer 17.
  • the second electrode 18 is more preferably made of a material having a small work function in order to improve the electron injection efficiency into the organic EL layer 17.
  • the second electrode 18 for example, silver (Ag), aluminum (Al), vanadium (V), cobalt (Co), nickel (Ni), tungsten (W), gold (Au) , Calcium (Ca), titanium (Ti), yttrium (Y), sodium (Na), ruthenium (Ru), manganese (Mn), indium (In), magnesium (Mg), lithium (Li), ytterbium (Yb) And lithium fluoride (LiF).
  • the second electrode 18 may be, for example, magnesium (Mg) / copper (Cu), magnesium (Mg) / silver (Ag), sodium (Na) / potassium (K), astatine (At) / oxide astatine (AtO 2) And lithium (Li) / aluminum (Al), lithium (Li) / calcium (Ca) / aluminum (Al), lithium fluoride (LiF) / calcium (Ca) / aluminum (Al), etc. May be Also, the second electrode 18 may be formed of, for example, a conductive oxide such as tin oxide (SnO), zinc oxide (ZnO), indium tin oxide (ITO), indium zinc oxide (IZO), etc. .
  • a conductive oxide such as tin oxide (SnO), zinc oxide (ZnO), indium tin oxide (ITO), indium zinc oxide (IZO), etc.
  • the second electrode 18 may be formed by laminating a plurality of layers made of the above materials.
  • a material having a small work function for example, magnesium (Mg), lithium (Li), lithium fluoride (LiF), magnesium (Mg) / copper (Cu), magnesium (Mg) / silver (Ag), sodium (Na) / potassium (K), lithium (Li) / aluminum (Al), lithium (Li) / calcium (Ca) / aluminum (Al), lithium fluoride (LiF) / calcium (Ca) / aluminum (Al) Etc.
  • the sealing film 19 has a function of protecting the organic EL layer 17 from moisture and oxygen.
  • the material constituting the sealing film 19 for example, silicon oxide (SiO 2) or aluminum oxide (Al 2 O 3), silicon nitride such as the four-nitride three silicon (Si 3 N 4) (SiNx (x Is a positive number), inorganic materials such as silicon carbonitride (SiCN), and organic materials such as acrylate, polyurea, parylene, polyimide, and polyamide.
  • the filling layer 21 is made of, for example, an epoxy-based UV curing resin or the like.
  • the moisture-proof layer 22 and the moisture-proof layer 24 are formed of, for example, a single layer film or a laminated film of an inorganic insulating film such as silicon nitride, silicon oxide, or silicon oxynitride.
  • the color filter 23 includes, for example, a black matrix layer provided in a lattice shape, a plurality of color resist layers of a red layer, a green layer, and a blue layer respectively provided to correspond to the respective sub-pixels P, and a black matrix layer. And an overcoat layer provided to cover each color resist layer, and is made of a photosensitive acrylic resin or the like.
  • the color filter substrate 25 and the base film 8 described later are made of, for example, a polyimide resin, a polyethylene terephthalate resin, a polyethylene naphthalate resin, an aramid resin, a (meth) acrylate resin and the like.
  • the adhesive layers 26 and 28 and the adhesive layers 7 and 9 described later are made of, for example, a photo-curable adhesive sheet, a UV-curable adhesive, a thermosetting adhesive, an epoxy adhesive, a cyanoacrylate-based instant adhesive and the like. It is done.
  • the touch panel 27 includes, for example, a touch panel base, a touch panel first wiring layer provided on the back side of the touch panel base, and a touch panel second wiring layer provided on the front side of the touch panel base. It has a configuration of capacitance method.
  • the touch panel substrate is made of, for example, polyimide resin, polyethylene terephthalate resin, polyethylene naphthalate resin, aramid resin, (meth) acrylate resin or the like.
  • the touch panel first wiring layer and the touch panel second wiring layer are made of, for example, a metal film such as copper.
  • the first organic layer Ha is, as shown in FIG. 2, an adhesive layer 28 provided on the surface of one side (upper side in the figure) of the organic EL display element 30a, and a protective layer provided on the upper side in the figure of the adhesive layer 28. It has 29 and.
  • the protective layer 29 and the protective layer 6 described later are made of, for example, silicone resin, polyethylene resin, polyimide resin, polyethylene terephthalate resin, polyethylene naphthalate resin, aramid resin, (meth) acrylate resin and the like.
  • the second organic layer Hb is provided on the lower side of the resin substrate layer 10 and the resin substrate layer 10 provided on the other surface (lower side in the drawing) of the organic EL display element 30a.
  • the adhesive layer 9, the base film 8 provided on the lower side of the adhesive layer 9 in the drawing, the adhesive layer 7 provided on the lower side of the base film 8 in the drawing, and the lower side of the adhesive layer 7 in the drawing A protective layer 6 is provided.
  • the resin substrate layer 10 is made of, for example, a polyimide resin or the like.
  • the organic EL display device 50a described above turns on the first TFT 13a in each sub-pixel P by inputting a gate signal to the first TFT 13a via the gate line 11, and the gate electrode of the second TFT 13b via the source line 12a. And writing a predetermined voltage corresponding to the source signal in the capacitor 13c, and the magnitude of the current from the power supply line 12b is defined based on the gate voltage of the second TFT 13b, and the defined current is supplied to the light emitting layer 3 Thus, the light emitting layer 3 emits light to display an image.
  • the gate voltage of the second TFT 13b is held by the capacitor 13c, so light emission by the light emitting layer 3 is continued until the gate signal of the next frame is input. Maintained.
  • the organic EL display device 50a can be manufactured, for example, as follows.
  • an organic EL element layer 20 is formed on the surface of a resin substrate layer 10 formed on a glass substrate via a base coat film 10a by using a known method to produce an element substrate. Further, the moisture-proof layer 24, the color filter 23 and the moisture-proof layer 22 are formed on the surface of the color filter substrate 25 formed on another glass substrate using a known method, to prepare a CF substrate. Subsequently, after bonding the element substrate and the CF substrate via the filling layer 21, the glass substrate on the CF substrate side is peeled off by laser irradiation or the like, and the back surface of the color filter substrate 25 is peeled off.
  • the adhesive layer 26, the touch panel 27, the adhesive layer 28, and the protective layer 29 are sequentially laminated on the Further, the glass substrate on the element substrate side is peeled off by laser irradiation or the like, and the adhesive layer 9, the base film 8, the adhesive layer 7, and the protective layer 6 are sequentially laminated on the back surface of the resin substrate layer 10 from which the glass substrate is peeled. .
  • the distance from the neutral plane N of the device body to the surface of the inorganic top layer Ia closest to the first organic layer Ha among the plurality of inorganic layers is d a ( ⁇ 0)
  • the distance from the neutral plane N of the device body to the surface of the inorganic lowermost layer Ib closest to the second organic layer Hb among the plurality of inorganic layers is the distance d b (> 0).
  • the film thickness of the first organic layer Ha and the second organic layer Hb is the surface of the inorganic top layer Ia on the side of the first organic layer Ha and the side of the second organic layer Hb on the inorganic bottom layer Ib.
  • the distance to the surface of (d b ⁇ d a ) is 45 times or more.
  • FIG. 5 is a schematic view showing a laminated structure of the organic EL display device 50 schematically illustrated in order to design the organic EL display device 50a of the present embodiment.
  • the plurality of inorganic layers and the plurality of organic layers constituting the device main body have predetermined elastic moduli (E 1 , E 2 ... E i ... E n ) and predetermined thicknesses.
  • E i (i is a natural number from 1 to n) of each layer indicates the elastic modulus of the layer
  • h i of each layer is one surface (upper surface in the figure) of the organic EL display device 50.
  • the distance to the surface on the other side (lower side in the drawing) of the organic EL display device 50 of the layer that is, the distance to the lower surface in the drawing of the layer is shown. Further, in FIG.
  • ⁇ indicates the distance between one surface (upper surface in the drawing) of the organic EL display device 50 and the neutral plane N of the organic EL display device 50
  • r indicates the organic EL display around the bending axis C The bending radius (bending diameter) when the device 50 is bent is shown.
  • FIG. 6 is a schematic view of the bending tester M.
  • FIG. 7 is a table
  • the bending tester M rotates the clamp jig G, to which one end of the strip-like test body S is fixed, by 180 ° around the rotating shaft rod J, the other end
  • the test body S to which the weight W is attached is configured to be repeatedly deformed from the extended state (solid line in the figure) to the bent state (two-dot chain line in the figure).
  • the test sample S is a 100 ⁇ m thick PET (polyethylene terephthalate) film with 0.5 ⁇ m thick inorganic films (silicon nitride film, silicon carbonitride film and silicon oxynitride film) on the front and back surfaces under a plurality of film forming conditions It formed and prepared by CVD method (chemical vapor deposition).
  • size of the test body S is 24 mm x 100 mm.
  • the prepared specimen S is set in a bending tester M (weight of weight W: 780 g) and reciprocated 100,000 times at 45 reciprocations / min. It observed by double-1000 times and confirmed the existence of a crack.
  • the breaking limit strain of the inorganic film was set to 1.1%.
  • SiN silicon nitride film
  • SiON silicon oxynitride film
  • SiCN silicon carbonitride film
  • FIG. 8 is a schematic view of a bent state of the organic EL display device 50. As shown in FIG.
  • the lower limit of the film thickness h a of the first organic layer Ha is composed and -d a /0.011+d a, the larger of the d b /0.011+d a.
  • FIG. 9 shows the first plane of the inorganic top layer Ia from the neutral plane N with respect to the film thickness h a of the first organic layer Ha and the distance (d b ⁇ d a ) of the inorganic top layer Ia and the inorganic bottom layer Ib. It is a graph showing the relationship between the ratio R a of the distance d a to the surface of the organic layer Ha side. And, as can be seen from the graph of FIG.
  • the ratio R a 0.5, that is, the neutral plane N is the surface of the inorganic top layer Ia on the first organic layer Ha side, and the second organic layer of the inorganic bottom layer Ib. when placing the center positions of the Hb-side surface, the film thickness h a of the first organic layer Ha is minimized.
  • FIG. 10 is a graph showing the relationship between the lower limit value h a ′ of the film thickness h a of the first organic layer Ha and the distance (d b ⁇ d a ) between the inorganic uppermost layer Ia and the inorganic lowermost layer Ib. is there. And, as can be seen from the graph of FIG.
  • the film thickness of the first organic layer Ha is the distance between the surface of the inorganic uppermost layer Ia on the side of the first organic layer Ha and the surface of the inorganic lowermost layer Ib on the side of the second organic layer Hb (d b ⁇ d a ) More than 45 times of.
  • the lower limit of the film thickness h a of the first organic layer Ha it was possible to set the lower limit of the film thickness h a of the first organic layer Ha be placed on one surface of the organic EL display device 50, the other surface of the organic EL display device 50 the lower limit of the thickness of the second organic layer Hb to place the side are determined as the lower limit of the film thickness h a of the first organic layer Ha, and the lower limit value of the film thickness h a of the first organic layer Ha It will be the same.
  • the film thickness of the first organic layer Ha and the second organic layer Hb is the distance between the surface of the inorganic top layer Ia on the side of the first organic layer Ha and the surface of the inorganic bottom layer Ib on the side of the second organic layer Hb It is 45 times or more of d b- d a ).
  • FIG. 11 is a table
  • Example 1 The test body of the 3.4 type
  • surface is as follows.
  • a silicone-based pressure-sensitive adhesive was used for the adhesive layers 2, 6, 25 and 27.
  • a polyimide resin was used as the touch panel substrate 4 described above.
  • a silicon nitride film was used as the moistureproof layer of 8 and 10.
  • a photosensitive acrylic resin was used as the second protective insulating film 14.
  • a silicon nitride film was used as the first protective insulating film 15.
  • a silicon oxide film was used as the third interlayer insulating film 16.
  • a silicon nitride film was used as the second interlayer insulating film 17.
  • a silicon oxide film was used as the first interlayer insulating film 18.
  • a tantalum nitride film was used as the first gate electrode layer 20.
  • a silicon oxide film was used as the gate insulating film 21.
  • a silicon oxide film was used as the second base coat film 22.
  • a tantalum nitride film was used as the first base coat film 23.
  • a polyimide resin was used as the resin substrate layer 24.
  • the polyimide resin was used as a base film of 26.
  • the elastic modulus (push-in elastic modulus) of each of the laminated elements was determined by measuring the push-in elastic modulus using Fischer Scope H100C manufactured by Fisher Instruments.
  • the organic layer is formed on a glass substrate at about 5 ⁇ m to 10 ⁇ m, and is measured by a load control with an indentation speed of 2 mN / sec, and the condition that the influence of the base is small in the range of 0.1 ⁇ m to 1 ⁇ m of maximum indentation amount It was adopted.
  • the inorganic layer is formed on a silicon substrate at about 0.5 ⁇ m to 1 ⁇ m, and measured by load control with an indentation speed of 2 mN / sec, and the influence of the base in the range of 0.1 ⁇ m to 0.3 ⁇ m in maximum indentation amount Adopted a small condition.
  • about one metal layer of an inorganic layer since the film thickness was thin and was patterned and the influence which it has on the whole was small, it fixed to 120 Mpa.
  • the 1st organic layer side of the inorganic top layer (the touch panel 2nd wiring layer of No. 3) closest to the 1st organic layer (protective layer of No. 1 etc.) from the neutral plane of the device main body and the distance d a to the surface of the second organic layer closest inorganic lowermost from the neutral plane of the apparatus main body in the second organic layer (protective layer of No.28) (first base film No.23)
  • the distance d b to the side surface was calculated.
  • “ ⁇ d a /0.011+d a ” and “d b /0.011+d a ” were calculated using the calculated distances d a and d b .
  • the presence or absence of breakage in the inorganic lowermost layer and the inorganic uppermost layer of the test body is determined with an optical microscope (magnification: 20 times to 1000 times)
  • the drop test (number of tests: 3 times) to confirm was done.
  • "o" indicates that there is no breakage in three of three times
  • "x" indicates that there is breakage in one or more of three times.
  • Comparative Example 1 The test body of the 3.4 type
  • Example 1 As a result of the experiment, the test body of Example 1 having a protective layer of 3408 ( ⁇ m) or more, which is a larger numerical value of “ ⁇ d a /0.011+d a ” and “d b /0.011+d a ”.
  • the distance (d b ⁇ d a ) is 47 ( ⁇ m), and 45 times of that is 2115 ⁇ m.
  • the organic EL display device 50a of the present embodiment As described above, according to the organic EL display device 50a of the present embodiment, the following effects can be obtained.
  • the first organic of the inorganic top layer Ia closest to the first organic layer Ha The distance to the surface on the layer Ha side is d a ( ⁇ 0), and the second organic layer Hb side of the inorganic lowermost layer Ib closest to the second organic layer Hb among the plurality of inorganic layers from the neutral plane N of the device main body
  • the lower limit value of the film thickness of the first organic layer Ha and the second organic layer Hb is ⁇ d a /0.011+d a and d b /0.011+d a , where d b (> 0) is the distance to the surface of Film breakage in the inorganic film inside the organic EL display device 50a can be suppressed.
  • FIG. 12 is a cross-sectional view of the organic EL display device 50b of the present embodiment.
  • the same parts as those in FIGS. 1 to 11 are denoted by the same reference numerals, and detailed descriptions thereof will be omitted.
  • the organic EL display device 50a including the first organic layer Ha having the protective layer 29 and the adhesive layer 28 is exemplified.
  • the protective layer 29, the matching oil layer 32, and the base An organic EL display device 50b provided with a first organic layer Ha having a film 31 is illustrated.
  • an organic EL display element 30a As shown in FIG. 12, an organic EL display element 30a, a first organic layer Ha provided on one surface side (upper side in the drawing) of the organic EL display element 30a, and an organic EL display And a second organic layer Hb provided on the other surface side (lower side in the drawing) of the element 30a.
  • a plurality of sub-pixels P are arranged in a matrix as in the organic EL display device 50a of the first embodiment.
  • the first organic layer Ha is, as shown in FIG. 12, a base film 31 provided on the surface of one side (the upper side in the drawing) of the organic EL display element 30a, and a matching oil provided on the upper side of the base film 31 in the drawing.
  • a layer 32 and a protective layer 29 provided on the upper side in the drawing of the matching oil layer 32 are provided.
  • the base film 31 is made of, for example, polyimide resin, polyethylene terephthalate resin, polyethylene naphthalate resin, aramid resin, (meth) acrylate resin or the like.
  • the matching oil layer 32 and the matching oil layer 36 described later are made of, for example, silicone oil or the like having a predetermined refractive index (for example, about 1.40 to 1.43).
  • the matching oil layer 32 and the matching oil layer 36 are sealed between the layers by, for example, a sealing material provided in a frame shape.
  • the second organic layer Hb is provided on the lower side of the resin substrate layer 10 and the resin substrate layer 10 provided on the other surface (lower side in the drawing) of the organic EL display element 30a.
  • the matching oil layer 36 and the protective layer 6 provided on the lower side in the drawing of the matching oil layer 36 are provided.
  • the organic EL display device 50b described above is configured to perform image display by causing the light emitting layer 3 to appropriately emit light in each sub-pixel P.
  • the organic EL display device 50b can be manufactured by appropriately changing the method of manufacturing the organic EL display device 50a of the first embodiment.
  • the film thicknesses of the first organic layer Ha and the second organic layer Hb are the same as those of the organic EL display device 50a of the first embodiment, on the side of the first organic layer Ha of the inorganic uppermost layer Ia.
  • the distance between the surface and the surface on the second organic layer Hb side of the inorganic lowermost layer Ib is 45 or more times the distance (db ⁇ da).
  • FIG. 13 is a table showing the contents of Example 2 and Comparative Example 2 which are specifically carried out in the organic EL display device 50b according to the present embodiment.
  • Example 2 The test body of the 3.4 type
  • surface is as follows.
  • a silicone resin was used as the protective layers 1 and 27.
  • the polyimide resin was used as a base film of 3.
  • a polyimide resin was used as the touch panel substrate 5.
  • a polyimide resin was used as the color filter substrate of No. 8.
  • a silicon nitride film was used as the moistureproof layer 9 and 11.
  • a photosensitive acrylic resin was used as the second protective insulating film 15.
  • a silicon nitride film was used as the first protective insulating film 16.
  • a silicon oxide film was used as the third interlayer insulating film 17.
  • a silicon nitride film was used as the second interlayer insulating film 18.
  • a silicon oxide film was used as the first interlayer insulating film 19.
  • a tungsten film was used as the 20 second gate electrode layer.
  • a tantalum nitride film was used as the first gate electrode layer 21.
  • a silicon oxide film was used as the gate insulating film 22.
  • a silicon oxide film was used as the 23 second base coat film.
  • a tantalum nitride film was used as the first base coat film 24.
  • a polyimide resin was used as the resin substrate layer 25.
  • the 1st organic layer side of the inorganic top layer (the touch panel 2nd wiring layer of No. 3) closest to the 1st organic layer (protective layer of No. 1 etc.) from the neutral plane of the device main body and the distance d a to the surface of the second organic layer closest inorganic lowermost from the neutral plane of the apparatus main body in the second organic layer (protective layer of No.27) (first base film No.24)
  • the distance d b to the side surface was calculated.
  • “ ⁇ d a /0.011+d a ” and “d b /0.011+d a ” were calculated using the calculated distances d a and d b .
  • the drop test confirmed the presence or absence of breakage in the inorganic uppermost layer and the inorganic lowermost layer of the prepared test body.
  • Comparative Example 2 The test body of the 3.4 type
  • the test body of Example 2 having a protective layer of 2442 ( ⁇ m) or more which is the larger numerical value of “ ⁇ d a /0.011+d a ” and “d b /0.011+d a ”.
  • the distance (d b ⁇ d a ) is 47 ( ⁇ m), and 45 times of that is 2115 ⁇ m.
  • the organic EL display device 50b of the present embodiment As described above, according to the organic EL display device 50b of the present embodiment, the following effects can be obtained.
  • the first organic of the inorganic top layer Ia closest to the first organic layer Ha The distance to the surface on the layer Ha side is d a ( ⁇ 0), and the second organic layer Hb side of the inorganic lowermost layer Ib closest to the second organic layer Hb among the plurality of inorganic layers from the neutral plane N of the device main body
  • the lower limit value of the film thickness of the first organic layer Ha and the second organic layer Hb is ⁇ d a /0.011+d a and d b /0.011+d a , where d b (> 0) is the distance to the surface of Film breakage in the inorganic film inside the organic EL display device 50b can be suppressed.
  • Third Embodiment 14 and 15 show a third embodiment of the organic EL display device according to the present invention.
  • FIG. 14 is a cross-sectional view of the organic EL display device 50b of the present embodiment.
  • the organic EL display device 50b provided with the second organic layer Hb having the resin substrate layer 10, the match oil layer 36, and the protective layer 6 is illustrated, but in the present embodiment, the resin substrate layer 10
  • An organic EL display device 50c provided with a second organic layer Hb having a matching oil layer 36a, a back support layer 37, a matching oil layer 36b, and a protective layer 6 is illustrated.
  • the organic EL display device 50c includes an organic EL display element 30c, a first organic layer Ha provided on one surface side (upper side in the drawing) of the organic EL display element 30c, and an organic EL display And a second organic layer Hb provided on the other surface side (lower side in the drawing) of the element 30c.
  • a plurality of sub-pixels P are arranged in a matrix as in the organic EL display device 50a of the first embodiment.
  • the organic EL display element 30c has a base coat layer 10a, an organic EL element layer 20 provided on the surface side of the base coat layer 10a, and a filling provided in order on the surface side of the organic EL element layer 20.
  • a layer 21, a moisture-proof layer 22, a color filter 23, and a touch panel 27c are provided.
  • the touch panel 27c includes, for example, a touch panel base, a touch panel first wiring layer provided on the back side of the touch panel base, a touch panel second wiring layer provided on the front side of the touch panel base, and a touch panel second wiring layer. And a moisture-proof layer provided on the surface side of the light-emitting element, and is configured as a projected capacitive type.
  • the color filter 23 is provided on the back surface side of the touch panel first wiring layer of the touch panel 27 c.
  • the first organic layer Ha is, as shown in FIG. 14, a base film 31 provided on the surface of one side (upper side in the drawing) of the organic EL display element 30c, and a matching oil provided on the upper side of the base film 31 in the drawing.
  • a layer 32 and a protective layer 29 provided on the upper side in the drawing of the matching oil layer 32 are provided.
  • the second organic layer Hb is provided on the lower side of the resin substrate layer 10 and the resin substrate layer 10 provided on the other surface (lower side in the drawing) of the organic EL display element 30 c.
  • a protective layer 6 provided on the lower side of the figure.
  • the matching oil layers 36a and 36b are made of, for example, silicone oil or the like having a predetermined refractive index (for example, about 1.40 to 1.43).
  • the back support layer 37 is made of, for example, a nickel-titanium alloy or the like.
  • the organic EL display device 50 c described above is configured to perform image display by appropriately emitting light from the light emitting layer 3 in each sub-pixel P.
  • the organic EL display device 50c can be manufactured by appropriately changing the method of manufacturing the organic EL display device 50a of the first embodiment.
  • the lower limit value of the film thickness of the first organic layer Ha and the second organic layer Hb is -d a /0.011+d a , as in the organic EL display device 50a of the first embodiment. , D b /0.011+d a , whichever is the larger.
  • the thicknesses of the first organic layer Ha and the second organic layer Hb are on the side of the first organic layer Ha of the inorganic uppermost layer Ia.
  • the distance between the surface and the surface on the second organic layer Hb side of the inorganic lowermost layer Ib is 45 or more times the distance (db ⁇ da).
  • FIG. 15 is a table showing the contents of Example 3 and Comparative Example 3 which are specifically carried out in the organic EL display device 50c according to the present embodiment.
  • Example 3 The test body of the 3.4 type
  • surface is as follows.
  • a silicone resin was used as the protective layers 1 and 27.
  • the polyimide resin was used as a base film of 3.
  • a polyimide resin was used as the touch panel substrate 6.
  • a photosensitive acrylic resin was used as the second protective insulating film 13.
  • a silicon nitride film was used as the first protective insulating film 14.
  • a silicon oxide film was used as the third interlayer insulating film 15.
  • a silicon nitride film was used as the second interlayer insulating film 16.
  • a silicon oxide film was used as the first interlayer insulating film 17.
  • a tantalum nitride film was used as the first gate electrode layer 19.
  • a silicon oxide film was used as the gate insulating film 20.
  • a silicon oxide film was used as the second base coat film 21.
  • a tantalum nitride film was used as the first base coat film 22.
  • a polyimide resin was used as the resin substrate layer 23.
  • a nickel-titanium alloy was used as the back support layer 25.
  • the distance d a and the second organic layer side surface of the closest inorganic lowermost from the neutral plane of the apparatus main body in the second organic layer (protective layer of No.27) (first base film No.22) of The distance d b was calculated. Furthermore, “ ⁇ d a /0.011+d a ” and “d b /0.011+d a ” were calculated using the calculated distances d a and d b . Further, the drop test confirmed the presence or absence of breakage in the inorganic uppermost layer and the inorganic lowermost layer of the prepared test body.
  • Comparative Example 3 The test body of the 3.4 type
  • the test body of Example 3 having a protective layer of 2062 ( ⁇ m) or more which is a larger numerical value of “ ⁇ d a /0.011+d a ” and “d b /0.011+d a ”.
  • the distance (d b -d a ) is 38 ( ⁇ m), and 45 times of that is 1710 ⁇ m.
  • the organic EL display device 50c of the present embodiment As described above, according to the organic EL display device 50c of the present embodiment, the following effects can be obtained.
  • the first organic of the inorganic top layer Ia closest to the first organic layer Ha The distance to the surface on the layer Ha side is d a ( ⁇ 0), and the second organic layer Hb side of the inorganic lowermost layer Ib closest to the second organic layer Hb among the plurality of inorganic layers from the neutral plane N of the device main body
  • the lower limit value of the film thickness of the first organic layer Ha and the second organic layer Hb is ⁇ d a /0.011+d a and d b /0.011+d a , where d b (> 0) is the distance to the surface of Film breakage in the inorganic film inside the organic EL display device 50c can be suppressed.
  • FIG. 16 is a cross-sectional view of the organic EL display device 50d of the present embodiment.
  • the organic EL display device 50a including the second organic layer Hb having the protective layer 6, the adhesive layer 7, the base film 8, the adhesive layer 9, and the resin substrate layer 10 is exemplified.
  • an organic EL display device 50d provided with a second organic layer Hb having the protective layer 6, the adhesive layer 9, and the resin substrate layer 10 is illustrated.
  • an organic EL display element 30a As shown in FIG. 16, an organic EL display element 30a, a first organic layer Ha provided on one surface side (upper side in the drawing) of the organic EL display element 30a, and an organic EL display And a second organic layer Hb provided on the other surface side (lower side in the drawing) of the element 30a.
  • a plurality of sub-pixels P are arranged in a matrix as in the organic EL display device 50a of the first embodiment.
  • the first organic layer Ha is, as shown in FIG. 16, an adhesive layer 28 provided on the surface of one side (upper side in the figure) of the organic EL display element 30a, and a protective layer provided on the upper side in the figure of the adhesive layer 28. It has 29 and.
  • the second organic layer Hb is provided on the lower side of the resin substrate layer 10 and the resin substrate layer 10 provided on the surface of the other side (lower side in the drawing) of the organic EL display element 30a.
  • the adhesive layer 9 is provided, and the protective layer 6 provided on the lower side of the adhesive layer 9 in the figure.
  • the organic EL display device 50 d described above is configured to perform image display by causing the light emitting layer 3 to appropriately emit light in each sub-pixel P.
  • the organic EL display device 50d can be manufactured by appropriately changing the method of manufacturing the organic EL display device 50a of the first embodiment.
  • the thicknesses of the first organic layer Ha and the second organic layer Hb are on the side of the first organic layer Ha of the inorganic uppermost layer Ia.
  • the distance between the surface and the surface on the second organic layer Hb side of the inorganic lowermost layer Ib is 45 or more times the distance (db ⁇ da).
  • FIG. 17 is a table showing the contents of Examples 4 to 6 and Comparative Examples 4 to 7 which are specifically carried out in the organic EL display device 50d according to the present embodiment.
  • surface of FIG. 17 was produced.
  • surface is as follows.
  • a silicone-based pressure-sensitive adhesive was used as the adhesive layers 2, 6 and 25.
  • a polyimide resin was used as the touch panel substrate 4 described above.
  • a silicon nitride film was used as the moistureproof layer of 8 and 10.
  • a photosensitive acrylic resin was used as the second protective insulating film 14.
  • a silicon nitride film was used as the first protective insulating film 15.
  • a silicon oxide film was used as the third interlayer insulating film 16.
  • a silicon nitride film was used as the second interlayer insulating film 17.
  • a silicon oxide film was used as the first interlayer insulating film 18.
  • a tantalum nitride film was used as the first gate electrode layer 20.
  • a silicon oxide film was used as the gate insulating film 21.
  • a silicon oxide film was used as the second base coat film 22.
  • a tantalum nitride film was used as the first base coat film 23.
  • a polyimide resin was used as the resin substrate layer 24.
  • the 1st organic layer side of the inorganic top layer (the touch panel 2nd wiring layer of No. 3) closest to the 1st organic layer (protective layer of No. 1 etc.) from the neutral plane of the device main body and the distance d a to the surface of the second organic layer closest inorganic lowermost from the neutral plane of the apparatus main body in the second organic layer (protective layer of No.26) (first base film No.23)
  • the distance d b to the side surface was calculated.
  • “ ⁇ d a /0.011+d a ” and “d b /0.011+d a ” were calculated using the calculated distances d a and d b .
  • the drop test confirmed the presence or absence of breakage in the inorganic uppermost layer and the inorganic lowermost layer of the prepared test body.
  • Comparative Example 4 The test body of the 3.4 type
  • the organic EL display device 50d of the present embodiment As described above, according to the organic EL display device 50d of the present embodiment, the following effects can be obtained.
  • the first organic of the inorganic top layer Ia closest to the first organic layer Ha The distance to the surface on the layer Ha side is d a ( ⁇ 0), and the second organic layer Hb side of the inorganic lowermost layer Ib closest to the second organic layer Hb among the plurality of inorganic layers from the neutral plane N of the device main body
  • the lower limit value of the film thickness of the first organic layer Ha and the second organic layer Hb is ⁇ d a /0.011+d a and d b /0.011+d a , where d b (> 0) is the distance to the surface of Film breakage in the inorganic film inside the organic EL display device 50d can be suppressed.
  • FIG. 18 is a cross-sectional view of the organic EL display device 50e of the present embodiment.
  • the organic EL display devices 50a to 50d in which the touch panel and the color filter substrate are separately provided are illustrated, but in the present embodiment, the in-cell in which the touch panel is provided in the color filter substrate The touch panel type organic EL display device 50e is illustrated.
  • an organic EL display element 30e As shown in FIG. 18, an organic EL display element 30e, a first organic layer Ha provided on one surface side (upper side in the drawing) of the organic EL display element 30e, and an organic EL display And a second organic layer Hb provided on the other surface side (lower side in the drawing) of the element 30e.
  • a plurality of sub-pixels P are arranged in a matrix as in the organic EL display device 50a of the first embodiment.
  • the organic EL display element 30e is, as shown in FIG. 18, a base coat layer 10a, an organic EL element layer 20 provided on the surface side of the base coat layer 10a, and a filling provided sequentially on the surface side of the organic EL element layer 20.
  • the layer 21, the moisture-proof layer 22, the color filter 23, and the touch panel 27 e are provided.
  • the touch panel 27e includes, for example, a touch panel substrate, a touch panel first wiring layer provided on the back surface side of the touch panel substrate, a touch panel second wiring layer provided on the front surface side of the touch panel substrate, and a touch panel second wiring layer. And a moisture-proof layer provided on the surface side of the light-emitting element, and is configured as a projected capacitive type.
  • the color filter 23 is provided integrally with the touch panel 27e on the back side of the touch panel first wiring layer.
  • the first organic layer Ha is, as shown in FIG. 18, a base film 33 provided on the surface of one side (upper side in the drawing) of the organic EL display element 30e, and an adhesive layer provided on the upper side in the drawing of the base film 33. 28 and a protective layer 29 provided on the upper side of the adhesive layer 28 in the figure.
  • the base film 33 is made of, for example, polyimide resin, polyethylene terephthalate resin, polyethylene naphthalate resin, aramid resin, (meth) acrylate resin or the like.
  • the second organic layer Hb is provided on the lower side of the resin substrate layer 10 and the resin substrate layer 10 provided on the surface (lower side in the drawing) of the organic EL display element 30e.
  • the adhesive layer 9 is provided, and the protective layer 6 provided on the lower side of the adhesive layer 9 in the figure.
  • the organic EL display device 50 e described above is configured to perform image display by causing the light emitting layer 3 to appropriately emit light in each sub-pixel P.
  • the organic EL display device 50e can be manufactured by appropriately changing the method of manufacturing the organic EL display device 50a of the first embodiment.
  • the thicknesses of the first organic layer Ha and the second organic layer Hb are on the side of the first organic layer Ha of the inorganic uppermost layer Ia.
  • the distance between the surface and the surface on the second organic layer Hb side of the inorganic lowermost layer Ib is 45 or more times the distance (db ⁇ da).
  • FIG. 19 is a table showing the contents of Examples 7 to 9 and Comparative Examples 8 to 11 performed specifically in the organic EL display device 50e according to the present embodiment.
  • surface of FIG. 19 was produced.
  • surface is as follows.
  • a silicone resin was used as the protective layers 1 and 25.
  • a silicone pressure sensitive adhesive was used as the adhesive layers 2 and 24.
  • the polyimide resin was used as a base film of 3.
  • a silicon nitride film was used as the moistureproof layer 4 and 9.
  • a polyimide resin was used as the touch panel substrate 6.
  • a photosensitive acrylic resin was used as the second protective insulating film 13.
  • a silicon nitride film was used as the first protective insulating film 14.
  • a silicon oxide film was used as the third interlayer insulating film 15.
  • a silicon nitride film was used as the second interlayer insulating film 16.
  • a silicon oxide film was used as the first interlayer insulating film 17.
  • a tantalum nitride film was used as the first gate electrode layer 19.
  • a silicon oxide film was used as the gate insulating film 20.
  • a silicon oxide film was used as the second base coat film 21.
  • a tantalum nitride film was used as the first base coat film 22.
  • a polyimide resin was used as the resin substrate layer 23.
  • the distance d a and the second organic layer side surface of the closest inorganic lowermost from the neutral plane of the apparatus main body in the second organic layer (protective layer of No.25) (first base film No.22) of The distance d b was calculated. Furthermore, “ ⁇ d a /0.011+d a ” and “d b /0.011+d a ” were calculated using the calculated distances d a and d b . Further, the drop test confirmed the presence or absence of breakage in the inorganic uppermost layer and the inorganic lowermost layer of the prepared test body.
  • Comparative Example 8 The test body of the 3.4 type
  • the organic EL display device 50e of the present embodiment As described above, according to the organic EL display device 50e of the present embodiment, the following effects can be obtained.
  • the first organic of the inorganic top layer Ia closest to the first organic layer Ha The distance to the surface on the layer Ha side is d a ( ⁇ 0), and the second organic layer Hb side of the inorganic lowermost layer Ib closest to the second organic layer Hb among the plurality of inorganic layers from the neutral plane N of the device main body
  • the lower limit value of the film thickness of the first organic layer Ha and the second organic layer Hb is ⁇ d a /0.011+d a and d b /0.011+d a , where d b (> 0) is the distance to the surface of Film breakage in the inorganic film inside the organic EL display device 50 e can be suppressed.
  • the organic EL layer having a five-layer laminated structure of the hole injection layer, the hole transport layer, the light emitting layer, the electron transport layer, and the electron injection layer is exemplified. It may be a three-layer laminated structure of a hole injection layer and hole transport layer, a light emitting layer, and an electron transport layer and electron injection layer.
  • the organic EL display device is exemplified in which the first electrode is an anode and the second electrode is a cathode.
  • the laminated structure of the organic EL layer is reversed and the first electrode is a cathode.
  • the present invention can also be applied to an organic EL display device in which the second electrode is an anode.
  • the organic EL display device including the element substrate in which the electrode of the TFT connected to the first electrode is a drain electrode is exemplified.
  • the TFT connected to the first electrode The present invention can also be applied to an organic EL display device provided with an element substrate whose electrode is called a source electrode.
  • the organic EL display device has been described as an example of the display device.
  • the present invention can be applied to a display device provided with a plurality of light emitting elements driven by current.
  • the present invention can be applied to a display device provided with a QLED (Quantum-dot light emitting diode) which is a light emitting element using a quantum dot-containing layer.
  • QLED Quantum-dot light emitting diode
  • the present invention is useful for flexible display devices.

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Abstract

Un dispositif d'affichage selon l'invention comprend un corps de dispositif qui comprend : un élément d'affichage électroluminescent comprenant un stratifié incluant une pluralité de couches inorganiques ; et une première couche organique (Ha) et une seconde couche organique (Hb) disposées sur une surface et sur l'autre surface de l'élément d'affichage électroluminescent. La limite inférieure de l'épaisseur de film de la première couche organique (Ha) et de la seconde couche organique (Hb) est représentée par la valeur la plus élevée parmi −da/0,011+da et db/0,011+da, où da(<0) représente la distance du plan neutre (N) du corps de dispositif à la surface côté première couche organique (Ha) de la couche inorganique la plus élevée (Ia) la plus proche de la première couche organique (Ha) et db(>0) représente la distance du plan neutre (N) du corps de dispositif à la surface côté seconde couche organique (Hb) de la couche inorganique la plus basse (Ib) la plus proche de la seconde couche organique (Hb).
PCT/JP2018/028392 2017-08-04 2018-07-30 Dispositif d'affichage WO2019026821A1 (fr)

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JP2011194587A (ja) * 2010-03-17 2011-10-06 Konica Minolta Holdings Inc ガスバリアフィルム、その製造方法、それを用いた有機光電変換素子及び太陽電池
WO2014136259A1 (fr) * 2013-03-08 2014-09-12 パイオニア株式会社 Élément électroluminescent
JP2014209261A (ja) * 2014-06-26 2014-11-06 セイコーエプソン株式会社 情報表示端末
JP2014218012A (ja) * 2013-05-08 2014-11-20 コニカミノルタ株式会社 封止フィルム、その製造方法及び封止フィルムで封止された機能素子
US20160285017A1 (en) * 2014-04-29 2016-09-29 Boe Technology Group Co., Ltd. Flexible substrate, oled device and defect detecting method for the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011194587A (ja) * 2010-03-17 2011-10-06 Konica Minolta Holdings Inc ガスバリアフィルム、その製造方法、それを用いた有機光電変換素子及び太陽電池
WO2014136259A1 (fr) * 2013-03-08 2014-09-12 パイオニア株式会社 Élément électroluminescent
JP2014218012A (ja) * 2013-05-08 2014-11-20 コニカミノルタ株式会社 封止フィルム、その製造方法及び封止フィルムで封止された機能素子
US20160285017A1 (en) * 2014-04-29 2016-09-29 Boe Technology Group Co., Ltd. Flexible substrate, oled device and defect detecting method for the same
JP2014209261A (ja) * 2014-06-26 2014-11-06 セイコーエプソン株式会社 情報表示端末

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