WO2019017493A1 - Sensor and electronic device - Google Patents

Sensor and electronic device Download PDF

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Publication number
WO2019017493A1
WO2019017493A1 PCT/JP2018/027396 JP2018027396W WO2019017493A1 WO 2019017493 A1 WO2019017493 A1 WO 2019017493A1 JP 2018027396 W JP2018027396 W JP 2018027396W WO 2019017493 A1 WO2019017493 A1 WO 2019017493A1
Authority
WO
WIPO (PCT)
Prior art keywords
sensor
electronic device
sensing unit
sensing
electrode layer
Prior art date
Application number
PCT/JP2018/027396
Other languages
French (fr)
Japanese (ja)
Inventor
智幹 川畑
靖 石徹白
俊昭 西川
宗毅 海老原
聡 藤澤
圭 塚本
広章 山名
山口 誠
恵介 紀野国
Original Assignee
ソニー株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ソニー株式会社 filed Critical ソニー株式会社
Priority to JP2019530628A priority Critical patent/JPWO2019017493A1/en
Priority to US16/632,751 priority patent/US11009986B2/en
Publication of WO2019017493A1 publication Critical patent/WO2019017493A1/en

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Classifications

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    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
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    • HELECTRICITY
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    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H13/00Switches having rectilinearly-movable operating part or parts adapted for pushing or pulling in one direction only, e.g. push-button switch
    • H01H13/02Details
    • HELECTRICITY
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    • H04M1/72454User interfaces specially adapted for cordless or mobile telephones with means for adapting the functionality of the device according to specific conditions according to context-related or environment-related conditions

Definitions

  • the present disclosure relates to sensors and electronic devices.
  • Patent Document 1 electronic devices capable of detecting the pressure on the surface of a housing have been proposed.
  • a pressure sensor a sensor provided with a conductive layer, a sensor layer including a plurality of sensor portions, and a space layer provided between the conductive layer and the sensor layer is used.
  • An object of the present disclosure is to provide a sensor and an electronic device capable of suppressing a malfunction.
  • an operation of an electronic device is provided based on a detection result of a housing, a sensor provided on an inner side surface of the housing and detecting deformation of the housing, and a sensor.
  • the sensor is an electronic device including a first sensing unit for detecting a prescribed user operation and a second sensing unit for compensating for a malfunction.
  • a second disclosure includes a case, a sensor provided in the case, which detects a deformation of the case, and a control unit which controls an operation of an electronic device based on a detection result of the sensor.
  • the sensor is an electronic device having a first sensing unit for detecting a prescribed user operation and a second sensing unit for compensating for a malfunction.
  • a third disclosure is a sensor provided on an inner side surface of a housing to detect a deformation of the housing, the first sensing unit for detecting a prescribed user operation, and a second sensor for compensating a malfunction. It is a sensor which has 2 sensing parts.
  • a fourth disclosure is a sensor provided in a housing, which detects a deformation of the housing, and a first sensing unit for detecting a prescribed user operation, and a second sensor for compensating a malfunction. It is a sensor which has a sensing part.
  • FIG. 1 is an exploded perspective view showing the configuration of the electronic device according to the first embodiment of the present disclosure.
  • FIG. 2 is a plan view showing a part of the side wall portion in an enlarged manner.
  • FIG. 3A is a cross-sectional view taken along the line IIIA-IIIA of FIG. 3B is a cross-sectional view taken along the line IIIB-IIIB of FIG.
  • FIG. 4 is an exploded perspective view showing the configuration of the sensor support.
  • FIG. 5A is a schematic view showing the arrangement of the sensing unit of the sensor.
  • FIG. 5B is a cross-sectional view showing the configuration of the sensor.
  • FIG. 6 is a plan view showing the configuration of the sensing unit.
  • FIG. 7 is a block diagram showing a circuit configuration of the electronic device according to the first embodiment of the present disclosure.
  • FIG. 8A is a schematic view showing an example in which a prescribed position is pressed.
  • FIG. 8B is a graph showing an example of the output value of the sensing unit when the position shown in FIG. 8A is pressed.
  • FIG. 9A is a schematic view showing the direction of bending applied to the electronic device.
  • FIG. 9B is a graph showing an example of the output value of the sensing unit when bending is applied in the direction shown in FIG. 9A.
  • FIG. 10A is a schematic view showing the direction of twist applied to the electronic device.
  • FIG. 10B is a graph showing an example of the output value of the sensing unit when twisting is applied in the direction shown in FIG. 10A.
  • FIG. 11A is a schematic view showing an example in which a place other than the prescribed position is pressed.
  • FIG. 11B is a graph showing an example of the output value of the sensing unit when the position shown in FIG. 11A is pressed.
  • FIG. 12 is a flowchart for explaining the operation of the electronic device according to the first embodiment of the present disclosure.
  • FIG. 13A is a schematic diagram showing an example of a warning screen that informs the user that bending or twisting has been applied to the electronic device.
  • FIG. 13B is a schematic diagram showing an example of a warning screen that informs the user that the correct position is not pressed.
  • FIG. 14 is a cross-sectional view showing the configuration of an electronic device according to a modification of the first embodiment of the present disclosure.
  • FIG. 15A and 15B are cross-sectional views showing the configuration of an electronic device according to a modification of the first embodiment of the present disclosure.
  • FIG. 16A is a cross-sectional view showing the state when the bottom of the electronic device is pressed.
  • FIG. 16B is a graph showing an example of detection signals of each sensing unit in the state shown in FIG. 16A.
  • 17A and 17B are schematic diagrams for describing the scan order of the sensing unit.
  • FIG. 18A is an exploded perspective view showing the configuration of a sensor support.
  • FIG. 18B is a perspective view showing the configuration of a sensor support.
  • 19A and 19B are plan views showing modified examples of the sensor.
  • FIG. 20A is a plan view showing a modified example of the sensor.
  • FIG. 20B is a graph showing a detection signal when the position P A shown in FIG. 20A is pressed.
  • Figure 20C is a graph showing a detection signal when the position P B shown in FIG. 20A is pressed.
  • FIG. 21 is a plan view showing the configuration of a self-capacitance sensor electrode layer.
  • FIG. 22 is a perspective view showing the configuration of the electronic device according to the second embodiment of the present disclosure.
  • FIG. 23 is a plan view showing the configuration of the sensor.
  • FIG. 24A is a schematic view showing an example of a screen when using a camera application.
  • FIG. 24B is a schematic view showing an example of mapping setting of a sensing unit when using a camera application.
  • FIG. 25A is a schematic view showing an example of a screen when using a music application.
  • FIG. 25B is a schematic diagram illustrating an example of mapping setting of the sensing unit when using a music application.
  • FIG. 26A is a schematic view showing an example of a screen when using a map application.
  • FIG. 26B is a schematic view showing an example of mapping setting of the sensing unit when using the map application.
  • FIG. 27 is a flowchart for explaining the operation of the electronic device according to the second embodiment of the present disclosure.
  • FIG. 28 is an exploded perspective view showing the configuration of the electronic device according to the third embodiment of the present disclosure.
  • FIG. 29A is a perspective view showing the configuration of a sensor.
  • FIG. 29B is a plan view showing the sensor in a flat state.
  • FIG. 30 is a cross-sectional view taken along the line XXX-XXX in FIG.
  • FIG. 31A is a plan view showing a configuration example of mutual capacitance type sensor electrode layers.
  • FIG. 31B is a plan view showing another configuration example of the mutual capacitance type sensor electrode layer.
  • FIG. 32A is a perspective view showing an example of a pressed position on a sensor.
  • Figure 32B is a graph showing a detection signal when the position P A shown in FIG. 32A is pressed.
  • Figure 32C is a graph showing a detection signal when the position P B shown in FIG. 32A is pressed.
  • FIG. 33 is a flowchart for explaining the operation of the electronic device according to the third embodiment of the present disclosure.
  • FIG. 34 is a plan view showing the configuration of a self-capacitance sensor electrode layer.
  • FIG. 35A is a perspective view showing an internal configuration of an electronic device according to a fourth embodiment of the present disclosure.
  • FIG. 35B is a cross-sectional view along the line XXXVB-XXXVB in FIG. 35A.
  • FIG. 36 is a perspective view showing an appearance of a sensor module.
  • FIG. 37 is an exploded perspective view showing an internal configuration of the electronic device according to the fifth embodiment of the present disclosure.
  • FIG. 38 is a cross-sectional view showing the configuration in the vicinity of the side wall portion.
  • FIG. 39A and FIG. 39B are perspective views for explaining the mounting method of the sensor module.
  • FIG. 40A and FIG. 40B are perspective views for explaining the mounting method of the sensor module.
  • FIG. 41A is a cross-sectional view showing a configuration of an electronic device according to a sixth embodiment of the present disclosure.
  • FIG. 41B is a cross-sectional view showing an expanded state of the sensor shown in FIG. 41A.
  • FIG. 42 is a plan view showing the configuration of the flexible printed circuit.
  • FIG. 43 is a cross-sectional view showing a modified example of the sensor.
  • FIG. 44 is a cross-sectional view showing a configuration of the electronic device according to the seventh embodiment of the present disclosure.
  • FIG. 45 is a cross-sectional view showing a modified example of the sensor.
  • FIG. 46A is a graph showing a change in capacitance of the sensor of Reference Example 1.
  • FIG. 46B is a graph showing a change in capacitance of the sensor of Reference Example 2.
  • FIG. 1 shows the configuration of the electronic device 10 according to the first embodiment.
  • the electronic device 10 according to the first embodiment is a so-called smart phone, and a case 11 as an exterior body having a thin box shape with one main surface released, and a substrate 12 housed in the case 11 And a front panel 13 provided to close one of the released main surfaces.
  • the housing 11 includes a rectangular plate-like bottom portion 11M that constitutes the back surface of the electronic device 10, and a wall portion 11N provided on the periphery of the bottom portion 11M.
  • the wall portion 11N is erected perpendicularly to the bottom portion 11M, and has side wall portions 11R and 11L provided on both long sides of the bottom portion 11M.
  • the thickness of the housing 11 is preferably 1 mm or more, for example, 1.08 mm or 1.4 mm.
  • the outer side surface 11SA of the side wall 11R has buttons BT1, BT2 and BT3 provided in a line in the longitudinal direction of the side wall 11R (that is, the circumferential direction of the wall 11N). Recesses are provided at the positions of the buttons BT1, BT2 and BT3, respectively.
  • the buttons BT1, BT2, and BT3 are, for example, a volume down button, a volume up button, and a power button.
  • the housing 11 has a groove portion 14 provided along the inner side surface 11SB of the side wall portion 11R, as shown in FIGS.
  • the long sensor 20 having a film shape
  • the long elastic body 51 having a film shape
  • the long spacer 52 having a film shape
  • the film also includes a sheet.
  • at least one of the sensor 20, the elastic body 51, and the spacer 52 may have a plate shape.
  • the sensor 20, the elastic body 51, and the spacer 52 are overlapped in the order of the sensor 20, the elastic body 51, and the spacer 52 in a direction away from the side of the inner side surface 11SB.
  • the elastic body 51 may be bonded to the sensor 20 by an adhesive layer such as a double-sided adhesive tape.
  • the longitudinal direction of the sensor 20 is referred to as ⁇ X axis direction
  • the width direction (short direction) is referred to as ⁇ Y axis direction
  • Vertical direction) is called ⁇ Z axis direction.
  • the sensor 20 is a capacitive pressure sensor.
  • a mutual capacitive pressure sensor is used as a capacitive pressure sensor.
  • the sensor 20 has an elongated rectangular shape, and the connection portion 41 extends from the center of one long side of the sensor 20.
  • a connector 42 is provided at the tip of the extended connection portion 41, and the connector 42 is connected to a connector (not shown) provided on the substrate 12.
  • One main surface of the sensor 20 is a sensing surface 20S that detects a pressure, and the sensor 20 is accommodated in the groove portion 14 such that the sensing surface 20S is pressed against the inner surface 11SB.
  • the main surface on the opposite side to sensing surface 20S among both main surfaces of sensor 20 is called back.
  • the sensor 20 and the connection portion 41 are integrally configured by one FPC 40 having a T-shape. By adopting such a configuration, the number of parts can be reduced. Further, the impact durability of the connection between the sensor 20 and the substrate 12 can be improved. However, the sensor 20 and the connection portion 41 may be configured separately. In this configuration, the sensor 20 may be made of, for example, a rigid substrate or a rigid flexible substrate.
  • FIG. 5A is a plan view showing the configuration of the sensor 20.
  • the sensor 20 has sensing units SE1 to SE7 arranged in a line at equal intervals in the longitudinal direction of the sensor 20.
  • the intervals of the sensing units SE1 to SE7 are not limited to equal intervals, and may be arranged at unequal intervals according to the desired characteristics.
  • the sensing units SE1 to SE7 when they are not particularly distinguished, they may be referred to as a sensing unit SE.
  • detection signals detected by the sensing units SE1 to SE7 may be referred to as detection signals S1 to S7.
  • the sensing units SE2, SE4, and SE6 are first sensing units (hereinafter referred to as “sensing units for detecting user operation”) for detecting user operations (specified user operations) by pressing the buttons BT1, BT2, and BT3, respectively.
  • the sensing units SE1, SE3, SE5, and SE7 are second sensing units (hereinafter sometimes referred to as “sensing units for malfunction compensation") for compensating for malfunction of the electronic device 10.
  • the sensing unit SE3 for malfunction compensation is provided between the adjacent sensing units SE2 and SE4 for user operation detection.
  • the sensing unit SE5 for malfunction compensation is provided between the adjacent sensing units SE4 and SE6 for user operation detection.
  • the sensing units SE2, SE4, and SE6 are provided at positions corresponding to the buttons BT1, BT2, and BT3, respectively, and detect pressing of the buttons BT1, BT2, and BT3.
  • the sensing units SE3 and SE5 are provided at positions corresponding to the buttons BT1 and BT2 and the buttons BT2 and BT3, respectively, and detect the press between the buttons BT1 and BT2 and the press between the buttons BT2 and BT3.
  • the sensing unit SE1 is provided on the opposite side of the button BT2 among the positions on both sides of the button BT1, and the sensing unit SE7 is provided on the opposite side of the button BT2 on the both sides of the button BT3. There is. As a result, the pressure on the outer side of the both ends of the buttons BT1, BT2 and BT3 arranged in a line is detected.
  • FIG. 5B is a cross-sectional view showing the configuration of the sensor.
  • the sensor 20 includes a sensor electrode layer 30 having sensing portions SE1 to SE7, metal layers 21 and 22, a plurality of pillars of a plurality of supports 23, and an adhesive layer 24.
  • the width of the sensor 20 is preferably about 2 mm or more and about 4 mm or less, for example about 2.5 mm.
  • the thickness of the sensor 20 including the mounting structure is preferably 2 mm or less, for example 1.53 mm.
  • the metal layer 21 and the sensor electrode layer 30 are disposed such that the main surfaces of the metal layer 21 and the sensor electrode layer 30 face each other.
  • the plurality of supports 23 are provided between the main surfaces of the metal layer 21 and the sensor electrode layer 30, and the metal layer 21 is formed of the sensor electrode layer 30 so that the metal layer 21 and the sensor electrode layer 30 are separated. It supports on one main surface.
  • the plurality of supports 23 form a support layer between the main surfaces of the metal layer 21 and the sensor electrode layer 30.
  • the metal layer 22 and the sensor electrode layer 30 are disposed such that the main surfaces of the metal layer 22 and the sensor electrode layer 30 face each other.
  • the adhesive layer 24 is provided between the metal layer 22 and the sensor electrode layer 30, and bonds the metal layer 22 and the sensor electrode layer 30 to each other.
  • the sensor 20 further includes a first conductive member such as an anisotropic conductive film (ACF) connecting the first ground pad of the sensor electrode layer 30 and the metal layer 21, and a second ground of the sensor electrode layer 30.
  • a second conductive member such as an ACF connecting the pad and the metal layer 22 is provided.
  • the metal layer 21 is grounded via the first conductive member and the first ground pad, and is set to the ground potential.
  • the metal layer 22 is grounded via the second conductive member and the second ground pad, and is set to the ground potential.
  • the metal layers 21 and 22 are so-called reference electrodes and are grounded to be at the ground potential.
  • the metal layers 21 and 22 are, for example, flexible metal plates.
  • the metal layers 21 and 22 include, for example, a single element such as aluminum, titanium, zinc, nickel, magnesium, copper, iron, or an alloy containing two or more of these. Specific examples of the alloy include stainless steel (Stainless Used Steel: SUS), an aluminum alloy, a magnesium alloy, a titanium alloy and the like.
  • the plurality of supports 23 are arranged in a row at predetermined intervals in the longitudinal direction of the sensor 20 so as to support the metal layer 21 at positions corresponding to both ends of the sensing unit SE. Specifically, the support 23 is provided so as to overlap the position between the adjacent sensing units SE in the thickness direction of the sensor 20 (Z-axis direction).
  • the support 23 is made of, for example, an insulating adhesive or a double-sided adhesive tape. As an adhesive agent, an ultraviolet-ray cured resin, a thermosetting resin, etc. can be used, for example.
  • the support 23 may be elastically deformed by the pressure applied to the sensing surface 20S.
  • the adhesive layer 24 is an example of a support layer, and the sensor electrode layer 30 is a metal layer so that the metal layer 22 and the sensor electrode layer 30 are separated while bonding the metal layer 22 and the sensor electrode layer 30 together. It supports on one main surface of 22.
  • the adhesive layer 24 is made of, for example, an insulating adhesive or a double-sided adhesive tape.
  • the adhesive layer 24 may be elastically deformed by the pressure applied to the sensing surface 20S.
  • the double-sided adhesive tape there is a double-sided tape of Neo Fix, trade name, manufactured by NIHON KAKO CORPORATION.
  • pressure sensitive adhesion is defined as a type of adhesion. According to this definition, the adhesive layer is considered as a kind of adhesive layer.
  • the sensor electrode layer 30 includes a base 31 and first and second electrodes 32 and 33 provided on one main surface of the base 31.
  • the electrodes 32 and 33 constitute a sensing unit SE.
  • the sensor electrode layer 30 includes a linear ground electrode 34 provided on one main surface of the base 31 so as to surround the sensing portions SE1 to SE7.
  • the sensor electrode layer 30 is provided with an insulating layer (not shown) such as a coverlay film covering the first and second electrodes 32 and 33 and the ground electrode 34 on one main surface of the sensor electrode layer 30. May be
  • the substrate 31 is a flexible substrate or film containing a polymer resin.
  • the polymer resin include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), acrylic resin (PMMA), polyimide (PI), triacetyl cellulose (TAC), polyester, polyamide (PA), Aramid, polyethylene (PE), polyacrylate, polyethersulfone, polysulfone, polypropylene (PP), diacetylcellulose, polyvinyl chloride, epoxy resin, urea resin, urethane resin, melamine resin, cyclic olefin polymer (COP) and norbornene system It contains at least one kind of thermoplastic resin.
  • the first and second electrodes 32 and 33 have a comb-like shape, and are disposed such that the portions of the comb teeth are engaged with each other.
  • the first electrode 32 includes a plurality of linear sub-electrodes 32A.
  • the second electrode 33 includes a plurality of linear sub-electrodes 33A.
  • the plurality of sub electrodes 32A, 33A extend in the X-axis direction, and are provided alternately at predetermined intervals in the Y-axis direction. Adjacent sub-electrodes 32A, 33A are configured to be able to form capacitive coupling.
  • the adjacent sub-electrodes 32A and 33A operate as two electrodes of mutual capacitance system and can also operate as one electrode of self-capacitance system. In addition, it can be used as a capacitor for resonance of the sensing and LC resonance circuit by utilizing the electrostatic capacitance by the coupling between the adjacent sub electrodes 32A and 33A.
  • the IC 12A detects the proximity of the metal layer 21 to the sensing unit SE by a change in capacitance of the sensing unit SE, specifically, a change in capacitance between the first and second electrodes 32 and 33. Do. In the IC 12A, the proximity of the metal layer 21 to the sensing part SE is detected as a decrease in capacitance between the first and second electrodes 32 and 33.
  • the elastic body 51 is configured to be elastically deformable by the pressure applied to the side wall portion 11R.
  • the elastic body 51 being sandwiched between the back surface of the sensor 20 and the spacer 52, the dynamic range in the load sensitivity of the sensor 20 can be improved.
  • the elastic body 51 contains, for example, a dielectric such as a foamed resin or an insulating elastomer.
  • the foamed resin is a so-called sponge, and is, for example, at least one of foamed polyurethane, foamed polyethylene, foamed polyolefin, sponge rubber and the like.
  • the insulating elastomer is, for example, at least one of a silicone elastomer, an acrylic elastomer, a urethane elastomer, and a styrene elastomer.
  • the elastic body 51 may be provided on the base material which is not shown in figure.
  • the thickness of the elastic body 51 is preferably 10 ⁇ m or more and 1000 ⁇ m or less. If the thickness of the elastic body 51 is less than 10 ⁇ m, the function of the elastic body 51 may be degraded. On the other hand, when the thickness of the elastic body 51 exceeds 1000 ⁇ m, there is a possibility that the micro deformation sensitivity may be reduced.
  • FIG. 4 shows an example in which the elastic body 51 has a film shape and is provided on the entire back surface of the sensor 20, the shape of the elastic body 51 is not limited to this. It may have a predetermined shape pattern and be partially provided on the back surface of the sensor 20.
  • the shape pattern may be regular or irregular.
  • As the shape pattern for example, stripe, mesh, radial, geometric pattern, meander, concentric, spiral, spider web, tree, fish bone, ring, lattice or irregular shape etc. However, it is not limited thereto.
  • the spacer 52 is press-fitted between the elastic body 51 and the inner side surface of the groove portion 14. By press-fitting the spacer 52 in this manner, it is possible to suppress a gap generated due to a variation (a tolerance) in the dimensions of the groove portion 14 or the sensor 20 and the like.
  • One end in the width direction of the spacer 52 (one end facing the bottom of the groove portion 14) has a bowl shape in order to facilitate press-fitting.
  • the spacer 52 has a higher elastic modulus than the elastic body 51.
  • the spacer 52 is, for example, a metal plate, a resin plate, or a laminated plate obtained by laminating them.
  • Protrusions 52A and 52B are provided at both ends of the main surface of the spacer 52 on the side facing the inner side surface of the groove 14 among the main surfaces.
  • the protrusions 52A and 52B are fitted into the recesses 14A and 14B provided at both ends of the groove 14, respectively.
  • the substrate 12 is a main substrate of the electronic device 10, and a controller IC (Integrated Circuit) (hereinafter referred to simply as "IC") 12A and a main CPU (Central Processing Unit) (hereinafter referred to simply as "CPU”) 12B.
  • IC Integrated Circuit
  • CPU Central Processing Unit
  • the IC 12A is a control unit that controls the sensor 20 and detects the pressure applied to the sensing surface 20S.
  • the CPU 12 ⁇ / b> B is a control unit that controls the entire electronic device 10. For example, the CPU 12B executes various processes based on the detection signal supplied from the IC 12A.
  • the front panel 13 is provided with a display device 13A, and a capacitive touch panel is provided on the surface of the display device 13A.
  • the display device 13A displays an image (screen) based on an image signal or the like supplied from the CPU 12B. Examples of the display device 13A include, but are not limited to, a liquid crystal display and an Electro Luminescence (EL) display.
  • FIG. 7 is a block diagram showing a circuit configuration of the electronic device according to the first embodiment.
  • the electronic device 10 includes a sensor 20, a CPU 12B, an IC 12A, a GPS unit 61, a wireless communication unit 62, an audio processing unit 63, a microphone 64, a speaker 65, an NFC communication unit And a power supply unit 67, a storage unit 68, a vibrator 69, a display device 13A, a motion sensor 70, and a camera 71.
  • the GPS unit 61 is a positioning unit that receives radio waves from satellites of a system called GPS (Global Positioning System) and measures the current position.
  • the wireless communication unit 62 performs near field communication with another terminal according to, for example, the Bluetooth (registered trademark) standard.
  • the NFC communication unit 66 performs wireless communication with a nearby reader / writer according to the NFC (Near Field Communication) standard.
  • the data obtained by the GPS unit 61, the wireless communication unit 62, and the NFC communication unit 66 are supplied to the CPU 12B.
  • the microphone 64 and the speaker 65 are connected to the voice processing unit 63, and the voice processing unit 63 performs processing of a call with the other party connected by wireless communication in the wireless communication unit 62 or the like. Further, the voice processing unit 63 can also perform processing for voice input operation.
  • the power supply unit 67 supplies power to the CPU 12B, the display device 13A, and the like provided in the electronic device 10.
  • the power supply unit 67 includes a secondary battery such as a lithium ion secondary battery, and a charge / discharge control circuit that controls charging / discharging of the secondary battery.
  • the electronic device 10 includes a terminal for charging the secondary battery.
  • the storage unit 68 is a random access memory (RAM) or the like, and stores various data such as an operating system (OS), an application, a moving image, an image, music, and a document.
  • OS operating system
  • application application
  • the vibrator 69 is a member that vibrates the electronic device 10.
  • the electronic device 10 vibrates the electronic device 10 by the vibrator 69 to notify of an incoming call, an e-mail reception, and the like.
  • the display device 13A displays various screens based on the video signal and the like supplied from the CPU 12B. Further, a signal corresponding to the touch operation on the display surface of the display device 13A is supplied to the CPU 12B.
  • the motion sensor 70 detects the movement of the user holding the electronic device 10.
  • an acceleration sensor a gyro sensor, an electronic compass, an atmospheric pressure sensor or the like is used.
  • the camera 71 includes a lens group and an imaging element such as a complementary metal oxide semiconductor (CMOS), and captures an image such as a still image or a moving image based on the control of the CPU 12B.
  • CMOS complementary metal oxide semiconductor
  • the photographed still image, moving image, and the like are stored in the storage unit 68.
  • the sensor 20 is a pressure sensor with high sensitivity and high position resolution, detects a capacitance corresponding to a pressing operation on the sensing surface 20S, and outputs an output signal according to the detection to the IC 12A.
  • the IC 12A stores firmware for controlling the sensor 20, detects a change (pressure) in capacitance of each sensing unit SE of the sensor 20, and outputs a signal corresponding to the result to the CPU 12B.
  • the CPU 12B executes various processes based on the detection signal supplied from the IC 12A.
  • the CPU 12B processes data supplied from the GPS unit 61, the wireless communication unit 62, the NFC communication unit 66, the motion sensor 70, and the like.
  • At least one detection signal out of the detection signals S1 to S7 of each of the sensing units SE1 to SE7 exceeds the threshold -B as shown in FIG. 9B.
  • at least one of the detection signals S1 to S7 of the sensing units SE1 to SE7 has a threshold value -B as shown in FIG. 10B. Over.
  • detection signal S5 of sensing unit SE5 corresponding to the position between button BT2 and BT3 exceeds threshold A as shown in FIG. 11B.
  • step S11 the IC 12A sequentially scans the sensing units SE1 to SE7, acquires detection signals S1 to S7 of the sensing units SE1 to SE7, and supplies the detection signals S1 to S7 to the CPU 12B.
  • step S12 the CPU 12B determines whether at least one of the detection signals S1 to S7 supplied from the IC 12A exceeds the threshold value -B.
  • the threshold value -B is opposite in polarity to the threshold value A for determining the pressing of the buttons BT1, BT2 and BT3 at the prescribed pressing position. If it is determined in step S12 that at least one of the detection signals S1 to S7 exceeds the threshold -B (see FIGS. 9B and 10B), the CPU 12B sends the electronic device 10 to the electronic device 10 in step S13. It is determined that bending or twisting (see FIGS. 9A and 10A) is applied. Then, in step S14, the CPU 12B displays a screen (see FIG.
  • step S11 for warning the user that bending or twisting is applied to the electronic device 10 on the display device 13A, and returns the process to step S11.
  • the image data relating to the warning screen is stored in the storage unit 68, and the image data is read by the CPU 12B and displayed on the display device 13A.
  • step S12 If it is determined in step S12 that at least one of the detection signals S1 to S7 does not exceed the threshold value -B, the CPU 12B selects one of the detection signals S1 to S7 supplied from the IC 12A in step S15. It is determined whether or not at least one signal of the signal A exceeds the threshold A.
  • step S15 When it is determined in step S15 that at least one of the detection signals S1 to S7 exceeds the threshold A, the CPU 12B determines that the signal level of the detection signals exceeding the threshold A is the highest in step S16. It is determined whether the high detection signal corresponds to any one of the sensing units SE2, SE4, and SE6 (that is, the buttons BT1, BT2, and BT3). If it is determined in step S15 that at least one of the detection signals S1 to S7 does not exceed the threshold A, the CPU 12B returns the process to step S11.
  • step S16 If it is determined in step S16 that the detection signal with the highest signal level corresponds to any of the sensing units SE2, SE4, and SE6 (see FIG. 8B), the CPU 12B performs sensing in step S17.
  • the processing corresponding to the sensing unit SE (see FIG. 8A) in which the detection signal having the highest signal level is detected among the units SE2, SE4, and SE6 is executed.
  • step S16 If it is determined in step S16 that the detection signal with the highest signal level does not correspond to any of the sensing units SE2, SE4, and SE6 (see FIG. 11B), the CPU 12B determines in step S18 that It is determined that the position not pressed, specifically, the corresponding position between the buttons BT1 and BT2 or the buttons BT2 and BT3 is pressed (see FIG. 11A). Then, in step S19, the CPU 12B warns the user that the prescribed position is not pressed, specifically, between the buttons BT1 and BT2 or between the buttons BT2 and BT3 (see FIG. 13B). ) Is displayed, and the process returns to step S11.
  • the image data relating to the warning screen is stored in the storage unit 68, and the image data is read by the CPU 12B and displayed on the display device 13A.
  • the electronic device 10 includes the housing 11 and the sensor 20 provided on the inner side surface 11SB of the side wall 11R and having a plurality of sensing units SE that detect deformation of the side wall 11R.
  • the plurality of sensing units SE have sensing units SE2, SE4, SE6 for detecting a prescribed user operation, and sensing units SE1, SE3, SE5, SE7 for compensating for the malfunction of the electronic device 10. Thereby, the malfunction of the electronic device 10 can be suppressed.
  • the sensor 20 may be provided with a plurality of supports 25 having a columnar shape instead of the adhesive layer 24.
  • the plurality of supports 25 are provided between the main surfaces of the metal layer 22 and the sensor electrode layer 30, and the metal layer 22 is formed of the sensor electrode layer 30 so that the metal layer 22 and the sensor electrode layer 30 are separated. It supports on the other main surface.
  • the plurality of supports 25 form a support layer between the main surfaces of the metal layer 22 and the sensor electrode layer 30.
  • the plurality of supports 25 are provided at positions overlapping with the plurality of supports 23 in the thickness direction of the sensor 20.
  • the support 25 is made of, for example, an insulating adhesive or a double-sided adhesive tape.
  • an adhesive agent an ultraviolet-ray cured resin, a thermosetting resin, etc. can be used, for example.
  • the support 25 may be elastically deformed by the pressure applied to the sensing surface 20S.
  • the sensor 20 may be provided with an elastic layer elastically deformed by pressure applied to the sensing surface 20S instead of the plurality of supports 23.
  • the elastic layer contains, for example, a foamed resin or an insulating elastomer.
  • the foamed resin is a so-called sponge, and is, for example, at least one of foamed polyurethane, foamed polyethylene, foamed polyolefin, sponge rubber and the like.
  • the insulating elastomer is, for example, at least one of a silicone elastomer, an acrylic elastomer, a urethane elastomer, and a styrene elastomer.
  • the senor 20 may be provided with an elastic layer instead of the adhesive layer 24.
  • an elastic layer As a material of this elastic layer, the thing similar to the above-mentioned elastic layer can be illustrated.
  • the sensor 20 may be provided with a plurality of convex portions 26 on the sensing surface 20S.
  • the convex portion 26 is provided at a position corresponding to the sensing units SE2, SE4, and SE6 for detecting a user operation.
  • the convex portion 26 is provided so as to overlap the sensing portions SE2, SE4, and SE6 in the thickness direction of the sensor 20.
  • the convex portion 26 may be provided on the inner side surface 11SB of the side wall portion 11R instead of the sensing surface 20S.
  • the sensor 20 may be provided with a plurality of convex portions 27 on the back surface.
  • the convex portion 27 is provided at a position corresponding to the sensing units SE1, SE3, SE5, and SE7 for malfunction compensation. Specifically, the convex portion 27 is provided so as to overlap the sensing portions SE1, SE3, SE5, and SE7 in the thickness direction of the sensor 20.
  • the convex portion 27 may be provided on the surface of the elastic body 51 facing the back surface of the sensor 20 instead of the back surface of the sensor 20.
  • the senor 20 may not include the metal layers 21 and 22 and the plurality of supports 23 and 25.
  • the CPU 12B can determine whether the bottom portion 11M is deformed by determining whether at least one of the detection signals S1, S3, S5, and S7 exceeds the threshold C.
  • the CPU 12B determines that the bottom 11M is deformed, and the detection signals S1, S3, and S5. , And at least one signal of S7 does not exceed the threshold C, it can be determined that the bottom 11M is not deformed.
  • the CPU 12B can also determine that a twist is applied to the electronic device 10, as in the case where the bottom 11M is pressed.
  • the sensing surface 20S of the sensor 20 is pressed via the convex portion 26.
  • the CPU 12B determines whether or not there is a signal exceeding the threshold A among the detection signals S1 to S7, and which of the sensing units SE2, SE4, and SE6 is a signal exceeding the threshold A. , And pressing of the buttons BT1, BT2, and BT3 can be detected.
  • the sensor 20 may be provided with a conductive substrate instead of the metal layers 21 and 22.
  • the conductive substrate comprises a substrate and a metal layer provided on one major surface of the substrate.
  • the substrate has a plate or film shape.
  • a conductive film for example, Alpet (registered trademark) manufactured by PANAC Corporation
  • the sensor 20 may include a conductive layer other than the metal layers 21 and 22.
  • a conductive layer other than the metal layers 21 and 22 for example, a film or a substrate containing at least one of carbon powder and metal powder can be used.
  • the IC 12A may scan all the sensing parts SE1 to SE7 in one cycle of scanning, but the scan operation of the IC 12A is not limited to this. That is, as shown in FIG. 17B, the IC 12A scans all the sensing units SE2, SE4, and SE6 for detecting a user operation in one cycle of scanning, whereas the sensing unit for malfunction compensation in one cycle of scanning. Only one of SE1, SE3, SE5, and SE7 may be scanned. In this case, the sensing units SE1, SE3, SE5, and SE7 are all scanned in four scans. By adopting the scan operation as shown in FIG. 17B, the scan time required for one cycle can be shortened.
  • the electronic device 10 includes the sensor 20 on the inner side surface 11SB of the side wall portion 11R.
  • the electronic device 10 includes the sensor 20 on the inner side surfaces 11SB and 11SB of the side wall portions 11R and 11L.
  • 20 may be provided.
  • the sensor 20 may be provided on the inner side surface (inner peripheral surface) of the wall portion 11N over one round.
  • the sensor 20 may be provided on the inner side surface of the bottom portion 11M of the housing 11, or the sensor 20 may be provided on the inner side surface of the front panel 13.
  • the electronic device 10 supports the sensor 20 and the elastic body 51 such that the main surfaces thereof are parallel to the inner side surface 11SB, and the sensor 20 is internally
  • a support member 53 may be provided to press against the side surface 11SB.
  • the convex portion 26 may be provided on the sensing surface 20S of the sensor 20.
  • Holes 55A and 55B are provided in the housing 11 in the vicinity of the inner side surface 11SB of the side wall 11R so as to be separated by a predetermined distance.
  • the support member 53 has a long plate shape, and through holes 53A and 53B are provided at both ends of the support member 53 in the longitudinal direction.
  • the support member 53 is fixed to the vicinity of the inner side surface 11SB by fixing the screws 54A and 54B to the holes 55A and 55B so as to pass the through holes 53A and 53B, respectively.
  • the sensor 20A is provided between the first and second sensing unit rows 20L1 and 20L2 for malfunction compensation and the first and second sensing unit rows 20L1 and 20L2 for malfunction compensation.
  • a sensing unit row 20L3 for detecting a user operation may be provided.
  • First sensing portion array 20L1 is composed of a sensing unit 20SE 1 for ordered malfunction compensation in a line isolated for a predetermined in the X-axis direction, the second sensing part row 20L2 is given in the X-axis direction It is composed of between isolation to the sensing portion 20SE 2 for malfunction compensation ordered in a row.
  • Sensing portion row 20L3 is composed of the sensing part 20SE 3 for malfunction compensation arranged in a row to isolate for a predetermined in the X-axis direction.
  • the sensing unit 20SE 1 and the sensing portion 20SE 2 is disposed so as to face the Y-axis direction.
  • Sensing unit 20SE 3 is arranged so as not to overlap with the sensing portion 20SE 1, 20SE 2 in the Y-axis direction.
  • the sensing units 20SE 1 and 20SE 2 have a rectangular shape, and the long sides thereof are arranged to be parallel to the X axis. Meanwhile, the sensing unit 20SE 3 has a square shape or a substantially square shape, a pair of opposed sides are arranged parallel to the X axis. Area of the sensing unit 20SE 3 is greater than the area of the sensing portion 20SE 1, 20SE 2.
  • the sensor 20B may have a plurality of sensing units SE two-dimensionally arranged in a matrix.
  • the sensing units SE arranged at positions of n rows and m columns are referred to as SE (n, m).
  • SE (2,2), SE (2,4 ), SE (2,6) is a sensing unit SE A for user operation detection.
  • SE (2,2), SE (2,4 ), the sensing unit SE (n, m) other than the SE (2, 6) is a sensing unit SE B for malfunction compensation.
  • the electronic apparatus 10 On both sides of the X-axis direction of the sensing unit SE A for user operation detection, if there is a sensing unit SE B for malfunction compensation, it is possible to confirm the degree of deformation on both sides of the position of the sensing unit SE A, the electronic apparatus 10 It is possible to improve detection accuracy of twisting, bending, or pressing of an unintended position.
  • the IC 12A may be capable of detecting multi-touch on the sensor 20.
  • the IC 12A may be capable of detecting multi-touch on the sensor 20.
  • 160 sensing portions SE arranged in a matrix can be configured.
  • the proximity of the metal layer 21 can be detected by each sensing unit SE.
  • Both main surfaces of the sensor electrode layer 30 in which the X and Y electrodes are arranged in a matrix are covered with the pressure deformable metal layers 21 and 22, and the metal layers 21 and 22 are grounded, whereby the IC 12A
  • the pressure applied to the sensing surface 20S can be detected.
  • deformation of the metal layer 21 can be detected for each of the 160 sensing portions SE, not only the XY direction coordinates of a plurality of pressure points but also the pressure in the Z direction can be detected.
  • the X and Y electrodes capable of such a state comb-like electrodes and the like are preferable.
  • a part of the 160 sensing units SE is used for user operation detection, and the remaining part is used for malfunction compensation.
  • the multi-touch for example, pressing of a plurality of buttons
  • the sensor 20 having the above-described configuration can be provided on any of the inner side surfaces of the wall portion 11N and the bottom portion 11M of the housing 11, it is provided on the inner side surface of the bottom portion 11M from the viewpoint of arrangement space. Is preferred.
  • Sensing unit pair SP1 is constituted by the sensing unit SE A for two user operation detection of the predetermined between isolated rectangular, the long sides of the sensing unit SE A is arranged parallel to the Y axis ing.
  • Sensing unit pair SP2 is configured by a sensing unit SE B for two malfunctions compensation of predetermined between isolated rectangular, the long sides of the sensing unit SE B is disposed parallel to the X axis There is.
  • the outside surface 11SA of the side wall portion 11R has been described as an example having a configuration in which the buttons BT1, BT2, and BT3 are located at predetermined pressing positions (that is, positions corresponding to the sensing portions SE2, SE4, and SE6).
  • the configuration for enabling the user to grasp the prescribed pressing position in a tactile manner is not limited to this.
  • the protrusion may be provided at a prescribed pressing position.
  • the surface roughness of the prescribed pressing position and its peripheral portion may be changed.
  • one of the prescribed pressing position and its peripheral portion may be a rough surface, and the other may be a smooth surface.
  • the sensational temperature of the prescribed pressing position and its peripheral portion may be changed.
  • one of the prescribed pressing position and its peripheral portion may be made of metal, and the other may be made of polymer resin.
  • a symbol, a character, a mark, a pattern and a color may be printed on the outer surface 11SA.
  • at least one of a symbol, a character, a mark, and a pattern may be imprinted on the outer side surface 11SA.
  • a symbol of “+” or “ ⁇ ” may be printed or marked on the pressing portion.
  • the sensor 120 may further include an electrode unit for temperature detection for detecting a temperature by a capacitance change.
  • the IC 12A may detect the temperature based on the capacitance change of the temperature detection electrode unit, and may correct the threshold based on the detected temperature.
  • the electrode unit for temperature detection an electrode unit having the same configuration as that of the sensing units SE1 to SE7 may be used.
  • the substrate 12 may further include a temperature detection unit.
  • the IC 13A may detect the temperature by the temperature detection unit and correct the threshold based on the detected temperature.
  • the sensor 20, the elastic body 51, and the spacer 52 may be divided into a plurality in the longitudinal direction of the groove portion 14. Thereby, the measurement error of sensor 20 by the torsional distortion added to case 11 can be controlled.
  • a plurality of groove portions 14 may be provided, and the sensor 20, the elastic body 51, and the spacer 52 may be accommodated in each of the groove portions 14.
  • the sensing parts SE to SE7 of the sensor electrode layer 30 may be spiral coil wiring.
  • the spiral coil wiring of the sensing parts SE to SE7 detects the deformation of the metal layers 121 and 122 not by an electric field but by a change of a magnetic field.
  • the CPU 12B may switch the operation and non-operation of the sensor 20 as follows. That is, based on the detection signal supplied from the touch panel of the display device 13A, the CPU 12B determines whether the detection signal exceeds the threshold in a range equal to or more than the specified area of the display surface of the display device 13A. When it is determined that the detection signal exceeds the threshold value in the range equal to or more than the prescribed area, the CPU 12B prevents the sensor 20 provided in the side wall 11R from operating. On the other hand, when it is determined that the detection signal does not exceed the threshold in the range equal to or larger than the prescribed area, the CPU 12B operates the sensor 20 provided in the side wall 11R. By switching the operation and non-operation of the sensor 20 in this manner, malfunction of the electronic device 10 can be further suppressed.
  • the CPU 12B may perform authentication such as person identification based on a pressure distribution (capacitance distribution) pattern supplied from the IC 12A.
  • the CPU 12B enables the electronic device 10 to be usable when authentication such as person identification is obtained, whereas the CPU 12B sets the electronic device 10 when authentication such as person identification can not be acquired. It may not be available.
  • sensor 20 may be a self-capacitance method.
  • FIG. 21 shows the configuration of a self-capacitance sensor electrode layer 30A.
  • the sensor electrode layer 30A includes a base 31 and a plurality of thin film electrodes 35 provided on one main surface of the base 31, and the electrodes 35 constitute a sensing unit SE.
  • the electrode 35 has a shape in which rectangular corners are cut off in a straight line.
  • the cutting angle ⁇ is, for example, 45 degrees.
  • the shape of the electrode 35 is not limited to this, and it may be a shape in which corner portions of a rectangle have an R shape, a polygonal shape such as a rectangular shape, a circular shape, an elliptical shape, or an irregular shape.
  • the sensor electrode layer 30A also includes a plurality of wires 35A that electrically connect the electrodes 45 to the connector 42.
  • the wiring 35A is necessary for the number of sensing portions SE to be individually detected, that is, the number of electrodes (detection electrodes) 35 for detecting a capacitance change.
  • the wiring 35A drawn at a right angle to the side of the electrode 35 may be bent at a right angle to change the direction, but as shown in FIG. It is preferable that it is changed. This is because changes in the width of the wiring 35A can be suppressed, and the generation of noise can be suppressed. In addition, also in portions other than the above, it is preferable that the direction is not changed by bending the wiring 35A at right angles, but the direction is changed by being bent twice at an angle of 45 degrees.
  • the IC 12A detects the proximity of the metal layer 21 by the change in capacitance from each electrode 35.
  • the sensor 20 can also be regarded as one type of capacitor whose shape changes with pressure.
  • the proximity of the metal layer (ground electrode) 21 to the electrode (detection electrode) 35 is detected as an increase in the capacitance of the electrode 35.
  • the amount of change in capacitance of the sensor 20 with respect to the pressure on the sensing surface 20S can be easily adjusted based on the distance between the metal layer 21 as the ground electrode and the electrode 35 as the detection electrode and the dielectric constant, the area of the electrode 35, etc. Can.
  • the present disclosure is not limited to electronic devices, and is applicable to various devices other than electronic devices.
  • the present invention can be applied to electric devices such as a power tool, a refrigerator, an air conditioner, a water heater, a microwave oven, a dishwasher, a washing machine, a dryer, a lighting device, and a toy.
  • a building including a house, a building member, a vehicle, furniture such as a table or a desk, a manufacturing apparatus, an analysis device, and the like.
  • a construction member a bed stone, a wall material, a floor tile, a floor board etc. are mentioned, for example.
  • the vehicle includes, for example, a vehicle (for example, a car, a motorcycle, etc.), a ship, a submarine, a rail car, an aircraft, a spacecraft, an elevator, a playground equipment, and the like.
  • FIG. 22 shows a configuration of the electronic device 110 according to the second embodiment of the present disclosure.
  • the electronic device 110 according to the second embodiment displays the information 13G corresponding to the operation button at a position along the side of the side wall 11R in the screen 13B instead of providing the operation button on the side wall 11R.
  • FIG. 23 shows an arrangement example of the sensing unit SE of the sensor 120.
  • the sensor 120 has a plurality of sensing units SE two-dimensionally arranged in a matrix.
  • the sensing units SE arranged at positions of n rows and m columns are referred to as SE (n, m).
  • the CPU 12B maps each operation of the activated application to the plurality of sensing units SE. Specifically, to set the part of the plurality of the sensing unit SE to the sensing unit SE A for application operations, set the sensing unit SE B for malfunction compensating the remainder of the sensing unit. The position of the sensing unit SE A for application operation is different for each launched application.
  • the settings for the screen display and the sensing unit SE when using the camera application, the music application, and the map application will be described.
  • the application is not limited to this, and the present disclosure can be applied to various applications such as a game application and a moving image or still image editing application.
  • FIG. 24A shows a screen when using a camera application.
  • FIG. 24B shows mapping settings of the sensing unit SE when using a camera application.
  • CPU12B when the camera application is started, sets some of the plurality of the sensing unit SE, zoom-out operation detecting, for zoom operation detection, the sensing unit SE A for detecting shutter operation, malfunction and the remaining set the sensing unit SE B for compensation.
  • SE (2,2), SE ( 2,4) setting, SE (2,10) respectively, the zoom-out operation detecting, for zoom operation detection, the sensing unit SE A for detecting shutter operation and, SE (2,2), SE ( 2,4), to set the sensing unit SE B of SE (2,10) other than the SE (n, m) malfunction compensation.
  • the CPU 12B displays information 13G corresponding to the zoom-out operation at a position corresponding to the SE (2, 2) for zoom-out operation detection among the positions on the side wall 11R side in the screen 13B.
  • the CPU 12B displays the information 13G corresponding to the zoom-in operation at the position corresponding to the SE (2, 4) for the zoom-in operation detection among the positions on the side wall 11R side in the screen 13B.
  • the CPU 12B displays information 13G corresponding to the shutter operation at a position corresponding to the SE (2, 10) for detecting the shutter operation among the positions on the side wall 11R side in the screen 13B.
  • the data related to the information 13G corresponding to each of the zoom out operation, the zoom in operation and the shutter operation is stored in the storage unit 68, and the CPU 12B stores the data related to the information 13G as the camera application is activated. It reads from 68 and displays on screen 13B.
  • FIG. 25A shows a screen when using a music application.
  • FIG. 25B shows the mapping setting of the sensing unit SE when using a music application.
  • the CPU 12B detects part of the plurality of sensing units SE for fast forward playback operation detection, pause operation detection, fast reverse playback operation detection, volume up operation detection, volume down set the sensing unit SE a for operation detection, set the sensing unit SE B for malfunction compensating the rest.
  • SE (2, 1), SE (2, 3), SE (2, 5), SE (2, 9), SE (2, 11) are each for fast forward reproduction operation detection, and paused manipulation detection, set rewind playback operation detection, volume up operation detection, the sensing unit SE a for volume down operation detection, SE (2,1), SE ( 2,3), SE (2,5 ), SE (2,9), to set the sensing unit SE B for malfunction compensate for SE (2, 11) other than the SE (n, m).
  • the CPU 12B displays information 13G corresponding to the fast-forwarding reproduction operation at a position corresponding to SE (2, 1) for detecting the fast-forwarding operation among the positions on the side wall 11R side in the screen 13B.
  • the CPU 12B displays information 13G corresponding to the temporary stop operation at the position corresponding to the SE (2, 3) for temporary stop operation detection among the positions on the side wall 11R side in the screen 13B.
  • the CPU 12B displays the information 13G corresponding to the fast reverse reproduction operation at the position corresponding to the SE (2, 5) for fast reverse reproduction detection among the positions on the side wall 11R side in the screen 13B.
  • the CPU 12B displays the information 13G corresponding to the volume-up operation at the position corresponding to the SE (2, 9) for detecting the volume-up operation among the positions on the side wall 11R side in the screen 13B.
  • the CPU 12B displays the information 13G corresponding to the volume down operation at the position corresponding to the SE (2, 11) for detecting the volume down operation among the positions on the side wall 11R side in the screen 13B.
  • the data related to the information 13G corresponding to each of the fast forward play operation, the pause operation, the fast reverse play operation, the volume up operation, and the volume down operation is stored in the storage unit 68, and the CPU 12B is executed along with the activation of the music application.
  • the data related to the information 13G is read from the storage unit 68 and displayed on the screen 13B.
  • FIG. 26A shows a screen when using a map application.
  • FIG. 26B shows the mapping setting of the sensing unit SE when using the map application.
  • CPU12B when the map application is launched, to set some of the plurality of the sensing unit SE, detection zoom-out operation, a zoom operation detection, the sensing unit SE A for detecting vertical and horizontal scroll operation, the remaining setting the sensing unit SE B for malfunction compensation.
  • zoom is performed on SE (2, 1), SE (2, 3), SE (2, 7), SE (2, 11), SE (1, 9), SE (3, 9) respectively.
  • the CPU 12B displays information 13G corresponding to the zoom-out operation at a position corresponding to the zoom-out operation detection SE (2, 1) among the positions on the side wall 11R side in the screen 13B.
  • the CPU 12B displays the information 13G corresponding to the zoom-in operation at the position corresponding to the SE (2, 3) for zoom-in operation detection among the positions on the side wall 11R side in the screen 13B.
  • the CPU 12B performs the upper scroll operation at the positions corresponding to the upper scroll operation, SE (2, 7) for detecting the lower scroll operation, and SE (2, 11).
  • Information 13G corresponding to the downward scroll operation is displayed.
  • the CPU 12B performs right scroll operation at positions corresponding to SE (1, 9) and SE (3, 9) for right scroll operation and left scroll operation detection among positions on the side wall 11R side in the screen 13B.
  • Information 13G corresponding to the left scroll operation is displayed.
  • the data related to the information 13G corresponding to the zoom-out operation, the zoom-in operation, and the up, down, left, and right scroll operations are stored in the storage unit 68, and the CPU 12B carries out the data related to the information 13G as the map application is activated. It is read from the storage unit 68 and displayed on the screen 13B.
  • step S22 the CPU 12B determines whether the camera application activation operation is performed.
  • step S23 the CPU 12B performs each operation (zoom-out operation, zoom-in operation, shutter operation) of the camera application to the plurality of sensing units SE. Are set (see FIG. 24B).
  • step S24 the CPU 12B displays a screen for camera application on the display device 13A (see FIG. 24A).
  • step S25 the CPU 12B performs operation detection corresponding to the mapping setting in step S23. Specifically, zoom out operation detection, zoom in operation detection, and shutter operation detection are performed on SE (2, 2), SE (2, 4), and SE (2, 10), respectively, and SE (2, 2) , SE (2, 4), SE (2, 10) The zoom out operation, the zoom-in operation and the shutter operation are compensated for in the sensing unit SE other than SE (2, 4).
  • step S26 the CPU 12B determines whether the start operation of the music application has been performed.
  • step S27 the CPU 12B performs each operation of the music application with respect to the plurality of sensing units SE (fast forward reproduction operation, pause operation, fast return Mapping setting is made for playback operation, volume up operation, volume down operation) (see FIG. 25B).
  • step S28 the CPU 12B displays a music application screen on the display device 13A (see FIG. 25A).
  • step S29 the CPU 12B performs operation detection according to the mapping setting in step S27. Specifically, for each of SE (2, 1), SE (2, 3), SE (2, 5), SE (2, 9), SE (2, 11), fast forward playback operation, pause operation, Fast reverse playback operation, volume up operation, volume down operation is detected, SE (2, 1), SE (2, 3), SE (2, 5), SE (2, 9), SE (2, 11)
  • the sensing unit SE other than the above, compensation is made for malfunctions of fast-forward playback operation, pause operation, fast-return playback operation, volume-up operation and volume-down operation.
  • step S30 the CPU 12B determines whether the start operation of the map application is performed.
  • step S31 the CPU 12B performs each operation (zoom out operation, zoom in operation, upper scroll operation) of the map application to a plurality of sensing units SE. , Down scroll operation, right scroll operation, left scroll operation) are set (see FIG. 26B).
  • step S32 the CPU 12B displays a map application screen on the display device 13A (see FIG. 26A).
  • step S33 the CPU 12B performs operation detection according to the mapping setting in step S31. Specifically, zoom is performed on SE (2, 1), SE (2, 3), SE (2, 7), SE (2, 11), SE (1, 9), SE (3, 9) respectively.
  • zoom out operation zoom in operation, up scroll operation, down scroll operation, right scroll operation, left scroll operation is performed, SE (2, 1), SE (2, 3), SE (2, 7), SE (2) , 11), SE (1, 9), SE (3, 9)
  • zoom out operation zoom in operation, up scroll operation, down scroll operation, down scroll operation, right scroll operation and compensation of malfunction of left scroll operation Do.
  • step S34 the CPU 12B performs standard mapping setting for the plurality of sensing units SE.
  • step S35 the CPU 12B displays a standard screen on the display device 13A.
  • step S36 the CPU 12B performs operation detection according to the mapping setting in step S34.
  • the standard mapping setting refers to a default mapping setting that is set when none of the camera application, the music application, the map application and the like is selected.
  • the standard screen refers to a default screen set when none of the camera application, the music application, the map application, etc. is selected.
  • the operation unit corresponding to various applications can be set in the side wall 11R. Therefore, various applications can be operated by pressing the side wall 11R.
  • the electronic device 210 according to the third embodiment is the first in that a rectangular film-shaped sensor 220 curved in a substantially U shape is provided inside the side wall portion 11R, as shown in FIG. It differs from the electronic device 110 according to the embodiment.
  • the curved sensor 220 may be pressed against the inner side surface of the side wall portion 11R, the bottom portion 11M, and the front panel 13 by a support member (not shown), or may be bonded by an adhesive or the like.
  • FIG. 29A shows the configuration of the sensor 220.
  • FIG. 29B shows the sensor 220 in a flat state.
  • the sensor 220 has sensing units SE1 to SE11.
  • the sensor 220 includes a first region R1 disposed on the inner side surface of the side wall 11R, a second region R2 disposed on the inner side surface of the bottom portion 11M, and a third region R3 disposed on the inner side surface of the front panel 13. Have.
  • the sensing units SE3, SE6, and SE9 are provided in the first region R1 and detect a press on the side wall 11R. More specifically, the sensing units SE3, SE6, SE9 are provided corresponding to the buttons BT1, BT2, BT3, respectively, and detect the pressing of the buttons BT1, BT2, BT3.
  • the sensing portions SE3, SE6, SE9 are arranged at equal intervals in the longitudinal direction of the side wall portion 11R.
  • the sensing portions SE3, SE6, and SE9 have a diamond shape, and are disposed such that the extension direction of one of the diagonals of SE3, SE6, and SE9 matches the longitudinal direction of the side wall portion 11R. Thus, the distance between the adjacent sensing units SE3, SE6, and SE9 can be reduced.
  • the sensing units SE1, SE4, SE7, and SE10 are provided to cross the boundary between the first and second regions R1 and R2.
  • the sensing units SE1, SE4, SE7, and SE10 are provided so as to straddle the boundary, so that the pressure of the housing 11 can be detected over a wide range, and the first and second regions R1 and R2 are provided. It is possible to detect the pressure of the boundary (i.e. the corner of the housing 11).
  • the sensing portions SE1, SE4, SE7, and SE10 are arranged in stripes at regular intervals orthogonal to the side wall portion 11R, one end of the sensing portions SE1, SE4, SE7, and SE10 has a V shape, and the first region R1 is formed. It is extended to the end.
  • the sensing units SE2, SE5, SE8, and SE11 are provided to cross the boundary between the first and third regions R1 and R3.
  • the sensing units SE2, SE5, SE8, and SE11 are provided so as to straddle the boundary, so that the pressing of the housing 11 can be detected over a wide range, and the first and third regions R1 and R3 are provided. It is possible to detect the pressure of the boundary (i.e. the corner of the housing 11).
  • the sensing portions SE2, SE5, SE8, SE11 are arranged in stripes at regular intervals orthogonal to the side wall portion 11R, one end of the sensing portions SE2, SE5, SE8, SE11 has a V shape, and the first region R1 It is extended to the end.
  • each of the sensing units SE1, SE4, SE7, and SE10 is provided to face one end of each of the sensing units SE2, SE5, SE8, and SE11 in the first region R1.
  • a sensing unit SE3 is provided in a region surrounded by one end of the adjacent sensing units SE1 and SE4 and one end of the adjacent sensing units SE2 and SE5.
  • a sensing unit SE6 is provided in a region surrounded by one end of the adjacent sensing units SE4 and SE7 and one end of the adjacent sensing units SE5 and SE8.
  • a sensing unit SE9 is provided in a region surrounded by one end of the adjacent sensing units SE7 and SE10 and one end of the adjacent sensing units SE8 and SE11.
  • the sensing units SE3, SE6, and SE9 are sensing units for user operation detection for detecting pressing of the buttons BT1, BT2, and BT3, respectively.
  • the sensing units SE1, SE2, SE4, SE5, SE7, SE8, SE10, and SE11 are sensing units for malfunction compensation.
  • the senor 220 includes a mutual capacitive type sensor electrode layer 230 having sensing portions SE1 to SE11, metal layers 221 and 222, an elastic layer 223, and an adhesive layer 224.
  • the elastic layer 223 is provided between the main surfaces of the metal layer 221 and the sensor electrode layer 230, and is elastically deformed by the pressure applied to the sensing surface 220S.
  • the elastic layer 223 contains a dielectric such as a foamed resin or an insulating elastomer.
  • the foamed resin is a so-called sponge, and is, for example, at least one of foamed polyurethane, foamed polyethylene, foamed polyolefin, sponge rubber and the like.
  • the insulating elastomer is, for example, at least one of a silicone elastomer, an acrylic elastomer, a urethane elastomer, and a styrene elastomer.
  • the elastic layer 223 may be provided on a base (not shown).
  • FIG. 31A shows the configuration of the sensor electrode layer 230 of the mutual capacitance system.
  • the sensor electrode layer 230 includes a base material 231 and first and second electrodes 232 and 233 provided on one of the main surfaces of the base material 231.
  • the sensing unit includes the first and second electrodes 232 and 233. SE1 to SE11 are configured.
  • the first and second electrodes 232 and 233 have a comb-like shape, and are disposed such that the portions of the comb teeth are engaged with each other.
  • the first electrode 232 includes a plurality of linear sub-electrodes 232A.
  • the second electrode 233 includes a plurality of linear sub-electrodes 233A.
  • the plurality of sub-electrodes 232A and 233A are extended in parallel with one set of opposing sides of the sensor 220. Note that, as shown in FIG. 31B, the plurality of sub electrodes 232A and 233A may be extended to be oblique to a pair of opposing sides of the sensor 220.
  • FIG. 32A shows an example of the pressed position of the sensor 220.
  • Figure 32B illustrates a detection signal of the sensing unit SE1 ⁇ SE11 when the position P A shown in FIG. 32A is pressed.
  • Figure 32C illustrates a detection signal of the sensing unit SE1 ⁇ SE11 when the position P B shown in FIG. 32A is pressed. If the position P A shown is pressed in FIG. 32A, the sensing unit SE2, SE3, SE5, SE8, SE11 detection signal is high. If the position P B shown is pressed in FIG. 32A, the sensing unit SE5, SE8, SE9, SE10, SE11 detection signal is high. However, the polarity of the detection signal of the sensing unit SE10 is opposite to that of the sensing units SE5, SE8, SE9, SE10, and SE11.
  • the metal layers 221 and 222 and the adhesive layer 224 are the same as the metal layers 21 and 22 and the adhesive layer 24 in the first embodiment, respectively, except for the shape.
  • the detection signals S1, S2,..., S11 are simplified and described as S1, S2,.
  • the detection signals S1, S2,..., S11 mean the detection signals of the sensing units SE1, SE2,.
  • step S41 the IC 12A sequentially scans the sensing units SE1 to SE11, acquires detection signals S1 to S11 of the sensing units SE1 to SE11, and supplies the detection signals S1 to S11 to the CPU 12B.
  • step S42 the CPU 12B determines whether or not at least one of the detection signals S3, S6, and S9 supplied from the IC 12A exceeds the threshold A. If it is determined in step S42 that at least one of the detection signals S3, S6, and S9 does not exceed the threshold A, the CPU 12B returns the process to step S41.
  • step S42 If it is determined in step S42 that at least one of the detection signals S3, S6, and S9 exceeds the threshold A, the CPU 12B detects any signal other than the detection signals S3, S6, and S9 in step S43. It is determined whether or not at least one of the signals S1, S2, S4, S5, S7, S8, S10, and S11 exceeds the threshold B.
  • step S43 If it is determined in step S43 that at least one of the detection signals S1, S2, S4, S5, S7, S8, S10, and S11 exceeds the threshold B, the CPU 12B determines in step S44 that It is determined that the electronic device 10 is bent or twisted. Then, in step S45, the CPU 12B displays a screen (see FIG. 13A) for warning the user that bending or twisting has been applied to the electronic device 10, and returns the process to step S41.
  • step S43 If it is determined in step S43 that at least one of the detection signals S1, S2, S4, S5, S7, S8, S10 and S11 does not exceed the threshold B, the CPU 12B determines in step S46 that It is determined whether or not at least one of the detection signals S1, S2, S4, S5, S7, S8, S10, and S11 exceeds the threshold -C.
  • step S46 If it is determined in step S46 that at least one of the detection signals S1, S2, S4, S5, S7, S8, S10, and S11 exceeds the threshold -C, the CPU 12B proceeds to step S44. After the processing of 45 is performed, the processing returns to step S41. If it is determined in step S46 that at least one of the detection signals S1, S2, S4, S5, S7, S8, S10, and S11 does not exceed the threshold -C, the CPU 12B detects the detection signal S3. The processing corresponding to the sensing unit SE in which the signal with the highest signal level is detected among S6 and S9 is executed, and the processing is returned to step S41.
  • the electronic device 210 includes a sensing unit SE for user operation detection disposed on the inner side surface 11SB of the side wall 11R, and a sensing unit SE for malfunction correction disposed on the inner side surface of the bottom portion 11M. And a sensing unit SE disposed on the inner side surface of the front panel 13 for malfunction compensation. Thereby, the malfunction of the electronic device 210 can be suppressed.
  • FIG. 34 is a plan view showing the configuration of a self-capacitance sensor electrode layer 230A.
  • the sensor electrode layer 230A includes a base material 231 and a plurality of electrodes 234 and 235 provided on one main surface of the base material 231, and these electrodes 234 and 235 constitute sensing parts SE1 to SE11. .
  • Each of the sensing units SE1 to SE11 is a thin film electrode.
  • the sensing portions SE3, SE6, and SE9 are each constituted of an electrode 234 having a thin film shape of a rhombus.
  • the shape of the electrode 234 is not limited to the rhombus, and may be a circle, an ellipse, a polygon other than the rhombus, or an irregular shape.
  • the sensing sections SE1, SE2, SE4, SE5, SE7, SE8, SE10, and SE11 are each formed of an electrode 235 having a pentagonal thin film shape in which one short side of a rectangle is sharpened in a V shape.
  • the electrode 235 is not limited to the above shape, and may be an oval, a polygon other than a pentagon (for example, a rectangle), an irregular shape, or the like.
  • the wiring 234A is drawn out from the sensing units SE3, SE6, SE9, and is electrically connected to the connector 42. Further, the wiring 235A is drawn out from the sensing units SE1, SE2, SE4, SE5, SE7, SE8, SE10, and SE11, and is electrically connected to the connector 42.
  • the sensor 220 may be replaced with the elastic layer 223, and may be provided with a plurality of supports having a columnar shape.
  • the support is provided, for example, between adjacent sensing units SE.
  • the sensor 220 may be curved in a substantially L shape. In this case, the sensor 220 has a first region R1 and one of the second region R2 and the third region R3.
  • FIG. 35A shows an internal configuration of the electronic device 310 according to the fourth embodiment of the present disclosure.
  • the electronic device 310 is a so-called smart phone, and includes a housing 311, a sensor module 320, a substrate 312, and the like.
  • the same parts as those in the first embodiment are indicated by the same reference numerals and the description will be omitted as appropriate.
  • the housing 311 has side wall portions 311L and 311R, and one long side wall portion 311L is provided with a long slit portion 311A.
  • the slit portion 311A is provided such that the width direction (short side direction) of the slit portion 311A is the height direction of the side wall portion 311L, and the longitudinal direction of the slit portion 311A is the length direction of the side wall portion 311L.
  • buttons are provided on the outer side surface 311SA of the side wall 311L so as to be aligned in the longitudinal direction of the side wall 311L. These three buttons correspond to the buttons BT1, BT2 and BT3 (see FIG. 1) in the first embodiment.
  • a sloped area 311AR is provided adjacent to the slit portion 311A, and a waterproof tape (not shown) is provided in the area 311AR.
  • FIG. 36 is a perspective view showing the appearance of the sensor module 320. As shown in FIG.
  • the sensor module 320 includes a long sensor portion 321 and a connection portion 41 extended from one long side of the sensor portion 321. A connector (not shown) of the connection portion 41 is connected to a connector (not shown) provided on the substrate 312.
  • FIG. 35B is a cross-sectional view along the line XXXVB-XXXVB in FIG. 35A.
  • the sensor unit 321 includes the sensor 20, an elastic body 51 provided on the back surface of the sensor 20, and a holder 321A that supports the elastic body 51.
  • the sensor 20 and the elastic body 51 are bonded by an adhesive layer (not shown), and the elastic body 51 and the holder 321A are bonded by an adhesive layer (not shown).
  • the sensor 20 and the connection unit 41 are integrally configured by one T-shaped FPC 40.
  • Sensor 321 has a sensing surface for detecting a pressing (first surface) 321S 1, it and the 2 opposite the back surface (second surface) 321S is.
  • Sensor unit 321 is press-fitted into the slit portion 311A sensing surface 321S 1 thereof faces the direction of the outer surface 311SA of the side wall portion 311L.
  • the slit portion 311A is an example of a housing portion for housing the sensor portion 321 in the side wall portion 311L.
  • the elastic body 51 is configured to be elastically deformable by pressing the sensor portion 321 in the thickness direction, and is compressed when the sensor portion 321 is pressed into the slit portion 311A.
  • Holder 321A is configured to support the elastic member 51 at the rear surface 321S 2 side, in order to increase the rigidity of the back surface 321S 2. Since the sensor unit 321 includes the holder 321A having such a function, the sensor unit 321 can be easily press-fit into the slit unit 311A.
  • Holder 321A has a rectangular elongated, elastic body 51 and the main surface portion 321A 1 which is bonded, the wall portion 321A 2 provided on each side of the main surface portion 321A 1 so as to surround the periphery of the elastic body 51 And.
  • a lightweight and highly rigid material such as metal, polymer resin, ceramics or wood can be used. In addition, you may laminate
  • a metal the material similar to the metal layers 21 and 22 can be illustrated. However, metals having low conductivity other than those exemplified as the material of the metal layers 21 and 22 may be used.
  • polymer resin the material similar to the base material 31 can be illustrated.
  • the ceramics for example, porous alumina ceramics or zirconia can be used.
  • the substrate 312 includes an IC (not shown) that controls the sensor 20 and detects the pressure applied to the sensing surface 20S of the sensor 20.
  • the substrate 312 is connected to a main substrate (not shown) including a CPU that controls the entire electronic device 310.
  • the IC and the CPU are respectively similar to the IC 12A and the CPU 12B in the first embodiment.
  • the sensor unit 321 includes the sensor 20, an elastic body 51 provided on the back surface side of the sensor 20, and a holder 321A that supports the elastic body 51.
  • the sensor portion 321 of the sensor module 320 can be press-fit into the slit portion 311A. Therefore, dimensional tolerances of the slit portion 311A and the sensor portion 321 can be absorbed.
  • the sensor module 320 can be attached to the side wall portion 311L only by press-fitting the sensor portion 321 of the sensor module 320 into the slit portion 311A. Therefore, attachment of the sensor module 320 is easy, and productivity can be improved.
  • FIG. 37 shows an internal configuration of the electronic device 410 according to the fifth embodiment of the present disclosure.
  • the electronic device 410 includes a housing 411, a sensor module 420, a reinforcing material (brace) 430, and the like.
  • the same parts as those in the first embodiment are indicated by the same reference numerals and the explanation will be appropriately omitted.
  • the housing 411 has a side wall 411L, and a long groove 412 extending along the side wall 411L is provided inside the side wall 411L.
  • a hole 413A and a protrusion 414A are provided on the outside of one end of the groove 412, and a hole 413B and a protrusion 414B are provided on the outside of the other end.
  • buttons are provided on the outer side surface 411SA of the side wall 411L so as to be aligned in the longitudinal direction of the side wall 411L. These three buttons correspond to the buttons BT1, BT2 and BT3 (see FIG. 1) in the first embodiment.
  • the sensor module 420 includes a long sensor portion 421 and a connection portion 41 extended from one long side of the sensor portion 421.
  • a connector (not shown) of the connection portion 41 is connected to a connector provided on a substrate (not shown).
  • FIG. 38 shows the configuration in the vicinity of the side wall 411L.
  • the sensor unit 421 includes the sensor 20, an elastic body (cushion layer) 51 provided on the back surface of the sensor 20, and a support (backer) 421A that supports the elastic body 51.
  • the sensor 20 and the elastic body 51 are bonded by an adhesive layer (not shown), and the elastic body 51 and the support body 421A are bonded by an adhesive layer (not shown).
  • Sensor unit 421 includes a sensing surface for detecting a pressing (first surface) 421S 1, it and the 2 opposite the back surface (second surface) 421S is. Sensor unit 421, the sensing surface 421S 1 is fitted into the groove 412 so as to face the inner surface 411SB of the side wall portion 411L.
  • Support 421A is configured to support the elastic member 51 at the rear surface 421S 2 side, in order to increase the rigidity of the back surface 421S 2.
  • the sensor unit 421 includes the support 421A having such a function, the sensor unit 421 can be fitted to the groove portion 412.
  • the surface constituting the rear surface 421S 2 of the support 421A has a plurality of projections 421B are provided, these projections 421B are pushed into the inside of the side wall of the groove 412. Thus, it is possible to state that the sensing surface 421S 1 is pressed against the inner surface 411SB of the side wall portion 411L.
  • the same material as the material of the holder 321A can be exemplified.
  • the reinforcing material 430 covers the top and the back of the sensor portion 421 fitted in the groove 412. By covering the sensor portion 421 with the reinforcing member 430 in this manner, it is possible to suppress the sensor portion 421 from malfunctioning due to contact with the other component members accommodated in the electronic device 410.
  • the reinforcing member 430 has an elongated shape, and both ends of the reinforcing member 430 are fixed by screws 433A and 433B and protrusions 414A and 414B. Specifically, through holes 431A, 431B and through holes 432A, 432B are provided at both ends in the longitudinal direction of the reinforcing material 430.
  • Screws 433A and 433B are respectively inserted into the through holes 431A and 431B and screwed into the holes 413A and 413B.
  • the protrusions 414A and 414B are inserted into the through holes 432A and 432B, respectively.
  • the protrusions 414 A, 414 B and the through holes 432 A, 432 B also have a function as a member for guiding the reinforcing member 430 to a prescribed position on the sensor portion 421 when the sensor module 420 is attached.
  • the boundary between the reinforcing member 430 and the upper portion of the side wall 411L is a flat slope, and a waterproof tape (not shown) is provided in an area 411AR including the boundary.
  • FIG. 39A as shown in FIG. 39B, the sensing surface 421S 1 of the sensor portion 421 is pressed against the inner surface 411SB of the side wall portions 411L, while the sensor unit 421 from the rear surface 421S 2 side compresses the pressed elastic member 51
  • the sensor portion 421 is fitted to the groove portion 412 by pushing the plurality of protrusions 421 B into the inside of the side wall of the groove portion 412.
  • the through holes 432A and 432B of the reinforcing material 430 are inserted into the protrusions 414A and 414B, respectively, and the reinforcing material 430 is disposed at a prescribed position on the sensor unit 421.
  • the screws 433A, 433B are inserted into the through holes 431A, 431B of the reinforcing member 430, and screwed into the holes 413A, 413B.
  • the reinforcing material 430 is fixed at a prescribed position on the sensor unit 421.
  • the sensor unit 421 includes the sensor 20, an elastic body 51 provided on the back surface side of the sensor 20, and a support 421A that supports the elastic body 51.
  • the elastic body 51 can be compressed to fit the sensor portion 421 into the groove portion 412. Therefore, dimensional tolerances of the groove portion 412 and the sensor portion 421 can be absorbed.
  • the sensor module 420 can be attached to a prescribed position inside the side wall part 411L. Therefore, attachment of the sensor module 420 is easy, and productivity can be improved.
  • FIG. 41A shows a configuration of an electronic device 510 according to the sixth embodiment of the present disclosure.
  • FIG. 41B shows a state in which the sensor 520 shown in FIG. 41A is expanded.
  • the electronic device 510 includes a sensor 520 based on the FPC 521.
  • the sensor 520 includes an FPC 521, a plurality of supports 522, and a plurality of supports 23.
  • the same parts as those in the first embodiment are indicated by the same reference numerals and the description will be omitted as appropriate.
  • FIG. 42 shows the structure of the FPC 521.
  • the FPC 521 includes an elongated sensor portion 521A and a connection portion 521B extended from one long side of the sensor portion 521A. At the tip of the connection portion 521B, a connector 521C for connecting the sensor 520 to the substrate is provided.
  • REF area Reference electrode area
  • Sensor portion of FPC521 521A faces and the REF areas 521A 1 and the sensor electrode area 521A 5, and the REF areas 521A 3 and the sensor electrode area 521A 5 are folded to face.
  • REF area 521A 1 and a plurality of supports 522 between the sensor electrode area 521A 5 is provided, REF area 521A 3 and the sensor electrode area 521A 5 C plurality of supports 23 between is provided.
  • Folding area 521A 2 is an area for folding the FPC521 between REF areas 521A 1 and REF areas 521A 3.
  • Folded area 521A 4 is an area for folding the FPC521 between REF area 521A 3 and the sensor electrode area 521A 5.
  • REF area 521A 1 the metal layer in the first embodiment is an area corresponding to the (reference electrode layer) 22, a metal layer 22.
  • REF area 521A 3 the metal layer in the first embodiment is an area corresponding to the (reference electrode layer) 21 comprises a metal layer 21.
  • Sensor electrode area 521A 5 is an area corresponding to the sensor electrode layer 30 in the first embodiment, includes a sensing unit SE1 ⁇ SE7.
  • Support 522 supports the sensor electrode area 521A 5 on REF area 521A 1, spaced between the REF areas 521A 1 and the sensor electrode area 521A 5.
  • Support 23 supports the REF area 521A 3 the sensor electrode area 521A on 5, spaced between the sensor electrode area 521A 5 and REF areas 521A 3.
  • the plurality of supports 522 are arranged in a row at predetermined intervals in the longitudinal direction of the sensor 520, and a space is provided between the adjacent supports 522.
  • a sensing unit SE is provided on this space.
  • the plurality of supports 23 are arranged in a row at predetermined intervals in the longitudinal direction of the sensor 520, and a space is provided between the adjacent supports 522. Below this space, a sensing unit SE is provided.
  • the same material as the support 23 can be exemplified.
  • the sensing units SE1 to SE7 are connected to the signal terminal of the connector 521C via a wire (not shown) provided on the FPC 521.
  • the metal layers 21 and 22 are connected to the ground (GND) terminal of the connector 521C via a wire (not shown) provided on the FPC 521.
  • one equivalent to the metal layer 21, the metal layer 22 and the sensor electrode layer 30 in the first embodiment can be configured by one FPC 521. Therefore, the number of parts can be reduced more than the sensor 20 according to the first embodiment.
  • the metal layers 21 and 22 are connected to the ground (GND) terminal of the connector 521C via a wire provided on the FPC 521. Therefore, unlike the sensor 20 in the first embodiment, a conductive member such as an ACF does not have to be separately provided, so that the configuration of the sensor 520 can be simplified.
  • Modification 1 Although the sixth embodiment has described the configuration in which the REF area 521A 1 , the REF area 521A 3, and the sensor electrode area 521A 5 are provided in one FPC, the configuration of the sensor 520 is not limited to this.
  • the REF area 521A 1 , the REF area 521A 3, and the sensor electrode area 521A 5 may be provided in different FPCs.
  • a sensor having such a configuration will be described.
  • FIG. 43 shows the configuration of a sensor 550 according to a modification.
  • the sensor 550 is provided on the long FPC 551 including the metal layer 21, the support layer 552 provided on the FPC 551, and the support layer 552, and includes the long FPC 531 including the sensing portions SE 1 to SE 7, and the FPC 553.
  • a support layer 554 provided thereon and an elongated FPC 555 provided on the support layer 554 and including the metal layer 22 are provided.
  • the support layer 552 supports the FPC 553 on the FPC 551 and separates the FPC 551 from the FPC 553.
  • the support layer 552 has a space between the sensing unit SE of the FPC 553 and the FPC 551. More specifically, the support layer 552 includes a plurality of supports 552A.
  • the plurality of supports 552A are the same as the support 25 in the first modification of the first embodiment.
  • the support layer 554 supports the FPC 555 on the FPC 553 and separates the FPC 553 from the FPC 555.
  • the support layer 554 has a space between the sensing unit SE of the FPC 553 and the FPC 555. More specifically, the support layer 554 includes a plurality of supports 554A. The plurality of supports 554A are similar to the support 23 in the first embodiment.
  • a ground pad 553A is provided at one end of the FPC 553.
  • the ground pad 553A and one end of the FPC 551 are connected by an adhesive, and the ground pad 553A and one end of the FPC 555 are connected by an adhesive.
  • the ground pad 553A, one end of the FPC 551, and one end of the FPC 555 are electrically connected by connection means such as a through hole, a via (VIA) or a blind via hole (BVH). Thereby, the metal layers 21 and 22 are grounded.
  • the sensor 520 may include an elastic layer instead of the plurality of supports 522, or may include an elastic layer instead of the plurality of supports 23.
  • the sensor 550 may include an elastic layer instead of at least one of the support layers 552 and 554.
  • the thing similar to the elastic layer in the modification 1 of 1st Embodiment can be illustrated.
  • FIG. 44 is a cross-sectional view showing a configuration of the electronic device 610 according to the seventh embodiment of the present disclosure.
  • the electronic device 610 includes an elongated sensor 610A including a first sensor structure 620 and a second sensor structure 630 provided on the first sensor structure 620.
  • the first sensor structure portion 620 is provided on the metal layer (first reference electrode layer) 621, the support layer (first support layer) 622 provided on the metal layer 621, and the support layer 622.
  • the first sensor structure portion 620 includes a conductive member 622 B such as ACF connecting the ground pad 623 A which the sensor electrode layer 623 has at one end to the metal layer 621, the ground pad 623 A and the metal layer 625. And a conductive member 624B such as ACF to be connected.
  • the metal layer 621 is grounded via the conductive member 622B and the ground pad 623A, and is set to the ground potential.
  • the metal layer 625 is grounded via the conductive member 624B and the ground pad 623A, and is set to the ground potential.
  • the second sensor structure portion 630 includes a support layer (third support layer) 631 provided on the metal layer (second reference electrode layer) 625, and a sensor electrode layer (third support layer) provided on the support layer 631. 2), a support layer (fourth support layer) 633 provided on the sensor electrode layer 632, a metal layer (third reference electrode layer) 634 provided on the support layer 633, and Equipped with
  • the second sensor structure portion 630 includes a conductive member 631B such as ACF connecting the ground pad 632A which the sensor electrode layer 632 has at one end to the metal layer 625, the ground pad 632A and the metal layer 634 And a conductive member 633B such as ACF to be connected.
  • the metal layer 625 is grounded via the conductive member 631B and the ground pad 632A, and is set to the ground potential.
  • the metal layer 634 is grounded via the conductive member 633B and the ground pad 632A, and is set to the ground potential.
  • the support layer 622 supports the sensor electrode layer 623 on the metal layer 621 and separates the metal layer 621 from the sensor electrode layer 623.
  • the support layer 622 has a space between the sensing portion SE of the sensor electrode layer 623 and the metal layer 621. More specifically, the support layer 622 includes a plurality of supports 622A.
  • the plurality of supports 622A are similar to the support 25 in the first modification of the first embodiment.
  • the support layer 624 supports the metal layer 625 on the sensor electrode layer 623 and separates the sensor electrode layer 623 from the metal layer 625.
  • the support layer 624 has a space between the sensing portion SE of the sensor electrode layer 623 and the metal layer 625. More specifically, the support layer 624 includes a plurality of supports 624A. The plurality of supports 624A are similar to the support 23 in the first embodiment.
  • the support layer 631 supports the sensor electrode layer 632 on the metal layer 625 and separates the metal layer 625 from the sensor electrode layer 632.
  • the support layer 631 has a space between the sensing portion SE of the sensor electrode layer 632 and the metal layer 625. More specifically, the support layer 631 includes a plurality of supports 631A.
  • the plurality of supports 631A are the same as the support 25 in the first modification of the first embodiment.
  • the support layer 633 supports the metal layer 634 on the sensor electrode layer 632 and separates the sensor electrode layer 632 from the metal layer 634.
  • the support layer 633 has a space between the sensing portion SE of the sensor electrode layer 632 and the metal layer 634. More specifically, the support layer 633 includes a plurality of supports 633A.
  • the plurality of supports 633A are the same as the support 23 in the first embodiment.
  • the sensor electrode layers 623 and 632 are similar to the sensor electrode layer 30 in the first embodiment. That is, the sensor electrode layers 623 and 632 are configured by the FPC.
  • Metal layer The metal layers 621, 625, 634 are similar to the metal layers 21, 22 in the first embodiment.
  • the electronic device 610 includes an IC and a CPU (both not shown).
  • the IC detects a change (pressure) in capacitance of each sensing unit SE of the sensor 610A, that is, each sensing unit SE of the sensor electrode layers 623, 632 and outputs a signal corresponding to the result to the CPU.
  • the IC may add the change of the electrostatic capacitance of a pair of sensing units SE overlapping in the thickness direction of the sensor 610A, and output a signal according to the added value.
  • An electronic device 610 according to the seventh embodiment includes a sensor 610A including a first sensor structure 620 and a second sensor structure 630 provided on the first sensor structure 620.
  • FIG. 45 is a cross-sectional view showing a configuration of a sensor 650 according to a modification.
  • the first sensor structure portion 660 includes long FPCs 661 and 662 instead of the long metal layers 621 625 and 634.
  • the second structure portion 670 includes a long FPC 671 instead of the long metal layer 634.
  • the FPCs 661, 662, 671 include metal layers 621, 625, 634, respectively.
  • One end of the FPC 661, the ground pad 623A of the sensor electrode layer 623, one end of the FPC 662, the ground pad 632A of the sensor electrode layer 632, and one end of the FPC 671 are adhesive agents 622C and 624C. , 631 C, and 633 C, and is electrically connected by connection means 681 such as through holes, vias (VIA) or blind via holes (BVH). Thereby, the metal layers 621, 625, 634 are grounded.
  • connection means 681 such as through holes, vias (VIA) or blind via holes (BVH).
  • connection means 682 such as through holes, vias (VIA) or blind via holes (BVH).
  • the sensor 610A may include an elastic layer instead of at least one of the support layers 622, 624, 631, and 633.
  • the sensor 650 may include an elastic layer instead of at least one of the support layers 622, 624, 631, 633.
  • the thing similar to the elastic layer in the modification 1 of 1st Embodiment can be illustrated.
  • Metal layer 621 SUS layer
  • support 622 A double-sided adhesive tape
  • sensor electrode layer 623 FPC
  • support 624 A double-sided adhesive tape
  • metal layer 625 SUS layer
  • Support 631 A double-sided adhesive tape
  • sensor electrode layer 632 FPC
  • support 633 A double-sided adhesive tape
  • metal layer 634 SUS layer
  • Reference Example 2 A rectangular film-like sensor consisting only of the first sensor structure 620 of Reference Example 1 was produced.
  • the sensing portion SE was pressed by using a silicone rubber hammer having a diameter of 6 mm, and the amount of change in capacitance with respect to the amount of displacement of the sensing surface 20S was measured. The results are shown in FIGS. 46A and 46B.
  • the range of the displacement amount at which the capacitance change (capacitance decrease) becomes ⁇ 0.005 [pF] or less is determined, in the sensor 610A of the reference example 1, the range of the displacement amount is about 380 ⁇ m (FIG. 46A)
  • the range of the displacement amount was about 170 ⁇ m (see FIG. 46B). That is, the range detectable as the displacement amount by the sensor 610A of the reference example 1 was twice or more the range detectable as the displacement amount by the sensor of the reference example 2. If the change in capacitance (reduction in capacitance) is 0.005 [pF] or less, it is generally considered that good sensitivity can be obtained.
  • this indication is not limited to the above-mentioned embodiment and its modification, and various modification based on the technical idea of this indication Is possible.
  • the button BT1 is provided on the side wall portion Configuration for displaying information 13G corresponding to the buttons BT1, BT2 and BT3 at a position along the side of the side wall in the screen 13B (configuration in the second embodiment), instead of including the components BT2 and BT3 May be adopted.
  • the sensing units SE1, SE3, SE5, and SE7 are used as sensing units for malfunction compensation
  • all the sensing units SE1 to SE7 are used as sensing units for user operation detection. You may use.
  • buttons are also provided at positions corresponding to the sensing units SE1, SE3, SE5, and SE7.
  • the present disclosure can adopt the following configurations. (1) And A sensor provided on an inner side surface of the housing to detect deformation of the housing; And a control unit that controls the operation of the electronic device based on the detection result of the sensor.
  • the sensor is A first sensing unit for detecting a prescribed user operation;
  • An electronic device comprising: a second sensing unit for compensating for a malfunction.
  • the sensor includes two or more of the first sensing units, The electronic device according to (1), wherein the second sensing unit is provided between the adjacent first sensing units.
  • the control unit is configured to control the level of at least one of detection signals of the first sensing unit and the second sensing unit to exceed a threshold, and at least one of the signals exceeding the threshold.
  • the electronic device according to (1) or (2), wherein the malfunction is detected based on whether or not the signal with the highest signal level is the detection signal of the first sensing unit.
  • the control unit is configured such that the level of at least one of the detection signals of the first sensing unit and the second sensing unit is opposite in polarity to a first threshold for determining the prescribed user operation.
  • the electronic device according to any one of (1) to (3), which detects a malfunction based on whether or not the opposite second threshold is exceeded.
  • the control unit allocates a part of the plurality of sensing units to the first sensing unit and allocates the remaining ones to the second sensing unit according to activation of an application, whichever of (1) to (4) Electronic device described in.
  • the electronic device further comprising a display device, The electronic device according to (5), wherein the control unit displays information on an operation corresponding to the first sensing unit at a position corresponding to the first sensing unit in a screen of the display device.
  • the housing includes a bottom, a wall provided on the periphery of the bottom, and a front panel provided on the wall.
  • the first sensing unit is provided on an inner surface of the wall portion,
  • the electronic device according to any one of (1) to (6), wherein the second sensing unit is provided on at least one of the bottom portion and an inner side surface of the front panel.
  • the control unit detects a malfunction based on whether the detection signal of the second sensing unit exceeds a threshold.
  • the housing has a side wall portion, The electronic device according to any one of (1) to (8), wherein the sensor is provided on an inner side surface of the side wall portion. (10) An elastic body provided on the back of the sensor; And a support for supporting the elastic body.
  • the housing has a groove provided along the side wall, A sensor module is constituted by the sensor, the elastic body and the support body, The electronic device according to (9), wherein the sensor module is fitted in the groove.
  • the housing has a side wall portion having a slit portion, The electronic device according to any one of (1) to (8), wherein the sensor is accommodated in the slit portion. (13) The electronic device according to any one of (1) to (11), wherein the sensor has a film shape, and one main surface of the sensor is provided to face an inner side surface of the housing. (14) The sensor is A first reference electrode layer, A first support layer provided on the first reference electrode layer; A first sensor electrode layer provided on the first support layer; A second support layer provided on the first sensor electrode layer; And a second reference electrode layer provided on the second support layer. The electronic device according to any one of (1) to (13).
  • the sensor is A third support layer provided on the second reference electrode layer; A second sensor electrode layer provided on the third support layer; A fourth support layer provided on the second sensor electrode layer; The electronic device according to (14), further comprising: a third reference electrode layer provided on the fourth support layer.
  • the sensor is A first sensing unit for detecting a prescribed user operation; An electronic device comprising: a second sensing unit for compensating for a malfunction.

Abstract

This electronic device is provided with: a housing; a sensor provided on an inner surface of the housing and detecting deformation about the housing; and a control unit which controls the operation of the electronic device on the basis of results detected from the sensor, wherein the sensor has a first sensing unit for detecting the operation specified by a user and a second sensing unit for correcting malfunctions.

Description

センサおよび電子機器Sensors and electronics
 本開示は、センサおよび電子機器に関する。 The present disclosure relates to sensors and electronic devices.
 近年、筐体表面の押圧を検出することができる電子機器が提案されている。例えば特許文献1では、このような電子機器の1つとして、筐体の内側面にシート状の感圧センサを備えるものが提案されている。感圧センサとしては、導電層と、複数のセンサ部を含むセンサ層と、導電層とセンサ層との間に設けられた空間層とを備えるものが用いられている。 In recent years, electronic devices capable of detecting the pressure on the surface of a housing have been proposed. For example, in Patent Document 1, as one of such electronic devices, one having a sheet-like pressure sensor on the inner side surface of a housing is proposed. As a pressure sensor, a sensor provided with a conductive layer, a sensor layer including a plurality of sensor portions, and a space layer provided between the conductive layer and the sensor layer is used.
国際公開第2016/143241号パンフレットInternational Publication No. 2016/143241 brochure
 しかしながら、特許文献1に記載された電子機器では、意図しない変形(例えば、ねじり、曲げ)が筐体に加えられた場合や、意図しない筐体の位置が押圧された場合に、電子機器が誤動作してしまう虞がある。 However, in the electronic device described in Patent Document 1, the electronic device malfunctions when an unintended deformation (for example, twisting or bending) is applied to the housing or when an unintended position of the housing is pressed. There is a risk of
 本開示の目的は、誤動作を抑制することができるセンサおよび電子機器を提供することにある。 An object of the present disclosure is to provide a sensor and an electronic device capable of suppressing a malfunction.
 上述の課題を解決するために、第1の開示は、筐体と、筐体の内側面に設けられ、筐体の変形を検出するセンサと、センサの検出結果に基づき、電子機器の動作を制御する制御部とを備え、センサは、規定のユーザ操作を検出するための第1のセンシング部と、誤動作を補償するための第2のセンシング部とを有する電子機器である。 In order to solve the above-described problems, according to the first disclosure, an operation of an electronic device is provided based on a detection result of a housing, a sensor provided on an inner side surface of the housing and detecting deformation of the housing, and a sensor. The sensor is an electronic device including a first sensing unit for detecting a prescribed user operation and a second sensing unit for compensating for a malfunction.
 第2の開示は、筐体と、前記筐体に設けられ、前記筐体の変形を検出するセンサと、前記センサの検出結果に基づき、電子機器の動作を制御する制御部とを備え、前記センサは、規定のユーザ操作を検出するための第1のセンシング部と、誤動作を補償するための第2のセンシング部とを有する電子機器である。 A second disclosure includes a case, a sensor provided in the case, which detects a deformation of the case, and a control unit which controls an operation of an electronic device based on a detection result of the sensor. The sensor is an electronic device having a first sensing unit for detecting a prescribed user operation and a second sensing unit for compensating for a malfunction.
 第3の開示は、筐体の内側面に設けられ、筐体の変形を検出するセンサであって、規定のユーザ操作を検出するための第1のセンシング部と、誤動作を補償するための第2のセンシング部とを有するセンサである。 A third disclosure is a sensor provided on an inner side surface of a housing to detect a deformation of the housing, the first sensing unit for detecting a prescribed user operation, and a second sensor for compensating a malfunction. It is a sensor which has 2 sensing parts.
 第4の開示は、筐体に設けられ、前記筐体の変形を検出するセンサであって、規定のユーザ操作を検出するための第1のセンシング部と、誤動作を補償するための第2のセンシング部とを有するセンサである。 A fourth disclosure is a sensor provided in a housing, which detects a deformation of the housing, and a first sensing unit for detecting a prescribed user operation, and a second sensor for compensating a malfunction. It is a sensor which has a sensing part.
 本開示によれば、電子機器の誤動作を抑制することができる。なお、ここに記載された効果は必ずしも限定されるものではなく、本開示中に記載されたいずれかの効果またはそれらと異質な効果であってもよい。 According to the present disclosure, it is possible to suppress the malfunction of the electronic device. Note that the effects described herein are not necessarily limited, and may be any of the effects described in the present disclosure or effects different from them.
図1は、本開示の第1の実施形態に係る電子機器の構成を示す分解斜視図である。FIG. 1 is an exploded perspective view showing the configuration of the electronic device according to the first embodiment of the present disclosure. 図2は、側壁部の一部を拡大して表す平面図である。FIG. 2 is a plan view showing a part of the side wall portion in an enlarged manner. 図3Aは、図2のIIIA-IIIA線に沿った断面図である。図3Bは、図2のIIIB-IIIB線に沿った断面図である。FIG. 3A is a cross-sectional view taken along the line IIIA-IIIA of FIG. 3B is a cross-sectional view taken along the line IIIB-IIIB of FIG. 図4は、センサ支持部の構成の示す分解斜視図である。FIG. 4 is an exploded perspective view showing the configuration of the sensor support. 図5Aは、センサが有するセンシング部の配置を示す概略図である。図5Bは、センサの構成を示す断面図である。FIG. 5A is a schematic view showing the arrangement of the sensing unit of the sensor. FIG. 5B is a cross-sectional view showing the configuration of the sensor. 図6は、センシング部の構成を示す平面図である。FIG. 6 is a plan view showing the configuration of the sensing unit. 図7は、本開示の第1の実施形態に係る電子機器の回路構成を示すブロック図である。FIG. 7 is a block diagram showing a circuit configuration of the electronic device according to the first embodiment of the present disclosure. 図8Aは、規定の位置が押圧された例を示す概略図である。図8Bは、図8Aに示す位置が押圧されたときのセンシング部の出力値の一例を示すグラフである。FIG. 8A is a schematic view showing an example in which a prescribed position is pressed. FIG. 8B is a graph showing an example of the output value of the sensing unit when the position shown in FIG. 8A is pressed. 図9Aは、電子機器に加えられる曲げの方向を示す概略図である。図9Bは、図9Aに示す方向に曲げが加えられたときのセンシング部の出力値の一例を示すグラフである。FIG. 9A is a schematic view showing the direction of bending applied to the electronic device. FIG. 9B is a graph showing an example of the output value of the sensing unit when bending is applied in the direction shown in FIG. 9A. 図10Aは、電子機器に加えられるねじりの方向を示す概略図である。図10Bは、図10Aに示す方向にねじりが加えられたときのセンシング部の出力値の一例を示すグラフである。FIG. 10A is a schematic view showing the direction of twist applied to the electronic device. FIG. 10B is a graph showing an example of the output value of the sensing unit when twisting is applied in the direction shown in FIG. 10A. 図11Aは、規定の位置以外の箇所が押圧された例を示す概略図である。図11Bは、図11Aに示す位置が押圧されたときのセンシング部の出力値の一例を示すグラフである。FIG. 11A is a schematic view showing an example in which a place other than the prescribed position is pressed. FIG. 11B is a graph showing an example of the output value of the sensing unit when the position shown in FIG. 11A is pressed. 図12は、本開示の第1の実施形態に係る電子機器の動作を説明するためのフローチャートである。FIG. 12 is a flowchart for explaining the operation of the electronic device according to the first embodiment of the present disclosure. 図13Aは、電子機器に曲げまたはねじりが加えられていることをユーザに知らせる警告画面の一例を示す概略図である。図13Bは、正しい位置が押圧されていないことをユーザに知らせる警告画面の一例を示す概略図である。FIG. 13A is a schematic diagram showing an example of a warning screen that informs the user that bending or twisting has been applied to the electronic device. FIG. 13B is a schematic diagram showing an example of a warning screen that informs the user that the correct position is not pressed. 図14は、本開示の第1の実施形態の変形例に係る電子機器の構成を示す断面図である。FIG. 14 is a cross-sectional view showing the configuration of an electronic device according to a modification of the first embodiment of the present disclosure. 図15A、15Bは、本開示の第1の実施形態の変形例に係る電子機器の構成を示す断面図である。15A and 15B are cross-sectional views showing the configuration of an electronic device according to a modification of the first embodiment of the present disclosure. 図16Aは、電子機器の底部が押圧されたときの状態を示す断面図である。図16Bは、図16Aに示した状態における各センシング部の検出信号の例を示すグラフである。FIG. 16A is a cross-sectional view showing the state when the bottom of the electronic device is pressed. FIG. 16B is a graph showing an example of detection signals of each sensing unit in the state shown in FIG. 16A. 図17A、17Bは、センシング部のスキャン順序を説明するための概略図である。17A and 17B are schematic diagrams for describing the scan order of the sensing unit. 図18Aは、センサ支持部の構成を示す分解斜視図である。図18Bは、センサ支持部の構成を示す斜視図である。FIG. 18A is an exploded perspective view showing the configuration of a sensor support. FIG. 18B is a perspective view showing the configuration of a sensor support. 図19A、図19Bは、センサの変形例を示す平面図である。19A and 19B are plan views showing modified examples of the sensor. 図20Aは、センサの変形例を示す平面図である。図20Bは、図20A中に示した位置PAが押圧されたときの検出信号を示すグラフである。図20Cは、図20A中に示した位置PBが押圧されたときの検出信号を示すグラフである。FIG. 20A is a plan view showing a modified example of the sensor. Figure 20B is a graph showing a detection signal when the position P A shown in FIG. 20A is pressed. Figure 20C is a graph showing a detection signal when the position P B shown in FIG. 20A is pressed. 図21は、自己容量方式のセンサ電極層の構成を示す平面図である。FIG. 21 is a plan view showing the configuration of a self-capacitance sensor electrode layer. 図22は、本開示の第2の実施形態に係る電子機器の構成を示す斜視図である。FIG. 22 is a perspective view showing the configuration of the electronic device according to the second embodiment of the present disclosure. 図23は、センサの構成を示す平面図である。FIG. 23 is a plan view showing the configuration of the sensor. 図24Aは、カメラアプリケーション使用時の画面の例を示す概略図である。図24Bは、カメラアプリケーション使用時のセンシング部のマッピング設定の例を示す概略図である。FIG. 24A is a schematic view showing an example of a screen when using a camera application. FIG. 24B is a schematic view showing an example of mapping setting of a sensing unit when using a camera application. 図25Aは、音楽アプリケーション使用時の画面の例を示す概略図である。図25Bは、音楽アプリケーション使用時のセンシング部のマッピング設定の例を示す概略図である。FIG. 25A is a schematic view showing an example of a screen when using a music application. FIG. 25B is a schematic diagram illustrating an example of mapping setting of the sensing unit when using a music application. 図26Aは、地図アプリケーション使用時の画面の例を示す概略図である。図26Bは、地図アプリケーション使用時のセンシング部のマッピング設定の例を示す概略図である。FIG. 26A is a schematic view showing an example of a screen when using a map application. FIG. 26B is a schematic view showing an example of mapping setting of the sensing unit when using the map application. 図27は、本開示の第2の実施形態に係る電子機器の動作を説明するためのフローチャートである。FIG. 27 is a flowchart for explaining the operation of the electronic device according to the second embodiment of the present disclosure. 図28は、本開示の第3の実施形態に係る電子機器の構成を示す分解斜視図である。FIG. 28 is an exploded perspective view showing the configuration of the electronic device according to the third embodiment of the present disclosure. 図29Aは、センサの構成の示す斜視図である。図29Bは、平面状に展開された状態のセンサを示す平面図である。FIG. 29A is a perspective view showing the configuration of a sensor. FIG. 29B is a plan view showing the sensor in a flat state. 図30は、図29のXXX-XXX線に沿った断面図である。FIG. 30 is a cross-sectional view taken along the line XXX-XXX in FIG. 図31Aは、相互容量方式のセンサ電極層の一構成例を示す平面図である。図31Bは、相互容量方式のセンサ電極層の他の構成例を示す平面図である。FIG. 31A is a plan view showing a configuration example of mutual capacitance type sensor electrode layers. FIG. 31B is a plan view showing another configuration example of the mutual capacitance type sensor electrode layer. 図32Aは、センサに対する押圧位置の例を示す斜視図である。図32Bは、図32A中に示した位置PAが押圧されたときの検出信号を示すグラフである。図32Cは、図32A中に示した位置PBが押圧されたときの検出信号を示すグラフである。FIG. 32A is a perspective view showing an example of a pressed position on a sensor. Figure 32B is a graph showing a detection signal when the position P A shown in FIG. 32A is pressed. Figure 32C is a graph showing a detection signal when the position P B shown in FIG. 32A is pressed. 図33は、本開示の第3の実施形態に係る電子機器の動作を説明するためのフローチャートである。FIG. 33 is a flowchart for explaining the operation of the electronic device according to the third embodiment of the present disclosure. 図34は、自己容量方式のセンサ電極層の構成を示す平面図である。FIG. 34 is a plan view showing the configuration of a self-capacitance sensor electrode layer. 図35Aは、本開示の第4の実施形態に係る電子機器の内部構成を示す斜視図である。図35Bは、図35AのXXXVB-XXXVB線に沿った断面図である。FIG. 35A is a perspective view showing an internal configuration of an electronic device according to a fourth embodiment of the present disclosure. FIG. 35B is a cross-sectional view along the line XXXVB-XXXVB in FIG. 35A. 図36は、センサモジュールの外観を示す斜視図である。FIG. 36 is a perspective view showing an appearance of a sensor module. 図37は、本開示の第5の実施形態に係る電子機器の内部構成を示す分解斜視図である。FIG. 37 is an exploded perspective view showing an internal configuration of the electronic device according to the fifth embodiment of the present disclosure. 図38は、側壁部の近傍の構成を示す断面図である。FIG. 38 is a cross-sectional view showing the configuration in the vicinity of the side wall portion. 図39A、図39Bは、センサモジュールの取り付け方法を説明するための斜視図である。FIG. 39A and FIG. 39B are perspective views for explaining the mounting method of the sensor module. 図40A、図40Bは、センサモジュールの取り付け方法を説明するための斜視図である。FIG. 40A and FIG. 40B are perspective views for explaining the mounting method of the sensor module. 図41Aは、本開示の第6の実施形態に係る電子機器の構成を示す断面図である。図41Bは、図41Aに示したセンサを展開した状態を示す断面図である。FIG. 41A is a cross-sectional view showing a configuration of an electronic device according to a sixth embodiment of the present disclosure. FIG. 41B is a cross-sectional view showing an expanded state of the sensor shown in FIG. 41A. 図42は、フレキシブルプリント基板の構成を示す平面図である。FIG. 42 is a plan view showing the configuration of the flexible printed circuit. 図43は、センサの変形例を示す断面図である。FIG. 43 is a cross-sectional view showing a modified example of the sensor. 図44は、本開示の第7の実施形態に係る電子機器の構成を示す断面図である。FIG. 44 is a cross-sectional view showing a configuration of the electronic device according to the seventh embodiment of the present disclosure. 図45は、センサの変形例を示す断面図である。FIG. 45 is a cross-sectional view showing a modified example of the sensor. 図46Aは、参考例1のセンサの容量変化を示すグラフである。図46Bは、参考例2のセンサの容量変化を示すグラフである。FIG. 46A is a graph showing a change in capacitance of the sensor of Reference Example 1. FIG. 46B is a graph showing a change in capacitance of the sensor of Reference Example 2.
 本開示の実施形態について以下の順序で説明する。なお、以下の実施形態の全図においては、同一または対応する部分には同一の符号を付す。
1 第1の実施形態(電子機器の例)
2 第2の実施形態(電子機器の例)
3 第3の実施形態(電子機器の例)
4 第4の実施形態(電子機器の例)
5 第5の実施形態(電子機器の例)
6 第6の実施形態(電子機器の例)
7 第7の実施形態(電子機器の例)
Embodiments of the present disclosure will be described in the following order. In all the drawings of the following embodiments, the same or corresponding parts are denoted by the same reference numerals.
1 First embodiment (example of electronic device)
2 Second Embodiment (Example of Electronic Device)
3 Third Embodiment (Example of Electronic Device)
4 Fourth Embodiment (Example of Electronic Device)
5 Fifth Embodiment (Example of Electronic Device)
6 Sixth Embodiment (Example of Electronic Device)
7 Seventh Embodiment (Example of Electronic Device)
<1 第1の実施形態>
[電子機器の構成]
 図1は、第1の実施形態に係る電子機器10の構成を示す。第1の実施形態に係る電子機器10は、いわゆるスマートフォンであり、一方の主面が解放された薄い箱状を有する、外装体としての筐体11と、筐体11内に収容された基板12と、解放された一方の主面を塞ぐように設けられたフロントパネル13とを備える。
<1 First Embodiment>
[Configuration of electronic device]
FIG. 1 shows the configuration of the electronic device 10 according to the first embodiment. The electronic device 10 according to the first embodiment is a so-called smart phone, and a case 11 as an exterior body having a thin box shape with one main surface released, and a substrate 12 housed in the case 11 And a front panel 13 provided to close one of the released main surfaces.
(筐体)
 筐体11は、電子機器10の裏面を構成する矩形板状の底部11Mと、この底部11Mの周縁に設けられた壁部11Nとを備える。壁部11Nは、底部11Mに対して垂直に立てられており、底部11Mの両長辺側に設けられた側壁部11R、11Lを有している。筐体11の厚みは、好ましくは1mm以上、例えば1.08mmまたは1.4mmである。
(Housing)
The housing 11 includes a rectangular plate-like bottom portion 11M that constitutes the back surface of the electronic device 10, and a wall portion 11N provided on the periphery of the bottom portion 11M. The wall portion 11N is erected perpendicularly to the bottom portion 11M, and has side wall portions 11R and 11L provided on both long sides of the bottom portion 11M. The thickness of the housing 11 is preferably 1 mm or more, for example, 1.08 mm or 1.4 mm.
 側壁部11Rの外側面11SAは、側壁部11Rの長さ方向(すなわち壁部11Nの周方向)に一列に並ぶようにして設けられたボタンBT1、BT2、BT3を有している。ボタンBT1、BT2、BT3の位置にはそれぞれ、窪みが設けられている。ボタンBT1、BT2、BT3はそれぞれ、例えばボリュームダウンボタン、ボリュームアップボタン、電源ボタンである。 The outer side surface 11SA of the side wall 11R has buttons BT1, BT2 and BT3 provided in a line in the longitudinal direction of the side wall 11R (that is, the circumferential direction of the wall 11N). Recesses are provided at the positions of the buttons BT1, BT2 and BT3, respectively. The buttons BT1, BT2, and BT3 are, for example, a volume down button, a volume up button, and a power button.
 筐体11は、図2、3A、3Bに示すように、側壁部11Rの内側面11SBに沿って設けられた溝部14を有している。この溝部14に、フィルム状を有する長尺のセンサ20、フィルム状を有する長尺の弾性体51およびフィルム状を有する長尺のスペーサ52が、それぞれの主面が内側面11SBと平行になるようにして収容されている。なお、本開示においては、フィルムには、シートも含まれるものとする。また、センサ20、弾性体51およびスペーサ52のうちの少なくとも1つが、板状を有していてもよい。 The housing 11 has a groove portion 14 provided along the inner side surface 11SB of the side wall portion 11R, as shown in FIGS. In the groove portion 14, the long sensor 20 having a film shape, the long elastic body 51 having a film shape, and the long spacer 52 having a film shape are arranged such that their main surfaces are parallel to the inner surface 11SB. Are housed. In the present disclosure, the film also includes a sheet. In addition, at least one of the sensor 20, the elastic body 51, and the spacer 52 may have a plate shape.
 溝部14内において、センサ20、弾性体51、スペーサ52は、内側面11SBの側から遠ざかる方向にセンサ20、弾性体51、スペーサ52の順序で重ね合わされている。弾性体51は、センサ20に対して両面接着テープ等の接着層により貼り合わされていてもよい。なお、本明細書において、センサ20の長手方向を±X軸方向といい、幅方向(短手方向)を±Y軸方向といい、長手方向および幅方向に垂直な方向(すなわちセンシング面20Sに垂直な方向)を±Z軸方向という。 In the groove portion 14, the sensor 20, the elastic body 51, and the spacer 52 are overlapped in the order of the sensor 20, the elastic body 51, and the spacer 52 in a direction away from the side of the inner side surface 11SB. The elastic body 51 may be bonded to the sensor 20 by an adhesive layer such as a double-sided adhesive tape. In the present specification, the longitudinal direction of the sensor 20 is referred to as ± X axis direction, and the width direction (short direction) is referred to as ± Y axis direction, and a direction perpendicular to the longitudinal direction and the width direction (ie, to the sensing surface 20S). Vertical direction) is called ± Z axis direction.
(センサ)
 センサ20は、静電容量式の感圧センサである。第1の実施形態では、静電容量式の感圧センサとして、相互容量方式の感圧センサが用いられる。センサ20は、図4に示すように、細長の長方形状を有し、センサ20の一方の長辺の中央から接続部41が延設されている。延設された接続部41の先端には、図2に示すように、コネクタ42が設けられており、このコネクタ42が、基板12に設けられた図示しないコネクタに接続される。センサ20の一方の主面が、押圧を検出するセンシング面20Sとなっており、センサ20は、センシング面20Sが内側面11SBに押し付けられるようにして溝部14に収容されている。なお、本明細書では、センサ20の両主面のうち、センシング面20Sとは反対側の主面を裏面という。
(Sensor)
The sensor 20 is a capacitive pressure sensor. In the first embodiment, a mutual capacitive pressure sensor is used as a capacitive pressure sensor. As shown in FIG. 4, the sensor 20 has an elongated rectangular shape, and the connection portion 41 extends from the center of one long side of the sensor 20. As shown in FIG. 2, a connector 42 is provided at the tip of the extended connection portion 41, and the connector 42 is connected to a connector (not shown) provided on the substrate 12. One main surface of the sensor 20 is a sensing surface 20S that detects a pressure, and the sensor 20 is accommodated in the groove portion 14 such that the sensing surface 20S is pressed against the inner surface 11SB. In addition, in this specification, the main surface on the opposite side to sensing surface 20S among both main surfaces of sensor 20 is called back.
 センサ20と接続部41とは、T字状を有する1つのFPC40により一体的に構成されている。このような構成を採用することで、部品点数を減らすことができる。また、センサ20と基板12との接続の衝撃耐久性を向上できる。但し、センサ20と接続部41とが別体で構成されていてもよい。この構成の場合、センサ20が、例えばリジッド基板またはリジッドフレキシブル基板で構成されていてもよい。 The sensor 20 and the connection portion 41 are integrally configured by one FPC 40 having a T-shape. By adopting such a configuration, the number of parts can be reduced. Further, the impact durability of the connection between the sensor 20 and the substrate 12 can be improved. However, the sensor 20 and the connection portion 41 may be configured separately. In this configuration, the sensor 20 may be made of, for example, a rigid substrate or a rigid flexible substrate.
 図5Aは、センサ20の構成を示す平面図である。図5Aに示すように、センサ20は、センサ20の長手方向に等間隔で一列に配置されたセンシング部SE1~SE7を有する。但し、センシング部SE1~SE7の間隔は等間隔に限定されるものではなく、所望とする特性に応じて不等間隔に配置されていてもよい。なお、以下の説明において、センシング部SE1~SE7を特に区別しない場合には、センシング部SEという場合がある。また、センシング部SE1~SE7それぞれにて検出される検出信号を検出信号S1~S7という場合がある。 FIG. 5A is a plan view showing the configuration of the sensor 20. FIG. As shown in FIG. 5A, the sensor 20 has sensing units SE1 to SE7 arranged in a line at equal intervals in the longitudinal direction of the sensor 20. However, the intervals of the sensing units SE1 to SE7 are not limited to equal intervals, and may be arranged at unequal intervals according to the desired characteristics. In the following description, when the sensing units SE1 to SE7 are not particularly distinguished, they may be referred to as a sensing unit SE. Further, detection signals detected by the sensing units SE1 to SE7 may be referred to as detection signals S1 to S7.
 センシング部SE2、SE4、SE6はそれぞれ、ボタンBT1、BT2、BT3の押圧によるユーザ操作(規定のユーザ操作)を検出するための第1のセンシング部(以下「ユーザ操作検出用のセンシング部」ということがある。)である。センシング部SE1、SE3、SE5、SE7はそれぞれ、電子機器10の誤動作を補償するための第2のセンシング部(以下「誤動作補償用のセンシング部」ということがある。)である。誤動作補償用のセンシング部SE3は、隣接するユーザ操作検出用のセンシング部SE2、SE4の間に設けられている。また、誤動作補償用のセンシング部SE5は、隣接するユーザ操作検出用のセンシング部SE4、SE6の間に設けられている。 The sensing units SE2, SE4, and SE6 are first sensing units (hereinafter referred to as "sensing units for detecting user operation") for detecting user operations (specified user operations) by pressing the buttons BT1, BT2, and BT3, respectively. There is The sensing units SE1, SE3, SE5, and SE7 are second sensing units (hereinafter sometimes referred to as "sensing units for malfunction compensation") for compensating for malfunction of the electronic device 10. The sensing unit SE3 for malfunction compensation is provided between the adjacent sensing units SE2 and SE4 for user operation detection. In addition, the sensing unit SE5 for malfunction compensation is provided between the adjacent sensing units SE4 and SE6 for user operation detection.
 センシング部SE2、SE4、SE6はそれぞれ、ボタンBT1、BT2、BT3に対応する位置に設けられており、ボタンBT1、BT2、BT3の押圧を検出する。センシング部SE3、SE5はそれぞれ、ボタンBT1、BT2間、ボタンBT2、BT3間に対応する位置に設けられており、ボタンBT1、BT2間の押圧、およびボタンBT2、BT3間の押圧を検出する。センシング部SE1は、ボタンBT1の両側の位置のうちボタンBT2とは反対側の位置に設けられ、センシング部SE7は、ボタンBT3の両側の位置のうちボタンBT2とは反対側の位置に設けられている。これにより、一列に配置されたボタンBT1、BT2、BT3の両端の外側の位置の押圧を検出する。 The sensing units SE2, SE4, and SE6 are provided at positions corresponding to the buttons BT1, BT2, and BT3, respectively, and detect pressing of the buttons BT1, BT2, and BT3. The sensing units SE3 and SE5 are provided at positions corresponding to the buttons BT1 and BT2 and the buttons BT2 and BT3, respectively, and detect the press between the buttons BT1 and BT2 and the press between the buttons BT2 and BT3. The sensing unit SE1 is provided on the opposite side of the button BT2 among the positions on both sides of the button BT1, and the sensing unit SE7 is provided on the opposite side of the button BT2 on the both sides of the button BT3. There is. As a result, the pressure on the outer side of the both ends of the buttons BT1, BT2 and BT3 arranged in a line is detected.
 図5Bは、センサの構成を示す断面図である。センサ20は、センシング部SE1~SE7を有するセンサ電極層30と、金属層21、22と、柱状を有する複数の支持体23と、接着層24とを備える。センサ20の幅は、好ましくは約2mm以上約4mm以下、例えば約2.5mmである。取付構造を含めたセンサ20の厚み、好ましくは2mm以下、例えば1.53mmである。 FIG. 5B is a cross-sectional view showing the configuration of the sensor. The sensor 20 includes a sensor electrode layer 30 having sensing portions SE1 to SE7, metal layers 21 and 22, a plurality of pillars of a plurality of supports 23, and an adhesive layer 24. The width of the sensor 20 is preferably about 2 mm or more and about 4 mm or less, for example about 2.5 mm. The thickness of the sensor 20 including the mounting structure is preferably 2 mm or less, for example 1.53 mm.
 金属層21とセンサ電極層30とは、金属層21とセンサ電極層30との主面同士が対向するように配置されている。複数の支持体23は、金属層21とセンサ電極層30との主面間に設けられ、金属層21とセンサ電極層30との間が離間するように、金属層21をセンサ電極層30の一方の主面にて支持する。複数の支持体23により、金属層21とセンサ電極層30との主面間に支持層が構成されている。 The metal layer 21 and the sensor electrode layer 30 are disposed such that the main surfaces of the metal layer 21 and the sensor electrode layer 30 face each other. The plurality of supports 23 are provided between the main surfaces of the metal layer 21 and the sensor electrode layer 30, and the metal layer 21 is formed of the sensor electrode layer 30 so that the metal layer 21 and the sensor electrode layer 30 are separated. It supports on one main surface. The plurality of supports 23 form a support layer between the main surfaces of the metal layer 21 and the sensor electrode layer 30.
 金属層22とセンサ電極層30とは、金属層22とセンサ電極層30との主面同士が対向するように配置されている。接着層24は、金属層22とセンサ電極層30との間に設けられ、金属層22とセンサ電極層30とを貼り合わせる。 The metal layer 22 and the sensor electrode layer 30 are disposed such that the main surfaces of the metal layer 22 and the sensor electrode layer 30 face each other. The adhesive layer 24 is provided between the metal layer 22 and the sensor electrode layer 30, and bonds the metal layer 22 and the sensor electrode layer 30 to each other.
 センサ20は、さらに、センサ電極層30が有する第1のグランドパッドと金属層21とを接続するACF(Anisotropic Conductive Film)等の第1の導電部材と、センサ電極層30が有する第2のグランドパッドと金属層22とを接続するACF等の第2の導電部材とを備える。金属層21は、第1の導電部材および第1のグランドパッドを介して接地され、グランド電位とされている。また、金属層22は、第2の導電部材および第2のグランドパッドを介して接地され、グランド電位とされている。 The sensor 20 further includes a first conductive member such as an anisotropic conductive film (ACF) connecting the first ground pad of the sensor electrode layer 30 and the metal layer 21, and a second ground of the sensor electrode layer 30. A second conductive member such as an ACF connecting the pad and the metal layer 22 is provided. The metal layer 21 is grounded via the first conductive member and the first ground pad, and is set to the ground potential. The metal layer 22 is grounded via the second conductive member and the second ground pad, and is set to the ground potential.
(金属層)
 金属層21、22は、いわゆるリファレンス電極であり、接地されてグランド電位となっている。金属層21、22は、例えば、可撓性を有する金属板である。金属層21、22は、例えば、アルミニウム、チタン、亜鉛、ニッケル、マグネシウム、銅、鉄等の単体、またはこれらを2種以上含む合金を含む。合金の具体例としては、ステンレス鋼(Stainless Used Steel:SUS)、アルミニウム合金、マグネシウム合金、チタン合金等が挙げられる。
(Metal layer)
The metal layers 21 and 22 are so-called reference electrodes and are grounded to be at the ground potential. The metal layers 21 and 22 are, for example, flexible metal plates. The metal layers 21 and 22 include, for example, a single element such as aluminum, titanium, zinc, nickel, magnesium, copper, iron, or an alloy containing two or more of these. Specific examples of the alloy include stainless steel (Stainless Used Steel: SUS), an aluminum alloy, a magnesium alloy, a titanium alloy and the like.
(支持体)
 複数の支持体23は、センシング部SEの両端に対応する位置にて金属層21を支持可能なように、センサ20の長手方向に所定の間隔離して一列に配置されている。具体的には、支持体23は、センサ20の厚さ方向(Z軸方向)において、隣接するセンシング部SE間の位置に重なるように設けられている。支持体23は、例えば、絶縁性を有する接着剤または両面接着テープにより構成される。接着剤としては、例えば、紫外線硬化樹脂または熱硬化樹脂等を用いることができる。支持体23は、センシング面20Sに加わる圧力により弾性変形してもよい。
(Support)
The plurality of supports 23 are arranged in a row at predetermined intervals in the longitudinal direction of the sensor 20 so as to support the metal layer 21 at positions corresponding to both ends of the sensing unit SE. Specifically, the support 23 is provided so as to overlap the position between the adjacent sensing units SE in the thickness direction of the sensor 20 (Z-axis direction). The support 23 is made of, for example, an insulating adhesive or a double-sided adhesive tape. As an adhesive agent, an ultraviolet-ray cured resin, a thermosetting resin, etc. can be used, for example. The support 23 may be elastically deformed by the pressure applied to the sensing surface 20S.
(接着層)
 接着層24は、支持層の一例であり、金属層22とセンサ電極層30とを貼り合わせると共に、金属層22とセンサ電極層30との間が離間するように、センサ電極層30を金属層22の一方の主面にて支持する。接着層24は、例えば、絶縁性を有する接着剤または両面接着テープにより構成される。接着層24は、センシング面20Sに加わる圧力により弾性変形してもよい。両面接着テープの具体例としては、日栄化工株式会社の商品名Neo Fixの両面テープが挙げられる。なお、本明細書において、粘着(pressure sensitive adhesion)は接着(adhesion)の一種と定義する。この定義に従えば、粘着層は接着層の一種と見なされる。
(Adhesive layer)
The adhesive layer 24 is an example of a support layer, and the sensor electrode layer 30 is a metal layer so that the metal layer 22 and the sensor electrode layer 30 are separated while bonding the metal layer 22 and the sensor electrode layer 30 together. It supports on one main surface of 22. The adhesive layer 24 is made of, for example, an insulating adhesive or a double-sided adhesive tape. The adhesive layer 24 may be elastically deformed by the pressure applied to the sensing surface 20S. As a specific example of the double-sided adhesive tape, there is a double-sided tape of Neo Fix, trade name, manufactured by NIHON KAKO CORPORATION. In the present specification, pressure sensitive adhesion is defined as a type of adhesion. According to this definition, the adhesive layer is considered as a kind of adhesive layer.
(センサ電極層)
 センサ電極層30は、図6に示すように、基材31と、基材31の一方の主面に設けられた第1、第2電極32、33とを備え、これらの第1、第2電極32、33によりセンシング部SEが構成されている。また、センサ電極層30は、基材31の一方の主面にセンシング部SE1~SE7の周囲を囲むように設けられた線状のグランド電極34を備える。さらに、センサ電極層30は、センサ電極層30の一方の主面に、第1、第2電極32、33およびグランド電極34を覆うカバーレイフィルム等の絶縁層(図示せず)を備えるようにしてもよい。
(Sensor electrode layer)
As shown in FIG. 6, the sensor electrode layer 30 includes a base 31 and first and second electrodes 32 and 33 provided on one main surface of the base 31. The electrodes 32 and 33 constitute a sensing unit SE. In addition, the sensor electrode layer 30 includes a linear ground electrode 34 provided on one main surface of the base 31 so as to surround the sensing portions SE1 to SE7. Further, the sensor electrode layer 30 is provided with an insulating layer (not shown) such as a coverlay film covering the first and second electrodes 32 and 33 and the ground electrode 34 on one main surface of the sensor electrode layer 30. May be
 基材31は、高分子樹脂を含み、可撓性を有する基板またはフィルムである。高分子樹脂は、例えば、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリカーボネート(PC)、アクリル樹脂(PMMA)、ポリイミド(PI)、トリアセチルセルロース(TAC)、ポリエステル、ポリアミド(PA)、アラミド、ポリエチレン(PE)、ポリアクリレート、ポリエーテルスルフォン、ポリスルフォン、ポリプロピレン(PP)、ジアセチルセルロース、ポリ塩化ビニル、エポキシ樹脂、尿素樹脂、ウレタン樹脂、メラミン樹脂、環状オレフィンポリマー(COP)およびノルボルネン系熱可塑性樹脂のうちの少なくとも1種を含む。 The substrate 31 is a flexible substrate or film containing a polymer resin. Examples of the polymer resin include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), acrylic resin (PMMA), polyimide (PI), triacetyl cellulose (TAC), polyester, polyamide (PA), Aramid, polyethylene (PE), polyacrylate, polyethersulfone, polysulfone, polypropylene (PP), diacetylcellulose, polyvinyl chloride, epoxy resin, urea resin, urethane resin, melamine resin, cyclic olefin polymer (COP) and norbornene system It contains at least one kind of thermoplastic resin.
 第1、第2電極32、33は、櫛歯状を有し、櫛歯の部分を噛み合わせるようにして配置されている。具体的には、第1電極32は、線状を有する複数のサブ電極32Aを備える。第2電極33は、線状を有する複数のサブ電極33Aを備える。複数のサブ電極32A、33Aは、X軸方向に延設され、Y軸方向に向かって所定間隔で交互に離間して設けられている。隣接するサブ電極32A、33Aは、容量結合を形成可能に構成されている。 The first and second electrodes 32 and 33 have a comb-like shape, and are disposed such that the portions of the comb teeth are engaged with each other. Specifically, the first electrode 32 includes a plurality of linear sub-electrodes 32A. The second electrode 33 includes a plurality of linear sub-electrodes 33A. The plurality of sub electrodes 32A, 33A extend in the X-axis direction, and are provided alternately at predetermined intervals in the Y-axis direction. Adjacent sub-electrodes 32A, 33A are configured to be able to form capacitive coupling.
 隣接するサブ電極32A、33Aは、相互容量方式の2つの電極として動作するほか、自己容量方式の1つの電極として動作することもできる。また、隣接するサブ電極32A、33Aとの間の結合による静電容量を利用して、センシング兼LC共振回路の共振用のコンデンサーとして用いることができる。 The adjacent sub-electrodes 32A and 33A operate as two electrodes of mutual capacitance system and can also operate as one electrode of self-capacitance system. In addition, it can be used as a capacitor for resonance of the sensing and LC resonance circuit by utilizing the electrostatic capacitance by the coupling between the adjacent sub electrodes 32A and 33A.
 相互容量方式では、IC12Aは、センシング部SEに対する金属層21の近接を、センシング部SEの静電容量の変化、具体的には第1、第2電極32、33間の静電容量変化により検出する。なお、IC12Aでは、センシング部SEに対する金属層21の近接は、第1、第2電極32、33間の静電容量の減少として検出される。 In the mutual capacitance method, the IC 12A detects the proximity of the metal layer 21 to the sensing unit SE by a change in capacitance of the sensing unit SE, specifically, a change in capacitance between the first and second electrodes 32 and 33. Do. In the IC 12A, the proximity of the metal layer 21 to the sensing part SE is detected as a decrease in capacitance between the first and second electrodes 32 and 33.
(弾性体)
 弾性体51は、側壁部11Rに加えられる圧力により弾性変形可能に構成されている。センサ20の裏面とスペーサ52との間に弾性体51が挟まれていることで、センサ20の荷重感度におけるダイナミックレンジを向上することができる。
(Elastic body)
The elastic body 51 is configured to be elastically deformable by the pressure applied to the side wall portion 11R. By the elastic body 51 being sandwiched between the back surface of the sensor 20 and the spacer 52, the dynamic range in the load sensitivity of the sensor 20 can be improved.
 弾性体51は、例えば、発泡樹脂または絶縁性エラストマ等の誘電体を含んでいる。発泡樹脂は、いわゆるスポンジであり、例えば、発泡ポリウレタン、発泡ポリエチレン、発泡ポリオレフィンおよびスポンジゴム等のうちの少なくとも1種である。絶縁性エラストマは、例えば、シリコーン系エラストマ、アクリル系エラストマ、ウレタン系エラストマおよびスチレン系エラストマ等のうちの少なくとも1種である。なお、弾性体51が図示しない基材上に設けられていてもよい。 The elastic body 51 contains, for example, a dielectric such as a foamed resin or an insulating elastomer. The foamed resin is a so-called sponge, and is, for example, at least one of foamed polyurethane, foamed polyethylene, foamed polyolefin, sponge rubber and the like. The insulating elastomer is, for example, at least one of a silicone elastomer, an acrylic elastomer, a urethane elastomer, and a styrene elastomer. In addition, the elastic body 51 may be provided on the base material which is not shown in figure.
 弾性体51の厚みは、好ましくは10μm以上1000μm以下である。弾性体51の厚みが10μm未満であると、弾性体51の機能が低下する虞がある。一方、弾性体51の厚みが1000μmを超えると、微小変形感度が低下する虞がある。 The thickness of the elastic body 51 is preferably 10 μm or more and 1000 μm or less. If the thickness of the elastic body 51 is less than 10 μm, the function of the elastic body 51 may be degraded. On the other hand, when the thickness of the elastic body 51 exceeds 1000 μm, there is a possibility that the micro deformation sensitivity may be reduced.
 なお、図4では、弾性体51がフィルム状を有し、センサ20の裏面の全体に設けられている例が示されているが、弾性体51の形状はこれに限定されるものではなく、所定の形状パターンを有し、センサ20の裏面に部分的に設けられていてもよい。形状パターンは、規則的であってもよいし、不規則的であってもよい。形状パターンとしては、例えば、ストライプ状、メッシュ状、放射状、幾何学模様状、ミアンダ状、同心状、螺旋状、蜘蛛の巣状、ツリー状、魚の骨状、リング状、格子状または不定形状等が挙げられるが、これに限定されるものではない。 Although FIG. 4 shows an example in which the elastic body 51 has a film shape and is provided on the entire back surface of the sensor 20, the shape of the elastic body 51 is not limited to this. It may have a predetermined shape pattern and be partially provided on the back surface of the sensor 20. The shape pattern may be regular or irregular. As the shape pattern, for example, stripe, mesh, radial, geometric pattern, meander, concentric, spiral, spider web, tree, fish bone, ring, lattice or irregular shape etc. However, it is not limited thereto.
(スペーサ)
 スペーサ52は、弾性体51と溝部14の内側面との間に圧入されている。このようにスペーサ52が圧入されていることで、溝部14やセンサ20等の寸法のバラツキ(公差)により生じる隙間を抑制することができる。スペーサ52の幅方向の一端(溝部14の底部に対向する一端)は、圧入を容易とするために、楔状となっている。スペーサ52は、弾性体51よりも高い弾性率を有している。スペーサ52は、例えば金属板、樹脂板またはそれらを積層した積層板等である。
(Spacer)
The spacer 52 is press-fitted between the elastic body 51 and the inner side surface of the groove portion 14. By press-fitting the spacer 52 in this manner, it is possible to suppress a gap generated due to a variation (a tolerance) in the dimensions of the groove portion 14 or the sensor 20 and the like. One end in the width direction of the spacer 52 (one end facing the bottom of the groove portion 14) has a bowl shape in order to facilitate press-fitting. The spacer 52 has a higher elastic modulus than the elastic body 51. The spacer 52 is, for example, a metal plate, a resin plate, or a laminated plate obtained by laminating them.
 スペーサ52の両主面のうち、溝部14の内側面と対向する側の主面の両端には、突出部52A、52Bが設けられている。これらの突出部52A、52Bがそれぞれ、溝部14の両端に設けられた窪み14A、14Bに嵌め合わされる。 Protrusions 52A and 52B are provided at both ends of the main surface of the spacer 52 on the side facing the inner side surface of the groove 14 among the main surfaces. The protrusions 52A and 52B are fitted into the recesses 14A and 14B provided at both ends of the groove 14, respectively.
(基板)
 基板12は、電子機器10のメイン基板であり、コントローラIC(Integrated Circuit)(以下単に「IC」という。)12Aと、メインCPU(Central Processing Unit)(以下単に「CPU」という。)12Bとを備える。IC12Aは、センサ20を制御し、センシング面20Sに加わる圧力を検出する制御部である。CPU12Bは、電子機器10の全体を制御する制御部である。例えば、CPU12Bは、IC12Aから供給される検出信号に基づき、各種処理を実行する。
(substrate)
The substrate 12 is a main substrate of the electronic device 10, and a controller IC (Integrated Circuit) (hereinafter referred to simply as "IC") 12A and a main CPU (Central Processing Unit) (hereinafter referred to simply as "CPU") 12B. Prepare. The IC 12A is a control unit that controls the sensor 20 and detects the pressure applied to the sensing surface 20S. The CPU 12 </ b> B is a control unit that controls the entire electronic device 10. For example, the CPU 12B executes various processes based on the detection signal supplied from the IC 12A.
(フロントパネル)
 フロントパネル13は表示装置13Aを備え、この表示装置13Aの表面には静電容量式のタッチパネルが設けられている。表示装置13Aは、CPU12Bから供給される映像信号等に基づき、映像(画面)を表示する。表示装置13Aとしては、例えば、液晶ディスプレイ、エレクトロルミネッセンス(Electro Luminescence:EL)ディスプレイ等が挙げられるが、これに限定されるものではない。
(front panel)
The front panel 13 is provided with a display device 13A, and a capacitive touch panel is provided on the surface of the display device 13A. The display device 13A displays an image (screen) based on an image signal or the like supplied from the CPU 12B. Examples of the display device 13A include, but are not limited to, a liquid crystal display and an Electro Luminescence (EL) display.
[電子機器の回路構成]
 図7は、第1の実施形態に係る電子機器の回路構成を示すブロック図である。電子機器10は、図7に示すように、センサ20と、CPU12Bと、IC12Aと、GPS部61と、無線通信部62と、音声処理部63と、マイクロフォン64と、スピーカ65と、NFC通信部66と、電源部67と、記憶部68と、バイブレータ69と、表示装置13Aと、モーションセンサ70と、カメラ71とを備える。
[Circuit configuration of electronic device]
FIG. 7 is a block diagram showing a circuit configuration of the electronic device according to the first embodiment. As shown in FIG. 7, the electronic device 10 includes a sensor 20, a CPU 12B, an IC 12A, a GPS unit 61, a wireless communication unit 62, an audio processing unit 63, a microphone 64, a speaker 65, an NFC communication unit And a power supply unit 67, a storage unit 68, a vibrator 69, a display device 13A, a motion sensor 70, and a camera 71.
 GPS部61は、GPS(Global Positioning System)と称されるシステムの衛星からの電波を受信して、現在位置の測位を行う測位部である。無線通信部62は、例えばBluetooth(登録商標)の規格で他の端末と近距離無線通信を行う。NFC通信部66は、NFC(Near Field Communication)の規格で、近接したリーダー/ライタと無線通信を行う。これらのGPS部61、無線通信部62およびNFC通信部66で得たデータは、CPU12Bに供給される。 The GPS unit 61 is a positioning unit that receives radio waves from satellites of a system called GPS (Global Positioning System) and measures the current position. The wireless communication unit 62 performs near field communication with another terminal according to, for example, the Bluetooth (registered trademark) standard. The NFC communication unit 66 performs wireless communication with a nearby reader / writer according to the NFC (Near Field Communication) standard. The data obtained by the GPS unit 61, the wireless communication unit 62, and the NFC communication unit 66 are supplied to the CPU 12B.
 音声処理部63には、マイクロフォン64とスピーカ65とが接続され、音声処理部63が、無線通信部62等での無線通信で接続された相手と通話の処理を行う。また、音声処理部63は、音声入力操作のための処理を行うこともできる。 The microphone 64 and the speaker 65 are connected to the voice processing unit 63, and the voice processing unit 63 performs processing of a call with the other party connected by wireless communication in the wireless communication unit 62 or the like. Further, the voice processing unit 63 can also perform processing for voice input operation.
 電源部67は、電子機器10に備えられたCPU12Bや表示装置13A等に電力を供給する。電源部67は、リチウムイオン二次電池等の二次電池、およびこの二次電池に対する充放電を制御する充放電制御回路等を備える。なお、図7には示さないが、電子機器10は、二次電池を充電するための端子を備える。 The power supply unit 67 supplies power to the CPU 12B, the display device 13A, and the like provided in the electronic device 10. The power supply unit 67 includes a secondary battery such as a lithium ion secondary battery, and a charge / discharge control circuit that controls charging / discharging of the secondary battery. Although not shown in FIG. 7, the electronic device 10 includes a terminal for charging the secondary battery.
 記憶部68は、RAM(Random Access Memory)等であり、OS(Operating System)、アプリケーション、動画、画像、音楽および文書等の各種データを記憶する。 The storage unit 68 is a random access memory (RAM) or the like, and stores various data such as an operating system (OS), an application, a moving image, an image, music, and a document.
 バイブレータ69は、電子機器10を振動させる部材である。例えば、電子機器10は、バイブレータ69により電子機器10を振動して、電話の着信や電子メールの受信等を通知する。 The vibrator 69 is a member that vibrates the electronic device 10. For example, the electronic device 10 vibrates the electronic device 10 by the vibrator 69 to notify of an incoming call, an e-mail reception, and the like.
 表示装置13Aは、CPU12Bから供給される映像信号等に基づき、各種画面を表示する。また、表示装置13Aの表示面に対するタッチ操作に応じた信号をCPU12Bに供給する。 The display device 13A displays various screens based on the video signal and the like supplied from the CPU 12B. Further, a signal corresponding to the touch operation on the display surface of the display device 13A is supplied to the CPU 12B.
 モーションセンサ70は、電子機器10を保持するユーザの動きを検出する。モーションセンサ70としては、加速度センサ、ジャイロセンサ、電子コンパス、気圧センサ等が使用される。 The motion sensor 70 detects the movement of the user holding the electronic device 10. As the motion sensor 70, an acceleration sensor, a gyro sensor, an electronic compass, an atmospheric pressure sensor or the like is used.
 カメラ71は、レンズ群およびCMOS(Complementary Metal Oxide Semiconductor)等の撮像素子を備え、CPU12Bの制御に基づき静止画または動画等の画像を撮影する。撮影された静止画や動画等は記憶部68に記憶される。 The camera 71 includes a lens group and an imaging element such as a complementary metal oxide semiconductor (CMOS), and captures an image such as a still image or a moving image based on the control of the CPU 12B. The photographed still image, moving image, and the like are stored in the storage unit 68.
 センサ20は、高感度かつ位置分解能の高い圧力センサであり、センシング面20Sに対する押圧操作に応じた静電容量を検出し、それに応じた出力信号をIC12Aに出力する。 The sensor 20 is a pressure sensor with high sensitivity and high position resolution, detects a capacitance corresponding to a pressing operation on the sensing surface 20S, and outputs an output signal according to the detection to the IC 12A.
 IC12Aは、センサ20を制御するためのファームウェアを記憶しており、センサ20が有する各センシング部SEの静電容量の変化(圧力)を検出し、その結果に応じた信号をCPU12Bに出力する。 The IC 12A stores firmware for controlling the sensor 20, detects a change (pressure) in capacitance of each sensing unit SE of the sensor 20, and outputs a signal corresponding to the result to the CPU 12B.
 CPU12Bは、IC12Aから供給される検出信号に基づき、各種の処理を実行する。また、CPU12Bは、GPS部61、無線通信部62、NFC通信部66およびモーションセンサ70等から供給されるデータを処理する。 The CPU 12B executes various processes based on the detection signal supplied from the IC 12A. In addition, the CPU 12B processes data supplied from the GPS unit 61, the wireless communication unit 62, the NFC communication unit 66, the motion sensor 70, and the like.
[筐体に加えられる各種変形と検出信号の関係]
 図8Aに示すように規定の押圧位置にあるボタンBT2が押圧された場合には、図8Bに示すようにボタンBT2に対応するセンシング部SE4の検出信号S4のレベルが、閾値Aを超えると共に、センシング部SE1~SE7それぞれの検出信号S1~S7のうちで最も高くなる。
[Relationship between various deformations applied to housing and detection signal]
When the button BT2 at the prescribed pressing position is pressed as shown in FIG. 8A, the level of the detection signal S4 of the sensing unit SE4 corresponding to the button BT2 exceeds the threshold A as shown in FIG. 8B. The highest among the detection signals S1 to S7 of the sensing units SE1 to SE7.
 図9Aに示すように電子機器10に曲げが加えられた場合には、図9Bに示すようにセンシング部SE1~SE7それぞれの検出信号S1~S7のうち少なくとも1つの検出信号が閾値-Bを超える。また、図10Aに示すように電子機器10にねじりが加えられた場合にも、図10Bに示すようにセンシング部SE1~SE7の検出信号S1~S7のうち少なくとも1つの検出信号が閾値-Bを超える。 When bending is applied to the electronic device 10 as shown in FIG. 9A, at least one detection signal out of the detection signals S1 to S7 of each of the sensing units SE1 to SE7 exceeds the threshold -B as shown in FIG. 9B. . Further, even when twisting is applied to the electronic device 10 as shown in FIG. 10A, at least one of the detection signals S1 to S7 of the sensing units SE1 to SE7 has a threshold value -B as shown in FIG. 10B. Over.
 図11Aに示すようにボタンBT2、BT3の間が押圧された場合には、図11Bに示すようにボタンBT2、BT3の間の位置に対応するセンシング部SE5の検出信号S5が閾値Aを超えると共に、センシング部SE1~SE7それぞれの検出信号S1~S7のうちで最も高くなる。 When button BT2 and BT3 are pressed as shown in FIG. 11A, detection signal S5 of sensing unit SE5 corresponding to the position between button BT2 and BT3 exceeds threshold A as shown in FIG. 11B. The highest among the detection signals S1 to S7 of the sensing units SE1 to SE7.
[電子機器の動作]
 図12を参照して、第1の実施形態に係る電子機器10の動作について説明する。
 まず、ステップS11において、IC12Aはセンシング部SE1~SE7を順次スキャンし、センシング部SE1~SE7それぞれの検出信号S1~S7を取得し、CPU12Bに供給する。
[Operation of electronic device]
The operation of the electronic device 10 according to the first embodiment will be described with reference to FIG.
First, in step S11, the IC 12A sequentially scans the sensing units SE1 to SE7, acquires detection signals S1 to S7 of the sensing units SE1 to SE7, and supplies the detection signals S1 to S7 to the CPU 12B.
 次に、ステップS12において、CPU12Bは、IC12Aから供給された検出信号S1~S7のうち少なくとも1つの信号が閾値-Bを超えている否かを判別する。なお、閾値-Bは、規定の押圧位置にあるボタンBT1、BT2、BT3の押圧を判別するための閾値Aとは極性が反対である。ステップS12にて検出信号S1~S7のうちの少なくとも1つの信号が閾値-Bを超えていると判別された場合(図9B、10B参照)には、ステップS13において、CPU12Bは、電子機器10に曲げまたはねじり(図9A、10A参照)が加えられていると判断する。そして、ステップS14において、CPU12Bは、電子機器10に曲げまたはねじりが加えられていることをユーザに警告する画面(図13A参照)を表示装置13Aに表示し、処理をステップS11に戻す。なお、上記警告画面に関する画像データは、記憶部68に記憶されており、CPU12Bによりこの画像データが読み出され、表示装置13Aに表示される。 Next, in step S12, the CPU 12B determines whether at least one of the detection signals S1 to S7 supplied from the IC 12A exceeds the threshold value -B. The threshold value -B is opposite in polarity to the threshold value A for determining the pressing of the buttons BT1, BT2 and BT3 at the prescribed pressing position. If it is determined in step S12 that at least one of the detection signals S1 to S7 exceeds the threshold -B (see FIGS. 9B and 10B), the CPU 12B sends the electronic device 10 to the electronic device 10 in step S13. It is determined that bending or twisting (see FIGS. 9A and 10A) is applied. Then, in step S14, the CPU 12B displays a screen (see FIG. 13A) for warning the user that bending or twisting is applied to the electronic device 10 on the display device 13A, and returns the process to step S11. The image data relating to the warning screen is stored in the storage unit 68, and the image data is read by the CPU 12B and displayed on the display device 13A.
 ステップS12にて検出信号S1~S7のうち少なくとも1つの信号が閾値-Bを超えていないと判別された場合には、ステップS15において、CPU12Bは、IC12Aから供給された検出信号S1~S7のうちの少なくとも1つの信号が閾値Aを超えているか否かを判別する。 If it is determined in step S12 that at least one of the detection signals S1 to S7 does not exceed the threshold value -B, the CPU 12B selects one of the detection signals S1 to S7 supplied from the IC 12A in step S15. It is determined whether or not at least one signal of the signal A exceeds the threshold A.
 ステップS15にて検出信号S1~S7のうちの少なくとも1つの信号が閾値Aを超えていると判別された場合には、ステップS16において、CPU12Bは、閾値Aを超える検出信号のうち最も信号レベルが高い検出信号が、センシング部SE2、SE4、SE6(すなわちボタンBT1、BT2、BT3)のいずれかに対応するものであるか否かを判別する。ステップS15にて検出信号S1~S7のうちの少なくとも1つの信号が閾値Aを超えていないと判別された場合には、CPU12Bは、処理をステップS11に戻す。 When it is determined in step S15 that at least one of the detection signals S1 to S7 exceeds the threshold A, the CPU 12B determines that the signal level of the detection signals exceeding the threshold A is the highest in step S16. It is determined whether the high detection signal corresponds to any one of the sensing units SE2, SE4, and SE6 (that is, the buttons BT1, BT2, and BT3). If it is determined in step S15 that at least one of the detection signals S1 to S7 does not exceed the threshold A, the CPU 12B returns the process to step S11.
 ステップS16にて最も信号レベルが高い検出信号が、センシング部SE2、SE4、SE6のいずれかに対応するものであると判別された場合(図8B参照)には、ステップS17において、CPU12Bは、センシング部SE2、SE4、SE6のうち、最も信号レベルが高い検出信号が検出されたセンシング部SE(図8A参照)に対応する処理を実行する。 If it is determined in step S16 that the detection signal with the highest signal level corresponds to any of the sensing units SE2, SE4, and SE6 (see FIG. 8B), the CPU 12B performs sensing in step S17. The processing corresponding to the sensing unit SE (see FIG. 8A) in which the detection signal having the highest signal level is detected among the units SE2, SE4, and SE6 is executed.
 ステップS16にて最も信号レベルが高い検出信号が、センシング部SE2、SE4、SE6のいずれかに対応するものでないと判別された場合(図11B参照)には、ステップS18において、CPU12Bは、規定の位置が押圧されていない、具体的にはボタンBT1、BT2間、またはボタンBT2、BT3間に対応する位置が押圧されていると判断する(図11A参照)。そして、ステップS19において、CPU12Bは、規定の位置が押圧されていない、具体的にはボタンBT1、BT2間、またはボタンBT2、BT3間が押圧されていることをユーザに警告する画面(図13B参照)を表示し、処理をステップS11に戻す。なお、上記警告画面に関する画像データは、記憶部68に記憶されており、CPU12Bによりこの画像データが読み出され、表示装置13Aに表示される。 If it is determined in step S16 that the detection signal with the highest signal level does not correspond to any of the sensing units SE2, SE4, and SE6 (see FIG. 11B), the CPU 12B determines in step S18 that It is determined that the position not pressed, specifically, the corresponding position between the buttons BT1 and BT2 or the buttons BT2 and BT3 is pressed (see FIG. 11A). Then, in step S19, the CPU 12B warns the user that the prescribed position is not pressed, specifically, between the buttons BT1 and BT2 or between the buttons BT2 and BT3 (see FIG. 13B). ) Is displayed, and the process returns to step S11. The image data relating to the warning screen is stored in the storage unit 68, and the image data is read by the CPU 12B and displayed on the display device 13A.
[効果]
 第1の実施形態に係る電子機器10は、筐体11と、側壁部11Rの内側面11SBに設けられ、側壁部11Rの変形を検出する複数のセンシング部SEを有するセンサ20とを備える。複数のセンシング部SEは、規定のユーザ操作を検出するためのセンシング部SE2、SE4、SE6、および電子機器10の誤動作を補償するためのセンシング部SE1、SE3、SE5、SE7を有する。これにより、電子機器10の誤動作を抑制することができる。
[effect]
The electronic device 10 according to the first embodiment includes the housing 11 and the sensor 20 provided on the inner side surface 11SB of the side wall 11R and having a plurality of sensing units SE that detect deformation of the side wall 11R. The plurality of sensing units SE have sensing units SE2, SE4, SE6 for detecting a prescribed user operation, and sensing units SE1, SE3, SE5, SE7 for compensating for the malfunction of the electronic device 10. Thereby, the malfunction of the electronic device 10 can be suppressed.
[変形例]
(変形例1)
 図14に示すように、センサ20が、接着層24に代えて、柱状を有する複数の支持体25を備えるようにしてもよい。複数の支持体25は、金属層22とセンサ電極層30との主面間に設けられ、金属層22とセンサ電極層30との間が離間するように、金属層22をセンサ電極層30の他方の主面にて支持する。複数の支持体25により、金属層22とセンサ電極層30との主面間に支持層が構成されている。複数の支持体25はそれぞれ、センサ20の厚さ方向に複数の支持体23と重なる位置に設けられている。支持体25は、例えば、絶縁性を有する接着剤または両面接着テープにより構成される。接着剤としては、例えば、紫外線硬化樹脂または熱硬化樹脂等を用いることができる。支持体25は、センシング面20Sに加わる圧力により弾性変形してもよい。
[Modification]
(Modification 1)
As shown in FIG. 14, the sensor 20 may be provided with a plurality of supports 25 having a columnar shape instead of the adhesive layer 24. The plurality of supports 25 are provided between the main surfaces of the metal layer 22 and the sensor electrode layer 30, and the metal layer 22 is formed of the sensor electrode layer 30 so that the metal layer 22 and the sensor electrode layer 30 are separated. It supports on the other main surface. The plurality of supports 25 form a support layer between the main surfaces of the metal layer 22 and the sensor electrode layer 30. The plurality of supports 25 are provided at positions overlapping with the plurality of supports 23 in the thickness direction of the sensor 20. The support 25 is made of, for example, an insulating adhesive or a double-sided adhesive tape. As an adhesive agent, an ultraviolet-ray cured resin, a thermosetting resin, etc. can be used, for example. The support 25 may be elastically deformed by the pressure applied to the sensing surface 20S.
 また、センサ20が、複数の支持体23に代えて、センシング面20Sに加わる圧力により弾性変形する弾性層を備えるようにしてもよい。この弾性層は、発泡樹脂または絶縁性エラストマ等を含んでいる。発泡樹脂は、いわゆるスポンジであり、例えば、発泡ポリウレタン、発泡ポリエチレン、発泡ポリオレフィンおよびスポンジゴム等のうちの少なくとも1種である。絶縁性エラストマは、例えば、シリコーン系エラストマ、アクリル系エラストマ、ウレタン系エラストマおよびスチレン系エラストマ等のうちの少なくとも1種である。 Further, the sensor 20 may be provided with an elastic layer elastically deformed by pressure applied to the sensing surface 20S instead of the plurality of supports 23. The elastic layer contains, for example, a foamed resin or an insulating elastomer. The foamed resin is a so-called sponge, and is, for example, at least one of foamed polyurethane, foamed polyethylene, foamed polyolefin, sponge rubber and the like. The insulating elastomer is, for example, at least one of a silicone elastomer, an acrylic elastomer, a urethane elastomer, and a styrene elastomer.
 また、センサ20が、接着層24に代えて弾性層を備えるようにしてもよい。この弾性層の材料としては、上述の弾性層と同様のものを例示することができる。 Also, the sensor 20 may be provided with an elastic layer instead of the adhesive layer 24. As a material of this elastic layer, the thing similar to the above-mentioned elastic layer can be illustrated.
(変形例2)
 図15Aに示すように、センサ20が、センシング面20Sに複数の凸部26を備えるようにしてもよい。凸部26は、ユーザ操作検出用のセンシング部SE2、SE4、SE6に対応する位置に設けられている。具体的には、凸部26は、センサ20の厚さ方向にセンシング部SE2、SE4、SE6と重なるように設けられている。なお、凸部26が、センシング面20Sに代えて、側壁部11Rの内側面11SBに設けられていてもよい。
(Modification 2)
As shown in FIG. 15A, the sensor 20 may be provided with a plurality of convex portions 26 on the sensing surface 20S. The convex portion 26 is provided at a position corresponding to the sensing units SE2, SE4, and SE6 for detecting a user operation. Specifically, the convex portion 26 is provided so as to overlap the sensing portions SE2, SE4, and SE6 in the thickness direction of the sensor 20. The convex portion 26 may be provided on the inner side surface 11SB of the side wall portion 11R instead of the sensing surface 20S.
 また、図15Aに示すように、センサ20が、裏面に複数の凸部27を備えるようにしてもよい。凸部27は、誤動作補償用のセンシング部SE1、SE3、SE5、SE7に対応する位置に設けられている。具体的には、凸部27は、センサ20の厚さ方向にセンシング部SE1、SE3、SE5、SE7と重なるように設けられている。なお、凸部27が、センサ20の裏面に代えて、センサ20の裏面に対向する、弾性体51の表面に設けられていてもよい。 Further, as shown in FIG. 15A, the sensor 20 may be provided with a plurality of convex portions 27 on the back surface. The convex portion 27 is provided at a position corresponding to the sensing units SE1, SE3, SE5, and SE7 for malfunction compensation. Specifically, the convex portion 27 is provided so as to overlap the sensing portions SE1, SE3, SE5, and SE7 in the thickness direction of the sensor 20. The convex portion 27 may be provided on the surface of the elastic body 51 facing the back surface of the sensor 20 instead of the back surface of the sensor 20.
 筐体11または溝部14が金属を含む場合には、図15Bに示すように、センサ20が、金属層21、22および複数の支持体23、25を備えていなくてもよい。 When the housing 11 or the groove portion 14 includes a metal, as shown in FIG. 15B, the sensor 20 may not include the metal layers 21 and 22 and the plurality of supports 23 and 25.
 図15Aに示す構成を有するセンサでは、図16Aに矢印で示すように、底部11Mが押圧された場合には、溝部14を介して側壁部11Rと対向する壁部14Cが、側壁部11Rに向けて変形する。このため、センサ20の裏面が凸部27を介して押圧される。これにより、IC12Aでは、誤動作補償用のセンシング部SE1、SE3、SE5、SE7それぞれにて検出信号S1、S3、S5、S7の増加が検出される(図16B参照)。したがって、CPU12Bは、検出信号S1、S3、S5、S7の少なくとも1つの信号が閾値Cを超えているか否かを判別することで、底部11Mに変形が加えられているか否かを判別できる。すなわち、CPU12Bは、検出信号S1、S3、S5、S7の少なくとも1つの信号が閾値Cを超えている場合には、底部11Mに変形が加えられていると判別し、検出信号S1、S3、S5、S7の少なくとも1つの信号が閾値Cを超えていない場合には、底部11Mに変形が加えられていないと判別することができる。 In the sensor having the configuration shown in FIG. 15A, as shown by the arrow in FIG. 16A, when the bottom 11M is pressed, the wall 14C facing the side wall 11R via the groove 14 faces the side wall 11R. To transform. Therefore, the back surface of the sensor 20 is pressed via the convex portion 27. Thereby, in the IC 12A, an increase in the detection signals S1, S3, S5, and S7 is detected in the sensing units SE1, SE3, SE5, and SE7 for malfunction compensation (see FIG. 16B). Therefore, the CPU 12B can determine whether the bottom portion 11M is deformed by determining whether at least one of the detection signals S1, S3, S5, and S7 exceeds the threshold C. That is, when at least one of the detection signals S1, S3, S5, and S7 exceeds the threshold C, the CPU 12B determines that the bottom 11M is deformed, and the detection signals S1, S3, and S5. , And at least one signal of S7 does not exceed the threshold C, it can be determined that the bottom 11M is not deformed.
 なお、電子機器10にひねりが加えられた場合にも、溝部14を介して側壁部11Rと対向する壁部14Cが、側壁部11Rに向けて変形する。したがって、CPU12Bは、底部11Mが押圧された場合と同様にして、電子機器10にひねりが加えられたことも判別できる。 Even when a twist is applied to the electronic device 10, the wall 14C facing the side wall 11R via the groove 14 deforms toward the side wall 11R. Therefore, the CPU 12B can also determine that a twist is applied to the electronic device 10, as in the case where the bottom 11M is pressed.
 また、ボタンBT1、BT2、BT3のいずれかが押圧された場合には、センサ20のセンシング面20Sが凸部26を介して押圧される。これにより、IC12Aでは、ユーザ操作検出用のセンシング部SE2、SE4、SE6それぞれにて検出信号S2、S4、S6の増加が検出される。したがって、CPU12Bは、検出信号S1~S7のうち、閾値Aを超える信号があり、かつ閾値Aを超えた信号がセンシング部SE2、SE4、SE6のいずれかの信号であるか否かを判別するとで、ボタンBT1、BT2、BT3の押圧を検出することができる。 When any of the buttons BT1, BT2 and BT3 is pressed, the sensing surface 20S of the sensor 20 is pressed via the convex portion 26. As a result, in the IC 12A, an increase in the detection signals S2, S4, and S6 is detected in each of the sensing units SE2, SE4, and SE6 for detecting a user operation. Therefore, the CPU 12B determines whether or not there is a signal exceeding the threshold A among the detection signals S1 to S7, and which of the sensing units SE2, SE4, and SE6 is a signal exceeding the threshold A. , And pressing of the buttons BT1, BT2, and BT3 can be detected.
(変形例3)
 センサ20が金属層21、22に代えて導電性基材を備えるようにしてもよい。導電性基材は、基材と、この基材の一方の主面に設けられた金属層とを備える。基材は、板状またはフィルム状を有している。導電性基材としては、PETフィルムと金属層とを備える導電性フィルム(例えばパナック株式会社製のアルペット(登録商標))が好ましい。また、センサ20が金属層21、22以外の導電層を備えるようにしてもよい。金属層21、22以外の導電層としては、例えば、炭素粉末および金属粉末の少なくとも1種を含むフィルムまたは基板を用いることができる。
(Modification 3)
The sensor 20 may be provided with a conductive substrate instead of the metal layers 21 and 22. The conductive substrate comprises a substrate and a metal layer provided on one major surface of the substrate. The substrate has a plate or film shape. As the conductive substrate, a conductive film (for example, Alpet (registered trademark) manufactured by PANAC Corporation) including a PET film and a metal layer is preferable. In addition, the sensor 20 may include a conductive layer other than the metal layers 21 and 22. As a conductive layer other than the metal layers 21 and 22, for example, a film or a substrate containing at least one of carbon powder and metal powder can be used.
(変形例4)
 IC12Aは、図17Aに示すように、1サイクルのスキャンで全てのセンシング部SE1~SE7をスキャンしてもよいが、IC12Aのスキャン動作はこれに限定されるものではない。すなわち、図17Bに示すように、IC12Aが、1サイクルのスキャンで全てのユーザ操作検出用のセンシング部SE2、SE4、SE6をスキャンするのに対して、1サイクルのスキャンで誤動作補償用のセンシング部SE1、SE3、SE5、SE7のうちの1つのみをスキャンするようにしてもよい。この場合、4回のスキャンでセンシング部SE1、SE3、SE5、SE7が全てスキャンされる。図17Bに示すようなスキャン動作を採用するとで、1サイクルに要するスキャン時間を短縮化することができる。
(Modification 4)
As shown in FIG. 17A, the IC 12A may scan all the sensing parts SE1 to SE7 in one cycle of scanning, but the scan operation of the IC 12A is not limited to this. That is, as shown in FIG. 17B, the IC 12A scans all the sensing units SE2, SE4, and SE6 for detecting a user operation in one cycle of scanning, whereas the sensing unit for malfunction compensation in one cycle of scanning. Only one of SE1, SE3, SE5, and SE7 may be scanned. In this case, the sensing units SE1, SE3, SE5, and SE7 are all scanned in four scans. By adopting the scan operation as shown in FIG. 17B, the scan time required for one cycle can be shortened.
(変形例5)
 上述の第1の実施形態では、電子機器10が側壁部11Rの内側面11SBにセンサ20を備える構成について説明したが、電子機器10が側壁部11R、11Lの内側面11SB、11SBにそれぞれセンサ20、20を備えるようにしてもよい。また、壁部11Nの内側面(内周面)に1周に渡ってセンサ20を備えるようにしてもよい。また、筐体11の底部11Mの内側面にセンサ20を備えるようにしてもよいし、フロントパネル13の内側面にセンサ20を備えるようにしてもよい。
(Modification 5)
In the first embodiment described above, the electronic device 10 includes the sensor 20 on the inner side surface 11SB of the side wall portion 11R. However, the electronic device 10 includes the sensor 20 on the inner side surfaces 11SB and 11SB of the side wall portions 11R and 11L. , 20 may be provided. Further, the sensor 20 may be provided on the inner side surface (inner peripheral surface) of the wall portion 11N over one round. Further, the sensor 20 may be provided on the inner side surface of the bottom portion 11M of the housing 11, or the sensor 20 may be provided on the inner side surface of the front panel 13.
(変形例6)
 図18A、18Bに示すように、電子機器10が、センサ20と弾性体51とをそれぞれの主面が内側面11SBと平行になるように支持すると共に、弾性体51を介してセンサ20を内側面11SBに対して押し当てる支持部材53を備えるようにしてもよい。この場合、センサ20のセンシング面20Sに凸部26が設けられていてもよい。
(Modification 6)
As shown in FIGS. 18A and 18B, the electronic device 10 supports the sensor 20 and the elastic body 51 such that the main surfaces thereof are parallel to the inner side surface 11SB, and the sensor 20 is internally A support member 53 may be provided to press against the side surface 11SB. In this case, the convex portion 26 may be provided on the sensing surface 20S of the sensor 20.
 筐体11には、側壁部11Rの内側面11SBの近傍に孔部55A、55Bが所定の間隔離して設けられている。支持部材53は長尺の板状を有し、支持部材53の長手方向の両端には貫通孔53A、53Bが設けられている。支持部材53は、ネジ54A、54Bをそれぞれ貫通孔53A、53Bを通すようにして孔部55A、55Bに固定することで、内側面11SBの近傍に固定される。 Holes 55A and 55B are provided in the housing 11 in the vicinity of the inner side surface 11SB of the side wall 11R so as to be separated by a predetermined distance. The support member 53 has a long plate shape, and through holes 53A and 53B are provided at both ends of the support member 53 in the longitudinal direction. The support member 53 is fixed to the vicinity of the inner side surface 11SB by fixing the screws 54A and 54B to the holes 55A and 55B so as to pass the through holes 53A and 53B, respectively.
(変形例7)
 図19Aに示すように、センサ20Aが、誤動作補償用の第1、第2のセンシング部列20L1、20L2と、誤動作補償用の第1、第2のセンシング部列20L1、20L2の間に設けられたユーザ操作検出用のセンシング部列20L3とを備えるようにしてもよい。
(Modification 7)
As shown in FIG. 19A, the sensor 20A is provided between the first and second sensing unit rows 20L1 and 20L2 for malfunction compensation and the first and second sensing unit rows 20L1 and 20L2 for malfunction compensation. A sensing unit row 20L3 for detecting a user operation may be provided.
 第1のセンシング部列20L1は、X軸方向に所定の間隔離して一列に並べられた誤動作補償用のセンシング部20SE1により構成され、第2のセンシング部列20L2は、X軸方向に所定の間隔離して一列に並べられた誤動作補償用のセンシング部20SE2により構成されている。センシング部列20L3は、X軸方向に所定の間隔離して一列に並べられた誤動作補償用のセンシング部20SE3により構成されている。センシング部20SE1とセンシング部20SE2とは、Y軸方向に対向するように配置されている。センシング部20SE3は、Y軸方向にセンシング部20SE1、20SE2と重ならないように配置されている。 First sensing portion array 20L1 is composed of a sensing unit 20SE 1 for ordered malfunction compensation in a line isolated for a predetermined in the X-axis direction, the second sensing part row 20L2 is given in the X-axis direction It is composed of between isolation to the sensing portion 20SE 2 for malfunction compensation ordered in a row. Sensing portion row 20L3 is composed of the sensing part 20SE 3 for malfunction compensation arranged in a row to isolate for a predetermined in the X-axis direction. The sensing unit 20SE 1 and the sensing portion 20SE 2, is disposed so as to face the Y-axis direction. Sensing unit 20SE 3 is arranged so as not to overlap with the sensing portion 20SE 1, 20SE 2 in the Y-axis direction.
 センシング部20SE1、20SE2は、長方形状を有し、その長辺がX軸と平行になるように配置されている。一方、センシング部20SE3は、正方形状またはほぼ正方形状を有し、対向する一組の辺がX軸と平行になるように配置されている。センシング部20SE3の面積は、センシング部20SE1、20SE2の面積より大きい。 The sensing units 20SE 1 and 20SE 2 have a rectangular shape, and the long sides thereof are arranged to be parallel to the X axis. Meanwhile, the sensing unit 20SE 3 has a square shape or a substantially square shape, a pair of opposed sides are arranged parallel to the X axis. Area of the sensing unit 20SE 3 is greater than the area of the sensing portion 20SE 1, 20SE 2.
(変形例8)
 図19Bに示すように、センサ20Bは、マトリックス状に2次元配置された複数のセンシング部SEを有していてもよい。ここでは、センシング部が3行、7列のマトリックス状に配置されている場合について説明するが、行数および列数はこれに限定されるものではない。以下では、n行、m列の位置に配置されたセンシング部SEをSE(n、m)という。
(Modification 8)
As shown in FIG. 19B, the sensor 20B may have a plurality of sensing units SE two-dimensionally arranged in a matrix. Here, although the case where the sensing units are arranged in a matrix of 3 rows and 7 columns will be described, the number of rows and the number of columns are not limited to this. Hereinafter, the sensing units SE arranged at positions of n rows and m columns are referred to as SE (n, m).
 SE(2、2)、SE(2、4)、SE(2、6)が、ユーザ操作検出用のセンシング部SEAである。SE(2、2)、SE(2、4)、SE(2、6)以外のセンシング部SE(n、m)が誤動作補償用のセンシング部SEBである。 SE (2,2), SE (2,4 ), SE (2,6) is a sensing unit SE A for user operation detection. SE (2,2), SE (2,4 ), the sensing unit SE (n, m) other than the SE (2, 6) is a sensing unit SE B for malfunction compensation.
 ユーザ操作検出用のセンシング部SEAのX軸方向の両側に、誤動作補償用のセンシング部SEBがあると、センシング部SEAの両側の位置における変形の度合いを確認できるので、電子機器10のねじれや曲げ、または意図しない位置の押圧の検出精度を向上することができる。 On both sides of the X-axis direction of the sensing unit SE A for user operation detection, if there is a sensing unit SE B for malfunction compensation, it is possible to confirm the degree of deformation on both sides of the position of the sensing unit SE A, the electronic apparatus 10 It is possible to improve detection accuracy of twisting, bending, or pressing of an unintended position.
(変形例9)
 センサ20として複数のセンシング部SEがマトリックス状に2次元配置されたものを用いる場合、IC12Aが、センサ20に対するマルチタッチを検出可能なものであってもよい。例えば、16本のX電極(第1電極)と10本のY電極(第2電極)とを直交配置した場合には、マトリックス状に配置された160個のセンシング部SEを構成することができ、各センシング部SEにて金属層21の近接を検知することができる。
(Modification 9)
When a plurality of sensing units SE are two-dimensionally arranged in a matrix as the sensor 20, the IC 12A may be capable of detecting multi-touch on the sensor 20. For example, in the case where 16 X electrodes (first electrodes) and 10 Y electrodes (second electrodes) are arranged at right angles, 160 sensing portions SE arranged in a matrix can be configured. The proximity of the metal layer 21 can be detected by each sensing unit SE.
 X、Y電極がマトリックス状に配置されたセンサ電極層30の両主面が、圧力変形可能な金属層21、22で覆われ、これらの金属層21、22が接地されることで、IC12Aは、センシング面20Sに加わる圧力を検知することができる。例えば160個のセンシング部SE毎に金属層21の変形を検出できるので、複数圧力点のXY方向座標のみならず、Z方向への圧力も検出できる。相互容量方式では、X、Y電極から周囲に電気力線が漏れるようすることが好ましい。このような状態を可能とするX、Y電極としては、櫛歯状の電極等が好ましい。 Both main surfaces of the sensor electrode layer 30 in which the X and Y electrodes are arranged in a matrix are covered with the pressure deformable metal layers 21 and 22, and the metal layers 21 and 22 are grounded, whereby the IC 12A The pressure applied to the sensing surface 20S can be detected. For example, since deformation of the metal layer 21 can be detected for each of the 160 sensing portions SE, not only the XY direction coordinates of a plurality of pressure points but also the pressure in the Z direction can be detected. In the mutual capacitance method, it is preferable that electric lines of force leak from the X and Y electrodes to the periphery. As the X and Y electrodes capable of such a state, comb-like electrodes and the like are preferable.
 上述の構成を有するセンサ20では、160個のセンシング部SEの一部がユーザ操作検出用として用いられ、残りが誤動作補償用として用いられる。なお、ユーザ操作検出用のセンシング部SEによりマルチタッチ(例えば複数のボタン押し)を検出するようにしてもよい。 In the sensor 20 having the configuration described above, a part of the 160 sensing units SE is used for user operation detection, and the remaining part is used for malfunction compensation. The multi-touch (for example, pressing of a plurality of buttons) may be detected by the sensing unit SE for user operation detection.
 また、上述の構成を有するセンサ20は、筐体11の壁部11Nおよび底部11Mの内側面のいずれにも設けることは可能であるが、配置スペースの観点からすると、底部11Mの内側面に設けることが好ましい。 Further, although the sensor 20 having the above-described configuration can be provided on any of the inner side surfaces of the wall portion 11N and the bottom portion 11M of the housing 11, it is provided on the inner side surface of the bottom portion 11M from the viewpoint of arrangement space. Is preferred.
(変形例10)
 図20Aに示すように、複数のユーザ操作検出用のセンシング部ペアSP1と、複数の誤動作補償用のセンシング部ペア20SP2とを備え、センシング部ペアSP1、SP2が交互に配置されていてもよい。センシング部ペアSP1は、所定の間隔離された長方形状の2つのユーザ操作検出用のセンシング部SEAにより構成されており、センシング部SEAの長辺がY軸に平行になるように配置されている。センシング部ペアSP2は、所定の間隔離された長方形状の2つの誤動作補償用のセンシング部SEBにより構成されており、センシング部SEBの長辺がX軸に平行になるように配置されている。
(Modification 10)
As shown in FIG. 20A, a plurality of sensing unit pairs SP1 for user operation detection and a plurality of sensing unit pairs 20SP2 for malfunction compensation may be provided, and the sensing unit pairs SP1 and SP2 may be alternately arranged. Sensing unit pair SP1 is constituted by the sensing unit SE A for two user operation detection of the predetermined between isolated rectangular, the long sides of the sensing unit SE A is arranged parallel to the Y axis ing. Sensing unit pair SP2 is configured by a sensing unit SE B for two malfunctions compensation of predetermined between isolated rectangular, the long sides of the sensing unit SE B is disposed parallel to the X axis There is.
 図20A中に示した位置PAが押圧された場合には、図20Bに示すように、センシング部(3)、(4)の検出信号のレベルが高くなる。図20A中に示した位置PBが押圧された場合には、図20Cに示すように、センシング部(1)の検出信号のレベルが高くなる。 If the position P A shown is pressed in FIG. 20A, as shown in FIG. 20B, the sensing unit (3), the higher the level of the detection signal (4). If the position P B shown is pressed in FIG. 20A, as shown in FIG. 20C, the level of the detection signal of the sensing unit (1) is increased.
(変形例11)
 第1の実施形態では、側壁部11Rの外側面11SAが、規定の押圧位置(すなわちセンシング部SE2、SE4、SE6に対応する位置)にボタンBT1、BT2、BT3を有する構成を例として説明したが、規定の押圧位置を触覚的に把握可能とする構成はこれに限定されるものではない。例えば、規定の押圧位置に突起を設けるようにしてもよい。また、規定の押圧位置とその周辺部分との表面粗さを変化させてもよい。例えば、規定の押圧位置とその周辺部分とのうちの一方をざらついた表面とし、他方を平滑な表面としてもよい。また、規定の押圧位置とその周辺部分との体感温度を変えるようにしてもよい。例えば、規定の押圧位置とその周辺部分とのうちの一方を金属で構成し、他方を高分子樹脂で構成するようにしてもよい。
(Modification 11)
In the first embodiment, the outside surface 11SA of the side wall portion 11R has been described as an example having a configuration in which the buttons BT1, BT2, and BT3 are located at predetermined pressing positions (that is, positions corresponding to the sensing portions SE2, SE4, and SE6). The configuration for enabling the user to grasp the prescribed pressing position in a tactile manner is not limited to this. For example, the protrusion may be provided at a prescribed pressing position. Also, the surface roughness of the prescribed pressing position and its peripheral portion may be changed. For example, one of the prescribed pressing position and its peripheral portion may be a rough surface, and the other may be a smooth surface. In addition, the sensational temperature of the prescribed pressing position and its peripheral portion may be changed. For example, one of the prescribed pressing position and its peripheral portion may be made of metal, and the other may be made of polymer resin.
 規定の押圧位置を触覚的に把握可能とする代わりに、規定の押圧位置を視覚的に把握可能としてもよいし、規定の押圧位置を触覚的および視覚的に把握可能としてもよい。規定の押圧位置を視覚的に把握可能とするためには、例えば、記号、文字、マーク、模様および色のうちの少なくとも1種を外側面11SAに印刷すればよい。また、記号、文字、マークおよび模様のうちの少なくとも1種を外側面11SAに刻印するようにしてもよい。例えば規定の押圧位置にボリュームボタンを付与する場合には、押圧部に“+”または“-”の記号を印刷または刻印すればよい。 Instead of making it possible to tactilely grasp the prescribed pressing position, it may be possible to visually grasp the prescribed pressing position, or it may be possible to haptically and visually grasp the prescribed pressing position. In order to make it possible to visually grasp the prescribed pressing position, for example, at least one of a symbol, a character, a mark, a pattern and a color may be printed on the outer surface 11SA. In addition, at least one of a symbol, a character, a mark, and a pattern may be imprinted on the outer side surface 11SA. For example, in the case where a volume button is provided at a prescribed pressing position, a symbol of “+” or “−” may be printed or marked on the pressing portion.
(変形例12)
 センサ120が、静電容量変化により温度を検出するための温度検出用の電極部をさらに備えるようにしてもよい。この場合、IC12Aが、温度検出用の電極部の静電容量変化に基づき温度を検出し、検出した温度に基づき閾値を補正するようにしてもよい。温度検出用の電極部としては、センシング部SE1~SE7と同様の構成を有する電極部を用いるようにしてもよい。
(Modification 12)
The sensor 120 may further include an electrode unit for temperature detection for detecting a temperature by a capacitance change. In this case, the IC 12A may detect the temperature based on the capacitance change of the temperature detection electrode unit, and may correct the threshold based on the detected temperature. As the electrode unit for temperature detection, an electrode unit having the same configuration as that of the sensing units SE1 to SE7 may be used.
 基板12が温度検出部をさらに備えるようにしてもよい。この場合、IC13Aが、温度検出部により温度を検出し、検出した温度に基づき閾値を補正するようにしてもよい。 The substrate 12 may further include a temperature detection unit. In this case, the IC 13A may detect the temperature by the temperature detection unit and correct the threshold based on the detected temperature.
(変形例13)
 センサ20、弾性体51およびスペーサ52は、溝部14の長さ方向に複数に分割されていてもよい。これにより、筐体11に加えられたねじり歪みによるセンサ20の測定誤差を抑制することができる。また、溝部14が複数設けられ、それぞれの溝部14にセンサ20、弾性体51およびスペーサ52が収容されていてもよい。
(Modification 13)
The sensor 20, the elastic body 51, and the spacer 52 may be divided into a plurality in the longitudinal direction of the groove portion 14. Thereby, the measurement error of sensor 20 by the torsional distortion added to case 11 can be controlled. In addition, a plurality of groove portions 14 may be provided, and the sensor 20, the elastic body 51, and the spacer 52 may be accommodated in each of the groove portions 14.
(変形例14)
 センサ20においてセンサ電極層30のセンシング部SE~SE7は渦巻き状のコイル配線でもよい。この場合、センシング部SE~SE7の渦巻き状のコイル配線は、金属層121、122の変形を電界ではなく磁界の変動で検出する。
(Modification 14)
In the sensor 20, the sensing parts SE to SE7 of the sensor electrode layer 30 may be spiral coil wiring. In this case, the spiral coil wiring of the sensing parts SE to SE7 detects the deformation of the metal layers 121 and 122 not by an electric field but by a change of a magnetic field.
(変形例15)
 CPU12Bが、以下のようにしてセンサ20の動作および非動作を切り換えるようにしてもよい。すなわち、CPU12Bが、表示装置13Aのタッチパネルから供給される検出信号に基づき、表示装置13Aの表示面の規定面積以上の範囲で検出信号が閾値を超えているか否かを判別する。規定面積以上の範囲で検出信号が閾値を超えていると判別された場合には、CPU12Bは、側壁部11Rに設けられたセンサ20を動作させないようにする。一方、規定面積以上の範囲で検出信号が閾値を超えていないと判別された場合には、CPU12Bは、側壁部11Rに設けられたセンサ20を動作させる。このようにセンサ20を動作および非動作を切り換えることで、電子機器10の誤動作を更に抑制することができる。
(Modification 15)
The CPU 12B may switch the operation and non-operation of the sensor 20 as follows. That is, based on the detection signal supplied from the touch panel of the display device 13A, the CPU 12B determines whether the detection signal exceeds the threshold in a range equal to or more than the specified area of the display surface of the display device 13A. When it is determined that the detection signal exceeds the threshold value in the range equal to or more than the prescribed area, the CPU 12B prevents the sensor 20 provided in the side wall 11R from operating. On the other hand, when it is determined that the detection signal does not exceed the threshold in the range equal to or larger than the prescribed area, the CPU 12B operates the sensor 20 provided in the side wall 11R. By switching the operation and non-operation of the sensor 20 in this manner, malfunction of the electronic device 10 can be further suppressed.
(変形例16)
 CPU12Bが、IC12Aから供給される圧力分布(静電容量分布)のパターンに基いて、人物特定等の認証を行うようにしてもよい。この場合、人物特定等の認証が取れた場合には、CPU12Bが電子機器10を使用可能な状態とするのに対して、人物特定等の認証が取れない場合には、CPU12Bが電子機器10を使用可能な状態にしないようにしてもよい。
(Modification 16)
The CPU 12B may perform authentication such as person identification based on a pressure distribution (capacitance distribution) pattern supplied from the IC 12A. In this case, the CPU 12B enables the electronic device 10 to be usable when authentication such as person identification is obtained, whereas the CPU 12B sets the electronic device 10 when authentication such as person identification can not be acquired. It may not be available.
(変形例17)
 上述の第1の実施形態では、センサ20が相互容量方式である場合について説明したが、センサ20が自己容量方式であってもよい。
(Modification 17)
Although the above-mentioned 1st embodiment explained the case where sensor 20 was a mutual capacitance method, sensor 20 may be a self-capacitance method.
 図21は、自己容量方式のセンサ電極層30Aの構成を示す。センサ電極層30Aは、基材31と、基材31の一方の主面に設けられた薄膜状の複数の電極35とを備え、各電極35によりセンシング部SEが構成されている。電極35は、長方形の角部を直線状に切り落とした形状を有している。切り落としの角度θは、例えば45度である。なお、電極35の形状はこれに限定されるものではなく、長方形の角部をR形状とした形状、長方形状等の多角形状、円形状、楕円形状または不定形状等であってもよい。 FIG. 21 shows the configuration of a self-capacitance sensor electrode layer 30A. The sensor electrode layer 30A includes a base 31 and a plurality of thin film electrodes 35 provided on one main surface of the base 31, and the electrodes 35 constitute a sensing unit SE. The electrode 35 has a shape in which rectangular corners are cut off in a straight line. The cutting angle θ is, for example, 45 degrees. The shape of the electrode 35 is not limited to this, and it may be a shape in which corner portions of a rectangle have an R shape, a polygonal shape such as a rectangular shape, a circular shape, an elliptical shape, or an irregular shape.
 また、センサ電極層30Aは、各電極45をコネクタ42に電気的に接続する複数の配線35Aを備える。自己容量方式のセンサ電極層30Aでは、個別に検知したいセンシング部SEの個数分だけ、すなわち静電容量変化を検出する電極(検知電極)35の個数分だけ、配線35Aが必要となる。 The sensor electrode layer 30A also includes a plurality of wires 35A that electrically connect the electrodes 45 to the connector 42. In the self-capacitance sensor electrode layer 30A, the wiring 35A is necessary for the number of sensing portions SE to be individually detected, that is, the number of electrodes (detection electrodes) 35 for detecting a capacitance change.
 電極35の辺に対して直角に引き出された配線35Aは、直角に曲げられて方向が変更されていてもよいが、図21に示すように、45度の角度で2回曲げられて方向が変更されていることが好ましい。配線35Aの幅の変化を抑制し、ノイズの発生を抑制できるからである。また、上記以外の部分においても、配線35Aを直角に曲げて方向が変更されるのではなく、45度の角度で2回曲げられて方向が変更されていることが好ましい。 The wiring 35A drawn at a right angle to the side of the electrode 35 may be bent at a right angle to change the direction, but as shown in FIG. It is preferable that it is changed. This is because changes in the width of the wiring 35A can be suppressed, and the generation of noise can be suppressed. In addition, also in portions other than the above, it is preferable that the direction is not changed by bending the wiring 35A at right angles, but the direction is changed by being bent twice at an angle of 45 degrees.
 自己容量方式では、IC12Aは、金属層21の近接を、各電極35からの静電容量変化により検出する。センサ20は、圧力により形状変化するコンデンサーの1種と見なすこともできる。IC12Aでは、電極(検知電極)35に対する金属層(接地電極)21の近接は、電極35の静電容量の増加として検出される。センシング面20Sの押圧に対するセンサ20の容量変化量は、接地電極である金属層21と検知電極である電極35の間の距離および誘電率、ならびに電極35の面積等に基づき、容易に調整することができる。センサ20によりマルチタッチを検出可能とする場合には、センサ20としては相互容量方式のものを用いることが好ましい。 In the self-capacitance system, the IC 12A detects the proximity of the metal layer 21 by the change in capacitance from each electrode 35. The sensor 20 can also be regarded as one type of capacitor whose shape changes with pressure. In the IC 12A, the proximity of the metal layer (ground electrode) 21 to the electrode (detection electrode) 35 is detected as an increase in the capacitance of the electrode 35. The amount of change in capacitance of the sensor 20 with respect to the pressure on the sensing surface 20S can be easily adjusted based on the distance between the metal layer 21 as the ground electrode and the electrode 35 as the detection electrode and the dielectric constant, the area of the electrode 35, etc. Can. When the multi-touch can be detected by the sensor 20, it is preferable to use a mutual capacitive sensor as the sensor 20.
(変形例18)
 上述の第1の実施形態では、電子機器がスマートフォンである場合を例として説明したが、本開示はこれに限定されるものではなく、筐体等の外装体を有する種々の電子機器に適用可能である。例えば、スマートフォン以外の携帯電話、パーソナルコンピュータ(例えばノート型PC、タブレットPC等)、タブレット、テレビ、リモートコントローラ、カメラ、ゲーム機器、ナビゲーションシステム、電子書籍、電子辞書、携帯音楽プレイヤー、スマートウオッチやヘッドマウンドディスプレイ等のウェアラブル端末、ラジオ、ステレオ、医療機器、ロボットに適用可能である。
(Modification 18)
Although the above-mentioned 1st embodiment explained the case where an electronic device was a smart phone as an example, this indication is not limited to this, and it is applicable to various electronic devices which have exterior bodies, such as a case. It is. For example, mobile phones other than smartphones, personal computers (for example, notebook PCs, tablet PCs, etc.), tablets, TVs, remote controllers, cameras, game devices, navigation systems, electronic books, electronic dictionaries, portable music players, smart watches and heads The present invention is applicable to wearable terminals such as mound displays, radios, stereos, medical devices and robots.
 本開示は電子機器に限定されるものではなく、電子機器以外の様々なものにも適用可能である。例えば、電動工具、冷蔵庫、エアコン、温水器、電子レンジ、食器洗浄器、洗濯機、乾燥機、照明機器、玩具等の電気機器に適用可能である。更に、住宅をはじめとする建築物、建築部材、乗り物、テーブルや机等の家具、製造装置、分析機器等にも適用可能である。建築部材としては、例えば、敷石、壁材、フロアータイル、床板等が挙げられる。乗り物としては、例えば、車両(例えば自動車、オートバイ等)、船舶、潜水艦、鉄道車両、航空機、宇宙船、エレベータ、遊具等が挙げられる。 The present disclosure is not limited to electronic devices, and is applicable to various devices other than electronic devices. For example, the present invention can be applied to electric devices such as a power tool, a refrigerator, an air conditioner, a water heater, a microwave oven, a dishwasher, a washing machine, a dryer, a lighting device, and a toy. Furthermore, it can be applied to a building including a house, a building member, a vehicle, furniture such as a table or a desk, a manufacturing apparatus, an analysis device, and the like. As a construction member, a bed stone, a wall material, a floor tile, a floor board etc. are mentioned, for example. The vehicle includes, for example, a vehicle (for example, a car, a motorcycle, etc.), a ship, a submarine, a rail car, an aircraft, a spacecraft, an elevator, a playground equipment, and the like.
<2 第2の実施形態>
[電子機器の構成]
 図22は、本開示の第2の実施形態に係る電子機器110の構成を示す。第2の実施形態に係る電子機器110は、側壁部11Rに操作ボタンを備える代わりに、操作ボタンに対応する情報13Gを、画面13B中の側壁部11R側の辺に沿った位置に表示する。
<2 Second Embodiment>
[Configuration of electronic device]
FIG. 22 shows a configuration of the electronic device 110 according to the second embodiment of the present disclosure. The electronic device 110 according to the second embodiment displays the information 13G corresponding to the operation button at a position along the side of the side wall 11R in the screen 13B instead of providing the operation button on the side wall 11R.
 図23は、センサ120のセンシング部SEの配置例を示す。センサ120は、マトリックス状に2次元配置された複数のセンシング部SEを有する。ここでは、センシング部SEが3行、11列のマトリックス状に配置されている場合について説明するが、行数および列数はこれに限定されるものではない。以下では、n行、m列の位置に配置されたセンシング部SEをSE(n、m)という。 FIG. 23 shows an arrangement example of the sensing unit SE of the sensor 120. The sensor 120 has a plurality of sensing units SE two-dimensionally arranged in a matrix. Here, although the case where the sensing parts SE are arranged in a matrix of 3 rows and 11 columns will be described, the number of rows and the number of columns are not limited to this. Hereinafter, the sensing units SE arranged at positions of n rows and m columns are referred to as SE (n, m).
 CPU12Bは、ユーザによりアプリケーションが起動されると、複数のセンシング部SEに対して、起動されたアプリケーションの各操作をマッピングする。具体的には、複数のセンシング部SEのうちの一部をアプリケーション操作用のセンシング部SEAに設定し、残りのセンシング部を誤動作補償用のセンシング部SEBに設定する。なお、アプリケーション操作用のセンシング部SEAの位置は、起動されたアプリケーション毎に異なる。 When the application is activated by the user, the CPU 12B maps each operation of the activated application to the plurality of sensing units SE. Specifically, to set the part of the plurality of the sensing unit SE to the sensing unit SE A for application operations, set the sensing unit SE B for malfunction compensating the remainder of the sensing unit. The position of the sensing unit SE A for application operation is different for each launched application.
 以下、カメラアプリケーション、音楽アプリケーションおよび地図アプリケーション使用時の画面表示およびセンシング部SEの設定について説明する。なお、アプリケーションはこれに限定されるものではなく、ゲームアプリケーション、動画または静止画の編集アプリケーション等の各種アプリケーションにも本開示は適用可能である。 Hereinafter, the settings for the screen display and the sensing unit SE when using the camera application, the music application, and the map application will be described. Note that the application is not limited to this, and the present disclosure can be applied to various applications such as a game application and a moving image or still image editing application.
(カメラアプリケーション)
 図24Aは、カメラアプリケーション使用時の画面を示す。図24Bは、カメラアプリケーション使用時のセンシング部SEのマッピング設定を示す。CPU12Bは、カメラアプリケーションが起動されると、複数のセンシング部SEのうちの一部を、ズームアウト操作検出用、ズームイン操作検出用、シャッタ操作検出用のセンシング部SEAに設定し、残りを誤動作補償用のセンシング部SEBに設定する。具体的には、SE(2、2)、SE(2、4)、SE(2、10)をそれぞれ、ズームアウト操作検出用、ズームイン操作検出用、シャッタ操作検出用のセンシング部SEAに設定し、SE(2、2)、SE(2、4)、SE(2、10)以外のSE(n、m)を誤動作補償用のセンシング部SEBに設定する。
(Camera application)
FIG. 24A shows a screen when using a camera application. FIG. 24B shows mapping settings of the sensing unit SE when using a camera application. CPU12B, when the camera application is started, sets some of the plurality of the sensing unit SE, zoom-out operation detecting, for zoom operation detection, the sensing unit SE A for detecting shutter operation, malfunction and the remaining set the sensing unit SE B for compensation. Specifically, SE (2,2), SE ( 2,4) setting, SE (2,10), respectively, the zoom-out operation detecting, for zoom operation detection, the sensing unit SE A for detecting shutter operation and, SE (2,2), SE ( 2,4), to set the sensing unit SE B of SE (2,10) other than the SE (n, m) malfunction compensation.
 CPU12Bは、画面13B中の側壁部11R側の位置のうち、ズームアウト操作検出用のSE(2、2)に対応する位置には、ズームアウト操作に対応する情報13Gを表示する。CPU12Bは、画面13B中の側壁部11R側の位置のうち、ズームイン操作検出用のSE(2、4)に対応する位置には、ズームイン操作に対応する情報13Gを表示する。CPU12Bは、画面13B中の側壁部11R側の位置のうち、シャッタ操作検出用のSE(2、10)に対応する位置には、シャッタ操作に対応する情報13Gを表示する。 The CPU 12B displays information 13G corresponding to the zoom-out operation at a position corresponding to the SE (2, 2) for zoom-out operation detection among the positions on the side wall 11R side in the screen 13B. The CPU 12B displays the information 13G corresponding to the zoom-in operation at the position corresponding to the SE (2, 4) for the zoom-in operation detection among the positions on the side wall 11R side in the screen 13B. The CPU 12B displays information 13G corresponding to the shutter operation at a position corresponding to the SE (2, 10) for detecting the shutter operation among the positions on the side wall 11R side in the screen 13B.
 なお、ズームアウト操作、ズームイン操作、シャッタ操作それぞれに対応する情報13Gに関するデータは、記憶部68に記憶されており、CPU12Bは、カメラアプリケーションの起動に伴って、これらの情報13Gに関するデータを記憶部68から読み出し、画面13Bに表示する。 The data related to the information 13G corresponding to each of the zoom out operation, the zoom in operation and the shutter operation is stored in the storage unit 68, and the CPU 12B stores the data related to the information 13G as the camera application is activated. It reads from 68 and displays on screen 13B.
(音楽アプリケーション)
 図25Aは、音楽アプリケーション使用時の画面を示す。図25Bは、音楽アプリケーション使用時のセンシング部SEのマッピング設定を示す。CPU12Bは、音楽アプリケーションが起動されると、複数のセンシング部SEのうちの一部を、早送り再生操作検出用、一時停止操作検出用、早戻し再生操作検出用、ボリュームアップ操作検出用、ボリュームダウン操作検出用のセンシング部SEAに設定し、残りを誤動作補償用のセンシング部SEBに設定する。具体的には、SE(2、1)、SE(2、3)、SE(2、5)、SE(2、9)、SE(2、11)をそれぞれ、早送り再生操作検出用、一時停止操作検出用、早戻し再生操作検出用、ボリュームアップ操作検出用、ボリュームダウン操作検出用のセンシング部SEAに設定し、SE(2、1)、SE(2、3)、SE(2、5)、SE(2、9)、SE(2、11)以外のSE(n、m)を誤動作補償用のセンシング部SEBに設定する。
(Music application)
FIG. 25A shows a screen when using a music application. FIG. 25B shows the mapping setting of the sensing unit SE when using a music application. When the music application is activated, the CPU 12B detects part of the plurality of sensing units SE for fast forward playback operation detection, pause operation detection, fast reverse playback operation detection, volume up operation detection, volume down set the sensing unit SE a for operation detection, set the sensing unit SE B for malfunction compensating the rest. Specifically, SE (2, 1), SE (2, 3), SE (2, 5), SE (2, 9), SE (2, 11) are each for fast forward reproduction operation detection, and paused manipulation detection, set rewind playback operation detection, volume up operation detection, the sensing unit SE a for volume down operation detection, SE (2,1), SE ( 2,3), SE (2,5 ), SE (2,9), to set the sensing unit SE B for malfunction compensate for SE (2, 11) other than the SE (n, m).
 CPU12Bは、画面13B中の側壁部11R側の位置のうち、早送り再生操作検出用のSE(2、1)に対応する位置には、早送り再生操作に対応する情報13Gを表示する。CPU12Bは、画面13B中の側壁部11R側の位置のうち、一時停止操作検出用のSE(2、3)に対応する位置には、一時停止操作に対応する情報13Gを表示する。CPU12Bは、画面13B中の側壁部11R側の位置のうち、早戻し再生操作検出用のSE(2、5)に対応する位置には、早戻し再生操作に対応する情報13Gを表示する。CPU12Bは、画面13B中の側壁部11R側の位置のうち、ボリュームアップ操作検出用のSE(2、9)に対応する位置には、ボリュームアップ操作に対応する情報13Gを表示する。CPU12Bは、画面13B中の側壁部11R側の位置のうち、ボリュームダウン操作検出用のSE(2、11)に対応する位置には、ボリュームダウン操作に対応する情報13Gを表示する。 The CPU 12B displays information 13G corresponding to the fast-forwarding reproduction operation at a position corresponding to SE (2, 1) for detecting the fast-forwarding operation among the positions on the side wall 11R side in the screen 13B. The CPU 12B displays information 13G corresponding to the temporary stop operation at the position corresponding to the SE (2, 3) for temporary stop operation detection among the positions on the side wall 11R side in the screen 13B. The CPU 12B displays the information 13G corresponding to the fast reverse reproduction operation at the position corresponding to the SE (2, 5) for fast reverse reproduction detection among the positions on the side wall 11R side in the screen 13B. The CPU 12B displays the information 13G corresponding to the volume-up operation at the position corresponding to the SE (2, 9) for detecting the volume-up operation among the positions on the side wall 11R side in the screen 13B. The CPU 12B displays the information 13G corresponding to the volume down operation at the position corresponding to the SE (2, 11) for detecting the volume down operation among the positions on the side wall 11R side in the screen 13B.
 なお、早送り再生操作、一時停止操作、早戻し再生操作、ボリュームアップ操作、ボリュームダウン操作それぞれに対応する情報13Gに関するデータは、記憶部68に記憶されており、CPU12Bは、音楽アプリケーションの起動に伴って、これらの情報13Gに関するデータを記憶部68から読み出し、画面13Bに表示する。 The data related to the information 13G corresponding to each of the fast forward play operation, the pause operation, the fast reverse play operation, the volume up operation, and the volume down operation is stored in the storage unit 68, and the CPU 12B is executed along with the activation of the music application. The data related to the information 13G is read from the storage unit 68 and displayed on the screen 13B.
(地図アプリケーション)
 図26Aは、地図アプリケーション使用時の画面を示す。図26Bは、地図アプリケーション使用時のセンシング部SEのマッピング設定を示す。CPU12Bは、地図アプリケーションが起動されると、複数のセンシング部SEのうちの一部を、ズームアウト操作検出用、ズームイン操作検出用、上下左右スクロール操作検出用のセンシング部SEAに設定し、残りを誤動作補償用のセンシング部SEBに設定する。具体的には、SE(2、1)、SE(2、3)、SE(2、7)、SE(2、11)、SE(1、9)、SE(3、9)をそれぞれ、ズームアウト操作、ズームイン操作、上スクロール操作、下スクロール操作、右スクロール操作、左スクロール操作のセンシング部SEAに設定し、SE(2、1)、SE(2、3)、SE(2、7)、SE(2、11)、SE(1、9)、SE(3、9)以外のSE(n、m)を誤動作補償用のセンシング部SEBに設定する。
(Map application)
FIG. 26A shows a screen when using a map application. FIG. 26B shows the mapping setting of the sensing unit SE when using the map application. CPU12B, when the map application is launched, to set some of the plurality of the sensing unit SE, detection zoom-out operation, a zoom operation detection, the sensing unit SE A for detecting vertical and horizontal scroll operation, the remaining setting the sensing unit SE B for malfunction compensation. Specifically, zoom is performed on SE (2, 1), SE (2, 3), SE (2, 7), SE (2, 11), SE (1, 9), SE (3, 9) respectively. out operation, zoom-in operation, the upper scroll operation, lower scroll operation, the right scroll operation, set the sensing unit SE a left scrolling, SE (2,1), SE ( 2,3), SE (2,7) , SE (2,11), SE ( 1,9), to set the sensing unit SE B for malfunction compensate for SE (3, 9) other than the SE (n, m).
 CPU12Bは、画面13B中の側壁部11R側の位置のうち、ズームアウト操作検出用のSE(2、1)に対応する位置には、ズームアウト操作に対応する情報13Gを表示する。CPU12Bは、画面13B中の側壁部11R側の位置のうち、ズームイン操作検出用のSE(2、3)に対応する位置には、ズームイン操作に対応する情報13Gを表示する。CPU12Bは、画面13B中の側壁部11R側の位置のうち、上スクロール操作、下スクロール操作検出用のSE(2、7)、SE(2、11)に対応する位置にはそれぞれ、上スクロール操作、下スクロール操作に対応する情報13Gを表示する。CPU12Bは、画面13B中の側壁部11R側の位置のうち、右スクロール操作、左スクロール操作検出用のSE(1、9)、SE(3、9)に対応する位置には、右スクロール操作、左スクロール操作に対応する情報13Gを表示する。 The CPU 12B displays information 13G corresponding to the zoom-out operation at a position corresponding to the zoom-out operation detection SE (2, 1) among the positions on the side wall 11R side in the screen 13B. The CPU 12B displays the information 13G corresponding to the zoom-in operation at the position corresponding to the SE (2, 3) for zoom-in operation detection among the positions on the side wall 11R side in the screen 13B. Among the positions on the side wall 11R side in the screen 13B, the CPU 12B performs the upper scroll operation at the positions corresponding to the upper scroll operation, SE (2, 7) for detecting the lower scroll operation, and SE (2, 11). , Information 13G corresponding to the downward scroll operation is displayed. The CPU 12B performs right scroll operation at positions corresponding to SE (1, 9) and SE (3, 9) for right scroll operation and left scroll operation detection among positions on the side wall 11R side in the screen 13B. Information 13G corresponding to the left scroll operation is displayed.
 なお、ズームアウト操作、ズームイン操作、上下左右スクロール操作それぞれに対応する情報13Gに関するデータは、記憶部68に記憶されており、CPU12Bは、地図アプリケーションの起動に伴って、これらの情報13Gに関するデータを記憶部68から読み出し、画面13Bに表示する。 The data related to the information 13G corresponding to the zoom-out operation, the zoom-in operation, and the up, down, left, and right scroll operations are stored in the storage unit 68, and the CPU 12B carries out the data related to the information 13G as the map application is activated. It is read from the storage unit 68 and displayed on the screen 13B.
[電子機器の動作]
 図27を参照して、第2の実施形態に係る電子機器の動作について説明する。
 まず、ステップS21においてユーザによりアプリケーションの起動操作がなされると、ステップS22において、CPU12Bは、カメラアプリケーションの起動操作がなされたか否かを判別する。
[Operation of electronic device]
The operation of the electronic device according to the second embodiment will be described with reference to FIG.
First, when the user performs an application activation operation in step S21, in step S22, the CPU 12B determines whether the camera application activation operation is performed.
 ステップS22にてカメラアプリケーションの起動操作がなされたと判別された場合には、ステップS23において、CPU12Bは、複数のセンシング部SEに対してカメラアプリケーションの各操作(ズームアウト操作、ズームイン操作、シャッタ操作)をマッピング設定する(図24B参照)。次に、ステップS24において、CPU12Bは、カメラアプリケーション用画面を表示装置13Aに表示する(図24A参照)。 When it is determined in step S22 that the start operation of the camera application has been performed, in step S23, the CPU 12B performs each operation (zoom-out operation, zoom-in operation, shutter operation) of the camera application to the plurality of sensing units SE. Are set (see FIG. 24B). Next, in step S24, the CPU 12B displays a screen for camera application on the display device 13A (see FIG. 24A).
 次に、ステップS25において、CPU12Bは、ステップS23におけるマッピング設定に応じた操作検出を行う。具体的には、SE(2、2)、SE(2、4)、SE(2、10)それぞれで、ズームアウト操作検出、ズームイン操作検出、シャッタ操作の検出を行い、SE(2、2)、SE(2、4)、SE(2、10)以外のセンシング部SEにてズームアウト操作、ズームイン操作およびシャッタ操作の誤動作を補償する。 Next, in step S25, the CPU 12B performs operation detection corresponding to the mapping setting in step S23. Specifically, zoom out operation detection, zoom in operation detection, and shutter operation detection are performed on SE (2, 2), SE (2, 4), and SE (2, 10), respectively, and SE (2, 2) , SE (2, 4), SE (2, 10) The zoom out operation, the zoom-in operation and the shutter operation are compensated for in the sensing unit SE other than SE (2, 4).
 ステップS22にてカメラアプリケーションの起動操作がなされていないと判別された場合には、ステップS26において、CPU12Bは、音楽アプリケーションの起動操作がなされたか否かを判別する。ステップS26にて音楽アプリケーションの起動操作がなされたと判別された場合には、ステップS27において、CPU12Bは、複数のセンシング部SEに対して音楽アプリケーションの各操作(早送り再生操作、一時停止操作、早戻し再生操作、ボリュームアップ操作、ボリュームダウン操作)をマッピング設定する(図25B参照)。次に、ステップS28において、CPU12Bは、音楽アプリケーション用画面を表示装置13Aに表示する(図25A参照)。 When it is determined in step S22 that the start operation of the camera application has not been performed, in step S26, the CPU 12B determines whether the start operation of the music application has been performed. When it is determined in step S26 that the start operation of the music application has been performed, in step S27, the CPU 12B performs each operation of the music application with respect to the plurality of sensing units SE (fast forward reproduction operation, pause operation, fast return Mapping setting is made for playback operation, volume up operation, volume down operation) (see FIG. 25B). Next, in step S28, the CPU 12B displays a music application screen on the display device 13A (see FIG. 25A).
 次に、ステップS29において、CPU12Bは、ステップS27におけるマッピング設定に応じた操作検出を行う。具体的には、SE(2、1)、SE(2、3)、SE(2、5)、SE(2、9)、SE(2、11)それぞれで、早送り再生操作、一時停止操作、早戻し再生操作、ボリュームアップ操作、ボリュームダウン操作の検出を行い、SE(2、1)、SE(2、3)、SE(2、5)、SE(2、9)、SE(2、11)以外のセンシング部SEにて早送り再生操作、一時停止操作、早戻し再生操作、ボリュームアップ操作およびボリュームダウン操作の誤動作を補償する。 Next, in step S29, the CPU 12B performs operation detection according to the mapping setting in step S27. Specifically, for each of SE (2, 1), SE (2, 3), SE (2, 5), SE (2, 9), SE (2, 11), fast forward playback operation, pause operation, Fast reverse playback operation, volume up operation, volume down operation is detected, SE (2, 1), SE (2, 3), SE (2, 5), SE (2, 9), SE (2, 11) In the sensing unit SE other than the above, compensation is made for malfunctions of fast-forward playback operation, pause operation, fast-return playback operation, volume-up operation and volume-down operation.
 ステップS26にて音楽アプリケーションの起動操作がなされていないと判別された場合には、ステップS30において、CPU12Bは、地図アプリケーションの起動操作がなされたか否かを判別する。ステップS30にて地図アプリケーションの起動操作がなされたと判別された場合には、ステップS31において、CPU12Bは、複数のセンシング部SEに対して地図アプリケーションの各操作(ズームアウト操作、ズームイン操作、上スクロール操作、下スクロール操作、右スクロール操作、左スクロール操作)をマッピング設定する(図26B参照)。 When it is determined in step S26 that the start operation of the music application is not performed, in step S30, the CPU 12B determines whether the start operation of the map application is performed. When it is determined in step S30 that the start operation of the map application has been performed, in step S31, the CPU 12B performs each operation (zoom out operation, zoom in operation, upper scroll operation) of the map application to a plurality of sensing units SE. , Down scroll operation, right scroll operation, left scroll operation) are set (see FIG. 26B).
 次に、ステップS32において、CPU12Bは、地図アプリケーション用画面を表示装置13Aに表示する(図26A参照)。次に、ステップS33において、CPU12Bは、ステップS31におけるマッピング設定に応じた操作検出を行う。具体的には、SE(2、1)、SE(2、3)、SE(2、7)、SE(2、11)、SE(1、9)、SE(3、9)それぞれで、ズームアウト操作、ズームイン操作、上スクロール操作、下スクロール操作、右スクロール操作、左スクロール操作の検出を行い、SE(2、1)、SE(2、3)、SE(2、7)、SE(2、11)、SE(1、9)、SE(3、9)以外のセンシング部SEにてズームアウト操作、ズームイン操作、上スクロール操作、下スクロール操作、右スクロール操作および左スクロール操作の誤動作を補償する。 Next, in step S32, the CPU 12B displays a map application screen on the display device 13A (see FIG. 26A). Next, in step S33, the CPU 12B performs operation detection according to the mapping setting in step S31. Specifically, zoom is performed on SE (2, 1), SE (2, 3), SE (2, 7), SE (2, 11), SE (1, 9), SE (3, 9) respectively. Detection of out operation, zoom in operation, up scroll operation, down scroll operation, right scroll operation, left scroll operation is performed, SE (2, 1), SE (2, 3), SE (2, 7), SE (2) , 11), SE (1, 9), SE (3, 9) In the sensing part SE, zoom out operation, zoom in operation, up scroll operation, down scroll operation, down scroll operation, right scroll operation and compensation of malfunction of left scroll operation Do.
 ステップS30にて地図アプリケーションの起動操作がなされていないと判別された場合には、ステップS34において、CPU12Bは、複数のセンシング部SEに対して標準のマッピング設定をする。次に、ステップS35において、CPU12Bは、標準の画面を表示装置13Aに表示する。次に、ステップS36において、CPU12Bは、ステップS34におけるマッピング設定に応じた操作検出を行う。 When it is determined in step S30 that the start operation of the map application is not performed, in step S34, the CPU 12B performs standard mapping setting for the plurality of sensing units SE. Next, in step S35, the CPU 12B displays a standard screen on the display device 13A. Next, in step S36, the CPU 12B performs operation detection according to the mapping setting in step S34.
 ここで、標準のマッピング設定とは、カメラアプリケーション、音楽アプリケーションおよび地図アプリケーション等のいずれも選択されていない場合に設定されるデフォルトのマッピング設定のことをいう。また、標準の画面とは、カメラアプリケーション、音楽アプリケーションおよび地図アプリケーション等のいずれも選択されていない場合に設定されるデフォルトの画面のことをいう。 Here, the standard mapping setting refers to a default mapping setting that is set when none of the camera application, the music application, the map application and the like is selected. Also, the standard screen refers to a default screen set when none of the camera application, the music application, the map application, etc. is selected.
[効果]
 第2の実施形態に係る電子機器110では、種々のアプリケーションに応じた操作部を側壁部11Rに設定することができる。したがって、側壁部11Rの押圧により種々のアプリケーションを操作することが可能となる。
[effect]
In the electronic device 110 according to the second embodiment, the operation unit corresponding to various applications can be set in the side wall 11R. Therefore, various applications can be operated by pressing the side wall 11R.
<3 第3の実施形態>
[電子機器の構成]
 第3の実施形態に係る電子機器210は、図28に示すように、側壁部11Rの内側に略U字状に湾曲された矩形のフィルム状のセンサ220を備えている点において、第1の実施形態に係る電子機器110とは異なっている。湾曲されたセンサ220は、側壁部11R、底部11Mおよびフロントパネル13の内側面に対して、図示しない支持部材により押し当てられていてもよいし、接着剤等により貼り合わされていてもよい。
<3 Third Embodiment>
[Configuration of electronic device]
The electronic device 210 according to the third embodiment is the first in that a rectangular film-shaped sensor 220 curved in a substantially U shape is provided inside the side wall portion 11R, as shown in FIG. It differs from the electronic device 110 according to the embodiment. The curved sensor 220 may be pressed against the inner side surface of the side wall portion 11R, the bottom portion 11M, and the front panel 13 by a support member (not shown), or may be bonded by an adhesive or the like.
 図29Aは、センサ220の構成を示す。図29Bは、平面状に展開された状態のセンサ220を示す。センサ220は、センシング部SE1~SE11を有する。センサ220は、側壁部11Rの内側面に配置される第1領域R1と、底部11Mの内側面に配置される第2領域R2と、フロントパネル13の内側面に配置される第3領域R3とを有する。 FIG. 29A shows the configuration of the sensor 220. FIG. 29B shows the sensor 220 in a flat state. The sensor 220 has sensing units SE1 to SE11. The sensor 220 includes a first region R1 disposed on the inner side surface of the side wall 11R, a second region R2 disposed on the inner side surface of the bottom portion 11M, and a third region R3 disposed on the inner side surface of the front panel 13. Have.
 センシング部SE3、SE6、SE9は、第1領域R1に設けられ、側壁部11Rに対する押圧を検出する。より具体的には、センシング部SE3、SE6、SE9はそれぞれ、ボタンBT1、BT2、BT3に対応して設けられ、ボタンBT1、BT2、BT3の押圧を検出する。センシング部SE3、SE6、SE9は、側壁部11Rの長さ方向に等間隔で配置されている。センシング部SE3、SE6、SE9は菱形状を有し、SE3、SE6、SE9の一方の対角線の延接方向がそれぞれ側壁部11Rの長さ方向と一致するように配置されている。これにより、隣接するセンシング部SE3、SE6、SE9の距離を縮めることができる。 The sensing units SE3, SE6, and SE9 are provided in the first region R1 and detect a press on the side wall 11R. More specifically, the sensing units SE3, SE6, SE9 are provided corresponding to the buttons BT1, BT2, BT3, respectively, and detect the pressing of the buttons BT1, BT2, BT3. The sensing portions SE3, SE6, SE9 are arranged at equal intervals in the longitudinal direction of the side wall portion 11R. The sensing portions SE3, SE6, and SE9 have a diamond shape, and are disposed such that the extension direction of one of the diagonals of SE3, SE6, and SE9 matches the longitudinal direction of the side wall portion 11R. Thus, the distance between the adjacent sensing units SE3, SE6, and SE9 can be reduced.
 センシング部SE1、SE4、SE7、SE10は、第1、第2領域R1、R2の境界部を跨ぐように設けられている。境界部を跨ぐようにセンシング部SE1、SE4、SE7、SE10が設けられていることで、広範囲に渡って筐体11の押圧を検出可能であり、かつ、第1、第2領域R1、R2の境界(すなわち筐体11の角部)の押圧を検出することが可能である。センシング部SE1、SE4、SE7、SE10は側壁部11Rに直交する等間隔のストライプ状に配置されており、センシング部SE1、SE4、SE7、SE10の一端はV字状を有し、第1領域R1まで延設されている。 The sensing units SE1, SE4, SE7, and SE10 are provided to cross the boundary between the first and second regions R1 and R2. The sensing units SE1, SE4, SE7, and SE10 are provided so as to straddle the boundary, so that the pressure of the housing 11 can be detected over a wide range, and the first and second regions R1 and R2 are provided. It is possible to detect the pressure of the boundary (i.e. the corner of the housing 11). The sensing portions SE1, SE4, SE7, and SE10 are arranged in stripes at regular intervals orthogonal to the side wall portion 11R, one end of the sensing portions SE1, SE4, SE7, and SE10 has a V shape, and the first region R1 is formed. It is extended to the end.
 センシング部SE2、SE5、SE8、SE11は、第1、第3領域R1、R3の境界部を跨ぐように設けられている。境界部を跨ぐようにセンシング部SE2、SE5、SE8、SE11が設けられていることで、広範囲に渡って筐体11の押圧を検出可能であり、かつ、第1、第3領域R1、R3の境界(すなわち筐体11の角部)の押圧を検出することが可能である。センシング部SE2、SE5、SE8、SE11は側壁部11Rに直交する等間隔のストライプ状に配置されており、センシング部SE2、SE5、SE8、SE11の一端はV字状を有し、第1領域R1まで延設されている。 The sensing units SE2, SE5, SE8, and SE11 are provided to cross the boundary between the first and third regions R1 and R3. The sensing units SE2, SE5, SE8, and SE11 are provided so as to straddle the boundary, so that the pressing of the housing 11 can be detected over a wide range, and the first and third regions R1 and R3 are provided. It is possible to detect the pressure of the boundary (i.e. the corner of the housing 11). The sensing portions SE2, SE5, SE8, SE11 are arranged in stripes at regular intervals orthogonal to the side wall portion 11R, one end of the sensing portions SE2, SE5, SE8, SE11 has a V shape, and the first region R1 It is extended to the end.
 センシング部SE1、SE4、SE7、SE10の一端はそれぞれ、センシング部SE2、SE5、SE8、SE11の一端と第1領域R1において対向するように設けられている。また、隣接するセンシング部SE1、SE4の一端と、隣接するセンシング部SE2、SE5の一端とで囲まれる領域にセンシング部SE3が設けられている。また、隣接するセンシング部SE4、SE7の一端と、隣接するセンシング部SE5、SE8の一端とで囲まれる領域にセンシング部SE6が設けられている。また、隣接するセンシング部SE7、SE10の一端と、隣接するセンシング部SE8、SE11の一端とで囲まれる領域にセンシング部SE9が設けられている。 One end of each of the sensing units SE1, SE4, SE7, and SE10 is provided to face one end of each of the sensing units SE2, SE5, SE8, and SE11 in the first region R1. In addition, a sensing unit SE3 is provided in a region surrounded by one end of the adjacent sensing units SE1 and SE4 and one end of the adjacent sensing units SE2 and SE5. A sensing unit SE6 is provided in a region surrounded by one end of the adjacent sensing units SE4 and SE7 and one end of the adjacent sensing units SE5 and SE8. A sensing unit SE9 is provided in a region surrounded by one end of the adjacent sensing units SE7 and SE10 and one end of the adjacent sensing units SE8 and SE11.
 センシング部SE3、SE6、SE9はそれぞれ、ボタンBT1、BT2、BT3の押圧を検出するためのユーザ操作検出用のセンシング部である。センシング部SE1、SE2、SE4、SE5、SE7、SE8、SE10、SE11はそれぞれ、誤動作補償用のセンシング部である。 The sensing units SE3, SE6, and SE9 are sensing units for user operation detection for detecting pressing of the buttons BT1, BT2, and BT3, respectively. The sensing units SE1, SE2, SE4, SE5, SE7, SE8, SE10, and SE11 are sensing units for malfunction compensation.
 センサ220は、図30に示すように、センシング部SE1~SE11を有する相互容量方式のセンサ電極層230と、金属層221、222と、弾性層223と、接着層224とを備える。 As shown in FIG. 30, the sensor 220 includes a mutual capacitive type sensor electrode layer 230 having sensing portions SE1 to SE11, metal layers 221 and 222, an elastic layer 223, and an adhesive layer 224.
 弾性層223は、金属層221とセンサ電極層230との主面間に設けられ、センシング面220Sに加わる圧力により弾性変形する。弾性層223は、発泡樹脂または絶縁性エラストマ等の誘電体を含んでいる。発泡樹脂は、いわゆるスポンジであり、例えば、発泡ポリウレタン、発泡ポリエチレン、発泡ポリオレフィンおよびスポンジゴム等のうちの少なくとも1種である。絶縁性エラストマは、例えば、シリコーン系エラストマ、アクリル系エラストマ、ウレタン系エラストマおよびスチレン系エラストマ等のうちの少なくとも1種である。なお、弾性層223が図示しない基材上に設けられていてもよい。 The elastic layer 223 is provided between the main surfaces of the metal layer 221 and the sensor electrode layer 230, and is elastically deformed by the pressure applied to the sensing surface 220S. The elastic layer 223 contains a dielectric such as a foamed resin or an insulating elastomer. The foamed resin is a so-called sponge, and is, for example, at least one of foamed polyurethane, foamed polyethylene, foamed polyolefin, sponge rubber and the like. The insulating elastomer is, for example, at least one of a silicone elastomer, an acrylic elastomer, a urethane elastomer, and a styrene elastomer. The elastic layer 223 may be provided on a base (not shown).
 図31Aは、相互容量方式のセンサ電極層230の構成を示す。センサ電極層230は、基材231と、基材231の一方の主面に設けられた第1、第2電極232、233とを備え、これらの第1、第2電極232、233によりセンシング部SE1~SE11が構成されている。第1、第2電極232、233は、櫛歯状を有し、櫛歯の部分を噛み合わせるようにして配置されている。具体的には、第1電極232は、線状を有する複数のサブ電極232Aを備える。第2電極233は、線状を有する複数のサブ電極233Aを備える。複数のサブ電極232A、233Aは、センサ220の対向する一組の辺に対して平行になるように延設されている。なお、図31Bに示すように、複数のサブ電極232A、233Aは、センサ220の対向する一組の辺に対して斜めになるように延設されていてもよい。 FIG. 31A shows the configuration of the sensor electrode layer 230 of the mutual capacitance system. The sensor electrode layer 230 includes a base material 231 and first and second electrodes 232 and 233 provided on one of the main surfaces of the base material 231. The sensing unit includes the first and second electrodes 232 and 233. SE1 to SE11 are configured. The first and second electrodes 232 and 233 have a comb-like shape, and are disposed such that the portions of the comb teeth are engaged with each other. Specifically, the first electrode 232 includes a plurality of linear sub-electrodes 232A. The second electrode 233 includes a plurality of linear sub-electrodes 233A. The plurality of sub-electrodes 232A and 233A are extended in parallel with one set of opposing sides of the sensor 220. Note that, as shown in FIG. 31B, the plurality of sub electrodes 232A and 233A may be extended to be oblique to a pair of opposing sides of the sensor 220.
 図32Aは、センサ220の押し位置の例を示す。図32Bは、図32A中に示した位置PAが押圧されたときのセンシング部SE1~SE11の検出信号を示す。図32Cは、図32A中に示した位置PBが押圧されたときのセンシング部SE1~SE11の検出信号を示す。図32A中に示した位置PAが押圧された場合には、センシング部SE2、SE3、SE5、SE8、SE11の検出信号が高くなる。図32A中に示した位置PBが押圧された場合には、センシング部SE5、SE8、SE9、SE10、SE11の検出信号が高くなる。但し、センシング部SE10の検出信号の極性は、センシング部SE5、SE8、SE9、SE10、SE11とは反対である。 FIG. 32A shows an example of the pressed position of the sensor 220. Figure 32B illustrates a detection signal of the sensing unit SE1 ~ SE11 when the position P A shown in FIG. 32A is pressed. Figure 32C illustrates a detection signal of the sensing unit SE1 ~ SE11 when the position P B shown in FIG. 32A is pressed. If the position P A shown is pressed in FIG. 32A, the sensing unit SE2, SE3, SE5, SE8, SE11 detection signal is high. If the position P B shown is pressed in FIG. 32A, the sensing unit SE5, SE8, SE9, SE10, SE11 detection signal is high. However, the polarity of the detection signal of the sensing unit SE10 is opposite to that of the sensing units SE5, SE8, SE9, SE10, and SE11.
 金属層221、222、接着層224はそれぞれ、形状以外の点においては第1の実施形態における金属層21、22、接着層24と同様である。 The metal layers 221 and 222 and the adhesive layer 224 are the same as the metal layers 21 and 22 and the adhesive layer 24 in the first embodiment, respectively, except for the shape.
[電子機器の動作]
 図33を参照して、第3の実施形態に係る電子機器の動作について説明する。なお、図33において、検出信号S1、S2、・・・、S11をそれぞれ簡略化してS1、S2、・・・、S11と記載する。検出信号S1、S2、・・・、S11はそれぞれ、センシング部SE1、SE2、・・・、SE11の検出信号を意味する
[Operation of electronic device]
The operation of the electronic device according to the third embodiment will be described with reference to FIG. In FIG. 33, the detection signals S1, S2,..., S11 are simplified and described as S1, S2,. The detection signals S1, S2,..., S11 mean the detection signals of the sensing units SE1, SE2,.
 まず、ステップS41において、IC12Aはセンシング部SE1~SE11を順次スキャンし、センシング部SE1~SE11それぞれの検出信号S1~S11を取得し、CPU12Bに供給する。次に、ステップS42において、CPU12Bは、IC12Aから供給された検出信号S3、S6、S9の少なくとも1つに閾値Aを超えるものがあるか否かを判別する。ステップS42にて検出信号S3、S6、S9の少なくとも1つに閾値Aを超えるものがないと判断された場合には、CPU12Bは、処理をステップS41に戻す。ステップS42にて検出信号S3、S6、S9のうちの少なくとも1つに閾値Aを超えるものがあると判断された場合には、ステップS43において、CPU12Bは、検出信号S3、S6、S9以外の検出信号S1、S2、S4、S5、S7、S8、S10、S11のうちの少なくとも1つに閾値Bを超えるものがあるか否かを判別する。 First, in step S41, the IC 12A sequentially scans the sensing units SE1 to SE11, acquires detection signals S1 to S11 of the sensing units SE1 to SE11, and supplies the detection signals S1 to S11 to the CPU 12B. Next, in step S42, the CPU 12B determines whether or not at least one of the detection signals S3, S6, and S9 supplied from the IC 12A exceeds the threshold A. If it is determined in step S42 that at least one of the detection signals S3, S6, and S9 does not exceed the threshold A, the CPU 12B returns the process to step S41. If it is determined in step S42 that at least one of the detection signals S3, S6, and S9 exceeds the threshold A, the CPU 12B detects any signal other than the detection signals S3, S6, and S9 in step S43. It is determined whether or not at least one of the signals S1, S2, S4, S5, S7, S8, S10, and S11 exceeds the threshold B.
 ステップS43にて検出信号S1、S2、S4、S5、S7、S8、S10、S11のうちの少なくとも1つに閾値Bを超えるものがあると判別された場合には、ステップS44において、CPU12Bは、電子機器10に曲げまたはねじりが加えられていると判断する。そして、ステップS45において、CPU12Bは、電子機器10に曲げまたはねじりが加えられていることをユーザに警告する画面(図13A参照)を表示し、処理をステップS41に戻す。ステップS43にて検出信号S1、S2、S4、S5、S7、S8、S10、S11のうちの少なくとも1つに閾値Bを超えるものがないと判別された場合には、ステップS46において、CPU12Bは、検出信号S1、S2、S4、S5、S7、S8、S10、S11のうちの少なくとも1つに閾値-Cを超えるものがあるか否かを判別する。 If it is determined in step S43 that at least one of the detection signals S1, S2, S4, S5, S7, S8, S10, and S11 exceeds the threshold B, the CPU 12B determines in step S44 that It is determined that the electronic device 10 is bent or twisted. Then, in step S45, the CPU 12B displays a screen (see FIG. 13A) for warning the user that bending or twisting has been applied to the electronic device 10, and returns the process to step S41. If it is determined in step S43 that at least one of the detection signals S1, S2, S4, S5, S7, S8, S10 and S11 does not exceed the threshold B, the CPU 12B determines in step S46 that It is determined whether or not at least one of the detection signals S1, S2, S4, S5, S7, S8, S10, and S11 exceeds the threshold -C.
 ステップS46にて検出信号S1、S2、S4、S5、S7、S8、S10、S11のうちの少なくとも1つに閾値-Cを超えるものがあると判別された場合には、CPU12Bは、ステップS44、45の処理を実行した後、処理をステップS41に戻す。ステップS46にて検出信号S1、S2、S4、S5、S7、S8、S10、S11のうちの少なくとも1つに閾値-Cを超えるものがないと判別された場合には、CPU12Bは、検出信号S3、S6、S9のうち最も信号レベルの高い信号が検出されたセンシング部SEに対応する処理を実行し、処理をステップS41に戻す。 If it is determined in step S46 that at least one of the detection signals S1, S2, S4, S5, S7, S8, S10, and S11 exceeds the threshold -C, the CPU 12B proceeds to step S44. After the processing of 45 is performed, the processing returns to step S41. If it is determined in step S46 that at least one of the detection signals S1, S2, S4, S5, S7, S8, S10, and S11 does not exceed the threshold -C, the CPU 12B detects the detection signal S3. The processing corresponding to the sensing unit SE in which the signal with the highest signal level is detected among S6 and S9 is executed, and the processing is returned to step S41.
[効果]
 第3の実施形態に係る電子機器210は、側壁部11Rの内側面11SBに配置されたユーザ操作検出用のセンシング部SEと、底部11Mの内側面に配置された誤動作補償用のセンシング部SEと、フロントパネル13の内側面に配置された誤動作補償用のセンシング部SEとを備える。これにより、電子機器210の誤動作を抑制することができる。
[effect]
The electronic device 210 according to the third embodiment includes a sensing unit SE for user operation detection disposed on the inner side surface 11SB of the side wall 11R, and a sensing unit SE for malfunction correction disposed on the inner side surface of the bottom portion 11M. And a sensing unit SE disposed on the inner side surface of the front panel 13 for malfunction compensation. Thereby, the malfunction of the electronic device 210 can be suppressed.
[変形例]
(変形例1)
 上述の第3の実施形態では、センサ220が相互容量方式である場合について説明したが、センサ220が自己容量方式であってもよい。
[Modification]
(Modification 1)
Although the above-described third embodiment has described the case where the sensors 220 are of mutual capacitance type, the sensors 220 may be of self-capacitance type.
 図34は、自己容量方式のセンサ電極層230Aの構成を示す平面図である。センサ電極層230Aは、基材231と、基材231の一方の主面に設けられた複数の電極234、235を備え、これらの電極234、235それぞれによりセンシング部SE1~SE11が構成されている。センシング部SE1~SE11はいずれも、薄膜状の電極である。センシング部SE3、SE6、SE9は、菱形の薄膜状を有する電極234により構成されている。但し、電極234の形状は菱形に限定されるものではなく、円形、楕円形、菱形以外の多角形または不定形等であってもよい。センシング部SE1、SE2、SE4、SE5、SE7、SE8、SE10、SE11は、長方形の一方の短辺をV字状に尖らせた五角形の薄膜状を有する電極235により構成されている。但し、電極235は上記形状に限定されるものではなく、長円状、五角形以外の多角形(例えば長方形)または不定形等であってもよい。 FIG. 34 is a plan view showing the configuration of a self-capacitance sensor electrode layer 230A. The sensor electrode layer 230A includes a base material 231 and a plurality of electrodes 234 and 235 provided on one main surface of the base material 231, and these electrodes 234 and 235 constitute sensing parts SE1 to SE11. . Each of the sensing units SE1 to SE11 is a thin film electrode. The sensing portions SE3, SE6, and SE9 are each constituted of an electrode 234 having a thin film shape of a rhombus. However, the shape of the electrode 234 is not limited to the rhombus, and may be a circle, an ellipse, a polygon other than the rhombus, or an irregular shape. The sensing sections SE1, SE2, SE4, SE5, SE7, SE8, SE10, and SE11 are each formed of an electrode 235 having a pentagonal thin film shape in which one short side of a rectangle is sharpened in a V shape. However, the electrode 235 is not limited to the above shape, and may be an oval, a polygon other than a pentagon (for example, a rectangle), an irregular shape, or the like.
 センシング部SE3、SE6、SE9から配線234Aが引き出され、コネクタ42に電気的に接続されている。また、センシング部SE1、SE2、SE4、SE5、SE7、SE8、SE10、SE11から配線235Aが引き出され、コネクタ42に電気的に接続されている。 The wiring 234A is drawn out from the sensing units SE3, SE6, SE9, and is electrically connected to the connector 42. Further, the wiring 235A is drawn out from the sensing units SE1, SE2, SE4, SE5, SE7, SE8, SE10, and SE11, and is electrically connected to the connector 42.
(変形例2)
 センサ220が、弾性層223に代えて、柱状を有する複数の支持体を備えるようにしてもよい。支持体は、例えば、隣接するセンシング部SE間に設けられる。
(Modification 2)
The sensor 220 may be replaced with the elastic layer 223, and may be provided with a plurality of supports having a columnar shape. The support is provided, for example, between adjacent sensing units SE.
(変形例3)
 センサ220は、略L字状に湾曲されたものであってもよい。この場合、センサ220は、第1領域R1と、第2領域R2および第3領域R3のうちの一方の領域とを有する。
(Modification 3)
The sensor 220 may be curved in a substantially L shape. In this case, the sensor 220 has a first region R1 and one of the second region R2 and the third region R3.
<4 第4の実施形態>
[電子機器の構成]
 図35Aは、本開示の第4の実施形態に係る電子機器310の内部構成を示す。電子機器310は、いわゆるスマートフォンであり、筐体311、センサモジュール320および基板312等を備える。なお、第4の実施形態において、第1の実施形態と同様の箇所には同一の符号を付して説明を適宜省略する。
<4 Fourth Embodiment>
[Configuration of electronic device]
FIG. 35A shows an internal configuration of the electronic device 310 according to the fourth embodiment of the present disclosure. The electronic device 310 is a so-called smart phone, and includes a housing 311, a sensor module 320, a substrate 312, and the like. In the fourth embodiment, the same parts as those in the first embodiment are indicated by the same reference numerals and the description will be omitted as appropriate.
(筐体)
 筐体311は、側壁部311L、311Rを有し、一方の側壁部311Lには、長尺状のスリット部311Aが設けられている。スリット部311Aは、スリット部311Aの幅方向(短手方向)が側壁部311Lの高さ方向となり、スリット部311Aの長手方向が側壁部311Lの長さ方向になるように設けられている。
(Housing)
The housing 311 has side wall portions 311L and 311R, and one long side wall portion 311L is provided with a long slit portion 311A. The slit portion 311A is provided such that the width direction (short side direction) of the slit portion 311A is the height direction of the side wall portion 311L, and the longitudinal direction of the slit portion 311A is the length direction of the side wall portion 311L.
 側壁部311Lの外側面311SAには、側壁部311Lの長さ方向に一列に並ぶようにして3つのボタン(図示せず)が設けられている。これらの3つのボタンは、第1の実施形態におけるボタンBT1、BT2、BT3(図1参照)に相当する。側壁部311Lの上部には、スリット部311Aに隣接して斜面状のエリア311ARが設けられており、このエリア311ARに防水テープ(図示せず)が設けられる。 Three buttons (not shown) are provided on the outer side surface 311SA of the side wall 311L so as to be aligned in the longitudinal direction of the side wall 311L. These three buttons correspond to the buttons BT1, BT2 and BT3 (see FIG. 1) in the first embodiment. In the upper portion of the side wall portion 311L, a sloped area 311AR is provided adjacent to the slit portion 311A, and a waterproof tape (not shown) is provided in the area 311AR.
(センサモジュール)
 図36は、センサモジュール320の外観を示す斜視図である。センサモジュール320は、長尺のセンサ部321と、センサ部321の一方の長辺部から延設された接続部41とを備える。接続部41が有するコネクタ(図示せず)は、基板312に設けられたコネクタ(図示せず)に接続されている。
(Sensor module)
FIG. 36 is a perspective view showing the appearance of the sensor module 320. As shown in FIG. The sensor module 320 includes a long sensor portion 321 and a connection portion 41 extended from one long side of the sensor portion 321. A connector (not shown) of the connection portion 41 is connected to a connector (not shown) provided on the substrate 312.
(センサ部)
 図35Bは、図35AのXXXVB-XXXVB線に沿った断面図である。センサ部321は、センサ20と、センサ20の裏面に設けられた弾性体51と、弾性体51を支持するホルダ321Aとを備える。センサ20と弾性体51とは接着層(図示せず)により貼り合わされ、弾性体51とホルダ321Aとは接着層(図示せず)により貼り合わされている。センサ20および接続部41は、第1の実施形態にて説明したように、T字状を有する1つのFPC40により一体的に構成されている。
(Sensor section)
FIG. 35B is a cross-sectional view along the line XXXVB-XXXVB in FIG. 35A. The sensor unit 321 includes the sensor 20, an elastic body 51 provided on the back surface of the sensor 20, and a holder 321A that supports the elastic body 51. The sensor 20 and the elastic body 51 are bonded by an adhesive layer (not shown), and the elastic body 51 and the holder 321A are bonded by an adhesive layer (not shown). As described in the first embodiment, the sensor 20 and the connection unit 41 are integrally configured by one T-shaped FPC 40.
 センサ部321は、押圧を検出するセンシング面(第1の面)321S1と、それとは反対側の裏面(第2の面)321S2とを有している。センサ部321は、センシング面321S1が側壁部311Lの外側面311SAの方向を向くようにしてスリット部311Aに圧入されている。スリット部311Aは、センサ部321を側壁部311L内に収容するための収容部の一例である。 Sensor 321 has a sensing surface for detecting a pressing (first surface) 321S 1, it and the 2 opposite the back surface (second surface) 321S is. Sensor unit 321 is press-fitted into the slit portion 311A sensing surface 321S 1 thereof faces the direction of the outer surface 311SA of the side wall portion 311L. The slit portion 311A is an example of a housing portion for housing the sensor portion 321 in the side wall portion 311L.
(弾性体)
 弾性体51は、センサ部321を厚み方向に押圧することにより弾性変形可能に構成されており、スリット部311Aにセンサ部321を圧入する際に圧縮される。
(Elastic body)
The elastic body 51 is configured to be elastically deformable by pressing the sensor portion 321 in the thickness direction, and is compressed when the sensor portion 321 is pressed into the slit portion 311A.
(ホルダ)
 ホルダ321Aは、裏面321S2側にて弾性体51を支持すると共に、裏面321S2の剛性を高めるためのものである。センサ部321がこのような機能を有するホルダ321Aを備えることで、スリット部311Aにセンサ部321を容易に圧入することができる。ホルダ321Aは、長尺の矩形状を有し、弾性体51が貼り合わされる主面部321A1と、弾性体51の周囲を囲むように主面部321A1の各辺に設けられた壁部321A2とを有する。
(holder)
Holder 321A is configured to support the elastic member 51 at the rear surface 321S 2 side, in order to increase the rigidity of the back surface 321S 2. Since the sensor unit 321 includes the holder 321A having such a function, the sensor unit 321 can be easily press-fit into the slit unit 311A. Holder 321A has a rectangular elongated, elastic body 51 and the main surface portion 321A 1 which is bonded, the wall portion 321A 2 provided on each side of the main surface portion 321A 1 so as to surround the periphery of the elastic body 51 And.
 ホルダ321Aの材料としては、例えば、金属、高分子樹脂、セラミックスまたは木材等の、軽量かつ高剛性の材料を用いることができる。なお、これらの材料を2種以上積層して用いてもよい。金属としては、金属層21、22と同様の材料を例示することができる。但し、金属層21、22の材料として例示した以外の、導電性の低い金属を用いてもよい。高分子樹脂としては、基材31と同様の材料を例示することができる。セラミックスとしては、例えば、多孔質アルミナセラミックスまたはジルコニア等を用いることができる。 As a material of the holder 321A, for example, a lightweight and highly rigid material such as metal, polymer resin, ceramics or wood can be used. In addition, you may laminate | stack and use 2 or more types of these materials. As a metal, the material similar to the metal layers 21 and 22 can be illustrated. However, metals having low conductivity other than those exemplified as the material of the metal layers 21 and 22 may be used. As polymer resin, the material similar to the base material 31 can be illustrated. As the ceramics, for example, porous alumina ceramics or zirconia can be used.
(基板)
 基板312は、センサ20を制御し、センサ20のセンシング面20Sに加わる圧力を検出するIC(図示せず)を備える。基板312は、電子機器310の全体を制御するCPUを備えるメイン基板(図示せず)に接続されている。IC、CPUはそれぞれ、第1の実施形態におけるIC12A、CPU12Bと同様である。
(substrate)
The substrate 312 includes an IC (not shown) that controls the sensor 20 and detects the pressure applied to the sensing surface 20S of the sensor 20. The substrate 312 is connected to a main substrate (not shown) including a CPU that controls the entire electronic device 310. The IC and the CPU are respectively similar to the IC 12A and the CPU 12B in the first embodiment.
[効果]
 第4の実施形態に係る電子機器310では、第1の実施形態と同様に、誤動作を抑制することができる。
[effect]
In the electronic device 310 according to the fourth embodiment, as in the first embodiment, a malfunction can be suppressed.
 また、センサ部321が、センサ20と、センサ20の裏面側に設けられた弾性体51と、弾性体51を支持するホルダ321Aとを備える。これにより、センサモジュール320のセンサ部321をスリット部311Aに圧入することができる。したがって、スリット部311Aおよびセンサ部321の寸法公差を吸収することができる。 Further, the sensor unit 321 includes the sensor 20, an elastic body 51 provided on the back surface side of the sensor 20, and a holder 321A that supports the elastic body 51. Thus, the sensor portion 321 of the sensor module 320 can be press-fit into the slit portion 311A. Therefore, dimensional tolerances of the slit portion 311A and the sensor portion 321 can be absorbed.
 また、スリット部311Aにセンサモジュール320のセンサ部321を圧入するだけで、側壁部311Lにセンサモジュール320を取り付けることができる。したがって、センサモジュール320の取り付けが容易であり、生産性を向上することができる。 Further, the sensor module 320 can be attached to the side wall portion 311L only by press-fitting the sensor portion 321 of the sensor module 320 into the slit portion 311A. Therefore, attachment of the sensor module 320 is easy, and productivity can be improved.
<5 第5の実施形態>
[電子機器の構成]
 図37は、本開示の第5の実施形態に係る電子機器410の内部構成を示す。電子機器410は、筐体411、センサモジュール420および補強材(ブレース)430等を備える。なお、第5の実施形態において、第1の実施形態と同様の箇所には同一の符号を付して説明を適宜省略する。
<5 Fifth Embodiment>
[Configuration of electronic device]
FIG. 37 shows an internal configuration of the electronic device 410 according to the fifth embodiment of the present disclosure. The electronic device 410 includes a housing 411, a sensor module 420, a reinforcing material (brace) 430, and the like. In the fifth embodiment, the same parts as those in the first embodiment are indicated by the same reference numerals and the explanation will be appropriately omitted.
(筐体)
 筐体411は、側壁部411Lを有し、この側壁部411Lの内側には、当該側壁部411Lに沿って延設された長尺の溝部412が設けられている。溝部412の一方の端部の外側には穴部413Aおよび突起414Aが設けられ、他方の端部の外側には穴部413Bおよび突起414Bが設けられている。
(Housing)
The housing 411 has a side wall 411L, and a long groove 412 extending along the side wall 411L is provided inside the side wall 411L. A hole 413A and a protrusion 414A are provided on the outside of one end of the groove 412, and a hole 413B and a protrusion 414B are provided on the outside of the other end.
 側壁部411Lの外側面411SAには、側壁部411Lの長さ方向に一列に並ぶようにして3つのボタン(図示せず)が設けられている。これらの3つのボタンは、第1の実施形態におけるボタンBT1、BT2、BT3(図1参照)に相当する。 Three buttons (not shown) are provided on the outer side surface 411SA of the side wall 411L so as to be aligned in the longitudinal direction of the side wall 411L. These three buttons correspond to the buttons BT1, BT2 and BT3 (see FIG. 1) in the first embodiment.
(センサモジュール)
 センサモジュール420は、長尺のセンサ部421と、センサ部421の一方の長辺部から延設された接続部41とを備える。接続部41が有するコネクタ(図示せず)は、基板(図示せず)に設けられたコネクタに接続されている。
(Sensor module)
The sensor module 420 includes a long sensor portion 421 and a connection portion 41 extended from one long side of the sensor portion 421. A connector (not shown) of the connection portion 41 is connected to a connector provided on a substrate (not shown).
 図38は、側壁部411Lの近傍の構成を示す。センサ部421は、センサ20と、センサ20の裏面に設けられた弾性体(クッション層)51と、弾性体51を支持する支持体(バッカー)421Aとを備える。センサ20と弾性体51とは接着層(図示せず)により貼り合わされ、弾性体51と支持体421Aとは接着層(図示せず)により貼り合わされている。 FIG. 38 shows the configuration in the vicinity of the side wall 411L. The sensor unit 421 includes the sensor 20, an elastic body (cushion layer) 51 provided on the back surface of the sensor 20, and a support (backer) 421A that supports the elastic body 51. The sensor 20 and the elastic body 51 are bonded by an adhesive layer (not shown), and the elastic body 51 and the support body 421A are bonded by an adhesive layer (not shown).
 センサ部421は、押圧を検出するセンシング面(第1の面)421S1と、それとは反対側の裏面(第2の面)421S2とを有している。センサ部421は、センシング面421S1が側壁部411Lの内側面411SBに対向するようにして溝部412に嵌め合わされている。 Sensor unit 421 includes a sensing surface for detecting a pressing (first surface) 421S 1, it and the 2 opposite the back surface (second surface) 421S is. Sensor unit 421, the sensing surface 421S 1 is fitted into the groove 412 so as to face the inner surface 411SB of the side wall portion 411L.
 支持体421Aは、裏面421S2側にて弾性体51を支持すると共に、裏面421S2の剛性を高めるためのものである。センサ部421がこのような機能を有する支持体421Aを備えることで、溝部412にセンサ部421を嵌め合わせることが可能となる。 Support 421A is configured to support the elastic member 51 at the rear surface 421S 2 side, in order to increase the rigidity of the back surface 421S 2. When the sensor unit 421 includes the support 421A having such a function, the sensor unit 421 can be fitted to the groove portion 412.
 支持体421Aの裏面421S2を構成する面には、複数の突起421Bが設けられており、これらの突起421Bが溝部412の側壁の内側に押し入れられている。これにより、側壁部411Lの内側面411SBにセンシング面421S1が押し付けられる状態とすることができる。支持体421Aの材料としては、ホルダ321Aの材料と同様のものを例示することができる。 The surface constituting the rear surface 421S 2 of the support 421A has a plurality of projections 421B are provided, these projections 421B are pushed into the inside of the side wall of the groove 412. Thus, it is possible to state that the sensing surface 421S 1 is pressed against the inner surface 411SB of the side wall portion 411L. As a material of the support body 421A, the same material as the material of the holder 321A can be exemplified.
(補強材)
 補強材430は、溝部412に嵌め合わされたセンサ部421の上部および裏面を覆う。補強材430がこのようにセンサ部421を覆うことで、電子機器410内に収容された他の構成部材がセンサ部421に接触し、センサ部421が誤動作を起こすことを抑制することができる。補強材430は長尺状を有し、補強材430の両端はネジ433A、433Bおよび突起414A、414Bにより固定されている。具体的には、補強材430の長手方向の両端部には貫通孔431A、431Bおよび貫通孔432A、432Bが設けられている。ネジ433A、433Bがそれぞれ、貫通孔431A、431Bに挿入されると共に、穴部413A、413Bにねじ込まれている。また、突起414A、414Bがそれぞれ、貫通孔432A、432Bに挿入されている。突起414A、414Bおよび貫通孔432A、432Bは、センサモジュール420の取り付けの際に、補強材430をセンサ部421上の規定位置にガイドする部材としての機能も有する。
(Reinforcement)
The reinforcing material 430 covers the top and the back of the sensor portion 421 fitted in the groove 412. By covering the sensor portion 421 with the reinforcing member 430 in this manner, it is possible to suppress the sensor portion 421 from malfunctioning due to contact with the other component members accommodated in the electronic device 410. The reinforcing member 430 has an elongated shape, and both ends of the reinforcing member 430 are fixed by screws 433A and 433B and protrusions 414A and 414B. Specifically, through holes 431A, 431B and through holes 432A, 432B are provided at both ends in the longitudinal direction of the reinforcing material 430. Screws 433A and 433B are respectively inserted into the through holes 431A and 431B and screwed into the holes 413A and 413B. The protrusions 414A and 414B are inserted into the through holes 432A and 432B, respectively. The protrusions 414 A, 414 B and the through holes 432 A, 432 B also have a function as a member for guiding the reinforcing member 430 to a prescribed position on the sensor portion 421 when the sensor module 420 is attached.
 補強材430と側壁部411Lの上部の境界部分は面一の斜面となっており、この境界部分を含むエリア411ARに防水テープ(図示せず)が設けられる。 The boundary between the reinforcing member 430 and the upper portion of the side wall 411L is a flat slope, and a waterproof tape (not shown) is provided in an area 411AR including the boundary.
[センサモジュールの取り付け方法]
 以下、図39A、図39B、図40A、図40Bを参照して、センサモジュール420の取り付け方法を説明する。
[How to attach sensor module]
Hereinafter, the method of attaching the sensor module 420 will be described with reference to FIGS. 39A, 39B, 40A, and 40B.
 まず、図39A、図39Bに示すように、センサ部421のセンシング面421S1を側壁部411Lの内側面411SBに押し当て、裏面421S2側からセンサ部421を押圧し弾性体51を圧縮しつつ、複数の突起421Bを溝部412の側壁の内側に押し入れることにより、センサ部421を溝部412に嵌め合わせる。 First, FIG. 39A, as shown in FIG. 39B, the sensing surface 421S 1 of the sensor portion 421 is pressed against the inner surface 411SB of the side wall portions 411L, while the sensor unit 421 from the rear surface 421S 2 side compresses the pressed elastic member 51 The sensor portion 421 is fitted to the groove portion 412 by pushing the plurality of protrusions 421 B into the inside of the side wall of the groove portion 412.
 次に、図40A、図40Bに示すように、突起414A、414Bにそれぞれ補強材430の貫通孔432A、432Bを挿入し、センサ部421上の規定位置に補強材430を配置する。その後、ネジ433A、433Bを補強材430の貫通孔431A、431Bに挿入し、穴部413A、413Bにねじ込む。これにより、補強材430がセンサ部421上の規定位置に固定される。 Next, as shown in FIGS. 40A and 40B, the through holes 432A and 432B of the reinforcing material 430 are inserted into the protrusions 414A and 414B, respectively, and the reinforcing material 430 is disposed at a prescribed position on the sensor unit 421. Thereafter, the screws 433A, 433B are inserted into the through holes 431A, 431B of the reinforcing member 430, and screwed into the holes 413A, 413B. As a result, the reinforcing material 430 is fixed at a prescribed position on the sensor unit 421.
[効果]
 第5の実施形態に係る電子機器410では、第1の実施形態と同様に、誤動作を抑制することができる。
[effect]
In the electronic device 410 according to the fifth embodiment, as in the first embodiment, a malfunction can be suppressed.
 また、センサ部421が、センサ20と、センサ20の裏面側に設けられた弾性体51と、弾性体51を支持する支持体421Aとを備える。これにより、弾性体51を圧縮しセンサ部421を溝部412に嵌め合わせることができる。したがって、溝部412およびセンサ部421の寸法公差を吸収することができる。 Further, the sensor unit 421 includes the sensor 20, an elastic body 51 provided on the back surface side of the sensor 20, and a support 421A that supports the elastic body 51. Thus, the elastic body 51 can be compressed to fit the sensor portion 421 into the groove portion 412. Therefore, dimensional tolerances of the groove portion 412 and the sensor portion 421 can be absorbed.
 また、溝部412にセンサモジュール420のセンサ部421を嵌め合わせることにより、センサモジュール420を側壁部411Lの内側の規定位置に取り付けることができる。したがって、センサモジュール420の取り付けが容易であり、生産性を向上することができる。 Further, by fitting the sensor part 421 of the sensor module 420 into the groove part 412, the sensor module 420 can be attached to a prescribed position inside the side wall part 411L. Therefore, attachment of the sensor module 420 is easy, and productivity can be improved.
<6 第6の実施形態>
[電子機器の構成]
 図41Aは、本開示の第6の実施形態に係る電子機器510の構成を示す。図41Bは、図41Aに示したセンサ520を展開した状態を示す。電子機器510は、FPC521をベースとしたセンサ520を備える。センサ520は、具体的には、FPC521と、複数の支持体522と、複数の支持体23とを備える。なお、第6の実施形態において、第1の実施形態と同様の箇所には同一の符号を付して説明を適宜省略する。
<6 Sixth Embodiment>
[Configuration of electronic device]
FIG. 41A shows a configuration of an electronic device 510 according to the sixth embodiment of the present disclosure. FIG. 41B shows a state in which the sensor 520 shown in FIG. 41A is expanded. The electronic device 510 includes a sensor 520 based on the FPC 521. Specifically, the sensor 520 includes an FPC 521, a plurality of supports 522, and a plurality of supports 23. In the sixth embodiment, the same parts as those in the first embodiment are indicated by the same reference numerals and the description will be omitted as appropriate.
 図42は、FPC521の構成を示す。FPC521は、長尺状のセンサ部521Aと、センサ部521Aの一方の長辺から延設された接続部521Bとを備える。接続部521Bの先端には、センサ520を基板に接続するためのコネクタ521Cが設けられている。FPC521のセンサ部521Aには、リファレンス電極エリア(以下「REFエリア」という。)521A1、折返しエリア521A2、REFエリア521A3、折返しエリア521A4、センサ電極エリア521A5が、長手方向の一端から他端に向かってこの順序で設けられている。 FIG. 42 shows the structure of the FPC 521. The FPC 521 includes an elongated sensor portion 521A and a connection portion 521B extended from one long side of the sensor portion 521A. At the tip of the connection portion 521B, a connector 521C for connecting the sensor 520 to the substrate is provided. Reference electrode area (hereinafter referred to as “REF area”) 521A 1 , folded area 521A 2 , REF area 521A 3 , folded area 521A 4 , and sensor electrode area 521A 5 in the sensor section 521A of the FPC 521 from one end in the longitudinal direction The other end is provided in this order.
 FPC521のセンサ部521Aは、REFエリア521A1とセンサ電極エリア521A5とが対向し、REFエリア521A3とセンサ電極エリア521A5とが対向するように折り畳まれている。REFエリア521A1とセンサ電極エリア521A5の間に複数の支持体522が設けられ、REFエリア521A3とセンサ電極エリア521A5Cの間に複数の支持体23が設けられている。 Sensor portion of FPC521 521A faces and the REF areas 521A 1 and the sensor electrode area 521A 5, and the REF areas 521A 3 and the sensor electrode area 521A 5 are folded to face. REF area 521A 1 and a plurality of supports 522 between the sensor electrode area 521A 5 is provided, REF area 521A 3 and the sensor electrode area 521A 5 C plurality of supports 23 between is provided.
 折返しエリア521A2は、REFエリア521A1とREFエリア521A3の間でFPC521を折り返すためのエリアである。折返しエリア521A4は、REFエリア521A3とセンサ電極エリア521A5との間でFPC521を折り返すためのエリアである。 Folding area 521A 2 is an area for folding the FPC521 between REF areas 521A 1 and REF areas 521A 3. Folded area 521A 4 is an area for folding the FPC521 between REF area 521A 3 and the sensor electrode area 521A 5.
 REFエリア521A1は、第1の実施形態における金属層(リファレンス電極層)22に相当するエリアであり、金属層22を含んでいる。REFエリア521A3は、第1の実施形態における金属層(リファレンス電極層)21に相当するエリアであり、金属層21を含んでいる。センサ電極エリア521A5は、第1の実施形態におけるセンサ電極層30に相当するエリアであり、センシング部SE1~SE7を含んでいる。 REF area 521A 1, the metal layer in the first embodiment is an area corresponding to the (reference electrode layer) 22, a metal layer 22. REF area 521A 3, the metal layer in the first embodiment is an area corresponding to the (reference electrode layer) 21 comprises a metal layer 21. Sensor electrode area 521A 5 is an area corresponding to the sensor electrode layer 30 in the first embodiment, includes a sensing unit SE1 ~ SE7.
 支持体522は、REFエリア521A1上においてセンサ電極エリア521A5を支持し、REFエリア521A1とセンサ電極エリア521A5の間を離間する。支持体23は、センサ電極エリア521A5上においてREFエリア521A3を支持し、センサ電極エリア521A5とREFエリア521A3の間を離間する。 Support 522 supports the sensor electrode area 521A 5 on REF area 521A 1, spaced between the REF areas 521A 1 and the sensor electrode area 521A 5. Support 23 supports the REF area 521A 3 the sensor electrode area 521A on 5, spaced between the sensor electrode area 521A 5 and REF areas 521A 3.
 複数の支持体522は、センサ520の長手方向に所定の間隔離して一列に配置され、隣接する支持体522の間に空間が設けられている。この空間上にセンシング部SEが設けられている。複数の支持体23は、センサ520の長手方向に所定の間隔離して一列に配置され、隣接する支持体522の間に空間が設けられている。この空間下にセンシング部SEが設けられている。 The plurality of supports 522 are arranged in a row at predetermined intervals in the longitudinal direction of the sensor 520, and a space is provided between the adjacent supports 522. A sensing unit SE is provided on this space. The plurality of supports 23 are arranged in a row at predetermined intervals in the longitudinal direction of the sensor 520, and a space is provided between the adjacent supports 522. Below this space, a sensing unit SE is provided.
 支持体522の材料としては、支持体23と同様のものを例示することができる。 As a material of the support 522, the same material as the support 23 can be exemplified.
 センシング部SE1~SE7は、FPC521上に設けられた配線(図示せず)を介して、コネクタ521Cの信号端子に接続されている。また、金属層21、22は、FPC521上に設けられた配線(図示せず)を介して、コネクタ521Cのグランド(GND)端子に接続されている。 The sensing units SE1 to SE7 are connected to the signal terminal of the connector 521C via a wire (not shown) provided on the FPC 521. The metal layers 21 and 22 are connected to the ground (GND) terminal of the connector 521C via a wire (not shown) provided on the FPC 521.
[効果]
 第6の実施形態に係るセンサ520では、第1の実施形態における金属層21、金属層22およびセンサ電極層30に相当するものを、1つのFPC521により構成することができる。したがって、第1の実施形態に係るセンサ20よりも部品点数を削減することができる。
[effect]
In the sensor 520 according to the sixth embodiment, one equivalent to the metal layer 21, the metal layer 22 and the sensor electrode layer 30 in the first embodiment can be configured by one FPC 521. Therefore, the number of parts can be reduced more than the sensor 20 according to the first embodiment.
 金属層21、22は、FPC521上に設けられた配線を介して、コネクタ521Cのグランド(GND)端子に接続されている。したがって、第1の実施形態におけるセンサ20のように、ACF等の導通部材を別途備えなくてもよくなるため、センサ520の構成を簡略化することができる。 The metal layers 21 and 22 are connected to the ground (GND) terminal of the connector 521C via a wire provided on the FPC 521. Therefore, unlike the sensor 20 in the first embodiment, a conductive member such as an ACF does not have to be separately provided, so that the configuration of the sensor 520 can be simplified.
[変形例]
(変形例1)
 第6の実施形態では、REFエリア521A1、REFエリア521A3およびセンサ電極エリア521A5が1つのFPCに設けられた構成について説明したが、センサ520の構成はこれに限定されるものではない。例えば、REFエリア521A1、REFエリア521A3およびセンサ電極エリア521A5がそれぞれ別のFPCに設けられた構成としてもよい。以下、このような構成を有するセンサについて説明する。
[Modification]
(Modification 1)
Although the sixth embodiment has described the configuration in which the REF area 521A 1 , the REF area 521A 3, and the sensor electrode area 521A 5 are provided in one FPC, the configuration of the sensor 520 is not limited to this. For example, the REF area 521A 1 , the REF area 521A 3, and the sensor electrode area 521A 5 may be provided in different FPCs. Hereinafter, a sensor having such a configuration will be described.
 図43は、変形例に係るセンサ550の構成を示す。センサ550は、金属層21を含む長尺状のFPC551と、FPC551上に設けられた支持層552と、支持層552上に設けられ、センシング部SE1~SE7を含む長尺状のFPC553と、FPC553上に設けられた支持層554と、支持層554上に設けられ、金属層22を含む長尺状のFPC555とを備える。 FIG. 43 shows the configuration of a sensor 550 according to a modification. The sensor 550 is provided on the long FPC 551 including the metal layer 21, the support layer 552 provided on the FPC 551, and the support layer 552, and includes the long FPC 531 including the sensing portions SE 1 to SE 7, and the FPC 553. A support layer 554 provided thereon and an elongated FPC 555 provided on the support layer 554 and including the metal layer 22 are provided.
 支持層552は、FPC551上においてFPC553を支持し、FPC551とFPC553との間を離間する。支持層552は、FPC553が有するセンシング部SEとFPC551との間に空間を有する。より具体的には、支持層552は、複数の支持体552Aを備えている。複数の支持体552Aは、第1の実施形態の変形例1における支持体25と同様である。 The support layer 552 supports the FPC 553 on the FPC 551 and separates the FPC 551 from the FPC 553. The support layer 552 has a space between the sensing unit SE of the FPC 553 and the FPC 551. More specifically, the support layer 552 includes a plurality of supports 552A. The plurality of supports 552A are the same as the support 25 in the first modification of the first embodiment.
 支持層554は、FPC553上においてFPC555を支持し、FPC553とFPC555との間を離間する。支持層554は、FPC553が有するセンシング部SEとFPC555との間に空間を有する。より具体的には、支持層554は、複数の支持体554Aを備えている。複数の支持体554Aは、第1の実施形態における支持体23と同様である。 The support layer 554 supports the FPC 555 on the FPC 553 and separates the FPC 553 from the FPC 555. The support layer 554 has a space between the sensing unit SE of the FPC 553 and the FPC 555. More specifically, the support layer 554 includes a plurality of supports 554A. The plurality of supports 554A are similar to the support 23 in the first embodiment.
 FPC553の一方の端部には、グランドパッド553Aが設けられている。グランドパッド553AとFPC551の一方の端部とが接着剤により接続され、グランドパッド553AとFPC555の一方の端部とが接着剤により接続されている。また、グランドパッド553Aと、FPC551の一方の端部と、FPC555の一方の端部とが、スルーホール、ビア(VIA)またはブラインドビアホール(BVH)等の接続手段により電気的に接続されている。これにより、金属層21、22が接地されている。 A ground pad 553A is provided at one end of the FPC 553. The ground pad 553A and one end of the FPC 551 are connected by an adhesive, and the ground pad 553A and one end of the FPC 555 are connected by an adhesive. Further, the ground pad 553A, one end of the FPC 551, and one end of the FPC 555 are electrically connected by connection means such as a through hole, a via (VIA) or a blind via hole (BVH). Thereby, the metal layers 21 and 22 are grounded.
(変形例2)
 第6の実施形態においてセンサ520が、複数の支持体522に代えて弾性層を備えるようにしてもよいし、複数の支持体23に代えて弾性層を備えるようにしてもよい。また、第6の実施形態の変形例1においてセンサ550が、支持層552、554のうちの少なくとも1層に代えて弾性層を備えるようにしてもよい。なお、弾性層の材料としては、第1の実施形態の変形例1における弾性層と同様のものを例示することができる。
(Modification 2)
In the sixth embodiment, the sensor 520 may include an elastic layer instead of the plurality of supports 522, or may include an elastic layer instead of the plurality of supports 23. In the first modification of the sixth embodiment, the sensor 550 may include an elastic layer instead of at least one of the support layers 552 and 554. In addition, as a material of an elastic layer, the thing similar to the elastic layer in the modification 1 of 1st Embodiment can be illustrated.
<7 第7の実施形態>
[電子機器の構成]
 図44は、本開示の第7の実施形態に係る電子機器610の構成を示す断面図である。電子機器610は、第1のセンサ構造部620と、第1のセンサ構造部620上に設けられた第2のセンサ構造部630とを備える長尺状のセンサ610Aを備える。
<7 Seventh Embodiment>
[Configuration of electronic device]
FIG. 44 is a cross-sectional view showing a configuration of the electronic device 610 according to the seventh embodiment of the present disclosure. The electronic device 610 includes an elongated sensor 610A including a first sensor structure 620 and a second sensor structure 630 provided on the first sensor structure 620.
(第1のセンサ構造部)
 第1のセンサ構造部620は、金属層(第1のリファレンス電極層)621と、金属層621上に設けられた支持層(第1の支持層)622と、支持層622上に設けられたセンサ電極層(第1のセンサ電極層)623と、センサ電極層623上に設けられた支持層(第2の支持層)624と、支持層624上に設けられた金属層(第2のリファレンス電極層)625とを備える。
(First sensor structure)
The first sensor structure portion 620 is provided on the metal layer (first reference electrode layer) 621, the support layer (first support layer) 622 provided on the metal layer 621, and the support layer 622. A sensor electrode layer (first sensor electrode layer) 623, a support layer (second support layer) 624 provided on the sensor electrode layer 623, and a metal layer (second reference) provided on the support layer 624 And an electrode layer) 625.
 また、第1のセンサ構造部620は、センサ電極層623が一方の端部に有するグランドパッド623Aと金属層621とを接続するACF等の導電部材622Bと、グランドパッド623Aと金属層625とを接続するACF等の導電部材624Bとを備える。金属層621は、導電部材622Bおよびグランドパッド623Aを介して接地され、グランド電位とされる。また、金属層625は、導電部材624Bおよびグランドパッド623Aを介して接地され、グランド電位とされる。 In addition, the first sensor structure portion 620 includes a conductive member 622 B such as ACF connecting the ground pad 623 A which the sensor electrode layer 623 has at one end to the metal layer 621, the ground pad 623 A and the metal layer 625. And a conductive member 624B such as ACF to be connected. The metal layer 621 is grounded via the conductive member 622B and the ground pad 623A, and is set to the ground potential. In addition, the metal layer 625 is grounded via the conductive member 624B and the ground pad 623A, and is set to the ground potential.
(第2のセンサ構造部)
 第2のセンサ構造部630は、金属層(第2のリファレンス電極層)625上に設けられた支持層(第3の支持層)631と、支持層631上に設けられたセンサ電極層(第2のセンサ電極層)632と、センサ電極層632上に設けられた支持層(第4の支持層)633と、支持層633上に設けられた金属層(第3のリファレンス電極層)634とを備える。
(Second sensor structure)
The second sensor structure portion 630 includes a support layer (third support layer) 631 provided on the metal layer (second reference electrode layer) 625, and a sensor electrode layer (third support layer) provided on the support layer 631. 2), a support layer (fourth support layer) 633 provided on the sensor electrode layer 632, a metal layer (third reference electrode layer) 634 provided on the support layer 633, and Equipped with
 また、第2のセンサ構造部630は、センサ電極層632が一方の端部に有するグランドパッド632Aと金属層625とを接続するACF等の導電部材631Bと、グランドパッド632Aと金属層634とを接続するACF等の導電部材633Bとを備える。金属層625は、導電部材631Bおよびグランドパッド632Aを介して接地され、グランド電位とされる。また、金属層634は、導電部材633Bおよびグランドパッド632Aを介して接地され、グランド電位とされる。 In addition, the second sensor structure portion 630 includes a conductive member 631B such as ACF connecting the ground pad 632A which the sensor electrode layer 632 has at one end to the metal layer 625, the ground pad 632A and the metal layer 634 And a conductive member 633B such as ACF to be connected. The metal layer 625 is grounded via the conductive member 631B and the ground pad 632A, and is set to the ground potential. In addition, the metal layer 634 is grounded via the conductive member 633B and the ground pad 632A, and is set to the ground potential.
(支持層)
 支持層622は、金属層621上においてセンサ電極層623を支持し、金属層621とセンサ電極層623との間を離間する。支持層622は、センサ電極層623が有するセンシング部SEと金属層621との間に空間を有する。より具体的には、支持層622は、複数の支持体622Aを備えている。複数の支持体622Aは、第1の実施形態の変形例1における支持体25と同様である。
(Support layer)
The support layer 622 supports the sensor electrode layer 623 on the metal layer 621 and separates the metal layer 621 from the sensor electrode layer 623. The support layer 622 has a space between the sensing portion SE of the sensor electrode layer 623 and the metal layer 621. More specifically, the support layer 622 includes a plurality of supports 622A. The plurality of supports 622A are similar to the support 25 in the first modification of the first embodiment.
 支持層624は、センサ電極層623上において金属層625を支持し、センサ電極層623と金属層625との間を離間する。支持層624は、センサ電極層623が有するセンシング部SEと金属層625との間に空間を有する。より具体的には、支持層624は、複数の支持体624Aを備えている。複数の支持体624Aは、第1の実施形態における支持体23と同様である。 The support layer 624 supports the metal layer 625 on the sensor electrode layer 623 and separates the sensor electrode layer 623 from the metal layer 625. The support layer 624 has a space between the sensing portion SE of the sensor electrode layer 623 and the metal layer 625. More specifically, the support layer 624 includes a plurality of supports 624A. The plurality of supports 624A are similar to the support 23 in the first embodiment.
 支持層631は、金属層625上においてセンサ電極層632を支持し、金属層625とセンサ電極層632との間を離間する。支持層631は、センサ電極層632が有するセンシング部SEと金属層625との間に空間を有する。より具体的には、支持層631は、複数の支持体631Aを備えている。複数の支持体631Aは、第1の実施形態の変形例1における支持体25と同様である。 The support layer 631 supports the sensor electrode layer 632 on the metal layer 625 and separates the metal layer 625 from the sensor electrode layer 632. The support layer 631 has a space between the sensing portion SE of the sensor electrode layer 632 and the metal layer 625. More specifically, the support layer 631 includes a plurality of supports 631A. The plurality of supports 631A are the same as the support 25 in the first modification of the first embodiment.
 支持層633は、センサ電極層632上において金属層634を支持し、センサ電極層632と金属層634との間を離間する。支持層633は、センサ電極層632が有するセンシング部SEと金属層634との間に空間を有する。より具体的には、支持層633は、複数の支持体633Aを備えている。複数の支持体633Aは、第1の実施形態における支持体23と同様である。 The support layer 633 supports the metal layer 634 on the sensor electrode layer 632 and separates the sensor electrode layer 632 from the metal layer 634. The support layer 633 has a space between the sensing portion SE of the sensor electrode layer 632 and the metal layer 634. More specifically, the support layer 633 includes a plurality of supports 633A. The plurality of supports 633A are the same as the support 23 in the first embodiment.
(センサ電極層)
 センサ電極層623、632は、第1の実施形態におけるセンサ電極層30と同様である。すなわち、センサ電極層623、632は、FPCにより構成されている。
(Sensor electrode layer)
The sensor electrode layers 623 and 632 are similar to the sensor electrode layer 30 in the first embodiment. That is, the sensor electrode layers 623 and 632 are configured by the FPC.
(金属層)
 金属層621、625、634は、第1の実施形態における金属層21、22と同様である。
(Metal layer)
The metal layers 621, 625, 634 are similar to the metal layers 21, 22 in the first embodiment.
(IC)
 電子機器610は、ICおよびCPU(いずれも図示せず)を備える。ICは、センサ610Aが有する各センシング部SE、すなわちセンサ電極層623、632が有する各センシング部SEの静電容量の変化(圧力)を検出し、その結果に応じた信号をCPUに出力する。なお、ICが、センサ610Aの厚さ方向に重なる1組のセンシング部SEの静電容量の変化を加算し、その加算値に応じた信号を出力するようにしてもよい。
(IC)
The electronic device 610 includes an IC and a CPU (both not shown). The IC detects a change (pressure) in capacitance of each sensing unit SE of the sensor 610A, that is, each sensing unit SE of the sensor electrode layers 623, 632 and outputs a signal corresponding to the result to the CPU. Note that the IC may add the change of the electrostatic capacitance of a pair of sensing units SE overlapping in the thickness direction of the sensor 610A, and output a signal according to the added value.
[効果]
 第7の実施形態に係る電子機器610は、第1のセンサ構造部620と、第1のセンサ構造部620上に設けられた第2のセンサ構造部630とを備えるセンサ610Aを備える。これにより、ボタンBT1、BT2、BT3の押圧を、2つのセンサ電極層623、632のセンシング部SEにより検出することができる。したがって、ボタンBT1、BT2、BT3の検出感度を向上することができる。
[effect]
An electronic device 610 according to the seventh embodiment includes a sensor 610A including a first sensor structure 620 and a second sensor structure 630 provided on the first sensor structure 620. Thereby, the pressing of the buttons BT1, BT2, BT3 can be detected by the sensing part SE of the two sensor electrode layers 623, 632. Therefore, the detection sensitivity of the buttons BT1, BT2 and BT3 can be improved.
[変形例]
(変形例1)
 図45は、変形例に係るセンサ650の構成を示す断面図である。センサ650では、第1のセンサ構造部660は、長尺状の金属層621、625、634に代えて、長尺状のFPC661、662を備える。また、第2の構造部670は、長尺状の金属層634に代えて、長尺状のFPC671を備える。FPC661、662、671はそれぞれ、金属層621、625、634を含む。
[Modification]
(Modification 1)
FIG. 45 is a cross-sectional view showing a configuration of a sensor 650 according to a modification. In the sensor 650, the first sensor structure portion 660 includes long FPCs 661 and 662 instead of the long metal layers 621 625 and 634. In addition, the second structure portion 670 includes a long FPC 671 instead of the long metal layer 634. The FPCs 661, 662, 671 include metal layers 621, 625, 634, respectively.
 FPC661の一方の端部と、センサ電極層623のグランドパッド623Aと、FPC662の一方の端部と、センサ電極層632のグランドパッド632Aと、FPC671の一方の端部とが、接着剤622C、624C、631C、633Cにより接続されていると共に、スルーホール、ビア(VIA)またはブラインドビアホール(BVH)等の接続手段681により電気的に接続されている。これにより、金属層621、625、634が接地されている。 One end of the FPC 661, the ground pad 623A of the sensor electrode layer 623, one end of the FPC 662, the ground pad 632A of the sensor electrode layer 632, and one end of the FPC 671 are adhesive agents 622C and 624C. , 631 C, and 633 C, and is electrically connected by connection means 681 such as through holes, vias (VIA) or blind via holes (BVH). Thereby, the metal layers 621, 625, 634 are grounded.
 また、センサ650の厚さ方向に重なる、センサ電極層623、632のセンシング部SE同士は、スルーホール、ビア(VIA)またはブラインドビアホール(BVH)等の接続手段682により電気的に接続されている。 Further, the sensing portions SE of the sensor electrode layers 623, 632 overlapping in the thickness direction of the sensor 650 are electrically connected by connection means 682 such as through holes, vias (VIA) or blind via holes (BVH). .
(変形例2)
 第7の実施形態においてセンサ610Aが、支持層622、624、631、633のうちの少なくとも1層に代えて弾性層を備えるようにしてもよい。また、第7の実施形態の変形例1においてセンサ650が支持層622、624、631、633のうちの少なくとも1層に代えて弾性層を備えるようにしてもよい。なお、弾性層の材料としては、第1の実施形態の変形例1における弾性層と同様のものを例示することができる。
(Modification 2)
In the seventh embodiment, the sensor 610A may include an elastic layer instead of at least one of the support layers 622, 624, 631, and 633. In the first modification of the seventh embodiment, the sensor 650 may include an elastic layer instead of at least one of the support layers 622, 624, 631, 633. In addition, as a material of an elastic layer, the thing similar to the elastic layer in the modification 1 of 1st Embodiment can be illustrated.
[参考例]
 以下、参考例により本開示を具体的に説明するが、本開示はこれらの参考例のみに限定されるものではない。
[Reference example]
Hereinafter, the present disclosure will be specifically described by way of reference examples, but the present disclosure is not limited to only these reference examples.
[参考例1]
 以下に示す各部材を積層することにより、図44に示す構成を有する矩形フィルム状のセンサ610Aを作製した。
[Reference Example 1]
By laminating the members shown below, a rectangular film sensor 610A having the configuration shown in FIG. 44 was produced.
(第1のセンサ構造部620)
 金属層621:SUS層、支持体622A:両面粘着テープ、センサ電極層623:FPC、支持体624A:両面粘着テープ、金属層625:SUS層
(First sensor structure 620)
Metal layer 621: SUS layer, support 622 A: double-sided adhesive tape, sensor electrode layer 623: FPC, support 624 A: double-sided adhesive tape, metal layer 625: SUS layer
(第2のセンサ構造部630)
 支持体631A:両面粘着テープ、センサ電極層632:FPC、支持体633A:両面粘着テープ、金属層634:SUS層
(Second sensor structure 630)
Support 631 A: double-sided adhesive tape, sensor electrode layer 632: FPC, support 633 A: double-sided adhesive tape, metal layer 634: SUS layer
[参考例2]
 参考例1の第1のセンサ構造部620のみからなる矩形フィルム状のセンサを作製した。
[Reference Example 2]
A rectangular film-like sensor consisting only of the first sensor structure 620 of Reference Example 1 was produced.
[感度の評価]
 Φ6mmのシリコーンゴム打鍵子を用いて、センシング部SE上を押圧し、センシング面20Sの変位量に対する容量変化量を測定した。その結果を図46A、図46Bに示す。
[Evaluation of sensitivity]
The sensing portion SE was pressed by using a silicone rubber hammer having a diameter of 6 mm, and the amount of change in capacitance with respect to the amount of displacement of the sensing surface 20S was measured. The results are shown in FIGS. 46A and 46B.
 上記結果から、容量変化(容量減少)が-0.005[pF]以下となる変位量の範囲を求めたところ、参考例1のセンサ610Aでは上記変位量の範囲は約380μmであり(図46A参照)、参考例2のセンサでは上記変位量の範囲は約170μmであった(図46B参照)。すなわち、参考例1のセンサ610Aにて変位量として検出可能な範囲は、参考例2のセンサにて変位量として検出可能な範囲の2倍以上であった。なお、容量変化(容量減少)が0.005[pF]以下であれば、通常、良好な感度を得ることができると考えられる。 From the above result, when the range of displacement amount at which the capacitance change (capacitance decrease) becomes −0.005 [pF] or less is determined, in the sensor 610A of the reference example 1, the range of the displacement amount is about 380 μm (FIG. 46A) For the sensor of Reference Example 2 and Reference Example 2, the range of the displacement amount was about 170 μm (see FIG. 46B). That is, the range detectable as the displacement amount by the sensor 610A of the reference example 1 was twice or more the range detectable as the displacement amount by the sensor of the reference example 2. If the change in capacitance (reduction in capacitance) is 0.005 [pF] or less, it is generally considered that good sensitivity can be obtained.
 以上、本開示の実施形態およびその変形例について具体的に説明したが、本開示は、上述の実施形態およびその変形例に限定されるものではなく、本開示の技術的思想に基づく各種の変形が可能である。 As mentioned above, although embodiment of this indication and its modification were explained concretely, this indication is not limited to the above-mentioned embodiment and its modification, and various modification based on the technical idea of this indication Is possible.
 例えば、上述の実施形態および変形例において挙げた構成、方法、工程、形状、材料および数値等はあくまでも例に過ぎず、必要に応じてこれと異なる構成、方法、工程、形状、材料および数値等を用いてもよい。 For example, the configurations, methods, processes, shapes, materials, numerical values, and the like described in the above-described embodiment and modifications are merely examples, and different configurations, methods, processes, shapes, materials, numerical values, and the like may be used as necessary. May be used.
 また、上述の実施形態およびその変形例の構成、方法、工程、形状、材料および数値等は、本開示の主旨を逸脱しない限り、互いに組み合わせることが可能である。 In addition, the configurations, methods, processes, shapes, materials, numerical values, and the like of the above-described embodiment and the modifications thereof can be combined with each other without departing from the spirit of the present disclosure.
 第4の実施形態に係る電子機器310、第5の実施形態に係る電子機器410、第6の実施形態に係る電子機器510および第7の実施形態に係る電子機器610において、側壁部にボタンBT1、BT2、BT3を備える構成に代えて、ボタンBT1、BT2、BT3に対応する情報13Gを、画面13B中の側壁部側の辺に沿った位置に表示する構成(第2の実施形態における構成)を採用するようにしてもよい。 In the electronic device 310 according to the fourth embodiment, the electronic device 410 according to the fifth embodiment, the electronic device 510 according to the sixth embodiment, and the electronic device 610 according to the seventh embodiment, the button BT1 is provided on the side wall portion Configuration for displaying information 13G corresponding to the buttons BT1, BT2 and BT3 at a position along the side of the side wall in the screen 13B (configuration in the second embodiment), instead of including the components BT2 and BT3 May be adopted.
 第1から第7の実施形態では、センシング部SE1、SE3、SE5、SE7を誤動作補償用のセンシング部として用いる場合について説明したが、すべてのセンシング部SE1~SE7をユーザ操作検出用のセンシング部として用いてもよい。この場合、センシング部SE1、SE3、SE5、SE7に対応する位置にもボタンが設けられる。 Although the first to seventh embodiments have described the case where the sensing units SE1, SE3, SE5, and SE7 are used as sensing units for malfunction compensation, all the sensing units SE1 to SE7 are used as sensing units for user operation detection. You may use. In this case, buttons are also provided at positions corresponding to the sensing units SE1, SE3, SE5, and SE7.
 また、本開示は以下の構成を採用することもできる。
(1)
 筐体と、
 前記筐体の内側面に設けられ、前記筐体の変形を検出するセンサと、
 前記センサの検出結果に基づき、電子機器の動作を制御する制御部と
 を備え、
 前記センサは、
 規定のユーザ操作を検出するための第1のセンシング部と、
 誤動作を補償するための第2のセンシング部と
 を有する電子機器。
(2)
 前記センサは、前記第1のセンシング部を2以上含み、
 前記第2のセンシング部は、隣接する前記第1のセンシング部間に設けられている(1)に記載の電子機器。
(3)
 前記制御部は、前記第1のセンシング部および前記第2のセンシング部の検出信号のうちの少なくとも1つの信号のレベルが閾値を超えており、前記閾値を超えている少なくとも1つの信号のうち、信号レベルが最も高い信号が、前記第1のセンシング部の検出信号であるか否かに基づき、誤動作を検出する(1)または(2)に記載の電子機器。
(4)
 前記制御部は、前記第1のセンシング部および前記第2のセンシング部の検出信号のうちの少なくとも1つの信号のレベルが、前記規定のユーザ操作を判別するための第1の閾値とは極性が反対の第2の閾値を超えているか否かに基づき、誤動作を検出する(1)から(3)のいずれかに記載の電子機器。
(5)
 前記制御部は、アプリケーションの起動に伴って、複数のセンシング部のうちの一部を前記第1のセンシング部に割り当て、残りを前記第2のセンシング部に割り当てる(1)から(4)のいずれかに記載の電子機器。
(6)
 表示装置をさらに備え、
 前記制御部は、前記表示装置の画面うち、前記第1のセンシング部に対応する位置に、前記第1のセンシング部に対応する操作に関する情報を表示する(5)に記載の電子機器。
(7)
 前記筐体は、底部と、前記底部の周縁に設けられた壁部と、前記壁部上に設けられたフロントパネルとを備え、
 前記第1のセンシング部は、前記壁部の内側面に設けられ、
 前記第2のセンシング部は、前記底部および前記フロントパネルの内側面の少なくとも一方に設けられている(1)から(6)のいずれかに記載の電子機器。
(8)
 前記制御部は、前記第2のセンシング部の検出信号が閾値を超えているか否かに基づき、誤動作を検出する(7)に記載の電子機器。
(9)
 前記筐体は、側壁部を有し、
 前記センサは、前記側壁部の内側面に設けられている(1)から(8)のいずれかに記載の電子機器。
(10)
 前記センサの裏面に設けられた弾性体と、
 前記弾性体を支持する支持体と
 をさらに備え、
 前記筐体は、前記側壁部に沿って設けられた溝部を有し、
 前記センサ、前記弾性体および前記支持体によりセンサモジュールが構成され、
 前記センサモジュールは、前記溝部に嵌め合わされている(9)に記載の電子機器。
(11)
 前記センサの裏面に設けられた弾性体と、
 前記弾性体を支持する支持体と
 をさらに備える(1)から(9)のいずれかに記載の電子機器。
(12)
 前記筐体は、スリット部を有する側壁部を有し、
 前記センサは、前記スリット部内に収容されている(1)から(8)のいずれかに記載の電子機器。
(13)
 前記センサは、フィルム状を有し、前記センサの一方の主面が前記筐体の内側面に対向するように設けられている(1)から(11)のいずれかに記載の電子機器。
(14)
 前記センサは、
 第1のリファレンス電極層と、
 前記第1のリファレンス電極層上に設けられた第1の支持層と、
 前記第1の支持層上に設けられた第1のセンサ電極層と、
 前記第1のセンサ電極層上に設けられた第2の支持層と、
 前記第2の支持層上に設けられた第2のリファレンス電極層と
 を備える(1)から(13)のいずれかに記載の電子機器。
(15)
 前記センサは、
 前記第2のリファレンス電極層上に設けられた第3の支持層と、
 前記第3の支持層上に設けられた第2のセンサ電極層と、
 前記第2のセンサ電極層上に設けられた第4の支持層と、
 前記第4の支持層上に設けられた第3のリファレンス電極層と
 をさらに備える(14)に記載の電子機器。
(16)
 前記第1のリファレンス電極層、前記第2のリファレンス電極層および前記第1のセンサ電極層が1つのフレキシブル基板により構成されている(14)に記載の電子機器。
(17)
 筐体と、
 前記筐体に設けられ、前記筐体の変形を検出するセンサと、
 前記センサの検出結果に基づき、電子機器の動作を制御する制御部と
 を備え、
 前記センサは、
 規定のユーザ操作を検出するための第1のセンシング部と、
 誤動作を補償するための第2のセンシング部と
 を有する電子機器。
(18)
 筐体の内側面に設けられ、前記筐体の変形を検出するセンサであって、
 規定のユーザ操作を検出するための第1のセンシング部と、
 誤動作を補償するための第2のセンシング部と
 を有するセンサ。
(19)
 筐体に設けられ、前記筐体の変形を検出するセンサであって、
 規定のユーザ操作を検出するための第1のセンシング部と、
 誤動作を補償するための第2のセンシング部と
 を有するセンサ。
Further, the present disclosure can adopt the following configurations.
(1)
And
A sensor provided on an inner side surface of the housing to detect deformation of the housing;
And a control unit that controls the operation of the electronic device based on the detection result of the sensor.
The sensor is
A first sensing unit for detecting a prescribed user operation;
An electronic device comprising: a second sensing unit for compensating for a malfunction.
(2)
The sensor includes two or more of the first sensing units,
The electronic device according to (1), wherein the second sensing unit is provided between the adjacent first sensing units.
(3)
The control unit is configured to control the level of at least one of detection signals of the first sensing unit and the second sensing unit to exceed a threshold, and at least one of the signals exceeding the threshold. The electronic device according to (1) or (2), wherein the malfunction is detected based on whether or not the signal with the highest signal level is the detection signal of the first sensing unit.
(4)
The control unit is configured such that the level of at least one of the detection signals of the first sensing unit and the second sensing unit is opposite in polarity to a first threshold for determining the prescribed user operation. The electronic device according to any one of (1) to (3), which detects a malfunction based on whether or not the opposite second threshold is exceeded.
(5)
The control unit allocates a part of the plurality of sensing units to the first sensing unit and allocates the remaining ones to the second sensing unit according to activation of an application, whichever of (1) to (4) Electronic device described in.
(6)
Further comprising a display device,
The electronic device according to (5), wherein the control unit displays information on an operation corresponding to the first sensing unit at a position corresponding to the first sensing unit in a screen of the display device.
(7)
The housing includes a bottom, a wall provided on the periphery of the bottom, and a front panel provided on the wall.
The first sensing unit is provided on an inner surface of the wall portion,
The electronic device according to any one of (1) to (6), wherein the second sensing unit is provided on at least one of the bottom portion and an inner side surface of the front panel.
(8)
The electronic device according to (7), wherein the control unit detects a malfunction based on whether the detection signal of the second sensing unit exceeds a threshold.
(9)
The housing has a side wall portion,
The electronic device according to any one of (1) to (8), wherein the sensor is provided on an inner side surface of the side wall portion.
(10)
An elastic body provided on the back of the sensor;
And a support for supporting the elastic body.
The housing has a groove provided along the side wall,
A sensor module is constituted by the sensor, the elastic body and the support body,
The electronic device according to (9), wherein the sensor module is fitted in the groove.
(11)
An elastic body provided on the back of the sensor;
The electronic device according to any one of (1) to (9), further including: a support for supporting the elastic body.
(12)
The housing has a side wall portion having a slit portion,
The electronic device according to any one of (1) to (8), wherein the sensor is accommodated in the slit portion.
(13)
The electronic device according to any one of (1) to (11), wherein the sensor has a film shape, and one main surface of the sensor is provided to face an inner side surface of the housing.
(14)
The sensor is
A first reference electrode layer,
A first support layer provided on the first reference electrode layer;
A first sensor electrode layer provided on the first support layer;
A second support layer provided on the first sensor electrode layer;
And a second reference electrode layer provided on the second support layer. The electronic device according to any one of (1) to (13).
(15)
The sensor is
A third support layer provided on the second reference electrode layer;
A second sensor electrode layer provided on the third support layer;
A fourth support layer provided on the second sensor electrode layer;
The electronic device according to (14), further comprising: a third reference electrode layer provided on the fourth support layer.
(16)
The electronic device according to (14), wherein the first reference electrode layer, the second reference electrode layer, and the first sensor electrode layer are configured by one flexible substrate.
(17)
And
A sensor provided in the housing for detecting deformation of the housing;
And a control unit that controls the operation of the electronic device based on the detection result of the sensor.
The sensor is
A first sensing unit for detecting a prescribed user operation;
An electronic device comprising: a second sensing unit for compensating for a malfunction.
(18)
A sensor provided on an inner side surface of a housing to detect deformation of the housing,
A first sensing unit for detecting a prescribed user operation;
And a second sensing unit for compensating for a malfunction.
(19)
A sensor provided in a housing for detecting deformation of the housing, wherein
A first sensing unit for detecting a prescribed user operation;
And a second sensing unit for compensating for a malfunction.
 10、110、210  電子機器
 11  筐体
 11M  底部
 11N  壁部
 11R、11L  側壁部
 11SA  外側面
 11SB  内側面
 12  基板
 12A  コントローラIC
 12B  メインCPU
 13  フロントパネル
 13A  表示装置
 13B  画面
 13G  情報
 14  溝部
 20、120、220  センサ
 20S、220S  センシング面
 21、22、221、222  金属層
 23  支持体
 24、224  接着層
 30、230  センサ電極層
 32、232  第1電極
 32A、33A、232A、233A  サブ電極
 33、233  第2電極
 40  FPC
 41  接続部
 42  コネクタ
 51  弾性体
 52  スペーサ
 BT1、BT2、BT3  ボタン
 SE1~SE7  センシング部
DESCRIPTION OF SYMBOLS 10, 110, 210 Electronic equipment 11 Housing | casing 11M Bottom part 11N Wall part 11R, 11L Side wall part 11SA Outer side 11SB Inner side 12 board 12A Controller IC
12B Main CPU
13 front panel 13A display device 13B screen 13G information 14 groove 20, 120, 220 sensor 20S, 220S sensing surface 21, 22, 221, 222 metal layer 23 support 24, 224 adhesive layer 30, 230 sensor electrode layer 32, 232 1 electrode 32A, 33A, 232A, 233A Sub electrode 33, 233 second electrode 40 FPC
41 connection portion 42 connector 51 elastic body 52 spacer BT1, BT2, BT3 button SE1 to SE7 sensing portion

Claims (19)

  1.  筐体と、
     前記筐体の内側面に設けられ、前記筐体の変形を検出するセンサと、
     前記センサの検出結果に基づき、電子機器の動作を制御する制御部と
     を備え、
     前記センサは、
     規定のユーザ操作を検出するための第1のセンシング部と、
     誤動作を補償するための第2のセンシング部と
     を有する電子機器。
    And
    A sensor provided on an inner side surface of the housing to detect deformation of the housing;
    And a control unit that controls the operation of the electronic device based on the detection result of the sensor.
    The sensor is
    A first sensing unit for detecting a prescribed user operation;
    An electronic device comprising: a second sensing unit for compensating for a malfunction.
  2.  前記センサは、前記第1のセンシング部を2以上含み、
     前記第2のセンシング部は、隣接する前記第1のセンシング部間に設けられている請求項1に記載の電子機器。
    The sensor includes two or more of the first sensing units,
    The electronic device according to claim 1, wherein the second sensing unit is provided between the adjacent first sensing units.
  3.  前記制御部は、前記第1のセンシング部および前記第2のセンシング部の検出信号のうちの少なくとも1つの信号のレベルが閾値を超えており、前記閾値を超えている少なくとも1つの信号のうち、信号レベルが最も高い信号が、前記第1のセンシング部の検出信号であるか否かに基づき、誤動作を検出する請求項1に記載の電子機器。 The control unit is configured to control the level of at least one of detection signals of the first sensing unit and the second sensing unit to exceed a threshold, and at least one of the signals exceeding the threshold. The electronic device according to claim 1, wherein the malfunction is detected based on whether or not the signal with the highest signal level is a detection signal of the first sensing unit.
  4.  前記制御部は、前記第1のセンシング部および前記第2のセンシング部の検出信号のうちの少なくとも1つの信号のレベルが、前記規定のユーザ操作を判別するための第1の閾値とは極性が反対の第2の閾値を超えているか否かに基づき、誤動作を検出する請求項1に記載の電子機器。 The control unit is configured such that the level of at least one of the detection signals of the first sensing unit and the second sensing unit is opposite in polarity to a first threshold for determining the prescribed user operation. The electronic device according to claim 1, wherein the malfunction is detected based on whether or not the opposite second threshold is exceeded.
  5.  前記制御部は、アプリケーションの起動に伴って、複数のセンシング部のうちの一部を前記第1のセンシング部に割り当て、残りを前記第2のセンシング部に割り当てる請求項1に記載の電子機器。 The electronic device according to claim 1, wherein the control unit allocates a part of the plurality of sensing units to the first sensing unit and allocates the rest to the second sensing unit in response to activation of an application.
  6.  表示装置をさらに備え、
     前記制御部は、前記表示装置の画面うち、前記第1のセンシング部に対応する位置に、前記第1のセンシング部に対応する操作に関する情報を表示する請求項5に記載の電子機器。
    Further comprising a display device,
    The electronic device according to claim 5, wherein the control unit displays information on an operation corresponding to the first sensing unit at a position corresponding to the first sensing unit in a screen of the display device.
  7.  前記筐体は、底部と、前記底部の周縁に設けられた壁部と、前記壁部上に設けられたフロントパネルとを備え、
     前記第1のセンシング部は、前記壁部の内側面に設けられ、
     前記第2のセンシング部は、前記底部および前記フロントパネルの内側面の少なくとも一方に設けられている請求項1に記載の電子機器。
    The housing includes a bottom, a wall provided on the periphery of the bottom, and a front panel provided on the wall.
    The first sensing unit is provided on an inner surface of the wall portion,
    The electronic device according to claim 1, wherein the second sensing unit is provided on at least one of the bottom portion and an inner side surface of the front panel.
  8.  前記制御部は、前記第2のセンシング部の検出信号が閾値を超えているか否かに基づき、誤動作を検出する請求項7に記載の電子機器。 The electronic device according to claim 7, wherein the control unit detects a malfunction based on whether or not the detection signal of the second sensing unit exceeds a threshold.
  9.  前記筐体は、側壁部を有し、
     前記センサは、前記側壁部の内側面に設けられている請求項1に記載の電子機器。
    The housing has a side wall portion,
    The electronic device according to claim 1, wherein the sensor is provided on an inner side surface of the side wall portion.
  10.  前記センサの裏面に設けられた弾性体と、
     前記弾性体を支持する支持体と
     をさらに備え、
     前記筐体は、前記側壁部に沿って設けられた溝部を有し、
     前記センサ、前記弾性体および前記支持体によりセンサモジュールが構成され、
     前記センサモジュールは、前記溝部に嵌め合わされている請求項9に記載の電子機器。
    An elastic body provided on the back of the sensor;
    And a support for supporting the elastic body.
    The housing has a groove provided along the side wall,
    A sensor module is constituted by the sensor, the elastic body and the support body,
    The electronic device according to claim 9, wherein the sensor module is fitted in the groove.
  11.  前記センサの裏面に設けられた弾性体と、
     前記弾性体を支持する支持体と
     をさらに備える請求項1に記載の電子機器。
    An elastic body provided on the back of the sensor;
    The electronic device according to claim 1, further comprising: a support that supports the elastic body.
  12.  前記筐体は、スリット部を有する側壁部を有し、
     前記センサは、前記スリット部内に収容されている請求項1に記載の電子機器。
    The housing has a side wall portion having a slit portion,
    The electronic device according to claim 1, wherein the sensor is accommodated in the slit portion.
  13.  前記センサは、フィルム状を有し、前記センサの一方の主面が前記筐体の内側面に対向するように設けられている請求項1に記載の電子機器。 The electronic device according to claim 1, wherein the sensor has a film shape, and one main surface of the sensor is provided to face an inner side surface of the housing.
  14.  前記センサは、
     第1のリファレンス電極層と、
     前記第1のリファレンス電極層上に設けられた第1の支持層と、
     前記第1の支持層上に設けられた第1のセンサ電極層と、
     前記第1のセンサ電極層上に設けられた第2の支持層と、
     前記第2の支持層上に設けられた第2のリファレンス電極層と
     を備える請求項1に記載の電子機器。
    The sensor is
    A first reference electrode layer,
    A first support layer provided on the first reference electrode layer;
    A first sensor electrode layer provided on the first support layer;
    A second support layer provided on the first sensor electrode layer;
    The electronic device according to claim 1, further comprising: a second reference electrode layer provided on the second support layer.
  15.  前記センサは、
     前記第2のリファレンス電極層上に設けられた第3の支持層と、
     前記第3の支持層上に設けられた第2のセンサ電極層と、
     前記第2のセンサ電極層上に設けられた第4の支持層と、
     前記第4の支持層上に設けられた第3のリファレンス電極層と
     をさらに備える請求項14に記載の電子機器。
    The sensor is
    A third support layer provided on the second reference electrode layer;
    A second sensor electrode layer provided on the third support layer;
    A fourth support layer provided on the second sensor electrode layer;
    The electronic device according to claim 14, further comprising: a third reference electrode layer provided on the fourth support layer.
  16.  前記第1のリファレンス電極層、前記第2のリファレンス電極層および前記第1のセンサ電極層が1つのフレキシブル基板により構成されている請求項14に記載の電子機器。 The electronic device according to claim 14, wherein the first reference electrode layer, the second reference electrode layer, and the first sensor electrode layer are configured by one flexible substrate.
  17.  筐体と、
     前記筐体に設けられ、前記筐体の変形を検出するセンサと、
     前記センサの検出結果に基づき、電子機器の動作を制御する制御部と
     を備え、
     前記センサは、
     規定のユーザ操作を検出するための第1のセンシング部と、
     誤動作を補償するための第2のセンシング部と
     を有する電子機器。
    And
    A sensor provided in the housing for detecting deformation of the housing;
    And a control unit that controls the operation of the electronic device based on the detection result of the sensor.
    The sensor is
    A first sensing unit for detecting a prescribed user operation;
    An electronic device comprising: a second sensing unit for compensating for a malfunction.
  18.  筐体の内側面に設けられ、前記筐体の変形を検出するセンサであって、
     規定のユーザ操作を検出するための第1のセンシング部と、
     誤動作を補償するための第2のセンシング部と
     を有するセンサ。
    A sensor provided on an inner side surface of a housing to detect deformation of the housing,
    A first sensing unit for detecting a prescribed user operation;
    And a second sensing unit for compensating for a malfunction.
  19.  筐体に設けられ、前記筐体の変形を検出するセンサであって、
     規定のユーザ操作を検出するための第1のセンシング部と、
     誤動作を補償するための第2のセンシング部と
     を有するセンサ。
    A sensor provided in a housing for detecting deformation of the housing, wherein
    A first sensing unit for detecting a prescribed user operation;
    And a second sensing unit for compensating for a malfunction.
PCT/JP2018/027396 2017-07-21 2018-07-20 Sensor and electronic device WO2019017493A1 (en)

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