WO2019004044A1 - Optical film - Google Patents
Optical film Download PDFInfo
- Publication number
- WO2019004044A1 WO2019004044A1 PCT/JP2018/023585 JP2018023585W WO2019004044A1 WO 2019004044 A1 WO2019004044 A1 WO 2019004044A1 JP 2018023585 W JP2018023585 W JP 2018023585W WO 2019004044 A1 WO2019004044 A1 WO 2019004044A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- meth
- group
- film
- compound
- optical film
- Prior art date
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- 239000012788 optical film Substances 0.000 title claims abstract description 92
- 239000010408 film Substances 0.000 claims abstract description 211
- 238000010521 absorption reaction Methods 0.000 claims abstract description 95
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 63
- 239000001301 oxygen Substances 0.000 claims abstract description 63
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 63
- 238000002835 absorbance Methods 0.000 claims abstract description 23
- 230000035699 permeability Effects 0.000 claims abstract description 19
- 239000010410 layer Substances 0.000 claims description 148
- 150000001875 compounds Chemical class 0.000 claims description 107
- 229920005989 resin Polymers 0.000 claims description 72
- 239000011347 resin Substances 0.000 claims description 72
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 45
- 239000004925 Acrylic resin Substances 0.000 claims description 35
- 229920000178 Acrylic resin Polymers 0.000 claims description 35
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 33
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 33
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- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical group [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 claims description 6
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- 230000006866 deterioration Effects 0.000 abstract description 13
- 230000001629 suppression Effects 0.000 abstract description 4
- 230000031700 light absorption Effects 0.000 abstract description 2
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- -1 silane compound Chemical class 0.000 description 185
- 125000004432 carbon atom Chemical group C* 0.000 description 84
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- 238000000034 method Methods 0.000 description 38
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- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 5
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- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 5
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 5
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- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
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- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
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- PYOKTQVLKOAHRM-UHFFFAOYSA-N triethoxy(3-triethoxysilylpropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC[Si](OCC)(OCC)OCC PYOKTQVLKOAHRM-UHFFFAOYSA-N 0.000 description 1
- PQVPWZHUJMEZSA-UHFFFAOYSA-N triethoxy(4-triethoxysilylbutyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCC[Si](OCC)(OCC)OCC PQVPWZHUJMEZSA-UHFFFAOYSA-N 0.000 description 1
- BMSFSODNLPWTPF-UHFFFAOYSA-N triethoxy(5-triethoxysilylpentyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCCC[Si](OCC)(OCC)OCC BMSFSODNLPWTPF-UHFFFAOYSA-N 0.000 description 1
- NRYWFNLVRORSCA-UHFFFAOYSA-N triethoxy(6-triethoxysilylhexyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCCCC[Si](OCC)(OCC)OCC NRYWFNLVRORSCA-UHFFFAOYSA-N 0.000 description 1
- OSAJVUUALHWJEM-UHFFFAOYSA-N triethoxy(8-triethoxysilyloctyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCCCCCC[Si](OCC)(OCC)OCC OSAJVUUALHWJEM-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical group CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- JPWFAVWVTLRRQW-UHFFFAOYSA-N tripropoxy(1-tripropoxysilyloctyl)silane Chemical compound C(CC)O[Si](OCCC)(OCCC)C(CCCCCCC)[Si](OCCC)(OCCC)OCCC JPWFAVWVTLRRQW-UHFFFAOYSA-N 0.000 description 1
- BQEMHSFOEDTNEP-UHFFFAOYSA-N tripropoxy(6-tripropoxysilylhexyl)silane Chemical compound CCCO[Si](OCCC)(OCCC)CCCCCC[Si](OCCC)(OCCC)OCCC BQEMHSFOEDTNEP-UHFFFAOYSA-N 0.000 description 1
- 229940124543 ultraviolet light absorber Drugs 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13363—Birefringent elements, e.g. for optical compensation
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
Definitions
- the present invention relates to an optical film.
- Patent Document 1 describes a polarizing plate in which an ultraviolet light absorber excellent in ultraviolet light absorbing ability in a wavelength range of 370 nm or less is added to a protective film of the polarizing plate.
- the present invention is an optical film having a good function of suppressing deterioration of a retardation film or an organic EL light emitting device by visible light of ultraviolet light or short wavelength by showing high absorption selectivity to visible light of short wavelength around 405 nm. To provide.
- the present invention includes the following inventions.
- An optical film comprising at least one light selective absorption layer and at least one oxygen shielding layer, and satisfying the following formula (1) and formula (2).
- a (405) 0.5 0.5 (1)
- [In Formula (1), A (405) represents the absorbance at a wavelength of 405 nm. ]
- a (440) ⁇ 0.1 (3) [In Formula (1), A (440) represents the light absorbency in wavelength 440nm. ] [3]
- a (405) represents the absorbance at a wavelength of 405 nm
- a (440) represents the absorbance at a wavelength of 440 nm.
- a pressure-sensitive adhesive layer formed from a pressure-sensitive adhesive composition comprising a (meth) acrylic resin (A), a crosslinking agent (B) and a photoselective absorption compound (C) [4] The optical film as described in.
- ⁇ (405) 20 20 (5) [In Formula (5), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm. ] [9] The optical film according to [8], wherein the light selective absorption compound (C) is a compound satisfying the following formula (6). ⁇ (405) / ⁇ (440) ⁇ 20 (6) [In Formula (6), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm, and (epsilon) (440) represents the gram absorption coefficient in wavelength 440 nm.
- the oxygen shielding layer is at least one resin selected from polyester resin (E) polyvinyl alcohol resin (F), polyamide resin (G), polyimide resin (H) and cellulose resin (I)
- a display device including the optical film of [1] to [12].
- the optical film of the present invention exhibits a high absorption selectivity for visible light of a short wavelength near 405 nm, and thus has a good suppression function for deterioration of the retardation film or the organic EL light emitting element due to visible light of a short wavelength.
- the optical film of the present invention exhibits high absorption selectivity to visible light having a short wavelength near 405 nm even after the weathering test, and can suppress deterioration due to visible light having a short wavelength.
- the optical film of the present invention is an optical film including at least one light selective absorption layer and at least one oxygen shielding layer, and satisfying the following formulas (1) and (2).
- a (405) 0.5 0.5 (1)
- Oxygen permeability ⁇ 500 (2) [In Formula (1), A (405) represents the absorbance at a wavelength of 405 nm. ]
- the value of A (405) is preferably 0.6 or more, more preferably 0.8 or more, and particularly preferably 1.0 or more, from the viewpoint of suppressing weathering deterioration. There is no particular upper limit, but it is usually 10 or less.
- the oxygen permeability value is preferably 100 or less, more preferably 50 or less.
- the unit of oxygen permeability is "cm3 / (m2 ⁇ 24 h ⁇ atm)". The oxygen permeability can be measured according to the method described in JIS K 7126-1.
- the optical film of the present invention preferably further satisfies the following formula (3).
- a (440) ⁇ 0.1 (3) [In Formula (1), A (440) represents the light absorbency in wavelength 440nm. ] The smaller the value of A (440), the lower the absorption at a wavelength of 440 nm. When the value of A (440) exceeds 0.1, there is a tendency to impair good color expression in the display device. Further, since the light emission of the display device tends to be inhibited, the luminance of the display device may also be reduced.
- the value of A (440) is preferably 0.05 or less, more preferably 0.04 or less, and particularly preferably 0.03, from the viewpoint of suppressing the light emission inhibition of the display device.
- the lower limit is not particularly limited, but is usually 0.00001 or more.
- the optical film of the present invention preferably further satisfies the following formula (4).
- a (405) / A (440) ⁇ 5 (4) [In Formula (4), A (405) represents the light absorbency in wavelength 405 nm, and A (440) represents the light absorbency in wavelength 440 nm. ]
- the value of A (405) / A (440) represents the magnitude of absorption at a wavelength of 405 nm with respect to the magnitude of absorption at a wavelength of 440 nm. The larger the value, the specific absorption in a wavelength range near 405 nm. Represent.
- the value of A (405) / A (440) is preferably 10 or more, more preferably 30 or more, and particularly preferably 60 or more.
- the film of the present invention is usually 0.2 ⁇ m to 600 ⁇ m.
- the light selective absorption layer is a layer having high absorption performance for light with a wavelength of 405 nm, and satisfies the above formula (1).
- the light selective absorption layer may be any layer that forms an optical film, but is preferably a pressure-sensitive adhesive layer having a light selective absorption function.
- the pressure-sensitive adhesive layer having a light selective absorption function is formed of a pressure-sensitive adhesive composition having a light selective absorption function.
- the thickness of the light selective absorption layer (preferably a pressure-sensitive adhesive layer having a light selective absorption function) is usually 0.1 ⁇ m to 50 ⁇ m, preferably 1 ⁇ m to 30 ⁇ m, and more preferably 4 ⁇ m to 20 ⁇ m.
- the pressure-sensitive adhesive composition having a light selective absorption function is preferably a pressure-sensitive adhesive composition containing a light absorbing compound (C), a resin (A) and a crosslinking agent (B), and further contains a silane compound (D). It is more preferable that it is an adhesive composition.
- the light absorbing compound (C) is a compound that selectively absorbs light having a wavelength of 405 nm, is preferably a compound satisfying the formula (5), and is more preferably a compound satisfying the formula (6) .
- ⁇ (405) 20 20 (5) [In Formula (5), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm. The unit of gram absorption coefficient is L / (g ⁇ cm).
- (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm
- (epsilon) (440) represents the gram absorption coefficient in wavelength 440 nm.
- the gram absorbance coefficient can be measured by the method described in the examples.
- ⁇ (405) The larger the value of ⁇ (405), the easier it is to absorb light with a wavelength of 405 nm, and the deterioration of the retardation film in ultraviolet light or visible light with a short wavelength is suppressed. If the value of ⁇ (405) is less than 20 L / (g ⁇ cm), the content of the light selective absorption compound (C) in the light selective absorption layer is not increased, the ultraviolet light of the retardation film or the organic EL light emitting element And it tends to be difficult to express the function of suppressing deterioration by visible light of short wavelength.
- the value of ⁇ (405) is preferably 20 L / (g ⁇ cm) or more, more preferably 30 L / (g ⁇ cm) or more, and even more preferably 40 L / (g ⁇ cm) or more Preferably, it is usually 500 L / (g ⁇ cm) or less.
- a compound having a larger value of ⁇ (405) / ⁇ (440) absorbs light in the vicinity of 405 nm and suppresses light degradation of a display device such as a retardation film or an organic EL element without inhibiting color expression of the display device. can do.
- the value of ⁇ (405) / ⁇ (440) is preferably 20 or more, more preferably 40 or more, still more preferably 70 or more, and particularly preferably 80 or more.
- a photoselective absorption compound (C) is a compound which contains a merocyanine structure in a molecule
- the light selective absorption compound (c) is preferably a compound represented by the formula (I) (hereinafter sometimes referred to as a compound (I)).
- R 1 and R 5 each independently represent a hydrogen atom, an alkyl group having 1 to 25 carbon atoms which may have a substituent, or 7 to carbon atoms which may have a substituent;
- 15 represent an aralkyl group, an aryl group having a carbon number of 6 to 15, and a heterocyclic group, and -CH 2- contained in the alkyl group or the aralkyl group is -NR 1A- , -CO-, -SO 2- , -O It may be substituted by-or -S-.
- R 1A represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
- R 2 , R 3 and R 4 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms which may have a substituent, or an aromatic hydrocarbon group which may have a substituent Or an aromatic heterocyclic group which may have a substituent, and -CH 2- contained in the alkyl group is -NR 1B- , -CO-, -NO 2- , -O- or -S- And may be substituted.
- R 1B represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
- R 6 and R 7 each independently represent a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, or an electron-withdrawing group, or R 6 and R 7 may be linked to each other to form a ring structure .
- R 1 and R 2 may be linked to each other to form a ring structure
- R 2 and R 3 may be linked to each other to form a ring structure
- R 2 and R 4 are linked to each other to form a ring structure
- R 3 and R 6 may be linked to each other to form a ring structure.
- Examples of the alkyl group having 1 to 25 carbon atoms represented by R 1 and R 5 include methyl group, ethyl group, n-propyl group, isopropyl group, 2-cyanopropyl group, n-butyl group, tert-butyl group, and sec-butyl, n-pentyl, n-hexyl, 1-methylbutyl, 3-methylbutyl, n-octyl, n-decyl, 2-hexyl-octyl and the like.
- Examples of the substituent which the alkyl group having 1 to 25 carbon atoms represented by R 1 and R 5 may have include a hydroxy group, a cyano group and the like.
- Examples of the aralkyl group having 7 to 15 carbon atoms represented by R 1 and R 5 include a benzyl group and a phenylethyl group.
- Examples of the group in which —CH 2 — contained in the aralkyl group is replaced by —SO 2 — or —COO— include a 2-phenylacetic acid ethyl group and the like.
- Examples of the substituent which the aralkyl group having 7 to 15 carbon atoms represented by R 1 and R 5 may have include the groups described in the following group A.
- Group A nitro, hydroxy, carboxy, sulfo, cyano, amino, halogen, alkoxy having 1 to 6 carbons, alkylsilyl having 1 to 12 carbons, alkyl having 2 to 8 carbons carbonyl group, * - R a1 - (O -R a2) t1 -R a3 (R a1 and R a2 each independently represent an alkanediyl group having 1 to 6 carbon atoms, R a3 is a C1- 6 represents an alkyl group, and s 1 represents an integer of 1 to 3.) and the like.
- alkylsilyl group having 1 to 12 carbon atoms examples include monoalkylsilyl groups such as methylsilyl group, ethylsilyl and propylsilyl groups; dialkylsilyl groups such as dimethylsilyl group, diethylsilyl group and methylethylsilyl group; trimethylsilyl and triethylsilyl, And trialkylsilyl groups such as tripropylsilyl group.
- alkylcarbonyl group having 2 to 8 carbon atoms examples include a methylcarbonyl group and an ethylcarbonyl group.
- a halogen atom a fluorine atom, a chlorine atom, a bromine atom etc. are mentioned.
- Examples of the aryl group having 6 to 15 carbon atoms represented by R 1 and R 5 include a phenyl group, a naphthyl group and an anthracenyl group.
- Examples of the substituent which the aryl group having 6 to 15 carbon atoms represented by R 1 and R 5 may have include the groups described in Group A above.
- Examples of the heterocyclic group having 6 to 15 carbon atoms represented by R 1 and R 5 include carbons such as pyridyl, pyrrolidinyl, quinolyl, thiophene, imidazolyl, oxazolyl, pyrrole, thiazolyl and furanyl And 3 to 9 aromatic heterocyclic groups.
- Examples of the alkyl group having 1 to 6 carbon atoms represented by R 1A and R 1B include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, tert-butyl group, sec-butyl group, n -Pentyl group, n-hexyl group and the like.
- Examples of the alkyl group having 1 to 6 carbon atoms represented by R 2 , R 3 and R 4 include the same ones as the alkyl group having 1 to 6 carbon atoms represented by R 1B .
- Examples of the substituent which the alkyl group having 1 to 6 carbon atoms represented by R 2 , R 3 and R 4 may have include the groups described in the above-mentioned group A.
- the aromatic hydrocarbon group represented by R 2 , R 3 and R 4 includes aryl groups having 6 to 15 carbon atoms such as phenyl, naphthyl and anthracenyl; and 7 to 15 carbon atoms such as benzyl and phenylethyl. There may be mentioned 15 aralkyl groups.
- Examples of the substituent which the aromatic hydrocarbon group represented by R 2 , R 3 and R 4 may have include the groups described in Group A above.
- the aromatic heterocyclic ring represented by R 2 , R 3 and R 4 has 3 carbon atoms such as pyridyl, pyrrolidinyl, quinolyl, thiophene, imidazolyl, oxazolyl, pyrrole, thiazolyl and furanyl.
- aromatic heterocyclic groups of -9 As a substituent which the aromatic heterocyclic ring represented by R ⁇ 2 >, R ⁇ 3 > and R ⁇ 4 > may have, the group as described in the said group A is mentioned.
- Examples of the alkyl group having 1 to 25 carbon atoms represented by R 6 and R 7 include the same ones as the alkyl group having 1 to 25 carbon atoms represented by R 1 and R 5 .
- Examples of the substituent which the alkyl group having 1 to 25 carbon atoms represented by R 6 and R 7 may have include the groups described in Group A above.
- Examples of the electron withdrawing group represented by R 6 and R 7 include a cyano group, a nitro group, a halogen atom, an alkyl group substituted with a halogen atom, and a group represented by formula (I-1) .
- R 11 represents a hydrogen atom or an alkyl group having 1 to 25 carbon atoms, and at least one of the methylene groups contained in the alkyl group may be substituted by an oxygen atom.
- X 1 is, -CO -, - COO -, - OCO -, - CS -, - CSS -, - COS -, - NR 12 CO- or CONR 13 - represents a.
- R 12 and R 13 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group.
- the halogen atom includes a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
- alkyl group substituted by a halogen atom include trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluoroisopropyl group, perfluorobutyl group, perfluorosec-butyl group, perfluorotert-butyl group, perfluoropentyl group, and the like
- Perfluoroalkyl groups, such as perfluorohexyl group, etc. are mentioned.
- the carbon number of the alkyl group substituted with a halogen atom is usually 1 to 25.
- Examples of the alkyl group having 1 to 25 carbon atoms represented by R 11 include the same as the alkyl groups represented by R 1 and R 5 .
- Examples of the C 1 to C 6 alkyl group represented by R 12 and R 13 include the same as the C 1 to C 6 alkyl group represented by R 1A .
- R 6 and R 7 may be linked to each other to form a ring structure, and examples of the ring structure formed of R 6 and R 7 include a Meldrum's acid structure, a barbituric acid structure, a dimedone structure, etc.
- the ring structure formed by bonding R 2 and R 3 to each other is a nitrogen-containing ring structure containing a nitrogen atom bonded to R 2, and is, for example, a 4- to 14-membered nitrogen-containing heterocyclic ring It can be mentioned.
- the ring structure formed by linking R 2 and R 3 to each other may be monocyclic or polycyclic. Specifically, pyrrolidine ring, pyrroline ring, imidazolidine ring, imidazoline ring, oxazoline ring, thiazoline ring, piperidine ring, morpholine ring, piperazine ring, indole ring, isoindole ring and the like can be mentioned.
- the ring structure formed by bonding R 1 and R 2 to each other is a nitrogen-containing ring structure containing a nitrogen atom to which R 1 and R 2 are bonded, and is, for example, a 4- to 14-membered ring (preferably And 4 to 8 membered rings).
- the ring structure formed by linking R 1 and R 2 to each other may be monocyclic or polycyclic. Specifically, the same as the ring structure formed by linking R 2 and R 3 to each other can be mentioned.
- the ring structure formed by combining R 2 and R 4 with one another includes a 4- to 14-membered nitrogen-containing ring structure, and a 5- to 9-membered nitrogen-containing ring structure is preferable.
- the ring structure formed by bonding R 2 and R 4 to each other may be monocyclic or polycyclic. These rings may have a substituent, and as such a ring structure, the same one as exemplified as the ring structure formed by R 2 and R 3 may be mentioned.
- a phenyl group etc. are mentioned.
- Examples of the compound represented by formula (I) in which R 2 and R 3 are linked to each other to form a ring structure include compounds represented by formula (IA), and R 2 and R 4
- Examples of the compound represented by the formula (I) which forms a ring structure by linking include a compound represented by the formula (IB) and the like.
- R 1 , R 3 , R 4 , R 5 , R 6 and R 7 each represent the same meaning as described above.
- Ring W 1 and ring W 2 each independently represent a nitrogen-containing ring.
- Ring W 1 and ring W 2 represent a nitrogen-containing ring containing a nitrogen atom as a constituent unit of the ring.
- the ring W 1 and the ring W 2 may be monocyclic or polycyclic, and may contain a heteroatom other than nitrogen as a constituent unit of the ring.
- the ring W 1 and the ring W 2 are preferably each independently a 5- to 9-membered ring.
- the compound represented by the formula (IA) is preferably a compound represented by the formula (IA-1).
- R 1 , R 4 , R 5 , R 6 and R 7 each represent the same meaning as described above.
- a 1 represents -CH 2- , -O-, -S- or -NR 1D- .
- Each of R 14 and R 15 independently represents a hydrogen atom or an alkyl group having 1 to 12 carbon atoms.
- R 1D represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
- the compound represented by the formula (IB) is preferably a compound represented by the formula (IB-1) and a compound represented by the formula (IB-2).
- R 1 , R 6 and R 7 each represent the same meaning as described above.
- Each R 16 independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group.
- R 3 , R 5 , R 6 and R 7 each represent the same meaning as described above.
- R 30 represents a hydrogen atom, a cyano group, a nitro group, a halogen atom, a mercapto group, an amino group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aromatic hydrocarbon having 6 to 18 carbon atoms And an acyl group having 2 to 13 carbon atoms, an acyloxy group having 2 to 13 carbon atoms, or an alkoxycarbonyl group having 2 to 13 carbon atoms.
- R 31 represents an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a mercapto group, an alkylthio group having 1 to 12 carbon atoms, an amino group or heterocyclic group which may have a substituent, Represent. ]
- the halogen atom represented by R 30, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom.
- Examples of the acyloxy group having 2 to 13 carbon atoms represented by R 30 include a methyl carbonyloxy group, an ethyl carbonyloxy group, a propyl carbonyloxy group, and a butyl carbonyloxy group.
- Examples of the alkoxycarbonyl group having 2 to 13 carbon atoms represented by R 30 include a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group and the like.
- Examples of the aromatic hydrocarbon group having 6 to 18 carbon atoms represented by R 30 include aryl groups having 6 to 18 carbon atoms such as phenyl group, naphthyl group and biphenyl group; 7 carbon atoms such as benzyl group and phenylethyl group There may be mentioned an aralkyl group of -18.
- Examples of the alkyl group having 1 to 12 carbon atoms represented by R 30 include the same ones as the alkyl group having 1 to 12 carbon atoms represented by R 14 .
- Examples of the alkyl group having 1 to 12 carbon atoms represented by R 30 include a methoxy group, an ethoxy group, a propoxy group, a butoxy group and a pentoxy group.
- R 30 is preferably an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an amino group or a mercapto group.
- Examples of the alkyl group having 1 to 12 carbon atoms represented by R 31 include the same ones as the alkyl group having 1 to 12 carbon atoms represented by R 14 .
- Examples of the C 1-12 alkoxy group represented by R 31 include the same as the C 1-12 alkoxy group represented by R 30 .
- Examples of the alkylthio group having 1 to 12 carbon atoms represented by R 31 include a methylthio group, an ethylthio group, a propylthio group, a butylthio group, a pentylthio group and a hexylthio group.
- the amino group which may have a substituent represented by R 31 is, for example, an amino group; one alkyl group having 1 to 8 carbon atoms such as N-methylamino group or N-ethylamino group Amino groups; amino groups substituted with two alkyl groups having 1 to 8 carbon atoms such as N, N-dimethylamino, N, N-diethylamino, N, N-methylethylamino and the like; and the like.
- Examples of the heterocyclic ring represented by R 31 include nitrogen-containing heterocyclic groups having 4 to 9 carbon atoms such as pyrrolidinyl group, piperidinyl group and morpholinyl group.
- R 1, R 6 and R 7 represent the same meaning as described above.
- Each of R 21 and R 22 independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or a hydroxy group.
- R 25 represents a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, or an aromatic hydrocarbon group which may have a substituent.
- Examples of the alkyl group having 1 to 25 carbon atoms represented by R 25 include the same ones as the alkyl group having 1 to 25 carbon atoms represented by R 1 .
- Examples of the aromatic hydrocarbon group represented by R 25 include aryl groups such as phenyl group and naphthyl group: aralkyl groups such as benzyl group and phenylethyl group: biphenyl group and the like, and aromatics having 6 to 20 carbon atoms It is preferably a hydrocarbon group.
- Examples of the substituent which the aromatic hydrocarbon group represented by R 25 may have include a hydroxy group and the like.
- R 3 and R 6 are each independently an electron withdrawing group.
- Examples of the compound represented by the formula (I) in which R 1 and R 2 are linked to each other to form a ring structure and R 3 and R 6 are linked to each other to form a ring structure include a compound represented by formula (ID) And the like.
- R 4 , R 5 and R 7 represent the same meaning as described above.
- R 25 , R 26 , R 27 and R 28 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms which may have a substituent, a hydroxy group or an aralkyl group.
- Examples of the alkyl group having 1 to 12 carbon atoms represented by R 25 , R 26 , R 27 and R 28 include the same ones as the alkyl group having 1 to 12 carbon atoms represented by R 1A and R 1B .
- Examples of the substituent which the alkyl group having 1 to 12 carbon atoms represented by R 25 , R 26 , R 27 and R 28 may have include a hydroxy group.
- Examples of the aralkyl group represented by R 25 , R 26 , R 27 and R 28 include aralkyl groups having 7 to 15 carbon atoms such as benzyl group and phenylethyl group.
- Examples of the compound (I) in which R 6 and R 7 are linked to each other to form a ring structure include compounds represented by the formula (IE) and the like.
- IE formula (IE)
- R 1 , R 3 , R 4 and R 5 each represent the same meaning as described above.
- Ring W 3 represents a cyclic compound. Ring W 3 is a 5- to 9-membered ring, and may contain a heteroatom such as a nitrogen atom, an oxygen atom or a sulfur atom as a constituent unit of the ring.
- the compound represented by the formula (IE) is preferably a compound represented by the formula (IE-1).
- R 1 , R 2 , R 3 and R 5 each represent the same meaning as described above.
- R 17 , R 18 , R 19 and R q each independently represent a hydrogen atom or an alkyl, aralkyl or aryl group having 1 to 12 carbon atoms which may have a substituent, and the alkyl or
- R 17 and R 18 may be linked to each other to form a ring structure
- R 18 and R 19 may be linked to each other to form a ring structure
- R 19 and R q are linked to each other to form a ring structure May be m, p and q each independently represent an integer of 0 to 3.
- Examples of the compound represented by the formula (I) include the following compounds.
- the content of the light selective absorption compound (C) is usually 0.01 to 20 parts by mass with respect to 100 parts by mass of the resin (A) (preferably (meth) acrylic resin (A)) described later, and is preferably Is 0.05 to 10 parts by mass, more preferably 0.1 to 5 parts by mass, and still more preferably 0.1 to 5 parts by mass.
- the resin (A) is preferably a (meth) acrylic resin (A).
- the (meth) acrylic resin (A) is preferably a polymer as a main component (preferably containing 50% by mass or more) of a structural unit derived from a (meth) acrylic acid ester.
- the structural unit derived from (meth) acrylic acid ester is a structural unit derived from a monomer other than one or more (meth) acrylic acid esters (for example, a structural unit derived from a monomer having a polar functional group) May be included.
- (meth) acrylic acid means that either acrylic acid or methacrylic acid may be used, and in the case of (meth) acrylate etc., “(meth)” also has the same meaning. .
- Examples of the (meth) acrylic acid ester include (meth) acrylic acid esters represented by the following formula (I) [In formula (I), R 1 represents a hydrogen atom or a methyl group, R 2 represents an alkyl group having 1 to 14 carbon atoms or an aralkyl group having 7 to 20 carbon atoms, and hydrogen of the alkyl group or the aralkyl group The atom may be replaced by an alkoxy group having 1 to 10 carbon atoms. ]
- R 2 is preferably an alkyl group having 1 to 14 carbon atoms, more preferably an alkyl group having 1 to 8 carbon atoms.
- (meth) acrylic acid ester represented by the formula (I), Methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, n-pentyl (meth) acrylate, n-hexyl (meth) acrylate, (Meth) acrylic acid n-heptyl, (meth) acrylic acid n-octyl, (meth) acrylic acid n-nonyl, (meth) acrylic acid n-decyl, (meth) acrylic acid n-dodecyl, (meth) acrylic acid Linear alkyl esters of (meth) acrylic acid such as lauryl, stearyl (meth) acrylate, etc .; (Meth) acrylic acid i-propyl, (meth) acrylic acid i-butyl, (meth) acrylic acid t-butyl, (Met
- Alkyl esters (Meth) acrylic acid cyclohexyl, isoboronyl (meth) acrylic acid, adamantyl (meth) acrylic acid, dicyclopentanyl (meth) acrylic acid, cyclododecyl (meth) acrylic acid, methyl cyclohexyl (meth) acrylic acid, ( Alicyclic skeleton-containing alkyl ester of (meth) acrylic acid such as trimethylcyclohexyl (meth) acrylate, tert-butylcyclohexyl (meth) acrylate, cyclohexyl ⁇ -ethoxyacrylate, etc .; Aromatic ring skeleton-containing ester of (meth) acrylic acid such as phenyl (meth) acrylate; Etc.
- transduced into the alkyl group in (meth) acrylic acid alkyl ester can also be mentioned.
- the substituent of the substituent-containing (meth) acrylic acid alkyl ester is a group that substitutes the hydrogen atom of the alkyl group, and specific examples thereof include a phenyl group, an alkoxy group, and a phenoxy group.
- substituent-containing (meth) acrylic acid alkyl ester examples include 2-methoxyethyl (meth) acrylate, ethoxymethyl (meth) acrylate, phenoxyethyl (meth) acrylate, 2- (meth) acrylate Examples thereof include (2-phenoxyethoxy) ethyl, phenoxydiethylene glycol (meth) acrylate, and phenoxypoly (ethylene glycol) (meth) acrylate.
- acrylic acid esters can be used alone or in combination of two or more different ones.
- the (meth) acrylic resin (A) has a structural unit derived from a (meth) acrylic acid alkyl ester (a1) whose homopolymer has a glass transition temperature Tg of less than 0 ° C., and a homopolymer Tg of 0 ° C. or more It is preferable to contain the structural unit derived from (meth) acrylic acid alkyl ester (a2). Containing the structural unit derived from the acrylic acid alkyl ester (a1) and the structural unit derived from the acrylic acid alkyl ester (a2) is advantageous for enhancing the high temperature durability of the pressure-sensitive adhesive layer.
- Tg of the homopolymer of (meth) acrylic acid alkyl ester literature values such as, for example, POLYMER HANDBOOK (Wiley-Interscience) can be adopted.
- (meth) acrylic acid alkyl ester (a1) examples include ethyl acrylate, n- and i-propyl acrylate, n- and i-butyl acrylate, n-pentyl acrylate, n- and acrylate acrylic acid -Hexyl, n-heptyl acrylate, n- and i-octyl acrylate, 2-ethylhexyl acrylate, n- and i-nonyl acrylate, n- and i-decyl acrylate, n-dodecyl acrylate And the like.
- examples thereof include (meth) acrylic acid alkyl esters having about 2 to 12 carbon atoms in the alkyl group.
- the (meth) acrylic acid alkyl ester (a1) may be used alone or in combination of two or more. Among them, n-butyl acrylate, n-octyl acrylate, 2-ethylhexyl acrylate and the like are preferable from the viewpoint of followability and rework when the light selective absorption layer is laminated on another layer.
- the (meth) acrylic acid alkyl ester (a2) is a (meth) acrylic acid alkyl ester other than the (meth) acrylic acid alkyl ester (a1).
- Specific examples of the (meth) acrylic acid alkyl ester (a2) include methyl acrylate, cyclohexyl acrylate, isoboronyl acrylate, stearyl acrylate, t-butyl acrylate and the like.
- the (meth) acrylic acid alkyl ester (a2) may be used alone or in combination of two or more. Among them, from the viewpoint of high temperature durability, the (meth) acrylic acid alkyl ester (a2) preferably contains methyl acrylate, cyclohexyl acrylate, isoboronyl acrylate and the like, and more preferably methyl acrylate.
- the structural unit derived from the (meth) acrylic acid ester represented by the formula (I) is preferably 50% by mass or more in all structural units contained in the (meth) acrylic resin (A), and is preferably 60 to 95
- the content is preferably in the range of 50% by mass, and more preferably in the range of 65 to 95% by mass.
- a structural unit derived from monomers other than (meth) acrylic acid ester a structural unit derived from a monomer having a polar functional group is preferable, and a structure derived from a (meth) acrylic acid ester having a polar functional group Units are more preferred.
- polar functional groups include hydroxy groups, carboxyl groups, substituted or unsubstituted amino groups, and heterocyclic groups such as epoxy groups.
- a monomer having a hydroxy group or a monomer having a carboxyl group is preferable in view of the reactivity between the (meth) acrylic acid ester polymer and the crosslinking agent, and a monomer having a hydroxy group and a carboxyl group It is more preferable to include any of monomers having a group.
- a monomer having a hydroxy group 2-hydroxyethyl acrylate, 3-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 5-hydroxypentyl acrylate, 6-hydroxyhexyl acrylate are preferable. In particular, good durability can be obtained by using 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate and 5-hydroxypentyl acrylate.
- acrylic acid is preferably used as a monomer having a carboxyl group.
- the (meth) acrylic resin (A) substantially contains a structural unit derived from a monomer having an amino group, from the viewpoint of preventing the peel force enhancement of the separate film that can be laminated on the outer surface of the pressure-sensitive adhesive layer. Preferably not.
- “not substantially contained” means that it is 0.1 parts by mass or less in 100 parts by mass of all the constituent units constituting the (meth) acrylic resin (A).
- the content of the structural unit derived from the monomer having a polar functional group is preferably 20 parts by mass or less, more preferably 0 based on 100 parts by mass of all structural units of the (meth) acrylic resin (A). 0.5 parts by weight or more and 15 parts by weight or less, more preferably 0.5 parts by weight or more and 10 parts by weight or less, particularly preferably 1 parts by weight or more and 7 parts by weight or less.
- the content of the structural unit derived from the monomer having an aromatic group is preferably 20 parts by mass or less, more preferably 4 parts by mass with respect to 100 parts by mass of the total structural units of the (meth) acrylic resin (A).
- the content is not less than 20 parts by mass and preferably not less than 4 parts by mass and not more than 16 parts by mass.
- structural units derived from monomers other than (meth) acrylic acid esters structural units derived from styrenic monomers, structural units derived from vinyl monomers, plural (meth) acryloyl groups in the molecule
- the structural unit derived from the monomer which has group, the structural unit derived from a (meth) acrylamide type monomer, etc. are also mentioned.
- styrene-based monomers styrene; alkylstyrenes such as methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, triethylstyrene, propylstyrene, butylstyrene, hexylstyrene, heptylstyrene, octylstyrene, etc .; fluorostyrene, Halogenated styrenes such as chlorostyrene, bromostyrene, dibromostyrene, iodostyrene; nitrostyrene; acetylstyrene; methoxystyrene; and divinylbenzene.
- alkylstyrenes such as methylstyrene, dimethylstyrene, trimethylsty
- vinyl monomers include fatty acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl 2-ethylhexanoate and vinyl laurate; vinyl halides such as vinyl chloride and vinyl bromide; vinylidene chloride and the like And vinylidene halides; nitrogen-containing heteroaromatic vinyls such as vinylpyridine, vinylpyrrolidone and vinylcarbazole; conjugated dienes such as butadiene, isoprene and chloroprene; and unsaturated nitriles such as acrylonitrile and methacrylonitrile.
- fatty acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl 2-ethylhexanoate and vinyl laurate
- vinyl halides such as vinyl chloride and vinyl bromide
- vinylidene halides nitrogen-containing heteroaromatic vinyls such as vinylpyridine, vinylpyrrolidone and vinylcarbazol
- monomers having a plurality of (meth) acryloyl groups in the molecule 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonanediol di ( Two (meth) acryloyl groups in the molecule such as meta) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate and tripropylene glycol di (meth) acrylate Monomers having; monomers having three (meth) acryloyl groups in a molecule such as trimethylolpropane tri (meth) acrylate.
- Examples of (meth) acrylamide monomers include N-methylol (meth) acrylamide, N- (2-hydroxyethyl) (meth) acrylamide, N- (3-hydroxypropyl) (meth) acrylamide, N- (4-) Hydroxybutyl) (meth) acrylamide, N- (5-hydroxypentyl) (meth) acrylamide, N- (6-hydroxyhexyl) (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N-diethyl (meth) acrylamide Meta) acrylamide, N-isopropyl (meth) acrylamide, N- (3-dimethylaminopropyl) (meth) acrylamide, N- (1,1-dimethyl-3-oxobutyl) (meth) acrylamide, N- [2- (2-) 2-Oxo-1-imidazolidinyl) ethyl] (meth) acrylamide 2-acryloylamin
- N- (methoxymethyl) acrylamide, N- (ethoxymethyl) acrylamide, N- (propoxymethyl) acrylamide, N- (butoxymethyl) acrylamide and N- (2-methylpropoxymethyl) acrylamide are preferable.
- the weight average molecular weight (Mw) of the (meth) acrylic resin (A) is preferably 500,000 to 2,500,000.
- the weight average molecular weight is 500,000 or more, the durability of the pressure-sensitive adhesive layer in a high temperature environment is improved, and defects such as peeling between adherends and the pressure-sensitive adhesive layer, cohesive failure of the pressure-sensitive adhesive layer, etc. It is easy to control.
- the weight average molecular weight is 2,500,000 or less, it is advantageous from the viewpoint of coatability when processing the pressure-sensitive adhesive composition into, for example, a sheet (coating on a substrate).
- the weight-average molecular weight is preferably 600,000 to 1,800,000, more preferably 700,000 to 1,700,000, and particularly preferably 100, from the viewpoint of achieving both the durability of the pressure-sensitive adhesive layer and the coatability of the pressure-sensitive adhesive composition. It is 10,000 to 1.6 million.
- the molecular weight distribution (Mw / Mn) represented by the ratio of weight average molecular weight (Mw) to number average molecular weight (Mn) is usually 2 to 10, preferably 3 to 8, and more preferably 3 to 6 .
- the weight average molecular weight can be analyzed by gel permeation chromatography and is a value in terms of standard polystyrene.
- the viscosity at 25 ° C. is preferably 20 Pa ⁇ s or less, preferably 0.1 to 15 Pa ⁇ s. It is more preferable that It is advantageous from the viewpoint of the coatability at the time of applying an adhesive constituent to a substrate as it is a viscosity of this range.
- the viscosity can be measured by a Brookfield viscometer.
- the glass transition temperature (Tg) of the (meth) acrylic resin (A) is, for example, -60 to 20 ° C, preferably -50 to 15 ° C, more preferably -45 to 10 ° C, particularly -40 to 0 ° C. May be It is advantageous for the wettability improvement with respect to the adherend base material of an adhesive layer that Tg is below an upper limit, and it is advantageous for the durable improvement of an adhesive layer to be more than a lower limit.
- the glass transition temperature can be measured by a differential scanning calorimeter (DSC).
- the (meth) acrylic resin (A) can be produced by a known method such as, for example, a solution polymerization method, a bulk polymerization method, a suspension polymerization method, an emulsion polymerization method, and the solution polymerization method is particularly preferable.
- a solution polymerization method for example, a monomer and an organic solvent are mixed, a thermal polymerization initiator is added under a nitrogen atmosphere, and a temperature condition of about 40 to 90 ° C., preferably about 50 to 80 ° C., 3 to 15 The method of stirring for about time is mentioned.
- monomers or a thermal polymerization initiator may be added continuously or intermittently during the polymerization.
- the monomer and thermal initiator may be in the state of being added to an organic solvent.
- a polymerization initiator As a polymerization initiator, a thermal polymerization initiator, a photopolymerization initiator, etc. are used.
- a photopolymerization initiator 4- (2-hydroxyethoxy) phenyl (2-hydroxy-2-propyl) ketone and the like can be mentioned.
- the proportion of the polymerization initiator is about 0.001 to 5 parts by mass with respect to 100 parts by mass of the total of the monomers constituting the (meth) acrylic resin.
- the polymerization of the (meth) acrylic resin may be carried out by a polymerization method using active energy rays (for example, ultraviolet rays and the like).
- Organic solvents include aromatic hydrocarbons such as toluene and xylene; esters such as ethyl acetate and butyl acetate; aliphatic alcohols such as propyl alcohol and isopropyl alcohol; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone Can be mentioned.
- the content of the (meth) acrylic resin (A) is usually 60% by mass to 99.9% by mass, preferably 70% by mass to 99.5% by mass in 100% by mass of the pressure-sensitive adhesive composition. More preferably, it is 80% by mass to 99% by mass.
- the pressure-sensitive adhesive composition can contain a crosslinking agent (B).
- the crosslinking agent (B) reacts with polar functional groups (for example, hydroxy group, amino group, carboxyl group, heterocyclic group, etc.) in the (meth) acrylic resin (A).
- the crosslinking agent (B) forms a crosslinked structure with a (meth) acrylic resin (A) or the like to form a crosslinked structure that is advantageous for durability and reworkability.
- crosslinking agent (B) examples include isocyanate-based crosslinking agents, epoxy-based crosslinking agents, aziridine-based crosslinking agents, metal chelate-based crosslinking agents, etc.
- the pot life of the pressure-sensitive adhesive composition and the durability of the pressure-sensitive adhesive layer, crosslinking It is preferable that it is an isocyanate type crosslinking agent from a viewpoint of speed etc.
- the isocyanate compound a compound having at least two isocyanato groups (-NCO) in the molecule is preferable.
- aliphatic isocyanate compounds for example, hexamethylene diisocyanate etc.
- alicyclic isocyanate compounds for example isophorone diisocyanate
- aromatic isocyanate compounds eg, tolylene diisocyanate, xylylene diisocyanate diphenylmethane diisocyanate, naphthalene diisocyanate, triphenylmethane triisocyanate, etc.
- the crosslinking agent (B) may be an adduct of the above-mentioned isocyanate compound with a polyhydric alcohol compound (adduct) [for example, an adduct of glycerol, trimethylolpropane etc.], isocyanurate, burette type compound, polyether polyol, polyester It may be a derivative such as a urethane prepolymer type isocyanate compound which is addition-reacted with a polyol, an acrylic polyol, a polybutadiene polyol, a polyisoprene polyol or the like.
- the crosslinking agents (B) can be used alone or in combination of two or more.
- aromatic isocyanate compounds eg, tolylene diisocyanate, xylylene diisocyanate
- aliphatic isocyanate compounds eg, hexamethylene diisocyanate
- polyhydric alcohol compounds thereof eg, glycerol, trimethylolpropane
- adducts thereof, or isocyanurates e.g, glycerol, trimethylolpropane
- the content of the crosslinking agent (B) is usually 0.01 to 15 parts by mass, preferably 0.05 based on 100 parts by mass of the resin (A) (preferably (meth) acrylic resin (A)).
- the amount is about 10 parts by mass, more preferably 0.1 to 5 parts by mass.
- silane compound (D) examples include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3 -Glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylethoxydimethylsilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, Examples thereof include 3-methacryloyloxypropyltrimethoxysilane and 3-mercaptopropyltrimethoxysilane.
- the silane compound (D) may be a silicone oligomer.
- the specific example of the silicone oligomer is as follows, in the form of a combination of monomers.
- 3-mercaptopropyltrimethoxysilane-tetramethoxysilane oligomer 3-mercaptopropyltrimethoxysilane-tetraethoxysilane oligomer, 3-mercaptopropyltriethoxysilane-tetramethoxysilane oligomer, 3-mercaptopropyltriethoxysilane-tetraethoxysilane Oligomers containing mercaptopropyl group-containing oligomers; mercaptomethyltrimethoxysilane-tetramethoxysilane oligomers, mercaptomethyltrimethoxysilane-tetraethoxysilane oligomers, mercaptomethyltriethoxysilane-tetramethoxysilane oligomers, mercaptomethyltriethoxysilane-tetraethoxy Mercaptomethyl group-containing oligomers such as silane oligomers; 3-glycid
- -Containing oligomers of vinyl 3-aminopropyltrimethoxysilane-tetramethoxysilane Polymer, 3-aminopropyltrimethoxysilane-tetraethoxysilane copolymer, 3-aminopropyltriethoxysilane-tetramethoxysilane copolymer, 3-aminopropyltriethoxysilane-tetraethoxysilane copolymer, 3-aminopropylmethyldimethoxysilane-tetra Amino group-containing such as methoxysilane copolymer, 3-aminopropylmethyldimethoxysilane-tetraethoxysilane copolymer, 3-aminopropylmethyldiethoxysilane-tetramethoxysilane copolymer, 3-aminopropylmethyldiethoxysilane-tetraethoxysilane copolymer, etc
- the silane compound (D) may be a silane compound represented by the following formula (d1).
- the adhesion (or adhesion) can be further improved, so that a pressure-sensitive adhesive layer having excellent peel resistance can be formed.
- adhesion or adhesiveness
- high durability can be exhibited.
- B represents an alkanediyl group having 1 to 20 carbon atoms or a divalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, and the alkanediyl group and R constituting the alicyclic hydrocarbon group are constituted -CH 2- may be substituted by -O- or -CO-
- R 7 represents an alkyl group having 1 to 5 carbon atoms
- R d8 , R d9 , R d10 , R d11 and R d12 are Each independently represents an alkyl group of 1 to 5 carbon atoms or an alkoxy group of 1 to 5 carbon atoms
- B represents an alkanediyl group having 1 to 20 carbon atoms such as methylene group, ethylene group, trimethylene group, tetramethylene group, tetramethylene group, hexamethylene group, heptamethylene group, octamethylene group, etc .; 1,2-cyclobutylene group), cyclopentylene group (eg, 1,2-cyclopentylene group), cyclohexylene group (eg, 1,2-cyclohexylene group), cyclooctylene group (eg, 1,2-cyclobutylene group)
- a divalent alicyclic hydrocarbon group having a carbon number of 3 to 20, such as a cyclooctylene group), or an alkanediyl group thereof and -CH2- constituting the alicyclic hydrocarbon group is -O- or- The group substituted by CO- is shown.
- R d7 represents an alkyl group having a carbon number of 1 to 5, such as methyl group, ethyl group, propyl group, isopropyl group, butyl group, s-butyl group, t-butyl group, pentyl group, etc.
- R d8 , R d9 , R d10 , R d11 and R d12 are each independently an alkyl group having 1 to 5 carbon atoms exemplified for R d7 , or a methoxy group, an ethoxy group, a propoxy group, an i-propoxy group, a butoxy group or an s-butoxy group
- an alkoxy group having 1 to 5 carbon atoms such as t-butoxy group.
- Desirable R d8 , R d9 , R d10 , R d11 and R d12 are each independently an alkoxy group having 1 to 5 carbon atoms. These silane compounds (D) can be used alone or in combination of two or more.
- silane compound represented by the above formula (d1) examples include (trimethoxysilyl) methane, 1,2-bis (trimethoxysilyl) ethane, and 1,2-bis (triethoxysilyl) ethane.
- the content of the silane compound (D) is usually 0.01 to 10 parts by mass, preferably 0.03 based on 100 parts by mass of the resin (A) (preferably (meth) acrylic resin (A)).
- the amount is about 5 parts by mass, more preferably 0.05 to 2 parts by mass, and still more preferably 0.1 to 1 parts by mass. It is advantageous for suppression of the bleed-out of the silane compound (D) from an adhesive layer that it is below the said upper limit, and adhesion with an adhesive layer, a metal layer, a glass substrate, etc. being more than the said lower limit It is easy to improve the properties (or adhesion), which is advantageous for improving the peeling resistance and the like.
- the pressure-sensitive adhesive composition may further contain an antistatic agent.
- an antistatic agent surfactants, siloxane compounds, conductive polymers, ionic compounds and the like can be mentioned, with preference given to ionic compounds.
- the ionic compound include conventional ones.
- a cation component which comprises an ionic compound an organic cation, an inorganic cation, etc. are mentioned.
- the organic cation include pyridinium cation, pyrrolidinium cation, piperidinium cation, imidazolium cation, ammonium cation, sulfonium cation, phosphonium cation and the like.
- inorganic cations include lithium cations, potassium cations, sodium cations, alkali metal cations such as cesium cations, and alkaline earth metal cations such as magnesium cations and calcium cations.
- pyridinium cation, imidazolium cation, pyrrolidinium cation, lithium cation and potassium cation are preferable from the viewpoint of compatibility with the (meth) acrylic resin.
- the anion component constituting the ionic compound may be either an inorganic anion or an organic anion, but in terms of antistatic performance, an anion component containing a fluorine atom is preferred.
- anion component containing a fluorine atom for example, hexafluorophosphate anion (PF 6- ), bis (trifluoromethanesulfonyl) imide anion [(CF 3 SO 2 ) 2 N-], bis (fluorosulfonyl) imide anion [(FSO) 2 ) 2 N-], tetra (pentafluorophenyl) borate anion [(C 6 F 5 ) 4 B-] and the like.
- PF 6- hexafluorophosphate anion
- bis (trifluoromethanesulfonyl) imide anion [(CF 3 SO 2 ) 2 N-]
- bis (fluorosulfonyl) imide anion [(FSO) 2 ) 2 N-] bis (fluorosulfonyl) imide anion [(FSO) 2 ) 2 N-]
- tetra (pentafluorophenyl) borate anion (C 6 F
- bis (trifluoromethanesulfonyl) imide anion [(CF 3 SO 2 ) 2 N-]
- tetra (pentafluorophenyl) borate anion [(C 6 F 5 ) 4 B-]
- the ionic compound which is solid at room temperature is preferred in view of the temporal stability of the antistatic performance of the pressure-sensitive adhesive layer formed from the pressure-sensitive adhesive composition.
- the content of the antistatic agent is, for example, 0.01 to 20 parts by mass, preferably 0.1 to 10 parts by mass, with respect to 100 parts by mass of the resin (A) (preferably (meth) acrylic resin (A)). Part, more preferably 1 to 7 mass.
- the pressure-sensitive adhesive composition can contain one or more additives such as a solvent, a crosslinking catalyst, a tackifier, a plasticizer, a softener, a pigment, a rust inhibitor, an inorganic filler, and light scattering fine particles.
- additives such as a solvent, a crosslinking catalyst, a tackifier, a plasticizer, a softener, a pigment, a rust inhibitor, an inorganic filler, and light scattering fine particles.
- the optical film of the present invention may have two or more types of light selective absorption layers.
- the oxygen shielding layer satisfies the above formula (2).
- the thickness of the oxygen shielding layer is usually 0.1 ⁇ m to 500 ⁇ m, preferably 1 ⁇ m to 200 ⁇ m, more preferably 5 ⁇ m to 100 ⁇ m, and particularly preferably 5 ⁇ m to 50 ⁇ m.
- the optical film of the present invention may have two or more oxygen shielding layers. When two or more oxygen shielding layers are provided, the total thickness thereof is usually 0.2 ⁇ m to 500 ⁇ m, preferably 1 ⁇ m to 200 ⁇ m. Moreover, when it has 2 or more types of oxygen shielding layers, the sum total of 2 or more types of oxygen shielding layers should just satisfy
- the oxygen shielding layer is formed of at least one resin selected from polyester resin (E), polyvinyl alcohol resin (F), polyamide resin (G), polyimide resin (H) and cellulose resin (I). It is preferable that it is a resin layer.
- the polyester resin (E) is a polymer resin having a repeating unit of an ester bond in the main chain, and is generally obtained by condensation polymerization of a polyvalent carboxylic acid or a derivative thereof and a polyalcohol or a derivative thereof.
- polyvalent carboxylic acids or derivatives thereof which give polyesters include terephthalic acid, isophthalic acid, phthalic acid, 2,6-naphthalene dicarboxylic acid, diphenyl dicarboxylic acid, diphenyl sulfone dicarboxylic acid, diphenoxy ethane dicarboxylic acid, 5-sodium sulfone dicarboxylic acid
- Aliphatic dicarboxylic acids such as acids, oxalic acid, succinic acid, adipic acid, sebacic acid, dimer acids, aliphatic dicarboxylic acids such as maleic acid and fumaric acid, and alicyclic dicarboxylic acids such as 1,4-cyclohexanedicarboxylic acid Mention may be made of oxycarboxylic acids such as parahydroxybenzoic acid, as well as their derivatives.
- Examples of derivatives of dicarboxylic acid include dimethyl terephthalate, diethyl terephthalate, 2-hydroxyethyl methyl terephthalate, dimethyl 2,6-naphthalenedicarboxylate, dimethyl isophthalate, dimethyl adipate, diethyl maleate, dimethyl dimer acid, etc. Esterified products can be mentioned. Among them, terephthalic acid, isophthalic acid, 2,6-naphthalenedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, and their esterified products are preferably used in view of moldability and handleability.
- polyhydric alcohols or derivatives thereof which give polyesters ethylene glycol, diethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,3-butanediol, 1,4-butanediol, 1,5-pentane Aliphatic dihydroxy compounds such as diol, 1,6-hexanediol, neopentyl glycol etc., polyoxyalkylene glycols such as diethylene glycol, polyethylene glycol, polypropylene glycol, polytetramethylene glycol etc., 1,4-cyclohexanedimethanol, spiro glycol etc.
- Alicyclic dihydroxy compounds aromatic dihydroxy compounds such as bisphenol A and bisphenol S, and derivatives thereof can be mentioned.
- ethylene glycol, diethylene glycol, 1,3-propanediol, 1,4-butanediol, neopentyl glycol and 1,4-cyclohexanedimethanol are preferably used in terms of moldability and handleability.
- polyester resins include polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polybutylene naphthalate, polytrimethylene terephthalate, polytrimethylene naphthalate, polycyclohexanedimethyl terephthalate, and polycyclohexanedimethyl naphthalate.
- polyethylene terephthalate or polyethylene naphthalate is preferable.
- the polyvinyl alcohol-based resin (F) can be obtained by saponifying a polyvinyl acetate-based resin, and for example, polyvinyl acetate which is a homopolymer of vinyl acetate, a monomer copolymerizable with vinyl acetate (for example, copolymers of unsaturated carboxylic acid, olefin, vinyl ether, unsaturated sulfonic acid, (meth) acrylamide having an ammonium group, etc.) and vinyl acetate can be mentioned.
- the degree of saponification of the polyvinyl alcohol resin (F) is preferably 85 to 100 mol%, more preferably 98 mol% or more.
- the polyvinyl alcohol resin (F) may be modified, for example, polyvinyl formal or polyvinyl acetal modified with aldehydes.
- the average degree of polymerization of the polyvinyl alcohol resin is usually 1000 to 10000, preferably 1500 to 5000.
- the average degree of polymerization of polyvinyl alcohol-type resin can be calculated
- the polyamide resin (G) is a polymer resin containing an amide bond in a repeating unit as a main chain, and for example, an aromatic polyamide (aramid) having an aromatic ring skeleton bonded by an amide bond or an aliphatic skeleton bonded by an amide bond Such as aliphatic polyamides. Generally, it can be obtained by the polymerization reaction of a polyvalent carboxylic acid or a derivative thereof and a polyvalent amine.
- polyvalent carboxylic acids which give polyamides or derivatives thereof include terephthalic acid chloride, 2-chloro-terephthalic acid chloride, isophthalic acid dichloride, naphthalene dicarbonyl chloride, biphenyl dicarbonyl chloride, terphenyl dicarbonyl chloride and the like.
- polyhydric amines giving polyamides include 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 2,2'-ditriol.
- the polyimide resin (H) is a resin having an imide bond in a repeating unit, and a condensation type polyimide obtained by polycondensation using a diamine and a tetracarboxylic acid dianhydride as a starting material is generally used.
- diamines aromatic diamines, alicyclic diamines, aliphatic diamines, etc. can be used.
- tetracarboxylic acid dianhydride aromatic tetracarboxylic acid dianhydride, alicyclic tetracarboxylic acid dianhydride, acyclic aliphatic tetracarboxylic acid dianhydride, etc. can be used.
- the diamines and the tetracarboxylic acid dianhydride may be used alone or in combination of two or more.
- a tetracarboxylic acid compound selected from tetracarboxylic acid compound analogs such as an acid chloride compound may be used as a starting material.
- the cellulose-based resin (I) is preferably a cellulose ester-based resin, that is, a resin in which at least a part of hydroxyl groups in cellulose is acetate-esterified, a part is acetate-esterified, and a part is other acid It may be a mixed ester esterified with
- the cellulose ester resin is preferably an acetyl cellulose resin. Specific examples of the acetyl cellulose-based resin include triacetyl cellulose, diacetyl cellulose, cellulose acetate propionate, and cellulose acetate butyrate.
- cellulose raw materials such as wood pulp and cotton linters which are known according to Inventive Society of Japan published technology 2001-1745 etc.
- acetylcellulose can be synthesized by the method described in Wood Chemistry, pp. 180-190 (Kyoritsu Shuppan, Akita et al., 1968).
- These resins may further contain a solvent, a plasticizer, an organic acid, a dye, an antistatic agent, a surfactant, a lubricant, a flame retardant, a filler, a rubber particle, and a retardation control agent.
- the oxygen shielding layer is preferably a film that can be formed from these resins using a known molding process.
- molding processing method compression molding method, transfer molding method, injection molding method, extrusion molding method, blow molding method, powder molding method, FRP molding method, cast coating method (for example, casting method), calendar molding method, heat The press method etc. may be mentioned.
- the oxygen shielding layer is preferably a layer formed of at least one resin selected from polyester resin (E), polyvinyl alcohol resin (F) and polyimide resin (H), and polyvinyl alcohol resin It is more preferable that it is a polarizing film formed.
- a polarizing film is a film that has the property of absorbing linearly polarized light having a vibration plane parallel to its absorption axis and transmitting linearly polarized light having a vibration plane orthogonal to the absorption axis (parallel to the transmission axis), for example,
- a film in which a dichroic dye is adsorbed and oriented to a polyvinyl alcohol-based resin film can be used. Examples of dichroic dyes include iodine and dichroic organic dyes.
- the polyvinyl alcohol resin can be obtained by saponifying a polyvinyl acetate resin.
- polyvinyl acetate resins include polyvinyl acetate which is a homopolymer of vinyl acetate, a monomer copolymerizable with vinyl acetate (eg, unsaturated carboxylic acid, olefin, vinyl ether, unsaturated sulfonic acid, ammonium group) And copolymers of (meth) acrylamide and the like with vinyl acetate.
- the degree of saponification of the polyvinyl alcohol resin is usually 85 to 100 mol%, preferably 98 mol% or more.
- the polyvinyl alcohol-based resin may be modified, for example, polyvinyl formal or polyvinyl acetal modified with aldehydes.
- the average degree of polymerization of the polyvinyl alcohol-based resin is usually 1000 to 10000, preferably 1500 to 5000.
- the average degree of polymerization of polyvinyl alcohol-type resin can be calculated
- the polyvinyl alcohol-based resin can be formed into a film by a known method.
- the thickness of the raw film is usually 1 to 150 ⁇ m, and preferably 10 ⁇ m or more in consideration of the ease of stretching and the like.
- the polarizing film may be, for example, uniaxially stretching a raw film, dyeing the film with a dichroic dye and adsorbing the dichroic dye, treating the film with an aqueous solution of boric acid, The film is subjected to a step of washing with water, and finally dried and manufactured.
- the thickness of the polarizer 2 is usually 1 to 30 ⁇ m, preferably 20 ⁇ m or less, more preferably 15 ⁇ m or less, particularly 10 ⁇ m or less from the viewpoint of thinning of the pressure-sensitive adhesive layer-carrying optical film 1.
- the polarizer 2 formed by adsorbing and orienting a dichroic dye to a polyvinyl alcohol-based resin film uses a single film of a polyvinyl alcohol-based resin film as a raw film, and this film is uniaxially stretched and dichromatic
- a coating solution such as an aqueous solution
- the stretched polyvinyl alcohol-based resin layer is subjected to a dyeing treatment of a dichroic dye, and then the base film is peeled and removed (method (method It can also be obtained by 2).
- a film made of a thermoplastic resin can be used, and preferably, polyester resins such as polyethylene terephthalate, polycarbonate resins, cellulose resins such as triacetyl cellulose, cyclic polyolefin resins such as norbornene resin It is a film made of a resin, a polystyrene resin, or the like.
- polyester resins such as polyethylene terephthalate, polycarbonate resins, cellulose resins such as triacetyl cellulose, cyclic polyolefin resins such as norbornene resin
- It is a film made of a resin, a polystyrene resin, or the like.
- the use of the above method (2) facilitates the preparation of a thin film polarizing film, and can be easily carried out even if, for example, a polarizing film having a thickness of 7 ⁇ m or less.
- the adhesive a known adhesive may be used, which may be a water-based adhesive or an active energy ray-curable adhesive.
- a conventional water-based adhesive for example, an adhesive comprising a polyvinyl alcohol-based resin aqueous solution, a water-based two-component urethane-based emulsion adhesive, an aldehyde compound, an epoxy compound, a melamine compound, a methylol compound, an isocyanate compound, Amine compounds, crosslinking agents such as polyvalent metal salts, etc.
- the water-based adhesive which consists of polyvinyl alcohol-type resin aqueous solution can be used suitably.
- a water-based adhesive when using a water-based adhesive, after bonding a polarizing film and a protective film, it is preferable to implement the process to dry in order to remove the water contained in a water-based adhesive. After the drying step, there may be provided a curing step of curing at a temperature of about 20 to 45 ° C., for example.
- the adhesive layer formed from the water-based adhesive is usually 0.001 to 5 ⁇ m.
- the above-mentioned active energy ray-curable adhesive means an adhesive which is cured by irradiation with active energy rays such as ultraviolet rays and electron beams, and for example, a curable composition containing a polymerizable compound and a photopolymerization initiator, light
- a curable composition containing a reactive resin, a curable composition containing a binder resin and a photoreactive crosslinking agent, and the like can be mentioned, with preference given to a UV curable adhesive.
- an active energy ray-curable adhesive When using an active energy ray-curable adhesive, after bonding a polarizing film and a protective film, a drying process is performed if necessary, and then an active energy ray-curable adhesive is obtained by irradiating an active energy ray. A curing step to cure is performed.
- the light source of the active energy ray is not particularly limited, ultraviolet light having a light emission distribution at a wavelength of 400 nm or less is preferable.
- the adhesive layer formed from the active energy ray-curable adhesive is usually 0.1 to 10 ⁇ m.
- the method etc. of surface-activating processes such as a saponification process, a corona treatment, a plasma treatment, etc. are mentioned to these bonding surface of at least any one of these.
- the adhesive for bonding these resin films may be either the same type of adhesive or different types of adhesives.
- the protective film is preferably a film formed of a translucent thermoplastic resin. Specifically, a film made of a polyolefin resin, a cellulose resin, a polyester resin, a (meth) acrylic resin, a mixture thereof, a copolymer or the like is fried.
- the protective films may be films made of different thermoplastic resins or may be films made of the same thermoplastic resin.
- the protective film is preferably a protective film made of a polyolefin resin or a cellulose resin. By using these films, the shrinkage of the polarizing film in a high temperature environment can be effectively suppressed without impairing the optical properties of the polarizing film.
- the protective film may also be an oxygen shielding layer.
- a preferable configuration of the polarizing plate is a polarizing plate in which a protective film is laminated on at least one surface of a polarizing film via an adhesive layer.
- stacked on the visual recognition side is a protective film which consists of triacetyl-cellulose-type resin or cycloolefin type resin.
- the protective film may be an unstretched film, or may be stretched in any direction and have a retardation.
- a surface treatment layer such as a hard coat layer or an antiglare layer may be provided on the surface of the protective film laminated on the viewing side.
- the protective film on the panel side is a protective film or a retardation film made of a triacetyl cellulose resin, a cycloolefin resin or an acrylic resin. Is preferred.
- the retardation film may be a zero retardation film described later.
- the oxygen shielding layer may be a surface treatment layer formed on the resin layer.
- the surface treatment layer is preferably a hard coat layer having a hardness of H or more in a pencil hardness test (load: 4.9 N) according to JIS K 5600-5-4 (1999), and a hard coat having a hardness of 3 H or more More preferably, it is a layer.
- the surface treatment layer is generally laminated on the outermost surface of the optical film.
- the hard coat layer includes, for example, a layer formed from a thermosetting composition composition, a layer formed from an active energy ray (preferably ultraviolet ray) curable resin composition, and formed from an ultraviolet curable resin composition
- the ultraviolet curable resin composition include a compound which is cured by radical polymerization reaction by irradiation of ultraviolet rays or a composition containing a compound which is cured by cationic polymerization reaction by irradiation of ultraviolet rays, and the radical polymerizable (meth) acrylic compound is used. It is preferable that it is a composition containing.
- the composition described in JP-A-2002-265650 can be mentioned.
- the optical film of the present invention comprises at least one light selective absorption layer and at least one oxygen shielding layer.
- the light selective absorption layer 10 and the oxygen shielding layer 20 may be laminated directly, or between the light selective absorption layer 10 and the oxygen shielding layer 20. May contain other layers.
- the optical laminate 1A described in FIG. 2 is an optical laminate in which a protective film 90, an adhesive layer 30a, an oxygen shielding layer 20, an adhesive layer 30a, a protective film 90, and a light selective absorption layer 10 are laminated.
- the protective film 90, the adhesive layer 30a, the oxygen shielding layer 20, the protective film 90 in the optical laminate 1A described in FIG.
- stacked in order of 1 serves as the polarizing plate 100.
- the protective film 90 may be a retardation film having retardation, or may be an oxygen shielding layer.
- the optical laminated body 1B described in FIG. 3 has a protective film 90, an adhesive layer 30a, an oxygen shielding layer 20, an adhesive layer 30a, a protective film 90, a light selective absorption layer 10, an optical film 40, and an adhesive layer 30 laminated.
- the optical laminate is an optical laminate in which the optical film 40 has a multilayer structure.
- the pressure-sensitive adhesive layer 30 can be bonded to, for example, another layer or a liquid crystal cell.
- the optical laminate 1C described in FIG. 4 includes a protective film 90, an adhesive layer 30a, an oxygen shielding layer 20, an adhesive layer 30a, a protective film 90, a light selective absorption layer 10, an optical film 40, an adhesive layer 30, and light emission.
- It is an optical laminate in which the element 110 (liquid crystal cell, OLED cell) is laminated, and the optical film 40 is a multilayer structure.
- the oxygen shielding layer is preferably located on the viewing side (opposite to the light emitting element) than the light selective absorption layer.
- the optical film 40 is a film having an optical function of transmitting, reflecting, absorbing, etc. a light beam, and may be a single layer film or a multilayer film.
- Examples of the optical film 40 include a polarizing film, a retardation film, a brightness enhancement film, an antiglare film, an antireflective film, a diffusion film, a light collecting film, a window film, etc.
- the retardation film is an optical film showing optical anisotropy, and for example, polyvinyl alcohol, polycarbonate, polyester, polyarylate, polyimide, polyolefin, polycycloolefin, polystyrene, polysulfone, polyether sulfone, polyvinylidene fluoro,
- An example is a stretched film obtained by stretching a polymer film composed of a ride / polymethyl methacrylate, acetyl cellulose, a saponified ethylene-vinyl acetate copolymer, polyvinyl chloride and the like by about 1.01 to 6 times.
- the retardation film includes a zero retardation film, and also includes a film referred to as a uniaxial retardation film, a low photoelastic modulus retardation film, a wide viewing angle retardation film, or the like.
- a film referred to as a temperature compensation type retardation film a film referred to as a temperature-compensated retardation film, a film in which optical anisotropy is expressed by application and orientation of a liquid crystal compound, and a film in which optical anisotropy is expressed by application of an inorganic layered compound.
- “NH film” (trade name; film in which rod-like liquid crystals are inclined and oriented) sold by Liquid Crystal Film Co., Ltd., “WV film” sold by Fujifilm Co., Ltd.
- VAC film (trade name; film of completely biaxial orientation type) sold by Sumitomo Chemical Co., Ltd., "new VAC film” (trade name: film of biaxial orientation type), and the like.
- the zero retardation film is an optically isotropic film in which both the front retardation R e and the retardation R th in the thickness direction are -15 to 15 nm.
- resin films made of cellulose resins, polyolefin resins (chain polyolefin resins, polycycloolefin resins, etc.) or polyethylene terephthalate resins can be mentioned. Cellulose-based resins or polyolefin-based resins are preferred in that they are easy.
- the zero retardation film can also be used as a protective film.
- Z-TAC As the zero retardation film, “Z-TAC” (trade name) sold by Fujifilm Co., Ltd., “Zerotac (registered trademark)” sold by Konica Minolta Co., Ltd., sold by Nippon Zeon Co., Ltd. And “ZF-14” (trade name).
- the retardation film is preferably a retardation film obtained by curing a polymerizable liquid crystal compound.
- First embodiment a retardation film in which a rod-like liquid crystal compound is oriented horizontally to a supporting substrate
- Second embodiment a retardation film in which a rod-like liquid crystal compound is oriented in a direction perpendicular to a supporting substrate
- Third embodiment Retardation film in which the direction of alignment of the rod-like liquid crystal compound is helically changed in the plane
- Fourth embodiment a retardation film in which a discotic liquid crystal compound is inclined and aligned
- Fifth embodiment A biaxial retardation film in which a discotic liquid crystal compound is oriented in a direction perpendicular to a support substrate can be mentioned.
- the 1st form, the 2nd form, and the 5th form are used suitably. Or these may be laminated and used.
- the retardation film When the retardation film is a layer composed of a polymer in the alignment state of the polymerizable liquid crystal compound (hereinafter sometimes referred to as "optically anisotropic layer"), the retardation film has reverse wavelength dispersion.
- Reverse wavelength dispersion is an optical characteristic in which the in-plane retardation value at the short wavelength is smaller than the in-plane retardation value at the long wavelength, and preferably the retardation film has the following formula It is to satisfy (7) and equation (8).
- Re ( ⁇ ) represents an in-plane retardation value for light of wavelength ⁇ nm.
- the retardation film when the retardation film is in the first form and has reverse wavelength dispersion, it is preferable because the coloration at the time of black display in the display device is reduced, and 0.82 ⁇ in the formula (7). It is more preferable if Re (450) / Re (550) ⁇ 0.93. Furthermore, 120 ⁇ Re (550) ⁇ 150 is preferable.
- Examples of the method for producing a retardation film from a polymer in the alignment state of the polymerizable liquid crystal compound include the method described in JP-A-2010-31223.
- the front retardation value Re (550) may be adjusted in the range of 0 to 10 nm, preferably in the range of 0 to 5 nm, and the retardation value R th in the thickness direction is -10 to- It may be adjusted in the range of 300 nm, preferably in the range of -20 to -200 nm.
- the retardation value R th in the thickness direction which means the refractive index anisotropy in the thickness direction, is an in-plane retardation difference from the retardation value R 50 measured by tilting 50 degrees with the in-plane fast axis as the tilt axis. It can be calculated from the value R 0 .
- the phase difference value R th in the thickness direction retardation value R 0 in the plane retardation value R 50 measured by inclining 50 degrees inclination axis fast axis, thickness of the retardation film d, and positions the average refractive index n 0 of the retardation film obtains the n x, n y and n z by the following equation (10) to (12), these are substituted into equation (9) can be calculated.
- R th [(n x + n y ) / 2-n z ] ⁇ d (9)
- R 0 (n x -n y ) ⁇ d (10)
- n y ' n y ⁇ n z / [ ny 2 ⁇ sin 2 ( ⁇ ) + n z 2 ⁇ cos 2 ( ⁇ )] 1/2
- the retardation film may be a multilayer film having two or more layers.
- stacked via the adhesive or the adhesive agent are mentioned.
- the optical film 40 is a multilayer film in which two or more retardation films are laminated, as a configuration of an optical laminate including the optical film of the present invention, as shown in FIG.
- stacked optical film 40 is mentioned.
- stacked the quarter wavelength phase difference layer 50a and the positive C layer 80 through the adhesive bond layer or the adhesive layer is also mentioned.
- the first wavelength retardation layer 50 for giving a phase difference of 1 ⁇ 4 wavelength shown in FIG. 3 and the 1 ⁇ 2 wavelength retardation layer 70 for giving a phase difference of 1 ⁇ 2 wavelength to transmitted light The optical film of the fifth aspect may be used. In the case of the configuration of FIG. 3, it is more preferable that at least one of them is the fifth form.
- the 1 ⁇ 4 wavelength retardation layer 50 a is preferably the optical film of the first embodiment, and it is more preferable to satisfy the formulas (7) and (8).
- the window film means a front plate in a flexible liquid crystal display device such as a flexible display, and is generally disposed on the outermost surface of the display device.
- the window film is, for example, a resin film made of a polyimide resin.
- the window film may be a hybrid film of an organic material and an inorganic material, such as a resin film containing, for example, polyimide and silica.
- a hard coat layer may be disposed on the surface of the window film to impart surface hardness, stain resistance, and fingerprint resistance.
- the film of Unexamined-Japanese-Patent No. 2017-94488, etc. are mentioned, for example.
- the thickness of the retardation film is usually 0.1 to 100 ⁇ m.
- the total thickness may be 0.2 to 200 ⁇ m.
- the polarizing film may be the same as the polarizing film described for the oxygen shielding layer described above. Another layer or film may be further laminated between the polarizing plate and the panel as shown in FIG.
- a retardation layer having a 1 ⁇ 4 wavelength retardation layer and a 1 ⁇ 2 wavelength retardation layer, and a 1 ⁇ 4 wavelength layer of reverse wavelength dispersion are laminated.
- the retardation layer is preferably a liquid crystal retardation film from the viewpoint of thinning.
- the light selective absorption layer 10 When the light selective absorption layer 10 is a pressure-sensitive adhesive layer having a light selective absorption function, it may include a separate film (release film) laminated on the outer surface of the light selective absorption layer 10.
- the separate film is usually peeled off when the light selective absorption layer 10 is used (for example, when laminated on the optical film 40).
- the separate film is, for example, a film made of various resins such as polyethylene terephthalate, polybutylene terephthalate, polycarbonate, polyarete, etc., on the surface on which the light selective absorption layer 10 is formed, is subjected to release treatment such as silicone treatment. be able to.
- each component constituting the light pressure-sensitive adhesive composition is dissolved or dispersed in a solvent to obtain a solvent-containing pressure-sensitive adhesive composition.
- the optical film of the present invention can be obtained by applying and drying on the surface of the oxygen shielding layer 20 to form the light selective absorption layer 10.
- the light selective absorption layer 10 is formed on the release treated surface of the separate film in the same manner as above, and the light selective absorption layer 10 is laminated (transferred) on the surface of the oxygen shielding layer 20 It can also be obtained by Another film or layer may be laminated between the oxygen shielding layer and the light selective absorption layer. Even when not directly laminated, the optical film of the present invention can exhibit excellent optical properties and durability.
- the optical film of the present invention can be suitably used for an organic EL display device or a liquid crystal display device.
- a preferred embodiment of the optical film of the present invention is a polarizing plate.
- the polarizing plate which is the optical film of the present invention is disposed in an organic EL display device or a liquid crystal display device, a display device having excellent display performance and good durability can be provided.
- PET 38 ⁇ m thick polyethylene terephthalate film (trade name “R64S” obtained from Toray Industries, Inc.)
- PVA Polarized film with a thickness of 28 ⁇ m (made in Production Example 2)
- COP Cycloolefin film with a thickness of 50 ⁇ m (trade name “ZB-12” obtained from Nippon Zeon Co., Ltd.)
- ⁇ Gram absorption coefficient ⁇ measurement> In order to measure the gram absorption coefficient of the obtained photoselective absorptive compound (1), the photoselective absorptive compound (1) was dissolved in 2-butanone. The resulting solution (concentration: 0.006 g ⁇ L -1 ) is placed in a 1 cm quartz cell, and the quartz cell is set in a spectrophotometer UV-2450 (manufactured by Shimadzu Corporation), and 1 nm steps 300 to 200 by double beam method. Absorbance was measured in the wavelength range of 800 nm. From the obtained absorbance value, the concentration of the light absorbing compound in the solution, and the optical path length of the quartz cell, the gram absorption coefficient for each wavelength was calculated using the following equation.
- ⁇ ( ⁇ ) A ( ⁇ ) / CL [Wherein, ⁇ ( ⁇ ) represents the gram absorption coefficient L / (g ⁇ cm) of the compound at the wavelength ⁇ nm, A ( ⁇ ) represents the absorbance at the wavelength ⁇ nm, C represents the concentration g / L, and L is It represents the optical path length cm of the quartz cell.
- crosslinking agent Ethyl acetate solution (75% solid concentration) of trimethylolpropane adduct of tolylene diisocyanate, trade name "Corronate L” obtained from Tosoh Corporation.
- Silane compound 3-glycidoxypropyltrimethoxysilane, trade name "KBM403” obtained from Shin-Etsu Chemical Co., Ltd.
- a light selective absorption layer (pressure-sensitive adhesive layer)
- the pressure-sensitive adhesive composition prepared above was applied to the release-treated surface of a separate film (trade name "PLR-382190” obtained from Lintec Co., Ltd.) made of a polyethylene terephthalate film subjected to release treatment. It applied so that thickness after drying might be set to 20 micrometers, and it dried at 100 degreeC for 1 minute, and produced the photoselective absorption layer (1) of an adhesive layer (adhesive sheet).
- Example 1 After corona discharge treatment is performed on one side of "PET" of the oxygen shielding layer, the side (adhesive layer side) opposite to the separate film of the light selective absorption layer (1) manufactured above is bonded by a laminator It was aged for 7 days under conditions of a temperature of 23 ° C. and a relative humidity of 65% to obtain an optical film (optical film with adhesive) (1) including an oxygen shielding layer and a light selective absorption layer. Then, the pressure-sensitive adhesive-attached optical film was cut into a size of 30 mm ⁇ 30 mm and bonded to an alkali-free glass (trade name “EAGLE XG” manufactured by Corning Co., Ltd.) as a sample.
- an alkali-free glass trade name “EAGLE XG” manufactured by Corning Co., Ltd.
- the oxygen shielding layer of the prepared sample was measured by the method described above.
- the absorbance of the prepared sample in the wavelength range of 300 to 800 nm was measured using a spectrophotometer (UV-2450: manufactured by Shimadzu Corporation). The results are shown in Table 1.
- unit was 0.
- Example 2 An operation was performed in the same manner as in Example 1 except that “PVA” was used instead of “PET” for the oxygen shielding layer, to obtain an optical film (2).
- the obtained optical film (2) was subjected to measurement of oxygen permeability, measurement of absorbance, and evaluation of retention of absorbance using the same method as described above. The results are shown in Table 1.
- Example 1 An operation was carried out in the same manner as in Example 1 except that “COP” was used instead of “PET” for the oxygen shielding layer, to obtain an optical film (3).
- the obtained optical film (3) was subjected to measurement of oxygen permeability, measurement of absorbance, and evaluation of retention of absorbance using the same method as described above. The results are shown in Table 1.
- Example 3 A transparent protective film (Konica Minolta Co., Ltd .: trade name "KC2UA”) consisting of a 25 ⁇ m-thick triacetyl cellulose film is provided on one side of the polarizing film obtained in Synthesis Example 1 (the oxygen permeability was 10 or less). It bonded together via the adhesive which consists of aqueous solution of polyvinyl alcohol-type resin.
- KC2UA Konica Minolta Co., Ltd .: trade name "KC2UA”
- a zero retardation film made by Nippon Zeon Co., Ltd .: trade name "ZEONOR" made of a cyclic polyolefin with a thickness of 23 ⁇ m, and an aqueous solution of polyvinyl alcohol resin It bonded together through the adhesive which consists of, and produced the polarizing plate.
- An operation was performed in the same manner as in Example 1 except that the produced polarizing plate was changed to an oxygen shielding layer, to obtain an optical film (4).
- the obtained optical film (4) was subjected to measurement of oxygen permeability, measurement of absorbance, and evaluation of retention of absorbance using the same method as described above. The results are shown in Table 1.
- the optical film of the present invention has good absorption performance for light near a wavelength of 405 nm. Therefore, when the optical film of the present invention is laminated on a retardation film or an organic EL element, the optical film of the present invention can block light near a wavelength of 405 nm to the retardation film or the organic EL element, and visible light of short wavelength Therefore, deterioration of the retardation film and the organic EL element can be suppressed.
- the optical film of the present invention has a good light absorbing function near a wavelength of 405 nm even after a weathering test, and has a good weathering resistance (durability). When the optical film of the present invention is used in a liquid crystal display device, deterioration can be further suppressed.
- the optical film of the present invention is suitably used in liquid crystal panels and liquid crystal displays.
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- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
In order to provide an optical film which, by exhibiting a high absorption selectivity for short-wavelength visible light near the wavelength 405nm, has a good deterioration suppression function for suppressing deterioration of a phase-difference film or an organic EL light-emitting element due to UV light, this optical film includes at least one selective light absorption layer and at least one oxygen shielding layer, and satisfies formula (1) and formula (2) below. (1) A(405) ≥ 0.5 (2) Oxygen permeability ≤ 500 [In formula (1), A(405) represents absorbance at the wavelength 405 nm.]
Description
本発明は、光学フィルムに関する。
The present invention relates to an optical film.
有機EL表示装置や液晶表示装置等の表示装置(FPD:フラットパネルディスプレイ)には、有機EL素子、液晶セル等の表示素子や偏光板等の光学フィルムなど様々な部材が用いられている。これらの部材に用いられる有機EL化合物及び液晶化合物等は有機物であるため、紫外線(UV)による劣化が問題となりやすい。このような問題を解決するため、例えば、特許文献1には370nm以下の波長域の紫外線吸収能が優れる紫外線吸収剤を偏光板の保護フィルムに添加した偏光板が記載されている。
Various members such as organic EL elements, display elements such as liquid crystal cells, and optical films such as polarizing plates are used in display devices (FPD: flat panel display) such as organic EL display devices and liquid crystal display devices. Since the organic EL compounds, liquid crystal compounds and the like used for these members are organic substances, deterioration by ultraviolet light (UV) tends to be a problem. In order to solve such a problem, for example, Patent Document 1 describes a polarizing plate in which an ultraviolet light absorber excellent in ultraviolet light absorbing ability in a wavelength range of 370 nm or less is added to a protective film of the polarizing plate.
また、近年の表示装置の薄型化が進む中、重合性液晶化合物を配向・光硬化させてなる液晶系位相差フィルムの開発が進められている。これらの液晶系位相差フィルムや有機EL発光素子は紫外線による劣化のみではなく、短波長の可視光においても劣化する傾向があることが明らかになってきた。しかしながら、特許文献1に記載の偏光板は、370nm以下の波長域の紫外線吸収能が優れていても、400nm付近の可視光の吸収性能が低く、液晶系位相差フィルムや有機EL発光素子の劣化抑制が十分ではない場合があった。さらに、近年の表示装置において、より良好な表示特性が求められていた。
Further, with the progress in thinning of display devices in recent years, development of a liquid crystal retardation film formed by aligning and photocuring a polymerizable liquid crystal compound has been advanced. It has become clear that these liquid crystal retardation films and organic EL light emitting devices tend not to deteriorate not only by ultraviolet light but also by visible light of short wavelength. However, the polarizing plate described in Patent Document 1 has a low ability to absorb visible light in the vicinity of 400 nm even if it has an excellent ability to absorb ultraviolet light in a wavelength range of 370 nm or less. There was a case where suppression was not enough. Furthermore, in display devices of recent years, better display characteristics have been required.
本発明は、波長405nm付近の短波長の可視光に対する高い吸収選択性を示すことにより、位相差フィルムや有機EL発光素子の紫外線や短波長の可視光による劣化について良好な抑制機能を有する光学フィルムを提供することである。
The present invention is an optical film having a good function of suppressing deterioration of a retardation film or an organic EL light emitting device by visible light of ultraviolet light or short wavelength by showing high absorption selectivity to visible light of short wavelength around 405 nm. To provide.
本発明は、以下の発明を含む。
[1]少なくとも1層の光選択吸収層と少なくとも1層の酸素遮蔽層とを含む光学フィルムであって、かつ下記式(1)及び式(2)を満たす光学フィルム。
A(405)≧0.5 (1)
酸素透過度≦500 (2)
[式(1)中、A(405)は、波長405nmにおける吸光度を表す。]
[2]下記式(3)を満たす[1]に記載の光学フィルム。
A(440)≦0.1 (3)
[式(1)中、A(440)は、波長440nmにおける吸光度を表す。]
[3]さらに、式(3)を満たす[1]又は[2]に記載の光学フィルム。
A(405)/A(440)≧5 (3)
[式(3)中、A(405)は波長405nmにおける吸光度を表し、A(440)は波長440nmにおける吸光度を表す。]
[4]光選択吸収層が、光選択吸収機能を有する粘着剤層である[1]~[3]のいずれかに記載の光学フィルム。
[5]光選択吸収層が、(メタ)アクリル系樹脂(A)、架橋剤(B)及び光選択吸収化合物(C)を含む粘着剤組成物から形成される粘着剤層である[4]に記載の光学フィルム。
[6]架橋剤(B)の含有量が、(メタ)アクリル系樹脂(A)100質量部に対して、0.01~15質量部である[5]に記載の光学フィルム。
[7]光選択吸収化合物(C)の含有量が、(メタ)アクリル系樹脂(A)100質量部に対して、0.01~20質量部である[5]又は[6]に記載の光学フィルム。
[8]光選択吸収化合物(C)が、下記式(5)を満たす化合物である[5]~[7]のいずれかに記載の光学フィルム。
ε(405)≧20 (5)
〔式(5)中、ε(405)は波長405nmにおける化合物のグラム吸光係数を表す。〕
[9]光選択吸収化合物(C)が、下記式(6)を満たす化合物である[8]に記載の光学フィルム。
ε(405)/ε(440)≧20 (6)
[式(6)中、ε(405)は波長405nmにおける化合物のグラム吸光係数を表し、ε(440)は波長440nmにおけるグラム吸光度係数を表す。]
[10]光選択吸収化合物(C)が、分子内にメロシアニン構造を有する化合物である[5]~[9]のいずれかに記載の光学フィルム。
[11]酸素遮蔽層は、ポリエステル系樹脂(E)ポリビニルアルコール系樹脂(F)、ポリアミド系樹脂(G)、ポリイミド系樹脂(H)及びセルロース系樹脂(I)から選ばれる少なくとも1種の樹脂から形成される樹脂層である[1]~[10]のいずれかに記載の光学フィルム。
[12]酸素遮蔽層が、ポリビニルアルコール系樹脂から形成される偏光フィルムである[1]~[11]のいずれかに記載の光学フィルム。
[13][1]~[12]の光学フィルムを含む表示装置。 The present invention includes the following inventions.
[1] An optical film comprising at least one light selective absorption layer and at least one oxygen shielding layer, and satisfying the following formula (1) and formula (2).
A (405) 0.5 0.5 (1)
Oxygen permeability ≦ 500 (2)
[In Formula (1), A (405) represents the absorbance at a wavelength of 405 nm. ]
[2] The optical film according to [1], which satisfies the following formula (3).
A (440) ≦ 0.1 (3)
[In Formula (1), A (440) represents the light absorbency in wavelength 440nm. ]
[3] The optical film according to [1] or [2], further satisfying formula (3).
A (405) / A (440) ≧ 5 (3)
[In Formula (3), A (405) represents the absorbance at a wavelength of 405 nm, and A (440) represents the absorbance at a wavelength of 440 nm. ]
[4] The optical film according to any one of [1] to [3], wherein the light selective absorption layer is a pressure-sensitive adhesive layer having a light selective absorption function.
[5] A pressure-sensitive adhesive layer formed from a pressure-sensitive adhesive composition comprising a (meth) acrylic resin (A), a crosslinking agent (B) and a photoselective absorption compound (C) [4] The optical film as described in.
[6] The optical film as described in [5], wherein the content of the crosslinking agent (B) is 0.01 to 15 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (A).
[7] The compound as described in [5] or [6], wherein the content of the light selective absorption compound (C) is 0.01 to 20 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (A). Optical film.
[8] The optical film according to any one of [5] to [7], wherein the light selective absorption compound (C) is a compound satisfying the following formula (5).
ε (405) 20 20 (5)
[In Formula (5), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm. ]
[9] The optical film according to [8], wherein the light selective absorption compound (C) is a compound satisfying the following formula (6).
ε (405) / ε (440) ≧ 20 (6)
[In Formula (6), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm, and (epsilon) (440) represents the gram absorption coefficient in wavelength 440 nm. ]
[10] The optical film according to any one of [5] to [9], wherein the photoselective absorption compound (C) is a compound having a merocyanine structure in its molecule.
[11] The oxygen shielding layer is at least one resin selected from polyester resin (E) polyvinyl alcohol resin (F), polyamide resin (G), polyimide resin (H) and cellulose resin (I) The optical film according to any one of [1] to [10], which is a resin layer formed from
[12] The optical film according to any one of [1] to [11], wherein the oxygen shielding layer is a polarizing film formed of a polyvinyl alcohol resin.
[13] A display device including the optical film of [1] to [12].
[1]少なくとも1層の光選択吸収層と少なくとも1層の酸素遮蔽層とを含む光学フィルムであって、かつ下記式(1)及び式(2)を満たす光学フィルム。
A(405)≧0.5 (1)
酸素透過度≦500 (2)
[式(1)中、A(405)は、波長405nmにおける吸光度を表す。]
[2]下記式(3)を満たす[1]に記載の光学フィルム。
A(440)≦0.1 (3)
[式(1)中、A(440)は、波長440nmにおける吸光度を表す。]
[3]さらに、式(3)を満たす[1]又は[2]に記載の光学フィルム。
A(405)/A(440)≧5 (3)
[式(3)中、A(405)は波長405nmにおける吸光度を表し、A(440)は波長440nmにおける吸光度を表す。]
[4]光選択吸収層が、光選択吸収機能を有する粘着剤層である[1]~[3]のいずれかに記載の光学フィルム。
[5]光選択吸収層が、(メタ)アクリル系樹脂(A)、架橋剤(B)及び光選択吸収化合物(C)を含む粘着剤組成物から形成される粘着剤層である[4]に記載の光学フィルム。
[6]架橋剤(B)の含有量が、(メタ)アクリル系樹脂(A)100質量部に対して、0.01~15質量部である[5]に記載の光学フィルム。
[7]光選択吸収化合物(C)の含有量が、(メタ)アクリル系樹脂(A)100質量部に対して、0.01~20質量部である[5]又は[6]に記載の光学フィルム。
[8]光選択吸収化合物(C)が、下記式(5)を満たす化合物である[5]~[7]のいずれかに記載の光学フィルム。
ε(405)≧20 (5)
〔式(5)中、ε(405)は波長405nmにおける化合物のグラム吸光係数を表す。〕
[9]光選択吸収化合物(C)が、下記式(6)を満たす化合物である[8]に記載の光学フィルム。
ε(405)/ε(440)≧20 (6)
[式(6)中、ε(405)は波長405nmにおける化合物のグラム吸光係数を表し、ε(440)は波長440nmにおけるグラム吸光度係数を表す。]
[10]光選択吸収化合物(C)が、分子内にメロシアニン構造を有する化合物である[5]~[9]のいずれかに記載の光学フィルム。
[11]酸素遮蔽層は、ポリエステル系樹脂(E)ポリビニルアルコール系樹脂(F)、ポリアミド系樹脂(G)、ポリイミド系樹脂(H)及びセルロース系樹脂(I)から選ばれる少なくとも1種の樹脂から形成される樹脂層である[1]~[10]のいずれかに記載の光学フィルム。
[12]酸素遮蔽層が、ポリビニルアルコール系樹脂から形成される偏光フィルムである[1]~[11]のいずれかに記載の光学フィルム。
[13][1]~[12]の光学フィルムを含む表示装置。 The present invention includes the following inventions.
[1] An optical film comprising at least one light selective absorption layer and at least one oxygen shielding layer, and satisfying the following formula (1) and formula (2).
A (405) 0.5 0.5 (1)
Oxygen permeability ≦ 500 (2)
[In Formula (1), A (405) represents the absorbance at a wavelength of 405 nm. ]
[2] The optical film according to [1], which satisfies the following formula (3).
A (440) ≦ 0.1 (3)
[In Formula (1), A (440) represents the light absorbency in wavelength 440nm. ]
[3] The optical film according to [1] or [2], further satisfying formula (3).
A (405) / A (440) ≧ 5 (3)
[In Formula (3), A (405) represents the absorbance at a wavelength of 405 nm, and A (440) represents the absorbance at a wavelength of 440 nm. ]
[4] The optical film according to any one of [1] to [3], wherein the light selective absorption layer is a pressure-sensitive adhesive layer having a light selective absorption function.
[5] A pressure-sensitive adhesive layer formed from a pressure-sensitive adhesive composition comprising a (meth) acrylic resin (A), a crosslinking agent (B) and a photoselective absorption compound (C) [4] The optical film as described in.
[6] The optical film as described in [5], wherein the content of the crosslinking agent (B) is 0.01 to 15 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (A).
[7] The compound as described in [5] or [6], wherein the content of the light selective absorption compound (C) is 0.01 to 20 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (A). Optical film.
[8] The optical film according to any one of [5] to [7], wherein the light selective absorption compound (C) is a compound satisfying the following formula (5).
ε (405) 20 20 (5)
[In Formula (5), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm. ]
[9] The optical film according to [8], wherein the light selective absorption compound (C) is a compound satisfying the following formula (6).
ε (405) / ε (440) ≧ 20 (6)
[In Formula (6), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm, and (epsilon) (440) represents the gram absorption coefficient in wavelength 440 nm. ]
[10] The optical film according to any one of [5] to [9], wherein the photoselective absorption compound (C) is a compound having a merocyanine structure in its molecule.
[11] The oxygen shielding layer is at least one resin selected from polyester resin (E) polyvinyl alcohol resin (F), polyamide resin (G), polyimide resin (H) and cellulose resin (I) The optical film according to any one of [1] to [10], which is a resin layer formed from
[12] The optical film according to any one of [1] to [11], wherein the oxygen shielding layer is a polarizing film formed of a polyvinyl alcohol resin.
[13] A display device including the optical film of [1] to [12].
本発明の光学フィルムは、405nm付近の短波長の可視光に対する高い吸収選択性を示すことにより、位相差フィルムや有機EL発光素子の短波長の可視光による劣化について良好な抑制機能を有する。また、本発明の光学フィルムは、耐候性試験後であっても波長405nm付近の短波長の可視光に対する高い吸収選択性を示し、短波長の可視光による劣化の抑制を保つことができる。本発明の光学フィルムを表示装置に用いた場合には良好な表示特性と耐久性とを付与することができる。
The optical film of the present invention exhibits a high absorption selectivity for visible light of a short wavelength near 405 nm, and thus has a good suppression function for deterioration of the retardation film or the organic EL light emitting element due to visible light of a short wavelength. In addition, the optical film of the present invention exhibits high absorption selectivity to visible light having a short wavelength near 405 nm even after the weathering test, and can suppress deterioration due to visible light having a short wavelength. When the optical film of the present invention is used in a display device, good display characteristics and durability can be imparted.
本発明の光学フィルムは、少なくとも1層の光選択吸収層と少なくとも1層の酸素遮蔽層とを含み、かつ下記式(1)及び式(2)を満たす光学フィルムである。
A(405)≧0.5 (1)
酸素透過度≦500 (2)
[式(1)中、A(405)は、波長405nmにおける吸光度を表す。] The optical film of the present invention is an optical film including at least one light selective absorption layer and at least one oxygen shielding layer, and satisfying the following formulas (1) and (2).
A (405) 0.5 0.5 (1)
Oxygen permeability ≦ 500 (2)
[In Formula (1), A (405) represents the absorbance at a wavelength of 405 nm. ]
A(405)≧0.5 (1)
酸素透過度≦500 (2)
[式(1)中、A(405)は、波長405nmにおける吸光度を表す。] The optical film of the present invention is an optical film including at least one light selective absorption layer and at least one oxygen shielding layer, and satisfying the following formulas (1) and (2).
A (405) 0.5 0.5 (1)
Oxygen permeability ≦ 500 (2)
[In Formula (1), A (405) represents the absorbance at a wavelength of 405 nm. ]
A(405)の値が大きいほど波長405nmにおける吸収が高いことを表し、A(405)の値が0.5未満であると、波長405nmにおける吸収が低く、紫外線や短波長の可視光における位相差フィルムや有機EL素子等の表示装置の劣化を抑制する効果が小さい。A(405)の値は、耐候劣化抑制の観点から、好ましくは0.6以上であり、より好ましくは0.8以上であり、特に好ましくは1.0以上である。上限は特にないが、通常は10以下である。
The larger the value of A (405), the higher the absorption at a wavelength of 405 nm. If the value of A (405) is less than 0.5, the absorption at a wavelength of 405 nm is low, and the position in ultraviolet light or short wavelength visible light The effect of suppressing deterioration of a display device such as a retardation film or an organic EL element is small. The value of A (405) is preferably 0.6 or more, more preferably 0.8 or more, and particularly preferably 1.0 or more, from the viewpoint of suppressing weathering deterioration. There is no particular upper limit, but it is usually 10 or less.
酸素透過度の値が小さいほど光学フィルムの酸素透過が少ないことを表し、酸素透過度の値が500以下であると、酸素を透過させにくく、光選択吸収層自身の紫外線や短波長の可視光による劣化を抑制することができる。酸素透過度の値は、好ましくは100以下であり、より好ましくは50以下である。酸素透過度の単位は、「cm3/(m2・24h・atm)」である。なお、酸素透過度は、JIS K 7126-1に記載の方法に従って測定できる。
The smaller the value of oxygen permeability, the lower the oxygen permeability of the optical film. If the value of oxygen permeability is 500 or less, it is difficult to transmit oxygen, and the ultraviolet light of the light selective absorption layer itself and visible light of short wavelength Can be suppressed. The oxygen permeability value is preferably 100 or less, more preferably 50 or less. The unit of oxygen permeability is "cm3 / (m2 · 24 h · atm)". The oxygen permeability can be measured according to the method described in JIS K 7126-1.
本発明の光学フィルムは、さらに下記式(3)を満たすことが好ましい。
A(440)≦0.1 (3)
[式(1)中、A(440)は、波長440nmにおける吸光度を表す。]
A(440)の値が小さいほど波長440nmにおける吸収が低いことを表し、A(440)の値が0.1を超えると、表示装置における良好な色彩表現を損なう傾向にある。また表示装置の発光を阻害する傾向にあるため、表示装置の輝度も低下する可能性がある。A(440)の値は、表示装置の発光阻害を抑制する観点から、好ましくは0.05以下であり、より好ましくは0.04以下であり、特に好ましくは0.03である。下限は特に制限ないが、通常は0.00001以上である。 The optical film of the present invention preferably further satisfies the following formula (3).
A (440) ≦ 0.1 (3)
[In Formula (1), A (440) represents the light absorbency in wavelength 440nm. ]
The smaller the value of A (440), the lower the absorption at a wavelength of 440 nm. When the value of A (440) exceeds 0.1, there is a tendency to impair good color expression in the display device. Further, since the light emission of the display device tends to be inhibited, the luminance of the display device may also be reduced. The value of A (440) is preferably 0.05 or less, more preferably 0.04 or less, and particularly preferably 0.03, from the viewpoint of suppressing the light emission inhibition of the display device. The lower limit is not particularly limited, but is usually 0.00001 or more.
A(440)≦0.1 (3)
[式(1)中、A(440)は、波長440nmにおける吸光度を表す。]
A(440)の値が小さいほど波長440nmにおける吸収が低いことを表し、A(440)の値が0.1を超えると、表示装置における良好な色彩表現を損なう傾向にある。また表示装置の発光を阻害する傾向にあるため、表示装置の輝度も低下する可能性がある。A(440)の値は、表示装置の発光阻害を抑制する観点から、好ましくは0.05以下であり、より好ましくは0.04以下であり、特に好ましくは0.03である。下限は特に制限ないが、通常は0.00001以上である。 The optical film of the present invention preferably further satisfies the following formula (3).
A (440) ≦ 0.1 (3)
[In Formula (1), A (440) represents the light absorbency in wavelength 440nm. ]
The smaller the value of A (440), the lower the absorption at a wavelength of 440 nm. When the value of A (440) exceeds 0.1, there is a tendency to impair good color expression in the display device. Further, since the light emission of the display device tends to be inhibited, the luminance of the display device may also be reduced. The value of A (440) is preferably 0.05 or less, more preferably 0.04 or less, and particularly preferably 0.03, from the viewpoint of suppressing the light emission inhibition of the display device. The lower limit is not particularly limited, but is usually 0.00001 or more.
本発明の光学フィルムは、さらに下記式(4)を満たすことが好ましい。
A(405)/A(440)≧5 (4)
[式(4)中、A(405)は波長405nmにおける吸光度を表し、A(440)は波長440nmにおける吸光度を表す。]
A(405)/A(440)の値は、波長440nmにおける吸収の大きさに対する波長405nmの吸収の大きさを表し、この値が大きいほど405nm付近の波長域に特異的な吸収があることを表す。A(405)/A(440)の値は10以上であることが好ましく、30以上であることがより好ましく、特に好ましくは60以上である。 The optical film of the present invention preferably further satisfies the following formula (4).
A (405) / A (440) ≧ 5 (4)
[In Formula (4), A (405) represents the light absorbency in wavelength 405 nm, and A (440) represents the light absorbency in wavelength 440 nm. ]
The value of A (405) / A (440) represents the magnitude of absorption at a wavelength of 405 nm with respect to the magnitude of absorption at a wavelength of 440 nm. The larger the value, the specific absorption in a wavelength range near 405 nm. Represent. The value of A (405) / A (440) is preferably 10 or more, more preferably 30 or more, and particularly preferably 60 or more.
A(405)/A(440)≧5 (4)
[式(4)中、A(405)は波長405nmにおける吸光度を表し、A(440)は波長440nmにおける吸光度を表す。]
A(405)/A(440)の値は、波長440nmにおける吸収の大きさに対する波長405nmの吸収の大きさを表し、この値が大きいほど405nm付近の波長域に特異的な吸収があることを表す。A(405)/A(440)の値は10以上であることが好ましく、30以上であることがより好ましく、特に好ましくは60以上である。 The optical film of the present invention preferably further satisfies the following formula (4).
A (405) / A (440) ≧ 5 (4)
[In Formula (4), A (405) represents the light absorbency in wavelength 405 nm, and A (440) represents the light absorbency in wavelength 440 nm. ]
The value of A (405) / A (440) represents the magnitude of absorption at a wavelength of 405 nm with respect to the magnitude of absorption at a wavelength of 440 nm. The larger the value, the specific absorption in a wavelength range near 405 nm. Represent. The value of A (405) / A (440) is preferably 10 or more, more preferably 30 or more, and particularly preferably 60 or more.
本発明のフィルムは、通常0.2μm~600μmである。
The film of the present invention is usually 0.2 μm to 600 μm.
<光選択吸収層>
光選択吸収層は、波長405nmの光に対して高い吸収性能を有する層であり、上記式(1)を満たす。光選択吸収層は、光学フィルムを形成するどの層であってもよいが、光選択吸収機能を有する粘着剤層であることが好ましい。光選択吸収機能を有する粘着剤層は、光選択吸収機能を有する粘着剤組成物から形成される。
光選択吸収層(好ましくは光選択吸収機能を有する粘着剤層)の厚みは、通常0.1μm~50μmであり、好ましくは1μm~30μmであり、より好ましくは4μm~20μmである。 <Selective absorption layer>
The light selective absorption layer is a layer having high absorption performance for light with a wavelength of 405 nm, and satisfies the above formula (1). The light selective absorption layer may be any layer that forms an optical film, but is preferably a pressure-sensitive adhesive layer having a light selective absorption function. The pressure-sensitive adhesive layer having a light selective absorption function is formed of a pressure-sensitive adhesive composition having a light selective absorption function.
The thickness of the light selective absorption layer (preferably a pressure-sensitive adhesive layer having a light selective absorption function) is usually 0.1 μm to 50 μm, preferably 1 μm to 30 μm, and more preferably 4 μm to 20 μm.
光選択吸収層は、波長405nmの光に対して高い吸収性能を有する層であり、上記式(1)を満たす。光選択吸収層は、光学フィルムを形成するどの層であってもよいが、光選択吸収機能を有する粘着剤層であることが好ましい。光選択吸収機能を有する粘着剤層は、光選択吸収機能を有する粘着剤組成物から形成される。
光選択吸収層(好ましくは光選択吸収機能を有する粘着剤層)の厚みは、通常0.1μm~50μmであり、好ましくは1μm~30μmであり、より好ましくは4μm~20μmである。 <Selective absorption layer>
The light selective absorption layer is a layer having high absorption performance for light with a wavelength of 405 nm, and satisfies the above formula (1). The light selective absorption layer may be any layer that forms an optical film, but is preferably a pressure-sensitive adhesive layer having a light selective absorption function. The pressure-sensitive adhesive layer having a light selective absorption function is formed of a pressure-sensitive adhesive composition having a light selective absorption function.
The thickness of the light selective absorption layer (preferably a pressure-sensitive adhesive layer having a light selective absorption function) is usually 0.1 μm to 50 μm, preferably 1 μm to 30 μm, and more preferably 4 μm to 20 μm.
光選択吸収機能を有する粘着剤組成物は、光吸収性化合物(C)、樹脂(A)及び架橋剤(B)を含む粘着剤組成物であることが好ましく、さらにシラン化合物(D)を含む粘着剤組成物であることがより好ましい。
The pressure-sensitive adhesive composition having a light selective absorption function is preferably a pressure-sensitive adhesive composition containing a light absorbing compound (C), a resin (A) and a crosslinking agent (B), and further contains a silane compound (D). It is more preferable that it is an adhesive composition.
光吸収性化合物(C)は、波長405nmの光を選択的に吸収する化合物であり、式(5)を満たす化合物であることが好ましく、さらに式(6)を満たす化合物であることがより好ましい。
ε(405)≧20 (5)
〔式(5)中、ε(405)は波長405nmにおける化合物のグラム吸光係数を表す。グラム吸光係数の単位はL/(g・cm)である。〕
ε(405)/ε(440)≧20 (6)
[式(6)中、ε(405)は波長405nmにおける化合物のグラム吸光係数を表し、ε(440)は波長440nmにおけるグラム吸光度係数を表す。]
なお、グラム吸光度係数は、実施例に記載の方法で測定できる。 The light absorbing compound (C) is a compound that selectively absorbs light having a wavelength of 405 nm, is preferably a compound satisfying the formula (5), and is more preferably a compound satisfying the formula (6) .
ε (405) 20 20 (5)
[In Formula (5), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm. The unit of gram absorption coefficient is L / (g · cm). ]
ε (405) / ε (440) ≧ 20 (6)
[In Formula (6), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm, and (epsilon) (440) represents the gram absorption coefficient in wavelength 440 nm. ]
The gram absorbance coefficient can be measured by the method described in the examples.
ε(405)≧20 (5)
〔式(5)中、ε(405)は波長405nmにおける化合物のグラム吸光係数を表す。グラム吸光係数の単位はL/(g・cm)である。〕
ε(405)/ε(440)≧20 (6)
[式(6)中、ε(405)は波長405nmにおける化合物のグラム吸光係数を表し、ε(440)は波長440nmにおけるグラム吸光度係数を表す。]
なお、グラム吸光度係数は、実施例に記載の方法で測定できる。 The light absorbing compound (C) is a compound that selectively absorbs light having a wavelength of 405 nm, is preferably a compound satisfying the formula (5), and is more preferably a compound satisfying the formula (6) .
ε (405) 20 20 (5)
[In Formula (5), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm. The unit of gram absorption coefficient is L / (g · cm). ]
ε (405) / ε (440) ≧ 20 (6)
[In Formula (6), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm, and (epsilon) (440) represents the gram absorption coefficient in wavelength 440 nm. ]
The gram absorbance coefficient can be measured by the method described in the examples.
ε(405)の値が大きい化合物ほど波長405nmの光を吸収しやすく、紫外線又短波長の可視光における位相差フィルムの劣化を抑制する。ε(405)の値が20L/(g・cm)未満であると、光選択吸収層中における光選択吸収化合物(C)の含有量を増大させないと、位相差フィルムや有機EL発光素子の紫外線や短波長の可視光による劣化抑制機能を発現しにくい傾向にある。光選択吸収化合物(C)の含有量が増大すると、光選択吸収層中における光選択吸収化合物(C)がブリードアウト又は不均一に分散してしまい、光吸収機能が不十分となることがある。ε(405)の値は20L/(g・cm)以上であることが好ましく、30L/(g・cm)以上であることがより好ましく、40L/(g・cm)以上であることがさらにより好ましく、通常500L/(g・cm)以下である。
The larger the value of ε (405), the easier it is to absorb light with a wavelength of 405 nm, and the deterioration of the retardation film in ultraviolet light or visible light with a short wavelength is suppressed. If the value of ε (405) is less than 20 L / (g · cm), the content of the light selective absorption compound (C) in the light selective absorption layer is not increased, the ultraviolet light of the retardation film or the organic EL light emitting element And it tends to be difficult to express the function of suppressing deterioration by visible light of short wavelength. When the content of the light selective absorption compound (C) increases, the light selective absorption compound (C) in the light selective absorption layer may bleed out or be dispersed unevenly, and the light absorption function may be insufficient. . The value of ε (405) is preferably 20 L / (g · cm) or more, more preferably 30 L / (g · cm) or more, and even more preferably 40 L / (g · cm) or more Preferably, it is usually 500 L / (g · cm) or less.
ε(405)/ε(440)の値が大きい化合物ほど、表示装置の色彩表現を阻害することなく、405nm付近の光を吸収し位相差フィルムや有機EL素子等の表示装置の光劣化を抑制することができる。ε(405)/ε(440)の値は20以上が好ましく、40以上がより好ましく、70以上がさらにより好ましく、80以上が特により好ましい。
A compound having a larger value of ε (405) / ε (440) absorbs light in the vicinity of 405 nm and suppresses light degradation of a display device such as a retardation film or an organic EL element without inhibiting color expression of the display device. can do. The value of ε (405) / ε (440) is preferably 20 or more, more preferably 40 or more, still more preferably 70 or more, and particularly preferably 80 or more.
また、光選択吸収化合物(C)は、分子内にメロシアニン構造を含む化合物であることが好ましい。メロシアニン構造を含む化合物としては、-(N-C=C-C=C)-で示される部分構造を分子内に含有している化合物であって、例えば、メロシアニン系化合物、シアニン系化合物、インドール系化合物、ベンゾトリアゾール系化合物等が挙げられ、好ましくはメロシアニン系化合物、シアニン系化合物及びベンゾトリアゾール系化合物である。
光選択吸収化合物(c)は、式(I)で表される化合物(以下、化合物(I)という場合がある。)であることが好ましい。
[式中、R1及びR5は、それぞれ独立して、水素原子、置換基を有していてもよい炭素数1~25のアルキル基、置換基を有していてもよい炭素数7~15のアラルキル基、炭素数6~15のアリール基、複素環基を表し、該アルキル基又はアラルキル基に含まれる-CH2-は-NR1A-、-CO-、-SO2-、-O-又は-S-に置換されていてもよい。
R1Aは、水素原子又は炭素数1~6のアルキル基を表す。
R2、R3及びR4は、それぞれ独立して、水素原子、置換基を有していてもよい炭素数1~6のアルキル基、置換基を有していてもよい芳香族炭化水素基又は置換基を有していてもよい芳香族複素環基を表し、該アルキル基に含まれる-CH2-は-NR1B-、-CO-、-NO2-、-O-又は-S-で置換されていてもよい。
R1Bは、水素原子又は炭素数1~6のアルキル基を表す。
R6及びR7は、それぞれ独立して、水素原子、炭素数1~25のアルキル基又は電子吸引性基を表すか、R6及びR7は互いに連結して環構造を形成してもよい。
R1及びR2は互いに連結して環構造を形成してもよく、R2及びR3は互いに連結して環構造を形成してもよく、R2及びR4は互いに連結して環構造を形成してもよく、R3及びR6は、互いに連結して環構造を形成してもよい。] Moreover, it is preferable that a photoselective absorption compound (C) is a compound which contains a merocyanine structure in a molecule | numerator. The compound having a merocyanine structure is a compound containing in its molecule a partial structure represented by-(N-C = C-C = C)-, and examples thereof include merocyanine compounds, cyanine compounds and indoles. Examples thereof include a compound based on the compound and a benzotriazole based compound, and preferred are merocyanine based compounds, cyanine based compounds and benzotriazole based compounds.
The light selective absorption compound (c) is preferably a compound represented by the formula (I) (hereinafter sometimes referred to as a compound (I)).
[Wherein, R 1 and R 5 each independently represent a hydrogen atom, an alkyl group having 1 to 25 carbon atoms which may have a substituent, or 7 to carbon atoms which may have a substituent; 15 represent an aralkyl group, an aryl group having a carbon number of 6 to 15, and a heterocyclic group, and -CH 2- contained in the alkyl group or the aralkyl group is -NR 1A- , -CO-, -SO 2- , -O It may be substituted by-or -S-.
R 1A represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
R 2 , R 3 and R 4 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms which may have a substituent, or an aromatic hydrocarbon group which may have a substituent Or an aromatic heterocyclic group which may have a substituent, and -CH 2- contained in the alkyl group is -NR 1B- , -CO-, -NO 2- , -O- or -S- And may be substituted.
R 1B represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
R 6 and R 7 each independently represent a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, or an electron-withdrawing group, or R 6 and R 7 may be linked to each other to form a ring structure .
R 1 and R 2 may be linked to each other to form a ring structure, and R 2 and R 3 may be linked to each other to form a ring structure, and R 2 and R 4 are linked to each other to form a ring structure And R 3 and R 6 may be linked to each other to form a ring structure. ]
光選択吸収化合物(c)は、式(I)で表される化合物(以下、化合物(I)という場合がある。)であることが好ましい。
[式中、R1及びR5は、それぞれ独立して、水素原子、置換基を有していてもよい炭素数1~25のアルキル基、置換基を有していてもよい炭素数7~15のアラルキル基、炭素数6~15のアリール基、複素環基を表し、該アルキル基又はアラルキル基に含まれる-CH2-は-NR1A-、-CO-、-SO2-、-O-又は-S-に置換されていてもよい。
R1Aは、水素原子又は炭素数1~6のアルキル基を表す。
R2、R3及びR4は、それぞれ独立して、水素原子、置換基を有していてもよい炭素数1~6のアルキル基、置換基を有していてもよい芳香族炭化水素基又は置換基を有していてもよい芳香族複素環基を表し、該アルキル基に含まれる-CH2-は-NR1B-、-CO-、-NO2-、-O-又は-S-で置換されていてもよい。
R1Bは、水素原子又は炭素数1~6のアルキル基を表す。
R6及びR7は、それぞれ独立して、水素原子、炭素数1~25のアルキル基又は電子吸引性基を表すか、R6及びR7は互いに連結して環構造を形成してもよい。
R1及びR2は互いに連結して環構造を形成してもよく、R2及びR3は互いに連結して環構造を形成してもよく、R2及びR4は互いに連結して環構造を形成してもよく、R3及びR6は、互いに連結して環構造を形成してもよい。] Moreover, it is preferable that a photoselective absorption compound (C) is a compound which contains a merocyanine structure in a molecule | numerator. The compound having a merocyanine structure is a compound containing in its molecule a partial structure represented by-(N-C = C-C = C)-, and examples thereof include merocyanine compounds, cyanine compounds and indoles. Examples thereof include a compound based on the compound and a benzotriazole based compound, and preferred are merocyanine based compounds, cyanine based compounds and benzotriazole based compounds.
The light selective absorption compound (c) is preferably a compound represented by the formula (I) (hereinafter sometimes referred to as a compound (I)).
[Wherein, R 1 and R 5 each independently represent a hydrogen atom, an alkyl group having 1 to 25 carbon atoms which may have a substituent, or 7 to carbon atoms which may have a substituent; 15 represent an aralkyl group, an aryl group having a carbon number of 6 to 15, and a heterocyclic group, and -CH 2- contained in the alkyl group or the aralkyl group is -NR 1A- , -CO-, -SO 2- , -O It may be substituted by-or -S-.
R 1A represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
R 2 , R 3 and R 4 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms which may have a substituent, or an aromatic hydrocarbon group which may have a substituent Or an aromatic heterocyclic group which may have a substituent, and -CH 2- contained in the alkyl group is -NR 1B- , -CO-, -NO 2- , -O- or -S- And may be substituted.
R 1B represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
R 6 and R 7 each independently represent a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, or an electron-withdrawing group, or R 6 and R 7 may be linked to each other to form a ring structure .
R 1 and R 2 may be linked to each other to form a ring structure, and R 2 and R 3 may be linked to each other to form a ring structure, and R 2 and R 4 are linked to each other to form a ring structure And R 3 and R 6 may be linked to each other to form a ring structure. ]
R1及びR5で表される炭素数1~25のアルキル基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、2-シアノプロピル基、n-ブチル基、tert-ブチル基、sec-ブチル基、n-ペンチル基、n-ヘキシル基、1-メチルブチル基、3-メチルブチル基、n-オクチル基、n-デシル、2-へキシル-オクチル基等が挙げられる。
R1及びR5で表される炭素数1~25のアルキル基が有していてもよい置換基としては、ヒドロキシ基、シアノ基等が挙げられる。 Examples of the alkyl group having 1 to 25 carbon atoms represented by R 1 and R 5 include methyl group, ethyl group, n-propyl group, isopropyl group, 2-cyanopropyl group, n-butyl group, tert-butyl group, and sec-butyl, n-pentyl, n-hexyl, 1-methylbutyl, 3-methylbutyl, n-octyl, n-decyl, 2-hexyl-octyl and the like.
Examples of the substituent which the alkyl group having 1 to 25 carbon atoms represented by R 1 and R 5 may have include a hydroxy group, a cyano group and the like.
R1及びR5で表される炭素数1~25のアルキル基が有していてもよい置換基としては、ヒドロキシ基、シアノ基等が挙げられる。 Examples of the alkyl group having 1 to 25 carbon atoms represented by R 1 and R 5 include methyl group, ethyl group, n-propyl group, isopropyl group, 2-cyanopropyl group, n-butyl group, tert-butyl group, and sec-butyl, n-pentyl, n-hexyl, 1-methylbutyl, 3-methylbutyl, n-octyl, n-decyl, 2-hexyl-octyl and the like.
Examples of the substituent which the alkyl group having 1 to 25 carbon atoms represented by R 1 and R 5 may have include a hydroxy group, a cyano group and the like.
R1及びR5で表される炭素数7~15のアラルキル基としては、ベンジル基、フェニルエチル基等が挙げられる。アラルキル基に含まれる-CH2-が、-SO2-又は-COO-に置き換わった基としては2-フェニル酢酸エチル基等が挙げられる。
R1及びR5で表される炭素数7~15のアラルキル基が有していてもよい置換基としては、以下の群Aに記載の基が挙げられる。
群A:ニトロ基、ヒドロキシ基、カルボキシ基、スルホ基、シアノ基、アミノ基、ハロゲン原子、炭素数1~6のアルコキシ基、炭素数1~12のアルキルシリル基、炭素数2~8のアルキルカルボニル基、*-Ra1-(O-Ra2)t1-Ra3(Ra1及びRa2は、それぞれ独立して、炭素数1~6のアルカンジイル基を表し、Ra3は炭素数1~6のアルキル基を表し、s1は1~3の整数を表す。)で表される基等が挙げられる。 Examples of the aralkyl group having 7 to 15 carbon atoms represented by R 1 and R 5 include a benzyl group and a phenylethyl group. Examples of the group in which —CH 2 — contained in the aralkyl group is replaced by —SO 2 — or —COO— include a 2-phenylacetic acid ethyl group and the like.
Examples of the substituent which the aralkyl group having 7 to 15 carbon atoms represented by R 1 and R 5 may have include the groups described in the following group A.
Group A: nitro, hydroxy, carboxy, sulfo, cyano, amino, halogen, alkoxy having 1 to 6 carbons, alkylsilyl having 1 to 12 carbons, alkyl having 2 to 8 carbons carbonyl group, * - R a1 - (O -R a2) t1 -R a3 (R a1 and R a2 each independently represent an alkanediyl group having 1 to 6 carbon atoms, R a3 is a C1- 6 represents an alkyl group, ands 1 represents an integer of 1 to 3.) and the like.
R1及びR5で表される炭素数7~15のアラルキル基が有していてもよい置換基としては、以下の群Aに記載の基が挙げられる。
群A:ニトロ基、ヒドロキシ基、カルボキシ基、スルホ基、シアノ基、アミノ基、ハロゲン原子、炭素数1~6のアルコキシ基、炭素数1~12のアルキルシリル基、炭素数2~8のアルキルカルボニル基、*-Ra1-(O-Ra2)t1-Ra3(Ra1及びRa2は、それぞれ独立して、炭素数1~6のアルカンジイル基を表し、Ra3は炭素数1~6のアルキル基を表し、s1は1~3の整数を表す。)で表される基等が挙げられる。 Examples of the aralkyl group having 7 to 15 carbon atoms represented by R 1 and R 5 include a benzyl group and a phenylethyl group. Examples of the group in which —CH 2 — contained in the aralkyl group is replaced by —SO 2 — or —COO— include a 2-phenylacetic acid ethyl group and the like.
Examples of the substituent which the aralkyl group having 7 to 15 carbon atoms represented by R 1 and R 5 may have include the groups described in the following group A.
Group A: nitro, hydroxy, carboxy, sulfo, cyano, amino, halogen, alkoxy having 1 to 6 carbons, alkylsilyl having 1 to 12 carbons, alkyl having 2 to 8 carbons carbonyl group, * - R a1 - (O -R a2) t1 -R a3 (R a1 and R a2 each independently represent an alkanediyl group having 1 to 6 carbon atoms, R a3 is a C1- 6 represents an alkyl group, and
炭素数1~12のアルキルシリル基としては、メチルシリル基、エチルシリル、プロピルシリル基等のモノアルキルシリル基;ジメチルシリル基、ジエチルシリル基、メチルエチルシリル基等のジアルキルシリル基;トリメチルシリル、トリエチルシリル、トリプロピルシリル基等のトリアルキルシリル基が挙げられる。
炭素数2~8のアルキルカルボニル基としては、メチルカルボニル基、エチルカルボニル基等が挙げられる。
ハロゲン原子としては、フッ素原子、塩素原子、臭素原子等が挙げられる。 Examples of the alkylsilyl group having 1 to 12 carbon atoms include monoalkylsilyl groups such as methylsilyl group, ethylsilyl and propylsilyl groups; dialkylsilyl groups such as dimethylsilyl group, diethylsilyl group and methylethylsilyl group; trimethylsilyl and triethylsilyl, And trialkylsilyl groups such as tripropylsilyl group.
Examples of the alkylcarbonyl group having 2 to 8 carbon atoms include a methylcarbonyl group and an ethylcarbonyl group.
As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom etc. are mentioned.
炭素数2~8のアルキルカルボニル基としては、メチルカルボニル基、エチルカルボニル基等が挙げられる。
ハロゲン原子としては、フッ素原子、塩素原子、臭素原子等が挙げられる。 Examples of the alkylsilyl group having 1 to 12 carbon atoms include monoalkylsilyl groups such as methylsilyl group, ethylsilyl and propylsilyl groups; dialkylsilyl groups such as dimethylsilyl group, diethylsilyl group and methylethylsilyl group; trimethylsilyl and triethylsilyl, And trialkylsilyl groups such as tripropylsilyl group.
Examples of the alkylcarbonyl group having 2 to 8 carbon atoms include a methylcarbonyl group and an ethylcarbonyl group.
As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom etc. are mentioned.
R1及びR5で表される炭素数6~15のアリール基としては、フェニル基、ナフチル基、アントラセニル基等が挙げられる。
R1及びR5で表される炭素数6~15のアリール基が有していてもよい置換基としては、上記群Aに記載の基が挙げられる。
R1及びR5で表される炭素数6~15の複素環基としては、ピリジル基、ピロリジル基、キノリル基、チオフェン基、イミダゾリル基、オキサゾリル基、ピロール基、チアゾリル基及びフラニル基等の炭素数3~9の芳香族複素環基が挙げられる。 Examples of the aryl group having 6 to 15 carbon atoms represented by R 1 and R 5 include a phenyl group, a naphthyl group and an anthracenyl group.
Examples of the substituent which the aryl group having 6 to 15 carbon atoms represented by R 1 and R 5 may have include the groups described in Group A above.
Examples of the heterocyclic group having 6 to 15 carbon atoms represented by R 1 and R 5 include carbons such as pyridyl, pyrrolidinyl, quinolyl, thiophene, imidazolyl, oxazolyl, pyrrole, thiazolyl and furanyl And 3 to 9 aromatic heterocyclic groups.
R1及びR5で表される炭素数6~15のアリール基が有していてもよい置換基としては、上記群Aに記載の基が挙げられる。
R1及びR5で表される炭素数6~15の複素環基としては、ピリジル基、ピロリジル基、キノリル基、チオフェン基、イミダゾリル基、オキサゾリル基、ピロール基、チアゾリル基及びフラニル基等の炭素数3~9の芳香族複素環基が挙げられる。 Examples of the aryl group having 6 to 15 carbon atoms represented by R 1 and R 5 include a phenyl group, a naphthyl group and an anthracenyl group.
Examples of the substituent which the aryl group having 6 to 15 carbon atoms represented by R 1 and R 5 may have include the groups described in Group A above.
Examples of the heterocyclic group having 6 to 15 carbon atoms represented by R 1 and R 5 include carbons such as pyridyl, pyrrolidinyl, quinolyl, thiophene, imidazolyl, oxazolyl, pyrrole, thiazolyl and furanyl And 3 to 9 aromatic heterocyclic groups.
R1A及びR1Bで表される炭素数1~6のアルキル基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、tert-ブチル基、sec-ブチル基、n-ペンチル基、n-ヘキシル基等が挙げられる。
Examples of the alkyl group having 1 to 6 carbon atoms represented by R 1A and R 1B include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, tert-butyl group, sec-butyl group, n -Pentyl group, n-hexyl group and the like.
R2、R3及びR4で表される炭素数1~6のアルキル基としては、R1Bで表される炭素数1~6のアルキル基と同じものが挙げられる。
R2、R3及びR4で表される炭素数1~6のアルキル基が有していてもよい置換基としては、上記群Aに記載の基が挙げられる。
R2、R3及びR4で表される芳香族炭化水素基としては、フェニル基、ナフチル基、アントラセニル基等炭素数6~15のアリール基;ベンジル基、フェニルエチル基等の炭素数7~15のアラルキル基が挙げられる。
R2、R3及びR4で表される芳香族炭化水素基が有していてもよい置換基としては上記群Aに記載の基が挙げられる。
R2、R3及びR4で表される芳香族複素環としては、ピリジル基、ピロリジル基、キノリル基、チオフェン基、イミダゾリル基、オキサゾリル基、ピロール基、チアゾリル基及びフラニル基等の炭素数3~9の芳香族複素環基が挙げられる。
R2、R3及びR4で表される芳香族複素環が有していてもよい置換基としては、上記群Aに記載の基が挙げられる。 Examples of the alkyl group having 1 to 6 carbon atoms represented by R 2 , R 3 and R 4 include the same ones as the alkyl group having 1 to 6 carbon atoms represented by R 1B .
Examples of the substituent which the alkyl group having 1 to 6 carbon atoms represented by R 2 , R 3 and R 4 may have include the groups described in the above-mentioned group A.
The aromatic hydrocarbon group represented by R 2 , R 3 and R 4 includes aryl groups having 6 to 15 carbon atoms such as phenyl, naphthyl and anthracenyl; and 7 to 15 carbon atoms such as benzyl and phenylethyl. There may be mentioned 15 aralkyl groups.
Examples of the substituent which the aromatic hydrocarbon group represented by R 2 , R 3 and R 4 may have include the groups described in Group A above.
The aromatic heterocyclic ring represented by R 2 , R 3 and R 4 has 3 carbon atoms such as pyridyl, pyrrolidinyl, quinolyl, thiophene, imidazolyl, oxazolyl, pyrrole, thiazolyl and furanyl. And aromatic heterocyclic groups of -9.
As a substituent which the aromatic heterocyclic ring represented by R < 2 >, R < 3 > and R < 4 > may have, the group as described in the said group A is mentioned.
R2、R3及びR4で表される炭素数1~6のアルキル基が有していてもよい置換基としては、上記群Aに記載の基が挙げられる。
R2、R3及びR4で表される芳香族炭化水素基としては、フェニル基、ナフチル基、アントラセニル基等炭素数6~15のアリール基;ベンジル基、フェニルエチル基等の炭素数7~15のアラルキル基が挙げられる。
R2、R3及びR4で表される芳香族炭化水素基が有していてもよい置換基としては上記群Aに記載の基が挙げられる。
R2、R3及びR4で表される芳香族複素環としては、ピリジル基、ピロリジル基、キノリル基、チオフェン基、イミダゾリル基、オキサゾリル基、ピロール基、チアゾリル基及びフラニル基等の炭素数3~9の芳香族複素環基が挙げられる。
R2、R3及びR4で表される芳香族複素環が有していてもよい置換基としては、上記群Aに記載の基が挙げられる。 Examples of the alkyl group having 1 to 6 carbon atoms represented by R 2 , R 3 and R 4 include the same ones as the alkyl group having 1 to 6 carbon atoms represented by R 1B .
Examples of the substituent which the alkyl group having 1 to 6 carbon atoms represented by R 2 , R 3 and R 4 may have include the groups described in the above-mentioned group A.
The aromatic hydrocarbon group represented by R 2 , R 3 and R 4 includes aryl groups having 6 to 15 carbon atoms such as phenyl, naphthyl and anthracenyl; and 7 to 15 carbon atoms such as benzyl and phenylethyl. There may be mentioned 15 aralkyl groups.
Examples of the substituent which the aromatic hydrocarbon group represented by R 2 , R 3 and R 4 may have include the groups described in Group A above.
The aromatic heterocyclic ring represented by R 2 , R 3 and R 4 has 3 carbon atoms such as pyridyl, pyrrolidinyl, quinolyl, thiophene, imidazolyl, oxazolyl, pyrrole, thiazolyl and furanyl. And aromatic heterocyclic groups of -9.
As a substituent which the aromatic heterocyclic ring represented by R < 2 >, R < 3 > and R < 4 > may have, the group as described in the said group A is mentioned.
R6及びR7で表される炭素数1~25のアルキル基としては、R1及びR5で表される炭素数1~25のアルキル基と同じものが挙げられる。
R6及びR7で表される炭素数1~25のアルキル基が有していてもよい置換基としては、上記群Aに記載の基が挙げられる。 Examples of the alkyl group having 1 to 25 carbon atoms represented by R 6 and R 7 include the same ones as the alkyl group having 1 to 25 carbon atoms represented by R 1 and R 5 .
Examples of the substituent which the alkyl group having 1 to 25 carbon atoms represented by R 6 and R 7 may have include the groups described in Group A above.
R6及びR7で表される炭素数1~25のアルキル基が有していてもよい置換基としては、上記群Aに記載の基が挙げられる。 Examples of the alkyl group having 1 to 25 carbon atoms represented by R 6 and R 7 include the same ones as the alkyl group having 1 to 25 carbon atoms represented by R 1 and R 5 .
Examples of the substituent which the alkyl group having 1 to 25 carbon atoms represented by R 6 and R 7 may have include the groups described in Group A above.
R6及びR7で表される電子吸引性基としては、例えば、シアノ基、ニトロ基、ハロゲン原子、ハロゲン原子で置換されたアルキル基、式(I-1)で表される基が挙げられる。
[式中、R11は、水素原子又は炭素数1~25のアルキル基を表し、該アルキル基に含まれるメチレン基の少なくとも1つは酸素原子に置換されていてもよい。
X1は、-CO-、-COO-、-OCO-、-CS-、-CSS-、-COS-、-NR12CO-又はCONR13-を表す。
R12及びR13は、それぞれ独立して、水素原子、炭素数1~6のアルキル基又はフェニル基を表す。] Examples of the electron withdrawing group represented by R 6 and R 7 include a cyano group, a nitro group, a halogen atom, an alkyl group substituted with a halogen atom, and a group represented by formula (I-1) .
[Wherein, R 11 represents a hydrogen atom or an alkyl group having 1 to 25 carbon atoms, and at least one of the methylene groups contained in the alkyl group may be substituted by an oxygen atom.
X 1 is, -CO -, - COO -, - OCO -, - CS -, - CSS -, - COS -, - NR 12 CO- or CONR 13 - represents a.
R 12 and R 13 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group. ]
[式中、R11は、水素原子又は炭素数1~25のアルキル基を表し、該アルキル基に含まれるメチレン基の少なくとも1つは酸素原子に置換されていてもよい。
X1は、-CO-、-COO-、-OCO-、-CS-、-CSS-、-COS-、-NR12CO-又はCONR13-を表す。
R12及びR13は、それぞれ独立して、水素原子、炭素数1~6のアルキル基又はフェニル基を表す。] Examples of the electron withdrawing group represented by R 6 and R 7 include a cyano group, a nitro group, a halogen atom, an alkyl group substituted with a halogen atom, and a group represented by formula (I-1) .
[Wherein, R 11 represents a hydrogen atom or an alkyl group having 1 to 25 carbon atoms, and at least one of the methylene groups contained in the alkyl group may be substituted by an oxygen atom.
X 1 is, -CO -, - COO -, - OCO -, - CS -, - CSS -, - COS -, - NR 12 CO- or CONR 13 - represents a.
R 12 and R 13 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group. ]
ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子が挙げられる。
ハロゲン原子で置換されたアルキル基としては、例えば、トリフルオロメチル基、ペルフルオロエチル基、ペルフルオロプロピル基、ペルフルオロイソプロピル基、ペルフルオロブチル基、ペルフルオロsec-ブチル基、ペルフルオロtert-ブチル基、ペルフルオロペンチル基及びペルフルオロヘキシル基等のパーフルオロアルキル基等が挙げられる。ハロゲン原子で置換されたアルキル基の炭素数としては、通常1~25である。 The halogen atom includes a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
Examples of the alkyl group substituted by a halogen atom include trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluoroisopropyl group, perfluorobutyl group, perfluorosec-butyl group, perfluorotert-butyl group, perfluoropentyl group, and the like Perfluoroalkyl groups, such as perfluorohexyl group, etc. are mentioned. The carbon number of the alkyl group substituted with a halogen atom is usually 1 to 25.
ハロゲン原子で置換されたアルキル基としては、例えば、トリフルオロメチル基、ペルフルオロエチル基、ペルフルオロプロピル基、ペルフルオロイソプロピル基、ペルフルオロブチル基、ペルフルオロsec-ブチル基、ペルフルオロtert-ブチル基、ペルフルオロペンチル基及びペルフルオロヘキシル基等のパーフルオロアルキル基等が挙げられる。ハロゲン原子で置換されたアルキル基の炭素数としては、通常1~25である。 The halogen atom includes a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
Examples of the alkyl group substituted by a halogen atom include trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluoroisopropyl group, perfluorobutyl group, perfluorosec-butyl group, perfluorotert-butyl group, perfluoropentyl group, and the like Perfluoroalkyl groups, such as perfluorohexyl group, etc. are mentioned. The carbon number of the alkyl group substituted with a halogen atom is usually 1 to 25.
R11で表される炭素数1~25のアルキル基としては、R1及びR5で表されるアルキル基と同じものが挙げられる。
R12及びR13で表される炭素数1~6のアルキル基としては、R1Aで表される炭素数1~6で表されるアルキル基と同じものが挙げられる。 Examples of the alkyl group having 1 to 25 carbon atoms represented by R 11 include the same as the alkyl groups represented by R 1 and R 5 .
Examples of theC 1 to C 6 alkyl group represented by R 12 and R 13 include the same as the C 1 to C 6 alkyl group represented by R 1A .
R12及びR13で表される炭素数1~6のアルキル基としては、R1Aで表される炭素数1~6で表されるアルキル基と同じものが挙げられる。 Examples of the alkyl group having 1 to 25 carbon atoms represented by R 11 include the same as the alkyl groups represented by R 1 and R 5 .
Examples of the
R6及びR7は互いに連結して環構造を形成していてもよく、R6及びR7より形成される環構造としては、例えば、メルドラム酸構造、バルビツール酸構造、ジメドン構造等が挙げられる。
R 6 and R 7 may be linked to each other to form a ring structure, and examples of the ring structure formed of R 6 and R 7 include a Meldrum's acid structure, a barbituric acid structure, a dimedone structure, etc. Be
R2及びR3が互いに結合して形成される環構造としては、R2と結合している窒素原子を含む含窒素環構造であって、例えば、4~14員環の含窒素複素環が挙げられる。R2及びR3が互いに連結して形成される環構造は、単環であってもよいし、多環であってもよい。具体的には、ピロリジン環、ピロリン環、イミダゾリジン環、イミダゾリン環、オキサゾリン環、チアゾリン環、ピペリジン環、モルホリン環、ピペラジン環、インドール環、イソインドール環等が挙げられる。
The ring structure formed by bonding R 2 and R 3 to each other is a nitrogen-containing ring structure containing a nitrogen atom bonded to R 2, and is, for example, a 4- to 14-membered nitrogen-containing heterocyclic ring It can be mentioned. The ring structure formed by linking R 2 and R 3 to each other may be monocyclic or polycyclic. Specifically, pyrrolidine ring, pyrroline ring, imidazolidine ring, imidazoline ring, oxazoline ring, thiazoline ring, piperidine ring, morpholine ring, piperazine ring, indole ring, isoindole ring and the like can be mentioned.
R1及びR2が互いに結合して形成される環構造としては、R1及びR2が結合している窒素原子を含む含窒素環構造であって、例えば、4~14員環(好ましくは4~8員環)の含窒素複素環が挙げられる。R1及びR2が互いに連結して形成される環構造は、単環であってもよいし、多環であってもよい。具体的には、R2及びR3が互いに連結して形成される環構造と同じものが挙げられる。
The ring structure formed by bonding R 1 and R 2 to each other is a nitrogen-containing ring structure containing a nitrogen atom to which R 1 and R 2 are bonded, and is, for example, a 4- to 14-membered ring (preferably And 4 to 8 membered rings). The ring structure formed by linking R 1 and R 2 to each other may be monocyclic or polycyclic. Specifically, the same as the ring structure formed by linking R 2 and R 3 to each other can be mentioned.
R2及びR4が互いに結合して形成される環構造としては、4~14員環の含窒素環構造が挙げられ、5員環~9員環の含窒素環構造が好ましい。R2及びR4が互いに結合して形成される環構造は、単環であってもよいし、多環であってもよい。これらの環は置換基を有していてもよく、このような環構造としては、前記R2とR3により形成される環構造として例示したものと同じものが挙げられる。
The ring structure formed by combining R 2 and R 4 with one another includes a 4- to 14-membered nitrogen-containing ring structure, and a 5- to 9-membered nitrogen-containing ring structure is preferable. The ring structure formed by bonding R 2 and R 4 to each other may be monocyclic or polycyclic. These rings may have a substituent, and as such a ring structure, the same one as exemplified as the ring structure formed by R 2 and R 3 may be mentioned.
R3及びR6が互いに連結して形成される環構造としては、R3-C=C-C=C-R6が環の骨格を形成する環構造である。例えば、フェニル基等が挙げられる。
The ring structure formed by linking R 3 and R 6 to each other is a ring structure in which R 3 -C = C-C = C-R 6 forms a ring skeleton. For example, a phenyl group etc. are mentioned.
R2とR3が互いに連結して環構造を形成している式(I)で表される化合物としては式(I-A)で表される化合物が挙げられ、R2及びR4が互いに連結して環構造を形成している式(I)で表される化合物としては、式(I-B)で表される化合物等が挙げられる。
[式(I-A)、式(I-B)中、R1、R3、R4、R5、R6及びR7は、それぞれ上記と同じ意味を表す。
環W1及び環W2は、それぞれ独立して、含窒素環を表す。] Examples of the compound represented by formula (I) in which R 2 and R 3 are linked to each other to form a ring structure include compounds represented by formula (IA), and R 2 and R 4 Examples of the compound represented by the formula (I) which forms a ring structure by linking include a compound represented by the formula (IB) and the like.
[In formula (IA) and formula (IB), R 1 , R 3 , R 4 , R 5 , R 6 and R 7 each represent the same meaning as described above.
Ring W 1 and ring W 2 each independently represent a nitrogen-containing ring. ]
[式(I-A)、式(I-B)中、R1、R3、R4、R5、R6及びR7は、それぞれ上記と同じ意味を表す。
環W1及び環W2は、それぞれ独立して、含窒素環を表す。] Examples of the compound represented by formula (I) in which R 2 and R 3 are linked to each other to form a ring structure include compounds represented by formula (IA), and R 2 and R 4 Examples of the compound represented by the formula (I) which forms a ring structure by linking include a compound represented by the formula (IB) and the like.
[In formula (IA) and formula (IB), R 1 , R 3 , R 4 , R 5 , R 6 and R 7 each represent the same meaning as described above.
Ring W 1 and ring W 2 each independently represent a nitrogen-containing ring. ]
環W1及び環W2は、環の構成単位として窒素原子を含有する含窒素環を表す。環W1及び環W2は、単環であってもよいし、多環であってもよく、窒素以外のヘテロ原子を環の構成単位として含んでいてもよい。環W1及び環W2は、それぞれ独立して、5員環~9員環の環であることが好ましい。
Ring W 1 and ring W 2 represent a nitrogen-containing ring containing a nitrogen atom as a constituent unit of the ring. The ring W 1 and the ring W 2 may be monocyclic or polycyclic, and may contain a heteroatom other than nitrogen as a constituent unit of the ring. The ring W 1 and the ring W 2 are preferably each independently a 5- to 9-membered ring.
式(I-A)で表される化合物は、式(I-A-1)で表される化合物であることが好ましい。
[式(I-A)中、R1、R4、R5、R6及びR7は、それぞれ上記と同じ意味を表す。
A1は、-CH2-、-O-、-S-又は-NR1D-を表す。
R14及びR15は、それぞれ独立して、水素原子又は炭素数1~12のアルキル基を表す。
R1Dは、水素原子又は炭素数1~6のアルキル基を表す。] The compound represented by the formula (IA) is preferably a compound represented by the formula (IA-1).
[In formula (IA), R 1 , R 4 , R 5 , R 6 and R 7 each represent the same meaning as described above.
A 1 represents -CH 2- , -O-, -S- or -NR 1D- .
Each of R 14 and R 15 independently represents a hydrogen atom or an alkyl group having 1 to 12 carbon atoms.
R 1D represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. ]
[式(I-A)中、R1、R4、R5、R6及びR7は、それぞれ上記と同じ意味を表す。
A1は、-CH2-、-O-、-S-又は-NR1D-を表す。
R14及びR15は、それぞれ独立して、水素原子又は炭素数1~12のアルキル基を表す。
R1Dは、水素原子又は炭素数1~6のアルキル基を表す。] The compound represented by the formula (IA) is preferably a compound represented by the formula (IA-1).
[In formula (IA), R 1 , R 4 , R 5 , R 6 and R 7 each represent the same meaning as described above.
A 1 represents -CH 2- , -O-, -S- or -NR 1D- .
Each of R 14 and R 15 independently represents a hydrogen atom or an alkyl group having 1 to 12 carbon atoms.
R 1D represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. ]
式(I-B)で表される化合物は、式(I-B-1)で表される化合物及び式(I-B-2)で表される化合物であることが好ましい。
[式(I-B-1)中、R1、R6及びR7は、それぞれ上記と同じ意味を表す。
R16は、それぞれ独立して、水素原子又は炭素数1~12のアルキル基、アリール基を表す。] The compound represented by the formula (IB) is preferably a compound represented by the formula (IB-1) and a compound represented by the formula (IB-2).
[In the formula (I-B-1), R 1 , R 6 and R 7 each represent the same meaning as described above.
Each R 16 independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group. ]
[式(I-B-1)中、R1、R6及びR7は、それぞれ上記と同じ意味を表す。
R16は、それぞれ独立して、水素原子又は炭素数1~12のアルキル基、アリール基を表す。] The compound represented by the formula (IB) is preferably a compound represented by the formula (IB-1) and a compound represented by the formula (IB-2).
[In the formula (I-B-1), R 1 , R 6 and R 7 each represent the same meaning as described above.
Each R 16 independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group. ]
[式(I-B-2)中、R3、R5、R6及びR7は、それぞれ上記と同じ意味を表す。
R30は、水素原子、シアノ基、ニトロ基、ハロゲン原子、メルカプト基、アミノ基、炭素数1~12のアルキル基、炭素数1~12のアルコキシ基、炭素数6~18の芳香族炭化水素基、炭素数2~13のアシル基、炭素数2~13のアシルオキシ基又は炭素数2~13のアルコキシカルボニル基を表す。
R31は、炭素数1~12のアルキル基、炭素数1~12のアルコキシ基、メルカプト基、炭素数1~12のアルキルチオ基、置換基を有していてもよいアミノ基又は複素環基を表す。] [In the formula (I-B-2), R 3 , R 5 , R 6 and R 7 each represent the same meaning as described above.
R 30 represents a hydrogen atom, a cyano group, a nitro group, a halogen atom, a mercapto group, an amino group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aromatic hydrocarbon having 6 to 18 carbon atoms And an acyl group having 2 to 13 carbon atoms, an acyloxy group having 2 to 13 carbon atoms, or an alkoxycarbonyl group having 2 to 13 carbon atoms.
R 31 represents an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a mercapto group, an alkylthio group having 1 to 12 carbon atoms, an amino group or heterocyclic group which may have a substituent, Represent. ]
R30は、水素原子、シアノ基、ニトロ基、ハロゲン原子、メルカプト基、アミノ基、炭素数1~12のアルキル基、炭素数1~12のアルコキシ基、炭素数6~18の芳香族炭化水素基、炭素数2~13のアシル基、炭素数2~13のアシルオキシ基又は炭素数2~13のアルコキシカルボニル基を表す。
R31は、炭素数1~12のアルキル基、炭素数1~12のアルコキシ基、メルカプト基、炭素数1~12のアルキルチオ基、置換基を有していてもよいアミノ基又は複素環基を表す。] [In the formula (I-B-2), R 3 , R 5 , R 6 and R 7 each represent the same meaning as described above.
R 30 represents a hydrogen atom, a cyano group, a nitro group, a halogen atom, a mercapto group, an amino group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aromatic hydrocarbon having 6 to 18 carbon atoms And an acyl group having 2 to 13 carbon atoms, an acyloxy group having 2 to 13 carbon atoms, or an alkoxycarbonyl group having 2 to 13 carbon atoms.
R 31 represents an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a mercapto group, an alkylthio group having 1 to 12 carbon atoms, an amino group or heterocyclic group which may have a substituent, Represent. ]
R30で表されるハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子が挙げられる。
R30で表されるR30で表される炭素数2~13のアシル基としては、アセチル基、プロピオニル基及びブチリル基等が挙げられる。
R30で表される炭素数2~13のアシルオキシ基としては、メチルカルボニルオキシ基、エチルカルボニルオキシ基、プロピルカルボニルオキシ基、ブチルカルボニルオキシ基等が挙げられる。
R30で表される炭素数2~13のアルコキシカルボニル基としては、メトキシカルボニル基、エトキシカルボニル基、プロポキシカルボニル基、ブトキシカルボニル基等が挙げられる。
R30で表される炭素数6~18の芳香族炭化水素基としては、フェニル基、ナフチル基、ビフェニル基等の炭素数6~18のアリール基;ベンジル基、フェニルエチル基等の炭素数7~18のアラルキル基が挙げられる。
R30で表される炭素数1~12のアルキル基としては、R14で表される炭素数1~12のアルキル基と同じものが挙げられる。
R30で表される炭素数1~12のアルキル基としては、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基、ペントキシ基等が挙げられる。
R30は、炭素数1~12のアルキル基、炭素数1~12のアルコキシ基、アミノ基又はメルカプト基であることが好ましい。 The halogen atom represented by R 30, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom.
The acyl group of 2 to 13 carbon atoms represented by R 30 represented by R 30, an acetyl group, and the like propionyl group and butyryl group.
Examples of the acyloxy group having 2 to 13 carbon atoms represented by R 30 include a methyl carbonyloxy group, an ethyl carbonyloxy group, a propyl carbonyloxy group, and a butyl carbonyloxy group.
Examples of the alkoxycarbonyl group having 2 to 13 carbon atoms represented by R 30 include a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group and the like.
Examples of the aromatic hydrocarbon group having 6 to 18 carbon atoms represented by R 30 include aryl groups having 6 to 18 carbon atoms such as phenyl group, naphthyl group and biphenyl group; 7 carbon atoms such as benzyl group and phenylethyl group There may be mentioned an aralkyl group of -18.
Examples of the alkyl group having 1 to 12 carbon atoms represented by R 30 include the same ones as the alkyl group having 1 to 12 carbon atoms represented by R 14 .
Examples of the alkyl group having 1 to 12 carbon atoms represented by R 30 include a methoxy group, an ethoxy group, a propoxy group, a butoxy group and a pentoxy group.
R 30 is preferably an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an amino group or a mercapto group.
R30で表されるR30で表される炭素数2~13のアシル基としては、アセチル基、プロピオニル基及びブチリル基等が挙げられる。
R30で表される炭素数2~13のアシルオキシ基としては、メチルカルボニルオキシ基、エチルカルボニルオキシ基、プロピルカルボニルオキシ基、ブチルカルボニルオキシ基等が挙げられる。
R30で表される炭素数2~13のアルコキシカルボニル基としては、メトキシカルボニル基、エトキシカルボニル基、プロポキシカルボニル基、ブトキシカルボニル基等が挙げられる。
R30で表される炭素数6~18の芳香族炭化水素基としては、フェニル基、ナフチル基、ビフェニル基等の炭素数6~18のアリール基;ベンジル基、フェニルエチル基等の炭素数7~18のアラルキル基が挙げられる。
R30で表される炭素数1~12のアルキル基としては、R14で表される炭素数1~12のアルキル基と同じものが挙げられる。
R30で表される炭素数1~12のアルキル基としては、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基、ペントキシ基等が挙げられる。
R30は、炭素数1~12のアルキル基、炭素数1~12のアルコキシ基、アミノ基又はメルカプト基であることが好ましい。 The halogen atom represented by R 30, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom.
The acyl group of 2 to 13 carbon atoms represented by R 30 represented by R 30, an acetyl group, and the like propionyl group and butyryl group.
Examples of the acyloxy group having 2 to 13 carbon atoms represented by R 30 include a methyl carbonyloxy group, an ethyl carbonyloxy group, a propyl carbonyloxy group, and a butyl carbonyloxy group.
Examples of the alkoxycarbonyl group having 2 to 13 carbon atoms represented by R 30 include a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group and the like.
Examples of the aromatic hydrocarbon group having 6 to 18 carbon atoms represented by R 30 include aryl groups having 6 to 18 carbon atoms such as phenyl group, naphthyl group and biphenyl group; 7 carbon atoms such as benzyl group and phenylethyl group There may be mentioned an aralkyl group of -18.
Examples of the alkyl group having 1 to 12 carbon atoms represented by R 30 include the same ones as the alkyl group having 1 to 12 carbon atoms represented by R 14 .
Examples of the alkyl group having 1 to 12 carbon atoms represented by R 30 include a methoxy group, an ethoxy group, a propoxy group, a butoxy group and a pentoxy group.
R 30 is preferably an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an amino group or a mercapto group.
R31で表される炭素数1~12のアルキル基としては、R14で表される炭素数1~12のアルキル基と同じものが挙げられる。
R31で表される炭素数1~12のアルコキシ基としては、R30で表される炭素数1~12のアルコキシ基と同じものが挙げられる。
R31で表される炭素数1~12のアルキルチオ基としては、メチルチオ基、エチルチオ基、プロピルチオ基、ブチルチオ基、ペンチルチオ基、ヘキシルチオ基等が挙げられる。
R31で表される置換基を有していてもよいアミノ基としては、アミノ基;N-メチルアミノ基、N-エチルアミノ基等の1つの炭素数1~8のアルキル基で置換されたアミノ基;N,N-ジメチルアミノ基、N,N-ジエチルアミノ基、N,N-メチルエチルアミノ基等の2つの炭素数1~8のアルキル基で置換されたアミノ基;等が挙げられる。
R31で表される複素環としては、ピロリジニル基、ピペリジニル基、モルホリニル基等の炭素数4~9の含窒素複素環基等が挙げられる。 Examples of the alkyl group having 1 to 12 carbon atoms represented by R 31 include the same ones as the alkyl group having 1 to 12 carbon atoms represented by R 14 .
Examples of the C 1-12 alkoxy group represented by R 31 include the same as the C 1-12 alkoxy group represented by R 30 .
Examples of the alkylthio group having 1 to 12 carbon atoms represented by R 31 include a methylthio group, an ethylthio group, a propylthio group, a butylthio group, a pentylthio group and a hexylthio group.
The amino group which may have a substituent represented by R 31 is, for example, an amino group; one alkyl group having 1 to 8 carbon atoms such as N-methylamino group or N-ethylamino group Amino groups; amino groups substituted with two alkyl groups having 1 to 8 carbon atoms such as N, N-dimethylamino, N, N-diethylamino, N, N-methylethylamino and the like; and the like.
Examples of the heterocyclic ring represented by R 31 include nitrogen-containing heterocyclic groups having 4 to 9 carbon atoms such as pyrrolidinyl group, piperidinyl group and morpholinyl group.
R31で表される炭素数1~12のアルコキシ基としては、R30で表される炭素数1~12のアルコキシ基と同じものが挙げられる。
R31で表される炭素数1~12のアルキルチオ基としては、メチルチオ基、エチルチオ基、プロピルチオ基、ブチルチオ基、ペンチルチオ基、ヘキシルチオ基等が挙げられる。
R31で表される置換基を有していてもよいアミノ基としては、アミノ基;N-メチルアミノ基、N-エチルアミノ基等の1つの炭素数1~8のアルキル基で置換されたアミノ基;N,N-ジメチルアミノ基、N,N-ジエチルアミノ基、N,N-メチルエチルアミノ基等の2つの炭素数1~8のアルキル基で置換されたアミノ基;等が挙げられる。
R31で表される複素環としては、ピロリジニル基、ピペリジニル基、モルホリニル基等の炭素数4~9の含窒素複素環基等が挙げられる。 Examples of the alkyl group having 1 to 12 carbon atoms represented by R 31 include the same ones as the alkyl group having 1 to 12 carbon atoms represented by R 14 .
Examples of the C 1-12 alkoxy group represented by R 31 include the same as the C 1-12 alkoxy group represented by R 30 .
Examples of the alkylthio group having 1 to 12 carbon atoms represented by R 31 include a methylthio group, an ethylthio group, a propylthio group, a butylthio group, a pentylthio group and a hexylthio group.
The amino group which may have a substituent represented by R 31 is, for example, an amino group; one alkyl group having 1 to 8 carbon atoms such as N-methylamino group or N-ethylamino group Amino groups; amino groups substituted with two alkyl groups having 1 to 8 carbon atoms such as N, N-dimethylamino, N, N-diethylamino, N, N-methylethylamino and the like; and the like.
Examples of the heterocyclic ring represented by R 31 include nitrogen-containing heterocyclic groups having 4 to 9 carbon atoms such as pyrrolidinyl group, piperidinyl group and morpholinyl group.
R3及びR6が互いに連結して環構造を形成し、かつR2及びR4が互いに結合して環構造を形成する式(I)で表される化合物としては、式(I-C)で表される化合物等が挙げられる。
[式(I-C)中、R1、R6及びR7は上記と同じ意味を表す。
R21、R22は、それぞれ独立して、水素原子、炭素数1~12のアルキル基又はヒドロキシ基を表す。
X2及びX3は、それぞれ独立して、-CH2-又は-N(R25)=を表す。
R25は、水素原子、炭素数1~25のアルキル基、置換基を有していてもよい芳香族炭化水素基を表す。] As a compound represented by the formula (I) in which R 3 and R 6 are linked to each other to form a ring structure, and R 2 and R 4 are linked to each other to form a ring structure, a compound represented by formula (IC) And the like.
[In formula (I-C), R 1, R 6 and R 7 represent the same meaning as described above.
Each of R 21 and R 22 independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or a hydroxy group.
Each of X 2 and X 3 independently represents —CH 2 — or —N (R 25 ) =.
R 25 represents a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, or an aromatic hydrocarbon group which may have a substituent. ]
[式(I-C)中、R1、R6及びR7は上記と同じ意味を表す。
R21、R22は、それぞれ独立して、水素原子、炭素数1~12のアルキル基又はヒドロキシ基を表す。
X2及びX3は、それぞれ独立して、-CH2-又は-N(R25)=を表す。
R25は、水素原子、炭素数1~25のアルキル基、置換基を有していてもよい芳香族炭化水素基を表す。] As a compound represented by the formula (I) in which R 3 and R 6 are linked to each other to form a ring structure, and R 2 and R 4 are linked to each other to form a ring structure, a compound represented by formula (IC) And the like.
[In formula (I-C), R 1, R 6 and R 7 represent the same meaning as described above.
Each of R 21 and R 22 independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or a hydroxy group.
Each of X 2 and X 3 independently represents —CH 2 — or —N (R 25 ) =.
R 25 represents a hydrogen atom, an alkyl group having 1 to 25 carbon atoms, or an aromatic hydrocarbon group which may have a substituent. ]
R25で表される炭素数1~25のアルキル基としては、R1で表される炭素数1~25のアルキル基と同じものが挙げられる。
R25で表される芳香族炭化水素基としては、フェニル基、ナフチル基等のアリール基:ベンジル基、フェニルエチル基等のアラルキル基:ビフェニル基等が挙げられ、炭素数6~20の芳香族炭化水素基であることが好ましい。R25で表される芳香族炭化水素基が有していてもよい置換基としては、ヒドロキシ基等が挙げられる。 Examples of the alkyl group having 1 to 25 carbon atoms represented by R 25 include the same ones as the alkyl group having 1 to 25 carbon atoms represented by R 1 .
Examples of the aromatic hydrocarbon group represented by R 25 include aryl groups such as phenyl group and naphthyl group: aralkyl groups such as benzyl group and phenylethyl group: biphenyl group and the like, and aromatics having 6 to 20 carbon atoms It is preferably a hydrocarbon group. Examples of the substituent which the aromatic hydrocarbon group represented by R 25 may have include a hydroxy group and the like.
R25で表される芳香族炭化水素基としては、フェニル基、ナフチル基等のアリール基:ベンジル基、フェニルエチル基等のアラルキル基:ビフェニル基等が挙げられ、炭素数6~20の芳香族炭化水素基であることが好ましい。R25で表される芳香族炭化水素基が有していてもよい置換基としては、ヒドロキシ基等が挙げられる。 Examples of the alkyl group having 1 to 25 carbon atoms represented by R 25 include the same ones as the alkyl group having 1 to 25 carbon atoms represented by R 1 .
Examples of the aromatic hydrocarbon group represented by R 25 include aryl groups such as phenyl group and naphthyl group: aralkyl groups such as benzyl group and phenylethyl group: biphenyl group and the like, and aromatics having 6 to 20 carbon atoms It is preferably a hydrocarbon group. Examples of the substituent which the aromatic hydrocarbon group represented by R 25 may have include a hydroxy group and the like.
R3及びR6は、それぞれ独立して、電子吸引性基であることが好ましい。
Preferably, R 3 and R 6 are each independently an electron withdrawing group.
R1及びR2が互いに連結して環構造を形成し、かつR3及びR6が互いに結合して環構造を形成する式(I)で表される化合物としては、式(I-D)で表される化合物等が挙げられる。
[式(I-D)中、R4、R5、R7は上記と同じ意味を表す。
R25、R26、R27及びR28は、それぞれ独立して、水素原子、置換基を有してもよい炭素数1~12のアルキル基、ヒドロキシ基、アラルキル基を表す。] Examples of the compound represented by the formula (I) in which R 1 and R 2 are linked to each other to form a ring structure and R 3 and R 6 are linked to each other to form a ring structure include a compound represented by formula (ID) And the like.
[In the formula (I-D), R 4 , R 5 and R 7 represent the same meaning as described above.
R 25 , R 26 , R 27 and R 28 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms which may have a substituent, a hydroxy group or an aralkyl group. ]
[式(I-D)中、R4、R5、R7は上記と同じ意味を表す。
R25、R26、R27及びR28は、それぞれ独立して、水素原子、置換基を有してもよい炭素数1~12のアルキル基、ヒドロキシ基、アラルキル基を表す。] Examples of the compound represented by the formula (I) in which R 1 and R 2 are linked to each other to form a ring structure and R 3 and R 6 are linked to each other to form a ring structure include a compound represented by formula (ID) And the like.
[In the formula (I-D), R 4 , R 5 and R 7 represent the same meaning as described above.
R 25 , R 26 , R 27 and R 28 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms which may have a substituent, a hydroxy group or an aralkyl group. ]
R25、R26、R27及びR28で表される炭素数1~12のアルキル基としては、R1A及びR1Bで表される炭素数1~12のアルキル基と同じものが挙げられる。R25、R26、R27及びR28で表される炭素数1~12のアルキル基が有していてもよい置換基としてはヒドロキシ基が挙げられる。
R25、R26、R27及びR28で表されるアラルキル基としては、ベンジル基、フェニルエチル基等の炭素数7~15のアラルキル基が挙げられる。 Examples of the alkyl group having 1 to 12 carbon atoms represented by R 25 , R 26 , R 27 and R 28 include the same ones as the alkyl group having 1 to 12 carbon atoms represented by R 1A and R 1B . Examples of the substituent which the alkyl group having 1 to 12 carbon atoms represented by R 25 , R 26 , R 27 and R 28 may have include a hydroxy group.
Examples of the aralkyl group represented by R 25 , R 26 , R 27 and R 28 include aralkyl groups having 7 to 15 carbon atoms such as benzyl group and phenylethyl group.
R25、R26、R27及びR28で表されるアラルキル基としては、ベンジル基、フェニルエチル基等の炭素数7~15のアラルキル基が挙げられる。 Examples of the alkyl group having 1 to 12 carbon atoms represented by R 25 , R 26 , R 27 and R 28 include the same ones as the alkyl group having 1 to 12 carbon atoms represented by R 1A and R 1B . Examples of the substituent which the alkyl group having 1 to 12 carbon atoms represented by R 25 , R 26 , R 27 and R 28 may have include a hydroxy group.
Examples of the aralkyl group represented by R 25 , R 26 , R 27 and R 28 include aralkyl groups having 7 to 15 carbon atoms such as benzyl group and phenylethyl group.
R6及びR7が互いに連結して環構造を形成している化合物(I)としては、式(I-E)で表される化合物等が挙げられる。
[式(I-E)中、R1、R3、R4、R5は、それぞれ上記と同じ意味を表す。
環W3は、環状化合物を表す
環W3は、5員環~9員環の環であり、窒素原子、酸素原子、硫黄原子等のヘテロ原子を環の構成単位として含んでいてもよい。 Examples of the compound (I) in which R 6 and R 7 are linked to each other to form a ring structure include compounds represented by the formula (IE) and the like.
[In formula (IE), R 1 , R 3 , R 4 and R 5 each represent the same meaning as described above.
Ring W 3 represents a cyclic compound. Ring W 3 is a 5- to 9-membered ring, and may contain a heteroatom such as a nitrogen atom, an oxygen atom or a sulfur atom as a constituent unit of the ring.
[式(I-E)中、R1、R3、R4、R5は、それぞれ上記と同じ意味を表す。
環W3は、環状化合物を表す
環W3は、5員環~9員環の環であり、窒素原子、酸素原子、硫黄原子等のヘテロ原子を環の構成単位として含んでいてもよい。 Examples of the compound (I) in which R 6 and R 7 are linked to each other to form a ring structure include compounds represented by the formula (IE) and the like.
[In formula (IE), R 1 , R 3 , R 4 and R 5 each represent the same meaning as described above.
Ring W 3 represents a cyclic compound. Ring W 3 is a 5- to 9-membered ring, and may contain a heteroatom such as a nitrogen atom, an oxygen atom or a sulfur atom as a constituent unit of the ring.
式(I-E)で表される化合物は、式(IE-1)で表される化合物であることが好ましい。
[式(I-C-1)中、R1、R2、R3及びR5は、それぞれ上記と同じ意味を表す。
R17、R18、R19、Rqは、それぞれ独立して、水素原子又は置換基を有してもよい炭素数1~12のアルキル基、アラルキル基、アリール基を表し、該アルキル基又はアラルキル基に含まれる-CH2-基は-NR1D-、-C(=O)-、-C(=S)-、-O-、-S-に置換されていてもよく、R17及びR18は互いに連結して環構造を形成してもよく、R18及びR19は互いに連結して環構造を形成してもよく、R19及びRqは、互いに連結して環構造を形成してもよい。m、p、qはそれぞれ独立して0~3の整数を表す。] The compound represented by the formula (IE) is preferably a compound represented by the formula (IE-1).
[In formula (I-C-1), R 1 , R 2 , R 3 and R 5 each represent the same meaning as described above.
R 17 , R 18 , R 19 and R q each independently represent a hydrogen atom or an alkyl, aralkyl or aryl group having 1 to 12 carbon atoms which may have a substituent, and the alkyl or The —CH 2 — group contained in the aralkyl group may be substituted by —NR 1 D—, —C (= O) —, —C (= S) —, —O— or —S—, R 17 and R 18 may be linked to each other to form a ring structure, R 18 and R 19 may be linked to each other to form a ring structure, and R 19 and R q are linked to each other to form a ring structure May be m, p and q each independently represent an integer of 0 to 3. ]
[式(I-C-1)中、R1、R2、R3及びR5は、それぞれ上記と同じ意味を表す。
R17、R18、R19、Rqは、それぞれ独立して、水素原子又は置換基を有してもよい炭素数1~12のアルキル基、アラルキル基、アリール基を表し、該アルキル基又はアラルキル基に含まれる-CH2-基は-NR1D-、-C(=O)-、-C(=S)-、-O-、-S-に置換されていてもよく、R17及びR18は互いに連結して環構造を形成してもよく、R18及びR19は互いに連結して環構造を形成してもよく、R19及びRqは、互いに連結して環構造を形成してもよい。m、p、qはそれぞれ独立して0~3の整数を表す。] The compound represented by the formula (IE) is preferably a compound represented by the formula (IE-1).
[In formula (I-C-1), R 1 , R 2 , R 3 and R 5 each represent the same meaning as described above.
R 17 , R 18 , R 19 and R q each independently represent a hydrogen atom or an alkyl, aralkyl or aryl group having 1 to 12 carbon atoms which may have a substituent, and the alkyl or The —CH 2 — group contained in the aralkyl group may be substituted by —NR 1 D—, —C (= O) —, —C (= S) —, —O— or —S—, R 17 and R 18 may be linked to each other to form a ring structure, R 18 and R 19 may be linked to each other to form a ring structure, and R 19 and R q are linked to each other to form a ring structure May be m, p and q each independently represent an integer of 0 to 3. ]
式(I)で表される化合物としては、以下の化合物が挙げられる。
Examples of the compound represented by the formula (I) include the following compounds.
Examples of the compound represented by the formula (I) include the following compounds.
光選択吸収化合物(C)の含有量は、後述する樹脂(A)(好ましくは(メタ)アクリル系樹脂(A))100質量部に対して、通常0.01~20質量部であり、好ましくは0.05~10質量部であり、より好ましくは0.1~5質量部であり、さらに好ましくは0.1~5質量部である。
The content of the light selective absorption compound (C) is usually 0.01 to 20 parts by mass with respect to 100 parts by mass of the resin (A) (preferably (meth) acrylic resin (A)) described later, and is preferably Is 0.05 to 10 parts by mass, more preferably 0.1 to 5 parts by mass, and still more preferably 0.1 to 5 parts by mass.
樹脂(A)は、(メタ)アクリル酸樹脂(A)であることが好ましい。
(メタ)アクリル系樹脂(A)は、(メタ)アクリル酸エステル由来の構成単位を主成分(好ましくは50質量%以上含む)重合体であることが好ましい。(メタ)アクリル酸エステルに由来する構造単位は、一種以上の(メタ)アクリル酸エステル以外の単量体に由来する構造単位(例えば、極性官能基を有する単量体に由来する構造単位)を含んでもよい。なお本明細書において、(メタ)アクリル酸とは、アクリル酸又はメタクリル酸のいずれでもよいことを意味し、他に、(メタ)アクリレートなどというときの「(メタ)」も同様の趣旨である。 The resin (A) is preferably a (meth) acrylic resin (A).
The (meth) acrylic resin (A) is preferably a polymer as a main component (preferably containing 50% by mass or more) of a structural unit derived from a (meth) acrylic acid ester. The structural unit derived from (meth) acrylic acid ester is a structural unit derived from a monomer other than one or more (meth) acrylic acid esters (for example, a structural unit derived from a monomer having a polar functional group) May be included. In the present specification, (meth) acrylic acid means that either acrylic acid or methacrylic acid may be used, and in the case of (meth) acrylate etc., “(meth)” also has the same meaning. .
(メタ)アクリル系樹脂(A)は、(メタ)アクリル酸エステル由来の構成単位を主成分(好ましくは50質量%以上含む)重合体であることが好ましい。(メタ)アクリル酸エステルに由来する構造単位は、一種以上の(メタ)アクリル酸エステル以外の単量体に由来する構造単位(例えば、極性官能基を有する単量体に由来する構造単位)を含んでもよい。なお本明細書において、(メタ)アクリル酸とは、アクリル酸又はメタクリル酸のいずれでもよいことを意味し、他に、(メタ)アクリレートなどというときの「(メタ)」も同様の趣旨である。 The resin (A) is preferably a (meth) acrylic resin (A).
The (meth) acrylic resin (A) is preferably a polymer as a main component (preferably containing 50% by mass or more) of a structural unit derived from a (meth) acrylic acid ester. The structural unit derived from (meth) acrylic acid ester is a structural unit derived from a monomer other than one or more (meth) acrylic acid esters (for example, a structural unit derived from a monomer having a polar functional group) May be included. In the present specification, (meth) acrylic acid means that either acrylic acid or methacrylic acid may be used, and in the case of (meth) acrylate etc., “(meth)” also has the same meaning. .
(メタ)アクリル酸エステルとしては、下記式(I)で示される(メタ)アクリル酸エステルが挙げられる
[式(I)中、R1 は水素原子又はメチル基で表し、R2 は炭素数1~14のアルキル基または炭素数7~20のアラルキル基を表し、該アルキル基または該アラルキル基の水素原子は、炭素数1~10のアルコキシ基で置き換わっていてもよい。] Examples of the (meth) acrylic acid ester include (meth) acrylic acid esters represented by the following formula (I)
[In formula (I), R 1 represents a hydrogen atom or a methyl group, R 2 represents an alkyl group having 1 to 14 carbon atoms or an aralkyl group having 7 to 20 carbon atoms, and hydrogen of the alkyl group or the aralkyl group The atom may be replaced by an alkoxy group having 1 to 10 carbon atoms. ]
[式(I)中、R1 は水素原子又はメチル基で表し、R2 は炭素数1~14のアルキル基または炭素数7~20のアラルキル基を表し、該アルキル基または該アラルキル基の水素原子は、炭素数1~10のアルコキシ基で置き換わっていてもよい。] Examples of the (meth) acrylic acid ester include (meth) acrylic acid esters represented by the following formula (I)
[In formula (I), R 1 represents a hydrogen atom or a methyl group, R 2 represents an alkyl group having 1 to 14 carbon atoms or an aralkyl group having 7 to 20 carbon atoms, and hydrogen of the alkyl group or the aralkyl group The atom may be replaced by an alkoxy group having 1 to 10 carbon atoms. ]
式(I)において、R2は、好ましくは、炭素数1~14のアルキル基であり、より好ましくは、炭素数1~8のアルキル基である。
In formula (I), R 2 is preferably an alkyl group having 1 to 14 carbon atoms, more preferably an alkyl group having 1 to 8 carbon atoms.
式(I)で示される(メタ)アクリル酸エステルとしては、
(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸n-プロピル、(メタ)アクリル酸n-ブチル、(メタ)アクリル酸n-ペンチル、(メタ)アクリル酸n-ヘキシル、(メタ)アクリル酸n-ヘプチル、(メタ)アクリル酸n-オクチル、(メタ)アクリル酸n-ノニル、(メタ)アクリル酸n-デシル、(メタ)アクリル酸n-ドデシル、(メタ)アクリル酸ラウリル、(メタ)アクリル酸ステアリル、等の(メタ)アクリル酸の直鎖状アルキルエステル;
(メタ)アクリル酸i-プロピル、(メタ)アクリル酸i-ブチル、(メタ)アクリル酸t-ブチル、(メタ)アクリル酸i-ペンチル、(メタ)アクリル酸i-ヘキシル、(メタ)アクリル酸2-エチルヘキシル、(メタ)アクリル酸i-オクチル、(メタ)アクリル酸i-ノニル、(メタ)アクリル酸i-ステアリル、(メタ)アクリル酸i-アミル、等の(メタ)アクリル酸の分枝状アルキルエステル;
(メタ)アクリル酸シクロへキシル、(メタ)アクリル酸イソボロニル、(メタ)アクリル酸アダマンチル、(メタ)アクリル酸ジシクロペンタニル、(メタ)アクリル酸シクロドデシル、(メタ)アクリル酸メチルシクロヘキシル、(メタ)アクリル酸トリメチルシクロヘキシル、(メタ)アクリル酸tert-ブチルシクロヘキシル、α-エトキシアクリル酸シクロヘキシル、等の(メタ)アクリル酸の脂環骨格含有アルキルエステル;
(メタ)アクリル酸フェニル等の(メタ)アクリル酸の芳香環骨格含有エステル;
等が挙げられる。
また、(メタ)アクリル酸アルキルエステルにおけるアルキル基に置換基が導入された置換基含有(メタ)アクリル酸アルキルエステルを挙げることもできる。置換基含有(メタ)アクリル酸アルキルエステルの置換基は、アルキル基の水素原子を置換する基であり、その具体例はフェニル基、アルコキシ基、フェノキシ基を含む。置換基含有(メタ)アクリル酸アルキルエステルとして、具体的には、(メタ)アクリル酸2-メトキシエチル、(メタ)アクリル酸エトキシメチル、(メタ)アクリル酸フェノキシエチル、(メタ)アクリル酸2-(2-フェノキシエトキシ)エチル、(メタ)アクリル酸フェノキシジエチレングリコール、(メタ)アクリル酸フェノキシポリ(エチレングリコール)等が挙げられる。 As the (meth) acrylic acid ester represented by the formula (I),
Methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, n-pentyl (meth) acrylate, n-hexyl (meth) acrylate, (Meth) acrylic acid n-heptyl, (meth) acrylic acid n-octyl, (meth) acrylic acid n-nonyl, (meth) acrylic acid n-decyl, (meth) acrylic acid n-dodecyl, (meth) acrylic acid Linear alkyl esters of (meth) acrylic acid such as lauryl, stearyl (meth) acrylate, etc .;
(Meth) acrylic acid i-propyl, (meth) acrylic acid i-butyl, (meth) acrylic acid t-butyl, (meth) acrylic acid i-pentyl, (meth) acrylic acid i-hexyl, (meth) acrylic acid Branching of (meth) acrylic acid such as 2-ethylhexyl, i-octyl (meth) acrylate, i-nonyl (meth) acrylate, i-stearyl (meth) acrylate, i-amyl (meth) acrylate, etc. Alkyl esters;
(Meth) acrylic acid cyclohexyl, isoboronyl (meth) acrylic acid, adamantyl (meth) acrylic acid, dicyclopentanyl (meth) acrylic acid, cyclododecyl (meth) acrylic acid, methyl cyclohexyl (meth) acrylic acid, ( Alicyclic skeleton-containing alkyl ester of (meth) acrylic acid such as trimethylcyclohexyl (meth) acrylate, tert-butylcyclohexyl (meth) acrylate, cyclohexyl α-ethoxyacrylate, etc .;
Aromatic ring skeleton-containing ester of (meth) acrylic acid such as phenyl (meth) acrylate;
Etc.
Moreover, the substituent-containing (meth) acrylic acid alkyl ester in which the substituent was introduce | transduced into the alkyl group in (meth) acrylic acid alkyl ester can also be mentioned. The substituent of the substituent-containing (meth) acrylic acid alkyl ester is a group that substitutes the hydrogen atom of the alkyl group, and specific examples thereof include a phenyl group, an alkoxy group, and a phenoxy group. Specific examples of the substituent-containing (meth) acrylic acid alkyl ester include 2-methoxyethyl (meth) acrylate, ethoxymethyl (meth) acrylate, phenoxyethyl (meth) acrylate, 2- (meth) acrylate Examples thereof include (2-phenoxyethoxy) ethyl, phenoxydiethylene glycol (meth) acrylate, and phenoxypoly (ethylene glycol) (meth) acrylate.
(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸n-プロピル、(メタ)アクリル酸n-ブチル、(メタ)アクリル酸n-ペンチル、(メタ)アクリル酸n-ヘキシル、(メタ)アクリル酸n-ヘプチル、(メタ)アクリル酸n-オクチル、(メタ)アクリル酸n-ノニル、(メタ)アクリル酸n-デシル、(メタ)アクリル酸n-ドデシル、(メタ)アクリル酸ラウリル、(メタ)アクリル酸ステアリル、等の(メタ)アクリル酸の直鎖状アルキルエステル;
(メタ)アクリル酸i-プロピル、(メタ)アクリル酸i-ブチル、(メタ)アクリル酸t-ブチル、(メタ)アクリル酸i-ペンチル、(メタ)アクリル酸i-ヘキシル、(メタ)アクリル酸2-エチルヘキシル、(メタ)アクリル酸i-オクチル、(メタ)アクリル酸i-ノニル、(メタ)アクリル酸i-ステアリル、(メタ)アクリル酸i-アミル、等の(メタ)アクリル酸の分枝状アルキルエステル;
(メタ)アクリル酸シクロへキシル、(メタ)アクリル酸イソボロニル、(メタ)アクリル酸アダマンチル、(メタ)アクリル酸ジシクロペンタニル、(メタ)アクリル酸シクロドデシル、(メタ)アクリル酸メチルシクロヘキシル、(メタ)アクリル酸トリメチルシクロヘキシル、(メタ)アクリル酸tert-ブチルシクロヘキシル、α-エトキシアクリル酸シクロヘキシル、等の(メタ)アクリル酸の脂環骨格含有アルキルエステル;
(メタ)アクリル酸フェニル等の(メタ)アクリル酸の芳香環骨格含有エステル;
等が挙げられる。
また、(メタ)アクリル酸アルキルエステルにおけるアルキル基に置換基が導入された置換基含有(メタ)アクリル酸アルキルエステルを挙げることもできる。置換基含有(メタ)アクリル酸アルキルエステルの置換基は、アルキル基の水素原子を置換する基であり、その具体例はフェニル基、アルコキシ基、フェノキシ基を含む。置換基含有(メタ)アクリル酸アルキルエステルとして、具体的には、(メタ)アクリル酸2-メトキシエチル、(メタ)アクリル酸エトキシメチル、(メタ)アクリル酸フェノキシエチル、(メタ)アクリル酸2-(2-フェノキシエトキシ)エチル、(メタ)アクリル酸フェノキシジエチレングリコール、(メタ)アクリル酸フェノキシポリ(エチレングリコール)等が挙げられる。 As the (meth) acrylic acid ester represented by the formula (I),
Methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, n-pentyl (meth) acrylate, n-hexyl (meth) acrylate, (Meth) acrylic acid n-heptyl, (meth) acrylic acid n-octyl, (meth) acrylic acid n-nonyl, (meth) acrylic acid n-decyl, (meth) acrylic acid n-dodecyl, (meth) acrylic acid Linear alkyl esters of (meth) acrylic acid such as lauryl, stearyl (meth) acrylate, etc .;
(Meth) acrylic acid i-propyl, (meth) acrylic acid i-butyl, (meth) acrylic acid t-butyl, (meth) acrylic acid i-pentyl, (meth) acrylic acid i-hexyl, (meth) acrylic acid Branching of (meth) acrylic acid such as 2-ethylhexyl, i-octyl (meth) acrylate, i-nonyl (meth) acrylate, i-stearyl (meth) acrylate, i-amyl (meth) acrylate, etc. Alkyl esters;
(Meth) acrylic acid cyclohexyl, isoboronyl (meth) acrylic acid, adamantyl (meth) acrylic acid, dicyclopentanyl (meth) acrylic acid, cyclododecyl (meth) acrylic acid, methyl cyclohexyl (meth) acrylic acid, ( Alicyclic skeleton-containing alkyl ester of (meth) acrylic acid such as trimethylcyclohexyl (meth) acrylate, tert-butylcyclohexyl (meth) acrylate, cyclohexyl α-ethoxyacrylate, etc .;
Aromatic ring skeleton-containing ester of (meth) acrylic acid such as phenyl (meth) acrylate;
Etc.
Moreover, the substituent-containing (meth) acrylic acid alkyl ester in which the substituent was introduce | transduced into the alkyl group in (meth) acrylic acid alkyl ester can also be mentioned. The substituent of the substituent-containing (meth) acrylic acid alkyl ester is a group that substitutes the hydrogen atom of the alkyl group, and specific examples thereof include a phenyl group, an alkoxy group, and a phenoxy group. Specific examples of the substituent-containing (meth) acrylic acid alkyl ester include 2-methoxyethyl (meth) acrylate, ethoxymethyl (meth) acrylate, phenoxyethyl (meth) acrylate, 2- (meth) acrylate Examples thereof include (2-phenoxyethoxy) ethyl, phenoxydiethylene glycol (meth) acrylate, and phenoxypoly (ethylene glycol) (meth) acrylate.
これらの(メタ)アクリル酸エステルは、それぞれ単独で用いることができるほか、異なる複数のものを用いてもよい。
These (meth) acrylic acid esters can be used alone or in combination of two or more different ones.
(メタ)アクリル系樹脂(A)は、ホモポリマーのガラス転移温度Tgが0℃未満である(メタ)アクリル酸アルキルエステル(a1)由来の構成単位、及びホモポリマーのTgが0℃以上である(メタ)アクリル酸アルキルエステル(a2)由来の構成単位を含有することが好ましい。アクリル酸アルキルエステル(a1)由来の構成単位及びアクリル酸アルキルエステル(a2)由来の構成単位を含有することは、粘着剤層の高温耐久性を高めるうえで有利である。(メタ)アクリル酸アルキルエステルのホモポリマーのTgは、例えばPOLYMER HANDBOOK(Wiley-Interscience)などの文献値を採用することができる。
The (meth) acrylic resin (A) has a structural unit derived from a (meth) acrylic acid alkyl ester (a1) whose homopolymer has a glass transition temperature Tg of less than 0 ° C., and a homopolymer Tg of 0 ° C. or more It is preferable to contain the structural unit derived from (meth) acrylic acid alkyl ester (a2). Containing the structural unit derived from the acrylic acid alkyl ester (a1) and the structural unit derived from the acrylic acid alkyl ester (a2) is advantageous for enhancing the high temperature durability of the pressure-sensitive adhesive layer. As the Tg of the homopolymer of (meth) acrylic acid alkyl ester, literature values such as, for example, POLYMER HANDBOOK (Wiley-Interscience) can be adopted.
(メタ)アクリル酸アルキルエステル(a1)の具体例としては、アクリル酸エチル、アクリル酸n-及びi-プロピル、アクリル酸n-及びi-ブチル、アクリル酸n-ペンチル、アクリル酸n-及びi-へキシル、アクリル酸n-ヘプチル、アクリル酸n-及びi-オクチル、アクリル酸2-エチルへキシル、アクリル酸n-及びi-ノニル、アクリル酸n-及びi-デシル、アクリル酸n-ドデシル等のアルキル基の炭素数が2~12程度の(メタ)アクリル酸アルキルエステル等が挙げられる。
Specific examples of the (meth) acrylic acid alkyl ester (a1) include ethyl acrylate, n- and i-propyl acrylate, n- and i-butyl acrylate, n-pentyl acrylate, n- and acrylate acrylic acid -Hexyl, n-heptyl acrylate, n- and i-octyl acrylate, 2-ethylhexyl acrylate, n- and i-nonyl acrylate, n- and i-decyl acrylate, n-dodecyl acrylate And the like. Examples thereof include (meth) acrylic acid alkyl esters having about 2 to 12 carbon atoms in the alkyl group.
(メタ)アクリル酸アルキルエステル(a1)は、1種のみを用いてもよいし2種以上を併用してもよい。なかでも、光選択吸収層を他の層に積層した際の追従性やリワーク性の観点から、アクリル酸n-ブチル、アクリル酸n-オクチル、アクリル酸2-エチルへキシルなどが好ましい。
The (meth) acrylic acid alkyl ester (a1) may be used alone or in combination of two or more. Among them, n-butyl acrylate, n-octyl acrylate, 2-ethylhexyl acrylate and the like are preferable from the viewpoint of followability and rework when the light selective absorption layer is laminated on another layer.
(メタ)アクリル酸アルキルエステル(a2)は、(メタ)アクリル酸アルキルエステル(a1)以外の(メタ)アクリル酸アルキルエステルである。(メタ)アクリル酸アルキルエステル(a2)の具体例は、アクリル酸メチル、アクリル酸シクロヘキシル、アクリル酸イソボロニル、アクリル酸ステアリル、アクリル酸t-ブチル等を含む。
The (meth) acrylic acid alkyl ester (a2) is a (meth) acrylic acid alkyl ester other than the (meth) acrylic acid alkyl ester (a1). Specific examples of the (meth) acrylic acid alkyl ester (a2) include methyl acrylate, cyclohexyl acrylate, isoboronyl acrylate, stearyl acrylate, t-butyl acrylate and the like.
(メタ)アクリル酸アルキルエステル(a2)は、1種のみを用いてもよいし2種以上を併用してもよい。中でも、高温耐久性の観点から、(メタ)アクリル酸アルキルエステル(a2)は、アクリル酸メチル、アクリル酸シクロヘキシル、アクリル酸イソボロニル等を含むことが好ましく、アクリル酸メチルを含むことがより好ましい。
The (meth) acrylic acid alkyl ester (a2) may be used alone or in combination of two or more. Among them, from the viewpoint of high temperature durability, the (meth) acrylic acid alkyl ester (a2) preferably contains methyl acrylate, cyclohexyl acrylate, isoboronyl acrylate and the like, and more preferably methyl acrylate.
式(I)で示される(メタ)アクリル酸エステルに由来する構造単位は、(メタ)アクリル系樹脂(A)に含まれる全構造単位中、50質量%以上であることが好ましく、60~95質量%であることが好ましく、65~95質量%以上であることがより好ましい。
The structural unit derived from the (meth) acrylic acid ester represented by the formula (I) is preferably 50% by mass or more in all structural units contained in the (meth) acrylic resin (A), and is preferably 60 to 95 The content is preferably in the range of 50% by mass, and more preferably in the range of 65 to 95% by mass.
(メタ)アクリル酸エステル以外の単量体に由来する構造単位としては、極性官能基を有する単量体に由来する構造単位が好ましく、極性官能基を有する(メタ)アクリル酸エステルに由来する構造単位がより好ましい。極性官能基としては、ヒドロキシ基、カルボキシル基、置換もしくは無置換アミノ基、エポキシ基等の複素環基などが挙げられる。
極性官能基を有する単量体としては、
(メタ)アクリル酸1-ヒドロキシメチル、(メタ)アクリル酸1-ヒドロキシエチル、(メタ)アクリル酸1-ヒドロキシヘプチル、(メタ)アクリル酸1-ヒドロキシブチル、(メタ)アクリル酸1-ヒドロキシペンチル、(メタ)アクリル酸2-ヒドロキシエチル、(メタ)アクリル酸2-ヒドロキシプロピル、(メタ)アクリル酸2-ヒドロキシブチル、(メタ)アクリル酸2-ヒドロキシペンチル、(メタ)アクリル酸2-ヒドロキシヘキシル、(メタ)アクリル酸3-ヒドロキシプロピル、(メタ)アクリル酸3-ヒドロキシブチル、(メタ)アクリル酸3-ヒドロキシペンチル、(メタ)アクリル酸3-ヒドロキシヘキシル、(メタ)アクリル酸3-ヒドロキシヘプチル、(メタ)アクリル酸4-ヒドロキシブチル、(メタ)アクリル酸4-ヒドロキシペンチル、(メタ)アクリル酸4-ヒドロキシヘキシル、(メタ)アクリル酸4-ヒドロキシヘプチル、(メタ)アクリル酸4-ヒドロキシオクチル、(メタ)アクリル酸2-クロロ-2-ヒドロキシプロピル、(メタ)アクリル酸3-クロロ-2-ヒドロキシプロピル、(メタ)アクリル酸2-ヒドロキシー3-フェノキシプロピル、(メタ)アクリル酸5-ヒドロキシペンチル、(メタ)アクリル酸5-ヒドロキシヘキシル、(メタ)アクリル酸5-ヒドロキシヘプチル、(メタ)アクリル酸5-ヒドロキシオクチル、(メタ)アクリル酸5-ヒドロキシノニル、(メタ)アクリル酸6-ヒドロキシヘキシル、(メタ)アクリル酸6-ヒドロキシヘプチル、(メタ)アクリル酸6-ヒドロキシオクチル、(メタ)アクリル酸6-ヒドロキシノニル、(メタ)アクリル酸6-ヒドロキシデシル、(メタ)アクリル酸7-ヒドロキシヘプチル、(メタ)アクリル酸7-ヒドロキシオクチル、(メタ)アクリル酸7-ヒドロキシノニル、(メタ)アクリル酸7-ヒドロキシデシル、(メタ)アクリル酸7-ヒドロキシウンデシル、(メタ)アクリル酸8-ヒドロキシオクチル、(メタ)アクリル酸8-ヒドロキシノニル、(メタ)アクリル酸8-ヒドロキシデシル、(メタ)アクリル酸8-ヒドロキシウンデシル、(メタ)アクリル酸8-ヒドロキシドデシル、(メタ)アクリル酸9-ヒドロキシノニル、(メタ)アクリル酸9-ヒドロキシデシル、(メタ)アクリル酸9-ヒドロキシウンデシル、(メタ)アクリル酸9-ヒドロキシドデシル、(メタ)アクリル酸9-ヒドロキシトリデシル、(メタ)アクリル酸10-ヒドロキシデシル、(メタ)アクリル酸10-ヒドロキシウンデシル、(メタ)アクリル酸10-ヒドロキシドデシル、アクリル酸10-ヒドロキシトリデシル、(メタ)アクリル酸10-ヒドロキシテトラデシル、(メタ)アクリル酸11-ヒドロキシウンデシル、(メタ)アクリル酸11-ヒドロキシドデシル、(メタ)アクリル酸11-ヒドロキシトリデシル、(メタ)アクリル酸11-ヒドロキシテトラデシル、(メタ)アクリル酸11-ヒドロキシペンタデシル、(メタ)アクリル酸12-ヒドロキシドデシル、(メタ)アクリル酸12-ヒドロキシトリデシル、(メタ)アクリル酸12-ヒドロキシテトラデシル、(メタ)アクリル酸13-ヒドロキシペンタデシル、(メタ)アクリル酸13-ヒドロキシテトラデシル、(メタ)アクリル酸13-ヒドロキシペンタデシル、(メタ)アクリル酸14-ヒドロキシテトラデシル、(メタ)アクリル酸14-ヒドロキシペンタデシル、(メタ)アクリル酸15-ヒドロキシペンタデシル、(メタ)アクリル酸15-ヒドロキシヘプタデシル等のヒドロキシ基を有する単量体;
(メタ)アクリル酸、カルボキシアルキル(メタ)アクリレート(例えば、カルボキシエチル(メタ)アクリレート、カルボキシペンチル(メタ)アクリレート)、マレイン酸、無水マレイン酸、フマル酸、クロトン酸等のカルボキシル基を有する単量体;
アクリロイルモルホリン、ビニルカプロラクタム、N-ビニル-2-ピロリドン、ビニルピリジン、テトラヒドロフルフリル(メタ)アクリレート、カプロラクトン変性テトラヒドロフルフリルアクリレート、3,4-エポキシシクロヘキシルメチル(メタ)アクリレート、グリシジル(メタ)アクリレート、2,5-ジヒドロフラン等の複素環基を有する単量体;
アミノエチル(メタ)アクリレート、N,N-ジメチルアミノエチル(メタ)アクリレート、ジメチルアミノプロピル(メタ)アクリレート等の置換もしくは無置換アミノ基を有する単量体が挙げられる。
なかでも、(メタ)アクリル酸エステル重合体と架橋剤との反応性の点で、ヒドロキシ基を有する単量体またはおよびカルボキシル基を有する単量体が好ましく、ヒドロキシ基を有する単量体およびカルボキシル基を有する単量体のいずれもを含むことがより好ましい。 As a structural unit derived from monomers other than (meth) acrylic acid ester, a structural unit derived from a monomer having a polar functional group is preferable, and a structure derived from a (meth) acrylic acid ester having a polar functional group Units are more preferred. Examples of polar functional groups include hydroxy groups, carboxyl groups, substituted or unsubstituted amino groups, and heterocyclic groups such as epoxy groups.
As a monomer having a polar functional group,
(Meth) acrylic acid 1-hydroxymethyl, (meth) acrylic acid 1-hydroxyethyl, (meth) acrylic acid 1-hydroxyheptyl, (meth) acrylic acid 1-hydroxybutyl, (meth) acrylic acid 1-hydroxypentyl, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxypentyl (meth) acrylate, 2-hydroxyhexyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 3-hydroxybutyl (meth) acrylate, 3-hydroxypentyl (meth) acrylate, 3-hydroxyhexyl (meth) acrylate, 3-hydroxyheptyl (meth) acrylate, (Meth) acrylic acid 4-hydroxybutyl, (meth) 4-hydroxypentyl methacrylate, 4-hydroxyhexyl (meth) acrylate, 4-hydroxyheptyl (meth) acrylate, 4-hydroxyoctyl (meth) acrylate, 2-chloro-2-hydroxypropyl (meth) acrylate , 3-chloro-2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, 5-hydroxypentyl (meth) acrylate, 5-hydroxyhexyl (meth) acrylate, (meth ) 5-hydroxyheptyl acrylate, 5-hydroxyoctyl (meth) acrylate, 5-hydroxynonyl (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 6-hydroxyheptyl (meth) acrylate, (meth) ) Acrylic acid 6-hydroxyoctyl, (meta Acrylic acid 6-hydroxynonyl, (meth) acrylic acid 6-hydroxydecyl, (meth) acrylic acid 7-hydroxyheptyl, (meth) acrylic acid 7-hydroxyoctyl, (meth) acrylic acid 7-hydroxynonyl, (meth) Acrylic acid 7-hydroxydecyl, (meth) acrylic acid 7-hydroxyundecyl, (meth) acrylic acid 8-hydroxyoctyl, (meth) acrylic acid 8-hydroxynonyl, (meth) acrylic acid 8-hydroxydecyl (meth ) 8-hydroxyundecyl acrylate, 8-hydroxydodecyl (meth) acrylate, 9-hydroxynonyl (meth) acrylate, 9-hydroxydecyl (meth) acrylate, 9-hydroxyundecyl (meth) acrylate, (Meth) acrylic acid 9-hydroxydodecyl, (meth) ac 9-hydroxytridecyl acrylate, 10-hydroxydecyl (meth) acrylate, 10-hydroxyundecyl (meth) acrylate, 10-hydroxydodecyl (meth) acrylate, 10-hydroxytridecyl acrylate, (meth) Acrylic acid 10-hydroxytetradecyl, (meth) acrylic acid 11-hydroxyundecyl, (meth) acrylic acid 11-hydroxydodecyl, (meth) acrylic acid 11-hydroxytridecyl, (meth) acrylic acid 11-hydroxytetradecyl 11-hydroxypentadecyl (meth) acrylic acid, 12-hydroxydodecyl (meth) acrylic acid, 12-hydroxytridecyl (meth) acrylic acid, 12-hydroxytetradecyl (meth) acrylic acid, (meth) acrylic acid 13 -Hydroxypentadecyl (Meth) acrylic acid 13-hydroxytetradecyl, (meth) acrylic acid 13-hydroxypentadecyl, (meth) acrylic acid 14-hydroxytetradecyl, (meth) acrylic acid 14-hydroxypentadecyl, (meth) acrylic acid 15 -A monomer having a hydroxy group such as hydroxypentadecyl, 15-hydroxyheptadecyl (meth) acrylic acid;
(Meth) acrylic acid, carboxyalkyl (meth) acrylate (eg, carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate), maleic acid, maleic anhydride, fumaric acid, crotonic acid, etc. body;
Acryloyl morpholine, vinylcaprolactam, N-vinyl-2-pyrrolidone, vinylpyridine, tetrahydrofurfuryl (meth) acrylate, caprolactone modified tetrahydrofurfuryl acrylate, 3,4-epoxycyclohexylmethyl (meth) acrylate, glycidyl (meth) acrylate, A monomer having a heterocyclic group such as 2,5-dihydrofuran;
Monomers having a substituted or unsubstituted amino group such as aminoethyl (meth) acrylate, N, N-dimethylaminoethyl (meth) acrylate, dimethylaminopropyl (meth) acrylate and the like can be mentioned.
Among them, a monomer having a hydroxy group or a monomer having a carboxyl group is preferable in view of the reactivity between the (meth) acrylic acid ester polymer and the crosslinking agent, and a monomer having a hydroxy group and a carboxyl group It is more preferable to include any of monomers having a group.
極性官能基を有する単量体としては、
(メタ)アクリル酸1-ヒドロキシメチル、(メタ)アクリル酸1-ヒドロキシエチル、(メタ)アクリル酸1-ヒドロキシヘプチル、(メタ)アクリル酸1-ヒドロキシブチル、(メタ)アクリル酸1-ヒドロキシペンチル、(メタ)アクリル酸2-ヒドロキシエチル、(メタ)アクリル酸2-ヒドロキシプロピル、(メタ)アクリル酸2-ヒドロキシブチル、(メタ)アクリル酸2-ヒドロキシペンチル、(メタ)アクリル酸2-ヒドロキシヘキシル、(メタ)アクリル酸3-ヒドロキシプロピル、(メタ)アクリル酸3-ヒドロキシブチル、(メタ)アクリル酸3-ヒドロキシペンチル、(メタ)アクリル酸3-ヒドロキシヘキシル、(メタ)アクリル酸3-ヒドロキシヘプチル、(メタ)アクリル酸4-ヒドロキシブチル、(メタ)アクリル酸4-ヒドロキシペンチル、(メタ)アクリル酸4-ヒドロキシヘキシル、(メタ)アクリル酸4-ヒドロキシヘプチル、(メタ)アクリル酸4-ヒドロキシオクチル、(メタ)アクリル酸2-クロロ-2-ヒドロキシプロピル、(メタ)アクリル酸3-クロロ-2-ヒドロキシプロピル、(メタ)アクリル酸2-ヒドロキシー3-フェノキシプロピル、(メタ)アクリル酸5-ヒドロキシペンチル、(メタ)アクリル酸5-ヒドロキシヘキシル、(メタ)アクリル酸5-ヒドロキシヘプチル、(メタ)アクリル酸5-ヒドロキシオクチル、(メタ)アクリル酸5-ヒドロキシノニル、(メタ)アクリル酸6-ヒドロキシヘキシル、(メタ)アクリル酸6-ヒドロキシヘプチル、(メタ)アクリル酸6-ヒドロキシオクチル、(メタ)アクリル酸6-ヒドロキシノニル、(メタ)アクリル酸6-ヒドロキシデシル、(メタ)アクリル酸7-ヒドロキシヘプチル、(メタ)アクリル酸7-ヒドロキシオクチル、(メタ)アクリル酸7-ヒドロキシノニル、(メタ)アクリル酸7-ヒドロキシデシル、(メタ)アクリル酸7-ヒドロキシウンデシル、(メタ)アクリル酸8-ヒドロキシオクチル、(メタ)アクリル酸8-ヒドロキシノニル、(メタ)アクリル酸8-ヒドロキシデシル、(メタ)アクリル酸8-ヒドロキシウンデシル、(メタ)アクリル酸8-ヒドロキシドデシル、(メタ)アクリル酸9-ヒドロキシノニル、(メタ)アクリル酸9-ヒドロキシデシル、(メタ)アクリル酸9-ヒドロキシウンデシル、(メタ)アクリル酸9-ヒドロキシドデシル、(メタ)アクリル酸9-ヒドロキシトリデシル、(メタ)アクリル酸10-ヒドロキシデシル、(メタ)アクリル酸10-ヒドロキシウンデシル、(メタ)アクリル酸10-ヒドロキシドデシル、アクリル酸10-ヒドロキシトリデシル、(メタ)アクリル酸10-ヒドロキシテトラデシル、(メタ)アクリル酸11-ヒドロキシウンデシル、(メタ)アクリル酸11-ヒドロキシドデシル、(メタ)アクリル酸11-ヒドロキシトリデシル、(メタ)アクリル酸11-ヒドロキシテトラデシル、(メタ)アクリル酸11-ヒドロキシペンタデシル、(メタ)アクリル酸12-ヒドロキシドデシル、(メタ)アクリル酸12-ヒドロキシトリデシル、(メタ)アクリル酸12-ヒドロキシテトラデシル、(メタ)アクリル酸13-ヒドロキシペンタデシル、(メタ)アクリル酸13-ヒドロキシテトラデシル、(メタ)アクリル酸13-ヒドロキシペンタデシル、(メタ)アクリル酸14-ヒドロキシテトラデシル、(メタ)アクリル酸14-ヒドロキシペンタデシル、(メタ)アクリル酸15-ヒドロキシペンタデシル、(メタ)アクリル酸15-ヒドロキシヘプタデシル等のヒドロキシ基を有する単量体;
(メタ)アクリル酸、カルボキシアルキル(メタ)アクリレート(例えば、カルボキシエチル(メタ)アクリレート、カルボキシペンチル(メタ)アクリレート)、マレイン酸、無水マレイン酸、フマル酸、クロトン酸等のカルボキシル基を有する単量体;
アクリロイルモルホリン、ビニルカプロラクタム、N-ビニル-2-ピロリドン、ビニルピリジン、テトラヒドロフルフリル(メタ)アクリレート、カプロラクトン変性テトラヒドロフルフリルアクリレート、3,4-エポキシシクロヘキシルメチル(メタ)アクリレート、グリシジル(メタ)アクリレート、2,5-ジヒドロフラン等の複素環基を有する単量体;
アミノエチル(メタ)アクリレート、N,N-ジメチルアミノエチル(メタ)アクリレート、ジメチルアミノプロピル(メタ)アクリレート等の置換もしくは無置換アミノ基を有する単量体が挙げられる。
なかでも、(メタ)アクリル酸エステル重合体と架橋剤との反応性の点で、ヒドロキシ基を有する単量体またはおよびカルボキシル基を有する単量体が好ましく、ヒドロキシ基を有する単量体およびカルボキシル基を有する単量体のいずれもを含むことがより好ましい。 As a structural unit derived from monomers other than (meth) acrylic acid ester, a structural unit derived from a monomer having a polar functional group is preferable, and a structure derived from a (meth) acrylic acid ester having a polar functional group Units are more preferred. Examples of polar functional groups include hydroxy groups, carboxyl groups, substituted or unsubstituted amino groups, and heterocyclic groups such as epoxy groups.
As a monomer having a polar functional group,
(Meth) acrylic acid 1-hydroxymethyl, (meth) acrylic acid 1-hydroxyethyl, (meth) acrylic acid 1-hydroxyheptyl, (meth) acrylic acid 1-hydroxybutyl, (meth) acrylic acid 1-hydroxypentyl, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxypentyl (meth) acrylate, 2-hydroxyhexyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 3-hydroxybutyl (meth) acrylate, 3-hydroxypentyl (meth) acrylate, 3-hydroxyhexyl (meth) acrylate, 3-hydroxyheptyl (meth) acrylate, (Meth) acrylic acid 4-hydroxybutyl, (meth) 4-hydroxypentyl methacrylate, 4-hydroxyhexyl (meth) acrylate, 4-hydroxyheptyl (meth) acrylate, 4-hydroxyoctyl (meth) acrylate, 2-chloro-2-hydroxypropyl (meth) acrylate , 3-chloro-2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, 5-hydroxypentyl (meth) acrylate, 5-hydroxyhexyl (meth) acrylate, (meth ) 5-hydroxyheptyl acrylate, 5-hydroxyoctyl (meth) acrylate, 5-hydroxynonyl (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 6-hydroxyheptyl (meth) acrylate, (meth) ) Acrylic acid 6-hydroxyoctyl, (meta Acrylic acid 6-hydroxynonyl, (meth) acrylic acid 6-hydroxydecyl, (meth) acrylic acid 7-hydroxyheptyl, (meth) acrylic acid 7-hydroxyoctyl, (meth) acrylic acid 7-hydroxynonyl, (meth) Acrylic acid 7-hydroxydecyl, (meth) acrylic acid 7-hydroxyundecyl, (meth) acrylic acid 8-hydroxyoctyl, (meth) acrylic acid 8-hydroxynonyl, (meth) acrylic acid 8-hydroxydecyl (meth ) 8-hydroxyundecyl acrylate, 8-hydroxydodecyl (meth) acrylate, 9-hydroxynonyl (meth) acrylate, 9-hydroxydecyl (meth) acrylate, 9-hydroxyundecyl (meth) acrylate, (Meth) acrylic acid 9-hydroxydodecyl, (meth) ac 9-hydroxytridecyl acrylate, 10-hydroxydecyl (meth) acrylate, 10-hydroxyundecyl (meth) acrylate, 10-hydroxydodecyl (meth) acrylate, 10-hydroxytridecyl acrylate, (meth) Acrylic acid 10-hydroxytetradecyl, (meth) acrylic acid 11-hydroxyundecyl, (meth) acrylic acid 11-hydroxydodecyl, (meth) acrylic acid 11-hydroxytridecyl, (meth) acrylic acid 11-hydroxytetradecyl 11-hydroxypentadecyl (meth) acrylic acid, 12-hydroxydodecyl (meth) acrylic acid, 12-hydroxytridecyl (meth) acrylic acid, 12-hydroxytetradecyl (meth) acrylic acid, (meth) acrylic acid 13 -Hydroxypentadecyl (Meth) acrylic acid 13-hydroxytetradecyl, (meth) acrylic acid 13-hydroxypentadecyl, (meth) acrylic acid 14-hydroxytetradecyl, (meth) acrylic acid 14-hydroxypentadecyl, (meth) acrylic acid 15 -A monomer having a hydroxy group such as hydroxypentadecyl, 15-hydroxyheptadecyl (meth) acrylic acid;
(Meth) acrylic acid, carboxyalkyl (meth) acrylate (eg, carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate), maleic acid, maleic anhydride, fumaric acid, crotonic acid, etc. body;
Acryloyl morpholine, vinylcaprolactam, N-vinyl-2-pyrrolidone, vinylpyridine, tetrahydrofurfuryl (meth) acrylate, caprolactone modified tetrahydrofurfuryl acrylate, 3,4-epoxycyclohexylmethyl (meth) acrylate, glycidyl (meth) acrylate, A monomer having a heterocyclic group such as 2,5-dihydrofuran;
Monomers having a substituted or unsubstituted amino group such as aminoethyl (meth) acrylate, N, N-dimethylaminoethyl (meth) acrylate, dimethylaminopropyl (meth) acrylate and the like can be mentioned.
Among them, a monomer having a hydroxy group or a monomer having a carboxyl group is preferable in view of the reactivity between the (meth) acrylic acid ester polymer and the crosslinking agent, and a monomer having a hydroxy group and a carboxyl group It is more preferable to include any of monomers having a group.
ヒドロキシ基を有する単量体としては、アクリル酸2-ヒドロキシエチル、アクリル酸3-ヒドロキシプロピル、アクリル酸4-ヒドロキシブチル、アクリル酸5-ヒドロキシペンチル、アクリル酸6-ヒドロキシヘキシルが好ましい。特に、アクリル酸2-ヒドロキシエチル、アクリル酸4-ヒドロキシブチルおよびアクリル酸5-ヒドロキシペンチルを用いることで良好な耐久性を得ることができる。
カルボキシル基を有する単量体としては、アクリル酸を用いることが好ましい。 As a monomer having a hydroxy group, 2-hydroxyethyl acrylate, 3-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 5-hydroxypentyl acrylate, 6-hydroxyhexyl acrylate are preferable. In particular, good durability can be obtained by using 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate and 5-hydroxypentyl acrylate.
As a monomer having a carboxyl group, acrylic acid is preferably used.
カルボキシル基を有する単量体としては、アクリル酸を用いることが好ましい。 As a monomer having a hydroxy group, 2-hydroxyethyl acrylate, 3-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 5-hydroxypentyl acrylate, 6-hydroxyhexyl acrylate are preferable. In particular, good durability can be obtained by using 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate and 5-hydroxypentyl acrylate.
As a monomer having a carboxyl group, acrylic acid is preferably used.
粘着剤層の外面に積層することができるセパレートフィルムの剥離力亢進を防ぐ観点から、(メタ)アクリル系樹脂(A)は、アミノ基を有する単量体に由来の構造単位を実質的に含まないことが好ましい。ここで実質的に含まないとは、(メタ)アクリル系樹脂(A)を構成する全構成単位100質量部中、0.1質量部以下であることをいう。
The (meth) acrylic resin (A) substantially contains a structural unit derived from a monomer having an amino group, from the viewpoint of preventing the peel force enhancement of the separate film that can be laminated on the outer surface of the pressure-sensitive adhesive layer. Preferably not. Here, “not substantially contained” means that it is 0.1 parts by mass or less in 100 parts by mass of all the constituent units constituting the (meth) acrylic resin (A).
極性官能基を有する単量体に由来する構造単位の含有量は、(メタ)アクリル系樹脂(A)の全構造単位100質量部に対して、好ましくは20質量部以下、より好ましくは、0.5質量部以上15質量部以下、さらに好ましくは0.5質量部以上10質量部以下、特に好ましくは1質量部以上7質量部以下である。
The content of the structural unit derived from the monomer having a polar functional group is preferably 20 parts by mass or less, more preferably 0 based on 100 parts by mass of all structural units of the (meth) acrylic resin (A). 0.5 parts by weight or more and 15 parts by weight or less, more preferably 0.5 parts by weight or more and 10 parts by weight or less, particularly preferably 1 parts by weight or more and 7 parts by weight or less.
芳香族基を有する単量体に由来する構造単位の含有量は、(メタ)アクリル系樹脂(A)の全構造単位100質量部に対して、好ましくは20質量部以下、より好ましくは4質量部以上20質量部以下、さらに好ましくは4質量部以上16質量部以下である。
The content of the structural unit derived from the monomer having an aromatic group is preferably 20 parts by mass or less, more preferably 4 parts by mass with respect to 100 parts by mass of the total structural units of the (meth) acrylic resin (A). The content is not less than 20 parts by mass and preferably not less than 4 parts by mass and not more than 16 parts by mass.
(メタ)アクリル酸エステル以外の単量体に由来する構造単位としては、スチレン系単量体に由来する構造単位、ビニル系単量体に由来する構造単位、分子内に複数の(メタ)アクリロイル基を有する単量体に由来する構造単位、(メタ)アクリルアミド系単量体に由来する構造単位なども挙げられる。
As structural units derived from monomers other than (meth) acrylic acid esters, structural units derived from styrenic monomers, structural units derived from vinyl monomers, plural (meth) acryloyl groups in the molecule The structural unit derived from the monomer which has group, the structural unit derived from a (meth) acrylamide type monomer, etc. are also mentioned.
スチレン系単量体としては、スチレン;メチルスチレン、ジメチルスチレン、トリメチルスチレン、エチルスチレン、ジエチルスチレン、トリエチルスチレン、プロピルスチレン、ブチルスチレン、ヘキシルスチレン、ヘプチルスチレン、オクチルスチレン等のアルキルスチレン;フルオロスチレン、クロロスチレン、ブロモスチレン、ジブロモスチレン、ヨードスチレン等のハロゲン化スチレン;ニトロスチレン;アセチルスチレン;メトキシスチレン;および、ジビニルベンゼンが挙げられる。
As styrene-based monomers, styrene; alkylstyrenes such as methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, triethylstyrene, propylstyrene, butylstyrene, hexylstyrene, heptylstyrene, octylstyrene, etc .; fluorostyrene, Halogenated styrenes such as chlorostyrene, bromostyrene, dibromostyrene, iodostyrene; nitrostyrene; acetylstyrene; methoxystyrene; and divinylbenzene.
ビニル系単量体としては、酢酸ビニル、プロピオン酸ビニル、酪酸ビニル、2-エチルヘキサン酸ビニル、ラウリン酸ビニル等の脂肪酸ビニルエステル;塩化ビニル、臭化ビニル等のハロゲン化ビニル;塩化ビニリデン等のハロゲン化ビニリデン;ビニルピリジン、ビニルピロリドン、ビニルカルバゾール等の含窒素複素芳香族ビニル;ブタジエン、イソプレン、クロロプレン等の共役ジエン;および、アクリロニトリル、メタクリロニトリル等の不飽和ニトリルが挙げられる。
Examples of vinyl monomers include fatty acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl 2-ethylhexanoate and vinyl laurate; vinyl halides such as vinyl chloride and vinyl bromide; vinylidene chloride and the like And vinylidene halides; nitrogen-containing heteroaromatic vinyls such as vinylpyridine, vinylpyrrolidone and vinylcarbazole; conjugated dienes such as butadiene, isoprene and chloroprene; and unsaturated nitriles such as acrylonitrile and methacrylonitrile.
分子内に複数の(メタ)アクリロイル基を有する単量体としては、1,4-ブタンジオールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、1,9-ノナンジオールジ(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、テトラエチレングリコールジ(メタ)アクリレート、トリプロピレングリコールジ(メタ)アクリレート等の分子内に2個の(メタ)アクリロイル基を有する単量体;トリメチロールプロパントリ(メタ)アクリレート等の分子内に3個の(メタ)アクリロイル基を有する単量体が挙げられる。
As monomers having a plurality of (meth) acryloyl groups in the molecule, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonanediol di ( Two (meth) acryloyl groups in the molecule such as meta) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate and tripropylene glycol di (meth) acrylate Monomers having; monomers having three (meth) acryloyl groups in a molecule such as trimethylolpropane tri (meth) acrylate.
(メタ)アクリルアミド系単量体としては、N-メチロール(メタ)アクリルアミド、N-(2-ヒドロキシエチル)(メタ)アクリルアミド、N-(3-ヒドロキシプロピル)(メタ)アクリルアミド、N-(4-ヒドロキシブチル)(メタ)アクリルアミド、N-(5-ヒドロキシペンチル)(メタ)アクリルアミド、N-(6-ヒドロキシヘキシル)(メタ)アクリルアミド、N,N-ジメチル(メタ)アクリルアミド、N,N-ジエチル(メタ)アクリルアミド、N-イソプロピル(メタ)アクリルアミド、N-(3-ジメチルアミノプロピル)(メタ)アクリルアミド、N-(1,1-ジメチル-3-オキソブチル)(メタ)アクリルアミド、N-〔2-(2-オキソ-1-イミダゾリジニル)エチル〕(メタ)アクリルアミド、2-アクリロイルアミノ-2-メチル-1-プロパンスルホン酸、N-(メトキシメチル)アクリルアミド、N-(エトキシメチル)(メタ)アクリルアミド、N-(プロポキシメチル)(メタ)アクリルアミド、N-(1-メチルエトキシメチル)(メタ)アクリルアミド、N-(1-メチルプロポキシメチル)(メタ)アクリルアミド、N-(2-メチルプロポキシメチル)(メタ)アクリルアミド、N-(ブトキシメチル)(メタ)アクリルアミド、N-(1,1-ジメチルエトキシメチル)(メタ)アクリルアミド、N-(2-メトキシエチル)(メタ)アクリルアミド、N-(2-エトキシエチル)(メタ)アクリルアミド、N-(2-プロポキシエチル)(メタ)アクリルアミド、N-〔2-(1-メチルエトキシ)エチル〕(メタ)アクリルアミド、N-〔2-(1-メチルプロポキシ)エチル〕(メタ)アクリルアミド、N-〔2-(2-メチルプロポキシ)エチル〕(メタ)アクリルアミド、N-(2-ブトキシエチル)(メタ)アクリルアミド、N-〔2-(1,1-ジメチルエトキシ)エチル〕(メタ)アクリルアミドなどが挙げられる。なかでも、N-(メトキシメチル)アクリルアミド、N-(エトキシメチル)アクリルアミド、N-(プロポキシメチル)アクリルアミド、N-(ブトキシメチル)アクリルアミドおよびN-(2-メチルプロポキシメチル)アクリルアミドが好ましい。
Examples of (meth) acrylamide monomers include N-methylol (meth) acrylamide, N- (2-hydroxyethyl) (meth) acrylamide, N- (3-hydroxypropyl) (meth) acrylamide, N- (4-) Hydroxybutyl) (meth) acrylamide, N- (5-hydroxypentyl) (meth) acrylamide, N- (6-hydroxyhexyl) (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N-diethyl (meth) acrylamide Meta) acrylamide, N-isopropyl (meth) acrylamide, N- (3-dimethylaminopropyl) (meth) acrylamide, N- (1,1-dimethyl-3-oxobutyl) (meth) acrylamide, N- [2- (2-) 2-Oxo-1-imidazolidinyl) ethyl] (meth) acrylamide 2-acryloylamino-2-methyl-1-propanesulfonic acid, N- (methoxymethyl) acrylamide, N- (ethoxymethyl) (meth) acrylamide, N- (propoxymethyl) (meth) acrylamide, N- (1-) Methylethoxymethyl) (meth) acrylamide, N- (1-methylpropoxymethyl) (meth) acrylamide, N- (2-methylpropoxymethyl) (meth) acrylamide, N- (butoxymethyl) (meth) acrylamide, N- (1,1-Dimethylethoxymethyl) (meth) acrylamide, N- (2-methoxyethyl) (meth) acrylamide, N- (2-ethoxyethyl) (meth) acrylamide, N- (2-propoxyethyl) (meth) ) Acrylamide, N- [2- (1-methylethoxy) ethyl] Meta) Acrylamide, N- [2- (1-Methylpropoxy) ethyl] (meth) acrylamide, N- [2- (2-Methylpropoxy) ethyl] (meth) acrylamide, N- (2-Butoxyethyl) (meth) acrylamide A) acrylamide, N- [2- (1,1-dimethylethoxy) ethyl] (meth) acrylamide and the like. Among them, N- (methoxymethyl) acrylamide, N- (ethoxymethyl) acrylamide, N- (propoxymethyl) acrylamide, N- (butoxymethyl) acrylamide and N- (2-methylpropoxymethyl) acrylamide are preferable.
(メタ)アクリル系樹脂(A)の重量平均分子量(Mw)は、好ましくは、50万~250万である。重量平均分子量が50万以上であると、高温環境における粘着剤層の耐久性が向上し、被着体と粘着剤層との間の浮き剥れや、粘着剤層の凝集破壊などの不具合を抑制しやすい。重量平均分子量が250万以下であると、粘着剤組成物を例えばシート状に加工(基材に塗工する)際の塗工性の観点で有利である。粘着剤層の耐久性及び粘着剤組成物の塗工性の両立の観点から、重量平均分子量は好ましくは60万~180万であり、よく好ましくは70万~170万であり、特に好ましくは100万~160万である。また、重量平均分子量(Mw)と数平均分子量(Mn)との比で表される分子量分布(Mw/Mn)は、通常2~10、好ましくは3~8、さらに好ましくは3~6である。 重量平均分子量は、ゲルパーミエーションクロマトグラフィにより分析でき、標準ポリスチレン換算の値である。
The weight average molecular weight (Mw) of the (meth) acrylic resin (A) is preferably 500,000 to 2,500,000. When the weight average molecular weight is 500,000 or more, the durability of the pressure-sensitive adhesive layer in a high temperature environment is improved, and defects such as peeling between adherends and the pressure-sensitive adhesive layer, cohesive failure of the pressure-sensitive adhesive layer, etc. It is easy to control. When the weight average molecular weight is 2,500,000 or less, it is advantageous from the viewpoint of coatability when processing the pressure-sensitive adhesive composition into, for example, a sheet (coating on a substrate). The weight-average molecular weight is preferably 600,000 to 1,800,000, more preferably 700,000 to 1,700,000, and particularly preferably 100, from the viewpoint of achieving both the durability of the pressure-sensitive adhesive layer and the coatability of the pressure-sensitive adhesive composition. It is 10,000 to 1.6 million. The molecular weight distribution (Mw / Mn) represented by the ratio of weight average molecular weight (Mw) to number average molecular weight (Mn) is usually 2 to 10, preferably 3 to 8, and more preferably 3 to 6 . The weight average molecular weight can be analyzed by gel permeation chromatography and is a value in terms of standard polystyrene.
(メタ)アクリル系樹脂(A)は、酢酸エチルに溶解させ、濃度20質量%の溶液としたとき、25℃における粘度が、20Pa・s以下であることが好ましく、0.1~15Pa・sであることがより好ましい。該範囲の粘度であると、粘着剤組成物を基材に塗工する際の塗工性の観点から有利である。なお、粘度は、ブルックフィールド粘度計により測定できる。
When the (meth) acrylic resin (A) is dissolved in ethyl acetate to form a solution having a concentration of 20% by mass, the viscosity at 25 ° C. is preferably 20 Pa · s or less, preferably 0.1 to 15 Pa · s. It is more preferable that It is advantageous from the viewpoint of the coatability at the time of applying an adhesive constituent to a substrate as it is a viscosity of this range. The viscosity can be measured by a Brookfield viscometer.
(メタ)アクリル系樹脂(A)のガラス転移温度(Tg)は、例えば-60~20℃、好ましくは-50~15℃、さらに好ましくは-45~10℃、特に-40~0℃であってもよい。Tgが上限値以下であると粘着剤層の被着体基材に対するするぬれ性の向上に有利であり、下限値以上であると粘着剤層の耐久性の向上に有利である。なお、ガラス転移温度は示差走査熱量計(DSC)により測定できる。
The glass transition temperature (Tg) of the (meth) acrylic resin (A) is, for example, -60 to 20 ° C, preferably -50 to 15 ° C, more preferably -45 to 10 ° C, particularly -40 to 0 ° C. May be It is advantageous for the wettability improvement with respect to the adherend base material of an adhesive layer that Tg is below an upper limit, and it is advantageous for the durable improvement of an adhesive layer to be more than a lower limit. The glass transition temperature can be measured by a differential scanning calorimeter (DSC).
(メタ)アクリル系樹脂(A)は、例えば、溶液重合法、塊状重合法、懸濁重合法、乳化重合法などの公知の方法によって製造することができ、特に溶液重合法が好ましい。溶液重合法としては、例えば、単量体及び有機溶媒を混合し、窒素雰囲気下、熱重合開始剤を添加し、40~90℃、好ましくは50~80℃程度の温度条件下、3~15時間程度攪拌する方法が挙げられる。反応制御のため、重合中、連続的又は間歇的に単量体や熱重合開始剤を添加してもよい。該単量体や熱開始剤は有機溶媒に添加した状態であってもよい。
The (meth) acrylic resin (A) can be produced by a known method such as, for example, a solution polymerization method, a bulk polymerization method, a suspension polymerization method, an emulsion polymerization method, and the solution polymerization method is particularly preferable. As the solution polymerization method, for example, a monomer and an organic solvent are mixed, a thermal polymerization initiator is added under a nitrogen atmosphere, and a temperature condition of about 40 to 90 ° C., preferably about 50 to 80 ° C., 3 to 15 The method of stirring for about time is mentioned. In order to control the reaction, monomers or a thermal polymerization initiator may be added continuously or intermittently during the polymerization. The monomer and thermal initiator may be in the state of being added to an organic solvent.
重合開始剤としては、熱重合開始剤や光重合開始剤等が用いられる。光重合開始剤としては、4-(2-ヒドロキシエトキシ)フェニル(2-ヒドロキシ-2-プロピル)ケトンなどが挙げられる。熱重合開始剤としては、2,2’-アゾビスイソブチロニトリル、2,2’-アゾビス(2-メチルブチロニトリル)、1,1’-アゾビス(シクロヘキサン-1-カルボニトリル)、2,2’-アゾビス(2,4-ジメチルバレロニトリル)、2,2’-アゾビス(2,4-ジメチル-4-メトキシバレロニトリル)、ジメチル-2,2’-アゾビス(2-メチルプロピオネート)、2,2’-アゾビス(2-ヒドロキシメチルプロピオニトリル)などのアゾ系化合物;ラウリルパーオキサイド、t-ブチルハイドロパーオキサイド、過酸化ベンゾイル、t-ブチルパーオキシベンゾエート、クメンハイドロパーオキサイド、ジイソプロピルパーオキシジカーボネート、ジプロピルパーオキシジカーボネート、t-ブチルパーオキシネオデカノエート、t-ブチルパーオキシピバレート、(3,5,5-トリメチルヘキサノイル)パーオキサイドなどの有機過酸化物;過硫酸カリウム、過硫酸アンモニウム、過酸化水素などの無機過酸化物などが挙げられる。また、過酸化物と還元剤とを併用したレドックス系開始剤なども使用できる。
As a polymerization initiator, a thermal polymerization initiator, a photopolymerization initiator, etc. are used. As the photopolymerization initiator, 4- (2-hydroxyethoxy) phenyl (2-hydroxy-2-propyl) ketone and the like can be mentioned. As a thermal polymerization initiator, 2,2'-azobisisobutyronitrile, 2,2'-azobis (2-methylbutyronitrile), 1,1'-azobis (cyclohexane-1-carbonitrile), 2 2,2'-azobis (2,4-dimethylvaleronitrile), 2,2'-azobis (2,4-dimethyl-4-methoxyvaleronitrile), dimethyl-2,2'-azobis (2-methyl propionate) Azo compounds such as 2,2'-azobis (2-hydroxymethylpropionitrile); lauryl peroxide, t-butyl hydroperoxide, benzoyl peroxide, t-butyl peroxybenzoate, cumene hydroperoxide, Diisopropyl peroxy dicarbonate, dipropyl peroxy dicarbonate, t-butyl peroxy neode Organic peroxides such as noates, t-butylperoxypivalate, (3,5,5-trimethylhexanoyl) peroxide; inorganic peroxides such as potassium persulfate, ammonium persulfate, hydrogen peroxide and the like . In addition, a redox initiator in which a peroxide and a reducing agent are used in combination can also be used.
重合開始剤の割合は、(メタ)アクリル系樹脂を構成する単量体の総量100質量部に対して、0.001~5質量部程度である。(メタ)アクリル系樹脂の重合は、活性エネルギー線(例えば紫外線など)による重合法を使用してもよい。
The proportion of the polymerization initiator is about 0.001 to 5 parts by mass with respect to 100 parts by mass of the total of the monomers constituting the (meth) acrylic resin. The polymerization of the (meth) acrylic resin may be carried out by a polymerization method using active energy rays (for example, ultraviolet rays and the like).
有機溶媒としては、トルエン、キシレンなどの芳香族炭化水素類;酢酸エチル、酢酸ブチルなどのエステル類;プロピルアルコール、イソプロピルアルコールなどの脂肪族アルコール類;アセトン、メチルエチルケトン、メチルイソブチルケトンなどのケトン類などが挙げられる。
Organic solvents include aromatic hydrocarbons such as toluene and xylene; esters such as ethyl acetate and butyl acetate; aliphatic alcohols such as propyl alcohol and isopropyl alcohol; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone Can be mentioned.
(メタ)アクリル系樹脂(A)の含有量は、粘着剤組成物100質量%中、通常60質量%~99.9質量%であり、好ましくは70質量%~99.5質量%であり、より好ましくは80質量%~99質量%である。
The content of the (meth) acrylic resin (A) is usually 60% by mass to 99.9% by mass, preferably 70% by mass to 99.5% by mass in 100% by mass of the pressure-sensitive adhesive composition. More preferably, it is 80% by mass to 99% by mass.
粘着剤組成物は、架橋剤(B)を含むことができる。該架橋剤(B)は、(メタ)アクリル系樹脂(A)中の極性官能基(例えばヒドロキシ基、アミノ基、カルボキシル基、複素環基等)と反応する。架橋剤(B)は(メタ)アクリル系樹脂(A)等と架橋構造を形成し、耐久性やリワーク性に有利な架橋構造を形成する。
The pressure-sensitive adhesive composition can contain a crosslinking agent (B). The crosslinking agent (B) reacts with polar functional groups (for example, hydroxy group, amino group, carboxyl group, heterocyclic group, etc.) in the (meth) acrylic resin (A). The crosslinking agent (B) forms a crosslinked structure with a (meth) acrylic resin (A) or the like to form a crosslinked structure that is advantageous for durability and reworkability.
架橋剤(B)としては、イソシアネート系架橋剤、エポキシ系架橋剤、アジリジン系架橋剤、金属キレート系架橋剤等が挙げられ、特に粘着剤組成物のポットライフ及び粘着剤層の耐久性、架橋速度などの観点から、イソシアネート系架橋剤であることが好ましい。
Examples of the crosslinking agent (B) include isocyanate-based crosslinking agents, epoxy-based crosslinking agents, aziridine-based crosslinking agents, metal chelate-based crosslinking agents, etc. In particular, the pot life of the pressure-sensitive adhesive composition and the durability of the pressure-sensitive adhesive layer, crosslinking It is preferable that it is an isocyanate type crosslinking agent from a viewpoint of speed etc.
イソシアネート系化合物としては、分子内に少なくとも2個のイソシアナト基(-NCO)を有する化合物が好ましく、例えば、脂肪族イソシアネート系化合物(例えばヘキサメチレンジイソシアネートなど)、脂環族イソシアネート系化合物(例えばイソホロンジイソシアネート、水添ジフェニルメタンジイソシアネート、水添キシリレンジイソシアネート)、芳香族イソシアネート系化合物(例えばトリレンジイソシアネート、キシリレンジイソシアネートジフェニルメタンジイソシアネート、ナフタレンジイソシアネート、トリフェニルメタントリイソシアネート等)などが挙げられる。また架橋剤(B)は、前記イソシアネート化合物の多価アルコール化合物による付加体(アダクト体)[例えば、グリセロール、トリメチロールプロパンなどによる付加体]、イソシアヌレート化物、ビュレット型化合物、ポリエーテルポリオール、ポリエステルポリオール、アクリルポリオール、ポリブタジエンポリオール、ポリイソプレンポリオール等と付加反応させたウレタンプレポリマー型のイソシアネート化合物などの誘導体であってもよい。架橋剤(B)は単独又は二種以上組み合わせて使用できる。これらのうち、代表的には芳香族イソシアネート系化合物(例えばトリレンジイソシアネート、キシリレンジイソシアネート)、脂肪族イソシアネート系化合物(例えばヘキサメチレンジイソシアネート)又はこれらの多価アルコール化合物(例えば、グリセロール、トリメチロールプロパン)による付加体、又はイソシアヌレート体が挙げられる。架橋剤(B)が、芳香族イソシアネート系化合物及び/又はこれらの多価アルコール化合物、又はイソシアヌレート体による付加体であると、最適な架橋密度(又は架橋構造)の形成に有利なためか、粘着剤層の耐久性を向上できる。特に、トリレンジイソシアネート系化合物及び/又はこれらの多価アルコール化合物による付加体であると、例えば粘着剤層を偏光板に適用した場合等であっても耐久性を向上することができる。
As the isocyanate compound, a compound having at least two isocyanato groups (-NCO) in the molecule is preferable. For example, aliphatic isocyanate compounds (for example, hexamethylene diisocyanate etc.), alicyclic isocyanate compounds (for example isophorone diisocyanate) And hydrogenated diphenylmethane diisocyanate, hydrogenated xylylene diisocyanate), aromatic isocyanate compounds (eg, tolylene diisocyanate, xylylene diisocyanate diphenylmethane diisocyanate, naphthalene diisocyanate, triphenylmethane triisocyanate, etc.) and the like. The crosslinking agent (B) may be an adduct of the above-mentioned isocyanate compound with a polyhydric alcohol compound (adduct) [for example, an adduct of glycerol, trimethylolpropane etc.], isocyanurate, burette type compound, polyether polyol, polyester It may be a derivative such as a urethane prepolymer type isocyanate compound which is addition-reacted with a polyol, an acrylic polyol, a polybutadiene polyol, a polyisoprene polyol or the like. The crosslinking agents (B) can be used alone or in combination of two or more. Among these, typically, aromatic isocyanate compounds (eg, tolylene diisocyanate, xylylene diisocyanate), aliphatic isocyanate compounds (eg, hexamethylene diisocyanate) or polyhydric alcohol compounds thereof (eg, glycerol, trimethylolpropane) And adducts thereof, or isocyanurates. If the crosslinking agent (B) is an adduct of an aromatic isocyanate compound and / or a polyhydric alcohol compound thereof or an isocyanurate, it is advantageous for the formation of an optimal crosslinking density (or crosslinked structure), The durability of the pressure-sensitive adhesive layer can be improved. In particular, when it is an adduct of a tolylene diisocyanate compound and / or a polyhydric alcohol compound thereof, the durability can be improved even when, for example, the pressure-sensitive adhesive layer is applied to a polarizing plate.
架橋剤(B)の含有量は、樹脂(A)(好ましくは(メタ)アクリル系樹脂(A))100質量部に対して、通常0.01~15質量部であり、好ましくは0.05~10質量部であり、より好ましくは0.1~5質量部である。
The content of the crosslinking agent (B) is usually 0.01 to 15 parts by mass, preferably 0.05 based on 100 parts by mass of the resin (A) (preferably (meth) acrylic resin (A)). The amount is about 10 parts by mass, more preferably 0.1 to 5 parts by mass.
シラン化合物(D)としては、例えば、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルトリス(2-メトキシエトキシ)シラン、3-グリシドキシプロピルトリメトキシシラン、3-グリシドキシプロピルトリエトキシシラン、3-グリシドキシプロピルメチルジメトキシシラン、3-グリシドキシプロピルエトキシジメチルシラン、2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、3-クロロプロピルメチルジメトキシシラン、3-クロロプロピルトリメトキシシラン、3-メタクリロイルオキシプロピルトリメトキシシラン、3-メルカプトプロピルトリメトキシシラン等が挙げられる。
シラン化合物(D)は、シリコーンオリゴマーであってもよい。シリコーンオリゴマーの具体例を、モノマー同士の組み合わせの形で表記すると次のとおりである。 Examples of the silane compound (D) include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3 -Glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylethoxydimethylsilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, Examples thereof include 3-methacryloyloxypropyltrimethoxysilane and 3-mercaptopropyltrimethoxysilane.
The silane compound (D) may be a silicone oligomer. The specific example of the silicone oligomer is as follows, in the form of a combination of monomers.
シラン化合物(D)は、シリコーンオリゴマーであってもよい。シリコーンオリゴマーの具体例を、モノマー同士の組み合わせの形で表記すると次のとおりである。 Examples of the silane compound (D) include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3 -Glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylethoxydimethylsilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, Examples thereof include 3-methacryloyloxypropyltrimethoxysilane and 3-mercaptopropyltrimethoxysilane.
The silane compound (D) may be a silicone oligomer. The specific example of the silicone oligomer is as follows, in the form of a combination of monomers.
3-メルカプトプロピルトリメトキシシラン-テトラメトキシシランオリゴマー、3-メルカプトプロピルトリメトキシシラン-テトラエトキシシランオリゴマー、3-メルカプトプロピルトリエトキシシラン-テトラメトキシシランオリゴマー、3-メルカプトプロピルトリエトキシシラン-テトラエトキシシランオリゴマー等のメルカプトプロピル基含有オリゴマー;メルカプトメチルトリメトキシシラン-テトラメトキシシランオリゴマー、メルカプトメチルトリメトキシシラン-テトラエトキシシランオリゴマー、メルカプトメチルトリエトキシシラン-テトラメトキシシランオリゴマー、メルカプトメチルトリエトキシシラン-テトラエトキシシランオリゴマー等のメルカプトメチル基含有オリゴマー;3-グリジドキシプロピルトリメトキシシラン-テトラメトキシシランコポリマー、3-グリジドキシプロピルトリメトキシシラン-テトラエトキシシランコポリマー、3-グリジドキシプロピルトリエトキシシラン-テトラメトキシシランコポリマー、3-グリジドキシプロピルトリエトキシシラン-テトラエトキシシランコポリマー、3-グリジドキシプロピルメチルジメトキシシラン-テトラメトキシシランコポリマー、3-グリジドキシプロピルメチルジメトキシシラン-テトラエトキシシランコポリマー、3-グリジドキシプロピルメチルジエトキシシラン-テトラメトキシシランコポリマー、3-グリジドキシプロピルメチルジエトキシシラン-テトラエトキシシランコポリマー等の3-グリジドキシプロピル基含有のコポリマー;3-メタクリロイルオキシプロピルトリメトキシシラン-テトラメトキシシランオリゴマー、3-メタクリロイルオキシプロピルトリメトキシシラン-テトラエトキシシランオリゴマー、3-メタクリロイルオキシプロピルトリエトキシシラン-テトラメトキシシランオリゴマー、3-メタクリロイルオキシプロピルトリエトキシシラン-テトラエトキシシランオリゴマー、3-メタクリロイルオキシプロピルメチルジメトキシシラン-テトラメトキシシランオリゴマー、3-メタクリロイルオキシプロピルメチルジメトキシシラン-テトラエトキシシランオリゴマー、3-メタクリロイルオキシプロピルメチルジエトキシシラン-テトラメトキシシランオリゴマー、3-メタクリロイルオキシプロピルメチルジエトキシシラン-テトラエトキシシランオリゴマー等のメタクリロイルオキシプロピル基含有オリゴマー;3-アクリロイルオキシプロピルトリメトキシシラン-テトラメトキシシランオリゴマー、3-アクリロイルオキシプロピルトリメトキシシラン-テトラエトキシシランオリゴマー、3-アクリロイルオキシプロピルトリエトキシシラン-テトラメトキシシランオリゴマー、3-アクリロイルオキシプロピルトリエトキシシラン-テトラエトキシシランオリゴマー、3-アクリロイルオキシプロピルメチルジメトキシシラン-テトラメトキシシランオリゴマー、3-アクリロイルオキシプロピルメチルジメトキシシラン-テトラエトキシシランオリゴマー、3-アクリロイルオキシプロピルメチルジエトキシシラン-テトラメトキシシランオリゴマー、3-アクリロイルオキシプロピルメチルジエトキシシラン-テトラエトキシシランオリゴマー等のアクリロイルオキシプロピル基含有オリゴマー;ビニルトリメトキシシラン-テトラメトキシシランオリゴマー、ビニルトリメトキシシラン-テトラエトキシシランオリゴマー、ビニルトリエトキシシラン-テトラメトキシシランオリゴマー、ビニルトリエトキシシラン-テトラエトキシシランオリゴマー、ビニルメチルジメトキシシラン-テトラメトキシシランオリゴマー、ビニルメチルジメトキシシラン-テトラエトキシシランオリゴマー、ビニルメチルジエトキシシラン-テトラメトキシシランオリゴマー、ビニルメチルジエトキシシラン-テトラエトキシシランオリゴマー等のビニル基含有オリゴマー;3-アミノプロピルトリメトキシシラン-テトラメトキシシランコポリマー、3-アミノプロピルトリメトキシシラン-テトラエトキシシランコポリマー、3-アミノプロピルトリエトキシシラン-テトラメトキシシランコポリマー、3-アミノプロピルトリエトキシシラン-テトラエトキシシランコポリマー、3-アミノプロピルメチルジメトキシシラン-テトラメトキシシランコポリマー、3-アミノプロピルメチルジメトキシシラン-テトラエトキシシランコポリマー、3-アミノプロピルメチルジエトキシシラン-テトラメトキシシランコポリマー、3-アミノプロピルメチルジエトキシシラン-テトラエトキシシランコポリマー等のアミノ基含有のコポリマーなど。
3-mercaptopropyltrimethoxysilane-tetramethoxysilane oligomer, 3-mercaptopropyltrimethoxysilane-tetraethoxysilane oligomer, 3-mercaptopropyltriethoxysilane-tetramethoxysilane oligomer, 3-mercaptopropyltriethoxysilane-tetraethoxysilane Oligomers containing mercaptopropyl group-containing oligomers; mercaptomethyltrimethoxysilane-tetramethoxysilane oligomers, mercaptomethyltrimethoxysilane-tetraethoxysilane oligomers, mercaptomethyltriethoxysilane-tetramethoxysilane oligomers, mercaptomethyltriethoxysilane-tetraethoxy Mercaptomethyl group-containing oligomers such as silane oligomers; 3-glycidoxypropyl Trimethoxysilane-tetramethoxysilane copolymer, 3-glycidoxypropyltrimethoxysilane-tetraethoxysilane copolymer, 3-glycidoxypropyltriethoxysilane-tetramethoxysilane copolymer, 3-glycidoxypropyltriethoxysilane-tetra Ethoxysilane copolymer, 3-glycidoxypropylmethyldimethoxysilane-tetramethoxysilane copolymer, 3-glycidoxypropylmethyldimethoxysilane-tetraethoxysilane copolymer, 3-glycidoxypropylmethyldiethoxysilane-tetramethoxysilane copolymer, Copolymers containing 3-glycidoxypropyl group such as 3-glycidoxypropylmethyldiethoxysilane-tetraethoxysilane copolymer; 3-methacryloyl Xylpropyltrimethoxysilane-tetramethoxysilane oligomer, 3-methacryloyloxypropyltrimethoxysilane-tetraethoxysilane oligomer, 3-methacryloyloxypropyltriethoxysilane-tetramethoxysilane oligomer, 3-methacryloyloxypropyltriethoxysilane-tetraethoxy Silane oligomers, 3-methacryloyloxypropylmethyldimethoxysilane-tetramethoxysilane oligomer, 3-methacryloyloxypropylmethyldimethoxysilane-tetraethoxysilane oligomer, 3-methacryloyloxypropylmethyldiethoxysilane-tetramethoxysilane oligomer, 3-methacryloyloxy Propylmethyldiethoxysilane-tetraethoxysilane oligomer Etc .; 3-acryloyloxypropyltrimethoxysilane-tetramethoxysilane oligomer, 3-acryloyloxypropyltrimethoxysilane-tetraethoxysilane oligomer, 3-acryloyloxypropyltriethoxysilane-tetramethoxysilane oligomer , 3-acryloyloxypropyltriethoxysilane-tetraethoxysilane oligomer, 3-acryloyloxypropylmethyldimethoxysilane-tetramethoxysilane oligomer, 3-acryloyloxypropylmethyldimethoxysilane-tetraethoxysilane oligomer, 3-acryloyloxypropylmethyldi Ethoxysilane-tetramethoxysilane oligomer, 3-acryloyloxypropyl Acryloyloxypropyl group-containing oligomers such as chilldiethoxysilane-tetraethoxysilane oligomers; vinyltrimethoxysilane-tetramethoxysilane oligomers, vinyltrimethoxysilane-tetraethoxysilane oligomers, vinyltriethoxysilane-tetramethoxysilane oligomers, vinyltrimethoxysilane oligomers Ethoxysilane-tetraethoxysilane oligomer, vinylmethyldimethoxysilane-tetramethoxysilane oligomer, vinylmethyldimethoxysilane-tetraethoxysilane oligomer, vinylmethyldiethoxysilane-tetramethoxysilane oligomer, vinylmethyldiethoxysilane-tetraethoxysilane oligomer, etc. -Containing oligomers of vinyl; 3-aminopropyltrimethoxysilane-tetramethoxysilane Polymer, 3-aminopropyltrimethoxysilane-tetraethoxysilane copolymer, 3-aminopropyltriethoxysilane-tetramethoxysilane copolymer, 3-aminopropyltriethoxysilane-tetraethoxysilane copolymer, 3-aminopropylmethyldimethoxysilane-tetra Amino group-containing such as methoxysilane copolymer, 3-aminopropylmethyldimethoxysilane-tetraethoxysilane copolymer, 3-aminopropylmethyldiethoxysilane-tetramethoxysilane copolymer, 3-aminopropylmethyldiethoxysilane-tetraethoxysilane copolymer, etc. Copolymer etc.
シラン化合物(D)は、下記式(d1)で表されるシラン化合物であってもよい。粘着剤組成物が下記式(d1)で表されるシラン化合物を含むと、密着性(又は接着性)をさらに向上できるため、耐剥がれ性に良好な粘着剤層を形成できる。特に、高温環境下で、粘着剤層を透明電極やガラスに適用(又は積層)した場合においても、密着性(又は接着性)を維持でき、高い耐久性を示すことができる。
The silane compound (D) may be a silane compound represented by the following formula (d1). When the pressure-sensitive adhesive composition contains a silane compound represented by the following formula (d1), the adhesion (or adhesion) can be further improved, so that a pressure-sensitive adhesive layer having excellent peel resistance can be formed. In particular, even when the pressure-sensitive adhesive layer is applied (or laminated) to a transparent electrode or glass under a high temperature environment, adhesion (or adhesiveness) can be maintained and high durability can be exhibited.
(式中、Bは、炭素数1~20のアルカンジイル基又は炭素数3~20の二価の脂環式炭化水素基を示し、前記アルカンジイル基及びR前記脂環式炭化水素基を構成する-CH2-は、-O-又は-CO-に置換されてもよく、R7は炭素数1~5のアルキル基を示し、Rd8、Rd9、Rd10、Rd11及びRd12はそれぞれ独立して、炭素数1~5のアルキル基又は炭素数1~5のアルコキシ基を示す)
(Wherein, B represents an alkanediyl group having 1 to 20 carbon atoms or a divalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, and the alkanediyl group and R constituting the alicyclic hydrocarbon group are constituted -CH 2- may be substituted by -O- or -CO-, R 7 represents an alkyl group having 1 to 5 carbon atoms, and R d8 , R d9 , R d10 , R d11 and R d12 are Each independently represents an alkyl group of 1 to 5 carbon atoms or an alkoxy group of 1 to 5 carbon atoms)
式(d1)において、Bは、メチレン基、エチレン基、トリメチレン基、テトラメチレン基、ヘキサメチレン基、ヘプタメチレン基、オクタメチレン基などの炭素数1~20のアルカンジイル基;シクロブチレン基(例えば1,2-シクロブチレン基)、シクロペンチレン基(例えば1,2-シクロペンチレン基)、シクロヘキシレン基(例えば1,2-シクロへキシレン基)、シクロオクチレン基(例えば1,2-シクロオクチレン基)などの炭素数3~20の二価の脂環式炭化水素基、又はこれらのアルカンジイル基及び前記脂環式炭化水素基を構成する-CH2-が、-O-又は-CO-に置換された基を示す。好ましいBは、炭素数1~10のアルカンジイル基である。Rd7はメチル基、エチル基、プロピル基、イソプロピル基、ブチル基、s-ブチル基、t-ブチル基、ペンチル基などの炭素数1~5のアルキル基を示し、Rd8、Rd9、Rd10、Rd11及びRd12はそれぞれ独立して、前記Rd7に例示の炭素数1~5のアルキル基、又はメトキシ基、エトキシ基、プロポキシ基、i-プロポキシ基、ブトキシ基、s-ブトキシ基、t-ブトキシ基などの炭素数1~5のアルコキシ基を示す。好ましいRd8、Rd9、Rd10、Rd11及びRd12はそれぞれ独立して炭素数1~5のアルコキシ基である。これらのシラン化合物(D)は単独又は二種以上組み合わせて使用できる。
In the formula (d1), B represents an alkanediyl group having 1 to 20 carbon atoms such as methylene group, ethylene group, trimethylene group, tetramethylene group, tetramethylene group, hexamethylene group, heptamethylene group, octamethylene group, etc .; 1,2-cyclobutylene group), cyclopentylene group (eg, 1,2-cyclopentylene group), cyclohexylene group (eg, 1,2-cyclohexylene group), cyclooctylene group (eg, 1,2-cyclobutylene group) A divalent alicyclic hydrocarbon group having a carbon number of 3 to 20, such as a cyclooctylene group), or an alkanediyl group thereof and -CH2- constituting the alicyclic hydrocarbon group is -O- or- The group substituted by CO- is shown. Preferred B is a C 1-10 alkanediyl group. R d7 represents an alkyl group having a carbon number of 1 to 5, such as methyl group, ethyl group, propyl group, isopropyl group, butyl group, s-butyl group, t-butyl group, pentyl group, etc., and R d8 , R d9 , R d10 , R d11 and R d12 are each independently an alkyl group having 1 to 5 carbon atoms exemplified for R d7 , or a methoxy group, an ethoxy group, a propoxy group, an i-propoxy group, a butoxy group or an s-butoxy group And an alkoxy group having 1 to 5 carbon atoms such as t-butoxy group. Desirable R d8 , R d9 , R d10 , R d11 and R d12 are each independently an alkoxy group having 1 to 5 carbon atoms. These silane compounds (D) can be used alone or in combination of two or more.
具体的な前記式(d1)で表されるシラン化合物としては、例えば、(トリメトキシシリル)メタン、1,2-ビス(トリメトキシシリル)エタン、1,2-ビス(トリエトキシシリル)エタン、1,3-ビス(トリメトキシシリル)プロパン、1,3-ビス(トリエトキシシリル)プロパン、1,4-ビス(トリメトキシシリル)ブタン、1,4-ビス(トリエトキシシリル)ブタン、1,5-ビス(トリメトキシシリル)ペンタン、1,5-ビス(トリエトキシシリル)ペンタン、1,6-ビス(トリメトキシシリル)ヘキサン、1,6-ビス(トリエトキシシリル)ヘキサン、1,6-ビス(トリプロポキシシリル)ヘキサン、1,8-ビス(トリメトキシシリル)オクタン、1,8-ビス(トリエトキシシリル)オクタン、1,8-ビス(トリプロポキシシリル)オクタンなどのビス(トリC1-5アルコキシシリル)C1-10アルカン;ビス(ジメトキシメチルシリル)メタン、1,2-ビス(ジメトキシメチルシリル)エタン、1,2-ビス(ジメトキシエチルシリル)エタン、1,4-ビス(ジメトキシメチルシリル)ブタン、1,4-ビス(ジメトキシエチルシリル)ブタン、1,6-ビス(ジメトキシメチルシリル)ヘキサン、1,6-ビス(ジメトキシエチルシリル)ヘキサン、1,8-ビス(ジメトキシメチルシリル)オクタン、1,8-ビス(ジメトキシエチルシリル)オクタンなどのビス(ジC1-5アルコキシC1-5アルキルシリル)C1-10アルカン;1,6-ビス(メトキシジメチルシリル)ヘキサン、1,8-ビス(メトキシジメチルシリル)オクタンなどのビス(モノC1-5アルコキシ-ジC1-5アルキルシリル)C1-10アルカンなどが挙げられる。これらのうち、1,2-ビス(トリメトキシシリル)エタン、1,3-ビス(トリメトキシシリル)プロパン、1,4-ビス(トリメトキシシリル)ブタン、1,5-ビス(トリメトキシシリル)ペンタン、1,6-ビス(トリメトキシシリル)ヘキサン、1,8-ビス(トリメトキシシリル)オクタンなどのビス(トリC1-3アルコキシシリル)C1-10アルカンが好ましく、特に、1,6-ビス(トリメトキシシリル)ヘキサン、1,8-ビス(トリメトキシシリル)オクタンが好ましい。
Specific examples of the silane compound represented by the above formula (d1) include (trimethoxysilyl) methane, 1,2-bis (trimethoxysilyl) ethane, and 1,2-bis (triethoxysilyl) ethane. 1,3-bis (trimethoxysilyl) propane, 1,3-bis (triethoxysilyl) propane, 1,4-bis (trimethoxysilyl) butane, 1,4-bis (triethoxysilyl) butane, 1,1 5-bis (trimethoxysilyl) pentane, 1,5-bis (triethoxysilyl) pentane, 1,6-bis (trimethoxysilyl) hexane, 1,6-bis (triethoxysilyl) hexane, 1,6- Bis (tripropoxysilyl) hexane, 1,8-bis (trimethoxysilyl) octane, 1,8-bis (triethoxysilyl) octane, 1,8 Bis (triC1-5alkoxysilyl) C1-10 alkanes such as bis (tripropoxysilyl) octane; bis (dimethoxymethylsilyl) methane, 1,2-bis (dimethoxymethylsilyl) ethane, 1,2-bis (dimethoxy) Ethylsilyl) ethane, 1,4-bis (dimethoxymethylsilyl) butane, 1,4-bis (dimethoxyethylsilyl) butane, 1,6-bis (dimethoxymethylsilyl) hexane, 1,6-bis (dimethoxyethylsilyl) ) Bis (di C1-5 alkoxy C1-5 alkyl silyl) C1-10 alkanes such as hexane, 1,8-bis (dimethoxymethylsilyl) octane, 1,8-bis (dimethoxyethylsilyl) octane and the like; 1,6- Bis (methoxydimethylsilyl) hexane, 1,8-bis (methoxydimethyl) Lil) bis octane (mono C1-5 alkoxy - di C1-5 alkylsilyl) such as C1-10 alkanes. Among these, 1,2-bis (trimethoxysilyl) ethane, 1,3-bis (trimethoxysilyl) propane, 1,4-bis (trimethoxysilyl) butane, 1,5-bis (trimethoxysilyl) Bis (tri C 1-3 alkoxysilyl) C 1-10 alkanes such as pentane, 1,6-bis (trimethoxysilyl) hexane, 1,8-bis (trimethoxysilyl) octane, etc. are preferred, in particular 1,6-bis. (Trimethoxysilyl) hexane and 1,8-bis (trimethoxysilyl) octane are preferred.
シラン化合物(D)の含有量は、樹脂(A)(好ましくは(メタ)アクリル系樹脂(A))100質量部に対して、通常0.01~10質量部であり、好ましくは0.03~5質量部であり、より好ましくは0.05~2質量部であり、さらに好ましくは0.1~1質量部である。上記上限値以下であると、粘着剤層からのシラン化合物(D)のブリードアウトの抑制に有利であり、上記下限値以上であると、粘着剤層と、金属層やガラス基板等との密着性(又は接着性)を向上しやすくなり、耐剥がれ性などの向上に有利である。
The content of the silane compound (D) is usually 0.01 to 10 parts by mass, preferably 0.03 based on 100 parts by mass of the resin (A) (preferably (meth) acrylic resin (A)). The amount is about 5 parts by mass, more preferably 0.05 to 2 parts by mass, and still more preferably 0.1 to 1 parts by mass. It is advantageous for suppression of the bleed-out of the silane compound (D) from an adhesive layer that it is below the said upper limit, and adhesion with an adhesive layer, a metal layer, a glass substrate, etc. being more than the said lower limit It is easy to improve the properties (or adhesion), which is advantageous for improving the peeling resistance and the like.
粘着剤組成物は、さらに帯電防止剤を含有していてもよい。
帯電防止剤としては、界面活性剤、シロキサン化合物、導電性高分子、イオン性化合物等が挙げられ、イオン性化合物であることが好ましい。イオン性化合物としては、慣用のものが挙げられる。イオン性化合物を構成するカチオン成分としては、有機カチオン、無機カチオンなどが挙げられる。有機カチオンとしては、例えばピリジニウムカチオン、ピロリジニウムカチオン、ピペリジニウムカチオン、イミダゾリウムカチオン、アンモニウムカチオン、スルホニウムカチオン、ホスホニウムカチオンなどが挙げられる。無機カチオンとしては、例えばリチウムカチオン、カリウムカチオン、ナトリウムカチオン、セシウムカチオンなどのアルカリ金属カチオン、マグネシウムカチオン、カルシウムカチオンなどのアルカリ土類金属カチオンなどが挙げられる。特に(メタ)アクリル系樹脂との相溶性の観点からピリジニウムカチオン、イミダゾリウムカチオン、ピロリジニウムカチオン、リチウムカチオン、カリウムカチオンが好ましい。イオン性化合物を構成するアニオン成分としては、無機アニオン及び有機アニオンのいずれでもよいが、帯電防止性能の点で、フッ素原子を含むアニオン成分が好ましい。フッ素原子を含むアニオン成分としては、例えばヘキサフルオロホスフェートアニオン(PF6-)、ビス(トリフルオロメタンスルホニル)イミドアニオン[(CF3SO2)2N-]、ビス(フルオロスルホニル)イミドアニオン[(FSO2)2N-]、テトラ(ペンタフルオロフェニル)ボレートアニオン[(C6F5)4B-]などが挙げられる。これらのイオン性化合物は単独又は二種以上組み合わせて使用できる。特に、ビス(トリフルオロメタンスルホニル)イミドアニオン[(CF3SO2)2N-]、ビス(フルオロスルホニル)イミドアニオン[(FSO2)2N-]、テトラ(ペンタフルオロフェニル)ボレートアニオン[(C6F5)4B-]が好ましい。
粘着剤組成物から形成される粘着剤層の帯電防止性能の経時安定性の点で、室温で固体であるイオン性化合物が好ましい。 The pressure-sensitive adhesive composition may further contain an antistatic agent.
As the antistatic agent, surfactants, siloxane compounds, conductive polymers, ionic compounds and the like can be mentioned, with preference given to ionic compounds. Examples of the ionic compound include conventional ones. As a cation component which comprises an ionic compound, an organic cation, an inorganic cation, etc. are mentioned. Examples of the organic cation include pyridinium cation, pyrrolidinium cation, piperidinium cation, imidazolium cation, ammonium cation, sulfonium cation, phosphonium cation and the like. Examples of inorganic cations include lithium cations, potassium cations, sodium cations, alkali metal cations such as cesium cations, and alkaline earth metal cations such as magnesium cations and calcium cations. In particular, pyridinium cation, imidazolium cation, pyrrolidinium cation, lithium cation and potassium cation are preferable from the viewpoint of compatibility with the (meth) acrylic resin. The anion component constituting the ionic compound may be either an inorganic anion or an organic anion, but in terms of antistatic performance, an anion component containing a fluorine atom is preferred. As an anion component containing a fluorine atom, for example, hexafluorophosphate anion (PF 6- ), bis (trifluoromethanesulfonyl) imide anion [(CF 3 SO 2 ) 2 N-], bis (fluorosulfonyl) imide anion [(FSO) 2 ) 2 N-], tetra (pentafluorophenyl) borate anion [(C 6 F 5 ) 4 B-] and the like. These ionic compounds can be used alone or in combination of two or more. In particular, bis (trifluoromethanesulfonyl) imide anion [(CF 3 SO 2 ) 2 N-], bis (fluorosulfonyl) imide anion [(FSO 2 ) 2 N-], tetra (pentafluorophenyl) borate anion [(C 6 F 5 ) 4 B-] is preferred.
The ionic compound which is solid at room temperature is preferred in view of the temporal stability of the antistatic performance of the pressure-sensitive adhesive layer formed from the pressure-sensitive adhesive composition.
帯電防止剤としては、界面活性剤、シロキサン化合物、導電性高分子、イオン性化合物等が挙げられ、イオン性化合物であることが好ましい。イオン性化合物としては、慣用のものが挙げられる。イオン性化合物を構成するカチオン成分としては、有機カチオン、無機カチオンなどが挙げられる。有機カチオンとしては、例えばピリジニウムカチオン、ピロリジニウムカチオン、ピペリジニウムカチオン、イミダゾリウムカチオン、アンモニウムカチオン、スルホニウムカチオン、ホスホニウムカチオンなどが挙げられる。無機カチオンとしては、例えばリチウムカチオン、カリウムカチオン、ナトリウムカチオン、セシウムカチオンなどのアルカリ金属カチオン、マグネシウムカチオン、カルシウムカチオンなどのアルカリ土類金属カチオンなどが挙げられる。特に(メタ)アクリル系樹脂との相溶性の観点からピリジニウムカチオン、イミダゾリウムカチオン、ピロリジニウムカチオン、リチウムカチオン、カリウムカチオンが好ましい。イオン性化合物を構成するアニオン成分としては、無機アニオン及び有機アニオンのいずれでもよいが、帯電防止性能の点で、フッ素原子を含むアニオン成分が好ましい。フッ素原子を含むアニオン成分としては、例えばヘキサフルオロホスフェートアニオン(PF6-)、ビス(トリフルオロメタンスルホニル)イミドアニオン[(CF3SO2)2N-]、ビス(フルオロスルホニル)イミドアニオン[(FSO2)2N-]、テトラ(ペンタフルオロフェニル)ボレートアニオン[(C6F5)4B-]などが挙げられる。これらのイオン性化合物は単独又は二種以上組み合わせて使用できる。特に、ビス(トリフルオロメタンスルホニル)イミドアニオン[(CF3SO2)2N-]、ビス(フルオロスルホニル)イミドアニオン[(FSO2)2N-]、テトラ(ペンタフルオロフェニル)ボレートアニオン[(C6F5)4B-]が好ましい。
粘着剤組成物から形成される粘着剤層の帯電防止性能の経時安定性の点で、室温で固体であるイオン性化合物が好ましい。 The pressure-sensitive adhesive composition may further contain an antistatic agent.
As the antistatic agent, surfactants, siloxane compounds, conductive polymers, ionic compounds and the like can be mentioned, with preference given to ionic compounds. Examples of the ionic compound include conventional ones. As a cation component which comprises an ionic compound, an organic cation, an inorganic cation, etc. are mentioned. Examples of the organic cation include pyridinium cation, pyrrolidinium cation, piperidinium cation, imidazolium cation, ammonium cation, sulfonium cation, phosphonium cation and the like. Examples of inorganic cations include lithium cations, potassium cations, sodium cations, alkali metal cations such as cesium cations, and alkaline earth metal cations such as magnesium cations and calcium cations. In particular, pyridinium cation, imidazolium cation, pyrrolidinium cation, lithium cation and potassium cation are preferable from the viewpoint of compatibility with the (meth) acrylic resin. The anion component constituting the ionic compound may be either an inorganic anion or an organic anion, but in terms of antistatic performance, an anion component containing a fluorine atom is preferred. As an anion component containing a fluorine atom, for example, hexafluorophosphate anion (PF 6- ), bis (trifluoromethanesulfonyl) imide anion [(CF 3 SO 2 ) 2 N-], bis (fluorosulfonyl) imide anion [(FSO) 2 ) 2 N-], tetra (pentafluorophenyl) borate anion [(C 6 F 5 ) 4 B-] and the like. These ionic compounds can be used alone or in combination of two or more. In particular, bis (trifluoromethanesulfonyl) imide anion [(CF 3 SO 2 ) 2 N-], bis (fluorosulfonyl) imide anion [(FSO 2 ) 2 N-], tetra (pentafluorophenyl) borate anion [(C 6 F 5 ) 4 B-] is preferred.
The ionic compound which is solid at room temperature is preferred in view of the temporal stability of the antistatic performance of the pressure-sensitive adhesive layer formed from the pressure-sensitive adhesive composition.
帯電防止剤の含有量は、樹脂(A)(好ましくは(メタ)アクリル系樹脂(A))100質量部に対して、例えば、0.01~20質量部、好ましくは0.1~10質量部、さらに好ましくは1~7質量である。
The content of the antistatic agent is, for example, 0.01 to 20 parts by mass, preferably 0.1 to 10 parts by mass, with respect to 100 parts by mass of the resin (A) (preferably (meth) acrylic resin (A)). Part, more preferably 1 to 7 mass.
粘着剤組成物は、溶剤、架橋触媒、タッキファイヤー、可塑剤、軟化剤、顔料、防錆剤、無機フィラー、光散乱性微粒子等の添加剤を1種又は2種以上含有することができる。
The pressure-sensitive adhesive composition can contain one or more additives such as a solvent, a crosslinking catalyst, a tackifier, a plasticizer, a softener, a pigment, a rust inhibitor, an inorganic filler, and light scattering fine particles.
本発明の光学フィルムは、2種以上の光選択吸収層を有していてもよい。2種以上の光選択吸収層を有する場合、少なくとも1つは光選択吸収機能を有する粘着剤層であることが好ましい。
The optical film of the present invention may have two or more types of light selective absorption layers. When having two or more types of light selective absorption layers, it is preferable that at least one is a pressure sensitive adhesive layer having a light selective absorption function.
<酸素遮蔽層>
酸素遮蔽層は、上記式(2)を満たす。
酸素遮蔽層の厚みは、通常0.1μm~500μmであり、好ましくは1μm~200μmであり、より好ましくは5μm~100μmであり、特に好ましくは5μm~50μmである。
本発明の光学フィルムは、2種以上の酸素遮蔽層を有していてもよい。2種以上の酸素遮蔽層を有する場合、その合計の厚みは、通常0.2μm~500μmであり、好ましくは1μm~200μmである。また、2種以上の酸素遮蔽層を有する場合、2種以上の酸素遮蔽層の合計が上記式(2)を満たせばよく、それぞれの酸素遮蔽層が上記式(2)を満たす層であることが好ましい。 <Oxygen shielding layer>
The oxygen shielding layer satisfies the above formula (2).
The thickness of the oxygen shielding layer is usually 0.1 μm to 500 μm, preferably 1 μm to 200 μm, more preferably 5 μm to 100 μm, and particularly preferably 5 μm to 50 μm.
The optical film of the present invention may have two or more oxygen shielding layers. When two or more oxygen shielding layers are provided, the total thickness thereof is usually 0.2 μm to 500 μm, preferably 1 μm to 200 μm. Moreover, when it has 2 or more types of oxygen shielding layers, the sum total of 2 or more types of oxygen shielding layers should just satisfy | fill said Formula (2), and each oxygen shielding layer is a layer which satisfy | fills said Formula (2) Is preferred.
酸素遮蔽層は、上記式(2)を満たす。
酸素遮蔽層の厚みは、通常0.1μm~500μmであり、好ましくは1μm~200μmであり、より好ましくは5μm~100μmであり、特に好ましくは5μm~50μmである。
本発明の光学フィルムは、2種以上の酸素遮蔽層を有していてもよい。2種以上の酸素遮蔽層を有する場合、その合計の厚みは、通常0.2μm~500μmであり、好ましくは1μm~200μmである。また、2種以上の酸素遮蔽層を有する場合、2種以上の酸素遮蔽層の合計が上記式(2)を満たせばよく、それぞれの酸素遮蔽層が上記式(2)を満たす層であることが好ましい。 <Oxygen shielding layer>
The oxygen shielding layer satisfies the above formula (2).
The thickness of the oxygen shielding layer is usually 0.1 μm to 500 μm, preferably 1 μm to 200 μm, more preferably 5 μm to 100 μm, and particularly preferably 5 μm to 50 μm.
The optical film of the present invention may have two or more oxygen shielding layers. When two or more oxygen shielding layers are provided, the total thickness thereof is usually 0.2 μm to 500 μm, preferably 1 μm to 200 μm. Moreover, when it has 2 or more types of oxygen shielding layers, the sum total of 2 or more types of oxygen shielding layers should just satisfy | fill said Formula (2), and each oxygen shielding layer is a layer which satisfy | fills said Formula (2) Is preferred.
酸素遮蔽層は、ポリエステル系樹脂(E)、ポリビニルアルコール系樹脂(F)、ポリアミド系樹脂(G)、ポリイミド系樹脂(H)及びセルロース系樹脂(I)から選ばれる少なくとも1種の樹脂から形成される樹脂層であることが好ましい。
The oxygen shielding layer is formed of at least one resin selected from polyester resin (E), polyvinyl alcohol resin (F), polyamide resin (G), polyimide resin (H) and cellulose resin (I). It is preferable that it is a resin layer.
ポリエステル系樹脂(E)は、主鎖にエステル結合の繰り返し単位を持つ重合体樹脂であり、一般的には多価カルボン酸またはその誘導体と多価アルコールまたはその誘導体との縮合重合によって得られる。
ポリエステルを与える多価カルボン酸またはその誘導体としては、テレフタル酸、イソフタル酸、フタル酸、2,6-ナフタレンジカルボン酸、ジフェニルジカルボン酸、ジフェニルスルホンジカルボン酸、ジフェノキシエタンジカルボン酸、5-ナトリウムスルホンジカルボン酸などの芳香族ジカルボン酸、シュウ酸、コハク酸、アジピン酸、セバシン酸、ダイマー酸、マレイン酸、フマル酸などの脂肪族ジカルボン酸、1,4-シクロヘキサンジカルボン酸などの脂環族ジカルボン酸、パラオキシ安息香酸などのオキシカルボン酸、並びに、それらの誘導体を挙げることができる。ジカルボン酸の誘導体としてはたとえばテレフタル酸ジメチル、テレフタル酸ジエチル、テレフタル酸2-ヒドロキシエチルメチルエステル、2,6-ナフタレンジカルボン酸ジメチル、イソフタル酸ジメチル、アジピン酸ジメチル、マレイン酸ジエチル、ダイマー酸ジメチルなどのエステル化物を挙げることができる。中でも、成型性、取り扱い性の点で、テレフタル酸、イソフタル酸、2,6-ナフタレンジカルボン酸、1,4-シクロヘキサンジカルボン酸、および、それらのエステル化物が好ましく用いられる。
ポリエステルを与える多価アルコールまたはその誘導体としては、エチレングリコール、ジエチレングリコール、1,2-プロパンジオール、1,3-プロパンジオール、1,3-ブタンジオール、1,4-ブタンジオール、1,5-ペンタンジオール、1,6-ヘキサンジオール、ネオペンチルグリコールなどの脂肪族ジヒドロキシ化合物、ジエチレングリコール、ポリエチレングリコール、ポリプロピレングリコール、ポリテトラメチレングリコールなどのポリオキシアルキレングリコール、1,4-シクロヘキサンジメタノール、スピログリコールなどの脂環族ジヒドロキシ化合物、ビスフェノールA、ビスフェノールSなどの芳香族ジヒドロキシ化合物、並びに、それらの誘導体が挙げられる。中でも、成型性、取り扱い性の点で、エチレングリコール、ジエチレングリコール、1,3-プロパンジオール、1,4-ブタンジオール、ネオペンチルグリコール、1,4-シクロヘキサンジメタノールが好ましく用いられる。
ポリエステル系樹脂としては、例えばポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ポリブチレンナフタレート、ポリトリメチレンテレフタレート、ポリトリメチレンナフタレート、ポリシクロへキサンジメチルテレフタレート、ポリシクロヘキサンジメチルナフタレートなどが挙げられる。これらのうち、ポリエチレンテレフタレートまたはポリエチレンナフタレートなどが好ましい。 The polyester resin (E) is a polymer resin having a repeating unit of an ester bond in the main chain, and is generally obtained by condensation polymerization of a polyvalent carboxylic acid or a derivative thereof and a polyalcohol or a derivative thereof.
Examples of polyvalent carboxylic acids or derivatives thereof which give polyesters include terephthalic acid, isophthalic acid, phthalic acid, 2,6-naphthalene dicarboxylic acid, diphenyl dicarboxylic acid, diphenyl sulfone dicarboxylic acid, diphenoxy ethane dicarboxylic acid, 5-sodium sulfone dicarboxylic acid Aliphatic dicarboxylic acids such as acids, oxalic acid, succinic acid, adipic acid, sebacic acid, dimer acids, aliphatic dicarboxylic acids such as maleic acid and fumaric acid, and alicyclic dicarboxylic acids such as 1,4-cyclohexanedicarboxylic acid Mention may be made of oxycarboxylic acids such as parahydroxybenzoic acid, as well as their derivatives. Examples of derivatives of dicarboxylic acid include dimethyl terephthalate, diethyl terephthalate, 2-hydroxyethyl methyl terephthalate, dimethyl 2,6-naphthalenedicarboxylate, dimethyl isophthalate, dimethyl adipate, diethyl maleate, dimethyl dimer acid, etc. Esterified products can be mentioned. Among them, terephthalic acid, isophthalic acid, 2,6-naphthalenedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, and their esterified products are preferably used in view of moldability and handleability.
As polyhydric alcohols or derivatives thereof which give polyesters, ethylene glycol, diethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,3-butanediol, 1,4-butanediol, 1,5-pentane Aliphatic dihydroxy compounds such as diol, 1,6-hexanediol, neopentyl glycol etc., polyoxyalkylene glycols such as diethylene glycol, polyethylene glycol, polypropylene glycol, polytetramethylene glycol etc., 1,4-cyclohexanedimethanol, spiro glycol etc. Alicyclic dihydroxy compounds, aromatic dihydroxy compounds such as bisphenol A and bisphenol S, and derivatives thereof can be mentioned. Among them, ethylene glycol, diethylene glycol, 1,3-propanediol, 1,4-butanediol, neopentyl glycol and 1,4-cyclohexanedimethanol are preferably used in terms of moldability and handleability.
Examples of polyester resins include polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polybutylene naphthalate, polytrimethylene terephthalate, polytrimethylene naphthalate, polycyclohexanedimethyl terephthalate, and polycyclohexanedimethyl naphthalate. Among these, polyethylene terephthalate or polyethylene naphthalate is preferable.
ポリエステルを与える多価カルボン酸またはその誘導体としては、テレフタル酸、イソフタル酸、フタル酸、2,6-ナフタレンジカルボン酸、ジフェニルジカルボン酸、ジフェニルスルホンジカルボン酸、ジフェノキシエタンジカルボン酸、5-ナトリウムスルホンジカルボン酸などの芳香族ジカルボン酸、シュウ酸、コハク酸、アジピン酸、セバシン酸、ダイマー酸、マレイン酸、フマル酸などの脂肪族ジカルボン酸、1,4-シクロヘキサンジカルボン酸などの脂環族ジカルボン酸、パラオキシ安息香酸などのオキシカルボン酸、並びに、それらの誘導体を挙げることができる。ジカルボン酸の誘導体としてはたとえばテレフタル酸ジメチル、テレフタル酸ジエチル、テレフタル酸2-ヒドロキシエチルメチルエステル、2,6-ナフタレンジカルボン酸ジメチル、イソフタル酸ジメチル、アジピン酸ジメチル、マレイン酸ジエチル、ダイマー酸ジメチルなどのエステル化物を挙げることができる。中でも、成型性、取り扱い性の点で、テレフタル酸、イソフタル酸、2,6-ナフタレンジカルボン酸、1,4-シクロヘキサンジカルボン酸、および、それらのエステル化物が好ましく用いられる。
ポリエステルを与える多価アルコールまたはその誘導体としては、エチレングリコール、ジエチレングリコール、1,2-プロパンジオール、1,3-プロパンジオール、1,3-ブタンジオール、1,4-ブタンジオール、1,5-ペンタンジオール、1,6-ヘキサンジオール、ネオペンチルグリコールなどの脂肪族ジヒドロキシ化合物、ジエチレングリコール、ポリエチレングリコール、ポリプロピレングリコール、ポリテトラメチレングリコールなどのポリオキシアルキレングリコール、1,4-シクロヘキサンジメタノール、スピログリコールなどの脂環族ジヒドロキシ化合物、ビスフェノールA、ビスフェノールSなどの芳香族ジヒドロキシ化合物、並びに、それらの誘導体が挙げられる。中でも、成型性、取り扱い性の点で、エチレングリコール、ジエチレングリコール、1,3-プロパンジオール、1,4-ブタンジオール、ネオペンチルグリコール、1,4-シクロヘキサンジメタノールが好ましく用いられる。
ポリエステル系樹脂としては、例えばポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ポリブチレンナフタレート、ポリトリメチレンテレフタレート、ポリトリメチレンナフタレート、ポリシクロへキサンジメチルテレフタレート、ポリシクロヘキサンジメチルナフタレートなどが挙げられる。これらのうち、ポリエチレンテレフタレートまたはポリエチレンナフタレートなどが好ましい。 The polyester resin (E) is a polymer resin having a repeating unit of an ester bond in the main chain, and is generally obtained by condensation polymerization of a polyvalent carboxylic acid or a derivative thereof and a polyalcohol or a derivative thereof.
Examples of polyvalent carboxylic acids or derivatives thereof which give polyesters include terephthalic acid, isophthalic acid, phthalic acid, 2,6-naphthalene dicarboxylic acid, diphenyl dicarboxylic acid, diphenyl sulfone dicarboxylic acid, diphenoxy ethane dicarboxylic acid, 5-sodium sulfone dicarboxylic acid Aliphatic dicarboxylic acids such as acids, oxalic acid, succinic acid, adipic acid, sebacic acid, dimer acids, aliphatic dicarboxylic acids such as maleic acid and fumaric acid, and alicyclic dicarboxylic acids such as 1,4-cyclohexanedicarboxylic acid Mention may be made of oxycarboxylic acids such as parahydroxybenzoic acid, as well as their derivatives. Examples of derivatives of dicarboxylic acid include dimethyl terephthalate, diethyl terephthalate, 2-hydroxyethyl methyl terephthalate, dimethyl 2,6-naphthalenedicarboxylate, dimethyl isophthalate, dimethyl adipate, diethyl maleate, dimethyl dimer acid, etc. Esterified products can be mentioned. Among them, terephthalic acid, isophthalic acid, 2,6-naphthalenedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, and their esterified products are preferably used in view of moldability and handleability.
As polyhydric alcohols or derivatives thereof which give polyesters, ethylene glycol, diethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,3-butanediol, 1,4-butanediol, 1,5-pentane Aliphatic dihydroxy compounds such as diol, 1,6-hexanediol, neopentyl glycol etc., polyoxyalkylene glycols such as diethylene glycol, polyethylene glycol, polypropylene glycol, polytetramethylene glycol etc., 1,4-cyclohexanedimethanol, spiro glycol etc. Alicyclic dihydroxy compounds, aromatic dihydroxy compounds such as bisphenol A and bisphenol S, and derivatives thereof can be mentioned. Among them, ethylene glycol, diethylene glycol, 1,3-propanediol, 1,4-butanediol, neopentyl glycol and 1,4-cyclohexanedimethanol are preferably used in terms of moldability and handleability.
Examples of polyester resins include polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polybutylene naphthalate, polytrimethylene terephthalate, polytrimethylene naphthalate, polycyclohexanedimethyl terephthalate, and polycyclohexanedimethyl naphthalate. Among these, polyethylene terephthalate or polyethylene naphthalate is preferable.
ポリビニルアルコール系樹脂(F)は、ポリ酢酸ビニル系樹脂をケン化することにより得ることができ、例えば、酢酸ビニルの単独重合体であるポリ酢酸ビニル、酢酸ビニルと共重合可能な単量体(例えば不飽和カルボン酸、オレフィン、ビニルエーテル、不飽和スルホン酸、アンモニウム基を有する(メタ)アクリルアミドなど)と酢酸ビニルとの共重合体などが挙げられる。
ポリビニルアルコール系樹脂(F)のケン化度は、85~100モル%であることが好ましく、98モル%以上であることがより好ましい。ポリビニルアルコール系樹脂(F)は変性されていてもよく、例えば、アルデヒド類で変性されたポリビニルホルマール又はポリビニルアセタールなどであってもよい。ポリビニルアルコール系樹脂の平均重合度は、通常1000~10000であり、好ましくは1500~5000である。なお、ポリビニルアルコール系樹脂の平均重合度は、JIS K 6726に準拠して求めることができる。 The polyvinyl alcohol-based resin (F) can be obtained by saponifying a polyvinyl acetate-based resin, and for example, polyvinyl acetate which is a homopolymer of vinyl acetate, a monomer copolymerizable with vinyl acetate ( For example, copolymers of unsaturated carboxylic acid, olefin, vinyl ether, unsaturated sulfonic acid, (meth) acrylamide having an ammonium group, etc.) and vinyl acetate can be mentioned.
The degree of saponification of the polyvinyl alcohol resin (F) is preferably 85 to 100 mol%, more preferably 98 mol% or more. The polyvinyl alcohol resin (F) may be modified, for example, polyvinyl formal or polyvinyl acetal modified with aldehydes. The average degree of polymerization of the polyvinyl alcohol resin is usually 1000 to 10000, preferably 1500 to 5000. In addition, the average degree of polymerization of polyvinyl alcohol-type resin can be calculated | required based on JISK6726.
ポリビニルアルコール系樹脂(F)のケン化度は、85~100モル%であることが好ましく、98モル%以上であることがより好ましい。ポリビニルアルコール系樹脂(F)は変性されていてもよく、例えば、アルデヒド類で変性されたポリビニルホルマール又はポリビニルアセタールなどであってもよい。ポリビニルアルコール系樹脂の平均重合度は、通常1000~10000であり、好ましくは1500~5000である。なお、ポリビニルアルコール系樹脂の平均重合度は、JIS K 6726に準拠して求めることができる。 The polyvinyl alcohol-based resin (F) can be obtained by saponifying a polyvinyl acetate-based resin, and for example, polyvinyl acetate which is a homopolymer of vinyl acetate, a monomer copolymerizable with vinyl acetate ( For example, copolymers of unsaturated carboxylic acid, olefin, vinyl ether, unsaturated sulfonic acid, (meth) acrylamide having an ammonium group, etc.) and vinyl acetate can be mentioned.
The degree of saponification of the polyvinyl alcohol resin (F) is preferably 85 to 100 mol%, more preferably 98 mol% or more. The polyvinyl alcohol resin (F) may be modified, for example, polyvinyl formal or polyvinyl acetal modified with aldehydes. The average degree of polymerization of the polyvinyl alcohol resin is usually 1000 to 10000, preferably 1500 to 5000. In addition, the average degree of polymerization of polyvinyl alcohol-type resin can be calculated | required based on JISK6726.
ポリアミド系樹脂(G)は、主鎖として繰り返し単位にアミド結合を含む重合体樹脂であり、例えば芳香環骨格がアミド結合により結合された芳香族ポリアミド(アラミド)や脂肪族骨格がアミド結合により結合された脂肪族ポリアミド等がある。一般的には多価カルボン酸またはその誘導体と多価アミンとの重合反応等により得ることができる。
ポリアミドを与える多価カルボン酸またはその誘導体としては、テレフタル酸クロライド、2-クロロ-テレフタル酸クロライド、イソフタル酸ジクロライド、ナフタレンジカルボニルクロライド、ビフェニルジカルボニルクロライド、ターフェニルジカルボニルクロライドなどが挙げられる。
ポリアミドを与える多価アミンとしては、例えば4,4’-ジアミノジフェニルエーテル、3,4’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルスルホン、3,3’-ジアミノジフェニルスルホン、2,2’-ジトリフルオロメチル-4,4’-ジアミノビフェニル、9,9-ビス(4-アミノフェニル)フルオレン、9,9-ビス(4-アミノ-3-メチルフェニル)フルオレン、ビス[4-(4-アミノフェノキシ)フェニル]スルホン、ビス[4-(3-アミノフェノキシ)フェニル]スルホン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン、2,2-ビス(4-アミノフェニル)ヘキサフルオロプロパンなどが挙げられるが、好ましくは4,4’-ジアミノジフェニルスルホン、3,3’-ジアミノジフェニルスルホン、2,2’-ジトリフルオロメチル-4,4’-ジアミノビフェニル、9,9-ビス(4-アミノフェニル)フルオレン、9,9-ビス(4-アミノ-3-メチルフェニル)フルオレン、1,4-シクロヘキサンジアミン、1,4-ノルボルネンジアミンが挙げられる。 The polyamide resin (G) is a polymer resin containing an amide bond in a repeating unit as a main chain, and for example, an aromatic polyamide (aramid) having an aromatic ring skeleton bonded by an amide bond or an aliphatic skeleton bonded by an amide bond Such as aliphatic polyamides. Generally, it can be obtained by the polymerization reaction of a polyvalent carboxylic acid or a derivative thereof and a polyvalent amine.
Examples of polyvalent carboxylic acids which give polyamides or derivatives thereof include terephthalic acid chloride, 2-chloro-terephthalic acid chloride, isophthalic acid dichloride, naphthalene dicarbonyl chloride, biphenyl dicarbonyl chloride, terphenyl dicarbonyl chloride and the like.
Examples of polyhydric amines giving polyamides include 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 2,2'-ditriol. Fluoromethyl-4,4'-diaminobiphenyl, 9,9-bis (4-aminophenyl) fluorene, 9,9-bis (4-amino-3-methylphenyl) fluorene, bis [4- (4-aminophenoxy) ) Phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] sulfone, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 2,2-bis (4-aminophenyl) hexafluoro Examples thereof include propane and the like, preferably 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodi Phenylsulfone, 2,2'-ditrifluoromethyl-4,4'-diaminobiphenyl, 9,9-bis (4-aminophenyl) fluorene, 9,9-bis (4-amino-3-methylphenyl) fluorene, It includes 1,4-cyclohexanediamine and 1,4-norbornene diamine.
ポリアミドを与える多価カルボン酸またはその誘導体としては、テレフタル酸クロライド、2-クロロ-テレフタル酸クロライド、イソフタル酸ジクロライド、ナフタレンジカルボニルクロライド、ビフェニルジカルボニルクロライド、ターフェニルジカルボニルクロライドなどが挙げられる。
ポリアミドを与える多価アミンとしては、例えば4,4’-ジアミノジフェニルエーテル、3,4’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルスルホン、3,3’-ジアミノジフェニルスルホン、2,2’-ジトリフルオロメチル-4,4’-ジアミノビフェニル、9,9-ビス(4-アミノフェニル)フルオレン、9,9-ビス(4-アミノ-3-メチルフェニル)フルオレン、ビス[4-(4-アミノフェノキシ)フェニル]スルホン、ビス[4-(3-アミノフェノキシ)フェニル]スルホン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン、2,2-ビス(4-アミノフェニル)ヘキサフルオロプロパンなどが挙げられるが、好ましくは4,4’-ジアミノジフェニルスルホン、3,3’-ジアミノジフェニルスルホン、2,2’-ジトリフルオロメチル-4,4’-ジアミノビフェニル、9,9-ビス(4-アミノフェニル)フルオレン、9,9-ビス(4-アミノ-3-メチルフェニル)フルオレン、1,4-シクロヘキサンジアミン、1,4-ノルボルネンジアミンが挙げられる。 The polyamide resin (G) is a polymer resin containing an amide bond in a repeating unit as a main chain, and for example, an aromatic polyamide (aramid) having an aromatic ring skeleton bonded by an amide bond or an aliphatic skeleton bonded by an amide bond Such as aliphatic polyamides. Generally, it can be obtained by the polymerization reaction of a polyvalent carboxylic acid or a derivative thereof and a polyvalent amine.
Examples of polyvalent carboxylic acids which give polyamides or derivatives thereof include terephthalic acid chloride, 2-chloro-terephthalic acid chloride, isophthalic acid dichloride, naphthalene dicarbonyl chloride, biphenyl dicarbonyl chloride, terphenyl dicarbonyl chloride and the like.
Examples of polyhydric amines giving polyamides include 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 2,2'-ditriol. Fluoromethyl-4,4'-diaminobiphenyl, 9,9-bis (4-aminophenyl) fluorene, 9,9-bis (4-amino-3-methylphenyl) fluorene, bis [4- (4-aminophenoxy) ) Phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] sulfone, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 2,2-bis (4-aminophenyl) hexafluoro Examples thereof include propane and the like, preferably 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodi Phenylsulfone, 2,2'-ditrifluoromethyl-4,4'-diaminobiphenyl, 9,9-bis (4-aminophenyl) fluorene, 9,9-bis (4-amino-3-methylphenyl) fluorene, It includes 1,4-cyclohexanediamine and 1,4-norbornene diamine.
ポリイミド系樹脂(H)としては、繰り返し単位にイミド結合を含む樹脂であり、ジアミン類とテトラカルボン酸二無水物とを出発原料として、重縮合によって得られる縮合型ポリイミドが一般的である。ジアミン類としては、芳香族ジアミン類、脂環式ジアミン類、脂肪族ジアミン類等を用いることができる。テトラカルボン酸二無水物としては、芳香族テトラカルボン酸二無水物、脂環式テトラカルボン酸二無水物、非環式脂肪族テトラカルボン酸二無水物等を用いることができる。ジアミン類及びテトラカルボン酸二無水物はそれぞれ、単独で用いてもよいし、2種以上を併用して用いてもよい。テトラカルボン酸二無水物に代えて、酸クロライド化合物等のテトラカルボン酸化合物類縁体から選ばれるテトラカルボン酸化合物を出発原料として用いてもよい。
The polyimide resin (H) is a resin having an imide bond in a repeating unit, and a condensation type polyimide obtained by polycondensation using a diamine and a tetracarboxylic acid dianhydride as a starting material is generally used. As diamines, aromatic diamines, alicyclic diamines, aliphatic diamines, etc. can be used. As tetracarboxylic acid dianhydride, aromatic tetracarboxylic acid dianhydride, alicyclic tetracarboxylic acid dianhydride, acyclic aliphatic tetracarboxylic acid dianhydride, etc. can be used. The diamines and the tetracarboxylic acid dianhydride may be used alone or in combination of two or more. Instead of tetracarboxylic acid dianhydride, a tetracarboxylic acid compound selected from tetracarboxylic acid compound analogs such as an acid chloride compound may be used as a starting material.
セルロース系樹脂(I)としては、好ましくはセルロースエステル系樹脂、すなわち、セルロースにおける水酸基の少なくとも一部が酢酸エステル化されている樹脂であり、一部が酢酸エステル化され、一部が他の酸でエステル化されている混合エステルであってもよい。セルロースエステル系樹脂は、好ましくはアセチルセルロース系樹脂である。アセチルセルロース系樹脂の具体例として、トリアセチルセルロース、ジアセチルセルロース、セルロースアセテートプロピオネート、セルロースアセテートブチレート等を挙げることができる。
アセチルセルロースの原料綿は発明協会公開技法2001-1745等で公知の木材パルプや綿リンターなどのセルロース原料を用いることができる。また、アセチルセルロースは、木材化学180~190頁(共立出版、右田他、1968年)等に記載の方法で合成することができる。 The cellulose-based resin (I) is preferably a cellulose ester-based resin, that is, a resin in which at least a part of hydroxyl groups in cellulose is acetate-esterified, a part is acetate-esterified, and a part is other acid It may be a mixed ester esterified with The cellulose ester resin is preferably an acetyl cellulose resin. Specific examples of the acetyl cellulose-based resin include triacetyl cellulose, diacetyl cellulose, cellulose acetate propionate, and cellulose acetate butyrate.
As a raw material cotton of acetyl cellulose, cellulose raw materials such as wood pulp and cotton linters which are known according to Inventive Society of Japan published technology 2001-1745 etc. can be used. In addition, acetylcellulose can be synthesized by the method described in Wood Chemistry, pp. 180-190 (Kyoritsu Shuppan, Akita et al., 1968).
アセチルセルロースの原料綿は発明協会公開技法2001-1745等で公知の木材パルプや綿リンターなどのセルロース原料を用いることができる。また、アセチルセルロースは、木材化学180~190頁(共立出版、右田他、1968年)等に記載の方法で合成することができる。 The cellulose-based resin (I) is preferably a cellulose ester-based resin, that is, a resin in which at least a part of hydroxyl groups in cellulose is acetate-esterified, a part is acetate-esterified, and a part is other acid It may be a mixed ester esterified with The cellulose ester resin is preferably an acetyl cellulose resin. Specific examples of the acetyl cellulose-based resin include triacetyl cellulose, diacetyl cellulose, cellulose acetate propionate, and cellulose acetate butyrate.
As a raw material cotton of acetyl cellulose, cellulose raw materials such as wood pulp and cotton linters which are known according to Inventive Society of Japan published technology 2001-1745 etc. can be used. In addition, acetylcellulose can be synthesized by the method described in Wood Chemistry, pp. 180-190 (Kyoritsu Shuppan, Akita et al., 1968).
これらの樹脂には、さらに、溶剤、可塑剤、有機酸、色素、帯電防止剤、界面活性剤、滑剤、難燃剤、フィラー、ゴム粒子、位相差調整剤を含んでいてもよい。
酸素遮蔽層は、これらの樹脂から公知の成形加工法を用いて形成できるフィルムであることが好ましい。成形加工法としては、圧縮成形法、トランスファー成形法、射出成形法、押出成形法、ブロー成形法、粉末成形法、FRP成形法、キャスト塗工法(例えば、流延法)、カレンダー成形法、熱プレス法等が挙げられる。 These resins may further contain a solvent, a plasticizer, an organic acid, a dye, an antistatic agent, a surfactant, a lubricant, a flame retardant, a filler, a rubber particle, and a retardation control agent.
The oxygen shielding layer is preferably a film that can be formed from these resins using a known molding process. As the molding processing method, compression molding method, transfer molding method, injection molding method, extrusion molding method, blow molding method, powder molding method, FRP molding method, cast coating method (for example, casting method), calendar molding method, heat The press method etc. may be mentioned.
酸素遮蔽層は、これらの樹脂から公知の成形加工法を用いて形成できるフィルムであることが好ましい。成形加工法としては、圧縮成形法、トランスファー成形法、射出成形法、押出成形法、ブロー成形法、粉末成形法、FRP成形法、キャスト塗工法(例えば、流延法)、カレンダー成形法、熱プレス法等が挙げられる。 These resins may further contain a solvent, a plasticizer, an organic acid, a dye, an antistatic agent, a surfactant, a lubricant, a flame retardant, a filler, a rubber particle, and a retardation control agent.
The oxygen shielding layer is preferably a film that can be formed from these resins using a known molding process. As the molding processing method, compression molding method, transfer molding method, injection molding method, extrusion molding method, blow molding method, powder molding method, FRP molding method, cast coating method (for example, casting method), calendar molding method, heat The press method etc. may be mentioned.
酸素遮蔽層は、ポリエステル系樹脂(E)、ポリビニルアルコール系樹脂(F)及びポリイミド系樹脂(H)から選ばれる少なくとも1種の樹脂から形成される層であることが好ましく、ポリビニルアルコール系樹脂から形成される偏光フィルムであることがより好ましい。
偏光フィルムは、その吸収軸に平行な振動面をもつ直線偏光を吸収し、吸収軸に直交する(透過軸と平行な)振動面をもつ直線偏光を透過する性質を有するフィルムであり、例えば、ポリビニルアルコール系樹脂フィルムに二色性色素を吸着配向させたフィルムを用いることができる。二色性色素としては、例えば、ヨウ素や二色性有機染料などが挙げられる。 The oxygen shielding layer is preferably a layer formed of at least one resin selected from polyester resin (E), polyvinyl alcohol resin (F) and polyimide resin (H), and polyvinyl alcohol resin It is more preferable that it is a polarizing film formed.
A polarizing film is a film that has the property of absorbing linearly polarized light having a vibration plane parallel to its absorption axis and transmitting linearly polarized light having a vibration plane orthogonal to the absorption axis (parallel to the transmission axis), for example, A film in which a dichroic dye is adsorbed and oriented to a polyvinyl alcohol-based resin film can be used. Examples of dichroic dyes include iodine and dichroic organic dyes.
偏光フィルムは、その吸収軸に平行な振動面をもつ直線偏光を吸収し、吸収軸に直交する(透過軸と平行な)振動面をもつ直線偏光を透過する性質を有するフィルムであり、例えば、ポリビニルアルコール系樹脂フィルムに二色性色素を吸着配向させたフィルムを用いることができる。二色性色素としては、例えば、ヨウ素や二色性有機染料などが挙げられる。 The oxygen shielding layer is preferably a layer formed of at least one resin selected from polyester resin (E), polyvinyl alcohol resin (F) and polyimide resin (H), and polyvinyl alcohol resin It is more preferable that it is a polarizing film formed.
A polarizing film is a film that has the property of absorbing linearly polarized light having a vibration plane parallel to its absorption axis and transmitting linearly polarized light having a vibration plane orthogonal to the absorption axis (parallel to the transmission axis), for example, A film in which a dichroic dye is adsorbed and oriented to a polyvinyl alcohol-based resin film can be used. Examples of dichroic dyes include iodine and dichroic organic dyes.
ポリビニルアルコール系樹脂は、ポリ酢酸ビニル系樹脂をケン化することにより得ることができる。ポリ酢酸ビニル系樹脂としては、例えば、酢酸ビニルの単独重合体であるポリ酢酸ビニル、酢酸ビニルと共重合可能な単量体(例えば不飽和カルボン酸、オレフィン、ビニルエーテル、不飽和スルホン酸、アンモニウム基を有する(メタ)アクリルアミドなど)と酢酸ビニルとの共重合体などが挙げられる。
The polyvinyl alcohol resin can be obtained by saponifying a polyvinyl acetate resin. Examples of polyvinyl acetate resins include polyvinyl acetate which is a homopolymer of vinyl acetate, a monomer copolymerizable with vinyl acetate (eg, unsaturated carboxylic acid, olefin, vinyl ether, unsaturated sulfonic acid, ammonium group) And copolymers of (meth) acrylamide and the like with vinyl acetate.
ポリビニルアルコール系樹脂のケン化度は、通常85~100モル%、好ましくは98モル%以上である。ポリビニルアルコール系樹脂は変性されていてもよく、例えば、アルデヒド類で変性されたポリビニルホルマール又はポリビニルアセタールなどであってもよい。ポリビニルアルコール系樹脂の平均重合度は、通常、1000~10000、好ましくは1500~5000である。なお、ポリビニルアルコール系樹脂の平均重合度は、JIS K 6726に準拠して求めることができる。
The degree of saponification of the polyvinyl alcohol resin is usually 85 to 100 mol%, preferably 98 mol% or more. The polyvinyl alcohol-based resin may be modified, for example, polyvinyl formal or polyvinyl acetal modified with aldehydes. The average degree of polymerization of the polyvinyl alcohol-based resin is usually 1000 to 10000, preferably 1500 to 5000. In addition, the average degree of polymerization of polyvinyl alcohol-type resin can be calculated | required based on JISK6726.
通常、ポリビニルアルコール系樹脂を製膜したものを偏光フィルムの原反フィルムとして用いる。ポリビニルアルコール系樹脂は、公知の方法で製膜することができる。原反フィルムの厚みは、通常1~150μmであり、延伸のしやすさなどを考慮すれば、好ましくは10μm以上である。
Usually, what formed polyvinyl alcohol-type resin into a film is used as a raw film of a polarizing film. The polyvinyl alcohol-based resin can be formed into a film by a known method. The thickness of the raw film is usually 1 to 150 μm, and preferably 10 μm or more in consideration of the ease of stretching and the like.
偏光フィルムは、例えば、原反フィルムに対して、一軸延伸する工程、二色性色素でフィルムを染色してその二色性色素を吸着させる工程、ホウ酸水溶液でフィルムを処理する工程、及び、フィルムを水洗する工程が施され、最後に乾燥して製造される。偏光子2の厚みは、通常1~30μmであり、粘着剤層付光学フィルム1の薄膜化の観点から、好ましくは20μm以下、さらに好ましくは15μm以下、特に10μm以下である。
The polarizing film may be, for example, uniaxially stretching a raw film, dyeing the film with a dichroic dye and adsorbing the dichroic dye, treating the film with an aqueous solution of boric acid, The film is subjected to a step of washing with water, and finally dried and manufactured. The thickness of the polarizer 2 is usually 1 to 30 μm, preferably 20 μm or less, more preferably 15 μm or less, particularly 10 μm or less from the viewpoint of thinning of the pressure-sensitive adhesive layer-carrying optical film 1.
ポリビニルアルコール系樹脂フィルムに二色性色素を吸着配向させてなる偏光子2は、原反フィルムとしてポリビニルアルコール系樹脂フィルムの単独フィルムを用い、このフィルムに対して一軸延伸処理及び二色性色素の染色処理を施す方法(方法(1)とする)のほか、基材フィルムにポリビニルアルコール系樹脂を含有する塗工液(水溶液等)を塗工、乾燥させてポリビニルアルコール系樹脂層を有する基材フィルムを得た後、これを基材フィルムごとに一軸延伸し、延伸後のポリビニルアルコール系樹脂層に対して二色性色素の染色処理を施し、次いで基材フィルムを剥離除去する方法(方法(2)とする)によっても得ることができる。基材フィルムとしては、熱可塑性樹脂からなるフィルムを用いることができ、好ましくは、ポリエチレンテレフタレートなどのポリエステル系樹脂、ポリカーボネート系樹脂、トリアセチルセルロースなどのセルロース系樹脂、ノルボルネン系樹脂などの環状ポリオレフィン系樹脂、ポリスチレン系樹脂などからなるフィルムである。上記方法(2)を利用すると、薄膜の偏光フィルムの作製が容易となり、例えば厚み7μm以下の偏光フィルムの作製であっても容易に行うことができる。
The polarizer 2 formed by adsorbing and orienting a dichroic dye to a polyvinyl alcohol-based resin film uses a single film of a polyvinyl alcohol-based resin film as a raw film, and this film is uniaxially stretched and dichromatic A substrate having a polyvinyl alcohol-based resin layer by coating and drying a coating solution (such as an aqueous solution) containing a polyvinyl alcohol-based resin on a substrate film, in addition to the method of applying a staining treatment (method (1)) After obtaining a film, this is uniaxially stretched for each base film, and the stretched polyvinyl alcohol-based resin layer is subjected to a dyeing treatment of a dichroic dye, and then the base film is peeled and removed (method (method It can also be obtained by 2). As the substrate film, a film made of a thermoplastic resin can be used, and preferably, polyester resins such as polyethylene terephthalate, polycarbonate resins, cellulose resins such as triacetyl cellulose, cyclic polyolefin resins such as norbornene resin It is a film made of a resin, a polystyrene resin, or the like. The use of the above method (2) facilitates the preparation of a thin film polarizing film, and can be easily carried out even if, for example, a polarizing film having a thickness of 7 μm or less.
偏光フィルムの少なくとも一方の面は、接着剤を介して保護フィルムが設けられていることが好ましい。
接着剤としては、公知の接着剤が用いられ、水系接着剤であってもよいし、活性エネルギー線硬化型接着剤であってもよい。 It is preferable that at least one surface of the polarizing film is provided with a protective film via an adhesive.
As the adhesive, a known adhesive may be used, which may be a water-based adhesive or an active energy ray-curable adhesive.
接着剤としては、公知の接着剤が用いられ、水系接着剤であってもよいし、活性エネルギー線硬化型接着剤であってもよい。 It is preferable that at least one surface of the polarizing film is provided with a protective film via an adhesive.
As the adhesive, a known adhesive may be used, which may be a water-based adhesive or an active energy ray-curable adhesive.
水系接着剤としては、慣用の水系接着剤(例えば、ポリビニルアルコール系樹脂水溶液からなる接着剤、水系二液型ウレタン系エマルジョン接着剤、アルデヒド化合物、エポキシ化合物、メラミン系化合物、メチロール化合物、イソシアネート化合物、アミン化合物、多価金属塩等の架橋剤など)が挙げられる。これらのうち、ポリビニルアルコール系樹脂水溶液からなる水系接着剤を好適に用いることができる。なお、水系接着剤を使用する場合は、偏光フィルムと保護フィルムとを貼合した後、水系接着剤中に含まれる水を除去するために乾燥させる工程を実施することが好ましい。乾燥工程後、例えば20~45℃程度の温度で養生する養生工程を設けてもよい。水系接着剤から形成される接着剤層は、通常0.001~5μmである。
As a water-based adhesive, a conventional water-based adhesive (for example, an adhesive comprising a polyvinyl alcohol-based resin aqueous solution, a water-based two-component urethane-based emulsion adhesive, an aldehyde compound, an epoxy compound, a melamine compound, a methylol compound, an isocyanate compound, Amine compounds, crosslinking agents such as polyvalent metal salts, etc. may be mentioned. Among these, the water-based adhesive which consists of polyvinyl alcohol-type resin aqueous solution can be used suitably. In addition, when using a water-based adhesive, after bonding a polarizing film and a protective film, it is preferable to implement the process to dry in order to remove the water contained in a water-based adhesive. After the drying step, there may be provided a curing step of curing at a temperature of about 20 to 45 ° C., for example. The adhesive layer formed from the water-based adhesive is usually 0.001 to 5 μm.
上記活性エネルギー線硬化性接着剤とは、紫外線や電子線等の活性エネルギー線を照射することで硬化する接着剤をいい、例えば、重合性化合物及び光重合開始剤を含む硬化性組成物、光反応性樹脂を含む硬化性組成物、バインダー樹脂及び光反応性架橋剤を含む硬化性組成物等が挙げられ、好ましくは紫外線硬化性接着剤である。
The above-mentioned active energy ray-curable adhesive means an adhesive which is cured by irradiation with active energy rays such as ultraviolet rays and electron beams, and for example, a curable composition containing a polymerizable compound and a photopolymerization initiator, light A curable composition containing a reactive resin, a curable composition containing a binder resin and a photoreactive crosslinking agent, and the like can be mentioned, with preference given to a UV curable adhesive.
活性エネルギー線硬化性接着剤を用いる場合は、偏光フィルムと保護フィルムとを貼合した後、必要に応じて乾燥工程を行い、次いで活性エネルギー線を照射することにより活性エネルギー線硬化性接着剤を硬化させる硬化工程を行う。活性エネルギー線の光源は特に限定されないが、波長400nm以下に発光分布を有する紫外線が好ましい。活性エネルギー線硬化性接着剤から形成される接着剤層は、通常0.1~10μmである。
When using an active energy ray-curable adhesive, after bonding a polarizing film and a protective film, a drying process is performed if necessary, and then an active energy ray-curable adhesive is obtained by irradiating an active energy ray. A curing step to cure is performed. Although the light source of the active energy ray is not particularly limited, ultraviolet light having a light emission distribution at a wavelength of 400 nm or less is preferable. The adhesive layer formed from the active energy ray-curable adhesive is usually 0.1 to 10 μm.
偏光フィルムと保護フィルムとを貼合する方法としては、これらの少なくともいずれか一方の貼合面にケン化処理、コロナ処理、プラズマ処理等の表面活性化処理を施す方法などが挙げられる。偏光フィルムの両面に保護フィルムが貼合される場合、これらの樹脂フィルムを貼合するための接着剤は、同種の接着剤あってもよいし異種の接着剤であってもよい。
As a method of bonding a polarizing film and a protective film, the method etc. of surface-activating processes, such as a saponification process, a corona treatment, a plasma treatment, etc. are mentioned to these bonding surface of at least any one of these. When protective films are bonded to both sides of a polarizing film, the adhesive for bonding these resin films may be either the same type of adhesive or different types of adhesives.
保護フィルムとしては、透光性を有する熱可塑性樹脂から形成されるフィルムであることが好ましい。具体的には、ポリオレフィン系樹脂;セルロース系樹脂;ポリエステル系樹脂;(メタ)アクリル系樹脂;又はこれらの混合物、共重合物等からなるフィルムが揚げられる。偏光フィルムの両面に保護フィルムが設けられる場合、用いられる保護フィルムは、異なる熱可塑性樹脂からなるフィルムであってもよいし、同じ熱可塑性樹脂からなるフィルムであってもよい。
保護フィルムが偏光フィルムの少なくとも一方の面に積層される場合、保護フィルムはポリオレフィン系樹脂、セルロース系樹脂からなる保護フィルムであることが好ましい。これらのフィルムを用いることで、偏光フィルムの光学特性を損なうことなく高温環境における偏光フィルムの収縮を有効に抑制することができる。なお、保護フィルムも酸素遮蔽層であってもよい。 The protective film is preferably a film formed of a translucent thermoplastic resin. Specifically, a film made of a polyolefin resin, a cellulose resin, a polyester resin, a (meth) acrylic resin, a mixture thereof, a copolymer or the like is fried. When protective films are provided on both sides of the polarizing film, the protective films used may be films made of different thermoplastic resins or may be films made of the same thermoplastic resin.
When the protective film is laminated on at least one surface of the polarizing film, the protective film is preferably a protective film made of a polyolefin resin or a cellulose resin. By using these films, the shrinkage of the polarizing film in a high temperature environment can be effectively suppressed without impairing the optical properties of the polarizing film. The protective film may also be an oxygen shielding layer.
保護フィルムが偏光フィルムの少なくとも一方の面に積層される場合、保護フィルムはポリオレフィン系樹脂、セルロース系樹脂からなる保護フィルムであることが好ましい。これらのフィルムを用いることで、偏光フィルムの光学特性を損なうことなく高温環境における偏光フィルムの収縮を有効に抑制することができる。なお、保護フィルムも酸素遮蔽層であってもよい。 The protective film is preferably a film formed of a translucent thermoplastic resin. Specifically, a film made of a polyolefin resin, a cellulose resin, a polyester resin, a (meth) acrylic resin, a mixture thereof, a copolymer or the like is fried. When protective films are provided on both sides of the polarizing film, the protective films used may be films made of different thermoplastic resins or may be films made of the same thermoplastic resin.
When the protective film is laminated on at least one surface of the polarizing film, the protective film is preferably a protective film made of a polyolefin resin or a cellulose resin. By using these films, the shrinkage of the polarizing film in a high temperature environment can be effectively suppressed without impairing the optical properties of the polarizing film. The protective film may also be an oxygen shielding layer.
偏光板の好ましい構成としては、偏光フィルムの少なくとも一方の面に接着剤層を介して保護フィルムが積層された偏光板である。保護フィルムが偏光フィルムの一方の面にしか積層されない場合、視認側に積層されることがより好ましい。視認側に積層された保護フィルムは、トリアセチルセルロース系樹脂又はシクロオレフィン系樹脂からなる保護フィルムであることが好ましい。保護フィルムは未延伸フィルムであってもよいし、任意の方向に延伸され位相差を有していてもよい。視認側に積層された保護フィルムの表面にはハードコート層やアンチグレア層などの表面処理層が設けられていてもよい。
保護フィルムが偏光フィルムの両面に積層される場合、パネル側(視認側と反対側)の保護フィルムは、トリアセチルセルロース系樹脂、シクロオレフィン系樹脂又はアクリル系樹脂からなる保護フィルム又は位相差フィルムであることが好ましい。位相差フィルムは後述するゼロレタデーションフィルムであってもよい。 A preferable configuration of the polarizing plate is a polarizing plate in which a protective film is laminated on at least one surface of a polarizing film via an adhesive layer. When the protective film is laminated on only one side of the polarizing film, it is more preferable to be laminated on the viewing side. It is preferable that the protective film laminated | stacked on the visual recognition side is a protective film which consists of triacetyl-cellulose-type resin or cycloolefin type resin. The protective film may be an unstretched film, or may be stretched in any direction and have a retardation. A surface treatment layer such as a hard coat layer or an antiglare layer may be provided on the surface of the protective film laminated on the viewing side.
When the protective film is laminated on both sides of the polarizing film, the protective film on the panel side (the opposite side to the visible side) is a protective film or a retardation film made of a triacetyl cellulose resin, a cycloolefin resin or an acrylic resin. Is preferred. The retardation film may be a zero retardation film described later.
保護フィルムが偏光フィルムの両面に積層される場合、パネル側(視認側と反対側)の保護フィルムは、トリアセチルセルロース系樹脂、シクロオレフィン系樹脂又はアクリル系樹脂からなる保護フィルム又は位相差フィルムであることが好ましい。位相差フィルムは後述するゼロレタデーションフィルムであってもよい。 A preferable configuration of the polarizing plate is a polarizing plate in which a protective film is laminated on at least one surface of a polarizing film via an adhesive layer. When the protective film is laminated on only one side of the polarizing film, it is more preferable to be laminated on the viewing side. It is preferable that the protective film laminated | stacked on the visual recognition side is a protective film which consists of triacetyl-cellulose-type resin or cycloolefin type resin. The protective film may be an unstretched film, or may be stretched in any direction and have a retardation. A surface treatment layer such as a hard coat layer or an antiglare layer may be provided on the surface of the protective film laminated on the viewing side.
When the protective film is laminated on both sides of the polarizing film, the protective film on the panel side (the opposite side to the visible side) is a protective film or a retardation film made of a triacetyl cellulose resin, a cycloolefin resin or an acrylic resin. Is preferred. The retardation film may be a zero retardation film described later.
また、酸素遮蔽層は、樹脂層に形成される表面処理層であってもよい。表面処理層としては、JIS K5600-5-4(1999)による鉛筆硬度試験(荷重4.9N)において、H以上の硬度を有するハードコート層であることが好ましく、3H以上の硬度を有するハードコート層であることがより好ましい。表面処理層は、一般的に光学フィルムの最表面に積層される。
ハードコート層は、例えば、熱硬化性組成物組成物から形成される層、活性エネルギー線(好ましくは紫外線)硬化性樹脂組成物から形成される層が挙げられ、紫外線硬化性樹脂組成物から形成される層であることが好ましい。
紫外線硬化性樹脂組成物は、紫外線の照射によりラジカル重合反応で硬化する化合物又は紫外線の照射によりカチオン重合反応で硬化する化合物を含む組成物等が挙げられ、ラジカル重合性(メタ)アクリル系化合物を含む組成物であることが好ましい。具体的には、特開2002-265650公報に記載の組成物が挙げられる。 The oxygen shielding layer may be a surface treatment layer formed on the resin layer. The surface treatment layer is preferably a hard coat layer having a hardness of H or more in a pencil hardness test (load: 4.9 N) according to JIS K 5600-5-4 (1999), and a hard coat having a hardness of 3 H or more More preferably, it is a layer. The surface treatment layer is generally laminated on the outermost surface of the optical film.
The hard coat layer includes, for example, a layer formed from a thermosetting composition composition, a layer formed from an active energy ray (preferably ultraviolet ray) curable resin composition, and formed from an ultraviolet curable resin composition It is preferable that it is a
Examples of the ultraviolet curable resin composition include a compound which is cured by radical polymerization reaction by irradiation of ultraviolet rays or a composition containing a compound which is cured by cationic polymerization reaction by irradiation of ultraviolet rays, and the radical polymerizable (meth) acrylic compound is used. It is preferable that it is a composition containing. Specifically, the composition described in JP-A-2002-265650 can be mentioned.
ハードコート層は、例えば、熱硬化性組成物組成物から形成される層、活性エネルギー線(好ましくは紫外線)硬化性樹脂組成物から形成される層が挙げられ、紫外線硬化性樹脂組成物から形成される層であることが好ましい。
紫外線硬化性樹脂組成物は、紫外線の照射によりラジカル重合反応で硬化する化合物又は紫外線の照射によりカチオン重合反応で硬化する化合物を含む組成物等が挙げられ、ラジカル重合性(メタ)アクリル系化合物を含む組成物であることが好ましい。具体的には、特開2002-265650公報に記載の組成物が挙げられる。 The oxygen shielding layer may be a surface treatment layer formed on the resin layer. The surface treatment layer is preferably a hard coat layer having a hardness of H or more in a pencil hardness test (load: 4.9 N) according to JIS K 5600-5-4 (1999), and a hard coat having a hardness of 3 H or more More preferably, it is a layer. The surface treatment layer is generally laminated on the outermost surface of the optical film.
The hard coat layer includes, for example, a layer formed from a thermosetting composition composition, a layer formed from an active energy ray (preferably ultraviolet ray) curable resin composition, and formed from an ultraviolet curable resin composition It is preferable that it is a
Examples of the ultraviolet curable resin composition include a compound which is cured by radical polymerization reaction by irradiation of ultraviolet rays or a composition containing a compound which is cured by cationic polymerization reaction by irradiation of ultraviolet rays, and the radical polymerizable (meth) acrylic compound is used. It is preferable that it is a composition containing. Specifically, the composition described in JP-A-2002-265650 can be mentioned.
<光学積層体>
本発明の光学フィルム及び本発明の光学フィルムを含む光学積層体の層構成の一例の断面模式図を図1~図4に示した。
本発明の光学フィルムは、少なくとも1層の光選択吸収層と少なくとも1層の酸素遮蔽層とを含む。本発明の光学フィルムは、例えば、図1に示されるように光選択吸収層10と酸素遮蔽層20とは直接積層されていてもよいし、光選択吸収層10と酸素遮蔽層20との間にその他の層を含んでいてもよい。
図2に記載の光学積層体1Aは、保護フィルム90、接着剤層30a、酸素遮蔽層20、接着剤層30a、保護フィルム90、光選択吸収層10が積層された光学積層体である。酸素遮蔽層20がポリビニルアルコール系樹脂フィルムから形成される偏光フィルムである場合は、図2に記載の光学積層体1Aにおける「保護フィルム90、接着剤層30a、酸素遮蔽層20、保護フィルム90」の順に積層された積層体は、偏光板100を兼ねる。なお、保護フィルム90は位相差を有する位相差フィルムであってもよいし、酸素遮蔽層であってもよい。
図3に記載の光学積層体1Bは、保護フィルム90、接着剤層30a、酸素遮蔽層20、接着剤層30a、保護フィルム90、光選択吸収層10、光学フィルム40、粘着剤層30が積層された光学積層体であって、光学フィルム40が多層構造である光学積層体である。粘着剤層30は、例えば、その他の層や液晶セルと貼合することができる。
図4に記載の光学積層体1Cは、保護フィルム90、接着剤層30a、酸素遮蔽層20、接着剤層30a、保護フィルム90、光選択吸収層10、光学フィルム40、粘着剤層30、発光素子110(液晶セル、OLEDセル)が積層された光学積層体であって、光学フィルム40が多層構造である光学積層体である。
酸素遮蔽層は、光選択吸収層よりも視認側(発光素子とは反対側)に位置することが好ましい。 <Optical laminate>
The cross-sectional schematic diagrams of an example of the layer configuration of an optical laminate of the present invention and the optical film of the present invention are shown in FIGS. 1 to 4.
The optical film of the present invention comprises at least one light selective absorption layer and at least one oxygen shielding layer. In the optical film of the present invention, for example, as shown in FIG. 1, the lightselective absorption layer 10 and the oxygen shielding layer 20 may be laminated directly, or between the light selective absorption layer 10 and the oxygen shielding layer 20. May contain other layers.
The optical laminate 1A described in FIG. 2 is an optical laminate in which aprotective film 90, an adhesive layer 30a, an oxygen shielding layer 20, an adhesive layer 30a, a protective film 90, and a light selective absorption layer 10 are laminated. When the oxygen shielding layer 20 is a polarizing film formed of a polyvinyl alcohol-based resin film, “the protective film 90, the adhesive layer 30a, the oxygen shielding layer 20, the protective film 90” in the optical laminate 1A described in FIG. The laminated body laminated | stacked in order of 1 serves as the polarizing plate 100. FIG. The protective film 90 may be a retardation film having retardation, or may be an oxygen shielding layer.
The optical laminated body 1B described in FIG. 3 has aprotective film 90, an adhesive layer 30a, an oxygen shielding layer 20, an adhesive layer 30a, a protective film 90, a light selective absorption layer 10, an optical film 40, and an adhesive layer 30 laminated. The optical laminate is an optical laminate in which the optical film 40 has a multilayer structure. The pressure-sensitive adhesive layer 30 can be bonded to, for example, another layer or a liquid crystal cell.
The optical laminate 1C described in FIG. 4 includes aprotective film 90, an adhesive layer 30a, an oxygen shielding layer 20, an adhesive layer 30a, a protective film 90, a light selective absorption layer 10, an optical film 40, an adhesive layer 30, and light emission. It is an optical laminate in which the element 110 (liquid crystal cell, OLED cell) is laminated, and the optical film 40 is a multilayer structure.
The oxygen shielding layer is preferably located on the viewing side (opposite to the light emitting element) than the light selective absorption layer.
本発明の光学フィルム及び本発明の光学フィルムを含む光学積層体の層構成の一例の断面模式図を図1~図4に示した。
本発明の光学フィルムは、少なくとも1層の光選択吸収層と少なくとも1層の酸素遮蔽層とを含む。本発明の光学フィルムは、例えば、図1に示されるように光選択吸収層10と酸素遮蔽層20とは直接積層されていてもよいし、光選択吸収層10と酸素遮蔽層20との間にその他の層を含んでいてもよい。
図2に記載の光学積層体1Aは、保護フィルム90、接着剤層30a、酸素遮蔽層20、接着剤層30a、保護フィルム90、光選択吸収層10が積層された光学積層体である。酸素遮蔽層20がポリビニルアルコール系樹脂フィルムから形成される偏光フィルムである場合は、図2に記載の光学積層体1Aにおける「保護フィルム90、接着剤層30a、酸素遮蔽層20、保護フィルム90」の順に積層された積層体は、偏光板100を兼ねる。なお、保護フィルム90は位相差を有する位相差フィルムであってもよいし、酸素遮蔽層であってもよい。
図3に記載の光学積層体1Bは、保護フィルム90、接着剤層30a、酸素遮蔽層20、接着剤層30a、保護フィルム90、光選択吸収層10、光学フィルム40、粘着剤層30が積層された光学積層体であって、光学フィルム40が多層構造である光学積層体である。粘着剤層30は、例えば、その他の層や液晶セルと貼合することができる。
図4に記載の光学積層体1Cは、保護フィルム90、接着剤層30a、酸素遮蔽層20、接着剤層30a、保護フィルム90、光選択吸収層10、光学フィルム40、粘着剤層30、発光素子110(液晶セル、OLEDセル)が積層された光学積層体であって、光学フィルム40が多層構造である光学積層体である。
酸素遮蔽層は、光選択吸収層よりも視認側(発光素子とは反対側)に位置することが好ましい。 <Optical laminate>
The cross-sectional schematic diagrams of an example of the layer configuration of an optical laminate of the present invention and the optical film of the present invention are shown in FIGS. 1 to 4.
The optical film of the present invention comprises at least one light selective absorption layer and at least one oxygen shielding layer. In the optical film of the present invention, for example, as shown in FIG. 1, the light
The optical laminate 1A described in FIG. 2 is an optical laminate in which a
The optical laminated body 1B described in FIG. 3 has a
The optical laminate 1C described in FIG. 4 includes a
The oxygen shielding layer is preferably located on the viewing side (opposite to the light emitting element) than the light selective absorption layer.
光学フィルム40は、光線を透過、反射、吸収する等の光学機能を有するフィルムであり、単層のフィルムであってもよいし、多層のフィルムであってもよい。光学フィルム40は、例えば、偏光フィルム、位相差フィルム、輝度向上フィルム、防眩フィルム、反射防止フィルム、拡散フィルム、集光フィルム、ウィンドウフィルム等が挙げられ、偏光フィルム、位相差フィルム、ウィンドウフィルムまたはこれらの積層フィルムであることが好ましい。
The optical film 40 is a film having an optical function of transmitting, reflecting, absorbing, etc. a light beam, and may be a single layer film or a multilayer film. Examples of the optical film 40 include a polarizing film, a retardation film, a brightness enhancement film, an antiglare film, an antireflective film, a diffusion film, a light collecting film, a window film, etc. A polarizing film, a retardation film, a window film or It is preferable that they are these laminated films.
位相差フィルムとは、光学異方性を示す光学フィルムであって、例えば、ポリビニルアルコール、ポリカーボネート、ポリエステル、ポリアリレート、ポリイミド、ポリオレフィン、ポリシクロオレフィン、ポリスチレン、ポリサルホン、ポリエーテルサルホン、ポリビニリデンフルオライド/ポリメチルメタクリレート、アセチルセルロース、エチレン-酢酸ビニル共重合体ケン化物、ポリ塩化ビニルなどからなる高分子フィルムを1.01~6倍程度に延伸することにより得られる延伸フィルムなどが挙げられる。中でも、ポリカーボネートフィルムやシクロオレフィン系樹脂フィルムを一軸延伸または二軸延伸した高分子フィルムであることが好ましい。なお、本明細書において、位相差フィルムは、ゼロレタデーションフィルムを含み、一軸性位相差フィルム、低光弾性率位相差フィルム、広視野角位相差フィルムなどと称されるフィルムも含む。
The retardation film is an optical film showing optical anisotropy, and for example, polyvinyl alcohol, polycarbonate, polyester, polyarylate, polyimide, polyolefin, polycycloolefin, polystyrene, polysulfone, polyether sulfone, polyvinylidene fluoro, An example is a stretched film obtained by stretching a polymer film composed of a ride / polymethyl methacrylate, acetyl cellulose, a saponified ethylene-vinyl acetate copolymer, polyvinyl chloride and the like by about 1.01 to 6 times. Among them, a polymer film obtained by uniaxially or biaxially stretching a polycarbonate film or a cycloolefin resin film is preferable. In the present specification, the retardation film includes a zero retardation film, and also includes a film referred to as a uniaxial retardation film, a low photoelastic modulus retardation film, a wide viewing angle retardation film, or the like.
液晶性化合物の塗布・配向によって光学異方性を発現させたフィルムや、無機層状化合物の塗布によって光学異方性を発現させたフィルムとしては、温度補償型位相差フィルムと称されるフィルム、JX液晶フィルム株式会社から販売されている「NHフィルム」(商品名;棒状液晶が傾斜配向したフィルム)、富士フイルム株式会社から販売されている「WVフィルム」(商品名;円盤状液晶が傾斜配向したフィルム)、住友化学株式会社から販売されている「VACフィルム」(商品名;完全二軸配向型のフィルム)、「new VACフィルム」(商品名;二軸配向型のフィルム)などが挙げられる。
A film referred to as a temperature compensation type retardation film, a film referred to as a temperature-compensated retardation film, a film in which optical anisotropy is expressed by application and orientation of a liquid crystal compound, and a film in which optical anisotropy is expressed by application of an inorganic layered compound. “NH film” (trade name; film in which rod-like liquid crystals are inclined and oriented) sold by Liquid Crystal Film Co., Ltd., “WV film” sold by Fujifilm Co., Ltd. (trade name; disc-like liquid crystal inclined and oriented) Film), "VAC film" (trade name; film of completely biaxial orientation type) sold by Sumitomo Chemical Co., Ltd., "new VAC film" (trade name: film of biaxial orientation type), and the like.
ゼロレタデーションフィルムとは、正面レタデーションReと厚み方向のレタデーションRthとが、ともに-15~15nmであり、光学的に等方なフィルムをいう。ゼロレタデーションフィルムとしては、セルロース系樹脂、ポリオレフィン系樹脂(鎖状ポリオレフィン系樹脂、ポリシクロオレフィン系樹脂など)またはポリエチレンテレフタレート系樹脂からなる樹脂フィルムが挙げられ、レタデーション値の制御が容易で、入手も容易であるという点で、セルロース系樹脂またはポリオレフィン系樹脂が好ましい。ゼロレタデーションフィルムは、保護フィルムとしても用いることができる。ゼロレタデーションフィルムとしては、富士フイルム株式会社から販売されている“Z-TAC”(商品名)、コニカミノルタ株式会社から販売されている“ゼロタック(登録商標)”、日本ゼオン株式会社から販売されている“ZF-14”(商品名)などが挙げられる。
The zero retardation film is an optically isotropic film in which both the front retardation R e and the retardation R th in the thickness direction are -15 to 15 nm. As a zero retardation film, resin films made of cellulose resins, polyolefin resins (chain polyolefin resins, polycycloolefin resins, etc.) or polyethylene terephthalate resins can be mentioned. Cellulose-based resins or polyolefin-based resins are preferred in that they are easy. The zero retardation film can also be used as a protective film. As the zero retardation film, “Z-TAC” (trade name) sold by Fujifilm Co., Ltd., “Zerotac (registered trademark)” sold by Konica Minolta Co., Ltd., sold by Nippon Zeon Co., Ltd. And “ZF-14” (trade name).
本発明の光学フィルムにおいて、位相差フィルムは、重合性液晶化合物を硬化させてなる位相差フィルムが好ましい。
In the optical film of the present invention, the retardation film is preferably a retardation film obtained by curing a polymerizable liquid crystal compound.
液晶性化合物の塗布・配向によって光学異方性を発現させたフィルムとしては、
第一の形態:棒状液晶化合物が支持基材に対して水平方向に配向した位相差フィルム、
第二の形態:棒状液晶化合物が支持基材に対して垂直方向に配向した位相差フィルム、
第三の形態:棒状液晶化合物が面内で螺旋状に配向の方向が変化している位相差フィルム、
第四の形態:円盤状液晶化合物が傾斜配向している位相差フィルム、
第五の形態:円盤状液晶化合物が支持基材に対して垂直方向に配向した二軸性の位相差フィルムがあげられる。 As a film in which optical anisotropy is expressed by application and orientation of a liquid crystal compound,
First embodiment: a retardation film in which a rod-like liquid crystal compound is oriented horizontally to a supporting substrate,
Second embodiment: a retardation film in which a rod-like liquid crystal compound is oriented in a direction perpendicular to a supporting substrate,
Third embodiment: Retardation film in which the direction of alignment of the rod-like liquid crystal compound is helically changed in the plane,
Fourth embodiment: a retardation film in which a discotic liquid crystal compound is inclined and aligned,
Fifth embodiment: A biaxial retardation film in which a discotic liquid crystal compound is oriented in a direction perpendicular to a support substrate can be mentioned.
第一の形態:棒状液晶化合物が支持基材に対して水平方向に配向した位相差フィルム、
第二の形態:棒状液晶化合物が支持基材に対して垂直方向に配向した位相差フィルム、
第三の形態:棒状液晶化合物が面内で螺旋状に配向の方向が変化している位相差フィルム、
第四の形態:円盤状液晶化合物が傾斜配向している位相差フィルム、
第五の形態:円盤状液晶化合物が支持基材に対して垂直方向に配向した二軸性の位相差フィルムがあげられる。 As a film in which optical anisotropy is expressed by application and orientation of a liquid crystal compound,
First embodiment: a retardation film in which a rod-like liquid crystal compound is oriented horizontally to a supporting substrate,
Second embodiment: a retardation film in which a rod-like liquid crystal compound is oriented in a direction perpendicular to a supporting substrate,
Third embodiment: Retardation film in which the direction of alignment of the rod-like liquid crystal compound is helically changed in the plane,
Fourth embodiment: a retardation film in which a discotic liquid crystal compound is inclined and aligned,
Fifth embodiment: A biaxial retardation film in which a discotic liquid crystal compound is oriented in a direction perpendicular to a support substrate can be mentioned.
たとえば、有機エレクトロルミネッセンスディスプレイに用いられる光学フィルムとしては、第一の形態、第二の形態、第五の形態が好適に用いられる。またはこれらを積層させて用いてもよい。
For example, as an optical film used for an organic electroluminescent display, the 1st form, the 2nd form, and the 5th form are used suitably. Or these may be laminated and used.
位相差フィルムが、重合性液晶化合物の配向状態における重合体からなる層(以下、「光学異方性層」と称する場合がある)である場合、位相差フィルムは逆波長分散性を有することが好ましい。逆波長分散性とは、短波長での液晶配向面内位相差値の方が長波長での液晶配向面内位相差値よりも小さくなる光学特性であり、好ましくは、位相差フィルムが下記式(7)および式(8)を満たすことである。なお、Re(λ)は波長λnmの光に対する面内位相差値を表す。
Re(450)/Re(550)≦1 (7)
1≦Re(630)/Re(550) (8)
本発明の光学フィルムにおいて、位相差フィルムが第一の形態でかつ逆波長分散性を有する場合、表示装置での黒表示時の着色が低減するため好ましく、前記式(7)において0.82≦Re(450)/Re(550)≦0.93であればより好ましい。さらに120≦Re(550)≦150が好ましい。 When the retardation film is a layer composed of a polymer in the alignment state of the polymerizable liquid crystal compound (hereinafter sometimes referred to as "optically anisotropic layer"), the retardation film has reverse wavelength dispersion. preferable. Reverse wavelength dispersion is an optical characteristic in which the in-plane retardation value at the short wavelength is smaller than the in-plane retardation value at the long wavelength, and preferably the retardation film has the following formula It is to satisfy (7) and equation (8). Re (λ) represents an in-plane retardation value for light of wavelength λ nm.
Re (450) / Re (550) ≦ 1 (7)
1 ≦ Re (630) / Re (550) (8)
In the optical film of the present invention, when the retardation film is in the first form and has reverse wavelength dispersion, it is preferable because the coloration at the time of black display in the display device is reduced, and 0.82 ≦ in the formula (7). It is more preferable if Re (450) / Re (550) ≦ 0.93. Furthermore, 120 ≦ Re (550) ≦ 150 is preferable.
Re(450)/Re(550)≦1 (7)
1≦Re(630)/Re(550) (8)
本発明の光学フィルムにおいて、位相差フィルムが第一の形態でかつ逆波長分散性を有する場合、表示装置での黒表示時の着色が低減するため好ましく、前記式(7)において0.82≦Re(450)/Re(550)≦0.93であればより好ましい。さらに120≦Re(550)≦150が好ましい。 When the retardation film is a layer composed of a polymer in the alignment state of the polymerizable liquid crystal compound (hereinafter sometimes referred to as "optically anisotropic layer"), the retardation film has reverse wavelength dispersion. preferable. Reverse wavelength dispersion is an optical characteristic in which the in-plane retardation value at the short wavelength is smaller than the in-plane retardation value at the long wavelength, and preferably the retardation film has the following formula It is to satisfy (7) and equation (8). Re (λ) represents an in-plane retardation value for light of wavelength λ nm.
Re (450) / Re (550) ≦ 1 (7)
1 ≦ Re (630) / Re (550) (8)
In the optical film of the present invention, when the retardation film is in the first form and has reverse wavelength dispersion, it is preferable because the coloration at the time of black display in the display device is reduced, and 0.82 ≦ in the formula (7). It is more preferable if Re (450) / Re (550) ≦ 0.93. Furthermore, 120 ≦ Re (550) ≦ 150 is preferable.
位相差フィルムが、光学異方性層を有するフィルムである場合の重合性液晶化合物としては、液晶便覧(液晶便覧編集委員会編、丸善(株)平成12年10月30日発行)の「3.8.6 ネットワーク(完全架橋型)」、「6.5.1 液晶材料 b.重合性ネマチック液晶材料」に記載された化合物の中で重合性基を有する化合物、並びに、特開2010-31223号公報、特開2010-270108号公報、特開2011-6360号公報、特開2011-207765号公報、特開2011-162678号、特開2016-81035号公報、国際公開第2017/043438号公報及び特表2011-207765号公報に記載の重合性液晶化合物が挙げられる。
As a polymerizable liquid crystal compound when the retardation film is a film having an optically anisotropic layer, “3” of “Liquid Crystal Handbook” (edited by the LCD Handbook Editorial Board, Maruzen Co., Ltd., published on October 30, 2000). Of the compounds described in “8.6 Network (fully cross-linked type)”, “6.5.1 liquid crystal material b. Polymerizable nematic liquid crystal material”, compounds having a polymerizable group, and JP-A-2010-31223 Publication No. 2010-270108 Publication No. 2011-6360 Publication No. 2011-207765 Publication No. 2011-162678 Publication No. 2016-81035 Publication International Publication No. 2017/043438 And polymerizable liquid crystal compounds described in JP-A-2011-207765.
重合性液晶化合物の配向状態における重合体から位相差フィルムを製造する方法は、例えば、特開2010-31223号公報に記載の方法が挙げられる。
Examples of the method for producing a retardation film from a polymer in the alignment state of the polymerizable liquid crystal compound include the method described in JP-A-2010-31223.
第2の形態の場合、正面位相差値Re(550)は0~10nmの範囲に、好ましくは0~5nmの範囲に調整すればよく、厚み方向の位相差値Rthは、-10~-300nmの範囲に、好ましくは-20~-200nmの範囲に調整すればよい。厚み方向の屈折率異方性を意味する厚み方向の位相差値Rthは、面内の進相軸を傾斜軸として50度傾斜させて測定される位相差値R50と面内の位相差値R0 とから算出できる。すなわち、厚み方向の位相差値Rthは、面内の位相差値R0、進相軸を傾斜軸として50度傾斜させて測定した位相差値R50、位相差フィルムの厚みd、及び位相差フィルムの平均屈折率n0から、以下の式 (10)~(12)によりnx、ny及びnz を求め、これらを式(9)に代入して、算出することができる。
In the case of the second embodiment, the front retardation value Re (550) may be adjusted in the range of 0 to 10 nm, preferably in the range of 0 to 5 nm, and the retardation value R th in the thickness direction is -10 to- It may be adjusted in the range of 300 nm, preferably in the range of -20 to -200 nm. The retardation value R th in the thickness direction, which means the refractive index anisotropy in the thickness direction, is an in-plane retardation difference from the retardation value R 50 measured by tilting 50 degrees with the in-plane fast axis as the tilt axis. It can be calculated from the value R 0 . That is, the phase difference value R th in the thickness direction retardation value R 0 in the plane retardation value R 50 measured by inclining 50 degrees inclination axis fast axis, thickness of the retardation film d, and positions the average refractive index n 0 of the retardation film, obtains the n x, n y and n z by the following equation (10) to (12), these are substituted into equation (9) can be calculated.
Rth=[(nx+ny)/2-nz]×d (9)
R0 =(nx-ny)×d (10)
R50=(nx-ny')×d/cos(φ) (11)
(nx+ny+nz)/3=n0 (12)
ここで、
φ=sin-1〔sin(40°)/n0〕
ny'=ny×nz/〔ny 2×sin2(φ)+nz 2×cos2(φ)〕1/2 R th = [(n x + n y ) / 2-n z ] × d (9)
R 0 = (n x -n y ) × d (10)
R 50 = (n x -n y ') × d / cos (φ) (11)
(n x + n y + n z ) / 3 = n 0 (12)
here,
φ = sin −1 (sin (40 °) / n 0 )
n y '= n y × n z / [ ny 2 × sin 2 (φ) + n z 2 × cos 2 (φ)] 1/2
R0 =(nx-ny)×d (10)
R50=(nx-ny')×d/cos(φ) (11)
(nx+ny+nz)/3=n0 (12)
ここで、
φ=sin-1〔sin(40°)/n0〕
ny'=ny×nz/〔ny 2×sin2(φ)+nz 2×cos2(φ)〕1/2 R th = [(n x + n y ) / 2-n z ] × d (9)
R 0 = (n x -n y ) × d (10)
R 50 = (n x -n y ') × d / cos (φ) (11)
(n x + n y + n z ) / 3 = n 0 (12)
here,
φ = sin −1 (sin (40 °) / n 0 )
n y '= n y × n z / [ ny 2 × sin 2 (φ) + n z 2 × cos 2 (φ)] 1/2
位相差フィルムは、二以上の層を有する多層フィルムであってもよい。例えば、位相差フィルムの片面又は両面に保護フィルムが積層されたものや、二以上の位相差フィルムが粘着剤又は接着剤を介して積層されたものが挙げられる。
The retardation film may be a multilayer film having two or more layers. For example, the thing by which the protective film was laminated | stacked on the single side | surface or both surfaces of retardation film, and the thing by which two or more retardation films were laminated | stacked via the adhesive or the adhesive agent are mentioned.
光学フィルム40が二以上の位相差フィルムが積層された多層フィルムである場合、本発明の光学フィルムを含む光学積層体の構成としては、図3に示したように、透過光に1/4波長分の位相差を付与する1/4波長位相差層50と透過光に1/2波長分の位相差を付与する1/2波長位相差層70とを、接着剤又は粘着剤60を介して積層した光学フィルム40を含む構成が挙げられる。また、図4に示したように、1/4波長位相差層50aとポジティブC層80とを、接着剤層又は粘着剤層を介して積層した光学フィルム40を含む構成も挙げられる。
When the optical film 40 is a multilayer film in which two or more retardation films are laminated, as a configuration of an optical laminate including the optical film of the present invention, as shown in FIG. A quarter-wave retardation layer 50 for giving a retardation of a minute and a half-wave retardation layer 70 for giving a retardation of a 1⁄2 wavelength to transmitted light through an adhesive or a pressure-sensitive adhesive 60 The structure containing the laminated | stacked optical film 40 is mentioned. Moreover, as shown in FIG. 4, the structure containing the optical film 40 which laminated | stacked the quarter wavelength phase difference layer 50a and the positive C layer 80 through the adhesive bond layer or the adhesive layer is also mentioned.
図3の1/4波長分の位相差を付与する1/4波長位相差層50、および透過光に1/2波長分の位相差を付与する1/2波長位相差層70は上記第一の形態の光学フィルムであっても第五の形態の光学フィルムであってもよい。図3の構成の場合、少なくとも片方が第五の形態であることがより好ましい。
The first wavelength retardation layer 50 for giving a phase difference of 1⁄4 wavelength shown in FIG. 3 and the 1⁄2 wavelength retardation layer 70 for giving a phase difference of 1⁄2 wavelength to transmitted light The optical film of the fifth aspect may be used. In the case of the configuration of FIG. 3, it is more preferable that at least one of them is the fifth form.
図4の構成の場合、1/4波長位相差層50aは上記第一の形態の光学フィルムであることが好ましく、さらに式(7)、式(8)を満たすことがより好ましい。
In the case of the configuration of FIG. 4, the 1⁄4 wavelength retardation layer 50 a is preferably the optical film of the first embodiment, and it is more preferable to satisfy the formulas (7) and (8).
ウィンドフィルムとは、フレキシブルディスプレイ等のフレキシブル液晶表示装置における前面板を意味し、一般的には表示装置の最表面に配置される。ウィンドウフィルムは、例えばポリイミド樹脂からなる樹脂フィルムが挙げられる。ウィンドウフィルムは、例えばポリイミド及びシリカを含む樹脂フィルムのような、有機材料と無機材料のハイブリッドフィルムであってもよい。また、ウィンドウフィルムはその表面に、表面硬度や防汚性、耐指紋性を機能付与するためのハードコート層が配置されていてもよい。ウィンドフィルムとしては、たとえば、特開2017―94488号記載のフィルム等が挙げられる。
The window film means a front plate in a flexible liquid crystal display device such as a flexible display, and is generally disposed on the outermost surface of the display device. The window film is, for example, a resin film made of a polyimide resin. The window film may be a hybrid film of an organic material and an inorganic material, such as a resin film containing, for example, polyimide and silica. In addition, a hard coat layer may be disposed on the surface of the window film to impart surface hardness, stain resistance, and fingerprint resistance. As a wind film, the film of Unexamined-Japanese-Patent No. 2017-94488, etc. are mentioned, for example.
位相差フィルムの厚みは、通常0.1~100μmである。
位相差フィルムが多層である場合は、合計の厚みが、0.2~200μmであればよい。 The thickness of the retardation film is usually 0.1 to 100 μm.
When the retardation film is a multilayer, the total thickness may be 0.2 to 200 μm.
位相差フィルムが多層である場合は、合計の厚みが、0.2~200μmであればよい。 The thickness of the retardation film is usually 0.1 to 100 μm.
When the retardation film is a multilayer, the total thickness may be 0.2 to 200 μm.
偏光フィルムは、上述の酸素遮蔽層で記載した偏光フィルムと同様のものが挙げられる。
偏光板とパネルとの間には、図4に示すように、さらにその他の層又はフィルムが積層されていてもよい。有機ELディスプレイ用の円偏光板として用いる場合は、1/4波長位相差層と1/2波長位相差層とを有する位相差層、逆波長分散性の1/4波長層が積層されていることが好ましい。位相差層は薄膜化の観点から液晶系位相差フィルムであることが好ましい。 The polarizing film may be the same as the polarizing film described for the oxygen shielding layer described above.
Another layer or film may be further laminated between the polarizing plate and the panel as shown in FIG. When used as a circularly polarizing plate for an organic EL display, a retardation layer having a 1⁄4 wavelength retardation layer and a 1⁄2 wavelength retardation layer, and a 1⁄4 wavelength layer of reverse wavelength dispersion are laminated. Is preferred. The retardation layer is preferably a liquid crystal retardation film from the viewpoint of thinning.
偏光板とパネルとの間には、図4に示すように、さらにその他の層又はフィルムが積層されていてもよい。有機ELディスプレイ用の円偏光板として用いる場合は、1/4波長位相差層と1/2波長位相差層とを有する位相差層、逆波長分散性の1/4波長層が積層されていることが好ましい。位相差層は薄膜化の観点から液晶系位相差フィルムであることが好ましい。 The polarizing film may be the same as the polarizing film described for the oxygen shielding layer described above.
Another layer or film may be further laminated between the polarizing plate and the panel as shown in FIG. When used as a circularly polarizing plate for an organic EL display, a retardation layer having a 1⁄4 wavelength retardation layer and a 1⁄2 wavelength retardation layer, and a 1⁄4 wavelength layer of reverse wavelength dispersion are laminated. Is preferred. The retardation layer is preferably a liquid crystal retardation film from the viewpoint of thinning.
光選択吸収層10が光選択吸収機能を有する粘着剤層である場合、光選択吸収層10の外面に積層されるセパレートフィルム(剥離フィルム)を含んでいてもよい。このセパレートフィルムは通常、光選択吸収層10の使用時(例えば光学フィルム40上への積層時)に剥離除去される。セパレートフィルムは、例えば、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリカーボネート、ポリアレート等の各種樹脂からなるフィルムの光選択吸収層10が形成される面に、シリコーン処理等の離型処理が施されたものであることができる。
When the light selective absorption layer 10 is a pressure-sensitive adhesive layer having a light selective absorption function, it may include a separate film (release film) laminated on the outer surface of the light selective absorption layer 10. The separate film is usually peeled off when the light selective absorption layer 10 is used (for example, when laminated on the optical film 40). The separate film is, for example, a film made of various resins such as polyethylene terephthalate, polybutylene terephthalate, polycarbonate, polyarete, etc., on the surface on which the light selective absorption layer 10 is formed, is subjected to release treatment such as silicone treatment. be able to.
光選択吸収層10が光選択吸収機能を有する粘着剤層である場合、上記光粘着剤組成物を構成する各成分を溶剤に溶解又は分散して溶剤含有の粘着剤組成物とし、次いで、これを酸素遮蔽層20の表面に塗布・乾燥して光選択吸収層10を形成することによって、本発明の光学フィルムを得ることができる。また本発明の光学フィルムは、セパレートフィルムの離型処理面に上と同様にして光選択吸収層10を形成し、この光選択吸収層10を酸素遮蔽層20の表面に積層(転写)することによっても得ることができる。酸素遮蔽層および光選択吸収層の間には、その他のフィルム又は層を介して積層されていてもよい。直接積層されていない場合であっても、本発明の光学フィルムは優れた光学特性および耐久性を発現することができる。
When the light selective absorption layer 10 is a pressure-sensitive adhesive layer having a light selective absorption function, each component constituting the light pressure-sensitive adhesive composition is dissolved or dispersed in a solvent to obtain a solvent-containing pressure-sensitive adhesive composition. The optical film of the present invention can be obtained by applying and drying on the surface of the oxygen shielding layer 20 to form the light selective absorption layer 10. In the optical film of the present invention, the light selective absorption layer 10 is formed on the release treated surface of the separate film in the same manner as above, and the light selective absorption layer 10 is laminated (transferred) on the surface of the oxygen shielding layer 20 It can also be obtained by Another film or layer may be laminated between the oxygen shielding layer and the light selective absorption layer. Even when not directly laminated, the optical film of the present invention can exhibit excellent optical properties and durability.
本発明の光学フィルムは、有機EL表示装置や液晶表示装置に好適に用いることができる。本発明の光学フィルムの好ましい形態としては、偏光板である。本発明の光学フィルムである偏光板を有機EL表示装置や液晶表示装置に配置すると表示性能に優れ、かつ耐久性良好な表示装置を提供できる。
The optical film of the present invention can be suitably used for an organic EL display device or a liquid crystal display device. A preferred embodiment of the optical film of the present invention is a polarizing plate. When the polarizing plate which is the optical film of the present invention is disposed in an organic EL display device or a liquid crystal display device, a display device having excellent display performance and good durability can be provided.
以下、実施例及び比較例を示して本発明をさらに具体的に説明するが、本発明はこれらの例によって限定されるものではない。例中、含有量ないし使用量を表す%及び部は、特に断りのない限り質量基準である。
EXAMPLES The present invention will be more specifically described below by showing Examples and Comparative Examples, but the present invention is not limited by these examples. In the examples,% and parts representing contents or amounts used are on a mass basis unless otherwise noted.
<偏光フィルムの作成>
[製造例1]
平均重合度約2400、ケン化度99.9モル%、厚み30μmのポリビニルアルコールフィルム〔(株)クラレ製の商品名「クラレビニロン VF-PE♯3000」〕を、37℃の純水に浸漬した後、ヨウ素とヨウ化カリウムとを含む水溶液(ヨウ素/ヨウ化カリウム/水(質量比)=0.04/1.5/100)に30℃で浸漬した。その後、ヨウ化カリウムとホウ酸とを含む水溶液(ヨウ化カリウム/ホウ酸/水(質量比)=12/3.6/100)に56.5℃で浸漬した。フィルムを10℃の純水で洗浄した後、85℃で乾燥して、ポリビニルアルコールにヨウ素が吸着配向された厚み約12μmの偏光子を得た。延伸は、主に、ヨウ素染色及びホウ酸処理の工程で行い、トータルの延伸倍率は5.3倍であった。 <Creating a polarizing film>
Production Example 1
A polyvinyl alcohol film with an average degree of polymerization of about 2400, a degree of saponification of 99.9 mol%, and a thickness of 30 μm (trade name "Klare vinylon VF-PE # 3000" manufactured by Kuraray Co., Ltd.) was immersed in pure water at 37 ° C. Then, it was immersed at 30 ° C. in an aqueous solution containing iodine and potassium iodide (iodine / potassium iodide / water (mass ratio) = 0.04 / 1.5 / 100). Thereafter, it was immersed at 56.5 ° C. in an aqueous solution containing potassium iodide and boric acid (potassium iodide / boric acid / water (mass ratio) = 12 / 3.6 / 100). The film was washed with pure water at 10 ° C. and then dried at 85 ° C. to obtain a polarizer with a thickness of about 12 μm in which iodine was adsorbed and oriented to polyvinyl alcohol. Stretching was mainly performed in the iodine dyeing and boric acid treatment steps, and the total stretch ratio was 5.3.
[製造例1]
平均重合度約2400、ケン化度99.9モル%、厚み30μmのポリビニルアルコールフィルム〔(株)クラレ製の商品名「クラレビニロン VF-PE♯3000」〕を、37℃の純水に浸漬した後、ヨウ素とヨウ化カリウムとを含む水溶液(ヨウ素/ヨウ化カリウム/水(質量比)=0.04/1.5/100)に30℃で浸漬した。その後、ヨウ化カリウムとホウ酸とを含む水溶液(ヨウ化カリウム/ホウ酸/水(質量比)=12/3.6/100)に56.5℃で浸漬した。フィルムを10℃の純水で洗浄した後、85℃で乾燥して、ポリビニルアルコールにヨウ素が吸着配向された厚み約12μmの偏光子を得た。延伸は、主に、ヨウ素染色及びホウ酸処理の工程で行い、トータルの延伸倍率は5.3倍であった。 <Creating a polarizing film>
Production Example 1
A polyvinyl alcohol film with an average degree of polymerization of about 2400, a degree of saponification of 99.9 mol%, and a thickness of 30 μm (trade name "Klare vinylon VF-PE # 3000" manufactured by Kuraray Co., Ltd.) was immersed in pure water at 37 ° C. Then, it was immersed at 30 ° C. in an aqueous solution containing iodine and potassium iodide (iodine / potassium iodide / water (mass ratio) = 0.04 / 1.5 / 100). Thereafter, it was immersed at 56.5 ° C. in an aqueous solution containing potassium iodide and boric acid (potassium iodide / boric acid / water (mass ratio) = 12 / 3.6 / 100). The film was washed with pure water at 10 ° C. and then dried at 85 ° C. to obtain a polarizer with a thickness of about 12 μm in which iodine was adsorbed and oriented to polyvinyl alcohol. Stretching was mainly performed in the iodine dyeing and boric acid treatment steps, and the total stretch ratio was 5.3.
[製造例2]
平均重合度約2400、ケン化度99.9モル%、厚み75μmのポリビニルアルコールフィルム〔(株)クラレ製の商品名「クラレビニロン VF-PS♯7500」〕を、37℃の純水に浸漬した後、ヨウ素とヨウ化カリウムとを含む水溶液(ヨウ素/ヨウ化カリウム/水(重量比)=0.04/1.5/100)に30℃で浸漬した。その後、ヨウ化カリウムとホウ酸とを含む水溶液(ヨウ化カリウム/ホウ酸/水(重量比)=12/3.6/100)に56.5℃で浸漬した。フィルムを10℃の純水で洗浄した後、85℃で乾燥して、ポリビニルアルコールにヨウ素が吸着配向された厚み約28μmの偏光子を得た。延伸は、主に、ヨウ素染色及びホウ酸処理の工程で行い、トータルの延伸倍率は5.3倍であった。 Production Example 2
A polyvinyl alcohol film with an average degree of polymerization of about 2400, a degree of saponification of 99.9 mol%, and a thickness of 75 μm (trade name "Klare vinylon VF-PS # 7500" manufactured by Kuraray Co., Ltd.) was immersed in pure water at 37 ° C. Then, it was immersed at 30 ° C. in an aqueous solution containing iodine and potassium iodide (iodine / potassium iodide / water (weight ratio) = 0.04 / 1.5 / 100). Then, it was immersed at 56.5 ° C. in an aqueous solution containing potassium iodide and boric acid (potassium iodide / boric acid / water (weight ratio) = 12 / 3.6 / 100). The film was washed with pure water at 10 ° C. and then dried at 85 ° C. to obtain a polarizer with a thickness of about 28 μm in which iodine was adsorbed and oriented in polyvinyl alcohol. Stretching was mainly performed in the iodine dyeing and boric acid treatment steps, and the total stretch ratio was 5.3.
平均重合度約2400、ケン化度99.9モル%、厚み75μmのポリビニルアルコールフィルム〔(株)クラレ製の商品名「クラレビニロン VF-PS♯7500」〕を、37℃の純水に浸漬した後、ヨウ素とヨウ化カリウムとを含む水溶液(ヨウ素/ヨウ化カリウム/水(重量比)=0.04/1.5/100)に30℃で浸漬した。その後、ヨウ化カリウムとホウ酸とを含む水溶液(ヨウ化カリウム/ホウ酸/水(重量比)=12/3.6/100)に56.5℃で浸漬した。フィルムを10℃の純水で洗浄した後、85℃で乾燥して、ポリビニルアルコールにヨウ素が吸着配向された厚み約28μmの偏光子を得た。延伸は、主に、ヨウ素染色及びホウ酸処理の工程で行い、トータルの延伸倍率は5.3倍であった。 Production Example 2
A polyvinyl alcohol film with an average degree of polymerization of about 2400, a degree of saponification of 99.9 mol%, and a thickness of 75 μm (trade name "Klare vinylon VF-PS # 7500" manufactured by Kuraray Co., Ltd.) was immersed in pure water at 37 ° C. Then, it was immersed at 30 ° C. in an aqueous solution containing iodine and potassium iodide (iodine / potassium iodide / water (weight ratio) = 0.04 / 1.5 / 100). Then, it was immersed at 56.5 ° C. in an aqueous solution containing potassium iodide and boric acid (potassium iodide / boric acid / water (weight ratio) = 12 / 3.6 / 100). The film was washed with pure water at 10 ° C. and then dried at 85 ° C. to obtain a polarizer with a thickness of about 28 μm in which iodine was adsorbed and oriented in polyvinyl alcohol. Stretching was mainly performed in the iodine dyeing and boric acid treatment steps, and the total stretch ratio was 5.3.
<酸素遮蔽層>
PET:厚み38μmのポリエチレンテレフタレートフィルム(東レ(株)から入手した商品名“R64S”)
PVA:厚み28μmの偏光フィルム(製造例2で作製)
COP:厚み50μmのシクロオレフィンフィルム(日本ゼオン(株)から入手した商品名“ZB―12”) <Oxygen shielding layer>
PET: 38 μm thick polyethylene terephthalate film (trade name “R64S” obtained from Toray Industries, Inc.)
PVA: Polarized film with a thickness of 28 μm (made in Production Example 2)
COP: Cycloolefin film with a thickness of 50 μm (trade name “ZB-12” obtained from Nippon Zeon Co., Ltd.)
PET:厚み38μmのポリエチレンテレフタレートフィルム(東レ(株)から入手した商品名“R64S”)
PVA:厚み28μmの偏光フィルム(製造例2で作製)
COP:厚み50μmのシクロオレフィンフィルム(日本ゼオン(株)から入手した商品名“ZB―12”) <Oxygen shielding layer>
PET: 38 μm thick polyethylene terephthalate film (trade name “R64S” obtained from Toray Industries, Inc.)
PVA: Polarized film with a thickness of 28 μm (made in Production Example 2)
COP: Cycloolefin film with a thickness of 50 μm (trade name “ZB-12” obtained from Nippon Zeon Co., Ltd.)
<酸素透過度の評価>
GTR テック(株)社製差圧式ガス透過率測定装置(GTR-30AS型)を用いて、JIS K 7126-1(差圧法)に準拠して、「PET」、「PVA」及び「COP」の酸素透過度をそれぞれ評価した。測定条件は以下のとおりである。結果を表1に示す。なお、表1中における酸素透過度の単位はcm3/(m2・24h・atm)である。 <Evaluation of oxygen permeability>
GTR TEC Co., Ltd. product differential pressure type gas permeability measurement device (GTR-30AS type), in accordance with JIS K 7126-1 (differential pressure method), “PET”, “PVA” and “COP” Each oxygen permeability was evaluated. The measurement conditions are as follows. The results are shown in Table 1. The unit of oxygen permeability in Table 1 is cm 3 / (m 2 · 24 h · atm).
GTR テック(株)社製差圧式ガス透過率測定装置(GTR-30AS型)を用いて、JIS K 7126-1(差圧法)に準拠して、「PET」、「PVA」及び「COP」の酸素透過度をそれぞれ評価した。測定条件は以下のとおりである。結果を表1に示す。なお、表1中における酸素透過度の単位はcm3/(m2・24h・atm)である。 <Evaluation of oxygen permeability>
GTR TEC Co., Ltd. product differential pressure type gas permeability measurement device (GTR-30AS type), in accordance with JIS K 7126-1 (differential pressure method), “PET”, “PVA” and “COP” Each oxygen permeability was evaluated. The measurement conditions are as follows. The results are shown in Table 1. The unit of oxygen permeability in Table 1 is cm 3 / (m 2 · 24 h · atm).
測定温度:30℃
透過面積:15.2cm2(φ44mm)
透過ガス:酸素(超高純度)
供給ガス圧:2kgf/cm2(差圧:223cmHg) Measurement temperature: 30 ° C
Transmission area: 15.2 cm 2 (φ 44 mm)
Permeable gas: oxygen (super high purity)
Supply gas pressure: 2 kgf / cm2 (differential pressure: 223 cmHg)
透過面積:15.2cm2(φ44mm)
透過ガス:酸素(超高純度)
供給ガス圧:2kgf/cm2(差圧:223cmHg) Measurement temperature: 30 ° C
Transmission area: 15.2 cm 2 (φ 44 mm)
Permeable gas: oxygen (super high purity)
Supply gas pressure: 2 kgf / cm2 (differential pressure: 223 cmHg)
<光選択吸収性化合物の合成>
(合成例1)光選択吸収性化合物(1)の合成
ジムロート冷却管、温度計を設置した200mL-四ツ口フラスコ内を窒素雰囲気とし、特許文献(特開2014-194508)を参考に合成した式(aa)で表される化合物10部、無水酢酸(和光純薬工業株式会社製)3.6部、シアノ酢酸2-エチルヘキシル(DIPEAと称する場合がある;東京化成工業株式会社製)6.9部、およびアセトニトリル(和光純薬工業株式会社製)60部を仕込み、マグネチックスターラーで撹拌した。内温25℃にてDIPEA(東京化成工業株式会社製)4.5部を滴下漏斗から1時間かけて滴下し、滴下終了後に内温25℃にてさらに2時間保温した。反応終了後、減圧エバポレーターを用いてアセトニトリルを除去し、カラムクロマトグラフィー(シリカゲル)に供して精製し、式(aa1)で表される光選択吸収性化合物(1)を含む流出液を、減圧エバポレーターを用いて溶媒を除去し、黄色結晶を得た。該結晶を60℃減圧乾燥することにより、黄色粉末として光選択吸収性化合物(1)を4.6部得た。収率は50%であった。 <Synthesis of Photoselective Absorbent Compound>
Synthesis Example 1 Synthesis of Photoselective Absorbent Compound (1)
A 10 mL portion of a compound represented by the formula (aa) synthesized with reference to patent document (Japanese Patent Laid-Open No. 2014-194508) in a 200 mL four-necked flask equipped with a Dimroth condenser and a thermometer and nitrogen atmosphere, acetic anhydride ( 3.6 parts of Wako Pure Chemical Industries Ltd., 6.9 parts of 2-ethylhexyl cyanoacetate (sometimes referred to as DIPEA; made by Tokyo Chemical Industry Co., Ltd.), and 60 acetonitrile (manufactured by Wako Pure Chemical Industries, Ltd.) The parts were charged and stirred with a magnetic stirrer. At an internal temperature of 25 ° C., 4.5 parts of DIPEA (manufactured by Tokyo Kasei Kogyo Co., Ltd.) was dropped from the dropping funnel over 1 hour, and after completion of dropping, the temperature was kept at 25 ° C. for further 2 hours. After completion of the reaction, acetonitrile is removed using a vacuum evaporator and purified by column chromatography (silica gel) to purify the effluent containing the photoselective absorptive compound (1) represented by the formula (aa1). The solvent was removed using to give yellow crystals. The crystals were dried at 60 ° C. under reduced pressure to obtain 4.6 parts of a photoselective absorptive compound (1) as a yellow powder. The yield was 50%.
(合成例1)光選択吸収性化合物(1)の合成
ジムロート冷却管、温度計を設置した200mL-四ツ口フラスコ内を窒素雰囲気とし、特許文献(特開2014-194508)を参考に合成した式(aa)で表される化合物10部、無水酢酸(和光純薬工業株式会社製)3.6部、シアノ酢酸2-エチルヘキシル(DIPEAと称する場合がある;東京化成工業株式会社製)6.9部、およびアセトニトリル(和光純薬工業株式会社製)60部を仕込み、マグネチックスターラーで撹拌した。内温25℃にてDIPEA(東京化成工業株式会社製)4.5部を滴下漏斗から1時間かけて滴下し、滴下終了後に内温25℃にてさらに2時間保温した。反応終了後、減圧エバポレーターを用いてアセトニトリルを除去し、カラムクロマトグラフィー(シリカゲル)に供して精製し、式(aa1)で表される光選択吸収性化合物(1)を含む流出液を、減圧エバポレーターを用いて溶媒を除去し、黄色結晶を得た。該結晶を60℃減圧乾燥することにより、黄色粉末として光選択吸収性化合物(1)を4.6部得た。収率は50%であった。 <Synthesis of Photoselective Absorbent Compound>
Synthesis Example 1 Synthesis of Photoselective Absorbent Compound (1)
A 10 mL portion of a compound represented by the formula (aa) synthesized with reference to patent document (Japanese Patent Laid-Open No. 2014-194508) in a 200 mL four-necked flask equipped with a Dimroth condenser and a thermometer and nitrogen atmosphere, acetic anhydride ( 3.6 parts of Wako Pure Chemical Industries Ltd., 6.9 parts of 2-ethylhexyl cyanoacetate (sometimes referred to as DIPEA; made by Tokyo Chemical Industry Co., Ltd.), and 60 acetonitrile (manufactured by Wako Pure Chemical Industries, Ltd.) The parts were charged and stirred with a magnetic stirrer. At an internal temperature of 25 ° C., 4.5 parts of DIPEA (manufactured by Tokyo Kasei Kogyo Co., Ltd.) was dropped from the dropping funnel over 1 hour, and after completion of dropping, the temperature was kept at 25 ° C. for further 2 hours. After completion of the reaction, acetonitrile is removed using a vacuum evaporator and purified by column chromatography (silica gel) to purify the effluent containing the photoselective absorptive compound (1) represented by the formula (aa1). The solvent was removed using to give yellow crystals. The crystals were dried at 60 ° C. under reduced pressure to obtain 4.6 parts of a photoselective absorptive compound (1) as a yellow powder. The yield was 50%.
1H-NMR解析を行ったところ、以下のピークが観測されたことから、光選択吸収性化合物1が生成したことが確認された。
1H-NMR(CDCl3)δ:0.87-0.94(m、6H)、1.32-1.67(m、8H)、1.59-1.66(m、2H)、2.09(quin、2H)、3.00(m、5H)、3.64(t、2H)、4.10(dd、2H)、5.52(d、2H)、7.87(d、2H) When 1 H-NMR analysis was performed, the following peaks were observed, and thus, it was confirmed that the lightselective absorption compound 1 was generated.
1 H-NMR (CDCl 3) δ: 0.87 to 0.94 (m, 6H), 1.32-1.67 (m, 8H), 1.59- 1.66 (m, 2H), 09 (quin, 2 H), 3.00 (m, 5 H), 3.64 (t, 2 H), 4. 10 (dd, 2 H), 5.52 (d, 2 H), 7.87 (d, 2 H) )
1H-NMR(CDCl3)δ:0.87-0.94(m、6H)、1.32-1.67(m、8H)、1.59-1.66(m、2H)、2.09(quin、2H)、3.00(m、5H)、3.64(t、2H)、4.10(dd、2H)、5.52(d、2H)、7.87(d、2H) When 1 H-NMR analysis was performed, the following peaks were observed, and thus, it was confirmed that the light
1 H-NMR (CDCl 3) δ: 0.87 to 0.94 (m, 6H), 1.32-1.67 (m, 8H), 1.59- 1.66 (m, 2H), 09 (quin, 2 H), 3.00 (m, 5 H), 3.64 (t, 2 H), 4. 10 (dd, 2 H), 5.52 (d, 2 H), 7.87 (d, 2 H) )
<グラム吸光係数ε測定>
得られた光選択吸収性化合物(1)のグラム吸光係数を測定するために、光選択吸収性化合物(1)を2-ブタノンに溶解させた。得られた溶液(濃度;0.006g・L-1)を1cmの石英セルに入れ、石英セルを分光光度計UV-2450(株式会社島津製作所製)にセットし、ダブルビーム法により1nmステップ300~800nmの波長範囲で吸光度を測定した。得られた吸光度の値と、溶液中の光吸収性化合物濃度、石英セルの光路長から、波長ごとのグラム吸光係数を下記式を用いて算出した。
ε(λ)=A(λ)/CL
〔式中、ε(λ)は波長λnmにおける化合物のグラム吸光係数L/(g・cm)を表し、A(λ)は波長λnmにおける吸光度を表し、Cは濃度g/Lを表し、Lは石英セルの光路長cmを表す。〕
光選択吸収性化合物(1)の吸収極大波長(λmax)を測定したところ、λmax=389nm(2-ブタノン中)であり、ε(405)の値は47L/(g・cm)であり、ε(440)の値は0.1L/(g・cm)以下であり、ε(405)/ε(440)の値は80以上であった。 <Gram absorption coefficient ε measurement>
In order to measure the gram absorption coefficient of the obtained photoselective absorptive compound (1), the photoselective absorptive compound (1) was dissolved in 2-butanone. The resulting solution (concentration: 0.006 g · L -1 ) is placed in a 1 cm quartz cell, and the quartz cell is set in a spectrophotometer UV-2450 (manufactured by Shimadzu Corporation), and 1 nm steps 300 to 200 by double beam method. Absorbance was measured in the wavelength range of 800 nm. From the obtained absorbance value, the concentration of the light absorbing compound in the solution, and the optical path length of the quartz cell, the gram absorption coefficient for each wavelength was calculated using the following equation.
ε (λ) = A (λ) / CL
[Wherein, ε (λ) represents the gram absorption coefficient L / (g · cm) of the compound at the wavelength λ nm, A (λ) represents the absorbance at the wavelength λ nm, C represents the concentration g / L, and L is It represents the optical path length cm of the quartz cell. ]
When the absorption maximum wavelength (λmax) of the photoselective absorption compound (1) is measured, λmax = 389 nm (in 2-butanone), the value of ε (405) is 47 L / (g · cm), and ε The value of (440) was 0.1 L / (g · cm) or less, and the value of ε (405) / ε (440) was 80 or more.
得られた光選択吸収性化合物(1)のグラム吸光係数を測定するために、光選択吸収性化合物(1)を2-ブタノンに溶解させた。得られた溶液(濃度;0.006g・L-1)を1cmの石英セルに入れ、石英セルを分光光度計UV-2450(株式会社島津製作所製)にセットし、ダブルビーム法により1nmステップ300~800nmの波長範囲で吸光度を測定した。得られた吸光度の値と、溶液中の光吸収性化合物濃度、石英セルの光路長から、波長ごとのグラム吸光係数を下記式を用いて算出した。
ε(λ)=A(λ)/CL
〔式中、ε(λ)は波長λnmにおける化合物のグラム吸光係数L/(g・cm)を表し、A(λ)は波長λnmにおける吸光度を表し、Cは濃度g/Lを表し、Lは石英セルの光路長cmを表す。〕
光選択吸収性化合物(1)の吸収極大波長(λmax)を測定したところ、λmax=389nm(2-ブタノン中)であり、ε(405)の値は47L/(g・cm)であり、ε(440)の値は0.1L/(g・cm)以下であり、ε(405)/ε(440)の値は80以上であった。 <Gram absorption coefficient ε measurement>
In order to measure the gram absorption coefficient of the obtained photoselective absorptive compound (1), the photoselective absorptive compound (1) was dissolved in 2-butanone. The resulting solution (concentration: 0.006 g · L -1 ) is placed in a 1 cm quartz cell, and the quartz cell is set in a spectrophotometer UV-2450 (manufactured by Shimadzu Corporation), and 1 nm steps 300 to 200 by double beam method. Absorbance was measured in the wavelength range of 800 nm. From the obtained absorbance value, the concentration of the light absorbing compound in the solution, and the optical path length of the quartz cell, the gram absorption coefficient for each wavelength was calculated using the following equation.
ε (λ) = A (λ) / CL
[Wherein, ε (λ) represents the gram absorption coefficient L / (g · cm) of the compound at the wavelength λ nm, A (λ) represents the absorbance at the wavelength λ nm, C represents the concentration g / L, and L is It represents the optical path length cm of the quartz cell. ]
When the absorption maximum wavelength (λmax) of the photoselective absorption compound (1) is measured, λmax = 389 nm (in 2-butanone), the value of ε (405) is 47 L / (g · cm), and ε The value of (440) was 0.1 L / (g · cm) or less, and the value of ε (405) / ε (440) was 80 or more.
(合成例2)(メタ)アクリル系樹脂の調製
以下の方法により(メタ)アクリル系樹脂を調製した。重量平均分子量および数平均分子量の測定は、GPC装置にカラムとして「TSK gel XL(東ソー(株)製)」を4本、および「Shodex GPC KF-802(昭和電工(株)製)」を1本、計5本を直列につないで配置し、溶出液としてテトラヒドロフランを用いて、試料濃度5mg/mL、試料導入量100μL、温度40℃、流速1mL/分の条件で行い、標準ポリスチレン換算により算出した。 Synthesis Example 2 Preparation of (Meth) acrylic Resin A (meth) acrylic resin was prepared by the following method. The weight-average molecular weight and number-average molecular weight were measured using four “TSK gel XL (manufactured by Tosoh Corp.)” as a column in a GPC apparatus, and one “Shodex GPC KF-802 (manufactured by Showa Denko KK)”. This series is arranged by connecting a total of 5 in series, using tetrahydrofuran as an eluent, using a sample concentration of 5 mg / mL, a sample introduction amount of 100 μL, a temperature of 40 ° C., and a flow rate of 1 mL / min. did.
以下の方法により(メタ)アクリル系樹脂を調製した。重量平均分子量および数平均分子量の測定は、GPC装置にカラムとして「TSK gel XL(東ソー(株)製)」を4本、および「Shodex GPC KF-802(昭和電工(株)製)」を1本、計5本を直列につないで配置し、溶出液としてテトラヒドロフランを用いて、試料濃度5mg/mL、試料導入量100μL、温度40℃、流速1mL/分の条件で行い、標準ポリスチレン換算により算出した。 Synthesis Example 2 Preparation of (Meth) acrylic Resin A (meth) acrylic resin was prepared by the following method. The weight-average molecular weight and number-average molecular weight were measured using four “TSK gel XL (manufactured by Tosoh Corp.)” as a column in a GPC apparatus, and one “Shodex GPC KF-802 (manufactured by Showa Denko KK)”. This series is arranged by connecting a total of 5 in series, using tetrahydrofuran as an eluent, using a sample concentration of 5 mg / mL, a sample introduction amount of 100 μL, a temperature of 40 ° C., and a flow rate of 1 mL / min. did.
冷却管、窒素導入管、温度計及び攪拌機を備えた反応容器に、溶媒として酢酸エチル81.8部、アクリル酸ブチル70.4部、アクリル酸メチル20.0部、アクリル酸2-フェノキシエチル8.0部、アクリル酸2-ヒドロキシエチル1.0部およびアクリル酸0.6部と混合して得られた溶液を仕込んだ。反応容器内の空気を窒素ガスで置換した後、内温を60℃にした。その後、アゾビスイソブチロニトリル0.12部を酢酸エチル10部に溶解させた溶液を添加した。1時間同温度で保持した後、内温を54~56℃に保ちながら、添加速度17.3部/Hrで酢酸エチルを、重合体の濃度がほぼ35%となるように反応容器内へ連続的に加えた。酢酸エチルの添加開始から12時間経過するまで内温を54~56℃に保持した後、酢酸エチルを加えて重合体の濃度が20%となるように調整して、(メタ)アクリル系樹脂の酢酸エチル溶液を得た。(メタ)アクリル系樹脂の重量平均分子量Mwは139万、重量平均分子量Mwと数平均分子量Mnとの比Mw/Mnは5.32であった。
In a reaction vessel equipped with a cooling pipe, a nitrogen introducing pipe, a thermometer and a stirrer, 81.8 parts of ethyl acetate, 70.4 parts of butyl acrylate, 20.0 parts of methyl acrylate, 2-phenoxyethyl acrylate as a solvent A solution obtained by mixing with 0 parts, 1.0 part of 2-hydroxyethyl acrylate and 0.6 parts of acrylic acid was charged. After the air in the reaction vessel was replaced with nitrogen gas, the internal temperature was brought to 60.degree. Thereafter, a solution of 0.12 parts of azobisisobutyronitrile in 10 parts of ethyl acetate was added. After maintaining at the same temperature for 1 hour, while maintaining the internal temperature at 54 to 56 ° C., continuously add ethyl acetate at a rate of 17.3 parts / hr to the reaction vessel so that the concentration of the polymer is approximately 35%. Added. The internal temperature is kept at 54 to 56 ° C. until 12 hours have passed from the start of the addition of ethyl acetate, and then ethyl acetate is added to adjust the concentration of the polymer to 20%, and the (meth) acrylic resin An ethyl acetate solution was obtained. The weight average molecular weight Mw of the (meth) acrylic resin was 1,390,000, and the ratio Mw / Mn of the weight average molecular weight Mw to the number average molecular weight Mn was 5.32.
(合成例3)粘着剤組成物の調製
上記で得られた(メタ)アクリル系樹脂の酢酸エチル溶液(樹脂濃度:20%)に、該溶液の固形分100部に対して、架橋剤(コロネートL、固形分75%)0.4部、シラン化合物(KBM-403)0.4部、及び合成例1で得られた光選択吸収性化合物(1)2部を混合し、さらに固形分濃度が14%となるように酢酸エチルを添加して粘着剤組成物を得た。上記架橋剤の配合量は、有効成分としての重量部数である。 Synthesis Example 3 Preparation of Pressure-Sensitive Adhesive Composition A cross-linking agent (coronate) based on 100 parts of solid content of the solution of (meth) acrylic resin obtained above in ethyl acetate solution (resin concentration: 20%) L, solid content 75%) 0.4 parts of silane compound (KBM-403) and 2 parts of the photoselective absorptive compound (1) obtained in Synthesis Example 1 are mixed, and solid content concentration is further added Ethyl acetate was added so as to obtain a pressure-sensitive adhesive composition of 14%. The compounding amount of the crosslinking agent is the number of parts by weight as an active ingredient.
上記で得られた(メタ)アクリル系樹脂の酢酸エチル溶液(樹脂濃度:20%)に、該溶液の固形分100部に対して、架橋剤(コロネートL、固形分75%)0.4部、シラン化合物(KBM-403)0.4部、及び合成例1で得られた光選択吸収性化合物(1)2部を混合し、さらに固形分濃度が14%となるように酢酸エチルを添加して粘着剤組成物を得た。上記架橋剤の配合量は、有効成分としての重量部数である。 Synthesis Example 3 Preparation of Pressure-Sensitive Adhesive Composition A cross-linking agent (coronate) based on 100 parts of solid content of the solution of (meth) acrylic resin obtained above in ethyl acetate solution (resin concentration: 20%) L, solid content 75%) 0.4 parts of silane compound (KBM-403) and 2 parts of the photoselective absorptive compound (1) obtained in Synthesis Example 1 are mixed, and solid content concentration is further added Ethyl acetate was added so as to obtain a pressure-sensitive adhesive composition of 14%. The compounding amount of the crosslinking agent is the number of parts by weight as an active ingredient.
合成例3で使用した架橋剤及びシラン化合物の詳細は以下のとおりである。
架橋剤:トリレンジイソシアネートのトリメチロールプロパンアダクト体の酢酸エチ
ル溶液(固形分濃度75%)、東ソー株式会社から入手した商品名「コロネートL」。
シラン化合物:3-グリシドキシプロピルトリメトキシシラン、信越化学工業株式会社から入手した商品名「KBM403」。 The details of the crosslinking agent and the silane compound used in Synthesis Example 3 are as follows.
Crosslinking agent: Ethyl acetate solution (75% solid concentration) of trimethylolpropane adduct of tolylene diisocyanate, trade name "Corronate L" obtained from Tosoh Corporation.
Silane compound: 3-glycidoxypropyltrimethoxysilane, trade name "KBM403" obtained from Shin-Etsu Chemical Co., Ltd.
架橋剤:トリレンジイソシアネートのトリメチロールプロパンアダクト体の酢酸エチ
ル溶液(固形分濃度75%)、東ソー株式会社から入手した商品名「コロネートL」。
シラン化合物:3-グリシドキシプロピルトリメトキシシラン、信越化学工業株式会社から入手した商品名「KBM403」。 The details of the crosslinking agent and the silane compound used in Synthesis Example 3 are as follows.
Crosslinking agent: Ethyl acetate solution (75% solid concentration) of trimethylolpropane adduct of tolylene diisocyanate, trade name "Corronate L" obtained from Tosoh Corporation.
Silane compound: 3-glycidoxypropyltrimethoxysilane, trade name "KBM403" obtained from Shin-Etsu Chemical Co., Ltd.
<光選択吸収層(粘着剤層)の作製>
上記で調製した各粘着剤組成物を、離型処理が施されたポリエチレンテレフタレートフィルムからなるセパレートフィルム〔リンテック(株)から入手した商品名「PLR-382190」〕の離型処理面に、アプリケーターを用いて乾燥後の厚みが20μmとなるように塗布し、100℃で1分間乾燥して粘着剤層(粘着剤シート)の光選択吸収層(1)を作製した。 <Preparation of a light selective absorption layer (pressure-sensitive adhesive layer)>
The pressure-sensitive adhesive composition prepared above was applied to the release-treated surface of a separate film (trade name "PLR-382190" obtained from Lintec Co., Ltd.) made of a polyethylene terephthalate film subjected to release treatment. It applied so that thickness after drying might be set to 20 micrometers, and it dried at 100 degreeC for 1 minute, and produced the photoselective absorption layer (1) of an adhesive layer (adhesive sheet).
上記で調製した各粘着剤組成物を、離型処理が施されたポリエチレンテレフタレートフィルムからなるセパレートフィルム〔リンテック(株)から入手した商品名「PLR-382190」〕の離型処理面に、アプリケーターを用いて乾燥後の厚みが20μmとなるように塗布し、100℃で1分間乾燥して粘着剤層(粘着剤シート)の光選択吸収層(1)を作製した。 <Preparation of a light selective absorption layer (pressure-sensitive adhesive layer)>
The pressure-sensitive adhesive composition prepared above was applied to the release-treated surface of a separate film (trade name "PLR-382190" obtained from Lintec Co., Ltd.) made of a polyethylene terephthalate film subjected to release treatment. It applied so that thickness after drying might be set to 20 micrometers, and it dried at 100 degreeC for 1 minute, and produced the photoselective absorption layer (1) of an adhesive layer (adhesive sheet).
(実施例1)
酸素遮蔽層の「PET」の片面にコロナ放電処理を施した後、上記で作製した光選択吸収層(1)のセパレートフィルムとは反対側の面(粘着剤層面)をラミネーターにより貼り合わせた後、温度23℃、相対湿度65%の条件で7日間養生し、酸素遮蔽層と光選択吸収層とを含む光学フィルム(粘着剤付き光学フィルム)(1)を得た。次いで、粘着剤付き光学フィルムを30mm×30mmの大きさに裁断し、無アルカリガラス〔コーニング社製の商品名“EAGLE XG”〕に貼合しこれをサンプルとした。作製したサンプルの酸素遮蔽層を上記に記載の方法で測定した。また、作製したサンプルの波長300~800nm範囲の吸光度を、分光光度計(UV-2450:株式会社島津製作所製)を用いて測定した。結果を表1に示す。なお、無アルカリガラス単体の波長450nmにおける吸光度は0であった。 Example 1
After corona discharge treatment is performed on one side of "PET" of the oxygen shielding layer, the side (adhesive layer side) opposite to the separate film of the light selective absorption layer (1) manufactured above is bonded by a laminator It was aged for 7 days under conditions of a temperature of 23 ° C. and a relative humidity of 65% to obtain an optical film (optical film with adhesive) (1) including an oxygen shielding layer and a light selective absorption layer. Then, the pressure-sensitive adhesive-attached optical film was cut into a size of 30 mm × 30 mm and bonded to an alkali-free glass (trade name “EAGLE XG” manufactured by Corning Co., Ltd.) as a sample. The oxygen shielding layer of the prepared sample was measured by the method described above. In addition, the absorbance of the prepared sample in the wavelength range of 300 to 800 nm was measured using a spectrophotometer (UV-2450: manufactured by Shimadzu Corporation). The results are shown in Table 1. In addition, the light absorbency in wavelength 450 nm of an alkali free glass single-piece | unit was 0.
酸素遮蔽層の「PET」の片面にコロナ放電処理を施した後、上記で作製した光選択吸収層(1)のセパレートフィルムとは反対側の面(粘着剤層面)をラミネーターにより貼り合わせた後、温度23℃、相対湿度65%の条件で7日間養生し、酸素遮蔽層と光選択吸収層とを含む光学フィルム(粘着剤付き光学フィルム)(1)を得た。次いで、粘着剤付き光学フィルムを30mm×30mmの大きさに裁断し、無アルカリガラス〔コーニング社製の商品名“EAGLE XG”〕に貼合しこれをサンプルとした。作製したサンプルの酸素遮蔽層を上記に記載の方法で測定した。また、作製したサンプルの波長300~800nm範囲の吸光度を、分光光度計(UV-2450:株式会社島津製作所製)を用いて測定した。結果を表1に示す。なお、無アルカリガラス単体の波長450nmにおける吸光度は0であった。 Example 1
After corona discharge treatment is performed on one side of "PET" of the oxygen shielding layer, the side (adhesive layer side) opposite to the separate film of the light selective absorption layer (1) manufactured above is bonded by a laminator It was aged for 7 days under conditions of a temperature of 23 ° C. and a relative humidity of 65% to obtain an optical film (optical film with adhesive) (1) including an oxygen shielding layer and a light selective absorption layer. Then, the pressure-sensitive adhesive-attached optical film was cut into a size of 30 mm × 30 mm and bonded to an alkali-free glass (trade name “EAGLE XG” manufactured by Corning Co., Ltd.) as a sample. The oxygen shielding layer of the prepared sample was measured by the method described above. In addition, the absorbance of the prepared sample in the wavelength range of 300 to 800 nm was measured using a spectrophotometer (UV-2450: manufactured by Shimadzu Corporation). The results are shown in Table 1. In addition, the light absorbency in wavelength 450 nm of an alkali free glass single-piece | unit was 0.
<吸光度保持率の評価>
吸光度測定後のサンプルを、63℃50%相対湿度条件でサンシャインウェザーメーター(スガ試験機株式会社製)に24時間投入し、24時間の耐候性試験を実施した。取り出したサンプルの吸光度を上記と同様の方法で測定した。測定した吸光度から、下記式に基づき、405nmにおけるサンプルの吸光度保持率を求めた。結果を表1に示す。吸光度保持率が高いほど、光選択吸収機能の劣化がなく良好な耐候性を示す。
吸光度保持率=耐久試験後のA(405) / 耐久試験前のA(405)×100 <Evaluation of absorbance retention rate>
The sample after absorbance measurement was put into a sunshine weather meter (manufactured by Suga Test Instruments Co., Ltd.) for 24 hours under a condition of 63 ° C. and 50% relative humidity, and a weathering test for 24 hours was carried out. The absorbance of the removed sample was measured in the same manner as described above. From the measured absorbance, the absorbance retention of the sample at 405 nm was determined based on the following equation. The results are shown in Table 1. The higher the absorbance retention rate, the better the weather resistance without deterioration of the light selective absorption function.
Absorbance retention rate = A (405) after endurance test / A (405) beforeendurance test x 100
吸光度測定後のサンプルを、63℃50%相対湿度条件でサンシャインウェザーメーター(スガ試験機株式会社製)に24時間投入し、24時間の耐候性試験を実施した。取り出したサンプルの吸光度を上記と同様の方法で測定した。測定した吸光度から、下記式に基づき、405nmにおけるサンプルの吸光度保持率を求めた。結果を表1に示す。吸光度保持率が高いほど、光選択吸収機能の劣化がなく良好な耐候性を示す。
吸光度保持率=耐久試験後のA(405) / 耐久試験前のA(405)×100 <Evaluation of absorbance retention rate>
The sample after absorbance measurement was put into a sunshine weather meter (manufactured by Suga Test Instruments Co., Ltd.) for 24 hours under a condition of 63 ° C. and 50% relative humidity, and a weathering test for 24 hours was carried out. The absorbance of the removed sample was measured in the same manner as described above. From the measured absorbance, the absorbance retention of the sample at 405 nm was determined based on the following equation. The results are shown in Table 1. The higher the absorbance retention rate, the better the weather resistance without deterioration of the light selective absorption function.
Absorbance retention rate = A (405) after endurance test / A (405) before
(実施例2)
酸素遮蔽層を「PET」の代わりに、「PVA」を用いた以外は実施例1と同様に操作を行い、光学フィルム(2)を得た。得られた光学フィルム(2)を上記と同様の方法を用いて、酸素透過度の測定、吸光度の測定、吸光度保持率の評価を行った。結果を表1に示す。 (Example 2)
An operation was performed in the same manner as in Example 1 except that “PVA” was used instead of “PET” for the oxygen shielding layer, to obtain an optical film (2). The obtained optical film (2) was subjected to measurement of oxygen permeability, measurement of absorbance, and evaluation of retention of absorbance using the same method as described above. The results are shown in Table 1.
酸素遮蔽層を「PET」の代わりに、「PVA」を用いた以外は実施例1と同様に操作を行い、光学フィルム(2)を得た。得られた光学フィルム(2)を上記と同様の方法を用いて、酸素透過度の測定、吸光度の測定、吸光度保持率の評価を行った。結果を表1に示す。 (Example 2)
An operation was performed in the same manner as in Example 1 except that “PVA” was used instead of “PET” for the oxygen shielding layer, to obtain an optical film (2). The obtained optical film (2) was subjected to measurement of oxygen permeability, measurement of absorbance, and evaluation of retention of absorbance using the same method as described above. The results are shown in Table 1.
(比較例1)
酸素遮蔽層を「PET」の代わりに、「COP」を用いた以外は実施例1と同様に操作を行い、光学フィルム(3)を得た。得られた光学フィルム(3)を上記と同様の方法を用いて、酸素透過度の測定、吸光度の測定、吸光度保持率の評価を行った。結果を表1に示す。 (Comparative example 1)
An operation was carried out in the same manner as in Example 1 except that “COP” was used instead of “PET” for the oxygen shielding layer, to obtain an optical film (3). The obtained optical film (3) was subjected to measurement of oxygen permeability, measurement of absorbance, and evaluation of retention of absorbance using the same method as described above. The results are shown in Table 1.
酸素遮蔽層を「PET」の代わりに、「COP」を用いた以外は実施例1と同様に操作を行い、光学フィルム(3)を得た。得られた光学フィルム(3)を上記と同様の方法を用いて、酸素透過度の測定、吸光度の測定、吸光度保持率の評価を行った。結果を表1に示す。 (Comparative example 1)
An operation was carried out in the same manner as in Example 1 except that “COP” was used instead of “PET” for the oxygen shielding layer, to obtain an optical film (3). The obtained optical film (3) was subjected to measurement of oxygen permeability, measurement of absorbance, and evaluation of retention of absorbance using the same method as described above. The results are shown in Table 1.
(実施例3)
合成例1で得られた偏光フィルム(酸素透過度は10以下であった)の片面に、厚み25μmのトリアセチルセルロースフィルムからなる透明保護フィルム(コニカミノルタ株式会社製:商品名「KC2UA」)を、ポリビニルアルコール系樹脂の水溶液からなる接着剤を介して貼合した。次に、偏光フィルムにおけるトリアセチルセルロースフィルムとは反対側の面に、厚み23μmの環状ポリオレフィンからなるゼロ位相差フィルム(日本ゼオン株式会社製:商品名「ZEONOR」)を、ポリビニルアルコール系樹脂の水溶液からなる接着剤を介して貼合し、偏光板を作製した。
作成した偏光板を酸素遮蔽層とした以外は、実施例1と同様に操作を行い、光学フィルム(4)を得た。得られた光学フィルム(4)を上記と同様の方法を用いて、酸素透過度の測定、吸光度の測定、吸光度保持率の評価を行った。結果を表1に示す。 (Example 3)
A transparent protective film (Konica Minolta Co., Ltd .: trade name "KC2UA") consisting of a 25 μm-thick triacetyl cellulose film is provided on one side of the polarizing film obtained in Synthesis Example 1 (the oxygen permeability was 10 or less). It bonded together via the adhesive which consists of aqueous solution of polyvinyl alcohol-type resin. Next, on the surface opposite to the triacetylcellulose film in the polarizing film, a zero retardation film (made by Nippon Zeon Co., Ltd .: trade name "ZEONOR") made of a cyclic polyolefin with a thickness of 23 μm, and an aqueous solution of polyvinyl alcohol resin It bonded together through the adhesive which consists of, and produced the polarizing plate.
An operation was performed in the same manner as in Example 1 except that the produced polarizing plate was changed to an oxygen shielding layer, to obtain an optical film (4). The obtained optical film (4) was subjected to measurement of oxygen permeability, measurement of absorbance, and evaluation of retention of absorbance using the same method as described above. The results are shown in Table 1.
合成例1で得られた偏光フィルム(酸素透過度は10以下であった)の片面に、厚み25μmのトリアセチルセルロースフィルムからなる透明保護フィルム(コニカミノルタ株式会社製:商品名「KC2UA」)を、ポリビニルアルコール系樹脂の水溶液からなる接着剤を介して貼合した。次に、偏光フィルムにおけるトリアセチルセルロースフィルムとは反対側の面に、厚み23μmの環状ポリオレフィンからなるゼロ位相差フィルム(日本ゼオン株式会社製:商品名「ZEONOR」)を、ポリビニルアルコール系樹脂の水溶液からなる接着剤を介して貼合し、偏光板を作製した。
作成した偏光板を酸素遮蔽層とした以外は、実施例1と同様に操作を行い、光学フィルム(4)を得た。得られた光学フィルム(4)を上記と同様の方法を用いて、酸素透過度の測定、吸光度の測定、吸光度保持率の評価を行った。結果を表1に示す。 (Example 3)
A transparent protective film (Konica Minolta Co., Ltd .: trade name "KC2UA") consisting of a 25 μm-thick triacetyl cellulose film is provided on one side of the polarizing film obtained in Synthesis Example 1 (the oxygen permeability was 10 or less). It bonded together via the adhesive which consists of aqueous solution of polyvinyl alcohol-type resin. Next, on the surface opposite to the triacetylcellulose film in the polarizing film, a zero retardation film (made by Nippon Zeon Co., Ltd .: trade name "ZEONOR") made of a cyclic polyolefin with a thickness of 23 μm, and an aqueous solution of polyvinyl alcohol resin It bonded together through the adhesive which consists of, and produced the polarizing plate.
An operation was performed in the same manner as in Example 1 except that the produced polarizing plate was changed to an oxygen shielding layer, to obtain an optical film (4). The obtained optical film (4) was subjected to measurement of oxygen permeability, measurement of absorbance, and evaluation of retention of absorbance using the same method as described above. The results are shown in Table 1.
本発明の光学フィルムは、波長405nm付近の光に対して良好な吸収性能を有する。そのため、本発明の光学フィルムを位相差フィルムや有機EL素子に積層すると、本発明の光学フィルムは位相差フィルムや有機EL素子への波長405nm付近の光を遮ることができ、短波長の可視光の両方から位相差フィルムや有機EL素子の劣化を抑制できる。本発明の光学フィルムは耐候性試験後であっても波長405nm付近の光吸収機能が良好であり、良好な耐候性(耐久性)を有する。本発明の光学フィルムを液晶表示装置に用いた場合に、より劣化を抑制することができる。
The optical film of the present invention has good absorption performance for light near a wavelength of 405 nm. Therefore, when the optical film of the present invention is laminated on a retardation film or an organic EL element, the optical film of the present invention can block light near a wavelength of 405 nm to the retardation film or the organic EL element, and visible light of short wavelength Therefore, deterioration of the retardation film and the organic EL element can be suppressed. The optical film of the present invention has a good light absorbing function near a wavelength of 405 nm even after a weathering test, and has a good weathering resistance (durability). When the optical film of the present invention is used in a liquid crystal display device, deterioration can be further suppressed.
本発明の光学フィルムは、液晶パネル及び液晶表示装置に好適に用いられる。
The optical film of the present invention is suitably used in liquid crystal panels and liquid crystal displays.
1 光学フィルム
1A、1B、1C 光学積層体
10 光選択吸収層
20 酸素遮蔽層
30 粘着剤層
30a 接着剤層
40 光学フィルム
50、50a 1/4波長位相差層
60 接着剤層
70 1/2波長位相差層
80 ポジティブC層
90 保護フィルム
100 偏光板
110 発光素子 DESCRIPTION OFSYMBOLS 1 optical film 1A, 1B, 1C optical laminated body 10 light selective absorption layer 20 oxygen shielding layer 30 adhesive layer 30a adhesive layer 40 optical film 50, 50a quarter wavelength retardation layer 60 adhesive layer 70 1/2 wavelength Retardation layer 80 Positive C layer 90 Protective film 100 Polarizing plate 110 Light emitting element
1A、1B、1C 光学積層体
10 光選択吸収層
20 酸素遮蔽層
30 粘着剤層
30a 接着剤層
40 光学フィルム
50、50a 1/4波長位相差層
60 接着剤層
70 1/2波長位相差層
80 ポジティブC層
90 保護フィルム
100 偏光板
110 発光素子 DESCRIPTION OF
Claims (13)
- 少なくとも1層の光選択吸収層と少なくとも1層の酸素遮蔽層とを含む光学フィルムであって、かつ下記式(1)及び式(2)を満たす光学フィルム。
A(405)≧0.5 (1)
酸素透過度≦500 (2)
[式(1)中、A(405)は、波長405nmにおける吸光度を表す。酸素透過度の単位は、cm3/(m2・24h・atm)である。] An optical film comprising at least one light selective absorption layer and at least one oxygen shielding layer, and satisfying the following formulas (1) and (2).
A (405) 0.5 0.5 (1)
Oxygen permeability ≦ 500 (2)
[In Formula (1), A (405) represents the absorbance at a wavelength of 405 nm. The unit of oxygen permeability is cm 3 / (m 2 · 24 h · atm). ] - 下記式(3)を満たす請求項1に記載の光学フィルム。
A(440)≦0.1 (3)
[式(1)中、A(440)は、波長440nmにおける吸光度を表す。] The optical film of Claim 1 which satisfy | fills following formula (3).
A (440) ≦ 0.1 (3)
[In Formula (1), A (440) represents the light absorbency in wavelength 440nm. ] - さらに、式(4)を満たす請求項1又は2に記載の光学フィルム。
A(405)/A(440)≧5 (4)
[式(4)中、A(405)は波長405nmにおける吸光度を表し、A(440)は波長440nmにおける吸光度を表す。] Furthermore, the optical film of Claim 1 or 2 which satisfy | fills Formula (4).
A (405) / A (440) ≧ 5 (4)
[In Formula (4), A (405) represents the light absorbency in wavelength 405 nm, and A (440) represents the light absorbency in wavelength 440 nm. ] - 光選択吸収層が、光選択吸収機能を有する粘着剤層である請求項1~3のいずれかに記載の光学フィルム。 The optical film according to any one of claims 1 to 3, wherein the light selective absorption layer is a pressure-sensitive adhesive layer having a light selective absorption function.
- 光選択吸収層が、(メタ)アクリル系樹脂(A)、架橋剤(B)及び光選択吸収化合物(C)を含む粘着剤組成物から形成される粘着剤層である請求項4に記載の光学フィルム。 The light-sensitive adhesive layer according to claim 4, wherein the light-selective absorption layer is a pressure-sensitive adhesive layer formed from a pressure-sensitive adhesive composition containing a (meth) acrylic resin (A), a crosslinking agent (B) and a light selective absorption compound (C). Optical film.
- 架橋剤(B)の含有量が、(メタ)アクリル系樹脂(A)100質量部に対して、0.01~15質量部である請求項5に記載の光学フィルム。 The optical film according to claim 5, wherein the content of the crosslinking agent (B) is 0.01 to 15 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (A).
- 光選択吸収化合物(C)の含有量が、(メタ)アクリル系樹脂(A)100質量部に対して、0.01~20質量部である請求項5又は6に記載の光学フィルム。 The optical film according to claim 5 or 6, wherein the content of the light selective absorption compound (C) is 0.01 to 20 parts by mass with respect to 100 parts by mass of the (meth) acrylic resin (A).
- 光選択吸収化合物(C)が、下記式(5)を満たす化合物である請求項5~7のいずれかに記載の光学フィルム。
ε(405)≧20 (5)
〔式(5)中、ε(405)は波長405nmにおける化合物のグラム吸光係数を表す。〕 The optical film according to any one of claims 5 to 7, wherein the photoselective absorption compound (C) is a compound satisfying the following formula (5).
ε (405) 20 20 (5)
[In Formula (5), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm. ] - 光選択吸収化合物(C)が、下記式(6)を満たす化合物である請求項8に記載の光学フィルム。
ε(405)/ε(440)≧20 (6)
[式(6)中、ε(405)は波長405nmにおける化合物のグラム吸光係数を表し、ε(440)は波長440nmにおけるグラム吸光係数を表す。] The optical film according to claim 8, wherein the photoselective absorption compound (C) is a compound satisfying the following formula (6).
ε (405) / ε (440) ≧ 20 (6)
[In Formula (6), (epsilon) (405) represents the gram absorption coefficient of the compound in wavelength 405 nm, and (epsilon) (440) represents the gram absorption coefficient in wavelength 440 nm. ] - 光選択吸収化合物(C)が、分子内にメロシアニン構造を有する化合物である請求項5~9のいずれかに記載の光学フィルム。 The optical film according to any one of claims 5 to 9, wherein the photoselective absorption compound (C) is a compound having a merocyanine structure in the molecule.
- 酸素遮蔽層は、ポリエステル系樹脂(E)ポリビニルアルコール系樹脂(F)、ポリアミド系樹脂(G)、ポリイミド系樹脂(H)及びセルロース系樹脂(I)から選ばれる少なくとも1種の樹脂から形成される樹脂層である請求項1~10のいずれかに記載の光学フィルム。 The oxygen shielding layer is formed of at least one resin selected from polyester resin (E) polyvinyl alcohol resin (F), polyamide resin (G), polyimide resin (H) and cellulose resin (I) The optical film according to any one of claims 1 to 10, which is a resin layer.
- 酸素遮蔽層が、ポリビニルアルコール系樹脂から形成される偏光フィルムである請求項1~11のいずれかに記載の光学フィルム。 The optical film according to any one of claims 1 to 11, wherein the oxygen shielding layer is a polarizing film formed of a polyvinyl alcohol resin.
- 請求項1~12の光学フィルムを含む表示装置。 A display device comprising the optical film according to claim 1.
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CN114502687A (en) * | 2019-10-11 | 2022-05-13 | 住友化学株式会社 | Adhesive composition |
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KR20210121022A (en) * | 2019-01-31 | 2021-10-07 | 니폰 제온 가부시키가이샤 | Optical film, polarizing plate, and image display device |
JP7429772B2 (en) * | 2020-04-30 | 2024-02-08 | 富士フイルム株式会社 | Self-luminous display device |
WO2022158006A1 (en) * | 2021-01-19 | 2022-07-28 | 凸版印刷株式会社 | Optical film and display device |
JP7186249B2 (en) * | 2021-01-19 | 2022-12-08 | 凸版印刷株式会社 | Optical film, display device using the same, composition for forming colored layer used for manufacturing optical film |
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JP2006308936A (en) | 2005-04-28 | 2006-11-09 | Fuji Photo Film Co Ltd | Polarizing plate and liquid crystal display device |
TW201531775A (en) * | 2013-12-24 | 2015-08-16 | 富士軟片股份有限公司 | Optical sheet and display device |
JP2017048340A (en) * | 2015-09-04 | 2017-03-09 | 日本化薬株式会社 | Adhesive composition for optical use, and adhesive layer and adhesive optical film using the same |
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2018
- 2018-06-21 KR KR1020207001826A patent/KR20200019225A/en not_active Application Discontinuation
- 2018-06-21 WO PCT/JP2018/023585 patent/WO2019004044A1/en active Application Filing
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JP2005189645A (en) * | 2003-12-26 | 2005-07-14 | Fuji Photo Film Co Ltd | Circularly polarizing plate and organic el display element having circularly polarizing plate |
JP2013075978A (en) * | 2011-09-30 | 2013-04-25 | Nitto Denko Corp | Adhesive sheet |
WO2017047234A1 (en) * | 2015-09-17 | 2017-03-23 | 株式会社ポラテクノ | Organic electroluminescent display device |
JP2017165941A (en) * | 2015-12-25 | 2017-09-21 | 日東電工株式会社 | Adhesive composition for organic el display device, adhesive layer for organic el display device, polarizing film with adhesive layer for organic el display device, and organic el display device |
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CN114502687A (en) * | 2019-10-11 | 2022-05-13 | 住友化学株式会社 | Adhesive composition |
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