WO2018209612A1 - Contact plate, alignment system, and vapor deposition device - Google Patents

Contact plate, alignment system, and vapor deposition device Download PDF

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Publication number
WO2018209612A1
WO2018209612A1 PCT/CN2017/084766 CN2017084766W WO2018209612A1 WO 2018209612 A1 WO2018209612 A1 WO 2018209612A1 CN 2017084766 W CN2017084766 W CN 2017084766W WO 2018209612 A1 WO2018209612 A1 WO 2018209612A1
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WO
WIPO (PCT)
Prior art keywords
substrate
plate
magnetic
contact plate
vapor deposition
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PCT/CN2017/084766
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French (fr)
Chinese (zh)
Inventor
李欣
Original Assignee
深圳市柔宇科技有限公司
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Filing date
Publication date
Application filed by 深圳市柔宇科技有限公司 filed Critical 深圳市柔宇科技有限公司
Priority to PCT/CN2017/084766 priority Critical patent/WO2018209612A1/en
Priority to CN201780047314.9A priority patent/CN109563611A/en
Publication of WO2018209612A1 publication Critical patent/WO2018209612A1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks

Definitions

  • the present invention relates to display manufacturing techniques, and more particularly to contact plates, alignment systems, and vapor deposition devices.
  • the organic light emitting material In the manufacturing process of an existing organic light emitting diode (OLED) display, the organic light emitting material needs to be evaporated onto the substrate through a mask, and the mask forms an opening corresponding to the pixel array.
  • the organic light emitting material can be The pixel array is attached to the substrate. Therefore, the alignment between the mask and the substrate is very important. If the alignment is not accurate, color mixing may occur, resulting in degradation of the display quality of the OLED display.
  • the current vapor deposition apparatus includes an evaporation magnetic plate and a contact plate, the mask is made of a magnetic material, the contact plate and the substrate are sequentially disposed between the vapor deposition magnetic plate and the mask, and the vapor deposition magnetic plate is used for adsorbing the mask to The substrate is sandwiched between the contact plate and the mask to achieve alignment and attachment of the mask to the substrate.
  • the existing contact plate design is difficult to ensure that the substrate and the mask are perfectly fitted, and the color mixing phenomenon cannot be effectively prevented.
  • the present invention provides a contact plate, a registration system, and an evaporation device according to the deficiencies of the prior art.
  • the contact plate provided by the invention is used for a aligning system of an evaporation device, and the aligning system is used for a aligning mask and a substrate and includes an evaporation magnetic plate, wherein the vapor deposition magnetic plate is used for adsorbing a mask to The mask is adsorbed on the contact plate and the substrate is sandwiched between the contact plate and the mask, the contact plate comprising:
  • each of the spacer pillar assemblies including a spacer pillar and an elastic member connecting the spacer pillar and the mounting panel, the spacer pillar including a connecting end of the elastic member and a pressing end surface away from the elastic member, the substrate is pressed against the pressing end surface;
  • a sensing component configured to detect a force condition of each of the spacer components, wherein the force condition is used to analyze a force condition of the substrate to control the vapor deposition magnetic plate to change a magnetic field distribution to make the substrate Even by force.
  • the mounting plate is made of a hard plastic or a non-magnetic hard material.
  • the mounting plate is shaped and sized to mate with the substrate.
  • the mounting plate includes a mounting plane, the spacer post assembly being disposed on the mounting plane, the mounting plane being parallel to the abutting end surface.
  • the elastic member comprises a spring.
  • the elastic member includes a first connecting end
  • the mounting plate includes a second connecting end that cooperates with the first connecting end
  • the first connection end includes a threaded spigot
  • the second connection end includes a threaded groove that mates with the arbor.
  • the spacer is cylindrical.
  • the elastic member includes a third connecting end
  • the spacer includes a fourth connecting end that cooperates with the third connecting end
  • the third connection end includes a threaded insert shaft
  • the fourth connection end includes a threaded groove that mates with the insert shaft
  • the sensing component includes a sensor disposed between the elastic member and the mounting plate and arranged in an array, each of the sensors for detecting a corresponding elastic force of the elastic member .
  • the mounting plane includes grooves arranged in an array, the sensor being disposed in the groove in an in-line manner.
  • the sensor array includes a pressure sensor.
  • the alignment system provided by the present invention is used for aligning a mask and a substrate in an evaporation device, including:
  • control unit configured to analyze the force condition and control the vapor deposition magnetic plate to change a magnetic field distribution to uniformly stress the substrate.
  • the vapor-deposited magnetic plate includes magnetic elements arranged in an array for changing the magnetic field distribution by varying a magnetic pole distribution and/or a magnetic field size of the magnetic element.
  • the alignment system includes a drive device
  • the control unit is configured to control the driving device to drive the vapor deposition magnetic plate to be close to the contact plate.
  • the vapor deposition device provided by the present invention is used for vapor deposition of a substrate, comprising:
  • the substrate is a flexible substrate.
  • the evaporation device is configured to vaporize the organic light-emitting material to the substrate through the mask.
  • the contact plate provided by the present invention utilizes the array of spacer pillar assemblies to disperse the force of the vapor deposition magnetic plate to act on the substrate, prevent secondary deformation of the substrate due to pressure, and detect the interval by using the sensing component.
  • the force of the column assembly is then analyzed, and the force of the substrate is analyzed to determine whether the distribution of the vapor deposition magnetic field is appropriate. If the evaporation magnetic field distribution is found to be uneven, the control unit is used to manipulate the vapor deposition magnetic plate. The magnetic field distribution is changed to make the substrate uniformly stressed.
  • the contact plate can make the substrate and the mask perfectly fit by using the mutual matching of the spacer column assembly and the sensing component, thereby effectively preventing the color mixing phenomenon from occurring.
  • FIG. 1 is a schematic plan view of a vapor deposition device according to an embodiment of the present invention.
  • FIG. 2 is a partial plan view of a contact plate according to an embodiment of the present invention.
  • FIG. 3 is a schematic diagram of operational steps of a registration system according to an embodiment of the present invention.
  • FIG. 4 is a schematic diagram of a force model of a substrate before or after a magnetic plate of a vapor-deposited magnetic plate according to an embodiment of the present invention
  • FIG. 5 is a schematic diagram of a force-receiving model of a substrate after the magnetic plate of the vapor-deposited magnetic plate or after the magnetic plate is lowered according to an embodiment of the present invention
  • FIG. 6 is a schematic view showing a magnetic field distribution of an evaporated magnetic plate according to an embodiment of the present invention.
  • FIG. 7 is a schematic view showing a magnetic pole distribution of a driving device that does not drive an evaporated magnetic plate according to an embodiment of the present invention.
  • FIG. 8 is a schematic view showing a magnetic pole distribution after driving a vapor deposition magnetic plate according to an embodiment of the present invention
  • Contact plate 10 mounting plate 12, mounting plane 122, upper surface 124, second connecting end 126, spacer post assembly 14, elastic member 142, first connecting end 1422, third connecting end 1424, spacer post 144, pressing end face 1442, fourth connecting end 1444, sensing component 16, sensor 162, alignment system 100, vapor deposition magnetic plate 20, magnetic element 202, control unit 22, driving device 24, vapor deposition device 1000, mask 200, substrate 2000 .
  • connection In the description of the present invention, it should be noted that the terms “installation”, “connected”, and “connected” are to be understood broadly, and may be fixed or detachable, for example, unless otherwise explicitly defined and defined. Connected, or integrally connected; may be mechanically connected, may be electrically connected or may communicate with each other; may be directly connected, or may be indirectly connected through an intermediate medium, may be internal communication of two elements or interaction of two elements relationship.
  • Connected, or integrally connected may be mechanically connected, may be electrically connected or may communicate with each other; may be directly connected, or may be indirectly connected through an intermediate medium, may be internal communication of two elements or interaction of two elements relationship.
  • the specific meanings of the above terms in the present invention can be understood on a case-by-case basis.
  • the first feature "on” or “under” the second feature may include direct contact of the first and second features, and may also include first and second features, unless otherwise specifically defined and defined. It is not in direct contact but through additional features between them.
  • the first feature "above”, “above” and “above” the second feature includes the first feature directly above and above the second feature, or merely indicating that the first feature level is higher than the second feature.
  • the first feature “below”, “below” and “below” the second feature includes the first feature directly below and below the second feature, or merely the first feature level being less than the second feature.
  • the contact plate 10 of the embodiment of the present invention can be applied to the alignment system 100 of the vapor deposition apparatus 1000 .
  • the alignment system 100 is used for the alignment mask 200 and the substrate 2000.
  • the alignment system 100 includes an evaporated magnetic plate 20.
  • the vapor-deposited magnetic plate 20 is used to adsorb the mask 200 to sandwich the substrate 2000 between the contact plate 10 and the mask 200.
  • the vapor deposition device 1000 can vapor-deposit the substrate 2000 through the mask 200, for example, vapor-depositing the organic light-emitting material to form display pixels.
  • the contact plate 10 includes a mounting plate 12, a plurality of spacer post assemblies 14 and a sensor component 16.
  • the spacer assemblies 14 are disposed on the mounting plate 12 and are arranged in an array, each spacer assembly 14 including spacer posts 144 and connection spacing The post 144 and the resilient member 142 of the mounting plate 12.
  • the spacer post 144 includes a connecting end 1444 that is coupled to the resilient member 142 and a resisting end face 1442 that is remote from the resilient member 142.
  • the substrate 2000 is pressed against the pressing end surface 1442 so that the contact plate 10 is in contact with the substrate 2000.
  • the sensing component 16 is configured to detect the force of each spacer component 14.
  • the force condition is used to analyze the force of the substrate 2000 to control the vapor deposition magnetic plate 20 to change the magnetic field distribution to make the substrate 2000 uniform.
  • the alignment system 100 of other embodiments of the present invention may include a contact plate 10 and an evaporated magnetic plate 20.
  • the evaporation apparatus 1000 of other embodiments of the present invention may include the alignment system 100 and the mask 200, and is used to vapor-deposit the substrate 100 to manufacture a display device such as an OLED display.
  • the contact plate 10, the alignment system 100 and the evaporation device 1000 of the embodiments of the present invention can be used to manufacture an OLED flexible display. Therefore, the substrate 2000 is generally made of a flexible material such as a PET film. Therefore, when the substrate 2000 is aligned with the mask 200, it is difficult to spread flat on the conventional contact plate, or there is a difference in the shape and position of each opening due to uneven force, which will result in the substrate 2000 and the mask.
  • the film 200 is difficult to accurately align, so that multiple vapor deposition occurs (the red, green, and blue color pixel array substrates 2000 are required to be three times aligned with the mask 200 and three times vapor-deposited), and steaming is different.
  • the plating material may interfere (for example, interference occurs in different color pixels), resulting in color mixing.
  • the contact plate 10, the alignment system 100, and the vapor deposition device 1000 of the embodiment of the present invention can detect the force of each spacer column assembly 14 by using the sensing member 16, and the force condition is used to analyze the force of the substrate 2000.
  • the control of the vapor deposition magnetic plate 20 changes the magnetic field distribution to make the substrate 2000 uniform, thereby improving the flatness of the substrate 2000, thereby ensuring the accuracy of the alignment of the substrate 2000 and the mask 200, and avoiding the occurrence of color mixing.
  • the mounting plate 12 can be made of a hard plastic or a non-magnetic hard material.
  • the mounting plate 12 has a relatively high stiffness that provides sufficient support strength to the spacer assembly 14.
  • the mounting plate 12 can be shaped and sized to mate with the substrate 2000.
  • the shape of the substrate 2000 is generally rectangular, and the shape and size of the mounting board 12 can be in one-to-one correspondence with the substrate 2000.
  • the mounting plate 12 can include a mounting plane 122.
  • the mounting plane 122 is parallel to the abutting end face 1442.
  • the spacer assembly 14 is disposed on the mounting plane 122.
  • the end of the spacer assembly 14 away from the mounting board 12 can also form a flatter flat surface, thereby improving the flatness of the substrate 2000.
  • the resilient member 142 includes a spring.
  • the spring acts as a buffer during the evaporation process.
  • the spiral springs are small in size and suitable for arrays.
  • the material of the elastic member 142 may not be limited to the above embodiment, but in other embodiments may be The use of suitable elastic materials.
  • the resilient member 142 includes a first connecting end 1422
  • the mounting plate 12 includes a second connecting end 126 that mates with the first connecting end 1422.
  • first connection end 1422 includes a threaded spigot and the second connection end 126 includes a threaded slot that mates with the plunging shaft.
  • the elastic member 142 and the mounting plate 12 can be better fixed by rotating the insertion shaft of the elastic member 142 into the thread groove of the mounting plate in the thread direction.
  • connection of the elastic member 142 and the mounting plate 12 may not be limited to the above embodiment, but in other embodiments, a suitable fixing manner such as an adhesive connection may be adopted according to requirements. That is, the elastic member 142 may include a first joint surface parallel to the pressing end surface, and the mounting plate 12 includes a mounting surface that cooperates with the first joint surface. The first connecting surface and the mounting surface are glued together to achieve the connection of the elastic member 142 and the mounting plate 12.
  • the spacer posts 144 are cylindrical.
  • spacer posts 144 are formed in a cylindrical shape to reduce the volume.
  • the shape of the spacer 144 is not limited to a cylindrical shape, and in other embodiments, the prism shape can be made according to production needs.
  • the spacer posts 144 can be made of plastic.
  • the spacer posts 144 have sufficient mechanical strength to support the substrate 2000.
  • the resilient member 142 includes a third connecting end 1424 that includes a fourth connecting end 1444 that mates with the third connecting end 1424.
  • the third connection end 1424 includes a threaded spigot
  • the fourth connection end 1444 includes a threaded slot that mates with the plunging shaft.
  • connection of the elastic member 142 and the spacer post 144 may not be limited to the above embodiment, but in other embodiments, a suitable fixing manner such as an adhesive connection may be adopted according to requirements. That is, the elastic member 142 may include a third connecting face parallel to the pressing end face, and the spacer post 144 includes a fourth connecting face that cooperates with the third connecting face. The third connecting surface and the fourth connecting surface are bonded by glue to realize the connection of the elastic member 142 and the spacer post 144.
  • the elastic member 142 can be first connected with the spacer post 144 to form The spacer assemblies 14 are then mounted in an array on the mounting plate 12.
  • the mounting order of the elastic member 142, the spacer post 144, and the mounting plate 12 may not be limited to the above embodiment, and the mounting sequence may be changed according to production needs.
  • the sensing component 16 includes sensors 162 disposed in an array disposed between the resilient member 142 and the mounting plate 12, each sensor 162 for detecting the spring force of the corresponding resilient member 142.
  • the sensors 142 correspond to the spacer assemblies 14 one by one, that is, each sensor 162 and one spacer assembly 14 are in contact with each other.
  • the corresponding sensor 162 can detect the corresponding elastic member 142. Elasticity.
  • the sensor 162 measures the elastic force of the corresponding elastic member 142, thereby obtaining the force of the array of the spacer members 14.
  • the mounting plane 122 includes grooves arranged in an array with the sensor 162 disposed within the recess in an in-line manner.
  • the mounting plate 12 can include an upper surface 124 away from the abutting end surface 1442 and a mounting plane 122 adjacent to the pressing end surface 1442.
  • the grooves are arranged in an array on the mounting plane 122, and the sensor 162 is embedded in the recess. The fixing of the sensor 162 is achieved.
  • the groove may communicate with the upper surface 124 and the mounting plane 122, or may not communicate with the upper surface 124 and the mounting plane 122.
  • the thickness of the contact plate 10 can be reduced.
  • sensor 162 includes a pressure sensor.
  • the pressure sensor converts the elastic force of the elastic member 142 into an electrical signal and transmits it to the external control unit 22.
  • the alignment system 100 provided by the present invention can include an evaporation magnetic plate 20 , a contact plate 10 , and a control unit 22 .
  • the alignment system 100 is used for the alignment mask 200 and the substrate 2000.
  • the alignment principle of the alignment system 100 is that the sensing component 16 detects the magnetic force of the vapor deposition magnetic plate 20 or the force of the spacer column assembly 14 before and after the evaporation of the magnetic plate 20, and the control unit 22 receives the force of the spacer assembly 14. The situation is analyzed and the force of the substrate 2000 is analyzed, and the vapor-deposited magnetic plate 20 is controlled to change the magnetic field distribution so that the substrate 2000 is evenly stressed, so that the mask 200 and the substrate 2000 are aligned accurately.
  • Control unit 22 includes a computer, or other processing device.
  • the control unit 22 can receive the force of the spacer component 14 detected by the sensing component 16, and analyze the force of the substrate 2000 to establish a mathematical model through the data processing software.
  • Data software can include Matlab, Origion, Maple.
  • control unit 22 can also convert the force model of the substrate 2000 into a corresponding magnetic field distribution.
  • the magnetic field distribution referred to herein is represented by a magnetic field value which is measured in accordance with the average force value of the substrate 2000. That is to say, the value of the magnetic field corresponding to the substrate 2000 having a large average force value is large, and the value of the magnetic field corresponding to the substrate 2000 having a small average force value is small.
  • FIG. 3 is an operational procedure of the alignment system 100 .
  • step S101 is performed, the vapor-deposited magnetic plate 20 is not energized, the substrate 2000 is in contact with the contact plate 10, the sensing component 16 detects the force of the array of spacer posts 14, and the control unit 22 receives the force of the spacer assembly 14.
  • the force of the substrate 2000 is analyzed, and then a force model diagram of the substrate 2000 when the vapor-deposited magnetic plate 20 is not energized is established.
  • steps S103 and S104 are performed to energize the vapor-deposited magnetic plate 20, the vapor-deposited magnetic plate 20 is magnetically connected, the mask 200 is adsorbed, the substrate 2000 is sandwiched between the contact plate 10 and the mask 200, and the sensor member detects the spacer again.
  • the control unit 22 receives the force of the spacer assembly 14 again and analyzes the force of the substrate 2000, thereby establishing a force model diagram of the substrate 2000 after the vapor deposition magnetic plate 20 is energized.
  • control unit 22 converts the force model of the substrate 2000 into a corresponding magnetic field value.
  • the force model of the plurality of substrates 2000 is collected, and the magnetic field distribution of the vapor-deposited magnetic plates 20 corresponding to the plurality of substrates 2000 is obtained.
  • steps S106 and S107 are performed, and the control unit 22 compares the magnetic field distribution to find the optimal magnetic field distribution, and controls the driving device 24 to drive the vapor-deposited magnetic plate 20, thereby changing the magnetic field distribution and making the substrate 2000 evenly stressed.
  • the force diagram of the substrate 2000 is a three-dimensional diagram, and the plane where the X-axis and the Y-axis are located is parallel to the plane where the substrate 2000 is located, and is used to indicate the position of the substrate 2000, the Z-axis. Indicates the magnitude of the force applied to the substrate 2000, and the force value increases in the direction indicated by the arrow.
  • the substrate 2000 hangs down at the center due to its own gravity, so that the entire substrate 2000 is unevenly stressed. It can be seen that the force value at the center is relatively small, and the value of the edge force is large.
  • the substrate 2000 is forced to change. It can be seen that the force value at the center becomes smaller, the edge force value becomes larger, and the force distribution of the whole substrate 2000 is more uniform with respect to the force distribution of the substrate 2000 when the vapor deposition magnetic plate 20 is not energized, because the contact plate 10 The force of the vapor-deposited magnetic plate 20 acting on the substrate 2000 is uniformly dispersed.
  • the evaporated magnetic plate 20 includes magnetic elements 202 arranged in an array.
  • the control unit 22 changes the magnetic field distribution of the vapor-deposited magnetic plate 20 by changing the magnetic pole distribution and/or the magnetic field size of the magnetic element 202.
  • the magnetic element 202 can be made of an electromagnet.
  • the magnetic pole distribution and/or the magnitude of the magnetic field of the electromagnet are related to the current passing through the inside of the electromagnet, and the control unit 22 can change the magnitude of the current passing through the electromagnet by changing the magnitude of the voltage applied across the electromagnet, thereby changing the magnetic pole distribution and/or The size of the magnetic field.
  • the magnetic element 202 can also be made from a common magnet having a high magnetic force.
  • the control unit 22 can perform a corresponding alignment adjustment action by the control command to change the magnetic pole distribution and magnetic force of the magnetic component 202 made of the common magnet. Field size.
  • the magnetic elements 202 are arranged in an array, and are arranged in a one-to-one correspondence with the substrate 2000. Assuming that a vapor-deposited magnetic plate 20 can evaporate 25 substrates 2000, it can be seen that the value of the magnetic field on the right side is significantly larger than the value of the magnetic field on the left side, indicating that the substrate 2000 on the right side is too strong, and the corresponding substrate on the right side needs to be reduced. Magnetic field strength.
  • control unit 22 calculates the average magnetic field value of the entire vapor-deposited magnetic plate 20, and calculates the magnitude of the current required to generate the average magnetic field value or the number and orientation of the magnet, by changing the magnitude of the voltage applied to the electromagnet or performing The alignment adjustment action is performed to change the magnetic pole distribution and/or the magnetic field size of the magnetic element 202 so that the magnetic field distribution on both the left and right sides is uniform.
  • the alignment system 100 includes an evaporated magnetic plate 20, a contact plate 10, and a control unit 22, and also drives the device 24.
  • the control unit 22 drives the vapor-deposited magnetic plate 20 by controlling the driving device 24 to move the adsorption mask 200 up.
  • the drive unit 24 includes an interface that is electrically coupled to the control unit 22 and the vapor-deposited magnetic plate 20, respectively.
  • the control unit 22 transmits an instruction to be executed to the drive unit 24 via the interface, and the drive unit 24 executes an instruction to drive the vapor deposition magnetic plate 20 to change the magnetic pole distribution and/or the magnetic field size.
  • the instructions executed by the drive unit 24 include varying the amount of voltage applied to the vapor-deposited magnetic plate 20.
  • the magnetic pole distribution of the vapor deposition magnetic plate 20 is divided into four regions, namely, an A1 electromagnetic region, an A2 electromagnetic region, an A3 electromagnetic region, an A4 electromagnetic region, and an A5 electromagnetic region.
  • the driving device 24 does not drive the vapor-deposited magnetic plate 20 to change the magnetic field distribution
  • the magnetic pole distribution of the vapor-deposited magnetic plate 20 is as shown in FIG.
  • the driving device 24 drives the vapor-deposited magnetic plate 20 to change the magnetic field distribution
  • the magnetic pole distribution of the vapor-deposited magnetic plate 20 is changed from FIG. 7 to FIG. 8, that is, the magnetic pole of the A5 electromagnetic region is changed.
  • the magnetic field distribution of the entire vapor-deposited magnetic plate 20 is uniform, so that the substrate 2000 on the right side is less stressed and the deformation is reduced, so that it is more closely fitted to the mask 200.
  • the vapor deposition apparatus 1000 provided by the present invention includes a mask 200 and a alignment system 100 for vapor deposition of the substrate 2000 .
  • the mask 200 is disposed in parallel with the substrate 2000, and the mask 200 is formed with openings corresponding to the color pixel array so that the organic light-emitting material is vapor-deposited through the mask 200 onto the substrate 2000.
  • the alignment system 100 is disposed in parallel with the substrate 2000 to ensure that the mask 200 and the substrate 2000 are aligned accurately. Since the vapor deposition device 1000 provided by the present invention includes the alignment system 100 of the above embodiment, the vapor deposition device 1000 provided by the present invention provides at least all the advantageous effects of the above embodiments.
  • the substrate 2000 can be a flexible substrate.
  • the material of the flexible substrate includes a PET film and a metal foil.
  • OLEDs are thin and vapor-deposited onto flexible substrates to make OLED displays more durable and lighter.
  • the substrate 2000 can be not limited to a flexible substrate, but in other embodiments, it can also be a rigid substrate, such as a glass substrate.
  • the contact plate 10, the alignment system 100, and the vapor deposition device 1000 can also force the substrate 2000 to be uniform, thereby reducing the stress on the substrate 2000.
  • the evaporation device is configured to vaporize the organic light-emitting material to the substrate 2000 through the mask 200.
  • the mask 200 is formed with an opening corresponding to the color pixel array. That is to say, at the opening, the organic light-emitting material may be evaporated onto the substrate 2000, and at the unopened, no organic light-emitting material is evaporated onto the substrate 2000.
  • the vapor deposition device 1000 is not limited to vapor deposition of the organic light-emitting material, and in other embodiments, the substrate 2000 may be vapor-deposited with other materials.
  • the vapor deposition device 1000 is not limited to use in manufacturing an OLED display.

Abstract

Disclosed in the present invention are a contact plate, an alignment system, and a vapor deposition device. The alignment system comprises a contact plate and a vapor deposition magnetic plate, for use in the alignment between a mask and a substrate. The contact plate comprises multiple spacer assemblies and sensing components disposed on a mounting plate and arranged in an array. The spacer assemblies are used for dispersing the strength generated when the vapor deposition magnetic plate presses downwards, so as to prevent deformation. The sensing components are used for detecting the force applied to each spacer assembly, and the force condition is used for analyzing the force applied to the substrate to control the vapor deposition magnetic plate to change the distribution of the magnetic field, so that the force applied to the substrate is uniform. The combination of the spacer assemblies and the sensing components enables the substrate and the mask to be accurately aligned, thereby effectively preventing the phenomenon of color mixing.

Description

接触板、对位系统和蒸镀装置Contact plate, alignment system and evaporation device 技术领域Technical field
本发明涉及显示器制造技术,特别涉及接触板、对位系统和蒸镀装置。The present invention relates to display manufacturing techniques, and more particularly to contact plates, alignment systems, and vapor deposition devices.
背景技术Background technique
现有的有机发光二极管(organic light emitting diode,OLED)显示器制造过程中需要将有机发光材料透过掩膜蒸镀到基板上,掩膜形成与像素阵列对应的开孔,如此,有机发光材料可以呈像素阵列附着于基板上。因此,掩膜与基板的对位很重要,假若对位不准,则可能出现混色现象,导致OLED显示器显示质量下降。目前的蒸镀设备包括蒸镀磁板和接触板,掩膜采用磁性材料制成,接触板和基板依次设置在蒸镀磁板和掩膜之间,蒸镀磁板用于吸附掩膜以将基板夹在接触板和掩膜之间,实现掩膜与基板的对位和贴附。然而现有的接触板设计难以保证使基板与掩膜完美贴合,无法有效防止混色现象发生。In the manufacturing process of an existing organic light emitting diode (OLED) display, the organic light emitting material needs to be evaporated onto the substrate through a mask, and the mask forms an opening corresponding to the pixel array. Thus, the organic light emitting material can be The pixel array is attached to the substrate. Therefore, the alignment between the mask and the substrate is very important. If the alignment is not accurate, color mixing may occur, resulting in degradation of the display quality of the OLED display. The current vapor deposition apparatus includes an evaporation magnetic plate and a contact plate, the mask is made of a magnetic material, the contact plate and the substrate are sequentially disposed between the vapor deposition magnetic plate and the mask, and the vapor deposition magnetic plate is used for adsorbing the mask to The substrate is sandwiched between the contact plate and the mask to achieve alignment and attachment of the mask to the substrate. However, the existing contact plate design is difficult to ensure that the substrate and the mask are perfectly fitted, and the color mixing phenomenon cannot be effectively prevented.
发明内容Summary of the invention
本发明根据现有技术的不足提供一种接触板、对位系统、蒸镀装置。The present invention provides a contact plate, a registration system, and an evaporation device according to the deficiencies of the prior art.
本发明提供的接触板用于蒸镀装置的对位系统,所述对位系统用于对位掩膜与基板并包括蒸镀磁板,所述蒸镀磁板用于吸附掩膜以将所述掩膜吸附在接触板上而所述基板夹在所述接触板和所述掩膜之间,所述接触板包括:The contact plate provided by the invention is used for a aligning system of an evaporation device, and the aligning system is used for a aligning mask and a substrate and includes an evaporation magnetic plate, wherein the vapor deposition magnetic plate is used for adsorbing a mask to The mask is adsorbed on the contact plate and the substrate is sandwiched between the contact plate and the mask, the contact plate comprising:
安装板;Mounting plate
多个设置在所述安装板上且呈阵列排布的间隔柱组件,每个所述间隔柱组件包括间隔柱和连接所述间隔柱和所述安装板的弹性件,所述间隔柱包括与所述弹性件连接的连接端和与远离所述弹性件的抵压端面,所述基板抵压在所述抵压端面上;a plurality of spacer pillar assemblies disposed on the mounting plate and arranged in an array, each of the spacer pillar assemblies including a spacer pillar and an elastic member connecting the spacer pillar and the mounting panel, the spacer pillar including a connecting end of the elastic member and a pressing end surface away from the elastic member, the substrate is pressed against the pressing end surface;
传感部件,用于检测每个所述间隔柱组件的受力情况,所述受力情况用于分析所述基板的受力情况以控制所述蒸镀磁板改变磁场分布以使所述基板受力均匀。a sensing component, configured to detect a force condition of each of the spacer components, wherein the force condition is used to analyze a force condition of the substrate to control the vapor deposition magnetic plate to change a magnetic field distribution to make the substrate Even by force.
在某些实施方式中,所述安装板采用硬塑料或无磁性的硬质材料制成。In certain embodiments, the mounting plate is made of a hard plastic or a non-magnetic hard material.
在某些实施方式中,所述安装板的形状和大小与所述基板配合。In some embodiments, the mounting plate is shaped and sized to mate with the substrate.
在某些实施方式中,所述安装板包括有安装平面,所述间隔柱组件设置在所述安装平面上,所述安装平面与所述抵压端面平行。In some embodiments, the mounting plate includes a mounting plane, the spacer post assembly being disposed on the mounting plane, the mounting plane being parallel to the abutting end surface.
在某些实施方式中,所述弹性件包括弹簧。In certain embodiments, the elastic member comprises a spring.
在某些实施方式中,所述弹性件包括第一连接端,所述安装板包括与所述第一连接端互相配合的第二连接端。 In some embodiments, the elastic member includes a first connecting end, and the mounting plate includes a second connecting end that cooperates with the first connecting end.
在某些实施方式中,所述第一连接端包括带螺纹的插轴,所述第二连接端包括与所述插轴配合的螺纹槽。In some embodiments, the first connection end includes a threaded spigot, and the second connection end includes a threaded groove that mates with the arbor.
在某些实施方式中,所述间隔柱为圆柱形。In certain embodiments, the spacer is cylindrical.
在某些实施方式中,所述弹性件包括第三连接端,所述间隔柱包括与所述第三连接端互相配合的第四连接端。In some embodiments, the elastic member includes a third connecting end, and the spacer includes a fourth connecting end that cooperates with the third connecting end.
在某些实施方式中,所述第三连接端包括带有螺纹的插轴,所述第四连接端包括与所述插轴配合的螺纹槽。In certain embodiments, the third connection end includes a threaded insert shaft, and the fourth connection end includes a threaded groove that mates with the insert shaft.
在某些实施方式中,所述传感部件包括设置在所述弹性件与所述安装板之间且呈阵列排布的传感器,每个所述传感器用于检测对应的所述弹性件的弹力。In some embodiments, the sensing component includes a sensor disposed between the elastic member and the mounting plate and arranged in an array, each of the sensors for detecting a corresponding elastic force of the elastic member .
在某些实施方式中,所述安装平面包括呈阵列排布的凹槽,所述传感器以内嵌的方式设置在所述凹槽内。In some embodiments, the mounting plane includes grooves arranged in an array, the sensor being disposed in the groove in an in-line manner.
在某些实施方式中,所述传感器阵列包括压力传感器。In certain embodiments, the sensor array includes a pressure sensor.
本发明提供的对位系统,用于在蒸镀装置中对位掩膜与基板,包括:The alignment system provided by the present invention is used for aligning a mask and a substrate in an evaporation device, including:
蒸镀磁板;Evaporating magnetic plate;
上述的接触板;和The above contact plate; and
控制单元,用于分析所述受力情况并控制所述蒸镀磁板改变磁场分布以使所述基板受力均匀。And a control unit configured to analyze the force condition and control the vapor deposition magnetic plate to change a magnetic field distribution to uniformly stress the substrate.
在某些实施方式中,所述蒸镀磁板包括呈阵列排布的磁性元件,所述控制单元用于通过改变所述磁性元件的磁极分布和/或磁场大小以改变所述磁场分布。In some embodiments, the vapor-deposited magnetic plate includes magnetic elements arranged in an array for changing the magnetic field distribution by varying a magnetic pole distribution and/or a magnetic field size of the magnetic element.
在某些实施方式中,所述对位系统包括驱动装置;In some embodiments, the alignment system includes a drive device;
所述控制单元用于控制所述驱动装置驱动所述蒸镀磁板靠近所述接触板。The control unit is configured to control the driving device to drive the vapor deposition magnetic plate to be close to the contact plate.
本发明提供的蒸镀装置,用于蒸镀基板,包括:The vapor deposition device provided by the present invention is used for vapor deposition of a substrate, comprising:
掩膜;和Mask; and
上述的对位系统。The above alignment system.
在某些实施方式中,所述基板为柔性基板。In certain embodiments, the substrate is a flexible substrate.
在某些实施方式中,所述蒸镀装置用于透过所述掩膜给所述基板蒸镀有机发光材料。In some embodiments, the evaporation device is configured to vaporize the organic light-emitting material to the substrate through the mask.
本发明提供的接触板利用所述间隔柱组件阵列分散所述蒸镀磁板下压作用于所述基板的力量,防止基板因压力产生二次形变,以及利用所述传感部件检测所述间隔柱组件的受力情况,然后分析所述基板的受力情况,判断所述蒸镀磁场的分布是否合适,若发现所述蒸镀磁场分布不均匀,利用控制单元来操控所述蒸镀磁板,改变磁场分布,使所述基板受力均匀。所述接触板利用所述间隔柱组件阵列和所述传感部件的互相配合,能使所述基板与所述掩膜完美贴合,有效防止混色现象发生。 The contact plate provided by the present invention utilizes the array of spacer pillar assemblies to disperse the force of the vapor deposition magnetic plate to act on the substrate, prevent secondary deformation of the substrate due to pressure, and detect the interval by using the sensing component. The force of the column assembly is then analyzed, and the force of the substrate is analyzed to determine whether the distribution of the vapor deposition magnetic field is appropriate. If the evaporation magnetic field distribution is found to be uneven, the control unit is used to manipulate the vapor deposition magnetic plate. The magnetic field distribution is changed to make the substrate uniformly stressed. The contact plate can make the substrate and the mask perfectly fit by using the mutual matching of the spacer column assembly and the sensing component, thereby effectively preventing the color mixing phenomenon from occurring.
本发明的实施方式的附加方面和优点将在下面的描述中部分给出,部分将从下面的描述中变得明显,或通过本发明的实施方式的实践了解到。The additional aspects and advantages of the embodiments of the present invention will be set forth in part in the description which follows.
附图说明DRAWINGS
本发明的上述和/或附加的方面和优点从结合下面附图对实施方式的描述中将变得明显和容易理解,其中:The above and/or additional aspects and advantages of the present invention will become apparent and readily understood from
图1是本发明实施方式提供的蒸镀装置的平面示意图;1 is a schematic plan view of a vapor deposition device according to an embodiment of the present invention;
图2是本发明实施方式提供的接触板的局部平面示意图;2 is a partial plan view of a contact plate according to an embodiment of the present invention;
图3是本发明实施方式提供的对位系统操作步骤示意图;3 is a schematic diagram of operational steps of a registration system according to an embodiment of the present invention;
图4是本发明实施方式提供的蒸镀磁板通磁前或磁板下降前基板受力模型示意图;4 is a schematic diagram of a force model of a substrate before or after a magnetic plate of a vapor-deposited magnetic plate according to an embodiment of the present invention;
图5是本发明实施方式提供的蒸镀磁板通磁后或磁板下降后基板受力模型示意图;5 is a schematic diagram of a force-receiving model of a substrate after the magnetic plate of the vapor-deposited magnetic plate or after the magnetic plate is lowered according to an embodiment of the present invention;
图6是本发明实施方式提供的蒸镀磁板磁场分布示意图;6 is a schematic view showing a magnetic field distribution of an evaporated magnetic plate according to an embodiment of the present invention;
图7是本发明实施方式提供的驱动装置未驱动蒸镀磁板的磁极分布示意图;7 is a schematic view showing a magnetic pole distribution of a driving device that does not drive an evaporated magnetic plate according to an embodiment of the present invention;
图8是本发明实施方式提供的驱动装置驱动蒸镀磁板后的磁极分布示意图;8 is a schematic view showing a magnetic pole distribution after driving a vapor deposition magnetic plate according to an embodiment of the present invention;
主要元件符号说明:The main component symbol description:
接触板10、安装板12、安装平面122、上表面124、第二连接端126、间隔柱组件14、弹性件142、第一连接端1422、第三连接端1424、间隔柱144、抵压端面1442、第四连接端1444、传感部件16、传感器162、对位系统100、蒸镀磁板20、磁性元件202、控制单元22、驱动装置24、蒸镀装置1000、掩膜200、基板2000。 Contact plate 10, mounting plate 12, mounting plane 122, upper surface 124, second connecting end 126, spacer post assembly 14, elastic member 142, first connecting end 1422, third connecting end 1424, spacer post 144, pressing end face 1442, fourth connecting end 1444, sensing component 16, sensor 162, alignment system 100, vapor deposition magnetic plate 20, magnetic element 202, control unit 22, driving device 24, vapor deposition device 1000, mask 200, substrate 2000 .
具体实施方式detailed description
下面详细描述本发明的实施方式,所述实施方式的示例在附图中示出,其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施方式是示例性的,仅用于解释本发明,而不能理解为对本发明的限制。The embodiments of the present invention are described in detail below, and the examples of the embodiments are illustrated in the drawings, wherein the same or similar reference numerals indicate the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the drawings are intended to be illustrative of the invention and are not to be construed as limiting.
在本说明书的描述中,参考术语“某些实施方式”、“一个实施方式”、“一些实施方式”、“示意性实施方式”、“示例”、“具体示例”、或“一些示例”的描述意指结合实施方式或示例描述的具体特征、结构、材料或者特点包含于本发明的至少一个实施方式或示例中。在本说明书中,对上述术语的示意性表述不一定指的是相同的实施方式或示例。而且,描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施方式或示例中以合适的方式结合。In the description of the present specification, reference is made to the terms "some embodiments", "one embodiment", "some embodiments", "illustrative embodiments", "example", "specific examples", or "some examples" The description means that specific features, structures, materials or characteristics described in connection with the embodiments or examples are included in at least one embodiment or example of the invention. In the present specification, the schematic representation of the above terms does not necessarily mean the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in a suitable manner in any one or more embodiments or examples.
在本发明的描述中,需要理解的是,术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、 “水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本发明的描述中,“多个”的含义是两个或两个以上,除非另有明确具体的限定。In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " After, "left", "right", "vertical", The orientation or positional relationship indicated by "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise" is based on the orientation or positional relationship shown in the drawings, only for The invention is not limited by the scope of the invention, and is not intended to be a limitation of the invention. Moreover, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, features defining "first" or "second" may include one or more of the described features either explicitly or implicitly. In the description of the present invention, the meaning of "a plurality" is two or more unless specifically and specifically defined otherwise.
在本发明的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接或可以相互通讯;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本发明中的具体含义。In the description of the present invention, it should be noted that the terms "installation", "connected", and "connected" are to be understood broadly, and may be fixed or detachable, for example, unless otherwise explicitly defined and defined. Connected, or integrally connected; may be mechanically connected, may be electrically connected or may communicate with each other; may be directly connected, or may be indirectly connected through an intermediate medium, may be internal communication of two elements or interaction of two elements relationship. For those skilled in the art, the specific meanings of the above terms in the present invention can be understood on a case-by-case basis.
在本发明中,除非另有明确的规定和限定,第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触,也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且,第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方,或仅仅表示第一特征水平高度小于第二特征。In the present invention, the first feature "on" or "under" the second feature may include direct contact of the first and second features, and may also include first and second features, unless otherwise specifically defined and defined. It is not in direct contact but through additional features between them. Moreover, the first feature "above", "above" and "above" the second feature includes the first feature directly above and above the second feature, or merely indicating that the first feature level is higher than the second feature. The first feature "below", "below" and "below" the second feature includes the first feature directly below and below the second feature, or merely the first feature level being less than the second feature.
下文的公开提供了许多不同的实施方式或例子用来实现本发明的不同结构。为了简化本发明的公开,下文中对特定例子的部件和设置进行描述。当然,它们仅仅为示例,并且目的不在于限制本发明。此外,本发明可以在不同例子中重复参考数字和/或参考字母,这种重复是为了简化和清楚的目的,其本身不指示所讨论各种实施方式和/或设置之间的关系。此外,本发明提供了的各种特定的工艺和材料的例子,但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。The following disclosure provides many different embodiments or examples for implementing different structures of the present invention. In order to simplify the disclosure of the present invention, the components and arrangements of the specific examples are described below. Of course, they are merely examples and are not intended to limit the invention. In addition, the present invention may be repeated with reference to the numerals and/or reference numerals in the various examples, which are for the purpose of simplicity and clarity, and do not indicate the relationship between the various embodiments and/or arrangements discussed. Moreover, the present invention provides examples of various specific processes and materials, but one of ordinary skill in the art will recognize the use of other processes and/or the use of other materials.
请参阅图1,本发明实施方式的接触板10可以应用于蒸镀装置1000的对位系统100。对位系统100用于对位掩膜200与基板2000。对位系统100包括蒸镀磁板20。蒸镀磁板20用于吸附掩膜200以将基板2000夹在接触板10和掩膜200之间。Referring to FIG. 1 , the contact plate 10 of the embodiment of the present invention can be applied to the alignment system 100 of the vapor deposition apparatus 1000 . The alignment system 100 is used for the alignment mask 200 and the substrate 2000. The alignment system 100 includes an evaporated magnetic plate 20. The vapor-deposited magnetic plate 20 is used to adsorb the mask 200 to sandwich the substrate 2000 between the contact plate 10 and the mask 200.
如此,蒸镀装置1000可以透过掩膜200对基板2000进行蒸镀,例如蒸镀有机发光材料以形成显示像素。In this manner, the vapor deposition device 1000 can vapor-deposit the substrate 2000 through the mask 200, for example, vapor-depositing the organic light-emitting material to form display pixels.
请参阅图2,接触板10包括安装板12、多个间隔柱组件14和传感器部件16。间隔柱组件14设置在安装板12上且呈阵列排布,每个间隔柱组件14包括间隔柱144和连接间隔 柱144和安装板12的弹性件142。间隔柱144包括与弹性件142连接的连接端1444和与远离弹性件142的抵压端面1442。基板2000抵压在抵压端面1442上,从而使接触板10与基板2000接触。传感部件16用于检测每个间隔柱组件14的受力情况,受力情况用于分析基板2000的受力情况以控制蒸镀磁板20改变磁场分布以使基板2000受力均匀。Referring to FIG. 2, the contact plate 10 includes a mounting plate 12, a plurality of spacer post assemblies 14 and a sensor component 16. The spacer assemblies 14 are disposed on the mounting plate 12 and are arranged in an array, each spacer assembly 14 including spacer posts 144 and connection spacing The post 144 and the resilient member 142 of the mounting plate 12. The spacer post 144 includes a connecting end 1444 that is coupled to the resilient member 142 and a resisting end face 1442 that is remote from the resilient member 142. The substrate 2000 is pressed against the pressing end surface 1442 so that the contact plate 10 is in contact with the substrate 2000. The sensing component 16 is configured to detect the force of each spacer component 14. The force condition is used to analyze the force of the substrate 2000 to control the vapor deposition magnetic plate 20 to change the magnetic field distribution to make the substrate 2000 uniform.
可以理解,本发明其他实施方式的对位系统100可以包括接触板10和蒸镀磁板20。It will be appreciated that the alignment system 100 of other embodiments of the present invention may include a contact plate 10 and an evaporated magnetic plate 20.
可以理解,本发明其他实施方式的蒸镀装置1000可以包括对位系统100和掩膜200,并用于蒸镀基板100以制造显示装置,例如OLED显示器。It is to be understood that the evaporation apparatus 1000 of other embodiments of the present invention may include the alignment system 100 and the mask 200, and is used to vapor-deposit the substrate 100 to manufacture a display device such as an OLED display.
可以理解,本发明实施方式的接触板10、对位系统100和蒸镀装置1000可以用于制造OLED柔性显示器,因此,基板2000一般采用柔性材料制成,例如PET薄膜。因此,基板2000在与掩膜200的对位时,难以在传统的接触板上平坦撑开,或者由于受力不均,每次撑开的形状和位置存在差异,如此将导致基板2000与掩膜200难以精准对位,从而出现多次蒸镀(蒸镀红色、绿色和蓝色三种颜色像素阵列基板2000需与掩膜200进行三次对位并进行三次蒸镀)时,不同次的蒸镀材料有可能发生干涉(例如不同的颜色像素发生干涉),从而出现混色现象。It can be understood that the contact plate 10, the alignment system 100 and the evaporation device 1000 of the embodiments of the present invention can be used to manufacture an OLED flexible display. Therefore, the substrate 2000 is generally made of a flexible material such as a PET film. Therefore, when the substrate 2000 is aligned with the mask 200, it is difficult to spread flat on the conventional contact plate, or there is a difference in the shape and position of each opening due to uneven force, which will result in the substrate 2000 and the mask. The film 200 is difficult to accurately align, so that multiple vapor deposition occurs (the red, green, and blue color pixel array substrates 2000 are required to be three times aligned with the mask 200 and three times vapor-deposited), and steaming is different. The plating material may interfere (for example, interference occurs in different color pixels), resulting in color mixing.
然而,本发明实施方式的接触板10、对位系统100和蒸镀装置1000可以利用传感部件16检测每个间隔柱组件14的受力情况,受力情况用于分析基板2000的受力情况以控制蒸镀磁板20改变磁场分布以使基板2000受力均匀,从而改善基板2000的平坦度,进而确保基板2000与掩膜200对位的精准度,避免混色现象出现。However, the contact plate 10, the alignment system 100, and the vapor deposition device 1000 of the embodiment of the present invention can detect the force of each spacer column assembly 14 by using the sensing member 16, and the force condition is used to analyze the force of the substrate 2000. The control of the vapor deposition magnetic plate 20 changes the magnetic field distribution to make the substrate 2000 uniform, thereby improving the flatness of the substrate 2000, thereby ensuring the accuracy of the alignment of the substrate 2000 and the mask 200, and avoiding the occurrence of color mixing.
在某些实施方式中,安装板12可以采用硬塑料或者无磁性的硬质材料制成。In some embodiments, the mounting plate 12 can be made of a hard plastic or a non-magnetic hard material.
如此,安装板12具有比较高的刚度,可以给间隔柱组件14提供足够的支撑强度。As such, the mounting plate 12 has a relatively high stiffness that provides sufficient support strength to the spacer assembly 14.
在某些实施方式中,安装板12的形状和大小可以与基板2000配合。In some embodiments, the mounting plate 12 can be shaped and sized to mate with the substrate 2000.
可以理解,基板2000的形状通常为矩形,安装板12的形状和大小可以跟基板2000一一对应。It can be understood that the shape of the substrate 2000 is generally rectangular, and the shape and size of the mounting board 12 can be in one-to-one correspondence with the substrate 2000.
如此可以提高空间利用率。This can improve space utilization.
在某些实施方式中,安装板12可以包括安装平面122。安装平面122与抵压端面1442平行。间隔柱组件14设置在安装平面122上。In certain embodiments, the mounting plate 12 can include a mounting plane 122. The mounting plane 122 is parallel to the abutting end face 1442. The spacer assembly 14 is disposed on the mounting plane 122.
由于安装在安装平面122上,安装平面122已经具有较高的平坦度,因此,间隔件组件14远离安装板12的一端也可以形成平坦度较高的平面,从而改善基板2000的平坦度。Since the mounting plane 122 already has a high degree of flatness mounted on the mounting plane 122, the end of the spacer assembly 14 away from the mounting board 12 can also form a flatter flat surface, thereby improving the flatness of the substrate 2000.
在某些实施方式中,弹性件142包括弹簧。In certain embodiments, the resilient member 142 includes a spring.
可以理解,弹簧在蒸镀过程中起到缓冲作用。而螺旋状的弹簧,体积小巧,适于制成阵列。It can be understood that the spring acts as a buffer during the evaporation process. The spiral springs are small in size and suitable for arrays.
可以理解,弹性件142的材料可以不限于上述实施方式,而在其他实施方式中可以根据 需求采用合适的弹性材料。It can be understood that the material of the elastic member 142 may not be limited to the above embodiment, but in other embodiments may be The use of suitable elastic materials.
在某些实施方式中,弹性件142包括第一连接端1422,安装板12包括与第一连接端1422互相配合的第二连接端126。In some embodiments, the resilient member 142 includes a first connecting end 1422, and the mounting plate 12 includes a second connecting end 126 that mates with the first connecting end 1422.
可以理解,第一连接端1422与第二连接端126的配合,实现弹性件142与安装板12的连接。It can be understood that the cooperation of the first connecting end 1422 and the second connecting end 126 realizes the connection of the elastic member 142 and the mounting plate 12.
在某些实施方式中,第一连接端1422包括带螺纹的插轴,第二连接端126包括与插轴配合的螺纹槽。In certain embodiments, the first connection end 1422 includes a threaded spigot and the second connection end 126 includes a threaded slot that mates with the plunging shaft.
可以理解,将弹性件142的插轴按螺纹方向旋转插入安装板的螺纹槽,能较好地固定弹性件142和安装板12。It can be understood that the elastic member 142 and the mounting plate 12 can be better fixed by rotating the insertion shaft of the elastic member 142 into the thread groove of the mounting plate in the thread direction.
可以理解,弹性件142和安装板12的连接可以不限于上述实施方式,而在其他实施方式中可以根据需求采用合适的固定方式,比如粘合连接。也即是说,弹性件142可以包括与抵压端面平行的第一连接面,安装板12包括与第一连接面配合的安装面。第一连接面与安装面通过胶水粘接,以实现弹性件142与安装板12的连接。It can be understood that the connection of the elastic member 142 and the mounting plate 12 may not be limited to the above embodiment, but in other embodiments, a suitable fixing manner such as an adhesive connection may be adopted according to requirements. That is, the elastic member 142 may include a first joint surface parallel to the pressing end surface, and the mounting plate 12 includes a mounting surface that cooperates with the first joint surface. The first connecting surface and the mounting surface are glued together to achieve the connection of the elastic member 142 and the mounting plate 12.
在某些实施方式中,间隔柱144为圆柱形。In certain embodiments, the spacer posts 144 are cylindrical.
可以理解,将间隔柱144制成圆柱形,可以减小体积。It will be appreciated that the spacer posts 144 are formed in a cylindrical shape to reduce the volume.
可以理解,间隔柱144的形状不限于圆柱形,在其他实施方式中,可以根据生产需要制成棱柱形。It can be understood that the shape of the spacer 144 is not limited to a cylindrical shape, and in other embodiments, the prism shape can be made according to production needs.
在某些实施方式中,间隔柱144可以采用塑料制成。In some embodiments, the spacer posts 144 can be made of plastic.
如此,间隔柱144有足够的机械强度来支撑基板2000。As such, the spacer posts 144 have sufficient mechanical strength to support the substrate 2000.
在某些实施方式中,弹性件142包括第三连接端1424,间隔柱144包括与第三连接端1424互相配合的第四连接端1444。In some embodiments, the resilient member 142 includes a third connecting end 1424 that includes a fourth connecting end 1444 that mates with the third connecting end 1424.
可以理解,第三连接端1424与第四连接端1444的互相配合,实现弹性件142与间隔柱144的连接。It can be understood that the interaction of the third connecting end 1424 and the fourth connecting end 1444 realizes the connection of the elastic member 142 and the spacer post 144.
在某些实施方式中,第三连接端1424包括带有螺纹的插轴,第四连接端1444包括与插轴配合的螺纹槽。In certain embodiments, the third connection end 1424 includes a threaded spigot, and the fourth connection end 1444 includes a threaded slot that mates with the plunging shaft.
可以理解,将弹性件142的插轴按螺纹方向旋转插入间隔柱144的螺纹槽,能较好地固定弹性件142和间隔柱144。It can be understood that the insertion of the shaft of the elastic member 142 into the thread groove of the spacer post 144 in the thread direction can better fix the elastic member 142 and the spacer post 144.
可以理解,弹性件142和间隔柱144的连接可以不限于上述实施方式,而在其他实施方式中可以根据需求采用合适的固定方式,比如粘合连接。也即是说,弹性件142可以包括与抵压端面平行的第三连接面,间隔柱144包括与第三连接面配合的第四连接面。第三连接面与第四连接面通过胶水粘接,以实现弹性件142与间隔柱144的连接。It can be understood that the connection of the elastic member 142 and the spacer post 144 may not be limited to the above embodiment, but in other embodiments, a suitable fixing manner such as an adhesive connection may be adopted according to requirements. That is, the elastic member 142 may include a third connecting face parallel to the pressing end face, and the spacer post 144 includes a fourth connecting face that cooperates with the third connecting face. The third connecting surface and the fourth connecting surface are bonded by glue to realize the connection of the elastic member 142 and the spacer post 144.
可以理解,在生产接触板10的过程中,可以先将弹性件142与间隔柱144连接,形成 间隔柱组件14,再将间隔柱组件14以阵列的形式安装在安装板12上。It can be understood that, in the process of producing the contact plate 10, the elastic member 142 can be first connected with the spacer post 144 to form The spacer assemblies 14 are then mounted in an array on the mounting plate 12.
可以理解,在生产接触板10的过程中,弹性件142、间隔柱144以及安装板12的安装顺序也可以不限于上述实施方式,可以根据生产需要改变安装顺序。It can be understood that, in the process of producing the contact plate 10, the mounting order of the elastic member 142, the spacer post 144, and the mounting plate 12 may not be limited to the above embodiment, and the mounting sequence may be changed according to production needs.
在某些实施方式中,传感部件16包括设置在弹性件142与安装板12之间呈阵列排布的传感器162,每个传感器162用于检测对应的弹性件142的弹力。In some embodiments, the sensing component 16 includes sensors 162 disposed in an array disposed between the resilient member 142 and the mounting plate 12, each sensor 162 for detecting the spring force of the corresponding resilient member 142.
可以理解,传感器142一一对应间隔柱组件14,也即是说,每个传感器162与一个间隔柱组件14相互接触,当弹性件142发生形变时,对应的传感器162可以检测对应的弹性件142的弹力。It can be understood that the sensors 142 correspond to the spacer assemblies 14 one by one, that is, each sensor 162 and one spacer assembly 14 are in contact with each other. When the elastic member 142 is deformed, the corresponding sensor 162 can detect the corresponding elastic member 142. Elasticity.
如此,当弹性件142发生形变时,传感器162测得对应的弹性件142的弹力,从而得到间隔柱组件14阵列的受力情况。Thus, when the elastic member 142 is deformed, the sensor 162 measures the elastic force of the corresponding elastic member 142, thereby obtaining the force of the array of the spacer members 14.
在某些实施方式中,安装平面122包括呈阵列排布的凹槽,传感器162以内嵌的方式设置在凹槽内。In some embodiments, the mounting plane 122 includes grooves arranged in an array with the sensor 162 disposed within the recess in an in-line manner.
可以理解,安装板12可以包括远离抵压端面1442的上表面124和靠近抵压端面1442的安装平面122,凹槽以阵列排布的方式设置在安装平面122上,传感器162嵌入凹槽,从而实现传感器162的固定。It can be understood that the mounting plate 12 can include an upper surface 124 away from the abutting end surface 1442 and a mounting plane 122 adjacent to the pressing end surface 1442. The grooves are arranged in an array on the mounting plane 122, and the sensor 162 is embedded in the recess. The fixing of the sensor 162 is achieved.
可以理解,凹槽可以连通上表面124和安装平面122,也可以不连通上表面124和安装平面122。It can be understood that the groove may communicate with the upper surface 124 and the mounting plane 122, or may not communicate with the upper surface 124 and the mounting plane 122.
可以理解,将传感器162设置在安装板12内部,可以减小接触板10的厚度。It will be appreciated that by locating the sensor 162 inside the mounting plate 12, the thickness of the contact plate 10 can be reduced.
可以理解,传感器162设置在安装板12的安装方式不限于上述实施方式。It can be understood that the manner in which the sensor 162 is disposed on the mounting board 12 is not limited to the above embodiment.
在某些实施方式中,传感器162包括压力传感器。In certain embodiments, sensor 162 includes a pressure sensor.
可以理解,压力传感器将弹性件142的弹力转变为电信号,并传递给外部的控制单元22。It can be understood that the pressure sensor converts the elastic force of the elastic member 142 into an electrical signal and transmits it to the external control unit 22.
请参阅图1,在某些实施方式中,本发明提供的对位系统100可以包括蒸镀磁板20、接触板10和控制单元22。Referring to FIG. 1 , in some embodiments, the alignment system 100 provided by the present invention can include an evaporation magnetic plate 20 , a contact plate 10 , and a control unit 22 .
在蒸镀装置1000中,对位系统100用于对位掩膜200与基板2000。In the vapor deposition device 1000, the alignment system 100 is used for the alignment mask 200 and the substrate 2000.
对位系统100的对位原理为:传感部件16检测蒸镀磁板20通磁力或蒸镀磁板20下降前后间隔柱组件14的受力情况,控制单元22接收间隔柱组件14的受力情况并分析基板2000的受力情况,并控制蒸镀磁板20改变磁场分布,以使基板2000受力均匀,从而使掩膜200与基板2000对位准确。The alignment principle of the alignment system 100 is that the sensing component 16 detects the magnetic force of the vapor deposition magnetic plate 20 or the force of the spacer column assembly 14 before and after the evaporation of the magnetic plate 20, and the control unit 22 receives the force of the spacer assembly 14. The situation is analyzed and the force of the substrate 2000 is analyzed, and the vapor-deposited magnetic plate 20 is controlled to change the magnetic field distribution so that the substrate 2000 is evenly stressed, so that the mask 200 and the substrate 2000 are aligned accurately.
可以理解,在操作过程中,涉及到建立基板2000的受力模型。控制单元22包括计算机,或者其他处理设备。控制单元22能接收传感部件16检测到的间隔柱组件14的受力情况,并分析基板2000的受力情况,通过数据处理软件建立数学模型。数据软件可以包括Matlab、 Origion、Maple。It can be understood that during the operation, it involves the establishment of a force model of the substrate 2000. Control unit 22 includes a computer, or other processing device. The control unit 22 can receive the force of the spacer component 14 detected by the sensing component 16, and analyze the force of the substrate 2000 to establish a mathematical model through the data processing software. Data software can include Matlab, Origion, Maple.
另外,控制单元22还能将基板2000的受力模型转变为对应的磁场分布。这里所说的磁场分布用磁场数值表示,磁场数值是根据基板2000的平均受力数值来衡量。也即是说,平均受力数值大的基板2000对应的磁场数值大,平均受力数值小的基板2000对应的磁场数值小。In addition, the control unit 22 can also convert the force model of the substrate 2000 into a corresponding magnetic field distribution. The magnetic field distribution referred to herein is represented by a magnetic field value which is measured in accordance with the average force value of the substrate 2000. That is to say, the value of the magnetic field corresponding to the substrate 2000 having a large average force value is large, and the value of the magnetic field corresponding to the substrate 2000 having a small average force value is small.
具体地,请参阅图3,该图为对位系统100的操作步骤。Specifically, please refer to FIG. 3 , which is an operational procedure of the alignment system 100 .
首先执行步骤S101,未给蒸镀磁板20通电,基板2000与接触板10接触,传感部件16检测到间隔柱组件14阵列的受力情况,控制单元22接收间隔柱组件14的受力情况并分析基板2000的受力情况,然后建立出蒸镀磁板20未通电时基板2000的受力模型图。First, step S101 is performed, the vapor-deposited magnetic plate 20 is not energized, the substrate 2000 is in contact with the contact plate 10, the sensing component 16 detects the force of the array of spacer posts 14, and the control unit 22 receives the force of the spacer assembly 14. The force of the substrate 2000 is analyzed, and then a force model diagram of the substrate 2000 when the vapor-deposited magnetic plate 20 is not energized is established.
接着执行步骤S103及S104,给蒸镀磁板20通电,蒸镀磁板20通磁,掩膜200被吸附,基板2000夹在接触板10和掩膜200之间,传感器件再次检测到间隔柱组件14阵列12的受力情况,控制单元22再次接收间隔柱组件14的受力情况并分析基板2000的受力情况,以此建立出蒸镀磁板20通电后基板2000的受力模型图。Then, steps S103 and S104 are performed to energize the vapor-deposited magnetic plate 20, the vapor-deposited magnetic plate 20 is magnetically connected, the mask 200 is adsorbed, the substrate 2000 is sandwiched between the contact plate 10 and the mask 200, and the sensor member detects the spacer again. When the force of the array 12 of the assembly 14 is received, the control unit 22 receives the force of the spacer assembly 14 again and analyzes the force of the substrate 2000, thereby establishing a force model diagram of the substrate 2000 after the vapor deposition magnetic plate 20 is energized.
继续执行步骤S105,控制单元22将基板2000的受力模型转变为对应的磁场数值。收集多块基板2000的受力模型,进而得到多块基板2000对应的蒸镀磁板20的磁场分布。Proceeding to step S105, the control unit 22 converts the force model of the substrate 2000 into a corresponding magnetic field value. The force model of the plurality of substrates 2000 is collected, and the magnetic field distribution of the vapor-deposited magnetic plates 20 corresponding to the plurality of substrates 2000 is obtained.
最后执行步骤S106及S107,控制单元22对比上述磁场分布,找出最佳磁场分布,控制驱动装置24以驱动蒸镀磁板20,从而改变磁场分布,使基板2000受力均匀。Finally, steps S106 and S107 are performed, and the control unit 22 compares the magnetic field distribution to find the optimal magnetic field distribution, and controls the driving device 24 to drive the vapor-deposited magnetic plate 20, thereby changing the magnetic field distribution and making the substrate 2000 evenly stressed.
请参阅图4和图5,本发明实施方式提供的基板2000受力模型图为三维图,X轴和Y轴所在的平面平行于基板2000所在的平面,用于表示基板2000的位置,Z轴表示基板2000受力大小,受力数值沿着箭头所指的方向递增。Referring to FIG. 4 and FIG. 5 , the force diagram of the substrate 2000 according to the embodiment of the present invention is a three-dimensional diagram, and the plane where the X-axis and the Y-axis are located is parallel to the plane where the substrate 2000 is located, and is used to indicate the position of the substrate 2000, the Z-axis. Indicates the magnitude of the force applied to the substrate 2000, and the force value increases in the direction indicated by the arrow.
请参阅图4,蒸镀磁板20未通电时,基板2000由于自身的重力在中心处下垂,使整块基板2000受力不均匀。可以看到,中心处受力数值比较小,边缘受力数值较大。Referring to FIG. 4, when the vapor deposition magnetic plate 20 is not energized, the substrate 2000 hangs down at the center due to its own gravity, so that the entire substrate 2000 is unevenly stressed. It can be seen that the force value at the center is relatively small, and the value of the edge force is large.
请参阅图5,蒸镀磁板20通电后,基板2000受力改变。可以看到,中心处受力数值变小,边缘受力数值变大,整块基板2000受力分布相对蒸镀磁板20未通电时基板2000的受力分布更加均匀,这是因为接触板10均匀分散蒸镀磁板20作用于基板2000的力量。Referring to FIG. 5, after the vapor deposition magnetic plate 20 is energized, the substrate 2000 is forced to change. It can be seen that the force value at the center becomes smaller, the edge force value becomes larger, and the force distribution of the whole substrate 2000 is more uniform with respect to the force distribution of the substrate 2000 when the vapor deposition magnetic plate 20 is not energized, because the contact plate 10 The force of the vapor-deposited magnetic plate 20 acting on the substrate 2000 is uniformly dispersed.
在某些实施方式中,蒸镀磁板20包括呈阵列排布的磁性元件202。控制单元22通过改变磁性元件202的磁极分布和/或磁场大小,从而改变蒸镀磁板20的磁场分布。In some embodiments, the evaporated magnetic plate 20 includes magnetic elements 202 arranged in an array. The control unit 22 changes the magnetic field distribution of the vapor-deposited magnetic plate 20 by changing the magnetic pole distribution and/or the magnetic field size of the magnetic element 202.
可以理解,磁性元件202可以采用电磁铁制成。电磁铁的磁极分布和/或磁场大小与通过电磁铁内部的电流有关,控制单元22可以通过改变加载在电磁铁两端的电压大小来改变通过电磁铁内部的电流大小,从而改变磁极分布和/或磁场大小。It will be appreciated that the magnetic element 202 can be made of an electromagnet. The magnetic pole distribution and/or the magnitude of the magnetic field of the electromagnet are related to the current passing through the inside of the electromagnet, and the control unit 22 can change the magnitude of the current passing through the electromagnet by changing the magnitude of the voltage applied across the electromagnet, thereby changing the magnetic pole distribution and/or The size of the magnetic field.
可以理解,磁性元件202也可以采用具有高磁力的普通磁石制成。控制单元22可以通过控制指令执行相应的排列调整动作,以改变普通磁石制成的磁性元件202的磁极分布与磁 场大小。It will be appreciated that the magnetic element 202 can also be made from a common magnet having a high magnetic force. The control unit 22 can perform a corresponding alignment adjustment action by the control command to change the magnetic pole distribution and magnetic force of the magnetic component 202 made of the common magnet. Field size.
请参阅图6,磁性元件202呈阵列排布,其排布的方式与基板2000一一对应。假设一块蒸镀磁板20能蒸镀25块基板2000,可以看到,右边的磁场数值相对于左边的磁场数值明显偏大,说明右边的基板2000受力过大,需要减小右边基板对应的磁场强度。此时,控制单元22计算出整块蒸镀磁板20的平均磁场数值,并计算出产生平均磁场数值所需的电流大小或磁石的数量、方位,通过改变加载在电磁铁的电压大小或执行排列调整动作来改变磁性元件202的磁极分布和/或磁场大小,从而使左右两边的磁场分布均匀。Referring to FIG. 6, the magnetic elements 202 are arranged in an array, and are arranged in a one-to-one correspondence with the substrate 2000. Assuming that a vapor-deposited magnetic plate 20 can evaporate 25 substrates 2000, it can be seen that the value of the magnetic field on the right side is significantly larger than the value of the magnetic field on the left side, indicating that the substrate 2000 on the right side is too strong, and the corresponding substrate on the right side needs to be reduced. Magnetic field strength. At this time, the control unit 22 calculates the average magnetic field value of the entire vapor-deposited magnetic plate 20, and calculates the magnitude of the current required to generate the average magnetic field value or the number and orientation of the magnet, by changing the magnitude of the voltage applied to the electromagnet or performing The alignment adjustment action is performed to change the magnetic pole distribution and/or the magnetic field size of the magnetic element 202 so that the magnetic field distribution on both the left and right sides is uniform.
在某些实施方式中,对位系统100包括蒸镀磁板20、接触板10和控制单元22,还驱动装置24。控制单元22通过控制驱动装置24来驱动蒸镀磁板20以吸附掩膜200上移。In some embodiments, the alignment system 100 includes an evaporated magnetic plate 20, a contact plate 10, and a control unit 22, and also drives the device 24. The control unit 22 drives the vapor-deposited magnetic plate 20 by controlling the driving device 24 to move the adsorption mask 200 up.
可以理解,驱动装置24包括分别与控制单元22和蒸镀磁板20电连接的接口。控制单元22通过接口,向驱动装置24传递待执行的指令,驱动装置24执行指令,驱动蒸镀磁板20改变磁极分布和/或磁场大小。It will be appreciated that the drive unit 24 includes an interface that is electrically coupled to the control unit 22 and the vapor-deposited magnetic plate 20, respectively. The control unit 22 transmits an instruction to be executed to the drive unit 24 via the interface, and the drive unit 24 executes an instruction to drive the vapor deposition magnetic plate 20 to change the magnetic pole distribution and/or the magnetic field size.
可以理解,驱动装置24执行的指令包括改变加载在蒸镀磁板20的电压大小。It will be appreciated that the instructions executed by the drive unit 24 include varying the amount of voltage applied to the vapor-deposited magnetic plate 20.
具体地,请参阅图7,将蒸镀磁板20的磁极分布分为四个区,分别为A1电磁区、A2电磁区、A3电磁区、A4电磁区、A5电磁区。在驱动装置24未驱动蒸镀磁板20改变磁场分布时,可以看到,蒸镀磁板20的磁极分布如图7。在驱动装置24驱动蒸镀磁板20改变磁场分布后,可以看到,蒸镀磁板20的磁极分布由图7变成图8,即A5电磁区的磁极发生改变。Specifically, referring to FIG. 7, the magnetic pole distribution of the vapor deposition magnetic plate 20 is divided into four regions, namely, an A1 electromagnetic region, an A2 electromagnetic region, an A3 electromagnetic region, an A4 electromagnetic region, and an A5 electromagnetic region. When the driving device 24 does not drive the vapor-deposited magnetic plate 20 to change the magnetic field distribution, it can be seen that the magnetic pole distribution of the vapor-deposited magnetic plate 20 is as shown in FIG. After the driving device 24 drives the vapor-deposited magnetic plate 20 to change the magnetic field distribution, it can be seen that the magnetic pole distribution of the vapor-deposited magnetic plate 20 is changed from FIG. 7 to FIG. 8, that is, the magnetic pole of the A5 electromagnetic region is changed.
如此,整块蒸镀磁板20的磁场分布均匀,使得右边的基板2000受力减小,形变减小,从而与掩膜200更加贴合。In this way, the magnetic field distribution of the entire vapor-deposited magnetic plate 20 is uniform, so that the substrate 2000 on the right side is less stressed and the deformation is reduced, so that it is more closely fitted to the mask 200.
请参阅图1,本发明提供的蒸镀装置1000包括掩膜200和对位系统100,可用于蒸镀基板2000。Referring to FIG. 1 , the vapor deposition apparatus 1000 provided by the present invention includes a mask 200 and a alignment system 100 for vapor deposition of the substrate 2000 .
在蒸镀装置1000中,掩膜200与基板2000平行设置,掩膜200形成有与颜色像素阵列对应的开孔,以便有机发光材料透过掩膜200蒸镀到基板2000上。另外,对位系统100与基板2000平行设置,确保掩膜200和基板2000对位准确。由于本发明提供的蒸镀装置1000包括上述实施方式的对位系统100,因此本发明实施提供的蒸镀装置1000至少具备上述实施方式的全部有益效果。In the vapor deposition apparatus 1000, the mask 200 is disposed in parallel with the substrate 2000, and the mask 200 is formed with openings corresponding to the color pixel array so that the organic light-emitting material is vapor-deposited through the mask 200 onto the substrate 2000. In addition, the alignment system 100 is disposed in parallel with the substrate 2000 to ensure that the mask 200 and the substrate 2000 are aligned accurately. Since the vapor deposition device 1000 provided by the present invention includes the alignment system 100 of the above embodiment, the vapor deposition device 1000 provided by the present invention provides at least all the advantageous effects of the above embodiments.
在某些实施方式中,基板2000可以是柔性基板。In some embodiments, the substrate 2000 can be a flexible substrate.
柔性基板的材料包括PET薄膜、金属箔片。OLED很薄,蒸镀到柔性基板上可以让OLED显示屏更耐用、更轻。The material of the flexible substrate includes a PET film and a metal foil. OLEDs are thin and vapor-deposited onto flexible substrates to make OLED displays more durable and lighter.
可以理解,基板2000可以不限于柔性基板,而在其他实施方式中,也可以是刚性基板,例如玻璃基板。 It can be understood that the substrate 2000 can be not limited to a flexible substrate, but in other embodiments, it can also be a rigid substrate, such as a glass substrate.
在这些实施方式中,接触板10、对位系统100和蒸镀装置1000同样可以让基板2000受力均匀,从而降低基板2000受到的应力。In these embodiments, the contact plate 10, the alignment system 100, and the vapor deposition device 1000 can also force the substrate 2000 to be uniform, thereby reducing the stress on the substrate 2000.
在某些实施方式中,所述蒸镀装置用于透过掩膜200给基板2000蒸镀有机发光材料。In some embodiments, the evaporation device is configured to vaporize the organic light-emitting material to the substrate 2000 through the mask 200.
可以理解,掩膜200形成有与颜色像素阵列对应的开孔。也即是说,在开孔处,有机发光材料可以蒸镀到基板2000上,在未开孔处,则没有有机发光材料蒸镀到基板2000上。It can be understood that the mask 200 is formed with an opening corresponding to the color pixel array. That is to say, at the opening, the organic light-emitting material may be evaporated onto the substrate 2000, and at the unopened, no organic light-emitting material is evaporated onto the substrate 2000.
可以理解,蒸镀装置1000也可以不限于蒸镀有机发光材料,而在其他实施方式中,可以对基板2000蒸镀其他的材料。It can be understood that the vapor deposition device 1000 is not limited to vapor deposition of the organic light-emitting material, and in other embodiments, the substrate 2000 may be vapor-deposited with other materials.
也即是说,蒸镀装置1000并不限于用于制造OLED显示器。That is to say, the vapor deposition device 1000 is not limited to use in manufacturing an OLED display.
尽管上面已经示出和描述了本发明的实施例,可以理解的是,上述实施例是示例性的,不能理解为对本发明的限制,本领域的普通技术人员在本发明的范围内可以对上述实施例进行变化、修改、替换和变型,本发明的范围由权利要求及其等同物限定。 Although the embodiments of the present invention have been shown and described, it is understood that the above-described embodiments are illustrative and are not to be construed as limiting the scope of the invention. The scope of the invention is defined by the claims and their equivalents.

Claims (19)

  1. 一种接触板,用于蒸镀装置的对位系统,所述对位系统用于对位掩膜与基板并包括蒸镀磁板,所述蒸镀磁板用于吸附掩膜以将所述基板夹在所述接触板和所述掩膜之间,其特征在于,所述接触板包括:A contact plate for an alignment system of an evaporation device, the alignment system being used for a alignment mask and a substrate and comprising an evaporation magnetic plate, the vapor deposition magnetic plate being used for adsorbing a mask to The substrate is sandwiched between the contact plate and the mask, wherein the contact plate comprises:
    安装板;Mounting plate
    多个设置在所述安装板上且呈阵列排布的间隔柱组件,每个所述间隔柱组件包括间隔柱和连接所述间隔柱和所述安装板的弹性件,所述间隔柱包括与所述弹性件连接的连接端和远离所述弹性件的抵压端面,所述基板抵压在所述抵压端面上;和a plurality of spacer pillar assemblies disposed on the mounting plate and arranged in an array, each of the spacer pillar assemblies including a spacer pillar and an elastic member connecting the spacer pillar and the mounting panel, the spacer pillar including a connecting end of the elastic member connecting and an abutting end surface away from the elastic member, wherein the substrate is pressed against the pressing end surface; and
    传感部件,用于检测每个所述间隔柱组件的受力情况,所述受力情况用于分析所述基板的受力情况以控制所述蒸镀磁板改变磁场分布以使所述基板受力均匀。a sensing component, configured to detect a force condition of each of the spacer components, wherein the force condition is used to analyze a force condition of the substrate to control the vapor deposition magnetic plate to change a magnetic field distribution to make the substrate Even by force.
  2. 如权利要求1所述的接触板,其特征在于,所述安装板采用硬塑料或无磁性的硬质材料制成。The contact plate according to claim 1, wherein the mounting plate is made of a hard plastic or a non-magnetic hard material.
  3. 如权利要求1所述的接触板,其特征在于,所述安装板的形状和大小与所述基板配合。The contact plate of claim 1 wherein said mounting plate is shaped and sized to mate with said substrate.
  4. 如权利要求1所述的接触板,其特征在于,所述安装板包括有安装平面,所述间隔柱组件设置在所述安装平面上,所述安装平面与所述抵压端面平行。The contact plate of claim 1 wherein said mounting plate includes a mounting plane, said spacer assembly being disposed on said mounting plane, said mounting plane being parallel to said abutting end surface.
  5. 如权利要求1所述的接触板,其特征在于,所述弹性件包括弹簧。The contact plate of claim 1 wherein said resilient member comprises a spring.
  6. 如权利要求1所述的接触板,其特征在于,所述弹性件包括第一连接端,所述安装板包括与所述第一连接端互相配合的第二连接端。The contact plate according to claim 1, wherein said elastic member comprises a first connecting end, and said mounting plate includes a second connecting end that cooperates with said first connecting end.
  7. 如权利要求6所述的接触板,其特征在于,所述第一连接端包括带螺纹的插轴,所述第二连接端包括与所述插轴配合的螺纹槽。The contact plate of claim 6 wherein said first attachment end includes a threaded insert shaft and said second attachment end includes a threaded groove that mates with said insert shaft.
  8. 如权利要求1所述的接触板,其特征在于,所述间隔柱为圆柱形。The contact plate of claim 1 wherein said spacer is cylindrical.
  9. 如权利要求1所述的接触板,其特征在于,所述弹性件包括第三连接端,所述间隔 柱包括与所述第三连接端互相配合的第四连接端。The contact plate according to claim 1, wherein said elastic member comprises a third connecting end, said spacing The post includes a fourth connection end that mates with the third connection end.
  10. 如权利要求9所述的接触板,其特征在于,所述第三连接端包括带有螺纹的插轴,所述第四连接端包括与所述插轴配合的螺纹槽。The contact plate of claim 9 wherein said third attachment end includes a threaded insert shaft and said fourth attachment end includes a threaded groove that mates with said insert shaft.
  11. 如权利要求1所述的接触板,其特征在于,所述传感部件包括设置在所述弹性件与所述安装板之间且呈阵列排布的传感器,每个所述传感器用于检测对应的所述弹性件的弹力。The contact plate according to claim 1, wherein said sensing member comprises a sensor disposed between said elastic member and said mounting plate and arranged in an array, each of said sensors for detecting a corresponding The elastic force of the elastic member.
  12. 如权利要求11所述的传感部件,其特征在于,所述安装平面包括呈阵列排布的凹槽,所述传感器以内嵌的方式设置在所述凹槽内。The sensing component of claim 11 wherein said mounting plane includes grooves arranged in an array, said sensor being disposed in said recess in an inlaid manner.
  13. 如权利要求11所述的传感部件,其特征在于,所述传感器包括压力传感器。The sensing component of claim 11 wherein said sensor comprises a pressure sensor.
  14. 一种对位系统,用于在蒸镀装置中对位掩膜与基板,其特征在于,所述对位系统包括:A aligning system for aligning a mask and a substrate in an evaporation device, wherein the alignment system comprises:
    蒸镀磁板;Evaporating magnetic plate;
    如权利要求1-13任意一项所述的接触板;和a contact plate according to any of claims 1-13; and
    控制单元,用于分析所述受力情况并控制所述蒸镀磁板改变磁场分布以使所述基板受力均匀。And a control unit configured to analyze the force condition and control the vapor deposition magnetic plate to change a magnetic field distribution to uniformly stress the substrate.
  15. 如权利要求14所述的对位系统,其特征在于,所述蒸镀磁板包括呈阵列排布的磁性元件,所述控制单元用于通过改变所述磁性元件的磁极分布和/或磁场大小以改变所述磁场分布。The alignment system according to claim 14, wherein said vapor-deposited magnetic plate comprises magnetic elements arranged in an array, said control unit for changing a magnetic pole distribution and/or a magnetic field size of said magnetic element To change the magnetic field distribution.
  16. 如权利要求14所述的对位系统,其特征在于,所述对位系统包括驱动装置;The alignment system of claim 14 wherein said alignment system comprises a drive device;
    所述控制单元用于控制所述驱动装置驱动所述蒸镀磁板以吸附所述掩膜上移。The control unit is configured to control the driving device to drive the vapor deposition magnetic plate to adsorb the mask up.
  17. 一种蒸镀装置,用于蒸镀基板,其特征在于,所述蒸镀装置包括:An evaporation device for vapor depositing a substrate, wherein the vapor deposition device comprises:
    掩膜;和Mask; and
    如权利要求14所述的对位系统。The alignment system of claim 14.
  18. 如权利要求17所述的对位系统,其特征在于,所述基板为柔性基板。 The alignment system of claim 17 wherein said substrate is a flexible substrate.
  19. 如权利要求17所述的对位系统,其特征在于,所述蒸镀装置用于透过所述掩膜给所述基板蒸镀有机发光材料。 The alignment system according to claim 17, wherein said vapor deposition means is for vapor-depositing said organic light-emitting material to said substrate through said mask.
PCT/CN2017/084766 2017-05-17 2017-05-17 Contact plate, alignment system, and vapor deposition device WO2018209612A1 (en)

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CN203664629U (en) * 2014-01-21 2014-06-25 苏州天至尊模具科技有限公司 Compression balance die-casting die
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