WO2018194975A8 - Optical objective for operation in euv spectral region - Google Patents
Optical objective for operation in euv spectral region Download PDFInfo
- Publication number
- WO2018194975A8 WO2018194975A8 PCT/US2018/027785 US2018027785W WO2018194975A8 WO 2018194975 A8 WO2018194975 A8 WO 2018194975A8 US 2018027785 W US2018027785 W US 2018027785W WO 2018194975 A8 WO2018194975 A8 WO 2018194975A8
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- spectral region
- reflector
- optical objective
- pattern
- euv spectral
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
Abstract
A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N > 1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201880026044.8A CN110753882A (en) | 2017-04-19 | 2018-04-16 | Optical objective operating in the EUV spectral region |
CN201880027134.9A CN110892328B (en) | 2017-04-26 | 2018-04-24 | Reflection system, extreme ultraviolet exposure tool, lithography exposure tool, and optical system |
PCT/US2018/029160 WO2018200536A2 (en) | 2017-04-26 | 2018-04-24 | Illumination system with flat 1d-patterned mask for use in euv-exposure tool |
CN201880030036.0A CN110914760A (en) | 2017-05-11 | 2018-05-09 | Illumination system with curved one-dimensional patterned mask for EUV exposure tool |
PCT/US2018/031796 WO2018208912A2 (en) | 2017-05-11 | 2018-05-09 | Illumination system with curved 1d-patterned mask for use in euv-exposure tool |
US16/655,932 US11934105B2 (en) | 2017-04-19 | 2019-10-17 | Optical objective for operation in EUV spectral region |
US16/664,478 US11054745B2 (en) | 2017-04-26 | 2019-10-25 | Illumination system with flat 1D-patterned mask for use in EUV-exposure tool |
US16/679,052 US11300884B2 (en) | 2017-05-11 | 2019-11-08 | Illumination system with curved 1d-patterned mask for use in EUV-exposure tool |
Applications Claiming Priority (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762487245P | 2017-04-19 | 2017-04-19 | |
US62/487,245 | 2017-04-19 | ||
US201762490313P | 2017-04-26 | 2017-04-26 | |
US62/490,313 | 2017-04-26 | ||
US201762504908P | 2017-05-11 | 2017-05-11 | |
US62/504,908 | 2017-05-11 | ||
US15/599,148 | 2017-05-18 | ||
US15/599,197 | 2017-05-18 | ||
US15/599,197 US10890849B2 (en) | 2016-05-19 | 2017-05-18 | EUV lithography system for dense line patterning |
US15/599,148 US11099483B2 (en) | 2016-05-19 | 2017-05-18 | Euv lithography system for dense line patterning |
Related Parent Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US15/599,148 Continuation-In-Part US11099483B2 (en) | 2016-05-19 | 2017-05-18 | Euv lithography system for dense line patterning |
PCT/US2018/029160 Continuation-In-Part WO2018200536A2 (en) | 2017-04-26 | 2018-04-24 | Illumination system with flat 1d-patterned mask for use in euv-exposure tool |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US15/599,197 Continuation-In-Part US10890849B2 (en) | 2016-05-19 | 2017-05-18 | EUV lithography system for dense line patterning |
US16/655,932 Continuation US11934105B2 (en) | 2017-04-19 | 2019-10-17 | Optical objective for operation in EUV spectral region |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2018194975A2 WO2018194975A2 (en) | 2018-10-25 |
WO2018194975A3 WO2018194975A3 (en) | 2019-02-07 |
WO2018194975A8 true WO2018194975A8 (en) | 2019-02-28 |
Family
ID=63856867
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2018/027785 WO2018194975A2 (en) | 2017-04-19 | 2018-04-16 | Figoptical objective for operation in euv spectral region |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN110753882A (en) |
WO (1) | WO2018194975A2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109960031B (en) * | 2019-04-28 | 2024-02-09 | 湖南谱峰光电有限公司 | Aerostat laser relay mirror system and simulation device and simulation method thereof |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5003567A (en) * | 1989-02-09 | 1991-03-26 | Hawryluk Andrew M | Soft x-ray reduction camera for submicron lithography |
US6331710B1 (en) * | 1998-12-02 | 2001-12-18 | Zhijiang Wang | Reflective optical systems for EUV lithography |
CN105511065B (en) * | 2009-12-14 | 2019-04-23 | 卡尔蔡司Smt有限责任公司 | Illumination optics, lighting system, projection exposure apparatus and assembly manufacture method |
DE102010039745A1 (en) * | 2010-08-25 | 2012-03-01 | Carl Zeiss Smt Gmbh | Imaging optics |
US20140253892A1 (en) * | 2013-03-11 | 2014-09-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Extreme Ultraviolet Lithography Projection Optics System and Associated Methods |
US9442384B2 (en) * | 2013-03-13 | 2016-09-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Extreme ultraviolet lithography process and mask |
-
2018
- 2018-04-16 CN CN201880026044.8A patent/CN110753882A/en active Pending
- 2018-04-16 WO PCT/US2018/027785 patent/WO2018194975A2/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2018194975A2 (en) | 2018-10-25 |
CN110753882A (en) | 2020-02-04 |
WO2018194975A3 (en) | 2019-02-07 |
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