WO2018164223A1 - Film-forming composition, film-coated article, and production method for film-coated article - Google Patents

Film-forming composition, film-coated article, and production method for film-coated article Download PDF

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Publication number
WO2018164223A1
WO2018164223A1 PCT/JP2018/008964 JP2018008964W WO2018164223A1 WO 2018164223 A1 WO2018164223 A1 WO 2018164223A1 JP 2018008964 W JP2018008964 W JP 2018008964W WO 2018164223 A1 WO2018164223 A1 WO 2018164223A1
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Prior art keywords
film
general formula
forming composition
article
coating
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PCT/JP2018/008964
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French (fr)
Japanese (ja)
Inventor
鈴木 慶一
貴裕 石▲ざき▼
Original Assignee
ホヤ レンズ タイランド リミテッド
学校法人 芝浦工業大学
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Application filed by ホヤ レンズ タイランド リミテッド, 学校法人 芝浦工業大学 filed Critical ホヤ レンズ タイランド リミテッド
Publication of WO2018164223A1 publication Critical patent/WO2018164223A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16Antifouling paints; Underwater paints
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/18Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

Definitions

  • the present invention relates to a film-forming composition, an article having a film, and a method for producing an article having a film. Specifically, it has a film-forming composition capable of forming an antifouling film, an article having a film formed from the film-forming composition, and a film including a film-forming step using the film-forming composition.
  • the present invention relates to a method for manufacturing an article.
  • a film is widely formed on the outermost layer of an article. With this film, various functions can be imparted to the surface of the article (see, for example, Patent Document 1).
  • Patent Document 1 in order to provide a water-repellent surface, an alkyl group or a fluoroalkyl group is included, and at least one selected from an alkoxy group, an acetoxy group, an isocyanate group, and a halogen has a functional group bonded to a silicon atom. It describes that water-repellent treatment is performed using a silane compound (see paragraph 0025 of Patent Document 1).
  • antifouling can be cited as one of functions desired to be imparted by the coating.
  • antifouling property does not necessarily mean the same property as the water repellency described in Patent Document 1, and the surface having water repellency does not necessarily have an excellent antifouling property. If excellent antifouling properties can be provided on the surface of the article, it is possible to prevent the quality and performance of the article from being deteriorated due to the adhesion of dirt. Therefore, it is desirable in various fields to provide excellent antifouling properties on the article surface.
  • An object of one embodiment of the present invention is to provide a means for providing an excellent antifouling property to an article surface.
  • One embodiment of the present invention provides: The following general formula 1: (In General Formula 1, R 1 , R 2 and R 3 each independently represents an alkyl group, and n represents 0 or an integer of 1 or more.)
  • a composition for forming a film comprising two or more types of alkoxysilane compounds represented by formula (1), wherein the two or more types of alkoxysilane compounds have different n in the general formula (1): About.
  • the film-forming composition is an alkoxysilane compound having a different n in general formula 1, that is, a chain length of an alkyl chain (CH 3 — (CH 2 ) n—) (hereinafter referred to as “alkyl chain length”). Contains two or more different alkoxysilane compounds. Thereby, the film formed from this film forming composition can impart excellent antifouling properties to the article surface.
  • an article provided with a film having excellent antifouling properties can be provided.
  • the outermost layer includes a film including the article formed from the film-forming composition on the outermost layer and the film-forming step using the film-forming composition.
  • a method of manufacturing an article is also provided.
  • the composition for forming a film, the article, and the production method will be described in more detail.
  • the film-forming composition contains two or more alkoxysilane compounds represented by the following general formula 1.
  • R 1 , R 2 and R 3 each independently represents an alkyl group, and n represents 0 or an integer of 1 or more.
  • Formula 1 will be described in more detail.
  • R 1 , R 2 and R 3 each independently represents an alkyl group.
  • R 1 , R 2 and R 3 may be the same alkyl group or different alkyl groups.
  • the alkyl group can be a linear alkyl group, a branched alkyl group or a cycloalkyl group, and is preferably a linear alkyl group.
  • the alkyl group preferably has 1 to 6 carbon atoms, and more preferably 1 to 3 carbon atoms.
  • the said alkyl group may have a substituent and may be unsubstituted.
  • examples of the substituent include a hydroxy group, a cyano group, an amino group, a nitro group, an acyl group, and a carboxyl group.
  • the alkoxysilane compound preferably does not contain a fluorine atom as a substituent.
  • the alkoxysilane compound preferably does not contain a fluorine atom. Forming a film using a compound containing no fluorine atom is preferable from the viewpoints of reducing manufacturing costs and environmental burdens.
  • carbon number in the case of having a substituent shall mean the carbon number of the part which does not contain a substituent.
  • the alkyl group is preferably unsubstituted. Preferred examples of the alkyl group include a methyl group, an ethyl group and a propyl group. A methyl group and an ethyl group are more preferred, and a methyl group is still more preferred.
  • n 0 or an integer of 1 or more.
  • the film-forming composition contains two or more alkoxysilane compounds having different n in the general formula, that is, alkoxysilane compounds having different alkyl chain lengths. The present inventors speculate that this contributes to imparting excellent antifouling properties to the surface of the article by providing a film formed from the above-mentioned compound for forming a film on the outermost layer of the article. Details will be described later.
  • the difference in n between the two or more alkoxysilane compounds is 1 or more, and preferably 2 or more, more preferably 3 or more, and still more preferably from the viewpoint of imparting better antifouling properties to the article surface.
  • the difference in n between two or more alkoxysilane compounds is preferably 20 or less, more preferably 18 or less, still more preferably 16 or less, and 14 or less. More preferably.
  • the alkoxysilane compound having the largest n is referred to as a “first alkoxysilane compound”.
  • N of an alkoxysilane compound becomes like this.
  • it is 14 or more, More preferably, it is 15 or more, More preferably, it is 16 or more.
  • n of a 1st alkoxysilane compound becomes like this.
  • it is 30 or less, More preferably, it is 25 or less, More preferably, it is 20 or less.
  • n of the second alkoxysilane compound is 1 or more, It is preferably 2 or more, more preferably 3 or more, still more preferably 4 or more, and still more preferably 5 or more. Further, n of the second alkoxysilane compound is preferably 13 or less, more preferably 12 or less, and still more preferably 11 or less.
  • the second alkoxysilane compound is an alkoxysilane compound in which n in the general formula 1 is in the range of 7 to 13, and another embodiment is an alkoxysilane compound in which n in the general formula 1 is in the range of 1 to 6.
  • Silane compound contains one or more second alkoxysilane compounds and one or more second alkoxysilane compounds together with the first alkoxysilane compound having the largest n in general formula 1. But you can. That is, the film-forming composition includes two or more alkoxysilane compounds represented by the general formula 1 having different n (different alkyl chain lengths), and the included alkoxysilane compounds may be two or more. But you can.
  • the types of the alkoxysilane compounds represented by the general formula 1 contained in the film forming composition are preferably 2 to 4 types, and 2 or 3 types. More preferably, it is more preferable that they are two types.
  • the content of the alkoxysilane compound having the maximum n (first alkoxysilane compound) is as described above.
  • the total content (100% by mass) of the alkoxysilane compound represented by the general formula 1 contained in the film-forming composition is preferably 5.0% by mass or more, and preferably 10.0% by mass or more. More preferably, it is more preferably 20.0% by mass or more, further preferably 30.0% by mass or more, still more preferably 40.0% by mass or more, and 50.0% by mass.
  • the alkoxysilane compound (first alkoxysilane compound) having the maximum n is preferably 95.0% by mass or less, and more preferably 90.0% by mass or less.
  • the alkoxysilane compound represented by the general formula 1 described above is available as a commercial product and can be synthesized by a known method. Specific examples thereof include, for example, ethyltrimethoxysilane, ethyltriethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, butyltrimethoxysilane, butyltriethoxysilane, pentyltrimethoxysilane, pentyltriethoxysilane, hexyltri.
  • Examples include methoxysilane, hexyltriethoxysilane, octyltrimethoxysilane, octyltriethoxysilane, decyltrimethoxysilane, decyltriethoxysilane, dodecyltrimethoxysilane, dodecyltriethoxysilane, octadecyltrimethoxysilane, octadecyltriethoxysilane, etc. be able to.
  • the film-forming composition contains two or more types of alkoxysilane compounds described above.
  • the film-forming composition may be a composition comprising these alkoxysilane compounds, and may optionally contain one or more known components as components of the film-forming composition such as a solvent and an additive. Known components can be applied to components that can be optionally included. Further, the concentration of the alkoxysilane compound in the film forming composition is not particularly limited, and may be set in consideration of, for example, a film forming method.
  • a further aspect of the invention provides: An article having, as an outermost layer, a film formed from the film-forming composition; and A method for producing an article having a film on the outermost layer, comprising a film forming step using the film forming composition; About. Below, the said article
  • the film-forming composition can be used to form a film on the outermost layer of various articles.
  • the surface of the article on which the film is formed has excellent antifouling properties. be able to.
  • the surface on which a film is formed (hereinafter referred to as “base surface”) is the surface of various substances such as an inorganic substance, an organic substance, and a composite material of an organic substance and an inorganic substance.
  • articles can be mentioned.
  • Specific examples of the article include optical members such as lenses (for example, eyeglass lenses, sunglasses, etc.), window glass, building materials, transportation equipment, vehicle materials, semiconductor substrates, and the like.
  • the present invention is not limited to these exemplified articles, and the articles having the above-mentioned coating film on the outermost layer are various articles that desirably have antifouling properties on the surface because there is a possibility that dirt may adhere during use. Can be. Moreover, the said film should just exist as an outermost layer in at least one part of articles
  • the coating film may be a monomolecular film of the alkoxysilane compound.
  • the monomolecular film is formed by fixing the molecule on the base surface by the terminal functional group becoming a binding portion and / or an adsorbing portion with the base surface, and has a film thickness that approximates the molecular length of one molecule. .
  • the film-forming composition contains two or more types of alkoxysilane compounds
  • the present inventors believe that the film thickness of the monomolecular film can be controlled by the type and mixing ratio of these two or more types of alkoxysilane compounds. I guess. For example, the monomolecular film is considered to be thicker as the alkoxysilane compound having a longer molecular length is used. In addition, it is considered that the film thickness of the monomolecular film can be increased as the proportion of the alkoxysilane compound having a longer molecular length among the two or more types of alkoxysilane compounds is increased.
  • a film formed by further bonding molecules to the molecules bonded or adsorbed to the base surface is called a bimolecular film, and has a film thickness that exceeds the molecular length of one molecule and approximates the molecular length of two molecules.
  • Have Monomolecular films tend to be easier to control film properties than multimolecular films such as bimolecular films.
  • Monomolecular films tend to be superior in surface smoothness compared to multimolecular films such as bimolecular films. This point is preferable as a film formed on the outermost layer of an article that is desired to have excellent surface smoothness.
  • the mean square roughness measured by a scanning probe microscope (SPM) on the surface of the coating can be, for example, 0.20 nm or more and 0.80 nm or less.
  • a film formed from the film forming composition can be formed on the base surface.
  • the presence of this coating on the outermost layer of the article can provide excellent antifouling properties on the article surface.
  • the film may be formed by a dry film forming method or a wet film forming method.
  • the base surface Prior to the formation of the coating, the base surface can be pretreated by a known method. As an example of the pretreatment, a treatment for introducing a hydroxy group (OH) onto the base surface can be mentioned. It is speculated that the introduced hydroxy group can contribute to the formation of chemical bonds and hydrogen bonds with silanol groups generated by hydrolysis of the alkoxysilane compound (details will be described later).
  • the wet film forming method is a method of forming a film through a step of applying a film forming composition onto a base surface
  • the coating method includes known coating methods such as a spin coating method, a dipping method, and a spray coating method. Can be used.
  • the coating film can be formed by heating the coating layer of the coating film-forming composition after coating. By heating, the alkoxysilane compound contained in the coating layer can be hydrolyzed, and the coating layer can be dried. It is presumed that silanol groups (Si—OH) are generated by hydrolyzing the alkoxysilane compound, and that the silanol groups can contribute to bonding or adsorption with the base surface.
  • the film-forming composition may be an aqueous composition or a non-aqueous composition.
  • “Aqueous” means containing water. Since the hydrolysis of the alkoxysilane compound can proceed even with moisture in the atmosphere, the film-forming composition may be a non-aqueous composition. Moreover, about the detail regarding heating, such as heating temperature, the well-known technique regarding the hydrolysis of a silane coupling agent is applicable.
  • a dry film forming method various methods including a step of volatilizing the film forming composition, for example, a vacuum deposition method, an ion assist method, an ion plating method, a reactive sputtering method, a chemical vapor deposition method (CVD; chemical vapor deposition) and the like. Also in the dry film forming method, it is speculated that the generation of silanol groups (Si—OH) by hydrolysis of the alkoxysilane compound may contribute to the bonding or adsorption between the film and the base surface.
  • a vacuum deposition method for example, a vacuum deposition method, an ion assist method, an ion plating method, a reactive sputtering method, a chemical vapor deposition method (CVD; chemical vapor deposition) and the like.
  • CVD chemical vapor deposition
  • the film formed by the film forming process can exhibit excellent antifouling properties.
  • the present inventors believe that lowering the contact angle hysteresis on the surface of the article contributes to increasing the antifouling property of the article surface. This point will be further described below.
  • the contact angle is roughly classified into a static contact angle and a dynamic contact angle.
  • the contact angle used as an index of water repellency is a static contact angle with respect to water.
  • the dynamic contact angle can be an indicator of the dynamic behavior of the droplet.
  • the present inventors presume that the rotational movement of the methyl group linked to the alkylene part contributes to the reduction of the contact angle hysteresis.
  • n in the general formula 1 is It is considered that the methyl group connected to the alkylene part in the alkoxysilane compound (which is larger) exists in a state in which it is more likely to rotate. The present inventors speculate that this may contribute to lowering the contact angle hysteresis. However, the above is inference and does not limit the present invention.
  • the advancing contact angle and the receding contact angle are measured by the expansion / contraction method in a measurement environment having a temperature of 22 to 25 ° C. and a relative humidity of 35 to 60%. It is assumed that the advancing contact angle and the receding contact angle are measured at arbitrary five locations, respectively, and the contact angle hysteresis is calculated using the arithmetic average of the measured values.
  • the water contact angle hysteresis measured on the surface of the coating is preferably 10.0 ° or less, more preferably 9.5 ° or less, and even more preferably 9.0 ° or less. More preferably, it is not more than 0.5 °, and more preferably not more than 8.0 °.
  • the contact angle hysteresis measured on the surface of the film can be, for example, 3.0 ° or more, 4.0 ° or more, 5.0 or more, or 6.0 ° or more.
  • the smaller the value of the contact angle hysteresis the better from the viewpoint of antifouling properties.
  • the coating surface can have excellent water repellency.
  • a static contact angle can be used as an index of water repellency.
  • the surface of the coating film may have a static contact angle with respect to water of 90.0 ° or more, preferably 95.0 ° or more, and more preferably 100.0 ° or more.
  • the static contact angle for water can be, for example, 120.0 ° or less, but may exceed this.
  • the static contact angle is obtained as an arithmetic average of values measured at any five locations by the droplet method in a measurement environment having a temperature of 22 to 25 ° C. and a relative humidity of 35 to 60%. To do.
  • the article has a monomolecular film of an alkoxysilane compound (but does not contain fluorine atoms) as at least a part of the outermost layer, and the contact angle hysteresis with respect to water on the surface of the outermost layer is 10 Articles that are less than or equal to 0 ° are also provided.
  • a monomolecular film of an alkoxysilane compound but does not contain fluorine atoms
  • alkoxysilane compounds used in the following examples and comparative examples are the following commercially available alkoxysilane compounds.
  • HXS Hyltrimethylsilane
  • Pretreatment of lower ground A glass plate having a size of 10 mm ⁇ 20 mm was prepared as a sample, and ultrasonic cleaning was performed for 10 minutes in order of acetone, ethanol, and ultrapure water in order to remove surface deposits.
  • the sample surface after washing with an organic solvent (acetone, ethanol) was dried with a nitrogen gun.
  • the sample surface after the cleaning was irradiated with vacuum ultraviolet (VUV) for 20 minutes under atmospheric pressure.
  • VUV irradiation treatment was performed using an ultraviolet irradiator (manufactured by USHIO INC.) Equipped with a VUV lamp manufactured by USHIO ELECTRIC CO., LTD.
  • a single alkoxysilane compound or a mixture of two alkoxysilane compounds was prepared as a film forming composition.
  • the total amount of the film forming composition (alkoxysilane compound) was 180 ⁇ L or 200 ⁇ L.
  • the compositions of the prepared film forming compositions are shown in Tables 5 and 6 below.
  • Film formation step 2 Using the respective film-forming compositions prepared in 1 above, the above-described 1. A film was formed on the base surface prepared in (1). Film formation by thermal chemical vapor deposition was performed as follows. Sample tube bottle containing the film-forming composition and the above 1. The samples after the pretreatment were sealed together in a Teflon (registered trademark) container (diameter 12 cm ⁇ height 5 cm) in a glove box maintained at a relative humidity of 15%. Thereafter, the furnace was heated and held for 24 hours in an electric furnace set at a furnace temperature of 100 ° C.
  • Teflon registered trademark
  • Evaluation Method (1) Contact Angle Measurement The static contact angle was measured by the droplet method, and the dynamic contact angle (advanced contact angle and receding contact angle) was measured by the expansion / contraction method. Table 1 shows the measurement conditions for the static contact angle and the dynamic contact angle. Water is used as the measurement liquid, and the static contact angle, advancing contact angle, and receding contact angle are measured at five randomly determined locations on the coating surface, and an automatic contact angle meter (Model: DM-501 (manufactured by Kyowa Interface Science Co., Ltd.) was used. The measurement was performed in a measurement environment at a temperature of 22 to 25 ° C. and a relative humidity of 35 to 60%.
  • the sample on which the coating film is formed is referred to as "evaluation sample”.
  • the visible light (400 to 700 nm) transmittance transmittance before dropping muddy water
  • the sample for evaluation was placed in a state where the surface of the coating film was inclined 5 ° with respect to a horizontal plane with the surface of the coating film facing upward, and muddy water was dropped on the surface of the coating film, and held in that state for 30 seconds.
  • the visible light transmittance (transmittance after dripping muddy water) of the sample for evaluation after dripping muddy water was measured.
  • the above visible light transmittance measurement was performed using an ultraviolet-visible spectrophotometer (UV-vis: UV-2600 manufactured by Shimadzu Corporation) with a measurement wavelength range of 400 to 700 nm and a scan speed of medium. It can be judged that the smaller the value of the transmittance difference before and after the muddy water dripping (permeability before muddy water dripping-transmittance after muddy water dripping) is, the higher the antifouling property of the coating surface.
  • UV-vis UV-2600 manufactured by Shimadzu Corporation
  • the coating formed in the example is superior in antifouling property as compared with the coating formed in the comparative example.
  • the films formed in the examples all have a contact angle hysteresis of 10.0 ° or less, and the contact angle hysteresis is smaller than that of the film formed in the comparative example. This is considered to be the reason why the coating film formed in the example is superior in antifouling property as compared with the coating film formed in the comparative example.
  • the coating formed in the examples has a high static contact angle with water and excellent water repellency.
  • the coatings formed in the examples shown in Tables 5 and 6 are antifouling coatings having excellent antifouling properties, and were also coatings that can function as water-repellent coatings. Moreover, from the film thickness and roughness of the film shown in Tables 5 and 6, it can also be confirmed that the film formed in the examples shown in Tables 5 and 6 is a monomolecular film of an alkoxysilane compound.
  • All the coatings formed in the examples shown in Table 7 had a contact angle hysteresis of 10.0 ° or less.
  • the coatings formed in the examples shown in Tables 5 and 6 showed excellent antifouling properties with a contact angle hysteresis of 10.0 ° or less. It can be said that it is excellent in dirtiness. That is, the film formed in the examples shown in Table 7 is an antifouling film having excellent antifouling properties, and can also function as a water-repellent film. Moreover, from the film thickness and roughness of the film shown in Table 7, it can also be confirmed that the film formed in the examples shown in Table 7 is a monomolecular film of an alkoxysilane compound.
  • Example 3-1 to Example 3-5 shown in Table 7 are similarly formed except that the type of the second alkoxysilane compound is changed. Since the film formed in Example 3-1 to Example 3-4 had a smaller contact angle hysteresis than the film formed in Example 3-5, the first alkoxysilane compound and From the viewpoint of imparting better antifouling properties to the article surface, it is considered that the difference in n in general formula 1 with the second alkoxysilane compound is more preferably 3 or more.
  • a film forming composition comprising two or more alkoxysilane compounds represented by the above general formula 1, wherein the two or more alkoxysilane compounds have different n in the general formula 1.
  • composition for forming a film by using this composition to form a film on the outermost layer of the article, excellent antifouling property can be provided on the surface of the article.
  • the film forming composition includes an alkoxysilane compound represented by the general formula 1 in which the difference in n is 2 or more.
  • the content of the alkoxysilane compound having the largest n is 5.0 to 95. with respect to the total content of the two or more alkoxysilane compounds. It is in the range of 0% by mass.
  • the coating composition contains two alkoxysilane compounds having different n in the general formula 1.
  • R 1 , R 2 and R 3 each independently represents an alkyl group having 1 to 3 carbon atoms.
  • an article having a film formed from the film forming composition as an outermost layer.
  • the article can exhibit excellent antifouling properties by having the coating film on the outermost layer.
  • a method for producing an article having a coating on the outermost layer including a coating forming step using the coating forming composition.
  • the film forming step is performed by a dry film forming method.
  • the article has a monomolecular film of an alkoxysilane compound (but does not contain a fluorine atom) as at least a part of the outermost layer, and has a contact angle hysteresis with respect to water on the surface of the outermost layer.
  • Articles that are 10.0 degrees or less are also provided.
  • the article has an excellent antifouling property on the surface of the coating, so that the adhesion of dirt can be suppressed and / or the attached dirt can be easily removed.
  • the alkoxysilane compound (but not including a fluorine atom) is a compound composed of a carbon atom, a hydrogen atom, an oxygen atom, and a silicon atom.
  • the alkoxysilane compound (but not including a fluorine atom) is an alkoxysilane compound represented by General Formula 1.
  • the coating film includes two or more alkoxysilane compounds represented by the general formula 1, and the two or more alkoxysilane compounds are formed from a film-forming composition having a different n in the general formula 1.
  • the coated film includes two or more alkoxysilane compounds represented by the general formula 1, and the two or more alkoxysilane compounds are formed from a film-forming composition having a different n in the general formula 1.

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  • Engineering & Computer Science (AREA)
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Abstract

A film-forming composition which comprises two or more alkoxysilane compounds represented by general formula 1, the two or more alkoxysilane compounds differing in n within general formula 1. In general formula 1, R1, R2, and R3 each independently represent an alkyl group and n is 0 or an integer of 1 or larger.

Description

被膜形成用組成物、被膜を有する物品および被膜を有する物品の製造方法Film-forming composition, article having film and method for producing article having film
 本発明は、被膜形成用組成物、被膜を有する物品および被膜を有する物品の製造方法に関する。詳しくは、防汚性被膜を形成可能な被膜形成用組成物、この被膜形成用組成物から形成された被膜を有する物品、および、この被膜形成用組成物を用いる被膜形成工程を含む被膜を有する物品の製造方法に関する。 The present invention relates to a film-forming composition, an article having a film, and a method for producing an article having a film. Specifically, it has a film-forming composition capable of forming an antifouling film, an article having a film formed from the film-forming composition, and a film including a film-forming step using the film-forming composition. The present invention relates to a method for manufacturing an article.
 様々な分野において、物品の最表層に被膜を形成することが広く行われている。この被膜により、物品の表面に各種機能を付与することができる(例えば特許文献1参照)。 In various fields, a film is widely formed on the outermost layer of an article. With this film, various functions can be imparted to the surface of the article (see, for example, Patent Document 1).
特開平9-87402号公報JP-A-9-87402
 特許文献1には、撥水性表面をもたらすために、アルキル基もしくはフルオロアルキル基を有し、かつアルコキシ基、アセトキシ基、イソシアネート基、ハロゲンから選ばれる少なくとも1つがシリコン原子に結合した官能基を有するシラン化合物を用いて撥水処理を行うことが記載されている(特許文献1の段落0025参照)。 In Patent Document 1, in order to provide a water-repellent surface, an alkyl group or a fluoroalkyl group is included, and at least one selected from an alkoxy group, an acetoxy group, an isocyanate group, and a halogen has a functional group bonded to a silicon atom. It describes that water-repellent treatment is performed using a silane compound (see paragraph 0025 of Patent Document 1).
 一方、被膜により付与されることが望まれる機能の1つとして、「防汚性」を挙げることができる。被膜によって物品表面に防汚性を付与することにより、物品表面への汚れの付着を抑制することや付着した汚れの除去を容易にすることが可能になる。防汚性とは、特許文献1に記載されている撥水性と必ずしも同一の性質を意味するものではなく、撥水性を有する表面が、必ずしも優れた防汚性を有するとは限らない。物品表面に優れた防汚性をもたらすことができれば、汚れの付着により物品の品質や性能が劣化することを防ぐことが可能になる。そのため、物品表面に優れた防汚性をもたらすことは、各種分野において望ましい。 On the other hand, “antifouling” can be cited as one of functions desired to be imparted by the coating. By imparting antifouling properties to the article surface by the coating, it becomes possible to suppress the adhesion of dirt to the article surface and to easily remove the attached dirt. The antifouling property does not necessarily mean the same property as the water repellency described in Patent Document 1, and the surface having water repellency does not necessarily have an excellent antifouling property. If excellent antifouling properties can be provided on the surface of the article, it is possible to prevent the quality and performance of the article from being deteriorated due to the adhesion of dirt. Therefore, it is desirable in various fields to provide excellent antifouling properties on the article surface.
 本発明の一態様は、物品表面に優れた防汚性をもたらすための手段を提供することを目的とする。 An object of one embodiment of the present invention is to provide a means for providing an excellent antifouling property to an article surface.
 本発明の一態様は、
 下記一般式1:
Figure JPOXMLDOC01-appb-C000002
(一般式1中、R、RおよびRは、それぞれ独立にアルキル基を表し、nは0または1以上の整数を表す。)
で表されるアルコキシシラン化合物を二種以上含み、かつ、これら二種以上のアルコキシシラン化合物は一般式1中のnが異なる、被膜形成用組成物、
 に関する。
One embodiment of the present invention provides:
The following general formula 1:
Figure JPOXMLDOC01-appb-C000002
(In General Formula 1, R 1 , R 2 and R 3 each independently represents an alkyl group, and n represents 0 or an integer of 1 or more.)
A composition for forming a film, comprising two or more types of alkoxysilane compounds represented by formula (1), wherein the two or more types of alkoxysilane compounds have different n in the general formula (1):
About.
 上記被膜形成用組成物は、一般式1中のnが異なるアルコキシシラン化合物、即ちアルキル鎖(CH-(CH)n-)の鎖長(以下、「アルキル鎖長」と記載する。)が異なるアルコキシシラン化合物を二種以上含む。これにより、この被膜形成用組成物から形成された被膜は、物品表面に優れた防汚性を付与することができる。 The film-forming composition is an alkoxysilane compound having a different n in general formula 1, that is, a chain length of an alkyl chain (CH 3 — (CH 2 ) n—) (hereinafter referred to as “alkyl chain length”). Contains two or more different alkoxysilane compounds. Thereby, the film formed from this film forming composition can impart excellent antifouling properties to the article surface.
 本発明の一態様によれば、優れた防汚性を有する被膜を備えた物品を提供することができる。 According to one embodiment of the present invention, an article provided with a film having excellent antifouling properties can be provided.
 本発明の一態様は、上記被膜形成用組成物に関する。
 更に本発明の一態様によれば、上記被膜形成用組成物から形成された被膜を最表層に有する物品、および、上記膜形成用組成物を用いる被膜形成工程を含む、被膜を最表層に有する物品の製造方法も提供される。
 以下に、上記被膜形成用組成物、物品および製造方法について、更に詳細に説明する。
One aspect of the present invention relates to the above-mentioned film forming composition.
Furthermore, according to one aspect of the present invention, the outermost layer includes a film including the article formed from the film-forming composition on the outermost layer and the film-forming step using the film-forming composition. A method of manufacturing an article is also provided.
Hereinafter, the composition for forming a film, the article, and the production method will be described in more detail.
[被膜形成用組成物]
<アルコキシシラン化合物>
 上記被膜形成用組成物は、下記一般式1で表されるアルコキシシラン化合物を二種以上含む。
[Coating composition]
<Alkoxysilane compound>
The film-forming composition contains two or more alkoxysilane compounds represented by the following general formula 1.
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
 一般式1中、R、RおよびRは、それぞれ独立にアルキル基を表し、nは0または1以上の整数を表す。
 以下に、一般式1について、更に詳細に説明する。
In General Formula 1, R 1 , R 2 and R 3 each independently represents an alkyl group, and n represents 0 or an integer of 1 or more.
Hereinafter, Formula 1 will be described in more detail.
 一般式1中、R、RおよびRは、それぞれ独立にアルキル基を表す。R、RおよびRは、同一のアルキル基であってもよく、異なるアルキル基であってもよい。 In General Formula 1, R 1 , R 2 and R 3 each independently represents an alkyl group. R 1 , R 2 and R 3 may be the same alkyl group or different alkyl groups.
 上記アルキル基は、直鎖アルキル基、分岐アルキル基またはシクロアルキル基であることができ、直鎖アルキル基であることが好ましい。上記アルキル基の炭素数は、1~6の範囲であることが好ましく、1~3の範囲であることがより好ましい。また、上記アルキル基は、置換基を有していてもよく、無置換であってもよい。上記アルキル基が置換基を有する場合、置換基としては、例えばヒドロキシ基、シアノ基、アミノ基、ニトロ基、アシル基、カルボキシル基等を挙げることができる。上記アルコキシシラン化合物は、置換基としてフッ素原子を含まないことが好ましい。即ち、上記アルコキシシラン化合物は、フッ素原子を含まないことが好ましい。フッ素原子を含まない化合物を用いて被膜を形成することは、製造コスト低減および環境負荷低減の観点から好ましい。なお置換基を有する場合の炭素数とは、置換基を含まない部分の炭素数を意味するものとする。上記アルキル基は、無置換であることが好ましい。好ましいアルキル基としてはメチル基、エチル基およびプロピル基を挙げることができ、メチル基およびエチル基がより好ましく、メチル基が更に好ましい。 The alkyl group can be a linear alkyl group, a branched alkyl group or a cycloalkyl group, and is preferably a linear alkyl group. The alkyl group preferably has 1 to 6 carbon atoms, and more preferably 1 to 3 carbon atoms. Moreover, the said alkyl group may have a substituent and may be unsubstituted. When the alkyl group has a substituent, examples of the substituent include a hydroxy group, a cyano group, an amino group, a nitro group, an acyl group, and a carboxyl group. The alkoxysilane compound preferably does not contain a fluorine atom as a substituent. That is, the alkoxysilane compound preferably does not contain a fluorine atom. Forming a film using a compound containing no fluorine atom is preferable from the viewpoints of reducing manufacturing costs and environmental burdens. In addition, carbon number in the case of having a substituent shall mean the carbon number of the part which does not contain a substituent. The alkyl group is preferably unsubstituted. Preferred examples of the alkyl group include a methyl group, an ethyl group and a propyl group. A methyl group and an ethyl group are more preferred, and a methyl group is still more preferred.
 一般式1中、nは0または1以上の整数を表す。nに関して、上記被膜形成用組成物は、一般式中のnが異なるアルコキシシラン化合物、即ちアルキル鎖長が異なるアルコキシシラン化合物を二種以上含む。このことが、上記被膜形成用化合物により形成される被膜を物品最表層に設けることにより、物品表面に優れた防汚性を付与することに寄与すると、本発明者らは推察している。詳細は更に後述する。二種以上のアルコキシシラン化合物のnの差は、1以上であり、より良好な防汚性を物品表面に付与する観点から、好ましくは2以上であり、より好ましくは3以上であり、更に好ましくは4以上であり、一層好ましくは5以上であり、より一層好ましくは6以上であり、更により一層好ましくは7以上であり、8以上であることがなおより一層好ましい。また、同様の観点から、二種以上のアルコキシシラン化合物のnの差は、20以下であることが好ましく、18以下であることがより好ましく、16以下であることが更に好ましく、14以下であることが一層好ましい。 In general formula 1, n represents 0 or an integer of 1 or more. Regarding n, the film-forming composition contains two or more alkoxysilane compounds having different n in the general formula, that is, alkoxysilane compounds having different alkyl chain lengths. The present inventors speculate that this contributes to imparting excellent antifouling properties to the surface of the article by providing a film formed from the above-mentioned compound for forming a film on the outermost layer of the article. Details will be described later. The difference in n between the two or more alkoxysilane compounds is 1 or more, and preferably 2 or more, more preferably 3 or more, and still more preferably from the viewpoint of imparting better antifouling properties to the article surface. Is 4 or more, more preferably 5 or more, even more preferably 6 or more, still more preferably 7 or more, and even more preferably 8 or more. From the same viewpoint, the difference in n between two or more alkoxysilane compounds is preferably 20 or less, more preferably 18 or less, still more preferably 16 or less, and 14 or less. More preferably.
 上記被膜形成用組成物に含まれる二種以上の一般式1で表されるアルコキシシラン化合物の中で、nが最大のアルコキシシラン化合物を「第一のアルコキシシラン化合物」と呼ぶと、第一のアルコキシシラン化合物のnは、好ましくは14以上であり、より好ましくは15以上であり、更に好ましくは16以上である。また、第一のアルコキシシラン化合物のnは、好ましくは30以下であり、より好ましくは25以下であり、更に好ましくは20以下である。一方、第一のアルコキシシラン化合物よりnが小さい一般式1で表されるアルコキシシラン化合物を「第二のアルコキシシラン化合物」と呼ぶと、第二のアルコキシシラン化合物のnは、1以上であり、2以上であることが好ましく、3以上であることがより好ましく、4以上であることが更に好ましく、5以上であることが一層好ましい。また、第二のアルコキシシラン化合物のnは、13以下であることが好ましく、12以下であることがより好ましく、11以下であることが更に好ましい。第二のアルコキシシラン化合物の一態様は、一般式1中のnが7~13の範囲のアルコキシシラン化合物であり、他の一態様は、一般式1中のnが1~6の範囲のアルコキシシラン化合物である。上記被膜形成用組成物は、一般式1中のnが最大の第一のアルコキシシラン化合物とともに、第二のアルコキシシラン化合物を一種以上含み、第二のアルコキシシラン化合物を一種含んでも二種以上含んでもよい。即ち、上記被膜形成用組成物は、nが異なる(アルキル鎖長が異なる)一般式1で表されるアルコキシシラン化合物を二種以上含み、含まれるアルコキシシラン化合物は二種でもよく、二種以上でもよい。防汚性向上の容易性の観点からは、上記被膜形成用組成物に含まれる一般式1で表されるアルコキシシラン化合物の種類は、二種~四種であることが好ましく、二種または三種であることがより好ましく、二種であることが更に好ましい。 Among the two or more types of alkoxysilane compounds represented by the general formula 1 contained in the film forming composition, the alkoxysilane compound having the largest n is referred to as a “first alkoxysilane compound”. N of an alkoxysilane compound becomes like this. Preferably it is 14 or more, More preferably, it is 15 or more, More preferably, it is 16 or more. Moreover, n of a 1st alkoxysilane compound becomes like this. Preferably it is 30 or less, More preferably, it is 25 or less, More preferably, it is 20 or less. On the other hand, when the alkoxysilane compound represented by the general formula 1 in which n is smaller than that of the first alkoxysilane compound is referred to as “second alkoxysilane compound”, n of the second alkoxysilane compound is 1 or more, It is preferably 2 or more, more preferably 3 or more, still more preferably 4 or more, and still more preferably 5 or more. Further, n of the second alkoxysilane compound is preferably 13 or less, more preferably 12 or less, and still more preferably 11 or less. One embodiment of the second alkoxysilane compound is an alkoxysilane compound in which n in the general formula 1 is in the range of 7 to 13, and another embodiment is an alkoxysilane compound in which n in the general formula 1 is in the range of 1 to 6. Silane compound. The film-forming composition contains one or more second alkoxysilane compounds and one or more second alkoxysilane compounds together with the first alkoxysilane compound having the largest n in general formula 1. But you can. That is, the film-forming composition includes two or more alkoxysilane compounds represented by the general formula 1 having different n (different alkyl chain lengths), and the included alkoxysilane compounds may be two or more. But you can. From the viewpoint of ease of improving the antifouling property, the types of the alkoxysilane compounds represented by the general formula 1 contained in the film forming composition are preferably 2 to 4 types, and 2 or 3 types. More preferably, it is more preferable that they are two types.
 上記の二種以上のアルコキシシラン化合物の混合比に関して、より良好な防汚性を物品表面に付与する観点から、nが最大のアルコキシシラン化合物(第一のアルコキシシラン化合物)の含有率は、上記被膜形成用組成物に含まれる一般式1で表されるアルコキシシラン化合物の合計含有量(100質量%)に対して、5.0質量%以上であることが好ましく、10.0質量%以上であることがより好ましく、20.0質量%以上であることがより好ましく、30.0質量%以上であることが更に好ましく、40.0質量%以上であることが一層好ましく、50.0質量%以上であることがより一層好ましく、60.0質量%以上であることが更に一層好ましく、70.0質量%以上であることが更により一層好ましく、80.0質量%以上であることがなお一層好ましい。また、nが最大のアルコキシシラン化合物(第一のアルコキシシラン化合物)の上記含有率は、95.0質量%以下であることが好ましく、90.0質量%以下であることがより好ましい。 Regarding the mixing ratio of the above two or more types of alkoxysilane compounds, from the viewpoint of imparting better antifouling properties to the article surface, the content of the alkoxysilane compound having the maximum n (first alkoxysilane compound) is as described above. The total content (100% by mass) of the alkoxysilane compound represented by the general formula 1 contained in the film-forming composition is preferably 5.0% by mass or more, and preferably 10.0% by mass or more. More preferably, it is more preferably 20.0% by mass or more, further preferably 30.0% by mass or more, still more preferably 40.0% by mass or more, and 50.0% by mass. More preferably, it is 60.0% by mass or more, even more preferably 70.0% by mass or more, and even more preferably 80.0% by mass or more. It is even more preferably. The content of the alkoxysilane compound (first alkoxysilane compound) having the maximum n is preferably 95.0% by mass or less, and more preferably 90.0% by mass or less.
 以上説明した一般式1で表されるアルコキシシラン化合物は、市販品として入手可能であり、公知の方法で合成することもできる。その具体例としては、例えば、エチルトリメトキシシラン、エチルトリエトキシシラン、プロピルトリメトキシシラン、プロピルトリエトキシシラン、ブチルトリメトキシシラン、ブチルトリエトキシシラン、ペンチルトリメトキシシラン、ペンチルトリエトキシシラン、ヘキシルトリメトキシシラン、ヘキシルトリエトキシシラン、オクチルトリメトキシシラン、オクチルトリエトキシシラン、デシルトリメトキシシラン、デシルトリエトキシシラン、ドデシルトリメトキシシラン、ドデシルトリエトキシシラン、オクタデシルトリメトキシシラン、オクタデシルトリエトキシシラン等を挙げることができる。 The alkoxysilane compound represented by the general formula 1 described above is available as a commercial product and can be synthesized by a known method. Specific examples thereof include, for example, ethyltrimethoxysilane, ethyltriethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, butyltrimethoxysilane, butyltriethoxysilane, pentyltrimethoxysilane, pentyltriethoxysilane, hexyltri. Examples include methoxysilane, hexyltriethoxysilane, octyltrimethoxysilane, octyltriethoxysilane, decyltrimethoxysilane, decyltriethoxysilane, dodecyltrimethoxysilane, dodecyltriethoxysilane, octadecyltrimethoxysilane, octadecyltriethoxysilane, etc. be able to.
<その他の任意成分>
 上記被膜形成用組成物は、以上説明した二種以上のアルコキシシラン化合物を含む。上記被膜形成用組成物、これらアルコキシシラン化合物からなる組成物であってもよく、溶媒、添加剤等の被膜形成用組成物の成分として公知の成分の一種以上を任意に含むこともできる。任意に含まれ得る成分については、公知技術を適用することができる。また、上記被膜形成用組成物中の上記アルコキシシラン化合物の濃度は特に限定されるものではなく、例えば被膜形成方法等を考慮して設定すればよい。
<Other optional components>
The film-forming composition contains two or more types of alkoxysilane compounds described above. The film-forming composition may be a composition comprising these alkoxysilane compounds, and may optionally contain one or more known components as components of the film-forming composition such as a solvent and an additive. Known components can be applied to components that can be optionally included. Further, the concentration of the alkoxysilane compound in the film forming composition is not particularly limited, and may be set in consideration of, for example, a film forming method.
[被膜を有する物品およびその製造方法]
 本発明の更なる態様は、
 上記被膜形成用組成物から形成された被膜を最表層に有する物品;および、
 上記被膜形成用組成物を用いる被膜形成工程を含む、被膜を最表層に有する物品の製造方法、
 に関する。以下に、上記物品および製造方法について、更に詳細に説明する。
[Article having coating and method for producing the same]
A further aspect of the invention provides:
An article having, as an outermost layer, a film formed from the film-forming composition; and
A method for producing an article having a film on the outermost layer, comprising a film forming step using the film forming composition;
About. Below, the said article | item and manufacturing method are demonstrated in detail.
<物品>
 上記被膜形成用組成物は、様々な物品の最表層に被膜を形成するために用いることができ、被膜を形成することにより、この被膜が形成された物品の表面に優れた防汚性をもたらすことができる。物品としては、その上に被膜が形成される表面(以下、「下地面」と記載する。)が、無機物質、有機物質、有機物質と無機物質との複合材料等の各種物質の表面である物品を挙げることができる。物品の具体例としては、例えばレンズ(例えば眼鏡レンズ、サングラス等)等の光学部材、窓ガラス、建築材料、輸送機器、乗物材料、半導体基板等が挙げられる。ただしこれら例示した物品に限定されるものではなく、上記被膜を最表層に有する物品は、使用時等に汚れが付着する可能性のあるため表面に防汚性を有することが望ましい様々な物品であることができる。また、上記被膜は、物品の少なくとも一部に最表層として存在すればよい。また、被膜が形成される表面(下地面)の形状も限定されず、平面、曲面等の任意の形状であることができる。一般式1中のケイ素分子(Si)と連結しているアルコキシ基が下地面との結合部および/または吸着部になることにより、上記被膜形成用組成物の被膜を下地面上に形成することができると考えられる。また、こうして形成される被膜の膜厚は、例えば0.5~2.5nmの範囲であることができる。一態様では、上記被膜は、上記アルコキシシラン化合物の単分子膜であることができる。単分子膜は、末端官能基が下地面との結合部および/または吸着部となることで分子が下地面上に固定されることによって形成され、一分子の分子長に近似した膜厚を有する。上記被膜形成用組成物は二種以上のアルコキシシラン化合物を含むため、単分子膜の膜厚は、これら二種以上のアルコキシシラン化合物の種類および混合比によって制御することができると本発明者らは推察している。例えば、より分子長が長いアルコキシシラン化合物を用いるほど単分子膜の膜厚は厚くなると考えられる。また、二種以上のアルコキシシラン化合物の中で分子長がより長いアルコキシシラン化合物の割合を高めるほど、単分子膜の膜厚を厚くすることができると考えられる。一方、例えば、下地面と結合または吸着した分子に更に分子が結合して形成された被膜は、二分子膜と呼ばれ、一分子の分子長を超えて二分子の分子長に近似した膜厚を有する。単分子膜は、二分子膜等の多分子膜と比べて膜物性の制御が容易な傾向がある。また、単分子膜は、二分子膜等の多分子膜と比べて表面平滑性に優れる傾向がある。この点は、表面平滑性に優れることが望まれる物品の最表層に形成する被膜として好ましい。表面平滑性に関して、上記被膜の表面において走査型プローブ顕微鏡(Scanning Probe Microscope;SPM)により測定される平均自乗粗さは、例えば0.20nm以上0.80nm以下であることができる。
<Article>
The film-forming composition can be used to form a film on the outermost layer of various articles. By forming a film, the surface of the article on which the film is formed has excellent antifouling properties. be able to. As an article, the surface on which a film is formed (hereinafter referred to as “base surface”) is the surface of various substances such as an inorganic substance, an organic substance, and a composite material of an organic substance and an inorganic substance. Articles can be mentioned. Specific examples of the article include optical members such as lenses (for example, eyeglass lenses, sunglasses, etc.), window glass, building materials, transportation equipment, vehicle materials, semiconductor substrates, and the like. However, the present invention is not limited to these exemplified articles, and the articles having the above-mentioned coating film on the outermost layer are various articles that desirably have antifouling properties on the surface because there is a possibility that dirt may adhere during use. Can be. Moreover, the said film should just exist as an outermost layer in at least one part of articles | goods. Further, the shape of the surface (base surface) on which the film is formed is not limited, and may be any shape such as a flat surface or a curved surface. Forming a coating film of the above-mentioned film-forming composition on the base surface by the alkoxy group linked to the silicon molecule (Si) in the general formula 1 becoming a bond portion and / or an adsorption portion with the base surface. It is thought that you can. In addition, the film thickness thus formed can be in the range of 0.5 to 2.5 nm, for example. In one embodiment, the coating film may be a monomolecular film of the alkoxysilane compound. The monomolecular film is formed by fixing the molecule on the base surface by the terminal functional group becoming a binding portion and / or an adsorbing portion with the base surface, and has a film thickness that approximates the molecular length of one molecule. . Since the film-forming composition contains two or more types of alkoxysilane compounds, the present inventors believe that the film thickness of the monomolecular film can be controlled by the type and mixing ratio of these two or more types of alkoxysilane compounds. I guess. For example, the monomolecular film is considered to be thicker as the alkoxysilane compound having a longer molecular length is used. In addition, it is considered that the film thickness of the monomolecular film can be increased as the proportion of the alkoxysilane compound having a longer molecular length among the two or more types of alkoxysilane compounds is increased. On the other hand, for example, a film formed by further bonding molecules to the molecules bonded or adsorbed to the base surface is called a bimolecular film, and has a film thickness that exceeds the molecular length of one molecule and approximates the molecular length of two molecules. Have Monomolecular films tend to be easier to control film properties than multimolecular films such as bimolecular films. Monomolecular films tend to be superior in surface smoothness compared to multimolecular films such as bimolecular films. This point is preferable as a film formed on the outermost layer of an article that is desired to have excellent surface smoothness. Regarding the surface smoothness, the mean square roughness measured by a scanning probe microscope (SPM) on the surface of the coating can be, for example, 0.20 nm or more and 0.80 nm or less.
<被膜形成工程>
 上記被膜形成用組成物を用いることにより、上記被膜形成用組成物から形成された被膜を下地面上に形成することができる。この被膜が物品の最表層に存在することにより、物品表面に優れた防汚性をもたらすことができる。被膜の形成は、乾式被膜形成法によって行ってもよく、湿式被膜形成法によって行ってもよい。被膜の形成前に下地面に公知の方法によって前処理を行うこともできる。前処理の一例としては、下地面上にヒドロキシ基(OH)を導入するための処理を挙げることができる。導入されるヒドロキシ基は、上記アルコキシシラン化合物の加水分解(詳細は後述する)によって生成されるシラノール基との化学結合や水素結合の形成に寄与し得ると推察される。
<Film formation process>
By using the film forming composition, a film formed from the film forming composition can be formed on the base surface. The presence of this coating on the outermost layer of the article can provide excellent antifouling properties on the article surface. The film may be formed by a dry film forming method or a wet film forming method. Prior to the formation of the coating, the base surface can be pretreated by a known method. As an example of the pretreatment, a treatment for introducing a hydroxy group (OH) onto the base surface can be mentioned. It is speculated that the introduced hydroxy group can contribute to the formation of chemical bonds and hydrogen bonds with silanol groups generated by hydrolysis of the alkoxysilane compound (details will be described later).
 湿式被膜形成法は、被膜形成用組成物を下地面上に塗布する工程を経て被膜を形成する方法であり、塗布方法としては、スピンコート法、ディッピング法、スプレーコート法等の公知の塗布方法を用いることができる。好ましくは、塗布後に被膜形成用組成物の塗布層を加熱することにより、被膜を形成することができる。加熱することにより塗布層に含まれる上記アルコキシシラン化合物の加水分解を進行させることができ、塗布層を乾燥させることもできる。上記アルコキシシラン化合物を加水分解することによりシラノール基(Si-OH)が生成され、このシラノール基が下地面との結合または吸着に寄与し得ると推察される。例えば、下地面との結合または吸着には水素結合が寄与する場合もあると考えられ、生成されたシラノール基が下地面に存在するヒドロキシ基と反応して化学結合(-Si-O-)が形成されることが下地面と被膜との密着に寄与する場合もあると考えられる。なお上記被膜形成用組成物は水系組成物であっても非水系組成物であってもよい。なお「水系」とは、水を含むことを意味する。上記アルコキシシラン化合物の加水分解は雰囲気中の水分によっても進行し得るため、上記被膜形成用組成物は非水系組成物であってもよい。また、加熱温度等の加熱に関する詳細については、シランカップリング剤の加水分解に関する公知技術を適用することができる。
 一方、乾式被膜形成法としては、上記被膜形成用組成物を揮発させる工程を含む各種方法、例えば、真空蒸着法、イオンアシスト法、イオンプレーティング法、反応性スパッタリング法、化学気相成長法(CVD; chemical vapor deposition)等を挙げることができる。乾式被膜形成法においても、上記アルコキシシラン化合物の加水分解によりシラノール基(Si-OH)が生成されることが、被膜と下地面との結合または吸着に寄与し得ると推察される。
The wet film forming method is a method of forming a film through a step of applying a film forming composition onto a base surface, and the coating method includes known coating methods such as a spin coating method, a dipping method, and a spray coating method. Can be used. Preferably, the coating film can be formed by heating the coating layer of the coating film-forming composition after coating. By heating, the alkoxysilane compound contained in the coating layer can be hydrolyzed, and the coating layer can be dried. It is presumed that silanol groups (Si—OH) are generated by hydrolyzing the alkoxysilane compound, and that the silanol groups can contribute to bonding or adsorption with the base surface. For example, it is considered that hydrogen bonds may contribute to bonding or adsorption with the base surface, and the generated silanol groups react with hydroxy groups present on the base surface to form chemical bonds (—Si—O—). It is considered that the formation may contribute to the adhesion between the base surface and the coating. The film-forming composition may be an aqueous composition or a non-aqueous composition. “Aqueous” means containing water. Since the hydrolysis of the alkoxysilane compound can proceed even with moisture in the atmosphere, the film-forming composition may be a non-aqueous composition. Moreover, about the detail regarding heating, such as heating temperature, the well-known technique regarding the hydrolysis of a silane coupling agent is applicable.
On the other hand, as a dry film forming method, various methods including a step of volatilizing the film forming composition, for example, a vacuum deposition method, an ion assist method, an ion plating method, a reactive sputtering method, a chemical vapor deposition method ( CVD; chemical vapor deposition) and the like. Also in the dry film forming method, it is speculated that the generation of silanol groups (Si—OH) by hydrolysis of the alkoxysilane compound may contribute to the bonding or adsorption between the film and the base surface.
 上記被膜形成工程により形成される被膜は、優れた防汚性を発揮することができる。ところで防汚性に関して、本発明者らは、物品表面の接触角ヒステリシスを下げることが物品表面の防汚性を高めることに寄与すると考えている。この点について、以下に更に説明する。
 接触角は、静的接触角と動的接触角に大別される。一般に撥水性の指標として用いられる接触角は水に対する静的接触角である。これに対し動的接触角とは、液滴の動的挙動の指標になり得る。そして接触角ヒステリシスは、動的接触角の前進接触角(advancing contact angle;「θa」と記載する。)と後退接触角(receding contact angle;「θr」と記載する。)との差Δθとして求められる。Δθ=θa-θrである。接触角ヒステリシスには、分子の回転運動が寄与すると考えられる。一般式1で表されるアルコキシシラン化合物においては、アルキレン部と連結しているメチル基の回転運動が、接触角ヒステリシスの低下に寄与すると本発明者らは推察している。一般式1で表されるアルコキシシラン化合物を一種のみ使用して形成された被膜と比べて、二種以上使用して形成された被膜では、アルキル鎖長がより長い(一般式1中のnがより大きい)アルコキシシラン化合物中のアルキレン部に連結しているメチル基がより回転運動しやすい状態で存在していると考えられる。このことが、接触角ヒステリシスを低下させることに寄与するのではないかと本発明者らは推察している。ただし以上は推察であって、本発明を何ら限定するものではない。
The film formed by the film forming process can exhibit excellent antifouling properties. By the way, regarding the antifouling property, the present inventors believe that lowering the contact angle hysteresis on the surface of the article contributes to increasing the antifouling property of the article surface. This point will be further described below.
The contact angle is roughly classified into a static contact angle and a dynamic contact angle. Generally, the contact angle used as an index of water repellency is a static contact angle with respect to water. In contrast, the dynamic contact angle can be an indicator of the dynamic behavior of the droplet. The contact angle hysteresis is obtained as a difference Δθ between the advancing contact angle (described as “θa”) and the receding contact angle (described as “θr”) of the dynamic contact angle. It is done. Δθ = θa−θr. It is considered that the rotational motion of molecules contributes to the contact angle hysteresis. In the alkoxysilane compound represented by the general formula 1, the present inventors presume that the rotational movement of the methyl group linked to the alkylene part contributes to the reduction of the contact angle hysteresis. Compared to a film formed using only one kind of alkoxysilane compound represented by the general formula 1, a film formed using two or more kinds has a longer alkyl chain length (n in the general formula 1 is It is considered that the methyl group connected to the alkylene part in the alkoxysilane compound (which is larger) exists in a state in which it is more likely to rotate. The present inventors speculate that this may contribute to lowering the contact angle hysteresis. However, the above is inference and does not limit the present invention.
 本発明および本明細書において、前進接触角および後退接触角は、温度22~25℃および相対湿度35~60%の測定環境において、拡張収縮法により測定される。前進接触角および後退接触角をそれぞれ任意の5箇所において測定し、測定された値の算術平均を用いて、接触角ヒステリシスを算出するものとする。上記被膜表面において測定される水に対する接触角ヒステリシスは、10.0°以下であることが好ましく、9.5°以下であることがより好ましく、9.0°以下であることがより好ましく、8.5°以下であることが更に好ましく、8.0°以下であることが一層好ましい。また、上記被膜表面において測定される接触角ヒステリシスは、例えば3.0°以上、4.0°以上、5.0以上または6.0°以上であることができる。ただし接触角ヒステリシスの値が小さいほど防汚性の観点から好ましいと考えられるため、これら例示した下限を下回ってもよい。 In the present invention and the present specification, the advancing contact angle and the receding contact angle are measured by the expansion / contraction method in a measurement environment having a temperature of 22 to 25 ° C. and a relative humidity of 35 to 60%. It is assumed that the advancing contact angle and the receding contact angle are measured at arbitrary five locations, respectively, and the contact angle hysteresis is calculated using the arithmetic average of the measured values. The water contact angle hysteresis measured on the surface of the coating is preferably 10.0 ° or less, more preferably 9.5 ° or less, and even more preferably 9.0 ° or less. More preferably, it is not more than 0.5 °, and more preferably not more than 8.0 °. Further, the contact angle hysteresis measured on the surface of the film can be, for example, 3.0 ° or more, 4.0 ° or more, 5.0 or more, or 6.0 ° or more. However, it is considered that the smaller the value of the contact angle hysteresis, the better from the viewpoint of antifouling properties.
 また一態様では、上記被膜表面は優れた撥水性を有することできる。撥水性の指標としては静的接触角を用いることができる。上記被膜表面は、一態様では、水に対する静的接触角が90.0°以上であることができ、95.0°以上であることが好ましく、100.0°以上であることがより好ましい。水に対する静的接触角は、例えば120.0°以下であることができるが、これを超えてもよい。本発明および本明細書において、静的接触角は、温度22~25℃および相対湿度35~60%の測定環境において、液滴法によって任意の5箇所において測定した値の算術平均として求めるものとする。 In one embodiment, the coating surface can have excellent water repellency. A static contact angle can be used as an index of water repellency. In one embodiment, the surface of the coating film may have a static contact angle with respect to water of 90.0 ° or more, preferably 95.0 ° or more, and more preferably 100.0 ° or more. The static contact angle for water can be, for example, 120.0 ° or less, but may exceed this. In the present invention and the present specification, the static contact angle is obtained as an arithmetic average of values measured at any five locations by the droplet method in a measurement environment having a temperature of 22 to 25 ° C. and a relative humidity of 35 to 60%. To do.
 更に本発明によれば、少なくとも一部の最表層としてアルコキシシラン化合物(ただしフッ素原子を含まない。)の単分子膜を有する物品であって、上記最表層の表面における水に対する接触角ヒステリシスが10.0°以下である物品も提供される。かかる物品の詳細については、先の記載を参照できる。 Furthermore, according to the present invention, the article has a monomolecular film of an alkoxysilane compound (but does not contain fluorine atoms) as at least a part of the outermost layer, and the contact angle hysteresis with respect to water on the surface of the outermost layer is 10 Articles that are less than or equal to 0 ° are also provided. For details of such articles, reference may be made to the above description.
 以下、本発明を実施例により更に説明する。ただし本発明は実施例に示す態様に限定されるものではない。 Hereinafter, the present invention will be further described with reference to examples. However, the present invention is not limited to the embodiment shown in the examples.
 以下の実施例および比較例で使用されたアルコキシシラン化合物は、市販の下記アルコキシシラン化合物である。
 HXS(Hexyltrimethoxysilane):一般式1中、R、R、R=CH、n=5
 OTS(Octyltrimethoxysilane):一般式1中、R、R、R=CH、n=7
 DCS(Decyltrimethoxysilane):一般式1中、R、R、R=CH、n=9
 DDS(Dodecyltrimethoxysilane):一般式1中、R、R、R=CH、n=11
 HDS(Hexadecyltrimethoxysilane):一般式1中、R、R、R=CH、n=15
 ODS(Octadecyltrimethoxysilane):一般式1中、R、R、R=CH、n=17
The alkoxysilane compounds used in the following examples and comparative examples are the following commercially available alkoxysilane compounds.
HXS (Hexyltrimethylsilane): In General Formula 1, R 1 , R 2 , R 3 = CH 3 , n = 5
OTS (Octyltrimethylsilane): In the general formula 1, R 1 , R 2 , R 3 = CH 3 , n = 7
DCS (Decytrimethylsilane): In the general formula 1, R 1 , R 2 , R 3 = CH 3 , n = 9
DDS (Dodecyltrimethylsilane): In General Formula 1, R 1 , R 2 , R 3 = CH 3 , n = 11
HDS (Hexadecyltrimethylsilane): In General Formula 1, R 1 , R 2 , R 3 = CH 3 , n = 15
ODS (Octadecyltrimethylsilane): In General Formula 1, R 1 , R 2 , R 3 = CH 3 , n = 17
1.下地面の前処理
 試料として10mm×20mmのサイズのガラス板を用意し、表面の付着物を除去するためにアセトン、エタノール、超純水の順にそれぞれ超音波洗浄を10分間行った。有機溶媒(アセトン、エタノール)による洗浄後の試料表面は窒素銃によって乾燥させた。
 上記洗浄後の試料表面に大気圧下で真空紫外線(Vacuum Ultra Violet;VUV)を20分間照射した。VUV照射処理は、ウシオ電機社製VUVランプ(Model:SUS713、波長λ=172nm、光強度10mW/cm以上)を搭載した紫外線照射器(ウシオ電機社製)を用いて行った。このVUV処理により試料表面のヒドロキシ基量を増加させることができる。こうしてVUV処理した試料表面を下地面として、以下に記載の方法により下地面上に被膜を形成した。
1. Pretreatment of lower ground A glass plate having a size of 10 mm × 20 mm was prepared as a sample, and ultrasonic cleaning was performed for 10 minutes in order of acetone, ethanol, and ultrapure water in order to remove surface deposits. The sample surface after washing with an organic solvent (acetone, ethanol) was dried with a nitrogen gun.
The sample surface after the cleaning was irradiated with vacuum ultraviolet (VUV) for 20 minutes under atmospheric pressure. The VUV irradiation treatment was performed using an ultraviolet irradiator (manufactured by USHIO INC.) Equipped with a VUV lamp manufactured by USHIO ELECTRIC CO., LTD. (Model: SUS713, wavelength λ = 172 nm, light intensity of 10 mW / cm 2 or more). By this VUV treatment, the amount of hydroxy groups on the sample surface can be increased. Using the sample surface thus treated with VUV as a base surface, a film was formed on the base surface by the method described below.
2.被膜形成用組成物の準備
 単独のアルコキシシラン化合物または二種のアルコキシシラン化合物の混合物を被膜形成用組成物として準備した。被膜形成用組成物(アルコキシシラン化合物)の総量は180μLまたは200μLとした。準備した被膜形成用組成物の組成を、後述の表5、6に示す。
2. Preparation of Film Forming Composition A single alkoxysilane compound or a mixture of two alkoxysilane compounds was prepared as a film forming composition. The total amount of the film forming composition (alkoxysilane compound) was 180 μL or 200 μL. The compositions of the prepared film forming compositions are shown in Tables 5 and 6 below.
3.被膜形成工程
 上記2.で準備した各被膜形成用組成物を用いて、熱化学気相成長法によって上記1.で準備した下地面上に被膜を形成した。熱化学気相成長法による被膜形成は、以下のように実施した。
 被膜形成用組成物を入れたサンプル管瓶と上記1.の前処理後の試料を、相対湿度を15%に保ったグローブボックス内でテフロン(登録商標)容器(直径12cm×高さ5cm)の中に一緒に入れ密閉した。その後、炉内温度を100℃に設定した電気炉内で24時間加熱保持した。
3. Film formation step 2. Using the respective film-forming compositions prepared in 1 above, the above-described 1. A film was formed on the base surface prepared in (1). Film formation by thermal chemical vapor deposition was performed as follows.
Sample tube bottle containing the film-forming composition and the above 1. The samples after the pretreatment were sealed together in a Teflon (registered trademark) container (diameter 12 cm × height 5 cm) in a glove box maintained at a relative humidity of 15%. Thereafter, the furnace was heated and held for 24 hours in an electric furnace set at a furnace temperature of 100 ° C.
4. 評価方法
(1)接触角測定
 静的接触角は液滴法、動的接触角(前進接触角および後退接触角)は拡張収縮法により測定した。静的接触角および動的接触角の測定条件を表1に示す。測定用液体として水を使用し、静的接触角、前進接触角および後退接触角の測定は、それぞれ被膜表面の無作為に定めた5箇所において行い、測定装置としては自動接触角計(Model:DM-501、協和界面科学社製)を使用した。測定は、温度22~25℃および相対湿度35~60%の測定環境下において行った。
4). Evaluation Method (1) Contact Angle Measurement The static contact angle was measured by the droplet method, and the dynamic contact angle (advanced contact angle and receding contact angle) was measured by the expansion / contraction method. Table 1 shows the measurement conditions for the static contact angle and the dynamic contact angle. Water is used as the measurement liquid, and the static contact angle, advancing contact angle, and receding contact angle are measured at five randomly determined locations on the coating surface, and an automatic contact angle meter (Model: DM-501 (manufactured by Kyowa Interface Science Co., Ltd.) was used. The measurement was performed in a measurement environment at a temperature of 22 to 25 ° C. and a relative humidity of 35 to 60%.
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
(2)被膜の膜厚測定
 被膜表面の無作為に定めた5箇所においてエリプソメーターにより膜厚測定を行い、測定された値の算術平均として被膜の膜厚を求めた。エリプソメーターとしては、超小型エリプソメーター(Model:MACO-101、ファイブラボ社製)を使用し、表2に示す測定条件で膜厚測定を行った。
(2) Film thickness measurement of film The film thickness was measured with an ellipsometer at five randomly defined positions on the film surface, and the film thickness of the film was determined as an arithmetic average of the measured values. As the ellipsometer, an ultra-small ellipsometer (Model: MACO-101, manufactured by Fibrabo) was used, and the film thickness was measured under the measurement conditions shown in Table 2.
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
(3)走査型プローブ顕微鏡(Scanning Probe Microscope;SPM)による被膜の表面粗さ測定
 被膜表面の表面粗さ(平均自乗粗さ)を、走査型プローブ顕微鏡(Model:SPM-9700HT、島津製作所社製)によって測定した。測定条件を表3に示し、使用したカンチレバーの詳細を表4に示す。
(3) Measurement of coating surface roughness with a scanning probe microscope (SPM) The surface roughness of the coating surface (mean square roughness) was measured using a scanning probe microscope (Model: SPM-9700HT, manufactured by Shimadzu Corporation). ). The measurement conditions are shown in Table 3, and details of the used cantilevers are shown in Table 4.
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000007
(4)防汚性評価
 以下では、上記被膜を形成した試料を、「評価用試料」と呼ぶ。
 評価用試料について、可視光(400~700nm)透過率(泥水滴下前透過率)を測定した。
 その後、評価用試料を、上記被膜の表面を上方に向けて水平面に対して5°傾けた状態で配置し、上記被膜の表面に泥水を滴下し、その状態で30秒間保持した。その後、泥水滴下後の評価用試料の可視光透過率(泥水滴下後透過率)を測定した。
 以上の可視光透過率測定は、紫外可視分光光度計(UV-vis:島津製作所社製UV-2600)を用いて、測定波長範囲を400~700nmとし、スキャン速度は中速として行った。
 泥水滴下前後の透過率差(泥水滴下前透過率-泥水滴下後透過率)の値が小さいほど、被膜表面の防汚性が高いと判断することができる。
(4) Evaluation of antifouling property In the following, the sample on which the coating film is formed is referred to as "evaluation sample".
With respect to the sample for evaluation, the visible light (400 to 700 nm) transmittance (transmittance before dropping muddy water) was measured.
Thereafter, the sample for evaluation was placed in a state where the surface of the coating film was inclined 5 ° with respect to a horizontal plane with the surface of the coating film facing upward, and muddy water was dropped on the surface of the coating film, and held in that state for 30 seconds. Thereafter, the visible light transmittance (transmittance after dripping muddy water) of the sample for evaluation after dripping muddy water was measured.
The above visible light transmittance measurement was performed using an ultraviolet-visible spectrophotometer (UV-vis: UV-2600 manufactured by Shimadzu Corporation) with a measurement wavelength range of 400 to 700 nm and a scan speed of medium.
It can be judged that the smaller the value of the transmittance difference before and after the muddy water dripping (permeability before muddy water dripping-transmittance after muddy water dripping) is, the higher the antifouling property of the coating surface.
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000009
Figure JPOXMLDOC01-appb-T000009
 表5、6に示す泥水滴下前後の透過率差の値から、実施例で形成された被膜は比較例で形成された被膜と比べて防汚性に優れることが確認できる。表5、6に示すように実施例で形成された被膜はいずれも接触角ヒステリシスが10.0°以下であり、比較例で形成された被膜より接触角ヒステリシスが小さい。このことが、実施例で形成した被膜が比較例で形成した被膜と比べて防汚性に優れる理由と考えられる。
 更に、実施例で形成された被膜は水に対する静的接触角が高く、撥水性に優れることも確認できる。
 以上の通り、表5、6に示す実施例で形成された被膜は防汚性に優れる防汚性被膜であり、撥水性被膜としても機能し得る被膜であった。
 また、表5、6に示す被膜の膜厚および粗さから、表5、6に示す実施例で形成された被膜はアルコキシシラン化合物の単分子膜であることも確認できる。
From the values of the transmittance difference before and after the muddy water dropping shown in Tables 5 and 6, it can be confirmed that the coating formed in the example is superior in antifouling property as compared with the coating formed in the comparative example. As shown in Tables 5 and 6, the films formed in the examples all have a contact angle hysteresis of 10.0 ° or less, and the contact angle hysteresis is smaller than that of the film formed in the comparative example. This is considered to be the reason why the coating film formed in the example is superior in antifouling property as compared with the coating film formed in the comparative example.
Furthermore, it can be confirmed that the coating formed in the examples has a high static contact angle with water and excellent water repellency.
As described above, the coatings formed in the examples shown in Tables 5 and 6 are antifouling coatings having excellent antifouling properties, and were also coatings that can function as water-repellent coatings.
Moreover, from the film thickness and roughness of the film shown in Tables 5 and 6, it can also be confirmed that the film formed in the examples shown in Tables 5 and 6 is a monomolecular film of an alkoxysilane compound.
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000010
 表7に示す実施例で形成された被膜は、いずれも接触角ヒステリシスが10.0°以下であった。表5、6に示す実施例で形成された被膜が、接触角ヒステリシスが10.0°以下であり優れた防汚性を示したことから、表7に示す実施例で形成された被膜も防汚性に優れるということができる。即ち、表7に示す実施例で形成された被膜は防汚性に優れる防汚性被膜であり、撥水性被膜としても機能し得る被膜である。
 また、表7に示す被膜の膜厚および粗さから、表7に示す実施例で形成された被膜はアルコキシシラン化合物の単分子膜であることも確認できる。
All the coatings formed in the examples shown in Table 7 had a contact angle hysteresis of 10.0 ° or less. The coatings formed in the examples shown in Tables 5 and 6 showed excellent antifouling properties with a contact angle hysteresis of 10.0 ° or less. It can be said that it is excellent in dirtiness. That is, the film formed in the examples shown in Table 7 is an antifouling film having excellent antifouling properties, and can also function as a water-repellent film.
Moreover, from the film thickness and roughness of the film shown in Table 7, it can also be confirmed that the film formed in the examples shown in Table 7 is a monomolecular film of an alkoxysilane compound.
 表7に示す実施例3-1~実施例3-5で形成された被膜は、第二のアルコキシシラン化合物の種類を変えた点以外は同様に形成された被膜である。実施例3-1~実施例3-4で形成された被膜が、実施例3-5で形成された被膜と比べて接触角ヒステリシスが小さな値であったことから、第一のアルコキシシラン化合物と第二のアルコキシシラン化合物との一般式1中のnの差は、より良好な防汚性を物品表面に付与する観点からは、3以上であることがより好ましいと考えられる。 The films formed in Example 3-1 to Example 3-5 shown in Table 7 are similarly formed except that the type of the second alkoxysilane compound is changed. Since the film formed in Example 3-1 to Example 3-4 had a smaller contact angle hysteresis than the film formed in Example 3-5, the first alkoxysilane compound and From the viewpoint of imparting better antifouling properties to the article surface, it is considered that the difference in n in general formula 1 with the second alkoxysilane compound is more preferably 3 or more.
 最後に、前述の各態様を総括する。 Finally, the above aspects will be summarized.
 一態様によれば、上記一般式1で表されるアルコキシシラン化合物を二種以上含み、かつこれら二種以上のアルコキシシラン化合物は一般式1中のnが異なる被膜形成用組成物が提供される。 According to one aspect, there is provided a film forming composition comprising two or more alkoxysilane compounds represented by the above general formula 1, wherein the two or more alkoxysilane compounds have different n in the general formula 1. .
 上記被膜形成用組成物によれば、この組成物を用いて物品最表層に被膜を形成することにより、物品表面に優れた防汚性をもたらすことができる。 According to the composition for forming a film, by using this composition to form a film on the outermost layer of the article, excellent antifouling property can be provided on the surface of the article.
 一態様では、上記被膜形成用組成物は、nの差が2以上である一般式1で表されるアルコキシシラン化合物を含む。 In one embodiment, the film forming composition includes an alkoxysilane compound represented by the general formula 1 in which the difference in n is 2 or more.
 一態様では、上記二種以上のアルコキシシラン化合物の中で、nが最大のアルコキシシラン化合物の含有率は、上記二種以上のアルコキシシラン化合物の合計含有量に対して、5.0~95.0質量%の範囲である。 In one embodiment, among the two or more alkoxysilane compounds, the content of the alkoxysilane compound having the largest n is 5.0 to 95. with respect to the total content of the two or more alkoxysilane compounds. It is in the range of 0% by mass.
 一態様では、上記被膜用組成物には、一般式1中のnが異なるアルコキシシラン化合物が二種含まれる。 In one aspect, the coating composition contains two alkoxysilane compounds having different n in the general formula 1.
 一態様では、一般式1中、R、RおよびRは、それぞれ独立に炭素数1~3のアルキル基を表す。 In one embodiment, in general formula 1, R 1 , R 2 and R 3 each independently represents an alkyl group having 1 to 3 carbon atoms.
 他の一態様によれば、上記被膜形成用組成物から形成された被膜を最表層に有する物品が提供される。 According to another aspect, there is provided an article having a film formed from the film forming composition as an outermost layer.
 上記物品は、上記被膜を最表層に有することにより、優れた防汚性を発揮することができる。 The article can exhibit excellent antifouling properties by having the coating film on the outermost layer.
 他の一態様によれば、上記被膜形成用組成物を用いる被膜形成工程を含む、被膜を最表層に有する物品の製造方法が提供される。 According to another aspect, there is provided a method for producing an article having a coating on the outermost layer, including a coating forming step using the coating forming composition.
 一態様では、上記被膜形成工程は、乾式被膜形成法により行われる。 In one aspect, the film forming step is performed by a dry film forming method.
 他の一態様によれば、少なくとも一部の最表層としてアルコキシシラン化合物(ただしフッ素原子を含まない。)の単分子膜を有する物品であって、上記最表層の表面における水に対する接触角ヒステリシスが10.0°以下である物品も提供される。 According to another aspect, the article has a monomolecular film of an alkoxysilane compound (but does not contain a fluorine atom) as at least a part of the outermost layer, and has a contact angle hysteresis with respect to water on the surface of the outermost layer. Articles that are 10.0 degrees or less are also provided.
 上記物品は、上記被膜表面が優れた防汚性を有することにより、汚れの付着を抑制することができ、および/または、付着した汚れを容易に除去することができる。 The article has an excellent antifouling property on the surface of the coating, so that the adhesion of dirt can be suppressed and / or the attached dirt can be easily removed.
 一態様では、上記アルコキシシラン化合物(ただしフッ素原子を含まない。)は、炭素原子、水素原子、酸素原子およびケイ素原子からなる化合物である。 In one embodiment, the alkoxysilane compound (but not including a fluorine atom) is a compound composed of a carbon atom, a hydrogen atom, an oxygen atom, and a silicon atom.
 一態様では、上記アルコキシシラン化合物(ただしフッ素原子を含まない。)は、一般式1で表されるアルコキシシラン化合物である。 In one embodiment, the alkoxysilane compound (but not including a fluorine atom) is an alkoxysilane compound represented by General Formula 1.
 一態様では、上記被膜は、上記一般式1で表されるアルコキシシラン化合物を二種以上含み、かつこれら二種以上のアルコキシシラン化合物は一般式1中のnが異なる被膜形成用組成物から形成された被膜である。 In one embodiment, the coating film includes two or more alkoxysilane compounds represented by the general formula 1, and the two or more alkoxysilane compounds are formed from a film-forming composition having a different n in the general formula 1. The coated film.
 今回開示された実施の形態はすべての点で例示であって制限的なものではないと考えられるべきである。本発明の範囲は上記した説明ではなくて特許請求の範囲によって示され、特許請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。
 
 
The embodiment disclosed this time should be considered as illustrative in all points and not restrictive. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

Claims (8)

  1. 下記一般式1:
    Figure JPOXMLDOC01-appb-C000001
    (一般式1中、R、RおよびRは、それぞれ独立にアルキル基を表し、nは0または1以上の整数を表す。)
    で表されるアルコキシシラン化合物を二種以上含み、かつ前記二種以上のアルコキシシラン化合物は一般式1中のnが異なる、被膜形成用組成物。
    The following general formula 1:
    Figure JPOXMLDOC01-appb-C000001
    (In General Formula 1, R 1 , R 2 and R 3 each independently represents an alkyl group, and n represents 0 or an integer of 1 or more.)
    A composition for forming a film, comprising two or more types of alkoxysilane compounds represented by formula (1), wherein the two or more types of alkoxysilane compounds differ in n in the general formula 1.
  2. nの差が2以上である一般式1で表されるアルコキシシラン化合物を含む、請求項1に記載の被膜形成用組成物。 The composition for film formation of Claim 1 containing the alkoxysilane compound represented by General formula 1 whose difference of n is 2 or more.
  3. 前記二種以上のアルコキシシラン化合物の中で、nが最大のアルコキシシラン化合物の含有率が、前記二種以上のアルコキシシラン化合物の合計含有量に対して、5.0~95.0質量%の範囲である、請求項1または2に記載の被膜形成用組成物。 Among the two or more types of alkoxysilane compounds, the content of the alkoxysilane compound having the largest n is 5.0 to 95.0% by mass with respect to the total content of the two or more types of alkoxysilane compounds. The composition for film formation according to claim 1 or 2, which is a range.
  4. 一般式1中のnが異なるアルコキシシラン化合物を二種含む、請求項1~3のいずれか1項に記載の被膜形成用組成物。 The film-forming composition according to any one of claims 1 to 3, comprising two alkoxysilane compounds having different n in the general formula 1.
  5. 一般式1中、R、RおよびRは、それぞれ独立に炭素数1~3のアルキル基を表す、請求項1~4のいずれか1項に記載の被膜形成用組成物。 The film-forming composition according to any one of claims 1 to 4, wherein in the general formula 1, R 1 , R 2 and R 3 each independently represents an alkyl group having 1 to 3 carbon atoms.
  6. 請求項1~5のいずれか1項に記載の被膜形成用組成物から形成された被膜を最表層に有する物品。 An article having, as an outermost layer, a film formed from the film-forming composition according to any one of claims 1 to 5.
  7. 請求項1~5のいずれか1項に記載の被膜形成用組成物を用いる被膜形成工程を含む、被膜を最表層に有する物品の製造方法。 A method for producing an article having a coating on the outermost layer, comprising a coating forming step using the coating forming composition according to any one of claims 1 to 5.
  8. 前記被膜形成工程は、乾式被膜形成法により行われる、請求項7に記載の製造方法。 The manufacturing method according to claim 7, wherein the film forming step is performed by a dry film forming method.
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JP2006045358A (en) * 2004-08-04 2006-02-16 Tokyo Ohka Kogyo Co Ltd Composition for forming high permittivity film, method for forming the same, high permittivity film and electronic part equipped with high permittivity film
JP2006257337A (en) * 2005-03-18 2006-09-28 Kanagawa Acad Of Sci & Technol Method for controlling fall acceleration of droplet on water-repellant solid surface and structure having water-repellant solid surface controlled by the method
JP2008018679A (en) * 2006-07-14 2008-01-31 Dainippon Printing Co Ltd Release film
WO2008099932A1 (en) * 2007-02-16 2008-08-21 Kaneka Corporation Transparent electroconductive film and process for producing the same
WO2017010517A1 (en) * 2015-07-16 2017-01-19 リンテック株式会社 Antifouling composition, antifouling sheet, and process for producing antifouling sheet

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006045358A (en) * 2004-08-04 2006-02-16 Tokyo Ohka Kogyo Co Ltd Composition for forming high permittivity film, method for forming the same, high permittivity film and electronic part equipped with high permittivity film
JP2006257337A (en) * 2005-03-18 2006-09-28 Kanagawa Acad Of Sci & Technol Method for controlling fall acceleration of droplet on water-repellant solid surface and structure having water-repellant solid surface controlled by the method
JP2008018679A (en) * 2006-07-14 2008-01-31 Dainippon Printing Co Ltd Release film
WO2008099932A1 (en) * 2007-02-16 2008-08-21 Kaneka Corporation Transparent electroconductive film and process for producing the same
WO2017010517A1 (en) * 2015-07-16 2017-01-19 リンテック株式会社 Antifouling composition, antifouling sheet, and process for producing antifouling sheet

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