WO2018008310A1 - Plasma discharge apparatus and air-cleaning machine - Google Patents

Plasma discharge apparatus and air-cleaning machine Download PDF

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Publication number
WO2018008310A1
WO2018008310A1 PCT/JP2017/020671 JP2017020671W WO2018008310A1 WO 2018008310 A1 WO2018008310 A1 WO 2018008310A1 JP 2017020671 W JP2017020671 W JP 2017020671W WO 2018008310 A1 WO2018008310 A1 WO 2018008310A1
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Prior art keywords
pulse
voltage
generation circuit
circuit
voltage pulse
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PCT/JP2017/020671
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French (fr)
Japanese (ja)
Inventor
林　雅則
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パナソニックＩｐマネジメント株式会社
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Priority to JP2018525980A priority Critical patent/JP6555562B2/en
Publication of WO2018008310A1 publication Critical patent/WO2018008310A1/en

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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L9/00—Disinfection, sterilisation or deodorisation of air
    • A61L9/16—Disinfection, sterilisation or deodorisation of air using physical phenomena
    • A61L9/22—Ionisation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/4697—Generating plasma using glow discharges

Definitions

  • the present invention relates to a plasma discharge device and an air cleaner that generate discharge in the air.
  • the conventional method has a problem that it takes several hours to decompose pollen and the like.
  • the present invention has been made to solve such a problem, and an object of the present invention is to provide a plasma discharge device and an air purifier that extinguish organic substances in the air in a very short time.
  • an aspect of the plasma discharge apparatus includes a discharge unit having an electrode pair insulated from each other by air, and a pulse generation circuit that generates a voltage pulse to be applied to the electrode pair.
  • the voltage pulse includes a high voltage pulse for starting discharge between the electrode pair, and a low voltage pulse applied to the electrode pair following the high voltage pulse and having a voltage value lower than the high voltage pulse
  • the pulse generation circuit includes a limiting circuit that limits an output current and an output voltage that are output when the low voltage pulse is applied to the electrode pair.
  • an aspect of the plasma discharge apparatus includes a discharge unit having a plurality of electrode pairs and a pulse generator that generates voltage pulses sequentially applied to each of the plurality of electrode pairs.
  • the voltage pulse includes a high voltage pulse for starting discharge between each electrode pair of the plurality of electrode pairs, and a low voltage value applied following the high voltage pulse and having a voltage value lower than that of the high voltage pulse.
  • Each of the plurality of electrode pairs is insulated from each other by air, and the pulse generation circuit outputs an output current and an output when the low voltage pulse is applied to each of the plurality of electrode pairs.
  • a limiting circuit for limiting the voltage
  • an aspect of the air cleaner according to the present invention includes the plasma discharge device and extinguishes organic substances in the air.
  • the present invention it is possible to provide a plasma discharge device and an air purifier that extinguish organic substances in the air in a very short time.
  • FIG. 1 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus according to the first embodiment.
  • FIG. 2 is a circuit diagram showing a detailed configuration of the plasma discharge apparatus according to the first embodiment.
  • FIG. 3 is a graph showing a pulse waveform of a voltage pulse generated in the pulse generation circuit according to the first embodiment.
  • FIG. 4A is a graph illustrating an example of a waveform of a voltage pulse applied between an electrode pair when no organic substance is present between the electrode pair of the plasma discharge apparatus according to Embodiment 1.
  • FIG. 4B is a graph showing an example of a waveform of a voltage pulse applied between the electrode pair when an organic substance is present between the electrode pair of the plasma discharge device according to the first exemplary embodiment.
  • FIG. 1 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus according to the first embodiment.
  • FIG. 2 is a circuit diagram showing a detailed configuration of the plasma discharge apparatus according to the first embodiment.
  • FIG. 3 is a graph showing a pulse wave
  • FIG. 5 is a graph showing the relationship between the current and voltage applied between the electrode pair and the discharge state.
  • FIG. 6 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus according to the second embodiment.
  • FIG. 7 is a circuit diagram showing a detailed configuration of the plasma discharge apparatus according to the second embodiment.
  • FIG. 8 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus according to the third embodiment.
  • FIG. 9 is a circuit diagram showing a detailed configuration of the plasma discharge apparatus according to the third embodiment.
  • FIG. 10 is a graph showing a pulse waveform of a voltage pulse generated in the pulse generation circuit according to the third embodiment.
  • FIG. 11 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus according to the fourth embodiment.
  • FIG. 12 is a circuit diagram showing a detailed configuration of the plasma discharge apparatus according to the fourth embodiment.
  • FIG. 13 is an external view of an air cleaner according to a modification.
  • FIG. 14 is an external view of an air conditioner according to
  • FIG. 1 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus 100 according to the first embodiment.
  • the plasma discharge apparatus 100 includes a discharge unit 6 and a pulse generation circuit 2.
  • the discharge part 6 has an electrode pair 60 insulated from each other by air 68.
  • the electrode pair 60 includes a first electrode 61 and a second electrode 62.
  • the first electrode 61 and the second electrode 62 are insulated by air 68.
  • the output voltage of the pulse generation circuit 2 is applied to the first electrode 61, and the second electrode 62 is grounded.
  • the pressure of the air 68 that insulates the electrode pair 60 is atmospheric pressure.
  • the pulse generation circuit 2 is a circuit that generates a voltage pulse to be applied to the electrode pair 60.
  • the voltage pulse generated by the pulse generation circuit 2 includes a high voltage pulse that starts discharge between the electrode pair 60, a low voltage pulse that is applied to the electrode pair 60 following the high voltage pulse, and has a voltage value lower than that of the high voltage pulse. including.
  • the pulse generation circuit 2 includes a limiting circuit 40 that limits an output current and an output voltage that are output when a low voltage pulse is applied to the electrode pair 60.
  • the pulse generation circuit 2 further includes a first generation circuit 10, a second generation circuit 20, and a multiplexing circuit 30.
  • the first generation circuit 10 is a circuit that generates a first pulse corresponding to the high voltage pulse.
  • the second generation circuit 20 is a circuit that generates a second pulse corresponding to the low voltage pulse and having a pulse width larger than that of the first pulse.
  • the multiplexing circuit 30 is a circuit that combines the first pulse and the second pulse and outputs the voltage pulse.
  • FIG. 2 is a circuit diagram showing a detailed configuration of the plasma discharge apparatus 100 according to the present embodiment.
  • the plasma discharge apparatus 100 includes a control circuit 50 that controls the first generation circuit 10 and the second generation circuit 20.
  • the limiting circuit 40 is a resistance element.
  • the resistance value of the resistance element that constitutes the limiting circuit 40 may be appropriately designed based on the value of the output voltage output from the second generation circuit 20 or the like. In the present embodiment, the resistance value of the resistance element is about 2 k ⁇ to 3 k ⁇ .
  • the multiplexing circuit 30 is a transformer including a first coil 31 and a second coil 32.
  • the turn ratio of each coil constituting the multiplexing circuit 30 may be set as appropriate based on the value of the output voltage output from each of the first generation circuit 10 and the second generation circuit 20. In the present embodiment, the turns ratio of the first coil 31 and the second coil 32 is 1:15.
  • the first generation circuit 10 includes a first DC power supply 15, a first capacitor 16, and a first switching element 11. In the present embodiment, the first generation circuit 10 outputs a first pulse to the first coil 31 of the multiplexing circuit 30.
  • the first DC power supply 15 is a power supply circuit that outputs a DC voltage.
  • the value of the DC voltage output from the first DC power supply 15 may be set as appropriate based on the characteristics of the multiplexing circuit 30 and the like. In the present embodiment, the first DC power supply 15 outputs a DC voltage of 1 kV.
  • the first capacitor 16 is an element for suppressing the oscillation of the output voltage of the first generation circuit 10 and is connected in parallel to the first DC power supply 15.
  • the capacity of the first capacitor 16 may be set as appropriate according to the characteristics of the first coil 31 and the like.
  • the first switching element 11 is an element for outputting only a part of the DC voltage output from the first DC power supply 15 from the first generation circuit 10.
  • the first switching element 11 is a switching transistor whose switching between conduction and non-conduction is controlled by the control circuit 50.
  • a MOSFET Metal-Oxide Semiconductor Field-Effect Transistor
  • the first switching element 11 is connected in series to the first coil 31.
  • a circuit composed of the first coil 31 and the first switching element 11 is connected in parallel to the first DC power supply 15.
  • the second generation circuit 20 includes a second DC power supply 25, a second capacitor 26, four second switching elements 21 to 24, a transformer 27, and diodes 28 and 29.
  • the second DC power supply 25 is a power supply circuit that outputs a DC voltage.
  • the value of the DC voltage output from the second DC power supply 25 may be set as appropriate based on the characteristics of the transformer 27 and the like. In the present embodiment, the second DC power supply 25 outputs a DC voltage of 100V.
  • the second capacitor 26 is an element that forms an LC resonance circuit together with the transformer 27, and is connected in series to the primary coil 271 of the transformer 27.
  • the capacity of the second capacitor 26 may be set as appropriate according to the characteristics of the transformer 27 and the like.
  • the transformer 27 is an element that includes a primary side coil 271 and a secondary side coil 272, transforms the voltage input to the primary side coil 271 with a predetermined transformation ratio, and outputs the transformed voltage to the secondary side coil 272.
  • the transformation ratio of the transformer 27 may be set as appropriate based on the voltage input to the primary coil 271 and the like. In the present embodiment, the transformation ratio (the number of turns of the primary side coil / the number of turns of the secondary side coil) is about 1/10.
  • the second switching elements 21 to 24 are elements constituting a full bridge type inverter circuit.
  • the second switching elements 21 and 22 are connected in series, and the second switching elements 23 and 24 are connected in series. Further, the second switching elements 21 and 22 and the second switching elements 23 and 24 are connected in parallel.
  • a second capacitor 26 and a transformer 27 are provided between a node to which the second switching element 21 and the second switching element 22 are connected and a node to which the second switching element 23 and the second switching element 24 are connected.
  • An LC resonant circuit is connected.
  • the second switching elements 21 to 24 are switching transistors whose switching between conduction and non-conduction is controlled by the control circuit 50.
  • MOSFETs can be used as shown in FIG.
  • the diodes 28 and 29 are rectifying elements for converting the AC voltage output from the transformer 27 into a DC voltage.
  • the cathode of a diode 29 is connected to the anode of the diode 28, and the secondary coil 272 of the transformer 27 is connected in parallel to the diode 29.
  • the output voltage of the second generation circuit 20 is output from the cathode of the diode 28 and the anode of the diode 29.
  • the output voltage of the second generation circuit 20 is applied to a series circuit including the limiting circuit 40, the multiplexing circuit 30, and the discharge unit 6.
  • the control circuit 50 is a circuit that controls the first generation circuit 10 and the second generation circuit 20.
  • the control circuit 50 controls the pulse width of the first pulse output from the first generation circuit 10 and the output timing by controlling the switching timing of conduction and non-conduction of the first switching element 11. Further, the control circuit 50 controls the switching timing of each of the second switching elements 21 to 24 to turn on and off, whereby the voltage value of the second pulse output from the second generation circuit 20, the pulse width, and Control the output timing.
  • the control circuit 50 performs control so that the second pulse is applied to the multiplexing circuit 30 following the first pulse.
  • the control circuit 50 can be realized using, for example, an IC (Integrated Circuit) chip including a processor and a memory.
  • FIG. 3 is a graph showing a pulse waveform of a voltage pulse generated in the pulse generation circuit 2 according to the present embodiment.
  • Graphs (a), (b), and (c) in FIG. 3 respectively show a first pulse P1 output from the first generation circuit 10, a second pulse P2 output from the second generation circuit 20, and a pulse.
  • generation circuit 2 is shown.
  • the voltage pulse P0 output from the pulse generation circuit 2 is composed of a high voltage pulse PH and a low voltage pulse PL.
  • the first generation circuit 10 outputs a first pulse P1 corresponding to the high voltage pulse PH of the voltage pulse P0. Further, as shown in the graph (b) of FIG. 3, the second generation circuit 20 generates a second pulse P2 corresponding to the low voltage pulse PL of the voltage pulse P0 and having a pulse width larger than that of the first pulse P1. .
  • the pulse width T1 of the first pulse P1 is about 500 nsec
  • the pulse width T2 of the second pulse P2 is about 10 ⁇ sec.
  • the first pulse P1 is boosted in the multiplexing circuit 30 from a voltage value of about 1 kV to about 15 kV and combined with the second pulse P2.
  • the voltage pulse P 0 is generated and applied to the electrode pair 60 of the discharge unit 6.
  • the pulse width T0 and the repetition period TA of the voltage pulse P0 are not particularly limited, but are, for example, about 10 ⁇ sec and about 100 ⁇ sec, respectively. In this case, the repetition frequency of the voltage pulse P0 is about 10 kHz.
  • FIG. 4A is a graph showing an example of a waveform of a voltage pulse P0 applied between the electrode pair 60 when there is no organic substance between the electrode pair 60 of the plasma discharge apparatus 100 according to the present embodiment.
  • FIG. 4B is a graph showing an example of a waveform of a voltage pulse P0 applied between the electrode pair 60 when an organic substance is present between the electrode pair 60 of the plasma discharge apparatus 100 according to the present embodiment. Note that the graphs shown in FIGS. 4A and 4B are both graphs obtained by experiments.
  • FIG. 5 is a graph showing the relationship between the current and voltage applied between the electrode pair 60 and the discharge state.
  • a voltage pulse P0 composed of a high voltage pulse PH and a low voltage pulse PL is applied between the electrode pair 60 as shown in FIG. 4A.
  • the voltage value of the high voltage pulse PH is a voltage value equal to or higher than the dielectric breakdown voltage. In the present embodiment, the voltage value of the high voltage pulse PH exceeds 1 kV. Thereby, discharge is started between the electrode pair 60. Further, the low voltage pulse PL is applied between the electrode pair 60 following the high voltage pulse PH. Thereby, when there is no organic substance between the electrode pair 60, the discharge started by the high voltage pulse PH can be maintained relatively stably.
  • the voltage value of the low voltage pulse PL is about 500 V, and a current of about 60 mA flows between the electrode pair 60.
  • the voltage applied between the electrode pair 60 is determined by the resistance value between the electrode pair 60 and the resistance value of the resistance element constituting the limiting circuit 40.
  • the resistance value of the resistance element constituting the limiting circuit 40 is set so that the voltage applied between the electrode pair 60 is about 500V.
  • the current flowing between the electrode pair 60 is limited by the upper limit value of the output power of the second DC power supply 25 and the resistance value of the resistance element constituting the limiting circuit 40.
  • the upper limit value of the output power of the second DC power supply 25 is set to about 30W.
  • the state of discharge during the period in which the low voltage pulse PL is applied between the electrode pair 60 corresponds to the state A shown in FIG. That is, during this period, glow discharge is generated between the electrode pair 60 by applying the low voltage pulse PL.
  • the state of discharge generated between the electrode pair 60 is limited to a specific state by the limiting circuit 40.
  • the limiting circuit 40 is a resistance element
  • the relationship between the voltage value applied between the electrode pair 60 and the current value flowing between the electrode pair 60 is the relationship indicated by the one-dot chain line shown in FIG. Limited to
  • the relationship between the voltage and current between the electrode pair 60 during discharge is shown by the solid line in FIG.
  • the state of discharge between the electrode pair 60 is limited to one of the state A and the state B corresponding to the intersection of the one-dot chain line and the solid line in FIG.
  • the voltage applied between the electrode pair 60 is set to about 500 V, so that the discharge state is the state A shown in FIG. 5, that is, glow discharge. be able to. Therefore, low temperature plasma is generated between the electrode pair 60, temperature rise in the discharge part 6 is relatively suppressed, and damage to the electrode pair 60 is also suppressed.
  • a voltage pulse P01 composed of a high voltage pulse PH1 and a low voltage pulse PL1 is applied between the electrode pair 60 as shown in FIG. 4B.
  • the voltage value of the high voltage pulse PH1 is a voltage value equal to or higher than the breakdown voltage shown in FIG. 5 as in the case where no organic substance such as pollen is present between the electrode pair 60. Thereby, discharge is started between the electrode pair 60. Further, the low voltage pulse PL1 is applied between the electrode pair 60 following the high voltage pulse PH1. Thereby, the discharge started by the high voltage pulse PH1 can be maintained.
  • the resistance value between the electrode pair 60 is reduced by the organic substance. For this reason, the voltage applied between the electrode pair 60 decreases, and the current flowing between the electrode pair 60 increases.
  • the voltage value of the low voltage pulse PL ⁇ b> 1 decreases to about 200 V, and a current of about 150 mA flows between the electrode pair 60.
  • the state of discharge during the period in which the low voltage pulse PL1 is applied between the electrode pair 60 corresponds to the state B shown in FIG. That is, arc discharge is generated between the electrode pair 60 during the period in which the low voltage pulse PL ⁇ b> 1 is applied between the electrode pair 60.
  • the organic matter existing between the electrode pair 60 is burned and extinguished by the thermal plasma generated by the arc discharge in an extremely short time of about 1 second or less, for example. That is, organic matter becomes carbon dioxide and water by being burned.
  • the state of the organic substance changes between the electrode pair 60 when the low voltage pulse PL1 is applied.
  • the voltage applied between the pair 60 is not stable.
  • the discharge state between the electrode pair 60 varies between the state A and the state B shown in FIG.
  • the discharge state between the electrode pair 60 becomes the state A shown in FIG. 5, that is, glow discharge, and the voltage pulse P0 as shown in FIG. To be applied.
  • organic substances such as pollen in the air 68 can be extinguished in a very short time.
  • the air 68 may be atmospheric pressure, air in the atmosphere can be directly introduced between the electrode pairs without adjusting the pressure. For this reason, organic substances, such as pollen in the air, can be easily extinguished.
  • the plasma discharge apparatus 100 includes the discharge unit 6 having the electrode pair 60 insulated from each other by the air 68, and the pulse generation circuit 2 that generates the voltage pulse P0 applied to the electrode pair 60.
  • the voltage pulse P0 is applied to the electrode pair 60 following the high voltage pulse PH, and the voltage pulse P0 has a voltage value lower than that of the high voltage pulse PH.
  • the pulse generation circuit 2 includes a limiting circuit 40 that limits an output current and an output voltage that are output when the low voltage pulse PL is applied to the electrode pair 60.
  • the discharge can be maintained by the low voltage pulse subsequently applied to the electrode pair 60.
  • glow discharge can be maintained between the electrode pair 60 by setting the voltage value of the low voltage pulse to a predetermined value.
  • the organic substance such as pollen in the air 68 enters the low temperature plasma generated by the glow discharge, thereby reducing the resistance between the electrode pair.
  • the current flowing between the electrode pair 60 increases, and the voltage between the electrode pair 60 decreases.
  • the discharge between the electrode pair 60 can be changed from the glow discharge to the arc discharge having a larger current amount.
  • organic substances such as pollen burn and disappear in a very short time.
  • organic substances such as pollen in the air can be burned and extinguished in a very short time.
  • the plasma discharge apparatus 100 includes the limiting circuit 40 that limits the output current and the output voltage that are output when a low voltage pulse is applied between the electrode pair 60, so Generation of a large current can be suppressed. Therefore, for example, even when an arc discharge occurs due to the organic matter entering between the electrode pair 60, after the organic matter disappears, the discharge between the electrode pair 60 can be changed from the arc discharge to, for example, a glow discharge. it can. For this reason, it can suppress that the electrode pair 60 is damaged by arc discharge, and can suppress the power consumption of the plasma discharge apparatus 100.
  • the pulse generation circuit 2 corresponds to the first generation circuit 10 that generates the first pulse P1 corresponding to the high voltage pulse PH, the low voltage pulse PL, A second generation circuit 20 that generates a second pulse P2 having a pulse width larger than one pulse P1, and a multiplexing circuit 30 that combines the first pulse P1 and the second pulse P2 and outputs a voltage pulse P0. You may prepare.
  • the pulse generation circuit 2 can be realized with a simplified configuration.
  • the pressure of the air 68 may be atmospheric pressure.
  • glow discharge may be generated between the electrode pair 60 by applying the low voltage pulse PL.
  • the temperature rise between the electrode pair 60 can be suppressed during discharge.
  • organic substances such as pollen
  • the organic substances can be burned and extinguished in an extremely short time by transitioning to arc discharge.
  • the arc discharge continues for a very short time, it is possible to suppress a temperature rise between the electrode pair 60 when an organic substance enters the discharge plasma.
  • the limiting circuit 40 may be a resistance element.
  • the limiting circuit 40 can be realized easily and inexpensively.
  • Embodiment 2 A plasma discharge apparatus according to Embodiment 2 will be described.
  • the plasma discharge apparatus according to the present embodiment is different from the plasma discharge apparatus 100 according to the first embodiment mainly in the configuration of the limiting circuit.
  • the plasma discharge apparatus according to the present embodiment will be described focusing on differences from the plasma discharge apparatus 100 according to the first embodiment.
  • FIG. 6 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus 200 according to the present embodiment.
  • FIG. 7 is a circuit diagram showing a detailed configuration of plasma discharge apparatus 200 according to the present embodiment.
  • the plasma discharge apparatus 200 includes a discharge unit 6 and a pulse generation circuit 202.
  • the pulse generation circuit 202 includes a first generation circuit 10, a second generation circuit 20, a multiplexing circuit 30, and a limiting circuit 240.
  • the limiting circuit 240 is a circuit that controls the output voltage in accordance with the output current of the pulse generation circuit 202.
  • the current detection circuit 241 and the control circuit 250 shown in FIG. Prepare.
  • the current detection circuit 241 is a circuit that outputs a signal corresponding to the output current of the pulse generation circuit 202.
  • a Hall element can be used as the current detection circuit 241.
  • the control circuit 250 is a circuit that controls the first generation circuit 10 and the second generation circuit 20 similarly to the control circuit 50 according to the first embodiment. However, the control circuit 250 according to the present embodiment controls the output voltage of the second generation circuit 20 based on the signal from the current detection circuit 241.
  • the control circuit 250 controls the output voltage of the second generation circuit 20 by controlling the ratio (duty) of the conduction period of the second switching elements 21 to 24 of the second generation circuit 20, for example. More specifically, for example, the control circuit 250 controls the output voltage of the second generation circuit 20 so that the discharge state between the electrode pair 60 is one of the state A and the state B shown in FIG. Also good.
  • the control circuit 250 sets the output voltage value of the second generation circuit 20 to the state.
  • the second generation circuit 20 is controlled so as to be about the voltage value at A.
  • the control circuit 250 sets the output voltage value of the second generation circuit 20 to the voltage in the state B.
  • the second generation circuit 20 is controlled so as to be about the value.
  • limiting circuit 240 controls the output voltage according to the output current of pulse generation circuit 202.
  • the discharge state between the electrode pair 60 can be set to a desired state.
  • an organic substance enters the discharge plasma and the output current increases, it is possible to suppress an excessive current from continuously flowing between the electrode pair 60 by reducing the output voltage. Therefore, the electrode pair 60 can be prevented from being damaged, and the power consumption of the plasma discharge device 200 can be suppressed.
  • power consumption can be further reduced as compared with plasma discharge apparatus 100 according to the first embodiment.
  • Embodiment 3 A plasma discharge apparatus according to Embodiment 3 will be described.
  • the plasma discharge apparatus according to the present embodiment is different from plasma discharge apparatus 100 according to the first embodiment in that the discharge unit mainly includes a plurality of electrode pairs.
  • the plasma discharge apparatus according to the present embodiment will be described focusing on differences from the plasma discharge apparatus 100 according to the first embodiment.
  • FIG. 8 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus 300 according to the third embodiment.
  • the plasma discharge apparatus 300 includes a discharge unit 306 and a pulse generation circuit 302.
  • the discharge unit 306 has a plurality of electrode pairs 60a to 60d.
  • the discharge unit 306 has four electrode pairs 60a to 60d.
  • the electrode pairs 60a to 60d are composed of first electrodes 61a to 61d and second electrodes 62a to 62d, respectively.
  • Each of the electrode pairs 60 a to 60 d is insulated from each other by air 68. That is, the first electrodes 61a to 61d and the second electrodes 62a to 62d are insulated by the air 68, respectively.
  • the output voltage of the pulse generation circuit 302 is applied to the first electrodes 61a to 61d, and the second electrodes 62a to 62d are grounded.
  • the pressure of the air 68 that insulates each of the electrode pairs 60a to 60d is atmospheric pressure.
  • the pulse generation circuit 302 is a circuit that generates voltage pulses to be applied to the electrode pairs 60a to 60d.
  • the voltage pulse generated by the pulse generation circuit 302 is applied to the electrode pair 60a to 60d following the high voltage pulse for starting discharge between the electrode pairs 60a to 60d, and the high voltage pulse. And a low voltage pulse having a lower voltage value.
  • the pulse generation circuit 302 includes a limiting circuit 40 that limits an output current and an output voltage that are output when a low voltage pulse is applied to the electrode pairs 60a to 60d.
  • the pulse generation circuit 302 includes a voltage generation circuit 304 and a switching circuit 308.
  • the voltage generation circuit 304 includes the limiting circuit 40, the first generation circuit 10, the second generation circuit 20, and the multiplexing circuit 30 described above.
  • the first generation circuit 10 is a circuit that generates a pulsed first voltage corresponding to the high voltage pulse.
  • the second generation circuit 20 is a circuit that generates a second voltage that is a DC voltage corresponding to the low voltage pulse.
  • the multiplexing circuit 30 is a circuit that combines the first voltage and the second voltage and outputs a voltage wave.
  • the switching circuit 308 is a circuit that supplies the voltage pulse to each of the electrode pairs 60a to 60d by sequentially inputting the voltage wave from the multiplexing circuit 30 and outputting the voltage wave to the electrode pairs 60a to 60d.
  • the switching circuit 308 includes four switching elements 81a to 81d.
  • the voltage wave input to the switching circuit 308 is input to the switching elements 81a to 81d.
  • the switching elements 81a to 81d are connected to the electrode pairs 60a to 60d, respectively.
  • a voltage pulse is applied to the electrode pair connected to the switching elements 81a to 81d that are in the conductive state.
  • switching elements 81a to 81d for example, MOSFETs (Metal-Oxide Semiconductor Field-Effect Transistors) can be used.
  • the switching elements 81a to 81d are controlled by signals from a drive circuit (not shown).
  • the drive circuit can be realized by using, for example, an IC (Integrated Circuit) chip including a processor and a memory.
  • FIG. 9 is a circuit diagram showing a detailed configuration of plasma discharge apparatus 300 according to the present embodiment.
  • the plasma discharge apparatus 300 includes a control circuit 350 that controls the first generation circuit 10 and the second generation circuit 20.
  • the limiting circuit 40 is a resistance element.
  • the resistance value of the resistance element that constitutes the limiting circuit 40 may be appropriately designed based on the value of the output voltage output from the second generation circuit 20 or the like. In the present embodiment, the resistance value of the resistance element is about 2 k ⁇ to 3 k ⁇ .
  • the multiplexing circuit 30 is a transformer including a first coil 31 and a second coil 32.
  • the turn ratio of each coil constituting the multiplexing circuit 30 may be set as appropriate based on the value of the output voltage output from each of the first generation circuit 10 and the second generation circuit 20. In the present embodiment, the turns ratio of the first coil 31 and the second coil 32 is 1:15.
  • the first generation circuit 10 and the second generation circuit 20 have the same configuration as the first generation circuit 10 and the second generation circuit 20 according to the first embodiment, respectively.
  • the output voltage of the second generation circuit 20 is applied to a series circuit including the limiting circuit 40, the multiplexing circuit 30, the switching circuit 308, and the discharging unit 306.
  • the control circuit 350 is a circuit that controls the first generation circuit 10 and the second generation circuit 20.
  • the control circuit 350 controls the pulse width of the first voltage output from the first generation circuit 10 and the output timing by controlling the switching timing of conduction and non-conduction of the first switching element 11.
  • the control circuit 350 controls the voltage value of the second voltage output from the second generation circuit 20 by controlling the switching timing of the conduction and non-conduction of each of the second switching elements 21 to 24.
  • the control circuit 350 controls the second switching elements 21 to 24 so that a DC voltage is output from the second generation circuit 20.
  • the control circuit 350 can be realized using, for example, an IC chip including a processor and a memory.
  • FIG. 10 is a graph showing a pulse waveform of a voltage pulse generated in the pulse generation circuit 302 according to the present embodiment.
  • Graphs (a) and (b) in FIG. 10 show waveforms of the first voltage V1 output from the first generation circuit 10 and the second voltage V2 output from the second generation circuit 20, respectively.
  • graphs (c1) to (c4) in FIG. 10 are graphs showing the relationship of the conduction state with respect to the time of the switching elements 81a to 81d, respectively.
  • Graphs (d1) to (d4) in FIG. 10 are graphs showing waveforms of the voltage pulse P0 applied to the electrode pairs 60a to 60d, respectively.
  • the voltage pulse P0 output from the pulse generation circuit 302 includes a high voltage pulse PH and a low voltage pulse PL.
  • the first generation circuit 10 outputs the first voltage V1 corresponding to the high voltage pulse PH of the voltage pulse P0.
  • the pulse width T1 of the first voltage V1 is about 500 nsec.
  • the second generation circuit 20 generates a second voltage V2 that is a DC voltage corresponding to the low voltage pulse PL of the voltage pulse P0.
  • the first voltage V1 is boosted in the multiplexing circuit 30 from a voltage value of about 1 kV to about 15 kV and is combined with the second voltage V2. As a result, a voltage wave is generated in the multiplexing circuit 30. In this way, the voltage generation circuit 304 generates a voltage wave and inputs it to the switching circuit 308.
  • the switching elements 81a to 81d are sequentially turned on.
  • the voltage pulse P0 as shown in the graphs (d1) to (d4) of FIG. 10 is applied to the electrode pairs 60a to 60d connected to the switching elements 81a to 81d, respectively.
  • the pulse width T0 of the voltage pulse P0 (that is, the conduction duration of each switching element) is not particularly limited, but is, for example, about 10 ⁇ sec. In this case, the repetition frequency of the voltage pulse P0 in each electrode pair is about 25 kHz.
  • the voltage pulse P0 can be generated in the pulse generation circuit 302 according to the present embodiment.
  • the second voltage V2 that is a DC voltage is used as the voltage corresponding to the low voltage pulse PL, and the second voltage V2 is pulsed in the switching circuit 308. For this reason, since it is not necessary to generate a pulse voltage in the second generation circuit 20, the configuration of the second generation circuit 20 can be simplified.
  • plasma discharge apparatus 300 also operates in the same manner as plasma discharge apparatus 100 according to Embodiment 1.
  • the organic matter existing between each pair of electrodes is burned and extinguished by an extremely short time of, for example, about 0.4 seconds or less by thermal plasma generated by arc discharge.
  • organic substances such as pollen in the air 68 can be extinguished in a very short time.
  • the air 68 may be atmospheric pressure, air in the atmosphere can be directly introduced between the electrode pairs without adjusting the pressure. For this reason, organic substances, such as pollen in the air, can be easily extinguished.
  • plasma discharge apparatus 300 generates discharge unit 306 having a plurality of electrode pairs 60a to 60d and voltage pulse P0 to be sequentially applied to each of the plurality of electrode pairs 60a to 60d.
  • a voltage generation circuit 302, and the voltage pulse P0 is applied subsequent to the high voltage pulse PH for starting discharge between each of the electrode pairs 60a to 60d and the high voltage pulse PH.
  • Each of the plurality of electrode pairs 60a to 60d is insulated from each other by air 68, and the pulse generation circuit 302 transmits the low voltage pulse PL to the plurality of electrode pairs 60a to 60d. It has a limiting circuit 40 that limits the output current and the output voltage that are output when applied to each.
  • the insulation by the air 68 between each electrode pair is broken by the high voltage pulse, and then the discharge can be maintained by the low voltage pulse applied to the electrode pairs 60a to 60d.
  • glow discharge can be maintained between each electrode pair by setting the voltage value of the low voltage pulse to a predetermined value.
  • the organic substance such as pollen in the air 68 enters the low temperature plasma generated by the glow discharge, thereby reducing the resistance between the electrode pair.
  • the current flowing between the electrode pairs increases, and the voltage between the electrode pairs decreases.
  • the discharge between each electrode pair can be transitioned from glow discharge to arc discharge with a larger amount of current.
  • organic substances such as pollen burn and disappear in a very short time.
  • organic substances such as pollen in the air can be burned and extinguished in a very short time.
  • the plasma discharge apparatus 300 since the plasma discharge apparatus 300 according to the present embodiment includes the limiting circuit 40 that limits the output current and the output voltage that are output when a low voltage pulse is applied between each electrode pair, the plasma discharge apparatus 300 is excessively large between each electrode pair. Generation of a large current can be suppressed. Therefore, for example, even when an arc discharge occurs due to an organic substance entering between each electrode pair, after the organic substance disappears, the discharge between each electrode pair can be changed from an arc discharge to, for example, a glow discharge. it can. Therefore, it is possible to suppress the electrode pairs 60a to 60d from being damaged by the arc discharge, and to suppress the power consumption of the plasma discharge device 300.
  • the plasma discharge apparatus 300 since the plasma discharge apparatus 300 according to the present embodiment includes a plurality of electrode pairs 60a to 60d, organic substances in a larger volume of air 68 can be extinguished in a short time.
  • the pulse generation circuit 302 corresponds to the first generation circuit 10 that generates the pulsed first voltage V1 corresponding to the high voltage pulse PH and the low voltage pulse PL.
  • a second generation circuit 20 that generates a second voltage V2 that is a direct-current voltage
  • a combination circuit 30 that combines the first voltage V1 and the second voltage V2 and outputs a voltage wave, and the voltage wave is input
  • a switching circuit 308 that supplies voltage pulses P0 to each of the electrode pairs 60a to 60d by sequentially outputting voltage waves to the electrode pairs 60a to 60d may be provided.
  • the pulse generation circuit 302 can be realized with a simplified configuration.
  • the pressure of the air 68 may be atmospheric pressure.
  • glow discharge may be generated by applying the low voltage pulse PL in the electrode pairs 60a to 60d.
  • the limiting circuit 40 may be a resistance element.
  • the limiting circuit 40 can be realized easily and inexpensively.
  • Embodiment 4 A plasma discharge apparatus according to Embodiment 4 will be described.
  • the plasma discharge apparatus according to the present embodiment is different from the plasma discharge apparatus 300 according to the third embodiment mainly in the configuration of the limiting circuit.
  • the plasma discharge apparatus according to the present embodiment will be described focusing on differences from the plasma discharge apparatus 300 according to the third embodiment.
  • FIG. 11 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus 400 according to the present embodiment.
  • FIG. 12 is a circuit diagram showing a detailed configuration of plasma discharge apparatus 400 according to the present embodiment.
  • the plasma discharge apparatus 400 includes a discharge unit 6 and a pulse generation circuit 402.
  • the pulse generation circuit 402 includes a voltage generation circuit 404 and a switching circuit 8.
  • the voltage generation circuit 404 includes a first generation circuit 10, a second generation circuit 20, a multiplexing circuit 30, and a limiting circuit 240.
  • the limiting circuit 240 is a circuit that controls the output voltage in accordance with the output current of the pulse generation circuit 402.
  • the current detection circuit 241 is a circuit that outputs a signal corresponding to the output current of the pulse generation circuit 402.
  • a Hall element can be used as the current detection circuit 241.
  • the control circuit 450 is a circuit that controls the first generation circuit 10 and the second generation circuit 20 similarly to the control circuit 350 according to the third embodiment. However, the control circuit 450 according to the present embodiment controls the output voltage of the second generation circuit 20 based on the signal from the current detection circuit 241. For example, the control circuit 450 controls the output voltage of the second generation circuit 20 by controlling the ratio (duty) of the conduction period of the second switching elements 21 to 24 of the second generation circuit 20. More specifically, for example, the control circuit 450 controls the output voltage of the second generation circuit 20 so that the discharge state between each electrode pair is one of the state A and the state B shown in FIG. Also good.
  • the control circuit 450 determines that the output voltage value of the second generation circuit 20 is in the state.
  • the second generation circuit 20 is controlled so as to be about the voltage value at A.
  • the control circuit 450 determines that the output voltage value of the second generation circuit 20 is the voltage in the state B.
  • the second generation circuit 20 is controlled so as to be about the value.
  • limiting circuit 240 controls the output voltage according to the output current of pulse generation circuit 402.
  • the discharge state between each electrode pair can be set to a desired state.
  • an organic substance enters into the discharge plasma and the output current increases, it is possible to suppress an excessive current from continuously flowing between each electrode pair by reducing the output voltage. Therefore, damage to the electrode pairs 60a to 60d can be suppressed, and power consumption of the plasma discharge device 400 can be suppressed. Further, in the present embodiment, since it is not necessary to use a resistance element in limiting circuit 240, power consumption can be further reduced as compared with plasma discharge apparatus 300 according to Embodiment 3.
  • FIG. 13 is an external view of an air cleaner according to this modification.
  • the air cleaner shown in FIG. 13 includes, for example, the plasma discharge device according to each of the above embodiments inside, and extinguishes organic substances in the air 68.
  • the maintenance work of the filter can be reduced.
  • FIG. 14 is an external view of an air conditioner according to this modification.
  • the air conditioner shown in FIG. 14 includes, for example, the plasma discharge device according to each of the above embodiments inside, and extinguishes organic substances in the air 68.
  • the output voltage of the second generation circuit 20 may be controlled by controlling the output voltage of the second DC power supply 25 of the second generation circuit 20.
  • a second generation circuit configured only with a DC power supply may be used. Thereby, the configuration of the plasma discharge apparatus can be further simplified.
  • control circuit may be configured by dedicated hardware, or may be realized by executing a software program suitable for the control circuit.
  • the control circuit may be realized by a program execution unit such as a CPU or a processor reading and executing a software program recorded on a recording medium such as a hard disk or a memory.
  • Pulse generation circuit 6 306 Discharge unit 10 First generation circuit 20 Second generation circuit 30 Multiplexing circuit 40, 240 Limiting circuit 60, 60a, 60b, 60c, 60d Electrode pair 68 Air 100, 200 , 300, 400 Plasma discharge device 308 Switching circuit P0, P01 Voltage pulse PH, PH1 High voltage pulse PL, PL1 Low voltage pulse P1 First pulse P2 Second pulse V1 First voltage V2 Second voltage

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Abstract

A plasma discharge apparatus (100) is provided with: a discharge unit (6) that has a pair of electrodes (60) insulated from each other by air (68); and a pulse generation circuit (2) that generates voltage pulses (P0) applied to the electrode pair (60), wherein the voltage pulses (P0) include: a high-voltage pulse (PH) that starts discharging between the electrodes; and a low-voltage pulse (PL) that is lower in voltage value than the high-voltage pulse (PH) and is applied to the electrode pair (60) following the high-voltage pulse (PH), and the pulse generation circuit (2) has a limiting circuit (40) that limits an output current and an output voltage to be outputted when the low-voltage pulse (PL) is applied to the electrode pair (60).

Description

プラズマ放電装置及び空気清浄機Plasma discharge device and air purifier
　本発明は、空気中において放電を発生させるプラズマ放電装置及び空気清浄機に関する。 The present invention relates to a plasma discharge device and an air cleaner that generate discharge in the air.
　従来、空気中に浮遊する花粉などの有機物を除去する方法として、暗放電であるコロナ（ストリーマ）放電を利用する方法が知られている（例えば、特許文献１参照）。これは、花粉などをコロナ放電によって低温酸化させて分解する方法である。 Conventionally, a method using corona (streamer) discharge, which is dark discharge, is known as a method for removing organic substances such as pollen floating in the air (see, for example, Patent Document 1). This is a method in which pollen and the like are decomposed by low-temperature oxidation by corona discharge.
特開２００５－３００１１１号公報JP 2005-300111 A
　しかしながら、従来の方法では、花粉などを分解するまで数時間を要するという問題がある。 However, the conventional method has a problem that it takes several hours to decompose pollen and the like.
　本発明は、このような問題を解決するためになされたものであり、極めて短時間で空気中の有機物を消滅させるプラズマ放電装置及び空気清浄機を提供することを目的とする。 The present invention has been made to solve such a problem, and an object of the present invention is to provide a plasma discharge device and an air purifier that extinguish organic substances in the air in a very short time.
　上記課題を解決するために、本発明に係るプラズマ放電装置の一態様は、空気で互いに絶縁された電極対を有する放電部と、前記電極対に印加する電圧パルスを生成するパルス生成回路とを備え、前記電圧パルスは、前記電極対間において放電を開始させる高電圧パルスと、前記高電圧パルスに続いて前記電極対に印加され前記高電圧パルスより電圧値が低い低電圧パルスとを含み、前記パルス生成回路は、前記低電圧パルスを前記電極対に印加する際に出力する出力電流及び出力電圧を制限する制限回路を有する。 In order to solve the above problems, an aspect of the plasma discharge apparatus according to the present invention includes a discharge unit having an electrode pair insulated from each other by air, and a pulse generation circuit that generates a voltage pulse to be applied to the electrode pair. The voltage pulse includes a high voltage pulse for starting discharge between the electrode pair, and a low voltage pulse applied to the electrode pair following the high voltage pulse and having a voltage value lower than the high voltage pulse, The pulse generation circuit includes a limiting circuit that limits an output current and an output voltage that are output when the low voltage pulse is applied to the electrode pair.
　また、上記課題を解決するために、本発明に係るプラズマ放電装置の一態様は、複数の電極対を有する放電部と、前記複数の電極対の各々に順次印加する電圧パルスを生成するパルス生成回路とを備え、前記電圧パルスは、前記複数の電極対の各々の電極対間において放電を開始させる高電圧パルスと、前記高電圧パルスに続いて印加され前記高電圧パルスより電圧値が低い低電圧パルスとを含み、前記複数の電極対の各々は、空気で互いに絶縁され、前記パルス生成回路は、前記低電圧パルスを前記複数の電極対の各々に印加する際に出力する出力電流及び出力電圧を制限する制限回路を有する。 In order to solve the above-described problem, an aspect of the plasma discharge apparatus according to the present invention includes a discharge unit having a plurality of electrode pairs and a pulse generator that generates voltage pulses sequentially applied to each of the plurality of electrode pairs. The voltage pulse includes a high voltage pulse for starting discharge between each electrode pair of the plurality of electrode pairs, and a low voltage value applied following the high voltage pulse and having a voltage value lower than that of the high voltage pulse. Each of the plurality of electrode pairs is insulated from each other by air, and the pulse generation circuit outputs an output current and an output when the low voltage pulse is applied to each of the plurality of electrode pairs. A limiting circuit for limiting the voltage;
　また、上記課題を解決するために、本発明に係る空気清浄機の一態様は、上記プラズマ放電装置を備え、上記空気中の有機物を消滅させる。 In order to solve the above-mentioned problem, an aspect of the air cleaner according to the present invention includes the plasma discharge device and extinguishes organic substances in the air.
　本発明によれば、極めて短時間で空気中の有機物を消滅させるプラズマ放電装置及び空気清浄機を提供できる。 According to the present invention, it is possible to provide a plasma discharge device and an air purifier that extinguish organic substances in the air in a very short time.
図１は、実施の形態１に係るプラズマ放電装置の全体構成の概要を示すブロック図である。FIG. 1 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus according to the first embodiment. 図２は、実施の形態１に係るプラズマ放電装置の詳細構成を示す回路図である。FIG. 2 is a circuit diagram showing a detailed configuration of the plasma discharge apparatus according to the first embodiment. 図３は、実施の形態１に係るパルス生成回路において生成される電圧パルスのパルス波形を示すグラフである。FIG. 3 is a graph showing a pulse waveform of a voltage pulse generated in the pulse generation circuit according to the first embodiment. 図４Ａは、実施の形態１に係るプラズマ放電装置の電極対間に有機物が存在しない場合に、電極対間に印加される電圧パルスの波形の一例を示すグラフである。FIG. 4A is a graph illustrating an example of a waveform of a voltage pulse applied between an electrode pair when no organic substance is present between the electrode pair of the plasma discharge apparatus according to Embodiment 1. 図４Ｂは、実施の形態１に係るプラズマ放電装置の電極対間に有機物が存在する場合に、電極対間に印加される電圧パルスの波形の一例を示すグラフである。FIG. 4B is a graph showing an example of a waveform of a voltage pulse applied between the electrode pair when an organic substance is present between the electrode pair of the plasma discharge device according to the first exemplary embodiment. 図５は、電極対間に印加される電流及び電圧と、放電状態との関係を示すグラフである。FIG. 5 is a graph showing the relationship between the current and voltage applied between the electrode pair and the discharge state. 図６は、実施の形態２に係るプラズマ放電装置の全体構成の概要を示すブロック図である。FIG. 6 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus according to the second embodiment. 図７は、実施の形態２に係るプラズマ放電装置の詳細構成を示す回路図である。FIG. 7 is a circuit diagram showing a detailed configuration of the plasma discharge apparatus according to the second embodiment. 図８は、実施の形態３に係るプラズマ放電装置の全体構成の概要を示すブロック図である。FIG. 8 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus according to the third embodiment. 図９は、実施の形態３に係るプラズマ放電装置の詳細構成を示す回路図である。FIG. 9 is a circuit diagram showing a detailed configuration of the plasma discharge apparatus according to the third embodiment. 図１０は、実施の形態３に係るパルス生成回路において生成される電圧パルスのパルス波形を示すグラフである。FIG. 10 is a graph showing a pulse waveform of a voltage pulse generated in the pulse generation circuit according to the third embodiment. 図１１は、実施の形態４に係るプラズマ放電装置の全体構成の概要を示すブロック図である。FIG. 11 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus according to the fourth embodiment. 図１２は、実施の形態４に係るプラズマ放電装置の詳細構成を示す回路図である。FIG. 12 is a circuit diagram showing a detailed configuration of the plasma discharge apparatus according to the fourth embodiment. 図１３は、変形例に係る空気清浄機の外観図である。FIG. 13 is an external view of an air cleaner according to a modification. 図１４は、変形例に係るエアコンディショナの外観図である。FIG. 14 is an external view of an air conditioner according to a modification.
　以下、本発明の実施の形態について、図面を参照しながら説明する。なお、以下に説明する実施の形態は、いずれも本発明の一具体例を示すものである。したがって、以下の実施の形態で示される、数値、形状、材料、構成要素、構成要素の配置位置及び接続形態などは、一例であって本発明を限定する主旨ではない。よって、以下の実施の形態における構成要素のうち、本発明の最上位概念を示す独立請求項に記載されていない構成要素については、任意の構成要素として説明される。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. Each of the embodiments described below shows a specific example of the present invention. Therefore, the numerical values, shapes, materials, components, component arrangement positions, connection forms, and the like shown in the following embodiments are merely examples, and are not intended to limit the present invention. Therefore, among the constituent elements in the following embodiments, constituent elements that are not described in the independent claims showing the highest concept of the present invention are described as optional constituent elements.
　なお、各図は、模式図であり、必ずしも厳密に図示されたものではない。また、各図において、実質的に同一の構成に対しては同一の符号を付しており、重複する説明は省略又は簡略化する。 Each figure is a schematic diagram and is not necessarily shown strictly. Moreover, in each figure, the same code | symbol is attached | subjected to the substantially same structure, The overlapping description is abbreviate | omitted or simplified.
　（実施の形態１）
　［１－１．全体構成］
　まず、実施の形態１に係るプラズマ放電装置の全体構成について図面を用いて説明する。 (Embodiment 1)
[1-1. overall structure]
First, the overall configuration of the plasma discharge apparatus according to Embodiment 1 will be described with reference to the drawings.
　図１は、実施の形態１に係るプラズマ放電装置１００の全体構成の概要を示すブロック図である。 FIG. 1 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus 100 according to the first embodiment.
　図１に示されるように、本実施の形態に係るプラズマ放電装置１００は、放電部６と、パルス生成回路２とを備える。 As shown in FIG. 1, the plasma discharge apparatus 100 according to the present embodiment includes a discharge unit 6 and a pulse generation circuit 2.
　放電部６は、空気６８で互いに絶縁された電極対６０を有する。電極対６０は、第一電極６１及び第二電極６２からなる。第一電極６１と第二電極６２との間は、空気６８で絶縁されている。本実施の形態では、第一電極６１にはパルス生成回路２の出力電圧が印加され、第二電極６２は接地される。また、電極対６０を絶縁する空気６８の圧力は大気圧である。 The discharge part 6 has an electrode pair 60 insulated from each other by air 68. The electrode pair 60 includes a first electrode 61 and a second electrode 62. The first electrode 61 and the second electrode 62 are insulated by air 68. In the present embodiment, the output voltage of the pulse generation circuit 2 is applied to the first electrode 61, and the second electrode 62 is grounded. The pressure of the air 68 that insulates the electrode pair 60 is atmospheric pressure.
　パルス生成回路２は、電極対６０に印加する電圧パルスを生成する回路である。パルス生成回路２が生成する電圧パルスは、電極対６０間において放電を開始させる高電圧パルスと、高電圧パルスに続いて電極対６０に印加され、高電圧パルスより電圧値が低い低電圧パルスとを含む。また、パルス生成回路２は、低電圧パルスを電極対６０に印加する際に出力する出力電流及び出力電圧を制限する制限回路４０を有する。 The pulse generation circuit 2 is a circuit that generates a voltage pulse to be applied to the electrode pair 60. The voltage pulse generated by the pulse generation circuit 2 includes a high voltage pulse that starts discharge between the electrode pair 60, a low voltage pulse that is applied to the electrode pair 60 following the high voltage pulse, and has a voltage value lower than that of the high voltage pulse. including. Further, the pulse generation circuit 2 includes a limiting circuit 40 that limits an output current and an output voltage that are output when a low voltage pulse is applied to the electrode pair 60.
　本実施の形態では、パルス生成回路２は、さらに、第一生成回路１０と、第二生成回路２０と、合波回路３０とを備える。第一生成回路１０は、上記高電圧パルスに対応する第一パルスを生成する回路である。第二生成回路２０は、上記低電圧パルスに対応し、第一パルスよりパルス幅が大きい第二パルスを生成する回路である。合波回路３０は、第一パルスと第二パルスとを合波して、上記電圧パルスを出力する回路である。 In the present embodiment, the pulse generation circuit 2 further includes a first generation circuit 10, a second generation circuit 20, and a multiplexing circuit 30. The first generation circuit 10 is a circuit that generates a first pulse corresponding to the high voltage pulse. The second generation circuit 20 is a circuit that generates a second pulse corresponding to the low voltage pulse and having a pulse width larger than that of the first pulse. The multiplexing circuit 30 is a circuit that combines the first pulse and the second pulse and outputs the voltage pulse.
　続いて、本実施の形態に係るパルス生成回路２の詳細構成について図面を用いて説明する。 Subsequently, a detailed configuration of the pulse generation circuit 2 according to the present embodiment will be described with reference to the drawings.
　図２は、本実施の形態に係るプラズマ放電装置１００の詳細構成を示す回路図である。 FIG. 2 is a circuit diagram showing a detailed configuration of the plasma discharge apparatus 100 according to the present embodiment.
　図２に示されるように本実施の形態に係るプラズマ放電装置１００は、第一生成回路１０及び第二生成回路２０を制御する制御回路５０を備える。 As shown in FIG. 2, the plasma discharge apparatus 100 according to the present embodiment includes a control circuit 50 that controls the first generation circuit 10 and the second generation circuit 20.
　また、本実施の形態では、制限回路４０は抵抗素子である。制限回路４０を構成する抵抗素子の抵抗値は、第二生成回路２０から出力される出力電圧の値などに基づいて適宜設計されればよい。本実施の形態では、抵抗素子の抵抗値は、２ｋΩ以上３ｋΩ以下程度である。 Further, in the present embodiment, the limiting circuit 40 is a resistance element. The resistance value of the resistance element that constitutes the limiting circuit 40 may be appropriately designed based on the value of the output voltage output from the second generation circuit 20 or the like. In the present embodiment, the resistance value of the resistance element is about 2 kΩ to 3 kΩ.
　本実施の形態では、合波回路３０は、第一コイル３１及び第二コイル３２を備えるトランスである。合波回路３０を構成する各コイルの巻数比は、第一生成回路１０及び第二生成回路２０からそれぞれ出力される出力電圧の値などに基づいて適宜設定されればよい。本実施の形態では、第一コイル３１と第二コイル３２との巻数比は、１：１５である。 In this embodiment, the multiplexing circuit 30 is a transformer including a first coil 31 and a second coil 32. The turn ratio of each coil constituting the multiplexing circuit 30 may be set as appropriate based on the value of the output voltage output from each of the first generation circuit 10 and the second generation circuit 20. In the present embodiment, the turns ratio of the first coil 31 and the second coil 32 is 1:15.
　第一生成回路１０は、第一直流電源１５と、第一コンデンサ１６と、第一スイッチング素子１１とを備える。本実施の形態では、第一生成回路１０は、合波回路３０の第一コイル３１に第一パルスを出力する。 The first generation circuit 10 includes a first DC power supply 15, a first capacitor 16, and a first switching element 11. In the present embodiment, the first generation circuit 10 outputs a first pulse to the first coil 31 of the multiplexing circuit 30.
　第一直流電源１５は、直流電圧を出力する電源回路である。第一直流電源１５が出力する直流電圧の値は、合波回路３０の特性などに基づいて適宜設定されればよい。本実施の形態では、第一直流電源１５は１ｋＶの直流電圧を出力する。 The first DC power supply 15 is a power supply circuit that outputs a DC voltage. The value of the DC voltage output from the first DC power supply 15 may be set as appropriate based on the characteristics of the multiplexing circuit 30 and the like. In the present embodiment, the first DC power supply 15 outputs a DC voltage of 1 kV.
　第一コンデンサ１６は、第一生成回路１０の出力電圧の振動を抑制するための素子であり、第一直流電源１５に並列接続される。第一コンデンサ１６の容量は、第一コイル３１の特性などに応じて適宜設定されればよい。 The first capacitor 16 is an element for suppressing the oscillation of the output voltage of the first generation circuit 10 and is connected in parallel to the first DC power supply 15. The capacity of the first capacitor 16 may be set as appropriate according to the characteristics of the first coil 31 and the like.
　第一スイッチング素子１１は、第一直流電源１５が出力する直流電圧の一部だけを第一生成回路１０から出力するための素子である。本実施の形態では、第一スイッチング素子１１は、制御回路５０によって導通及び非導通の切り替えを制御されるスイッチングトランジスタである。第一スイッチング素子１１としては、例えば、図２に示されるように、ＭＯＳＦＥＴ（Ｍｅｔａｌ－Ｏｘｉｄｅ　Ｓｅｍｉｃｏｎｄｕｃｔｏｒ　Ｆｉｅｌｄ－Ｅｆｆｅｃｔ　Ｔｒａｎｓｉｓｔｏｒ）を用いることができる。第一スイッチング素子１１は、第一コイル３１に直列接続される。また、第一コイル３１及び第一スイッチング素子１１からなる回路は、第一直流電源１５に並列接続される。 The first switching element 11 is an element for outputting only a part of the DC voltage output from the first DC power supply 15 from the first generation circuit 10. In the present embodiment, the first switching element 11 is a switching transistor whose switching between conduction and non-conduction is controlled by the control circuit 50. As the first switching element 11, for example, as shown in FIG. 2, a MOSFET (Metal-Oxide Semiconductor Field-Effect Transistor) can be used. The first switching element 11 is connected in series to the first coil 31. A circuit composed of the first coil 31 and the first switching element 11 is connected in parallel to the first DC power supply 15.
　第二生成回路２０は、第二直流電源２５と、第二コンデンサ２６と、四つの第二スイッチング素子２１～２４と、トランス２７と、ダイオード２８及び２９とを備える。 The second generation circuit 20 includes a second DC power supply 25, a second capacitor 26, four second switching elements 21 to 24, a transformer 27, and diodes 28 and 29.
　第二直流電源２５は、直流電圧を出力する電源回路である。第二直流電源２５が出力する直流電圧の値は、トランス２７の特性などに基づいて適宜設定されればよい。本実施の形態では、第二直流電源２５は１００Ｖの直流電圧を出力する。 The second DC power supply 25 is a power supply circuit that outputs a DC voltage. The value of the DC voltage output from the second DC power supply 25 may be set as appropriate based on the characteristics of the transformer 27 and the like. In the present embodiment, the second DC power supply 25 outputs a DC voltage of 100V.
　第二コンデンサ２６は、トランス２７と共にＬＣ共振回路を構成する素子であり、トランス２７の一次側コイル２７１に直列接続される。第二コンデンサ２６の容量は、トランス２７の特性などに応じて適宜設定されればよい。 The second capacitor 26 is an element that forms an LC resonance circuit together with the transformer 27, and is connected in series to the primary coil 271 of the transformer 27. The capacity of the second capacitor 26 may be set as appropriate according to the characteristics of the transformer 27 and the like.
　トランス２７は、一次側コイル２７１と、二次側コイル２７２とを備え、一次側コイル２７１に入力された電圧を、所定の変圧比で変圧して、二次側コイル２７２に出力する素子である。トランス２７の変圧比は、一次側コイル２７１に入力される電圧などに基づいて適宜設定されればよい。本実施の形態では、変圧比（一次側コイルの巻数／二次側コイルの巻数）は、１／１０程度である。 The transformer 27 is an element that includes a primary side coil 271 and a secondary side coil 272, transforms the voltage input to the primary side coil 271 with a predetermined transformation ratio, and outputs the transformed voltage to the secondary side coil 272. . The transformation ratio of the transformer 27 may be set as appropriate based on the voltage input to the primary coil 271 and the like. In the present embodiment, the transformation ratio (the number of turns of the primary side coil / the number of turns of the secondary side coil) is about 1/10.
　第二スイッチング素子２１～２４は、フルブリッジ型のインバータ回路を構成する素子である。第二スイッチング素子２１及び２２が直列接続され、第二スイッチング素子２３及び２４が直列接続される。さらに、第二スイッチング素子２１及び２２と第二スイッチング素子２３及び２４とが並列接続される。第二スイッチング素子２１と第二スイッチング素子２２とが接続されるノードと、第二スイッチング素子２３と第二スイッチング素子２４とが接続されるノードとの間に、第二コンデンサ２６及びトランス２７からなるＬＣ共振回路が接続される。本実施の形態では、第二スイッチング素子２１～２４は、制御回路５０によって導通及び非導通の切り替えを制御されるスイッチングトランジスタである。第二スイッチング素子２１～２４としては、例えば、図２に示されるように、ＭＯＳＦＥＴを用いることができる。 The second switching elements 21 to 24 are elements constituting a full bridge type inverter circuit. The second switching elements 21 and 22 are connected in series, and the second switching elements 23 and 24 are connected in series. Further, the second switching elements 21 and 22 and the second switching elements 23 and 24 are connected in parallel. A second capacitor 26 and a transformer 27 are provided between a node to which the second switching element 21 and the second switching element 22 are connected and a node to which the second switching element 23 and the second switching element 24 are connected. An LC resonant circuit is connected. In the present embodiment, the second switching elements 21 to 24 are switching transistors whose switching between conduction and non-conduction is controlled by the control circuit 50. As the second switching elements 21 to 24, for example, MOSFETs can be used as shown in FIG.
　ダイオード２８及び２９は、トランス２７から出力された交流電圧を直流電圧に変換するための整流素子である。ダイオード２８のアノードにダイオード２９のカソードが接続され、ダイオード２９にトランス２７の二次側コイル２７２が並列接続される。ダイオード２８のカソードとダイオード２９のアノードとから第二生成回路２０の出力電圧が出力される。第二生成回路２０の出力電圧は、制限回路４０、合波回路３０及び放電部６からなる直列回路に印加される。 The diodes 28 and 29 are rectifying elements for converting the AC voltage output from the transformer 27 into a DC voltage. The cathode of a diode 29 is connected to the anode of the diode 28, and the secondary coil 272 of the transformer 27 is connected in parallel to the diode 29. The output voltage of the second generation circuit 20 is output from the cathode of the diode 28 and the anode of the diode 29. The output voltage of the second generation circuit 20 is applied to a series circuit including the limiting circuit 40, the multiplexing circuit 30, and the discharge unit 6.
　制御回路５０は、第一生成回路１０及び第二生成回路２０を制御する回路である。制御回路５０は、第一スイッチング素子１１の導通及び非導通の切り替えタイミングを制御することにより、第一生成回路１０から出力される第一パルスのパルス幅、及び、出力タイミングを制御する。また、制御回路５０は、第二スイッチング素子２１～２４の各々の導通及び非導通の切り替えタイミングを制御することにより、第二生成回路２０から出力される第二パルスの電圧値、パルス幅、及び、出力タイミングを制御する。制御回路５０は、第一パルスに続いて第二パルスが合波回路３０に印加されるように制御を行う。制御回路５０は、例えば、プロセッサ及びメモリを備えるＩＣ（Ｉｎｔｅｇｒａｔｅｄ　Ｃｉｒｃｕｉｔ）チップなどを用いて実現できる。 The control circuit 50 is a circuit that controls the first generation circuit 10 and the second generation circuit 20. The control circuit 50 controls the pulse width of the first pulse output from the first generation circuit 10 and the output timing by controlling the switching timing of conduction and non-conduction of the first switching element 11. Further, the control circuit 50 controls the switching timing of each of the second switching elements 21 to 24 to turn on and off, whereby the voltage value of the second pulse output from the second generation circuit 20, the pulse width, and Control the output timing. The control circuit 50 performs control so that the second pulse is applied to the multiplexing circuit 30 following the first pulse. The control circuit 50 can be realized using, for example, an IC (Integrated Circuit) chip including a processor and a memory.
　［１－２．電圧パルス］
　本実施の形態に係るパルス生成回路２が生成する電圧パルスについて図面を用いて説明する。 [1-2. Voltage pulse]
A voltage pulse generated by the pulse generation circuit 2 according to the present embodiment will be described with reference to the drawings.
　図３は、本実施の形態に係るパルス生成回路２において生成される電圧パルスのパルス波形を示すグラフである。図３のグラフ（ａ）、（ｂ）及び（ｃ）は、それぞれ、第一生成回路１０から出力される第一パルスＰ１、第二生成回路２０から出力される第二パルスＰ２、及び、パルス生成回路２から出力される電圧パルスＰ０の波形を示す。 FIG. 3 is a graph showing a pulse waveform of a voltage pulse generated in the pulse generation circuit 2 according to the present embodiment. Graphs (a), (b), and (c) in FIG. 3 respectively show a first pulse P1 output from the first generation circuit 10, a second pulse P2 output from the second generation circuit 20, and a pulse. The waveform of the voltage pulse P0 output from the production | generation circuit 2 is shown.
　図３のグラフ（ｃ）に示されるように、パルス生成回路２から出力される電圧パルスＰ０は、高電圧パルスＰＨと低電圧パルスＰＬとからなる。 As shown in the graph (c) of FIG. 3, the voltage pulse P0 output from the pulse generation circuit 2 is composed of a high voltage pulse PH and a low voltage pulse PL.
　図３のグラフ（ａ）に示されるように、第一生成回路１０は、電圧パルスＰ０の高電圧パルスＰＨに対応する第一パルスＰ１を出力する。また、図３のグラフ（ｂ）に示されるように、第二生成回路２０は、電圧パルスＰ０の低電圧パルスＰＬに対応し、第一パルスＰ１よりパルス幅が大きい第二パルスＰ２を生成する。本実施の形態では、第一パルスＰ１のパルス幅Ｔ１は５００ｎｓｅｃ程度であり、第二パルスＰ２のパルス幅Ｔ２は、１０μｓｅｃ程度である。 3, the first generation circuit 10 outputs a first pulse P1 corresponding to the high voltage pulse PH of the voltage pulse P0. Further, as shown in the graph (b) of FIG. 3, the second generation circuit 20 generates a second pulse P2 corresponding to the low voltage pulse PL of the voltage pulse P0 and having a pulse width larger than that of the first pulse P1. . In the present embodiment, the pulse width T1 of the first pulse P1 is about 500 nsec, and the pulse width T2 of the second pulse P2 is about 10 μsec.
　第一パルスＰ１は、合波回路３０において、電圧値が１ｋＶから１５ｋＶ程度まで昇圧されて、第二パルスＰ２と合波される。このようにパルス生成回路２において、電圧パルスＰ０が生成され、放電部６の電極対６０に印加される。 The first pulse P1 is boosted in the multiplexing circuit 30 from a voltage value of about 1 kV to about 15 kV and combined with the second pulse P2. Thus, in the pulse generation circuit 2, the voltage pulse P 0 is generated and applied to the electrode pair 60 of the discharge unit 6.
　電圧パルスＰ０のパルス幅Ｔ０及び繰り返し周期ＴＡは、特に限定されないが、例えば、それぞれ１０μｓｅｃ程度及び１００μｓｅｃ程度である。この場合、電圧パルスＰ０の繰り返しの周波数は、１０ｋＨｚ程度である。 The pulse width T0 and the repetition period TA of the voltage pulse P0 are not particularly limited, but are, for example, about 10 μsec and about 100 μsec, respectively. In this case, the repetition frequency of the voltage pulse P0 is about 10 kHz.
　［１－３．動作］
　本実施の形態に係るプラズマ放電装置１００の動作について図面を用いて説明する。 [1-3. Operation]
The operation of plasma discharge apparatus 100 according to the present embodiment will be described with reference to the drawings.
　図４Ａは、本実施の形態に係るプラズマ放電装置１００の電極対６０間に有機物が存在しない場合に、電極対６０間に印加される電圧パルスＰ０の波形の一例を示すグラフである。図４Ｂは、本実施の形態に係るプラズマ放電装置１００の電極対６０間に有機物が存在する場合に、電極対６０間に印加される電圧パルスＰ０の波形の一例を示すグラフである。なお、図４Ａ及び図４Ｂに示されるグラフは、いずれも実験によって得られたグラフである。図５は、電極対６０間に印加される電流及び電圧と、放電状態との関係を示すグラフである。 FIG. 4A is a graph showing an example of a waveform of a voltage pulse P0 applied between the electrode pair 60 when there is no organic substance between the electrode pair 60 of the plasma discharge apparatus 100 according to the present embodiment. FIG. 4B is a graph showing an example of a waveform of a voltage pulse P0 applied between the electrode pair 60 when an organic substance is present between the electrode pair 60 of the plasma discharge apparatus 100 according to the present embodiment. Note that the graphs shown in FIGS. 4A and 4B are both graphs obtained by experiments. FIG. 5 is a graph showing the relationship between the current and voltage applied between the electrode pair 60 and the discharge state.
　電極対６０間に有機物が存在しない場合には、図４Ａに示されるように、電極対６０間に、高電圧パルスＰＨ及び低電圧パルスＰＬからなる電圧パルスＰ０が印加される。高電圧パルスＰＨの電圧値は、絶縁破壊電圧以上の電圧値である。本実施の形態では、高電圧パルスＰＨの電圧値は１ｋＶを超える。これにより、電極対６０間において放電が開始される。また、高電圧パルスＰＨに続いて電極対６０間に低電圧パルスＰＬが印加される。これにより、電極対６０間に有機物が存在しない場合には、高電圧パルスＰＨによって開始された放電を比較的安定的に維持できる。本実施の形態では、低電圧パルスＰＬの電圧値は５００Ｖ程度であり、電極対６０間には６０ｍＡ程度の電流が流れる。 When there is no organic substance between the electrode pair 60, a voltage pulse P0 composed of a high voltage pulse PH and a low voltage pulse PL is applied between the electrode pair 60 as shown in FIG. 4A. The voltage value of the high voltage pulse PH is a voltage value equal to or higher than the dielectric breakdown voltage. In the present embodiment, the voltage value of the high voltage pulse PH exceeds 1 kV. Thereby, discharge is started between the electrode pair 60. Further, the low voltage pulse PL is applied between the electrode pair 60 following the high voltage pulse PH. Thereby, when there is no organic substance between the electrode pair 60, the discharge started by the high voltage pulse PH can be maintained relatively stably. In the present embodiment, the voltage value of the low voltage pulse PL is about 500 V, and a current of about 60 mA flows between the electrode pair 60.
　ここで、電極対６０間に印加される電圧は、電極対６０間における抵抗値と、制限回路４０を構成する抵抗素子の抵抗値とによって定まる。例えば、制限回路４０を構成する抵抗素子の抵抗値が増大するにつれて、電極対６０間に印加される電圧の値が減少する。本実施の形態では、制限回路４０を構成する抵抗素子の抵抗値は、電極対６０間に印加される電圧が５００Ｖ程度となるように設定される。また、電極対６０間に流れる電流は、第二直流電源２５の出力電力の上限値と、制限回路４０を構成する抵抗素子の抵抗値とによって制限される。例えば、制限回路４０を構成する抵抗素子の抵抗値が増大するにつれて、電極対６０間に流れる電流の値が減少する。本実施の形態では、第二直流電源２５の出力電力の上限値は、３０Ｗ程度に設定される。 Here, the voltage applied between the electrode pair 60 is determined by the resistance value between the electrode pair 60 and the resistance value of the resistance element constituting the limiting circuit 40. For example, as the resistance value of the resistance element constituting the limiting circuit 40 increases, the value of the voltage applied between the electrode pair 60 decreases. In the present embodiment, the resistance value of the resistance element constituting the limiting circuit 40 is set so that the voltage applied between the electrode pair 60 is about 500V. Further, the current flowing between the electrode pair 60 is limited by the upper limit value of the output power of the second DC power supply 25 and the resistance value of the resistance element constituting the limiting circuit 40. For example, as the resistance value of the resistance element constituting the limiting circuit 40 increases, the value of the current flowing between the electrode pair 60 decreases. In the present embodiment, the upper limit value of the output power of the second DC power supply 25 is set to about 30W.
　低電圧パルスＰＬを電極対６０間に印加している期間における放電の状態は、図５に示される状態Ａに相当する。つまり、この期間においては、電極対６０間において、低電圧パルスＰＬの印加によってグロー放電が生成される。 The state of discharge during the period in which the low voltage pulse PL is applied between the electrode pair 60 corresponds to the state A shown in FIG. That is, during this period, glow discharge is generated between the electrode pair 60 by applying the low voltage pulse PL.
　上述の電極対６０間において発生する放電の状態は、制限回路４０によって特定の状態に制限される。本実施の形態では、制限回路４０が抵抗素子であるため、電極対６０間に印加される電圧値及び電極対６０間に流れる電流値の関係が、図５に示される一点鎖線で示される関係に制限される。一方、放電時における、電極対６０間の電圧及び電流の関係は、図５の実線で示される。このため、電極対６０間における放電の状態は、図５の一点鎖線と実線との交点に相当する状態Ａ及び状態Ｂのいずれかに制限される。電極対６０間に有機物が存在しない場合には、電極対６０間に印加される電圧を５００Ｖ程度に設定することによって、放電状態を図５に示される状態Ａの状態、つまり、グロー放電とすることができる。したがって、電極対６０間に低温プラズマが生成され、放電部６における温度上昇は比較的抑制され、電極対６０の損傷も抑制される。 The state of discharge generated between the electrode pair 60 is limited to a specific state by the limiting circuit 40. In the present embodiment, since the limiting circuit 40 is a resistance element, the relationship between the voltage value applied between the electrode pair 60 and the current value flowing between the electrode pair 60 is the relationship indicated by the one-dot chain line shown in FIG. Limited to On the other hand, the relationship between the voltage and current between the electrode pair 60 during discharge is shown by the solid line in FIG. For this reason, the state of discharge between the electrode pair 60 is limited to one of the state A and the state B corresponding to the intersection of the one-dot chain line and the solid line in FIG. When no organic substance exists between the electrode pair 60, the voltage applied between the electrode pair 60 is set to about 500 V, so that the discharge state is the state A shown in FIG. 5, that is, glow discharge. be able to. Therefore, low temperature plasma is generated between the electrode pair 60, temperature rise in the discharge part 6 is relatively suppressed, and damage to the electrode pair 60 is also suppressed.
　一方、電極対６０間に花粉などの有機物が存在する場合には、図４Ｂに示されるように、電極対６０間に、高電圧パルスＰＨ１及び低電圧パルスＰＬ１からなる電圧パルスＰ０１が印加される。高電圧パルスＰＨ１の電圧値は、電極対６０間に花粉などの有機物が存在しない場合と同様に図５に示される絶縁破壊電圧以上の電圧値である。これにより、電極対６０間において放電が開始される。また、高電圧パルスＰＨ１に続いて電極対６０間に低電圧パルスＰＬ１が印加される。これにより、高電圧パルスＰＨ１によって開始された放電を維持できる。ただし、電極対６０間に有機物が存在する場合には、有機物によって電極対６０間の抵抗値が低下する。このため、電極対６０間に印加される電圧が低下し、電極対６０間に流れる電流が増大する。本実施の形態では、図４Ｂに示されるように、低電圧パルスＰＬ１の電圧値は、２００Ｖ程度まで低下し、電極対６０間に１５０ｍＡ程度の電流が流れる。低電圧パルスＰＬ１を電極対６０間に印加している期間における放電の状態は、図５に示される状態Ｂに相当する。つまり、低電圧パルスＰＬ１を電極対６０間に印加している期間においては、電極対６０間にアーク放電が生成される。これにより、電極対６０間に存在する有機物はアーク放電によって生成された熱プラズマによって、例えば１秒以下程度の極めて短時間で燃焼されて消滅する。つまり、有機物は、燃焼されることによって、二酸化炭素及び水となる。このように、電極対６０間に有機物が存在する場合には、低電圧パルスＰＬ１を印加している際の電極対６０間における有機物の状態が変化するため、図４Ｂに示されるように、電極対６０間に印加される電圧が安定しない。本実施の形態では、電極対６０間における放電状態が、図５に示される状態Ａと状態Ｂとの間で変動する。 On the other hand, when an organic substance such as pollen exists between the electrode pair 60, a voltage pulse P01 composed of a high voltage pulse PH1 and a low voltage pulse PL1 is applied between the electrode pair 60 as shown in FIG. 4B. . The voltage value of the high voltage pulse PH1 is a voltage value equal to or higher than the breakdown voltage shown in FIG. 5 as in the case where no organic substance such as pollen is present between the electrode pair 60. Thereby, discharge is started between the electrode pair 60. Further, the low voltage pulse PL1 is applied between the electrode pair 60 following the high voltage pulse PH1. Thereby, the discharge started by the high voltage pulse PH1 can be maintained. However, when an organic substance is present between the electrode pair 60, the resistance value between the electrode pair 60 is reduced by the organic substance. For this reason, the voltage applied between the electrode pair 60 decreases, and the current flowing between the electrode pair 60 increases. In the present embodiment, as shown in FIG. 4B, the voltage value of the low voltage pulse PL <b> 1 decreases to about 200 V, and a current of about 150 mA flows between the electrode pair 60. The state of discharge during the period in which the low voltage pulse PL1 is applied between the electrode pair 60 corresponds to the state B shown in FIG. That is, arc discharge is generated between the electrode pair 60 during the period in which the low voltage pulse PL <b> 1 is applied between the electrode pair 60. As a result, the organic matter existing between the electrode pair 60 is burned and extinguished by the thermal plasma generated by the arc discharge in an extremely short time of about 1 second or less, for example. That is, organic matter becomes carbon dioxide and water by being burned. As described above, when an organic substance is present between the electrode pair 60, the state of the organic substance changes between the electrode pair 60 when the low voltage pulse PL1 is applied. The voltage applied between the pair 60 is not stable. In the present embodiment, the discharge state between the electrode pair 60 varies between the state A and the state B shown in FIG.
　電極対６０間における有機物が消滅した後は、電極対６０間の放電状態は、図５に示される状態Ａ、つまり、グロー放電となり、図４Ａに示されるような電圧パルスＰ０が、電極対６０に印加される。 After the organic substance between the electrode pair 60 disappears, the discharge state between the electrode pair 60 becomes the state A shown in FIG. 5, that is, glow discharge, and the voltage pulse P0 as shown in FIG. To be applied.
　このように、本実施の形態に係るプラズマ放電装置１００によれば、空気６８中の花粉などの有機物を極めて短時間で消滅させることができる。また、本実施の形態では、空気６８は、大気圧でよいため、大気中の空気を、圧力調整することなく、そのまま電極対間に導入することができる。このため、空気中の花粉などの有機物を容易に消滅させることができる。 Thus, according to the plasma discharge apparatus 100 according to the present embodiment, organic substances such as pollen in the air 68 can be extinguished in a very short time. In the present embodiment, since the air 68 may be atmospheric pressure, air in the atmosphere can be directly introduced between the electrode pairs without adjusting the pressure. For this reason, organic substances, such as pollen in the air, can be easily extinguished.
　［１－４．まとめ］
　以上のように、本実施の形態に係るプラズマ放電装置１００は、空気６８で互いに絶縁された電極対６０を有する放電部６と、電極対６０に印加する電圧パルスＰ０を生成するパルス生成回路２とを備え、電圧パルスＰ０は、電極対６０間において放電を開始させる高電圧パルスＰＨと、高電圧パルスＰＨに続いて電極対６０に印加され、高電圧パルスＰＨより電圧値が低い低電圧パルスＰＬとを含み、パルス生成回路２は、低電圧パルスＰＬを電極対６０に印加する際に出力する出力電流及び出力電圧を制限する制限回路４０を有する。 [1-4. Summary]
As described above, the plasma discharge apparatus 100 according to the present embodiment includes the discharge unit 6 having the electrode pair 60 insulated from each other by the air 68, and the pulse generation circuit 2 that generates the voltage pulse P0 applied to the electrode pair 60. The voltage pulse P0 is applied to the electrode pair 60 following the high voltage pulse PH, and the voltage pulse P0 has a voltage value lower than that of the high voltage pulse PH. The pulse generation circuit 2 includes a limiting circuit 40 that limits an output current and an output voltage that are output when the low voltage pulse PL is applied to the electrode pair 60.
　これにより、まず、高電圧パルスによって電極対６０間の空気６８による絶縁を破壊した後、続いて電極対６０に印加される低電圧パルスによって放電を維持できる。ここで、低電圧パルスの電圧値を所定の値に設定することにより、電極対６０間においてグロー放電を維持できる。グロー放電によって生成される低温プラズマ内に、空気６８中の花粉などの有機物が入ることで、電極対間の抵抗が低減する。これに伴い電極対６０間に流れる電流が上昇し、かつ、電極対６０間の電圧が低下する。このため、電極対６０間の放電をグロー放電から、より電流量の大きいアーク放電に遷移させることができる。アーク放電によって生成される熱プラズマにおいては、花粉などの有機物は、極めて短時間で燃焼して消滅する。このように、本実施の形態に係るプラズマ放電装置１００においては、空気中の花粉などの有機物を極めて短時間で燃焼して消滅させることができる。 Thereby, first, after the insulation by the air 68 between the electrode pair 60 is broken by the high voltage pulse, the discharge can be maintained by the low voltage pulse subsequently applied to the electrode pair 60. Here, glow discharge can be maintained between the electrode pair 60 by setting the voltage value of the low voltage pulse to a predetermined value. The organic substance such as pollen in the air 68 enters the low temperature plasma generated by the glow discharge, thereby reducing the resistance between the electrode pair. Along with this, the current flowing between the electrode pair 60 increases, and the voltage between the electrode pair 60 decreases. For this reason, the discharge between the electrode pair 60 can be changed from the glow discharge to the arc discharge having a larger current amount. In the thermal plasma generated by arc discharge, organic substances such as pollen burn and disappear in a very short time. Thus, in the plasma discharge apparatus 100 according to the present embodiment, organic substances such as pollen in the air can be burned and extinguished in a very short time.
　また、本実施の形態に係るプラズマ放電装置１００は、低電圧パルスを電極対６０間に印加する際に出力する出力電流及び出力電圧を制限する制限回路４０を有するため、電極対６０間に過大な電流が発生することを抑制できる。したがって、例えば電極対６０間に有機物が入ることに伴ってアーク放電が発生した場合でも、有機物が消滅した後には、電極対６０間の放電をアーク放電から、例えば、グロー放電に遷移させることができる。このため、電極対６０がアーク放電によって損傷することを抑制でき、かつ、プラズマ放電装置１００の消費電力を抑制できる。 In addition, the plasma discharge apparatus 100 according to the present embodiment includes the limiting circuit 40 that limits the output current and the output voltage that are output when a low voltage pulse is applied between the electrode pair 60, so Generation of a large current can be suppressed. Therefore, for example, even when an arc discharge occurs due to the organic matter entering between the electrode pair 60, after the organic matter disappears, the discharge between the electrode pair 60 can be changed from the arc discharge to, for example, a glow discharge. it can. For this reason, it can suppress that the electrode pair 60 is damaged by arc discharge, and can suppress the power consumption of the plasma discharge apparatus 100. FIG.
　また、本実施の形態に係るプラズマ放電装置１００において、パルス生成回路２は、高電圧パルスＰＨに対応する第一パルスＰ１を生成する第一生成回路１０と、低電圧パルスＰＬに対応し、第一パルスＰ１よりパルス幅が大きい第二パルスＰ２を生成する第二生成回路２０と、第一パルスＰ１と第二パルスＰ２とを合波して、電圧パルスＰ０を出力する合波回路３０とを備えてもよい。 In the plasma discharge apparatus 100 according to the present embodiment, the pulse generation circuit 2 corresponds to the first generation circuit 10 that generates the first pulse P1 corresponding to the high voltage pulse PH, the low voltage pulse PL, A second generation circuit 20 that generates a second pulse P2 having a pulse width larger than one pulse P1, and a multiplexing circuit 30 that combines the first pulse P1 and the second pulse P2 and outputs a voltage pulse P0. You may prepare.
　これにより、パルス生成回路２を簡素化された構成で実現することができる。 Thereby, the pulse generation circuit 2 can be realized with a simplified configuration.
　また、本実施の形態に係るプラズマ放電装置１００において、空気６８の圧力は大気圧であってもよい。 Further, in the plasma discharge apparatus 100 according to the present embodiment, the pressure of the air 68 may be atmospheric pressure.
　これにより、例えば、大気中の空気を、圧力調整することなく、そのまま電極対６０間に導入することができる。このため、空気中の花粉などの有機物を容易に消滅させることができる。 Thereby, for example, air in the atmosphere can be directly introduced between the electrode pair 60 without adjusting the pressure. For this reason, organic substances, such as pollen in the air, can be easily extinguished.
　また、本実施の形態に係るプラズマ放電装置１００において、電極対６０間において、低電圧パルスＰＬの印加によってグロー放電が生成されてもよい。 In the plasma discharge apparatus 100 according to the present embodiment, glow discharge may be generated between the electrode pair 60 by applying the low voltage pulse PL.
　これにより、放電時に電極対６０間における温度上昇を抑制できる。また、放電プラズマ中に花粉などの有機物が入った場合には、アーク放電に遷移することにより、極めて短時間で当該有機物を燃焼して消滅させることができる。また、アーク放電が継続する時間は極めて短いため、放電プラズマ内に有機物が入った場合の電極対６０間における温度上昇を抑制できる。 Thereby, the temperature rise between the electrode pair 60 can be suppressed during discharge. Moreover, when organic substances, such as pollen, are contained in the discharge plasma, the organic substances can be burned and extinguished in an extremely short time by transitioning to arc discharge. Further, since the arc discharge continues for a very short time, it is possible to suppress a temperature rise between the electrode pair 60 when an organic substance enters the discharge plasma.
　また、本実施の形態に係るプラズマ放電装置１００において、制限回路４０は、抵抗素子であってもよい。 In the plasma discharge apparatus 100 according to the present embodiment, the limiting circuit 40 may be a resistance element.
　これにより、容易に、かつ、安価で制限回路４０を実現することができる。 Thereby, the limiting circuit 40 can be realized easily and inexpensively.
　（実施の形態２）
　実施の形態２に係るプラズマ放電装置について説明する。本実施の形態に係るプラズマ放電装置は、主に制限回路の構成において、実施の形態１に係るプラズマ放電装置１００と相違する。以下、本実施の形態に係るプラズマ放電装置について、実施の形態１に係るプラズマ放電装置１００との相違点を中心に説明する。 (Embodiment 2)
A plasma discharge apparatus according to Embodiment 2 will be described. The plasma discharge apparatus according to the present embodiment is different from the plasma discharge apparatus 100 according to the first embodiment mainly in the configuration of the limiting circuit. Hereinafter, the plasma discharge apparatus according to the present embodiment will be described focusing on differences from the plasma discharge apparatus 100 according to the first embodiment.
　本実施の形態に係るプラズマ放電装置の全体構成について図面を用いて説明する。 The overall configuration of the plasma discharge apparatus according to the present embodiment will be described with reference to the drawings.
　図６は、本実施の形態に係るプラズマ放電装置２００の全体構成の概要を示すブロック図である。図７は、本実施の形態に係るプラズマ放電装置２００の詳細構成を示す回路図である。 FIG. 6 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus 200 according to the present embodiment. FIG. 7 is a circuit diagram showing a detailed configuration of plasma discharge apparatus 200 according to the present embodiment.
　図６に示されるように、本実施の形態に係るプラズマ放電装置２００は、放電部６と、パルス生成回路２０２とを備える。 As shown in FIG. 6, the plasma discharge apparatus 200 according to the present embodiment includes a discharge unit 6 and a pulse generation circuit 202.
　本実施の形態に係るパルス生成回路２０２は、第一生成回路１０と、第二生成回路２０と、合波回路３０と、制限回路２４０とを有する。 The pulse generation circuit 202 according to the present embodiment includes a first generation circuit 10, a second generation circuit 20, a multiplexing circuit 30, and a limiting circuit 240.
　本実施の形態に係るプラズマ放電装置２００では、制限回路２４０は、パルス生成回路２０２の出力電流に応じて出力電圧を制御する回路であり、図７に示される電流検出回路２４１及び制御回路２５０を備える。 In the plasma discharge apparatus 200 according to the present embodiment, the limiting circuit 240 is a circuit that controls the output voltage in accordance with the output current of the pulse generation circuit 202. The current detection circuit 241 and the control circuit 250 shown in FIG. Prepare.
　電流検出回路２４１は、パルス生成回路２０２の出力電流に対応する信号を出力する回路である。電流検出回路２４１としては、例えばホール素子などを用いることができる。 The current detection circuit 241 is a circuit that outputs a signal corresponding to the output current of the pulse generation circuit 202. As the current detection circuit 241, for example, a Hall element can be used.
　制御回路２５０は、実施の形態１に係る制御回路５０と同様に、第一生成回路１０及び第二生成回路２０を制御する回路である。ただし、本実施の形態に係る制御回路２５０は、電流検出回路２４１からの信号に基づいて、第二生成回路２０の出力電圧を制御する。制御回路２５０は、例えば、第二生成回路２０の第二スイッチング素子２１～２４の導通期間の割合（デューティ）を制御することによって、第二生成回路２０の出力電圧を制御する。より具体的には、例えば、制御回路２５０は、電極対６０間における放電状態が図５に示される状態Ａ及び状態Ｂの一方となるように、第二生成回路２０の出力電圧を制御してもよい。例えば、電極対６０間に花粉などの有機物が存在しない場合、つまり、電極対６０間に流れる電流の値が比較的小さい場合には、制御回路２５０は第二生成回路２０の出力電圧値が状態Ａにおける電圧値程度となるように第二生成回路２０を制御する。一方、電極対６０間に有機物が存在する場合、つまり、電極対６０間に流れる電流の値が比較的大きい場合には、制御回路２５０は第二生成回路２０の出力電圧値が状態Ｂにおける電圧値程度となるように第二生成回路２０を制御する。 The control circuit 250 is a circuit that controls the first generation circuit 10 and the second generation circuit 20 similarly to the control circuit 50 according to the first embodiment. However, the control circuit 250 according to the present embodiment controls the output voltage of the second generation circuit 20 based on the signal from the current detection circuit 241. The control circuit 250 controls the output voltage of the second generation circuit 20 by controlling the ratio (duty) of the conduction period of the second switching elements 21 to 24 of the second generation circuit 20, for example. More specifically, for example, the control circuit 250 controls the output voltage of the second generation circuit 20 so that the discharge state between the electrode pair 60 is one of the state A and the state B shown in FIG. Also good. For example, when an organic substance such as pollen does not exist between the electrode pair 60, that is, when the value of the current flowing between the electrode pair 60 is relatively small, the control circuit 250 sets the output voltage value of the second generation circuit 20 to the state. The second generation circuit 20 is controlled so as to be about the voltage value at A. On the other hand, when an organic substance is present between the electrode pair 60, that is, when the value of the current flowing between the electrode pair 60 is relatively large, the control circuit 250 sets the output voltage value of the second generation circuit 20 to the voltage in the state B. The second generation circuit 20 is controlled so as to be about the value.
　以上のように、本実施の形態に係るプラズマ放電装置２００においては、制限回路２４０は、パルス生成回路２０２の出力電流に応じて出力電圧を制御する。 As described above, in plasma discharge device 200 according to the present embodiment, limiting circuit 240 controls the output voltage according to the output current of pulse generation circuit 202.
　これにより、電極対６０間における放電状態を所望の状態とすることができる。また、放電プラズマ中に有機物が入って出力電流が増大した場合に、出力電圧を低下させることによって、電極対６０間に過大な電流が継続的に流れることを抑制できる。したがって、電極対６０が損傷することを抑制でき、かつ、プラズマ放電装置２００の消費電力を抑制できる。さらに、本実施の形態では、制限回路２４０において、抵抗素子を用いる必要がないため、実施の形態１に係るプラズマ放電装置１００と比較して、消費電力をより低減できる。 Thereby, the discharge state between the electrode pair 60 can be set to a desired state. In addition, when an organic substance enters the discharge plasma and the output current increases, it is possible to suppress an excessive current from continuously flowing between the electrode pair 60 by reducing the output voltage. Therefore, the electrode pair 60 can be prevented from being damaged, and the power consumption of the plasma discharge device 200 can be suppressed. Further, in the present embodiment, since it is not necessary to use a resistance element in limiting circuit 240, power consumption can be further reduced as compared with plasma discharge apparatus 100 according to the first embodiment.
　（実施の形態３）
　実施の形態３に係るプラズマ放電装置について説明する。本実施の形態に係るプラズマ放電装置は、主に放電部が複数の電極対を有する点において、実施の形態１に係るプラズマ放電装置１００と相違する。以下、本実施の形態に係るプラズマ放電装置について、実施の形態１に係るプラズマ放電装置１００との相違点を中心に説明する。 (Embodiment 3)
A plasma discharge apparatus according to Embodiment 3 will be described. The plasma discharge apparatus according to the present embodiment is different from plasma discharge apparatus 100 according to the first embodiment in that the discharge unit mainly includes a plurality of electrode pairs. Hereinafter, the plasma discharge apparatus according to the present embodiment will be described focusing on differences from the plasma discharge apparatus 100 according to the first embodiment.
　［３－１．全体構成］
　まず、実施の形態３に係るプラズマ放電装置の全体構成について図面を用いて説明する。 [3-1. overall structure]
First, the overall configuration of the plasma discharge apparatus according to Embodiment 3 will be described with reference to the drawings.
　図８は、実施の形態３に係るプラズマ放電装置３００の全体構成の概要を示すブロック図である。 FIG. 8 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus 300 according to the third embodiment.
　図８に示されるように、本実施の形態に係るプラズマ放電装置３００は、放電部３０６と、パルス生成回路３０２とを備える。 As shown in FIG. 8, the plasma discharge apparatus 300 according to the present embodiment includes a discharge unit 306 and a pulse generation circuit 302.
　放電部３０６は、複数の電極対６０ａ～６０ｄを有する。本実施の形態では、放電部３０６は四つの電極対６０ａ～６０ｄを有する。電極対６０ａ～６０ｄは、それぞれ、第一電極６１ａ～６１ｄ及び第二電極６２ａ～６２ｄからなる。電極対６０ａ～６０ｄの各々は、空気６８で互いに絶縁されている。つまり、第一電極６１ａ～６１ｄと第二電極６２ａ～６２ｄとの間は、それぞれ空気６８で絶縁されている。本実施の形態では、第一電極６１ａ～６１ｄにはパルス生成回路３０２の出力電圧が印加され、第二電極６２ａ～６２ｄは接地される。また、電極対６０ａ～６０ｄの各々を絶縁する空気６８の圧力は大気圧である。 The discharge unit 306 has a plurality of electrode pairs 60a to 60d. In the present embodiment, the discharge unit 306 has four electrode pairs 60a to 60d. The electrode pairs 60a to 60d are composed of first electrodes 61a to 61d and second electrodes 62a to 62d, respectively. Each of the electrode pairs 60 a to 60 d is insulated from each other by air 68. That is, the first electrodes 61a to 61d and the second electrodes 62a to 62d are insulated by the air 68, respectively. In the present embodiment, the output voltage of the pulse generation circuit 302 is applied to the first electrodes 61a to 61d, and the second electrodes 62a to 62d are grounded. The pressure of the air 68 that insulates each of the electrode pairs 60a to 60d is atmospheric pressure.
　パルス生成回路３０２は、電極対６０ａ～６０ｄに印加する電圧パルスを生成する回路である。パルス生成回路３０２が生成する電圧パルスは、電極対６０ａ～６０ｄの各々の電極対間において放電を開始させる高電圧パルスと、高電圧パルスに続いて電極対６０ａ～６０ｄに印加され、高電圧パルスより電圧値が低い低電圧パルスとを含む。また、パルス生成回路３０２は、低電圧パルスを電極対６０ａ～６０ｄに印加する際に出力する出力電流及び出力電圧を制限する制限回路４０を有する。 The pulse generation circuit 302 is a circuit that generates voltage pulses to be applied to the electrode pairs 60a to 60d. The voltage pulse generated by the pulse generation circuit 302 is applied to the electrode pair 60a to 60d following the high voltage pulse for starting discharge between the electrode pairs 60a to 60d, and the high voltage pulse. And a low voltage pulse having a lower voltage value. Further, the pulse generation circuit 302 includes a limiting circuit 40 that limits an output current and an output voltage that are output when a low voltage pulse is applied to the electrode pairs 60a to 60d.
　本実施の形態では、パルス生成回路３０２は、電圧生成回路３０４と、切替回路３０８とを備える。 In the present embodiment, the pulse generation circuit 302 includes a voltage generation circuit 304 and a switching circuit 308.
　電圧生成回路３０４は、上述した制限回路４０と、第一生成回路１０と、第二生成回路２０と、合波回路３０とを備える。第一生成回路１０は、上記高電圧パルスに対応するパルス状の第一電圧を生成する回路である。第二生成回路２０は、上記低電圧パルスに対応する直流電圧である第二電圧を生成する回路である。合波回路３０は、第一電圧と第二電圧とを合波して、電圧波を出力する回路である。 The voltage generation circuit 304 includes the limiting circuit 40, the first generation circuit 10, the second generation circuit 20, and the multiplexing circuit 30 described above. The first generation circuit 10 is a circuit that generates a pulsed first voltage corresponding to the high voltage pulse. The second generation circuit 20 is a circuit that generates a second voltage that is a DC voltage corresponding to the low voltage pulse. The multiplexing circuit 30 is a circuit that combines the first voltage and the second voltage and outputs a voltage wave.
　切替回路３０８は、合波回路３０から電圧波が入力され、電圧波を電極対６０ａ～６０ｄに順次出力することにより、電極対６０ａ～６０ｄの各々に上記電圧パルスを供給する回路である。本実施の形態では、切替回路３０８は、四つのスイッチング素子８１ａ～８１ｄを備える。切替回路３０８に入力された電圧波は、スイッチング素子８１ａ～８１ｄに入力される。また、スイッチング素子８１ａ～８１ｄは、それぞれ、電極対６０ａ～６０ｄに接続される。これにより、スイッチング素子８１ａ～８１ｄのうち導通状態とされたものに接続された電極対に電圧パルスが印加される。なお、スイッチング素子８１ａ～８１ｄとしては、例えば、ＭＯＳＦＥＴ（Ｍｅｔａｌ－Ｏｘｉｄｅ　Ｓｅｍｉｃｏｎｄｕｃｔｏｒ　Ｆｉｅｌｄ－Ｅｆｆｅｃｔ　Ｔｒａｎｓｉｓｔｏｒ）を用いることができる。また、スイッチング素子８１ａ～８１ｄは、図示されていない駆動回路からの信号によって制御される。当該駆動回路は、例えば、プロセッサ及びメモリを備えるＩＣ（Ｉｎｔｅｇｒａｔｅｄ　Ｃｉｒｃｕｉｔ）チップなどを用いて実現できる。 The switching circuit 308 is a circuit that supplies the voltage pulse to each of the electrode pairs 60a to 60d by sequentially inputting the voltage wave from the multiplexing circuit 30 and outputting the voltage wave to the electrode pairs 60a to 60d. In the present embodiment, the switching circuit 308 includes four switching elements 81a to 81d. The voltage wave input to the switching circuit 308 is input to the switching elements 81a to 81d. The switching elements 81a to 81d are connected to the electrode pairs 60a to 60d, respectively. Thus, a voltage pulse is applied to the electrode pair connected to the switching elements 81a to 81d that are in the conductive state. As the switching elements 81a to 81d, for example, MOSFETs (Metal-Oxide Semiconductor Field-Effect Transistors) can be used. The switching elements 81a to 81d are controlled by signals from a drive circuit (not shown). The drive circuit can be realized by using, for example, an IC (Integrated Circuit) chip including a processor and a memory.
　続いて、本実施の形態に係るパルス生成回路３０２の詳細構成について図面を用いて説明する。 Subsequently, a detailed configuration of the pulse generation circuit 302 according to the present embodiment will be described with reference to the drawings.
　図９は、本実施の形態に係るプラズマ放電装置３００の詳細構成を示す回路図である。 FIG. 9 is a circuit diagram showing a detailed configuration of plasma discharge apparatus 300 according to the present embodiment.
　図９に示されるように本実施の形態に係るプラズマ放電装置３００は、第一生成回路１０及び第二生成回路２０を制御する制御回路３５０を備える。 As shown in FIG. 9, the plasma discharge apparatus 300 according to the present embodiment includes a control circuit 350 that controls the first generation circuit 10 and the second generation circuit 20.
　また、本実施の形態では、制限回路４０は抵抗素子である。制限回路４０を構成する抵抗素子の抵抗値は、第二生成回路２０から出力される出力電圧の値などに基づいて適宜設計されればよい。本実施の形態では、抵抗素子の抵抗値は、２ｋΩ以上３ｋΩ以下程度である。 Further, in the present embodiment, the limiting circuit 40 is a resistance element. The resistance value of the resistance element that constitutes the limiting circuit 40 may be appropriately designed based on the value of the output voltage output from the second generation circuit 20 or the like. In the present embodiment, the resistance value of the resistance element is about 2 kΩ to 3 kΩ.
　本実施の形態では、合波回路３０は、第一コイル３１及び第二コイル３２を備えるトランスである。合波回路３０を構成する各コイルの巻数比は、第一生成回路１０及び第二生成回路２０からそれぞれ出力される出力電圧の値などに基づいて適宜設定されればよい。本実施の形態では、第一コイル３１と第二コイル３２との巻数比は、１：１５である。 In this embodiment, the multiplexing circuit 30 is a transformer including a first coil 31 and a second coil 32. The turn ratio of each coil constituting the multiplexing circuit 30 may be set as appropriate based on the value of the output voltage output from each of the first generation circuit 10 and the second generation circuit 20. In the present embodiment, the turns ratio of the first coil 31 and the second coil 32 is 1:15.
　第一生成回路１０及び第二生成回路２０は、それぞれ実施の形態１に係る第一生成回路１０及び第二生成回路２０と同様の構成を有する。本実施の形態では、第二生成回路２０の出力電圧は、制限回路４０、合波回路３０、切替回路３０８及び放電部３０６からなる直列回路に印加される。 The first generation circuit 10 and the second generation circuit 20 have the same configuration as the first generation circuit 10 and the second generation circuit 20 according to the first embodiment, respectively. In the present embodiment, the output voltage of the second generation circuit 20 is applied to a series circuit including the limiting circuit 40, the multiplexing circuit 30, the switching circuit 308, and the discharging unit 306.
　制御回路３５０は、第一生成回路１０及び第二生成回路２０を制御する回路である。制御回路３５０は、第一スイッチング素子１１の導通及び非導通の切り替えタイミングを制御することにより、第一生成回路１０から出力される第一電圧のパルス幅、及び、出力タイミングを制御する。また、制御回路３５０は、第二スイッチング素子２１～２４の各々の導通及び非導通の切り替えタイミングを制御することにより、第二生成回路２０から出力される第二電圧の電圧値を制御する。本実施の形態では、制御回路３５０は、第二生成回路２０から直流電圧が出力されるように、第二スイッチング素子２１～２４を制御する。制御回路３５０は、例えば、プロセッサ及びメモリを備えるＩＣチップなどを用いて実現できる。 The control circuit 350 is a circuit that controls the first generation circuit 10 and the second generation circuit 20. The control circuit 350 controls the pulse width of the first voltage output from the first generation circuit 10 and the output timing by controlling the switching timing of conduction and non-conduction of the first switching element 11. In addition, the control circuit 350 controls the voltage value of the second voltage output from the second generation circuit 20 by controlling the switching timing of the conduction and non-conduction of each of the second switching elements 21 to 24. In the present embodiment, the control circuit 350 controls the second switching elements 21 to 24 so that a DC voltage is output from the second generation circuit 20. The control circuit 350 can be realized using, for example, an IC chip including a processor and a memory.
　［３－２．電圧パルス］
　本実施の形態に係るパルス生成回路３０２が生成する電圧パルスについて図面を用いて説明する。 [3-2. Voltage pulse]
A voltage pulse generated by the pulse generation circuit 302 according to this embodiment will be described with reference to the drawings.
　図１０は、本実施の形態に係るパルス生成回路３０２において生成される電圧パルスのパルス波形を示すグラフである。図１０のグラフ（ａ）及び（ｂ）は、それぞれ、第一生成回路１０から出力される第一電圧Ｖ１、及び、第二生成回路２０から出力される第二電圧Ｖ２の波形を示す。また、図１０のグラフ（ｃ１）～（ｃ４）は、それぞれ、スイッチング素子８１ａ～８１ｄの時間に対する導通状態の関係を示すグラフである。図１０のグラフ（ｄ１）～（ｄ４）は、それぞれ、電極対６０ａ～６０ｄに印加される電圧パルスＰ０の波形を示すグラフである。 FIG. 10 is a graph showing a pulse waveform of a voltage pulse generated in the pulse generation circuit 302 according to the present embodiment. Graphs (a) and (b) in FIG. 10 show waveforms of the first voltage V1 output from the first generation circuit 10 and the second voltage V2 output from the second generation circuit 20, respectively. Also, graphs (c1) to (c4) in FIG. 10 are graphs showing the relationship of the conduction state with respect to the time of the switching elements 81a to 81d, respectively. Graphs (d1) to (d4) in FIG. 10 are graphs showing waveforms of the voltage pulse P0 applied to the electrode pairs 60a to 60d, respectively.
　図１０のグラフ（ｄ１）～（ｄ４）に示されるように、パルス生成回路３０２から出力される電圧パルスＰ０は、高電圧パルスＰＨと低電圧パルスＰＬとからなる。 As shown in the graphs (d1) to (d4) of FIG. 10, the voltage pulse P0 output from the pulse generation circuit 302 includes a high voltage pulse PH and a low voltage pulse PL.
　図１０のグラフ（ａ）に示されるように、第一生成回路１０は、電圧パルスＰ０の高電圧パルスＰＨに対応する第一電圧Ｖ１を出力する。本実施の形態では、第一電圧Ｖ１のパルス幅Ｔ１は５００ｎｓｅｃ程度である。また、図１０のグラフ（ｂ）に示されるように、第二生成回路２０は、電圧パルスＰ０の低電圧パルスＰＬに対応する直流電圧である第二電圧Ｖ２を生成する。 As shown in the graph (a) of FIG. 10, the first generation circuit 10 outputs the first voltage V1 corresponding to the high voltage pulse PH of the voltage pulse P0. In the present embodiment, the pulse width T1 of the first voltage V1 is about 500 nsec. Further, as shown in the graph (b) of FIG. 10, the second generation circuit 20 generates a second voltage V2 that is a DC voltage corresponding to the low voltage pulse PL of the voltage pulse P0.
　第一電圧Ｖ１は、合波回路３０において、電圧値が１ｋＶから１５ｋＶ程度まで昇圧されて、第二電圧Ｖ２と合波される。これにより合波回路３０において電圧波が生成される。このように電圧生成回路３０４において、電圧波が生成され、切替回路３０８に入力される。 The first voltage V1 is boosted in the multiplexing circuit 30 from a voltage value of about 1 kV to about 15 kV and is combined with the second voltage V2. As a result, a voltage wave is generated in the multiplexing circuit 30. In this way, the voltage generation circuit 304 generates a voltage wave and inputs it to the switching circuit 308.
　切替回路３０８においては、図１０のグラフ（ｃ１）～（ｃ４）に示されるように、スイッチング素子８１ａ～８１ｄが順次導通状態とされる。これにより、スイッチング素子８１ａ～８１ｄにそれぞれ接続された電極対６０ａ～６０ｄに図１０のグラフ（ｄ１）～（ｄ４）に示されるような電圧パルスＰ０が印加される。 In the switching circuit 308, as shown in the graphs (c1) to (c4) of FIG. 10, the switching elements 81a to 81d are sequentially turned on. As a result, the voltage pulse P0 as shown in the graphs (d1) to (d4) of FIG. 10 is applied to the electrode pairs 60a to 60d connected to the switching elements 81a to 81d, respectively.
　電圧パルスＰ０のパルス幅Ｔ０（つまり、各スイッチング素子の導通持続期間）は、特に限定されないが、例えば、１０μｓｅｃ程度である。この場合、各電極対における電圧パルスＰ０の繰り返しの周波数は、２５ｋＨｚ程度である。 The pulse width T0 of the voltage pulse P0 (that is, the conduction duration of each switching element) is not particularly limited, but is, for example, about 10 μsec. In this case, the repetition frequency of the voltage pulse P0 in each electrode pair is about 25 kHz.
　以上のように、本実施の形態に係るパルス生成回路３０２において電圧パルスＰ０を生成できる。本実施の形態では、低電圧パルスＰＬに対応する電圧として、直流電圧である第二電圧Ｖ２を用い、切替回路３０８において第二電圧Ｖ２をパルス化している。このため、第二生成回路２０においてパルス電圧を生成する必要がないため、第二生成回路２０の構成を簡素化することができる。 As described above, the voltage pulse P0 can be generated in the pulse generation circuit 302 according to the present embodiment. In the present embodiment, the second voltage V2 that is a DC voltage is used as the voltage corresponding to the low voltage pulse PL, and the second voltage V2 is pulsed in the switching circuit 308. For this reason, since it is not necessary to generate a pulse voltage in the second generation circuit 20, the configuration of the second generation circuit 20 can be simplified.
　［３－３．動作］
　本実施の形態に係るプラズマ放電装置３００の動作についても、実施の形態１に係るプラズマ放電装置１００と同様に動作する。本実施の形態では、各電極対間に存在する有機物はアーク放電によって生成された熱プラズマによって、例えば０．４秒以下程度の極めて短時間で燃焼されて消滅する。 [3-3. Operation]
The operation of plasma discharge apparatus 300 according to the present embodiment also operates in the same manner as plasma discharge apparatus 100 according to Embodiment 1. In the present embodiment, the organic matter existing between each pair of electrodes is burned and extinguished by an extremely short time of, for example, about 0.4 seconds or less by thermal plasma generated by arc discharge.
　このように、本実施の形態に係るプラズマ放電装置３００によれば、空気６８中の花粉などの有機物を極めて短時間で消滅させることができる。また、本実施の形態では、空気６８は、大気圧でよいため、大気中の空気を、圧力調整することなく、そのまま電極対間に導入することができる。このため、空気中の花粉などの有機物を容易に消滅させることができる。 Thus, according to the plasma discharge apparatus 300 according to the present embodiment, organic substances such as pollen in the air 68 can be extinguished in a very short time. In the present embodiment, since the air 68 may be atmospheric pressure, air in the atmosphere can be directly introduced between the electrode pairs without adjusting the pressure. For this reason, organic substances, such as pollen in the air, can be easily extinguished.
　［３－４．まとめ］
　以上のように、本実施の形態に係るプラズマ放電装置３００は、複数の電極対６０ａ～６０ｄを有する放電部３０６と、複数の電極対６０ａ～６０ｄの各々に順次印加する電圧パルスＰ０を生成するパルス生成回路３０２とを備え、電圧パルスＰ０は、複数の電極対６０ａ～６０ｄの各々の電極対間において放電を開始させる高電圧パルスＰＨと、高電圧パルスＰＨに続いて印加され高電圧パルスＰＨより電圧値が低い低電圧パルスＰＬとを含み、複数の電極対６０ａ～６０ｄの各々は、空気６８で互いに絶縁され、パルス生成回路３０２は、低電圧パルスＰＬを複数の電極対６０ａ～６０ｄの各々に印加する際に出力する出力電流及び出力電圧を制限する制限回路４０を有する。 [3-4. Summary]
As described above, plasma discharge apparatus 300 according to the present embodiment generates discharge unit 306 having a plurality of electrode pairs 60a to 60d and voltage pulse P0 to be sequentially applied to each of the plurality of electrode pairs 60a to 60d. A voltage generation circuit 302, and the voltage pulse P0 is applied subsequent to the high voltage pulse PH for starting discharge between each of the electrode pairs 60a to 60d and the high voltage pulse PH. Each of the plurality of electrode pairs 60a to 60d is insulated from each other by air 68, and the pulse generation circuit 302 transmits the low voltage pulse PL to the plurality of electrode pairs 60a to 60d. It has a limiting circuit 40 that limits the output current and the output voltage that are output when applied to each.
　これにより、まず、高電圧パルスによって各電極対間の空気６８による絶縁を破壊した後、続いて電極対６０ａ～６０ｄに印加される低電圧パルスによって放電を維持できる。ここで、低電圧パルスの電圧値を所定の値に設定することにより、各電極対間においてグロー放電を維持できる。グロー放電によって生成される低温プラズマ内に、空気６８中の花粉などの有機物が入ることで、電極対間の抵抗が低減する。これに伴い各電極対間に流れる電流が上昇し、かつ、各電極対間の電圧が低下する。このため、各電極対間の放電をグロー放電から、より電流量の大きいアーク放電に遷移させることができる。アーク放電によって生成される熱プラズマにおいては、花粉などの有機物は、極めて短時間で燃焼して消滅する。このように、本実施の形態に係るプラズマ放電装置３００においては、空気中の花粉などの有機物を極めて短時間で燃焼して消滅させることができる。 Thereby, first, the insulation by the air 68 between each electrode pair is broken by the high voltage pulse, and then the discharge can be maintained by the low voltage pulse applied to the electrode pairs 60a to 60d. Here, glow discharge can be maintained between each electrode pair by setting the voltage value of the low voltage pulse to a predetermined value. The organic substance such as pollen in the air 68 enters the low temperature plasma generated by the glow discharge, thereby reducing the resistance between the electrode pair. Along with this, the current flowing between the electrode pairs increases, and the voltage between the electrode pairs decreases. For this reason, the discharge between each electrode pair can be transitioned from glow discharge to arc discharge with a larger amount of current. In the thermal plasma generated by arc discharge, organic substances such as pollen burn and disappear in a very short time. Thus, in the plasma discharge apparatus 300 according to the present embodiment, organic substances such as pollen in the air can be burned and extinguished in a very short time.
　また、本実施の形態に係るプラズマ放電装置３００は、低電圧パルスを各電極対間に印加する際に出力する出力電流及び出力電圧を制限する制限回路４０を有するため、各電極対間に過大な電流が発生することを抑制できる。したがって、例えば各電極対間に有機物が入ることに伴ってアーク放電が発生した場合でも、有機物が消滅した後には、各電極対間の放電をアーク放電から、例えば、グロー放電に遷移させることができる。このため、電極対６０ａ～６０ｄがアーク放電によって損傷することを抑制でき、かつ、プラズマ放電装置３００の消費電力を抑制できる。 In addition, since the plasma discharge apparatus 300 according to the present embodiment includes the limiting circuit 40 that limits the output current and the output voltage that are output when a low voltage pulse is applied between each electrode pair, the plasma discharge apparatus 300 is excessively large between each electrode pair. Generation of a large current can be suppressed. Therefore, for example, even when an arc discharge occurs due to an organic substance entering between each electrode pair, after the organic substance disappears, the discharge between each electrode pair can be changed from an arc discharge to, for example, a glow discharge. it can. Therefore, it is possible to suppress the electrode pairs 60a to 60d from being damaged by the arc discharge, and to suppress the power consumption of the plasma discharge device 300.
　さらに本実施の形態に係るプラズマ放電装置３００においては、複数の電極対６０ａ～６０ｄを備えるため、より多くの容積の空気６８における有機物を短時間で消滅させることができる。 Furthermore, since the plasma discharge apparatus 300 according to the present embodiment includes a plurality of electrode pairs 60a to 60d, organic substances in a larger volume of air 68 can be extinguished in a short time.
　また、本実施の形態に係るプラズマ放電装置３００において、パルス生成回路３０２は、高電圧パルスＰＨに対応するパルス状の第一電圧Ｖ１を生成する第一生成回路１０と、低電圧パルスＰＬに対応する直流電圧である第二電圧Ｖ２を生成する第二生成回路２０と、第一電圧Ｖ１と第二電圧Ｖ２とを合波して、電圧波を出力する合波回路３０と、電圧波が入力され、電圧波を電極対６０ａ～６０ｄに順次出力することにより、電極対６０ａ～６０ｄの各々に電圧パルスＰ０を供給する切替回路３０８とを備えてもよい。 In the plasma discharge apparatus 300 according to the present embodiment, the pulse generation circuit 302 corresponds to the first generation circuit 10 that generates the pulsed first voltage V1 corresponding to the high voltage pulse PH and the low voltage pulse PL. A second generation circuit 20 that generates a second voltage V2 that is a direct-current voltage, a combination circuit 30 that combines the first voltage V1 and the second voltage V2 and outputs a voltage wave, and the voltage wave is input A switching circuit 308 that supplies voltage pulses P0 to each of the electrode pairs 60a to 60d by sequentially outputting voltage waves to the electrode pairs 60a to 60d may be provided.
　これにより、パルス生成回路３０２を簡素化された構成で実現することができる。 Thereby, the pulse generation circuit 302 can be realized with a simplified configuration.
　また、本実施の形態に係るプラズマ放電装置３００において、空気６８の圧力は大気圧であってもよい。 Further, in the plasma discharge apparatus 300 according to the present embodiment, the pressure of the air 68 may be atmospheric pressure.
　これにより、例えば、大気中の空気を、圧力調整することなく、そのまま各電極対間に導入することができる。このため、空気中の花粉などの有機物を容易に消滅させることができる。 Thereby, for example, air in the atmosphere can be introduced as it is between each electrode pair without adjusting the pressure. For this reason, organic substances, such as pollen in the air, can be easily extinguished.
　また、本実施の形態に係るプラズマ放電装置３００において、電極対６０ａ～６０ｄにおいて、低電圧パルスＰＬの印加によってグロー放電が生成されてもよい。 In the plasma discharge apparatus 300 according to the present embodiment, glow discharge may be generated by applying the low voltage pulse PL in the electrode pairs 60a to 60d.
　これにより、放電時に各電極対間における温度上昇を抑制できる。また、放電プラズマ中に花粉などの有機物が入った場合には、アーク放電に遷移することにより、極めて短時間で当該有機物を燃焼して消滅させることができる。また、アーク放電が継続する時間は極めて短いため、放電プラズマ内に有機物が入った場合の各電極対間における温度上昇を抑制できる。 This makes it possible to suppress the temperature rise between each electrode pair during discharge. Moreover, when organic substances, such as pollen, are contained in the discharge plasma, the organic substances can be burned and extinguished in an extremely short time by transitioning to arc discharge. Further, since the arc discharge continues for a very short time, it is possible to suppress an increase in temperature between each electrode pair when an organic substance enters the discharge plasma.
　また、本実施の形態に係るプラズマ放電装置３００において、制限回路４０は、抵抗素子であってもよい。 In the plasma discharge apparatus 300 according to the present embodiment, the limiting circuit 40 may be a resistance element.
　これにより、容易に、かつ、安価で制限回路４０を実現することができる。 Thereby, the limiting circuit 40 can be realized easily and inexpensively.
　（実施の形態４）
　実施の形態４に係るプラズマ放電装置について説明する。本実施の形態に係るプラズマ放電装置は、主に制限回路の構成において、実施の形態３に係るプラズマ放電装置３００と相違する。以下、本実施の形態に係るプラズマ放電装置について、実施の形態３に係るプラズマ放電装置３００との相違点を中心に説明する。 (Embodiment 4)
A plasma discharge apparatus according to Embodiment 4 will be described. The plasma discharge apparatus according to the present embodiment is different from the plasma discharge apparatus 300 according to the third embodiment mainly in the configuration of the limiting circuit. Hereinafter, the plasma discharge apparatus according to the present embodiment will be described focusing on differences from the plasma discharge apparatus 300 according to the third embodiment.
　本実施の形態に係るプラズマ放電装置の全体構成について図面を用いて説明する。 The overall configuration of the plasma discharge apparatus according to the present embodiment will be described with reference to the drawings.
　図１１は、本実施の形態に係るプラズマ放電装置４００の全体構成の概要を示すブロック図である。図１２は、本実施の形態に係るプラズマ放電装置４００の詳細構成を示す回路図である。 FIG. 11 is a block diagram showing an outline of the overall configuration of the plasma discharge apparatus 400 according to the present embodiment. FIG. 12 is a circuit diagram showing a detailed configuration of plasma discharge apparatus 400 according to the present embodiment.
　図１１に示されるように、本実施の形態に係るプラズマ放電装置４００は、放電部６と、パルス生成回路４０２とを備える。 As shown in FIG. 11, the plasma discharge apparatus 400 according to the present embodiment includes a discharge unit 6 and a pulse generation circuit 402.
　本実施の形態に係るパルス生成回路４０２は、電圧生成回路４０４と、切替回路８とを備える。 The pulse generation circuit 402 according to this embodiment includes a voltage generation circuit 404 and a switching circuit 8.
　電圧生成回路４０４は、第一生成回路１０と、第二生成回路２０と、合波回路３０と、制限回路２４０とを有する。 The voltage generation circuit 404 includes a first generation circuit 10, a second generation circuit 20, a multiplexing circuit 30, and a limiting circuit 240.
　本実施の形態に係るプラズマ放電装置４００では、制限回路２４０は、パルス生成回路４０２の出力電流に応じて出力電圧を制御する回路であり、図１２に示される電流検出回路２４１及び制御回路４５０を備える。 In the plasma discharge apparatus 400 according to the present embodiment, the limiting circuit 240 is a circuit that controls the output voltage in accordance with the output current of the pulse generation circuit 402. The current detection circuit 241 and the control circuit 450 shown in FIG. Prepare.
　電流検出回路２４１は、パルス生成回路４０２の出力電流に対応する信号を出力する回路である。電流検出回路２４１としては、例えばホール素子などを用いることができる。 The current detection circuit 241 is a circuit that outputs a signal corresponding to the output current of the pulse generation circuit 402. As the current detection circuit 241, for example, a Hall element can be used.
　制御回路４５０は、実施の形態３に係る制御回路３５０と同様に、第一生成回路１０及び第二生成回路２０を制御する回路である。ただし、本実施の形態に係る制御回路４５０は、電流検出回路２４１からの信号に基づいて、第二生成回路２０の出力電圧を制御する。制御回路４５０は、例えば、第二生成回路２０の第二スイッチング素子２１～２４の導通期間の割合（デューティ）を制御することによって、第二生成回路２０の出力電圧を制御する。より具体的には、例えば、制御回路４５０は、各電極対間における放電状態が図５に示される状態Ａ及び状態Ｂの一方となるように、第二生成回路２０の出力電圧を制御してもよい。例えば、各電極対間に花粉などの有機物が存在しない場合、つまり、各電極対間に流れる電流の値が比較的小さい場合には、制御回路４５０は第二生成回路２０の出力電圧値が状態Ａにおける電圧値程度となるように第二生成回路２０を制御する。一方、各電極対間に有機物が存在する場合、つまり、各電極対間に流れる電流の値が比較的大きい場合には、制御回路４５０は第二生成回路２０の出力電圧値が状態Ｂにおける電圧値程度となるように第二生成回路２０を制御する。 The control circuit 450 is a circuit that controls the first generation circuit 10 and the second generation circuit 20 similarly to the control circuit 350 according to the third embodiment. However, the control circuit 450 according to the present embodiment controls the output voltage of the second generation circuit 20 based on the signal from the current detection circuit 241. For example, the control circuit 450 controls the output voltage of the second generation circuit 20 by controlling the ratio (duty) of the conduction period of the second switching elements 21 to 24 of the second generation circuit 20. More specifically, for example, the control circuit 450 controls the output voltage of the second generation circuit 20 so that the discharge state between each electrode pair is one of the state A and the state B shown in FIG. Also good. For example, when there is no pollen or other organic substance between each electrode pair, that is, when the value of the current flowing between each electrode pair is relatively small, the control circuit 450 determines that the output voltage value of the second generation circuit 20 is in the state. The second generation circuit 20 is controlled so as to be about the voltage value at A. On the other hand, when an organic substance is present between each electrode pair, that is, when the value of the current flowing between each electrode pair is relatively large, the control circuit 450 determines that the output voltage value of the second generation circuit 20 is the voltage in the state B. The second generation circuit 20 is controlled so as to be about the value.
　以上のように、本実施の形態に係るプラズマ放電装置４００においては、制限回路２４０は、パルス生成回路４０２の出力電流に応じて出力電圧を制御する。 As described above, in plasma discharge device 400 according to the present embodiment, limiting circuit 240 controls the output voltage according to the output current of pulse generation circuit 402.
　これにより、各電極対間における放電状態を所望の状態とすることができる。また、放電プラズマ中に有機物が入って出力電流が増大した場合に、出力電圧を低下させることによって、各電極対間に過大な電流が継続的に流れることを抑制できる。したがって、電極対６０ａ～６０ｄが損傷することを抑制でき、かつ、プラズマ放電装置４００の消費電力を抑制できる。さらに、本実施の形態では、制限回路２４０において、抵抗素子を用いる必要がないため、実施の形態３に係るプラズマ放電装置３００と比較して、消費電力をより低減できる。 Thereby, the discharge state between each electrode pair can be set to a desired state. Moreover, when an organic substance enters into the discharge plasma and the output current increases, it is possible to suppress an excessive current from continuously flowing between each electrode pair by reducing the output voltage. Therefore, damage to the electrode pairs 60a to 60d can be suppressed, and power consumption of the plasma discharge device 400 can be suppressed. Further, in the present embodiment, since it is not necessary to use a resistance element in limiting circuit 240, power consumption can be further reduced as compared with plasma discharge apparatus 300 according to Embodiment 3.
　（変形例など）
　以上、本発明に係るプラズマ放電装置について、各実施の形態に基づいて説明したが、本発明は、上記各実施の形態に限定されるものではない。 (Variations, etc.)
As described above, the plasma discharge apparatus according to the present invention has been described based on each embodiment, but the present invention is not limited to each of the above embodiments.
　例えば、本発明の一態様は、図１３に示すような空気清浄機としても実現することができる。図１３は、本変形例に係る空気清浄機の外観図である。図１３に示す空気清浄機は、例えば、内部に上記各実施の形態に係るプラズマ放電装置を備え、空気６８中の有機物を消滅させる。このような空気清浄機においては、フィルタによって有機物を除去する必要がないため、フィルタのメンテナンス作業を軽減できる。 For example, one embodiment of the present invention can be realized as an air cleaner as shown in FIG. FIG. 13 is an external view of an air cleaner according to this modification. The air cleaner shown in FIG. 13 includes, for example, the plasma discharge device according to each of the above embodiments inside, and extinguishes organic substances in the air 68. In such an air purifier, since it is not necessary to remove organic substances by the filter, the maintenance work of the filter can be reduced.
　また、本発明の一態様は、図１４に示すようなエアコンディショナとしても実現することができる。図１４は、本変形例に係るエアコンディショナの外観図である。図１４に示すエアコンディショナは、例えば、内部に上記各実施の形態に係るプラズマ放電装置を備え、空気６８中の有機物を消滅させる。このようなエアコンディショナにおいては、フィルタによって有機物を除去する必要がないため、フィルタのメンテナンス作業を軽減できる。 Also, one embodiment of the present invention can be realized as an air conditioner as shown in FIG. FIG. 14 is an external view of an air conditioner according to this modification. The air conditioner shown in FIG. 14 includes, for example, the plasma discharge device according to each of the above embodiments inside, and extinguishes organic substances in the air 68. In such an air conditioner, it is not necessary to remove organic substances with a filter, so that the maintenance work of the filter can be reduced.
　また、上記実施の形態２に係る制御回路２５０において、第二生成回路２０の第二直流電源２５の出力電圧を制御することによって、第二生成回路２０の出力電圧を制御してもよい。上記実施の形態４に係る制御回路４５０についても同様である。 In the control circuit 250 according to the second embodiment, the output voltage of the second generation circuit 20 may be controlled by controlling the output voltage of the second DC power supply 25 of the second generation circuit 20. The same applies to the control circuit 450 according to the fourth embodiment.
　また、上記実施の形態３において、直流電源のみで構成された第二生成回路を用いてもよい。これにより、プラズマ放電装置の構成をさらに簡素化することができる。 Further, in the third embodiment, a second generation circuit configured only with a DC power supply may be used. Thereby, the configuration of the plasma discharge apparatus can be further simplified.
　また、上記各実施の形態に係る制御回路は、専用のハードウェアで構成されてもよく、あるいは、制御回路に適したソフトウェアプログラムを実行することによって実現されてもよい。制御回路は、ＣＰＵまたはプロセッサなどのプログラム実行部が、ハードディスクまたはメモリなどの記録媒体に記録されたソフトウェアプログラムを読み出して実行することによって実現されてもよい。 Further, the control circuit according to each of the above embodiments may be configured by dedicated hardware, or may be realized by executing a software program suitable for the control circuit. The control circuit may be realized by a program execution unit such as a CPU or a processor reading and executing a software program recorded on a recording medium such as a hard disk or a memory.
　その他、各実施の形態に対して当業者が思いつく各種変形を施して得られる形態、又は、本発明の趣旨を逸脱しない範囲で各実施の形態における構成要素及び機能を任意に組み合わせることで実現される形態も本発明に含まれる。 In addition, the present invention can be realized by various combinations conceived by those skilled in the art for each embodiment, or by arbitrarily combining the components and functions in each embodiment without departing from the spirit of the present invention. This form is also included in the present invention.
２、２０２、３０２、４０２　パルス生成回路
６、３０６　放電部
１０　第一生成回路
２０　第二生成回路
３０　合波回路
４０、２４０　制限回路
６０、６０ａ、６０ｂ、６０ｃ、６０ｄ　電極対
６８　空気
１００、２００、３００、４００　プラズマ放電装置
３０８　切替回路
Ｐ０、Ｐ０１　電圧パルス
ＰＨ、ＰＨ１　高電圧パルス
ＰＬ、ＰＬ１　低電圧パルス
Ｐ１　第一パルス
Ｐ２　第二パルス
Ｖ１　第一電圧
Ｖ２　第二電圧 2, 202, 302, 402 Pulse generation circuit 6, 306 Discharge unit 10 First generation circuit 20 Second generation circuit 30 Multiplexing circuit 40, 240 Limiting circuit 60, 60a, 60b, 60c, 60d Electrode pair 68 Air 100, 200 , 300, 400 Plasma discharge device 308 Switching circuit P0, P01 Voltage pulse PH, PH1 High voltage pulse PL, PL1 Low voltage pulse P1 First pulse P2 Second pulse V1 First voltage V2 Second voltage

Claims (10)

  1. 　空気で互いに絶縁された電極対を有する放電部と、
    　前記電極対に印加する電圧パルスを生成するパルス生成回路とを備え、
    　前記電圧パルスは、前記電極対間において放電を開始させる高電圧パルスと、前記高電圧パルスに続いて前記電極対に印加され前記高電圧パルスより電圧値が低い低電圧パルスとを含み、
    　前記パルス生成回路は、前記低電圧パルスを前記電極対に印加する際に出力する出力電流及び出力電圧を制限する制限回路を有する
    　プラズマ放電装置。     A discharge part having an electrode pair insulated from each other by air;
    A pulse generation circuit for generating a voltage pulse to be applied to the electrode pair,
    The voltage pulse includes a high voltage pulse for starting discharge between the electrode pair, and a low voltage pulse applied to the electrode pair following the high voltage pulse and having a voltage value lower than the high voltage pulse,
    The pulse generation circuit includes a limiting circuit that limits an output current and an output voltage that are output when the low voltage pulse is applied to the electrode pair.
  2. 　前記パルス生成回路は、
    　前記高電圧パルスに対応する第一パルスを生成する第一生成回路と、
    　前記低電圧パルスに対応し、前記第一パルスよりパルス幅が大きい第二パルスを生成する第二生成回路と、
    　前記第一パルスと前記第二パルスとを合波して、前記電圧パルスを出力する合波回路とを備える
    　請求項１に記載のプラズマ放電装置。     The pulse generation circuit includes:
    A first generation circuit for generating a first pulse corresponding to the high voltage pulse;
    A second generation circuit for generating a second pulse corresponding to the low voltage pulse and having a larger pulse width than the first pulse;
    The plasma discharge apparatus according to claim 1, further comprising: a multiplexing circuit that multiplexes the first pulse and the second pulse and outputs the voltage pulse.
  3. 　前記電極対間において、前記低電圧パルスの印加によってグロー放電が生成される
    　請求項１又は２に記載のプラズマ放電装置。     The plasma discharge apparatus according to claim 1, wherein glow discharge is generated between the electrode pair by applying the low voltage pulse.
  4. 　複数の電極対を有する放電部と、
    　前記複数の電極対の各々に順次印加する電圧パルスを生成するパルス生成回路とを備え、
    　前記電圧パルスは、前記複数の電極対の各々の電極対間において放電を開始させる高電圧パルスと、前記高電圧パルスに続いて印加され前記高電圧パルスより電圧値が低い低電圧パルスとを含み、
    　前記複数の電極対の各々は、空気で互いに絶縁され、
    　前記パルス生成回路は、前記低電圧パルスを前記複数の電極対の各々に印加する際に出力する出力電流及び出力電圧を制限する制限回路を有する
    　プラズマ放電装置。     A discharge part having a plurality of electrode pairs;
    A pulse generation circuit for generating a voltage pulse to be sequentially applied to each of the plurality of electrode pairs,
    The voltage pulse includes a high voltage pulse for starting discharge between each electrode pair of the plurality of electrode pairs, and a low voltage pulse applied following the high voltage pulse and having a voltage value lower than that of the high voltage pulse. ,
    Each of the plurality of electrode pairs is insulated from each other by air;
    The pulse generation circuit includes a limiting circuit that limits an output current and an output voltage that are output when the low voltage pulse is applied to each of the plurality of electrode pairs.
  5. 　前記パルス生成回路は、
    　前記高電圧パルスに対応するパルス状の第一電圧を生成する第一生成回路と、
    　前記低電圧パルスに対応する直流電圧である第二電圧を生成する第二生成回路と、
    　前記第一電圧と前記第二電圧とを合波して、電圧波を出力する合波回路と、
    　前記電圧波が入力され、前記電圧波を前記複数の電極対に順次出力することにより、前記複数の電極対の各々に前記電圧パルスを供給する切替回路とを備える
    　請求項４に記載のプラズマ放電装置。     The pulse generation circuit includes:
    A first generation circuit for generating a pulsed first voltage corresponding to the high voltage pulse;
    A second generation circuit that generates a second voltage that is a DC voltage corresponding to the low voltage pulse;
    A multiplexing circuit that combines the first voltage and the second voltage and outputs a voltage wave;
    The plasma discharge according to claim 4, further comprising: a switching circuit that receives the voltage wave and sequentially outputs the voltage wave to the plurality of electrode pairs to supply the voltage pulse to each of the plurality of electrode pairs. apparatus.
  6. 　前記複数の電極対において、前記低電圧パルスの印加によってグロー放電が生成される
    　請求項４又は５に記載のプラズマ放電装置。     The plasma discharge apparatus according to claim 4, wherein glow discharge is generated by applying the low voltage pulse in the plurality of electrode pairs.
  7. 　前記空気の圧力は大気圧である
    　請求項１～６のいずれか１項に記載のプラズマ放電装置。     The plasma discharge apparatus according to any one of claims 1 to 6, wherein the pressure of the air is atmospheric pressure.
  8. 　前記制限回路は、抵抗素子である
    　請求項１～７のいずれか１項に記載のプラズマ放電装置。     The plasma discharge apparatus according to any one of claims 1 to 7, wherein the limiting circuit is a resistance element.
  9. 　前記制限回路は、前記パルス生成回路の出力電流に応じて出力電圧を制御する
    　請求項１～７のいずれか１項に記載のプラズマ放電装置。     The plasma discharge apparatus according to any one of claims 1 to 7, wherein the limiting circuit controls an output voltage in accordance with an output current of the pulse generation circuit.
  10. 　請求項１～９のいずか１項に記載のプラズマ放電装置を備え、
    　前記空気中の有機物を消滅させる
    　空気清浄機。     A plasma discharge apparatus according to any one of claims 1 to 9,
    An air cleaner that eliminates organic matter in the air.
PCT/JP2017/020671 2016-07-08 2017-06-02 Plasma discharge apparatus and air-cleaning machine WO2018008310A1 (en)

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