WO2018004300A1 - Plasma generating device, and method for treating hair loss using same - Google Patents

Plasma generating device, and method for treating hair loss using same Download PDF

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Publication number
WO2018004300A1
WO2018004300A1 PCT/KR2017/006961 KR2017006961W WO2018004300A1 WO 2018004300 A1 WO2018004300 A1 WO 2018004300A1 KR 2017006961 W KR2017006961 W KR 2017006961W WO 2018004300 A1 WO2018004300 A1 WO 2018004300A1
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WIPO (PCT)
Prior art keywords
plasma
dielectric layer
electrode
center electrode
skin
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PCT/KR2017/006961
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French (fr)
Korean (ko)
Inventor
윤상원
이원종
최은욱
김정현
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㈜프로스테믹스
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Priority claimed from KR1020160102449A external-priority patent/KR20180003379A/en
Application filed by ㈜프로스테믹스 filed Critical ㈜프로스테믹스
Priority to MX2018016176A priority Critical patent/MX2018016176A/en
Publication of WO2018004300A1 publication Critical patent/WO2018004300A1/en

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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61NELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00Electrotherapy; Circuits therefor
    • A61N1/44Applying ionised fluids
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

  • the present invention relates to a plasma generating apparatus and a hair loss treatment method using the same, and more particularly, to a plasma generating apparatus for generating a plasma by supplying a high current to the supplied gas and a hair loss treatment use thereof.
  • Solids with the lowest energy state of matter receive energy and are transferred to liquids or gases.
  • a plasma including electrons, ions, neutral atoms, and molecules may be generated by ionization and recombination of electrons and ions.
  • the plasma is called an electrically ionized conductive gas species because the positive and negative charges are mixed in the plasma to maintain Brown's motion close to free particles, while maintaining electrical neutrality.
  • Plasma classification criteria include plasma density, electron temperature, degree of thermal equilibrium (LTE or non-LTE) between species, generation mode, and application field. Plasma for research and manufacturing processes is usually either LTE or non-LTE, and the former is commonly referred to as thermal plasma and the latter as low temperature plasma.
  • Atmospheric pressure plasma in low temperature plasma is mainly used in the field of surface modification and coating, environmental purification. Recently, a lot of atmospheric pressure plasma apparatuses have been studied due to the application of biomedical applications and biomedical applications (Korean Patent No. 1407672 and Korean Patent No. 1292268).
  • streamer discharges in biomedical applications pose a risk to biomedical applications.
  • Streamer discharges are generally known to occur due to non-uniform discharges between electrodes applied to the dielectric at atmospheric pressure and parallel or gradient grounded electrodes (Brazilian Journal of Physics, 39 (2). ), pp. 322-325 and J. Phys. D: Appl. Phys, 46, 345204).
  • the streamer discharge causes damage to biological tissue by concentrating relatively high energy at a local site, and therefore, an apparatus for generating a uniform non-thermal plasma is urgently needed to safely apply the plasma apparatus to the biomedical field.
  • a plasma generator incorporating a dielectric layer on the surface of the metal electrode has been introduced for stable plasma generation.
  • a flat dielectric layer is introduced to form a potential difference parallel to a large area, and a plasma is generated in a space between the electrode and the object with a gap between the object and the object.
  • the plasma is generated in such a large planar space, the plasma having the characteristics of the fluid is not uniformly maintained, but is caused to be oriented to one side. Therefore, a problem arises in maintaining a uniform plasma. Therefore, in order to apply the plasma generating apparatus in the field of cosmetics and medical devices it will be said that a uniform plasma generating technology.
  • the hair is maintained by repeating the hair growth and hair loss in cycles of growth (Anagen), degeneration (Catagen), and telogen (Telogen).
  • anagen which grows hair
  • catagen which is the time when growth ends and hairball shrinks
  • talogen which is the time when the nipple stops working and stays in the scalp
  • nipple It can be divided into generators, which are periods of starting activities, or developing new hairs, causing them to lose old hair. Therefore, hair loss is normal or normal, but a lot of hair in a growing state is usually hair loss (Alopecia) people have a lot of hair in the resting phase is visible hair loss phenomenon. Hair loss is caused by genetic factors as the main cause.
  • hair loss population is gradually increasing due to the increase of social stress, westernized eating habits such as environmental pollution and instant food, frequent perm and dyeing, and poor scalp management.
  • hair loss is not a life-threatening disease, it causes a lot of mental stress. Therefore, it is urgent to develop a technology for inhibiting hair loss or promoting new hair growth at a site where hair loss is in progress.
  • Korean Patent Laid-Open Publication No. 2011-0018708 (Plasma Scalp Care Device) and Korean Patent No. 1642183 (Plasma Hair Comb) describe a plasma device manufactured in the form of a helmet and a comb, respectively, but the device is a fixed type. As it is not possible to consider the shape of the individual head, it is not possible to generate a uniform plasma in the contact area, there is a problem in that the plasma generating unit and the scalp is not in close contact with the plasma cannot be uniformly delivered to the scalp.
  • the present invention relates to a plasma generating apparatus and a hair loss treatment method using the same, and when the plasma generating apparatus according to the present invention is used for hair loss treatment, the uniform plasma controlled within a predetermined intensity range is related to the individual head shape difference. Since it is possible to be in close contact with the curved surface of the scalp, it is expected to be greatly utilized in the field of beauty and medical devices.
  • the present invention has been made to improve the problems of the conventional conventional plasma generator as described above, providing a plasma generating device for generating a uniform plasma within a predetermined intensity range, and using the device for hair loss treatment Has its purpose.
  • plasma refers to a gas state in which electrons and negatively charged ions are separated at high temperatures. At this time, the charge separation degree is very high, but the negative and positive charges are the same as the whole.
  • the state of matter is divided into three types: solid, liquid, and gas.
  • Plasma is often called ⁇ fourth material state>. This is because when energy is applied to a solid, it becomes a liquid or a gas, and when high energy is applied to this gas state, the gas is separated into an electron and an atomic nucleus and becomes a plasma state.
  • Plasma is the most common state. It is estimated that 99% of the universe is plasma.
  • Lightning, aurora borealis and ionic layers in the atmosphere are in a plasma state.
  • plasma exists in the anti-Allen belt, where ions are trapped in the Earth's magnetic field, and in the solar wind pouring from the sun.
  • the interior of the star or its surrounding gas is also in a plasma state.
  • the hydrogen gas filling the space between the stars is also in a plasma state.
  • Artificial plasma states that can be seen in everyday life include fluorescent lamps, mercury lamps, neon signs, plasma display panels (PDP), and the like.
  • hair loss refers to a state in which there is no hair at a site where hair normally should be present. Genetic factors act as the main cause, but the recent increase in social stress, hair loss population is gradually increasing due to westernized eating habits such as environmental pollution and instant food, frequent perm and dyeing, and poor scalp management.
  • Hair is maintained by repeating hair growth and hair loss in cycles of anagen, catagen, and telogen.
  • anagen which grows hair
  • catagen which is the time when growth ends and hairball shrinks
  • talogen which is the time when the nipple stops working and stays in the scalp
  • nipple It can be divided into generators, which are periods of starting activities, or developing new hairs, causing them to lose old hair.
  • the hair grows naturally for men 3 to 5 years, for women 4 to 6 years, then for 30 to 45 days of degeneration, and for 3 to 4 months after the rest period. At the end of the off-season, the generator starts producing new hair.
  • Hair loss is a normal phenomenon, but a normal person has a lot of hair in the growth phase, while alopecia usually has a lot of hair in the resting phase, which causes visible hair loss.
  • the hallmark of people with alopecia is the miniaturization of hair. As hair loss progresses, the growth period is shortened, which causes hair to become smaller and smaller. Therefore, for the treatment of hair loss, it is important to allow the hair follicles in the resting phase to be rapidly converted into growth phases and to increase the shortened growth phases.
  • Alopecia can be distinguished according to gender and form.
  • Male alopecia is characterized by male hormones called testosterone, a hormone that acts on muscle development and male organ development during puberty.
  • testosterone a hormone that acts on muscle development and male organ development during puberty.
  • DHT Dihydrotestosterone
  • the method of inhibiting the production of DHT by 5 alpha-reductase is mainly used to treat alopecia caused by this cause.
  • Gynecologic alopecia is mainly caused by the quantitative reduction of estrogen hormones after menopause.
  • Alopecia unlike the appearance of male alopecia, does not fall out of the front of the head, only the hair in the middle part is mainly lost.
  • Alopecia in women has a lower association with 5 alpha-reductase than men.
  • drugs that inhibit 5 alpha-reductase have little effect on postmenopausal alopecia women. Therefore, the treatment for such alopecia mainly uses minoxidil or estrogen.
  • Alopecia areata is caused by autoimmune diseases, mental stress, or genetic predisposition. Hair loss of round or oval shape occurs, and it is characterized by ringworm whitening or hair growth wall. This alopecia areata is fundamentally different from androgenetic alopecia, and the treatment is also different, using a method of treating corticosteroids, or applying minoxidil to the affected area or artificially causing irritation in the affected area.
  • the center electrode for generating the plasma is protruded due to the potential difference, and the outer electrode is formed in the circumferential direction on the outer side of the center electrode to supply power to the plasma generator.
  • a control unit connected to the power supply unit and configured to control the intensity of the plasma generated by the plasma generation unit.
  • the plasma generating unit may further include a gas supply unit supplying a gas between the center electrode and the outer electrode.
  • the center electrode may include a metal electrode generating a potential difference using an applied current, and a dielectric layer formed to be bonded to the metal electrode to stabilize the plasma.
  • the dielectric layer may include a first dielectric layer formed to contact the object, and a second dielectric layer formed to be stacked between the first dielectric layer and the metal electrode.
  • the second dielectric layer may be formed by welding a metal material to the first dielectric layer by metal spraying to bond the metal electrode and the first dielectric layer.
  • the center electrode may be elastically supported to be compressed and restored along the curved surface of the object when in contact with the object.
  • the center electrode may be formed to protrude at intervals of 120 degrees along the circumferential direction.
  • center electrode may be coupled to be detachable.
  • control unit may transform the power input during energization so that the plasma is generated, it is also possible to recognize the intensity of the plasma applied to the object to maintain a predetermined intensity.
  • the plasma generating device can be used for cosmetic or medical treatment applications, for example, when used for hair loss suppression, or hair growth promoting use, it can be named as hair growth promoter.
  • hair growth promoter means a device for the purpose of promoting hair growth, inhibiting hair loss, or strengthening hair at a hair loss site for the purpose of treating hair loss.
  • “skin beauty device” is to promote the penetration of cosmetic ingredients (nutrition ingredients such as moisture, collagen) to be administered to the skin by porousizing the skin cell wall by treating energy such as plasma on the skin surface. Although it can improve a cosmetic effect, it is not limited to this.
  • modification is to change the physical or chemical properties of the subject, to change the structure of the subject, to change the electrical conductivity, to change the hydrophilic / lipophilic properties, or to include in the subject Concepts such as varying the content of a specific ingredient.
  • skin modification means changing physical or chemical properties of the skin.
  • skin modification mainly means skin modification for cosmetic purposes, but is not limited thereto.
  • transdermal absorption refers to a drug delivery method of osmotic absorption of a drug through the skin instead of oral or injection administration. Since the drug is applied to the skin to absorb a certain concentration per predetermined time, there is an advantage that can maintain a constant drug concentration in the blood.
  • a tape attached with nitroglycerin which is an angina treatment agent, is used in clinical practice.
  • Skin surrounds the whole body and consists of three layers of epidermis, dermis and subcutaneous fat.
  • stratum corneum In the outermost epidermis, the stratum corneum is present, which acts as a skin barrier to protect the human body from various external sources of stimulation.
  • the stratum corneum consists of multiple layers of flat keratinocytes, filled with keratin by a hydrophobic insoluble fibrous protein called keratin, and intercellular lipids composed of ceramides, free fatty acids, and cholesterol between the keratinocytes. It is filling the 'lamella structure'.
  • Lipids in the stratum corneum unlike other common biofilms, are composed of ceramides, cholesterol, and free fatty acids that are not phospholipids. Ordinary biofilms containing phospholipids, sphingomyelin, and cholesterol are poorly permeable to water or low molecular weight substances that are soluble in water, and thus do not act as barriers.
  • lipids such as ceramides, cholesterol, and free fatty acids in the stratum corneum are linearly well connected and perform an excellent barrier function that inhibits the penetration of water and hydrophilic substances. Absorption of substances through the stratum corneum occurs through intercellular pathways and direct transcellular pathways.
  • the plasma generating apparatus of the present invention has the effect of promoting the transdermal absorption of the substance, and when the plasma generating apparatus of the present invention is used for the purpose of promoting transdermal absorption as described above, it may be referred to as a "plasma transdermal absorption promoter". .
  • pharmaceutical composition means a composition to be administered for a specific purpose.
  • the pharmaceutical composition of the present invention means a medical and pharmaceutical preparation that can be used in combination with the plasma generating device of the present invention.
  • the pharmaceutical composition is a composition that increases the hair growth promoting effect or hair loss inhibiting effect, means a composition that is plasma-treated on the skin with the plasma hair growth promoter of the present invention, and applied to the plasma treatment area before and after the And sugars, proteins and pharmaceutically acceptable carriers, excipients or diluents.
  • compositions in the present invention may be in the form of suspensions, solutions or emulsions in oily or aqueous carriers suitable for parenteral administration, and may include formulation agents such as suspending agents, stabilizers, solubilizers and / or dispersants. have. This form may be sterile and may be liquid. It can be stable under the conditions of manufacture and storage and can be preserved against the contaminating action of microorganisms such as bacteria or fungi.
  • the pharmaceutical compositions in the present invention may be in sterile powder form for reconstitution with a suitable carrier prior to use.
  • the pharmaceutical composition may be in unit-dose form, in ampoules, or in other unit-dose containers, or in multi-dose containers.
  • the pharmaceutical composition may be stored in a freeze-dried (freeze-dried) state requiring only the addition of a sterile liquid carrier, for example water for injection just before use.
  • a sterile liquid carrier for example water for injection just before use.
  • Immediately injectable solutions and suspensions may be prepared as sterile powders, granules or tablets.
  • Suitable excipients also include preservatives, suspending agents, stabilizers, dyes, buffers, antibacterial agents, antifungal agents, and isotonic agents, for example, sugars or sodium chloride.
  • the term "stabilizer” refers to a compound optionally used in the pharmaceutical compositions of the present invention to avoid the need for sulfite salts and to increase shelf life.
  • the pharmaceutical composition may comprise one or more pharmaceutically acceptable carriers.
  • the carrier may be a solvent or a dispersion medium.
  • pharmaceutically acceptable carriers include water, saline, ethanol, polyols (eg glycerol, propylene glycol and liquid polyethylene glycols), oils, and suitable mixtures thereof.
  • Parenteral formulations may be sterile.
  • sterilization techniques include filtration through bacterial-suppressive filters, terminal sterilization, incorporation of sterile preparations, irradiation, heating, vacuum drying and freeze drying.
  • cosmetic composition means a composition to be administered for a specific purpose.
  • the cosmetic composition of the present invention is a composition in which the effect is increased in combination with the plasma generating apparatus of the present invention, for example, plasma treatment on the skin with the plasma hair growth promoter of the present invention, and before and after the plasma treatment.
  • the cosmetic composition in the present invention may further include a suitable carrier, excipient or diluent commonly used in the preparation of the cosmetic composition.
  • Carriers, excipients or diluents which may be further added to the cosmetic composition in the present invention include purified water, oils, waxes, fatty acids, fatty acid alcohols, fatty acid esters, surfactants, humectants, thickeners, antioxidants, viscosity stabilizers, Chelating agents, buffers, lower alcohols, and the like.
  • a whitening agent, a moisturizing agent, vitamins, sunscreens, perfumes, dyes, antibiotics, antibacterial agents, antifungal agents may be included as necessary.
  • the oil may be hydrogenated vegetable oil, castor oil, cottonseed oil, olive oil, palm oil, jojoba oil, avocado oil, wax, wax, carnauba, candelilla, montan, ceresin, liquid paraffin, lanolin Can be used.
  • Stearic acid, linoleic acid, linolenic acid, oleic acid may be used as the fatty acid, and cetyl alcohol, octyldodecanol, oleyl alcohol, pantenol, lanolin alcohol, stearyl alcohol, hexadecanol may be used as fatty acid alcohol.
  • isopropyl myristate, isopropyl palmitate, butyl stearate may be used as the fatty acid ester.
  • surfactants cationic surfactants, anionic surfactants and nonionic surfactants known in the art can be used, and surfactants derived from natural products are preferred as much as possible.
  • it may include a hygroscopic agent, a thickener, an antioxidant, and the like, which are widely known in the cosmetic field, and their types and amounts are known in the art.
  • the plasma generating unit is formed by protruding the center electrode for generating a plasma by the potential difference in contact with the object, the outer electrode is formed along the circumferential direction on the outer side of the center electrode;
  • a power supply unit provided to supply power to the plasma generation unit;
  • a control unit connected to the power supply unit and configured to control the intensity of the plasma generated by the plasma generation unit, wherein the plasma generation unit supplies gas between the center electrode and the outer electrode.
  • the center electrode comprises: a metal electrode for generating a potential difference using an applied voltage; And a dielectric layer bonded to the metal electrode to stabilize the plasma, wherein the dielectric layer comprises: a first dielectric layer formed to contact an object; And a second dielectric layer formed to be stacked between the first dielectric layer and the metal electrode, wherein the second dielectric layer is configured to bond the metal electrode and the first dielectric layer to each other.
  • a plasma generating apparatus comprising a metal material deposited on a dielectric layer by a metal spray method, wherein the center electrode is elastically supported to be compressed and restored along a curved surface of the object when contacted with the object.
  • It provides a plasma generating apparatus, wherein the center electrode is provided in a form protruding at intervals of 120 degrees along the circumferential direction, the center electrode is characterized in that coupled to detachable A plasma generating apparatus is provided, and the control unit generates a plasma
  • a plasma generating apparatus characterized by transforming the input power when the lock is energized, to recognize the intensity of the plasma applied to the object to maintain a predetermined intensity.
  • the promotion of hair growth provides a skin care method, characterized in that to increase the number of hair or hair follicles, the promotion of hair growth is a skin care, characterized in that to increase the number of hair growth (anagen) or degenerative (catagen) hair follicles
  • the plasma generation in the step (b) provides a skin cosmetic method, characterized in that applying an alternating voltage of 1.5 to 5.0kV, the plasma generation in the step (b) is 1 to 200 seconds
  • the method comprises the steps of: (a) contacting the plasma surface of the subject with a plasma generating device of any one of claims 1 to 9; And (b) generating a plasma; wherein the wound is a wound, skin wound by scratch, peeling, rash, inflammation, ulcer, or scratch, and (b)
  • the plasma generation in the step) provides a wound treatment method characterized in that the application of an alternating voltage of 1.5 to 5.0kV, the plasma generation in the step (b) is maintained for 1 to 200 seconds Provide a method of treatment.
  • the plasma generating apparatus of the present invention has a stable plasma (dielectric barrier plasma) provided with protrusions having equal intervals along the circumferential direction, introducing a center electrode to which a dielectric layer and a metal electrode are joined, and introducing an outer electrode to the outside thereof. And control the intensity of the plasma through the control unit to prevent high energy from being concentrated in the local area.
  • the apparatus is adapted to be in close contact with the curved surface of the scalp regardless of individual head shape differences by introducing an elastic spring, and to implement a detachable center electrode. Since it can be easily replaced accordingly, it is expected that a large utilization in the field of beauty and medical devices.
  • FIG. 1 is a perspective view of a plasma generating apparatus according to an embodiment of the present invention.
  • FIG. 2 is a perspective view of the plasma generator in FIG. 1, according to an embodiment of the present disclosure.
  • FIG. 2 is a perspective view of the plasma generator in FIG. 1, according to an embodiment of the present disclosure.
  • 3A is a perspective view of a center electrode according to an embodiment of the present invention.
  • 3B is a perspective view of a center electrode according to an embodiment of the present invention.
  • 3C is a perspective view of a center electrode, according to one embodiment of the invention.
  • 3D is a perspective view of a center electrode, according to one embodiment of the invention.
  • FIG. 4 is a cross-sectional view of the center electrode according to an embodiment of the present invention.
  • FIG. 5 is a block diagram of a control unit according to an embodiment of the present invention.
  • FIG. 6 is a conceptual diagram at the time of plasma generation, according to an embodiment of the present invention.
  • FIG. 7 is a front view of a plasma generating unit at the time of plasma generation according to an embodiment of the present invention.
  • FIG. 8 is a graph of a potential difference generated between a cathode and an anode according to an embodiment of the present invention.
  • 9A is a cross-sectional view of a state in which a center electrode and an object are spaced apart from each other according to an embodiment of the present invention.
  • 9B is a cross-sectional view illustrating a plasma generation pattern in a state in which the center electrode is not in contact with an object according to an embodiment of the present invention.
  • 9C is a cross-sectional view illustrating a plasma generation pattern in a state in which a center electrode is in complete contact with an object according to an embodiment of the present invention.
  • FIG. 10 is a diagram showing the skin of a wound-induced and plasma-treated mouse according to an embodiment of the present invention.
  • FIG. 11 is a view showing the skin of the mouse three weeks after wound induction, according to an embodiment of the present invention.
  • FIG. 12 is a diagram showing a stained picture of mouse skin tissue treated with plasma after wound induction or untreated, according to one embodiment of the invention.
  • FIG. 13 is a graph showing the results of hair follicle analysis in plasma or untreated mouse skin tissue after wound induction according to one embodiment of the present invention.
  • the plasma generating apparatus includes the center electrode 110 protruding at equal intervals along the circumferential direction to maintain a stable plasma continuously, and to bond the dielectric layer 113 and the metal electrode 111 to each other.
  • the potential difference is stably maintained, the outer electrode 130 is introduced to generate a controlled stable plasma (dielectric barrier plasma), and the intensity of the plasma is controlled through the controller 300 so that a relatively high energy is applied to the localized portion.
  • the elastic spring 115 may be introduced to correspond to the curved surface of the target object, and the center electrode 110 may be detachably attached to allow replacement of the spring according to the target object.
  • the center electrode for generating a plasma by the potential difference is formed protruding and the outer electrode is formed in the circumferential direction on the outer side of the center electrode, a power supply unit provided to supply power to the plasma generating unit, and the power source
  • a power supply unit provided to supply power to the plasma generating unit, and the power source
  • a hair growth promoter using a plasma comprising a control unit connected to a supply unit and provided to control the intensity of the plasma generated by the plasma generation unit.
  • a plasma generating apparatus includes a plasma generating unit 100, a power supply unit 200, and a control unit 300.
  • the power supply unit 200 is connected to one side of the control unit 300
  • the plasma generation unit 100 is detachably connected to the other side of the control unit 300, but is not limited thereto.
  • the plasma generating unit 100 may be located at the side of the power supply unit 200 and the control unit 300 or may be configured as a separate unit.
  • the plasma generation unit 100 includes a center electrode 110, a plate 120, an outer electrode 130, and a gas supply unit 150.
  • the center electrode 110 protrudes from the plate 120, and the outer electrode 130 is formed along the circumferential direction on the outer side of the center electrode 110, and the center electrode 110.
  • the gas supply part 150 is provided between the outer electrode 130 and the outer electrode 130.
  • the plasma generating apparatus of the present invention may be provided with the outer electrode 130.
  • the plasma generating unit 100 includes a center electrode 110, a plate 120, and a gas supply unit 150. It is also possible that the gas supply unit 150 is unequipped.
  • the plasma generator 100 includes a center electrode 110, a plate 120, and an outer electrode 130.
  • the plasma generating apparatus of the present invention may be equipped with the outer electrode 130 and the gas supply unit 150.
  • the plasma generator 100 includes a center electrode 110 and a plate 120.
  • the center electrode 110 may be coupled to the outer electrode 130 to be detachable. Therefore, the controller 300 and the plasma generator 100 are separated from each other, and the outer electrode 130 and the center electrode 110 are coupled to each other.
  • the coupling of the control unit 300 and the plasma generating unit 110 may be screwed into each other by forming a screw thread on the end of the control unit 300 and the outer electrode 130, the control unit 300 and It is also possible to form a coupling hole and a hook such that the outer electrode 130 is hooked to each other.
  • the center electrode 110 is connected to the controller 300 and includes a metal electrode 111, a dielectric layer 113, and an elastic spring 115.
  • the center electrode 110 is formed to protrude from the plate 120, and the three center electrodes 110 are disposed to have a predetermined interval along the circumferential direction.
  • the center electrode 110 has a semi-spherical end shape in the form of a cylinder (see FIG. 3A), and is separated without a plate (see FIG. 3B) at the bottom, and has the plate 120b at the bottom and the plate ( 120b) and when the end is formed in the shape of a truncated cone (see FIG. 3C), and when the plate 120c is provided at the bottom and connected to the plate 120c and is formed in the form of a triangular pyramid (FIG. 3D).
  • the cross-sectional structure of the center electrode 110 includes a metal electrode 111, a dielectric layer 113, and an elastic spring 115.
  • the metal electrode 111 has a shape protruding to the outside, the dielectric layer 113 is laminated on a protruding surface of the metal electrode 111 with a uniform thickness.
  • the elastic spring 115 is connected to a surface of the metal electrode 111 in the direction of the control unit 300.
  • the dielectric layer 113 is the first dielectric layer 113a formed at the outermost portion so as to be in contact with the target object 1 and the second dielectric layer stacked inside the first dielectric layer 113a ( 113b).
  • the double layer structure is applied, but the present invention is not limited thereto.
  • a single layer structure formed of a single material and a multilayer structure formed of a plurality of layers are also possible.
  • the first as a dielectric material, the first dielectric layer (113a), the ceramic using the material, and the second dielectric layer (113b) include, but the use of the metal material is not limited to, alumina (Al 2 O 3), zirconia It is also possible to apply (ZrO 2 ) or the like.
  • the elastic spring 115 is formed to elastically support the dielectric layer 113 and the metal electrode 111.
  • the elastic spring 115 is shown in the form of a coil spring coupled to each of the protrusions 117, but is not limited to this, the spring coil shape as well as the plate spring to elastically support the entire dielectric layer 113. It is possible to form in the form.
  • the outer electrode 130 is disposed outside the center electrode 110, and the inner circumferential surface of the outer electrode 130 faces the center electrode 110. That is, the center electrode 110 is positioned in the center direction of the inner circumferential surface of the outer electrode 130.
  • the gas supply unit 150 includes a gas storage unit (not shown), is connected to the control unit 300, and is disposed between the center electrode 110 and the outer electrode 130. That is, the gas storage part (not shown) is formed to communicate the spaced space between the center electrode 110 and the outer electrode 130.
  • One end of the power supply unit 200 is connected to the control unit 300, and the other end of the power supply unit 200 is connected to an external power source, and the internal power source is accommodated therein. That is, the power supply unit 200 is formed to be detachable from the external power supply device, and is formed to accommodate a built-in power supply device such as a battery.
  • the control unit 300 includes a switching unit 310, a sensor unit 330, an output control unit 350, and a transformer 370.
  • the switching unit 310 is connected to the power supply unit 200 and the output control unit 350, the sensor unit 330 and the plasma generating unit 100 and the output control unit 350
  • the output control unit 350 is connected to the switching unit 310 and the sensor unit 330.
  • a closed circuit for sensing a feedback signal of the plasma generating unit may be configured, and when used as a beauty device, the sensor unit and the feedback signal coming into the sensor unit may be output. It is also possible to control by the control unit (upper switch step switch of the device).
  • the power source required for plasma processing uses a low frequency of 30 or more and 99 kHz or less, the power consumption of the plasma processing is 1 or more and 15 W or less, and the ground current of the plasma processing is 0.1 or more and 9.9 mA or less.
  • the current transformed by the switching unit 310 is applied to the plasma generating unit 100.
  • the center electrode 110 when power is applied to the metal electrode 111, the center electrode 110 generates a potential difference with the periphery of the center electrode 110 including the outer electrode 130, air, and the object 1. Let's do it.
  • FIG. 8 shows a graph of the potential difference generated between the cathode and the anode.
  • ions are collected in the vicinity of the positive electrode and the negative electrode, and an electric field is formed by the ions, thereby lowering the action (potential difference) as an electrode (sheath). That is, the potential difference becomes relatively low near the positive electrode and the negative electrode, and a target potential difference is generated in a region where no sheath occurs, and a plasma is generated in this region.
  • the gas supplied from the gas supply unit 150 may be a clean dry air (CDA), air, argon, neon, helium, or mixed gas. Can be used.
  • the plasma is generated by the gas supplied from the gas supply unit 150 and the potential difference generated by the center electrode 110.
  • the dielectric layer 113 may include the first dielectric layer 113a and the second dielectric layer 113b to control the distribution of energy of plasma generated from the center electrode 110.
  • the second dielectric layer 113b is welded to the first dielectric layer 113a by metalspraying (welding a metal or metal compound in a semi-melt state onto a nonmetal surface).
  • a space is not formed between the first dielectric layer 113a formed of ceramic and the second dielectric layer 113b welded by a metal spray method, and the second dielectric layer 113b of the metal material and the metal are coated.
  • the electrode 111 may be bonded through brazing (ceramic metal brazing).
  • the first dielectric layer 113a, the second dielectric layer 113b, and the metal electrode 111 of the ceramic material are bonded to each other, no space is generated and energy is concentrated at a localized portion. It can prevent and supply stable energy.
  • the three center electrodes 110 are disposed at 120 degree intervals along the circumferential direction.
  • the three center electrodes 110 are in contact with the object 1, and the surface of the center electrode 110 in direct contact with the object 1 is grounded so that plasma is not generated.
  • plasma is generated on the surface of the center electrode 110 which is not in direct contact with the object 1 (see FIGS. 6, 7 and 9c).
  • FIG. 9 illustrates a process of generating plasma from the center electrode 110 and contacting the object 1 according to the present invention.
  • plasma is not generated when the center electrode 110 is remotely spaced apart from the object 1 (FIG. 9A).
  • a plasma is generated by the potential difference between the object 1 and the center electrode 110.
  • the electric field is concentrated in the direction forming the shortest distance with the object 1, and as a result, the plasma is also concentrated (FIG. 9B).
  • FIG. 9C when the center electrode 110 is completely in contact with the object 1, no plasma is generated at a portion of the center electrode 110 which is in contact with the object 1, but is separated from the object 1. In that part, there is still a potential difference and a plasma is generated.
  • a ring-shaped plasma is formed around the center electrode 110 which protrudes in the contact with the object 1.
  • the center electrode 110 is elastically supported by the elastic spring 115 to be compressed and restored along the curved surface of the object when in contact with the object. Therefore, it can be used easily also for the object which has a curved surface, such as a human body.
  • the center electrode 110 is formed to be detachable, so that the center electrode 110 can be replaced with a suitable center electrode according to an object, and can be easily replaced even when a failure occurs.
  • the outer electrode 130 is grounded with the object, causing a potential difference with the center electrode 110 and at the same time to prevent the potential rises.
  • the plasma generated by the plasma generator 100 is measured by the sensor unit 330.
  • the sensor unit 330 measures the intensity of the plasma electrical signal generated by the plasma generating unit 100 and sends a signal to the output control unit 350.
  • the sensor unit 330 measures whether there is a malfunction such as an arc (a phenomenon in which the electrode melts due to a strong current and a discharge occurs) or a disconnection that may be generated during a plasma generation process, and if the malfunction occurs, the output control unit ( Signal a malfunction of 350).
  • the output control unit 350 receives a signal for the plasma intensity sent from the sensor unit 330 and compares it with information about a previously input plasma intensity. In this case, when the plasma intensity transmitted from the sensor unit 330 is out of the range of the pre-input plasma intensity, the output control unit 350 may switch the switching unit so that the plasma intensity is within the range of the pre-input plasma intensity.
  • the control signal is sent to 310 to control the amount of current.
  • the output controller 350 shuts off power.
  • the plasma generating apparatus includes the center electrode 110 protruding at equal intervals along the circumferential direction to maintain a stable plasma and to maintain the dielectric layer 113 and the metal electrode 111. Bonding to maintain the potential difference stably, introducing the outer electrode 130 to generate a controlled stable plasma (dielectric barrier plasma), and control the intensity of the plasma through the control unit 300 to relatively high local Prevents energy concentration
  • the elastic spring 115 may be introduced to correspond to the curved surface of the target object, and the center electrode 110 may be detachably attached to allow replacement of the spring according to the target object.
  • the wound was washed with sterile saline and then treated with plasma using the hair growth promoter prepared in Example 1.
  • An AC voltage of 2.5 to 3.0 kV was applied as a voltage for discharging the plasma, and the treatment was performed twice a week for 20 seconds on the first and third days of the experiment.
  • a ring made of medical silicone (inner diameter 12 mm, 2 mm thick), which was a guide ring, was attached to the wound, and four places were fixed using a medical stapler to prevent the wound tissue from healing itself by contraction. This is shown in FIG. 8.
  • the wound with the guide ring is well ventilated, well passed through oxygen and water vapor, is waterproof, and wrapped with 3M's Tegaderm transparent band, which is resistant to bacterial infection. More wrapped.
  • the wound was disinfected every 3 days and the tissue regeneration and hair growth of the wound were visually confirmed for 3 weeks (21 days). The photograph at the time of the said tissue observation is shown in FIG.
  • Example 2-2 Histological staining of wound tissue regeneration
  • Example 2-3 Counting and classification of wound hair
  • the proportion of hair growth (4.5) and degenerative (5.8) hairs in the plasma treated group was lower than that of the negative control group (1.3 growth stage, 2.3 degenerative stage) or positive control group (3.3 growth stage, 4.5 degenerative stage). It was confirmed to be high. As a result, it was confirmed that the plasma treatment induced hair growth promotion.
  • Plasma generating device has an effect that can generate a plasma uniformly and safely, it is expected to be greatly utilized in the field of cosmetic and medical devices.

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Abstract

The present invention relates to a plasma generating device comprising: a plasma generating unit in which center electrodes are protrudingly formed to generate a plasma by means of a potential difference while being in a contact with a target object, and an outer electrode is formed along the circumferential direction outside the center electrodes; a power supply unit provided to supply power to the plasma generating unit; and a control unit connected to the power supply unit and provided to control the intensity of the plasma generated by the plasma generating unit. The plasma generating device is effective in generating and maintaining a uniform plasma and in improving safety of an object to be earthed. In cases where the plasma generating device of the present invention is used for treating hair loss, the device may be used in close contact with the curved surface of the scalp regardless of the shape of the head of an individual by comprising an elastic spring, and the center electrodes are implemented to be removable, thereby being able to be readily replaced as necessary. Thus, the plasma generating device is expected to be widely utilized in the fields of beauty and medical equipment.

Description

플라즈마 발생 장치 및 이를 이용한 탈모 치료 방법Plasma generator and hair loss treatment method using same
본 발명은 플라즈마 발생 장치 및 이를 이용한 탈모 치료 방법에 관한 것으로, 보다 상세하게는 공급된 가스에 높은 전류를 공급하여 플라즈마를 발생시키는 플라즈마 발생 장치와 이의 탈모 치료 용도에 관한 것이다.The present invention relates to a plasma generating apparatus and a hair loss treatment method using the same, and more particularly, to a plasma generating apparatus for generating a plasma by supplying a high current to the supplied gas and a hair loss treatment use thereof.
물질 중 에너지 상태가 가장 낮은 고체가 에너지를 받아 액체, 또는 기체로 전이된다. 이때 중성 기체에 이온화 에너지 이상의 에너지가 인가되면 이온화 및 전자와 이온의 재결합에 의해 전자, 이온, 중성 원자 및 분자로 이루어진 플라즈마를 생성할 수 있다. 플라즈마에는 양전하와 음전하가 혼재하여 자유 입자에 가까운 브라운 운동을 하면서도 전기적으로 중성을 유지하고 있기 때문에 전기적으로 이온화된 전도성 가스종이라고 한다. 플라즈마의 분류 기준에는 플라즈마 밀도, 전자 온도, 종들 간의 열평형 정도(LTE 또는 non-LTE), 발생 방식, 응용 분야 등이 있다. 연구나 제조 공정을 위한 플라즈마는 대개 LTE 또는 non-LTE 중 하나이며, 일반적으로 전자를 열 플라즈마, 후자를 저온 플라즈마라고도 한다. 저온 플라즈마 중 대기압 플라즈마는 주로 물질의 표면 개질 및 코팅, 환경 정화 등의 분야에 활용되고 있다. 최근에는 생체 적용과 바이오 메디칼 분야의 응용 가능성으로 대기압 플라즈마 장치가 많이 연구되고 있다(한국 등록특허 제 1407672호 및 한국 등록특허 제 1292268호).Solids with the lowest energy state of matter receive energy and are transferred to liquids or gases. In this case, when energy more than ionization energy is applied to the neutral gas, a plasma including electrons, ions, neutral atoms, and molecules may be generated by ionization and recombination of electrons and ions. The plasma is called an electrically ionized conductive gas species because the positive and negative charges are mixed in the plasma to maintain Brown's motion close to free particles, while maintaining electrical neutrality. Plasma classification criteria include plasma density, electron temperature, degree of thermal equilibrium (LTE or non-LTE) between species, generation mode, and application field. Plasma for research and manufacturing processes is usually either LTE or non-LTE, and the former is commonly referred to as thermal plasma and the latter as low temperature plasma. Atmospheric pressure plasma in low temperature plasma is mainly used in the field of surface modification and coating, environmental purification. Recently, a lot of atmospheric pressure plasma apparatuses have been studied due to the application of biomedical applications and biomedical applications (Korean Patent No. 1407672 and Korean Patent No. 1292268).
그러나 플라즈마 장치를 바이오 메디칼 분야에 응용시 스트리머(streamer) 방전으로 인하여 생체 적용에 위험 요소가 되고 있다. 스트리머(streamer) 방전은 일반적으로 대기압 상태에서 유전체로 도포되어 고압이 인가되는 전극과 평행 또는 구배된 접지전극 사이에서의 방전이 균일하지 않은 이유로 발생한다고 알려져 있다(Brazilian Journal of Physics, 39(2), pp.322-325 및 J. Phys. D: Appl. Phys, 46, 345204). 스트리머 방전은 국소부위에 상대적으로 고에너지를 집중하여 생체조직의 손상을 초래하므로, 플라즈마 장치를 바이오 메디칼 분야에 안전하게 적용하기 위해서는 균일한 비열 플라즈마를 발생시키는 장치가 시급히 요구되는 실정이다. 이에 따라, 최근에는 안정적인 플라즈마 발생을 위하여 금속전극의 표면에 유전체층을 도입시킨 플라즈마 발생장치가 등장하고 있다. 종래의 플라즈마 발생장치는 평평한 형태의 유전체층을 도입하여 넓은 면적에 평행한 전위차를 형성시키고, 대상물체와의 사이에 간격을 두어 전극과 대상물체 사이의 공간에 플라즈마를 발생시켰다. 그러나, 이와 같이 넓은 평면 공간에 플라즈마를 발생시키는 경우에는 유체의 특성을 갖는 플라즈마가 균일하게 지속되지 않고, 한쪽으로 쏠리는 현상이 발생하게 된다. 따라서 균이한 플라즈마를 유지시키는 데에 문제가 발생한다. 따라서, 플라즈마 발생 장치를 미용 및 의료기기 분야에 적용하기 위해서 균이한 플라즈마 발생 기술이 중요하다고 할 것이다.However, streamer discharges in biomedical applications pose a risk to biomedical applications. Streamer discharges are generally known to occur due to non-uniform discharges between electrodes applied to the dielectric at atmospheric pressure and parallel or gradient grounded electrodes (Brazilian Journal of Physics, 39 (2). ), pp. 322-325 and J. Phys. D: Appl. Phys, 46, 345204). The streamer discharge causes damage to biological tissue by concentrating relatively high energy at a local site, and therefore, an apparatus for generating a uniform non-thermal plasma is urgently needed to safely apply the plasma apparatus to the biomedical field. Accordingly, in recent years, a plasma generator incorporating a dielectric layer on the surface of the metal electrode has been introduced for stable plasma generation. In the conventional plasma generator, a flat dielectric layer is introduced to form a potential difference parallel to a large area, and a plasma is generated in a space between the electrode and the object with a gap between the object and the object. However, when the plasma is generated in such a large planar space, the plasma having the characteristics of the fluid is not uniformly maintained, but is caused to be oriented to one side. Therefore, a problem arises in maintaining a uniform plasma. Therefore, in order to apply the plasma generating apparatus in the field of cosmetics and medical devices it will be said that a uniform plasma generating technology.
한편, 모발은 성장기(Anagen), 퇴화기(Catagen), 및 휴지기(Telogen)의 주기를 돌며 발모와 탈모를 반복하며 유지된다. 상세하게는, 모발을 성장시키는 성장기(anagen), 성장을 종료하고 모구부가 축소하는 시기인 퇴화기(catagen), 모유두가 활동을 멈추고 모발을 두피에 머무르게 하는 시기인 휴지기(talogen), 및 모유두가 활동을 시작하거나 또는 새로운 모발을 발생시켜 오래된 모발을 탈모시키는 시기인 발생기로 나눌 수 있다. 따라서 탈모는 정상적인 현상이나 정상인 사람이 성장기 상태의 모발이 많은 데 비해 보통 탈모증(Alopecia)인 사람은 휴지기 상태의 모발이 많아 눈으로 보이는 탈모현상이 나타내게 된다. 탈모는 유전적 요인이 가장 주요한 원인으로 작용하나, 최근 사회적 스트레스의 증가와 더불어 환경오염 및 인스턴트식품 등 서구화된 식습관, 잦은 파마와 염색, 잘못된 두피관리들로 인하여 탈모 인구가 점차 증가하고 있다. 탈모는 생명현상을 위협하는 질병은 아니지만 정신적 스트레스를 크게 유발시키므로, 탈모를 억제하거나 탈모가 진행된 부위에서 신생 모발 성장을 촉진하기 위한 기술 개발이 시급한 실정이다.On the other hand, the hair is maintained by repeating the hair growth and hair loss in cycles of growth (Anagen), degeneration (Catagen), and telogen (Telogen). Specifically, anagen, which grows hair, catagen, which is the time when growth ends and hairball shrinks, talogen, which is the time when the nipple stops working and stays in the scalp, and nipple It can be divided into generators, which are periods of starting activities, or developing new hairs, causing them to lose old hair. Therefore, hair loss is normal or normal, but a lot of hair in a growing state is usually hair loss (Alopecia) people have a lot of hair in the resting phase is visible hair loss phenomenon. Hair loss is caused by genetic factors as the main cause. Recently, hair loss population is gradually increasing due to the increase of social stress, westernized eating habits such as environmental pollution and instant food, frequent perm and dyeing, and poor scalp management. Although hair loss is not a life-threatening disease, it causes a lot of mental stress. Therefore, it is urgent to develop a technology for inhibiting hair loss or promoting new hair growth at a site where hair loss is in progress.
최근 플라즈마를 바이오 분야에 응용하고자 하는 연구가 확대되고 있으나, 두피 케어 및 모발 관리 부분에서의 플라즈마 응용 연구는 미비한 실정이다. 한국 공개특허 제 2011-0018708호(플라즈마 두피 케어장치)와 한국 등록특허 제 1642183호(플라즈마 머리 빗)에서 각각 헬멧 형태와 빗 형태로 제조된 플라즈마 장치를 기재하고 있으나, 상기의 장치는 고정된 형태로서 개개인의 머리 형태를 고려할 수 없고, 접촉 면적에 균일한 플라즈마를 발생시키지 못하며, 플라즈마 발생부와 두피가 완벽하게 밀착되지 못하므로 두피에 균일하게 플라즈마를 전달하지 못하는 문제점이 있었다.Recently, researches for applying plasma to biotechnology have been expanding, but studies on plasma application in scalp care and hair care have been insufficient. Korean Patent Laid-Open Publication No. 2011-0018708 (Plasma Scalp Care Device) and Korean Patent No. 1642183 (Plasma Hair Comb) describe a plasma device manufactured in the form of a helmet and a comb, respectively, but the device is a fixed type. As it is not possible to consider the shape of the individual head, it is not possible to generate a uniform plasma in the contact area, there is a problem in that the plasma generating unit and the scalp is not in close contact with the plasma cannot be uniformly delivered to the scalp.
따라서 본 발명은 플라즈마 발생 장치 및 이를 이용한 탈모 치료 방법에 관한 것으로, 본 발명에 의한 플라즈마 발생 장치를 탈모 치료 용도로 이용하는 경우에, 소정 강도 범위 내로 조절된 균일한 플라즈마를 개개인의 머리 형태 차이에 관계없이 두피의 곡면에 밀착하여 대응 가능하도록 구현하였으므로, 미용 및 의료기기 분야에서 큰 활용이 기대된다.Accordingly, the present invention relates to a plasma generating apparatus and a hair loss treatment method using the same, and when the plasma generating apparatus according to the present invention is used for hair loss treatment, the uniform plasma controlled within a predetermined intensity range is related to the individual head shape difference. Since it is possible to be in close contact with the curved surface of the scalp, it is expected to be greatly utilized in the field of beauty and medical devices.
본 발명은 상기한 바와 같은 종래 종래의 플라즈마 발생 장치가 가지는 문제점들을 개선하기 위해 창출된 것으로, 소정 강도 범위 내에서 균일한 플라즈마를 발생시키는 플라즈마 발생 장치를 제공함과, 상기 장치를 탈모 치료 용도로 이용함에 그 목적이 있다.The present invention has been made to improve the problems of the conventional conventional plasma generator as described above, providing a plasma generating device for generating a uniform plasma within a predetermined intensity range, and using the device for hair loss treatment Has its purpose.
그러나 본 발명이 이루고자 하는 기술적 과제는 이상에서 언급한 과제에 제한되지 않으며, 언급되지 않은 또 다른 과제들은 아래의 기재로부터 당 업계에서 통상의 지식을 가진 자에게 명확하게 이해될 수 있을 것이다.However, the technical problem to be achieved by the present invention is not limited to the above-mentioned problem, another task that is not mentioned will be clearly understood by those skilled in the art from the following description.
이하, 본원에 기재된 다양한 구체예가 도면을 참조로 기재된다. 하기 설명에서, 본 발명의 완전한 이해를 위해서, 다양한 특이적 상세사항, 예컨대, 특이적 형태, 조성물 및 공정 등이 기재되어 있다. 그러나, 특정의 구체예는 이들 특이적 상세 사항 중 하나 이상 없이, 또는 다른 공지된 방법 및 형태와 함께 실행될 수 있다. 다른 예에서, 공지된 공정 및 제조 기술은 본 발명을 불필요하게 모호하게 하지 않게 하기 위해서, 특정의 상세사항으로 기재되지 않는다. "한 가지 구체예" 또는 "구체예"에 대한 본 명세서 전체를 통한 참조는 구체예와 결부되어 기재된 특별한 특징, 형태, 조성 또는 특성이 본 발명의 하나 이상의 구체예에 포함됨을 의미한다. 따라서, 본 명세서 전체에 걸친 다양한 위치에서 표현된 "한 가지 구체예에서" 또는 "구체예"의 상황은 반드시 본 발명의 동일한 구체예를 나타내지는 않는다. 추가로, 특별한 특징, 형태, 조성, 또는 특성은 하나 이상의 구체예에서 어떠한 적합한 방법으로 조합될 수 있다.Hereinafter, various embodiments described herein are described with reference to the drawings. In the following description, for a thorough understanding of the present invention, various specific details are set forth, such as specific forms, compositions, processes and the like. However, certain embodiments may be practiced without one or more of these specific details, or in conjunction with other known methods and forms. In other instances, well known processes and manufacturing techniques have not been described in particular detail in order to not unnecessarily obscure the present invention. Reference throughout this specification to "one embodiment" or "embodiment" means that a particular feature, form, composition or characteristic described in connection with the embodiment is included in one or more embodiments of the invention. Thus, the context of “in one embodiment” or “embodiment” expressed at various places throughout this specification does not necessarily represent the same embodiment of the invention. In addition, particular features, forms, compositions, or properties may be combined in any suitable manner in one or more embodiments.
명세서에서 특별한 정의가 없으면 본 명세서에 사용된 모든 과학적 및 기술적인 용어는 본 발명이 속하는 기술분야에서 당업자에 의하여 통상적으로 이해되는 것과 동일한 의미를 가진다.Unless otherwise defined, all scientific and technical terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs.
본 발명의 일 구체예에서 “플라즈마(plasma)”란, 고온에서 음전하를 가진 전자와 양전하를 띤 이온으로 분리된 기체 상태를 말한다. 이때는 전하 분리도가 상당히 높으면서도 전체적으로 음과 양의 전하수가 같아서 중성을 띠게 된다. 일반적으로 물질의 상태는 고체·액체·기체 등 세 가지로 나눠진다. 플라즈마는 흔히 <제4의 물질 상태>라고 부른다. 고체에 에너지를 가하면 액체, 기체로 되고 다시 이 기체 상태에 높은 에너지를 가하면 기체는 전자와 원자핵으로 분리되어 플라즈마 상태가 되기 때문이다.In one embodiment of the present invention, "plasma" refers to a gas state in which electrons and negatively charged ions are separated at high temperatures. At this time, the charge separation degree is very high, but the negative and positive charges are the same as the whole. Generally, the state of matter is divided into three types: solid, liquid, and gas. Plasma is often called <fourth material state>. This is because when energy is applied to a solid, it becomes a liquid or a gas, and when high energy is applied to this gas state, the gas is separated into an electron and an atomic nucleus and becomes a plasma state.
일상생활에서 플라즈마를 이용하려면 이처럼 인공적으로 만들어야 하지만 우주 전체를 보면 플라즈마가 가장 흔한 상태라고 할 수 있다. 우주 전체의 99%가 플라즈마 상태라고 추정된다. 번개, 북극 지방의 오로라, 대기 속의 이온층 등이 플라즈마 상태이다. 대기 밖으로 나가면 지구 자기장 속에 이온들이 잡혀서 이루어진 반 알렌대, 태양으로부터 쏟아져 나오는 태양풍 속에도 플라즈마가 존재한다. 별의 내부나 그를 둘러싸고 있는 주변 기체도 플라즈마 상태이다. 별 사이의 공간을 메우고 있는 수소 기체도 플라즈마 상태이다. 일상생활에서 볼 수 있는 인공적인 플라즈마 상태로는 형광등, 수은등, 네온사인, PDP(plasma display panel) 등이 있다.If you want to use plasma in your daily life, you have to make it artificial, but in the whole universe, plasma is the most common state. It is estimated that 99% of the universe is plasma. Lightning, aurora borealis and ionic layers in the atmosphere are in a plasma state. When you go out of the atmosphere, plasma exists in the anti-Allen belt, where ions are trapped in the Earth's magnetic field, and in the solar wind pouring from the sun. The interior of the star or its surrounding gas is also in a plasma state. The hydrogen gas filling the space between the stars is also in a plasma state. Artificial plasma states that can be seen in everyday life include fluorescent lamps, mercury lamps, neon signs, plasma display panels (PDP), and the like.
본 발명의 일 구체예에서, “탈모”란, 정상적으로 모발이 존재하여야 할 부위에 모발이 없는 상태를 의미한다. 유전적 요인이 가장 주요한 원인으로 작용하나, 최근 사회적 스트레스의 증가와 더불어 환경오염 및 인스턴트식품 등 서구화된 식습관, 잦은 파마와 염색, 잘못된 두피관리들로 인하여 탈모 인구가 점차 증가하고 있다.In one embodiment of the present invention, "hair loss" refers to a state in which there is no hair at a site where hair normally should be present. Genetic factors act as the main cause, but the recent increase in social stress, hair loss population is gradually increasing due to westernized eating habits such as environmental pollution and instant food, frequent perm and dyeing, and poor scalp management.
모발은 성장기(Anagen), 퇴화기(Catagen), 휴지기(Telogen)의 주기를 돌며 발모와 탈모를 반복하며 유지되고 있다. 상세하게는, 모발을 성장시키는 성장기(anagen), 성장을 종료하고 모구부가 축소하는 시기인 퇴화기(catagen), 모유두가 활동을 멈추고 모발을 두피에 머무르게 하는 시기인 휴지기(talogen), 및 모유두가 활동을 시작하거나 또는 새로운 모발을 발생시켜 오래된 모발을 탈모시키는 시기인 발생기로 나눌 수 있다. 모발의 성장기는 남성 3~5년, 여성이 4~6년 정도로 그 후 퇴화기 30~45일 정도, 휴지기가 3~4개월 정도 지나 자연적으로 탈모가 된다. 그리고 휴지기의 마지막이 되면 새로운 모발이 생성되는 발생기가 시작된다. 탈모는 정상적인 현상이나 정상인 사람이 성장기 상태의 모발이 많은 데 비해 보통 탈모증(Alopecia)인 사람은 휴지기 상태의 모발이 많아 눈으로 보이는 탈모현상이 나타내게 된다. 탈모증을 나타내는 사람들의 특징은 모발의 소형화에 있다. 탈모가 진행될수록 성장기의 기간이 짧아지고 이로 인하여 모발은 점점 소형화된다. 따라서 탈모의 치료를 위해서는 휴지기 상태의 모낭이 성장기로 빨리 전환될 수 있도록 하고, 짧아진 성장기를 늘려주는 것이 중요하다.Hair is maintained by repeating hair growth and hair loss in cycles of anagen, catagen, and telogen. Specifically, anagen, which grows hair, catagen, which is the time when growth ends and hairball shrinks, talogen, which is the time when the nipple stops working and stays in the scalp, and nipple It can be divided into generators, which are periods of starting activities, or developing new hairs, causing them to lose old hair. The hair grows naturally for men 3 to 5 years, for women 4 to 6 years, then for 30 to 45 days of degeneration, and for 3 to 4 months after the rest period. At the end of the off-season, the generator starts producing new hair. Hair loss is a normal phenomenon, but a normal person has a lot of hair in the growth phase, while alopecia usually has a lot of hair in the resting phase, which causes visible hair loss. The hallmark of people with alopecia is the miniaturization of hair. As hair loss progresses, the growth period is shortened, which causes hair to become smaller and smaller. Therefore, for the treatment of hair loss, it is important to allow the hair follicles in the resting phase to be rapidly converted into growth phases and to increase the shortened growth phases.
탈모증은 성별 및 형태에 따라서 구별할 수 있는데, 남성형 탈모증은 남성의 성징을 나타나게 하며 사춘기에 근육의 발달, 남성 기관의 발달 등에 작용하는 호르몬인 테스토스테론(Testosterone)이라는 남성호르몬에 의해 나타나는 현상으로 이 테스토스테론이 5 알파-리덕타아제(α-reductase)라는 효소에 의해 더 강력한 호르몬인 디히드로테스토스테로(Dihydrotestosterone:DHT)으로 바뀌게 되면, 이 호르몬이 모낭에 작용하여 모낭을 성장기 단계에서 퇴화기 단계로 유도하여 탈모가 일어나게 한다. 따라서 이러한 원인에 의한 탈모증을 치료하기 위하여 5 알파-리덕타아제에 의한 DHT의 생성을 억제하는 방법이 주로 사용된다. 여성형 탈모증은 주로 폐경기 이후 에스트로겐 호르몬의 양적 감소에 의해 발생한다. 여성의 탈모증은 남성형 탈모증의 모양과는 좀 다르게 머리 앞부분은 빠지지 않고 중간 부분의 머리만이 주로 탈모된다. 여성의 탈모증은 5 알파-리덕타아제와의 연관관계가 남성보다 적게 작용한다. 따라서 5 알파-리덕타아제를 억제시키는 약물은 폐경기 이후의 탈모증 여성에게는 별로 효과가 없다. 따라서, 이러한 탈모증을 위한 치료제로는 주로 미녹시딜이나 에스트로겐을 사용한다. 원형 탈모증은 자가면역질환이나 정신적 스트레스, 유전적 소인에 의해 발생한다. 원형 또는 난원형의 탈모가 일어나며, 두부 백선이나 발모벽이 생기는 특징을 갖고 있다. 이러한 원형 탈모증은 안드로겐성 탈모증과는 근본적으로 원인이 다르며, 치료법 또한 달라서 부신피질 호르몬제를 처리하는 방법을 사용하거나, 미녹시딜을 환부에 바르거나 인위적으로 환부에 자극을 유발하는 방법을 사용한다.Alopecia can be distinguished according to gender and form. Male alopecia is characterized by male hormones called testosterone, a hormone that acts on muscle development and male organ development during puberty. When the 5 alpha-reductase enzyme converts it into a more potent hormone, Dihydrotestosterone (DHT), it acts on the hair follicles, causing the hair follicles to grow from the growth stage to the degenerative stage. Induces hair loss Therefore, the method of inhibiting the production of DHT by 5 alpha-reductase is mainly used to treat alopecia caused by this cause. Gynecologic alopecia is mainly caused by the quantitative reduction of estrogen hormones after menopause. Female alopecia, unlike the appearance of male alopecia, does not fall out of the front of the head, only the hair in the middle part is mainly lost. Alopecia in women has a lower association with 5 alpha-reductase than men. Thus, drugs that inhibit 5 alpha-reductase have little effect on postmenopausal alopecia women. Therefore, the treatment for such alopecia mainly uses minoxidil or estrogen. Alopecia areata is caused by autoimmune diseases, mental stress, or genetic predisposition. Hair loss of round or oval shape occurs, and it is characterized by ringworm whitening or hair growth wall. This alopecia areata is fundamentally different from androgenetic alopecia, and the treatment is also different, using a method of treating corticosteroids, or applying minoxidil to the affected area or artificially causing irritation in the affected area.
본 발명에 의한 플라즈마 발생 장치는 전위차에 의하여 플라즈마를 발생시키는 중심전극이 돌출되어 형성되고 외곽전극이 상기 중심전극의 외곽에 원주방향을 따라 형성된 플라즈마 발생부, 상기 플라즈마 발생부에 전원을 공급시키도록 구비된 전원공급부, 및 상기 전원공급부와 연결되고 상기 플라즈마 발생부에서 발생시키는 플라즈마의 강도를 제어하도록 구비된 제어부를 포함하는 것을 특징으로 한다.In the plasma generating apparatus according to the present invention, the center electrode for generating the plasma is protruded due to the potential difference, and the outer electrode is formed in the circumferential direction on the outer side of the center electrode to supply power to the plasma generator. And a control unit connected to the power supply unit and configured to control the intensity of the plasma generated by the plasma generation unit.
한편, 상기 플라즈마 발생부는 상기 중심전극과 상기 외곽전극 사이에 가스를 공급시키는 가스공급부를 더 포함하는 것도 가능하다.The plasma generating unit may further include a gas supply unit supplying a gas between the center electrode and the outer electrode.
이때, 상기 중심전극은 인가된 전류를 이용하여 전위차를 발생시키는 메탈전극, 및 상기 메탈전극과 접합되어 플라즈마를 안정시키도록 형성된 유전체층을 포함하는 것도 가능하다.In this case, the center electrode may include a metal electrode generating a potential difference using an applied current, and a dielectric layer formed to be bonded to the metal electrode to stabilize the plasma.
또한, 상기 유전체층은 대상물체와 접촉하도록 형성된 제1유전체층, 및 상기 제1유전체층과 상기 메탈전극 사이에 적층되도록 형성된 제2유전체층을 포함하는 것도 가능하다.In addition, the dielectric layer may include a first dielectric layer formed to contact the object, and a second dielectric layer formed to be stacked between the first dielectric layer and the metal electrode.
이때, 상기 제2유전체층은 상기 메탈전극과 상기 제1유전체층을 접합시키도록 상기 제1유전체층에 금속 소재를 금속용사법(metal spraying)으로 용착시켜 형성된 것도 가능하다.In this case, the second dielectric layer may be formed by welding a metal material to the first dielectric layer by metal spraying to bond the metal electrode and the first dielectric layer.
한편, 상기 중심전극은 대상물체와 접촉 시, 대상물체의 곡면을 따라 압축 및 복원이 가능하도록 탄성지지되는 것도 가능하다.On the other hand, the center electrode may be elastically supported to be compressed and restored along the curved surface of the object when in contact with the object.
이때, 상기 중심전극은 원주방향을 따라 120도 간격으로 돌출된 형태로 형성된 것도 가능하다.In this case, the center electrode may be formed to protrude at intervals of 120 degrees along the circumferential direction.
또한, 상기 중심전극은 탈착 가능하도록 결합된 것도 가능하다.In addition, the center electrode may be coupled to be detachable.
한편, 상기 제어부는 플라즈마가 발생되도록 통전 시 입력된 전원을 변압시키고, 대상물체에 인가되는 플라즈마의 강도를 인식하여 소정 강도를 유지시키는 것도 가능하다.On the other hand, the control unit may transform the power input during energization so that the plasma is generated, it is also possible to recognize the intensity of the plasma applied to the object to maintain a predetermined intensity.
본 발명에 있어서 상기 플라즈마 발생 장치는 미용 또는 의학적 치료 용도를 위해 사용될 수 있으며, 예를 들어, 탈모 억제, 또는 발모 촉진 용도로 사용될 때, 이를 발모촉진기로 명명할 수 있다.In the present invention, the plasma generating device can be used for cosmetic or medical treatment applications, for example, when used for hair loss suppression, or hair growth promoting use, it can be named as hair growth promoter.
본 발명의 일 구체예에서, “발모촉진기”란, 탈모 치료 등의 목적으로 탈모된 부위에 발모를 촉진하거나, 탈모를 억제하거나, 또는 모발을 강화하기 위한 목적의 기기를 포괄하여 의미한다. In one embodiment of the present invention, "hair growth promoter" means a device for the purpose of promoting hair growth, inhibiting hair loss, or strengthening hair at a hair loss site for the purpose of treating hair loss.
본 발명의 일 구체예에서, “피부 미용기”란, 피부 표면에 플라즈마와 같은 에너지를 처리함으로써 피부 세포벽을 다공질화하여 피부에 투여하고자 하는 화장 성분(수분, 콜라겐 등의 영양 성분)의 침투를 촉진시켜 미용 효과를 향상시킬 수 있는 것이지만, 이에 한정되는 것은 아니다.In one embodiment of the present invention, "skin beauty device" is to promote the penetration of cosmetic ingredients (nutrition ingredients such as moisture, collagen) to be administered to the skin by porousizing the skin cell wall by treating energy such as plasma on the skin surface. Although it can improve a cosmetic effect, it is not limited to this.
본 발명의 일 구체예에서 "개질"이란, 대상의 물리적 또는 화학적 성질을 변화시킨다는 것으로, 대상의 구조를 변화시키거나, 전기전도도를 변화시키거나, 친수/친유 성질을 변화시키거나, 대상에 포함된 특정 성분의 함량을 변화시키는 것 등의 개념을 포함한다. 예를 들어, 피부 개질이란, 피부의 물리적 또는 화학적 성질을 변화시킨다는 것으로, 본 발명에 있어서 피부 개질이란 주로 미용 목적의 피부 개질을 의미하나, 이에 한정하는 것은 아니다.In one embodiment of the invention "modification" is to change the physical or chemical properties of the subject, to change the structure of the subject, to change the electrical conductivity, to change the hydrophilic / lipophilic properties, or to include in the subject Concepts such as varying the content of a specific ingredient. For example, skin modification means changing physical or chemical properties of the skin. In the present invention, skin modification mainly means skin modification for cosmetic purposes, but is not limited thereto.
본 발명의 일 구체예에서 “경피 흡수”란, 경구 또는 주사 투여 대신에 피부를 통하여 약물을 삼투 흡수시켜 투여하는 약물전달방법을 의미한다. 약물을 피부에 도포하여 일정 시간당 일정 농도를 흡수시키므로, 혈중의 약물 농도를 일정하게 유지 가능한 이점이 있다. 일예로, 협심증 치료제인 니트로글리세린을 첨부한 테이프 등이 임상에서 이용되고 있다. In one embodiment of the present invention, "transdermal absorption" refers to a drug delivery method of osmotic absorption of a drug through the skin instead of oral or injection administration. Since the drug is applied to the skin to absorb a certain concentration per predetermined time, there is an advantage that can maintain a constant drug concentration in the blood. For example, a tape attached with nitroglycerin, which is an angina treatment agent, is used in clinical practice.
그러나 경피 흡수를 이용한 약물전달에서의 흡수율을 효율적으로 높이기 위해서, 피부 장벽을 해결하는 것이 중요한 과제이다.However, in order to effectively increase the absorption rate in drug delivery using transdermal absorption, it is an important problem to solve the skin barrier.
피부는 전신을 둘러싸며 크게 표피, 진피, 피하지방의 3층 구조로 이루어져 있다. 이 중 최외각에 위치한 표피에는 각질층(stratum corneum)이 존재함으로써 외부의 여러 자극원으로부터 인체를 보호하는 피부장벽의 역할을 한다. 각질층(stratum corneum)은 편평한 모양의 각화세포가 여러층으로 이루어져 있으며 케라틴이라고 불리는 소수성의 불용성 섬유상 단백질이 각질세포를 채우고 있고, 각질세포 사이사이를 세라마이드, 자유지방산, 콜레스테롤 등으로 구성된 세포간지질이 채우고 있는 ‘라멜라 구조’를 이루고 있다. 이러한 구조적 특징으로 인해 피부의 수분 증발은 억제되고, 외부의 스트레스나 해로운 자극으로부터 인체를 효과적으로 보호할 수 있게 되었지만 약학조성물 또는 화장품의 유효성분 또한 쉽게 흡수되지 못하게 되었다(Drug Discovery Today. Technologies., 2: 67-74, 2005). 각질층의 지질은 다른 일반적인 생체막들과는 다르게, 인지질이 아닌 세라마이드(ceramid), 콜레스테롤(cholesterol), 자유지방산(free fatty acid)으로 이루어져있다. 인지질(phospholipid), 스핑고미엘린(sphingomyelin), 콜레스테롤을 함유하는 보통의 생체막은 수분이나 물에 잘 녹는 분자량이 낮은 물질에 대한 투과성이 강해 장벽으로서의 역할을 잘 수행하지 못한다. 그러나 각질층의 세라마이드, 콜레스테롤, 자유지방산 등의 지질은 직선적으로 잘 연결되어 있어 수분과 친수성 물질의 투과를 억제하는 훌륭한 장벽기능을 수행한다. 각질층을 통한 물질의 흡수는 세포간 경로와 직접 세포투과(transcellular)경로를 통하여 이루어진다.Skin surrounds the whole body and consists of three layers of epidermis, dermis and subcutaneous fat. In the outermost epidermis, the stratum corneum is present, which acts as a skin barrier to protect the human body from various external sources of stimulation. The stratum corneum consists of multiple layers of flat keratinocytes, filled with keratin by a hydrophobic insoluble fibrous protein called keratin, and intercellular lipids composed of ceramides, free fatty acids, and cholesterol between the keratinocytes. It is filling the 'lamella structure'. This structural feature suppresses water evaporation of the skin and effectively protects the body from external stress or harmful stimuli, but also makes it difficult to absorb the active ingredients of pharmaceutical compositions or cosmetics (Drug Discovery Today. Technologies., 2). : 67-74, 2005). Lipids in the stratum corneum, unlike other common biofilms, are composed of ceramides, cholesterol, and free fatty acids that are not phospholipids. Ordinary biofilms containing phospholipids, sphingomyelin, and cholesterol are poorly permeable to water or low molecular weight substances that are soluble in water, and thus do not act as barriers. However, lipids such as ceramides, cholesterol, and free fatty acids in the stratum corneum are linearly well connected and perform an excellent barrier function that inhibits the penetration of water and hydrophilic substances. Absorption of substances through the stratum corneum occurs through intercellular pathways and direct transcellular pathways.
따라서, 경피 흡수를 통한 약물전달 방법에 있어서, 어떻게 하면 유효성분을 피부에 자극을 주지 않으면서 흡수를 촉진시키고 효과를 최대화할 수 있는가 하는 것이 기술적 과제로 남아있는 실정이다.Therefore, in the drug delivery method through transdermal absorption, how to promote the absorption and maximize the effect of the active ingredient without irritating the skin remains a technical problem.
본 발명의 플라즈마 발생 장치는 물질의 경피 흡수를 촉진시키는 효과가 있고, 상기와 같이 본 발명의 플라즈마 발생 장치를 경피 흡수 촉진 목적으로 사용하는 경우에, 이를 "플라즈마 경피 흡수 촉진기"로 명명할 수 있다.The plasma generating apparatus of the present invention has the effect of promoting the transdermal absorption of the substance, and when the plasma generating apparatus of the present invention is used for the purpose of promoting transdermal absorption as described above, it may be referred to as a "plasma transdermal absorption promoter". .
본 발명의 일 구체예에서 “약학조성물”이란, 특정한 목적을 위해 투여되는 조성물을 의미한다. 본 발명의 목적상, 본 발명의 약학조성물은 본 발명의 플라즈마 발생 장치와 병용하여 사용 가능한 의학적, 약학적 제제를 의미한다. 예를 들어, 상기 약학조성물은 발모 증진 효과 또는 탈모 억제 효과가 증대되는 조성물로서, 본 발명의 플라즈마 발모촉진기로 피부에 플라즈마 처리하고, 그 전후에 플라즈마 처리 영역에 도포되는 조성물을 의미하며, 이에 관여하는 당, 단백질 및 약학적으로 허용 가능한 담체, 부형제 또는 희석제를 포함할 수 있다. 상기의 "약학적 허용 가능한" 담체 또는 부형제는 정부의 규제부에 의해 승인된 것이나, 또는 척추 동물, 그리고 보다 특별하게는 인간에게 사용을 위한 정부 또는 기타 일반적으로 승인된 약전에서 리스트된 것을 의미한다. 본 발명에서의 약학조성물은 비경구적인 투여에 적절한 유성 또는 수성 담체에 있는 현탁액, 용액 또는 에멀젼의 형태로 될 수 있고, 현탁제, 안정화제, 용해제 및/또는 분산제와 같은 제형화제를 포함할 수 있다. 본 형태는 멸균될 수 있고, 액체일 수 있다. 이것은 제조 및 저장의 조건 하에서 안정할 수 있고 세균이나 곰팡이와 같은 미생물의 오염 작용에 대해 보존될 수 있다. 대안적으로, 본 발명에서의 약학조성물은 사용 전에 적절한 담체와 재구성을 위해 멸균 분말 형태일 수 있다. 약학조성물은 단위-복용량 형태로, 앰플에, 또는 기타 단위-복용량 용기에, 또는 다-복용량 용기에 존재할 수 있다. 대안적으로, 약학조성물은 단지 멸균 액체 담체, 예를 들어 사용 바로 전에 주사용 물의 부가함을 요하는 동결-건조된(냉동건조) 상태로 보관될 수 있다. 즉시 주사용액 및 현탁액은 멸균 분말, 그래뉼 또는 타블렛으로 제조될 수 있다. 또한 적절한 부형제는 보존제, 현탁제, 안정화제, 염료, 완충제, 항균제, 항진균제, 및 등장화제, 예를 들어, 당 또는 염화나트륨을 포함한다. 여기서 사용된 것으로, 용어 "안정화제"는 설파이트 염의 필요성을 회피하고 보존 수명을 증가하기 위해 본 발명의 약학조성물에 선택적으로 사용된 화합물을 언급한다. 안정화제의 비-제한적인 예는 항산화제를 포함한다.In one embodiment of the present invention, "pharmaceutical composition" means a composition to be administered for a specific purpose. For the purposes of the present invention, the pharmaceutical composition of the present invention means a medical and pharmaceutical preparation that can be used in combination with the plasma generating device of the present invention. For example, the pharmaceutical composition is a composition that increases the hair growth promoting effect or hair loss inhibiting effect, means a composition that is plasma-treated on the skin with the plasma hair growth promoter of the present invention, and applied to the plasma treatment area before and after the And sugars, proteins and pharmaceutically acceptable carriers, excipients or diluents. By "pharmaceutically acceptable" carrier or excipient is meant that it has been approved by the government's regulatory department, or listed in government or other generally approved pharmacopoeia for use in vertebrates, and more particularly in humans. . Pharmaceutical compositions in the present invention may be in the form of suspensions, solutions or emulsions in oily or aqueous carriers suitable for parenteral administration, and may include formulation agents such as suspending agents, stabilizers, solubilizers and / or dispersants. have. This form may be sterile and may be liquid. It can be stable under the conditions of manufacture and storage and can be preserved against the contaminating action of microorganisms such as bacteria or fungi. Alternatively, the pharmaceutical compositions in the present invention may be in sterile powder form for reconstitution with a suitable carrier prior to use. The pharmaceutical composition may be in unit-dose form, in ampoules, or in other unit-dose containers, or in multi-dose containers. Alternatively, the pharmaceutical composition may be stored in a freeze-dried (freeze-dried) state requiring only the addition of a sterile liquid carrier, for example water for injection just before use. Immediately injectable solutions and suspensions may be prepared as sterile powders, granules or tablets. Suitable excipients also include preservatives, suspending agents, stabilizers, dyes, buffers, antibacterial agents, antifungal agents, and isotonic agents, for example, sugars or sodium chloride. As used herein, the term "stabilizer" refers to a compound optionally used in the pharmaceutical compositions of the present invention to avoid the need for sulfite salts and to increase shelf life. Non-limiting examples of stabilizers include antioxidants.
약학조성물은 하나 또는 그 이상의 약학적으로 허용될 수 있는 담체를 포함할 수 있다. 담체는 용매 또는 분산 배지일 수 있다. 약학적으로 허용될 수 있는 담체의 비-제한적인 예는 물, 식염수, 에탄올, 폴리올 (예, 글리세롤, 프로필렌 글리콜 및 액체 폴리에틸렌 글리콜), 오일, 및 이들의 적절한 혼합물을 포함한다.The pharmaceutical composition may comprise one or more pharmaceutically acceptable carriers. The carrier may be a solvent or a dispersion medium. Non-limiting examples of pharmaceutically acceptable carriers include water, saline, ethanol, polyols (eg glycerol, propylene glycol and liquid polyethylene glycols), oils, and suitable mixtures thereof.
비경구용 제형은 멸균될 수 있다. 멸균 기술의 비-제한적인 예는 세균-억제 필터를 통한 여과, 터미날 멸균화, 멸균 제제의 합체, 방사선 조사, 가열, 진공 건조 및 동결 건조를 포함한다.Parenteral formulations may be sterile. Non-limiting examples of sterilization techniques include filtration through bacterial-suppressive filters, terminal sterilization, incorporation of sterile preparations, irradiation, heating, vacuum drying and freeze drying.
본 발명의 일 구체예에서 “화장료 조성물”이란, 특정한 목적을 위해 투여되는 조성물을 의미한다. 본 발명의 목적상, 본 발명의 화장료 조성물은 본 발명의 플라즈마 발생 장치와 병용하여 효과가 증대되는 조성물로서, 예를 들어, 본 발명의 플라즈마 발모촉진기로 피부에 플라즈마 처리하고, 그 전후에 플라즈마 처리 영역에 도포되는 조성물을 의미하며, 화장수, 영양로션, 영양에센스, 마사지 크림, 미용목욕물첨가제, 바디로션, 바디밀크, 배스오일, 베이비오일, 베이비파우더, 샤워겔, 샤워크림, 선스크린로션, 선스크린크림, 선탠크림, 스킨로션, 스킨크림, 자외선차단용 화장품, 크렌징밀크, 탈모제{화장용}, 페이스 및 바디로션, 페이스 및 바디크림, 피부미백크림, 핸드로션, 헤어로션, 화장용크림, 쟈스민오일, 목욕비누, 물비누, 미용비누, 샴푸, 손세정제(핸드클리너), 약용비누{비의료용}, 크림비누, 페이셜워시, 헤어린스, 화장비누, 치아미백용 겔, 치약 등의 형태일 수 있다. 이를 위해 본 발명에서의 화장료 조성물은 화장료 조성물의 제조에 통상적으로 사용하는 적절한 담체, 부형제 또는 희석제를 더 포함할 수 있다. 본 발명에서의 화장료 조성물 내에 더 추가될 수 있는 담체, 부형제 또는 희석제로는 정제수, 오일, 왁스, 지방산, 지방산 알콜, 지방산 에스테르, 계면활성제, 흡습제(humectant), 증점제, 항산화제, 점도 안정화제, 킬레이팅제, 완충제, 저급 알콜 등이 포함되지만, 이에 제한되는 것은 아니다. 또한, 필요에 따라 미백제, 보습제, 비타민, 자외선 차단제, 향수, 염료, 항생제, 항박테리아제, 항진균제를 포함할 수 있다. 상기 오일로서는 수소화 식물성유, 피마자유, 면실유, 올리브유, 야자인유, 호호바유, 아보카도유가 이용될 수 있으며, 왁스로는 밀랍, 경랍, 카르나우바, 칸델릴라, 몬탄, 세레신, 액체 파라핀, 라놀린이 이용될 수 있다. 지방산으로는 스테아르산, 리놀레산, 리놀렌산, 올레산이 이용될 수 있고, 지방산 알콜로는 세틸알콜, 옥틸도데칸올, 올레일알콜, 판텐올, 라놀린알콜, 스테아릴 알콜, 헥사데칸올이 이용될 수 있으며 지방산 에스테르로는 이소프로필미리스테이트, 이소프로필 팔미테이트, 부틸스테아레이트가 이용될 수 있다. 계면활성제로는 당업계에 알려진 양이온 계면활성제, 음이온 계면활성제 및 비이온성 계면활성제가 사용가능하며 가능한 한 천연물 유래의 계면활성제가 바람직하다. 그 외에도 화장품 분야에서 널리 알려진 흡습제, 증점제, 항산화제 등을 포함할 수 있으며, 이들의 종류와 양은 당업계에 공지된 바에 따른다.In one embodiment of the present invention, "cosmetic composition" means a composition to be administered for a specific purpose. For the purpose of the present invention, the cosmetic composition of the present invention is a composition in which the effect is increased in combination with the plasma generating apparatus of the present invention, for example, plasma treatment on the skin with the plasma hair growth promoter of the present invention, and before and after the plasma treatment. Means the composition applied to the area, lotion, nutrition lotion, nutrition essence, massage cream, beauty bath additives, body lotion, body milk, bath oil, baby oil, baby powder, shower gel, shower cream, sunscreen lotion, sun Screen cream, suntan cream, skin lotion, skin cream, sunscreen cosmetic, cleansing milk, depilatory {cosmetic}, face and body lotion, face and body cream, skin whitening cream, hand lotion, hair lotion, cosmetic cream, Jasmine Oil, Bath Soap, Water Soap, Beauty Soap, Shampoo, Hand Cleanser (Hand Cleaner), Medicated Soap {Non-Medical}, Cream Soap, Facial Wash, Hairrin, Cosmetic Soap, Tooth Whitening Gel, toothpaste and the like. To this end, the cosmetic composition in the present invention may further include a suitable carrier, excipient or diluent commonly used in the preparation of the cosmetic composition. Carriers, excipients or diluents which may be further added to the cosmetic composition in the present invention include purified water, oils, waxes, fatty acids, fatty acid alcohols, fatty acid esters, surfactants, humectants, thickeners, antioxidants, viscosity stabilizers, Chelating agents, buffers, lower alcohols, and the like. In addition, a whitening agent, a moisturizing agent, vitamins, sunscreens, perfumes, dyes, antibiotics, antibacterial agents, antifungal agents may be included as necessary. The oil may be hydrogenated vegetable oil, castor oil, cottonseed oil, olive oil, palm oil, jojoba oil, avocado oil, wax, wax, carnauba, candelilla, montan, ceresin, liquid paraffin, lanolin Can be used. Stearic acid, linoleic acid, linolenic acid, oleic acid may be used as the fatty acid, and cetyl alcohol, octyldodecanol, oleyl alcohol, pantenol, lanolin alcohol, stearyl alcohol, hexadecanol may be used as fatty acid alcohol. And isopropyl myristate, isopropyl palmitate, butyl stearate may be used as the fatty acid ester. As surfactants, cationic surfactants, anionic surfactants and nonionic surfactants known in the art can be used, and surfactants derived from natural products are preferred as much as possible. In addition, it may include a hygroscopic agent, a thickener, an antioxidant, and the like, which are widely known in the cosmetic field, and their types and amounts are known in the art.
본 발명의 일 구체예에서, 대상물체와 접촉 상태에서 전위차에 의하여 플라즈마를 발생시키는 중심전극이 돌출되어 형성되고, 외곽전극이 상기 중심전극의 외곽에 원주방향을 따라 형성된 플라즈마 발생부; 상기 플라즈마 발생부에 전원을 공급시키도록 구비된 전원공급부; 및 상기 전원공급부와 연결되고, 상기 플라즈마 발생부에서 발생시키는 플라즈마의 강도를 제어하도록 구비된 제어부를 포함하는 플라즈마 발생 장치를 제공하고, 상기 플라즈마 발생부는 상기 중심전극과 상기 외곽전극 사이에 가스를 공급시키는 가스공급부를 추가로 포함하는 것을 특징으로 하는 플라즈마 발생 장치를 제공하며, 상기 중심전극은 인가된 전압을 이용하여 전위차를 발생시키는 메탈전극; 및 상기 메탈전극과 접합되어 플라즈마를 안정시키도록 형성된 유전체층을 포함하는 것을 특징으로 하는 플라즈마 발생 장치를 제공하며, 상기 유전체층은 대상물체와 접촉하도록 형성된 제1유전체층; 및 상기 제1유전체층과 상기 메탈전극 사이에 적층되도록 형성된 제2유전체층을 포함하는 것을 특징으로 하는 플라즈마 발생 장치를 제공하며, 상기 제2유전체층은 상기 메탈전극과 상기 제1유전체층을 접합시키도록 상기 제1유전체층에 금속 소재를 금속용사법으로 용착시켜 형성된 것을 특징으로 하는 플라즈마 발생 장치를 제공하며, 상기 중심전극은 대상물체와 접촉 시, 대상물체의 곡면을 따라 압축 및 복원이 가능하도록 탄성지지되는 것을 특징으로 하는 플라즈마 발생 장치를 제공하며, 상기 중심전극은 원주방향을 따라 120도 간격으로 돌출된 형태로 형성된 것을 특징으로 하는 플라즈마 발생 장치를 제공하며, 상기 중심전극은 탈착 가능하도록 결합된 것을 특징으로 하는 플라즈마 발생 장치를 제공하며, 상기 제어부는 플라즈마가 발생되도록 통전 시 입력된 전원을 변압시키고, 대상물체에 인가되는 플라즈마의 강도를 인식하여 소정 강도를 유지시키는 것을 특징으로 하는 플라즈마 발생 장치를 제공한다.In one embodiment of the present invention, the plasma generating unit is formed by protruding the center electrode for generating a plasma by the potential difference in contact with the object, the outer electrode is formed along the circumferential direction on the outer side of the center electrode; A power supply unit provided to supply power to the plasma generation unit; And a control unit connected to the power supply unit and configured to control the intensity of the plasma generated by the plasma generation unit, wherein the plasma generation unit supplies gas between the center electrode and the outer electrode. And a gas supply unit, wherein the center electrode comprises: a metal electrode for generating a potential difference using an applied voltage; And a dielectric layer bonded to the metal electrode to stabilize the plasma, wherein the dielectric layer comprises: a first dielectric layer formed to contact an object; And a second dielectric layer formed to be stacked between the first dielectric layer and the metal electrode, wherein the second dielectric layer is configured to bond the metal electrode and the first dielectric layer to each other. 1. A plasma generating apparatus comprising a metal material deposited on a dielectric layer by a metal spray method, wherein the center electrode is elastically supported to be compressed and restored along a curved surface of the object when contacted with the object. It provides a plasma generating apparatus, wherein the center electrode is provided in a form protruding at intervals of 120 degrees along the circumferential direction, the center electrode is characterized in that coupled to detachable A plasma generating apparatus is provided, and the control unit generates a plasma Provided is a plasma generating apparatus characterized by transforming the input power when the lock is energized, to recognize the intensity of the plasma applied to the object to maintain a predetermined intensity.
본 발명의 다른 구체예에서, (a) 개체의 피부 표면에 제 1항 내지 제 9항 중 어느 한 항 이상의 플라즈마 발생 장치를 접촉시키는 단계; 및 (b) 플라즈마를 발생시키는 단계;를 포함하는 피부 미용 방법을 제공하고, 상기 피부 미용은 피부 개질, 보습, 미백, 주름 제거, 탈모 억제, 또는 발모 촉진인 것을 특징으로 하는 피부 미용 방법을 제공하며, 상기 발모 촉진은 모발 또는 모낭의 개수를 증가시키는 것임을 특징으로 하는 피부 미용 방법을 제공하며, 상기 발모 촉진은 성장기(anagen) 또는 퇴행기(catagen) 모낭의 개수를 증가시키는 것임을 특징으로 하는 피부 미용 방법을 제공하며, 상기 (b) 단계에서의 플라즈마 발생은 1.5 내지 5.0kV의 교류전압을 인가하는 것을 특징으로 하는 피부 미용 방법을 제공하며, 상기 (b) 단계에서의 플라즈마 발생은 1 내지 200초 동안 유지하는 것을 특징으로 하는 피부 미용 방법을 제공한다.In another embodiment of the invention, (a) contacting the plasma generating device of any one of claims 1 to 9 to the skin surface of the individual; And (b) generating a plasma, wherein the skin care method is a skin care method, wherein the skin care method is skin modification, moisturizing, whitening, wrinkle removal, hair loss inhibition, or hair growth promotion. In addition, the promotion of hair growth provides a skin care method, characterized in that to increase the number of hair or hair follicles, the promotion of hair growth is a skin care, characterized in that to increase the number of hair growth (anagen) or degenerative (catagen) hair follicles It provides a method, the plasma generation in the step (b) provides a skin cosmetic method, characterized in that applying an alternating voltage of 1.5 to 5.0kV, the plasma generation in the step (b) is 1 to 200 seconds It provides a skin care method, characterized in that for maintaining.
본 발명의 또 다른 구체예에서, (a) 개체의 피부 표면에 제 1항 내지 제 9항 중 어느 한 항 이상의 플라즈마 발생 장치를 접촉시키는 단계; 및 (b) 플라즈마를 발생시키는 단계;를 포함하는 상처 치료 방법을 제공하고, 상기 상처는 자상, 박피, 발진, 염증, 궤양, 또는 스크레치에 의한 피부 손상인 상처 치료 방법을 제공하며, 상기 (b) 단계에서의 플라즈마 발생은 1.5 내지 5.0kV의 교류전압을 인가하는 것을 특징으로 하는 상처 치료 방법을 제공하며, 상기 (b) 단계에서의 플라즈마 발생은 1 내지 200초 동안 유지하는 것을 특징으로 하는 상처 치료 방법을 제공한다.In another embodiment of the present invention, the method comprises the steps of: (a) contacting the plasma surface of the subject with a plasma generating device of any one of claims 1 to 9; And (b) generating a plasma; wherein the wound is a wound, skin wound by scratch, peeling, rash, inflammation, ulcer, or scratch, and (b) The plasma generation in the step) provides a wound treatment method characterized in that the application of an alternating voltage of 1.5 to 5.0kV, the plasma generation in the step (b) is maintained for 1 to 200 seconds Provide a method of treatment.
이하 상기 본 발명을 단계별로 상세히 설명한다.Hereinafter, the present invention will be described in detail step by step.
이상에서 설명한 바와 같이 본 발명에 따른 플라즈마 발생 장치에 의하면, 균일하고 안전하게 플라즈마를 발생시킬 수 있는 효과가 있다. 본 발명의 플라즈마 발생 장치는 원주방향을 따라 동일한 간격을 갖는 돌출부를 구비하고, 유전체층과 메탈전극이 접합된 중심전극을 도입하며, 그 외곽에 외곽전극을 도입하여 조절된 안정적인 플라즈마(유전체장벽 플라즈마)를 발생시키고, 제어부를 통하여 플라즈마의 강도를 제어하여 국소부위에 상대적으로 고에너지가 집중되는 것을 방지한다. 본 발명의 플라즈마 발생 장치를 탈모 치료에 이용하는 경우에, 상기 장치는 탄력스프링을 도입하여 개개인의 머리 형태 차이에 관계없이 두피의 곡면에 밀착하여 대응 가능하고, 중심전극을 탈착 가능하도록 구현하여 필요에 따라 용이하게 교체 가능하도록 하였으므로, 미용 및 의료기기 분야에 큰 활용이 기대된다.As described above, according to the plasma generating apparatus according to the present invention, there is an effect capable of generating plasma uniformly and safely. The plasma generating apparatus of the present invention has a stable plasma (dielectric barrier plasma) provided with protrusions having equal intervals along the circumferential direction, introducing a center electrode to which a dielectric layer and a metal electrode are joined, and introducing an outer electrode to the outside thereof. And control the intensity of the plasma through the control unit to prevent high energy from being concentrated in the local area. When the plasma generating apparatus of the present invention is used for hair loss treatment, the apparatus is adapted to be in close contact with the curved surface of the scalp regardless of individual head shape differences by introducing an elastic spring, and to implement a detachable center electrode. Since it can be easily replaced accordingly, it is expected that a large utilization in the field of beauty and medical devices.
도 1은 본 발명의 일 구체예에 따른, 플라즈마 발생 장치에 대한 사시도이다.1 is a perspective view of a plasma generating apparatus according to an embodiment of the present invention.
도 2는 본 발명의 일 구체예에 따른, 도 1에서 플라즈마 발생부를 바라본 사시도이다.FIG. 2 is a perspective view of the plasma generator in FIG. 1, according to an embodiment of the present disclosure. FIG.
도 3a는 본 발명의 일 구체예에 따른, 중심전극에 대한 사시도이다.3A is a perspective view of a center electrode according to an embodiment of the present invention.
도 3b는 본 발명의 일 구체예에 따른, 중심전극에 대한 사시도이다.3B is a perspective view of a center electrode according to an embodiment of the present invention.
도 3c는 본 발명의 일 구체예에 따른, 중심전극에 대한 사시도이다.3C is a perspective view of a center electrode, according to one embodiment of the invention.
도 3d는 본 발명의 일 구체예에 따른, 중심전극에 대한 사시도이다.3D is a perspective view of a center electrode, according to one embodiment of the invention.
도 4는 본 발명의 일 구체예에 따른, 중심전극의 단면도이다.4 is a cross-sectional view of the center electrode according to an embodiment of the present invention.
도 5는 본 발명의 일 구체예에 따른, 제어부의 구성도이다.5 is a block diagram of a control unit according to an embodiment of the present invention.
도 6은 본 발명의 일 구체예에 따른, 플라즈마 발생 시의 개념도이다.6 is a conceptual diagram at the time of plasma generation, according to an embodiment of the present invention.
도 7은 본 발명의 일 구체예에 따른, 플라즈마 발생 시의 플라즈마 발생부에 대한 정면도이다.7 is a front view of a plasma generating unit at the time of plasma generation according to an embodiment of the present invention.
도 8은 본 발명의 일 구체예에 따른, 정극(cathode)과 부극(anode)의 사이에서 발생되는 전위차에 대한 그래프이다.8 is a graph of a potential difference generated between a cathode and an anode according to an embodiment of the present invention.
도 9a는 본 발명의 일 구체예에 따른, 중심전극과 대상물체가 원거리로 이격된 상태의 단면도이다.9A is a cross-sectional view of a state in which a center electrode and an object are spaced apart from each other according to an embodiment of the present invention.
도 9b는 본 발명의 일 구체예에 따른, 중심전극이 대상물체와 접촉되지 않는 상태에서 플라즈마 생성 양상을 나타낸 단면도이다.9B is a cross-sectional view illustrating a plasma generation pattern in a state in which the center electrode is not in contact with an object according to an embodiment of the present invention.
도 9c는 본 발명의 일 구체예에 따른, 중심전극이 대상물체가 완전히 접촉되는 상태에서 플라즈마 생성 양상을 나타낸 단면도이다.9C is a cross-sectional view illustrating a plasma generation pattern in a state in which a center electrode is in complete contact with an object according to an embodiment of the present invention.
도 10은 본 발명의 일 구체예에 따른, 상처 유도 및 플라즈마 처리된 마우스의 피부를 나타낸 도이다.10 is a diagram showing the skin of a wound-induced and plasma-treated mouse according to an embodiment of the present invention.
도 11은 본 발명의 일 구체예에 따른, 상처 유도 3주 후 마우스의 피부를 나타낸 도이다.11 is a view showing the skin of the mouse three weeks after wound induction, according to an embodiment of the present invention.
도 12는 본 발명의 일 구체예에 따른, 상처 유도 후 플라즈마 처리 또는 비처리된 마우스 피부 조직의 염색된 사진을 나타낸 도이다.12 is a diagram showing a stained picture of mouse skin tissue treated with plasma after wound induction or untreated, according to one embodiment of the invention.
도 13은 본 발명의 일 구체예에 따른, 상처 유도 후 플라즈마 처리 또는 비처리된 마우스 피부 조직에서의 모낭 분석 결과를 나타낸 그래프이다.13 is a graph showing the results of hair follicle analysis in plasma or untreated mouse skin tissue after wound induction according to one embodiment of the present invention.
본 발명에 따른 플라즈마 발생 장치는 원주방향을 따라 동일한 간격을 갖도록 돌출된 상기 중심전극(110)을 구비하여 안정적인 플라즈마를 지속적으로 유지시키고, 상기 유전체층(113)과 상기 메탈전극(111)을 접합시켜 전위차를 안정적으로 유지시키며, 상기 외곽전극(130)을 도입하여 조절된 안정적인 플라즈마(유전체장벽 플라즈마)를 발생시키고, 상기 제어부(300)를 통하여 플라즈마의 강도를 제어하여 국소부위에 상대적으로 고에너지가 집중되는 것을 방지한다. 또한 상기 탄력스프링(115)을 도입하여 대상물체의 곡면에 대응가능하고, 상기 중심전극(110)을 탈착 가능하도록하여 대상물체에 따라 교체 가능하도록 하여 사용이 용이하도록 하였다.The plasma generating apparatus according to the present invention includes the center electrode 110 protruding at equal intervals along the circumferential direction to maintain a stable plasma continuously, and to bond the dielectric layer 113 and the metal electrode 111 to each other. The potential difference is stably maintained, the outer electrode 130 is introduced to generate a controlled stable plasma (dielectric barrier plasma), and the intensity of the plasma is controlled through the controller 300 so that a relatively high energy is applied to the localized portion. Prevent concentration In addition, the elastic spring 115 may be introduced to correspond to the curved surface of the target object, and the center electrode 110 may be detachably attached to allow replacement of the spring according to the target object.
이하, 실시예를 통하여 본 발명을 더욱 상세히 설명하고자 한다. 이들 실시예는 오로지 본 발명을 보다 구체적으로 설명하기 위한 것으로서, 본 발명의 요지에 따라 본 발명의 범위가 이들 실시예에 의해 제한되지 않는다는 것은 당업계에서 통상의 지식을 가진 자에게 있어서 자명할 것이다.Hereinafter, the present invention will be described in more detail with reference to Examples. These examples are only for illustrating the present invention in more detail, and it will be apparent to those skilled in the art that the scope of the present invention is not limited by these examples according to the gist of the present invention. .
실시예Example 1.  One. 플라즈마plasma 발생 장치의 제조 Manufacture of generator
전위차에 의하여 플라즈마를 발생시키는 중심전극이 돌출되어 형성되고 외곽전극이 상기 중심전극의 외곽에 원주방향을 따라 형성된 플라즈마 발생부, 상기 플라즈마 발생부에 전원을 공급시키도록 구비된 전원공급부, 및 상기 전원공급부와 연결되고 상기 플라즈마 발생부에서 발생시키는 플라즈마의 강도를 제어하도록 구비된 제어부를 포함하는 것을 특징으로 하는 플라즈마를 이용한 발모촉진기를 제조하였다.The center electrode for generating a plasma by the potential difference is formed protruding and the outer electrode is formed in the circumferential direction on the outer side of the center electrode, a power supply unit provided to supply power to the plasma generating unit, and the power source A hair growth promoter using a plasma, comprising a control unit connected to a supply unit and provided to control the intensity of the plasma generated by the plasma generation unit.
이하 첨부된 도면을 참조하여 본 발명의 바람직한 실시예를 상세히 설명하기로 한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.
도 1을 참조하면, 본 발명의 일 실시예에 따른 플라즈마 발생 장치는, 플라즈마 발생부(100), 전원공급부(200) 및 제어부(300)를 포함한다. 이때, 상기 제어부(300)의 일측에는 상기 전원공급부(200)가 연결되고, 상기 제어부(300)의 타측에는 상기 플라즈마 발생부(100)가 탈착 가능하도록 연결되나, 이에 한정하는 것은 아니다. 비제한적인 실시예에 있어서, 본 발명의 플라즈마 발생 장치는 플라즈마 발생부(100)가 전원공급부(200) 및 제어부(300)의 측면에 위치하거나, 별도의 유닛으로 구성될 수 있다.Referring to FIG. 1, a plasma generating apparatus according to an embodiment of the present invention includes a plasma generating unit 100, a power supply unit 200, and a control unit 300. In this case, the power supply unit 200 is connected to one side of the control unit 300, and the plasma generation unit 100 is detachably connected to the other side of the control unit 300, but is not limited thereto. In a non-limiting embodiment, in the plasma generating apparatus of the present invention, the plasma generating unit 100 may be located at the side of the power supply unit 200 and the control unit 300 or may be configured as a separate unit.
도 1 및 도 2를 참조하면, 상기 플라즈마 발생부(100)는 중심전극(110), 플레이트(120), 외곽전극(130) 및 가스공급부(150)를 포함한다. 이때, 상기 중심전극(110)은 상기 플레이트(120)에서 돌출되어 형성되고, 상기 중심전극(110)의 외곽에 상기 외곽전극(130)이 원주방향을 따라 형성되어 있고, 상기 중심전극(110)과 상기 외곽전극(130)의 사이에는 상기 가스공급부(150)가 구비되어 있다. 그러나 비제한적인 실시예에 있어서, 본 발명의 플라즈마 발생 장치는 외곽전극(130)이 비구비될 수 있다. 이러한 경우, 플라즈마 발생부(100)는 중심전극(110), 플레이트(120), 및 가스공급부(150)를 포함한다. 가스공급부(150)가 비구비되는 경우도 가능하다. 이러한 경우, 플라즈마 발생부(100)는 중심전극(110), 플레이트(120), 및 외곽전극(130)을 포함한다. 또한 몇몇의 비제한적인 실시예에 있어서, 본 발명의 플라즈마 발생 장치는 외곽전극(130) 및 가스공급부(150)를 비구비하는 경우도 가능하다. 이러한 경우, 플라즈마 발생부(100)는 중심전극(110) 및 플레이트(120)를 포함한다.1 and 2, the plasma generation unit 100 includes a center electrode 110, a plate 120, an outer electrode 130, and a gas supply unit 150. In this case, the center electrode 110 protrudes from the plate 120, and the outer electrode 130 is formed along the circumferential direction on the outer side of the center electrode 110, and the center electrode 110. The gas supply part 150 is provided between the outer electrode 130 and the outer electrode 130. However, in the non-limiting embodiment, the plasma generating apparatus of the present invention may be provided with the outer electrode 130. In this case, the plasma generating unit 100 includes a center electrode 110, a plate 120, and a gas supply unit 150. It is also possible that the gas supply unit 150 is unequipped. In this case, the plasma generator 100 includes a center electrode 110, a plate 120, and an outer electrode 130. In addition, in some non-limiting embodiments, the plasma generating apparatus of the present invention may be equipped with the outer electrode 130 and the gas supply unit 150. In this case, the plasma generator 100 includes a center electrode 110 and a plate 120.
한편, 본 실시예에서 상기 중심전극(110)은 상기 외곽전극(130)과 탈착 가능하도록 결합되는 것도 가능하다. 따라서, 상기 제어부(300)와 상기 플라즈마 발생부(100)가 서로 분리 가능하고, 상기 외곽전극(130)과 상기 중심전극(110)이 서로 분리 가능하도록 결합된다. 이때, 상기 제어부(300)와 상기 플라즈마 발생부(110)의 결합은 상기 제어부(300)의 단부 및 상기 외곽전극(130)에 나사산을 형성하여 서로 돌려 끼워질 수 있고, 상기 제어부(300) 및 상기 외곽전극(130)이 서로 후크 결합되도록 결합홀 및 후크를 형성시키는 것도 가능하다.On the other hand, in the present embodiment, the center electrode 110 may be coupled to the outer electrode 130 to be detachable. Therefore, the controller 300 and the plasma generator 100 are separated from each other, and the outer electrode 130 and the center electrode 110 are coupled to each other. In this case, the coupling of the control unit 300 and the plasma generating unit 110 may be screwed into each other by forming a screw thread on the end of the control unit 300 and the outer electrode 130, the control unit 300 and It is also possible to form a coupling hole and a hook such that the outer electrode 130 is hooked to each other.
도 3을 참조하면, 상기 중심전극(110)은 상기 제어부(300)와 연결되고, 메탈전극(111), 유전체층(113) 및 탄력스프링(115)을 포함한다.Referring to FIG. 3, the center electrode 110 is connected to the controller 300 and includes a metal electrode 111, a dielectric layer 113, and an elastic spring 115.
한편, 본 실시예에서는 상기 중심전극(110)은 상기 플레이트(120)에서 돌출되어 형성된 형태이고, 3개의 상기 중심전극(110)이 원주방향을 따라 일정한 간격을 가지도록 배치된다. 이때, 상기 중심전극(110)은 원기둥의 형태에 단부가 반구형인 경우(도 3a 참조), 하부에 플레이트 없이 분리된 형태(도 3b 참조), 하부에 상기 플레이트(120b)를 구비하고 상기 플레이트(120b)와 연결되며 원뿔대의 형태에 단부가 곡면을 이루도록 형성된 경우(도 3c 참조), 및 하부에 상기 플레이트(120c)를 구비하고 상기 플레이트(120c)와 연결되며 삼각뿔의 형태로 형성된 경우(도 3d 참조)를 포함하여 다양한 형태로 구현 가능하다.Meanwhile, in the present embodiment, the center electrode 110 is formed to protrude from the plate 120, and the three center electrodes 110 are disposed to have a predetermined interval along the circumferential direction. At this time, the center electrode 110 has a semi-spherical end shape in the form of a cylinder (see FIG. 3A), and is separated without a plate (see FIG. 3B) at the bottom, and has the plate 120b at the bottom and the plate ( 120b) and when the end is formed in the shape of a truncated cone (see FIG. 3C), and when the plate 120c is provided at the bottom and connected to the plate 120c and is formed in the form of a triangular pyramid (FIG. 3D). Can be implemented in various forms.
한편, 도 4를 참조하면 상기 중심전극(110)의 단면 구조는 메탈전극(111), 유전체층(113) 및 탄력스프링(115)을 포함한다. Meanwhile, referring to FIG. 4, the cross-sectional structure of the center electrode 110 includes a metal electrode 111, a dielectric layer 113, and an elastic spring 115.
상기 메탈전극(111)은 외측으로 돌출된 형태를 갖고, 상기 메탈전극(111)의 돌출된 면에 상기 유전체층(113)이 균일한 두께로 적층된다. 또한 상기 메탈전극(111)의 상기 제어부(300) 방향의 면에는 상기 탄력스프링(115)이 연결된다. The metal electrode 111 has a shape protruding to the outside, the dielectric layer 113 is laminated on a protruding surface of the metal electrode 111 with a uniform thickness. In addition, the elastic spring 115 is connected to a surface of the metal electrode 111 in the direction of the control unit 300.
도 4 및 도 9를 참조하면, 상기 유전체층(113)은 대상물체(1)와 접촉되도록 최외곽에 형성된 제1유전체층(113a) 및 상기 제1유전체층(113a)의 내측에 적층되는 제2유전체층(113b)을 포함한다. 한편 본 실시예에서는 2중막 구조를 적용하였으나 이에 한정되지 않고 단일 소재로 형성된 단일층 구조 및 복수 개의 층으로 구성된 다중층 구조도 가능하다.4 and 9, the dielectric layer 113 is the first dielectric layer 113a formed at the outermost portion so as to be in contact with the target object 1 and the second dielectric layer stacked inside the first dielectric layer 113a ( 113b). Meanwhile, in the present embodiment, the double layer structure is applied, but the present invention is not limited thereto. A single layer structure formed of a single material and a multilayer structure formed of a plurality of layers are also possible.
본 실시예에서는 상기 제1유전체층(113a)에는 세라믹 소재를 사용하고, 상기 제2유전체층(113b)에는 금속 소재를 사용하였으나, 이에 한정되지 않고 유전체물질로서, 알루미나(Al2O3), 산화 지르코니아(ZrO2) 등을 적용하는 것도 가능하다.In this embodiment, the first as a dielectric material, the first dielectric layer (113a), the ceramic using the material, and the second dielectric layer (113b) include, but the use of the metal material is not limited to, alumina (Al 2 O 3), zirconia It is also possible to apply (ZrO 2 ) or the like.
상기 탄력스프링(115)은 상기 유전체층(113) 및 상기 메탈전극(111)을 탄성지지 하도록 형성된다. 이때 본 실시예에서 상기 탄력스프링(115)은 각각의 상기 돌출부(117)와 결합되는 코일스프링 형태로 도시되어 있으나 이에 한정되지 않고 코일스프링 형태는 물론 상기 유전체층(113) 전체를 탄성 지지하도록 판스프링 형태로 형성된 것을 가능하다.The elastic spring 115 is formed to elastically support the dielectric layer 113 and the metal electrode 111. At this time, the elastic spring 115 is shown in the form of a coil spring coupled to each of the protrusions 117, but is not limited to this, the spring coil shape as well as the plate spring to elastically support the entire dielectric layer 113. It is possible to form in the form.
상기 외곽전극(130)은 상기 중심전극(110)의 외곽에 배치되고, 상기 외곽전극(130)의 내주면이 상기 중심전극(110)과 마주보도록 형성된다. 즉 상기 외곽전극(130)의 내주면의 중심방향에 상기 중심전극(110)이 위치한다.The outer electrode 130 is disposed outside the center electrode 110, and the inner circumferential surface of the outer electrode 130 faces the center electrode 110. That is, the center electrode 110 is positioned in the center direction of the inner circumferential surface of the outer electrode 130.
상기 가스공급부(150)는 가스저장부(도면 미기재)를 포함하고, 상기 제어부(300)와 연결되며, 상기 중심전극(110)과 상기 외곽전극(130) 사이에 배치된다. 즉, 가스저장부(도면 미기재)에서부터 상기 중심전극(110)과 상기 외곽전극(130)의 이격된 공간을 연통시키도록 형성된다.The gas supply unit 150 includes a gas storage unit (not shown), is connected to the control unit 300, and is disposed between the center electrode 110 and the outer electrode 130. That is, the gas storage part (not shown) is formed to communicate the spaced space between the center electrode 110 and the outer electrode 130.
상기 전원공급부(200)는 일측 단부가 상기 제어부(300)와 연결되고, 타측 단부는 외부전원과 연결 가능하도록 형성되며, 내부에 내부전원이 수용가능 하도록 형성된다. 즉, 상기 전원공급부(200)는 외부전원 장치와 탈착 가능하도록 형성되고, 배터리 등 내장 전원장치를 수용 가능하도록 형성된다.One end of the power supply unit 200 is connected to the control unit 300, and the other end of the power supply unit 200 is connected to an external power source, and the internal power source is accommodated therein. That is, the power supply unit 200 is formed to be detachable from the external power supply device, and is formed to accommodate a built-in power supply device such as a battery.
도 5를 참조하면, 상기 제어부(300)는 스위칭부(310), 센서부(330), 출력조절부(350) 및 변압기(370)를 포함한다. 이때, 상기 스위칭부(310)는 상기 전원공급부(200) 및 상기 출력조절부(350)와 연결되고, 상기 센서부(330)는 상기 플라즈마 발생부(100) 및 상기 출력조절부(350)와 연결되며, 상기 출력조절부(350)는 상기 스위칭부(310) 및 상기 센서부(330)와 연결된다.Referring to FIG. 5, the control unit 300 includes a switching unit 310, a sensor unit 330, an output control unit 350, and a transformer 370. In this case, the switching unit 310 is connected to the power supply unit 200 and the output control unit 350, the sensor unit 330 and the plasma generating unit 100 and the output control unit 350 The output control unit 350 is connected to the switching unit 310 and the sensor unit 330.
본 발명의 플라즈마 발생 장치가 의료기기로 이용되는 경우에, 플라즈마 발생부의 피드백 신호를 센싱하는 페회로가 구성될 수 있고, 미용기기로 이용되는 경우에는 센서부 및 센서부로 들어오는 피드백 신호가 없이, 출력 조절부(기기의 상부 스위치 단계조절 스위치)로 제어하는 것도 가능하다.When the plasma generating apparatus of the present invention is used as a medical device, a closed circuit for sensing a feedback signal of the plasma generating unit may be configured, and when used as a beauty device, the sensor unit and the feedback signal coming into the sensor unit may be output. It is also possible to control by the control unit (upper switch step switch of the device).
도 1 및 도 5를 참조하여, 본 발명의 일 실시예에 따른 플라즈마 발생 장치의 작용 및 효과를 설명하면, 스위치 작동 등을 통하여 외부전원 또는 내부전원을 상기 전원공급부(200)로 인가시키면, 상기 스위칭부(310)로 전원이 인가되고, 상기 스위칭부(31)에 인가된 전원의 전압은 소정의 적정 전압으로 변압된다. 한편, 플라즈마 처리에 필요 전원은 30 이상 99 kHz 이하의 저주파를 사용하고, 플라즈마 처리의 소비전력은 1 이상 15 W이하이며, 플라즈마 처리의 접지 전류는 0.1 이상 9.9 mA이하이다.1 and 5, when describing the operation and effect of the plasma generating apparatus according to an embodiment of the present invention, when an external power or internal power is applied to the power supply unit 200 through a switch operation, Power is applied to the switching unit 310, the voltage of the power applied to the switching unit 31 is transformed to a predetermined appropriate voltage. On the other hand, the power source required for plasma processing uses a low frequency of 30 or more and 99 kHz or less, the power consumption of the plasma processing is 1 or more and 15 W or less, and the ground current of the plasma processing is 0.1 or more and 9.9 mA or less.
상기 스위칭부(310)에서 변압된 전류는 상기 플라즈마 발생부(100)로 인가된다. 이때, 상기 메탈전극(111)에 전원이 인가되면, 상기 중심전극(110)은 상기 외곽전극(130), 공기 및 대상물체(1) 등을 포함한 상기 중심전극(110)의 주변과 전위차를 발생시킨다. The current transformed by the switching unit 310 is applied to the plasma generating unit 100. In this case, when power is applied to the metal electrode 111, the center electrode 110 generates a potential difference with the periphery of the center electrode 110 including the outer electrode 130, air, and the object 1. Let's do it.
도 8에는 정극(cathode)과 부극(anode)의 사이에서 발생되는 전위차에 대한 그래프가 도시되어 있다. 이때, 정극과 부극의 가까운 둘레에는 이온(ion)이 모이게 되고, 이온들에 의하여 전계(electric field)가 형성되어 전극으로서의 작용(전위차)이 낮아진다(시스:sheath). 즉, 정극과 부극의 가까운 둘레에는 전위차가 상대적으로 낮아지고, 시스(sheath)가 일어나지 않는 영역에서 목표한 전위차가 발생되며, 이 영역에서 플라즈마가 발생된다.8 shows a graph of the potential difference generated between the cathode and the anode. At this time, ions are collected in the vicinity of the positive electrode and the negative electrode, and an electric field is formed by the ions, thereby lowering the action (potential difference) as an electrode (sheath). That is, the potential difference becomes relatively low near the positive electrode and the negative electrode, and a target potential difference is generated in a region where no sheath occurs, and a plasma is generated in this region.
이와 동시에 상기 가스공급부(150)에도 전원이 인가되어 상기 가스공급부(150)에서는 플라즈마 발생용 가스가 공급된다. 이때 상기 가스공급부(150)에서 공급되는 가스는 청정건조공기(Clean dry air, CDA), 공기(Air), 아르곤(Argon), 네온(Neon), 헬륨(Helium) 또는 혼합가스(Mixture gas)를 사용할 수 있다.At the same time, power is also applied to the gas supply unit 150 so that the gas for supplying plasma is supplied from the gas supply unit 150. In this case, the gas supplied from the gas supply unit 150 may be a clean dry air (CDA), air, argon, neon, helium, or mixed gas. Can be used.
결과적으로 상기 가스공급부(150)에서 공급되는 가스 및 상기 중심전극(110)에서 발생된 전위차에 의하여 플라즈마가 발생된다.As a result, the plasma is generated by the gas supplied from the gas supply unit 150 and the potential difference generated by the center electrode 110.
이때, 상기 메탈전극(111)에서 전위차에 의하여 발생되는 에너지는 상기 유전체층(113)을 거치면서 안정화되어 국소부위에 고에너지가 집중되는 것을 방지한다. 따라서 상기 유전체층(113)을 거치면서 조절된 플라즈마(유전체장벽 플라즈마)를 발생시켜 생체조직 등을 포함한 대상물질에 손상을 미치는 것을 방지한다. 또한, 상기 유전체층(113)은 상기 제1유전체층(113a) 및 상기 제2유전체층(113b)으로 구성되어 상기 중심전극(110)에서 발생하는 플라즈마의 에너지의 분포를 제어할 수 있다. In this case, the energy generated by the potential difference in the metal electrode 111 is stabilized while passing through the dielectric layer 113 to prevent high energy from being concentrated at the localized portion. Therefore, the plasma is generated while passing through the dielectric layer 113 to prevent damage to a target material including biological tissues. In addition, the dielectric layer 113 may include the first dielectric layer 113a and the second dielectric layer 113b to control the distribution of energy of plasma generated from the center electrode 110.
한편, 본 실시예에서는 상기 제1유전체층(113a)에 금속 소재를 금속용사법(metalizing : 비금속 표면에 반용융 상태의 금속 또는 금속화합물을 용착시키는 방식)에 의하여 제2유전체층(113b)을 용착시킨다. 이 경우 세라믹 등으로 형성된 상기 제1유전체층(113a)과 금속용사법에 의하여 용착된 상기 제2유전체층(113b) 사이에 공간이 발생하지 않게 코팅되고, 금속 소재의 상기 제2유전체층(113b)과 상기 메탈전극(111)은 브레이징(brazing)을 통하여 접합시킬 수 있다(세라믹 메탈 브레이징 방식). 따라서, 본 실시예에 따를 경우 세라믹 소재의 상기 제1유전체층(113a)과 상기 제2유전체층(113b) 및 상기 메탈전극(111)이 서로 접합되어 공간이 발생하지 않으므로 국소부위에 에너지가 집중되는 것을 방지하고 안정적인 에너지를 공급시킬 수 있다.Meanwhile, in the present embodiment, the second dielectric layer 113b is welded to the first dielectric layer 113a by metalspraying (welding a metal or metal compound in a semi-melt state onto a nonmetal surface). In this case, a space is not formed between the first dielectric layer 113a formed of ceramic and the second dielectric layer 113b welded by a metal spray method, and the second dielectric layer 113b of the metal material and the metal are coated. The electrode 111 may be bonded through brazing (ceramic metal brazing). Therefore, according to the present embodiment, since the first dielectric layer 113a, the second dielectric layer 113b, and the metal electrode 111 of the ceramic material are bonded to each other, no space is generated and energy is concentrated at a localized portion. It can prevent and supply stable energy.
한편, 도 3을 참조하면, 본 발명에서는 3개의 상기 중심전극(110)이 원주방향을 따라 120도 간격으로 배치된다. 이 경우 상기 3개의 중심전극(110)은 대상물체(1)와 접촉되고, 대상물체(1)와 직접 접촉된 상기 중심전극(110)의 면은 접지되어 플라즈마가 발생되지 않는다. 그러나 대상물체(1)과 직접 접촉되지 않은 상기 중심전극(110)의 면에서는 플라즈마가 생성된다(도 6, 도 7 및 도 9c 참조).Meanwhile, referring to FIG. 3, in the present invention, the three center electrodes 110 are disposed at 120 degree intervals along the circumferential direction. In this case, the three center electrodes 110 are in contact with the object 1, and the surface of the center electrode 110 in direct contact with the object 1 is grounded so that plasma is not generated. However, plasma is generated on the surface of the center electrode 110 which is not in direct contact with the object 1 (see FIGS. 6, 7 and 9c).
도 9에는 본 발명에 의한 상기 중심전극(110)에서 플라즈마가 발생되어 대상물체(1)와 접촉시키는 과정이 도시되어 있다. 먼저, 상기 중심전극(110)이 대상물체(1)와 원거리로 이격되어 있을 때는 플라즈마가 발생하지 않는다(도 9a). 상기 중심전극(110)이 대상물체(1)에 가깝게 접근되면, 대상물체(1)와 상기 중심전극(110)과의 전위차에 의하여 플라즈마가 발생된다. 이때, 돌출된 형태의 상기 중심전극(110)의 경우에는 대상물체(1)와 최단거리를 이루는 방향으로 전기장이 집중되고, 그 결과 플라즈마도 집중적으로 발생된다(도 9b). 도 9c와 같이 상기 중심전극(110)이 대상물체(1)와 완전히 접촉되면, 상기 중심전극(110)의 대상물체(1)와 맞닿은 부분에서는 플라즈마가 발생되지 않지만, 대상물체(1)와 떨어져 있는 부분에서는 여전히 전위차가 발생되고 플라즈마가 발생된다.9 illustrates a process of generating plasma from the center electrode 110 and contacting the object 1 according to the present invention. First, plasma is not generated when the center electrode 110 is remotely spaced apart from the object 1 (FIG. 9A). When the center electrode 110 approaches the object 1, a plasma is generated by the potential difference between the object 1 and the center electrode 110. In this case, in the protruding form of the center electrode 110, the electric field is concentrated in the direction forming the shortest distance with the object 1, and as a result, the plasma is also concentrated (FIG. 9B). As shown in FIG. 9C, when the center electrode 110 is completely in contact with the object 1, no plasma is generated at a portion of the center electrode 110 which is in contact with the object 1, but is separated from the object 1. In that part, there is still a potential difference and a plasma is generated.
그러므로 본 발명에 의하면, 대상물체(1)와 접촉된 상황에서 돌출된 형태의 상기 중심전극(110)의 주위에 환(ring) 형태의 플라즈마가 형성된다. 이 경우, 종래의 평평한 형태의 전극과는 달리 균일하고 안정적인 형태의 플라즈마를 계속하여 유지시킬 수 있다. 즉, 상대적으로 넓은 면적을 갖는 종래의 평평한 형태의 전극에서는, 유체로서의 성질을 갖는 플라즈마가 한 방향으로 쏠리는 현상이 발생되는 것과 달리, 본 발명에 의할 경우 상기 중심전극(110)의 주위에 안정적인 플라즈마가 지속적으로 유지되는 효과가 있다.Therefore, according to the present invention, a ring-shaped plasma is formed around the center electrode 110 which protrudes in the contact with the object 1. In this case, unlike the conventional flat electrode, it is possible to continuously maintain a plasma of a uniform and stable shape. That is, in the conventional flat electrode having a relatively large area, unlike the phenomenon in which the plasma having a fluid property is concentrated in one direction, it is stable around the center electrode 110 according to the present invention. There is an effect that the plasma is continuously maintained.
또한, 도 4를 참조하면, 본 발명에서는 상기 중심전극(110)이 상기 탄력스프링(115)에 의하여 탄성지지되면서 대상물체와 접촉 시 대상물체의 곡면을 따라 압축 및 복원 가능하도록 형성된다. 따라서, 인체 등 곡면을 가진 대상물체에 대해서도 용이하게 사용할 수 있다.In addition, referring to FIG. 4, in the present invention, the center electrode 110 is elastically supported by the elastic spring 115 to be compressed and restored along the curved surface of the object when in contact with the object. Therefore, it can be used easily also for the object which has a curved surface, such as a human body.
한편, 본 발명에서는 상기 중심전극(110)을 탈착 가능하도록 형성하여, 대상물체에 따라 적합한 형태의 중심전극으로 교체할 수 있고, 고장 발생 시에도 용이하게 교체할 수 있다. Meanwhile, in the present invention, the center electrode 110 is formed to be detachable, so that the center electrode 110 can be replaced with a suitable center electrode according to an object, and can be easily replaced even when a failure occurs.
이때, 상기 외곽전극(130)은 대상물체와 접지(earth)되면서, 상기 중심전극(110)과의 전위차를 유발함과 동시에 순간적으로 전위가 상승하는 것을 방지시킨다.At this time, the outer electrode 130 is grounded with the object, causing a potential difference with the center electrode 110 and at the same time to prevent the potential rises.
상기 플라즈마 발생부(100)에서 발생된 플라즈마는 상기 센서부(330)가 측정한다. 상기 센서부(330)는 상기 플라즈마 발생부(100)에서 발생된 플라즈마 전기신호의 강도를 측정하여 상기 출력조절부(350)로 신호를 보낸다. 또한 상기 센서부(330)는 플라즈마 발생과정에서 발생될 수 있는 아크(강한 전류에 의하여 전극이 녹아 방전이 일어나는 현상) 또는 단선 등의 오작동 발생 여부를 측정하고, 오작동이 발생하면 상기 출력조절부(350)에 오작동 발생 사실에 대하여 신호를 보낸다.The plasma generated by the plasma generator 100 is measured by the sensor unit 330. The sensor unit 330 measures the intensity of the plasma electrical signal generated by the plasma generating unit 100 and sends a signal to the output control unit 350. In addition, the sensor unit 330 measures whether there is a malfunction such as an arc (a phenomenon in which the electrode melts due to a strong current and a discharge occurs) or a disconnection that may be generated during a plasma generation process, and if the malfunction occurs, the output control unit ( Signal a malfunction of 350).
상기 출력조절부(350)는 상기 센서부(330)에서 보낸 플라즈마 강도에 대한 신호를 받아 미리 입력된 플라즈마 강도에 대한 정보와 비교한다. 이때, 상기 센서부(330)에서 송신된 플라즈마 강도가 미리 입력된 플라즈마 강도의 범위를 벗어나게 되면, 상기 출력조절부(350)는 플라즈마 강도가 미리 입력된 플라즈마 강도의 범위에 들어가도록 상기 스위칭부(310)로 제어신호를 보내 전류의 량을 제어한다. 또한 상기 출력조절부(350)는 상기 센서부(330)에서 오작동 발생 신호를 송신하게 되면, 전원을 차단시킨다.The output control unit 350 receives a signal for the plasma intensity sent from the sensor unit 330 and compares it with information about a previously input plasma intensity. In this case, when the plasma intensity transmitted from the sensor unit 330 is out of the range of the pre-input plasma intensity, the output control unit 350 may switch the switching unit so that the plasma intensity is within the range of the pre-input plasma intensity. The control signal is sent to 310 to control the amount of current. In addition, when the output controller 350 transmits a malfunction occurrence signal from the sensor unit 330, the output controller 350 shuts off power.
그러므로, 본 발명에 따른 플라즈마 발생 장치는 원주방향을 따라 동일한 간격을 갖도록 돌출된 상기 중심전극(110)을 구비하여 안정적인 플라즈마를 지속적으로 유지시키고, 상기 유전체층(113)과 상기 메탈전극(111)을 접합시켜 전위차를 안정적으로 유지시키며, 상기 외곽전극(130)을 도입하여 조절된 안정적인 플라즈마(유전체장벽 플라즈마)를 발생시키고, 상기 제어부(300)를 통하여 플라즈마의 강도를 제어하여 국소부위에 상대적으로 고에너지가 집중되는 것을 방지한다. 또한 상기 탄력스프링(115)을 도입하여 대상물체의 곡면에 대응가능하고, 상기 중심전극(110)을 탈착 가능하도록하여 대상물체에 따라 교체 가능하도록 하여 사용이 용이하도록 하였다.Therefore, the plasma generating apparatus according to the present invention includes the center electrode 110 protruding at equal intervals along the circumferential direction to maintain a stable plasma and to maintain the dielectric layer 113 and the metal electrode 111. Bonding to maintain the potential difference stably, introducing the outer electrode 130 to generate a controlled stable plasma (dielectric barrier plasma), and control the intensity of the plasma through the control unit 300 to relatively high local Prevents energy concentration In addition, the elastic spring 115 may be introduced to correspond to the curved surface of the target object, and the center electrode 110 may be detachably attached to allow replacement of the spring according to the target object.
실시예 2. 발모촉진기의 탈모 치료 효과 확인Example 2. Confirmation of hair loss treatment effect of hair growth accelerator
실시예 2-1. 탈모 동물모델의 제조 및 플라즈마 처리Example 2-1. Preparation and Plasma Treatment of Hair Loss Animal Models
6주령의 C57BL/6J 마우스 수컷을 무작위로 표 1과 같이 분류하고, 마우스의 등(dorsal) 양측 부위에 8mm의 조직 천공기(biopsy punch)를 이용하여 상처를 유도하였다. Six-week-old males of C57BL / 6J mice were randomly classified as shown in Table 1, and wounds were induced using a 8 mm biopsy punch on both sides of the dorsal of the mouse.
제조예Production Example 그룹당 개체수(n)Number of objects per group (n) 비고Remarks
음성 대조군(Negative control)Negative control 44 상처 유도 후 플라즈마 처리하지 않은 마우스Non-Plasma Treated Mice After Wound Induction
플라즈마 처리군(Plasma treated)Plasma treated group 44 상처 유도 후 플라즈마 처리한 마우스Plasma Treated Mice After Wound Induction
양성 대조군(Normal)Positive Control (Normal) 44 상처 유도하지 않은 정상 마우스Wound-induced normal mice
상처 부위를 멸균된 식염수로 세척 후 실시예 1에서 제조한 발모촉진기로 플라즈마를 처리하였다. 플라즈마를 방전하기 위한 전압은 2.5 내지 3.0kV의 교류전압을 인가하였고, 실험 1일째와 3일째 각각 20초간으로 1주일에 총2회 처리하였다.The wound was washed with sterile saline and then treated with plasma using the hair growth promoter prepared in Example 1. An AC voltage of 2.5 to 3.0 kV was applied as a voltage for discharging the plasma, and the treatment was performed twice a week for 20 seconds on the first and third days of the experiment.
플라즈마 처리 후 상처 주위에 가이드 링인 의료용 실리콘(내부 직경 12mm, 2mm 두께) 으로 만든 링을 붙이고, 의료용 스테플러를 이용하여 4군데를 고정시켜, 상처 조직이 스스로 수축에 의한 치유가 되는 것을 방지하였다. 이를 도 8에 나타내었다.After the plasma treatment, a ring made of medical silicone (inner diameter 12 mm, 2 mm thick), which was a guide ring, was attached to the wound, and four places were fixed using a medical stapler to prevent the wound tissue from healing itself by contraction. This is shown in FIG. 8.
가이드 링을 부착한 상처부위는 통기성이 좋고 산소와 수증기가 잘 통과하고, 방수이면서 세균에 대한 감염을 막을 수 있는 3M사의 테가덤(Tegaderm) 투명밴드로 감싼 후, 그 위를 신축성 붕대로 한번 더 감싸주었다. 3일마다 상처 부위를 소독하면서 총 3주(21일) 간 육안으로 상처 부위의 조직 재생과 발모 양상을 확인하였다. 상기 조직 관찰 시의 사진을 도 9에 나타내었다.The wound with the guide ring is well ventilated, well passed through oxygen and water vapor, is waterproof, and wrapped with 3M's Tegaderm transparent band, which is resistant to bacterial infection. More wrapped. The wound was disinfected every 3 days and the tissue regeneration and hair growth of the wound were visually confirmed for 3 weeks (21 days). The photograph at the time of the said tissue observation is shown in FIG.
실시예 2-2. 상처부위 재생 조직의 조직염색학적 확인Example 2-2. Histological staining of wound tissue regeneration
상처 유도 3주 후에 마우스의 상처 조직을 생검하여 H&E 염색을 실시하였다. 상기 염색 결과를 도 10에 나타내었다.Three weeks after wound induction, the wound tissues of the mice were biopsied and subjected to H & E staining. The staining results are shown in FIG. 10.
실험 결과, 상처 유도된 조직의 재상피화(reepithelialization)는 음성 대조군과 플라즈마 처리군이 비슷한 정도(약 50%)로 복구된 것으로 나타났다. 그러나 완전한 상처 치유를 나타내는 상처 회복(wound repair)은 플라즈마 처리군(16.7%)이 대조군(12.5%)에 비해서 약 4.2% 정도 향상되었다. Experimental results showed that re-epithelialization of wound-induced tissues recovered to a similar extent (about 50%) between the negative control and plasma treatment groups. However, wound repair, which indicates complete wound healing, was improved by about 4.2% in the plasma treated group (16.7%) compared to the control group (12.5%).
실시예 2-3. 상처부위 모발의 계수 및 분류Example 2-3. Counting and classification of wound hair
상처 부위의 플라즈마 처리에 따른 모발 성장성을 평가하기 위하여 조직 사진 내의 모낭(hair follicle)을 계수하고, 각각 조직의 모낭 상태를 성장기(anagen), 퇴행기(catagen), 및 휴지기(telogen)로 분류하였다. 그 결과를 도 11에 기재하였다. Hair follicles in the tissue photographs were counted to evaluate hair growth following plasma treatment of the wound site, and the hair follicle states of the tissues were classified into anagen, catagen, and telogen, respectively. The result is shown in FIG.
실험 결과, 전체 모낭의 수는 플라즈마 처리군(12.8개)이 음성대조군(7.8개)이나 양성대조군(9개)보다 많은 것으로 분석되었다. 상기의 결과는 실시예 2-2의 H&E 염색 결과와도 일치하는 것이다. As a result, the total number of hair follicles was found to be greater in the plasma treated group (12.8) than in the negative control group (7.8) or the positive control group (9). The above result is also consistent with the H & E staining result of Example 2-2.
모낭의 상태 분류 결과에서도 플라즈마 처리군에서는 성장기(4.5개)와 퇴행기(5.8개) 모발의 비율이 음성대조군(성장기 1.3개, 퇴행기 2.3개) 또는 양성대조군(성장기 3.3개, 퇴행기 4.5개)에 비해 높은 것으로 확인되었다. 상기의 결과로 플라즈마 처리가 발모 촉진을 유도한다는 것을 확인할 수 있었다.In the hair follicle classification results, the proportion of hair growth (4.5) and degenerative (5.8) hairs in the plasma treated group was lower than that of the negative control group (1.3 growth stage, 2.3 degenerative stage) or positive control group (3.3 growth stage, 4.5 degenerative stage). It was confirmed to be high. As a result, it was confirmed that the plasma treatment induced hair growth promotion.
이상 본 발명을 구체적인 실시예를 통하여 상세히 설명하였으나, 이는 본 발명을 구체적으로 설명하기 위한 것으로, 본 발명은 이에 한정되지 않으며, 본 발명은 본 발명의 기술적 사상 내에서 당해 분야의 통상의 지식을 가진 자에 의해 그 변형이나 개량이 가능함은 명백하다.Although the present invention has been described in detail through specific examples, it is intended to specifically describe the present invention, and the present invention is not limited thereto, and the present invention has ordinary knowledge in the art within the technical spirit of the present invention. It is obvious that the modification or improvement is possible by the ruler.
본 발명의 단순한 변형 내지 변경은 모두 본 발명의 영역에 속하는 것으로 본 발명의 구체적인 보호 범위는 첨부된 특허청구범위에 의하여 명확해질 것이다. All simple modifications and variations of the present invention fall within the scope of the present invention, and the specific scope of protection of the present invention will be apparent from the appended claims.
[부호의 설명][Description of the code]
100 : 플라즈마 발생부100: plasma generating unit
110 : 중심전극110: center electrode
111 : 메탈전극111: metal electrode
113 : 유전체층113: dielectric layer
115 : 탄력스프링115: elastic spring
130 : 외곽전극130: outer electrode
150 : 가스공급부150: gas supply unit
200 : 전원공급부200: power supply
300 : 제어부300: control unit
310 : 스위칭부310: switching unit
330 : 센서부330: sensor
350 : 출력조절부350: output control unit
본 발명에 따른 플라즈마 발생 장치는 균일하고 안전하게 플라즈마를 발생시킬 수 있는 효과가 있으므로, 미용 및 의료기기 분야에 큰 활용이 기대된다.Plasma generating device according to the present invention has an effect that can generate a plasma uniformly and safely, it is expected to be greatly utilized in the field of cosmetic and medical devices.

Claims (19)

  1. 대상물체와 접촉 상태에서 전위차에 의하여 플라즈마를 발생시키는 중심전극이 돌출되어 형성되고, 외곽전극이 상기 중심전극의 외곽에 원주방향을 따라 형성된 플라즈마 발생부;A plasma generating part protruding from the center electrode for generating a plasma due to a potential difference in contact with an object, and an outer electrode formed along the circumferential direction of the outer electrode;
    상기 플라즈마 발생부에 전원을 공급시키도록 구비된 전원공급부; 및A power supply unit provided to supply power to the plasma generation unit; And
    상기 전원공급부와 연결되고, 상기 플라즈마 발생부에서 발생시키는 플라즈마의 강도를 제어하도록 구비된 제어부;를 포함하는 플라즈마 발생 장치.And a control unit connected to the power supply unit and configured to control the intensity of the plasma generated by the plasma generation unit.
  2. 제 1항에 있어서,The method of claim 1,
    상기 플라즈마 발생부는,The plasma generation unit,
    상기 중심전극과 상기 외곽전극 사이에 가스를 공급시키는 가스공급부;를 추가로 포함하는 것을 특징으로 하는 플라즈마 발생 장치.And a gas supply unit for supplying a gas between the center electrode and the outer electrode.
  3. 제 1항에 있어서,The method of claim 1,
    상기 중심전극은,The center electrode,
    인가된 전압을 이용하여 전위차를 발생시키는 메탈전극; 및A metal electrode generating a potential difference using an applied voltage; And
    상기 메탈전극과 접합되어 플라즈마를 안정시키도록 형성된 유전체층;을 포함하는 것을 특징으로 하는 플라즈마 발생 장치.And a dielectric layer bonded to the metal electrode to stabilize the plasma.
  4. 제 3항에 있어서,The method of claim 3, wherein
    상기 유전체층은,The dielectric layer,
    대상물체와 접촉하도록 형성된 제1유전체층; 및A first dielectric layer formed to contact the object; And
    상기 제1유전체층과 상기 메탈전극 사이에 적층되도록 형성된 제2유전체층;을 포함하는 것을 특징으로 하는 플라즈마 발생 장치.And a second dielectric layer formed to be stacked between the first dielectric layer and the metal electrode.
  5. 제 4항에 있어서,The method of claim 4, wherein
    상기 제2유전체층은,The second dielectric layer is,
    상기 메탈전극과 상기 제1유전체층을 접합시키도록 상기 제1유전체층에 금속 소재를 금속용사법으로 용착시켜 형성된 것을 특징으로 하는 플라즈마 발생 장치.And a metal material is welded to the first dielectric layer by metal spraying so as to bond the metal electrode and the first dielectric layer.
  6. 제 1항에 있어서,The method of claim 1,
    상기 중심전극은,The center electrode,
    대상물체와 접촉 시, 대상물체의 곡면을 따라 압축 및 복원이 가능하도록 탄성지지되는 것을 특징으로 하는 플라즈마 발생 장치.Plasma generator, characterized in that when the contact with the object is elastically supported to enable compression and restoration along the curved surface of the object.
  7. 제 1항에 있어서,The method of claim 1,
    상기 중심전극은,The center electrode,
    원주방향을 따라 120도 간격으로 돌출된 형태로 형성된 것을 특징으로 하는 플라즈마 발생 장치.Plasma generator, characterized in that formed in a shape protruding at intervals of 120 degrees along the circumferential direction.
  8. 제 1항에 있어서,The method of claim 1,
    상기 중심전극은,The center electrode,
    탈착 가능하도록 결합된 것을 특징으로 하는 플라즈마 발생 장치.Plasma generator, characterized in that coupled to be detachable.
  9. 제 1항에 있어서,The method of claim 1,
    상기 제어부는,The control unit,
    플라즈마가 발생되도록 통전 시 입력된 전원을 변압시키고, 대상물체에 인가되는 플라즈마의 강도를 인식하여 소정 강도를 유지시키는 것을 특징으로 하는 플라즈마 발생 장치.And transforming the power input during energization so that the plasma is generated, and recognizing the intensity of the plasma applied to the object to maintain a predetermined intensity.
  10. (a) 개체의 피부 표면에 제 1항 내지 제 9항 중 어느 한 항 이상의 플라즈마 발생 장치를 접촉시키는 단계; 및(a) contacting the plasma generating device of any one of claims 1 to 9 with the skin surface of the individual; And
    (b) 플라즈마를 발생시키는 단계;를 포함하는, 피부 미용 방법.(b) generating a plasma.
  11. 제 10항에 있어서,The method of claim 10,
    상기 피부 미용은 피부 개질, 보습, 미백, 주름 제거, 탈모 억제, 또는 발모 촉진인 것을 특징으로 하는, 피부 미용 방법.The skin beauty is characterized in that the skin is modified, moisturizing, whitening, wrinkle removal, hair loss suppression, or hair growth promotion.
  12. 제 11항에 있어서,The method of claim 11,
    상기 발모 촉진은,The hair growth promotion,
    모발 또는 모낭의 개수를 증가시키는 것임을 특징으로 하는, 피부 미용 방법.Skin cosmetic method, characterized in that to increase the number of hair or hair follicles.
  13. 제 11항에 있어서,The method of claim 11,
    상기 발모 촉진은,The hair growth promotion,
    성장기(anagen) 또는 퇴행기(catagen) 모낭의 개수를 증가시키는 것임을 특징으로 하는, 피부 미용 방법.A method for skin beauty, characterized in that to increase the number of anagen or catagen hair follicles.
  14. 제 10항에 있어서,The method of claim 10,
    상기 (b) 단계에서의 플라즈마 발생은 1.5 내지 5.0kV의 교류전압을 인가하는 것을 특징으로 하는, 피부 미용 방법.Plasma generation in the step (b) is characterized in that to apply an alternating voltage of 1.5 to 5.0kV, skin cosmetic method.
  15. 제 10항에 있어서,The method of claim 10,
    상기 (b) 단계에서의 플라즈마 발생은 1 내지 200초 동안 유지하는 것을 특징으로 하는, 피부 미용 방법.Plasma generation in the step (b) is characterized in that it is maintained for 1 to 200 seconds, skin care method.
  16. (a) 개체의 피부 표면에 제 1항 내지 제 9항 중 어느 한 항 이상의 플라즈마 발생 장치를 접촉시키는 단계; 및(a) contacting the plasma generating device of any one of claims 1 to 9 with the surface of the subject's skin; And
    (b) 플라즈마를 발생시키는 단계;를 포함하는, 상처 치료 방법.(b) generating a plasma.
  17. 제 16항에 있어서,The method of claim 16,
    상기 상처는 자상, 박피, 발진, 염증, 궤양, 또는 스크레치에 의한 피부 손상인, 상처 치료 방법.And the wound is skin damage by cuts, peels, rashes, inflammation, ulcers, or scratches.
  18. 제 17항에 있어서,The method of claim 17,
    상기 (b) 단계에서의 플라즈마 발생은 1.5 내지 5.0kV의 교류전압을 인가하는 것을 특징으로 하는, 상처 치료 방법.Plasma generation in the step (b) is characterized in that to apply an alternating voltage of 1.5 to 5.0kV, wound treatment method.
  19. 제 17항에 있어서,The method of claim 17,
    상기 (b) 단계에서의 플라즈마 발생은 1 내지 200초 동안 유지하는 것을 특징으로 하는, 상처 치료 방법.The plasma generation in step (b) is characterized in that for 1 to 200 seconds, wound treatment method.
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