WO2017193445A1 - 金属光栅偏光片及其制作方法 - Google Patents

金属光栅偏光片及其制作方法 Download PDF

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Publication number
WO2017193445A1
WO2017193445A1 PCT/CN2016/085791 CN2016085791W WO2017193445A1 WO 2017193445 A1 WO2017193445 A1 WO 2017193445A1 CN 2016085791 W CN2016085791 W CN 2016085791W WO 2017193445 A1 WO2017193445 A1 WO 2017193445A1
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Prior art keywords
metal
substrate
wire grid
grating
gratings
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English (en)
French (fr)
Inventor
陈黎暄
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US15/115,688 priority Critical patent/US10048419B2/en
Publication of WO2017193445A1 publication Critical patent/WO2017193445A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • B29L2011/0066—Optical filters

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a metal grating polarizer and a method of fabricating the same.
  • Nano-imprint Lithography (NIL) technology breaks through the problem of traditional lithography in the process of feature size reduction, featuring high resolution, low cost and high yield. Since its introduction in 1995, nanoimprint has evolved a variety of imprinting technologies, widely used in semiconductor manufacturing, Microelectromechanical Systems (MEMS), biochips, biomedical and other fields.
  • MEMS Microelectromechanical Systems
  • the basic idea of NIL technology is to transfer the pattern to the corresponding substrate through a template.
  • the transferred medium is usually a thin layer of polymer film, which is hardened by hot pressing or irradiation to preserve the transfer.
  • Graphics The entire process includes two processes: embossing and graphics transfer.
  • NIL can be mainly divided into three kinds of lithography technologies: hot embossing, ultraviolet (UV) curing and micro contact printing (uCP).
  • polarizers are a combination of multilayer films.
  • the most central part is the polarizing layer, usually a poly-electron molecule containing polarizing action.
  • a vinyl alcohol (PVA) layer followed by a protective layer on each side of the polarizing layer, usually a transparent cellulose triacetate (TAC) layer, mainly for maintaining the stretched state of the polarizer in the polarizing layer, avoiding polarizers
  • PVA vinyl alcohol
  • TAC transparent cellulose triacetate
  • the loss of moisture protects it from external influences, and the polarizer generates polarized light by the absorption of dihydration iodine molecules.
  • the object of the present invention is to provide a metal grating polarizer, wherein the metal grating is divided into a first wire grid and a second wire grid having different heights, and a double-cycle grating structure can be formed, thereby achieving better optical performance. Having more global optimization parameters makes it more scientific and flexible to regulate its optical performance.
  • Another object of the present invention is to provide a method for fabricating a metal grating polarizer, which can be fabricated.
  • the grating structure has a high level of variation, and the preparation process is simple.
  • the present invention first provides a metal grating polarizer comprising a substrate and a plurality of metal gratings formed on the substrate;
  • the metal grating is divided into a first wire grid and a second wire grid.
  • the plurality of first wire grids and the plurality of second wire grids are alternately arranged on the substrate and are periodically arranged.
  • the first wire grid has a first height H1.
  • the second wire grid has a second height H2 whose height relationship satisfies (H1-H2)/H1>10%.
  • the width of the metal grating is between 20 and 150 nm; the distance between two adjacent metal gratings is between 20 and 150 nm.
  • the metal grating polarizer further includes a buffer layer disposed on the substrate and the plurality of metal gratings.
  • the plurality of metal gratings are disposed at equal intervals on the substrate.
  • Each of the first wire grids is interleaved with a second wire grid.
  • the invention also provides a method for manufacturing a metal grating polarizer, comprising the following steps:
  • Step 1 Providing a metal substrate, and coating a surface of the metal substrate with a layer of light glue;
  • Step 2 providing an imprint template, placing the imprint template on the photo-adhesive for nanoimprinting, so that the photo-adhesive on the metal substrate forms a plurality of first photoresist strips and a plurality of second photoresist strips arranged at intervals Wherein the height of the first photoresist strip is greater than the height of the second photoresist strip;
  • Step 3 removing the imprint template, using the photo-glue as a shielding layer, performing dry etching on the metal substrate, forming a plurality of metal gratings on the metal substrate, the metal grating being divided into a first wire grid and a second wire grid
  • the first wire grid is formed corresponding to the first photoresist strip
  • the second wire grid is formed corresponding to the second photoresist strip to obtain a metal grating polarizer comprising a substrate and a plurality of metal gratings on the substrate;
  • the plurality of first wire grids and the plurality of second wire grids are staggered and periodically arranged on the substrate, the first wire grid has a first height H1, and the second wire grid has a second height H2, wherein the The height relationship between the first wire grid and the second wire grid satisfies (H1-H2)/H1>10%.
  • the metal grating has a width of between 20 and 150 nm and a distance between adjacent two metal gratings of between 20 and 150 nm.
  • the plurality of metal gratings are disposed at equal intervals on the substrate.
  • Each of the first wire grids is interleaved with a second wire grid.
  • the stamping template provided in the step 2 has a plurality of first grating grooves and a plurality of second grating grooves, the first grating grooves having a depth greater than a depth of the second grating grooves, the first photoresist
  • the strip and the second photoresist strip are respectively formed corresponding to the first grating recess and the second grating recess; and the step 3 further comprises: removing the remaining photo-adhesive after the dry etching, and coating on the formed plurality of metal gratings Forming a buffer layer, and the obtained metal grating polarizer further comprises a substrate, and a plurality of metal gratings The buffer layer on it.
  • the invention also provides a metal grating polarizer comprising a substrate and a plurality of metal gratings formed on the substrate;
  • the metal grating is divided into a first wire grid and a second wire grid.
  • the plurality of first wire grids and the plurality of second wire grids are alternately arranged on the substrate and are periodically arranged.
  • the first wire grid has a first height H1.
  • the second wire grid has a second height H2, and the height relationship between the first wire grid and the second wire grid satisfies (H1-H2)/H1>10%;
  • the width of the metal grating is between 20-150 nm; the distance between two adjacent metal gratings is between 20-150 nm;
  • the invention also includes a buffer layer disposed on the substrate and the plurality of metal gratings.
  • the metal grating polarizer of the present invention comprises a substrate and a plurality of metal gratings formed on the substrate; the metal grating is divided into a first wire grid and a second wire grid having different heights, and a metal grating can be formed
  • a two-cycle grating structure for better optical performance, with more global optimization parameters makes it more scientific and flexible to regulate its optical performance.
  • the method for fabricating the metal grating polarizer of the invention can produce a grating structure with a high level of variation, and the preparation process is simple.
  • FIG. 1 is a schematic structural view of a metal grating polarizer of the present invention
  • FIG. 2 is a schematic flow chart of a method for fabricating a metal grating polarizer of the present invention
  • FIG. 3 is a schematic view showing the first step of the method for fabricating the metal grating polarizer of the present invention
  • 4a-4b are schematic views of the second step of the method for fabricating the metal grating polarizer of the present invention.
  • 5-6 is a schematic view showing the third step of the method for fabricating the metal grating polarizer of the present invention.
  • the present invention provides a metal grating polarizer comprising a substrate 10 and a plurality of metal gratings formed on the substrate;
  • the metal grating is divided into a first wire grid 21 and a second wire grid 22, and the plurality of first wire grids 21 and the plurality of second wire grids 22 are staggered and arranged periodically on the substrate 10, and the first wire grid 21 has The first height H1, the second wire grid 22 has a second height H2, and the height relationship of the first wire grid 21 and the second wire grid 22 satisfies (H1-H2)/H1>10%.
  • the width of the metal grating is between 20-150 nm; the distance between adjacent two metal gratings is between 20-150 nm.
  • the metal grating polarizer further includes a buffer layer 30 disposed on the substrate 10 and the plurality of metal gratings to protect the plurality of metal gratings on the metal grating polarizer.
  • each of the first wire grids 21 is interleaved with a second wire grid 22, that is, the plurality of first wire grids 21 and the plurality of second wire grids 22 are arranged in a high and low structural period, and the plurality of metal gratings are on the substrate.
  • 10 is preferably equally spaced, in which case the distance between adjacent two first wire grids 21 and the distance between adjacent two second wire grids 22 are equal.
  • the plurality of first wire grids 21 and the plurality of second wire grids 22 can also be designed to be high, low, high, low, or high, low, low, high, low, and the like.
  • the metal grating thereon is divided into a first wire grid 21 and a second wire grid 22 having different heights, and a double-cycle grating structure can be formed, thereby achieving better optical performance, and having 15 Global optimization parameters make it more scientific and flexible to regulate its optical performance.
  • the present invention further provides a method for fabricating a metal grating polarizer, comprising the following steps:
  • Step 1 As shown in FIG. 3, a metal substrate 100 is provided, and a layer of photoresist 300 is coated on the surface of the metal substrate 100.
  • Step 2 as shown in FIG. 4a-4b, an imprint template 500 is provided, and the imprint template is placed on the photo-adhesive 300 for nanoimprinting, so that the photo-adhesive 300 on the metal substrate 100 is formed into a plurality of strips.
  • the imprint template 500 provided in the step 2 has a plurality of first grating grooves 510 and a plurality of second grating grooves 520, wherein the depth of the first grating grooves 510 is greater than the depth of the second grating grooves 520
  • the first photoresist strip 310 and the second photoresist strip 310 are respectively formed corresponding to the first grating recess 510 and the second grating recess 520.
  • Step 3 as shown in FIG. 5-6, removing the imprint template 500, using the photo-adhesive 300 as a shielding layer, performing dry etching on the metal substrate 500, and forming a plurality of metal gratings on the metal substrate 500.
  • the metal grating is divided into a first wire grid 21 and a second wire grid, wherein the first wire grid 21 is formed corresponding to the first photoresist strip 310, and the second wire grid 22 is formed corresponding to the second photoresist strip 320 to obtain a metal grating polarizer;
  • the metal grating polarizer comprises a substrate 10 and a plurality of metal gratings on the substrate 10, wherein the number The strip first grid 21 and the plurality of second grids 22 are staggered and periodically arranged on the substrate 10, the first grid 21 has a first height H1, and the second grid 22 has a second height H2.
  • the height relationship of the first wire grid 21 and the second wire grid 22 satisfies (H1-H2)/H1>10%.
  • the step 3 further includes: after the dry etching, removing the remaining photo-adhesive 300, and coating a plurality of metal gratings to form a buffer layer 30, that is, as shown in FIG.
  • the polarizer further includes a buffer layer 30 disposed on the substrate 10 and a plurality of metal gratings.
  • the width of the metal grating is between 20-150 nm; the distance between adjacent two metal gratings is between 20-150 nm.
  • each of the first wire grids 21 and one of the second wire grids 22 are staggered on the substrate 10, that is, the plurality of first wire grids 21 and the plurality of second wire grids 22 are arranged in a high and low structural period.
  • the metal gratings are preferably disposed at equal intervals on the substrate 10. At this time, the distance between the adjacent two first wire grids 21 and the distance between the adjacent two second wire grids 22 are equal.
  • the plurality of first wire grids 21 and the plurality of second wire grids 22 can also be designed to be high, low, high, low, or high, low, low, high, low, and the like.
  • the metal grating polarizer of the present invention comprises a substrate and a plurality of metal gratings formed on the substrate; the metal grating is divided into a first grid and a second grid having different heights, which can form a double
  • the periodic grating structure in order to achieve better optical performance, with more global optimization parameters makes it more scientific and flexible to regulate its optical performance.
  • the method for fabricating the metal grating polarizer of the invention can produce a grating structure with a high level of variation, and the preparation process is simple.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
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Abstract

一种金属光栅偏光片及其制作方法。所述金属光栅偏光片包括基板(10)及形成在基板(10)上的数条金属光栅；所述金属光栅分为高度不同的第一线栅(21)和第二线栅(22)，可以形成一种双周期的光栅结构，从而达成更好的光学性能，具有较多的全局优化参数使得调控其光学性能变得更为科学和灵活。所述金属光栅偏光片的制作方法，可以制作出高度层次变化的光栅结构，且制备工艺简单。

Description

金属光栅偏光片及其制作方法 技术领域
本发明涉及显示技术领域，尤其涉及一种金属光栅偏光片及其制作方法。
背景技术
纳米压印(Nano-imprint Lithography，NIL)技术突破了传统光刻在特征尺寸减小过程中的难题，具有分辨率高、低成本、高产率的特点。自1995年提出以来，纳米压印已经演变出了多种压印技术，广泛应用于半导体制造、微机电系统(Microelectromechanical Systems，MEMS)、生物芯片、生物医学等领域。NIL技术的基本思想是通过模版，将图形转移到相应的衬底上，转移的媒介通常是一层很薄的聚合物膜，通过热压或者辐照等方法使其结构硬化从而保留下转移的图形。整个过程包括压印和图形转移两个过程。根据压印方法的不同，NIL主要可分为热塑(Hot embossing)、紫外(UV)固化和微接触(Micro contact printing，uCP)三种光刻技术。
对于需要使用偏光片的各类器件，例如LCD、OLED等，传统的偏光片是由多层膜组合而成的，其中最核心的部分是偏光层，通常为含有具有偏光作用的碘分子的聚乙烯醇(PVA)层，其次是分别位于偏光层两侧的保护层，通常为透明的三醋酸纤维素(TAC)层，主要是为了维持偏光层中偏光子的被拉伸状态，避免偏光子水分的流失，保护其不受外界影响，该偏光片通过二向碘分子的吸收作用来产生偏振光。随着纳米压印技术的发展，人们已经可以尝试制备小尺寸的金属光栅结构，来达到对可见光波长范围的光的偏振作用，由于金属光栅结构本身对光的吸收很小，通过反射自然光的一个偏振而让另外一个偏振通过，可以使被反射的光通过偏振旋转再次被回收利用，因此在液晶显示中具有很大的潜力。
发明内容
本发明的目的在于提供一种金属光栅偏光片，其上的金属光栅分为高度不同的第一线栅和第二线栅，可以形成一种双周期的光栅结构，从而达成更好的光学性能，具有较多的全局优化参数使得调控其光学性能变得更为科学和灵活。
本发明的目的还在于提供一种金属光栅偏光片的制作方法，可以制作 出高度层次变化的光栅结构，且制备工艺简单。
为实现上述目的，本发明首先提供一种金属光栅偏光片，包括基板、及形成在基板上的数条金属光栅；
所述金属光栅分为第一线栅和第二线栅，数条第一线栅和数条第二线栅在基板上交错设置且呈周期排列，所述第一线栅具有第一高度H1，所述第二线栅具有第二高度H2，所述第一线栅和第二线栅的高度关系满足(H1-H2)/H1>10％。
所述金属光栅的宽度在20-150nm之间；相邻两金属光栅之间的距离在20-150nm之间。
所述的金属光栅偏光片还包括设于所述基板、及数条金属光栅上的缓冲层。
所述数条金属光栅在基板上为等间隔设置。
每一第一线栅与一个第二线栅交错设置。
本发明还提供一种金属光栅偏光片的制作方法，包括以下步骤：
步骤1、提供金属衬底，在金属衬底上表面涂覆一层光胶；
步骤2、提供压印模板，将压印模板放置在光胶上进行纳米压印，使金属衬底上的光胶形成间隔排布的数条第一光阻条和数条第二光阻条，其中，第一光阻条的高度大于第二光阻条的高度；
步骤3、移去压印模板，以光胶为遮蔽层，对金属衬底进行干法蚀刻，在金属衬底上形成数条金属光栅，所述金属光栅分为第一线栅和第二线栅，其中第一线栅对应第一光阻条形成，第二线栅对应第二光阻条形成，得到包括基板、及基板上的数条金属光栅的金属光栅偏光片；
其中，数条第一线栅和数条第二线栅在基板上交错设置且呈周期排列，所述第一线栅具有第一高度H1，所述第二线栅具有第二高度H2，所述第一线栅和第二线栅的高度关系满足(H1-H2)/H1>10％。
所述金属光栅的宽度在20-150nm之间，相邻两金属光栅之间的距离在20-150nm之间。
所述数条金属光栅在基板上为等间隔设置。
每一第一线栅与一个第二线栅交错设置。
所述步骤2提供的压印模板具有数条第一光栅凹槽和数条第二光栅凹槽，所述第一光栅凹槽的深度大于第二光栅凹槽的深度，所述第一光阻条、第二光阻条分别对应第一光栅凹槽、第二光栅凹槽形成；所述步骤3还包括，在干法蚀刻后去除剩余的光胶，在形成的数条金属光栅上涂布形成一层缓冲层，所得到金属光栅偏光片还包括设于所述基板、及数条金属光栅 上的缓冲层。
本发明还提供一种金属光栅偏光片，包括基板、及形成在基板上的数条金属光栅；
所述金属光栅分为第一线栅和第二线栅，数条第一线栅和数条第二线栅在基板上交错设置且呈周期排列，所述第一线栅具有第一高度H1，所述第二线栅具有第二高度H2，所述第一线栅和第二线栅的高度关系满足(H1-H2)/H1>10％；
其中，所述金属光栅的宽度在20-150nm之间；相邻两金属光栅之间的距离在20-150nm之间；
还包括设于所述基板、及数条金属光栅上的缓冲层。
本发明的有益效果：本发明的金属光栅偏光片，包括基板、及形成在基板上的数条金属光栅；所述金属光栅分为高度不同的第一线栅和第二线栅，可以形成一种双周期的光栅结构，从而达成更好的光学性能，具有较多的全局优化参数使得调控其光学性能变得更为科学和灵活。本发明的金属光栅偏光片的制作方法，可以制作出高度层次变化的光栅结构，且制备工艺简单。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其他有益效果显而易见。
附图中，
图1为本发明的金属光栅偏光片的结构示意图；
图2为本发明的金属光栅偏光片的制作方法的示意流程图；
图3为本发明的金属光栅偏光片的制作方法的步骤1的示意图；
图4a-4b为本发明的金属光栅偏光片的制作方法的步骤2的示意图；
图5-6为本发明的金属光栅偏光片的制作方法的步骤3的示意图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图1，本发明提供一种金属光栅偏光片，包括基板10、及形成在基板上的数条金属光栅；
所述金属光栅分为第一线栅21和第二线栅22，数条第一线栅21和数条第二线栅22在基板10上交错设置且呈周期排列，所述第一线栅21具有 第一高度H1，所述第二线栅22具有第二高度H2，所述第一线栅21和第二线栅22的高度关系满足(H1-H2)/H1>10％。
具体地，所述金属光栅的宽度在20-150nm之间；相邻两金属光栅之间的距离在20-150nm之间。
具体地，所述金属光栅偏光片还包括设于所述基板10、及数条金属光栅上的缓冲层30，以对金属光栅偏光片上的数条金属光栅进行保护。
具体地，如图1所示，所述金属光栅偏光片在使用过程中，所述基板10上设有金属光栅的一侧作为入光面，对通过的光线实现偏光作用。特别地，每一第一线栅21与一个第二线栅22交错设置，即数条第一线栅21和数条第二线栅22按照高低高低的结构周期排列，所述数条金属光栅在基板10上优选为等间隔设置，此时，相邻两第一线栅21之间的距离以及相邻两第二线栅22之间的距离都相等。除此之外，数条第一线栅21和数条第二线栅22也可以设计为高高低高高低、或高高低低高高低低等其他高低起伏的结构周期排列。
本发明的金属光栅偏光片，其上的金属光栅分为高度不同的第一线栅21和第二线栅22，可以形成一种双周期的光栅结构，从而达成更好的光学性能，具有15个全局优化参数使得调控其光学性能变得更为科学和灵活。
请参阅图2，并结合图1，本发明还提供一种金属光栅偏光片的制作方法，包括以下步骤：
步骤1、如图3所示，提供金属衬底100，在金属衬底100上表面涂覆一层光胶300。
步骤2、如图4a-4b所示，提供压印模板500，将压印模板放置在光胶300上进行纳米压印，使金属衬底100上的光胶300形成间隔排布的数条第一光阻条310和数条第二光阻条320，其中，第一光阻条310的高度大于第二光阻条320的高度。
具体地，所述步骤2提供的压印模板500具有数条第一光栅凹槽510和数条第二光栅凹槽520，其中第一光栅凹槽510的深度大于第二光栅凹槽520的深度，所述第一光阻条310、第二光阻条310分别对应第一光栅凹槽510、第二光栅凹槽520形成。
步骤3、如图5-6所示，移去压印模板500，以光胶300为遮蔽层，对金属衬底500进行干法蚀刻，在金属衬底500上形成数条金属光栅，所述金属光栅分为第一线栅21和第二线栅，其中第一线栅21对应第一光阻条310形成，第二线栅22对应第二光阻条320形成，得到金属光栅偏光片；
该金属光栅偏光片包括基板10、及基板10上的数条金属光栅，其中数 条第一线栅21和数条第二线栅22在基板10上交错设置且呈周期排列，所述第一线栅21具有第一高度H1，所述第二线栅22具有第二高度H2，所述第一线栅21和第二线栅22的高度关系满足(H1-H2)/H1>10％。
具体地，所述步骤3还包括，在干法蚀刻后去除剩余的光胶300，在形成的数条金属光栅上涂布形成一层缓冲层30，即如图1所示，所得到金属光栅偏光片还包括设于所述基板10、及数条金属光栅上的缓冲层30。
具体地，所述金属光栅的宽度在20-150nm之间；相邻两金属光栅之间的距离在20-150nm之间。
特别地，每一第一线栅21与一个第二线栅22在基板10上交错设置，即数条第一线栅21和数条第二线栅22按照高低高低的结构周期排列，所述数条金属光栅在基板10上优选为等间隔设置，此时，相邻两第一线栅21之间的距离以及相邻两第二线栅22之间的距离都相等。除此之外，数条第一线栅21和数条第二线栅22也可以设计为高高低高高低、或高高低低高高低低等其他高低起伏的结构周期排列。
综上所述，本发明的金属光栅偏光片，包括基板、及形成在基板上的数条金属光栅；所述金属光栅分为高度不同的第一线栅和第二线栅，可以形成一种双周期的光栅结构，从而达成更好的光学性能，具有较多的全局优化参数使得调控其光学性能变得更为科学和灵活。本发明的金属光栅偏光片的制作方法，可以制作出高度层次变化的光栅结构，且制备工艺简单。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明后附的权利要求的保护范围。

Claims (13)

  1. 一种金属光栅偏光片，包括基板、及形成在基板上的数条金属光栅；
    所述金属光栅分为第一线栅和第二线栅，数条第一线栅和数条第二线栅在基板上交错设置且呈周期排列，所述第一线栅具有第一高度H1，所述第二线栅具有第二高度H2，所述第一线栅和第二线栅的高度关系满足(H1-H2)/H1>10％。
  2. 如权利要求1所述的金属光栅偏光片，其中，所述金属光栅的宽度在20-150nm之间；相邻两金属光栅之间的距离在20-150nm之间。
  3. 如权利要求1所述的金属光栅偏光片，还包括设于所述基板、及数条金属光栅上的缓冲层。
  4. 如权利要求1所述的金属光栅偏光片，其中，所述数条金属光栅在基板上为等间隔设置。
  5. 如权利要求1所述的金属光栅偏光片，其中，每一第一线栅与一个第二线栅交错设置。
  6. 一种金属光栅偏光片的制作方法，包括以下步骤：
    步骤1、提供金属衬底，在金属衬底上表面涂覆一层光胶；
    步骤2、提供压印模板，将压印模板放置在光胶上进行纳米压印，使金属衬底上的光胶形成间隔排布的数条第一光阻条和数条第二光阻条，其中，第一光阻条的高度大于第二光阻条的高度；
    步骤3、移去压印模板，以光胶为遮蔽层，对金属衬底进行干法蚀刻，在金属衬底上形成数条金属光栅，所述金属光栅分为第一线栅和第二线栅，其中第一线栅对应所述第一光阻条形成，第二线栅对应所述第二光阻条形成，得到包括基板、及基板上的数条金属光栅的金属光栅偏光片；
    其中，数条第一线栅和数条第二线栅在基板上交错设置且呈周期排列，所述第一线栅具有第一高度H1，所述第二线栅具有第二高度H2，所述第一线栅和第二线栅的高度关系满足(H1-H2)/H1>10％。
  7. 如权利要求6所述的金属光栅偏光片的制作方法，其中，所述金属光栅的宽度在20-150nm之间，相邻两金属光栅之间的距离在20-150nm之间。
  8. 如权利要求6所述的金属光栅偏光片的制作方法，其中，所述数条金属光栅在基板上为等间隔设置。
  9. 如权利要求6所述的金属光栅偏光片的制作方法，其中，每一第一 线栅与一个第二线栅交错设置。
  10. 如权利要求6所述的金属光栅偏光片的制作方法，其中，所述步骤2提供的压印模板具有数条第一光栅凹槽和数条第二光栅凹槽，所述第一光栅凹槽的深度大于第二光栅凹槽的深度，所述第一光阻条、第二光阻条分别对应第一光栅凹槽、第二光栅凹槽形成；所述步骤3还包括，在干法蚀刻后去除剩余的光胶，在形成的数条金属光栅上涂布形成一层缓冲层，所得到金属光栅偏光片还包括设于所述基板、及数条金属光栅上的缓冲层。
  11. 一种金属光栅偏光片，包括基板、及形成在基板上的数条金属光栅；
    所述金属光栅分为第一线栅和第二线栅，数条第一线栅和数条第二线栅在基板上交错设置且呈周期排列，所述第一线栅具有第一高度H1，所述第二线栅具有第二高度H2，所述第一线栅和第二线栅的高度关系满足(H1-H2)/H1>10％；
    其中，所述金属光栅的宽度在20-150nm之间；相邻两金属光栅之间的距离在20-150nm之间；
    还包括设于所述基板、及数条金属光栅上的缓冲层。
  12. 如权利要求11所述的金属光栅偏光片，其中，所述数条金属光栅在基板上为等间隔设置。
  13. 如权利要求11所述的金属光栅偏光片，其中，每一第一线栅与一个第二线栅交错设置。
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