WO2017188329A1 - Composition - Google Patents

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Publication number
WO2017188329A1
WO2017188329A1 PCT/JP2017/016586 JP2017016586W WO2017188329A1 WO 2017188329 A1 WO2017188329 A1 WO 2017188329A1 JP 2017016586 W JP2017016586 W JP 2017016586W WO 2017188329 A1 WO2017188329 A1 WO 2017188329A1
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WO
WIPO (PCT)
Prior art keywords
group
hydrocarbon chain
bonded
carbon atoms
compound
Prior art date
Application number
PCT/JP2017/016586
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French (fr)
Japanese (ja)
Inventor
みちる 上原
泰治 島崎
Original Assignee
住友化学株式会社
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Publication date
Application filed by 住友化学株式会社 filed Critical 住友化学株式会社
Priority to CN201780025597.7A priority Critical patent/CN109071817B/en
Priority to KR1020187034258A priority patent/KR102338212B1/en
Publication of WO2017188329A1 publication Critical patent/WO2017188329A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/20Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/56Organo-metallic compounds, i.e. organic compounds containing a metal-to-carbon bond
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives

Definitions

  • the present invention relates to a composition for forming a film capable of imparting water repellency and oil repellency to various substrates.
  • the water / oil repellency of the surface of a substrate such as glass is required to be good. In particular, it is required not only to prevent the droplets from adhering to the surface of the substrate but also to easily remove the adhered droplets.
  • Patent Document 1 discloses a coating solution for obtaining a sol-gel film, which has a solid content and a solvent, and the solid content is obtained by hydrolysis and polycondensation of alkoxysilane in an acidic aqueous solution. And a coating solution containing ethylene glycol monoalkyl ether and the acidic aqueous solution as a solvent.
  • the alkoxysilane include methyltriethoxysilane and ⁇ -glycidoxypropyltrimethoxysilane.
  • Patent Document 2 discloses an example in which an organic silane and a metal alkoxide are mixed at a predetermined ratio, and a solution containing an organic solvent having a vapor pressure larger than that of water, water, and a catalyst is spin-coated on a glass substrate.
  • Patent Document 3 discloses that a water-repellent agent containing an amino-modified polysiloxane, an acid, and an activator is further applied by hand spraying with a glass water-repellent agent containing aminosilane.
  • Patent Document 4 discloses amino-modified dimethylpolysiloxane and alcohols. It has been disclosed to spray an automotive polishing composition containing water.
  • Patent Document 1 does not have water / oil repellency.
  • the spin coating method is used in Patent Document 2 and the spray coating method is used in Patent Documents 3 and 4, but special equipment and instruments used in these methods are used.
  • the ability to apply the coating by hand without using is very advantageous in terms of cost and simplicity.
  • Patent Document 1 discloses a hand-coated film forming method, it is a technique that cannot be said to be simple because it is necessary to wipe off surplus components to finish. Furthermore, the film may be easily destroyed when subjected to friction, etc., and droplets may adhere or become difficult to remove, resulting in problems such as contamination and corrosion of the base material, and further performance degradation. In addition, durability such as wear resistance is also required.
  • an object of the present invention is to provide a composition having water repellency, oil repellency, and abrasion resistance and capable of being hand-painted.
  • the present invention An organosilicon compound (A1) in which an alkyl group having 6 to 20 carbon atoms, in which a part of a methylene group may be replaced by an oxygen atom, and at least one hydrolyzable group are bonded to a silicon atom, or at least 1
  • the molar ratio of the metal compound (B) to the organosilicon compound (A1) or (A2) is preferably 2 or more and 48 or less.
  • the organosilicon compound (A1) is preferably represented by the following formula (AI).
  • R a1 represents an alkyl group having 6 to 20 carbon atoms in which part of the methylene group may be replaced by an oxygen atom,
  • a ⁇ a1> represents a hydrolysable group each independently.
  • Z a1 is a hydrocarbon chain-containing group, or represents a hydrolyzable group, and when Z a1 is a hydrocarbon chain containing groups may be the R a1 and Z a1 or different may be the same, Z a1 Is a hydrolyzable group, Z a1 and A a1 may be the same or different.
  • R a1 and Z a1 may be the same or different among a plurality of formulas (AI).
  • the organosilicon compound (A2) is preferably represented by the following formula (AII).
  • R a2 represents a trialkylsilyl group-containing molecular chain, and a plurality of A a2 each independently represents a hydrolyzable group.
  • Z a2 represents a trialkylsilyl group-containing molecular chain, a hydrocarbon chain-containing group, a siloxane skeleton-containing group, or a hydrolyzable group.
  • the metal compound (B) is preferably represented by the following formula (BI).
  • R b1 represents a hydrocarbon chain-containing group or hydrolyzable group in which the maximum chain length of the hydrocarbon chain portion is shorter than the maximum chain length of the alkyl group having 6 to 20 carbon atoms.
  • a b1 independently represents a hydrolyzable group.
  • M represents Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta.
  • m represents an integer of 1 to 4 depending on the valence of M.
  • R b1 and A b1 are preferably the same group.
  • M is preferably Si.
  • an organosilicon compound in which an alkyl group having 6 to 20 carbon atoms and a hydrolyzable group in which a part of a methylene group may be replaced with an oxygen atom is bonded to a silicon atom ( A1) or an organosilicon compound (A2) in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom, and the hydrolyzable group is bonded to a metal atom Coating with water and oil repellency and abrasion resistance on the substrate without unevenness because it contains the metal compound (B), the high boiling point solvent (C), and the low boiling point solvent (D). can do.
  • composition of the present invention is an organosilicon in which an alkyl group having 6 to 20 carbon atoms in which a part of a methylene group may be replaced with an oxygen atom and at least one hydrolyzable group are bonded to a silicon atom.
  • a metal compound in which a hydrocarbon chain-containing group bonded to an atom and having a maximum chain length of a hydrocarbon chain portion shorter than the maximum chain length of the organosilicon compound (A1) or (A2) may be bonded to the metal atom (B). From such a composition, a hydrolyzable group bonded to a silicon atom or a metal atom is hydrolyzed and polycondensed to form a film.
  • the film When (A1) is used as the organosilicon compound, the film has 6 to 20 carbon atoms in which some of the silicon atoms forming the film may be replaced by oxygen atoms with some of the methylene groups.
  • An alkyl group (hereinafter sometimes simply referred to as an alkyl group having 6 to 20 carbon atoms) is bonded.
  • the film has a water repellent / oil repellent function by the alkyl group having 6 to 20 carbon atoms.
  • (A2) as the organosilicon compound, a film having a trialkylsilyl group-containing molecular chain is bonded to a part of the silicon atoms forming the film.
  • the trialkylsilyl group imparts water / oil repellency to the film.
  • an element to which an alkyl group having 6 to 20 carbon atoms and a trialkylsilyl group are not bonded substantially functions as a spacer in the film, and wear resistance is improved.
  • the molar ratio of the organosilicon compound ((A1) or (A2)) to the metal compound (B) is adjusted to a specific range.
  • the alkyl group or trialkylsilyl group of several 6 to 20 and the spacer are present in a specific ratio, so that the water and oil repellency functions can be improved and at the same time, a film with further improved wear resistance can be provided. .
  • the composition of the present invention contains a high boiling point solvent (C) that satisfies predetermined requirements.
  • C a high boiling point solvent
  • the composition can be applied evenly with the high-boiling solvent (C) remaining on the substrate without volatilization when the composition is applied to the substrate by hand. It becomes.
  • Organosilicon compound (A1) With regard to water / oil repellency, in the present invention, a hydrocarbon chain-containing group (hereinafter referred to as a first hydrocarbon chain-containing group) is bonded to the central silicon atom of the organosilicon compound (A1). It is important that an alkyl group having 6 to 20 carbon atoms is bonded to a silicon atom as the hydrocarbon chain-containing group.
  • the alkyl group having 6 to 20 carbon atoms imparts water / oil repellency to the resulting film interface (surface). In particular, the coefficient of friction between the droplets (water droplets, oil droplets, etc.) and the film is reduced, and the droplets are easy to move.
  • the alkyl group having 6 to 20 carbon atoms described above preferably has 7 to 17 carbon atoms, and more preferably 8 to 15 carbon atoms.
  • a first hydrocarbon chain-containing group may be further bonded.
  • the first hydrocarbon chain-containing group (including an alkyl group having 6 to 20 carbon atoms) is usually composed of only a hydrocarbon group (hydrocarbon chain), but if necessary, a part of the hydrocarbon chain
  • the methylene group (—CH 2 —) may be replaced with an oxygen atom. Even a group partially substituted with an oxygen atom in this manner is classified as a hydrocarbon chain-containing group because a hydrocarbon chain exists in the remaining part.
  • the methylene group (—CH 2 —) adjacent to the Si atom is not replaced with an oxygen atom, and two consecutive methylene groups (—CH 2 —) are not replaced with an oxygen atom at the same time.
  • the first hydrocarbon chain-containing group will be described using an oxygen-unsubstituted alkyl group and a hydrocarbon chain-containing group (that is, a monovalent hydrocarbon group) as an example.
  • a part of the methylene group (—CH 2 —) can be replaced with an oxygen atom.
  • the first hydrocarbon chain-containing group which may be further bonded in addition to the alkyl group having 6 to 20 carbon atoms.
  • the group preferably has 6 to 20 carbon atoms, more preferably 7 to 17 carbon atoms, and still more preferably 8 to 15 carbon atoms. It is.
  • the carbon number of these groups means the number of carbons before being replaced with oxygen atoms.
  • the first hydrocarbon chain-containing group (in the case of a hydrocarbon group) containing an alkyl group having 6 to 20 carbon atoms may be branched or linear.
  • the first hydrocarbon chain-containing group (in the case of hydrocarbon group) which may be further bonded is a saturated or unsaturated aliphatic hydrocarbon chain-containing group.
  • it is a saturated aliphatic hydrocarbon chain-containing group.
  • the saturated aliphatic hydrocarbon chain-containing group is more preferably a saturated aliphatic hydrocarbon group.
  • alkyl group having 6 to 20 carbon atoms and the saturated aliphatic hydrocarbon group examples include a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group, a tetradecyl group, and a pentadecyl group. , Hexadecyl group, heptadecyl group, octadecyl group, nonadecyl group, icosyl group and the like.
  • the saturated aliphatic hydrocarbon group is preferred as the hydrocarbon group.
  • the group in which a methylene group (—CH 2 —) as a part of the hydrocarbon group is replaced with an oxygen atom specifically includes a group having a (poly) ethylene glycol unit, Examples include a group having a (poly) propylene glycol unit.
  • the number of the first hydrocarbon chain-containing groups bonded to the central silicon atom is usually 1 or more including the number of alkyl groups having 6 to 20 carbon atoms, and 2 or less. It is particularly preferable that the number is 1 (that is, only the alkyl group having 6 to 20 carbon atoms as the first hydrocarbon chain-containing group).
  • the hydrolyzable group of the organosilicon compound (A1) may be any group that provides a hydroxy group (silanol group) by hydrolysis.
  • the number of carbon atoms is 1 such as a methoxy group, an ethoxy group, a propoxy group, or a butoxy group.
  • Preferred examples thereof include an alkoxy group of 1 to 4, a hydroxy group, an acetoxy group, a chlorine atom, an isocyanate group, and the like.
  • an alkoxy group having 1 to 4 carbon atoms is preferable, and an alkoxy group having 1 to 2 carbon atoms is more preferable.
  • the number of hydrolyzable groups bonded to the central silicon atom is usually 1 or more, preferably 2 or more, and usually 3 or less.
  • the silicon atom of the organosilicon compound (A1) has fewer carbon atoms in the hydrocarbon chain portion than the alkyl group having 6 to 20 carbon atoms and hydrolyzable group, and the alkyl group having 6 to 20 carbon atoms.
  • a hydrocarbon chain-containing group (hereinafter referred to as a second hydrocarbon chain-containing group) may be bonded.
  • the length of the alkyl group having 6 to 20 carbon atoms and the second hydrocarbon chain-containing group is the length of the longest straight chain (hereinafter also referred to as “main chain”) containing an element bonded to a metal atom such as Si. It can be evaluated as (longest chain length).
  • the hydrocarbon chain moiety has 6 to 20 carbon atoms. It is preferable that it is less than carbon number of the alkyl group of.
  • the second hydrocarbon chain-containing group is composed of only a hydrocarbon group (hydrocarbon chain) as in the case of the alkyl group having 6 to 20 carbon atoms.
  • the methylene group (—CH 2 —) may be a group in which an oxygen atom is replaced. Further, the methylene group (—CH 2 —) adjacent to the Si atom is not replaced with an oxygen atom, and two consecutive methylene groups (—CH 2 —) are not replaced with an oxygen atom at the same time.
  • the carbon number of the hydrocarbon chain portion means the number of carbon atoms constituting the hydrocarbon group (hydrocarbon chain) in the oxygen non-substituted hydrocarbon chain-containing group, and includes the oxygen-substituted hydrocarbon chain.
  • the number of carbon atoms is assumed assuming that the oxygen atom is a methylene group (—CH 2 —).
  • the second hydrocarbon chain-containing group will be described by taking an oxygen non-substituted hydrocarbon chain-containing group (that is, a monovalent hydrocarbon group) as an example. Part of the group (—CH 2 —) can be replaced with an oxygen atom.
  • the number of carbon atoms is preferably 1 or more and 5 or less, more preferably 1 or more and 3 or less. Further, the second hydrocarbon chain-containing group (in the case of a hydrocarbon group) may be branched or linear.
  • the second hydrocarbon chain-containing group (in the case of a hydrocarbon group) is preferably a saturated or unsaturated aliphatic hydrocarbon chain-containing group, and more preferably a saturated aliphatic hydrocarbon chain-containing group.
  • the saturated aliphatic hydrocarbon chain-containing group (in the case of a hydrocarbon group) is more preferably a saturated aliphatic hydrocarbon group. Examples of the saturated aliphatic hydrocarbon group include a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group.
  • the hydrocarbon group is preferably a saturated aliphatic hydrocarbon group, and a partial methylene group (— Specific examples of the group in which CH 2 —) is replaced by an oxygen atom include a group having a (poly) ethylene glycol unit.
  • the number of the second hydrocarbon chain-containing groups bonded to the central silicon atom is preferably 2 or less, more preferably 1 or less, and particularly preferably 0.
  • the organosilicon compound (A1) is preferably a compound represented by the following formula (AI).
  • R a1 represents an alkyl group having 6 to 20 carbon atoms in which part of the methylene group may be replaced by an oxygen atom, and a plurality of A a1 are independently hydrolyzable.
  • Z a1 is a hydrocarbon chain-containing group, or represents a hydrolyzable group, and when Z a1 is a hydrocarbon chain containing groups may be the R a1 and Z a1 or different may be the same, Z a1 Is a hydrolyzable group, Z a1 and A a1 may be the same or different.
  • R a1 and Z a1 may be the same or different among a plurality of formulas (AI).
  • the second hydrocarbon chain-containing group and the hydrolyzable group can be appropriately selected from the ranges described above.
  • Z a1 is preferably a second hydrocarbon chain-containing group or a hydrolyzable group, and more preferably a hydrolyzable group.
  • organosilicon compound (A1) a compound having one alkyl group having 6 to 20 carbon atoms and three hydrolyzable groups; one alkyl group having 6 to 20 carbon atoms and a second hydrocarbon Preferred examples include compounds having one chain-containing group and one hydrolyzable group.
  • the three hydrolyzable groups are bonded to a silicon atom.
  • the group in which three hydrolyzable groups are bonded to a silicon atom include trialkoxysilyl groups such as a trimethoxysilyl group, a triethoxysilyl group, a tripropoxysilyl group, and a tributoxysilyl group; a trihydroxysilyl group; Acetoxysilyl group; trichlorosilyl group; triisocyanatesilyl group; and the like.
  • one second hydrocarbon chain-containing group, and two hydrolyzable groups one second hydrocarbon chain-containing group, two The hydrolyzable group is bonded to the silicon atom.
  • the group in which one second hydrocarbon chain-containing group and two hydrolyzable groups are bonded to a silicon atom include methyldimethoxysilyl group, ethyldimethoxysilyl group, methyldiethoxysilyl group, ethyldiethoxysilyl group Group, alkyl dialkoxysilyl group such as methyldipropoxysilyl group; and the like.
  • the compound having one alkyl group having 6 to 20 carbon atoms and three hydrolyzable groups include alkyltrimethoxysilane having an alkyl group having 6 to 20 carbon atoms, and 6 to 20 carbon atoms.
  • An alkyltrialkoxysilane having an alkyl group having 6 to 20 carbon atoms such as an alkyltriethoxysilane having an alkyl group of 6; an alkyltrihydroxysilane having an alkyl group having 6 to 20 carbon atoms; an alkyl group having 6 to 20 carbon atoms;
  • specific examples of the compound having one alkyl group having 6 to 20 carbon atoms, one second hydrocarbon chain-containing group, and two hydrolyzable groups include 6 to 20 carbon atoms.
  • Alkylmethyldialkoxysilanes such as alkylmethyldimethoxysilane having an alkyl group and alkylmethyldiethoxysilane having an alkyl group having 6 to 20 carbon atoms; alkylmethyldihydroxysilane having an alkyl group having 6 to 20 carbon atoms; Alkylmethyldiacetoxysilane having an alkyl group of ⁇ 20; alkylmethyldichlorosilane having an alkyl group of 6 to 20 carbon atoms; alkylmethyl diisocyanate silane having an alkyl group of 6 to 20 carbon atoms; and the like.
  • a compound having one alkyl group having 6 to 20 carbon atoms and three hydrolyzable groups is preferable, and an alkyltrialkoxysilane having an alkyl group having 6 to 20 carbon atoms is more preferable.
  • Organosilicon compound (A2) includes, in one molecule, at least one trialkylsilyl group-containing molecular chain bonded to the central silicon atom, and at least one hydrolyzable group bonded to the central silicon atom.
  • organosilicon compound (A2) a compound in which one trialkylsilyl group-containing molecular chain and three hydrolyzable groups are bonded to a central silicon atom; one trialkylsilyl group-containing molecular chain, 1 Compound in which one siloxane skeleton-containing group and two hydrolyzable groups are bonded to the central silicon atom; one trialkylsilyl group-containing molecular chain, one hydrocarbon chain-containing group, and two hydrolyzable groups A compound in which the group is bonded to the central silicon atom;
  • the organosilicon compound (A2) is preferably a compound represented by the following formula (AII).
  • R a2 represents a trialkylsilyl group-containing molecular chain, and a plurality of A a2 each independently represents a hydrolyzable group.
  • Z a2 represents a trialkylsilyl group-containing molecular chain, a hydrocarbon chain-containing group, a siloxane skeleton-containing group, or a hydrolyzable group.
  • the trialkylsilyl group-containing molecular chain is a monovalent group having a structure in which the trialkylsilyl-containing group is bonded to the end of the molecular chain, and the trialkylsilyl-containing group is bonded to the molecular chain.
  • the water repellency and oil repellency of the film formed from the composition of the invention are improved.
  • the presence of the trialkylsilyl group-containing molecular chain reduces the friction between the droplet (water droplet, oil droplet, etc.) and the coating, and facilitates the movement of the droplet.
  • chemical and physical durability are enhanced, and heat resistance and light resistance are improved. Even in the case where the alkyl group of the trialkylsilyl-containing group is replaced with a fluoroalkyl group, the water / oil repellency of the film interface (surface) can be similarly improved.
  • the trialkylsilyl-containing group is a group containing at least one trialkylsilyl group, preferably two or more, more preferably three trialkylsilyl groups.
  • the trialkylsilyl-containing group is preferably a group represented by the formula (s1).
  • R s1 represents a hydrocarbon group or a trialkylsilyloxy group, and the hydrogen atom contained in the hydrocarbon group or the trialkylsilyloxy group may be substituted with a fluorine atom. However, when all R s1 is a hydrocarbon group, R s1 is an alkyl group. * Represents a bond. ]
  • the hydrocarbon group represented by R s1 preferably has 1 to 4 carbon atoms, more preferably 1 to 3, and still more preferably 1 to 2.
  • the total carbon number of the three R s1 is preferably 9 or less, more preferably 6 or less, and even more preferably 4 or less.
  • the hydrocarbon group represented by R s1 is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, and a butyl group.
  • a plurality of R s1 may be the same or different and are preferably the same. Is preferably at least one of methyl group of the three R s1, more preferably at least two of a methyl group, and particularly preferably all three R s1 is a methyl group.
  • the hydrogen atom contained in the trialkylsilyl group and trialkylsilyloxy group represented by R s1 may be substituted with a fluorine atom.
  • the number of fluorine atoms substituted is preferably 1 or more, more preferably 3 or more, and preferably 2 ⁇ A + 1 or less, where A is the number of carbon atoms.
  • the hydrogen atom contained in the alkyl group is substituted with a fluorine atom
  • the number of substituted alkyl groups can be appropriately selected within a range of 1 to 3 per silicon atom.
  • At least one of R s1 may be a trialkylsilyloxy group. Even in such a case, the trialkylsilyl group-containing molecular chain has a trialkylsilyl group.
  • the trialkylsilyloxy group include a group in which an oxygen atom is bonded to a silicon atom of a group (trialkylsilyl group) in which R s1 is a hydrocarbon group (alkyl group).
  • R s1 is a trialkylsilyloxy group
  • examples of the group in which at least one of R s1 is a trialkylsilyloxy group include groups represented by the following formulae.
  • the trialkylsilyl group may be bonded to the end (free end side) of the molecular chain, particularly to the end (free end side) of the main chain (longest straight chain) of the molecular chain. preferable.
  • the molecular chain to which the trialkylsilyl group is bonded is preferably linear or branched, and is preferably linear.
  • the molecular chain preferably includes a dialkylsiloxane chain, and preferably includes a linear dialkylsiloxane chain.
  • the molecular chain may contain a divalent hydrocarbon group. Even if a part of the molecular chain is a divalent hydrocarbon group, the remainder is a dialkylsiloxane chain, so that the resulting film has good chemical and physical durability.
  • the molecular chain is preferably a group represented by the formula (s2).
  • R s2 represents an alkyl group having 1 to 4 carbon atoms.
  • Z s1 represents —O— or a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—.
  • Y s1 represents a single bond or —Si (R s2 ) 2 —L s1 —.
  • L s1 represents a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—.
  • * On the left side represents a bond with a central silicon atom, and * on the right side represents a bond with a trialkylsilyl-containing group.
  • the number of carbon atoms of the alkyl group represented by R s2 is preferably 1 to 4, more preferably 1 to 3, and still more preferably 1 to 2.
  • Examples of the alkyl group represented by R s2 include a methyl group, an ethyl group, a propyl group, and a butyl group. A methyl group or an ethyl group is preferable, and a methyl group is particularly preferable.
  • N1 is preferably 1 to 100, more preferably 1 to 80, still more preferably 1 to 50, and particularly preferably 1 to 30.
  • the number of carbon atoms of the divalent hydrocarbon group represented by Z s1 or L s1 is preferably 1 to 10, more preferably 1 to 6, and further preferably 1 to 4.
  • the divalent hydrocarbon group is preferably chain-like, and when it is chain-like, it may be either linear or branched.
  • the divalent hydrocarbon group is preferably a divalent aliphatic hydrocarbon group, and preferably an alkanediyl group. Examples of the divalent hydrocarbon group include a methylene group, an ethylene group, a propylene group, and a butylene group.
  • a part of —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—.
  • two consecutive —CH 2 — are not simultaneously replaced with —O—, and —CH 2 — adjacent to the Si atom is not replaced with —O—.
  • the number of carbon atoms between —O— and —O— is preferably 2 to 4, and more preferably 2 to 3 preferable.
  • Specific examples of the group in which a part of the divalent hydrocarbon group is replaced by —O— include a group having a (poly) ethylene glycol unit, a group having a (poly) propylene glycol unit, and the like. it can.
  • Z s1 is —O— and Y s1 is a single bond, that is, the molecular chain is composed only of repeating dialkylsilyloxy groups.
  • the dialkylsiloxane chain consists only of repeating dialkylsilyloxy groups, the resulting film has good chemical and physical durability.
  • Examples of the molecular chain contained in the trialkylsilyl group-containing molecular chain include a molecular chain represented by the following formula.
  • p1 represents an integer of 1 to 30, and * represents a bond bonded to a silicon atom or a trialkylsilyl group forming a polysiloxane skeleton.
  • the total number of atoms constituting the trialkylsilyl group-containing molecular chain is preferably 24 or more, more preferably 40 or more, still more preferably 50 or more, and preferably 1200 or less. Is 700 or less, more preferably 250 or less.
  • the trialkylsilyl group-containing molecular chain is preferably a group represented by the following formula (s1).
  • the trialkylsilyl group-containing molecular chain is more preferably a group represented by the following formula (s1-1), and even more preferably a group represented by the following formula (s1-1-1).
  • R s2 , Z s1 , Y s1 , and n1 are as defined above.
  • R s3 represents an alkyl group having 1 to 4 carbon atoms. * Represents a bond with a silicon atom.
  • trialkylsilyl group-containing molecular chain is preferably a group represented by the following formula (s1-2), more preferably a group represented by the following formula (s1-2-1).
  • R s2 , R s3 , Z s1 , Y s1 , and n1 are as defined above. * Represents a bond with a silicon atom.
  • Examples of the alkyl group represented by R s3 include the same groups as the alkyl groups exemplified as the hydrocarbon group represented by R s1 , and the alkyl group preferably has 1 to 3 carbon atoms. Preferably it is 1-2. Further, the total carbon number of R s3 contained in * -Si (R s3 ) 3 is preferably 9 or less, more preferably 6 or less, and still more preferably 4 or less. Further, among R s3 contained in * -Si (R s3 ) 3 , at least one is preferably a methyl group, two or more R s3 are preferably methyl groups, and all three R s3 are all A methyl group is particularly preferred.
  • Examples of the trialkylsilyl group-containing molecular chain include a group represented by the formula (s1-I).
  • the number of molecular chains containing a trialkylsilyl group bonded to the central silicon atom is preferably 1 to 3, more preferably 1 to 2, and particularly preferably 1.
  • the hydrolyzable group When the hydrolyzable group is bonded to a silicon atom, the hydrolyzable group may be a group that gives a hydroxy group (silanol group) by hydrolysis.
  • the number of carbon atoms such as a methoxy group, an ethoxy group, a propoxy group, and a butoxy group Preferred examples include 1-4 alkoxy groups; hydroxy groups; acetoxy groups; chlorine atoms; isocyanate groups.
  • an alkoxy group having 1 to 4 carbon atoms is preferable, and an alkoxy group having 1 to 2 carbon atoms is more preferable.
  • the number of hydrolyzable groups bonded to the central silicon atom is 1 to 3, and preferably 2 to 3.
  • a group in which a hydrolyzable group is bonded to a silicon atom may be referred to as a hydrolyzable silicon group.
  • the siloxane skeleton-containing group is a monovalent group containing a siloxane unit (Si—O—), and may be composed of a smaller number of elements than the number of elements constituting the trialkylsilyl group-containing molecular chain. That's fine.
  • the siloxane skeleton-containing group is a group having a shorter length than the trialkylsilyl group-containing molecular chain or a small steric spread (bulk height).
  • the siloxane skeleton-containing group may contain a divalent hydrocarbon group.
  • the siloxane skeleton-containing group is preferably a group represented by the following formula (s2).
  • R s2 has the same meaning as described above.
  • R s5 represents a hydrocarbon group or a hydroxy group, —CH 2 — contained in the hydrocarbon group may be replaced by —O—, and the hydrogen atom contained in the hydrocarbon group is a fluorine atom. May be substituted.
  • Z s2 represents —O— or a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced with —O—.
  • Y s2 represents a single bond or —Si (R s2 ) 2 —L s2 —.
  • L s2 represents a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—.
  • n2 represents an integer of 0 to 5. * Represents a bond with a silicon atom.
  • Examples of the hydrocarbon group represented by R s5 include the same groups as the hydrocarbon group represented by R s1 , an aliphatic hydrocarbon group is preferable, and an alkyl group is more preferable.
  • the number of carbon atoms is preferably 1 to 4, more preferably 1 to 3, and still more preferably 1 to 2.
  • Examples of the divalent hydrocarbon group represented by Z s2 or L s2 include the same groups as the divalent hydrocarbon group represented by Z s1 , and the number of carbon atoms is preferably 1 to 10. More preferably, it is 1-6, and more preferably 1-4.
  • the divalent hydrocarbon group represented by Z s2 or L s2 is preferably a divalent aliphatic hydrocarbon group, and more preferably a linear or branched alkanediyl group. .
  • N2 is preferably 1 to 5, and more preferably 1 to 3.
  • the total number of atoms of the siloxane skeleton-containing group is preferably 100 or less, more preferably 50 or less, still more preferably 30 or less, and preferably 10 or more.
  • the difference in the number of atoms between the trialkylsilyl group-containing molecular chain and the siloxane skeleton-containing group is preferably 10 or more, more preferably 20 or more, and preferably 1000 or less, more preferably 500 or less. More preferably, it is 200 or less.
  • siloxane skeleton-containing group examples include groups represented by the following formulas.
  • the hydrocarbon chain-containing group is a monovalent group including a hydrocarbon chain and has a hydrocarbon chain portion having a smaller number of carbon atoms than the number of atoms constituting the molecular chain of the trialkylsilyl group-containing molecular chain. Good. Moreover, it is preferable that the number of carbon atoms of the longest straight chain of the hydrocarbon chain is smaller than the number of atoms constituting the longest straight chain of the trialkylsilyl group-containing molecular chain.
  • the hydrocarbon chain-containing group may be composed only of a hydrocarbon group (hydrocarbon chain), and —CH 2 — contained in the hydrocarbon chain may be replaced by —O—, It is preferably composed of only hydrogen chains.
  • the carbon number of the hydrocarbon chain portion means the number of carbon atoms constituting the hydrocarbon group (hydrocarbon chain) in the oxygen non-substituted hydrocarbon chain-containing group, and includes the oxygen-substituted hydrocarbon chain. In the group, it means the number of carbon atoms counted by replacing —O— with —CH 2 —.
  • a hydrocarbon chain-containing group will be described by taking an oxygen-nonsubstituted hydrocarbon chain-containing group (that is, a monovalent hydrocarbon group) as an example. In any description, —CH 2 — It is possible to replace some of them with —O—.
  • the number of carbon atoms of the hydrocarbon chain-containing group is preferably 1 to 3, more preferably 1.
  • the hydrocarbon chain-containing group (in the case of a hydrocarbon group) may be branched or linear.
  • the hydrocarbon chain-containing group in the case of a hydrocarbon group) is preferably a saturated or unsaturated aliphatic hydrocarbon chain-containing group, and more preferably a saturated aliphatic hydrocarbon chain-containing group.
  • the saturated aliphatic hydrocarbon chain-containing group is preferably an alkyl group such as a methyl group, an ethyl group, or a propyl group.
  • the organosilicon compound (A2) is preferably a compound represented by the following formula (I-1), and more preferably a compound represented by the formula (I-1-1).
  • a a2 , Z a2 , Z s1 , Y s1 , R s2 , R s3 , and n1 are as defined above.
  • the organosilicon compound (A2) may be a compound represented by the formula (I-2), preferably a compound represented by the formula (I-2-1).
  • a a2 , Z a2 , Z s1 , Y s1 , R s2 , R s3 , and n1 are as defined above.
  • organosilicon compound (A2) examples include a group represented by the formula (II).
  • Examples of the synthesis method of the organosilicon compound (A2) include the following methods.
  • a compound in which a trialkylsilyl group-containing molecular chain and a halogen atom (preferably a chlorine atom) are bonded, and a compound in which three or more (especially four) hydrolyzable groups are bonded to a silicon atom It can manufacture by making this react.
  • a compound in which halogen atoms are bonded to both ends of a dialkylsiloxane chain (hereinafter, “dihalogenated dialkylsiloxane”), a tris (trialkylsilyloxy) silyl group, an M 1 O— group ( M 1 represents an alkali metal) and can be produced by reacting a compound (hereinafter referred to as “alkali metal silyl oxide”) and a compound having four hydrolyzable groups bonded to a silicon atom.
  • reaction order of these compounds is not limited, it is preferable to first react a dihalogenated dialkylsiloxane and an alkali metal silyl oxide, and then react a compound having four hydrolyzable groups bonded to a silicon atom.
  • a halogen atom a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned, A chlorine atom is preferable.
  • the alkali metal is preferably lithium.
  • the alkali metal silyl oxide can be produced, for example, by reacting an alkyl alkali metal with a compound in which a tris (trialkylsilyloxy) silyl group and a hydroxy group are bonded.
  • the organic alkali metal compound include alkyllithiums such as n-butyllithium, sec-butyllithium and tert-butyllithium, with n-butyllithium being particularly preferred.
  • the organosilicon compound (A2) is prepared by reacting, for example, alkali metal silyl oxide and cyclic dimethylsiloxane, and then the silicon atom has three hydrolyzable groups and a halogen atom (particularly a chlorine atom). It can also be produced by reacting a compound in which one) is bonded.
  • the number of silicon atoms contained in the cyclic dimethylsiloxane is, for example, preferably 2 or more and 10 or less, more preferably 2 or more and 5 or less, and further preferably 2 or more and 4 or less.
  • the organosilicon compound (A2) can be prepared by, for example, reacting an alkali metal silyl oxide and a cyclic dimethylsiloxane and reacting the resulting hydroxyl-terminated dimethylsiloxane compound with a tetraalkoxysilane. Can also be manufactured.
  • the metal compound (B) contained in the composition together with the organosilicon compound (A1) or (A2) is one in which at least one hydrolyzable group is bonded to a central metal atom, and the second hydrocarbon A chain-containing group may be bonded to the metal atom.
  • the longest chain length of the second hydrocarbon chain-containing group is shorter than the longest chain length of the alkyl group having 6 to 20 carbon atoms bonded to the central silicon atom of the organosilicon compound (A1). Since it is shorter than the trialkylsilyl group-containing molecular chain bonded to the central silicon atom of A2), the longest chain length of the metal compound (B) is shorter than the longest chain length of the organosilicon compound.
  • the structure derived from the metal compound (B) is less bulky than the structure derived from the organosilicon compound (A1) or (A2), and the film obtained by including the metal compound (B) in the composition It is possible to form a part having a spacer function in.
  • the central metal atom of the metal compound (B) may be any metal atom that can be bonded to an alkoxy group to form a metal alkoxide.
  • the metal includes a semimetal such as Si or Ge.
  • Specific examples of the central metal atom of the metal compound (B) include trivalent metals such as Al, Fe, and In; tetravalent metals such as Ge, Hf, Si, Ti, Sn, and Zr; pentavalent metals such as Ta. And the like, preferably trivalent metals such as Al; tetravalent metals such as Si, Ti, Zr and Sn; more preferably Al, Si, Ti and Zr, still more preferably Si. is there.
  • hydrolyzable group of the metal compound (B) examples include the same hydrolyzable groups as those of the organosilicon compound (A1) or (A2), preferably an alkoxy group having 1 to 4 carbon atoms, An alkoxy group of ⁇ 2 is more preferred. Further, the hydrolyzable groups of the organosilicon compound (A1) and the metal compound (B) may be the same or different. Further, the hydrolyzable groups of the organosilicon compound (A1) and the metal compound (B) are preferably alkoxy groups having 1 to 4 carbon atoms. In the metal compound (B), the number of hydrolyzable groups is preferably 1 or more, more preferably 2 or more, still more preferably 3 or more, and preferably 4 or less.
  • the second hydrocarbon chain-containing group of the metal compound (B) can be appropriately selected from the range described above, and the number thereof is preferably 1 or less, and particularly preferably 0.
  • the metal compound (B) is preferably a compound represented by the following formula (BI).
  • R b1 represents a second hydrocarbon chain-containing group or a hydrolyzable group.
  • a b1 independently represents a hydrolyzable group.
  • M represents Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta.
  • m represents an integer of 1 to 4 depending on the metal atom.
  • the range the second hydrocarbon chains containing group, R b1, hydrolysable groups A b1 of R b1 are respectively, the above-described second hydrocarbon chains containing group, a hydrolyzable group Can be selected as appropriate.
  • R b1 is preferably a hydrolyzable group.
  • R b1 and A b1 may be the same or different and are preferably the same.
  • the hydrolyzable groups of the organosilicon compound (A1) and the metal compound (B) may be the same or different.
  • M is preferably Al, Si, Ti, Zr, or Sn, more preferably Al, Si, Ti, or Zr, and even more preferably Si.
  • These alkoxides of metal atoms can be easily liquefied, and it is easy to improve the uniformity of the distribution of the following structure (b) that can function as a spacer in the film.
  • m represents 2 when M is a trivalent metal such as Al, Fe, or In, and M is a tetravalent metal such as Ge, Hf, Si, Ti, Sn, or Zr.
  • Preferred examples of the metal compound (B) include a compound having only a hydrolyzable group; a compound having one second hydrocarbon chain-containing group and two hydrolyzable groups;
  • Examples of the compound having only a hydrolyzable group include tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, and tetrabutoxysilane; trialkoxyaluminums such as triethoxyaluminum, tripropoxyaluminum, and tributoxyaluminum; triethoxy Trialkoxy iron such as iron; trialkoxy indium such as trimethoxy indium, triethoxy indium, tripropoxy indium and tributoxy indium; tetraalkoxy germanium such as tetramethoxy germanium, tetraethoxy germanium, tetrapropoxy germanium and tetrabutoxy germanium; tetra Methoxy hafnium, tetraethoxy hafnium, tetrapropoxy hafnium, tetrabut Tetraalkoxy hafnium such as Si
  • Examples of the compound having a second hydrocarbon chain-containing group and a hydrolyzable group include alkyltrialkoxysilanes such as methyltrimethoxysilane, ethyltrimethoxysilane, methyltriethoxysilane, ethyltriethoxysilane, and methyltripropoxysilane; And alkenyltrialkoxysilanes such as vinyltrimethoxysilane and vinyltriethoxysilane.
  • the organosilicon compound (A1) or (A2) and the metal compound (B) are contained in a specific ratio, the water and oil repellency functions are improved and the wear resistance is improved. It is possible to provide a film having excellent properties.
  • the molar ratio of the metal compound (B) to the organosilicon compound (A1 or A2) (metal compound (B) / organosilicon compound (A1 or A2)) is 2 or more. (More preferably 15 or more), preferably 48 or less, more preferably 44 or less, still more preferably 40 or less, and particularly preferably 36 or less.
  • the composition of the present invention further contains a high boiling point solvent (C) in addition to the organosilicon compound (A1) or (A2) and the metal compound (B).
  • a high boiling point solvent (C) in addition to the organosilicon compound (A1) or (A2) and the metal compound (B).
  • the high boiling point solvent (C) remains on the substrate without volatilization, so that the organosilicon compound (A1) or (A2) and the metal compound (B) are on the substrate. It is possible to achieve a film with good water and oil repellency and wear resistance and good surface properties.
  • the high boiling point solvent (C) means that the vapor pressure at 20 ° C. is 1000 Pa or less and the boiling point is 120 ° C. or more.
  • a high-boiling solvent having a solubility parameter within a predetermined range in consideration of compatibility with the low-boiling solvent (D) ( C) must be used.
  • the solubility parameter SP value, solubility parameter
  • a high boiling point solvent (C) having an SP value [(cal / cm 3 ) 1/2 ] of 8.0 or more is used.
  • the SP value [(cal / cm 3 ) 1/2 ] of the high boiling point solvent (C) is preferably 13.0 or less.
  • the solvent satisfying such requirements include 1-butanol and ethylene glycol monohexyl ether.
  • the vapor pressure of the high boiling point solvent (C) at 20 ° C. is preferably 800 Pa or less, more preferably 600 Pa or less, and the lower limit is not particularly limited, but is, for example, 5 Pa.
  • the boiling point of the high-boiling solvent (C) is preferably 150 ° C. or higher, more preferably 170 ° C. or higher, and the upper limit is not particularly limited, but is, for example, 300 ° C.
  • composition of the present invention further contains a low boiling point solvent (D) in addition to the organosilicon compound (A), metal compound (B), and high boiling point solvent (C).
  • Low boiling point means that the vapor pressure at 20 ° C. is more than 1000 Pa and the boiling point is less than 120 ° C.
  • Examples of such a low boiling point solvent (D) include alcohol solvents, ketone solvents, ether solvents, and alicyclic hydrocarbon solvents, and alcohol solvents, ketone solvents, and ether solvents are particularly preferable.
  • the alcohol solvent include methanol, ethanol, 1-propanol, isopropyl alcohol, 2,2,2-trifluoroethanol, 2-butanol, and isobutyl alcohol.
  • the ketone solvent include acetone and ethyl methyl ketone.
  • Examples of the ether solvent include diethyl ether, diisopropyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether and the like. Hexane is mentioned as an alicyclic hydrocarbon type solvent.
  • the vapor pressure at 20 ° C. of the low boiling point solvent (D) is preferably 2000 Pa or more, more preferably 3000 Pa or more, and the upper limit is not particularly limited, but is, for example, 13000 Pa.
  • the boiling point of the high boiling point solvent (D) is preferably 100 ° C. or lower, more preferably 85 ° C. or lower.
  • the high boiling point solvent (C) and the low boiling point solvent (D) may be used alone or in combination of two or more solvents.
  • an organosilicon compound (A) and a metal compound (B) are mixed into a mixed liquid obtained by previously mixing a part of the low boiling point solvent (D) with the high boiling point solvent (C).
  • a solution for example, stirring at room temperature for about 10 to 30 minutes
  • the dilution ratio with the low boiling point solvent (D) is preferably about 5 to 40 times.
  • the composition of the present invention may or may not contain a solvent other than the high boiling point solvent (C) and the low boiling point solvent (D) (hereinafter sometimes referred to as other solvent).
  • the organosilicon compound (A) (hereinafter, the organosilicon compounds (A1) and (A2) may be collectively referred to as an organosilicon compound (A)) is 0.01% relative to the low boiling point solvent (D).
  • the content is preferably 0.15% by mass, more preferably 0.03-0.13% by mass.
  • the metal compound (B) is preferably 0.1 to 1.2% by mass, more preferably 0.15 to 1.0% by mass with respect to the low boiling point solvent (D).
  • the high boiling point solvent (C) is preferably 0.05 to 1.8% by mass, more preferably 0.1 to 1.8% by mass with respect to the low boiling point solvent (D). 5 mass% or less may be sufficient, and 1.2 mass% or less may be sufficient.
  • the organosilicon compound (A) is 0.03 to 0.15% by mass with respect to 100% by mass in total of the high boiling point solvent (C), the low boiling point solvent (D), the other solvent and the catalyst (E) described later. It is preferable that the content is 0.035 to 0.12% by mass.
  • the metal compound (B) is 0.1 to 1.5% by mass relative to 100% by mass in total of the high boiling point solvent (C), the low boiling point solvent (D), the other solvent and the catalyst (E) described later. It is preferably 0.15 to 1.2% by mass.
  • the total ratio of the organosilicon compound (A) and the metal compound (B) to the total 100 mass% of the high boiling point solvent (C), the low boiling point solvent (D), the other solvent and the catalyst (E) described later is ((A + B) / (C + D + E)), preferably 0.13 to 1.65% by mass, more preferably 0.185 to 1.32% by mass, and still more preferably 0.2 to 1.1% by mass.
  • composition of the present invention may coexist with a catalyst (E) as necessary.
  • the catalyst (E) can be arbitrarily selected from acid catalysts such as hydrochloric acid, formic acid and acetic acid generally used in the sol-gel method; base catalysts; organometallic catalysts and the like.
  • the acid catalyst (particularly preferably hydrochloric acid) is preferably 1 or more times, more preferably 1.3 or more times in terms of mass ratio with respect to the total of the organosilicon compound (A) and the metal compound (B). It is preferably 8 times or less, more preferably 7 times or less, and still more preferably 6.5 times or less.
  • organosilicon compound (A) and the metal compound (B) are brought into contact with the base material
  • other solvents high boiling point solvent (C) and low boiling point solvent (D) may be used as long as the effects of the present invention are not impaired.
  • Solvents not equivalent to any of the above antioxidants, rust inhibitors, UV absorbers, light stabilizers, fungicides, antibacterial agents, biofouling inhibitors, deodorants, pigments, flame retardants, antistatic agents, etc. These various additives may coexist.
  • antioxidants examples include phenol-based antioxidants, sulfur-based antioxidants, phosphorus-based antioxidants, hindered amine-based antioxidants, and the like.
  • phenolic antioxidant examples include n-octadecyl-3- (4-hydroxy-3,5-di-t-butylphenyl) propionate, 2,6-di-t-butyl-4-methylphenol, 2, 2-thio-diethylene-bis- [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], tri-ethylene glycol-bis- [3- (3-t-butyl-5-methyl -4-hydroxyphenyl) propionate], 3,9-bis [2- ⁇ 3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionyloxy ⁇ -1,1-dimethylethyl] -2, 4,8,10-tetraoxaspiro [5.5] undecane, tetrakis ⁇ 3- (3,5-di-tert-butyl-4-hydroxyphenyl) -propionic acid ⁇ pentaeryth Cyl ester, 2-t-butyl-6-
  • sulfur-based antioxidant examples include 3,3′-thiodipropionic acid di-n-dodecyl ester, 3,3′-thiodipropionic acid di-n-tetradecyl ester, and 3,3′-thiodipropion.
  • examples include acid di-n-octadecyl ester and tetrakis (3-dodecylthiopropionic acid) pentaerythritol ester.
  • Examples of the phosphorus antioxidant include tris (2,4-di-t-butylphenyl) phosphite, bis (2,4-di-t-butylphenyl) pentaerythritol diphosphite, bis (2,6-di-).
  • t-butyl-4-methylphenyl) pentaerythritol diphosphite bis (2,4-di-cumylphenyl) pentaerythritol diphosphite, tetrakis (2,4-di-t-butylphenyl) -4,4'-biphenylene diphosphonite, bis -[2,4-di-t-butyl- (6-methyl) phenyl] ethyl phosphite and the like.
  • hindered amine antioxidant examples include sebacic acid bis (2,2,6,6-tetramethyl-4-piperidyl) ester (melting point: 81 to 86 ° C.), 2,2,6,6-tetramethyl-4- Piperidyl methacrylate (melting point: 58 ° C.), poly [ ⁇ 6- (1,1,3,3-tetramethylbutyl) amino-1,3,5-triazine-2,4-diyl ⁇ ⁇ (2,2,6, 6-tetramethyl-4-piperidyl) imino ⁇ -1,6-hexamethylene ⁇ (2,2,6,6-tetramethyl-4-piperidyl) imino ⁇ ] and the like.
  • the rust inhibitor examples include alkanolamines such as triethanolamine; quaternary ammonium salts; alkanethiols; imidazoles such as imidazoline, imidazole, alkylimidazoline derivatives, benzimidazole, 2-mercaptobenzimidazole, and benzotriazole; metavanadic acid Sodium; bismuth citrate; phenol derivatives; aliphatic amines such as alkylamines and polyalkenylamines, aromatic amines, ethoxylated amines, cyanoalkylamines, cyclohexylamine benzoate, aliphatic diamines such as alkylenediamine, aromatic diamines, etc.
  • alkanolamines such as triethanolamine
  • quaternary ammonium salts such as imidazoline, imidazole, alkylimidazoline derivatives, benzimidazole, 2-mercaptobenzimidazole, and benzotri
  • Examples of the ultraviolet absorber / light stabilizer include 2- (5-methyl-2-hydroxyphenyl) benzotriazole, 2- [2-hydroxy-3,5-bis ( ⁇ , ⁇ -dimethylbenzyl) phenyl].
  • Examples of the fungicide / antibacterial agent include 2- (4-thiazolyl) benzimidazole, sorbic acid, 1,2-benzisothiazolin-3-one, (2-pyridylthio-1-oxide) sodium, dehydroacetic acid, 2-methyl -5-chloro-4-isothiazolone complex, 2,4,5,6-tetrachlorophthalonitrile, methyl 2-benzimidazole carbamate, methyl 1- (butylcarbamoyl) -2-benzimidazole carbamate, mono or dibromocyano
  • Examples include acetamides, 1,2-dibromo-2,4-dicyanobutane, 1,1-dibromo-1-nitropropanol and 1,1-dibromo-1-nitro-2-acetoxypropane.
  • biological adhesion inhibitor examples include tetramethylthiuram disulfide, bis (N, N-dimethyldithiocarbamate) zinc, 3- (3,4-dichlorophenyl) -1,1-dimethylurea, dichloro-N-((dimethylamino ) Sulfonyl) fluoro-N- (P-tolyl) methanesulfenamide, pyridine-triphenylborane, N, N-dimethyl-N′-phenyl-N ′-(fluorodichloromethylthio) sulfamide, cuprous thiocyanate ( 1), cuprous oxide, tetrabutylthiuram disulfide, 2,4,5,6-tetrachloroisophthalonitrile, zinc ethylenebisdithiocarbamate, 2,3,5,6-tetrachloro-4- (methyl) Sulfonyl) pyridine, N- (2,4,6-trichloroph
  • deodorizer examples include lactic acid, succinic acid, malic acid, citric acid, maleic acid, malonic acid, ethylenediaminepolyacetic acid, alkane-1,2-dicarboxylic acid, alkene-1,2-dicarboxylic acid, cycloalkane-1 , 2-dicarboxylic acid, cycloalkene-1,2-dicarboxylic acid, organic acids such as naphthalenesulfonic acid; fatty acid metals such as zinc undecylenate, zinc 2-ethylhexanoate, zinc ricinoleate; iron oxide, iron sulfate, Zinc oxide, zinc sulfate, zinc chloride, silver oxide, copper oxide, metal (iron, copper, etc.) chlorophyllin sodium, metal (iron, copper, cobalt etc.) phthalocyanine, metal (iron, copper, cobalt etc.) tetrasulfonic acid phthalocyanine, Metal compounds such as titanium dioxide, visible light responsive
  • pigments examples include carbon black, titanium oxide, phthalocyanine pigment, quinacridone pigment, isoindolinone pigment, perylene or perinone pigment, quinophthalone pigment, diketopyrrolo-pyrrole pigment, dioxazine pigment, disazo condensation pigment, Examples include benzimidazolone pigments.
  • flame retardant examples include decabromobiphenyl, antimony trioxide, phosphorus flame retardant, aluminum hydroxide and the like.
  • antistatic agent examples include quaternary ammonium salt type cationic surfactants, betaine type amphoteric surfactants, alkyl phosphate type anionic surfactants, primary amine salts, secondary amine salts, thirds.
  • Cationic surfactants such as quaternary amine salts, quaternary amine salts and pyridine derivatives, sulfated oils, soaps, sulfated ester oils, sulfated amide oils, sulfated ester salts of olefins, fatty alcohol sulfate esters, alkyl sulfates
  • Anionic surfactants such as ester salts, fatty acid ethyl sulfonates, alkyl naphthalene sulfonates, alkyl benzene sulfonates, oxalate sulfonates and phosphate ester salts, partial fatty acid esters of polyhydric alcohols, fatty alcohol
  • additives lubricants, fillers, plasticizers, nucleating agents, antiblocking agents, foaming agents, emulsifiers, brighteners, binders, and the like may coexist.
  • the content of the additives is usually 0.1 to 70% by mass, preferably 0.1% in the composition containing the organosilicon compound (A) and the metal compound (B). -50% by mass, more preferably 0.5-30% by mass, still more preferably 2-15% by mass.
  • the total content of the organosilicon compound (A) and the metal compound (B) is 0.1% with respect to a total of 100% by mass of the high boiling point solvent (C), the low boiling point solvent (D), and the catalyst (E).
  • the content is preferably 1.5% by mass, more preferably 0.15-1.2% by mass.
  • the composition of the present invention comprises one alkyl group having 7 to 9 carbon atoms (particularly 8) and an organosilicon compound (A1) in which three hydrolyzable groups are bonded to a silicon atom.
  • the weight ratio (metal compound (B) / organosilicon compound (A)) to organosilicon compound (A) is 5 or more (more preferably 15 or more) and 36 or less.
  • the composition of the present invention can be brought into contact with the substrate evenly by hand coating, and hydrolyzable groups of the organosilicon compound (A) and the metal compound (B) are hydrolyzed and polycondensed to form a surface on the substrate surface. A film is formed.
  • the hand coating evaluation in the present invention the following method is adopted to reproduce a state close to actual use. First, two pseudo fingers (mono-one dust catch made by Dragonfly Co.) were placed on the bencott, attached to a steel wool tester (made by Daiei Seiki Co., Ltd.), and 1 ml of the coating solution 1 was immersed in the bencott.
  • the composition when the composition is left in contact with the substrate in the air (for example, about 10 to 48 hours), moisture in the air is taken in, and hydrolysis and polycondensation of the hydrolyzable group occurs. This is preferable because it is promoted.
  • the obtained film may be further dried.
  • the temperature for heating and drying is usually 40 to 250 ° C, preferably 60 to 200 ° C, more preferably 60 to 150 ° C.
  • the obtained film has a network skeleton in which silicon atoms or the above metal atoms (preferably only silicon atoms) are bonded through oxygen atoms. And having a structure in which the first hydrocarbon chain-containing group is bonded to some of the silicon atoms forming the skeleton, derived from the organosilicon compound (A1).
  • the structure in which the alkyl group having 6 to 20 carbon atoms is bonded to the silicon atom is preferably a structure (a1) represented by the following formula (1).
  • R a3 represents an alkyl group having 6 to 20 carbon atoms
  • Z a3 represents a hydrocarbon chain-containing group or —O— group
  • Z a3 represents a hydrocarbon chain-containing group.
  • the R a3 and Z a3 may be the same or different and is an R a3 and Z a3 among multiple expressions (1) may be the same or different.
  • all of the first hydrocarbon chain-containing groups of Z a3 are the first hydrocarbon chain-containing groups described above (including alkyl groups having 6 to 20 carbon atoms), the first hydrocarbon chain It can select suitably from the range of a containing group.
  • the second hydrocarbon chain-containing group or —O— group is preferable, and —O— group is particularly preferable.
  • structures represented by the following formulas (1-1) to (1-32) can be preferably exemplified.
  • a silicon atom (second silicon atom) derived from the metal compound (B) and different from the silicon atom to which the alkyl group having 6 to 20 carbon atoms is bonded.
  • a second hydrocarbon chain-containing group, a hydroxy group, an alkoxy group, or a group in which a hydroxy group is condensed may be bonded.
  • the second silicon atom may be replaced by another metal atom (for example, Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta).
  • These second silicon atoms and other metal atoms are also bonded to a second hydrocarbon chain-containing group, hydroxy group, alkoxy group, or hydroxy group having a shorter chain length than the alkyl group having 6 to 20 carbon atoms. Therefore, it acts as a spacer, and it is possible to enhance the water / oil repellency improving effect by the alkyl group having 6 to 20 carbon atoms.
  • the alkoxy group preferably has 1 to 4 carbon atoms, more preferably 1 to 3 carbon atoms.
  • a butoxy group, a propoxy group, an ethoxy group, a methoxy group, etc. are mentioned.
  • hydroxy group is condensed with other hydroxy groups, alkoxy groups and the like to form —O—, and such a condensed group of hydroxy groups may be bonded to the metal atom.
  • the structure in which the second hydrocarbon chain-containing group or hydroxy group is bonded to the second silicon atom or other metal atom is preferably a structure (b) represented by the following formula (2).
  • R b2 represents a second hydrocarbon chain-containing group or a hydroxy group, and A b2 represents a hydroxy group or —O—.
  • M represents Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta.
  • n represents an integer of 0 to 3 according to M.
  • any of the second hydrocarbon chain-containing groups of R b2 can be appropriately selected from the range described above.
  • R b2 is preferably a hydroxy group.
  • M is preferably a trivalent metal such as Al; a tetravalent metal such as Si, Ti, Sn, or Zr; more preferably Al, Si, Ti, or Zr, and particularly preferably Si.
  • n represents 1 when M is a trivalent metal such as Al, Fe, or In, and M is a tetravalent metal such as Ge, Hf, Si, Ti, Sn, or Zr. Represents 2 and represents 3 when M is a pentavalent metal such as Ta.
  • the abundance ratio of the structure (a) to the structure (b) (structure (a) / structure (b)) is preferably 0.01 or more on a molar basis, more preferably 0.8. 02 or more, more preferably 0.03 or more, preferably 0.3 or less, more preferably 0.2 or less, still more preferably 0.1 or less, and still more preferably 0.09 or less.
  • the structure (a2) derived from the organosilicon compound (A2) is represented by the formula (3).
  • R a4 represents a trialkylsilyl group-containing molecular chain
  • Z a4 represents a trialkylsilyl group-containing molecular chain, a siloxane skeleton-containing group, a hydrocarbon chain-containing group, or —O—.
  • R a4 , Z a4 trialkylsilyl group-containing molecular chain, Z a4 siloxane skeleton-containing group, and hydrocarbon chain-containing group are respectively a trialkylsilyl group-containing molecular chain, a siloxane skeleton-containing group,
  • the hydrocarbon chain-containing group can be appropriately selected from the range described above.
  • Z a4 is preferably a siloxane skeleton-containing group or —O—, and more preferably —O—.
  • Structure (a2) includes a structure represented by formula (3-1).
  • the structure (b) derived from the metal compound (B) is the same as when the organosilicon compound (A1) is used.
  • the film obtained using the composition of the present invention usually has a thickness of about 3 to 50 nm.
  • the film obtained using the composition of the present invention has a network-like skeleton in which silicon atoms or the above metal atoms (preferably only silicon atoms) are bonded through oxygen atoms. Since it has a structure in which the alkyl group having 6 to 20 carbon atoms is bonded to some of the silicon atoms to be formed, it is excellent in the slipperiness of the droplets, and also in the water and oil repellency.
  • the water repellency can be evaluated by, for example, the contact angle of a 3 ⁇ L water droplet determined by the ⁇ / 2 method, and the contact angle is, for example, 97 ° or more, more preferably 100 ° or more, and further preferably 101 ° or more.
  • the upper limit is not particularly limited, but is 110 °, for example.
  • the slipperiness of the droplet can be evaluated by, for example, the sliding angle or contact angle hysteresis of the droplet deposited on the substrate.
  • the sliding angle of a 6 ⁇ L liquid droplet is preferably 23 ° or less, more preferably 21 ° or less, still more preferably 20 ° or less, and the lower limit is, for example, 5 °.
  • the contact angle hysteresis is preferably 8.0 ° or less, more preferably 7 ° or less, still more preferably 6 ° or less, and the lower limit is, for example, 1.0 °.
  • a film can be formed by coating the composition of the present invention on a substrate, and the shape of the substrate may be flat or curved.
  • the substrate may be composed of any organic material or inorganic material.
  • the organic material include acrylic resin, polycarbonate resin, polyester resin, styrene resin, acrylic-styrene copolymer resin, cellulose Thermoplastic resins such as resins and polyolefin resins; thermosetting resins such as phenol resins, urea resins, melamine resins, epoxy resins, unsaturated polyesters, silicone resins, urethane resins; and the like
  • inorganic materials include ceramics Glass; metal such as iron, silicon, copper, zinc, and aluminum; alloy containing the metal; and the like.
  • the substrate may be subjected to an easy adhesion treatment in advance.
  • the easy adhesion treatment include hydrophilic treatment such as corona treatment, plasma treatment, and ultraviolet treatment.
  • primer treatment with a resin, a silane coupling agent, tetraalkoxysilane, or the like may be used.
  • a film having both water and oil repellency and abrasion resistance can be provided by hand coating, and it can be suitably used for various types of vehicles and building windows.
  • Example 1-1 Triethoxy-n-octylsilane (octyltriethoxysilane) 2.2 ⁇ 10 ⁇ 4 mol as the organosilicon compound (A1), tetraethyl orthosilicate (tetraethoxysilane) 3.5 ⁇ 10 ⁇ as the metal compound (B) 3 mol was dissolved in a mixed solution of 0.95 ml of isopropyl alcohol and 0.95 ml of 1-butanol and stirred at room temperature for 20 minutes. To the obtained solution, 1.0 ml of hydrochloric acid (0.01 mol / L aqueous solution) as a catalyst was dropped, and then stirred for 24 hours to prepare a sample solution. The sample solution was diluted 30 times with isopropyl alcohol to obtain a coating solution 1-1.
  • the coating solution 1 is soaked in Bencott (Asahi Kasei Co., Ltd. clean room wiper, registered trademark), coated on an alkali-cleaned glass substrate (5 cm ⁇ 5 cm, Corning “EAGLE XG”), and allowed to stand at room temperature for one day. I put it. Coating was performed by the following method. Two pseudo fingers (mono-one dust catch made by Dragonfly) were placed on the bencott, attached to a steel wool tester (made by Daiei Seiki Co., Ltd.), and 1 ml of the coating solution 1 was immersed in the bencott.
  • the initial static and dynamic contact angles, wear resistance, and haze of the prepared coatings were evaluated. Further, as sensory evaluation, water droplet slipping property and visual observation of the film surface were performed.
  • Example 1-2 A coating solution 1-2 was prepared in the same manner as in Example 1-1 except that the ratio of 1-butanol in the coating solution was set to the value shown in Table 7-1. Similarly, a film was prepared and evaluated.
  • Example 1-3 A coating solution 1-3 was prepared in the same manner as in Example 1-1 except that the ratio of 1-butanol in the coating solution was set to the value shown in Table 7-1. Similarly, a film was prepared and evaluated.
  • Example 2-1 Triethoxy-n-octylsilane (octyltriethoxysilane) 2.2 ⁇ 10 ⁇ 4 mol as the organosilicon compound (A1), tetraethyl orthosilicate (tetraethoxysilane) 3.5 ⁇ 10 ⁇ as the metal compound (B) 3 mol was dissolved in a mixed solution of 1.8 ml of isopropyl alcohol and 0.095 ml of ethylene glycol monohexyl ether, and stirred at room temperature for 20 minutes.
  • Example 1-1 1.0 ml of hydrochloric acid (0.01 mol / L aqueous solution) as a catalyst (E) was dropped, and then stirred for 24 hours to prepare a sample solution.
  • the sample solution was diluted 30 times with isopropyl alcohol to obtain a coating solution 2-1. Otherwise, a film was prepared and evaluated in the same manner as in Example 1-1.
  • Example 2-2 A coating solution 2-2 was prepared in the same manner as in Example 2-1, except that the ratio of ethylene glycol monohexyl ether in the coating solution was as shown in Table 7-1. A film was prepared in the same manner as in Example 1 and evaluated.
  • Example 3-1 Triethoxy-n-decylsilane (decyltriethoxysilane) 1.8 ⁇ 10 ⁇ 4 mol as the organosilicon compound (A1), tetraethyl orthosilicate (tetraethoxysilane) 3.7 ⁇ 10 ⁇ 3 as the metal compound (B) Mol was dissolved in a mixed solution of 1.0 ml of isopropyl alcohol and 1.0 ml of 1-butanol and stirred at room temperature for 20 minutes. To the obtained solution, 1.1 ml of hydrochloric acid (0.01 mol / L aqueous solution) as a catalyst was dropped, and then stirred for 24 hours to prepare a sample solution. The sample solution was diluted 30 times with isopropyl alcohol to obtain a coating solution 3-1. Otherwise, a film was prepared and evaluated in the same manner as in Example 1-1.
  • Example 3-2 Coating solution as in Example 3-1, except that triethoxy-n-dodecylsilane (dodecyltriethoxysilane) was used in place of triethoxy-n-decylsilane (decyltriethoxysilane) as the organosilicon compound (A1) 3-2 was prepared, and a film was prepared and evaluated in the same manner as in Example 1-1.
  • Example 3-3 The sample solution was diluted 50-fold with isopropyl alcohol to give a coating solution 3-3, which was the same as Example 3-2.
  • Example 4 Triethoxy-n-octylsilane (octyltriethoxysilane) 1.2 ⁇ 10 ⁇ 3 mol as organosilicon compound (A1), silicate 40 as metal compound (B) 6.0 ⁇ 10 ⁇ 3 mol in isopropyl It was dissolved in a mixed solution of 5.1 ml of alcohol and 5.1 ml of 1-butanol and stirred at room temperature for 20 minutes. To the obtained solution, 5.4 ml of hydrochloric acid (0.01 mol / L aqueous solution) as a catalyst was dropped, and then stirred for 24 hours to prepare a sample solution. The sample solution was diluted 30 times with isopropyl alcohol to obtain a coating solution 4. Thereafter, a film was prepared and evaluated in the same manner as in Example 1-1.
  • Example 5 Triethoxy-n-octylsilane (octyltriethoxysilane) 2.2 ⁇ 10 ⁇ 4 mol as the organosilicon compound (A1) and tetraethyl orthosilicate 3.5 ⁇ 10 ⁇ 3 mol as the metal compound (B) were mixed with isopropyl. It was dissolved in a mixed solution of 0.89 ml of alcohol and 0.95 ml of 1-butanol and stirred at room temperature for 20 minutes. A film was prepared and evaluated in the same manner as in Example 1-1 except that 2.1 mL of formic acid (1 mol / L aqueous solution) was used instead of 1.0 mL of hydrochloric acid as the catalyst (E). went.
  • Example 6 Example of synthesis of alkoxysilane compound> A three-necked flask was charged with 4.69 g of tris (trimethylsiloxy) silanol and 21.0 g of THF and stirred. After cooling to ⁇ 40 ° C., 9.38 mL of n-BuLi hexane solution (1.6 mol / L) was added dropwise. The temperature was raised to 0 ° C., 10.01 g of hexamethylcyclotrisiloxane dissolved in 21 g of THF was added dropwise, and the mixture was stirred for 17 hours.
  • organosilicon compound (A2) 1.4 ⁇ 10 ⁇ 4 mol of the alkoxysilane compound represented by the above formula, and 1.4 ⁇ 10 ⁇ 3 mol of tetraethyl orthosilicate as the metal compound (B) are mixed with isopropyl alcohol 6 It was dissolved in a mixed solution of 7 ml and 1-butanol 2.0 ml and stirred at room temperature for 20 minutes. A film was prepared in the same manner as in Example 1-1, except that 2.8 mL of hydrochloric acid (0.01 mol / L aqueous solution) as the catalyst (E) was added dropwise to the resulting solution and stirred for 24 hours. Evaluation was performed.
  • Comparative Example 1 Instead of the organosilicon compound (A), 3.59 g of methyltriethoxysilane and 10.92 g of tetraethyl orthosilicate (tetraethoxysilane) as the metal compound (B) are dissolved in 5.03 g of ethylene glycol monobutyl ether, and at room temperature. Stir for 20 minutes. To the obtained solution, 10.46 g of acetic acid (0.5 mol / L aqueous solution) as a catalyst was dropped, and then stirred for 24 hours to obtain a coating solution a. Using this coating solution a, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
  • acetic acid 0.5 mol / L aqueous solution
  • Comparative Example 2 2.8 g of triethoxy-n-octylsilane (octyltriethoxysilane) as the organosilicon compound (A) and 4.6 g of tetramethyl orthosilicate (tetramethoxysilane) as the metal compound (B) are dissolved in 1.7 g of ethanol. And stirred at room temperature for 20 minutes. To the obtained solution, 0.28 g of hydrochloric acid (0.01 mol / L aqueous solution) as a catalyst was dropped, and then stirred for 24 hours to obtain a coating solution b. Using this coating solution b, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
  • a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
  • Comparative Example 4-2 A coating solution d-2 was prepared in the same manner as in Comparative Example 4-1, except that 0.095 ml of dimethyl sulfoxide was used instead of methyl ethyl ketone. Using this coating solution d-2, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
  • Comparative Example 5 A coating solution e was prepared in the same manner as in Comparative Example 4-2, except that 0.095 ml of n-octane was used instead of dimethyl sulfoxide. Using this coating solution e, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
  • Comparative Example 6 A coating solution f was prepared in the same manner as in Comparative Example 5 except that dodecane was used instead of octane. Using this coating solution f, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
  • Comparative Example 7 A coating solution g was prepared in the same manner as in Comparative Example 6 except that 1,2 dimethoxyethane was used instead of dodecane. Using this coating solution g, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
  • Table 10 shows the vapor pressure and boiling point of various solvents at 20 ° C.

Abstract

The purpose of the present invention is to provide a composition which exhibits water repellency, oil repellency and abrasion resistance and which can be coated by hand. The present invention is a composition which contains: an organic silicon compound (A1), in which a C6-20 alkyl group in which some methylene groups may be substituted with oxygen atoms and at least one hydrolyzable group are bonded to a silicon atom; or a prescribed organic silicon compound (A2). The composition further contains: a metal compound (B) in which at least one hydrolyzable group is bonded to a metal atom and in which a hydrocarbon-containing group in which the maximum chain length of a hydrocarbon chain moiety is shorter than the maximum chain length of the organic silicon compound (A1) or (A2) may be bonded to the metal atom; a high boiling point solvent (C) that satisfies prescribed requirements; and a low boiling point solvent (D). The concentration of the high boiling point solvent (C) is not less than 0.088 parts by mass and less than 1.74 parts by mass relative to 100 parts by mass of the composition.

Description

組成物Composition
 本発明は、各種基材に撥水・撥油性を付与することができる皮膜を形成する組成物に関する。 The present invention relates to a composition for forming a film capable of imparting water repellency and oil repellency to various substrates.
 各種車両や屋外設備等において、窓ガラス表面の汚れに由来する視認性の悪化や、外観不良等の問題が生じる場合がある。そのため、ガラス等の基材表面の撥水・撥油性が良好であることが求められる。特に基材表面への液滴の付着を防止するだけでなく、付着した液滴の除去が容易であることも求められる。 In various vehicles and outdoor equipment, problems such as poor visibility due to dirt on the window glass surface and poor appearance may occur. Therefore, the water / oil repellency of the surface of a substrate such as glass is required to be good. In particular, it is required not only to prevent the droplets from adhering to the surface of the substrate but also to easily remove the adhered droplets.
 例えば、特許文献1には、ゾルゲル膜を得るための塗布液であり、固形分及び溶媒を有し、固形分はアルコキシシランを酸性水溶液中で加水分解及び重縮合することで得られる酸化ケイ素オリゴマーを有し、溶媒はエチレングリコールモノアルキルエーテルと前記酸性水溶液を有する塗布液が開示されている。前記アルコキシシランとしては、メチルトリエトキシシランやγ-グリシドキシプロピルトリメトキシシランなどが具体的に開示されている。 For example, Patent Document 1 discloses a coating solution for obtaining a sol-gel film, which has a solid content and a solvent, and the solid content is obtained by hydrolysis and polycondensation of alkoxysilane in an acidic aqueous solution. And a coating solution containing ethylene glycol monoalkyl ether and the acidic aqueous solution as a solvent. Specific examples of the alkoxysilane include methyltriethoxysilane and γ-glycidoxypropyltrimethoxysilane.
 特許文献2には、有機シラン、金属アルコキシドを所定の比率で混合し、蒸気圧が水より大きな有機溶媒、水、触媒を含む溶液を、ガラス基板上にスピンコートした例が開示されている。 Patent Document 2 discloses an example in which an organic silane and a metal alkoxide are mixed at a predetermined ratio, and a solution containing an organic solvent having a vapor pressure larger than that of water, water, and a catalyst is spin-coated on a glass substrate.
 特許文献3には、アミノ変性ポリシロキサン、酸、及び活性剤を含む撥水剤において、さらに、アミノシランを含むガラス用撥水剤をハンドスプレーで塗布することが開示されている。また、特許文献4には、アミノ変性ジメチルポリシロキサンと、アルコール類と。水と、を含有する自動車用艶出し組成物をスプレーで塗布することが開示されている。 Patent Document 3 discloses that a water-repellent agent containing an amino-modified polysiloxane, an acid, and an activator is further applied by hand spraying with a glass water-repellent agent containing aminosilane. Patent Document 4 discloses amino-modified dimethylpolysiloxane and alcohols. It has been disclosed to spray an automotive polishing composition containing water.
特開2010-31188号公報JP 2010-31188 A 特開2013-213181号公報JP 2013-2131181 A 特開2009-173491号公報JP 2009-173491 A 特開2009-40936号公報JP 2009-40936 A
 上記特許文献1に記載の塗布液は、撥水・撥油性を有するものではない。また、撥水・撥油コーティングの塗布方法として、特許文献2ではスピンコート法、特許文献3、4でもスプレーコート法が用いられているが、これらの方法で用いるような特別な設備や器具等を用いることなく手塗りで皮膜を塗布できることは、コスト面や簡便さの点で非常に有利である。また、特許文献1には、手塗りの製膜方法が開示されているが、余剰成分を仕上げに拭取る必要があり、簡便とは言えない手法である。更に、皮膜は摩擦等を受けると破壊されやすくなって、液滴が付着し、或いは除去されにくくなる場合があり、その結果、基材の汚れや腐食、さらには性能低下が問題となることがあり、耐摩耗性等の耐久性も要求される。 The coating solution described in Patent Document 1 does not have water / oil repellency. In addition, as a method for applying the water / oil repellent coating, the spin coating method is used in Patent Document 2 and the spray coating method is used in Patent Documents 3 and 4, but special equipment and instruments used in these methods are used. The ability to apply the coating by hand without using is very advantageous in terms of cost and simplicity. Further, although Patent Document 1 discloses a hand-coated film forming method, it is a technique that cannot be said to be simple because it is necessary to wipe off surplus components to finish. Furthermore, the film may be easily destroyed when subjected to friction, etc., and droplets may adhere or become difficult to remove, resulting in problems such as contamination and corrosion of the base material, and further performance degradation. In addition, durability such as wear resistance is also required.
 そこで、本発明は、撥水・撥油性及び耐摩耗性を有すると共に、手塗り可能な組成物を提供することを目的とする。 Therefore, an object of the present invention is to provide a composition having water repellency, oil repellency, and abrasion resistance and capable of being hand-painted.
 本発明は、
 メチレン基の一部が酸素原子に置き換わっていてもよい炭素数6~20のアルキル基と、少なくとも1つの加水分解性基とがケイ素原子に結合している有機ケイ素化合物(A1)、または少なくとも1つのトリアルキルシリル基含有分子鎖と、少なくとも1つの加水分解性基とがケイ素原子に結合している有機ケイ素化合物(A2)を含み、
 さらに、少なくとも1つの加水分解性基が金属原子に結合しており、炭化水素鎖部分の最大鎖長が前記有機ケイ素化合物(A1)または(A2)の最大鎖長よりも短い炭化水素鎖含有基が前記金属原子に結合していてもよい金属化合物(B)と、
 20℃での蒸気圧が1000Pa以下であること及び沸点が120℃以上であることの少なくともいずれかを満たし、かつ溶解度パラメータが8.0(cal/cm31/2以上である高沸点溶媒(C)と、
 20℃での蒸気圧が1000Pa超であり且つ沸点が120℃未満である低沸点溶媒(D)とを含み、
 前記高沸点溶媒(C)の濃度が、組成物100質量部に対して、0.088質量部以上、1.74質量部未満である組成物である。
The present invention
An organosilicon compound (A1) in which an alkyl group having 6 to 20 carbon atoms, in which a part of a methylene group may be replaced by an oxygen atom, and at least one hydrolyzable group are bonded to a silicon atom, or at least 1 An organosilicon compound (A2) in which two trialkylsilyl group-containing molecular chains and at least one hydrolyzable group are bonded to a silicon atom,
Furthermore, at least one hydrolyzable group is bonded to a metal atom, and the hydrocarbon chain-containing group has a maximum chain length of the hydrocarbon chain portion shorter than the maximum chain length of the organosilicon compound (A1) or (A2). A metal compound (B) which may be bonded to the metal atom,
A high-boiling solvent satisfying at least one of a vapor pressure at 20 ° C. of 1000 Pa or less and a boiling point of 120 ° C. or more and a solubility parameter of 8.0 (cal / cm 3 ) 1/2 or more (C) and
A low boiling point solvent (D) having a vapor pressure at 20 ° C of more than 1000 Pa and a boiling point of less than 120 ° C,
It is a composition whose density | concentration of the said high boiling point solvent (C) is 0.088 mass part or more and less than 1.74 mass part with respect to 100 mass parts of compositions.
 前記有機ケイ素化合物(A1)又は(A2)に対する前記金属化合物(B)のモル比は2以上、48以下であることが好ましい。 The molar ratio of the metal compound (B) to the organosilicon compound (A1) or (A2) is preferably 2 or more and 48 or less.
 前記有機ケイ素化合物(A1)は、下記式(AI)で表されることが好ましい。 The organosilicon compound (A1) is preferably represented by the following formula (AI).
Figure JPOXMLDOC01-appb-C000004

[前記式(AI)中、Ra1はメチレン基の一部が酸素原子に置き換わっていてもよい炭素数が6~20のアルキル基を表し、
 複数のAa1は、それぞれ独立に、加水分解性基を表す。
 Za1は、炭化水素鎖含有基、または、加水分解性基を表し、Za1が炭化水素鎖含有基の場合、Ra1とZa1とは同一であっても異なっていてもよく、Za1が加水分解性基の場合、Za1とAa1とは、同一であっても異なっていてもよい。また、複数の式(AI)間でRa1とZa1とは同一であっても異なっていてもよい。]
Figure JPOXMLDOC01-appb-C000004

[In the formula (AI), R a1 represents an alkyl group having 6 to 20 carbon atoms in which part of the methylene group may be replaced by an oxygen atom,
Several A <a1> represents a hydrolysable group each independently.
Z a1 is a hydrocarbon chain-containing group, or represents a hydrolyzable group, and when Z a1 is a hydrocarbon chain containing groups may be the R a1 and Z a1 or different may be the same, Z a1 Is a hydrolyzable group, Z a1 and A a1 may be the same or different. In addition, R a1 and Z a1 may be the same or different among a plurality of formulas (AI). ]
 前記有機ケイ素化合物(A2)は、下記式(AII)で表されることが好ましい。 The organosilicon compound (A2) is preferably represented by the following formula (AII).
Figure JPOXMLDOC01-appb-C000005

[式(AII)中、Ra2はトリアルキルシリル基含有分子鎖を表し、複数のAa2は、それぞれ独立に、加水分解性基を表す。Za2は、トリアルキルシリル基含有分子鎖、炭化水素鎖含有基、シロキサン骨格含有基又は加水分解性基を表す。]
Figure JPOXMLDOC01-appb-C000005

[In formula (AII), R a2 represents a trialkylsilyl group-containing molecular chain, and a plurality of A a2 each independently represents a hydrolyzable group. Z a2 represents a trialkylsilyl group-containing molecular chain, a hydrocarbon chain-containing group, a siloxane skeleton-containing group, or a hydrolyzable group. ]
 前記金属化合物(B)は、下記式(BI)で表されることが好ましい。 The metal compound (B) is preferably represented by the following formula (BI).
Figure JPOXMLDOC01-appb-C000006

[前記式(BI)中、
 Rb1は、炭化水素鎖部分の最大鎖長が前記炭素数6~20のアルキル基の最大鎖長よりも短い炭化水素鎖含有基または加水分解性基を表す。
 Ab1は、それぞれ独立に、加水分解性基を表す。
 Mは、Al、Fe、In、Ge、Hf、Si、Ti、Sn、Zr、または、Taを表す。
 mは、Mの価数に応じて、1~4の整数を表す。]
Figure JPOXMLDOC01-appb-C000006

[In the formula (BI),
R b1 represents a hydrocarbon chain-containing group or hydrolyzable group in which the maximum chain length of the hydrocarbon chain portion is shorter than the maximum chain length of the alkyl group having 6 to 20 carbon atoms.
A b1 independently represents a hydrolyzable group.
M represents Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta.
m represents an integer of 1 to 4 depending on the valence of M. ]
 前記式(BI)中、Rb1とAb1は同一の基であることが好ましい。 In the formula (BI), R b1 and A b1 are preferably the same group.
 前記式(BI)中、MはSiであることが好ましい。 In the formula (BI), M is preferably Si.
 本発明の組成物によれば、メチレン基の一部が酸素原子に置き換わっていてもよい炭素数が6~20のアルキル基と加水分解性基とがケイ素原子に結合している有機ケイ素化合物(A1)又は少なくとも1つのトリアルキルシリル基含有分子鎖と、少なくとも1つの加水分解性基とがケイ素原子に結合している有機ケイ素化合物(A2)と、加水分解性基が金属原子に結合している金属化合物(B)と、高沸点溶媒(C)と、低沸点溶媒(D)とを含むため、撥水・撥油性及び耐摩耗性を有する皮膜を、手塗りでムラなく基材に塗布することができる。 According to the composition of the present invention, an organosilicon compound in which an alkyl group having 6 to 20 carbon atoms and a hydrolyzable group in which a part of a methylene group may be replaced with an oxygen atom is bonded to a silicon atom ( A1) or an organosilicon compound (A2) in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom, and the hydrolyzable group is bonded to a metal atom Coating with water and oil repellency and abrasion resistance on the substrate without unevenness because it contains the metal compound (B), the high boiling point solvent (C), and the low boiling point solvent (D). can do.
 本発明の組成物は、メチレン基の一部が酸素原子に置き換わっていてもよい炭素数が6~20のアルキル基と、少なくとも1つの加水分解性基とがケイ素原子に結合している有機ケイ素化合物(A1)または少なくとも1つのトリアルキルシリル基含有分子鎖と、少なくとも1つの加水分解性基とがケイ素原子に結合している有機ケイ素化合物(A2)と、少なくとも1つの加水分解性基が金属原子に結合し、炭化水素鎖部分の最大鎖長が前記有機ケイ素化合物(A1)または(A2)の最大鎖長よりも短い炭化水素鎖含有基が前記金属原子に結合していてもよい金属化合物(B)とを含む。このような組成物から、ケイ素原子、或いは金属原子に結合している加水分解性基が加水分解、重縮合して皮膜が形成される。また、本発明の組成物によれば、成膜にあたり仕上げに余剰分を拭き取る作業を必要としない。 The composition of the present invention is an organosilicon in which an alkyl group having 6 to 20 carbon atoms in which a part of a methylene group may be replaced with an oxygen atom and at least one hydrolyzable group are bonded to a silicon atom. Compound (A1) or organosilicon compound (A2) in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom, and at least one hydrolyzable group is a metal A metal compound in which a hydrocarbon chain-containing group bonded to an atom and having a maximum chain length of a hydrocarbon chain portion shorter than the maximum chain length of the organosilicon compound (A1) or (A2) may be bonded to the metal atom (B). From such a composition, a hydrolyzable group bonded to a silicon atom or a metal atom is hydrolyzed and polycondensed to form a film. In addition, according to the composition of the present invention, it is not necessary to wipe off the surplus for finishing in the film formation.
 有機ケイ素化合物として(A1)を用いる場合の皮膜は、この皮膜を形成するケイ素原子のうち一部のケイ素に、メチレン基の一部が酸素原子に置き換わっていてもよい炭素数が6~20のアルキル基(以下、単に炭素数6~20のアルキル基と呼ぶ場合がある)が結合した状態となる。そして、この炭素数6~20のアルキル基によって、皮膜に撥水・撥油機能が付与される。また、有機ケイ素化合物として(A2)を用いる場合の皮膜は、この皮膜を形成するケイ素原子のうち一部のケイ素に、トリアルキルシリル基含有分子鎖を有する基が結合した状態となる。そして、このトリアルキルシリル基によって、皮膜に撥水・撥油機能が付与される。 When (A1) is used as the organosilicon compound, the film has 6 to 20 carbon atoms in which some of the silicon atoms forming the film may be replaced by oxygen atoms with some of the methylene groups. An alkyl group (hereinafter sometimes simply referred to as an alkyl group having 6 to 20 carbon atoms) is bonded. The film has a water repellent / oil repellent function by the alkyl group having 6 to 20 carbon atoms. In the case of using (A2) as the organosilicon compound, a film having a trialkylsilyl group-containing molecular chain is bonded to a part of the silicon atoms forming the film. The trialkylsilyl group imparts water / oil repellency to the film.
 炭素数6~20のアルキル基及びトリアルキルシリル基が結合していない元素(例えば、上記金属原子)は、皮膜中で実質的にスペーサーとして機能することになり、耐摩耗性が高められる。そして、本発明の組成物の好ましい態様では、前記有機ケイ素化合物((A1)又は(A2))と金属化合物(B)のモル比を特定範囲に調整しているため、得られる皮膜において、炭素数6~20のアルキル基又はトリアルキルシリル基とスペーサーとが特定の割合で存在することとなり、撥水・撥油機能が高められると同時に、耐摩耗性がより一層高められた皮膜を提供できる。 An element to which an alkyl group having 6 to 20 carbon atoms and a trialkylsilyl group are not bonded (for example, the above metal atom) substantially functions as a spacer in the film, and wear resistance is improved. In a preferred embodiment of the composition of the present invention, the molar ratio of the organosilicon compound ((A1) or (A2)) to the metal compound (B) is adjusted to a specific range. The alkyl group or trialkylsilyl group of several 6 to 20 and the spacer are present in a specific ratio, so that the water and oil repellency functions can be improved and at the same time, a film with further improved wear resistance can be provided. .
 更に、本発明の組成物は、所定の要件を満たす高沸点溶媒(C)を含む。高沸点溶媒を含むことによって、組成物を基材に手塗りで塗布する際に、揮発することなく基材上に残った高沸点溶媒(C)により、組成物をムラなく塗布することが可能となる。 Furthermore, the composition of the present invention contains a high boiling point solvent (C) that satisfies predetermined requirements. By containing a high-boiling solvent, the composition can be applied evenly with the high-boiling solvent (C) remaining on the substrate without volatilization when the composition is applied to the substrate by hand. It becomes.
 以下、有機ケイ素化合物(A1)及び(A2)についてそれぞれ説明する。 Hereinafter, each of the organosilicon compounds (A1) and (A2) will be described.
 (1-1)有機ケイ素化合物(A1)
 撥水・撥油性に関して、本発明では、有機ケイ素化合物(A1)の中心ケイ素原子に炭化水素鎖含有基(以下、第1の炭化水素鎖含有基と呼ぶ)が結合しており、この第1の炭化水素鎖含有基として炭素数6~20のアルキル基がケイ素原子に結合している点が重要である。この炭素数が6~20のアルキル基によって、得られる皮膜界面(表面)に撥水・撥油性が付与される。特に液滴(水滴、油滴等)と皮膜の間の摩擦係数が小さくなり、液滴が移動しやすくなる。前記した炭素数が6~20のアルキル基は、炭素数が7以上、17以下であることが好ましく、8以上、15以下であることがより好ましい。
(1-1) Organosilicon compound (A1)
With regard to water / oil repellency, in the present invention, a hydrocarbon chain-containing group (hereinafter referred to as a first hydrocarbon chain-containing group) is bonded to the central silicon atom of the organosilicon compound (A1). It is important that an alkyl group having 6 to 20 carbon atoms is bonded to a silicon atom as the hydrocarbon chain-containing group. The alkyl group having 6 to 20 carbon atoms imparts water / oil repellency to the resulting film interface (surface). In particular, the coefficient of friction between the droplets (water droplets, oil droplets, etc.) and the film is reduced, and the droplets are easy to move. The alkyl group having 6 to 20 carbon atoms described above preferably has 7 to 17 carbon atoms, and more preferably 8 to 15 carbon atoms.
 有機ケイ素化合物(A1)のケイ素原子には、炭素数6~20のアルキル基が1つ結合している他、更に第1の炭化水素鎖含有基が結合していても良い。第1の炭化水素鎖含有基(炭素数6~20のアルキル基を含む)は、通常、炭化水素基(炭化水素鎖)のみから構成されるが、必要により、この炭化水素鎖の一部のメチレン基(-CH2-)が酸素原子に置き換わっていていてもよい。このように一部が酸素原子で置換された基であっても、残りの部分に炭化水素鎖が存在するため、炭化水素鎖含有基に分類される。なおSi原子に隣接するメチレン基(-CH2-)は酸素原子に置き換わることはなく、また連続する2つのメチレン基(-CH2-)が同時に酸素原子に置き換わることもない。以下、特に断りがない限り、酸素非置換型のアルキル基及び炭化水素鎖含有基(すなわち1価の炭化水素基)を例にとって第1の炭化水素鎖含有基について説明するが、いずれの説明でも、そのメチレン基(-CH2-)のうち一部を酸素原子に置き換えることが可能である。 In addition to one alkyl group having 6 to 20 carbon atoms being bonded to the silicon atom of the organosilicon compound (A1), a first hydrocarbon chain-containing group may be further bonded. The first hydrocarbon chain-containing group (including an alkyl group having 6 to 20 carbon atoms) is usually composed of only a hydrocarbon group (hydrocarbon chain), but if necessary, a part of the hydrocarbon chain The methylene group (—CH 2 —) may be replaced with an oxygen atom. Even a group partially substituted with an oxygen atom in this manner is classified as a hydrocarbon chain-containing group because a hydrocarbon chain exists in the remaining part. The methylene group (—CH 2 —) adjacent to the Si atom is not replaced with an oxygen atom, and two consecutive methylene groups (—CH 2 —) are not replaced with an oxygen atom at the same time. Hereinafter, unless otherwise specified, the first hydrocarbon chain-containing group will be described using an oxygen-unsubstituted alkyl group and a hydrocarbon chain-containing group (that is, a monovalent hydrocarbon group) as an example. A part of the methylene group (—CH 2 —) can be replaced with an oxygen atom.
 また、有機ケイ素化合物(A1)のケイ素原子に結合する第1の炭化水素鎖含有基のうち炭素数6~20のアルキル基の他に更に結合していても良い前記第1の炭化水素鎖含有基は、それが炭化水素基の場合には、炭素数が6以上、20以下であることが好ましく、より好ましくは炭素数7以上、17以下であり、更に好ましくは炭素数8以上、15以下である。 Further, among the first hydrocarbon chain-containing groups bonded to the silicon atom of the organosilicon compound (A1), the first hydrocarbon chain-containing group which may be further bonded in addition to the alkyl group having 6 to 20 carbon atoms. When it is a hydrocarbon group, the group preferably has 6 to 20 carbon atoms, more preferably 7 to 17 carbon atoms, and still more preferably 8 to 15 carbon atoms. It is.
 なお、第1の炭化水素鎖含有基の一部のメチレン基が酸素原子に置き換わっている場合、これらの基の炭素数とは、酸素原子に置き換わる前の炭素数を意味するものとする。 In addition, when some methylene groups of the first hydrocarbon chain-containing group are replaced with oxygen atoms, the carbon number of these groups means the number of carbons before being replaced with oxygen atoms.
 炭素数6~20のアルキル基を含む第1の炭化水素鎖含有基(炭化水素基の場合)は、分岐鎖であっても直鎖であってもよい。また、炭素数6~20のアルキル基の他に更に結合していても良い第1の炭化水素鎖含有基(炭化水素基の場合)は、飽和または不飽和の脂肪族炭化水素鎖含有基であることが好ましく、飽和脂肪族炭化水素鎖含有基であることがより好ましい。前記飽和脂肪族炭化水素鎖含有基(炭化水素基の場合)としては、飽和脂肪族炭化水素基がより好ましい。 The first hydrocarbon chain-containing group (in the case of a hydrocarbon group) containing an alkyl group having 6 to 20 carbon atoms may be branched or linear. In addition to the alkyl group having 6 to 20 carbon atoms, the first hydrocarbon chain-containing group (in the case of hydrocarbon group) which may be further bonded is a saturated or unsaturated aliphatic hydrocarbon chain-containing group. Preferably, it is a saturated aliphatic hydrocarbon chain-containing group. The saturated aliphatic hydrocarbon chain-containing group (in the case of a hydrocarbon group) is more preferably a saturated aliphatic hydrocarbon group.
 炭素数6~20のアルキル基及び前記飽和脂肪族炭化水素基には、例えば、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基、ドデシル基、トリデシル基、テトラデシル基、ペンタデシル基、ヘキサデシル基、ヘプタデシル基、オクタデシル基、ノナデシル基、イコシル基等が含まれる。 Examples of the alkyl group having 6 to 20 carbon atoms and the saturated aliphatic hydrocarbon group include a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group, a tetradecyl group, and a pentadecyl group. , Hexadecyl group, heptadecyl group, octadecyl group, nonadecyl group, icosyl group and the like.
 第1の炭化水素鎖含有基の炭化水素基の一部のメチレン基(-CH2-)が酸素原子に置き換わる場合、炭化水素基としては飽和脂肪族炭化水素基が好ましい。第1の炭化水素鎖含有基において、炭化水素基の一部のメチレン基(-CH2-)が酸素原子に置き換わった基としては、具体的には、(ポリ)エチレングリコール単位を有する基、(ポリ)プロピレングリコール単位を有する基等を例示することができる。 When a partial methylene group (—CH 2 —) of the hydrocarbon group of the first hydrocarbon chain-containing group is replaced with an oxygen atom, the saturated aliphatic hydrocarbon group is preferred as the hydrocarbon group. In the first hydrocarbon chain-containing group, the group in which a methylene group (—CH 2 —) as a part of the hydrocarbon group is replaced with an oxygen atom specifically includes a group having a (poly) ethylene glycol unit, Examples include a group having a (poly) propylene glycol unit.
 有機ケイ素化合物(A1)において、中心ケイ素原子に結合する第1の炭化水素鎖含有基の個数は、炭素数が6~20のアルキル基の個数を含めて通常1以上であり、2以下であることが好ましく、1であること(すなわち第1の炭化水素鎖含有基として炭素数が6~20のアルキル基のみである)が特に好ましい。 In the organosilicon compound (A1), the number of the first hydrocarbon chain-containing groups bonded to the central silicon atom is usually 1 or more including the number of alkyl groups having 6 to 20 carbon atoms, and 2 or less. It is particularly preferable that the number is 1 (that is, only the alkyl group having 6 to 20 carbon atoms as the first hydrocarbon chain-containing group).
 前記有機ケイ素化合物(A1)の加水分解性基としては、加水分解によりヒドロキシ基(シラノール基)を与える基であればよく、例えば、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基等の炭素数1~4のアルコキシ基;ヒドロキシ基;アセトキシ基;塩素原子;イソシアネート基;等を好ましく挙げることができる。中でも、炭素数1~4のアルコキシ基が好ましく、炭素数1~2のアルコキシ基がより好ましい。 The hydrolyzable group of the organosilicon compound (A1) may be any group that provides a hydroxy group (silanol group) by hydrolysis. For example, the number of carbon atoms is 1 such as a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. Preferred examples thereof include an alkoxy group of 1 to 4, a hydroxy group, an acetoxy group, a chlorine atom, an isocyanate group, and the like. Among these, an alkoxy group having 1 to 4 carbon atoms is preferable, and an alkoxy group having 1 to 2 carbon atoms is more preferable.
 有機ケイ素化合物(A1)において、中心ケイ素原子に結合する加水分解性基の個数は、通常1以上であり、2以上であることが好ましく、通常、3以下であることが好ましい。 In the organosilicon compound (A1), the number of hydrolyzable groups bonded to the central silicon atom is usually 1 or more, preferably 2 or more, and usually 3 or less.
 また、有機ケイ素化合物(A1)のケイ素原子には、炭素数6~20のアルキル基、加水分解性基のほか、この炭素数6~20のアルキル基よりも炭化水素鎖部分の炭素数が少ない炭化水素鎖含有基(以下、第2の炭化水素鎖含有基と呼ぶ)が結合していてもよい。 In addition, the silicon atom of the organosilicon compound (A1) has fewer carbon atoms in the hydrocarbon chain portion than the alkyl group having 6 to 20 carbon atoms and hydrolyzable group, and the alkyl group having 6 to 20 carbon atoms. A hydrocarbon chain-containing group (hereinafter referred to as a second hydrocarbon chain-containing group) may be bonded.
 炭素数6~20のアルキル基及び第2の炭化水素鎖含有基の長さは、Si等の金属原子に結合する元素を含む最長直鎖(以下、「主鎖」ともいう。)の長さ(最長鎖長)として評価することができる。第2の炭化水素鎖含有基を前記炭素数6~20のアルキル基よりも主鎖の長さが短いものとするためには、例えば、炭化水素鎖部分の炭素数が前記炭素数6~20のアルキル基の炭素数よりも少ないものであることが好ましい。通常、第2の炭化水素鎖含有基は、前記炭素数6~20のアルキル基と同様に炭化水素基(炭化水素鎖)のみから構成されるが、必要により、この炭化水素鎖の一部のメチレン基(-CH2-)が酸素原子に置き換わった基であってもよい。また、Si原子に隣接するメチレン基(-CH2-)は酸素原子に置き換わることはなく、また連続する2つのメチレン基(-CH2-)が同時に酸素原子に置き換わることもない。 The length of the alkyl group having 6 to 20 carbon atoms and the second hydrocarbon chain-containing group is the length of the longest straight chain (hereinafter also referred to as “main chain”) containing an element bonded to a metal atom such as Si. It can be evaluated as (longest chain length). In order for the second hydrocarbon chain-containing group to have a main chain shorter than the alkyl group having 6 to 20 carbon atoms, for example, the hydrocarbon chain moiety has 6 to 20 carbon atoms. It is preferable that it is less than carbon number of the alkyl group of. Normally, the second hydrocarbon chain-containing group is composed of only a hydrocarbon group (hydrocarbon chain) as in the case of the alkyl group having 6 to 20 carbon atoms. The methylene group (—CH 2 —) may be a group in which an oxygen atom is replaced. Further, the methylene group (—CH 2 —) adjacent to the Si atom is not replaced with an oxygen atom, and two consecutive methylene groups (—CH 2 —) are not replaced with an oxygen atom at the same time.
 なお、炭化水素鎖部分の炭素数とは、酸素非置換型の炭化水素鎖含有基では炭化水素基(炭化水素鎖)を構成する炭素原子の数を意味し、酸素置換型の炭化水素鎖含有基では、酸素原子をメチレン基(-CH2-)と仮定して数えた炭素原子の数を意味するものとする。 In addition, the carbon number of the hydrocarbon chain portion means the number of carbon atoms constituting the hydrocarbon group (hydrocarbon chain) in the oxygen non-substituted hydrocarbon chain-containing group, and includes the oxygen-substituted hydrocarbon chain. In the group, the number of carbon atoms is assumed assuming that the oxygen atom is a methylene group (—CH 2 —).
 以下、特に断りがない限り、酸素非置換型の炭化水素鎖含有基(すなわち1価の炭化水素基)を例にとって第2の炭化水素鎖含有基について説明するが、いずれの説明でも、そのメチレン基(-CH2-)のうち一部を酸素原子に置き換えることが可能である。 Hereinafter, unless otherwise specified, the second hydrocarbon chain-containing group will be described by taking an oxygen non-substituted hydrocarbon chain-containing group (that is, a monovalent hydrocarbon group) as an example. Part of the group (—CH 2 —) can be replaced with an oxygen atom.
 前記第2の炭化水素鎖含有基は、それが炭化水素基の場合には、炭素数は1以上、5以下であることが好ましく、より好ましくは1以上、3以下である。また、前記第2の炭化水素鎖含有基(炭化水素基の場合)は、分岐鎖であっても直鎖であってもよい。 When the second hydrocarbon chain-containing group is a hydrocarbon group, the number of carbon atoms is preferably 1 or more and 5 or less, more preferably 1 or more and 3 or less. Further, the second hydrocarbon chain-containing group (in the case of a hydrocarbon group) may be branched or linear.
 第2の炭化水素鎖含有基(炭化水素基の場合)は、飽和または不飽和の脂肪族炭化水素鎖含有基であることが好ましく、飽和脂肪族炭化水素鎖含有基であることがより好ましい。前記飽和脂肪族炭化水素鎖含有基(炭化水素基の場合)としては、飽和脂肪族炭化水素基がより好ましい。飽和脂肪族炭化水素基には、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基等が含まれる。 The second hydrocarbon chain-containing group (in the case of a hydrocarbon group) is preferably a saturated or unsaturated aliphatic hydrocarbon chain-containing group, and more preferably a saturated aliphatic hydrocarbon chain-containing group. The saturated aliphatic hydrocarbon chain-containing group (in the case of a hydrocarbon group) is more preferably a saturated aliphatic hydrocarbon group. Examples of the saturated aliphatic hydrocarbon group include a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group.
 炭化水素基の一部のメチレン基(-CH2-)が酸素原子に置き換わる場合、炭化水素基は、飽和脂肪族炭化水素基であることが好ましく、炭化水素基の一部のメチレン基(-CH2-)が酸素原子に置き換わった基としては、具体的には、(ポリ)エチレングリコール単位を有する基等を例示することができる。 When a partial methylene group (—CH 2 —) of the hydrocarbon group is replaced with an oxygen atom, the hydrocarbon group is preferably a saturated aliphatic hydrocarbon group, and a partial methylene group (— Specific examples of the group in which CH 2 —) is replaced by an oxygen atom include a group having a (poly) ethylene glycol unit.
 有機ケイ素化合物(A1)において、中心ケイ素原子に結合する第2の炭化水素鎖含有基の個数は、2以下であることが好ましく、より好ましくは1以下であり、特に好ましくは0である。 In the organosilicon compound (A1), the number of the second hydrocarbon chain-containing groups bonded to the central silicon atom is preferably 2 or less, more preferably 1 or less, and particularly preferably 0.
 前記有機ケイ素化合物(A1)は、具体的には、下記式(AI)で表される化合物であることが好ましい。 Specifically, the organosilicon compound (A1) is preferably a compound represented by the following formula (AI).
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
[前記式(AI)中、Ra1はメチレン基の一部が酸素原子に置き換わっていてもよい炭素数が6~20のアルキル基を表し、複数のAa1は、それぞれ独立に、加水分解性基を表す。Za1は、炭化水素鎖含有基、または、加水分解性基を表し、Za1が炭化水素鎖含有基の場合、Ra1とZa1とは同一であっても異なっていてもよく、Za1が加水分解性基の場合、Za1とAa1とは、同一であっても異なっていてもよい。また、複数の式(AI)間でRa1とZa1とは同一であっても異なっていてもよい。] [In the formula (AI), R a1 represents an alkyl group having 6 to 20 carbon atoms in which part of the methylene group may be replaced by an oxygen atom, and a plurality of A a1 are independently hydrolyzable. Represents a group. Z a1 is a hydrocarbon chain-containing group, or represents a hydrolyzable group, and when Z a1 is a hydrocarbon chain containing groups may be the R a1 and Z a1 or different may be the same, Z a1 Is a hydrolyzable group, Z a1 and A a1 may be the same or different. In addition, R a1 and Z a1 may be the same or different among a plurality of formulas (AI). ]
 式(AI)中、Za1の炭化水素鎖含有基、Aa1、Za1の加水分解性基は、それぞれ第1の炭化水素鎖含有基(炭素数が6~20のアルキル基を含む)、第2の炭化水素鎖含有基、加水分解性基として上記説明した範囲から適宜選択できる。 Formula (AI) in the hydrocarbon chain-containing group, a hydrolyzable group A a1, Z a1 of Z a1, respectively first hydrocarbon chain-containing group (carbon atoms containing an alkyl group of 6 to 20), The second hydrocarbon chain-containing group and the hydrolyzable group can be appropriately selected from the ranges described above.
 式(AI)中、Za1は、第2の炭化水素鎖含有基、または、加水分解性基であることが好ましく、加水分解性基であることがより好ましい。 In formula (AI), Z a1 is preferably a second hydrocarbon chain-containing group or a hydrolyzable group, and more preferably a hydrolyzable group.
 有機ケイ素化合物(A1)としては、炭素数が6~20のアルキル基を1つと、加水分解性基を3つ有する化合物;炭素数が6~20のアルキル基を1つと、第2の炭化水素鎖含有基を1つと、加水分解性基を1つ有する化合物;等を好ましく挙げることができる。 As the organosilicon compound (A1), a compound having one alkyl group having 6 to 20 carbon atoms and three hydrolyzable groups; one alkyl group having 6 to 20 carbon atoms and a second hydrocarbon Preferred examples include compounds having one chain-containing group and one hydrolyzable group.
 炭素数が6~20のアルキル基を1つと、加水分解性基を3つ有する化合物において、3つの加水分解性基はケイ素原子に結合している。3つの加水分解性基がケイ素原子に結合している基としては、トリメトキシシリル基、トリエトキシシリル基、トリプロポキシシリル基、トリブトキシシリル基等のトリアルコキシシリル基;トリヒドロキシシリル基;トリアセトキシシリル基;トリクロロシリル基;トリイソシアネートシリル基;等が挙げられる。 In a compound having one alkyl group having 6 to 20 carbon atoms and three hydrolyzable groups, the three hydrolyzable groups are bonded to a silicon atom. Examples of the group in which three hydrolyzable groups are bonded to a silicon atom include trialkoxysilyl groups such as a trimethoxysilyl group, a triethoxysilyl group, a tripropoxysilyl group, and a tributoxysilyl group; a trihydroxysilyl group; Acetoxysilyl group; trichlorosilyl group; triisocyanatesilyl group; and the like.
 炭素数が6~20のアルキル基を1つと、第2の炭化水素鎖含有基を1つと、加水分解性基を2つ有する化合物において、1つの第2の炭化水素鎖含有基と、2つの加水分解性基は、ケイ素原子に結合している。1つの第2の炭化水素鎖含有基と、2つの加水分解性基がケイ素原子に結合している基としては、メチルジメトキシシリル基、エチルジメトキシシリル基、メチルジエトキシシリル基、エチルジエトキシシリル基、メチルジプロポキシシリル基等のアルキルジアルコキシシリル基;等が挙げられる。 In the compound having one alkyl group having 6 to 20 carbon atoms, one second hydrocarbon chain-containing group, and two hydrolyzable groups, one second hydrocarbon chain-containing group, two The hydrolyzable group is bonded to the silicon atom. Examples of the group in which one second hydrocarbon chain-containing group and two hydrolyzable groups are bonded to a silicon atom include methyldimethoxysilyl group, ethyldimethoxysilyl group, methyldiethoxysilyl group, ethyldiethoxysilyl group Group, alkyl dialkoxysilyl group such as methyldipropoxysilyl group; and the like.
 炭素数が6~20のアルキル基を1つと、加水分解性基を3つ有する化合物としては、具体的には、炭素数6~20のアルキル基を有するアルキルトリメトキシシラン、炭素数6~20のアルキル基を有するアルキルトリエトキシシラン等の炭素数6~20のアルキル基を有するアルキルトリアルコキシシラン;炭素数6~20のアルキル基を有するアルキルトリヒドロキシシラン;炭素数6~20のアルキル基を有するアルキルトリアセトキシシラン;炭素数6~20のアルキル基を有するアルキルトリクロロシラン;炭素数6~20のアルキル基を有するアルキルトリイソシアネートシラン;等が挙げられる。 Specific examples of the compound having one alkyl group having 6 to 20 carbon atoms and three hydrolyzable groups include alkyltrimethoxysilane having an alkyl group having 6 to 20 carbon atoms, and 6 to 20 carbon atoms. An alkyltrialkoxysilane having an alkyl group having 6 to 20 carbon atoms, such as an alkyltriethoxysilane having an alkyl group of 6; an alkyltrihydroxysilane having an alkyl group having 6 to 20 carbon atoms; an alkyl group having 6 to 20 carbon atoms; And alkyltriacetoxysilane having an alkyl group having 6 to 20 carbon atoms; alkyltriisocyanate silane having an alkyl group having 6 to 20 carbon atoms; and the like.
 また、炭素数が6~20のアルキル基を1つと、第2の炭化水素鎖含有基を1つと、加水分解性基を2つ有する化合物としては、具体的には、炭素数6~20のアルキル基を有するアルキルメチルジメトキシシラン、炭素数6~20のアルキル基を有するアルキルメチルジエトキシシラン等のアルキルメチルジアルコキシシラン;炭素数6~20のアルキル基を有するアルキルメチルジヒドロキシシラン;炭素数6~20のアルキル基を有するアルキルメチルジアセトキシシラン;炭素数6~20のアルキル基を有するアルキルメチルジクロロシラン;炭素数6~20のアルキル基を有するアルキルメチルジイソシアネートシラン;等が挙げられる。 Further, specific examples of the compound having one alkyl group having 6 to 20 carbon atoms, one second hydrocarbon chain-containing group, and two hydrolyzable groups include 6 to 20 carbon atoms. Alkylmethyldialkoxysilanes such as alkylmethyldimethoxysilane having an alkyl group and alkylmethyldiethoxysilane having an alkyl group having 6 to 20 carbon atoms; alkylmethyldihydroxysilane having an alkyl group having 6 to 20 carbon atoms; Alkylmethyldiacetoxysilane having an alkyl group of ˜20; alkylmethyldichlorosilane having an alkyl group of 6 to 20 carbon atoms; alkylmethyl diisocyanate silane having an alkyl group of 6 to 20 carbon atoms; and the like.
 中でも、炭素数が6~20のアルキル基を1つと、加水分解性基を3つ有する化合物が好ましく、炭素数6~20のアルキル基を有するアルキルトリアルコキシシランがより好ましい。 Among them, a compound having one alkyl group having 6 to 20 carbon atoms and three hydrolyzable groups is preferable, and an alkyltrialkoxysilane having an alkyl group having 6 to 20 carbon atoms is more preferable.
 (1-2)有機ケイ素化合物(A2)
 前記有機ケイ素化合物(A2)は、1分子中に、中心ケイ素原子に結合している少なくとも1つのトリアルキルシリル基含有分子鎖と、中心ケイ素原子に結合している少なくとも1つの加水分解性基とを有する。有機ケイ素化合物(A2)としては、1つのトリアルキルシリル基含有分子鎖と、3つの加水分解性基とが中心ケイ素原子に結合している化合物;1つのトリアルキルシリル基含有分子鎖と、1つのシロキサン骨格含有基と、2つの加水分解性基とが中心ケイ素原子に結合している化合物;1つのトリアルキルシリル基含有分子鎖と、1つの炭化水素鎖含有基と、2つの加水分解性基とが中心ケイ素原子に結合している化合物;等を挙げることができる。
(1-2) Organosilicon compound (A2)
The organosilicon compound (A2) includes, in one molecule, at least one trialkylsilyl group-containing molecular chain bonded to the central silicon atom, and at least one hydrolyzable group bonded to the central silicon atom. Have As the organosilicon compound (A2), a compound in which one trialkylsilyl group-containing molecular chain and three hydrolyzable groups are bonded to a central silicon atom; one trialkylsilyl group-containing molecular chain, 1 Compound in which one siloxane skeleton-containing group and two hydrolyzable groups are bonded to the central silicon atom; one trialkylsilyl group-containing molecular chain, one hydrocarbon chain-containing group, and two hydrolyzable groups A compound in which the group is bonded to the central silicon atom;
 具体的には、有機ケイ素化合物(A2)は、下記式(AII)で表される化合物であることが好ましい。 Specifically, the organosilicon compound (A2) is preferably a compound represented by the following formula (AII).
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
[式(AII)中、Ra2はトリアルキルシリル基含有分子鎖を表し、複数のAa2は、それぞれ独立に、加水分解性基を表す。Za2は、トリアルキルシリル基含有分子鎖、炭化水素鎖含有基、シロキサン骨格含有基又は加水分解性基を表す。] [In formula (AII), R a2 represents a trialkylsilyl group-containing molecular chain, and a plurality of A a2 each independently represents a hydrolyzable group. Z a2 represents a trialkylsilyl group-containing molecular chain, a hydrocarbon chain-containing group, a siloxane skeleton-containing group, or a hydrolyzable group. ]
 前記トリアルキルシリル基含有分子鎖は、トリアルキルシリル含有基が分子鎖の末端に結合した構造を有する1価の基であり、分子鎖にトリアルキルシリル含有基が結合していることで、本発明の組成物から形成される皮膜の撥水性及び撥油性が向上する。またトリアルキルシリル基含有分子鎖が存在することで、液滴(水滴、油滴等)と該皮膜の間の摩擦が低減され、液滴が移動しやすくなる。さらに、トリアルキルシリル基を有することで、化学的・物理的耐久性が高められ、耐熱性、耐光性が向上する。トリアルキルシリル含有基のアルキル基がフルオロアルキル基に置き換わっている場合においても、同様に該皮膜界面(表面)の撥水・撥油性を向上することができる。 The trialkylsilyl group-containing molecular chain is a monovalent group having a structure in which the trialkylsilyl-containing group is bonded to the end of the molecular chain, and the trialkylsilyl-containing group is bonded to the molecular chain. The water repellency and oil repellency of the film formed from the composition of the invention are improved. Further, the presence of the trialkylsilyl group-containing molecular chain reduces the friction between the droplet (water droplet, oil droplet, etc.) and the coating, and facilitates the movement of the droplet. Furthermore, by having a trialkylsilyl group, chemical and physical durability are enhanced, and heat resistance and light resistance are improved. Even in the case where the alkyl group of the trialkylsilyl-containing group is replaced with a fluoroalkyl group, the water / oil repellency of the film interface (surface) can be similarly improved.
 前記トリアルキルシリル含有基は、少なくとも1つのトリアルキルシリル基を含む基であり、好ましくは2つ以上、さらに好ましくは3つのトリアルキルシリル基を含む。トリアルキルシリル含有基は、式(s1)で表される基であることが好ましい。 The trialkylsilyl-containing group is a group containing at least one trialkylsilyl group, preferably two or more, more preferably three trialkylsilyl groups. The trialkylsilyl-containing group is preferably a group represented by the formula (s1).
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
[式(s1)中、Rs1は炭化水素基又はトリアルキルシリルオキシ基を表し、該炭化水素基又はトリアルキルシリルオキシ基に含まれる水素原子は、フッ素原子に置換されていてもよい。ただし、Rs1が全て炭化水素基である場合、Rs1はアルキル基である。*は結合手を表す。] [In formula (s1), R s1 represents a hydrocarbon group or a trialkylsilyloxy group, and the hydrogen atom contained in the hydrocarbon group or the trialkylsilyloxy group may be substituted with a fluorine atom. However, when all R s1 is a hydrocarbon group, R s1 is an alkyl group. * Represents a bond. ]
 Rs1で表される炭化水素基の炭素数は、1~4であることが好ましく、より好ましくは1~3、さらに好ましくは1~2である。Rs1が全て炭化水素基である場合、3つのRs1の合計の炭素数は、9以下であることが好ましく、より好ましくは6以下、さらに好ましくは4以下である。
 Rs1で表される炭化水素基としては、脂肪族炭化水素基が好ましく、アルキル基がより好ましい。該アルキル基としては、メチル基、エチル基、プロピル基、ブチル基等が挙げられる。複数のRs1は、同一でも異なっていてもよく、同一であることが好ましい。3つのRs1のうち少なくとも1つがメチル基であることが好ましく、少なくとも2つがメチル基であることがより好ましく、3つのRs1全てがメチル基であることが特に好ましい。
The hydrocarbon group represented by R s1 preferably has 1 to 4 carbon atoms, more preferably 1 to 3, and still more preferably 1 to 2. When all R s1 are hydrocarbon groups, the total carbon number of the three R s1 is preferably 9 or less, more preferably 6 or less, and even more preferably 4 or less.
The hydrocarbon group represented by R s1 is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, and a butyl group. A plurality of R s1 may be the same or different and are preferably the same. Is preferably at least one of methyl group of the three R s1, more preferably at least two of a methyl group, and particularly preferably all three R s1 is a methyl group.
 また、Rs1で表されるトリアルキルシリル基及びトリアルキルシリルオキシ基に含まれる水素原子は、フッ素原子に置換されていてもよい。フッ素原子の置換数としては、炭素原子の数をAとしたとき、1以上が好ましく、より好ましくは3以上であり、2×A+1以下が好ましい。また、アルキル基に含まれる水素原子がフッ素原子に置換される場合、置換されるアルキル基の数は、ケイ素原子1つあたり1~3となる範囲で適宜選択できる。 Moreover, the hydrogen atom contained in the trialkylsilyl group and trialkylsilyloxy group represented by R s1 may be substituted with a fluorine atom. The number of fluorine atoms substituted is preferably 1 or more, more preferably 3 or more, and preferably 2 × A + 1 or less, where A is the number of carbon atoms. When the hydrogen atom contained in the alkyl group is substituted with a fluorine atom, the number of substituted alkyl groups can be appropriately selected within a range of 1 to 3 per silicon atom.
 Rs1が全て炭化水素基(アルキル基)である基(トリアルキルシリル基)としては、具体的には、下記式で表される基等が挙げられる。式中、*は結合手を表す。 Specific examples of the group (trialkylsilyl group) in which R s1 is a hydrocarbon group (alkyl group) include groups represented by the following formulas. In the formula, * represents a bond.
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
 Rs1の少なくとも1つが、トリアルキルシリルオキシ基であってもよい。このような場合でも、トリアルキルシリル基含有分子鎖は、トリアルキルシリル基を有することとなる。前記トリアルキルシリルオキシ基としては、Rs1が全て炭化水素基(アルキル基)である基(トリアルキルシリル基)のケイ素原子に酸素原子が結合している基が挙げられる。 At least one of R s1 may be a trialkylsilyloxy group. Even in such a case, the trialkylsilyl group-containing molecular chain has a trialkylsilyl group. Examples of the trialkylsilyloxy group include a group in which an oxygen atom is bonded to a silicon atom of a group (trialkylsilyl group) in which R s1 is a hydrocarbon group (alkyl group).
 Rs1の少なくとも1つがトリアルキルシリルオキシ基である基としては、下記式で表される基が挙げられる。 Examples of the group in which at least one of R s1 is a trialkylsilyloxy group include groups represented by the following formulae.
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 トリアルキルシリル基含有分子鎖において、トリアルキルシリル基は、分子鎖の末端(自由端側)、特に分子鎖の主鎖(最長直鎖)の末端(自由端側)に結合していることが好ましい。 In a trialkylsilyl group-containing molecular chain, the trialkylsilyl group may be bonded to the end (free end side) of the molecular chain, particularly to the end (free end side) of the main chain (longest straight chain) of the molecular chain. preferable.
 トリアルキルシリル基が結合している分子鎖は、直鎖状又は分岐鎖状であることが好ましく、直鎖状であることが好ましい。前記分子鎖は、ジアルキルシロキサン鎖を含むことが好ましく、直鎖状ジアルキルシロキサン鎖を含むことが好ましい。また前記分子鎖は、2価の炭化水素基を含んでいてもよい。分子鎖の一部が2価の炭化水素基であっても、残部がジアルキルシロキサン鎖であるため、得られる皮膜の化学的・物理的耐久性が良好である。前記分子鎖は、式(s2)で表される基であることが好ましい。 The molecular chain to which the trialkylsilyl group is bonded is preferably linear or branched, and is preferably linear. The molecular chain preferably includes a dialkylsiloxane chain, and preferably includes a linear dialkylsiloxane chain. The molecular chain may contain a divalent hydrocarbon group. Even if a part of the molecular chain is a divalent hydrocarbon group, the remainder is a dialkylsiloxane chain, so that the resulting film has good chemical and physical durability. The molecular chain is preferably a group represented by the formula (s2).
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
[式(s2)中、Rs2は炭素数1~4のアルキル基を表す。Zs1は、-O-又は2価の炭化水素基を表し、該2価の炭化水素基に含まれる-CH2-は、-O-に置き換わっていてもよい。Ys1は、単結合又は-Si(Rs22-Ls1-を表す。Ls1は、2価の炭化水素基を表し、該2価の炭化水素基に含まれる-CH2-は、-O-に置き換わっていてもよい。左側の*は、中心ケイ素原子との結合手を表し、右側の*はトリアルキルシリル含有基との結合手を表す。] [In the formula (s2), R s2 represents an alkyl group having 1 to 4 carbon atoms. Z s1 represents —O— or a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—. Y s1 represents a single bond or —Si (R s2 ) 2 —L s1 —. L s1 represents a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—. * On the left side represents a bond with a central silicon atom, and * on the right side represents a bond with a trialkylsilyl-containing group. ]
 前記Rs2で表されるアルキル基の炭素数は、1~4であることが好ましく、より好ましくは1~3、さらに好ましくは1~2である。Rs2で表されるアルキル基としては、メチル基、エチル基、プロピル基、ブチル基等が挙げられ、メチル基又はエチル基が好ましく、メチル基が特に好ましい。 The number of carbon atoms of the alkyl group represented by R s2 is preferably 1 to 4, more preferably 1 to 3, and still more preferably 1 to 2. Examples of the alkyl group represented by R s2 include a methyl group, an ethyl group, a propyl group, and a butyl group. A methyl group or an ethyl group is preferable, and a methyl group is particularly preferable.
 n1は、1~100であることが好ましく、より好ましくは1~80、さらに好ましくは1~50、特に好ましくは1~30である。 N1 is preferably 1 to 100, more preferably 1 to 80, still more preferably 1 to 50, and particularly preferably 1 to 30.
 Zs1又はLs1で表される2価の炭化水素基の炭素数は、1~10であることが好ましく、より好ましくは1~6、さらに好ましくは1~4である。前記2価の炭化水素基は、鎖状であることが好ましく、鎖状である場合、直鎖状、分岐鎖状のいずれであってもよい。また、前記2価の炭化水素基は、2価の脂肪族炭化水素基であることが好ましく、アルカンジイル基であることが好ましい。2価の炭化水素基としては、メチレン基、エチレン基、プロピレン基、ブチレン基等が挙げられる。 The number of carbon atoms of the divalent hydrocarbon group represented by Z s1 or L s1 is preferably 1 to 10, more preferably 1 to 6, and further preferably 1 to 4. The divalent hydrocarbon group is preferably chain-like, and when it is chain-like, it may be either linear or branched. The divalent hydrocarbon group is preferably a divalent aliphatic hydrocarbon group, and preferably an alkanediyl group. Examples of the divalent hydrocarbon group include a methylene group, an ethylene group, a propylene group, and a butylene group.
 さらに、前記2価の炭化水素基に含まれる一部の-CH2-は-O-に置き換わっていてもよい。この場合連続する2つの-CH2-が同時に-O-に置き換わることはなく、Si原子に隣接する-CH2-が-O-に置き換わることはない。2つ以上の-CH2-が-O-に置き換わっている場合、-O-と-O-の間の炭素原子数は、2~4であることが好ましく、2~3であることがさらに好ましい。2価の炭化水素基の一部が-O-に置き換わった基としては、具体的には、(ポリ)エチレングリコール単位を有する基、(ポリ)プロピレングリコール単位を有する基等を例示することができる。 Furthermore, a part of —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—. In this case, two consecutive —CH 2 — are not simultaneously replaced with —O—, and —CH 2 — adjacent to the Si atom is not replaced with —O—. When two or more —CH 2 — are replaced by —O—, the number of carbon atoms between —O— and —O— is preferably 2 to 4, and more preferably 2 to 3 preferable. Specific examples of the group in which a part of the divalent hydrocarbon group is replaced by —O— include a group having a (poly) ethylene glycol unit, a group having a (poly) propylene glycol unit, and the like. it can.
 前記式(s2)において、Zs1が-O-であり、Ys1が単結合であること、すなわち前記分子鎖は、ジアルキルシリルオキシ基の繰り返しのみからなることが好ましい。ジアルキルシロキサン鎖がジアルキルシリルオキシ基の繰り返しのみからなる場合、得られる皮膜の化学的・物理的耐久性が良好である。 In the formula (s2), it is preferable that Z s1 is —O— and Y s1 is a single bond, that is, the molecular chain is composed only of repeating dialkylsilyloxy groups. When the dialkylsiloxane chain consists only of repeating dialkylsilyloxy groups, the resulting film has good chemical and physical durability.
 トリアルキルシリル基含有分子鎖に含まれる分子鎖としては、下記式で表される分子鎖を挙げることができる。式中、p1は1~30の整数を表し、*は、ポリシロキサン骨格を形成するケイ素原子又はトリアルキルシリル基に結合する結合手を表すものとする。 Examples of the molecular chain contained in the trialkylsilyl group-containing molecular chain include a molecular chain represented by the following formula. In the formula, p1 represents an integer of 1 to 30, and * represents a bond bonded to a silicon atom or a trialkylsilyl group forming a polysiloxane skeleton.
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 また、トリアルキルシリル基含有分子鎖を構成する原子の合計数は、24以上であることが好ましく、より好ましくは40以上、さらに好ましくは50以上であり、1200以下であることが好ましく、より好ましくは700以下、さらに好ましく250以下である。 The total number of atoms constituting the trialkylsilyl group-containing molecular chain is preferably 24 or more, more preferably 40 or more, still more preferably 50 or more, and preferably 1200 or less. Is 700 or less, more preferably 250 or less.
 トリアルキルシリル基含有分子鎖は、下記式(s1)で表される基であることが好ましい。 The trialkylsilyl group-containing molecular chain is preferably a group represented by the following formula (s1).
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
[式(s1)中、Rs1、Rs2、Zs1、Ys1、n1は、上記と同義である。*は、ケイ素原子との結合手を表す。] [In the formula (s1), R s1 , R s2 , Z s1 , Y s1 , and n1 are as defined above. * Represents a bond with a silicon atom. ]
 トリアルキルシリル基含有分子鎖は、下記式(s1-1)で表される基であることがより好ましく、下記式(s1-1-1)で表される基であることがさらに好ましい。 The trialkylsilyl group-containing molecular chain is more preferably a group represented by the following formula (s1-1), and even more preferably a group represented by the following formula (s1-1-1).
Figure JPOXMLDOC01-appb-C000017

[式(s1-1)及び(s1-1-1)中、Rs2、Zs1、Ys1、n1は上記と同義である。Rs3は、炭素数1~4のアルキル基を表す。*はケイ素原子との結合手を表す。]
Figure JPOXMLDOC01-appb-C000017

[In the formulas (s1-1) and (s1-1-1), R s2 , Z s1 , Y s1 , and n1 are as defined above. R s3 represents an alkyl group having 1 to 4 carbon atoms. * Represents a bond with a silicon atom. ]
 また、トリアルキルシリル基含有分子鎖は、下記式(s1-2)で表される基であることも好ましく、下記式(s1-2-1)で表される基であることがさらに好ましい。 In addition, the trialkylsilyl group-containing molecular chain is preferably a group represented by the following formula (s1-2), more preferably a group represented by the following formula (s1-2-1).
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
[式(s1-2)及び式(s1-2-1)中、Rs2、Rs3、Zs1、Ys1、n1は上記と同義である。*は、ケイ素原子との結合手を表す。] [In the formulas (s1-2) and (s1-2-1), R s2 , R s3 , Z s1 , Y s1 , and n1 are as defined above. * Represents a bond with a silicon atom. ]
 Rs3で表されるアルキル基としては、Rs1で表される炭化水素基として例示したアルキル基と同様の基が挙げられ、該アルキル基の炭素数は1~3であることが好ましく、より好ましくは1~2である。また、*-Si(Rs33に含まれるRs3の合計の炭素数は、9以下であることが好ましく、より好ましくは6以下、さらに好ましくは4以下である。さらに、*-Si(Rs33に含まれるRs3のうち、少なくとも1つがメチル基であることが好ましく、2つ以上のRs3がメチル基であることが好ましく、3つのRs3全てがメチル基であることが特に好ましい。 Examples of the alkyl group represented by R s3 include the same groups as the alkyl groups exemplified as the hydrocarbon group represented by R s1 , and the alkyl group preferably has 1 to 3 carbon atoms. Preferably it is 1-2. Further, the total carbon number of R s3 contained in * -Si (R s3 ) 3 is preferably 9 or less, more preferably 6 or less, and still more preferably 4 or less. Further, among R s3 contained in * -Si (R s3 ) 3 , at least one is preferably a methyl group, two or more R s3 are preferably methyl groups, and all three R s3 are all A methyl group is particularly preferred.
 トリアルキルシリル基含有分子鎖としては式(s1-I)で表される基が挙げられる。 Examples of the trialkylsilyl group-containing molecular chain include a group represented by the formula (s1-I).
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-T000020
Figure JPOXMLDOC01-appb-T000020




Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000021
 有機ケイ素化合物(A2)において、中心ケイ素原子に結合するトリアルキルシリル基含有分子鎖の個数は、1~3であることが好ましく、より好ましくは1~2であり、特に好ましくは1である。 In the organosilicon compound (A2), the number of molecular chains containing a trialkylsilyl group bonded to the central silicon atom is preferably 1 to 3, more preferably 1 to 2, and particularly preferably 1.
 前記加水分解性基は、ケイ素原子に結合している場合、加水分解によりヒドロキシ基(シラノール基)を与える基であればよく、例えば、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基等の炭素数1~4のアルコキシ基;ヒドロキシ基;アセトキシ基;塩素原子;イソシアネート基;等を好ましく挙げることができる。中でも、炭素数1~4のアルコキシ基が好ましく、炭素数1~2のアルコキシ基がより好ましい。
 有機ケイ素化合物(A2)において、中心ケイ素原子に結合する加水分解性基の個数は、1~3であり、2~3であることが好ましい。
 以下、加水分解性基がケイ素原子に結合している基を加水分解性ケイ素基という場合がある。
When the hydrolyzable group is bonded to a silicon atom, the hydrolyzable group may be a group that gives a hydroxy group (silanol group) by hydrolysis. For example, the number of carbon atoms such as a methoxy group, an ethoxy group, a propoxy group, and a butoxy group Preferred examples include 1-4 alkoxy groups; hydroxy groups; acetoxy groups; chlorine atoms; isocyanate groups. Among these, an alkoxy group having 1 to 4 carbon atoms is preferable, and an alkoxy group having 1 to 2 carbon atoms is more preferable.
In the organosilicon compound (A2), the number of hydrolyzable groups bonded to the central silicon atom is 1 to 3, and preferably 2 to 3.
Hereinafter, a group in which a hydrolyzable group is bonded to a silicon atom may be referred to as a hydrolyzable silicon group.
 前記シロキサン骨格含有基は、シロキサン単位(Si-O-)を含有する1価の基であり、トリアルキルシリル基含有分子鎖を構成する元素数よりも少ない数の元素で構成されるものであればよい。これにより、シロキサン骨格含有基は、トリアルキルシリル基含有分子鎖よりも長さが短いか、立体的な広がり(かさ高さ)が小さな基となる。シロキサン骨格含有基には、2価の炭化水素基が含まれていてもよい。 The siloxane skeleton-containing group is a monovalent group containing a siloxane unit (Si—O—), and may be composed of a smaller number of elements than the number of elements constituting the trialkylsilyl group-containing molecular chain. That's fine. As a result, the siloxane skeleton-containing group is a group having a shorter length than the trialkylsilyl group-containing molecular chain or a small steric spread (bulk height). The siloxane skeleton-containing group may contain a divalent hydrocarbon group.
 シロキサン骨格含有基は、下記式(s2)で表される基であることが好ましい。 The siloxane skeleton-containing group is preferably a group represented by the following formula (s2).
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
[式(s2)中、Rs2は上記と同義である。Rs5は、炭化水素基又はヒドロキシ基を表し、該炭化水素基に含まれる-CH2-は、-O-に置き換わっていてもよく、該炭化水素基に含まれる水素原子は、フッ素原子に置換されていてもよい。Zs2は、-O-又は2価の炭化水素基を表し、該2価の炭化水素基に含まれる-CH2-は、-O-に置き換わっていてもよい。Ys2は、単結合又は-Si(Rs22-Ls2-を表す。Ls2は、2価の炭化水素基を表し、該2価の炭化水素基に含まれる-CH2-は、-O-に置き換わっていてもよい。n2は、0~5の整数を表す。*は、ケイ素原子との結合手を表す。] [In formula (s2), R s2 has the same meaning as described above. R s5 represents a hydrocarbon group or a hydroxy group, —CH 2 — contained in the hydrocarbon group may be replaced by —O—, and the hydrogen atom contained in the hydrocarbon group is a fluorine atom. May be substituted. Z s2 represents —O— or a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced with —O—. Y s2 represents a single bond or —Si (R s2 ) 2 —L s2 —. L s2 represents a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—. n2 represents an integer of 0 to 5. * Represents a bond with a silicon atom. ]
 Rs5で表される炭化水素基としては、Rs1で表される炭化水素基と同様の基が挙げられ、脂肪族炭化水素基が好ましく、アルキル基がより好ましい。炭素数は1~4であることが好ましく、より好ましくは1~3、さらに好ましくは1~2である。
 Zs2又はLs2で表される2価の炭化水素基としては、Zs1で表される2価の炭化水素基と同様の基が挙げられ、炭素数は、1~10であることが好ましく、より好ましくは1~6、さらに好ましくは1~4である。また、Zs2又はLs2で表される2価の炭化水素基は、2価の脂肪族炭化水素基であることが好ましく、直鎖状又は分岐鎖状のアルカンジイル基であることがさらに好ましい。
Examples of the hydrocarbon group represented by R s5 include the same groups as the hydrocarbon group represented by R s1 , an aliphatic hydrocarbon group is preferable, and an alkyl group is more preferable. The number of carbon atoms is preferably 1 to 4, more preferably 1 to 3, and still more preferably 1 to 2.
Examples of the divalent hydrocarbon group represented by Z s2 or L s2 include the same groups as the divalent hydrocarbon group represented by Z s1 , and the number of carbon atoms is preferably 1 to 10. More preferably, it is 1-6, and more preferably 1-4. The divalent hydrocarbon group represented by Z s2 or L s2 is preferably a divalent aliphatic hydrocarbon group, and more preferably a linear or branched alkanediyl group. .
 n2は、1~5であることが好ましく、より好ましくは1~3である。 N2 is preferably 1 to 5, and more preferably 1 to 3.
 シロキサン骨格含有基の原子数の合計は、100以下であることが好ましく、より好ましくは50以下、さらに好ましくは30以下であり、10以上であることが好ましい。また、トリアルキルシリル基含有分子鎖とシロキサン骨格含有基の原子数の差は、10以上であることが好ましく、より好ましくは20以上であり、1000以下であることが好ましく、より好ましくは500以下、さらに好ましくは200以下である。 The total number of atoms of the siloxane skeleton-containing group is preferably 100 or less, more preferably 50 or less, still more preferably 30 or less, and preferably 10 or more. The difference in the number of atoms between the trialkylsilyl group-containing molecular chain and the siloxane skeleton-containing group is preferably 10 or more, more preferably 20 or more, and preferably 1000 or less, more preferably 500 or less. More preferably, it is 200 or less.
 シロキサン骨格含有基としては、具体的には、下記式で表される基が挙げられる。 Specific examples of the siloxane skeleton-containing group include groups represented by the following formulas.
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
 前記炭化水素鎖含有基は、炭化水素鎖を含む1価の基であり、トリアルキルシリル基含有分子鎖の分子鎖を構成する原子数よりも炭化水素鎖部分の炭素数が少ないものであればよい。また、トリアルキルシリル基含有分子鎖の最長直鎖を構成する原子数よりも、炭化水素鎖の最長直鎖の炭素数が少ないものであることが好ましい。
 炭化水素鎖含有基は、炭化水素基(炭化水素鎖)のみから構成されていてもよく、炭化水素鎖に含まれる-CH2-は-O-に置き換わっていてもよく、炭化水素基(炭化水素鎖)のみから構成されていることが好ましい。ただしケイ素原子に隣接する-CH2-は-O-に置き換わることはなく、また連続する2つの-CH2-が同時に-O-に置き換わることもない。
 なお、炭化水素鎖部分の炭素数とは、酸素非置換型の炭化水素鎖含有基では炭化水素基(炭化水素鎖)を構成する炭素原子の数を意味し、酸素置換型の炭化水素鎖含有基では、-O-を-CH2-と読み替えて数えた炭素原子の数を意味するものとする。以下、特に断りがない限り、酸素非置換型の炭化水素鎖含有基(すなわち1価の炭化水素基)を例にとって炭化水素鎖含有基について説明するが、いずれの説明でも、その-CH2-のうち一部を-O-に置き換えることが可能である。
The hydrocarbon chain-containing group is a monovalent group including a hydrocarbon chain and has a hydrocarbon chain portion having a smaller number of carbon atoms than the number of atoms constituting the molecular chain of the trialkylsilyl group-containing molecular chain. Good. Moreover, it is preferable that the number of carbon atoms of the longest straight chain of the hydrocarbon chain is smaller than the number of atoms constituting the longest straight chain of the trialkylsilyl group-containing molecular chain.
The hydrocarbon chain-containing group may be composed only of a hydrocarbon group (hydrocarbon chain), and —CH 2 — contained in the hydrocarbon chain may be replaced by —O—, It is preferably composed of only hydrogen chains. However, —CH 2 — adjacent to the silicon atom is not replaced with —O—, and two consecutive —CH 2 — are not replaced with —O— at the same time.
In addition, the carbon number of the hydrocarbon chain portion means the number of carbon atoms constituting the hydrocarbon group (hydrocarbon chain) in the oxygen non-substituted hydrocarbon chain-containing group, and includes the oxygen-substituted hydrocarbon chain. In the group, it means the number of carbon atoms counted by replacing —O— with —CH 2 —. Hereinafter, unless otherwise specified, a hydrocarbon chain-containing group will be described by taking an oxygen-nonsubstituted hydrocarbon chain-containing group (that is, a monovalent hydrocarbon group) as an example. In any description, —CH 2 — It is possible to replace some of them with —O—.
 前記炭化水素鎖含有基の炭素数は1~3であることが好ましく、より好ましくは1である。また、前記炭化水素鎖含有基(炭化水素基の場合)は、分岐鎖状であっても直鎖状であってもよい。前記炭化水素鎖含有基(炭化水素基の場合)は、飽和又は不飽和の脂肪族炭化水素鎖含有基であることが好ましく、飽和脂肪族炭化水素鎖含有基であることがより好ましい。前記飽和脂肪族炭化水素鎖含有基としては、メチル基、エチル基、プロピル基等のアルキル基が好ましい。 The number of carbon atoms of the hydrocarbon chain-containing group is preferably 1 to 3, more preferably 1. The hydrocarbon chain-containing group (in the case of a hydrocarbon group) may be branched or linear. The hydrocarbon chain-containing group (in the case of a hydrocarbon group) is preferably a saturated or unsaturated aliphatic hydrocarbon chain-containing group, and more preferably a saturated aliphatic hydrocarbon chain-containing group. The saturated aliphatic hydrocarbon chain-containing group is preferably an alkyl group such as a methyl group, an ethyl group, or a propyl group.
 炭化水素鎖に含まれる-CH2-が-O-に置き換わる場合、(ポリ)エチレングリコール単位を有する基等を例示することができる。 When —CH 2 — contained in the hydrocarbon chain is replaced by —O—, a group having a (poly) ethylene glycol unit can be exemplified.
 中でも、有機ケイ素化合物(A2)は、下記式(I-1)で表される化合物であることが好ましく、式(I-1-1)で表される化合物であることがより好ましい。 Among these, the organosilicon compound (A2) is preferably a compound represented by the following formula (I-1), and more preferably a compound represented by the formula (I-1-1).
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
[式(I-1)及び(I-1-1)中、Aa2、Za2、Zs1、Ys1、Rs2、Rs3、n1は、それぞれ上記と同義である。] [In formulas (I-1) and (I-1-1), A a2 , Z a2 , Z s1 , Y s1 , R s2 , R s3 , and n1 are as defined above. ]
 また有機ケイ素化合物(A2)は、式(I-2)で表される化合物であってもよく、好ましくは式(I-2-1)で表される化合物であってもよい。 The organosilicon compound (A2) may be a compound represented by the formula (I-2), preferably a compound represented by the formula (I-2-1).
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
[式(I-2)及び式(I-2-1)中、Aa2、Za2、Zs1、Ys1、Rs2、Rs3、n1は、それぞれ上記と同義である。] [In the formulas (I-2) and (I-2-1), A a2 , Z a2 , Z s1 , Y s1 , R s2 , R s3 , and n1 are as defined above. ]
 有機ケイ素化合物(A2)としては、具体的には、式(I-I)で表される基が挙げられる。 Specific examples of the organosilicon compound (A2) include a group represented by the formula (II).
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000030
 有機ケイ素化合物(A2)の合成方法の例としては、次のような方法があげられる。第一の方法としては、トリアルキルシリル基含有分子鎖とハロゲン原子(好ましくは塩素原子)とが結合した化合物と、ケイ素原子に加水分解性基が3つ以上(特に4つ)結合した化合物とを反応させることにより、製造することができる。
 第二の合成方法としては、ジアルキルシロキサン鎖の両末端にハロゲン原子が結合した化合物(以下、「ジハロゲン化ジアルキルシロキサン」)と、トリス(トリアルキルシリルオキシ)シリル基と、M1O-基(M1は、アルカリ金属を表す。)が結合した化合物(以下、「アルカリ金属シリルオキシド」)及びケイ素原子に加水分解性基が4つ結合した化合物を反応させることにより製造することができる。これらの化合物の反応順序は限定されないが、まずジハロゲン化ジアルキルシロキサンとアルカリ金属シリルオキシドを反応させ、次いで、ケイ素原子に加水分解性基が4つ結合した化合物を反応させることが好ましい。
 前記ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられ、塩素原子が好ましい。また、前記アルカリ金属としては、リチウムが好ましい。
 アルカリ金属シリルオキシドは、例えば、トリス(トリアルキルシリルオキシ)シリル基とヒドロキシ基が結合した化合物に、アルキルアルカリ金属を反応させることにより製造することができる。有機アルカリ金属化合物としては、n-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム等のアルキルリチウムが挙げられ、特に好ましくはn-ブチルリチウムである。
Examples of the synthesis method of the organosilicon compound (A2) include the following methods. As a first method, a compound in which a trialkylsilyl group-containing molecular chain and a halogen atom (preferably a chlorine atom) are bonded, and a compound in which three or more (especially four) hydrolyzable groups are bonded to a silicon atom, It can manufacture by making this react.
As a second synthesis method, a compound in which halogen atoms are bonded to both ends of a dialkylsiloxane chain (hereinafter, “dihalogenated dialkylsiloxane”), a tris (trialkylsilyloxy) silyl group, an M 1 O— group ( M 1 represents an alkali metal) and can be produced by reacting a compound (hereinafter referred to as “alkali metal silyl oxide”) and a compound having four hydrolyzable groups bonded to a silicon atom. Although the reaction order of these compounds is not limited, it is preferable to first react a dihalogenated dialkylsiloxane and an alkali metal silyl oxide, and then react a compound having four hydrolyzable groups bonded to a silicon atom.
As said halogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned, A chlorine atom is preferable. The alkali metal is preferably lithium.
The alkali metal silyl oxide can be produced, for example, by reacting an alkyl alkali metal with a compound in which a tris (trialkylsilyloxy) silyl group and a hydroxy group are bonded. Examples of the organic alkali metal compound include alkyllithiums such as n-butyllithium, sec-butyllithium and tert-butyllithium, with n-butyllithium being particularly preferred.
 また第三の合成方法としては、有機ケイ素化合物(A2)は、例えば、アルカリ金属シリルオキシド及び環状ジメチルシロキサンを反応させ、次いで、ケイ素原子に加水分解性基が3つとハロゲン原子(特に、塩素原子)が1つ結合している化合物を反応させることにより製造することもできる。環状ジメチルシロキサンに含まれるケイ素原子の数は、例えば、2以上、10以下であることが好ましく、より好ましくは2以上、5以下、さらに好ましくは2以上、4以下である。 As a third synthesis method, for example, the organosilicon compound (A2) is prepared by reacting, for example, alkali metal silyl oxide and cyclic dimethylsiloxane, and then the silicon atom has three hydrolyzable groups and a halogen atom (particularly a chlorine atom). It can also be produced by reacting a compound in which one) is bonded. The number of silicon atoms contained in the cyclic dimethylsiloxane is, for example, preferably 2 or more and 10 or less, more preferably 2 or more and 5 or less, and further preferably 2 or more and 4 or less.
 また、第四の合成法としては、有機ケイ素化合物(A2)は、例えば、アルカリ金属シリルオキシド及び環状ジメチルシロキサンを反応させて、得られる水酸基末端ジメチルシロキサン化合物に、テトラアルコキシシランを反応させることにより、製造することもできる。 Further, as a fourth synthesis method, the organosilicon compound (A2) can be prepared by, for example, reacting an alkali metal silyl oxide and a cyclic dimethylsiloxane and reacting the resulting hydroxyl-terminated dimethylsiloxane compound with a tetraalkoxysilane. Can also be manufactured.
 有機ケイ素化合物(A1)又は(A2)とともに組成物に含まれる前記金属化合物(B)は、少なくとも1つの加水分解性基が中心金属原子に結合しているものであり、前記第2の炭化水素鎖含有基が前記金属原子に結合していてもよい。前記第2の炭化水素鎖含有基の最長鎖長は、有機ケイ素化合物(A1)の中心ケイ素原子に結合する炭素数が6~20のアルキル基の最長鎖長よりも短く、また有機ケイ素化合物(A2)の中心ケイ素原子に結合するトリアルキルシリル基含有分子鎖よりも短いため、金属化合物(B)の最長鎖長は有機ケイ素化合物の最長鎖長よりも短くなる。このため、金属化合物(B)から導かれる構造は、有機ケイ素化合物(A1)又は(A2)から導かれる構造よりも嵩高くなく、組成物に金属化合物(B)を含むことにより、得られる皮膜においてスペーサー機能を有する部位を形成することが可能となる。 The metal compound (B) contained in the composition together with the organosilicon compound (A1) or (A2) is one in which at least one hydrolyzable group is bonded to a central metal atom, and the second hydrocarbon A chain-containing group may be bonded to the metal atom. The longest chain length of the second hydrocarbon chain-containing group is shorter than the longest chain length of the alkyl group having 6 to 20 carbon atoms bonded to the central silicon atom of the organosilicon compound (A1). Since it is shorter than the trialkylsilyl group-containing molecular chain bonded to the central silicon atom of A2), the longest chain length of the metal compound (B) is shorter than the longest chain length of the organosilicon compound. Therefore, the structure derived from the metal compound (B) is less bulky than the structure derived from the organosilicon compound (A1) or (A2), and the film obtained by including the metal compound (B) in the composition It is possible to form a part having a spacer function in.
 金属化合物(B)の中心金属原子は、アルコキシ基と結合して金属アルコキシドを形成しうる金属原子であればよく、この場合の金属には、Si、Ge等の半金属も含まれる。金属化合物(B)の中心金属原子としては、具体的には、Al、Fe、In等の3価金属;Ge、Hf、Si、Ti、Sn、Zr等の4価金属;Ta等の5価金属;等が挙げられ、好ましくはAl等の3価金属;Si、Ti、Zr、Sn等の4価金属;であり、より好ましくはAl、Si、Ti、Zrであり、さらに好ましくはSiである。 The central metal atom of the metal compound (B) may be any metal atom that can be bonded to an alkoxy group to form a metal alkoxide. In this case, the metal includes a semimetal such as Si or Ge. Specific examples of the central metal atom of the metal compound (B) include trivalent metals such as Al, Fe, and In; tetravalent metals such as Ge, Hf, Si, Ti, Sn, and Zr; pentavalent metals such as Ta. And the like, preferably trivalent metals such as Al; tetravalent metals such as Si, Ti, Zr and Sn; more preferably Al, Si, Ti and Zr, still more preferably Si. is there.
 金属化合物(B)の加水分解性基としては、有機ケイ素化合物(A1)又は(A2)の加水分解性基と同様のものが挙げられ、炭素数1~4のアルコキシ基が好ましく、炭素数1~2のアルコキシ基がより好ましい。また、有機ケイ素化合物(A1)と金属化合物(B)の加水分解性基は、同一でも異なっていてもよい。また、有機ケイ素化合物(A1)と金属化合物(B)の加水分解性基は、いずれも炭素数1~4のアルコキシ基であることが好ましい。金属化合物(B)において、加水分解性基の個数は1以上であることが好ましく、より好ましくは2以上、さらに好ましくは3以上であり、4以下であることが好ましい。 Examples of the hydrolyzable group of the metal compound (B) include the same hydrolyzable groups as those of the organosilicon compound (A1) or (A2), preferably an alkoxy group having 1 to 4 carbon atoms, An alkoxy group of ˜2 is more preferred. Further, the hydrolyzable groups of the organosilicon compound (A1) and the metal compound (B) may be the same or different. Further, the hydrolyzable groups of the organosilicon compound (A1) and the metal compound (B) are preferably alkoxy groups having 1 to 4 carbon atoms. In the metal compound (B), the number of hydrolyzable groups is preferably 1 or more, more preferably 2 or more, still more preferably 3 or more, and preferably 4 or less.
 金属化合物(B)の第2の炭化水素鎖含有基としては、上記説明した範囲から適宜選択でき、その個数は、1以下であることが好ましく、0であることが特に好ましい。 The second hydrocarbon chain-containing group of the metal compound (B) can be appropriately selected from the range described above, and the number thereof is preferably 1 or less, and particularly preferably 0.
 金属化合物(B)は、具体的には、下記式(BI)で表される化合物であることが好ましい。 Specifically, the metal compound (B) is preferably a compound represented by the following formula (BI).
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031
[前記式(BI)中、Rb1は、第2の炭化水素鎖含有基または加水分解性基を表す。Ab1は、それぞれ独立に、加水分解性基を表す。Mは、Al、Fe、In、Ge、Hf、Si、Ti、Sn、Zr、または、Taを表す。mは、金属原子に応じて、1~4の整数を表す。] [In the formula (BI), R b1 represents a second hydrocarbon chain-containing group or a hydrolyzable group. A b1 independently represents a hydrolyzable group. M represents Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta. m represents an integer of 1 to 4 depending on the metal atom. ]
 式(BI)中、Rb1の第2の炭化水素鎖含有基、Rb1、Ab1の加水分解性基は、それぞれ、第2の炭化水素鎖含有基、加水分解性基として上記説明した範囲から適宜選択できる。 Wherein (BI), the range the second hydrocarbon chains containing group, R b1, hydrolysable groups A b1 of R b1 are respectively, the above-described second hydrocarbon chains containing group, a hydrolyzable group Can be selected as appropriate.
 式(BI)中、Rb1は、加水分解性基であることが好ましい。また、Rb1が加水分解性基の場合、Rb1とAb1とは同一であっても異なっていてもよく、同一であることが好ましい。さらに、有機ケイ素化合物(A1)と、金属化合物(B)の加水分解性基は同一であっても異なっていてもよい。 In formula (BI), R b1 is preferably a hydrolyzable group. When R b1 is a hydrolyzable group, R b1 and A b1 may be the same or different and are preferably the same. Furthermore, the hydrolyzable groups of the organosilicon compound (A1) and the metal compound (B) may be the same or different.
 式(BI)中、Mとしては、Al、Si、Ti、Zr、Snが好ましく、Al、Si、Ti、Zrがより好ましく、Siがさらに好ましい。これら金属原子のアルコキシドは、液状化が容易であり、皮膜中、スペーサーとして機能しうる下記構造(b)の分布の均一性を高めることが容易である。また、式(BI)において、mは、MがAl、Fe、In等の3価金属の場合は2を表し、MがGe、Hf、Si、Ti、Sn、Zr等の4価金属の場合は3を表し、MがTa等の5価金属の場合は4を表す。 In the formula (BI), M is preferably Al, Si, Ti, Zr, or Sn, more preferably Al, Si, Ti, or Zr, and even more preferably Si. These alkoxides of metal atoms can be easily liquefied, and it is easy to improve the uniformity of the distribution of the following structure (b) that can function as a spacer in the film. In Formula (BI), m represents 2 when M is a trivalent metal such as Al, Fe, or In, and M is a tetravalent metal such as Ge, Hf, Si, Ti, Sn, or Zr. Represents 3, and 4 represents 4 when M is a pentavalent metal such as Ta.
 金属化合物(B)としては、加水分解性基のみを有する化合物;1つの第2の炭化水素鎖含有基と2つの加水分解性基を有する化合物;等を好ましく挙げることができる。 Preferred examples of the metal compound (B) include a compound having only a hydrolyzable group; a compound having one second hydrocarbon chain-containing group and two hydrolyzable groups;
 加水分解性基のみを有する化合物としては、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシラン、テトラブトキシシラン等のテトラアルコキシシラン;トリエトキシアルミニウム、トリプロポキシアルミニウム、トリブトキシアルミニウム等のトリアルコキシアルミニウム;トリエトキシ鉄等のトリアルコキシ鉄;トリメトキシインジウム、トリエトキシインジウム、トリプロポキシインジウム、トリブトキシインジウム等のトリアルコキシインジウム;テトラメトキシゲルマニウム、テトラエトキシゲルマニウム、テトラプロポキシゲルマニウム、テトラブトキシゲルマニウム等のテトラアルコキシゲルマニウム;テトラメトキシハフニウム、テトラエトキシハフニウム、テトラプロポキシハフニウム、テトラブトキシハフニウム等のテトラアルコキシハフニウム;テトラメトキシチタン、テトラエトキシチタン、テトラプロポキシチタン、テトラブトキシチタン等のテトラアルコキシチタン;テトラメトキシスズ、テトラエトキシスズ、テトラプロポキシスズ、テトラブトキシスズ等のテトラアルコキシスズ;テトラメトキシジルコニウム、テトラエトキシジルコニウム、テトラプロポキシジルコニウム、テトラブトキシジルコニウム等のテトラアルコキシジルコニウム;ペンタメトキシタンタル、ペンタエトキシタンタル、ペンタプロポキシタンタル、ペンタブトキシタンタル等のペンタアルコキシタンタル;等が挙げられる。 Examples of the compound having only a hydrolyzable group include tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, and tetrabutoxysilane; trialkoxyaluminums such as triethoxyaluminum, tripropoxyaluminum, and tributoxyaluminum; triethoxy Trialkoxy iron such as iron; trialkoxy indium such as trimethoxy indium, triethoxy indium, tripropoxy indium and tributoxy indium; tetraalkoxy germanium such as tetramethoxy germanium, tetraethoxy germanium, tetrapropoxy germanium and tetrabutoxy germanium; tetra Methoxy hafnium, tetraethoxy hafnium, tetrapropoxy hafnium, tetrabut Tetraalkoxy hafnium such as Sihafnium; Tetraalkoxy titanium such as tetramethoxy titanium, tetraethoxy titanium, tetrapropoxy titanium, and tetrabutoxy titanium; Tetraalkoxy tin such as tetramethoxy tin, tetraethoxy tin, tetrapropoxy tin, and tetrabutoxy tin; Tetra Tetraalkoxyzirconium such as methoxyzirconium, tetraethoxyzirconium, tetrapropoxyzirconium and tetrabutoxyzirconium; pentaalkoxytantalum such as pentamethoxytantalum, pentaethoxytantalum, pentapropoxytantalum and pentabutoxytantalum;
 第2の炭化水素鎖含有基と加水分解性基を有する化合物としては、メチルトリメトキシシラン、エチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリエトキシシラン、メチルトリプロポキシシラン等のアルキルトリアルコキシシラン;ビニルトリメトキシシラン、ビニルトリエトキシシラン等のアルケニルトリアルコキシシラン;等が挙げられる。 Examples of the compound having a second hydrocarbon chain-containing group and a hydrolyzable group include alkyltrialkoxysilanes such as methyltrimethoxysilane, ethyltrimethoxysilane, methyltriethoxysilane, ethyltriethoxysilane, and methyltripropoxysilane; And alkenyltrialkoxysilanes such as vinyltrimethoxysilane and vinyltriethoxysilane.
 本発明の組成物の好ましい態様では、上記有機ケイ素化合物(A1)又は(A2)と金属化合物(B)とを特定の割合で含むため、撥水・撥油機能が高められると同時に、耐摩耗性にも優れた皮膜を提供することが可能となる。具体的には、本発明の組成物において、前記金属化合物(B)と有機ケイ素化合物(A1又はA2)のモル比(金属化合物(B)/有機ケイ素化合物(A1又はA2))は、2以上(より好ましくは15以上)、48以下が好ましく、44以下であることがより好ましく、更に好ましくは40以下、特に好ましくは36以下である。 In a preferred embodiment of the composition of the present invention, since the organosilicon compound (A1) or (A2) and the metal compound (B) are contained in a specific ratio, the water and oil repellency functions are improved and the wear resistance is improved. It is possible to provide a film having excellent properties. Specifically, in the composition of the present invention, the molar ratio of the metal compound (B) to the organosilicon compound (A1 or A2) (metal compound (B) / organosilicon compound (A1 or A2)) is 2 or more. (More preferably 15 or more), preferably 48 or less, more preferably 44 or less, still more preferably 40 or less, and particularly preferably 36 or less.
 本発明の組成物は、上記有機ケイ素化合物(A1)又は(A2)、金属化合物(B)に加えて、さらに高沸点溶媒(C)を含んでいる。組成物を手塗りで塗布する際に、高沸点溶媒(C)が揮発することなく基材上に残ることにより、有機ケイ素化合物(A1)又は(A2)と金属化合物(B)を基材上にムラなく行き渡らせることが可能となり、良好な撥水撥油性、耐摩耗性を有し、表面性状も良好な皮膜を実現できる。 The composition of the present invention further contains a high boiling point solvent (C) in addition to the organosilicon compound (A1) or (A2) and the metal compound (B). When the composition is applied by hand, the high boiling point solvent (C) remains on the substrate without volatilization, so that the organosilicon compound (A1) or (A2) and the metal compound (B) are on the substrate. It is possible to achieve a film with good water and oil repellency and wear resistance and good surface properties.
 本発明において、高沸点溶媒(C)とは、20℃での蒸気圧が1000Pa以下であること及び沸点が120℃以上であることの少なくともいずれかを満たすことを意味するものとする。本発明では、高沸点溶媒(C)と共に、後記する低沸点溶媒(D)を用いるため、低沸点溶媒(D)との相溶性を考慮して、溶解度パラメータが所定範囲にある高沸点溶媒(C)を用いることが必要である。本明細書において、溶解度パラメータ(SP値、Solubility Parameter)とは「R.F.Fedors、Polym.Eng.Sci.,14[2]、147-154(1974)」に記載の方法によって算出される値である。本発明では、高沸点溶媒(C)として、SP値[(cal/cm31/2]が8.0以上であるものを使用する。高沸点溶媒(C)のSP値[(cal/cm31/2]は、13.0以下のものを用いることが好ましい。このような要件を満たす溶媒として、1-ブタノールやエチレングリコールモノヘキシルエーテルがあげられる。 In the present invention, the high boiling point solvent (C) means that the vapor pressure at 20 ° C. is 1000 Pa or less and the boiling point is 120 ° C. or more. In the present invention, since the low-boiling solvent (D) described later is used together with the high-boiling solvent (C), a high-boiling solvent having a solubility parameter within a predetermined range in consideration of compatibility with the low-boiling solvent (D) ( C) must be used. In the present specification, the solubility parameter (SP value, solubility parameter) is calculated by the method described in “RF Fedors, Polym. Eng. Sci., 14 [2], 147-154 (1974)”. Value. In the present invention, a high boiling point solvent (C) having an SP value [(cal / cm 3 ) 1/2 ] of 8.0 or more is used. The SP value [(cal / cm 3 ) 1/2 ] of the high boiling point solvent (C) is preferably 13.0 or less. Examples of the solvent satisfying such requirements include 1-butanol and ethylene glycol monohexyl ether.
 高沸点溶媒(C)の20℃での蒸気圧は800Pa以下が好ましく、より好ましくは600Pa以下であり、下限は特に限定されないが、例えば5Paである。また高沸点溶媒(C)の沸点は、好ましくは150℃以上であり、より好ましくは170℃以上であり、上限は特に限定されないが、例えば300℃である。 The vapor pressure of the high boiling point solvent (C) at 20 ° C. is preferably 800 Pa or less, more preferably 600 Pa or less, and the lower limit is not particularly limited, but is, for example, 5 Pa. The boiling point of the high-boiling solvent (C) is preferably 150 ° C. or higher, more preferably 170 ° C. or higher, and the upper limit is not particularly limited, but is, for example, 300 ° C.
 本発明の組成物は、上記有機ケイ素化合物(A)、金属化合物(B)と、高沸点溶媒(C)に加えて、さらに低沸点溶媒(D)を含んでいる。低沸点とは、20℃での蒸気圧が1000Pa超であり、且つ沸点が120℃未満であることを意味する。 The composition of the present invention further contains a low boiling point solvent (D) in addition to the organosilicon compound (A), metal compound (B), and high boiling point solvent (C). Low boiling point means that the vapor pressure at 20 ° C. is more than 1000 Pa and the boiling point is less than 120 ° C.
 このような低沸点溶媒(D)としては、アルコール系溶媒、ケトン系溶媒、エーテル系溶媒、脂環式炭化水素系溶媒が挙げられ、特にアルコール系溶媒、ケトン系溶媒、エーテル系溶媒が好ましい。アルコール系溶媒は、例えばメタノール、エタノール、1-プロパノール、イソプロピルアルコール、2,2,2-トリフルオロエタノール、2-ブタノール、イソブチルアルコールなどである。ケトン系溶媒は、例えばアセトン、エチルメチルケトンなどである。エーテル系溶媒としては、ジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン、1,4-ジオキサン、エチレングリコールジメチルエーテルなどが挙げられる。脂環式炭化水素系溶媒としては、ヘキサンが挙げられる。 Examples of such a low boiling point solvent (D) include alcohol solvents, ketone solvents, ether solvents, and alicyclic hydrocarbon solvents, and alcohol solvents, ketone solvents, and ether solvents are particularly preferable. Examples of the alcohol solvent include methanol, ethanol, 1-propanol, isopropyl alcohol, 2,2,2-trifluoroethanol, 2-butanol, and isobutyl alcohol. Examples of the ketone solvent include acetone and ethyl methyl ketone. Examples of the ether solvent include diethyl ether, diisopropyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether and the like. Hexane is mentioned as an alicyclic hydrocarbon type solvent.
 低沸点溶媒(D)の20℃での蒸気圧は2000Pa以上が好ましく、より好ましくは3000Pa以上であり、上限は特に限定されないが、例えば13000Paである。また高沸点溶媒(D)の沸点は、好ましくは100℃以下であり、より好ましくは85℃以下である。 The vapor pressure at 20 ° C. of the low boiling point solvent (D) is preferably 2000 Pa or more, more preferably 3000 Pa or more, and the upper limit is not particularly limited, but is, for example, 13000 Pa. The boiling point of the high boiling point solvent (D) is preferably 100 ° C. or lower, more preferably 85 ° C. or lower.
 高沸点溶媒(C)及び低沸点溶媒(D)はそれぞれ1種類を単独で使用してもよいし、2種類以上の溶媒を併用してもよい。また、本発明の組成物を作製するためには、低沸点溶媒(D)の一部を予め高沸点溶媒(C)と混合した混合液に、有機ケイ素化合物(A)と金属化合物(B)を投入して溶解させ(例えば室温で10~30分程度攪拌)、好ましくは更に触媒(E)を添加して、例えば10~30時間程度攪拌するなどして溶液を作製し、これを残りの低沸点溶媒(D)で希釈することが好ましい。低沸点溶媒(D)での希釈倍率は5~40倍程度が好ましい。もちろん、本発明の組成物は、高沸点溶媒(C)及び低沸点溶媒(D)以外の溶媒(以下、その他溶媒ということがある。)を含んでいてもよいし、含まなくてもよい。 The high boiling point solvent (C) and the low boiling point solvent (D) may be used alone or in combination of two or more solvents. In order to prepare the composition of the present invention, an organosilicon compound (A) and a metal compound (B) are mixed into a mixed liquid obtained by previously mixing a part of the low boiling point solvent (D) with the high boiling point solvent (C). To make a solution (for example, stirring at room temperature for about 10 to 30 minutes), preferably adding catalyst (E) and stirring for about 10 to 30 hours, etc. It is preferable to dilute with a low boiling point solvent (D). The dilution ratio with the low boiling point solvent (D) is preferably about 5 to 40 times. Of course, the composition of the present invention may or may not contain a solvent other than the high boiling point solvent (C) and the low boiling point solvent (D) (hereinafter sometimes referred to as other solvent).
 前記有機ケイ素化合物(A)(以下、有機ケイ素化合物(A1)と(A2)をまとめて、有機ケイ素化合物(A)と示す場合がある)は前記低沸点溶媒(D)に対して0.01~0.15質量%であることが好ましく、より好ましくは0.03~0.13質量%である。前記金属化合物(B)は前記低沸点溶媒(D)に対して0.1~1.2質量%が好ましく、より好ましくは0.15~1.0質量%である。前記高沸点溶媒(C)は前記低沸点溶媒(D)に対して0.05~1.8質量%であることが好ましく、より好ましくは0.1~1.8質量%であり、1.5質量%以下であってもよく、1.2質量%以下であってもよい。 The organosilicon compound (A) (hereinafter, the organosilicon compounds (A1) and (A2) may be collectively referred to as an organosilicon compound (A)) is 0.01% relative to the low boiling point solvent (D). The content is preferably 0.15% by mass, more preferably 0.03-0.13% by mass. The metal compound (B) is preferably 0.1 to 1.2% by mass, more preferably 0.15 to 1.0% by mass with respect to the low boiling point solvent (D). The high boiling point solvent (C) is preferably 0.05 to 1.8% by mass, more preferably 0.1 to 1.8% by mass with respect to the low boiling point solvent (D). 5 mass% or less may be sufficient, and 1.2 mass% or less may be sufficient.
 また、高沸点溶媒(C)、低沸点溶媒(D)、その他溶媒及び後記する触媒(E)の合計100質量%に対して有機ケイ素化合物(A)は0.03~0.15質量%であることが好ましく、より好ましくは0.035~0.12質量%である。また、高沸点溶媒(C)、低沸点溶媒(D)、その他溶媒及び後記する触媒(E)の合計100質量%に対して金属化合物(B)は、0.1~1.5質量%であることが好ましく、より好ましくは0.15~1.2質量%である。高沸点溶媒(C)、低沸点溶媒(D)、その他溶媒及び後記する触媒(E)の合計100質量%に対する有機ケイ素化合物(A)及び金属化合物(B)の合計割合は((A+B)/(C+D+E))、0.13~1.65質量%が好ましく、0.185~1.32質量%がより好ましく、更に好ましくは0.2~1.1質量%である。 Further, the organosilicon compound (A) is 0.03 to 0.15% by mass with respect to 100% by mass in total of the high boiling point solvent (C), the low boiling point solvent (D), the other solvent and the catalyst (E) described later. It is preferable that the content is 0.035 to 0.12% by mass. Further, the metal compound (B) is 0.1 to 1.5% by mass relative to 100% by mass in total of the high boiling point solvent (C), the low boiling point solvent (D), the other solvent and the catalyst (E) described later. It is preferably 0.15 to 1.2% by mass. The total ratio of the organosilicon compound (A) and the metal compound (B) to the total 100 mass% of the high boiling point solvent (C), the low boiling point solvent (D), the other solvent and the catalyst (E) described later is ((A + B) / (C + D + E)), preferably 0.13 to 1.65% by mass, more preferably 0.185 to 1.32% by mass, and still more preferably 0.2 to 1.1% by mass.
 さらに、本発明の組成物は、必要に応じて、触媒(E)を共存させてもよい。触媒(E)は、ゾルゲル法で一般的に用いられる、塩酸、蟻酸、酢酸等の酸触媒;塩基触媒;有機金属触媒等から任意に選ぶことができる。 Furthermore, the composition of the present invention may coexist with a catalyst (E) as necessary. The catalyst (E) can be arbitrarily selected from acid catalysts such as hydrochloric acid, formic acid and acetic acid generally used in the sol-gel method; base catalysts; organometallic catalysts and the like.
 酸触媒(特に好ましくは塩酸)は、有機ケイ素化合物(A)と金属化合物(B)の合計に対して、質量比で1倍以上であることが好ましく、より好ましくは1.3倍以上であり、8倍以下であることが好ましく、より好ましくは7倍以下、さらに好ましくは6.5倍以下である。 The acid catalyst (particularly preferably hydrochloric acid) is preferably 1 or more times, more preferably 1.3 or more times in terms of mass ratio with respect to the total of the organosilicon compound (A) and the metal compound (B). It is preferably 8 times or less, more preferably 7 times or less, and still more preferably 6.5 times or less.
 さらに、有機ケイ素化合物(A)と、金属化合物(B)を基材と接触させる際、本発明の効果を阻害しない範囲で、その他の溶剤(高沸点溶媒(C)及び低沸点溶媒(D)のいずれにも相当しない溶剤)、酸化防止剤、防錆剤、紫外線吸収剤、光安定剤、防カビ剤、抗菌剤、生物付着防止剤、消臭剤、顔料、難燃剤、帯電防止剤等の各種の添加剤を共存させてもよい。 Further, when the organosilicon compound (A) and the metal compound (B) are brought into contact with the base material, other solvents (high boiling point solvent (C) and low boiling point solvent (D) may be used as long as the effects of the present invention are not impaired. Solvents not equivalent to any of the above), antioxidants, rust inhibitors, UV absorbers, light stabilizers, fungicides, antibacterial agents, biofouling inhibitors, deodorants, pigments, flame retardants, antistatic agents, etc. These various additives may coexist.
 前記酸化防止剤としては、フェノール系酸化防止剤、硫黄系酸化防止剤、リン系酸化防止剤、ヒンダ-ドアミン系酸化防止剤等が挙げられる。 Examples of the antioxidant include phenol-based antioxidants, sulfur-based antioxidants, phosphorus-based antioxidants, hindered amine-based antioxidants, and the like.
 前記フェノール系酸化防止剤としては、n-オクタデシル-3-(4-ヒドロキシ-3,5-ジ-t-ブチルフェニル)プロピオネート、2,6-ジ-t-ブチル-4-メチルフェノール、2,2-チオ-ジエチレン-ビス-[3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート]、トリ-エチレングリコール-ビス-[3-(3-t-ブチル-5-メチル-4-ヒドロキシフェニル)プロピオネート]、3,9-ビス[2-{3-(3-t-ブチル-4-ヒドロキシ-5-メチルフェニル)プロピオニルオキシ}-1,1-ジメチルエチル]-2,4,8,10-テトラオキサスピロ[5・5]ウンデカン、テトラキス{3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)-プロピオン酸}ペンタエリスリチル エステル、2-t-ブチル-6-(3-t-ブチル-2-ヒドロキシ-5-メチルベンジル)-4-メチルフェニル アクリレート、2-[1-(2-ヒドロキシ-3,5-ジ-t-ペンチルフェニル)エチル]-4,6-ジ-t-ペンチルフェニル アクリレート、1,3,5-トリメチル-2,4,6-トリス(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)ベンゼン、トリス(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)イソシアヌレート、1,3,5-トリス(4-t-ブチル-3-ヒドロキシ-2,6-ジメチルベンジル)-1,3,5-トリアジン-2,4,6-(1H,3H,5H)-トリオン、2,2’-メチレンビス(6-t-ブチル-4-メチルフェノール)、4,4’-ブチリデンビス (6-t-ブチル-3-メチルフェノール)、4,4’-チオビス(6-t-ブチル-3-メチルフェノール)等が挙げられる。 Examples of the phenolic antioxidant include n-octadecyl-3- (4-hydroxy-3,5-di-t-butylphenyl) propionate, 2,6-di-t-butyl-4-methylphenol, 2, 2-thio-diethylene-bis- [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], tri-ethylene glycol-bis- [3- (3-t-butyl-5-methyl -4-hydroxyphenyl) propionate], 3,9-bis [2- {3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionyloxy} -1,1-dimethylethyl] -2, 4,8,10-tetraoxaspiro [5.5] undecane, tetrakis {3- (3,5-di-tert-butyl-4-hydroxyphenyl) -propionic acid} pentaeryth Cyl ester, 2-t-butyl-6- (3-t-butyl-2-hydroxy-5-methylbenzyl) -4-methylphenyl acrylate, 2- [1- (2-hydroxy-3,5-di-) t-pentylphenyl) ethyl] -4,6-di-t-pentylphenyl acrylate, 1,3,5-trimethyl-2,4,6-tris (3,5-di-t-butyl-4-hydroxybenzyl) ) Benzene, tris (3,5-di-t-butyl-4-hydroxybenzyl) isocyanurate, 1,3,5-tris (4-t-butyl-3-hydroxy-2,6-dimethylbenzyl) -1 , 3,5-triazine-2,4,6- (1H, 3H, 5H) -trione, 2,2′-methylenebis (6-tert-butyl-4-methylphenol), 4,4′-butylidenebis (6 t-butyl-3-methylphenol), 4,4'-thiobis (6-t-butyl-3-methylphenol) and the like.
 前記硫黄系酸化防止剤としては、3,3’-チオジプロピオン酸 ジ-n-ドデシルエステル、3,3’-チオジプロピオン酸 ジ-n-テトラデシルエステル、3,3’-チオジプロピオン酸 ジ-n-オクタデシルエステル、テトラキス(3-ドデシルチオプロピオン酸)ペンタエリスリトールエステル等が挙げられる。 Examples of the sulfur-based antioxidant include 3,3′-thiodipropionic acid di-n-dodecyl ester, 3,3′-thiodipropionic acid di-n-tetradecyl ester, and 3,3′-thiodipropion. Examples include acid di-n-octadecyl ester and tetrakis (3-dodecylthiopropionic acid) pentaerythritol ester.
 前記リン系酸化防止剤としては、トリス(2,4-ジ-t-ブチルフェニル)ホスファイト、ビス(2,4-ジ-t-ブチルフェニル)ペンタエリスリトール ジホスファイト、ビス(2,6-ジ-t-ブチル-4-メチルフェニル)ペンタエリスリトール ジホスファイト、ビス(2,4-ジ-クミルフェニル)ペンタエリスリトール ジホスファイト、テトラキス(2,4-ジ-t-ブチルフェニル)-4,4’-ビフェニレン ジホスフォナイト、ビス-[2,4-ジ-t-ブチル-(6-メチル)フェニル]エチル ホスファイト等が挙げられる。 Examples of the phosphorus antioxidant include tris (2,4-di-t-butylphenyl) phosphite, bis (2,4-di-t-butylphenyl) pentaerythritol diphosphite, bis (2,6-di-). t-butyl-4-methylphenyl) pentaerythritol diphosphite, bis (2,4-di-cumylphenyl) pentaerythritol diphosphite, tetrakis (2,4-di-t-butylphenyl) -4,4'-biphenylene diphosphonite, bis -[2,4-di-t-butyl- (6-methyl) phenyl] ethyl phosphite and the like.
 前記ヒンダードアミン系酸化防止剤としては、セバシン酸ビス(2,2,6,6-テトラメチル-4-ピペリジル)エステル(融点81~86℃)、2,2,6,6-テトラメチル-4-ピペリジルメタクリレート(融点58℃)、ポリ[{6-(1,1,3,3-テトラメチルブチル)アミノ-1,3,5-トリアジン-2,4-ジイル}{(2,2,6,6-テトラメチル-4-ピペリジル)イミノ}-1,6-ヘキサメチレン{(2,2,6,6-テトラメチル-4-ピペリジル)イミノ}]等が挙げられる。 Examples of the hindered amine antioxidant include sebacic acid bis (2,2,6,6-tetramethyl-4-piperidyl) ester (melting point: 81 to 86 ° C.), 2,2,6,6-tetramethyl-4- Piperidyl methacrylate (melting point: 58 ° C.), poly [{6- (1,1,3,3-tetramethylbutyl) amino-1,3,5-triazine-2,4-diyl} {(2,2,6, 6-tetramethyl-4-piperidyl) imino} -1,6-hexamethylene {(2,2,6,6-tetramethyl-4-piperidyl) imino}] and the like.
 前記防錆剤としては、トリエタノールアミン等のアルカノールアミン;第四級アンモニウム塩;アルカンチオール;イミダゾリン、イミダゾール、アルキルイミダゾリン誘導体、ベンズイミダゾール、2-メルカプトベンズイミダゾール、ベンゾトリアゾール等のアゾール類;メタバナジン酸ナトリウム;クエン酸ビスマス;フェノール誘導体;アルキルアミンやポリアルケニルアミン等の脂肪族アミン、芳香族アミン、エトキシ化アミン、シアノアルキルアミン、安息香酸シクロヘキシルアミン、アルキレンジアミン等の脂肪族ジアミン、芳香族ジアミン等のアミン化合物;前記アミン化合物とカルボン酸とのアミド;アルキルエステル;ピリミジン;ナフテン酸;スルホン酸複合体;亜硝酸カルシウム、亜硝酸ナトリウム、亜硝酸ジシクロヘキシルアミン等の亜硝酸塩;ポリアルコール、ポリフェノール等のポリオール化合物;モリブデン酸ナトリウム、タングステン酸ナトリウム、ホスホン酸ナトリウム、クロム酸ナトリウム、ケイ酸ナトリウム等のヘテロポリ酸塩;ゼラチン;カルボン酸のポリマー;ニトロ化合物;ホルムアルデヒド;アセチレンアルコール;脂肪族チオール、芳香族チオール、アセチレンチオール等のチオール化合物;脂肪族スルフィド、芳香族スルフィド、アセチレンスルフィド等のスルフィド化合物;スルホキシド、ジベンジルスルホキシド等のスルホキシド化合物;チオ尿素;アミンまたは第四級アンモニウム塩とハロゲンイオンの組合せ;アルキルアミンとヨウ化カリウムの組合せ;タンニンとリン酸ナトリウムの組合せ;トリエタノールアミンとラウリルサルコシンの組合せ;トリエタノールアミンとラウリルサルコシンとベンゾトリアゾールの組合せ;アルキルアミンとベンゾトリアゾールと亜硝酸ナトリウムとリン酸ナトリウムの組合せ;等が挙げられる。 Examples of the rust inhibitor include alkanolamines such as triethanolamine; quaternary ammonium salts; alkanethiols; imidazoles such as imidazoline, imidazole, alkylimidazoline derivatives, benzimidazole, 2-mercaptobenzimidazole, and benzotriazole; metavanadic acid Sodium; bismuth citrate; phenol derivatives; aliphatic amines such as alkylamines and polyalkenylamines, aromatic amines, ethoxylated amines, cyanoalkylamines, cyclohexylamine benzoate, aliphatic diamines such as alkylenediamine, aromatic diamines, etc. Amides of the above amine compounds and carboxylic acids; alkyl esters; pyrimidines; naphthenic acids; sulfonic acid complexes; calcium nitrite, sodium nitrite, disulphite nitrite Nitrites such as rohexylamine; polyol compounds such as polyalcohols and polyphenols; heteropolyacid salts such as sodium molybdate, sodium tungstate, sodium phosphonate, sodium chromate, sodium silicate; gelatin; polymer of carboxylic acid; nitro Compound; formaldehyde; acetylene alcohol; thiol compound such as aliphatic thiol, aromatic thiol, acetylene thiol; sulfide compound such as aliphatic sulfide, aromatic sulfide, acetylene sulfide; sulfoxide compound such as sulfoxide, dibenzyl sulfoxide; thiourea; Combination of amine or quaternary ammonium salt and halogen ion; Combination of alkylamine and potassium iodide; Combination of tannin and sodium phosphate; Triethanol The combination of down and lauryl sarcosine; triethanolamine lauryl sarcosine and a combination of benzotriazole, alkyl amines and benzotriazoles and combinations of sodium nitrite and sodium phosphate; and the like.
 前記紫外線吸収剤/光安定剤としては、例えば、2-(5-メチル-2-ヒドロキシフェニル)ベンゾトリアゾール、2-[2-ヒドロキシ-3,5-ビス(α,α-ジメチルベンジル)フェニル]-2H-ベンゾトリアゾール、2-(3-t-ブチル-5-メチル-2-ヒドロキシフェニル)-5-クロロベンゾトリアゾール、2-(2’-ヒドロキシ-5’-t-オクチルフェニル)ベンゾトリアゾール、メチル-3-[3-t-ブチル-5-(2H-ベンゾトリアゾール-2-イル)-4-ヒドロキシフェニル]プロピオネート-ポリエチレングリコール(分子量約300)との縮合物、ヒドロキシフェニルベンゾトリアゾール誘導体、2-(4,6-ジフェニル-1,3,5-トリアジン-2-イル)-5[(ヘキシル)オキシ]-フェノール、2-エトキシ-2’-エチル-オキサリック酸ビスアニリド等が挙げられる。 Examples of the ultraviolet absorber / light stabilizer include 2- (5-methyl-2-hydroxyphenyl) benzotriazole, 2- [2-hydroxy-3,5-bis (α, α-dimethylbenzyl) phenyl]. -2H-benzotriazole, 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole, 2- (2'-hydroxy-5'-t-octylphenyl) benzotriazole, Condensates with methyl-3- [3-tert-butyl-5- (2H-benzotriazol-2-yl) -4-hydroxyphenyl] propionate-polyethylene glycol (molecular weight about 300), hydroxyphenylbenzotriazole derivatives, 2 -(4,6-diphenyl-1,3,5-triazin-2-yl) -5 [(hexyl) oxy]- Phenol, 2-ethoxy-2'-ethyl-oxalic acid bisanilide and the like.
 前記防カビ剤/抗菌剤としては、2-(4-チアゾリル)ベンツイミダゾール、ソルビン酸、1,2-ベンズイソチアゾリン-3オン、(2-ピリジルチオ-1-オキシド)ナトリウム、デヒドロ酢酸、2-メチル-5-クロロ-4-イソチアゾロン錯体、2,4,5,6-テトラクロロフタロニトリル、2-ベンズイミダゾールカルバミン酸メチル、1-(ブチルカルバモイル)-2-ベンズイミダゾールカルバミン酸メチル、モノあるいはジブロモシアノアセトアミド類、1,2-ジブロモ-2,4-ジシアノブタン、1,1-ジブロモ-1-ニトロプロパノールおよび1,1-ジブロモ-1-ニトロ-2-アセトキシプロパン等が挙げられる。 Examples of the fungicide / antibacterial agent include 2- (4-thiazolyl) benzimidazole, sorbic acid, 1,2-benzisothiazolin-3-one, (2-pyridylthio-1-oxide) sodium, dehydroacetic acid, 2-methyl -5-chloro-4-isothiazolone complex, 2,4,5,6-tetrachlorophthalonitrile, methyl 2-benzimidazole carbamate, methyl 1- (butylcarbamoyl) -2-benzimidazole carbamate, mono or dibromocyano Examples include acetamides, 1,2-dibromo-2,4-dicyanobutane, 1,1-dibromo-1-nitropropanol and 1,1-dibromo-1-nitro-2-acetoxypropane.
 前記生物付着防止剤としては、テトラメチルチウラムジスルフィド、ビス(N,N-ジメチルジチオカルバミン酸)亜鉛、3-(3,4-ジクロロフェニル)-1,1-ジメチルウレア、ジクロロ-N-((ジメチルアミノ)スルフォニル)フルオロ-N-(P-トリル)メタンスルフェンアミド、ピリジン-トリフェニルボラン、N,N-ジメチル-N’-フェニル-N’-(フルオロジクロロメチルチオ)スルファミド、チオシアン酸第一銅(1)、酸化第一銅、テトラブチルチウラムジサルファイド、2,4,5,6-テトラクロロイソフタロニトリル、ジンクエチレンビスジチオカーバーメート、2,3,5,6-テトラクロロ-4-(メチルスルホニル)ピリジン、N-(2,4,6-トリクロロフェニル)マレイミド、ビス(2-ピリジンチオール-1-オキシド)亜鉛塩、ビス(2-ピリジンチオール-1-オキシド)銅塩、2-メチルチオ-4-t-ブチルアミノ-6-シクロプロピルアミノ-s-トリアジン、4,5-ジクロロ-2-n-オクチル-4-イソチアゾリン-3-オン、フラノン類、アルキルピリジン化合物、グラミン系化合物、イソニトリル化合物等が挙げられる。 Examples of the biological adhesion inhibitor include tetramethylthiuram disulfide, bis (N, N-dimethyldithiocarbamate) zinc, 3- (3,4-dichlorophenyl) -1,1-dimethylurea, dichloro-N-((dimethylamino ) Sulfonyl) fluoro-N- (P-tolyl) methanesulfenamide, pyridine-triphenylborane, N, N-dimethyl-N′-phenyl-N ′-(fluorodichloromethylthio) sulfamide, cuprous thiocyanate ( 1), cuprous oxide, tetrabutylthiuram disulfide, 2,4,5,6-tetrachloroisophthalonitrile, zinc ethylenebisdithiocarbamate, 2,3,5,6-tetrachloro-4- (methyl) Sulfonyl) pyridine, N- (2,4,6-trichlorophenyl) maleimide, bis ( -Pyridinethiol-1-oxide) zinc salt, bis (2-pyridinethiol-1-oxide) copper salt, 2-methylthio-4-t-butylamino-6-cyclopropylamino-s-triazine, 4,5- Examples include dichloro-2-n-octyl-4-isothiazolin-3-one, furanones, alkylpyridine compounds, gramine compounds, isonitrile compounds, and the like.
 前記消臭剤としては、乳酸、コハク酸、リンゴ酸、クエン酸、マレイン酸、マロン酸、エチレンジアミンポリ酢酸、アルカン-1,2-ジカルボン酸、アルケン-1,2-ジカルボン酸、シクロアルカン-1,2-ジカルボン酸、シクロアルケン-1,2-ジカルボン酸、ナフタレンスルホン酸等の有機酸類;ウンデシレン酸亜鉛、2-エチルヘキサン酸亜鉛、リシノール酸亜鉛等の脂肪酸金属類;酸化鉄、硫酸鉄、酸化亜鉛、硫酸亜鉛、塩化亜鉛、酸化銀、酸化銅、金属(鉄、銅等)クロロフィリンナトリウム、金属(鉄、銅、コバルト等)フタロシアニン、金属(鉄、銅、コバルト等)テトラスルホン酸フタロシアニン、二酸化チタン、可視光応答型二酸化チタン(窒素ドープ型など)等の金属化合物;α-、β-、又はγ-シクロデキストリン、そのメチル誘導体、ヒドロキシプロピル誘導体、グルコシル誘導体、マルトシル誘導体等のシクロデキストリン類;多孔メタクリル酸ポリマー、多孔アクリル酸ポリマー等のアクリル酸系ポリマー、多孔ジビニルベンゼンポリマー、多孔スチレン-ジビニルベンゼン-ビニルピリジンポリマー、多孔ジビニルベンゼン-ビニルピリジンポリマー等の芳香族系ポリマー、それらの共重合体及びキチン、キトサン、活性炭、シリカゲル、活性アルミナ、ゼオライト、セラミック等の多孔質体等が挙げられる。 Examples of the deodorizer include lactic acid, succinic acid, malic acid, citric acid, maleic acid, malonic acid, ethylenediaminepolyacetic acid, alkane-1,2-dicarboxylic acid, alkene-1,2-dicarboxylic acid, cycloalkane-1 , 2-dicarboxylic acid, cycloalkene-1,2-dicarboxylic acid, organic acids such as naphthalenesulfonic acid; fatty acid metals such as zinc undecylenate, zinc 2-ethylhexanoate, zinc ricinoleate; iron oxide, iron sulfate, Zinc oxide, zinc sulfate, zinc chloride, silver oxide, copper oxide, metal (iron, copper, etc.) chlorophyllin sodium, metal (iron, copper, cobalt etc.) phthalocyanine, metal (iron, copper, cobalt etc.) tetrasulfonic acid phthalocyanine, Metal compounds such as titanium dioxide, visible light responsive titanium dioxide (nitrogen doped type, etc.); α-, β-, or γ-cyclodex Thrin, cyclodextrins such as methyl derivatives thereof, hydroxypropyl derivatives, glucosyl derivatives, maltosyl derivatives; acrylic acid polymers such as porous methacrylic acid polymers and porous acrylic acid polymers, porous divinylbenzene polymers, porous styrene-divinylbenzene-vinylpyridine Examples thereof include polymers, aromatic polymers such as porous divinylbenzene-vinylpyridine polymer, copolymers thereof, and porous materials such as chitin, chitosan, activated carbon, silica gel, activated alumina, zeolite, and ceramic.
 前記顔料としては、カーボンブラック、酸化チタン、フタロシアニン系顔料、キナクリドン系顔料、イソインドリノン系顔料、ペリレン又はペリノン系顔料、キノフタロン系顔料、ジケトピロロ-ピロール系顔料、ジオキサジン系顔料、ジスアゾ縮合系顔料やベンズイミダゾロン系顔料等が挙げられる。 Examples of the pigment include carbon black, titanium oxide, phthalocyanine pigment, quinacridone pigment, isoindolinone pigment, perylene or perinone pigment, quinophthalone pigment, diketopyrrolo-pyrrole pigment, dioxazine pigment, disazo condensation pigment, Examples include benzimidazolone pigments.
 前記難燃剤としてはデカブロモビフェニル、三酸化アンチモン、リン系難燃剤、水酸化アルミニウム等が挙げられる。 Examples of the flame retardant include decabromobiphenyl, antimony trioxide, phosphorus flame retardant, aluminum hydroxide and the like.
 前記帯電防止剤としては、4級アンモニウム塩型のカチオン界面活性剤、ベタイン型の両性界面活性剤、リン酸アルキル型のアニオン界面活性剤、第1級アミン塩、第2級アミン塩、第3級アミン塩、第4級アミン塩やピリジン誘導体等のカチオン界面活性剤、硫酸化油、石鹸、硫酸化エステル油、硫酸化アミド油、オレフィンの硫酸化エステル塩類、脂肪アルコール硫酸エステル塩類、アルキル硫酸エステル塩、脂肪酸エチルスルホン酸塩、アルキルナフタレンスルホン酸塩、アルキルベンゼンスルホン酸塩、琥珀酸エステルスルホン酸塩や燐酸エステル塩等のアニオン界面活性剤、多価アルコールの部分的脂肪酸エステル、脂肪アルコールのエチレンオキサイド付加物、脂肪酸のエチレンオキサイド付加物、脂肪アミノ又は脂肪酸アミドのエチレンオキサイド付加物、アルキルフェノールのエチレンオキサイド付加物、多価アルコールの部分的脂肪酸エステルのエチレンオキサイド付加物やポリエチレングリコール等のノニオン界面活性剤、カルボン酸誘導体やイミダゾリン誘導体等の両性界面活性剤等が挙げられる。 Examples of the antistatic agent include quaternary ammonium salt type cationic surfactants, betaine type amphoteric surfactants, alkyl phosphate type anionic surfactants, primary amine salts, secondary amine salts, thirds. Cationic surfactants such as quaternary amine salts, quaternary amine salts and pyridine derivatives, sulfated oils, soaps, sulfated ester oils, sulfated amide oils, sulfated ester salts of olefins, fatty alcohol sulfate esters, alkyl sulfates Anionic surfactants such as ester salts, fatty acid ethyl sulfonates, alkyl naphthalene sulfonates, alkyl benzene sulfonates, oxalate sulfonates and phosphate ester salts, partial fatty acid esters of polyhydric alcohols, fatty alcohol ethylenes Oxide adduct, fatty acid ethylene oxide adduct, fatty amino acid or fatty acid amino acid Ethylene oxide adducts of alkylphenols, ethylene oxide adducts of alkylphenols, ethylene oxide adducts of partial fatty acid esters of polyhydric alcohols, nonionic surfactants such as polyethylene glycol, amphoteric surfactants such as carboxylic acid derivatives and imidazoline derivatives, etc. Can be mentioned.
 また、添加剤としてさらに、滑剤、充填剤、可塑剤、核剤、アンチブロッキング剤、発泡剤、乳化剤、光沢剤、結着剤等を共存させてもよい。 Further, as additives, lubricants, fillers, plasticizers, nucleating agents, antiblocking agents, foaming agents, emulsifiers, brighteners, binders, and the like may coexist.
 これら添加剤を含む場合、添加剤の含有量は、有機ケイ素化合物(A)と金属化合物(B)とを含む組成物中、通常、0.1~70質量%であり、好ましくは0.1~50質量%であり、より好ましくは0.5~30質量%であり、さらに好ましくは2~15質量%である。 When these additives are included, the content of the additives is usually 0.1 to 70% by mass, preferably 0.1% in the composition containing the organosilicon compound (A) and the metal compound (B). -50% by mass, more preferably 0.5-30% by mass, still more preferably 2-15% by mass.
 また、有機ケイ素化合物(A)と金属化合物(B)の合計の含有量は、高沸点溶媒(C)、低沸点溶媒(D)及び触媒(E)の合計100質量%に対して0.1~1.5質量%であることが好ましく、より好ましくは0.15~1.2質量%である。 Moreover, the total content of the organosilicon compound (A) and the metal compound (B) is 0.1% with respect to a total of 100% by mass of the high boiling point solvent (C), the low boiling point solvent (D), and the catalyst (E). The content is preferably 1.5% by mass, more preferably 0.15-1.2% by mass.
 さらに、本発明の組成物は、炭素数が7以上、9以下(特に8)であるアルキル基が1つと、3つの加水分解性基がケイ素原子に結合している有機ケイ素化合物(A1)と、4つの加水分解性基が金属原子(特にケイ素原子)に結合している金属化合物(B)と、前記高沸点溶媒(C)及び低沸点溶媒(D)を含み、前記金属化合物(B)と有機ケイ素化合物(A)の重量比(金属化合物(B)/有機ケイ素化合物(A))が5以上(より好ましくは15以上)、36以下であることが特に好ましい。有機ケイ素化合物(A)、金属化合物(B)の構造やモル比をこのように調整することで、得られる皮膜の硬度と撥水・撥油性がより高度に両立される。 Furthermore, the composition of the present invention comprises one alkyl group having 7 to 9 carbon atoms (particularly 8) and an organosilicon compound (A1) in which three hydrolyzable groups are bonded to a silicon atom. A metal compound (B) in which four hydrolyzable groups are bonded to a metal atom (particularly a silicon atom), the high-boiling solvent (C), and the low-boiling solvent (D), and the metal compound (B) It is particularly preferable that the weight ratio (metal compound (B) / organosilicon compound (A)) to organosilicon compound (A) is 5 or more (more preferably 15 or more) and 36 or less. By adjusting the structures and molar ratios of the organosilicon compound (A) and the metal compound (B) in this way, the hardness and water / oil repellency of the resulting film are more highly compatible.
 本発明の組成物は、手塗りで基材にムラなく接触させることができ、有機ケイ素化合物(A)、金属化合物(B)の加水分解性基が加水分解・重縮合され、基材表面に皮膜が形成される。本発明において手塗評価の実施に当たって、以下のような方法を採用し、実使用に近い状態を再現している。まずベンコットの上に疑似指(トンボ社製モノワンダストキャッチ)を2本乗せ、スチールウール試験機(大栄精機社製)に取り付け、ベンコットに塗布溶液1を1mL浸み込ませた。次いで1kgの荷重を加えながら、ストローク50mm、速度60r/minの条件で基材に往路のみ塗布し、時間を置かずにガラス基板をずらして重なり合う箇所ができるように、再度往路のみ塗布した。このように塗布を行うことにより、定量的に手塗りを再現した。 The composition of the present invention can be brought into contact with the substrate evenly by hand coating, and hydrolyzable groups of the organosilicon compound (A) and the metal compound (B) are hydrolyzed and polycondensed to form a surface on the substrate surface. A film is formed. In carrying out the hand coating evaluation in the present invention, the following method is adopted to reproduce a state close to actual use. First, two pseudo fingers (mono-one dust catch made by Dragonfly Co.) were placed on the bencott, attached to a steel wool tester (made by Daiei Seiki Co., Ltd.), and 1 ml of the coating solution 1 was immersed in the bencott. Next, while applying a load of 1 kg, only the outward path was applied to the base material under the conditions of a stroke of 50 mm and a speed of 60 r / min, and only the outward path was applied again so as to create an overlapping portion by shifting the glass substrate without leaving time. By applying in this way, the hand coating was quantitatively reproduced.
 また、組成物と基材とを接触させた状態で、空気中で静置する(例えば10~48時間程度)と、空気中の水分が取り込まれ、加水分解性基の加水分解・重縮合が促進されるため、好ましい。得られた皮膜は、さらに、乾燥してもよい。加温乾燥させる温度としては、通常40~250℃であり、好ましくは60~200℃であり、さらに好ましくは60~150℃である。 In addition, when the composition is left in contact with the substrate in the air (for example, about 10 to 48 hours), moisture in the air is taken in, and hydrolysis and polycondensation of the hydrolyzable group occurs. This is preferable because it is promoted. The obtained film may be further dried. The temperature for heating and drying is usually 40 to 250 ° C, preferably 60 to 200 ° C, more preferably 60 to 150 ° C.
 有機ケイ素化合物(A1)を用いる場合と、有機ケイ素化合物(A2)を用いる場合に得られる皮膜について、それぞれ以下に説明する。 The case where the organic silicon compound (A1) is used and the case where the organic silicon compound (A2) is used will be described below.
 (2-1)有機ケイ素化合物(A1)を用いる場合の皮膜
 得られた皮膜は、ケイ素原子や上記金属原子(好ましくはケイ素原子のみ)が、酸素原子を介して結合した網目状の骨格を有しており、有機ケイ素化合物(A1)に由来して、この骨格を形成するケイ素原子のうち一部のケイ素原子に、第1の炭化水素鎖含有基が結合した構造を有する。
(2-1) Film in the case of using the organosilicon compound (A1) The obtained film has a network skeleton in which silicon atoms or the above metal atoms (preferably only silicon atoms) are bonded through oxygen atoms. And having a structure in which the first hydrocarbon chain-containing group is bonded to some of the silicon atoms forming the skeleton, derived from the organosilicon compound (A1).
 前記炭素数が6~20のアルキル基がケイ素原子に結合した構造としては、下記式(1)で表される構造(a1)が好ましい。 The structure in which the alkyl group having 6 to 20 carbon atoms is bonded to the silicon atom is preferably a structure (a1) represented by the following formula (1).
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032
[式(1)中、Ra3は炭素数が6~20のアルキル基を表し、Za3は、炭化水素鎖含有基、または、-O-基を表し、Za3が炭化水素鎖含有基の場合、Ra3とZa3とは同一であっても異なっていてもよく、複数の式(1)間でRa3とZa3とは同一であっても異なっていてもよい。] [In the formula (1), R a3 represents an alkyl group having 6 to 20 carbon atoms, Z a3 represents a hydrocarbon chain-containing group or —O— group, and Z a3 represents a hydrocarbon chain-containing group. case, the R a3 and Z a3 may be the same or different and is an R a3 and Z a3 among multiple expressions (1) may be the same or different. ]
 式(1)中、Za3の第炭化水素鎖含有基は、いずれも上記説明した第1の炭化水素鎖含有基(炭素数が6~20のアルキル基を含む)、第1の炭化水素鎖含有基の範囲から適宜選択できる。 In the formula (1), all of the first hydrocarbon chain-containing groups of Z a3 are the first hydrocarbon chain-containing groups described above (including alkyl groups having 6 to 20 carbon atoms), the first hydrocarbon chain It can select suitably from the range of a containing group.
 中でもZa3としては、第2の炭化水素鎖含有基または-O-基が好ましく、-O-基が特に好ましい。 Among these, as Z a3 , the second hydrocarbon chain-containing group or —O— group is preferable, and —O— group is particularly preferable.
 構造(a1)としては、例えば、下記式(1-1)~式(1-32)で表される構造を好ましく例示することができる。 As the structure (a1), for example, structures represented by the following formulas (1-1) to (1-32) can be preferably exemplified.
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035
 本発明の組成物を用いて得られた皮膜では、金属化合物(B)に由来して、上記炭素数が6~20のアルキル基が結合するケイ素原子とは異なるケイ素原子(第2ケイ素原子)に、第2の炭化水素鎖含有基、ヒドロキシ基、アルコキシ基、またはヒドロキシ基が縮合した基が結合していてもよい。またこの第2ケイ素原子は、他の金属原子(例えば、Al、Fe、In、Ge、Hf、Si、Ti、Sn、Zr、または、Ta)に置き換わっていてもよい。こうした第2ケイ素原子や他の金属原子もまた前記炭素数が6~20のアルキル基よりも鎖長が短い第2の炭化水素鎖含有基、ヒドロキシ基、アルコキシ基、またはヒドロキシ基が結合しているためにスペーサーとして作用し、炭素数が6~20のアルキル基による撥水・撥油特性向上作用を高めることが可能となる。 In the film obtained using the composition of the present invention, a silicon atom (second silicon atom) derived from the metal compound (B) and different from the silicon atom to which the alkyl group having 6 to 20 carbon atoms is bonded. In addition, a second hydrocarbon chain-containing group, a hydroxy group, an alkoxy group, or a group in which a hydroxy group is condensed may be bonded. The second silicon atom may be replaced by another metal atom (for example, Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta). These second silicon atoms and other metal atoms are also bonded to a second hydrocarbon chain-containing group, hydroxy group, alkoxy group, or hydroxy group having a shorter chain length than the alkyl group having 6 to 20 carbon atoms. Therefore, it acts as a spacer, and it is possible to enhance the water / oil repellency improving effect by the alkyl group having 6 to 20 carbon atoms.
 前記アルコキシ基は、炭素数1~4であることが好ましく、より好ましくは炭素数1~3である。例えば、ブトキシ基、プロポキシ基、エトキシ基、メトキシ基等が挙げられる。 The alkoxy group preferably has 1 to 4 carbon atoms, more preferably 1 to 3 carbon atoms. For example, a butoxy group, a propoxy group, an ethoxy group, a methoxy group, etc. are mentioned.
 また、ヒドロキシ基は他のヒドロキシ基、アルコキシ基等と縮合して、-O-を形成するが、このようなヒドロキシ基が縮合した基が前記金属原子に結合していてもよい。 In addition, the hydroxy group is condensed with other hydroxy groups, alkoxy groups and the like to form —O—, and such a condensed group of hydroxy groups may be bonded to the metal atom.
 第2の炭化水素鎖含有基またはヒドロキシ基が第2のケイ素原子または他の金属原子に結合した構造としては、下記式(2)で表される構造(b)が好ましい。 The structure in which the second hydrocarbon chain-containing group or hydroxy group is bonded to the second silicon atom or other metal atom is preferably a structure (b) represented by the following formula (2).
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000036
[式(2)中、Rb2は、第2の炭化水素鎖含有基またはヒドロキシ基を表し、Ab2はヒドロキシ基、または、-O-を表す。Mは、Al、Fe、In、Ge、Hf、Si、Ti、Sn、Zr、または、Taを表す。nは、Mに応じて、0~3の整数を表す。] [In the formula (2), R b2 represents a second hydrocarbon chain-containing group or a hydroxy group, and A b2 represents a hydroxy group or —O—. M represents Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta. n represents an integer of 0 to 3 according to M. ]
 式(2)中、Rb2の第2の炭化水素鎖含有基は、いずれも上記説明した範囲から適宜選択できる。Rb2は、ヒドロキシ基であることが好ましい。 In the formula (2), any of the second hydrocarbon chain-containing groups of R b2 can be appropriately selected from the range described above. R b2 is preferably a hydroxy group.
 また、式(2)中、MとしてはAl等の3価金属;Si、Ti、Sn、Zr等の4価金属;が好ましく、Al、Si、Ti、Zrがより好ましく、Siが特に好ましい。さらに、式(2)において、nは、MがAl、Fe、In等の3価金属の場合は1を表し、MがGe、Hf、Si、Ti、Sn、Zr等の4価金属の場合は2を表し、MがTa等の5価金属の場合は3を表す。 In the formula (2), M is preferably a trivalent metal such as Al; a tetravalent metal such as Si, Ti, Sn, or Zr; more preferably Al, Si, Ti, or Zr, and particularly preferably Si. Further, in the formula (2), n represents 1 when M is a trivalent metal such as Al, Fe, or In, and M is a tetravalent metal such as Ge, Hf, Si, Ti, Sn, or Zr. Represents 2 and represents 3 when M is a pentavalent metal such as Ta.
 構造(b)としては、MがSiの場合、例えば、下記式(2-1)~式(2-11)で表される構造を好ましく例示することができる。 As the structure (b), when M is Si, for example, structures represented by the following formulas (2-1) to (2-11) can be preferably exemplified.
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038
 得られた皮膜において、構造(a)と構造(b)の存在比(構造(a)/構造(b))は、モル基準で、0.01以上であることが好ましく、より好ましくは0.02以上、さらに好ましくは0.03以上であり、0.3以下であることが好ましく、より好ましくは0.2以下、さらに好ましくは0.1以下、よりいっそう好ましくは0.09以下である。 In the obtained film, the abundance ratio of the structure (a) to the structure (b) (structure (a) / structure (b)) is preferably 0.01 or more on a molar basis, more preferably 0.8. 02 or more, more preferably 0.03 or more, preferably 0.3 or less, more preferably 0.2 or less, still more preferably 0.1 or less, and still more preferably 0.09 or less.
 (2-2)有機ケイ素化合物(A2)を用いる場合の皮膜 (2-2) Film when using organosilicon compound (A2)
 有機ケイ素化合物(A2)に由来する構造(a2)は、式(3)で表される。
Figure JPOXMLDOC01-appb-C000039
The structure (a2) derived from the organosilicon compound (A2) is represented by the formula (3).
Figure JPOXMLDOC01-appb-C000039
[式(3)中、Ra4はトリアルキルシリル基含有分子鎖を表し、Za4は、トリアルキルシリル基含有分子鎖、シロキサン骨格含有基、炭化水素鎖含有基又は-O-を表す。] [In the formula (3), R a4 represents a trialkylsilyl group-containing molecular chain, and Z a4 represents a trialkylsilyl group-containing molecular chain, a siloxane skeleton-containing group, a hydrocarbon chain-containing group, or —O—. ]
 式(3)中、Ra4、Za4のトリアルキルシリル基含有分子鎖、Za4のシロキサン骨格含有基、炭化水素鎖含有基は、それぞれ、トリアルキルシリル基含有分子鎖、シロキサン骨格含有基、炭化水素鎖含有基として上記説明した範囲から適宜選択できる。
 中でも、式(3)中、Za4は、シロキサン骨格含有基又は-O-であることが好ましく、-O-であることがより好ましい。
In the formula (3), R a4 , Z a4 trialkylsilyl group-containing molecular chain, Z a4 siloxane skeleton-containing group, and hydrocarbon chain-containing group are respectively a trialkylsilyl group-containing molecular chain, a siloxane skeleton-containing group, The hydrocarbon chain-containing group can be appropriately selected from the range described above.
In particular, in formula (3), Z a4 is preferably a siloxane skeleton-containing group or —O—, and more preferably —O—.
 構造(a2)としては、式(3-1)で表される構造が挙げられる。 Structure (a2) includes a structure represented by formula (3-1).
Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-T000041
Figure JPOXMLDOC01-appb-T000041
Figure JPOXMLDOC01-appb-T000042
Figure JPOXMLDOC01-appb-T000042
 金属化合物(B)に由来する構造(b)は、有機ケイ素化合物(A1)を用いた場合と同じである。 The structure (b) derived from the metal compound (B) is the same as when the organosilicon compound (A1) is used.
 そして、本発明の組成物を用いて得られた皮膜は、通常、厚みが3~50nm程度である。 The film obtained using the composition of the present invention usually has a thickness of about 3 to 50 nm.
 さらに、本発明の組成物を用いて得られた皮膜は、ケイ素原子や上記金属原子(好ましくはケイ素原子のみ)が酸素原子を介して結合した網目状の骨格を有しており、この骨格を形成するケイ素原子のうち一部のケイ素原子に、前記炭素数6~20のアルキル基が結合した構造を有するため、液滴の滑り性、さらには撥水・撥油性に優れている。撥水性は例えば、θ/2法により求めた液量:3μLの水滴の接触角で評価でき、接触角は例えば97°以上であり、より好ましくは100°以上であり、更に好ましくは101°以上であり、上限は特に限定されないが例えば110°である。また、液滴の滑り性は、例えば、基材上に付着させた液滴の滑落角や接触角ヒステリシスにより評価できる。具体的には液量6μLの水滴の滑落角が23°以下であることが好ましく、より好ましくは21°以下であり、更に好ましくは20°以下であり、下限は例えば5°である。接触角ヒステリシスは、8.0°以下が好ましく、より好ましくは7°以下、更に好ましくは6°以下であり、下限は例えば1.0°である。 Furthermore, the film obtained using the composition of the present invention has a network-like skeleton in which silicon atoms or the above metal atoms (preferably only silicon atoms) are bonded through oxygen atoms. Since it has a structure in which the alkyl group having 6 to 20 carbon atoms is bonded to some of the silicon atoms to be formed, it is excellent in the slipperiness of the droplets, and also in the water and oil repellency. The water repellency can be evaluated by, for example, the contact angle of a 3 μL water droplet determined by the θ / 2 method, and the contact angle is, for example, 97 ° or more, more preferably 100 ° or more, and further preferably 101 ° or more. The upper limit is not particularly limited, but is 110 °, for example. Further, the slipperiness of the droplet can be evaluated by, for example, the sliding angle or contact angle hysteresis of the droplet deposited on the substrate. Specifically, the sliding angle of a 6 μL liquid droplet is preferably 23 ° or less, more preferably 21 ° or less, still more preferably 20 ° or less, and the lower limit is, for example, 5 °. The contact angle hysteresis is preferably 8.0 ° or less, more preferably 7 ° or less, still more preferably 6 ° or less, and the lower limit is, for example, 1.0 °.
 本発明の組成物を基材上にコーティングすることで、皮膜を形成でき、基材の形状は、平面、曲面のいずれでもよい。また、基材は、有機系材料、無機系材料のいずれで構成されていてもよく、前記有機系材料としては、アクリル樹脂、ポリカーボネート樹脂、ポリエステル樹脂、スチレン樹脂、アクリル-スチレン共重合樹脂、セルロース樹脂、ポリオレフィン樹脂等の熱可塑性樹脂;フェノール樹脂、ユリア樹脂、メラミン樹脂、エポキシ樹脂、不飽和ポリエステル、シリコーン樹脂、ウレタン樹脂等の熱硬化性樹脂;等が挙げられ、無機系材料としては、セラミックス;ガラス;鉄、シリコン、銅、亜鉛、アルミニウム、等の金属;前記金属を含む合金;等が挙げられる。 A film can be formed by coating the composition of the present invention on a substrate, and the shape of the substrate may be flat or curved. The substrate may be composed of any organic material or inorganic material. Examples of the organic material include acrylic resin, polycarbonate resin, polyester resin, styrene resin, acrylic-styrene copolymer resin, cellulose Thermoplastic resins such as resins and polyolefin resins; thermosetting resins such as phenol resins, urea resins, melamine resins, epoxy resins, unsaturated polyesters, silicone resins, urethane resins; and the like, and inorganic materials include ceramics Glass; metal such as iron, silicon, copper, zinc, and aluminum; alloy containing the metal; and the like.
 前記基材には予め易接着処理を施しておいてもよい。易接着処理としては、コロナ処理、プラズマ処理、紫外線処理等の親水化処理が挙げられる。また、樹脂、シランカップリング剤、テトラアルコキシシラン等によるプライマー処理を用いてもよい。 The substrate may be subjected to an easy adhesion treatment in advance. Examples of the easy adhesion treatment include hydrophilic treatment such as corona treatment, plasma treatment, and ultraviolet treatment. Further, primer treatment with a resin, a silane coupling agent, tetraalkoxysilane, or the like may be used.
 本発明の組成物によれば、撥水・撥油性と耐摩耗性を両立した皮膜を手塗りで提供することができ、各種車両や建築物の窓ガラスなどに好適に用いることができる。 According to the composition of the present invention, a film having both water and oil repellency and abrasion resistance can be provided by hand coating, and it can be suitably used for various types of vehicles and building windows.
 以下、実施例を挙げて本発明をより具体的に説明するが、本発明はもとより下記実施例によって制限を受けるものではなく、前・後記の趣旨に適合し得る範囲で適当に変更を加えて実施することも勿論可能であり、それらはいずれも本発明の技術的範囲に包含される。 EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited by the following examples, but may be appropriately modified within a range that can meet the purpose described above and below. Of course, it is possible to implement them, and they are all included in the technical scope of the present invention.
 本発明の実施例で用いた測定法は下記の通りである。 The measurement methods used in the examples of the present invention are as follows.
 (1)静的接触角の測定
 接触角測定装置(協和界面科学社製 DM700)を用い、θ/2法で液量:3μLにて、皮膜表面の水の接触角を測定した。
(1) Measurement of static contact angle Using a contact angle measuring device (DM700 manufactured by Kyowa Interface Science Co., Ltd.), the contact angle of water on the surface of the film was measured at a liquid volume of 3 μL by the θ / 2 method.
 (2)動的接触角(滑落角及び接触角ヒステリシス)の測定
 協和界面科学社製DM700を使用し、滑落法(解析方法:接線法、水滴量:6.0μL、傾斜方法:連続傾斜、滑落検出:滑落後、移動判定:前進角、滑落判定距離:0.25mm)により、皮膜表面の動的撥水(接触角ヒステリシス、滑落角)を測定した。
(2) Measurement of dynamic contact angle (sliding angle and contact angle hysteresis) Using DM700 manufactured by Kyowa Interface Science Co., Ltd., sliding method (analysis method: tangential method, water droplet amount: 6.0 μL, tilting method: continuous tilt, sliding) Detection: After sliding, movement determination: forward angle, sliding determination distance: 0.25 mm), the dynamic water repellency (contact angle hysteresis, sliding angle) of the coating surface was measured.
 (3)水滴の滑り性評価
 皮膜表面に3μLの水滴を付け、水平方向から90°まで傾けた際の水滴の滑り具合を、滑落スピードの官能評価にて以下の通り評価した。
 ◎:水滴が非常に早く滑落した
 ○:水滴が滑落した
 △:水滴がゆっくり滑落した
 ×:水滴が動かなかった
(3) Evaluation of slipperiness of water droplets 3 μL of water droplets were attached to the surface of the film, and the degree of slipping of the water droplets when tilted from the horizontal direction to 90 ° was evaluated by sensory evaluation of the sliding speed as follows.
◎: Water droplet slipped very quickly ○: Water droplet slipped △: Water droplet slipped slowly ×: Water droplet did not move
 (4)皮膜表面の目視評価
 照度1000ルクスの環境において、皮膜を目視にて観察し、着色や異物の有無(以下、まとめて「汚れ」と記載する)を官能評価にて、以下の通り評価した。
 ◎:全く汚れがない
 ○:よく見ると汚れが確認できる
 △:膜の部分的な汚れが確認できる
 ×:膜の全体的な汚れが確認できる
(4) Visual evaluation of film surface In an environment with an illuminance of 1000 lux, the film was visually observed, and the presence or absence of coloring or foreign matter (hereinafter collectively referred to as “dirt”) was evaluated by sensory evaluation as follows. did.
◎: No dirt at all ○: Dirt can be confirmed by looking closely △: Partial dirt on the film can be confirmed ×: Overall dirt on the film can be confirmed
(5)ヘーズ評価
ヘーズメーターHZ-2(スガ試験機)を用いて、D65光源(平均昼光)にて、表面のヘーズ(曇り度)を測定し、手塗り性の評価を行った。
(5) Haze evaluation The haze (cloudiness) of the surface was measured with a D65 light source (average daylight) using a haze meter HZ-2 (Suga Test Machine) to evaluate hand-paintability.
 (6)耐摩耗性の評価
 (5)でヘーズが0.50以下となった皮膜について、耐摩耗性の評価を行った。消しゴム付きHB鉛筆(三菱鉛筆社)を備えたスチールウール試験機(大栄精機社製)を使用した。消しゴムが皮膜表面に接した状態で、500gの荷重をかけて摩耗試験を行い、目視にて剥がれ又は傷が確認されるか、又は水の接触角が試験前の接触角よりも15°以上低下するまで試験を繰り返した。
(6) Evaluation of wear resistance The wear resistance of the film having a haze of 0.50 or less in (5) was evaluated. A steel wool testing machine (made by Daiei Seiki Co., Ltd.) equipped with an HB pencil with an eraser (Mitsubishi Pencil Co., Ltd.) was used. While the eraser is in contact with the surface of the film, a wear test is performed with a load of 500 g, and peeling or scratches are visually confirmed, or the contact angle of water is 15 ° or more lower than the contact angle before the test. The test was repeated until
 実施例1-1
 有機ケイ素化合物(A1)としてのトリエトキシ-n-オクチルシラン(オクチルトリエトキシシラン)2.2×10-4mol、金属化合物(B)としてのオルトケイ酸テトラエチル(テトラエトキシシラン)3.5×10-3molを、イソプロピルアルコール0.95mlと1-ブタノール0.95mlの混合溶液に溶解させ、室温で20分攪拌した。得られた溶液に、触媒としての塩酸(0.01mol/L水溶液)1.0ml滴下した後、24時間攪拌して、試料溶液を作製した。前記試料溶液を、イソプロピルアルコールで30倍に希釈し、塗布溶液1-1とした。
Example 1-1
Triethoxy-n-octylsilane (octyltriethoxysilane) 2.2 × 10 −4 mol as the organosilicon compound (A1), tetraethyl orthosilicate (tetraethoxysilane) 3.5 × 10 as the metal compound (B) 3 mol was dissolved in a mixed solution of 0.95 ml of isopropyl alcohol and 0.95 ml of 1-butanol and stirred at room temperature for 20 minutes. To the obtained solution, 1.0 ml of hydrochloric acid (0.01 mol / L aqueous solution) as a catalyst was dropped, and then stirred for 24 hours to prepare a sample solution. The sample solution was diluted 30 times with isopropyl alcohol to obtain a coating solution 1-1.
 塗布溶液1をベンコット(旭化成株式会社製クリーンルーム用ワイパー、登録商標)に浸み込ませ、アルカリ洗浄したガラス基板(5cm×5cm、Corning社製「EAGLE XG」)にコーティングし、1日室温で静置した。コーティングは以下の方法によりおこなった。ベンコットの上に疑似指(トンボ社製モノワンダストキャッチ)を2本乗せ、スチールウール試験機(大栄精機社製)に取り付け、ベンコットに塗布溶液1を1mL浸み込ませた。次いで1kgの荷重を加えながら、ストローク50mm、速度60r/minの条件で基材に往路のみ塗布し、時間を置かずにガラス基板をずらして重なり合う箇所ができるように、再度往路のみ塗布した。このように塗布を行うことにより、定量的に手塗りを再現することができる。このコーティング方法を手塗りということがある。 The coating solution 1 is soaked in Bencott (Asahi Kasei Co., Ltd. clean room wiper, registered trademark), coated on an alkali-cleaned glass substrate (5 cm × 5 cm, Corning “EAGLE XG”), and allowed to stand at room temperature for one day. I put it. Coating was performed by the following method. Two pseudo fingers (mono-one dust catch made by Dragonfly) were placed on the bencott, attached to a steel wool tester (made by Daiei Seiki Co., Ltd.), and 1 ml of the coating solution 1 was immersed in the bencott. Next, while applying a load of 1 kg, only the outward path was applied to the base material under the conditions of a stroke of 50 mm and a speed of 60 r / min, and only the outward path was applied again so as to create an overlapping portion by shifting the glass substrate without leaving time. By applying in this way, it is possible to reproduce the hand coating quantitatively. This coating method is sometimes called hand coating.
 作製した皮膜について、初期の静的および動的接触角、耐摩耗性、ヘーズの評価を行った。また、官能評価としては、水滴滑り性、膜表面の目視観察を行った。 The initial static and dynamic contact angles, wear resistance, and haze of the prepared coatings were evaluated. Further, as sensory evaluation, water droplet slipping property and visual observation of the film surface were performed.
 実施例1-2
 塗布溶液中の1-ブタノールの割合が表7-1に記載の値となるようにしたこと以外は実施例1-1と同様にして塗布溶液1-2を作成し、実施例1-1と同様にして皮膜を作製して評価を行った。
Example 1-2
A coating solution 1-2 was prepared in the same manner as in Example 1-1 except that the ratio of 1-butanol in the coating solution was set to the value shown in Table 7-1. Similarly, a film was prepared and evaluated.
 実施例1-3
 塗布溶液中の1-ブタノールの割合が表7-1に記載の値となるようにしたこと以外は実施例1-1と同様にして塗布溶液1-3を作成し、実施例1-1と同様にして皮膜を作製して評価を行った。
Example 1-3
A coating solution 1-3 was prepared in the same manner as in Example 1-1 except that the ratio of 1-butanol in the coating solution was set to the value shown in Table 7-1. Similarly, a film was prepared and evaluated.
 実施例2-1
 有機ケイ素化合物(A1)としてのトリエトキシ-n-オクチルシラン(オクチルトリエトキシシラン)2.2×10-4mol、金属化合物(B)としてのオルトケイ酸テトラエチル(テトラエトキシシラン)3.5×10-3molを、イソプロピルアルコール1.8mlとエチレングリコールモノヘキシルエーテル0.095mlの混合溶液に溶解させ、室温で20分攪拌した。得られた溶液に、触媒(E)としての塩酸(0.01mol/L水溶液)1.0ml滴下した後、24時間攪拌して、試料溶液を作製した。前記試料溶液を、イソプロピルアルコールで30倍に希釈し、塗布溶液2-1とした。それ以外は実施例1-1と同様にして皮膜を作製して評価を行った。
Example 2-1
Triethoxy-n-octylsilane (octyltriethoxysilane) 2.2 × 10 −4 mol as the organosilicon compound (A1), tetraethyl orthosilicate (tetraethoxysilane) 3.5 × 10 as the metal compound (B) 3 mol was dissolved in a mixed solution of 1.8 ml of isopropyl alcohol and 0.095 ml of ethylene glycol monohexyl ether, and stirred at room temperature for 20 minutes. To the obtained solution, 1.0 ml of hydrochloric acid (0.01 mol / L aqueous solution) as a catalyst (E) was dropped, and then stirred for 24 hours to prepare a sample solution. The sample solution was diluted 30 times with isopropyl alcohol to obtain a coating solution 2-1. Otherwise, a film was prepared and evaluated in the same manner as in Example 1-1.
 実施例2-2
 塗布溶液中のエチレングリコールモノヘキシルエーテルの割合が表7-1に記載の値となるようにしたこと以外は実施例2-1と同様にして塗布溶液2-2を作成し、実施例1-1と同様にして皮膜を作製して評価を行った。
Example 2-2
A coating solution 2-2 was prepared in the same manner as in Example 2-1, except that the ratio of ethylene glycol monohexyl ether in the coating solution was as shown in Table 7-1. A film was prepared in the same manner as in Example 1 and evaluated.
 実施例3-1
 有機ケイ素化合物(A1)としてのトリエトキシ-n-デシルシラン(デシルトリエトキシシラン)1.8×10-4mol、金属化合物(B)としてのオルトケイ酸テトラエチル(テトラエトキシシラン)3.7×10-3molを、イソプロピルアルコール1.0mlと1-ブタノール1.0mlの混合溶液に溶解させ、室温で20分攪拌した。得られた溶液に、触媒としての塩酸(0.01mol/L水溶液)1.1ml滴下した後、24時間攪拌して、試料溶液を作製した。前記試料溶液を、イソプロピルアルコールで30倍に希釈し、塗布溶液3-1とした。それ以外は実施例1-1と同様にして皮膜を作製して評価を行った。
Example 3-1
Triethoxy-n-decylsilane (decyltriethoxysilane) 1.8 × 10 −4 mol as the organosilicon compound (A1), tetraethyl orthosilicate (tetraethoxysilane) 3.7 × 10 −3 as the metal compound (B) Mol was dissolved in a mixed solution of 1.0 ml of isopropyl alcohol and 1.0 ml of 1-butanol and stirred at room temperature for 20 minutes. To the obtained solution, 1.1 ml of hydrochloric acid (0.01 mol / L aqueous solution) as a catalyst was dropped, and then stirred for 24 hours to prepare a sample solution. The sample solution was diluted 30 times with isopropyl alcohol to obtain a coating solution 3-1. Otherwise, a film was prepared and evaluated in the same manner as in Example 1-1.
 実施例3-2
 有機ケイ素化合物(A1)としてトリエトキシ-n-デシルシラン(デシルトリエトキシシラン)に代えてトリエトキシ-n-ドデシルシラン(ドデシルトリエトキシシラン)を用いたこと以外は実施例3-1と同様にして塗布溶液3-2を作製し、実施例1-1と同様にして皮膜を作製して評価を行った。
Example 3-2
Coating solution as in Example 3-1, except that triethoxy-n-dodecylsilane (dodecyltriethoxysilane) was used in place of triethoxy-n-decylsilane (decyltriethoxysilane) as the organosilicon compound (A1) 3-2 was prepared, and a film was prepared and evaluated in the same manner as in Example 1-1.
 実施例3-3
 試料溶液を、イソプロピルアルコールで50倍に希釈し、塗布溶液3-3とした以外は実施例3-2と同様にした。
Example 3-3
The sample solution was diluted 50-fold with isopropyl alcohol to give a coating solution 3-3, which was the same as Example 3-2.
 実施例4
 有機ケイ素化合物(A1)としてのトリエトキシ-n-オクチルシラン(オクチルトリエトキシシラン)1.2×10-3mol、金属化合物(B)としてのシリケート40を6.0×10-3molを、イソプロピルアルコール5.1mlと1-ブタノール5.1mlの混合溶液に溶解させ、室温で20分攪拌した。得られた溶液に、触媒としての塩酸(0.01mol/L水溶液)5.4ml滴下した後、24時間攪拌して、試料溶液を作製した。前記試料溶液を、イソプロピルアルコールで30倍に希釈し、塗布溶液4とした。その後は実施例1-1と同様にして皮膜を作製して評価を行った。
Example 4
Triethoxy-n-octylsilane (octyltriethoxysilane) 1.2 × 10 −3 mol as organosilicon compound (A1), silicate 40 as metal compound (B) 6.0 × 10 −3 mol in isopropyl It was dissolved in a mixed solution of 5.1 ml of alcohol and 5.1 ml of 1-butanol and stirred at room temperature for 20 minutes. To the obtained solution, 5.4 ml of hydrochloric acid (0.01 mol / L aqueous solution) as a catalyst was dropped, and then stirred for 24 hours to prepare a sample solution. The sample solution was diluted 30 times with isopropyl alcohol to obtain a coating solution 4. Thereafter, a film was prepared and evaluated in the same manner as in Example 1-1.
 実施例5
 有機ケイ素化合物(A1)としてのトリエトキシ-n-オクチルシラン(オクチルトリエトキシシラン)2.2×10-4mol、金属化合物(B)としてのオルトケイ酸テトラエチル3.5×10-3molを、イソプロピルアルコール0.89mlと1-ブタノール0.95mlの混合溶液に溶解させ、室温で20分撹拌した。得られた溶液に、触媒(E)としての塩酸1.0mLに代えて蟻酸(1mol/L水溶液)2.1mLを用いた以外は実施例1-1と同様にして皮膜を作製し、評価を行った。
Example 5
Triethoxy-n-octylsilane (octyltriethoxysilane) 2.2 × 10 −4 mol as the organosilicon compound (A1) and tetraethyl orthosilicate 3.5 × 10 −3 mol as the metal compound (B) were mixed with isopropyl. It was dissolved in a mixed solution of 0.89 ml of alcohol and 0.95 ml of 1-butanol and stirred at room temperature for 20 minutes. A film was prepared and evaluated in the same manner as in Example 1-1 except that 2.1 mL of formic acid (1 mol / L aqueous solution) was used instead of 1.0 mL of hydrochloric acid as the catalyst (E). went.
 実施例6
<アルコキシシラン化合物の合成例>
 三ツ口フラスコに、トリス(トリメチルシロキシ)シラノールを4.69g、THFを21.0g仕込み、撹拌した。-40℃に冷却し、n-BuLiヘキサン溶液(1.6mol/L)を9.38mL滴下した。0℃まで昇温し、21gのTHFに溶解したヘキサメチルシクロトリシロキサン10.01gを滴下し、17時間撹拌した。-40℃に冷却し、反応液にTHF(テトラヒドロフラン)、イオン交換水、ヘキサンを順次加え、分液して、有機層を取り分けた。イオン交換水で洗浄し、無水硫酸マグネシウムで乾燥後減圧濃縮し、無色透明の中間体1を得た。
Example 6
<Example of synthesis of alkoxysilane compound>
A three-necked flask was charged with 4.69 g of tris (trimethylsiloxy) silanol and 21.0 g of THF and stirred. After cooling to −40 ° C., 9.38 mL of n-BuLi hexane solution (1.6 mol / L) was added dropwise. The temperature was raised to 0 ° C., 10.01 g of hexamethylcyclotrisiloxane dissolved in 21 g of THF was added dropwise, and the mixture was stirred for 17 hours. After cooling to −40 ° C., THF (tetrahydrofuran), ion-exchanged water, and hexane were sequentially added to the reaction solution, followed by liquid separation, and the organic layer was separated. The extract was washed with ion-exchanged water, dried over anhydrous magnesium sulfate and concentrated under reduced pressure to obtain colorless and transparent intermediate 1.
 中間体1を9.47g、オルトケイ酸テトラメチルを8.97g、t-ブチルアミン151.2uLを仕込み、撹拌しながら30℃で5時間反応を行った。12hPa、140℃で減圧濃縮し、下記のアルコキシシラン化合物を得た。 9.47 g of Intermediate 1, 8.97 g of tetramethyl orthosilicate and 151.2 uL of t-butylamine were charged and reacted at 30 ° C. for 5 hours with stirring. Concentration under reduced pressure at 12 hPa and 140 ° C. gave the following alkoxysilane compound.
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043
 上記アルコキシシラン化合物において、NMRスペクトルから算出した平均の繰り返し数nは9である。 In the above alkoxysilane compound, the average repeat number n calculated from the NMR spectrum is 9.
 有機ケイ素化合物(A2)として、上記式で表されるアルコキシシラン化合物を1.4×10-4mol、金属化合物(B)としてのオルトケイ酸テトラエチル1.4×10-3molを、イソプロピルアルコール6.7mlと1-ブタノール2.0mlの混合溶液に溶解させ、室温で20分撹拌した。得られた溶液に、触媒(E)としての塩酸(0.01mol/L水溶液)2.8mLを滴下した後、24時間撹拌した以外は、実施例1-1と同様にして皮膜を作製し、評価を行った。 As the organosilicon compound (A2), 1.4 × 10 −4 mol of the alkoxysilane compound represented by the above formula, and 1.4 × 10 −3 mol of tetraethyl orthosilicate as the metal compound (B) are mixed with isopropyl alcohol 6 It was dissolved in a mixed solution of 7 ml and 1-butanol 2.0 ml and stirred at room temperature for 20 minutes. A film was prepared in the same manner as in Example 1-1, except that 2.8 mL of hydrochloric acid (0.01 mol / L aqueous solution) as the catalyst (E) was added dropwise to the resulting solution and stirred for 24 hours. Evaluation was performed.
 比較例1
 有機ケイ素化合物(A)の代わりにメチルトリエトキシシラン3.59g、金属化合物(B)としてのオルトケイ酸テトラエチル(テトラエトキシシラン)10.92gを、エチレングリコールモノブチルエーテル5.03gに溶解させ、室温で20分攪拌した。得られた溶液に、触媒としての酢酸(0.5mol/L水溶液)を10.46g滴下した後、24時間攪拌して、塗布溶液aとした。この塗布溶液aを用いて、実施例1-1と同様にしてガラス基板に手塗りでコーティングし、1日室温で静置して皮膜を作製し、評価した。
Comparative Example 1
Instead of the organosilicon compound (A), 3.59 g of methyltriethoxysilane and 10.92 g of tetraethyl orthosilicate (tetraethoxysilane) as the metal compound (B) are dissolved in 5.03 g of ethylene glycol monobutyl ether, and at room temperature. Stir for 20 minutes. To the obtained solution, 10.46 g of acetic acid (0.5 mol / L aqueous solution) as a catalyst was dropped, and then stirred for 24 hours to obtain a coating solution a. Using this coating solution a, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
 比較例2
 有機ケイ素化合物(A)としてトリエトキシ-n-オクチルシラン(オクチルトリエトキシシラン)2.8g、金属化合物(B)としてのオルトケイ酸テトラメチル(テトラメトキシシラン)4.6gを、エタノール1.7gに溶解させ、室温で20分攪拌した。得られた溶液に、触媒としての塩酸(0.01mol/L水溶液)を0.28g滴下した後、24時間攪拌して、塗布溶液bとした。この塗布溶液bを用いて、実施例1-1と同様にしてガラス基板に手塗りでコーティングし、1日室温で静置して皮膜を作製し、評価した。
Comparative Example 2
2.8 g of triethoxy-n-octylsilane (octyltriethoxysilane) as the organosilicon compound (A) and 4.6 g of tetramethyl orthosilicate (tetramethoxysilane) as the metal compound (B) are dissolved in 1.7 g of ethanol. And stirred at room temperature for 20 minutes. To the obtained solution, 0.28 g of hydrochloric acid (0.01 mol / L aqueous solution) as a catalyst was dropped, and then stirred for 24 hours to obtain a coating solution b. Using this coating solution b, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
 比較例3-1
 有機ケイ素化合物(A)としてのトリエトキシ-n-オクチルシラン(オクチルトリエトキシシラン)2.2×10-4mol、金属化合物(B)としてのオルトケイ酸テトラエチル(テトラエトキシシラン)3.5×10-3molを、1-ブタノール1.9mlの混合溶液に溶解させ、室温で20分攪拌した。得られた溶液に、触媒としての塩酸(0.01mol/L水溶液)1.0ml滴下した後、24時間攪拌した。それ以外は実施例1-1と同様にして皮膜を作製し、評価を行った。
Comparative Example 3-1
Triethoxy-n-octylsilane (octyltriethoxysilane) 2.2 × 10 −4 mol as organosilicon compound (A), tetraethyl orthosilicate (tetraethoxysilane) 3.5 × 10 as metal compound (B) 3 mol was dissolved in a mixed solution of 1.9 ml of 1-butanol and stirred at room temperature for 20 minutes. To the obtained solution, 1.0 ml of hydrochloric acid (0.01 mol / L aqueous solution) as a catalyst was dropped, and then stirred for 24 hours. Otherwise, a film was prepared and evaluated in the same manner as in Example 1-1.
 比較例3-2
 有機ケイ素化合物(A)としてのトリエトキシ-n-オクチルシラン(オクチルトリエトキシシラン)2.2×10-4mol、金属化合物(B)としてのオルトケイ酸テトラエチル(テトラエトキシシラン)3.5×10-3molを、イソプロピルアルコール1.8mLと1-ブタノール0.095mLの混合溶液に溶解させ、室温で20分撹拌したこと以外は実施例1-1と同様にして皮膜を作製し、評価を行った。
Comparative Example 3-2
Triethoxy-n-octylsilane (octyltriethoxysilane) 2.2 × 10 −4 mol as the organosilicon compound (A), tetraethyl orthosilicate (tetraethoxysilane) 3.5 × 10 as the metal compound (B) A film was prepared and evaluated in the same manner as Example 1-1 except that 3 mol was dissolved in a mixed solution of 1.8 mL of isopropyl alcohol and 0.095 mL of 1-butanol and stirred at room temperature for 20 minutes. .
 比較例4-1
 有機ケイ素化合物(A)としてのトリエトキシ-n-オクチルシラン(オクチルトリエトキシシラン)2.2×10-4mol、金属化合物(B)としてのオルトケイ酸テトラエチル(テトラエトキシシラン)3.5×10-3molを、イソプロピルアルコール1.8mlとメチルエチルケトン0.095mlの混合溶液に溶解させ、室温で20分攪拌した。得られた溶液に、触媒としての塩酸(0.01mol/L水溶液)1.0ml滴下した後、24時間攪拌して、試料溶液を作製した。前記試料溶液をイソプロピルアルコールで7倍に希釈し、塗布溶液d-1を作製した。この塗布溶液d-1を用いて、実施例1-1と同様にしてガラス基板に手塗りでコーティングし、1日室温で静置して皮膜を作製し、評価した。
Comparative Example 4-1
Triethoxy-n-octylsilane (octyltriethoxysilane) 2.2 × 10 −4 mol as organosilicon compound (A), tetraethyl orthosilicate (tetraethoxysilane) 3.5 × 10 as metal compound (B) 3 mol was dissolved in a mixed solution of 1.8 ml of isopropyl alcohol and 0.095 ml of methyl ethyl ketone, and stirred at room temperature for 20 minutes. To the obtained solution, 1.0 ml of hydrochloric acid (0.01 mol / L aqueous solution) as a catalyst was dropped, and then stirred for 24 hours to prepare a sample solution. The sample solution was diluted 7-fold with isopropyl alcohol to prepare a coating solution d-1. Using this coating solution d-1, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
 比較例4-2
 メチルエチルケトンに代えてジメチルスルホキシドを0.095ml用いたこと以外は比較例4-1と同様にして塗布溶液d-2を作製した。この塗布溶液d-2を用いて、実施例1-1と同様にしてガラス基板に手塗りでコーティングし、1日室温で静置して皮膜を作製し、評価した。
Comparative Example 4-2
A coating solution d-2 was prepared in the same manner as in Comparative Example 4-1, except that 0.095 ml of dimethyl sulfoxide was used instead of methyl ethyl ketone. Using this coating solution d-2, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
 比較例5
 ジメチルスルホキシドに代えてn-オクタンを0.095ml用いたこと以外は比較例4-2と同様にして塗布溶液eを作製した。この塗布溶液eを用いて、実施例1-1と同様にしてガラス基板に手塗りでコーティングし、1日室温で静置して皮膜を作製し、評価した。
Comparative Example 5
A coating solution e was prepared in the same manner as in Comparative Example 4-2, except that 0.095 ml of n-octane was used instead of dimethyl sulfoxide. Using this coating solution e, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
 比較例6
 オクタンに代えてドデカンを用いたこと以外は比較例5と同様にして、塗布溶液fを作製した。この塗布溶液fを用いて、実施例1-1と同様にしてガラス基板に手塗りでコーティングし、1日室温で静置して皮膜を作製し、評価した。
Comparative Example 6
A coating solution f was prepared in the same manner as in Comparative Example 5 except that dodecane was used instead of octane. Using this coating solution f, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
 比較例7
 ドデカンに代えて1,2ジメトキシエタンを用いたこと以外は比較例6と同様にして、塗布溶液gを作製した。この塗布溶液gを用いて、実施例1-1と同様にしてガラス基板に手塗りでコーティングし、1日室温で静置して皮膜を作製し、評価した。
Comparative Example 7
A coating solution g was prepared in the same manner as in Comparative Example 6 except that 1,2 dimethoxyethane was used instead of dodecane. Using this coating solution g, a glass substrate was coated by hand in the same manner as in Example 1-1, and allowed to stand at room temperature for 1 day to produce a film and evaluated.
 結果を表7-1、7-2、8、9に示す。なお、表10には、各種溶媒の20℃での蒸気圧及び沸点を示した。 The results are shown in Tables 7-1, 7-2, 8, and 9. Table 10 shows the vapor pressure and boiling point of various solvents at 20 ° C.
Figure JPOXMLDOC01-appb-T000044
Figure JPOXMLDOC01-appb-T000044
Figure JPOXMLDOC01-appb-T000045
Figure JPOXMLDOC01-appb-T000045
Figure JPOXMLDOC01-appb-T000046
Figure JPOXMLDOC01-appb-T000046
Figure JPOXMLDOC01-appb-T000047
Figure JPOXMLDOC01-appb-T000047
Figure JPOXMLDOC01-appb-T000048
Figure JPOXMLDOC01-appb-T000048
 上記の結果から、本発明の組成物によれば、撥水・撥油性と耐摩耗性を両立する皮膜を、手塗りで綺麗に塗布できることがわかる。 From the above results, it can be seen that according to the composition of the present invention, a film having both water and oil repellency and wear resistance can be applied beautifully by hand coating.

Claims (7)

  1.  メチレン基の一部が酸素原子に置き換わっていてもよい炭素数6~20のアルキル基と、少なくとも1つの加水分解性基とがケイ素原子に結合している有機ケイ素化合物(A1)、または少なくとも1つのトリアルキルシリル基含有分子鎖と、少なくとも1つの加水分解性基とがケイ素原子に結合している有機ケイ素化合物(A2)を含み、
     さらに、少なくとも1つの加水分解性基が金属原子に結合しており、炭化水素鎖部分の最大鎖長が前記有機ケイ素化合物(A1)または(A2)の最大鎖長よりも短い炭化水素鎖含有基が前記金属原子に結合していてもよい金属化合物(B)と、
     20℃での蒸気圧が1000Pa以下であること及び沸点が120℃以上であることの少なくともいずれかを満たし、かつ溶解度パラメータが8.0(cal/cm31/2以上である高沸点溶媒(C)と、
     20℃での蒸気圧が1000Pa超であり且つ沸点が120℃未満である低沸点溶媒(D)とを含み、
     前記高沸点溶媒(C)の濃度が、組成物100質量部に対して、0.088質量部以上、1.74質量部未満である組成物。
    An organosilicon compound (A1) in which an alkyl group having 6 to 20 carbon atoms, in which a part of a methylene group may be replaced by an oxygen atom, and at least one hydrolyzable group are bonded to a silicon atom, or at least 1 An organosilicon compound (A2) in which two trialkylsilyl group-containing molecular chains and at least one hydrolyzable group are bonded to a silicon atom,
    Furthermore, at least one hydrolyzable group is bonded to a metal atom, and the hydrocarbon chain-containing group has a maximum chain length of the hydrocarbon chain portion shorter than the maximum chain length of the organosilicon compound (A1) or (A2). A metal compound (B) which may be bonded to the metal atom,
    A high-boiling solvent satisfying at least one of a vapor pressure at 20 ° C. of 1000 Pa or less and a boiling point of 120 ° C. or more and a solubility parameter of 8.0 (cal / cm 3 ) 1/2 or more (C) and
    A low boiling point solvent (D) having a vapor pressure at 20 ° C of more than 1000 Pa and a boiling point of less than 120 ° C,
    The composition whose density | concentration of the said high boiling point solvent (C) is 0.088 mass part or more and less than 1.74 mass part with respect to 100 mass parts of compositions.
  2.  前記有機ケイ素化合物(A1)又は(A2)に対する前記金属化合物(B)のモル比が2以上、48以下である請求項1に記載の組成物。 The composition according to claim 1, wherein the molar ratio of the metal compound (B) to the organosilicon compound (A1) or (A2) is 2 or more and 48 or less.
  3.  前記有機ケイ素化合物(A1)が、下記式(AI)で表される請求項1または2に記載の組成物。
    Figure JPOXMLDOC01-appb-C000001

    [前記式(AI)中、Ra1はメチレン基の一部が酸素原子に置き換わっていてもよい炭素数が6~20のアルキル基を表し、
     複数のAa1は、それぞれ独立に、加水分解性基を表す。
     Za1は、炭化水素鎖含有基、または、加水分解性基を表し、Za1が炭化水素鎖含有基の場合、Ra1とZa1とは同一であっても異なっていてもよく、Za1が加水分解性基の場合、Za1とAa1とは、同一であっても異なっていてもよい。また、複数の式(AI)間でRa1とZa1とは同一であっても異なっていてもよい。]
    The composition according to claim 1 or 2, wherein the organosilicon compound (A1) is represented by the following formula (AI).
    Figure JPOXMLDOC01-appb-C000001

    [In the formula (AI), R a1 represents an alkyl group having 6 to 20 carbon atoms in which part of the methylene group may be replaced by an oxygen atom,
    Several A <a1> represents a hydrolysable group each independently.
    Z a1 is a hydrocarbon chain-containing group, or represents a hydrolyzable group, and when Z a1 is a hydrocarbon chain containing groups may be the R a1 and Z a1 or different may be the same, Z a1 Is a hydrolyzable group, Z a1 and A a1 may be the same or different. In addition, R a1 and Z a1 may be the same or different among a plurality of formulas (AI). ]
  4.  前記有機ケイ素化合物(A2)が、下記式(AII)で表される請求項1~3のいずれかに記載の組成物。
    Figure JPOXMLDOC01-appb-C000002

    [式(AII)中、Ra2はトリアルキルシリル基含有分子鎖を表し、複数のAa2は、それぞれ独立に、加水分解性基を表す。Za2は、トリアルキルシリル基含有分子鎖、炭化水素鎖含有基、シロキサン骨格含有基又は加水分解性基を表す。]
    The composition according to any one of claims 1 to 3, wherein the organosilicon compound (A2) is represented by the following formula (AII).
    Figure JPOXMLDOC01-appb-C000002

    [In formula (AII), R a2 represents a trialkylsilyl group-containing molecular chain, and a plurality of A a2 each independently represents a hydrolyzable group. Z a2 represents a trialkylsilyl group-containing molecular chain, a hydrocarbon chain-containing group, a siloxane skeleton-containing group, or a hydrolyzable group. ]
  5.  前記金属化合物(B)が、下記式(BI)で表されるものである請求項1~4のいずれかに記載の組成物。
    Figure JPOXMLDOC01-appb-C000003

    [前記式(BI)中、
     Rb1は、炭化水素鎖部分の最大鎖長が前記炭素数6~20のアルキル基の最大鎖長よりも短い炭化水素鎖含有基または加水分解性基を表す。
     Ab1は、それぞれ独立に、加水分解性基を表す。
     Mは、Al、Fe、In、Ge、Hf、Si、Ti、Sn、Zr、またはTaを表す。
     mは、Mの価数に応じて、1~4の整数を表す。]
    The composition according to any one of claims 1 to 4, wherein the metal compound (B) is represented by the following formula (BI).
    Figure JPOXMLDOC01-appb-C000003

    [In the formula (BI),
    R b1 represents a hydrocarbon chain-containing group or hydrolyzable group in which the maximum chain length of the hydrocarbon chain portion is shorter than the maximum chain length of the alkyl group having 6 to 20 carbon atoms.
    A b1 independently represents a hydrolyzable group.
    M represents Al, Fe, In, Ge, Hf, Si, Ti, Sn, Zr, or Ta.
    m represents an integer of 1 to 4 depending on the valence of M. ]
  6.  前記式(BI)中、Rb1とAb1とが同一の基である請求項5に記載の組成物。 The composition according to claim 5, wherein in the formula (BI), R b1 and A b1 are the same group.
  7.  前記式(BI)中、MがSiである請求項5または6に記載の組成物。 The composition according to claim 5 or 6, wherein M is Si in the formula (BI).
PCT/JP2017/016586 2016-04-28 2017-04-26 Composition WO2017188329A1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111918927A (en) * 2018-03-30 2020-11-10 住友化学株式会社 Mixed composition

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6942314B2 (en) * 2017-07-27 2021-09-29 東レ・ファインケミカル株式会社 Method for Producing Silicone Polymer Composition
JP2019112539A (en) * 2017-12-25 2019-07-11 信越化学工業株式会社 Surface treatment agent composition
JP2019112540A (en) * 2017-12-25 2019-07-11 信越化学工業株式会社 Organosilicon compound and surface treatment agent composition
TW201942323A (en) 2018-03-30 2019-11-01 日商住友化學股份有限公司 Mixed composition
TWI767114B (en) 2018-03-30 2022-06-11 日商住友化學股份有限公司 mixed composition
JP2020164789A (en) * 2019-03-28 2020-10-08 住友化学株式会社 Composition and film
JP2020180274A (en) * 2019-04-23 2020-11-05 住友化学株式会社 Mixed composition
JP2020180275A (en) * 2019-04-23 2020-11-05 住友化学株式会社 Mixed composition
JP7446840B2 (en) * 2019-04-23 2024-03-11 住友化学株式会社 mixed composition
JP2020176247A (en) * 2019-04-23 2020-10-29 住友化学株式会社 Mixed composition
JP2021001312A (en) * 2019-06-19 2021-01-07 住友化学株式会社 Mixture composition, film, and vehicle glass
JP2021109966A (en) * 2020-01-10 2021-08-02 住友化学株式会社 Curable composition
JP2021152149A (en) * 2020-03-19 2021-09-30 住友化学株式会社 Mixed composition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06271679A (en) * 1993-03-22 1994-09-27 Shin Etsu Chem Co Ltd New fluorine containing titanosiloxane compound and cured film forming agent using the same
JP2002097192A (en) * 2000-09-19 2002-04-02 Asahi Glass Co Ltd Compound for surface treatment agent, surface treatment agent, functional glass and method for producing the same
JP2004107494A (en) * 2002-09-18 2004-04-08 National Institute For Materials Science Thermoplastic lamellar alkylsiloxane and its manufacturing process

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11217561A (en) * 1998-02-03 1999-08-10 Shin Etsu Chem Co Ltd Water repellent film-revivifying agent
US6824879B2 (en) * 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
JP3683524B2 (en) * 2001-03-14 2005-08-17 リンナイ株式会社 Crosslinked polysiloxane having fluoroalkyl group and method for producing the same
US6716534B2 (en) * 2001-11-08 2004-04-06 3M Innovative Properties Company Coating composition comprising a fluorochemical polyether silane partial condensate and use thereof
JP4343520B2 (en) * 2002-12-05 2009-10-14 日揮触媒化成株式会社 Coating liquid for forming transparent film, substrate with transparent film, and display device
JP2004269668A (en) * 2003-03-07 2004-09-30 Mitsubishi Rayon Co Ltd Silica-based composition, resin molding and method for producing the same
TWI388876B (en) * 2003-12-26 2013-03-11 Fujifilm Corp Antireflection film, polarizing plate, method for producing them, liquid crystal display element, liquid crystal display device, and image display device
US7351477B2 (en) * 2004-04-07 2008-04-01 Shin-Etsu Chemical Co., Ltd. Antifouling coating compositions and coated articles
JP2006083383A (en) * 2004-04-12 2006-03-30 Daikin Ind Ltd Stain resistant coating composition
CN1942545B (en) * 2004-04-12 2010-12-01 大金工业株式会社 Anti-fouling coating composition
JP2009040936A (en) 2007-08-10 2009-02-26 Soft99 Corporation Polishing composition for automobile
JP4847972B2 (en) 2008-01-25 2011-12-28 株式会社ソフト99コーポレーション Water repellent for glass
JP2010031188A (en) 2008-07-31 2010-02-12 Central Glass Co Ltd Hand-applicable application liquid for forming sol-gel film
CN102732149A (en) * 2011-04-01 2012-10-17 河南思可达光伏材料股份有限公司 Antifouling antireflection nano-paint, its preparation method and application
JP5950399B2 (en) * 2011-09-14 2016-07-13 国立研究開発法人産業技術総合研究所 Organic-inorganic transparent hybrid film and production method thereof
JP6346456B2 (en) * 2013-02-22 2018-06-20 国立研究開発法人産業技術総合研究所 Water / oil repellent coating and method for producing the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06271679A (en) * 1993-03-22 1994-09-27 Shin Etsu Chem Co Ltd New fluorine containing titanosiloxane compound and cured film forming agent using the same
JP2002097192A (en) * 2000-09-19 2002-04-02 Asahi Glass Co Ltd Compound for surface treatment agent, surface treatment agent, functional glass and method for producing the same
JP2004107494A (en) * 2002-09-18 2004-04-08 National Institute For Materials Science Thermoplastic lamellar alkylsiloxane and its manufacturing process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111918927A (en) * 2018-03-30 2020-11-10 住友化学株式会社 Mixed composition

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