WO2017110810A1 - Triazine ring-containing polymer and composition for film formation containing same - Google Patents

Abstract

A thin film having high refractive index and excellent weather resistance is able to be formed using this triazine ring-containing polymer which contains a repeating unit structure represented by formula (1). (In formula (1), each of R and R' independently represents a hydrogen atom, an alkyl group, an alkoxy group, an aryl group or an aralkyl group; and Ar represents at least one moiety selected from the group consisting of moieties represented by formula (2) or formula (3).) (In formula (2) and formula (3), each of W¹ and W² independently represents CR¹R² (wherein each of R¹ and R² independently represents a hydrogen atom or an alkyl group which has 1-10 carbon atoms and may be substituted by a halogen atom (provided that R¹ and R² may combine together to form a ring)), C=O, O, S, SO or SO₂.)

Description

Triazine ring-containing polymer and film-forming composition containing the same

The present invention relates to a triazine ring-containing polymer and a film-forming composition containing the same.

Until now, hyperbranched polymers containing triazine rings in repeating units can achieve high heat resistance, high transparency, high refractive index, high solubility, and low volume shrinkage by the polymer alone, and produce electronic devices and optical members. It has already been found that it is suitable as a material for forming a film at the time (Patent Document 1).

However, in an optical material provided with a thin film made of a composition containing the polymer, the deterioration of the thin film due to light (sunlight or ultraviolet light) may be a problem depending on the skeleton, and the light resistance is improved. It has been demanded.
As a means for enhancing the light resistance of a thin film containing a triazine ring-containing hyperbranched polymer, a technique of adding an ultraviolet absorber and a light stabilizer has been reported (Patent Document 2), although this technique can prevent a certain degree of deterioration. Changes in refractive index and transmittance are observed over time, and the effect is not sufficient.

In addition, it has been reported that by using a diamine raw material having an alicyclic structure, it is possible to impart high light resistance to the hyperbranched polymer itself (Patent Document 3). In addition, there is a trade-off relationship with the refractive index, and there is a need for improvement in terms of refractive index, and there is room for improvement in terms of heat-resistant yellowing resistance at high temperatures exceeding 200 ° C.

International Publication No. 2010/128661 International Publication No. 2015/093508 JP 2014-141596 A

The present invention has been made in view of the above circumstances, and an object thereof is to provide a triazine ring-containing polymer capable of forming a thin film having a high refractive index and excellent weather resistance, and a film-forming composition containing the same. To do.

As a result of intensive studies to achieve the above object, the present inventors have found that a triazine ring-containing polymer having a diamine-derived skeleton in which two or three benzene rings are bonded via a non-conjugated element is A cured film obtained from a composition containing the polymer and various crosslinking agents has been found to provide a light-reflective and heat-resistant yellow film while maintaining a high refractive index. The present invention was completed by finding that it is excellent in modification.

That is, the present invention
1. A triazine ring-containing polymer comprising a repeating unit structure represented by the following formula (1):

{In the formula, R and R 'each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and Ar is selected from the group represented by formulas (2) and (3) Represents at least one kind.

[Wherein, W ¹ and W ² are independently of each other CR ¹ R ² (R ¹ and R ² are independently of each other of 1 to 10 carbon atoms optionally substituted with a hydrogen atom or a halogen atom] Represents an alkyl group (in which they may be combined together to form a ring)), C═O, O, S, SO, or SO ₂ . ]
2. W ¹ and W ² are independently of each other CR ¹ R ² (R ¹ and R ² are independently of each other an alkyl group having 1 to 10 carbon atoms which may be substituted with a hydrogen atom or a halogen atom. Or 1 triazine ring-containing polymer representing O,
3. 1 or 2 triazine ring-containing polymer, wherein Ar is represented by formula (4),

4). 3 is a triazine ring-containing polymer represented by the formula (5),

5). 1 or 2 triazine ring-containing polymer, wherein Ar is represented by formula (6) or (7),

6). Wherein the Ar is a triazine ring-containing polymer represented by the formula (8) or (9):

7). A film-forming composition comprising the triazine ring-containing polymer of any one of 1 to 6 and an organic solvent;
8). Furthermore, the film forming composition of 7 containing a crosslinking agent,
9. 8. The film-forming composition according to 8, wherein the crosslinking agent is a polyfunctional (meth) acrylic compound,
10. A film obtained from the film-forming composition of any one of 7 to 9,
11. An electronic device comprising a substrate and ten films formed on the substrate;
12 An optical member comprising a base material and ten films formed on the base material is provided.

According to the triazine ring-containing polymer of the present invention, a thin film having a high refractive index and excellent light resistance can be formed.
Further, by combining this triazine ring-containing polymer with various crosslinking agents, a cured film excellent in light resistance and heat yellowing resistance can be produced while maintaining a high refractive index.
Since the thin film and cured film of the present invention can exhibit characteristics such as high light resistance, high heat resistance, high refractive index, and low volume shrinkage, liquid crystal displays, organic electroluminescence (EL) displays, touch panels, optical semiconductors (LEDs). Electronic devices and optics, such as devices, solid-state imaging devices, organic thin film solar cells, dye-sensitized solar cells, organic thin film transistors (TFTs), lenses, prisms, cameras, binoculars, microscopes, and semiconductor exposure devices It can be suitably used in the field of materials.

It is a ¹ H-NMR spectrum of the obtained polymer compound [3] in Example 1-1. 1 is a ¹ H-NMR spectrum diagram of a polymer compound [5] obtained in Example 1-2. FIG. 1 is a ¹ H-NMR spectrum diagram of a polymer compound [7] obtained in Example 1-3. FIG. It is a figure which shows the transmittance | permeability change before and behind the light resistance test of the film produced in Example 2-1. It is a figure which shows the transmittance | permeability change before and after the light resistance test of the film produced in Example 2-2. It is a figure which shows the transmittance | permeability change before and after the light resistance test of the film produced in Example 2-3. It is a figure which shows the transmittance | permeability change before and behind the light resistance test of the film produced in Comparative Example 2-1. It is a figure which shows the transmittance | permeability change before and after the light resistance test of the cured film produced in Example 4-1. It is a figure which shows the transmittance | permeability change before and after the light resistance test of the cured film produced in Example 4-2. It is a figure which shows the transmittance | permeability change before and after the light resistance test of the cured film produced in Comparative Example 4-1. It is a figure which shows the transmittance | permeability change before and behind the heat resistance test of the cured film produced in Example 4-1. It is a figure which shows the transmittance | permeability change before and behind the heat resistance test of the cured film produced in Example 4-2.

Hereinafter, the present invention will be described in more detail.
The triazine ring-containing polymer according to the present invention includes a repeating unit structure represented by the following formula (1).

In the above formula, R and R ′ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group. However, from the viewpoint of further increasing the refractive index, both of them may be hydrogen atoms. preferable.
In the present invention, the number of carbon atoms of the alkyl group is not particularly limited, but is preferably 1 to 20, and more preferably 1 to 10 carbon atoms in view of further improving the heat resistance of the polymer. Is even more preferable. Further, the structure may be any of a chain, a branch, and a ring.

Specific examples of the alkyl group include methyl, ethyl, n-propyl, isopropyl, cyclopropyl, n-butyl, isobutyl, s-butyl, t-butyl, cyclobutyl, 1-methyl-cyclopropyl, 2-methyl-cyclopropyl. N-pentyl, 1-methyl-n-butyl, 2-methyl-n-butyl, 3-methyl-n-butyl, 1,1-dimethyl-n-propyl, 1,2-dimethyl-n-propyl, 2 , 2-dimethyl-n-propyl, 1-ethyl-n-propyl, cyclopentyl, 1-methyl-cyclobutyl, 2-methyl-cyclobutyl, 3-methyl-cyclobutyl, 1,2-dimethyl-cyclopropyl, 2,3- Dimethyl-cyclopropyl, 1-ethyl-cyclopropyl, 2-ethyl-cyclopropyl, n-hexyl, 1-methyl-n-pe Til, 2-methyl-n-pentyl, 3-methyl-n-pentyl, 4-methyl-n-pentyl, 1,1-dimethyl-n-butyl, 1,2-dimethyl-n-butyl, 1,3- Dimethyl-n-butyl, 2,2-dimethyl-n-butyl, 2,3-dimethyl-n-butyl, 3,3-dimethyl-n-butyl, 1-ethyl-n-butyl, 2-ethyl-n- Butyl, 1,1,2-trimethyl-n-propyl, 1,2,2-trimethyl-n-propyl, 1-ethyl-1-methyl-n-propyl, 1-ethyl-2-methyl-n-propyl, Cyclohexyl, 1-methyl-cyclopentyl, 2-methyl-cyclopentyl, 3-methyl-cyclopentyl, 1-ethyl-cyclobutyl, 2-ethyl-cyclobutyl, 3-ethyl-cyclobutyl, 1,2-dimethyl-cyclyl Butyl, 1,3-dimethyl-cyclobutyl, 2,2-dimethyl-cyclobutyl, 2,3-dimethyl-cyclobutyl, 2,4-dimethyl-cyclobutyl, 3,3-dimethyl-cyclobutyl, 1-n-propyl-cyclopropyl 2-n-propyl-cyclopropyl, 1-isopropyl-cyclopropyl, 2-isopropyl-cyclopropyl, 1,2,2-trimethyl-cyclopropyl, 1,2,3-trimethyl-cyclopropyl, 2,2, 3-trimethyl-cyclopropyl, 1-ethyl-2-methyl-cyclopropyl, 2-ethyl-1-methyl-cyclopropyl, 2-ethyl-2-methyl-cyclopropyl, 2-ethyl-3-methyl-cyclopropyl Groups and the like.

The number of carbon atoms of the alkoxy group is not particularly limited, but is preferably 1 to 20, and more preferably 1 to 10 carbon atoms, more preferably 1 to 3 carbon atoms in view of further improving the heat resistance of the polymer. preferable. Further, the structure of the alkyl moiety may be any of a chain, a branch, and a ring.

Specific examples of the alkoxy group include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, s-butoxy, t-butoxy, n-pentoxy, 1-methyl-n-butoxy, 2-methyl-n -Butoxy, 3-methyl-n-butoxy, 1,1-dimethyl-n-propoxy, 1,2-dimethyl-n-propoxy, 2,2-dimethyl-n-propoxy, 1-ethyl-n-propoxy, n -Hexyloxy, 1-methyl-n-pentyloxy, 2-methyl-n-pentyloxy, 3-methyl-n-pentyloxy, 4-methyl-n-pentyloxy, 1,1-dimethyl-n-butoxy, 1,2-dimethyl-n-butoxy, 1,3-dimethyl-n-butoxy, 2,2-dimethyl-n-butoxy, 2,3-dimethyl-n-butoxy 3,3-dimethyl-n-butoxy, 1-ethyl-n-butoxy, 2-ethyl-n-butoxy, 1,1,2-trimethyl-n-propoxy, 1,2,2-trimethyl-n- Examples include propoxy, 1-ethyl-1-methyl-n-propoxy, 1-ethyl-2-methyl-n-propoxy group.

The number of carbon atoms of the aryl group is not particularly limited, but is preferably 6 to 40. In view of further improving the heat resistance of the polymer, 6 to 16 carbon atoms are more preferable, and 6 to 13 are even more preferable. preferable.
Specific examples of the aryl group include phenyl, o-chlorophenyl, m-chlorophenyl, p-chlorophenyl, o-fluorophenyl, p-fluorophenyl, o-methoxyphenyl, p-methoxyphenyl, p-nitrophenyl, p-cyanophenyl, α-naphthyl, β-naphthyl, o-biphenylyl, m-biphenylyl, p-biphenylyl, 1-anthryl, 2-anthryl, 9-anthryl, 1-phenanthryl, 2-phenanthryl, 3-phenanthryl, 4 -Phenanthryl, 9-phenanthryl group and the like.

The number of carbon atoms of the aralkyl group is not particularly limited, but preferably 7 to 20 carbon atoms, and the alkyl portion may be linear, branched or cyclic.
Specific examples thereof include benzyl, p-methylphenylmethyl, m-methylphenylmethyl, o-ethylphenylmethyl, m-ethylphenylmethyl, p-ethylphenylmethyl, 2-propylphenylmethyl, 4-isopropylphenylmethyl, Examples include 4-isobutylphenylmethyl, α-naphthylmethyl group and the like.

Ar represents at least one selected from the group represented by formulas (2) and (3).

W ¹ and W ² are independently of each other CR ¹ R ² (R ¹ and R ² are independently of each other an alkyl group having 1 to 10 carbon atoms which may be substituted with a hydrogen atom or a halogen atom. (However, these may be combined together to form a ring.)), C═O, O, S, SO, or SO ₂ , especially CR ¹ R ² (R ¹ And R ² each independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms which may be substituted with a halogen atom.), Or O is preferable.
Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a fluorine atom is preferable.
The alkyl group having 1 to 10 carbon atoms may be linear, branched, or cyclic. For example, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, s-butyl, t-butyl A linear or branched alkyl group having 1 to 10 carbon atoms such as n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl and n-decyl group; cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl A cycloalkyl group having 3 to 10 carbon atoms such as cycloheptyl, cyclooctyl, cyclononyl, cyclodecyl, bicyclobutyl, bicyclopentyl, bicyclohexyl, bicycloheptyl, bicyclooctyl, bicyclononyl, bicyclodecyl, etc. An alkyl group having 1 to 8 carbon atoms is preferable, and an alkyl group having 1 to 5 carbon atoms is preferable. Preferred.

Specific examples of the alkyl group substituted with a halogen atom include groups in which at least one hydrogen atom of an alkyl group having 1 to 10 carbon atoms is substituted with a halogen atom.
Specific examples thereof include fluoromethyl group, difluoromethyl group, trifluoromethyl group, pentafluoroethyl group, 2,2,2-trifluoroethyl group, heptafluoropropyl group, 2,2,3,3,3- Pentafluoropropyl group, 2,2,3,3-tetrafluoropropyl group, 2,2,2-trifluoro-1- (trifluoromethyl) ethyl group, nonafluorobutyl group, 4,4,4-trifluoro Butyl group, undecafluoropentyl group, 2,2,3,3,4,4,5,5,5-nonafluoropentyl group, 2,2,3,3,4,4,5,5-octafluoro Pentyl group, tridecafluorohexyl group, 2,2,3,3,4,4,5,5,6,6,6-undecafluorohexyl group, 2,2,3,3,4,4,4 5,5,6,6-Decafluo Hexyl group, 3,3,4,4,5,5,6,6,6-nonafluorohexyl group, and the like.

In particular, Ar is preferably at least one of formulas (4), (6) and (7), more preferably at least one of formulas (5), (8) and (9). It is not limited to these.

The weight average molecular weight of the polymer in the present invention is not particularly limited, but is preferably 500 to 500,000, more preferably 500 to 100,000, further improving heat resistance and reducing shrinkage. In view of the above, 2,000 or more is preferable, 50,000 or less is preferable, 30,000 or less is more preferable, 10,000 or less is more preferable in terms of further improving the solubility and decreasing the viscosity of the obtained solution. Even more preferred.
In addition, the weight average molecular weight in this invention is an average molecular weight obtained by standard polystyrene conversion by gel permeation chromatography (henceforth GPC) analysis.

The triazine ring-containing polymer (hyperbranched polymer) of the present invention can be produced according to the technique disclosed in Patent Document 1 described above.
For example, as shown in the following scheme 1, the triazine ring-containing polymer (12) can be obtained by reacting the triazine compound (10) and the aryldiamino compound (11) in an appropriate organic solvent.

(In formula, X represents a halogen atom mutually independently.)

In the above reaction, the charge ratio of the aryldiamino compound (11) is arbitrary as long as the target polymer is obtained, but 0.01 to 10 equivalents of the diamino compound (11) with respect to 1 equivalent of the triazine compound (10). 1 to 5 equivalents are more preferable.
The aryldiamino compound (11) may be added neat or in a solution dissolved in an organic solvent, but the latter method is preferred in view of ease of operation and ease of reaction control. .
The reaction temperature may be appropriately set in the range from the melting point of the solvent to be used to the boiling point of the solvent, but is preferably about −30 to 150 ° C., more preferably −10 to 100 ° C.

As the organic solvent, various solvents usually used in this kind of reaction can be used, for example, tetrahydrofuran, dioxane, dimethyl sulfoxide; N, N-dimethylformamide, N-methyl-2-pyrrolidone, tetramethylurea, Hexamethylphosphoramide, N, N-dimethylacetamide, N-methyl-2-piperidone, N, N-dimethylethyleneurea, N, N, N ′, N′-tetramethylmalonic acid amide, N-methylcaprolactam, N-acetylpyrrolidine, N, N-diethylacetamide, N-ethyl-2-pyrrolidone, N, N-dimethylpropionic acid amide, N, N-dimethylisobutyramide, N-methylformamide, N, N'-dimethylpropylene urea Amide solvents such as, and mixed solvents thereof
Among these, N, N-dimethylformamide, dimethyl sulfoxide, N-methyl-2-pyrrolidone, N, N-dimethylacetamide, and a mixed system thereof are preferable, and N, N-dimethylacetamide, N-methyl-2-pyrrolidone are particularly preferable. Is preferred.

In the reaction of Scheme 1 above, various bases usually used during polymerization or after polymerization may be added.
Specific examples of this base include potassium carbonate, potassium hydroxide, sodium carbonate, sodium hydroxide, sodium hydrogen carbonate, sodium ethoxide, sodium acetate, lithium carbonate, lithium hydroxide, lithium oxide, potassium acetate, magnesium oxide, oxidized Calcium, barium hydroxide, trilithium phosphate, trisodium phosphate, tripotassium phosphate, cesium fluoride, aluminum oxide, ammonia, n-propylamine, trimethylamine, triethylamine, diisopropylamine, diisopropylethylamine, N-methylpiperidine, Examples include 2,2,6,6-tetramethyl-N-methylpiperidine, pyridine, 4-dimethylaminopyridine, N-methylmorpholine and the like.
The amount of the base added is preferably 1 to 100 equivalents and more preferably 1 to 10 equivalents with respect to 1 equivalent of the triazine compound (10). These bases may be used as an aqueous solution.
Although it is preferable that the raw material component does not remain in the obtained polymer, a part of the raw material may remain as long as the effect of the present invention is not impaired.
After completion of the reaction, the product can be easily purified by a reprecipitation method or the like.

In the present invention, a part of halogen atoms of at least one terminal triazine ring is substituted with alkyl, aralkyl, aryl, alkylamino, alkoxysilyl group-containing alkylamino, aralkylamino, arylamino, alkoxy, aralkyloxy, aryloxy. , And may be capped with an ester group or the like.
Among these, alkylamino, alkoxysilyl group-containing alkylamino, aralkylamino, and arylamino groups are preferable, alkylamino and arylamino groups are more preferable, and arylamino groups are more preferable.
Examples of the alkyl group, alkoxy group, aryl group and aralkyl group are the same as those described above.

Specific examples of the ester group include methoxycarbonyl and ethoxycarbonyl groups.
Specific examples of the alkylamino group include methylamino, ethylamino, n-propylamino, isopropylamino, n-butylamino, isobutylamino, s-butylamino, t-butylamino, n-pentylamino, 1-methyl- n-butylamino, 2-methyl-n-butylamino, 3-methyl-n-butylamino, 1,1-dimethyl-n-propylamino, 1,2-dimethyl-n-propylamino, 2,2-dimethyl -N-propylamino, 1-ethyl-n-propylamino, n-hexylamino, 1-methyl-n-pentylamino, 2-methyl-n-pentylamino, 3-methyl-n-pentylamino, 4-methyl -N-pentylamino, 1,1-dimethyl-n-butylamino, 1,2-dimethyl-n-butylamino, 1,3-dimethyl n-butylamino, 2,2-dimethyl-n-butylamino, 2,3-dimethyl-n-butylamino, 3,3-dimethyl-n-butylamino, 1-ethyl-n-butylamino, 2-ethyl -N-butylamino, 1,1,2-trimethyl-n-propylamino, 1,2,2-trimethyl-n-propylamino, 1-ethyl-1-methyl-n-propylamino, 1-ethyl-2 -Methyl-n-propylamino group and the like.

Specific examples of the aralkylamino group include benzylamino, methoxycarbonylphenylmethylamino, ethoxycarbonylphenylmethylamino, p-methylphenylmethylamino, m-methylphenylmethylamino, o-ethylphenylmethylamino, m-ethylphenylmethyl. Amino, p-ethylphenylmethylamino, 2-propylphenylmethylamino, 4-isopropylphenylmethylamino, 4-isobutylphenylmethylamino, naphthylmethylamino, methoxycarbonylnaphthylmethylamino, ethoxycarbonylnaphthylmethylamino group, etc. .
Specific examples of the arylamino group include phenylamino, methoxycarbonylphenylamino, ethoxycarbonylphenylamino, naphthylamino, methoxycarbonylnaphthylamino, ethoxycarbonylnaphthylamino, anthranylamino, pyrenylamino, biphenylamino, terphenylamino, fluorenyl An amino group etc. are mentioned.

The alkoxysilyl group-containing alkylamino group may be any of monoalkoxysilyl group-containing alkylamino, dialkoxysilyl group-containing alkylamino, trialkoxysilyl group-containing alkylamino group, and specific examples thereof include 3-trimethoxysilyl. Propylamino, 3-triethoxysilylpropylamino, 3-dimethylethoxysilylpropylamino, 3-methyldiethoxysilylpropylamino, N- (2-aminoethyl) -3-dimethylmethoxysilylpropylamino, N- (2- Aminoethyl) -3-methyldimethoxysilylpropylamino, N- (2-aminoethyl) -3-trimethoxysilylpropylamino group and the like.

Specific examples of the aryloxy group include phenoxy, naphthoxy, anthranyloxy, pyrenyloxy, biphenyloxy, terphenyloxy, and fluorenyloxy groups.
Specific examples of the aralkyloxy group include benzyloxy, p-methylphenylmethyloxy, m-methylphenylmethyloxy, o-ethylphenylmethyloxy, m-ethylphenylmethyloxy, p-ethylphenylmethyloxy, 2-propyl Examples include phenylmethyloxy, 4-isopropylphenylmethyloxy, 4-isobutylphenylmethyloxy, α-naphthylmethyloxy groups and the like.

These groups can be easily introduced by substituting a halogen atom on the triazine ring with a compound that gives a corresponding substituent. For example, as shown in the following scheme 2, the reaction is carried out by adding an aniline derivative. By doing so, a hyperbranched polymer (13) having a phenylamino group at at least one terminal is obtained.

(In the formula, X and R represent the same meaning as described above.)

At this time, the organic monoamine is simultaneously charged, that is, by reacting the cyanuric halide compound with the diaminoaryl compound in the presence of the organic monoamine, the rigidity of the hyperbranched polymer is reduced, and the degree of branching is reduced. A low soft hyperbranched polymer can be obtained.
Here, as the organic monoamine, any of alkyl monoamine, aralkyl monoamine, and aryl monoamine can be used.

Alkyl monoamines include methylamine, ethylamine, n-propylamine, isopropylamine, n-butylamine, isobutylamine, s-butylamine, t-butylamine, n-pentylamine, 1-methyl-n-butylamine, 2-methyl- n-butylamine, 3-methyl-n-butylamine, 1,1-dimethyl-n-propylamine, 1,2-dimethyl-n-propylamine, 2,2-dimethyl-n-propylamine, 1-ethyl-n -Propylamine, n-hexylamine, 1-methyl-n-pentylamine, 2-methyl-n-pentylamine, 3-methyl-n-pentylamine, 4-methyl-n-pentylamine, 1,1-dimethyl -N-butylamine, 1,2-dimethyl-n-butylamine, 1,3-dimethyl-n Butylamine, 2,2-dimethyl-n-butylamine, 2,3-dimethyl-n-butylamine, 3,3-dimethyl-n-butylamine, 1-ethyl-n-butylamine, 2-ethyl-n-butylamine, 1, 1,2-trimethyl-n-propylamine, 1,2,2-trimethyl-n-propylamine, 1-ethyl-1-methyl-n-propylamine, 1-ethyl-2-methyl-n-propylamine, Examples include 2-ethylhexylamine.

Specific examples of aralkyl monoamines include benzylamine, p-methoxycarbonylbenzylamine, p-ethoxycarbonylbenzylamine, p-methylbenzylamine, m-methylbenzylamine, o-methoxybenzylamine and the like.
Specific examples of the aryl monoamine include aniline, p-methoxycarbonylaniline, p-ethoxycarbonylaniline, p-methoxyaniline, 1-naphthylamine, 2-naphthylamine, anthranylamine, 1-aminopyrene, 4-biphenylylamine, o- And phenylaniline, 4-amino-p-terphenyl, 2-aminofluorene, and the like.

In this case, the amount of the organic monoamine used is preferably 0.05 to 500 equivalents, more preferably 0.05 to 120 equivalents, and even more preferably 0.05 to 50 equivalents based on the halogenated cyanuric compound. .
The reaction temperature is preferably 60 to 150 ° C., more preferably 80 to 150 ° C., and still more preferably 80 to 120 ° C. from the viewpoint of suppressing linearity and increasing the degree of branching.
Moreover, you may perform reaction which makes a halogenated cyanuric compound and a diaminoaryl compound react with presence of such an organic monoamine using the organic solvent similar to the above-mentioned.

The above-mentioned triazine ring-containing polymer of the present invention can be suitably used as a film-forming composition alone or together with a crosslinking agent.
The crosslinking agent is not particularly limited as long as it is a compound having a substituent capable of reacting with the above-described triazine ring-containing polymer.
Examples of such compounds include melamine compounds having a crosslinkable substituent such as a methylol group and methoxymethyl group, substituted urea compounds, compounds containing a crosslinkable substituent such as an epoxy group or an oxetane group, and blocked isocyanates. A compound containing acid, a compound having an acid anhydride, a compound having a (meth) acryl group, a phenoplast compound, and the like, but from the viewpoint of heat resistance and storage stability, an epoxy group, a blocked isocyanate group, (meth) acrylic A compound containing a group is preferred, and in particular, a compound having a blocked isocyanate group, and a polyfunctional epoxy compound and / or a polyfunctional (meth) acrylic compound that gives a photocurable composition without using an initiator are preferred.
These compounds may have at least one crosslink forming substituent when used for polymer terminal treatment, and at least two crosslink forming substituents when used for cross-linking treatment between polymers. It is necessary to have.

The polyfunctional epoxy compound is not particularly limited as long as it has two or more epoxy groups in one molecule.
Specific examples include tris (2,3-epoxypropyl) isocyanurate, 1,4-butanediol diglycidyl ether, 1,2-epoxy-4- (epoxyethyl) cyclohexane, glycerol triglycidyl ether, diethylene glycol diglycidyl. Ether, 2,6-diglycidylphenyl glycidyl ether, 1,1,3-tris [p- (2,3-epoxypropoxy) phenyl] propane, 1,2-cyclohexanedicarboxylic acid diglycidyl ester, 4,4'- Methylenebis (N, N-diglycidylaniline), 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, trimethylolethane triglycidyl ether, bisphenol-A-diglycidyl ether, pentaerythris Ritol polyglycidyl ether and the like can be mentioned.

In addition, as commercially available products, epoxy resins having at least two epoxy groups, YH-434, YH434L (manufactured by Tohto Kasei Co., Ltd.), epoxy resins having a cyclohexene oxide structure, Epolide GT-401 and GT -403, GT-301, GT-302, Celoxide 2021, 3000 (manufactured by Daicel Chemical Industries, Ltd.), bisphenol A type epoxy resin, Epicoat (currently jER) 1001, 1002, 1003, 1004, 1007, 1009, 1010, 828 (Japan Epoxy Resin Co., Ltd.), Bisphenol F type epoxy resin, Epicoat (currently jER) 807 (Japan Epoxy Resin Co., Ltd.) , Epicoat (a phenol novolac type epoxy resin) , JER) 152, 154 (above, manufactured by Japan Epoxy Resins Co., Ltd.), EPPN 201, 202 (above, manufactured by Nippon Kayaku Co., Ltd.), cresol novolac type epoxy resin, EOCN-102, 103S, 104S, 1020, 1025, 1027 (Nippon Kayaku Co., Ltd.), Epicort (currently jER) 180S75 (Japan Epoxy Resin Co., Ltd.), Denacol EX, which is an alicyclic epoxy resin -252 (manufactured by Nagase ChemteX Corporation), CY175, CY177, CY179 (above, manufactured by CIBA-GEIGY A.G), Araldite CY-182, CY-192, CY-184 (above, CIBA-GEIGY A) G), Epicron 200, 400 (above DIC Corporation), Epicort (currently jER) 71, 872 (Japan Epoxy Resin Co., Ltd.), ED-5661, ED-5661 (Celanese Coating Co., Ltd.), aliphatic polyglycidyl ether, Denacol EX-611, EX -612, EX-614, EX-622, EX-411, EX-512, EX-522, EX-522, EX-421, EX-313, EX-314, EX-321 (Nagase Chem) Tex Co., Ltd.) can also be used.

The polyfunctional (meth) acrylic compound is not particularly limited as long as it has two or more (meth) acrylic groups in one molecule.
Specific examples include ethylene glycol diacrylate, ethylene glycol dimethacrylate, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, ethoxylated bisphenol A diacrylate, ethoxylated bisphenol A dimethacrylate, ethoxylated trimethylolpropane triacrylate, and ethoxylated. Trimethylolpropane trimethacrylate, ethoxylated glycerol triacrylate, ethoxylated glycerol trimethacrylate, ethoxylated pentaerythritol tetraacrylate, ethoxylated pentaerythritol tetramethacrylate, ethoxylated dipentaerythritol hexaacrylate, polyglycerol monoethylene oxide polyacrylate, polyglycerol Polyethylene Glycol polyacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, neopentyl glycol diacrylate, neopentyl glycol dimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, Examples include tricyclodecane dimethanol diacrylate, tricyclodecane dimethanol dimethacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, and polybasic acid-modified acrylic oligomers.

Polyfunctional (meth) acrylic compounds can be obtained as commercial products. Specific examples thereof include NK ester A-200, same A-400, same A-600, same A-1000, same A- 9300 (Tris (2-acryloyloxyethyl) isocyanurate), A-9300-1CL, A-TMPT, UA-53H, 1G, 2G, 3G, 4G, 9G, 14G, 23G, ABE-300, A-BPE-4, A-BPE-6, A-BPE-10, A-BPE-20, A-BPE-30, BPE-80N, BPE- 100N, BPE-200, BPE-500, BPE-900, BPE-1300N, A-GLY-3E, A-GLY-9E, A-GLY-20E, A-TMPT-3EO, AT PT-9EO, AT-20E, ATM-4E, ATM-35E, A-DPH, A-TMPT, A-DCP, A-HD-N, TMPT, DCP, NPG, HD-N, A-DPH-48E, A-DPH-96E, NK Oligo U-15HA, NK Polymer Vanaresin GH-1203 (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD (registered trademark) DPHA, NPGDA, PET30, DPEA-12, PEG400DA, THE-330, RP-1040, DN-0075 (Nippon Kayaku Co., Ltd.), Aronix M-210, M-303, M-305, same M-306, same M-309, same M-306, same M-310, same M-313, same M-315, same M-321, same M-350, same M-360, same M-400, M-402, M-403, M-404, M-405, M-406, M-408, M-450, M-450, M-452, M-460 (and above) Manufactured by Toagosei), DPGDA, HDDA, TPGDA, HPNDA, PETIA, PETRA, TMPTA, TMPEOTA, EBECRYL11, 40, 135, 140, 145, 150, 180, 1142, 204 205, 210, 215, 220, 230, 244, 245, 265, 270, 280 / 15IB, 284, 294 / 25HD, 303, 436, 438, 446, 450, 524, 525, 600, 605, 645, 648, 767, 770, 800, 810, 811, 8 2, 846, 851, 852, 853, 860, 884, 884, 885, 1259, 1290, 1606, 1830, 1870, 3500, 3603, 3608, 3700, 3701, 3702, 3703, 3708, 4820, 4858, 5129, 6040, 8210, 8454, 8301R, 8307, 8311, 8402, 8405, 8411, 8465 8701, 8800, 8804, 8807, 9270, 9227EA, 936, KRM8200, 8200AE, 7735, 8296, 08852, 8904, 8528, 8912, OTA480, IRR214-K 616, 679, 742, 793, PEG400 A-D (ACA) Z200M, the Z230AA, the Z250, said Z251, the Z300, said Z320, the Z254F (or, Daicel Orunekusu (manufactured by Corporation)) and the like.
The polybasic acid-modified acrylic oligomer is also available as a commercial product, and specific examples thereof include Aronix M-510,520 (manufactured by Toagosei Co., Ltd.).

The acid anhydride compound is not particularly limited as long as it is a carboxylic acid anhydride obtained by dehydration condensation of two molecules of carboxylic acid. Specific examples thereof include phthalic anhydride, tetrahydrophthalic anhydride, hexahydroanhydride. One in the molecule such as phthalic acid, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, nadic anhydride, methyl nadic anhydride, maleic anhydride, succinic anhydride, octyl succinic anhydride, dodecenyl succinic anhydride Having an acid anhydride group; 1,2,3,4-cyclobutanetetracarboxylic dianhydride, pyromellitic anhydride, 3,4-dicarboxy-1,2,3,4-tetrahydro-1-naphthalene Succinic dianhydride, bicyclo [3.3.0] octane-2,4,6,8-tetracarboxylic dianhydride, 5- (2,5- Oxotetrahydro-3-furanyl) -3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, 1,2,3,4-butanetetracarboxylic dianhydride, 3,3 ′, 4,4 ′ -Benzophenone tetracarboxylic dianhydride, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride, 1, Examples thereof include those having two acid anhydride groups in the molecule such as 3-dimethyl-1,2,3,4-cyclobutanetetracarboxylic dianhydride.

As a compound containing a blocked isocyanate, when the isocyanate group (—NCO) has two or more blocked isocyanate groups blocked by an appropriate protective group in one molecule, it is exposed to a high temperature during thermosetting. The protective group (block part) is not particularly limited as long as it is dissociated by thermal dissociation and the resulting isocyanate group causes a crosslinking reaction with the resin. For example, a group represented by the following formula Examples thereof include compounds having two or more in the molecule (note that these groups may be the same or different from each other).

(In the formula, R _b represents an organic group.)

Such a compound can be obtained, for example, by reacting an appropriate blocking agent with a compound having two or more isocyanate groups in one molecule.
Examples of the compound having two or more isocyanate groups in one molecule include polyisocyanates such as isophorone diisocyanate, 1,6-hexamethylene diisocyanate, methylene bis (4-cyclohexyl isocyanate), trimethylhexamethylene diisocyanate, and dimers thereof. Isomers, trimers, and reaction products of these with diols, triols, diamines, or triamines.
Examples of the blocking agent include alcohols such as methanol, ethanol, isopropanol, n-butanol, 2-ethoxyhexanol, 2-N, N-dimethylaminoethanol, 2-ethoxyethanol, cyclohexanol; phenol, o-nitrophenol , P-chlorophenol, phenols such as o-, m- or p-cresol; lactams such as ε-caprolactam, oximes such as acetone oxime, methyl ethyl ketone oxime, methyl isobutyl ketone oxime, cyclohexanone oxime, acetophenone oxime, benzophenone oxime And pyrazoles such as pyrazole, 3,5-dimethylpyrazole and 3-methylpyrazole; thiols such as dodecanethiol and benzenethiol.

A compound containing a blocked isocyanate is also available as a commercial product. Specific examples thereof include Takenate (registered trademark) B-830, B-815N, B-842N, B-870N, B-874N, B-882N, B-7005, B-7030, B-7075, B-5010 (Mitsui Chemicals Polyurethane Co., Ltd.), Duranate (registered trademark) 17B-60PX, TPA-B80E, MF-B60X, MF-K60X, E402-B80T (above, manufactured by Asahi Kasei Chemicals), Karenz MOI-BM (registered trademark) (above, made by Showa Denko), TRIXENE BI7950, 7951, 7960, 7961 7982, 7990, 7991, 7992 (registered trademark) (above, Baxenden Che ical Co., Ltd.) made, and the like.

The aminoplast compound is not particularly limited as long as it has two or more methoxymethylene groups in one molecule. For example, hexamethoxymethylmelamine CYMEL (registered trademark) 303, tetrabutoxymethylglycoluril 1170 Cymel series such as Tetramethoxymethylbenzoguanamine 1123 (manufactured by Ornex Co., Ltd.), etc., Nicalac (registered trademark) MW-30HM, MW-390, MW-100LM, MX- Melamine compounds such as 750LM, Nicarac series such as MX-270, which is a methylated urea resin, MX-280, MX-280, MX-290 (manufactured by Sanwa Chemical Co., Ltd.).
The oxetane compound is not particularly limited as long as it has two or more oxetanyl groups in one molecule. For example, Alonoxetane (registered trademark) OXT-221, OX-SQ-H containing an oxetanyl group OX-SC (manufactured by Toa Gosei Co., Ltd.) and the like.

The phenoplast compound has two or more hydroxymethylene groups in one molecule and undergoes a crosslinking reaction by a dehydration condensation reaction with the polymer of the present invention when exposed to a high temperature during thermosetting. It is.
Examples of the phenoplast compound include 2,6-dihydroxymethyl-4-methylphenol, 2,4-dihydroxymethyl-6-methylphenol, bis (2-hydroxy-3-hydroxymethyl-5-methylphenyl) methane, Bis (4-hydroxy-3-hydroxymethyl-5-methylphenyl) methane, 2,2-bis (4-hydroxy-3,5-dihydroxymethylphenyl) propane, bis (3-formyl-4-hydroxyphenyl) methane Bis (4-hydroxy-2,5-dimethylphenyl) formylmethane, α, α-bis (4-hydroxy-2,5-dimethylphenyl) -4-formyltoluene and the like.
The phenoplast compound is also available as a commercial product, and specific examples thereof include 26DMPC, 46DMOC, DM-BIPC-F, DM-BIOC-F, TM-BIP-A, BISA-F, BI25X-DF. BI25X-TPA (above, manufactured by Asahi Organic Materials Co., Ltd.).

In addition, when a thin film made of the triazine ring-containing polymer of the present invention is laminated on a protective film such as PET or polyolefin film and irradiated with light through the protective film, the thin film laminated film can be cured well without being inhibited by oxygen. Sex can be obtained. In this case, since the protective film needs to be peeled after curing, it is preferable to use a polybasic acid-modified acrylic oligomer that gives a thin film with good peelability.

The above-mentioned cross-linking agents may be used alone or in combination of two or more. The amount of the crosslinking agent used is preferably 1 to 100 parts by mass with respect to 100 parts by mass of the triazine ring-containing polymer, but considering the solvent resistance, the lower limit is preferably 2 parts by mass, more preferably 5 parts by mass. Furthermore, in consideration of controlling the refractive index, the upper limit is preferably 20 parts by mass, more preferably 15 parts by mass.

In the composition of the present invention, an initiator corresponding to each crosslinking agent can be blended. As described above, when a polyfunctional epoxy compound and / or polyfunctional (meth) acrylic compound is used as a crosslinking agent, photocuring proceeds without using an initiator to give a cured film. In some cases, an initiator may be used.

When a polyfunctional epoxy compound is used as a crosslinking agent, a photoacid generator or a photobase generator can be used.
The photoacid generator may be appropriately selected from known ones. For example, onium salt derivatives such as diazonium salts, sulfonium salts, and iodonium salts can be used.
Specific examples thereof include aryldiazonium salts such as phenyldiazonium hexafluorophosphate, 4-methoxyphenyldiazonium hexafluoroantimonate, 4-methylphenyldiazonium hexafluorophosphate; diphenyliodonium hexafluoroantimonate, di (4-methylphenyl) Diaryliodonium salts such as iodonium hexafluorophosphate and di (4-tert-butylphenyl) iodonium hexafluorophosphate; triphenylsulfonium hexafluoroantimonate, tris (4-methoxyphenyl) sulfonium hexafluorophosphate, diphenyl-4-thiophenoxy Phenylsulfonium hexafluoroantimonate, diphenyl-4-thiophenoxy Enylsulfonium hexafluorophosphate, 4,4′-bis (diphenylsulfonio) phenyl sulfide-bishexafluoroantimonate, 4,4′-bis (diphenylsulfonio) phenyl sulfide-bishexafluorophosphate, 4,4 '-Bis [di (β-hydroxyethoxy) phenylsulfonio] phenylsulfide-bishexafluoroantimonate, 4,4'-bis [di (β-hydroxyethoxy) phenylsulfonio] phenylsulfide-bis-hexafluorophosphate 4- [4 '-(benzoyl) phenylthio] phenyl-di (4-fluorophenyl) sulfonium hexafluoroantimonate, 4- [4'-(benzoyl) phenylthio] phenyl-di (4-fluorophenyl) sulfur Triarylsulfonium salts such as triphenylsulfonium hexafluorophosphate and the like.

Commercially available products of these onium salts may be used. Specific examples thereof include Sun Aid (registered trademark) SI-60, SI-80, SI-100, SI-60L, SI-80L, SI-100L, SI- L145, SI-L150, SI-L160, SI-L110, SI-L147 (above, manufactured by Sanshin Chemical Industry Co., Ltd.), UVI-6950, UVI-6970, UVI-6974, UVI-6990, UVI-6990 ( As described above, Union Carbide), CPI (registered trademark) -100P, CPI-100A, CPI-200K, CPI-200S (above, manufactured by San Apro Co., Ltd.), Adeka Optomer SP-150, SP-151, SP- 170, SP-171 (manufactured by ADEKA Corporation), Irgacure (registered trademark) 261 (manufactured by BASF), CI 2481, CI-2624, CI-2639, CI-2064 (above, manufactured by Nippon Soda Co., Ltd.), CD-1010, CD-1011, CD-1012 (above, made by Sartomer), DS-100, DS-101 , DAM-101, DAM-102, DAM-105, DAM-201, DSM-301, NAI-100, NAI-101, NAI-105, NAI-106, SI-100, SI-101, SI-105, SI -106, PI-105, NDI-105, BENZOIN TOSYLATE, MBZ-101, MBZ-301, PYR-100, PYR-200, DNB-101, NB-101, NB-201, BBI-101, BBI-102, BBI-103, BBI-109 (above, manufactured by Midori Chemical Co., Ltd.), PCI-061T PCI-062T, PCI-020T, PCI-022T (manufactured by Nippon Kayaku (Ltd.)), IBPF, mention may be made of IBCF (Sanwa Chemical Co., Ltd.), and the like.

On the other hand, the photobase generator may be appropriately selected from known ones, such as Co-amine complex, oxime carboxylic acid ester, carbamic acid ester, quaternary ammonium salt photobase generator. Can be used.
Specific examples thereof include 2-nitrobenzylcyclohexylcarbamate, triphenylmethanol, O-carbamoylhydroxylamide, O-carbamoyloxime, [[(2,6-dinitrobenzyl) oxy] carbonyl] cyclohexylamine, bis [[(2 -Nitrobenzyl) oxy] carbonyl] hexane 1,6-diamine, 4- (methylthiobenzoyl) -1-methyl-1-morpholinoethane, (4-morpholinobenzoyl) -1-benzyl-1-dimethylaminopropane, N- (2-nitrobenzyloxycarbonyl) pyrrolidine, hexaamminecobalt (III) tris (triphenylmethylborate), 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2,6-dimethyl- 3,5-di Cetyl-4- (2′-nitrophenyl) -1,4-dihydropyridine, 2,6-dimethyl-3,5-diacetyl-4- (2 ′, 4′-dinitrophenyl) -1,4-dihydropyridine and the like Can be mentioned.
Commercially available photobase generators may be used, and specific examples thereof include TPS-OH, NBC-101, ANC-101 (all of which are product names, manufactured by Midori Chemical Co., Ltd.).

When a photoacid or base generator is used, it is preferably used in the range of 0.1 to 15 parts by mass, more preferably in the range of 1 to 10 parts by mass with respect to 100 parts by mass of the polyfunctional epoxy compound.
If necessary, an epoxy resin curing agent may be blended in an amount of 1 to 100 parts by mass with respect to 100 parts by mass of the polyfunctional epoxy compound.

On the other hand, when a polyfunctional (meth) acrylic compound is used, a radical photopolymerization initiator can be used.
The radical photopolymerization initiator may be appropriately selected from known ones, such as acetophenones, benzophenones, Michler's benzoylbenzoate, amyloxime esters, oxime esters, tetramethylthiuram monosulfide, and thioxanthones. Is mentioned.
In particular, photocleavable photoradical polymerization initiators are preferred. The photocleavable photoradical polymerization initiator is described in the latest UV curing technology (p. 159, publisher: Kazuhiro Takahisa, publisher: Technical Information Association, Inc., published in 1991).
Examples of commercially available radical photopolymerization initiators include Irgacure (registered trademark) 127, 184, 369, 379, 379EG, 651, 500, 754, 819, 903, 907, 784, 1173, 2959, CGI 1700, CGI 1750, CGI 1850. , CG24-61, OXE01, OXE02, Darocur (registered trademark) 1116, 1173, MBF, Lucyrin TPO (above, manufactured by BASF), Ubekrill (registered trademark) P36 (manufactured by Cytec Surface Specialties), ESACURE (registered trademark) KIP150, KIP65LT, KIP100F, KT37, KT55, KTO46, KIP75 / B (the Lamberti company make) etc. are mentioned.
When using a radical photopolymerization initiator, it is preferably used in the range of 0.1 to 200 parts by weight, preferably in the range of 1 to 150 parts by weight, with respect to 100 parts by weight of the polyfunctional (meth) acrylate compound. Is more preferable.

It is preferable that various solvents are added to the composition of the present invention to dissolve the triazine ring-containing polymer.
Examples of the solvent include water, toluene, p-xylene, o-xylene, m-xylene, ethylbenzene, styrene, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, ethylene glycol monomethyl ether, propylene glycol, propylene glycol monoethyl ether, ethylene Glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol methyl ether acetate, propylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, diethylene glycol dimethyl ether, propylene glycol monobutyl ether, ethylene glycol monobutyl ether, diethylene glycol diethyl ether, dipropylene Recall monomethyl ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, diethylene glycol monoethyl ether, triethylene glycol dimethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol, 1-octanol, ethylene glycol, hexylene glycol, trimethylene glycol, 1- Methoxy-2-butanol, cyclohexanol, diacetone alcohol, furfuryl alcohol, tetrahydrofurfuryl alcohol, propylene glycol, benzyl alcohol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, γ -Butyrolactone, acetone, methyl ethyl ketone, methyl isopropyl ketone, di Ethyl ketone, methyl isobutyl ketone, methyl normal butyl ketone, cyclopentanone, cyclohexanone, ethyl acetate, isopropyl acetate, normal propyl acetate, isobutyl acetate, normal butyl acetate, ethyl lactate, methanol, ethanol, isopropanol, tert-butanol, allyl alcohol, Normal propanol, 2-methyl-2-butanol, isobutanol, normal butanol, 2-methyl-1-butanol, 1-pentanol, 2-methyl-1-pentanol, 2-ethylhexanol, 1-methoxy-2- Propanol, tetrahydrofuran, 1,4-dioxane, N, N-dimethylformamide, N, N-dimethylacetamide (DMAc), N-methylpyrrolidone, 1,3-dimethyl-2-imidazo Jin Won, dimethyl sulfoxide, N- cyclohexyl-2-pyrrolidinone and the like. These may be used singly or may be used in combination of two or more.

At this time, the solid content concentration in the composition is not particularly limited as long as it does not affect the storage stability, and may be appropriately set according to the target film thickness. Specifically, from the viewpoint of solubility and storage stability, the solid content concentration is preferably 0.1 to 50% by mass, and more preferably 0.1 to 40% by mass.

As long as the effects of the present invention are not impaired, the composition of the present invention includes other components other than the triazine ring-containing polymer, the crosslinking agent and the solvent, for example, a leveling agent, a surfactant, a silane coupling agent, an antioxidant. Additives such as additives, rust inhibitors, mold release agents, plasticizers, antifoaming agents, thickeners, dispersants, antistatic agents, antisettling agents, pigments, dyes, UV absorbers, light stabilizers, inorganic fine particles May be included.
Examples of the surfactant include polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene cetyl ether, polyoxyethylene oleyl ether; polyoxyethylene octylphenol ether, polyoxyethylene nonylphenol Polyoxyethylene alkyl allyl ethers such as ethers; polyoxyethylene / polyoxypropylene block copolymers; sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan monooleate, sorbitan trioleate, sorbitan tristearate Sorbitan fatty acid esters such as polyoxyethylene sorbitan monolaurate, polyoxyethyleneso Nonionic surfactants such as polyoxyethylene sorbitan fatty acid esters such as bitane monopalmitate, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan trioleate, polyoxyethylene sorbitan tristearate, trade name EFTOP EF301, EF303, EF352 (Mitsubishi Materials Electronics Chemicals Co., Ltd. (formerly Gemco Co., Ltd.)), Megafuck F171, F173, R-08, R-30, R-40, R-41, F-114, F- 410, F-430, F-444, F-477, F-552, F-553, F-554, F-555, F-556, F-557, F-558, F-559, F-561, F-562, RS-75, RS-72-K, RS-76-E, RS-76NS, RS-77 ( IC), Fluorad FC430, FC431 (Sumitomo 3M), Asahi Guard AG710, Surflon S-382, SC101, SC102, SC103, SC104, SC105, SC106 (Asahi Glass Co., Ltd.) Surfactant, organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-302, BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-370, BYK-375 BYK-378 (manufactured by Big Chemie Japan Co., Ltd.).

These surfactants may be used alone or in combination of two or more. The amount of the surfactant used is preferably 0.0001 to 5 parts by mass, more preferably 0.001 to 1 part by mass, and 0.01 to 0.5 parts by mass with respect to 100 parts by mass of the triazine ring-containing polymer. Even more preferred.

Examples of the inorganic fine particles include Be, Al, Si, Ti, V, Fe, Cu, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Ta, W, Pb, Bi, and Ce. Examples thereof include oxides, sulfides and nitrides of one or more kinds of metals selected, and these metal oxides are particularly preferable. The inorganic fine particles may be used alone or in combination of two or more.
Specific examples of the metal oxide include Al ₂ O ₃ , ZnO, TiO ₂ , ZrO ₂ , Fe ₂ O ₃ , Sb ₂ O ₅ , BeO, ZnO, SnO ₂ , CeO ₂ , SiO ₂ and WO _3. It is done.
It is also effective to use a plurality of metal oxides as a composite oxide. The composite oxide is a mixture of two or more inorganic oxides in the production stage of fine particles. Examples thereof include TiO ₂ and ZrO ₂ , TiO ₂ , ZrO ₂ and SnO ₂ , and complex oxides of ZrO ₂ and SnO ₂ .
Furthermore, the compound of the said metal may be sufficient. For example, ZnSb ₂ O ₆ , BaTiO ₃ , SrTiO ₃ , SrSnO _{3 and the} like can be mentioned. These compounds can be used alone or in admixture of two or more, and may also be used in admixture with the above oxides.
In addition, the said other component can be added at the arbitrary processes at the time of preparing the composition of this invention.

The film-forming composition of the present invention can be applied to a substrate, then heated as necessary to evaporate the solvent, and then heated or irradiated with light to form a desired cured film.
The coating method of the composition is arbitrary, for example, spin coating method, dip method, flow coating method, ink jet method, jet dispenser method, spray method, bar coating method, gravure coating method, slit coating method, roll coating method, transfer Methods such as printing, brush coating, blade coating, and air knife coating can be employed.

In addition, as a base material, silicon, glass on which indium tin oxide (ITO) is formed, glass on which indium zinc oxide (IZO) is formed, polyethylene terephthalate (PET), plastic, glass, quartz, ceramics A flexible substrate having flexibility can be used.
The firing temperature is not particularly limited for the purpose of evaporating the solvent, and can be carried out at 110 to 400 ° C., for example.
The baking method is not particularly limited, and for example, it may be evaporated using a hot plate or an oven in an appropriate atmosphere such as air, an inert gas such as nitrogen, or in a vacuum.
The firing temperature and firing time may be selected in accordance with the process steps of the target electronic device, and the firing conditions may be selected so that the physical properties of the obtained film meet the required characteristics of the electronic device.
The conditions for the light irradiation are not particularly limited, and an appropriate irradiation energy and time may be adopted depending on the triazine ring-containing polymer and the crosslinking agent to be used.

Since the thin film and cured film of the present invention obtained as described above can achieve high heat resistance, high refractive index, and low volume shrinkage, liquid crystal displays, organic electroluminescence (EL) displays, touch panels, optical semiconductors ( LED devices, solid-state imaging devices, organic thin-film solar cells, dye-sensitized solar cells, organic thin-film transistors (TFTs), lenses, prism cameras, binoculars, microscopes, and parts for manufacturing semiconductor exposure devices, electronic devices, It can be suitably used in the field of optical materials.
In particular, a thin film or a cured film prepared from the composition of the present invention has high transparency and a high refractive index, and therefore, when used as a protective film for a transparent conductive film such as ITO or silver nanowire, the visibility is reduced. While improving, it can suppress degradation of a transparent conductive film.
As the transparent conductive film, a transparent conductive film having a conductive nanostructure such as an ITO film, an IZO film, a metal nanoparticle, a metal nanowire, or a metal nanomesh is preferable, and a transparent conductive film having a conductive nanostructure is more preferable. Although the metal which comprises electroconductive nanostructure is not specifically limited, Silver, gold | metal | money, copper, nickel, platinum, cobalt, iron, zinc, ruthenium, rhodium, palladium, cadmium, osmium, iridium, these alloys etc. are mentioned. That is, a transparent conductive film having silver nanoparticles, silver nanowires, silver nanomesh, gold nanoparticles, gold nanowires, gold nanomesh, copper nanoparticles, copper nanowires, copper nanomesh, etc. is preferred, and transparent conductive materials having silver nanowires in particular. A membrane is preferred.

EXAMPLES Hereinafter, although an Example and a comparative example are given and this invention is demonstrated more concretely, this invention is not limited to the following Example. In addition, each measuring apparatus used in the Example is as follows.
[ ¹ H-NMR]
Device: BRUKER AVANCE III HD (500 MHz)
Measuring solvent: DMSO-d6
Reference substance: Tetramethylsilane (TMS) (δ0.0ppm)
[GPC]
Equipment: HLC-8200 GPC manufactured by Tosoh Corporation
Column: Shodex KF-804L + KF-805L
Column temperature: 40 ° C
Solvent: N, N-dimethylformamide (hereinafter DMF)
Detector: UV (254 nm)
Calibration curve: Standard polystyrene [Ellipsometer]
Apparatus: Multi-angle-of-incidence spectroscopic ellipsometer VASE manufactured by JA Woollam Japan
[Differential thermal balance (TG-DTA)]
Equipment: TG-8120, manufactured by Rigaku Corporation
Temperature increase rate: 10 ° C / min Measurement temperature: 25 ° C-750 ° C
[Light resistance tester]
Equipment: Q-LAB Xenon Weather Resistance Tester Q-SUN Xe-1-BC
Optical filter: Window Glass-Q
Illuminance: 0.50 W / cm ² (λ = 340 nm)
Black panel temperature: 40 ° C
[Ultraviolet-visible spectrophotometer]
Apparatus: UV-Vis Near-Infrared Spectrophotometer UV-3600 manufactured by Shimadzu Corporation

[1] Synthesis of triazine ring-containing hyperbranched polymer [Example 1-1] Synthesis of polymer compound [3]

Under nitrogen, m-phenylenediamine [2] (7.35 g, 0.022 mol, manufactured by Tokyo Chemical Industry Co., Ltd.) was added to a 100 mL four-necked flask and 28.26 g of N, N-dimethylacetamide (DMAc, Junsei Chemical). (Made by Co., Ltd.). Thereafter, the mixture is cooled to −10 ° C. with an ethanol-dry ice bath, and 2,4,6-trichloro-1,3,5-triazine [1] (3.69 g, 0.02 mol, manufactured by Eponic Degussa) is heated to a bath temperature. It was charged while confirming that the temperature would not exceed 0 ° C. After stirring for 1 hour, the reaction solution was added dropwise with 28.16 g of DMAc in advance and purged with nitrogen, and then dropped into a 200 mL four-necked flask set at 85 ° C. with an oil bath. After stirring for 2 hours, aniline (2.79 g, 0.03 mol, manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise and stirred for 3 hours. Thereafter, the temperature was lowered to room temperature, n-propylamine (2.73 g, manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise, and after stirring for 1 hour, stirring was stopped. The reaction solution was added dropwise to ion-exchanged water (375 g) for reprecipitation. The precipitate was filtered and redissolved in THF (53.85 g). After stirring for 1 hour, the supernatant was removed, and the solution was dropped into ion-exchanged water (431 g) and reprecipitated again. The resulting precipitate was filtered and dried at 120 ° C. for 6 hours in a vacuum dryer to obtain 11.0 g of the target polymer compound [3] (hereinafter referred to as HB-TBAFA). The measurement result of ¹ H-NMR spectrum of HB-TBAFA is shown in FIG.
The weight average molecular weight Mw measured in terms of polystyrene by GPC of HB-TBAFA was 23,000, and the polydispersity Mw / Mn was 34.8.
When 5 mg of the obtained HB-TBAFA was added to a platinum pan and measured at a heating rate of 10 ° C./min by TG-DTA measurement, the 5% weight loss was 466.9 ° C.

[Example 1-2] Synthesis of polymer compound [5]

Under nitrogen, 1,3-bis (3-aminophenoxy) benzene [4] (12.86 g, 0.044 mol, manufactured by Mitsui Chemicals, Inc.) was added to a 100 mL four-necked flask, and DMAc 51.61 g (Pure Chemical ( (Made by Co., Ltd.). Thereafter, the solution is cooled to −10 ° C. with an ethanol-dry ice bath, and 2,4,6-trichloro-1,3,5-triazine [1] (7.38 g, 0.04 mol, manufactured by Eponic Degussa) is heated to a bath temperature. It was charged while confirming that the temperature would not exceed 0 ° C. After stirring for 1 hour, the reaction solution was added dropwise with 51.61 g of DMAc in advance and purged with nitrogen, and then dropped into a 200 mL four-necked flask set at 85 ° C. with an oil bath. After stirring for 2 hours, aniline (11.18 g, 0.12 mol, manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise and stirred for 3 hours. Thereafter, the temperature was lowered to room temperature, n-propylamine (5.46 g, manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise, and after stirring for 1 hour, stirring was stopped. The reaction solution was added dropwise to ion exchange water (688 g) for reprecipitation. The precipitate was filtered and redissolved in THF (94.24 g). After stirring for 1 hour, the supernatant was removed, the concentration of the solution was adjusted with THF, then dropped into ion-exchanged water (754 g), and reprecipitated again. The resulting precipitate was filtered and dried in a vacuum dryer at 120 ° C. for 6 hours to obtain 13.2 g of the intended polymer compound [5] (hereinafter referred to as HB-TAPBA). The measurement result of ¹ H-NMR spectrum of HB-TAPBA is shown in FIG.
The weight average molecular weight Mw measured in terms of polystyrene by GPC of HB-TAPBA was 29,600, and the polydispersity Mw / Mn was 25.3. When 5 mg of the obtained HB-TAPBA was added to a platinum pan and measured by a TG-DTA measurement at a heating rate of 10 ° C./min, the 5% weight loss was 450.9 ° C.

[Example 1-3] Synthesis of polymer compound [7]

Under nitrogen, bisaniline-M [6] (7.58 g, 0.022 mol, manufactured by Mitsui Fine Chemical Co., Ltd.) was added to a 100 mL four-necked flask, and dissolved in DMAc 28.73 g (manufactured by Junsei Chemical Co., Ltd.). . Thereafter, the mixture is cooled to −10 ° C. with an ethanol-dry ice bath, and 2,4,6-trichloro-1,3,5-triazine [1] (3.69 g, 0.02 mol, manufactured by Eponic Degussa) is heated to a bath temperature. It was charged while confirming that the temperature would not exceed 0 ° C. After stirring for 1 hour, the reaction solution was added dropwise with 28.73 g of DMAc in advance and purged with nitrogen. After stirring for 2 hours, aniline (5.59 g, 0.06 mol, manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise and stirred for 3 hours. Thereafter, the temperature was lowered to room temperature, n-propylamine (2.73 g, manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise, and after stirring for 1 hour, stirring was stopped. The reaction solution was dropped into ion-exchanged water (383 g) for reprecipitation. The precipitate was filtered and redissolved in THF (50.56 g). After stirring for 1 hour, the supernatant was removed, and the solution was dropped into ion-exchanged water (405 g) and reprecipitated again. The resulting precipitate was filtered and dried at 120 ° C. for 6 hours with a vacuum drier to obtain 7.9 g of the intended polymer compound [7] (hereinafter referred to as HB-TBAMA). The measurement result of ¹ H-NMR spectrum of HB-TBAMA is shown in FIG.
The weight average molecular weight Mw measured in terms of polystyrene by GPC of HB-TBAMA was 5,700, and the polydispersity Mw / Mn was 4.68. When 5 mg of the obtained HB-TBAMA was added to a platinum pan and measured at a temperature increase rate of 10 ° C./min by TG-DTA measurement, the 5% weight loss was 435.3 ° C.

[Comparative Example 1-1] Synthesis of polymer compound [9]

Under nitrogen, 456.02 g of DMAc was added to a 1,000 mL four-necked flask, cooled to −10 ° C. with an acetone-dry ice bath, and 2,4,6-trichloro-1,3,5-triazine [1] (84. 83 g, 0.460 mol, manufactured by Eponic Degussa) was added and dissolved. Thereafter, m-phenylenediamine [8] (62.18 g, 0.575 mol) and aniline (14.57 g, 0.156 mol) dissolved in 304.01 g of DMAc were added dropwise. After the dropping, the reaction solution was stirred for 30 minutes, and 621.85 g of DMAc was added to a 2,000 mL four-necked flask and added dropwise to a tank heated in advance in an oil bath at 85 ° C. over a period of 1 hour by a liquid feed pump. Polymerization was conducted with stirring for a period of time.
Thereafter, aniline (113.95 g, 1.224 mol) was added, and the reaction was terminated after stirring for 1 hour. After cooling to room temperature with an ice bath, triethylamine (116.36 g, 1.15 mol) was added dropwise and stirred for 30 minutes to quench the hydrochloric acid. Thereafter, the precipitated hydrochloride was removed by filtration. The filtered reaction solution was reprecipitated into a mixed solution of 28% aqueous ammonia (279.29 g) and ion-exchanged water (8,820 g). The precipitate was filtered, dried at 150 ° C. for 8 hours in a vacuum dryer, redissolved in THF (833.1 g), and reprecipitated in ion-exchanged water (6,665 g). The resulting precipitate was filtered and dried at 150 ° C. for 25 hours with a vacuum dryer to obtain 118.0 g of the target polymer compound [9] (hereinafter referred to as HB-TmDA40).
The obtained HB-TmDA40 is a compound having a structural unit represented by the formula (1). The weight average molecular weight Mw measured in terms of polystyrene by GPC of HB-TmDA40 was 4,300, and the polydispersity Mw / Mn was 3.44. When 405 mg of the obtained HB-TmDA was added to a platinum pan and measured by a TG-DTA measurement at a heating rate of 10 ° C./min, the 5% weight loss was 419 ° C.

[2] Preparation of film-forming composition and film [Example 2-1]
0.5 g of HB-TBAFA obtained in Example 1-1 was dissolved in 4.5 g of cyclopentanone to obtain a light yellow transparent solution. The obtained polymer varnish was spin-coated on a glass substrate using a spin coater at 200 rpm for 5 seconds and 1000 rpm for 30 seconds, and heated at 120 ° C. for 3 minutes to remove the solvent to obtain a coating. The refractive index of the obtained film was measured and found to be 1.648.

[Example 2-2]
A coating film was produced in the same manner as in Example 2-1, except that HB-TAPBA synthesized in Example 1-2 was used. The refractive index was measured to be 1.718.

[Example 2-3]
A coating film was obtained in the same manner as in Example 2-1, except that HB-TBAMA synthesized in Example 1-3 was used. The refractive index was measured and found to be 1.684.

[Comparative Example 2-1]
A coating film was obtained in the same manner as in Example 2-1, except that the HB-TmDA40 obtained in Comparative Example 1-1 was used. The refractive index was measured and found to be 1.803.

For the coatings prepared in Examples 2-1 to 2-3 and Comparative Example 2-1, each coating was placed in a light resistance tester (0.50 W / m ² (λ = 340 nm), black panel temperature 40 ° C.). Each film thickness, refractive index, and transmittance change after 24 hours were measured. The results are shown in Table 1. Further, transmittance graphs are shown in FIGS.

As shown in Table 1 and FIGS. 4 to 7, the triazine polymer films prepared in Examples 2-1 to 2-3 and Comparative Example 2-1 have a small refractive index change rate after 24 hours. Since the coating prepared from the varnish of Example 2-1 has a large change in transmittance, it can be seen that Examples 2-1 to 2-3 are superior in light resistance.
In particular, regarding Example 2-2, it can be seen that a high refractive index film of 1.7 or more was obtained. On the other hand, regarding Examples 2-1 and 2-3, no change was observed in the transmittance, and it was found that the samples had very good light resistance.

[3] Preparation of composition for forming cured film [Example 3-1]
0.4 g of HB-TAPBA synthesized in Example 1-2 was dissolved in 1.6 g of cyclopentanone, and urethane acrylate (KRM8452, manufactured by Daicel Ornext Co., Ltd.) in a 20% by mass cyclopentanone solution as a crosslinking agent was obtained. 2 g, 0.02 g of 1 mass% cyclopentanone solution Megafac R-40 (manufactured by DIC Corporation), 0.04 g of ion exchange water, and 0.89 g of cyclohexanone as a surfactant were added and dissolved visually. As a result, a varnish (hereinafter referred to as HB-TAPBAV1) having a total solid concentration of 14% by mass was prepared.

[Example 3-2]
0.4 g of HB-TBAMA synthesized in Example 1-3 was dissolved in 1.6 g of cyclopentanone, and urethane acrylate (KRM8452, manufactured by Daicel Ornext Co., Ltd.) in a 20 mass% cyclopentanone solution as a crosslinking agent was obtained. 4 g, 0.02 g of 1% by weight cyclopentanone solution Megafac R-40 (manufactured by DIC Corporation), 0.04 g of ion-exchanged water, and 0.97 g of cyclohexanone as a surfactant were added and dissolved visually. As a result, a varnish (hereinafter referred to as HB-TBAMAV1) having a total solid content of 14% by mass was prepared.

[Comparative Example 3-1]
0.8 g of HB-TmDA40 synthesized in Comparative Example 1-1 was dissolved in 3.2 g of cyclopentanone, and ethoxylated glycerin triacrylate (A-GLY-20-E, 200 mPas) as a crosslinking agent in a 10% by mass cyclohepentanone solution. S, manufactured by Shin-Nakamura Chemical Co., Ltd.) 0.8 g and 10% by mass cyclopentanone solution ethoxylated pentaerythritol tetraacrylate (ATM-35E, 350 mPa · s, manufactured by Shin-Nakamura Chemical Co., Ltd.) 24 g, 1.28 g of Irgacure 184 (manufactured by BASF) as a 5% by mass cyclopentanone solution as a photoradical polymerization initiator, and MegaFac R-40 (manufactured by DIC Corporation) as a 1% by mass cyclopentanone solution as a surfactant. ) Add 0.04g, 0.09g of ion-exchanged water, and 0.09g of cyclopentanone, and visually After confirming dissolution, a varnish (hereinafter referred to as HB-TmDA40V1) having a total solid content concentration of 15% by mass was prepared.

[4] Production of cured film [Example 4-1]
HB-TAPBAV1 prepared in Example 3-1 was spin-coated on a non-alkali glass substrate with a spin coater at 200 rpm for 5 seconds and 1500 rpm for 30 seconds, and pre-baked at 120 ° C. for 1 minute using a hot plate. Then, the cured film 1 was obtained by heating at 230 ° C. for 10 minutes. It was 1.714 when the refractive index of the obtained cured film 1 was measured.

[Example 4-2]
A cured film 2 was produced in the same manner as in Example 4-1, except that HB-TBAMAV1 prepared in Example 3-2 was used, and the refractive index was measured to be 1.656.

[Comparative Example 4-1]
HB-TmDA40VF1 prepared in Comparative Example 3-1 was spin-coated on a non-alkali glass substrate with a spin coater at 200 rpm for 5 seconds and 2000 rpm for 30 seconds, and baked at 120 ° C. for 3 minutes using an oven. Then, the cured film 3 was obtained by light irradiation with a high-pressure mercury lamp at an integrated exposure amount of 200 mJ / cm ² . It was 1.766 when the refractive index of the obtained cured film 3 was measured.

In the light resistance tester (0.50 W / m ² (λ = 365 nm), black panel temperature 50 ° C.), the cured films 1 to 3 prepared in Examples 4-1 and 4-2 and Comparative Example 4-1 were used. Each cured film was put in, and after 24 hours, each film thickness, refractive index change, and transmittance change were measured. The results are shown in Table 2 and FIGS.

As shown in Table 2 and FIGS. 8 to 10, it was revealed that the polymers synthesized in Examples 1-2 and 1-3 had small changes in film thickness, refractive index, and transmittance before and after the light resistance test.

For each of the coatings prepared in Examples 4-1 and 4-2, each coating was placed on a hot plate previously heated to 230 ° C., heated for 20 minutes, and each film thickness, refractive index change, and transmittance change were measured. The results are also shown in Table 3. The results are shown in Table 3 and FIGS.

As shown in Table 3 and FIGS. 11 and 12, the polymers synthesized in Examples 1-2 and 1-3 show little change in film thickness and refractive index even when heated on a hot plate at 230 ° C. for 20 minutes, and the transmittance. Since there is no change, it turns out that it is a highly refractive cured film excellent in heat resistance and light resistance.

Claims (12)

1. The triazine ring containing polymer characterized by including the repeating unit structure represented by following formula (1).
   

   

   {Wherein, R and R 'each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group,
   Ar represents at least one selected from the group represented by formulas (2) and (3).
   

   

   [Wherein, W ¹ and W ² are independently of each other CR ¹ R ² (R ¹ and R ² are independently of each other of 1 to 10 carbon atoms optionally substituted with a hydrogen atom or a halogen atom] Represents an alkyl group (in which they may be combined together to form a ring)), C═O, O, S, SO, or SO ₂ . ]
2. Wherein W ¹ and W ² independently of one another, CR ¹ R ² (R ¹ and R ² are, independently of one another are hydrogen atom or an alkyl group which 1 carbon atoms which may be ~ 10 substituted by a halogen atom Or the triazine ring-containing polymer according to claim 1, which represents O.
3. The triazine ring-containing polymer according to claim 1 or 2, wherein Ar is represented by formula (4).
   

   
4. The triazine ring-containing polymer according to claim 3, wherein Ar is represented by formula (5).
   

   
5. The triazine ring-containing polymer according to claim 1 or 2, wherein Ar is represented by formula (6) or (7).
   

   
6. The triazine ring-containing polymer according to claim 5, wherein Ar is represented by formula (8) or (9).
   

   
7. A film-forming composition comprising the triazine ring-containing polymer according to any one of claims 1 to 6 and an organic solvent.
8. Furthermore, the composition for film formation of Claim 7 containing a crosslinking agent.
9. The film-forming composition according to claim 8, wherein the crosslinking agent is a polyfunctional (meth) acrylic compound.
10. A film obtained from the film-forming composition according to any one of claims 7 to 9.
11. An electronic device comprising a base material and the film according to claim 10 formed on the base material.
12. An optical member comprising a base material and the film according to claim 10 formed on the base material.

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