WO2017073733A1 - Pest control composition and use thereof - Google Patents
Pest control composition and use thereof Download PDFInfo
- Publication number
- WO2017073733A1 WO2017073733A1 PCT/JP2016/082078 JP2016082078W WO2017073733A1 WO 2017073733 A1 WO2017073733 A1 WO 2017073733A1 JP 2016082078 W JP2016082078 W JP 2016082078W WO 2017073733 A1 WO2017073733 A1 WO 2017073733A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- group
- compound
- halogen atoms
- bipyridine
- ring
- Prior art date
Links
- 0 C*(C)c1c[n+]([O-])c(-c(ccc(O*)c2)[n+]2[O-])c(S(*)(=O)=O)c1 Chemical compound C*(C)c1c[n+]([O-])c(-c(ccc(O*)c2)[n+]2[O-])c(S(*)(=O)=O)c1 0.000 description 1
- IQVQRQRAOBDKHG-TWGQIWQCSA-N CCS(/C=C(/c(cc1)ncc1OCC(C(F)F)(F)F)\N)(=O)=O Chemical compound CCS(/C=C(/c(cc1)ncc1OCC(C(F)F)(F)F)\N)(=O)=O IQVQRQRAOBDKHG-TWGQIWQCSA-N 0.000 description 1
- ZBVICPBYJYCODR-UHFFFAOYSA-N CCS(C(CC1C(F)(F)F)=C(c(nc2)ccc2OCC(C(F)(F)F)(F)F)NC1=O)(=O)=O Chemical compound CCS(C(CC1C(F)(F)F)=C(c(nc2)ccc2OCC(C(F)(F)F)(F)F)NC1=O)(=O)=O ZBVICPBYJYCODR-UHFFFAOYSA-N 0.000 description 1
- ZPDSOWKSHSZJGH-UHFFFAOYSA-N CCS(c1c(-c(cc2)ncc2OC(C(OC(F)(F)F)F)(F)F)nccc1)(=O)=O Chemical compound CCS(c1c(-c(cc2)ncc2OC(C(OC(F)(F)F)F)(F)F)nccc1)(=O)=O ZPDSOWKSHSZJGH-UHFFFAOYSA-N 0.000 description 1
- BOSIZHCYPIDZOS-UHFFFAOYSA-N FC(COc(cc1)cnc1-c(nccc1)c1SSc1c(-c(cc2)ncc2OCC(C(F)(F)F)(F)F)nccc1)(C(F)(F)F)F Chemical compound FC(COc(cc1)cnc1-c(nccc1)c1SSc1c(-c(cc2)ncc2OCC(C(F)(F)F)(F)F)nccc1)(C(F)(F)F)F BOSIZHCYPIDZOS-UHFFFAOYSA-N 0.000 description 1
- DHQKLWKZSFCKTA-ODLFYWEKSA-N O=C(C(F)(F)F)/N=C1\N(Cc(cc2)cnc2Cl)C=CC=C1 Chemical compound O=C(C(F)(F)F)/N=C1\N(Cc(cc2)cnc2Cl)C=CC=C1 DHQKLWKZSFCKTA-ODLFYWEKSA-N 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/34—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom
- A01N43/36—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom five-membered rings
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01C—PLANTING; SOWING; FERTILISING
- A01C1/00—Apparatus, or methods of use thereof, for testing or treating seed, roots, or the like, prior to sowing or planting
- A01C1/08—Immunising seed
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/34—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom
- A01N43/40—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with one nitrogen atom as the only ring hetero atom six-membered rings
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/48—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with two nitrogen atoms as the only ring hetero atoms
- A01N43/56—1,2-Diazoles; Hydrogenated 1,2-diazoles
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/48—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with two nitrogen atoms as the only ring hetero atoms
- A01N43/60—1,4-Diazines; Hydrogenated 1,4-diazines
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/64—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with three nitrogen atoms as the only ring hetero atoms
- A01N43/647—Triazoles; Hydrogenated triazoles
- A01N43/653—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/72—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms as ring hetero atoms
- A01N43/74—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms as ring hetero atoms five-membered rings with one nitrogen atom and either one oxygen atom or one sulfur atom in positions 1,3
- A01N43/78—1,3-Thiazoles; Hydrogenated 1,3-thiazoles
-
- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
- A01N43/00—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
- A01N43/72—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms as ring hetero atoms
- A01N43/84—Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with nitrogen atoms and oxygen or sulfur atoms as ring hetero atoms six-membered rings with one nitrogen atom and either one oxygen atom or one sulfur atom in positions 1,4
Definitions
- the present invention relates to a pest control composition and a pest control method.
- Non-Patent Document 1 discloses many compounds as active ingredients of pest control compositions.
- An object of the present invention is to provide a pest control composition having an excellent control effect against pests.
- a pest control composition comprising one or more compounds selected from the group consisting of the following group (a) and the following group (b).
- (C1-C5 alkylsulfanyl) C2-C5 alkyl group having one or more halogen atoms (C1-C5 alkylsulfinyl) C2-C5 alkyl group, having one or more halogen atoms (C1-C5 alkylsulfonyl) C2-C5
- R 2 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a cyclopropylmethyl group, or a cyclopropyl group
- R 3 each independently has a C1-C6 chain hydrocarbon group which may have one or more substituents selected from group B, and one or more substituents selected from group D.
- R 13 represents a hydrogen atom, a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a C3-C7 cycloalkyl group optionally having one or more halogen atoms, one or more A (C3-C6 cycloalkyl) C1-C3 alkyl group optionally having a halogen atom, a phenyl group optionally having one or more substituents selected from group D, or one or more selected from group D
- R 14 represents a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a C3-C7 cycloalkyl group optionally having one or more halogen atoms, and one or more halogen atoms.
- the optionally substituted (C3-C6 cycloalkyl) C1-C3 alkyl group or the phenyl C1-C3 alkyl group ⁇ the phenyl moiety in the phenyl C1-C3 alkyl group has one or more substituents selected from group D; You may do it.
- R 15 and R 16 each independently represents a C1-C6 alkyl group optionally having one or more halogen atoms, n and y each independently represents 0, 1, or 2; x represents 0 or 1; p and q each independently represent 0, 1, 2, or 3, and when p is 2 or 3, a plurality of R 6 may be the same or different, and q is 2 or 3 In this case, the plurality of R 3 may be the same or different.
- Group B C1-C6 alkoxy group optionally having one or more halogen atoms, C3-C6 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms
- Group D C1-C6 chain hydrocarbon group which may have one or more halogen atoms, hydroxy group, C1-C6 alkoxy group which may have one or more halogen atoms, one or more halogen atoms
- a C3-C6 alkenyloxy group which may have one or more, a C3-C6 alkynyloxy group which may have one or more halogen atoms, a sulfanyl group, or a C1-C6 which may have one or more halogen atoms.
- C6 alkylsulfanyl group C1-C6 alkylsulfinyl group optionally having one or more halogen atoms
- C1-C6 alkylsulfonyl group optionally having one or more halogen atoms, amino group, NHR 21 , NR A group consisting of 21 R 22 , C (O) R 21 , OC (O) R 21 , C (O) OR 21 , a cyano group, a nitro group, and a halogen atom.
- ⁇ R 21 and R 22 each independently represents a C1-C6 alkyl group optionally having one or more halogen atoms ⁇
- Group E C1-C6 chain hydrocarbon group which may be substituted with one or more halogen atoms, C1-C6 alkoxy group which may have one or more halogen atoms, one or more halogen atoms
- Group F C1-C6 alkoxy group optionally having one or more halogen atoms, NHR 21 , NR 21 R 22 , cyano group, phenyl optionally having one or more substituents selected from Group D A group, a 5- or 6-membered aromatic heterocyclic group optionally having one or more substituents selected from group D, a C3-C7 cycloalkyl group optionally having one or more halogen atoms, and a group A group consisting of a 3-7-membered non-aromatic heterocyclic group which may have one or more substituents selected from C.
- Group C C1-C6 chain hydrocarbon group optionally substituted with one or more halogen atoms, C1-C6 alkoxy group optionally having one or more halogen atoms, one or more halogen atoms A group consisting of an optionally substituted C3-C6 alkenyloxy group, an optionally substituted C3-C6 alkynyloxy group, and a halogen atom.
- Group G A group consisting of a halogen atom and a C1-C6 haloalkyl group.
- Subgroup a-1 Acetamiprid, clothianidin, dinotefuran, imidacloprid, nitenpyram, thiacloprid, thiamethoxam, flupiradifurone, sulfoxafurol, triflumezopyrim, dichloromesothiaz and the following formula The group which consists of a compound shown by these.
- Subgroup a-2 Acrinatrin, Aleslin, Bifenthrin, Kappabifenthrin, Bioarethrin, Bioresmethrin, Cycloproton, Cyfluthrin, Beta-Cyfluthrin, Cyhalothrin, Gamma Cyhalothrin, Lambdacyhalothrin, Cypermethrin, Alpha Cypermethrin, Betacypermethrin, Theta Permethrin, zeta-cypermethrin, sigma-permethrin, ciphenothrin, deltamethrin, empentrin, esfenvalerate, etofenprox, fenpropatoline, fenvalerate, flucitrinate, flumethrin, fluvinate, taufulvalinate, halfenprox, hepta Flutrin, imiprothrin, cadreslin, meperfluthrin, monfluor
- Subgroup a-3 A group consisting of etiprol, fipronil, flufiprolol, afoxolanel, fluralanel, brofuranilide and floxamethamide.
- Subgroup a-4 A group consisting of chlorantraniliprole, cyantranylprolol, cyclaniliprol, fulvendiamide, tetraniprolol and cyhalodiamide.
- Subgroup a-5 Alanicarb, aldicarb, bendiocarb, benfuracarb, butocarboxym, butoxycarboxym, carbaryl, carbofuran, carbosulfan, ethiophene carb, fenobucarb, formethanate, furthiocarb, isoprocarb, methiocarb, mesomil, metolcarb, oxamyl, pyrimicarb, dioxycarb, propoxyl Group consisting of thiophanox, triazamate, trimetacarb, XMC and xylylcarb.
- Subgroup a-6 A group consisting of abamectin, fluenesulfone, thioxazaphene and fluazaindolizine.
- Subgroup a-7 Mycorrhizal fungi, Arthrobotris dacteroides, Bacillus thuringiensis, Bacillus films, Bacillus megaterium, Bacillus amyloliquefaciens, Hilstera rosiliensis, Hilstera minnesotensis, Monacrosporium fimatopagum, Pasteurian nisawae , Pasteuria penetrans, Pasteuria usgae, Verticillium chlamydosporium and Harpin protein.
- Subgroup b-2 Azoxystrobin, cumoxystrobin, dimoxystrobin, enoxastrobin, famoxadone, fenamidone, phenaminestrobin, fluphenoxystrobin, floxastrobin, cresoxime-methyl, mandestrobin, methinostrobin, A group consisting of orissastrobin, picoxystrobin, pyraclostrobin, pyramethostrobin, pyroxystrobin, trifloxystrobin, pyribencarb, triclopyricarb, cyazofamide and amisulbrom.
- Subgroup b-3 A group consisting of benalaxyl, benalaxyl M, furaxyl, metalaxyl, metalaxyl M, oxadixyl and oflase.
- Subgroup b-4 Benodanyl, benzobindiflupyr, bixaphene, boscalid, carboxin, fenfram, fluopyram, flutolanil, fluxapyroxad, furametopyr, isophetamide, isopyrazam, mepronil, oxycarboxyl, pentiopyrad, penflufen, cedaxane, tifluzamide, pyradiflumide Phen, 3-difluoromethyl-1-methyl-N- (1,1,3-trimethylindan-4-yl) pyrazole-4-carboxamide, 3-difluoromethyl-1-methyl-N-[(3R) -1 , 1,3-Trimethylindan-4-yl
- Subgroup b-5 The group consisting of benomyl, carbendazim, fuberidazole, thiabendazole, thiophanate, thiophanate methyl, dietofencarb, zoxamide and ethaboxam.
- Subgroup b-6 A group consisting of felbam, manzeb, manneb, methyle, propineb, thiuram, dineb, ziram, captan, captahol, holpet, chlorothalonil, tolylfluanid, guazatine, iminotadine, anilazine, dithianone, quinomethionate and fluorimide.
- Subgroup b-7 A group consisting of dimethomorph, flumorph, pyrimorph, bench avaricarb, bench avaricarb isopropyl, iprovaricarb, varifenalate and mandipropamide.
- Subgroup b-8 A group consisting of fenpiclonyl, fludioxonil, clozolinate, iprodione, procymidone and vinclozolin.
- Subgroup b-9 The group consisting of toluclophosmethyl, oxathiapiproline, picalbutrazox, fluopicolide and silthiofam.
- [2] A content of one or more compounds selected from the group (a), the compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (a) The pesticidal composition according to [1], wherein the ratio of is 100: 1 to 1: 100 by weight.
- [3] A content of one or more compounds selected from the group (a), the compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (a) The pesticidal composition according to [1], wherein the weight ratio is 10: 1 to 1:10 by weight.
- [4] A content of one or more compounds selected from the group (b), a compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (b) The pesticidal composition according to [1], wherein the weight ratio is 10,000: 1 to 1: 100 by weight.
- [5] A content of one or more compounds selected from the group (b), a compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (b) The pest control composition according to [1], wherein the weight ratio is 1000: 1 to 1:10 by weight.
- a pest control method comprising a step of applying an effective amount of the pest control composition according to any one of [1] to [5] to a pest or a habitat of the pest.
- a method for controlling pests comprising a step of applying an effective amount of the pest control composition according to any one of [1] to [5] to a plant or soil for cultivating the plant.
- a method for controlling pests which comprises a step of applying an effective amount of the pest control composition according to any one of [1] to [5] to seeds or bulbs.
- [9] [1] A seed or bulb having an effective amount of the pesticidal composition according to any one of [1] to [5].
- pests can be controlled.
- the pest control composition of the present invention (hereinafter referred to as the present composition) comprises a compound represented by the formula (I) or an N oxide compound thereof (hereinafter referred to as a compound represented by the formula (I) and an N oxide thereof.
- the compound is referred to as the present bipyridine compound) and one or more compounds selected from the group consisting of the group (a) and the group (b) (hereinafter referred to as the present compound).
- halogen atoms when it has two or more halogen atoms, these halogen atoms may be the same or different from each other.
- CX-CY means that the number of carbon atoms is X to Y.
- C1-C6 means 1 to 6 carbon atoms.
- a halogen atom represents a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
- the “chain hydrocarbon group” represents an alkyl group, an alkenyl group, and an alkynyl group.
- alkyl group examples include methyl group, ethyl group, propyl group, isopropyl group, 1,1-dimethylpropyl group, 1,2-dimethylpropyl group, 1-ethylpropyl group, butyl group, tert-butyl group, A pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, and a decyl group are mentioned.
- alkenyl group examples include a vinyl group, 1-propenyl group, 2-propenyl group, 1-methyl-1-propenyl group, 1-methyl-2-propenyl group, 1,2-dimethyl-1-propenyl group, 1,1-dimethyl-2-propenyl group, 1-ethyl-1-propenyl group, 1-ethyl-2-propenyl group, 3-butenyl group, 4-pentenyl group, 5-hexenyl group heptenyl group, octenyl group, nonenyl Group, and decenyl group.
- alkynyl group examples include ethynyl group, 1-propynyl group, 2-propynyl group, 1-methyl-2-propynyl group, 1,1-dimethyl-2-propynyl group, 1-ethyl-2-propynyl group, Examples include 2-butynyl group, 4-pentynyl group, 5-hexynyl group, heptynyl group, octynyl group, nonynyl group, and decynyl group.
- the “C2-C10 haloalkyl group” represents a group in which a hydrogen atom of a C2-C10 alkyl group is substituted with a halogen atom, and examples thereof include a chloroethyl group, a 2,2,2-trifluoroethyl group, 2-bromo-1 1,2,2,2-tetrafluoroethyl group, 2,2,3,3-tetrafluoropropyl group, 1-methyl-2,2,3,3-tetrafluoropropyl group, perfluorohexyl group and perfluorodecyl group Can be mentioned.
- the “C3-C10 haloalkenyl group” represents a group in which one or more hydrogen atoms of the C3-C10 alkenyl group are substituted with a halogen atom, and examples thereof include a C3-C10 fluoroalkenyl group.
- Examples of the “C3-C10 haloalkenyl group” include a 3,3,3-trifluoro-1-propenyl group and a 1-trifluoro-3-butenyl group.
- the “C3-C10 haloalkynyl group” represents a group in which one or more hydrogen atoms of the C3-C10 alkynyl group are substituted with a halogen atom, and examples thereof include a C3-C10 fluoroalkynyl group.
- Examples of the “C3-C10 haloalkynyl group” include a 3,3,3-trifluoro-1-propynyl group.
- the “C1-C6 alkyl group optionally having one or more halogen atoms” represents, for example, a group in which one or more hydrogen atoms of the C1-C6 alkyl group are substituted with a halogen atom.
- C1-C6 chain hydrocarbon group having one or more halogen atoms represents a C1-C6 alkyl group, a C2-C6 alkenyl group, or a C2-C6 alkynyl group having one or more halogen atoms.
- the “C1-C6 alkyl group having one or more halogen atoms” refers to the “C1-C6 alkyl group optionally having one or more halogen atoms” and the “C2-C10 having one or more halogen atoms”.
- C2-C6 alkenyl group having one or more halogen atoms and “C2-C6 alkynyl group having one or more halogen atoms” mean the above “C2-C10 chain hydrocarbon group having one or more halogen atoms”. Included in the definition of
- cycloalkyl group examples include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, and a cycloheptyl group.
- alkoxy group represents a monovalent group in which the alkyl group is bonded to an oxygen atom.
- Examples of the C1-C6 alkoxy group include a methoxy group, an ethoxy group, an n-propoxy group, an i-propoxy group, an n- Examples include butoxy, t-butoxy, s-butoxy, and 3-methylbutoxy.
- 3-7-membered non-aromatic heterocyclic group means an aziridine ring, azetidine ring, pyrrolidine ring, imidazoline ring, imidazolidine ring, piperidine ring, tetrahydropyrimidine ring, hexahydropyrimidine ring, piperazine ring, azepane ring, oxazolidine Ring, isoxazolidine ring, 1,3-oxazinane ring, morpholine ring, 1,4-oxazepane ring, thiazolidine ring, isothiazolidine ring, 1,3-thiazinane ring, thiomorpholine ring, or 1,4-thiazepane ring
- Examples of the 3-7-membered non-aromatic heterocyclic group optionally having one or more substituents selected from group E include the following groups.
- N oxide compound examples include a compound represented by the formula (Id), a compound represented by the formula (Ie), and a compound represented by the formula (If). [Wherein the symbols have the same meaning as described above. ] [Wherein the symbols have the same meaning as described above. ] [Wherein the symbols have the same meaning as described above. ] [Wherein the symbols have the same meaning as described above. ]
- Phenyl C1-C3 alkyl group ⁇ the phenyl moiety in the phenyl C1-C3 alkyl group may have one or more substituents selected from group D ⁇ includes, for example, a benzyl group, 2-fluorobenzyl Group, 4-chlorobenzyl group, 4- (trifluoromethyl) benzyl group, 2- [4- (trifluoromethyl) phenyl] ethyl group.
- (C1-C5 alkoxy) C2-C5 alkyl group having one or more halogen atoms refers to a group in which (C1-C5 alkoxy) and / or (C2-C5 alkyl) has one or more halogen atoms,
- 2,2-difluoro-3- (2,2,2-trichloroethoxy) propyl group 2- (2,2,2-trichloroethoxy) ethyl group, 1,1,2-trifluoro-2- ( Trifluoromethoxy) ethyl group, 2,2-difluoro-3- (2,2,2-trifluoroethoxy) propyl group, 2- (2,2,2-trifluoroethoxy) ethyl group, 2,2-difluoro
- An example is a -3-methoxypropyl group.
- “(C1-C5 alkylsulfanyl) C2-C5 alkyl group having one or more halogen atoms” is a group in which (C1-C5 alkylsulfanyl) and / or (C2-C5 alkyl) has one or more halogen atoms.
- a 2,2-difluoro-2- (trifluoromethylthio) ethyl group “(C1-C5 alkylsulfinyl) C2-C5 alkyl group having one or more halogen atoms” means a group in which (C1-C5 alkylsulfinyl) and / or (C2-C5 alkyl) has one or more halogen atoms.
- 2,2-difluoro-2- (trifluoromethanesulfinyl) ethyl group can be mentioned.
- “(C1-C5 alkylsulfonyl) C2-C5 alkyl group having one or more halogen atoms” means a group in which (C1-C5 alkylsulfonyl) and / or (C2-C5 alkyl) has one or more halogen atoms. Examples thereof include 2,2-difluoro-2- (trifluoromethanesulfonyl) ethyl group.
- (C3-C7 cycloalkyl) C1-C3 alkyl group having one or more substituents selected from group G means that (C3-C7 cycloalkyl) and / or (C1-C3 alkyl) is one or more groups Represents a group having one or more substituents selected from G, for example, (2,2-difluorocyclopropyl) methyl group, [1- (trifluoromethyl) cyclopropyl] methyl group, [2- (trifluoromethyl) ) Cyclopropyl] methyl group, 2-cyclopropyl-1,1,2,2-tetrafluoroethyl group, and 2-cyclopropyl-3,3,3-trifluoropropyl group.
- C3-C7 cycloalkyl group having one or more substituents selected from group G includes, for example, a 2,2-difluorocyclopropyl group, a 1- (2,2,2-trifluoroethyl) cyclopropyl group And 4- (trifluoromethyl) cyclohexyl group.
- “5- or 6-membered aromatic heterocyclic group” represents a 5-membered aromatic heterocyclic group or a 6-membered aromatic heterocyclic group, and the 5-membered aromatic heterocyclic group is a pyrrolyl group, a furyl group, a thienyl group, or a pyrazolyl group.
- “5-membered aromatic heterocyclic group containing 1 to 4 nitrogen atoms” means pyrrolyl group, pyrazolyl group, imidazolyl group, 1,2,4-triazolyl group, 1,2,3-triazolyl group, and tetrazolyl group Represents.
- An alkylsulfanyl group, an alkylsulfinyl group, and an alkylsulfonyl group represent an S (O) z group having an alkyl group.
- examples of the alkylsulfanyl group in which z is 0 include a methylsulfanyl group, an ethylsulfanyl group, a propylsulfanyl group, and an isopropylsulfanyl group.
- examples of the alkylsulfinyl group in which z is 1 include a methylsulfinyl group, an ethylsulfinyl group, a propylsulfinyl group, and an isopropylsulfinyl group.
- examples of the alkylsulfonyl group in which z is 2 include a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, and an isopropylsulfonyl group.
- bipyridine compound examples include the following compounds.
- bipyridine compound a compound wherein R 2 is a C1-C6 alkyl group optionally having one or more halogen atoms; In the bipyridine compound, a compound wherein R 2 is a C1-C6 alkyl group; In the bipyridine compound, a compound wherein R 2 is an ethyl group;
- each R 3 is independently a C1-C6 chain hydrocarbon group optionally having one or more substituents selected from Group B ,
- One 5-membered aromatic heterocyclic group selected from group Q (the 5-membered aromatic heterocyclic group may have one or more substituents selected from group D), OR 12 , NR 11 R 12 , NR 11a R 12a , NR 24 NR 11 R 12 , or a compound that is a halogen atom;
- Group Q: ⁇ Drawing R 26 represents one or more halogen atoms which may have a C1-C6 alkyl group.
- R 1 is a C2-C10 haloalkyl group, or one or more with a halogen atom (C1-C5 alkoxy) C2-C5 alkyl group
- R 2 is a C1-C6 alkyl group
- q is 0, 1, or 2
- R 3 each independently has a C1-C6 alkyl group optionally having one or more substituents selected from group B, and may have one or more substituents selected from group B -C6 alkenyl group, one 5-membered aromatic heterocyclic group selected from group Q (the 5-membered aromatic heterocyclic group may have one or more substituents selected from group D), OR 12, NR 11 R 12, NR 11a R 12a, NR 24 NR 11 R 12, NR 11 C (O) R 13, NR 24 NR 11 C (O) R 13, NR 11 C (O) OR 14, NR 24 NR 11 C (O) OR 14 , NR 11 C (O) NR 15 R 16 , NR 24 NR 11
- R 1 is a C2-C10 haloalkyl group, or one or more with a halogen atom (C1-C5 alkoxy) C2-C5 alkyl group
- R 2 is a C1-C6 alkyl group
- q is 0, 1, or 2
- R 3 each independently has a C1-C6 alkyl group optionally having one or more substituents selected from group B, and may have one or more substituents selected from group B
- a compound in which R 6 is each independently OR 18 , NR 18 R 19 , C (O) OR 25 , OC (O
- R 1 is a C2-C6 alkyl group having 2 or more fluorine atoms, or a (C1-C5 alkoxy) C2-C5 alkyl group having 1 or more fluorine atoms
- R 2 is a C1-C6 alkyl group
- q is 0, 1, or 2
- R 3 each independently has a C1-C6 alkyl group optionally having one or more substituents selected from group B, and may have one or more substituents selected from group B
- R 1 is a C3-C5 alkyl group having 4 or more fluorine atoms, or a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group
- R 2 is an ethyl group
- q is 0, 1, or 2
- R 3 each independently represents a C1-C6 alkyl group optionally having one or more halogen atoms, a C2-C6 alkenyl group optionally having one or more halogen atoms, one or more halogen atoms
- a triazole group optionally having NR 11 R 12 , or a halogen atom
- R 11 and R 12 are each independently a hydrogen atom or a C1-C3 alkyl group optionally having one or more halogen atoms, and p is 0;
- R 1 is a C3-C5 alkyl group having 4 or more fluorine atoms
- R 2 is an ethyl group
- q is 0 or 1
- R 3 each independently represents a C1-C6 alkyl group having one or more halogen atoms, an 1,2,4-triazol-1-yl group optionally having one or more halogen atoms, NR 11 R 12 or a halogen atom
- R 11 and R 12 are each independently a hydrogen atom or a C1-C3 alkyl group optionally having one or more halogen atoms;
- a compound wherein p is 0.
- R 1 is a C2-C10 haloalkyl group or a C3-C7 cycloalkyl group having one or more substituents selected from Group G;
- R 2 is a C1-C6 alkyl group optionally having one or more halogen atoms,
- R 3 each independently has a 5- or 6-membered aromatic heterocyclic group optionally having one or more substituents selected from Group D, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , or a halogen atom
- R 11 , R 12 , R 13 and R 24 are a hydrogen atom or a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms,
- R 6 is a halogen atom, n is 2, q is 0, 1 or 2;
- a compound wherein p is 0 or 1.
- R 1 is a C2-C6 haloalkyl group or a C5-C7 cycloalkyl group having one or more halogen atoms
- R 2 is a C1-C3 alkyl group
- Each R 3 is independently a 5- or 6-membered aromatic heterocyclic group, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , or a halogen atom
- R 11 , R 12 , R 13 and R 24 are a hydrogen atom or a C1-C3 alkyl group optionally having one or more halogen atoms
- R 6 is a halogen atom
- n is 2
- q is 0, 1 or 2
- a compound wherein p is 0 or 1.
- R 1 is a C2-C6 fluoroalkyl group or a C5-C7 cycloalkyl group having one or more fluorine atoms
- R 2 is a C1-C3 alkyl group
- R 3 is each independently a 5-membered heterocyclic group containing 1 to 4 nitrogen atoms, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , or a halogen atom Yes
- R 11, R 12, R 13 and R 24 is hydrogen atom or a C1-C3 alkyl group
- R 6 is a chlorine atom
- n is 2
- q is 0, 1 or 2
- a compound wherein p is 0 or 1.
- R 1 is a C3-C5 alkyl group having 2 or more fluorine atoms, or a cyclohexyl group having 1 or more fluorine atoms
- R 2 is an ethyl group
- R 3 each independently has a 1,2,4-triazol-1-yl group optionally having one or more halogen atoms, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , or a halogen atom
- R 11 , R 12 , R 13 and R 24 are a hydrogen atom or a methyl group
- R 6 is a chlorine atom
- n is 2
- q is 0, 1 or 2
- a compound wherein p is 0 or 1.
- R 1 is a C3-C5 alkyl group having two or more fluorine atoms, or a 4,4-difluorocyclohexyl group
- R 2 is an ethyl group
- Each R 3 independently represents a 1,2,4-triazol-1-yl group, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , a chlorine atom or a bromine atom
- R 11 , R 12 and R 24 are a hydrogen atom or a methyl group, R 13 is a methyl group, R 6 is a chlorine atom, n is 2, q is 0, 1 or 2;
- a compound wherein p is 0 or 1.
- the bipyridine compound is the bipyridine compound 7, 8, 11, 12, 14, 15, 64, 69, 84, 104, 184, 204, 300, 303, 304, 306, 318, in the examples described below. 321 or 344.
- Examples of the production method of the bipyridine compound include the following production methods.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform (hereinafter referred to as halogenated hydrocarbons).
- the oxidizing agent used in the reaction include m-chloroperbenzoic acid (hereinafter referred to as mCPBA).
- mCPBA m-chloroperbenzoic acid
- an oxidizing agent is usually used in an amount of 1 to 1.2 mol per 1 mol of the bipyridine compound (Ia).
- the reaction temperature is usually in the range of ⁇ 20 to 80 ° C.
- the reaction time is usually in the range of 0.1 to 12 hours.
- the obtained bipyridine compound (Ib) can be obtained by drying and concentrating the obtained organic layer.
- a reducing agent for example, sodium sulfite or sodium thiosulfate
- a base for example, sodium bicarbonate
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include halogenated hydrocarbons.
- the oxidizing agent used in the reaction include mCPBA.
- an oxidizing agent is usually used at a ratio of 1 to 2 moles with respect to 1 mole of the bipyridine compound (Ib).
- the reaction temperature is usually in the range of ⁇ 20 to 80 ° C.
- the reaction time is usually in the range of 0.1 to 12 hours.
- the reaction mixture After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is extracted with an aqueous solution of a reducing agent (for example, sodium sulfite or sodium thiosulfate) and an aqueous solution of a base (for example, sodium bicarbonate) as necessary. Wash with. By drying and concentrating the organic layer, the bipyridine compound (Ic) can be obtained.
- a reducing agent for example, sodium sulfite or sodium thiosulfate
- a base for example, sodium bicarbonate
- this bipyridine compound (Ic) can be manufactured by one step reaction (one pot) by making this bipyridine compound (Ia) and an oxidizing agent react.
- the reaction is carried out according to the method for producing the bipyridine compound (Ic) from the bipyridine compound (Ib) using an oxidizing agent in a proportion of usually 2 to 5 mol with respect to 1 mol of the bipyridine compound (Ia). be able to.
- the bipyridine compound represented by the formula (Id) (hereinafter referred to as the present bipyridine compound (Id)), the bipyridine compound represented by the formula (Ie) (hereinafter referred to as the present bipyridine compound (Ie)), and the formula
- the bipyridine compound represented by (If) (hereinafter referred to as the present bipyridine compound (If)) can be produced by reacting the bipyridine compound (Ic) with an oxidizing agent. [Wherein the symbols have the same meaning as described above. ]
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include halogenated hydrocarbons.
- the oxidizing agent used in the reaction include mCPBA.
- the reaction is usually used in a ratio of 1 to 10 mol per 1 mol of the bipyridine compound (Ic).
- the reaction temperature is usually in the range of ⁇ 20 to 80 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- this bipyridine compound (Id), this bipyridine compound (Ie), and the mixture of this bipyridine compound (If) can be obtained.
- This bipyridine compound (Id), this bipyridine compound (Ie), and this bipyridine compound (If) can be isolated by subjecting this mixture to chromatography, recrystallization, and the like.
- the bipyridine compound (Ia) includes a compound represented by formula (M-1) (hereinafter referred to as compound (M-1)) and a compound represented by formula (R-1) (hereinafter referred to as compound (R-1)). And) in the presence of a base.
- M-1 compound represented by formula (M-1)
- R-1 compound represented by formula (R-1)
- V represents a halogen atom, and other symbols have the same meaning as described above.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include aprotic polar solvents such as dimethylformamide (hereinafter referred to as DMF), N-methylpyrrolidone (hereinafter referred to as NMP), and dimethyl sulfoxide (hereinafter referred to as DMSO).
- DMF dimethylformamide
- NMP N-methylpyrrolidone
- DMSO dimethyl sulfoxide
- aprotic polar solvent examples include alkali metal hydrides such as sodium hydride (hereinafter referred to as alkali metal hydrides).
- compound (R-1) is usually used at a ratio of 1 to 10 mol
- base is usually used at a ratio of 1 to 10 mol.
- the reaction temperature is usually in the range of ⁇ 20 ° C. to 150 ° C.
- the reaction time is usually in the range of 0.5 to 24 hours.
- the bipyridine compound (Ia) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- V is preferably a fluorine atom or a chlorine atom.
- the bipyridine compound (Ia) includes a compound represented by formula (M-2) (hereinafter referred to as compound (M-2)) and a compound represented by formula (R-2) (hereinafter referred to as compound (R-2)). And) in the presence of a base.
- M-2 a compound represented by formula
- R-2 a compound represented by formula
- V 1 represents a chlorine atom, a bromine atom or an iodine atom, and other symbols have the same meaning as described above.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include an aprotic polar solvent.
- Examples of the base used in the reaction include alkali metal carbonates such as potassium carbonate and cesium carbonate (hereinafter referred to as alkali metal carbonates).
- the compound (R-2) is usually used at a ratio of 1 to 10 moles, and the base is usually used at a ratio of 1 to 10 moles.
- the reaction temperature is usually in the range of ⁇ 20 ° C. to 150 ° C.
- the reaction time is usually in the range of 0.5 to 24 hours.
- the bipyridine compound (Ia) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- the bipyridine compound represented by the formula (I) (hereinafter referred to as the present bipyridine compound (I)) is composed of the compound represented by the formula (M-3) (hereinafter referred to as the compound (M-3)) and the formula. It can be produced by reacting a compound represented by (R-3) (hereinafter referred to as compound (R-3)) in the presence of a base.
- a compound represented by (R-3) hereinafter referred to as compound (R-3)
- V 2 represents a C1-C10 perfluoroalkanesulfonyloxy group, and other symbols have the same meaning as described above.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include an aprotic polar solvent.
- Examples of the base used in the reaction include alkali metal carbonates.
- compound (R-3) is usually used in a proportion of 1 to 10 mol, and a base is usually used in a proportion of 0.1 to 5 mol with respect to 1 mol of compound (M-3).
- the reaction temperature is usually in the range of ⁇ 20 ° C. to 120 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- the bipyridine compound (I) can be obtained by performing post-treatment operations such as adding water of the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- the bipyridine compound (I) includes a compound represented by formula (M-4) (hereinafter referred to as compound (M-4)) and a compound represented by formula (R-4) (hereinafter referred to as compound (R-4)). And) in the presence of a base.
- M-4 a compound represented by formula (M-4)
- R-4 a compound represented by formula (R-4)
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include an aprotic polar solvent.
- Examples of the base used in the reaction include alkali metal hydrides.
- the compound (R-4) is usually used in a proportion of 1 to 10 mol
- the base is usually used in a proportion of 1 to 10 mol.
- the reaction temperature is usually in the range of ⁇ 20 ° C. to 150 ° C.
- the reaction time is usually in the range of 0.5 to 24 hours.
- the bipyridine compound (I) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- V is preferably a fluorine atom.
- a compound represented by the formula (Ig) (hereinafter referred to as the present bipyridine compound (Ig)) can be produced according to the method described below.
- R 34 , R 35 , and R 36 each independently represents a hydrogen atom, a C1-C6 alkyl group optionally having one or more halogen atoms, one or more atoms selected from group D, or Represents a phenyl group which may have a group, or a 5- or 6-membered aromatic heterocyclic group which may have one or more atoms or groups selected from group D, and other symbols have the same meanings as described above Represents.
- R 34 , R 35 , and R 36 each independently represents a hydrogen atom, a C1-C6 alkyl group optionally having one or more halogen atoms, one or more atoms selected from group D, or Represents a phenyl group which may have a group, or a 5- or 6-membered aromatic heterocyclic group which may have one or more
- Step 1 a compound represented by formula (M-5) (hereinafter referred to as compound (M-5)) and a compound represented by formula (R-5) (hereinafter referred to as compound (R-5)) And react.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include alcohols, aprotic polar solvents, and mixtures thereof.
- compound (R-5) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (M-5).
- the reaction temperature is usually in the range of 0 to 200 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours. After completion of the reaction, the residue obtained by concentrating the reaction mixture is directly used in Step 2.
- the bipyridine compound (Ig) can be produced by reacting the residue obtained in Step 1, methanesulfonyl chloride and triethylamine.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include ethers (hereinafter referred to as ethers) such as tetrahydrofuran and methyl-tert-butyl ether (hereinafter referred to as MTBE).
- ethers such as tetrahydrofuran and methyl-tert-butyl ether
- MTBE methyl-tert-butyl ether
- the reaction temperature is usually in the range of 0 to 200 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- the bipyridine compound (Ig) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- a compound represented by the formula (Ih) (hereinafter referred to as the present bipyridine compound (Ih)) can be produced, for example, according to the following method. [Wherein the symbols have the same meaning as described above. ] First, a method for producing a compound represented by the formula (M-6) (hereinafter referred to as compound (M-6)) from compound (M-5) will be described.
- Compound (M-6) can be produced by reacting compound (M-5) with a compound represented by formula (R-6) (hereinafter referred to as compound (R-6)). The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
- compound (R-6) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (M-5).
- the reaction temperature is usually in the range of 0 to 200 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- the compound (M-6) can be isolated by performing post-treatment operations such as adding sodium bicarbonate water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer. .
- This bipyridine compound (Ih) can be produced by reacting compound (M-6) with a halogenating agent.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include halogenated hydrocarbons.
- the halogenating agent used in the reaction include N-bromosuccinimide and N-chlorosuccinimide.
- benzoyl peroxide may be added as necessary.
- the halogenating agent is usually used in a proportion of 1 to 10 mol, and benzoyl peroxide is usually used in the proportion of 0.1 to 0.5 mol.
- the reaction temperature is usually in the range of 0 to 200 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- Step 1 A compound represented by formula (M-7) (hereinafter referred to as compound (M-7)) and a compound represented by formula (R-7) (hereinafter referred to as compound (R-7)) are prepared as bases. React in the presence.
- Compound (R-7) can be produced according to the method described in WO2009 / 054742. The reaction is usually performed in a solvent.
- Examples of the solvent used in the reaction include halogenated hydrocarbons.
- Examples of the base used in the reaction include organic bases such as triethylamine and pyridine (hereinafter referred to as organic bases).
- organic bases such as triethylamine and pyridine (hereinafter referred to as organic bases).
- compound (M-7) is usually used at a ratio of 1 to 10 mol
- base is usually used at a ratio of 1 to 10 mol.
- the reaction temperature is usually in the range of ⁇ 50 to 200 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours. After completion of the reaction, the residue obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer is used in Step 2.
- the bipyridine compound (Ii) can be produced by reacting the residue obtained in Step 1 with ammonia.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include alcohols, water, and mixtures thereof.
- As the ammonia used in the reaction an aqueous ammonia solution, an ammonia methanol solution, or the like can be used.
- ammonia is usually used at a ratio of 1 to 100 mol per 1 mol of compound (M-7).
- the reaction temperature is usually in the range of 0 to 100 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- the bipyridine compound (Ii) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- the compound represented by the formula (Ij) (hereinafter referred to as the present bipyridine compound (Ij)) is composed of the compound (M-5) and the compound represented by the formula (R-8) (hereinafter referred to as the compound (R-8)). It can be manufactured by reacting. [Wherein the symbols have the same meaning as described above. ]
- a solvent can be used as necessary. Examples of the solvent used in the reaction include an aprotic polar solvent.
- compound (R-8) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (M-5).
- the reaction temperature is usually in the range of 0 to 200 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- the bipyridine compound (Ij) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- the compound represented by the formula (Ip) (hereinafter referred to as the present bipyridine compound (Ip)) is the same as the compound represented by the formula (Ik) (hereinafter referred to as the present bipyridine compound (Ik)) and the formula (R-12). ) (Hereinafter referred to as the compound (R-12)) is reacted in the presence of a base.
- X 3 represents a fluorine atom, a chlorine atom, or S (O) 2 R 15 ; r represents 0, 1 or 2; and other symbols represent the same meaning as described above.
- the reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
- the base used in the reaction examples include alkali metal carbonates and alkali metal hydrides.
- the compound (R-12) is usually used in a proportion of 1 to 10 moles, and the base is usually used in a proportion of 1 to 10 moles.
- the reaction temperature is usually in the range of 0 to 200 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- the bipyridine compound (Ip) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- the compound represented by the formula (Im) (hereinafter referred to as the present bipyridine compound (Im)) is composed of the present bipyridine compound (Ik) and the compound represented by the formula (R-9) (hereinafter referred to as the compound (R-9)). It can be manufactured by reacting.
- the compound represented by the formula (In) (hereinafter referred to as the present bipyridine compound (In)) is composed of the present bipyridine compound (Ik) and the compound represented by the formula (R-10) (hereinafter referred to as the compound (R-10)). It can be manufactured by reacting.
- the compound represented by the formula (Io) (hereinafter referred to as the present bipyridine compound (Io)) is composed of the present bipyridine compound (Ik) and the compound represented by the formula (R-11) (hereinafter referred to as the compound (R-11)). It can be manufactured by reacting. [Wherein the symbols have the same meaning as described above. ] The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include ethers, nitriles such as acetonitrile (hereinafter referred to as nitriles), aprotic polar solvents, and mixtures thereof. The reaction can be carried out by adding a base as necessary.
- Examples of the base used in the reaction include alkali metal carbonates, alkali metal hydrides, organic bases and the like.
- the compound (R-9) is usually in a ratio of 1 to 10 mol and the base is usually 1 to 10 mol with respect to 1 mol of the bipyridine compound (Ik). It is used in the ratio.
- the compound (R-10) is usually in a ratio of 1 to 10 mol and the base is usually in an amount of 1 to 10 per 1 mol of the bipyridine compound (Ik) compound. Used in molar proportions.
- the compound (R-11) is usually in a ratio of 1 to 10 mol and the base is usually 1 to 10 per 1 mol of the bipyridine compound (Ik) compound. Used in molar proportions.
- the reaction temperature is usually in the range of 0 to 200 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- the compound represented by the formula (Iq) (hereinafter referred to as the present bipyridine compound (Iq)) is composed of the present bipyridine compound (Ik) and the compound represented by the formula (R-13) (hereinafter referred to as the compound (R-13)).
- a base In the presence of a base.
- B 1 and B 2 each independently represent a nitrogen atom or CR 33
- R 31 , R 32 , and R 33 each independently represent a hydrogen atom or one substituent selected from Group D And other symbols have the same meaning as described above.
- This reaction can be carried out according to the method described in Production Method 11, using compound (R-13) instead of compound (R-12).
- Manufacturing method 14 The compound represented by the formula (Is) (hereinafter referred to as the present bipyridine compound (Is)) and the compound represented by the formula (It) (hereinafter referred to as the present bipyridine compound (It)) are prepared according to the following method. Can be manufactured. [Wherein the symbols have the same meaning as described above. ]
- a compound represented by formula (Ir) (hereinafter referred to as the present bipyridine compound (Ir)) and a compound represented by formula (R-14) (hereinafter referred to as compound (R-14)) are reacted.
- a method for producing the present bipyridine compound (Is) is described.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include nitriles.
- a base can be used as necessary.
- Examples of the base used in the reaction include organic bases.
- the compound (R-14) is usually used at a ratio of 1 to 5 moles and the base at a ratio of 0.1 to 5 moles.
- the reaction temperature is usually in the range of 0 to 200 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- the bipyridine compound (Is) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- this bipyridine compound (It) it continues and describes the method of manufacturing this bipyridine compound (It) by making this bipyridine compound (Is) and a base react.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include alcohols, water, and mixtures thereof.
- the base used in the reaction include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide.
- the base is used in a proportion of 0.1 to 5 mol with respect to 1 mol of the bipyridine compound (Is).
- the reaction temperature is usually in the range of 0 to 200 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- the bipyridine compound (It) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- This bipyridine compound (Ia) is obtained by reacting a compound represented by formula (M-22) (hereinafter referred to as compound (M-22)) with compound (R-2) in the presence of a base and a reducing agent.
- M-22 a compound represented by formula (M-22)
- R-2 a reducing agent
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include an aprotic polar solvent.
- Examples of the base used in the reaction include alkali metal carbonates.
- Examples of the reducing agent used in the reaction include sodium hydroxymethanesulfinate.
- compound (R-2) is usually in a proportion of 1 to 10 mol
- base is usually in a proportion of 1 to 10 mol
- reducing agent is usually in a proportion of 1 to 10 mol. It is used in the ratio.
- the reaction temperature is usually in the range of ⁇ 20 ° C. to 150 ° C.
- the reaction time is usually in the range of 0.5 to 24 hours.
- the bipyridine compound (Ia) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- Compound (M-1) is a compound represented by formula (M-8) (hereinafter referred to as compound (M-8)) and a compound represented by formula (M-9) (hereinafter referred to as compound (M-9)).
- M a compound represented by formula (M-8)
- M-9 a compound represented by formula (M-9)
- V 3 represents a chlorine atom, a bromine atom or an iodine atom
- M represents Sn (n—C 4 H 9 ) 3
- Compound (M-9) can be produced, for example, according to the method described in WO 03/024961 or the method described in Organic Process Research & Development, 2004, 8, 192-200.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include aromatic hydrocarbons such as toluene and xylene.
- the metal catalyst used in the reaction include palladium catalysts such as tetrakis (triphenylphosphine) palladium (0) and 1,1′-bis (diphenylphosphino) ferrocenepalladium (II) dichloride.
- the inorganic halide used in the reaction include alkali metal fluorides such as potassium fluoride and sodium fluoride, and alkali metal chlorides such as lithium chloride and sodium chloride.
- the compound (M-9) is usually in a proportion of 1 to 10 moles
- the metal catalyst is usually in a proportion of 0.01 to 0.5 mole, an inorganic halide. Is usually used in a proportion of 0.1 to 5 mol.
- the reaction temperature is usually in the range of ⁇ 20 ° C. to 200 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- compound (M-1) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- Reference production method 2 Compound (M-8) is produced by reacting a compound represented by formula (M-10) (hereinafter referred to as compound (M-10)) with compound (R-3) in the presence of a base. can do. [Wherein the symbols have the same meaning as described above. ] The method of reacting compound (M-10) and compound (R-3) is in accordance with the method described in Production Method 5.
- Reference manufacturing method 3 Compound (M-3) can be produced by reacting a compound represented by formula (M-11) (hereinafter referred to as compound (M-11)) with an acid.
- M-11 a compound represented by formula (M-11)
- R x represents a methyl group or an ethyl group, and other symbols represent the same meaning as described above.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include halogenated hydrocarbons.
- Examples of the acid used in the reaction include boron halides such as boron trichloride and boron tribromide.
- an acid is usually used at a ratio of 0.1 to 10 mol per 1 mol of the compound (M-11).
- the reaction temperature is usually in the range of ⁇ 20 ° C. to 150 ° C.
- the reaction time is usually in the range of 0.1 to 24 hours.
- compound (M-3) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic
- Reference production method 4 In the compound (M-11), a compound in which n is 0 (hereinafter referred to as the compound (M-11a)), a compound in which n is 1 (hereinafter referred to as the compound (M-11b)), and n A compound in which is 2 (hereinafter referred to as compound (M-11c)) can be produced according to the following method. [Wherein the symbols have the same meaning as described above. ]
- Compound (M-13) described in Reference Production Method 1 is a compound represented by formula (M-12) (hereinafter referred to as compound (M-12)) instead of compound (M-8). It can be produced according to the method.
- Compound (M-12) can be obtained by production according to the method described in Heterocycles, 1990, 30, 875-884. A commercially available compound (M-12) may also be used.
- Compound (M-11a) can be produced according to the method described in Production Method 3, using Compound (M-13) instead of Compound (M-1).
- Compound (M-11b) and Compound (M-11c) can be produced according to the method described in Production Method 1 using Compound (M-11a) instead of Bipyridine Compound (Ia).
- the compound represented by the formula (M-15) (hereinafter referred to as compound (M-15)) can be produced according to the method described below. [Wherein the symbols have the same meaning as described above. ]
- compound (M-15) a compound represented by the formula (M-14) (hereinafter referred to as compound (M-14)) is used in place of the compound (M-5), and the method according to production method 7 is used. It can be manufactured according to.
- a compound represented by formula (M-17) (hereinafter referred to as compound (M-17)) is a compound represented by formula (M-16) (hereinafter referred to as compound (M-16)) and a compound. It can be produced by reacting with (R-12) and then reacting with ammonia. [Wherein the symbols have the same meaning as described above. ] Compound (M-17) can be produced according to the method described in production method 9, using compound (M-16) in place of compound (M-7).
- Reference manufacturing method 7 A compound represented by the formula (M-18) (hereinafter referred to as compound (M-18)) can be produced by reacting compound (M-14) with compound (R-8). [Wherein the symbols have the same meaning as described above. ] Compound (M-18) can be produced according to the method described in production method 10, using compound (M-14) instead of compound (M-5).
- a compound represented by formula (M-19) (hereinafter referred to as compound (M-19)) is a compound represented by formula (M-20) (hereinafter referred to as compound (M-20)). It can be produced by reacting in the presence of an acid.
- R 38 represents a halogen atom or OR 1 , and other symbols have the same meaning as described above.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include ethers, aromatic hydrocarbons, nitriles, alcohols, aprotic polar solvents, water, and mixtures thereof.
- the acid used in the reaction include hydrochloric acid and sulfuric acid.
- an acid is usually used at a ratio of 0.1 to 5 mol with respect to 1 mol of the compound (M-17).
- the reaction temperature is usually in the range of 0 ° C to 100 ° C.
- the reaction time is usually in the range of 0.5 to 12 hours.
- compound (M-19) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- Compound (M-20) includes a compound represented by formula (M-21) (hereinafter referred to as compound (M-21)) and a compound represented by formula (R-16) (hereinafter referred to as compound (R-)). 16).) Can be reacted in the presence of a base. [Wherein the symbols have the same meaning as described above. ] The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include ethers, hexane, and mixtures thereof. An example of the base used in the reaction is n-butyllithium.
- compound (M-21) In the reaction, with respect to 1 mol of compound (M-21), compound (R-16) is usually used at a ratio of 1 to 5 mol, and base is usually used at a ratio of 1 to 5 mol.
- the reaction temperature is usually in the range of ⁇ 78 ° C. to 100 ° C.
- the reaction time is usually in the range of 0.5 to 12 hours.
- compound (M-20) After completion of the reaction, compound (M-20) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- Compound (M-21) can be produced by a known method. A commercially available compound (M-21) may also be used.
- Reference production method 10 Compound (M-2) and compound (M-22) can be produced by reacting compound (M-1) with a sulfurizing agent. [Wherein the symbols have the same meaning as described above. ]
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include an aprotic polar solvent.
- the sulfurizing agent used in the reaction include sodium sulfide and sodium hydrogen sulfide.
- a sulfurizing agent is usually used at a ratio of 1 to 10 mol per 1 mol of the compound (M-1).
- the reaction temperature is usually in the range of ⁇ 20 ° C. to 150 ° C.
- the reaction time is usually in the range of 0.5 to 24 hours.
- post-treatment operations such as addition of water to the reaction mixture, extraction with an organic solvent, drying and concentration of the organic layer, and the like are carried out to give compound (M-2) and compound (M-22).
- V is preferably a fluorine atom or a chlorine atom.
- Reference production method 11 In the compound (M-4), a compound in which V is a chlorine atom or a bromine atom (hereinafter referred to as compound (M-4a)), and a compound in which V is a fluorine atom or an iodine atom (hereinafter referred to as compound (M-4b) ) Can be produced according to the method described below.
- V 4 represents a chlorine atom or a bromine atom
- V 5 represents a fluorine atom or an iodine atom
- other symbols represent the same meaning as described above.
- Compound (M-4a) can be produced by reacting compound (M-3) with phosphorus oxychloride or phosphorus oxybromide.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include aromatic hydrocarbons.
- phosphorus oxychloride can also be used as a solvent.
- phosphorus oxychloride or phosphorus oxybromide is usually used at a ratio of 1 to 10 mol with respect to 1 mol of compound (M-3).
- the reaction temperature is usually in the range of 0 ° C to 150 ° C.
- the reaction time is usually in the range of 0.5 to 24 hours.
- the compound (M-4a) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- Compound (M-4b) can be produced by reacting compound (M-4a) with an inorganic fluoride or inorganic iodide.
- the reaction is usually performed in a solvent.
- the solvent used in the reaction include nitriles, aprotic polar solvents, and mixtures thereof.
- Examples of the inorganic fluoride used in the reaction include potassium fluoride.
- Examples of the inorganic iodide used in the reaction include sodium iodide.
- an inorganic fluoride or an inorganic iodide is usually used at a ratio of 1 to 10 mol with respect to 1 mol of the compound (M-4a).
- reaction temperature is usually in the range of 0 ° C to 250 ° C.
- reaction time is usually in the range of 0.5 to 24 hours.
- compound (M-4b) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
- R 201 represents R 1
- R 202 represents R 2
- R 203 , R 204 , and R 205 each independently represent a hydrogen atom or R 3
- R 208 each independently represents a hydrogen atom or R 6
- n represents 0, 1, or 2.
- n 2
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms
- R 201 and R 202 are Tables 1 to 11 Or a bipyridine compound (hereinafter referred to as compound group SX1).
- n is 1, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are Tables 1 to 11
- the bipyridine compound (hereinafter referred to as compound group SX2), which is any combination described in 1.
- n is 0, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are Tables 1 to 11 Or a bipyridine compound (hereinafter referred to as compound group SX3).
- n 2
- R 201 is a 2,2,3,3-tetrafluoropropyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX4).
- n 2
- R 201 is a 2,2,3,3,3-pentafluoropropyl group
- R 202 is an ethyl group
- R 203 is an ethyl group
- R 204 The present bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX5).
- R 201 is a 1,1,2,3,3,3-hexafluoropropyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX6) in which any combination shown in Table 12 to Table 19 is combined.
- n 2
- R 201 is a 2,2,3,4,4,4-hexafluorobutyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX7) in any combination of Tables 12-19.
- n 2
- R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any of the combinations described in Tables 12 to 19 (hereinafter referred to as compound group SX8).
- n 2
- R 201 is a 2,2,3,3-tetrafluoropropyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX9).
- n 2
- R 201 is a 2,2,3,3,3-pentafluoropropyl group
- R 202 is a methyl group
- R 203 is a methyl group
- R 204 This bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX10).
- R 201 is a 1,1,2,3,3,3-hexafluoropropyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX11) wherein any combination of Table 12 to Table 19 is combined.
- n 2
- R 201 is a 2,2,3,4,4,4-hexafluorobutyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX12) in any combination of Tables 12-19.
- n 2
- R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any of the combinations described in Tables 12 to 19 (hereinafter referred to as compound group SX13).
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are any one of those shown in Tables 1 to 11.
- This bipyridine compound as a combination hereinafter referred to as compound group SX14).
- n 2
- R 201 is a 2,2,3,3-tetrafluoropropyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are a combination of any of Tables 12 to 19 (hereinafter referred to as compound group SX15).
- n 2
- R 201 is a 2,2,3,3,3-pentafluoropropyl group
- R 202 is an ethyl group
- R 203 is an ethyl group
- R 204 This bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX16).
- R 201 is a 1,1,2,3,3,3-hexafluoropropyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX17) in any combination of Tables 12-19.
- n 2
- R 201 is a 2,2,3,4,4,4-hexafluorobutyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds of any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX18).
- n 2
- R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any of the combinations described in Tables 12 to 19 (hereinafter referred to as compound group SX19).
- n 2
- R 201 is a 2,2,3,3-tetrafluoropropyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX20).
- n 2
- R 201 is a 2,2,3,3,3-pentafluoropropyl group
- R 202 is a methyl group
- R 203 is a methyl group
- R 204 is a present bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX21).
- R 201 is a 1,1,2,3,3,3-hexafluoropropyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX22) in which any combination shown in Tables 12 to 19 is combined.
- n 2
- R 201 is a 2,2,3,4,4,4-hexafluorobutyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX23) in any combination of Tables 12-19.
- n 2
- R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX24).
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are any one of those shown in Tables 1 to 11.
- This bipyridine compound as a combination hereinafter referred to as compound group SX25).
- n 2
- R 201 is a 2,2,3,3-tetrafluoropropyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX26).
- n 2
- R 201 is a 2,2,3,3,3-pentafluoropropyl group
- R 202 is an ethyl group
- R 203 is an ethyl group
- R 204 The present bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX27).
- R 201 is a 1,1,2,3,3,3-hexafluoropropyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX28) in which any combination shown in Tables 12 to 19 is combined.
- n 2
- R 201 is a 2,2,3,4,4,4-hexafluorobutyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX29) in any combination of Tables 12 to 19;
- n 2
- R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are present bipyridine compounds (hereinafter referred to as compound group SX30) in any combination of Tables 12 to 19.
- n 2
- R 201 is a 2,2,3,3-tetrafluoropropyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX31).
- n 2
- R 201 is a 2,2,3,3,3-pentafluoropropyl group
- R 202 is a methyl group
- R 203 is a methyl group
- R 204 This bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX32).
- n 2
- R 201 is a 1,1,2,3,3,3-hexafluoropropyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX33) in any combination of Tables 12-19.
- n 2
- R 201 is a 2,2,3,4,4,4-hexafluorobutyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX34) wherein any combination shown in Tables 12 to 19 is combined.
- n 2
- R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any of the combinations described in Tables 12 to 19 (hereinafter referred to as compound group SX35).
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are any one of those shown in Tables 1 to 11.
- This bipyridine compound as a combination hereinafter referred to as compound group SX36).
- n 2
- R 201 is a 2,2,3,3-tetrafluoropropyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX37).
- n 2
- R 201 is a 2,2,3,3,3-pentafluoropropyl group
- R 202 is an ethyl group
- R 203 , R 204 The present bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX38).
- R 201 is a 1,1,2,3,3,3-hexafluoropropyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX39) in any combination of Tables 12-19.
- n 2
- R 201 is a 2,2,3,4,4,4-hexafluorobutyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX40) in which any combination shown in Tables 12 to 19 is combined.
- n 2
- R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group
- R 202 is an ethyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any of the combinations shown in Tables 12 to 19 (hereinafter referred to as compound group SX41).
- n 2
- R 201 is a 2,2,3,3-tetrafluoropropyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of Tables 12 to 19 and the present bipyridine compound (hereinafter referred to as compound group SX42).
- n 2
- R 201 is a 2,2,3,3,3-pentafluoropropyl group
- R 202 is a methyl group
- R 203 , R 204 This bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX43).
- n 2
- R 201 is a 1,1,2,3,3,3-hexafluoropropyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any of the combinations described in Table 12 to Table 19 and the present bipyridine compound (hereinafter referred to as compound group SX44).
- n 2
- R 201 is a 2,2,3,4,4,4-hexafluorobutyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX45) in which any combination shown in Table 12 to Table 19 is combined.
- n 2
- R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group
- R 202 is a methyl group
- R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX46).
- Group (a) is a group consisting of the following subgroups a-1, a-2, a-3, a-4, a-5, a-6 and a-7.
- Subgroups a-1 include acetamiprid, clothianidin, dinotefuran, imidacloprid, nitenpyram, thiacloprid, thiamethoxam, fluradixurone, flupyradifurone ), Triflumezopyrim (triflumezopyrim), dichloromesothiaz (dicloromezotiaz) and a compound represented by the following formula (CAS registration number 1689566-03-7, hereinafter may be referred to as insecticidal compound ⁇ )
- a group of competitive modulators of nicotinic acetylcholine receptors A group of competitive modulators of nicotinic acetylcholine receptors.
- Subgroup a-2 includes acrinathrin, allethrin, bifenthrin, kappa-bifenthrin, bioallethrin, bioresmethrin, cycloprothrin, cyfluthrin cyfluthrin, beta-cyfluthrin, cyhalothrin, gamma-cyhalothrin, lambda-cyhalothrin, cypermethrin, alpha-cypermethrin ), Beta-cypermethrin, theta-cypermethrin, zeta-cypermethrin, sigma-cypermethrin, cyphenothrin, deltamethrin, Empentrin (empe nthrin), esfenvalerate, etofenprox, fenpropathrin, fenvalerate, flucythrinate
- Subgroup a-3 is a group of GABAergic chloride channel blockers consisting of ethiprole, fipronil and flufiprole, as well as afoxolaner, fluralaner, broflanilide. And a group of GABAergic chloride channel allosteric modulators consisting of flaxametamide.
- Subgroup a-4 consists of chlorantraniliprole, cyantraniliprole, cycloniliprole, flubendiamide, tetraniliprole and cyhalodiamide.
- a group of ryanodine receptor modulators A group of ryanodine receptor modulators.
- Subgroup a-5 is composed of alanycarb, aldicarb, bendiocarb, benfuracarb, butocarboxim, butoxycarboxim, carbaryl (NAC), Carbofuran, carbosulfan, ethiofencarb, fenobucarb (BPMC), formethanate, furathiocarb, isoprocarb (MIPC), methiocarb, methomyl , Metolcarb (MTMC), oxamyl (oxamyl), pirimicarb, propoxur (PHC), thiodicarb, thiofanox, triazamate, trimethacarb, XMC Fine xylylcarb: consisting (xylylcarb MPMC), a group of carbamates acetylcholinesterase (AChE) inhibitors.
- Subgroup a-6 is a group of nematicidal active compounds consisting of abamectin, fluensulfone, tioxazafen, and fluazaindolizine.
- Subgroup a-7 includes Mycorrhiza Fungi, Arthrobotrys dactyloides, Bacillus thuringiensis, Bacillus firmus, Bacillus megaterium.
- Pasturia Microbial material consisting of Pasteuria penetrans, Pasturia usgae, Verticillium chlamydosporium and Harpin protein A group.
- Dichloromesothiaz (CAS registration number: 1263629-39-5), tetraniliprole (CAS registration number: 1229654-66-3), floxamethamide (CAS registration number: 928783-29-3), afoxoranel (CAS registration number: 1093861-60-9), fluralanel (CAS registration number: 864731-61-3), brofuranilide (CAS registration number: 1207727-04-5), fluazaindolizine (CAS registration number: 1254304-22-7), tioxazafen (CAS registration number: 330459-31-9) and insecticidal compound ⁇ (CAS registration number: 1689566-03-7) are both known compounds and are disclosed in International Publication Nos.
- Mycorrhiza Fungi Arthrobotrys dactyloides, Bacillus thuringiensis, Bacillus firmus, Bacillus megaterium, Bacillus amyloliquefaciens (Bacillus amyloliquefaciens), Hirsutella rhossiliensis, Hirsutella minnesotensis, Monacrosporium phymatopagus, Pasturiatransurie, Pasturiapass ⁇ Usugae (Pasteuria usgae), Verticillium chlamydosporium and Harpin protein are all known microbial materials Obtained from commercially available preparations or obtained by production using a known method.
- these microbial materials can also be obtained from a fungus depository.
- a fungus depository As the mycorrhizal fungi, Arbuscular mycorrhizal fungus is preferable, and in particular, bacteria belonging to the genus Gromus, such as Glomus intraradices, Glomus mosseae Glomus aggregatum and Glomus etunicatum are preferred.
- these bacterium belonging to the genus Gromas may be used alone or as a mixture of two or more bacteria.
- Group (b) is a group consisting of the following subgroups b-1, b-2, b-3, b-4, b-5, b-6, b-7, b-8 and b-9.
- Subgroup b-1 includes azaconazole, bitertanol, bromuconazole, cyproconazole, difenoconazole, diniconazole, diniconazole M, epoxy Conoxi (epoxiconazole), etaconazole (etaconazole), fenarimol (fenarimol), fenbuconazole (fenbuconazole), fluquinconazole ( fluquinconazole), quinconazole, flusilazole, flutriafol, hexaconazole, imazalil, imibenconazole, ipconazole, metconazole, Microbutanil, nuarimol, oxpoconazole, oxpoconazole fumarate
- Subgroup b-2 includes azoxystrobin, coumoxystrobin, dimoxystrobin, enoxastrobin, famoxadone, fenamidone, fena Minstrobin, flufenoxystrobin, fluoxastrobin, cresoxim-methyl, mandestrobin, methminostrobin, oryastrobine, orysastrobin, Picoxystrobin, pyraclostrobin, pyrametostrobin, pyraoxystrobin, trifloxystrobin, pyribencarb and triclopyricar b) a group of Qo inhibitors (Quinone outside inhibitors) and a group of Qi inhibitors (Quinone inside inhibitors) consisting of cyazofamid and amisulbrom.
- Subgroup b-3 consists of benalaxyl, benalaxyl-M, furalaxyl, metalaxyl, metalaxyl-M, oxadixyl and ofurace, A group of RNA polymerase I inhibitors.
- Subgroup b-4 includes benodanil, benzovindiflupyr, bixafen, boscalid, carboxin, fenfuram, fluopyram, flutolanil , Fluxapyroxad, furametpyr, isofetamid, isopyrazam, mepronil, oxycarboxin, penthiopyrad, penflufen, sedaxane (sax) Thifluzamide, pyraziflumid, pydiflumetofen (CAS registration number 1228284-64-7), 3-difluoromethyl-1-methyl-N- (1,1,3-trimethylindan-4 -Yl) pyrazole-4-carboxami (CAS registration number 141573-94-6, hereinafter may be referred to as bactericidal compound ⁇ 1), 3-difluoromethyl-1-methyl-N-[(3R) -1,1,3-trimethylindan-4- Yl] pyrazole-4-carboxamide (CAS registration
- Subgroup b-5 includes benomyl, carbendazim, fuberidazole, thiabendazole, thiophanate, thiophanate-methyl, diethofencarb, zoxamide and A group of ⁇ -tubulin polymerization inhibitors consisting of ethaboxam.
- Subgroup b-6 includes ferbam, mancozeb, maneb, metyram, propineb, thiram, zineb, ziram, captan ), Captafol, folpet, chlorothalonil, tolylfluanid, guazatine, iminoctadine, anilazine, dithianon, quinomethionate or chinomethionat It is a group of multi-acting point contact active compounds consisting of quinomethionate and fluoroimide.
- Subgroup b-7 includes dimethomorph, flumorph, pyrimorph, benthiavalicarb, benthivalicarb-isopropyl, iprovalicarb, variphenate ( A group of cellulose synthesis inhibitors consisting of valifenalate and mandipropamid. .
- Subgroup b-8 consists of fenpiclonil, fludioxonil, chlozolinate, iprodione, procymidone and vinclozolin in MAP (mitogen-activated protein) ) / Histidine kinase inhibitor group.
- Subgroup b-9 is a group of other fungicides consisting of tolclofos-methyl, oxathiapiprolin, picarbutrazox, fluopicolide and silthiofam. is there.
- Kemmitt and the like. These compounds can be obtained from commercially available preparations or produced by known methods.
- the bactericidal compound ⁇ 1 and the bactericidal compound ⁇ 2 are both known compounds, and can be produced by the methods described in International Publication No. 2011/162397, respectively.
- the bactericidal compound ⁇ 3 and the bactericidal compound ⁇ 4 are both known compounds and can be produced by the methods described in International Publication No. 2012/084812, respectively.
- the bactericidal compound ⁇ 5 is a known compound and can be produced by the method described in International Publication No. 2013/160387.
- the compound is an insecticidal compound ⁇ , clothianidin, dichloromezothiaz, flupirazifuron, imidacloprid, thiacloprid, thiamethoxam, triflumezopyrim, tefluthrin, brofuranilide, fipronil, floxamethamide, chlorantraniliprole, cyantraniliprole, tetra Niliprol, Abamectin, Fluazaindolizine, Thioxazafen, Bacillus amyloliquefaciens, Bacillus films, Difenoconazole, Flutriahol, Ipconazole, Metoconazole, Prothioconazole, Tebuconazole, Tetraconazole, Triazimenol, Tritico Nazole, azoxystrobin, phenamidon, floxastrobin, mandestrobin, picoxystrobin, pirak Strobin, trifloxystro
- the compound is clothianidin, imidacloprid, thiamethoxam, difenoconazole, flutriahole, ipconazole, metconazole, prothioconazole, tebuconazole, triazimenol, triticonazole, azoxystrobin, floxastrobin, mandestrobin , Picoxystrobin, pyraclostrobin, trifloxystrobin, metalaxyl M, metalaxyl, fluopyram, flutolanil, fluxapyroxad, penflufen, penthiopyrad, bactericidal compound ⁇ 2, cedaxane, ethaboxam, fludioxonil and oxathiapiproline It is one or more types of compounds selected from.
- the compound is an insecticidal compound ⁇ , clothianidin, dichloromezothiaz, flupirazifuron, imidacloprid, thiacloprid, thiamethoxam, triflumezopyrim, tefluthrin, brofuranilide, fipronil, floxamethamide, chlorantraniliprole, cyantraniliprole, tetra It is one or more compounds selected from the group consisting of niliprol, abamectin, fluazaindolizine, thioxazaphene, Bacillus amyloliquefaciens and Bacillus films.
- the compound is one or more compounds selected from the group consisting of clothianidin, imidacloprid and thiamethoxam.
- the compound is difenoconazole, flutriazole, ipconazole, metconazole, prothioconazole, tebuconazole, tetraconazole, triadimenol, triticonazole, azoxystrobin, fenamidone, floxastrobin, mandest Robin, picoxystrobin, pyraclostrobin, trifloxystrobin, metalaxyl M, metalaxyl, boscalid, fluopyram, flutolanil, fluxapyroxad, penflufen, penthiopyrad, bactericidal compound ⁇ 2, sedaxane, ethaboxam, thiabendazole, thiuram, fludioxonil, One or more compounds selected from the group consisting of
- the compound is difenoconazole, flutriazole, ipconazole, metconazole, prothioconazole, tebuconazole, triazimenol, triticonazole, azoxystrobin, floxastrobin, mandestrobin, picoxystrobin, One or more selected from the group consisting of pyraclostrobin, trifloxystrobin, metalaxyl M, metalaxyl, fluopyram, flutolanil, floxapyroxad, penflufen, penthiopyrad, bactericidal compound ⁇ 2, sedaxane, ethaboxam, fludioxonil and oxathiapiproline It is a compound of this.
- SX means “any one of the present bipyridine compounds selected from the compound group SX1 to SX46”.
- composition of the present invention may be a simple mixture of the present bipyridine compound and the present compound, but usually the present bipyridine compound and the present compound are mixed with an inert carrier such as a solid carrier, a liquid carrier, a gaseous carrier, Emulsions, oils, powders, granules, wettable powders, flowables, microcapsules, aerosols, obtained by adding surfactants and other formulation adjuvants as necessary.
- the total content of the bipyridine compound and the compound in the composition of the present invention is usually in the range of 0.1 to 100% by weight, preferably 0.2 to 90% by weight, more preferably 1 to 80% by weight. .
- solid carriers used for formulation include clays (kaolin clay, diatomaceous earth, bentonite, fusami clay, acidic clay), synthetic hydrous silicon oxide, talc, ceramics, and other inorganic minerals (sericite, quartz, sulfur).
- Polyester resins such as polyethylene terephthalate, nylon resins such as nylon-6, nylon-11, and nylon-66, polyamide resins, polyvinyl chloride, polyvinylidene chloride, and vinyl chloride-propylene copolymers).
- liquid carrier examples include water, alcohols (methanol, ethanol, isopropyl alcohol, butanol, hexanol, benzyl alcohol, ethylene glycol, propylene glycol, phenoxyethanol, etc.), ketones (acetone, methyl ethyl ketone, cyclohexanone, etc.), aromatic hydrocarbons (Toluene, xylene, ethylbenzene, dodecylbenzene, phenylxylylethane, methylnaphthalene, etc.), aliphatic hydrocarbons (hexane, cyclohexane, kerosene, light oil, etc.), esters (ethyl acetate, butyl acetate, isopropyl myristate, Ethyl oleate, diisopropyl adipate, diisobutyl adipate, propylene glycol monomethyl ether acetate, etc.), n
- gaseous carrier examples include fluorocarbon, butane gas, LPG (liquefied petroleum gas), dimethyl ether, and carbon dioxide gas.
- surfactant examples include nonionic surfactants such as polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, and polyethylene glycol fatty acid ester, and anions such as alkyl sulfonate, alkyl benzene sulfonate, and alkyl sulfate. Surfactant is mentioned.
- formulation adjuvants include fixing agents, dispersants, colorants and stabilizers, such as casein, gelatin, sugars (starch, gum arabic, cellulose derivatives, alginic acid, etc.), lignin derivatives, bentonite, synthesis Water-soluble polymers (polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acids, etc.), isopropyl acid phosphate, 2,6-di-tert-butyl-4-methylphenol, 2-tert-butyl-4-methoxyphenol and 3- Mention may be made of mixtures with tert-butyl-4-methoxyphenol.
- fixing agents such as casein, gelatin, sugars (starch, gum arabic, cellulose derivatives, alginic acid, etc.), lignin derivatives, bentonite, synthesis Water-soluble polymers (polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acids, etc.), isopropyl acid phosphate, 2,
- Examples of the base material of the resin preparation include vinyl chloride polymers and polyurethanes. These base materials include phthalic acid esters (dimethyl phthalate, dioctyl phthalate, etc.), adipic acid esters, if necessary. A plasticizer such as stearic acid may be added.
- the resin preparation is obtained by kneading the bipyridine compound and the compound into the base material using a general kneading apparatus, and then performing molding such as injection molding, extrusion molding, press molding, and the like. It can be processed into a resin formulation having a plate shape, a film shape, a tape shape, a net shape, a string shape or the like through processing steps such as molding and cutting.
- the bait base include cereal flour, vegetable oil, sugar, crystalline cellulose, and, if necessary, antioxidants such as dibutylhydroxytoluene and nordihydroguaiaretic acid, preservatives such as dehydroacetic acid, Additives such as pepper, powdered foods for children and pets, cheese flavor, onion flavor, peanut oil and other pest attractant flavors are added.
- the content ratio of the present bipyridine compound and the present compound in the composition of the present invention is not particularly limited, but the composition of the present invention is one or more compounds selected from the group (a) (hereinafter referred to as the present compound). a), the ratio of the content of the bipyridine compound and the compound a is preferably in the range of 100: 1 to 1: 100 by weight, in particular 10: 1 to 1:10. The range of is preferable.
- the ratio of the content of the bipyridine compound and the present compound b is preferably The weight ratio is in the range of 10,000: 1 to 1: 100, particularly preferably in the range of 1000: 1 to 1:10, and more preferably in the range of 1000: 1 to 1: 1.
- the pest control method of the present invention is carried out by applying an effective amount of the composition of the present invention to pests directly and / or in the habitat of pests.
- habitats for pests include plants, soil for cultivating plants, indoors, and animal bodies.
- Examples of a method for applying an effective amount of the composition of the present invention to a plant or soil for cultivating a plant include, for example, a method of applying an effective amount of the composition of the present invention to a plant foliage, flower vase, seedling or ear, seed disinfection, A method of applying an effective amount of the composition of the present invention to seeds such as seed soaking and seed coats or bulbs such as seed pods, a method of applying an effective amount of the composition of the present invention to soil before or after planting Is mentioned.
- the effective amount of the composition of the present invention is applied to the surface of the plant such as foliage spraying, tree spraying, etc.
- a method of spraying an effective amount of the composition of the present invention to the vase or the whole plant in the flowering period including before flowering, during flowering, and after flowering is mentioned.
- a method of spraying an effective amount of the composition of the present invention on the panicle or the whole plant is mentioned.
- a method for controlling pests by applying an effective amount of the composition of the present invention to soil before or after planting is intended to protect against damage such as feeding by pests.
- a method for directly controlling pests by applying an effective amount of the composition of the present invention to the rhizosphere of the crop to be cultivated, or by feeding an effective amount of the composition of the present invention into the plant body from the root or the like to feed the plant It is a method to control the pests.
- Examples of a method for applying an effective amount of the composition of the present invention to soil before or after planting a plant include planting treatment (planting hole spraying, planting treatment soil admixture), plant source treatment (strain Former spraying, Strain source soil mixing, Strain source irrigation, Late seedling treatment, Soil planting treatment (Sprouting spray, Sprout soil mixing), Soil treatment (Striping spray, Soil mixing, Growing season crop) Striping), cropping treatment at sowing (spreading at sowing, mixing with soil at sowing), full treatment (spreading all soil, blending with whole soil), side treatment, water surface treatment (water surface application, water surface after flooding) Application), other soil spraying treatments (growth season granule foliar spraying, under-canopy or around trunk trunk, soil surface spraying, soil surface mixing, sowing hole spraying, buttocks surface spraying, inter-plant spraying), other irrigation processing (soil Irrigation, seedling irrigation, chemical infusion treatment, local irrigation, chemical drip irrigation, chemigesi ), Seed
- the seed means the seed of the plant in a state before being sown in the soil or the culture medium
- the bulb is a bulb, a bulb, or a tuber of the plant in a state before being planted in the soil or the culture medium.
- Rhizome, stem fragment, seed pod and tuberous root a method for controlling pests by applying an effective amount of the composition of the present invention to seeds or bulbs is, for example, directly applied to seeds or bulbs of plants to be protected from damage such as feeding by pests.
- An effective amount of the composition of the present invention is osmotically transferred inside the plant body to control pests that feed on the plant, and a method of applying the effective amount of the composition of the present invention to seeds or bulbs is, for example, , Spraying treatment, smearing treatment, dipping treatment, impregnation treatment, coating treatment, film coating treatment, and pellet coating treatment. Seeds or bulbs that retain an effective amount of the composition of the invention are prepared by these methods.
- the application amount of the bipyridine compound is usually 0.001 to 100 g, preferably 0.02 to 20 g, per 1 kg of seeds or bulbs.
- the amount is usually 0.000001 to 50 g, preferably 0.0001 to 30 g per kg of seeds or bulbs.
- Examples of the pests for which the composition of the present invention is effective include harmful arthropods such as harmful insects and harmful mites, harmful nematodes, and phytopathogenic fungi such as filamentous fungi and bacteria. Examples of such pests include the following.
- Hemiptera pests Japanese green planthoppers (Laodelphax striatellus), Japanese brown planthoppers (Nilaparvata lugens), white planthoppers (Sogatella furcifera), corn planters (Peregrinus maidis), etc .; Nephotettix (Nephotettix nigropictus), Recipe dorsalis, Emporasca onukii, Potato reef hopper (Empoasca fabae), Corn leaf hopper (Dalbulus maidis), Sugarcane ugicine (Suhana) ), Leafhoppers (Cofana spectra), leafhoppers such as Nephotettix nigropictus; cotton aphids (Aphis gossypii), peach aphids (Myzus persicae), daikona Aphid (Brevicoryne brassicae), snowy aphid (Aphis spiraecola), tulip beetle a
- Lepidopterous insects Chilo suppressalis, Darkheaded stem borer (Chilo polychrysus), Trichomyceae (Tryporyza incertulas), Shiromecho (Scirpophaga innotata), Yellow stem borer (Scirpophaga incertulas (Cnaphalocrocis medinalis), Marasmia patnalis, Marasmia exigna, cotton moth (Notarcha derogata), puffer moth (Plodia ⁇ interpunctella), yellow moth (Ostrinia furnacalis), yellow moth (Hellulaedlus moth) depunctalis), Marasmia genus, Hop vine borer (Hydraecia immanis), European corn borer (Ostrinia nubilalis), Lesser cornstalk borer (Elasmopalpus lignosellus), Bean Shoot Borer (Epinotia aporema ersuger
- Heliotis genus Anticarsia gammatalis Cotton leafworm (Alabama argillacea) and other moths; White butterflies such as Pieris rapae; Adoxofies genus, Grapholita molesta, and Leguminivora glyc inivorella), Azkiyamushiga (Matsumuraeses azukivora), Apple Kokukumonmonaki (Adoxophyes orana fasciata), Chanokokumonmonamiki (Adoxophyes honmai.
- Citrus thrips (Frankliniella occidentalis), Thrips peri, Scirtothrips dorsalis, Thrips tabici Thrips such as rice thrips (Haplothrips aculeatus) and rice thrips (Stenchaetothrips biformis).
- Diptera Pteris flies (Delia platura), onion flies (Delia antiqua), sugar beet root maggots (Tetanopsemyopaeformis), etc .; ), Leafworms (Liriomyzariotrifolii), leafworms (Chromatomyia horticola), etc .; (Hydrellia philippina) Hydrellia sasakii, etc .; Drosophila, Drosophila, Drosophila, such as Megaselia spiracularis; Drosophila, such as Clogmia albipunctata; Crab fly mushrooms; Hessian flies (Mayetiola destructor), Tamas flies such as Oreseolia oryzae; Diopsis macrophthalma etc .; Frogs such as Common cranefly (Tipula oleracea), European cranefly (Tipula gad)
- Coleoptera Western corn root worm (Diabrotica virgifera virgifera), Southern corn root worm (Diabrotica undecimpunctata howardi), Northern corn root worm (Diabrotica barberi), Mexican corn root worm (Diabrotica virgifera zeae), Banded cumber rot balte ), San Antonio Beetle (Diabrotica speciosa), Cucurbit Beetle (Diabrotica speciosa), Bean Leaf Beetle (Cerotoma trifurcata), Cereal Leaf Beetle (Oulema melanopus), Scots beetle (Aulacophora femoralis), Psyllotata s cruciferae), Western black flea beetle (Phyllotreta pusilla), Cabbage stem flea beetle (Psylliodes chrysocephala), Colorado potato beetle (Leptinotarsa decemlineata), rice beetle
- Insect pest Locusta migratoria, Kera (Gryllotalpa africana),ixie terrestrial grasshopper (Dociostaurus maroccanus), Australian terrestrial grasshopper (Chortoicetes terminifera), Red croaker (Nomadacris septemfasciaust ina, Loc) melanorhodon), Italian Locust (Calliptamus italicus), Differential grasshopper (Melanoplus differentialis), Two striped grasshopper (Melanoplus bivittatus), Migratory grasshopper (Melanoplus sanguinipes), Red-Legged grasshopper (Melanoplus sanguinipes), Red-Legged grasshopper (Melanoplus sanguinipes) Grasshopper (Schistocerca gregaria), Yellow-winged locust (Gastrimargus musicus), Spur-throated locust (Austracris guttulosa), Copaneago (Oxya yezoensis), Red-
- Hymenopteran pests bees such as Athalia rosae and Athalia japonica; fire ants; Cockroach insects: German cockroach (Blattella germanica), Black cockroach (Periplaneta fuliginosa), American cockroach (Periplaneta americana), Great cockroach (Periplaneta brunnea), Great cockroach (Blatta orientalis).
- Termite pests Yamato termites (Reticulitermes speratus), termites (Coptotermes formosanus), American ants termites (Incisitermes minor), stag termites (Cryptotermes domesticus), ants, termites (Odontotermes eoformosaterm), ants Glypto termes amamianus), Miyatake termite (Reticulitermes miyatakei), Camellia termite (Reticulitermes kanmonensis), Takasago termite (Nasutitermes takasagoensis), Nitobe Roari (Pericapritermes nitobei), warrior termite (Sinocapritermes mushae), Cornitermes cumulans like.
- Ticks spider mites (Tetranychus urticae), spider mites (Tetranychus kanzawai), mandarin spider mites (Panonychus citri), apple spider mites (Panonychus ulmi), spider mites, Southern Turkey spider mites (Brevipalpus phoenicis), etc .; Phyllocoptruta citri, Tomato rustic mite (Aculops lycopersici), Chinese rustic mite (Calacarus carinatus), Chinese cabbage mite (Acaphylla theavagrans), Green radish mite (Eriophyes chibaensis), Mite schist ticks Dust mites such as (Polyphagotarsonemus latus); spider mites such as the southern spider mite (Brevipalpus phoenicis); spider mites; Haemaphysalis longicornis; Tick (Dermacentor taiwanicus), American dog tick
- Spiders Spiders such as Chiracanthium japonicum and Latrodectus hasseltii. Lips and legs: Gezi (Thereuonema hilgendorfi), Tobismkade (Scolopendra subspinipes), etc. Double-legged class: zelkova (Oxidus gracilis), red scallop (Nedyopus tambanus), etc. Isopods: Armadillidium vulgare, etc. Gastropoda: Limax marginatus, Limax flavus, Pomacea canaliculata, etc.
- Nematode Aphelenchoides basseyi of Aphelenchoides sp .; Pratylenchusus p neglectus); Meloidogyne javanica, Meloidogyne incognita, Meloidogyne hapla; Heterodera deter (Globodera sp.) Potato cyst nematode (Globodera rostochiensis), Rotylenchulus reniformis, strawberry mesenchu (Nothotylenchus acris), Radopholus similis, Ditilencs gypsashi (Ditylenc) hus dipsaci), Tylenchulus semipenetrans; Longidorus sp .; Xiphinema sp .; Trichodols (Trichodorus sp.); Bursaphelenchus sp. Nematode (Bursaphelenchus xylophilus) etc.
- Plant pathogens Rice blast (Magnaporthe grisea), sesame leaf blight (Cochliobolus miyabeanus), blight (Rhizoctonia solani), idiot seedling (Gibberella fujikuroi), yellow dwarf (Sclerophthora macrospora); wheat udon Disease (Erysiphe graminis), red mold disease (Fusarium graminearum, F. avenaceum, F. culmorum, Microdochium nivale), rust disease (Puccinia striiformis, P. graminis, P. recondita), red snow rot (Microdochium nivale, M.
- plague (Phytophthora parasitica, Phytophthora citrophthora); apple monili Disease (Monilinia mali), rot (Valsa ceratosperma), powdery mildew (Podosphaera leucotricha), spotted leaf disease (Alternaria alternata apple pathotype), black spot disease (Venturia inaequalis), anthracnose (Glomerella cingulata), brown leaf disease ( Diplocarpon mali), ring rot (Botryosphaeria berengeriana), plague (Phytophtora cactorum); pear scab (Venturia nashicola, V.
- pirina black spot (Alternaria alternata Japanese pear pathotype), red scab (Gymnosporangium haraeanum); Ascidian disease (Monilinia fructicola), black scab (Cladosporium carpophilum), phomopsis sp.
- Seed disease or early growth of various crops caused by Aspergillus, Penicillium, Fusarium, Gibberella, Tricoderma, Thielaviopsis, Rhizopus, Mucor, Corticium, Phoma, Rhizoctonia, and Diplodia Disease.
- Viral diseases of various crops mediated by Polymixa genus or Olpidium genus.
- Rice seed blight (Burkholderia plantarii); Cucumber spotted bacterial disease (Pseudomonas syringae pv. Lachrymans); Eggplant blight (Ralstonia solanacearum); Citrus scab (Xanthomonas citiri); carotovora) etc.
- the target harmful insects, harmful mites, harmful nematodes and phytopathogenic fungi are insects, mites, insecticides, acaricides, nematicides, fungicides with reduced drug sensitivity or developed drug resistance. Nematodes and phytopathogenic fungi may be used. However, if the drug sensitivity is significantly reduced or the drug resistance is greatly developed, insecticides, acaricides, nematicides and fungicides other than the target insecticides, acaricides, nematicides and fungicides.
- a composition of the invention comprising
- composition of the present invention can also be used to protect plants from plant diseases caused by insect-borne viruses.
- Examples of plant diseases caused by insect-borne viruses having the control effect of the composition of the present invention include the following.
- Rice dwarf disease (Rice waika virus), Tundra disease (Rice tungro spherical virus, Rice tungro bacilliform virus), Rice grassy stunt disease (Rice grassy stunt virus), Rice ragged stunt virus, rice stripe leaf blight Diseases (Rice stripe virus), rice black streaked dwarf virus, rice southern black-streaked dwarf virus, rice gall dwarf virus, rice leaf blight ( Rice hoja blanca virus), White leaf desease of rice, Yellow dwarf virus, Red disease (Rice penyakit merah virus), Rice yellow stunt virus, Transition yellowing Disease (Rice transitory yellowing virus), rice yellow disease (Rice Yellow Mottle Virus), rice necrosis mosaic virus, rice dwarf stunt virus, northern wheat mosaic disease (No rthern Cereal Mosaic Virus), Barley Yellow Dwarf Virus, Wheat yellow dwarf virus, Oat sterile dwarf (Oat sterile dwarf virus), Wheat streak mosaic (Wheat streak mosaic virus) Maize mosaic disease, Maize stripe disease (maize stripe tenuivirus), Mai
- the application amount can vary widely depending on the application time, application place, application method, etc., but the total amount of the bipyridine compound and the compound is It is usually 1 to 10,000 g per 10,000 m 2 .
- the composition of the present invention is a preparation such as an emulsion, wettable powder, flowable agent, etc.
- the composition of the present invention is usually adjusted so that the total concentration of the bipyridine compound and the compound is 0.01 to 10,000 ppm. Is applied diluted with water, and in the case of granules, powders, etc., the composition of the present invention is usually applied as it is.
- Eggplant vegetable eggplant, tomato, pepper, pepper, bell pepper, potato
- cucumber vegetable cucumber, pumpkin, zucchini, watermelon, melon, squash, etc.
- cruciferous vegetable radish, turnip, horseradish, kohlrabi, Chinese cabbage, cabbage, mustard, broccoli, cauliflower, etc.
- Asteraceae vegetables burdock, garlic, artichoke, lettuce, etc.
- liliaceae vegetables eg, leek, onion, garlic, asparagus
- celery family vegetables carrot, parsley, celery
- red crustacean vegetables spinach, chard, etc.
- perilla vegetables shiso, mint, basil, lavender etc.
- vegetables such as strawberry, sweet potato, yam, taro, Fruits (apples, pears, Japanese pears, quince, quince, etc.), nuclear fruits (peaches, plums, nectarines, ume, sweet cherry, apricots, prunes, etc.), citrus (citrus oranges, orange
- the above-described plant is not limited as long as it is a variety generally cultivated as a crop.
- the above-mentioned plant may be a plant bred by a hybrid technique.
- Plants bred by hybrid technology are first-generation hybrids obtained by crossing two different varieties of varieties and generally have a hybrid strength (generally, increased yield potential, It is a plant having the characteristics of improving resistance to biological and abiotic stress factors.
- the aforementioned plants include genetically modified crops.
- the genetically modified crops include HPPD (4-hydroxyphenylpyruvate dioxygenase enzyme) inhibitors such as isoxaflutol, ALS (acetolactic acid synthase) inhibitors such as imazetapyr and thifensulfuron methyl, EPSP (5 -Classic breeding with resistance to herbicides such as -enolpyruvylshikimate-3-phosphate synthase) inhibitors, glutamine synthetase inhibitors, PPO (protoporphyrinogen oxidase) inhibitors, bromoxynil, dicamba Plants granted by law or genetic engineering techniques are also included.
- HPPD 4-hydroxyphenylpyruvate dioxygenase enzyme
- ALS acetolactic acid synthase
- EPSP -Classic breeding with resistance to herbicides such as -enolpyruvylshikimate-3-phosphate synthase
- glutamine synthetase inhibitors glutamine syntheta
- the above plants can be synthesized by using genetic engineering techniques to synthesize selective toxins known in the genus Bacillus such as Bacillus thuringiensis, and from harmful insects. Also included are plants that can confer specific insecticidal activity by synthesizing gene fragments that partially match the endogenous gene and inducing gene silencing (RNAi; RNA interference) within the target harmful insect body .
- RNAi gene silencing
- a line provided with two or more traits related to herbicide resistance, pest resistance, disease resistance, etc. as described above using classical breeding technology or genetic recombination technology, and the like Alternatively, a line in which two or more kinds of properties possessed by the parent line are given by crossing genetically modified plants having different characteristics is also included. Examples of such plants include Smart stax (registered trademark).
- reaction mixture was stirred at room temperature for 10 hours.
- sodium sulfite and saturated aqueous sodium hydrogen carbonate solution were sequentially added, and the mixture was extracted with chloroform.
- the obtained organic layer was washed with saturated sodium hydrogen carbonate, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure.
- the obtained residue was subjected to silica gel chromatography, so as to obtain 490 mg of intermediate 5 represented by the following formula.
- This bipyridine compound 22 was used in place of this bipyridine compound 9, and the bipyridine compound 23 represented by the following formula and the bipyridine compound 24 represented by the following formula were obtained according to the method described in Production Example 2.
- This bipyridine compound 23 1 H-NMR (CDCl 3 ) ⁇ : 8.75 (1H, dd), 8.65 (1H, dd), 8.61-8.56 (2H, m), 7.75 (1H, dd), 7.59 (1H, dd), 6.01 (1H , dt), 3.51-3.41 (1H, m), 2.96-2.86 (1H, m), 1.41 (3H, t).
- the obtained organic layer was washed with water and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure.
- the obtained residue was diluted with 30 mL of ethanol, and 10 mL of 28% aqueous ammonia solution was added at room temperature. The mixture was heated and stirred at 60 ° C. for 2.5 hours, allowed to cool to room temperature, added to saturated aqueous sodium hydrogen carbonate solution, and extracted with ethyl acetate.
- the obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure.
- the obtained residue was subjected to silica gel chromatography to obtain 9.4 g of intermediate 17 represented by the following formula.
- the obtained residue was subjected to silica gel chromatography to obtain 0.2 g of the present bipyridine compound 204 represented by the following formula, 0.6 g of the present bipyridine compound 214, and 0.2 g of the present bipyridine compound 224.
- the bipyridine compound 204 1 H-NMR (CDCl 3 ) ⁇ : 8.93 (1H, dd), 8.37 (1H, dd), 8.04 (1H, d), 7.64 (1H, dd), 7.38 (1H, d), 7.05 (1H, dd ), 4.50 (2H, t), 3.76-3.64 (1H, m), 3.61-3.49 (1H, m), 1.35 (3H, t).
- the bipyridine compound 214 1 H-NMR (CDCl 3 ) ⁇ : 8.50 (1H, dd), 8.43 (1H, d), 7.97 (1H, dd), 7.69 (1H, d), 7.50 (1H, dd), 7.43 (1H, dd ), 4.54 (2H, t), 3.44 (2H, q), 1.30 (3H, t).
- the bipyridine compound 224 1 H-NMR (CDCl 3 ) ⁇ : 8.49 (1H, dd), 8.14 (1H, d), 7.91 (1H, dd), 7.57 (1H, dd), 7.42 (1H, d), 7.07 (1H, dd ), 4.51 (2H, t), 3.36-3.18 (2H, m), 1.28 (3H, t).
- the obtained residue was subjected to silica gel chromatography to obtain 6.7 g of the present bipyridine compound 169 represented by the following formula and 0.07 g of the present bipyridine compound 194.
- the bipyridine compound 169 1 H-NMR (CDCl 3 ) ⁇ : 8.86 (1H, dd), 8.49 (1H, dd), 7.86 (1H, d), 7.56 (1H, dd), 7.42 (1H, d), 4.56 (2H, t ), 3.98 (2H, q), 1.44 (3H, t).
- the bipyridine compound 194 1 H-NMR (CDCl 3 ) ⁇ : 8.93 (1H, d), 7.47 (1H, d), 7.42 (1H, d), 7.39 (1H, d), 4.56 (2H, t), 3.70 (2H, q ), 1.40 (3H, t).
- This bipyridine compound 109 was used in place of the present bipyridine compound 79, and was carried out according to the method described in Preparation Example 17 to obtain the present bipyridine compound 124 represented by the following formula.
- This bipyridine compound 109 was used in place of the present bipyridine compound 79, and was carried out according to the method described in Preparation Example 19 to obtain the present bipyridine compound 139 represented by the following formula.
- Production Example 39-1 The following intermediate 22 was obtained according to the method described in Production Example 10-1 using 5-chloro-2-cyanopyridine instead of 5-fluoro-2-cyanopyridine.
- Production Example 40-1 The following intermediate 24 was obtained according to the method described in Production Example 10-1 using 2-cyano-5-bromopyridine instead of 5-fluoro-2-cyanopyridine.
- Production Example 40-2 The following intermediate 25 was obtained according to the method described in Production Example 10-2 using the intermediate 24 instead of the intermediate 16.
- Production Example 42-2 The bipyridine compound 8 was obtained according to the method described in Production Example 10-2 using the intermediate 26 instead of the intermediate 16.
- Formulation Example 1 5 parts of one of the bipyridine compounds 1 to 347, 10 parts of clothianidin, 35 parts of a mixture of white carbon and polyoxyethylene alkyl ether sulfate ammonium salt (weight ratio 1: 1) and 100 parts by mixing water Then, each preparation is obtained by fine pulverization by a wet pulverization method.
- Formulation Example 2 By thoroughly pulverizing and mixing 10 parts of the present bipyridine compounds 1 to 347, 10 parts of clothianidin, 3 parts of calcium lignin sulfonate, 2 parts of sodium lauryl sulfate, and 75 parts of synthetic silicon hydroxide, Get the agent.
- Formulation Example 3 1 part of the bipyridine compounds 1 to 347, 0.5 part of clothianidin, 1 part of synthetic hydrous silicon oxide fine powder, 2 parts of calcium lignin sulfonate, 30 parts of bentonite and 65.5 parts of kaolin clay are mixed. . Next, an appropriate amount of water is added to the mixture, and the mixture is further stirred, granulated by a granulator, and dried by ventilation to obtain each granule.
- Formulation Example 4 One part of the present bipyridine compounds 1 to 347, 10 parts of clothianidin, 2 parts of sorbitan trioleate, and 28 parts of an aqueous solution containing 2 parts of polyvinyl alcohol were mixed and pulverized by a wet pulverization method. An aqueous solution containing 0.05 part of xanthan gum and 0.1 part of aluminum magnesium silicate is added to make the total amount 90 parts, and further 10 parts of propylene glycol is added and stirred and mixed to obtain each preparation.
- Formulation Examples 74-142 In Formulation Example 2, instead of 10 parts of clothianidin, the same operation as in Formulation Example 2 was carried out except that the respective compounds and amounts used in Table ii were used to obtain each formulation.
- Formulation Examples 212 to 241 In Formulation Example 4, in place of 2 parts of clothianidin, the same operations as in Formulation Example 4 were carried out except that the respective compounds and amounts used in Table iv were used to obtain each formulation.
- Formulation Example 242 After mixing 10 parts of the bipyridine compounds 1 to 347, 0.1 part of tebuconazole, 1.5 parts of sorbitan trioleate, and 28 parts of an aqueous solution containing 2 parts of polyvinyl alcohol, the mixture is pulverized by a wet pulverization method. Into this, an aqueous solution containing 0.05 part of xanthan gum and 0.1 part of aluminum magnesium silicate is added to make a total amount of 90 parts, and further 10 parts of propylene glycol is added and stirred and mixed to obtain each preparation.
- Formulation Examples 243 to 280 In Formulation Example 242, the same operation as in Formulation Example 242 was carried out except that each compound and the amount used in Table v were used instead of 0.1 part of tebuconazole to obtain each formulation.
- each commercial preparation is mixed with water containing 0.02% by volume of a spreading agent, and the present compound is contained so that the concentration of the present compound becomes a predetermined concentration.
- Prepare the drug solution A chemical solution containing the present bipyridine compound and a chemical solution containing the present compound are mixed to prepare a test chemical solution. Cucumber sativus cotyledon leaf pieces (1.5 cm in length) are accommodated in each well of a 24-well microplate, and 2 cotton aphid adults and 8 larvae are released per well for the test per well. Spray 20 ⁇ L of chemical solution. This is the treatment area.
- xylene DMF: surfactant
- Solpol 3005X manufactured by Toho Chemical Industry Co., Ltd.
- 4: 4: 1 volume ratio
- 0.02 vol% water containing a spreading agent (Cindine (registered trademark), manufactured by Sumitomo Chemical Co., Ltd.) is added, and a chemical solution containing the bipyridine compound is added so that the concentration of the bipyridine compound becomes a predetermined concentration.
- a spreading agent Tine (registered trademark)
- medical solution containing this compound was prepared.
- the chemical solution containing the present bipyridine compound and the chemical solution containing the present compound were mixed to prepare a test chemical solution.
- Cucumber sativus cotyledon leaf pieces (1.5 cm in length) are accommodated in each well of a 24-well microplate, and 2 cotton aphid adults and 8 larvae are released per well for the test per well.
- 20 ⁇ L of chemical solution was sprayed. This was designated as a treatment zone.
- medical solution for a test was made into the no-treatment group.
- Control value (%) ⁇ 1 ⁇ (Tai) / (Cai) ⁇ ⁇ 100
- the character in a formula represents the following meaning.
- the pest control composition of the present invention can be used to control pests.
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Environmental Sciences (AREA)
- Dentistry (AREA)
- Plant Pathology (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Pest Control & Pesticides (AREA)
- General Health & Medical Sciences (AREA)
- Wood Science & Technology (AREA)
- Zoology (AREA)
- Agronomy & Crop Science (AREA)
- Soil Sciences (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
Abstract
The present invention provides a pest control composition having an excellent controlling effect on pests, containing: a compound represented by the formula (I) [in the formula, each reference symbols represents definitions described in the specification] or a nitrogen oxide composition thereof; and at least one composition selected from the group consisting of group (a) and group (b).
Description
本特許出願は、日本国特許出願2015-214016号(2015年10月30日出願)、および日本国特許出願2016-144452号(2016年7月22日出願)に基づくパリ条約上の優先権および利益を主張するものであり、ここに引用することによって、上記出願に記載された内容の全体が、本明細書中に組み込まれるものとする。
This patent application includes priority under the Paris Convention based on Japanese Patent Application No. 2015-2114016 (filed on October 30, 2015) and Japanese Patent Application No. 2016-144442 (filed on July 22, 2016) and All of which are incorporated herein by reference in their entirety.
本発明は、有害生物防除組成物及び有害生物の防除方法に関する。
The present invention relates to a pest control composition and a pest control method.
従来、有害生物防除組成物の有効成分として、多くの化合物が知られている(例えば、非特許文献1参照。)。
Conventionally, many compounds are known as active ingredients of pest control compositions (see, for example, Non-Patent Document 1).
本発明は、有害生物に対する優れた防除効力を有する有害生物防除組成物を提供することを課題とする。
An object of the present invention is to provide a pest control composition having an excellent control effect against pests.
本発明者は、有害生物に対する優れた防除効力を有する有害生物防除組成物を見出すべく検討した結果、下記式(I)で示される化合物又はそのNオキシド化合物と、下記群(a)及び下記群(b)からなる群より選ばれる1種以上の化合物とを含有する組成物が、有害生物に対する優れた防除効力を有することを見出した。
As a result of studying to find a pest control composition having an excellent control effect against pests, the present inventor has found that the compound represented by the following formula (I) or its N oxide compound, the following group (a) and the following group: It has been found that a composition containing one or more compounds selected from the group consisting of (b) has an excellent control effect against pests.
本発明は、以下の通りである。
[1]
下記式(I)で示される化合物又はそのNオキシド化合物と、
下記群(a)及び下記群(b)からなる群より選ばれる1種以上の化合物と
を含有する有害生物防除組成物。
式(I):
[式中、
R1は、C2-C10ハロアルキル基、C3-C10ハロアルケニル基、C3-C10ハロアルキニル基、1以上のハロゲン原子を有する(C1-C5アルコキシ)C2-C5アルキル基、1以上のハロゲン原子を有する(C1-C5アルキルスルファニル)C2-C5アルキル基、1以上のハロゲン原子を有する(C1-C5アルキルスルフィニル)C2-C5アルキル基、1以上のハロゲン原子を有する(C1-C5アルキルスルホニル)C2-C5アルキル基、群Gより選ばれる1以上の置換基を有する(C3-C7シクロアルキル)C1-C3アルキル基、又は群Gより選ばれる1以上の置換基を有するC3-C7シクロアルキル基を表し、
R2は、1以上のハロゲン原子を有していてもよいC1-C6アルキル基、シクロプロピルメチル基、又はシクロプロピル基を表し、
R3は、各々独立して、群Bより選ばれる1以上の置換基を有していてもよいC1-C6鎖式炭化水素基、群Dより選ばれる1以上の置換基を有していてもよいフェニル基、群Dより選ばれる1以上の置換基を有していてもよい5もしくは6員芳香族複素環基、OR12、NR11R12、NR11aR12a、NR24NR11R12、NR11C(O)R13、NR24NR11C(O)R13、NR11C(O)OR14、NR24NR11C(O)OR14、NR11C(O)NR15R16、NR24NR11C(O)NR15R16、N=CHNR15R16、N=S(O)xR15R16、S(O)yR15、C(O)OR17、C(O)NR11R12、シアノ基、ニトロ基、又はハロゲン原子を表し、
R6は、各々独立して、1以上のハロゲン原子を有していてもよいC1-C6アルキル基、OR18、NR18R19、C(O)OR25、OC(O)R20、シアノ基、ニトロ基、又はハロゲン原子を表し、
R11、R17、R18、R19、R20、R24、及びR25は、各々独立して、水素原子又は1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基を表し、
R12は、水素原子、1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、群Fより選ばれる1の置換基を有するC1-C6アルキル基、又はS(O)2R23を表し、
R23は、1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、又は群Dより選ばれる1以上の置換基を有していてもよいフェニル基を表し、
R11a及びR12aはそれらが結合する窒素原子と一緒になって、3-7員非芳香族複素環基{該3-7員非芳香族複素環はアジリジン環、アゼチジン環、ピロリジン環、イミダゾリン環、イミダゾリジン環、ピペリジン環、テトラヒドロピリミジン環、ヘキサヒドロピリミジン環、ピペラジン環、アゼパン環、オキサゾリジン環、イソオキサゾリジン環、1,3-オキサジナン環、モルホリン環、1,4-オキサゼパン環、チアゾリジン環、イソチアゾリジン環、1,3-チアジナン環、チオモルホリン環、又は1,4-チアゼパン環を表し、群Eより選ばれる1以上の置換基を有していてもよい。}を形成し、
R13は、水素原子、1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、1以上のハロゲン原子を有していてもよいC3-C7シクロアルキル基、1以上のハロゲン原子を有していてもよい(C3-C6シクロアルキル)C1-C3アルキル基、群Dより選ばれる1以上の置換基を有していてもよいフェニル基、又は群Dより選ばれる1以上の置換基を有していてもよい5もしくは6員芳香族複素環基を表し、
R14は、1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、1以上のハロゲン原子を有していてもよいC3-C7シクロアルキル基、1以上のハロゲン原子を有していてもよい(C3-C6シクロアルキル)C1-C3アルキル基、又はフェニルC1-C3アルキル基{フェニルC1-C3アルキル基におけるフェニル部分は、群Dより選ばれる1以上の置換基を有していてもよい。}を表し、
R15、及びR16は、各々独立して、1以上のハロゲン原子を有していてもよいC1-C6アルキル基を表し、
n及びyは、各々独立して、0、1、又は2を表し、
xは、0又は1を表し、
p及びqは、各々独立して、0、1、2、又3を表し、pが2又は3である場合、複数のR6は同一でも異なっていてもよく、qが2又は3である場合、複数のR3は同一でも異なっていてもよい。
群B:1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルケニルオキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルキニルオキシ基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルファニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルフィニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルホニル基、1以上のハロゲン原子を有していてもよいC3-C6シクロアルキル基、シアノ基、ヒドロキシ基、及びハロゲン原子からなる群。
群D:1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、ヒドロキシ基、1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルケニルオキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルキニルオキシ基、スルファニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルファニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルフィニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルホニル基、アミノ基、NHR21、NR21R22、C(O)R21、OC(O)R21、C(O)OR21、シアノ基、ニトロ基、及びハロゲン原子からなる群。{R21、及びR22は、各々独立して、1以上のハロゲン原子を有していてもよいC1-C6アルキル基を表す}
群E:1以上のハロゲン原子で置換されていてもよいC1-C6鎖式炭化水素基、1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルケニルオキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルキニルオキシ基、ハロゲン原子、オキソ基、ヒドロキシ基、シアノ基、及びニトロ基からなる群。
群F:1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、NHR21、NR21R22、シアノ基、群Dより選ばれる1以上の置換基を有していてもよいフェニル基、群Dより選ばれる1以上の置換基を有していてもよい5もしくは6員芳香族複素環基、1以上のハロゲン原子を有していてもよいC3-C7シクロアルキル基、及び群Cより選ばれる1以上の置換基を有していてもよい3-7員非芳香族複素環基からなる群。
群C:1以上のハロゲン原子で置換されていてもよいC1-C6鎖式炭化水素基、1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルケニルオキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルキニルオキシ基、及びハロゲン原子からなる群。
群G:ハロゲン原子、及びC1-C6ハロアルキル基からなる群。]
群(a):
下記亜群a-1、a-2、a-3、a-4、a-5、a-6及びa-7からなる群。
亜群a-1:
アセタミプリド、クロチアニジン、ジノテフラン、イミダクロプリド、ニテンピラム、チアクロプリド、チアメトキサム、フルピラジフロン、スルホキサフロル、トリフルメゾピリム、ジクロロメソチアズ及び下記式
で示される化合物からなる群。
亜群a-2:
アクリナトリン、アレスリン、ビフェントリン、カッパビフェントリン、ビオアレスリン、ビオレスメトリン、シクロプロトリン、シフルトリン、ベータ-シフルトリン、シハロトリン、ガンマシハロトリン、ラムダシハロトリン、シペルメトリン、アルファシペルメトリン、べータシペルメトリン、シータシペルメトリン、ゼータシペルメトリン、シグマシペルメトリン、シフェノトリン、デルタメトリン、エンペントリン、エスフェンバレレート、エトフェンプロックス、フェンプロパトリン、フェンバレレート、フルシトリネート、フルメトリン、フルバリネート、タウフルバリネート、ハルフェンプロックス、ヘプタフルトリン、イミプロトリン、カデスリン、メペルフルトリン、モンフルオロトリン、ペルメトリン、フェノトリン、プラレトリン、ピレトリン、レスメトリン、シラフルオフェン、テフルトリン、カッパテフルトリン、テトラメトリン、テトラメチルフルトリン、トラロメトリン、トランスフルトリン、ベンフルトリン、フルフェンプロックス、フルメスリン、フラメトリン、メトフルトリン、プロフルトリン及びジメフルトリンからなる群。
亜群a-3:
エチプロール、フィプロニル、フルフィプロール、アフォクソラネル、フルララネル、ブロフラニリド及びフルキサメタミドからなる群。
亜群a-4:
クロラントラニリプロール、シアントラニルプロール、シクラニリプロール、フルベンジアミド、テトラニリプロール及びシハロジアミドからなる群。
亜群a-5:
アラニカルブ、アルジカルブ、ベンダイオカルブ、ベンフラカルブ、ブトカルボキシム、ブトキシカルボキシム、カルバリル、カルボフラン、カルボスルファン、エチオフェンカルブ、フェノブカルブ、ホルメタネート、フラチオカルブ、イソプロカルブ、メチオカルブ、メソミル、メトルカルブ、オキサミル、ピリミカーブ、プロポキスル、チオジカルブ、チオファノックス、トリアザメート、トリメタカルブ、XMC及びキシリルカルブからなる群。
亜群a-6:
アバメクチン、フルエンスルホン、チオキサザフェン及びフルアザインドリジンからなる群。
亜群a-7:
菌根菌、アルスロボトリス・ダクチロイデス、バチルス・チューリンゲンシス、バチルス・フィルムス、バチルス・メガテリウム、バチルス・アミロリケファシエンス、ヒルステラ・ロッシリエンシス、ヒルステラ・ミネソテンシス、モナクロスポリウム・フィマトパガム、パスツーリア・ニシザワエ、パスツーリア・ペネトランス、パスツーリア・ウスガエ、バーティシリウム・クラミドスポリウム及びハーピンタンパクからなる群。
群(b):
下記亜群b-1、b-2、b-3、b-4、b-5、b-6、b-7、b-8及びb-9からなる群。
亜群b-1:
アザコナゾール、ビテルタノール、ブロムコナゾール、シプロコナゾール、ジフェノコナゾール、ジニコナゾール、ジニコナゾールM、エポキシコナゾール、エタコナゾール、フェナリモル、フェンブコナゾール、フルキンコナゾール、キンコナゾール、フルシラゾール、フルトリアホール、ヘキサコナゾール、イマザリル、イミベンコナゾール、イプコナゾール、メトコナゾール、ミクロブタニル、ヌアリモール、オキスポコナゾール、オキスポコナゾールフマル酸塩、ペフラゾエート、ペンコナゾール、プロクロラズ、プロピコナゾール、プロチオコナゾール、ピリフェノックス、ピリソキサゾール、シメコナゾール、テブコナゾール、テトラコナゾール、トリアジメホン、トリアジメノール、トリフルミゾール、トリホリン及びトリチコナゾールからなる群。
亜群b-2:
アゾキシストロビン、クモキシストロビン、ジモキシストロビン、エノキサストロビン、ファモキサドン、フェンアミドン、フェナミンストロビン、フルフェノキシストロビン、フルオキサストロビン、クレソキシム-メチル、マンデストロビン、メトミノストロビン、オリサストロビン、ピコキシストロビン、ピラクロストロビン、ピラメトストロビン、ピラオキシストロビン、トリフロキシストロビン、ピリベンカルブ、トリクロピリカルブ、シアゾファミド及びアミスルブロムからなる群。
亜群b-3:
ベナラキシル、ベナラキシルM、フララキシル、メタラキシル、メタラキシルM、オキサジキシル及びオフラセからなる群。
亜群b-4:
ベノダニル、ベンゾビンジフルピル、ビキサフェン、ボスカリド、カルボキシン、フェンフラム、フルオピラム、フルトラニル、フルキサピロキサド、フラメトピル、イソフェタミド、イソピラザム、メプロニル、オキシカルボキシン、ペンチオピラド、ペンフルフェン、セダキサン、チフルザミド、ピラジフルミド、ピジフルメトフェン、3-ジフルオロメチル-1-メチル-N-(1,1,3-トリメチルインダン-4-イル)ピラゾール-4-カルボキサミド、3-ジフルオロメチル-1-メチル-N-[(3R)-1,1,3-トリメチルインダン-4-イル]ピラゾール-4-カルボキサミド、3-ジフルオロメチル-N-(7-フルオロ-1,1,3-トリメチルインダン-4-イル)-1-メチルピラゾール-4-カルボキサミド、3-ジフルオロメチル-N-[(3R)-7-フルオロ-1,1,3-トリメチルインダン-4-イル]-1-メチルピラゾール-4-カルボキサミド及びN-シクロプロピル-3-(ジフルオロメチル)-5-フルオロ-N-(5-クロロ-2-イソプロピルベンジル)-1-メチル-1H-ピラゾール-4-カルボキサミドからなる群。
亜群b-5:
ベノミル、カルベンダジム、フベリダゾール、チアベンダゾール、チオファネート、チオファネートメチル、ジエトフェンカルブ、ゾキサミド及びエタボキサムからなる群。
亜群b-6:
フェルバム、マンゼブ、マンネブ、メチラム、プロピネブ、チウラム、ジネブ、ジラム、キャプタン、キャプタホール、ホルペット、クロロタロニル、トリルフルアニド、グアザチン、イミノクタジン、アニラジン、ジチアノン、キノメチオナート及びフルオルイミドからなる群。
亜群b-7:
ジメトモルフ、フルモルフ、ピリモルフ、ベンチアバリカルブ、ベンチアバリカルブイソプロピル、イプロバリカルブ、バリフェナレート及びマンジプロパミドからなる群。
亜群b-8:
フェンピクロニル、フルジオキソニル、クロゾリネート、イプロジオン、プロシミドン及びビンクロゾリンからなる群。
亜群b-9:
トルクロホスメチル、オキサチアピプロリン、ピカルブトラゾクス、フルオピコリド及びシルチオファムからなる群。
[2]
前記群(a)より選ばれる1種以上の化合物を含有し、前記式(I)で示される化合物又はそのNオキシド化合物と、前記群(a)より選ばれる1種以上の化合物との含有量の比が、重量比で100:1~1:100である[1]に記載の有害生物防除組成物。
[3]
前記群(a)より選ばれる1種以上の化合物を含有し、前記式(I)で示される化合物又はそのNオキシド化合物と、前記群(a)より選ばれる1種以上の化合物との含有量の比が、重量比で10:1~1:10である[1]に記載の有害生物防除組成物。
[4]
前記群(b)より選ばれる1種以上の化合物を含有し、前記式(I)で示される化合物又はそのNオキシド化合物と、前記群(b)より選ばれる1種以上の化合物との含有量の比が、重量比で10000:1~1:100である[1]に記載の有害生物防除組成物。
[5]
前記群(b)より選ばれる1種以上の化合物を含有し、前記式(I)で示される化合物又はそのNオキシド化合物と、前記群(b)より選ばれる1種以上の化合物との含有量の比が、重量比で1000:1~1:10である[1]に記載の有害生物防除組成物。
[6]
[1]~[5]のいずれかに記載の有害生物防除組成物の有効量を、有害生物又は有害生物の生息場所に施用する工程を有する有害生物の防除方法。
[7]
[1]~[5]のいずれかに記載の有害生物防除組成物の有効量を、植物又は植物を栽培する土壌に施用する工程を有する有害生物の防除方法。
[8]
[1]~[5]のいずれかに記載の有害生物防除組成物の有効量を、種子又は球根に施用する工程を有する有害生物の防除方法。
[9]
[1]~[5]のいずれかに記載の有害生物防除組成物の有効量を保持している種子又は球根。 The present invention is as follows.
[1]
A compound represented by the following formula (I) or an N oxide compound thereof;
A pest control composition comprising one or more compounds selected from the group consisting of the following group (a) and the following group (b).
Formula (I):
[Where:
R 1 is a C2-C10 haloalkyl group, a C3-C10 haloalkenyl group, a C3-C10 haloalkynyl group, one or more halogen atoms (C1-C5 alkoxy), a C2-C5 alkyl group, and one or more halogen atoms. (C1-C5 alkylsulfanyl) C2-C5 alkyl group, having one or more halogen atoms (C1-C5 alkylsulfinyl) C2-C5 alkyl group, having one or more halogen atoms (C1-C5 alkylsulfonyl) C2-C5 An alkyl group, a (C3-C7 cycloalkyl) C1-C3 alkyl group having one or more substituents selected from group G, or a C3-C7 cycloalkyl group having one or more substituents selected from group G;
R 2 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a cyclopropylmethyl group, or a cyclopropyl group;
R 3 each independently has a C1-C6 chain hydrocarbon group which may have one or more substituents selected from group B, and one or more substituents selected from group D. Or a phenyl group, a 5- or 6-membered aromatic heterocyclic group optionally having one or more substituents selected from group D, OR 12 , NR 11 R 12 , NR 11a R 12a , NR 24 NR 11 R 12 , NR 11 C (O) R 13 , NR 24 NR 11 C (O) R 13 , NR 11 C (O) OR 14 , NR 24 NR 11 C (O) OR 14 , NR 11 C (O) NR 15 R 16 , NR 24 NR 11 C (O) NR 15 R 16 , N = CHNR 15 R 16 , N = S (O) x R 15 R 16 , S (O) y R 15 , C (O) OR 17 , C (O) NR 11 R 12 , a cyano group, a nitro group, or a halogen atom,
R 6 is each independently a C1-C6 alkyl group optionally having one or more halogen atoms, OR 18 , NR 18 R 19 , C (O) OR 25 , OC (O) R 20 , cyano Represents a group, a nitro group, or a halogen atom,
R 11 , R 17 , R 18 , R 19 , R 20 , R 24 , and R 25 are each independently a hydrogen atom or a C1-C6 chain hydrocarbon optionally having one or more halogen atoms Represents a group,
R 12 represents a hydrogen atom, a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a C1-C6 alkyl group having one substituent selected from Group F, or S (O) 2 represents R 23 ,
R 23 represents a C1-C6 chain hydrocarbon group which may have one or more halogen atoms, or a phenyl group which may have one or more substituents selected from group D;
R 11a and R 12a are taken together with the nitrogen atom to which they are attached to form a 3-7-membered non-aromatic heterocyclic group (the 3-7-membered non-aromatic heterocyclic ring is an aziridine ring, azetidine ring, pyrrolidine ring, imidazoline Ring, imidazolidine ring, piperidine ring, tetrahydropyrimidine ring, hexahydropyrimidine ring, piperazine ring, azepane ring, oxazolidine ring, isoxazolidine ring, 1,3-oxazinane ring, morpholine ring, 1,4-oxazepane ring, thiazolidine ring , An isothiazolidine ring, a 1,3-thiazinane ring, a thiomorpholine ring, or a 1,4-thiazepan ring, which may have one or more substituents selected from Group E. },
R 13 represents a hydrogen atom, a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a C3-C7 cycloalkyl group optionally having one or more halogen atoms, one or more A (C3-C6 cycloalkyl) C1-C3 alkyl group optionally having a halogen atom, a phenyl group optionally having one or more substituents selected from group D, or one or more selected from group D Represents a 5- or 6-membered aromatic heterocyclic group optionally having
R 14 represents a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a C3-C7 cycloalkyl group optionally having one or more halogen atoms, and one or more halogen atoms. The optionally substituted (C3-C6 cycloalkyl) C1-C3 alkyl group or the phenyl C1-C3 alkyl group {the phenyl moiety in the phenyl C1-C3 alkyl group has one or more substituents selected from group D; You may do it. },
R 15 and R 16 each independently represents a C1-C6 alkyl group optionally having one or more halogen atoms,
n and y each independently represents 0, 1, or 2;
x represents 0 or 1;
p and q each independently represent 0, 1, 2, or 3, and when p is 2 or 3, a plurality of R 6 may be the same or different, and q is 2 or 3 In this case, the plurality of R 3 may be the same or different.
Group B: C1-C6 alkoxy group optionally having one or more halogen atoms, C3-C6 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms A C3-C6 alkynyloxy group which may have one or more halogen atoms, a C1-C6 alkylsulfanyl group which may have one or more halogen atoms, a C1-C6 alkylsulfinyl group which may have one or more halogen atoms, one or more A group consisting of a C1-C6 alkylsulfonyl group optionally having a halogen atom, a C3-C6 cycloalkyl group optionally having one or more halogen atoms, a cyano group, a hydroxy group, and a halogen atom.
Group D: C1-C6 chain hydrocarbon group which may have one or more halogen atoms, hydroxy group, C1-C6 alkoxy group which may have one or more halogen atoms, one or more halogen atoms A C3-C6 alkenyloxy group which may have one or more, a C3-C6 alkynyloxy group which may have one or more halogen atoms, a sulfanyl group, or a C1-C6 which may have one or more halogen atoms. C6 alkylsulfanyl group, C1-C6 alkylsulfinyl group optionally having one or more halogen atoms, C1-C6 alkylsulfonyl group optionally having one or more halogen atoms, amino group, NHR 21 , NR A group consisting of 21 R 22 , C (O) R 21 , OC (O) R 21 , C (O) OR 21 , a cyano group, a nitro group, and a halogen atom. {R 21 and R 22 each independently represents a C1-C6 alkyl group optionally having one or more halogen atoms}
Group E: C1-C6 chain hydrocarbon group which may be substituted with one or more halogen atoms, C1-C6 alkoxy group which may have one or more halogen atoms, one or more halogen atoms A group consisting of a C3-C6 alkenyloxy group which may have one or more, a C3-C6 alkynyloxy group which may have one or more halogen atoms, a halogen atom, an oxo group, a hydroxy group, a cyano group and a nitro group.
Group F: C1-C6 alkoxy group optionally having one or more halogen atoms, NHR 21 , NR 21 R 22 , cyano group, phenyl optionally having one or more substituents selected from Group D A group, a 5- or 6-membered aromatic heterocyclic group optionally having one or more substituents selected from group D, a C3-C7 cycloalkyl group optionally having one or more halogen atoms, and a group A group consisting of a 3-7-membered non-aromatic heterocyclic group which may have one or more substituents selected from C.
Group C: C1-C6 chain hydrocarbon group optionally substituted with one or more halogen atoms, C1-C6 alkoxy group optionally having one or more halogen atoms, one or more halogen atoms A group consisting of an optionally substituted C3-C6 alkenyloxy group, an optionally substituted C3-C6 alkynyloxy group, and a halogen atom.
Group G: A group consisting of a halogen atom and a C1-C6 haloalkyl group. ]
Group (a):
A group consisting of the following subgroups a-1, a-2, a-3, a-4, a-5, a-6 and a-7.
Subgroup a-1:
Acetamiprid, clothianidin, dinotefuran, imidacloprid, nitenpyram, thiacloprid, thiamethoxam, flupiradifurone, sulfoxafurol, triflumezopyrim, dichloromesothiaz and the following formula
The group which consists of a compound shown by these.
Subgroup a-2:
Acrinatrin, Aleslin, Bifenthrin, Kappabifenthrin, Bioarethrin, Bioresmethrin, Cycloproton, Cyfluthrin, Beta-Cyfluthrin, Cyhalothrin, Gamma Cyhalothrin, Lambdacyhalothrin, Cypermethrin, Alpha Cypermethrin, Betacypermethrin, Theta Permethrin, zeta-cypermethrin, sigma-permethrin, ciphenothrin, deltamethrin, empentrin, esfenvalerate, etofenprox, fenpropatoline, fenvalerate, flucitrinate, flumethrin, fluvinate, taufulvalinate, halfenprox, hepta Flutrin, imiprothrin, cadreslin, meperfluthrin, monfluorotrin, permethrin, phenothrin Prallethrin, pyrethrins, resmethrin, silafluofen, tefluthrin, kappa Te full Trinh, tetramethrin, tetramethyl full Trinh, tralomethrin, transfluthrin, Benfurutorin, full Fen flufenprox, flumethrin, furamethrin, metofluthrin, the group consisting of profluthrin and dimefluthrin.
Subgroup a-3:
A group consisting of etiprol, fipronil, flufiprolol, afoxolanel, fluralanel, brofuranilide and floxamethamide.
Subgroup a-4:
A group consisting of chlorantraniliprole, cyantranylprolol, cyclaniliprol, fulvendiamide, tetraniprolol and cyhalodiamide.
Subgroup a-5:
Alanicarb, aldicarb, bendiocarb, benfuracarb, butocarboxym, butoxycarboxym, carbaryl, carbofuran, carbosulfan, ethiophene carb, fenobucarb, formethanate, furthiocarb, isoprocarb, methiocarb, mesomil, metolcarb, oxamyl, pyrimicarb, dioxycarb, propoxyl Group consisting of thiophanox, triazamate, trimetacarb, XMC and xylylcarb.
Subgroup a-6:
A group consisting of abamectin, fluenesulfone, thioxazaphene and fluazaindolizine.
Subgroup a-7:
Mycorrhizal fungi, Arthrobotris dacteroides, Bacillus thuringiensis, Bacillus films, Bacillus megaterium, Bacillus amyloliquefaciens, Hilstera rosiliensis, Hilstera minnesotensis, Monacrosporium fimatopagum, Pasteurian nisawae , Pasteuria penetrans, Pasteuria usgae, Verticillium chlamydosporium and Harpin protein.
Group (b):
A group consisting of the following subgroups b-1, b-2, b-3, b-4, b-5, b-6, b-7, b-8 and b-9.
Subgroup b-1:
Azaconazole, viteltanol, bromconazole, cyproconazole, difenoconazole, dinicoazole, diniconazole M, epoxiconazole, etaconazole, phenalimol, fenbuconazole, fluquinconazole, quinconazole, flusilazole, flutriazole, hexaconazole, imazalil, Imibenconazole, ipconazole, metconazole, microbutanyl, nuarimol, oxpoconazole, oxpoconazole fumarate, pefazoate, penconazole, prochloraz, propiconazole, prothioconazole, pyrifenox, pyrisoxazole, cimeconazole, tebuconazole, tetrabuconazole Conazole, triadimephone, triadimenol, triflumizole, trifolin and tritico A group consisting of nasol.
Subgroup b-2:
Azoxystrobin, cumoxystrobin, dimoxystrobin, enoxastrobin, famoxadone, fenamidone, phenaminestrobin, fluphenoxystrobin, floxastrobin, cresoxime-methyl, mandestrobin, methinostrobin, A group consisting of orissastrobin, picoxystrobin, pyraclostrobin, pyramethostrobin, pyroxystrobin, trifloxystrobin, pyribencarb, triclopyricarb, cyazofamide and amisulbrom.
Subgroup b-3:
A group consisting of benalaxyl, benalaxyl M, furaxyl, metalaxyl, metalaxyl M, oxadixyl and oflase.
Subgroup b-4:
Benodanyl, benzobindiflupyr, bixaphene, boscalid, carboxin, fenfram, fluopyram, flutolanil, fluxapyroxad, furametopyr, isophetamide, isopyrazam, mepronil, oxycarboxyl, pentiopyrad, penflufen, cedaxane, tifluzamide, pyradiflumide Phen, 3-difluoromethyl-1-methyl-N- (1,1,3-trimethylindan-4-yl) pyrazole-4-carboxamide, 3-difluoromethyl-1-methyl-N-[(3R) -1 , 1,3-Trimethylindan-4-yl] pyrazole-4-carboxamide, 3-difluoromethyl-N- (7-fluoro-1,1,3-trimethylindan-4-yl) -1-methylpyrazole-4 -Carboxa 3-difluoromethyl-N-[(3R) -7-fluoro-1,1,3-trimethylindan-4-yl] -1-methylpyrazole-4-carboxamide and N-cyclopropyl-3- (difluoro A group consisting of (methyl) -5-fluoro-N- (5-chloro-2-isopropylbenzyl) -1-methyl-1H-pyrazole-4-carboxamide.
Subgroup b-5:
The group consisting of benomyl, carbendazim, fuberidazole, thiabendazole, thiophanate, thiophanate methyl, dietofencarb, zoxamide and ethaboxam.
Subgroup b-6:
A group consisting of felbam, manzeb, manneb, methyle, propineb, thiuram, dineb, ziram, captan, captahol, holpet, chlorothalonil, tolylfluanid, guazatine, iminotadine, anilazine, dithianone, quinomethionate and fluorimide.
Subgroup b-7:
A group consisting of dimethomorph, flumorph, pyrimorph, bench avaricarb, bench avaricarb isopropyl, iprovaricarb, varifenalate and mandipropamide.
Subgroup b-8:
A group consisting of fenpiclonyl, fludioxonil, clozolinate, iprodione, procymidone and vinclozolin.
Subgroup b-9:
The group consisting of toluclophosmethyl, oxathiapiproline, picalbutrazox, fluopicolide and silthiofam.
[2]
A content of one or more compounds selected from the group (a), the compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (a) The pesticidal composition according to [1], wherein the ratio of is 100: 1 to 1: 100 by weight.
[3]
A content of one or more compounds selected from the group (a), the compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (a) The pesticidal composition according to [1], wherein the weight ratio is 10: 1 to 1:10 by weight.
[4]
A content of one or more compounds selected from the group (b), a compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (b) The pesticidal composition according to [1], wherein the weight ratio is 10,000: 1 to 1: 100 by weight.
[5]
A content of one or more compounds selected from the group (b), a compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (b) The pest control composition according to [1], wherein the weight ratio is 1000: 1 to 1:10 by weight.
[6]
A pest control method comprising a step of applying an effective amount of the pest control composition according to any one of [1] to [5] to a pest or a habitat of the pest.
[7]
A method for controlling pests, comprising a step of applying an effective amount of the pest control composition according to any one of [1] to [5] to a plant or soil for cultivating the plant.
[8]
A method for controlling pests, which comprises a step of applying an effective amount of the pest control composition according to any one of [1] to [5] to seeds or bulbs.
[9]
[1] A seed or bulb having an effective amount of the pesticidal composition according to any one of [1] to [5].
[1]
下記式(I)で示される化合物又はそのNオキシド化合物と、
下記群(a)及び下記群(b)からなる群より選ばれる1種以上の化合物と
を含有する有害生物防除組成物。
式(I):
R1は、C2-C10ハロアルキル基、C3-C10ハロアルケニル基、C3-C10ハロアルキニル基、1以上のハロゲン原子を有する(C1-C5アルコキシ)C2-C5アルキル基、1以上のハロゲン原子を有する(C1-C5アルキルスルファニル)C2-C5アルキル基、1以上のハロゲン原子を有する(C1-C5アルキルスルフィニル)C2-C5アルキル基、1以上のハロゲン原子を有する(C1-C5アルキルスルホニル)C2-C5アルキル基、群Gより選ばれる1以上の置換基を有する(C3-C7シクロアルキル)C1-C3アルキル基、又は群Gより選ばれる1以上の置換基を有するC3-C7シクロアルキル基を表し、
R2は、1以上のハロゲン原子を有していてもよいC1-C6アルキル基、シクロプロピルメチル基、又はシクロプロピル基を表し、
R3は、各々独立して、群Bより選ばれる1以上の置換基を有していてもよいC1-C6鎖式炭化水素基、群Dより選ばれる1以上の置換基を有していてもよいフェニル基、群Dより選ばれる1以上の置換基を有していてもよい5もしくは6員芳香族複素環基、OR12、NR11R12、NR11aR12a、NR24NR11R12、NR11C(O)R13、NR24NR11C(O)R13、NR11C(O)OR14、NR24NR11C(O)OR14、NR11C(O)NR15R16、NR24NR11C(O)NR15R16、N=CHNR15R16、N=S(O)xR15R16、S(O)yR15、C(O)OR17、C(O)NR11R12、シアノ基、ニトロ基、又はハロゲン原子を表し、
R6は、各々独立して、1以上のハロゲン原子を有していてもよいC1-C6アルキル基、OR18、NR18R19、C(O)OR25、OC(O)R20、シアノ基、ニトロ基、又はハロゲン原子を表し、
R11、R17、R18、R19、R20、R24、及びR25は、各々独立して、水素原子又は1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基を表し、
R12は、水素原子、1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、群Fより選ばれる1の置換基を有するC1-C6アルキル基、又はS(O)2R23を表し、
R23は、1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、又は群Dより選ばれる1以上の置換基を有していてもよいフェニル基を表し、
R11a及びR12aはそれらが結合する窒素原子と一緒になって、3-7員非芳香族複素環基{該3-7員非芳香族複素環はアジリジン環、アゼチジン環、ピロリジン環、イミダゾリン環、イミダゾリジン環、ピペリジン環、テトラヒドロピリミジン環、ヘキサヒドロピリミジン環、ピペラジン環、アゼパン環、オキサゾリジン環、イソオキサゾリジン環、1,3-オキサジナン環、モルホリン環、1,4-オキサゼパン環、チアゾリジン環、イソチアゾリジン環、1,3-チアジナン環、チオモルホリン環、又は1,4-チアゼパン環を表し、群Eより選ばれる1以上の置換基を有していてもよい。}を形成し、
R13は、水素原子、1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、1以上のハロゲン原子を有していてもよいC3-C7シクロアルキル基、1以上のハロゲン原子を有していてもよい(C3-C6シクロアルキル)C1-C3アルキル基、群Dより選ばれる1以上の置換基を有していてもよいフェニル基、又は群Dより選ばれる1以上の置換基を有していてもよい5もしくは6員芳香族複素環基を表し、
R14は、1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、1以上のハロゲン原子を有していてもよいC3-C7シクロアルキル基、1以上のハロゲン原子を有していてもよい(C3-C6シクロアルキル)C1-C3アルキル基、又はフェニルC1-C3アルキル基{フェニルC1-C3アルキル基におけるフェニル部分は、群Dより選ばれる1以上の置換基を有していてもよい。}を表し、
R15、及びR16は、各々独立して、1以上のハロゲン原子を有していてもよいC1-C6アルキル基を表し、
n及びyは、各々独立して、0、1、又は2を表し、
xは、0又は1を表し、
p及びqは、各々独立して、0、1、2、又3を表し、pが2又は3である場合、複数のR6は同一でも異なっていてもよく、qが2又は3である場合、複数のR3は同一でも異なっていてもよい。
群B:1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルケニルオキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルキニルオキシ基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルファニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルフィニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルホニル基、1以上のハロゲン原子を有していてもよいC3-C6シクロアルキル基、シアノ基、ヒドロキシ基、及びハロゲン原子からなる群。
群D:1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、ヒドロキシ基、1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルケニルオキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルキニルオキシ基、スルファニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルファニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルフィニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルホニル基、アミノ基、NHR21、NR21R22、C(O)R21、OC(O)R21、C(O)OR21、シアノ基、ニトロ基、及びハロゲン原子からなる群。{R21、及びR22は、各々独立して、1以上のハロゲン原子を有していてもよいC1-C6アルキル基を表す}
群E:1以上のハロゲン原子で置換されていてもよいC1-C6鎖式炭化水素基、1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルケニルオキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルキニルオキシ基、ハロゲン原子、オキソ基、ヒドロキシ基、シアノ基、及びニトロ基からなる群。
群F:1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、NHR21、NR21R22、シアノ基、群Dより選ばれる1以上の置換基を有していてもよいフェニル基、群Dより選ばれる1以上の置換基を有していてもよい5もしくは6員芳香族複素環基、1以上のハロゲン原子を有していてもよいC3-C7シクロアルキル基、及び群Cより選ばれる1以上の置換基を有していてもよい3-7員非芳香族複素環基からなる群。
群C:1以上のハロゲン原子で置換されていてもよいC1-C6鎖式炭化水素基、1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルケニルオキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルキニルオキシ基、及びハロゲン原子からなる群。
群G:ハロゲン原子、及びC1-C6ハロアルキル基からなる群。]
群(a):
下記亜群a-1、a-2、a-3、a-4、a-5、a-6及びa-7からなる群。
亜群a-1:
アセタミプリド、クロチアニジン、ジノテフラン、イミダクロプリド、ニテンピラム、チアクロプリド、チアメトキサム、フルピラジフロン、スルホキサフロル、トリフルメゾピリム、ジクロロメソチアズ及び下記式
亜群a-2:
アクリナトリン、アレスリン、ビフェントリン、カッパビフェントリン、ビオアレスリン、ビオレスメトリン、シクロプロトリン、シフルトリン、ベータ-シフルトリン、シハロトリン、ガンマシハロトリン、ラムダシハロトリン、シペルメトリン、アルファシペルメトリン、べータシペルメトリン、シータシペルメトリン、ゼータシペルメトリン、シグマシペルメトリン、シフェノトリン、デルタメトリン、エンペントリン、エスフェンバレレート、エトフェンプロックス、フェンプロパトリン、フェンバレレート、フルシトリネート、フルメトリン、フルバリネート、タウフルバリネート、ハルフェンプロックス、ヘプタフルトリン、イミプロトリン、カデスリン、メペルフルトリン、モンフルオロトリン、ペルメトリン、フェノトリン、プラレトリン、ピレトリン、レスメトリン、シラフルオフェン、テフルトリン、カッパテフルトリン、テトラメトリン、テトラメチルフルトリン、トラロメトリン、トランスフルトリン、ベンフルトリン、フルフェンプロックス、フルメスリン、フラメトリン、メトフルトリン、プロフルトリン及びジメフルトリンからなる群。
亜群a-3:
エチプロール、フィプロニル、フルフィプロール、アフォクソラネル、フルララネル、ブロフラニリド及びフルキサメタミドからなる群。
亜群a-4:
クロラントラニリプロール、シアントラニルプロール、シクラニリプロール、フルベンジアミド、テトラニリプロール及びシハロジアミドからなる群。
亜群a-5:
アラニカルブ、アルジカルブ、ベンダイオカルブ、ベンフラカルブ、ブトカルボキシム、ブトキシカルボキシム、カルバリル、カルボフラン、カルボスルファン、エチオフェンカルブ、フェノブカルブ、ホルメタネート、フラチオカルブ、イソプロカルブ、メチオカルブ、メソミル、メトルカルブ、オキサミル、ピリミカーブ、プロポキスル、チオジカルブ、チオファノックス、トリアザメート、トリメタカルブ、XMC及びキシリルカルブからなる群。
亜群a-6:
アバメクチン、フルエンスルホン、チオキサザフェン及びフルアザインドリジンからなる群。
亜群a-7:
菌根菌、アルスロボトリス・ダクチロイデス、バチルス・チューリンゲンシス、バチルス・フィルムス、バチルス・メガテリウム、バチルス・アミロリケファシエンス、ヒルステラ・ロッシリエンシス、ヒルステラ・ミネソテンシス、モナクロスポリウム・フィマトパガム、パスツーリア・ニシザワエ、パスツーリア・ペネトランス、パスツーリア・ウスガエ、バーティシリウム・クラミドスポリウム及びハーピンタンパクからなる群。
群(b):
下記亜群b-1、b-2、b-3、b-4、b-5、b-6、b-7、b-8及びb-9からなる群。
亜群b-1:
アザコナゾール、ビテルタノール、ブロムコナゾール、シプロコナゾール、ジフェノコナゾール、ジニコナゾール、ジニコナゾールM、エポキシコナゾール、エタコナゾール、フェナリモル、フェンブコナゾール、フルキンコナゾール、キンコナゾール、フルシラゾール、フルトリアホール、ヘキサコナゾール、イマザリル、イミベンコナゾール、イプコナゾール、メトコナゾール、ミクロブタニル、ヌアリモール、オキスポコナゾール、オキスポコナゾールフマル酸塩、ペフラゾエート、ペンコナゾール、プロクロラズ、プロピコナゾール、プロチオコナゾール、ピリフェノックス、ピリソキサゾール、シメコナゾール、テブコナゾール、テトラコナゾール、トリアジメホン、トリアジメノール、トリフルミゾール、トリホリン及びトリチコナゾールからなる群。
亜群b-2:
アゾキシストロビン、クモキシストロビン、ジモキシストロビン、エノキサストロビン、ファモキサドン、フェンアミドン、フェナミンストロビン、フルフェノキシストロビン、フルオキサストロビン、クレソキシム-メチル、マンデストロビン、メトミノストロビン、オリサストロビン、ピコキシストロビン、ピラクロストロビン、ピラメトストロビン、ピラオキシストロビン、トリフロキシストロビン、ピリベンカルブ、トリクロピリカルブ、シアゾファミド及びアミスルブロムからなる群。
亜群b-3:
ベナラキシル、ベナラキシルM、フララキシル、メタラキシル、メタラキシルM、オキサジキシル及びオフラセからなる群。
亜群b-4:
ベノダニル、ベンゾビンジフルピル、ビキサフェン、ボスカリド、カルボキシン、フェンフラム、フルオピラム、フルトラニル、フルキサピロキサド、フラメトピル、イソフェタミド、イソピラザム、メプロニル、オキシカルボキシン、ペンチオピラド、ペンフルフェン、セダキサン、チフルザミド、ピラジフルミド、ピジフルメトフェン、3-ジフルオロメチル-1-メチル-N-(1,1,3-トリメチルインダン-4-イル)ピラゾール-4-カルボキサミド、3-ジフルオロメチル-1-メチル-N-[(3R)-1,1,3-トリメチルインダン-4-イル]ピラゾール-4-カルボキサミド、3-ジフルオロメチル-N-(7-フルオロ-1,1,3-トリメチルインダン-4-イル)-1-メチルピラゾール-4-カルボキサミド、3-ジフルオロメチル-N-[(3R)-7-フルオロ-1,1,3-トリメチルインダン-4-イル]-1-メチルピラゾール-4-カルボキサミド及びN-シクロプロピル-3-(ジフルオロメチル)-5-フルオロ-N-(5-クロロ-2-イソプロピルベンジル)-1-メチル-1H-ピラゾール-4-カルボキサミドからなる群。
亜群b-5:
ベノミル、カルベンダジム、フベリダゾール、チアベンダゾール、チオファネート、チオファネートメチル、ジエトフェンカルブ、ゾキサミド及びエタボキサムからなる群。
亜群b-6:
フェルバム、マンゼブ、マンネブ、メチラム、プロピネブ、チウラム、ジネブ、ジラム、キャプタン、キャプタホール、ホルペット、クロロタロニル、トリルフルアニド、グアザチン、イミノクタジン、アニラジン、ジチアノン、キノメチオナート及びフルオルイミドからなる群。
亜群b-7:
ジメトモルフ、フルモルフ、ピリモルフ、ベンチアバリカルブ、ベンチアバリカルブイソプロピル、イプロバリカルブ、バリフェナレート及びマンジプロパミドからなる群。
亜群b-8:
フェンピクロニル、フルジオキソニル、クロゾリネート、イプロジオン、プロシミドン及びビンクロゾリンからなる群。
亜群b-9:
トルクロホスメチル、オキサチアピプロリン、ピカルブトラゾクス、フルオピコリド及びシルチオファムからなる群。
[2]
前記群(a)より選ばれる1種以上の化合物を含有し、前記式(I)で示される化合物又はそのNオキシド化合物と、前記群(a)より選ばれる1種以上の化合物との含有量の比が、重量比で100:1~1:100である[1]に記載の有害生物防除組成物。
[3]
前記群(a)より選ばれる1種以上の化合物を含有し、前記式(I)で示される化合物又はそのNオキシド化合物と、前記群(a)より選ばれる1種以上の化合物との含有量の比が、重量比で10:1~1:10である[1]に記載の有害生物防除組成物。
[4]
前記群(b)より選ばれる1種以上の化合物を含有し、前記式(I)で示される化合物又はそのNオキシド化合物と、前記群(b)より選ばれる1種以上の化合物との含有量の比が、重量比で10000:1~1:100である[1]に記載の有害生物防除組成物。
[5]
前記群(b)より選ばれる1種以上の化合物を含有し、前記式(I)で示される化合物又はそのNオキシド化合物と、前記群(b)より選ばれる1種以上の化合物との含有量の比が、重量比で1000:1~1:10である[1]に記載の有害生物防除組成物。
[6]
[1]~[5]のいずれかに記載の有害生物防除組成物の有効量を、有害生物又は有害生物の生息場所に施用する工程を有する有害生物の防除方法。
[7]
[1]~[5]のいずれかに記載の有害生物防除組成物の有効量を、植物又は植物を栽培する土壌に施用する工程を有する有害生物の防除方法。
[8]
[1]~[5]のいずれかに記載の有害生物防除組成物の有効量を、種子又は球根に施用する工程を有する有害生物の防除方法。
[9]
[1]~[5]のいずれかに記載の有害生物防除組成物の有効量を保持している種子又は球根。 The present invention is as follows.
[1]
A compound represented by the following formula (I) or an N oxide compound thereof;
A pest control composition comprising one or more compounds selected from the group consisting of the following group (a) and the following group (b).
Formula (I):
R 1 is a C2-C10 haloalkyl group, a C3-C10 haloalkenyl group, a C3-C10 haloalkynyl group, one or more halogen atoms (C1-C5 alkoxy), a C2-C5 alkyl group, and one or more halogen atoms. (C1-C5 alkylsulfanyl) C2-C5 alkyl group, having one or more halogen atoms (C1-C5 alkylsulfinyl) C2-C5 alkyl group, having one or more halogen atoms (C1-C5 alkylsulfonyl) C2-C5 An alkyl group, a (C3-C7 cycloalkyl) C1-C3 alkyl group having one or more substituents selected from group G, or a C3-C7 cycloalkyl group having one or more substituents selected from group G;
R 2 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a cyclopropylmethyl group, or a cyclopropyl group;
R 3 each independently has a C1-C6 chain hydrocarbon group which may have one or more substituents selected from group B, and one or more substituents selected from group D. Or a phenyl group, a 5- or 6-membered aromatic heterocyclic group optionally having one or more substituents selected from group D, OR 12 , NR 11 R 12 , NR 11a R 12a , NR 24 NR 11 R 12 , NR 11 C (O) R 13 , NR 24 NR 11 C (O) R 13 , NR 11 C (O) OR 14 , NR 24 NR 11 C (O) OR 14 , NR 11 C (O) NR 15 R 16 , NR 24 NR 11 C (O) NR 15 R 16 , N = CHNR 15 R 16 , N = S (O) x R 15 R 16 , S (O) y R 15 , C (O) OR 17 , C (O) NR 11 R 12 , a cyano group, a nitro group, or a halogen atom,
R 6 is each independently a C1-C6 alkyl group optionally having one or more halogen atoms, OR 18 , NR 18 R 19 , C (O) OR 25 , OC (O) R 20 , cyano Represents a group, a nitro group, or a halogen atom,
R 11 , R 17 , R 18 , R 19 , R 20 , R 24 , and R 25 are each independently a hydrogen atom or a C1-C6 chain hydrocarbon optionally having one or more halogen atoms Represents a group,
R 12 represents a hydrogen atom, a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a C1-C6 alkyl group having one substituent selected from Group F, or S (O) 2 represents R 23 ,
R 23 represents a C1-C6 chain hydrocarbon group which may have one or more halogen atoms, or a phenyl group which may have one or more substituents selected from group D;
R 11a and R 12a are taken together with the nitrogen atom to which they are attached to form a 3-7-membered non-aromatic heterocyclic group (the 3-7-membered non-aromatic heterocyclic ring is an aziridine ring, azetidine ring, pyrrolidine ring, imidazoline Ring, imidazolidine ring, piperidine ring, tetrahydropyrimidine ring, hexahydropyrimidine ring, piperazine ring, azepane ring, oxazolidine ring, isoxazolidine ring, 1,3-oxazinane ring, morpholine ring, 1,4-oxazepane ring, thiazolidine ring , An isothiazolidine ring, a 1,3-thiazinane ring, a thiomorpholine ring, or a 1,4-thiazepan ring, which may have one or more substituents selected from Group E. },
R 13 represents a hydrogen atom, a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a C3-C7 cycloalkyl group optionally having one or more halogen atoms, one or more A (C3-C6 cycloalkyl) C1-C3 alkyl group optionally having a halogen atom, a phenyl group optionally having one or more substituents selected from group D, or one or more selected from group D Represents a 5- or 6-membered aromatic heterocyclic group optionally having
R 14 represents a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a C3-C7 cycloalkyl group optionally having one or more halogen atoms, and one or more halogen atoms. The optionally substituted (C3-C6 cycloalkyl) C1-C3 alkyl group or the phenyl C1-C3 alkyl group {the phenyl moiety in the phenyl C1-C3 alkyl group has one or more substituents selected from group D; You may do it. },
R 15 and R 16 each independently represents a C1-C6 alkyl group optionally having one or more halogen atoms,
n and y each independently represents 0, 1, or 2;
x represents 0 or 1;
p and q each independently represent 0, 1, 2, or 3, and when p is 2 or 3, a plurality of R 6 may be the same or different, and q is 2 or 3 In this case, the plurality of R 3 may be the same or different.
Group B: C1-C6 alkoxy group optionally having one or more halogen atoms, C3-C6 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms A C3-C6 alkynyloxy group which may have one or more halogen atoms, a C1-C6 alkylsulfanyl group which may have one or more halogen atoms, a C1-C6 alkylsulfinyl group which may have one or more halogen atoms, one or more A group consisting of a C1-C6 alkylsulfonyl group optionally having a halogen atom, a C3-C6 cycloalkyl group optionally having one or more halogen atoms, a cyano group, a hydroxy group, and a halogen atom.
Group D: C1-C6 chain hydrocarbon group which may have one or more halogen atoms, hydroxy group, C1-C6 alkoxy group which may have one or more halogen atoms, one or more halogen atoms A C3-C6 alkenyloxy group which may have one or more, a C3-C6 alkynyloxy group which may have one or more halogen atoms, a sulfanyl group, or a C1-C6 which may have one or more halogen atoms. C6 alkylsulfanyl group, C1-C6 alkylsulfinyl group optionally having one or more halogen atoms, C1-C6 alkylsulfonyl group optionally having one or more halogen atoms, amino group, NHR 21 , NR A group consisting of 21 R 22 , C (O) R 21 , OC (O) R 21 , C (O) OR 21 , a cyano group, a nitro group, and a halogen atom. {R 21 and R 22 each independently represents a C1-C6 alkyl group optionally having one or more halogen atoms}
Group E: C1-C6 chain hydrocarbon group which may be substituted with one or more halogen atoms, C1-C6 alkoxy group which may have one or more halogen atoms, one or more halogen atoms A group consisting of a C3-C6 alkenyloxy group which may have one or more, a C3-C6 alkynyloxy group which may have one or more halogen atoms, a halogen atom, an oxo group, a hydroxy group, a cyano group and a nitro group.
Group F: C1-C6 alkoxy group optionally having one or more halogen atoms, NHR 21 , NR 21 R 22 , cyano group, phenyl optionally having one or more substituents selected from Group D A group, a 5- or 6-membered aromatic heterocyclic group optionally having one or more substituents selected from group D, a C3-C7 cycloalkyl group optionally having one or more halogen atoms, and a group A group consisting of a 3-7-membered non-aromatic heterocyclic group which may have one or more substituents selected from C.
Group C: C1-C6 chain hydrocarbon group optionally substituted with one or more halogen atoms, C1-C6 alkoxy group optionally having one or more halogen atoms, one or more halogen atoms A group consisting of an optionally substituted C3-C6 alkenyloxy group, an optionally substituted C3-C6 alkynyloxy group, and a halogen atom.
Group G: A group consisting of a halogen atom and a C1-C6 haloalkyl group. ]
Group (a):
A group consisting of the following subgroups a-1, a-2, a-3, a-4, a-5, a-6 and a-7.
Subgroup a-1:
Acetamiprid, clothianidin, dinotefuran, imidacloprid, nitenpyram, thiacloprid, thiamethoxam, flupiradifurone, sulfoxafurol, triflumezopyrim, dichloromesothiaz and the following formula
Subgroup a-2:
Acrinatrin, Aleslin, Bifenthrin, Kappabifenthrin, Bioarethrin, Bioresmethrin, Cycloproton, Cyfluthrin, Beta-Cyfluthrin, Cyhalothrin, Gamma Cyhalothrin, Lambdacyhalothrin, Cypermethrin, Alpha Cypermethrin, Betacypermethrin, Theta Permethrin, zeta-cypermethrin, sigma-permethrin, ciphenothrin, deltamethrin, empentrin, esfenvalerate, etofenprox, fenpropatoline, fenvalerate, flucitrinate, flumethrin, fluvinate, taufulvalinate, halfenprox, hepta Flutrin, imiprothrin, cadreslin, meperfluthrin, monfluorotrin, permethrin, phenothrin Prallethrin, pyrethrins, resmethrin, silafluofen, tefluthrin, kappa Te full Trinh, tetramethrin, tetramethyl full Trinh, tralomethrin, transfluthrin, Benfurutorin, full Fen flufenprox, flumethrin, furamethrin, metofluthrin, the group consisting of profluthrin and dimefluthrin.
Subgroup a-3:
A group consisting of etiprol, fipronil, flufiprolol, afoxolanel, fluralanel, brofuranilide and floxamethamide.
Subgroup a-4:
A group consisting of chlorantraniliprole, cyantranylprolol, cyclaniliprol, fulvendiamide, tetraniprolol and cyhalodiamide.
Subgroup a-5:
Alanicarb, aldicarb, bendiocarb, benfuracarb, butocarboxym, butoxycarboxym, carbaryl, carbofuran, carbosulfan, ethiophene carb, fenobucarb, formethanate, furthiocarb, isoprocarb, methiocarb, mesomil, metolcarb, oxamyl, pyrimicarb, dioxycarb, propoxyl Group consisting of thiophanox, triazamate, trimetacarb, XMC and xylylcarb.
Subgroup a-6:
A group consisting of abamectin, fluenesulfone, thioxazaphene and fluazaindolizine.
Subgroup a-7:
Mycorrhizal fungi, Arthrobotris dacteroides, Bacillus thuringiensis, Bacillus films, Bacillus megaterium, Bacillus amyloliquefaciens, Hilstera rosiliensis, Hilstera minnesotensis, Monacrosporium fimatopagum, Pasteurian nisawae , Pasteuria penetrans, Pasteuria usgae, Verticillium chlamydosporium and Harpin protein.
Group (b):
A group consisting of the following subgroups b-1, b-2, b-3, b-4, b-5, b-6, b-7, b-8 and b-9.
Subgroup b-1:
Azaconazole, viteltanol, bromconazole, cyproconazole, difenoconazole, dinicoazole, diniconazole M, epoxiconazole, etaconazole, phenalimol, fenbuconazole, fluquinconazole, quinconazole, flusilazole, flutriazole, hexaconazole, imazalil, Imibenconazole, ipconazole, metconazole, microbutanyl, nuarimol, oxpoconazole, oxpoconazole fumarate, pefazoate, penconazole, prochloraz, propiconazole, prothioconazole, pyrifenox, pyrisoxazole, cimeconazole, tebuconazole, tetrabuconazole Conazole, triadimephone, triadimenol, triflumizole, trifolin and tritico A group consisting of nasol.
Subgroup b-2:
Azoxystrobin, cumoxystrobin, dimoxystrobin, enoxastrobin, famoxadone, fenamidone, phenaminestrobin, fluphenoxystrobin, floxastrobin, cresoxime-methyl, mandestrobin, methinostrobin, A group consisting of orissastrobin, picoxystrobin, pyraclostrobin, pyramethostrobin, pyroxystrobin, trifloxystrobin, pyribencarb, triclopyricarb, cyazofamide and amisulbrom.
Subgroup b-3:
A group consisting of benalaxyl, benalaxyl M, furaxyl, metalaxyl, metalaxyl M, oxadixyl and oflase.
Subgroup b-4:
Benodanyl, benzobindiflupyr, bixaphene, boscalid, carboxin, fenfram, fluopyram, flutolanil, fluxapyroxad, furametopyr, isophetamide, isopyrazam, mepronil, oxycarboxyl, pentiopyrad, penflufen, cedaxane, tifluzamide, pyradiflumide Phen, 3-difluoromethyl-1-methyl-N- (1,1,3-trimethylindan-4-yl) pyrazole-4-carboxamide, 3-difluoromethyl-1-methyl-N-[(3R) -1 , 1,3-Trimethylindan-4-yl] pyrazole-4-carboxamide, 3-difluoromethyl-N- (7-fluoro-1,1,3-trimethylindan-4-yl) -1-methylpyrazole-4 -Carboxa 3-difluoromethyl-N-[(3R) -7-fluoro-1,1,3-trimethylindan-4-yl] -1-methylpyrazole-4-carboxamide and N-cyclopropyl-3- (difluoro A group consisting of (methyl) -5-fluoro-N- (5-chloro-2-isopropylbenzyl) -1-methyl-1H-pyrazole-4-carboxamide.
Subgroup b-5:
The group consisting of benomyl, carbendazim, fuberidazole, thiabendazole, thiophanate, thiophanate methyl, dietofencarb, zoxamide and ethaboxam.
Subgroup b-6:
A group consisting of felbam, manzeb, manneb, methyle, propineb, thiuram, dineb, ziram, captan, captahol, holpet, chlorothalonil, tolylfluanid, guazatine, iminotadine, anilazine, dithianone, quinomethionate and fluorimide.
Subgroup b-7:
A group consisting of dimethomorph, flumorph, pyrimorph, bench avaricarb, bench avaricarb isopropyl, iprovaricarb, varifenalate and mandipropamide.
Subgroup b-8:
A group consisting of fenpiclonyl, fludioxonil, clozolinate, iprodione, procymidone and vinclozolin.
Subgroup b-9:
The group consisting of toluclophosmethyl, oxathiapiproline, picalbutrazox, fluopicolide and silthiofam.
[2]
A content of one or more compounds selected from the group (a), the compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (a) The pesticidal composition according to [1], wherein the ratio of is 100: 1 to 1: 100 by weight.
[3]
A content of one or more compounds selected from the group (a), the compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (a) The pesticidal composition according to [1], wherein the weight ratio is 10: 1 to 1:10 by weight.
[4]
A content of one or more compounds selected from the group (b), a compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (b) The pesticidal composition according to [1], wherein the weight ratio is 10,000: 1 to 1: 100 by weight.
[5]
A content of one or more compounds selected from the group (b), a compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (b) The pest control composition according to [1], wherein the weight ratio is 1000: 1 to 1:10 by weight.
[6]
A pest control method comprising a step of applying an effective amount of the pest control composition according to any one of [1] to [5] to a pest or a habitat of the pest.
[7]
A method for controlling pests, comprising a step of applying an effective amount of the pest control composition according to any one of [1] to [5] to a plant or soil for cultivating the plant.
[8]
A method for controlling pests, which comprises a step of applying an effective amount of the pest control composition according to any one of [1] to [5] to seeds or bulbs.
[9]
[1] A seed or bulb having an effective amount of the pesticidal composition according to any one of [1] to [5].
本発明により、有害生物を防除することができる。
According to the present invention, pests can be controlled.
本発明の有害生物防除組成物(以下、本発明組成物と記す)は、前記式(I)で示される化合物又はそのNオキシド化合物(以下、前記式(I)で示される化合物及びそのNオキシド化合物を本ビピリジン化合物と記す)と、前記群(a)及び前記群(b)からなる群より選ばれる1種以上の化合物(以下、本化合物と記す)とを含有する。
The pest control composition of the present invention (hereinafter referred to as the present composition) comprises a compound represented by the formula (I) or an N oxide compound thereof (hereinafter referred to as a compound represented by the formula (I) and an N oxide thereof. The compound is referred to as the present bipyridine compound) and one or more compounds selected from the group consisting of the group (a) and the group (b) (hereinafter referred to as the present compound).
本明細書の記載において用いられる置換基について、例を挙げて以下に説明する。
「1以上のハロゲン原子を有していてもよい」とは、2以上のハロゲン原子を有している場合、それらのハロゲン原子は互いに同一でも異なっていてもよいことを表す。
本明細書における「CX-CY」との表記は、炭素原子数がX乃至Yであることを意味する。例えば「C1-C6」の表記は、炭素原子数が1乃至6であることを意味する。 Examples of substituents used in the description of the present specification will be described below.
“It may have one or more halogen atoms” means that when it has two or more halogen atoms, these halogen atoms may be the same or different from each other.
In this specification, the expression “CX-CY” means that the number of carbon atoms is X to Y. For example, the notation “C1-C6” means 1 to 6 carbon atoms.
「1以上のハロゲン原子を有していてもよい」とは、2以上のハロゲン原子を有している場合、それらのハロゲン原子は互いに同一でも異なっていてもよいことを表す。
本明細書における「CX-CY」との表記は、炭素原子数がX乃至Yであることを意味する。例えば「C1-C6」の表記は、炭素原子数が1乃至6であることを意味する。 Examples of substituents used in the description of the present specification will be described below.
“It may have one or more halogen atoms” means that when it has two or more halogen atoms, these halogen atoms may be the same or different from each other.
In this specification, the expression “CX-CY” means that the number of carbon atoms is X to Y. For example, the notation “C1-C6” means 1 to 6 carbon atoms.
ハロゲン原子とは、フッ素原子、塩素原子、臭素原子又はヨウ素原子を表す。
A halogen atom represents a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
「鎖式炭化水素基」とは、アルキル基、アルケニル基及びアルキニル基を表す。
「アルキル基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、1,1-ジメチルプロピル基、1,2-ジメチルプロピル基、1-エチルプロピル基、ブチル基、tert-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、及びデシル基が挙げられる。
「アルケニル基」としては、例えばビニル基、1-プロペニル基、2-プロペニル基、1-メチル-1-プロペニル基、1-メチル-2-プロペニル基、1,2-ジメチル-1-プロペニル基、1,1-ジメチル-2-プロペニル基、1-エチル-1-プロペニル基、1-エチル-2-プロペニル基、3-ブテニル基、4-ペンテニル基、5-ヘキセニル基ヘプテニル基、オクテニル基、ノネニル基、及びデセニル基が挙げられる。
「アルキニル基」としては、例えばエチニル基、1-プロピニル基、2-プロピニル基、1-メチル-2-プロピニル基、1,1-ジメチル-2-プロピニル基、1-エチル-2-プロピニル基、2-ブチニル基、4-ペンチニル基、5-ヘキシニル基、ヘプチニル基、オクチニル基、ノニニル基、及びデシニル基が挙げられる。
「C2-C10ハロアルキル基」とは、C2-C10アルキル基の水素原子がハロゲン原子で置換された基を表し、例えば、クロロエチル基、2,2,2-トリフルオロエチル基、2-ブロモ-1,1,2,2-テトラフルオロエチル基、2,2,3,3-テトラフルオロプロピル基、1-メチル-2,2,3,3-テトラフルオロプロピル基、ペルフルオロヘキシル基及びペルフルオロデシル基が挙げられる。
「C3-C10ハロアルケニル基」とは、C3-C10アルケニル基の1以上の水素原子がハロゲン原子で置換された基を表し、例えば、C3-C10フルオロアルケニル基が挙げられる。「C3-C10ハロアルケニル基」としては、例えば、3,3,3-トリフロオロ-1-プロぺニル基、及び1-トリフルオロ-3-ブテニル基が挙げられる。
「C3-C10ハロアルキニル基」とは、C3-C10アルキニル基の1以上の水素原子がハロゲン原子で置換された基を表し、例えば、C3-C10フルオロアルキニル基が挙げられる。「C3-C10ハロアルキニル基」としては、例えば、3,3,3-トリフロオロ-1-プロピニル基が挙げられる。
「1以上のハロゲン原子を有していてもよいC1-C6アルキル基」としては、例えば、C1-C6アルキル基の1以上の水素原子がハロゲン原子で置換されている基を表し、例えば、2,2,2-トリフルオロエチル基、2,2,3,3-テトラフルオロプロピル基、2,2,3,4,4,4-ヘキサフルオロプロピル基が挙げられる。
「1以上のハロゲン原子を有するC1-C6鎖式炭化水素基」とは、1以上のハロゲン原子を有するC1-C6アルキル基、C2-C6アルケニル基、またはC2-C6アルキニル基を表す。「1以上のハロゲン原子を有するC1-C6アルキル基」とは、上記「1以上のハロゲン原子を有していてもよいC1-C6アルキル基」および上記「1以上のハロゲン原子を有するC2-C10鎖式炭化水素基」の定義に包含される。「1以上のハロゲン原子を有するC2-C6アルケニル基」および「1以上のハロゲン原子を有するC2-C6アルキニル基」とは、上記「1以上のハロゲン原子を有するC2-C10鎖式炭化水素基」の定義に包含される。 The “chain hydrocarbon group” represents an alkyl group, an alkenyl group, and an alkynyl group.
Examples of the “alkyl group” include methyl group, ethyl group, propyl group, isopropyl group, 1,1-dimethylpropyl group, 1,2-dimethylpropyl group, 1-ethylpropyl group, butyl group, tert-butyl group, A pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, and a decyl group are mentioned.
Examples of the “alkenyl group” include a vinyl group, 1-propenyl group, 2-propenyl group, 1-methyl-1-propenyl group, 1-methyl-2-propenyl group, 1,2-dimethyl-1-propenyl group, 1,1-dimethyl-2-propenyl group, 1-ethyl-1-propenyl group, 1-ethyl-2-propenyl group, 3-butenyl group, 4-pentenyl group, 5-hexenyl group heptenyl group, octenyl group, nonenyl Group, and decenyl group.
Examples of the “alkynyl group” include ethynyl group, 1-propynyl group, 2-propynyl group, 1-methyl-2-propynyl group, 1,1-dimethyl-2-propynyl group, 1-ethyl-2-propynyl group, Examples include 2-butynyl group, 4-pentynyl group, 5-hexynyl group, heptynyl group, octynyl group, nonynyl group, and decynyl group.
The “C2-C10 haloalkyl group” represents a group in which a hydrogen atom of a C2-C10 alkyl group is substituted with a halogen atom, and examples thereof include a chloroethyl group, a 2,2,2-trifluoroethyl group, 2-bromo-1 1,2,2,2-tetrafluoroethyl group, 2,2,3,3-tetrafluoropropyl group, 1-methyl-2,2,3,3-tetrafluoropropyl group, perfluorohexyl group and perfluorodecyl group Can be mentioned.
The “C3-C10 haloalkenyl group” represents a group in which one or more hydrogen atoms of the C3-C10 alkenyl group are substituted with a halogen atom, and examples thereof include a C3-C10 fluoroalkenyl group. Examples of the “C3-C10 haloalkenyl group” include a 3,3,3-trifluoro-1-propenyl group and a 1-trifluoro-3-butenyl group.
The “C3-C10 haloalkynyl group” represents a group in which one or more hydrogen atoms of the C3-C10 alkynyl group are substituted with a halogen atom, and examples thereof include a C3-C10 fluoroalkynyl group. Examples of the “C3-C10 haloalkynyl group” include a 3,3,3-trifluoro-1-propynyl group.
The “C1-C6 alkyl group optionally having one or more halogen atoms” represents, for example, a group in which one or more hydrogen atoms of the C1-C6 alkyl group are substituted with a halogen atom. , 2,2-trifluoroethyl group, 2,2,3,3-tetrafluoropropyl group, 2,2,3,4,4,4-hexafluoropropyl group.
The “C1-C6 chain hydrocarbon group having one or more halogen atoms” represents a C1-C6 alkyl group, a C2-C6 alkenyl group, or a C2-C6 alkynyl group having one or more halogen atoms. The “C1-C6 alkyl group having one or more halogen atoms” refers to the “C1-C6 alkyl group optionally having one or more halogen atoms” and the “C2-C10 having one or more halogen atoms”. It is included in the definition of “chain hydrocarbon group”. “C2-C6 alkenyl group having one or more halogen atoms” and “C2-C6 alkynyl group having one or more halogen atoms” mean the above “C2-C10 chain hydrocarbon group having one or more halogen atoms”. Included in the definition of
「アルキル基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、1,1-ジメチルプロピル基、1,2-ジメチルプロピル基、1-エチルプロピル基、ブチル基、tert-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、及びデシル基が挙げられる。
「アルケニル基」としては、例えばビニル基、1-プロペニル基、2-プロペニル基、1-メチル-1-プロペニル基、1-メチル-2-プロペニル基、1,2-ジメチル-1-プロペニル基、1,1-ジメチル-2-プロペニル基、1-エチル-1-プロペニル基、1-エチル-2-プロペニル基、3-ブテニル基、4-ペンテニル基、5-ヘキセニル基ヘプテニル基、オクテニル基、ノネニル基、及びデセニル基が挙げられる。
「アルキニル基」としては、例えばエチニル基、1-プロピニル基、2-プロピニル基、1-メチル-2-プロピニル基、1,1-ジメチル-2-プロピニル基、1-エチル-2-プロピニル基、2-ブチニル基、4-ペンチニル基、5-ヘキシニル基、ヘプチニル基、オクチニル基、ノニニル基、及びデシニル基が挙げられる。
「C2-C10ハロアルキル基」とは、C2-C10アルキル基の水素原子がハロゲン原子で置換された基を表し、例えば、クロロエチル基、2,2,2-トリフルオロエチル基、2-ブロモ-1,1,2,2-テトラフルオロエチル基、2,2,3,3-テトラフルオロプロピル基、1-メチル-2,2,3,3-テトラフルオロプロピル基、ペルフルオロヘキシル基及びペルフルオロデシル基が挙げられる。
「C3-C10ハロアルケニル基」とは、C3-C10アルケニル基の1以上の水素原子がハロゲン原子で置換された基を表し、例えば、C3-C10フルオロアルケニル基が挙げられる。「C3-C10ハロアルケニル基」としては、例えば、3,3,3-トリフロオロ-1-プロぺニル基、及び1-トリフルオロ-3-ブテニル基が挙げられる。
「C3-C10ハロアルキニル基」とは、C3-C10アルキニル基の1以上の水素原子がハロゲン原子で置換された基を表し、例えば、C3-C10フルオロアルキニル基が挙げられる。「C3-C10ハロアルキニル基」としては、例えば、3,3,3-トリフロオロ-1-プロピニル基が挙げられる。
「1以上のハロゲン原子を有していてもよいC1-C6アルキル基」としては、例えば、C1-C6アルキル基の1以上の水素原子がハロゲン原子で置換されている基を表し、例えば、2,2,2-トリフルオロエチル基、2,2,3,3-テトラフルオロプロピル基、2,2,3,4,4,4-ヘキサフルオロプロピル基が挙げられる。
「1以上のハロゲン原子を有するC1-C6鎖式炭化水素基」とは、1以上のハロゲン原子を有するC1-C6アルキル基、C2-C6アルケニル基、またはC2-C6アルキニル基を表す。「1以上のハロゲン原子を有するC1-C6アルキル基」とは、上記「1以上のハロゲン原子を有していてもよいC1-C6アルキル基」および上記「1以上のハロゲン原子を有するC2-C10鎖式炭化水素基」の定義に包含される。「1以上のハロゲン原子を有するC2-C6アルケニル基」および「1以上のハロゲン原子を有するC2-C6アルキニル基」とは、上記「1以上のハロゲン原子を有するC2-C10鎖式炭化水素基」の定義に包含される。 The “chain hydrocarbon group” represents an alkyl group, an alkenyl group, and an alkynyl group.
Examples of the “alkyl group” include methyl group, ethyl group, propyl group, isopropyl group, 1,1-dimethylpropyl group, 1,2-dimethylpropyl group, 1-ethylpropyl group, butyl group, tert-butyl group, A pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, and a decyl group are mentioned.
Examples of the “alkenyl group” include a vinyl group, 1-propenyl group, 2-propenyl group, 1-methyl-1-propenyl group, 1-methyl-2-propenyl group, 1,2-dimethyl-1-propenyl group, 1,1-dimethyl-2-propenyl group, 1-ethyl-1-propenyl group, 1-ethyl-2-propenyl group, 3-butenyl group, 4-pentenyl group, 5-hexenyl group heptenyl group, octenyl group, nonenyl Group, and decenyl group.
Examples of the “alkynyl group” include ethynyl group, 1-propynyl group, 2-propynyl group, 1-methyl-2-propynyl group, 1,1-dimethyl-2-propynyl group, 1-ethyl-2-propynyl group, Examples include 2-butynyl group, 4-pentynyl group, 5-hexynyl group, heptynyl group, octynyl group, nonynyl group, and decynyl group.
The “C2-C10 haloalkyl group” represents a group in which a hydrogen atom of a C2-C10 alkyl group is substituted with a halogen atom, and examples thereof include a chloroethyl group, a 2,2,2-trifluoroethyl group, 2-bromo-1 1,2,2,2-tetrafluoroethyl group, 2,2,3,3-tetrafluoropropyl group, 1-methyl-2,2,3,3-tetrafluoropropyl group, perfluorohexyl group and perfluorodecyl group Can be mentioned.
The “C3-C10 haloalkenyl group” represents a group in which one or more hydrogen atoms of the C3-C10 alkenyl group are substituted with a halogen atom, and examples thereof include a C3-C10 fluoroalkenyl group. Examples of the “C3-C10 haloalkenyl group” include a 3,3,3-trifluoro-1-propenyl group and a 1-trifluoro-3-butenyl group.
The “C3-C10 haloalkynyl group” represents a group in which one or more hydrogen atoms of the C3-C10 alkynyl group are substituted with a halogen atom, and examples thereof include a C3-C10 fluoroalkynyl group. Examples of the “C3-C10 haloalkynyl group” include a 3,3,3-trifluoro-1-propynyl group.
The “C1-C6 alkyl group optionally having one or more halogen atoms” represents, for example, a group in which one or more hydrogen atoms of the C1-C6 alkyl group are substituted with a halogen atom. , 2,2-trifluoroethyl group, 2,2,3,3-tetrafluoropropyl group, 2,2,3,4,4,4-hexafluoropropyl group.
The “C1-C6 chain hydrocarbon group having one or more halogen atoms” represents a C1-C6 alkyl group, a C2-C6 alkenyl group, or a C2-C6 alkynyl group having one or more halogen atoms. The “C1-C6 alkyl group having one or more halogen atoms” refers to the “C1-C6 alkyl group optionally having one or more halogen atoms” and the “C2-C10 having one or more halogen atoms”. It is included in the definition of “chain hydrocarbon group”. “C2-C6 alkenyl group having one or more halogen atoms” and “C2-C6 alkynyl group having one or more halogen atoms” mean the above “C2-C10 chain hydrocarbon group having one or more halogen atoms”. Included in the definition of
「シクロアルキル基」としては、例えばシクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基及びシクロヘプチル基が挙げられる。
Examples of the “cycloalkyl group” include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, and a cycloheptyl group.
「アルコキシ基」とは、上記アルキル基が酸素原子と結合した1価の基を表し、C1-C6アルコキシ基としては、例えばメトキシ基、エトキシ基、n-プロポキシ基、i-プロポキシ基、n-ブトキシ基、t-ブトキシ基、s-ブトキシ基、3-メチルブトキシ基などが挙げられる。
The “alkoxy group” represents a monovalent group in which the alkyl group is bonded to an oxygen atom. Examples of the C1-C6 alkoxy group include a methoxy group, an ethoxy group, an n-propoxy group, an i-propoxy group, an n- Examples include butoxy, t-butoxy, s-butoxy, and 3-methylbutoxy.
「3-7員非芳香族複素環基」とは、アジリジン環、アゼチジン環、ピロリジン環、イミダゾリン環、イミダゾリジン環、ピペリジン環、テトラヒドロピリミジン環、ヘキサヒドロピリミジン環、ピペラジン環、アゼパン環、オキサゾリジン環、イソオキサゾリジン環、1,3-オキサジナン環、モルホリン環、1,4-オキサゼパン環、チアゾリジン環、イソチアゾリジン環、1,3-チアジナン環、チオモルホリン環、又は1,4-チアゼパン環を表し、群Eより選ばれる1以上の置換基を有していてもよい3-7員非芳香族複素環基としては、例えば下記に示す基が挙げられる。
“3-7-membered non-aromatic heterocyclic group” means an aziridine ring, azetidine ring, pyrrolidine ring, imidazoline ring, imidazolidine ring, piperidine ring, tetrahydropyrimidine ring, hexahydropyrimidine ring, piperazine ring, azepane ring, oxazolidine Ring, isoxazolidine ring, 1,3-oxazinane ring, morpholine ring, 1,4-oxazepane ring, thiazolidine ring, isothiazolidine ring, 1,3-thiazinane ring, thiomorpholine ring, or 1,4-thiazepane ring Examples of the 3-7-membered non-aromatic heterocyclic group optionally having one or more substituents selected from group E include the following groups.
Nオキシド化合物としては、式(Id)で示される化合物、式(Ie)で示される化合物、及び式(If)で示される化合物が挙げられる。
[式中、記号は前記と同じ意味を表す。]
[式中、記号は前記と同じ意味を表す。]
[式中、記号は前記と同じ意味を表す。]
Examples of the N oxide compound include a compound represented by the formula (Id), a compound represented by the formula (Ie), and a compound represented by the formula (If).
[Wherein the symbols have the same meaning as described above. ]
[Wherein the symbols have the same meaning as described above. ]
[Wherein the symbols have the same meaning as described above. ]
「フェニルC1-C3アルキル基{フェニルC1-C3アルキル基におけるフェニル部分は、群Dより選ばれる1以上の置換基を有していてもよい。}」としては、例えばベンジル基、2-フルオロベンジル基、4-クロロベンジル基、4-(トリフルオロメチル)ベンジル基、2-[4-(トリフルオロメチル)フェニル]エチル基が挙げられる。
「1以上のハロゲン原子を有する(C1-C5アルコキシ)C2-C5アルキル基」とは、(C1-C5アルコキシ)及び/または(C2-C5アルキル)が1以上のハロゲン原子を有する基を表し、例えば、2,2-ジフルオロ-3-(2,2,2-トリクロロエトキシ)プロピル基、2-(2,2,2-トリクロロエトキシ)エチル基、1,1,2-トリフルオロ-2-(トリフルオロメトキシ)エチル基、2,2-ジフルオロ-3-(2,2,2-トリフルオロエトキシ)プロピル基、2-(2,2,2-トリフルオロエトキシ)エチル基、2,2-ジフルオロ-3-メトキシプロピル基が挙げられる。
「1以上のハロゲン原子を有する(C1-C5アルキルスルファニル)C2-C5アルキル基」とは、(C1-C5アルキルスルファニル)及び/または(C2-C5アルキル)が1以上のハロゲン原子を有する基を表し、例えば、2,2-ジフルオロ-2-(トリフルオロメチルチオ)エチル基が挙げられる。
「1以上のハロゲン原子を有する(C1-C5アルキルスルフィニル)C2-C5アルキル基」とは、(C1-C5アルキルスルフィニル)及び/または(C2-C5アルキル)が1以上のハロゲン原子を有する基を表し、例えば、2,2-ジフルオロ-2-(トリフルオロメタンスルフィニル)エチル基が挙げられる。
「1以上のハロゲン原子を有する(C1-C5アルキルスルホニル)C2-C5アルキル基」とは、(C1-C5アルキルスルホニル)及び/または(C2-C5アルキル)が1以上のハロゲン原子を有する基を表し、例えば、2,2-ジフルオロ-2-(トリフルオロメタンスルホニル)エチル基が挙げられる。 "Phenyl C1-C3 alkyl group {the phenyl moiety in the phenyl C1-C3 alkyl group may have one or more substituents selected from group D}" includes, for example, a benzyl group, 2-fluorobenzyl Group, 4-chlorobenzyl group, 4- (trifluoromethyl) benzyl group, 2- [4- (trifluoromethyl) phenyl] ethyl group.
“(C1-C5 alkoxy) C2-C5 alkyl group having one or more halogen atoms” refers to a group in which (C1-C5 alkoxy) and / or (C2-C5 alkyl) has one or more halogen atoms, For example, 2,2-difluoro-3- (2,2,2-trichloroethoxy) propyl group, 2- (2,2,2-trichloroethoxy) ethyl group, 1,1,2-trifluoro-2- ( Trifluoromethoxy) ethyl group, 2,2-difluoro-3- (2,2,2-trifluoroethoxy) propyl group, 2- (2,2,2-trifluoroethoxy) ethyl group, 2,2-difluoro An example is a -3-methoxypropyl group.
“(C1-C5 alkylsulfanyl) C2-C5 alkyl group having one or more halogen atoms” is a group in which (C1-C5 alkylsulfanyl) and / or (C2-C5 alkyl) has one or more halogen atoms. For example, a 2,2-difluoro-2- (trifluoromethylthio) ethyl group.
“(C1-C5 alkylsulfinyl) C2-C5 alkyl group having one or more halogen atoms” means a group in which (C1-C5 alkylsulfinyl) and / or (C2-C5 alkyl) has one or more halogen atoms. For example, 2,2-difluoro-2- (trifluoromethanesulfinyl) ethyl group can be mentioned.
“(C1-C5 alkylsulfonyl) C2-C5 alkyl group having one or more halogen atoms” means a group in which (C1-C5 alkylsulfonyl) and / or (C2-C5 alkyl) has one or more halogen atoms. Examples thereof include 2,2-difluoro-2- (trifluoromethanesulfonyl) ethyl group.
「1以上のハロゲン原子を有する(C1-C5アルコキシ)C2-C5アルキル基」とは、(C1-C5アルコキシ)及び/または(C2-C5アルキル)が1以上のハロゲン原子を有する基を表し、例えば、2,2-ジフルオロ-3-(2,2,2-トリクロロエトキシ)プロピル基、2-(2,2,2-トリクロロエトキシ)エチル基、1,1,2-トリフルオロ-2-(トリフルオロメトキシ)エチル基、2,2-ジフルオロ-3-(2,2,2-トリフルオロエトキシ)プロピル基、2-(2,2,2-トリフルオロエトキシ)エチル基、2,2-ジフルオロ-3-メトキシプロピル基が挙げられる。
「1以上のハロゲン原子を有する(C1-C5アルキルスルファニル)C2-C5アルキル基」とは、(C1-C5アルキルスルファニル)及び/または(C2-C5アルキル)が1以上のハロゲン原子を有する基を表し、例えば、2,2-ジフルオロ-2-(トリフルオロメチルチオ)エチル基が挙げられる。
「1以上のハロゲン原子を有する(C1-C5アルキルスルフィニル)C2-C5アルキル基」とは、(C1-C5アルキルスルフィニル)及び/または(C2-C5アルキル)が1以上のハロゲン原子を有する基を表し、例えば、2,2-ジフルオロ-2-(トリフルオロメタンスルフィニル)エチル基が挙げられる。
「1以上のハロゲン原子を有する(C1-C5アルキルスルホニル)C2-C5アルキル基」とは、(C1-C5アルキルスルホニル)及び/または(C2-C5アルキル)が1以上のハロゲン原子を有する基を表し、例えば、2,2-ジフルオロ-2-(トリフルオロメタンスルホニル)エチル基が挙げられる。 "Phenyl C1-C3 alkyl group {the phenyl moiety in the phenyl C1-C3 alkyl group may have one or more substituents selected from group D}" includes, for example, a benzyl group, 2-fluorobenzyl Group, 4-chlorobenzyl group, 4- (trifluoromethyl) benzyl group, 2- [4- (trifluoromethyl) phenyl] ethyl group.
“(C1-C5 alkoxy) C2-C5 alkyl group having one or more halogen atoms” refers to a group in which (C1-C5 alkoxy) and / or (C2-C5 alkyl) has one or more halogen atoms, For example, 2,2-difluoro-3- (2,2,2-trichloroethoxy) propyl group, 2- (2,2,2-trichloroethoxy) ethyl group, 1,1,2-trifluoro-2- ( Trifluoromethoxy) ethyl group, 2,2-difluoro-3- (2,2,2-trifluoroethoxy) propyl group, 2- (2,2,2-trifluoroethoxy) ethyl group, 2,2-difluoro An example is a -3-methoxypropyl group.
“(C1-C5 alkylsulfanyl) C2-C5 alkyl group having one or more halogen atoms” is a group in which (C1-C5 alkylsulfanyl) and / or (C2-C5 alkyl) has one or more halogen atoms. For example, a 2,2-difluoro-2- (trifluoromethylthio) ethyl group.
“(C1-C5 alkylsulfinyl) C2-C5 alkyl group having one or more halogen atoms” means a group in which (C1-C5 alkylsulfinyl) and / or (C2-C5 alkyl) has one or more halogen atoms. For example, 2,2-difluoro-2- (trifluoromethanesulfinyl) ethyl group can be mentioned.
“(C1-C5 alkylsulfonyl) C2-C5 alkyl group having one or more halogen atoms” means a group in which (C1-C5 alkylsulfonyl) and / or (C2-C5 alkyl) has one or more halogen atoms. Examples thereof include 2,2-difluoro-2- (trifluoromethanesulfonyl) ethyl group.
「群Gより選ばれる1以上の置換基を有する(C3-C7シクロアルキル)C1-C3アルキル基」とは、(C3-C7シクロアルキル)及び/または(C1-C3アルキル)が1以上の群Gより選ばれる1以上の置換基を有する基を表し、例えば、(2,2-ジフルオロシクロプロピル)メチル基、[1-(トリフルオロメチル)シクロプロピル]メチル基、[2-(トリフルオロメチル)シクロプロピル]メチル基、2-シクロプロピル-1,1,2,2-テトラフルオロエチル基、及び2-シクロプロピル-3,3,3-トリフルオロプロピル基が挙げられる。
「群Gより選ばれる1以上の置換基を有するC3-C7シクロアルキル基」とは、例えば、2,2-ジフルオロシクロプロピル基、1-(2,2,2-トリフルオロエチル)シクロプロピル基、及び4-(トリフルオロメチル)シクロヘキシル基が挙げられる。
「5もしくは6員芳香族複素環基」は、5員芳香族複素環基又は6員芳香族複素環基を表し、5員芳香族複素環基とはピロリル基、フリル基、チエニル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、テトラゾリル基、オキサゾリル基、イソオキサゾリル基、チアゾリル基、オキサジアゾリル基、又はチアジアゾリル基を表し、6員芳香族複素環基とはピリジル基、ピリダジニル基、ピリミジニル基又はピラジニル基を表す。
「窒素原子を1~4個含む5員芳香族複素環基」とは、ピロリル基、ピラゾリル基、イミダゾリル基、1,2,4-トリアゾリル基、1,2,3-トリアゾリル基、及びテトラゾリル基を表す。 “(C3-C7 cycloalkyl) C1-C3 alkyl group having one or more substituents selected from group G” means that (C3-C7 cycloalkyl) and / or (C1-C3 alkyl) is one or more groups Represents a group having one or more substituents selected from G, for example, (2,2-difluorocyclopropyl) methyl group, [1- (trifluoromethyl) cyclopropyl] methyl group, [2- (trifluoromethyl) ) Cyclopropyl] methyl group, 2-cyclopropyl-1,1,2,2-tetrafluoroethyl group, and 2-cyclopropyl-3,3,3-trifluoropropyl group.
“C3-C7 cycloalkyl group having one or more substituents selected from group G” includes, for example, a 2,2-difluorocyclopropyl group, a 1- (2,2,2-trifluoroethyl) cyclopropyl group And 4- (trifluoromethyl) cyclohexyl group.
“5- or 6-membered aromatic heterocyclic group” represents a 5-membered aromatic heterocyclic group or a 6-membered aromatic heterocyclic group, and the 5-membered aromatic heterocyclic group is a pyrrolyl group, a furyl group, a thienyl group, or a pyrazolyl group. Represents a group, an imidazolyl group, a triazolyl group, a tetrazolyl group, an oxazolyl group, an isoxazolyl group, a thiazolyl group, an oxadiazolyl group, or a thiadiazolyl group. To express.
“5-membered aromatic heterocyclic group containing 1 to 4 nitrogen atoms” means pyrrolyl group, pyrazolyl group, imidazolyl group, 1,2,4-triazolyl group, 1,2,3-triazolyl group, and tetrazolyl group Represents.
「群Gより選ばれる1以上の置換基を有するC3-C7シクロアルキル基」とは、例えば、2,2-ジフルオロシクロプロピル基、1-(2,2,2-トリフルオロエチル)シクロプロピル基、及び4-(トリフルオロメチル)シクロヘキシル基が挙げられる。
「5もしくは6員芳香族複素環基」は、5員芳香族複素環基又は6員芳香族複素環基を表し、5員芳香族複素環基とはピロリル基、フリル基、チエニル基、ピラゾリル基、イミダゾリル基、トリアゾリル基、テトラゾリル基、オキサゾリル基、イソオキサゾリル基、チアゾリル基、オキサジアゾリル基、又はチアジアゾリル基を表し、6員芳香族複素環基とはピリジル基、ピリダジニル基、ピリミジニル基又はピラジニル基を表す。
「窒素原子を1~4個含む5員芳香族複素環基」とは、ピロリル基、ピラゾリル基、イミダゾリル基、1,2,4-トリアゾリル基、1,2,3-トリアゾリル基、及びテトラゾリル基を表す。 “(C3-C7 cycloalkyl) C1-C3 alkyl group having one or more substituents selected from group G” means that (C3-C7 cycloalkyl) and / or (C1-C3 alkyl) is one or more groups Represents a group having one or more substituents selected from G, for example, (2,2-difluorocyclopropyl) methyl group, [1- (trifluoromethyl) cyclopropyl] methyl group, [2- (trifluoromethyl) ) Cyclopropyl] methyl group, 2-cyclopropyl-1,1,2,2-tetrafluoroethyl group, and 2-cyclopropyl-3,3,3-trifluoropropyl group.
“C3-C7 cycloalkyl group having one or more substituents selected from group G” includes, for example, a 2,2-difluorocyclopropyl group, a 1- (2,2,2-trifluoroethyl) cyclopropyl group And 4- (trifluoromethyl) cyclohexyl group.
“5- or 6-membered aromatic heterocyclic group” represents a 5-membered aromatic heterocyclic group or a 6-membered aromatic heterocyclic group, and the 5-membered aromatic heterocyclic group is a pyrrolyl group, a furyl group, a thienyl group, or a pyrazolyl group. Represents a group, an imidazolyl group, a triazolyl group, a tetrazolyl group, an oxazolyl group, an isoxazolyl group, a thiazolyl group, an oxadiazolyl group, or a thiadiazolyl group. To express.
“5-membered aromatic heterocyclic group containing 1 to 4 nitrogen atoms” means pyrrolyl group, pyrazolyl group, imidazolyl group, 1,2,4-triazolyl group, 1,2,3-triazolyl group, and tetrazolyl group Represents.
アルキルスルファニル基、アルキルスルフィニル基、およびアルキルスルホニル基とは、アルキル基を有するS(O)z基を表す。
例えば、zが0であるアルキルスルファニル基の例としては、例えばメチルスルファニル基、エチルスルファニル基、プロピルスルファニル基、及びイソプロピルスルファニル基等を表す。
例えば、zが1であるアルキルスルフィニル基の例としては、例えばメチルスルフィニル基、エチルスルフィニル基、プロピルスルフィニル基、及びイソプロピルスルフィニル基等を表す。
例えば、zが2であるアルキルスルホニル基の例としては、例えばメチルスルホニル基、エチルスルホニル基、プロピルスルホニル基、及びイソプロピルスルホニル基等を表す。 An alkylsulfanyl group, an alkylsulfinyl group, and an alkylsulfonyl group represent an S (O) z group having an alkyl group.
For example, examples of the alkylsulfanyl group in which z is 0 include a methylsulfanyl group, an ethylsulfanyl group, a propylsulfanyl group, and an isopropylsulfanyl group.
For example, examples of the alkylsulfinyl group in which z is 1 include a methylsulfinyl group, an ethylsulfinyl group, a propylsulfinyl group, and an isopropylsulfinyl group.
For example, examples of the alkylsulfonyl group in which z is 2 include a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, and an isopropylsulfonyl group.
例えば、zが0であるアルキルスルファニル基の例としては、例えばメチルスルファニル基、エチルスルファニル基、プロピルスルファニル基、及びイソプロピルスルファニル基等を表す。
例えば、zが1であるアルキルスルフィニル基の例としては、例えばメチルスルフィニル基、エチルスルフィニル基、プロピルスルフィニル基、及びイソプロピルスルフィニル基等を表す。
例えば、zが2であるアルキルスルホニル基の例としては、例えばメチルスルホニル基、エチルスルホニル基、プロピルスルホニル基、及びイソプロピルスルホニル基等を表す。 An alkylsulfanyl group, an alkylsulfinyl group, and an alkylsulfonyl group represent an S (O) z group having an alkyl group.
For example, examples of the alkylsulfanyl group in which z is 0 include a methylsulfanyl group, an ethylsulfanyl group, a propylsulfanyl group, and an isopropylsulfanyl group.
For example, examples of the alkylsulfinyl group in which z is 1 include a methylsulfinyl group, an ethylsulfinyl group, a propylsulfinyl group, and an isopropylsulfinyl group.
For example, examples of the alkylsulfonyl group in which z is 2 include a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, and an isopropylsulfonyl group.
本ビピリジン化合物としては、例えば、以下の化合物が挙げられる。
Examples of the bipyridine compound include the following compounds.
本ビピリジン化合物において、R2が1以上のハロゲン原子を有していてもよいC1-C6アルキル基である化合物;
本ビピリジン化合物において、R2が、C1-C6アルキル基である化合物;
本ビピリジン化合物において、R2がエチル基である化合物; In the present bipyridine compound, a compound wherein R 2 is a C1-C6 alkyl group optionally having one or more halogen atoms;
In the bipyridine compound, a compound wherein R 2 is a C1-C6 alkyl group;
In the bipyridine compound, a compound wherein R 2 is an ethyl group;
本ビピリジン化合物において、R2が、C1-C6アルキル基である化合物;
本ビピリジン化合物において、R2がエチル基である化合物; In the present bipyridine compound, a compound wherein R 2 is a C1-C6 alkyl group optionally having one or more halogen atoms;
In the bipyridine compound, a compound wherein R 2 is a C1-C6 alkyl group;
In the bipyridine compound, a compound wherein R 2 is an ethyl group;
本ビピリジン化合物において、qが0、1、又は2であり、R3が、各々独立して、群Bより選ばれる1以上の置換基を有していてもよいC1-C6鎖式炭化水素基、群Qより選ばれる1の5員芳香族複素環基(該5員芳香族複素環基は、群Dより選ばれる1以上の置換基を有していてもよい。)、OR12、NR11R12、NR11aR12a、NR24NR11R12、又はハロゲン原子である化合物;
群Q:
{図中R26は、1以上のハロゲン原子を有していてもよいC1-C6アルキル基を表す。}
In the present bipyridine compound, q is 0, 1, or 2, and each R 3 is independently a C1-C6 chain hydrocarbon group optionally having one or more substituents selected from Group B , One 5-membered aromatic heterocyclic group selected from group Q (the 5-membered aromatic heterocyclic group may have one or more substituents selected from group D), OR 12 , NR 11 R 12 , NR 11a R 12a , NR 24 NR 11 R 12 , or a compound that is a halogen atom;
Group Q:
{Drawing R 26 represents one or more halogen atoms which may have a C1-C6 alkyl group. }
群Q:
Group Q:
本ビピリジン化合物において、R1が、C2-C10ハロアルキル基、又は1以上のハロゲン原子を有する(C1-C5アルコキシ)C2-C5アルキル基であり、
R2が、C1-C6アルキル基であり、qが0、1、又は2であり、
R3が、各々独立して、群Bより選ばれる1以上の置換基を有していてもよいC1-C6アルキル基、群Bより選ばれる1以上の置換基を有していてもよいC2-C6アルケニル基、群Qより選ばれる1の5員芳香族複素環基(該5員芳香族複素環基は、群Dより選ばれる1以上の置換基を有していてもよい。)、OR12、NR11R12、NR11aR12a、NR24NR11R12、NR11C(O)R13、NR24NR11C(O)R13、NR11C(O)OR14、NR24NR11C(O)OR14、NR11C(O)NR15R16、NR24NR11C(O)NR15R16、N=CHNR15R16、N=S(O)xR15R16、S(O)yR15、C(O)OR17、C(O)NR11R12、シアノ基、ニトロ基、又はハロゲン原子であり、
pが0、1、又は2である化合物; In the bipyridine compound, R 1 is a C2-C10 haloalkyl group, or one or more with a halogen atom (C1-C5 alkoxy) C2-C5 alkyl group,
R 2 is a C1-C6 alkyl group, q is 0, 1, or 2,
R 3 each independently has a C1-C6 alkyl group optionally having one or more substituents selected from group B, and may have one or more substituents selected from group B -C6 alkenyl group, one 5-membered aromatic heterocyclic group selected from group Q (the 5-membered aromatic heterocyclic group may have one or more substituents selected from group D), OR 12, NR 11 R 12, NR 11a R 12a, NR 24 NR 11 R 12, NR 11 C (O) R 13, NR 24 NR 11 C (O) R 13, NR 11 C (O) OR 14, NR 24 NR 11 C (O) OR 14 , NR 11 C (O) NR 15 R 16 , NR 24 NR 11 C (O) NR 15 R 16 , N = CHNR 15 R 16 , N = S (O) x R 15 R 16 , S (O) y R 15 , C (O) OR 17 , C (O) NR 11 R 12 , a cyano group, a nitro group, or a halogen atom,
a compound wherein p is 0, 1, or 2;
R2が、C1-C6アルキル基であり、qが0、1、又は2であり、
R3が、各々独立して、群Bより選ばれる1以上の置換基を有していてもよいC1-C6アルキル基、群Bより選ばれる1以上の置換基を有していてもよいC2-C6アルケニル基、群Qより選ばれる1の5員芳香族複素環基(該5員芳香族複素環基は、群Dより選ばれる1以上の置換基を有していてもよい。)、OR12、NR11R12、NR11aR12a、NR24NR11R12、NR11C(O)R13、NR24NR11C(O)R13、NR11C(O)OR14、NR24NR11C(O)OR14、NR11C(O)NR15R16、NR24NR11C(O)NR15R16、N=CHNR15R16、N=S(O)xR15R16、S(O)yR15、C(O)OR17、C(O)NR11R12、シアノ基、ニトロ基、又はハロゲン原子であり、
pが0、1、又は2である化合物; In the bipyridine compound, R 1 is a C2-C10 haloalkyl group, or one or more with a halogen atom (C1-C5 alkoxy) C2-C5 alkyl group,
R 2 is a C1-C6 alkyl group, q is 0, 1, or 2,
R 3 each independently has a C1-C6 alkyl group optionally having one or more substituents selected from group B, and may have one or more substituents selected from group B -C6 alkenyl group, one 5-membered aromatic heterocyclic group selected from group Q (the 5-membered aromatic heterocyclic group may have one or more substituents selected from group D), OR 12, NR 11 R 12, NR 11a R 12a, NR 24 NR 11 R 12, NR 11 C (O) R 13, NR 24 NR 11 C (O) R 13, NR 11 C (O) OR 14, NR 24 NR 11 C (O) OR 14 , NR 11 C (O) NR 15 R 16 , NR 24 NR 11 C (O) NR 15 R 16 , N = CHNR 15 R 16 , N = S (O) x R 15 R 16 , S (O) y R 15 , C (O) OR 17 , C (O) NR 11 R 12 , a cyano group, a nitro group, or a halogen atom,
a compound wherein p is 0, 1, or 2;
本ビピリジン化合物において、R1が、C2-C10ハロアルキル基、又は1以上のハロゲン原子を有する(C1-C5アルコキシ)C2-C5アルキル基であり、
R2が、C1-C6アルキル基であり、qが0、1、又は2であり、
R3が、各々独立して、群Bより選ばれる1以上の置換基を有していてもよいC1-C6アルキル基、群Bより選ばれる1以上の置換基を有していてもよいC2-C6アルケニル基、窒素原子を1~4個含む5員芳香族複素環基(該5員芳香族複素環基は、群Dより選ばれる1以上の置換基を有していてもよい。)、OR12、NR11R12、NR11aR12a、NR24NR11R12、又はハロゲン原子であり、
pが0、1、又は2であり、
R6が、各々独立して、OR18、NR18R19、C(O)OR25、OC(O)R20、シアノ基、ニトロ基、又はハロゲン原子である化合物; In the bipyridine compound, R 1 is a C2-C10 haloalkyl group, or one or more with a halogen atom (C1-C5 alkoxy) C2-C5 alkyl group,
R 2 is a C1-C6 alkyl group, q is 0, 1, or 2,
R 3 each independently has a C1-C6 alkyl group optionally having one or more substituents selected from group B, and may have one or more substituents selected from group B A -C6 alkenyl group, a 5-membered aromatic heterocyclic group containing 1 to 4 nitrogen atoms (the 5-membered aromatic heterocyclic group may have one or more substituents selected from group D); OR 12 , NR 11 R 12 , NR 11a R 12a , NR 24 NR 11 R 12 , or a halogen atom,
p is 0, 1, or 2;
A compound in which R 6 is each independently OR 18 , NR 18 R 19 , C (O) OR 25 , OC (O) R 20 , a cyano group, a nitro group, or a halogen atom;
R2が、C1-C6アルキル基であり、qが0、1、又は2であり、
R3が、各々独立して、群Bより選ばれる1以上の置換基を有していてもよいC1-C6アルキル基、群Bより選ばれる1以上の置換基を有していてもよいC2-C6アルケニル基、窒素原子を1~4個含む5員芳香族複素環基(該5員芳香族複素環基は、群Dより選ばれる1以上の置換基を有していてもよい。)、OR12、NR11R12、NR11aR12a、NR24NR11R12、又はハロゲン原子であり、
pが0、1、又は2であり、
R6が、各々独立して、OR18、NR18R19、C(O)OR25、OC(O)R20、シアノ基、ニトロ基、又はハロゲン原子である化合物; In the bipyridine compound, R 1 is a C2-C10 haloalkyl group, or one or more with a halogen atom (C1-C5 alkoxy) C2-C5 alkyl group,
R 2 is a C1-C6 alkyl group, q is 0, 1, or 2,
R 3 each independently has a C1-C6 alkyl group optionally having one or more substituents selected from group B, and may have one or more substituents selected from group B A -C6 alkenyl group, a 5-membered aromatic heterocyclic group containing 1 to 4 nitrogen atoms (the 5-membered aromatic heterocyclic group may have one or more substituents selected from group D); OR 12 , NR 11 R 12 , NR 11a R 12a , NR 24 NR 11 R 12 , or a halogen atom,
p is 0, 1, or 2;
A compound in which R 6 is each independently OR 18 , NR 18 R 19 , C (O) OR 25 , OC (O) R 20 , a cyano group, a nitro group, or a halogen atom;
本ビピリジン化合物において、R1が、2以上のフッ素原子を有するC2-C6アルキル基、又は1以上のフッ素原子を有する(C1-C5アルコキシ)C2-C5アルキル基であり、
R2が、C1-C6アルキル基であり、qが0、1、又は2であり、
R3が、各々独立して、群Bより選ばれる1以上の置換基を有していてもよいC1-C6アルキル基、群Bより選ばれる1以上の置換基を有していてもよいC2-C6アルケニル基、窒素原子を1~4個含む5員芳香族複素環基(該5員芳香族複素環基は、群Dより選ばれる1以上の置換基を有していてもよい。)、OR12、NR11R12、NR11aR12a、NR24NR11R12、又はハロゲン原子であり、
pが0、1、又は2であり、R6が、各々独立して、シアノ基、又はハロゲン原子である化合物; In the present bipyridine compound, R 1 is a C2-C6 alkyl group having 2 or more fluorine atoms, or a (C1-C5 alkoxy) C2-C5 alkyl group having 1 or more fluorine atoms,
R 2 is a C1-C6 alkyl group, q is 0, 1, or 2,
R 3 each independently has a C1-C6 alkyl group optionally having one or more substituents selected from group B, and may have one or more substituents selected from group B A -C6 alkenyl group, a 5-membered aromatic heterocyclic group containing 1 to 4 nitrogen atoms (the 5-membered aromatic heterocyclic group may have one or more substituents selected from group D); OR 12 , NR 11 R 12 , NR 11a R 12a , NR 24 NR 11 R 12 , or a halogen atom,
a compound in which p is 0, 1, or 2 and each R 6 is independently a cyano group or a halogen atom;
R2が、C1-C6アルキル基であり、qが0、1、又は2であり、
R3が、各々独立して、群Bより選ばれる1以上の置換基を有していてもよいC1-C6アルキル基、群Bより選ばれる1以上の置換基を有していてもよいC2-C6アルケニル基、窒素原子を1~4個含む5員芳香族複素環基(該5員芳香族複素環基は、群Dより選ばれる1以上の置換基を有していてもよい。)、OR12、NR11R12、NR11aR12a、NR24NR11R12、又はハロゲン原子であり、
pが0、1、又は2であり、R6が、各々独立して、シアノ基、又はハロゲン原子である化合物; In the present bipyridine compound, R 1 is a C2-C6 alkyl group having 2 or more fluorine atoms, or a (C1-C5 alkoxy) C2-C5 alkyl group having 1 or more fluorine atoms,
R 2 is a C1-C6 alkyl group, q is 0, 1, or 2,
R 3 each independently has a C1-C6 alkyl group optionally having one or more substituents selected from group B, and may have one or more substituents selected from group B A -C6 alkenyl group, a 5-membered aromatic heterocyclic group containing 1 to 4 nitrogen atoms (the 5-membered aromatic heterocyclic group may have one or more substituents selected from group D); OR 12 , NR 11 R 12 , NR 11a R 12a , NR 24 NR 11 R 12 , or a halogen atom,
a compound in which p is 0, 1, or 2 and each R 6 is independently a cyano group or a halogen atom;
本ビピリジン化合物において、R1が、4以上のフッ素原子を有するC3-C5アルキル基、又は1,1,2-トリフルオロ-2-(トリフルオロメトキシ)エチル基であり、
R2が、エチル基であり、
qが0、1、又は2であり、
R3が、各々独立して、1以上のハロゲン原子を有していてもよいC1-C6アルキル基、1以上のハロゲン原子を有していてもよいC2-C6アルケニル基、1以上のハロゲン原子を有していてもよいトリアゾール基、NR11R12、又はハロゲン原子であり、
R11及びR12が、各々独立して、水素原子又は1以上のハロゲン原子を有していてもよいC1-C3アルキル基であり、pが0である化合物; In the present bipyridine compound, R 1 is a C3-C5 alkyl group having 4 or more fluorine atoms, or a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group,
R 2 is an ethyl group,
q is 0, 1, or 2;
R 3 each independently represents a C1-C6 alkyl group optionally having one or more halogen atoms, a C2-C6 alkenyl group optionally having one or more halogen atoms, one or more halogen atoms A triazole group optionally having NR 11 R 12 , or a halogen atom,
A compound in which R 11 and R 12 are each independently a hydrogen atom or a C1-C3 alkyl group optionally having one or more halogen atoms, and p is 0;
R2が、エチル基であり、
qが0、1、又は2であり、
R3が、各々独立して、1以上のハロゲン原子を有していてもよいC1-C6アルキル基、1以上のハロゲン原子を有していてもよいC2-C6アルケニル基、1以上のハロゲン原子を有していてもよいトリアゾール基、NR11R12、又はハロゲン原子であり、
R11及びR12が、各々独立して、水素原子又は1以上のハロゲン原子を有していてもよいC1-C3アルキル基であり、pが0である化合物; In the present bipyridine compound, R 1 is a C3-C5 alkyl group having 4 or more fluorine atoms, or a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group,
R 2 is an ethyl group,
q is 0, 1, or 2;
R 3 each independently represents a C1-C6 alkyl group optionally having one or more halogen atoms, a C2-C6 alkenyl group optionally having one or more halogen atoms, one or more halogen atoms A triazole group optionally having NR 11 R 12 , or a halogen atom,
A compound in which R 11 and R 12 are each independently a hydrogen atom or a C1-C3 alkyl group optionally having one or more halogen atoms, and p is 0;
本ビピリジン化合物において、R1が、4以上のフッ素原子を有するC3-C5アルキル基であり、
R2が、エチル基であり、qが、0又は1であり、
R3が、各々独立して、1以上のハロゲン原子を有するC1-C6アルキル基、1以上のハロゲン原子を有していてもよい1,2,4-トリアゾール-1-イル基、NR11R12、又はハロゲン原子であり、
R11及びR12が、各々独立して、水素原子又は1以上のハロゲン原子を有していてもよいC1-C3アルキル基であり、
pが、0である化合物。 In the present bipyridine compound, R 1 is a C3-C5 alkyl group having 4 or more fluorine atoms,
R 2 is an ethyl group, q is 0 or 1,
R 3 each independently represents a C1-C6 alkyl group having one or more halogen atoms, an 1,2,4-triazol-1-yl group optionally having one or more halogen atoms, NR 11 R 12 or a halogen atom,
R 11 and R 12 are each independently a hydrogen atom or a C1-C3 alkyl group optionally having one or more halogen atoms;
A compound wherein p is 0.
R2が、エチル基であり、qが、0又は1であり、
R3が、各々独立して、1以上のハロゲン原子を有するC1-C6アルキル基、1以上のハロゲン原子を有していてもよい1,2,4-トリアゾール-1-イル基、NR11R12、又はハロゲン原子であり、
R11及びR12が、各々独立して、水素原子又は1以上のハロゲン原子を有していてもよいC1-C3アルキル基であり、
pが、0である化合物。 In the present bipyridine compound, R 1 is a C3-C5 alkyl group having 4 or more fluorine atoms,
R 2 is an ethyl group, q is 0 or 1,
R 3 each independently represents a C1-C6 alkyl group having one or more halogen atoms, an 1,2,4-triazol-1-yl group optionally having one or more halogen atoms, NR 11 R 12 or a halogen atom,
R 11 and R 12 are each independently a hydrogen atom or a C1-C3 alkyl group optionally having one or more halogen atoms;
A compound wherein p is 0.
本ビピリジン化合物において、R1が、C2-C10ハロアルキル基、又は群Gより選ばれる1以上の置換基を有するC3-C7シクロアルキル基であり、
R2が、1以上のハロゲン原子を有していてもよいC1-C6アルキル基であり、
R3が、各々独立して、群Dより選ばれる1以上の置換基を有していてもよい5もしくは6員芳香族複素環基、NR11R12、NR24NR11R12、NR24NR11C(O)R13、又はハロゲン原子であり、
R11、R12、R13及びR24が、水素原子又は1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基であり、
R6が、ハロゲン原子であり、
nが、2であり、
qが、0、1又は2であり、
pが、0又は1である化合物。 In the present bipyridine compound, R 1 is a C2-C10 haloalkyl group or a C3-C7 cycloalkyl group having one or more substituents selected from Group G;
R 2 is a C1-C6 alkyl group optionally having one or more halogen atoms,
R 3 each independently has a 5- or 6-membered aromatic heterocyclic group optionally having one or more substituents selected from Group D, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , or a halogen atom,
R 11 , R 12 , R 13 and R 24 are a hydrogen atom or a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms,
R 6 is a halogen atom,
n is 2,
q is 0, 1 or 2;
A compound wherein p is 0 or 1.
R2が、1以上のハロゲン原子を有していてもよいC1-C6アルキル基であり、
R3が、各々独立して、群Dより選ばれる1以上の置換基を有していてもよい5もしくは6員芳香族複素環基、NR11R12、NR24NR11R12、NR24NR11C(O)R13、又はハロゲン原子であり、
R11、R12、R13及びR24が、水素原子又は1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基であり、
R6が、ハロゲン原子であり、
nが、2であり、
qが、0、1又は2であり、
pが、0又は1である化合物。 In the present bipyridine compound, R 1 is a C2-C10 haloalkyl group or a C3-C7 cycloalkyl group having one or more substituents selected from Group G;
R 2 is a C1-C6 alkyl group optionally having one or more halogen atoms,
R 3 each independently has a 5- or 6-membered aromatic heterocyclic group optionally having one or more substituents selected from Group D, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , or a halogen atom,
R 11 , R 12 , R 13 and R 24 are a hydrogen atom or a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms,
R 6 is a halogen atom,
n is 2,
q is 0, 1 or 2;
A compound wherein p is 0 or 1.
本ビピリジン化合物において、R1が、C2-C6ハロアルキル基、又は1以上のハロゲン原子を有するC5-C7シクロアルキル基であり、
R2が、C1-C3アルキル基であり、
R3が、各々独立して、5もしくは6員芳香族複素環基、NR11R12、NR24NR11R12、NR24NR11C(O)R13、又はハロゲン原子であり、
R11、R12、R13及びR24が、水素原子又は1以上のハロゲン原子を有していてもよいC1-C3アルキル基であり、
R6が、ハロゲン原子であり、
nが、2であり、
qが、0、1又は2であり、
pが、0又は1である化合物。 In the present bipyridine compound, R 1 is a C2-C6 haloalkyl group or a C5-C7 cycloalkyl group having one or more halogen atoms,
R 2 is a C1-C3 alkyl group,
Each R 3 is independently a 5- or 6-membered aromatic heterocyclic group, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , or a halogen atom;
R 11 , R 12 , R 13 and R 24 are a hydrogen atom or a C1-C3 alkyl group optionally having one or more halogen atoms,
R 6 is a halogen atom,
n is 2,
q is 0, 1 or 2;
A compound wherein p is 0 or 1.
R2が、C1-C3アルキル基であり、
R3が、各々独立して、5もしくは6員芳香族複素環基、NR11R12、NR24NR11R12、NR24NR11C(O)R13、又はハロゲン原子であり、
R11、R12、R13及びR24が、水素原子又は1以上のハロゲン原子を有していてもよいC1-C3アルキル基であり、
R6が、ハロゲン原子であり、
nが、2であり、
qが、0、1又は2であり、
pが、0又は1である化合物。 In the present bipyridine compound, R 1 is a C2-C6 haloalkyl group or a C5-C7 cycloalkyl group having one or more halogen atoms,
R 2 is a C1-C3 alkyl group,
Each R 3 is independently a 5- or 6-membered aromatic heterocyclic group, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , or a halogen atom;
R 11 , R 12 , R 13 and R 24 are a hydrogen atom or a C1-C3 alkyl group optionally having one or more halogen atoms,
R 6 is a halogen atom,
n is 2,
q is 0, 1 or 2;
A compound wherein p is 0 or 1.
本ビピリジン化合物において、R1が、C2-C6フルオロアルキル基、又は1以上のフッ素原子を有するC5-C7シクロアルキル基であり、
R2が、C1-C3アルキル基であり、
R3が、各々独立して、窒素原子を1~4個含む5員複素環基、NR11R12、NR24NR11R12、NR24NR11C(O)R13、又はハロゲン原子であり、
R11、R12、R13及びR24が、水素原子又はC1-C3アルキル基であり、
R6が、塩素原子であり、
nが、2であり、
qが、0、1又は2であり、
pが、0又は1である化合物。 In the present bipyridine compound, R 1 is a C2-C6 fluoroalkyl group or a C5-C7 cycloalkyl group having one or more fluorine atoms,
R 2 is a C1-C3 alkyl group,
R 3 is each independently a 5-membered heterocyclic group containing 1 to 4 nitrogen atoms, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , or a halogen atom Yes,
R 11, R 12, R 13 and R 24 is hydrogen atom or a C1-C3 alkyl group,
R 6 is a chlorine atom,
n is 2,
q is 0, 1 or 2;
A compound wherein p is 0 or 1.
R2が、C1-C3アルキル基であり、
R3が、各々独立して、窒素原子を1~4個含む5員複素環基、NR11R12、NR24NR11R12、NR24NR11C(O)R13、又はハロゲン原子であり、
R11、R12、R13及びR24が、水素原子又はC1-C3アルキル基であり、
R6が、塩素原子であり、
nが、2であり、
qが、0、1又は2であり、
pが、0又は1である化合物。 In the present bipyridine compound, R 1 is a C2-C6 fluoroalkyl group or a C5-C7 cycloalkyl group having one or more fluorine atoms,
R 2 is a C1-C3 alkyl group,
R 3 is each independently a 5-membered heterocyclic group containing 1 to 4 nitrogen atoms, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , or a halogen atom Yes,
R 11, R 12, R 13 and R 24 is hydrogen atom or a C1-C3 alkyl group,
R 6 is a chlorine atom,
n is 2,
q is 0, 1 or 2;
A compound wherein p is 0 or 1.
本ビピリジン化合物において、R1が、2以上のフッ素原子を有するC3-C5アルキル基、又は1以上のフッ素原子を有するシクロヘキシル基であり、
R2が、エチル基であり、
R3が、各々独立して、1以上のハロゲン原子を有していてもよい1,2,4-トリアゾール-1-イル基、NR11R12、NR24NR11R12、NR24NR11C(O)R13、又はハロゲン原子であり、
R11、R12、R13及びR24が、水素原子又はメチル基であり、
R6が、塩素原子であり、
nが、2であり、
qが、0、1又は2であり、
pが、0又は1である化合物。 In the present bipyridine compound, R 1 is a C3-C5 alkyl group having 2 or more fluorine atoms, or a cyclohexyl group having 1 or more fluorine atoms,
R 2 is an ethyl group,
R 3 each independently has a 1,2,4-triazol-1-yl group optionally having one or more halogen atoms, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , or a halogen atom,
R 11 , R 12 , R 13 and R 24 are a hydrogen atom or a methyl group,
R 6 is a chlorine atom,
n is 2,
q is 0, 1 or 2;
A compound wherein p is 0 or 1.
R2が、エチル基であり、
R3が、各々独立して、1以上のハロゲン原子を有していてもよい1,2,4-トリアゾール-1-イル基、NR11R12、NR24NR11R12、NR24NR11C(O)R13、又はハロゲン原子であり、
R11、R12、R13及びR24が、水素原子又はメチル基であり、
R6が、塩素原子であり、
nが、2であり、
qが、0、1又は2であり、
pが、0又は1である化合物。 In the present bipyridine compound, R 1 is a C3-C5 alkyl group having 2 or more fluorine atoms, or a cyclohexyl group having 1 or more fluorine atoms,
R 2 is an ethyl group,
R 3 each independently has a 1,2,4-triazol-1-yl group optionally having one or more halogen atoms, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , or a halogen atom,
R 11 , R 12 , R 13 and R 24 are a hydrogen atom or a methyl group,
R 6 is a chlorine atom,
n is 2,
q is 0, 1 or 2;
A compound wherein p is 0 or 1.
本ビピリジン化合物において、R1が、2以上のフッ素原子を有するC3-C5アルキル基、又は4,4-ジフルオロシクロヘキシル基であり、
R2が、エチル基であり、
R3が、各々独立して、1,2,4-トリアゾール-1-イル基、NR11R12、NR24NR11R12、NR24NR11C(O)R13、塩素原子又は臭素原子であり、
R11、R12及びR24が、水素原子又はメチル基であり、
R13が、メチル基であり、
R6が、塩素原子であり、
nが、2であり、
qが、0、1又は2であり、
pが、0又は1である化合物。 In the present bipyridine compound, R 1 is a C3-C5 alkyl group having two or more fluorine atoms, or a 4,4-difluorocyclohexyl group,
R 2 is an ethyl group,
Each R 3 independently represents a 1,2,4-triazol-1-yl group, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , a chlorine atom or a bromine atom; And
R 11 , R 12 and R 24 are a hydrogen atom or a methyl group,
R 13 is a methyl group,
R 6 is a chlorine atom,
n is 2,
q is 0, 1 or 2;
A compound wherein p is 0 or 1.
R2が、エチル基であり、
R3が、各々独立して、1,2,4-トリアゾール-1-イル基、NR11R12、NR24NR11R12、NR24NR11C(O)R13、塩素原子又は臭素原子であり、
R11、R12及びR24が、水素原子又はメチル基であり、
R13が、メチル基であり、
R6が、塩素原子であり、
nが、2であり、
qが、0、1又は2であり、
pが、0又は1である化合物。 In the present bipyridine compound, R 1 is a C3-C5 alkyl group having two or more fluorine atoms, or a 4,4-difluorocyclohexyl group,
R 2 is an ethyl group,
Each R 3 independently represents a 1,2,4-triazol-1-yl group, NR 11 R 12 , NR 24 NR 11 R 12 , NR 24 NR 11 C (O) R 13 , a chlorine atom or a bromine atom; And
R 11 , R 12 and R 24 are a hydrogen atom or a methyl group,
R 13 is a methyl group,
R 6 is a chlorine atom,
n is 2,
q is 0, 1 or 2;
A compound wherein p is 0 or 1.
好ましくは、本ビピリジン化合物は、後述の実施例における本ビピリジン化合物7、8、11、12、14、15、64、69、84、104、184、204、300、303、304、306、318、321又は344である。
Preferably, the bipyridine compound is the bipyridine compound 7, 8, 11, 12, 14, 15, 64, 69, 84, 104, 184, 204, 300, 303, 304, 306, 318, in the examples described below. 321 or 344.
次に、本ビピリジン化合物の製造法について説明する。
Next, a method for producing the bipyridine compound will be described.
本ビピリジン化合物の製造法としては、例えば以下の製造法が挙げられる。
Examples of the production method of the bipyridine compound include the following production methods.
製造法1
本ビピリジン化合物において、n=1である化合物(以下、本ビピリジン化合物(Ib)と記す。)、及びn=2である化合物(以下、本ビピリジン化合物(Ic)と記す。)は、n=0である化合物(以下、本ビピリジン化合物(Ia)と記す。)と酸化剤とを反応させることにより製造することができる。
[式中、記号は前記と同じ意味を表す。]
Manufacturing method 1
In this bipyridine compound, a compound in which n = 1 (hereinafter referred to as the present bipyridine compound (Ib)) and a compound in which n = 2 (hereinafter referred to as the present bipyridine compound (Ic)) are n = 0. (Hereinafter referred to as the present bipyridine compound (Ia)) and an oxidant.
[Wherein the symbols have the same meaning as described above. ]
本ビピリジン化合物において、n=1である化合物(以下、本ビピリジン化合物(Ib)と記す。)、及びn=2である化合物(以下、本ビピリジン化合物(Ic)と記す。)は、n=0である化合物(以下、本ビピリジン化合物(Ia)と記す。)と酸化剤とを反応させることにより製造することができる。
In this bipyridine compound, a compound in which n = 1 (hereinafter referred to as the present bipyridine compound (Ib)) and a compound in which n = 2 (hereinafter referred to as the present bipyridine compound (Ic)) are n = 0. (Hereinafter referred to as the present bipyridine compound (Ia)) and an oxidant.
まず、本ビピリジン化合物(Ia)から本ビピリジン化合物(Ib)を製造する方法について記載する。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばジクロロメタン、クロロホルム等のハロゲン化炭化水素類(以下、ハロゲン化炭化水素類と記す。)が挙げられる。
該反応に用いられる酸化剤としては、例えばm-クロロ過安息香酸(以下、mCPBAと記す。)が挙げられる。
該反応には、本ビピリジン化合物(Ia)1モルに対して酸化剤が通常1~1.2モルの割合で用いられる。
該反応温度は、通常-20~80℃の範囲である。該反応時間は通常0.1~12時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を必要に応じて還元剤(例えば亜硫酸ナトリウム、チオ硫酸ナトリウム)の水溶液、及び塩基(例えば炭酸水素ナトリウム)の水溶液で洗浄する。得られた有機層を乾燥、濃縮することにより、本ビピリジン化合物(Ib)を得ることができる。 First, a method for producing the bipyridine compound (Ib) from the bipyridine compound (Ia) will be described.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform (hereinafter referred to as halogenated hydrocarbons).
Examples of the oxidizing agent used in the reaction include m-chloroperbenzoic acid (hereinafter referred to as mCPBA).
In the reaction, an oxidizing agent is usually used in an amount of 1 to 1.2 mol per 1 mol of the bipyridine compound (Ia).
The reaction temperature is usually in the range of −20 to 80 ° C. The reaction time is usually in the range of 0.1 to 12 hours.
After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is extracted with an aqueous solution of a reducing agent (for example, sodium sulfite or sodium thiosulfate) and an aqueous solution of a base (for example, sodium bicarbonate) as necessary. Wash with. The obtained bipyridine compound (Ib) can be obtained by drying and concentrating the obtained organic layer.
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばジクロロメタン、クロロホルム等のハロゲン化炭化水素類(以下、ハロゲン化炭化水素類と記す。)が挙げられる。
該反応に用いられる酸化剤としては、例えばm-クロロ過安息香酸(以下、mCPBAと記す。)が挙げられる。
該反応には、本ビピリジン化合物(Ia)1モルに対して酸化剤が通常1~1.2モルの割合で用いられる。
該反応温度は、通常-20~80℃の範囲である。該反応時間は通常0.1~12時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を必要に応じて還元剤(例えば亜硫酸ナトリウム、チオ硫酸ナトリウム)の水溶液、及び塩基(例えば炭酸水素ナトリウム)の水溶液で洗浄する。得られた有機層を乾燥、濃縮することにより、本ビピリジン化合物(Ib)を得ることができる。 First, a method for producing the bipyridine compound (Ib) from the bipyridine compound (Ia) will be described.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform (hereinafter referred to as halogenated hydrocarbons).
Examples of the oxidizing agent used in the reaction include m-chloroperbenzoic acid (hereinafter referred to as mCPBA).
In the reaction, an oxidizing agent is usually used in an amount of 1 to 1.2 mol per 1 mol of the bipyridine compound (Ia).
The reaction temperature is usually in the range of −20 to 80 ° C. The reaction time is usually in the range of 0.1 to 12 hours.
After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is extracted with an aqueous solution of a reducing agent (for example, sodium sulfite or sodium thiosulfate) and an aqueous solution of a base (for example, sodium bicarbonate) as necessary. Wash with. The obtained bipyridine compound (Ib) can be obtained by drying and concentrating the obtained organic layer.
つぎに、本ビピリジン化合物(Ib)から本ビピリジン化合物(Ic)を製造する方法について記載する。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばハロゲン化炭化水素類が挙げられる。
該反応に用いられる酸化剤としては、例えばmCPBAが挙げられる。
該反応には、本ビピリジン化合物(Ib)1モルに対して、酸化剤が通常1~2モルの割合で用いられる。
該反応温度は、通常-20~80℃の範囲である。該反応時間は通常0.1~12時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を必要に応じて還元剤(例えば亜硫酸ナトリウム、チオ硫酸ナトリウム)の水溶液、及び塩基(例えば炭酸水素ナトリウム)の水溶液で洗浄する。この有機層を乾燥、濃縮することにより、本ビピリジン化合物(Ic)を得ることができる。 Next, a method for producing the bipyridine compound (Ic) from the bipyridine compound (Ib) will be described.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
Examples of the oxidizing agent used in the reaction include mCPBA.
In the reaction, an oxidizing agent is usually used at a ratio of 1 to 2 moles with respect to 1 mole of the bipyridine compound (Ib).
The reaction temperature is usually in the range of −20 to 80 ° C. The reaction time is usually in the range of 0.1 to 12 hours.
After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is extracted with an aqueous solution of a reducing agent (for example, sodium sulfite or sodium thiosulfate) and an aqueous solution of a base (for example, sodium bicarbonate) as necessary. Wash with. By drying and concentrating the organic layer, the bipyridine compound (Ic) can be obtained.
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばハロゲン化炭化水素類が挙げられる。
該反応に用いられる酸化剤としては、例えばmCPBAが挙げられる。
該反応には、本ビピリジン化合物(Ib)1モルに対して、酸化剤が通常1~2モルの割合で用いられる。
該反応温度は、通常-20~80℃の範囲である。該反応時間は通常0.1~12時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を必要に応じて還元剤(例えば亜硫酸ナトリウム、チオ硫酸ナトリウム)の水溶液、及び塩基(例えば炭酸水素ナトリウム)の水溶液で洗浄する。この有機層を乾燥、濃縮することにより、本ビピリジン化合物(Ic)を得ることができる。 Next, a method for producing the bipyridine compound (Ic) from the bipyridine compound (Ib) will be described.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
Examples of the oxidizing agent used in the reaction include mCPBA.
In the reaction, an oxidizing agent is usually used at a ratio of 1 to 2 moles with respect to 1 mole of the bipyridine compound (Ib).
The reaction temperature is usually in the range of −20 to 80 ° C. The reaction time is usually in the range of 0.1 to 12 hours.
After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is extracted with an aqueous solution of a reducing agent (for example, sodium sulfite or sodium thiosulfate) and an aqueous solution of a base (for example, sodium bicarbonate) as necessary. Wash with. By drying and concentrating the organic layer, the bipyridine compound (Ic) can be obtained.
また、本ビピリジン化合物(Ic)は、本ビピリジン化合物(Ia)と酸化剤とを反応させることにより、一段階反応(ワンポット)で製造することができる。
該反応は、酸化剤を本ビピリジン化合物(Ia)1モルに対して通常2~5モルの割合で用い、本ビピリジン化合物(Ib)から本ビピリジン化合物(Ic)を製造する方法に準じて実施することができる。 Moreover, this bipyridine compound (Ic) can be manufactured by one step reaction (one pot) by making this bipyridine compound (Ia) and an oxidizing agent react.
The reaction is carried out according to the method for producing the bipyridine compound (Ic) from the bipyridine compound (Ib) using an oxidizing agent in a proportion of usually 2 to 5 mol with respect to 1 mol of the bipyridine compound (Ia). be able to.
該反応は、酸化剤を本ビピリジン化合物(Ia)1モルに対して通常2~5モルの割合で用い、本ビピリジン化合物(Ib)から本ビピリジン化合物(Ic)を製造する方法に準じて実施することができる。 Moreover, this bipyridine compound (Ic) can be manufactured by one step reaction (one pot) by making this bipyridine compound (Ia) and an oxidizing agent react.
The reaction is carried out according to the method for producing the bipyridine compound (Ic) from the bipyridine compound (Ib) using an oxidizing agent in a proportion of usually 2 to 5 mol with respect to 1 mol of the bipyridine compound (Ia). be able to.
製造法2
式(Id)で示される本ビピリジン化合物(以下、本ビピリジン化合物(Id)と記す。)、式(Ie)で示される本ビピリジン化合物(以下、本ビピリジン化合物(Ie)と記す。)、及び式(If)で示される本ビピリジン化合物(以下、本ビピリジン化合物(If)と記す。)は、本ビピリジン化合物(Ic)と酸化剤とを反応させることにより製造することができる。
[式中、記号は前記と同じ意味を表す。] Manufacturing method 2
The bipyridine compound represented by the formula (Id) (hereinafter referred to as the present bipyridine compound (Id)), the bipyridine compound represented by the formula (Ie) (hereinafter referred to as the present bipyridine compound (Ie)), and the formula The bipyridine compound represented by (If) (hereinafter referred to as the present bipyridine compound (If)) can be produced by reacting the bipyridine compound (Ic) with an oxidizing agent.
[Wherein the symbols have the same meaning as described above. ]
式(Id)で示される本ビピリジン化合物(以下、本ビピリジン化合物(Id)と記す。)、式(Ie)で示される本ビピリジン化合物(以下、本ビピリジン化合物(Ie)と記す。)、及び式(If)で示される本ビピリジン化合物(以下、本ビピリジン化合物(If)と記す。)は、本ビピリジン化合物(Ic)と酸化剤とを反応させることにより製造することができる。
[式中、記号は前記と同じ意味を表す。] Manufacturing method 2
The bipyridine compound represented by the formula (Id) (hereinafter referred to as the present bipyridine compound (Id)), the bipyridine compound represented by the formula (Ie) (hereinafter referred to as the present bipyridine compound (Ie)), and the formula The bipyridine compound represented by (If) (hereinafter referred to as the present bipyridine compound (If)) can be produced by reacting the bipyridine compound (Ic) with an oxidizing agent.
[Wherein the symbols have the same meaning as described above. ]
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばハロゲン化炭化水素類が挙げられる。
該反応に用いられる酸化剤としては、例えばmCPBAが挙げられる。
該反応には、本ビピリジン化合物(Ic)1モルに対して、酸化剤が通常1~10モルの割合で用いられる。
該反応温度は、通常-20~80℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を必要に応じて還元剤(例えば亜硫酸ナトリウム、チオ硫酸ナトリウム)の水溶液、及び塩基(例えば炭酸水素ナトリウム)の水溶液で洗浄する。得られた有機層を乾燥、濃縮することにより、本ビピリジン化合物(Id)、本ビピリジン化合物(Ie)、及び本ビピリジン化合物(If)の混合物を得ることができる。この混合物を、クロマトグラフィー、再結晶等を行う事で、本ビピリジン化合物(Id)、本ビピリジン化合物(Ie)、及び本ビピリジン化合物(If)をそれぞれ単離することができる。 The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
Examples of the oxidizing agent used in the reaction include mCPBA.
In the reaction, the oxidizing agent is usually used in a ratio of 1 to 10 mol per 1 mol of the bipyridine compound (Ic).
The reaction temperature is usually in the range of −20 to 80 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is extracted with an aqueous solution of a reducing agent (for example, sodium sulfite or sodium thiosulfate) and an aqueous solution of a base (for example, sodium bicarbonate) as necessary. Wash with. By drying and concentrating the obtained organic layer, this bipyridine compound (Id), this bipyridine compound (Ie), and the mixture of this bipyridine compound (If) can be obtained. This bipyridine compound (Id), this bipyridine compound (Ie), and this bipyridine compound (If) can be isolated by subjecting this mixture to chromatography, recrystallization, and the like.
該反応に用いられる酸化剤としては、例えばmCPBAが挙げられる。
該反応には、本ビピリジン化合物(Ic)1モルに対して、酸化剤が通常1~10モルの割合で用いられる。
該反応温度は、通常-20~80℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を必要に応じて還元剤(例えば亜硫酸ナトリウム、チオ硫酸ナトリウム)の水溶液、及び塩基(例えば炭酸水素ナトリウム)の水溶液で洗浄する。得られた有機層を乾燥、濃縮することにより、本ビピリジン化合物(Id)、本ビピリジン化合物(Ie)、及び本ビピリジン化合物(If)の混合物を得ることができる。この混合物を、クロマトグラフィー、再結晶等を行う事で、本ビピリジン化合物(Id)、本ビピリジン化合物(Ie)、及び本ビピリジン化合物(If)をそれぞれ単離することができる。 The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
Examples of the oxidizing agent used in the reaction include mCPBA.
In the reaction, the oxidizing agent is usually used in a ratio of 1 to 10 mol per 1 mol of the bipyridine compound (Ic).
The reaction temperature is usually in the range of −20 to 80 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, water is added to the reaction mixture, extraction is performed with an organic solvent, and the organic layer is extracted with an aqueous solution of a reducing agent (for example, sodium sulfite or sodium thiosulfate) and an aqueous solution of a base (for example, sodium bicarbonate) as necessary. Wash with. By drying and concentrating the obtained organic layer, this bipyridine compound (Id), this bipyridine compound (Ie), and the mixture of this bipyridine compound (If) can be obtained. This bipyridine compound (Id), this bipyridine compound (Ie), and this bipyridine compound (If) can be isolated by subjecting this mixture to chromatography, recrystallization, and the like.
製造法3
本ビピリジン化合物(Ia)は、式(M-1)で示される化合物(以下、化合物(M-1)と記す。)と式(R-1)で示される化合物(以下、化合物(R-1)と記す。)とを塩基の存在下で反応させることにより製造することができる。
[式中、Vはハロゲン原子を表し、その他の記号は前記と同じ意味を表す。]
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばジメチルホルムアミド(以下、DMFと記す。)、N-メチルピロリドン(以下、NMPと記す)、ジメチルスルホキシド(以下、DMSOと記す。)等の非プロトン性極性溶媒(以下、非プロトン性極性溶媒と記す。)が挙げられる。
該反応に用いられる塩基としては、例えば水素化ナトリウム等のアルカリ金属水素化物類(以下、アルカリ金属水素化物類と記す。)が挙げられる。
該反応には、化合物(M-1)1モルに対して、化合物(R-1)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応温度は、通常-20℃~150℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ia)を得ることができる。
該反応において、Vはフッ素原子又は塩素原子が好ましい。 Production method 3
The bipyridine compound (Ia) includes a compound represented by formula (M-1) (hereinafter referred to as compound (M-1)) and a compound represented by formula (R-1) (hereinafter referred to as compound (R-1)). And) in the presence of a base.
[Wherein V represents a halogen atom, and other symbols have the same meaning as described above. ]
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include aprotic polar solvents such as dimethylformamide (hereinafter referred to as DMF), N-methylpyrrolidone (hereinafter referred to as NMP), and dimethyl sulfoxide (hereinafter referred to as DMSO). (Hereinafter referred to as aprotic polar solvent).
Examples of the base used in the reaction include alkali metal hydrides such as sodium hydride (hereinafter referred to as alkali metal hydrides).
In the reaction, with respect to 1 mol of compound (M-1), compound (R-1) is usually used at a ratio of 1 to 10 mol, and base is usually used at a ratio of 1 to 10 mol.
The reaction temperature is usually in the range of −20 ° C. to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the bipyridine compound (Ia) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
In the reaction, V is preferably a fluorine atom or a chlorine atom.
本ビピリジン化合物(Ia)は、式(M-1)で示される化合物(以下、化合物(M-1)と記す。)と式(R-1)で示される化合物(以下、化合物(R-1)と記す。)とを塩基の存在下で反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばジメチルホルムアミド(以下、DMFと記す。)、N-メチルピロリドン(以下、NMPと記す)、ジメチルスルホキシド(以下、DMSOと記す。)等の非プロトン性極性溶媒(以下、非プロトン性極性溶媒と記す。)が挙げられる。
該反応に用いられる塩基としては、例えば水素化ナトリウム等のアルカリ金属水素化物類(以下、アルカリ金属水素化物類と記す。)が挙げられる。
該反応には、化合物(M-1)1モルに対して、化合物(R-1)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応温度は、通常-20℃~150℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ia)を得ることができる。
該反応において、Vはフッ素原子又は塩素原子が好ましい。 Production method 3
The bipyridine compound (Ia) includes a compound represented by formula (M-1) (hereinafter referred to as compound (M-1)) and a compound represented by formula (R-1) (hereinafter referred to as compound (R-1)). And) in the presence of a base.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include aprotic polar solvents such as dimethylformamide (hereinafter referred to as DMF), N-methylpyrrolidone (hereinafter referred to as NMP), and dimethyl sulfoxide (hereinafter referred to as DMSO). (Hereinafter referred to as aprotic polar solvent).
Examples of the base used in the reaction include alkali metal hydrides such as sodium hydride (hereinafter referred to as alkali metal hydrides).
In the reaction, with respect to 1 mol of compound (M-1), compound (R-1) is usually used at a ratio of 1 to 10 mol, and base is usually used at a ratio of 1 to 10 mol.
The reaction temperature is usually in the range of −20 ° C. to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the bipyridine compound (Ia) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
In the reaction, V is preferably a fluorine atom or a chlorine atom.
製造法4
本ビピリジン化合物(Ia)は、式(M-2)で示される化合物(以下、化合物(M-2)と記す。)と式(R-2)で示される化合物(以下、化合物(R-2)と記す。)とを塩基の存在下で反応させることにより製造することができる。
[式中、V1は塩素原子、臭素原子、又はヨウ素原子を表し、その他の記号は前記と同じ意味を表す。]
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応に用いられる塩基としては、例えば炭酸カリウム、炭酸セシウム等のアルカリ金属炭酸塩類(以下、アルカリ金属炭酸塩類と記す。)が挙げられる。
該反応には、化合物(M-2)1モルに対して、化合物(R-2)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応温度は、通常-20℃~150℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ia)を得ることができる。 Manufacturing method 4
The bipyridine compound (Ia) includes a compound represented by formula (M-2) (hereinafter referred to as compound (M-2)) and a compound represented by formula (R-2) (hereinafter referred to as compound (R-2)). And) in the presence of a base.
[Wherein, V 1 represents a chlorine atom, a bromine atom or an iodine atom, and other symbols have the same meaning as described above. ]
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
Examples of the base used in the reaction include alkali metal carbonates such as potassium carbonate and cesium carbonate (hereinafter referred to as alkali metal carbonates).
In the reaction, with respect to 1 mole of the compound (M-2), the compound (R-2) is usually used at a ratio of 1 to 10 moles, and the base is usually used at a ratio of 1 to 10 moles.
The reaction temperature is usually in the range of −20 ° C. to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the bipyridine compound (Ia) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
本ビピリジン化合物(Ia)は、式(M-2)で示される化合物(以下、化合物(M-2)と記す。)と式(R-2)で示される化合物(以下、化合物(R-2)と記す。)とを塩基の存在下で反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応に用いられる塩基としては、例えば炭酸カリウム、炭酸セシウム等のアルカリ金属炭酸塩類(以下、アルカリ金属炭酸塩類と記す。)が挙げられる。
該反応には、化合物(M-2)1モルに対して、化合物(R-2)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応温度は、通常-20℃~150℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ia)を得ることができる。 Manufacturing method 4
The bipyridine compound (Ia) includes a compound represented by formula (M-2) (hereinafter referred to as compound (M-2)) and a compound represented by formula (R-2) (hereinafter referred to as compound (R-2)). And) in the presence of a base.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
Examples of the base used in the reaction include alkali metal carbonates such as potassium carbonate and cesium carbonate (hereinafter referred to as alkali metal carbonates).
In the reaction, with respect to 1 mole of the compound (M-2), the compound (R-2) is usually used at a ratio of 1 to 10 moles, and the base is usually used at a ratio of 1 to 10 moles.
The reaction temperature is usually in the range of −20 ° C. to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the bipyridine compound (Ia) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
製造法5
式(I)で示される本ビピリジン化合物(以下、本ビピリジン化合物(I)と記す。)は、式(M-3)で示される化合物(以下、化合物(M-3)と記す。)と式(R-3)で示される化合物(以下、化合物(R-3)と記す。)とを、塩基の存在下で反応させることにより製造することができる。
[式中、V2はC1-C10ペルフルオロアルカンスルホニルオキシ基を表し、その他の記号は前記と同じ意味を表す。]
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応に用いられる塩基としては、例えばアルカリ金属炭酸塩類が挙げられる。
該反応には、化合物(M-3)1モルに対して、化合物(R-3)が通常1~10モルの割合で用いられ、塩基が通常0.1~5モルの割合で用いられる。
該反応温度は、通常-20℃~120℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(I)を得ることができる。 Manufacturing method 5
The bipyridine compound represented by the formula (I) (hereinafter referred to as the present bipyridine compound (I)) is composed of the compound represented by the formula (M-3) (hereinafter referred to as the compound (M-3)) and the formula. It can be produced by reacting a compound represented by (R-3) (hereinafter referred to as compound (R-3)) in the presence of a base.
[Wherein V 2 represents a C1-C10 perfluoroalkanesulfonyloxy group, and other symbols have the same meaning as described above. ]
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
Examples of the base used in the reaction include alkali metal carbonates.
In the reaction, compound (R-3) is usually used in a proportion of 1 to 10 mol, and a base is usually used in a proportion of 0.1 to 5 mol with respect to 1 mol of compound (M-3).
The reaction temperature is usually in the range of −20 ° C. to 120 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (I) can be obtained by performing post-treatment operations such as adding water of the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
式(I)で示される本ビピリジン化合物(以下、本ビピリジン化合物(I)と記す。)は、式(M-3)で示される化合物(以下、化合物(M-3)と記す。)と式(R-3)で示される化合物(以下、化合物(R-3)と記す。)とを、塩基の存在下で反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応に用いられる塩基としては、例えばアルカリ金属炭酸塩類が挙げられる。
該反応には、化合物(M-3)1モルに対して、化合物(R-3)が通常1~10モルの割合で用いられ、塩基が通常0.1~5モルの割合で用いられる。
該反応温度は、通常-20℃~120℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(I)を得ることができる。 Manufacturing method 5
The bipyridine compound represented by the formula (I) (hereinafter referred to as the present bipyridine compound (I)) is composed of the compound represented by the formula (M-3) (hereinafter referred to as the compound (M-3)) and the formula. It can be produced by reacting a compound represented by (R-3) (hereinafter referred to as compound (R-3)) in the presence of a base.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
Examples of the base used in the reaction include alkali metal carbonates.
In the reaction, compound (R-3) is usually used in a proportion of 1 to 10 mol, and a base is usually used in a proportion of 0.1 to 5 mol with respect to 1 mol of compound (M-3).
The reaction temperature is usually in the range of −20 ° C. to 120 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (I) can be obtained by performing post-treatment operations such as adding water of the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
製造法6
本ビピリジン化合物(I)は、式(M-4)で示される化合物(以下、化合物(M-4)と記す。)と式(R-4)で示される化合物(以下、化合物(R-4)と記す。)とを塩基の存在下で反応させることにより製造することができる。
[式中、記号は前記と同じ意味を表す。]
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応に用いられる塩基としては、例えばアルカリ金属水素化物類が挙げられる。
該反応には、化合物(M-4)1モルに対して、化合物(R-4)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応温度は、通常-20℃~150℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(I)を得ることができる。
該反応において、Vはフッ素原子が好ましい。 Manufacturing method 6
The bipyridine compound (I) includes a compound represented by formula (M-4) (hereinafter referred to as compound (M-4)) and a compound represented by formula (R-4) (hereinafter referred to as compound (R-4)). And) in the presence of a base.
[Wherein the symbols have the same meaning as described above. ]
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
Examples of the base used in the reaction include alkali metal hydrides.
In the reaction, with respect to 1 mol of the compound (M-4), the compound (R-4) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature is usually in the range of −20 ° C. to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the bipyridine compound (I) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
In the reaction, V is preferably a fluorine atom.
本ビピリジン化合物(I)は、式(M-4)で示される化合物(以下、化合物(M-4)と記す。)と式(R-4)で示される化合物(以下、化合物(R-4)と記す。)とを塩基の存在下で反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応に用いられる塩基としては、例えばアルカリ金属水素化物類が挙げられる。
該反応には、化合物(M-4)1モルに対して、化合物(R-4)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応温度は、通常-20℃~150℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(I)を得ることができる。
該反応において、Vはフッ素原子が好ましい。 Manufacturing method 6
The bipyridine compound (I) includes a compound represented by formula (M-4) (hereinafter referred to as compound (M-4)) and a compound represented by formula (R-4) (hereinafter referred to as compound (R-4)). And) in the presence of a base.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
Examples of the base used in the reaction include alkali metal hydrides.
In the reaction, with respect to 1 mol of the compound (M-4), the compound (R-4) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature is usually in the range of −20 ° C. to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the bipyridine compound (I) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
In the reaction, V is preferably a fluorine atom.
製造法7
式(Ig)で示される化合物(以下、本ビピリジン化合物(Ig)と記す。)は、下記に記載の方法に従って製造することができる。
[式中、R34、R35、及びR36は、それぞれ独立して水素原子、1以上のハロゲン原子を有していてもよいC1-C6アルキル基、群Dより選ばれる1以上の原子又は基を有していてもよいフェニル基、又は群Dより選ばれる1以上の原子もしくは基を有していてもよい5もしくは6員芳香族複素環基を表し、その他の記号は前記と同じ意味を表す。]
Manufacturing method 7
A compound represented by the formula (Ig) (hereinafter referred to as the present bipyridine compound (Ig)) can be produced according to the method described below.
[Wherein R 34 , R 35 , and R 36 each independently represents a hydrogen atom, a C1-C6 alkyl group optionally having one or more halogen atoms, one or more atoms selected from group D, or Represents a phenyl group which may have a group, or a 5- or 6-membered aromatic heterocyclic group which may have one or more atoms or groups selected from group D, and other symbols have the same meanings as described above Represents. ]
式(Ig)で示される化合物(以下、本ビピリジン化合物(Ig)と記す。)は、下記に記載の方法に従って製造することができる。
A compound represented by the formula (Ig) (hereinafter referred to as the present bipyridine compound (Ig)) can be produced according to the method described below.
はじめに、Step1について記載する。
Step1において、式(M-5)で示される化合物(以下、化合物(M-5)と記す。)と式(R-5)で示される化合物(以下、化合物(R-5)と記す。)とを反応させる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばアルコール類、非プロトン性極性溶媒及びこれらの混合物が挙げられる。
該反応には、化合物(M-5)1モルに対して、化合物(R-5)が通常1~10モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物を濃縮して得られる残渣をそのままStep2で用いる。 First, Step 1 will be described.
In Step 1, a compound represented by formula (M-5) (hereinafter referred to as compound (M-5)) and a compound represented by formula (R-5) (hereinafter referred to as compound (R-5)) And react.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include alcohols, aprotic polar solvents, and mixtures thereof.
In the reaction, compound (R-5) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (M-5).
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the residue obtained by concentrating the reaction mixture is directly used in Step 2.
Step1において、式(M-5)で示される化合物(以下、化合物(M-5)と記す。)と式(R-5)で示される化合物(以下、化合物(R-5)と記す。)とを反応させる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばアルコール類、非プロトン性極性溶媒及びこれらの混合物が挙げられる。
該反応には、化合物(M-5)1モルに対して、化合物(R-5)が通常1~10モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物を濃縮して得られる残渣をそのままStep2で用いる。 First, Step 1 will be described.
In Step 1, a compound represented by formula (M-5) (hereinafter referred to as compound (M-5)) and a compound represented by formula (R-5) (hereinafter referred to as compound (R-5)) And react.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include alcohols, aprotic polar solvents, and mixtures thereof.
In the reaction, compound (R-5) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (M-5).
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the residue obtained by concentrating the reaction mixture is directly used in Step 2.
続いて、Step2について記載する。
Step1で得られた残渣と、メタンスルホニルクロリド及びトリエチルアミンを反応させることにより、本ビピリジン化合物(Ig)を製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばテトラヒドロフラン、メチル-tert-ブチルエーテル(以下、MTBEと記す。)等のエーテル類(以下、エーテル類と記す。)が挙げられる。
該反応には、化合物(M-5)1モルに対して、メタンスルホニルクロリドが通常1~10モル、トリエチルアミンが通常1~10モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ig)を単離することができる。 Next, Step 2 will be described.
The bipyridine compound (Ig) can be produced by reacting the residue obtained in Step 1, methanesulfonyl chloride and triethylamine.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include ethers (hereinafter referred to as ethers) such as tetrahydrofuran and methyl-tert-butyl ether (hereinafter referred to as MTBE).
In the reaction, with respect to 1 mol of the compound (M-5), methanesulfonyl chloride is usually used in a proportion of 1 to 10 mol and triethylamine is usually used in a proportion of 1 to 10 mol.
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (Ig) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
Step1で得られた残渣と、メタンスルホニルクロリド及びトリエチルアミンを反応させることにより、本ビピリジン化合物(Ig)を製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばテトラヒドロフラン、メチル-tert-ブチルエーテル(以下、MTBEと記す。)等のエーテル類(以下、エーテル類と記す。)が挙げられる。
該反応には、化合物(M-5)1モルに対して、メタンスルホニルクロリドが通常1~10モル、トリエチルアミンが通常1~10モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ig)を単離することができる。 Next, Step 2 will be described.
The bipyridine compound (Ig) can be produced by reacting the residue obtained in Step 1, methanesulfonyl chloride and triethylamine.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include ethers (hereinafter referred to as ethers) such as tetrahydrofuran and methyl-tert-butyl ether (hereinafter referred to as MTBE).
In the reaction, with respect to 1 mol of the compound (M-5), methanesulfonyl chloride is usually used in a proportion of 1 to 10 mol and triethylamine is usually used in a proportion of 1 to 10 mol.
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (Ig) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
製造法8
式(Ih)で示される化合物(以下、本ビピリジン化合物(Ih)と記す。)は、例えば下記の方法に従って製造することができる。
[式中、記号は前記と同じ意味を表す。]
はじめに、化合物(M-5)から式(M-6)で示される化合物(以下、化合物(M-6)と記す。)を製造する方法について記す。
化合物(M-6)は、化合物(M-5)と式(R-6)で示される化合物(以下、化合物(R-6)と記す。)とを反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばハロゲン化炭化水素が挙げられる。
該反応には、化合物(M-5)1モルに対して、化合物(R-6)が通常1~10モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に重曹水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M-6)を単離することができる。 Manufacturing method 8
A compound represented by the formula (Ih) (hereinafter referred to as the present bipyridine compound (Ih)) can be produced, for example, according to the following method.
[Wherein the symbols have the same meaning as described above. ]
First, a method for producing a compound represented by the formula (M-6) (hereinafter referred to as compound (M-6)) from compound (M-5) will be described.
Compound (M-6) can be produced by reacting compound (M-5) with a compound represented by formula (R-6) (hereinafter referred to as compound (R-6)).
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
In the reaction, compound (R-6) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (M-5).
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M-6) can be isolated by performing post-treatment operations such as adding sodium bicarbonate water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer. .
式(Ih)で示される化合物(以下、本ビピリジン化合物(Ih)と記す。)は、例えば下記の方法に従って製造することができる。
はじめに、化合物(M-5)から式(M-6)で示される化合物(以下、化合物(M-6)と記す。)を製造する方法について記す。
化合物(M-6)は、化合物(M-5)と式(R-6)で示される化合物(以下、化合物(R-6)と記す。)とを反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばハロゲン化炭化水素が挙げられる。
該反応には、化合物(M-5)1モルに対して、化合物(R-6)が通常1~10モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に重曹水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M-6)を単離することができる。 Manufacturing method 8
A compound represented by the formula (Ih) (hereinafter referred to as the present bipyridine compound (Ih)) can be produced, for example, according to the following method.
First, a method for producing a compound represented by the formula (M-6) (hereinafter referred to as compound (M-6)) from compound (M-5) will be described.
Compound (M-6) can be produced by reacting compound (M-5) with a compound represented by formula (R-6) (hereinafter referred to as compound (R-6)).
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
In the reaction, compound (R-6) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (M-5).
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M-6) can be isolated by performing post-treatment operations such as adding sodium bicarbonate water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer. .
つづいて、化合物(M-6)から本ビピリジン化合物(Ih)を製造する方法について記す。本ビピリジン化合物(Ih)は、化合物(M-6)とハロゲン化剤とを反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばハロゲン化炭化水素類が挙げられる。
該反応に用いられるハロゲン化剤としては、N-ブロモスクシンイミド、N-クロロスクシンイミドが挙げられる。
該反応は必要に応じて、過酸化ベンゾイルを加えてもよい。
該反応には、化合物(M-6)1モルに対して、ハロゲン化剤が通常1~10モルの割合、過酸化ベンゾイルが通常0.1~0.5モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に、ナトリウムメトキシドを発熱が収まるまで加え、次に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ih)を単離することができる。 Next, a method for producing the bipyridine compound (Ih) from the compound (M-6) will be described. This bipyridine compound (Ih) can be produced by reacting compound (M-6) with a halogenating agent.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
Examples of the halogenating agent used in the reaction include N-bromosuccinimide and N-chlorosuccinimide.
In the reaction, benzoyl peroxide may be added as necessary.
In the reaction, with respect to 1 mol of the compound (M-6), the halogenating agent is usually used in a proportion of 1 to 10 mol, and benzoyl peroxide is usually used in the proportion of 0.1 to 0.5 mol.
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, sodium methoxide is added to the reaction mixture until the exotherm subsides, then water is added, extraction is performed with an organic solvent, and the organic layer is dried and concentrated, followed by post-treatment operations such as this. The bipyridine compound (Ih) can be isolated.
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばハロゲン化炭化水素類が挙げられる。
該反応に用いられるハロゲン化剤としては、N-ブロモスクシンイミド、N-クロロスクシンイミドが挙げられる。
該反応は必要に応じて、過酸化ベンゾイルを加えてもよい。
該反応には、化合物(M-6)1モルに対して、ハロゲン化剤が通常1~10モルの割合、過酸化ベンゾイルが通常0.1~0.5モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に、ナトリウムメトキシドを発熱が収まるまで加え、次に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ih)を単離することができる。 Next, a method for producing the bipyridine compound (Ih) from the compound (M-6) will be described. This bipyridine compound (Ih) can be produced by reacting compound (M-6) with a halogenating agent.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
Examples of the halogenating agent used in the reaction include N-bromosuccinimide and N-chlorosuccinimide.
In the reaction, benzoyl peroxide may be added as necessary.
In the reaction, with respect to 1 mol of the compound (M-6), the halogenating agent is usually used in a proportion of 1 to 10 mol, and benzoyl peroxide is usually used in the proportion of 0.1 to 0.5 mol.
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, sodium methoxide is added to the reaction mixture until the exotherm subsides, then water is added, extraction is performed with an organic solvent, and the organic layer is dried and concentrated, followed by post-treatment operations such as this. The bipyridine compound (Ih) can be isolated.
製造法9
式(Ii)で示される化合物(以下、本ビピリジン化合物(Ii)と記す。)の製造法としては、例えば下記の方法が挙げられる。
[式中、R37はC1-C6アルキル基を表し、その他の記号は前記と同じ意味を表す。]
はじめに、Step1について記載する。式(M-7)で示される化合物(以下、化合物(M-7)と記す。)と式(R-7)で示される化合物(以下、化合物(R-7)と記す。)とを塩基存在下で反応させる。
化合物(R-7)は、国際公開第2009/054742号記載の方法に準じて製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばハロゲン化炭化水素類が挙げられる。
該反応に用いられる塩基としては、例えばトリエチルアミン、ピリジン等の有機塩基類(以下、有機塩基類と記す。)が挙げられる。
該反応には、化合物(M-7)1モルに対して、化合物(R-7)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応温度は、通常-50~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行って得られる残渣をStep2で用いる。 Manufacturing method 9
Examples of the method for producing the compound represented by the formula (Ii) (hereinafter referred to as the present bipyridine compound (Ii)) include the following methods.
[Wherein R 37 represents a C1-C6 alkyl group, and other symbols have the same meaning as described above. ]
First, Step 1 will be described. A compound represented by formula (M-7) (hereinafter referred to as compound (M-7)) and a compound represented by formula (R-7) (hereinafter referred to as compound (R-7)) are prepared as bases. React in the presence.
Compound (R-7) can be produced according to the method described in WO2009 / 054742.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
Examples of the base used in the reaction include organic bases such as triethylamine and pyridine (hereinafter referred to as organic bases).
In the reaction, with respect to 1 mol of compound (M-7), compound (R-7) is usually used at a ratio of 1 to 10 mol, and base is usually used at a ratio of 1 to 10 mol.
The reaction temperature is usually in the range of −50 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the residue obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer is used in Step 2.
式(Ii)で示される化合物(以下、本ビピリジン化合物(Ii)と記す。)の製造法としては、例えば下記の方法が挙げられる。
はじめに、Step1について記載する。式(M-7)で示される化合物(以下、化合物(M-7)と記す。)と式(R-7)で示される化合物(以下、化合物(R-7)と記す。)とを塩基存在下で反応させる。
化合物(R-7)は、国際公開第2009/054742号記載の方法に準じて製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばハロゲン化炭化水素類が挙げられる。
該反応に用いられる塩基としては、例えばトリエチルアミン、ピリジン等の有機塩基類(以下、有機塩基類と記す。)が挙げられる。
該反応には、化合物(M-7)1モルに対して、化合物(R-7)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応温度は、通常-50~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行って得られる残渣をStep2で用いる。 Manufacturing method 9
Examples of the method for producing the compound represented by the formula (Ii) (hereinafter referred to as the present bipyridine compound (Ii)) include the following methods.
First, Step 1 will be described. A compound represented by formula (M-7) (hereinafter referred to as compound (M-7)) and a compound represented by formula (R-7) (hereinafter referred to as compound (R-7)) are prepared as bases. React in the presence.
Compound (R-7) can be produced according to the method described in WO2009 / 054742.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
Examples of the base used in the reaction include organic bases such as triethylamine and pyridine (hereinafter referred to as organic bases).
In the reaction, with respect to 1 mol of compound (M-7), compound (R-7) is usually used at a ratio of 1 to 10 mol, and base is usually used at a ratio of 1 to 10 mol.
The reaction temperature is usually in the range of −50 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the residue obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer is used in Step 2.
続いて、Step2について記載する。
Step1で得られた残渣と、アンモニアとを反応させることにより、本ビピリジン化合物(Ii)を製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばアルコール類、水及びこれらの混合物が挙げられる。
該反応に用いられるアンモニアとして、アンモニア水溶液、アンモニアメタノール溶液等を用いる事ができる。
該反応には、化合物(M-7)1モルに対して、アンモニアが通常1~100モルの割合で用いられる。
該反応温度は、通常0~100℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ii)を単離する事ができる。 Next, Step 2 will be described.
The bipyridine compound (Ii) can be produced by reacting the residue obtained in Step 1 with ammonia.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include alcohols, water, and mixtures thereof.
As the ammonia used in the reaction, an aqueous ammonia solution, an ammonia methanol solution, or the like can be used.
In the reaction, ammonia is usually used at a ratio of 1 to 100 mol per 1 mol of compound (M-7).
The reaction temperature is usually in the range of 0 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (Ii) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
Step1で得られた残渣と、アンモニアとを反応させることにより、本ビピリジン化合物(Ii)を製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばアルコール類、水及びこれらの混合物が挙げられる。
該反応に用いられるアンモニアとして、アンモニア水溶液、アンモニアメタノール溶液等を用いる事ができる。
該反応には、化合物(M-7)1モルに対して、アンモニアが通常1~100モルの割合で用いられる。
該反応温度は、通常0~100℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ii)を単離する事ができる。 Next, Step 2 will be described.
The bipyridine compound (Ii) can be produced by reacting the residue obtained in Step 1 with ammonia.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include alcohols, water, and mixtures thereof.
As the ammonia used in the reaction, an aqueous ammonia solution, an ammonia methanol solution, or the like can be used.
In the reaction, ammonia is usually used at a ratio of 1 to 100 mol per 1 mol of compound (M-7).
The reaction temperature is usually in the range of 0 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (Ii) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
製造法10
式(Ij)で示される化合物(以下、本ビピリジン化合物(Ij)と記す。)は、化合物(M-5)と式(R-8)で示される化合物(以下、化合物(R-8)と記す。)とを反応させることにより製造することができる。
[式中、記号は前記と同じ意味を表す。]
該反応は、必要に応じて溶媒を用いることができる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応には、化合物(M-5)1モルに対して、化合物(R-8)が通常1~10モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ij)を単離することができる。 Manufacturing method 10
The compound represented by the formula (Ij) (hereinafter referred to as the present bipyridine compound (Ij)) is composed of the compound (M-5) and the compound represented by the formula (R-8) (hereinafter referred to as the compound (R-8)). It can be manufactured by reacting.
[Wherein the symbols have the same meaning as described above. ]
In the reaction, a solvent can be used as necessary. Examples of the solvent used in the reaction include an aprotic polar solvent.
In the reaction, compound (R-8) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (M-5).
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (Ij) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
式(Ij)で示される化合物(以下、本ビピリジン化合物(Ij)と記す。)は、化合物(M-5)と式(R-8)で示される化合物(以下、化合物(R-8)と記す。)とを反応させることにより製造することができる。
該反応は、必要に応じて溶媒を用いることができる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応には、化合物(M-5)1モルに対して、化合物(R-8)が通常1~10モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ij)を単離することができる。 Manufacturing method 10
The compound represented by the formula (Ij) (hereinafter referred to as the present bipyridine compound (Ij)) is composed of the compound (M-5) and the compound represented by the formula (R-8) (hereinafter referred to as the compound (R-8)). It can be manufactured by reacting.
In the reaction, a solvent can be used as necessary. Examples of the solvent used in the reaction include an aprotic polar solvent.
In the reaction, compound (R-8) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (M-5).
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (Ij) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
製造法11
式(Ip)で示される化合物(以下、本ビピリジン化合物(Ip)と記す。)は、式(Ik)で示される化合物(以下、本ビピリジン化合物(Ik)と記す。)と式(R-12)で示される化合物(以下、化合物(R-12)と記す。)とを、塩基の存在下で反応させることにより製造することができる。
[式中、X3はフッ素原子、塩素原子、又はS(O)2R15を表し、rは0、1又は2を表し、その他の記号は前記と同じ意味を表す。]
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応に用いられる塩基としては、アルカリ金属炭酸塩類、アルカリ金属水素化物類等が挙げられる。
該反応には、本ビピリジン化合物(Ik)1モルに対して、化合物(R-12)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ip)を単離することができる。 Manufacturing method 11
The compound represented by the formula (Ip) (hereinafter referred to as the present bipyridine compound (Ip)) is the same as the compound represented by the formula (Ik) (hereinafter referred to as the present bipyridine compound (Ik)) and the formula (R-12). ) (Hereinafter referred to as the compound (R-12)) is reacted in the presence of a base.
[Wherein, X 3 represents a fluorine atom, a chlorine atom, or S (O) 2 R 15 ; r represents 0, 1 or 2; and other symbols represent the same meaning as described above. ]
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
Examples of the base used in the reaction include alkali metal carbonates and alkali metal hydrides.
In the reaction, with respect to 1 mole of the bipyridine compound (Ik), the compound (R-12) is usually used in a proportion of 1 to 10 moles, and the base is usually used in a proportion of 1 to 10 moles.
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (Ip) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
式(Ip)で示される化合物(以下、本ビピリジン化合物(Ip)と記す。)は、式(Ik)で示される化合物(以下、本ビピリジン化合物(Ik)と記す。)と式(R-12)で示される化合物(以下、化合物(R-12)と記す。)とを、塩基の存在下で反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応に用いられる塩基としては、アルカリ金属炭酸塩類、アルカリ金属水素化物類等が挙げられる。
該反応には、本ビピリジン化合物(Ik)1モルに対して、化合物(R-12)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ip)を単離することができる。 Manufacturing method 11
The compound represented by the formula (Ip) (hereinafter referred to as the present bipyridine compound (Ip)) is the same as the compound represented by the formula (Ik) (hereinafter referred to as the present bipyridine compound (Ik)) and the formula (R-12). ) (Hereinafter referred to as the compound (R-12)) is reacted in the presence of a base.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
Examples of the base used in the reaction include alkali metal carbonates and alkali metal hydrides.
In the reaction, with respect to 1 mole of the bipyridine compound (Ik), the compound (R-12) is usually used in a proportion of 1 to 10 moles, and the base is usually used in a proportion of 1 to 10 moles.
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (Ip) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
製造法12
式(Im)で示される化合物(以下、本ビピリジン化合物(Im)と記す。)は、本ビピリジン化合物(Ik)と式(R-9)で示される化合物(以下、化合物(R-9)と記す。)とを反応させることにより製造することができる。
式(In)で示される化合物(以下、本ビピリジン化合物(In)と記す。)は、本ビピリジン化合物(Ik)と式(R-10)で示される化合物(以下、化合物(R-10)と記す。)とを反応させることにより製造することができる。
式(Io)で示される化合物(以下、本ビピリジン化合物(Io)と記す。)は、本ビピリジン化合物(Ik)と式(R-11)で示される化合物(以下、化合物(R-11)と記す。)とを反応させることにより製造することができる。
[式中、記号は前記と同じ意味を表す。]
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばエーテル類、アセトニトリル等のニトリル類(以下、ニトリル類と記す。)、非プロトン性極性溶媒及びこれらの混合物が挙げられる。
該反応には、必要に応じて塩基を加えて行うこともできる。該反応に用いられる塩基としては、アルカリ金属炭酸塩類、アルカリ金属水素化物類、有機塩基類等が挙げられる。
該反応には、本ビピリジン化合物(Im)を製造するとき、本ビピリジン化合物(Ik)1モルに対して、化合物(R-9)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応には、本ビピリジン化合物(In)を製造するとき、本ビピリジン化合物(Ik)化合物1モルに対して、化合物(R-10)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応には、本ビピリジン化合物(Io)を製造するとき、本ビピリジン化合物(Ik)化合物1モルに対して、化合物(R-11)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Im)、本ビピリジン化合物(In)、又は本ビピリジン化合物(Io)を得ることができる。 Production method 12
The compound represented by the formula (Im) (hereinafter referred to as the present bipyridine compound (Im)) is composed of the present bipyridine compound (Ik) and the compound represented by the formula (R-9) (hereinafter referred to as the compound (R-9)). It can be manufactured by reacting.
The compound represented by the formula (In) (hereinafter referred to as the present bipyridine compound (In)) is composed of the present bipyridine compound (Ik) and the compound represented by the formula (R-10) (hereinafter referred to as the compound (R-10)). It can be manufactured by reacting.
The compound represented by the formula (Io) (hereinafter referred to as the present bipyridine compound (Io)) is composed of the present bipyridine compound (Ik) and the compound represented by the formula (R-11) (hereinafter referred to as the compound (R-11)). It can be manufactured by reacting.
[Wherein the symbols have the same meaning as described above. ]
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include ethers, nitriles such as acetonitrile (hereinafter referred to as nitriles), aprotic polar solvents, and mixtures thereof.
The reaction can be carried out by adding a base as necessary. Examples of the base used in the reaction include alkali metal carbonates, alkali metal hydrides, organic bases and the like.
In the reaction, when the bipyridine compound (Im) is produced, the compound (R-9) is usually in a ratio of 1 to 10 mol and the base is usually 1 to 10 mol with respect to 1 mol of the bipyridine compound (Ik). It is used in the ratio.
In the reaction, when the present bipyridine compound (In) is produced, the compound (R-10) is usually in a ratio of 1 to 10 mol and the base is usually in an amount of 1 to 10 per 1 mol of the bipyridine compound (Ik) compound. Used in molar proportions.
In the reaction, when the bipyridine compound (Io) is produced, the compound (R-11) is usually in a ratio of 1 to 10 mol and the base is usually 1 to 10 per 1 mol of the bipyridine compound (Ik) compound. Used in molar proportions.
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, post-treatment operations such as addition of water to the reaction mixture, extraction with an organic solvent, drying and concentration of the organic layer, and the like are performed, thereby the present bipyridine compound (Im), the present bipyridine compound (In), Or this bipyridine compound (Io) can be obtained.
式(Im)で示される化合物(以下、本ビピリジン化合物(Im)と記す。)は、本ビピリジン化合物(Ik)と式(R-9)で示される化合物(以下、化合物(R-9)と記す。)とを反応させることにより製造することができる。
式(In)で示される化合物(以下、本ビピリジン化合物(In)と記す。)は、本ビピリジン化合物(Ik)と式(R-10)で示される化合物(以下、化合物(R-10)と記す。)とを反応させることにより製造することができる。
式(Io)で示される化合物(以下、本ビピリジン化合物(Io)と記す。)は、本ビピリジン化合物(Ik)と式(R-11)で示される化合物(以下、化合物(R-11)と記す。)とを反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばエーテル類、アセトニトリル等のニトリル類(以下、ニトリル類と記す。)、非プロトン性極性溶媒及びこれらの混合物が挙げられる。
該反応には、必要に応じて塩基を加えて行うこともできる。該反応に用いられる塩基としては、アルカリ金属炭酸塩類、アルカリ金属水素化物類、有機塩基類等が挙げられる。
該反応には、本ビピリジン化合物(Im)を製造するとき、本ビピリジン化合物(Ik)1モルに対して、化合物(R-9)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応には、本ビピリジン化合物(In)を製造するとき、本ビピリジン化合物(Ik)化合物1モルに対して、化合物(R-10)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応には、本ビピリジン化合物(Io)を製造するとき、本ビピリジン化合物(Ik)化合物1モルに対して、化合物(R-11)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Im)、本ビピリジン化合物(In)、又は本ビピリジン化合物(Io)を得ることができる。 Production method 12
The compound represented by the formula (Im) (hereinafter referred to as the present bipyridine compound (Im)) is composed of the present bipyridine compound (Ik) and the compound represented by the formula (R-9) (hereinafter referred to as the compound (R-9)). It can be manufactured by reacting.
The compound represented by the formula (In) (hereinafter referred to as the present bipyridine compound (In)) is composed of the present bipyridine compound (Ik) and the compound represented by the formula (R-10) (hereinafter referred to as the compound (R-10)). It can be manufactured by reacting.
The compound represented by the formula (Io) (hereinafter referred to as the present bipyridine compound (Io)) is composed of the present bipyridine compound (Ik) and the compound represented by the formula (R-11) (hereinafter referred to as the compound (R-11)). It can be manufactured by reacting.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include ethers, nitriles such as acetonitrile (hereinafter referred to as nitriles), aprotic polar solvents, and mixtures thereof.
The reaction can be carried out by adding a base as necessary. Examples of the base used in the reaction include alkali metal carbonates, alkali metal hydrides, organic bases and the like.
In the reaction, when the bipyridine compound (Im) is produced, the compound (R-9) is usually in a ratio of 1 to 10 mol and the base is usually 1 to 10 mol with respect to 1 mol of the bipyridine compound (Ik). It is used in the ratio.
In the reaction, when the present bipyridine compound (In) is produced, the compound (R-10) is usually in a ratio of 1 to 10 mol and the base is usually in an amount of 1 to 10 per 1 mol of the bipyridine compound (Ik) compound. Used in molar proportions.
In the reaction, when the bipyridine compound (Io) is produced, the compound (R-11) is usually in a ratio of 1 to 10 mol and the base is usually 1 to 10 per 1 mol of the bipyridine compound (Ik) compound. Used in molar proportions.
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, post-treatment operations such as addition of water to the reaction mixture, extraction with an organic solvent, drying and concentration of the organic layer, and the like are performed, thereby the present bipyridine compound (Im), the present bipyridine compound (In), Or this bipyridine compound (Io) can be obtained.
製造法13
式(Iq)で示される化合物(以下、本ビピリジン化合物(Iq)と記す。)は、本ビピリジン化合物(Ik)と、式(R-13)で示される化合物(以下、化合物(R-13)と記す。)とを塩基の存在下で反応させることにより製造することができる。
[式中、B1及びB2は各々独立して窒素原子又はCR33を表し、R31、R32、及びR33は、各々独立して水素原子、又は群Dより選ばれる1の置換基を表し、その他の記号は前記と同じ意味を表す。]
該反応は、化合物(R-12)に代えて化合物(R-13)を用い、製造法11に記載の方法に準じて実施することができる。 Production method 13
The compound represented by the formula (Iq) (hereinafter referred to as the present bipyridine compound (Iq)) is composed of the present bipyridine compound (Ik) and the compound represented by the formula (R-13) (hereinafter referred to as the compound (R-13)). In the presence of a base.
[Wherein, B 1 and B 2 each independently represent a nitrogen atom or CR 33 , and R 31 , R 32 , and R 33 each independently represent a hydrogen atom or one substituent selected from Group D And other symbols have the same meaning as described above. ]
This reaction can be carried out according to the method described in Production Method 11, using compound (R-13) instead of compound (R-12).
式(Iq)で示される化合物(以下、本ビピリジン化合物(Iq)と記す。)は、本ビピリジン化合物(Ik)と、式(R-13)で示される化合物(以下、化合物(R-13)と記す。)とを塩基の存在下で反応させることにより製造することができる。
該反応は、化合物(R-12)に代えて化合物(R-13)を用い、製造法11に記載の方法に準じて実施することができる。 Production method 13
The compound represented by the formula (Iq) (hereinafter referred to as the present bipyridine compound (Iq)) is composed of the present bipyridine compound (Ik) and the compound represented by the formula (R-13) (hereinafter referred to as the compound (R-13)). In the presence of a base.
This reaction can be carried out according to the method described in Production Method 11, using compound (R-13) instead of compound (R-12).
製造法14
式(Is)で示される化合物(以下、本ビピリジン化合物(Is)と記す。)、及び式(It)で示される化合物(以下、本ビピリジン化合物(It)と記す。)は、下記の方法に従って製造することができる。
[式中、記号は前記と同じ意味を表す。]
Manufacturing method 14
The compound represented by the formula (Is) (hereinafter referred to as the present bipyridine compound (Is)) and the compound represented by the formula (It) (hereinafter referred to as the present bipyridine compound (It)) are prepared according to the following method. Can be manufactured.
[Wherein the symbols have the same meaning as described above. ]
式(Is)で示される化合物(以下、本ビピリジン化合物(Is)と記す。)、及び式(It)で示される化合物(以下、本ビピリジン化合物(It)と記す。)は、下記の方法に従って製造することができる。
The compound represented by the formula (Is) (hereinafter referred to as the present bipyridine compound (Is)) and the compound represented by the formula (It) (hereinafter referred to as the present bipyridine compound (It)) are prepared according to the following method. Can be manufactured.
はじめに、式(Ir)で示される化合物(以下、本ビピリジン化合物(Ir)と記す。)と式(R-14)で示される化合物(以下、化合物(R-14)と記す。)とを反応させることにより本ビピリジン化合物(Is)を製造する方法について記載する。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばニトリル類が挙げられる。
該反応には、必要に応じて塩基を用いることもできる。該反応に用いられる塩基としては、有機塩基類が挙げられる。
該反応には、本ビピリジン化合物(Ir)1モルに対して、化合物(R-14)が通常1~5モルの割合、塩基が0.1~5モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Is)を単離することができる。 First, a compound represented by formula (Ir) (hereinafter referred to as the present bipyridine compound (Ir)) and a compound represented by formula (R-14) (hereinafter referred to as compound (R-14)) are reacted. A method for producing the present bipyridine compound (Is) is described.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include nitriles.
In the reaction, a base can be used as necessary. Examples of the base used in the reaction include organic bases.
In the reaction, with respect to 1 mole of the bipyridine compound (Ir), the compound (R-14) is usually used at a ratio of 1 to 5 moles and the base at a ratio of 0.1 to 5 moles.
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (Is) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばニトリル類が挙げられる。
該反応には、必要に応じて塩基を用いることもできる。該反応に用いられる塩基としては、有機塩基類が挙げられる。
該反応には、本ビピリジン化合物(Ir)1モルに対して、化合物(R-14)が通常1~5モルの割合、塩基が0.1~5モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Is)を単離することができる。 First, a compound represented by formula (Ir) (hereinafter referred to as the present bipyridine compound (Ir)) and a compound represented by formula (R-14) (hereinafter referred to as compound (R-14)) are reacted. A method for producing the present bipyridine compound (Is) is described.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include nitriles.
In the reaction, a base can be used as necessary. Examples of the base used in the reaction include organic bases.
In the reaction, with respect to 1 mole of the bipyridine compound (Ir), the compound (R-14) is usually used at a ratio of 1 to 5 moles and the base at a ratio of 0.1 to 5 moles.
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (Is) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
つづいて、本ビピリジン化合物(Is)と塩基とを反応させることにより本ビピリジン化合物(It)を製造する方法について記載する。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばアルコール類、水及びこれらの混合物が挙げられる。
該反応に用いられる塩基としては、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物類が挙げられる。
該反応には、本ビピリジン化合物(Is)1モルに対して、塩基が0.1~5モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(It)を単離することができる。 It continues and describes the method of manufacturing this bipyridine compound (It) by making this bipyridine compound (Is) and a base react.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include alcohols, water, and mixtures thereof.
Examples of the base used in the reaction include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide.
In the reaction, the base is used in a proportion of 0.1 to 5 mol with respect to 1 mol of the bipyridine compound (Is).
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (It) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばアルコール類、水及びこれらの混合物が挙げられる。
該反応に用いられる塩基としては、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物類が挙げられる。
該反応には、本ビピリジン化合物(Is)1モルに対して、塩基が0.1~5モルの割合で用いられる。
該反応温度は、通常0~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(It)を単離することができる。 It continues and describes the method of manufacturing this bipyridine compound (It) by making this bipyridine compound (Is) and a base react.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include alcohols, water, and mixtures thereof.
Examples of the base used in the reaction include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide.
In the reaction, the base is used in a proportion of 0.1 to 5 mol with respect to 1 mol of the bipyridine compound (Is).
The reaction temperature is usually in the range of 0 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the bipyridine compound (It) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
製造法15
本ビピリジン化合物(Ia)は、式(M-22)で示される化合物(以下、化合物(M-22)と記す。)と化合物(R-2)とを塩基及び還元剤の存在下で反応させることにより製造することができる。
[式中、記号は前記と同じ意味を表す。]
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応に用いられる塩基としては、例えばアルカリ金属炭酸塩類が挙げられる。
該反応に用いられる還元剤としては、例えばヒドロキシメタンスルフィン酸ナトリウムが挙げられる。
該反応には、化合物(M-22)1モルに対して、化合物(R-2)が通常1~10モルの割合、塩基が通常1~10モルの割合、還元剤が通常1~10モルの割合で用いられる。
該反応温度は、通常-20℃~150℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ia)を得ることができる。 Production method 15
This bipyridine compound (Ia) is obtained by reacting a compound represented by formula (M-22) (hereinafter referred to as compound (M-22)) with compound (R-2) in the presence of a base and a reducing agent. Can be manufactured.
[Wherein the symbols have the same meaning as described above. ]
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
Examples of the base used in the reaction include alkali metal carbonates.
Examples of the reducing agent used in the reaction include sodium hydroxymethanesulfinate.
In the reaction, with respect to 1 mol of compound (M-22), compound (R-2) is usually in a proportion of 1 to 10 mol, base is usually in a proportion of 1 to 10 mol, and reducing agent is usually in a proportion of 1 to 10 mol. It is used in the ratio.
The reaction temperature is usually in the range of −20 ° C. to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the bipyridine compound (Ia) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
本ビピリジン化合物(Ia)は、式(M-22)で示される化合物(以下、化合物(M-22)と記す。)と化合物(R-2)とを塩基及び還元剤の存在下で反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応に用いられる塩基としては、例えばアルカリ金属炭酸塩類が挙げられる。
該反応に用いられる還元剤としては、例えばヒドロキシメタンスルフィン酸ナトリウムが挙げられる。
該反応には、化合物(M-22)1モルに対して、化合物(R-2)が通常1~10モルの割合、塩基が通常1~10モルの割合、還元剤が通常1~10モルの割合で用いられる。
該反応温度は、通常-20℃~150℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本ビピリジン化合物(Ia)を得ることができる。 Production method 15
This bipyridine compound (Ia) is obtained by reacting a compound represented by formula (M-22) (hereinafter referred to as compound (M-22)) with compound (R-2) in the presence of a base and a reducing agent. Can be manufactured.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
Examples of the base used in the reaction include alkali metal carbonates.
Examples of the reducing agent used in the reaction include sodium hydroxymethanesulfinate.
In the reaction, with respect to 1 mol of compound (M-22), compound (R-2) is usually in a proportion of 1 to 10 mol, base is usually in a proportion of 1 to 10 mol, and reducing agent is usually in a proportion of 1 to 10 mol. It is used in the ratio.
The reaction temperature is usually in the range of −20 ° C. to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the bipyridine compound (Ia) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
以下、各中間体の製造法について記載する。
Hereafter, it describes about the manufacturing method of each intermediate body.
参考製造法1
化合物(M-1)は、式(M-8)で示される化合物(以下、化合物(M-8)と記す。)と式(M-9)で示される化合物(以下、化合物(M-9)と記す。)とを、金属触媒及び無機ハロゲン化物の存在下で反応させることにより製造することができる。
[式中、V3は塩素原子、臭素原子又はヨウ素原子を表し、MはSn(n-C4H9)3を表し、その他の記号は前記と同じ意味を表す。]
化合物(M-9)は、例えば国際公開第03/024961号に記載の方法、又はOrganic Process Research & Development, 2004, 8, 192-200に記載の方法に準じて製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばトルエン、キシレン等の芳香族炭化水素類が挙げられる。
該反応に用いられる金属触媒としては、テトラキス(トリフェニルホスフィン)パラジウム(0)、1,1’-ビス(ジフェニルホスフィノ)フェロセンパラジウム(II)ジクロリド等のパラジウム触媒が挙げられる。
該反応に用いられる無機ハロゲン化物としては、フッ化カリウム、フッ化ナトリウム等のアルカリ金属フッ化物、塩化リチウム、塩化ナトリウム等のアルカリ金属塩化物が挙げられる。
該反応には、化合物(M-8)1モルに対して、化合物(M-9)が通常1~10モルの割合、金属触媒が通常0.01~0.5モルの割合、無機ハロゲン化物が通常0.1~5モルの割合で用いられる。
該反応温度は、通常-20℃~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物(M-1)を得ることができる。 Reference manufacturing method 1
Compound (M-1) is a compound represented by formula (M-8) (hereinafter referred to as compound (M-8)) and a compound represented by formula (M-9) (hereinafter referred to as compound (M-9)). ) Can be produced by reacting in the presence of a metal catalyst and an inorganic halide.
[Wherein V 3 represents a chlorine atom, a bromine atom or an iodine atom, M represents Sn (n—C 4 H 9 ) 3 , and other symbols have the same meaning as described above. ]
Compound (M-9) can be produced, for example, according to the method described in WO 03/024961 or the method described in Organic Process Research & Development, 2004, 8, 192-200.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include aromatic hydrocarbons such as toluene and xylene.
Examples of the metal catalyst used in the reaction include palladium catalysts such as tetrakis (triphenylphosphine) palladium (0) and 1,1′-bis (diphenylphosphino) ferrocenepalladium (II) dichloride.
Examples of the inorganic halide used in the reaction include alkali metal fluorides such as potassium fluoride and sodium fluoride, and alkali metal chlorides such as lithium chloride and sodium chloride.
In the reaction, with respect to 1 mole of the compound (M-8), the compound (M-9) is usually in a proportion of 1 to 10 moles, the metal catalyst is usually in a proportion of 0.01 to 0.5 mole, an inorganic halide. Is usually used in a proportion of 0.1 to 5 mol.
The reaction temperature is usually in the range of −20 ° C. to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, compound (M-1) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
化合物(M-1)は、式(M-8)で示される化合物(以下、化合物(M-8)と記す。)と式(M-9)で示される化合物(以下、化合物(M-9)と記す。)とを、金属触媒及び無機ハロゲン化物の存在下で反応させることにより製造することができる。
化合物(M-9)は、例えば国際公開第03/024961号に記載の方法、又はOrganic Process Research & Development, 2004, 8, 192-200に記載の方法に準じて製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばトルエン、キシレン等の芳香族炭化水素類が挙げられる。
該反応に用いられる金属触媒としては、テトラキス(トリフェニルホスフィン)パラジウム(0)、1,1’-ビス(ジフェニルホスフィノ)フェロセンパラジウム(II)ジクロリド等のパラジウム触媒が挙げられる。
該反応に用いられる無機ハロゲン化物としては、フッ化カリウム、フッ化ナトリウム等のアルカリ金属フッ化物、塩化リチウム、塩化ナトリウム等のアルカリ金属塩化物が挙げられる。
該反応には、化合物(M-8)1モルに対して、化合物(M-9)が通常1~10モルの割合、金属触媒が通常0.01~0.5モルの割合、無機ハロゲン化物が通常0.1~5モルの割合で用いられる。
該反応温度は、通常-20℃~200℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物(M-1)を得ることができる。 Reference manufacturing method 1
Compound (M-1) is a compound represented by formula (M-8) (hereinafter referred to as compound (M-8)) and a compound represented by formula (M-9) (hereinafter referred to as compound (M-9)). ) Can be produced by reacting in the presence of a metal catalyst and an inorganic halide.
Compound (M-9) can be produced, for example, according to the method described in WO 03/024961 or the method described in Organic Process Research & Development, 2004, 8, 192-200.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include aromatic hydrocarbons such as toluene and xylene.
Examples of the metal catalyst used in the reaction include palladium catalysts such as tetrakis (triphenylphosphine) palladium (0) and 1,1′-bis (diphenylphosphino) ferrocenepalladium (II) dichloride.
Examples of the inorganic halide used in the reaction include alkali metal fluorides such as potassium fluoride and sodium fluoride, and alkali metal chlorides such as lithium chloride and sodium chloride.
In the reaction, with respect to 1 mole of the compound (M-8), the compound (M-9) is usually in a proportion of 1 to 10 moles, the metal catalyst is usually in a proportion of 0.01 to 0.5 mole, an inorganic halide. Is usually used in a proportion of 0.1 to 5 mol.
The reaction temperature is usually in the range of −20 ° C. to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, compound (M-1) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
参考製造法2
化合物(M-8)は、式(M-10)で示される化合物(以下化合物(M-10)と記す。)と化合物(R-3)とを、塩基の存在下で反応させることにより製造することができる。
[式中、記号は前記と同じ意味を表す。]
化合物(M-10)と化合物(R-3)とを反応させる方法は、製造法5に記載の方法に準ずる。 Reference production method 2
Compound (M-8) is produced by reacting a compound represented by formula (M-10) (hereinafter referred to as compound (M-10)) with compound (R-3) in the presence of a base. can do.
[Wherein the symbols have the same meaning as described above. ]
The method of reacting compound (M-10) and compound (R-3) is in accordance with the method described in Production Method 5.
化合物(M-8)は、式(M-10)で示される化合物(以下化合物(M-10)と記す。)と化合物(R-3)とを、塩基の存在下で反応させることにより製造することができる。
化合物(M-10)と化合物(R-3)とを反応させる方法は、製造法5に記載の方法に準ずる。 Reference production method 2
Compound (M-8) is produced by reacting a compound represented by formula (M-10) (hereinafter referred to as compound (M-10)) with compound (R-3) in the presence of a base. can do.
The method of reacting compound (M-10) and compound (R-3) is in accordance with the method described in Production Method 5.
参考製造法3
化合物(M-3)は、式(M-11)で示される化合物(以下化合物(M-11)と記す。)と酸とを反応させることにより製造することができる。
[式中、Rxはメチル基又はエチル基を表し、その他の記号は前記と同じ意味を表す。]
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばハロゲン化炭化水素類が挙げられる。
該反応に用いられる酸としては、三塩化ホウ素、三臭化ホウ素等のハロゲン化ホウ素類が挙げられる。
該反応には、化合物(M-11)1モルに対して、酸が通常0.1~10モルの割合で用いられる。
該反応温度は、通常-20℃~150℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物(M-3)を得ることができる。 Reference manufacturing method 3
Compound (M-3) can be produced by reacting a compound represented by formula (M-11) (hereinafter referred to as compound (M-11)) with an acid.
[Wherein R x represents a methyl group or an ethyl group, and other symbols represent the same meaning as described above. ]
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
Examples of the acid used in the reaction include boron halides such as boron trichloride and boron tribromide.
In the reaction, an acid is usually used at a ratio of 0.1 to 10 mol per 1 mol of the compound (M-11).
The reaction temperature is usually in the range of −20 ° C. to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, compound (M-3) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
化合物(M-3)は、式(M-11)で示される化合物(以下化合物(M-11)と記す。)と酸とを反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばハロゲン化炭化水素類が挙げられる。
該反応に用いられる酸としては、三塩化ホウ素、三臭化ホウ素等のハロゲン化ホウ素類が挙げられる。
該反応には、化合物(M-11)1モルに対して、酸が通常0.1~10モルの割合で用いられる。
該反応温度は、通常-20℃~150℃の範囲である。該反応時間は通常0.1~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物(M-3)を得ることができる。 Reference manufacturing method 3
Compound (M-3) can be produced by reacting a compound represented by formula (M-11) (hereinafter referred to as compound (M-11)) with an acid.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons.
Examples of the acid used in the reaction include boron halides such as boron trichloride and boron tribromide.
In the reaction, an acid is usually used at a ratio of 0.1 to 10 mol per 1 mol of the compound (M-11).
The reaction temperature is usually in the range of −20 ° C. to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, compound (M-3) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
参考製造法4
化合物(M-11)において、nが0である化合物(以下、化合物(M-11a)と記す。)、nが1である化合物(以下、化合物(M-11b)と記す。)、及びnが2である化合物(以下、化合物(M-11c)と記す。)は、下記の方法に従って製造することができる。
[式中、記号は前記と同じ意味を表す。]
化合物(M-13)は、化合物(M-8)に代えて式(M-12)で示される化合物(以下、化合物(M-12)と記す。)を用い、参考製造法1に記載の方法に準じて製造することができる。
化合物(M-12)は、Heterocycles,1990,30,875-884に記載の方法に準じて製造することにより得られる。また、市販されている化合物(M-12)を用いてもよい。
化合物(M-11a)は、化合物(M-1)に代えて化合物(M-13)を用い、製造法3に記載の方法に準じて製造することができる。
化合物(M-11b)及び化合物(M-11c)は、本ビピリジン化合物(Ia)に代えて化合物(M-11a)を用い、製造法1に記載の方法に準じて製造することができる。 Reference production method 4
In the compound (M-11), a compound in which n is 0 (hereinafter referred to as the compound (M-11a)), a compound in which n is 1 (hereinafter referred to as the compound (M-11b)), and n A compound in which is 2 (hereinafter referred to as compound (M-11c)) can be produced according to the following method.
[Wherein the symbols have the same meaning as described above. ]
Compound (M-13) described in Reference Production Method 1 is a compound represented by formula (M-12) (hereinafter referred to as compound (M-12)) instead of compound (M-8). It can be produced according to the method.
Compound (M-12) can be obtained by production according to the method described in Heterocycles, 1990, 30, 875-884. A commercially available compound (M-12) may also be used.
Compound (M-11a) can be produced according to the method described in Production Method 3, using Compound (M-13) instead of Compound (M-1).
Compound (M-11b) and Compound (M-11c) can be produced according to the method described in Production Method 1 using Compound (M-11a) instead of Bipyridine Compound (Ia).
化合物(M-11)において、nが0である化合物(以下、化合物(M-11a)と記す。)、nが1である化合物(以下、化合物(M-11b)と記す。)、及びnが2である化合物(以下、化合物(M-11c)と記す。)は、下記の方法に従って製造することができる。
化合物(M-13)は、化合物(M-8)に代えて式(M-12)で示される化合物(以下、化合物(M-12)と記す。)を用い、参考製造法1に記載の方法に準じて製造することができる。
化合物(M-12)は、Heterocycles,1990,30,875-884に記載の方法に準じて製造することにより得られる。また、市販されている化合物(M-12)を用いてもよい。
化合物(M-11a)は、化合物(M-1)に代えて化合物(M-13)を用い、製造法3に記載の方法に準じて製造することができる。
化合物(M-11b)及び化合物(M-11c)は、本ビピリジン化合物(Ia)に代えて化合物(M-11a)を用い、製造法1に記載の方法に準じて製造することができる。 Reference production method 4
In the compound (M-11), a compound in which n is 0 (hereinafter referred to as the compound (M-11a)), a compound in which n is 1 (hereinafter referred to as the compound (M-11b)), and n A compound in which is 2 (hereinafter referred to as compound (M-11c)) can be produced according to the following method.
Compound (M-13) described in Reference Production Method 1 is a compound represented by formula (M-12) (hereinafter referred to as compound (M-12)) instead of compound (M-8). It can be produced according to the method.
Compound (M-12) can be obtained by production according to the method described in Heterocycles, 1990, 30, 875-884. A commercially available compound (M-12) may also be used.
Compound (M-11a) can be produced according to the method described in Production Method 3, using Compound (M-13) instead of Compound (M-1).
Compound (M-11b) and Compound (M-11c) can be produced according to the method described in Production Method 1 using Compound (M-11a) instead of Bipyridine Compound (Ia).
参考製造法5
式(M-15)で示される化合物(以下、化合物(M-15)と記す。)は、下記に記載の方法に従って製造することができる。
[式中、記号は前記と同じ意味を表す。]
化合物(M-15)は、化合物(M-5)に代えて式(M-14)で示される化合物(以下、化合物(M-14)と記す。)を用い、製造法7に記載の方法に準じて製造することができる。 Reference production method 5
The compound represented by the formula (M-15) (hereinafter referred to as compound (M-15)) can be produced according to the method described below.
[Wherein the symbols have the same meaning as described above. ]
As the compound (M-15), a compound represented by the formula (M-14) (hereinafter referred to as compound (M-14)) is used in place of the compound (M-5), and the method according to production method 7 is used. It can be manufactured according to.
式(M-15)で示される化合物(以下、化合物(M-15)と記す。)は、下記に記載の方法に従って製造することができる。
化合物(M-15)は、化合物(M-5)に代えて式(M-14)で示される化合物(以下、化合物(M-14)と記す。)を用い、製造法7に記載の方法に準じて製造することができる。 Reference production method 5
The compound represented by the formula (M-15) (hereinafter referred to as compound (M-15)) can be produced according to the method described below.
As the compound (M-15), a compound represented by the formula (M-14) (hereinafter referred to as compound (M-14)) is used in place of the compound (M-5), and the method according to production method 7 is used. It can be manufactured according to.
参考製造法6
式(M-17)で示される化合物(以下、化合物(M-17)と記す。)は、式(M-16)で示される化合物(以下、化合物(M-16)と記す。)と化合物(R-12)とを反応させた後に、アンモニアと反応させることにより製造することができる。
[式中、記号は前記と同じ意味を表す。]
化合物(M-17)は、化合物(M-7)に代えて化合物(M-16)を用い、製造法9に記載の方法に準じて製造することができる。 Reference manufacturing method 6
A compound represented by formula (M-17) (hereinafter referred to as compound (M-17)) is a compound represented by formula (M-16) (hereinafter referred to as compound (M-16)) and a compound. It can be produced by reacting with (R-12) and then reacting with ammonia.
[Wherein the symbols have the same meaning as described above. ]
Compound (M-17) can be produced according to the method described in production method 9, using compound (M-16) in place of compound (M-7).
式(M-17)で示される化合物(以下、化合物(M-17)と記す。)は、式(M-16)で示される化合物(以下、化合物(M-16)と記す。)と化合物(R-12)とを反応させた後に、アンモニアと反応させることにより製造することができる。
化合物(M-17)は、化合物(M-7)に代えて化合物(M-16)を用い、製造法9に記載の方法に準じて製造することができる。 Reference manufacturing method 6
A compound represented by formula (M-17) (hereinafter referred to as compound (M-17)) is a compound represented by formula (M-16) (hereinafter referred to as compound (M-16)) and a compound. It can be produced by reacting with (R-12) and then reacting with ammonia.
Compound (M-17) can be produced according to the method described in production method 9, using compound (M-16) in place of compound (M-7).
参考製造法7
式(M-18)で示される化合物(以下、化合物(M-18)と記す。)は、化合物(M-14)と化合物(R-8)とを反応させることにより製造することができる。
[式中、記号は前記と同じ意味を表す。]
化合物(M-18)は、化合物(M-5)に代えて化合物(M-14)を用い、製造法10に記載の方法に準じて製造することができる。 Reference manufacturing method 7
A compound represented by the formula (M-18) (hereinafter referred to as compound (M-18)) can be produced by reacting compound (M-14) with compound (R-8).
[Wherein the symbols have the same meaning as described above. ]
Compound (M-18) can be produced according to the method described in production method 10, using compound (M-14) instead of compound (M-5).
式(M-18)で示される化合物(以下、化合物(M-18)と記す。)は、化合物(M-14)と化合物(R-8)とを反応させることにより製造することができる。
化合物(M-18)は、化合物(M-5)に代えて化合物(M-14)を用い、製造法10に記載の方法に準じて製造することができる。 Reference manufacturing method 7
A compound represented by the formula (M-18) (hereinafter referred to as compound (M-18)) can be produced by reacting compound (M-14) with compound (R-8).
Compound (M-18) can be produced according to the method described in production method 10, using compound (M-14) instead of compound (M-5).
参考製造法8
式(M-19)で示される化合物(以下、化合物(M-19)と記す。)は、式(M-20)で示される化合物(以下、化合物(M-20)と記す。)を、酸の存在下で反応させることにより製造することができる。
[式中、R38はハロゲン原子、又はOR1を表し、その他の記号は前記と同じ意味を表す。]
該反応は、通常溶媒中で行われる。
該反応に用いられる溶媒としては、例えばエーテル類、芳香族炭化水素類、ニトリル類、アルコール類、非プロトン性極性溶媒、水及びこれらの混合物が挙げられる。
該反応に用いられる酸としては、例えば塩酸、硫酸が挙げられる。
該反応には、化合物(M-17)1モルに対して、酸が通常0.1~5モルの割合で用いられる。
該反応温度は、通常0℃~100℃の範囲である。該反応時間は通常0.5~12時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M-19)を得ることができる。 Reference production method 8
A compound represented by formula (M-19) (hereinafter referred to as compound (M-19)) is a compound represented by formula (M-20) (hereinafter referred to as compound (M-20)). It can be produced by reacting in the presence of an acid.
[Wherein, R 38 represents a halogen atom or OR 1 , and other symbols have the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include ethers, aromatic hydrocarbons, nitriles, alcohols, aprotic polar solvents, water, and mixtures thereof.
Examples of the acid used in the reaction include hydrochloric acid and sulfuric acid.
In the reaction, an acid is usually used at a ratio of 0.1 to 5 mol with respect to 1 mol of the compound (M-17).
The reaction temperature is usually in the range of 0 ° C to 100 ° C. The reaction time is usually in the range of 0.5 to 12 hours.
After completion of the reaction, compound (M-19) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
式(M-19)で示される化合物(以下、化合物(M-19)と記す。)は、式(M-20)で示される化合物(以下、化合物(M-20)と記す。)を、酸の存在下で反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。
該反応に用いられる溶媒としては、例えばエーテル類、芳香族炭化水素類、ニトリル類、アルコール類、非プロトン性極性溶媒、水及びこれらの混合物が挙げられる。
該反応に用いられる酸としては、例えば塩酸、硫酸が挙げられる。
該反応には、化合物(M-17)1モルに対して、酸が通常0.1~5モルの割合で用いられる。
該反応温度は、通常0℃~100℃の範囲である。該反応時間は通常0.5~12時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M-19)を得ることができる。 Reference production method 8
A compound represented by formula (M-19) (hereinafter referred to as compound (M-19)) is a compound represented by formula (M-20) (hereinafter referred to as compound (M-20)). It can be produced by reacting in the presence of an acid.
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include ethers, aromatic hydrocarbons, nitriles, alcohols, aprotic polar solvents, water, and mixtures thereof.
Examples of the acid used in the reaction include hydrochloric acid and sulfuric acid.
In the reaction, an acid is usually used at a ratio of 0.1 to 5 mol with respect to 1 mol of the compound (M-17).
The reaction temperature is usually in the range of 0 ° C to 100 ° C. The reaction time is usually in the range of 0.5 to 12 hours.
After completion of the reaction, compound (M-19) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
参考製造法9
化合物(M-20)は、式(M-21)で示される化合物(以下、化合物(M-21)と記す。)と、式(R-16)で示される化合物(以下、化合物(R-16)と記す。)とを、塩基の存在下で反応させることにより製造することができる。
[式中、記号は前記と同じ意味を表す。]
該反応は、通常溶媒中で行われる。
該反応に用いられる溶媒としては、例えばエーテル類、ヘキサン及びこれらの混合物が挙げられる。
該反応に用いられる塩基としては、例えばn-ブチルリチウムが挙げられる。
該反応には、化合物(M-21)1モルに対して、化合物(R-16)が通常1~5モルの割合、塩基が通常1~5モルの割合で用いられる。
該反応温度は、通常-78℃~100℃の範囲である。該反応時間は通常0.5~12時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M-20)を得ることができる。
化合物(M-21)は、既知の方法により製造することができる。また、市販されている化合物(M-21)を用いてもよい。 Reference manufacturing method 9
Compound (M-20) includes a compound represented by formula (M-21) (hereinafter referred to as compound (M-21)) and a compound represented by formula (R-16) (hereinafter referred to as compound (R-)). 16).) Can be reacted in the presence of a base.
[Wherein the symbols have the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include ethers, hexane, and mixtures thereof.
An example of the base used in the reaction is n-butyllithium.
In the reaction, with respect to 1 mol of compound (M-21), compound (R-16) is usually used at a ratio of 1 to 5 mol, and base is usually used at a ratio of 1 to 5 mol.
The reaction temperature is usually in the range of −78 ° C. to 100 ° C. The reaction time is usually in the range of 0.5 to 12 hours.
After completion of the reaction, compound (M-20) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
Compound (M-21) can be produced by a known method. A commercially available compound (M-21) may also be used.
化合物(M-20)は、式(M-21)で示される化合物(以下、化合物(M-21)と記す。)と、式(R-16)で示される化合物(以下、化合物(R-16)と記す。)とを、塩基の存在下で反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。
該反応に用いられる溶媒としては、例えばエーテル類、ヘキサン及びこれらの混合物が挙げられる。
該反応に用いられる塩基としては、例えばn-ブチルリチウムが挙げられる。
該反応には、化合物(M-21)1モルに対して、化合物(R-16)が通常1~5モルの割合、塩基が通常1~5モルの割合で用いられる。
該反応温度は、通常-78℃~100℃の範囲である。該反応時間は通常0.5~12時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M-20)を得ることができる。
化合物(M-21)は、既知の方法により製造することができる。また、市販されている化合物(M-21)を用いてもよい。 Reference manufacturing method 9
Compound (M-20) includes a compound represented by formula (M-21) (hereinafter referred to as compound (M-21)) and a compound represented by formula (R-16) (hereinafter referred to as compound (R-)). 16).) Can be reacted in the presence of a base.
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include ethers, hexane, and mixtures thereof.
An example of the base used in the reaction is n-butyllithium.
In the reaction, with respect to 1 mol of compound (M-21), compound (R-16) is usually used at a ratio of 1 to 5 mol, and base is usually used at a ratio of 1 to 5 mol.
The reaction temperature is usually in the range of −78 ° C. to 100 ° C. The reaction time is usually in the range of 0.5 to 12 hours.
After completion of the reaction, compound (M-20) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
Compound (M-21) can be produced by a known method. A commercially available compound (M-21) may also be used.
参考製造法10
化合物(M-2)及び化合物(M-22)は、化合物(M-1)と硫化剤とを反応させることにより製造することができる。
[式中、記号は前記と同じ意味を表す。]
Reference production method 10
Compound (M-2) and compound (M-22) can be produced by reacting compound (M-1) with a sulfurizing agent.
[Wherein the symbols have the same meaning as described above. ]
化合物(M-2)及び化合物(M-22)は、化合物(M-1)と硫化剤とを反応させることにより製造することができる。
Compound (M-2) and compound (M-22) can be produced by reacting compound (M-1) with a sulfurizing agent.
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば非プロトン性極性溶媒が挙げられる。
該反応に用いられる硫化剤としては、例えば硫化ナトリウム、硫化水素ナトリウムが挙げられる。
該反応には、化合物(M-1)1モルに対して、硫化剤が通常1~10モルの割合で用いられる。
該反応温度は、通常-20℃~150℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M-2)及び化合物(M-22)を得ることができる。
該反応において、Vはフッ素原子又は塩素原子が好ましい。 The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
Examples of the sulfurizing agent used in the reaction include sodium sulfide and sodium hydrogen sulfide.
In the reaction, a sulfurizing agent is usually used at a ratio of 1 to 10 mol per 1 mol of the compound (M-1).
The reaction temperature is usually in the range of −20 ° C. to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, post-treatment operations such as addition of water to the reaction mixture, extraction with an organic solvent, drying and concentration of the organic layer, and the like are carried out to give compound (M-2) and compound (M-22). Obtainable.
In the reaction, V is preferably a fluorine atom or a chlorine atom.
該反応に用いられる硫化剤としては、例えば硫化ナトリウム、硫化水素ナトリウムが挙げられる。
該反応には、化合物(M-1)1モルに対して、硫化剤が通常1~10モルの割合で用いられる。
該反応温度は、通常-20℃~150℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M-2)及び化合物(M-22)を得ることができる。
該反応において、Vはフッ素原子又は塩素原子が好ましい。 The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include an aprotic polar solvent.
Examples of the sulfurizing agent used in the reaction include sodium sulfide and sodium hydrogen sulfide.
In the reaction, a sulfurizing agent is usually used at a ratio of 1 to 10 mol per 1 mol of the compound (M-1).
The reaction temperature is usually in the range of −20 ° C. to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, post-treatment operations such as addition of water to the reaction mixture, extraction with an organic solvent, drying and concentration of the organic layer, and the like are carried out to give compound (M-2) and compound (M-22). Obtainable.
In the reaction, V is preferably a fluorine atom or a chlorine atom.
参考製造法11
化合物(M-4)においてVが塩素原子又は臭素原子である化合物(以下、化合物(M-4a)と記す。)、及びVがフッ素原子又はヨウ素原子である化合物(以下、化合物(M-4b)と記す。)は、下記に記載の方法に従って製造することができる。
[式中、V4は塩素原子又は臭素原子を表し、V5はフッ素原子又はヨウ素原子を表し、その他の記号は前記と同じ意味を表す。]
はじめに、化合物(M-3)から化合物(M-4a)を製造する方法について記載する。
化合物(M-4a)は、化合物(M-3)とオキシ塩化リン又はオキシ臭化リンとを反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば芳香族炭化水素類が挙げられる。オキシ塩化リンを用いる場合、オキシ塩化リンを溶媒として用いる事もできる。
該反応には、化合物(M-3)1モルに対して、オキシ塩化リン又はオキシ臭化リンが通常1~10モルの割合で用いられる。
該反応温度は、通常0℃~150℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M-4a)を得ることができる。 Reference production method 11
In the compound (M-4), a compound in which V is a chlorine atom or a bromine atom (hereinafter referred to as compound (M-4a)), and a compound in which V is a fluorine atom or an iodine atom (hereinafter referred to as compound (M-4b) ) Can be produced according to the method described below.
[Wherein, V 4 represents a chlorine atom or a bromine atom, V 5 represents a fluorine atom or an iodine atom, and other symbols represent the same meaning as described above. ]
First, a method for producing compound (M-4a) from compound (M-3) is described.
Compound (M-4a) can be produced by reacting compound (M-3) with phosphorus oxychloride or phosphorus oxybromide.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include aromatic hydrocarbons. When using phosphorus oxychloride, phosphorus oxychloride can also be used as a solvent.
In the reaction, phosphorus oxychloride or phosphorus oxybromide is usually used at a ratio of 1 to 10 mol with respect to 1 mol of compound (M-3).
The reaction temperature is usually in the range of 0 ° C to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the compound (M-4a) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
化合物(M-4)においてVが塩素原子又は臭素原子である化合物(以下、化合物(M-4a)と記す。)、及びVがフッ素原子又はヨウ素原子である化合物(以下、化合物(M-4b)と記す。)は、下記に記載の方法に従って製造することができる。
はじめに、化合物(M-3)から化合物(M-4a)を製造する方法について記載する。
化合物(M-4a)は、化合物(M-3)とオキシ塩化リン又はオキシ臭化リンとを反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えば芳香族炭化水素類が挙げられる。オキシ塩化リンを用いる場合、オキシ塩化リンを溶媒として用いる事もできる。
該反応には、化合物(M-3)1モルに対して、オキシ塩化リン又はオキシ臭化リンが通常1~10モルの割合で用いられる。
該反応温度は、通常0℃~150℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M-4a)を得ることができる。 Reference production method 11
In the compound (M-4), a compound in which V is a chlorine atom or a bromine atom (hereinafter referred to as compound (M-4a)), and a compound in which V is a fluorine atom or an iodine atom (hereinafter referred to as compound (M-4b) ) Can be produced according to the method described below.
First, a method for producing compound (M-4a) from compound (M-3) is described.
Compound (M-4a) can be produced by reacting compound (M-3) with phosphorus oxychloride or phosphorus oxybromide.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include aromatic hydrocarbons. When using phosphorus oxychloride, phosphorus oxychloride can also be used as a solvent.
In the reaction, phosphorus oxychloride or phosphorus oxybromide is usually used at a ratio of 1 to 10 mol with respect to 1 mol of compound (M-3).
The reaction temperature is usually in the range of 0 ° C to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the compound (M-4a) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
つづいて、化合物(M-4a)から化合物(M-4b)を製造する方法について記載する。
化合物(M-4b)は、化合物(M-4a)と無機フッ化物、又は無機ヨウ化物とを反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばニトリル類、非プロトン性極性溶媒及びこれらの混合物が挙げられる。
該反応に用いられる無機フッ化物としては、例えばフッ化カリウムが挙げられる。
該反応に用いられる無機ヨウ化物としては、例えばヨウ化ナトリウムが挙げられる。
該反応には、化合物(M-4a)1モルに対して、無機フッ化物又は無機ヨウ化物が通常1~10モルの割合で用いられる。
該反応温度は、通常0℃~250℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M-4b)を得ることができる。 Next, a method for producing compound (M-4b) from compound (M-4a) will be described.
Compound (M-4b) can be produced by reacting compound (M-4a) with an inorganic fluoride or inorganic iodide.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include nitriles, aprotic polar solvents, and mixtures thereof.
Examples of the inorganic fluoride used in the reaction include potassium fluoride.
Examples of the inorganic iodide used in the reaction include sodium iodide.
In the reaction, an inorganic fluoride or an inorganic iodide is usually used at a ratio of 1 to 10 mol with respect to 1 mol of the compound (M-4a).
The reaction temperature is usually in the range of 0 ° C to 250 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, compound (M-4b) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
化合物(M-4b)は、化合物(M-4a)と無機フッ化物、又は無機ヨウ化物とを反応させることにより製造することができる。
該反応は、通常溶媒中で行われる。該反応に用いられる溶媒としては、例えばニトリル類、非プロトン性極性溶媒及びこれらの混合物が挙げられる。
該反応に用いられる無機フッ化物としては、例えばフッ化カリウムが挙げられる。
該反応に用いられる無機ヨウ化物としては、例えばヨウ化ナトリウムが挙げられる。
該反応には、化合物(M-4a)1モルに対して、無機フッ化物又は無機ヨウ化物が通常1~10モルの割合で用いられる。
該反応温度は、通常0℃~250℃の範囲である。該反応時間は通常0.5~24時間の範囲である。
該反応終了後は、反応混合物に水を加え、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M-4b)を得ることができる。 Next, a method for producing compound (M-4b) from compound (M-4a) will be described.
Compound (M-4b) can be produced by reacting compound (M-4a) with an inorganic fluoride or inorganic iodide.
The reaction is usually performed in a solvent. Examples of the solvent used in the reaction include nitriles, aprotic polar solvents, and mixtures thereof.
Examples of the inorganic fluoride used in the reaction include potassium fluoride.
Examples of the inorganic iodide used in the reaction include sodium iodide.
In the reaction, an inorganic fluoride or an inorganic iodide is usually used at a ratio of 1 to 10 mol with respect to 1 mol of the compound (M-4a).
The reaction temperature is usually in the range of 0 ° C to 250 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, compound (M-4b) can be obtained by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
次に、本ビピリジン化合物の具体例を以下に示す。
Next, specific examples of the bipyridine compound are shown below.
式(200)
[式中、R201はR1を表し、R202はR2を表し、R203、R204、及びR205は、各々独立して水素原子、又はR3を表し、R206、R207、及びR208は、各々独立して水素原子、又はR6を表し、nは0、1、又は2を表す。]
で示される化合物。 Formula (200)
[Wherein R 201 represents R 1 , R 202 represents R 2 , R 203 , R 204 , and R 205 each independently represent a hydrogen atom or R 3 , R 206 , R 207 , And R 208 each independently represents a hydrogen atom or R 6 , and n represents 0, 1, or 2. ]
A compound represented by
で示される化合物。 Formula (200)
A compound represented by
式(200)で示される化合物において、nが2であり、R203、R204、R205、R206、R207及びR208が水素原子であり、R201及びR202が表1~表11に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX1と記す)。
In the compound represented by the formula (200), n is 2, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are Tables 1 to 11 Or a bipyridine compound (hereinafter referred to as compound group SX1).
式(200)で示される化合物において、nが1であり、R203、R204、R205、R206、R207及びR208が水素原子であり、R201及びR202が表1~表11に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX2と記す)。
式(200)で示される化合物において、nが0であり、R203、R204、R205、R206、R207及びR208が水素原子であり、R201及びR202が表1~表11に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX3と記す)。 In the compound represented by the formula (200), n is 1, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are Tables 1 to 11 The bipyridine compound (hereinafter referred to as compound group SX2), which is any combination described in 1.
In the compound represented by the formula (200), n is 0, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are Tables 1 to 11 Or a bipyridine compound (hereinafter referred to as compound group SX3).
式(200)で示される化合物において、nが0であり、R203、R204、R205、R206、R207及びR208が水素原子であり、R201及びR202が表1~表11に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX3と記す)。 In the compound represented by the formula (200), n is 1, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are Tables 1 to 11 The bipyridine compound (hereinafter referred to as compound group SX2), which is any combination described in 1.
In the compound represented by the formula (200), n is 0, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are Tables 1 to 11 Or a bipyridine compound (hereinafter referred to as compound group SX3).
式(200)で示される化合物において、nが2であり、R201が2,2,3,3-テトラフルオロプロピル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX4と記す)。
In the compound represented by the formula (200), n is 2, R 201 is a 2,2,3,3-tetrafluoropropyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX4).
式(200)で示される化合物において、nが2であり、R201が2,2,3,3、3-ペンタフルオロプロピル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX5と記す)。
In the compound represented by the formula (200), n is 2, R 201 is a 2,2,3,3,3-pentafluoropropyl group, R 202 is an ethyl group, R 203 , R 204 , The present bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX5).
式(200)で示される化合物において、nが2であり、R201が1,1,2,3,3,3-ヘキサフルオロプロピル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX6と記す)。
In the compound represented by the formula (200), n is 2, R 201 is a 1,1,2,3,3,3-hexafluoropropyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX6) in which any combination shown in Table 12 to Table 19 is combined.
式(200)で示される化合物において、nが2であり、R201が2,2,3,4,4,4-ヘキサフルオロブチル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX7と記す)。
In the compound represented by the formula (200), n is 2, R 201 is a 2,2,3,4,4,4-hexafluorobutyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX7) in any combination of Tables 12-19.
式(200)で示される化合物において、nが2であり、R201が1,1,2-トリフルオロ-2-(トリフルオロメトキシ)エチル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX8と記す)。
In the compound represented by the formula (200), n is 2, R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any of the combinations described in Tables 12 to 19 (hereinafter referred to as compound group SX8).
式(200)で示される化合物において、nが2であり、R201が2,2,3,3-テトラフルオロプロピル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX9と記す)。
In the compound represented by the formula (200), n is 2, R 201 is a 2,2,3,3-tetrafluoropropyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX9).
式(200)で示される化合物において、nが2であり、R201が2,2,3,3、3-ペンタフルオロプロピル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX10と記す)。
In the compound represented by the formula (200), n is 2, R 201 is a 2,2,3,3,3-pentafluoropropyl group, R 202 is a methyl group, R 203 , R 204 , This bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX10).
式(200)で示される化合物において、nが2であり、R201が1,1,2,3,3,3-ヘキサフルオロプロピル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX11と記す)。
In the compound represented by the formula (200), n is 2, R 201 is a 1,1,2,3,3,3-hexafluoropropyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX11) wherein any combination of Table 12 to Table 19 is combined.
式(200)で示される化合物において、nが2であり、R201が2,2,3,4,4,4-ヘキサフルオロブチル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX12と記す)。
In the compound represented by the formula (200), n is 2, R 201 is a 2,2,3,4,4,4-hexafluorobutyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX12) in any combination of Tables 12-19.
式(200)で示される化合物において、nが2であり、R201が1,1,2-トリフルオロ-2-(トリフルオロメトキシ)エチル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX13と記す)。
In the compound represented by the formula (200), n is 2, R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any of the combinations described in Tables 12 to 19 (hereinafter referred to as compound group SX13).
式(201)
[式中、記号は前記の意味を示す。]
で示される化合物 Formula (201)
[Wherein the symbols have the above-mentioned meanings. ]
Compound represented by
で示される化合物 Formula (201)
Compound represented by
式(201)で示される化合物において、R203、R204、R205、R206、R207及びR208が水素原子であり、R201及びR202が表1~表11に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX14と記す)。
In the compound represented by the formula (201), R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are any one of those shown in Tables 1 to 11. This bipyridine compound as a combination (hereinafter referred to as compound group SX14).
式(201)で示される化合物において、nが2であり、R201が2,2,3,3-テトラフルオロプロピル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX15と記す)。
In the compound represented by the formula (201), n is 2, R 201 is a 2,2,3,3-tetrafluoropropyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are a combination of any of Tables 12 to 19 (hereinafter referred to as compound group SX15).
式(201)で示される化合物において、nが2であり、R201が2,2,3,3、3-ペンタフルオロプロピル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX16と記す)。
In the compound represented by the formula (201), n is 2, R 201 is a 2,2,3,3,3-pentafluoropropyl group, R 202 is an ethyl group, R 203 , R 204 , This bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX16).
式(201)で示される化合物において、nが2であり、R201が1,1,2,3,3,3-ヘキサフルオロプロピル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX17と記す)。
In the compound represented by the formula (201), n is 2, R 201 is a 1,1,2,3,3,3-hexafluoropropyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX17) in any combination of Tables 12-19.
式(201)で示される化合物において、nが2であり、R201が2,2,3,4,4,4-ヘキサフルオロブチル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX18と記す)。
In the compound represented by the formula (201), n is 2, R 201 is a 2,2,3,4,4,4-hexafluorobutyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds of any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX18).
式(201)で示される化合物において、nが2であり、R201が1,1,2-トリフルオロ-2-(トリフルオロメトキシ)エチル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX19と記す)。
In the compound represented by the formula (201), n is 2, R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any of the combinations described in Tables 12 to 19 (hereinafter referred to as compound group SX19).
式(201)で示される化合物において、nが2であり、R201が2,2,3,3-テトラフルオロプロピル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX20と記す)。
In the compound represented by the formula (201), n is 2, R 201 is a 2,2,3,3-tetrafluoropropyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX20).
式(201)で示される化合物において、nが2であり、R201が2,2,3,3、3-ペンタフルオロプロピル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX21と記す)。
In the compound represented by the formula (201), n is 2, R 201 is a 2,2,3,3,3-pentafluoropropyl group, R 202 is a methyl group, R 203 , R 204 , The present bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX21).
式(201)で示される化合物において、nが2であり、R201が1,1,2,3,3,3-ヘキサフルオロプロピル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX22と記す)。
In the compound represented by the formula (201), n is 2, R 201 is a 1,1,2,3,3,3-hexafluoropropyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX22) in which any combination shown in Tables 12 to 19 is combined.
式(201)で示される化合物において、nが2であり、R201が2,2,3,4,4,4-ヘキサフルオロブチル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX23と記す)。
In the compound represented by the formula (201), n is 2, R 201 is a 2,2,3,4,4,4-hexafluorobutyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX23) in any combination of Tables 12-19.
式(201)で示される化合物において、nが2であり、R201が1,1,2-トリフルオロ-2-(トリフルオロメトキシ)エチル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX24と記す)。
In the compound represented by the formula (201), n is 2, R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX24).
式(202)
[式中、記号は前記の意味を示す。]
で示される化合物 Formula (202)
[Wherein the symbols have the above-mentioned meanings. ]
Compound represented by
で示される化合物 Formula (202)
Compound represented by
式(202)で示される化合物において、R203、R204、R205、R206、R207及びR208が水素原子であり、R201及びR202が表1~表11に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX25と記す)。
In the compound represented by the formula (202), R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are any one of those shown in Tables 1 to 11. This bipyridine compound as a combination (hereinafter referred to as compound group SX25).
式(202)で示される化合物において、nが2であり、R201が2,2,3,3-テトラフルオロプロピル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX26と記す)。
In the compound represented by the formula (202), n is 2, R 201 is a 2,2,3,3-tetrafluoropropyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX26).
式(202)で示される化合物において、nが2であり、R201が2,2,3,3、3-ペンタフルオロプロピル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX27と記す)。
In the compound represented by the formula (202), n is 2, R 201 is a 2,2,3,3,3-pentafluoropropyl group, R 202 is an ethyl group, R 203 , R 204 , The present bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX27).
式(202)で示される化合物において、nが2であり、R201が1,1,2,3,3,3-ヘキサフルオロプロピル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX28と記す)。
In the compound represented by the formula (202), n is 2, R 201 is a 1,1,2,3,3,3-hexafluoropropyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX28) in which any combination shown in Tables 12 to 19 is combined.
式(202)で示される化合物において、nが2であり、R201が2,2,3,4,4,4-ヘキサフルオロブチル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX29と記す)。
In the compound represented by the formula (202), n is 2, R 201 is a 2,2,3,4,4,4-hexafluorobutyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX29) in any combination of Tables 12 to 19;
式(202)で示される化合物において、nが2であり、R201が1,1,2-トリフルオロ-2-(トリフルオロメトキシ)エチル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX30と記す)。
In the compound represented by the formula (202), n is 2, R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are present bipyridine compounds (hereinafter referred to as compound group SX30) in any combination of Tables 12 to 19.
式(202)で示される化合物において、nが2であり、R201が2,2,3,3-テトラフルオロプロピル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX31と記す)。
In the compound represented by the formula (202), n is 2, R 201 is a 2,2,3,3-tetrafluoropropyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX31).
式(202)で示される化合物において、nが2であり、R201が2,2,3,3、3-ペンタフルオロプロピル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX32と記す)。
In the compound represented by the formula (202), n is 2, R 201 is a 2,2,3,3,3-pentafluoropropyl group, R 202 is a methyl group, R 203 , R 204 , This bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX32).
式(202)で示される化合物において、nが2であり、R201が1,1,2,3,3,3-ヘキサフルオロプロピル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX33と記す)。
In the compound represented by the formula (202), n is 2, R 201 is a 1,1,2,3,3,3-hexafluoropropyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX33) in any combination of Tables 12-19.
式(202)で示される化合物において、nが2であり、R201が2,2,3,4,4,4-ヘキサフルオロブチル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX34と記す)。
In the compound represented by the formula (202), n is 2, R 201 is a 2,2,3,4,4,4-hexafluorobutyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX34) wherein any combination shown in Tables 12 to 19 is combined.
式(202)で示される化合物において、nが2であり、R201が1,1,2-トリフルオロ-2-(トリフルオロメトキシ)エチル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX35と記す)。
In the compound represented by the formula (202), n is 2, R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any of the combinations described in Tables 12 to 19 (hereinafter referred to as compound group SX35).
式(203)
[式中、記号は前記の意味を示す。]
で示される化合物 Formula (203)
[Wherein the symbols have the above-mentioned meanings. ]
Compound represented by
で示される化合物 Formula (203)
Compound represented by
式(203)で示される化合物において、R203、R204、R205、R206、R207及びR208が水素原子であり、R201及びR202が表1~表11に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX36と記す)。
In the compound represented by the formula (203), R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are hydrogen atoms, and R 201 and R 202 are any one of those shown in Tables 1 to 11. This bipyridine compound as a combination (hereinafter referred to as compound group SX36).
式(203)で示される化合物において、nが2であり、R201が2,2,3,3-テトラフルオロプロピル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX37と記す)。
In the compound represented by the formula (203), n is 2, R 201 is a 2,2,3,3-tetrafluoropropyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX37).
式(203)で示される化合物において、nが2であり、R201が2,2,3,3、3-ペンタフルオロプロピル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX38と記す)。
In the compound represented by the formula (203), n is 2, R 201 is a 2,2,3,3,3-pentafluoropropyl group, R 202 is an ethyl group, R 203 , R 204 , The present bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX38).
式(203)で示される化合物において、nが2であり、R201が1,1,2,3,3,3-ヘキサフルオロプロピル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX39と記す)。
In the compound represented by the formula (203), n is 2, R 201 is a 1,1,2,3,3,3-hexafluoropropyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are the present bipyridine compounds (hereinafter referred to as compound group SX39) in any combination of Tables 12-19.
式(203)で示される化合物において、nが2であり、R201が2,2,3,4,4,4-ヘキサフルオロブチル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX40と記す)。
In the compound represented by the formula (203), n is 2, R 201 is a 2,2,3,4,4,4-hexafluorobutyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX40) in which any combination shown in Tables 12 to 19 is combined.
式(203)で示される化合物において、nが2であり、R201が1,1,2-トリフルオロ-2-(トリフルオロメトキシ)エチル基であり、R202がエチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX41と記す)。
In the compound represented by the formula (203), n is 2, R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group, R 202 is an ethyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any of the combinations shown in Tables 12 to 19 (hereinafter referred to as compound group SX41).
式(203)で示される化合物において、nが2であり、R201が2,2,3,3-テトラフルオロプロピル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX42と記す)。
In the compound represented by the formula (203), n is 2, R 201 is a 2,2,3,3-tetrafluoropropyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of Tables 12 to 19 and the present bipyridine compound (hereinafter referred to as compound group SX42).
式(203)で示される化合物において、nが2であり、R201が2,2,3,3、3-ペンタフルオロプロピル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX43と記す)。
In the compound represented by the formula (203), n is 2, R 201 is a 2,2,3,3,3-pentafluoropropyl group, R 202 is a methyl group, R 203 , R 204 , This bipyridine compound wherein R 205 , R 206 , R 207 and R 208 are any combination shown in Tables 12 to 19 (hereinafter referred to as compound group SX43).
式(203)で示される化合物において、nが2であり、R201が1,1,2,3,3,3-ヘキサフルオロプロピル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX44と記す)。
In the compound represented by formula (203), n is 2, R 201 is a 1,1,2,3,3,3-hexafluoropropyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any of the combinations described in Table 12 to Table 19 and the present bipyridine compound (hereinafter referred to as compound group SX44).
式(203)で示される化合物において、nが2であり、R201が2,2,3,4,4,4-ヘキサフルオロブチル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX45と記す)。
In the compound represented by the formula (203), n is 2, R 201 is a 2,2,3,4,4,4-hexafluorobutyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are bipyridine compounds (hereinafter referred to as compound group SX45) in which any combination shown in Table 12 to Table 19 is combined.
式(203)で示される化合物において、nが2であり、R201が1,1,2-トリフルオロ-2-(トリフルオロメトキシ)エチル基であり、R202がメチル基であり、R203、R204、R205、R206、R207及びR208が表12~表19に記載のいずれかの組み合わせである本ビピリジン化合物(以下、化合物群SX46と記す)。
In the compound represented by the formula (203), n is 2, R 201 is a 1,1,2-trifluoro-2- (trifluoromethoxy) ethyl group, R 202 is a methyl group, R 203 , R 204 , R 205 , R 206 , R 207 and R 208 are any combination of those shown in Tables 12 to 19 (hereinafter referred to as compound group SX46).
群(a)は、下記亜群a-1、a-2、a-3、a-4、a-5、a-6及びa-7からなる群である。
亜群a-1は、アセタミプリド(acetamiprid)、クロチアニジン(clothianidin)、ジノテフラン(dinotefuran)、イミダクロプリド(imidacloprid)、ニテンピラム(nitenpyram)、チアクロプリド(thiacloprid)、チアメトキサム(thiamethoxam)、フルピラジフロン(flupyradifurone)、スルホキサフロル(sulfoxaflor)、トリフルメゾピリム(triflumezopyrim)、ジクロロメソチアズ(dicloromezotiaz)及び下記式で示される化合物(CAS登録番号1689566-03-7、以下、殺虫化合物αと記すことがある)
からなる、ニコチン性アセチルコリン受容体競合的モジュレーターの群である。
亜群a-2は、アクリナトリン(acrinathrin)、アレスリン(allethrin)、ビフェントリン(bifenthrin)、カッパビフェントリン(kappa-bifenthrin)、ビオアレスリン(bioallethrin)、ビオレスメトリン(bioresmethrin)、シクロプロトリン(cycloprothrin)、シフルトリン(cyfluthrin)、ベータ-シフルトリン(beta-cyfluthrin)、シハロトリン(cyhalothrin)、ガンマシハロトリン(gamma-cyhalothrin)、ラムダシハロトリン(lambda-cyhalothrin)、シペルメトリン(cypermethrin)、アルファシペルメトリン(alpha-cypermethrin)、べータシペルメトリン(beta-cypermethrin)、シータシペルメトリン(theta-cypermethrin)、ゼータシペルメトリン(zeta-cypermethrin)、シグマシペルメトリン(sigma-cypermethrin)、シフェノトリン(cyphenothrin)、デルタメトリン(deltamethrin)、エンペントリン(empenthrin)、エスフェンバレレート(esfenvalerate)、エトフェンプロックス(etofenprox) 、フェンプロパトリン(fenpropathrin)、フェンバレレート(fenvalerate)、フルシトリネート(flucythrinate)、フルメトリン(flumethrin)、フルバリネート(fluvalinate)、タウフルバリネート(tau-fluvalinate)、ハルフェンプロックス(halfenprox)、ヘプタフルトリン(heptafluthrin)、イミプロトリン(imiprothrin)、カデスリン(kadethrin)、メペルフルトリン(meperfluthrin)、モンフルオロトリン(momfluorothrin)、ペルメトリン(permethrin)、フェノトリン(phenothrin)、プラレトリン(prallethrin)、ピレトリン(pyrethrins)、レスメトリン(resmethrin)、シラフルオフェン(silafluofen)、テフルトリン(tefluthrin)、カッパテフルトリン(kappa- tefluthrin)、テトラメトリン(tetramethrin)、テトラメチルフルトリン(tetramethylfluthrin)、トラロメトリン(tralomethrin)、トランスフルトリン(transfluthrin)、ベンフルトリン(benfluthrin)、フルフェンプロックス(flufenoprox)、フルメスリン(flumethrin)、フラメトリン(furamethrin)、メトフルトリン(metofluthrin)、プロフルトリン(profluthrin)、ジメフルトリン(dimefluthrin)からなる、ナトリウムチャネルモジュレーターの群である。
亜群a-3は、エチプロール(ethiprole)、フィプロニル(fipronil)及びフルフィプロール(flufiprole)からなるGABA作動性塩素イオンチャネルブロッカーの群、並びに、アフォクソラネル(afoxolaner)、フルララネル(fluralaner)、ブロフラニリド(broflanilide)及びフルキサメタミド(fluxametamide)からなるGABA作動性塩素イオンチャネルアロステリックモジュレーターの群からなる群である。
亜群a-4は、クロラントラニリプロール(chlorantraniliprole)、シアントラニルプロール(cyantraniliprole)、シクラニリプロール(cycloniliprole)、フルベンジアミド(flubendiamide)、テトラニリプロール(tetraniliprole)及びシハロジアミド(cyhalodiamide)からなる、リアノジン受容体モジュレーターの群である。
亜群a-5は、アラニカルブ(alanycarb)、アルジカルブ(aldicarb)、ベンダイオカルブ(bendiocarb)、ベンフラカルブ(benfuracarb)、ブトカルボキシム(butocarboxim)、ブトキシカルボキシム(butoxycarboxim)、カルバリル(carbaryl:NAC)、カルボフラン(carbofuran)、カルボスルファン(carbosulfan)、エチオフェンカルブ(ethiofencarb)、フェノブカルブ(fenobucarb:BPMC)、ホルメタネート(formetanate)、フラチオカルブ(furathiocarb)、イソプロカルブ(isoprocarb:MIPC)、メチオカルブ(methiocarb)、メソミル(methomyl)、メトルカルブ(metolcarb:MTMC)、オキサミル(oxamyl)、ピリミカーブ(pirimicarb)、プロポキスル(propoxur:PHC)、チオジカルブ(thiodicarb)、チオファノックス(thiofanox)、トリアザメート(triazamate)、トリメタカルブ(trimethacarb)、XMC及びキシリルカルブ(xylylcarb:MPMC)からなる、カーバメート系のアセチルコリンエステラーゼ(AChE)阻害剤の群である。
亜群a-6は、アバメクチン(abamectin)、フルエンスルホン(fluensulfone)、チオキサザフェン(tioxazafen)、及びフルアザインドリジン(fluazaindolizine)からなる、殺線虫活性化合物の群である。
亜群a-7は、菌根菌(Mycorrhiza Fungi)、アルスロボトリス・ダクチロイデス(Arthrobotrys dactyloides)、バチルス・チューリンゲンシス(Bacillus thuringiensis)、バチルス・フィルムス(Bacillus firmus)、バチルス・メガテリウム(Bacillus megaterium)、バチルス・アミロリケファシエンス(Bacillus amyloliquefaciens)、ヒルステラ・ロッシリエンシス(Hirsutella rhossiliensis)、ヒルステラ・ミネソテンシス(Hirsutella minnesotensis)、モナクロスポリウム・フィマトパガム(Monacrosporium phymatopagus)、パスツーリア・ニシザワエ(Pasteuria nishizawae)、パスツーリア・ペネトランス(Pasteuria penetrans)、パスツーリア・ウスガエ(Pasteuria usgae)、バーティシリウム・クラミドスポリウム(Verticillium chlamydosporium)及びハーピンタンパク(Harpin protein)からなる、微生物資材の群である。 Group (a) is a group consisting of the following subgroups a-1, a-2, a-3, a-4, a-5, a-6 and a-7.
Subgroups a-1 include acetamiprid, clothianidin, dinotefuran, imidacloprid, nitenpyram, thiacloprid, thiamethoxam, fluradixurone, flupyradifurone ), Triflumezopyrim (triflumezopyrim), dichloromesothiaz (dicloromezotiaz) and a compound represented by the following formula (CAS registration number 1689566-03-7, hereinafter may be referred to as insecticidal compound α)
A group of competitive modulators of nicotinic acetylcholine receptors.
Subgroup a-2 includes acrinathrin, allethrin, bifenthrin, kappa-bifenthrin, bioallethrin, bioresmethrin, cycloprothrin, cyfluthrin cyfluthrin, beta-cyfluthrin, cyhalothrin, gamma-cyhalothrin, lambda-cyhalothrin, cypermethrin, alpha-cypermethrin ), Beta-cypermethrin, theta-cypermethrin, zeta-cypermethrin, sigma-cypermethrin, cyphenothrin, deltamethrin, Empentrin (empe nthrin), esfenvalerate, etofenprox, fenpropathrin, fenvalerate, flucythrinate, flumethrin, fluvalinate, taufulvali Tau-fluvalinate, halfenprox, heptafluthrin (heptafluthrin), imiprothrin, kadethrin, meperfluthrin, monfluorothrin, permethrin, phenothrin phenothrin), praretrin (prallethrin), pyrethrin (pyrethrins), resmethrin (resmethrin), silafluofen (silafluofen), tefluthrin, kappa-tefluthrin, tetramethrin ), Tetramethylfluthrin, tralomethrin, transfluthrin, benfluthrin, flufenprox, flumethrin, furamethrin, metofluthrin, profluthrin, profluthrin (Profluthrin), a group of sodium channel modulators consisting of dimefluthrin.
Subgroup a-3 is a group of GABAergic chloride channel blockers consisting of ethiprole, fipronil and flufiprole, as well as afoxolaner, fluralaner, broflanilide. And a group of GABAergic chloride channel allosteric modulators consisting of flaxametamide.
Subgroup a-4 consists of chlorantraniliprole, cyantraniliprole, cycloniliprole, flubendiamide, tetraniliprole and cyhalodiamide. , A group of ryanodine receptor modulators.
Subgroup a-5 is composed of alanycarb, aldicarb, bendiocarb, benfuracarb, butocarboxim, butoxycarboxim, carbaryl (NAC), Carbofuran, carbosulfan, ethiofencarb, fenobucarb (BPMC), formethanate, furathiocarb, isoprocarb (MIPC), methiocarb, methomyl , Metolcarb (MTMC), oxamyl (oxamyl), pirimicarb, propoxur (PHC), thiodicarb, thiofanox, triazamate, trimethacarb, XMC Fine xylylcarb: consisting (xylylcarb MPMC), a group of carbamates acetylcholinesterase (AChE) inhibitors.
Subgroup a-6 is a group of nematicidal active compounds consisting of abamectin, fluensulfone, tioxazafen, and fluazaindolizine.
Subgroup a-7 includes Mycorrhiza Fungi, Arthrobotrys dactyloides, Bacillus thuringiensis, Bacillus firmus, Bacillus megaterium. , Bacillus amyloliquefaciens, Hirsutella rhossiliensis, Hirsutella minnesotensis, Monacrosporium phymatopagus, urisawai, Pasturia Microbial material consisting of Pasteuria penetrans, Pasturia usgae, Verticillium chlamydosporium and Harpin protein A group.
亜群a-1は、アセタミプリド(acetamiprid)、クロチアニジン(clothianidin)、ジノテフラン(dinotefuran)、イミダクロプリド(imidacloprid)、ニテンピラム(nitenpyram)、チアクロプリド(thiacloprid)、チアメトキサム(thiamethoxam)、フルピラジフロン(flupyradifurone)、スルホキサフロル(sulfoxaflor)、トリフルメゾピリム(triflumezopyrim)、ジクロロメソチアズ(dicloromezotiaz)及び下記式で示される化合物(CAS登録番号1689566-03-7、以下、殺虫化合物αと記すことがある)
亜群a-2は、アクリナトリン(acrinathrin)、アレスリン(allethrin)、ビフェントリン(bifenthrin)、カッパビフェントリン(kappa-bifenthrin)、ビオアレスリン(bioallethrin)、ビオレスメトリン(bioresmethrin)、シクロプロトリン(cycloprothrin)、シフルトリン(cyfluthrin)、ベータ-シフルトリン(beta-cyfluthrin)、シハロトリン(cyhalothrin)、ガンマシハロトリン(gamma-cyhalothrin)、ラムダシハロトリン(lambda-cyhalothrin)、シペルメトリン(cypermethrin)、アルファシペルメトリン(alpha-cypermethrin)、べータシペルメトリン(beta-cypermethrin)、シータシペルメトリン(theta-cypermethrin)、ゼータシペルメトリン(zeta-cypermethrin)、シグマシペルメトリン(sigma-cypermethrin)、シフェノトリン(cyphenothrin)、デルタメトリン(deltamethrin)、エンペントリン(empenthrin)、エスフェンバレレート(esfenvalerate)、エトフェンプロックス(etofenprox) 、フェンプロパトリン(fenpropathrin)、フェンバレレート(fenvalerate)、フルシトリネート(flucythrinate)、フルメトリン(flumethrin)、フルバリネート(fluvalinate)、タウフルバリネート(tau-fluvalinate)、ハルフェンプロックス(halfenprox)、ヘプタフルトリン(heptafluthrin)、イミプロトリン(imiprothrin)、カデスリン(kadethrin)、メペルフルトリン(meperfluthrin)、モンフルオロトリン(momfluorothrin)、ペルメトリン(permethrin)、フェノトリン(phenothrin)、プラレトリン(prallethrin)、ピレトリン(pyrethrins)、レスメトリン(resmethrin)、シラフルオフェン(silafluofen)、テフルトリン(tefluthrin)、カッパテフルトリン(kappa- tefluthrin)、テトラメトリン(tetramethrin)、テトラメチルフルトリン(tetramethylfluthrin)、トラロメトリン(tralomethrin)、トランスフルトリン(transfluthrin)、ベンフルトリン(benfluthrin)、フルフェンプロックス(flufenoprox)、フルメスリン(flumethrin)、フラメトリン(furamethrin)、メトフルトリン(metofluthrin)、プロフルトリン(profluthrin)、ジメフルトリン(dimefluthrin)からなる、ナトリウムチャネルモジュレーターの群である。
亜群a-3は、エチプロール(ethiprole)、フィプロニル(fipronil)及びフルフィプロール(flufiprole)からなるGABA作動性塩素イオンチャネルブロッカーの群、並びに、アフォクソラネル(afoxolaner)、フルララネル(fluralaner)、ブロフラニリド(broflanilide)及びフルキサメタミド(fluxametamide)からなるGABA作動性塩素イオンチャネルアロステリックモジュレーターの群からなる群である。
亜群a-4は、クロラントラニリプロール(chlorantraniliprole)、シアントラニルプロール(cyantraniliprole)、シクラニリプロール(cycloniliprole)、フルベンジアミド(flubendiamide)、テトラニリプロール(tetraniliprole)及びシハロジアミド(cyhalodiamide)からなる、リアノジン受容体モジュレーターの群である。
亜群a-5は、アラニカルブ(alanycarb)、アルジカルブ(aldicarb)、ベンダイオカルブ(bendiocarb)、ベンフラカルブ(benfuracarb)、ブトカルボキシム(butocarboxim)、ブトキシカルボキシム(butoxycarboxim)、カルバリル(carbaryl:NAC)、カルボフラン(carbofuran)、カルボスルファン(carbosulfan)、エチオフェンカルブ(ethiofencarb)、フェノブカルブ(fenobucarb:BPMC)、ホルメタネート(formetanate)、フラチオカルブ(furathiocarb)、イソプロカルブ(isoprocarb:MIPC)、メチオカルブ(methiocarb)、メソミル(methomyl)、メトルカルブ(metolcarb:MTMC)、オキサミル(oxamyl)、ピリミカーブ(pirimicarb)、プロポキスル(propoxur:PHC)、チオジカルブ(thiodicarb)、チオファノックス(thiofanox)、トリアザメート(triazamate)、トリメタカルブ(trimethacarb)、XMC及びキシリルカルブ(xylylcarb:MPMC)からなる、カーバメート系のアセチルコリンエステラーゼ(AChE)阻害剤の群である。
亜群a-6は、アバメクチン(abamectin)、フルエンスルホン(fluensulfone)、チオキサザフェン(tioxazafen)、及びフルアザインドリジン(fluazaindolizine)からなる、殺線虫活性化合物の群である。
亜群a-7は、菌根菌(Mycorrhiza Fungi)、アルスロボトリス・ダクチロイデス(Arthrobotrys dactyloides)、バチルス・チューリンゲンシス(Bacillus thuringiensis)、バチルス・フィルムス(Bacillus firmus)、バチルス・メガテリウム(Bacillus megaterium)、バチルス・アミロリケファシエンス(Bacillus amyloliquefaciens)、ヒルステラ・ロッシリエンシス(Hirsutella rhossiliensis)、ヒルステラ・ミネソテンシス(Hirsutella minnesotensis)、モナクロスポリウム・フィマトパガム(Monacrosporium phymatopagus)、パスツーリア・ニシザワエ(Pasteuria nishizawae)、パスツーリア・ペネトランス(Pasteuria penetrans)、パスツーリア・ウスガエ(Pasteuria usgae)、バーティシリウム・クラミドスポリウム(Verticillium chlamydosporium)及びハーピンタンパク(Harpin protein)からなる、微生物資材の群である。 Group (a) is a group consisting of the following subgroups a-1, a-2, a-3, a-4, a-5, a-6 and a-7.
Subgroups a-1 include acetamiprid, clothianidin, dinotefuran, imidacloprid, nitenpyram, thiacloprid, thiamethoxam, fluradixurone, flupyradifurone ), Triflumezopyrim (triflumezopyrim), dichloromesothiaz (dicloromezotiaz) and a compound represented by the following formula (CAS registration number 1689566-03-7, hereinafter may be referred to as insecticidal compound α)
Subgroup a-2 includes acrinathrin, allethrin, bifenthrin, kappa-bifenthrin, bioallethrin, bioresmethrin, cycloprothrin, cyfluthrin cyfluthrin, beta-cyfluthrin, cyhalothrin, gamma-cyhalothrin, lambda-cyhalothrin, cypermethrin, alpha-cypermethrin ), Beta-cypermethrin, theta-cypermethrin, zeta-cypermethrin, sigma-cypermethrin, cyphenothrin, deltamethrin, Empentrin (empe nthrin), esfenvalerate, etofenprox, fenpropathrin, fenvalerate, flucythrinate, flumethrin, fluvalinate, taufulvali Tau-fluvalinate, halfenprox, heptafluthrin (heptafluthrin), imiprothrin, kadethrin, meperfluthrin, monfluorothrin, permethrin, phenothrin phenothrin), praretrin (prallethrin), pyrethrin (pyrethrins), resmethrin (resmethrin), silafluofen (silafluofen), tefluthrin, kappa-tefluthrin, tetramethrin ), Tetramethylfluthrin, tralomethrin, transfluthrin, benfluthrin, flufenprox, flumethrin, furamethrin, metofluthrin, profluthrin, profluthrin (Profluthrin), a group of sodium channel modulators consisting of dimefluthrin.
Subgroup a-3 is a group of GABAergic chloride channel blockers consisting of ethiprole, fipronil and flufiprole, as well as afoxolaner, fluralaner, broflanilide. And a group of GABAergic chloride channel allosteric modulators consisting of flaxametamide.
Subgroup a-4 consists of chlorantraniliprole, cyantraniliprole, cycloniliprole, flubendiamide, tetraniliprole and cyhalodiamide. , A group of ryanodine receptor modulators.
Subgroup a-5 is composed of alanycarb, aldicarb, bendiocarb, benfuracarb, butocarboxim, butoxycarboxim, carbaryl (NAC), Carbofuran, carbosulfan, ethiofencarb, fenobucarb (BPMC), formethanate, furathiocarb, isoprocarb (MIPC), methiocarb, methomyl , Metolcarb (MTMC), oxamyl (oxamyl), pirimicarb, propoxur (PHC), thiodicarb, thiofanox, triazamate, trimethacarb, XMC Fine xylylcarb: consisting (xylylcarb MPMC), a group of carbamates acetylcholinesterase (AChE) inhibitors.
Subgroup a-6 is a group of nematicidal active compounds consisting of abamectin, fluensulfone, tioxazafen, and fluazaindolizine.
Subgroup a-7 includes Mycorrhiza Fungi, Arthrobotrys dactyloides, Bacillus thuringiensis, Bacillus firmus, Bacillus megaterium. , Bacillus amyloliquefaciens, Hirsutella rhossiliensis, Hirsutella minnesotensis, Monacrosporium phymatopagus, urisawai, Pasturia Microbial material consisting of Pasteuria penetrans, Pasturia usgae, Verticillium chlamydosporium and Harpin protein A group.
アセタミプリド(acetamiprid)、クロチアニジン(clothianidin)、ジノテフラン(dinotefuran)、イミダクロプリド(imidacloprid)、ニテンピラム(nitenpyram)、チアクロプリド(thiacloprid)、チアメトキサム(thiamethoxam)、フルピラジフロン(flupyradifurone)、スルホキサフロル(sulfoxaflor)、トリフルメゾピリム(triflumezopyrim)、アクリナトリン(acrinathrin)、アレスリン(allethrin)、ビフェントリン(bifenthrin)、カッパビフェントリン(kappa-bifenthrin)、ビオアレスリン(bioallethrin)、ビオレスメトリン(bioresmethrin)、シクロプロトリン(cycloprothrin)、シフルトリン(cyfluthrin)、ベータ-シフルトリン(beta-cyfluthrin)、シハロトリン(cyhalothrin)、ガンマシハロトリン(gamma-cyhalothrin)、ラムダシハロトリン(lambda-cyhalothrin)、シペルメトリン(cypermethrin)、アルファシペルメトリン(alpha-cypermethrin)、べータシペルメトリン(beta-cypermethrin)、シータシペルメトリン(theta-cypermethrin)、ゼータシペルメトリン(zeta-cypermethrin)、シグマシペルメトリン(sigma-cypermethrin)、シフェノトリン(cyphenothrin)、デルタメトリン(deltamethrin)、エンペントリン(empenthrin)、エスフェンバレレート(esfenvalerate)、エトフェンプロックス(etofenprox) 、フェンプロパトリン(fenpropathrin)、フェンバレレート(fenvalerate)、フルシトリネート(flucythrinate)、フルメトリン(flumethrin)、フルバリネート(fluvalinate)、タウフルバリネート(tau-fluvalinate)、ハルフェンプロックス(halfenprox)、ヘプタフルトリン(heptafluthrin)、イミプロトリン(imiprothrin)、カデスリン(kadethrin)、メペルフルトリン(meperfluthrin)、モンフルオロトリン(momfluorothrin)、ペルメトリン(permethrin)、フェノトリン(phenothrin)、プラレトリン(prallethrin)、ピレトリン(pyrethrins)、レスメトリン(resmethrin)、シラフルオフェン(silafluofen)、テフルトリン(tefluthrin)、カッパテフルトリン(kappa- tefluthrin)、テトラメトリン(tetramethrin)、テトラメチルフルトリン(tetramethylfluthrin)、トラロメトリン(tralomethrin)、トランスフルトリン(transfluthrin)、ベンフルトリン(benfluthrin)、フルフェンプロックス(flufenoprox)、フルメスリン(flumethrin)、フラメトリン(furamethrin)、メトフルトリン(metofluthrin)、プロフルトリン(profluthrin)、ジメフルトリン(dimefluthrin)、エチプロール(ethiprole)、フィプロニル(fipronil)、フルフィプロール(flufiprole)、クロラントラニリプロール(chlorantraniliprole)、シアントラニルプロール(cyantraniliprole)、シクラニリプロール(cycloniliprole)、フルベンジアミド(flubendiamide)、シハロジアミド(cyhalodiamide)、アラニカルブ(alanycarb)、アルジカルブ(aldicarb)、ベンダイオカルブ(bendiocarb)、ベンフラカルブ(benfuracarb)、ブトカルボキシム(butocarboxim)、ブトキシカルボキシム(butoxycarboxim)、カルバリル(carbaryl:NAC)、カルボフラン(carbofuran)、カルボスルファン(carbosulfan)、エチオフェンカルブ(ethiofencarb)、フェノブカルブ(fenobucarb:BPMC)、ホルメタネート(formetanate)、フラチオカルブ(furathiocarb)、イソプロカルブ(isoprocarb:MIPC)、メチオカルブ(methiocarb)、メソミル(methomyl)、メトルカルブ(metolcarb:MTMC)、オキサミル(oxamyl)、ピリミカーブ(pirimicarb)、プロポキスル(propoxur:PHC)、チオジカルブ(thiodicarb)、チオファノックス(thiofanox)、トリアザメート(triazamate)、トリメタカルブ(trimethacarb)、XMC、キシリルカルブ(xylylcarb:MPMC)、アバメクチン(abamectin)及びフルエンスルホン(fluensulfone)は、いずれも公知の化合物であり、「MeisterPro Crop Protection Handbook Vol.100(2014)」等に記載されている。これらの化合物は市販の製剤から得るか、公知の方法により製造することにより得られる。
ジクロロメソチアズ(CAS登録番号:1263629-39-5)、テトラニリプロール(CAS登録番号:1229654-66-3)、フルキサメタミド(CAS登録番号:928783-29-3)、アフォクソラネル(CAS登録番号:1093861-60-9)、フルララネル(CAS登録番号:864731-61-3)、ブロフラニリド(CAS登録番号:1207727-04-5)、フルアザインドリジン(CAS登録番号:1254304-22-7)、チオキサザフェン(CAS登録番号:330459-31-9)、殺虫化合物α(CAS登録番号:1689566-03-7)はいずれも公知の化合物であり、国際公開第2011/017342号、国際公開第2010/069502号、国際公開2007/026965号、国際公開第2007/079162号、国際公開第2005/085216号、国際公開第2010/018714号、国際公開第2010/129500号、国際公開第2006/114400号、及び国際公開第2012/029672号に記載された方法でそれぞれ製造することができる。
菌根菌(Mycorrhiza Fungi)、アルスロボトリス・ダクチロイデス(Arthrobotrys dactyloides)、バチルス・チューリンゲンシス(Bacillus thuringiensis)、バチルス・フィルムス(Bacillus firmus)、バチルス・メガテリウム(Bacillus megaterium)、バチルス・アミロリケファシエンス(Bacillus amyloliquefaciens)、ヒルステラ・ロッシリエンシス(Hirsutella rhossiliensis)、ヒルステラ・ミネソテンシス(Hirsutella minnesotensis)、モナクロスポリウム・フィマトパガム(Monacrosporium phymatopagus)、パスツーリア・ニシザワエ(Pasteuria nishizawae)、パスツーリア・ペネトランス(Pasteuria penetrans)、パスツーリア・ウスガエ(Pasteuria usgae)、バーティシリウム・クラミドスポリウム(Verticillium chlamydosporium)及びハーピンタンパク(Harpin protein)は、いずれも公知の微生物資材であり、市販の製剤から得るか、公知の方法により製造することにより得られる。また、これらの微生物資材は菌寄託機関から入手することもできる。
前記の菌根菌としては、アーバスキュラー菌根菌(Arbuscular mycorrhizal fungus)が好ましく、特にグロマス(Glomus)属に属する菌、例えば、グロマス・イントララディセス(Glomus intraradices)、グロマス・モッセ(Glomus mosseae)、グロマス・アグリゲイツム(Glomus aggregatum)及びグロマス・エツニカツム(Glomus etunicatum)が好ましい。また、これらグロマス属の菌は、単独で用いてもよいし、2種以上の菌混合物として用いてもよい。 Acetamiprid, clothianidin, dinotefuran, imidacloprid, nitenpyram, thiacloprid, thiamethoxam, flupyrifurone, flupyradifurone ), Acrinathrin, allethrin, bifenthrin, kappa-bifenthrin, bioallethrin, bioresmethrin, cycloprothrin, cyfluthrin, beta-cyfluthrin Cyfluthrin (beta-cyfluthrin), cyhalothrin, gamma-cyhalothrin, lambda-cyhalothrin, cypermethrin (cypermet) hrin), alpha-cypermethrin, beta-cypermethrin, theta-cypermethrin, zeta-cypermethrin, sigma-cypermethrin, sigma-cypermethrin Phenothrin (cyphenothrin), deltamethrin (deltamethrin), empentrin (empenthrin), esfenvalerate (ethfenvalerate), etofenprox (etofenprox), fenpropatrin (fenpropathrin), fenvalerate (fenvalerate), flucythrinate (flucythrinate), flumethrin (Flumethrin), fulvalinate, tau-fluvalinate, halffenprox, heptafluthrin, imiprothrin, kadethrin, meperfluthrin , Monfluorothrin, permethrin, phenothrin, prarethrin, pyrethrin, resmethrin, silafluofen, tefluthrin, kappa tefluthrin te ), Tetramethrin, tetramethylfluthrin, tralomethrin, transfluthrin, benfluthrin, flufenprox, flumethrin, furamethrin, methfluthrin (Metofluthrin), profluthrin, dimefluthrin, ethiprole, fipronil, flufiprole, chlorantranip Chlorantraniliprole, cyantraniliprole, cycloniliprole, flubendiamide, cyhalodiamide, alanycarb, aldicarb, bendiocarb, benfuracarb (Benfuracarb), butocarboxim, butoxycarboxim, carbaryl (NAC), carbofuran, carbofuran, carbosulfan, ethiofencarb, fenobucarb (BPMC), formethanate (Formetanate), furathiocarb, isoprocarb (MIPC), methiocarb, methomyl, metolcarb (MTMC), oxamyl, pirimicarb , Propoxur (PHC), thiodicarb, thiofanox, triazamate, trimethacarb, XMC, xylylcarb (MPMC), abamectin and fluensulfone , Both of which are known compounds, “MeisterPro Crop Protection Handbook Vol. 100 (2014) "or the like. These compounds can be obtained from commercially available preparations or produced by known methods.
Dichloromesothiaz (CAS registration number: 1263629-39-5), tetraniliprole (CAS registration number: 1229654-66-3), floxamethamide (CAS registration number: 928783-29-3), afoxoranel (CAS registration number: 1093861-60-9), fluralanel (CAS registration number: 864731-61-3), brofuranilide (CAS registration number: 1207727-04-5), fluazaindolizine (CAS registration number: 1254304-22-7), tioxazafen (CAS registration number: 330459-31-9) and insecticidal compound α (CAS registration number: 1689566-03-7) are both known compounds and are disclosed in International Publication Nos. 2011/017342 and 2010/066952. , International Publication No. 2007/026965, International Publication No. 2007/079162, International Publication No. 2005/085216, International Publication No. 2010/018714, International Publication No. 20 No. 0/129500, WO 2006/114400, and by the method described in WO 2012/029672 can be prepared, respectively.
Mycorrhiza Fungi, Arthrobotrys dactyloides, Bacillus thuringiensis, Bacillus firmus, Bacillus megaterium, Bacillus amyloliquefaciens (Bacillus amyloliquefaciens), Hirsutella rhossiliensis, Hirsutella minnesotensis, Monacrosporium phymatopagus, Pasturiatransurie, Pasturiapass・ Usugae (Pasteuria usgae), Verticillium chlamydosporium and Harpin protein are all known microbial materials Obtained from commercially available preparations or obtained by production using a known method. Moreover, these microbial materials can also be obtained from a fungus depository.
As the mycorrhizal fungi, Arbuscular mycorrhizal fungus is preferable, and in particular, bacteria belonging to the genus Gromus, such as Glomus intraradices, Glomus mosseae Glomus aggregatum and Glomus etunicatum are preferred. In addition, these bacterium belonging to the genus Gromas may be used alone or as a mixture of two or more bacteria.
ジクロロメソチアズ(CAS登録番号:1263629-39-5)、テトラニリプロール(CAS登録番号:1229654-66-3)、フルキサメタミド(CAS登録番号:928783-29-3)、アフォクソラネル(CAS登録番号:1093861-60-9)、フルララネル(CAS登録番号:864731-61-3)、ブロフラニリド(CAS登録番号:1207727-04-5)、フルアザインドリジン(CAS登録番号:1254304-22-7)、チオキサザフェン(CAS登録番号:330459-31-9)、殺虫化合物α(CAS登録番号:1689566-03-7)はいずれも公知の化合物であり、国際公開第2011/017342号、国際公開第2010/069502号、国際公開2007/026965号、国際公開第2007/079162号、国際公開第2005/085216号、国際公開第2010/018714号、国際公開第2010/129500号、国際公開第2006/114400号、及び国際公開第2012/029672号に記載された方法でそれぞれ製造することができる。
菌根菌(Mycorrhiza Fungi)、アルスロボトリス・ダクチロイデス(Arthrobotrys dactyloides)、バチルス・チューリンゲンシス(Bacillus thuringiensis)、バチルス・フィルムス(Bacillus firmus)、バチルス・メガテリウム(Bacillus megaterium)、バチルス・アミロリケファシエンス(Bacillus amyloliquefaciens)、ヒルステラ・ロッシリエンシス(Hirsutella rhossiliensis)、ヒルステラ・ミネソテンシス(Hirsutella minnesotensis)、モナクロスポリウム・フィマトパガム(Monacrosporium phymatopagus)、パスツーリア・ニシザワエ(Pasteuria nishizawae)、パスツーリア・ペネトランス(Pasteuria penetrans)、パスツーリア・ウスガエ(Pasteuria usgae)、バーティシリウム・クラミドスポリウム(Verticillium chlamydosporium)及びハーピンタンパク(Harpin protein)は、いずれも公知の微生物資材であり、市販の製剤から得るか、公知の方法により製造することにより得られる。また、これらの微生物資材は菌寄託機関から入手することもできる。
前記の菌根菌としては、アーバスキュラー菌根菌(Arbuscular mycorrhizal fungus)が好ましく、特にグロマス(Glomus)属に属する菌、例えば、グロマス・イントララディセス(Glomus intraradices)、グロマス・モッセ(Glomus mosseae)、グロマス・アグリゲイツム(Glomus aggregatum)及びグロマス・エツニカツム(Glomus etunicatum)が好ましい。また、これらグロマス属の菌は、単独で用いてもよいし、2種以上の菌混合物として用いてもよい。 Acetamiprid, clothianidin, dinotefuran, imidacloprid, nitenpyram, thiacloprid, thiamethoxam, flupyrifurone, flupyradifurone ), Acrinathrin, allethrin, bifenthrin, kappa-bifenthrin, bioallethrin, bioresmethrin, cycloprothrin, cyfluthrin, beta-cyfluthrin Cyfluthrin (beta-cyfluthrin), cyhalothrin, gamma-cyhalothrin, lambda-cyhalothrin, cypermethrin (cypermet) hrin), alpha-cypermethrin, beta-cypermethrin, theta-cypermethrin, zeta-cypermethrin, sigma-cypermethrin, sigma-cypermethrin Phenothrin (cyphenothrin), deltamethrin (deltamethrin), empentrin (empenthrin), esfenvalerate (ethfenvalerate), etofenprox (etofenprox), fenpropatrin (fenpropathrin), fenvalerate (fenvalerate), flucythrinate (flucythrinate), flumethrin (Flumethrin), fulvalinate, tau-fluvalinate, halffenprox, heptafluthrin, imiprothrin, kadethrin, meperfluthrin , Monfluorothrin, permethrin, phenothrin, prarethrin, pyrethrin, resmethrin, silafluofen, tefluthrin, kappa tefluthrin te ), Tetramethrin, tetramethylfluthrin, tralomethrin, transfluthrin, benfluthrin, flufenprox, flumethrin, furamethrin, methfluthrin (Metofluthrin), profluthrin, dimefluthrin, ethiprole, fipronil, flufiprole, chlorantranip Chlorantraniliprole, cyantraniliprole, cycloniliprole, flubendiamide, cyhalodiamide, alanycarb, aldicarb, bendiocarb, benfuracarb (Benfuracarb), butocarboxim, butoxycarboxim, carbaryl (NAC), carbofuran, carbofuran, carbosulfan, ethiofencarb, fenobucarb (BPMC), formethanate (Formetanate), furathiocarb, isoprocarb (MIPC), methiocarb, methomyl, metolcarb (MTMC), oxamyl, pirimicarb , Propoxur (PHC), thiodicarb, thiofanox, triazamate, trimethacarb, XMC, xylylcarb (MPMC), abamectin and fluensulfone , Both of which are known compounds, “MeisterPro Crop Protection Handbook Vol. 100 (2014) "or the like. These compounds can be obtained from commercially available preparations or produced by known methods.
Dichloromesothiaz (CAS registration number: 1263629-39-5), tetraniliprole (CAS registration number: 1229654-66-3), floxamethamide (CAS registration number: 928783-29-3), afoxoranel (CAS registration number: 1093861-60-9), fluralanel (CAS registration number: 864731-61-3), brofuranilide (CAS registration number: 1207727-04-5), fluazaindolizine (CAS registration number: 1254304-22-7), tioxazafen (CAS registration number: 330459-31-9) and insecticidal compound α (CAS registration number: 1689566-03-7) are both known compounds and are disclosed in International Publication Nos. 2011/017342 and 2010/066952. , International Publication No. 2007/026965, International Publication No. 2007/079162, International Publication No. 2005/085216, International Publication No. 2010/018714, International Publication No. 20 No. 0/129500, WO 2006/114400, and by the method described in WO 2012/029672 can be prepared, respectively.
Mycorrhiza Fungi, Arthrobotrys dactyloides, Bacillus thuringiensis, Bacillus firmus, Bacillus megaterium, Bacillus amyloliquefaciens (Bacillus amyloliquefaciens), Hirsutella rhossiliensis, Hirsutella minnesotensis, Monacrosporium phymatopagus, Pasturiatransurie, Pasturiapass・ Usugae (Pasteuria usgae), Verticillium chlamydosporium and Harpin protein are all known microbial materials Obtained from commercially available preparations or obtained by production using a known method. Moreover, these microbial materials can also be obtained from a fungus depository.
As the mycorrhizal fungi, Arbuscular mycorrhizal fungus is preferable, and in particular, bacteria belonging to the genus Gromus, such as Glomus intraradices, Glomus mosseae Glomus aggregatum and Glomus etunicatum are preferred. In addition, these bacterium belonging to the genus Gromas may be used alone or as a mixture of two or more bacteria.
群(b)は、下記亜群b-1、b-2、b-3、b-4、b-5、b-6、b-7、b-8及びb-9からなる群である。
亜群b-1は、アザコナゾール(azaconazole)、ビテルタノール(bitertanol)、ブロムコナゾール(bromuconazole)、シプロコナゾール(cyproconazole)、ジフェノコナゾール(difenoconazole)、ジニコナゾール(diniconazole)、ジニコナゾールM(diniconazole-M)、エポキシコナゾール(epoxiconazole)、エタコナゾール(etaconazole)、フェナリモル(fenarimol)、フェンブコナゾール(fenbuconazole)、フルキンコナゾール(
fluquinconazole)、キンコナゾール(quinconazole)、フルシラゾール(flusilazole)、フルトリアホール(flutriafol)、ヘキサコナゾール(hexaconazole)、イマザリル(imazalil)、イミベンコナゾール(imibenconazole)、イプコナゾール(ipconazole)、メトコナゾール(metconazole)、ミクロブタニル(myclobutanil)、ヌアリモール(nuarimol)、オキスポコナゾール(oxpoconazole)、オキスポコナゾールフマル酸塩(oxpoconazole fumarate)、ペフラゾエート(pefurazoate)、ペンコナゾール(penconazole)、プロクロラズ(prochloraz)、プロピコナゾール(propiconazole)、プロチオコナゾール(prothioconazole)、ピリフェノックス(pyrifenox)、ピリソキサゾール(pyrisoxazole)、シメコナゾール(simeconazole)、テブコナゾール(tebuconazole)、テトラコナゾール(tetraconazole)、トリアジメホン(triadimefon)、トリアジメノール(triadimenol)、トリフルミゾール(triflumizole)、トリホリン(triforine)及びトリチコナゾール(triticonazole)からなる、ステロール生合成阻害剤の群である。
亜群b-2は、アゾキシストロビン(azoxystrobin)、クモキシストロビン(coumoxystrobin)、ジモキシストロビン(dimoxystrobin)、エノキサストロビン(enoxastrobin)、ファモキサドン(famoxadone)、フェンアミドン(fenamidone)、フェナミンストロビン(fenaminstrobin)、フルフェノキシストロビン(flufenoxystrobin)、フルオキサストロビン(fluoxastrobin)、クレソキシム-メチル(kresoxim-methyl)、マンデストロビン(mandestrobin)、メトミノストロビン(metominostrobin)、オリサストロビン(orysastrobin)、ピコキシストロビン(picoxystrobin)、ピラクロストロビン(pyraclostrobin)、ピラメトストロビン(pyrametostrobin)、ピラオキシストロビン(pyraoxystrobin)、トリフロキシストロビン(trifloxystrobin)、ピリベンカルブ(pyribencarb)及びトリクロピリカルブ(triclopyricarb)からなるQo阻害剤(Quinone outside inhibitors)の群、並びにシアゾファミド(cyazofamid)及びアミスルブロム(amisulbrom)からなるQi阻害剤(Quinone inside inhibitors)の群からなる群である。
亜群b-3は、ベナラキシル(benalaxyl)、ベナラキシルM(benalaxyl-M)、フララキシル(furalaxyl)、メタラキシル(metalaxyl)、メタラキシルM(metalaxyl-M)、オキサジキシル(oxadixyl)及びオフラセ(ofurace)からなる、RNAポリメラーゼI阻害剤の群である。
亜群b-4は、ベノダニル(benodanil)、ベンゾビンジフルピル(benzovindiflupyr)、ビキサフェン(bixafen)、ボスカリド(boscalid)、カルボキシン(carboxin)、フェンフラム(fenfuram)、フルオピラム(fluopyram)、フルトラニル(flutolanil)、フルキサピロキサド(fluxapyroxad)、フラメトピル(furametpyr)、イソフェタミド(isofetamid)、イソピラザム(isopyrazam)、メプロニル(mepronil)、オキシカルボキシン(oxycarboxin)、ペンチオピラド(penthiopyrad)、ペンフルフェン(penflufen)、セダキサン(sedaxane)、チフルザミド(thifluzamide)、ピラジフルミド(pyraziflumid)、ピジフルメトフェン(pydiflumetofen、CAS登録番号1228284-64-7)、3-ジフルオロメチル-1-メチル-N-(1,1,3-トリメチルインダン-4-イル)ピラゾール-4-カルボキサミド(CAS登録番号141573-94-6、以下、殺菌化合物β1と記すことがある)、3-ジフルオロメチル-1-メチル-N-[(3R)-1,1,3-トリメチルインダン-4-イル]ピラゾール-4-カルボキサミド(CAS登録番号1352994-67-2、以下、殺菌化合物β2と記すことがある)、3-ジフルオロメチル-N-(7-フルオロ-1,1,3-トリメチルインダン-4-イル)-1-メチルピラゾール-4-カルボキサミド(CAS登録番号1383809-87-7、以下、殺菌化合物β3と記すことがある)、3-ジフルオロメチル-N-[(3R)-7-フルオロ-1,1,3-トリメチルインダン-4-イル]-1-メチルピラゾール-4-カルボキサミド(CAS登録番号1513466-73-3、以下、殺菌化合物β4と記すことがある) 及びN-シクロプロピル-3-(ジフルオロメチル)-5-フルオロ-N-(5-クロロ-2-イソプロピルベンジル)-1-メチル-1H-ピラゾール-4-カルボキサミド(CAS登録番号1255734-28-1、以下、殺菌化合物β5と記すことがある)からなる、コハク酸脱水素酵素阻害剤の群である。
亜群b-5は、ベノミル(benomyl)、カルベンダジム(carbendazim)、フベリダゾール(fuberidazole)、チアベンダゾール(thiabendazole)、チオファネート(thiophanate)、チオファネートメチル(thiophanate-methyl)、ジエトフェンカルブ(diethofencarb)、ゾキサミド(zoxamide)及びエタボキサム(ethaboxam)からなる、βチューブリン重合阻害剤の群である。
亜群b-6は、フェルバム(ferbam)、マンゼブ(mancozeb)、マンネブ(maneb)、メチラム(metiram)、プロピネブ(propineb)、チウラム(thiram)、ジネブ(zineb)、ジラム(ziram)、キャプタン(captan)、キャプタホール(captafol)、ホルペット(folpet)、クロロタロニル(chlorothalonil)、トリルフルアニド(tolylfluanid)、グアザチン(guazatine)、イミノクタジン(iminoctadine)、アニラジン(anilazine)、ジチアノン(dithianon)、キノメチオナート(chinomethionat or quinomethionate)及びフルオルイミド(fluoroimide)からなる、多作用点接触活性化合物の群である。
亜群b-7は、ジメトモルフ(dimethomorph)、フルモルフ(flumorph)、ピリモルフ(pyrimorph)、ベンチアバリカルブ(benthiavalicarb)、ベンチアバリカルブイソプロピル(benthivalicarb-isopropyl)、イプロバリカルブ(iprovalicarb)、バリフェナレート(valifenalate)及びマンジプロパミド(mandipropamid)からなる、セルロース合成阻害剤の群である。。
亜群b-8は、フェンピクロニル(fenpiclonil)、フルジオキソニル(fludioxonil)、クロゾリネート(chlozolinate)、イプロジオン(iprodione)、プロシミドン(procymidone)及びビンクロゾリン(vinclozolin)からなる、浸透圧シグナル伝達におけるMAP(mitogen-activated protein)/ヒスチジンキナーゼ阻害剤の群である。
亜群b-9は、トルクロホスメチル(tolclofos-methyl)、オキサチアピプロリン(oxathiapiprolin)、ピカルブトラゾクス(picarbutrazox)、フルオピコリド(fluopicolide)及びシルチオファム(silthiofam)からなる、その他の殺菌剤の群である。 Group (b) is a group consisting of the following subgroups b-1, b-2, b-3, b-4, b-5, b-6, b-7, b-8 and b-9.
Subgroup b-1 includes azaconazole, bitertanol, bromuconazole, cyproconazole, difenoconazole, diniconazole, diniconazole M, epoxy Conoxi (epoxiconazole), etaconazole (etaconazole), fenarimol (fenarimol), fenbuconazole (fenbuconazole), fluquinconazole (
fluquinconazole), quinconazole, flusilazole, flutriafol, hexaconazole, imazalil, imibenconazole, ipconazole, metconazole, Microbutanil, nuarimol, oxpoconazole, oxpoconazole fumarate, pefurazoate, penconazole, prochloraz, propiconazole ), Prothioconazole, pyrifenox, pyrisoxazole, simeconazole, tebuconazole, tetraconazole, triazime Down (triadimefon), triadimenol (triadimenol), consisting of triflumizole (triflumizole), triforine (triforine) and triticonazole (triticonazole), a group of sterol biosynthesis inhibitors.
Subgroup b-2 includes azoxystrobin, coumoxystrobin, dimoxystrobin, enoxastrobin, famoxadone, fenamidone, fena Minstrobin, flufenoxystrobin, fluoxastrobin, cresoxim-methyl, mandestrobin, methminostrobin, oryastrobine, orysastrobin, Picoxystrobin, pyraclostrobin, pyrametostrobin, pyraoxystrobin, trifloxystrobin, pyribencarb and triclopyricar b) a group of Qo inhibitors (Quinone outside inhibitors) and a group of Qi inhibitors (Quinone inside inhibitors) consisting of cyazofamid and amisulbrom.
Subgroup b-3 consists of benalaxyl, benalaxyl-M, furalaxyl, metalaxyl, metalaxyl-M, oxadixyl and ofurace, A group of RNA polymerase I inhibitors.
Subgroup b-4 includes benodanil, benzovindiflupyr, bixafen, boscalid, carboxin, fenfuram, fluopyram, flutolanil , Fluxapyroxad, furametpyr, isofetamid, isopyrazam, mepronil, oxycarboxin, penthiopyrad, penflufen, sedaxane (sax) Thifluzamide, pyraziflumid, pydiflumetofen (CAS registration number 1228284-64-7), 3-difluoromethyl-1-methyl-N- (1,1,3-trimethylindan-4 -Yl) pyrazole-4-carboxami (CAS registration number 141573-94-6, hereinafter may be referred to as bactericidal compound β1), 3-difluoromethyl-1-methyl-N-[(3R) -1,1,3-trimethylindan-4- Yl] pyrazole-4-carboxamide (CAS registration number 1352994-67-2, hereinafter may be referred to as bactericidal compound β2), 3-difluoromethyl-N- (7-fluoro-1,1,3-trimethylindane- 4-yl) -1-methylpyrazole-4-carboxamide (CAS registration number 1383809-87-7, hereinafter may be referred to as bactericidal compound β3), 3-difluoromethyl-N-[(3R) -7-fluoro -1,1,3-trimethylindan-4-yl] -1-methylpyrazole-4-carboxamide (CAS registration number 1513466-73-3, hereinafter may be referred to as bactericidal compound β4) and N-cyclopropi -3- (difluoromethyl) -5-fluoro-N- (5-chloro-2-isopropylbenzyl) -1-methyl-1H-pyrazole-4-carboxamide (CAS registration number 1255734-28-1, hereinafter bactericidal compound a group of succinic acid dehydrogenase inhibitors.
Subgroup b-5 includes benomyl, carbendazim, fuberidazole, thiabendazole, thiophanate, thiophanate-methyl, diethofencarb, zoxamide and A group of β-tubulin polymerization inhibitors consisting of ethaboxam.
Subgroup b-6 includes ferbam, mancozeb, maneb, metyram, propineb, thiram, zineb, ziram, captan ), Captafol, folpet, chlorothalonil, tolylfluanid, guazatine, iminoctadine, anilazine, dithianon, quinomethionate or chinomethionat It is a group of multi-acting point contact active compounds consisting of quinomethionate and fluoroimide.
Subgroup b-7 includes dimethomorph, flumorph, pyrimorph, benthiavalicarb, benthivalicarb-isopropyl, iprovalicarb, variphenate ( A group of cellulose synthesis inhibitors consisting of valifenalate and mandipropamid. .
Subgroup b-8 consists of fenpiclonil, fludioxonil, chlozolinate, iprodione, procymidone and vinclozolin in MAP (mitogen-activated protein) ) / Histidine kinase inhibitor group.
Subgroup b-9 is a group of other fungicides consisting of tolclofos-methyl, oxathiapiprolin, picarbutrazox, fluopicolide and silthiofam. is there.
亜群b-1は、アザコナゾール(azaconazole)、ビテルタノール(bitertanol)、ブロムコナゾール(bromuconazole)、シプロコナゾール(cyproconazole)、ジフェノコナゾール(difenoconazole)、ジニコナゾール(diniconazole)、ジニコナゾールM(diniconazole-M)、エポキシコナゾール(epoxiconazole)、エタコナゾール(etaconazole)、フェナリモル(fenarimol)、フェンブコナゾール(fenbuconazole)、フルキンコナゾール(
fluquinconazole)、キンコナゾール(quinconazole)、フルシラゾール(flusilazole)、フルトリアホール(flutriafol)、ヘキサコナゾール(hexaconazole)、イマザリル(imazalil)、イミベンコナゾール(imibenconazole)、イプコナゾール(ipconazole)、メトコナゾール(metconazole)、ミクロブタニル(myclobutanil)、ヌアリモール(nuarimol)、オキスポコナゾール(oxpoconazole)、オキスポコナゾールフマル酸塩(oxpoconazole fumarate)、ペフラゾエート(pefurazoate)、ペンコナゾール(penconazole)、プロクロラズ(prochloraz)、プロピコナゾール(propiconazole)、プロチオコナゾール(prothioconazole)、ピリフェノックス(pyrifenox)、ピリソキサゾール(pyrisoxazole)、シメコナゾール(simeconazole)、テブコナゾール(tebuconazole)、テトラコナゾール(tetraconazole)、トリアジメホン(triadimefon)、トリアジメノール(triadimenol)、トリフルミゾール(triflumizole)、トリホリン(triforine)及びトリチコナゾール(triticonazole)からなる、ステロール生合成阻害剤の群である。
亜群b-2は、アゾキシストロビン(azoxystrobin)、クモキシストロビン(coumoxystrobin)、ジモキシストロビン(dimoxystrobin)、エノキサストロビン(enoxastrobin)、ファモキサドン(famoxadone)、フェンアミドン(fenamidone)、フェナミンストロビン(fenaminstrobin)、フルフェノキシストロビン(flufenoxystrobin)、フルオキサストロビン(fluoxastrobin)、クレソキシム-メチル(kresoxim-methyl)、マンデストロビン(mandestrobin)、メトミノストロビン(metominostrobin)、オリサストロビン(orysastrobin)、ピコキシストロビン(picoxystrobin)、ピラクロストロビン(pyraclostrobin)、ピラメトストロビン(pyrametostrobin)、ピラオキシストロビン(pyraoxystrobin)、トリフロキシストロビン(trifloxystrobin)、ピリベンカルブ(pyribencarb)及びトリクロピリカルブ(triclopyricarb)からなるQo阻害剤(Quinone outside inhibitors)の群、並びにシアゾファミド(cyazofamid)及びアミスルブロム(amisulbrom)からなるQi阻害剤(Quinone inside inhibitors)の群からなる群である。
亜群b-3は、ベナラキシル(benalaxyl)、ベナラキシルM(benalaxyl-M)、フララキシル(furalaxyl)、メタラキシル(metalaxyl)、メタラキシルM(metalaxyl-M)、オキサジキシル(oxadixyl)及びオフラセ(ofurace)からなる、RNAポリメラーゼI阻害剤の群である。
亜群b-4は、ベノダニル(benodanil)、ベンゾビンジフルピル(benzovindiflupyr)、ビキサフェン(bixafen)、ボスカリド(boscalid)、カルボキシン(carboxin)、フェンフラム(fenfuram)、フルオピラム(fluopyram)、フルトラニル(flutolanil)、フルキサピロキサド(fluxapyroxad)、フラメトピル(furametpyr)、イソフェタミド(isofetamid)、イソピラザム(isopyrazam)、メプロニル(mepronil)、オキシカルボキシン(oxycarboxin)、ペンチオピラド(penthiopyrad)、ペンフルフェン(penflufen)、セダキサン(sedaxane)、チフルザミド(thifluzamide)、ピラジフルミド(pyraziflumid)、ピジフルメトフェン(pydiflumetofen、CAS登録番号1228284-64-7)、3-ジフルオロメチル-1-メチル-N-(1,1,3-トリメチルインダン-4-イル)ピラゾール-4-カルボキサミド(CAS登録番号141573-94-6、以下、殺菌化合物β1と記すことがある)、3-ジフルオロメチル-1-メチル-N-[(3R)-1,1,3-トリメチルインダン-4-イル]ピラゾール-4-カルボキサミド(CAS登録番号1352994-67-2、以下、殺菌化合物β2と記すことがある)、3-ジフルオロメチル-N-(7-フルオロ-1,1,3-トリメチルインダン-4-イル)-1-メチルピラゾール-4-カルボキサミド(CAS登録番号1383809-87-7、以下、殺菌化合物β3と記すことがある)、3-ジフルオロメチル-N-[(3R)-7-フルオロ-1,1,3-トリメチルインダン-4-イル]-1-メチルピラゾール-4-カルボキサミド(CAS登録番号1513466-73-3、以下、殺菌化合物β4と記すことがある) 及びN-シクロプロピル-3-(ジフルオロメチル)-5-フルオロ-N-(5-クロロ-2-イソプロピルベンジル)-1-メチル-1H-ピラゾール-4-カルボキサミド(CAS登録番号1255734-28-1、以下、殺菌化合物β5と記すことがある)からなる、コハク酸脱水素酵素阻害剤の群である。
亜群b-5は、ベノミル(benomyl)、カルベンダジム(carbendazim)、フベリダゾール(fuberidazole)、チアベンダゾール(thiabendazole)、チオファネート(thiophanate)、チオファネートメチル(thiophanate-methyl)、ジエトフェンカルブ(diethofencarb)、ゾキサミド(zoxamide)及びエタボキサム(ethaboxam)からなる、βチューブリン重合阻害剤の群である。
亜群b-6は、フェルバム(ferbam)、マンゼブ(mancozeb)、マンネブ(maneb)、メチラム(metiram)、プロピネブ(propineb)、チウラム(thiram)、ジネブ(zineb)、ジラム(ziram)、キャプタン(captan)、キャプタホール(captafol)、ホルペット(folpet)、クロロタロニル(chlorothalonil)、トリルフルアニド(tolylfluanid)、グアザチン(guazatine)、イミノクタジン(iminoctadine)、アニラジン(anilazine)、ジチアノン(dithianon)、キノメチオナート(chinomethionat or quinomethionate)及びフルオルイミド(fluoroimide)からなる、多作用点接触活性化合物の群である。
亜群b-7は、ジメトモルフ(dimethomorph)、フルモルフ(flumorph)、ピリモルフ(pyrimorph)、ベンチアバリカルブ(benthiavalicarb)、ベンチアバリカルブイソプロピル(benthivalicarb-isopropyl)、イプロバリカルブ(iprovalicarb)、バリフェナレート(valifenalate)及びマンジプロパミド(mandipropamid)からなる、セルロース合成阻害剤の群である。。
亜群b-8は、フェンピクロニル(fenpiclonil)、フルジオキソニル(fludioxonil)、クロゾリネート(chlozolinate)、イプロジオン(iprodione)、プロシミドン(procymidone)及びビンクロゾリン(vinclozolin)からなる、浸透圧シグナル伝達におけるMAP(mitogen-activated protein)/ヒスチジンキナーゼ阻害剤の群である。
亜群b-9は、トルクロホスメチル(tolclofos-methyl)、オキサチアピプロリン(oxathiapiprolin)、ピカルブトラゾクス(picarbutrazox)、フルオピコリド(fluopicolide)及びシルチオファム(silthiofam)からなる、その他の殺菌剤の群である。 Group (b) is a group consisting of the following subgroups b-1, b-2, b-3, b-4, b-5, b-6, b-7, b-8 and b-9.
Subgroup b-1 includes azaconazole, bitertanol, bromuconazole, cyproconazole, difenoconazole, diniconazole, diniconazole M, epoxy Conoxi (epoxiconazole), etaconazole (etaconazole), fenarimol (fenarimol), fenbuconazole (fenbuconazole), fluquinconazole (
fluquinconazole), quinconazole, flusilazole, flutriafol, hexaconazole, imazalil, imibenconazole, ipconazole, metconazole, Microbutanil, nuarimol, oxpoconazole, oxpoconazole fumarate, pefurazoate, penconazole, prochloraz, propiconazole ), Prothioconazole, pyrifenox, pyrisoxazole, simeconazole, tebuconazole, tetraconazole, triazime Down (triadimefon), triadimenol (triadimenol), consisting of triflumizole (triflumizole), triforine (triforine) and triticonazole (triticonazole), a group of sterol biosynthesis inhibitors.
Subgroup b-2 includes azoxystrobin, coumoxystrobin, dimoxystrobin, enoxastrobin, famoxadone, fenamidone, fena Minstrobin, flufenoxystrobin, fluoxastrobin, cresoxim-methyl, mandestrobin, methminostrobin, oryastrobine, orysastrobin, Picoxystrobin, pyraclostrobin, pyrametostrobin, pyraoxystrobin, trifloxystrobin, pyribencarb and triclopyricar b) a group of Qo inhibitors (Quinone outside inhibitors) and a group of Qi inhibitors (Quinone inside inhibitors) consisting of cyazofamid and amisulbrom.
Subgroup b-3 consists of benalaxyl, benalaxyl-M, furalaxyl, metalaxyl, metalaxyl-M, oxadixyl and ofurace, A group of RNA polymerase I inhibitors.
Subgroup b-4 includes benodanil, benzovindiflupyr, bixafen, boscalid, carboxin, fenfuram, fluopyram, flutolanil , Fluxapyroxad, furametpyr, isofetamid, isopyrazam, mepronil, oxycarboxin, penthiopyrad, penflufen, sedaxane (sax) Thifluzamide, pyraziflumid, pydiflumetofen (CAS registration number 1228284-64-7), 3-difluoromethyl-1-methyl-N- (1,1,3-trimethylindan-4 -Yl) pyrazole-4-carboxami (CAS registration number 141573-94-6, hereinafter may be referred to as bactericidal compound β1), 3-difluoromethyl-1-methyl-N-[(3R) -1,1,3-trimethylindan-4- Yl] pyrazole-4-carboxamide (CAS registration number 1352994-67-2, hereinafter may be referred to as bactericidal compound β2), 3-difluoromethyl-N- (7-fluoro-1,1,3-trimethylindane- 4-yl) -1-methylpyrazole-4-carboxamide (CAS registration number 1383809-87-7, hereinafter may be referred to as bactericidal compound β3), 3-difluoromethyl-N-[(3R) -7-fluoro -1,1,3-trimethylindan-4-yl] -1-methylpyrazole-4-carboxamide (CAS registration number 1513466-73-3, hereinafter may be referred to as bactericidal compound β4) and N-cyclopropi -3- (difluoromethyl) -5-fluoro-N- (5-chloro-2-isopropylbenzyl) -1-methyl-1H-pyrazole-4-carboxamide (CAS registration number 1255734-28-1, hereinafter bactericidal compound a group of succinic acid dehydrogenase inhibitors.
Subgroup b-5 includes benomyl, carbendazim, fuberidazole, thiabendazole, thiophanate, thiophanate-methyl, diethofencarb, zoxamide and A group of β-tubulin polymerization inhibitors consisting of ethaboxam.
Subgroup b-6 includes ferbam, mancozeb, maneb, metyram, propineb, thiram, zineb, ziram, captan ), Captafol, folpet, chlorothalonil, tolylfluanid, guazatine, iminoctadine, anilazine, dithianon, quinomethionate or chinomethionat It is a group of multi-acting point contact active compounds consisting of quinomethionate and fluoroimide.
Subgroup b-7 includes dimethomorph, flumorph, pyrimorph, benthiavalicarb, benthivalicarb-isopropyl, iprovalicarb, variphenate ( A group of cellulose synthesis inhibitors consisting of valifenalate and mandipropamid. .
Subgroup b-8 consists of fenpiclonil, fludioxonil, chlozolinate, iprodione, procymidone and vinclozolin in MAP (mitogen-activated protein) ) / Histidine kinase inhibitor group.
Subgroup b-9 is a group of other fungicides consisting of tolclofos-methyl, oxathiapiprolin, picarbutrazox, fluopicolide and silthiofam. is there.
アザコナゾール(azaconazole)、ビテルタノール(bitertanol)、ブロムコナゾール(bromuconazole)、シプロコナゾール(cyproconazole)、ジフェノコナゾール(difenoconazole)、ジニコナゾール(diniconazole)、ジニコナゾールM(diniconazole-M)、エポキシコナゾール(epoxiconazole)、エタコナゾール(etaconazole)、フェナリモル(fenarimol)、フェンブコナゾール(fenbuconazole)、フルキンコナゾール(
fluquinconazole)、キンコナゾール(quinconazole)、フルシラゾール(flusilazole)、フルトリアホール(flutriafol)、ヘキサコナゾール(hexaconazole)、イマザリル(imazalil)、イミベンコナゾール(imibenconazole)、イプコナゾール(ipconazole)、メトコナゾール(metconazole)、ミクロブタニル(myclobutanil)、ヌアリモール(nuarimol)、オキスポコナゾール(oxpoconazole)、オキスポコナゾールフマル酸塩(oxpoconazole fumarate)、ペフラゾエート(pefurazoate)、ペンコナゾール(penconazole)、プロクロラズ(prochloraz)、プロピコナゾール(propiconazole)、プロチオコナゾール(prothioconazole)、ピリフェノックス(pyrifenox)、ピリソキサゾール(pyrisoxazole)、シメコナゾール(simeconazole)、テブコナゾール(tebuconazole)、テトラコナゾール(tetraconazole)、トリアジメホン(triadimefon)、トリアジメノール(triadimenol)、トリフルミゾール(triflumizole)、トリホリン(triforine)、トリチコナゾール(triticonazole)、アゾキシストロビン(azoxystrobin)、クモキシストロビン(coumoxystrobin)、ジモキシストロビン(dimoxystrobin)、エノキサストロビン(enoxastrobin)、ファモキサドン(famoxadone)、フェンアミドン(fenamidone)、フェナミンストロビン(fenaminstrobin)、フルフェノキシストロビン(flufenoxystrobin)、フルオキサストロビン(fluoxastrobin)、クレソキシム-メチル(kresoxim-methyl)、マンデストロビン(mandestrobin)、メトミノストロビン(metominostrobin)、オリサストロビン(orysastrobin)、ピコキシストロビン(picoxystrobin)、ピラクロストロビン(pyraclostrobin)、ピラメトストロビン(pyrametostrobin)、ピラオキシストロビン(pyraoxystrobin)、トリフロキシストロビン(trifloxystrobin)、ピリベンカルブ(pyribencarb)、トリクロピリカルブ(triclopyricarb)、シアゾファミド(cyazofamid)、アミスルブロム(amisulbrom)、ベナラキシル(benalaxyl)、ベナラキシルM(benalaxyl-M)、フララキシル(furalaxyl)、メタラキシル(metalaxyl)、メタラキシルM(metalaxyl-M)、オキサジキシル(oxadixyl)、オフラセ(ofurace)、ベノダニル(benodanil)、ベンゾビンジフルピル(benzovindiflupyr)、ビキサフェン(bixafen)、ボスカリド(boscalid)、カルボキシン(carboxin)、フェンフラム(fenfuram)、フルオピラム(fluopyram)、フルトラニル(flutolanil)、フルキサピロキサド(fluxapyroxad)、フラメトピル(furametpyr)、イソフェタミド(isofetamid)、イソピラザム(isopyrazam)、メプロニル(mepronil)、オキシカルボキシン(oxycarboxin)、ペンチオピラド(penthiopyrad)、ペンフルフェン(penflufen)、セダキサン(sedaxane)、チフルザミド(thifluzamide)、ピラジフルミド(pyraziflumid)、ピジフルメトフェン(pydiflumetofen)、ベノミル(benomyl)、カルベンダジム(carbendazim)、フベリダゾール(fuberidazole)、チアベンダゾール(thiabendazole)、チオファネート(thiophanate)、チオファネートメチル(thiophanate-methyl)、ジエトフェンカルブ(diethofencarb)、ゾキサミド(zoxamide)、エタボキサム(ethaboxam)、フェルバム(ferbam)、マンゼブ(mancozeb)、マンネブ(maneb)、メチラム(metiram)、プロピネブ(propineb)、チウラム(thiram)、ジネブ(zineb)、ジラム(ziram)、キャプタン(captan)、キャプタホール(captafol)、ホルペット(folpet)、クロロタロニル(chlorothalonil)、トリルフルアニド(tolylfluanid)、グアザチン(guazatine)、イミノクタジン(iminoctadine)、アニラジン(anilazine)、ジチアノン(dithianon)、キノメチオナート(chinomethionat or quinomethionate)、フルオルイミド(fluoroimide)、ジメトモルフ(dimethomorph)、フルモルフ(flumorph)、ピリモルフ(pyrimorph)、ベンチアバリカルブ(benthiavalicarb)、ベンチアバリカルブイソプロピル(benthivalicarb-isopropyl)、イプロバリカルブ(iprovalicarb)、バリフェナレート(valifenalate)、マンジプロパミド(mandipropamid)、フェンピクロニル(fenpiclonil)、フルジオキソニル(fludioxonil)、クロゾリネート(chlozolinate)、イプロジオン(iprodione)、プロシミドン(procymidone)、ビンクロゾリン(vinclozolin)、トルクロホスメチル(tolclofos-methyl)、オキサチアピプロリン(oxathiapiprolin)、ピカルブトラゾクス(picarbutrazox)、フルオピコリド(fluopicolide)及びシルチオファム(silthiofam)は、いずれもFRAC MoA Poster 2015(Updated Feb 2015 G. Kemmitt)等に記載された公知の化合物である。これらの化合物は市販の製剤から得るか、公知の方法により製造することにより得られる。
殺菌化合物β1及び殺菌化合物β2はいずれも公知の化合物であり、国際公開第2011/162397号に記載された方法でそれぞれ製造することができる。
殺菌化合物β3及び殺菌化合物β4はいずれも公知の化合物であり、国際公開第2012/084812号に記載された方法でそれぞれ製造することができる。
殺菌化合物β5は公知の化合物であり、国際公開第2013/160387号に記載された方法で製造することができる。 Azaconazole, bitertanol, bromuconazole, cyproconazole, difenoconazole, diiconazole, diniconazole-M, epiconconazole, ethaconazole (Etaconazole), fenarimol, fenbuconazole, fluquinconazole (
fluquinconazole), quinconazole, flusilazole, flutriafol, hexaconazole, imazalil, imibenconazole, ipconazole, metconazole, Microbutanil, nuarimol, oxpoconazole, oxpoconazole fumarate, pefurazoate, penconazole, prochloraz, propiconazole ), Prothioconazole, pyrifenox, pyrisoxazole, simeconazole, tebuconazole, tetraconazole, triazime Triadimefon, triadimenol, triflumizole, triforine, triticonazole, azoxystrobin, coumoxystrobin, dimoxist Robin (dimoxystrobin), enoxastrobin, famoxadone, fenamidone, fenaminstrobin, flufenoxystrobin, fluoxastrobin, cresoxime-methyl ( kresoxim-methyl, mandestrobin, metominostrobin, orysastrobin, picoxystrobin, pyraclostrobin, pyrametostrobin, pyraoxyst Bin (pyraoxystrobin), trifloxystrobin, pyribencarb (pyribencarb), triclopyricarb (triclopyricarb), cyazofamid (cyazofamid), amisulbrom (amisulbrom), benalaxyl (benalaxyl), benalaxyl M (benalaxyl-M) furalaxyl), metalaxyl, metalaxyl-M, oxadixyl, ofurace, benodanil, benzovindiflupyr, bixafen, boscalid, carboxy Carboxin, fenfuram, fluopyram, flutolanil, fluxapyroxad, furametpyr, furametpyr, isofetamid, isoprazam, mepronil, Oxycarboxin, penthiopyrad, penflufen, sedaxane, thifluzamide, pyraziflumid, pydiflumetofen, benomyl, carbendazim (carbendm) , Fuberidazole, thiabendazole, thiophanate, thiophanate-methyl, dietofencarb, zoxamide, ethaboxam, ferbam, mancoze, mancozeb maneb), metiram, propineb, thiram, zineb, ziram, captan, captafol, folpet, chlorotalonyl (chlorot) halonil, tolylfluanid, guazatine, iminoctadine, anilazine, dithianon, chinomethionate, fluoroimide, dimethomorph, dimethomorph ), Pyrimorph, benthiavalicarb, benthivalicarb-isopropyl, iprovalicarb, valifenalate, mandipropamid, fenpiclonil, fludioxonil (flupiclonil) fludioxonil, chlozolinate, iprodione, procymidone, vinclozolin, tolclofos-methyl, oxathiapiproline (oxath) iapiprolin), picarbutrazox, fluopicolide, and silthiofam are all known compounds described in FRAC MoA Poster 2015 (Updated Feb 2015 G. Kemmitt) and the like. These compounds can be obtained from commercially available preparations or produced by known methods.
The bactericidal compound β1 and the bactericidal compound β2 are both known compounds, and can be produced by the methods described in International Publication No. 2011/162397, respectively.
The bactericidal compound β3 and the bactericidal compound β4 are both known compounds and can be produced by the methods described in International Publication No. 2012/084812, respectively.
The bactericidal compound β5 is a known compound and can be produced by the method described in International Publication No. 2013/160387.
fluquinconazole)、キンコナゾール(quinconazole)、フルシラゾール(flusilazole)、フルトリアホール(flutriafol)、ヘキサコナゾール(hexaconazole)、イマザリル(imazalil)、イミベンコナゾール(imibenconazole)、イプコナゾール(ipconazole)、メトコナゾール(metconazole)、ミクロブタニル(myclobutanil)、ヌアリモール(nuarimol)、オキスポコナゾール(oxpoconazole)、オキスポコナゾールフマル酸塩(oxpoconazole fumarate)、ペフラゾエート(pefurazoate)、ペンコナゾール(penconazole)、プロクロラズ(prochloraz)、プロピコナゾール(propiconazole)、プロチオコナゾール(prothioconazole)、ピリフェノックス(pyrifenox)、ピリソキサゾール(pyrisoxazole)、シメコナゾール(simeconazole)、テブコナゾール(tebuconazole)、テトラコナゾール(tetraconazole)、トリアジメホン(triadimefon)、トリアジメノール(triadimenol)、トリフルミゾール(triflumizole)、トリホリン(triforine)、トリチコナゾール(triticonazole)、アゾキシストロビン(azoxystrobin)、クモキシストロビン(coumoxystrobin)、ジモキシストロビン(dimoxystrobin)、エノキサストロビン(enoxastrobin)、ファモキサドン(famoxadone)、フェンアミドン(fenamidone)、フェナミンストロビン(fenaminstrobin)、フルフェノキシストロビン(flufenoxystrobin)、フルオキサストロビン(fluoxastrobin)、クレソキシム-メチル(kresoxim-methyl)、マンデストロビン(mandestrobin)、メトミノストロビン(metominostrobin)、オリサストロビン(orysastrobin)、ピコキシストロビン(picoxystrobin)、ピラクロストロビン(pyraclostrobin)、ピラメトストロビン(pyrametostrobin)、ピラオキシストロビン(pyraoxystrobin)、トリフロキシストロビン(trifloxystrobin)、ピリベンカルブ(pyribencarb)、トリクロピリカルブ(triclopyricarb)、シアゾファミド(cyazofamid)、アミスルブロム(amisulbrom)、ベナラキシル(benalaxyl)、ベナラキシルM(benalaxyl-M)、フララキシル(furalaxyl)、メタラキシル(metalaxyl)、メタラキシルM(metalaxyl-M)、オキサジキシル(oxadixyl)、オフラセ(ofurace)、ベノダニル(benodanil)、ベンゾビンジフルピル(benzovindiflupyr)、ビキサフェン(bixafen)、ボスカリド(boscalid)、カルボキシン(carboxin)、フェンフラム(fenfuram)、フルオピラム(fluopyram)、フルトラニル(flutolanil)、フルキサピロキサド(fluxapyroxad)、フラメトピル(furametpyr)、イソフェタミド(isofetamid)、イソピラザム(isopyrazam)、メプロニル(mepronil)、オキシカルボキシン(oxycarboxin)、ペンチオピラド(penthiopyrad)、ペンフルフェン(penflufen)、セダキサン(sedaxane)、チフルザミド(thifluzamide)、ピラジフルミド(pyraziflumid)、ピジフルメトフェン(pydiflumetofen)、ベノミル(benomyl)、カルベンダジム(carbendazim)、フベリダゾール(fuberidazole)、チアベンダゾール(thiabendazole)、チオファネート(thiophanate)、チオファネートメチル(thiophanate-methyl)、ジエトフェンカルブ(diethofencarb)、ゾキサミド(zoxamide)、エタボキサム(ethaboxam)、フェルバム(ferbam)、マンゼブ(mancozeb)、マンネブ(maneb)、メチラム(metiram)、プロピネブ(propineb)、チウラム(thiram)、ジネブ(zineb)、ジラム(ziram)、キャプタン(captan)、キャプタホール(captafol)、ホルペット(folpet)、クロロタロニル(chlorothalonil)、トリルフルアニド(tolylfluanid)、グアザチン(guazatine)、イミノクタジン(iminoctadine)、アニラジン(anilazine)、ジチアノン(dithianon)、キノメチオナート(chinomethionat or quinomethionate)、フルオルイミド(fluoroimide)、ジメトモルフ(dimethomorph)、フルモルフ(flumorph)、ピリモルフ(pyrimorph)、ベンチアバリカルブ(benthiavalicarb)、ベンチアバリカルブイソプロピル(benthivalicarb-isopropyl)、イプロバリカルブ(iprovalicarb)、バリフェナレート(valifenalate)、マンジプロパミド(mandipropamid)、フェンピクロニル(fenpiclonil)、フルジオキソニル(fludioxonil)、クロゾリネート(chlozolinate)、イプロジオン(iprodione)、プロシミドン(procymidone)、ビンクロゾリン(vinclozolin)、トルクロホスメチル(tolclofos-methyl)、オキサチアピプロリン(oxathiapiprolin)、ピカルブトラゾクス(picarbutrazox)、フルオピコリド(fluopicolide)及びシルチオファム(silthiofam)は、いずれもFRAC MoA Poster 2015(Updated Feb 2015 G. Kemmitt)等に記載された公知の化合物である。これらの化合物は市販の製剤から得るか、公知の方法により製造することにより得られる。
殺菌化合物β1及び殺菌化合物β2はいずれも公知の化合物であり、国際公開第2011/162397号に記載された方法でそれぞれ製造することができる。
殺菌化合物β3及び殺菌化合物β4はいずれも公知の化合物であり、国際公開第2012/084812号に記載された方法でそれぞれ製造することができる。
殺菌化合物β5は公知の化合物であり、国際公開第2013/160387号に記載された方法で製造することができる。 Azaconazole, bitertanol, bromuconazole, cyproconazole, difenoconazole, diiconazole, diniconazole-M, epiconconazole, ethaconazole (Etaconazole), fenarimol, fenbuconazole, fluquinconazole (
fluquinconazole), quinconazole, flusilazole, flutriafol, hexaconazole, imazalil, imibenconazole, ipconazole, metconazole, Microbutanil, nuarimol, oxpoconazole, oxpoconazole fumarate, pefurazoate, penconazole, prochloraz, propiconazole ), Prothioconazole, pyrifenox, pyrisoxazole, simeconazole, tebuconazole, tetraconazole, triazime Triadimefon, triadimenol, triflumizole, triforine, triticonazole, azoxystrobin, coumoxystrobin, dimoxist Robin (dimoxystrobin), enoxastrobin, famoxadone, fenamidone, fenaminstrobin, flufenoxystrobin, fluoxastrobin, cresoxime-methyl ( kresoxim-methyl, mandestrobin, metominostrobin, orysastrobin, picoxystrobin, pyraclostrobin, pyrametostrobin, pyraoxyst Bin (pyraoxystrobin), trifloxystrobin, pyribencarb (pyribencarb), triclopyricarb (triclopyricarb), cyazofamid (cyazofamid), amisulbrom (amisulbrom), benalaxyl (benalaxyl), benalaxyl M (benalaxyl-M) furalaxyl), metalaxyl, metalaxyl-M, oxadixyl, ofurace, benodanil, benzovindiflupyr, bixafen, boscalid, carboxy Carboxin, fenfuram, fluopyram, flutolanil, fluxapyroxad, furametpyr, furametpyr, isofetamid, isoprazam, mepronil, Oxycarboxin, penthiopyrad, penflufen, sedaxane, thifluzamide, pyraziflumid, pydiflumetofen, benomyl, carbendazim (carbendm) , Fuberidazole, thiabendazole, thiophanate, thiophanate-methyl, dietofencarb, zoxamide, ethaboxam, ferbam, mancoze, mancozeb maneb), metiram, propineb, thiram, zineb, ziram, captan, captafol, folpet, chlorotalonyl (chlorot) halonil, tolylfluanid, guazatine, iminoctadine, anilazine, dithianon, chinomethionate, fluoroimide, dimethomorph, dimethomorph ), Pyrimorph, benthiavalicarb, benthivalicarb-isopropyl, iprovalicarb, valifenalate, mandipropamid, fenpiclonil, fludioxonil (flupiclonil) fludioxonil, chlozolinate, iprodione, procymidone, vinclozolin, tolclofos-methyl, oxathiapiproline (oxath) iapiprolin), picarbutrazox, fluopicolide, and silthiofam are all known compounds described in FRAC MoA Poster 2015 (Updated Feb 2015 G. Kemmitt) and the like. These compounds can be obtained from commercially available preparations or produced by known methods.
The bactericidal compound β1 and the bactericidal compound β2 are both known compounds, and can be produced by the methods described in International Publication No. 2011/162397, respectively.
The bactericidal compound β3 and the bactericidal compound β4 are both known compounds and can be produced by the methods described in International Publication No. 2012/084812, respectively.
The bactericidal compound β5 is a known compound and can be produced by the method described in International Publication No. 2013/160387.
好ましくは、本化合物は、殺虫化合物α、クロチアニジン、ジクロロメゾチアズ、フルピラジフロン、イミダクロプリド、チアクロプリド、チアメトキサム、トリフルメゾピリム、テフルトリン、ブロフラニリド、フィプロニル、フルキサメタミド、クロラントラニリプロール、シアントラニリプロール、テトラニリプロール、アバメクチン、フルアザインドリジン、チオキサザフェン、バチルス・アミロリケファシエンス、バチルス・フィルムス、ジフェノコナゾール、フルトリアホール、イプコナゾール、メトコナゾール、プロチオコナゾール、テブコナゾール、テトラコナゾール、トリアジメノール、トリチコナゾール、アゾキシストロビン、フェンアミドン、フルオキサストロビン、マンデストロビン、ピコキシストロビン、ピラクロストロビン、トリフロキシストロビン、メタラキシルM、メタラキシル、ボスカリド、フルオピラム、フルトラニル、フルキサピロキサド、ペンフルフェン、ペンチオピラド、殺菌化合物β2、セダキサン、エタボキサム、チアベンダゾール、チウラム、フルジオキソニル、オキサチアピプロリン、ピカルブトラゾクス、シルチオファム及びトルクロホスメチルからなる群より選ばれる1種以上の化合物である。
好ましくは、本化合物は、クロチアニジン、イミダクロプリド、チアメトキサム、ジフェノコナゾール、フルトリアホール、イプコナゾール、メトコナゾール、プロチオコナゾール、テブコナゾール、トリアジメノール、トリチコナゾール、アゾキシストロビン、フルオキサストロビン、マンデストロビン、ピコキシストロビン、ピラクロストロビン、トリフロキシストロビン、メタラキシルM、メタラキシル、フルオピラム、フルトラニル、フルキサピロキサド、ペンフルフェン、ペンチオピラド、殺菌化合物β2、セダキサン、エタボキサム、フルジオキソニル及びオキサチアピプロリンからなる群より選ばれる1種以上の化合物である。
好ましくは、本化合物は、殺虫化合物α、クロチアニジン、ジクロロメゾチアズ、フルピラジフロン、イミダクロプリド、チアクロプリド、チアメトキサム、トリフルメゾピリム、テフルトリン、ブロフラニリド、フィプロニル、フルキサメタミド、クロラントラニリプロール、シアントラニリプロール、テトラニリプロール、アバメクチン、フルアザインドリジン、チオキサザフェン、バチルス・アミロリケファシエンス及びバチルス・フィルムスからなる群より選ばれる1種以上の化合物である。
好ましくは、本化合物は、クロチアニジン、イミダクロプリド及びチアメトキサムからなる群より選ばれる1種以上の化合物である。
好ましくは、本化合物は、ジフェノコナゾール、フルトリアホール、イプコナゾール、メトコナゾール、プロチオコナゾール、テブコナゾール、テトラコナゾール、トリアジメノール、トリチコナゾール、アゾキシストロビン、フェンアミドン、フルオキサストロビン、マンデストロビン、ピコキシストロビン、ピラクロストロビン、トリフロキシストロビン、メタラキシルM、メタラキシル、ボスカリド、フルオピラム、フルトラニル、フルキサピロキサド、ペンフルフェン、ペンチオピラド、殺菌化合物β2、セダキサン、エタボキサム、チアベンダゾール、チウラム、フルジオキソニル、オキサチアピプロリン、ピカルブトラゾクス、シルチオファム及びトルクロホスメチルからなる群より選ばれる1種以上の化合物である。
好ましくは、本化合物は、ジフェノコナゾール、フルトリアホール、イプコナゾール、メトコナゾール、プロチオコナゾール、テブコナゾール、トリアジメノール、トリチコナゾール、アゾキシストロビン、フルオキサストロビン、マンデストロビン、ピコキシストロビン、ピラクロストロビン、トリフロキシストロビン、メタラキシルM、メタラキシル、フルオピラム、フルトラニル、フルキサピロキサド、ペンフルフェン、ペンチオピラド、殺菌化合物β2、セダキサン、エタボキサム、フルジオキソニル及びオキサチアピプロリンからなる群より選ばれる1種以上の化合物である。 Preferably, the compound is an insecticidal compound α, clothianidin, dichloromezothiaz, flupirazifuron, imidacloprid, thiacloprid, thiamethoxam, triflumezopyrim, tefluthrin, brofuranilide, fipronil, floxamethamide, chlorantraniliprole, cyantraniliprole, tetra Niliprol, Abamectin, Fluazaindolizine, Thioxazafen, Bacillus amyloliquefaciens, Bacillus films, Difenoconazole, Flutriahol, Ipconazole, Metoconazole, Prothioconazole, Tebuconazole, Tetraconazole, Triazimenol, Tritico Nazole, azoxystrobin, phenamidon, floxastrobin, mandestrobin, picoxystrobin, pirak Strobin, trifloxystrobin, metalaxyl M, metalaxyl, boscalid, fluopyram, flutolanil, fluxapyroxad, penflufen, penthiopyrad, bactericidal compound β2, sedaxane, ethaboxam, thiabendazole, thiuram, fludioxonil, oxathiapiproline, picalbutrazox And one or more compounds selected from the group consisting of silthiofam and tolcrofosmethyl.
Preferably, the compound is clothianidin, imidacloprid, thiamethoxam, difenoconazole, flutriahole, ipconazole, metconazole, prothioconazole, tebuconazole, triazimenol, triticonazole, azoxystrobin, floxastrobin, mandestrobin , Picoxystrobin, pyraclostrobin, trifloxystrobin, metalaxyl M, metalaxyl, fluopyram, flutolanil, fluxapyroxad, penflufen, penthiopyrad, bactericidal compound β2, cedaxane, ethaboxam, fludioxonil and oxathiapiproline It is one or more types of compounds selected from.
Preferably, the compound is an insecticidal compound α, clothianidin, dichloromezothiaz, flupirazifuron, imidacloprid, thiacloprid, thiamethoxam, triflumezopyrim, tefluthrin, brofuranilide, fipronil, floxamethamide, chlorantraniliprole, cyantraniliprole, tetra It is one or more compounds selected from the group consisting of niliprol, abamectin, fluazaindolizine, thioxazaphene, Bacillus amyloliquefaciens and Bacillus films.
Preferably, the compound is one or more compounds selected from the group consisting of clothianidin, imidacloprid and thiamethoxam.
Preferably, the compound is difenoconazole, flutriazole, ipconazole, metconazole, prothioconazole, tebuconazole, tetraconazole, triadimenol, triticonazole, azoxystrobin, fenamidone, floxastrobin, mandest Robin, picoxystrobin, pyraclostrobin, trifloxystrobin, metalaxyl M, metalaxyl, boscalid, fluopyram, flutolanil, fluxapyroxad, penflufen, penthiopyrad, bactericidal compound β2, sedaxane, ethaboxam, thiabendazole, thiuram, fludioxonil, One or more compounds selected from the group consisting of oxathiapiproline, picalbutrazox, silthiofam, and tolcrofosmethyl.
Preferably, the compound is difenoconazole, flutriazole, ipconazole, metconazole, prothioconazole, tebuconazole, triazimenol, triticonazole, azoxystrobin, floxastrobin, mandestrobin, picoxystrobin, One or more selected from the group consisting of pyraclostrobin, trifloxystrobin, metalaxyl M, metalaxyl, fluopyram, flutolanil, floxapyroxad, penflufen, penthiopyrad, bactericidal compound β2, sedaxane, ethaboxam, fludioxonil and oxathiapiproline It is a compound of this.
好ましくは、本化合物は、クロチアニジン、イミダクロプリド、チアメトキサム、ジフェノコナゾール、フルトリアホール、イプコナゾール、メトコナゾール、プロチオコナゾール、テブコナゾール、トリアジメノール、トリチコナゾール、アゾキシストロビン、フルオキサストロビン、マンデストロビン、ピコキシストロビン、ピラクロストロビン、トリフロキシストロビン、メタラキシルM、メタラキシル、フルオピラム、フルトラニル、フルキサピロキサド、ペンフルフェン、ペンチオピラド、殺菌化合物β2、セダキサン、エタボキサム、フルジオキソニル及びオキサチアピプロリンからなる群より選ばれる1種以上の化合物である。
好ましくは、本化合物は、殺虫化合物α、クロチアニジン、ジクロロメゾチアズ、フルピラジフロン、イミダクロプリド、チアクロプリド、チアメトキサム、トリフルメゾピリム、テフルトリン、ブロフラニリド、フィプロニル、フルキサメタミド、クロラントラニリプロール、シアントラニリプロール、テトラニリプロール、アバメクチン、フルアザインドリジン、チオキサザフェン、バチルス・アミロリケファシエンス及びバチルス・フィルムスからなる群より選ばれる1種以上の化合物である。
好ましくは、本化合物は、クロチアニジン、イミダクロプリド及びチアメトキサムからなる群より選ばれる1種以上の化合物である。
好ましくは、本化合物は、ジフェノコナゾール、フルトリアホール、イプコナゾール、メトコナゾール、プロチオコナゾール、テブコナゾール、テトラコナゾール、トリアジメノール、トリチコナゾール、アゾキシストロビン、フェンアミドン、フルオキサストロビン、マンデストロビン、ピコキシストロビン、ピラクロストロビン、トリフロキシストロビン、メタラキシルM、メタラキシル、ボスカリド、フルオピラム、フルトラニル、フルキサピロキサド、ペンフルフェン、ペンチオピラド、殺菌化合物β2、セダキサン、エタボキサム、チアベンダゾール、チウラム、フルジオキソニル、オキサチアピプロリン、ピカルブトラゾクス、シルチオファム及びトルクロホスメチルからなる群より選ばれる1種以上の化合物である。
好ましくは、本化合物は、ジフェノコナゾール、フルトリアホール、イプコナゾール、メトコナゾール、プロチオコナゾール、テブコナゾール、トリアジメノール、トリチコナゾール、アゾキシストロビン、フルオキサストロビン、マンデストロビン、ピコキシストロビン、ピラクロストロビン、トリフロキシストロビン、メタラキシルM、メタラキシル、フルオピラム、フルトラニル、フルキサピロキサド、ペンフルフェン、ペンチオピラド、殺菌化合物β2、セダキサン、エタボキサム、フルジオキソニル及びオキサチアピプロリンからなる群より選ばれる1種以上の化合物である。 Preferably, the compound is an insecticidal compound α, clothianidin, dichloromezothiaz, flupirazifuron, imidacloprid, thiacloprid, thiamethoxam, triflumezopyrim, tefluthrin, brofuranilide, fipronil, floxamethamide, chlorantraniliprole, cyantraniliprole, tetra Niliprol, Abamectin, Fluazaindolizine, Thioxazafen, Bacillus amyloliquefaciens, Bacillus films, Difenoconazole, Flutriahol, Ipconazole, Metoconazole, Prothioconazole, Tebuconazole, Tetraconazole, Triazimenol, Tritico Nazole, azoxystrobin, phenamidon, floxastrobin, mandestrobin, picoxystrobin, pirak Strobin, trifloxystrobin, metalaxyl M, metalaxyl, boscalid, fluopyram, flutolanil, fluxapyroxad, penflufen, penthiopyrad, bactericidal compound β2, sedaxane, ethaboxam, thiabendazole, thiuram, fludioxonil, oxathiapiproline, picalbutrazox And one or more compounds selected from the group consisting of silthiofam and tolcrofosmethyl.
Preferably, the compound is clothianidin, imidacloprid, thiamethoxam, difenoconazole, flutriahole, ipconazole, metconazole, prothioconazole, tebuconazole, triazimenol, triticonazole, azoxystrobin, floxastrobin, mandestrobin , Picoxystrobin, pyraclostrobin, trifloxystrobin, metalaxyl M, metalaxyl, fluopyram, flutolanil, fluxapyroxad, penflufen, penthiopyrad, bactericidal compound β2, cedaxane, ethaboxam, fludioxonil and oxathiapiproline It is one or more types of compounds selected from.
Preferably, the compound is an insecticidal compound α, clothianidin, dichloromezothiaz, flupirazifuron, imidacloprid, thiacloprid, thiamethoxam, triflumezopyrim, tefluthrin, brofuranilide, fipronil, floxamethamide, chlorantraniliprole, cyantraniliprole, tetra It is one or more compounds selected from the group consisting of niliprol, abamectin, fluazaindolizine, thioxazaphene, Bacillus amyloliquefaciens and Bacillus films.
Preferably, the compound is one or more compounds selected from the group consisting of clothianidin, imidacloprid and thiamethoxam.
Preferably, the compound is difenoconazole, flutriazole, ipconazole, metconazole, prothioconazole, tebuconazole, tetraconazole, triadimenol, triticonazole, azoxystrobin, fenamidone, floxastrobin, mandest Robin, picoxystrobin, pyraclostrobin, trifloxystrobin, metalaxyl M, metalaxyl, boscalid, fluopyram, flutolanil, fluxapyroxad, penflufen, penthiopyrad, bactericidal compound β2, sedaxane, ethaboxam, thiabendazole, thiuram, fludioxonil, One or more compounds selected from the group consisting of oxathiapiproline, picalbutrazox, silthiofam, and tolcrofosmethyl.
Preferably, the compound is difenoconazole, flutriazole, ipconazole, metconazole, prothioconazole, tebuconazole, triazimenol, triticonazole, azoxystrobin, floxastrobin, mandestrobin, picoxystrobin, One or more selected from the group consisting of pyraclostrobin, trifloxystrobin, metalaxyl M, metalaxyl, fluopyram, flutolanil, floxapyroxad, penflufen, penthiopyrad, bactericidal compound β2, sedaxane, ethaboxam, fludioxonil and oxathiapiproline It is a compound of this.
以下に、本発明組成物における、本ビピリジン化合物と本化合物との組合せの例を記載する。ただし、SXの略号は「化合物群SX1~SX46から選ばれるいずれか1つの本ビピリジン化合物」を意味する。
アセタミプリド+SX、クロチアニジン+SX、ジノテフラン+SX、イミダクロプリド+SX、ニテンピラム+SX、チアクロプリド+SX、チアメトキサム+SX、フルピラジフロン+SX、スルホキサフロル+SX、トリフルメゾピリム+SX、ジクロロメソチアズ+SX、殺虫化合物α+SX、
アクリナトリン+SX、アレスリン+SX、ビフェントリン+SX、カッパビフェントリン+SX、ビオアレスリン+SX、ビオレスメトリン+SX、シクロプロトリン+SX、シフルトリン+SX、ベータ-シフルトリン+SX、シハロトリン+SX、ガンマシハロトリン+SX、ラムダシハロトリン+SX、シペルメトリン+SX、アルファシペルメトリン+SX、べータシペルメトリン+SX、シータシペルメトリン+SX、ゼータシペルメトリン+SX、シグマシペルメトリン+SX、シフェノトリン+SX、デルタメトリン+SX、エンペントリン+SX、エスフェンバレレート+SX、エトフェンプロックス+SX、フェンプロパトリン+SX、フェンバレレート+SX、フルシトリネート+SX、フルメトリン+SX、フルバリネート+SX、タウフルバリネート+SX、ハルフェンプロックス+SX、ヘプタフルトリン+SX、イミプロトリン+SX、カデスリン+SX、メペルフルトリン+SX、モンフルオロトリン+SX、ペルメトリン+SX、フェノトリン+SX、プラレトリン+SX、ピレトリン+SX、レスメトリン+SX、シラフルオフェン+SX、テフルトリン+SX、カッパテフルトリン+SX、テトラメトリン+SX、テトラメチルフルトリン+SX、トラロメトリン+SX、トランスフルトリン+SX、ベンフルトリン+SX、フルフェンプロックス+SX、フルメスリン+SX、フラメトリン+SX、メトフルトリン+SX、プロフルトリン+SX、ジメフルトリン+SX、
エチプロール+SX、フィプロニル+SX、フルフィプロール+SX、アフォクソラネル+SX、フルララネル+SX、ブロフラニリド+SX、フルキサメタミド+SX、
クロラントラニリプロール+SX、シアントラニルプロール+SX、シクラニリプロール+SX、フルベンジアミド+SX、テトラニリプロール+SX、シハロジアミド+SX、
アラニカルブ+SX、アルジカルブ+SX、ベンダイオカルブ+SX、ベンフラカルブ+SX、ブトカルボキシム+SX、ブトキシカルボキシム+SX、カルバリル+SX、カルボフラン+SX、カルボスルファン+SX、エチオフェンカルブ+SX、フェノブカルブ+SX、ホルメタネート+SX、フラチオカルブ+SX、イソプロカルブ+SX、メチオカルブ+SX、メソミル+SX、メトルカルブ+SX、オキサミル+SX、ピリミカーブ+SX、プロポキスル+SX、チオジカルブ+SX、チオファノックス+SX、トリアザメート+SX、トリメタカルブ+SX、XMC+SX、キシリルカルブ+SX、
アバメクチン+SX、フルエンスルホン+SX、チオキサザフェン+SX、フルアザインドリジン+SX、
菌根菌+SX、アルスロボトリス・ダクチロイデス+SX、バチルス・チューリンゲンシス+SX、バチルス・フィルムス+SX、バチルス・メガテリウム+SX、バチルス・アミロリケファシエンス+SX、ヒルステラ・ロッシリエンシス+SX、ヒルステラ・ミネソテンシス+SX、モナクロスポリウム・フィマトパガム+SX、パスツーリア・ニシザワエ+SX、パスツーリア・ペネトランス+SX、パスツーリア・ウスガエ+SX、バーティシリウム・クラミドスポリウム+SX、ハーピンタンパク+SX、アーバスキュラー菌根菌+SX、グロマス属菌+SX、グロマス・イントララディセス+SX、グロマス・モッセ+SX、グロマス・アグリゲイツム+SX、グロマス・エツニカツム+SX、 Below, the example of the combination of this bipyridine compound and this compound in this invention composition is described. However, the abbreviation for SX means “any one of the present bipyridine compounds selected from the compound group SX1 to SX46”.
Acetamiprid + SX, clothianidin + SX, dinotefuran + SX, imidacloprid + SX, nitenpyram + SX, thiacloprid + SX, thiamethoxam + SX, flupiradiflon + SX, sulfoxafurol + SX, triflumezopyrim + SX, dichloromesothiaz compound + SX
Acrinatrin + SX, Aresulin + SX, Bifenthrin + SX, Kappa Bifenthrin + SX, Bioaresulin + SX, Bioresmethrin + SX, Cycloproton + SX, Cyfluthrin + SX, Beta-Cyfluthrin + SX, Cyhalothrin + SX, Gamma Cyhalothrin X SX, Gamma Cyhalothrin X SX + SX, alphacypermethrin + SX, betacypermethrin + SX, thetacypermethrin + SX, zetacypermethrin + SX, sigmacipermethrin + SX, ciphenothrin + SX, deltamethrin + SX, empentrin + SX, esfenvalerate + SX, ethofenprofenprox Thrin + SX, fenvalerate + SX, flucitrinate + SX, flumethrin + SX, fluva Nate + SX, Taufulvalinate + SX, Halfenprox + SX, Heptafluthrin + SX, Imiprothrin + SX, Kadeslin + SX, Meperfluthrin + SX, Monfluorotrin + SX, Permethrin + SX, Phetothrin + SX, Praretrin + SX, Pyrethrin + SX, Pyrethrin + SX Tefluthrin + SX, kappatefluthrin + SX, tetramethrin + SX, tetramethylfurthrin + SX, tralomethrin + SX, transfluthrin + SX, benfurthrin + SX, flufenprox + SX, flumethrin + SX, flamethrin + SX, methfluthrin + SX, proflutriline + SX
Etiprol + SX, fipronil + SX, flupiprol + SX, afoxolanel + SX, fluralanel + SX, brofuranilide + SX, floxamethamide + SX,
Chlorantraniliprole + SX, cyantranylprolol + SX, cyclaniliprol + SX, fulvendiamide + SX, tetraniprolol + SX, cyhalodiamide + SX,
Aranicarb + SX, Aldicarb + SX, Bendiocarb + SX, Benfuracarb + SX, Butcarboxyme + SX, Butoxycarboxyme + SX, Carbaryl + SX, Carbofuran + SX, Carbosulfan + SX, Ethiophene carb + SX, Fenthiocarb + SX, Formethanate + carb, SX Methiocarb + SX, Mesomil + SX, Metorcarb + SX, Oxamyl + SX, Pirimicurve + SX, Propoxyl + SX, Thiodicarb + SX, Thiophanox + SX, Triazamate + SX, Trimetacarb + SX, XMC + SX, Xylylcarb + SX,
Abamectin + SX, fluenesulfone + SX, thioxazaphen + SX, fluazaindolizine + SX,
Mycorrhizal fungi + SX, Arthrobotris dactylides + SX, Bacillus thuringiensis + SX, Bacillus films + SX, Bacillus megaterium + SX, Bacillus amyloliquefaciens + SX, Hilstera rossiliensis + SX, Hilstera minneso Crospodium fimatopagum + SX, Pasteuria Nishizawa + SX, Pasteuria penetrans + SX, Pasteuria Usugae + SX, Verticillium Chlamydosporium + SX, Harpin protein + SX, Arbuscular mycorrhizal fungus + SX, Gross genus + SX, Gross Intraradices + SX, Gross Mosse + SX, Gross Aggregate + SX, Gross Etnicatum + SX,
アセタミプリド+SX、クロチアニジン+SX、ジノテフラン+SX、イミダクロプリド+SX、ニテンピラム+SX、チアクロプリド+SX、チアメトキサム+SX、フルピラジフロン+SX、スルホキサフロル+SX、トリフルメゾピリム+SX、ジクロロメソチアズ+SX、殺虫化合物α+SX、
アクリナトリン+SX、アレスリン+SX、ビフェントリン+SX、カッパビフェントリン+SX、ビオアレスリン+SX、ビオレスメトリン+SX、シクロプロトリン+SX、シフルトリン+SX、ベータ-シフルトリン+SX、シハロトリン+SX、ガンマシハロトリン+SX、ラムダシハロトリン+SX、シペルメトリン+SX、アルファシペルメトリン+SX、べータシペルメトリン+SX、シータシペルメトリン+SX、ゼータシペルメトリン+SX、シグマシペルメトリン+SX、シフェノトリン+SX、デルタメトリン+SX、エンペントリン+SX、エスフェンバレレート+SX、エトフェンプロックス+SX、フェンプロパトリン+SX、フェンバレレート+SX、フルシトリネート+SX、フルメトリン+SX、フルバリネート+SX、タウフルバリネート+SX、ハルフェンプロックス+SX、ヘプタフルトリン+SX、イミプロトリン+SX、カデスリン+SX、メペルフルトリン+SX、モンフルオロトリン+SX、ペルメトリン+SX、フェノトリン+SX、プラレトリン+SX、ピレトリン+SX、レスメトリン+SX、シラフルオフェン+SX、テフルトリン+SX、カッパテフルトリン+SX、テトラメトリン+SX、テトラメチルフルトリン+SX、トラロメトリン+SX、トランスフルトリン+SX、ベンフルトリン+SX、フルフェンプロックス+SX、フルメスリン+SX、フラメトリン+SX、メトフルトリン+SX、プロフルトリン+SX、ジメフルトリン+SX、
エチプロール+SX、フィプロニル+SX、フルフィプロール+SX、アフォクソラネル+SX、フルララネル+SX、ブロフラニリド+SX、フルキサメタミド+SX、
クロラントラニリプロール+SX、シアントラニルプロール+SX、シクラニリプロール+SX、フルベンジアミド+SX、テトラニリプロール+SX、シハロジアミド+SX、
アラニカルブ+SX、アルジカルブ+SX、ベンダイオカルブ+SX、ベンフラカルブ+SX、ブトカルボキシム+SX、ブトキシカルボキシム+SX、カルバリル+SX、カルボフラン+SX、カルボスルファン+SX、エチオフェンカルブ+SX、フェノブカルブ+SX、ホルメタネート+SX、フラチオカルブ+SX、イソプロカルブ+SX、メチオカルブ+SX、メソミル+SX、メトルカルブ+SX、オキサミル+SX、ピリミカーブ+SX、プロポキスル+SX、チオジカルブ+SX、チオファノックス+SX、トリアザメート+SX、トリメタカルブ+SX、XMC+SX、キシリルカルブ+SX、
アバメクチン+SX、フルエンスルホン+SX、チオキサザフェン+SX、フルアザインドリジン+SX、
菌根菌+SX、アルスロボトリス・ダクチロイデス+SX、バチルス・チューリンゲンシス+SX、バチルス・フィルムス+SX、バチルス・メガテリウム+SX、バチルス・アミロリケファシエンス+SX、ヒルステラ・ロッシリエンシス+SX、ヒルステラ・ミネソテンシス+SX、モナクロスポリウム・フィマトパガム+SX、パスツーリア・ニシザワエ+SX、パスツーリア・ペネトランス+SX、パスツーリア・ウスガエ+SX、バーティシリウム・クラミドスポリウム+SX、ハーピンタンパク+SX、アーバスキュラー菌根菌+SX、グロマス属菌+SX、グロマス・イントララディセス+SX、グロマス・モッセ+SX、グロマス・アグリゲイツム+SX、グロマス・エツニカツム+SX、 Below, the example of the combination of this bipyridine compound and this compound in this invention composition is described. However, the abbreviation for SX means “any one of the present bipyridine compounds selected from the compound group SX1 to SX46”.
Acetamiprid + SX, clothianidin + SX, dinotefuran + SX, imidacloprid + SX, nitenpyram + SX, thiacloprid + SX, thiamethoxam + SX, flupiradiflon + SX, sulfoxafurol + SX, triflumezopyrim + SX, dichloromesothiaz compound + SX
Acrinatrin + SX, Aresulin + SX, Bifenthrin + SX, Kappa Bifenthrin + SX, Bioaresulin + SX, Bioresmethrin + SX, Cycloproton + SX, Cyfluthrin + SX, Beta-Cyfluthrin + SX, Cyhalothrin + SX, Gamma Cyhalothrin X SX, Gamma Cyhalothrin X SX + SX, alphacypermethrin + SX, betacypermethrin + SX, thetacypermethrin + SX, zetacypermethrin + SX, sigmacipermethrin + SX, ciphenothrin + SX, deltamethrin + SX, empentrin + SX, esfenvalerate + SX, ethofenprofenprox Thrin + SX, fenvalerate + SX, flucitrinate + SX, flumethrin + SX, fluva Nate + SX, Taufulvalinate + SX, Halfenprox + SX, Heptafluthrin + SX, Imiprothrin + SX, Kadeslin + SX, Meperfluthrin + SX, Monfluorotrin + SX, Permethrin + SX, Phetothrin + SX, Praretrin + SX, Pyrethrin + SX, Pyrethrin + SX Tefluthrin + SX, kappatefluthrin + SX, tetramethrin + SX, tetramethylfurthrin + SX, tralomethrin + SX, transfluthrin + SX, benfurthrin + SX, flufenprox + SX, flumethrin + SX, flamethrin + SX, methfluthrin + SX, proflutriline + SX
Etiprol + SX, fipronil + SX, flupiprol + SX, afoxolanel + SX, fluralanel + SX, brofuranilide + SX, floxamethamide + SX,
Chlorantraniliprole + SX, cyantranylprolol + SX, cyclaniliprol + SX, fulvendiamide + SX, tetraniprolol + SX, cyhalodiamide + SX,
Aranicarb + SX, Aldicarb + SX, Bendiocarb + SX, Benfuracarb + SX, Butcarboxyme + SX, Butoxycarboxyme + SX, Carbaryl + SX, Carbofuran + SX, Carbosulfan + SX, Ethiophene carb + SX, Fenthiocarb + SX, Formethanate + carb, SX Methiocarb + SX, Mesomil + SX, Metorcarb + SX, Oxamyl + SX, Pirimicurve + SX, Propoxyl + SX, Thiodicarb + SX, Thiophanox + SX, Triazamate + SX, Trimetacarb + SX, XMC + SX, Xylylcarb + SX,
Abamectin + SX, fluenesulfone + SX, thioxazaphen + SX, fluazaindolizine + SX,
Mycorrhizal fungi + SX, Arthrobotris dactylides + SX, Bacillus thuringiensis + SX, Bacillus films + SX, Bacillus megaterium + SX, Bacillus amyloliquefaciens + SX, Hilstera rossiliensis + SX, Hilstera minneso Crospodium fimatopagum + SX, Pasteuria Nishizawa + SX, Pasteuria penetrans + SX, Pasteuria Usugae + SX, Verticillium Chlamydosporium + SX, Harpin protein + SX, Arbuscular mycorrhizal fungus + SX, Gross genus + SX, Gross Intraradices + SX, Gross Mosse + SX, Gross Aggregate + SX, Gross Etnicatum + SX,
アザコナゾール+SX、ビテルタノール+SX、ブロムコナゾール+SX、シプロコナゾール+SX、ジフェノコナゾール+SX、ジニコナゾール+SX、ジニコナゾールM+SX、エポキシコナゾール+SX、エタコナゾール+SX、フェナリモル+SX、フェンブコナゾール+SX、フルキンコナゾール+SX、キンコナゾール+SX、フルシラゾール+SX、フルトリアホール+SX、ヘキサコナゾール+SX、イマザリル+SX、イミベンコナゾール+SX、イプコナゾール+SX、メトコナゾール+SX、ミクロブタニル+SX、ヌアリモール+SX、オキスポコナゾール+SX、オキスポコナゾールフマル酸塩+SX、ペフラゾエート+SX、ペンコナゾール+SX、プロクロラズ+SX、プロピコナゾール+SX、プロチオコナゾール+SX、ピリフェノックス+SX、ピリソキサゾール+SX、シメコナゾール+SX、テブコナゾール+SX、テトラコナゾール+SX、トリアジメホン+SX、トリアジメノール+SX、トリフルミゾール+SX、トリホリン+SX、トリチコナゾール+SX、
アゾキシストロビン+SX、クモキシストロビン+SX、ジモキシストロビン+SX、エノキサストロビン+SX、ファモキサドン+SX、フェンアミドン+SX、フェナミンストロビン+SX、フルフェノキシストロビン+SX、フルオキサストロビン+SX、クレソキシム-メチル+SX、マンデストロビン+SX、メトミノストロビン+SX、オリサストロビン+SX、ピコキシストロビン+SX、ピラクロストロビン+SX、ピラメトストロビン+SX、ピラオキシストロビン+SX、ピリベンカルブ+SX、トリクロピリカルブ+SX、シアゾファミド+SX、アミスルブロム+SX、
ベナラキシル+SX、ベナラキシルM+SX、フララキシル+SX、メタラキシル+SX、メタラキシルM+SX、オキサジキシル+SX、オフラセ+SX、
ベノダニル+SX、ベンゾビンジフルピル+SX、ビキサフェン+SX、ボスカリド+SX、カルボキシン+SX、フェンフラム+SX、フルオピラム+SX、フルトラニル+SX、フルキサピロキサド+SX、フラメトピル+SX、イソフェタミド+SX、イソピラザム+SX、メプロニル+SX、オキシカルボキシン+SX、ペンチオピラド+SX、ペンフルフェン+SX、セダキサン+SX、チフルザミド+SX、ピラジフルミド+SX、ピジフルメトフェン+SX、殺菌化合物β1+SX、殺菌化合物β2+SX、殺菌化合物β3+SX、殺菌化合物β4+SX、殺菌化合物β5+SX、
ベノミル+SX、カルベンダジム+SX、フベリダゾール+SX、チアベンダゾール+SX、チオファネート+SX、チオファネートメチル+SX、ジエトフェンカルブ+SX、ゾキサミド+SX、エタボキサム+SX、
フェルバム+SX、マンゼブ+SX、マンネブ+SX、メチラム+SX、プロピネブ+SX、チウラム+SX、ジネブ及びジラム+SX、キャプタン+SX、キャプタホール+SX、ホルペット+SX、クロロタロニル+SX、トリルフルアニド+SX、グアザチン+SX、イミノクタジン+SX、アニラジン+SX、ジチアノン+SX、キノメチオナート+SX、フルオルイミド+SX、
ジメトモルフ+SX、フルモルフ+SX、ピリモルフ+SX、ベンチアバリカルブ+SX、ベンチアバリカルブイソプロピル+SX、イプロバリカルブ+SX、バリフェナレート+SX、マンジプロパミド+SX、
フェンピクロニル+SX、フルジオキソニル+SX、クロゾリネート+SX、イプロジオン+SX、プロシミドン+SX、ビンクロゾリン+SX、トルクロホスメチル+SX、オキサチアピプロリン+SX、ピカルブトラゾクス+SX、フルオピコリド+SX、シルチオファム+SX。 Azaconazole + SX, Viteltanol + SX, Bromuconazole + SX, Cyproconazole + SX, Difenoconazole + SX, Diniconazole + SX, Diniconazole M + SX, Epoxyconazole + SX, Etaconazole + SX, Fenarimol + SX, Fenbuconazole + SX, Flubuconazole X Flusilazole + SX, flutriazole + SX, hexaconazole + SX, imazalil + SX, imibenconazole + SX, ipconazole + SX, metconazole + SX, microbutanyl + SX, nuarimol + SX, oxpoconazole + SX, oxpoconazole fumarate + SX, pefrazoate + SX , Penconazole + SX, prochloraz + SX, propiconazole + SX, prothiocona Zole + SX, Pyrifenox + SX, Pyrioxazole + SX, Cimeconazole + SX, Tebuconazole + SX, Tetraconazole + SX, Triadimephone + SX, Triadimenol + SX, Triflumizole + SX, Triphorine + SX, Triticonazole + SX,
Azoxystrobin + SX, umoxistrobin + SX, dimoxystrobin + SX, enoxastrobin + SX, famoxadone + SX, phenamidon + SX, phenaminestrobin + SX, fluphenoxystrobin + SX, fluoxastrobin + SX, cresoxime-methyl + SX, Mandestrobin + SX, Metominostrobin + SX, Orissatrobin + SX, Picoxystrobin + SX, Pyraclostrobin + SX, Pyrametostrobin + SX, Pyroxystrobin + SX, Pyribencarb + SX, Triclopyricarb + SX, Cyazofamid + SX, Amisulbrom + SX ,
Benalaxyl + SX, Benalaxyl M + SX, Furaraxyl + SX, Metalaxyl + SX, Metalaxyl M + SX, Oxadixyl + SX, Offrace + SX,
Benodanyl + SX, benzobindiflupyr + SX, bixafen + SX, boscalid + SX, carboxin + SX, fenfram + SX, fluopyram + SX, flutolanil + SX, floxapyradod + SX, furametopyl + SX, isophetamide + SX, isopyrazam + SX, propyram + SX, propyram + SX, propyram + SX , Penthiopyrad + SX, penflufen + SX, sedaxane + SX, tifluzamide + SX, pyraziflumide + SX, pidiflumethofene + SX, bactericidal compound β1 + SX, bactericidal compound β2 + SX, bactericidal compound β3 + SX, bactericidal compound β4 + SX, bactericidal compound β5 + SX,
Benomyl + SX, carbendazim + SX, fuberidazole + SX, thiabendazole + SX, thiophanate + SX, thiophanatemethyl + SX, dietofencarb + SX, zoxamide + SX, ethaboxam + SX,
Felbum + SX, Manzeb + SX, Manneb + SX, Methylam + SX, Propineb + SX, Thiuram + SX, Dinebu and Diram + SX, Captan + SX, Captahole + SX, Holpet + SX, Chlorothalonyl + SX, Tolyl fluanid + SX, Guazatine X , Dithianon + SX, quinomethionate + SX, fluorimide + SX,
Dimethomorph + SX, Flumorph + SX, Pyrimorph + SX, Bench Avaricarb + SX, Bench Avaricarb isopropyl + SX, Iprovaricarb + SX, Varifenalate + SX, Mandipropamide + SX,
Fenpiclonyl + SX, fludioxonil + SX, clozolinate + SX, iprodione + SX, procymidone + SX, vinclozoline + SX, tolcrofosmethyl + SX, oxathiapiproline + SX, picalbutrazox + SX, flupicoride + SX, silthiofam + SX.
アゾキシストロビン+SX、クモキシストロビン+SX、ジモキシストロビン+SX、エノキサストロビン+SX、ファモキサドン+SX、フェンアミドン+SX、フェナミンストロビン+SX、フルフェノキシストロビン+SX、フルオキサストロビン+SX、クレソキシム-メチル+SX、マンデストロビン+SX、メトミノストロビン+SX、オリサストロビン+SX、ピコキシストロビン+SX、ピラクロストロビン+SX、ピラメトストロビン+SX、ピラオキシストロビン+SX、ピリベンカルブ+SX、トリクロピリカルブ+SX、シアゾファミド+SX、アミスルブロム+SX、
ベナラキシル+SX、ベナラキシルM+SX、フララキシル+SX、メタラキシル+SX、メタラキシルM+SX、オキサジキシル+SX、オフラセ+SX、
ベノダニル+SX、ベンゾビンジフルピル+SX、ビキサフェン+SX、ボスカリド+SX、カルボキシン+SX、フェンフラム+SX、フルオピラム+SX、フルトラニル+SX、フルキサピロキサド+SX、フラメトピル+SX、イソフェタミド+SX、イソピラザム+SX、メプロニル+SX、オキシカルボキシン+SX、ペンチオピラド+SX、ペンフルフェン+SX、セダキサン+SX、チフルザミド+SX、ピラジフルミド+SX、ピジフルメトフェン+SX、殺菌化合物β1+SX、殺菌化合物β2+SX、殺菌化合物β3+SX、殺菌化合物β4+SX、殺菌化合物β5+SX、
ベノミル+SX、カルベンダジム+SX、フベリダゾール+SX、チアベンダゾール+SX、チオファネート+SX、チオファネートメチル+SX、ジエトフェンカルブ+SX、ゾキサミド+SX、エタボキサム+SX、
フェルバム+SX、マンゼブ+SX、マンネブ+SX、メチラム+SX、プロピネブ+SX、チウラム+SX、ジネブ及びジラム+SX、キャプタン+SX、キャプタホール+SX、ホルペット+SX、クロロタロニル+SX、トリルフルアニド+SX、グアザチン+SX、イミノクタジン+SX、アニラジン+SX、ジチアノン+SX、キノメチオナート+SX、フルオルイミド+SX、
ジメトモルフ+SX、フルモルフ+SX、ピリモルフ+SX、ベンチアバリカルブ+SX、ベンチアバリカルブイソプロピル+SX、イプロバリカルブ+SX、バリフェナレート+SX、マンジプロパミド+SX、
フェンピクロニル+SX、フルジオキソニル+SX、クロゾリネート+SX、イプロジオン+SX、プロシミドン+SX、ビンクロゾリン+SX、トルクロホスメチル+SX、オキサチアピプロリン+SX、ピカルブトラゾクス+SX、フルオピコリド+SX、シルチオファム+SX。 Azaconazole + SX, Viteltanol + SX, Bromuconazole + SX, Cyproconazole + SX, Difenoconazole + SX, Diniconazole + SX, Diniconazole M + SX, Epoxyconazole + SX, Etaconazole + SX, Fenarimol + SX, Fenbuconazole + SX, Flubuconazole X Flusilazole + SX, flutriazole + SX, hexaconazole + SX, imazalil + SX, imibenconazole + SX, ipconazole + SX, metconazole + SX, microbutanyl + SX, nuarimol + SX, oxpoconazole + SX, oxpoconazole fumarate + SX, pefrazoate + SX , Penconazole + SX, prochloraz + SX, propiconazole + SX, prothiocona Zole + SX, Pyrifenox + SX, Pyrioxazole + SX, Cimeconazole + SX, Tebuconazole + SX, Tetraconazole + SX, Triadimephone + SX, Triadimenol + SX, Triflumizole + SX, Triphorine + SX, Triticonazole + SX,
Azoxystrobin + SX, umoxistrobin + SX, dimoxystrobin + SX, enoxastrobin + SX, famoxadone + SX, phenamidon + SX, phenaminestrobin + SX, fluphenoxystrobin + SX, fluoxastrobin + SX, cresoxime-methyl + SX, Mandestrobin + SX, Metominostrobin + SX, Orissatrobin + SX, Picoxystrobin + SX, Pyraclostrobin + SX, Pyrametostrobin + SX, Pyroxystrobin + SX, Pyribencarb + SX, Triclopyricarb + SX, Cyazofamid + SX, Amisulbrom + SX ,
Benalaxyl + SX, Benalaxyl M + SX, Furaraxyl + SX, Metalaxyl + SX, Metalaxyl M + SX, Oxadixyl + SX, Offrace + SX,
Benodanyl + SX, benzobindiflupyr + SX, bixafen + SX, boscalid + SX, carboxin + SX, fenfram + SX, fluopyram + SX, flutolanil + SX, floxapyradod + SX, furametopyl + SX, isophetamide + SX, isopyrazam + SX, propyram + SX, propyram + SX, propyram + SX , Penthiopyrad + SX, penflufen + SX, sedaxane + SX, tifluzamide + SX, pyraziflumide + SX, pidiflumethofene + SX, bactericidal compound β1 + SX, bactericidal compound β2 + SX, bactericidal compound β3 + SX, bactericidal compound β4 + SX, bactericidal compound β5 + SX,
Benomyl + SX, carbendazim + SX, fuberidazole + SX, thiabendazole + SX, thiophanate + SX, thiophanatemethyl + SX, dietofencarb + SX, zoxamide + SX, ethaboxam + SX,
Felbum + SX, Manzeb + SX, Manneb + SX, Methylam + SX, Propineb + SX, Thiuram + SX, Dinebu and Diram + SX, Captan + SX, Captahole + SX, Holpet + SX, Chlorothalonyl + SX, Tolyl fluanid + SX, Guazatine X , Dithianon + SX, quinomethionate + SX, fluorimide + SX,
Dimethomorph + SX, Flumorph + SX, Pyrimorph + SX, Bench Avaricarb + SX, Bench Avaricarb isopropyl + SX, Iprovaricarb + SX, Varifenalate + SX, Mandipropamide + SX,
Fenpiclonyl + SX, fludioxonil + SX, clozolinate + SX, iprodione + SX, procymidone + SX, vinclozoline + SX, tolcrofosmethyl + SX, oxathiapiproline + SX, picalbutrazox + SX, flupicoride + SX, silthiofam + SX.
本発明組成物は、本ビピリジン化合物と本化合物との単なる混合物でもよいが、通常は、本ビピリジン化合物と本化合物と、固体担体、液体担体、ガス状担体等の不活性担体とを混合し、必要に応じて界面活性剤やその他の製剤用補助剤を添加して、製剤化することにより得られる、乳剤、油剤、粉剤、粒剤、水和剤、フロアブル剤、マイクロカプセル剤、エアゾール剤、燻煙剤、毒餌剤、樹脂製剤、シャンプー剤、ペースト状製剤、泡沫剤、炭酸ガス製剤、錠剤等の製剤である。これらの製剤は蚊取り線香、電気蚊取りマット、液体蚊取り製剤、燻煙剤、燻蒸剤、シート製剤、スポットオン剤、経口処理剤に加工されて、使用されることもある。
本発明組成物における、本ビピリジン化合物と本化合物との合計含有量は、通常0.1~100重量%、好ましくは0.2~90重量%、より好ましくは1~80重量%の範囲である。 The composition of the present invention may be a simple mixture of the present bipyridine compound and the present compound, but usually the present bipyridine compound and the present compound are mixed with an inert carrier such as a solid carrier, a liquid carrier, a gaseous carrier, Emulsions, oils, powders, granules, wettable powders, flowables, microcapsules, aerosols, obtained by adding surfactants and other formulation adjuvants as necessary. Smoke agents, poison baits, resin preparations, shampoos, paste preparations, foams, carbon dioxide preparations, tablets and the like. These preparations may be used after being processed into mosquito coils, electric mosquito mats, liquid mosquito traps, fumigants, fumigants, sheet preparations, spot-on agents, or oral treatments.
The total content of the bipyridine compound and the compound in the composition of the present invention is usually in the range of 0.1 to 100% by weight, preferably 0.2 to 90% by weight, more preferably 1 to 80% by weight. .
本発明組成物における、本ビピリジン化合物と本化合物との合計含有量は、通常0.1~100重量%、好ましくは0.2~90重量%、より好ましくは1~80重量%の範囲である。 The composition of the present invention may be a simple mixture of the present bipyridine compound and the present compound, but usually the present bipyridine compound and the present compound are mixed with an inert carrier such as a solid carrier, a liquid carrier, a gaseous carrier, Emulsions, oils, powders, granules, wettable powders, flowables, microcapsules, aerosols, obtained by adding surfactants and other formulation adjuvants as necessary. Smoke agents, poison baits, resin preparations, shampoos, paste preparations, foams, carbon dioxide preparations, tablets and the like. These preparations may be used after being processed into mosquito coils, electric mosquito mats, liquid mosquito traps, fumigants, fumigants, sheet preparations, spot-on agents, or oral treatments.
The total content of the bipyridine compound and the compound in the composition of the present invention is usually in the range of 0.1 to 100% by weight, preferably 0.2 to 90% by weight, more preferably 1 to 80% by weight. .
製剤化の際に用いられる固体担体としては、例えば粘土類(カオリンクレー、珪藻土、ベントナイト、フバサミクレー、酸性白土等)、合成含水酸化珪素、タルク、セラミック、その他の無機鉱物(セリサイト、石英、硫黄、活性炭、炭酸カルシウム、水和シリカ等)、化学肥料(硫安、燐安、硝安、尿素、塩安等)等の微粉末及び粒状物等、並びに合成樹脂(ポリプロピレン、ポリアクリロニトリル、ポリメタクリル酸メチル、ポリエチレンテレフタレート等のポリエステル樹脂、ナイロン-6、ナイロン-11、ナイロン-66等のナイロン樹脂、ポリアミド樹脂、ポリ塩化ビニル、ポリ塩化ビニリデン、塩化ビニル-プロピレン共重合体等)があげられる。
Examples of solid carriers used for formulation include clays (kaolin clay, diatomaceous earth, bentonite, fusami clay, acidic clay), synthetic hydrous silicon oxide, talc, ceramics, and other inorganic minerals (sericite, quartz, sulfur). , Activated carbon, calcium carbonate, hydrated silica, etc.), fine powders and granules of chemical fertilizers (ammonium sulfate, phosphorous acid, ammonium nitrate, urea, ammonium chloride, etc.), and synthetic resins (polypropylene, polyacrylonitrile, polymethyl methacrylate) Polyester resins such as polyethylene terephthalate, nylon resins such as nylon-6, nylon-11, and nylon-66, polyamide resins, polyvinyl chloride, polyvinylidene chloride, and vinyl chloride-propylene copolymers).
液体担体としては、例えば水、アルコール類(メタノール、エタノール、イソプロピルアルコール、ブタノール、ヘキサノール、ベンジルアルコール、エチレングリコール、プロピレングリコール、フェノキシエタノール等)、ケトン類(アセトン、メチルエチルケトン、シクロヘキサノン等)、芳香族炭化水素類(トルエン、キシレン、エチルベンゼン、ドデシルベンゼン、フェニルキシリルエタン、メチルナフタレン等)、脂肪族炭化水素類(ヘキサン、シクロヘキサン、灯油、軽油等)、エステル類(酢酸エチル、酢酸ブチル、ミリスチン酸イソプロピル、オレイン酸エチル、アジピン酸ジイソプロピル、アジピン酸ジイソブチル、プロピレングリコールモノメチルエーテルアセテート等)、ニトリル類(アセトニトリル、イソブチロニトリル等)、エーテル類(ジイソプロピルエーテル、1,4-ジオキサン、エチレングリコールジメチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、3-メトキシ-3-メチル-1-ブタノール等)、アミド類(DMF、N,N-ジメチルアセトアミド等)、スルホキシド類(DMSO等)、炭酸プロピレン及び植物油(大豆油、綿実油等)が挙げられる。
Examples of the liquid carrier include water, alcohols (methanol, ethanol, isopropyl alcohol, butanol, hexanol, benzyl alcohol, ethylene glycol, propylene glycol, phenoxyethanol, etc.), ketones (acetone, methyl ethyl ketone, cyclohexanone, etc.), aromatic hydrocarbons (Toluene, xylene, ethylbenzene, dodecylbenzene, phenylxylylethane, methylnaphthalene, etc.), aliphatic hydrocarbons (hexane, cyclohexane, kerosene, light oil, etc.), esters (ethyl acetate, butyl acetate, isopropyl myristate, Ethyl oleate, diisopropyl adipate, diisobutyl adipate, propylene glycol monomethyl ether acetate, etc.), nitriles (acetonitrile, isobutyrate) Nitriles), ethers (diisopropyl ether, 1,4-dioxane, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, 3-methoxy-3-methyl-1-butanol, etc. ), Amides (DMF, N, N-dimethylacetamide, etc.), sulfoxides (DMSO, etc.), propylene carbonate and vegetable oils (soybean oil, cottonseed oil, etc.).
ガス状担体としては、例えばフルオロカーボン、ブタンガス、LPG(液化石油ガス)、ジメチルエーテル及び炭酸ガスがあげられる。
Examples of the gaseous carrier include fluorocarbon, butane gas, LPG (liquefied petroleum gas), dimethyl ether, and carbon dioxide gas.
界面活性剤としては、例えばポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルアリールエーテル、ポリエチレングリコール脂肪酸エステル等の非イオン界面活性剤、及びアルキルスルホン酸塩、アルキルベンゼンスルホン酸塩、アルキル硫酸塩等の陰イオン界面活性剤が挙げられる。
Examples of the surfactant include nonionic surfactants such as polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, and polyethylene glycol fatty acid ester, and anions such as alkyl sulfonate, alkyl benzene sulfonate, and alkyl sulfate. Surfactant is mentioned.
その他の製剤用補助剤としては、固着剤、分散剤、着色剤及び安定剤等、具体的にはカゼイン、ゼラチン、糖類(でんぷん、アラビアガム、セルロース誘導体、アルギン酸等)、リグニン誘導体、ベントナイト、合成水溶性高分子(ポリビニルアルコール、ポリビニルピロリドン、ポリアクリル酸類等)、酸性りん酸イソプロピル、2,6-ジ-tert-ブチル-4-メチルフェノール、2-tert-ブチル-4-メトキシフェノールと3-tert-ブチル-4-メトキシフェノールとの混合物が挙げられる。
Other formulation adjuvants include fixing agents, dispersants, colorants and stabilizers, such as casein, gelatin, sugars (starch, gum arabic, cellulose derivatives, alginic acid, etc.), lignin derivatives, bentonite, synthesis Water-soluble polymers (polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acids, etc.), isopropyl acid phosphate, 2,6-di-tert-butyl-4-methylphenol, 2-tert-butyl-4-methoxyphenol and 3- Mention may be made of mixtures with tert-butyl-4-methoxyphenol.
樹脂製剤の基材としては、例えば塩化ビニル系重合体、ポリウレタンを挙げることができ、これらの基材には必要によりフタル酸エステル類(フタル酸ジメチル、フタル酸ジオクチル等)、アジピン酸エステル類、ステアリン酸等の可塑剤が添加されていてもよい。樹脂製剤は、一般的な混練装置を用いて該基材中に本ビピリジン化合物及び本化合物を練り込んだ後、射出成型、押出成型、プレス成型等の成型を行うことにより得られ、必要により更に成型、裁断等の加工工程を経て、板状、フィルム状、テープ状、網状、ひも状等の形状の樹脂製剤に加工できる。これらの樹脂製剤は、動物用首輪、動物用イヤータッグ、シート製剤、誘引ひも、園芸用支柱に加工される。
毒餌の基材としては、例えば穀物粉、植物油、糖、結晶セルロースが挙げられ、更に必要に応じて、ジブチルヒドロキシトルエン、ノルジヒドログアイアレチン酸等の酸化防止剤、デヒドロ酢酸等の保存料、トウガラシ末等の子供やペットによる誤食防止剤、チーズ香料、タマネギ香料、ピーナッツオイル等の害虫誘引性香料等が添加される。 Examples of the base material of the resin preparation include vinyl chloride polymers and polyurethanes. These base materials include phthalic acid esters (dimethyl phthalate, dioctyl phthalate, etc.), adipic acid esters, if necessary. A plasticizer such as stearic acid may be added. The resin preparation is obtained by kneading the bipyridine compound and the compound into the base material using a general kneading apparatus, and then performing molding such as injection molding, extrusion molding, press molding, and the like. It can be processed into a resin formulation having a plate shape, a film shape, a tape shape, a net shape, a string shape or the like through processing steps such as molding and cutting. These resin preparations are processed into animal collars, animal ear tags, sheet preparations, attracting laces, and horticultural supports.
Examples of the bait base include cereal flour, vegetable oil, sugar, crystalline cellulose, and, if necessary, antioxidants such as dibutylhydroxytoluene and nordihydroguaiaretic acid, preservatives such as dehydroacetic acid, Additives such as pepper, powdered foods for children and pets, cheese flavor, onion flavor, peanut oil and other pest attractant flavors are added.
毒餌の基材としては、例えば穀物粉、植物油、糖、結晶セルロースが挙げられ、更に必要に応じて、ジブチルヒドロキシトルエン、ノルジヒドログアイアレチン酸等の酸化防止剤、デヒドロ酢酸等の保存料、トウガラシ末等の子供やペットによる誤食防止剤、チーズ香料、タマネギ香料、ピーナッツオイル等の害虫誘引性香料等が添加される。 Examples of the base material of the resin preparation include vinyl chloride polymers and polyurethanes. These base materials include phthalic acid esters (dimethyl phthalate, dioctyl phthalate, etc.), adipic acid esters, if necessary. A plasticizer such as stearic acid may be added. The resin preparation is obtained by kneading the bipyridine compound and the compound into the base material using a general kneading apparatus, and then performing molding such as injection molding, extrusion molding, press molding, and the like. It can be processed into a resin formulation having a plate shape, a film shape, a tape shape, a net shape, a string shape or the like through processing steps such as molding and cutting. These resin preparations are processed into animal collars, animal ear tags, sheet preparations, attracting laces, and horticultural supports.
Examples of the bait base include cereal flour, vegetable oil, sugar, crystalline cellulose, and, if necessary, antioxidants such as dibutylhydroxytoluene and nordihydroguaiaretic acid, preservatives such as dehydroacetic acid, Additives such as pepper, powdered foods for children and pets, cheese flavor, onion flavor, peanut oil and other pest attractant flavors are added.
本発明組成物における、本ビピリジン化合物と本化合物との含有割合は、特に限定されるものではないが、本発明組成物が前記群(a)より選ばれる1種以上の化合物(以下、本化合物aと記す)を含有する場合、本ビピリジン化合物と本化合物aとの含有量の比は、好ましくは、重量比で100:1~1:100の範囲であり、特に10:1~1:10の範囲が好ましい。本発明組成物が前記群(b)より選ばれる1種以上の化合物(以下、本化合物bと記す)を含有する場合、本ビピリジン化合物と本化合物bとの含有量の比は、好ましくは、重量比で10000:1~1:100の範囲であり、特に1000:1~1:10の範囲が好ましく、さらに1000:1~1:1の範囲がより好ましい。
The content ratio of the present bipyridine compound and the present compound in the composition of the present invention is not particularly limited, but the composition of the present invention is one or more compounds selected from the group (a) (hereinafter referred to as the present compound). a), the ratio of the content of the bipyridine compound and the compound a is preferably in the range of 100: 1 to 1: 100 by weight, in particular 10: 1 to 1:10. The range of is preferable. When the composition of the present invention contains one or more compounds selected from the group (b) (hereinafter referred to as the present compound b), the ratio of the content of the bipyridine compound and the present compound b is preferably The weight ratio is in the range of 10,000: 1 to 1: 100, particularly preferably in the range of 1000: 1 to 1:10, and more preferably in the range of 1000: 1 to 1: 1.
本発明の有害生物の防除方法は、本発明組成物の有効量を有害生物に直接、及び/又は、有害生物の生息場所に施用することにより行われる。有害生物の生息場所としては、植物、植物を栽培する土壌、家屋内及び動物体等が挙げられる。
The pest control method of the present invention is carried out by applying an effective amount of the composition of the present invention to pests directly and / or in the habitat of pests. Examples of habitats for pests include plants, soil for cultivating plants, indoors, and animal bodies.
本発明組成物の有効量を、植物又は植物を栽培する土壌に施用する方法としては、例えば、植物の茎葉、花器、苗又は穂へ本発明組成物の有効量を施用する方法、種子消毒や種子浸漬、種子コート等の種子又は種芋等の球根へ本発明組成物の有効量を施用する方法、植物を植えつける前又は植えつけた後の土壌に本発明組成物の有効量を施用する方法が挙げられる。
Examples of a method for applying an effective amount of the composition of the present invention to a plant or soil for cultivating a plant include, for example, a method of applying an effective amount of the composition of the present invention to a plant foliage, flower vase, seedling or ear, seed disinfection, A method of applying an effective amount of the composition of the present invention to seeds such as seed soaking and seed coats or bulbs such as seed pods, a method of applying an effective amount of the composition of the present invention to soil before or after planting Is mentioned.
本発明組成物の有効量を、植物の茎葉、花器、苗又は穂へ施用する方法としては、具体的には、茎葉散布、樹幹散布等の植物の表面に本発明組成物の有効量を施用する方法が挙げられ、また、開花前、開花中、開花後を含む開花時期における花器あるいは植物全体に本発明組成物の有効量を散布する方法が挙げられ、また、穀物等においては出穂時期の穂あるいは植物全体に本発明組成物の有効量を散布する方法が挙げられる。
As a method for applying the effective amount of the composition of the present invention to the foliage, flower vase, seedling or ear of a plant, specifically, the effective amount of the composition of the present invention is applied to the surface of the plant such as foliage spraying, tree spraying, etc. In addition, a method of spraying an effective amount of the composition of the present invention to the vase or the whole plant in the flowering period including before flowering, during flowering, and after flowering is mentioned. A method of spraying an effective amount of the composition of the present invention on the panicle or the whole plant is mentioned.
また、本発明組成物の有効量を、植物を植えつける前又は植えつけた後の土壌に施用することにより有害生物を防除する方法は、例えば、有害生物による摂食等の被害から保護しようとする作物の根圏に本発明組成物の有効量を施用して有害生物を直接防除する方法、または根部等から植物体内部に本発明組成物の有効量を浸透移行させて、植物を摂食する有害生物を防除する方法である。
本発明組成物の有効量を、植物を植えつける前又は植えつけた後の土壌に施用する方法としては、例えば、植穴処理(植穴散布、植穴処理土壌混和)、株元処理(株元散布、株元土壌混和、株元灌注、育苗期後半株元処理)、植溝処理(植溝散布、植溝土壌混和)、作条処理(作条散布、作条土壌混和、生育期作条散布)、播種時作条処理(播種時作条散布、播種時作条土壌混和)、全面処理(全面土壌散布、全面土壌混和)、側条処理、水面処理(水面施用、湛水後水面施用)、その他土壌散布処理(生育期粒剤葉面散布、樹冠下または主幹周辺散布、土壌表面散布、土壌表面混和、播穴散布、畦部地表面散布、株間散布)、その他灌注処理(土壌灌注、育苗期灌注、薬液注入処理、地際部灌注、薬液ドリップイリゲーション、ケミゲーション)、育苗箱処理(育苗箱散布、育苗箱灌注、育苗箱薬液湛水)、育苗トレイ処理(育苗トレイ散布、育苗トレイ灌注、育苗トレイ薬液湛水)、苗床処理(苗床散布、苗床灌注、水苗代苗床散布、苗浸漬)、床土混和処理(床土混和、播種前床土混和、播種時覆土前散布、播種時覆土後散布、覆土混和)、その他処理(培土混和、鋤き込み、表土混和、雨落ち部土壌混和、植位置処理、粒剤花房散布、ペースト肥料混和)が挙げられる。 In addition, a method for controlling pests by applying an effective amount of the composition of the present invention to soil before or after planting is intended to protect against damage such as feeding by pests. A method for directly controlling pests by applying an effective amount of the composition of the present invention to the rhizosphere of the crop to be cultivated, or by feeding an effective amount of the composition of the present invention into the plant body from the root or the like to feed the plant It is a method to control the pests.
Examples of a method for applying an effective amount of the composition of the present invention to soil before or after planting a plant include planting treatment (planting hole spraying, planting treatment soil admixture), plant source treatment (strain Former spraying, Strain source soil mixing, Strain source irrigation, Late seedling treatment, Soil planting treatment (Sprouting spray, Sprout soil mixing), Soil treatment (Striping spray, Soil mixing, Growing season crop) Striping), cropping treatment at sowing (spreading at sowing, mixing with soil at sowing), full treatment (spreading all soil, blending with whole soil), side treatment, water surface treatment (water surface application, water surface after flooding) Application), other soil spraying treatments (growth season granule foliar spraying, under-canopy or around trunk trunk, soil surface spraying, soil surface mixing, sowing hole spraying, buttocks surface spraying, inter-plant spraying), other irrigation processing (soil Irrigation, seedling irrigation, chemical infusion treatment, local irrigation, chemical drip irrigation, chemigesi ), Seedling box treatment (spreading seedling box, seedling box irrigation, seedling box chemical solution flooding), seedling tray processing (nursery tray spraying, seedling tray irrigation, seedling tray chemical solution flooding), seedling treatment (seed bed spraying, seed bed irrigation, Water seedling surrogate seedling spraying, seedling soaking), floor soil mixing treatment (floor soil mixing, pre-sowing floor soil mixing, sowing before soil covering before spraying, spraying after soil covering after seeding, soil covering), other treatments (culture soil mixing, seeding, Topsoil mixing, raindrop soil mixing, planting treatment, granule inflorescence spraying, paste fertilizer mixing).
本発明組成物の有効量を、植物を植えつける前又は植えつけた後の土壌に施用する方法としては、例えば、植穴処理(植穴散布、植穴処理土壌混和)、株元処理(株元散布、株元土壌混和、株元灌注、育苗期後半株元処理)、植溝処理(植溝散布、植溝土壌混和)、作条処理(作条散布、作条土壌混和、生育期作条散布)、播種時作条処理(播種時作条散布、播種時作条土壌混和)、全面処理(全面土壌散布、全面土壌混和)、側条処理、水面処理(水面施用、湛水後水面施用)、その他土壌散布処理(生育期粒剤葉面散布、樹冠下または主幹周辺散布、土壌表面散布、土壌表面混和、播穴散布、畦部地表面散布、株間散布)、その他灌注処理(土壌灌注、育苗期灌注、薬液注入処理、地際部灌注、薬液ドリップイリゲーション、ケミゲーション)、育苗箱処理(育苗箱散布、育苗箱灌注、育苗箱薬液湛水)、育苗トレイ処理(育苗トレイ散布、育苗トレイ灌注、育苗トレイ薬液湛水)、苗床処理(苗床散布、苗床灌注、水苗代苗床散布、苗浸漬)、床土混和処理(床土混和、播種前床土混和、播種時覆土前散布、播種時覆土後散布、覆土混和)、その他処理(培土混和、鋤き込み、表土混和、雨落ち部土壌混和、植位置処理、粒剤花房散布、ペースト肥料混和)が挙げられる。 In addition, a method for controlling pests by applying an effective amount of the composition of the present invention to soil before or after planting is intended to protect against damage such as feeding by pests. A method for directly controlling pests by applying an effective amount of the composition of the present invention to the rhizosphere of the crop to be cultivated, or by feeding an effective amount of the composition of the present invention into the plant body from the root or the like to feed the plant It is a method to control the pests.
Examples of a method for applying an effective amount of the composition of the present invention to soil before or after planting a plant include planting treatment (planting hole spraying, planting treatment soil admixture), plant source treatment (strain Former spraying, Strain source soil mixing, Strain source irrigation, Late seedling treatment, Soil planting treatment (Sprouting spray, Sprout soil mixing), Soil treatment (Striping spray, Soil mixing, Growing season crop) Striping), cropping treatment at sowing (spreading at sowing, mixing with soil at sowing), full treatment (spreading all soil, blending with whole soil), side treatment, water surface treatment (water surface application, water surface after flooding) Application), other soil spraying treatments (growth season granule foliar spraying, under-canopy or around trunk trunk, soil surface spraying, soil surface mixing, sowing hole spraying, buttocks surface spraying, inter-plant spraying), other irrigation processing (soil Irrigation, seedling irrigation, chemical infusion treatment, local irrigation, chemical drip irrigation, chemigesi ), Seedling box treatment (spreading seedling box, seedling box irrigation, seedling box chemical solution flooding), seedling tray processing (nursery tray spraying, seedling tray irrigation, seedling tray chemical solution flooding), seedling treatment (seed bed spraying, seed bed irrigation, Water seedling surrogate seedling spraying, seedling soaking), floor soil mixing treatment (floor soil mixing, pre-sowing floor soil mixing, sowing before soil covering before spraying, spraying after soil covering after seeding, soil covering), other treatments (culture soil mixing, seeding, Topsoil mixing, raindrop soil mixing, planting treatment, granule inflorescence spraying, paste fertilizer mixing).
本発明において、種子とは、土壌または栽培する培地に播種する前の状態の植物の種子を意味し、球根とは、土壌あるいは栽培する培地に植付ける前の状態の植物の鱗茎、球茎、塊茎、根茎、茎断片、種芋及び塊根を意味する。本発明組成物の有効量を種子又は球根に施用することにより有害生物を防除する方法は、例えば、有害生物による摂食等の被害から保護しようとする植物の種子もしくは球根に直接本発明組成物の有効量を施用して有害生物を防除する方法;種子もしくは球根の近傍に本発明組成物の有効量を施用して、種子等を摂食する有害生物を防除する方法;または種子もしくは球根から植物体内部に本発明組成物の有効量を浸透移行させて、植物を摂食する有害生物を防除する方法であり、本発明組成物の有効量を種子又は球根に施用する方法としては、例えば、吹きつけ処理、塗沫処理、浸漬処理、含浸処理、塗布処理、フィルムコート処理、ペレットコート処理が挙げられる。本発明組成物の有効量を保持している種子又は球根は、これらの方法により調製される。
本発明組成物を種子又は球根に施用する場合、本ビピリジン化合物の施用量は、種子又は球根1kgあたり、通常0.001~100g、好ましくは0.02~20gであり、本化合物の施用量は、種子又は球根1kgあたり、通常0.000001~50g、好ましくは0.0001~30gである。 In the present invention, the seed means the seed of the plant in a state before being sown in the soil or the culture medium, and the bulb is a bulb, a bulb, or a tuber of the plant in a state before being planted in the soil or the culture medium. , Rhizome, stem fragment, seed pod and tuberous root. A method for controlling pests by applying an effective amount of the composition of the present invention to seeds or bulbs is, for example, directly applied to seeds or bulbs of plants to be protected from damage such as feeding by pests. A method for controlling pests by applying an effective amount of the above; a method for controlling pests that feed on seeds by applying an effective amount of the composition of the present invention in the vicinity of the seeds or bulbs; or from seeds or bulbs An effective amount of the composition of the present invention is osmotically transferred inside the plant body to control pests that feed on the plant, and a method of applying the effective amount of the composition of the present invention to seeds or bulbs is, for example, , Spraying treatment, smearing treatment, dipping treatment, impregnation treatment, coating treatment, film coating treatment, and pellet coating treatment. Seeds or bulbs that retain an effective amount of the composition of the invention are prepared by these methods.
When the composition of the present invention is applied to seeds or bulbs, the application amount of the bipyridine compound is usually 0.001 to 100 g, preferably 0.02 to 20 g, per 1 kg of seeds or bulbs. The amount is usually 0.000001 to 50 g, preferably 0.0001 to 30 g per kg of seeds or bulbs.
本発明組成物を種子又は球根に施用する場合、本ビピリジン化合物の施用量は、種子又は球根1kgあたり、通常0.001~100g、好ましくは0.02~20gであり、本化合物の施用量は、種子又は球根1kgあたり、通常0.000001~50g、好ましくは0.0001~30gである。 In the present invention, the seed means the seed of the plant in a state before being sown in the soil or the culture medium, and the bulb is a bulb, a bulb, or a tuber of the plant in a state before being planted in the soil or the culture medium. , Rhizome, stem fragment, seed pod and tuberous root. A method for controlling pests by applying an effective amount of the composition of the present invention to seeds or bulbs is, for example, directly applied to seeds or bulbs of plants to be protected from damage such as feeding by pests. A method for controlling pests by applying an effective amount of the above; a method for controlling pests that feed on seeds by applying an effective amount of the composition of the present invention in the vicinity of the seeds or bulbs; or from seeds or bulbs An effective amount of the composition of the present invention is osmotically transferred inside the plant body to control pests that feed on the plant, and a method of applying the effective amount of the composition of the present invention to seeds or bulbs is, for example, , Spraying treatment, smearing treatment, dipping treatment, impregnation treatment, coating treatment, film coating treatment, and pellet coating treatment. Seeds or bulbs that retain an effective amount of the composition of the invention are prepared by these methods.
When the composition of the present invention is applied to seeds or bulbs, the application amount of the bipyridine compound is usually 0.001 to 100 g, preferably 0.02 to 20 g, per 1 kg of seeds or bulbs. The amount is usually 0.000001 to 50 g, preferably 0.0001 to 30 g per kg of seeds or bulbs.
本発明組成物が効力を有する有害生物としては、例えば、有害昆虫類及び有害ダニ類等の有害節足動物、有害線虫類、並びに、糸状菌及び細菌等の植物病原菌が挙げられる。かかる有害生物としては、例えば、以下のものが挙げられる。
Examples of the pests for which the composition of the present invention is effective include harmful arthropods such as harmful insects and harmful mites, harmful nematodes, and phytopathogenic fungi such as filamentous fungi and bacteria. Examples of such pests include the following.
半翅目害虫:ヒメトビウンカ(Laodelphax striatellus)、トビイロウンカ(Nilaparvata lugens)、セジロウンカ(Sogatella furcifera)、トウモロコシウンカ(Peregrinus maidis)等のウンカ類;ツマグロヨコバイ(Nephotettix cincticeps)、タイワンツマグロヨコバイ(Nephotettix virescens)、Rice green leafhopper(Nephotettix nigropictus)、イナズマヨコバイ(Recilia dorsalis)、チャノミドリヒメヨコバイ(Empoasca onukii)、ポテトリーフホッパー(Empoasca fabae)、コーンリーフホッパー(Dalbulus maidis)、Sugarcane froghopper(Mahanarva posticata)、Sugarcane root spittlebug(Mahanarva fimbriolota)、シロオオヨコバイ(Cofana spectra)、クロスジツマグロヨコバイ(Nephotettix nigropictus)等のヨコバイ類;ワタアブラムシ(Aphis gossypii)、モモアカアブラムシ(Myzus persicae)、ダイコンアブラムシ(Brevicoryne brassicae)、ユキヤナギアブラムシ(Aphis spiraecola)、チューリップヒゲナガアブラムシ(Macrosiphum euphorbiae)、ジャガイモヒゲナガアブラムシ(Aulacorthum solani)、ムギクビレアブラムシ(Rhopalosiphum padi)、ミカンクロアブラムシ(Toxoptera citricidus)、モモコフキアブラムシ(Hyalopterus pruni)、ダイズアブラムシ(Aphis glycines Matsumura)、トウモロコシアブラムシ(Rhopalosiphum maidis)、オカボノクロアブラムシ(Tetraneura nigriabdominalis)、ブドウネアブラムシ(Viteus vitifoliae)、Grape Phylloxera(Daktulosphaira vitifoliae)、Pecan phylloxera (Phylloxera devastatrix Pergande)、Pecan leaf phylloxera (Phylloxera notabilis pergande)、Southern pecan leaf phylloxera(Phylloxera russellae Stoetzel)等のアブラムシ類;イネクロカメムシ(Scotinophara lurida)、Malayan rice black bug(Scotinophara coarctata)、アオクサカメムシ(Nezara antennata)、トゲシラホシカメムシ(Eysarcoris parvus)、クサギカメムシ(Halyomorpha mista)、ミナミアオカメムシ(Nezara viridula)、Brown stink bug (Euschistus heros)、Southern green stink bug(Nezara viridula)、Red banded stink bug (Piezodorus guildinii)、Burrower brown bug(Scaptocoris castanea)、Oebalus pugnax、Dichelops melacanthus等のカメムシ類;ホソヘリカメムシ(Riptortus clavetus)、クモヘリカメムシ(Leptocorisa chinensis)、ホソクモヘリカメムシ(Leptocorisa acuta)、Leptocorisa属等のホソヘリカメムシ類;アカヒゲホソミドリカスミカメ(Trigonotylus caelestialium)、アカスジカスミカメ(Stenotus rubrovittatus)、ターニッシュドプラントバグ(Lygus lineolaris)、Chinchi bug(Blissus leucopterus leucopterus)等のカスミカメ類;オンシツコナジラミ(Trialeurodes vaporariorum)、タバココナジラミ(Bemisia tabaci)、ミカンコナジラミ(Dialeurodes citri)、ミカントゲコナジラミ(Aleurocanthus spiniferus)等のコナジラミ類;アカマルカイガラムシ(Aonidiella aurantii)、サンホーゼカイガラムシ(Comstockaspis perniciosa)、シトラススノースケール(Unaspis citri)、ルビーロウムシ(Ceroplastes rubens)、イセリヤカイガラムシ(Icerya purchasi)、フジコナカイガラムシ(Planococcus kraunhiae)、クワコナカイガラムシ(Pseudococcus longispinis)、クワシロカイガラムシ(Pseudaulacaspis pentagona)、タトルミーリーバグ(Brevennia rehi)等のカイガラムシ類;ミカンキジラミ(Diaphorina citri)、ナシキジラミ(Psylla pyrisuga)、ポテトプシリッド(Bactericerca cockerelli)などのキジラミ類;ナシグンバイ(Stephanitis nasi)等のグンバイムシ類;トコジラミ(Cimex lectularius)等のトコジラミ類及びGiant Cicada(Quesada gigas)。
Hemiptera pests: Japanese green planthoppers (Laodelphax striatellus), Japanese brown planthoppers (Nilaparvata lugens), white planthoppers (Sogatella furcifera), corn planters (Peregrinus maidis), etc .; Nephotettix (Nephotettix nigropictus), Recipe dorsalis, Emporasca onukii, Potato reef hopper (Empoasca fabae), Corn leaf hopper (Dalbulus maidis), Sugarcane ugicine (Suhana) ), Leafhoppers (Cofana spectra), leafhoppers such as Nephotettix nigropictus; cotton aphids (Aphis gossypii), peach aphids (Myzus persicae), daikona Aphid (Brevicoryne brassicae), snowy aphid (Aphis spiraecola), tulip beetle aphid (Macrosiphum euphorbiae), potato beetle aphid (Aulacorthum solani), wheat aphid (Rhopalosiphum padi), citrus aphid pruni), soybean aphids (Aphis glycines Matsumura), corn aphids (Rhopalosiphum maidis), brown aphids (Tetraneura nigriabdominalis), grape aphids (Viteus vitifoliae), Grapes Phylloxera (Daktulosphaira trixifoxePlleififepelllpelife aphids such as leaf phylloxera (Phylloxera notabilis pergande), Southern pecan leaf phylloxera (Phylloxera russellae Stoetzel); Scotinophara lurida, Malaysia an rice black bug (Scotinophara coarctata), blue beetle (Nezara antennata), bark beetle (Eysarcoris parvus), black beetle (Halyomorpha mista), southern blue beetle (Nezara virstink), Stink bug (Nezara viridula), Red banded stink bug (Piezodorus guildinii), Burrower brown bug (Scaptocoris castanea), Oebalus pugnax, Dichelops melacanthus, and other stink bugs; Leptocorisa acuta, Leptocorisa genus, etc. leucopterus) etc. White lice (Trialeurodes vaporariorum), whitefly (Bemisia tabaci), whitefly (Dialeurodes citri), whitefly (Aleurocanthus spiniferus), etc .; Citrus snow scale (Unaspis citri), Ruby beetle (Ceroplastes rubens), Icerya scale insect (Icerya purchasi), Fuji scale insect (Planococcus kraunhiae), stag beetle (Pseudococcus longispinis), stag beetle cas pi Scale insects such as Brevennia rehi; pheasants such as diaphorina citri, psylla pyrisuga, potato topiclid (Bactericerca cockerelli); pear Mumbai (Stephanitis nasi) tingidae such as; bedbugs (Cimex lectularius) Bed Bug such as and Giant Cicada (Quesada gigas).
鱗翅目害虫:ニカメイガ(Chilo suppressalis)、Darkheaded stem borer(Chilo polychrysus)、サンカメイガ(Tryporyza incertulas)、シロメイチュウ(Scirpophaga innotata)、Yellow stem borer(Scirpophaga incertulas)、Pink borer(Sesamia inferens)、Rupela albinella、コブノメイガ(Cnaphalocrocis medinalis)、Marasmia patnalis、Marasmia exigna、ワタノメイガ(Notarcha derogata)、ノシメマダラメイガ(Plodia interpunctella)、アワノメイガ(Ostrinia furnacalis)、ハイマダラノメイガ(Hellula undalis)、シバツトガ(Pediasia teterrellus)、ライスケースワーム(Nymphula depunctalis)、Marasmia属、Hop vine borer (Hydraecia immanis)、European corn borer(Ostrinia nubilalis)、Lesser cornstalk borer(Elasmopalpus lignosellus)、Bean Shoot Borer(Epinotia aporema)、Sugarcane borer(Diatraea saccharalis)、Giant Sugarcane borer(Telchin licus)等のメイガ類;ハスモンヨトウ(Spodoptera litura)、シロイチモジヨトウ(Spodoptera exigua)、アワヨトウ(Pseudaletia separata)、ヨトウガ(Mamestra brassicae)、イネヨトウ(Sesamia inferens)、シロナヨトウ(Spodoptera mauritia)、ツマジロクサヨトウ(Spodoptera frugiperda)、Spodoptera exempta、タマナヤガ(Agrotis ipsilon)、タマナギンウワバ(Plusia nigrisigna)、Soybean looper(Pseudoplusia includens)、トリコプルシア属、タバコガ(Heliothis virescens)等ヘリオティス属、オオタバコガ(Helicoverpa armigera)等ヘリコベルパ属、Velvetbean caterpillar(Anticarsia gammatalis)、Cotton leafworm (Alabama argillacea)等のヤガ類;モンシロチョウ(Pieris rapae)等のシロチョウ類;アドキソフィエス属、ナシヒメシンクイ(Grapholita molesta)、マメシンクイガ(Leguminivora glycinivorella)、アズキサヤムシガ(Matsumuraeses azukivora)、リンゴコカクモンハマキ(Adoxophyes orana fasciata)、チャノコカクモンハマキ(Adoxophyes honmai.)、チャハマキ(Homona magnanima)、ミダレカクモンハマキ(Archips fuscocupreanus)、コドリンガ(Cydia pomonella)等のハマキガ類;チャノホソガ(Caloptilia theivora)、キンモンホソガ(Phyllonorycter ringoneella)のホソガ類;モモシンクイガ(Carposina niponensis)、Citrus fruit borer(Ecdytolopha aurantiana)等のシンクイガ類;Coffee Leaf miner(Leucoptera coffeela)、リオネティア属等のハモグリガ類;リマントリア属、ユープロクティス属等のドクガ類;コナガ(Plutella xylostella)等のスガ類;ワタアカミムシ(Pectinophora gossypiella)ジャガイモガ(Phthorimaea operculella)等のキバガ類;アメリカシロヒトリ(Hyphantria cunea)等のヒトリガ類。
Lepidopterous insects: Chilo suppressalis, Darkheaded stem borer (Chilo polychrysus), Trichomyceae (Tryporyza incertulas), Shiromecho (Scirpophaga innotata), Yellow stem borer (Scirpophaga incertulas (Cnaphalocrocis medinalis), Marasmia patnalis, Marasmia exigna, cotton moth (Notarcha derogata), puffer moth (Plodia ア interpunctella), yellow moth (Ostrinia furnacalis), yellow moth (Hellulaedlus moth) depunctalis), Marasmia genus, Hop vine borer (Hydraecia immanis), European corn borer (Ostrinia nubilalis), Lesser cornstalk borer (Elasmopalpus lignosellus), Bean Shoot Borer (Epinotia aporema ersuger elchin licus, etc .; Spodoptera litura, Spodoptera exigua, Pseudaletia separata, Mamestra brassicae, Spodamia poda frugiperda), Spodoptera exempta, Tamanayaga (Agrotis ipsilon), Tamanaginouba (Plusia nigrisigna), Soybean looper (Pseudoplusia includens), Trichopulsia, Heliothis virescens etc. Heliotis genus Anticarsia gammatalis), Cotton leafworm (Alabama argillacea) and other moths; White butterflies such as Pieris rapae; Adoxofies genus, Grapholita molesta, and Leguminivora glyc inivorella), Azkiyamushiga (Matsumuraeses azukivora), Apple Kokukumonmonaki (Adoxophyes orana fasciata), Chanokokumonmonamiki (Adoxophyes honmai. ), Chamonaki (Homona magnanima), Midarekamonmonaki (Archips fuscocupreanus), Codlinga (Cydia pomonella), etc .; Sink moths such as borer (Ecdytolopha) aurantiana); Coffee Leaf miner (Leucoptera 、 coffeela); gossypiella) Potatoes such as potato moth (Phthorimaea culcula); Hitritris such as Hyphantria cunea.
総翅目害虫:ミカンキイロアザミウマ(Frankliniella occidentalis)、ミナミキイロアザミウマ(Thrips parmi)、チャノキイロアザミウマ(Scirtothrips dorsalis)、ネギアザミウマ(Thrips tabaci)、ヒラズハナアザミウマ(Frankliniella intonsa)、ウェスタンフラワースリップス(Frankliniella occidentalis)、イネクダアザミウマ(Haplothrips aculeatus)、イネアザミウマ(Stenchaetothrips biformis)等のアザミウマ類。
Common pests: Citrus thrips (Frankliniella occidentalis), Thrips parmi, Scirtothrips dorsalis, Thrips tabici Thrips such as rice thrips (Haplothrips aculeatus) and rice thrips (Stenchaetothrips biformis).
双翅目害虫:タネバエ(Delia platura)、タマネギバエ(Delia antiqua)、シュガービートルートマゴット(Tetanops myopaeformis)等のハナバエ類;イネハモグリバエ(Agromyza oryzae)、イネヒメハモグリバエ(Hydrellia griseola)、トマトハモグリバエ(Liriomyza sativae)、マメハモグリバエ(Liriomyza trifolii)、ナモグリバエ(Chromatomyia horticola)等のハモグリバエ類;イネキモグリバエ(Chlorops oryzae)等のキモグリバエ類;ウリミバエ(Dacus cucurbitae)、チチュウカイミバエ(Ceratitis capitata)等のミバエ類;トウヨウイネクキミギワバエ(Hydrellia philippina)イネクキミギワバエ(Hydrellia sasakii)等のミギワバエ類;ショウジョウバエ類、オオキモンノミバエ(Megaselia spiracularis)等のノミバエ類;オオチョウバエ(Clogmia albipunctata)等のチョウバエ類;クロバネキノコバエ類;ヘシアンバエ(Mayetiola destructor)、イネノシントメタマバエ(Orseolia oryzae)等のタマバエ類;Diopsis macrophthalma等のシュモクバエ類;Common cranefly(Tipula oleracea)、European cranefly(Tipula paludosa)等のガガンボ類。
Diptera: Pteris flies (Delia platura), onion flies (Delia antiqua), sugar beet root maggots (Tetanopsemyopaeformis), etc .; ), Leafworms (Liriomyzariotrifolii), leafworms (Chromatomyia horticola), etc .; (Hydrellia philippina) Hydrellia sasakii, etc .; Drosophila, Drosophila, Drosophila, such as Megaselia spiracularis; Drosophila, such as Clogmia albipunctata; Crab fly mushrooms; Hessian flies (Mayetiola destructor), Tamas flies such as Oreseolia oryzae; Diopsis macrophthalma etc .; Frogs such as Common cranefly (Tipula oleracea), European cranefly (Tipula gad)
鞘翅目害虫:ウエスタンコーンルートワーム(Diabrotica virgifera virgifera)、サザンコーンルートワーム(Diabrotica undecimpunctata howardi)、ノザンコーンルートワーム(Diabrotica barberi)、メキシカンコーンルートワーム(Diabrotica virgifera zeae)、バンデッドキューカンバービートル(Diabrotica balteata LeConte)、サンアントニオビートル(Diabrotica speciosa)、Cucurbit Beetle(Diabrotica speciosa)、ビーンリーフビートル(Cerotoma trifurcata)、シリアルリーフビートル(Oulema melanopus)、ウリハムシ(Aulacophora femoralis)、キスジノミハムシ(Phyllotreta striolata)、Cabbage flea beetle(Phyllotreta cruciferae)、Western black flea beetle(Phyllotreta pusilla)、Cabbage stem flea beetle(Psylliodes chrysocephala)、コロラドハムシ(Leptinotarsa decemlineata)、イネドロオイムシ(Oulema oryzae)、グレープ・コラスピス(Colaspis brunnea)、コーン・フレアビートル(Chaetocnema pulicaria)、ポテト・フレアビートル(Epitrix cucumeris)、イネトゲハムシ(Dicladispa armigera)、Seedcorn beetle(Stenolophus lecontei)、Slender seedcorn beetle (Clivinia impressifrons )等のハムシ類;ドウガネブイブイ(Anomala cuprea)、ヒメコガネ(Anomala rufocuprea)、マメコガネ(Popillia japonica)、European Chafer(Rhizotrogus majalis)、carrot beetle(Bothynus gibbosus)、Grape Colaspis(Colaspis brunnea)、southern Corn leaf beetle(Myochrous denticollis)、Holotrichia属、ジューン・ビートル(Phyllophaga crinita)などPhyllophaga属、Diloboderus abderus等Diloboderus属等のコガネムシ類;コクゾウムシ(Sitophilus zeamais)、イネゾウムシ(Echinocnemus squameus)、イネミズゾウムシ(Lissorhoptrus oryzophilus)、シバオサゾウムシ(Sphenophorus venatus)等のイネゾウムシ類;ワタミゾウムシ(Anthonomus grandis)、Southern Corn Billbug(Sphenophorus callosus)、Soybean stalk weevil(Sternechus subsignatus)及びSphenophorus levis等Sphenophorus属等のゾウムシ類;ニジュウヤホシテントウ(Epilachna vigintioctopunctata)等のエピラクナ類;ヒラタキクイムシ(Lyctus brunneus)、マツノキクイムシ(Tomicus piniperda)等のキクイムシ類;ナガシンクイムシ類;ヒョウホンムシ類;ゴマダラカミキリ(Anoplophora malasiaca)、Migdolus fryanus等のカミキリムシ類;オキナワカンシャクコメツキ(Melanotus okinawensis)、トビイロムナボソコメツキ(Agriotes ogurae fuscicollis)、クシコメツキ(Melanotus legatus)等のコメツキムシ類(Agriotes sp.、Aelous sp.、Anchastus sp.、Melanotus sp.、Limonius sp.、Conoderus sp.、Ctenicera sp.);アオバアリガタハネカクシ(Paederus fuscipes)等のハネカクシ類及びCoffee Berry Borer(Hypothenemus hampei)。
Coleoptera: Western corn root worm (Diabrotica virgifera virgifera), Southern corn root worm (Diabrotica undecimpunctata howardi), Northern corn root worm (Diabrotica barberi), Mexican corn root worm (Diabrotica virgifera zeae), Banded cumber rot balte ), San Antonio Beetle (Diabrotica speciosa), Cucurbit Beetle (Diabrotica speciosa), Bean Leaf Beetle (Cerotoma trifurcata), Cereal Leaf Beetle (Oulema melanopus), Scots beetle (Aulacophora femoralis), Psyllotata s cruciferae), Western black flea beetle (Phyllotreta pusilla), Cabbage stem flea beetle (Psylliodes chrysocephala), Colorado potato beetle (Leptinotarsa decemlineata), rice beetle (Oulema oryzae) , Grape Colaspice (Colaspis brunnea), Corn Flare Beetle (Chaetocnema pulicaria), Potato Flare Beetle (Epitrix cucumeris), Rice Beetle (Dicladispa armigera), Seedcorn beetle (Stenolophus lecontei), cornbeerons Species: Douganebuoy (Anomala cuprea), Japanese squirrel (Anomala rufocuprea), Japanese beetle (Popillia japonica), European Chafer (Rhizotrogus majalis), carrot beetle (Bothynus gibbosus), Grape colaspis (nealy, asp) Hoetrichia, June beetle (Phyllophaga crinita) and other genus Phyllophaga genus, Diloboderus Di abderus and other dilobodes genus beetles; Weevil such as weevil (Sphenophorus ネ venatus); cotton weevil (Anthonomus grandis), Southern Corn Billbug (Sphenophorus callosus), soybean stalk weevil (Sternechus subsignatus) and Sphenophorus levis ) Epiracunas, such as Lyctus brunneus, Toxus piniperda, etc .; Nagashimushi; Leopard beetle; Anoplophora okinawensis), Agriotes ogurae fuscicollis, and beetles (Melanotus legatus), etc. (Agriotes sp., Aelous sp., Anchastus sp., Melanotus sp. . ; Aoba ants backlash Staphylinidae (Paederus fuscipes) Staphylinidae such as and Coffee Berry Borer (Hypothenemus hampei).
直翅目害虫:トノサマバッタ(Locusta migratoria)、ケラ(Gryllotalpa africana)、モロッコトビバッタ(Dociostaurus maroccanus)、オーストラリアトビバッタ(Chortoicetes terminifera)、アカトビバッタ(Nomadacris septemfasciata)、Brown Locust(Locustana pardalina)、Tree Locust(Anacridium melanorhodon)、Italian Locust(Calliptamus italicus)、Differential grasshopper(Melanoplus differentialis)、Two striped grasshopper(Melanoplus bivittatus)、Migratory grasshopper(Melanoplus sanguinipes)、Red-Legged grasshopper(Melanoplus femurrubrum)、Clearwinged grasshopper(Camnula pellucida)、サバクワタリバッタ(Schistocerca gregaria)、Yellow-winged locust(Gastrimargus musicus)、Spur-throated locust(Austracris guttulosa)、コバネイナゴ(Oxya yezoensis)、ハネナガイナゴ(Oxya japonica)、タイワンツチイナゴ(Patanga succincta)、イエコオロギ(Acheta domesticus)、エンマコオロギ(Teleogryllus emma)、Mormon cricket(Anabrus simplex)等。
Insect pest: Locusta migratoria, Kera (Gryllotalpa africana), Moroccan terrestrial grasshopper (Dociostaurus maroccanus), Australian terrestrial grasshopper (Chortoicetes terminifera), Red croaker (Nomadacris septemfasciaust ina, Loc) melanorhodon), Italian Locust (Calliptamus italicus), Differential grasshopper (Melanoplus differentialis), Two striped grasshopper (Melanoplus bivittatus), Migratory grasshopper (Melanoplus sanguinipes), Red-Legged grasshopper (Melanoplus sanguinipes), Red-Legged grasshopper (Melanoplus sanguinipes) Grasshopper (Schistocerca gregaria), Yellow-winged locust (Gastrimargus musicus), Spur-throated locust (Austracris guttulosa), Copaneago (Oxya yezoensis), Red-footed tiger (Oxya japonica), Thai winged locust (Patanga ucci) Green cricket (Acheta domesticus), Emma cricket (Teleogryllusrylemma), Mormon 、 cricket (Anabrus simplex), etc.
膜翅目害虫:カブラハバチ(Athalia rosae)、ニホンカブラバチ(Athalia japonica)等のハバチ類;ファイアーアント類;Brown leaf-cutting ant(Atta capiguara)等のハキリアリ類。
ゴキブリ目害虫:チャバネゴキブリ(Blattella germanica)、クロゴキブリ(Periplaneta fuliginosa)、ワモンゴキブリ(Periplaneta americana)、トビイロゴキブリ(Periplaneta brunnea)、トウヨウゴキブリ(Blatta orientalis)。 Hymenopteran pests: bees such as Athalia rosae and Athalia japonica; fire ants;
Cockroach insects: German cockroach (Blattella germanica), Black cockroach (Periplaneta fuliginosa), American cockroach (Periplaneta americana), Great cockroach (Periplaneta brunnea), Great cockroach (Blatta orientalis).
ゴキブリ目害虫:チャバネゴキブリ(Blattella germanica)、クロゴキブリ(Periplaneta fuliginosa)、ワモンゴキブリ(Periplaneta americana)、トビイロゴキブリ(Periplaneta brunnea)、トウヨウゴキブリ(Blatta orientalis)。 Hymenopteran pests: bees such as Athalia rosae and Athalia japonica; fire ants;
Cockroach insects: German cockroach (Blattella germanica), Black cockroach (Periplaneta fuliginosa), American cockroach (Periplaneta americana), Great cockroach (Periplaneta brunnea), Great cockroach (Blatta orientalis).
シロアリ目害虫:ヤマトシロアリ(Reticulitermes speratus)、イエシロアリ(Coptotermes formosanus)、アメリカカンザイシロアリ(Incisitermes minor)、ダイコクシロアリ(Cryptotermes domesticus)、タイワンシロアリ(Odontotermes formosanus)、コウシュンシロアリ(Neotermes koshunensis)、サツマシロアリ(Glyptotermes satsumensis)、ナカジマシロアリ(Glyptotermes nakajimai)、カタンシロアリ(Glyptotermes fuscus)、コダマシロアリ(Glyptotermes kodamai)、クシモトシロアリ(Glyptotermes kushimensis)、オオシロアリ(Hodotermopsis sjostedti)、コウシュウイエシロアリ(Coptotermes guangzhoensis)、アマミシロアリ(Reticulitermes amamianus)、ミヤタケシロアリ(Reticulitermes miyatakei)、カンモンシロアリ(Reticulitermes kanmonensis)、タカサゴシロアリ(Nasutitermes takasagoensis)、ニトベシロアリ(Pericapritermes nitobei),ムシャシロアリ(Sinocapritermes mushae)、Cornitermes cumulans等。
Termite pests: Yamato termites (Reticulitermes speratus), termites (Coptotermes formosanus), American ants termites (Incisitermes minor), stag termites (Cryptotermes domesticus), ants, termites (Odontotermes eoformosaterm), ants Glypto termes amamianus), Miyatake termite (Reticulitermes miyatakei), Camellia termite (Reticulitermes kanmonensis), Takasago termite (Nasutitermes takasagoensis), Nitobe Roari (Pericapritermes nitobei), warrior termite (Sinocapritermes mushae), Cornitermes cumulans like.
ダニ類:ナミハダニ(Tetranychus urticae)、カンザワハダニ(Tetranychus kanzawai)、ミカンハダニ(Panonychus citri)、リンゴハダニ(Panonychus ulmi)、オリゴニカス属及びSouthern Turkey spider mites (Brevipalpus phoenicis)等のハダニ類;ミカンサビダニ(Aculops pelekassi)、リュウキュウミカンサビダニ(Phyllocoptruta citri)、トマトサビダニ(Aculops lycopersici)、チャノサビダニ(Calacarus carinatus)、チャノナガサビダニ(Acaphylla theavagrans)、ニセナシサビダニ(Eriophyes chibaensis)、リンゴサビダニ(Aculus schlechtendali)等のフシダニ類;チャノホコリダニ(Polyphagotarsonemus latus)等のホコリダニ類;ミナミヒメハダニ(Brevipalpus phoenicis)等のヒメハダニ類;ケナガハダニ類;フタトゲチマダニ(Haemaphysalis longicornis)、ヤマトチマダニ(Haemaphysalis flava)、タイワンカクマダニ(Dermacentor taiwanicus)、アメリカンイヌカクマダニ(Dermacentor variabilis)、ヤマトマダニ(Ixodes ovatus)、シュルツマダニ(Ixodes persulcatus)、ブラックレッグドチック(Ixodes scapularis)、アメリカキララマダニ(Amblyomma americanum)、オウシマダニ(Boophilus microplus)、クリイロコイタマダニ(Rhipicephalus sanguineus)等のマダニ類;ケナガコナダニ(Tyrophagus putrescentiae)、ホウレンソウケナガコナダニ(Tyrophagus similis)等のコナダニ類;コナヒョウヒダニ(Dermatophagoides farinae)、ヤケヒョウヒダニ(Dermatophagoides ptrenyssnus)等のヒョウヒダニ類;ホソツメダニ(Cheyletus eruditus)、クワガタツメダニ(Cheyletus malaccensis)、ミナミツメダニ(Cheyletus moorei)、イヌツメダニ(Cheyletiella yasguri)等のツメダニ類;ミミヒゼンダニ(Octodectes cynotis)、ヒゼンダニ(Sacroptes scabiei)等のヒゼンダニ類;イヌニキビダニ(Demodex canis)等のニキビダニ類;ズツキダニ類;ササラダニ類;イエダニ(Ornithonyssus bacoti)、トリサシダニ(Ornithonyssus sylvairum)、ワクモ(Dermanyssus gallinae)等のワクモ類;アオツツガムシ(Leptotrombidium akamushi)等のツツガムシ類。
クモ類:カバキコマチグモ(Chiracanthium japonicum)、セアカゴケグモ(Latrodectus hasseltii)等のクモ類等。
唇脚綱類:ゲジ(Thereuonema hilgendorfi),トビズムカデ(Scolopendra subspinipes)等。
倍脚綱類:ヤケヤスデ(Oxidus gracilis),アカヤスデ(Nedyopus tambanus)等。
等脚目類:オカダンゴムシ(Armadillidium vulgare)等。
腹足綱類:チャコウラナメクジ(Limax marginatus)、キイロコウラナメクジ(Limax flavus), スクミリンゴガイ(Pomacea canaliculata)等。 Ticks: spider mites (Tetranychus urticae), spider mites (Tetranychus kanzawai), mandarin spider mites (Panonychus citri), apple spider mites (Panonychus ulmi), spider mites, Southern Turkey spider mites (Brevipalpus phoenicis), etc .; Phyllocoptruta citri, Tomato rustic mite (Aculops lycopersici), Chinese rustic mite (Calacarus carinatus), Chinese cabbage mite (Acaphylla theavagrans), Green radish mite (Eriophyes chibaensis), Mite schist ticks Dust mites such as (Polyphagotarsonemus latus); spider mites such as the southern spider mite (Brevipalpus phoenicis); spider mites; Haemaphysalis longicornis; Tick (Dermacentor taiwanicus), American dog ticks (Dermacentor variabilis), Yamato ticks (Ixodes ovatus), Schulz ticks (Ixodes persulcatus), Black-legged ticks (Ixodes scapularis), American tick ticks (Amblyomma americanum), ophilus tick Ticks such as Rhipicephalus sanguineus; tick such as Tyrophagus putrescentiae; Tyrophagus similis; hey D eruditus), crawfish tick (Cheyletus malaccensis), crayfish tick (Cheyletus moorei), crayfish tick (Cheyletiella yasguri), etc .; Spider mites such as Sacroptes scabiei; Acrid mites such as Dogid mites (Demodex canis); Acarid mites; Tsutsugamushi, such as (Leptotrombidium akamushi).
Spiders: Spiders such as Chiracanthium japonicum and Latrodectus hasseltii.
Lips and legs: Gezi (Thereuonema hilgendorfi), Tobismkade (Scolopendra subspinipes), etc.
Double-legged class: zelkova (Oxidus gracilis), red scallop (Nedyopus tambanus), etc.
Isopods: Armadillidium vulgare, etc.
Gastropoda: Limax marginatus, Limax flavus, Pomacea canaliculata, etc.
クモ類:カバキコマチグモ(Chiracanthium japonicum)、セアカゴケグモ(Latrodectus hasseltii)等のクモ類等。
唇脚綱類:ゲジ(Thereuonema hilgendorfi),トビズムカデ(Scolopendra subspinipes)等。
倍脚綱類:ヤケヤスデ(Oxidus gracilis),アカヤスデ(Nedyopus tambanus)等。
等脚目類:オカダンゴムシ(Armadillidium vulgare)等。
腹足綱類:チャコウラナメクジ(Limax marginatus)、キイロコウラナメクジ(Limax flavus), スクミリンゴガイ(Pomacea canaliculata)等。 Ticks: spider mites (Tetranychus urticae), spider mites (Tetranychus kanzawai), mandarin spider mites (Panonychus citri), apple spider mites (Panonychus ulmi), spider mites, Southern Turkey spider mites (Brevipalpus phoenicis), etc .; Phyllocoptruta citri, Tomato rustic mite (Aculops lycopersici), Chinese rustic mite (Calacarus carinatus), Chinese cabbage mite (Acaphylla theavagrans), Green radish mite (Eriophyes chibaensis), Mite schist ticks Dust mites such as (Polyphagotarsonemus latus); spider mites such as the southern spider mite (Brevipalpus phoenicis); spider mites; Haemaphysalis longicornis; Tick (Dermacentor taiwanicus), American dog ticks (Dermacentor variabilis), Yamato ticks (Ixodes ovatus), Schulz ticks (Ixodes persulcatus), Black-legged ticks (Ixodes scapularis), American tick ticks (Amblyomma americanum), ophilus tick Ticks such as Rhipicephalus sanguineus; tick such as Tyrophagus putrescentiae; Tyrophagus similis; hey D eruditus), crawfish tick (Cheyletus malaccensis), crayfish tick (Cheyletus moorei), crayfish tick (Cheyletiella yasguri), etc .; Spider mites such as Sacroptes scabiei; Acrid mites such as Dogid mites (Demodex canis); Acarid mites; Tsutsugamushi, such as (Leptotrombidium akamushi).
Spiders: Spiders such as Chiracanthium japonicum and Latrodectus hasseltii.
Lips and legs: Gezi (Thereuonema hilgendorfi), Tobismkade (Scolopendra subspinipes), etc.
Double-legged class: zelkova (Oxidus gracilis), red scallop (Nedyopus tambanus), etc.
Isopods: Armadillidium vulgare, etc.
Gastropoda: Limax marginatus, Limax flavus, Pomacea canaliculata, etc.
線虫類:アフェレンコイデス類(Aphelenchoides sp.)のイネシンガレセンチュウ(Aphelenchoides basseyi);ネグサレセンチュウ類(Pratylenchus sp.)のミナミネグサレセンチュウ(Pratylenchus coffeae)、Pratylenchus brachyurus、ムギネグサレセンチュウ(Pratylenchus neglectus);ネコブセンチュウ類(Meloidogyne sp.)のジャワネコブセンチュウ(Meloidogyne javanica)、サツマイモネコブセンチュウ(Meloidogyne incognita)、キタネコブセンチュウ(Meloidogyne hapla);ヘテロデラ類(Heterodera sp.)のダイズシストセンチュウ(Heterodera glycines);グロボデラ類(Globodera sp.)のジャガイモシストセンチュウ(Globodera rostochiensis)、Rotylenchulus reniformis、イチゴメセンチュウ(Nothotylenchus acris)、ラドフォルス・シミリス(Radopholus similis)、ジチレンクス・ジプサシ(Ditylenchus dipsaci)、チレンクルス・セミペネトランス(Tylenchulus semipenetrans);ロンギドルス類(Longidorus sp.);キシフィネマ類(Xiphinema sp.);トリコドルス類(Trichodorus sp.);ブルサフェレンクス類(Bursaphelenchus sp.)のマツノザイセンチュウ(Bursaphelenchus xylophilus)等。
Nematode: Aphelenchoides basseyi of Aphelenchoides sp .; Pratylenchusus p neglectus); Meloidogyne javanica, Meloidogyne incognita, Meloidogyne hapla; Heterodera deter (Globodera sp.) Potato cyst nematode (Globodera rostochiensis), Rotylenchulus reniformis, strawberry mesenchu (Nothotylenchus acris), Radopholus similis, Ditilencs gypsashi (Ditylenc) hus dipsaci), Tylenchulus semipenetrans; Longidorus sp .; Xiphinema sp .; Trichodols (Trichodorus sp.); Bursaphelenchus sp. Nematode (Bursaphelenchus xylophilus) etc.
植物病原菌:イネのいもち病(Magnaporthe grisea)、ごま葉枯病(Cochliobolus miyabeanus)、紋枯病(Rhizoctonia solani)、馬鹿苗病(Gibberella fujikuroi)、黄化萎縮病(Sclerophthora macrospora);コムギのうどんこ病(Erysiphe graminis)、赤かび病(Fusarium graminearum、F. avenaceum、F. culmorum、Microdochium nivale)、さび病(Puccinia striiformis、P. graminis、P. recondita)、紅色雪腐病(Microdochium nivale, M.majus)、雪腐小粒菌核病(Typhula sp.)、裸黒穂病(Ustilago tritici)、なまぐさ黒穂病(Tilletia caries、T.controversa)、眼紋病(Pseudocercosporella herpotrichoides)、葉枯病(Septoria tritici)、ふ枯病(Stagonospora nodorum)、黄斑病(Pyrenophora tritici-repentis)、リゾクトニア属菌による苗立枯れ病(Rhizoctonia solani)、立枯病(Gaeumannomyces graminis);オオムギのうどんこ病(Erysiphe graminis)、赤かび病(Fusarium graminearum、F. avenaceum、F. culmorum、Microdochium nivale)、さび病(Puccinia striiformis、P.graminis、P.hordei)、裸黒穂病(Ustilago nuda)、雲形病(Rhynchosporium secalis)、網斑病(Pyrenophora teres)、斑点病(Cochliobolus sativus)、斑葉病(Pyrenophora graminea)、ラムラリア病(Ramularia collo-cygni)、リゾクトニア属菌による苗立枯れ病(Rhizoctonia solani);トウモロコシのさび病(Puccinia sorghi)、南方さび病(Puccinia polysora)、すす紋病(Setosphaeria turcica)、熱帯性さび病)(Physopella zeae)、ごま葉枯病(Cochliobolus heterostrophus)、炭そ病(Colletotrichum graminicola)、グレーリーフスポット病(Cercospora zeae-maydis)、褐斑病(Kabatiella zeae)、ファエオスファエリアリーフスポット病(Phaeosphaeria maydis)、ディプローディア病(Stenocarpella maydis、Stenocarpella macrospora)、ストークロット病(Fusarium graminearum、Fusarium verticilioides、Colletotrichum graminicola)、黒穂病(Ustilago maydis);ワタの炭そ病(Colletotrichum gossypii)、白かび病(Ramularia areola)、黒斑病(Alternaria macrospora、A.gossypii)、Thielaviopsis属菌によるBlack root rot病 (Thielaviopsis basicola);コーヒーのさび病(Hemileia vastatrix)、リーフスポット病(Cercospora coffeicola);ナタネの菌核病(Sclerotinia sclerotiorum)、黒斑病(Alternaria brassicae)、根朽病(Phoma lingam);サトウキビのさび病 (Puccinia melanocephela、Puccinia kuehnii)、黒穂病 (Ustilago scitaminea);ヒマワリさび病 (Puccinia helianthi)、べと病(Plasmopara halstedii);カンキツ類の黒点病(Diaporthe citri)、そうか病(Elsinoe fawcetti)、果実腐敗病(Penicillium digitatum、P. italicum)、疫病 (Phytophthora parasitica、Phytophthora citrophthora);リンゴのモニリア病(Monilinia mali)、腐らん病(Valsa ceratosperma)、うどんこ病(Podosphaera leucotricha)、斑点落葉病(Alternaria alternata apple pathotype)、黒星病(Venturia inaequalis)、炭そ病(Glomerella cingulata)、褐斑病(Diplocarpon mali)、輪紋病(Botryosphaeria berengeriana)、疫病 (Phytophtora cactorum);ナシの黒星病(Venturia nashicola、V. pirina)、黒斑病(Alternaria alternata Japanese pear pathotype)、赤星病(Gymnosporangium haraeanum);モモの灰星病(Monilinia fructicola)、黒星病(Cladosporium carpophilum)、フォモプシス腐敗病(Phomopsis sp.);ブドウの黒とう病(Elsinoe ampelina)、晩腐病(Glomerella cingulata)、うどんこ病(Uncinula necator)、さび病(Phakopsora ampelopsidis)、ブラックロット病(Guignardia bidwellii)、べと病(Plasmopara viticola);カキの炭そ病(Gloeosporium kaki)、落葉病(Cercospora kaki、Mycosphaerella nawae);ウリ類の炭そ病(Colletotrichum lagenarium)、うどんこ病(Sphaerotheca fuliginea)、つる枯病(Didymella bryoniae)、褐斑病(Corynespora cassiicola)、つる割病(Fusarium oxysporum)、べと病(Pseudoperonospora cubensis)、疫病(Phytophthora sp.)、苗立枯病(Pythium sp.);トマトの輪紋病(Alternaria solani)、葉かび病(Cladosporium fulvum)、すすかび病(Pseudocercospora fuligena)、疫病(Phytophthora infestans)、うどんこ病(Leveillula taurica);ナスの褐紋病(Phomopsis vexans)、うどんこ病(Erysiphe cichoracearum);アブラナ科野菜の黒斑病(Alternaria japonica)、白斑病(Cercosporella brassicae)、根こぶ病(Plasmodiophora brassicae)、べと病(Peronospora parasitica);ネギのさび病(Puccinia allii);ダイズの紫斑病(Cercospora kikuchii)、黒とう病(Elsinoe glycines)、黒点病(Diaporthe phaseolorum var. sojae)、さび病(Phakopsora pachyrhizi)、褐色輪紋病(Corynespora cassiicola)、炭疽病(Colletotrithum glycines、C.truncatum)、葉腐病(Rhizoctonia solani)、褐紋病(Septoria glycines)、斑点病(Cercospora sojina)、菌核病(Sclerotinia sclerotiorum)、うどんこ病(Microsphaera diffusa)、茎疫病 (Phytophthora sojae)、べと病(Peronospora manshurica)、突然死病(Fusarium virguliforme);インゲンの、菌核病(Sclerotinia sclerotiorum)、さび病(Uromyces appendiculatus)、角斑病(Phaeoisariopsis griseola)、炭そ病(Colletotrichum lindemthianum)、;ラッカセイの黒渋病(Cercospora personata)、褐斑病(Cercospora arachidicola)、白絹病(Sclerotium rolfsii);エンドウのうどんこ病(Erysiphe pisi);ジャガイモの夏疫病(Alternaria solani)、疫病(Phytophthora infestans)、緋色腐敗病 (Phytophthora erythroseptica)、粉状そうか病 (Spongospora subterranean f. sp. subterranea)、半身萎凋病(Verticillium albo-atrum、V. dahliae、V. nigrescens);イチゴのうどんこ病(Sphaerotheca humuli);チャの網もち病(Exobasidium reticulatum)、白星病(Elsinoe leucospila)、輪斑病(Pestalotiopsis sp.)、炭そ病(Colletotrichum theae-sinensis);タバコの赤星病(Alternaria longipes)、炭そ病(Colletotrichum tabacum)、べと病(Peronospora tabacina)、疫病(Phytophthora nicotianae);テンサイの褐斑病(Cercospora beticola)、葉腐病(Thanatephorus cucumeris)、根腐病(Thanatephorus cucumeris)、黒根病(Aphanomyces cochlioides);バラの黒星病(Diplocarpon rosae)、うどんこ病(Sphaerotheca pannosa);キクの褐斑病(Septoria chrysanthemi-indici)、白さび病(Puccinia horiana);タマネギの白斑葉枯病(Botrytis cinerea、B. byssoidea、B. squamosa)、灰色腐敗病(Botrytis alli)、小菌核性腐敗病(Botrytis squamosa);種々の作物の灰色かび病(Botrytis cinerea)、菌核病(Sclerotinia sclerotiorum);ダイコン黒斑病(Alternaria brassicicola);シバのダラースポット病(Sclerotinia homeocarpa)、シバのブラウンパッチ病及びラージパッチ病(Rhizoctonia solani);並びにバナナのシガトカ病(Mycosphaerella fijiensis、Mycosphaerella musicola)。
Aspergillus属、Penicillium属、Fusarium属、Gibberella属、Tricoderma属、Thielaviopsis属、Rhizopus属、Mucor属、Corticium属、Phoma属、Rhizoctonia属、及びDiplodia属菌等によって引き起こされる、各種作物の種子病害又は生育初期の病害。Polymixa属又はOlpidium属等によって媒介される各種作物のウイルス病。
イネの苗立枯細菌病(Burkholderia plantarii);キュウリの斑点細菌病(Pseudomonas syringae pv. Lachrymans);ナスの青枯病(Ralstonia solanacearum)、カンキツのかいよう病(Xanthomonas citiri);ハクサイの軟腐病(Erwinia carotovora)等。 Plant pathogens: Rice blast (Magnaporthe grisea), sesame leaf blight (Cochliobolus miyabeanus), blight (Rhizoctonia solani), idiot seedling (Gibberella fujikuroi), yellow dwarf (Sclerophthora macrospora); wheat udon Disease (Erysiphe graminis), red mold disease (Fusarium graminearum, F. avenaceum, F. culmorum, Microdochium nivale), rust disease (Puccinia striiformis, P. graminis, P. recondita), red snow rot (Microdochium nivale, M. majus), Snow rot, Mycobacterium tuberculosis (Typhula sp.), Bare scab (Ustilago tritici), Nagusa scab (Tilletia caries, T. controversa), Eye rot (Pseudocercosporella herpotrichoides), Leaf blight (Septoria tritici) , Dry blight (Stagonospora nodorum), yellow spot (Pyrenophora tritici-repentis), Rhizoctonia solani, blight (Gaeumannomyces graminis); barley powdery mildew (Erysiphe graminis), red Mold fungus (F usarium graminearum, F. avenaceum, F. culmorum, Microdochium nivale), rust disease (Puccinia striiformis, P.graminis, P.hordei), naked scab (Ustilago nuda), cloud disease (Rhynchosporium secalis), net leaf disease (Pyrenophora) teres), spot disease (Cochliobolus sativus), leafy leaf disease (Pyrenophora graminea), lambaria disease (Ramularia collo-cygni), Rhizoctonia solani (Rhizoctonia solani); corn rust (Puccinia sorghi), southern Rust (Puccinia polysora), soot rot (Setosphaeria turcica), tropical rust (Physopella zeae), sesame leaf blight (Cochliobolus heterostrophus), anthracnose (Colletotrichum graminicola), gray leaf spot (Cercospora zeae-) maydis), brown spot disease (Kabatiella zeae), Faeosphaeria reef spot disease (Phaeosphaeria maydis), diplodia disease (Stenocarpella maydis, Stenocarpella macrospora), stoe Lot disease (Fusarium graminearum, Fusarium verticilioides, Colletotrichum graminicola), smut (Ustilago maydis); Cotton anthracnose (Colletotrichum gossypii), mildew (Ramularia areola), black spot (Alternaria macrospora, A. gossypii), Black root rot disease caused by Thielaviopsis (Thielaviopsis basicola); coffee rust (Hemileia vastatrix); leaf spot disease (Cercospora coffeicola); rape myeloid disease (Sclerotinia sclerotiorum); black spot disease (Alternaria brassicae); Disease (Phoma lingam); sugarcane rust (Puccinia melanocephela, Puccinia kuehnii), smut (Ustilago scitaminea); sunflower rust (Puccinia helianthi), downy mildew (Plasmopara halstedii); citrus black spot tri (Dia) Common scab (Elsinoe fawcetti), fruit rot (Penicillium digitatum, P. italicum), plague (Phytophthora parasitica, Phytophthora citrophthora); apple monili Disease (Monilinia mali), rot (Valsa ceratosperma), powdery mildew (Podosphaera leucotricha), spotted leaf disease (Alternaria alternata apple pathotype), black spot disease (Venturia inaequalis), anthracnose (Glomerella cingulata), brown leaf disease ( Diplocarpon mali), ring rot (Botryosphaeria berengeriana), plague (Phytophtora cactorum); pear scab (Venturia nashicola, V. pirina), black spot (Alternaria alternata Japanese pear pathotype), red scab (Gymnosporangium haraeanum); Ascidian disease (Monilinia fructicola), black scab (Cladosporium carpophilum), phomopsis sp. (Phomopsis sp.); Grape black scab (Elsinoe ampelina), late rot (Glomerella cingulata), powdery mildew (Uncinula necator) , Rust (Phakopsora ampelopsidis), blacklot (Guignardia bidwellii), downy mildew (Plasmopara viticola); oyster anthracnose (Gloeosporium kaki), deciduous leaf (Cercospora kaki, Mycosp) haerella nawae); Colletotrichum lagenarium, powdery mildew (Sphaerotheca fuliginea), vine blight (Didymella bryoniae), brown spot (Corynespora cassiicola), vine split disease (Fusarium oxysporum), downy mildew (Pseudoperonospora cubensis), plague (Phytophthora sp.), Seedling blight (Pythium sp.); Tomato ring-rot (Alternaria solani), leaf mold (Cladosporium fulvum), subtilis (Pseudocercospora fuligena), plague ( Phytophthora infestans), powdery mildew (Leveillula taurica); eggplant brown spot (Phomopsis vexans), powdery mildew (Erysiphe cichoracearum); cruciferous vegetable black spot (Alternaria japonica), white spot (Cercosporella brassicae), root Clubroot (Plasmodiophora brassicae), downy mildew (Peronospora parasitica); spring onion rust (Puccinia allii); soybean purpura (Cercospora kikuchii), black scab (Elsinoe glycines), black spot (Diaporthe phaseolorum va) r. sojae), rust disease (Phakopsora pachyrhizi), brown ring rot (Corynespora cassiicola), anthrax (Colletotrithum glycines, C. truncatum), leaf rot (Rhizoctonia solani), brown rot (Septoria glycines), spot disease (Cercospora sojina), mycorrhizal disease (Sclerotinia sclerotiorum), powdery mildew (Microsphaera diffusa), stem blight (Phytophthora sojae), downy mildew (Peronospora manshurica), sudden death (Fusarium virguliforme); (Sclerotinia sclerotiorum), rust disease (Uromyces appendiculatus), horn spot disease (Phaeoisariopsis griseola), anthrax (Colletotrichum lindemthianum); groundnut black rot (Cercospora personata), brown spot disease (Cercospora arachidicola), white silk disease (Sclerotium rolfsii); Pea powdery mildew (Erysiphe pisi); Potato summer plague (Alternaria solani), plague (Phytophthora infestans), scarlet rot (Phytophthora erythroseptica), powdery scab (Sp ongospora subterranean f. sp. subterranea), half body wilt (Verticillium albo-atrum, V. dahliae, V. nigrescens); strawberry powdery mildew (Sphaerotheca humuli); Elsinoe leucospila), ring spot disease (Pestalotiopsis sp.), Anthracnose (Colletotrichum theae-sinensis); tobacco scab (Alternaria longipes), anthracnose (Colletotrichum tabacum), downy mildew (Peronospora tabacina), plague ( Phytophthora nicotianae); Brown spot of sugar beet (Cercospora beticola), leaf rot (Thanatephorus cucumeris), root rot (Thanatephorus cucumeris), black root (Aphanomyces cochlioides); black spot of rose (Diplocarpon rosae), powdery mildew Sphaerotheca pannosa); chrysanthemum leaf spot (Septoria chrysanthemi-indici), white rust (Puccinia horiana); onion leaf spot (Botrytis cinerea, B. byssoidea, B. squamosa), gray rot (Botrytis alli) ,small Botrytis squamosa; various crops of gray mold (Botrytis cinerea); mycorrhizal disease (Sclerotinia sclerotiorum); radish black spot disease (Alternaria brassicicola); shiba dull spot disease (Sclerotinia homeocarpa); Brown patch disease and large patch disease (Rhizoctonia solani); and banana Sigatoka disease (Mycosphaerella fijiensis, Mycosphaerella musicola).
Seed disease or early growth of various crops caused by Aspergillus, Penicillium, Fusarium, Gibberella, Tricoderma, Thielaviopsis, Rhizopus, Mucor, Corticium, Phoma, Rhizoctonia, and Diplodia Disease. Viral diseases of various crops mediated by Polymixa genus or Olpidium genus.
Rice seed blight (Burkholderia plantarii); Cucumber spotted bacterial disease (Pseudomonas syringae pv. Lachrymans); Eggplant blight (Ralstonia solanacearum); Citrus scab (Xanthomonas citiri); carotovora) etc.
Aspergillus属、Penicillium属、Fusarium属、Gibberella属、Tricoderma属、Thielaviopsis属、Rhizopus属、Mucor属、Corticium属、Phoma属、Rhizoctonia属、及びDiplodia属菌等によって引き起こされる、各種作物の種子病害又は生育初期の病害。Polymixa属又はOlpidium属等によって媒介される各種作物のウイルス病。
イネの苗立枯細菌病(Burkholderia plantarii);キュウリの斑点細菌病(Pseudomonas syringae pv. Lachrymans);ナスの青枯病(Ralstonia solanacearum)、カンキツのかいよう病(Xanthomonas citiri);ハクサイの軟腐病(Erwinia carotovora)等。 Plant pathogens: Rice blast (Magnaporthe grisea), sesame leaf blight (Cochliobolus miyabeanus), blight (Rhizoctonia solani), idiot seedling (Gibberella fujikuroi), yellow dwarf (Sclerophthora macrospora); wheat udon Disease (Erysiphe graminis), red mold disease (Fusarium graminearum, F. avenaceum, F. culmorum, Microdochium nivale), rust disease (Puccinia striiformis, P. graminis, P. recondita), red snow rot (Microdochium nivale, M. majus), Snow rot, Mycobacterium tuberculosis (Typhula sp.), Bare scab (Ustilago tritici), Nagusa scab (Tilletia caries, T. controversa), Eye rot (Pseudocercosporella herpotrichoides), Leaf blight (Septoria tritici) , Dry blight (Stagonospora nodorum), yellow spot (Pyrenophora tritici-repentis), Rhizoctonia solani, blight (Gaeumannomyces graminis); barley powdery mildew (Erysiphe graminis), red Mold fungus (F usarium graminearum, F. avenaceum, F. culmorum, Microdochium nivale), rust disease (Puccinia striiformis, P.graminis, P.hordei), naked scab (Ustilago nuda), cloud disease (Rhynchosporium secalis), net leaf disease (Pyrenophora) teres), spot disease (Cochliobolus sativus), leafy leaf disease (Pyrenophora graminea), lambaria disease (Ramularia collo-cygni), Rhizoctonia solani (Rhizoctonia solani); corn rust (Puccinia sorghi), southern Rust (Puccinia polysora), soot rot (Setosphaeria turcica), tropical rust (Physopella zeae), sesame leaf blight (Cochliobolus heterostrophus), anthracnose (Colletotrichum graminicola), gray leaf spot (Cercospora zeae-) maydis), brown spot disease (Kabatiella zeae), Faeosphaeria reef spot disease (Phaeosphaeria maydis), diplodia disease (Stenocarpella maydis, Stenocarpella macrospora), stoe Lot disease (Fusarium graminearum, Fusarium verticilioides, Colletotrichum graminicola), smut (Ustilago maydis); Cotton anthracnose (Colletotrichum gossypii), mildew (Ramularia areola), black spot (Alternaria macrospora, A. gossypii), Black root rot disease caused by Thielaviopsis (Thielaviopsis basicola); coffee rust (Hemileia vastatrix); leaf spot disease (Cercospora coffeicola); rape myeloid disease (Sclerotinia sclerotiorum); black spot disease (Alternaria brassicae); Disease (Phoma lingam); sugarcane rust (Puccinia melanocephela, Puccinia kuehnii), smut (Ustilago scitaminea); sunflower rust (Puccinia helianthi), downy mildew (Plasmopara halstedii); citrus black spot tri (Dia) Common scab (Elsinoe fawcetti), fruit rot (Penicillium digitatum, P. italicum), plague (Phytophthora parasitica, Phytophthora citrophthora); apple monili Disease (Monilinia mali), rot (Valsa ceratosperma), powdery mildew (Podosphaera leucotricha), spotted leaf disease (Alternaria alternata apple pathotype), black spot disease (Venturia inaequalis), anthracnose (Glomerella cingulata), brown leaf disease ( Diplocarpon mali), ring rot (Botryosphaeria berengeriana), plague (Phytophtora cactorum); pear scab (Venturia nashicola, V. pirina), black spot (Alternaria alternata Japanese pear pathotype), red scab (Gymnosporangium haraeanum); Ascidian disease (Monilinia fructicola), black scab (Cladosporium carpophilum), phomopsis sp. (Phomopsis sp.); Grape black scab (Elsinoe ampelina), late rot (Glomerella cingulata), powdery mildew (Uncinula necator) , Rust (Phakopsora ampelopsidis), blacklot (Guignardia bidwellii), downy mildew (Plasmopara viticola); oyster anthracnose (Gloeosporium kaki), deciduous leaf (Cercospora kaki, Mycosp) haerella nawae); Colletotrichum lagenarium, powdery mildew (Sphaerotheca fuliginea), vine blight (Didymella bryoniae), brown spot (Corynespora cassiicola), vine split disease (Fusarium oxysporum), downy mildew (Pseudoperonospora cubensis), plague (Phytophthora sp.), Seedling blight (Pythium sp.); Tomato ring-rot (Alternaria solani), leaf mold (Cladosporium fulvum), subtilis (Pseudocercospora fuligena), plague ( Phytophthora infestans), powdery mildew (Leveillula taurica); eggplant brown spot (Phomopsis vexans), powdery mildew (Erysiphe cichoracearum); cruciferous vegetable black spot (Alternaria japonica), white spot (Cercosporella brassicae), root Clubroot (Plasmodiophora brassicae), downy mildew (Peronospora parasitica); spring onion rust (Puccinia allii); soybean purpura (Cercospora kikuchii), black scab (Elsinoe glycines), black spot (Diaporthe phaseolorum va) r. sojae), rust disease (Phakopsora pachyrhizi), brown ring rot (Corynespora cassiicola), anthrax (Colletotrithum glycines, C. truncatum), leaf rot (Rhizoctonia solani), brown rot (Septoria glycines), spot disease (Cercospora sojina), mycorrhizal disease (Sclerotinia sclerotiorum), powdery mildew (Microsphaera diffusa), stem blight (Phytophthora sojae), downy mildew (Peronospora manshurica), sudden death (Fusarium virguliforme); (Sclerotinia sclerotiorum), rust disease (Uromyces appendiculatus), horn spot disease (Phaeoisariopsis griseola), anthrax (Colletotrichum lindemthianum); groundnut black rot (Cercospora personata), brown spot disease (Cercospora arachidicola), white silk disease (Sclerotium rolfsii); Pea powdery mildew (Erysiphe pisi); Potato summer plague (Alternaria solani), plague (Phytophthora infestans), scarlet rot (Phytophthora erythroseptica), powdery scab (Sp ongospora subterranean f. sp. subterranea), half body wilt (Verticillium albo-atrum, V. dahliae, V. nigrescens); strawberry powdery mildew (Sphaerotheca humuli); Elsinoe leucospila), ring spot disease (Pestalotiopsis sp.), Anthracnose (Colletotrichum theae-sinensis); tobacco scab (Alternaria longipes), anthracnose (Colletotrichum tabacum), downy mildew (Peronospora tabacina), plague ( Phytophthora nicotianae); Brown spot of sugar beet (Cercospora beticola), leaf rot (Thanatephorus cucumeris), root rot (Thanatephorus cucumeris), black root (Aphanomyces cochlioides); black spot of rose (Diplocarpon rosae), powdery mildew Sphaerotheca pannosa); chrysanthemum leaf spot (Septoria chrysanthemi-indici), white rust (Puccinia horiana); onion leaf spot (Botrytis cinerea, B. byssoidea, B. squamosa), gray rot (Botrytis alli) ,small Botrytis squamosa; various crops of gray mold (Botrytis cinerea); mycorrhizal disease (Sclerotinia sclerotiorum); radish black spot disease (Alternaria brassicicola); shiba dull spot disease (Sclerotinia homeocarpa); Brown patch disease and large patch disease (Rhizoctonia solani); and banana Sigatoka disease (Mycosphaerella fijiensis, Mycosphaerella musicola).
Seed disease or early growth of various crops caused by Aspergillus, Penicillium, Fusarium, Gibberella, Tricoderma, Thielaviopsis, Rhizopus, Mucor, Corticium, Phoma, Rhizoctonia, and Diplodia Disease. Viral diseases of various crops mediated by Polymixa genus or Olpidium genus.
Rice seed blight (Burkholderia plantarii); Cucumber spotted bacterial disease (Pseudomonas syringae pv. Lachrymans); Eggplant blight (Ralstonia solanacearum); Citrus scab (Xanthomonas citiri); carotovora) etc.
対象の有害昆虫、有害ダニ類、有害線虫類及び植物病原菌は、殺虫・殺ダニ剤・殺線虫剤・殺菌剤に薬剤感受性の低下した、または薬剤抵抗性の発達した昆虫、ダニ類、線虫類、植物病原菌類であってもよい。ただし、薬剤感受性が大幅に低下した、または薬剤抵抗性が大幅に発達した場合は、その対象となる殺虫・殺ダニ・殺線虫・殺菌剤以外の殺虫・殺ダニ・殺線虫・殺菌剤を含む本発明組成物の使用が望ましい。
The target harmful insects, harmful mites, harmful nematodes and phytopathogenic fungi are insects, mites, insecticides, acaricides, nematicides, fungicides with reduced drug sensitivity or developed drug resistance. Nematodes and phytopathogenic fungi may be used. However, if the drug sensitivity is significantly reduced or the drug resistance is greatly developed, insecticides, acaricides, nematicides and fungicides other than the target insecticides, acaricides, nematicides and fungicides The use of a composition of the invention comprising
本発明組成物は、昆虫媒介性ウイルスによる植物病害から植物を保護するためにも用いることができる。
The composition of the present invention can also be used to protect plants from plant diseases caused by insect-borne viruses.
本発明組成物が防除効力を有する昆虫媒介性ウイルスによる植物病害としては、例えば次のものが挙げられる。
Examples of plant diseases caused by insect-borne viruses having the control effect of the composition of the present invention include the following.
イネわい化病(Rice waika virus)、ツングロ病(Rice tungro spherical virus、Rice tungro bacilliform virus)、イネグラッシースタント病(Rice grassy stunt virus)、イネラギッドスタント病(Rice ragged stunt virus)、稲縞葉枯れ病(Rice stripe virus)、黒すじ委縮病(Rice black streaked dwarf virus)、イネ南方黒すじ委縮病(Southern rice black-streaked dwarf virus)、稲こぶ萎縮病(Rice gall dwarf virus)、稲葉枯れ病(Rice hoja blanca virus)、イネ白葉病(White leaf desease of rice)、黄化萎縮病(Yellow dwarf virus)、Red disease(Rice penyakit merah virus)、イネ黄葉病(Rice yellow stunt virus)、トランジトリーイエローイング病(Rice transitory yellowing virus)、イネ黄斑病(Rice Yellow Mottle Virus)、イネえそモザイクウイルス(Rice necrosis mosaic virus)、イネ萎縮病(Rice dwarf stunt virus)、ムギ北地モザイク病(Northern Cereal Mosaic Virus)、オオムギ黄化萎縮病(Barley Yellow Dwarf Virus)、コムギ黄葉病(Wheat yellow dwarf virus )、Oat sterile dwarf(Oat sterile dwarf virus)、Wheat streak mosaic(Wheat streak mosaic virus)
トウモロコシモザイク病(Maize dwarf mosaic virus)、Maize stripe disease(maize stripe tenuivirus)、Maize chlorotic dwarf(Maize chlorotic dwarf virus)、Maize chlorotic mottle(maize chlorotic mottle virus)、Maize rayado fino(maize rayado fino marafivirus)、Corn stunt(Corn stunt spiroplasma)、Maize bushy stunt(Maize bushy stunt phytoplasma)、サトウキビモザイク病(Sugarcane mosaic virus)、
ダイズ微斑モザイク病(Soybean mild mosaic virus)、モザイク病(Alfalfa Mosaic Virus、Bean yellow―spot mosaic virus、Soybean mosaic virus、Bean yellow mosaic virus、 Cowpea severe mosaic virus)、ダイズウイルス病(Broad bean wilt virus、 Bean common mosaic virus、 Peanut stunt virus、Southern bean mosaic virus)、ダイズ矮化病(Soybean dwarf luteovirus、Milk-vetch dwarf luteovirus)、Bean-pod mottle(Bean-pod mottle virus)、Brazilian bud blight(Tobbaco streak virus)、Cowpea chlorotic mottle(Cowpea chlorotic mottle)、Mung bean yellow mosaic(Mung bean yellow mosaic virus)、Peanut stripe(Peanut stripe mottle)、Soybean crinkle leaf(Soybean crinkle leaf virus)、Soybean severe stunt(Soybean severe stunt virus)、トマト黄化病(Tomato chlorosis virus)、トマト黄化えそ病(Tomato spotted wilt virus)、トマト黄化葉巻病(Tomato yellow leaf curl virus)、メロン黄化えそ病(Melon yellow spot virus)、カボチャモザイク病(Watermelon mosaic virus)、萎縮病(Cucumber mosaic virus)、ズッキーニ黄斑モザイク病(Zucchini yellow mosaic virus)、カブモザイク病(Turnip mosaic virus)、ウリ類退緑黄化病(Cucurbit chlorotic yellows virus)、退緑斑紋病(Capsicum chlorosis virus)、キュウリ黄化病(Beet pseudo yellows virus)、キク茎えそ病(chrysanthemum stem necrosis virus)、インパチェンスネクロティックスポット病(Impatiens necrotic spot virus)、アイリスイエロースポット(Iris yellow spot virus)、サツマイモ斑紋モザイク病(Sweet potato internal cork virus)、サツマイモ縮葉モザイク病(Sweet potato shukuyo mosaic virus)、Polymixa属またはOlpidium属等によって媒介される各種植物のモザイクウイルス病。 Rice dwarf disease (Rice waika virus), Tundra disease (Rice tungro spherical virus, Rice tungro bacilliform virus), Rice grassy stunt disease (Rice grassy stunt virus), Rice ragged stunt virus, rice stripe leaf blight Diseases (Rice stripe virus), rice black streaked dwarf virus, rice southern black-streaked dwarf virus, rice gall dwarf virus, rice leaf blight ( Rice hoja blanca virus), White leaf desease of rice, Yellow dwarf virus, Red disease (Rice penyakit merah virus), Rice yellow stunt virus, Transition yellowing Disease (Rice transitory yellowing virus), rice yellow disease (Rice Yellow Mottle Virus), rice necrosis mosaic virus, rice dwarf stunt virus, northern wheat mosaic disease (No rthern Cereal Mosaic Virus), Barley Yellow Dwarf Virus, Wheat yellow dwarf virus, Oat sterile dwarf (Oat sterile dwarf virus), Wheat streak mosaic (Wheat streak mosaic virus)
Maize mosaic disease, Maize stripe disease (maize stripe tenuivirus), Maize chlorotic dwarf (Maize chlorotic dwarf virus), Maize chlorotic mottle (maize chlorotic mottle virus), Maize rayado fino (maize rayado fino marafivirus), Corn stunt (Corn stunt spiroplasma), Maize bushy stunt (Maize bushy stunt phytoplasma), sugar cane mosaic disease (Sugarcane mosaic virus),
Soybean mild mosaic virus, Mosaic disease (Alfalfa Mosaic Virus, Bean yellow-spot mosaic virus, Soybean mosaic virus, Bean yellow mosaic virus, Cowpea severe mosaic virus), Soybean virus disease (Broad bean wilt virus, Bean common mosaic virus, Peanut stunt virus, Southern bean mosaic virus), soybean dwarf luteovirus, Milk-vetch dwarf luteovirus, Bean-pod mottle (Bean-pod mottle virus), Brazilian bud blight (Tobbaco streak virus) ), Cowpea chlorotic mottle (Cowpea chlorotic mottle), Mung bean yellow mosaic (Mung bean yellow mosaic virus), Peanut stripe (Peanut stripe mottle), Soybean crinkle leaf (Soybean crinkle leaf virus), Soybean severe stunt (Soybean severe stunt virus) , Tomato chlorosis virus, Tomato spotted wilt virus, Tomato yellow leaf curl virus, Melon yellow wilt (Melon) yellow spot virus, pumpkin mosaic virus, Cucumber mosaic virus, Zucchini yellow mosaic virus, turnip mosaic virus, cucurbit yellowing disease ( Cucurbit chlorotic yellows virus), Capsicum chlorosis virus, Beet pseudo yellows virus, Chrysanthemum stem necrosis virus, Impatiens necrotic spot virus , Iris yellow spot virus, Sweet potato internal cork virus, Sweet potato shukuyo mosaic virus, Polymixa genus or Olpidium genus Viral disease.
トウモロコシモザイク病(Maize dwarf mosaic virus)、Maize stripe disease(maize stripe tenuivirus)、Maize chlorotic dwarf(Maize chlorotic dwarf virus)、Maize chlorotic mottle(maize chlorotic mottle virus)、Maize rayado fino(maize rayado fino marafivirus)、Corn stunt(Corn stunt spiroplasma)、Maize bushy stunt(Maize bushy stunt phytoplasma)、サトウキビモザイク病(Sugarcane mosaic virus)、
ダイズ微斑モザイク病(Soybean mild mosaic virus)、モザイク病(Alfalfa Mosaic Virus、Bean yellow―spot mosaic virus、Soybean mosaic virus、Bean yellow mosaic virus、 Cowpea severe mosaic virus)、ダイズウイルス病(Broad bean wilt virus、 Bean common mosaic virus、 Peanut stunt virus、Southern bean mosaic virus)、ダイズ矮化病(Soybean dwarf luteovirus、Milk-vetch dwarf luteovirus)、Bean-pod mottle(Bean-pod mottle virus)、Brazilian bud blight(Tobbaco streak virus)、Cowpea chlorotic mottle(Cowpea chlorotic mottle)、Mung bean yellow mosaic(Mung bean yellow mosaic virus)、Peanut stripe(Peanut stripe mottle)、Soybean crinkle leaf(Soybean crinkle leaf virus)、Soybean severe stunt(Soybean severe stunt virus)、トマト黄化病(Tomato chlorosis virus)、トマト黄化えそ病(Tomato spotted wilt virus)、トマト黄化葉巻病(Tomato yellow leaf curl virus)、メロン黄化えそ病(Melon yellow spot virus)、カボチャモザイク病(Watermelon mosaic virus)、萎縮病(Cucumber mosaic virus)、ズッキーニ黄斑モザイク病(Zucchini yellow mosaic virus)、カブモザイク病(Turnip mosaic virus)、ウリ類退緑黄化病(Cucurbit chlorotic yellows virus)、退緑斑紋病(Capsicum chlorosis virus)、キュウリ黄化病(Beet pseudo yellows virus)、キク茎えそ病(chrysanthemum stem necrosis virus)、インパチェンスネクロティックスポット病(Impatiens necrotic spot virus)、アイリスイエロースポット(Iris yellow spot virus)、サツマイモ斑紋モザイク病(Sweet potato internal cork virus)、サツマイモ縮葉モザイク病(Sweet potato shukuyo mosaic virus)、Polymixa属またはOlpidium属等によって媒介される各種植物のモザイクウイルス病。 Rice dwarf disease (Rice waika virus), Tundra disease (Rice tungro spherical virus, Rice tungro bacilliform virus), Rice grassy stunt disease (Rice grassy stunt virus), Rice ragged stunt virus, rice stripe leaf blight Diseases (Rice stripe virus), rice black streaked dwarf virus, rice southern black-streaked dwarf virus, rice gall dwarf virus, rice leaf blight ( Rice hoja blanca virus), White leaf desease of rice, Yellow dwarf virus, Red disease (Rice penyakit merah virus), Rice yellow stunt virus, Transition yellowing Disease (Rice transitory yellowing virus), rice yellow disease (Rice Yellow Mottle Virus), rice necrosis mosaic virus, rice dwarf stunt virus, northern wheat mosaic disease (No rthern Cereal Mosaic Virus), Barley Yellow Dwarf Virus, Wheat yellow dwarf virus, Oat sterile dwarf (Oat sterile dwarf virus), Wheat streak mosaic (Wheat streak mosaic virus)
Maize mosaic disease, Maize stripe disease (maize stripe tenuivirus), Maize chlorotic dwarf (Maize chlorotic dwarf virus), Maize chlorotic mottle (maize chlorotic mottle virus), Maize rayado fino (maize rayado fino marafivirus), Corn stunt (Corn stunt spiroplasma), Maize bushy stunt (Maize bushy stunt phytoplasma), sugar cane mosaic disease (Sugarcane mosaic virus),
Soybean mild mosaic virus, Mosaic disease (Alfalfa Mosaic Virus, Bean yellow-spot mosaic virus, Soybean mosaic virus, Bean yellow mosaic virus, Cowpea severe mosaic virus), Soybean virus disease (Broad bean wilt virus, Bean common mosaic virus, Peanut stunt virus, Southern bean mosaic virus), soybean dwarf luteovirus, Milk-vetch dwarf luteovirus, Bean-pod mottle (Bean-pod mottle virus), Brazilian bud blight (Tobbaco streak virus) ), Cowpea chlorotic mottle (Cowpea chlorotic mottle), Mung bean yellow mosaic (Mung bean yellow mosaic virus), Peanut stripe (Peanut stripe mottle), Soybean crinkle leaf (Soybean crinkle leaf virus), Soybean severe stunt (Soybean severe stunt virus) , Tomato chlorosis virus, Tomato spotted wilt virus, Tomato yellow leaf curl virus, Melon yellow wilt (Melon) yellow spot virus, pumpkin mosaic virus, Cucumber mosaic virus, Zucchini yellow mosaic virus, turnip mosaic virus, cucurbit yellowing disease ( Cucurbit chlorotic yellows virus), Capsicum chlorosis virus, Beet pseudo yellows virus, Chrysanthemum stem necrosis virus, Impatiens necrotic spot virus , Iris yellow spot virus, Sweet potato internal cork virus, Sweet potato shukuyo mosaic virus, Polymixa genus or Olpidium genus Viral disease.
本発明組成物を有害生物防除に用いる場合、その施用量は、施用時期、施用場所、施用方法等に応じて、広範囲に変えることができるが、本ビピリジン化合物と本化合物との合計量は、10,000m2あたり通常1~10,000gである。本発明組成物が乳剤、水和剤、フロアブル剤等の製剤である場合は、通常、本ビピリジン化合物と本化合物との合計の濃度が0.01~10,000ppmとなるように本発明組成物は水で希釈して施用され、粒剤、粉剤等の場合、本発明組成物は、通常、そのまま施用される。
When the composition of the present invention is used for pest control, the application amount can vary widely depending on the application time, application place, application method, etc., but the total amount of the bipyridine compound and the compound is It is usually 1 to 10,000 g per 10,000 m 2 . When the composition of the present invention is a preparation such as an emulsion, wettable powder, flowable agent, etc., the composition of the present invention is usually adjusted so that the total concentration of the bipyridine compound and the compound is 0.01 to 10,000 ppm. Is applied diluted with water, and in the case of granules, powders, etc., the composition of the present invention is usually applied as it is.
本発明組成物を使用できる植物としては、例えば次が挙げられる。
トウモロコシ、イネ、コムギ、オオムギ、ライムギ、ライコムギ、エンバク、ソルガム、ワタ、ダイズ、ラッカセイ(ピーナッツ)、サイトウ(インゲンマメ)、ライマメ、アズキ、ササゲ、リョクトウ、ウラドマメ、ベニバナインゲン、タケアズキ、モスビーン、テパリービーン、ソラマメ、エンドウ、ヒヨコマメ、レンズマメ、ルーピン、キマメ、アルファルファ、ソバ、テンサイ、セイヨウアブラナ、ヒマワリ、サトウキビ、タバコ等の農作物、
ナス科野菜(ナス、トマト、ピーマン、トウガラシ、ベルペッパー、ジャガイモ等)、ウリ科野菜(キュウリ、カボチャ、ズッキーニ、スイカ、メロン、スカッシュ等)、アブラナ科野菜(ダイコン、カブ、セイヨウワサビ、コールラビ、ハクサイ、キャベツ、カラシナ、ブロッコリー、カリフラワー等)、キク科野菜(ゴボウ、シュンギク、アーティチョーク、レタス等)、ユリ科野菜(ネギ、タマネギ、ニンニク、アスパラガス等)、セリ科野菜(ニンジン、パセリ、セロリ、アメリカボウフウ等)、アカザ科野菜(ホウレンソウ、フダンソウ等)、シソ科野菜(シソ、ミント、バジル、ラベンダー等)、イチゴ、サツマイモ、ヤマノイモ、サトイモ等の野菜、
仁果類(リンゴ、セイヨウナシ、ニホンナシ、カリン、マルメロ等)、核果類(モモ、スモモ、ネクタリン、ウメ、オウトウ、アンズ、プルーン等)、カンキツ類(ウンシュウミカン、オレンジ、レモン、ライム、グレープフルーツ等)、堅果類(クリ、クルミ、ハシバミ、アーモンド、ピスタチオ、カシューナッツ、マカダミアナッツ等)、液果類(ブルーベリー、クランベリー、ブラックベリー、ラズベリー等)、ブドウ、カキ、オリーブ、ビワ、バナナ、コーヒー、ナツメヤシ、ココヤシ等の果樹、
茶、クワ、花木、街路樹(トネリコ、カバノキ、ハナミズキ、ユーカリ、イチョウ、ライラック、カエデ、カシ、ポプラ、ハナズオウ、フウ、プラタナス、ケヤキ、クロベ、モミノキ、ツガ、ネズ、マツ、トウヒ、イチイ)、花卉、 観葉植物、シバ類、牧草類。 Examples of plants that can use the composition of the present invention include the following.
Corn, rice, wheat, barley, rye, triticale, oat, sorghum, cotton, soybean, groundnut (peanut), cypress (green beans), lentil, azuki bean, cowpea, mung bean, ladamame, safflower beans, bamboo shoots, moss bean, tepareen beans , Peas, chickpeas, lentils, lupines, pigeons, alfalfa, buckwheat, sugar beet, rape, sunflower, sugarcane, tobacco, etc.
Eggplant vegetable (eggplant, tomato, pepper, pepper, bell pepper, potato), cucumber vegetable (cucumber, pumpkin, zucchini, watermelon, melon, squash, etc.), cruciferous vegetable (radish, turnip, horseradish, kohlrabi, Chinese cabbage, cabbage, mustard, broccoli, cauliflower, etc.), Asteraceae vegetables (burdock, garlic, artichoke, lettuce, etc.), liliaceae vegetables (eg, leek, onion, garlic, asparagus), celery family vegetables (carrot, parsley, celery) , American Bow Fu etc.), red crustacean vegetables (spinach, chard, etc.), perilla vegetables (shiso, mint, basil, lavender etc.), vegetables such as strawberry, sweet potato, yam, taro,
Fruits (apples, pears, Japanese pears, quince, quince, etc.), nuclear fruits (peaches, plums, nectarines, ume, sweet cherry, apricots, prunes, etc.), citrus (citrus oranges, oranges, lemons, limes, grapefruits, etc.) , Nuts (chestnuts, walnuts, hazel, almonds, pistachios, cashew nuts, macadamia nuts, etc.), berries (blueberries, cranberries, blackberries, raspberries, etc.), grapes, oysters, olives, loquats, bananas, coffee, dates, Fruit trees such as coconut,
Tea, mulberry, flowering trees, roadside trees (ash, birch, dogwood, eucalyptus, ginkgo, lilac, maple, oak, poplar, redwood, fus, sycamore, zelkova, kurobe, mominoki, tsuga, nezu, pine, spruce, yew), Flower buds, houseplants, ferns, pastures.
トウモロコシ、イネ、コムギ、オオムギ、ライムギ、ライコムギ、エンバク、ソルガム、ワタ、ダイズ、ラッカセイ(ピーナッツ)、サイトウ(インゲンマメ)、ライマメ、アズキ、ササゲ、リョクトウ、ウラドマメ、ベニバナインゲン、タケアズキ、モスビーン、テパリービーン、ソラマメ、エンドウ、ヒヨコマメ、レンズマメ、ルーピン、キマメ、アルファルファ、ソバ、テンサイ、セイヨウアブラナ、ヒマワリ、サトウキビ、タバコ等の農作物、
ナス科野菜(ナス、トマト、ピーマン、トウガラシ、ベルペッパー、ジャガイモ等)、ウリ科野菜(キュウリ、カボチャ、ズッキーニ、スイカ、メロン、スカッシュ等)、アブラナ科野菜(ダイコン、カブ、セイヨウワサビ、コールラビ、ハクサイ、キャベツ、カラシナ、ブロッコリー、カリフラワー等)、キク科野菜(ゴボウ、シュンギク、アーティチョーク、レタス等)、ユリ科野菜(ネギ、タマネギ、ニンニク、アスパラガス等)、セリ科野菜(ニンジン、パセリ、セロリ、アメリカボウフウ等)、アカザ科野菜(ホウレンソウ、フダンソウ等)、シソ科野菜(シソ、ミント、バジル、ラベンダー等)、イチゴ、サツマイモ、ヤマノイモ、サトイモ等の野菜、
仁果類(リンゴ、セイヨウナシ、ニホンナシ、カリン、マルメロ等)、核果類(モモ、スモモ、ネクタリン、ウメ、オウトウ、アンズ、プルーン等)、カンキツ類(ウンシュウミカン、オレンジ、レモン、ライム、グレープフルーツ等)、堅果類(クリ、クルミ、ハシバミ、アーモンド、ピスタチオ、カシューナッツ、マカダミアナッツ等)、液果類(ブルーベリー、クランベリー、ブラックベリー、ラズベリー等)、ブドウ、カキ、オリーブ、ビワ、バナナ、コーヒー、ナツメヤシ、ココヤシ等の果樹、
茶、クワ、花木、街路樹(トネリコ、カバノキ、ハナミズキ、ユーカリ、イチョウ、ライラック、カエデ、カシ、ポプラ、ハナズオウ、フウ、プラタナス、ケヤキ、クロベ、モミノキ、ツガ、ネズ、マツ、トウヒ、イチイ)、花卉、 観葉植物、シバ類、牧草類。 Examples of plants that can use the composition of the present invention include the following.
Corn, rice, wheat, barley, rye, triticale, oat, sorghum, cotton, soybean, groundnut (peanut), cypress (green beans), lentil, azuki bean, cowpea, mung bean, ladamame, safflower beans, bamboo shoots, moss bean, tepareen beans , Peas, chickpeas, lentils, lupines, pigeons, alfalfa, buckwheat, sugar beet, rape, sunflower, sugarcane, tobacco, etc.
Eggplant vegetable (eggplant, tomato, pepper, pepper, bell pepper, potato), cucumber vegetable (cucumber, pumpkin, zucchini, watermelon, melon, squash, etc.), cruciferous vegetable (radish, turnip, horseradish, kohlrabi, Chinese cabbage, cabbage, mustard, broccoli, cauliflower, etc.), Asteraceae vegetables (burdock, garlic, artichoke, lettuce, etc.), liliaceae vegetables (eg, leek, onion, garlic, asparagus), celery family vegetables (carrot, parsley, celery) , American Bow Fu etc.), red crustacean vegetables (spinach, chard, etc.), perilla vegetables (shiso, mint, basil, lavender etc.), vegetables such as strawberry, sweet potato, yam, taro,
Fruits (apples, pears, Japanese pears, quince, quince, etc.), nuclear fruits (peaches, plums, nectarines, ume, sweet cherry, apricots, prunes, etc.), citrus (citrus oranges, oranges, lemons, limes, grapefruits, etc.) , Nuts (chestnuts, walnuts, hazel, almonds, pistachios, cashew nuts, macadamia nuts, etc.), berries (blueberries, cranberries, blackberries, raspberries, etc.), grapes, oysters, olives, loquats, bananas, coffee, dates, Fruit trees such as coconut,
Tea, mulberry, flowering trees, roadside trees (ash, birch, dogwood, eucalyptus, ginkgo, lilac, maple, oak, poplar, redwood, fus, sycamore, zelkova, kurobe, mominoki, tsuga, nezu, pine, spruce, yew), Flower buds, houseplants, ferns, pastures.
前記した植物は、一般的に作物として栽培される品種であれば限定されない。
The above-described plant is not limited as long as it is a variety generally cultivated as a crop.
前記した植物とは、ハイブリッド技術により育種された植物であってもよい。
ハイブリッド技術により育種された植物とは、2つの異なった系統の品種を交配して得られる一代雑種であり、一般に、両親のどちらよりも優れた形質を持つ雑種強勢(一般に、収量ポテンシャルの増加、生物的及び非生物的ストレス因子に対する抵抗性の向上等をもたらす)の特性を有す植物である。 The above-mentioned plant may be a plant bred by a hybrid technique.
Plants bred by hybrid technology are first-generation hybrids obtained by crossing two different varieties of varieties and generally have a hybrid strength (generally, increased yield potential, It is a plant having the characteristics of improving resistance to biological and abiotic stress factors.
ハイブリッド技術により育種された植物とは、2つの異なった系統の品種を交配して得られる一代雑種であり、一般に、両親のどちらよりも優れた形質を持つ雑種強勢(一般に、収量ポテンシャルの増加、生物的及び非生物的ストレス因子に対する抵抗性の向上等をもたらす)の特性を有す植物である。 The above-mentioned plant may be a plant bred by a hybrid technique.
Plants bred by hybrid technology are first-generation hybrids obtained by crossing two different varieties of varieties and generally have a hybrid strength (generally, increased yield potential, It is a plant having the characteristics of improving resistance to biological and abiotic stress factors.
前記した植物には、遺伝子組換え作物も含まれる。
The aforementioned plants include genetically modified crops.
上記遺伝子組換え作物には、イソキサフルトール等のHPPD(4-ヒドロキシフェニルピルビン酸ジオキシゲナーゼ酵素)阻害剤、イマゼタピル、チフェンスルフロンメチル等のALS(アセト乳酸合成酵素)阻害剤、EPSP(5-エノールピルビルシキミ酸-3-リン酸合成酵素)阻害剤、グルタミン合成酵素阻害剤、PPO(プロトポルフィリノーゲン酸化酵素)阻害剤、ブロモキシニル、ジカンバ等の除草剤に対する耐性が、古典的な育種法、もしくは遺伝子組換え技術により付与された植物も含まれる。
The genetically modified crops include HPPD (4-hydroxyphenylpyruvate dioxygenase enzyme) inhibitors such as isoxaflutol, ALS (acetolactic acid synthase) inhibitors such as imazetapyr and thifensulfuron methyl, EPSP (5 -Classic breeding with resistance to herbicides such as -enolpyruvylshikimate-3-phosphate synthase) inhibitors, glutamine synthetase inhibitors, PPO (protoporphyrinogen oxidase) inhibitors, bromoxynil, dicamba Plants granted by law or genetic engineering techniques are also included.
上記植物には、遺伝子組換え技術を用いて、バチルス・チューリンゲンシス(Bacillus thuringiensis)などのバチルス属で知られている選択的毒素等を合成する事が可能となった植物や、有害昆虫由来の内在性遺伝子に部分的に一致する遺伝子断片等を合成し、標的有害昆虫体内でジーンサイレンシング(RNAi;RNA interference)を誘導することにより特異的な殺虫活性を付与することができる植物も含まれる。
The above plants can be synthesized by using genetic engineering techniques to synthesize selective toxins known in the genus Bacillus such as Bacillus thuringiensis, and from harmful insects. Also included are plants that can confer specific insecticidal activity by synthesizing gene fragments that partially match the endogenous gene and inducing gene silencing (RNAi; RNA interference) within the target harmful insect body .
また、上記植物には、古典的育種技術または遺伝子組換え技術を用い、先に述べたような除草剤耐性、害虫抵抗性、病害耐性等に関わる形質を2種以上付与された系統、及び同類または異なる性質を有する遺伝子組換え植物同士を掛け合わせることにより親系統が有する2種以上の性質が付与された系統も含まれる。このような植物の例として、Smart stax(登録商標)等が挙げられる。
In addition, to the above plants, a line provided with two or more traits related to herbicide resistance, pest resistance, disease resistance, etc. as described above using classical breeding technology or genetic recombination technology, and the like Alternatively, a line in which two or more kinds of properties possessed by the parent line are given by crossing genetically modified plants having different characteristics is also included. Examples of such plants include Smart stax (registered trademark).
以下、本発明を製造例、製剤例及び試験例等によりさらに詳しく説明するが、本発明はこれらの例のみに限定されるものではない。なお、以下の例において、部は特にことわりの無い限り重量部を表す。
まず、本ビピリジン化合物の製造について、製造例を示す。 Hereinafter, although this invention is demonstrated in more detail by a manufacture example, a formulation example, a test example, etc., this invention is not limited only to these examples. In the following examples, parts represent parts by weight unless otherwise specified.
First, a manufacture example is shown about manufacture of this bipyridine compound.
まず、本ビピリジン化合物の製造について、製造例を示す。 Hereinafter, although this invention is demonstrated in more detail by a manufacture example, a formulation example, a test example, etc., this invention is not limited only to these examples. In the following examples, parts represent parts by weight unless otherwise specified.
First, a manufacture example is shown about manufacture of this bipyridine compound.
製造例1-1
2-クロロ-5-ヒドロキシピリジンを1.0g、水酸化カリウムを110mg、メタノール19mL、及びDMSO19mLの混合物を、室温にてヘキサフルオロプロペン雰囲気下で12時間撹拌した。得られた反応混合物に水を加え、MTBEで抽出した。得られた有機層を無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮することにより、次式で示される中間体1を2.0g得た。
1H-NMR (CDCl3) δ: 8.32 (1H, d), 7.54 (1H, dd), 7.39 (1H, d), 5.15-4.96 (1H, m).
Production Example 1-1
A mixture of 1.0 g of 2-chloro-5-hydroxypyridine, 110 mg of potassium hydroxide, 19 mL of methanol, and 19 mL of DMSO was stirred at room temperature under a hexafluoropropene atmosphere for 12 hours. Water was added to the resulting reaction mixture and extracted with MTBE. The obtained organic layer was dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure to obtain 2.0 g of Intermediate 1 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.32 (1H, d), 7.54 (1H, dd), 7.39 (1H, d), 5.15-4.96 (1H, m).
2-クロロ-5-ヒドロキシピリジンを1.0g、水酸化カリウムを110mg、メタノール19mL、及びDMSO19mLの混合物を、室温にてヘキサフルオロプロペン雰囲気下で12時間撹拌した。得られた反応混合物に水を加え、MTBEで抽出した。得られた有機層を無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮することにより、次式で示される中間体1を2.0g得た。
A mixture of 1.0 g of 2-chloro-5-hydroxypyridine, 110 mg of potassium hydroxide, 19 mL of methanol, and 19 mL of DMSO was stirred at room temperature under a hexafluoropropene atmosphere for 12 hours. Water was added to the resulting reaction mixture and extracted with MTBE. The obtained organic layer was dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure to obtain 2.0 g of Intermediate 1 represented by the following formula.
製造例1-2
1,4-ジアザビシクロ[2,2,2]オクタン16g、及びMTBE640mLの混合物に、窒素雰囲気下-45℃で1.6M n-ブチルリチウムヘキサン溶液80mLを滴下した。-45℃で2時間撹拌後、この反応混合物に3-フルオロピリジン11mLを滴下した。さらに-45℃で2時間撹拌後、-50℃まで冷却し、35mLのトリブチルすずクロリドを滴下した。-50℃で1時間撹拌後、室温まで昇温した。得られた混合物に、室温で飽和塩化アンモニウム水溶液を加え、MTBEで抽出した。得られた有機層を、飽和食塩水で洗浄後、無水硫酸ナトリウムで乾燥した。得られた有機層を減圧下濃縮することにより、次式で示される中間体2を含む混合物50gを得た。
1H-NMR (CDCl3) δ: 8.60-8.56 (1H, m), 7.24-7.19 (1H, m), 7.18-7.12 (1H, m), 1.66-1.47 (6H, m), 1.42-1.23 (6H, m), 1.23-1.09 (6H, m), 0.97-0.80 (9H, m).
Production Example 1-2
To a mixture of 16 g of 1,4-diazabicyclo [2,2,2] octane and 640 mL of MTBE, 80 mL of a 1.6 M n-butyllithium hexane solution was added dropwise at −45 ° C. in a nitrogen atmosphere. After stirring at −45 ° C. for 2 hours, 11 mL of 3-fluoropyridine was added dropwise to the reaction mixture. The mixture was further stirred at −45 ° C. for 2 hours, cooled to −50 ° C., and 35 mL of tributyltin chloride was added dropwise. After stirring at −50 ° C. for 1 hour, the temperature was raised to room temperature. A saturated aqueous ammonium chloride solution was added to the obtained mixture at room temperature, and the mixture was extracted with MTBE. The obtained organic layer was washed with saturated brine and dried over anhydrous sodium sulfate. The obtained organic layer was concentrated under reduced pressure to obtain 50 g of a mixture containing intermediate 2 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.60-8.56 (1H, m), 7.24-7.19 (1H, m), 7.18-7.12 (1H, m), 1.66-1.47 (6H, m), 1.42-1.23 ( 6H, m), 1.23-1.09 (6H, m), 0.97-0.80 (9H, m).
1,4-ジアザビシクロ[2,2,2]オクタン16g、及びMTBE640mLの混合物に、窒素雰囲気下-45℃で1.6M n-ブチルリチウムヘキサン溶液80mLを滴下した。-45℃で2時間撹拌後、この反応混合物に3-フルオロピリジン11mLを滴下した。さらに-45℃で2時間撹拌後、-50℃まで冷却し、35mLのトリブチルすずクロリドを滴下した。-50℃で1時間撹拌後、室温まで昇温した。得られた混合物に、室温で飽和塩化アンモニウム水溶液を加え、MTBEで抽出した。得られた有機層を、飽和食塩水で洗浄後、無水硫酸ナトリウムで乾燥した。得られた有機層を減圧下濃縮することにより、次式で示される中間体2を含む混合物50gを得た。
To a mixture of 16 g of 1,4-diazabicyclo [2,2,2] octane and 640 mL of MTBE, 80 mL of a 1.6 M n-butyllithium hexane solution was added dropwise at −45 ° C. in a nitrogen atmosphere. After stirring at −45 ° C. for 2 hours, 11 mL of 3-fluoropyridine was added dropwise to the reaction mixture. The mixture was further stirred at −45 ° C. for 2 hours, cooled to −50 ° C., and 35 mL of tributyltin chloride was added dropwise. After stirring at −50 ° C. for 1 hour, the temperature was raised to room temperature. A saturated aqueous ammonium chloride solution was added to the obtained mixture at room temperature, and the mixture was extracted with MTBE. The obtained organic layer was washed with saturated brine and dried over anhydrous sodium sulfate. The obtained organic layer was concentrated under reduced pressure to obtain 50 g of a mixture containing intermediate 2 represented by the following formula.
製造例1-3
1.2gの中間体1、2.5gの中間体2、500mgのテトラキストリフェニルホスフィンパラジウム(0)、160mgのヨウ化銅、270mgの無水塩化リチウム、及びトルエン14mLの混合物を、加熱還流下5時間撹拌した。得られた反応混合物を室温まで放冷後、炭酸水素ナトリウム水溶液を加え、酢酸エチルで抽出した。得られた有機層を、水及び飽和食塩水で順次洗浄した後、無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される中間体3を820mg得た。
1H-NMR (CDCl3) δ: 8.71 (1H, d), 8.59 (1H, dd), 8.09 (1H, dd), 7.71 (1H, dd), 7.62-7.55 (1H, m), 7.43-7.37 (1H, m), 6.01 (1H, dt).
Production Example 1-3
A mixture of 1.2 g of intermediate 1, 2.5 g of intermediate 2, 500 mg of tetrakistriphenylphosphine palladium (0), 160 mg of copper iodide, 270 mg of anhydrous lithium chloride, and 14 mL of toluene was heated under reflux. Stir for hours. The resulting reaction mixture was allowed to cool to room temperature, aqueous sodium hydrogen carbonate solution was added, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed successively with water and saturated brine, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 820 mg of intermediate 3 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.71 (1H, d), 8.59 (1H, dd), 8.09 (1H, dd), 7.71 (1H, dd), 7.62-7.55 (1H, m), 7.43-7.37 (1H, m), 6.01 (1H, dt).
1.2gの中間体1、2.5gの中間体2、500mgのテトラキストリフェニルホスフィンパラジウム(0)、160mgのヨウ化銅、270mgの無水塩化リチウム、及びトルエン14mLの混合物を、加熱還流下5時間撹拌した。得られた反応混合物を室温まで放冷後、炭酸水素ナトリウム水溶液を加え、酢酸エチルで抽出した。得られた有機層を、水及び飽和食塩水で順次洗浄した後、無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される中間体3を820mg得た。
A mixture of 1.2 g of intermediate 1, 2.5 g of intermediate 2, 500 mg of tetrakistriphenylphosphine palladium (0), 160 mg of copper iodide, 270 mg of anhydrous lithium chloride, and 14 mL of toluene was heated under reflux. Stir for hours. The resulting reaction mixture was allowed to cool to room temperature, aqueous sodium hydrogen carbonate solution was added, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed successively with water and saturated brine, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 820 mg of intermediate 3 represented by the following formula.
製造例1-4
水素化ナトリウム(60%、油状)110mg、及びDMF5mLの懸濁液に、200μLの氷冷下エタンチオールを滴下した。氷冷下10分間撹拌した後、この反応混合物に、820mgの中間体3、及びDMF5mLの混合液を滴下した。この反応混合物を室温で5時間撹拌した。得られた反応混合物に、室温で飽和炭酸水素ナトリウム水溶液を加え、酢酸エチルで抽出した。得られた有機層を、水及び飽和食塩水で順次洗浄した後、無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物9を680mg得た。
1H-NMR (CDCl3) δ: 8.64 (1H, d), 8.45 (1H, dd), 8.10 (1H, d), 7.73 (1H, dd), 7.68 (1H, dd), 7.28 (1H, dd), 5.18-4.98 (1H, m), 2.92 (2H, q), 1.33 (3H, t).
Production Example 1-4
200 μL of ethanethiol was added dropwise to a suspension of sodium hydride (60%, oily) 110 mg and DMF 5 mL under ice cooling. After stirring for 10 minutes under ice-cooling, a mixture of 820 mg of Intermediate 3 and 5 mL of DMF was added dropwise to the reaction mixture. The reaction mixture was stirred at room temperature for 5 hours. To the obtained reaction mixture, a saturated aqueous sodium hydrogen carbonate solution was added at room temperature, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed successively with water and saturated brine, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 680 mg of the present bipyridine compound 9 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.64 (1H, d), 8.45 (1H, dd), 8.10 (1H, d), 7.73 (1H, dd), 7.68 (1H, dd), 7.28 (1H, dd ), 5.18-4.98 (1H, m), 2.92 (2H, q), 1.33 (3H, t).
水素化ナトリウム(60%、油状)110mg、及びDMF5mLの懸濁液に、200μLの氷冷下エタンチオールを滴下した。氷冷下10分間撹拌した後、この反応混合物に、820mgの中間体3、及びDMF5mLの混合液を滴下した。この反応混合物を室温で5時間撹拌した。得られた反応混合物に、室温で飽和炭酸水素ナトリウム水溶液を加え、酢酸エチルで抽出した。得られた有機層を、水及び飽和食塩水で順次洗浄した後、無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物9を680mg得た。
200 μL of ethanethiol was added dropwise to a suspension of sodium hydride (60%, oily) 110 mg and DMF 5 mL under ice cooling. After stirring for 10 minutes under ice-cooling, a mixture of 820 mg of Intermediate 3 and 5 mL of DMF was added dropwise to the reaction mixture. The reaction mixture was stirred at room temperature for 5 hours. To the obtained reaction mixture, a saturated aqueous sodium hydrogen carbonate solution was added at room temperature, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed successively with water and saturated brine, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 680 mg of the present bipyridine compound 9 represented by the following formula.
製造例2
530mgの本ビピリジン化合物9及び5mLのクロロホルムの混合液に、氷冷下520mgのmCPBA(70%)を加えた。氷冷下6時間撹拌した後、亜硫酸ナトリウム及び飽和炭酸水素ナトリウム水溶液を順次加えてクロロホルムで抽出した。得られた有機層を飽和炭酸水素ナトリウム水溶液及び飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物10を210mg、及び次式で示される本ビピリジン化合物11を340mg得た。
本ビピリジン化合物10
1H-NMR (CDCl3) δ: 8.75 (1H, dd), 8.65 (1H, dd), 8.60-8.56 (2H, m), 7.75 (1H, dd), 7.59 (1H, dd), 5.18-4.99 (1H, m), 3.52-3.41 (1H, m), 2.96-2.86 (1H, m), 1.41 (3H, t).
本ビピリジン化合物11
1H-NMR (CDCl3) δ: 8.89 (1H, dd), 8.53 (1H, d), 8.50 (1H, dd), 7.91 (1H, d), 7.74 (1H, dd), 7.58 (1H, dd), 5.18-4.99 (1H, m), 3.87 (2H, q), 1.38 (3H, t).
Production Example 2
To a mixed solution of 530 mg of the present bipyridine compound 9 and 5 mL of chloroform, 520 mg of mCPBA (70%) was added under ice cooling. After stirring for 6 hours under ice-cooling, sodium sulfite and saturated aqueous sodium hydrogen carbonate solution were sequentially added, and the mixture was extracted with chloroform. The obtained organic layer was washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over sodium sulfate, and the organic layer was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 210 mg of the present bipyridine compound 10 represented by the following formula and 340 mg of the present bipyridine compound 11 represented by the following formula.
This bipyridine compound 10
1 H-NMR (CDCl 3 ) δ: 8.75 (1H, dd), 8.65 (1H, dd), 8.60-8.56 (2H, m), 7.75 (1H, dd), 7.59 (1H, dd), 5.18-4.99 (1H, m), 3.52-3.41 (1H, m), 2.96-2.86 (1H, m), 1.41 (3H, t).
This bipyridine compound 11
1 H-NMR (CDCl 3 ) δ: 8.89 (1H, dd), 8.53 (1H, d), 8.50 (1H, dd), 7.91 (1H, d), 7.74 (1H, dd), 7.58 (1H, dd ), 5.18-4.99 (1H, m), 3.87 (2H, q), 1.38 (3H, t).
530mgの本ビピリジン化合物9及び5mLのクロロホルムの混合液に、氷冷下520mgのmCPBA(70%)を加えた。氷冷下6時間撹拌した後、亜硫酸ナトリウム及び飽和炭酸水素ナトリウム水溶液を順次加えてクロロホルムで抽出した。得られた有機層を飽和炭酸水素ナトリウム水溶液及び飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物10を210mg、及び次式で示される本ビピリジン化合物11を340mg得た。
本ビピリジン化合物10
本ビピリジン化合物11
To a mixed solution of 530 mg of the present bipyridine compound 9 and 5 mL of chloroform, 520 mg of mCPBA (70%) was added under ice cooling. After stirring for 6 hours under ice-cooling, sodium sulfite and saturated aqueous sodium hydrogen carbonate solution were sequentially added, and the mixture was extracted with chloroform. The obtained organic layer was washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over sodium sulfate, and the organic layer was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 210 mg of the present bipyridine compound 10 represented by the following formula and 340 mg of the present bipyridine compound 11 represented by the following formula.
This bipyridine compound 10
This bipyridine compound 11
製造例3-1
中間体1に代えて2-ブロモ-5-メトキシピリジンを用い、製造例1-3に記載の方法に準じて、次式で示される中間体4を得た。
1H-NMR (CDCl3) δ: 8.57-8.54 (1H, m), 8.51-8.49 (1H, m), 7.96 (1H, dd), 7.56-7.49 (1H, m), 7.35-7.28 (2H, m), 3.94-3.91 (3H, m).
Production Example 3-1
Using 2-bromo-5-methoxypyridine in place of Intermediate 1, Intermediate 4 represented by the following formula was obtained according to the method described in Production Example 1-3.
1 H-NMR (CDCl 3 ) δ: 8.57-8.54 (1H, m), 8.51-8.49 (1H, m), 7.96 (1H, dd), 7.56-7.49 (1H, m), 7.35-7.28 (2H, m), 3.94-3.91 (3H, m).
中間体1に代えて2-ブロモ-5-メトキシピリジンを用い、製造例1-3に記載の方法に準じて、次式で示される中間体4を得た。
Using 2-bromo-5-methoxypyridine in place of Intermediate 1, Intermediate 4 represented by the following formula was obtained according to the method described in Production Example 1-3.
製造例3-2
510mgの中間体4、110mgの水素化ナトリウム(油状、60%)、及びDMF5mLの混合物に、氷冷下200μLのエタンチオールを滴下した。室温に昇温した後、4時間撹拌した。得られた反応混合物に飽和炭酸水素ナトリウム水溶液を加え、酢酸エチルで抽出した。得られた有機層を、水及び飽和食塩水で順次洗浄した後、無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。
得られた残渣をクロロホルムで希釈した溶液に、氷冷下1.4gのmCPBA(70%)を加えた。この反応混合物を、室温で10時間撹拌した。得られた反応混合物に、亜硫酸ナトリウム及び飽和炭酸水素ナトリウム水溶液を順次加え、クロロホルムで抽出した。得られた有機層を飽和炭酸水素ナトリウムで洗浄し、無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される中間体5を490mg得た。
1H-NMR (CDCl3) δ: 8.86 (1H, dd), 8.48 (1H, dd), 8.31 (1H, d), 7.83 (1H, d), 7.51 (1H, dd), 7.36 (1H, dd), 3.94-3.87 (5H, m), 1.37 (3H, t).
Production Example 3-2
To a mixture of 510 mg of intermediate 4, 110 mg of sodium hydride (oil, 60%), and 5 mL of DMF, 200 μL of ethanethiol was added dropwise under ice cooling. The mixture was warmed to room temperature and stirred for 4 hours. A saturated aqueous sodium hydrogen carbonate solution was added to the obtained reaction mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed successively with water and saturated brine, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure.
To a solution obtained by diluting the obtained residue with chloroform, 1.4 g of mCPBA (70%) was added under ice cooling. The reaction mixture was stirred at room temperature for 10 hours. To the obtained reaction mixture, sodium sulfite and saturated aqueous sodium hydrogen carbonate solution were sequentially added, and the mixture was extracted with chloroform. The obtained organic layer was washed with saturated sodium hydrogen carbonate, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 490 mg of intermediate 5 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.86 (1H, dd), 8.48 (1H, dd), 8.31 (1H, d), 7.83 (1H, d), 7.51 (1H, dd), 7.36 (1H, dd ), 3.94-3.87 (5H, m), 1.37 (3H, t).
510mgの中間体4、110mgの水素化ナトリウム(油状、60%)、及びDMF5mLの混合物に、氷冷下200μLのエタンチオールを滴下した。室温に昇温した後、4時間撹拌した。得られた反応混合物に飽和炭酸水素ナトリウム水溶液を加え、酢酸エチルで抽出した。得られた有機層を、水及び飽和食塩水で順次洗浄した後、無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。
得られた残渣をクロロホルムで希釈した溶液に、氷冷下1.4gのmCPBA(70%)を加えた。この反応混合物を、室温で10時間撹拌した。得られた反応混合物に、亜硫酸ナトリウム及び飽和炭酸水素ナトリウム水溶液を順次加え、クロロホルムで抽出した。得られた有機層を飽和炭酸水素ナトリウムで洗浄し、無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される中間体5を490mg得た。
To a mixture of 510 mg of intermediate 4, 110 mg of sodium hydride (oil, 60%), and 5 mL of DMF, 200 μL of ethanethiol was added dropwise under ice cooling. The mixture was warmed to room temperature and stirred for 4 hours. A saturated aqueous sodium hydrogen carbonate solution was added to the obtained reaction mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed successively with water and saturated brine, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure.
To a solution obtained by diluting the obtained residue with chloroform, 1.4 g of mCPBA (70%) was added under ice cooling. The reaction mixture was stirred at room temperature for 10 hours. To the obtained reaction mixture, sodium sulfite and saturated aqueous sodium hydrogen carbonate solution were sequentially added, and the mixture was extracted with chloroform. The obtained organic layer was washed with saturated sodium hydrogen carbonate, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography, so as to obtain 490 mg of intermediate 5 represented by the following formula.
製造例3-3
5mLの1.0M三臭化ホウ素ジクロロメタン溶液に、氷冷下で490mgの中間体5を加えた。室温に昇温後、2日間撹拌した。得られた反応混合物に、氷冷下で飽和炭酸水素ナトリウム水溶液を加え、クロロホルムで抽出した。得られた有機層を、水及び飽和食塩水で順次洗浄した後、無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される中間体6を300mg得た。
1H-NMR (CDCl3) δ: 8.86 (1H, dd), 8.50 (1H, dd), 8.12 (1H, d), 7.67 (1H, d), 7.54 (1H, dd), 7.08 (1H, dd), 6.64 (1H, br s), 3.94 (2H, q), 1.39 (3H, t).
Production Example 3-3
To 5 mL of 1.0 M boron tribromide dichloromethane solution, 490 mg of Intermediate 5 was added under ice cooling. The mixture was warmed to room temperature and stirred for 2 days. To the obtained reaction mixture, a saturated aqueous sodium hydrogen carbonate solution was added under ice cooling, and the mixture was extracted with chloroform. The obtained organic layer was washed successively with water and saturated brine, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 300 mg of Intermediate 6 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.86 (1H, dd), 8.50 (1H, dd), 8.12 (1H, d), 7.67 (1H, d), 7.54 (1H, dd), 7.08 (1H, dd ), 6.64 (1H, br s), 3.94 (2H, q), 1.39 (3H, t).
5mLの1.0M三臭化ホウ素ジクロロメタン溶液に、氷冷下で490mgの中間体5を加えた。室温に昇温後、2日間撹拌した。得られた反応混合物に、氷冷下で飽和炭酸水素ナトリウム水溶液を加え、クロロホルムで抽出した。得られた有機層を、水及び飽和食塩水で順次洗浄した後、無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される中間体6を300mg得た。
To 5 mL of 1.0 M boron tribromide dichloromethane solution, 490 mg of Intermediate 5 was added under ice cooling. The mixture was warmed to room temperature and stirred for 2 days. To the obtained reaction mixture, a saturated aqueous sodium hydrogen carbonate solution was added under ice cooling, and the mixture was extracted with chloroform. The obtained organic layer was washed successively with water and saturated brine, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 300 mg of Intermediate 6 represented by the following formula.
製造例3-4
100mgの中間体6、190mgの炭酸セシウム、及びDMF2mLの混合物に、氷冷下で150mgの2,2,3,3-テトラフルオロプロピル=トリフルオロメタンスルホナート(以下、試薬Aと記す。)を加えた。室温で10時間撹拌した後、飽和炭酸水素ナトリウム水溶液を加え、酢酸エチルで抽出した。得られた有機層を、飽和食塩水で洗浄後、無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物7を140mg得た。
1H-NMR (CDCl3) δ: 8.87 (1H, dd), 8.49 (1H, dd), 8.36 (1H, d), 7.87 (1H, d), 7.54 (1H, dd), 7.42 (1H, dd), 6.08 (1H, tt), 4.48 (2H, t), 3.89 (2H, q), 1.38 (3H, t).
Production Example 3-4
To a mixture of 100 mg of Intermediate 6, 190 mg of cesium carbonate, and 2 mL of DMF, 150 mg of 2,2,3,3-tetrafluoropropyl = trifluoromethanesulfonate (hereinafter referred to as Reagent A) is added under ice cooling. It was. After stirring at room temperature for 10 hours, a saturated aqueous sodium hydrogen carbonate solution was added, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 140 mg of the present bipyridine compound 7 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.87 (1H, dd), 8.49 (1H, dd), 8.36 (1H, d), 7.87 (1H, d), 7.54 (1H, dd), 7.42 (1H, dd ), 6.08 (1H, tt), 4.48 (2H, t), 3.89 (2H, q), 1.38 (3H, t).
100mgの中間体6、190mgの炭酸セシウム、及びDMF2mLの混合物に、氷冷下で150mgの2,2,3,3-テトラフルオロプロピル=トリフルオロメタンスルホナート(以下、試薬Aと記す。)を加えた。室温で10時間撹拌した後、飽和炭酸水素ナトリウム水溶液を加え、酢酸エチルで抽出した。得られた有機層を、飽和食塩水で洗浄後、無水硫酸ナトリウムで乾燥し、有機層を減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物7を140mg得た。
To a mixture of 100 mg of Intermediate 6, 190 mg of cesium carbonate, and 2 mL of DMF, 150 mg of 2,2,3,3-tetrafluoropropyl = trifluoromethanesulfonate (hereinafter referred to as Reagent A) is added under ice cooling. It was. After stirring at room temperature for 10 hours, a saturated aqueous sodium hydrogen carbonate solution was added, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and the organic layer was concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 140 mg of the present bipyridine compound 7 represented by the following formula.
製造例4
試薬Aに代えて2,2,3,3,3-ペンタフルオロプロピル=トリフルオロメタンスルホナートを用い、製造例3-4に記載の方法に準じて次式で示される本ビピリジン化合物8を得た。
1H-NMR (CDCl3) δ: 8.87 (1H, dd), 8.49 (1H, dd), 8.37 (1H, d), 7.87 (1H, d), 7.54 (1H, dd), 7.42 (1H, dd), 4.54 (2H, t), 3.89 (2H, q), 1.38 (3H, t).
Production Example 4
Using 2,2,3,3,3-pentafluoropropyl = trifluoromethanesulfonate instead of reagent A, the bipyridine compound 8 represented by the following formula was obtained according to the method described in Production Example 3-4. .
1 H-NMR (CDCl 3 ) δ: 8.87 (1H, dd), 8.49 (1H, dd), 8.37 (1H, d), 7.87 (1H, d), 7.54 (1H, dd), 7.42 (1H, dd ), 4.54 (2H, t), 3.89 (2H, q), 1.38 (3H, t).
試薬Aに代えて2,2,3,3,3-ペンタフルオロプロピル=トリフルオロメタンスルホナートを用い、製造例3-4に記載の方法に準じて次式で示される本ビピリジン化合物8を得た。
Using 2,2,3,3,3-pentafluoropropyl = trifluoromethanesulfonate instead of reagent A, the bipyridine compound 8 represented by the following formula was obtained according to the method described in Production Example 3-4. .
製造例5
試薬Aに代えて2,2,3,4,4,4-ヘキサフルオロブチル=トリフルオロメタンスルホナートを用い、製造例3-4に記載の方法に準じて、次式で示される本ビピリジン化合物14を得た。
1H-NMR (CDCl3) δ: 8.87 (1H, dd), 8.49 (1H, dd), 8.36 (1H, d), 7.87 (1H, d), 7.55 (1H, dd), 7.42 (1H, dd), 5.33-5.08 (1H, m), 4.59-4.36 (2H, m), 3.89 (2H, q), 1.38 (3H, t).
Production Example 5
In accordance with the method described in Production Example 3-4, 2,2,3,4,4,4-hexafluorobutyl = trifluoromethanesulfonate is used in place of reagent A, and this bipyridine compound 14 represented by the following formula 14 Got.
1 H-NMR (CDCl 3 ) δ: 8.87 (1H, dd), 8.49 (1H, dd), 8.36 (1H, d), 7.87 (1H, d), 7.55 (1H, dd), 7.42 (1H, dd ), 5.33-5.08 (1H, m), 4.59-4.36 (2H, m), 3.89 (2H, q), 1.38 (3H, t).
試薬Aに代えて2,2,3,4,4,4-ヘキサフルオロブチル=トリフルオロメタンスルホナートを用い、製造例3-4に記載の方法に準じて、次式で示される本ビピリジン化合物14を得た。
In accordance with the method described in Production Example 3-4, 2,2,3,4,4,4-hexafluorobutyl = trifluoromethanesulfonate is used in place of reagent A, and this bipyridine compound 14 represented by the following formula 14 Got.
製造例6-1
ヘキサフルオロプロペンに代えて(トリフルオロビニル)(トリフルオロメチル)エーテルを用い、製造例1-1に記載の方法に準じて、次式で示される中間体7を得た。
1H-NMR (CDCl3) δ: 8.33 (1H, d), 7.55 (1H, dd), 7.39 (1H, d), 5.97 (1H, dt).
Production Example 6-1
Intermediate 7 represented by the following formula was obtained according to the method described in Production Example 1-1 using (trifluorovinyl) (trifluoromethyl) ether instead of hexafluoropropene.
1 H-NMR (CDCl 3 ) δ: 8.33 (1H, d), 7.55 (1H, dd), 7.39 (1H, d), 5.97 (1H, dt).
ヘキサフルオロプロペンに代えて(トリフルオロビニル)(トリフルオロメチル)エーテルを用い、製造例1-1に記載の方法に準じて、次式で示される中間体7を得た。
Intermediate 7 represented by the following formula was obtained according to the method described in Production Example 1-1 using (trifluorovinyl) (trifluoromethyl) ether instead of hexafluoropropene.
製造例6-2
中間体1に代えて中間体7を用い、製造例1-3に記載の方法に準じて、次式で示される中間体8を得た。
1H-NMR (CDCl3) δ: 8.71 (1H, d), 8.59 (1H, dd), 8.09 (1H, d), 7.71 (1H, dd), 7.62-7.55 (1H, m), 7.43-7.37 (1H, m), 6.01 (1H, dt).
Production Example 6-2
Intermediate 8 represented by the following formula was obtained according to the method described in Production Example 1-3 using Intermediate 7 instead of Intermediate 1.
1 H-NMR (CDCl 3 ) δ: 8.71 (1H, d), 8.59 (1H, dd), 8.09 (1H, d), 7.71 (1H, dd), 7.62-7.55 (1H, m), 7.43-7.37 (1H, m), 6.01 (1H, dt).
中間体1に代えて中間体7を用い、製造例1-3に記載の方法に準じて、次式で示される中間体8を得た。
Intermediate 8 represented by the following formula was obtained according to the method described in Production Example 1-3 using Intermediate 7 instead of Intermediate 1.
製造例6-3
中間体3に代えて中間体8を用い、製造例1-4に記載の方法に準じて、次式で示される本ビピリジン化合物22を得た。
1H-NMR (CDCl3) δ: 8.65 (1H, s), 8.45 (1H, dd), 8.10 (1H, d), 7.73 (1H, d), 7.69 (1H, dd), 7.31-7.26 (1H, m), 6.00 (1H, dd), 2.92 (2H, q), 1.33 (3H, t).
Production Example 6-3
This bipyridine compound 22 represented by the following formula was obtained according to the method described in Production Example 1-4 using Intermediate 8 instead of Intermediate 3.
1 H-NMR (CDCl 3 ) δ: 8.65 (1H, s), 8.45 (1H, dd), 8.10 (1H, d), 7.73 (1H, d), 7.69 (1H, dd), 7.31-7.26 (1H , m), 6.00 (1H, dd), 2.92 (2H, q), 1.33 (3H, t).
中間体3に代えて中間体8を用い、製造例1-4に記載の方法に準じて、次式で示される本ビピリジン化合物22を得た。
This bipyridine compound 22 represented by the following formula was obtained according to the method described in Production Example 1-4 using Intermediate 8 instead of Intermediate 3.
製造例7
本ビピリジン化合物9に代えて本ビピリジン化合物22を用い、製造例2に記載の方法に準じて、次式で示される本ビピリジン化合物23、及び次式で示される本ビピリジン化合物24を得た。
本ビピリジン化合物23
1H-NMR (CDCl3) δ: 8.75 (1H, dd), 8.65 (1H, dd), 8.61-8.56 (2H, m), 7.75 (1H, dd), 7.59 (1H, dd), 6.01 (1H, dt), 3.51-3.41 (1H, m), 2.96-2.86 (1H, m), 1.41 (3H, t).
本ビピリジン化合物24
1H-NMR (CDCl3) δ: 8.89 (1H, dd), 8.54 (1H, d), 8.50 (1H, dd), 7.91 (1H, dd), 7.74 (1H, dd), 7.59 (1H, dd), 6.00 (1H, dt), 3.87 (2H, q), 1.38 (3H, t).
Production Example 7
This bipyridine compound 22 was used in place of this bipyridine compound 9, and the bipyridine compound 23 represented by the following formula and the bipyridine compound 24 represented by the following formula were obtained according to the method described in Production Example 2.
This bipyridine compound 23
1 H-NMR (CDCl 3 ) δ: 8.75 (1H, dd), 8.65 (1H, dd), 8.61-8.56 (2H, m), 7.75 (1H, dd), 7.59 (1H, dd), 6.01 (1H , dt), 3.51-3.41 (1H, m), 2.96-2.86 (1H, m), 1.41 (3H, t).
This bipyridine compound 24
1 H-NMR (CDCl 3 ) δ: 8.89 (1H, dd), 8.54 (1H, d), 8.50 (1H, dd), 7.91 (1H, dd), 7.74 (1H, dd), 7.59 (1H, dd ), 6.00 (1H, dt), 3.87 (2H, q), 1.38 (3H, t).
本ビピリジン化合物9に代えて本ビピリジン化合物22を用い、製造例2に記載の方法に準じて、次式で示される本ビピリジン化合物23、及び次式で示される本ビピリジン化合物24を得た。
本ビピリジン化合物23
本ビピリジン化合物24
This bipyridine compound 22 was used in place of this bipyridine compound 9, and the bipyridine compound 23 represented by the following formula and the bipyridine compound 24 represented by the following formula were obtained according to the method described in Production Example 2.
This bipyridine compound 23
This bipyridine compound 24
製造例8-1
10gの2-ブロモ-5-ヒドロキシピリジン、26gの炭酸セシウム、及びDMF29mLの混合物、氷冷下22gの2,2,3,3,3-ペンタフルオロプロピル トリフルオロメタンスルホネート(以下、試薬Bと記す。)を滴下した。この反応混合物を、室温で2日間撹拌した後、飽和塩化アンモニウム水溶液を加え、MTBEで抽出した。得られた有機層を、1M水酸化ナトリウム水溶液、及び飽和食塩水で順次洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮することにより、次式で示される中間体9を17g得た。
1H-NMR (CDCl3) δ: 8.13 (1H, d), 7.45 (1H, d), 7.19 (1H, dd), 4.46 (2H, t).
Production Example 8-1
A mixture of 10 g of 2-bromo-5-hydroxypyridine, 26 g of cesium carbonate, and 29 mL of DMF, 22 g of 2,2,3,3,3-pentafluoropropyl trifluoromethanesulfonate (hereinafter referred to as reagent B) under ice cooling. ) Was added dropwise. The reaction mixture was stirred at room temperature for 2 days, saturated aqueous ammonium chloride solution was added, and the mixture was extracted with MTBE. The obtained organic layer was washed successively with 1M aqueous sodium hydroxide solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure to obtain 17 g of intermediate 9 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.13 (1H, d), 7.45 (1H, d), 7.19 (1H, dd), 4.46 (2H, t).
10gの2-ブロモ-5-ヒドロキシピリジン、26gの炭酸セシウム、及びDMF29mLの混合物、氷冷下22gの2,2,3,3,3-ペンタフルオロプロピル トリフルオロメタンスルホネート(以下、試薬Bと記す。)を滴下した。この反応混合物を、室温で2日間撹拌した後、飽和塩化アンモニウム水溶液を加え、MTBEで抽出した。得られた有機層を、1M水酸化ナトリウム水溶液、及び飽和食塩水で順次洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮することにより、次式で示される中間体9を17g得た。
A mixture of 10 g of 2-bromo-5-hydroxypyridine, 26 g of cesium carbonate, and 29 mL of DMF, 22 g of 2,2,3,3,3-pentafluoropropyl trifluoromethanesulfonate (hereinafter referred to as reagent B) under ice cooling. ) Was added dropwise. The reaction mixture was stirred at room temperature for 2 days, saturated aqueous ammonium chloride solution was added, and the mixture was extracted with MTBE. The obtained organic layer was washed successively with 1M aqueous sodium hydroxide solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure to obtain 17 g of intermediate 9 represented by the following formula.
製造例8-2
中間体1に代えて中間体9を用い、製造例1-3に記載の方法に準じて、次式で示される中間体10を得た。
1H-NMR (CDCl3) δ: 8.59-8.55 (1H, m), 8.54 (1H, d), 8.01 (1H, dd), 7.58-7.52 (1H, m), 7.40 (1H, dd), 7.38-7.33 (1H, m), 4.55 (2H, t).
Production Example 8-2
Intermediate 10 represented by the following formula was obtained according to the method described in Production Example 1-3 using Intermediate 9 instead of Intermediate 1.
1 H-NMR (CDCl 3 ) δ: 8.59-8.55 (1H, m), 8.54 (1H, d), 8.01 (1H, dd), 7.58-7.52 (1H, m), 7.40 (1H, dd), 7.38 -7.33 (1H, m), 4.55 (2H, t).
中間体1に代えて中間体9を用い、製造例1-3に記載の方法に準じて、次式で示される中間体10を得た。
Intermediate 10 represented by the following formula was obtained according to the method described in Production Example 1-3 using Intermediate 9 instead of Intermediate 1.
製造例8-3
中間体3に代えて中間体10を用い、製造例1-4に記載の方法に準じて、次式で示される本ビピリジン化合物27を得た。
1H-NMR (CDCl3) δ: 8.47 (1H, dd), 8.43 (1H, dd), 8.02 (1H, dd), 7.70 (1H, dd), 7.41 (1H, dd), 7.28-7.23 (1H, m), 4.54 (2H, td), 2.91 (2H, q), 1.32 (3H, t).
Production Example 8-3
This bipyridine compound 27 represented by the following formula was obtained according to the method described in Production Example 1-4 using Intermediate 10 instead of Intermediate 3.
1 H-NMR (CDCl 3 ) δ: 8.47 (1H, dd), 8.43 (1H, dd), 8.02 (1H, dd), 7.70 (1H, dd), 7.41 (1H, dd), 7.28-7.23 (1H , m), 4.54 (2H, td), 2.91 (2H, q), 1.32 (3H, t).
中間体3に代えて中間体10を用い、製造例1-4に記載の方法に準じて、次式で示される本ビピリジン化合物27を得た。
This bipyridine compound 27 represented by the following formula was obtained according to the method described in Production Example 1-4 using Intermediate 10 instead of Intermediate 3.
製造例8-4
本ビピリジン化合物9に代えて、本ビピリジン化合物27を用い、製造例2に記載の方法に準じて、次式で示される本ビピリジン化合物30を合成することができる。
本ビピリジン化合物30
Production Example 8-4
Instead of the bipyridine compound 9, the bipyridine compound 27 represented by the following formula can be synthesized according to the method described in Production Example 2 using the bipyridine compound 27.
This bipyridine compound 30
本ビピリジン化合物9に代えて、本ビピリジン化合物27を用い、製造例2に記載の方法に準じて、次式で示される本ビピリジン化合物30を合成することができる。
本ビピリジン化合物30
Instead of the bipyridine compound 9, the bipyridine compound 27 represented by the following formula can be synthesized according to the method described in Production Example 2 using the bipyridine compound 27.
This bipyridine compound 30
製造例9-1
試薬Bに代えて、試薬Aを用い、製造例8-1に記載の方法に準じて、次式で示される中間体18を得た。
1H-NMR (CDCl3) δ: 8.12 (1H, d), 7.44 (1H, dd), 7.17 (1H, dd), 6.03 (1H, tt), 4.40 (2H, tt).
Production Example 9-1
Intermediate 18 represented by the following formula was obtained according to the method described in Production Example 8-1 by using reagent A instead of reagent B.
1 H-NMR (CDCl 3 ) δ: 8.12 (1H, d), 7.44 (1H, dd), 7.17 (1H, dd), 6.03 (1H, tt), 4.40 (2H, tt).
試薬Bに代えて、試薬Aを用い、製造例8-1に記載の方法に準じて、次式で示される中間体18を得た。
Intermediate 18 represented by the following formula was obtained according to the method described in Production Example 8-1 by using reagent A instead of reagent B.
製造例9-2
中間体1に代えて中間体18を用い、製造例1-3に記載の方法に準じて、次式で示される中間体19を得た。
1H-NMR (CDCl3) δ: 8.59-8.52 (2H, m), 8.04-7.99 (1H, m), 7.59-7.52 (1H, m), 7.42-7.32 (2H, m), 6.25-5.93 (1H, m), 4.54-4.45 (2H, m).
Production Example 9-2
Intermediate 19 represented by the following formula was obtained according to the method described in Production Example 1-3 using Intermediate 18 instead of Intermediate 1.
1 H-NMR (CDCl 3 ) δ: 8.59-8.52 (2H, m), 8.04-7.99 (1H, m), 7.59-7.52 (1H, m), 7.42-7.32 (2H, m), 6.25-5.93 ( 1H, m), 4.54-4.45 (2H, m).
中間体1に代えて中間体18を用い、製造例1-3に記載の方法に準じて、次式で示される中間体19を得た。
Intermediate 19 represented by the following formula was obtained according to the method described in Production Example 1-3 using Intermediate 18 instead of Intermediate 1.
製造例9-3
中間体3に代えて中間体19を用い、製造例1-4に記載の方法に準じて、次式で示される本ビピリジン化合物26を得た。
1H-NMR (CDCl3) δ: 8.46 (1H, d), 8.43 (1H, dd), 8.00 (1H, d), 7.70 (1H, dd), 7.39 (1H, dd), 7.28-7.23 (1H, m), 6.09 (1H, tt), 4.48 (2H, t), 2.91 (2H, q), 1.32 (3H, t).
Production Example 9-3
The bipyridine compound 26 represented by the following formula was obtained according to the method described in Production Example 1-4 using the intermediate 19 instead of the intermediate 3.
1 H-NMR (CDCl 3 ) δ: 8.46 (1H, d), 8.43 (1H, dd), 8.00 (1H, d), 7.70 (1H, dd), 7.39 (1H, dd), 7.28-7.23 (1H m), 6.09 (1H, tt), 4.48 (2H, t), 2.91 (2H, q), 1.32 (3H, t).
中間体3に代えて中間体19を用い、製造例1-4に記載の方法に準じて、次式で示される本ビピリジン化合物26を得た。
The bipyridine compound 26 represented by the following formula was obtained according to the method described in Production Example 1-4 using the intermediate 19 instead of the intermediate 3.
製造例9-4
本ビピリジン化合物9に代えて、本ビピリジン化合物26を用い、製造例2に記載の方法に準じて、次式で示される本ビピリジン化合物29を合成することができる。
本ビピリジン化合物29
Production Example 9-4
The bipyridine compound 29 represented by the following formula can be synthesized according to the method described in Production Example 2 using the bipyridine compound 26 instead of the bipyridine compound 9.
This bipyridine compound 29
本ビピリジン化合物9に代えて、本ビピリジン化合物26を用い、製造例2に記載の方法に準じて、次式で示される本ビピリジン化合物29を合成することができる。
本ビピリジン化合物29
The bipyridine compound 29 represented by the following formula can be synthesized according to the method described in Production Example 2 using the bipyridine compound 26 instead of the bipyridine compound 9.
This bipyridine compound 29
製造例10-1
100mLの1.6M n-ブチルリチウムヘキサン溶液、及びTHF160mLの混合物に、-78℃でエチルメチルスルホン23g及びTHF20mLの混合物を滴下した。この反応混合物を0℃まで徐々に昇温した後、-78℃に再冷却した。この反応混合物に、-78℃で5-フルオロ-2-シアノピリジン20g及びTHF20mLの混合物を滴下した。室温まで徐々に昇温した後、この反応混合物に2N塩酸を加え、30分間撹拌した。得られた混合物を酢酸エチルで抽出し、得られた有機層を飽和食塩水で洗浄した。得られた有機層を無水硫酸ナトリウムで乾燥した後に、減圧下濃縮することにより、次式で示される中間体16を40g得た。
1H-NMR (CDCl3) δ: 8.57 (1H, d), 8.19 (1H, dd), 7.62-7.55 (1H, m), 4.97 (2H, s), 3.30 (2H, q), 1.47 (3H, t).
Production Example 10-1
To a mixture of 100 mL of 1.6 M n-butyllithium hexane solution and 160 mL of THF, a mixture of 23 g of ethyl methyl sulfone and 20 mL of THF was added dropwise at −78 ° C. The reaction mixture was gradually warmed to 0 ° C. and then re-cooled to −78 ° C. To this reaction mixture, a mixture of 20 g of 5-fluoro-2-cyanopyridine and 20 mL of THF was added dropwise at −78 ° C. After gradually warming to room temperature, 2N hydrochloric acid was added to the reaction mixture and stirred for 30 minutes. The obtained mixture was extracted with ethyl acetate, and the obtained organic layer was washed with saturated brine. The obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure to obtain 40 g of intermediate 16 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.57 (1H, d), 8.19 (1H, dd), 7.62-7.55 (1H, m), 4.97 (2H, s), 3.30 (2H, q), 1.47 (3H , t).
100mLの1.6M n-ブチルリチウムヘキサン溶液、及びTHF160mLの混合物に、-78℃でエチルメチルスルホン23g及びTHF20mLの混合物を滴下した。この反応混合物を0℃まで徐々に昇温した後、-78℃に再冷却した。この反応混合物に、-78℃で5-フルオロ-2-シアノピリジン20g及びTHF20mLの混合物を滴下した。室温まで徐々に昇温した後、この反応混合物に2N塩酸を加え、30分間撹拌した。得られた混合物を酢酸エチルで抽出し、得られた有機層を飽和食塩水で洗浄した。得られた有機層を無水硫酸ナトリウムで乾燥した後に、減圧下濃縮することにより、次式で示される中間体16を40g得た。
To a mixture of 100 mL of 1.6 M n-butyllithium hexane solution and 160 mL of THF, a mixture of 23 g of ethyl methyl sulfone and 20 mL of THF was added dropwise at −78 ° C. The reaction mixture was gradually warmed to 0 ° C. and then re-cooled to −78 ° C. To this reaction mixture, a mixture of 20 g of 5-fluoro-2-cyanopyridine and 20 mL of THF was added dropwise at −78 ° C. After gradually warming to room temperature, 2N hydrochloric acid was added to the reaction mixture and stirred for 30 minutes. The obtained mixture was extracted with ethyl acetate, and the obtained organic layer was washed with saturated brine. The obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure to obtain 40 g of intermediate 16 represented by the following formula.
製造例10-2
11mLのオキサリルクロリド、及びクロロホルム86mLの混合物に、氷冷下10mLのDMFを滴下した。氷冷下30分間撹拌した後、この混合物に33mLのブチルビニルエーテルを滴下した。室温に昇温後2時間撹拌した後、この混合物に氷冷下10gの中間体16、42mLのトリエチルアミン、及びクロロホルム30mLの混合物を滴下した。室温に昇温後1時間撹拌した。得られた混合物を飽和塩化アンモニウム水溶液に加え、クロロホルムで抽出した。得られた有機層を水及び飽和食塩水で洗浄後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をエタノール30mLで希釈した後、室温で28%アンモニア水溶液10mLを加えた。この混合物を60℃で2.5時間加熱撹拌した後、室温まで放冷し、飽和炭酸水素ナトリウム水溶液に加え、酢酸エチルで抽出した。得られた有機層を無水硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される中間体17を9.4g得た。
1H-NMR (CDCl3) δ: 8.88 (1H, dd), 8.52-8.46 (2H, m), 7.87 (1H, dd), 7.62-7.54 (2H, m), 3.86 (2H, q), 1.38 (3H, t).
Production Example 10-2
To a mixture of 11 mL of oxalyl chloride and 86 mL of chloroform, 10 mL of DMF was added dropwise under ice cooling. After stirring for 30 minutes under ice cooling, 33 mL of butyl vinyl ether was added dropwise to the mixture. After warming to room temperature and stirring for 2 hours, a mixture of 10 g of Intermediate 16, 42 mL of triethylamine and 30 mL of chloroform was added dropwise to this mixture under ice cooling. The mixture was warmed to room temperature and stirred for 1 hour. The resulting mixture was added to a saturated aqueous ammonium chloride solution and extracted with chloroform. The obtained organic layer was washed with water and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was diluted with 30 mL of ethanol, and 10 mL of 28% aqueous ammonia solution was added at room temperature. The mixture was heated and stirred at 60 ° C. for 2.5 hours, allowed to cool to room temperature, added to saturated aqueous sodium hydrogen carbonate solution, and extracted with ethyl acetate. The obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 9.4 g of intermediate 17 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.88 (1H, dd), 8.52-8.46 (2H, m), 7.87 (1H, dd), 7.62-7.54 (2H, m), 3.86 (2H, q), 1.38 (3H, t).
11mLのオキサリルクロリド、及びクロロホルム86mLの混合物に、氷冷下10mLのDMFを滴下した。氷冷下30分間撹拌した後、この混合物に33mLのブチルビニルエーテルを滴下した。室温に昇温後2時間撹拌した後、この混合物に氷冷下10gの中間体16、42mLのトリエチルアミン、及びクロロホルム30mLの混合物を滴下した。室温に昇温後1時間撹拌した。得られた混合物を飽和塩化アンモニウム水溶液に加え、クロロホルムで抽出した。得られた有機層を水及び飽和食塩水で洗浄後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をエタノール30mLで希釈した後、室温で28%アンモニア水溶液10mLを加えた。この混合物を60℃で2.5時間加熱撹拌した後、室温まで放冷し、飽和炭酸水素ナトリウム水溶液に加え、酢酸エチルで抽出した。得られた有機層を無水硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される中間体17を9.4g得た。
To a mixture of 11 mL of oxalyl chloride and 86 mL of chloroform, 10 mL of DMF was added dropwise under ice cooling. After stirring for 30 minutes under ice cooling, 33 mL of butyl vinyl ether was added dropwise to the mixture. After warming to room temperature and stirring for 2 hours, a mixture of 10 g of Intermediate 16, 42 mL of triethylamine and 30 mL of chloroform was added dropwise to this mixture under ice cooling. The mixture was warmed to room temperature and stirred for 1 hour. The resulting mixture was added to a saturated aqueous ammonium chloride solution and extracted with chloroform. The obtained organic layer was washed with water and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was diluted with 30 mL of ethanol, and 10 mL of 28% aqueous ammonia solution was added at room temperature. The mixture was heated and stirred at 60 ° C. for 2.5 hours, allowed to cool to room temperature, added to saturated aqueous sodium hydrogen carbonate solution, and extracted with ethyl acetate. The obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 9.4 g of intermediate 17 represented by the following formula.
製造例10-3
400mgの中間体17、90mgの水素化ナトリウム(60%、油状)、及びNMP2mLの混合物に、氷冷下230mgの2,2,2-トリフルオロエタノールを加えた。70℃で2日間加熱撹拌した。この反応混合物を室温まで放冷した後、水を加え、酢酸エチルで抽出した。得られた有機層を、水及び飽和食塩水で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物2を170mg得た。
本ビピリジン化合物2
1H-NMR (CDCl3) δ: 8.87 (1H, dd), 8.49 (1H, dd), 8.37 (1H, d), 7.86 (1H, d), 7.54 (1H, dd), 7.42 (1H, dd), 4.48 (2H, q), 3.89 (2H, q), 1.38 (3H, t).
Production Example 10-3
To a mixture of 400 mg of Intermediate 17, 90 mg of sodium hydride (60%, oil), and 2 mL of NMP was added 230 mg of 2,2,2-trifluoroethanol under ice cooling. The mixture was heated and stirred at 70 ° C. for 2 days. The reaction mixture was allowed to cool to room temperature, water was added, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed with water and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 170 mg of the present bipyridine compound 2 represented by the following formula.
This bipyridine compound 2
1 H-NMR (CDCl 3 ) δ: 8.87 (1H, dd), 8.49 (1H, dd), 8.37 (1H, d), 7.86 (1H, d), 7.54 (1H, dd), 7.42 (1H, dd ), 4.48 (2H, q), 3.89 (2H, q), 1.38 (3H, t).
400mgの中間体17、90mgの水素化ナトリウム(60%、油状)、及びNMP2mLの混合物に、氷冷下230mgの2,2,2-トリフルオロエタノールを加えた。70℃で2日間加熱撹拌した。この反応混合物を室温まで放冷した後、水を加え、酢酸エチルで抽出した。得られた有機層を、水及び飽和食塩水で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物2を170mg得た。
本ビピリジン化合物2
To a mixture of 400 mg of Intermediate 17, 90 mg of sodium hydride (60%, oil), and 2 mL of NMP was added 230 mg of 2,2,2-trifluoroethanol under ice cooling. The mixture was heated and stirred at 70 ° C. for 2 days. The reaction mixture was allowed to cool to room temperature, water was added, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed with water and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 170 mg of the present bipyridine compound 2 represented by the following formula.
This bipyridine compound 2
製造例11
2.0gの本ビピリジン化合物8、6mLの硫酸、及び水2mLの混合物に、氷冷下630μLの30%過酸化水素水を加えた。室温で2日間撹拌した後、この反応混合物を氷水に加えた。得られた混合物をクロロホルムで抽出し、有機層を飽和炭酸水素ナトリウム水溶液、及び飽和食塩水で順次洗浄し、無水硫酸ナトリウムで乾燥した後に、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物204を0.2g、本ビピリジン化合物214を0.6g、及び本ビピリジン化合物224を0.2g得た。
本ビピリジン化合物204
1H-NMR (CDCl3) δ: 8.93 (1H, dd), 8.37 (1H, dd), 8.04 (1H, d), 7.64 (1H, dd), 7.38 (1H, d), 7.05 (1H, dd), 4.50 (2H, t), 3.76-3.64 (1H, m), 3.61-3.49 (1H, m), 1.35 (3H, t).
本ビピリジン化合物214
1H-NMR (CDCl3) δ: 8.50 (1H, dd), 8.43 (1H, d), 7.97 (1H, dd), 7.69 (1H, d), 7.50 (1H, dd), 7.43 (1H, dd), 4.54 (2H, t), 3.44 (2H, q), 1.30 (3H, t).
本ビピリジン化合物224
1H-NMR (CDCl3) δ: 8.49 (1H, dd), 8.14 (1H, d), 7.91 (1H, dd), 7.57 (1H, dd), 7.42 (1H, d), 7.07 (1H, dd), 4.51 (2H, t), 3.36-3.18 (2H, m), 1.28 (3H, t).
Production Example 11
To a mixture of 2.0 g of the present bipyridine compound 8, 6 mL of sulfuric acid, and 2 mL of water, 630 μL of 30% aqueous hydrogen peroxide was added under ice cooling. After stirring at room temperature for 2 days, the reaction mixture was added to ice water. The obtained mixture was extracted with chloroform, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 0.2 g of the present bipyridine compound 204 represented by the following formula, 0.6 g of the present bipyridine compound 214, and 0.2 g of the present bipyridine compound 224.
The bipyridine compound 204
1 H-NMR (CDCl 3 ) δ: 8.93 (1H, dd), 8.37 (1H, dd), 8.04 (1H, d), 7.64 (1H, dd), 7.38 (1H, d), 7.05 (1H, dd ), 4.50 (2H, t), 3.76-3.64 (1H, m), 3.61-3.49 (1H, m), 1.35 (3H, t).
The bipyridine compound 214
1 H-NMR (CDCl 3 ) δ: 8.50 (1H, dd), 8.43 (1H, d), 7.97 (1H, dd), 7.69 (1H, d), 7.50 (1H, dd), 7.43 (1H, dd ), 4.54 (2H, t), 3.44 (2H, q), 1.30 (3H, t).
The bipyridine compound 224
1 H-NMR (CDCl 3 ) δ: 8.49 (1H, dd), 8.14 (1H, d), 7.91 (1H, dd), 7.57 (1H, dd), 7.42 (1H, d), 7.07 (1H, dd ), 4.51 (2H, t), 3.36-3.18 (2H, m), 1.28 (3H, t).
2.0gの本ビピリジン化合物8、6mLの硫酸、及び水2mLの混合物に、氷冷下630μLの30%過酸化水素水を加えた。室温で2日間撹拌した後、この反応混合物を氷水に加えた。得られた混合物をクロロホルムで抽出し、有機層を飽和炭酸水素ナトリウム水溶液、及び飽和食塩水で順次洗浄し、無水硫酸ナトリウムで乾燥した後に、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物204を0.2g、本ビピリジン化合物214を0.6g、及び本ビピリジン化合物224を0.2g得た。
本ビピリジン化合物204
本ビピリジン化合物214
本ビピリジン化合物224
To a mixture of 2.0 g of the present bipyridine compound 8, 6 mL of sulfuric acid, and 2 mL of water, 630 μL of 30% aqueous hydrogen peroxide was added under ice cooling. After stirring at room temperature for 2 days, the reaction mixture was added to ice water. The obtained mixture was extracted with chloroform, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 0.2 g of the present bipyridine compound 204 represented by the following formula, 0.6 g of the present bipyridine compound 214, and 0.2 g of the present bipyridine compound 224.
The bipyridine compound 204
The bipyridine compound 214
The bipyridine compound 224
製造例12
6.8gの本ビピリジン化合物204及び本ビピリジン化合物224の混合物(混合比率、本ビピリジン化合物204:本ビピリジン化合物224=100:1)に15mLのオキシ塩化リンを加え、110℃で4時間加熱撹拌した。反応混合物を減圧下濃縮し、得られた残渣をクロロホルムで希釈し、飽和炭酸水素ナトリウム水溶液を加えた。この混合物をクロロホルムで抽出し、得られた有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物169を6.7g、及び本ビピリジン化合物194を0.07g得た。
本ビピリジン化合物169
1H-NMR (CDCl3) δ: 8.86 (1H, dd), 8.49 (1H, dd), 7.86 (1H, d), 7.56 (1H, dd), 7.42 (1H, d), 4.56 (2H, t), 3.98 (2H, q), 1.44 (3H, t).
本ビピリジン化合物194
1H-NMR (CDCl3) δ: 8.93 (1H, d), 7.47 (1H, d), 7.42 (1H, d), 7.39 (1H, d), 4.56 (2H, t), 3.70 (2H, q), 1.40 (3H, t).
Production Example 12
15 mL of phosphorus oxychloride was added to a mixture of 6.8 g of the present bipyridine compound 204 and the present bipyridine compound 224 (mixing ratio, the present bipyridine compound 204: this bipyridine compound 224 = 100: 1), and the mixture was heated and stirred at 110 ° C. for 4 hours. . The reaction mixture was concentrated under reduced pressure, the resulting residue was diluted with chloroform, and a saturated aqueous sodium hydrogen carbonate solution was added. This mixture was extracted with chloroform, and the obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 6.7 g of the present bipyridine compound 169 represented by the following formula and 0.07 g of the present bipyridine compound 194.
The bipyridine compound 169
1 H-NMR (CDCl 3 ) δ: 8.86 (1H, dd), 8.49 (1H, dd), 7.86 (1H, d), 7.56 (1H, dd), 7.42 (1H, d), 4.56 (2H, t ), 3.98 (2H, q), 1.44 (3H, t).
The bipyridine compound 194
1 H-NMR (CDCl 3 ) δ: 8.93 (1H, d), 7.47 (1H, d), 7.42 (1H, d), 7.39 (1H, d), 4.56 (2H, t), 3.70 (2H, q ), 1.40 (3H, t).
6.8gの本ビピリジン化合物204及び本ビピリジン化合物224の混合物(混合比率、本ビピリジン化合物204:本ビピリジン化合物224=100:1)に15mLのオキシ塩化リンを加え、110℃で4時間加熱撹拌した。反応混合物を減圧下濃縮し、得られた残渣をクロロホルムで希釈し、飽和炭酸水素ナトリウム水溶液を加えた。この混合物をクロロホルムで抽出し、得られた有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物169を6.7g、及び本ビピリジン化合物194を0.07g得た。
本ビピリジン化合物169
本ビピリジン化合物194
15 mL of phosphorus oxychloride was added to a mixture of 6.8 g of the present bipyridine compound 204 and the present bipyridine compound 224 (mixing ratio, the present bipyridine compound 204: this bipyridine compound 224 = 100: 1), and the mixture was heated and stirred at 110 ° C. for 4 hours. . The reaction mixture was concentrated under reduced pressure, the resulting residue was diluted with chloroform, and a saturated aqueous sodium hydrogen carbonate solution was added. This mixture was extracted with chloroform, and the obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 6.7 g of the present bipyridine compound 169 represented by the following formula and 0.07 g of the present bipyridine compound 194.
The bipyridine compound 169
The bipyridine compound 194
製造例13
3.7gの本ビピリジン化合物214に、10mLのオキシ塩化リンを加え、110℃で4時間加熱撹拌した。反応混合物を減圧下濃縮し、得られた残渣をクロロホルムで希釈し、飽和炭酸水素ナトリウム水溶液を加えた。この混合物をクロロホルムで抽出し、得られた有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物79を3.0g得た。
1H-NMR (CDCl3) δ: 8.42 (1H, dd), 8.37 (1H, d), 7.91 (1H, d), 7.54 (1H, dd), 7.41 (1H, dd), 4.54 (2H, t), 3.92 (2H, q), 1.38 (3H, t).
Production Example 13
To 3.7 g of the present bipyridine compound 214, 10 mL of phosphorus oxychloride was added, and the mixture was heated and stirred at 110 ° C. for 4 hours. The reaction mixture was concentrated under reduced pressure, the resulting residue was diluted with chloroform, and a saturated aqueous sodium hydrogen carbonate solution was added. This mixture was extracted with chloroform, and the obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 3.0 g of the present bipyridine compound 79 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.42 (1H, dd), 8.37 (1H, d), 7.91 (1H, d), 7.54 (1H, dd), 7.41 (1H, dd), 4.54 (2H, t ), 3.92 (2H, q), 1.38 (3H, t).
3.7gの本ビピリジン化合物214に、10mLのオキシ塩化リンを加え、110℃で4時間加熱撹拌した。反応混合物を減圧下濃縮し、得られた残渣をクロロホルムで希釈し、飽和炭酸水素ナトリウム水溶液を加えた。この混合物をクロロホルムで抽出し、得られた有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物79を3.0g得た。
To 3.7 g of the present bipyridine compound 214, 10 mL of phosphorus oxychloride was added, and the mixture was heated and stirred at 110 ° C. for 4 hours. The reaction mixture was concentrated under reduced pressure, the resulting residue was diluted with chloroform, and a saturated aqueous sodium hydrogen carbonate solution was added. This mixture was extracted with chloroform, and the obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 3.0 g of the present bipyridine compound 79 represented by the following formula.
製造例14
500mgの本ビピリジン化合物79、及びDMF2mLの混合物に、氷冷下0.1mLの28%ナトリウムメトキシドメタノール溶液を加えた。室温で2時間撹拌した後、反応混合物を、飽和炭酸水素ナトリウム水溶液に加え、酢酸エチルで抽出した。得られた有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物94を230mg得た。
1H-NMR (CDCl3) δ: 8.35 (1H, dd), 8.29 (1H, d), 7.83 (1H, dd), 7.40 (1H, dd), 6.88 (1H, d), 4.54 (2H, td), 4.03 (3H, s), 3.83 (2H, q), 1.36 (3H, t).
Production Example 14
To a mixture of 500 mg of the present bipyridine compound 79 and 2 mL of DMF, 0.1 mL of 28% sodium methoxide methanol solution was added under ice cooling. After stirring at room temperature for 2 hours, the reaction mixture was added to saturated aqueous sodium hydrogen carbonate solution and extracted with ethyl acetate. The obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 230 mg of the present bipyridine compound 94 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.35 (1H, dd), 8.29 (1H, d), 7.83 (1H, dd), 7.40 (1H, dd), 6.88 (1H, d), 4.54 (2H, td ), 4.03 (3H, s), 3.83 (2H, q), 1.36 (3H, t).
500mgの本ビピリジン化合物79、及びDMF2mLの混合物に、氷冷下0.1mLの28%ナトリウムメトキシドメタノール溶液を加えた。室温で2時間撹拌した後、反応混合物を、飽和炭酸水素ナトリウム水溶液に加え、酢酸エチルで抽出した。得られた有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物94を230mg得た。
To a mixture of 500 mg of the present bipyridine compound 79 and 2 mL of DMF, 0.1 mL of 28% sodium methoxide methanol solution was added under ice cooling. After stirring at room temperature for 2 hours, the reaction mixture was added to saturated aqueous sodium hydrogen carbonate solution and extracted with ethyl acetate. The obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 230 mg of the present bipyridine compound 94 represented by the following formula.
製造例15
200mgの本ビピリジン化合物79、及びDMF2mLの混合物に、氷浴下39mgの1H-1,2,4-トリアゾール及び22mgの水素化ナトリウム(60%油状)を加えた。室温で24時間撹拌した後、反応混合物を、飽和炭酸水素ナトリウム水溶液に加え、酢酸エチルで抽出した。得られた有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物104を160mg得た。
1H-NMR (CDCl3) δ: 9.23 (1H, s), 8.67 (1H, d), 8.41 (1H, dd), 8.17 (1H, s), 8.10 (1H, d), 7.90 (1H, dd), 7.47 (1H, dd), 4.57 (2H, td), 3.93 (2H, q), 1.41 (3H, t).
Production Example 15
To a mixture of 200 mg of the present bipyridine compound 79 and 2 mL of DMF, 39 mg of 1H-1,2,4-triazole and 22 mg of sodium hydride (60% oil) were added in an ice bath. After stirring at room temperature for 24 hours, the reaction mixture was added to saturated aqueous sodium hydrogen carbonate solution and extracted with ethyl acetate. The obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 160 mg of the present bipyridine compound 104 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 9.23 (1H, s), 8.67 (1H, d), 8.41 (1H, dd), 8.17 (1H, s), 8.10 (1H, d), 7.90 (1H, dd ), 7.47 (1H, dd), 4.57 (2H, td), 3.93 (2H, q), 1.41 (3H, t).
200mgの本ビピリジン化合物79、及びDMF2mLの混合物に、氷浴下39mgの1H-1,2,4-トリアゾール及び22mgの水素化ナトリウム(60%油状)を加えた。室温で24時間撹拌した後、反応混合物を、飽和炭酸水素ナトリウム水溶液に加え、酢酸エチルで抽出した。得られた有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物104を160mg得た。
To a mixture of 200 mg of the present bipyridine compound 79 and 2 mL of DMF, 39 mg of 1H-1,2,4-triazole and 22 mg of sodium hydride (60% oil) were added in an ice bath. After stirring at room temperature for 24 hours, the reaction mixture was added to saturated aqueous sodium hydrogen carbonate solution and extracted with ethyl acetate. The obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 160 mg of the present bipyridine compound 104 represented by the following formula.
製造例16
200mgの本ビピリジン化合物79、0.96mLのジイソプロピルエチルアミン、及びアセトニトリル1mLの混合物に、氷冷下960mgの2-クロロ-5-(アミノメチル)チアゾール臭化水素酸塩を加えた。80℃で5日間撹拌した後、反応混合物を飽和炭酸水素ナトリウム水溶液に加え、酢酸エチルで抽出した。得られた有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物89を200mg得た。
1H-NMR (CDCl3) δ: 8.35 (1H, d), 8.12 (1H, d), 7.77 (1H, d), 7.44 (1H, s), 7.40 (1H, dd), 6.52 (1H, d), 5.40 (1H, t), 4.77 (2H, d), 4.54 (2H, t), 3.77 (2H, q), 1.35 (3H, t).
Production Example 16
To a mixture of 200 mg of the present bipyridine compound 79, 0.96 mL of diisopropylethylamine, and 1 mL of acetonitrile, 960 mg of 2-chloro-5- (aminomethyl) thiazole hydrobromide was added under ice cooling. After stirring at 80 ° C. for 5 days, the reaction mixture was added to a saturated aqueous sodium hydrogen carbonate solution and extracted with ethyl acetate. The obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 200 mg of the present bipyridine compound 89 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.35 (1H, d), 8.12 (1H, d), 7.77 (1H, d), 7.44 (1H, s), 7.40 (1H, dd), 6.52 (1H, d ), 5.40 (1H, t), 4.77 (2H, d), 4.54 (2H, t), 3.77 (2H, q), 1.35 (3H, t).
200mgの本ビピリジン化合物79、0.96mLのジイソプロピルエチルアミン、及びアセトニトリル1mLの混合物に、氷冷下960mgの2-クロロ-5-(アミノメチル)チアゾール臭化水素酸塩を加えた。80℃で5日間撹拌した後、反応混合物を飽和炭酸水素ナトリウム水溶液に加え、酢酸エチルで抽出した。得られた有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物89を200mg得た。
To a mixture of 200 mg of the present bipyridine compound 79, 0.96 mL of diisopropylethylamine, and 1 mL of acetonitrile, 960 mg of 2-chloro-5- (aminomethyl) thiazole hydrobromide was added under ice cooling. After stirring at 80 ° C. for 5 days, the reaction mixture was added to a saturated aqueous sodium hydrogen carbonate solution and extracted with ethyl acetate. The obtained organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 200 mg of the present bipyridine compound 89 represented by the following formula.
製造例17
200mgの本ビピリジン化合物79、及びNMP1mLの混合物に、室温で0.09mLの28%アンモニア水溶液を加えた。この反応混合物を、80℃で3日間撹拌した。室温まで放冷した後、この反応混合物を飽和炭酸水素ナトリウム水溶液に加え、酢酸エチルで抽出した。得られた有機層を飽和食塩水で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物59を110mg得た。
1H-NMR (CDCl3) δ: 8.34 (1H, d), 8.13 (1H, d), 7.71 (1H, dd), 7.38 (1H, dd), 6.58 (1H, d), 5.01 (2H, s), 4.52 (2H, td), 3.66 (2H, q), 1.32 (3H, t).
Production Example 17
To a mixture of 200 mg of the present bipyridine compound 79 and 1 mL of NMP, 0.09 mL of 28% aqueous ammonia solution was added at room temperature. The reaction mixture was stirred at 80 ° C. for 3 days. After allowing to cool to room temperature, the reaction mixture was added to a saturated aqueous sodium hydrogen carbonate solution and extracted with ethyl acetate. The obtained organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 110 mg of the present bipyridine compound 59 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.34 (1H, d), 8.13 (1H, d), 7.71 (1H, dd), 7.38 (1H, dd), 6.58 (1H, d), 5.01 (2H, s ), 4.52 (2H, td), 3.66 (2H, q), 1.32 (3H, t).
200mgの本ビピリジン化合物79、及びNMP1mLの混合物に、室温で0.09mLの28%アンモニア水溶液を加えた。この反応混合物を、80℃で3日間撹拌した。室温まで放冷した後、この反応混合物を飽和炭酸水素ナトリウム水溶液に加え、酢酸エチルで抽出した。得られた有機層を飽和食塩水で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物59を110mg得た。
To a mixture of 200 mg of the present bipyridine compound 79 and 1 mL of NMP, 0.09 mL of 28% aqueous ammonia solution was added at room temperature. The reaction mixture was stirred at 80 ° C. for 3 days. After allowing to cool to room temperature, the reaction mixture was added to a saturated aqueous sodium hydrogen carbonate solution and extracted with ethyl acetate. The obtained organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 110 mg of the present bipyridine compound 59 represented by the following formula.
製造例18
200mgの本ビピリジン化合物79、及びDMF1mLの混合物に、室温で0.13mLの50%ジメチルアミン水溶液を加えた。この反応混合物を、60℃で4時間撹拌した。室温まで放冷した後、この反応混合物をシリカゲルクロマトグラフィーに付し、本ビピリジン化合物69を200mg得た。
1H-NMR (CDCl3) δ: 8.80 (1H, d), 8.48 (1H, d), 8.37 (1H, d), 7.88 (1H, dd), 7.42 (1H, dd), 4.54 (2H, td), 3.94 (2H, q), 1.55 (6H, s), 1.40 (3H, t).
Production Example 18
To a mixture of 200 mg of the present bipyridine compound 79 and 1 mL of DMF, 0.13 mL of 50% aqueous dimethylamine solution was added at room temperature. The reaction mixture was stirred at 60 ° C. for 4 hours. After allowing to cool to room temperature, the reaction mixture was subjected to silica gel chromatography to obtain 200 mg of the bipyridine compound 69.
1 H-NMR (CDCl 3 ) δ: 8.80 (1H, d), 8.48 (1H, d), 8.37 (1H, d), 7.88 (1H, dd), 7.42 (1H, dd), 4.54 (2H, td ), 3.94 (2H, q), 1.55 (6H, s), 1.40 (3H, t).
200mgの本ビピリジン化合物79、及びDMF1mLの混合物に、室温で0.13mLの50%ジメチルアミン水溶液を加えた。この反応混合物を、60℃で4時間撹拌した。室温まで放冷した後、この反応混合物をシリカゲルクロマトグラフィーに付し、本ビピリジン化合物69を200mg得た。
To a mixture of 200 mg of the present bipyridine compound 79 and 1 mL of DMF, 0.13 mL of 50% aqueous dimethylamine solution was added at room temperature. The reaction mixture was stirred at 60 ° C. for 4 hours. After allowing to cool to room temperature, the reaction mixture was subjected to silica gel chromatography to obtain 200 mg of the bipyridine compound 69.
製造例19
200mgの本ビピリジン化合物79、及びNMP1mLの混合物に、室温で0.2mLの2,2,2-トリフルオロエチルアミンを加えた。この反応混合物を、120℃で4日間撹拌した。室温まで放冷した後、この反応混合物を飽和炭酸水素ナトリウム水溶液に加え、酢酸エチルで抽出した。得られた有機層を飽和食塩水で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物74を180mg得た。
1H-NMR (CDCl3) δ: 8.34 (1H, d), 8.17 (1H, d), 7.75 (1H, d), 7.40 (1H, dd), 6.61 (1H, d), 5.18 (1H, t), 4.54 (2H, t), 4.28-4.16 (2H, m), 3.79 (2H, q), 1.36 (3H, t).
Production Example 19
To a mixture of 200 mg of the present bipyridine compound 79 and 1 mL of NMP, 0.2 mL of 2,2,2-trifluoroethylamine was added at room temperature. The reaction mixture was stirred at 120 ° C. for 4 days. After allowing to cool to room temperature, the reaction mixture was added to a saturated aqueous sodium hydrogen carbonate solution and extracted with ethyl acetate. The obtained organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 180 mg of the present bipyridine compound 74 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.34 (1H, d), 8.17 (1H, d), 7.75 (1H, d), 7.40 (1H, dd), 6.61 (1H, d), 5.18 (1H, t ), 4.54 (2H, t), 4.28-4.16 (2H, m), 3.79 (2H, q), 1.36 (3H, t).
200mgの本ビピリジン化合物79、及びNMP1mLの混合物に、室温で0.2mLの2,2,2-トリフルオロエチルアミンを加えた。この反応混合物を、120℃で4日間撹拌した。室温まで放冷した後、この反応混合物を飽和炭酸水素ナトリウム水溶液に加え、酢酸エチルで抽出した。得られた有機層を飽和食塩水で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物74を180mg得た。
To a mixture of 200 mg of the present bipyridine compound 79 and 1 mL of NMP, 0.2 mL of 2,2,2-trifluoroethylamine was added at room temperature. The reaction mixture was stirred at 120 ° C. for 4 days. After allowing to cool to room temperature, the reaction mixture was added to a saturated aqueous sodium hydrogen carbonate solution and extracted with ethyl acetate. The obtained organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 180 mg of the present bipyridine compound 74 represented by the following formula.
製造例20
500mgの本ビピリジン化合物204、240mgのトリエチルアミン、及びアセトニトリル3mLの混合物に、室温でトリメチルシリルシアニド360mgを加えた。この混合物を80℃で34時間加熱撹拌した。反応混合物を減圧下濃縮し、得られた残渣を酢酸エチルで希釈し、飽和炭酸水素ナトリウム水溶液を加えた。この混合物を酢酸エチルで抽出し、得られた有機層を飽和食塩水で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物179を180mg得た。
1H-NMR (CDCl3) δ: 8.88 (1H, dd), 8.51 (1H, dd), 8.12 (1H, d), 7.61 (1H, dd), 7.55 (1H, d), 4.66 (2H, t), 3.90 (2H, q), 1.45 (3H, t).
Production Example 20
To a mixture of 500 mg of the present bipyridine compound 204, 240 mg of triethylamine, and 3 mL of acetonitrile, 360 mg of trimethylsilylcyanide was added at room temperature. This mixture was heated and stirred at 80 ° C for 34 hours. The reaction mixture was concentrated under reduced pressure, the resulting residue was diluted with ethyl acetate, and saturated aqueous sodium hydrogen carbonate solution was added. The mixture was extracted with ethyl acetate, and the obtained organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 180 mg of the present bipyridine compound 179 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.88 (1H, dd), 8.51 (1H, dd), 8.12 (1H, d), 7.61 (1H, dd), 7.55 (1H, d), 4.66 (2H, t ), 3.90 (2H, q), 1.45 (3H, t).
500mgの本ビピリジン化合物204、240mgのトリエチルアミン、及びアセトニトリル3mLの混合物に、室温でトリメチルシリルシアニド360mgを加えた。この混合物を80℃で34時間加熱撹拌した。反応混合物を減圧下濃縮し、得られた残渣を酢酸エチルで希釈し、飽和炭酸水素ナトリウム水溶液を加えた。この混合物を酢酸エチルで抽出し、得られた有機層を飽和食塩水で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物179を180mg得た。
To a mixture of 500 mg of the present bipyridine compound 204, 240 mg of triethylamine, and 3 mL of acetonitrile, 360 mg of trimethylsilylcyanide was added at room temperature. This mixture was heated and stirred at 80 ° C for 34 hours. The reaction mixture was concentrated under reduced pressure, the resulting residue was diluted with ethyl acetate, and saturated aqueous sodium hydrogen carbonate solution was added. The mixture was extracted with ethyl acetate, and the obtained organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 180 mg of the present bipyridine compound 179 represented by the following formula.
製造例21
1.0gの本ビピリジン化合物204に5mLの無水酢酸を加え、100℃で20時間加熱撹拌した。反応混合物を減圧下濃縮し、得られた残渣を酢酸エチルで希釈し、飽和炭酸水素ナトリウム水溶液を加えた。この混合物を酢酸エチルで抽出し、得られた有機層を飽和食塩水で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物174を980mg得た。
1H-NMR (CDCl3) δ: 8.86 (1H, dd), 8.47 (1H, dd), 7.83 (1H, d), 7.55 (1H, dd), 7.47 (1H, d), 4.51 (2H, t), 3.78 (2H, q), 2.33 (3H, s), 1.36 (3H, t).
Production Example 21
5 mL of acetic anhydride was added to 1.0 g of the present bipyridine compound 204, and the mixture was heated and stirred at 100 ° C. for 20 hours. The reaction mixture was concentrated under reduced pressure, the resulting residue was diluted with ethyl acetate, and saturated aqueous sodium hydrogen carbonate solution was added. The mixture was extracted with ethyl acetate, and the obtained organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 980 mg of the present bipyridine compound 174 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.86 (1H, dd), 8.47 (1H, dd), 7.83 (1H, d), 7.55 (1H, dd), 7.47 (1H, d), 4.51 (2H, t ), 3.78 (2H, q), 2.33 (3H, s), 1.36 (3H, t).
1.0gの本ビピリジン化合物204に5mLの無水酢酸を加え、100℃で20時間加熱撹拌した。反応混合物を減圧下濃縮し、得られた残渣を酢酸エチルで希釈し、飽和炭酸水素ナトリウム水溶液を加えた。この混合物を酢酸エチルで抽出し、得られた有機層を飽和食塩水で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物174を980mg得た。
5 mL of acetic anhydride was added to 1.0 g of the present bipyridine compound 204, and the mixture was heated and stirred at 100 ° C. for 20 hours. The reaction mixture was concentrated under reduced pressure, the resulting residue was diluted with ethyl acetate, and saturated aqueous sodium hydrogen carbonate solution was added. The mixture was extracted with ethyl acetate, and the obtained organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 980 mg of the present bipyridine compound 174 represented by the following formula.
製造例22
660mgの本ビピリジン化合物174、及びメタノール7mLの混合物に、室温で600mgの炭酸カリウムを加えて、室温で1.5時間撹拌した後、2N塩酸を加えてpH4に調整した。この混合物を酢酸エチルで抽出し、有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物159を530mg得た。
1H-NMR (CDCl3) δ: 11.08 (1H, s), 8.89 (1H, dd), 8.60 (1H, d), 7.61 (1H, dd), 7.32-7.24 (1H, br m), 7.11 (1H, d), 4.71 (2H, t), 3.15 (2H, q), 1.18 (3H, t).
Production Example 22
To a mixture of 660 mg of the present bipyridine compound 174 and methanol 7 mL, 600 mg of potassium carbonate was added at room temperature, stirred at room temperature for 1.5 hours, and then adjusted to pH 4 with 2N hydrochloric acid. This mixture was extracted with ethyl acetate, and the organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 530 mg of the present bipyridine compound 159 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 11.08 (1H, s), 8.89 (1H, dd), 8.60 (1H, d), 7.61 (1H, dd), 7.32-7.24 (1H, br m), 7.11 ( 1H, d), 4.71 (2H, t), 3.15 (2H, q), 1.18 (3H, t).
660mgの本ビピリジン化合物174、及びメタノール7mLの混合物に、室温で600mgの炭酸カリウムを加えて、室温で1.5時間撹拌した後、2N塩酸を加えてpH4に調整した。この混合物を酢酸エチルで抽出し、有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物159を530mg得た。
To a mixture of 660 mg of the present bipyridine compound 174 and methanol 7 mL, 600 mg of potassium carbonate was added at room temperature, stirred at room temperature for 1.5 hours, and then adjusted to pH 4 with 2N hydrochloric acid. This mixture was extracted with ethyl acetate, and the organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 530 mg of the present bipyridine compound 159 represented by the following formula.
製造例23
340mgの本ビピリジン化合物159、400mgの炭酸セシウム、及びDMF3mLの混合物に、室温で0.98mLのヨードメタンを加えた。室温で1日撹拌した後、この反応混合物をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物164を250mg得た。
1H-NMR (CDCl3) δ: 8.88 (1H, d), 8.46 (1H, d), 7.57 (1H, dd), 7.34 (1H, d), 7.28 (1H, d), 4.52 (2H, t), 4.00 (3H, s), 3.62 (2H, q), 1.34 (3H, t).
Production Example 23
To a mixture of 340 mg of the present bipyridine compound 159, 400 mg cesium carbonate, and 3 mL DMF, 0.98 mL iodomethane was added at room temperature. After stirring at room temperature for 1 day, the reaction mixture was subjected to silica gel chromatography to obtain 250 mg of the present bipyridine compound 164 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.88 (1H, d), 8.46 (1H, d), 7.57 (1H, dd), 7.34 (1H, d), 7.28 (1H, d), 4.52 (2H, t ), 4.00 (3H, s), 3.62 (2H, q), 1.34 (3H, t).
340mgの本ビピリジン化合物159、400mgの炭酸セシウム、及びDMF3mLの混合物に、室温で0.98mLのヨードメタンを加えた。室温で1日撹拌した後、この反応混合物をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物164を250mg得た。
To a mixture of 340 mg of the present bipyridine compound 159, 400 mg cesium carbonate, and 3 mL DMF, 0.98 mL iodomethane was added at room temperature. After stirring at room temperature for 1 day, the reaction mixture was subjected to silica gel chromatography to obtain 250 mg of the present bipyridine compound 164 represented by the following formula.
製造例24-1
30gの2-シアノ-5-フルオロピリジン、54gの2,2,3,3-テトラフロオロ-1-プロパノール、及びNMP90mLの混合物に、氷冷下130gの炭酸セシウムを加えた後室温に昇温し、室温で1.5時間撹拌した。得られた混合物を60℃に昇温して、60℃で更に5時間撹拌した後、この反応混合物に水を加え、MTBEで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をイソプロパノール/ヘキサン溶媒で再結晶し、次式で示される中間体11を47g得た。
1H-NMR (CDCl3) δ: 8.45 (1H, d), 7.71 (1H, dd), 7.33 (1H, dd), 6.04 (1H, tt), 4.49 (2H, t).
Production Example 24-1
To a mixture of 30 g of 2-cyano-5-fluoropyridine, 54 g of 2,2,3,3-tetrafluoro-1-propanol, and 90 mL of NMP, 130 g of cesium carbonate was added under ice cooling, and the temperature was raised to room temperature. Stir at room temperature for 1.5 hours. The resulting mixture was heated to 60 ° C. and further stirred at 60 ° C. for 5 hours, and then water was added to the reaction mixture, followed by extraction with MTBE. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was recrystallized with an isopropanol / hexane solvent to obtain 47 g of an intermediate 11 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.45 (1H, d), 7.71 (1H, dd), 7.33 (1H, dd), 6.04 (1H, tt), 4.49 (2H, t).
30gの2-シアノ-5-フルオロピリジン、54gの2,2,3,3-テトラフロオロ-1-プロパノール、及びNMP90mLの混合物に、氷冷下130gの炭酸セシウムを加えた後室温に昇温し、室温で1.5時間撹拌した。得られた混合物を60℃に昇温して、60℃で更に5時間撹拌した後、この反応混合物に水を加え、MTBEで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をイソプロパノール/ヘキサン溶媒で再結晶し、次式で示される中間体11を47g得た。
To a mixture of 30 g of 2-cyano-5-fluoropyridine, 54 g of 2,2,3,3-tetrafluoro-1-propanol, and 90 mL of NMP, 130 g of cesium carbonate was added under ice cooling, and the temperature was raised to room temperature. Stir at room temperature for 1.5 hours. The resulting mixture was heated to 60 ° C. and further stirred at 60 ° C. for 5 hours, and then water was added to the reaction mixture, followed by extraction with MTBE. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was recrystallized with an isopropanol / hexane solvent to obtain 47 g of an intermediate 11 represented by the following formula.
製造例24-2
11gのエチルメチルスルホン、及びTHF50mLの混合物に、氷冷下59mLの1.6Mn-ブチルリチウム ヘキサン溶液を加え、氷冷下で15分間撹拌した。この混合物を、氷冷下で、20gの中間体11とTHF50mLとの混合物に加え、氷冷下で10分間撹拌した。この混合物を水に加え、酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。残渣を酢酸エチル/ヘキサン溶媒で再結晶し、次式で示される中間体12を18g得た。
1H-NMR (CDCl3) δ: 8.36 (1H, d), 7.69 (1H, d), 7.33 (1H, dd), 6.79 (2H, s), 6.05 (1H, tt), 5.28 (1H, s), 4.48 (2H, t), 3.10 (2H, q), 1.40 (3H, t).
Production Example 24-2
To a mixture of 11 g of ethyl methyl sulfone and 50 mL of THF, 59 mL of 1.6 Mn-butyllithium hexane solution was added under ice cooling and stirred for 15 minutes under ice cooling. This mixture was added to a mixture of 20 g of intermediate 11 and 50 mL of THF under ice cooling, and stirred for 10 minutes under ice cooling. This mixture was added to water and extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The residue was recrystallized with an ethyl acetate / hexane solvent to obtain 18 g of intermediate 12 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.36 (1H, d), 7.69 (1H, d), 7.33 (1H, dd), 6.79 (2H, s), 6.05 (1H, tt), 5.28 (1H, s ), 4.48 (2H, t), 3.10 (2H, q), 1.40 (3H, t).
11gのエチルメチルスルホン、及びTHF50mLの混合物に、氷冷下59mLの1.6Mn-ブチルリチウム ヘキサン溶液を加え、氷冷下で15分間撹拌した。この混合物を、氷冷下で、20gの中間体11とTHF50mLとの混合物に加え、氷冷下で10分間撹拌した。この混合物を水に加え、酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。残渣を酢酸エチル/ヘキサン溶媒で再結晶し、次式で示される中間体12を18g得た。
To a mixture of 11 g of ethyl methyl sulfone and 50 mL of THF, 59 mL of 1.6 Mn-butyllithium hexane solution was added under ice cooling and stirred for 15 minutes under ice cooling. This mixture was added to a mixture of 20 g of intermediate 11 and 50 mL of THF under ice cooling, and stirred for 10 minutes under ice cooling. This mixture was added to water and extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The residue was recrystallized with an ethyl acetate / hexane solvent to obtain 18 g of intermediate 12 represented by the following formula.
製造例24-3
200mgの中間体12と4-エトキシ-1,1,1-トリフルオロ-3-ブテン-2-オン2mLとの混合物を100℃で4.5時間加熱撹拌した。この混合物をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物53を100mg得た。
1H-NMR (CDCl3) δ: 8.69 (1H, d), 8.37 (1H, d), 7.99 (1H, d), 7.89 (1H, d), 7.43 (1H, dd), 6.08 (1H, tt), 4.49 (2H, t), 4.01 (2H, q), 1.41 (3H, t).
Production Example 24-3
A mixture of 200 mg of intermediate 12 and 2-mL of 4-ethoxy-1,1,1-trifluoro-3-buten-2-one was heated and stirred at 100 ° C. for 4.5 hours. This mixture was subjected to silica gel column chromatography to obtain 100 mg of the present bipyridine compound 53 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.69 (1H, d), 8.37 (1H, d), 7.99 (1H, d), 7.89 (1H, d), 7.43 (1H, dd), 6.08 (1H, tt ), 4.49 (2H, t), 4.01 (2H, q), 1.41 (3H, t).
200mgの中間体12と4-エトキシ-1,1,1-トリフルオロ-3-ブテン-2-オン2mLとの混合物を100℃で4.5時間加熱撹拌した。この混合物をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物53を100mg得た。
A mixture of 200 mg of intermediate 12 and 2-mL of 4-ethoxy-1,1,1-trifluoro-3-buten-2-one was heated and stirred at 100 ° C. for 4.5 hours. This mixture was subjected to silica gel column chromatography to obtain 100 mg of the present bipyridine compound 53 represented by the following formula.
製造例25-1
2,2,3,3-テトラフルオロ-1-プロパノールに代えて、2,2,3,3,3-ペンタフルオロプロパノールを用い、製造例24-1に記載の方法に準じて次式で示される中間体13を得た。
1H-NMR (CDCl3) δ: 8.46 (1H, d), 7.73-7.71 (1H, m), 7.35 (1H, dd), 4.56 (2H, td).
Production Example 25-1
In place of 2,2,3,3-tetrafluoro-1-propanol, 2,2,3,3,3-pentafluoropropanol is used, and is represented by the following formula according to the method described in Production Example 24-1. Intermediate 13 was obtained.
1 H-NMR (CDCl 3 ) δ: 8.46 (1H, d), 7.73-7.71 (1H, m), 7.35 (1H, dd), 4.56 (2H, td).
2,2,3,3-テトラフルオロ-1-プロパノールに代えて、2,2,3,3,3-ペンタフルオロプロパノールを用い、製造例24-1に記載の方法に準じて次式で示される中間体13を得た。
In place of 2,2,3,3-tetrafluoro-1-propanol, 2,2,3,3,3-pentafluoropropanol is used, and is represented by the following formula according to the method described in Production Example 24-1. Intermediate 13 was obtained.
製造例25-2
中間体11に代えて、中間体13を用い、製造例24-2に記載の方法に準じて次式で示される中間体14を得た。
1H-NMR (CDCl3) δ: 8.37 (1H, d), 7.69 (1H, d), 7.34 (1H, dd), 6.79 (2H, s), 5.28 (1H, s), 4.54 (2H, t), 3.10 (2H, q), 1.40 (3H, t).
Production Example 25-2
Intermediate 14 represented by the following formula was obtained according to the method described in Production Example 24-2, using Intermediate 13 instead of Intermediate 11.
1 H-NMR (CDCl 3 ) δ: 8.37 (1H, d), 7.69 (1H, d), 7.34 (1H, dd), 6.79 (2H, s), 5.28 (1H, s), 4.54 (2H, t ), 3.10 (2H, q), 1.40 (3H, t).
中間体11に代えて、中間体13を用い、製造例24-2に記載の方法に準じて次式で示される中間体14を得た。
Intermediate 14 represented by the following formula was obtained according to the method described in Production Example 24-2, using Intermediate 13 instead of Intermediate 11.
製造例25-3
中間体12に代えて中間体14を用い、製造例24-3に記載の方法に準じて次式で示される本ビピリジン化合物54を得た。
1H-NMR (CDCl3) δ: 8.69 (1H, dd), 8.39 (1H, d), 7.99 (1H, dd), 7.89 (1H, d), 7.44 (1H, dd), 4.55 (2H, td), 4.01 (2H, q), 1.41 (3H, t).
Production Example 25-3
This bipyridine compound 54 represented by the following formula was obtained according to the method described in Production Example 24-3, using Intermediate 14 instead of Intermediate 12.
1 H-NMR (CDCl 3 ) δ: 8.69 (1H, dd), 8.39 (1H, d), 7.99 (1H, dd), 7.89 (1H, d), 7.44 (1H, dd), 4.55 (2H, td ), 4.01 (2H, q), 1.41 (3H, t).
中間体12に代えて中間体14を用い、製造例24-3に記載の方法に準じて次式で示される本ビピリジン化合物54を得た。
This bipyridine compound 54 represented by the following formula was obtained according to the method described in Production Example 24-3, using Intermediate 14 instead of Intermediate 12.
製造例26
3.0gの中間体14、830μLのアクロレイン、及びエタノール10mLの混合物を60℃で2時間撹拌した。この混合物を減圧下濃縮し、3.8gの残渣を得た。この残渣のうち、500mgをTHF2mLに混合し、室温で620μLのトリエチルアミン及び220μLのメタンスルホニルクロリドを加えた。この混合物を60℃で1時間加熱撹拌した。得られた混合物に2N塩酸を加え、酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物99を47mg得た。
1H-NMR (CDCl3) δ: 8.69 (1H, d), 8.36 (1H, d), 8.30 (1H, d), 7.84 (1H, d), 7.42 (1H, dd), 6.04-5.93 (1H, m), 5.23-5.18 (2H, m), 4.54 (2H, t), 3.87 (2H, q), 3.55 (2H, d), 1.37 (3H, t).
Production Example 26
A mixture of 3.0 g of intermediate 14, 830 μL of acrolein, and 10 mL of ethanol was stirred at 60 ° C. for 2 hours. The mixture was concentrated under reduced pressure to obtain 3.8 g of residue. Of this residue, 500 mg was mixed with 2 mL of THF, and 620 μL of triethylamine and 220 μL of methanesulfonyl chloride were added at room temperature. This mixture was heated and stirred at 60 ° C. for 1 hour. 2N hydrochloric acid was added to the resulting mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 47 mg of the present bipyridine compound 99 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.69 (1H, d), 8.36 (1H, d), 8.30 (1H, d), 7.84 (1H, d), 7.42 (1H, dd), 6.04-5.93 (1H , m), 5.23-5.18 (2H, m), 4.54 (2H, t), 3.87 (2H, q), 3.55 (2H, d), 1.37 (3H, t).
3.0gの中間体14、830μLのアクロレイン、及びエタノール10mLの混合物を60℃で2時間撹拌した。この混合物を減圧下濃縮し、3.8gの残渣を得た。この残渣のうち、500mgをTHF2mLに混合し、室温で620μLのトリエチルアミン及び220μLのメタンスルホニルクロリドを加えた。この混合物を60℃で1時間加熱撹拌した。得られた混合物に2N塩酸を加え、酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物99を47mg得た。
A mixture of 3.0 g of intermediate 14, 830 μL of acrolein, and 10 mL of ethanol was stirred at 60 ° C. for 2 hours. The mixture was concentrated under reduced pressure to obtain 3.8 g of residue. Of this residue, 500 mg was mixed with 2 mL of THF, and 620 μL of triethylamine and 220 μL of methanesulfonyl chloride were added at room temperature. This mixture was heated and stirred at 60 ° C. for 1 hour. 2N hydrochloric acid was added to the resulting mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 47 mg of the present bipyridine compound 99 represented by the following formula.
製造例27
8.5gの中間体14及びクロロホルム30mLの混合物に、氷冷下9.4gのα-(トリフルオロメチル)アクリロイルクロリドを加え、室温で30分間撹拌した。この混合物にヘキサンを加えた後、ろ過した。ろ物を飽和重曹水に加え、酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。残渣を酢酸エチル/ヘキサン溶液で再結晶し、次式で示される中間体15を21g得た。
1H-NMR (CDCl3) δ: 8.36 (1H, d), 7.81-7.78 (2H, m), 7.33 (1H, dd), 4.52 (2H, t), 3.49-3.31 (2H, m), 3.11-3.02 (3H, m), 1.29 (3H, t).
Production Example 27
To a mixture of 8.5 g of intermediate 14 and 30 mL of chloroform, 9.4 g of α- (trifluoromethyl) acryloyl chloride was added under ice cooling, and the mixture was stirred at room temperature for 30 minutes. Hexane was added to the mixture and then filtered. The filtrate was added to saturated aqueous sodium hydrogen carbonate and extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The residue was recrystallized with an ethyl acetate / hexane solution to obtain 21 g of intermediate 15 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.36 (1H, d), 7.81-7.78 (2H, m), 7.33 (1H, dd), 4.52 (2H, t), 3.49-3.31 (2H, m), 3.11 -3.02 (3H, m), 1.29 (3H, t).
8.5gの中間体14及びクロロホルム30mLの混合物に、氷冷下9.4gのα-(トリフルオロメチル)アクリロイルクロリドを加え、室温で30分間撹拌した。この混合物にヘキサンを加えた後、ろ過した。ろ物を飽和重曹水に加え、酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。残渣を酢酸エチル/ヘキサン溶液で再結晶し、次式で示される中間体15を21g得た。
To a mixture of 8.5 g of intermediate 14 and 30 mL of chloroform, 9.4 g of α- (trifluoromethyl) acryloyl chloride was added under ice cooling, and the mixture was stirred at room temperature for 30 minutes. Hexane was added to the mixture and then filtered. The filtrate was added to saturated aqueous sodium hydrogen carbonate and extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The residue was recrystallized with an ethyl acetate / hexane solution to obtain 21 g of intermediate 15 represented by the following formula.
製造例28
10gの中間体15及びクロロホルム30mLの混合物に、室温で4.4gのN-ブロモスクシンイミドと10mgの過酸化ベンゾイルを加え、60℃で30分間加熱撹拌した。この混合物を室温まで放冷した後、ナトリウムメトキシドを発熱が収まるまで加えた。この混合物に水を加え、酢酸エチルで抽出し、得られた有機層を硫酸ナトリウムで乾燥した後に、減圧下濃縮することにより、次式で示される本ビピリジン化合物114を14g得た。
1H-NMR (CDCl3) δ: 8.45 (1H, d), 8.41 (1H, s), 7.92 (1H, d), 7.41 (1H, dd), 4.57 (2H, t), 3.45 (2H, q), 1.33 (3H, t).
Production Example 28
To a mixture of 10 g of the intermediate 15 and 30 mL of chloroform, 4.4 g of N-bromosuccinimide and 10 mg of benzoyl peroxide were added at room temperature, and the mixture was heated and stirred at 60 ° C. for 30 minutes. The mixture was allowed to cool to room temperature and sodium methoxide was added until the exotherm subsided. Water was added to this mixture and extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and then concentrated under reduced pressure to obtain 14 g of the bipyridine compound 114 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.45 (1H, d), 8.41 (1H, s), 7.92 (1H, d), 7.41 (1H, dd), 4.57 (2H, t), 3.45 (2H, q ), 1.33 (3H, t).
10gの中間体15及びクロロホルム30mLの混合物に、室温で4.4gのN-ブロモスクシンイミドと10mgの過酸化ベンゾイルを加え、60℃で30分間加熱撹拌した。この混合物を室温まで放冷した後、ナトリウムメトキシドを発熱が収まるまで加えた。この混合物に水を加え、酢酸エチルで抽出し、得られた有機層を硫酸ナトリウムで乾燥した後に、減圧下濃縮することにより、次式で示される本ビピリジン化合物114を14g得た。
To a mixture of 10 g of the intermediate 15 and 30 mL of chloroform, 4.4 g of N-bromosuccinimide and 10 mg of benzoyl peroxide were added at room temperature, and the mixture was heated and stirred at 60 ° C. for 30 minutes. The mixture was allowed to cool to room temperature and sodium methoxide was added until the exotherm subsided. Water was added to this mixture and extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and then concentrated under reduced pressure to obtain 14 g of the bipyridine compound 114 represented by the following formula.
製造例29
4.4gの本ビピリジン化合物114に23gのオキシ塩化リンを加え、加熱還流下2日間撹拌した。この混合物を減圧下濃縮し、残渣に飽和重曹水を加え、酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物109を2.7g得た。
1H-NMR (CDCl3) δ: 8.75 (1H, s), 8.40 (1H, d), 8.03 (1H, d), 7.44 (1H, dd), 4.56 (2H, t), 4.01 (2H, q), 1.43 (3H, t).
Production Example 29
23 g of phosphorus oxychloride was added to 4.4 g of the present bipyridine compound 114, and the mixture was stirred for 2 days while heating under reflux. The mixture was concentrated under reduced pressure, saturated aqueous sodium hydrogen carbonate was added to the residue, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 2.7 g of the present bipyridine compound 109 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.75 (1H, s), 8.40 (1H, d), 8.03 (1H, d), 7.44 (1H, dd), 4.56 (2H, t), 4.01 (2H, q ), 1.43 (3H, t).
4.4gの本ビピリジン化合物114に23gのオキシ塩化リンを加え、加熱還流下2日間撹拌した。この混合物を減圧下濃縮し、残渣に飽和重曹水を加え、酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物109を2.7g得た。
23 g of phosphorus oxychloride was added to 4.4 g of the present bipyridine compound 114, and the mixture was stirred for 2 days while heating under reflux. The mixture was concentrated under reduced pressure, saturated aqueous sodium hydrogen carbonate was added to the residue, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 2.7 g of the present bipyridine compound 109 represented by the following formula.
製造例30
500mgの本ビピリジン化合物109、46mgの1H-1,2,4-トリアゾール、及びDMSO2mLの混合物に、室温で240mgの炭酸セシウムを加え、30分間撹拌した。この混合物に水を加えて酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物154を240mg得た。
1H-NMR (CDCl3) δ: 9.02 (1H, s), 8.99 (1H, s), 8.44 (1H, d), 8.23 (1H, s), 8.01 (1H, d), 7.47 (1H, dd), 4.58 (2H, t), 4.05 (2H, q), 1.47 (3H, t).
Production Example 30
To a mixture of 500 mg of the present bipyridine compound 109, 46 mg of 1H-1,2,4-triazole, and 2 mL of DMSO, 240 mg of cesium carbonate was added at room temperature and stirred for 30 minutes. Water was added to the mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 240 mg of the present bipyridine compound 154 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 9.02 (1H, s), 8.99 (1H, s), 8.44 (1H, d), 8.23 (1H, s), 8.01 (1H, d), 7.47 (1H, dd ), 4.58 (2H, t), 4.05 (2H, q), 1.47 (3H, t).
500mgの本ビピリジン化合物109、46mgの1H-1,2,4-トリアゾール、及びDMSO2mLの混合物に、室温で240mgの炭酸セシウムを加え、30分間撹拌した。この混合物に水を加えて酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物154を240mg得た。
To a mixture of 500 mg of the present bipyridine compound 109, 46 mg of 1H-1,2,4-triazole, and 2 mL of DMSO, 240 mg of cesium carbonate was added at room temperature and stirred for 30 minutes. Water was added to the mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 240 mg of the present bipyridine compound 154 represented by the following formula.
製造例31
本ビピリジン化合物79に代えて本ビピリジン化合物109を用い、製造例17に記載の方法に準じて行い、次式で示される本ビピリジン化合物124を得た。
1H-NMR (CDCl3) δ: 8.44 (1H, s), 8.35 (1H, s), 7.78 (1H, d), 7.39 (1H, d), 5.52 (2H, s), 4.53 (2H, t), 3.79 (2H, q), 1.37 (3H, t).
Production Example 31
This bipyridine compound 109 was used in place of the present bipyridine compound 79, and was carried out according to the method described in Preparation Example 17 to obtain the present bipyridine compound 124 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.44 (1H, s), 8.35 (1H, s), 7.78 (1H, d), 7.39 (1H, d), 5.52 (2H, s), 4.53 (2H, t ), 3.79 (2H, q), 1.37 (3H, t).
本ビピリジン化合物79に代えて本ビピリジン化合物109を用い、製造例17に記載の方法に準じて行い、次式で示される本ビピリジン化合物124を得た。
This bipyridine compound 109 was used in place of the present bipyridine compound 79, and was carried out according to the method described in Preparation Example 17 to obtain the present bipyridine compound 124 represented by the following formula.
製造例32
本ビピリジン化合物79に代えて本ビピリジン化合物109を用い、50%ジメチルアミン水溶液に代えて、40%メチルアミン-メタノール溶液を用い、製造例18に記載の方法に準じて、次式で示される本ビピリジン化合物129を得た。
1H-NMR (CDCl3) δ: 8.35-8.35 (2H, m), 7.86 (1H, dd), 7.40 (1H, dd), 5.48 (1H, s), 4.54 (2H, td), 3.83 (2H, q), 3.15 (3H, d), 1.37 (3H, t).
Production Example 32
This bipyridine compound 109 is used instead of this bipyridine compound 79, 40% methylamine-methanol solution is used instead of the 50% dimethylamine aqueous solution, and the compound represented by the following formula is prepared according to the method described in Production Example 18. Bipyridine compound 129 was obtained.
1 H-NMR (CDCl 3 ) δ: 8.35-8.35 (2H, m), 7.86 (1H, dd), 7.40 (1H, dd), 5.48 (1H, s), 4.54 (2H, td), 3.83 (2H , q), 3.15 (3H, d), 1.37 (3H, t).
本ビピリジン化合物79に代えて本ビピリジン化合物109を用い、50%ジメチルアミン水溶液に代えて、40%メチルアミン-メタノール溶液を用い、製造例18に記載の方法に準じて、次式で示される本ビピリジン化合物129を得た。
This bipyridine compound 109 is used instead of this bipyridine compound 79, 40% methylamine-methanol solution is used instead of the 50% dimethylamine aqueous solution, and the compound represented by the following formula is prepared according to the method described in Production Example 18. Bipyridine compound 129 was obtained.
製造例33
本ビピリジン化合物79に代えて本ビピリジン化合物109を用い、製造例19に記載の方法に準じて行い、次式で示される本ビピリジン化合物139を得た。
1H-NMR (CDCl3) δ: 8.47 (1H, d), 8.36 (1H, d), 7.81 (1H, d), 7.42 (1H, dd), 5.62 (1H, s), 4.55 (2H, t), 4.42-4.33 (2H, m), 3.89 (2H, q), 1.39 (3H, t).
Production Example 33
This bipyridine compound 109 was used in place of the present bipyridine compound 79, and was carried out according to the method described in Preparation Example 19 to obtain the present bipyridine compound 139 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.47 (1H, d), 8.36 (1H, d), 7.81 (1H, d), 7.42 (1H, dd), 5.62 (1H, s), 4.55 (2H, t ), 4.42-4.33 (2H, m), 3.89 (2H, q), 1.39 (3H, t).
本ビピリジン化合物79に代えて本ビピリジン化合物109を用い、製造例19に記載の方法に準じて行い、次式で示される本ビピリジン化合物139を得た。
This bipyridine compound 109 was used in place of the present bipyridine compound 79, and was carried out according to the method described in Preparation Example 19 to obtain the present bipyridine compound 139 represented by the following formula.
製造例34
1.0gの本ビピリジン化合物109、820μLのジイソプロピルエチルアミン、及びTHF5mLの混合物に、室温で160μLのヒドラジン1水和物を加え、室温で1時間撹拌した。この混合物に水を加えて酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物144を620mg得た。
1H-NMR (CDCl3) δ: 8.40 (1H, d), 8.37 (1H, d), 7.82 (1H, d), 7.41 (1H, dd), 6.74 (1H, s), 4.55 (2H, t), 4.19 (2H, d), 3.80 (2H, q), 1.37 (3H, t).
Production Example 34
To a mixture of 1.0 g of the present bipyridine compound 109, 820 μL of diisopropylethylamine, and 5 mL of THF, 160 μL of hydrazine monohydrate was added at room temperature, and the mixture was stirred at room temperature for 1 hour. Water was added to the mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 620 mg of the present bipyridine compound 144 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.40 (1H, d), 8.37 (1H, d), 7.82 (1H, d), 7.41 (1H, dd), 6.74 (1H, s), 4.55 (2H, t ), 4.19 (2H, d), 3.80 (2H, q), 1.37 (3H, t).
1.0gの本ビピリジン化合物109、820μLのジイソプロピルエチルアミン、及びTHF5mLの混合物に、室温で160μLのヒドラジン1水和物を加え、室温で1時間撹拌した。この混合物に水を加えて酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物144を620mg得た。
To a mixture of 1.0 g of the present bipyridine compound 109, 820 μL of diisopropylethylamine, and 5 mL of THF, 160 μL of hydrazine monohydrate was added at room temperature, and the mixture was stirred at room temperature for 1 hour. Water was added to the mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 620 mg of the present bipyridine compound 144 represented by the following formula.
製造例35
550mgの本ビピリジン化合物144、110μLのピリジン、及びアセトニトリル10mLの混合物に、室温で250mgのp-トルエンスルホニルクロリドを加え、室温で1時間撹拌した。この混合物に水を加えて酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物149を730mg得た。
1H-NMR (CDCl3) δ: 8.40 (1H, d), 8.36 (1H, d), 7.71 (1H, d), 7.65 (2H, d), 7.50 (1H, t), 7.41 (1H, dd), 7.34 (1H, d), 7.00 (2H, d), 4.58 (2H, t), 3.81 (2H, q), 2.29 (3H, s), 1.33 (3H, t).
Production Example 35
To a mixture of 550 mg of the present bipyridine compound 144, 110 μL of pyridine, and 10 mL of acetonitrile, 250 mg of p-toluenesulfonyl chloride was added at room temperature, and the mixture was stirred at room temperature for 1 hour. Water was added to the mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 730 mg of the present bipyridine compound 149 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.40 (1H, d), 8.36 (1H, d), 7.71 (1H, d), 7.65 (2H, d), 7.50 (1H, t), 7.41 (1H, dd ), 7.34 (1H, d), 7.00 (2H, d), 4.58 (2H, t), 3.81 (2H, q), 2.29 (3H, s), 1.33 (3H, t).
550mgの本ビピリジン化合物144、110μLのピリジン、及びアセトニトリル10mLの混合物に、室温で250mgのp-トルエンスルホニルクロリドを加え、室温で1時間撹拌した。この混合物に水を加えて酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物149を730mg得た。
To a mixture of 550 mg of the present bipyridine compound 144, 110 μL of pyridine, and 10 mL of acetonitrile, 250 mg of p-toluenesulfonyl chloride was added at room temperature, and the mixture was stirred at room temperature for 1 hour. Water was added to the mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 730 mg of the present bipyridine compound 149 represented by the following formula.
製造例36
630mgの本ビピリジン化合物149、水1mL、及びエチレングリコール2mLの混合物に、室温で78mgの水酸化ナトリウムを加え、90℃で1時間撹拌した。この混合物に水を加えて酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物39を350mg得た。
1H-NMR (CDCl3) δ: 9.10 (1H, s), 8.73 (1H, s), 8.40 (1H, d), 7.97 (1H, d), 7.46-7.44 (1H, m), 4.56 (2H, t), 3.99 (2H, q), 1.42 (3H, t).
Production Example 36
To a mixture of 630 mg of the present bipyridine compound 149, 1 mL of water, and 2 mL of ethylene glycol, 78 mg of sodium hydroxide was added at room temperature, and the mixture was stirred at 90 ° C. for 1 hour. Water was added to the mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 350 mg of the present bipyridine compound 39 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 9.10 (1H, s), 8.73 (1H, s), 8.40 (1H, d), 7.97 (1H, d), 7.46-7.44 (1H, m), 4.56 (2H , t), 3.99 (2H, q), 1.42 (3H, t).
630mgの本ビピリジン化合物149、水1mL、及びエチレングリコール2mLの混合物に、室温で78mgの水酸化ナトリウムを加え、90℃で1時間撹拌した。この混合物に水を加えて酢酸エチルで抽出した。得られた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィに付し、次式で示される本ビピリジン化合物39を350mg得た。
To a mixture of 630 mg of the present bipyridine compound 149, 1 mL of water, and 2 mL of ethylene glycol, 78 mg of sodium hydroxide was added at room temperature, and the mixture was stirred at 90 ° C. for 1 hour. Water was added to the mixture, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 350 mg of the present bipyridine compound 39 represented by the following formula.
製造例37
本ビピリジン化合物79に代えて本ビピリジン化合物109を用い、製造例14に記載の方法に準じて行い、次式で示される本ビピリジン化合物119を得た。
1H-NMR (CDCl3) δ: 8.59 (1H, d), 8.38 (1H, t), 7.90 (1H, dd), 7.42 (1H, dd), 4.55 (2H, t), 4.16 (3H, s), 3.91 (2H, q), 1.40 (3H, t).
Production Example 37
This bipyridine compound 109 was used in place of this bipyridine compound 79, and was carried out according to the method described in Preparation Example 14 to obtain the present bipyridine compound 119 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.59 (1H, d), 8.38 (1H, t), 7.90 (1H, dd), 7.42 (1H, dd), 4.55 (2H, t), 4.16 (3H, s ), 3.91 (2H, q), 1.40 (3H, t).
本ビピリジン化合物79に代えて本ビピリジン化合物109を用い、製造例14に記載の方法に準じて行い、次式で示される本ビピリジン化合物119を得た。
This bipyridine compound 109 was used in place of this bipyridine compound 79, and was carried out according to the method described in Preparation Example 14 to obtain the present bipyridine compound 119 represented by the following formula.
製造例38-1
3.4gの中間体10、及びNMP36mLの混合物に、室温にて硫化水素ナトリウムn水和物(和光純薬製)5.0gを加えた。この反応混合物を、80℃で12時間加熱撹拌した。得られた反応混合物を室温まで放冷後、水を加え、さらに2N塩酸を加えてpH4に調整した。得られた混合物を酢酸エチルで抽出し、無水硫酸ナトリウムで乾燥し、濃縮した。得られた溶液を、室温にて空気雰囲気下で12時間撹拌した。得られた溶液をシリカゲルクロマトグラフィーに付し、痕跡量の次式で示される中間体20、及び2.5gの次式で示される中間体21を得た。
中間体20
LC-MS:M+H:337
中間体21
1H-NMR (DMSO-D6) δ: 8.57 (2H, d), 8.52 (2H, dd), 8.32 (2H, d), 8.05 (2H, dd), 7.78 (2H, dd), 7.41 (2H, dd), 5.06 (4H, t).
LC-MS:M+H:671 Production Example 38-1
To a mixture of 3.4 g of the intermediate 10 and NMP 36 mL, 5.0 g of sodium hydrogen sulfide n hydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was added at room temperature. The reaction mixture was heated and stirred at 80 ° C. for 12 hours. The resulting reaction mixture was allowed to cool to room temperature, water was added, and 2N hydrochloric acid was further added to adjust to pH 4. The resulting mixture was extracted with ethyl acetate, dried over anhydrous sodium sulfate and concentrated. The resulting solution was stirred at room temperature under an air atmosphere for 12 hours. The obtained solution was subjected to silica gel chromatography to obtain a trace amount of intermediate 20 represented by the following formula and 2.5 g of intermediate 21 represented by the following formula.
Intermediate 20
LC-MS: M + H: 337
Intermediate 21
1 H-NMR (DMSO-D 6 ) δ: 8.57 (2H, d), 8.52 (2H, dd), 8.32 (2H, d), 8.05 (2H, dd), 7.78 (2H, dd), 7.41 (2H , dd), 5.06 (4H, t).
LC-MS: M + H: 671
3.4gの中間体10、及びNMP36mLの混合物に、室温にて硫化水素ナトリウムn水和物(和光純薬製)5.0gを加えた。この反応混合物を、80℃で12時間加熱撹拌した。得られた反応混合物を室温まで放冷後、水を加え、さらに2N塩酸を加えてpH4に調整した。得られた混合物を酢酸エチルで抽出し、無水硫酸ナトリウムで乾燥し、濃縮した。得られた溶液を、室温にて空気雰囲気下で12時間撹拌した。得られた溶液をシリカゲルクロマトグラフィーに付し、痕跡量の次式で示される中間体20、及び2.5gの次式で示される中間体21を得た。
中間体20
中間体21
LC-MS:M+H:671 Production Example 38-1
To a mixture of 3.4 g of the intermediate 10 and NMP 36 mL, 5.0 g of sodium hydrogen sulfide n hydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was added at room temperature. The reaction mixture was heated and stirred at 80 ° C. for 12 hours. The resulting reaction mixture was allowed to cool to room temperature, water was added, and 2N hydrochloric acid was further added to adjust to pH 4. The resulting mixture was extracted with ethyl acetate, dried over anhydrous sodium sulfate and concentrated. The resulting solution was stirred at room temperature under an air atmosphere for 12 hours. The obtained solution was subjected to silica gel chromatography to obtain a trace amount of intermediate 20 represented by the following formula and 2.5 g of intermediate 21 represented by the following formula.
Intermediate 20
Intermediate 21
LC-MS: M + H: 671
製造例38-2
200mgの中間体21、炭酸カリウム240mg、及びDMF1.2mLの混合物に、室温下にて(ブロモメチル)シクロプロパン190mg及びヒドロキシメタンスルフィン酸ナトリウム2水和物270mgを順次加えた。この反応混合物を80℃に昇温し、10時間加熱撹拌した。この反応混合物を室温まで放冷後、炭酸水素ナトリウム水溶液を加え、酢酸エチルで抽出した。得られた有機層を、飽和食塩水で洗浄後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物279を150mg得た。
1H-NMR (CDCl3) δ: 8.48 (1H, d), 8.43 (1H, dd), 8.02 (1H, dd), 7.71 (1H, dd), 7.41 (1H, dd), 7.24 (1H, dd), 4.55 (2H, td), 2.82 (2H, d), 1.07-0.97 (1H, m), 0.63-0.57 (2H, m), 0.31-0.26 (2H, m).
Production Example 38-2
To a mixture of 200 mg of Intermediate 21, 240 mg of potassium carbonate, and 1.2 mL of DMF, 190 mg of (bromomethyl) cyclopropane and 270 mg of sodium hydroxymethanesulfinate dihydrate were sequentially added at room temperature. The reaction mixture was heated to 80 ° C. and stirred for 10 hours. The reaction mixture was allowed to cool to room temperature, aqueous sodium hydrogen carbonate solution was added, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 150 mg of the present bipyridine compound 279 represented by the following formula.
1 H-NMR (CDCl 3 ) δ: 8.48 (1H, d), 8.43 (1H, dd), 8.02 (1H, dd), 7.71 (1H, dd), 7.41 (1H, dd), 7.24 (1H, dd ), 4.55 (2H, td), 2.82 (2H, d), 1.07-0.97 (1H, m), 0.63-0.57 (2H, m), 0.31-0.26 (2H, m).
200mgの中間体21、炭酸カリウム240mg、及びDMF1.2mLの混合物に、室温下にて(ブロモメチル)シクロプロパン190mg及びヒドロキシメタンスルフィン酸ナトリウム2水和物270mgを順次加えた。この反応混合物を80℃に昇温し、10時間加熱撹拌した。この反応混合物を室温まで放冷後、炭酸水素ナトリウム水溶液を加え、酢酸エチルで抽出した。得られた有機層を、飽和食塩水で洗浄後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、次式で示される本ビピリジン化合物279を150mg得た。
To a mixture of 200 mg of Intermediate 21, 240 mg of potassium carbonate, and 1.2 mL of DMF, 190 mg of (bromomethyl) cyclopropane and 270 mg of sodium hydroxymethanesulfinate dihydrate were sequentially added at room temperature. The reaction mixture was heated to 80 ° C. and stirred for 10 hours. The reaction mixture was allowed to cool to room temperature, aqueous sodium hydrogen carbonate solution was added, and the mixture was extracted with ethyl acetate. The obtained organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to obtain 150 mg of the present bipyridine compound 279 represented by the following formula.
製造例38-3
本ビピリジン化合物9に代えて本ビピリジン化合物279を用い、製造例2に記載の方法に準じて、次式で示される本ビピリジン化合物280を得た。
1H-NMR (CDCl3) δ: 8.86 (1H, dd), 8.56 (1H, dd), 8.34 (1H, d), 7.88 (1H, d), 7.54 (1H, dd), 7.42 (1H, dd), 4.54 (2H, td), 3.82 (2H, d), 1.20-1.08 (1H, m), 0.62-0.55 (2H, m), 0.37-0.31 (2H, m).
Production Example 38-3
The bipyridine compound 280 represented by the following formula was obtained according to the method described in Production Example 2 using the bipyridine compound 279 instead of the bipyridine compound 9.
1 H-NMR (CDCl 3 ) δ: 8.86 (1H, dd), 8.56 (1H, dd), 8.34 (1H, d), 7.88 (1H, d), 7.54 (1H, dd), 7.42 (1H, dd ), 4.54 (2H, td), 3.82 (2H, d), 1.20-1.08 (1H, m), 0.62-0.55 (2H, m), 0.37-0.31 (2H, m).
本ビピリジン化合物9に代えて本ビピリジン化合物279を用い、製造例2に記載の方法に準じて、次式で示される本ビピリジン化合物280を得た。
The bipyridine compound 280 represented by the following formula was obtained according to the method described in Production Example 2 using the bipyridine compound 279 instead of the bipyridine compound 9.
製造例39-1
5-フルオロ-2-シアノピリジンに代えて、5-クロロ-2-シアノピリジンを用い、製造例10-1に記載の方法に準じて、下記の中間体22を得た。
1H NMR(CDCl3)δ ppm: 1.47 (3H, t), 3.29 (2H, q), 4.96 (2H, s), 7.87 (1H, dd), 8.08 (1H, dd), 8.68 (1H, dd)
Production Example 39-1
The following intermediate 22 was obtained according to the method described in Production Example 10-1 using 5-chloro-2-cyanopyridine instead of 5-fluoro-2-cyanopyridine.
1 H NMR (CDCl 3 ) δ ppm: 1.47 (3H, t), 3.29 (2H, q), 4.96 (2H, s), 7.87 (1H, dd), 8.08 (1H, dd), 8.68 (1H, dd )
5-フルオロ-2-シアノピリジンに代えて、5-クロロ-2-シアノピリジンを用い、製造例10-1に記載の方法に準じて、下記の中間体22を得た。
The following intermediate 22 was obtained according to the method described in Production Example 10-1 using 5-chloro-2-cyanopyridine instead of 5-fluoro-2-cyanopyridine.
製造例39-2
中間体16に代えて、中間体22を用い、製造例10-2に記載の方法に準じて、下記の中間体23を得た。
1H NMR(CDCl3)δ ppm: 1.38 (3H, t), 3.87 (2H, q), 7.57 (1H, dd), 7.81 (1H, dd), 7.85 (1H, dd), 8.49 (1H, dd), 8.58 (1H, dd), 8.88 (1H, dd)
Production Example 39-2
The following intermediate 23 was obtained according to the method described in Production Example 10-2 using the intermediate 22 instead of the intermediate 16.
1 H NMR (CDCl 3 ) δ ppm: 1.38 (3H, t), 3.87 (2H, q), 7.57 (1H, dd), 7.81 (1H, dd), 7.85 (1H, dd), 8.49 (1H, dd ), 8.58 (1H, dd), 8.88 (1H, dd)
中間体16に代えて、中間体22を用い、製造例10-2に記載の方法に準じて、下記の中間体23を得た。
The following intermediate 23 was obtained according to the method described in Production Example 10-2 using the intermediate 22 instead of the intermediate 16.
製造例40-1
5-フルオロ-2-シアノピリジンに代えて、2-シアノ-5-ブロモピリジンを用い、製造例10-1に記載の方法に準じて、下記の中間体24を得た。
1H-NMR (CDCl3) δ: 8.79 (1H, d), 8.04-7.98 (2H, m), 4.97(2H, s), 3.28 (2H, q), 1.46 (3H, t).
Production Example 40-1
The following intermediate 24 was obtained according to the method described in Production Example 10-1 using 2-cyano-5-bromopyridine instead of 5-fluoro-2-cyanopyridine.
1 H-NMR (CDCl 3 ) δ: 8.79 (1H, d), 8.04-7.98 (2H, m), 4.97 (2H, s), 3.28 (2H, q), 1.46 (3H, t).
5-フルオロ-2-シアノピリジンに代えて、2-シアノ-5-ブロモピリジンを用い、製造例10-1に記載の方法に準じて、下記の中間体24を得た。
The following intermediate 24 was obtained according to the method described in Production Example 10-1 using 2-cyano-5-bromopyridine instead of 5-fluoro-2-cyanopyridine.
製造例40-2
中間体16に代えて、中間体24を用い、製造例10-2に記載の方法に準じて、下記の中間体25を得た。
1H-NMR (CDCl3) δ: 8.87 (1H, dd), 8.68 (1H, d), 8.49 (1H, dd), 8.01-7.98 (1H, m), 7.74 (1H, d), 7.56 (1H, dd), 3.86 (2H, q), 1.37 (3H, t).
Production Example 40-2
The following intermediate 25 was obtained according to the method described in Production Example 10-2 using the intermediate 24 instead of the intermediate 16.
1 H-NMR (CDCl 3 ) δ: 8.87 (1H, dd), 8.68 (1H, d), 8.49 (1H, dd), 8.01-7.98 (1H, m), 7.74 (1H, d), 7.56 (1H , dd), 3.86 (2H, q), 1.37 (3H, t).
中間体16に代えて、中間体24を用い、製造例10-2に記載の方法に準じて、下記の中間体25を得た。
The following intermediate 25 was obtained according to the method described in Production Example 10-2 using the intermediate 24 instead of the intermediate 16.
製造例41-1
5-フルオロ-2-シアノピリジンに代えて、2-シアノ-5-(2,2,3,3-テトラフルオロプロポキシ)ピリジンを用い、製造例10-1に記載の方法に準じて、下記の中間体25を得た。
1H-NMR (CDCl3) δ: 8.43 (1H, d), 8.16 (1H, d), 7.38 (1H, dd), 6.05 (1H, tt), 4.96 (2H, s), 4.52 (2H, t), 3.29 (2H, q), 1.47 (3H, t).
Production Example 41-1
In place of 5-fluoro-2-cyanopyridine, 2-cyano-5- (2,2,3,3-tetrafluoropropoxy) pyridine was used, and according to the method described in Production Example 10-1, the following Intermediate 25 was obtained.
1 H-NMR (CDCl 3 ) δ: 8.43 (1H, d), 8.16 (1H, d), 7.38 (1H, dd), 6.05 (1H, tt), 4.96 (2H, s), 4.52 (2H, t ), 3.29 (2H, q), 1.47 (3H, t).
5-フルオロ-2-シアノピリジンに代えて、2-シアノ-5-(2,2,3,3-テトラフルオロプロポキシ)ピリジンを用い、製造例10-1に記載の方法に準じて、下記の中間体25を得た。
In place of 5-fluoro-2-cyanopyridine, 2-cyano-5- (2,2,3,3-tetrafluoropropoxy) pyridine was used, and according to the method described in Production Example 10-1, the following Intermediate 25 was obtained.
製造例41-2
中間体16に代えて、中間体25を用い、製造例10-2に記載の方法に準じて、本ビピリジン化合物7を得た。 Production Example 41-2
This bipyridine compound 7 was obtained according to the method described in Production Example 10-2, using Intermediate 25 instead of Intermediate 16.
中間体16に代えて、中間体25を用い、製造例10-2に記載の方法に準じて、本ビピリジン化合物7を得た。 Production Example 41-2
This bipyridine compound 7 was obtained according to the method described in Production Example 10-2, using Intermediate 25 instead of Intermediate 16.
製造例42-1
5-フルオロ-2-シアノピリジンに代えて、2-シアノ-5-(2,2,3,3,3-ペンタフルオロプロポキシ)ピリジンを用い、製造例10-1に記載の方法に準じて、下記の中間体26を得た。
1H-NMR (CDCl3) δ: 8.44 (1H, t), 8.16 (1H, dd), 7.39 (1H, dd), 4.96 (2H, s), 4.58 (2H, td), 3.29 (2H, q), 1.47 (3H, t).
Production Example 42-1
In place of 5-fluoro-2-cyanopyridine, 2-cyano-5- (2,2,3,3,3-pentafluoropropoxy) pyridine was used and according to the method described in Production Example 10-1, The following intermediate 26 was obtained.
1 H-NMR (CDCl 3 ) δ: 8.44 (1H, t), 8.16 (1H, dd), 7.39 (1H, dd), 4.96 (2H, s), 4.58 (2H, td), 3.29 (2H, q ), 1.47 (3H, t).
5-フルオロ-2-シアノピリジンに代えて、2-シアノ-5-(2,2,3,3,3-ペンタフルオロプロポキシ)ピリジンを用い、製造例10-1に記載の方法に準じて、下記の中間体26を得た。
In place of 5-fluoro-2-cyanopyridine, 2-cyano-5- (2,2,3,3,3-pentafluoropropoxy) pyridine was used and according to the method described in Production Example 10-1, The following intermediate 26 was obtained.
製造例42-2
中間体16に代えて、中間体26を用い、製造例10-2に記載の方法に準じて、本ビピリジン化合物8を得た。 Production Example 42-2
The bipyridine compound 8 was obtained according to the method described in Production Example 10-2 using the intermediate 26 instead of the intermediate 16.
中間体16に代えて、中間体26を用い、製造例10-2に記載の方法に準じて、本ビピリジン化合物8を得た。 Production Example 42-2
The bipyridine compound 8 was obtained according to the method described in Production Example 10-2 using the intermediate 26 instead of the intermediate 16.
式(200)
〔式中、R201、R202、R203、R204、R205、R206、R207、R208、及びnは、下記の表20~表38に記載のいずれかの組み合わせを表す。〕で示される化合物は、前述の方法に準じて製造することができる。
Formula (200)
[Wherein, R 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 , R 208 , and n represent any combination shown in Tables 20 to 38 below. ] Can be manufactured according to the above-mentioned method.
式(201)
〔式中、R201、R202、R203、R204、R205、R206、R207、R208、及びnは、下記の表39に記載のいずれかの組み合わせを表す。〕で示される化合物は、前述の方法に準じて製造することができる。
Formula (201)
[Wherein R 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 , R 208 , and n represent any combination shown in Table 39 below. ] Can be manufactured according to the above-mentioned method.
式(202)
〔式中、R201、R202、R203、R204、R205、R206、R207、R208、及びnは、下記の表40に記載のいずれかの組み合わせを表す。〕で示される化合物は、前述の方法に準じて製造することができる。
Formula (202)
[Wherein, R 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 , R 208 , and n represent any combination shown in Table 40 below. ] Can be manufactured according to the above-mentioned method.
式(203)
〔式中、R201、R202、R203、R204、R205、R206、R207、R208、及びnは、下記の表41に記載のいずれかの組み合わせを表す。〕で示される化合物は、前述の方法に準じて製造することができる。
Formula (203)
[Wherein, R 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 , R 208 , and n represent any combination shown in Table 41 below. ] Can be manufactured according to the above-mentioned method.
以下に物性値を示す。
The physical property values are shown below.
次に、製剤例を示す。
Next, formulation examples are shown.
製剤例1
本ビピリジン化合物1~347のうち1種を5部、クロチアニジン10部、ホワイトカーボンとポリオキシエチレンアルキルエーテルサルフェートアンモニウム塩との混合物(重量割合1:1)35部並びに水を混合し全量を100部とし、湿式粉砕法で微粉砕することにより、各々の製剤を得る。 Formulation Example 1
5 parts of one of the bipyridine compounds 1 to 347, 10 parts of clothianidin, 35 parts of a mixture of white carbon and polyoxyethylene alkyl ether sulfate ammonium salt (weight ratio 1: 1) and 100 parts by mixing water Then, each preparation is obtained by fine pulverization by a wet pulverization method.
本ビピリジン化合物1~347のうち1種を5部、クロチアニジン10部、ホワイトカーボンとポリオキシエチレンアルキルエーテルサルフェートアンモニウム塩との混合物(重量割合1:1)35部並びに水を混合し全量を100部とし、湿式粉砕法で微粉砕することにより、各々の製剤を得る。 Formulation Example 1
5 parts of one of the bipyridine compounds 1 to 347, 10 parts of clothianidin, 35 parts of a mixture of white carbon and polyoxyethylene alkyl ether sulfate ammonium salt (weight ratio 1: 1) and 100 parts by mixing water Then, each preparation is obtained by fine pulverization by a wet pulverization method.
製剤例2
本ビピリジン化合物1~347のうち1種を10部、クロチアニジン10部、リグニンスルホン酸カルシウム3部、ラウリル硫酸ナトリウム2部、並びに合成含水酸化珪素75部をよく粉砕混合することにより、各々の水和剤を得る。 Formulation Example 2
By thoroughly pulverizing and mixing 10 parts of the present bipyridine compounds 1 to 347, 10 parts of clothianidin, 3 parts of calcium lignin sulfonate, 2 parts of sodium lauryl sulfate, and 75 parts of synthetic silicon hydroxide, Get the agent.
本ビピリジン化合物1~347のうち1種を10部、クロチアニジン10部、リグニンスルホン酸カルシウム3部、ラウリル硫酸ナトリウム2部、並びに合成含水酸化珪素75部をよく粉砕混合することにより、各々の水和剤を得る。 Formulation Example 2
By thoroughly pulverizing and mixing 10 parts of the present bipyridine compounds 1 to 347, 10 parts of clothianidin, 3 parts of calcium lignin sulfonate, 2 parts of sodium lauryl sulfate, and 75 parts of synthetic silicon hydroxide, Get the agent.
製剤例3
本ビピリジン化合物1~347のうち1種を1部、クロチアニジン0.5部、合成含水酸化珪素微粉末1部、リグニンスルホン酸カルシウム2部、ベントナイト30部及びカオリンクレー65.5部を加え混合する。ついで、この混合物に適当量の水を加え、さらに攪拌し、造粒機で製粒し、通風乾燥して各々の粒剤を得る。
製剤例4
本ビピリジン化合物1~347のうち1種を10部、クロチアニジン2部、ソルビタントリオレエート1.5部、並びにポリビニルアルコール2部を含む水溶液28部を混合し、湿式粉砕法で微粉砕した後、この中にキサンタンガム0.05部及びアルミニウムマグネシウムシリケート0.1部を含む水溶液を加え全量を90部とし、さらにプロピレングリコール10部を加えて攪拌混合し、各々の製剤を得る。 Formulation Example 3
1 part of the bipyridine compounds 1 to 347, 0.5 part of clothianidin, 1 part of synthetic hydrous silicon oxide fine powder, 2 parts of calcium lignin sulfonate, 30 parts of bentonite and 65.5 parts of kaolin clay are mixed. . Next, an appropriate amount of water is added to the mixture, and the mixture is further stirred, granulated by a granulator, and dried by ventilation to obtain each granule.
Formulation Example 4
One part of the present bipyridine compounds 1 to 347, 10 parts of clothianidin, 2 parts of sorbitan trioleate, and 28 parts of an aqueous solution containing 2 parts of polyvinyl alcohol were mixed and pulverized by a wet pulverization method. An aqueous solution containing 0.05 part of xanthan gum and 0.1 part of aluminum magnesium silicate is added to make the total amount 90 parts, and further 10 parts of propylene glycol is added and stirred and mixed to obtain each preparation.
本ビピリジン化合物1~347のうち1種を1部、クロチアニジン0.5部、合成含水酸化珪素微粉末1部、リグニンスルホン酸カルシウム2部、ベントナイト30部及びカオリンクレー65.5部を加え混合する。ついで、この混合物に適当量の水を加え、さらに攪拌し、造粒機で製粒し、通風乾燥して各々の粒剤を得る。
製剤例4
本ビピリジン化合物1~347のうち1種を10部、クロチアニジン2部、ソルビタントリオレエート1.5部、並びにポリビニルアルコール2部を含む水溶液28部を混合し、湿式粉砕法で微粉砕した後、この中にキサンタンガム0.05部及びアルミニウムマグネシウムシリケート0.1部を含む水溶液を加え全量を90部とし、さらにプロピレングリコール10部を加えて攪拌混合し、各々の製剤を得る。 Formulation Example 3
1 part of the bipyridine compounds 1 to 347, 0.5 part of clothianidin, 1 part of synthetic hydrous silicon oxide fine powder, 2 parts of calcium lignin sulfonate, 30 parts of bentonite and 65.5 parts of kaolin clay are mixed. . Next, an appropriate amount of water is added to the mixture, and the mixture is further stirred, granulated by a granulator, and dried by ventilation to obtain each granule.
Formulation Example 4
One part of the present bipyridine compounds 1 to 347, 10 parts of clothianidin, 2 parts of sorbitan trioleate, and 28 parts of an aqueous solution containing 2 parts of polyvinyl alcohol were mixed and pulverized by a wet pulverization method. An aqueous solution containing 0.05 part of xanthan gum and 0.1 part of aluminum magnesium silicate is added to make the total amount 90 parts, and further 10 parts of propylene glycol is added and stirred and mixed to obtain each preparation.
製剤例5~73
製剤例1において、クロチアニジン10部に代えて、表i記載のそれぞれの化合物及び使用量を用いた以外は製剤例1と同様の操作を行い、各々の製剤を得る。
表i
Formulation Examples 5 to 73
In Formulation Example 1, instead of 10 parts of clothianidin, the same operations as in Formulation Example 1 were carried out except that the respective compounds and amounts used in Table i were used to obtain each formulation.
Table i
製剤例1において、クロチアニジン10部に代えて、表i記載のそれぞれの化合物及び使用量を用いた以外は製剤例1と同様の操作を行い、各々の製剤を得る。
表i
In Formulation Example 1, instead of 10 parts of clothianidin, the same operations as in Formulation Example 1 were carried out except that the respective compounds and amounts used in Table i were used to obtain each formulation.
Table i
製剤例74~142
製剤例2において、クロチアニジン10部に代えて、表ii記載のそれぞれの化合物及び使用量を用いた以外は製剤例2と同様の操作を行い、各々の製剤を得る。 Formulation Examples 74-142
In Formulation Example 2, instead of 10 parts of clothianidin, the same operation as in Formulation Example 2 was carried out except that the respective compounds and amounts used in Table ii were used to obtain each formulation.
製剤例2において、クロチアニジン10部に代えて、表ii記載のそれぞれの化合物及び使用量を用いた以外は製剤例2と同様の操作を行い、各々の製剤を得る。 Formulation Examples 74-142
In Formulation Example 2, instead of 10 parts of clothianidin, the same operation as in Formulation Example 2 was carried out except that the respective compounds and amounts used in Table ii were used to obtain each formulation.
製剤例143~211
製剤例3において、クロチアニジン0.5部に代えて、表iii記載のそれぞれの化合物及び使用量を用いた以外は製剤例3と同様の操作を行い、各々の製剤を得る。 Formulation Examples 143 to 211
In Formulation Example 3, instead of 0.5 part of clothianidin, the same operations as in Formulation Example 3 were performed except that the respective compounds and amounts used in Table iii were used to obtain each formulation.
製剤例3において、クロチアニジン0.5部に代えて、表iii記載のそれぞれの化合物及び使用量を用いた以外は製剤例3と同様の操作を行い、各々の製剤を得る。 Formulation Examples 143 to 211
In Formulation Example 3, instead of 0.5 part of clothianidin, the same operations as in Formulation Example 3 were performed except that the respective compounds and amounts used in Table iii were used to obtain each formulation.
製剤例212~241
製剤例4において、クロチアニジン2部に代えて、表iv記載のそれぞれの化合物及び使用量を用いた以外は製剤例4と同様の操作を行い、各々の製剤を得る。 Formulation Examples 212 to 241
In Formulation Example 4, in place of 2 parts of clothianidin, the same operations as in Formulation Example 4 were carried out except that the respective compounds and amounts used in Table iv were used to obtain each formulation.
製剤例4において、クロチアニジン2部に代えて、表iv記載のそれぞれの化合物及び使用量を用いた以外は製剤例4と同様の操作を行い、各々の製剤を得る。 Formulation Examples 212 to 241
In Formulation Example 4, in place of 2 parts of clothianidin, the same operations as in Formulation Example 4 were carried out except that the respective compounds and amounts used in Table iv were used to obtain each formulation.
製剤例242
本ビピリジン化合物1~347のうち1種を10部、テブコナゾール0.1部、ソルビタントリオレエート1.5部、並びにポリビニルアルコール2部を含む水溶液28部を混合し、湿式粉砕法で微粉砕した後、この中にキサンタンガム0.05部及びアルミニウムマグネシウムシリケート0.1部を含む水溶液を加え全量を90部とし、さらにプロピレングリコール10部を加えて攪拌混合し、各々の製剤を得る。 Formulation Example 242
After mixing 10 parts of the bipyridine compounds 1 to 347, 0.1 part of tebuconazole, 1.5 parts of sorbitan trioleate, and 28 parts of an aqueous solution containing 2 parts of polyvinyl alcohol, the mixture is pulverized by a wet pulverization method. Into this, an aqueous solution containing 0.05 part of xanthan gum and 0.1 part of aluminum magnesium silicate is added to make a total amount of 90 parts, and further 10 parts of propylene glycol is added and stirred and mixed to obtain each preparation.
本ビピリジン化合物1~347のうち1種を10部、テブコナゾール0.1部、ソルビタントリオレエート1.5部、並びにポリビニルアルコール2部を含む水溶液28部を混合し、湿式粉砕法で微粉砕した後、この中にキサンタンガム0.05部及びアルミニウムマグネシウムシリケート0.1部を含む水溶液を加え全量を90部とし、さらにプロピレングリコール10部を加えて攪拌混合し、各々の製剤を得る。 Formulation Example 242
After mixing 10 parts of the bipyridine compounds 1 to 347, 0.1 part of tebuconazole, 1.5 parts of sorbitan trioleate, and 28 parts of an aqueous solution containing 2 parts of polyvinyl alcohol, the mixture is pulverized by a wet pulverization method. Into this, an aqueous solution containing 0.05 part of xanthan gum and 0.1 part of aluminum magnesium silicate is added to make a total amount of 90 parts, and further 10 parts of propylene glycol is added and stirred and mixed to obtain each preparation.
製剤例243~280
製剤例242において、テブコナゾール0.1部に代えて、表v記載のそれぞれの化合物及び使用量を用いた以外は製剤例242と同様の操作を行い、各々の製剤を得る。 Formulation Examples 243 to 280
In Formulation Example 242, the same operation as in Formulation Example 242 was carried out except that each compound and the amount used in Table v were used instead of 0.1 part of tebuconazole to obtain each formulation.
製剤例242において、テブコナゾール0.1部に代えて、表v記載のそれぞれの化合物及び使用量を用いた以外は製剤例242と同様の操作を行い、各々の製剤を得る。 Formulation Examples 243 to 280
In Formulation Example 242, the same operation as in Formulation Example 242 was carried out except that each compound and the amount used in Table v were used instead of 0.1 part of tebuconazole to obtain each formulation.
次に、本発明組成物の有害生物防除効力を試験例により示す。
Next, the pest control effect of the composition of the present invention is shown by test examples.
試験例1
本ビピリジン化合物1mgに対し、キシレン:DMF:界面活性剤=4:4:1(容量比)の混合溶液10μLを用いて本ビピリジン化合物を溶解させる。これに展着剤0.02容量%含有する水を加え、本ビピリジン化合物の濃度が所定濃度になるように、本ビピリジン化合物を含有する薬液を調製する。
本化合物1mgに対し、キシレン:DMF:界面活性剤=4:4:1(容量比)の混合溶液10μLを用いて本化合物を溶解させる。これに展着剤0.02容量%含有する水を加え、本化合物の濃度が所定濃度になるように、本化合物を含有する薬液を調製する。本化合物を含有する市販製剤を用いる場合には、各市販製剤を、展着剤0.02容量%含有する水と混合し、本化合物の濃度が所定濃度になるように、本化合物を含有する薬液を調製する。
上記の本ビピリジン化合物を含有する薬液と、本化合物を含有する薬液とを混合し、試験用薬液を調製する。
キュウリ(Cucumis sativus)子葉の葉片(長さ1.5cm)を24穴マイクロプレートの各ウェルに収容し、1ウェルあたりワタアブラムシ無翅成虫2匹及び幼虫8匹を放し、1ウェルあたり該試験用薬液20μLを散布する。これを処理区とする。
なお、試験用薬液の代わりに展着剤0.02容量%を含有する水を20μL散布したウェルを無処理区とする。
該試験用薬液が乾燥した後、マイクロプレート上部をガス透過性フィルムシート(商品名:AeraSeal, Excel Scientific Inc.製)で覆い、放飼5日後に、各ウェルの生存虫数を調査する。
処理区及び無処理区の防除価を次式より算出する。
防除価(%)={1-(Tai)/(Cai)}×100
なお、式中の文字は以下の意味を表す。
Cai:無処理区の調査時の生存虫数
Tai:処理区の調査時の生存虫数 Test example 1
The bipyridine compound is dissolved in 10 mg of a mixed solution of xylene: DMF: surfactant = 4: 4: 1 (volume ratio) with respect to 1 mg of the bipyridine compound. Water containing 0.02% by volume of a spreading agent is added thereto, and a chemical solution containing the bipyridine compound is prepared so that the concentration of the bipyridine compound becomes a predetermined concentration.
The compound is dissolved in 10 mg of a mixed solution of xylene: DMF: surfactant = 4: 4: 1 (volume ratio) with respect to 1 mg of the compound. Water containing 0.02% by volume of a spreading agent is added thereto, and a chemical solution containing the present compound is prepared so that the concentration of the present compound becomes a predetermined concentration. When using a commercial preparation containing the present compound, each commercial preparation is mixed with water containing 0.02% by volume of a spreading agent, and the present compound is contained so that the concentration of the present compound becomes a predetermined concentration. Prepare the drug solution.
A chemical solution containing the present bipyridine compound and a chemical solution containing the present compound are mixed to prepare a test chemical solution.
Cucumber sativus cotyledon leaf pieces (1.5 cm in length) are accommodated in each well of a 24-well microplate, and 2 cotton aphid adults and 8 larvae are released per well for the test per well. Spray 20 μL of chemical solution. This is the treatment area.
In addition, let the well which sprayed 20 microliters of water containing 0.02 volume% of spreading agents instead of the chemical | medical solution for a test be an untreated section.
After the drug solution for test is dried, the upper part of the microplate is covered with a gas permeable film sheet (trade name: AeroSeal, manufactured by Excel Scientific Inc.), and the number of viable insects in each well is examined 5 days after release.
The control values for the treated and untreated areas are calculated from
Control value (%) = {1− (Tai) / (Cai)} × 100
In addition, the character in a formula represents the following meaning.
Cai: Number of surviving insects at the time of the survey in the untreated area Tai: Number of surviving insects at the time of the survey in the treated area
本ビピリジン化合物1mgに対し、キシレン:DMF:界面活性剤=4:4:1(容量比)の混合溶液10μLを用いて本ビピリジン化合物を溶解させる。これに展着剤0.02容量%含有する水を加え、本ビピリジン化合物の濃度が所定濃度になるように、本ビピリジン化合物を含有する薬液を調製する。
本化合物1mgに対し、キシレン:DMF:界面活性剤=4:4:1(容量比)の混合溶液10μLを用いて本化合物を溶解させる。これに展着剤0.02容量%含有する水を加え、本化合物の濃度が所定濃度になるように、本化合物を含有する薬液を調製する。本化合物を含有する市販製剤を用いる場合には、各市販製剤を、展着剤0.02容量%含有する水と混合し、本化合物の濃度が所定濃度になるように、本化合物を含有する薬液を調製する。
上記の本ビピリジン化合物を含有する薬液と、本化合物を含有する薬液とを混合し、試験用薬液を調製する。
キュウリ(Cucumis sativus)子葉の葉片(長さ1.5cm)を24穴マイクロプレートの各ウェルに収容し、1ウェルあたりワタアブラムシ無翅成虫2匹及び幼虫8匹を放し、1ウェルあたり該試験用薬液20μLを散布する。これを処理区とする。
なお、試験用薬液の代わりに展着剤0.02容量%を含有する水を20μL散布したウェルを無処理区とする。
該試験用薬液が乾燥した後、マイクロプレート上部をガス透過性フィルムシート(商品名:AeraSeal, Excel Scientific Inc.製)で覆い、放飼5日後に、各ウェルの生存虫数を調査する。
処理区及び無処理区の防除価を次式より算出する。
防除価(%)={1-(Tai)/(Cai)}×100
なお、式中の文字は以下の意味を表す。
Cai:無処理区の調査時の生存虫数
Tai:処理区の調査時の生存虫数 Test example 1
The bipyridine compound is dissolved in 10 mg of a mixed solution of xylene: DMF: surfactant = 4: 4: 1 (volume ratio) with respect to 1 mg of the bipyridine compound. Water containing 0.02% by volume of a spreading agent is added thereto, and a chemical solution containing the bipyridine compound is prepared so that the concentration of the bipyridine compound becomes a predetermined concentration.
The compound is dissolved in 10 mg of a mixed solution of xylene: DMF: surfactant = 4: 4: 1 (volume ratio) with respect to 1 mg of the compound. Water containing 0.02% by volume of a spreading agent is added thereto, and a chemical solution containing the present compound is prepared so that the concentration of the present compound becomes a predetermined concentration. When using a commercial preparation containing the present compound, each commercial preparation is mixed with water containing 0.02% by volume of a spreading agent, and the present compound is contained so that the concentration of the present compound becomes a predetermined concentration. Prepare the drug solution.
A chemical solution containing the present bipyridine compound and a chemical solution containing the present compound are mixed to prepare a test chemical solution.
Cucumber sativus cotyledon leaf pieces (1.5 cm in length) are accommodated in each well of a 24-well microplate, and 2 cotton aphid adults and 8 larvae are released per well for the test per well. Spray 20 μL of chemical solution. This is the treatment area.
In addition, let the well which sprayed 20 microliters of water containing 0.02 volume% of spreading agents instead of the chemical | medical solution for a test be an untreated section.
After the drug solution for test is dried, the upper part of the microplate is covered with a gas permeable film sheet (trade name: AeroSeal, manufactured by Excel Scientific Inc.), and the number of viable insects in each well is examined 5 days after release.
The control values for the treated and untreated areas are calculated from
Control value (%) = {1− (Tai) / (Cai)} × 100
In addition, the character in a formula represents the following meaning.
Cai: Number of surviving insects at the time of the survey in the untreated area Tai: Number of surviving insects at the time of the survey in the treated area
試験例1に従って実施する試験の結果を以下に示す。本ビピリジン化合物及び本化合物のそれぞれの濃度が下表52に記載の濃度である本発明組成物は、優れた防除効力を示す。
Results of tests conducted according to Test Example 1 are shown below. The composition of the present invention in which the concentrations of the present bipyridine compound and the present compound are those shown in Table 52 below exhibit excellent control efficacy.
試験例2
本ビピリジン化合物1mgに対し、キシレン:DMF:界面活性剤(ソルポール3005X,東邦化学工業株式会社製)=4:4:1(容量比)の混合溶液10μLを用いて本ビピリジン化合物を溶解させた。これに展着剤(シンダイン(登録商標),住友化学株式会社製)0.02容量%含有する水を加え、本ビピリジン化合物の濃度が所定濃度になるように、本ビピリジン化合物を含有する薬液を調製した。
本化合物1mgに対し、キシレン:DMF:界面活性剤(ソルポール3005X,東邦化学工業株式会社製)=4:4:1(容量比)の混合溶液10μLを用いて本化合物を溶解させた。これに展着剤(シンダイン(登録商標),住友化学株式会社製)0.02容量%含有する水を加え、本化合物の濃度が所定濃度になるように、本化合物を含有する薬液を調製した。本化合物を含有する市販製剤を用いた場合には、各市販製剤を、展着剤(シンダイン(登録商標))0.02容量%含有する水と混合し、本化合物の濃度が所定濃度になるように、本化合物を含有する薬液を調製した。
上記の本ビピリジン化合物を含有する薬液と、本化合物を含有する薬液とを混合し、試験用薬液を調製した。
キュウリ(Cucumis sativus)子葉の葉片(長さ1.5cm)を24穴マイクロプレートの各ウェルに収容し、1ウェルあたりワタアブラムシ無翅成虫2匹及び幼虫8匹を放し、1ウェルあたり該試験用薬液20μLを散布した。これを処理区とした。
なお、試験用薬液の代わりに展着剤(シンダイン(登録商標))0.02容量%を含有する水を20μL散布したウェルを無処理区とした。
該試験用薬液が乾燥した後、マイクロプレート上部をガス透過性フィルムシート(商品名:AeraSeal, Excel Scientific Inc.製)で覆い、放飼5日後に、各ウェルの生存虫数を調査した。
処理区及び無処理区の防除価を次式より算出した。
防除価(%)={1-(Tai)/(Cai)}×100
なお、式中の文字は以下の意味を表す。
Cai:無処理区の調査時の生存虫数
Tai:処理区の調査時の生存虫数 Test example 2
The bipyridine compound was dissolved in 10 mg of a mixed solution of xylene: DMF: surfactant (Solpol 3005X, manufactured by Toho Chemical Industry Co., Ltd.) = 4: 4: 1 (volume ratio) with respect to 1 mg of the bipyridine compound. To this, 0.02 vol% water containing a spreading agent (Cindine (registered trademark), manufactured by Sumitomo Chemical Co., Ltd.) is added, and a chemical solution containing the bipyridine compound is added so that the concentration of the bipyridine compound becomes a predetermined concentration. Prepared.
This compound was dissolved in 1 mg of this compound using 10 μL of a mixed solution of xylene: DMF: surfactant (Solpol 3005X, manufactured by Toho Chemical Industry Co., Ltd.) = 4: 4: 1 (volume ratio). To this was added 0.02% by volume of a spreading agent (Sindyne (registered trademark), manufactured by Sumitomo Chemical Co., Ltd.), and a chemical solution containing this compound was prepared so that the concentration of this compound would be a predetermined concentration. . When a commercial preparation containing the present compound is used, each commercial preparation is mixed with water containing 0.02% by volume of a spreading agent (Cyndine (registered trademark)), and the concentration of the present compound becomes a predetermined concentration. Thus, the chemical | medical solution containing this compound was prepared.
The chemical solution containing the present bipyridine compound and the chemical solution containing the present compound were mixed to prepare a test chemical solution.
Cucumber sativus cotyledon leaf pieces (1.5 cm in length) are accommodated in each well of a 24-well microplate, and 2 cotton aphid adults and 8 larvae are released per well for the test per well. 20 μL of chemical solution was sprayed. This was designated as a treatment zone.
In addition, the well which sprayed 20 microliters of water containing 0.02 volume% of spreading agents (Cyndine (trademark)) instead of the chemical | medical solution for a test was made into the no-treatment group.
After the drug solution for testing was dried, the upper part of the microplate was covered with a gas permeable film sheet (trade name: AeraSeal, manufactured by Excel Scientific Inc.), and the number of surviving insects in each well was examined 5 days after release.
The control values for the treated and untreated areas were calculated from
Control value (%) = {1− (Tai) / (Cai)} × 100
In addition, the character in a formula represents the following meaning.
Cai: Number of surviving insects at the time of the survey in the untreated area Tai: Number of surviving insects at the time of the survey in the treated area
本ビピリジン化合物1mgに対し、キシレン:DMF:界面活性剤(ソルポール3005X,東邦化学工業株式会社製)=4:4:1(容量比)の混合溶液10μLを用いて本ビピリジン化合物を溶解させた。これに展着剤(シンダイン(登録商標),住友化学株式会社製)0.02容量%含有する水を加え、本ビピリジン化合物の濃度が所定濃度になるように、本ビピリジン化合物を含有する薬液を調製した。
本化合物1mgに対し、キシレン:DMF:界面活性剤(ソルポール3005X,東邦化学工業株式会社製)=4:4:1(容量比)の混合溶液10μLを用いて本化合物を溶解させた。これに展着剤(シンダイン(登録商標),住友化学株式会社製)0.02容量%含有する水を加え、本化合物の濃度が所定濃度になるように、本化合物を含有する薬液を調製した。本化合物を含有する市販製剤を用いた場合には、各市販製剤を、展着剤(シンダイン(登録商標))0.02容量%含有する水と混合し、本化合物の濃度が所定濃度になるように、本化合物を含有する薬液を調製した。
上記の本ビピリジン化合物を含有する薬液と、本化合物を含有する薬液とを混合し、試験用薬液を調製した。
キュウリ(Cucumis sativus)子葉の葉片(長さ1.5cm)を24穴マイクロプレートの各ウェルに収容し、1ウェルあたりワタアブラムシ無翅成虫2匹及び幼虫8匹を放し、1ウェルあたり該試験用薬液20μLを散布した。これを処理区とした。
なお、試験用薬液の代わりに展着剤(シンダイン(登録商標))0.02容量%を含有する水を20μL散布したウェルを無処理区とした。
該試験用薬液が乾燥した後、マイクロプレート上部をガス透過性フィルムシート(商品名:AeraSeal, Excel Scientific Inc.製)で覆い、放飼5日後に、各ウェルの生存虫数を調査した。
処理区及び無処理区の防除価を次式より算出した。
防除価(%)={1-(Tai)/(Cai)}×100
なお、式中の文字は以下の意味を表す。
Cai:無処理区の調査時の生存虫数
Tai:処理区の調査時の生存虫数 Test example 2
The bipyridine compound was dissolved in 10 mg of a mixed solution of xylene: DMF: surfactant (Solpol 3005X, manufactured by Toho Chemical Industry Co., Ltd.) = 4: 4: 1 (volume ratio) with respect to 1 mg of the bipyridine compound. To this, 0.02 vol% water containing a spreading agent (Cindine (registered trademark), manufactured by Sumitomo Chemical Co., Ltd.) is added, and a chemical solution containing the bipyridine compound is added so that the concentration of the bipyridine compound becomes a predetermined concentration. Prepared.
This compound was dissolved in 1 mg of this compound using 10 μL of a mixed solution of xylene: DMF: surfactant (Solpol 3005X, manufactured by Toho Chemical Industry Co., Ltd.) = 4: 4: 1 (volume ratio). To this was added 0.02% by volume of a spreading agent (Sindyne (registered trademark), manufactured by Sumitomo Chemical Co., Ltd.), and a chemical solution containing this compound was prepared so that the concentration of this compound would be a predetermined concentration. . When a commercial preparation containing the present compound is used, each commercial preparation is mixed with water containing 0.02% by volume of a spreading agent (Cyndine (registered trademark)), and the concentration of the present compound becomes a predetermined concentration. Thus, the chemical | medical solution containing this compound was prepared.
The chemical solution containing the present bipyridine compound and the chemical solution containing the present compound were mixed to prepare a test chemical solution.
Cucumber sativus cotyledon leaf pieces (1.5 cm in length) are accommodated in each well of a 24-well microplate, and 2 cotton aphid adults and 8 larvae are released per well for the test per well. 20 μL of chemical solution was sprayed. This was designated as a treatment zone.
In addition, the well which sprayed 20 microliters of water containing 0.02 volume% of spreading agents (Cyndine (trademark)) instead of the chemical | medical solution for a test was made into the no-treatment group.
After the drug solution for testing was dried, the upper part of the microplate was covered with a gas permeable film sheet (trade name: AeraSeal, manufactured by Excel Scientific Inc.), and the number of surviving insects in each well was examined 5 days after release.
The control values for the treated and untreated areas were calculated from
Control value (%) = {1− (Tai) / (Cai)} × 100
In addition, the character in a formula represents the following meaning.
Cai: Number of surviving insects at the time of the survey in the untreated area Tai: Number of surviving insects at the time of the survey in the treated area
試験例2に従って実施した試験の結果を以下に示す。本ビピリジン化合物及び本化合物のそれぞれの濃度が下表53~71に記載の濃度である本発明組成物は、いずれも優れた防除効力を示した。
Results of tests conducted according to Test Example 2 are shown below. The present bipyridine compound and the composition of the present invention in which the respective concentrations of the present compound are the concentrations shown in Tables 53 to 71 below showed excellent control efficacy.
本発明の有害生物防除組成物により、有害生物を防除することができる。
The pest control composition of the present invention can be used to control pests.
Claims (9)
- 下記式(I)で示される化合物又はそのNオキシド化合物と、
下記群(a)及び下記群(b)からなる群より選ばれる1種以上の化合物と
を含有する有害生物防除組成物。
式(I):
R1は、C2-C10ハロアルキル基、C3-C10ハロアルケニル基、C3-C10ハロアルキニル基、1以上のハロゲン原子を有する(C1-C5アルコキシ)C2-C5アルキル基、1以上のハロゲン原子を有する(C1-C5アルキルスルファニル)C2-C5アルキル基、1以上のハロゲン原子を有する(C1-C5アルキルスルフィニル)C2-C5アルキル基、1以上のハロゲン原子を有する(C1-C5アルキルスルホニル)C2-C5アルキル基、群Gより選ばれる1以上の置換基を有する(C3-C7シクロアルキル)C1-C3アルキル基、又は群Gより選ばれる1以上の置換基を有するC3-C7シクロアルキル基を表し、
R2は、1以上のハロゲン原子を有していてもよいC1-C6アルキル基、シクロプロピルメチル基、又はシクロプロピル基を表し、
R3は、各々独立して、群Bより選ばれる1以上の置換基を有していてもよいC1-C6鎖式炭化水素基、群Dより選ばれる1以上の置換基を有していてもよいフェニル基、群Dより選ばれる1以上の置換基を有していてもよい5もしくは6員芳香族複素環基、OR12、NR11R12、NR11aR12a、NR24NR11R12、NR11C(O)R13、NR24NR11C(O)R13、NR11C(O)OR14、NR24NR11C(O)OR14、NR11C(O)NR15R16、NR24NR11C(O)NR15R16、N=CHNR15R16、N=S(O)xR15R16、S(O)yR15、C(O)OR17、C(O)NR11R12、シアノ基、ニトロ基、又はハロゲン原子を表し、
R6は、各々独立して、1以上のハロゲン原子を有していてもよいC1-C6アルキル基、OR18、NR18R19、C(O)OR25、OC(O)R20、シアノ基、ニトロ基、又はハロゲン原子を表し、
R11、R17、R18、R19、R20、R24、及びR25は、各々独立して、水素原子又は1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基を表し、
R12は、水素原子、1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、群Fより選ばれる1の置換基を有するC1-C6アルキル基、又はS(O)2R23を表し、
R23は、1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、又は群Dより選ばれる1以上の置換基を有していてもよいフェニル基を表し、
R11a及びR12aはそれらが結合する窒素原子と一緒になって、3-7員非芳香族複素環基{該3-7員非芳香族複素環はアジリジン環、アゼチジン環、ピロリジン環、イミダゾリン環、イミダゾリジン環、ピペリジン環、テトラヒドロピリミジン環、ヘキサヒドロピリミジン環、ピペラジン環、アゼパン環、オキサゾリジン環、イソオキサゾリジン環、1,3-オキサジナン環、モルホリン環、1,4-オキサゼパン環、チアゾリジン環、イソチアゾリジン環、1,3-チアジナン環、チオモルホリン環、又は1,4-チアゼパン環を表し、群Eより選ばれる1以上の置換基を有していてもよい。}を形成し、
R13は、水素原子、1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、1以上のハロゲン原子を有していてもよいC3-C7シクロアルキル基、1以上のハロゲン原子を有していてもよい(C3-C6シクロアルキル)C1-C3アルキル基、群Dより選ばれる1以上の置換基を有していてもよいフェニル基、又は群Dより選ばれる1以上の置換基を有していてもよい5もしくは6員芳香族複素環基を表し、
R14は、1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、1以上のハロゲン原子を有していてもよいC3-C7シクロアルキル基、1以上のハロゲン原子を有していてもよい(C3-C6シクロアルキル)C1-C3アルキル基、又はフェニルC1-C3アルキル基{フェニルC1-C3アルキル基におけるフェニル部分は、群Dより選ばれる1以上の置換基を有していてもよい。}を表し、
R15、及びR16は、各々独立して、1以上のハロゲン原子を有していてもよいC1-C6アルキル基を表し、
n及びyは、各々独立して、0、1、又は2を表し、
xは、0又は1を表し、
p及びqは、各々独立して、0、1、2、又3を表し、pが2又は3である場合、複数のR6は同一でも異なっていてもよく、qが2又は3である場合、複数のR3は同一でも異なっていてもよい。
群B:1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルケニルオキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルキニルオキシ基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルファニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルフィニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルホニル基、1以上のハロゲン原子を有していてもよいC3-C6シクロアルキル基、シアノ基、ヒドロキシ基、及びハロゲン原子からなる群。
群D:1以上のハロゲン原子を有していてもよいC1-C6鎖式炭化水素基、ヒドロキシ基、1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルケニルオキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルキニルオキシ基、スルファニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルファニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルフィニル基、1以上のハロゲン原子を有していてもよいC1-C6アルキルスルホニル基、アミノ基、NHR21、NR21R22、C(O)R21、OC(O)R21、C(O)OR21、シアノ基、ニトロ基、及びハロゲン原子からなる群。{R21、及びR22は、各々独立して、1以上のハロゲン原子を有していてもよいC1-C6アルキル基を表す}
群E:1以上のハロゲン原子で置換されていてもよいC1-C6鎖式炭化水素基、1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルケニルオキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルキニルオキシ基、ハロゲン原子、オキソ基、ヒドロキシ基、シアノ基、及びニトロ基からなる群。
群F:1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、NHR21、NR21R22、シアノ基、群Dより選ばれる1以上の置換基を有していてもよいフェニル基、群Dより選ばれる1以上の置換基を有していてもよい5もしくは6員芳香族複素環基、1以上のハロゲン原子を有していてもよいC3-C7シクロアルキル基、及び群Cより選ばれる1以上の置換基を有していてもよい3-7員非芳香族複素環基からなる群。
群C:1以上のハロゲン原子で置換されていてもよいC1-C6鎖式炭化水素基、1以上のハロゲン原子を有していてもよいC1-C6アルコキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルケニルオキシ基、1以上のハロゲン原子を有していてもよいC3-C6アルキニルオキシ基、及びハロゲン原子からなる群。
群G:ハロゲン原子、及びC1-C6ハロアルキル基からなる群。]
群(a):
下記亜群a-1、a-2、a-3、a-4、a-5、a-6及びa-7からなる群。
亜群a-1:
アセタミプリド、クロチアニジン、ジノテフラン、イミダクロプリド、ニテンピラム、チアクロプリド、チアメトキサム、フルピラジフロン、スルホキサフロル、トリフルメゾピリム、ジクロロメソチアズ及び下記式
亜群a-2:
アクリナトリン、アレスリン、ビフェントリン、カッパビフェントリン、ビオアレスリン、ビオレスメトリン、シクロプロトリン、シフルトリン、ベータ-シフルトリン、シハロトリン、ガンマシハロトリン、ラムダシハロトリン、シペルメトリン、アルファシペルメトリン、べータシペルメトリン、シータシペルメトリン、ゼータシペルメトリン、シグマシペルメトリン、シフェノトリン、デルタメトリン、エンペントリン、エスフェンバレレート、エトフェンプロックス、フェンプロパトリン、フェンバレレート、フルシトリネート、フルメトリン、フルバリネート、タウフルバリネート、ハルフェンプロックス、ヘプタフルトリン、イミプロトリン、カデスリン、メペルフルトリン、モンフルオロトリン、ペルメトリン、フェノトリン、プラレトリン、ピレトリン、レスメトリン、シラフルオフェン、テフルトリン、カッパテフルトリン、テトラメトリン、テトラメチルフルトリン、トラロメトリン、トランスフルトリン、ベンフルトリン、フルフェンプロックス、フルメスリン、フラメトリン、メトフルトリン、プロフルトリン及びジメフルトリンからなる群。
亜群a-3:
エチプロール、フィプロニル、フルフィプロール、アフォクソラネル、フルララネル、ブロフラニリド及びフルキサメタミドからなる群。
亜群a-4:
クロラントラニリプロール、シアントラニルプロール、シクラニリプロール、フルベンジアミド、テトラニリプロール及びシハロジアミドからなる群。
亜群a-5:
アラニカルブ、アルジカルブ、ベンダイオカルブ、ベンフラカルブ、ブトカルボキシム、ブトキシカルボキシム、カルバリル、カルボフラン、カルボスルファン、エチオフェンカルブ、フェノブカルブ、ホルメタネート、フラチオカルブ、イソプロカルブ、メチオカルブ、メソミル、メトルカルブ、オキサミル、ピリミカーブ、プロポキスル、チオジカルブ、チオファノックス、トリアザメート、トリメタカルブ、XMC及びキシリルカルブからなる群。
亜群a-6:
アバメクチン、フルエンスルホン、チオキサザフェン及びフルアザインドリジンからなる群。
亜群a-7:
菌根菌、アルスロボトリス・ダクチロイデス、バチルス・チューリンゲンシス、バチルス・フィルムス、バチルス・メガテリウム、バチルス・アミロリケファシエンス、ヒルステラ・ロッシリエンシス、ヒルステラ・ミネソテンシス、モナクロスポリウム・フィマトパガム、パスツーリア・ニシザワエ、パスツーリア・ペネトランス、パスツーリア・ウスガエ、バーティシリウム・クラミドスポリウム及びハーピンタンパクからなる群。
群(b):
下記亜群b-1、b-2、b-3、b-4、b-5、b-6、b-7、b-8及びb-9からなる群。
亜群b-1:
アザコナゾール、ビテルタノール、ブロムコナゾール、シプロコナゾール、ジフェノコナゾール、ジニコナゾール、ジニコナゾールM、エポキシコナゾール、エタコナゾール、フェナリモル、フェンブコナゾール、フルキンコナゾール、キンコナゾール、フルシラゾール、フルトリアホール、ヘキサコナゾール、イマザリル、イミベンコナゾール、イプコナゾール、メトコナゾール、ミクロブタニル、ヌアリモール、オキスポコナゾール、オキスポコナゾールフマル酸塩、ペフラゾエート、ペンコナゾール、プロクロラズ、プロピコナゾール、プロチオコナゾール、ピリフェノックス、ピリソキサゾール、シメコナゾール、テブコナゾール、テトラコナゾール、トリアジメホン、トリアジメノール、トリフルミゾール、トリホリン及びトリチコナゾールからなる群。
亜群b-2:
アゾキシストロビン、クモキシストロビン、ジモキシストロビン、エノキサストロビン、ファモキサドン、フェンアミドン、フェナミンストロビン、フルフェノキシストロビン、フルオキサストロビン、クレソキシム-メチル、マンデストロビン、メトミノストロビン、オリサストロビン、ピコキシストロビン、ピラクロストロビン、ピラメトストロビン、ピラオキシストロビン、トリフロキシストロビン、ピリベンカルブ、トリクロピリカルブ、シアゾファミド及びアミスルブロムからなる群。
亜群b-3:
ベナラキシル、ベナラキシルM、フララキシル、メタラキシル、メタラキシルM、オキサジキシル及びオフラセからなる群。
亜群b-4:
ベノダニル、ベンゾビンジフルピル、ビキサフェン、ボスカリド、カルボキシン、フェンフラム、フルオピラム、フルトラニル、フルキサピロキサド、フラメトピル、イソフェタミド、イソピラザム、メプロニル、オキシカルボキシン、ペンチオピラド、ペンフルフェン、セダキサン、チフルザミド、ピラジフルミド、ピジフルメトフェン、3-ジフルオロメチル-1-メチル-N-(1,1,3-トリメチルインダン-4-イル)ピラゾール-4-カルボキサミド、3-ジフルオロメチル-1-メチル-N-[(3R)-1,1,3-トリメチルインダン-4-イル]ピラゾール-4-カルボキサミド、3-ジフルオロメチル-N-(7-フルオロ-1,1,3-トリメチルインダン-4-イル)-1-メチルピラゾール-4-カルボキサミド、3-ジフルオロメチル-N-[(3R)-7-フルオロ-1,1,3-トリメチルインダン-4-イル]-1-メチルピラゾール-4-カルボキサミド及びN-シクロプロピル-3-(ジフルオロメチル)-5-フルオロ-N-(5-クロロ-2-イソプロピルベンジル)-1-メチル-1H-ピラゾール-4-カルボキサミドからなる群。
亜群b-5:
ベノミル、カルベンダジム、フベリダゾール、チアベンダゾール、チオファネート、チオファネートメチル、ジエトフェンカルブ、ゾキサミド及びエタボキサムからなる群。
亜群b-6:
フェルバム、マンゼブ、マンネブ、メチラム、プロピネブ、チウラム、ジネブ、ジラム、キャプタン、キャプタホール、ホルペット、クロロタロニル、トリルフルアニド、グアザチン、イミノクタジン、アニラジン、ジチアノン、キノメチオナート及びフルオルイミドからなる群。
亜群b-7:
ジメトモルフ、フルモルフ、ピリモルフ、ベンチアバリカルブ、ベンチアバリカルブイソプロピル、イプロバリカルブ、バリフェナレート及びマンジプロパミドからなる群。
亜群b-8:
フェンピクロニル、フルジオキソニル、クロゾリネート、イプロジオン、プロシミドン及びビンクロゾリンからなる群。
亜群b-9:
トルクロホスメチル、オキサチアピプロリン、ピカルブトラゾクス、フルオピコリド及びシルチオファムからなる群。 A compound represented by the following formula (I) or an N oxide compound thereof;
A pest control composition comprising one or more compounds selected from the group consisting of the following group (a) and the following group (b).
Formula (I):
R 1 is a C2-C10 haloalkyl group, a C3-C10 haloalkenyl group, a C3-C10 haloalkynyl group, one or more halogen atoms (C1-C5 alkoxy), a C2-C5 alkyl group, and one or more halogen atoms. (C1-C5 alkylsulfanyl) C2-C5 alkyl group, having one or more halogen atoms (C1-C5 alkylsulfinyl) C2-C5 alkyl group, having one or more halogen atoms (C1-C5 alkylsulfonyl) C2-C5 An alkyl group, a (C3-C7 cycloalkyl) C1-C3 alkyl group having one or more substituents selected from group G, or a C3-C7 cycloalkyl group having one or more substituents selected from group G;
R 2 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a cyclopropylmethyl group, or a cyclopropyl group;
R 3 each independently has a C1-C6 chain hydrocarbon group which may have one or more substituents selected from group B, and one or more substituents selected from group D. Or a phenyl group, a 5- or 6-membered aromatic heterocyclic group optionally having one or more substituents selected from group D, OR 12 , NR 11 R 12 , NR 11a R 12a , NR 24 NR 11 R 12 , NR 11 C (O) R 13 , NR 24 NR 11 C (O) R 13 , NR 11 C (O) OR 14 , NR 24 NR 11 C (O) OR 14 , NR 11 C (O) NR 15 R 16 , NR 24 NR 11 C (O) NR 15 R 16 , N = CHNR 15 R 16 , N = S (O) x R 15 R 16 , S (O) y R 15 , C (O) OR 17 , C (O) NR 11 R 12 , a cyano group, a nitro group, or a halogen atom,
R 6 is each independently a C1-C6 alkyl group optionally having one or more halogen atoms, OR 18 , NR 18 R 19 , C (O) OR 25 , OC (O) R 20 , cyano Represents a group, a nitro group, or a halogen atom,
R 11 , R 17 , R 18 , R 19 , R 20 , R 24 , and R 25 are each independently a hydrogen atom or a C1-C6 chain hydrocarbon optionally having one or more halogen atoms Represents a group,
R 12 represents a hydrogen atom, a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a C1-C6 alkyl group having one substituent selected from Group F, or S (O) 2 represents R 23 ,
R 23 represents a C1-C6 chain hydrocarbon group which may have one or more halogen atoms, or a phenyl group which may have one or more substituents selected from group D;
R 11a and R 12a are taken together with the nitrogen atom to which they are attached to form a 3-7-membered non-aromatic heterocyclic group (the 3-7-membered non-aromatic heterocyclic ring is an aziridine ring, azetidine ring, pyrrolidine ring, imidazoline Ring, imidazolidine ring, piperidine ring, tetrahydropyrimidine ring, hexahydropyrimidine ring, piperazine ring, azepane ring, oxazolidine ring, isoxazolidine ring, 1,3-oxazinane ring, morpholine ring, 1,4-oxazepane ring, thiazolidine ring , An isothiazolidine ring, a 1,3-thiazinane ring, a thiomorpholine ring, or a 1,4-thiazepan ring, which may have one or more substituents selected from Group E. },
R 13 represents a hydrogen atom, a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a C3-C7 cycloalkyl group optionally having one or more halogen atoms, one or more A (C3-C6 cycloalkyl) C1-C3 alkyl group optionally having a halogen atom, a phenyl group optionally having one or more substituents selected from group D, or one or more selected from group D Represents a 5- or 6-membered aromatic heterocyclic group optionally having
R 14 represents a C1-C6 chain hydrocarbon group optionally having one or more halogen atoms, a C3-C7 cycloalkyl group optionally having one or more halogen atoms, and one or more halogen atoms. The optionally substituted (C3-C6 cycloalkyl) C1-C3 alkyl group or the phenyl C1-C3 alkyl group {the phenyl moiety in the phenyl C1-C3 alkyl group has one or more substituents selected from group D; You may do it. },
R 15 and R 16 each independently represents a C1-C6 alkyl group optionally having one or more halogen atoms,
n and y each independently represents 0, 1, or 2;
x represents 0 or 1;
p and q each independently represent 0, 1, 2, or 3, and when p is 2 or 3, a plurality of R 6 may be the same or different, and q is 2 or 3 In this case, the plurality of R 3 may be the same or different.
Group B: C1-C6 alkoxy group optionally having one or more halogen atoms, C3-C6 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms A C3-C6 alkynyloxy group which may have one or more halogen atoms, a C1-C6 alkylsulfanyl group which may have one or more halogen atoms, a C1-C6 alkylsulfinyl group which may have one or more halogen atoms, one or more A group consisting of a C1-C6 alkylsulfonyl group optionally having a halogen atom, a C3-C6 cycloalkyl group optionally having one or more halogen atoms, a cyano group, a hydroxy group, and a halogen atom.
Group D: C1-C6 chain hydrocarbon group which may have one or more halogen atoms, hydroxy group, C1-C6 alkoxy group which may have one or more halogen atoms, one or more halogen atoms A C3-C6 alkenyloxy group which may have one or more, a C3-C6 alkynyloxy group which may have one or more halogen atoms, a sulfanyl group, or a C1-C6 which may have one or more halogen atoms. C6 alkylsulfanyl group, C1-C6 alkylsulfinyl group optionally having one or more halogen atoms, C1-C6 alkylsulfonyl group optionally having one or more halogen atoms, amino group, NHR 21 , NR A group consisting of 21 R 22 , C (O) R 21 , OC (O) R 21 , C (O) OR 21 , a cyano group, a nitro group, and a halogen atom. {R 21 and R 22 each independently represents a C1-C6 alkyl group optionally having one or more halogen atoms}
Group E: C1-C6 chain hydrocarbon group which may be substituted with one or more halogen atoms, C1-C6 alkoxy group which may have one or more halogen atoms, one or more halogen atoms A group consisting of a C3-C6 alkenyloxy group which may have one or more, a C3-C6 alkynyloxy group which may have one or more halogen atoms, a halogen atom, an oxo group, a hydroxy group, a cyano group and a nitro group.
Group F: C1-C6 alkoxy group optionally having one or more halogen atoms, NHR 21 , NR 21 R 22 , cyano group, phenyl optionally having one or more substituents selected from Group D A group, a 5- or 6-membered aromatic heterocyclic group optionally having one or more substituents selected from group D, a C3-C7 cycloalkyl group optionally having one or more halogen atoms, and a group A group consisting of a 3-7-membered non-aromatic heterocyclic group which may have one or more substituents selected from C.
Group C: C1-C6 chain hydrocarbon group optionally substituted with one or more halogen atoms, C1-C6 alkoxy group optionally having one or more halogen atoms, one or more halogen atoms A group consisting of an optionally substituted C3-C6 alkenyloxy group, an optionally substituted C3-C6 alkynyloxy group, and a halogen atom.
Group G: A group consisting of a halogen atom and a C1-C6 haloalkyl group. ]
Group (a):
A group consisting of the following subgroups a-1, a-2, a-3, a-4, a-5, a-6 and a-7.
Subgroup a-1:
Acetamiprid, clothianidin, dinotefuran, imidacloprid, nitenpyram, thiacloprid, thiamethoxam, flupiradifurone, sulfoxafurol, triflumezopyrim, dichloromesothiaz and the following formula
Subgroup a-2:
Acrinatrin, Aleslin, Bifenthrin, Kappabifenthrin, Bioarethrin, Bioresmethrin, Cycloproton, Cyfluthrin, Beta-Cyfluthrin, Cyhalothrin, Gamma Cyhalothrin, Lambdacyhalothrin, Cypermethrin, Alpha Cypermethrin, Betacypermethrin, Theta Permethrin, zeta-cypermethrin, sigma-permethrin, ciphenothrin, deltamethrin, empentrin, esfenvalerate, etofenprox, fenpropatoline, fenvalerate, flucitrinate, flumethrin, fluvinate, taufulvalinate, halfenprox, hepta Flutrin, imiprothrin, cadreslin, meperfluthrin, monfluorotrin, permethrin, phenothrin Prallethrin, pyrethrins, resmethrin, silafluofen, tefluthrin, kappa Te full Trinh, tetramethrin, tetramethyl full Trinh, tralomethrin, transfluthrin, Benfurutorin, full Fen flufenprox, flumethrin, furamethrin, metofluthrin, the group consisting of profluthrin and dimefluthrin.
Subgroup a-3:
A group consisting of etiprol, fipronil, flufiprolol, afoxolanel, fluralanel, brofuranilide and floxamethamide.
Subgroup a-4:
A group consisting of chlorantraniliprole, cyantranylprolol, cyclaniliprol, fulvendiamide, tetraniprolol and cyhalodiamide.
Subgroup a-5:
Alanicarb, aldicarb, bendiocarb, benfuracarb, butocarboxym, butoxycarboxym, carbaryl, carbofuran, carbosulfan, ethiophene carb, fenobucarb, formethanate, furthiocarb, isoprocarb, methiocarb, mesomil, metolcarb, oxamyl, pyrimicarb, dioxycarb, propoxyl Group consisting of thiophanox, triazamate, trimetacarb, XMC and xylylcarb.
Subgroup a-6:
A group consisting of abamectin, fluenesulfone, thioxazaphene and fluazaindolizine.
Subgroup a-7:
Mycorrhizal fungi, Arthrobotris dacteroides, Bacillus thuringiensis, Bacillus films, Bacillus megaterium, Bacillus amyloliquefaciens, Hilstera rosiliensis, Hilstera minnesotensis, Monacrosporium fimatopagum, Pasteurian nisawae , Pasteuria penetrans, Pasteuria usgae, Verticillium chlamydosporium and Harpin protein.
Group (b):
A group consisting of the following subgroups b-1, b-2, b-3, b-4, b-5, b-6, b-7, b-8 and b-9.
Subgroup b-1:
Azaconazole, viteltanol, bromconazole, cyproconazole, difenoconazole, dinicoazole, diniconazole M, epoxiconazole, etaconazole, phenalimol, fenbuconazole, fluquinconazole, quinconazole, flusilazole, flutriazole, hexaconazole, imazalil, Imibenconazole, ipconazole, metconazole, microbutanyl, nuarimol, oxpoconazole, oxpoconazole fumarate, pefazoate, penconazole, prochloraz, propiconazole, prothioconazole, pyrifenox, pyrisoxazole, cimeconazole, tebuconazole, tetrabuconazole Conazole, triadimephone, triadimenol, triflumizole, trifolin and tritico A group consisting of nasol.
Subgroup b-2:
Azoxystrobin, cumoxystrobin, dimoxystrobin, enoxastrobin, famoxadone, fenamidone, phenaminestrobin, fluphenoxystrobin, floxastrobin, cresoxime-methyl, mandestrobin, methinostrobin, A group consisting of orissastrobin, picoxystrobin, pyraclostrobin, pyramethostrobin, pyroxystrobin, trifloxystrobin, pyribencarb, triclopyricarb, cyazofamide and amisulbrom.
Subgroup b-3:
A group consisting of benalaxyl, benalaxyl M, furaxyl, metalaxyl, metalaxyl M, oxadixyl and oflase.
Subgroup b-4:
Benodanyl, benzobindiflupyr, bixaphene, boscalid, carboxin, fenfram, fluopyram, flutolanil, fluxapyroxad, furametopyr, isophetamide, isopyrazam, mepronil, oxycarboxyl, pentiopyrad, penflufen, cedaxane, tifluzamide, pyradiflumide Phen, 3-difluoromethyl-1-methyl-N- (1,1,3-trimethylindan-4-yl) pyrazole-4-carboxamide, 3-difluoromethyl-1-methyl-N-[(3R) -1 , 1,3-Trimethylindan-4-yl] pyrazole-4-carboxamide, 3-difluoromethyl-N- (7-fluoro-1,1,3-trimethylindan-4-yl) -1-methylpyrazole-4 -Carboxa 3-difluoromethyl-N-[(3R) -7-fluoro-1,1,3-trimethylindan-4-yl] -1-methylpyrazole-4-carboxamide and N-cyclopropyl-3- (difluoro A group consisting of (methyl) -5-fluoro-N- (5-chloro-2-isopropylbenzyl) -1-methyl-1H-pyrazole-4-carboxamide.
Subgroup b-5:
The group consisting of benomyl, carbendazim, fuberidazole, thiabendazole, thiophanate, thiophanate methyl, dietofencarb, zoxamide and ethaboxam.
Subgroup b-6:
A group consisting of felbam, manzeb, manneb, methyle, propineb, thiuram, dineb, ziram, captan, captahol, holpet, chlorothalonil, tolylfluanid, guazatine, iminotadine, anilazine, dithianone, quinomethionate and fluorimide.
Subgroup b-7:
A group consisting of dimethomorph, flumorph, pyrimorph, bench avaricarb, bench avaricarb isopropyl, iprovaricarb, varifenalate and mandipropamide.
Subgroup b-8:
A group consisting of fenpiclonyl, fludioxonil, clozolinate, iprodione, procymidone and vinclozolin.
Subgroup b-9:
The group consisting of toluclophosmethyl, oxathiapiproline, picalbutrazox, fluopicolide and silthiofam. - 前記群(a)より選ばれる1種以上の化合物を含有し、前記式(I)で示される化合物又はそのNオキシド化合物と、前記群(a)より選ばれる1種以上の化合物との含有量の比が、重量比で100:1~1:100である請求項1に記載の有害生物防除組成物。 A content of one or more compounds selected from the group (a), the compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (a) The pesticidal composition according to claim 1, wherein the ratio of is from 100: 1 to 1: 100 by weight.
- 前記群(a)より選ばれる1種以上の化合物を含有し、前記式(I)で示される化合物又はそのNオキシド化合物と、前記群(a)より選ばれる1種以上の化合物との含有量の比が、重量比で10:1~1:10である請求項1に記載の有害生物防除組成物。 A content of one or more compounds selected from the group (a), the compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (a) 2. The pest control composition according to claim 1, wherein the ratio of is 10: 1 to 1:10 by weight.
- 前記群(b)より選ばれる1種以上の化合物を含有し、前記式(I)で示される化合物又はそのNオキシド化合物と、前記群(b)より選ばれる1種以上の化合物との含有量の比が、重量比で10000:1~1:100である請求項1に記載の有害生物防除組成物。 A content of one or more compounds selected from the group (b), a compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (b) The pesticidal composition according to claim 1, wherein the ratio is from 10,000: 1 to 1: 100 by weight.
- 前記群(b)より選ばれる1種以上の化合物を含有し、前記式(I)で示される化合物又はそのNオキシド化合物と、前記群(b)より選ばれる1種以上の化合物との含有量の比が、重量比で1000:1~1:10である請求項1に記載の有害生物防除組成物。 A content of one or more compounds selected from the group (b), a compound represented by the formula (I) or an N oxide compound thereof, and one or more compounds selected from the group (b) The pesticidal composition according to claim 1, wherein the ratio of is from 1000: 1 to 1:10 by weight.
- 請求項1~5のいずれかに記載の有害生物防除組成物の有効量を、有害生物又は有害生物の生息場所に施用する工程を有する有害生物の防除方法。 A method for controlling pests, comprising a step of applying an effective amount of the pest control composition according to any one of claims 1 to 5 to pests or habitats of pests.
- 請求項1~5のいずれかに記載の有害生物防除組成物の有効量を、植物又は植物を栽培する土壌に施用する工程を有する有害生物の防除方法。 A method for controlling pests, which comprises a step of applying an effective amount of the pest control composition according to any one of claims 1 to 5 to a plant or soil for growing the plant.
- 請求項1~5のいずれかに記載の有害生物防除組成物の有効量を、種子又は球根に施用する工程を有する有害生物の防除方法。 A method for controlling pests, which comprises a step of applying an effective amount of the pest control composition according to any one of claims 1 to 5 to seeds or bulbs.
- 請求項1~5のいずれかに記載の有害生物防除組成物の有効量を保持している種子又は球根。 Seeds or bulbs holding an effective amount of the pest control composition according to any one of claims 1 to 5.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015-214016 | 2015-10-30 | ||
JP2015214016 | 2015-10-30 | ||
JP2016-144452 | 2016-07-22 | ||
JP2016144452 | 2016-07-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2017073733A1 true WO2017073733A1 (en) | 2017-05-04 |
Family
ID=58631730
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2016/082078 WO2017073733A1 (en) | 2015-10-30 | 2016-10-28 | Pest control composition and use thereof |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2017073733A1 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018101424A1 (en) * | 2016-12-01 | 2018-06-07 | 住友化学株式会社 | Heterocyclic compound, and arthropod pest control composition containing same |
WO2019004082A1 (en) * | 2017-06-26 | 2019-01-03 | 日本曹達株式会社 | Heteroaryl pyrimidine compound and pest control agent |
CN109222202A (en) * | 2018-09-28 | 2019-01-18 | 河南中烟工业有限责任公司技术开发分公司 | A kind of method that bioanalysis prepares low polycyclic aromatic hydrocarbon reconstituted tobacoo |
WO2020178789A1 (en) | 2019-03-07 | 2020-09-10 | Pi Industries Ltd. | Fused heterocyclic compounds and their use as pest control agents |
GB2608704A (en) * | 2021-07-06 | 2023-01-11 | Inst Of Economic Crops Hubei Academy Of Agricultural Sciences | Fungicide combination for controlling mulberry fruit sclerotiniosis disease and control method |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000026421A (en) * | 1998-01-29 | 2000-01-25 | Kumiai Chem Ind Co Ltd | Diaryl sulfide derivative and pest controlling agent |
JP2000198768A (en) * | 1998-04-27 | 2000-07-18 | Kumiai Chem Ind Co Ltd | 3-arylphenyl sulfide derivative and insecticide/miticide |
WO2012106495A1 (en) * | 2011-02-03 | 2012-08-09 | E. I. Du Pont De Nemours And Company | Mesoionic pesticides |
JP2013060420A (en) * | 2011-08-23 | 2013-04-04 | Ishihara Sangyo Kaisha Ltd | Noxious organism controller |
WO2016121970A1 (en) * | 2015-01-30 | 2016-08-04 | 住友化学株式会社 | Bipyridine compound and use of same for noxious arthropod control |
WO2016121969A1 (en) * | 2015-01-30 | 2016-08-04 | 住友化学株式会社 | Bipyridine compound and use of same for noxious arthropod control |
-
2016
- 2016-10-28 WO PCT/JP2016/082078 patent/WO2017073733A1/en active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000026421A (en) * | 1998-01-29 | 2000-01-25 | Kumiai Chem Ind Co Ltd | Diaryl sulfide derivative and pest controlling agent |
JP2000198768A (en) * | 1998-04-27 | 2000-07-18 | Kumiai Chem Ind Co Ltd | 3-arylphenyl sulfide derivative and insecticide/miticide |
WO2012106495A1 (en) * | 2011-02-03 | 2012-08-09 | E. I. Du Pont De Nemours And Company | Mesoionic pesticides |
JP2013060420A (en) * | 2011-08-23 | 2013-04-04 | Ishihara Sangyo Kaisha Ltd | Noxious organism controller |
WO2016121970A1 (en) * | 2015-01-30 | 2016-08-04 | 住友化学株式会社 | Bipyridine compound and use of same for noxious arthropod control |
WO2016121969A1 (en) * | 2015-01-30 | 2016-08-04 | 住友化学株式会社 | Bipyridine compound and use of same for noxious arthropod control |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018101424A1 (en) * | 2016-12-01 | 2018-06-07 | 住友化学株式会社 | Heterocyclic compound, and arthropod pest control composition containing same |
US11632955B2 (en) | 2016-12-01 | 2023-04-25 | Sumitomo Chemical Company, Limited | Heterocyclic compound and harmful arthropods control agent comprising the same |
WO2019004082A1 (en) * | 2017-06-26 | 2019-01-03 | 日本曹達株式会社 | Heteroaryl pyrimidine compound and pest control agent |
US11427564B2 (en) | 2017-06-26 | 2022-08-30 | Nippon Soda Co., Ltd. | Heteroaryl pyrimidine compound and pest control agent |
CN109222202A (en) * | 2018-09-28 | 2019-01-18 | 河南中烟工业有限责任公司技术开发分公司 | A kind of method that bioanalysis prepares low polycyclic aromatic hydrocarbon reconstituted tobacoo |
CN109222202B (en) * | 2018-09-28 | 2021-04-09 | 河南中烟工业有限责任公司技术开发分公司 | Method for preparing low polycyclic aromatic hydrocarbon tobacco sheets by biological method |
WO2020178789A1 (en) | 2019-03-07 | 2020-09-10 | Pi Industries Ltd. | Fused heterocyclic compounds and their use as pest control agents |
GB2608704A (en) * | 2021-07-06 | 2023-01-11 | Inst Of Economic Crops Hubei Academy Of Agricultural Sciences | Fungicide combination for controlling mulberry fruit sclerotiniosis disease and control method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11905271B2 (en) | Pyrazine compound | |
JP6953406B2 (en) | Heterocyclic compounds and harmful arthropod control agents containing them | |
JP7492946B2 (en) | Heterocyclic compound and pest control composition containing the same | |
JP2016511220A (en) | Pest control composition and use thereof | |
WO2017073733A1 (en) | Pest control composition and use thereof | |
JP2017075161A (en) | Pest control composition and use therefor | |
WO2017090654A1 (en) | Pest control composition and use thereof | |
WO2017164108A1 (en) | Heterocyclic compound | |
JP2017039751A (en) | Pest control composition and application thereof | |
JP2016222720A (en) | Pest control composition and application thereof | |
JP2017031193A (en) | Pest control composition and application thereof | |
JP2017043627A (en) | Pest control composition and application thereof | |
JP2018016593A (en) | Pest control composition and pest control method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 16859961 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 16859961 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: JP |