WO2017067542A1 - Dispositif et procédé pour mesurer l'épaisseur d'un échantillon plat - Google Patents

Dispositif et procédé pour mesurer l'épaisseur d'un échantillon plat Download PDF

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Publication number
WO2017067542A1
WO2017067542A1 PCT/DE2016/100487 DE2016100487W WO2017067542A1 WO 2017067542 A1 WO2017067542 A1 WO 2017067542A1 DE 2016100487 W DE2016100487 W DE 2016100487W WO 2017067542 A1 WO2017067542 A1 WO 2017067542A1
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Prior art keywords
measuring
sample
light
measuring head
reflector
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PCT/DE2016/100487
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German (de)
English (en)
Inventor
Martin SCHÖNLEBER
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Precitec Optronik Gmbh
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Publication of WO2017067542A1 publication Critical patent/WO2017067542A1/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material

Definitions

  • the present invention relates to a Messvorrich ⁇ device and a method for measuring the thickness of a flat, in particular a plate or sheet-shaped sample.
  • DE 10 2010 000 757 AI discloses such a measuring device for measuring the thickness of plate-shaped parts.
  • the device has at least two measuring devices each with a measuring head for detecting a respective distance to the surface of the part facing the respective measuring head.
  • the measuring devices each have a measuring beam and a reference beam, so that the two measuring beams and the two reference beams are evaluated together.
  • the object of the present invention is to provide a measurement device and a method for measurement, which allow to determine an absolute thickness of flat, in particular plate or foil-shaped sample in a simple and reliabil ⁇ SiGe with high accuracy.
  • this object is achieved by a measuring device for measuring the thickness of a flächi ⁇ gen sample up a a fluid optical medium pointing and formed for receiving the sample optical measuring path between a measuring head and a reflector encompassed.
  • the measuring head has a window with an outer surface and is ⁇ rich, in which the sample is at least partially transparent, formed for emitting and receiving a light from a broadband light source in a coherent areas of the spectrum.
  • an evaluation unit for determining a thickness of the sample is provided by means of analyzing interference in a broadband Spekt ⁇ ral Scheme between the outer surface (30) of the window (8) and from the reflector or from the surfaces of the sample re ⁇ inflected partial waves of the light ,
  • a broadband light source is understood to be a light source emitting in a broad spectral range, which may be a spectral broadband light source but also a narrowband light source that can be tuned in a wide spectral range.
  • a spatial coherence is meant in the sense in the case of spectral broadband light source that which example ⁇ example only Gaussian modes or many Gauss-Laguerre modes aufwei ⁇ sen by a spectral fanning of the Lich ⁇ tes in sufficiently narrow spectral ranges, interferometric measurements of path differences in the mm range can be carried out.
  • a wavelength-tunable light source swept source
  • this is understood to mean sufficient temporal coherence, which allows a swept source OCT (optical coherence tomography) to be carried out.
  • the absolute thickness of the sheet-like sample can be determined with high accuracy by Ge ⁇ a one-sided optical measurement.
  • the measuring device is designed such that measurements can be carried out in a first measurement state and in a second measurement state, wherein in the first measurement state, an optical layer thickness of the measurement ⁇ distance with the optical medium without sample is measurable and in the second state of measurement an optical layer thickness of the optical ⁇ 's medium between the sample and the measuring head and an optical layer thickness of the optical medium between the sample and the reflector can be measured.
  • the measuring device can be designed such that plate-shaped or foil-shaped individual samples are transversely through with the aid of a conveyor belt the measuring section can be pulled.
  • the optical film thickness sO be measured in the time intervals ⁇ when just no sample in the beam path of the measuring section is located.
  • the optical layer thicknesses sl and s2 of opti ⁇ 's medium on both sides of the sample are measured.
  • the measurement path is pivotally gela ⁇ Gert, so that in case of an endless belt-shaped sample, which is drawn across the measuring distance, reciprocate the measurement path through the sample and can be swung forth. At the reversal ⁇ points of pivotal movement, which are outside the sample region, it can be measured, while in the central Be ⁇ area of the pivot path, the optical layer thicknesses sl and s2 of the optical medium can be measured on both sides of the sample.
  • the measuring section is rigid, in which the measuring head and the reflector are held against each other by means of a preferably ⁇ Zerodur holder on a konstan ⁇ th precisely known distance dO.
  • the rigid design of the measuring section is particularly well suited for thin specimens that can be picked up without lengthening the measuring section between the measuring head and the reflector. Since at ⁇ be in the first measuring condition, ie when the bridge is Messstre ⁇ free from the sample, measurements performed only for determining the refractive index of the optical medium.
  • a plate with egg ⁇ ner recess for holding the sample is provided which holds the sample in the gap between the upper and the lower Garplat ⁇ th.
  • Layer thicknesses of the optical medium on both sides of the Pro ⁇ be kept constant during the measurement, whereby the Reprodu ⁇ zierraj the measurement is increased, for example, if you want to perform several series of measurements at the same points of the sample.
  • the second ter reflector on the measuring head facing side of the sample preferably on the first support surface, are.
  • the measuring device has a second measuring path between a second measuring head and a second reflector for determining a refractive index n of the optical medium, wherein at least part of a light emitted by the second measuring head and reflected back by the second reflector from the second Measuring head is detected.
  • a dedicated second measuring section for determining the refractive index of the optical medium which can be specially designed for the determination of the refractive index of the optical medium, so that the actual refractive ⁇ index of the optical medium in an independent measurement may be determined pre ⁇ zie.
  • the second reflector comprises at least two reflective surfaces and a space with a known geometric height for receiving the optical medium.
  • the current index of refraction of the optical medium n is the ratio of a spektralinterfe- rometrisch determined optical space height to the known geo ⁇ metric space height sR / dR immediately determinable.
  • the second re ⁇ Flektor reference is made level.
  • the reference stage has a first reflective surface, a second reflective surface, and a step edge having a known step height dR, wherein light reflected back from the first reflective surface and light reflected back from the second reflective surface are detectable by the second sensing head
  • the actual refractive index of the optical medium n can be determined directly from the ratio of a spectrally interferometrically determined optical step height to the known geometric step height sR / dR.
  • the light beam of the second measuring head is so dimensioned and oriented that the returned light reflected by the first reflective surface and the light josreflek ⁇ struck from the second reflective surface light from the second measuring head are simultaneously detected. This can be done, for example, by an alignment of the light beam ⁇ to the stage name, so that due to the finite cross section of the light beam both reflect ⁇ the surfaces at least partially detected by the light beam ⁇ who.
  • the examples the reflecting surfaces of the second reflector foundedre ⁇ inflected of the portions can be detected separately in time. This may for example by a temporary lateral - carried bezüg ⁇ Lich of the measuring head displacement of the second reflector - so for Strah ⁇ beam path perpendicular.
  • the reference level has a high-accuracy known geometric step height, so that the current value of the refractive index of the optical medium, which is generally wavelength, composition and temperature dependent, can be determined with high accuracy, whereby an accurate determination of the Thickness of the sample is possible.
  • the geometric step height of the reference step is in the range of 50 pm to 5000 pm, in particular in the range of 100 pm to 1000 pm.
  • the corresponding one of the geometrical step height optical step height of the optical medium can be determined interferometrically reliably eindeu ⁇ term manner.
  • holding surfaces are provided with gripping plates for vertical positioning and mounting of the sample, wherein the gripping plates have recesses for passage of light at suitable locations.
  • air is provided as the fluid optical medium.
  • a liquid optical medium such as water or oil, can be used.
  • the optical properties of the air are relatively well known and have little variation.
  • the implementation of measurements in the air with little experimen ⁇ tellem effort is possible.
  • the second reflector ⁇ tor is constructed as a double Fabry-Perot interferometer having a first air-filled resonator path and a second evacuated resonator path, the two paths are the same length and whose length is preferential ⁇ way with a Zerodur holder is substantially constant hold ⁇ ge.
  • the two resonators are designed so that the light reflected back from the resonators light components (analogous to the case with the reference level) can be brought to interference.
  • the light waves ⁇ lengths of the broadband coherent light source in the near infrared range preferably in the wavelength range of 950 nm to 2000 nm, in particular in the wavelength range of 1000 nm to 1200 nm.
  • various materials, insbeson ⁇ particular semiconductor materials for example, Si wafer
  • the broadband coherent light source may be selected from a group consisting of a light emitting diode, a semi- conductor superluminescent diode, an ASE source (optically pumped fiber based amplified spontaneous emission source), egg ⁇ nem optically pumped photonic crystal laser, and a tunable semiconductor quantum dot laser.
  • a spectrometer for determining the spectrum of the captured by the measuring head Lich ⁇ tes is provided.
  • the use of the spectrometer makes it possible to use broadband light sources that are not tunable in the relevant spectral range.
  • the spectrometer on an optical grating adapted to fanning of the spectral distribution detected by the measuring head reflectors ⁇ oriented radiation.
  • the optical grating is well suited to spectrally fan out the light spectrum in the near-infrared range.
  • the optical spectrum of the head detected by the measuring head is determined. th light with the aid of a photodetector, which measures the light intensity at different times I (t) and outputs to the evaluation unit for evaluation.
  • the Spekt ⁇ rum I ( ⁇ ) of the detected light from the measuring head can then be based on a known time dependence of the light wavelength of the swept source A (t) determined by the evaluation unit ⁇ the.
  • the measuring head is arranged in a hermetically sealed housing which has a window transparent to the light of the light source.
  • the measuring head can thus be used together with the window in the recess provided in the first holding surface.
  • the hermetically sealed housing protects the measuring head from external influences, such as the penetration of dust particles or the fluid optical medium.
  • the Messvor ⁇ direction on several sampling lengths so that a sample can be measured simultaneously equal ⁇ time at multiple locations or multiple samples.
  • the thickness inhomogeneity or thickness distribution of the sample or several samples can be measured in a very short time.
  • a method for measuring a thickness of a flat sample comprising the steps of: - emitting the multi-wavelength broadband coherent light from the measuring head;
  • Determining a thickness of the sample by analyzing the back-reflected light detected by the measuring head using an optical spectrometric interferometric method.
  • the method allows to carry a one-sided optical Mes ⁇ solution the absolute sample thickness with high accuracy to be ⁇ agree.
  • the reflected-back light is received in the first measurement state and in the second measurement state.
  • an optical thickness So of the optical ⁇ 's medium between the measuring head and the reflector can be determined and in the second measuring optical state Di ⁇ CKEN sl and s2 of the optical medium can be identified on both sides of the sample.
  • the light reflected back from the second reflector is detected by the second measuring head to determine the refractive index of the optical medium.
  • the optical layer thicknesses and the Brechungsin ⁇ dex of the optical medium are ge ⁇ measured with different measurement heads, which simplifies the holding apart of various measurement signals and the subsequent analysis.
  • the light waves ⁇ lengths of the broadband light source in the near infrared range preferably in the wavelength range of 950 nm to 2000 nm, in particular in the wavelength range of 1000 nm to 1200 nm.
  • insbeson ⁇ particular semiconductor materials (for example, Si wafer) which come into question for the examination, optically transparent.
  • the broadband kozza ⁇ pension light source may be selected from a group consisting of a light emitting diode, a semiconductor superluminescent
  • Diode an optically pumped fiber-based amplified spontaneous emission source (ASE), an optically pumped pho- tonic crystal laser and a tunable semiconductor quantum dot laser.
  • ASE amplified spontaneous emission source
  • optically pumped pho- tonic crystal laser an optically pumped pho- tonic crystal laser and a tunable semiconductor quantum dot laser.
  • These light sources are well suited as light sources in the near infrared range.
  • the method comprises detecting the optical step height of the optical medium based on a measurement at the reference stage.
  • the detection of the optical step height of the optical medium takes place based on a measurement at the reference level with the second measuring head.
  • the geometric step height is previously determined in air with a monochrome interferometer.
  • the offset of the interference strips provides the Pha ⁇ senverschiebung ⁇ modulo 2n or the geometrical step height dR modulo K / 2.
  • the step height determined already on the basis of a preliminary measurement already carried out in advance with a minimum accuracy of K / 2 can be determined with high precision.
  • the spektra ⁇ linterferometrische method includes fanning of the spectral Distribution of the detected radiation from the measuring head under USAGE ⁇ dung an optical grating.
  • the optical grating is well suited to spectrally fan out the light spectrum in the near-infrared range.
  • the reflection spectrum of the light received by the measuring head is measured as a function of the wavelengths I ( ⁇ ) by means of an array of photodetectors in the spectrometer and a spectrum
  • a dispersion compensation is performed on the refractive index.
  • the method is used in the He ⁇ averaging the refractive index of the optical medium interferometer performed meter phase determination.
  • an FFT filter method is carried out, in which first in the complex Fourier spectrum an environment around a certain one
  • Layer thickness peak is cut out and the rest of the spectrum is set to zero.
  • the interferometer phase can be extracted directly from peaks of the complex Fourier spectrum.
  • n_measured ( ⁇ ) n ( ⁇ ) + N * ( ⁇ / dR)
  • a Mes ⁇ solution of the optical layer thickness of the optical medium it is alternatively or additionally carried out with the measurement in the vacuum at the corresponding geometric layer thickness.
  • the required absolute accuracy in measuring the Bre ⁇ chung indexes depends on the required accuracy of the di ⁇ ckenbetician the sample.
  • a target accuracy of the thickness measurement of the sample of 100 ppm
  • an absolute accuracy of the optical step height measurement of 1 nm is the minimum step height 10 pm.
  • the maximum step height is chosen for uniqueness considerations and depends on how accurately you can determine the step height or the refractive index in a pre-measurement.
  • the interferometric uniqueness range depends on the wavelength and the refractive index of the medium from X / (2 * n). In ⁇ example, at a wavelength of 1.1 pm and at Bre- index of 1.33 (water) gives 0.42 pm or 4.2 parts per thousand of step height.
  • the measurement method described allows measurements in different under ⁇ union accuracy classes - 1000 ppm (coarse Messun ⁇ gen) to 1 ppm (ultra-precise measurements) - to carry out.
  • the individual process steps can be carried out as required, that is, depending on the required accuracy of measurement.
  • an air gap of known thickness is additionally measured and subjected ei ⁇ ner phase evaluation.
  • a real-time calibration of the spectrometer can be carried out, whereby measurement inaccuracies caused by any drifts can be reduced.
  • Spectrometer both during a measurement and between two measuring operations are performed.
  • the calibration can be carried out as required, so that the measuring time can be used more efficiently, in particular in the case of spectrometers which have low or slow drifts.
  • Ver ⁇ same measurement is performed at a reference level in air for control and for adjusting a temperature-dependent spectrometer.
  • measurements are first stage at a reference - in particular ⁇ sondere at the intended in the second reflector Refe ⁇ ence level or at an identical to reference stage - performed in the air at different temperatures of the Ausenseein ⁇ standardized under detection of the local temperature in the Auswer ⁇ teech.
  • the captured data for temperature dependence of the Auswer ⁇ teech can then be stored in a memory unit and read out in the evaluation of the measurement signals of the evaluation unit. In this way, the effects of temperature fluctuations on measurement results during evaluation can be taken into account and compensated.
  • FIG. 1 schematically shows an optical measuring path in a first measuring state according to an embodiment of the invention.
  • Fig. 2 shows schematically the optical measuring path according to
  • Fig. 1 in a second state of measurement.
  • Fig. 3 shows schematically a measuring device according to a
  • FIG. 4 shows schematically a measuring device according to a further embodiment of the invention.
  • FIG. 1 schematically shows an optical measuring path in a first measuring state according to an embodiment of the invention.
  • the optical measuring section 5 is formed by a measuring head 6 and a reflector 7. Between the measurement head 6 and the Re ⁇ Flektor 7 a fluid transparent optical medium 14 is provided. In this embodiment of the invention, air is provided as the optical medium 14.
  • the measuring head 6 has a transparent window 8 with an outer surface 30 and is designed to emit and receive the light from a broadband coherent light source.
  • the measuring section 5 between the measuring head 6 and the reflector 7 is kept free of the sample.
  • the light emitted from the measuring head 6, represented by the arrow A, is reflected by the reflector 7 lying opposite the measuring head 6 back to the measuring head 6.
  • a part of the back-reflected light, represented by the arrow B, can be detected by the measuring head 6.
  • the reflector 7 is formed in this example as a reflective plate.
  • the sample 1 Since, in the measuring state shown in FIG. 1, the sample 1 is not in the light path between the measuring head 6 and the reflector plate 7, the air-filled distance between the window 8 and the reflector 7 can be measured directly by spectral interferometry .
  • FIG. 2 shows schematically the optical measuring path according to FIG. 1 in a second measuring state.
  • the sample 1 is within half of the measuring section 5.
  • the sample 1 has an upper Oberflä ⁇ che 15 and a lower surface 16 and a thickness to be determined dp.
  • the light emitted from the measuring head 6 is reflected back from the first surface 15 of the sample 1, from the first surface 15 opposite the second surface 16 of the sample 1 and from the reflector 7.
  • the measurement head 6 is in particular ⁇ sondere formed to emit the coherent light meh ⁇ of exemplary wavelengths and for receiving at least a portion of one of the of the reflector 7 and from the sample 1, in particular from an upper surface 15 and a lower surface 16 Sample 1, reflected light.
  • the beam path is shown schematically schematically with thin arrows.
  • the geometrical air layer thicknesses between the sample 1 and the measuring head 6 or between the sample 1 and the reflector 7 are marked accordingly by d 1 or d 2.
  • FIG 3 shows schematically the measuring device according to an embodiment of the invention.
  • the measuring device 45 has the optical measurement section 5 Zvi ⁇ rule a measuring head 6, and a reflector. 7
  • the reflector ⁇ tor 7 is formed in this example as a reflector plate.
  • the measuring device 45 has a broadband coherent
  • the light source 17 may be a broadband spectral light source or a tunable laser source configured to emit coherent light of multiple wavelengths in a near infrared region.
  • the light source 17 can be tunable by means of oscillating micromechanics (oscillation micromechanics).
  • the measurement head 6 is designed to emit the light from the broad-band coherent light source 17 and are received, ⁇ gene.
  • the probe 6 is arranged in a housing 18.
  • KoHo ⁇ rentes light from the light source 17 and at least a part of the re ⁇ inflected radiation pass through through a window 8 of the housing 18, in which the window 8 is transparent for the light of the light source 17th
  • the window 8 is transparent to infrared light.
  • the evaluation unit 24 is provided for determining the thickness of the sample 1 by means of analyzing broadband spectral interferences .
  • the measuring device 45 further comprises a second optical measuring path 5 ⁇ 'between a second head 6' and a two- ⁇ th reflector 7 'below the sample 1 to determine the Bre ⁇ deviation index of the air.
  • the second measuring head 6 ' has a window 8 ' with an outer surface 30 ' . At least part of the light emitted by the second measuring head 6 ' and reflected back by the second reflector 7 ' is detected by the second measuring head 6 ' . This is verdeut by arrows A 'and B' ⁇ light.
  • the measuring device 45 has an upper holding surface 2 and a lower holding surface 3.
  • Sample 1 having an upper surface 15 and upper ⁇ with a lower surface 16 is in a gap 4 between the support surfaces 2 and 3 in a special holder (not shown) is mounted.
  • the upper support surface 2 has recesses 11 and 11 'for on ⁇ acquisition of the measuring heads 6 and 6'.
  • the lower holding surface has recesses 13 and 13 ' for receiving reflectors 7 and 7 ' .
  • the second reflector 7 ' in the form of a reference stage 26 is formed. This results in an air-filled level for reference measurements to determine the actual refractive index of the air, which can generally vary in temperature, pressure and humidity.
  • the actual refractive index of the air may deviate from a nominal value, also due to air contamination.
  • the reference level one Materi al ⁇ used with low thermal expansion coefficient.
  • the reference level 26 may also be made of a material with an even lower coefficient of thermal expansion.
  • the reference stage is designed as a Zerodur glass reference stage (ZERODUR RTM ) with ei ⁇ nem thermal expansion coefficient almost equal to zero.
  • ZRODUR RTM Zerodur glass reference stage
  • the measurement head 6 ' is connected to the spectrometer 19 by means Lichtwel ⁇ lenleiter 21' coupled or connected to, the light waves are dimensioned ⁇ conductors 21 and 21 'different in order Sig ⁇ nalüberschen between different measuring heads to mini ⁇ mieren.
  • the second reflector 7 ' has a first reflective surface 9 and a second reflective surface 10. Between reflecting surfaces 9 and 10 is a space (not Darge ⁇ represents) with a known height for receiving the optical medium is provided.
  • a space not Darge ⁇ represents
  • a layer of the optical ⁇ 's medium containing a known layer thickness for reference measurements obtained for determining the actual refractive index of the optical medium, the temperature may vary in general, and together ⁇ men
  • the measuring head 6 is coupled or connected to a spectrometer 19 by means of optical waveguides 21, 23.
  • An optical coupler 20 couples the light source 17 by means of the first optical fiber 21 and a second Lichtwel ⁇ lenleiters 22 connecting the optical coupler 20 to the light source 17, 6 to the measuring head, the coherent light of the
  • Light source 17 is provided to the measuring head 6 via the second Lichtwel ⁇ lenleiter 22, the optical coupler 20 and the first light ⁇ waveguide 21. Of the upper and the lower surfaces 15, 16 is so ⁇ as by the reflector plate 7 radiation reflected back to the spectrometer 19 of the measuring device 45 via the ers ⁇ th light waveguide 21 and a third optical waveguide 23, the optical coupler 20 to the spectrometer 19 couples, provided.
  • the spectrum of the reflected radiation is measured by means of an array of photodetectors (not shown) in the spectrometer as a function of the wavelengths I ( ⁇ ) and an evaluation device 24 by means of a Sig ⁇ naltechnisch 25, which couples the spectrometer 19 with the Ausretevor- device 24 , provided.
  • FIG. 4 schematically shows another embodiment of the He ⁇ invention.
  • the measuring device 45 'of FIG. 4 is partly identical ⁇ table with the measurement device 45 of Fig. 3 and also has ei ⁇ ne second measuring section 5' with a second head 6 'and a second reflector 7''for determining the refractive Sinde ⁇ xes of the air.
  • the measuring section 5 ' is formed so that at least a part of the of the second head 6' out sand ⁇ th and second by the reflector 7 '' the light reflected back from the second head 6 'is detected. This is illustrated by arrows A ' and B ' .
  • the second reflector 7 '' above the sample is arranged and formed is shown in the form ei ⁇ nes double Fabry-Perot interferometer, a first air-filled resonator path (27) and a two ⁇ te evacuated resonator path (28), wherein the two resonator paths (27, 28) are the same length.
  • the outer reflecting surfaces 9 '' and 10 '' of the reflector 7 '' at the same time represent Lichteinlingers- or Lichtaustrittsfens ⁇ ter of each Fabry-Perot resonator.
  • the reference level one Materi al ⁇ used with low thermal expansion coefficient.
  • a corresponding sensor system with corresponding sensors can be provided at the measuring points.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

Dispositif pour mesurer une épaisseur d'un échantillon (1) plat, qui présente un trajet de mesure optique (14) entre une tête de mesure (6) et un réflecteur (7), comportant un milieu optique (14) transparent, fluide. La tête de mesure (6) présente une fenêtre (8) pourvue d'une face extérieure (30) et est conçue pour émettre et recevoir une lumière d'une source lumineuse (17) cohérente à large bande, dans une bande spectrale dans laquelle l'échantillon est au moins partiellement transparent. Au moins une partie de la lumière émise par la tête de mesure (6) et réfléchie par le réflecteur (7) ou les surfaces (15, 16) de l'échantillon (1) peut être détectée par la tête de mesure (6), de façon à permettre la détermination d'un spectre de réflexion de la lumière réfléchie, détectée par la tête de mesure (6). Ce dispositif présente une unité d'évaluation (24) servant à déterminer une épaisseur de la tranche de l'échantillon (1) par analyse d'interférences dans une bande spectrale large entre des ondes partielles de la lumière, réfléchies par la face extérieure (30) de la fenêtre (8) et par le réflecteur (7) ou les surfaces (15, 16) de l'échantillon (1).
PCT/DE2016/100487 2015-10-22 2016-10-19 Dispositif et procédé pour mesurer l'épaisseur d'un échantillon plat WO2017067542A1 (fr)

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DE102015118069.3 2015-10-22
DE102015118069.3A DE102015118069B4 (de) 2015-10-22 2015-10-22 Messvorrichtung und Verfahren zur Messung der Dicke einer flächigen Probe

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US20020044283A1 (en) * 2000-09-01 2002-04-18 Masahiro Kuroiwa Cell thickness detection method, cell thickness control system, and manufacturing method for liquid crystal device
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CN110595422A (zh) * 2019-07-15 2019-12-20 上海市质量监督检验技术研究院 一种楼板测厚仪自动检测机构
CN110595422B (zh) * 2019-07-15 2024-05-10 上海市质量监督检验技术研究院 一种楼板测厚仪自动检测机构

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