WO2017056763A1 - Photosensitive relief printing original plate - Google Patents

Photosensitive relief printing original plate Download PDF

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Publication number
WO2017056763A1
WO2017056763A1 PCT/JP2016/073927 JP2016073927W WO2017056763A1 WO 2017056763 A1 WO2017056763 A1 WO 2017056763A1 JP 2016073927 W JP2016073927 W JP 2016073927W WO 2017056763 A1 WO2017056763 A1 WO 2017056763A1
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WO
WIPO (PCT)
Prior art keywords
layer
original plate
photosensitive
photosensitive resin
water
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PCT/JP2016/073927
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French (fr)
Japanese (ja)
Inventor
和也 芳本
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東洋紡株式会社
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Priority to JP2016557669A priority Critical patent/JP6768217B2/en
Publication of WO2017056763A1 publication Critical patent/WO2017056763A1/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Definitions

  • the present invention relates to a photosensitive relief printing original plate used for producing a relief printing plate by computer plate making technology.
  • CTP technology computer plate making technology
  • digital image forming technology is a method of obtaining an uneven pattern serving as a relief by forming an image mask directly on a printing plate with digital data and then exposing from the image mask side.
  • a negative film which is conventionally used, is replaced with a mask that is formed and integrated in a printing plate in order to cover an area that should not be polymerized.
  • An image mask is obtained by providing an infrared sensitive layer (heat sensitive mask layer) opaque to actinic radiation on a photosensitive resin layer and decomposing and ablating the infrared sensitive layer with an infrared laser as a method for obtaining this integrated mask.
  • the method of forming is widely used (see Patent Document 1).
  • the divided layer can withstand laser ablation.
  • the thermal mask layer is ablated by the infrared laser, the adjacent divided layers are exposed to a high temperature, and the thermal damage particularly at the overlapping portion of the laser light path becomes significant.
  • the damaged divided layer is locally ablated and excavated at the overlapping portion of the laser optical path, resulting in uneven thickness of the divided layer or discontinuity of the divided layer.
  • the oxygen permeability of the divided layer varies, and local polymerization inhibition is given when the photosensitive resin layer is exposed.
  • a photosensitive resin plate exposed under non-uniform oxygen conditions causes fine roughness such as irregularities, undulations, and wrinkles on the plate surface, resulting in a decrease in print quality.
  • Patent Document 2 proposes a photosensitive resin relief printing original plate having an oxygen-permeable dividing layer as a photosensitive relief printing original plate in which CTP technology is introduced.
  • this divided layer is permeable to oxygen, when a photosensitive resin layer that is highly sensitive to polymerization inhibition by oxygen is used, the printing plate surface may be insufficiently cured, resulting in poor printing durability.
  • Patent Document 3 a photosensitive resin layer containing a resin that can be dissolved or dispersed in water and a monomer that can be cured by ultraviolet light, an adhesive force adjusting layer, and a water-insoluble thermal mask layer are laminated in this order.
  • a photosensitive resin printing original plate in which the adhesion adjusting layer contains partially saponified polyvinyl acetate having a saponification degree of 60 mol% or more is disclosed.
  • the thermal mask layer is not used by the divided layer. This is realized by containing a water-insoluble resin.
  • the adhesive force adjusting layer of Patent Document 3 does not require the second function of the above-described divided layer (that is, it can withstand laser ablation in order to exhibit oxygen barrier properties), and therefore the adhesive force adjustment. It can be said that the layer has a function different from that of the divided layer. Furthermore, since the heat-sensitive mask layer of the printing original plate is insoluble in water, it is necessary to develop with a strong brush using a relatively high temperature developer. For this reason, there are problems that the surface of the plate is roughened due to the friction and rubbing of the brush during the development, and relief jumps and chipping occur.
  • the present invention has been developed in view of the current state of the prior art, and its purpose is to obtain a printing plate with good printing quality that is excellent in all of water developability, printing durability, and image reproducibility. It is to obtain a photosensitive relief printing original plate suitable for the CTP technique.
  • the present inventors have determined that an oxygen-blocking dividing layer containing polyvinyl alcohol having a specific saponification degree and a specific polymerization degree is formed between the photosensitive resin layer and the thermal mask layer. It was found that a relief printing original plate excellent in laser tolerance, printing durability and image reproducibility can be obtained.
  • the present invention has been created based on such knowledge, and has the following configurations (1) to (2).
  • (1) At least (A) a support, (B) a photosensitive resin layer, (C) an oxygen-barrier dividing layer, and (D) a water-soluble or water-dispersible thermal mask layer containing carbon black are sequentially laminated.
  • a water-developable photosensitive letterpress printing original plate (B) Polyamide or polyether urea urethane in which the photosensitive resin layer contains a synthetic polymer compound, a photopolymerizable unsaturated compound, and a photopolymerization initiator, and the synthetic polymer compound contains a tertiary nitrogen atom
  • an oxygen-barrier dividing layer contains polyvinyl alcohol having a saponification degree of 60 to 85 mol% and a polymerization degree of 200 to 800.
  • the photosensitive resin relief printing original plate of the present invention resists infrared laser ablation during ablation and suppresses oxygen inhibition by effectively blocking atmospheric oxygen during exposure.
  • the image reproducibility without weight can be expressed with respect to the negative image of the mask layer which can be promoted and laser ablated.
  • the photosensitive resin relief printing original plate of the present invention has a water-soluble or water-dispersible heat-sensitive mask layer, it is possible to obtain a water-developing printing plate having excellent developability and good print quality.
  • Example 4 is a micrograph of the plate surface after development in Example 3.
  • 2 is a micrograph of a plate surface after development in Comparative Example 1.
  • Non-image area that is, a portion where an image is not formed by a laser and the heat-sensitive mask layer remains 2: Image portion, ie, a portion where the heat-sensitive mask layer is removed by a laser and the surface of the divided layer is exposed
  • At least (A) a support, (B) a photosensitive resin layer, (C) an oxygen-blocking divided layer, and (D) a water-soluble or water-dispersible thermal mask layer are sequentially laminated. It has a configuration and is a water development type.
  • the water development type means that a non-exposed portion that is unexposed in a developer containing water as a main component can be washed out with a brush to obtain a concavo-convex pattern.
  • the (A) support used in the original plate of the present invention is flexible, but is preferably a material excellent in dimensional stability.
  • a metal support such as steel, aluminum, copper, or nickel
  • thermoplastic resin supports such as polyethylene naphthalate film, polybutylene terephthalate film and polycarbonate film.
  • a polyethylene terephthalate film having excellent dimensional stability and sufficiently high viscoelasticity is particularly preferable.
  • the thickness of the support is preferably from 50 to 350 ⁇ m, preferably from 100 to 250 ⁇ m, from the viewpoint of mechanical properties, shape stability, or handleability during plate making.
  • the photosensitive resin layer (B) used in the original plate of the present invention comprises a synthetic polymer compound, a photopolymerizable unsaturated compound, and essential components of a photopolymerization initiator, a plasticizer, a thermal polymerization inhibitor, a dye, and a pigment. , UV absorbers, fragrances, and optional additives such as antioxidants.
  • the synthetic polymer compound constituting the (B) photosensitive resin layer of the present invention is a polyamide or polyether urea urethane containing a tertiary nitrogen atom.
  • the polyamide containing a tertiary nitrogen atom includes a tertiary nitrogen-containing polyamide and / or an ammonium salt type tertiary nitrogen atom-containing polyamide (see, for example, JP-A No. 53-36555).
  • the polyether urea urethane containing a tertiary nitrogen atom contains a tertiary nitrogen-containing polyether urea urethane and / or an ammonium salt type tertiary nitrogen atom-containing polyether urea urethane (see, for example, JP-A-4-97154). Is.
  • a synthetic polymer compound that can be dissolved or dispersed in water or a mixture of water and alcohol is preferable in terms of developability.
  • Polyamide or polyether urea urethane containing a tertiary nitrogen atom is particularly preferable because it can be easily developed with water by using an ammonium salt type.
  • photopolymerizable unsaturated compound constituting the photosensitive resin layer (B) of the present invention conventionally known compounds can be employed.
  • polyglycidyl ether of polyhydric alcohol, methacrylic acid and acrylic acid Of the ring-opening addition reaction product examples include dipentaerythritol, pentaerythritol, trimethylolpropane, glycerin, ethylene glycol, diethylene glycol, triethylene glycol, and an ethylene oxide adduct of phthalic acid.
  • trimethylolpropane is preferable.
  • photopolymerization initiator constituting the photosensitive resin layer (B) of the present invention
  • conventionally known photopolymerization initiators can be employed.
  • benzophenones, benzoins, acetophenones, benzyls, benzoin alkyl ethers examples include benzyl alkyl ketals, anthraquinones, and thioxanthones.
  • the oxygen-barrier dividing layer used for the original plate of the present invention is characterized by containing polyvinyl alcohol having a low saponification degree and a low polymerization degree.
  • the saponification degree and polymerization degree of polyvinyl alcohol used in the present invention are measured in accordance with JIS K 6726 (polyvinyl alcohol test method).
  • the saponification degree of polyvinyl alcohol is required to be 60 to 85 mol%, and the polymerization degree is 200 to 800, preferably 60 to 80 mol% and the polymerization degree is 250 to 750.
  • the degree of saponification is higher than the above range or the degree of polymerization is high, the divided layer is thermally damaged by infrared laser ablation, and fine roughness such as irregularities, undulations and wrinkles is generated on the plate surface.
  • the degree of saponification is lower than the above range, water-solubility is lacking and water development cannot be performed.
  • the degree of polymerization is lower than the above range, the film forming property is lacking, and a divided layer having a desired film thickness cannot be obtained.
  • the thickening of the image means the reproducibility of the printing plate with respect to the image of the mask layer ablated by laser, and the thickening means that the image area of the printing plate is larger than the image of the mask layer.
  • the reproducibility of the printing plate with respect to the image of the mask layer is preferably 95 to 105% as an image area ratio, and particularly preferably 95 to 100%. If the image area ratio is less than the above range, the image area is too small, and if it exceeds the above range, a problem of fatness occurs, which is not preferable.
  • the above-mentioned (C) oxygen-barrier dividing layer containing polyvinyl alcohol having a low saponification degree and a low polymerization degree generally exhibits excellent characteristics in a polymer material, in which thermal conductivity and density are proportional to each other.
  • the higher the degree of polymerization and the higher the degree of polymerization of polyvinyl alcohol the higher the density due to intermolecular interaction and the higher the thermal conductivity, so the polyvinyl alcohol has a low degree of saponification and a low molecular weight. It is considered that the use of, results in low thermal conductivity and high thermal stability.
  • the amount of polyvinyl alcohol having a low saponification degree and a low polymerization degree described above is preferably 50% by weight or more, more preferably 60% by weight or more based on the total solid content constituting the (C) divided layer. This amount can sufficiently withstand thermal damage due to laser ablation. In addition, since a uniform film can be formed, sufficient adhesion with the photosensitive resin layer and the heat-sensitive mask layer can be obtained.
  • the thickness of the oxygen-barrier dividing layer is preferably 15 ⁇ m or less, more preferably 0.1 ⁇ m or more and 5 ⁇ m or less. If the thickness exceeds the above range, the layer may be bent or scattered when exposed to ultraviolet light, and a sharp relief image may not be obtained. On the other hand, if the amount is less than the above range, the oxygen barrier property is insufficient, and the relief plate surface may be roughened.
  • the (D) heat-sensitive mask layer used in the original plate of the present invention needs to be water-soluble or water-dispersible because the original plate of the present invention is a water developing type.
  • the heat-sensitive mask layer is water-soluble or water-dispersible.
  • the heat-sensitive mask layer alone is dissolved or dispersed by rubbing with a brush in a developer containing water as a main component. It means having properties.
  • the heat-sensitive mask layer used in the original plate of the present invention is composed of a binder and carbon black having a function of absorbing infrared laser and converting it into heat and a function of blocking ultraviolet light. Further, as an optional component other than these, a pigment dispersant, a filler, a surfactant, a coating aid, or the like can be contained within a range that does not impair the effects of the present invention.
  • the thermal mask layer preferably has an optical density of 2.0 or more with respect to actinic radiation in order to prevent the actinic radiation from reaching the photosensitive resin layer.
  • An optical density of 2.0 to 3.0 is more preferable, and an optical density of 2.2 to 2.5 is particularly preferable.
  • optical density measurement there are known methods of calculating from the measured value of transmitted light intensity with a constant incident light intensity and calculating from the measured value of incident light intensity required to reach a certain transmitted light intensity.
  • the optical density in the present invention is a value calculated from the former transmitted light intensity.
  • the optical density can be measured by using, for example, a black and white transmission densitometer DM-520 (Dainippon Screen Mfg. Co., Ltd.).
  • the thickness of the thermal mask layer is preferably 0.5 to 5.0 ⁇ m, more preferably 1.0 to 2.0 ⁇ m. If the thickness is less than the above range, a high coating technique is required, and it may be difficult to obtain an optical density above a certain level. On the other hand, when the above range is exceeded, high energy is required for evaporation of the thermal mask layer, which may be disadvantageous in terms of cost.
  • the binder used in the heat-sensitive mask layer is not particularly limited, but a copolymer polyamide having a polar group is preferably used.
  • the polyamide used is preferably appropriately selected from conventionally known cationic polyamides, nonionic polyamides, and anionic polyamides. For example, tertiary amino group-containing polyamides, quaternary ammonium base-containing polyamides, ether group-containing polyamides. And sulfonic acid group-containing polyamide.
  • the carbon black used in the heat-sensitive mask layer has an infrared absorption function and an actinic radiation blocking function, and has a concentration that can achieve the optical density and the layer thickness as appropriate. ) It is used in an amount of 1 to 60% by weight, preferably 10 to 50% by weight, based on the total weight of the thermal mask layer. If the amount used is less than the lower limit, the optical density is lowered, and there is a possibility that the infrared absorption function and the actinic radiation blocking function are not exhibited. On the other hand, when the above upper limit is exceeded, other components such as a binder are insufficient, and the film-forming property may be lowered.
  • cover film It is preferable to protect the printing original plate by providing a peelable flexible cover film on the thermal mask layer.
  • Suitable examples of the cover film include a polyethylene terephthalate film, a polyethylene naphthalate film, and a polybutylene terephthalate film.
  • a protective film is not absolutely necessary.
  • the method for producing the relief printing original plate of the present invention is not particularly limited, but is generally produced as follows. First, components such as binder other than carbon black constituting the heat-sensitive mask layer are dissolved or dispersed in an appropriate solvent, and carbon black is dispersed therein to prepare a dispersion. Next, such a dispersion is applied onto a support for a thermal mask layer (for example, a PET film), and the solvent is evaporated. Subsequently, a solution or dispersion of the components constituting the divided layer is applied onto the heat-sensitive mask layer to evaporate the solvent, thereby creating one laminate. Further, separately from this, a photosensitive resin layer is formed on the support by coating, and the other laminate is prepared.
  • the two laminates thus obtained are laminated so that the photosensitive resin layer is adjacent to the divided layer on the thermal mask layer under pressure and / or heating.
  • the support for the thermal mask layer becomes a peelable flexible cover film after the printing original plate is completed, and functions as a protective film for the surface of the thermal mask layer.
  • IR lasers include ND / YAG laser (wavelength 1064 nm) or diode laser (wavelength example, 830 nm). These laser systems are commercially available and include a rotating cylindrical drum that holds a printing original, an IR laser irradiation device, and a layout computer. Image information is transferred directly from the layout computer to the laser device.
  • the photosensitive printing original plate is irradiated with actinic rays through the mask.
  • actinic rays having a wavelength of 150 to 500 nm, particularly 300 to 400 nm can be used.
  • a low-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a metal halide lamp, a xenon lamp, a zirconium lamp, a carbon arc lamp, an ultraviolet fluorescent lamp, or the like can be used. Thereafter, the irradiated plate is developed to obtain a printing plate.
  • the development step can be performed with a conventional development unit.
  • ⁇ -caprolactam 53 parts by weight, N, N′-bisaminopropylpiperazine adipate 38 parts by weight, 1,3-bis (aminomethyl) cyclohexane adipate 9 parts by weight were polymerized to have a melting point of 139 ° C. and a specific viscosity of 1.95.
  • a tertiary nitrogen-containing polyamide was obtained.
  • the solution was dissolved in a methanol / ethanol / isopropyl alcohol mixed solution to prepare a thermal mask layer coating solution.
  • Polyvinyl alcohol PVA505, PVA405, PVA403, and PVA205 used Kuraray Poval manufactured by Kuraray Co., Ltd.
  • Polyvinyl alcohol PVA-1 was synthesized as follows. 50 parts by weight of vinyl acetate and 60 parts by weight of methanol were polymerized at 60 ° C. under nitrogen substitution, and when the degree of polymerization reached 100, the polymerization was terminated by cooling. Next, unreacted vinyl acetate was removed to obtain a methanol solution of polyvinyl acetate. A NaOH methanol solution (10% concentration) was added to the resulting solution for deacetic acid to obtain polyvinyl alcohol PVA-1 having a saponification degree of 63 mol%.
  • Polyvinyl alcohol PVA-2 to 5 were synthesized as follows. In the same manner as polyvinyl alcohol PVA-1, 50 parts by weight of vinyl acetate and 60 parts by weight of methanol were polymerized at 60 ° C. under nitrogen substitution, and when the degree of polymerization reached 300, 500, 700, 1000, the polymerization was terminated by cooling. did. Next, unreacted vinyl acetate was removed to obtain a methanol solution of polyvinyl acetate.
  • a NaOH methanol solution (10% concentration) was added to the resulting solution to remove acetic acid, polyvinyl alcohol PVA-2 having a polymerization degree of 300 and a saponification degree of 63 mol%, and a polyvinyl alcohol having a polymerization degree of 500 and a saponification degree of 63 mol%.
  • Alcohol PVA-3, polyvinyl alcohol PVA-4 having a polymerization degree of 700 and a saponification degree of 63 mol%, and polyvinyl alcohol PVA-5 having a polymerization degree of 1000 and a saponification degree of 63 mol% were obtained.
  • Polyvinyl alcohol PVA-6 was synthesized as follows. 50 parts by weight of vinyl acetate and 60 parts by weight of methanol were polymerized at 60 ° C. under nitrogen substitution, and when the degree of polymerization reached 700, the polymerization was terminated by cooling. Next, unreacted vinyl acetate was removed to obtain a methanol solution of polyvinyl acetate. A NaOH methanol solution (15% concentration) was added to the resulting solution for deacetic acid to obtain polyvinyl alcohol PVA-6 having a saponification degree of 80 mol%.
  • Polyvinyl alcohol PVA-7 was synthesized as follows. 50 parts by weight of vinyl acetate and 60 parts by weight of methanol were polymerized at 60 ° C. under nitrogen substitution, and when the degree of polymerization reached 500, the polymerization was terminated by cooling. Next, unreacted vinyl acetate was removed to obtain a methanol solution of polyvinyl acetate. A NaOH methanol solution (7% concentration) was added to the resulting solution for deacetic acid to obtain polyvinyl alcohol PVA-7 having a saponification degree of 50 mol%.
  • ⁇ Preparation of laminated film X> A heat-sensitive mask layer coating solution was applied onto a 100 ⁇ m PET film subjected to a release treatment on both sides using a suitable type of bar coater, dried at 120 ° C. for 5 minutes, and a film thickness of 1. A 5 ⁇ m thermal mask layer was laminated. The optical density at this time was 2.3. This optical density was measured with a black and white transmission densitometer DM-520 (Dainippon Screen Mfg. Co., Ltd.). Next, a split layer coating solution is applied onto the thermal mask layer using an appropriate type of bar coater, dried at 120 ° C. for 5 minutes, and a thermal mask layer having a thickness of 1.5 ⁇ m on the PET film and A laminated film X in which divided layers having a thickness of 3.0 ⁇ m were laminated in this order was obtained.
  • ⁇ -caprolactam 53 parts by weight, N, N′-bisaminopropylpiperazine adipate 38 parts by weight, 1,3-bis (aminomethyl) cyclohexane adipate 9 parts by weight were polymerized to have a melting point of 139 ° C. and a specific viscosity of 1.95.
  • a tertiary nitrogen-containing polyamide was obtained. 55 parts of the obtained polyamide was dissolved in 200 parts by weight of methanol and 24 parts by weight of water.
  • the photosensitive resin composition A is sandwiched between the adhesive-coated surface side of the support film obtained by coating the adhesive film on the 250 ⁇ m PET film to 20 ⁇ m and the divided layer side of the laminated film X at 110 ° C. Was heated and pressed to prepare a photosensitive relief printing original plate having a total thickness of 950 ⁇ m.
  • the photosensitive resin composition B is sandwiched between the adhesive-coated surface side of the support film obtained by coating the 250 ⁇ m PET film with 20 ⁇ m of adhesive and the divided layer side of the laminated film X at 110 ° C. Was heated and pressed to prepare a photosensitive relief printing original plate having a total thickness of 950 ⁇ m.
  • ⁇ Preparation of photosensitive letterpress printing original plate having photosensitive resin layer C> The protective film was peeled off from a commercially available relief printing plate capable of being developed on water placed on a film base of nyloprint (registered trademark) WF95H (manufactured by BASF). Next, using a mixture of n-propanol and water in a mixing ratio of 9: 1, the laminated film X was laminated on the surface from which the protective film was peeled off to obtain a photosensitive relief printing original plate.
  • nyloprint registered trademark
  • WF95H manufactured by BASF
  • ⁇ Preparation of photosensitive letterpress printing original plate having photosensitive resin layer D> The protective film was peeled off from a commercially available relief printing plate capable of being developed with water on a film base of TORELIEF (registered trademark) WF95DT IV (manufactured by Toray Industries, Inc.). Next, using a mixture of n-propanol and water having a mixing ratio of 18: 1, the laminated film X was laminated on the surface from which the protective film was peeled off to obtain a photosensitive relief printing original plate.
  • TORELIEF registered trademark
  • WF95DT IV manufactured by Toray Industries, Inc.
  • the protective film was peeled off from the photosensitive relief printing original plate, and then drawn on the (C) thermal mask layer with an external drum IR laser device.
  • IR laser device CDI Spark 2530 (Esco Graphics Co., Ltd.) and ThermoFlex Narrow (manufactured by Kodak Co., Ltd.) were used.
  • the ablation conditions were set such that the thermal mask layer was substantially decomposed and evaporated by laser irradiation in each laser device.
  • the drawn original is exposed to UV rays for 75 seconds (Philips 10R, illuminance 8 mW / cm 2 at 365 nm), and then exposed to a brush-type washing machine / dryer integrated device (JEWA2 SD JOWA2 SD) for 2 minutes. It was washed out for 30 seconds and dried at 60 ° C. for 10 minutes. Thereafter, as a post-exposure, UV exposure was performed for 75 seconds (Philips 10R, illuminance 8 mW / cm 2 at 365 nm) to obtain a printing plate.
  • Examples 1-8, Comparative Examples 1-7 According to the conditions described in Table 1 or Table 2, printing plates of Examples 1 to 8 and Comparative Examples 1 to 7 were obtained by the above method. The obtained printing plates were evaluated as follows. The evaluation results are shown in Table 1 or Table 2.
  • a laser system suitable for computer plate making technology includes a rotating cylindrical drum that holds a printing original plate, an infrared laser irradiation device, and a layout computer.
  • Ablation conditions are set such that the thermal mask layer is substantially decomposed and evaporated by laser irradiation.
  • the ablation condition is specifically set by the number of rotations of the rotating cylindrical drum (laser irradiation time) and the laser irradiation output value (laser energy).
  • laser irradiation time the number of rotations of the rotating cylindrical drum
  • laser irradiation output value laser energy
  • Various laser apparatuses are commercially available as suitable laser systems, but the ablation conditions and the appropriate ablation range that gives good relief differ depending on the laser apparatus. Therefore, mask drawing was performed under various ablation conditions using CDI Spark 2530 (Esco Graphics Co., Ltd.).
  • the area reproducibility of the relief surface was calculated by the following method using a negative image of a mask layer of 150% 1% (diameter 19 ⁇ m) obtained by laser ablation.
  • the halftone dot area was measured by enlarging the relief surface 50 times with a microscope and measuring the area using commercially available image analysis software.
  • image analysis software A Image-kun (manufactured by Asahi Kasei Engineering).
  • Relief area reproduction ratio (%) (B / A) ⁇ 100 for a negative mask layer image of 150% 1%
  • the printing press uses a convex rotary printing press (Mitsugi Machine P-20) to place the printing plate on the plate cylinder in a state where printing pressure is applied to all the images.
  • the shape of the printing plate image was a star shape having a diameter of 16 mm.
  • the printing pressure was usually applied to a printed material having a thickness of 150 to 250 ⁇ m, but the load was excessively applied by pressing 450 ⁇ m.
  • the printing speed at this time was 20 to 30 m / min.
  • UV ink T & K TOKA Best Cure UV Color Indigo B
  • the ink density was adjusted to 0.6 or more and 2.0 or less with a reflection densitometer (Dainippon Screen Manufacturing DM-800).
  • Mirror-coated tack paper (Lintec gloss PW 8K) was used as printing paper. Printing was performed up to 8000 shots, and the occurrence of cracks was judged as impossible. The evaluation of the occurrence of cracks was determined by visually observing the presence of crack marks appearing on the printed matter with a loupe.
  • the synthetic polymer compound in the photosensitive resin layer contains a polyamide or polyether urea urethane containing a tertiary nitrogen atom, and the dividing layer has a low saponification degree and a low polymerization degree within the scope of the present invention.
  • Examples 1 to 8 made of polyvinyl alcohol give a good printing plate free from roughness such as irregularities, undulations, wrinkles and the like, and are excellent in laser tolerance under any ablation condition.
  • the image reproducibility of Examples 1 to 8 is almost 95% to 103%, and the image reproducibility is 95% especially when the saponification degree of polyvinyl alcohol is in the range of 60 to 80 mol%. It can be seen that the image reproducibility is excellent at ⁇ 100%.
  • Comparative Example 3 in which the degree of saponification of polyvinyl alcohol is less than the range of the present invention, the image reproduction rate is too low at 92%, and in Comparative Example 2 in which the degree of saponification of polyvinyl alcohol exceeds the range of the present invention, the image reproduction rate is low. Since it becomes too large with 107%, it is not preferable.
  • Comparative Example 1 in which the degree of polymerization of polyvinyl alcohol exceeds the range of the present invention and Comparative Example 2 in which the degree of saponification of polyvinyl alcohol exceeds the range of the present invention, roughness of the plate surface such as irregularities, undulations, wrinkles, etc. is caused by ablation conditions. occured.
  • the comparative example 5 does not have a divided layer, the curing reaction of the photosensitive resin layer proceeds while receiving moderate polymerization inhibition under uniform atmospheric oxygen conditions. Therefore, a good printing plate having no rough surface is provided. However, due to insufficient exposure and curing of the printing plate surface, cracks are likely to occur in the solid portion of the printing plate surface during printing, resulting in poor printing durability.
  • Comparative Examples 6 to 7 in which the synthetic polymer compound in the photosensitive resin layer does not contain a polyamide or polyether urea urethane containing a tertiary nitrogen atom are minor, but the surface of the plate is slightly affected by ablation conditions. Caused rough storms. The printing durability was slightly inferior to the evaluation of the examples.
  • the photosensitive resin relief printing original plate of the present invention has a wide range of appropriate ablation, it can be made by various CTP plate making apparatuses, and there is little fine roughness such as irregularities, undulations, wrinkles, etc. on the exposed plate surface, and a printed product. Can provide a printing plate having excellent printing durability and printing durability.

Abstract

Provided is a photosensitive relief printing original plate that is suitable for CTP technology and that makes it possible to obtain a printing plate having excellent water developability, excellent printing durability, and good print quality. At least the following are layered sequentially in this water development-type photosensitive relief printing original plate: a support body (A); a photosensitive resin layer (B); an oxygen-blocking division layer (C); and a water-soluble or water-dispersible photosensitive mask layer (D) containing carbon black. The photosensitive relief printing original plate is characterized in that the photosensitive resin layer (B) contains a synthetic polymer compound, a photopolymerizable unsaturated compound, and a photopolymerization initiator, the synthetic polymer compound contains polyether urea-urethane or a polyamide comprising a tertiary nitrogen atom, and the division layer (C) contains a polyvinyl alcohol having a saponification degree of 60-85 mol% and a degree of polymerization of 200-800.

Description

感光性凸版印刷原版Photosensitive relief printing original plate
 本発明は、コンピュータ製版技術により凸版印刷版を製造するために使用される感光性凸版印刷原版に関する。 The present invention relates to a photosensitive relief printing original plate used for producing a relief printing plate by computer plate making technology.
 近年、凸版印刷やフレキソ印刷の分野において、デジタル画像形成技術として知られるコンピュータ製版技術(CTP技術)は、極めて一般的なものになってきている。CTP技術は、デジタルデータにより画像マスクを直接印刷版上に形成し、その後、画像マスク側から露光することによってレリーフとなる凹凸パターンを得る方法である。 In recent years, in the fields of letterpress printing and flexographic printing, computer plate making technology (CTP technology) known as digital image forming technology has become very common. The CTP technique is a method of obtaining an uneven pattern serving as a relief by forming an image mask directly on a printing plate with digital data and then exposing from the image mask side.
 CTP技術では、重合すべきでない領域を覆うために、従来から用いられているネガフィルムが印刷版内で形成統合されるマスクに取って代えられる。この統合マスクを得る方法として、感光性樹脂層上に化学線に対して不透明な感赤外線層(感熱マスク層)を設け、赤外線レーザーでこの感赤外線層を分解蒸散(アブレーション)することにより画像マスクを形成する方法が広く使用されている(特許文献1参照)。 In CTP technology, a negative film, which is conventionally used, is replaced with a mask that is formed and integrated in a printing plate in order to cover an area that should not be polymerized. An image mask is obtained by providing an infrared sensitive layer (heat sensitive mask layer) opaque to actinic radiation on a photosensitive resin layer and decomposing and ablating the infrared sensitive layer with an infrared laser as a method for obtaining this integrated mask. The method of forming is widely used (see Patent Document 1).
 CTP技術を導入した感光性凸版印刷原版としては、感光性樹脂層、分割層、感熱マスク層から構成される感光性凸版印刷原版が提案されている。この分割層は、二つの重要な機能を持つことが必要である。 As a photosensitive letterpress printing original plate in which CTP technology is introduced, a photosensitive letterpress printing original plate composed of a photosensitive resin layer, a divided layer, and a thermal mask layer has been proposed. This split layer needs to have two important functions.
 第一に、感光性樹脂層と感熱マスク層との間の物質移動を最小限にすることが必要である。一般的に低分子量のモノマーや可塑剤は、隣接する層中の成分に対して親和性を有すると、隣接する層への経時的拡散移動が大きくなる。このような物質移動が起こると、感熱マスク層の赤外感度に影響を与える。 First, it is necessary to minimize the mass transfer between the photosensitive resin layer and the thermal mask layer. In general, when a low molecular weight monomer or plasticizer has an affinity for a component in an adjacent layer, diffusion transfer over time to the adjacent layer increases. When such mass transfer occurs, the infrared sensitivity of the thermal mask layer is affected.
 第二に、大気酸素から感光性樹脂層を保護することが必要である。大気酸素下で露光すると、ラジカル失活により感光性樹脂層は重合阻害を受ける。その結果、印刷版表面での硬化不足を招き、耐刷性が著しく低下する。 Second, it is necessary to protect the photosensitive resin layer from atmospheric oxygen. When exposed to atmospheric oxygen, the photosensitive resin layer undergoes polymerization inhibition due to radical deactivation. As a result, the printing plate surface is insufficiently cured and the printing durability is remarkably lowered.
 さらに、露光硬化時に十分な酸素遮断能を発現するには、分割層がレーザー融蝕に耐えうることが必要である。赤外線レーザーにより感熱マスク層をアブレーションすると、隣接する分割層は高温にさらされ、特にレーザー光路の重なり部での熱的ダメージは多大なものとなる。ダメージを受けた分割層は、レーザー光路の重なり部で局所的に融蝕、掘削され、分割層膜厚の不均一化、もしくは分割層の不連続化を招く。その結果、分割層の酸素透過性にバラツキを生じ、感光性樹脂層が露光される際、局所的な重合阻害を与える。不均一な酸素条件下で露光された感光性樹脂版は、版表面に凹凸、うねり、皺などの微細な荒れが生じ、印刷品位の低下を招く。 Furthermore, in order to develop a sufficient oxygen barrier ability at the time of exposure and curing, it is necessary that the divided layer can withstand laser ablation. When the thermal mask layer is ablated by the infrared laser, the adjacent divided layers are exposed to a high temperature, and the thermal damage particularly at the overlapping portion of the laser light path becomes significant. The damaged divided layer is locally ablated and excavated at the overlapping portion of the laser optical path, resulting in uneven thickness of the divided layer or discontinuity of the divided layer. As a result, the oxygen permeability of the divided layer varies, and local polymerization inhibition is given when the photosensitive resin layer is exposed. A photosensitive resin plate exposed under non-uniform oxygen conditions causes fine roughness such as irregularities, undulations, and wrinkles on the plate surface, resulting in a decrease in print quality.
 CTP技術を導入した感光性凸版印刷原版として、特許文献2には、酸素透過性の分割層を有する感光性樹脂凸版印刷原版が提案されている。しかしながら、この分割層は、酸素透過性であるため、酸素による重合阻害の感受性が高い感光性樹脂層を用いる場合には印刷版表面に硬化不足を生じ、耐刷性が劣る場合がある。 Patent Document 2 proposes a photosensitive resin relief printing original plate having an oxygen-permeable dividing layer as a photosensitive relief printing original plate in which CTP technology is introduced. However, since this divided layer is permeable to oxygen, when a photosensitive resin layer that is highly sensitive to polymerization inhibition by oxygen is used, the printing plate surface may be insufficiently cured, resulting in poor printing durability.
 また、特許文献3には、水に溶解または分散可能な樹脂および紫外光により硬化可能なモノマーを含有する感光性樹脂層と、接着力調整層と、水不溶性の感熱マスク層とがこの順に積層され、前記接着力調整層が鹸化度60モル%以上の部分鹸化ポリ酢酸ビニルを含有する感光性樹脂印刷原版が開示されている。特許文献3では、前述した分割層の第一の機能(すなわち感光性樹脂層と感熱マスク層との間の物質移動を最小限にすること)に関しては、分割層によってではなく、前記感熱マスク層に水不溶性の樹脂を含有することによって実現している。また、特許文献3の接着力調整層には前述した分割層の第二の機能(すなわち酸素遮断性を発現するためにレーザー融蝕に耐えうること)は要求されておらず、従って接着力調整層は分割層とは異なる機能のものであると言える。さらに、この印刷原版の感熱マスク層は、水不溶性であるため、コシの強いブラシで、比較的高温の現像水を用いて現像することが必要である。そのために、現像中にブラシの摩擦や擦れによって版表面を荒らしたり、レリーフの飛びやカケが生じるといった問題がある。 In Patent Document 3, a photosensitive resin layer containing a resin that can be dissolved or dispersed in water and a monomer that can be cured by ultraviolet light, an adhesive force adjusting layer, and a water-insoluble thermal mask layer are laminated in this order. In addition, a photosensitive resin printing original plate in which the adhesion adjusting layer contains partially saponified polyvinyl acetate having a saponification degree of 60 mol% or more is disclosed. In Patent Document 3, regarding the first function of the divided layer (that is, minimizing the mass transfer between the photosensitive resin layer and the thermal mask layer), the thermal mask layer is not used by the divided layer. This is realized by containing a water-insoluble resin. Further, the adhesive force adjusting layer of Patent Document 3 does not require the second function of the above-described divided layer (that is, it can withstand laser ablation in order to exhibit oxygen barrier properties), and therefore the adhesive force adjustment. It can be said that the layer has a function different from that of the divided layer. Furthermore, since the heat-sensitive mask layer of the printing original plate is insoluble in water, it is necessary to develop with a strong brush using a relatively high temperature developer. For this reason, there are problems that the surface of the plate is roughened due to the friction and rubbing of the brush during the development, and relief jumps and chipping occur.
 一方、酸素透過の遮断性を向上させた場合には、光硬化不足による耐刷性不足は改善できるが、逆に光硬化を促進するためにマスク層のネガ画像よりも面積が大きくなる問題(太り)が起こり、耐刷性と画像再現性との両者を満足する印刷原版が求められていた。 On the other hand, in the case of improving the blocking property of oxygen permeation, the shortage of printing durability due to insufficient photocuring can be improved, but conversely the problem is that the area becomes larger than the negative image of the mask layer in order to promote photocuring ( There has been a demand for a printing original plate that satisfies both printing durability and image reproducibility.
特許第2773847号公報Japanese Patent No. 2773847 特許第3429634号公報Japanese Patent No. 3429634 特開2005-326442号公報JP 2005-326442 A
 本発明は、かかる従来技術の現状に鑑み創案されたものであり、その目的は、水現像性、耐刷性及び画像再現性のいずれにも優れた印刷品位の良い印刷版を得ることのできる、CTP技術に適した感光性凸版印刷原版を得ることにある。 The present invention has been developed in view of the current state of the prior art, and its purpose is to obtain a printing plate with good printing quality that is excellent in all of water developability, printing durability, and image reproducibility. It is to obtain a photosensitive relief printing original plate suitable for the CTP technique.
 本発明者らは、かかる目的を達成するために鋭意検討した結果、特定の鹸化度及び特定の重合度を有するポリビニルアルコールを含有する酸素遮断性分割層を感光性樹脂層と感熱マスク層の間に設けたことによりレーザー許容性、耐刷性及び画像再現性に優れた凸版印刷原版が得られることを見出した。 As a result of intensive studies to achieve the above object, the present inventors have determined that an oxygen-blocking dividing layer containing polyvinyl alcohol having a specific saponification degree and a specific polymerization degree is formed between the photosensitive resin layer and the thermal mask layer. It was found that a relief printing original plate excellent in laser tolerance, printing durability and image reproducibility can be obtained.
 本発明は、かかる知見に基づいて創案されたものであり、以下の(1)~(2)の構成を有するものである。
(1)少なくとも(A)支持体、(B)感光性樹脂層、(C)酸素遮断性分割層、(D)カーボンブラックを含有する水溶性または水分散性の感熱マスク層が順次積層されてなる水現像型感光性凸版印刷原版であって、
 (B)感光性樹脂層が、合成高分子化合物、光重合性不飽和化合物、及び光重合開始剤を含有し、前記合成高分子化合物が、三級窒素原子を含有するポリアミド又はポリエーテルウレアウレタンを含有し、かつ、(C)酸素遮断性分割層が、鹸化度60~85モル%、重合度200~800のポリビニルアルコールを含有することを特徴とする感光性凸版印刷原版。
(2)前記(D)感熱マスク層が、前記(B)感光性樹脂層が含有する前記合成高分子化合物を含有するものであることを特徴とする(1)に記載の感光性凸版印刷原版。
The present invention has been created based on such knowledge, and has the following configurations (1) to (2).
(1) At least (A) a support, (B) a photosensitive resin layer, (C) an oxygen-barrier dividing layer, and (D) a water-soluble or water-dispersible thermal mask layer containing carbon black are sequentially laminated. A water-developable photosensitive letterpress printing original plate,
(B) Polyamide or polyether urea urethane in which the photosensitive resin layer contains a synthetic polymer compound, a photopolymerizable unsaturated compound, and a photopolymerization initiator, and the synthetic polymer compound contains a tertiary nitrogen atom And (C) an oxygen-barrier dividing layer contains polyvinyl alcohol having a saponification degree of 60 to 85 mol% and a polymerization degree of 200 to 800.
(2) The photosensitive relief printing original plate as described in (1), wherein the thermal mask layer (D) contains the synthetic polymer compound contained in the photosensitive resin layer (B). .
 本発明の感光性樹脂凸版印刷原版は、アブレーション時の赤外線レーザー融蝕に耐え、露光時に大気酸素を効果的に遮断することによって酸素阻害を抑制しているため、感光性樹脂層の重合硬化を促進でき、且つレーザー融除したマスク層のネガ画像に対しては太りのない画像再現性を発現させることができる。結果として、露光後の版表面に微細な荒れのない、印刷性、耐刷性及び画像再現性に優れた印刷版を提供することができる。また、本発明の感光性樹脂凸版印刷原版は、水溶性または水分散性の感熱マスク層を有するために現像性に優れ、印刷品位の良い水現像型印刷版を得ることができる。 The photosensitive resin relief printing original plate of the present invention resists infrared laser ablation during ablation and suppresses oxygen inhibition by effectively blocking atmospheric oxygen during exposure. The image reproducibility without weight can be expressed with respect to the negative image of the mask layer which can be promoted and laser ablated. As a result, it is possible to provide a printing plate excellent in printability, printing durability and image reproducibility without fine roughness on the exposed plate surface. In addition, since the photosensitive resin relief printing original plate of the present invention has a water-soluble or water-dispersible heat-sensitive mask layer, it is possible to obtain a water-developing printing plate having excellent developability and good print quality.
実施例3における現像後の版表面の顕微鏡写真である。4 is a micrograph of the plate surface after development in Example 3. 比較例1における現像後の版表面の顕微鏡写真である。2 is a micrograph of a plate surface after development in Comparative Example 1.
1:非画像部、すなわちレーザーにより画像形成されておらず、感熱マスク層が残存した部分
2:画像部、すなわちレーザーにより感熱マスク層が除去され、分割層表面が露出した部分
1: Non-image area, that is, a portion where an image is not formed by a laser and the heat-sensitive mask layer remains 2: Image portion, ie, a portion where the heat-sensitive mask layer is removed by a laser and the surface of the divided layer is exposed
 以下、本発明の感光性凸版印刷原版を詳細に説明する。 Hereinafter, the photosensitive relief printing original plate of the present invention will be described in detail.
 本発明の凸版印刷原版は、少なくとも(A)支持体、(B)感光性樹脂層、(C)酸素遮断性分割層、(D)水溶性または水分散性の感熱マスク層が順次積層された構成を有し、水現像型である。 In the relief printing original plate of the present invention, at least (A) a support, (B) a photosensitive resin layer, (C) an oxygen-blocking divided layer, and (D) a water-soluble or water-dispersible thermal mask layer are sequentially laminated. It has a configuration and is a water development type.
 本発明の凸版印刷原版において水現像型であるとは、水を主成分とする現像液中で未露光である非画像部をブラシで擦ることにより洗い出し、凹凸パターンを得ることができることを指す。 In the relief printing original plate of the present invention, the water development type means that a non-exposed portion that is unexposed in a developer containing water as a main component can be washed out with a brush to obtain a concavo-convex pattern.
 本発明の原版に使用される(A)支持体は、可撓性であるが、寸法安定性に優れた材料が好ましく、例えばスチール、アルミニウム、銅、ニッケルなどの金属製支持体、ポリエチレンテレフタレートフィルム、ポリエチレンナフタレートフィルム、ポリブチレンテレフタレートフィルムおよびポリカーボネートフィルムなどの熱可塑性樹脂製支持体を挙げることができる。これらの中でも、寸法安定性に優れ、充分に高い粘弾性を有するポリエチレンテレフタレートフイルムが特に好ましい。支持体の厚みは、機械的特性、形状安定性あるいは印刷版製版時の取り扱い性等から50~350μm、好ましくは100~250μmが望ましい。また、必要により、支持体と感光性樹脂層との接着性を向上させるために、それらの間に接着剤層を設けても良い。 The (A) support used in the original plate of the present invention is flexible, but is preferably a material excellent in dimensional stability. For example, a metal support such as steel, aluminum, copper, or nickel, a polyethylene terephthalate film And thermoplastic resin supports such as polyethylene naphthalate film, polybutylene terephthalate film and polycarbonate film. Among these, a polyethylene terephthalate film having excellent dimensional stability and sufficiently high viscoelasticity is particularly preferable. The thickness of the support is preferably from 50 to 350 μm, preferably from 100 to 250 μm, from the viewpoint of mechanical properties, shape stability, or handleability during plate making. Moreover, in order to improve the adhesiveness of a support body and the photosensitive resin layer, you may provide an adhesive bond layer among them as needed.
 本発明の原版に使用される(B)感光性樹脂層は、合成高分子化合物、光重合性不飽和化合物、及び光重合開始剤の必須成分と、可塑剤、熱重合防止剤、染料、顔料、紫外線吸収剤、香料、及び酸化防止剤などの任意の添加剤とから構成される。 The photosensitive resin layer (B) used in the original plate of the present invention comprises a synthetic polymer compound, a photopolymerizable unsaturated compound, and essential components of a photopolymerization initiator, a plasticizer, a thermal polymerization inhibitor, a dye, and a pigment. , UV absorbers, fragrances, and optional additives such as antioxidants.
 本発明の(B)感光性樹脂層を構成する合成高分子化合物は、三級窒素原子を含有するポリアミド又はポリエーテルウレアウレタンである。三級窒素原子を含有するポリアミドとしては、三級窒素含有ポリアミドおよび/またはアンモニウム塩型三級窒素原子含有ポリアミド(例えば特開昭53-36555号公報参照)を含有するものである。三級窒素原子を含有するポリエーテルウレアウレタンとしては、三級窒素含有ポリエーテルウレアウレタンおよび/またはアンモニウム塩型三級窒素原子含有ポリエーテルウレアウレタン(例えば特開平4-97154公報参照)を含有するものである。また、水または水とアルコールの混合物に溶解または分散可能な合成高分子化合物であることが、現像性の面で好ましい。三級窒素原子を含有するポリアミド又はポリエーテルウレアウレタンは、アンモニウム塩型にすることで水現像が容易となり、特に好ましい。 The synthetic polymer compound constituting the (B) photosensitive resin layer of the present invention is a polyamide or polyether urea urethane containing a tertiary nitrogen atom. The polyamide containing a tertiary nitrogen atom includes a tertiary nitrogen-containing polyamide and / or an ammonium salt type tertiary nitrogen atom-containing polyamide (see, for example, JP-A No. 53-36555). The polyether urea urethane containing a tertiary nitrogen atom contains a tertiary nitrogen-containing polyether urea urethane and / or an ammonium salt type tertiary nitrogen atom-containing polyether urea urethane (see, for example, JP-A-4-97154). Is. In addition, a synthetic polymer compound that can be dissolved or dispersed in water or a mixture of water and alcohol is preferable in terms of developability. Polyamide or polyether urea urethane containing a tertiary nitrogen atom is particularly preferable because it can be easily developed with water by using an ammonium salt type.
 本発明の(B)感光性樹脂層を構成する光重合性不飽和化合物としては、従来公知のものを採用することができるが、例えば多価アルコールのポリグリシジルエーテルとメタアクリル酸およびアクリル酸との開環付加反応生成物が挙げられる。前記多価アルコールとしては、ジペンタエリスリトール、ペンタエリスリトール、トリメチロールプロパン、グリセリン、エチレングリコール、ジエチレングリコール、トリエチレングリコール、フタル酸のエチレンオキサイド付加物などが挙げられ、そのなかでもトリメチロールプロパンが好ましい。 As the photopolymerizable unsaturated compound constituting the photosensitive resin layer (B) of the present invention, conventionally known compounds can be employed. For example, polyglycidyl ether of polyhydric alcohol, methacrylic acid and acrylic acid Of the ring-opening addition reaction product. Examples of the polyhydric alcohol include dipentaerythritol, pentaerythritol, trimethylolpropane, glycerin, ethylene glycol, diethylene glycol, triethylene glycol, and an ethylene oxide adduct of phthalic acid. Among them, trimethylolpropane is preferable.
 本発明の(B)感光性樹脂層を構成する光重合開始剤としては、従来公知のものを採用することができるが、例えばベンゾフェノン類、ベンゾイン類、アセトフェノン類、ベンジル類、ベンゾインアルキルエーテル類、ベンジルアルキルケタール類、アントラキノン類、チオキサントン類などが挙げられる。具体的には、ベンゾフェノン、クロロベンゾフェノン、ベンゾイン、アセトフェノン、ベンジル、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインイソブチルエーテル、ベンジルジメチルケタール、ベンジルジエチルケタール、ベンジルジイソプロピルケタール、アントラキノン、2-エチルアントラキノン、2―メチルアントラキノン、2-アリルアントラキノン、2-クロロアントラキノン、チオキサントン、2-クロロチオキサントンなどが挙げられる。 As the photopolymerization initiator constituting the photosensitive resin layer (B) of the present invention, conventionally known photopolymerization initiators can be employed. For example, benzophenones, benzoins, acetophenones, benzyls, benzoin alkyl ethers, Examples include benzyl alkyl ketals, anthraquinones, and thioxanthones. Specifically, benzophenone, chlorobenzophenone, benzoin, acetophenone, benzyl, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, benzyl diethyl ketal, benzyl diisopropyl ketal, anthraquinone, 2-ethylanthraquinone Examples include 2-methylanthraquinone, 2-allyl anthraquinone, 2-chloroanthraquinone, thioxanthone, and 2-chlorothioxanthone.
 本発明の原版に使用される(C)酸素遮断性分割層は、低鹸化度でかつ低重合度のポリビニルアルコールを含有することを特徴とする。本発明で用いられるポリビニルアルコールの鹸化度、重合度は、JIS K 6726(ポリビニルアルコール試験方法)に準拠して測定されるものである。ポリビニルアルコールの鹸化度は60~85モル%、重合度は200~800であることが必要であり、好ましくは鹸化度60~80モル%、重合度250~750である。上記範囲より鹸化度が高かったり、または重合度が高かったりすると、分割層が赤外線レーザー融蝕による熱的ダメージを受け、版表面に凹凸、うねり、皺などの微細な荒れを生じる。一方、上記範囲より鹸化度が低いと、水溶性に欠け、水現像することができない。上記範囲より重合度が低いと、造膜性に欠け、目的とする膜厚の分割層を得ることができない。又、画像再現性に対しては、鹸化度が低いと、酸素遮断性が不足し、鹸化度が高いと、酸素遮断性効果によって画像が太るために画像再現性が低下する問題が発生する。本発明において画像の太りとは、レーザー融除したマスク層の画像に対する印刷版の再現性を示し、太るとは、マスク層の画像に対して印刷版の画像面積が大きくなっていることを示す。マスク層の画像に対する印刷版の再現性は、画像面積率で95~105%であることが好ましく、特に好ましくは95~100%である。画像面積率が上記範囲未満では、画像面積が小さすぎ、上記範囲を超えると、太りの問題が発生するので好ましくない。 (C) The oxygen-barrier dividing layer used for the original plate of the present invention is characterized by containing polyvinyl alcohol having a low saponification degree and a low polymerization degree. The saponification degree and polymerization degree of polyvinyl alcohol used in the present invention are measured in accordance with JIS K 6726 (polyvinyl alcohol test method). The saponification degree of polyvinyl alcohol is required to be 60 to 85 mol%, and the polymerization degree is 200 to 800, preferably 60 to 80 mol% and the polymerization degree is 250 to 750. If the degree of saponification is higher than the above range or the degree of polymerization is high, the divided layer is thermally damaged by infrared laser ablation, and fine roughness such as irregularities, undulations and wrinkles is generated on the plate surface. On the other hand, if the degree of saponification is lower than the above range, water-solubility is lacking and water development cannot be performed. If the degree of polymerization is lower than the above range, the film forming property is lacking, and a divided layer having a desired film thickness cannot be obtained. Further, with respect to image reproducibility, if the degree of saponification is low, the oxygen barrier property is insufficient, and if the degree of saponification is high, the image becomes thick due to the oxygen barrier effect, resulting in a problem that the image reproducibility is lowered. In the present invention, the thickening of the image means the reproducibility of the printing plate with respect to the image of the mask layer ablated by laser, and the thickening means that the image area of the printing plate is larger than the image of the mask layer. . The reproducibility of the printing plate with respect to the image of the mask layer is preferably 95 to 105% as an image area ratio, and particularly preferably 95 to 100%. If the image area ratio is less than the above range, the image area is too small, and if it exceeds the above range, a problem of fatness occurs, which is not preferable.
 上述の低鹸化度でかつ低重合度のポリビニルアルコールを含有する(C)酸素遮断性分割層が優れた特性を示すのは、一般的に高分子材料において、熱伝導率と密度は比例関係にあるが、ポリビニルアルコールを主成分とするフィルムは高鹸化高重合度であるほど、分子間相互作用によりその密度は高くなり、熱伝導率が高くなるため、低鹸化度でかつ低分子量のポリビニルアルコールを使用すると熱伝導率が低くなり、熱安定性が高いことに起因すると考えられる。 The above-mentioned (C) oxygen-barrier dividing layer containing polyvinyl alcohol having a low saponification degree and a low polymerization degree generally exhibits excellent characteristics in a polymer material, in which thermal conductivity and density are proportional to each other. However, the higher the degree of polymerization and the higher the degree of polymerization of polyvinyl alcohol, the higher the density due to intermolecular interaction and the higher the thermal conductivity, so the polyvinyl alcohol has a low degree of saponification and a low molecular weight. It is considered that the use of, results in low thermal conductivity and high thermal stability.
 (C)酸素遮断性分割層には、上述の低鹸化度でかつ低重合度のポリビニルアルコールの他に、所望により塗工性や安定性を調整するための界面活性剤や可塑剤などの添加剤を含有させることができる。 (C) In addition to the low saponification degree and low polymerization degree polyvinyl alcohol described above, addition of a surfactant, a plasticizer, etc. to adjust coating properties and stability as required An agent can be included.
 上述の低鹸化度でかつ低重合度のポリビニルアルコールの使用量は、(C)分割層を構成する全固形分に対して50重量%以上が好ましく、より好ましくは60重量%以上である。この使用量であれば、レーザー融蝕による熱的ダメージに十分に耐えることができる。また、均一な皮膜の形成が可能となるため、感光性樹脂層や感熱マスク層との接着力が十分に得られる。 The amount of polyvinyl alcohol having a low saponification degree and a low polymerization degree described above is preferably 50% by weight or more, more preferably 60% by weight or more based on the total solid content constituting the (C) divided layer. This amount can sufficiently withstand thermal damage due to laser ablation. In addition, since a uniform film can be formed, sufficient adhesion with the photosensitive resin layer and the heat-sensitive mask layer can be obtained.
 (C)酸素遮断性分割層の厚さは、15μm以下が好ましく、0.1μm以上5μm以下がより好ましい。厚さが上記範囲を超えると、紫外光を露光した際の該層による光の屈曲や散乱が生じ、シャープなレリーフ画像が得られないおそれがある。また、上記範囲未満では、酸素遮断性が不十分になり、レリーフの版面に荒れが生じるおそれがある。 (C) The thickness of the oxygen-barrier dividing layer is preferably 15 μm or less, more preferably 0.1 μm or more and 5 μm or less. If the thickness exceeds the above range, the layer may be bent or scattered when exposed to ultraviolet light, and a sharp relief image may not be obtained. On the other hand, if the amount is less than the above range, the oxygen barrier property is insufficient, and the relief plate surface may be roughened.
 本発明の原版に使用される(D)感熱マスク層は、本発明の原版が水現像型であるために、水溶性または水分散性であることが必要である。本発明において、(D)感熱マスク層が水溶性または水分散性であるとは、(D)感熱マスク層単体が、水を主成分とする現像液中でブラシで擦ることにより溶解または分散する性質を具備することを指す。 The (D) heat-sensitive mask layer used in the original plate of the present invention needs to be water-soluble or water-dispersible because the original plate of the present invention is a water developing type. In the present invention, (D) the heat-sensitive mask layer is water-soluble or water-dispersible. (D) the heat-sensitive mask layer alone is dissolved or dispersed by rubbing with a brush in a developer containing water as a main component. It means having properties.
 本発明の原版に使用される(D)感熱マスク層は、バインダーと、赤外線レーザーを吸収し熱に変換する機能と紫外光を遮断する機能を有するカーボンブラックとから構成される。また、これら以外の任意成分として、顔料分散剤、フィラー、界面活性剤又は塗布助剤などを本発明の効果を損なわない範囲で含有することができる。 (D) The heat-sensitive mask layer used in the original plate of the present invention is composed of a binder and carbon black having a function of absorbing infrared laser and converting it into heat and a function of blocking ultraviolet light. Further, as an optional component other than these, a pigment dispersant, a filler, a surfactant, a coating aid, or the like can be contained within a range that does not impair the effects of the present invention.
 (D)感熱マスク層は、感光性樹脂層への化学線の到達を阻止するために、化学線に関して2.0以上の光学濃度であることが好ましい。さらに好ましくは2.0~3.0の光学濃度であり、特に好ましくは、2.2~2.5の光学濃度である。 (D) The thermal mask layer preferably has an optical density of 2.0 or more with respect to actinic radiation in order to prevent the actinic radiation from reaching the photosensitive resin layer. An optical density of 2.0 to 3.0 is more preferable, and an optical density of 2.2 to 2.5 is particularly preferable.
 上記光学濃度は、以下の式で定義される。
  光学濃度=log10(100/T)=log10(I/I)
(ここで、Tは透過率(単位は%)、Iは透過率測定の際の入射光強度、Iは透過光強度である)。
The optical density is defined by the following formula.
Optical density = log 10 (100 / T) = log 10 (I 0 / I)
(Here, T is transmittance (unit:%), I 0 is incident light intensity at the time of measuring transmittance, and I is transmitted light intensity).
 光学濃度の測定には、入射光強度を一定にして透過光強度の測定値から算出する方法と、ある透過光強度に達するまでに必要な入射光強度の測定値から算出する方法が知られているが、本発明における光学濃度は前者の透過光強度から算出した値を言う。 For optical density measurement, there are known methods of calculating from the measured value of transmitted light intensity with a constant incident light intensity and calculating from the measured value of incident light intensity required to reach a certain transmitted light intensity. However, the optical density in the present invention is a value calculated from the former transmitted light intensity.
 光学濃度は、例えば白黒透過濃度計DM-520(大日本スクリーン製造(株))を用いることで測定することができる。 The optical density can be measured by using, for example, a black and white transmission densitometer DM-520 (Dainippon Screen Mfg. Co., Ltd.).
 (D)感熱マスク層の厚さは0.5~5.0μmが好ましく、1.0~2.0μmがより好ましい。厚さが上記範囲未満では、高い塗工技術を必要とし、一定以上の光学濃度を得ることが困難になりうる。また、上記範囲を超えると、感熱マスク層の蒸発に高いエネルギーを必要とし、コスト的に不利になりうる。 (D) The thickness of the thermal mask layer is preferably 0.5 to 5.0 μm, more preferably 1.0 to 2.0 μm. If the thickness is less than the above range, a high coating technique is required, and it may be difficult to obtain an optical density above a certain level. On the other hand, when the above range is exceeded, high energy is required for evaporation of the thermal mask layer, which may be disadvantageous in terms of cost.
 (D)感熱マスク層に使用されるバインダーとしては、特に限定されないが、極性基を持つ共重合ポリアミドが好ましく用いられる。使用されるポリアミドは、従来公知のカチオン性ポリアミド、ノニオン性ポリアミド、アニオン性ポリアミドから適宜選択することが好ましく、例えば、第三級アミノ基含有ポリアミド、第四級アンモニウム塩基含有ポリアミド、エーテル基含有ポリアミド、スルホン酸基含有ポリアミドなどが挙げられる。 (D) The binder used in the heat-sensitive mask layer is not particularly limited, but a copolymer polyamide having a polar group is preferably used. The polyamide used is preferably appropriately selected from conventionally known cationic polyamides, nonionic polyamides, and anionic polyamides. For example, tertiary amino group-containing polyamides, quaternary ammonium base-containing polyamides, ether group-containing polyamides. And sulfonic acid group-containing polyamide.
 (D)感熱マスク層に使用されるカーボンブラックは、赤外線吸収機能と化学線遮断機能を有し、前記光学濃度と層厚を達成できる濃度のものが適宜用いられるが、一般的には(D)感熱マスク層の総重量に対して1~60重量%、好ましくは10~50重量%で使用される。使用量が上記下限未満では、光学濃度が低くなり、赤外線吸収機能と化学線遮断機能を示さなくなるおそれがある。また、上記上限を越えるとバインダーなどの他成分が不足して、皮膜形成性が低下するおそれがある。 (D) The carbon black used in the heat-sensitive mask layer has an infrared absorption function and an actinic radiation blocking function, and has a concentration that can achieve the optical density and the layer thickness as appropriate. ) It is used in an amount of 1 to 60% by weight, preferably 10 to 50% by weight, based on the total weight of the thermal mask layer. If the amount used is less than the lower limit, the optical density is lowered, and there is a possibility that the infrared absorption function and the actinic radiation blocking function are not exhibited. On the other hand, when the above upper limit is exceeded, other components such as a binder are insufficient, and the film-forming property may be lowered.
 (D)感熱マスク層上には、剥離可能な可撓性カバーフィルムを設けて印刷原版を保護することが好ましい。好適なカバーフィルムとしては、例えばポリエチレンテレフタレートフィルム、ポリエチレンナフタレートフィルム、ポリブチレンテレフタレートフィルムを挙げることができる。しかしながら、このような保護フィルムは絶対に必要というものではない。 (D) It is preferable to protect the printing original plate by providing a peelable flexible cover film on the thermal mask layer. Suitable examples of the cover film include a polyethylene terephthalate film, a polyethylene naphthalate film, and a polybutylene terephthalate film. However, such a protective film is not absolutely necessary.
 本発明の凸版印刷原版を製造する方法は、特に限定されないが、一般的には以下のようにして製造される。
 まず、感熱マスク層を構成するカーボンブラック以外のバインダー等の成分を適当な溶剤に溶解または分散させ、そこにカーボンブラックを分散させて分散液を作製する。次に、このような分散液を感熱マスク層用支持体(例えばPETフィルム)上に塗布して、溶剤を蒸発させる。続いて、分割層を構成する成分の溶解液または分散液を感熱マスク層上に塗布して溶剤を蒸発させ、一方の積層体を作成する。さらに、これとは別に支持体上に塗工により感光性樹脂層を形成し、他方の積層体を作成する。このようにして得られた二つの積層体を、圧力及び/又は加熱下に、感光性樹脂層が感熱マスク層上の分割層に隣接するように積層する。なお、感熱マスク層用支持体は、印刷原版の完成後は剥離可能な可撓性カバーフィルムとなり、感熱マスク層の表面の保護フィルムとして機能する。
The method for producing the relief printing original plate of the present invention is not particularly limited, but is generally produced as follows.
First, components such as binder other than carbon black constituting the heat-sensitive mask layer are dissolved or dispersed in an appropriate solvent, and carbon black is dispersed therein to prepare a dispersion. Next, such a dispersion is applied onto a support for a thermal mask layer (for example, a PET film), and the solvent is evaporated. Subsequently, a solution or dispersion of the components constituting the divided layer is applied onto the heat-sensitive mask layer to evaporate the solvent, thereby creating one laminate. Further, separately from this, a photosensitive resin layer is formed on the support by coating, and the other laminate is prepared. The two laminates thus obtained are laminated so that the photosensitive resin layer is adjacent to the divided layer on the thermal mask layer under pressure and / or heating. The support for the thermal mask layer becomes a peelable flexible cover film after the printing original plate is completed, and functions as a protective film for the surface of the thermal mask layer.
 本発明の印刷原版から印刷版を製造する方法としては、保護フィルムが存在する場合には、まず保護フィルムを感光性印刷版から除去する。その後、感熱マスク層をIRレーザーによりアブレーションして、感光性樹脂層上に画像マスクを形成する。好適なIRレーザの例としては、ND/YAGレーザー(波長1064nm)又はダイオードレーザー(波長例、830nm)を挙げることができる。これらのレーザーシステムは、市販されており、印刷原版を保持する回転円筒ドラム、IRレーザの照射装置、及びレイアウトコンピュータを含む。画像情報は、レイアウトコンピュータからレーザ装置に直接移される。 As a method for producing a printing plate from the printing original plate of the present invention, when a protective film is present, the protective film is first removed from the photosensitive printing plate. Thereafter, the thermal mask layer is ablated with an IR laser to form an image mask on the photosensitive resin layer. Examples of suitable IR lasers include ND / YAG laser (wavelength 1064 nm) or diode laser (wavelength example, 830 nm). These laser systems are commercially available and include a rotating cylindrical drum that holds a printing original, an IR laser irradiation device, and a layout computer. Image information is transferred directly from the layout computer to the laser device.
 画像情報を感熱マスク層に書き込んだ後、感光性印刷原版にマスクを介して活性光線を全面照射する。これは版をレーザシリンダに取り付けた状態で行うことも可能であるが、版をレーザ装置から除去し、慣用の平板な照射ユニットで照射する方が規格外の版サイズに対応可能な点で有利であり一般的である。活性光線としては、150~500nm、特に300~400nmの波長を有する紫外線を使用することができる。その光源としては、低圧水銀灯、高圧水銀灯、超高圧水銀灯、メタルハライドランプ、キセノンランプ、ジルコニウムランプ、カーボンアーク灯、紫外線用蛍光灯等を使用することができる。その後、照射された版は現像され、印刷版を得る。現像工程は、慣用の現像ユニットで実施することができる。 After writing the image information on the heat-sensitive mask layer, the photosensitive printing original plate is irradiated with actinic rays through the mask. This can be done with the plate attached to the laser cylinder, but removing the plate from the laser device and irradiating with a conventional flat irradiation unit is advantageous in that it can cope with non-standard plate sizes. It is general. As the actinic ray, ultraviolet rays having a wavelength of 150 to 500 nm, particularly 300 to 400 nm can be used. As the light source, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a metal halide lamp, a xenon lamp, a zirconium lamp, a carbon arc lamp, an ultraviolet fluorescent lamp, or the like can be used. Thereafter, the irradiated plate is developed to obtain a printing plate. The development step can be performed with a conventional development unit.
 以下、実施例により本発明の効果を具体的に示すが、本発明はこれらの実施例に限定されるものではない。 Hereinafter, the effects of the present invention are specifically shown by examples, but the present invention is not limited to these examples.
<感熱マスク層塗工液の調製>
 ε-カプロラクタム53重量部、N,N’-ビスアミノプロピルピペラジンアジペート38重量部、1,3-ビス(アミノメチル)シクロヘキサンアジペート9重量部とを重合せしめて、融点139℃、比粘度1.95の三級窒素含有ポリアミドを得た。カーボンブラック分散液(AMBK-8 オリエント化学工業(株)製)と上述のようにして得られた三級窒素含有ポリアミドを固形分重量比でカーボンブラック分散液:三級窒素含有ポリアミド=63:37になるよう、メタノール・エタノール・イソプロピルアルコール混合液に溶解し、感熱マスク層塗工液を調製した。
<Preparation of thermal mask layer coating solution>
ε-caprolactam 53 parts by weight, N, N′-bisaminopropylpiperazine adipate 38 parts by weight, 1,3-bis (aminomethyl) cyclohexane adipate 9 parts by weight were polymerized to have a melting point of 139 ° C. and a specific viscosity of 1.95. A tertiary nitrogen-containing polyamide was obtained. Carbon black dispersion (AMBK-8 manufactured by Orient Chemical Co., Ltd.) and the tertiary nitrogen-containing polyamide obtained as described above in a solid weight ratio of carbon black dispersion: tertiary nitrogen-containing polyamide = 63: 37 The solution was dissolved in a methanol / ethanol / isopropyl alcohol mixed solution to prepare a thermal mask layer coating solution.
<分割層塗工液の調製>
 下記のようにして得た各種の鹸化度および重合度を有するポリビニルアルコール(PVA505、PVA405、PVA403、PVA205、PVA-1~7)を水・イソプロピルアルコール混合液に溶解し、分割層塗工液を調製した。
<Preparation of split layer coating solution>
Polyvinyl alcohols (PVA505, PVA405, PVA403, PVA205, PVA-1 to 7) having various saponification degrees and polymerization degrees obtained as described below were dissolved in a water / isopropyl alcohol mixed solution, and a divided layer coating solution was prepared. Prepared.
 ポリビニルアルコールPVA505、PVA405、PVA403、PVA205はクラレ(株)製のクラレポバールを使用した。 Polyvinyl alcohol PVA505, PVA405, PVA403, and PVA205 used Kuraray Poval manufactured by Kuraray Co., Ltd.
 ポリビニルアルコールPVA-1は次のようにして合成した。酢酸ビニル50重量部、メタノール60重量部を窒素置換下、60℃で重合せしめ、重合度が100に達したところで冷却して重合を停止した。次いで、未反応の酢酸ビニルを除去し、ポリ酢酸ビニルのメタノール溶液を得た。得られた溶液にNaOHメタノール溶液(10%濃度)を添加して脱酢酸し、鹸化度63モル%のポリビニルアルコールPVA-1を得た。 Polyvinyl alcohol PVA-1 was synthesized as follows. 50 parts by weight of vinyl acetate and 60 parts by weight of methanol were polymerized at 60 ° C. under nitrogen substitution, and when the degree of polymerization reached 100, the polymerization was terminated by cooling. Next, unreacted vinyl acetate was removed to obtain a methanol solution of polyvinyl acetate. A NaOH methanol solution (10% concentration) was added to the resulting solution for deacetic acid to obtain polyvinyl alcohol PVA-1 having a saponification degree of 63 mol%.
 ポリビニルアルコールPVA-2~5は次のようにして合成した。ポリビニルアルコールPVA-1と同様にして酢酸ビニル50重量部、メタノール60重量部を窒素置換下、60℃で重合せしめ、重合度が300、500、700、1000に達したところで冷却して重合を停止した。次いで、未反応の酢酸ビニルを除去し、ポリ酢酸ビニルのメタノール溶液を得た。得られた溶液にNaOHメタノール溶液(10%濃度)を添加して脱酢酸し、重合度が300で鹸化度63モル%のポリビニルアルコールPVA-2、重合度が500で鹸化度63モル%のポリビニルアルコールPVA-3、重合度が700で鹸化度63モル%のポリビニルアルコールPVA-4、及び重合度が1000で鹸化度63モル%のポリビニルアルコールPVA-5を得た。 Polyvinyl alcohol PVA-2 to 5 were synthesized as follows. In the same manner as polyvinyl alcohol PVA-1, 50 parts by weight of vinyl acetate and 60 parts by weight of methanol were polymerized at 60 ° C. under nitrogen substitution, and when the degree of polymerization reached 300, 500, 700, 1000, the polymerization was terminated by cooling. did. Next, unreacted vinyl acetate was removed to obtain a methanol solution of polyvinyl acetate. A NaOH methanol solution (10% concentration) was added to the resulting solution to remove acetic acid, polyvinyl alcohol PVA-2 having a polymerization degree of 300 and a saponification degree of 63 mol%, and a polyvinyl alcohol having a polymerization degree of 500 and a saponification degree of 63 mol%. Alcohol PVA-3, polyvinyl alcohol PVA-4 having a polymerization degree of 700 and a saponification degree of 63 mol%, and polyvinyl alcohol PVA-5 having a polymerization degree of 1000 and a saponification degree of 63 mol% were obtained.
 ポリビニルアルコールPVA-6は次のようにして合成した。酢酸ビニル50重量部、メタノール60重量部を窒素置換下、60℃で重合せしめ、重合度が700に達したところで冷却して重合を停止した。次いで、未反応の酢酸ビニルを除去し、ポリ酢酸ビニルのメタノール溶液を得た。得られた溶液にNaOHメタノール溶液(15%濃度)を添加して脱酢酸し、鹸化度80モル%のポリビニルアルコールPVA-6を得た。 Polyvinyl alcohol PVA-6 was synthesized as follows. 50 parts by weight of vinyl acetate and 60 parts by weight of methanol were polymerized at 60 ° C. under nitrogen substitution, and when the degree of polymerization reached 700, the polymerization was terminated by cooling. Next, unreacted vinyl acetate was removed to obtain a methanol solution of polyvinyl acetate. A NaOH methanol solution (15% concentration) was added to the resulting solution for deacetic acid to obtain polyvinyl alcohol PVA-6 having a saponification degree of 80 mol%.
 ポリビニルアルコールPVA-7は次のようにして合成した。酢酸ビニル50重量部、メタノール60重量部を窒素置換下、60℃で重合せしめ、重合度が500に達したところで冷却して重合を停止した。次いで、未反応の酢酸ビニルを除去し、ポリ酢酸ビニルのメタノール溶液を得た。得られた溶液にNaOHメタノール溶液(7%濃度)を添加して脱酢酸し、鹸化度50モル%のポリビニルアルコールPVA-7を得た。 Polyvinyl alcohol PVA-7 was synthesized as follows. 50 parts by weight of vinyl acetate and 60 parts by weight of methanol were polymerized at 60 ° C. under nitrogen substitution, and when the degree of polymerization reached 500, the polymerization was terminated by cooling. Next, unreacted vinyl acetate was removed to obtain a methanol solution of polyvinyl acetate. A NaOH methanol solution (7% concentration) was added to the resulting solution for deacetic acid to obtain polyvinyl alcohol PVA-7 having a saponification degree of 50 mol%.
<積層フィルムXの作製>
 両面に離形処理を施した100μmのPETフィルム上に感熱マスク層塗工液を適切な種類のバーコーターを用いて塗工し、120℃で5分間乾燥し、PETフィルム上に膜厚1.5μmの感熱マスク層を積層した。この時の光学濃度は2.3であった。この光学濃度は、白黒透過濃度計DM-520(大日本スクリーン製造(株))によって測定した。
 次いで、上記感熱マスク層の上に分割層塗工液を適切な種類のバーコーターを用いて塗工し、120℃で5分間乾燥し、PETフィルム上に膜厚1.5μmの感熱マスク層と膜厚3.0μmの分割層をこの順に積層されている積層フィルムXを得た。
<Preparation of laminated film X>
A heat-sensitive mask layer coating solution was applied onto a 100 μm PET film subjected to a release treatment on both sides using a suitable type of bar coater, dried at 120 ° C. for 5 minutes, and a film thickness of 1. A 5 μm thermal mask layer was laminated. The optical density at this time was 2.3. This optical density was measured with a black and white transmission densitometer DM-520 (Dainippon Screen Mfg. Co., Ltd.).
Next, a split layer coating solution is applied onto the thermal mask layer using an appropriate type of bar coater, dried at 120 ° C. for 5 minutes, and a thermal mask layer having a thickness of 1.5 μm on the PET film and A laminated film X in which divided layers having a thickness of 3.0 μm were laminated in this order was obtained.
<感光性樹脂層Aを有する感光性凸版印刷原版の調製>
 ε-カプロラクタム53重量部、N,N’-ビスアミノプロピルピペラジンアジペート38重量部、1,3-ビス(アミノメチル)シクロヘキサンアジペート9重量部とを重合せしめて、融点139℃、比粘度1.95の三級窒素含有ポリアミドを得た。得られたポリアミド55部をメタノール200重量部、水24重量部に溶解し、この溶液にメタクリル酸3重量部、トリメチロールプロパントリグリシジルエーテルとアクリル酸35モル%及び、メタクリル酸65モル%との反応物36部、N-エチル-p-トルエンスルホンアミド5重量部、ハイドロキノンモノメチルエーテル0.1重量部、ベンジルジメチルケタール1重量部を加え、感光性樹脂組成物溶液を得た。この感光性樹脂溶液を濃縮機に送り、110℃で濃縮して感光性樹脂組成物Aを得た。次いで、250μmのPETフィルムに接着剤を20μmコートして得た支持体フィルムの接着剤塗布面側と、前記積層フィルムXの分割層側との間に感光性樹脂組成物Aを挟み込み、110℃で加熱プレスして、全厚み950μmの感光性凸版印刷原版を作成した。
<Preparation of photosensitive letterpress printing original plate having photosensitive resin layer A>
ε-caprolactam 53 parts by weight, N, N′-bisaminopropylpiperazine adipate 38 parts by weight, 1,3-bis (aminomethyl) cyclohexane adipate 9 parts by weight were polymerized to have a melting point of 139 ° C. and a specific viscosity of 1.95. A tertiary nitrogen-containing polyamide was obtained. 55 parts of the obtained polyamide was dissolved in 200 parts by weight of methanol and 24 parts by weight of water. In this solution, 3 parts by weight of methacrylic acid, 35 mol% of trimethylolpropane triglycidyl ether, 35 mol% of acrylic acid and 65 mol% of methacrylic acid were added. 36 parts of the reaction product, 5 parts by weight of N-ethyl-p-toluenesulfonamide, 0.1 part by weight of hydroquinone monomethyl ether, and 1 part by weight of benzyldimethyl ketal were added to obtain a photosensitive resin composition solution. This photosensitive resin solution was sent to a concentrator and concentrated at 110 ° C. to obtain a photosensitive resin composition A. Next, the photosensitive resin composition A is sandwiched between the adhesive-coated surface side of the support film obtained by coating the adhesive film on the 250 μm PET film to 20 μm and the divided layer side of the laminated film X at 110 ° C. Was heated and pressed to prepare a photosensitive relief printing original plate having a total thickness of 950 μm.
<感光性樹脂層Bを有する感光性凸版印刷原版の調製>
 N,N’-ビス(3-アミノプロピル)ピペラジン80部と2-メチルペンタメチレンジアミン20部をメタノール1000部に溶解した後、該ジアミン溶液にポリエチレングリコール(平均分子量600)600部とヘキサメチレンジイソシアネート369部を反応させて得られた実質的に両末端にイソシアネート基を有するウレタンオリゴマー450部を、撹拌下徐々に添加した。両者の反応は約15分で完了し、比粘度が1.75の三級窒素含有ポリエーテルウレアウレタンを得た。得られたポリエーテルウレアウレタン55.0部を、メタノール100部に65℃で加熱溶解し、N-エチルトルエンスルホン酸アミド5.0部、1,4-ナフトキノン0.03部、ハイドロキノンモノメチルエーテル0.1部を添加してさらに30分撹拌溶解させた。その後、乳酸3.6部、グリシジルメタクリレート(GMA)2.5部、水18部、亜硫酸アンモニウム0.3部、シュウ酸0.1部、光重合開始剤としてベンジルジメチルケタール1.0部、2-ヒドロキシ-3-アクリロイルオキシプロピルメタクリレート(日本油脂株式会社製架橋剤ブレンマーGAM)32.5部を添加して30分撹拌溶解させた。この感光性樹脂溶液を濃縮機に送り、110℃で濃縮して感光性樹脂組成物Bを得た。次いで、250μmのPETフィルムに接着剤を20μmコートして得た支持体フィルムの接着剤塗布面側と、前記積層フィルムXの分割層側との間に感光性樹脂組成物Bを挟み込み、110℃で加熱プレスして、全厚み950μmの感光性凸版印刷原版を作成した。
<Preparation of photosensitive letterpress printing original plate having photosensitive resin layer B>
80 parts of N, N'-bis (3-aminopropyl) piperazine and 20 parts of 2-methylpentamethylenediamine are dissolved in 1000 parts of methanol, and then 600 parts of polyethylene glycol (average molecular weight 600) and hexamethylene diisocyanate are added to the diamine solution. 450 parts of a urethane oligomer having isocyanate groups at substantially both ends obtained by reacting 369 parts was gradually added with stirring. Both reactions were completed in about 15 minutes, and a tertiary nitrogen-containing polyether urea urethane having a specific viscosity of 1.75 was obtained. 55.0 parts of the obtained polyetherureaurethane was dissolved in 100 parts of methanol by heating at 65 ° C., and 5.0 parts of N-ethyltoluenesulfonic acid amide, 0.03 part of 1,4-naphthoquinone, hydroquinone monomethyl ether 0 .1 part was added and stirred and dissolved for another 30 minutes. Thereafter, 3.6 parts of lactic acid, 2.5 parts of glycidyl methacrylate (GMA), 18 parts of water, 0.3 part of ammonium sulfite, 0.1 part of oxalic acid, 1.0 part of benzyl dimethyl ketal as a photopolymerization initiator, 32.5 parts of -hydroxy-3-acryloyloxypropyl methacrylate (Nippon Yushi Co., Ltd. cross-linking agent Blemmer GAM) was added and dissolved by stirring for 30 minutes. This photosensitive resin solution was sent to a concentrator and concentrated at 110 ° C. to obtain a photosensitive resin composition B. Subsequently, the photosensitive resin composition B is sandwiched between the adhesive-coated surface side of the support film obtained by coating the 250 μm PET film with 20 μm of adhesive and the divided layer side of the laminated film X at 110 ° C. Was heated and pressed to prepare a photosensitive relief printing original plate having a total thickness of 950 μm.
<感光性樹脂層Cを有する感光性凸版印刷原版の調製>
 nyloprint(登録商標)WF95H(BASF社製)のフィルムベース上に配置された水現像可能な市販の凸版印刷板から保護フィルムを剥離した。次いで、混合比9:1のn-プロパノールと水の混合物を使用し、保護フィルムを剥離した方の面に前記積層フィルムXを積層させ、感光性凸版印刷原版を得た。
<Preparation of photosensitive letterpress printing original plate having photosensitive resin layer C>
The protective film was peeled off from a commercially available relief printing plate capable of being developed on water placed on a film base of nyloprint (registered trademark) WF95H (manufactured by BASF). Next, using a mixture of n-propanol and water in a mixing ratio of 9: 1, the laminated film X was laminated on the surface from which the protective film was peeled off to obtain a photosensitive relief printing original plate.
<感光性樹脂層Dを有する感光性凸版印刷原版の調製>
 TORELIEF(登録商標)WF95DT IV(東レ社製)のフィルムベース上に配置された水現像可能な市販の凸版印刷板から保護フィルムを剥離した。次いで、混合比18:1のn-プロパノールと水の混合物を使用し、保護フィルムを剥離した方の面に前記積層フィルムXを積層させ、感光性凸版印刷原版を得た。
<Preparation of photosensitive letterpress printing original plate having photosensitive resin layer D>
The protective film was peeled off from a commercially available relief printing plate capable of being developed with water on a film base of TORELIEF (registered trademark) WF95DT IV (manufactured by Toray Industries, Inc.). Next, using a mixture of n-propanol and water having a mixing ratio of 18: 1, the laminated film X was laminated on the surface from which the protective film was peeled off to obtain a photosensitive relief printing original plate.
<印刷版の作製>
 感光性凸版印刷原版から保護フィルムを剥離した後、外面ドラム型IRレーザ装置にて(C)感熱マスク層に描画した。IRレーザー装置は、CDI Spark2530(エスコグラフィックス(株)社)、ThermoFlex Narrow(Kodak(株)製)を使用した。アブレーション条件は、それぞれのレーザー装置で、上記感感熱マスク層がレーザー照射により実質上分解、蒸散される条件に設定した。描画された原版を活性光線で75秒(Philips10R、365nmにおける照度8mW/cm)UV露光したのち、ブラシ式洗出し機・乾燥機一体型装置(日本電子精機(株)JOWA2 SD)で2分30秒洗い出し、60℃10分の乾燥を行った。その後に、後露光として75秒(Philips10R、365nmにおける照度8mW/cm)UV露光し、印刷版を得た。
<Preparation of printing plate>
The protective film was peeled off from the photosensitive relief printing original plate, and then drawn on the (C) thermal mask layer with an external drum IR laser device. As the IR laser device, CDI Spark 2530 (Esco Graphics Co., Ltd.) and ThermoFlex Narrow (manufactured by Kodak Co., Ltd.) were used. The ablation conditions were set such that the thermal mask layer was substantially decomposed and evaporated by laser irradiation in each laser device. The drawn original is exposed to UV rays for 75 seconds (Philips 10R, illuminance 8 mW / cm 2 at 365 nm), and then exposed to a brush-type washing machine / dryer integrated device (JEWA2 SD JOWA2 SD) for 2 minutes. It was washed out for 30 seconds and dried at 60 ° C. for 10 minutes. Thereafter, as a post-exposure, UV exposure was performed for 75 seconds (Philips 10R, illuminance 8 mW / cm 2 at 365 nm) to obtain a printing plate.
実施例1~8、比較例1~7
 表1又は表2に記載の条件に従って、上記の方法により実施例1~8及び比較例1~7の各印刷版を得た。そして、得られた各印刷版を以下のようにして評価した。評価結果を表1又は表2に示す。
Examples 1-8, Comparative Examples 1-7
According to the conditions described in Table 1 or Table 2, printing plates of Examples 1 to 8 and Comparative Examples 1 to 7 were obtained by the above method. The obtained printing plates were evaluated as follows. The evaluation results are shown in Table 1 or Table 2.
レーザー許容性の評価
 コンピュータ製版技術に好適なレーザシステムは、印刷原版を保持する回転円筒ドラム、赤外線レーザの照射装置、及びレイアウトコンピュータを含む。アブレーション条件は、感熱マスク層がレーザー照射により実質上分解、蒸散される条件に設定される。アブレーション条件は、具体的には回転円筒ドラムの回転数(レーザー照射時間)と、レーザー照射出力値(レーザーエネルギー)により設定される。好適なレーザシステムとして様々なレーザー装置が市販されているが、そのアブレーション条件や良好なレリーフを与えるアブレーション適正範囲はレーザー装置により異なる。そこで、CDI Spark2530(エスコグラフィックス(株)社)を用いて様々なアブレーション条件にてマスク描写を行った。マスク描写後の版表面を超深度レーザー微鏡で観察し、凹凸、うねり、皺などの微細な荒れの有無を確認した。判定は以下の通りに行った。
  ○:版表面に凹凸、うねり、皺などの荒れなし
  △:版表面の一部に軽微な凹凸、うねり、皺があり。
  ×:版表面に凹凸、うねり、皺などの荒れが生じた
 マスク描写後の版表面の状態の例として、実施例3、比較例1における顕微鏡写真を図1、図2に示す。
  アブレーション条件:CDI Spark2530、200rpm、9W
  超深度レーザー顕微鏡:KEYENCE VK-9500、観察倍率100倍
Evaluation of Laser Acceptability A laser system suitable for computer plate making technology includes a rotating cylindrical drum that holds a printing original plate, an infrared laser irradiation device, and a layout computer. Ablation conditions are set such that the thermal mask layer is substantially decomposed and evaporated by laser irradiation. The ablation condition is specifically set by the number of rotations of the rotating cylindrical drum (laser irradiation time) and the laser irradiation output value (laser energy). Various laser apparatuses are commercially available as suitable laser systems, but the ablation conditions and the appropriate ablation range that gives good relief differ depending on the laser apparatus. Therefore, mask drawing was performed under various ablation conditions using CDI Spark 2530 (Esco Graphics Co., Ltd.). The surface of the plate after drawing the mask was observed with an ultra-deep laser microscope to confirm the presence or absence of fine roughness such as irregularities, undulations, and wrinkles. The determination was performed as follows.
○: Roughness such as irregularities, undulations, wrinkles, etc. on the plate surface. Δ: Minor irregularities, undulations, wrinkles on part of the plate surface.
X: Roughness such as irregularities, undulations, wrinkles, etc. occurred on the plate surface As examples of the state of the plate surface after drawing the mask, micrographs in Example 3 and Comparative Example 1 are shown in FIGS.
Ablation conditions: CDI Spark 2530, 200 rpm, 9W
Ultra-deep laser microscope: KEYENCE VK-9500, observation magnification 100 times
画像再現性の評価
 レーザーアブレーションによって得られた150線1%(直径19μm)のマスク層のネガ画像を用いて、以下の方法でレリーフ表面の面積再現率を計算した。なお、網点面積の測定方法は、レリーフ表面を顕微鏡で50倍に拡大し、市販の画像解析ソフトを用いて面積を測定した。画像ソフトとしは市販のものが使用できるが、画像解析ソフト A像くん(旭化成エンジニアリング社製)を用いた画像解析によって網点表面の面積を測定した。
  150線1%のネガマスク層画像に対するレリーフ面積再現率(%)=(B/A)×100
   A:マスク層のネガ画像の網点面積
   B:レリーフの網点面積
Evaluation of image reproducibility The area reproducibility of the relief surface was calculated by the following method using a negative image of a mask layer of 150% 1% (diameter 19 μm) obtained by laser ablation. The halftone dot area was measured by enlarging the relief surface 50 times with a microscope and measuring the area using commercially available image analysis software. Although commercially available image software can be used, the area of the halftone dot surface was measured by image analysis using image analysis software A Image-kun (manufactured by Asahi Kasei Engineering).
Relief area reproduction ratio (%) = (B / A) × 100 for a negative mask layer image of 150% 1%
A: Halftone dot area of negative image of mask layer B: Halftone dot area of relief
耐刷性の評価
 版の表面が弱い場合、印刷部数を増やしていくと、微細なヒビ割れが発生する。このヒビ割れの発生有無を以下に述べる耐刷加速試験にて評価した。印刷機の運転環境は20から25℃、湿度30から40%RHで行った。印刷機は、凸輪転印刷機(三條機械P-20)を用いて1画像すべてに印圧がかかる状態に印刷版を版胴に配置する。印刷版画像の形状は直径16mmの星型で行った。印圧は、通常150~250μm印刷物に対して押し込むところを、450μm押し込んで負荷を過剰に掛けて行った。このときの印刷速度は20~30m/分で行った。インキは、UVインキ(T&K TOKA ベストキュアーUVカラー藍B)を使用、反射濃度計(大日本スクリーン製造DM-800)で0.6以上2.0以下になるようインキ濃度を調整した。印刷用の紙はミラーコートのタック紙(リンテック グロスPW 8K)を用いた。印刷は8000ショットまで行ない、ヒビ割れ発生が生じたものを不可として判定した。ヒビ割れ発生の評価は、印刷物に現れるヒビ跡の有無をルーペで目視観察することで判定した。
Evaluation of printing durability If the surface of the printing plate is weak, fine cracks occur as the number of printed copies increases. The occurrence of cracks was evaluated by a printing durability acceleration test described below. The operating environment of the printing press was 20 to 25 ° C. and humidity 30 to 40% RH. The printing press uses a convex rotary printing press (Mitsugi Machine P-20) to place the printing plate on the plate cylinder in a state where printing pressure is applied to all the images. The shape of the printing plate image was a star shape having a diameter of 16 mm. The printing pressure was usually applied to a printed material having a thickness of 150 to 250 μm, but the load was excessively applied by pressing 450 μm. The printing speed at this time was 20 to 30 m / min. As the ink, UV ink (T & K TOKA Best Cure UV Color Indigo B) was used, and the ink density was adjusted to 0.6 or more and 2.0 or less with a reflection densitometer (Dainippon Screen Manufacturing DM-800). Mirror-coated tack paper (Lintec gloss PW 8K) was used as printing paper. Printing was performed up to 8000 shots, and the occurrence of cracks was judged as impossible. The evaluation of the occurrence of cracks was determined by visually observing the presence of crack marks appearing on the printed matter with a loupe.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
 表1から明らかな通り、感光性樹脂層中の合成高分子化合物が三級窒素原子を含有するポリアミド又はポリエーテルウレアウレタンを含有し、かつ分割層が本発明の範囲の低鹸化低重合度のポリビニルアルコールからなる実施例1~8は、どのアブレーション条件を用いた場合でも凹凸、うねり、皺などの荒れのない良好な印刷版を与え、レーザー許容性に優れるといえる。 又、画像再現性については、実施例1~8の画像再現率が95~103%と殆ど太りが見られず、特にポリビニルアルコールの鹸化度が60~80モル%の範囲では画像再現率が95~100%と優れた画像再現性であることが分かる。 As is apparent from Table 1, the synthetic polymer compound in the photosensitive resin layer contains a polyamide or polyether urea urethane containing a tertiary nitrogen atom, and the dividing layer has a low saponification degree and a low polymerization degree within the scope of the present invention. It can be said that Examples 1 to 8 made of polyvinyl alcohol give a good printing plate free from roughness such as irregularities, undulations, wrinkles and the like, and are excellent in laser tolerance under any ablation condition. As for the image reproducibility, the image reproducibility of Examples 1 to 8 is almost 95% to 103%, and the image reproducibility is 95% especially when the saponification degree of polyvinyl alcohol is in the range of 60 to 80 mol%. It can be seen that the image reproducibility is excellent at ˜100%.
 一方、ポリビニルアルコールの鹸化度が本発明の範囲未満の比較例3では画像再現率が92%と小さくなりすぎ、またポリビニルアルコールの鹸化度が本発明の範囲超の比較例2では画像再現率が107%と大きくなりすぎるために好ましくない。また、ポリビニルアルコールの重合度が本発明の範囲超の比較例1及びポリビニルアルコールの鹸化度が本発明の範囲超の比較例2は、アブレーション条件によって版表面に凹凸、うねり、皺などの荒れを生じた。これらの荒れは製版後のレリーフ上でも観察され、印刷性に影響をきたすものであった。ポリビニルアルコールの鹸化度が本発明の範囲未満の比較例3は、どのアブレーション条件を用いた場合でも凹凸、うねり、皺などの荒れは観察されなかった。ところが、鹸化度が低すぎるために水現像することができず、レリーフを得ることができなかった。ポリビニルアルコールの重合度が本発明の範囲未満の比較例4は、分割層塗工液の造膜性に欠け、分割層を作成することができなかった。従って、評価不可能であった。比較例5は、分割層を有さないので、均一な大気酸素条件下で適度の重合阻害を受けながら感光性樹脂層の硬化反応が進行する。よって、版表面に荒れのない良好な印刷版を与える。ところが、印刷版表面の露光硬化不足のため、印刷時に刷版表面ベタ部にヒビ割れが生じやすく、耐刷性に劣るものであった。また、感光性樹脂層中の合成高分子化合物が三級窒素原子を含有するポリアミド又はポリエーテルウレアウレタンを含有しない比較例6~7は、軽微なものではあるが、アブレーション条件によって版表面に軽微な荒れを生じた。耐刷性も実施例の評価よりもやや劣るものであった。 On the other hand, in Comparative Example 3 in which the degree of saponification of polyvinyl alcohol is less than the range of the present invention, the image reproduction rate is too low at 92%, and in Comparative Example 2 in which the degree of saponification of polyvinyl alcohol exceeds the range of the present invention, the image reproduction rate is low. Since it becomes too large with 107%, it is not preferable. In Comparative Example 1 in which the degree of polymerization of polyvinyl alcohol exceeds the range of the present invention and Comparative Example 2 in which the degree of saponification of polyvinyl alcohol exceeds the range of the present invention, roughness of the plate surface such as irregularities, undulations, wrinkles, etc. is caused by ablation conditions. occured. These roughnesses were also observed on the relief after the plate making and had an influence on the printability. In Comparative Example 3 in which the degree of saponification of polyvinyl alcohol was less than the range of the present invention, roughness such as irregularities, undulations and wrinkles was not observed under any ablation condition. However, since the degree of saponification is too low, water development cannot be performed and a relief cannot be obtained. In Comparative Example 4 in which the degree of polymerization of the polyvinyl alcohol was less than the range of the present invention, the film forming property of the divided layer coating liquid was lacking, and a divided layer could not be prepared. Therefore, evaluation was impossible. Since the comparative example 5 does not have a divided layer, the curing reaction of the photosensitive resin layer proceeds while receiving moderate polymerization inhibition under uniform atmospheric oxygen conditions. Therefore, a good printing plate having no rough surface is provided. However, due to insufficient exposure and curing of the printing plate surface, cracks are likely to occur in the solid portion of the printing plate surface during printing, resulting in poor printing durability. In addition, Comparative Examples 6 to 7 in which the synthetic polymer compound in the photosensitive resin layer does not contain a polyamide or polyether urea urethane containing a tertiary nitrogen atom are minor, but the surface of the plate is slightly affected by ablation conditions. Caused rough storms. The printing durability was slightly inferior to the evaluation of the examples.
 本発明の感光性樹脂凸版印刷原版は、アブレーション適正範囲が広いので種々のCTP製版装置によって製版することができ、露光後の版表面の凹凸、うねり、皺、などの微細な荒れが少なく、印刷品位と耐刷性に優れた印刷版を提供することができる。 Since the photosensitive resin relief printing original plate of the present invention has a wide range of appropriate ablation, it can be made by various CTP plate making apparatuses, and there is little fine roughness such as irregularities, undulations, wrinkles, etc. on the exposed plate surface, and a printed product. Can provide a printing plate having excellent printing durability and printing durability.

Claims (2)

  1.  少なくとも(A)支持体、(B)感光性樹脂層、(C)酸素遮断性分割層、(D)カーボンブラックを含有する水溶性または水分散性の感熱マスク層が順次積層されてなる水現像型感光性凸版印刷原版であって、
     (B)感光性樹脂層が、合成高分子化合物、光重合性不飽和化合物、及び光重合開始剤を含有し、前記合成高分子化合物が、三級窒素原子を含有するポリアミド又はポリエーテルウレアウレタンを含有し、かつ、(C)酸素遮断性分割層が、鹸化度60~85モル%、重合度200~800のポリビニルアルコールを含有することを特徴とする感光性凸版印刷原版。
    Water development in which at least (A) a support, (B) a photosensitive resin layer, (C) an oxygen-barrier dividing layer, and (D) a water-soluble or water-dispersible thermal mask layer containing carbon black are sequentially laminated. Type photosensitive letterpress printing original plate,
    (B) Polyamide or polyether urea urethane in which the photosensitive resin layer contains a synthetic polymer compound, a photopolymerizable unsaturated compound, and a photopolymerization initiator, and the synthetic polymer compound contains a tertiary nitrogen atom And (C) an oxygen-barrier dividing layer contains polyvinyl alcohol having a saponification degree of 60 to 85 mol% and a polymerization degree of 200 to 800.
  2.  前記(D)感熱マスク層が、前記(B)感光性樹脂層が含有する前記合成高分子化合物を含有するものであることを特徴とする請求項1に記載の感光性凸版印刷原版。 2. The photosensitive letterpress printing original plate according to claim 1, wherein the (D) heat-sensitive mask layer contains the synthetic polymer compound contained in the photosensitive resin layer (B).
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022181659A1 (en) 2021-02-25 2022-09-01 富士フイルム株式会社 Flexographic printing plate original plate and method for manufacturing flexographic printing plate
WO2023026724A1 (en) 2021-08-24 2023-03-02 東レ株式会社 Photosensitive resin printing plate precursor

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010150844A1 (en) * 2009-06-25 2010-12-29 東洋紡績株式会社 Photosensitive letterpress printing original plate
JP2012022229A (en) * 2010-07-16 2012-02-02 Toray Ind Inc Photosensitive resin printing original plate
JP2013114136A (en) * 2011-11-30 2013-06-10 Toyobo Co Ltd Photosensitive resin letterpress printing plate precursor
JP2013178428A (en) * 2012-02-29 2013-09-09 Toyobo Co Ltd Photosensitive resin letterpress printing original plate
JP2016139130A (en) * 2015-01-23 2016-08-04 東レ株式会社 Photosensitive resin composition, photosensitive resin laminate, and photosensitive resin printing plate precursor

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010150844A1 (en) * 2009-06-25 2010-12-29 東洋紡績株式会社 Photosensitive letterpress printing original plate
JP2012022229A (en) * 2010-07-16 2012-02-02 Toray Ind Inc Photosensitive resin printing original plate
JP2013114136A (en) * 2011-11-30 2013-06-10 Toyobo Co Ltd Photosensitive resin letterpress printing plate precursor
JP2013178428A (en) * 2012-02-29 2013-09-09 Toyobo Co Ltd Photosensitive resin letterpress printing original plate
JP2016139130A (en) * 2015-01-23 2016-08-04 東レ株式会社 Photosensitive resin composition, photosensitive resin laminate, and photosensitive resin printing plate precursor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022181659A1 (en) 2021-02-25 2022-09-01 富士フイルム株式会社 Flexographic printing plate original plate and method for manufacturing flexographic printing plate
WO2023026724A1 (en) 2021-08-24 2023-03-02 東レ株式会社 Photosensitive resin printing plate precursor

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