WO2017047885A1 - Gas barrier film and coating-solution production - Google Patents

Abstract

Provided are: a coating composition which comprises a polymer containing at least one repeating unit from among repeating units represented by chemical formula 1 below and repeating units represented by chemical formula 2 below, and comprises inorganic fine particles containing a hydroxyl group, and also comprises a solvent; a barrier film containing an undercoating layer produced from the coating composition; and a production method for the barrier film.

Description

Gas barrier film and coating solution manufacturing

The present invention relates to a coating composition, a barrier film comprising the same and a method for producing the barrier film.

Since most foods are composed of organic materials, they are vulnerable to moisture and other gases, and are currently widely used as food packaging materials by applying various gas barrier materials that can block moisture, oxygen, carbon dioxide, nitrogen, and ultraviolet rays.

Furthermore, since electronic materials used in display devices and the like as well as food are sensitive to moisture and gas, etc., the gas barrier materials have increased demands in electronic and chemical fields as well as in the food field.

As a gas barrier material, polymer resins such as polyethylene, polypropylene, and polyvinylidene chloride are widely used. However, the polymer resin alone is insufficient to block oxygen or moisture, and is based on various organic materials used in display devices. Materials (elements) are very sensitive to moisture and oxygen, and very strict moisture and gas barrier properties are required.

Therefore, in order to meet the demand, research on barrier films and the like excellent in moisture and gas barrier properties has been continued.

One embodiment of the present invention is to provide a coating composition for producing a barrier film not only excellent in moisture and gas barrier properties, but also excellent in adhesion and low in appearance of foreign matters.

Another embodiment is to provide a barrier film having excellent moisture and gas barrier properties, etc. prepared using the coating composition.

Another embodiment is to provide a method of manufacturing the barrier film.

One embodiment of the present invention provides a coating composition comprising a polymer comprising a repeating unit represented by Formula 1 below and at least one repeating unit represented by Formula 2 below, inorganic fine particles including a hydroxy group, and a solvent. do.

[Formula 1]

[Formula 2]

The inorganic fine particles including the hydroxy group may be silica sol.

The inorganic fine particles including the hydroxy group may be included in an amount of 50 parts by weight to 200 parts by weight based on 100 parts by weight of the polymer.

The coating composition may include 50 parts by weight to 200 parts by weight of the inorganic fine particles including the hydroxy group and 10 parts by weight to 100 parts by weight of the solvent, based on 100 parts by weight of the polymer.

Another embodiment of the present invention is a base film; An undercoat layer on the base film; And a first polymer layer positioned on the undercoat layer, wherein the undercoat layer provides a barrier film prepared from the coating composition.

The first polymer layer may include perhydropolysilazane (PHPS).

The barrier film may further include a second polymer layer positioned on the first polymer layer.

The second polymer layer is a phenoxy resin, polyvinyl alcohol (PVA; polyvinyl alcohol), polyvinylidene chloride (PVDC; Polyvinylidene chloride), ethylene vinyl alcohol (EVOH; Ethylene vinyl alcohol), polyacrylonitrile (PAN; polyacrylonitrile), polychlorotrifluoroethylene (PCTFE; Polychlorotrifluoroethylene) or a combination thereof.

The base film is polyethylene terephthalate (PET; polyethyleneterephthalate), polyethylene (PE; Polyethylene), polypropylene (PP; Polypropylene), polycarbonate (PC; polycarbonate), polymethyl methacrylate (PMMA; Poly (methyl methacrylate)) , Polyimide (PI; polyimide), oriented polypropylene (OPP), biaxially oriented polypropylene (BOPP), polyethylene 2,6-dicarboxyl naphthalate (PEN; Polyethylene 2,6-dicarboxyl naphthalate), polyethersulfone (PES; polyethersulfone), polyester (Polyester) or polystyrene (PS; Polystyrene) may be included.

The base film may include an inorganic film on its surface.

The inorganic layer may include silicon oxide, aluminum oxide, titanium oxide, tantalum oxide, silicon nitride, aluminum nitride, titanium nitride, or a combination thereof.

The inorganic film may be formed on the surface of the base film using a sputtering method.

Another embodiment of the present invention comprises the steps of coating and curing the coating composition on a base film; Coating and curing a polymer solution comprising perhydropolysilazane (PHPS); And it provides a barrier film manufacturing method comprising the step of irradiating vacuum ultraviolet light.

Coating and curing the polymer solution containing the perhydropolysilazane (PHPS) perhydropolysilazane (PHPS), after coating the polymer solution containing the perhydro polysilazane (PHPS; perhydropolysilazane) 10 at 50 ℃ to 100 ℃ Drying (curing) for minutes to 60 minutes.

The step of irradiating the vacuum ultraviolet rays, irradiating with 100mJ / ㎠ to 6000mJ / ㎠ for 6 seconds to 300 seconds with an irradiation intensity of 10mW / ㎠ to 200mW / ㎠ using a vacuum ultraviolet ray having a maximum absorption wavelength at 100nm to 200nm It may be a step.

The barrier film manufacturing method, after the step of irradiating the vacuum ultraviolet ray, phenoxy resin, polyvinyl alcohol (PVA; polyvinyl alcohol), polyvinylidene chloride (PVDC; Polyvinylidene chloride), ethylene vinyl alcohol (EVOH; Ethylene vinyl The method may further include coating and curing a polymer solution including alcohol), polyacrylonitrile (PAN), polychlorotrifluoroethylene (PCTFE; Polychlorotrifluoroethylene), or a combination thereof.

The base film is polyethylene terephthalate (PET; polyethyleneterephthalate), polyethylene (PE; Polyethylene), polypropylene (PP; Polypropylene), polycarbonate (PC; polycarbonate), polymethyl methacrylate (PMMA; Poly (methyl methacrylate)) , Polyimide (PI; polyimide), oriented polypropylene (OPP), biaxially oriented polypropylene (BOPP), polyethylene 2,6-dicarboxyl naphthalate (PEN; Polyethylene 2,6-dicarboxyl naphthalate), polyethersulfone (PES; polyethersulfone), polyester (Polyester) or polystyrene (PS; Polystyrene) may be included.

The base film may include an inorganic film on its surface.

The inorganic layer may include silicon oxide, aluminum oxide, titanium oxide, tantalum oxide, silicon nitride, aluminum nitride, titanium nitride, or a combination thereof.

The inorganic film may be formed on the surface of the base film using a sputtering method.

Other details of aspects of the invention are included in the following detailed description.

By using the coating composition according to an embodiment of the present invention, a barrier film having excellent flexibility, transparency, moisture and gas barrier property, adhesion with a base film, and no cracking can be produced in a short time by a simple method. have.

1 is a view showing a barrier film manufacturing method according to an embodiment.

Figure 2 is a schematic diagram showing the structure of the silica sol particles used in the production of the undercoat layer in the barrier film according to an embodiment.

3 and 4 are views showing the structure of the barrier film according to an embodiment independently of each other.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. Rather, the embodiments introduced herein are provided so that the disclosure may be made thorough and complete, and to fully convey the spirit of the present invention to those skilled in the art.

In the drawings, the thicknesses of layers and regions are exaggerated for clarity. In addition, where a layer is mentioned as being "on" ("on") another layer or substrate, it may be formed directly on or above another layer or substrate, or a third layer may be interposed therebetween. . Portions denoted by like reference numerals denote like elements throughout the specification.

Unless stated otherwise in the present specification, "substituted" to "substituted" means that at least one hydrogen atom of the functional group of the present invention is a halogen atom (F, Br, Cl or I), hydroxy group, nitro group, cyano group, amino group ( NH ₂ , NH (R ²⁰⁰ ) or N (R ²⁰¹ ) (R ²⁰² ), wherein R ²⁰⁰ , R ²⁰¹ and R ²⁰² are the same or different from each other, and are each independently C 1 to C 10 alkyl groups, amidino groups, Hydrazine group, hydrazone group, carboxyl group, substituted or unsubstituted alkyl group, substituted or unsubstituted alkenyl group, substituted or unsubstituted alkynyl group, substituted or unsubstituted alicyclic organic group, substituted or unsubstituted aryl group, And it means substituted with one or more substituents selected from the group consisting of a substituted or unsubstituted heterocyclic group.

Unless otherwise stated herein, "combination" means mixed or copolymerized.

Unless otherwise defined in the chemical formulas herein, when a chemical bond is not drawn at the position where the chemical bond is to be drawn, it means that a hydrogen atom is bonded at the position.

In addition, "*" means a part connected with the same or different atoms or formulas unless otherwise defined herein.

One embodiment of the present invention relates to a coating composition, wherein the coating composition is a polymer comprising at least one repeating unit of a repeating unit represented by the following Formula 1 and the repeating unit represented by the following Formula 2, an inorganic containing a hydroxy group Particulates and solvents.

[Formula 1]

[Formula 2]

For example, the polymer may include only the repeating unit represented by Chemical Formula 1. When using a polymer containing only the repeating unit represented by the formula (1), water and gas barrier properties are slightly better than the polymer containing only the repeating unit represented by the formula (2).

For example, the polymer may include, but is not limited to, polyvinylidene chloride (PVDC), polyvinyl alcohol (PVA), or a combination thereof, such as polyvinylidene chloride.

The coating composition according to the embodiment is mixed with a polymer comprising a repeating unit represented by the formula (1) and at least one repeating unit of the repeating unit represented by the formula (2) and inorganic fine particles containing a hydroxy group, in the polymer Can induce a sol-gel reaction.

For example, the inorganic fine particles including the hydroxy group may be a silica sol. In this case, the silica particles in the polymer matrix may undergo a sol-gel reaction, and the remaining hydroxy group not participating in the sol-gel reaction may be described below. 1 Participate in the silica curing reaction during the perhydro polysilazane curing reaction, which is a polymer layer, and has excellent moisture and gas barrier properties, low cracking, strong adhesion, and no foreign material remaining on the exterior of the barrier film. Manufacturing becomes possible. (See Figure 1)

More specifically, it will be described with reference to FIG. 1 showing a method of manufacturing a barrier film according to an embodiment of the present invention. When the first polymer layer, perhydro polysilazane (PHPS), is coated on the undercoat layer on the base film, and then irradiated with vacuum ultraviolet rays, high energy is generated in the short wavelength band. Si-N bonds and Si-H bonds in the hydropolysilazane are broken to generate ammonia gas. In addition, a silica oxide film having a structure of * -Si-O-Si- * is formed by an oxidation reaction by reactive oxygen radicals generated during the vacuum ultraviolet irradiation.

The inorganic fine particles including the hydroxy group may be included in an amount of 50 parts by weight to 200 parts by weight based on 100 parts by weight of the polymer. When the inorganic fine particles including the hydroxy group are included in less than 50 parts by weight with respect to 100 parts by weight of the polymer, water and gas barrier properties are lowered, and the inorganic fine particles including the hydroxy group are 200 parts by weight based on 100 parts by weight of the polymer. When included in excess, moisture and gas barrier properties are not only lowered, foreign matters are generated on the appearance, and cracks are increased.

The coating composition may include 50 parts by weight to 200 parts by weight of the inorganic fine particles including the hydroxy group and 10 parts by weight to 100 parts by weight of the solvent, based on 100 parts by weight of the polymer. For example, the coating composition may include 50 parts by weight to 200 parts by weight of the inorganic fine particles including the hydroxy group and 10 parts by weight to 50 parts by weight of the solvent, based on 100 parts by weight of the polymer.

The solvent may be an alcohol solvent such as methanol, ethanol, propanol, butanol, but is not limited thereto.

Another embodiment of the present invention is a base film; An undercoat layer on the base film; And a first polymer layer positioned on the undercoat layer, wherein the undercoat layer is prepared from the coating composition.

The first polymer layer may include perhydropolysilazane (PHPS). The perhydro polysilazane is subjected to a silica curing reaction together with a hydroxyl group present on the surface of the inorganic fine particles through a curing and vacuum ultraviolet irradiation process, thereby providing a barrier film having excellent moisture and gas barrier properties within a short time. It can manufacture. Specifically, the silicon-hydrogen bond of the perhydro polysilazane is condensation reaction with a hydroxyl group at high temperature (300 ℃) to produce water as a by-product, the water is again hydrolysis of the perhydro polysilazane and condensation reaction of the hydroxyl group It is known to form a silica membrane by acting as a catalyst. The application of high-energy vacuum ultraviolet rays with short wavelengths allows the formation of silica films in a shorter time at lower temperatures with a different curing mechanism than the above theory. The short wavelength vacuum ultraviolet radiation has a photon energy of 166.7 Kcal / mol. This high energy is larger than the Si-N (77 Kcal / mol) and Si-H (76 Kcal / mol) binding energy of PHPS, and is sufficient to break the bond. In addition, ozone and reactive oxygen radicals are generated during vacuum ultraviolet light emission, and the generated oxygen radicals have a very high reactivity. Thus, the silica film (Si-O-Si) is formed by reacting with Si which is broken by photon energy. To form.

For example, the perhydro polysilazane may include at least one of repeating units represented by the following Chemical Formulas 3 to 6.

[Formula 3]

[Formula 4]

[Formula 5]

[Formula 6]

For example, the perhydro polysilazane may include all the repeating units represented by Chemical Formulas 3 to 6.

For example, the perhydro polysilazane may include a repeating unit represented by the following Formula 7.

[Formula 7]

For example, the perhydro polysilazane may include at least one of the repeating units represented by Formula 3 to Formula 6 and the repeating unit represented by Formula 7.

For example, the perhydro polysilazane may include all the repeating units represented by Chemical Formulas 3 to 7.

In the perhydro polysilazane, a part of the hydrogen atoms bonded to the silicon atoms may be substituted with a hydroxy group.

The perhydro polysilazane can be easily synthesized by reacting dihydrogendichlorosilane with an organic base (eg, pyridine or picoline) to form an adduct, and reacting the adduct with ammonia. .

The number average molecular weight of the perhydro polysilazane may be 100 to 50,000, such as 200 to 2,500, and the water and gas barrier properties of the barrier film may be excellent when the number average molecular weight of the perhydro polysilazane is within the above range. .

The barrier film according to the embodiment may further include a second polymer layer positioned on the first polymer layer. By further including the second polymer layer, the barrier film can significantly reduce the occurrence of cracks in the barrier film, as well as better moisture and gas barrier properties.

For example, the second polymer layer may be a phenoxy resin, polyvinyl alcohol (PVA), polyvinylidene chloride (PVDC; Polyvinylidene chloride), ethylene vinyl alcohol (EVOH; ethylene vinyl alcohol), polyacrylonitrile ( Polyacrylonitrile (PAN), polychlorotrifluoroethylene (PCTFE), or combinations thereof, but is not limited thereto.

For example, the second polymer layer may include polyvinylidene chloride (PVDC), and in this case, the second polymer layer may be polyvinylidene chloride (PVDC; Polyvinylidene chloride) in an organic solvent such as DMAc. It can be formed by coating a solution in which the melt is coated on the first polymer layer.

The base film is polyethylene terephthalate (PET; polyethyleneterephthalate), polyethylene (PE; Polyethylene), polypropylene (PP; Polypropylene), polycarbonate (PC; polycarbonate), polymethyl methacrylate (PMMA; Poly (methyl methacrylate)) , Polyimide (PI; polyimide), oriented polypropylene (OPP), biaxially oriented polypropylene (BOPP), polyethylene 2,6-dicarboxyl naphthalate (PEN; Polyethylene 2,6-dicarboxyl naphthalate), polyethersulfone (PES; polyethersulfone), polyester (Polyester) or polystyrene (PS; Polystyrene) may be included.

The base film may include an inorganic film on a surface thereof, and the inorganic film may include silicon oxide, aluminum oxide, titanium oxide, tantalum oxide, silicon nitride, aluminum nitride, titanium nitride, or a combination thereof.

The inorganic film may be formed on the surface of the base film using a sputtering method.

When the inorganic film is formed on the surface of the base film, the inorganic film serves as a gas barrier prevention film, thereby providing excellent moisture and gas barrier properties of the barrier film.

In addition, the base film may be a plasma surface treatment. The plasma surface treatment may be at atmospheric pressure plasma at a gas amount of 0.01 L / min to 100 L / min, substrate movement speed of 0.1 m / min to 1000 m / min, or may be vacuum plasma at an output of 100 W to 5000 W in a vacuum of 20 Pa to 50 Pa. In order to continuously treat the surface treatment and to reduce the processing cost, it is easy to treat it at atmospheric pressure. In the case of atmospheric plasma, nitrogen gas, oxygen gas, or a mixed gas thereof, in particular oxygen gas, is used, and the substrate is irradiated to the surface of the substrate by irradiating the surface of the substrate, or the substrate is irradiated between the electrodes. There is a method of making plasma through gas. On the other hand, the plasma surface treatment time may be 1 minute to 10 minutes. When using a plasma-treated substrate, excellent adhesion in the barrier film can be ensured.

The film may have a thickness of 125 μm or less, such as 50 μm or more and 125 μm or less. When the thickness of the film satisfies the above range, the oxygen and moisture barrier properties are excellent, and the solution casting is easy, so that the solution may be evenly applied as a whole.

Another embodiment of the present invention comprises the steps of coating and curing the coating composition on a base film; Coating and curing a polymer solution comprising perhydropolysilazane (PHPS); And it provides a barrier film manufacturing method comprising the step of irradiating vacuum ultraviolet light.

Coating and curing the coating composition on the base film to form an undercoat layer on the base film, and coating and curing the polymer solution including the perhydropolysilazane (PHPS). The first polymer layer is formed on the undercoat layer.

The coating composition may be coated with a thickness of 0.02 μm to 10 μm, such as 0.2 μm to 5 μm. The coating composition should be coated in the thickness of the above range to prevent cracking of the organic-inorganic composite layer, and has an advantageous effect on processability, gas permeability and optical properties.

Coating and drying the polymer solution containing the perhydropolysilazane (PHPS) perhydropolysilazane (PHPS), after coating the polymer solution containing the perhydro polysilazane (PHPS; perhydropolysilazane) on the undercoat layer 50 Drying at 10 ° C. to 100 ° C. for 10 to 60 minutes .

Specifically, the vacuum ultraviolet ray may mean an ultraviolet ray having a maximum absorption wavelength at 100 nm to 200 nm, and the irradiation intensity and irradiation amount of the vacuum ultraviolet ray may be appropriately set.

For example, the vacuum ultraviolet curing step, using a vacuum ultraviolet ray having a maximum absorption wavelength in 100nm to 200nm irradiation at 100mJ / ㎠ to 6000mJ / ㎠ for 6 seconds to 300 seconds with an irradiation intensity of 10mW / ㎠ to 200mW / ㎠ It may be a step of curing.

Barrier film manufacturing method according to an embodiment, after the step of irradiating the vacuum ultraviolet rays, phenoxy resin, polyvinyl alcohol (PVA; poly vinyl alcohol), polyvinylidene chloride (PVDC; Polyvinylidene chloride), ethylene vinyl alcohol ( Coating and curing a polymer solution comprising EVOH; Ethylene vinyl alcohol), polyacrylonitrile (PAN), polychlorotrifluoroethylene (PCTFE; Polychlorotrifluoroethylene) or a combination thereof on the first polymer layer It may further include.

The phenoxy resin, polyvinyl alcohol (PVA; poly vinyl alcohol), polyvinylidene chloride (PVDC; Polyvinylidene chloride), ethylene vinyl alcohol (EVOH; Ethylene vinyl alcohol), polyacrylonitrile (PAN; polyacrylonitrile), polychloro The second polymer layer is formed by coating and curing a polymer solution including trifluoroethylene (PCTFE; Polychlorotrifluoroethylene) or a combination thereof on the first polymer layer.

The base film and the like are as described above.

Hereinafter, preferred embodiments of the present invention are described. However, the following examples are only preferred embodiments of the present invention, and the present invention is not limited by the following examples.

( Barrier  Film manufacturing)

Example 1

A coating composition (100 parts by weight of polyvinylidene chloride, 100 parts by weight of silica sol and 30 parts by weight of ethanol) was coated on a 125 μm-thick polyethylene terephthalate film having a plasma surface treatment. After bar coating to a thickness, it was cured at 80 ° C on a hot-plate to form an undercoat layer. Thereafter, a perhydro polysilazane solution was barcoated on the undercoat layer, and then dried (cured) at 80 ° C. for 30 minutes, and then irradiated with a short wavelength vacuum ultraviolet ray (λ _max = 172 nm) (irradiation intensity 170 mW). / m ² and exposed at 1200 mJ / cm ² by the Scan method to form a first polymer layer. Thereafter, the polyvinylidene chloride resin dissolved in a dimethylacetamide (DMAc) solvent was bar-coated and cured on the first polymer layer to form a second polymer layer to prepare a barrier film.

Example  2

A barrier film was prepared in the same manner as in Example 1, except that 50 parts by weight of silica sol in the coating composition was used instead of 100 parts by weight.

Example  3

A barrier film was prepared in the same manner as in Example 1, except that 150 parts by weight of silica sol in the coating composition was used instead of 100 parts by weight.

Example  4

A barrier film was prepared in the same manner as in Example 1, except that 200 parts by weight of silica sol in the coating composition was used instead of 100 parts by weight.

Example  5

A barrier film was prepared in the same manner as in Example 1, except that polyvinyl alcohol was used instead of polyvinylidene chloride in the coating composition.

Example  6

In the same manner as in Example 1 except for using a polyethylene terephthalate film (Sputter PET; WVTR = 10 ^-1 g / m ² / day) in which a silicon nitride film was formed on the surface instead of the plasma surface treated polyethylene terephthalate film, The barrier film was prepared. Specifically, the silicon nitride film was formed using a sputtering method. The silicon nitride film was formed by mounting silicon as a target and injecting 50 sccm of Ar gas, forming plasma at a power of 0.5 kWatt, and then injecting nitrogen. By sputtering for seconds, an inorganic film made of silicon nitride was formed.

Example  7

A barrier film was prepared in the same manner as in Example 6, except that polyvinyl alcohol was used instead of polyvinylidene chloride in the coating composition.

Comparative example  One

A barrier film was prepared in the same manner as in Example 1, except that there was no undercoat layer.

Comparative example  2

A barrier film was prepared in the same manner as in Example 6 except that there was no undercoat layer.

Comparative example  3

A barrier film was prepared in the same manner as in Example 1, except that 30 parts by weight of silica sol in the coating composition was used instead of 100 parts by weight.

Comparative example  4

A barrier film was prepared in the same manner as in Example 1, except that 220 parts by weight of silica sol in the coating composition was used instead of 100 parts by weight.

Evaluation 1: Water vapor transmission rate evaluation

At a temperature of 40 ° C. and a relative humidity of 100%, the water vapor transmission rate of the barrier films according to Examples 1 to 7 and Comparative Examples 1 to 4 was measured using a water vapor transmission rate measuring instrument of MOCON Co., Ltd., USA. It was evaluated, and the results are shown in Table 1 below.

Evaluation 2: crack  Rate of occurrence

Cracking of the barrier films according to Examples 1 to 7 and Comparative Examples 1 to 4 was visually evaluated, and the results are shown in Table 1 below. The criteria for evaluation of crack occurrence are as follows.

Presence: Partial cracks (more than 20%) are observed on the surface of the barrier film.

Zero: No cracks are visually observed on the barrier film surface

Evaluation 3: Adhesion Evaluation

In the barrier films according to Examples 1 to 7 and Comparative Examples 1 to 4, 10 x 10 sheaths were cut in 3 x tapes in units of 1 x 1 mm, peeled off with 3M tape, and the remaining number was recorded. Adhesion was evaluated and the results are shown in Table 1 below.

Evaluation 4: appearance evaluation

The dots (foreign materials) and the like on the barrier films according to Examples 1 to 7 and Comparative Examples 1 to 4 were visually evaluated, and the results are shown in Table 1 below. Appearance evaluation criteria are as follows.

Excellent (○): No foreign matter is observed on the surface of barrier film.

Normal (△): Foreign matter is observed on the surface of barrier film (20% or less)

Poor (×): Most foreign matters (more than 80%) are observed on the surface of barrier film

TABLE 1

From Table 1, it is confirmed that the barrier film according to Examples 1 to 7 is superior to the barrier film according to Comparative Examples 1 to 4, moisture barrier property, appearance characteristics, adhesion, etc., and does not generate much cracks. Can be.

The present invention is not limited to the above embodiments, but may be manufactured in various forms, and a person skilled in the art to which the present invention pertains has another specific form without changing the technical spirit or essential features of the present invention. It will be appreciated that the present invention may be practiced as. Therefore, it should be understood that the embodiments described above are exemplary in all respects and not restrictive.

Claims (20)

1. A coating composition comprising a polymer comprising a repeating unit represented by Formula 1 below and at least one repeating unit represented by Formula 2 below, an inorganic fine particle including a hydroxy group, and a solvent.

   [Formula 1]

   

   [Formula 2]

   
2. In claim 1,

   Inorganic fine particles containing the hydroxy group is a coating composition silica sol.
3. In claim 1,

   The inorganic fine particle including the hydroxy group is contained in 50 parts by weight to 200 parts by weight based on 100 parts by weight of the polymer.
4. In claim 1,

   The coating composition is

   For 100 parts by weight of the polymer,

   50 parts by weight to 200 parts by weight of the inorganic fine particles including the hydroxy group and

   Coating composition comprising 10 parts by weight to 100 parts by weight of the solvent.
5. Base film;

   An undercoat layer on the base film; And

   It includes a first polymer layer located on the undercoat layer,

   The undercoat layer is prepared from the coating composition according to any one of claims 1 to 4.
6. In claim 5,

   The first polymer layer is a barrier film including perhydropolysilazane (PHPS; perhydropolysilazane).
7. In claim 5,

   The barrier film further includes a second polymer layer positioned on the first polymer layer.
8. In claim 7,

   The second polymer layer is a phenoxy resin, polyvinyl alcohol (PVA; polyvinyl alcohol), polyvinylidene chloride (PVDC; Polyvinylidene chloride), ethylene vinyl alcohol (EVOH; Ethylene vinyl alcohol), polyacrylonitrile (PAN; polyacrylonitrile), polychlorotrifluoroethylene (PCTFE; Polychlorotrifluoroethylene) or a barrier film comprising a combination thereof.
9. In claim 5,

   The base film is polyethylene terephthalate (PET; polyethyleneterephthalate), polyethylene (PE; Polyethylene), polypropylene (PP; Polypropylene), polycarbonate (PC; polycarbonate), polymethyl methacrylate (PMMA; Poly (methyl methacrylate)) , Polyimide (PI; polyimide), oriented polypropylene (OPP), biaxially oriented polypropylene (BOPP), polyethylene 2,6-dicarboxyl naphthalate (PEN; Polyethylene 2,6-dicarboxyl A barrier film comprising naphthalate, polyethersulfone (PES), polyester (polyester) or polystyrene (PS).
10. In claim 5,

    The base film is a barrier film comprising an inorganic film on its surface.
11. In claim 10,

    The inorganic film includes a silicon oxide, aluminum oxide, titanium oxide, tantalum oxide, silicon nitride, aluminum nitride, titanium nitride or a combination thereof.
12. In claim 10,

    The inorganic film is a barrier film formed on the surface of the base film using a sputtering method.
13. Coating and curing the coating composition according to any one of claims 1 to 4 on a base film;

    Coating and curing a polymer solution comprising perhydropolysilazane (PHPS); And

    Irradiating vacuum ultraviolet light

    Barrier film manufacturing method comprising a.
14. In claim 13,

    Coating and curing the polymer solution containing the perhydropolysilazane (PHPS),

    The method of manufacturing a barrier film, which comprises drying the polymer solution comprising the perhydropolysilazane (PHPS; perhydropolysilazane) at 50 ° C. to 100 ° C. for 10 to 60 minutes.
15. In claim 13,

    Irradiating the vacuum ultraviolet ray,

    Method of producing a barrier film in the step of irradiating with 100mJ / ㎠ to 6000mJ / ㎠ for 6 seconds to 300 seconds with an irradiation intensity of 10mW / ㎠ to 200mW / ㎠ using a vacuum ultraviolet ray having a maximum absorption wavelength at 100nm to 200nm.
16. In claim 13,

    The barrier film manufacturing method,

    After the step of irradiating the vacuum ultraviolet ray,

    Phenoxy resins, polyvinyl alcohol (PVA), polyvinylidene chloride (PVDC), ethylene vinyl alcohol (EVOH; ethylene vinyl alcohol), polyacrylonitrile (PAN), polychlorotrile A method of manufacturing a barrier film further comprising coating and curing a polymer solution including fluoroethylene (PCTFE; Polychlorotrifluoroethylene) or a combination thereof.
17. In claim 13,

    The base film is polyethylene terephthalate (PET; polyethyleneterephthalate), polyethylene (PE; Polyethylene), polypropylene (PP; Polypropylene), polycarbonate (PC; polycarbonate), polymethyl methacrylate (PMMA; Poly (methyl methacrylate)) , Polyimide (PI; polyimide), oriented polypropylene (OPP), biaxially oriented polypropylene (BOPP), polyethylene 2,6-dicarboxyl naphthalate (PEN; Polyethylene 2,6-dicarboxyl A method of manufacturing a barrier film comprising naphthalate, polyethersulfone (PES), polyethersulfone, polyester, or polystyrene (PS).
18. In claim 13,

    The base film is a barrier film manufacturing method comprising an inorganic film on its surface.
19. In claim 13,

    The inorganic film is a barrier film manufacturing method comprising silicon oxide, aluminum oxide, titanium oxide, tantalum oxide, silicon nitride, aluminum nitride, titanium nitride or a combination thereof.
20. In claim 13,

    The inorganic film is a barrier film manufacturing method that is formed on the surface of the base film using a sputtering method.

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