WO2017031785A1 - 透明导电电极的修补装置 - Google Patents

透明导电电极的修补装置 Download PDF

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Publication number
WO2017031785A1
WO2017031785A1 PCT/CN2015/089095 CN2015089095W WO2017031785A1 WO 2017031785 A1 WO2017031785 A1 WO 2017031785A1 CN 2015089095 W CN2015089095 W CN 2015089095W WO 2017031785 A1 WO2017031785 A1 WO 2017031785A1
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Prior art keywords
baffle
electrode
sub
gas insulating
disposed
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English (en)
French (fr)
Inventor
范广宝
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/10—Devices involving relative movement between laser beam and workpiece using a fixed support, i.e. involving moving the laser beam

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a repair device for a transparent conductive electrode.
  • liquid crystal display panels and touch screens generally have transparent conductive electrodes.
  • defects of the transparent conductive electrode may be caused due to process conditions, process environments, and process materials. Generally, it is a film defect of a transparent conductive electrode.
  • the transparent conductive electrode with defects only the lowering treatment or the scrapping treatment can be performed, which reduces the yield of the liquid crystal display panel and causes waste of materials.
  • the technical problem to be solved by the present invention is that there is no device for accurately repairing a defective transparent conductive electrode in the prior art, which reduces the yield of the liquid crystal display panel.
  • the present invention provides a repairing device for a transparent conductive electrode.
  • the repair device includes:
  • a baffle mechanism disposed between the electrode sputtering mechanism and the substrate provided with the electrode to be repaired, and the electrode outputted by the electrode sputtering mechanism is adjusted by forming a channel (A) whose cross-sectional area is adjustable and the position is movable The coverage area and coverage of the particles on the substrate.
  • the baffle mechanism comprises:
  • a first moving portion configured to drive the position and area according to the position of the electrode to be repaired under the control of the controller
  • the first flap portion moves in the X-axis direction
  • a second moving portion configured to drive the second flap portion to move in the Y-axis direction according to the position and the area of the electrode to be repaired under the control of the controller.
  • the first baffle portion includes a first sub baffle and a second sub baffle arranged side by side in the X-axis direction; the second baffle portion includes a third sub-block arranged side by side in the Y-axis direction Plate and fourth sub-baffle.
  • the first sub-baffle and the second sub-baffle respectively reciprocate in the X-axis direction; the third sub-baffle and the fourth sub-baffle respectively reciprocate in the Y-axis direction.
  • the first baffle portion includes a first sub-baffle and a second sub-baffle at right angles in the longitudinal direction; and the second baffle portion includes a third angle at a right angle in the longitudinal direction.
  • the repairing device for the transparent conductive electrode further includes:
  • a baffle driving portion for driving the baffle mechanism to move under the control of the controller such that a position of the channel (A) corresponds to a position of the electrode to be repaired, and the channel is The cross-sectional area of (A) is adapted to the area of the electrode to be repaired.
  • the electrode sputtering mechanism comprises:
  • a sputtering power source electrically coupled to the cathode and the anode, respectively, to generate an electric field between the two poles;
  • a sputtering target and the substrate below the cathode are sequentially disposed.
  • the repairing device for the transparent conductive electrode further includes a laser trimming mechanism for precisely trimming the deposition shape of the electrode particles outputted on the substrate by the electrode sputtering mechanism.
  • the laser finishing mechanism comprises:
  • a first sliding shaft extending in the X-axis direction in the longitudinal direction, the laser generating device being slidably coupled to the first sliding shaft;
  • a second sliding shaft and a third sliding shaft extending in the Y-axis direction, the left end of the first sliding shaft is slidably coupled to the second sliding shaft by a first sliding block, and the right end of the first sliding shaft Sliding connection with the third sliding shaft through the second sliding block;
  • a first driving portion that drives the laser generating device to reciprocate in the X-axis direction
  • a second driving portion that reciprocates the first sliding shaft in the Y-axis direction is driven.
  • the repairing device for the transparent conductive electrode further includes electrode particle transport around the electrode sputtering mechanism.
  • a gas isolation mechanism disposed at the outlet; the gas isolation mechanism includes a plurality of suction ports and a plurality of air blowing ports disposed between the phases.
  • the repairing device for the transparent conductive electrode provided by the embodiment of the invention can accurately repair the defective transparent conductive electrode, and greatly improve the yield of the liquid crystal display panel.
  • FIG. 1 is a schematic structural view of a repairing device for a transparent conductive electrode according to an embodiment of the present invention
  • FIG. 2 is a schematic view showing the structure of the shutter mechanism shown in Figure 1;
  • FIG. 3 is a schematic view showing another structure of the shutter mechanism shown in Figure 1;
  • Fig. 4 is a plan view showing a laser trimming mechanism in an embodiment of the present invention.
  • an embodiment of the present invention provides a repairing device for a transparent conductive electrode.
  • FIG. 1 is a schematic structural view of a repairing device for a transparent conductive electrode according to an embodiment of the present invention.
  • the repairing device described in this embodiment mainly includes an electrode sputtering mechanism and a shutter mechanism 200.
  • the main function of the electrode sputtering mechanism is to generate transparent conductive electrode particles and deposit electrode particles on the substrate 104.
  • the main function of the shutter mechanism 200 is to adjust the coverage area of the electrode particles output by the electrode sputtering mechanism.
  • the electrode sputtering mechanism includes a cathode 101, an anode 102, a sputtering power source (not numbered in the drawing), a sputtering target 103, and a substrate 104 on which a transparent conductive electrode is to be formed.
  • the cathode 101 is located directly above the anode 102.
  • the lower surface of the cathode 101 is disposed opposite to the upper surface of the anode 102.
  • the negative and positive electrodes of the sputtering power supply are respectively connected to the cathode 101 and the anode 102 electrical connection.
  • a vertical electric field is generated between the cathode 101 and the anode 102.
  • the sputtering target 103 is disposed between the cathode 101 and the anode 102.
  • the substrate 104 is located between the sputtering target 103 and the anode 102.
  • a working gas for example, argon gas
  • argon gas forms a plasma in an electric field.
  • the transparent conductive electrode particles for example, ITO particles
  • the transparent conductive electrode particles that have detached from the sputtering target 103 are dropped on the substrate 104 located under the sputtering target 103, and deposited as a transparent conductive film.
  • the channel A shown in Fig. 1 is the deposition path of the transparent conductive electrode particles.
  • FIG. 2 is a schematic view showing the structure of the shutter mechanism 200 shown in FIG. 1.
  • the baffle mechanism 200 in this embodiment mainly includes a controller (not shown), a first baffle portion 210, a second baffle portion 220, and a baffle drive portion (not shown in the drawings. Under the control of the controller, the first baffle portion 210 and the second baffle portion 220 are respectively driven to move in the X-axis and Y-axis directions according to the position and area of the electrode to be repaired.
  • the baffle The driving portion specifically includes a first moving portion and a second moving portion.
  • the controller is preferably one of a central processing unit (CPU), an embedded processor, a single chip microcomputer, and a Programmable Logic Controller (PLC).
  • CPU central processing unit
  • embedded processor e.g., a central processing unit
  • PLC Programmable Logic Controller
  • the first moving portion includes a first stepping motor and a corresponding transmission member.
  • the first moving portion is controlled by the controller to move the first shutter portion 210 in the X-axis direction (horizontal direction) according to the position and size of the electrode to be repaired on the substrate 104 in the X-axis direction shown in FIG. 2.
  • the second moving portion is also controlled by the controller to move the second shutter portion 220 in the Y direction according to the position and size of the electrode to be repaired in the Y-axis direction shown in FIG.
  • the Y-axis direction is a direction perpendicular to the X-axis direction, but is not intended to limit the present invention.
  • the first baffle portion 210 and the second baffle portion 220 are enclosed by the channel A through which the transparent conductive electrode particles pass (see figure 1).
  • the cross-sectional area of the passage A and the specific position with respect to the substrate 104 can be changed by the movement of the first flap portion 210 and the second flap portion 220.
  • the repairing device for the transparent conductive electrode according to the present embodiment adjusts the coverage area and the covering position of the electrode particles finally outputted to the target substrate 104 by the electrode sputtering mechanism by the blocking action of the respective baffle portions.
  • the first flap portion 210 includes a first sub-baffle 211 and a second sub-baffle 212 arranged side by side in the X-axis direction.
  • the second flap portion 220 includes a third sub-baffle 221 and a fourth sub-baffle 222 which are arranged side by side in the Y-axis direction.
  • the first sub-baffle 211, the second sub-baffle 212, the third sub-baffle 221, and the fourth sub-baffle 222 are enclosed by the channel A.
  • the cross-sectional area and position of the passage (A) is changed by the movement of each sub-baffle.
  • the first flap portion 210 includes a first sub-baffle 211 and a second sub-baffle 212 at right angles to each other in the longitudinal direction.
  • the second baffle portion 220 includes a third sub-barrier 221 and a fourth sub-baffle 222 at right angles in the longitudinal direction; the first sub-baffle 211 and the third sub-baffle 221 are parallel in the longitudinal direction, and the second sub-portion The baffle 212 and the fourth sub-baffle 222 are parallel in the longitudinal direction.
  • the first sub-baffle 211, the second sub-baffle 212, the third sub-baffle 221, and the fourth sub-baffle 222 are enclosed by the channel A.
  • the cross-sectional area and position of the passage (A) is changed by the movement of each sub-baffle.
  • the controller controls the rotational speeds of the first stepping motor and the second stepping motor to make the channel A of the corresponding first baffle portion 210 and the second baffle portion 220
  • the cross-sectional area is such that the vertical projection area of channel A on substrate 104 is substantially compliant with the area to be repaired.
  • the electrode sputtering mechanism is activated to generate transparent conductive electrode particles.
  • the large-area transparent conductive electrode particles that are detached are blocked by the first baffle portion 210 and the second baffle portion 220 to be reduced in area, and are deposited along the channel A on the region to be repaired facing the channel A for repair.
  • the baffle mechanism 200 is applied, so that the electrode particles outputted by the electrode sputtering mechanism are completely deposited in the designated area to be repaired, and the repair work of the transparent conductive electrode is realized.
  • the repairing apparatus further includes a laser trimming mechanism as shown in FIG.
  • the main function of the laser trimming mechanism is to precisely trim the deposition shape of the transparent conductive electrode particles outputted to the substrate 104 by the electrode sputtering mechanism.
  • the laser trimming mechanism includes a laser generating device 404 and a laser moving portion that drives the laser generating device 404 to move in the X and Y axis directions.
  • the laser moving portion includes a first sliding shaft 401 extending in the X-axis direction in the longitudinal direction, and a second sliding shaft 402 and a third sliding shaft 403 each extending in the Y-axis direction in the longitudinal direction.
  • the laser generating device 404 is slidably coupled to the first sliding shaft 401.
  • the left and right ends of the first sliding shaft 401 are respectively fitted with a first sliding block (not shown in the drawing) and a second sliding block (not shown in the drawing).
  • the first sliding block is slidably coupled to the second sliding shaft 402, and the second sliding block is slidably coupled to the third sliding shaft 403.
  • the laser moving portion further includes a first driving portion that drives the laser generating device 404 to move in the X-axis direction, and a second driving portion that drives the laser generating device 404 to move in the Y-axis direction.
  • the first drive portion includes a third stepper motor and a corresponding transmission component.
  • the second driving portion includes a fourth stepping motor and a corresponding transmission component. The two stepper motors are also controlled by the controller.
  • the laser generating unit 404 can be moved to an arbitrary position above the substrate 104 by the laser moving portion.
  • the laser light generated by the laser generating device 404 vaporizes the excess transparent conductive electrode particles, so that the deposition shape of the electrode particles completely matches the shape of the electrode to be repaired.
  • the laser trimming mechanism is directly mounted on the electrode sputtering mechanism and the baffle mechanism 200. After the deposition of the transparent conductive electrode particles is completed, the entire electrode sputtering mechanism and the baffle mechanism 200 are directly removed, thereby completing the precision of the laser on the deposition region. Adjustment. It can be understood that the laser trimming mechanism can also be arranged side by side with the electrode sputtering mechanism or the baffle mechanism 200.
  • the present embodiment merely provides a preferred embodiment and is not intended to limit the present invention.
  • the repairing device of the transparent conductive electrode further includes a gas barrier mechanism 300 for forming a vacuum environment required for the reaction in and around the deposition zone corresponding to the channel A. .
  • the gas isolation mechanism 300 in the present embodiment is disposed below the cathode 101 and includes a plurality of air inlets 301 and a plurality of air blowing ports 302.
  • the suction port 301 and the air blowing port 302 are disposed around the channel A with each other.
  • Each of the suction port 301 and the air blowing port 302 are respectively connected to a corresponding air supply pipe (not shown).
  • the specific position of the gas isolation mechanism 300 is not limited to being fixed under the cathode 101 in the present invention, and the arrangement manner of the suction port 301 and the air blowing port 302 is not limited to the alternate arrangement in the present invention, and may also be It is another common structure that can form a vacuum environment, as long as it can ensure a vacuum environment in the deposition area corresponding to the channel A and its surroundings.
  • the embodiment of the present invention can not only accurately repair the pixel electrode, but also accurately repair other transparent conductive electrodes (such as a common electrode, a touch electrode, etc.).
  • the embodiment of the present invention can repair the transparent conductive electrodes of the following display devices: an In-Cell type touch display device, an On-Cell type touch display device, and the like.
  • the repairing device for the transparent conductive electrode provided by the embodiment of the invention can accurately repair the defective transparent conductive electrode, and greatly improve the yield of the liquid crystal display panel.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Liquid Crystal (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

提供了一种透明导电电极的修补装置，其包括：电极溅射机构；以及挡板机构（200），设置在电极溅射机构与设有待修补电极的基板（104）之间，通过形成横截面积可调、位置可移动的通道（A），来调节电极溅射机构输出的电极粒子在基板（104）上的覆盖面积和覆盖位置。因此，能够对缺损的透明导电电极进行精确修补，大幅提高了液晶显示面板的良品率。

Description

透明导电电极的修补装置
本申请要求享有2015年8月26日提交的名称为“透明导电电极的修补装置”的中国专利申请CN201510531327.6的优先权，其全部内容通过引用并入本文中。
技术领域
本发明涉及显示技术领域，尤其涉及一种透明导电电极的修补装置。
背景技术
目前，液晶显示面板及触摸屏一般都具有透明导电电极。在光刻过程中，由于工艺条件、工艺环境及工艺材料等原因，会造成透明导电电极的缺陷。一般表现为透明导电电极的膜缺损。对于此类缺陷，现有技术中不存在对缺损的透明导电电极进行精确修补的装置。而对于带有缺陷的透明导电电极只能做降等处理或者报废处理，降低了液晶显示面板的良品率的同时，造成了材料的浪费。
发明内容
本发明所要解决的技术问题是：现有技术中不存在对缺损的透明导电电极进行精确修补的装置，降低了液晶显示面板的良品率。
为了解决上述技术问题，本发明提供了一种透明导电电极的修补装置。该修补装置包括：
电极溅射机构；以及
挡板机构，设置在所述电极溅射机构与设有待修补电极的基板之间，通过形成横截面积可调、位置可移动的通道(A)，来调节所述电极溅射机构输出的电极粒子在所述基板上的覆盖面积和覆盖位置。
优选的是，所述挡板机构包括：
控制器；
第一挡板部和第二挡板部，所述第一挡板部和所述第二挡板部围成所述通道(A)，且所述通道(A)的横截面积和位置通过各挡板部的移动而改变；
第一移动部，用于在所述控制器的控制下，根据所述待修补电极的位置和面积驱动所 述第一挡板部沿X轴方向移动；以及
第二移动部，用于在所述控制器的控制下，根据所述待修补电极的位置和面积驱动所述第二挡板部沿Y轴方向移动。
优选的是，所述第一挡板部包括沿X轴方向并排布设的第一子挡板和第二子挡板；所述第二挡板部包括沿Y轴方向并排布设的第三子挡板和第四子挡板。
优选的是，所述第一子挡板和所述第二子挡板分别沿X轴方向往复移动；所述第三子挡板和所述第四子挡板分别沿Y轴方向往复移动。
优选的是，所述第一挡板部包括长度方向的夹角呈直角的第一子挡板和第二子挡板；所述第二挡板部包括长度方向的夹角呈直角的第三子挡板和第四子挡板；所述第一子挡板和所述第三子挡板的长度方向平行，所述第二子挡板和所述第四子挡板的长度方向平行。
优选的是，上述透明导电电极的修补装置还包括：
控制器；以及
挡板驱动部，用于在所述控制器的控制下，驱动所述挡板机构移动，以使所述通道(A)的位置与所述待修补电极的位置相对应，并使所述通道(A)的横截面积与所述待修补电极的面积相适配。
优选的是，所述电极溅射机构包括：
相对设置的阴极和阳极；
分别与所述阴极和所述阳极电连接的溅射电源，以在两极间产生电场；以及
依次设置在所述阴极下方的溅射靶和所述基板。
优选的是，上述透明导电电极的修补装置还包括用于精密修整所述电极溅射机构输出的电极粒子在所述基板上的沉积形状的激光修整机构。
优选的是，所述激光修整机构包括：
激光发生装置；
长度方向沿X轴方向延伸的第一滑动轴，所述激光发生装置与所述第一滑动轴滑动连接；
长度方向均沿Y轴方向延伸的第二滑动轴和第三滑动轴，所述第一滑动轴的左端通过第一滑动块与所述第二滑动轴滑动连接，所述第一滑动轴的右端通过第二滑动块与所述第三滑动轴滑动连接；
驱动所述激光发生装置沿X轴方向往复移动的第一驱动部；以及
驱动所述第一滑动轴沿Y轴方向往复移动的第二驱动部。
优选的是，上述透明导电电极的修补装置还包括围绕所述电极溅射机构的电极粒子输 出口设置的气体隔绝机构；所述气体隔绝机构包括相间设置的多个吸气口和多个吹气口。
与现有技术相比，上述方案中的一个或多个实施例可以具有如下优点或有益效果：
应用本发明实施例提供的透明导电电极的修补设备，能够对缺损的透明导电电极进行精确修补，大幅提高了液晶显示面板的良品率。
本发明的其它特征和优点将在随后的说明书中阐述，并且部分地从说明书中变得显而易见，或者通过实施本发明而了解。本发明的目的和其他优点可通过在说明书、权利要求书以及附图中所特别指出的结构来实现和获得。
附图说明
附图用来提供对本发明的进一步理解，并且构成说明书的一部分，与本发明的实施例共同用于解释本发明，并不构成对本发明的限制。在附图中：
图1示出了本发明实施例透明导电电极的修补装置的结构示意图；
图2示出了图1中所示的挡板机构的一种结构示意图；
图3示出了图1中所示的挡板机构的另一种结构示意图；以及
图4示出了本发明实施例中激光修整机构的俯视图。
具体实施方式
以下将结合附图及实施例来详细说明本发明的实施方式，借此对本发明如何应用技术手段来解决技术问题，并达成技术效果的实现过程能充分理解并据以实施。需要说明的是，只要不构成冲突，本发明中的各个实施例以及各实施例中的各个特征可以相互结合，所形成的技术方案均在本发明的保护范围之内。
本发明所要解决的技术问题是：现有技术中不存在对缺损的透明导电电极进行精确修补的装置，降低了液晶显示面板的良品率。为解决上述技术问题，本发明实施例提供了一种透明导电电极的修补装置。
如图1所示，是本发明实施例透明导电电极的修补装置的结构示意图。本实施例所述的修补装置，主要包括电极溅射机构和挡板机构200。其中，电极溅射机构的主要作用是产生透明导电电极粒子，并使电极粒子沉积在基板104上。挡板机构200的主要作用是调节电极溅射机构输出的电极粒子的覆盖面积。
具体地，电极溅射机构包括阴极101、阳极102、溅射电源(图中未标号)、溅射靶103和待形成透明导电电极的基板104。其中，阴极101位于阳极102的正上方。阴极101的下表面与阳极102的上表面相对设置。溅射电源的负极和正极分别与阴极101和阳极 102电连接。这样，在阴极101和阳极102之间产生垂直的电场。溅射靶103设置在阴极101和阳极102之间。基板104位于溅射靶103和阳极102之间。
电极溅射机构工作时，工作气体(例如氩气)在电场中形成等离子体。其中正离子轰击低电位的溅射靶103时，透明导电电极粒子(例如ITO粒子)就会脱离溅射靶103。脱离溅射靶103的透明导电电极粒子掉落在位于溅射靶103下方的基板104上，沉积成透明导电膜。
由于透明导电电极粒子通常是大面积掉落下来的，其面积很难控制。因此，为了提升修补的精度，需要通过增设挡板机构200来调节沉积在目标基板104上的透明导电电极粒子的覆盖面积和覆盖位置。图1中所示的通道A即为透明导电电极粒子的沉积路径。
图2是图1中所示的挡板机构200的一种结构示意图。本实施例中挡板机构200主要包括控制器(图中未示出)、第一挡板部210、第二挡板部220以及挡板驱动部(图中未示出。挡板驱动部用于在控制器的控制下，根据待修补电极的位置和面积，分别驱动第一挡板部210和第二挡板部220沿X轴和Y轴方向移动。在本实施例中，该挡板驱动部具体包括第一移动部和第二移动部。
具体地，控制器优选为中央处理器(CPU，Central Processing Unit)、嵌入式处理器、单片机和可编程逻辑控制器(PLC, Programmable Logic Controller)中的一种。
第一移动部包括第一步进电机及相应的传动部件。第一移动部受控于控制器，以根据基板104上待修补电极在图2所示的X轴方向的位置和尺寸，带动第一挡板部210沿X轴方向(水平方向)移动。第二移动部同样受控于控制器，以根据待修补电极在图2所示的Y轴方向的位置和尺寸，带动第二挡板部220沿Y方向移动。
在本实施例中，Y轴方向为与X轴方向垂直的方向，但并不用于限定本发明。
为实现沉积在目标基板104上的透明导电电极粒子的覆盖面积可根据实际待修补面积调节，第一挡板部210和第二挡板部220合围成供透明导电电极粒子通过的通道A(参见图1)。通道A的横截面积和相对于基板104的具体位置均可通过第一挡板部210和第二挡板部220的移动而改变。这样，本实施例所述的透明导电电极的修补装置通过各个挡板部的阻挡作用，来调整电极溅射机构最终输出至目标基板104上的电极粒子的覆盖面积和覆盖位置。
在本发明一优选的实施例中，仍参照图2，第一挡板部210包括沿X轴方向并排布设的第一子挡板211和第二子挡板212。第二挡板部220包括沿Y轴方向并排布设的第三子挡板221和第四子挡板222。由第一子挡板211、第二子挡板212、第三子挡板221和第四子挡板222合围成上述通道A。通道(A)的横截面积和位置通过各子挡板的移动而改变。
在本发明另一优选的实施例中，参照图3，第一挡板部210包括长度方向的夹角呈直角的第一子挡板211和第二子挡板212。第二挡板部220包括长度方向的夹角呈直角的第三子挡板221和第四子挡板222；第一子挡板211和第三子挡板221的长度方向平行，第二子挡板212和第四子挡板222的长度方向平行。由第一子挡板211、第二子挡板212、第三子挡板221和第四子挡板222合围成通道A。通道(A)的横截面积和位置通过各子挡板的移动而改变。
在进行电极粒子覆盖面积的调节过程中，控制器控制第一步进电机和第二步进电机的转速，以使相应的第一挡板部210和第二挡板部220围成的通道A的横截面积，使通道A在基板104上的垂直投影区域与待修补的区域大致稳合。然后，启动电极溅射机构产生透明导电电极粒子。脱离的大面积的透明导电电极粒子受到第一挡板部210和第二挡板部220的阻挡而面积减小，并沿通道A沉积在与通道A正对的待修补区域上进行修补。本实施例应用挡板机构200，使得电极溅射机构输出的电极粒子完全沉积在指定的待修补的区域，实现了透明导电电极的修补工作。
在实际的修补过程中，由于待修补区域检测误差以及通道A的截面形状的限定等原因，本实施例修补设备沉积的电极粒子的沉积形状不能始终完美地吻合待修补区域。为解决这个技术问题，在本发明一优选的实施例中，上述修补装置还包括如图4所示的激光修整机构。激光修整机构的主要作用为精密地修整电极溅射机构输出至基板104上的透明导电电极粒子的沉积形状。具体地，激光修整机构包括激光发生装置404和带动该激光发生装置404沿X、Y轴方向移动的激光移动部。
参照图4，是本发明实施例中激光修整机构的俯视图。激光移动部包括长度方向沿X轴方向延伸的第一滑动轴401，以及长度方向均沿Y轴方向延伸的第二滑动轴402和第三滑动轴403。激光发生装置404与第一滑动轴401滑动连接。第一滑动轴401的左右两端分别固装有第一滑动块(附图中未示出)和第二滑动块(附图中未示出)。第一滑动块与第二滑动轴402滑动连接，第二滑动块与第三滑动轴403滑动连接。
优选地，激光移动部还包括驱动激光发生装置404沿X轴方向移动的第一驱动部，以及驱动激光发生装置404沿Y轴方向移动的第二驱动部。第一驱动部包括第三步进电机及相应的传动部件。第二驱动部包括第四步进电机及相应的传动部件。两步进电机同样受控于控制器。
这样，利用激光移动部，可将激光发生装置404移动到基板104上方任意的位置。在进行粒子沉积形状的修整时，通过激光发生装置404产生的激光使多余的透明导电电极粒子气化，从而使电极粒子的沉积形状与待修补电极的形状完全契合。
该激光修整机构直接架设在电极溅射机构和挡板机构200的上方，在完成透明导电电极粒子的沉积后直接移开整个电极溅射机构和挡板机构200，从而完成激光对沉积区域的精密调整。可以理解的是，该激光修整机构还可以是与电极溅射机构或挡板机构200并排设置等，本实施例只是提供一种优选实施方式，并不用于限定本发明。
优选地，为了保证沉积的电极粒子不受外界环境杂质的影响，透明导电电极的修补装置还包括气体隔绝机构300，用于在与通道A对应的沉积区及其周围形成反应所需的真空环境。
仍参照图1，本实施例中气体隔绝机构300设置在阴极101的下方，包括多个吸气口301和多个吹气口302。吸气口301和吹气口302彼此相间地围绕通道A设置。各个吸气口301和吹气口302分别与相应的供气管(图中未示出)连接。利用本发明实施例的气体隔绝机构300，在电极粒子的沉积位置形成一个类似真空的环境，从而能够有效防止外界杂质影响到电极粒子的沉积。
可以理解的是，气体隔绝机构300的具体位置并不限于本发明中固定在阴极101的下方，且其吸气口301和吹气口302的设置方式也不限于本发明中的交替设置，还可以是其他常见的能形成真空环境的结构，只要能确保与通道A对应的沉积区及其周围形成真空环境即可。值得注意的是，本发明实施例不仅能对像素电极进行精确修补，还能对其它透明导电电极(例如公共电极、触控电极等)进行精确修补。本发明实施例能对以下显示装置的透明导电电极进行修补：In-Cell式触控显示装置、On-Cell式触控显示装置等。
应用本发明实施例提供的透明导电电极的修补设备，能够对缺损的透明导电电极进行精确修补，大幅提高了液晶显示面板的良品率。
虽然本发明所公开的实施方式如上，但所述的内容只是为了便于理解本发明而采用的实施方式，并非用以限定本发明。任何本发明所属技术领域内的技术人员，在不脱离本发明所公开的精神和范围的前提下，可以在实施的形式上及细节上作任何的修改与变化，但本发明的保护范围，仍须以所附的权利要求书所界定的范围为准。

Claims (18)

  1. 一种透明导电电极的修补装置，包括：
    电极溅射机构；以及
    挡板机构，设置在所述电极溅射机构与设有待修补电极的基板之间，通过形成横截面积可调、位置可移动的通道(A)，来调节所述电极溅射机构输出的电极粒子在所述基板上的覆盖面积和覆盖位置。
  2. 根据权利要求1所述的修补装置，其中，还包括围绕所述电极溅射机构的电极粒子输出口设置的气体隔绝机构；所述气体隔绝机构包括相间设置的多个吸气口和多个吹气口。
  3. 根据权利要求1所述的修补装置，其中，所述挡板机构包括：
    控制器；
    第一挡板部和第二挡板部，所述第一挡板部和所述第二挡板部围成所述通道(A)，且所述通道(A)的横截面积和位置通过各挡板部的移动而改变；
    第一移动部，用于在所述控制器的控制下，根据所述待修补电极的位置和面积驱动所述第一挡板部沿X轴方向移动；以及
    第二移动部，用于在所述控制器的控制下，根据所述待修补电极的位置和面积驱动所述第二挡板部沿Y轴方向移动。
  4. 根据权利要求3所述的修补装置，其中，还包括围绕所述电极溅射机构的电极粒子输出口设置的气体隔绝机构；所述气体隔绝机构包括相间设置的多个吸气口和多个吹气口。
  5. 根据权利要求3所述的修补装置，其中，
    所述第一挡板部包括沿X轴方向并排布设的第一子挡板和第二子挡板；
    所述第二挡板部包括沿Y轴方向并排布设的第三子挡板和第四子挡板。
  6. 根据权利要求5所述的修补装置，其中，还包括围绕所述电极溅射机构的电极粒子输出口设置的气体隔绝机构；所述气体隔绝机构包括相间设置的多个吸气口和多个吹气口。
  7. 根据权利要求5所述的修补装置，其中，
    所述第一子挡板和所述第二子挡板分别沿X轴方向往复移动；
    所述第三子挡板和所述第四子挡板分别沿Y轴方向往复移动。
  8. 根据权利要求7所述的修补装置，其中，还包括围绕所述电极溅射机构的电极粒子输出口设置的气体隔绝机构；所述气体隔绝机构包括相间设置的多个吸气口和多个吹气 口。
  9. 根据权利要求3所述的修补装置，其中，
    所述第一挡板部包括长度方向的夹角呈直角的第一子挡板和第二子挡板；
    所述第二挡板部包括长度方向的夹角呈直角的第三子挡板和第四子挡板；所述第一子挡板和所述第三子挡板的长度方向平行，所述第二子挡板和所述第四子挡板的长度方向平行。
  10. 根据权利要求9所述的修补装置，其中，还包括围绕所述电极溅射机构的电极粒子输出口设置的气体隔绝机构；所述气体隔绝机构包括相间设置的多个吸气口和多个吹气口。
  11. 根据权利要求1所述的修补装置，其中，还包括：
    控制器；以及
    挡板驱动部，用于在所述控制器的控制下，驱动所述挡板机构移动，以使所述通道(A)的位置与所述待修补电极的位置相对应，并使所述通道(A)的横截面积与所述待修补电极的面积相适配。
  12. 根据权利要求11所述的修补装置，其中，还包括围绕所述电极溅射机构的电极粒子输出口设置的气体隔绝机构；所述气体隔绝机构包括相间设置的多个吸气口和多个吹气口。
  13. 根据权利要求1所述的修补装置，其中，所述电极溅射机构包括：
    相对设置的阴极和阳极；
    分别与所述阴极和所述阳极电连接的溅射电源，以在两极间产生电场；以及
    依次设置在所述阴极下方的溅射靶和所述基板。
  14. 根据权利要求13所述的修补装置，其中，还包括围绕所述电极溅射机构的电极粒子输出口设置的气体隔绝机构；所述气体隔绝机构包括相间设置的多个吸气口和多个吹气口。
  15. 根据权利要求1所述的修补装置，其中，还包括用于精密修整所述电极溅射机构输出的电极粒子在所述基板上的沉积形状的激光修整机构。
  16. 根据权利要求15所述的修补装置，其中，还包括围绕所述电极溅射机构的电极粒子输出口设置的气体隔绝机构；所述气体隔绝机构包括相间设置的多个吸气口和多个吹气口。
  17. 根据权利要求15所述的修补装置，其中，所述激光修整机构包括：
    激光发生装置；
    长度方向沿X轴方向延伸的第一滑动轴，所述激光发生装置与所述第一滑动轴滑动连接；
    长度方向均沿Y轴方向延伸的第二滑动轴和第三滑动轴，所述第一滑动轴的左端通过第一滑动块与所述第二滑动轴滑动连接，所述第一滑动轴的右端通过第二滑动块与所述第三滑动轴滑动连接；
    驱动所述激光发生装置沿X轴方向往复移动的第一驱动部；以及
    驱动所述第一滑动轴沿Y轴方向往复移动的第二驱动部。
  18. 根据权利要求17所述的修补装置，其中，还包括围绕所述电极溅射机构的电极粒子输出口设置的气体隔绝机构；所述气体隔绝机构包括相间设置的多个吸气口和多个吹气口。
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