WO2017028484A1 - 一种电流体支撑板及其制备方法、电流体装置 - Google Patents

一种电流体支撑板及其制备方法、电流体装置 Download PDF

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Publication number
WO2017028484A1
WO2017028484A1 PCT/CN2016/070365 CN2016070365W WO2017028484A1 WO 2017028484 A1 WO2017028484 A1 WO 2017028484A1 CN 2016070365 W CN2016070365 W CN 2016070365W WO 2017028484 A1 WO2017028484 A1 WO 2017028484A1
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Prior art keywords
layer
support plate
amorphous fluoropolymer
pixel
protective material
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PCT/CN2016/070365
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English (en)
French (fr)
Inventor
周国富
吴昊
李发宏
海耶斯罗伯特·安德鲁
Original Assignee
深圳市国华光电研究院
华南师范大学
深圳市国华光电科技有限公司
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Application filed by 深圳市国华光电研究院, 华南师范大学, 深圳市国华光电科技有限公司 filed Critical 深圳市国华光电研究院
Priority to US15/752,867 priority Critical patent/US10310354B2/en
Publication of WO2017028484A1 publication Critical patent/WO2017028484A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/004—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
    • G02B26/005—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid based on electrowetting
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/37—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being movable elements
    • G09F9/372—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being movable elements the positions of the elements being controlled by the application of an electric field
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/3433—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices
    • G09G3/348—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices based on the deformation of a fluid drop, e.g. electrowetting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2400/00—Moving or stopping fluids
    • B01L2400/04—Moving fluids with specific forces or mechanical means
    • B01L2400/0403—Moving fluids with specific forces or mechanical means specific forces
    • B01L2400/0415—Moving fluids with specific forces or mechanical means specific forces electrical forces, e.g. electrokinetic
    • B01L2400/0427—Electrowetting
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/004—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid

Definitions

  • the present invention relates to an electrowetting technique, and in particular to an electrohydrodynamic support plate and a method of fabricating the same, and an electrohydrodynamic device including the support plate.
  • EFD electrohydrodynamic Display
  • the electrohydrodynamic device described in the above comprises two support plates.
  • a wall pattern i.e., a pixel wall
  • the area between the walls of an image element (also referred to as a pixel) is referred to as a display area on which a display effect is produced.
  • the walls of the image elements are made of a hydrophilic material.
  • the area of the support plate in the display area must be hydrophobic over a wide range for proper operation of the image elements.
  • the area in which the image elements are located in the support plate is covered by a hydrophobic layer.
  • the wall is fabricated on the hydrophobic layer by depositing a layer of wall material over the hydrophobic layer and patterning the layer of wall material using, for example, photolithography.
  • the wall material layer is hydrophilic, the adhesion between the wall material layer and the hydrophobic layer is relatively weak, resulting in the wall material layer being easily peeled off from the hydrophobic layer. It is known to reduce the hydrophobicity of the hydrophobic layer prior to coating the layer of wall material, for example by reactive ion etching. After the walls are formed, the hydrophobic layer is heat-insulated to restore its hydrophobicity. However, in the process of plasma etching or heat treatment, it is inevitable that the hydrophobic layer is damaged and the hydrophobic property is affected, so the quality of the display device manufactured by the method is not satisfactory.
  • this method has a problem that when the hydrophobic material is etched into a pattern of a pixel lattice shape, water is present above the hydrophobic insulating layer after a plurality of switches due to the presence of voids in the bonding of the hydrophobic layer and the wall material ( Or a problem of short-circuiting after contact with the lower electrode by an ionic liquid and a salt solution such as an aqueous solution of sodium chloride, thereby affecting the reliability of the device.
  • the present invention provides an electric current support plate and a preparation method thereof, which can solve the problem of ink reflow and reliability and improve the quality of the device.
  • the technical solution adopted by the present invention is: a method for preparing an electric body support plate, comprising the following steps:
  • a second amorphous fluoropolymer layer that is, a hydrophobic layer; the second amorphous fluoropolymer layer covering the entire pixel wall surface and a groove region surrounded by the pixel wall;
  • the first and second amorphous fluoropolymer layers obtained in the step 2) and the step 4) may be, but are not limited to, formed by the DuPont AF series, the Solvay Hyflon series, and the Asahi Glass Cytop series.
  • the sum of the thicknesses of the first and second amorphous fluoropolymer layers obtained in the step 2) and the step 4) is 100 nm to 2000 nm; more preferably, 300 nm to 1200 nm.
  • the pixel wall thickness obtained in the step 3) is ⁇ 2 ⁇ m.
  • the protective material in step 5) may be a photoresist, preferably a positive photoresist.
  • the protective material is filled with any one of dip coating, slit coating, spin coating, blade coating, screen printing or spray coating.
  • the thickness of the pixel wall obtained in the step 6) is 2-20 ⁇ m.
  • an electrohydrodynamic support plate obtained by the above preparation method, and an electrohydrodynamic device comprising the electrohydrodynamic support plate.
  • the beneficial effects of the present invention are as follows: in the preparation method of the present invention, when the support plate is prepared, the surface of the second amorphous fluoropolymer layer serving as the hydrophobic layer is not physically or chemically damaged due to the protective material, and the hydrophobic layer is avoided. The ink is not reflowed and reliability problems caused by surface damage.
  • the first amorphous fluoropolymer layer is provided under the pixel wall in advance, it can be integrated with the second amorphous fluoropolymer layer disposed on the surface later, completely avoiding the hydrophobic material and the wall material.
  • Short-circuit or breakdown and other reliability problems caused by the formation of voids, so that a gap between the hydrophobic layer and the pixel wall is not formed, and the short-circuit of the upper and lower support plates due to the gap between the hydrophobic layer and the pixel wall is solved. problem. Thereby improving the switching performance of the device and improving the quality and reliability of the product.
  • the invention can be used in current body devices, especially current body display devices.
  • FIG. 1 is a schematic view showing a preparation process of a current body support plate of the present invention
  • FIG. 2 is a cross-sectional view showing a pixel structure of a current body display device according to an embodiment of the present invention
  • Fig. 3 is a plan view showing the structure of a pixel of a current body display device according to an embodiment of the present invention.
  • the preparation steps of the electrofluidic support plate 10 of the present invention are as follows:
  • a substrate 1 is provided, on the surface of which a electrode 2 is provided.
  • the substrate 1 may be a glass or polymer substrate and may be rigid or flexible. Usually the electrode 2 is placed on the substrate 1.
  • a dielectric layer 3 may be disposed over the electrode 2 to prevent shorting of the upper and lower substrates.
  • the dielectric layer 3 may be a silicon oxide layer or a silicon nitride layer having, for example, 200 nm. thickness of. Of course, it can also be set. The specific reason is explained in the following steps.
  • the amorphous fluoropolymer material is preferably a DuPont AF series, a Solvay Hyflon series or an Asahi Glass Cytop series, but is not limited thereto, and may be any other amorphous fluoropolymer.
  • the first amorphous fluoropolymer layer 4 has a thickness between 100 nm and 2000 nm, and more preferably, the layer has a thickness between 100 nm and 1200 nm. It may be, but not limited to, coating by spin coating, knife coating, screen printing, or the like. After the coating is completed, in order to completely evaporate the solvent, heating may be carried out by a method such as a hot plate or an oven.
  • This layer of amorphous fluoropolymer may be one layer or a plurality of layers.
  • the fluoropolymer material Since the fluoropolymer material has hydrophobic properties as well as insulating properties, it can be directly disposed on the electrode 2, that is, the first layer of the amorphous fluoropolymer layer 4 can serve as a dielectric layer without requiring another A dielectric layer 3 is provided. Or in order to achieve a better dielectric effect, a dielectric layer 3 formed of silicon oxide or silicon nitride may be disposed on the electrode 2, and then a first amorphous fluoropolymer layer may be disposed on the dielectric layer 3. 4.
  • the method of surface modification may be a method such as plasma etching (RIE), or may be other physical or chemical methods.
  • a pixel wall 5 is provided on the hydrophilically modified first amorphous fluoropolymer layer 4; as shown in Fig. 1(d).
  • the pixel wall 5 can be disposed on the first amorphous fluoropolymer layer 4 whose surface is hydrophilically modified by a known method.
  • Known methods may include coating the pixel material on the surface by spin coating, knife coating, slit coating, screen printing, spray coating, etc., and the pixel wall 5 material may be a photoresist (eg, SU-8);
  • the pixel wall 5 is obtained by pre-baking the material of the layer of pixel walls 5, patterning the layer using photolithography, and removing the wall material from the display area.
  • the width of the pixel wall 5 can be selected as needed, and the height of the pixel wall 5 is between 2 and 20 microns.
  • an optional heat treatment may be performed to stabilize the wall structure and to avoid the subsequent steps affecting the wall structure.
  • the heat treatment temperature is lower than 180 °C.
  • the heat treatment temperature is about 160 °C.
  • the heat treatment method may be, but not limited to, heating of a hot plate, heating of an oven, or the like.
  • the second amorphous fluoropolymer layer 6 may be any other low surface energy polymer, preferably an AF series (such as AF1600 or AF1601) amorphous fluoropolymer supplied by DuPont, a Hyflon series supplied by Solvay or The Cytop series of amorphous fluoropolymers supplied by Asahi Glass. It acts mainly as a hydrophobic layer and acts as a hydrophobic.
  • AF series such as AF1600 or AF1601
  • DuPont DuPont
  • Hyflon series supplied by Solvay
  • the Cytop series of amorphous fluoropolymers supplied by Asahi Glass acts mainly as a hydrophobic layer and acts as a hydrophobic.
  • the first amorphous fluoropolymer layer 4 and the second amorphous fluoropolymer layer 6 may be the same fluoropolymer material or different materials.
  • the sum of the total thickness of the first amorphous fluoropolymer layer 4 and the second amorphous fluoropolymer layer 6 is 100 to 2000 nm; more preferably, it is 300 to 1200 nm.
  • an insulating layer 15 composed of the dielectric layer 3, the first amorphous fluoropolymer layer 4 and the second fluoropolymer layer 6 is also obtained on the substrate 1. Or only the insulating layer 15 composed of the first amorphous fluoropolymer layer 4 and the second fluoropolymer layer 6 is formed.
  • the insulating layer 15 is insulated from the lower electrode 2 while the upper surface is hydrophobic.
  • the protective material 7 is primarily intended to protect the second amorphous fluoropolymer layer 6 covered beneath it, which does not react with the second amorphous fluoropolymer layer 6.
  • the protective material 7 may be a photoresist or other substance that can be washed away. The thickness needs to be controlled: the minimum surface of the hydrophobic layer covering the bottom of the groove between all the walls.
  • the protective material 7 may be one layer or two or more layers.
  • a photoresist may be used as the first layer material, and then another layer of material may be disposed on the photoresist.
  • the method of filling the protective material 7 is preferably a dip-coating, spin coating, knife coating, coating, shower coating, screen printing or spray coating, but is not limited thereto. Due to the low surface energy of the hydrophobic layer material, the protective layer material 7 can be retained in the grooves between the walls having the hydrophobic layer material.
  • the main point is to remove the second amorphous fluoropolymer layer 6 located on the upper portion of the pixel wall 5, which can be removed by etching.
  • the etching is optional but not limited to reactive ion etching (RIE), inductively coupled plasma etching. (ICP).
  • RIE reactive ion etching
  • ICP inductively coupled plasma etching.
  • the height of the pixel wall 5 can be controlled to be 2 to 20 ⁇ m, more preferably 3 to 8 ⁇ m. Part of the protective material is allowed to be removed, but the second amorphous fluoropolymer layer 6 covered by the protective material 7 is not allowed to be exposed.
  • the method of removal can be selected in combination with the type of protective material 7 while at the same time destroying the second amorphous fluoropolymer layer 6 covered by the protective material 7.
  • the protective material 7 is a photoresist
  • the protective material 7 can be cleaned by using a developer or a degumming solution as a cleaning solution.
  • a developer or a degumming solution as a cleaning solution.
  • other solutions which effectively remove the protective material 7 without damaging the protected second amorphous fluoropolymer layer 6 may be used.
  • the surface may be optionally cleaned with UV ozone, and this step may also be omitted.
  • the step of heat-treating the support plate 10 may also be included to dry the washed hydrophobic layer and the surface.
  • the heat treatment step for the amorphous fluoropolymer according to the present invention may be performed at a temperature lower than 220 ° C, or preferably at a temperature lower than 160 ° C. This lower temperature does not affect the hydrophilicity of the hydrophilic material.
  • the structure of the obtained electrofluidic support plate 10 of the present invention is as shown in Fig. 1(h).
  • FIG. 2 a partial cross section of an electrofluidic display device comprising the electrohydrodynamic support plate of the present invention is shown.
  • the device includes a plurality of pixels 100, one of which is shown in the figures.
  • the lateral extent of pixel 100 is represented in the figure by two dashed lines A and B.
  • the pixel 100 includes a first support plate 10 and a second support plate 20.
  • the first support plate 10 is the support plate described in the present invention.
  • These support plates 10 and 20 may be separate components of each pixel 100, but preferably these support plates 10 and 20 are shared by a plurality of pixels 100.
  • the support plates 10 and 20 may include glass or polymer substrates 1 and 20 and may be rigid or flexible.
  • the electrofluidic display device has a viewing surface 30 and a back surface 40 for viewing an image display formed by the electrohydrodynamic device on the viewing surface 30.
  • the first support plate 10 faces the rear face 40
  • the second support plate 20 faces the viewing surface 30.
  • the first support plate 10 may face the viewing surface 30.
  • the electrohydrodynamic device can be of the reflective, transmissive or transflective type.
  • the electrohydrodynamic device can be of the segment display type, in which the image can be composed of segments, each segment comprising several pixels 100.
  • the current body device can be an active array driven display type or a passive drive display device.
  • the plurality of pixels 100 can be monochrome. For color display devices, pixels 100 can be grouped, with each group having a different color. Alternatively, individual image elements can also display different colors.
  • the space between the support plates 10 and 20 is filled with two fluids: a first fluid 50 and a second fluid 60, the second fluid 60 being immiscible with the first fluid 50.
  • the second fluid 60 is electrically or electrodeotropic and may be water or a salt solution such as an aqueous solution of sodium chloride.
  • the second fluid 60 is transparent, but may be colored, white, absorbing or reflective.
  • the first fluid 50 is non-conductive and may, for example, be an alkane such as hexadecane or (silicone) oil.
  • the first fluid 50 absorbs at least a portion of the spectrum, and the first fluid 50 can be transmissive for a portion of the spectrum to form a color filter.
  • the first fluid 50 can be dyed by the addition of pigment particles or dyes.
  • the first fluid 50 can be black, i.e., fully absorb all portions of the spectrum, or reflect.
  • the reflective layer can reflect the entire visible spectrum, rendering the layer white, or reflecting portions of it, giving it a color.
  • the first support plate 10 includes an insulating layer 15.
  • the insulating layer 15 may be transparent or reflective, and the insulating layer 15 may extend between the walls of the pixel 100. As shown in Figure 1.
  • the insulating layer 15 has a thickness of less than 2 microns.
  • the insulating layer 15 comprises a first amorphous fluoropolymer layer 4 and a second amorphous fluoropolymer layer 6.
  • it may further comprise a dielectric layer 3 located on the first amorphous fluoropolymer layer.
  • the inorganic dielectric layer 3 may be a silicon oxide layer or a silicon nitride layer having a thickness of, for example, 200 nm.
  • the hydrophobic nature of the surface of the insulating layer 15 causes the first fluid 50 to preferentially adhere to the insulating layer 15 because the first fluid 50 has a higher surface wettability relative to the insulating layer 15 than the second fluid 60. Wettability relates to the relative affinity of a fluid to a solid surface.
  • Each pixel 100 includes an electrode 2 that is part of the first support plate 10.
  • the electrode 2 is separated from the fluid by a hydrophobic insulating layer 15; the electrode adjacent to the pixel 100 is separated by a non-conductive layer. Other layers may be disposed between the insulating layer 15 and the electrode 2.
  • Electrode 2 can be of any desired shape or form. Only schematically shown in FIG. 1 is the supply of a voltage signal to the electrode 2 of the pixel 100 via the first signal line 70.
  • the second signal line 80 is connected to an electrode that is in contact with the electrically conductive second fluid 60. When all of the pixels 100 are fluidly interconnected by the second fluid 60 and share the second fluid 60 without being blocked by the pixel walls 5, the second electrode is shared by all of the pixels 100.
  • the pixel 100 can be controlled by a voltage V applied between the signal lines 70 and 80.
  • the electrode 2 on the substrate 1 is coupled to a display drive system.
  • the first electrode 2 on the substrate 1 can be coupled to a control line array.
  • the first fluid 50 is confined within one pixel 100 along the pixel walls 5 of the cross-section of the pixel 100.
  • the cross section of the pixel 100 can have any shape. When the pixels 100 are arranged in an array, the cross section is usually square or rectangular.
  • the pixel walls 5 are illustrated as a structure protruding from the insulating layer 15, they may also be a surface layer of the first support plate 10 that repels the first fluid 50, such as a hydrophilic layer or a weak hydrophobic layer.
  • the pixel wall 5 may extend from the first support plate 10 to the second support plate 20, but may also partially extend from the first support plate 10 to the second support plate 20 as shown in FIG.
  • the range of pixels 100 represented by dashed lines A and B is defined by the center of the pixel wall 5.
  • the area between the pixel walls 5 of the pixels 100 indicated by the broken lines C and D is referred to as a display area 90 on which a display effect is produced.
  • FIG. 3 shows an array of square pixels 2 in a plan view of the insulating layer 15 of the first support plate 10.
  • the range of the center pixel 100 (corresponding to the broken line A and the broken line B in FIG. 2) is indicated by a broken line E.
  • Line F represents the inner boundary of the pixel wall 5, which is also the side of the display area 90.
  • the first fluid 50 When no voltage is applied between the electrodes, the first fluid 50 forms a layer between the walls, as shown in FIG. Shown. Applying a voltage causes the first fluid to contract, for example against the wall, as shown by the dashed shape 50-1 in FIG.
  • the controllable shape of the first fluid is used to operate the pixel as a light valve to provide a display effect in display area 90.
  • electrowetting optics such as electrowetting apertures and shutters, as well as lab-on-a-chip devices.

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Abstract

一种电流体支撑板(10,20)及其制备方法，和包括该支撑板(10,20)的电流体装置，该制备方法包括步骤：提供基板(1)；设置第一非晶体含氟聚合物层(4)，并对其表面进行亲水改性；设置像素壁(5)；设置第二非晶体含氟聚合物层(6)，所述第二非晶体含氟聚合物层(6)覆盖整个像素壁(5)表面及像素壁(5)围成的凹槽区域；在像素壁(5)围成的凹槽区域填充保护材料(7)；去除未被保护材料(7)覆盖的像素壁(5)顶部的第二非晶体含氟聚合物层(6)；去除保护材料(7)。该方法避免了由于疏水层表面受损而导致的油墨不回流及可靠性问题。并且，不会形成疏水层与像素壁(5)中间的间隙，解决了由于疏水层与像素壁(5)之间的缝隙而引起的上下支撑板(10,20)短路的问题。该方法可用于电流体装置。

Description

一种电流体支撑板及其制备方法、电流体装置
技术领域
本发明涉及电润湿技术，具体涉及一种电流体支撑板及其制备方法，和包括该支撑板的电流体装置。
背景技术
电流体，又名电润湿（电湿润），目前电流体技术EFD（electrofluidic display）已经有了普遍的应用，它提供一种基于电流体技术的显示单元。
诸如国际专利申请WO 2003/071346 中描述的电流体装置包括两个支撑板。壁图案（即像素壁）设置在其中一个支撑板上，该壁图案限定显示装置的图像元素。图像元素（也称为像素）的壁之间的区域被称作显示区，在该显示区上产生显示效果。图像元素的壁由亲水材料制成。显示区中的支撑板的区域在很大范围上必须疏水，以用于图像元素的适当操作。在制造期间，支撑板中图像元素所处的区域由疏水层覆盖。通过在疏水层上沉积壁材料层并且使用（例如）光刻法来图案化该壁材料层，从而在疏水层上制造壁。
由于壁材料层是亲水的，壁材料层与疏水层之间的附着力相对较弱，导致壁材料层易于从疏水层剥离。已知在涂覆壁材料层之前降低疏水层的疏水性，例如通过反应离子蚀刻。形成壁之后，将疏水层绝缘热处理，以便恢复其疏水性。但等离子刻蚀或者加热处理的过程中，难免会对疏水层造成损伤，影响其疏水性能，故使用该方法制造的显示装置的质量并不令人满意。
为此，也有做出改进，如申请号为CN201410159289.1的申请中提出的方案为，将疏水层材料布置于带有亲水层材料的支撑板上，并通过在疏水表面凹槽中增加保护层后再刻蚀的方法，使得疏水表面可以免受损伤，解决了由于疏水层表面受损而引起的质量问题。但是，这种方法存在一个问题，当疏水材料被刻蚀成像素格形状的图案后，由于疏水层和壁材料的粘结存在空隙，在多次开关后，会引起疏水绝缘层上方的水（或者是离子液体及诸如氯化钠水溶液的盐溶液）与下电极接触后短路的问题，从而影响器件的可靠性。
发明内容
为了解决上述技术问题，本发明提供一种电流体支撑板及其制备方法，可以解决油墨回流及可靠性问题，提高器件质量。
本发明所采用的技术方案是：一种制备电流体支撑板的方法，包括以下步骤：
1）提供基板，所述基板表面设有电极；
2）在所述基板表面设置第一非晶体含氟聚合物层，并对该非晶体含氟聚合物层表面进行亲水改性；
3）在亲水改性后的第一非晶体含氟聚合物层之上设置像素壁；
4）设置第二非晶体含氟聚合物层，即疏水层；所述第二非晶体含氟聚合物层覆盖整个像素壁表面及像素壁围成的凹槽区域；
5）在像素壁围成的凹槽区域填充保护材料；
6）去除未被保护材料覆盖的像素壁顶部的第二非晶体含氟聚合物层；
7）去除保护材料。
优选地，所述步骤2）和步骤4）中得到的第一和第二非晶体含氟聚合物层可以但不限于是由杜邦AF系列，苏威Hyflon系列以及旭硝子Cytop系列形成的。
优选地，所述步骤2）和步骤4）中得到的第一和第二非晶体含氟聚合物层的厚度之和为100nm~2000nm；进一步优选地，为300nm~1200nm。
优选地，所述步骤3）中得到的像素壁厚度为≥2μm。
步骤5）中的保护材料可以是光刻胶，优选地为正性光刻胶。
优选地，所述步骤5）中采用浸渍涂布（Dip-Coating）、狭缝涂布、旋涂、刮涂、丝网印刷或喷涂等中的任意一种来填充保护材料。
优选地，所述步骤6）中得到的像素壁的厚度为2~20μm。
本发明的另一方面，还提供了一种采用上述制备方法得到的电流体支撑板，及包括该电流体支撑板的电流体装置。
本发明的有益效果是：本发明的制备方法，在制备支撑板时，由于具有保护材料，充当疏水层的第二非晶体含氟聚合物层表面没有经过物理或化学损伤，避免了由于疏水层表面受损而导致的油墨不回流及可靠性问题。
并且，由于预先在像素壁之下设有第一非晶体含氟聚合物层，可以和后面设置在表面的第二非晶体含氟聚合物层形成一个整体，完全避免了由于疏水材料与壁材料之间形成空隙而导致的短路或击穿及其他可靠性问题，因而不会形成疏水层与像素壁中间的间隙，解决了由于疏水层与像素壁之间的缝隙而引起的上下支撑板短路的问题。从而提高器件的开关性能，提高产品的质量和可靠性。本发明可用于电流体装置，尤其是电流体显示装置。
附图说明
下面结合附图对本发明的具体实施方式作进一步说明：
图1是本发明的电流体支撑板的制备过程示意图；
图2是本发明实施例的电流体显示装置的像元结构的截面图；
图3是本发明实施例的电流体显示装置像元结构俯视图。
具体实施方式
需要说明的是，在不冲突的情况下，本申请中的实施例及实施例中的特征可以相互组合。
如图1所示，根据本发明的一示范性实施例，本发明的电流体支撑板10的制备步骤为：
1）如图1（a）所示，提供基板1，所述基板表面设有电极2。
基板1可以是玻璃或聚合物基板，并且可以是刚性的或柔性的。通常电极2被设置在基板1上。为防止上、下基板短路可以在电极2之上布置一层介电层3，介质层3可以是氧化硅层或氮化硅层，具有例如200nm 的厚度。当然也可以不设置，具体原因在后面步骤中说明。
2）在所述基板表面设置第一非晶体含氟聚合物层4，并对该非晶体含氟聚合物层4表面进行亲水改性；如图1（b），1（c）所示。
非晶体含氟聚合物材料优选为杜邦AF系列，苏威Hyflon系列或旭硝子Cytop系列，但并不限于此，另外可以是其他任何非晶体含氟聚合物。优选的，第一非晶体含氟聚合物层4厚度在100nm至2000nm之间，更优选的，该层厚度在100nm~1200nm之间。可以但不限于用旋涂、刮涂、丝网印刷等方法涂布。涂布完之后，为使溶剂完全蒸发，可采用热板或烤炉等方法进行加热。这层非晶体含氟聚合物可以为一层也可以为多层叠加。
由于含氟聚合物材料在具有疏水性的同时，也具有绝缘性能，所以可以将其直接设置于电极2之上，即第一层非晶体含氟聚合物层4可以充当介电层，无需另设介电层3。或者为了达到更好的介电效果，可以在电极2上设置由氧化硅或氮化硅形成的介电层3后，再在该介电层3之上设置第一非晶体含氟聚合物层4。
第一非晶体含氟聚合物层4设置完成后，其表面是疏水的，为了便于在其上设置像素壁5结构，需要对其表面进行亲水改性处理。如图1(c)所示。表面改性的方法可以为诸如等离子体刻蚀（RIE）的方法，也可以为其他物理或化学方法。
3）在亲水改性后的第一非晶体含氟聚合物层4之上设置像素壁5；如图1（d）所示。
像素壁5可以采用已知方法设置在表面亲水改性后的第一非晶体含氟聚合物层4上。已知方法可包括在表面上用旋涂、刮涂、狭缝涂布、丝网印刷、喷涂等方法涂布像素材料，像素壁5材料可以是光刻胶（例如，SU-8）；然后通过预烘干该层像素壁5材料，再使用光刻图案化该层，以及从显示区域去除壁材料，从而得到像素壁5。
像素壁5的宽度可根据需要进行选择，像素壁5的高度为2~20微米之间。
在像素壁5布置完成后，可选的，可以进行适当的热处理以稳固壁结构以及避免后续步骤对壁结构造成影响。优选的，热处理温度低于180℃。优选的，热处理温度约为160℃。热处理方法可以但不限于为热板加热、烤炉加热等。
4）设置第二非晶体含氟聚合物层6，即疏水层；所述第二非晶体含氟聚合物层6覆盖整个像素壁5结构表面及像素壁围成的凹槽区域；如图1（e）所示。
该第二非晶体含氟聚合物层6可以任何其他低表面能聚合物，优选为是DuPont公司提供的AF系列（诸如AF1600或AF1601）非晶体含氟聚合物、苏威公司提供的Hyflon系列或旭硝子公司提供的Cytop系列非晶体含氟聚合物。其主要是作为疏水层，起到疏水的作用。
具体设置方法可以参考第一非晶体含氟聚合物层4。
第一非晶含氟聚合物层4与第二非晶含氟聚合物层6可以为同一种含氟聚合物材料，也可以为不同种材料。优选的，第一非晶体含氟聚合物层4和第二非晶体含氟聚合物层6的总厚度之和为100~2000nm；进一步优选的，为300~1200nm。
此时，在基板1之上也得到了由介电层3，第一非晶含氟聚合物层4与第二含氟聚合物层6共同组成的绝缘层15。或者仅有第一非晶含氟聚合物层4与第二含氟聚合物层6共同组成的绝缘层15。该绝缘层15与下面电极2绝缘，同时上表面是疏水的。
5）在像素壁5围成的凹槽区域填充保护材料7；如图1（f）所示。
保护材料7主要是为了起到保护其下面覆盖的第二非晶体含氟聚合物层6，其与第二非晶体含氟聚合物层6不反应。保护材料7可以是光刻胶，也可以是其他可以清洗掉的物质。厚度需要控在：最低要覆盖所有壁之间的凹槽底部的疏水层表面。
保护材料7可以为一层，也可以为两层或多层，如，可以选用光刻胶作为第一层材料，然后在光刻胶的上面布置另外一层材料。
填充保护材料7的方法优选是采用浸渍涂布（Dip-coating）、旋涂、刮涂、涂布、淋涂、丝网印刷或喷涂，但并不限于此。由于疏水层材料表面能低，保护层材料7可以滞留于壁之间的表面有疏水层材料的凹槽内。
6）去除未被保护材料7覆盖的像素壁5顶部的第二非晶体含氟聚合物层6；如图1（g）所示。
重点是为了去除位于像素壁5上部的第二非晶体含氟聚合物层6，可以采用刻蚀的方法去除，刻蚀可选用但不限于反应离子刻蚀（RIE），感应耦合等离子体刻蚀（ICP）。为了使第二非晶体含氟聚合物层6，被刻蚀完全，可以增加刻蚀程度以刻蚀部分第二非晶体含氟聚合物层6下面的壁材料。
去除后，像素壁5的高度可控制在2~20μm，更优选地，3~8μm。允许去除部分保护材料，但不允许保护材料7覆盖下的第二非晶体含氟聚合物层6暴露被刻蚀。
7）去除保护材料7；如图1（h）所示。
去除的方法，可以结合保护材料7的类型进行选择，同时要不能破坏保护材料7覆盖下的第二非晶体含氟聚合物层6。
如保护材料7为光刻胶，可选用但不限于选用显影液或去胶液作为清洗液清洗到保护材料7。或者也可以选用其他的可以有效去除保护材料7但不损伤被保护的第二非晶体含氟聚合物层6的溶液。
最后，清洗掉保护材料7后，为避免有机物残留，可选用UV臭氧清洗表面，此步骤也可省略。
进一步，也还可以包括热处理支撑板10的步骤（也可以不包括），从而对清洗后的疏水层及表面进行干燥。根据本发明的对非晶体氟聚合物的热处理步骤可以在低于220℃的温度执行，或者优选地在低于160℃的温度执行。该较低的温度不影响亲水材料的亲水性。
得到的本发明的电流体支撑板10的结构如图1（h）所示。
如图2所示，示出了包含本发明的电流体支撑板的电流体显示装置的部分横截面。
该装置包括多个像元100，在图中示出了其中的一个。像元100的横向范围在图中由两条虚线A和B表示。像元100包括第一支撑板10和第二支撑板20。其中第一支撑板10为本发明所述的支撑板。这些支撑板10和20可以是每个像元100的分离的部件，但是优选地，这些支撑板10和20被多个像元100共有。支撑板10和20可以包括玻璃或聚合物基板1和20，并且可以是刚性的或柔性的。
电流体显示装置具有观看面30和背面40，可以观看由电流体装置在观看面30上形成的图像显示。在图2中，第一支撑板10面向背面40，第二支撑板20面向观看面30，可选地，第一支撑板10可以面向观看面30。电流体装置可以是反射型、透射型或透射反射型的。电流体装置可以是分段显示型的，在其中图像可以由段组成，每一段包括几个像元100。电流体装置可以是有源阵列驱动显示型的，或者是无源驱动显示装置。多个像元100可以是单色的。对于彩色显示装置，像元100可以分组，每组具有不同的颜色。可选地，单独的图像元素也能够显示不同的颜色。
支撑板10和20间的空间充满两种流体：第一流体50和第二流体60，第二流体60与第一流体50不混溶。第二流体60为导电性的或电极性的，可以是水或诸如氯化钠水溶液的盐溶液。优选地，第二流体60是透明的，但可以是彩色的、白色的、吸收的或反射的。第一流体50是非导电性的，例如可以是如同十六烷或（硅树脂）油的烷烃。
第一流体50吸收至少一部分光谱，第一流体50对于一部分光谱可以是透射的，形成颜色过滤器。为了这个目的，第一流体50可以通过添加颜料微粒或染料被染色。可选地，第一流体50可以是黑色，即充分地吸收光谱的所有部分，或者反射。反射层可以反射整个可见光谱，使该层呈现为白色，或反射它的部分，使其有颜色。
第一支撑板10包括绝缘层15。绝缘层15可以是透明的或反射的，绝缘层15可以在像元100的壁之间延伸。如图1中所示。优选地，绝缘层15的厚度少于2微米。
绝缘层15包含第一非晶体含氟聚合物层4和第二非晶体含氟聚合物层6，可选择的，还可以包含一层介电层3，位于第一非晶体含氟聚合物层4的下面，无机介电层3可以是氧化硅层或氮化硅层，具有例如200nm的厚度。
绝缘层15的表面的疏水特性使得第一流体50优先粘附至绝缘层15，因为第一流体50具有比第二流体60高的相对于绝缘层15的表面润湿性。润湿性涉及流体对固体表面的相对亲和性。
每个像元100包括作为第一支撑板10的一部分的电极2。电极2通过疏水绝缘层15与流体分离；邻近像元100的电极被非导电层分离。其他层可以设置在绝缘层15和电极2之间。电极2可以是任何期望的形状或形式。在图1中仅示意性地表示出，通过第一信号线70向像元100的电极2提供电压信号。第二信号线80被连接至与导电的第二流体60接触的电极。当所有像元100被第二流体60流动地互相连接并且共享第二流体60而不被像素壁5阻断时，该第二电极由所有像元100共用。像元100可以由施加在信号线70和80间的电压Ｖ控制。基板1上的电极2被耦连至显示驱动系统。在具有以阵列形式设置的像元100的显示装置中，在基板1上的第一电极2可以被耦连至控制线阵列。
第一流体50被沿着像元100横截面的像素壁5限制于一个像元100内。像元100的横截面可以具有任意形状。当像元100以阵列形式排列时，横截面通常是正方形或长方形。虽然像素壁5被示为从绝缘层15突出的结构，但它们也可以是第一支撑板10的排斥（repel）第一流体50的表面层，例如亲水层或弱疏水层。像素壁5可以从第一支撑板10向第二支撑板20延伸，但是也可以如图2所示从第一支撑板10向第二支撑板20部分地延伸。由虚线A和B表示的像元100的范围，由像元壁5的中心限定。由虚线C和D表示的像元100的像素壁5之间的区域被称为显示区域90，在其上产生显示效果。
图3示出第一支撑板10的绝缘层15的平面图中的正方形像元2的阵列。图3中，中心像元100的范围（与图2中的虚线A和虚线B对应）由虚线E表示。线F表示像素壁5的内边界，该线也是显示区域90的边。
当没有电压施加在电极间时，第一流体50在壁之间形成一层，如图2 所示。施加电压会使第一流体收缩（contract），例如靠着壁，如图2中虚线形状50-1所示。第一流体的可控形状用于作为光阀操作像元，在显示区域90提供显示效果。
虽然本发明参考电流体显示装置进行了阐明，但本发明适用于亲水材料布置于疏水层上的任何电润湿装置。其他电流体装置的实例是诸如电润湿光圈和快门的电润湿光学元件，以及芯片实验室（lab-on-a-chip）装置。
以上是对本发明的较佳实施进行了具体说明，但本发明创造并不限于所述实施例，熟悉本领域的技术人员在不违背本发明精神的前提下还可做作出种种的等同变形或替换，这些等同的变形或替换均包含在本申请权利要求所限定的范围内。

Claims (10)

1、一种电流体支撑板的制备方法，其特征在于，包括以下步骤：
1）提供基板，所述基板表面设有电极；
2）在所述基板表面设置第一非晶体含氟聚合物层，并对该非晶体含氟聚合物层表面进行亲水改性；
3）在亲水改性后的非晶体含氟聚合物层之上设置像素壁；
4）设置第二非晶体含氟聚合物层，即疏水层；所述第二非晶体含氟聚合物层覆盖整个像素壁表面及像素壁围成的凹槽区域；
5）在像素壁围成的凹槽区域填充保护材料；
6）去除未被保护材料覆盖的像素壁顶部的第二非晶体含氟聚合物层；
7）去除保护材料。
根据权利要求1所述的电流体支撑板的制备方法，其特征在于：所述步骤2）和步骤4）中得到的第一和第二非晶体含氟聚合物层是由杜邦AF系列，苏威Hyflon系列或旭硝子Cytop系列形成的。
根据权利要求1所述的制备电流体支撑板的方法，其特征在于：所述步骤2）和步骤4）中得到的第一和第二非晶体含氟聚合物层的厚度之和为100nm~2000nm。
根据权利要求3所述的电流体支撑板的制备方法，其特征在于：所述第一和第二非晶体含氟聚合物层的厚度之和为300nm~1200nm。
根据权利要求1所述的电流体支撑板的制备方法，其特征在于：所述步骤3）中得到的像素壁厚度为≥2μm。
根据权利要求1所述的电流体支撑板的制备方法，其特征在于：所述步骤5）中保护材料为光刻胶。
根据权利要求1所述的电流体支撑板的制备方法，其特征在于：所述步骤5）中采用浸渍涂布、狭缝涂布、丝网印刷、喷涂、旋涂或刮涂中的任意一种来填充保护材料。
根据权利要求1所述的电流体支撑板的制备方法，其特征在于：所述步骤6）中得到的像素壁的厚度为2~20μm。
一种由权利要求1-8任一项所述的制备方法制备得到电流体支撑板。
一种电流体装置，其特征在于，包括权利要求9所述的电流体支撑板。
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