WO2017011245A3 - System and method for generating images and objects via display-as-print - Google Patents

System and method for generating images and objects via display-as-print Download PDF

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Publication number
WO2017011245A3
WO2017011245A3 PCT/US2016/041164 US2016041164W WO2017011245A3 WO 2017011245 A3 WO2017011245 A3 WO 2017011245A3 US 2016041164 W US2016041164 W US 2016041164W WO 2017011245 A3 WO2017011245 A3 WO 2017011245A3
Authority
WO
WIPO (PCT)
Prior art keywords
building material
object layer
print
via display
slurry
Prior art date
Application number
PCT/US2016/041164
Other languages
French (fr)
Other versions
WO2017011245A2 (en
Inventor
Samuel WESTLIND
Daniel O'loughlin
Frank M. Stewart
Original Assignee
Zadiance Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US2015/058940 external-priority patent/WO2016118207A1/en
Application filed by Zadiance Llc filed Critical Zadiance Llc
Publication of WO2017011245A2 publication Critical patent/WO2017011245A2/en
Publication of WO2017011245A3 publication Critical patent/WO2017011245A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)

Abstract

A method for depositing onto a surface building material that is in powder, slurry or liquid form. The building material is comprised at least in part of a photosensitive material. The method involves exposing the building material to a first specific wavelength of radiation to process the building material to form a first object layer, depositing onto the first object layer additional building material in powder, slurry or liquid form, exposing the additional building material that is deposited onto the first object layer to a second specific wavelength of radiation to process the additional building material to form a second object layer, and repeating the deposition and exposure steps to create as many layers as are necessary to complete the object. A computer-implemented system for generating a two-dimensional image comprising a pixel output device, a camera, a sending program and a receiving program.
PCT/US2016/041164 2015-07-15 2016-07-06 System and method for generating images and objects via display-as-print WO2017011245A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201562192809P 2015-07-15 2015-07-15
US62/192,809 2015-07-15
USPCT/US2015/058940 2015-11-04
PCT/US2015/058940 WO2016118207A1 (en) 2015-01-20 2015-11-04 Display pixel by pixel communications for data transfer and multidimensional image generation

Publications (2)

Publication Number Publication Date
WO2017011245A2 WO2017011245A2 (en) 2017-01-19
WO2017011245A3 true WO2017011245A3 (en) 2017-03-09

Family

ID=57757456

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2016/041164 WO2017011245A2 (en) 2015-07-15 2016-07-06 System and method for generating images and objects via display-as-print

Country Status (1)

Country Link
WO (1) WO2017011245A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI668130B (en) 2017-03-22 2019-08-11 三緯國際立體列印科技股份有限公司 3d printing device and resume printing method thereof
CN115157658B (en) * 2022-06-23 2023-11-24 浙江大学 Method for preparing binary coded droplet array by microfluidic 3D droplet printing

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0279104A1 (en) * 1987-02-06 1988-08-24 Seiko Instruments Inc. Image producing material
EP0535984A1 (en) * 1991-10-02 1993-04-07 Spectra Group Limited Inc Production of three-dimensional objects
US20040045465A1 (en) * 2002-09-11 2004-03-11 Mclean Michael E. Four color digital printing process and color image element using color-sensitive photopolymers
WO2007006844A2 (en) * 2005-07-07 2007-01-18 M-Real Oyj A method of building a sensor structure

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3227553A (en) 1962-05-08 1966-01-04 Fuji Photo Film Co Ltd Photosensitive materials
US4330615A (en) 1981-03-25 1982-05-18 Alexandra Romanenko Blue background slides from a black and white film process
JP2001027783A (en) 1999-07-13 2001-01-30 Fuji Photo Film Co Ltd Image forming method
WO2002050613A2 (en) 2000-12-18 2002-06-27 The University Of Vermont And State Agricultural College Method of curing a photosensitive material using evanescent wave energy
US7085490B1 (en) 2004-05-14 2006-08-01 Mark Nelson Density range control in a photograph by variation of hue density range of the negative
US8318060B2 (en) 2008-07-22 2012-11-27 University Of New Hampshire Microencapsulation of amines
KR102132220B1 (en) 2013-12-27 2020-07-10 삼성디스플레이 주식회사 Method of manufacturing a quantum dot optical component and backlight unit having the quantum dot optical component
KR102142481B1 (en) 2013-12-30 2020-08-07 엘지디스플레이 주식회사 Organic electro-luminescent Device
CN103927978A (en) 2013-12-31 2014-07-16 厦门天马微电子有限公司 Active matrix/organic light emitting diode (AMOLED) display panel and organic light emitting display device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0279104A1 (en) * 1987-02-06 1988-08-24 Seiko Instruments Inc. Image producing material
EP0535984A1 (en) * 1991-10-02 1993-04-07 Spectra Group Limited Inc Production of three-dimensional objects
US20040045465A1 (en) * 2002-09-11 2004-03-11 Mclean Michael E. Four color digital printing process and color image element using color-sensitive photopolymers
WO2007006844A2 (en) * 2005-07-07 2007-01-18 M-Real Oyj A method of building a sensor structure

Also Published As

Publication number Publication date
WO2017011245A2 (en) 2017-01-19

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