WO2016119712A1

WO2016119712A1 - Graph reflection structure applied to three-dimensional display, and manufacturing method thereof

Info

Publication number: WO2016119712A1
Application number: PCT/CN2016/072498
Authority: WO
Inventors: 何东阳
Original assignee: 何东阳
Priority date: 2014-03-31
Filing date: 2016-01-28
Publication date: 2016-08-04
Also published as: CN104614866A; CN107436495A; CN107436495B; CN104614866B; CN103955065A

Abstract

A graph reflection structure applied to a three-dimensional display, and manufacturing method thereof; a graph reflection structure (401) is provided between a backlight source (302) and a transmission-type display screen (301), and comprises a transmission area (402) and a reflection area (403); the reflection area (403) is provided with a reflection layer (404) and an absorption layer (405); the reflection layer (404) is provided at one side of the graph reflection structure (401) adjacent to the backlight source (302); the absorption layer (405) is provided at a surface of the graph reflection structure (401) adjacent to the transmission-type display screen (301) and is used to absorb light reflected by the transmission-type display screen (301) to the graph reflection structure (401); a projection of the absorption layer (405) in a vertical direction of the graph reflection structure (401) overlaps a projection of the reflection layer (404) in a vertical direction of the graph reflection structure (401); the reflection layer (404) in the graph reflection structure (401) can reflect the light in the reflection area (403) to the backlight source (302) for repeated utilization, such that brightness of a three-dimensional display is improved; and the absorption layer (405) in the reflection area (403) can absorb the light reflected by the transmission-type display screen (301) to the reflection area (403) of the graph reflection structure (401), thus avoiding crosstalk caused by the light being emitted from the reflection area (403) of the graph reflection structure (401).

Description

Graphic reflection structure applied to three-dimensional display and manufacturing method thereof

The present application claims priority to Chinese Patent Application No. 201510052064.0, entitled "A Graphical Reflection Structure Applied to a Three-Dimensional Display and Its Manufacturing Method", which is filed on January 30, 2015, the entire contents of which is incorporated herein by reference. This is incorporated herein by reference.

Technical field

The present application relates to the field of semiconductor technology, and in particular, to a graphic reflective structure applied to a three-dimensional display and a method of fabricating the same.

Background technique

Three-dimensional (3D) stereoscopic display, especially naked-eye 3D, has become a trend in the display field. The 3D display is based on the principle of binocular stereo vision to achieve a stereoscopic effect, that is, the different images seen by the two eyes of the human being combined in the brain can present the three-dimensional shape of the currently seen object. At present, the technology for realizing the naked-eye 3D display mostly uses a barrier such as a light barrier or a grating, and a parallax barrier is installed in front of the display screen to control or block the direction of the light, so that the left and right eyes receive different images and generate a stereoscopic effect.

As shown in FIG. 1, an occlusion grating is disposed in front of the imaging pixel, and the images entering the left and right eyes are different by the occlusion grating (the image entering the left eye is marked in white, and the image entering the right eye is marked in black). In the stereo display mode, when the image that should be seen by the left eye is displayed on the LCD screen, the opaque stripes will block the right eye; similarly, when the image that should be seen by the right eye is displayed on the LCD screen, the opaque stripes will block. The left eye allows the viewer to see the 3D image by separating the visible images of the left and right eyes. However, at the same time, the brightness of the 3D display image becomes low due to the blocking of the occlusion grating.

It can be seen that there is a technical problem in the prior art that the display brightness of the 3D display image is low.

Summary of the invention

The embodiment of the present application provides a graphic reflection structure applied to a three-dimensional display and a manufacturing method thereof, which solves the technical problem that the display brightness of the 3D display image is low in the prior art.

The embodiment of the present application provides a graphic reflection structure, which is disposed on a backlight and a transmissive display. The pattern reflective structure includes a transmissive area for reflecting a portion of the light emitted by the backlight back to the backlight, and a reflective area for emitting the backlight Part of the light is projected onto the transmissive display screen, and the transmissive area and the reflective area are alternately arranged in sequence;

The reflective area is provided with a reflective layer disposed on a side of the patterned reflective structure adjacent to the backlight, and an absorbing layer disposed adjacent to the transmissive display On one side of the screen, for absorbing light reflected by the transmissive display screen back to the pattern reflective structure, and the projection of the absorbing layer and the reflective layer in a direction perpendicular to the pattern reflection structure overlaps.

In the above embodiment, the reflective layer in the pattern reflection structure can reflect the light of the reflective area back to the backlight for reuse, so that the brightness of the three-dimensional display can be improved, and the absorption layer of the reflective area can absorb the reflection of the transmissive display screen. Light to the reflective area of the reflective structure avoids light reflected from the display screen from being emitted in the reflective area to cause crosstalk, thereby causing light transmitted from the transmissive area of the reflective structure to pass through the pixel array of the transmissive display After the even and odd sub-pixels, the three-dimensional images formed by entering the left and right eyes of the person respectively have a better display effect.

In a preferred embodiment, in order to improve the reliability of the reflective structure, the patterned reflective structure further includes a substrate carrying the absorbing layer and the reflective layer; and disposed between the reflective layer and the substrate Having a first protective layer; or, a second protective layer is disposed between the absorbing layer and the reflective layer; or a first protective layer is disposed between the reflective layer and the substrate, and A second protective layer is disposed between the absorbing layer and the reflective layer. The first protective layer not only increases the bonding force between the reflective layer and the substrate, but also prevents the reflective layer from being affected by the external environment, thereby improving the reliability of the reflective layer. The second protective layer functions to prevent the reflective layer from being oxidized.

In a preferred embodiment, a third protective layer is further disposed on the surface of the absorbing layer. The third protective layer is mainly to prevent the absorption layer from being affected by the external environment to improve the reliability of the absorption layer.

In a preferred embodiment, the second protective layer covers the reflective area and the transparent area; or the second protective layer covers only the reflective area; or the third protective layer Covering the reflective area and the transparent area; or, the third protective layer covers only the reflective area area.

In the above embodiment, the first protective layer, the second protective layer, and the third protective layer are transparent thin film layers, and the transparent thin film layer is made of indium tin oxide ITO, silicon oxide SiO2, and silicon nitride. One or more of SiN _x .

In a preferred embodiment, at least one of the transmission regions is provided with an N-segment occlusion layer, and the occlusion layer divides the transmission region into N+1 transmission regions, where N is a positive integer greater than 1. .

In the above embodiment, the reflective layer is made of one or more of silver, titanium, aluminum, silver alloy, aluminum alloy or titanium alloy; the absorption layer is made of resin or chromium oxide. The substrate is a glass substrate or a flexible substrate.

Based on the same inventive concept, an embodiment of the present application provides a three-dimensional display device including the above-described pattern reflection structure.

In a preferred embodiment, in order to obtain a better three-dimensional display effect, the three-dimensional display device further includes: a first brightness enhancement sheet disposed on a side of the pattern reflection structure facing the backlight.

In a preferred embodiment, in order to obtain a better three-dimensional display effect, the three-dimensional display device further includes: a second brightness enhancement sheet disposed on a side of the light-reflecting display screen on the pattern reflection structure.

In a preferred embodiment, in order to obtain a better three-dimensional display effect, the three-dimensional display device further includes: a first brightness enhancement sheet disposed on a side of the pattern reflection structure facing the backlight, and the graphic The reflective structure faces the second brightness enhancement sheet disposed on a side of the transparent display screen. Based on the same inventive concept, the embodiment of the present application provides a method for fabricating a graphic reflection structure applied to a three-dimensional display, including:

Providing a substrate on which the first film layer and the second film layer are sequentially formed;

Exposing and developing the second film layer to form an absorption layer;

Using the absorbing layer as a mask, etching the first film layer to form a reflective layer, such that a projection of the absorbing layer and the reflective layer in a direction perpendicular to the pattern reflective structure overlaps;

The region where the first film layer and the second film layer are etched is a transmission region of the pattern reflection structure, and the region where the absorption layer and the reflection layer are the reflection region of the pattern reflection structure a domain, and the transmissive region and the reflective region are alternately arranged in sequence. The above preparation process only needs to perform one exposure and development, which saves the preparation cost and reduces the pollution to the environment.

In a preferred embodiment, a first protective layer is formed on the substrate before the first thin film layer is formed on the substrate; or, before the second thin film layer is formed on the substrate, Forming a second protective layer on a thin film layer; or forming a first protective layer on the substrate before forming a first thin film layer on the substrate, and before forming a second thin film layer on the substrate A second protective layer is formed on the first film layer. The first protective layer not only increases the bonding force between the reflective layer and the substrate, but also prevents the reflective layer from being affected by the external environment, thereby improving the reliability of the reflective layer. The second protective layer functions to prevent the reflective layer from being oxidized.

In a preferred embodiment, after the second protective layer is formed on the first thin film layer, the method further includes: using the absorbing layer as a mask, etching the second protective layer, so that the second The protective layer covers only the reflective area.

Based on the same inventive concept, an embodiment of the present application provides a graphic reflection structure applied to a three-dimensional display, disposed between a backlight and a transmissive display screen, the graphic reflection structure including a reflective layer, the first λ/4 wave a reflective layer disposed on a side of the pattern reflective structure adjacent to the backlight for reflecting a portion of light emitted by the backlight back to the backlight, the first λ/4 wave plate setting On a side of the pattern emission structure adjacent to the transmissive display screen, polarized light for reflecting the transmissive display screen back to the pattern reflection structure changes a polarization direction to be absorbed by the polarizer; The reflective structure includes a transmissive region disposed at the reflective region, and a reflective region configured to project a portion of the light emitted by the backlight to the transmissive display screen The transmission area and the reflection area are alternately arranged in order. The first λ/4 wave plate in the above-mentioned pattern reflection structure can change the polarization state of the polarized light reflected back to the pattern reflection structure by the transmissive display screen, and avoid the secondary reflection of the polarized light in the reflection area to generate crosstalk.

Based on the same inventive concept, an embodiment of the present application provides a three-dimensional display device including the above-described pattern reflection structure. The reflective layer in the above-mentioned pattern reflection structure can reflect the light of the reflection area back to the backlight for reuse, so that the brightness of the three-dimensional display device can be improved, and the first λ/4 wave plate of the reflection area can transmit the transmissive display screen. Polarized light reflected back to the pattern reflection structure changes the polarization side To avoid the secondary reflection of the light in the reflective region of the patterned reflective structure and crosstalk the polarized light, thereby causing the light transmitted from the transmitted region of the patterned reflective structure to pass through the parity of the pixel array of the transmissive display screen. After the sub-pixels, the three-dimensional images formed by entering the left and right eyes of the person respectively have a better display effect.

In a preferred embodiment, in order to obtain a better three-dimensional display effect, the three-dimensional display device further includes: a lower polarizer disposed on the first λ/4 wave plate and the penetrating Between the display screens.

In a preferred embodiment, in order to obtain a better three-dimensional display effect, the three-dimensional display device further includes: a second λ/4 wave plate and a brightness enhancement sheet, the second λ/4 wave plate and the first The fast/slow axis direction of the λ/4 wave plate is opposite; the second λ/4 wave plate is disposed on a surface of the reflective layer facing the backlight; the brightness enhancement plate is disposed at the second λ/4 wave plate orientation The surface of the backlight. The function of the brightness enhancement sheet is to increase the brightness of the light emitted by the backlight. The effect of the second λ/4 wave plate is mainly to change the polarized light passing through the brightness enhancement sheet into circularly polarized light, and then become the line after passing through the first λ/4 wave plate. The polarized light, when the polarization direction of the linearly polarized light coincides with the transmission axis of the lower polarizer, can pass through the lower polarizer with a minimum loss.

The reflective layer in the above-mentioned pattern reflection structure can reflect the light of the reflection area back to the backlight for reuse, so that the brightness of the three-dimensional display device can be improved, and the first λ/4 wave plate of the reflection area can be displayed from the transmissive display. The polarized light reflected back to the pattern reflection structure changes the polarization direction, avoiding the secondary reflection of the light in the reflection region of the pattern reflection structure and causing crosstalk to the polarized light, thereby causing the light transmitted from the transmission region of the pattern reflection structure to be After passing through the even and odd sub-pixels of the pixel array of the transmissive display screen, the three-dimensional images formed by entering the left and right eyes of the person respectively have better display effect.

DRAWINGS

In order to more clearly illustrate the technical solutions in the embodiments of the present application, the present application will be briefly described below with reference to the drawings used in the description of the embodiments.

1 is a schematic diagram of a three-dimensional display principle of a naked eye in an occlusion grating manner;

2 is a schematic structural view of a high-brightness naked-eye three-dimensional display device;

3A is a schematic structural diagram of a pattern reflection structure according to an embodiment of the present application;

3B is a schematic diagram of a transmission area and a reflection area of a pattern reflection structure according to an embodiment of the present application;

3C is a schematic diagram of a transmission area and a reflection area of a pattern reflection structure according to an embodiment of the present application;

3D to FIG. 3J are schematic structural diagrams of a pattern reflection structure according to an embodiment of the present application;

4A to 4C are schematic structural diagrams of a three-dimensional display according to an embodiment of the present application;

FIG. 5 is a flowchart of a method for fabricating a pattern reflection structure according to an embodiment of the present application;

6A is a schematic structural diagram of a pattern reflection structure provided by an embodiment of the present application;

FIG. 6B to FIG. 6C are schematic diagrams showing the structure of a three-dimensional display provided by an embodiment of the present application.

detailed description

The following is a description of some of the various embodiments of the present application, which are intended to provide a basic understanding of the application, and are not intended to identify key or critical elements of the application or the scope of the invention. According to the technical solution of the present application, other implementations can be obtained by replacing each other without changing the spirit of the present application.

In the drawings, the thickness of layers and regions are exaggerated for clarity. Nor is there any description of all of the various components shown in the figures. The various components in the figures are a disclosure that can be implemented by one of ordinary skill in the art.

The definition of the parity in the embodiment is intended to classify the pixels of the display content, and the definitions of the parity can be interchanged. In addition, directional terms (such as "upper", "lower", "transverse", "longitudinal", etc.) are used to describe various embodiments to indicate the orientations shown in the figures for the relative description, rather than The orientation of any embodiment is limited to a particular direction.

In order to solve the technical problem that the display brightness of the 3D display image is low in the prior art, the Chinese patent No. 201410123443.X, whose invention name is "a high-brightness naked-eye three-dimensional display device" discloses a figure as shown in FIG. The high-brightness three-dimensional display device shown includes three functional structures from bottom to top: a backlight 302, a patterned reflective layer 307, and a transmissive display screen 301. Its The pattern reflective layer 307 includes a reflective area 308 and a transparent area 309, and the reflective area 308 and the transparent area 309 are repeatedly arranged. In the above three-dimensional display device, the surface on the pattern reflection layer 307 for reflecting light may be referred to as a reflection surface, and the light in the reflection region is reflected back to the backlight through the reflection layer to be reused, so that the brightness is improved.

The backlight 302 can employ the same backlight as the existing liquid crystal display backlight. For example, the backlight may include: a reflective film, an LED (Light Emitting Diode) light bar, a light guide plate, a diffusion film, a brightness enhancement film, one or more layers of optical films. The backlight may also be an OLED (Organic Light-Emitting Diode) backlight.

The structure of the transmissive display screen 301 can be the same as that of a common liquid crystal display. For example, the liquid crystal display panel can include: an array substrate, and gate lines and data lines that are horizontally and vertically staggered on the upper surface of the array substrate and a matrix of pixels enclosed therein. . One column of sub-pixels 303 and another column of sub-pixels 304 in the figure represent odd-column sub-pixels and even-column sub-pixels, respectively. The pattern reflective layer 307 is disposed between the backlight 302 and the array substrate, and the transmission region 309 is configured to transmit part of the light emitted by the backlight 302 to the pixel array.

The three-dimensional display principle of the above-mentioned three-dimensional display device is that staggered inter-pixel sub-pixels are alternately arranged in an arbitrary row of pixels parallel to the direction of the left and right viewpoints of the person, and the parity sub-pixels respectively display the left and right eye image contents, and the pattern reflection layer is transmitted. The light from the area passes through the odd-even sub-pixels and enters the left and right eyes of the person respectively, so that the left and right eyes of the person respectively view the images of the left and right viewing angles, thereby being able to feel the three-dimensional effect. The light in the reflective area of the patterned reflective layer is reflected by the reflective layer and returned to the backlight for reuse to increase the brightness of the three-dimensional display.

In order to obtain a better brightness enhancement effect, based on the same three-dimensional display principle, the embodiment of the present application proposes a pattern reflection structure applied to a three-dimensional display as shown in FIG. 3A.

As shown in FIG. 3A, FIG. 3A is a further description of the structure shown in FIG. 2, in which the pattern reflection structure 401 is equivalent to the pattern reflection layer 307 in FIG. The pattern reflection structure 401 is disposed between the backlight 302 and the transmissive display screen 301. The pattern reflection structure 401 includes a transmission area 402 and a reflection area 403 for reflecting part of the light emitted by the backlight 302 back to the backlight. 302, the transmission area 402 is used to project part of the light emitted by the backlight 302 to the transmissive display screen 301, and the transmission area 402 and the reflection area 403 are alternately arranged in sequence. Wherein, the reflective area 403 is provided with a reflective layer 404 and an absorbing layer 405 disposed on a side of the pattern reflective structure 401 adjacent to the backlight 302, and an absorbing layer 405 disposed on a side of the patterned reflective structure 401 adjacent to the transmissive display screen 301 for absorbing penetration The display screen 301 reflects light back to the pattern reflective structure 401, and the absorption layer 405 overlaps the projection of the reflective layer 404 in the direction perpendicular to the pattern reflection structure 401. The projection of the absorbing layer 405 and the reflective layer 404 in the vertical direction of the pattern reflective structure 401 overlaps, so that light reflected from the display screen can be prevented from being emitted in the reflective area to cause crosstalk.

The transmission area 402 is used to project part of the light emitted by the backlight 302 to the transmissive display screen 301. Specifically, the transmission area 402 transmits part of the light emitted by the backlight 302 to the pixel array of the transmissive display screen 301. One pixel in the pixel array of the transmissive display screen 301 is composed of a plurality of sub-pixels, and the light transmitted to the pixel array of the transmissive display screen 301 causes the odd-numbered column sub-pixels (R pixels) of the same row to enter the right-eye viewpoint, the same line. The even-numbered column sub-pixels (L pixels) enter the left-eye viewpoint to form a 3D effect.

In the pattern reflection structure, the pattern formed by the transmission region 402 and the reflection region 403 includes: the transmission region 402 and the reflection region 403 are longitudinally arranged in a strip shape; or the transmission region 402 and the reflection region 403 are arranged in a strip shape transversely; Alternatively, the transmissive region 402 and the reflective region 403 are arranged in a strip shape or a checkerboard pattern in a strip shape.

For example, as shown in FIG. 3B, the white longitudinal rectangular strip represents the transmission area 402, and the stripe-filled longitudinal rectangular strip represents the reflection area 403. The transmission area 402 and the reflection area 403 are alternately arranged in order, which means that the white rectangular strip and the black rectangular strip are sequentially spaced apart. In addition, the transmissive area 402 and the reflective area 403 are respectively parallel to the columns of the pixel array of the transmissive display screen 301, and the position of each stripe-filled rectangular strip-shaped reflective area 403 is located adjacent to the adjacent columns in the pixel array. The pixel corresponds.

When the transmission region 402 of the above-described pattern reflection structure 401 and the reflection region 403 are arranged in a strip shape in the longitudinal direction, the human eye can see the three-dimensional display effect in the longitudinal direction. When the transmissive area 402 of the above-described pattern reflection structure 401 and the reflection area 403 are arranged in a strip shape laterally, the human eye can see the three-dimensional display effect in the lateral direction. When the transmissive area 402 and the reflective area 403 of the above-mentioned pattern reflection structure 401 are arranged in a strip shape in a strip shape, the human eye is in both the lateral direction and the longitudinal direction. The three-dimensional display effect can be seen from different viewpoints, so that the viewer does not cause a difference in line of sight when switching the viewing direction of the screen.

The reflective layer 404 in the pattern reflection structure 401 can reflect the light of the reflection area 403 back to the backlight 302 for reuse, so that the brightness of the three-dimensional display can be improved, and the absorption layer 405 of the reflection area 403 can absorb the transmissive display screen. The light reflected by the reflection area 403 of the pattern reflection structure 401 can prevent the light reflected from the display screen from being emitted in the reflection area to generate crosstalk, so that the light transmitted from the transmission area 402 of the pattern reflection structure 401 is passed through. After the parity sub-pixels of the pixel array of the transmissive display screen 301, the three-dimensional images formed by entering the left and right eyes of the person respectively have a better display effect.

The reflective layer 404 of the reflective region of the graphic reflection structure 401 is made of one or more of silver, titanium, aluminum, silver alloy, aluminum alloy or titanium alloy, and the absorption layer 405 of the reflective region is made of resin or chromium oxide. .

Based on the above-mentioned pattern reflection structure 401, the following embodiments of the present application also propose the following deformed pattern reflection structures.

In order to improve the reliability of the reflective structure, the embodiment of the present application provides a patterned reflective structure having a protective layer. Several pattern reflective structures having a protective layer are listed below in conjunction with specific embodiments.

First: a patterned reflective structure having a first protective layer.

As shown in FIG. 3C, the pattern reflective structure having the first protective layer includes a transmission layer 405 and a carrier layer 402, a reflective layer 403, a reflective layer 403 and a reflective region 403. The substrate 406 of the reflective layer 404 and the first protective layer 407 disposed between the reflective layer 404 and the substrate 406. The substrate 406 may be a glass substrate or a flexible substrate. For example, the flexible substrate is a polarizer or a combination of a polarizer and a brightness enhancement sheet. The polarizer herein refers to the lower polarized light as shown in FIGS. 4A to 4C. sheet. The first protective layer 407 is a transparent thin film layer, and the material of the transparent thin film layer includes one or more of indium tin oxide ITO, silicon oxide SiO2, and silicon nitride SiNx. Since the reflective layer 404 deposited directly on the substrate is prone to defects such as uneven thickness or easy peeling of the reflective layer film, providing the first protective layer 407 between the substrate 406 and the reflective layer 404 can not only increase the reflective layer 404 and the substrate 406. The bond between them, and Moreover, the reflective layer 404 can be prevented from being affected by the external environment, thereby improving the reliability of the reflective layer 404.

Second: a patterned reflective structure having a second protective layer.

The pattern reflective structure having the second protective layer includes a substrate carrying the absorption layer 405 and the reflective layer 404 in addition to the transmission region 402, the reflective region 403, the reflective layer 404 of the reflective region 403, and the reflective layer 403 absorption layer 405. And a second protective layer disposed between the absorber layer 405 and the reflective layer 404. The second protective layer is a transparent thin film layer, and the material of the transparent thin film layer includes one or more of indium tin oxide ITO, an organic insulating layer, silicon oxide SiO2, and silicon nitride SiNx. For example, in the pattern reflection structure shown in FIG. 3D, 406 is a substrate, 408 is a second protective layer, and the second protective layer 408 covers the reflective area 403 and the transparent area 402. In the pattern reflection structure shown in FIG. 3E, 406 is a substrate, 408' is a second protective layer, and the second protective layer 408' covers only the reflective area 403. The second protective layer in the above-described pattern reflective structure functions to prevent the reflective layer 404 from being oxidized.

Third: a patterned reflective structure having a first protective layer and a second protective layer.

The pattern reflective structure having the first protective layer and the second protective layer includes a transmission layer 405 and a reflection in addition to the transmission layer 402, the reflection region 403, the reflection layer 404 of the reflection region 403, and the absorption layer 405 absorption layer 405. The substrate of layer 404, a first protective layer disposed between reflective layer 404 and substrate 406, and a second protective layer disposed between absorber layer 405 and reflective layer 404. For example, in the pattern reflection structure shown in FIG. 3F, 406 is a substrate, 407 is a first protection layer, 408 is a second protection layer, and the second protection layer 408 can cover the reflection area 403 and the transmission area 402. In the pattern reflection structure shown in FIG. 3G, 406 is a substrate, 407 is a first protection layer, 408' is a second protection layer, and the second protection layer 408' covers only the reflection area 403.

In order to protect the absorption layer 405 of the above-mentioned several kinds of pattern reflection structures, a third protection layer may be added on the basis of the above several types of pattern reflection structures, respectively. Wherein the third protective layer is disposed on the surface of the absorbing layer 405. For example, a pattern reflective structure as shown in FIG. 3H, 409 is a third protective layer, and a third protective layer 409 may cover the reflective area 403 and the transparent area 402. For example, as shown in FIG. 3I, the pattern reflective structure, 409' is a third protective layer, and the third protective layer 409' may cover only the reflective area. Field 403. The third protective layer is a transparent thin film layer, and the material of the transparent thin film layer includes one or more of indium tin oxide ITO, silicon oxide SiO2, and silicon nitride SiNx. The third protective layer in the above structure is mainly for preventing the absorption layer 405 from being affected by the external environment to improve the reliability of the absorption layer 405.

Based on the above-mentioned pattern reflection structure, the embodiment of the present application further provides another pattern reflection structure.

The at least one transmission region of the pattern reflection structure is provided with an N-segment occlusion layer. In the transmission region, the N-segment occlusion layer divides the transmission region into N+1 transmission regions, and N is a positive integer greater than 1. The correspondence between the entire transmission area of the pattern reflection structure and the pixel can be kept unchanged. A specific interval may be set between the N segments of the occlusion layer, and the intervals may be equal or unequal. For example, the transmission region 402 of the pattern reflection structure 401 shown in FIG. 3J is provided with five occlusion layers 410 having a fixed interval, and the occlusion layer 410 divides the transmission region 402 into six small transmission regions.

Based on the pattern reflection structure in the above embodiment, the embodiment of the present application further provides a three-dimensional display device including a pattern reflection structure 401, wherein the pattern reflection structure 401 is disposed between the backlight 302 and the transmissive display screen 301. The pattern reflection structure 401 of the three-dimensional display device can enhance the brightness of the three-dimensional display device, and can also prevent cross-talk caused by secondary reflection of light reflected from the display screen in the reflection region.

In order to obtain a better three-dimensional display effect, a first brightness enhancement sheet disposed on the side of the backlight 302 in the pattern reflection structure 401; or a second brightness enhancement sheet disposed on the side of the pattern reflection structure 401 facing the light transmission display screen Or a first brightness enhancement sheet disposed on the side of the pattern reflection structure 401 toward the backlight 302, and a second brightness enhancement sheet disposed on the side of the pattern reflection structure 401 facing the light transmission type display screen.

For example, a schematic structural diagram of a three-dimensional display according to an embodiment of the present application, as shown in FIG. 4A, includes a top polarizer (POL-U), a color filter glass (CF Glass), and an array substrate from top to bottom. (TFT), thin film transistor glass (TFT Glass), lower polarizer (POL-D), pattern reflection structure 401, first brightness enhancement sheet 411, and backlight (BL). In the present embodiment, the lower polarizer can also serve as a substrate for the pattern reflective structure 401.

For example, the structure of a three-dimensional display provided by the embodiment of the present application as shown in FIG. 4B The figure includes, in order from top to bottom, an upper polarizer (POL-U), a color filter glass (CF Glass), an array substrate, a thin film transistor glass (TFT Glass), a lower polarizer, a second brightness enhancement sheet 412, and a pattern. Reflective structure 401, backlight (BL).

For example, a schematic structural diagram of a three-dimensional display provided by the embodiment of the present application as shown in FIG. 4C includes, in order from top to bottom, an upper polarizer (POL-U), a color filter glass (CF Glass), and an array substrate. , TFT Glass, lower polarizer, second brightness enhancement 412, pattern reflection structure, first brightness enhancement sheet, backlight (BL). The first light-increasing sheet and the second light-increasing sheet of the three-dimensional display can transmit polarized light in a certain direction and reflect polarized light perpendicular to the direction, thereby improving light utilization efficiency and enhancing brightness.

Based on the pattern reflection structure in the above embodiment, the embodiment of the present application provides a method for fabricating the pattern reflection structure as shown in FIG. 5, which specifically includes the following steps:

Step A1, providing a substrate, sequentially forming a first film layer and a second film layer on the substrate;

Step A2, exposing and developing the second film layer to form an absorption layer;

Step A3, using the absorbing layer as a mask, etching the first film layer to form a reflective layer, so that the projection of the absorbing layer and the reflective layer in the vertical direction of the pattern reflective structure overlaps;

The region where the first film layer and the second film layer are etched is a transmission region of the pattern reflection structure, and the region where the absorption layer and the reflection layer are located is a reflection region of the pattern reflection structure, and the transmission region and the reflection region are alternately arranged in sequence. .

The pattern reflection structure prepared according to the above method flow is shown in Fig. 3A. The above preparation process only needs to perform one exposure and development, which saves the preparation cost and reduces the pollution to the environment.

Based on the manufacturing steps of the above-mentioned pattern reflection structure, the embodiment of the present application further exemplifies a method for fabricating a pattern reflection structure having a first protection layer, which specifically includes the following steps:

Step one, providing a substrate, forming a first protective layer on the substrate;

Step two, forming a first film layer on the surface of the first protective layer;

Step 3, forming a second film layer on the surface of the first film layer;

Step 4, exposing and developing the second film layer to form an absorption layer;

Step 5: etching the first film layer as a mask to form a reflective layer, so that the absorption layer The projection of the reflective layer in the vertical direction of the pattern reflection structure overlaps.

The pattern reflection structure prepared according to the above method flow is shown in Fig. 3C.

Based on the manufacturing steps of the above-mentioned pattern reflective structure, the embodiment of the present application further exemplifies a method for fabricating a pattern reflective structure having a second protective layer, which specifically includes the following steps:

Step one, providing a substrate, forming a first film layer on the surface of the first protective layer on the substrate;

Step two, forming a second protective layer on the first film layer;

Step three, forming a second film layer on the surface of the second protective layer;

Step 5, using the absorbing layer as a mask, etching the second protective layer, so that the second protective layer covers only the reflective region;

In step 6, the first thin film layer is etched by using the absorbing layer as a mask to form a reflective layer, so that the projection of the absorbing layer and the reflective layer in the vertical direction of the patterned reflective structure overlaps. The pattern reflection structure prepared according to the above method flow is shown in Fig. 3E.

Based on the manufacturing steps of the above-mentioned pattern reflection structure, the embodiment of the present application further exemplifies a method for fabricating a pattern reflection structure having a first protection layer and a second protection layer, which specifically includes the following steps:

Step 2, forming a first film layer on the surface of the first protective layer on the substrate;

Step three, forming a second protective layer on the first film layer;

Step 4, forming a second film layer on the surface of the second protective layer on the substrate;

Step 5, exposing and developing the second film layer to form an absorption layer;

Step 6: using the absorbing layer as a mask, etching the second protective layer, so that the second protective layer covers only the reflective region;

In step 7, the first thin film layer is etched as a mask to form a reflective layer, such that the projection of the absorbing layer and the reflective layer in the vertical direction of the patterned reflective structure overlaps.

The pattern reflection structure prepared according to the above method flow is shown in Fig. 3G.

The method for fabricating the pattern reflective structure having the first protective layer, the second protective layer and the third protective layer is specifically included in the embodiment of the present invention. The following steps:

Step three, forming a second protective layer on the first film layer;

Step 5, forming a third protective layer on the second film layer;

Step 6: exposing and developing the third protective layer, so that the third protective layer covers only the reflective region;

Step 7: exposing and developing the second film layer to form an absorption layer;

Step VIII, using the absorbing layer as a mask, etching the second protective layer, so that the second protective layer covers only the reflective region;

In step IX, the first thin film layer is etched by using the absorbing layer as a mask to form a reflective layer, so that the projection of the absorbing layer and the reflective layer in the vertical direction of the patterned reflective structure overlaps. The pattern reflection structure prepared according to the above method flow is shown in Fig. 3I.

The embodiment of the present application further provides a method for fabricating a patterned reflective structure having a second protective layer. The second protective layer of the patterned reflective structure covers the reflective area and the transparent area, and specifically includes the following steps:

In the first step, a substrate is provided, a first film layer is formed on the substrate, and the first film layer is patterned to form a reflective layer. The area covered by the reflective layer on the substrate is a reflective area of the pattern reflective structure, and the substrate is not covered by the reflective layer. The area is a light-transmitting area of the pattern reflection structure, and the light-transmitting area and the reflection area are alternately arranged in sequence; in step 2, a second protective layer is formed on the substrate, so that the second protective layer covers the reflective area and the light-transmitting area; A second film layer is formed on the second protective layer, and the second film layer is patterned to form an absorption layer such that the projection of the absorption layer and the reflective layer in the vertical direction of the pattern reflection structure overlaps. The pattern reflection structure prepared according to the above method flow is shown in Fig. 3D.

In the above embodiment, the reflective layer 404 in the pattern reflection structure can reflect the light of the reflective area 403 back to the backlight 302 for reuse, so that the brightness of the three-dimensional display can be improved, and the absorption layer 405 of the reflective area 403 can absorb the light. Transmissive display 301 is reflected to the graphic reflection junction The light of the reflective region 403 of the structure 401 avoids the secondary reflection of the light from the reflective region 403 of the patterned reflective structure 401 to cause crosstalk, thereby causing the light transmitted from the transmissive region 402 of the patterned reflective structure 401 to pass through the transmissive display. The display effect of the three-dimensional image formed by the right and left eyes of the pixel array of the pixel array of the screen 301 is better.

Based on the same inventive concept, the embodiment of the present application further provides a graphic reflection structure, as shown in FIG. 6A, and FIG. 6A is a further description of the structure shown in FIG. 2, wherein the image reflection structure 601 is equivalent to the graphic in FIG. Reflective layer 307. The pattern reflection structure 601 is disposed between the backlight 302 and the transmissive display screen 301. The pattern reflection structure 601 includes a reflective layer 604, a first λ/4 wave plate 605, and the reflective layer 604 is disposed on the pattern reflection structure 601 near the backlight. One side of the 302 is configured to reflect a portion of the light emitted by the backlight 302 back to the backlight 302. The first λ/4 wave plate 605 is disposed on a side of the pattern reflective structure 601 near the transmissive display screen 302 for being worn. The polarized light reflected back to the pattern reflection structure 301 of the transmissive display screen 301 changes the polarization direction to be absorbed by the lower polarizer; the pattern reflection structure 601 includes the transmission area 602 and the reflection area 603, and the reflection layer 604 is disposed in the reflection area 603; The area 602 is used to project part of the light emitted by the backlight 301 to the transmissive display screen 301, and the transmission area 602 and the reflection area 603 are alternately arranged in sequence.

The material of the reflective layer 604 is one or more of silver, titanium, aluminum, a silver alloy, an aluminum alloy, or a titanium alloy.

The first λ/4 wave plate 605 is a birefringent single crystal wafer of a certain thickness such that the polarization direction of the polarized light passing through the first λ/4 wave plate changes. For example, when the angle between the vibration direction of the linearly polarized light and the optical axis direction of the first λ/4 wave plate is not 45°, the polarization direction of the linearly polarized light passes through the first λ/4 wave plate, and becomes an ellipse. Polarized light; when the angle between the vibration direction of the linearly polarized light and the optical axis direction of the first λ/4 wave plate is 45°, the polarization direction of the linearly polarized light passes through the first λ/4 wave plate changes to become a circle polarized light. Similarly, when the angle between the vibration direction of the elliptically polarized light and the optical axis direction of the first λ/4 wave plate is not 45°, the polarization direction of the elliptically polarized light changes after passing through the first λ/4 wave plate, and becomes Linearly polarized light. When the angle between the vibration direction of the circularly polarized light and the optical axis direction of the first λ/4 wave plate is 45°, the polarization direction of the circularly polarized light passes through the first λ/4 wave plate, and becomes linearly polarized light.

The first λ/4 wave plate in the pattern reflection structure 601 can change the polarization state of the polarized light reflected back to the pattern reflection structure 601 by the transmissive display screen 301 to prevent secondary reflection of the polarized light in the reflection area 403. Crosstalk.

The reflective layer 604 in the pattern reflection structure 601 can reflect the light of the reflection area 603 back to the backlight 302 for reuse, so that the brightness of the three-dimensional display device can be improved, and the first λ/4 wave plate of the reflection area 603 can be The polarized light reflected back to the pattern reflection structure 301 of the transmissive display screen 301 changes the polarization direction, avoiding the secondary reflection of the light in the reflection area 603 of the pattern reflection structure 601 and causing crosstalk to the polarized light, thereby causing the pattern reflection structure 601. The light transmitted through the transmission region 602 passes through the even and sub-pixels of the pixel array of the transmissive display screen 301, and the three-dimensional image formed by entering the left and right eyes of the person respectively has a better display effect.

Based on the above-mentioned pattern reflection structure 601, the embodiment of the present application further provides a three-dimensional display device, including the above-mentioned pattern reflection structure 601, which is disposed between the backlight 302 and the transmissive display screen 301.

In order to obtain a better three-dimensional display effect, the three-dimensional display device may further include: a lower polarizer disposed between the first λ/4 wave plate 605 and the transmissive display screen 301, through the first λ/ The polarization direction of the light of the four-wave plate 605 coincides with the transmission axis of the lower polarizer, so that the first λ/4 wave plate in the pattern reflection structure 601 can reflect the polarization of the transmissive display screen 301 back to the pattern reflection structure 601. After the light changes the polarization direction, it passes through the lower polarizer and is absorbed by the lower polarizer, so that the polarized light is prevented from being reflected twice in the reflective region 403 to cause crosstalk to the polarized light.

For example, a schematic structural view of a three-dimensional display device as shown in FIG. 6B includes, in order from top to bottom, an upper polarizer (POL-U), a color filter glass (CF Glass), an array substrate, and a thin film transistor glass ( TFT Glass), lower polarizer (POL-D), pattern reflection structure 601, and backlight (BL).

In order to obtain a better three-dimensional display effect, the above three-dimensional display device may further include: a second λ/4 wave plate 607 and a brightness enhancement plate 608, and a second λ/4 wave plate 607 and a fast lag axis of the first λ/4 wave plate 605 The second λ/4 wave plate 607 is disposed on the surface of the reflective layer 604 facing the backlight 302; the brightness enhancement plate 608 is disposed on the surface of the second λ/4 wave plate 607 facing the backlight 302. Grace The function of the sheet 608 is to increase the brightness of the light emitted by the backlight. The second λ/4 wave plate 607 mainly functions to change the polarized light passing through the brightness enhancement sheet 608 into circularly polarized light, and then pass through the first λ/4 wave plate. The linearly polarized light, when the polarization direction of the linearly polarized light coincides with the transmission axis of the lower polarizer, can pass through the lower polarizer with a minimum loss.

The second λ/4 wave plate and the first λ/4 wave plate operate in the same principle, and the polarization state of the polarized light passing through the second λ/4 wave plate can also be changed. The second λ/4 wave plate is opposite to the fast axis axis of the first λ/4 wave plate 605, so that the light from the backlight passing through the brightness enhancement sheet enters the lower polarizer without changing the polarization state.

For example, a schematic structural view of a three-dimensional display device as shown in FIG. 6C includes, in order from top to bottom, an upper polarizer (POL-U), a color filter glass (CF Glass), an array substrate, and a thin film transistor glass ( TFT Glass), a lower polarizer (POL-D), a pattern reflection structure 601, a second λ/4 wave plate 607, a brightness enhancement sheet 608, and a backlight (BL). The second λ/4 wave plate 607 is opposite to the fast lag axis direction of the first λ/4 wave plate 605 in the pattern reflection structure 601. The pattern reflection structure 601 can reflect the light of the reflection area back to the backlight for reuse, and increase the brightness of the three-dimensional display. The first λ/4 wave plate 605 can also reflect the polarization of the transmissive display screen 301 back to the pattern reflection structure 601. The light changes the polarization direction to prevent secondary reflection of the light in the reflection region 603 of the pattern reflection structure 601 to cause crosstalk to the polarized light. The second λ/4 wave plate 607 and the brightness enhancement sheet 608 in the three-dimensional display device shown in FIG. 6C enable the backlight to emit light passing through the brightness enhancement sheet without entering the polarization state and entering the lower polarizer. The polarization direction of the light reflected back from the reflection area is changed twice and returned to the backlight.

The natural light emitted from the backlight passes through the brightness enhancement sheet 608 and the second λ/4 wave plate 607 to reach the optical path of the pattern reflection structure 601 and the light reflected back from the reflection layer passes through the second λ/4 wave plate 607 and the brightness enhancement sheet 608 to reach the backlight. The optical path process is as follows: after the natural light emitted from the backlight passes through the brightness enhancement sheet 608, linearly polarized light is formed, and when the linearly polarized light passes through the second λ/4 wave plate, the polarization direction thereof changes to form circularly polarized light, and a part of the circularly polarized light is sequentially transmitted. Passing through the transmission region of the pattern reflection structure and the second λ/4 wave plate to return the linearly polarized light to the transmissive display screen; and another portion of the circularly polarized light is reflected by the reflective layer of the pattern reflection structure 601, and then passes through the second λ/4 wave plate, and form linearly polarized light and return to backlight source.

While the preferred embodiment of the present application has been described, it will be apparent that those skilled in the art can make further changes and modifications to the embodiments. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and the modifications and

It will be apparent to those skilled in the art that various modifications and changes can be made in the present application without departing from the spirit and scope of the application. Thus, it is intended that the present invention cover the modifications and variations of the present invention.

Claims

A pattern reflection structure applied to a three-dimensional display, disposed between a backlight and a transmissive display screen, wherein the pattern reflection structure comprises a transmissive area and a reflective area, wherein the reflective area is used to Part of the light emitted by the backlight is reflected back to the backlight, and the transmission area is for projecting part of the light emitted by the backlight to the transmissive display screen, and the transmission area and the reflection area are sequentially Alternately arranged;

The reflective area is provided with a reflective layer disposed on a side of the patterned reflective structure adjacent to the backlight, and an absorbing layer disposed adjacent to the transmissive display On one side of the screen, for absorbing light reflected by the transmissive display screen back to the pattern reflective structure, and the projection of the absorbing layer and the reflective layer in a direction perpendicular to the pattern reflection structure overlaps.
The pattern reflective structure of claim 1 wherein said pattern reflective structure further comprises a substrate carrying said absorbing layer and said reflective layer;

Providing a first protective layer between the reflective layer and the substrate; or

Providing a second protective layer between the absorbing layer and the reflective layer; or

A first protective layer is disposed between the reflective layer and the substrate, and a second protective layer is disposed between the absorbing layer and the reflective layer.
The pattern reflective structure according to claim 1 or 2, wherein a third protective layer is further provided on the surface of the absorbing layer.
The pattern reflection structure according to claim 3, wherein

The second protective layer covers the reflective area and the transparent area; or

The second protective layer covers only the reflective area; or

The third protective layer covers the reflective area and the transparent area; or

The third protective layer covers only the reflective area.
The pattern reflective structure according to claim 3, wherein the first protective layer, the second protective layer, and the third protective layer are transparent thin film layers, and the transparent thin film layer is made of indium oxide. One or more of tin ITO, silicon oxide SiO2, and silicon nitride SiN x .
The pattern reflection structure according to claim 1, wherein

At least one of the transmission regions is provided with an N-segment occlusion layer, and the occlusion layer divides the transmission region into N+1 transmission regions, and N is a positive integer greater than 1.
The patterned reflective structure according to claim 1, wherein the reflective layer is made of one or more of silver, titanium, aluminum, a silver alloy, an aluminum alloy or a titanium alloy; Resin or chromium oxide.
The pattern reflective structure according to claim 2, wherein the substrate is a glass substrate or a flexible substrate.
A three-dimensional display device comprising the pattern reflection structure according to any one of claims 1 to 8.
The three-dimensional display device of claim 9, further comprising:

a first brightness enhancement sheet disposed on a side of the pattern reflection structure toward the backlight, and/or a second brightness enhancement sheet disposed on a side of the pattern reflection structure toward the light transmission type display screen.
A method for fabricating a graphic reflection structure applied to a three-dimensional display, comprising:

Providing a substrate on which the first film layer and the second film layer are sequentially formed;

Exposing and developing the second film layer to form an absorption layer;

Using the absorbing layer as a mask, etching the first film layer to form a reflective layer, such that a projection of the absorbing layer and the reflective layer in a direction perpendicular to the pattern reflective structure overlaps;

The region where the first film layer and the second film layer are etched is a transmission region of the pattern reflection structure, and the region where the absorption layer and the reflection layer are located is a reflection region of the pattern reflection structure. And the transmissive area and the reflective area are alternately arranged in sequence.
The method according to claim 11, further comprising:

Forming a first protective layer on the substrate before forming the first thin film layer on the substrate; or

Forming a second protection on the first film layer before forming the second film layer on the substrate Layer; or,

Before forming the first thin film layer on the substrate, forming a first protective layer on the substrate, and forming a second protective layer on the first thin film layer before forming the second thin film layer on the substrate.
The method of claim 12, after forming the second protective layer on the first film layer, further comprising:

Using the absorbing layer as a mask, the second protective layer is etched such that the second protective layer covers only the reflective area.
A pattern reflection structure applied to a three-dimensional display is disposed between a backlight and a transmissive display screen, wherein the pattern reflection structure comprises a reflective layer, a first λ/4 wave plate, and the reflective layer is disposed Providing a portion of the light emitted by the backlight back to the backlight on a side of the pattern reflective structure adjacent to the backlight, the first λ/4 wave plate being disposed adjacent to the graphic emission structure One side of the transmissive display screen, the polarized light for reflecting the transmissive display screen back to the pattern reflective structure changes a polarization direction, thereby being absorbed by the polarizer;

The pattern reflective structure includes a transmissive area and a reflective area, the reflective layer is disposed at the reflective area, and the transmissive area is configured to project a portion of the light emitted by the backlight to the transmissive display screen. And the transmissive area and the reflective area are alternately arranged in sequence.
A three-dimensional display device comprising the pattern reflective structure of claim 14.
A three-dimensional display device according to claim 15, further comprising: a lower polarizer disposed between said first λ/4 wave plate and said transmissive display screen.
A three-dimensional display device according to claim 16, further comprising: a second λ/4 wave plate and a brightness enhancement film, the second λ/4 wave plate and the first λ/4 wave plate are slow and slow The direction of the axis is opposite;

The second λ/4 wave plate is disposed on a surface of the reflective layer facing the backlight;

The brightness enhancement sheet is disposed on a surface of the second λ/4 wave plate facing the backlight.