WO2016104455A1 - Polyamide resin composition, and polyamide resin molded article - Google Patents

Polyamide resin composition, and polyamide resin molded article Download PDF

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Publication number
WO2016104455A1
WO2016104455A1 PCT/JP2015/085726 JP2015085726W WO2016104455A1 WO 2016104455 A1 WO2016104455 A1 WO 2016104455A1 JP 2015085726 W JP2015085726 W JP 2015085726W WO 2016104455 A1 WO2016104455 A1 WO 2016104455A1
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Prior art keywords
substituent
group
iminoether
general formula
polyamide resin
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PCT/JP2015/085726
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French (fr)
Japanese (ja)
Inventor
福田 誠
上平 茂生
倫弘 小川
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富士フイルム株式会社
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Priority to JP2016566367A priority Critical patent/JPWO2016104455A1/en
Publication of WO2016104455A1 publication Critical patent/WO2016104455A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/29Compounds containing one or more carbon-to-nitrogen double bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers

Definitions

  • the present disclosure relates to a polyamide resin composition and a polyamide resin molded article.
  • resin moldings are used in various fields such as machine parts, electronic parts, construction materials, films and the like. Although resin and an additive are selected according to a use, these resin moldings are known that the resin synthesize
  • polyamides are stable in alkaline media but neutral or susceptible to hydrolysis in the presence of acids.
  • polyesters such as polyethylene terephthalate (PET) used as bottles for beverages and protective sheets for solar cells are also degraded by hydrolysis.
  • PET polyethylene terephthalate
  • an end capping agent (hereinafter sometimes referred to as a "sealing agent") that seals (deactivates) the terminal carboxy group is used.
  • a sealing agent that seals (deactivates) the terminal carboxy group.
  • JP-A-6-16933 in order to provide a polyamide having hydrolysis resistance in an acidic medium, it is proposed to add 0.1 to 5% by mass of polycarbodiimide as a sealing agent to polyamide. It is done.
  • JP-A-2010-031174 it is proposed to improve hydrolysis resistance by adding a cyclic iminoether compound such as oxazoline as a sealing agent to polyester such as polyethylene terephthalate (PET). ing.
  • a cyclic iminoether compound such as oxazoline
  • PET polyethylene terephthalate
  • the present invention has been made in view of the above circumstances, and is a polyamide resin capable of suppressing generation of volatile gas and thickening during molding and producing a resin molded product having hydrolysis resistance. It is intended to provide a composition. Another object of the present invention is to provide a polyamide resin molded product which is resistant to hydrolysis and which can be produced by suppressing the generation of volatile gas and thickening.
  • R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent
  • R 3 represents R 11 represents an alkyl group represented by Formula (2) or an aryl group represented by the following General Formula (3)
  • R 11 , R 12 and R 13 each independently represent a hydrogen atom or an alkyl which may have a substituent Represents an aryl group which may have a group or a substituent.
  • R 31 , R 32 and R 33 each independently represent a hydrogen atom or a substituent. R 31 , R 32 and R 33 may be linked to each other to form a ring.
  • R 41 represents a substituent, and n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring.
  • * represents a position to be bonded to a nitrogen atom.
  • ⁇ 2> is an aryl group R 3 is represented by the general formula (3) in the general formula (1) Polyamide resin composition according to ⁇ 1>.
  • R 11 , R 12 and R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent.
  • R 21 represents a substituent
  • m represents an integer of 0 to 5, when R 21 there are a plurality, even more R 21 is the same as each other or different, a ring together You may form.
  • R 41 represents a substituent
  • n represents an integer of 0 to 5, when R 41 there are a plurality, even more R 41 is the same as each other or different, a ring together You may form.
  • ⁇ 4> Any one of ⁇ 1> to ⁇ 3>, wherein the multimer of the iminoether compound represented by the general formula (1) is a chain iminoether group-containing compound represented by the following general formula (6) The polyamide resin composition as described in 1).
  • R 11 , R 12 and R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent.
  • R 41 represents a substituent
  • n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring.
  • p represents an integer of 2 to 4
  • L 1 has an alkylene moiety which may have a substituent, an arylene moiety which may have a substituent, or a substituent at the end of bonding to a carbon atom It also represents a p-valent group which is a good alkoxylene moiety.
  • ⁇ 5> Any one of ⁇ 1> to ⁇ 3>, wherein the multimer of the iminoether compound represented by the general formula (1) is a chain iminoether group-containing compound represented by the following general formula (7)
  • R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent
  • R 11 and R 12 And R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent
  • p represents an integer of 2 to 4
  • p represents a p-valent group in which L 2 is a arylene moiety which may have a substituent or a cycloalkylene moiety which may have a substituent.
  • ⁇ 6> Any one of ⁇ 1> to ⁇ 3>, wherein the multimer of the iminoether compound represented by the general formula (1) is a chain iminoether group-containing compound represented by the following general formula (8) The polyamide resin composition as described in 1).
  • R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent
  • R 41 represents a substituent
  • n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring.
  • p represents an integer of 2 to 4
  • L 3 represents a p-valent group in which the bonding end with the oxygen atom is an alkylene part. In the alkylene moiety of L 3 , part or all of the hydrogen atoms may be substituted with an alkyl group which may have a substituent or an aryl group which may have a substituent.
  • the polyamide resin composition according to any one of ⁇ 1> to ⁇ 6> which comprises 0.1 to 2.0 parts by mass of a chain iminoether group-containing compound with respect to 100 parts by mass of the ⁇ 7> polyamide.
  • a resin composition capable of suppressing generation of a volatilized gas at the time of molding and thickening and capable of producing a polyamide resin molded product having hydrolysis resistance. Further, according to the present invention, there is provided a polyamide resin molded article which is resistant to hydrolysis and which can be produced while suppressing the generation of volatile gas and thickening.
  • the polyamide resin composition of the present disclosure comprises at least one chain selected from a polyamide, an iminoether compound represented by the following general formula (1), and a multimer of an iminoether compound represented by the general formula (1) And an iminoether group-containing compound (hereinafter sometimes simply referred to as a "chain iminoether group-containing compound").
  • R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent
  • R 3 represents R 11 represents an alkyl group represented by Formula (2) or an aryl group represented by the following General Formula (3)
  • R 11 , R 12 and R 13 each independently represent a hydrogen atom or an alkyl which may have a substituent Represents an aryl group which may have a group or a substituent.
  • R 31 , R 32 and R 33 each independently represent a hydrogen atom or a substituent. R 31 , R 32 and R 33 may be linked to each other to form a ring.
  • R 41 represents a substituent, and n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring.
  • * represents a position to be bonded to a nitrogen atom.
  • a chain iminoether group-containing compound synthesized via an iminoether compound represented by the general formula (1) which means a chain iminoether group-containing compound which has two or more partial structures other than a linking group
  • a chain iminoether group-containing compound synthesized without passing through the iminoether compound represented by the general formula (1) is also included.
  • the polyamide resin composition of the present disclosure it is possible to suppress the generation and thickening of the volatilized gas derived from the sealing agent, and to produce a polyamide resin molded article having hydrolysis resistance. The reason is presumed as follows.
  • An iminoether compound represented by the general formula (1) or an iminoether compound represented by the general formula (1) in which an iminoether group (-N C-O-) is in a chain form (non-cyclic)
  • a resin composition containing an ether group-containing compound and a polyamide is heat-melted and molded as in the following reaction scheme, a chain iminoether portion and a terminal carboxy group of polyamide (waveline is a portion other than the terminal carboxy group of polyamide)
  • An amide compound and a carboxylic acid ester are formed by reaction with (1) and the alkyl moiety linked to the iminoether group is cleaved and esterified and added to the carboxy group at the end of the polyamide.
  • the iminoether compound represented by the general formula (1) reacts with the carboxy group of the polyamide terminal or the carboxy group of a low molecular weight component such as a monomer as described in the above scheme to deactivate the carboxy group. Hydrolyzability is improved.
  • the iminoether moiety containing an iminoether group is cyclic
  • the polyamide is added to the iminoether moiety, and the viscosity is increased by increasing the molecular weight of the polymer.
  • the cyclic iminoether moiety is bifunctional or more (dimer or more)
  • Synthesis method of imino ether compound As a method of synthesizing the iminoether compound represented by the general formula (1), a method in which an amide compound is imidoyl chloride, reaction with an alkoxide, and a method in which an aniline compound and an ortho ester compound are reacted. Although any method may be used as a synthesis method of the iminoether compound represented by General formula (1), it is preferable to use the method of making an aniline compound and an ortho ester compound react. A polyamide resin composition to which an iminoether compound synthesized by a method of reacting an aniline compound and an ortho ester compound is added is preferable because hydrolysis resistance and color tone become better.
  • the ortho ester compound used for the synthesis of the iminoether compound represented by the general formula (1) is preferably a compound represented by the following general formula (9).
  • R 4 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent
  • R 51 and R 52 And R 53 each independently represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent.
  • ortho ester compounds used for the synthesis of iminoether compounds represented by the general formula (1) include trimethyl orthoacetate, triethyl orthoacetate, tripropyl orthoacetate, tributyl orthoacetate, tribenzyl orthoacetate, trimethyl orthoformate, Triethyl orthoformate, tripropyl orthoformate, tributyl orthoformate, tribenzyl orthoformate, trimethyl orthopropionate, triethyl orthopropionate, tripropyl orthopropionate, tributyl orthopropionate, tributyl orthopropionate, trimethyl orthobenzoate, trimethyl orthobenzoate And triethyl orthobenzoate, tributyl orthobenzoate, and tribenzyl orthobenzoate.
  • the ortho ester compound may be a commercially available product or may be synthesized. In the case of synthesis, it can be synthesized by imidating a nitrile compound such as hydrogen cyanide, acetonitrile, propionitrile, n-butyronitrile, benzonitrile or the like and reacting with an alcohol or a method of reacting trichlorobenzene with an alkoxide.
  • a nitrile compound such as hydrogen cyanide, acetonitrile, propionitrile, n-butyronitrile, benzonitrile or the like
  • polyamide The polyamide used in the present disclosure is not particularly limited and includes aliphatic polyamides and aromatic polyamides.
  • Aliphatic polyamides that can be used in the present disclosure include, for example, nylon 6, nylon 11, nylon 12, nylon 46, nylon 66, nylon 666, nylon 610, nylon 612, and the like.
  • aliphatic polyamides can also be used in the present disclosure.
  • TW341 product name) Nylon 46
  • Daicel Eponik KK Vestamide (registered trademark) D16 (nylon 612), manufactured by Arkema Corporation
  • Rilsan (registered trademark) B BMN O TLD nylon 12
  • Rilsan (registered trademark) A BMN BK TLD nylon 11
  • Ube Industries, Ltd. UBE nylon (registered trademark) 2020B (nylon 66), UBE nylon (registered trademark) 5013 B (nylon 666), UBESTA (registered trademark) 3014 B (nylon 12), etc. It can be mentioned.
  • aliphatic polyamides may be used alone or in combination of two or more.
  • Aliphatic diamines, alicyclic diamines, aromatic diamines and the like can be used as diamines, and diamines represented by the following general formula (A) can be used as aliphatic diamines or alicyclic diamines.
  • the diamine represented by the general formula (A) it is particularly preferable to use hexamethylenediamine and 2-methylpentamethylenediamine in that they can exhibit excellent properties even at high temperatures.
  • aromatic diamine xylylene diamine, metaxylylene diamine and the like can be used.
  • dicarboxylic acid aliphatic dicarboxylic acid, alicyclic dicarboxylic acid, aromatic dicarboxylic acid and the like
  • aliphatic dicarboxylic acid or alicyclic dicarboxylic acid it is represented by the following general formula (B)
  • Dicarboxylic acid can be used.
  • Adipic acid etc. can be used as aliphatic dicarboxylic acid.
  • aromatic dicarboxylic acid terephthalic acid, methylterephthalic acid, naphthalene dicarboxylic acid, isophthalic acid and the like can be used.
  • aromatic dicarboxylic acid it is particularly preferable to use terephthalic acid and isophthalic acid in that they can exhibit excellent properties even at high temperatures.
  • these diamines and dicarboxylic acids may be used alone or in combination of two or more kinds. Furthermore, if necessary, components other than diamine and dicarboxylic acid may be contained.
  • a condensation polymer of metaxylylenediamine and adipic acid or adipic acid halide is preferable.
  • aromatic polyamides can also be used.
  • MX nylon S6001 nylon MXD6
  • Kuraray Co., Ltd. Genesta (registered trademark) N1000A (nylon 9T), etc.
  • N1000A nylon 9T
  • aromatic polyamides may be used singly or in combination of two or more.
  • the melting point or glass transition temperature of the polyamide is preferably 200 ° C. or higher.
  • the melting point or glass transition temperature of the polyamide is preferably 300 ° C. or less.
  • the molecular weight of the polyamide used in the present disclosure is not particularly limited, but the weight average molecular weight is preferably in the range of 5 ⁇ 10 3 to 10000 ⁇ 10 3 , more preferably 10 ⁇ 10 3 to 5000 ⁇ 10 3. Preferably, it is in the range of 30 ⁇ 10 3 to 1000 ⁇ 10 3 .
  • the measurement of a weight average molecular weight can be performed using gel permeation chromatography (GPC).
  • chloroform / hexafluoroisopropanol 9/1 (volume ratio) is used as a solvent
  • polystyrene gel is used, and weight average molecular weight using a conversion molecular weight calibration curve previously obtained from a constitution curve of standard monodispersed polystyrene You can ask for
  • nylon resins which are aliphatic polyamides, generally have low hydrolysis resistance, but in the present disclosure, hydrolysis resistance is obtained by adding an iminoether compound represented by the general formula (1) or a multimer thereof. This is particularly effective when using a nylon-based resin because it can significantly improve the properties.
  • the chain iminoether group-containing compound used in the present disclosure is an iminoether compound represented by the following general formula (1) or a multimer of the iminoether compound represented by the general formula (1).
  • R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent
  • R 3 represents R 11 represents an alkyl group represented by Formula (2) or an aryl group represented by the following General Formula (3)
  • R 11 , R 12 and R 13 each independently represent a hydrogen atom or an alkyl which may have a substituent Represents an aryl group which may have a group or a substituent.
  • R 31 , R 32 and R 33 each independently represent a hydrogen atom or a substituent. R 31 , R 32 and R 33 may be linked to each other to form a ring.
  • R 41 represents a substituent, and n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring.
  • * represents a position to be bonded to a nitrogen atom.
  • the alkyl group represented by R 2 is preferably an alkyl group having 1 to 20 carbon atoms, and more preferably an alkyl group having 1 to 12 carbon atoms.
  • the number of carbon atoms of the alkyl group represented by R 2 indicate the number of carbon that does not contain a substituent group.
  • the alkyl group represented by R 2 may be linear or branched.
  • the alkyl group represented by R 2 may be a cycloalkyl group.
  • the alkyl group represented by R 2 is methyl, ethyl, n-propyl, iso-propyl, n-butyl, tert-butyl, sec-butyl, iso-butyl, n-pentyl, A sec-pentyl group, an iso-pentyl group, an n-hexyl group, a sec-hexyl group, an iso-hexyl group, a cyclohexyl group and the like can be mentioned.
  • the alkyl group represented by R 2 is more preferably a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, an iso-butyl group or a cyclohexyl group.
  • the alkyl group represented by R 2 may further have a substituent. Examples of the substituent include the above-mentioned alkyl group, aryl group, alkoxy group, halogen atom, nitro group, amido group, hydroxyl group, ester group, ether group, aldehyde group and the like.
  • the aryl group represented by R 2 is preferably an aryl group having 6 to 20 carbon atoms, and more preferably an aryl group having 6 to 12 carbon atoms. Number of carbon atoms of the aryl group represented by R 2, indicate the number of carbon that does not contain a substituent group.
  • the aryl group represented by R 2 may further have a substituent.
  • the above-mentioned substituents that is, an alkyl group, an aryl group, an alkoxy group, a halogen atom, a nitro group, an amido group, a hydroxyl group, an ester group, an ether group, an aldehyde group and the like can be exemplified.
  • the substituent is not particularly limited as long as it does not interfere with the reaction of the iminoether group with the carboxy group.
  • the alkoxy group represented by R 2 is preferably an alkoxy group having 1 to 20 carbon atoms, more preferably an alkoxy group having 1 to 12 carbon atoms, and an alkoxy group having 2 to 6 carbon atoms Is particularly preferred.
  • Number of carbon atoms of the alkoxy group represented by R 2 indicate the number of carbon that does not contain a substituent group.
  • the alkoxy group represented by R 2 may be linear, branched or cyclic. Preferred examples of the alkoxy group represented by R 2 may be a group at the end of the alkyl group represented by R 2 -O- is linked.
  • the alkoxy group represented by R 2 may further have a substituent.
  • the above-mentioned substituents that is, an alkyl group, an aryl group, an alkoxy group, a halogen atom, a nitro group, an amido group, a hydroxyl group, an ester group, an ether group, an aldehyde group and the like can be exemplified.
  • the substituent is not particularly limited as long as it does not interfere with the reaction of the iminoether group with the carboxy group.
  • R 3 represents an alkyl group represented by the above general formula (2) or an aryl group represented by the above general formula (3).
  • R 31 , R 32 and R 33 each independently represent a hydrogen atom or a substituent.
  • the substituents represented by R 31 , R 32 and R 33 may be linked to each other to form a ring.
  • the substituent include the above-mentioned alkyl group, aryl group, alkoxy group, halogen atom, nitro group, amido group, hydroxyl group, ester group, ether group, aldehyde group and the like.
  • R 31 , R 32 and R 33 may all be hydrogen atoms or may be the same substituent, or may be different substituents.
  • the alkyl group represented by the general formula (2) may be linear or branched.
  • the alkyl group represented by the general formula (2) may be a cycloalkyl group.
  • R 41 represents a substituent, and n represents an integer of 0 to 5. When n is 2 or more, a plurality of R 41 may be the same as or different from each other, and may be linked to each other to form a ring.
  • substituents that is, an alkyl group, an aryl group, an alkoxy group, a halogen atom, a nitro group, an amido group, a hydroxyl group, an ester group, an ether group, an aldehyde group and the like can be exemplified.
  • n is more preferably 0 to 3, and still more preferably 0 to 2.
  • R 11 , R 12 and R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent.
  • the alkyl group and the aryl group the alkyl group and the aryl group that can be taken by R 2 can be similarly exemplified.
  • R 11 , R 12 and R 13 may be bonded to each other to form a ring.
  • the polyamide resin composition of the present disclosure may contain, as a chain iminoether group-containing compound, a multimer of the iminoether compound represented by General Formula (1).
  • a chain iminoether group-containing compound containing as a repeating unit a structure excluding at least one of R 2 , R 3 or R 11 to R 13 in the general formula (1) is preferable.
  • the iminoether compound represented by the general formula (1) is preferably represented by the following general formula (4) from the viewpoint of easiness of synthesis.
  • R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent
  • R 11 and R 12 And R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent
  • R 41 represents a substituent
  • n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring.
  • R 2 , R 11 , R 12 and R 13 have the same meaning as each other in the general formula (1), and preferred ranges are also the same.
  • R 41 has the same meaning as R 41 in Formula (3), and the preferred range is also the same.
  • n is preferably 0 to 3, and more preferably 0 to 2.
  • the iminoether compound represented by the general formula (1) is a chain iminoether group-containing compound in which R 3 in the general formula (1) is represented by the general formula (3) from the ease of synthesis, that is, It is preferable to be represented by Formula (5).
  • R 11 , R 12 and R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent.
  • R 21 represents a substituent
  • m represents an integer of 0 to 5, when R 21 there are a plurality, even more R 21 is the same as each other or different, a ring together You may form.
  • R 41 represents a substituent
  • n represents an integer of 0 to 5, when R 41 there are a plurality, even more R 41 is the same as each other or different, a ring together You may form.
  • R 11, R 12 and R 13 are the same as those in formula (1), and preferred ranges are also the same.
  • R 41 has the same meaning as R 41 in formula (3), and the preferred range is also the same.
  • the R 21 can also be exemplified the same substituents as R 41 in the general formula (3).
  • n is preferably 0 to 3, and more preferably 0 to 2.
  • m is preferably 0 to 3, and more preferably 0 to 2.
  • a chain iminoether group-containing compound represented by the following general formula (6) is preferable in terms of easiness of synthesis and suppression of generation of volatilization gas.
  • R 11 , R 12 and R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent.
  • R 41 represents a substituent
  • n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring.
  • p represents an integer of 2 to 4
  • L 1 has an alkylene moiety which may have a substituent, an arylene moiety which may have a substituent, or a substituent at the end of bonding to a carbon atom It also represents a p-valent group which is a good alkoxylene moiety.
  • the alkylene moiety which may have a substituent may be a cycloalkylene moiety which may have a substituent.
  • R 11, R 12 and R 13 are the same as those in formula (1), and preferred ranges are also the same.
  • R 41 has the same meaning as R 41 in Formula (3), and the preferred range is also the same.
  • n is preferably 0 to 3, and more preferably 0 to 2.
  • L 1 is an alkoxy moiety which may have a substituent, an alkylene moiety which may have a substituent, an arylene moiety which may have a substituent, or a substituent, at the end of the bond to a carbon atom It represents a p-valent group which is a ren moiety.
  • p is an integer of 2 to 4, and p is preferably 2 or 3.
  • the alkylene moiety which may have a substituent may be a cycloalkylene moiety which may have a substituent.
  • the divalent group include, for example, an alkylene group which may have a substituent, an arylene group which may have a substituent, and an alkoxylene group which may have a substituent.
  • the terminal of the bond with the carbon atom is an alkylene moiety which may have a substituent, an arylene moiety which may have a substituent, or an alkoxylene moiety which may have a substituent, as a partial structure, -SO 2- , -CO-, substituted or unsubstituted alkylene moiety, substituted or unsubstituted alkenylene moiety, alkynylene moiety, substituted or unsubstituted phenylene moiety, substituted or unsubstituted biphenylene moiety, substituted or unsubstituted naphthylene And groups containing at least one selected from -O-, -S- and -SO-.
  • the alkylene moiety which may have a substituent may be a cycloalkylene moiety which may have a substituent.
  • a trivalent group the group which remove
  • a tetravalent group the group which remove
  • a compound having two or more iminoether moieties in one molecule can be obtained, and a more excellent end capping effect can be exhibited. it can. Furthermore, the iminoether value (total molecular weight / number of iminoether groups) can be lowered by using a compound having two or more iminoether moieties in one molecule, and an iminoether compound can be efficiently reacted with a carboxy group. it can.
  • a chain iminoether group-containing compound represented by the following general formula (7) is also preferable in terms of easiness of synthesis and suppression of generation of volatilization gas.
  • R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent
  • R 11 and R 12 And R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent
  • p represents an integer of 2 to 4
  • p represents a p-valent group in which L 2 is a arylene moiety which may have a substituent or a cycloalkylene moiety which may have a substituent.
  • R 2 , R 11 , R 12 and R 13 have the same meanings as each other in the general formula (1), and the preferred ranges are also the same.
  • L 2 represents a p-valent group which is an arylene moiety which may have a substituent or a cycloalkylene moiety which may have a substituent, at the end of the bond to the nitrogen atom.
  • L 2 is preferably a p-valent group in which the end of the bond to the nitrogen atom is an arylene moiety which may have a substituent.
  • p is an integer of 2 to 4, and p is preferably 2 or 3.
  • Specific examples of L 2 include an arylene group which may have a substituent, and a cycloalkylene group which may have a substituent.
  • the end of the bond to the nitrogen atom is an arylene moiety which may have a substituent or a cycloalkylene moiety which may have a substituent, and as a partial structure, —SO 2 —, —CO—, substituted or unsubstituted ,
  • a chain iminoether group-containing compound represented by the following general formula (8) is also preferable in terms of easiness of synthesis and suppression of generation of volatilization gas.
  • R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent
  • R 41 represents a substituent
  • n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring.
  • p represents an integer of 2 to 4
  • L 3 represents a p-valent group in which the bonding end with the oxygen atom is an alkylene part. In the alkylene moiety of L 3 , part or all of the hydrogen atoms may be substituted with an alkyl group which may have a substituent or an aryl group which may have a substituent.
  • R 2 is synonymous with R 2 in General Formula (1), and its preferable range is also the same.
  • R 41 has the same meaning as R 41 in Formula (3), and the preferred range is also the same.
  • n is preferably 0 to 3, and more preferably 0 to 2.
  • R 2 may link to R 41 to form a ring.
  • L 3 represents a p-valent group in which the end of the bond to the oxygen atom is an alkylene part.
  • part or all of the hydrogen atoms may be substituted with an alkyl group which may have a substituent or an aryl group which may have a substituent.
  • p is an integer of 2 to 4, and p is preferably 2 or 3.
  • Specific examples of L 3, include an alkylene group.
  • the end of the bond to the oxygen atom is an alkylene moiety, and as a partial structure, -SO 2- , -CO-, a substituted or unsubstituted alkylene group, a substituted or unsubstituted alkenylene group, an alkynylene group, a substituted or unsubstituted Examples thereof include a group containing at least one selected from a phenylene group, a substituted or unsubstituted biphenylene group, a substituted or unsubstituted naphthylene group, -O-, -S- and -SO-.
  • ethylene group n-butylene group, substituted or unsubstituted -CH 2 -C (CH 3 ) 2 -CH 2- , substituted or unsubstituted -CH 2 -C 6 H 4 -CH 2- , Etc.
  • the molecular weight (total molecular weight / number of iminoether groups) per iminoether group of the chain iminoether group-containing compound used in the present disclosure is preferably 1000 or less, more preferably 750 or less, and 500 or less Is more preferred.
  • the molecular weight per iminoether group is 300 or more from the viewpoint of suppressing the volatilization of the reaction product or the unreacted chain iminoether group-containing compound when producing the molded product. Is preferred.
  • the polyamide resin composition of the present disclosure includes a polyamide and at least one linear iminoether group-containing compound selected from an iminoether compound represented by the general formula (1) and an oligomer thereof, at the time of molding. It is possible to effectively suppress the generation of volatile gas and thickening, and to produce a polyamide resin molded product having hydrolysis resistance. Moreover, the color taste of a molded object can also be controlled by adjusting the addition amount of a chain-like iminoether group containing compound.
  • the polyamide resin composition of the present disclosure preferably contains 0.05 to 5.0 parts by mass of the chain iminoether group-containing compound with respect to 100 parts by mass of the polyamide.
  • the addition amount of the chain iminoether group-containing compound By setting the addition amount of the chain iminoether group-containing compound to 0.05 parts by mass or more with respect to 100 parts by mass of polyamide, generation of volatilized gas and thickening are effectively suppressed, and a polyamide resin molded body Resistance to hydrolysis can be further improved.
  • yellowishness can be suppressed by the said addition amount of the iminoether compound represented by General formula (1) being 5.0 mass parts or less.
  • a chain imino relative to 100 parts by mass of the polyamide More preferably, the ether group-containing compound is contained in an amount of 0.1 to 2.0 parts by mass.
  • the polyamide resin composition of the present disclosure may use a single chain iminoether group-containing compound singly or in combination of two or more thereof, but may use a combination of a plurality of chain iminoether group-containing compounds. When it does, it is preferable that a total amount is the said range.
  • the polyamide resin composition of the present disclosure can be added to various additives such as a compatibilizer, a plasticizer, a weathering agent, an antioxidant, a heat stabilizer, a lubricant, and the like as long as the effects of the present invention are not significantly impaired.
  • the composition may contain an inhibitor, a brightener, a colorant, a conductive agent, an ultraviolet absorber, a flame retardant, a flame retardant aid, a pigment, a dye and the like.
  • the polyamide resin composition of the present disclosure does not refuse to contain an end capping agent other than the iminoether compound described above, as long as the effects of the present invention are not significantly impaired.
  • the polyamide resin composition of this indication can also use together the terminal blocker chosen from a carbodiimide compound, an epoxy compound, and an oxazoline compound other than the iminoether compound mentioned above, for example.
  • ⁇ Polyamide resin molding> The molding method at the time of manufacturing a polyamide resin molded object using the polyamide resin composition of this indication is not specifically limited, What is necessary is just to apply the well-known molding method according to a use, such as injection molding and extrusion molding.
  • a polyamide resin molded body having a desired shape can be obtained by heating and melting and kneading to a temperature equal to or higher than the melting point of the polyamide contained in the polyamide resin composition of the present disclosure and injection molding.
  • the polyamide resin composition of the present disclosure is a polyamide resin having hydrolysis resistance and suppressing volatilization and thickening of by-products derived from the chain iminoether group-containing compound even when heated at the time of kneading or molding. Moldings can be produced.
  • the application of the polyamide resin composition of the present disclosure is not particularly limited.
  • machine parts, parts for telecommunications equipment, transport machine parts, office machinery parts, gasoline tanks, various electric and electronic parts, miscellaneous goods, building materials, films, fish nets and It can be suitably used as a fishing tool such as Tegs, a gear, a fastener, an intake pipe, a radiator tank, a resin molded product such as a cooling fan.
  • Example 1 One part by mass of iminoether (1) is added to 100 parts by mass of nylon 6 (manufactured by Unitika, A1030 BRL, melting point 225 ° C.), dry mixed together, and melt mixed at 250 ° C. with a twin-screw kneader It extruded and produced the pellet. The obtained pellet was dried and injection-molded at 250 ° C. to prepare a plate-like test piece (100 mm ⁇ 100 mm, thickness: 0.3 mm).
  • nylon 6 manufactured by Unitika, A1030 BRL, melting point 225 ° C.
  • the amount of the volatile component was measured by gas chromatography (trade name: P & T-GC / MS, manufactured by JASCO Corporation) according to the following conditions with respect to the obtained test piece, and evaluated based on the following criteria.
  • the volatile component contains a compound derived from iminoether, and specifically includes an iminoether compound and an amide compound.
  • the amount of volatile components generated during molding is reflected in the content of volatile components derived from iminoether contained in the test piece. That is, when the detected amount of the volatilization component is small, it means that the volatilization of the iminoether compound and the amide compound is small and the production environment of the molded product is improved.
  • Table 1 The obtained results are shown in Table 1 below.
  • test piece was heated for 10 minutes at a kneading temperature (250 ° C. in Example 1) in a closed container, and the generated gas was detected.
  • Examples 2 to 8, Comparative Example 5 Test pieces were prepared and evaluated in the same manner as in Example 1 except that the compounds described in Table 1 were added instead of the iminoether (1).
  • Example 9 The mixing temperature and the injection molding temperature were changed to 290 ° C. by changing nylon 6 (manufactured by Unitika, A1030 BRL, melting point 225 ° C.) to nylon 66 (manufactured by Ube Industries, UBE nylon (registered trademark) 2020 B, melting point 265 ° C.) Test pieces were produced in the same manner as in Example 1 except for the evaluation.
  • Example 10 Except that nylon 6 (Unitika manufactured by Unitika, A1030 BRL, melting point 225 ° C.) was changed to nylon 12 (manufactured by Ube Industries, Inc., UBESTA (registered trademark) 3014 B, melting point 175 ° C.) and kneading temperature and injection molding temperature were changed to 200 ° C. A test piece was produced and evaluated in the same manner as in Example 1.
  • Test pieces were prepared and evaluated in the same manner as in Example 1 except that the addition amount of the iminoether (1) was changed as described in Table 1, respectively.
  • Comparative Example 2 Test pieces were prepared and evaluated in the same manner as in Example 1 except that Stabaxol (registered trademark) P400 (manufactured by Line Chemie Co., Ltd.) was added instead of the iminoether (1).
  • Stabaxol registered trademark
  • P400 manufactured by Line Chemie Co., Ltd.
  • the reaction solution was cooled to room temperature, filtered, and the solvent was evaporated under reduced pressure. Then, 1.0 L of ethyl acetate was added, and after filtering, ethyl acetate was evaporated under reduced pressure.
  • the obtained oily compound was distilled and purified at 128 ° C. and 133.3 Pa (1 Torr) to obtain 118 g (75% yield) of TMBO. The obtained compound was identified by 1 H-NMR.
  • Comparative Example 4 Test pieces were prepared and evaluated in the same manner as in Example 1 except that Epocross (registered trademark) RPS (an oxazoline group-containing reactive polystyrene, manufactured by Nippon Shokubai Co., Ltd.) was added instead of the iminoether (1).
  • Epocross registered trademark
  • RPS an oxazoline group-containing reactive polystyrene, manufactured by Nippon Shokubai Co., Ltd.
  • the addition amount of a sealing agent is an addition amount with respect to 100 mass parts of resin.
  • the polyamide resin compositions of the respective examples to which the chain iminoether group-containing compound according to the present disclosure is added as a sealing agent can suppress the generation of gas at the time of molding, and the increase in resin pressure is suppressed. , was excellent in moldability. Moreover, the obtained polyamide resin molded product (test piece) was excellent in moist heat resistance, and the content of the volatilization component in the resin was small. In Comparative Example 5, since the reactivity of the cyclic iminoether (7) is low, the hydrolysis resistance of the molded product is inferior, and it is considered that the moldability is lowered by the partial reaction, high molecular weight formation and thickening. .

Abstract

Provided are a polyamide resin composition and a molded article thereof, the polyamide resin composition comprising polyamide and at least one linear imino ether group-containing compound selected from imino ether compounds represent by formula (1) and multimers thereof. R2 represents an alkyl group, an aryl group, or an alkoxy group, R3 represents an alkyl group or an aryl group represented by formula (2) or (3), and R11-R13 each independently represents a hydrogen atom, an alkyl group, or an aryl group. R31-R33 each independently represents a hydrogen atom or a substituent group, and can be connected to form a ring. R41 represents a substituent group, n represents an integer of 0-5, and when a plurality of R41 is present, the plurality of R41 can be the same or different. * represents a bonding position with a nitrogen atom.

Description

ポリアミド樹脂組成物及びポリアミド樹脂成形体Polyamide resin composition and polyamide resin molded article
 本開示は、ポリアミド樹脂組成物及びポリアミド樹脂成形体に関する。 The present disclosure relates to a polyamide resin composition and a polyamide resin molded article.
 機械部品、電子部品、建材、フィルム等、様々な分野において種々の樹脂成形体が使用されている。これらの樹脂成形体は用途に応じて樹脂及び添加剤が選択されるが、カルボン酸を用いて合成された樹脂は加水分解によって劣化することが知られている。
 例えば、ポリアミドはアルカリ性媒体中では安定であるが、中性又は、酸の存在下で加水分解し易い。
 また、例えば、飲料用ボトル及び太陽電池用保護シートとして使用されるポリエチレンテレフタレート(PET)等のポリエステルも加水分解によって劣化する。
Various resin moldings are used in various fields such as machine parts, electronic parts, construction materials, films and the like. Although resin and an additive are selected according to a use, these resin moldings are known that the resin synthesize | combined using carboxylic acid will deteriorate by hydrolysis.
For example, polyamides are stable in alkaline media but neutral or susceptible to hydrolysis in the presence of acids.
In addition, for example, polyesters such as polyethylene terephthalate (PET) used as bottles for beverages and protective sheets for solar cells are also degraded by hydrolysis.
 これらのカルボン酸を用いて合成された樹脂の加水分解を抑制するため、末端カルボキシ基を封止(失活)させる末端封止剤(以下「封止剤」と記す場合がある。)が使用される。
 例えば、特開平6-16933号公報では、酸性媒体中で耐加水分解性を有するポリアミドを提供するため、ポリアミドに対し、封止剤としてポリカルボジイミドを0.1~5質量%添加することが提案されている。
In order to inhibit the hydrolysis of the resin synthesized using these carboxylic acids, an end capping agent (hereinafter sometimes referred to as a "sealing agent") that seals (deactivates) the terminal carboxy group is used. Be done.
For example, in JP-A-6-16933, in order to provide a polyamide having hydrolysis resistance in an acidic medium, it is proposed to add 0.1 to 5% by mass of polycarbodiimide as a sealing agent to polyamide. It is done.
 また、例えば、特開2010-031174号公報では、ポリエチレンテレフタレート(PET)等のポリエステルに封止剤としてオキサゾリン等の環状イミノエーテル化合物を添加することで、耐加水分解性を向上させることが提案されている。 Also, for example, in JP-A-2010-031174, it is proposed to improve hydrolysis resistance by adding a cyclic iminoether compound such as oxazoline as a sealing agent to polyester such as polyethylene terephthalate (PET). ing.
 しかし、末端封止剤として特開平6-16933号公報に開示されているようなカルボジイミド化合物を含有するポリアミド樹脂組成物を用いて樹脂成形体を製造すると、成形時にイソシアネートガスが揮散する。
 また、特開2010-031174号公報に記載されているようなオキサゾリンに代表される環状イミノエーテル化合物を封止剤として用いて樹脂成形体を製造する場合、ポリオキサゾリンは反応性が低いことと成形時に樹脂が増粘することが問題となる。一方、低分子量のオキサゾリンはガス揮散と増粘が問題となる。
However, when a resin molded product is produced using a polyamide resin composition containing a carbodiimide compound as disclosed in JP-A-6-16933 as a terminal blocking agent, the isocyanate gas volatilizes during molding.
In addition, when producing a resin molded product using a cyclic iminoether compound represented by oxazoline as described in JP-A-2010-031174 as a sealing agent, polyoxazoline has low reactivity and molding Sometimes it is a problem that the resin thickens. On the other hand, low molecular weight oxazolines have problems with gas vaporization and thickening.
 本発明は、上記のような事情に鑑みなされたものであり、成形時における揮散ガスの発生及び増粘を抑制し、且つ、耐加水分解性を有する樹脂成形体を製造することができるポリアミド樹脂組成物を提供することを目的とする。
 また、本発明は、耐加水分解性を有し、且つ、揮散ガスの発生及び増粘を抑制して製造することができるポリアミド樹脂成形体を提供することを目的とする。
The present invention has been made in view of the above circumstances, and is a polyamide resin capable of suppressing generation of volatile gas and thickening during molding and producing a resin molded product having hydrolysis resistance. It is intended to provide a composition.
Another object of the present invention is to provide a polyamide resin molded product which is resistant to hydrolysis and which can be produced by suppressing the generation of volatile gas and thickening.
 上記目的を達成するため、以下の発明が提供される。 In order to achieve the above object, the following invention is provided.
<1> ポリアミドと、下記一般式(1)で表されるイミノエーテル化合物及び一般式(1)で表されるイミノエーテル化合物の多量体から選ばれる少なくとも1種の鎖状イミノエーテル基含有化合物と、を含むポリアミド樹脂組成物。 <1> A polyamide and at least one chained iminoether group-containing compound selected from an iminoether compound represented by the following general formula (1) and a multimer of the iminoether compound represented by the general formula (1) And a polyamide resin composition.
Figure JPOXMLDOC01-appb-C000007

 
Figure JPOXMLDOC01-appb-C000007

 
 一般式(1)中、Rは置換基を有してもよいアルキル基、置換基を有してもよいアリール基又は置換基を有してもよいアルコキシ基を表し、Rは下記一般式(2)で表されるアルキル基又は下記一般式(3)で表されるアリール基を表し、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。 In the general formula (1), R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent, and R 3 represents R 11 represents an alkyl group represented by Formula (2) or an aryl group represented by the following General Formula (3), and R 11 , R 12 and R 13 each independently represent a hydrogen atom or an alkyl which may have a substituent Represents an aryl group which may have a group or a substituent.
Figure JPOXMLDOC01-appb-C000008

 
Figure JPOXMLDOC01-appb-C000008

 
 一般式(2)中、R31、R32及びR33はそれぞれ独立に水素原子又は置換基を表す。R31、R32及びR33は互いに連結して環を形成してもよい。一般式(3)中、R41は置換基を表し、nは0~5の整数を表す。R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。一般式(2)及び(3)において*は、窒素原子と結合する位置を表す。 In formula (2), R 31 , R 32 and R 33 each independently represent a hydrogen atom or a substituent. R 31 , R 32 and R 33 may be linked to each other to form a ring. In Formula (3), R 41 represents a substituent, and n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring. In the general formulas (2) and (3), * represents a position to be bonded to a nitrogen atom.
<2> 一般式(1)におけるRが一般式(3)で表されるアリール基である<1>に記載のポリアミド樹脂組成物。 <2> is an aryl group R 3 is represented by the general formula (3) in the general formula (1) Polyamide resin composition according to <1>.
<3> 一般式(1)で表されるイミノエーテル化合物が、下記一般式(5)で表される鎖状イミノエーテル基含有化合物である<1>又は<2>に記載のポリアミド樹脂組成物。 The polyamide resin composition as described in <1> or <2> whose iminoether compound represented by <3> General formula (1) is a chain-like iminoether group containing compound represented by following General formula (5) .
Figure JPOXMLDOC01-appb-C000009

 
Figure JPOXMLDOC01-appb-C000009

 
 一般式(5)中、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。R21は置換基を表し、mは0~5の整数を表し、R21が複数存在する場合、複数のR21は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。R41は置換基を表し、nは0~5の整数を表し、R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。
<4> 一般式(1)で表されるイミノエーテル化合物の多量体が、下記一般式(6)で表される鎖状イミノエーテル基含有化合物である<1>~<3>のいずれか1つに記載のポリアミド樹脂組成物。
In formula (5), R 11 , R 12 and R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. R 21 represents a substituent, m represents an integer of 0 to 5, when R 21 there are a plurality, even more R 21 is the same as each other or different, a ring together You may form. R 41 represents a substituent, n represents an integer of 0 to 5, when R 41 there are a plurality, even more R 41 is the same as each other or different, a ring together You may form.
<4> Any one of <1> to <3>, wherein the multimer of the iminoether compound represented by the general formula (1) is a chain iminoether group-containing compound represented by the following general formula (6) The polyamide resin composition as described in 1).
Figure JPOXMLDOC01-appb-C000010

 
Figure JPOXMLDOC01-appb-C000010

 
 一般式(6)中、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。R41は置換基を表し、nは0~5の整数を表す。R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。pは2~4の整数を表し、Lは、炭素原子との結合末端が、置換基を有してもよいアルキレン部、置換基を有してもよいアリーレン部又は置換基を有してもよいアルコキシレン部であるp価の基を表す。
<5> 一般式(1)で表されるイミノエーテル化合物の多量体が、下記一般式(7)で表される鎖状イミノエーテル基含有化合物である<1>~<3>のいずれか1つに記載のポリアミド樹脂組成物。
In General Formula (6), R 11 , R 12 and R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent. R 41 represents a substituent, and n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring. p represents an integer of 2 to 4, and L 1 has an alkylene moiety which may have a substituent, an arylene moiety which may have a substituent, or a substituent at the end of bonding to a carbon atom It also represents a p-valent group which is a good alkoxylene moiety.
<5> Any one of <1> to <3>, wherein the multimer of the iminoether compound represented by the general formula (1) is a chain iminoether group-containing compound represented by the following general formula (7) The polyamide resin composition as described in 1).
Figure JPOXMLDOC01-appb-C000011

 
Figure JPOXMLDOC01-appb-C000011

 
 一般式(7)中、Rは置換基を有してもよいアルキル基、置換基を有してもよいアリール基又は置換基を有してもよいアルコキシ基を表し、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。pは2~4の整数を表し、Lは、窒素原子との結合末端が、置換基を有してもよいアリーレン部又は置換基を有してもよいシクロアルキレン部であるp価の基を表す。 In the general formula (7), R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent, and R 11 and R 12 And R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. p represents an integer of 2 to 4, and p represents a p-valent group in which L 2 is a arylene moiety which may have a substituent or a cycloalkylene moiety which may have a substituent. Represents
<6> 一般式(1)で表されるイミノエーテル化合物の多量体が、下記一般式(8)で表される鎖状イミノエーテル基含有化合物である<1>~<3>のいずれか1つに記載のポリアミド樹脂組成物。 <6> Any one of <1> to <3>, wherein the multimer of the iminoether compound represented by the general formula (1) is a chain iminoether group-containing compound represented by the following general formula (8) The polyamide resin composition as described in 1).
Figure JPOXMLDOC01-appb-C000012

 
Figure JPOXMLDOC01-appb-C000012

 
 一般式(8)中、Rは置換基を有してもよいアルキル基、置換基を有してもよいアリール基又は置換基を有してもよいアルコキシ基を表し、R41は置換基を表し、nは0~5の整数を表す。R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。pは2~4の整数を表し、Lは、酸素原子との結合末端が、アルキレン部であるp価の基を表す。Lのアルキレン部は、水素原子の一部又は全部が、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基で置換されていてもよい。 In general formula (8), R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent, and R 41 represents a substituent And n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring. p represents an integer of 2 to 4, and L 3 represents a p-valent group in which the bonding end with the oxygen atom is an alkylene part. In the alkylene moiety of L 3 , part or all of the hydrogen atoms may be substituted with an alkyl group which may have a substituent or an aryl group which may have a substituent.
<7> ポリアミド100質量部に対して、鎖状イミノエーテル基含有化合物を0.1~2.0質量部含む<1>~<6>のいずれか1つに記載のポリアミド樹脂組成物。
<8> <1>~<7>のいずれか1つに記載のポリアミド樹脂組成物を用いて成形されたポリアミド樹脂成形体。
The polyamide resin composition according to any one of <1> to <6>, which comprises 0.1 to 2.0 parts by mass of a chain iminoether group-containing compound with respect to 100 parts by mass of the <7> polyamide.
The polyamide resin molded object shape | molded using the polyamide resin composition as described in any one of <8><1>-<7>.
 本発明によれば、成形時における揮散ガスの発生及び増粘を抑制し、且つ、耐加水分解性を有するポリアミド樹脂成形体を製造することができる樹脂組成物が提供される。
 また、本発明によれば、耐加水分解性を有し、且つ、揮散ガスの発生及び増粘を抑制して製造することができるポリアミド樹脂成形体が提供される。
According to the present invention, there is provided a resin composition capable of suppressing generation of a volatilized gas at the time of molding and thickening and capable of producing a polyamide resin molded product having hydrolysis resistance.
Further, according to the present invention, there is provided a polyamide resin molded article which is resistant to hydrolysis and which can be produced while suppressing the generation of volatile gas and thickening.
 以下、本開示のポリアミド樹脂組成物及びポリアミド樹脂成形体について具体的に説明する。なお、以下の説明において数値範囲を表す「~」は下限値及び上限値として記載されている数値を含む範囲を意味する。 Hereinafter, the polyamide resin composition and the polyamide resin molded article of the present disclosure will be specifically described. In the following description, “to” representing a numerical range means a range including numerical values described as the lower limit value and the upper limit value.
<ポリアミド樹脂組成物>
 本開示のポリアミド樹脂組成物は、ポリアミドと、下記一般式(1)で表されるイミノエーテル化合物及び一般式(1)で表されるイミノエーテル化合物の多量体から選ばれる少なくとも1種の鎖状イミノエーテル基含有化合物(以下、単に「鎖状イミノエーテル基含有化合物」と称する場合がある。)と、を含む。
<Polyamide resin composition>
The polyamide resin composition of the present disclosure comprises at least one chain selected from a polyamide, an iminoether compound represented by the following general formula (1), and a multimer of an iminoether compound represented by the general formula (1) And an iminoether group-containing compound (hereinafter sometimes simply referred to as a "chain iminoether group-containing compound").
Figure JPOXMLDOC01-appb-C000013

 
Figure JPOXMLDOC01-appb-C000013

 
 一般式(1)中、Rは置換基を有してもよいアルキル基、置換基を有してもよいアリール基又は置換基を有してもよいアルコキシ基を表し、Rは下記一般式(2)で表されるアルキル基又は下記一般式(3)で表されるアリール基を表し、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。 In the general formula (1), R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent, and R 3 represents R 11 represents an alkyl group represented by Formula (2) or an aryl group represented by the following General Formula (3), and R 11 , R 12 and R 13 each independently represent a hydrogen atom or an alkyl which may have a substituent Represents an aryl group which may have a group or a substituent.
Figure JPOXMLDOC01-appb-C000014

 
Figure JPOXMLDOC01-appb-C000014

 
 一般式(2)中、R31、R32及びR33はそれぞれ独立に水素原子又は置換基を表す。R31、R32及びR33は互いに連結して環を形成してもよい。一般式(3)中、R41は置換基を表し、nは0~5の整数を表す。R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。一般式(2)及び(3)において*は、窒素原子と結合する位置を表す。 In formula (2), R 31 , R 32 and R 33 each independently represent a hydrogen atom or a substituent. R 31 , R 32 and R 33 may be linked to each other to form a ring. In Formula (3), R 41 represents a substituent, and n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring. In the general formulas (2) and (3), * represents a position to be bonded to a nitrogen atom.
 なお、本開示における「鎖状イミノエーテル基含有化合物」とは、イミノエーテル化合物に含まれるイミノエーテル基(-N=C-O-、「イミノエーテル部」という場合がある。)全体が環状構造に取り込まれず、少なくとも一部がイミノエーテル化合物の鎖状部分を構成しているイミノエーテル化合物を意味する。また、一般式(1)で表されるイミノエーテル化合物の多量体とは、一般式(1)において鎖状イミノエーテル基(-N=C-O-)に連結する少なくとも1つの部分構造が連結基となり、連結基以外の部分構造を2つ以上有する鎖状イミノエーテル基含有化合物を意味し、一般式(1)で表されるイミノエーテル化合物を経て合成される鎖状イミノエーテル基含有化合物のほか、一般式(1)で表されるイミノエーテル化合物を経ずに合成される鎖状イミノエーテル基含有化合物も含まれる。 In addition, as for the "chain iminoether group-containing compound" in the present disclosure, the entire iminoether group (sometimes referred to as -N = C-O- or "iminoether moiety") contained in the iminoether compound has a cyclic structure. Iminoether compounds which are not incorporated into at least a portion of which constitute at least a part of the chain portion of the iminoether compound. In addition, with the multimer of the iminoether compound represented by the general formula (1), at least one partial structure linked to the chain iminoether group (-N = C-O-) in the general formula (1) is linked A chain iminoether group-containing compound synthesized via an iminoether compound represented by the general formula (1), which means a chain iminoether group-containing compound which has two or more partial structures other than a linking group In addition, a chain iminoether group-containing compound synthesized without passing through the iminoether compound represented by the general formula (1) is also included.
 本開示のポリアミド樹脂組成物を用いれば、封止剤に由来する揮散ガスの発生及び増粘を抑制し、且つ、耐加水分解性を有するポリアミド樹脂成形体を製造することができる。その理由は、以下のように推察される。 By using the polyamide resin composition of the present disclosure, it is possible to suppress the generation and thickening of the volatilized gas derived from the sealing agent, and to produce a polyamide resin molded article having hydrolysis resistance. The reason is presumed as follows.
 鎖状イミノエーテル基、すなわち、イミノエーテル基(-N=C-O-)が鎖状(非環状)である一般式(1)で表されるイミノエーテル化合物又はその多量体である鎖状イミノエーテル基含有化合物とポリアミドとを含む樹脂組成物を加熱溶融して成形する場合、下記反応スキームのように鎖状のイミノエーテル部とポリアミドの末端カルボキシ基(波線はポリアミドの末端カルボキシ基以外の部分との連結部位を示す)とが反応し、イミノエーテル基に連結するアルキル部が切断してポリアミド末端のカルボキシ基にエステル化して付加することで、アミド化合物とカルボン酸エステルが生成する。 An iminoether compound represented by the general formula (1) or an iminoether compound represented by the general formula (1) in which an iminoether group (-N = C-O-) is in a chain form (non-cyclic) When a resin composition containing an ether group-containing compound and a polyamide is heat-melted and molded as in the following reaction scheme, a chain iminoether portion and a terminal carboxy group of polyamide (waveline is a portion other than the terminal carboxy group of polyamide) An amide compound and a carboxylic acid ester are formed by reaction with (1) and the alkyl moiety linked to the iminoether group is cleaved and esterified and added to the carboxy group at the end of the polyamide.
Figure JPOXMLDOC01-appb-C000015

 
Figure JPOXMLDOC01-appb-C000015

 
 従って、封止剤としてカルボジイミド化合物を使用して成形した場合に発生するイソシアネートガスが生じず、且つ、ポリアミドの分子量が増大することが抑制されるため、成形時における増粘が抑制される。また、一般式(1)で表されるイミノエーテル化合物が、ポリアミド末端のカルボキシ基又はモノマー等の低分子成分のカルボキシ基と上記スキームのように反応することによってカルボキシ基を失活させることにより耐加水分解性が向上する。 Accordingly, no isocyanate gas is generated which is generated when molding is performed using a carbodiimide compound as a sealing agent, and an increase in molecular weight of polyamide is suppressed, so that thickening at the time of molding is suppressed. In addition, the iminoether compound represented by the general formula (1) reacts with the carboxy group of the polyamide terminal or the carboxy group of a low molecular weight component such as a monomer as described in the above scheme to deactivate the carboxy group. Hydrolyzability is improved.
 一方、イミノエーテル基を含むイミノエーテル部が環状である場合は、イミノエーテル部にポリアミドが付加した状態となり、ポリマーの分子量が増大することにより増粘すると考えられる。特に、環状のイミノエーテル部が2官能以上(2量体以上)である場合は多数のポリアミドが付加して顕著に増粘すると考えられる。 On the other hand, when the iminoether moiety containing an iminoether group is cyclic, it is considered that the polyamide is added to the iminoether moiety, and the viscosity is increased by increasing the molecular weight of the polymer. In particular, in the case where the cyclic iminoether moiety is bifunctional or more (dimer or more), it is considered that a large number of polyamides are added to cause significant thickening.
(イミノエーテル化合物の合成方法)
 一般式(1)で表されるイミノエーテル化合物の合成方法としては、アミド化合物をイミドイルクロライド化し、アルコキシドと反応させる方法、及びアニリン化合物とオルトエステル化合物を反応させる方法が知られている。一般式(1)で表されるイミノエーテル化合物の合成方法としては、どちらの方法を用いてもよいが、アニリン化合物とオルトエステル化合物を反応させる方法を用いることが好ましい。アニリン化合物とオルトエステル化合物を反応させる方法で合成したイミノエーテル化合物を添加したポリアミド樹脂組成物は、耐加水分解性と色味がより良好となるため好ましい。これは、アニリン化合物とオルトエステル化合物を反応させる方法では、着色物、並びに、耐加水分解性を悪化させる試薬及び反応生成物がないことが寄与していると考えられる。また、アニリン化合物とオルトエステル化合物を反応させる方法は、イミノエーテル化合物を短工程で合成できる点からも好ましい。
(Synthesis method of imino ether compound)
As a method of synthesizing the iminoether compound represented by the general formula (1), a method in which an amide compound is imidoyl chloride, reaction with an alkoxide, and a method in which an aniline compound and an ortho ester compound are reacted. Although any method may be used as a synthesis method of the iminoether compound represented by General formula (1), it is preferable to use the method of making an aniline compound and an ortho ester compound react. A polyamide resin composition to which an iminoether compound synthesized by a method of reacting an aniline compound and an ortho ester compound is added is preferable because hydrolysis resistance and color tone become better. It is considered that this is attributed to the absence of the coloring matter and the reagent and reaction product which deteriorate the hydrolysis resistance in the method of reacting the aniline compound with the ortho ester compound. Moreover, the method of reacting an aniline compound and an ortho ester compound is preferable also from the point which can synthesize | combine an imino ether compound by a short process.
 一般式(1)で表されるイミノエーテル化合物の合成に用いられるオルトエステル化合物は、下記一般式(9)で表される化合物であることが好ましい。 The ortho ester compound used for the synthesis of the iminoether compound represented by the general formula (1) is preferably a compound represented by the following general formula (9).
Figure JPOXMLDOC01-appb-C000016

 
Figure JPOXMLDOC01-appb-C000016

 
 一般式(9)において、Rは置換基を有してもよいアルキル基、置換基を有してもよいアリール基又は置換基を有してもよいアルコキシ基を表し、R51、R52及びR53はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。 In the general formula (9), R 4 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent, R 51 and R 52 And R 53 each independently represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent.
 一般式(1)で表されるイミノエーテル化合物の合成に用いられるオルトエステル化合物としては、例えば、オルト酢酸トリメチル、オルト酢酸トリエチル、オルト酢酸トリプロピル、オルト酢酸トリブチル、オルト酢酸トリベンジル、オルト蟻酸トリメチル、オルト蟻酸トリエチル、オルト蟻酸トリプロピル、オルト蟻酸トリブチル、オルト蟻酸トリベンジル、オルトプロピオン酸トリメチル、オルトプロピオン酸トリエチル、オルトプロピオン酸トリプロピル、オルトプロピオン酸トリブチル、オルトプロピオン酸トリベンジル、オルト安息香酸トリメチル、オルト安息香酸トリエチル、オルト安息香酸トリプロピル、オルト安息香酸トリブチル及びオルト安息香酸トリベンジルなどが挙げられる。 Examples of ortho ester compounds used for the synthesis of iminoether compounds represented by the general formula (1) include trimethyl orthoacetate, triethyl orthoacetate, tripropyl orthoacetate, tributyl orthoacetate, tribenzyl orthoacetate, trimethyl orthoformate, Triethyl orthoformate, tripropyl orthoformate, tributyl orthoformate, tribenzyl orthoformate, trimethyl orthopropionate, triethyl orthopropionate, tripropyl orthopropionate, tributyl orthopropionate, tributyl orthopropionate, trimethyl orthobenzoate, trimethyl orthobenzoate And triethyl orthobenzoate, tributyl orthobenzoate, and tribenzyl orthobenzoate.
 オルトエステル化合物は、市販品を用いてもよいが、合成してもよい。合成する場合は、シアン化水素、アセトニトリル、プロピオニトリル、n-ブチロニトリル、ベンゾニトリルなどニトリル化合物をイミダート化し、アルコールと反応させる方法、又は、トリクロロベンゼンとアルコキシドを反応させる方法によって合成することができる。 The ortho ester compound may be a commercially available product or may be synthesized. In the case of synthesis, it can be synthesized by imidating a nitrile compound such as hydrogen cyanide, acetonitrile, propionitrile, n-butyronitrile, benzonitrile or the like and reacting with an alcohol or a method of reacting trichlorobenzene with an alkoxide.
(ポリアミド)
 本開示で用いるポリアミドは特に限定されず、脂肪族ポリアミド及び芳香族ポリアミドが挙げられる。
(polyamide)
The polyamide used in the present disclosure is not particularly limited and includes aliphatic polyamides and aromatic polyamides.
 本開示で用い得る脂肪族ポリアミドとしては、例えば、ナイロン6、ナイロン11、ナイロン12、ナイロン46、ナイロン66、ナイロン666、ナイロン610、ナイロン612等が挙げられる。 Aliphatic polyamides that can be used in the present disclosure include, for example, nylon 6, nylon 11, nylon 12, nylon 46, nylon 66, nylon 666, nylon 610, nylon 612, and the like.
 市販されている脂肪族ポリアミドを本開示に用いることもできる。例えば、ユニチカ(株)製A1030BRL(ナイロン6)、東レ(株)製 アミラン(登録商標) CM1017(ナイロン6)、CM2001(ナイロン610)、CM3007(ナイロン66)、DMSジャパンエンプラ(株)製 TW341(ナイロン46)、ダイセル・エポニック(株)製、ベスタミド(登録商標) D16(ナイロン612)、アルケマ(株)製、リルサン(登録商標)B BMN O TLD(ナイロン12)、リルサン(登録商標)A BMN BK TLD(ナイロン11)、宇部興産(株)製、UBEナイロン(登録商標)2020B(ナイロン66)、UBEナイロン(登録商標) 5013B(ナイロン666)、UBESTA(登録商標)3014B(ナイロン12)などが挙げられる。 Commercially available aliphatic polyamides can also be used in the present disclosure. For example, Unitika Co., Ltd. product A1030 BRL (nylon 6), Toray Industries, Inc. amilan (registered trademark) CM1017 (nylon 6), CM 2001 (nylon 610), CM 3007 (nylon 66), DMS Japan ENPLA Co., Ltd. TW341 (product name) Nylon 46), manufactured by Daicel Eponik KK, Vestamide (registered trademark) D16 (nylon 612), manufactured by Arkema Corporation, Rilsan (registered trademark) B BMN O TLD (nylon 12), Rilsan (registered trademark) A BMN BK TLD (nylon 11), Ube Industries, Ltd., UBE nylon (registered trademark) 2020B (nylon 66), UBE nylon (registered trademark) 5013 B (nylon 666), UBESTA (registered trademark) 3014 B (nylon 12), etc. It can be mentioned.
 これらの脂肪族ポリアミドは、1種単独又は2種以上組み合わせて使用してもよい。 These aliphatic polyamides may be used alone or in combination of two or more.
 本開示で用い得る芳香族ポリアミドとしては、例えば、ジアミンとジカルボン酸との脱水縮合により重合され、且つジアミン又はジカルボン酸の何れかに芳香族系の化合物が用いられた芳香族ポリアミドを用いることができる。
 ジアミンとしては、脂肪族ジアミン、脂環族ジアミン、芳香族ジアミンなどを用いることができ、脂肪族ジアミンあるいは脂環族ジアミンとしては、下記一般式(A)で表されるジアミンを使用できる。なお、下記式中のRは、C2n(n=6~12)で表される脂肪族又は脂環族のアルキレン基を表している。
N-R-NH・・・(A)
 一般式(A)で表されるジアミンとしては、高温においても優れた特性を発揮させ得る点においてヘキサメチレンジアミン及び2-メチルペンタメチレンジアミンを使用することが特に好ましい。
As the aromatic polyamide which can be used in the present disclosure, for example, an aromatic polyamide which is polymerized by dehydration condensation of a diamine and a dicarboxylic acid and in which an aromatic compound is used as either a diamine or a dicarboxylic acid it can.
Aliphatic diamines, alicyclic diamines, aromatic diamines and the like can be used as diamines, and diamines represented by the following general formula (A) can be used as aliphatic diamines or alicyclic diamines. R 1 in the following formula represents an aliphatic or alicyclic alkylene group represented by C n H 2n (n = 6 to 12).
H 2 N-R 1 -NH 2 (A)
As the diamine represented by the general formula (A), it is particularly preferable to use hexamethylenediamine and 2-methylpentamethylenediamine in that they can exhibit excellent properties even at high temperatures.
 芳香族ジアミンとしては、キシリレンジアミン、メタキシリレンジアミンなどを用いることができる。 As the aromatic diamine, xylylene diamine, metaxylylene diamine and the like can be used.
 ジカルボン酸としては、脂肪族ジカルボン酸、脂環族ジカルボン酸、芳香族ジカルボン酸などを用いることができ、脂肪族ジカルボン酸あるいは脂環族ジカルボン酸としては、下記一般式(B)で表されるジカルボン酸を使用できる。なお、下記式中のRは、C2n(n=4~25)で表される脂肪族又は脂環族のアルキレン基を表している。
HOOC-R-COOH・・・(B)
As the dicarboxylic acid, aliphatic dicarboxylic acid, alicyclic dicarboxylic acid, aromatic dicarboxylic acid and the like can be used, and as aliphatic dicarboxylic acid or alicyclic dicarboxylic acid, it is represented by the following general formula (B) Dicarboxylic acid can be used. R 2 in the following formula represents an aliphatic or alicyclic alkylene group represented by C n H 2n (n = 4 to 25).
HOOC-R 2 -COOH (B)
 脂肪族ジカルボン酸としてはアジピン酸などを用いることができる。
 芳香族ジカルボン酸としては、テレフタル酸、メチルテレフタル酸、ナフタレンジカルボン酸、イソフタル酸などを用いることができる。
 芳香族ジカルボン酸としては、高温においても優れた特性を発揮させ得る点においてテレフタル酸とイソフタル酸を使用することが特に好ましい。
Adipic acid etc. can be used as aliphatic dicarboxylic acid.
As the aromatic dicarboxylic acid, terephthalic acid, methylterephthalic acid, naphthalene dicarboxylic acid, isophthalic acid and the like can be used.
As the aromatic dicarboxylic acid, it is particularly preferable to use terephthalic acid and isophthalic acid in that they can exhibit excellent properties even at high temperatures.
 芳香族ポリアミドの合成には、これらの、ジアミンとジカルボン酸とを、それぞれ単独の種類で用いられていてもよく、それぞれ、複数の種類を組み合わせて用いられていてもよい。さらに、要すれば、ジアミンとジカルボン酸以外の成分が含まれていてもよい。 In the synthesis of the aromatic polyamide, these diamines and dicarboxylic acids may be used alone or in combination of two or more kinds. Furthermore, if necessary, components other than diamine and dicarboxylic acid may be contained.
 本開示において用いられる芳香族ポリアミドとしては、メタキシリレンジアミンとアジピン酸又はアジピン酸ハライドとの縮合重合体が好ましい。 As the aromatic polyamide used in the present disclosure, a condensation polymer of metaxylylenediamine and adipic acid or adipic acid halide is preferable.
 市販されている芳香族ポリアミドを用いることもできる。例えば、三菱ガス化学(株)製 MXナイロン S6001(ナイロンMXD6)、クラレ(株)製、ジェネスタ(登録商標) N1000A(ナイロン9T)などが挙げられる。 Commercially available aromatic polyamides can also be used. For example, MX nylon S6001 (nylon MXD6) manufactured by Mitsubishi Gas Chemical Co., Ltd., Kuraray Co., Ltd., Genesta (registered trademark) N1000A (nylon 9T), etc. may be mentioned.
 これらの芳香族ポリアミドは、1種単独又は2種以上組み合わせて使用してもよい。 These aromatic polyamides may be used singly or in combination of two or more.
 なお、樹脂組成物の成形温度が高いほどイミノエーテル化合物の反応性が高くなるため、融点又はガラス転移温度が高いポリアミドを用いることが好ましい。具体的には、ポリアミドの融点又はガラス転移温度は200℃以上であることが好ましい。一方、成形温度が高過ぎると、未反応のイミノエーテル化合物又は生成したカルボン酸エステルが揮散し易くなるため、ポリアミドの融点又はガラス転移温度は300℃以下であることが好ましい。 In addition, since the reactivity of an iminoether compound becomes high, so that the molding temperature of a resin composition is high, it is preferable to use polyamide with high melting | fusing point or glass transition temperature. Specifically, the melting point or glass transition temperature of the polyamide is preferably 200 ° C. or higher. On the other hand, if the molding temperature is too high, the unreacted iminoether compound or the generated carboxylic acid ester is easily volatilized, and therefore the melting point or glass transition temperature of the polyamide is preferably 300 ° C. or less.
 本開示で用いるポリアミドの分子量は特に限定されないが、重量平均分子量として、5×10~10000×10の範囲が好ましく、より好ましくは10×10~5000×10の範囲であり、さらに好ましくは30×10~1000×10の範囲である。なお、重量平均分子量の測定はゲル・パーミエーション・クロマトグラフィー(GPC)を用いて行うことができる。具体的には、クロロホルム/ヘキサフルオロイソプロパノール=9/1(容量比)を溶媒とし、ポリスチレンゲルを使用し、標準単分散ポリスチレンの構成曲線から予め求められた換算分子量較正曲線を用いて重量平均分子量を求めることができる。 The molecular weight of the polyamide used in the present disclosure is not particularly limited, but the weight average molecular weight is preferably in the range of 5 × 10 3 to 10000 × 10 3 , more preferably 10 × 10 3 to 5000 × 10 3. Preferably, it is in the range of 30 × 10 3 to 1000 × 10 3 . In addition, the measurement of a weight average molecular weight can be performed using gel permeation chromatography (GPC). Specifically, chloroform / hexafluoroisopropanol = 9/1 (volume ratio) is used as a solvent, polystyrene gel is used, and weight average molecular weight using a conversion molecular weight calibration curve previously obtained from a constitution curve of standard monodispersed polystyrene You can ask for
 なお、特に脂肪族ポリアミドであるナイロン系樹脂は一般的に耐加水分解性が弱いが、本開示では一般式(1)で表されるイミノエーテル化合物又はその多量体を添加することで耐加水分解性を顕著に向上させることができるため、ナイロン系樹脂を用いる場合に特に効果的である。 In particular, nylon resins, which are aliphatic polyamides, generally have low hydrolysis resistance, but in the present disclosure, hydrolysis resistance is obtained by adding an iminoether compound represented by the general formula (1) or a multimer thereof. This is particularly effective when using a nylon-based resin because it can significantly improve the properties.
(鎖状イミノエーテル基含有化合物)
 本開示で用いる鎖状イミノエーテル基含有化合物は、下記一般式(1)で表されるイミノエーテル化合物又は一般式(1)で表されるイミノエーテル化合物の多量体である。
(Chain-like iminoether group-containing compound)
The chain iminoether group-containing compound used in the present disclosure is an iminoether compound represented by the following general formula (1) or a multimer of the iminoether compound represented by the general formula (1).
Figure JPOXMLDOC01-appb-C000017

 
Figure JPOXMLDOC01-appb-C000017

 
 一般式(1)中、Rは置換基を有してもよいアルキル基、置換基を有してもよいアリール基又は置換基を有してもよいアルコキシ基を表し、Rは下記一般式(2)で表されるアルキル基又は下記一般式(3)で表されるアリール基を表し、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。 In the general formula (1), R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent, and R 3 represents R 11 represents an alkyl group represented by Formula (2) or an aryl group represented by the following General Formula (3), and R 11 , R 12 and R 13 each independently represent a hydrogen atom or an alkyl which may have a substituent Represents an aryl group which may have a group or a substituent.
Figure JPOXMLDOC01-appb-C000018

 
Figure JPOXMLDOC01-appb-C000018

 
 一般式(2)中、R31、R32及びR33はそれぞれ独立に水素原子又は置換基を表す。R31、R32及びR33は互いに連結して環を形成してもよい。一般式(3)中、R41は置換基を表し、nは0~5の整数を表す。R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。一般式(2)及び(3)において*は、窒素原子と結合する位置を表す。 In formula (2), R 31 , R 32 and R 33 each independently represent a hydrogen atom or a substituent. R 31 , R 32 and R 33 may be linked to each other to form a ring. In Formula (3), R 41 represents a substituent, and n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring. In the general formulas (2) and (3), * represents a position to be bonded to a nitrogen atom.
 一般式(1)において、Rで表されるアルキル基は、炭素数1~20のアルキル基であることが好ましく、炭素数1~12のアルキル基であることがより好ましい。Rが表すアルキル基の炭素数は、置換基を含まない炭素数を示す。Rが表すアルキル基は直鎖であっても分枝鎖であってもよい。Rで表されるアルキル基は、シクロアルキル基であってもよい。Rが表すアルキル基としては、メチル基、エチル基、n-プロピル基、iso-プロピル基、n-ブチル基、tert-ブチル基、sec-ブチル基、iso-ブチル基、n-ペンチル基、sec-ペンチル基、iso-ペンチル基、n-ヘキシル基、sec-ヘキシル基、iso-ヘキシル基、シクロヘキシル基、などを挙げることができる。Rが表すアルキル基は、中でもメチル基、エチル基、n-プロピル基、iso-プロピル基、iso-ブチル基、又はシクロヘキシル基がより好ましい。
 Rが表すアルキル基はさらに置換基を有していてもよい。置換基としては、上記のアルキル基、アリール基、アルコキシ基、ハロゲン原子、ニトロ基、アミド基、ヒドロキシル基、エステル基、エーテル基、アルデヒド基などが挙げられる。
In the general formula (1), the alkyl group represented by R 2 is preferably an alkyl group having 1 to 20 carbon atoms, and more preferably an alkyl group having 1 to 12 carbon atoms. The number of carbon atoms of the alkyl group represented by R 2, indicate the number of carbon that does not contain a substituent group. The alkyl group represented by R 2 may be linear or branched. The alkyl group represented by R 2 may be a cycloalkyl group. The alkyl group represented by R 2 is methyl, ethyl, n-propyl, iso-propyl, n-butyl, tert-butyl, sec-butyl, iso-butyl, n-pentyl, A sec-pentyl group, an iso-pentyl group, an n-hexyl group, a sec-hexyl group, an iso-hexyl group, a cyclohexyl group and the like can be mentioned. The alkyl group represented by R 2 is more preferably a methyl group, an ethyl group, an n-propyl group, an iso-propyl group, an iso-butyl group or a cyclohexyl group.
The alkyl group represented by R 2 may further have a substituent. Examples of the substituent include the above-mentioned alkyl group, aryl group, alkoxy group, halogen atom, nitro group, amido group, hydroxyl group, ester group, ether group, aldehyde group and the like.
 Rで表されるアリール基は、炭素数6~20のアリール基であることが好ましく、炭素数6~12のアリール基であることがより好ましい。Rが表すアリール基の炭素数は、置換基を含まない炭素数を示す。Rが表すアリール基としては、フェニル基、ナフチル基などを挙げることができ、その中でもフェニル基が特に好ましい。
 Rが表すアリール基はさらに置換基を有していてもよい。置換基としては、上記の置換基、すなわち、アルキル基、アリール基、アルコキシ基、ハロゲン原子、ニトロ基、アミド基、ヒドロキシル基、エステル基、エーテル基、アルデヒド基などを同様に例示することができ、イミノエーテル基とカルボキシ基との反応を妨げない限り、置換基は特に制限されない。
The aryl group represented by R 2 is preferably an aryl group having 6 to 20 carbon atoms, and more preferably an aryl group having 6 to 12 carbon atoms. Number of carbon atoms of the aryl group represented by R 2, indicate the number of carbon that does not contain a substituent group. The aryl group represented by R 2, a phenyl group, a naphthyl group can be exemplified a phenyl group is particularly preferred.
The aryl group represented by R 2 may further have a substituent. As the substituent, the above-mentioned substituents, that is, an alkyl group, an aryl group, an alkoxy group, a halogen atom, a nitro group, an amido group, a hydroxyl group, an ester group, an ether group, an aldehyde group and the like can be exemplified. The substituent is not particularly limited as long as it does not interfere with the reaction of the iminoether group with the carboxy group.
 Rで表されるアルコキシ基は、炭素数1~20のアルコキシ基であることが好ましく、炭素数1~12のアルコキシ基であることがより好ましく、炭素数2~6のアルコキシ基であることが特に好ましい。Rが表すアルコキシ基の炭素数は、置換基を含まない炭素数を示す。Rが表すアルコキシ基は直鎖であっても分枝であっても環状であってもよい。Rが表すアルコキシ基の好ましい例としては、Rが表すアルキル基の末端に-O-が連結した基を挙げることができる。
 Rが表すアルコキシ基はさらに置換基を有していてもよい。置換基としては、上記の置換基、すなわち、アルキル基、アリール基、アルコキシ基、ハロゲン原子、ニトロ基、アミド基、ヒドロキシル基、エステル基、エーテル基、アルデヒド基などを同様に例示することができ、イミノエーテル基とカルボキシ基との反応を妨げない限り、置換基は特に制限されない。
The alkoxy group represented by R 2 is preferably an alkoxy group having 1 to 20 carbon atoms, more preferably an alkoxy group having 1 to 12 carbon atoms, and an alkoxy group having 2 to 6 carbon atoms Is particularly preferred. Number of carbon atoms of the alkoxy group represented by R 2, indicate the number of carbon that does not contain a substituent group. The alkoxy group represented by R 2 may be linear, branched or cyclic. Preferred examples of the alkoxy group represented by R 2 may be a group at the end of the alkyl group represented by R 2 -O- is linked.
The alkoxy group represented by R 2 may further have a substituent. As the substituent, the above-mentioned substituents, that is, an alkyl group, an aryl group, an alkoxy group, a halogen atom, a nitro group, an amido group, a hydroxyl group, an ester group, an ether group, an aldehyde group and the like can be exemplified. The substituent is not particularly limited as long as it does not interfere with the reaction of the iminoether group with the carboxy group.
 Rは上記一般式(2)で表されるアルキル基又は上記一般式(3)で表されるアリール基を表す。一般式(2)中、R31、R32及びR33はそれぞれ独立に水素原子又は置換基を表す。R31、R32及びR33が置換基である場合、R31、R32及びR33で表される置換基は互いに連結して環を形成してもよい。置換基としては、上記のアルキル基、アリール基、アルコキシ基、ハロゲン原子、ニトロ基、アミド基、ヒドロキシル基、エステル基、エーテル基、アルデヒド基などが挙げられる。R31、R32及びR33は全てが水素原子であるか又は同一の置換基であってもよく、互いに異なる置換基であってもよい。
 一般式(2)で表されるアルキル基は、直鎖であっても分枝であってもよい。一般式(2)で表されるアルキル基は、シクロアルキル基であってもよい。
 一般式(3)中、R41は置換基を表し、nは0~5の整数を表す。nが2以上の場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。置換基としては、上記の置換基、すなわち、アルキル基、アリール基、アルコキシ基、ハロゲン原子、ニトロ基、アミド基、ヒドロキシル基、エステル基、エーテル基、アルデヒド基などを同様に例示することができる。nは0~3であることがより好ましく、0~2であることがさらに好ましい。
R 3 represents an alkyl group represented by the above general formula (2) or an aryl group represented by the above general formula (3). In formula (2), R 31 , R 32 and R 33 each independently represent a hydrogen atom or a substituent. When R 31 , R 32 and R 33 are substituents, the substituents represented by R 31 , R 32 and R 33 may be linked to each other to form a ring. Examples of the substituent include the above-mentioned alkyl group, aryl group, alkoxy group, halogen atom, nitro group, amido group, hydroxyl group, ester group, ether group, aldehyde group and the like. R 31 , R 32 and R 33 may all be hydrogen atoms or may be the same substituent, or may be different substituents.
The alkyl group represented by the general formula (2) may be linear or branched. The alkyl group represented by the general formula (2) may be a cycloalkyl group.
In Formula (3), R 41 represents a substituent, and n represents an integer of 0 to 5. When n is 2 or more, a plurality of R 41 may be the same as or different from each other, and may be linked to each other to form a ring. As the substituent, the above-mentioned substituents, that is, an alkyl group, an aryl group, an alkoxy group, a halogen atom, a nitro group, an amido group, a hydroxyl group, an ester group, an ether group, an aldehyde group and the like can be exemplified. . n is more preferably 0 to 3, and still more preferably 0 to 2.
 R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。アルキル基及びアリール基としては、Rが取り得るアルキル基及びアリール基を同様に例示することができる。R11、R12及びR13は互いに結合して環を形成してもよい。 R 11 , R 12 and R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent. As the alkyl group and the aryl group, the alkyl group and the aryl group that can be taken by R 2 can be similarly exemplified. R 11 , R 12 and R 13 may be bonded to each other to form a ring.
 本開示のポリアミド樹脂組成物は、鎖状イミノエーテル基含有化合物として、一般式(1)で表されるイミノエーテル化合物の多量体を含んでもよい。例えば、一般式(1)におけるR、R又はR11~R13の少なくとも1つを除く構造を繰り返し単位として含む鎖状イミノエーテル基含有化合物が好ましい。 The polyamide resin composition of the present disclosure may contain, as a chain iminoether group-containing compound, a multimer of the iminoether compound represented by General Formula (1). For example, a chain iminoether group-containing compound containing as a repeating unit a structure excluding at least one of R 2 , R 3 or R 11 to R 13 in the general formula (1) is preferable.
 一般式(1)で表されるイミノエーテル化合物は、合成の容易性から、下記一般式(4)で表されることが好ましい。 The iminoether compound represented by the general formula (1) is preferably represented by the following general formula (4) from the viewpoint of easiness of synthesis.
Figure JPOXMLDOC01-appb-C000019

 
Figure JPOXMLDOC01-appb-C000019

 
 一般式(4)中、Rは置換基を有してもよいアルキル基、置換基を有してもよいアリール基又は置換基を有してもよいアルコキシ基を表し、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。R41は置換基を表し、nは0~5の整数を表す。R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。 In General Formula (4), R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent, and R 11 and R 12 And R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. R 41 represents a substituent, and n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring.
 一般式(4)中、R、R11、R12及びR13は、一般式(1)における各々と同義であり、好ましい範囲も同様である。一般式(4)中、R41は、一般式(3)におけるR41と同義であり、好ましい範囲も同様である。nは0~3であることが好ましく、0~2であることがより好ましい。 In the general formula (4), R 2 , R 11 , R 12 and R 13 have the same meaning as each other in the general formula (1), and preferred ranges are also the same. In Formula (4), R 41 has the same meaning as R 41 in Formula (3), and the preferred range is also the same. n is preferably 0 to 3, and more preferably 0 to 2.
 一般式(1)で表されるイミノエーテル化合物は、合成の容易性から、一般式(1)におけるRが一般式(3)で表される鎖状イミノエーテル基含有化合物、すなわち、下記一般式(5)で表されることが好ましい。 The iminoether compound represented by the general formula (1) is a chain iminoether group-containing compound in which R 3 in the general formula (1) is represented by the general formula (3) from the ease of synthesis, that is, It is preferable to be represented by Formula (5).
Figure JPOXMLDOC01-appb-C000020

 
Figure JPOXMLDOC01-appb-C000020

 
 一般式(5)中、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。R21は置換基を表し、mは0~5の整数を表し、R21が複数存在する場合、複数のR21は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。R41は置換基を表し、nは0~5の整数を表し、R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。 In formula (5), R 11 , R 12 and R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. R 21 represents a substituent, m represents an integer of 0 to 5, when R 21 there are a plurality, even more R 21 is the same as each other or different, a ring together You may form. R 41 represents a substituent, n represents an integer of 0 to 5, when R 41 there are a plurality, even more R 41 is the same as each other or different, a ring together You may form.
 一般式(5)中、R11、R12及びR13は、一般式(1)における各々と同義であり、好ましい範囲も同様である。一般式(5)中、R41は一般式(3)におけるR41と同義であり、好ましい範囲も同様である。R21についても、一般式(3)におけるR41と同様の置換基を例示することができる。 In the general formula (5), R 11, R 12 and R 13 are the same as those in formula (1), and preferred ranges are also the same. In formula (5), R 41 has the same meaning as R 41 in formula (3), and the preferred range is also the same. The R 21 can also be exemplified the same substituents as R 41 in the general formula (3).
 一般式(5)中、nは0~3であることが好ましく、0~2であることがより好ましい。mは0~3であることが好ましく、0~2であることがより好ましい。 In the general formula (5), n is preferably 0 to 3, and more preferably 0 to 2. m is preferably 0 to 3, and more preferably 0 to 2.
 一般式(1)で表されるイミノエーテル化合物の多量体としては、合成の容易性及び揮散ガスの発生抑制から、下記一般式(6)で表される鎖状イミノエーテル基含有化合物が好ましい。 As the multimer of the iminoether compound represented by the general formula (1), a chain iminoether group-containing compound represented by the following general formula (6) is preferable in terms of easiness of synthesis and suppression of generation of volatilization gas.
Figure JPOXMLDOC01-appb-C000021

 
Figure JPOXMLDOC01-appb-C000021

 
 一般式(6)中、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。R41は置換基を表し、nは0~5の整数を表す。R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。pは2~4の整数を表し、Lは、炭素原子との結合末端が、置換基を有してもよいアルキレン部、置換基を有してもよいアリーレン部又は置換基を有してもよいアルコキシレン部であるp価の基を表す。置換基を有してもよいアルキレン部は、置換基を有してもよいシクロアルキレン部でもよい。 In General Formula (6), R 11 , R 12 and R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent. R 41 represents a substituent, and n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring. p represents an integer of 2 to 4, and L 1 has an alkylene moiety which may have a substituent, an arylene moiety which may have a substituent, or a substituent at the end of bonding to a carbon atom It also represents a p-valent group which is a good alkoxylene moiety. The alkylene moiety which may have a substituent may be a cycloalkylene moiety which may have a substituent.
 一般式(6)中、R11、R12及びR13は、一般式(1)における各々と同義であり、好ましい範囲も同様である。一般式(6)中、R41は、一般式(3)におけるR41と同義であり、好ましい範囲も同様である。nは0~3であることが好ましく、0~2であることがより好ましい。 In the general formula (6), R 11, R 12 and R 13 are the same as those in formula (1), and preferred ranges are also the same. In Formula (6), R 41 has the same meaning as R 41 in Formula (3), and the preferred range is also the same. n is preferably 0 to 3, and more preferably 0 to 2.
 一般式(6)中、Lは、炭素原子との結合末端が、置換基を有してもよいアルキレン部、置換基を有してもよいアリーレン部又は置換基を有してもよいアルコキシレン部であるp価の基を表す。pは2~4の整数を表し、pは2又は3であることが好ましい。置換基を有してもよいアルキレン部は、置換基を有してもよいシクロアルキレン部でもよい。
 二価の基の具体例としては、例えば、置換基を有してもよいアルキレン基、置換基を有してもよいアリーレン基、置換基を有してもよいアルコキシレン基が挙げられる。また、炭素原子との結合末端が、置換基を有してもよいアルキレン部、置換基を有してもよいアリーレン部又は置換基を有してもよいアルコキシレン部であり、部分構造として、-SO-、-CO-、置換もしくは無置換のアルキレン部、置換もしくは無置換のアルケニレン部、アルキニレン部、置換もしくは無置換のフェニレン部、置換もしくは無置換のビフェニレン部、置換もしくは無置換のナフチレン部、-O-、-S-及び-SO-から選ばれる少なくとも一つを含む基が挙げられる。置換基を有してもよいアルキレン部は、置換基を有してもよいシクロアルキレン部でもよい。
 好ましくは、例えば、置換もしくは無置換のフェニレン基、置換もしくは無置換のビフェニレン基、置換もしくは無置換のナフチレン基、エチレン基、n-ブチレン基、置換もしくは無置換のシクロヘキシレン基、置換もしくは無置換の-C10-C10-、置換もしくは無置換の-C10-CH-C10-、置換もしくは無置換の-C-C(CH-C-、置換もしくは無置換の-C-CH-C-、置換もしくは無置換の-C-C(O)-C-、置換もしくは無置換の-C-O-C-、置換もしくは無置換の-C-S-C-、置換もしくは無置換の-C-SO-C-、置換もしくは無置換の-C-C(CF-C-、置換もしくは無置換の-C-NHC(O)-C-、置換もしくは無置換の-C-O-C-C(CH-C-O-C-、置換もしくは無置換の-C-O-C-C(O)-C-O-C-、置換もしくは無置換の-C-O-C-SO-C-O-C-、置換もしくは無置換の-C-O-C-S-C-O-C-、置換もしくは無置換の-C-O-(C-O-C-、置換もしくは無置換の-C-O-C-C(CF-C-O-C-、などが挙げられる。
 三価の基の具体例としては、例えば、二価の基の例として挙げた基のうち置換基を有する構造から1つの水素原子を取り除いた基が挙げられる。
 四価の基の具体例としては、例えば、二価の基の例として挙げた基のうち置換基を有する構造から2つの水素原子を取り除いた基が挙げられる。
In General Formula (6), L 1 is an alkoxy moiety which may have a substituent, an alkylene moiety which may have a substituent, an arylene moiety which may have a substituent, or a substituent, at the end of the bond to a carbon atom It represents a p-valent group which is a ren moiety. p is an integer of 2 to 4, and p is preferably 2 or 3. The alkylene moiety which may have a substituent may be a cycloalkylene moiety which may have a substituent.
Specific examples of the divalent group include, for example, an alkylene group which may have a substituent, an arylene group which may have a substituent, and an alkoxylene group which may have a substituent. Further, the terminal of the bond with the carbon atom is an alkylene moiety which may have a substituent, an arylene moiety which may have a substituent, or an alkoxylene moiety which may have a substituent, as a partial structure, -SO 2- , -CO-, substituted or unsubstituted alkylene moiety, substituted or unsubstituted alkenylene moiety, alkynylene moiety, substituted or unsubstituted phenylene moiety, substituted or unsubstituted biphenylene moiety, substituted or unsubstituted naphthylene And groups containing at least one selected from -O-, -S- and -SO-. The alkylene moiety which may have a substituent may be a cycloalkylene moiety which may have a substituent.
Preferably, for example, substituted or unsubstituted phenylene group, substituted or unsubstituted biphenylene group, substituted or unsubstituted naphthylene group, ethylene group, n-butylene group, substituted or unsubstituted cyclohexylene group, substituted or unsubstituted group -C 6 H 10 -C 6 H 10- , substituted or unsubstituted -C 6 H 10 -CH 2 -C 6 H 10- , substituted or unsubstituted -C 6 H 4 -C (CH 3 ) 2 -C 6 H 4 -, -C substituted or unsubstituted 6 H 4 -CH 2 -C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -C (O) -C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -O-C 6 H 4 -, -C substituted or unsubstituted 6 H 4 -S-C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -SO 2 -C 6 H 4 -, also substituted Ku is unsubstituted -C 6 H 4 -C (CF 3 ) 2 -C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -NHC (O) -C 6 H 4 -, substituted or unsubstituted of -C 6 H 4 -O-C 6 H 4 -C (CH 3) 2 -C 6 H 4 -O-C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -O-C 6 H 4 -C (O) -C 6 H 4 -O-C 6 H 4 -, -C 6 H 4 substituted or unsubstituted -O-C 6 H 4 -SO 2 -C 6 H 4 -O-C 6 H 4 -, -C 6 H 4 substituted or unsubstituted -O-C 6 H 4 -S- C 6 H 4 -O-C 6 H 4 -, -C 6 substituted or unsubstituted H 4 -O- (C 6 H 4) 2 -O -C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -O-C 6 H 4 -C (CF 3) 2 -C 6 H 4 -O-C 6 4 -, and the like.
As a specific example of a trivalent group, the group which remove | eliminated one hydrogen atom from the structure which has a substituent among the groups mentioned as an example of a bivalent group is mentioned, for example.
As a specific example of a tetravalent group, the group which remove | eliminated two hydrogen atoms from the structure which has a substituent among the groups mentioned as an example of a bivalent group is mentioned, for example.
 本開示では、一般式(6)におけるpを2~4とすることにより、イミノエーテル部を1分子中に2以上有する化合物とすることができ、より優れた末端封止効果を発揮することができる。さらに、イミノエーテル部を1分子中に2以上有する化合物とすることにより、イミノエーテル価(全分子量/イミノエーテル基数)を低くすることができ、効率良くイミノエーテル化合物とカルボキシ基を反応させることができる。 In the present disclosure, by setting p in the general formula (6) to 2 to 4, a compound having two or more iminoether moieties in one molecule can be obtained, and a more excellent end capping effect can be exhibited. it can. Furthermore, the iminoether value (total molecular weight / number of iminoether groups) can be lowered by using a compound having two or more iminoether moieties in one molecule, and an iminoether compound can be efficiently reacted with a carboxy group. it can.
 一般式(1)で表されるイミノエーテル化合物の多量体としては、合成の容易性及び揮散ガスの発生抑制から、下記一般式(7)で表される鎖状イミノエーテル基含有化合物も好ましい。 As the multimer of the iminoether compound represented by the general formula (1), a chain iminoether group-containing compound represented by the following general formula (7) is also preferable in terms of easiness of synthesis and suppression of generation of volatilization gas.
Figure JPOXMLDOC01-appb-C000022

 
Figure JPOXMLDOC01-appb-C000022

 
 一般式(7)中、Rは置換基を有してもよいアルキル基、置換基を有してもよいアリール基又は置換基を有してもよいアルコキシ基を表し、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。pは2~4の整数を表し、Lは、窒素原子との結合末端が、置換基を有してもよいアリーレン部又は置換基を有してもよいシクロアルキレン部であるp価の基を表す。 In the general formula (7), R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent, and R 11 and R 12 And R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. p represents an integer of 2 to 4, and p represents a p-valent group in which L 2 is a arylene moiety which may have a substituent or a cycloalkylene moiety which may have a substituent. Represents
 一般式(7)中、R、R11、R12及びR13は、一般式(1)における各々と同義であり、好ましい範囲も同様である。 In the general formula (7), R 2 , R 11 , R 12 and R 13 have the same meanings as each other in the general formula (1), and the preferred ranges are also the same.
 一般式(7)中、Lは、窒素原子との結合末端が、置換基を有してもよいアリーレン部又は置換基を有してもよいシクロアルキレン部であるp価の基を表す。Lは、窒素原子との結合末端が、置換基を有してもよいアリーレン部であるp価の基が好ましい。pは2~4の整数を表し、pは2又は3であることが好ましい。
 Lの具体例としては、置換基を有してもよいアリーレン基、置換基を有してもよいシクロアルキレン基が挙げられる。窒素原子との結合末端が、置換基を有してもよいアリーレン部又は置換基を有してもよいシクロアルキレン部であり、部分構造として、-SO-、-CO-、置換もしくは無置換のアルキレン部、置換もしくは無置換のアルケニレン部、アルキニレン部、置換もしくは無置換のフェニレン部、置換もしくは無置換のビフェニレン部、置換もしくは無置換のナフチレン部、-O-、-S-及び-SO-から選ばれる少なくとも一つを含む基が挙げられる。
 好ましくは、例えば、置換もしくは無置換のフェニレン基、置換もしくは無置換のビフェニレン基、置換もしくは無置換のナフチレン基、置換もしくは無置換のシクロヘキシレン基、置換もしくは無置換の-C10-C10-、置換もしくは無置換の-C10-CH-C10-、置換もしくは無置換の-C-C(CH-C-、置換もしくは無置換の-C-CH-C-、置換もしくは無置換の-C-C(O)-C-、置換もしくは無置換の-C-O-C-、置換もしくは無置換の-C-SC-、置換もしくは無置換の-C-SO-C-、置換もしくは無置換の-C-C(CF-C-、置換もしくは無置換の-C-NHC(O)-C-、置換もしくは無置換の-C-O-C-C(CH-C-O-C-、置換もしくは無置換の-C-O-C-C(O)-C-O-C-、置換もしくは無置換の-C-O-C-SO-C-O-C-、置換もしくは無置換の-C-O-C-S-C-O-C-、置換もしくは無置換の-C-O-(C-O-C-、置換もしくは無置換の-C-O-C-C(CF-C-O-C-、などが挙げられる。
In the general formula (7), L 2 represents a p-valent group which is an arylene moiety which may have a substituent or a cycloalkylene moiety which may have a substituent, at the end of the bond to the nitrogen atom. L 2 is preferably a p-valent group in which the end of the bond to the nitrogen atom is an arylene moiety which may have a substituent. p is an integer of 2 to 4, and p is preferably 2 or 3.
Specific examples of L 2 include an arylene group which may have a substituent, and a cycloalkylene group which may have a substituent. The end of the bond to the nitrogen atom is an arylene moiety which may have a substituent or a cycloalkylene moiety which may have a substituent, and as a partial structure, —SO 2 —, —CO—, substituted or unsubstituted , An substituted or unsubstituted alkenylene moiety, an alkynylene moiety, a substituted or unsubstituted phenylene moiety, a substituted or unsubstituted biphenylene moiety, a substituted or unsubstituted naphthylene moiety, -O-, -S- and -SO- And groups containing at least one selected from
Preferably, for example, a substituted or unsubstituted phenylene group, a substituted or unsubstituted biphenylene group, a substituted or unsubstituted naphthylene group, a substituted or unsubstituted cyclohexylene group, a substituted or unsubstituted -C 6 H 10 -C 6 H 10 -, substituted or unsubstituted -C 6 H 10 -CH 2 -C 6 H 10 -, substituted or unsubstituted -C 6 H 4 -C (CH 3 ) 2 -C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -CH 2 -C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -C (O) -C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -O-C 6 H 4 - , substituted or unsubstituted -C 6 H 4 -SC 6 H 4 -, -C substituted or unsubstituted 6 H 4 -SO 2 -C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -C substitution CF 3) 2 -C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -NHC (O) -C 6 H 4 -, -C substituted or unsubstituted 6 H 4 -O-C 6 H 4 -C (CH 3) 2 -C 6 H 4 -O-C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -O-C 6 H 4 -C (O) -C 6 H 4 -O -C 6 H 4 -, -C 6 H 4 substituted or unsubstituted -O-C 6 H 4 -SO 2 -C 6 H 4 -O-C 6 H 4 -, substituted or unsubstituted -C 6 H 4 -O-C 6 H 4 -S -C 6 H 4 -O-C 6 H 4 -, -C 6 substituted or unsubstituted H 4 -O- (C 6 H 4 ) 2 -O-C 6 H 4 -, a substituted or unsubstituted -C 6 H 4 -O-C 6 H 4 -C (CF 3) 2 -C 6 H 4 -O-C 6 H 4 -, and the like.
 一般式(1)で表されるイミノエーテル化合物の多量体としては、合成の容易性及び揮散ガスの発生抑制から、下記一般式(8)で表される鎖状イミノエーテル基含有化合物も好ましい。 As the multimer of the iminoether compound represented by the general formula (1), a chain iminoether group-containing compound represented by the following general formula (8) is also preferable in terms of easiness of synthesis and suppression of generation of volatilization gas.
Figure JPOXMLDOC01-appb-C000023

 
Figure JPOXMLDOC01-appb-C000023

 
 一般式(8)中、Rは置換基を有してもよいアルキル基、置換基を有してもよいアリール基又は置換基を有してもよいアルコキシ基を表し、R41は置換基を表し、nは0~5の整数を表す。R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。pは2~4の整数を表し、Lは、酸素原子との結合末端が、アルキレン部であるp価の基を表す。Lのアルキレン部は、水素原子の一部又は全部が、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基で置換されていてもよい。 In general formula (8), R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent, and R 41 represents a substituent And n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring. p represents an integer of 2 to 4, and L 3 represents a p-valent group in which the bonding end with the oxygen atom is an alkylene part. In the alkylene moiety of L 3 , part or all of the hydrogen atoms may be substituted with an alkyl group which may have a substituent or an aryl group which may have a substituent.
 一般式(8)中、Rは、一般式(1)におけるRと同義であり、好ましい範囲も同様である。一般式(8)中、R41は、一般式(3)におけるR41と同義であり、好ましい範囲も同様である。nは0~3であることが好ましく、0~2であることがより好ましい。Rは、R41と連結して環を形成してもよい。 In General Formula (8), R 2 is synonymous with R 2 in General Formula (1), and its preferable range is also the same. In Formula (8), R 41 has the same meaning as R 41 in Formula (3), and the preferred range is also the same. n is preferably 0 to 3, and more preferably 0 to 2. R 2 may link to R 41 to form a ring.
 一般式(8)中、Lは、酸素原子との結合末端が、アルキレン部であるp価の基を表す。Lのアルキレン部は、水素原子の一部又は全部が、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基で置換されていてもよい。pは2~4の整数を表し、pは2又は3であることが好ましい。
 Lの具体例としては、アルキレン基が挙げられる。酸素原子との結合末端が、アルキレン部であり、部分構造として、-SO-、-CO-、置換もしくは無置換のアルキレン基、置換もしくは無置換のアルケニレン基、アルキニレン基、置換もしくは無置換のフェニレン基、置換もしくは無置換のビフェニレン基、置換もしくは無置換のナフチレン基、-O-、-S-及び-SO-から選ばれる少なくとも一つを含む基が挙げられる。
 好ましくは、例えば、エチレン基、n-ブチレン基、置換もしくは無置換の-CH-C(CH-CH-、置換もしくは無置換の-CH-C-CH-、などが挙げられる。
In general formula (8), L 3 represents a p-valent group in which the end of the bond to the oxygen atom is an alkylene part. In the alkylene moiety of L 3 , part or all of the hydrogen atoms may be substituted with an alkyl group which may have a substituent or an aryl group which may have a substituent. p is an integer of 2 to 4, and p is preferably 2 or 3.
Specific examples of L 3, include an alkylene group. The end of the bond to the oxygen atom is an alkylene moiety, and as a partial structure, -SO 2- , -CO-, a substituted or unsubstituted alkylene group, a substituted or unsubstituted alkenylene group, an alkynylene group, a substituted or unsubstituted Examples thereof include a group containing at least one selected from a phenylene group, a substituted or unsubstituted biphenylene group, a substituted or unsubstituted naphthylene group, -O-, -S- and -SO-.
Preferably, for example, ethylene group, n-butylene group, substituted or unsubstituted -CH 2 -C (CH 3 ) 2 -CH 2- , substituted or unsubstituted -CH 2 -C 6 H 4 -CH 2- , Etc.
 本開示で用いる鎖状イミノエーテル基含有化合物のイミノエーテル基1つあたりの分子量(全分子量/イミノエーテル基数)は1000以下であることが好ましく、750以下であることがより好ましく、500以下であることがさらに好ましい。イミノエーテル基1つあたりの分子量を1000以下とすることで、低添加量にてポリアミドの末端カルボキシ基を封止することが可能となる。
 一方、成形体を製造する際の反応生成物又は未反応の鎖状イミノエーテル基含有化合物の揮散を抑制する観点から、鎖状イミノエーテル基含有化合物のイミノエーテル基1つあたりの分子量は300以上であることが好ましい。
The molecular weight (total molecular weight / number of iminoether groups) per iminoether group of the chain iminoether group-containing compound used in the present disclosure is preferably 1000 or less, more preferably 750 or less, and 500 or less Is more preferred. By setting the molecular weight per iminoether group to 1000 or less, it becomes possible to seal the terminal carboxy group of the polyamide with a low addition amount.
On the other hand, the molecular weight per iminoether group of the chain iminoether group-containing compound is 300 or more from the viewpoint of suppressing the volatilization of the reaction product or the unreacted chain iminoether group-containing compound when producing the molded product. Is preferred.
 下記に一般式(1)で表されるイミノエーテル化合物及びその多量体の好ましい具体例を示すが、本開示で用い得る鎖状イミノエーテル基含有化合物はこれらに限定されない。 Although the preferable specific example of the iminoether compound represented by General formula (1) and its multimer is shown below, the chain-like iminoether group containing compound which can be used by this indication is not limited to these.
Figure JPOXMLDOC01-appb-C000024

 
Figure JPOXMLDOC01-appb-C000024

 
Figure JPOXMLDOC01-appb-C000025

 
Figure JPOXMLDOC01-appb-C000025

 
Figure JPOXMLDOC01-appb-C000026

 
Figure JPOXMLDOC01-appb-C000026

 
Figure JPOXMLDOC01-appb-C000027

 
Figure JPOXMLDOC01-appb-C000027

 
Figure JPOXMLDOC01-appb-C000028

 
Figure JPOXMLDOC01-appb-C000028

 
Figure JPOXMLDOC01-appb-C000029

 
Figure JPOXMLDOC01-appb-C000029

 
Figure JPOXMLDOC01-appb-C000030

 
Figure JPOXMLDOC01-appb-C000030

 
Figure JPOXMLDOC01-appb-C000031

 
Figure JPOXMLDOC01-appb-C000031

 
Figure JPOXMLDOC01-appb-C000032

 
Figure JPOXMLDOC01-appb-C000032

 
Figure JPOXMLDOC01-appb-C000033

 
Figure JPOXMLDOC01-appb-C000033

 
 本開示のポリアミド樹脂組成物は、ポリアミドと、一般式(1)で表されるイミノエーテル化合物及びその多量体から選ばれる少なくとも1種の鎖状イミノエーテル基含有化合物とを含むことによって、成形時の揮散ガスの発生及び増粘を効果的に抑制し、且つ、耐加水分解性を有するポリアミド樹脂成形体を製造することができる。
 また、鎖状イミノエーテル基含有化合物の添加量を調整することで成形体の色味を制御することもできる。
The polyamide resin composition of the present disclosure includes a polyamide and at least one linear iminoether group-containing compound selected from an iminoether compound represented by the general formula (1) and an oligomer thereof, at the time of molding. It is possible to effectively suppress the generation of volatile gas and thickening, and to produce a polyamide resin molded product having hydrolysis resistance.
Moreover, the color taste of a molded object can also be controlled by adjusting the addition amount of a chain-like iminoether group containing compound.
 本開示のポリアミド樹脂組成物は、ポリアミド100質量部に対して、鎖状イミノエーテル基含有化合物を0.05~5.0質量部含むことが好ましい。ポリアミド100質量部に対して、鎖状イミノエーテル基含有化合物の添加量を0.05質量部以上とすることで、揮散ガスの発生及び増粘を効果的に抑制し、且つ、ポリアミド樹脂成形体の耐加水分解性をより向上させることができる。一方、一般式(1)で表されるイミノエーテル化合物の上記添加量を5.0質量部以下とすることで黄色味を抑制することができる。
 ポリアミド樹脂成形体の耐加水分解性の向上並びに成形時の揮散ガスの発生及び増粘の抑制に加え、黄色味をより効果的に抑制する観点から、ポリアミド100質量部に対して、鎖状イミノエーテル基含有化合物を0.1~2.0質量部含むことがより好ましい。
 本開示のポリアミド樹脂組成物は、鎖状イミノエーテル基含有化合物を1種単独で使用してもよいし、複数種を併用してもよいが、複数種の鎖状イミノエーテル基含有化合物を併用する場合は、合計量が上記範囲であることが好ましい。
The polyamide resin composition of the present disclosure preferably contains 0.05 to 5.0 parts by mass of the chain iminoether group-containing compound with respect to 100 parts by mass of the polyamide. By setting the addition amount of the chain iminoether group-containing compound to 0.05 parts by mass or more with respect to 100 parts by mass of polyamide, generation of volatilized gas and thickening are effectively suppressed, and a polyamide resin molded body Resistance to hydrolysis can be further improved. On the other hand, yellowishness can be suppressed by the said addition amount of the iminoether compound represented by General formula (1) being 5.0 mass parts or less.
In addition to the improvement of the hydrolysis resistance of the polyamide resin molded product and the suppression of the generation of volatilized gas and the thickening during molding, from the viewpoint of effectively suppressing the yellowishness, a chain imino relative to 100 parts by mass of the polyamide More preferably, the ether group-containing compound is contained in an amount of 0.1 to 2.0 parts by mass.
The polyamide resin composition of the present disclosure may use a single chain iminoether group-containing compound singly or in combination of two or more thereof, but may use a combination of a plurality of chain iminoether group-containing compounds. When it does, it is preferable that a total amount is the said range.
 本開示のポリアミド樹脂組成物は、本発明の効果を著しく損なわない範囲内であれば、各種添加剤、例えば、相溶化剤、可塑剤、耐候剤、酸化防止剤、熱安定剤、滑剤、帯電防止剤、増白剤、着色剤、導電剤、紫外線吸収剤、難燃剤、難燃助剤、顔料、染料などを含んでもよい。 The polyamide resin composition of the present disclosure can be added to various additives such as a compatibilizer, a plasticizer, a weathering agent, an antioxidant, a heat stabilizer, a lubricant, and the like as long as the effects of the present invention are not significantly impaired. The composition may contain an inhibitor, a brightener, a colorant, a conductive agent, an ultraviolet absorber, a flame retardant, a flame retardant aid, a pigment, a dye and the like.
 本開示のポリアミド樹脂組成物は、本発明の効果を著しく損なわない範囲内であれば、上述したイミノエーテル化合物以外の末端封止剤を含むことを拒まない。本開示のポリアミド樹脂組成物は、上述したイミノエーテル化合物のほかに、例えば、カルボジイミド化合物、エポキシ化合物、及びオキサゾリン化合物から選ばれる末端封止剤を併用することもできる。 The polyamide resin composition of the present disclosure does not refuse to contain an end capping agent other than the iminoether compound described above, as long as the effects of the present invention are not significantly impaired. The polyamide resin composition of this indication can also use together the terminal blocker chosen from a carbodiimide compound, an epoxy compound, and an oxazoline compound other than the iminoether compound mentioned above, for example.
<ポリアミド樹脂成形体>
 本開示のポリアミド樹脂組成物を用いてポリアミド樹脂成形体を製造する際の成形方法は特に限定されず、射出成形、押出成形など、用途に応じて公知の成形方法を適用すればよい。例えば、本開示のポリアミド樹脂組成物に含まれるポリアミドの融点以上に加熱して溶融混練し、射出成形することで所望の形状のポリアミド樹脂成形体を得ることができる。本開示のポリアミド樹脂組成物は、混練時又は成形時に加熱しても鎖状イミノエーテル基含有化合物に由来する副生成物の揮散及び増粘が抑制され、且つ、耐加水分解性を有するポリアミド樹脂成形体を製造することができる。
<Polyamide resin molding>
The molding method at the time of manufacturing a polyamide resin molded object using the polyamide resin composition of this indication is not specifically limited, What is necessary is just to apply the well-known molding method according to a use, such as injection molding and extrusion molding. For example, a polyamide resin molded body having a desired shape can be obtained by heating and melting and kneading to a temperature equal to or higher than the melting point of the polyamide contained in the polyamide resin composition of the present disclosure and injection molding. The polyamide resin composition of the present disclosure is a polyamide resin having hydrolysis resistance and suppressing volatilization and thickening of by-products derived from the chain iminoether group-containing compound even when heated at the time of kneading or molding. Moldings can be produced.
 本開示のポリアミド樹脂組成物の用途は特に限定されず、例えば機械部品、電気通信機器用部品、輸送機械部品、事務機械部品、ガソリンタンク、電気・電子部品各種、雑貨、建材、フィルム、魚網及びテグスなどの釣り道具、歯車、ファスナー、吸気管、ラジエタータンク、冷却ファンなどの樹脂成形体として好適に用いることができる。 The application of the polyamide resin composition of the present disclosure is not particularly limited. For example, machine parts, parts for telecommunications equipment, transport machine parts, office machinery parts, gasoline tanks, various electric and electronic parts, miscellaneous goods, building materials, films, fish nets and It can be suitably used as a fishing tool such as Tegs, a gear, a fastener, an intake pipe, a radiator tank, a resin molded product such as a cooling fan.
 以下に実施例を挙げて本発明をさらに具体的に説明する。以下の実施例に示す材料、使用量、割合、処理内容、処理手順等は、本発明の趣旨を逸脱しない限り、適宜、変更することができる。従って、本発明の範囲は以下に示す実施例に限定されない。なお、特に断りの無い限り、「部」は質量基準である。 Hereinafter, the present invention will be more specifically described by way of examples. The materials, amounts used, proportions, treatment contents, treatment procedures and the like shown in the following examples can be appropriately changed without departing from the spirit of the present invention. Accordingly, the scope of the present invention is not limited to the examples shown below. In addition, "part" is mass reference | standard unless there is particular notice.
 実施例では、まず、イミノエーテル化合物として下記の例示化合物を合成した。 In the examples, first, the following exemplified compounds were synthesized as iminoether compounds.
Figure JPOXMLDOC01-appb-C000034

 
Figure JPOXMLDOC01-appb-C000034

 
[合成例1]
<イミノエーテル(1)の合成>
Synthesis Example 1
<Synthesis of iminoether (1)>
Figure JPOXMLDOC01-appb-C000035

 
Figure JPOXMLDOC01-appb-C000035

 
 5L三口フラスコに、トリエトキシメチルベンゼン600g(2.80mol)、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン498g(1.28mol)、トルエン480ml、メタンスルホン酸0.24g(2.5mmol)を仕込み、加熱還流下2時間攪拌した。反応系温度を100℃以下とし、還流されたエタノールはDean-Stark装置にて取り除いた。TLC(薄層クロマトグラフィー)にて反応終了を確認した後、室温まで冷却し、メタノールを加え晶析することで、イミノエーテル(1)777g(収率95%)を得た。得られた化合物はH-NMRにて同定した。 In a 5 L three-necked flask, 600 g (2.80 mol) of triethoxymethylbenzene, 498 g (1.28 mol) of 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 480 ml of toluene, 0.24 g of methanesulfonic acid The mixture was charged with 2.5 mmol) and stirred under heating reflux for 2 hours. The reaction system temperature was brought to 100 ° C. or lower, and the refluxed ethanol was removed by a Dean-Stark apparatus. After confirming the completion of the reaction by TLC (thin layer chromatography), the reaction solution was cooled to room temperature, methanol was added and crystallized to obtain 777 g (yield 95%) of iminoether (1). The obtained compound was identified by 1 H-NMR.
[合成例2]
<イミノエーテル(2)の合成>
Synthesis Example 2
<Synthesis of iminoether (2)>
Figure JPOXMLDOC01-appb-C000036

 
Figure JPOXMLDOC01-appb-C000036

 
 5L三口フラスコに、トリメトキシメチルベンゼン512g(2.80mol)、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン498g(1.28mol)、トルエン480ml、メタンスルホン酸0.24g(2.5mmol)を仕込み、加熱還流下2時間攪拌した。反応系温度を100℃以下とし、還流されたメタノールはDean-Stark装置にて取り除いた。TLCにて反応終了を確認した後、室温まで冷却し、メタノールを加え晶析することで、イミノエーテル(2)745g(収率95%)を得た。得られた化合物はH-NMRにて同定した。 In a 5 L three-necked flask, 512 g (2.80 mol) of trimethoxymethylbenzene, 498 g (1.28 mol) of 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 480 ml of toluene, 0.24 g of methanesulfonic acid The mixture was charged with 2.5 mmol) and stirred under heating reflux for 2 hours. The reaction system temperature was adjusted to 100 ° C. or less, and the refluxed methanol was removed by a Dean-Stark apparatus. After completion of the reaction was confirmed by TLC, the reaction solution was cooled to room temperature and methanol was added to crystallize to obtain 745 g (yield 95%) of iminoether (2). The obtained compound was identified by 1 H-NMR.
[合成例3]
<イミノエーテル(3)の合成>
Figure JPOXMLDOC01-appb-C000037

 
Synthesis Example 3
<Synthesis of iminoether (3)>
Figure JPOXMLDOC01-appb-C000037

 5L三口フラスコに、オルト酢酸トリメチル338g(2.80mol)、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン498g(1.28mol)、トルエン480ml、メタンスルホン酸0.24g(2.5mmol)を仕込み、加熱還流下2時間攪拌した。反応系温度を100℃以下とし、還流されたメタノールはDean-Stark装置にて取り除いた。TLCにて反応終了を確認した後、室温まで冷却し、メタノールを加え晶析することで、イミノエーテル(3)615g(収率92%)を得た。得られた化合物はH-NMRにて同定した。 In a 5-L three-necked flask, 338 g (2.80 mol) of trimethyl orthoacetate, 498 g (1.28 mol) of 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 480 ml of toluene, 0.24 g of methanesulfonic acid (2 .5 mmol) was added and stirred for 2 hours under heating and reflux. The reaction system temperature was adjusted to 100 ° C. or less, and the refluxed methanol was removed by a Dean-Stark apparatus. After completion of the reaction was confirmed by TLC, the reaction solution was cooled to room temperature, and methanol was added to crystallize to obtain 615 g (yield 92%) of iminoether (3). The obtained compound was identified by 1 H-NMR.
[合成例4]
<イミノエーテル(4)の合成>
Synthesis Example 4
<Synthesis of iminoether (4)>
Figure JPOXMLDOC01-appb-C000038

 
Figure JPOXMLDOC01-appb-C000038

 
 5L三口フラスコに、トリメトキシメチルベンゼン512g(2.80mol)、4,4’-ジアミノベンズアニリド310g(1.28mol)、トルエン480ml、メタンスルホン酸0.24g(2.5mmol)を仕込み、加熱還流下2時間攪拌した。反応系温度を100℃以下とし、還流されたメタノールはDean-Stark装置にて取り除いた。TLCにて反応終了を確認した後、室温まで冷却し、メタノールを加え晶析することで、イミノエーテル(4)504g(収率85%)を得た。得られた化合物はH-NMRにて同定した。 In a 5 L three-necked flask, 512 g (2.80 mol) of trimethoxymethylbenzene, 310 g (1.28 mol) of 4,4'-diaminobenzanilide, 480 ml of toluene and 0.24 g (2.5 mmol) of methanesulfonic acid are charged, and heated to reflux. Stir for 2 hours below. The reaction system temperature was adjusted to 100 ° C. or less, and the refluxed methanol was removed by a Dean-Stark apparatus. After completion of the reaction was confirmed by TLC, the reaction solution was cooled to room temperature, and methanol was added to crystallize to obtain 504 g (yield 85%) of iminoether (4). The obtained compound was identified by 1 H-NMR.
[合成例5]
<イミノエーテル(5)の合成>
Synthesis Example 5
<Synthesis of iminoether (5)>
Figure JPOXMLDOC01-appb-C000039

 
Figure JPOXMLDOC01-appb-C000039

 
 5L三口フラスコに、トリメトキシメチルベンゼン512g(2.80mol)、4-アミノアセトアニリド191.8g(1.28mol)、トルエン480ml、メタンスルホン酸0.24g(2.5mmol)を仕込み、加熱還流下2時間攪拌した。反応系温度を100℃以下とし、還流されたメタノールはDean-Stark装置にて取り除いた。TLCにて反応終了を確認した後、室温まで冷却し、メタノールを加え晶析することで、イミノエーテル(5)309g(収率90%)を得た。得られた化合物はH-NMRにて同定した。 In a 5 L three-necked flask, 512 g (2.80 mol) of trimethoxymethylbenzene, 191.8 g (1.28 mol) of 4-aminoacetanilide, 480 ml of toluene and 0.24 g (2.5 mmol) of methanesulfonic acid are charged, and heated under reflux 2 Stir for hours. The reaction system temperature was adjusted to 100 ° C. or less, and the refluxed methanol was removed by a Dean-Stark apparatus. After completion of the reaction was confirmed by TLC, the reaction solution was cooled to room temperature and methanol was added to crystallize to obtain 309 g (yield 90%) of iminoether (5). The obtained compound was identified by 1 H-NMR.
[合成例6]
<イミノエーテル(6)の合成>
Synthesis Example 6
<Synthesis of iminoether (6)>
Figure JPOXMLDOC01-appb-C000040

 
Figure JPOXMLDOC01-appb-C000040

 
 5L三口フラスコに、4,4’-メチレンビス(シクロヘキシルアミン)210g(1.0mol)、トリエチルアミン243g(2.4mol)、ジメチルアセトアミド1.0Lを仕込み、氷浴下でベンゾイルクロライド336g(2.4mol)を滴下した後、室温下で1時間攪拌した。1mol/Lの塩酸水2.0Lを加え、1時間攪拌し、ろ過することで中間生成物(6-1)397g(収率95%)を得た。得られた化合物はH-NMRにて同定した。 In a 5-L three-necked flask, 210 g (1.0 mol) of 4,4'-methylenebis (cyclohexylamine), 243 g (2.4 mol) of triethylamine and 1.0 L of dimethylacetamide are charged, and 336 g (2.4 mol) of benzoyl chloride in an ice bath After dropwise addition, the mixture was stirred at room temperature for 1 hour. 2.0 L of 1 mol / L hydrochloric acid water was added, and the mixture was stirred for 1 hour, and filtered to obtain 397 g (yield 95%) of an intermediate product (6-1). The obtained compound was identified by 1 H-NMR.
 5L三口フラスコに、中間生成物(6-1)300g、塩化チオニル1.0Lを加え、65℃で2時間攪拌した後、過剰量の塩化チオニルを減圧下で除去した。室温まで冷却しTHF(テトラヒドロフラン)1.0mlを加え、氷浴下でナトリウムメチラート28質量%メタノール溶液(商品名:SM-28)を310g(1.6mol)滴下した後、室温下で1時間攪拌した。酢酸エチル1.5Lと純水1.0Lを加えて分液し、硫酸マグネシウムで乾燥した後、濃縮することで固体が得られた。そこへメタノール2.0Lを加え、室温下で1時間攪拌し、ろ過することでイミノエーテル(6)288g(収率90%)を得た。得られた化合物はH-NMRにて同定した。 In a 5 L three-necked flask, 300 g of the intermediate product (6-1) and 1.0 L of thionyl chloride were added, and after stirring at 65 ° C. for 2 hours, excess thionyl chloride was removed under reduced pressure. After cooling to room temperature, 1.0 ml of THF (tetrahydrofuran) was added, and 310 g (1.6 mol) of sodium methylate 28 mass% methanol solution (trade name: SM-28) was added dropwise under an ice bath, and then 1 hour at room temperature It stirred. After adding 1.5 L of ethyl acetate and 1.0 L of pure water, liquid separation was carried out, after drying with magnesium sulfate, the solid was obtained by concentrating. Thereto, 2.0 L of methanol was added, and stirred at room temperature for 1 hour, followed by filtration to obtain 288 g (yield 90%) of iminoether (6). The obtained compound was identified by 1 H-NMR.
[合成例7]
<イミノエーテル(7)の合成>
Synthesis Example 7
<Synthesis of iminoether (7)>
Figure JPOXMLDOC01-appb-C000041

 
Figure JPOXMLDOC01-appb-C000041

 
 5Lフラスコに、2-アミノベンジルアルコール296g(2.4mol)、トリエチルアミン243g(2.4mol)、ジメチルアセトアミド1.5Lを仕込み、氷浴下でテレフタル酸クロリド203g(1.0mol)を分割添加し、1時間攪拌した後、1mol/Lの塩酸水2.0Lを加えて1時間攪拌し、ろ過することで中間生成物(7-1)357g(収率95%)を得た。得られた化合物はH-NMRにて同定した。 In a 5 L flask, 296 g (2.4 mol) of 2-aminobenzyl alcohol, 243 g (2.4 mol) of triethylamine and 1.5 L of dimethylacetamide are charged, and 203 g (1.0 mol) of terephthalic acid chloride is added in portions under an ice bath. After stirring for 1 hour, 2.0 L of 1 mol / L hydrochloric acid water was added, and the mixture was stirred for 1 hour, followed by filtration to obtain 357 g (yield 95%) of an intermediate product (7-1). The obtained compound was identified by 1 H-NMR.
 5L三口フラスコに、中間生成物(7-1)300g(0.8mol)、塩化チオニル1.0Lを加え、65℃で2時間攪拌した後、過剰の塩化チオニルを濃縮除去した。メタノール1.0Lを加えた後、氷浴下でナトリウムメチラート28質量%メタノール溶液(商品名:SM-28) 386g(2.0mol)をゆっくり滴下し、室温で1時間、40℃で50時間攪拌した。沈殿物をろ過して減圧下でメタノールを除去し、酢酸エチルを1.5L加え、分液した後、硫酸マグネシウムで乾燥し、メタノールを加えて晶析し、ろ過することでイミノエーテル(7)136g(収率50%)を得た。得られた化合物はH-NMRにて同定した。 In a 5 L three-necked flask, 300 g (0.8 mol) of the intermediate product (7-1) and 1.0 L of thionyl chloride were added, and after stirring at 65 ° C. for 2 hours, excess thionyl chloride was concentrated and removed. After adding 1.0 L of methanol, 386 g (2.0 mol) of sodium methylate 28 mass% methanol solution (trade name: SM-28) is slowly added dropwise under an ice bath, and 1 hour at room temperature, 50 hours at 40 ° C. It stirred. The precipitate is filtered and methanol is removed under reduced pressure, and 1.5 L of ethyl acetate is added, separated, dried over magnesium sulfate, crystallized by adding methanol, and filtered to obtain an iminoether (7). 136 g (50% yield) were obtained. The obtained compound was identified by 1 H-NMR.
[合成例8]
<イミノエーテル(8)の合成>
Synthesis Example 8
<Synthesis of iminoether (8)>
Figure JPOXMLDOC01-appb-C000042

 
Figure JPOXMLDOC01-appb-C000042

 
 p-アニシジン92.4g(0.75mol)、ピリジン59g(0.75mol)のN、N-ジメチルアセトアミド500ml溶液に、氷冷下、トリメシン酸トリクロライド50g(0.19mol)のN、N-ジメチルアセトアミド100ml溶液を滴下した。室温まで昇温した後、3時間攪拌した。反応溶液を水5Lにゆっくりと添加し、固体を析出させた。ろ過にて固体を分離し、得られた固体をメタノールに分散させ、再びろ過を行った。この操作を2回繰り返し、得られた固体を乾燥させることで、中間生成物(8-1)96.8g(収率97%)を得た。 A solution of 92.4 g (0.75 mol) of p-anisidine, 59 g (0.75 mol) of pyridine in 500 ml of N, N-dimethylacetamide under ice-cooling, 50 g (0.19 mol) of N, N-dimethyl trimesic acid trichloride A solution of 100 ml of acetamide was added dropwise. After heating up to room temperature, it stirred for 3 hours. The reaction solution was slowly added to 5 L of water to precipitate a solid. The solid was separated by filtration, and the obtained solid was dispersed in methanol and filtered again. This operation was repeated twice, and the obtained solid was dried to obtain 96.8 g (yield 97%) of an intermediate product (8-1).
 中間生成物(8-1)26.3g(50mmol)の塩化チオニル100ml懸濁溶液を加熱還流下3時間攪拌した。反応系が透明になったのを確認し、さらに2時間攪拌した。塩化チオニルを留去し、テトラヒドロフラン200mlを添加し、氷冷下、ナトリウムメチラート28質量%メタノール溶液(商品名:SM-28)21.2g(110mol)を滴下した。系の温度を室温まで昇温させ、10分間攪拌した後、酢酸エチル/水を加えて分液した。水にて有機相を洗浄し、有機相を硫酸マグネシウムにて乾燥させた。溶媒を留去した後、酢酸エチル/ヘキサン混合溶媒を溶離液に用いてシリカゲルカラムクロマトグラフィにて精製を行った。溶媒を留去することで、イミノエーテル(8)を25.0g(収率88%)得た。得られた化合物はH-NMRにて同定した。 A suspension of 26.3 g (50 mmol) of the intermediate product (8-1) in 100 ml of thionyl chloride was stirred for 3 hours while heating under reflux. After confirming that the reaction system became transparent, the mixture was further stirred for 2 hours. After thionyl chloride was distilled off, 200 ml of tetrahydrofuran was added, and 21.2 g (110 mol) of a sodium methylate 28% by mass methanol solution (trade name: SM-28) was added dropwise under ice-cooling. The temperature of the system was raised to room temperature, and after stirring for 10 minutes, ethyl acetate / water was added to separate the layers. The organic phase was washed with water and the organic phase was dried over magnesium sulfate. After the solvent was distilled off, purification was performed by silica gel column chromatography using a mixed solvent of ethyl acetate / hexane as an eluent. The solvent was distilled off to obtain 25.0 g (yield 88%) of iminoether (8). The obtained compound was identified by 1 H-NMR.
<イミノエーテル(9)の合成>
[合成例9]
<Synthesis of iminoether (9)>
Synthesis Example 9
Figure JPOXMLDOC01-appb-C000043

 
Figure JPOXMLDOC01-appb-C000043

 
 アニリン46.5g(0.5mol)、ピリジン44g(0.6mol)のN、N-ジメチルアセトアミド300ml溶液を氷冷下、ベンゾイルクロライド95g(0.5mol)をゆっくりと添加した。反応系の温度を室温まで昇温し、TLCにて反応の終了を確認した。メタノールを50ml添加した後、反応溶液を水5Lにゆっくりと添加し、固体を析出させた。ろ過にて固体を分離し、得られた固体をメタノールに分散させ、再びろ過を行った。この操作を2回繰り返し、得られた固体を乾燥させることで、中間生成物(9-1)89.7g(収率91%)を得た。 Under ice-cooling, 95 g (0.5 mol) of benzoyl chloride was slowly added to a solution of 46.5 g (0.5 mol) of aniline and a solution of 44 g (0.6 mol) of pyridine in N, N-dimethylacetamide under ice cooling. The temperature of the reaction system was raised to room temperature, and the completion of the reaction was confirmed by TLC. After 50 ml of methanol was added, the reaction solution was slowly added to 5 liters of water to precipitate a solid. The solid was separated by filtration, and the obtained solid was dispersed in methanol and filtered again. This operation was repeated twice, and the obtained solid was dried to obtain 89.7 g (yield 91%) of an intermediate product (9-1).
 中間生成物(9-1)9.9g(50mmol)の塩化チオニル400ml、触媒量のN、N-ジメチルホルムアミドの懸濁溶液を加熱還流下、18時間攪拌した。反応系が完溶したことを確認し、さらに2時間攪拌した。その後、塩化チオニルを留去することで、中間生成物(9-2)10.8g(quant.)を得た。 A suspension of 9.9 g (50 mmol) of intermediate product (9-1) in 400 ml of thionyl chloride and a catalytic amount of N, N-dimethylformamide was stirred for 18 hours while heating under reflux. After confirming that the reaction system was completely dissolved, the mixture was further stirred for 2 hours. Thereafter, thionyl chloride was distilled off to obtain 10.8 g (quant.) Of an intermediate product (9-2).
 水素化ナトリウム(60質量%)2.0g(50mmol)をヘキサンにて分散し、静置後上澄みのヘキサンをパスツールピペットにて取り除いた。この操作を2回繰り返し、テトラヒドロフラン溶液50mlを加えた。氷冷下、エチレングリコール1.6g(25mmol)を添加した。系内から泡の発生が終わったことを目視で確認し、エチレンジメトキシドのテトラヒドロフラン溶液を調製した。 After 2.0 g (50 mmol) of sodium hydride (60% by mass) was dispersed with hexane and allowed to stand, the supernatant hexane was removed with a Pasteur pipette. This operation was repeated twice and 50 ml of a tetrahydrofuran solution was added. Under ice-cooling, 1.6 g (25 mmol) of ethylene glycol was added. It confirmed visually that generation | occurrence | production of the bubble was complete | finished from system inside, and the tetrahydrofuran solution of ethylene dimethoxide was prepared.
 中間生成物(9-2)10.8g(50mmol)のテトラヒドロフラン溶液150mlを-5℃まで冷却し、調製したエチレンジメトキシドのテトラヒドロフラン溶液を滴下した。系の温度を室温まで昇温させ、30時間攪拌した後、酢酸エチル/水を加えて分液した。水にて有機相を洗浄し、有機相を硫酸マグネシウムにて乾燥させた。溶媒を留去した後、酢酸エチル/ヘキサン混合溶媒を溶離液に用いてシリカゲルカラムクロマトグラフィにて精製を行った。溶媒を留去することで、イミノエーテル(9)を6.5g(収率62%)得た。得られた化合物はH-NMRにて同定した。 150 ml of a tetrahydrofuran solution of 10.8 g (50 mmol) of the intermediate product (9-2) was cooled to −5 ° C., and the prepared tetrahydrofuran solution of ethylene dimethoxide was added dropwise. The temperature of the system was raised to room temperature, and after stirring for 30 hours, ethyl acetate / water was added to separate the layers. The organic phase was washed with water and the organic phase was dried over magnesium sulfate. After the solvent was distilled off, purification was performed by silica gel column chromatography using a mixed solvent of ethyl acetate / hexane as an eluent. The solvent was distilled off to obtain 6.5 g (yield 62%) of iminoether (9). The obtained compound was identified by 1 H-NMR.
[実施例1]
 ナイロン6(ユニチカ社製、A1030BRL、融点225℃)100質量部に対し、イミノエーテル(1)を1質量部添加して一緒に乾式混合し、2軸混練機で250℃にて溶融混合して押出し、ペレットを作製した。得られたペレットを乾燥し、250℃で射出成形して板状の試験片(縦横 100mm×100mm、厚さ:0.3mm)を作製した。
Example 1
One part by mass of iminoether (1) is added to 100 parts by mass of nylon 6 (manufactured by Unitika, A1030 BRL, melting point 225 ° C.), dry mixed together, and melt mixed at 250 ° C. with a twin-screw kneader It extruded and produced the pellet. The obtained pellet was dried and injection-molded at 250 ° C. to prepare a plate-like test piece (100 mm × 100 mm, thickness: 0.3 mm).
-ポリアミド樹脂成形体の性能評価-
 得られた試験片について、耐加水分解性(耐湿熱性1、2)、イミノエーテル由来の化合物の揮散性、色味の各評価を行った。
-Performance evaluation of polyamide resin moldings-
Each of the obtained test pieces was evaluated for hydrolysis resistance (moisture and humidity resistance 1 and 2), volatilization of iminoether-derived compound, and color.
(耐湿熱性1)
 得られた板状の試験片に対して、120℃で、相対湿度100%の水蒸気下の条件で保存処理を行い、保存後の試験片が示す破断伸度(%)が、保存前の試験片が示す破断伸度(%)に対して50%となる保存時間(破断伸度保持率半減期)を測定することで下記基準により評価した。得られた結果を下記表1に記載した。
A: 破断伸度保持率半減期が50日以上
B: 破断伸度保持率半減期が40日以上50日未満
C: 破断伸度保持率半減期が25日以上40日未満
D: 破断伸度保持率半減期が25日未満
(Moisture resistant 1)
The obtained plate-like test piece is stored at 120 ° C. under water vapor at a relative humidity of 100%, and the breaking elongation (%) of the test piece after storage shows the test before storage It evaluated by the following reference | standard by measuring the storage time (the breaking elongation retention half life) used as 50% with respect to the breaking elongation (%) which a piece shows. The obtained results are shown in Table 1 below.
A: elongation at break retention half life of 50 days or more B: elongation at break retention half life of 40 days to less than 50 days C: elongation at break retention half life of 25 days to less than 40 days D: elongation at break Retention half-life less than 25 days
(耐湿熱性2)
 得られた板状の試験片に対して、100℃で、pH=4のクエン酸水溶液中で保存処理を行い、保存後の試験片が示す破断伸度(%)が、保存前の試験片が示す破断伸度(%)に対して50%となる保存時間(破断伸度保持率半減期)を測定することで下記基準により評価した。得られた結果を下記表1に記載した。
A: 破断伸度保持率半減期が50日以上
B: 破断伸度保持率半減期が40日以上50日未満
C: 破断伸度保持率半減期が25日以上40日未満
D: 破断伸度保持率半減期が25日未満
(Moisture resistant 2)
The obtained plate-like test piece is stored in a citric acid aqueous solution at pH 4 at 100 ° C., and the breaking elongation (%) exhibited by the test piece after storage is the test piece before storage It evaluated by the following reference | standard by measuring the storage time (breaking elongation retention half life) used as 50% with respect to the breaking elongation (%) which this shows. The obtained results are shown in Table 1 below.
A: elongation at break retention half life of 50 days or more B: elongation at break retention half life of 40 days to less than 50 days C: elongation at break retention half life of 25 days to less than 40 days D: elongation at break Retention half-life less than 25 days
(揮散性)
 得られた試験片に対して、下記の条件に従って揮散成分の量をガスクロマトグラフィ(商品名 P&T-GC/MS、日本分光(株)製)により測定し、以下の基準で評価した。揮散成分には、イミノエーテル由来の化合物が含まれており、具体的にはイミノエーテル化合物とアミド化合物が含まれている。成形時における揮発成分の発生量は、試験片に含まれるイミノエーテル由来の揮発成分の含有量に反映されている。すなわち、揮散成分の検出量が少ないことは、イミノエーテル化合物とアミド化合物の揮散が少なく、成形体の製造環境が良化することを意味する。得られた結果を下記表1に記載した。
(Volatile)
The amount of the volatile component was measured by gas chromatography (trade name: P & T-GC / MS, manufactured by JASCO Corporation) according to the following conditions with respect to the obtained test piece, and evaluated based on the following criteria. The volatile component contains a compound derived from iminoether, and specifically includes an iminoether compound and an amide compound. The amount of volatile components generated during molding is reflected in the content of volatile components derived from iminoether contained in the test piece. That is, when the detected amount of the volatilization component is small, it means that the volatilization of the iminoether compound and the amide compound is small and the production environment of the molded product is improved. The obtained results are shown in Table 1 below.
<条件>
 密閉容器内で試験片を混練温度(実施例1は250℃)で10分間加熱し、発生したガスを検出した。
A: イミノエーテル由来の化合物は検出限界以下。
B: イミノエーテル由来の化合物は10ppm以下の濃度で検出された。
C: イミノエーテル由来の化合物が10ppmを超える濃度で検出された。
<Condition>
The test piece was heated for 10 minutes at a kneading temperature (250 ° C. in Example 1) in a closed container, and the generated gas was detected.
A: Compounds derived from imino ether are below the detection limit.
B: Compound derived from iminoether was detected at a concentration of 10 ppm or less.
C: Compound derived from iminoether was detected at a concentration of more than 10 ppm.
(色味)
 得られた試験片に対して、下記の基準に従って目視評価した。
A: 黄色味が比較例1と同等であり、許容できるレベル。
B: 比較例1より黄色味が大きく、許容できないレベル。
(Color)
The obtained test pieces were visually evaluated according to the following criteria.
A: Yellowishness is equivalent to Comparative Example 1 and acceptable level.
B: Yellowishness is larger than Comparative Example 1 and unacceptable level.
(成形性)
 成形時の樹脂圧力を押出機の圧力計で確認し、下記の基準で評価した。
A: 比較例1と比較し、樹脂圧力の増加が0%以上50%未満
B: 比較例1と比較し、樹脂圧力の増加が50%以上100%未満
C: 比較例1と比較し、樹脂圧力の増加が100%以上
(Formability)
The resin pressure at the time of molding was confirmed by the pressure gauge of the extruder and evaluated according to the following criteria.
A: Increase in resin pressure is 0% or more and less than 50% in comparison with Comparative Example 1 B: Comparison with Comparative Example 1 is 50% or more and less than 100% in C: Comparison with Comparative Example 1 and resin 100% or more increase in pressure
[比較例1]
 イミノエーテル(1)を添加しないこと以外は、実施例1と同様に試験片を作製し、評価した。
Comparative Example 1
Test pieces were prepared and evaluated in the same manner as in Example 1 except that the iminoether (1) was not added.
[実施例2~8、比較例5]
 イミノエーテル(1)に代えて表1に記載の化合物を添加した以外は実施例1と同様にして試験片を作製し、評価した。
[Examples 2 to 8, Comparative Example 5]
Test pieces were prepared and evaluated in the same manner as in Example 1 except that the compounds described in Table 1 were added instead of the iminoether (1).
[実施例9]
 ナイロン6(ユニチカ社製、A1030BRL、融点225℃)をナイロン66(宇部興産社製、UBEナイロン(登録商標)2020B、融点265℃)に変更し、混練温度及び射出成形温度を290℃に変更した以外は実施例1と同様に試験片を作製し、評価した。
[Example 9]
The mixing temperature and the injection molding temperature were changed to 290 ° C. by changing nylon 6 (manufactured by Unitika, A1030 BRL, melting point 225 ° C.) to nylon 66 (manufactured by Ube Industries, UBE nylon (registered trademark) 2020 B, melting point 265 ° C.) Test pieces were produced in the same manner as in Example 1 except for the evaluation.
[実施例10]
 ナイロン6(ユニチカ社製、A1030BRL、融点225℃)をナイロン12(宇部興産社製、UBESTA(登録商標)3014B、融点175℃)に変更し、混練温度及び射出成形温度を200℃に変更した以外は実施例1と同様に試験片を作製し、評価した。
[Example 10]
Except that nylon 6 (Unitika manufactured by Unitika, A1030 BRL, melting point 225 ° C.) was changed to nylon 12 (manufactured by Ube Industries, Inc., UBESTA (registered trademark) 3014 B, melting point 175 ° C.) and kneading temperature and injection molding temperature were changed to 200 ° C. A test piece was produced and evaluated in the same manner as in Example 1.
[実施例11~15]
 イミノエーテル(1)の添加量をそれぞれ表1に記載の通りに変更した以外は、実施例1と同様にして試験片を作製し、評価した。
[Examples 11 to 15]
Test pieces were prepared and evaluated in the same manner as in Example 1 except that the addition amount of the iminoether (1) was changed as described in Table 1, respectively.
[比較例2]
 イミノエーテル(1)に代えてStabaxol(登録商標) P400(ラインケミー社製)を添加した以外は実施例1と同様にして試験片を作製し、評価した。
Comparative Example 2
Test pieces were prepared and evaluated in the same manner as in Example 1 except that Stabaxol (registered trademark) P400 (manufactured by Line Chemie Co., Ltd.) was added instead of the iminoether (1).
[比較例3]
 イミノエーテル(1)に代えて下記合成例10で合成した下記構造を有するテトラメチレンビスオキサゾリン(TMBO)を添加した以外は実施例1と同様にして試験片を作製し、評価した。
Comparative Example 3
Test pieces were prepared and evaluated in the same manner as in Example 1 except that tetramethylenebisoxazoline (TMBO) having the following structure synthesized in the following Synthesis Example 10 was added instead of the iminoether (1) and added.
Figure JPOXMLDOC01-appb-C000044

 
Figure JPOXMLDOC01-appb-C000044

 
[合成例10]
<TMBOの合成>
Synthesis Example 10
<Composition of TMBO>
Figure JPOXMLDOC01-appb-C000045

 
Figure JPOXMLDOC01-appb-C000045

 
 5Lフラスコに、アジピン酸ジエチル500g(2.47mol)、エタノールアミン1500g(9.9mol)を仕込み、170℃で1時間攪拌しながら、生成するエタノールを留去した。室温に冷却後、ベンゼンとメタノールを加えて再結晶し、ろ過することで中間生成物TMBO-1 471g(収率82%)を得た。得られた化合物はH-NMRにて同定した。 In a 5-L flask, 500 g (2.47 mol) of diethyl adipate and 1500 g (9.9 mol) of ethanolamine were charged, and ethanol generated was distilled off while stirring at 170 ° C. for 1 hour. After cooling to room temperature, benzene and methanol were added for recrystallization, and filtration was performed to obtain 471 g (yield 82%) of an intermediate product TMBO-1. The obtained compound was identified by 1 H-NMR.
 5L三口フラスコに、TMBO-1 185.7g(0.8mol)、クロロホルム1.0Lを仕込み、氷浴下で塩化チオニル238g(2.0mol)を滴下し、室温下で2時間攪拌した。減圧下で過剰の塩化チオニルを留去した後、メタノール1.0Lを加え、ナトリウムメチラート28質量%メタノール溶液(商品名:SM-28) 771.7g(4.0mol)をゆっくり滴下し、室温下で2時間、40℃で30時間攪拌した。室温に冷却してろ過し、減圧下で溶媒を留去した後、酢酸エチル1.0Lを加え、ろ過した後、減圧下で酢酸エチルを留去した。得られたオイル状の化合物を128℃、133.3Pa(1Torr)で蒸留精製することで、TMBO 118g(収率75%)を得た。得られた化合物はH-NMRにて同定した。 185.7 g (0.8 mol) of TMBO-1 and 1.0 L of chloroform were charged into a 5 L three-necked flask, and 238 g (2.0 mol) of thionyl chloride was added dropwise under an ice bath, and the mixture was stirred at room temperature for 2 hours. After excess thionyl chloride is distilled off under reduced pressure, 1.0 L of methanol is added, and 771.7 g (4.0 mol) of a sodium methylate 28% by mass methanol solution (trade name: SM-28) is slowly added dropwise to obtain a room temperature The mixture was stirred at 40 ° C. for 30 hours under 2 hours. The reaction solution was cooled to room temperature, filtered, and the solvent was evaporated under reduced pressure. Then, 1.0 L of ethyl acetate was added, and after filtering, ethyl acetate was evaporated under reduced pressure. The obtained oily compound was distilled and purified at 128 ° C. and 133.3 Pa (1 Torr) to obtain 118 g (75% yield) of TMBO. The obtained compound was identified by 1 H-NMR.
[比較例4]
 イミノエーテル(1)に代えてエポクロス(登録商標)RPS(オキサゾリン基含有反応性ポリスチレン、日本触媒社製)を添加した以外は実施例1と同様にして試験片を作製し、評価した。
Comparative Example 4
Test pieces were prepared and evaluated in the same manner as in Example 1 except that Epocross (registered trademark) RPS (an oxazoline group-containing reactive polystyrene, manufactured by Nippon Shokubai Co., Ltd.) was added instead of the iminoether (1).
 実施例及び比較例で用いた樹脂及び封止剤と評価結果を下記表1に示す。なお、表1において、封止剤の添加量は、樹脂100質量部に対する添加量である。 The resins and sealants used in Examples and Comparative Examples and the evaluation results are shown in Table 1 below. In addition, in Table 1, the addition amount of a sealing agent is an addition amount with respect to 100 mass parts of resin.
Figure JPOXMLDOC01-appb-T000046

 
Figure JPOXMLDOC01-appb-T000046

 
 上記表1より、封止剤として本開示に係る鎖状イミノエーテル基含有化合物を添加した各実施例のポリアミド樹脂組成物は、成形時のガスの発生を抑制でき、樹脂圧力の上昇が抑制され、成形性に優れていた。また、得られたポリアミド樹脂成形体(試験片)は、耐湿熱性に優れ、且つ、樹脂中の揮散成分の含有量が少なかった。
 比較例5では環状イミノエーテル(7)の反応性が低いため、成形体の耐加水分解性が劣り、一部は反応して高分子量化して増粘したことで成形性が低下したと考えられる。
From the above Table 1, the polyamide resin compositions of the respective examples to which the chain iminoether group-containing compound according to the present disclosure is added as a sealing agent can suppress the generation of gas at the time of molding, and the increase in resin pressure is suppressed. , Was excellent in moldability. Moreover, the obtained polyamide resin molded product (test piece) was excellent in moist heat resistance, and the content of the volatilization component in the resin was small.
In Comparative Example 5, since the reactivity of the cyclic iminoether (7) is low, the hydrolysis resistance of the molded product is inferior, and it is considered that the moldability is lowered by the partial reaction, high molecular weight formation and thickening. .
 2014年12月26日に出願された日本特許出願2014-265716の開示はその全体が参照により本明細書に取り込まれる。
 本明細書に記載された全ての文献、特許、特許出願、および技術規格は、個々の文献、特許、特許出願、および技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書中に参照により取り込まれる。
The disclosure of Japanese Patent Application 2014-265716, filed December 26, 2014, is incorporated herein by reference in its entirety.
All documents, patents, patent applications, and technical standards described herein are specifically and individually indicated that each individual document, patent, patent application, and technical standard is incorporated by reference. To the same extent, incorporated herein by reference.

Claims (8)

  1.  ポリアミドと、下記一般式(1)で表されるイミノエーテル化合物及び一般式(1)で表されるイミノエーテル化合物の多量体から選ばれる少なくとも1種の鎖状イミノエーテル基含有化合物と、を含むポリアミド樹脂組成物。
    Figure JPOXMLDOC01-appb-C000001

     
     一般式(1)中、Rは置換基を有してもよいアルキル基、置換基を有してもよいアリール基又は置換基を有してもよいアルコキシ基を表し、Rは下記一般式(2)で表されるアルキル基又は下記一般式(3)で表されるアリール基を表し、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。
    Figure JPOXMLDOC01-appb-C000002

     
     一般式(2)中、R31、R32及びR33はそれぞれ独立に水素原子又は置換基を表す。R31、R32及びR33は互いに連結して環を形成してもよい。一般式(3)中、R41は置換基を表し、nは0~5の整数を表す。R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。一般式(2)及び(3)において*は、窒素原子と結合する位置を表す。
    A polyamide, and at least one chained iminoether group-containing compound selected from an iminoether compound represented by the following general formula (1) and a multimer of the iminoether compound represented by the general formula (1) Polyamide resin composition.
    Figure JPOXMLDOC01-appb-C000001


    In the general formula (1), R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent, and R 3 represents R 11 represents an alkyl group represented by Formula (2) or an aryl group represented by the following General Formula (3), and R 11 , R 12 and R 13 each independently represent a hydrogen atom or an alkyl which may have a substituent Represents an aryl group which may have a group or a substituent.
    Figure JPOXMLDOC01-appb-C000002


    In formula (2), R 31 , R 32 and R 33 each independently represent a hydrogen atom or a substituent. R 31 , R 32 and R 33 may be linked to each other to form a ring. In Formula (3), R 41 represents a substituent, and n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring. In the general formulas (2) and (3), * represents a position to be bonded to a nitrogen atom.
  2.  前記一般式(1)におけるRが前記一般式(3)で表されるアリール基である請求項1に記載のポリアミド樹脂組成物。 The polyamide resin composition according to claim 1 R 3 is an aryl group represented by the general formula (3) in the general formula (1).
  3.  前記一般式(1)で表されるイミノエーテル化合物が、下記一般式(5)で表される鎖状イミノエーテル基含有化合物である請求項1又は請求項2に記載のポリアミド樹脂組成物。
    Figure JPOXMLDOC01-appb-C000003

     
     一般式(5)中、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。R21は置換基を表し、mは0~5の整数を表し、R21が複数存在する場合、複数のR21は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。R41は置換基を表し、nは0~5の整数を表し、R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。
    The polyamide resin composition according to claim 1 or 2, wherein the iminoether compound represented by the general formula (1) is a chain iminoether group-containing compound represented by the following general formula (5).
    Figure JPOXMLDOC01-appb-C000003


    In formula (5), R 11 , R 12 and R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. R 21 represents a substituent, m represents an integer of 0 to 5, when R 21 there are a plurality, even more R 21 is the same as each other or different, a ring together You may form. R 41 represents a substituent, n represents an integer of 0 to 5, when R 41 there are a plurality, even more R 41 is the same as each other or different, a ring together You may form.
  4.  前記一般式(1)で表されるイミノエーテル化合物の多量体が、下記一般式(6)で表される鎖状イミノエーテル基含有化合物である請求項1~請求項3のいずれか1項に記載のポリアミド樹脂組成物。
    Figure JPOXMLDOC01-appb-C000004

     
     一般式(6)中、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。R41は置換基を表し、nは0~5の整数を表す。R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。pは2~4の整数を表し、Lは、炭素原子との結合末端が、置換基を有してもよいアルキレン部、置換基を有してもよいアリーレン部又は置換基を有してもよいアルコキシレン部であるp価の基を表す。
    4. The compound according to any one of claims 1 to 3, wherein the multimer of the iminoether compound represented by the general formula (1) is a chain iminoether group-containing compound represented by the following general formula (6). The polyamide resin composition as described.
    Figure JPOXMLDOC01-appb-C000004


    In General Formula (6), R 11 , R 12 and R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent. R 41 represents a substituent, and n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring. p represents an integer of 2 to 4, and L 1 has an alkylene moiety which may have a substituent, an arylene moiety which may have a substituent, or a substituent at the end of bonding to a carbon atom It also represents a p-valent group which is a good alkoxylene moiety.
  5.  前記一般式(1)で表されるイミノエーテル化合物の多量体が、下記一般式(7)で表される鎖状イミノエーテル基含有化合物である請求項1~請求項3のいずれか1項に記載のポリアミド樹脂組成物。
    Figure JPOXMLDOC01-appb-C000005

     
     一般式(7)中、Rは置換基を有してもよいアルキル基、置換基を有してもよいアリール基又は置換基を有してもよいアルコキシ基を表し、R11、R12及びR13はそれぞれ独立に水素原子、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基を表す。pは2~4の整数を表し、Lは、窒素原子との結合末端が、置換基を有してもよいアリーレン部又は置換基を有してもよいシクロアルキレン部であるp価の基を表す。
    The multimer of the iminoether compound represented by the general formula (1) is a chain iminoether group-containing compound represented by the following general formula (7) The polyamide resin composition as described.
    Figure JPOXMLDOC01-appb-C000005


    In the general formula (7), R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent, and R 11 and R 12 And R 13 each independently represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. p represents an integer of 2 to 4, and p represents a p-valent group in which L 2 is a arylene moiety which may have a substituent or a cycloalkylene moiety which may have a substituent. Represents
  6.  前記一般式(1)で表されるイミノエーテル化合物の多量体が、下記一般式(8)で表される鎖状イミノエーテル基含有化合物である請求項1~請求項3のいずれか1項に記載のポリアミド樹脂組成物。
    Figure JPOXMLDOC01-appb-C000006

     
     一般式(8)中、Rは置換基を有してもよいアルキル基、置換基を有してもよいアリール基又は置換基を有してもよいアルコキシ基を表し、R41は置換基を表し、nは0~5の整数を表す。R41が複数存在する場合、複数のR41は互いに同じであっても、異なっていてもよく、互いに連結して環を形成してもよい。pは2~4の整数を表し、Lは、酸素原子との結合末端が、アルキレン部であるp価の基を表す。Lのアルキレン部は、水素原子の一部又は全部が、置換基を有してもよいアルキル基又は置換基を有してもよいアリール基で置換されていてもよい。
    4. The compound according to any one of claims 1 to 3, wherein the multimer of the iminoether compound represented by the general formula (1) is a chain iminoether group-containing compound represented by the following general formula (8). The polyamide resin composition as described.
    Figure JPOXMLDOC01-appb-C000006


    In general formula (8), R 2 represents an alkyl group which may have a substituent, an aryl group which may have a substituent, or an alkoxy group which may have a substituent, and R 41 represents a substituent And n represents an integer of 0 to 5. If R 41 there are a plurality, even more R 41 is the same as each other or different, may form a ring. p represents an integer of 2 to 4, and L 3 represents a p-valent group in which the bonding end with the oxygen atom is an alkylene part. In the alkylene moiety of L 3 , part or all of the hydrogen atoms may be substituted with an alkyl group which may have a substituent or an aryl group which may have a substituent.
  7.  前記ポリアミド100質量部に対して、前記鎖状イミノエーテル基含有化合物を0.1~2.0質量部含む請求項1~請求項6のいずれか1項に記載のポリアミド樹脂組成物。 The polyamide resin composition according to any one of claims 1 to 6, which comprises 0.1 to 2.0 parts by mass of the linear iminoether group-containing compound with respect to 100 parts by mass of the polyamide.
  8.  請求項1~請求項7のいずれか1項に記載のポリアミド樹脂組成物を用いて成形されたポリアミド樹脂成形体。 A polyamide resin molding molded using the polyamide resin composition according to any one of claims 1 to 7.
PCT/JP2015/085726 2014-12-26 2015-12-21 Polyamide resin composition, and polyamide resin molded article WO2016104455A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06220005A (en) * 1992-07-30 1994-08-09 Sandoz Ag New imino ether
JP2007505982A (en) * 2003-09-22 2007-03-15 ディーエスエム アイピー アセッツ ビー.ブイ. Method for preparing polymer composition
WO2013141376A1 (en) * 2012-03-23 2013-09-26 富士フイルム株式会社 Protectant, method for producing compound protected by protectant, resin protected by protectant, photosensitive resin composition containing resin protected by protectant, pattern-forming material, photosensitive film, cured relief pattern, method for producing same, and semiconductor device
JP2015212350A (en) * 2013-12-09 2015-11-26 富士フイルム株式会社 Iminoether compound, polyester resin composition, method of producing carboxylate ester, polyester film, back sheet for solar battery module and solar battery module

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06220005A (en) * 1992-07-30 1994-08-09 Sandoz Ag New imino ether
JP2007505982A (en) * 2003-09-22 2007-03-15 ディーエスエム アイピー アセッツ ビー.ブイ. Method for preparing polymer composition
WO2013141376A1 (en) * 2012-03-23 2013-09-26 富士フイルム株式会社 Protectant, method for producing compound protected by protectant, resin protected by protectant, photosensitive resin composition containing resin protected by protectant, pattern-forming material, photosensitive film, cured relief pattern, method for producing same, and semiconductor device
JP2015212350A (en) * 2013-12-09 2015-11-26 富士フイルム株式会社 Iminoether compound, polyester resin composition, method of producing carboxylate ester, polyester film, back sheet for solar battery module and solar battery module

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