WO2016034154A3 - 用于高分子材料表面改性的放电反应器 - Google Patents

用于高分子材料表面改性的放电反应器 Download PDF

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Publication number
WO2016034154A3
WO2016034154A3 PCT/CN2015/093654 CN2015093654W WO2016034154A3 WO 2016034154 A3 WO2016034154 A3 WO 2016034154A3 CN 2015093654 W CN2015093654 W CN 2015093654W WO 2016034154 A3 WO2016034154 A3 WO 2016034154A3
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WO
WIPO (PCT)
Prior art keywords
discharge
macromolecular material
catalyst carriers
surface modification
discharge reactor
Prior art date
Application number
PCT/CN2015/093654
Other languages
English (en)
French (fr)
Other versions
WO2016034154A2 (zh
Inventor
洪昆喨
Original Assignee
苏州鼎德电环保科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 苏州鼎德电环保科技有限公司 filed Critical 苏州鼎德电环保科技有限公司
Publication of WO2016034154A2 publication Critical patent/WO2016034154A2/zh
Publication of WO2016034154A3 publication Critical patent/WO2016034154A3/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor

Abstract

一种用于高分子材料表面改性的放电反应器，该放电反应器包括有四个调节螺杆（2）、两个板状的放电部件（1），调节螺杆（2）穿置并固定于放电部件（1）的四个端部，每一放电部件（1）包括一个具有凹槽（110）的绝缘壳体（11）、一个均布有放电针的PCB放电板（12）和一个触媒载体（13），PCB放电板（12）设置于凹槽（110）内，触媒载体（13）嵌置于凹槽（110）的口部并且通过阻燃剂环氧树脂灌封，触媒载体（13）平行并且相对设置，放电针用于激发触媒载体（13）放电，以使得触媒载体（13）之间形成轰击高分子材料表面的离子。
PCT/CN2015/093654 2014-09-04 2015-11-03 用于高分子材料表面改性的放电反应器 WO2016034154A2 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201410448730.8A CN105457579B (zh) 2014-09-04 2014-09-04 高分子材料表面改性放电反应器
CN201410448730.8 2014-09-04

Publications (2)

Publication Number Publication Date
WO2016034154A2 WO2016034154A2 (zh) 2016-03-10
WO2016034154A3 true WO2016034154A3 (zh) 2016-04-28

Family

ID=55440448

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2015/093654 WO2016034154A2 (zh) 2014-09-04 2015-11-03 用于高分子材料表面改性的放电反应器

Country Status (3)

Country Link
CN (1) CN105457579B (zh)
TW (1) TWI577719B (zh)
WO (1) WO2016034154A2 (zh)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2405398Y (zh) * 2000-01-26 2000-11-08 朱益民 正高压直流流光放电等离子体源装置
CN200996047Y (zh) * 2006-11-30 2007-12-26 浙江大学 用于聚合物高分子材料表面改性的装置
JP2010110794A (ja) * 2008-11-07 2010-05-20 Toshiba Corp 構造材の表面改質・補修方法及び装置
CN202318981U (zh) * 2011-09-07 2012-07-11 苏州市奥普斯等离子体科技有限公司 一种高分子材料表面改性等离子体处理装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY120869A (en) * 2000-01-26 2005-11-30 Matsushita Electric Ind Co Ltd Plasma treatment apparatus and method
US20020038791A1 (en) * 2000-10-03 2002-04-04 Tomohiro Okumura Plasma processing method and apparatus
CN2682772Y (zh) * 2004-02-26 2005-03-02 中国科学院微电子研究所 均匀大面积常压射频冷等离子体发生器
JP5213150B2 (ja) * 2005-08-12 2013-06-19 国立大学法人東北大学 プラズマ処理装置及びプラズマ処理装置を用いた製品の製造方法
CN101912761B (zh) * 2010-07-05 2014-02-19 洪昆喨 一种均匀电场介电质放电反应器

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2405398Y (zh) * 2000-01-26 2000-11-08 朱益民 正高压直流流光放电等离子体源装置
CN200996047Y (zh) * 2006-11-30 2007-12-26 浙江大学 用于聚合物高分子材料表面改性的装置
JP2010110794A (ja) * 2008-11-07 2010-05-20 Toshiba Corp 構造材の表面改質・補修方法及び装置
CN202318981U (zh) * 2011-09-07 2012-07-11 苏州市奥普斯等离子体科技有限公司 一种高分子材料表面改性等离子体处理装置

Also Published As

Publication number Publication date
WO2016034154A2 (zh) 2016-03-10
CN105457579B (zh) 2019-04-05
TWI577719B (zh) 2017-04-11
TW201609890A (zh) 2016-03-16
CN105457579A (zh) 2016-04-06

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