WO2016031467A1

WO2016031467A1 - Polishing brush

Info

Publication number: WO2016031467A1
Application number: PCT/JP2015/071278
Authority: WO
Inventors: 幸史広田; 堅一小池; 栗原　浩; 伸徳重; 太志柏田
Original assignee: 富士紡ホールディングス株式会社
Priority date: 2014-08-26
Filing date: 2015-07-27
Publication date: 2016-03-03
Also published as: JPWO2016031467A1; CN107000173B; CN107000173A; JP6536839B2

Abstract

This polishing brush (4) has many separate protruding parts (4b) and a support section (4a) on which the protruding parts (4b) are fixed, said protruding parts (4b) and support section (4a) being integrally formed from the same flexible material. Furthermore, side surfaces of the protruding parts (4b) have multiple apertures, the ratio of aperture coverage being 10-70%. Also, the ratio (h/r) between the height (h) of a protruding part and the radius (r) of a circumscribed circle in a cross section of the base part of the protruding part is 1.0-5.0. Consequently, when polishing an object to be polished (1), the side surfaces of the protruding parts are pressed against the object to be polished (1), and the object can be polished by means of a slurry which is held in the apertures formed on the side surfaces of the protruding parts. Not only are the protruding parts (4b) not liable to fall off, but polishing can be carried out with the slurry being securely held in the side surfaces of the protruding parts (4b).

Description

Polishing brush

The present invention relates to an abrasive brush, and more particularly to an abrasive brush composed of a large number of protrusions and a planar support portion that fixes the protrusions.

Conventionally, it is composed of a large number of protrusions and a flat support part that fixes the protrusions in order to polish the curved surface part and the flat part formed at the end of a plate-like object such as glass, metal, and plastic. A polishing brush is used (Patent Document 1).
According to the polishing brush, when the object to be polished is polished, the curved surface portion is polished while the side surfaces of the protrusions are pressed against the object to be polished.

Japanese Patent Laid-Open No. 4-25362

However, since the polishing brush of the above-mentioned patent document 1 has a projection portion implanted in a support portion, the projection portion falls off during polishing, thereby causing uneven polishing, or the object to be polished by the missing projection portion. There was a problem that would be damaged.
In the polishing, the slurry is supplied between the object to be polished and the polishing brush. However, in the case of the polishing brush described in Patent Document 1, the slurry is supplied between the protrusions contacting the object to be polished. However, the protrusion itself has an insufficient function of holding the slurry, and there is a problem that an unpolished portion remains after polishing.
In view of such a problem, the present invention provides a polishing brush that does not drop off the protrusions and that can favorably hold the slurry on the side surfaces of the protrusions.

That is, the present invention provides a polishing brush having a number of spaced projections and a planar support that supports the projections, and the side surfaces of the projections are in pressure contact with an object to be polished. The supporting portion is integrally formed of the same material having flexibility, and the side surface of the protruding portion has a plurality of openings, and the opening ratio of the side surface of the protruding portion is 10 to 70%, Further, the ratio (h / r) of the height (h) of the protrusion and the radius (r) of the circumscribed circle in the cross-sectional shape of the base of the protrusion is in the range of 1.0 to 5.0. This is a polishing brush.
In addition, a silicon measuring jig having a total weight of 5.5 kgf having a substantially square shape with a contact portion with the protrusion of 80 mm in length and 80 mm in width is placed on the top of the protrusion in the vertical direction. Pull the measurement jig in the horizontal direction at a speed of 100 mm / min,
The difference between the maximum value and the minimum value of the resistance force from the protrusion acting on the measurement jig when the measurement jig is pulled in a section of 20 mm to 80 mm is in the range of 0.1 to 0.9 kgf. May be.
In addition, the area of the top surface of each protrusion may be in the range of 0.01 to 1.0 cm ² , and the height (h) of the protrusion may be in the range of 3 to 15 mm.
The ratio of the surface area of the surface on the side having the protrusions in the support part and the sum of the cross-sectional areas of the bases of all the protrusions is the surface area 100 cm ² of the surface on the side having the protrusions in the support part. The total cross-sectional area of the base of the protrusion may be in the range of 30 to 75 cm ² .
The support portion may be deformable so as to follow the surface of a non-planar fixed base that is driven relatively while being pressed against the object to be polished, and is opposite to the protrusion portion of the support portion. A cushioning material having elasticity may be provided on the surface.

According to the present invention, since the support portion and the projection portion are integrally formed, the projection portion does not fall off from the support portion when the workpiece is polished, and the workpiece is damaged. Can be prevented.
The protrusion has flexibility, and the ratio (h / r) between the height (h) of the protrusion and the radius (r) of the circumscribed circle in the cross-sectional shape of the base of the protrusion is 1.0. Since it is in the range of ˜5.0, when the side surface of the protrusion is pressed against the object to be polished, it can be deformed following the shape of the curved surface portion.
Since the opening is formed on the side surface of the projection with an opening rate of 10 to 70%, when the side surface of the projection contacts the object to be polished, the slurry is formed by the formed hole. It can hold | maintain and it can grind | polish, without polishing the curved surface part of a to-be-polished object.

Schematic of the double-side polish apparatus provided with the polishing brush concerning a present Example. Sectional drawing of an abrasive brush. The front view of an abrasive brush. Sectional drawing which showed the state which grind | polishes a to-be-polished object with a polishing brush. The figure explaining the measuring apparatus for measuring the difference of the maximum value of resistance force from a projection part, and a minimum value. Sectional drawing about Examples 9-11.

1 is a schematic diagram of a double-side polishing apparatus 2 that polishes an object 1 to be polished. The double-side polishing apparatus 2 has a pair of polishing surface plates and is located on an upper polishing constant. A polishing brush 4 fixed to the polishing surface side of the disk 5, a polishing pad 7 fixed to the polishing surface side of the lower polishing surface plate 3 positioned below, and a carrier 8 for holding the workpiece 1. I have. In the double-side polishing apparatus 2, a plurality of objects to be polished 1 are installed between the polishing brush 4 and the polishing pad 7, which are respectively installed on the polishing surface side of the opposing polishing surface plate. A slurry supply means (not shown) for supplying the slurry is provided.
The top surface of the workpiece 1 has a substantially rectangular shape, and as shown in FIG. 4, a flat surface facing the lower polishing surface plate 3 side, and the opposite surface of the upper polishing surface plate 5 side. And a curved surface portion 1b formed on the outer peripheral edge of the flat surface portion 1a.
The curved surface portion 1b is processed in advance in a chamfering device (not shown), and the double-side polishing device 2 of this embodiment uses the polishing brush 4 provided on the upper polishing surface plate 5 to connect the flat surface portion 1a and the curved surface portion 1b. In addition, polishing is performed to a required surface roughness.
In addition, as said to-be-polished object 1, glass, a metal, and a plastic may be sufficient, and it may be comprised only by the curved surface part 1b, without the plane part 1a.

The lower polishing surface plate 3 has a substantially disk shape, and a polishing pad 7 having substantially the same diameter as the polishing surface plate 3 is fixed to the upper surface thereof by a method such as adhesion, and further, the upper surface of the polishing pad 7 is The object to be polished 1 is placed at a predetermined interval by the carrier 8, and the bottom surface of the object to be polished 1 is in contact with the polishing pad 7.
The upper polishing surface plate 5 has a disk shape having substantially the same diameter as the lower polishing surface plate 3, and the polishing surface having substantially the same diameter as the upper polishing surface plate 5 is formed on the bottom surface of the upper polishing surface plate 5. The brush 4 is fixed by a method such as adhesion.
The lower polishing platen 3 and the upper polishing platen 5 are rotated in opposite directions by driving means (not shown), whereby the object to be polished 1 and the polishing brush 4 are relatively moved. It is designed to be rotated.
Further, when the polishing process is performed, a required pressing force acts on the upper polishing platen 5 from the upper side to the lower side, and the polishing brush 4 of the upper polishing platen 5 is pressed against the workpiece 1 by the pressing force. Polishing is performed in the state of being.
The slurry supply means (not shown) supplies the slurry between the lower polishing surface plate 3 and the upper polishing surface plate 5, and the slurry is the object to be polished 1 and the required processing accuracy. A conventionally well-known thing can be used.

The polishing brush 4 according to the present invention includes a disc-shaped support portion 4a held on the upper polishing surface plate 5, a number of spaced protrusion portions 4b provided on the support portion 4a, and protrusions of the support portion 4a. It is comprised from the cushion material 6 distribute | arranged to the part 4b and the opposite surface side.
The polishing brush 4 of this example is one in which the support portion 4a and the protrusion 4b are integrally formed of the same material having flexibility, and specifically manufactured by the manufacturing method shown below. A material made of polyurethane-impregnated nonwoven fabric or polyurethane foam is used.

When the said raw material is made from a polyurethane impregnation nonwoven fabric, it can manufacture, for example using the following manufacturing methods.
That is, a polishing brush precursor sheet can be obtained through a step of wet coagulating a thermoplastic polyurethane resin impregnated in a non-woven fabric substrate and a step of buffing both surfaces of the wet coagulated fiber assembly. Such an abrasive brush precursor sheet has a structure in which a gap is formed between the fibers of the nonwoven fabric base and a resin adheres so as to cover the fibers.

On the other hand, when the said raw material is made from a polyurethane foam, it can manufacture using the following manufacturing methods, for example.
That is, polyisocyanate compound, polyol compound, curing agent, foaming agent, catalyst, preparatory step for preparing nonreactive gas for each component, mixing each component and nonreactive gas for each component Mixing step for obtaining a foam molding liquid mixture, foam molding step for molding a polyurethane resin foam from the foam molding liquid mixture, and slicing the polyurethane resin foam to a thickness required for the polishing brush 4 A polishing brush precursor sheet can be obtained through each step of the slicing step.

The abrasive brush precursor sheet manufactured by the above manufacturing method Japanese Industrial Standards (JIS L 1021) initial load 100 g / cm ² defined by ~ compression ratio 2.0 when the compressive load 1120 g / cm ² 7 A range of 0.0% is preferred. However, the measurement is performed with an initial load of 300 g / cm ² and a compressive load of 1800 g / cm ² only when the polishing brush precursor sheet uses polyurethane foam. When the compression ratio is in the above-described range, the material itself has sufficient flexibility, so that it is easy to obtain the polishing brush 4 having a good polishing rate and hardly generating an unpolished portion.

The polishing brush 4 made of the polishing brush precursor sheet manufactured by the above manufacturing method has a plurality of apertures, and the aperture ratio on the side surface of the protrusion 4b is in the range of 10 to 70%. A range of 20 to 50% is more preferable.
When the aperture ratio is less than 10%, the slurry cannot be sufficiently retained on the side surface of the protruding portion 4b, and the stiffness (elasticity) of the protruding portion 4b is increased and the followability to the curved surface is lowered. For this reason, when many unpolished portions occur in the curved surface portion and the open area ratio exceeds 70%, the protrusion 4b tends to be worn, and the product life tends to be shortened.
As a method for measuring the aperture ratio, first, the protrusion 4b is collected from the polishing brush 4, and a range of about 1.3 mm square on the side surface of the protrusion 4b with a microscope (VH-6300, manufactured by KEYENCE) is 100 times. Magnified and observed.
The resulting image was then binarized using image processing software (Image Analyzer V20LAB Ver. 1.3, manufactured by Nikon) to confirm the number of apertures and the area of each aperture. The area ratio of the opening in the range of 1.3 mm square from the sum of the above was calculated as the opening ratio (%). The measurement was performed at five randomly selected locations, and the arithmetic average was defined as the open area ratio (%) according to this example.

The protrusions 4b formed on the polishing brush 4 are each formed in a columnar shape as shown in FIG. 2, and the shape on the top surface of the protrusion 4b is a square as shown in FIG. The top surface shape may be a polygon such as a triangle or a circle. Further, the protrusion 4b may have a cone shape or a frustum shape, and the upper portion of the protrusion 4b as shown in FIG. 6 is chamfered, or the cross-sectional shape of the protrusion 4b is tapered toward the tip. For example, the tip of the protrusion 4b may be made thinner than the base. Thereby, the followability to a curved surface can be improved.
In order to form such a protrusion 4b, a polyurethane-impregnated nonwoven fabric or a foamed polyurethane sheet is manufactured in advance based on the above manufacturing method, and the surface of the plate-like sheet is subjected to groove processing such as a lattice shape, The protrusion 4b can be formed between the formed grooves.

The height (h) of the projection 4b formed in this way is preferably in the range of 3 to 15 mm.
If the height (h) of the protruding portion 4b is 3 mm or more, the height (h) of the protruding portion 4b is sufficient, so that the followability is easily excellent. Conversely, if the height (h) is 15 mm or less, the height of the protruding portion 4b Due to the fact that (h) is too high, the protrusion 4b is easily bent, resulting in a decrease in followability to a curved surface.

The area preferably in the range of 0.01 ~ 1.0 cm ² at the top surface of the protrusions 4b, and more preferably is 0.04 ~ 0.64 cm ^2, more preferably 0.09 ~ 0.25 cm ^2.
When the area of the top surface of each protrusion 4b is 0.01 cm ² or more, wear on the top surface of the protrusion 4b is suppressed, so that durability is excellent, and conversely, the area of the top surface is 1.0 cm ² or less. Therefore, it is easy to secure the area of the side surface that contributes to the polishing of the curved surface, and the generation of the unpolished portion of the curved surface can be suppressed.

Further, the separation width between the protrusions 4b is preferably in the range of 1 to 3 mm.
When the separation width is 1 mm or more, the protrusion 4b easily falls down and has excellent followability to the object to be polished 1. On the contrary, when the separation width is 3 mm or less, the protrusion 4b that contacts the object 1 without being too wide. Therefore, the polishing process can be efficiently performed.
Further, the ratio of the surface area of the support portion 4a on the side having the protrusions 4b and the sum of the cross-sectional areas of all the protrusion portions 4b to the surface area of the support portion 4a on the side having the protrusion portions 4b is 100 cm ² . contrast, it is desirable that the total cross-sectional area of the projections 4b has a range of 30 ~ 75 cm ^2, more desirably 30 ~ 55cm ^2, more desirably 30 ~ 50 cm ^2.

The ratio (h / r) between the height (h) of the protrusion 4b and the radius (r) of the circumscribed circle in the cross-sectional shape of the base of the protrusion 4b is preferably 1.0 to 5.0. 0 to 5.0 is more desirable, and 3.0 to 4.5 is even more desirable.
If the ratio (h / r) is less than 1.0, the followability to the curved surface shape 1b by the protrusion 4b becomes poor, and an unpolished portion is generated. On the contrary, the ratio (h / r) is 5.0. If it becomes larger, the protrusion 4b tends to bend, the followability becomes worse with time, and an unpolished part is generated, or the force applied to the object 1 from the polishing brush is dispersed and applied to the object 1 This is undesirable because the stress is reduced, resulting in a reduction in the polishing rate.
Note that the circumscribed circle in the cross-sectional shape of the base portion of the protrusion 4b in this case refers to a circle circumscribing all the vertices if the cross section is a regular polygon, and is a polygonal shape in which the length and inner angle of each side are not uniform. If there is, a circle that is in contact with at least three vertices including all the cross-sectional shapes is defined as a circumscribed circle. In addition, when the cross section is an ellipse, the circle is in contact with the long side of the ellipse. When the cross section is a circle, the circle itself is a circumscribed circle.

Then, a measuring jig 11 as shown in FIG. 5 is placed on the top of the projecting portion 4b facing in the vertical direction, and the measuring jig 11 is further pulled in the horizontal direction. The difference between the maximum value and the minimum value of the resistance force from the protrusion 4b is preferably in the range of 0.1 to 0.9 kgf.
More specifically, in order to determine the difference between the maximum value and the minimum value of the resistance force from the protrusion 4b, the protrusion 4b in the polishing brush 4 is defined after the polishing brush 4 is immersed in water for 15 minutes. The opposite surface is stuck on the measurement surface plate via a double-sided tape so that the top surface of the protrusion 4b faces upward.
The measurement jig 11 has an approximately 80 mm long, 80 mm wide, 10 mm thick stainless steel plate 11 b bonded and fixed to the upper surface of a substantially square silicon wafer 11 a having a length of 80 mm, a width of 80 mm, and a thickness of 0.7 mm. Further, the weight 11c is provided on the upper portion of the stainless steel plate 11b, and the total weight of the measuring jig 11 is set to 5.5 kgf. The measuring jig 11 has other configurations as long as the contact portion 11d with the projection 4b is made of silicon and has the above shape, and the total weight is 5.5 kgf. May be.
With such a configuration, when the measurement jig 11 is placed on the upper surface of the polishing pad 4 (for example, diameter 640 mm) sufficiently wider than the measurement jig 11, the silicon wafer 11a on the lower surface side has a plurality of protrusions 4b. It comes in contact with the top surface of.
The measuring jig 11 is pulled 80 mm in the horizontal direction at a speed of 100 mm / min by a tensile testing machine 12 (for example, A & D Corporation, Tensilon Universal Material Testing Machine, RTC-1210A).
The tensile testing machine 12 pulls the measurement jig 11 so that the protrusion acting on the measurement jig 11 at the contact portion between the contact portion 11 d of the measurement jig 11 and the top of the protrusion 4 b of the polishing pad 4. The stress from the part 4b is measured to create a stress-movement distance curve, and the maximum and minimum values of the stress in the section in which the measuring jig 11 has moved from 20 mm to 80 mm are measured.
And while repeating the said measurement 5 times, let the average of the difference of the measured maximum value of stress and the minimum value be the difference of the maximum value of resistance force from the said projection part 4b concerning this invention, and minimum value.

The difference between the maximum value and the minimum value of the resistance force by the protrusion 4b measured based on the above conditions is preferably 0.1 to 0.9 kgf, and more preferably 0.2 to 0.8 kgf.
If the difference between the maximum value and the minimum value of the resistance force is 0.1 kgf or more, the workpiece 1 will collide with the protrusion 4b, the protrusion 4b will fall, and the resistance will pass until it passes over the protrusion 4b. There is enough difference in power. In this case, since the protrusion 4b has sufficient stiffness, a decrease in the polishing rate can be suppressed.
On the other hand, if the difference between the maximum value and the minimum value of the resistance force is 0.9 kgf or less, the resistance force from when the workpiece 1 collides with the protrusion 4b until it passes over the protrusion 4b. The fluctuation is not too great. Therefore, since the protrusion 4b easily falls down due to a stress near the polishing pressure, the followability of the object to be polished 1 is excellent, and generation of an unpolished portion can be suppressed.

According to the polishing brush 4 having the above configuration, the workpiece 1 having the curved surface portion 1b can be polished well as described above.
By operating the double-side polishing apparatus 2 and rotating the workpiece 1 following the lower polishing surface plate 3, and rotating the polishing brush 4 by the upper polishing surface plate 5 in the direction opposite to the rotation, The workpiece 1 and the polishing brush 4 are relatively rotated.
At this time, the height of the upper polishing surface plate 5 is adjusted so that the tip of the protrusion 4b of the polishing brush 4 is in contact with the surface of the polishing pad 7 or lower than that. ing.
As the workpiece 1 and the polishing brush 4 rotate relative to each other, the projection 4b comes into contact with the workpiece 1 as shown in FIG. 4, and at this time, the side surface of the projection 4b is the workpiece. 1 curved surface portion 1b, and then the protrusion 4b bends following the shape of the object 1 to be polished.
As a result, polishing is performed while the side surface of the projection 4b is pressed against the curved surface portion 1b, and the projection 4b bends following the shape of the workpiece 1 so that the flat portion 1a is also projected. It is polished by the side surface of 4b.

While the workpiece 1 is being polished in this way, the protrusion 4b repeats deformation in accordance with the shape of the workpiece 1, but these protrusions 4b are formed integrally with the support 4a. Therefore, the projection 4b does not fall off the support 4a, and the workpiece 1 is not damaged by the dropped projection 4b.
Further, by bonding the cushioning material 6 having elasticity to the upper polishing platen 5 side of the support portion 4a, the contact with the workpiece 1 by the polishing brush 4 can be weakened, and the polishing brush 4 product life can be extended.
The material of the cushion material 6 is not particularly limited. For example, a resin such as polyethylene, polyurethane, polybutadiene, or silicone, a rubber such as natural rubber, nitrile rubber, or polyurethane rubber, or a nonwoven fabric impregnated with resin may be used. . The foam structure is not particularly limited, and may not have a foam structure.

On the other hand, during the polishing of the workpiece 1, the slurry is supplied between the polishing brush 4 and the workpiece 1 by the slurry supply means (not shown).
Since the polishing brush 4 of the present embodiment is formed of the material having the above-described aperture ratio, a large number of apertures are formed on the side surfaces of the respective projections 4b, and the slurry is excellent due to the apertures. It is possible to hold it.
Therefore, when the side surface of the protrusion 4b comes into contact with the object 1 to be polished, an amount of slurry suitable for polishing is held between the side surface of the protrusion 4b and the object 1 to be polished, and generation of an unpolished part can be suppressed. It is like that.

Conventionally, in order to polish the surface of a semiconductor substrate or the like, a polishing pad having a lattice-like groove formed on the surface is used (for example, JP-A-10-315119). This is intended for polishing and is not suitable for polishing a curved portion as in this embodiment.
That is, the grooves in these polishing pads are provided for supplying and discharging the slurry, and the surface of the convex portion formed between the grooves is maintained in contact with the surface of the substrate. Since the polishing is performed so as to transfer the flatness of the polishing pad to the surface of the substrate, the groove is not deeply formed, and the protrusion 4b is bent and polished on the side surface of the protrusion 4b as in this embodiment. Is not taken into consideration.

In the above embodiment, the upper polishing platen 5 has a flat surface on which the polishing brush 4 is mounted, but the curvature of the mounting surface of the upper polishing platen 5 is not particularly limited. Even the upper polishing surface plate 5 having a curved mounting surface can be mounted on the polishing brush 4 of this embodiment because the support portion 4a has flexibility.
In that case, for example, even a lens that does not have the flat portion 1a or a three-dimensional object 1 having a height difference can be polished well.
Further, in this embodiment, the object to be polished 1 is placed above the polishing pad 7 and the lower surface side of the object to be polished 1 is also polished, but the polishing pad 7 is not provided on the lower surface side of the object 1 to be polished. The workpiece 1 may be directly fixed, and only the upper surface of the workpiece 1 may be polished on one side with the polishing brush 4.
Further, the polishing apparatus is not limited to the double-side polishing apparatus 2, and the polishing process can be performed by attaching the polishing brush 4 to a non-planar fixed base such as a columnar rotating body.

Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.

(Example 1)
First, a resin solution containing 16 parts by mass of an ester polyurethane resin having a 100% modulus of 3.5 MPa, 1 part by mass of an anionic surfactant, and 83 parts by mass of DMF as a solvent was prepared.
Separately, a sheet-like fiber base material was prepared. The fiber base material was a nonwoven fabric made of polyester fiber having a fineness of 3d and a fiber length of 51 mm, and had a thickness of 12 mm and a basis weight of 1500 g / m ² .
Next, after the fiber base material is immersed in the resin solution, the resin solution is squeezed out using a mangle roller capable of pressurizing between a pair of rollers, and the fiber base material is impregnated with the resin solution substantially uniformly. It was. Next, the polyester base polyurethane resin was coagulated and regenerated by immersing the fiber base material in a coagulating liquid composed of water and DMF at room temperature to obtain an abrasive brush precursor sheet.

Thereafter, the polishing brush precursor sheet was taken out from the coagulation liquid and further immersed in a cleaning liquid made of water to remove DMF, and then dried. After drying, the surface skin layer was removed by slicing to a thickness of 10 mm. At this time, the compression rate of the polishing brush precursor sheet was 2.9%, and the density was 0.28 g / cm ³ .
Next, the obtained polishing brush precursor sheet was cut into a columnar protrusion 4b on one side (height: 9 mm, the shape of the top surface of the protrusion 4b: 4 mm × 4 mm square, separation width between the protrusions 4b. : 3 mm).
Thereafter, a polyethylene foam (thickness: 5 mm, foaming ratio: 15 times) was bonded as a cushioning material 6 to the surface opposite to the protruding portion 4b to obtain a polishing brush 4.

<Polishing test>
Subsequently, an adhesive was applied to the surface opposite to the polishing surface of the polishing brush 4 of Example 1, and the polishing brush 4 was fixed to the upper surface plate side of the double-side polishing machine. A polishing test was conducted, and the protrusion 4b, the polishing rate, and the unpolished portion were evaluated.
(Polishing conditions)
・ Use polishing machine: Speed Fam Co., Ltd., "Model number: DSM9B-5P-IV"
・ Surface plate speed: 40rpm
Processing stress: 450 g / cm ²
・ Abrasive: 10% aqueous solution of cerium oxide slurry ・ Polished object: Glass substrate (65 mm × 65 mm × 10 mm curved end processed) × 10 sheets / batch ・ Polishing time: 20 minutes / batch ・ Lower polishing platen side Polishing pad: Impregnated non-woven polishing pad (FPK-650, manufactured by Fujibow Atago Co., Ltd.)

(Evaluation of protrusions 4b)
The polishing brush 4 after polishing 120 objects to be polished 1 was confirmed, and the presence or absence of the protrusion 4b was evaluated. However, the protrusion 4b was not removed in all the examples and comparative examples. It was not confirmed.

(Polishing rate)
The polishing rate is the amount of polishing per minute expressed by thickness, and was calculated from the polishing amount determined from the weight reduction of the substrate before and after polishing, the polishing area and the specific gravity of the workpiece 1. 120 objects to be polished 1 were polished, and an arithmetic average of each polishing rate was obtained. The results are shown in the table.

(Evaluation of unpolished part)
The part where the wrinkle which is an unpolished part is covering with respect to the polishing brush contact surface side of the to-be-polished object 1 after grinding | polishing was confirmed visually. A case where no wrinkles were confirmed, a case where only a few wrinkles were confirmed, and a quality of all products that could be made into a product. A case where there were too many wrinkles and the object to be polished 1 could not be made into a product. When x was included, it evaluated as x. The evaluation of the unpolished part was performed on the object 1 to be polished which was polished in the second batch, the sixth batch and the tenth batch. The results are shown in the table.

(Example 2)
In Example 2, an isocyanate-containing urethane prepolymer (114 parts by mass) obtained by reacting 2,4-TDI and PTMG having a number average molecular weight of about 1000 as the first component prepolymer was heated to 50 ° C. under reduced pressure. Defoamed. In this prepolymer, the isocyanate content was 7.8%.
The second component is crude MOCA (54 parts by mass), PTMG (54 parts by mass) water (0.5 parts by mass) having a number average molecular weight of about 1000, catalyst (0.3 parts by mass), silicone surfactant ( 0.3 parts by mass) were added and stirred and mixed at 50 ° C., and then degassed under reduced pressure.
These first component: second component were fed into the mixer at a mass ratio of 100: 29. At this time, air was supplied at a flow rate of 30 L / min from a nozzle provided in the stirring rotor of the mixer.
The obtained mixed liquid was poured into a mold (890 mm × 890 mm) and cured, and then the formed polyurethane resin foam was extracted from the mold. This foam was sliced to a thickness of 5 mm to prepare a urethane sheet. At this time, the compression ratio of the urethane sheet was 4.8%, and the density was 0.5 g / cm ³ .
Next, a protrusion 4b (height: 4 mm, shape of the top surface of the protrusion 4b: 3 mm × 3 mm square, separation width between the protrusions 4b: 2 mm) is provided on one side of the obtained ureta sheet by cutting. It was. Next, a polishing brush 4 was prepared by bonding a polyethylene foam (thickness: 5 mm, foaming ratio: 15 times) to the surface opposite to the protruding portion 4 b with an adhesive, and each measurement was performed in the same manner as in Example 1. . The results are shown in Table 1.

(Example 3)
A polishing brush 4 was prepared in the same manner as in Example 1 except that the shape of the top surface of the protrusion 4b was 3 mm × 3 mm and the separation width was 2 mm, and each measurement was performed. The results of each measurement are shown in Table 1.

Example 4
A polishing brush 4 was prepared in the same manner as in Example 1 except that the cushion material 6 was not provided, and each measurement was performed. The results of each measurement are shown in Table 1.

(Example 5)
A polishing brush 4 was produced in the same manner as in Example 1 except that the height of the protrusion 4b was 4 mm, and each measurement was performed. The results of each measurement are shown in Table 1.

(Example 6)
A polishing brush precursor sheet was prepared in the same manner as in Example 1 using the same fiber substrate as in Example 1 except that the thickness was 17 mm. Thereafter, the thickness was set to 15 mm by slicing.
At this time, the compression ratio of the polishing brush precursor sheet was 4.3%, and the density was 0.28 g / cm 3. Next, the obtained polishing brush precursor sheet was cut into one side to projecting portions 4b (height: 14 mm, top surface shape of projecting portions 4b: 4 mm × 4 mm square, separation width between projecting portions 4b: 3 mm ).
Thereafter, a polyethylene foam (thickness: 5 mm, foaming ratio: 15 times) was bonded as a cushioning material 6 to the surface opposite to the protrusion 4b portion with an adhesive to obtain a polishing brush 4. Thereafter, each measurement was performed in the same manner as in Example 1. The results of each measurement are shown in Table 1.

(Example 7)
The measurement was performed in the same manner as in Example 1 except that the basis weight of the nonwoven fabric was changed to 1100 g / m ² and the 100% modulus of the resin was changed to 2.5 MPa. The results of each measurement are shown in Table 2. The compression rate of the polishing brush precursor sheet was 7.0%, and the density was 0.22 g / cm ³ .

(Example 8)
It was produced in the same manner as in Example 1 except that the 100% modulus of the resin was changed to 9 MPa, and each measurement was performed. The results of each measurement are shown in Table 2. The compression ratio of the polishing brush precursor sheet was 2.1%, and the density was 0.30 g / cm ³ .

(Comparative Example 1)
A polishing brush 4 was produced in the same manner as in Example 1 except that the height of the protrusion 4b was 2 mm, and each measurement was performed. The results of each measurement are shown in Table 2.

(Comparative Example 2)
A polishing brush precursor sheet was prepared in the same manner as in Example 1 using the same fiber substrate as in Example 1 except that the thickness was 20 mm. Thereafter, the thickness was set to 18 mm by slicing.
At this time, the compression ratio of the polishing brush precursor sheet was 5.0%, and the density was 0.28 g / cm 3. Next, the obtained polishing brush precursor sheet was cut into one side to projecting portions 4b (height: 17 mm, top surface shape of projecting portions 4b: square of 4 mm × 4 mm, spacing between projecting portions 4b: 3 mm ).
Thereafter, a polyethylene foam (thickness: 5 mm, foaming ratio: 15 times) was bonded as a cushioning material 6 to the surface opposite to the protrusion 4b portion with an adhesive to obtain a polishing brush 4. Thereafter, each measurement was performed in the same manner as in Example 1. The results of each measurement are shown in Table 2.

(Comparative Example 3)
First, a resin solution containing 20 parts by mass of an ester polyurethane resin having a 100% modulus of 14 MPa, 1 part by mass of a resin additive, and 83 parts by mass of DMF as a solvent was prepared.
Separately, a sheet-like fiber base material was prepared. The fiber base material was a nonwoven fabric in which the fiber material was PET, the thickness was 15 mm, the fiber fineness was 3d, and the basis weight was 1500 g / m ² .
Next, after the fiber base material is immersed in the resin solution, the resin solution is squeezed out using a mangle roller capable of pressurizing between a pair of rollers, and the fiber base material is impregnated with the resin solution substantially uniformly. It was. Next, the ester base polyurethane resin was coagulated and regenerated by immersing the fiber base material in a coagulating liquid composed of water and DMF at room temperature to obtain a polishing brush sheet.

Thereafter, the polishing brush precursor sheet was taken out from the coagulation liquid and further immersed in a cleaning liquid made of water to remove DMF, and then dried. After drying, the precursor sheet was hot-pressed at 150 ° to compress the thickness to 10 mm. At this time, the compression rate of the polishing brush precursor sheet was 1.5%, and the density was 0.48 g / cm ³ .
Next, the obtained polishing brush precursor sheet was cut into one side to projecting portions 4b (height: 9 mm, top surface shape of projecting portions 4b: square of 4 mm × 4 mm, spacing between projecting portions 4b: 3 mm ). Thereafter, a polyethylene foam (thickness: 5 mm, foaming ratio: 15 times) was bonded as a cushioning material 6 to the surface opposite to the protruding portion 4b to obtain a polishing brush 4.

Example 9
First, a resin solution containing 18 parts by mass of an ester polyurethane resin having a 100% modulus of 9 MPa, 1 part by mass of an anionic surfactant, and 81 parts by mass of DMF as a solvent was prepared.
Separately, a sheet-like fiber base material was prepared. The fiber base material was a nonwoven fabric made of polyester fibers having a fineness of 3d and a fiber length of 51 mm, and had a thickness of 6 mm and a basis weight of 750 g / m ² .
Next, after the fiber base material is immersed in the resin solution, the resin solution is squeezed out using a mangle roller capable of pressurizing between a pair of rollers, and the fiber base material is impregnated with the resin solution substantially uniformly. It was. Next, the polyester base polyurethane resin was coagulated and regenerated by immersing the fiber base material in a coagulating liquid composed of water and DMF at room temperature to obtain an abrasive brush precursor sheet.
Thereafter, the polishing brush precursor sheet was taken out from the coagulation liquid and further immersed in a cleaning liquid made of water to remove DMF, and then dried. After drying, the surface skin layer was removed by slicing to a thickness of 4 mm. At this time, the compression ratio of the polishing brush precursor sheet was 5.3%, and the density was 0.3 g / cm ³ .
Next, the obtained polishing brush precursor sheet was cut to provide a projection 4b having a cross-sectional shape shown in FIG. 6A on one side (height: 3 mm, the shape of the top surface of the projection 4b: 4 mm × 4 mm). And a separation width of the protrusions 4b: 3 mm). Specifically, the protrusion 4b has a prismatic shape formed so that the area of the top surface and the cross-sectional area of the base are the same as the protrusion 4b in the first to eighth embodiments. ing.
Thereafter, a polyethylene foam (thickness: 5 mm, foaming ratio: 30 times) was bonded as a cushioning material 6 to the surface opposite to the protruding portion 4b to obtain a polishing brush 4.

(Example 10)
A polishing brush precursor sheet was obtained by the same method as in Example 9, and cutting was performed on one side of the polishing brush precursor sheet. The protrusion 4b (height: 3 mm, protrusion) shown in FIG. The shape of the top surface of 4b: a square of 1 mm × 1 mm, the cross-sectional shape of the base of the protrusion 4b: a square of 4 mm × 4 mm, and the separation width of the protrusions 4b: 3 mm).
Specifically, the protrusion 4b of the tenth embodiment has a top surface formed into the above shape by chamfering the upper portion of the protrusion 4b having the prism shape in the ninth embodiment.
Thereafter, a polyethylene foam (thickness: 5 mm, foaming ratio: 30 times) was bonded as a cushioning material 6 to the surface opposite to the protruding portion 4b to obtain a polishing brush 4.

(Example 11)
A polishing brush precursor sheet was obtained in the same manner as in Example 9, cut on one side of the polishing brush precursor sheet, and a protrusion 4b (height: 3 mm, protrusion shown in FIG. 6C) The shape of the top surface of 4b: a square of 1 mm × 1 mm, the shape of the bottom surface of the protrusion 4b: a square of 4 mm × 4 mm, and the separation width of the protrusions 4b: 3 mm).
Specifically, the protrusion 4b of the tenth embodiment has a cross-sectional shape that is tapered toward the tip with respect to the prismatic protrusion 4b of the ninth embodiment, so that the top surface has the above shape. It has become.
Thereafter, a polyethylene foam (thickness: 5 mm, foaming ratio: 30 times) was bonded as a cushioning material 6 to the surface opposite to the protruding portion 4b to obtain a polishing brush 4.

(Test result 1 (Example 1 to Example 6))
In the polishing pads 1 of Examples 1 to 6, the porosity was in the range of 10 to 70%, and h / r was also in the range of 1.0 to 5.0. For this reason, the slurry could be retained sufficiently, and the followability was good, and good results were obtained for the polishing rate and the unpolished part.

(Test result 2 (Examples 7 to 8))
In Examples 7 and 8, as in Examples 1 to 6, the porosity was in the range of 10 to 70%, and h / r was in the range of 1.0 to 5.0. For this reason, good results were obtained for the polishing rate and the unpolished part.
However, since the difference between the maximum value and the minimum value of the resistance force in Example 7 was smaller than that in Examples 1 to 6, the protrusion 4b was likely to fall down and the stiffness was slightly weak. Therefore, the polishing rate was slightly lower than in Examples 1-6.
On the contrary, in Example 8, the difference between the maximum value and the minimum value of the resistance force was larger than that in Examples 1 to 6, so that the protrusion 4b was not easily tilted and the following ability was slightly low. For this reason, the quality level of the unpolished part as a product was reached, but the results were slightly inferior to those of Examples 1-6.

(Test result 3 (Comparative Examples 1 to 3))
In Comparative Example 1, which was the same material as in Example 1 and h / r was less than 1.0, h / r was less than 1.0, so that the protrusion 4b became the curved surface portion 1b of the object 1 to be polished. Unfollowed and unpolished part occurred. The polishing rate was higher than that of Example 1 because the protrusion 4b became stronger.
On the other hand, in Comparative Example 2 which was the same material as Example 1 and h / r was larger than 5.0, since h / r was larger than 5.0, the protruding portion 4b was easily bent, and the follow-up property was changed with time. It became worse and unpolished parts were generated. The polishing rate was lower than that of Example 1 because the force applied to the object 1 from the polishing brush 4 was dispersed and the stress applied to the object 1 was reduced.
In Comparative Example 3, although the h / r was in the range of 1.0 to 5.0, the porosity was less than 10%, so that the slurry was sufficiently held on the side surface of the protrusion 4b. There were many unpolished portions in the curved surface portion 1b.
However, the polishing rate was not low for many unpolished parts. The reason for this is considered to be that the planar portion 1a was overpolished because the protrusion 4b was strong.

(Test result 4 (Example 9 to Example 11))
In Examples 9 to 11, as in Examples 1 to 8, the open area ratio was in the range of 10 to 70%, and h / r was also in the range of 1.0 to 5.0. For this reason, good results were obtained for the polishing rate and the unpolished part.
Here, although the cross-sectional area and the height of the base part of the protruding part 4b of the ninth to eleventh examples are the same, the area of the top surface is set to the base part like the protruding part 4b of the tenth and eleventh examples. When set smaller than the cross-sectional area, a slightly better evaluation than the configuration of Example 9 was obtained for the quality level in the unpolished part.

In this embodiment, the example in which the support portion 4a of the polishing brush 4 rotates relative to the workpiece 1 has been shown, but the present invention is not limited to this. There is no particular limitation as long as the support 4a can move on the workpiece 1 and achieve the polishing process.

DESCRIPTION OF SYMBOLS 1 To-be-polished object 1b Curved surface part 2 Double-side polish apparatus 3 Lower side polishing surface plate 4 Polishing brush

4a Support part

4b Protrusion part 5 Upper side polishing surface plate 6 Cushion material

Claims

Having a large number of spaced protrusions and a planar support that supports the protrusions;
In a polishing brush that polishes while the side surface of the protrusion is pressed against the object to be polished,
The protrusion and the support are integrally formed of the same flexible material,
Further, the side surface of the projection has a plurality of apertures, the porosity of the side surface of the projection is 10 to 70%, and the height (h) of the projection and the cross section of the base of the projection A polishing brush, wherein a ratio (h / r) to a radius (r) of a circumscribed circle in the shape is in a range of 1.0 to 5.0.
A silicon measuring jig having a total weight of 5.5 kgf having a substantially square shape having a height of 80 mm and a width of 80 mm is placed on the top of the protruding portion facing in the vertical direction. Pull the jig horizontally at a speed of 100 mm / min,
When the measurement jig is pulled in a section of 20 mm to 80 mm, the difference between the maximum value and the minimum value of the resistance force from the protrusions acting on the measurement jig is in the range of 0.1 to 0.9 kgf. The polishing brush according to claim 1.
3. The polishing brush according to claim 1, wherein the area of the top surface of each projection is in the range of 0.01 to 1.0 cm 2 .
The polishing brush according to any one of claims 1 to 3, wherein the height (h) of the protrusion is in the range of 3 to 15 mm.
The ratio of the surface area of the surface on the side having the protrusions in the support part and the sum of the cross-sectional areas of the bases of all the protrusions is the surface area 100 cm 2 of the surface on the side having the protrusions in the support part The polishing brush according to any one of claims 1 to 4, wherein the total cross-sectional area of the base of the protrusion is in the range of 30 to 75 cm 2 .
6. The support portion according to claim 1, wherein the support portion can be deformed so as to follow a surface of a non-planar fixing base that is relatively driven while being pressed against an object to be polished. Polishing brush.
The polishing brush according to any one of claims 1 to 6, wherein a cushioning material having elasticity is provided on a surface of the support portion opposite to the protruding portion.