WO2016017218A1 - マイクロ波加熱照射装置 - Google Patents
マイクロ波加熱照射装置 Download PDFInfo
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- WO2016017218A1 WO2016017218A1 PCT/JP2015/061723 JP2015061723W WO2016017218A1 WO 2016017218 A1 WO2016017218 A1 WO 2016017218A1 JP 2015061723 W JP2015061723 W JP 2015061723W WO 2016017218 A1 WO2016017218 A1 WO 2016017218A1
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- microwave
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/126—Microwaves
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/02—Furnaces of a kind not covered by any preceding group specially designed for laboratory use
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D11/00—Arrangement of elements for electric heating in or on furnaces
- F27D11/12—Arrangement of elements for electric heating in or on furnaces with electromagnetic fields acting directly on the material being heated
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/70—Feed lines
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/70—Feed lines
- H05B6/704—Feed lines using microwave polarisers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/80—Apparatus for specific applications
- H05B6/806—Apparatus for specific applications for laboratory use
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/12—Processes employing electromagnetic waves
- B01J2219/1203—Incoherent waves
- B01J2219/1206—Microwaves
- B01J2219/1248—Features relating to the microwave cavity
- B01J2219/1251—Support for the reaction vessel
- B01J2219/1263—Support for the reaction vessel in the form of a open housing or stand
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/12—Processes employing electromagnetic waves
- B01J2219/1203—Incoherent waves
- B01J2219/1206—Microwaves
- B01J2219/1248—Features relating to the microwave cavity
- B01J2219/1266—Microwave deflecting parts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/12—Processes employing electromagnetic waves
- B01J2219/1203—Incoherent waves
- B01J2219/1206—Microwaves
- B01J2219/1248—Features relating to the microwave cavity
- B01J2219/1269—Microwave guides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/12—Processes employing electromagnetic waves
- B01J2219/1203—Incoherent waves
- B01J2219/1206—Microwaves
- B01J2219/1287—Features relating to the microwave source
- B01J2219/129—Arrangements thereof
- B01J2219/1293—Single source
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/12—Processes employing electromagnetic waves
- B01J2219/1203—Incoherent waves
- B01J2219/1206—Microwaves
- B01J2219/1287—Features relating to the microwave source
- B01J2219/129—Arrangements thereof
- B01J2219/1296—Multiple sources
Definitions
- the present invention relates to a microwave heating irradiation apparatus that heats a sample by irradiating it with microwaves.
- Patent Documents 1 and 2 disclose an iron making system that manufactures molten pig iron by irradiating and heating a raw material with microwaves.
- Non-Patent Documents 1 and 2 disclose a technique for configuring a microwave radiation source with a phased array antenna in an iron-making system using microwaves.
- a technique for shortening a chemical reaction time by applying a microwave to a chemical reaction is also attracting attention.
- microwave transmission technology is often applied to small-scale devices.
- development of large-scale and high-power devices such as an iron manufacturing system is also demanded.
- microwave radiation sources are arranged circumferentially around a reaction furnace. For this reason, of the microwaves radiated from a specific microwave radiation source (hereinafter referred to as “first microwave radiation source”), the microwaves that are not absorbed by the sample to be heated are reflected by this sample and reacted.
- a microwave radiation source (hereinafter referred to as a “second microwave radiation source”) facing the first microwave radiation source is irradiated through a furnace.
- the present invention has been made to solve the above-described problems, and an object thereof is to provide a microwave heating irradiation apparatus capable of confining a microwave and a sample in a reaction furnace.
- a microwave heating irradiation apparatus is disposed outside a reaction furnace, a reaction furnace that heats a sample contained therein by being irradiated with microwaves, a polarization grid provided in the reaction furnace, and the reaction furnace.
- a microwave radiation source that irradiates linearly polarized microwaves and a reflection that is disposed above the reactor and reflects the microwaves emitted by the microwave radiation source to the reactor through the polarization grid
- the microwave radiation source is arranged such that the polarization direction of the microwave incident on the polarization grid is orthogonal to the direction of the polarization grid.
- the microwave and the sample can be confined in the reaction furnace.
- FIG. 1 is a diagram showing a configuration of a microwave heating irradiation apparatus according to Embodiment 1 of the present invention.
- the microwave heating irradiation apparatus includes a reaction furnace 1, a polarization grid 2, a microwave radiation source 3, and a reflecting mirror 4.
- the reaction furnace 1 is a casing that reacts and heats the sample 50 contained therein by being irradiated with microwaves, and has an opening on the upper side (the reflecting mirror 4 side).
- the shape of the reaction furnace 1 may be appropriately selected depending on the form and characteristics of the sample 50 to be reacted. Moreover, in the example shown in FIG. 1, although the shape of the reactor 1 is made into the rectangle, it is not limited to this, For example, arbitrary shapes, such as a circle, may be sufficient. Further, the means for putting the sample 50 in and out of the reaction furnace 1 may be appropriately selected.
- the polarization grid 2 is arranged at the opening of the reaction furnace 1.
- a conductive medium such as copper or aluminum is used, for example.
- the polarization grid 2 is disposed in the hollow of the reaction furnace 1.
- the polarization grid 2 is not limited thereto, and may be disposed in a medium that transmits microwaves.
- the microwave radiation source 3 is arranged outside the reaction furnace 1 and irradiates linearly polarized microwaves for reacting the sample 50.
- Embodiment 1 shown in FIG. 1 the case where one microwave radiation source is provided is shown.
- the type of the microwave radiation source 3, the frequency of the microwave to be irradiated, and the like may be appropriately selected.
- the radiation direction of the microwave radiation source 3 is the direction of the reflecting mirror 4.
- the microwave radiation source 3 is arranged so that the polarization direction of the microwave incident on the polarization grid 2 (reference numeral 104 in FIG. 1) is orthogonal to the direction of the polarization grid 2.
- the reflection mirror 4 is arranged above the reaction furnace 1 and reflects the linearly polarized microwave irradiated by the microwave radiation source 3 to the reaction furnace 1 via the polarization grid 2.
- the linearly polarized microwave radiated from the microwave radiation source 3 is incident on the reflecting mirror 4 like the incident wave 101.
- the linearly polarized microwave reflected by the reflecting mirror 4 is incident on the sample 50 via the polarization grid 2 at the top of the reaction furnace 1 like the incident wave 102.
- a spheroid mirror is illustrated as the reflecting mirror 4, but the present invention is not limited to this, and any mirror capable of reflecting microwaves may be used.
- the microwave heating irradiation apparatus configured as described above will be described.
- the microwaves enter the polarization grid 2 through the reflecting mirror 4.
- the polarization direction of the microwave is orthogonal to the direction of the polarization grid 2
- all the incident waves 102 to the sample 50 are transmitted through the polarization grid 2, and are transmitted to the sample 50 in the reaction furnace 3. Irradiate while diverging toward.
- a part of the microwave irradiated to the sample 50 is absorbed as heat by the reaction in the sample 50.
- the microwave that has not been absorbed becomes the reflected wave 103 and is reflected in the direction opposite to the direction of incidence on the sample 50.
- the direction of the electric field component of the microwave rotates depending on how the sample 50 is arranged and the scattering characteristics.
- the polarization grid 2 is arrange
- a microwave is reflected by this polarization grid 2, and the sample 50 is irradiated again.
- the sample 50 can be heated efficiently.
- the microwave leaking from the polarization grid 2 is very small, and even if it leaks, it is small considering the propagation loss in the apparatus, and the microwave radiation source 3 is not broken.
- the polarization grid 2 is provided in the reaction furnace 1, and the microwave radiation source 3 is set so that the polarization direction of the microwave is orthogonal to the direction of the polarization grid 2. Therefore, the microwave and the sample 50 can be confined in the reaction furnace 1. As a result, failure of the microwave radiation source 3 can be prevented and leakage of the sample 50 can be prevented. Furthermore, since the microwave can be confined in the reaction furnace 1, the microwave reflected from the sample 50 can be effectively used in the reaction furnace 1, and can be irradiated again to the sample 50, thereby improving energy efficiency. An effect is obtained.
- FIG. FIG. 2 is a diagram showing a configuration of a microwave heating irradiation apparatus according to Embodiment 2 of the present invention.
- the microwave heating irradiation apparatus according to the second embodiment shown in FIG. 2 is provided with two systems of the microwave radiation source 3 and the reflecting mirror 4 of the microwave heating irradiation apparatus according to the first embodiment shown in FIG. .
- suffixes (a, b) are added to the reference numerals of the respective components.
- Other configurations are the same, and the same reference numerals are given and description thereof is omitted.
- the microwave radiation sources 3 of each system are arranged so that the polarization direction of the microwave incident on the polarization grid 2 is orthogonal to the direction of the polarization grid 2.
- FIG. 2 shows the case where two systems of the microwave radiation source 3 and the reflecting mirror 4 are provided, three or more systems may be provided, and the number is not limited.
- FIG. 3 is a diagram showing a configuration of a microwave heating irradiation apparatus according to Embodiment 3 of the present invention.
- the microwave heating irradiation apparatus according to Embodiment 3 shown in FIG. 3 is provided with an uneven portion 11 on the inner side wall of the reaction furnace 1 of the microwave heating irradiation apparatus according to Embodiment 1 shown in FIG. .
- Other configurations are the same, and the same reference numerals are given and description thereof is omitted.
- the concavo-convex portion 11 is provided on the inner side wall of the reaction furnace 1 to diffusely reflect the microwave reflected in the reaction furnace 1.
- the material, shape, and type of the uneven portion 11 may be selected as appropriate.
- the microwave reflected wave 103 from the sample 50 is more complexly reflected in the reaction furnace 1 than the configuration of the first embodiment shown in FIG.
- the effect of reducing the microwaves leaking from the can be obtained.
- the concave-convex portion 11 may have a surface shape in which triangular prisms are arranged, for example, or may have a surface shape in which triangular pyramids, quadrangular pyramids, and hemispheres are arranged (that is, a shape that can obtain the effect of diffuse reflection). Just do it).
- the concavo-convex portion 11 on the inner side wall of the reaction furnace 1, a more efficient heating effect on the sample 50 than the effect of the first embodiment is achieved.
- the effect of reducing the leakage of microwaves from the dielectric plate 2 can be obtained.
- FIG. 4 is a diagram showing a configuration of a microwave heating irradiation apparatus according to Embodiment 4 of the present invention.
- the microwave heating irradiation apparatus according to Embodiment 4 shown in FIG. 4 is obtained by providing a heating unit 5 in the microwave heating irradiation apparatus according to Embodiment 1 shown in FIG.
- Other configurations are the same, and the same reference numerals are given and description thereof is omitted.
- the heating unit 5 is provided outside the reaction furnace 1 and heats the reaction furnace 1. You may select suitably the method of this heating part 5, and the kind of apparatus. In this way, in addition to heating the sample 50 with microwaves, heating the reaction furnace 1 itself with the heating unit 5 increases the temperature in the reaction furnace 1 and increases the reaction rate of the sample 50. it can.
- the heating unit 5 for applying heat to the reaction furnace 1
- a more efficient heating effect on the sample 50 is obtained as compared with the effect of the first embodiment. It is done.
- FIG. 5 is a diagram showing a configuration of a microwave heating irradiation apparatus according to Embodiment 5 of the present invention.
- the microwave heating irradiation apparatus according to the fifth embodiment shown in FIG. 5 has an active phased array antenna 6 as the microwave radiation source 3 of the microwave heating irradiation apparatus according to the first embodiment shown in FIG.
- Other configurations are the same, and the same reference numerals are given and description thereof is omitted.
- the active phased array antenna 6 is provided with an amplifier and a phase shifter for each antenna element or for each sub-array antenna composed of a plurality of antenna elements. Then, by optimizing each amplification amount and phase shift amount, it is possible to flexibly control the irradiation distribution of the microwave irradiated to the sample 50. In order to achieve the target irradiation distribution, the adjustment of the amplification amount and the phase shift amount may be appropriately selected.
- the active phased array antenna 6 capable of adjusting the amplitude and phase of the radiated microwave is used as the microwave radiation source 3, the effect of the first embodiment is achieved.
- the effect that the irradiation distribution to the sample 50 can be controlled flexibly is obtained.
- a microwave heating irradiation apparatus is disposed outside a reaction furnace, a reaction furnace that heats a sample contained therein by being irradiated with microwaves, a polarization grid provided in the reaction furnace, and the reaction furnace.
- a microwave radiation source that irradiates linearly polarized microwaves and a reflector that is disposed above the reactor and reflects the microwaves to the reactor through the polarization grid.
- the microwave and the sample are placed in the reactor so that the polarization direction of the microwave incident on the polarization grid is orthogonal to the direction of the wave grid, which is suitable for heating the sample. is there.
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Abstract
Description
現状、マイクロ波伝送技術は小規模な装置に適用される例が多い。しかしながら、例えば製鉄システムのように、大規模かつ大電力の装置の開発も求められている。
実施の形態1.
図1はこの発明の実施の形態1に係るマイクロ波加熱照射装置の構成を示す図である。
マイクロ波加熱照射装置は、図1に示すように、反応炉1、偏波グリッド2、マイクロ波放射源3及び反射鏡4から構成される。
マイクロ波放射源3から直線偏波のマイクロ波が照射されると、このマイクロ波は、反射鏡4を介して偏波グリッド2に向かって入射する。本発明ではマイクロ波の偏波方向が偏波グリッド2の方向に対して直交しているので、試料50への入射波102はすべて偏波グリッド2を透過し、反応炉3内の試料50に向けて発散されながら照射する。そして、試料50に照射されたマイクロ波のうちの一部は、試料50での反応により熱となって吸収される。一方、吸収されなかったマイクロ波は、反射波103となって、試料50への入射方向とは逆方向に反射する。この際、試料50の配置の仕方や散乱特性により、マイクロ波の電界成分の向きが回転する。そして、本発明では反応炉1に偏波グリッド2が配置されているため、この偏波グリッド2によってマイクロ波が反射されて、再び、試料50に照射される。これにより、効率的に試料50を加熱することができる。なお、偏波グリッド2から漏れ出ていくマイクロ波は非常に少なく、また仮に漏れ出たとしても、装置内の伝搬損失から考えれば小さいものであり、マイクロ波放射源3を壊すことはない。
図2はこの発明の実施の形態2に係るマイクロ波加熱照射装置の構成を示す図である。図2に示す実施の形態2に係るマイクロ波加熱照射装置は、図1に示す実施の形態1に係るマイクロ波加熱照射装置のマイクロ波放射源3及び反射鏡4を2系統設けたものである。なお図では、各系統を区別するため、各構成の符号に接尾記号(a,b)を付して示している。その他の構成は同様であり、同一の符号を付してその説明を省略する。
なお図2に示す例では、マイクロ波放射源3及び反射鏡4を2系統設けた場合を示しているが、3系統以上設けてもよく、その数を限定するものではない。
図3はこの発明の実施の形態3に係るマイクロ波加熱照射装置の構成を示す図である。
図3に示す実施の形態3に係るマイクロ波加熱照射装置は、図1に示す実施の形態1に係るマイクロ波加熱照射装置の反応炉1の内側の側壁に凹凸部11を設けたものである。その他の構成は同様であり、同一の符号を付してその説明を省略する。
なお、凹凸部11は、例えば三角柱を並べたような面の形状でもよいし、三角錐、四角錐、半球を並べたような面の形状でもよい(すなわち、拡散反射の効果が得られる形状であればよい)。
図4はこの発明の実施の形態4に係るマイクロ波加熱照射装置の構成を示す図である。
図4に示す実施の形態4に係るマイクロ波加熱照射装置は、図1に示す実施の形態1に係るマイクロ波加熱照射装置に加熱部5を設けたものである。その他の構成は同様であり、同一の符号を付してその説明を省略する。
図5はこの発明の実施の形態5に係るマイクロ波加熱照射装置の構成を示す図である。
図5に示す実施の形態5に係るマイクロ波加熱照射装置は、図1に示す実施の形態1に係るマイクロ波加熱照射装置のマイクロ波放射源3をアクティブフェーズドアレーアンテナ6としたものである。その他の構成は同様であり、同一の符号を付してその説明を省略する。
Claims (8)
- マイクロ波が照射されることで内部に収められた試料を加熱させる反応炉と、
前記反応炉に設けられた偏波グリッドと、
前記反応炉の外側に配置され、直線偏波のマイクロ波を照射する1つのマイクロ波放射源と、
前記反応炉の上方に配置され、前記マイクロ波放射源により照射されたマイクロ波を、前記偏波グリッドを介して前記反応炉に反射する反射鏡とを備え、
前記マイクロ波放射源は、前記偏波グリッドの向きに対して当該偏波グリッドに入射されるマイクロ波の偏波方向が直交するよう配置された
ことを特徴とするマイクロ波加熱照射装置。 - マイクロ波が照射されることで内部に収められた試料を加熱させる反応炉と、
前記反応炉に設けられた偏波グリッドと、
前記反応炉の外側に配置され、マイクロ波を照射する複数のマイクロ波放射源と、
前記複数のマイクロ波放射源に対応して前記反応炉の上方に複数配置され、対応する当該マイクロ波放射源により照射されたマイクロ波を、前記偏波グリッドを介して前記反応炉に反射する反射鏡とを備え、
前記各マイクロ波放射源は、前記偏波グリッドの向きに対して当該偏波グリッドに入射されるマイクロ波の偏波方向が直交するよう配置された
ことを特長とするマイクロ波加熱照射装置。 - 前記反応炉の内側の側壁に設けられ、マイクロ波を乱反射させる凹凸部を備えた
ことを特徴とする請求項1記載のマイクロ波加熱照射装置。 - 前記反応炉の内側の側壁に設けられ、マイクロ波を乱反射させる凹凸部を備えた
ことを特徴とする請求項2記載のマイクロ波加熱照射装置。 - 前記反応炉の外部に設けられ、当該反応炉を加熱する加熱部を備えた
ことを特徴とする請求項1記載のマイクロ波加熱照射装置。 - 前記反応炉の外部に設けられ、当該反応炉を加熱する加熱部を備えた
ことを特徴とする請求項2記載のマイクロ波加熱照射装置。 - 前記マイクロ波放射源は、照射するマイクロ波の振幅及び位相を調整自在なアクティブフェーズドアレーアンテナである
ことを特徴とする請求項1記載のマイクロ波加熱照射装置。 - 前記マイクロ波放射源は、照射するマイクロ波の振幅及び位相を調整自在なアクティブフェーズドアレーアンテナである
ことを特徴とする請求項2記載のマイクロ波加熱照射装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
MYPI2017700285A MY183791A (en) | 2014-07-29 | 2015-04-16 | Microwave irradiating and heating device |
JP2016538172A JP6125106B2 (ja) | 2014-07-29 | 2015-04-16 | マイクロ波加熱照射装置 |
CN201580041191.9A CN106574821B (zh) | 2014-07-29 | 2015-04-16 | 微波加热照射装置 |
US15/322,598 US9737866B2 (en) | 2014-07-29 | 2015-04-16 | Microwave irradiating and heating device |
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JP (1) | JP6125106B2 (ja) |
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Cited By (2)
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US9823019B2 (en) | 2014-07-17 | 2017-11-21 | Mitsubishi Electric Corporation | Microwave irradiating and heating device |
US10166525B2 (en) | 2014-07-29 | 2019-01-01 | Mitsubishi Electric Corporation | Microwave irradiating and heating device |
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JP5178939B1 (ja) * | 2012-07-11 | 2013-04-10 | 和宏 永田 | マイクロ波によるシリコンの製造方法及びマイクロ波還元炉 |
KR102655694B1 (ko) * | 2018-08-09 | 2024-04-08 | 삼성디스플레이 주식회사 | 어닐링 장치 |
US11662375B2 (en) * | 2021-01-14 | 2023-05-30 | Microelectronics Technology, Inc. | Microwave system using different polarizations |
CN118032846B (zh) * | 2024-03-12 | 2024-08-20 | 河南省科学院同位素研究所有限责任公司 | 一种气密性材料热辐射实验设备 |
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US10166525B2 (en) | 2014-07-29 | 2019-01-01 | Mitsubishi Electric Corporation | Microwave irradiating and heating device |
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MY183791A (en) | 2021-03-16 |
CN106574821A (zh) | 2017-04-19 |
CN106574821B (zh) | 2019-01-22 |
US20170165631A1 (en) | 2017-06-15 |
JPWO2016017218A1 (ja) | 2017-04-27 |
JP6125106B2 (ja) | 2017-05-10 |
US9737866B2 (en) | 2017-08-22 |
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