WO2016000497A1 - 一种电磁弹射启动式掩模台系统 - Google Patents

一种电磁弹射启动式掩模台系统 Download PDF

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Publication number
WO2016000497A1
WO2016000497A1 PCT/CN2015/079238 CN2015079238W WO2016000497A1 WO 2016000497 A1 WO2016000497 A1 WO 2016000497A1 CN 2015079238 W CN2015079238 W CN 2015079238W WO 2016000497 A1 WO2016000497 A1 WO 2016000497A1
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Prior art keywords
ejection
mask
mask table
stage
steel array
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PCT/CN2015/079238
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English (en)
French (fr)
Inventor
张鸣
朱煜
成荣
杨开明
支凡
张金
陈安林
张利
赵彦坡
胡清平
田丽
徐登峰
尹文生
穆海华
胡金春
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Tsinghua University
U Precision Tech Co Ltd
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Tsinghua University
U Precision Tech Co Ltd
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Publication of WO2016000497A1 publication Critical patent/WO2016000497A1/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Definitions

  • the invention relates to an electromagnetic ejection starting mask table system, which is applied to a semiconductor lithography machine and belongs to the technical field of semiconductor manufacturing equipment.
  • the workpiece stage system of the lithography machine is divided into two subsystems: a mask stage and a wafer stage.
  • the mask stage and the wafer stage need to be separately accelerated, and moved to the exposure start.
  • the position is simultaneously at the same speed as 4:1 required for scanning exposure.
  • the wafer stage moves in a scanning motion direction at a uniform speed, and the mask stage scans in the opposite direction to the scanning motion of the wafer stage at a speed of 4 times the scanning speed of the wafer stage, and the motion requirements of the two are extremely extreme. Accurate synchronization.
  • all the graphics on the reticle are imaged on a particular chip of the silicon wafer.
  • the mask table and the wafer stage are respectively decelerated, and the wafer stage performs a stepping motion to move the next chip to be exposed under the projection objective. Thereafter, the mask table is accelerated, scanned, and decelerated in a direction opposite to the direction of the last scanning motion, and the wafer stage is accelerated, scanned, and decelerated in a planned direction to complete a chip exposure during the synchronous scanning process. Repeatedly, the mask table moves back and forth to accelerate, scan, and decelerate linear motion, and the wafer stage performs stepping and scanning motion according to the planned trajectory to complete the exposure of the entire silicon wafer.
  • the mask table mainly provides the function of reciprocating high-precision linear motion in the scanning direction, and the stroke should satisfy the chip length 4 times and the acceleration/deceleration distance; the scanning speed should be silicon.
  • the scanning speed of the film is 4 times, and the maximum acceleration is correspondingly higher than the highest acceleration of the wafer stage.
  • Patent document 201110008388.6 provides a moving permanent magnet and two stationary parts fixed on the frame of the lithography machine at two ends of the mask table, and the stationary part may be an electromagnet or a permanent magnet, and the moving permanent magnet and the stationary part constitute a vibration device. The repulsive force between the moving permanent magnet and the stationary portion increases the acceleration of the mask table.
  • the stationary part is a permanent magnet
  • the acceleration provided is not enough, and reciprocating acceleration is required to achieve the required acceleration
  • the stationary part is an electromagnet
  • the electromagnet needs to be energized in each acceleration/deceleration section, which additionally increases energy consumption
  • the stationary part is a combination of a permanent magnet and an electromagnet, the starting process is complicated and the starting time is long, so the performance of the mask stage starting and stopping process is limited.
  • the present invention provides an electromagnetic ejection activated mask table system.
  • An electromagnetic ejection activated mask stage system comprising a base, a balance block assembly, a mask stage, and a measurement system, the balance block assembly including a balance block, a mask stage YZ-direction motor coil, and Mask table X to motor coil, flat
  • a vibration isolation system is disposed between the balance block and the base;
  • the mask stage includes a mask stage base, a mask stage YZ to the motor magnetic steel array, and a mask table X to the motor magnetic steel array, the mask stage The YZ-to-motor magnetic steel array is mounted on the lower surface of the mask stage base, and the mask table X is mounted on the motor magnetic steel array on the two sides perpendicular to the X direction of the mask stage base, characterized by:
  • the electromagnetic ejection activated mask table system further includes an ejection structure including an ejection structure stator magnetic steel array, an ejection structure mover magnetic steel array, an ejection stage, an ejection stage motor mover, an ejection stage motor stator and a
  • the ejector structure stator magnet steel array comprises a first projectile structure stator magnet steel array and a second projectile structure stator magnet steel array.
  • the first ejection structure stator magnetic steel array is mounted on the opposite side of the ejection table and the base of the mask table; the second ejection structure stator magnetic steel array is mounted on the balance block, and the first ejection structure stator magnetic steel array Column-relative; respectively, the two sides of the mask stage base perpendicular to the Y direction are respectively arranged with the array of the projectile magnet steel, and the first projectile structure of the stator magnet steel array and the second projectile structure of the stator magnet The arrays are installed separately.
  • the vibration isolation system between the balance block and the base adopts an air floating vibration isolation system or a magnetic floating vibration isolation system.
  • the mask table YZ employs a schach array to the motor magnetic steel array.
  • the measurement system uses a laser interferometer and a capacitive sensor to measure six degrees of freedom.
  • the electromagnetic ejection starting mask table system of the invention has the following advantages and outstanding effects: the invention adopts electromagnetic ejection to start and stop, and improves the acceleration of the starting and stopping phases of the lithography machine mask table, and reduces the acceleration.
  • the acceleration time reduces the requirements on the driver of the mask stage drive motor, and the permanent magnet is used in the ejection structure to reduce energy consumption.
  • Figure 1 is a schematic illustration of an initial state of an electromagnetic ejection activated mask stage system provided by the present invention.
  • FIG. 2 is a schematic view of a mask stage of an electromagnetic ejection activated mask table system provided by the present invention.
  • FIG. 3 is a schematic view of an ejection structure of an electromagnetic ejection activated mask table system provided by the present invention.
  • FIG. 4 is a schematic diagram of an operational phase of an electromagnetic ejection activated mask table system provided by the present invention.
  • the electromagnetic ejection starting mask table system provided by the present invention comprises a base 1, a balance block assembly, a mask stage, and a measuring system and an ejection structure;
  • the balancing block assembly comprises a balancing block 2, a mask table YZ to the motor coil 5 and a mask table X to the motor coil 6, wherein an air floating vibration isolation system or a magnetic floating separation is used between the balance block and the base Vibration system support.
  • the mask stage YZ to the motor coil 5 is an array of coils arranged in the Y direction on the upper surface of the weight, the rail 11 is mounted in the Y direction; the mask table YZ is used to provide a mask table to the motor The buoyancy of the Z-direction of the moving table and the driving force of the Y-direction.
  • the mask stage X is attached to the motor coil 6 on the outer side of the mask stage YZ to the motor coil 5.
  • the mask stage X is used to supply the driving force in the X direction of the mask stage.
  • the mask stage is in the initial position of the stage, and the ejection stage 8 is in the initial position of the ejection stage.
  • the measurement system is implemented using a single-axis laser interferometer 17, a three-axis laser interferometer 18, and two capacitive sensors in the Z direction.
  • Two X-directional mirrors 15 are mounted on the upper surface of the mask stage base 12, symmetrically arranged in the Y direction, and one side of the X-direction mirror 15 is provided for symmetrical weight.
  • the Y-mirror 16 is mounted on the side of the mask stage base 12 perpendicular to the Y direction and adjacent to the triaxial laser interferometer 18.
  • the uniaxial laser interferometer 17 is arranged in the X direction and cooperates with the X-directional mirror 15 for measuring the displacement in the X direction, the triaxial laser interferometer is arranged in the Y direction and the Y mirror 16 is used to measure the Y direction displacement and winding.
  • the rotation angles in the X direction and the Z direction, the displacement in the Z direction, and the rotation angle in the Y direction are measured by two capacitive sensors arranged in the Z direction.
  • the mask stage includes a mask stage base 12, a mask stage YZ to the motor magnetic steel array 13, and a mask stage X to the motor magnetic steel array 14;
  • the mask stage YZ to the motor magnetic steel array is a schach array, including
  • the two groups are symmetrically mounted on the lower surface of the mask stage base 12, arranged in the Y direction and respectively opposed to the mask stage YZ to the motor coil 5;
  • the mask table X is mounted on the motor magnetic array 14 in the mask stage
  • the stage base 12 is perpendicular to both sides in the X direction and is opposed to the mask table X toward the motor coil 6.
  • the ejection structure comprises an ejection structure stator magnet steel array, an ejection structure mover magnetic steel array 4, an ejection stage 8, an ejection stage motor mover 9, an ejection stage motor stator 10 and a guide rail 11; the ejection stage motor stator 10 and the guide rail 11 are fixed at On the balance block 2, the ejection stage motor mover 9 is fixed at the bottom of the ejection stage 8; the ejection structure stator magnetic steel array comprises a first ejection structure stator magnetic steel array 3 and a second ejection structure stator magnetic steel array 7, this embodiment
  • the first ejection structure stator magnet steel array 3 comprises two groups, which are mounted on opposite sides of the ejection table 8 and the mask stage base 12, and are symmetrically arranged.
  • the second ejection structure stator magnet array 7 comprises two groups. Mounted on the balance block 2 and respectively opposite to the first projectile stator magnet steel array 3; the projectile structure magnet steel array is respectively arranged on two sides perpendicular to the Y direction in the mask stage base 12 4. Two sets of sides are symmetrically arranged, and are respectively mounted opposite to the first projectile stator magnet steel array 3 and the second projectile stator magnet steel array 7 and have a repulsive force with the stator magnet steel array.
  • the working process of an electromagnetic ejection starting mask table system is divided into a starting phase, a working phase and a stopping phase.
  • the mask stage In the start-up phase, as shown in Fig. 1, the mask stage is stationary at the initial position of the moving table before starting, and under the action of the ejector motor, the ejector moves from the initial position of the ejector to the reticle stage, due to the mask table.
  • the repulsive force between the projectile magnet steel array 4 on the moving stage and the first projectile stator magnet steel array 3 on the ejection table, the mask stage is ejected with a large acceleration to make the mask stage Directly reaching the normal working speed, thereby entering the working phase; FIG.
  • FIG. 4 is a schematic diagram of the working phase of an electromagnetic ejection starting mask table system provided by the present invention.
  • the ejection stage stops at the ejection stage working position, and when the mask stage moves to the end of the -Y direction stroke, the ejection structure mover magnetic steel array on the mask stage base 12
  • the distance between the second projectile structure and the stator magnet steel array 7 on the balance block 2 is smaller and smaller, and the repulsive force is getting larger and larger, so that the speed of the mask stage is reduced to zero and reversely accelerated, and the normal working speed is reached again.
  • the ejection structure on the mask stage base 12 and the array on the ejection table 8 The distance between the first projectile structure stator magnet steel array 3 is smaller and smaller, and the repulsive force is getting larger and larger, so that the speed of the mask stage moving table is reduced to zero and reversely accelerated, and the normal working speed is reached again.
  • the mask table YZ fine-tunes the speed and attitude of the mask stage in the working phase to meet the requirements of the speed and position of the system, and compensates for the energy dissipation of the system. In this way, the mask stage moves back and forth in a working area in the Y direction.
  • the mask stage moves from the working area of the mask table to the initial position of the mask stage, and the mask stage moves the ejection stage.
  • the repulsive force between the two causes the ejection stage to pop out, so that the mask stage is decelerated. And quickly stop at the initial position of the mask table to achieve the purpose of fast stop.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

一种电磁弹射启动式掩模台系统，用于光刻机系统中，所述掩模台系统包含底座（1）、平衡块组件、掩模台动台和测量系统。所述平衡块组件包括平衡块（2）、掩模台YZ向电机线圈（5）和掩模台X向电机线圈（6）；所述掩模台动台包括掩模台动台基底（12）、掩模台YZ向电机磁钢阵列（13）和掩模台X向电机磁钢阵列（14）；所述掩模台系统还包括弹射结构，所述弹射结构包括弹射结构定子磁钢阵列（3）、弹射结构动子磁钢阵列（4，7）、弹射台（8）、弹射台电机动子（9）、弹射台电机定子（10）和导轨（11）。通过该弹射结构，提高了光刻机掩模台的启动和停止阶段的加速度，减小了加速时间，降低了能耗和对驱动器的要求。

Description

一种电磁弹射启动式掩模台系统 技术领域
本发明涉及一种电磁弹射启动式掩模台系统，该掩模台系统应用于半导体光刻机中，属于半导体制造装备技术领域。
背景技术
光刻机的工件台系统分为掩模台和硅片台两个子系统，为进行硅片上一个chip的曝光，掩模台和硅片台需要分别进行加速运动，并在运动到曝光起始位置时同时达到扫描曝光所要求的4：1的速度。此后，硅片台以均匀的速度向扫描运动方向运动，掩模台以4倍于硅片台扫描速度的速度向与硅片台扫描运动的反方向作扫描运动，两者的运动要求达到极其精确的同步。最终将掩模版上的全部图形成像在硅片的特定芯片(chip)上。当一个chip扫描结束后，掩模台和硅片台分别进行减速运动，同时硅片台进行步进运动，将下一个要曝光的chip移动到投影物镜下方。此后，掩模台向与上次扫描运动方向相反的方向加速、扫描、减速，硅片台则按照规划的方向加速、扫描、减速，在同步扫描过程中完成一个chip的曝光。如此不断重复，掩模台往返进行加速、扫描、减速的直线运动，硅片台按照规划的轨迹进行步进和扫描运动，完成整个硅片的曝光。根据对掩模台的运动要求，掩模台主要提供沿扫描方向往返超精密高速直线运动的功能，其行程应满足chip长度的4倍、并加上加减速的距离；其扫描速度应为硅片台扫描速度的4倍，最高加速度也相应的会高于硅片台的最高加速度。
掩模台在加减速段的加速度通常由驱动电机提供，每个加减速段电机均需要工作，这种启动方式启动时间长，效率低，存在较大能耗。随着半导体制造技术的发展，未来对掩模台的加速度要求会更高，会导致驱动电机的驱动器难以满足。专利文献201110008388.6在掩模台两端分别设置运动永磁体和两个固定在光刻机机架上的静止部分，静止部分可以是电磁铁或永磁体，运动永磁体和静止部分组成振动装置，通过运动永磁体和静止部分之间的斥力增加掩模台的加速度。当静止部分为永磁体时，提供的加速度不够，需要往复加速才能达到所需要的加速度；当静止部分为电磁铁时，电磁铁在每个加减速段均需要通电，会额外增加能耗；当静止部分为永磁体和电磁铁的组合时，启动过程复杂，启动时间长，所以其掩模台启动和停止过程的性能受到限制。
发明内容
为了提高光刻机掩模台的启动和停止阶段的加速度，减少加减速时间，提高光刻机产率，降低能耗，本发明提供一种电磁弹射启动式掩模台系统。
本发明的技术方案如下：
一种电磁弹射启动式掩模台系统，所述掩模台系统包含底座、平衡块组件、掩模台动台和测量系统，所述平衡块组件包括平衡块、掩模台YZ向电机线圈和掩模台X向电机线圈，平 衡块和底座之间设有隔振系统；所述掩模台动台包括掩模台动台基底、掩模台YZ向电机磁钢阵列和掩模台X向电机磁钢阵列，掩模台YZ向电机磁钢阵列安装在掩模台动台基底的下表面，掩模台X向电机磁钢阵列安装在掩模台动台基底的垂直于X方向的两个侧面上，其特征在于：所述电磁弹射启动式掩模台系统还包括弹射结构，所述弹射结构包括弹射结构定子磁钢阵列、弹射结构动子磁钢阵列、弹射台、弹射台电机动子、弹射台电机定子和导轨，弹射台电机定子和导轨固定在平衡块上，弹射台电机动子固定在弹射台的底部，所述弹射结构定子磁钢阵列包括第一弹射结构定子磁钢阵列和第二弹射结构定子磁钢阵列，第一弹射结构定子磁钢阵列装在弹射台和掩模台动台基底相对的侧面上；第二弹射结构定子磁钢阵列装在平衡块上，并和第一弹射结构定子磁钢阵列相对；在掩模台动台基底中垂直于Y方向的两个侧面分别布置所述的弹射结构动子磁钢阵列，并与第一弹射结构定子磁钢阵列和第二弹射结构定子磁钢阵列分别相对安装。
平衡块和底座之间的隔振系统采用气浮隔振系统或磁浮隔振系统。所述掩模台YZ向电机磁钢阵列采用halbach阵列。所述测量系统采用激光干涉仪和电容传感器实现六自由度的测量。
本发明所述的电磁弹射启动式掩模台系统具有以下优点及突出性效果：本发明采用电磁弹射进行启动和停止，提高了光刻机掩模台的启动和停止阶段的加速度，减小了加速时间，降低了对掩模台驱动电机的驱动器的要求，并且弹射结构中采用永磁体，降低了能耗。
附图说明
图1是本发明提供的一种电磁弹射启动式掩模台系统初始状态的示意图。
图2是本发明提供的一种电磁弹射启动式掩模台系统掩模台动台的示意图。
图3是本发明提供的一种电磁弹射启动式掩模台系统弹射结构的示意图。
图4是本发明提供的一种电磁弹射启动式掩模台系统工作阶段的示意图。
图中：1-底座；2-平衡块；3-第一弹射结构定子磁钢阵列；4-弹射结构动子磁钢阵列；5-掩模台YZ向电机线圈；6-掩模台X向电机线圈；7-第二弹射结构定子磁钢阵列；8-弹射台；9-弹射台电机动子；10-弹射台电机定子；11-导轨；12-掩模台动台基底；13-掩模台YZ向电机磁钢阵列；14-掩模台X向电机磁钢阵列；15-X向反射镜；16-Y向反射镜；17-单轴激光干涉仪；18-三轴激光干涉仪。
具体实施方式
下面结合附图对本发明的具体结构、机理和工作过程作进一步的说明。
图1是本发明提供的一种电磁弹射启动式掩模台系统初始状态的示意图，本发明提供的一种电磁弹射启动式掩模台系统包含底座1、平衡块组件、掩模台动台、测量系统和弹射结构；所述平衡块组件包括平衡块2、掩模台YZ向电机线圈5和掩模台X向电机线圈6，其中平衡块和底座之间采用气浮隔振系统或磁浮隔振系统支承。掩模台YZ向电机线圈5是在平衡块的上表面沿Y向排布的线圈阵列，导轨11沿Y向安装；掩模台YZ向电机用来提供掩模台 动台Z向的浮力和Y向的驱动力。掩模台X向电机线圈6安装在掩模台YZ向电机线圈5的外侧，掩模台X向电机用来提供掩模台动台X方向的驱动力。图1中掩模台动台处在动台初始位置，弹射台8处于弹射台初始位置。所述测量系统采用单轴激光干涉仪17、三轴激光干涉仪18和两个Z方向的电容传感器来实现。两个X向反射镜15安装在掩模台动台基底12的上表面，沿Y向并对称布置，其中一侧的X向反射镜15是为了使重量对称而设置的。Y向反射镜16安装在掩模台动台基底12的垂直于Y方向并靠近三轴激光干涉仪18的侧面。单轴激光干涉仪17沿X方向布置并和X向反射镜15配合用来测量X向的位移，三轴激光干涉仪沿Y方向布置并和Y向反射镜16用来测量Y方向位移、绕X方向和Z方向的转角，Z方向的位移和Y方向的转角采用2个沿Z方向布置的电容传感器来测量。
图2是本发明提供的一种电磁弹射启动式掩模台系统掩模台动台的示意图。掩模台动台包括掩模台动台基底12、掩模台YZ向电机磁钢阵列13、掩模台X向电机磁钢阵列14；掩模台YZ向电机磁钢阵列是halbach阵列，包含两组并对称安装在掩模台动台基底12的下表面，沿Y向排布并分别与掩模台YZ向电机线圈5相对；掩模台X向电机磁钢阵列14安装在掩模台动台基底12垂直于X方向的两个侧面，并与掩模台X向电机线圈6相对。
图3是本发明提供的一种电磁弹射启动式掩模台系统弹射结构的示意图。所述弹射结构包括弹射结构定子磁钢阵列、弹射结构动子磁钢阵列4、弹射台8、弹射台电机动子9、弹射台电机定子10和导轨11；弹射台电机定子10和导轨11固定在平衡块2上，弹射台电机动子9固定在弹射台8的底部；所述弹射结构定子磁钢阵列包括第一弹射结构定子磁钢阵列3和第二弹射结构定子磁钢阵列7，本实施例中，第一弹射结构定子磁钢阵列3包括两组，安装在弹射台8和掩模台动台基底12相对的侧面上，并且对称布置，第二弹射结构定子磁钢阵列7包括两组，安装在平衡块2上，并分别和第一弹射结构定子磁钢阵列3相对；在掩模台动台基底12中垂直于Y方向的两个侧面分别布置所述的弹射结构动子磁钢阵列4，每个侧面对称布置两组，并分别与第一弹射结构定子磁钢阵列3和第二弹射结构定子磁钢阵列7相对安装并与定子磁钢阵列存在斥力作用。
本发明提供的一种电磁弹射启动式掩模台系统工作过程分为启动阶段、工作阶段和停止阶段。在启动阶段，如图1所示，掩模台动台启动前静止在动台初始位置，在弹射台电机作用下，弹射台从弹射台初始位置向掩模台动台运动，由于掩模台动台上的弹射结构动子磁钢阵列4和弹射台上的第一弹射结构定子磁钢阵列3之间的斥力，掩模台动台以一个很大的加速度弹出，使掩模台动台直接达到正常工作速度，从而进入工作阶段；图4是本发明提供的一种电磁弹射启动式掩模台系统工作阶段的示意图。如图4所示，在工作阶段，弹射台停止在弹射台工作位置，当掩模台动台运动到-Y方向行程的末端，掩模台动台基底12上的弹射结构动子磁钢阵列和平衡块2上的第二弹射结构定子磁钢阵列7之间的距离越来越小，斥力越来越大，使掩模台动台速度减为零并反向加速，再次达到正常工作速度；当掩模台动台运动到+Y方向行程的末端，掩模台动台基底12上的弹射结构动子磁钢阵列和弹射台8上的上 的第一弹射结构定子磁钢阵列3之间的距离越来越小，斥力越来越大，使掩模台动台速度减为零并反向加速，再次达到正常工作速度。掩模台YZ向电机在工作阶段对掩模台动台的速度和姿态进行微调，满足系统对其的速度和位置的要求，同时补偿系统的能量耗散。如此往复，掩模台动台在Y方向的一段工作区域内做往复运动。在停止阶段，掩模台动台由掩模台工作区域向掩模台初始位置运动，掩模台动台推动弹射台，两者之间的斥力使弹射台弹出，使掩模台动台减速，并快速停止在掩模台初始位置，达到快速停止的目的。

Claims (4)

  1. 一种电磁弹射启动式掩模台系统，所述掩模台系统包含底座(1)、平衡块组件、掩模台动台和测量系统，所述平衡块组件包括平衡块(2)、掩模台YZ向电机线圈(5)和掩模台X向电机线圈(6)，平衡块(2)和底座(1)之间设有隔振系统；所述掩模台动台包括掩模台动台基底(12)、掩模台YZ向电机磁钢阵列(13)和掩模台X向电机磁钢阵列(14)，掩模台YZ向电机磁钢阵列(13)安装在掩模台动台基底(12)的下表面，掩模台X向电机磁钢阵列(14)安装在掩模台动台基底(12)的垂直于X方向的两个侧面上，其特征在于：所述电磁弹射启动式掩模台系统还包括弹射结构，所述弹射结构包括弹射结构定子磁钢阵列、弹射结构动子磁钢阵列(4)、弹射台(8)、弹射台电机动子(9)、弹射台电机定子(10)和导轨(11)，弹射台电机定子(10)和导轨(11)固定在平衡块(2)上，弹射台电机动子(9)固定在弹射台(8)的底部，所述弹射结构定子磁钢阵列包括第一弹射结构定子磁钢阵列(3)和第二弹射结构定子磁钢阵列(7)，第一弹射结构定子磁钢阵列(3)装在弹射台(8)和掩模台动台基底(12)相对的侧面上；第二弹射结构定子磁钢阵列(7)装在平衡块(2)上，并和第一弹射结构定子磁钢阵列(3)相对；在掩模台动台基底(12)中垂直于Y方向的两个侧面分别布置所述的弹射结构动子磁钢阵列(4)，并与第一弹射结构定子磁钢阵列(3)和第二弹射结构定子磁钢阵列(7)分别相对安装。
  2. 根据权利要求1所述的一种电磁弹射启动式掩模台系统，其特征在于：平衡块(2)和底座(1)之间的隔振系统采用气浮隔振系统或磁浮隔振系统。
  3. 根据权利要求1所述的一种电磁弹射启动式掩模台系统，其特征在于：所述掩模台YZ向电机磁钢阵列(13)采用halbach阵列。
  4. 根据权利要求1所述的一种电磁弹射启动式掩模台系统，其特征在于：所述测量系统采用激光干涉仪和电容传感器实现六自由度的测量。
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