WO2015199184A1 - Stretched film - Google Patents

Stretched film Download PDF

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Publication number
WO2015199184A1
WO2015199184A1 PCT/JP2015/068369 JP2015068369W WO2015199184A1 WO 2015199184 A1 WO2015199184 A1 WO 2015199184A1 JP 2015068369 W JP2015068369 W JP 2015068369W WO 2015199184 A1 WO2015199184 A1 WO 2015199184A1
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WO
WIPO (PCT)
Prior art keywords
particles
mass
film
stretched film
resin
Prior art date
Application number
PCT/JP2015/068369
Other languages
French (fr)
Japanese (ja)
Inventor
正紀 羽田
吉田 哲男
Original Assignee
帝人株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2014132815A external-priority patent/JP6309838B2/en
Priority claimed from JP2014132816A external-priority patent/JP6367620B2/en
Application filed by 帝人株式会社 filed Critical 帝人株式会社
Priority to CN201580034033.0A priority Critical patent/CN106459448B/en
Publication of WO2015199184A1 publication Critical patent/WO2015199184A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/02Homopolymers or copolymers of hydrocarbons
    • C08L25/04Homopolymers or copolymers of styrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/08Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08L71/10Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C08L71/12Polyphenylene oxides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes

Definitions

  • the first aspect of the present invention relates to an oriented film composed of a styrene polymer having a syndiotactic structure, and more specifically, a stretched film composed of a styrene polymer having a syndiotactic structure with improved winding and scraping properties. It is about.
  • the second aspect of the present invention relates to a stretched film made of a resin composition with improved dispersibility of porous silica particles. More specifically, handling properties such as winding property, abrasion resistance, and dielectric breakdown characteristics made of a resin composition with improved dispersibility of porous silica particles in a polystyrene resin having a syndiotactic structure have been improved.
  • the present invention relates to a stretched film suitable for a film capacitor.
  • a film capacitor is manufactured by a method in which a film such as a biaxially oriented polyethylene terephthalate film or a biaxially oriented polypropylene film and a metal thin film such as an aluminum foil are overlapped and wound or laminated.
  • film capacitors have also been miniaturized and mounted, and further heat resistance has been demanded in addition to electrical characteristics.
  • the range of use extends not only in the cab, but also in the engine room.
  • film capacitors that are suitable for environments with higher temperatures and higher humidity are required. Yes.
  • Japanese Patent Application Laid-Open Nos. 2-143951, 3-124750, 5-200858 and International Publication No. 2008/156210 have synergy excellent in heat resistance and electrical characteristics.
  • a method using an tactic polystyrene film has been proposed.
  • a powder filler is generally added to the resin.
  • a syndiotactic polystyrene resin is used as a film, the winding is performed.
  • Japanese Patent Application Laid-Open No. 2000-173855 uses a polyethylene-2,6-naphthalenedicarboxylate film having higher heat resistance than a polyethylene terephthalate film or a polypropylene film.
  • a method for improving electrical characteristics by controlling viscosity or the like has been proposed.
  • polyethylene-2,6-naphthalenedicarboxylate is a polar polymer, there is a limit to improving the electrical characteristics.
  • Japanese Patent Laid-Open No. 2-143851 Japanese Patent Laid-Open No. 3-124750 Japanese Patent Laid-Open No. 5-200858 International Publication No. 2008/156210 Pamphlet JP 2000-173855 A
  • the first aspect of the present invention has been made in view of the above-described background art, and an object thereof is to provide a stretched film of a syndiotactic polystyrene resin that is excellent in winding property and abrasion resistance.
  • the second aspect of the present invention has been made in view of the above-described background art, and its purpose is excellent in particle dispersibility in a polystyrene resin having a syndiotactic structure, handling properties such as winding property, and abrasion resistance.
  • Another object of the present invention is to provide a stretched film that is excellent in dielectric breakdown characteristics (dielectric breakdown voltage, variation thereof) and can be suitably used particularly for a film capacitor.
  • the stretched film in the present invention can be said to be an oriented film in which molecular chains are oriented by stretching, and is hereinafter sometimes referred to as an oriented film in the first invention.
  • the present inventors diligently studied various inert particles in order to achieve the above object. At that time, porous particles capable of suppressing the generation of voids were examined for polyester and the like, but syndiotactic polystyrene resin did not provide the same effect as polyester film. However, surprisingly, when porous particles were used in combination with silicone oil, it was found that the above problems could be solved, and the first invention was reached.
  • the resin composition comprising a syndiotactic styrene polymer, porous particles having an average particle size of 0.5 to 5.0 ⁇ m and silicone oil,
  • the content is in the range of 0.01% by mass to 3% by mass based on the mass of the resin composition, and the content of silicone oil is 0.1-3% by mass based on the mass of the porous particles.
  • a stretched film having a range (hereinafter referred to as an oriented film in the first invention) is provided.
  • a resin composition in which porous silica particles having specific surface characteristics are blended in a polystyrene-based resin having a syndiotactic structure includes the particles.
  • Stretched film with excellent dispersibility, small voids when formed into a stretched film after dilution with a base resin as necessary, and good handling, dielectric breakdown, and abrasion resistance for film capacitors Has been found to be easily obtained, and has reached the second aspect of the present invention.
  • a resin composition comprising a polystyrene-based resin having a syndiotactic structure and porous silica particles having an average particle diameter A of 0.5 to 5 ⁇ m and a DBA value of 200 mmol / kg or less.
  • the stretched film is a stretched film having a content of the porous silica particles of 0.01% by mass or more and 3% by mass or less based on the amount of the resin composition material.
  • the first and second aspects of the present invention are provided. Specifically, it comprises a resin composition comprising a styrene polymer having a syndiotactic structure and porous particles having an average particle size of 0.5 to 5.0 ⁇ m, and the content of the porous particles is the same as that of the resin composition.
  • the resin composition contains silicone oil, and the silicone oil content is in the range of 0.1 to 3% by mass based on the mass of the porous particles, or (2) the porous particles are There is provided a stretched film characterized by satisfying any one of porous silica particles having an average particle diameter A of 0.5 to 5 ⁇ m and a DBA value of 200 mmol / kg or less.
  • the stretched film of the first aspect of the present invention has a high degree of winding property and wear resistance in the obtained oriented film while using a polystyrene polymer having a syndiotactic structure excellent in electrical characteristics and heat resistance. Can be made.
  • an oriented film having a high dielectric breakdown voltage and a small standard deviation can be obtained, and it can be suitably used as a base film for a film capacitor that is extremely thin and difficult to handle. .
  • the stretched film of the second present invention contains a specific amount of porous silica particles having a specific particle size and a specific surface property in a polystyrene-based resin having a syndiotactic structure excellent in heat resistance and electrical properties,
  • the dispersibility of the particles is extremely good, the voids generated due to the particles are small, the handleability, the dielectric breakdown characteristics, and the abrasion resistance are excellent, and it is particularly suitable for a film capacitor.
  • the oriented film of the present invention comprises a resin composition comprising a styrene polymer having a syndiotactic structure, porous particles having an average particle size of 0.5 to 5.0 ⁇ m, and silicone oil.
  • the polystyrene resin having a syndiotactic structure in the present invention (hereinafter sometimes referred to as “syndiotactic polystyrene resin” or “SPS”) is used as a main chain formed of carbon-carbon bonds.
  • the side chain has a three-dimensional structure in which phenyl groups and substituted phenyl groups are alternately positioned in opposite directions.
  • tacticity is quantified by an isotope carbon nuclear magnetic resonance method ( 13 C-NMR method). Specifically, it can be indicated by the abundance ratio of a plurality of consecutive structural units, for example, a dyad in the case of two, a triad in the case of three, a pentad in the case of five.
  • the polystyrene-based resin having a syndiotactic structure is polystyrene, poly (alkyl) having a syndiotacticity of 75% or more, preferably 85% or more, or 30% or more, preferably 50% or more, of pentad.
  • Styrene poly (halogenated styrene), poly (alkoxystyrene), poly (vinyl benzoate), polymers in which a part of these benzene rings are hydrogenated, mixtures thereof, or structural units thereof.
  • the copolymer containing is designated.
  • poly (alkyl styrene) includes poly (methyl styrene), poly (ethyl styrene), poly (propyl styrene), poly (butyl styrene), poly (phenyl styrene), and the like. ) Include poly (chlorostyrene), poly (bromostyrene), poly (fluorostyrene) and the like.
  • poly (alkoxystyrene) include poly (methoxystyrene) and poly (ethoxystyrene).
  • polystyrene resins include polystyrene, poly (p-methylstyrene), poly (m-methylstyrene), poly (p-tertiarybutylstyrene), poly (p-chlorostyrene), and poly (m- Chlorostyrene), poly (p-fluorostyrene), and a copolymer of styrene and p-methylstyrene.
  • polystyrene is preferable.
  • polystyrene resin in the present invention is used as a copolymer containing a copolymer component, as its comonomer, in addition to the above-mentioned polystyrene resin monomer, ethylene, propylene, butene, hexene, octene.
  • Olefin monomers such as diene monomers such as butadiene and isoprene, cyclic diene monomers, polar vinyl monomers such as methyl methacrylate, maleic anhydride, and acrylonitrile.
  • the weight average molecular weight of this syndiotactic polystyrene resin is preferably 1.0 ⁇ 10 4 to 3.0 ⁇ 10 6 , more preferably 5.0 ⁇ 10 4 to 1.5 ⁇ 10 6. 6 , particularly preferably 1.1 ⁇ 10 5 to 8.0 ⁇ 10 5 .
  • the weight average molecular weight is preferably 1.0 ⁇ 10 4 or more, preferably 5.0 ⁇ 10 4 or more, and particularly preferably 1.1 ⁇ 10 5 or more, the strength and elongation characteristics are excellent and the heat resistance is further improved.
  • a molded product such as a film can be obtained.
  • the stretching tension is in a suitable range, and at the time of film formation, etc. Breakage and the like are less likely to occur.
  • the porous particles contained in the oriented film of the present invention must have an average particle size of 0.5 to 5 ⁇ m, preferably 0.8 to 2.5 ⁇ m.
  • this average particle diameter is less than 0.5 ⁇ m, the slipping property of the film is insufficient, and the winding property and handling property become insufficient.
  • the diameter of voids formed around the particles by stretching or the like becomes large, which is not preferable.
  • the content of the particles is 0.01 to 3% by mass, more preferably 0.02 to 1% by mass, particularly preferably 0.05 to 0.5% by mass, based on the amount of the resin composition substance. There is a need to. If this content is less than the lower limit, the slipping property is insufficient and the winding property becomes poor. On the other hand, if the upper limit is exceeded, the abrasion resistance becomes insufficient, and the dielectric breakdown characteristics and film-forming stretchability are impaired.
  • the porous particles used in the present invention preferably have an average particle size of 0.5 to 5 ⁇ m, more preferably 0.8 to 2.5 ⁇ m.
  • the porous particles used in the present invention may further have a compressibility (at 0.2 gf load: measured by a micro compression test MCTM-200 manufactured by Shimadzu Corporation) of 20 to 90%, particularly 50 to 85%. preferable.
  • this value is less than the lower limit, for example, when it is a stretched film, the effect of improving the abrasion resistance is poor.
  • the upper limit is exceeded, for example, when a stretched film is formed, the particles are crushed and protrusion formation is insufficient, and the effect of improving the winding property is reduced.
  • the compression ratio is in the above-described appropriate range, the particles are appropriately deformed by the stress at the time of processing into a stretched film or the like, and it becomes easy to achieve both high winding properties and wear resistance.
  • porous particles particles known per se can be used, and porous silica particles are particularly preferred.
  • the production method of the porous silica particles is not particularly limited, and a known method produced by a conventionally known method such as a sol-gel method or a precipitation method can be used. Among them, those having a pore volume in the range of 0.4 to 2.5 ml / g, particularly 1.2 to 1.8 ml / g are preferable, and those having an average pore diameter in the range of 5 to 25 nm. Is preferred.
  • the oriented film of the present invention further uses silicone oil as described above.
  • the content of the silicone oil is in the range of 0.1 to 3% by mass, preferably 0.2 to 2.0% by mass, based on the mass of the porous particles.
  • the content of the silicone oil is less than the lower limit, the dispersibility of the porous particles is deteriorated to form coarse aggregated particles, resulting in poor film-forming stretchability and poor abrasion resistance.
  • silicone oil may bleed out on the surface of the film and contaminate the processing process.
  • the silicone oil referred to here is a silicone compound having a dialkylsiloxane component as a main repeating unit, and has a linear structure having a siloxane bond of 2000 or less.
  • silicone compound having a dialkylsiloxane component as a main repeating unit, and has a linear structure having a siloxane bond of 2000 or less.
  • polysiloxane side chain dimethylpolysiloxane having all methyl groups at the ends, methylphenyl polysiloxane having a part of the polysiloxane side chain having a phenyl group, and methyl having a part of the side chain of the polysiloxane having hydrogen
  • straight silicone oils such as hydrogen polysiloxane, and other modified silicone oils in which an organic group is introduced at the side chain and terminal.
  • Organic groups introduced into the modified silicone oil include monoamine groups, diamine groups, amino groups, epoxy groups, alicyclic epoxy groups, mercapto groups, carboxyl groups, polyether groups, aralkyl groups, fluoroalkyl groups, and long-chain alkyl groups.
  • dimethylpolysiloxane is preferred because of its excellent heat resistance.
  • the method of blending the silicone oil into the film is not particularly limited, but the method of directly dropping or applying to the porous particles, spraying with a spray, etc., and stirring in a mixer or the like is selectively applied to the surface of the porous particles.
  • the silicone oil is preferable because it is easy to be present.
  • the porous particles subjected to the silicone oil adhesion treatment may be added at the polymerization stage of the resin material, or may be added to the resin material obtained by polymerization by a melt-kneading method, and there is no particular limitation.
  • the resin material is first charged into a melt kneader such as a method of melt kneading by supplying the porous particle powder and the resin material from the same supply port of the melt kneader, or a biaxial kneading extruder with a vent.
  • a method may be used in which the porous particles are added to the melted portion of the resin material and melt kneaded.
  • a method is preferable in which the particles to which the silicone oil is adhered and the resin pellets or resin powder are mixed in advance and then fed into a vented twin-screw kneading extruder.
  • the particles are attached to the surface of the resin pellets or resin powder, when the crushing progresses inside the kneader, the contact distance between the particles and the resin is extremely small, so that the dispersibility is high. It is estimated that it will further improve.
  • a particle addition port is provided in a full flight part of a screw arranged inside a vented twin screw kneading extruder, and a feed blade and a return blade for kneading and dispersing particles are provided. It is preferable to use a device in which at least one rotor segment having at least one rotor segment is provided downstream from the addition port in the axial direction of the screw.
  • the vent line is for removal of by-products from the resin.
  • the vented twin-screw kneading extruder preferably has 1 to 3 rotor segments.
  • the kneading dispersibility of the particles will be reduced, and if the rotor segment exceeds three locations, the propulsive force of the resin will be reduced and venting will be likely to occur.
  • the number of coarse aggregated particles having a maximum length of 25 ⁇ m or more in the film is preferably 10 or less per 1 m 2 , more preferably 5 / m 2 or less, and particularly preferably 3 / m 2 or less. If the number of coarse agglomerated particles is larger than the upper limit, uneven projections are generated on the surface of the film, which is inappropriate because a winding shift is deteriorated and workability is lowered when a wound film is formed. Moreover, it becomes a starting point of a fracture
  • particles B different from the porous particles can be added in addition to the porous particles as long as the object of the present invention is not impaired.
  • the particles B in the present invention preferably play a role of forming smaller protrusions because the porous particles described above form relatively large protrusions.
  • the particle B is preferably smaller in particle size than the above-described porous particles, and particles that are less likely to aggregate due to the smaller particle size are preferable.
  • the average particle diameter A of the particles B is preferably 0.01 ⁇ m or more and less than 0.5 ⁇ m. More preferably, it is 0.1 ⁇ m or more and less than 0.4 ⁇ m. If the average particle diameter A is less than the lower limit, sufficient slipperiness cannot be obtained, which is not preferable. On the other hand, if the average particle diameter A exceeds the upper limit, the abrasion resistance deteriorates, which is not preferable.
  • the content of the particles B in the present invention is preferably 0.5% by weight or less based on the mass of the oriented film.
  • the dielectric breakdown voltage may be lowered because the frequency of voids due to particles increases. From such a viewpoint, it is more preferably 0.5% by weight or less, and particularly preferably 0.2% by weight or less.
  • the spherical shape in the present invention means a shape in which the ratio of the maximum major axis to the area circle equivalent diameter is 1.5 or less, preferably 1.2 or less, when image analysis is performed on the particle shape.
  • Specific particles are not particularly limited, and are known per se (1) silicon dioxide (including hydrate, silica sand, quartz and the like); (2) alumina in various crystal forms; (3) SiO 2 Silicates containing 30% by weight or more of components (for example, amorphous or crystalline clay minerals, aluminosilicates (including calcined products and hydrates), warm asbestos, zircon, fly ash, etc.); (4) Mg Oxides of Zn, Zn, Zr, and Ti; (5) sulfates of Ca and Ba; (6) phosphates of Li, Ba, and Ca (including monohydrogen and dihydrogen salts); (7) Benzoates of Li, Na, and K; (8) terephthalates of Ca, Ba, Zn, and Mn; (9) Mg, Ca, Ba, Zn, Cd, Pb, Sr, Mn, Fe, Co, And Ni titanates; (10) Ba and Pb chromium (11) Carbon (eg, carbon black, graphite, etc.);
  • An oriented film of the present invention comprises a resin composition comprising the above-mentioned styrenic polymer having a syndiotactic structure, porous particles having an average particle size of 0.5 to 5.0 ⁇ m, and silicone oil, which is at least uniaxially oriented.
  • a resin composition comprising the above-mentioned styrenic polymer having a syndiotactic structure, porous particles having an average particle size of 0.5 to 5.0 ⁇ m, and silicone oil, which is at least uniaxially oriented.
  • it is an oriented film in which molecular chains are oriented by stretching in biaxial directions.
  • the resin composition in the present invention preferably contains the following thermoplastic amorphous resin Y.
  • the thermoplastic amorphous resin Y here is preferably a thermoplastic amorphous resin having a glass transition temperature Tg determined by DSC (differential scanning calorimeter) having a Tg higher than SPS.
  • Tg glass transition temperature
  • the substantial upper limit is preferably 350 ° C., more preferably 300 ° C.
  • thermoplastic amorphous resin Y examples include aromatic polyethers such as polyphenylene ether and polyetherimide, polycarbonate, polyarylate, polysulfone, polyethersulfone, and polyimide. Among these, it is easy to improve stretchability, and because it has a synergistic effect when combined with an antioxidant, not only heat resistance and dimensional stability, but also dielectric breakdown voltage is further improved. Particularly preferred.
  • aromatic polyethers such as polyphenylene ether and polyetherimide, polycarbonate, polyarylate, polysulfone, polyethersulfone, and polyimide.
  • polyphenylene ether resin used here include conventionally known resins such as poly (2,3-dimethyl-6-ethyl-1,4-phenylene ether) and poly (2-methyl-6-chloromethyl-1).
  • 4-phenylene ether poly (2-methyl-6-hydroxyethyl-1,4-phenylene ether), poly (2-methyl-6-n-butyl-1,4-phenylene ether), poly (2-ethyl-6-isopropyl-1,4-phenylene ether), poly (2-ethyl-6-n-propyl-1,4-phenylene ether), poly (2,3,6-trimethyl-1) , 4-phenylene ether), poly (2- (4′-methylphenyl) -1,4-phenylene ether), poly (2-bromo-6-phenyl-1,4-phenylene ether), poly 2-methyl-6-phenyl-1,4-phenylene ether), poly (2-phenyl-1,4-phenylene ether), poly (2-chloro-1,4-phenylene ether), poly (2 -Methyl-1,4-phenylene ether), poly (2-chloro-6-ethyl-1,4-phenylene ether), poly (2-chloro
  • those modified with a modifying agent such as maleic anhydride or fumaric acid are also preferably used.
  • a copolymer obtained by graft copolymerization or block copolymerization of a vinyl aromatic compound such as styrene with the polyphenylene ether is also used.
  • poly (2,6-dimethyl-1,4-phenylene ether) is particularly preferred.
  • the intrinsic viscosity of the polyphenylene ether resin is preferably in the range of 0.2 to 0.8 dl / g, more preferably in the range of 0.3 to 0.6 dl / g when measured at 30 ° C. in chloroform.
  • the intrinsic viscosity is less than 0.2 dl / g, the mechanical strength of the resulting resin composition may be lowered.
  • it exceeds 0.8 dl / g the fluidity of the resulting resin composition is lowered, and the processing during melt molding into a film or the like tends to be difficult.
  • Two or more types of polyphenylene ether resins may be used in combination, and in this case, those having different intrinsic viscosities may be mixed to obtain a desired intrinsic viscosity.
  • the oriented film of the present invention preferably contains 5% by mass or more and 48% by mass or less of the above thermoplastic amorphous resin Y with respect to the mass of the oriented film.
  • the heat resistance is excellent and the effect of improving the dielectric breakdown voltage can be increased. That is, the dielectric breakdown voltage at high temperatures can be increased.
  • the heat resistance tends to be inferior, the effect of improving the dielectric breakdown voltage tends to be low, and the effect of improving the stretchability is poor.
  • the content of the thermoplastic amorphous resin Y is more preferably 8% by mass or more, further preferably 11% by mass or more, and particularly preferably 20% by mass or more. Moreover, when there is too much content, it exists in the tendency for the crystallinity of SPS to fall easily, and it exists in the tendency for the heat resistance of a film to be inferior. From such a viewpoint, the content of the thermoplastic amorphous resin Y is more preferably 45% by mass or less, further preferably 40% by mass or less, and particularly preferably 35% by mass or less.
  • the oriented film of the present invention may further use other resins in addition to the SPS and the thermoplastic amorphous resin Y as long as the object of the present invention is not impaired.
  • the oriented film of the present invention preferably contains an antioxidant.
  • the antioxidant may be either a primary antioxidant that captures the generated radicals to prevent oxidation, or a secondary antioxidant that decomposes the generated peroxides to prevent oxidation.
  • Examples of the primary antioxidant include phenol-based antioxidants and amine-based antioxidants, and examples of the secondary antioxidant include phosphorus-based antioxidants and sulfur-based antioxidants. Of these, primary antioxidants are preferred, and phenolic antioxidants are particularly preferred.
  • the antioxidant has a thermal decomposition temperature of 250 ° C. or higher.
  • the thermal decomposition temperature of the antioxidant is more preferably 280 ° C. or higher, further preferably 300 ° C. or higher, and particularly preferably 320 ° C. or higher.
  • the antioxidant in the present invention is preferably less susceptible to thermal decomposition and preferably has a higher thermal decomposition temperature, but in reality, the upper limit is about 500 ° C. or less.
  • the melting point of the antioxidant is preferably 90 ° C. or higher. If the melting point is too low, the antioxidant melts faster than the polymer during melt extrusion, and the polymer tends to slip at the screw supply portion of the extruder. As a result, the supply of the polymer becomes unstable, and problems such as the uneven thickness of the film occur. From such a viewpoint, the melting point of the antioxidant is more preferably 120 ° C. or higher, further preferably 150 ° C. or higher, and particularly preferably 200 ° C. or higher. On the other hand, when the melting point of the antioxidant is too high, the antioxidant becomes difficult to melt during melt extrusion, and the dispersion in the polymer tends to be poor. Thereby, problems such as the effect of adding the antioxidant appear only locally. From such a viewpoint, the melting point of the antioxidant is preferably 300 ° C. or lower, more preferably 250 ° C. or lower, further preferably 220 ° C. or lower, and particularly preferably 170 ° C. or lower.
  • antioxidants commercially available products can be used as they are.
  • Commercially available products include, for example, pentaerythritol tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate] (manufactured by Ciba Specialty Chemicals: trade name IRGANOX 1010), N, N′— Bis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionyl] hydrazine (manufactured by Ciba Specialty Chemicals: trade name IRGANOX1024), N, N′-hexane-1,6-diylbis [ 3- (3,5-di-t-butyl-4-hydroxyphenyl) propionamide] (manufactured by Ciba Specialty Chemicals: trade name IRGANOX 1098) is preferred.
  • the content of the antioxidant is preferably 0.1% by mass or more and 5% by mass or less based on the mass of the oriented film.
  • the content of the antioxidant is more preferably 0.2% by mass or more, further preferably 0.5% by mass or more, and particularly preferably 0.7% by mass or more.
  • the content of the antioxidant is more preferably 3% by mass or less, further preferably 2% by mass or less, and particularly preferably 1.5% by mass or less.
  • antioxidants may be used alone or in combination of two or more.
  • the oriented film of the present invention contains other resin components different from the thermoplastic amorphous resin Y, for example, in order to further improve the moldability, mechanical properties, surface properties, etc., as long as the object of the present invention is not impaired.
  • additives such as antistatic agents, colorants, weathering agents and the like can be added.
  • porous particles and inert particles other than the above-described particle B may be used in a small amount as long as the object of the present invention is not impaired.
  • the oriented film of the present invention becomes a capacitor by, for example, laminating a metal layer on at least one side.
  • the material of the metal layer is not particularly limited, and examples thereof include aluminum, zinc, nickel, chromium, tin, copper, and alloys thereof. Further, these metal layers may be slightly oxidized. Moreover, since a metal layer can be formed easily, it is preferable that a metal layer is a vapor deposition type metal layer formed by the vapor deposition method.
  • the base material layer and the metal layer have an appropriate adhesive force, such as winding in film capacitor production.
  • the metal layer does not peel off, and the function as a capacitor is exhibited.
  • the coating layer and the metal layer have moderate adhesion, and even if a discharge occurs, the coating layer with a small surface energy is peeled off from the film first, and only the metal layer and the coating layer are destroyed. It is not destroyed, thereby not being short-circuited, and the effect of improving the dielectric breakdown voltage can be increased.
  • the oriented film of the present invention preferably has a refractive index in the thickness direction of 1.575 or more and 1.635 or less.
  • the refractive index in the thickness direction is preferably 1.620 or less, more preferably 1.615 or less, and particularly preferably 1.610 or less.
  • the refractive index in the thickness direction is too low, the dielectric breakdown voltage tends to be low.
  • the highly insulating film of the present invention increases the frequency of film breakage in the capacitor manufacturing process, and the productivity of the capacitor tends to decrease. Furthermore, the thickness unevenness of the film tends to deteriorate, and it becomes difficult to obtain a capacitor with stable quality.
  • the refractive index in the thickness direction is preferably 1.590 or more, more preferably 1.595 or more, and particularly preferably 1.600 or more.
  • the refractive index in the thickness direction as described above can be adjusted according to the stretching conditions of the film.
  • the thickness of the oriented film of the present invention is not particularly limited, it is particularly preferably 0.4 ⁇ m or more and less than 6.5 ⁇ m because the effects of the present invention are more likely to become thinner. More preferably, it is 0.4 ⁇ m or more and less than 6.0 ⁇ m, and particularly preferably 0.5 ⁇ m or more and less than 3.5 ⁇ m. Further, by setting the film thickness as described above, a capacitor having a high capacitance can be obtained.
  • the oriented film of the present invention preferably contains substantially no voids around the porous particles.
  • “substantially not containing a void” means containing a void that does not contain a void, does not cause particle dropout, or contains a void that does not lower the dielectric breakdown voltage. That is, when the void ratio described later is measured, it means that the void ratio is 50% or less, particularly preferably 30% or less. When the void ratio exceeds the upper limit, the filler falls off during processing, and not only the process contamination but also the surface roughness changes, resulting in problems in winding the film roll.
  • the oriented film of the present invention preferably has a dielectric breakdown voltage (BDV) at 120 ° C. of 450 kV / mm or more.
  • BDV dielectric breakdown voltage
  • the fact that the dielectric breakdown voltage is in the above numerical range means that the dielectric breakdown voltage is excellent even at a high temperature.
  • the dielectric breakdown voltage is more preferably 500 kV / mm or more, and further preferably 520 kV / mm or more.
  • the standard deviation of the oriented film of the present invention is preferably 40 kV / mm or less, more preferably 30 kV / mm or less, and still more preferably 20 kV / mm or less.
  • the oriented film of the present invention has a high average value of dielectric breakdown voltage by using specific porous particles, and can reduce the standard deviation of the material.
  • an electrical insulating material such as a capacitor
  • Reliability can be increased. That is, since the standard deviation of the breakdown voltage can be reduced, a decrease in the minimum value of the breakdown voltage is suppressed, and the average value of the breakdown voltage is increased.
  • the oriented film of the present invention can basically be obtained by a method conventionally known or accumulated in the art.
  • the production method for obtaining the oriented film of the present invention will be described in detail.
  • the oriented film of the present invention may be a uniaxially oriented film or a biaxially oriented film, but is preferably a biaxially oriented film from the viewpoint of the balance between productivity and physical properties.
  • a biaxially oriented film will be described as an example.
  • a resin composition containing SPS, porous particles, and silicone oil is heated and melted to prepare an unstretched sheet.
  • the resin composition is heated and melted at a temperature not lower than the melting point (Tm, unit: ° C.) and not higher than (Tm + 50 ° C.), extruded into a sheet, cooled and solidified to obtain an unstretched sheet.
  • Tm melting point
  • this unstretched sheet is stretched biaxially. Stretching may be performed simultaneously in the machine direction (machine axis direction) and the transverse direction (direction perpendicular to the machine axis direction and the thickness direction) or sequentially in any order.
  • a uniaxial direction glass transition temperature (Tg, unit: ° C.) ⁇ 10 ° C.) to (Tg + 70 ° C.) or less at a temperature of 3.2 to 5.8 times
  • the film is stretched at a magnification of 3.3 times to 5.4 times, more preferably 3.4 times to 5.0 times, and then a temperature of Tg or more (Tg + 80 ° C.) in a direction perpendicular to the uniaxial direction.
  • the coating layer is formed by applying a coating solution for forming a coating layer on an unstretched sheet or a uniaxially stretched film obtained by uniaxially stretching the unstretched sheet in the longitudinal direction. It may be formed.
  • heat setting is performed at a temperature of (Tg + 70 ° C.) to Tm.
  • the heat setting temperature is 200 ° C. or higher and 260 ° C. or lower, preferably 225 ° C. or higher and 255 ° C. or lower, and more preferably 235 ° C. or higher and 250 ° C. or lower.
  • the heat setting temperature is too high, film breakage is likely to occur particularly when a film having a thin film thickness is produced, and the thickness unevenness is deteriorated.
  • relaxation treatment is performed at a temperature lower than the heat setting temperature by 20 ° C. to 90 ° C. as necessary after heat setting, the dimensional stability is improved.
  • the stretched film of the second aspect of the invention includes a syndiotactic polystyrene resin (hereinafter sometimes referred to as SPS) and porous silica particles having an average particle diameter A of 0.5 to 5.0 ⁇ m. It consists of a resin composition.
  • SPS syndiotactic polystyrene resin
  • porous silica particles having an average particle diameter A of 0.5 to 5.0 ⁇ m. It consists of a resin composition.
  • the polystyrene resin having a syndiotactic structure used here can be said to be the same as described in the first aspect of the present invention.
  • porous silica particles contained in the stretched film of the present invention can be said to be the same as described in the first aspect of the present invention unless otherwise specified. Unlike the first aspect of the present invention, since it has a specific specific surface area and DBA value, silicone oil may not be used in combination.
  • the porous silica particles used in the second present invention are required to have a DBA value (di-n-butylamine adsorption amount) of 200 mmol / kg or less, preferably 100 mmol / kg or less.
  • a DBA value di-n-butylamine adsorption amount
  • the DBA value exceeds 200 mmol / kg, not only the dispersion of the porous silica particles in the resin composition is deteriorated, but also voids are easily generated between the resin and the particles when formed into a stretched film. This is not preferable.
  • the DBA value here is the amount of di-n-butylamine adsorbed when the porous silica particles are treated with a toluene solution of di-n-butylamine (the amount of adsorbed di-n-butylamine per milligram of particles). It is.
  • the production method of the porous silica particles is not particularly limited, and the surface of the porous silica particles produced by a conventionally known method such as a sol-gel method or a precipitation method is treated with, for example, an alkylalkoxysilane compound or a silazane compound.
  • a sol-gel method or a precipitation method is treated with, for example, an alkylalkoxysilane compound or a silazane compound.
  • it can be easily obtained by modifying the silanol group on the particle surface.
  • the affinity with a polystyrene resin having a syndiotactic structure is lowered, and the dispersibility of the particles in the resin composition is lowered.
  • voids are likely to be generated between the resin and the particles when formed into a stretched film, and when the activity of the particle surface is increased and blended into the resin material, problems such as particle re-aggregation occur. It becomes easy to do.
  • the porous silica particles are preferably aggregated particles in which primary particles are aggregated, and more preferably, the primary particle diameter is 0.01 to 0.1 ⁇ m and the pore volume is 0.5 to 2. It is preferably in the range of 0 ml / g, and the average pore diameter is preferably in the range of 5 to 25 nm.
  • the stretched film of the second invention described above has particles having an average particle size A of 0.01 ⁇ m or more and less than 0.5 ⁇ m (hereinafter referred to as inactive particles C) in addition to the porous silica particles described above. It is preferable to contain a certain). By containing such inactive particles C, the stretched film can have good slipping property while maintaining a high dielectric breakdown voltage, and a stretched film excellent in winding property can be obtained. When the average particle diameter A of the inert particles C is too small, the effect of improving the slipping property tends to be lowered, and the effect of improving the winding property is also lowered.
  • the average particle diameter A of the inert particles C is preferably 0.05 ⁇ m or more and less than 0.5 ⁇ m, more preferably 0.1 ⁇ m or more and less than 0.5 ⁇ m, particularly preferably 0.2 to 0.4 ⁇ m. It is.
  • the average particle diameter A of the inert particles C is preferably smaller than the average particle diameter A of the porous silica particles, and the difference is preferably 0.2 ⁇ m or more.
  • Such inert particles C are preferably spherical particles having a particle size ratio (major axis / minor axis) of 1.0 to 1.3.
  • the particle size ratio is more preferably 1.0 to 1.2, particularly preferably 1.0 to 1.1.
  • the particle size ratio is in the above numerical range, the effect of improving the winding property and the effect of improving the dielectric breakdown voltage can be further increased.
  • Such inert particles may be either organic particles or inorganic particles.
  • the organic particles include polymer resin particles such as polystyrene resin particles, silicone resin particles, acrylic resin particles, styrene-acrylic resin particles, divinylbenzene-acrylic resin particles, polyester resin particles, polyimide resin particles, and melamine resin particles.
  • silicone resin particles and polystyrene resin particles are preferable from the viewpoint of excellent slipperiness and abrasion resistance, and spherical silicone resin particles and spherical polystyrene resin particles are particularly preferable as described above.
  • the inorganic particles include particles (1) to (15) exemplified for the particles B described in the first aspect of the present invention.
  • calcium carbonate particles and silica particles are preferable, and silica particles are particularly preferable from the viewpoint of excellent slipperiness and abrasion resistance.
  • Such inorganic particles are preferably spherical as described above, and spherical silica particles are particularly preferred.
  • the inert particles C are spherical silicone resin particles.
  • spherical silicone resin particles are used as the inert particles, the heat resistance becomes particularly high due to a synergistic effect when polyphenylene ether is used in combination as a thermoplastic amorphous resin described later.
  • the content of the inert particles C is preferably 0.01 to 3% by mass, more preferably 0.05 to 2% by mass, and further preferably 0.1 to 0.5% by mass in 100% by mass of the resin composition. %, Particularly preferably 0.1 to 0.3% by mass or less.
  • the inert particles are added as they are or as master chips so that the content of the inert particles in the resulting film is in the above range. It doesn't matter.
  • the stretched film of the second present invention further contains a thermoplastic amorphous resin.
  • the thermoplastic amorphous resin here can be said to be the same as that described in the first aspect of the present invention.
  • the stretched film of the second invention further contains an antioxidant.
  • an antioxidant the same thing as described in the first aspect of the present invention can be said.
  • the stretched film of the second aspect of the present invention is a resin component different from the thermoplastic amorphous resin, for example, in order to further improve the film forming property, the mechanical properties, the surface property, etc., within the range not impairing the object of the present invention.
  • additives such as antistatic agents, colorants, weathering agents and the like can be added.
  • inert particles other than the above-mentioned particles may be used in a small amount as long as the object of the present invention is not impaired.
  • the stretched film of the second invention can be said to have the same refractive index in the thickness direction and coarse agglomerated particles having a maximum length of 25 ⁇ m or more present in the film as described in the first invention.
  • the stretched film of the second invention has substantially no void around the porous silica particles.
  • substantially no void is the same as described in the first aspect of the present invention. If the void ratio exceeds 50%, particles fall off during processing, and not only process contamination but also the surface roughness changes, resulting in poor handling of the film roll. In addition, the dielectric breakdown voltage decreases and the variation tends to increase (dielectric breakdown characteristics tend to deteriorate).
  • the thickness of the stretched film of the second invention is not particularly limited, but it is particularly preferably 0.4 to 6.5 ⁇ m because the effects of the invention are more likely to be obtained as the thickness is reduced. More preferably, it is 0.4 to 6.0 ⁇ m, and particularly preferably 0.5 to 3.5 ⁇ m. By using such a film thickness, a capacitor having a high capacitance can be obtained.
  • the stretched film of the second invention preferably has a dielectric breakdown voltage (BDV) at 120 ° C. of 450 V / ⁇ m or more.
  • BDV dielectric breakdown voltage
  • the fact that the breakdown voltage satisfies such a requirement means that the breakdown voltage is excellent even at a high temperature.
  • the breakdown voltage is more preferably 500 V / ⁇ m or more, and further preferably 520 V / ⁇ m or more.
  • the standard deviation of the dielectric breakdown voltage is preferably 40 V / ⁇ m or less, more preferably 30 V / ⁇ m or less, and still more preferably 20 V / ⁇ m or less. If this standard deviation satisfies this requirement, it means that the local breakdown voltage drop is small (variation is small), and it increases the reliability of the material when used as an electrical insulation material such as a capacitor. Can do.
  • the stretched film of the second aspect of the present invention preferably has a center line average surface roughness Ra of 7 to 89 nm on at least one side.
  • the center line average surface roughness Ra is within this range, the effect of improving the winding property can be increased. Moreover, blocking resistance improves and the external appearance of a roll can be made favorable.
  • the center line average surface roughness Ra is too low, the slipping property tends to be too low, and the effect of improving the winding property is lowered. On the other hand, if it is too high, the slipping property tends to be too high, and the effect of improving the winding property becomes low, such as the occurrence of end face misalignment during winding.
  • the lower limit of the centerline average surface roughness Ra is more preferably 11 nm or more, further preferably 21 nm or more, and particularly preferably 31 nm or more.
  • the upper limit of the center line average surface roughness Ra is more preferably 79 nm or less, still more preferably 69 nm or less, and particularly preferably 59 nm or less.
  • the stretched film of the second invention preferably has a 10-point average roughness Rz of 200 to 3000 nm on at least one side thereof.
  • the 10-point average roughness Rz is within this range, the effect of improving the winding property can be increased.
  • the 10-point average roughness Rz is too low, the air release property tends to be low when the film is wound as a roll, and the effect of improving the winding property such that the film is liable to skid is reduced.
  • the film thickness is thin, the film loses its elasticity, so that the air release property tends to be further lowered, and the effect of improving the winding property is further reduced.
  • the lower limit of the 10-point average roughness Rz is more preferably 600 nm or more, further preferably 1000 nm or more, and particularly preferably 1250 nm or more.
  • the upper limit of the 10-point average roughness Rz is more preferably 2600 nm or less, further preferably 2250 nm or less, and particularly preferably 1950 nm or less.
  • the stretched film of the second invention described above can be produced by the same production method as described in the first invention except that the silicone oil need not be added.
  • the resin composition preferably used for the production of the stretched film of the second invention is obtained by melting and mixing porous silica particles with the above-mentioned syndiotactic polystyrene resin.
  • the average particle diameter B of the porous silica particles used here is preferably in the range of 0.5 to 5 ⁇ m, particularly 0.8 to 3.0 ⁇ m.
  • this average particle size is less than 0.5 ⁇ m, the average particle size A of the porous silica particles in the film when melt-formed into a film or the like becomes small and the slipping property is insufficient, so that the winding property and handling property are insufficient. Tends to be insufficient.
  • the thickness exceeds 5 ⁇ m the diameter of voids formed around the particles by stretching or the like tends to increase when melt-molding into a film or the like.
  • the content of the particles is 0.01 to 10% by mass, preferably 0.5 to 5.0% by mass based on the amount of the resin composition material. If the content is less than 0.01% by mass, the slidability of the molded product after being formed into a film or the like is insufficient, and the handleability becomes insufficient. On the other hand, when it exceeds 10% by mass, the dispersion of the particles in the resin composition is deteriorated, which is not preferable.
  • the content of the particles is 0.01 to 3% by mass, further 0.02 to 1% by mass, particularly 0.05, as described above. It is preferably in the range of 0.5% by mass.
  • a resin composition having a high content for example, 0.5 to 10% by mass is used. What is necessary is just to dilute so that content of may become said range.
  • the DBA value of the porous silica particles needs to be 200 mmol / kg or less, preferably 100 mmol / kg or less as described above.
  • the DBA value exceeds 200 mmol / kg, not only the dispersion of the porous silica particles in the resin composition is deteriorated, but also voids are easily generated between the resin and the particles when formed into a stretched film. This is not preferable.
  • the compressibility of the porous silica particles is preferably in the range of 20 to 90%, particularly 50 to 85% as described above. When the compression ratio is within this range, it is considered that the diameter of the void formed around the particles is reduced by moderately deforming the particles due to the stress at the time of processing into a stretched film.
  • the resin composition preferably contains a thermoplastic amorphous resin, particularly a polyphenylene ether resin.
  • the thermoplastic amorphous resin content is 48 mass% or less, and more preferably in the range of 5 to 48 mass%, based on the mass of the resin composition. It is preferable that By doing so, it is possible to obtain a stretched film having excellent heat resistance and a high breakdown voltage, that is, an improved breakdown voltage at a high temperature.
  • the content is too small, the heat resistance improving effect tends to be low, the dielectric breakdown voltage improving effect tends to be low, and the stretchability improving effect is poor.
  • the content of the thermoplastic amorphous resin is more preferably 8% by mass or more, further preferably 11% by mass or more, and particularly preferably 20% by mass or more. Moreover, when there is too much content, it exists in the tendency for the crystallinity of SPS to fall easily, and it exists in the tendency for the heat resistance of a film to fall. From such a viewpoint, the content of the thermoplastic amorphous resin is more preferably 45% by mass or less, further preferably 40% by mass or less, and particularly preferably 35% by mass or less.
  • the resin composition is used as a masterbatch and does not contain porous silica particles, for example, a base resin such as a syndiotactic polystyrene resin or a masterbatch containing other additives is melt-kneaded and diluted.
  • a resin composition having a high polyphenylene ether resin content for example, a content of 20 to 80% by mass, it is diluted so that the content in the resin composition molded into a film is within the above range. do it.
  • the mixing method of the porous silica particles and the resin material is not particularly limited, and may be added at the polymerization stage of the resin material, or may be added by a method of melt-kneading the resin material obtained by polymerization. May be.
  • the particle powder and the resin material may be supplied from the same supply port of the melt kneader and melt kneaded, or the resin material is first put into a melt kneader such as a biaxial kneading extruder with a vent.
  • a method of adding the particles to the portion where the resin material is melted may be used.
  • a method is preferable in which the particles and resin pellets or resin powder are mixed in advance and then fed into a vented twin-screw kneading extruder.
  • the particles are attached to the surface of the resin pellets or resin powder, when the crushing progresses inside the kneader, the contact distance between the particles and the resin is extremely small, so that the dispersibility is high. It is estimated that it will further improve.
  • a particle addition port is provided in a full flight part of a screw arranged inside a vented twin screw kneading extruder, and a feed blade and a return blade for kneading and dispersing particles are provided. It is preferable to use a device in which at least one rotor segment having at least one rotor segment is provided downstream from the addition port in the axial direction of the screw.
  • the vent line is for removal of by-products from the resin.
  • the vented twin-screw kneading extruder preferably has 1 to 3 rotor segments.
  • the kneading dispersibility of the particles will be reduced, and if the rotor segment exceeds three locations, the propulsive force of the resin will be reduced and venting will be likely to occur.
  • the stretched film of the present invention described above can obtain a capacitor by, for example, laminating a metal layer on at least one side.
  • the material of the metal layer is not particularly limited, and examples thereof include aluminum, zinc, nickel, chromium, tin, copper, and alloys thereof. Further, these metal layers may be slightly oxidized. Moreover, since a metal layer can be formed easily, it is preferable that a metal layer is a vapor deposition type metal layer formed by the vapor deposition method.
  • the stretched film layer (base material layer) and the metal layer can have an appropriate adhesive force, and processing such as winding in the production of film capacitors.
  • the metal layer is not peeled off and the function as a capacitor is exhibited. Furthermore, at the same time, the coating layer and the metal layer have moderate adhesion, and even if a discharge occurs, the coating layer with a small surface energy is peeled off from the film first, and only the metal layer and the coating layer are destroyed. It is not destroyed, thereby not being short-circuited, and the effect of improving the dielectric breakdown voltage can be increased.
  • Each characteristic value was measured by the following method.
  • the film surface was treated with a plasma reactor to expose the particles, and a gold thin film deposition layer was formed on the surface with a thickness of 200 to 300 mm by a gold sputtering apparatus.
  • observation was performed at a magnification of 15,000 using a scanning electron microscope, and the area equivalent particle diameter (Di) of 110 particles was obtained with Luzex 500 manufactured by Japan Regulator Co., Ltd.
  • the number average of these area equivalent particle diameters (Di) excluding the five area equivalent particle diameters (Di) of the maximum and minimum diameters (Di) was defined as the average particle diameter A of the particles.
  • Porous particles and other particles Select the solvent in which the obtained oriented film dissolves the resin but does not dissolve the particles, dissolve the sample, centrifuge the particles from the resin, and the ratio of the particles to the sample weight
  • the particle content was defined as (% by weight).
  • the respective contents were determined from the abundance ratio of the individual particles.
  • Silicone oil The components of silicone oil and the amount of each component were identified by using a cryoprobe (high-sensitivity probe) by 32 times of integration by 1H-NMR measurement and 13 C-NMR measurement.
  • Thermoplastic Amorphous Resin Y The components and the amount of each component of the thermoplastic amorphous resin Y were specified by 1 H-NMR measurement and 13 C-NMR measurement.
  • Antioxidant The components of the antioxidant and the amount of each component were identified by 1 H-NMR measurement and 13 C-NMR measurement.
  • N N′-hexane-1,6-diylbis [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionamide] (registered trademark Irg1098), tert-butyl-4-
  • the peak intensity due to hydrogen due to the hydrocarbon chain between the hydroxyphenyl and the amide bond was measured. Based on the NMR measurement results, when the stabilizer reacted with the resin, the content converted to the original stabilizer was determined.
  • There is no coarse agglomerate during polymer melt extrusion, and the film forming process can be produced without breaking.
  • Coarse agglomerate is seen during polymer melt extrusion, but it can be produced without breaking.
  • Coarse agglomeration during polymer melt extrusion. Some are broken, but breakage sometimes occurs and stable production cannot be achieved.
  • Coarse aggregates are remarkable at the time of polymer melt extrusion, or breakage occurs frequently and cannot be produced.
  • The pressure of the filter temporarily increases during polymer melt extrusion, but the resin can be extruded stably.
  • The pressure of the filter gradually increases during polymer melt extrusion, and the resin cannot be extruded stably for a long period of time. .
  • X The pressure of the filter suddenly increased during polymer melt extrusion, and it was not possible to extrude in a short time.
  • Refractive index in the thickness direction The refractive index (Nz) in the thickness direction was measured at 23 ° C. and 65% RH using an Abbe refractometer using sodium D line (589 nm) as a light source. A higher refractive index in the thickness direction means that molecular chains are oriented in the plane direction of the film.
  • Number of coarse aggregated particles The film sample was magnified 20 times with transmitted illumination using a universal projector, and the number of particles having a maximum length of 25 ⁇ m or more contained in 1 m 2 area was counted.
  • A The surface roughness is uniform over the entire film surface, and the roll roll is good.
  • B Due to the influence of coarse aggregated particles in the film, 1 to less than 5 pimples (protruding bulges) are seen on the roll surface.
  • C There are many coarse aggregates in the film, and 5 or more pimples (protruding protrusions) are seen on the surface of the roll, resulting in poor appearance.
  • D Film end face misalignment of roll occurs, winding shape failure (12) Dielectric breakdown voltage (BDV) and variation Using the obtained biaxially oriented film (stretched film sample), flat plate among DC tests described in JIS standard C2151
  • BDV Dielectric breakdown voltage
  • measurement was performed at a boosting rate of 0.1 kV / sec using ITS-6003 manufactured by Tokyo Seiden Co., Ltd., and the voltage at breakdown was measured as the dielectric breakdown voltage.
  • the measurement was performed at room temperature of 25 ° C.
  • the peel force was measured using a tensile tester under the condition of a tensile speed of 300 mm / min, and the blocking property was determined from the measurement result according to the following criteria.
  • DBA value of porous silica particles (adsorption amount of di-n-butylamine)
  • a sample of 250 mg dried at 105 ° C. for 2 hours is precisely weighed, 50 ml of 1/500 N-DBA solution (petroleum benzine solvent) is added thereto, and the mixture is allowed to stand at 20 ° C. for 2 hours.
  • N-DBA solution petroleum benzine solvent
  • Two feed blades and two return blades for the rotor disk are installed in the ventilated twin-screw kneading extruder KTX-46 made by Kobe Steel Co., Ltd., which has a vacuum vent at the resin inlet and two locations, and further downstream of the rotor segment.
  • a kneading disk is arranged on the side, and a resistance part with a reverse full-flight screw is arranged just downstream of the kneading disk.
  • the resin was cooled with a cooling bath, and then cut with a letterer to obtain a resin composition chip having a major axis of about 4 mm, a minor axis of about 4 mm, and a length of about 3 mm.
  • the obtained resin composition was dried at 120 ° C. for 7 hours, then fed to an extruder, melted at 300 ° C., extruded from a die slit, solidified by cooling on a casting drum cooled to 50 ° C., and unstretched Created a sheet.
  • This unstretched sheet was stretched 3.5 times in the longitudinal direction (machine axis direction) at 140 ° C., and subsequently led to a tenter, and then 4.5 times in the lateral direction (direction perpendicular to the machine axis direction and the thickness direction).
  • the film was stretched twice. At that time, the stretched portion was divided into four equal zones, and the stretching speed in the transverse direction was set to 5000% / min. Further, the stretching temperature in the transverse direction was also divided into four equal parts, and the first stage temperature was 126 ° C. and the final stage temperature was 145 ° C. Thereafter, the film was heat-fixed at 250 ° C.
  • Examples 2 to 20, Comparative Examples 1 to 7 The same operation as in Example 1 was repeated except that the changes were made as described in Tables 1 to 3.
  • the evaluation results of the obtained oriented film are shown in Tables 1 and 2 for Examples and Table 3 for Comparative Examples.
  • porous silica means porous silica particles
  • spherical silicone means crosslinked silicone resin particles
  • nonporous silica means spherical silica particles.
  • Irg1010 is pentaerythritol tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate] (manufactured by Ciba Specialty Chemicals: trade name IRGANOX1010)
  • Irg1098 is N, N '-Bis 3- (3'5' di-t-butyl-4'-hydroxyphenyl) propionyl hexamethylenediamine (manufactured by Ciba Specialty Chemicals: trade name IRGANOX 1098)
  • Irg565 is 2,4-bis (n- Octylthio) -6- (4′-hydroxy-3,5-di-t-butylanilino) -1,3,5-triazine (manu
  • PPE in Tables 1 and 2 means poly (2,6-dimethyl-1,4-phenylene) ether (inherent viscosity measured in chloroform is 0.32 dl / g, glass transition temperature is 210 ° C.)
  • PC means bisphenol A type polycarbonate (Idemitsu Petrochemical, Idemitsu Polycarbonate A300, glass transition temperature is 145 ° C.).
  • -* means that the aggregation of the particles was large and the measurement of the average particle diameter was stopped.
  • the silica hydrogel washed with water is subjected to a first step of drying for 60 minutes using a vibration fluidized bed (trade name “vibration fluid phase apparatus VUA-15 type” manufactured by Chuo Kako Co., Ltd.), and then dried to a moisture content of 7%. Got. Thereafter, a second step of adding water to the dried silica is performed to obtain a silica adjusted to a water content of 37%, and then a third step of drying for 2 hours in the vibrating fluidized bed is performed again. A gel silica having a water content of 1% was obtained.
  • This dried silica is pulverized using a jet mill, and 100 parts of the resulting silica is charged into a vibrating fluidized bed, and 12 parts of n-octyltriethoxysilane is sprayed while being vibrated and flowed with dehumidified air, flowing for 30 minutes. Mixed. Then, it was immediately put into a constant temperature and humidity chamber maintained at a temperature of 25 ° C. and a humidity of 90%, and a surface-treated silica powder was obtained by maintaining for 72 hours. Again, it was pulverized using a jet mill for silica dispersion. Table 4 shows the characteristic values of the obtained silica powder 1 (porous silica particles 1).
  • Synthesis Example 4 The same treatment as in Synthesis Example 1 was performed except that the amount of n-octyltriethoxysilane added was changed. The characteristic values of the obtained silica powder 4 are shown in Table 4.
  • Synthesis Example 6 To make the particle size small, the same as Synthesis Example 1 except that after the first jet mill treatment, silica is made into 10% slurry with distilled water and a wet grinding step of a sand grinder (dyno mill, capacity 5 L) is added. Was done. The characteristic values of the obtained silica powder 6 are shown in Table 4. Since this silica powder had an average particle size of too small as 0.3 ⁇ m, the compression rate could not be measured.
  • Synthesis Example 7 The same treatment as in Synthesis Example 1 was performed, except that the surface treatment with n-octyltriethoxysilane was not performed.
  • the characteristic values of the obtained silica powder 7 are shown in Table 4.
  • Mitsubishi Engineering Plastics Iupiace PX-100L (Tg210 ° C) is 40 parts by mass, and a syndiotactic polystyrene resin (hereinafter sometimes abbreviated as SPS) is 55.8 masses of Idemitsu Kosan Zarek 60ZC.
  • SPS syndiotactic polystyrene resin
  • Ciba Specialty Chemicals Inc As an antioxidant, Ciba Specialty Chemicals Inc.
  • the Ganokkusu 1010 was 0.2 part by weight mixture turned.
  • the silica powder 1 described above as porous silica particles was added from the middle part of the twin-screw kneading extruder (downstream part of the kneading disk), and mixed and dispersed.
  • the mixture feed amount was 35 parts by mass / Hr
  • the barrel temperature was 270 ° C.
  • the screw rotation speed was 250 rpm.
  • the resin was cooled with a cooling bath, and then cut with a letterer to obtain a resin composition chip having a major axis of about 4 mm, a minor axis of about 4 mm, and a length of about 3 mm.
  • the obtained resin composition chip is shown in Table 4.
  • Example 21 Resin composition chip (master chip A) obtained in Reference Example 1, polyphenylene ether resin (Mitsubishi Engineering Plastics Iupiace PX-100L), syndiotactic polystyrene resin (Zarek 60ZC made by Idemitsu Kosan), polyphenylene ether After drying master chips containing 5% by weight of Irganox 1010 manufactured by Ciba Specialty Chemicals as an antioxidant in resin (Iupiace PX-100L manufactured by Mitsubishi Engineering Plastics), a film having the composition shown in Table 5 was obtained.
  • polyphenylene ether resin Mitsubishi Engineering Plastics Iupiace PX-100L
  • Zarek 60ZC syndiotactic polystyrene resin
  • This unstretched sheet was stretched 3.5 times in the longitudinal direction (machine axis direction) at 140 ° C., and subsequently led to a tenter, and then 4.5 times in the lateral direction (direction perpendicular to the machine axis direction and the thickness direction).
  • the film was stretched twice.
  • the transverse stretching speed was 5000% / min
  • the transverse stretching temperature was divided into four equal parts
  • the first stage temperature was 126 ° C.
  • the final stage temperature was 145 ° C.
  • the film was heat-fixed at 250 ° C. for 9 seconds, and further subjected to a 2% relaxation treatment in the transverse direction while cooling to 180 ° C. to obtain a biaxially stretched film having a thickness of 2.5 ⁇ m and wound into a roll.
  • Table 4 shows the properties of the obtained film.
  • Examples 22 to 24, 26, 29, 30, 33 to 37, Comparative Examples 8 to 10, 12, and 13 Using a master chip as described in Tables 5-7, and so that the composition of the film obtained is as described in Tables 5-7, polyphenylene ether resin, polycarbonate resin, syndiotactic polystyrene resin and antioxidant The same operation as in Example 21 was repeated except that the contained master chip was used in combination. The evaluation results of the obtained stretched film are shown in Tables 5 to 7. In Examples 25 and 26, a syndiotactic polystyrene resin (Idemitsu Kosan Zarek 60ZC) containing 5% by weight of Irganox 1010 was used as an antioxidant-containing master chip.
  • a syndiotactic polystyrene resin Idemitsu Kosan Zarek 60ZC
  • Examples 25, 27, 28, 31, 32, Comparative Example 11 First, a polyphenylene ether resin, a polystyrene resin having a syndiotactic structure, porous silica particles and an antioxidant were mixed in the same manner as in Reference Example 1 so that the composition of the resulting film was as shown in Tables 5-7. A resin composition chip was obtained. The obtained resin composition was dried and formed into a film in the same manner as in Example 21 to obtain a biaxially stretched film. The evaluation results of the obtained stretched film are shown in Tables 5 to 7.
  • PC in Tables 5 to 7 is a bisphenol A type polycarbonate (Idemitsu Petrochemicals Idemitsu Polycarbonate A300, glass transition temperature 145 ° C.).
  • Irg1010 is pentaerythritol tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate] (manufactured by Ciba Specialty Chemicals: trade name IRGANOX1010).
  • Irg1098 is N, N′-bis-3- (3′5′di-t-butyl-4′-hydroxyphenyl) propionylhexamethylenediamine (manufactured by Ciba Specialty Chemicals: trade name IRGANOX1098), and Irg565 is 2,4.
  • the oriented film of the first aspect of the present invention is particularly suitable as a base film for a film capacitor because it is excellent in abrasion resistance and winding property.
  • the stretched film of the second aspect of the present invention is excellent in particle dispersibility and has a small void diameter caused by the particles, so that it has excellent wear resistance, handleability, and dielectric breakdown characteristics (dielectric breakdown voltage and variations thereof).
  • it can be suitably used as a film capacitor.

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Abstract

Provided is a syndiotactic polystyrene–based resin alignment film having excellent windability and shaving resistance, or a stretched film that is suitable for use in particular as a film capacitor and has excellent particle dispersibility, dielectric breakdown characteristics, shaving resistance, and handling properties including windability. Specifically, the stretched film comprises a resin composition that contains a syndiotactic styrene–based polymer and also contains porous particles having an average particle diameter of 0.5–5.0 µm, the content of the porous particles being 0.01–3 mass% relative to the mass of the resin composition. The stretched film satisfies either of the following conditions: (1) the resin composition contains a silicone oil, with the content of the silicone oil being 0.1–3 mass% relative to the mass of the porous particles; or (2) the porous particles are porous silica particles having an average particle diameter A of 0.5–5 µm and a di-n-butylamine adsorption (DBA) value of 200 millimoles/kg or less.

Description

延伸フィルムStretched film
 第1の本発明は、シンジオタクチック構造のスチレン系重合体からなる配向フィルムに関し、さらに詳しくは、巻き取り性と削れ性とが改善されたシンジオタクチック構造のスチレン系重合体からなる延伸フィルムに関するものである。 The first aspect of the present invention relates to an oriented film composed of a styrene polymer having a syndiotactic structure, and more specifically, a stretched film composed of a styrene polymer having a syndiotactic structure with improved winding and scraping properties. It is about.
 第2の本発明は、多孔質シリカ粒子の分散性が改善された樹脂組成物からなる延伸フィルムに関するものである。さらに詳しくは、シンジオタクチック構造のポリスチレン系樹脂中への多孔質シリカ粒子の分散性が改善された樹脂組成物からなる巻取り性等の取扱い性、耐削れ性、絶縁破壊特性が改善された、特にフィルムコンデンサー用として好適な延伸フィルムに関するものである。 The second aspect of the present invention relates to a stretched film made of a resin composition with improved dispersibility of porous silica particles. More specifically, handling properties such as winding property, abrasion resistance, and dielectric breakdown characteristics made of a resin composition with improved dispersibility of porous silica particles in a polystyrene resin having a syndiotactic structure have been improved. In particular, the present invention relates to a stretched film suitable for a film capacitor.
 従来、フィルムコンデンサーは、二軸配向ポリエチレンテレフタレートフィルム、二軸配向ポリプロピレンフィルム等のフィルムとアルミニウム箔等の金属薄膜とを重ね合わせ、巻回又は積層する方法により製造されている。近年、電気あるいは電子回路の小型化の要求に伴い、フィルムコンデンサーについても小型化や実装化が進んでおり、電気特性に加えてさらなる耐熱性が要求されるようになってきた。また、自動車用途においては、運転室内での使用のみならず、エンジンルーム内にまで使用範囲が拡大しており、電気特性に加え、より高温高湿下の環境に適したフィルムコンデンサーが要求されている。 Conventionally, a film capacitor is manufactured by a method in which a film such as a biaxially oriented polyethylene terephthalate film or a biaxially oriented polypropylene film and a metal thin film such as an aluminum foil are overlapped and wound or laminated. In recent years, with the demand for miniaturization of electric or electronic circuits, film capacitors have also been miniaturized and mounted, and further heat resistance has been demanded in addition to electrical characteristics. In automotive applications, the range of use extends not only in the cab, but also in the engine room. In addition to electrical characteristics, film capacitors that are suitable for environments with higher temperatures and higher humidity are required. Yes.
 かかる要求に対して、特開平2-143851号公報、特開平3-124750号公報、特開平5-200858号公報や国際公開第2008/156210号パンフレットには、耐熱性および電気特性に優れたシンジオタクチックポリスチレン系フィルムを用いる方法が提案されている。しかし、従来用いられているポリエステルフィルムに較べて製膜が難しく、またフィルムが裂けやすいことから、コンデンサー製造時のハンドリング性の改良も求められている。かかる製膜性やハンドリング性を改良する方法としては、樹脂に粉体フィラーを配合するのが一般的であるが、通常用いられる紛体フィラーではシンジオタクチックポリスチレン系樹脂をフィルムにしたときに、巻取り性と耐削れ性とを両立させるのは困難であった。

 また、かかる要求に対して、特開2000-173855号公報には、ポリエチレンテレフタレートフィルムやポリプロピレンフィルムよりも耐熱性に優れたポリエチレン-2,6-ナフタレンジカルボキシレートフィルムを用い、その結晶状態、極限粘度等を制御して電気特性を改良する方法が提案されている。しかし、ポリエチレン-2,6-ナフタレンジカルボキシレートは極性ポリマーであるため、電気特性の改良には限界がある。  
特開平2-143851号公報 特開平3-124750号公報 特開平5-200858号公報 国際公開第2008/156210号パンフレット 特開2000-173855号公報
In response to this requirement, Japanese Patent Application Laid-Open Nos. 2-143951, 3-124750, 5-200858 and International Publication No. 2008/156210 have synergy excellent in heat resistance and electrical characteristics. A method using an tactic polystyrene film has been proposed. However, since it is difficult to form a film as compared with a conventionally used polyester film and the film is easily torn, an improvement in handling at the time of producing a capacitor is also demanded. As a method for improving the film forming property and handling property, a powder filler is generally added to the resin. However, in the case of a normally used powder filler, when a syndiotactic polystyrene resin is used as a film, the winding is performed. It has been difficult to achieve both take-off and wear resistance.

In response to such demands, Japanese Patent Application Laid-Open No. 2000-173855 uses a polyethylene-2,6-naphthalenedicarboxylate film having higher heat resistance than a polyethylene terephthalate film or a polypropylene film. A method for improving electrical characteristics by controlling viscosity or the like has been proposed. However, since polyethylene-2,6-naphthalenedicarboxylate is a polar polymer, there is a limit to improving the electrical characteristics.
Japanese Patent Laid-Open No. 2-143851 Japanese Patent Laid-Open No. 3-124750 Japanese Patent Laid-Open No. 5-200858 International Publication No. 2008/156210 Pamphlet JP 2000-173855 A
 第1の本発明は、上記の背景技術に鑑みなされたもので、その目的は、巻取り性と耐削れ性に優れるシンジオタクチックポリスチレン系樹脂の延伸フィルムを提供することにある。

 第2の本発明は、上記の背景技術に鑑みなされたもので、その目的は、シンジオタクチック構造のポリスチレン系樹脂中への粒子分散性に優れ、巻取り性等の取扱い性、耐削れ性、絶縁破壊特性(絶縁破壊電圧、そのバラつき)に優れ、特にフィルムコンデンサー用として好適に使用することができる延伸フィルムを提供することにある。
The first aspect of the present invention has been made in view of the above-described background art, and an object thereof is to provide a stretched film of a syndiotactic polystyrene resin that is excellent in winding property and abrasion resistance.

The second aspect of the present invention has been made in view of the above-described background art, and its purpose is excellent in particle dispersibility in a polystyrene resin having a syndiotactic structure, handling properties such as winding property, and abrasion resistance. Another object of the present invention is to provide a stretched film that is excellent in dielectric breakdown characteristics (dielectric breakdown voltage, variation thereof) and can be suitably used particularly for a film capacitor.
 なお、本発明における延伸フィルムとは、延伸することで分子鎖を配向させた配向フィルムともいえ、以下、第1の本発明では配向フィルムと称することもある。 It should be noted that the stretched film in the present invention can be said to be an oriented film in which molecular chains are oriented by stretching, and is hereinafter sometimes referred to as an oriented film in the first invention.
 本発明者らは、上記目的を達成するために種々の不活性粒子を鋭意検討した。その際、ポリエステルなどでは、ボイドの発生を抑制できる多孔質粒子も検討をしたが、シンジオタクチックポリスチレン系樹脂では、ポリエステルフィルムなどと同様な効果は得られなかった。ところが、驚くべきことに多孔質粒子をシリコーンオイルと併用したところ、上記課題を解決できることを見出し、第1の本発明に到達した。 The present inventors diligently studied various inert particles in order to achieve the above object. At that time, porous particles capable of suppressing the generation of voids were examined for polyester and the like, but syndiotactic polystyrene resin did not provide the same effect as polyester film. However, surprisingly, when porous particles were used in combination with silicone oil, it was found that the above problems could be solved, and the first invention was reached.
 かくして第1の本発明によれば、シンジオタクチック構造のスチレン系重合体と平均粒径が0.5~5.0μmの多孔質粒子とシリコーンオイルを含む樹脂組成物からなり、多孔質粒子の含有量は該樹脂組成物の質量を基準として0.01質量%以上3質量%以下の範囲で、シリコーンオイルの含有量は該多孔質粒子の質量を基準として、0.1~3質量%の範囲である延伸フィルム(以下、第1の本発明では配向フィルムと称する。)が提供される。 Thus, according to the first aspect of the present invention, the resin composition comprising a syndiotactic styrene polymer, porous particles having an average particle size of 0.5 to 5.0 μm and silicone oil, The content is in the range of 0.01% by mass to 3% by mass based on the mass of the resin composition, and the content of silicone oil is 0.1-3% by mass based on the mass of the porous particles. A stretched film having a range (hereinafter referred to as an oriented film in the first invention) is provided.
 また、本発明者らは、上記目的を達成するために鋭意検討した結果、特定の表面特性を有する多孔質シリカ粒子をシンジオタクチック構造のポリスチレン系樹脂中に配合した樹脂組成物は、該粒子の分散性に優れ、しかも、必要に応じてベース樹脂で希釈して延伸フィルムに成形した際の発生ボイドが小さく、フィルムコンデンサー用として取扱い性、絶縁破壊特性、耐削れ性等も良好な延伸フィルムが容易に得られることを見出し、第2の本発明に到達した。 In addition, as a result of intensive investigations to achieve the above object, the present inventors have found that a resin composition in which porous silica particles having specific surface characteristics are blended in a polystyrene-based resin having a syndiotactic structure includes the particles. Stretched film with excellent dispersibility, small voids when formed into a stretched film after dilution with a base resin as necessary, and good handling, dielectric breakdown, and abrasion resistance for film capacitors Has been found to be easily obtained, and has reached the second aspect of the present invention.
 かくして第2の本発明によれば、シンジオタクチック構造のポリスチレン系樹脂と、平均粒径Aが0.5~5μm、DBA値が200ミリモル/kg以下である多孔質シリカ粒子を含む樹脂組成物からなる延伸フィルムであって、該多孔質シリカ粒子の含有量が樹脂組成物質量を基準として0.01質量%以上3質量%以下である延伸フィルムが提供される。 Thus, according to the second present invention, a resin composition comprising a polystyrene-based resin having a syndiotactic structure and porous silica particles having an average particle diameter A of 0.5 to 5 μm and a DBA value of 200 mmol / kg or less. The stretched film is a stretched film having a content of the porous silica particles of 0.01% by mass or more and 3% by mass or less based on the amount of the resin composition material.
 以上の通り、本発明によれば、前述の第1の本発明と第2の本発明が提供される。具体的には、シンジオタクチック構造のスチレン系重合体と平均粒径が0.5~5.0μmの多孔質粒子を含む樹脂組成物からなり、多孔質粒子の含有量は該樹脂組成物の質量を基準として0.01質量%以上3質量%以下の範囲であって、
(1)樹脂組成物がシリコーンオイルを含有し、シリコーンオイルの含有量は該多孔質粒子の質量を基準として、0.1~3質量%の範囲であること、または
(2)多孔質粒子が、平均粒径Aが0.5~5μm、DBA値が200ミリモル/kg以下である多孔質シリカ粒子であること
のいずれかを満足することを特徴とする延伸フィルムが提供される。
As described above, according to the present invention, the first and second aspects of the present invention are provided. Specifically, it comprises a resin composition comprising a styrene polymer having a syndiotactic structure and porous particles having an average particle size of 0.5 to 5.0 μm, and the content of the porous particles is the same as that of the resin composition. A range of 0.01% by weight to 3% by weight based on the weight,
(1) The resin composition contains silicone oil, and the silicone oil content is in the range of 0.1 to 3% by mass based on the mass of the porous particles, or (2) the porous particles are There is provided a stretched film characterized by satisfying any one of porous silica particles having an average particle diameter A of 0.5 to 5 μm and a DBA value of 200 mmol / kg or less.
 第1の本発明の延伸フィルムは、電気特性と耐熱性に優れたシンジオタクチック構造を有するポリスチレン系重合体を用いながらも、得られる配向フィルムに高度の巻取り性と耐削れ性とを具備させることができる。 The stretched film of the first aspect of the present invention has a high degree of winding property and wear resistance in the obtained oriented film while using a polystyrene polymer having a syndiotactic structure excellent in electrical characteristics and heat resistance. Can be made.
 また、第1の本発明によれば、絶縁破壊電圧が高く、しかもその標準偏差の小さな配向フィルムを得ることもでき、極めて薄く取扱いが難しいフィルムコンデンサー用のベースフィルムとしても好適に用いることができる。 Moreover, according to the first aspect of the present invention, an oriented film having a high dielectric breakdown voltage and a small standard deviation can be obtained, and it can be suitably used as a base film for a film capacitor that is extremely thin and difficult to handle. .
 第2の本発明の延伸フィルムは、耐熱性及び電気特性に優れたシンジオタクチック構造のポリスチレン系樹脂に、特定粒径で特定表面特性を有する多孔質シリカ粒子を特定量含有しているので、該粒子の分散性が極めて良好であり、しかも、該粒子に起因して発生するボイドが小さく、取扱い性、絶縁破壊特性、耐削れ性に優れ、特にフィルムコンデンサー用として好適である。 Since the stretched film of the second present invention contains a specific amount of porous silica particles having a specific particle size and a specific surface property in a polystyrene-based resin having a syndiotactic structure excellent in heat resistance and electrical properties, The dispersibility of the particles is extremely good, the voids generated due to the particles are small, the handleability, the dielectric breakdown characteristics, and the abrasion resistance are excellent, and it is particularly suitable for a film capacitor.
 まず、第1の本発明の配向フィルムについて説明する。 First, the oriented film of the first invention will be described.
 本発明の配向フィルムは、シンジオタクチック構造のスチレン系重合体と平均粒径が0.5~5.0μmの多孔質粒子とシリコーンオイルを含む樹脂組成物からなる。 The oriented film of the present invention comprises a resin composition comprising a styrene polymer having a syndiotactic structure, porous particles having an average particle size of 0.5 to 5.0 μm, and silicone oil.
 本発明におけるシンジオタクチック構造を有するポリスチレン系樹脂(以下、「シンジオタクチックポリスチレン樹脂」、もしくは「SPS」と称することがある。)としては、炭素-炭素結合から形成される主鎖に対して側鎖であるフェニル基や置換フェニル基が交互に反対方向に位置する立体構造を有するものである。一般にタクティシティーは、同位体炭素による核磁気共鳴法(13C-NMR法)により定量される。具体的には連続する複数個の構成単位の存在割合、例えば2個の場合はダイアッド、3個の場合はトリアッド、5個の場合はペンタッド等によって示すことができる。本発明におけるシンジオタクチック構造のポリスチレン系樹脂とは、ダイアッドで75%以上、好ましくは85%以上、あるいはペンタッドで30%以上、好ましくは50%以上のシンジオタクティシティーを有するポリスチレン、ポリ(アルキルスチレン)、ポリ(ハロゲン化スチレン)、ポリ(アルコキシスチレン)、ポリ(ビニル安息香酸エステル)、あるいはこれらのベンゼン環の一部が水素化された重合体やこれらの混合物、またはこれらの構造単位を含む共重合体を指称する。なお、ここでポリ(アルキルスチレン)としては、ポリ(メチルスチレン)、ポリ(エチルスチレン)、ポリ(プロピルスチレン)、ポリ(ブチルスチレン)、ポリ(フェニルスチレン)等があり、ポリ(ハロゲン化スチレン)としては、ポリ(クロロスチレン)、ポリ(ブロモスチレン)、ポリ(フロオロスチレン)等がある。また、ポリ(アルコキシスチレン)としては、ポリ(メトキシスチレン)、ポリ(エトキシスチレン)等がある。 The polystyrene resin having a syndiotactic structure in the present invention (hereinafter sometimes referred to as “syndiotactic polystyrene resin” or “SPS”) is used as a main chain formed of carbon-carbon bonds. The side chain has a three-dimensional structure in which phenyl groups and substituted phenyl groups are alternately positioned in opposite directions. In general, tacticity is quantified by an isotope carbon nuclear magnetic resonance method ( 13 C-NMR method). Specifically, it can be indicated by the abundance ratio of a plurality of consecutive structural units, for example, a dyad in the case of two, a triad in the case of three, a pentad in the case of five. In the present invention, the polystyrene-based resin having a syndiotactic structure is polystyrene, poly (alkyl) having a syndiotacticity of 75% or more, preferably 85% or more, or 30% or more, preferably 50% or more, of pentad. Styrene), poly (halogenated styrene), poly (alkoxystyrene), poly (vinyl benzoate), polymers in which a part of these benzene rings are hydrogenated, mixtures thereof, or structural units thereof. The copolymer containing is designated. Here, poly (alkyl styrene) includes poly (methyl styrene), poly (ethyl styrene), poly (propyl styrene), poly (butyl styrene), poly (phenyl styrene), and the like. ) Include poly (chlorostyrene), poly (bromostyrene), poly (fluorostyrene) and the like. Examples of poly (alkoxystyrene) include poly (methoxystyrene) and poly (ethoxystyrene).
 これらのうち好ましいポリスチレン系樹脂としては、ポリスチレン、ポリ(p-メチルスチレン)、ポリ(m-メチルスチレン)、ポリ(p-ターシャリーブチルスチレン)、ポリ(p-クロロスチレン)、ポリ(m-クロロスチレン)、ポリ(p-フルオロスチレン)、またスチレンとp-メチルスチレンとの共重合体を挙げることができ、なかでもポリスチレンが好ましい。 Among these, preferred polystyrene resins include polystyrene, poly (p-methylstyrene), poly (m-methylstyrene), poly (p-tertiarybutylstyrene), poly (p-chlorostyrene), and poly (m- Chlorostyrene), poly (p-fluorostyrene), and a copolymer of styrene and p-methylstyrene. Among them, polystyrene is preferable.
 さらに、本発明におけるポリスチレン系樹脂に共重合成分を含有させて共重合体として使用する場合においては、そのコモノマーとして、上述の如きポリスチレン系樹脂のモノマーのほか、エチレン、プロピレン、ブテン、ヘキセン、オクテン等のオレフィンモノマー、ブタジエン、イソプレン等のジエンモノマー、環状ジエンモノマーやメタクリル酸メチル、無水マレイン酸、アクリロニトリル等の極性ビニルモノマー等を用いることができる。 Further, in the case where the polystyrene resin in the present invention is used as a copolymer containing a copolymer component, as its comonomer, in addition to the above-mentioned polystyrene resin monomer, ethylene, propylene, butene, hexene, octene. Olefin monomers such as diene monomers such as butadiene and isoprene, cyclic diene monomers, polar vinyl monomers such as methyl methacrylate, maleic anhydride, and acrylonitrile.
 また、このシンジオタクチック構造のポリスチレン系樹脂の重量平均分子量は、好ましくは1.0×10~3.0×10であり、さらに好ましくは5.0×10~1.5×10であり、特に好ましくは1.1×10~8.0×10である。重量平均分子量を1.0×10以上、好ましくは5.0×10以上、特に好ましくは1.1×10以上とすることで、強伸度特性に優れ、耐熱性がより向上したフィルム等の成形品を得ることができる。また、重量平均分子量が3.0×10以下、好ましくは1.5×10以下、特に好ましくは8.0×10以下だと、延伸張力が好適な範囲となり、製膜時等において破断等が発生しにくくなる。 The weight average molecular weight of this syndiotactic polystyrene resin is preferably 1.0 × 10 4 to 3.0 × 10 6 , more preferably 5.0 × 10 4 to 1.5 × 10 6. 6 , particularly preferably 1.1 × 10 5 to 8.0 × 10 5 . By setting the weight average molecular weight to 1.0 × 10 4 or more, preferably 5.0 × 10 4 or more, and particularly preferably 1.1 × 10 5 or more, the strength and elongation characteristics are excellent and the heat resistance is further improved. A molded product such as a film can be obtained. Further, when the weight average molecular weight is 3.0 × 10 6 or less, preferably 1.5 × 10 6 or less, particularly preferably 8.0 × 10 5 or less, the stretching tension is in a suitable range, and at the time of film formation, etc. Breakage and the like are less likely to occur.
 本発明の配向フィルムに含まれる多孔質粒子は、その平均粒径が0.5~5μm、好ましくは0.8~2.5μmである必要がある。この平均粒径が0.5μm未満の場合には、フィルムの滑り性が不足して、巻取り性や取扱い性が不十分となる。一方、5μmを超える場合には、延伸等により粒子の周りに形成されるボイドの径が大きくなるので好ましくない。また、該粒子の含有量は、樹脂組成物質量を基準として0.01~3質量%、さらに好ましくは0.02~1質量%、特に好ましくは0.05~0.5質量%の範囲とする必要がある。この含有量が下限未満では滑り性が不足して巻取り性が乏しくなる。一方、上限を超える場合には、耐削れ性が不十分となる他、絶縁破壊特性や製膜延伸性が損なわれる。 The porous particles contained in the oriented film of the present invention must have an average particle size of 0.5 to 5 μm, preferably 0.8 to 2.5 μm. When this average particle diameter is less than 0.5 μm, the slipping property of the film is insufficient, and the winding property and handling property become insufficient. On the other hand, when it exceeds 5 μm, the diameter of voids formed around the particles by stretching or the like becomes large, which is not preferable. The content of the particles is 0.01 to 3% by mass, more preferably 0.02 to 1% by mass, particularly preferably 0.05 to 0.5% by mass, based on the amount of the resin composition substance. There is a need to. If this content is less than the lower limit, the slipping property is insufficient and the winding property becomes poor. On the other hand, if the upper limit is exceeded, the abrasion resistance becomes insufficient, and the dielectric breakdown characteristics and film-forming stretchability are impaired.
 上記のような観点から、本発明で用いられる多孔質粒子は、その平均粒径が0.5~5μm、さらに0.8~2.5μmであることが好ましい。本発明で用いられる多孔質粒子は、さらに圧縮率(0.2gf荷重時:島津製作所製微小圧縮試験MCTM-200にて測定)が20~90%、特に50~85%の範囲であることが好ましい。この値が下限未満の場合には、例えば延伸フィルムとしたときに耐削れ性の向上効果が乏しい。一方、上限を超える場合には、例えば延伸フィルムとする際に、該粒子が解砕して突起形成が不十分となり、巻取り性の向上効果が小さくなる。圧縮率が上記の適正な範囲にあることにより、延伸フィルム等に加工する際の応力により、該粒子が適度に変形して巻取り性と耐削れ性とをより高度に両立しやすくなる。 In view of the above, the porous particles used in the present invention preferably have an average particle size of 0.5 to 5 μm, more preferably 0.8 to 2.5 μm. The porous particles used in the present invention may further have a compressibility (at 0.2 gf load: measured by a micro compression test MCTM-200 manufactured by Shimadzu Corporation) of 20 to 90%, particularly 50 to 85%. preferable. When this value is less than the lower limit, for example, when it is a stretched film, the effect of improving the abrasion resistance is poor. On the other hand, if the upper limit is exceeded, for example, when a stretched film is formed, the particles are crushed and protrusion formation is insufficient, and the effect of improving the winding property is reduced. When the compression ratio is in the above-described appropriate range, the particles are appropriately deformed by the stress at the time of processing into a stretched film or the like, and it becomes easy to achieve both high winding properties and wear resistance.
 かかる多孔質粒子としては、それ自体公知の粒子を用いることができ、特に多孔質シリカ粒子が好ましく挙げられる。多孔質シリカ粒子の製造方法は特に限定されず、ゾルゲル法、沈降法等従来公知の方法により製造された、公知のものを使用できる。なかでも、細孔容積が0.4~2.5ml/g、特に1.2~1.8ml/gの範囲にあるものが好ましく、また、細孔平均径は5~25nmの範囲にあるものが好ましい。 As such porous particles, particles known per se can be used, and porous silica particles are particularly preferred. The production method of the porous silica particles is not particularly limited, and a known method produced by a conventionally known method such as a sol-gel method or a precipitation method can be used. Among them, those having a pore volume in the range of 0.4 to 2.5 ml / g, particularly 1.2 to 1.8 ml / g are preferable, and those having an average pore diameter in the range of 5 to 25 nm. Is preferred.
 本発明の配向フィルムは、前述の通り、さらにシリコーンオイルを併用する。このシリコーンオイルの含有量は、該多孔質粒子の質量を基準として、0.1~3質量%、好ましくは0.2~2.0質量%の範囲である。シリコーンオイルの含有量が下限未満の場合には該多孔質粒子の分散性が悪くなり粗大な凝集粒子を形成して製膜延伸性が不良になる他、耐削れ性効果が乏しい。一方上限を超える場合には、フィルムの表面に、シリコーンオイルがブリードアウトして加工工程を汚染したりすることがある。 The oriented film of the present invention further uses silicone oil as described above. The content of the silicone oil is in the range of 0.1 to 3% by mass, preferably 0.2 to 2.0% by mass, based on the mass of the porous particles. When the content of the silicone oil is less than the lower limit, the dispersibility of the porous particles is deteriorated to form coarse aggregated particles, resulting in poor film-forming stretchability and poor abrasion resistance. On the other hand, when the upper limit is exceeded, silicone oil may bleed out on the surface of the film and contaminate the processing process.
 ここで言うシリコーンオイルとは、ジアルキルシロキサン成分を主たる繰返し単位とするシリコーン化合物であって、シロキサン結合が2000以下の直鎖構造のものがあげられる。例えばポリシロキサンの側鎖、末端がすべてメチル基であるジメチルポリシロキサン、さらにポリシロキサンの側鎖の一部がフェニル基であるメチルフェニルポリシロキサン、ポリシロキサンの側鎖の一部が水素であるメチルハイドロジェンポリシロキサン等のストレートシリコーンオイル、その他に側鎖、末端に有機基を導入した変性シリコーンオイルをあげることができる。変性シリコーンオイルに導入される有機基としてはモノアミン基、ジアミン基、アミノ基、エポキシ基、脂環式エポキシ基、メルカプト基、カルボキシル基、ポリエーテル基、アラルキル基、フロロアルキル基、長鎖アルキル基、高級脂肪酸エステル基、高級脂肪酸アミド基、メタクリル基、カルボキシル基、フェノール基、シラノール基等をあげることができる。これらのなかでは、耐熱性が優れることからジメチルポリシロキサンが好ましい。 The silicone oil referred to here is a silicone compound having a dialkylsiloxane component as a main repeating unit, and has a linear structure having a siloxane bond of 2000 or less. For example, polysiloxane side chain, dimethylpolysiloxane having all methyl groups at the ends, methylphenyl polysiloxane having a part of the polysiloxane side chain having a phenyl group, and methyl having a part of the side chain of the polysiloxane having hydrogen Examples thereof include straight silicone oils such as hydrogen polysiloxane, and other modified silicone oils in which an organic group is introduced at the side chain and terminal. Organic groups introduced into the modified silicone oil include monoamine groups, diamine groups, amino groups, epoxy groups, alicyclic epoxy groups, mercapto groups, carboxyl groups, polyether groups, aralkyl groups, fluoroalkyl groups, and long-chain alkyl groups. Higher fatty acid ester groups, higher fatty acid amide groups, methacrylic groups, carboxyl groups, phenol groups, silanol groups and the like. Of these, dimethylpolysiloxane is preferred because of its excellent heat resistance.
 シリコーンオイルのフィルムへの配合方法は特に限定されないが、前記多孔質粒子に直接滴下又は塗布、スプレーで吹き付ける等した後、ミキサー等に入れて攪拌する方法が、前記多孔質粒子の表面に選択的にシリコーンオイルを存在させやすいことから好ましい。 The method of blending the silicone oil into the film is not particularly limited, but the method of directly dropping or applying to the porous particles, spraying with a spray, etc., and stirring in a mixer or the like is selectively applied to the surface of the porous particles. The silicone oil is preferable because it is easy to be present.
 シリコーンオイル付着処理した多孔質粒子は、樹脂材料の重合段階で添加しても良いし、重合によって得られた樹脂材料に溶融混練方法で添加しても良く、特に限定する必要はない。例えば、該多孔質粒子粉体と樹脂材料とを溶融混練機の同一供給口より供給して溶融混練する方法や、ベント付二軸混練押出機等の溶融混練機中に先ず樹脂材料を投入し、該樹脂材料が溶融した部位に該多孔質粒子を粉体添加して溶融混練する方法でもよい。なかでも、シリコーンオイルを付着させた該粒子と樹脂ペレットまたは樹脂粉末とを予め混合した後に、ベント付二軸混練押出機中に供給する方法が好ましい。かかる方法によれば、該粒子が樹脂ペレットまたは樹脂粉末の表面に付着しているので、混練機内部で解砕が進行する際、該粒子と樹脂との接触間隔が極めて小さいために分散性がさらに向上するものと推定される。 The porous particles subjected to the silicone oil adhesion treatment may be added at the polymerization stage of the resin material, or may be added to the resin material obtained by polymerization by a melt-kneading method, and there is no particular limitation. For example, the resin material is first charged into a melt kneader such as a method of melt kneading by supplying the porous particle powder and the resin material from the same supply port of the melt kneader, or a biaxial kneading extruder with a vent. Alternatively, a method may be used in which the porous particles are added to the melted portion of the resin material and melt kneaded. Among them, a method is preferable in which the particles to which the silicone oil is adhered and the resin pellets or resin powder are mixed in advance and then fed into a vented twin-screw kneading extruder. According to such a method, since the particles are attached to the surface of the resin pellets or resin powder, when the crushing progresses inside the kneader, the contact distance between the particles and the resin is extremely small, so that the dispersibility is high. It is estimated that it will further improve.
 ベント付二軸混練押出機としては、粒子の添加口がベント付二軸混練押出機内部に配置されたスクリューのフルフライト部に設けられ、粒子を混練分散させるための送り翼と戻し翼とを有するローターセグメントを前記添加口よりスクリュー軸心方向下流側に少なくとも1箇所設けられている装置を使用することが好ましい。ここでベントラインは樹脂からの副生物の除去のためである。また、ベント付二軸混練押出機は、ローターセグメントが1~3箇所あることが好ましい。ローターセグメントが無いと該粒子の混練分散性が低下し、ローターセグメントが3箇所を超えると樹脂の推進力が低下してベントアップを生じやすくなる。また、該多孔質粒子の混練分散を補うためのニーディングディスクを有することが好ましい。 As a twin screw kneading extruder with a vent, a particle addition port is provided in a full flight part of a screw arranged inside a vented twin screw kneading extruder, and a feed blade and a return blade for kneading and dispersing particles are provided. It is preferable to use a device in which at least one rotor segment having at least one rotor segment is provided downstream from the addition port in the axial direction of the screw. Here, the vent line is for removal of by-products from the resin. Further, the vented twin-screw kneading extruder preferably has 1 to 3 rotor segments. If there is no rotor segment, the kneading dispersibility of the particles will be reduced, and if the rotor segment exceeds three locations, the propulsive force of the resin will be reduced and venting will be likely to occur. Moreover, it is preferable to have a kneading disk for supplementing the kneading dispersion of the porous particles.
 本発明の配向フィルムは、フィルム中に最大長25μm以上の粗大凝集粒子の数が1mあたり10個以下、さらに5個/m以下、特に3個/m以下が好ましい。粗大凝集粒子の個数が上限より多いとフィルム表面に不均一な突起を生じ、巻回フィルムとしたときに巻きズレが悪化し、加工性が低下するため不適当である。また製膜延伸工程で破断の起点になり、延伸性が不安定になるため好ましくない。 In the oriented film of the present invention, the number of coarse aggregated particles having a maximum length of 25 μm or more in the film is preferably 10 or less per 1 m 2 , more preferably 5 / m 2 or less, and particularly preferably 3 / m 2 or less. If the number of coarse agglomerated particles is larger than the upper limit, uneven projections are generated on the surface of the film, which is inappropriate because a winding shift is deteriorated and workability is lowered when a wound film is formed. Moreover, it becomes a starting point of a fracture | rupture in a film forming extending | stretching process, and since a drawability becomes unstable, it is not preferable.
 本発明の配向フィルムは本発明の目的を阻害しない範囲で、該多孔質粒子に加えて該多孔質粒子と異なる粒子Bを加えることができる。本発明における粒子Bは、前述の多孔質粒子が比較的大きな突起を形成してくれることから、それよりも小さな突起を形成する役割を担うことが好ましい。そのような観点から、粒子Bは前述の多孔質粒子よりも粒径が小さいことが好ましく、粒径が小さいことから凝集をしにくい粒子が好ましい。粒子Bの平均粒径Aは0.01μm以上0.5μm未満が好ましい。さらに好ましくは0.1μm以上0.4μm未満である。平均粒径Aが下限未満だと、十分な滑り性を得られないため好ましくない。他方、平均粒径Aが上限を超えると、耐削れ性が悪化するため好ましくない。 In the oriented film of the present invention, particles B different from the porous particles can be added in addition to the porous particles as long as the object of the present invention is not impaired. The particles B in the present invention preferably play a role of forming smaller protrusions because the porous particles described above form relatively large protrusions. From such a viewpoint, the particle B is preferably smaller in particle size than the above-described porous particles, and particles that are less likely to aggregate due to the smaller particle size are preferable. The average particle diameter A of the particles B is preferably 0.01 μm or more and less than 0.5 μm. More preferably, it is 0.1 μm or more and less than 0.4 μm. If the average particle diameter A is less than the lower limit, sufficient slipperiness cannot be obtained, which is not preferable. On the other hand, if the average particle diameter A exceeds the upper limit, the abrasion resistance deteriorates, which is not preferable.
 本発明における粒子Bの含有量は、配向フィルムの質量を基準として0.5重量%以下が好ましい。含有量が多くなると、粒子によるボイドの頻度が高くなるためか絶縁破壊電圧が低くなることがある。このような観点から、さらに好ましくは0.5重量%以下であり、特に好ましくは0.2重量%以下である。 The content of the particles B in the present invention is preferably 0.5% by weight or less based on the mass of the oriented film. When the content is increased, the dielectric breakdown voltage may be lowered because the frequency of voids due to particles increases. From such a viewpoint, it is more preferably 0.5% by weight or less, and particularly preferably 0.2% by weight or less.
 粒子Bの種類としては、種々のものを使用することができ、比表面積が小さな球状の粒子であることが好ましい。なお、本発明における球状とは、粒子の形状を画像解析したとき、最大長径と面積円相当径の比が1.5以下、好ましくは1.2以下のような形状を意味する。具体的な粒子としては、特に制限されず、それ自体公知の(1)二酸化ケイ素(水和物、ケイ砂、石英等を含む)、;(2)各種結晶形態のアルミナ;(3)SiO成分を30重量%以上含有するケイ酸塩(例えば非晶質もしくは結晶質の粘土鉱物、アルミノシリケート(焼成物や水和物を含む)、温石綿、ジルコン、フライアッシュ等);(4)Mg、Zn、Zr、およびTiの酸化物;(5)Ca、およびBaの硫酸塩;(6)Li、Ba、およびCaのリン酸塩(1水素塩や2水素塩を含む);(7)Li、Na、およびKの安息香酸塩;(8)Ca、Ba、Zn、およびMnのテレフタル酸塩;(9)Mg、Ca、Ba、Zn、Cd、Pb、Sr、Mn、Fe、Co、およびNiのチタン酸塩;(10)Ba、およびPbのクロム酸塩;(11)炭素(例えばカーボンブラック、グラファイト等);(12)ガラス(例えばガラス粉、ガラスビーズ等);(13)Ca、およびMgの炭酸塩;(14)ホタル石;(15)スピネル型酸化物;(16)架橋有機粒子(シリコーン、ポリスチレン粒子等)が挙げられるが、良好な滑り性、耐削れ性が得られるという観点で、球状シリカ粒子や、球状アルミナ粒子、架橋有機粒子、さらにそれらの複合粒子が好ましく挙げられ、特に球状シリコーン粒子が特に好ましい。粒子Bとして球状シリコーン樹脂粒子を用いた場合は、後述する熱可塑性非晶樹脂としてポリフェニレンエーテルを併用した際に、相乗効果によってとりわけ耐熱性の高いものとなる。 Various kinds of particles B can be used, and spherical particles having a small specific surface area are preferable. In addition, the spherical shape in the present invention means a shape in which the ratio of the maximum major axis to the area circle equivalent diameter is 1.5 or less, preferably 1.2 or less, when image analysis is performed on the particle shape. Specific particles are not particularly limited, and are known per se (1) silicon dioxide (including hydrate, silica sand, quartz and the like); (2) alumina in various crystal forms; (3) SiO 2 Silicates containing 30% by weight or more of components (for example, amorphous or crystalline clay minerals, aluminosilicates (including calcined products and hydrates), warm asbestos, zircon, fly ash, etc.); (4) Mg Oxides of Zn, Zn, Zr, and Ti; (5) sulfates of Ca and Ba; (6) phosphates of Li, Ba, and Ca (including monohydrogen and dihydrogen salts); (7) Benzoates of Li, Na, and K; (8) terephthalates of Ca, Ba, Zn, and Mn; (9) Mg, Ca, Ba, Zn, Cd, Pb, Sr, Mn, Fe, Co, And Ni titanates; (10) Ba and Pb chromium (11) Carbon (eg, carbon black, graphite, etc.); (12) Glass (eg, glass powder, glass beads, etc.); (13) Carbonate of Ca and Mg; (14) Fluorite; (15) (16) Crosslinked organic particles (silicone, polystyrene particles, etc.), but from the viewpoint of obtaining good slipping and abrasion resistance, spherical silica particles, spherical alumina particles, and crosslinked organic particles Furthermore, those composite particles are preferable, and spherical silicone particles are particularly preferable. When spherical silicone resin particles are used as the particles B, the heat resistance becomes particularly high due to a synergistic effect when polyphenylene ether is used in combination as a thermoplastic amorphous resin described later.
 本発明の配向フィルムは、上記シンジオタクチック構造のスチレン系重合体と平均粒径が0.5~5.0μmの多孔質粒子とシリコーンオイルを含む樹脂組成物からなり、これを少なくとも一軸方向、好ましくは二軸方向に延伸することで、分子鎖を配向させた配向フィルムである。 An oriented film of the present invention comprises a resin composition comprising the above-mentioned styrenic polymer having a syndiotactic structure, porous particles having an average particle size of 0.5 to 5.0 μm, and silicone oil, which is at least uniaxially oriented. Preferably, it is an oriented film in which molecular chains are oriented by stretching in biaxial directions.
 ところで、本発明における樹脂組成物は、下記の熱可塑性非晶樹脂Yを含有することが好ましい。ここでいう熱可塑性非晶樹脂Yは、DSC(示差走査熱量計)により求められるガラス転移温度TgがSPSより高いTgを有する熱可塑性非晶樹脂であることが好ましい。SPSにこのような熱可塑性非晶樹脂Yを配合すると、混合体としてのガラス転移温度Tgが高くなるだけでなく、耐熱性が向上し、高温における絶縁破壊電圧が高くなる。また、配向フィルムの熱寸法安定性が良好となり、延伸性も向上させることができる。このような観点から、熱可塑性非晶樹脂Yのガラス転移温度Tgは、150℃以上であることが好ましく、180℃以上であることがさらに好ましく、200℃以上であることが特に好ましい。配合する熱可塑性非晶樹脂Yのガラス転移温度Tgが高いほど、熱寸法安定性等の上記効果の向上効果が大きくなる。溶融押出等を考慮すると、実質的な上限は好ましくは350℃、より好ましくは300℃である。 Incidentally, the resin composition in the present invention preferably contains the following thermoplastic amorphous resin Y. The thermoplastic amorphous resin Y here is preferably a thermoplastic amorphous resin having a glass transition temperature Tg determined by DSC (differential scanning calorimeter) having a Tg higher than SPS. When such a thermoplastic amorphous resin Y is blended with SPS, not only the glass transition temperature Tg as a mixture increases, but also the heat resistance improves, and the dielectric breakdown voltage at a high temperature increases. Moreover, the thermal dimensional stability of the oriented film becomes good, and the stretchability can also be improved. From such a viewpoint, the glass transition temperature Tg of the thermoplastic amorphous resin Y is preferably 150 ° C. or higher, more preferably 180 ° C. or higher, and particularly preferably 200 ° C. or higher. The higher the glass transition temperature Tg of the thermoplastic amorphous resin Y to be blended, the greater the effect of improving the above effects such as thermal dimensional stability. Considering melt extrusion or the like, the substantial upper limit is preferably 350 ° C., more preferably 300 ° C.
 このような熱可塑性非晶樹脂Yとしては、ポリフェニレンエーテル、ポリエーテルイミドなどの芳香族ポリエーテル、ポリカーボネート、ポリアリレート、ポリスルホン、ポリエーテルスルホン、ポリイミド等を好ましく例示することができる。これらのうち延伸性を向上させやすく、また酸化防止剤と組合せたときに、相乗作用があるためか、耐熱性、寸法安定性だけでなく、絶縁破壊電圧もさらに向上することから、ポリフェニレンエーテルが特に好ましい。ここで用いられるポリフェニレンエーテル樹脂としては、従来公知の樹脂、例えば、ポリ(2,3-ジメチル-6-エチル-1,4-フェニレンエ-テル)、ポリ(2-メチル-6-クロロメチル-1,4-フェニレンエ-テル)、ポリ(2-メチル-6-ヒドロキシエチル-1,4-フェニレンエ-テル)、ポリ(2-メチル-6-n-ブチル-1,4-フェニレンエ-テル)、ポリ(2-エチル-6-イソプロピル-1,4-フェニレンエ-テル)、ポリ(2-エチル-6-n-プロピル-1,4-フェニレンエ-テル)、ポリ(2、3、6-トリメチル-1,4-フェニレンエ-テル)、ポリ(2-(4’-メチルフェニル)-1,4-フェニレンエ-テル)、ポリ(2-ブロモ-6-フェニル-1,4-フェニレンエ-テル)、ポリ(2-メチル-6-フェニル-1,4-フェニレンエ-テル)、ポリ(2-フェニル-1,4-フェニレンエ-テル)、ポリ(2-クロロ-1,4-フェニレンエ-テル)、ポリ(2-メチル-1,4-フェニレンエ-テル)、ポリ(2-クロロ-6-エチル-1,4-フェニレンエ-テル)、ポリ(2-クロロ-6-ブロモ-1,4-フェニレンエ-テル)、ポリ(2,6-ジ-n-プロピル-1,4-フェニレンエ-テル)、ポリ(2-メチル-6-イソプロピル-1,4-フェニレンエ-テル)、ポリ(2-クロロ-6-メチル-1,4-フェニレンエ-テル)、ポリ(2-メチル-6-エチル-1,4-フェニレンエ-テル)、ポリ(2,6-ジブロモ-1,4-フェニレンエ-テル)、ポリ(2,6-ジクロロ-1,4-フェニレンエ-テル)、ポリ(2,6-ジエチル-1,4-フェニレンエ-テル)、ポリ(2,6-ジメチル-1,4-フェニレンエ-テル)等のホモポリマー、及び、これらの共重合体を挙げることができる。また、これらを無水マレイン酸,フマル酸等の変性剤で変性したものも好適に用いられる。さらに、スチレン等のビニル芳香族化合物を上記ポリフェニレンエ-テルにグラフト共重合またはブロック共重合した共重合体も用いられる。これらのなかで、ポリ(2,6-ジメチル-1,4-フェニレンエ-テル)が特に好ましい。 Preferred examples of the thermoplastic amorphous resin Y include aromatic polyethers such as polyphenylene ether and polyetherimide, polycarbonate, polyarylate, polysulfone, polyethersulfone, and polyimide. Among these, it is easy to improve stretchability, and because it has a synergistic effect when combined with an antioxidant, not only heat resistance and dimensional stability, but also dielectric breakdown voltage is further improved. Particularly preferred. Examples of the polyphenylene ether resin used here include conventionally known resins such as poly (2,3-dimethyl-6-ethyl-1,4-phenylene ether) and poly (2-methyl-6-chloromethyl-1). , 4-phenylene ether), poly (2-methyl-6-hydroxyethyl-1,4-phenylene ether), poly (2-methyl-6-n-butyl-1,4-phenylene ether), poly (2-ethyl-6-isopropyl-1,4-phenylene ether), poly (2-ethyl-6-n-propyl-1,4-phenylene ether), poly (2,3,6-trimethyl-1) , 4-phenylene ether), poly (2- (4′-methylphenyl) -1,4-phenylene ether), poly (2-bromo-6-phenyl-1,4-phenylene ether), poly 2-methyl-6-phenyl-1,4-phenylene ether), poly (2-phenyl-1,4-phenylene ether), poly (2-chloro-1,4-phenylene ether), poly (2 -Methyl-1,4-phenylene ether), poly (2-chloro-6-ethyl-1,4-phenylene ether), poly (2-chloro-6-bromo-1,4-phenylene ether), Poly (2,6-di-n-propyl-1,4-phenylene ether), poly (2-methyl-6-isopropyl-1,4-phenylene ether), poly (2-chloro-6-methyl-) 1,4-phenylene ether), poly (2-methyl-6-ethyl-1,4-phenylene ether), poly (2,6-dibromo-1,4-phenylene ether), poly (2,6 -Dichloro-1,4-phenyle Homopolymers such as ether), poly (2,6-diethyl-1,4-phenylene ether), poly (2,6-dimethyl-1,4-phenylene ether), and copolymers thereof Can be mentioned. Further, those modified with a modifying agent such as maleic anhydride or fumaric acid are also preferably used. Furthermore, a copolymer obtained by graft copolymerization or block copolymerization of a vinyl aromatic compound such as styrene with the polyphenylene ether is also used. Of these, poly (2,6-dimethyl-1,4-phenylene ether) is particularly preferred.
 ポリフェニレンエーテル樹脂の固有粘度は、クロロホルム中、30℃で測定した場合、0.2~0.8dl/gの範囲が好ましく、0.3~0.6dl/gの範囲がより好ましい。固有粘度が0.2dl/g未満の場合には、得られる樹脂組成物の機械的強度が低下する場合がある。一方0.8dl/gを超える場合には、得られる樹脂組成物の流動性が低下し、フィルム等に溶融成形する際の加工が困難になる傾向にある。ポリフェニレンエーテル樹脂は2種以上を併用してもよく、その際には固有粘度の異なるものを混合して所望の固有粘度となるようにしてもよい。 The intrinsic viscosity of the polyphenylene ether resin is preferably in the range of 0.2 to 0.8 dl / g, more preferably in the range of 0.3 to 0.6 dl / g when measured at 30 ° C. in chloroform. When the intrinsic viscosity is less than 0.2 dl / g, the mechanical strength of the resulting resin composition may be lowered. On the other hand, when it exceeds 0.8 dl / g, the fluidity of the resulting resin composition is lowered, and the processing during melt molding into a film or the like tends to be difficult. Two or more types of polyphenylene ether resins may be used in combination, and in this case, those having different intrinsic viscosities may be mixed to obtain a desired intrinsic viscosity.
 本発明の配向フィルムは、該配向フィルムの質量に対して上記の熱可塑性非晶樹脂Yを5質量%以上48質量%以下配合していることが好ましい。熱可塑性非晶樹脂Yを上記範囲の量配合することによって、耐熱性に優れ、また絶縁破壊電圧の向上効果を高くすることができる。すなわち高温における絶縁破壊電圧を高くすることができる。含有量が少なすぎる場合は、耐熱性が劣る傾向にあり、また絶縁破壊電圧の向上効果が低くなる傾向にあり、延伸性の向上効果も乏しくなる。このような観点から、熱可塑性非晶樹脂Yの含有量は、8質量%以上がより好ましく、11質量%以上がさらに好ましく、20質量%以上が特に好ましい。また、含有量が多すぎる場合は、SPSの結晶性が低下しやすくなる傾向にあり、フィルムの耐熱性が劣る傾向にある。このような観点から、熱可塑性非晶樹脂Yの含有量は、45質量%以下がより好ましく、40質量%以下がさらに好ましく、35質量%以下が特に好ましい。 The oriented film of the present invention preferably contains 5% by mass or more and 48% by mass or less of the above thermoplastic amorphous resin Y with respect to the mass of the oriented film. By blending the amount of the thermoplastic amorphous resin Y in the above range, the heat resistance is excellent and the effect of improving the dielectric breakdown voltage can be increased. That is, the dielectric breakdown voltage at high temperatures can be increased. When the content is too small, the heat resistance tends to be inferior, the effect of improving the dielectric breakdown voltage tends to be low, and the effect of improving the stretchability is poor. From such a viewpoint, the content of the thermoplastic amorphous resin Y is more preferably 8% by mass or more, further preferably 11% by mass or more, and particularly preferably 20% by mass or more. Moreover, when there is too much content, it exists in the tendency for the crystallinity of SPS to fall easily, and it exists in the tendency for the heat resistance of a film to be inferior. From such a viewpoint, the content of the thermoplastic amorphous resin Y is more preferably 45% by mass or less, further preferably 40% by mass or less, and particularly preferably 35% by mass or less.
 もちろん、本発明の配向フィルムは、本発明の目的を阻害しない範囲内で、上記SPS、熱可塑性非晶樹脂Yの他に、さらに他の樹脂を併用してもよい。 Of course, the oriented film of the present invention may further use other resins in addition to the SPS and the thermoplastic amorphous resin Y as long as the object of the present invention is not impaired.
 <酸化防止剤>
 本発明の配向フィルムは、酸化防止剤を含有することが好ましい。酸化防止剤としては、生成したラジカルを捕捉して酸化を防止する一次酸化防止剤、あるいは生成したパーオキサイドを分解して酸化を防止する二次酸化防止剤のいずれであってもよい。一次酸化防止剤としてはフェノール系酸化防止剤、アミン系酸化防止剤が挙げられ、二次酸化防止剤としてはリン系酸化防止剤、硫黄系酸化防止剤が挙げられる。これらの中でも一次酸化防止剤が好ましく、特にフェノール系酸化防止剤が好ましい。
<Antioxidant>
The oriented film of the present invention preferably contains an antioxidant. The antioxidant may be either a primary antioxidant that captures the generated radicals to prevent oxidation, or a secondary antioxidant that decomposes the generated peroxides to prevent oxidation. Examples of the primary antioxidant include phenol-based antioxidants and amine-based antioxidants, and examples of the secondary antioxidant include phosphorus-based antioxidants and sulfur-based antioxidants. Of these, primary antioxidants are preferred, and phenolic antioxidants are particularly preferred.
 また、酸化防止剤は、その熱分解温度が250℃以上であることが好ましい。熱分解温度が高いと、高温における絶縁破壊電圧の向上効果が高くなる。熱分解温度が低すぎる場合は、溶融押出時に酸化防止剤自体が熱分解してしまい、工程を汚染してしまう、ポリマーが黄色く着色してしまう等の問題が生じやすくなる傾向にあり好ましくない。このような観点から、酸化防止剤の熱分解温度は、より好ましくは280℃以上、さらに好ましくは300℃以上、特に好ましくは320℃以上である。本発明における酸化防止剤は、熱分解しにくい方が好ましく、熱分解温度は高い方が好ましいが、現実的には、その上限は500℃以下程度である。 Further, it is preferable that the antioxidant has a thermal decomposition temperature of 250 ° C. or higher. When the thermal decomposition temperature is high, the effect of improving the dielectric breakdown voltage at a high temperature becomes high. If the thermal decomposition temperature is too low, the antioxidant itself is thermally decomposed at the time of melt extrusion, which tends to cause problems such as contamination of the process and yellowing of the polymer. From such a viewpoint, the thermal decomposition temperature of the antioxidant is more preferably 280 ° C. or higher, further preferably 300 ° C. or higher, and particularly preferably 320 ° C. or higher. The antioxidant in the present invention is preferably less susceptible to thermal decomposition and preferably has a higher thermal decomposition temperature, but in reality, the upper limit is about 500 ° C. or less.
 また、酸化防止剤の融点は、90℃以上であることが好ましい。融点が低すぎる場合は、溶融押出時に酸化防止剤がポリマーより早く融解してしまい、押出機のスクリュー供給部分においてポリマーがスリップしてしまう傾向にある。それによって、ポリマーの供給が不安定となり、フィルムの厚み斑が悪くなる等の問題が生じる。このような観点から、酸化防止剤の融点は、より好ましくは120℃以上、さらに好ましくは150℃以上、特に好ましくは200℃以上である。他方、酸化防止剤の融点が高すぎる場合は、溶融押出時に酸化防止剤が融解しにくくなり、ポリマー内での分散が悪くなってしまう傾向にある。それにより、酸化防止剤の添加効果が局所的にしか発現しない等の問題が生じる。このような観点から、酸化防止剤の融点は、好ましくは300℃以下、より好ましくは250℃以下、さらに好ましくは220℃以下、特に好ましくは170℃以下である。 The melting point of the antioxidant is preferably 90 ° C. or higher. If the melting point is too low, the antioxidant melts faster than the polymer during melt extrusion, and the polymer tends to slip at the screw supply portion of the extruder. As a result, the supply of the polymer becomes unstable, and problems such as the uneven thickness of the film occur. From such a viewpoint, the melting point of the antioxidant is more preferably 120 ° C. or higher, further preferably 150 ° C. or higher, and particularly preferably 200 ° C. or higher. On the other hand, when the melting point of the antioxidant is too high, the antioxidant becomes difficult to melt during melt extrusion, and the dispersion in the polymer tends to be poor. Thereby, problems such as the effect of adding the antioxidant appear only locally. From such a viewpoint, the melting point of the antioxidant is preferably 300 ° C. or lower, more preferably 250 ° C. or lower, further preferably 220 ° C. or lower, and particularly preferably 170 ° C. or lower.
 以上のような酸化防止剤としては、市販品をそのまま用いることもできる。市販品としては、例えば、ペンタエリスリトールテトラキス〔3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート〕(チバ・スペシャルティ・ケミカルズ社製:商品名IRGANOX1010)、N,N’-ビス〔3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオニル〕ヒドラジン(チバ・スペシャルティ・ケミカルズ社製:商品名IRGANOX1024)、N,N’-ヘキサン-1,6-ジイルビス〔3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオンアミド〕(チバ・スペシャルティ・ケミカルズ社製:商品名IRGANOX1098)等が好ましく挙げられる。 As the above antioxidants, commercially available products can be used as they are. Commercially available products include, for example, pentaerythritol tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate] (manufactured by Ciba Specialty Chemicals: trade name IRGANOX 1010), N, N′— Bis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionyl] hydrazine (manufactured by Ciba Specialty Chemicals: trade name IRGANOX1024), N, N′-hexane-1,6-diylbis [ 3- (3,5-di-t-butyl-4-hydroxyphenyl) propionamide] (manufactured by Ciba Specialty Chemicals: trade name IRGANOX 1098) is preferred.
 酸化防止剤の含有量は、配向フィルムの質量を基準として0.1質量%以上5質量%以下が好ましい。酸化防止剤を上記数値範囲の含有量で含有することによって、絶縁破壊電圧の向上効果を高くすることができる。酸化防止剤の含有量が少なすぎる場合は、酸化防止剤の添加効果が十分でなく、絶縁破壊電圧の向上効果が低くなる傾向にある。このような観点から、酸化防止剤の含有量は、0.2質量%以上がより好ましく、0.5質量%以上がさらに好ましく、0.7質量%以上が特に好ましい。他方、含有量が多すぎる場合は、二軸延伸フィルム中において酸化防止剤が凝集しやすくなる傾向にあり、酸化防止剤に起因する欠点が増加する傾向にあり、かかる欠点により絶縁破壊電圧の向上効果が低くなる。このような観点から、酸化防止剤の含有量は、3質量%以下がより好ましく、2質量%以下がさらに好ましく、1.5質量%以下が特に好ましい。 The content of the antioxidant is preferably 0.1% by mass or more and 5% by mass or less based on the mass of the oriented film. By containing the antioxidant in a content within the above numerical range, the effect of improving the dielectric breakdown voltage can be increased. When the content of the antioxidant is too small, the effect of adding the antioxidant is not sufficient, and the effect of improving the dielectric breakdown voltage tends to be low. From such a viewpoint, the content of the antioxidant is more preferably 0.2% by mass or more, further preferably 0.5% by mass or more, and particularly preferably 0.7% by mass or more. On the other hand, when the content is too high, the antioxidant tends to aggregate in the biaxially stretched film, and the defects due to the antioxidant tend to increase. Less effective. From such a viewpoint, the content of the antioxidant is more preferably 3% by mass or less, further preferably 2% by mass or less, and particularly preferably 1.5% by mass or less.
 これら酸化防止剤は、1種類を単独で用いてもよいし、2種以上を併用してもよい。 These antioxidants may be used alone or in combination of two or more.
 <その他の添加剤>
 本発明の配向フィルムは、本発明の目的を阻害しない範囲で、例えばさらに成形性、力学物性、表面性等を改良するために、熱可塑性非晶樹脂Yとは異なる他の樹脂成分を含有さたり、帯電防止剤、着色剤、耐候剤等の添加剤を加えることができる。また、多孔質粒子や前述の粒子B以外の不活性粒子も、本発明の目的を阻害しない範囲であれば、少量併用しても良い。
<Other additives>
The oriented film of the present invention contains other resin components different from the thermoplastic amorphous resin Y, for example, in order to further improve the moldability, mechanical properties, surface properties, etc., as long as the object of the present invention is not impaired. Or additives such as antistatic agents, colorants, weathering agents and the like can be added. In addition, porous particles and inert particles other than the above-described particle B may be used in a small amount as long as the object of the present invention is not impaired.
 <金属層>
 本発明の配向フィルムは、例えば少なくとも片面に金属層を積層することでコンデンサーとなる。金属層の材質については、特に制限はないが、例えばアルミニウム、亜鉛、ニッケル、クロム、錫、銅およびこれらの合金が挙げられる。さらにこれらの金属層は若干量酸化されていてもよい。また、金属層を簡便に形成できるため、金属層は蒸着法により形成された蒸着型金属層であることが好ましい。
<Metal layer>
The oriented film of the present invention becomes a capacitor by, for example, laminating a metal layer on at least one side. The material of the metal layer is not particularly limited, and examples thereof include aluminum, zinc, nickel, chromium, tin, copper, and alloys thereof. Further, these metal layers may be slightly oxidized. Moreover, since a metal layer can be formed easily, it is preferable that a metal layer is a vapor deposition type metal layer formed by the vapor deposition method.
 また、金属層を積層するにあたり、本発明の塗布層の面上にさらに金属層を設けることにより、基材層と金属層とが適度な接着力を有し、フィルムコンデンサー製造において巻回などの加工を施す場合には金属層の剥離がなく、コンデンサーとしての機能が発揮されるものとなる。さらに、同時に塗布層と金属層とが適度の接着性を有し、放電が起こっても、先に表面エネルギーの小さい塗布層がフィルムから剥離し、金属層と塗布層のみが破壊され、フィルムは破壊されず、それにより短絡状態にならず、絶縁破壊電圧の向上効果を高くすることができる。 Further, in laminating the metal layer, by further providing a metal layer on the surface of the coating layer of the present invention, the base material layer and the metal layer have an appropriate adhesive force, such as winding in film capacitor production. When processing is performed, the metal layer does not peel off, and the function as a capacitor is exhibited. Furthermore, at the same time, the coating layer and the metal layer have moderate adhesion, and even if a discharge occurs, the coating layer with a small surface energy is peeled off from the film first, and only the metal layer and the coating layer are destroyed. It is not destroyed, thereby not being short-circuited, and the effect of improving the dielectric breakdown voltage can be increased.
 <フィルム特性>
 (厚み方向の屈折率)
 本発明の配向フィルムは、厚み方向の屈折率が1.575以上1.635以下であることが好ましい。厚み方向の屈折率を上記数値範囲とすることによって、より絶縁破壊電圧を高くすることができる。また、フィルム製造工程におけるフィルム破断の頻度が低下し、生産性を向上しやすくなる。このような観点から、厚み方向の屈折率は、好ましくは1.620以下、さらに好ましくは1.615以下、特に好ましくは1.610以下である。他方、厚み方向の屈折率が低すぎる場合は、絶縁破壊電圧が低くなる傾向にある。
<Film characteristics>
(Refractive index in the thickness direction)
The oriented film of the present invention preferably has a refractive index in the thickness direction of 1.575 or more and 1.635 or less. By setting the refractive index in the thickness direction within the above numerical range, the dielectric breakdown voltage can be further increased. In addition, the frequency of film breakage in the film manufacturing process is reduced, and productivity is easily improved. From such a viewpoint, the refractive index in the thickness direction is preferably 1.620 or less, more preferably 1.615 or less, and particularly preferably 1.610 or less. On the other hand, when the refractive index in the thickness direction is too low, the dielectric breakdown voltage tends to be low.
 また、本発明の高絶縁性フィルムは、コンデンサーの製造工程におけるフィルム破断の頻度が増加し、コンデンサーの生産性が低下しやすくなる。さらに、フィルムの厚み斑が悪くなる傾向にあり、品質の安定したコンデンサーを得にくくなる。このような観点から、厚み方向の屈折率は、好ましくは1.590以上、さらに好ましくは1.595以上、特に好ましくは1.600以上である。 Also, the highly insulating film of the present invention increases the frequency of film breakage in the capacitor manufacturing process, and the productivity of the capacitor tends to decrease. Furthermore, the thickness unevenness of the film tends to deteriorate, and it becomes difficult to obtain a capacitor with stable quality. From such a viewpoint, the refractive index in the thickness direction is preferably 1.590 or more, more preferably 1.595 or more, and particularly preferably 1.600 or more.
 上記のような厚み方向の屈折率は、フィルムの延伸条件によって調整できる。 The refractive index in the thickness direction as described above can be adjusted according to the stretching conditions of the film.
 (フィルム厚み)
 本発明の配向フィルムは、その厚みは特に制限されないが、薄くなるほど本発明の効果が出やすいことから、特に0.4μm以上6.5μm未満であることが好ましい。さらに好ましくは0.4μm以上6.0μm未満であり、特に好ましくは0.5μm以上3.5μm未満である。また、上記のようなフィルム厚みにすることによって、静電容量の高いコンデンサーを得ることができる。
(Film thickness)
Although the thickness of the oriented film of the present invention is not particularly limited, it is particularly preferably 0.4 μm or more and less than 6.5 μm because the effects of the present invention are more likely to become thinner. More preferably, it is 0.4 μm or more and less than 6.0 μm, and particularly preferably 0.5 μm or more and less than 3.5 μm. Further, by setting the film thickness as described above, a capacitor having a high capacitance can be obtained.
 (ボイド率)
 本発明の配向フィルムは、多孔質粒子の周囲に実質的にボイドを含有しないことが好ましい。本発明において実質的にボイドを含有しないとは、ボイドを含有しないか、粒子の脱落を起こさない程度のボイドを含有することや絶縁破壊電圧を低下させない程度のボイドを含有することをいう。つまり、後述のボイド率を測定したとき、ボイド率が50%以下であり、特に好ましくは30%以下であることを意味する。なお、ボイド率が上限を超えると、加工中にフィラーの脱落が起こり、工程汚染だけでなく,表面粗さが変わりフィルムロールの巻取りに不具合を生じる。
(Void rate)
The oriented film of the present invention preferably contains substantially no voids around the porous particles. In the present invention, “substantially not containing a void” means containing a void that does not contain a void, does not cause particle dropout, or contains a void that does not lower the dielectric breakdown voltage. That is, when the void ratio described later is measured, it means that the void ratio is 50% or less, particularly preferably 30% or less. When the void ratio exceeds the upper limit, the filler falls off during processing, and not only the process contamination but also the surface roughness changes, resulting in problems in winding the film roll.
 (絶縁破壊電圧(BDV))
 本発明の配向フィルムは、120℃における絶縁破壊電圧(BDV)が450kV/mm以上であることが好ましい。絶縁破壊電圧が上記数値範囲にあるということは、高温においても優れた絶縁破壊電圧を有するということを表わす。かかる絶縁破壊電圧は、より好ましくは500kV/mm以上、さらに好ましくは520kV/mm以上である。
(Dielectric breakdown voltage (BDV))
The oriented film of the present invention preferably has a dielectric breakdown voltage (BDV) at 120 ° C. of 450 kV / mm or more. The fact that the dielectric breakdown voltage is in the above numerical range means that the dielectric breakdown voltage is excellent even at a high temperature. The dielectric breakdown voltage is more preferably 500 kV / mm or more, and further preferably 520 kV / mm or more.
 また、本発明の配向フィルムは、絶縁破壊電圧のばらつきについて、その標準偏差は40kV/mm以下であることが好ましく、より好ましくは30kV/mm以下、さらに好ましくは20kV/mm以下である。 The standard deviation of the oriented film of the present invention is preferably 40 kV / mm or less, more preferably 30 kV / mm or less, and still more preferably 20 kV / mm or less.
 本発明の配向フィルムは、特定の多孔質粒子を用いることで、絶縁破壊電圧の平均値が高く、しかもその標準偏差を小さくすることができ、コンデンサーなどの電気絶縁材料として用いた場合の材料の信頼性を高めることができる。すなわち、絶縁破壊電圧の標準偏差を小さくできることから、絶縁破壊電圧の最小値の低下が抑制され、絶縁破壊電圧の平均値が高くなる。 The oriented film of the present invention has a high average value of dielectric breakdown voltage by using specific porous particles, and can reduce the standard deviation of the material. When used as an electrical insulating material such as a capacitor, Reliability can be increased. That is, since the standard deviation of the breakdown voltage can be reduced, a decrease in the minimum value of the breakdown voltage is suppressed, and the average value of the breakdown voltage is increased.
 <フィルムの製造方法>
 本発明の配向フィルムは、基本的には従来から知られている、あるいは当業界に蓄積されている方法で得ることができる。以下、本発明の配向フィルムを得るための製造方法について詳記する。なお、本発明の配向フィルムは、一軸配向フィルムであっても二軸配向フィルムであっても良いが、生産性や物性のバランスの点から二軸配向フィルムであることが好ましい。以下、二軸配向フィルムを例にとって、説明する。
<Film production method>
The oriented film of the present invention can basically be obtained by a method conventionally known or accumulated in the art. Hereinafter, the production method for obtaining the oriented film of the present invention will be described in detail. The oriented film of the present invention may be a uniaxially oriented film or a biaxially oriented film, but is preferably a biaxially oriented film from the viewpoint of the balance between productivity and physical properties. Hereinafter, a biaxially oriented film will be described as an example.
 先ず、前述の通り、SPSと多孔質粒子とシリコーンオイルを配合した樹脂組成物を加熱溶融し、未延伸シートを作成する。具体的には樹脂組成物の融点(Tm、単位:℃)以上(Tm+50℃)以下の温度で加熱溶融し、シート状に押し出して、冷却固化して未延伸シートを得る。得られた未延伸シートの固有粘度は、0.35~0.9dl/gの範囲であることが好ましい。 First, as described above, a resin composition containing SPS, porous particles, and silicone oil is heated and melted to prepare an unstretched sheet. Specifically, the resin composition is heated and melted at a temperature not lower than the melting point (Tm, unit: ° C.) and not higher than (Tm + 50 ° C.), extruded into a sheet, cooled and solidified to obtain an unstretched sheet. The intrinsic viscosity of the obtained unstretched sheet is preferably in the range of 0.35 to 0.9 dl / g.
 次いで、この未延伸シートを二軸に延伸する。延伸は、縦方向(機械軸方向)および横方向(機械軸方向と厚み方向とに垂直な方向)を同時延伸してもよいし、任意の順序で逐次延伸してもよい。例えば逐次延伸の場合は、先ず一軸方向に(樹脂組成物のガラス転移温度(Tg、単位:℃)-10℃)以上(Tg+70℃)以下の温度で3.2倍以上5.8倍以下、好ましくは3.3倍以上5.4倍以下、さらに好ましくは3.4倍以上5.0倍以下の倍率で延伸し、次いで該一軸方向と直交する方向にTg以上(Tg+80℃)以下の温度で3.8倍以上5.9倍以下、好ましくは4.0倍以上5.5倍以下、より好ましくは4.1倍以上5.1倍以下、さらに好ましくは4.2倍以上4.9倍以下の倍率で延伸する。さらに、面積延伸倍率(=縦延伸倍率×横延伸倍率)としては、12.0倍以上である事が、前述の面配向係数を備えるフィルムを得るため好ましい。面積延伸倍率が低くなると、耐熱性が劣るようになり好ましくない。このことから、面積延伸倍率は13.0倍以上がより好ましく、13.5倍以上がさらに好ましく、14.0倍以上が特に好ましい。また、面積延伸倍率が高くなり過ぎると製膜・延伸時に破断が起き易くなり、望ましくない。このような観点から、面積延伸倍率は、22倍以下が好ましく、20倍以下がより好ましく、18倍以下がさらに好ましく、17倍以下が特に好ましい。 Next, this unstretched sheet is stretched biaxially. Stretching may be performed simultaneously in the machine direction (machine axis direction) and the transverse direction (direction perpendicular to the machine axis direction and the thickness direction) or sequentially in any order. For example, in the case of successive stretching, first, in a uniaxial direction (glass transition temperature (Tg, unit: ° C.) − 10 ° C.) to (Tg + 70 ° C.) or less at a temperature of 3.2 to 5.8 times, Preferably, the film is stretched at a magnification of 3.3 times to 5.4 times, more preferably 3.4 times to 5.0 times, and then a temperature of Tg or more (Tg + 80 ° C.) in a direction perpendicular to the uniaxial direction. 3.8 times to 5.9 times, preferably 4.0 times to 5.5 times, more preferably 4.1 times to 5.1 times, and even more preferably 4.2 times to 4.9 times. Stretch at a magnification of less than double. Furthermore, the area stretching ratio (= longitudinal stretching ratio × lateral stretching ratio) is preferably 12.0 times or more in order to obtain a film having the above-described plane orientation coefficient. If the area stretch ratio is low, the heat resistance becomes poor, which is not preferable. Therefore, the area stretch ratio is more preferably 13.0 times or more, further preferably 13.5 times or more, and particularly preferably 14.0 times or more. On the other hand, if the area stretch ratio is too high, breakage tends to occur during film formation and stretching, which is not desirable. From such a viewpoint, the area stretch ratio is preferably 22 times or less, more preferably 20 times or less, still more preferably 18 times or less, and particularly preferably 17 times or less.
 なお、本発明においては、未延伸シート、または、かかる未延伸シートを、好ましくは縦方向に一軸延伸した一軸延伸フィルムに、塗布層を形成するための塗液を塗布することで、塗布層を形成してもよい。 In the present invention, the coating layer is formed by applying a coating solution for forming a coating layer on an unstretched sheet or a uniaxially stretched film obtained by uniaxially stretching the unstretched sheet in the longitudinal direction. It may be formed.
 次いで、(Tg+70℃)~Tmの温度で熱固定する。熱固定の温度は200℃以上260℃以下であり、好ましくは225℃以上255℃以下であり、さらに好ましくは235℃以上250℃以下である。熱固定温度が高すぎる場合は、特にフィルム厚みの薄いフィルムを製造する際に、フィルム破断が生じやすくなり、また厚み斑が悪化してしまう。熱固定の後に必要に応じて熱固定温度より20℃~90℃低い温度下で弛緩処理をすると、寸法安定性が良くなる。 Next, heat setting is performed at a temperature of (Tg + 70 ° C.) to Tm. The heat setting temperature is 200 ° C. or higher and 260 ° C. or lower, preferably 225 ° C. or higher and 255 ° C. or lower, and more preferably 235 ° C. or higher and 250 ° C. or lower. When the heat setting temperature is too high, film breakage is likely to occur particularly when a film having a thin film thickness is produced, and the thickness unevenness is deteriorated. If relaxation treatment is performed at a temperature lower than the heat setting temperature by 20 ° C. to 90 ° C. as necessary after heat setting, the dimensional stability is improved.
 つぎに、第2の本発明の延伸フィルムについて説明する。
<延伸フィルム>
 第2の本発明の延伸フィルムは、シンジオタクチック構造のポリスチレン系樹脂(以下、SPSと称することがある)と、平均粒径Aが0.5~5.0μmの多孔質シリカ粒子とを含む樹脂組成物からなる。
Next, the stretched film of the second invention will be described.
<Stretched film>
The stretched film of the second aspect of the invention includes a syndiotactic polystyrene resin (hereinafter sometimes referred to as SPS) and porous silica particles having an average particle diameter A of 0.5 to 5.0 μm. It consists of a resin composition.
 ここで用いられるシンジオタクチック構造のポリスチレン系樹脂は、第1の本発明で説明したのと同様なことが言える。 The polystyrene resin having a syndiotactic structure used here can be said to be the same as described in the first aspect of the present invention.
 本発明の延伸フィルムに含まれる多孔質シリカ粒子は、以下で特に断りのない限り、前述の第1の本発明で説明したのと同様なことが言える。なお、第1の本発明とは異なり、特定の比表面積とDBA値を具備することから、シリコーンオイルは併用しなくても良い。 The porous silica particles contained in the stretched film of the present invention can be said to be the same as described in the first aspect of the present invention unless otherwise specified. Unlike the first aspect of the present invention, since it has a specific specific surface area and DBA value, silicone oil may not be used in combination.
 第2の本発明で用いられる多孔質シリカ粒子は、さらにDBA値(ジ-n-ブチルアミン吸着量)が200ミリモル/kg以下、好ましくは100ミリモル/kg以下であることが必要である。DBA値が200ミリモル/kgを超える場合には、樹脂組成物中での多孔質シリカ粒子の分散が悪くなるだけでなく、延伸フィルムに成形する際に樹脂と粒子の間にボイドが発生しやすくなるので好ましくない。なお、ここでいうDBA値は、ジ-n-ブチルアミンのトルエン溶液で多孔質シリカ粒子を処理した際のジ-n-ブチルアミン吸着量(粒子1kgに対するジ-n-ブチルアミンの吸着量(ミリモル))である。 The porous silica particles used in the second present invention are required to have a DBA value (di-n-butylamine adsorption amount) of 200 mmol / kg or less, preferably 100 mmol / kg or less. When the DBA value exceeds 200 mmol / kg, not only the dispersion of the porous silica particles in the resin composition is deteriorated, but also voids are easily generated between the resin and the particles when formed into a stretched film. This is not preferable. The DBA value here is the amount of di-n-butylamine adsorbed when the porous silica particles are treated with a toluene solution of di-n-butylamine (the amount of adsorbed di-n-butylamine per milligram of particles). It is.
 かかる多孔質シリカ粒子は、その製造方法は特に限定されず、ゾルゲル法、沈降法等従来公知の方法により製造される多孔質シリカ粒子の表面を、例えばアルキルアルコキシシラン化合物、シラザン化合物等で処理して、粒子表面のシラノール基を改質することにより容易に得ることができる。粒子表面にシラノール基が多い場合には、シンジオタクチック構造のポリスチレン系樹脂との親和性が低下して樹脂組成物中への粒子の分散性が低下する。また、延伸フィルムに成形する際に樹脂と粒子の間にボイドが発生しやすくなるだけでなく、粒子表面の活性があがって樹脂材料中に配合する際に、粒子の再凝集などの弊害を起しやすくなる。 The production method of the porous silica particles is not particularly limited, and the surface of the porous silica particles produced by a conventionally known method such as a sol-gel method or a precipitation method is treated with, for example, an alkylalkoxysilane compound or a silazane compound. Thus, it can be easily obtained by modifying the silanol group on the particle surface. When there are many silanol groups on the particle surface, the affinity with a polystyrene resin having a syndiotactic structure is lowered, and the dispersibility of the particles in the resin composition is lowered. In addition, voids are likely to be generated between the resin and the particles when formed into a stretched film, and when the activity of the particle surface is increased and blended into the resin material, problems such as particle re-aggregation occur. It becomes easy to do.
 また、多孔質シリカ粒子は1次粒子が凝集した凝集粒子であるものが好ましく、さらに好ましくは、その1次粒子径が0.01~0.1μmで、細孔容積が0.5~2.0ml/gの範囲にあるものであり、また、細孔平均径は5~25nmの範囲にあるものが好ましい。かかる要件を満たすことにより、延伸フィルム等に加工する際の応力により、該粒子が適度に変形して粒子の周りに形成されるボイドの径が小さくなるものと考えられる。 The porous silica particles are preferably aggregated particles in which primary particles are aggregated, and more preferably, the primary particle diameter is 0.01 to 0.1 μm and the pore volume is 0.5 to 2. It is preferably in the range of 0 ml / g, and the average pore diameter is preferably in the range of 5 to 25 nm. By satisfying such requirements, it is considered that the diameter of voids formed around the particles is reduced by moderately deforming the particles due to stress during processing into a stretched film or the like.
 以上に説明した第2の本発明の延伸フィルムは、上記の多孔質シリカ粒子の他に、平均粒径Aが0.01μm以上0.5μm未満の粒子(以下、不活性粒子Cと称することがある)を含有することが好ましい。かかる不活性粒子Cを含有することによって、高い絶縁破壊電圧を保ったまま、延伸フィルムの滑り性を良好なものとすることができ、巻取り性に優れた延伸フィルムを得ることができる。不活性粒子Cの平均粒径Aが小さすぎる場合には、滑り性の改善効果が低下する傾向にあり、巻取り性改善効果も低下する。他方、大きすぎる場合には、フィルム表面における低突起の高さが高くなりすぎ、それにより滑り性が高くなりすぎ、巻取り時に端面ズレを起こしやすくなるなど巻取り性が低下する。また、フィルム中のボイドが増大する傾向にあり、耐削れ性や絶縁破壊電圧が低くなる。このような観点から、不活性粒子Cの平均粒径Aは、好ましくは0.05μm以上0.5μm未満、さらに好ましくは0.1μm以上0.5μm未満、特に好ましくは0.2~0.4μmである。なお、かかる不活性粒子Cの平均粒径Aは、前記多孔質シリカ粒子の平均粒径Aよりも小さいことが好ましく、その差は0.2μm以上であることが好ましい。 The stretched film of the second invention described above has particles having an average particle size A of 0.01 μm or more and less than 0.5 μm (hereinafter referred to as inactive particles C) in addition to the porous silica particles described above. It is preferable to contain a certain). By containing such inactive particles C, the stretched film can have good slipping property while maintaining a high dielectric breakdown voltage, and a stretched film excellent in winding property can be obtained. When the average particle diameter A of the inert particles C is too small, the effect of improving the slipping property tends to be lowered, and the effect of improving the winding property is also lowered. On the other hand, if it is too large, the height of the low protrusions on the film surface becomes too high, thereby making the slipping property too high, and the winding property is lowered such that end face deviation is likely to occur during winding. In addition, voids in the film tend to increase, resulting in low abrasion resistance and dielectric breakdown voltage. From such a viewpoint, the average particle diameter A of the inert particles C is preferably 0.05 μm or more and less than 0.5 μm, more preferably 0.1 μm or more and less than 0.5 μm, particularly preferably 0.2 to 0.4 μm. It is. The average particle diameter A of the inert particles C is preferably smaller than the average particle diameter A of the porous silica particles, and the difference is preferably 0.2 μm or more.
 かかる不活性粒子Cは、粒径比(長径/短径)が1.0~1.3の球状粒子であることが好ましい。粒径比は、さらに好ましくは1.0~1.2、特に好ましくは1.0~1.1である。粒径比が上記数値範囲にあると、巻取り性の向上効果および絶縁破壊電圧の向上効果をより高くすることができる。 Such inert particles C are preferably spherical particles having a particle size ratio (major axis / minor axis) of 1.0 to 1.3. The particle size ratio is more preferably 1.0 to 1.2, particularly preferably 1.0 to 1.1. When the particle size ratio is in the above numerical range, the effect of improving the winding property and the effect of improving the dielectric breakdown voltage can be further increased.
 かかる不活性粒子は、有機系粒子、無機系粒子いずれであってもよい。有機系粒子としては、例えばポリスチレン樹脂粒子、シリコーン樹脂粒子、アクリル樹脂粒子、スチレン-アクリル樹脂粒子、ジビニルベンゼン-アクリル樹脂粒子、ポリエステル樹脂粒子、ポリイミド樹脂粒子、メラミン樹脂粒子等の高分子樹脂粒子が挙げられる。中でも、滑り性および耐削れ性に優れるという観点から、シリコーン樹脂粒子、ポリスチレン樹脂粒子が好ましく、前述のように、球状シリコーン樹脂粒子、球状ポリスチレン樹脂粒子が特に好ましい。また、無機系粒子としては、第1の本発明で説明した粒子Bの(1)~(15)例示したものが挙げられる。このうち、滑り性および耐削れ性に優れるという観点から、炭酸カルシウム粒子、シリカ粒子が好ましく、シリカ粒子が特に好ましい。このような無機系粒子は、前述のとおり球状であることが好ましく、球状シリカ粒子が特に好ましい。 Such inert particles may be either organic particles or inorganic particles. Examples of the organic particles include polymer resin particles such as polystyrene resin particles, silicone resin particles, acrylic resin particles, styrene-acrylic resin particles, divinylbenzene-acrylic resin particles, polyester resin particles, polyimide resin particles, and melamine resin particles. Can be mentioned. Among these, silicone resin particles and polystyrene resin particles are preferable from the viewpoint of excellent slipperiness and abrasion resistance, and spherical silicone resin particles and spherical polystyrene resin particles are particularly preferable as described above. Examples of the inorganic particles include particles (1) to (15) exemplified for the particles B described in the first aspect of the present invention. Of these, calcium carbonate particles and silica particles are preferable, and silica particles are particularly preferable from the viewpoint of excellent slipperiness and abrasion resistance. Such inorganic particles are preferably spherical as described above, and spherical silica particles are particularly preferred.
 不活性粒子Cとして最も好ましいのは、球状シリコーン樹脂粒子である。不活性粒子として球状シリコーン樹脂粒子を用いた場合は、後述する熱可塑性非晶樹脂としてポリフェニレンエーテルを併用した際に、相乗効果によってとりわけ耐熱性の高いものとなる。 Most preferable as the inert particles C are spherical silicone resin particles. When spherical silicone resin particles are used as the inert particles, the heat resistance becomes particularly high due to a synergistic effect when polyphenylene ether is used in combination as a thermoplastic amorphous resin described later.
 かかる不活性粒子Cの含有量は、樹脂組成物100質量%中に好ましくは0.01~3質量%、より好ましくは0.05~2質量%、さらに好ましくは0.1~0.5質量%、特に好ましくは0.1~0.3質量%以下である。かかる不活性粒子を上記範囲で含有することによって、高い絶縁破壊電圧を保ったまま、フィルムの取扱い性を良好なものとする
ことができる。
The content of the inert particles C is preferably 0.01 to 3% by mass, more preferably 0.05 to 2% by mass, and further preferably 0.1 to 0.5% by mass in 100% by mass of the resin composition. %, Particularly preferably 0.1 to 0.3% by mass or less. By containing such inert particles in the above range, the handleability of the film can be improved while maintaining a high dielectric breakdown voltage.
 なお、不活性粒子を含有しない樹脂組成物をフィルムに溶融成形する際に、得られるフィルム中の不活性粒子含有量が上記範囲となるように、不活性粒子をそのまま又はマスターチップとして添加しても構わない。 In addition, when melt-molding a resin composition containing no inert particles into a film, the inert particles are added as they are or as master chips so that the content of the inert particles in the resulting film is in the above range. It doesn't matter.
 第2の本発明の延伸フィルムは、さらに熱可塑性非晶樹脂を含有することが好ましい。ここでいう熱可塑性非晶樹脂は、前述の第1の本発明で説明したのと同様なことが言える。 It is preferable that the stretched film of the second present invention further contains a thermoplastic amorphous resin. The thermoplastic amorphous resin here can be said to be the same as that described in the first aspect of the present invention.
 また、第2の本発明の延伸フィルム中には、本発明の目的を阻害しない範囲内で、上記SPS、熱可塑性非晶樹脂の他に、さらに他の樹脂を併用してもよい。 In addition, in the stretched film of the second invention, other resins may be used in combination with the SPS and the thermoplastic amorphous resin as long as the object of the invention is not impaired.
 第2の本発明の延伸フィルムは、さらに酸化防止剤を含有することが好ましい。酸化防止剤としては、前述の第1の本発明で説明したのと同様なことが言える。 It is preferable that the stretched film of the second invention further contains an antioxidant. As the antioxidant, the same thing as described in the first aspect of the present invention can be said.
 第2の本発明の延伸フィルムは、本発明の目的を阻害しない範囲で、例えばさらに製膜性、力学物性、表面性等を改良するために、熱可塑性非晶樹脂とは異なる他の樹脂成分を含有さたり、帯電防止剤、着色剤、耐候剤等の添加剤を加えることができる。また、前述の粒子以外の不活性粒子も、本発明の目的を阻害しない範囲であれば、少量併用しても良い。 The stretched film of the second aspect of the present invention is a resin component different from the thermoplastic amorphous resin, for example, in order to further improve the film forming property, the mechanical properties, the surface property, etc., within the range not impairing the object of the present invention. Or additives such as antistatic agents, colorants, weathering agents and the like can be added. Further, inert particles other than the above-mentioned particles may be used in a small amount as long as the object of the present invention is not impaired.
 第2の本発明の延伸フィルムは、厚み方向の屈折率およびフィルム中に存在する最大長25μm以上の粗大凝集粒子について、前述の第1の本発明で説明したのと同様なことが言える。 The stretched film of the second invention can be said to have the same refractive index in the thickness direction and coarse agglomerated particles having a maximum length of 25 μm or more present in the film as described in the first invention.
 第2の本発明の延伸フィルムは、多孔質シリカ粒子の周囲に実質的にボイドを有しないことが好ましい。ここで実質的にボイドを有しないとは、第1の本発明で説明したのと同様である。なお、ボイド率が50%を超えると、加工中に粒子の脱落が起こり、工程汚染だけでなく,表面粗さが変わってフィルムロールの巻取りに不具合を生じる等の取扱い性が低下し、また、絶縁破壊電圧が低下しそのばらつきも大きくなりやすい(絶縁破壊特性が低下しやすい)。 It is preferable that the stretched film of the second invention has substantially no void around the porous silica particles. Here, “substantially no void” is the same as described in the first aspect of the present invention. If the void ratio exceeds 50%, particles fall off during processing, and not only process contamination but also the surface roughness changes, resulting in poor handling of the film roll. In addition, the dielectric breakdown voltage decreases and the variation tends to increase (dielectric breakdown characteristics tend to deteriorate).
 第2の本発明の延伸フィルムは、その厚みは特に制限されないが、薄くなるほど本発明の効果が出やすいことから、特に0.4~6.5μmであることが好ましい。さらに好ましくは0.4~6.0μmであり、特に好ましくは0.5~3.5μmである。このようなフィルム厚みにすることによって、静電容量の高いコンデンサーを得ることができる。 The thickness of the stretched film of the second invention is not particularly limited, but it is particularly preferably 0.4 to 6.5 μm because the effects of the invention are more likely to be obtained as the thickness is reduced. More preferably, it is 0.4 to 6.0 μm, and particularly preferably 0.5 to 3.5 μm. By using such a film thickness, a capacitor having a high capacitance can be obtained.
 第2の本発明の延伸フィルムは、さらに120℃における絶縁破壊電圧(BDV)が450V/μm以上であることが好ましい。絶縁破壊電圧がかかる要件を満たすということは、高温においても優れた絶縁破壊電圧を有するということを表わす。かかる絶縁破壊電圧は、より好ましくは500V/μm以上、さらに好ましくは520V/μm以上である。 The stretched film of the second invention preferably has a dielectric breakdown voltage (BDV) at 120 ° C. of 450 V / μm or more. The fact that the breakdown voltage satisfies such a requirement means that the breakdown voltage is excellent even at a high temperature. The breakdown voltage is more preferably 500 V / μm or more, and further preferably 520 V / μm or more.
 また、上記絶縁破壊電圧の標準偏差は40V/μm以下であることが好ましく、より好ましくは30V/μm以下、さらに好ましくは20V/μm以下である。この標準偏差がかかる要件を満たすということは、局所的な絶縁破壊電圧の低下が小さい(ばらつきが小さい)ということを表わし、コンデンサーなどの電気絶縁材料として用いた場合の材料の信頼性を高めることができる。 The standard deviation of the dielectric breakdown voltage is preferably 40 V / μm or less, more preferably 30 V / μm or less, and still more preferably 20 V / μm or less. If this standard deviation satisfies this requirement, it means that the local breakdown voltage drop is small (variation is small), and it increases the reliability of the material when used as an electrical insulation material such as a capacitor. Can do.
 第2の本発明の延伸フィルムは、その少なくとも片面の中心線平均表面粗さRaが7~89nmであることが好ましい。中心線平均表面粗さRaがこの範囲内にあることによって、巻取り性の向上効果を高くすることができる。また、耐ブロッキング性が向上し、ロールの外観を良好なものとすることができる。中心線平均表面粗さRaが低すぎる場合は、滑り性が低くなりすぎる傾向にあり、巻取り性の向上効果が低くなる。他方、高すぎる場合は、滑り性が高くなりすぎる傾向にあり、巻取り時に端面ズレを起こしやすくなるなど、巻取り性の向上効果が低くなる。このような観点から、中心線平均表面粗さRaの下限は、より好ましくは11nm以上、さらに好ましくは21nm以上、特に好ましくは31nm以上である。また、中心線平均表面粗さRaの上限は、より好ましくは79nm以下、さらに好ましくは69nm以下、特に好ましくは59nm以下である。 The stretched film of the second aspect of the present invention preferably has a center line average surface roughness Ra of 7 to 89 nm on at least one side. When the center line average surface roughness Ra is within this range, the effect of improving the winding property can be increased. Moreover, blocking resistance improves and the external appearance of a roll can be made favorable. When the center line average surface roughness Ra is too low, the slipping property tends to be too low, and the effect of improving the winding property is lowered. On the other hand, if it is too high, the slipping property tends to be too high, and the effect of improving the winding property becomes low, such as the occurrence of end face misalignment during winding. From such a viewpoint, the lower limit of the centerline average surface roughness Ra is more preferably 11 nm or more, further preferably 21 nm or more, and particularly preferably 31 nm or more. The upper limit of the center line average surface roughness Ra is more preferably 79 nm or less, still more preferably 69 nm or less, and particularly preferably 59 nm or less.
 また、第2の本発明の延伸フィルムは、その少なくとも片面の10点平均粗さRzが200~3000nmであることが好ましい。10点平均粗さRzがこの範囲内にあることによって、巻取り性の向上効果を高くすることができる。10点平均粗さRzが低すぎる場合は、ロールとして巻き上げる際にエアー抜け性が低くなる傾向にあり、フィルムが横滑りしやすくなる等巻取り性の向上効果が低くなる。特に、フィルム厚みが薄い場合は、フィルムの腰が無くなるため、エアー抜け性がさらに低くなる傾向にあり、巻取り性の向上効果がさらに低くなる。他方、10点平均粗さRzが高すぎる場合は、粗大突起が多くなる傾向にあり、絶縁破壊電圧の向上効果が低くなる。このような観点から、10点平均粗さRzの下限は、より好ましくは600nm以上、さらに好ましくは1000nm以上、特に好ましくは1250nm以上である。また、10点平均粗さRzの上限は、より好ましくは2600nm以下、さらに好ましくは2250nm以下、特に好ましくは1950nm以下である。 Further, the stretched film of the second invention preferably has a 10-point average roughness Rz of 200 to 3000 nm on at least one side thereof. When the 10-point average roughness Rz is within this range, the effect of improving the winding property can be increased. When the 10-point average roughness Rz is too low, the air release property tends to be low when the film is wound as a roll, and the effect of improving the winding property such that the film is liable to skid is reduced. In particular, when the film thickness is thin, the film loses its elasticity, so that the air release property tends to be further lowered, and the effect of improving the winding property is further reduced. On the other hand, when the 10-point average roughness Rz is too high, the number of coarse protrusions tends to increase, and the effect of improving the dielectric breakdown voltage is reduced. From such a viewpoint, the lower limit of the 10-point average roughness Rz is more preferably 600 nm or more, further preferably 1000 nm or more, and particularly preferably 1250 nm or more. Further, the upper limit of the 10-point average roughness Rz is more preferably 2600 nm or less, further preferably 2250 nm or less, and particularly preferably 1950 nm or less.
 <フィルムの製造方法>
 以上に説明した第2の本発明の延伸フィルムは、前述の第1の本発明で説明したのと、シリコーンオイルを添加しなくても良いこと以外は同様な製造方法で製造できる。
<Film production method>
The stretched film of the second invention described above can be produced by the same production method as described in the first invention except that the silicone oil need not be added.
 <樹脂組成物>
 第2の本発明の延伸フィルムの製造に好ましく用いられる樹脂組成物は、前述のシンジオタクチック構造のポリスチレン系樹脂に、多孔質シリカ粒子を溶融混合してなるものである。
<Resin composition>
The resin composition preferably used for the production of the stretched film of the second invention is obtained by melting and mixing porous silica particles with the above-mentioned syndiotactic polystyrene resin.
 ここで用いられる多孔質シリカ粒子の平均粒径Bは0.5~5μm、特に0.8~3.0μmの範囲にあることが好ましい。この平均粒径が0.5μm未満の場合には、フィルム等に溶融成形した際のフィルム中の多孔質シリカ粒子の平均粒径Aが小さくなって滑り性が不足し、巻取り性や取扱い性が不十分となる傾向にある。一方、5μmを超える場合には、フィルム等に溶融成形する際、延伸等により粒子の周りに形成されるボイドの径が大きくなりやすい。また、該粒子の含有量は、樹脂組成物質量を基準として0.01~10質量%、好ましくは0.5~5.0質量%の範囲とする。含有量が0.01質量%未満ではフィルム等に成形した後の成形品の滑り性が不足して取扱い性が不十分となる。一方、10質量%を超える場合には、樹脂組成物中での粒子の分散が悪くなるので好ましくない。なお、樹脂組成物をそのまま溶融成形してフィルム等に成形する場合には、粒子の含有量は前述のとおり、0.01~3質量%、さらに0.02~1質量%、特に0.05~0.5質量%の範囲とするのが好ましい。一方、ベース樹脂等で希釈して溶融製膜する場合には、含有量の多い、例えば0.5~10質量%の樹脂組成物を用い、フィルム等に成形した樹脂組成物中(フィルム中)の含有量が上記の範囲となるように希釈すればよい。 The average particle diameter B of the porous silica particles used here is preferably in the range of 0.5 to 5 μm, particularly 0.8 to 3.0 μm. When this average particle size is less than 0.5 μm, the average particle size A of the porous silica particles in the film when melt-formed into a film or the like becomes small and the slipping property is insufficient, so that the winding property and handling property are insufficient. Tends to be insufficient. On the other hand, when the thickness exceeds 5 μm, the diameter of voids formed around the particles by stretching or the like tends to increase when melt-molding into a film or the like. The content of the particles is 0.01 to 10% by mass, preferably 0.5 to 5.0% by mass based on the amount of the resin composition material. If the content is less than 0.01% by mass, the slidability of the molded product after being formed into a film or the like is insufficient, and the handleability becomes insufficient. On the other hand, when it exceeds 10% by mass, the dispersion of the particles in the resin composition is deteriorated, which is not preferable. When the resin composition is melt-molded as it is and formed into a film or the like, the content of the particles is 0.01 to 3% by mass, further 0.02 to 1% by mass, particularly 0.05, as described above. It is preferably in the range of 0.5% by mass. On the other hand, in the case of diluting with a base resin or the like to form a melt film, a resin composition having a high content, for example, 0.5 to 10% by mass is used. What is necessary is just to dilute so that content of may become said range.
 さらに、多孔質シリカ粒子のDBA値は、前述のとおり200ミリモル/kg以下、好ましくは100ミリモル/kg以下であることが必要である。DBA値が200ミリモル/kgを超える場合には、樹脂組成物中での多孔質シリカ粒子の分散が悪くなるだけでなく、延伸フィルムに成形する際に樹脂と粒子の間にボイドが発生しやすくなるので好ましくない。 Furthermore, the DBA value of the porous silica particles needs to be 200 mmol / kg or less, preferably 100 mmol / kg or less as described above. When the DBA value exceeds 200 mmol / kg, not only the dispersion of the porous silica particles in the resin composition is deteriorated, but also voids are easily generated between the resin and the particles when formed into a stretched film. This is not preferable.
 また、多孔質シリカ粒子の圧縮率は、前述のとおり20~90%、特に50~85%の範囲にあることが好ましい。圧縮率がこの範囲にあることにより、延伸フィルムに加工する際の応力により、該粒子が適度に変形して粒子の周りに形成されるボイドの径が小さくなるものと考えられる。 The compressibility of the porous silica particles is preferably in the range of 20 to 90%, particularly 50 to 85% as described above. When the compression ratio is within this range, it is considered that the diameter of the void formed around the particles is reduced by moderately deforming the particles due to the stress at the time of processing into a stretched film.
 かかる樹脂組成物には、前述のとおり、熱可塑性非晶樹脂、特にポリフェニレンエーテル樹脂が含まれていることが好ましい。熱可塑性非晶樹脂の含有割合は、樹脂組成物をそのまま溶融成形してフィルム等に成形する場合には、樹脂組成物の質量を基準として、48質量%以下、さらに5~48質量%の範囲であることが好ましい。かくすることにより、耐熱性に優れ、また絶縁破壊電圧を高くすることができ、すなわち高温における絶縁破壊電圧の向上した延伸フィルムを得ることができる。含有量が少なすぎる場合は、耐熱性の向上効果が低くなる傾向にあり、また絶縁破壊電圧の向上効果も低くなる傾向にあり、延伸性の向上効果も乏しくなる。このような観点から、熱可塑性非晶樹脂の含有量は、8質量%以上がより好ましく、11質量%以上がさらに好ましく、20質量%以上が特に好ましい。また、含有量が多すぎる場合は、SPSの結晶性が低下しやすくなる傾向にあり、フィルムの耐熱性が低下する傾向にある。このような観点から、熱可塑性非晶樹脂の含有量は、45質量%以下がより好ましく、40質量%以下がさらに好ましく、35質量%以下が特に好ましい。一方、樹脂組成物をマスターバッチとして使用し、多孔質シリカ粒子を含有しない、例えばシンジオタクチック構造のポリスチレン系樹脂等のベース樹脂や、その他の添加剤を含有するマスターバッチと溶融混練して希釈する場合には、ポリフェニレンエーテル樹脂の含有割合の多い、例えば含有量が20~80質量%の樹脂組成物を用い、フィルムに成形した樹脂組成物中の含有量が上記の範囲となるように希釈すればよい。 As described above, the resin composition preferably contains a thermoplastic amorphous resin, particularly a polyphenylene ether resin. When the resin composition is melt-molded as it is and formed into a film or the like, the thermoplastic amorphous resin content is 48 mass% or less, and more preferably in the range of 5 to 48 mass%, based on the mass of the resin composition. It is preferable that By doing so, it is possible to obtain a stretched film having excellent heat resistance and a high breakdown voltage, that is, an improved breakdown voltage at a high temperature. When the content is too small, the heat resistance improving effect tends to be low, the dielectric breakdown voltage improving effect tends to be low, and the stretchability improving effect is poor. From such a viewpoint, the content of the thermoplastic amorphous resin is more preferably 8% by mass or more, further preferably 11% by mass or more, and particularly preferably 20% by mass or more. Moreover, when there is too much content, it exists in the tendency for the crystallinity of SPS to fall easily, and it exists in the tendency for the heat resistance of a film to fall. From such a viewpoint, the content of the thermoplastic amorphous resin is more preferably 45% by mass or less, further preferably 40% by mass or less, and particularly preferably 35% by mass or less. On the other hand, the resin composition is used as a masterbatch and does not contain porous silica particles, for example, a base resin such as a syndiotactic polystyrene resin or a masterbatch containing other additives is melt-kneaded and diluted. In the case of using a resin composition having a high polyphenylene ether resin content, for example, a content of 20 to 80% by mass, it is diluted so that the content in the resin composition molded into a film is within the above range. do it.
 上述の多孔質シリカ粒子と樹脂材料との混合方法については特に限定する必要はなく、樹脂材料の重合段階で添加しても良いし、重合によって得られた樹脂材料に溶融混練する方法で添加しても良い。例えば、該粒子粉体と樹脂材料とを溶融混練機の同一供給口より供給して溶融混練してもよいし、ベント付二軸混練押出機等の溶融混練機中に先ず樹脂材料を投入し、該樹脂材料が溶融した部位に該粒子を粉体添加する方法でもよい。なかでも、該粒子と樹脂ペレットまたは樹脂粉末とを予め混合した後に、ベント付二軸混練押出機中に供給する方法が好ましい。かかる方法によれば、該粒子が樹脂ペレットまたは樹脂粉末の表面に付着しているので、混練機内部で解砕が進行する際、該粒子と樹脂との接触間隔が極めて小さいために分散性がさらに向上するものと推定される。 The mixing method of the porous silica particles and the resin material is not particularly limited, and may be added at the polymerization stage of the resin material, or may be added by a method of melt-kneading the resin material obtained by polymerization. May be. For example, the particle powder and the resin material may be supplied from the same supply port of the melt kneader and melt kneaded, or the resin material is first put into a melt kneader such as a biaxial kneading extruder with a vent. Alternatively, a method of adding the particles to the portion where the resin material is melted may be used. Of these, a method is preferable in which the particles and resin pellets or resin powder are mixed in advance and then fed into a vented twin-screw kneading extruder. According to such a method, since the particles are attached to the surface of the resin pellets or resin powder, when the crushing progresses inside the kneader, the contact distance between the particles and the resin is extremely small, so that the dispersibility is high. It is estimated that it will further improve.
 ベント付二軸混練押出機としては、粒子の添加口がベント付二軸混練押出機内部に配置されたスクリューのフルフライト部に設けられ、粒子を混練分散させるための送り翼と戻し翼とを有するローターセグメントを前記添加口よりスクリュー軸心方向下流側に少なくとも1箇所設けられている装置を使用することが好ましい。ここでベントラインは樹脂からの副生物の除去のためである。また、ベント付二軸混練押出機は、ローターセグメントが1~3箇所あることが好ましい。ローターセグメントが無いと該粒子の混練分散性が低下し、ローターセグメントが3箇所を超えると樹脂の推進力が低下してベントアップを生じやすくなる。また、該多孔質粒子の混練分散を補うためのニーディングディスクを有することが好ましい。 As a twin screw kneading extruder with a vent, a particle addition port is provided in a full flight part of a screw arranged inside a vented twin screw kneading extruder, and a feed blade and a return blade for kneading and dispersing particles are provided. It is preferable to use a device in which at least one rotor segment having at least one rotor segment is provided downstream from the addition port in the axial direction of the screw. Here, the vent line is for removal of by-products from the resin. Further, the vented twin-screw kneading extruder preferably has 1 to 3 rotor segments. If there is no rotor segment, the kneading dispersibility of the particles will be reduced, and if the rotor segment exceeds three locations, the propulsive force of the resin will be reduced and venting will be likely to occur. Moreover, it is preferable to have a kneading disk for supplementing the kneading dispersion of the porous particles.
 <コンデンサー>
 前述した本発明の延伸フィルムは、例えば少なくとも片面に金属層を積層することによりコンデンサーを得ることができる。金属層の材質については特に制限はないが、例えばアルミニウム、亜鉛、ニッケル、クロム、錫、銅およびこれらの合金が挙げられる。さらに、これらの金属層は若干量酸化されていてもよい。また、金属層を簡便に形成できるため、金属層は蒸着法により形成された蒸着型金属層であることが好ましい。なお、金属層を積層するにあたり、予め塗布層を設けることによって、延伸フィルム層(基材層)と金属層とに適度な接着力を持たせることができ、フィルムコンデンサー製造において巻回などの加工を施す場合には金属層の剥離がなく、コンデンサーとしての機能が発揮されるものとなる。さらに、同時に塗布層と金属層とが適度の接着性を有し、放電が起こっても、先に表面エネルギーの小さい塗布層がフィルムから剥離し、金属層と塗布層のみが破壊され、フィルムは破壊されず、それにより短絡状態にならず、絶縁破壊電圧の向上効果を高くすることができる。
<Condenser>
The stretched film of the present invention described above can obtain a capacitor by, for example, laminating a metal layer on at least one side. The material of the metal layer is not particularly limited, and examples thereof include aluminum, zinc, nickel, chromium, tin, copper, and alloys thereof. Further, these metal layers may be slightly oxidized. Moreover, since a metal layer can be formed easily, it is preferable that a metal layer is a vapor deposition type metal layer formed by the vapor deposition method. In addition, when laminating the metal layer, by providing a coating layer in advance, the stretched film layer (base material layer) and the metal layer can have an appropriate adhesive force, and processing such as winding in the production of film capacitors. In the case of applying, the metal layer is not peeled off and the function as a capacitor is exhibited. Furthermore, at the same time, the coating layer and the metal layer have moderate adhesion, and even if a discharge occurs, the coating layer with a small surface energy is peeled off from the film first, and only the metal layer and the coating layer are destroyed. It is not destroyed, thereby not being short-circuited, and the effect of improving the dielectric breakdown voltage can be increased.
 以下、実施例により本発明をさらに説明する。なお、各特性値は以下の方法により測定した。
(1)フィルム厚み
 電子マイクロメータ(アンリツ(株)製の商品名「K-312A型」)を用いて針圧30gにてフィルム厚みを測定した。
(2)粒子の平均粒径
 (2-1)平均粒径A
 フィルム中の平均粒径Aは、フィルム表面をプラズマリアクターで処理して粒子を露出させ、金スパッター装置によりこの表面に金薄膜蒸着層を厚み200~300Åで形成した。次いで、走査型電子顕微鏡を用いて1万5000倍で観察し、日本レギュレーター(株)製ルーゼックス500にて、110個の粒子についてその面積相当粒径(Di)を求め、そのうち計測した面積相当粒径(Di)の最大と最小のそれぞれ5個の面積相当粒径(Di)を除くそれら面積相当粒径(Di)の数平均を粒子の平均粒径Aとした。
Hereinafter, the present invention will be further described by examples. Each characteristic value was measured by the following method.
(1) Film thickness Using an electronic micrometer (trade name “K-312A type” manufactured by Anritsu Corporation), the film thickness was measured at a needle pressure of 30 g.
(2) Average particle diameter (2-1) Average particle diameter A
For the average particle size A in the film, the film surface was treated with a plasma reactor to expose the particles, and a gold thin film deposition layer was formed on the surface with a thickness of 200 to 300 mm by a gold sputtering apparatus. Next, observation was performed at a magnification of 15,000 using a scanning electron microscope, and the area equivalent particle diameter (Di) of 110 particles was obtained with Luzex 500 manufactured by Japan Regulator Co., Ltd. The number average of these area equivalent particle diameters (Di) excluding the five area equivalent particle diameters (Di) of the maximum and minimum diameters (Di) was defined as the average particle diameter A of the particles.
 (2-2)平均粒径B
 ポリマーに添加する前の平均粒径Bは、分散媒としてエタノールを使用し、島津製作所製レーザー回折式粒度分布測定装置SALD-2000Jを用いて体積分布基準で平均粒径Bを求めた。
(3)粒子の圧縮率
 ポリマーに添加する前の多孔質粒子について、島津製作所製微小圧縮試験MCTM-200(最大荷重1gf,最小荷重0.2gf)を用い、荷重負荷速度0.0725gf/secの条件で、粒径が平均粒子径と同じ粒子をn=5用意し、荷重0.2gfでの圧縮率を測定し、それらの平均値を粒子の圧縮率として算出した。
(4)多孔質粒子、その他の粒子、シリコーンオイル、熱可塑性非晶樹脂Y、酸化防止剤の含有量は、それぞれ後述の方法で測定した。
(2-2) Average particle diameter B
The average particle size B before being added to the polymer was determined on the basis of volume distribution using ethanol as a dispersion medium and using a laser diffraction particle size distribution analyzer SALD-2000J manufactured by Shimadzu Corporation.
(3) Particle compression rate For porous particles before being added to the polymer, a micro compression test MCTM-200 (maximum load 1 gf, minimum load 0.2 gf) manufactured by Shimadzu Corporation was used, and the load load rate was 0.0725 gf / sec. Under the conditions, n = 5 particles having the same particle size as the average particle size were prepared, the compression rate at a load of 0.2 gf was measured, and the average value thereof was calculated as the particle compression rate.
(4) The contents of porous particles, other particles, silicone oil, thermoplastic amorphous resin Y, and antioxidant were measured by the methods described later.
 多孔質粒子、その他の粒子:得られた配向フィルムを、樹脂は溶解し粒子は溶解しない溶媒を選択して、サンプルを溶解させた後、粒子を樹脂から遠心分離し、サンプル重量に対する粒子の比率(重量%)をもって粒子含有量とした。また、その他の粒子が含まれている場合は、個々の粒子の存在比率からそれぞれの含有量を求めた。 Porous particles and other particles: Select the solvent in which the obtained oriented film dissolves the resin but does not dissolve the particles, dissolve the sample, centrifuge the particles from the resin, and the ratio of the particles to the sample weight The particle content was defined as (% by weight). Moreover, when other particles were included, the respective contents were determined from the abundance ratio of the individual particles.
 シリコーンオイル:1H-NMR測定、13C-NMR測定により、積算回数32回、クライオプローブ(高感度プローブ)を使用してシリコーンオイルの成分および各成分量を特定した。 Silicone oil: The components of silicone oil and the amount of each component were identified by using a cryoprobe (high-sensitivity probe) by 32 times of integration by 1H-NMR measurement and 13 C-NMR measurement.
 熱可塑性非晶樹脂Y:H-NMR測定、13C-NMR測定により、熱可塑性非晶樹脂Yの成分および各成分量を特定した。 Thermoplastic Amorphous Resin Y: The components and the amount of each component of the thermoplastic amorphous resin Y were specified by 1 H-NMR measurement and 13 C-NMR measurement.
 酸化防止剤:H-NMR測定、13C-NMR測定により、酸化防止剤の成分および各成分量を特定した。なお、N,N’-ヘキサン-1,6-ジイルビス[3-(3,5-ジ-tert-ブチル-4-ヒドロキシフェニル)プロピオンアミド](登録商標Irg1098)の場合はtert-ブチル-4-ヒドロキシフェニルとアミド結合との間の炭化水素鎖に起因する水素に起因するピーク強度を測定した。かかるNMR測定結果をもとに、安定剤が樹脂と反応している場合はもとの安定剤に換算した含有量を求めた。また、ポリマーと未反応な安定剤と、ポリマーと反応した安定剤とが混在し、同じ炭化水素鎖に着目しても複数のピーク位置が検出される場合は、それらの合計値より含有量を求めた。
(5)製膜延伸性
 各実施例および比較例の条件にて、ポリマーを押出機に供給し、ダイスを通じて溶融押出する際の揮発成分の発生状況、およびフィルムの延伸製膜工程におけるフィルム製膜性について、以下の基準によって評価した。
Antioxidant: The components of the antioxidant and the amount of each component were identified by 1 H-NMR measurement and 13 C-NMR measurement. In the case of N, N′-hexane-1,6-diylbis [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionamide] (registered trademark Irg1098), tert-butyl-4- The peak intensity due to hydrogen due to the hydrocarbon chain between the hydroxyphenyl and the amide bond was measured. Based on the NMR measurement results, when the stabilizer reacted with the resin, the content converted to the original stabilizer was determined. In addition, if a polymer and an unreacted stabilizer are mixed with a stabilizer that has reacted with a polymer and a plurality of peak positions are detected even when focusing on the same hydrocarbon chain, the content is calculated from the total value of them. Asked.
(5) Film-forming stretchability Under the conditions of each example and comparative example, the polymer is supplied to an extruder and the volatile components are generated when melt-extruded through a die, and the film is formed in the film-drawing process. The sex was evaluated according to the following criteria.
 ◎:ポリマー溶融押出時に粗大凝集物などなく、製膜工程も破断することなく生産できる
 〇:ポリマー溶融押出時に粗大凝集物が見られるが、破断することなく生産できる
 △:ポリマー溶融押出時に粗大凝集物が見られるが、破断が時々発生し安定生産できない
 ×:ポリマー溶融押出時に粗大凝集物が著しいか、破断が多発し生産できない
(6)フィルター昇圧
 日本PALL社製H-250(目開き25μmの焼結(粒)型フィルター)にて、多孔質微粒子Aを含む樹脂を吐出量(kg)/フィルター面積(cm)にて換算した際、押出温度300℃、5kg/cmでろ過した場合の100kgろ過した際の初期圧力から上昇したフィルター圧力差(ΔP:単位はMPa)を評価し,以下の基準によって評価した。
◎: There is no coarse agglomerate during polymer melt extrusion, and the film forming process can be produced without breaking. ○: Coarse agglomerate is seen during polymer melt extrusion, but it can be produced without breaking. △: Coarse agglomeration during polymer melt extrusion. Some are broken, but breakage sometimes occurs and stable production cannot be achieved. ×: Coarse aggregates are remarkable at the time of polymer melt extrusion, or breakage occurs frequently and cannot be produced. (6) Filter pressurization Japan PALL H-250 (opening 25 μm) When the resin containing porous fine particles A is converted by discharge amount (kg) / filter area (cm 2 ) with a sintered (grain) type filter) and filtered at an extrusion temperature of 300 ° C. and 5 kg / cm 2 The filter pressure difference (ΔP: unit is MPa) increased from the initial pressure when 100 kg of was filtered was evaluated according to the following criteria.
 ◎:ポリマー溶融押出時にフィルターの昇圧が無く,安定に樹脂を押し出すことができる。 ◎: There is no pressure increase of the filter during polymer melt extrusion, and the resin can be extruded stably.
 〇:ポリマー溶融押出時にフィルターの昇圧が一時的に起こるが,安定に樹脂を押し出すことができる。 ○: The pressure of the filter temporarily increases during polymer melt extrusion, but the resin can be extruded stably.
 △:ポリマー溶融押出時にフィルターの圧力が緩やかに昇圧し、長期間安定的に樹脂を押し出せない。     Δ: The pressure of the filter gradually increases during polymer melt extrusion, and the resin cannot be extruded stably for a long period of time. .
 ×:ポリマー溶融押出時にフィルターの圧力が急激に昇圧し、短時間で押し出せなくなった。
(7)厚み方向の屈折率
 ナトリウムD線(589nm)を光源としたアッベ屈折計を用いて23℃65%RHにて、厚み方向の屈折率(Nz)を測定した。厚み方向の屈折率が高いほど、フィルムの面方向に分子鎖が配向していることを意味する。
(8)粗大凝集粒子個数
 フィルムサンプルについて、万能投影機を用い、透過照明にて20倍に拡大し、1m面積中に含まれる25μm以上の最大長をもつ粒子数をカウントした。
(9)ボイド率
 フィルムを厚み方向および幅方向に沿って、ミクロトームで切断し、切断面を(株)日立製走査型電子顕微鏡S-4700にて20000倍で、切断面におけるフィルム中の多孔質シリカ粒子およびそれらの周囲のボイドを観察して、粒子10個について各粒子の断面と各粒子の周囲のボイド断面のフィルム面方向の径を求め、下記式で各粒子のボイド率を算出した。
ボイド率=((粒子周囲のボイド径-粒子径)/粒子周囲のボイド径)×100
 粒子10個についてボイド率の平均を算出して、平均ボイド率とし、フィルム中にボイドが実質的にあるか、実質的にないかを評価した。
〇:ボイドが実質的にない(平均ボイド率が30%以下)
△:ボイドが実質的にない(平均ボイド率が30%超、50%以下)
×:ボイドが実質的にある(平均ボイド率が50%超)
(10)表面粗さ(RaおよびRz)
 非接触式三次元粗さ計(小坂研究所製、ET-30HK)を用いて波長780nmの半導体レーザー、ビーム径1.6μmの光触針で測定長(Lx)1mm、サンプリングピッチ2μm、カットオフ0.25mm、厚み方向拡大倍率1万倍、横方向拡大倍率200倍、走査線数100本(従って、Y方向の測定長Ly=0.2mm)の条件にてフィルム表面の突起プロファイルを測定した。その粗さ曲面をZ=f(x,y)で表わしたとき、次の式で得られる値をフィルムの中心線平均表面粗さ(Ra、単位:nm)とした。  
X: The pressure of the filter suddenly increased during polymer melt extrusion, and it was not possible to extrude in a short time.
(7) Refractive index in the thickness direction The refractive index (Nz) in the thickness direction was measured at 23 ° C. and 65% RH using an Abbe refractometer using sodium D line (589 nm) as a light source. A higher refractive index in the thickness direction means that molecular chains are oriented in the plane direction of the film.
(8) Number of coarse aggregated particles The film sample was magnified 20 times with transmitted illumination using a universal projector, and the number of particles having a maximum length of 25 μm or more contained in 1 m 2 area was counted.
(9) Void ratio The film was cut with a microtome along the thickness direction and the width direction, and the cut surface was 20,000 times with Hitachi Scanning Electron Microscope S-4700, and the porosity in the film on the cut surface The silica particles and the voids around them were observed, and the diameter of the cross section of each particle and the void cross section around each particle was determined for 10 particles, and the void ratio of each particle was calculated by the following formula.
Void ratio = ((void diameter around particle−particle diameter) / void diameter around particle) × 100
The average of the void ratio was calculated for 10 particles to obtain the average void ratio, and it was evaluated whether or not the void was substantially present in the film.
◯: There is substantially no void (average void ratio is 30% or less)
Δ: substantially free of voids (average void ratio is more than 30%, 50% or less)
X: Void is substantially present (average void ratio exceeds 50%)
(10) Surface roughness (Ra and Rz)
Measurement length (Lx) 1 mm, sampling pitch 2 μm, cut-off using a non-contact type 3D roughness meter (manufactured by Kosaka Laboratory, ET-30HK) with a semiconductor laser with a wavelength of 780 nm and an optical stylus with a beam diameter of 1.6 μm The protrusion profile on the film surface was measured under the conditions of 0.25 mm, thickness direction magnification 10,000 times, lateral direction magnification 200 times, and the number of scanning lines 100 (thus, the measurement length Ly in the Y direction was 0.2 mm). . When the roughness curved surface was represented by Z = f (x, y), the value obtained by the following formula was defined as the center line average surface roughness (Ra, unit: nm) of the film.
Figure JPOXMLDOC01-appb-M000001
Figure JPOXMLDOC01-appb-M000001
  また、上記Raにより得られたフィルム表面の突起プロファイルにおいて、ピーク(Hp)の高い方から5点と谷(Hv)の低い方から5点をとり、次の式により10点平均粗さ Also, in the projection profile on the film surface obtained by the above Ra, take 5 points from the highest peak (Hp) and 5 points from the lower valley (Hv), and 10 points average roughness by the following formula
Figure JPOXMLDOC01-appb-M000002
Figure JPOXMLDOC01-appb-M000002
(Rz、単位:nm)を求めた。
(11)巻取り性
 フィルムの製造工程において、フィルムを550mm幅で6000mのロール状に100m/分の速度で巻き上げ、その巻上げ状況、ロールの外観により以下の基準によって評価した。
(Rz, unit: nm) was determined.
(11) Winding property In the film production process, the film was wound up into a roll having a width of 550 mm and a width of 6000 m at a speed of 100 m / min.
 A:フィルム表面全体で表面粗さが均一であり,ロールの巻き姿良好
 B:フィルム中の粗大凝集粒子の影響により,ロールの表面に1個以上5個未満のピンプル(突起状盛り上がり)が見られるがほぼ良好  
 C:フィルム中の粗大凝集物が多数あり,ロールの表面に5個以上のピンプル(突起状盛り上がり)が見られ、外観不良  
 D:ロールのフィルム端面ズレが起き、巻き姿不良
(12)絶縁破壊電圧(BDV)およびばらつき
 得られた二軸配向フィルム(延伸フィルムサンプル)を用い、JIS規格C2151に記載のDC試験のうち平板電極法に準拠して、東京精電株式会社製ITS-6003を用いて、0.1kV/secの昇圧速度で測定し、破壊時の電圧を絶縁破壊電圧として測定した。測定はn=50で行い、平均値を絶縁破壊電圧とし、標準偏差を絶縁破壊電圧のばらつきとした。なお測定は25℃の室温で実施した。
(13)耐削れ性
 フィルムを長手方向に幅1/2インチ,長さ400mmにカットしたものを、フィルム走行試験機を用いてステンレスガイドピン(表面粗さ:Raで40nm)上を走行させ、走行速度が20mm/秒で200mmの距離を2往復させた(巻き付け角度90°、出側張力50g)。走行後、ガイドピンのフィルム接触部とフィルムのガイドピン接触面を日立製走査型電子顕微鏡S-4700にて100倍で粒子の付着量を観察して、次の基準で判定を行った。削れた粒子の堆積幅が小さいほど、耐削れ性に優れている。
○:0.20mm未満
△:0.20mm以上0.50mm未満
×:0.50mm以上
(14)耐ブロッキング性
 フィルムを100mm角の正方形にカットしたものを合計厚みが20μm以上になるように重ね合せ(フィルム1枚で厚みが20μm以上あるものは1枚で使用)、同じサイズのアルミ箔で上下1枚ずつ挟んだ積層体を作製した。その積層体を加熱プレス機にて熱圧着を行った。圧着条件はプレス温度125℃、プレス圧5MPa,プレス時間を30分とした。圧着後,積層体をオーブンにて150℃、30分間熱処理を行い、冷却後の積層体のフィルムとアルミ箔の剥離力を測定した。剥離力の測定は引張試験機を使用し、引張速度300mm/minの条件下で測定し、測定結果からブロッキング性を次の基準で判定した。
A: The surface roughness is uniform over the entire film surface, and the roll roll is good. B: Due to the influence of coarse aggregated particles in the film, 1 to less than 5 pimples (protruding bulges) are seen on the roll surface. Almost good
C: There are many coarse aggregates in the film, and 5 or more pimples (protruding protrusions) are seen on the surface of the roll, resulting in poor appearance.
D: Film end face misalignment of roll occurs, winding shape failure (12) Dielectric breakdown voltage (BDV) and variation Using the obtained biaxially oriented film (stretched film sample), flat plate among DC tests described in JIS standard C2151 In accordance with the electrode method, measurement was performed at a boosting rate of 0.1 kV / sec using ITS-6003 manufactured by Tokyo Seiden Co., Ltd., and the voltage at breakdown was measured as the dielectric breakdown voltage. The measurement was performed at n = 50, the average value was the breakdown voltage, and the standard deviation was the variation in breakdown voltage. The measurement was performed at room temperature of 25 ° C.
(13) Scratch resistance A film cut to 1/2 inch in width and 400 mm in length is run on a stainless guide pin (surface roughness: Ra of 40 nm) using a film running tester, The travel speed was 20 mm / second and the distance of 200 mm was reciprocated twice (winding angle 90 °, outlet tension 50 g). After running, the amount of adhering particles was observed at a magnification of 100 times with a Hitachi scanning electron microscope S-4700 at the film contact portion of the guide pin and the guide pin contact surface of the film, and the determination was made according to the following criteria. The smaller the accumulation width of the shaved particles, the better the shaving resistance.
○: Less than 0.20 mm Δ: 0.20 mm or more and less than 0.50 mm x: 0.50 mm or more (14) Anti-blocking property The film was cut into a 100 mm square and superimposed so that the total thickness was 20 μm or more. (A single film having a thickness of 20 μm or more is used as a single sheet), and a laminate was produced that was sandwiched between upper and lower sheets of aluminum foil of the same size. The laminate was subjected to thermocompression bonding with a hot press. The pressing conditions were a press temperature of 125 ° C., a press pressure of 5 MPa, and a press time of 30 minutes. After crimping, the laminate was heat treated in an oven at 150 ° C. for 30 minutes, and the peel strength between the cooled laminate film and aluminum foil was measured. The peel force was measured using a tensile tester under the condition of a tensile speed of 300 mm / min, and the blocking property was determined from the measurement result according to the following criteria.
 〇:ほとんど自然に剥離しているか、平均剥離力が1.0mN/mm以下である。 ○: Peeling almost naturally or the average peeling force is 1.0 mN / mm or less.
 △:部分的にブロッキングしているが、平均剥離力が1.0mN/mm超え、3.0mN/mm以下である。 Δ: Partially blocked, but average peel force exceeds 1.0 mN / mm and is 3.0 mN / mm or less.
 ×:全体的にブロッキングしており、平均剥離力が3.0mN/mmを超えている。
(15)多孔質性シリカ粒子のDBA値(ジ-n-ブチルアミンの吸着量)
 105℃、2時間で乾燥した試料250mgを精秤し、これに50mlの1/500N-DBA溶液(石油ベンジン溶媒)を加え、20℃で2時間放置する。この上澄液25mlにクロロホルム5ml、クリスタルバイオレット指示薬2~3滴を加え、紫色が青色に変わるまで1/100N-過塩素酸溶液(無水酢酸溶媒)で滴定し、この時の滴定値をAmlとする。別にブランクを行いBmlとし、次式によってDBA値を算出した。
X: Blocking is performed as a whole, and the average peeling force exceeds 3.0 mN / mm.
(15) DBA value of porous silica particles (adsorption amount of di-n-butylamine)
A sample of 250 mg dried at 105 ° C. for 2 hours is precisely weighed, 50 ml of 1/500 N-DBA solution (petroleum benzine solvent) is added thereto, and the mixture is allowed to stand at 20 ° C. for 2 hours. To 25 ml of this supernatant, add 5 ml of chloroform and 2 to 3 drops of crystal violet indicator, and titrate with a 1 / 100N-perchloric acid solution (acetic anhydride solvent) until the purple color turns blue. To do. Separately, it was blanked to obtain Bml, and the DBA value was calculated by the following formula.
 DBA値(ミリモル/kg)=80(A-B)f
但し、fは1/100N-過塩素酸溶液の力価
(R.Meyer;Kautschuku.Gummi.,7[8],180-182(1954)参照)
 [実施例1]
(多孔質シリカ粒子のシリコーンオイル付着処理)
 多孔質シリカ粒子(平均粒径=2.7μm、圧縮率=66%、細孔容積=1.5ml/g、細孔平均径=10nm)100質量部に対してシリコーンオイル(信越シリコーン製、線状ジメチルポリシロキサン、KF-96-100CS)1質量部をスプレーで吹き付けた後、ミキサーに入れて攪拌した。
(樹脂材料と多孔質シリカ粒子の溶融混練処理)
 樹脂投入口及び2箇所に真空ベントを有する神戸製鋼(株)製ベント付二軸混練押出機KTX-46にローターディスクの送り翼及び戻し翼を2箇所設置し、さらに、ローターセグメント部のすぐ下流側にニーディングディスクが配置されており、ニーディングディスクのすぐ下流側に逆送りフルフライトスクリューがある抵抗部分が配置された設備を用い、樹脂投入口より、熱可塑性非晶樹脂Yとして、ポリ(2,6-ジメチル-1,4-フェニレン)エーテル(クロロホルム中で測定された固有粘度が0.32dl/g、ガラス転移温度が210℃)30質量部と、ポリスチレン系樹脂として重量平均分子量3.0×10であり、13C-NMR測定でほぼ完全なシンジオタクチック構造であることが観察されるポリスチレン70質量部、これらの樹脂合計に対して上述のシリコーンオイル付着多孔質シリカ粒子を0.1質量部、酸化防止剤(C1)として、ペンタエリスリトールテトラキス〔3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート〕(チバ・スペシャルティ・ケミカルズ社製:商品名IRGANOX1010、融点120℃、熱分解温度335℃)2質量部の割合で混合分散した混合体を、35質量部/Hrの供給速度で、樹脂投入口より投入し、バレル温度270℃、スクリュー回転数250rpmでダイホールよりストランド状に溶融押出した。その後、冷却バスで樹脂を冷却した後、ペレターザーでカッテングを行い、長径約4mm、短径約4mm、長さ約3mmの樹脂組成物チップを得た。
(配向フィルムの製膜)
 得られた樹脂組成物を120℃で7時間乾燥し、次いで押出機に供給し、300℃で溶融し、ダイスリットから押出し後、50℃に冷却されたキャスティングドラム上で冷却固化し、未延伸シートを作成した。
DBA value (mmol / kg) = 80 (AB) f
Where f is the titer of 1 / 100N-perchloric acid solution (see R. Meyer; Kautschuku. Gummi., 7 [8], 180-182 (1954))
[Example 1]
(Silicon oil adhesion treatment of porous silica particles)
Silicone oil (manufactured by Shin-Etsu Silicone, wire) with respect to 100 parts by mass of porous silica particles (average particle size = 2.7 μm, compressibility = 66%, pore volume = 1.5 ml / g, average pore size = 10 nm) After spraying 1 part by mass of sprayed dimethylpolysiloxane, KF-96-100CS, the mixture was placed in a mixer and stirred.
(Melting and kneading treatment of resin material and porous silica particles)
Two feed blades and two return blades for the rotor disk are installed in the ventilated twin-screw kneading extruder KTX-46 made by Kobe Steel Co., Ltd., which has a vacuum vent at the resin inlet and two locations, and further downstream of the rotor segment. A kneading disk is arranged on the side, and a resistance part with a reverse full-flight screw is arranged just downstream of the kneading disk. 30 parts by weight of (2,6-dimethyl-1,4-phenylene) ether (inherent viscosity measured in chloroform is 0.32 dl / g, glass transition temperature is 210 ° C.) and a weight-average molecular weight of 3 as polystyrene resin .0 × a 10 5, 13 C-NMR polystyrene 70 quality to be an almost perfect syndiotactic structure is observed on In addition, 0.1 part by mass of the above-mentioned silicone oil-adhered porous silica particles with respect to the total amount of these resins, and pentaerythritol tetrakis [3- (3,5-di-t-butyl-) as an antioxidant (C1). 4-hydroxyphenyl) propionate] (manufactured by Ciba Specialty Chemicals: trade name IRGANOX 1010, melting point 120 ° C., thermal decomposition temperature 335 ° C.) Mixing and dispersing the mixture at a ratio of 2 parts by mass, supplying 35 parts by mass / Hr The resin was introduced at a speed from a resin inlet, and melt extruded from a die hole into a strand at a barrel temperature of 270 ° C. and a screw rotation speed of 250 rpm. Thereafter, the resin was cooled with a cooling bath, and then cut with a letterer to obtain a resin composition chip having a major axis of about 4 mm, a minor axis of about 4 mm, and a length of about 3 mm.
(Oriented film production)
The obtained resin composition was dried at 120 ° C. for 7 hours, then fed to an extruder, melted at 300 ° C., extruded from a die slit, solidified by cooling on a casting drum cooled to 50 ° C., and unstretched Created a sheet.
 この未延伸シートを140℃で縦方向(機械軸方向)に3.5倍延伸し、続いてテンターに導いた後、横方向(機械軸方向と厚み方向とに垂直な方向)に4.5倍延伸した。その際、延伸部分を等分の4ゾーンに別け、横方向の延伸速度は5000%/分とした。また、横方向の延伸の温度も、等分の4段階に別け、第1段階の温度を126℃、最終段階の温度を145℃とした。その後250℃で9秒間熱固定をし、さらに180℃まで冷却する間に横方向に2%弛緩処理をして、厚み2.5μmの二軸配向フィルムを得てロール状に巻き取った。得られたフィルムの特性を表1に示す。 This unstretched sheet was stretched 3.5 times in the longitudinal direction (machine axis direction) at 140 ° C., and subsequently led to a tenter, and then 4.5 times in the lateral direction (direction perpendicular to the machine axis direction and the thickness direction). The film was stretched twice. At that time, the stretched portion was divided into four equal zones, and the stretching speed in the transverse direction was set to 5000% / min. Further, the stretching temperature in the transverse direction was also divided into four equal parts, and the first stage temperature was 126 ° C. and the final stage temperature was 145 ° C. Thereafter, the film was heat-fixed at 250 ° C. for 9 seconds, and further subjected to a 2% relaxation treatment in the transverse direction while cooling to 180 ° C. to obtain a biaxially oriented film having a thickness of 2.5 μm and wound into a roll. The properties of the obtained film are shown in Table 1.
 [実施例2~20、比較例1~7]
 表1~3に記載の通り変更する以外は実施例1と同様な操作を繰り返した。得られた配向フィルムの評価結果を、実施例は表1および2に、比較例は表3に示す。
[Examples 2 to 20, Comparative Examples 1 to 7]
The same operation as in Example 1 was repeated except that the changes were made as described in Tables 1 to 3. The evaluation results of the obtained oriented film are shown in Tables 1 and 2 for Examples and Table 3 for Comparative Examples.
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
 表1~3中の、多孔質シリカは多孔質シリカ粒子を意味し、球状シリコーンは架橋シリコーン樹脂粒子を意味し、非多孔質シリカは球状シリカ粒子を意味する。表1中のIrg1010はペンタエリスリトールテトラキス〔3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート〕(チバ・スペシャルティ・ケミカルズ社製:商品名IRGANOX1010)を、Irg1098はN,N’-ビス3-(3’5’ジ-t-ブチル-4’-ヒドロキシフェニル)プロピオニルヘキサメチレンジアミン(チバ・スペシャルティ・ケミカルズ社製:商品名IRGANOX1098)、Irg565は2,4-ビス(n-オクチルチオ)-6-(4’-ヒドロキシ-3,5-ジ-t-ブチルアニリノ)-1,3,5-トリアジン(チバ・スペシャルティ・ケミカルズ社製:商品名IRGANOX565)を意味する。表1および2中のPPEはポリ(2,6-ジメチル-1,4-フェニレン)エーテル(クロロホルム中で測定された固有粘度が0.32dl/g、ガラス転移温度が210℃)を意味し、PCはビスフェノールA型ポリカーボネート(出光石油化学製 出光ポリカーボネートA300、ガラス転移温度が145℃)を意味する。また、表3中のフィルム中の平均粒子径の欄において、「-※」は粒子の凝集が多く、平均粒子径の測定を中止したことを意味する。 In Tables 1 to 3, porous silica means porous silica particles, spherical silicone means crosslinked silicone resin particles, and nonporous silica means spherical silica particles. In Table 1, Irg1010 is pentaerythritol tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate] (manufactured by Ciba Specialty Chemicals: trade name IRGANOX1010), and Irg1098 is N, N '-Bis 3- (3'5' di-t-butyl-4'-hydroxyphenyl) propionyl hexamethylenediamine (manufactured by Ciba Specialty Chemicals: trade name IRGANOX 1098), Irg565 is 2,4-bis (n- Octylthio) -6- (4′-hydroxy-3,5-di-t-butylanilino) -1,3,5-triazine (manufactured by Ciba Specialty Chemicals: trade name IRGANOX565). PPE in Tables 1 and 2 means poly (2,6-dimethyl-1,4-phenylene) ether (inherent viscosity measured in chloroform is 0.32 dl / g, glass transition temperature is 210 ° C.) PC means bisphenol A type polycarbonate (Idemitsu Petrochemical, Idemitsu Polycarbonate A300, glass transition temperature is 145 ° C.). Further, in the column of average particle diameter in the film in Table 3, “-*” means that the aggregation of the particles was large and the measurement of the average particle diameter was stopped.
 [合成例1]
 22wt%のケイ酸ソーダ水溶液と37wt%の硫酸水溶液を、混合ノズルを用いて反応させ、シリカヒドロゾルを得た。シリカヒドロゾルは約7分でゲル化してシリカヒドロゲルを得た。このシリカヒドロゲルを径約10mmに粗砕した後、90℃,pH9.0の条件で5時間の水熱処理し、その後水洗した。次に水洗したシリカヒドロゲルを振動流動層(中央化工機社製商品名「振動流動相装置VUA-15型」)を用いて、60分間乾燥する第1工程を行い含水量7%に乾燥したシリカを得た。この後、乾燥を行なったシリカに水を添加する第2工程を行って、含水量37%に調整したシリカを得、次に再度、振動流動層により2時間乾燥する第3工程を行って含水量1%のゲル法シリカを得た。この乾燥したシリカをジェットミルを用いて粉砕処理し、得られたシリカ100部を振動流動層に仕込み、除湿された空気によって振動流動させながらn-オクチルトリエトキシシラン12部を噴霧し30分間流動混合した。その後、速やかに温度25℃、湿度90%に保持された恒温恒湿槽中に入れ、72時間保持して表面処理されたシリカ粉体を得た。再度、シリカ分散のためジェットミルを用いて粉砕処理した。得られたシリカ粉体1(多孔質シリカ粒子1)の特性値を表4に示す。
[Synthesis Example 1]
A 22 wt% sodium silicate aqueous solution and a 37 wt% sulfuric acid aqueous solution were reacted using a mixing nozzle to obtain a silica hydrosol. The silica hydrosol gelled in about 7 minutes to obtain a silica hydrogel. This silica hydrogel was roughly crushed to a diameter of about 10 mm, hydrothermally treated at 90 ° C. and pH 9.0 for 5 hours, and then washed with water. Next, the silica hydrogel washed with water is subjected to a first step of drying for 60 minutes using a vibration fluidized bed (trade name “vibration fluid phase apparatus VUA-15 type” manufactured by Chuo Kako Co., Ltd.), and then dried to a moisture content of 7%. Got. Thereafter, a second step of adding water to the dried silica is performed to obtain a silica adjusted to a water content of 37%, and then a third step of drying for 2 hours in the vibrating fluidized bed is performed again. A gel silica having a water content of 1% was obtained. This dried silica is pulverized using a jet mill, and 100 parts of the resulting silica is charged into a vibrating fluidized bed, and 12 parts of n-octyltriethoxysilane is sprayed while being vibrated and flowed with dehumidified air, flowing for 30 minutes. Mixed. Then, it was immediately put into a constant temperature and humidity chamber maintained at a temperature of 25 ° C. and a humidity of 90%, and a surface-treated silica powder was obtained by maintaining for 72 hours. Again, it was pulverized using a jet mill for silica dispersion. Table 4 shows the characteristic values of the obtained silica powder 1 (porous silica particles 1).
 [合成例2、3、5]
 ジェットミル条件を変更して平均粒径を調整する以外は、合成例1と同様な処理行った。得られたシリカ粉体2、3、5の特性値を表4に示す。
[Synthesis Examples 2, 3, 5]
The same treatment as in Synthesis Example 1 was performed except that the average particle size was adjusted by changing the jet mill conditions. Table 4 shows the characteristic values of the obtained silica powders 2, 3, and 5.
 [合成例4]
 添加するn-オクチルトリエトキシシラン量を変更する以外は、合成例1と同様な処理行った。得られたシリカ粉体4の特性値を表4に示す。
[Synthesis Example 4]
The same treatment as in Synthesis Example 1 was performed except that the amount of n-octyltriethoxysilane added was changed. The characteristic values of the obtained silica powder 4 are shown in Table 4.
 [合成例6]
 小粒径とするため、1回目のジェットミル処理の後、シリカを蒸留水にて10%スラリーとし、サンドグラインダー(ダイノーミル、容量5L)の湿式粉砕工程を追加する以外は、合成例1と同様な処理行った。得られたシリカ粉体6の特性値を表4に示す。このシリカ粉体は平均粒径が0.3μmと小さすぎるため、圧縮率は測定できなかった。
[Synthesis Example 6]
To make the particle size small, the same as Synthesis Example 1 except that after the first jet mill treatment, silica is made into 10% slurry with distilled water and a wet grinding step of a sand grinder (dyno mill, capacity 5 L) is added. Was done. The characteristic values of the obtained silica powder 6 are shown in Table 4. Since this silica powder had an average particle size of too small as 0.3 μm, the compression rate could not be measured.
 [合成例7]
 n-オクチルトリエトキシシランでの表面処理を施さない以外は、合成例1と同様な処理行った。得られたシリカ粉体7の特性値を表4に示す。
[Synthesis Example 7]
The same treatment as in Synthesis Example 1 was performed, except that the surface treatment with n-octyltriethoxysilane was not performed. The characteristic values of the obtained silica powder 7 are shown in Table 4.
 [参考例1]
 樹脂投入口及び2箇所に真空ベントを有する神戸製鋼(株)製ベント付二軸混練押出機KTX-46にローターディスクの送り翼及び戻し翼を2箇所設置し、さらに、ローターセグメント部のすぐ下流側にニーディングディスクが配置されており、ニーディングディスクのすぐ下流側に逆送りフルフライトスクリューがある抵抗部分が配置された設備を用い、樹脂投入口よりポリフェニレンエーテル樹脂(以下、PPEと略すことがある)として三菱エンジニアリングプラスチック製ユピエースPX-100L(Tg210℃)を40質量部、シンジオタクチック構造のポリスチレン系樹脂(以下、SPSと略すことがある)として出光興産製ザレック60ZCを55.8質量部、酸化防止剤としてチバ・スペシャルティ・ケミカルズ社製イルガノックス1010を0.2質量部混合投入した。
[Reference Example 1]
Two feed blades and two return blades for the rotor disk are installed in the ventilated twin-screw kneading extruder KTX-46 made by Kobe Steel Co., Ltd., which has a vacuum vent at the resin inlet and two locations, and further downstream of the rotor segment. A kneading disk is arranged on the side, and a polyphenylene ether resin (hereinafter abbreviated as PPE) is introduced from the resin inlet using equipment in which a resistance part with a reverse feed full flight screw is arranged immediately downstream of the kneading disk. Mitsubishi Engineering Plastics Iupiace PX-100L (Tg210 ° C) is 40 parts by mass, and a syndiotactic polystyrene resin (hereinafter sometimes abbreviated as SPS) is 55.8 masses of Idemitsu Kosan Zarek 60ZC. As an antioxidant, Ciba Specialty Chemicals Inc. The Ganokkusu 1010 was 0.2 part by weight mixture turned.
 さらに、多孔質シリカ粒子として前述のシリカ粉体1を4質量部、二軸混練押出機の中間部分(ニーディングディスクの下流部分)より添加し混合分散した。この際、混合体フィード量は35質量部/Hr、バレル温度270℃、スクリュー回転数250rpmでダイホールよりストランド状に溶融押出した。その後、冷却バスで樹脂を冷却した後、ペレターザーでカッテングを行い、長径約4mm、短径約4mm、長さ約3mmの樹脂組成物チップを得た。得られた樹脂組成物チップを表4に示す。 Furthermore, 4 parts by mass of the silica powder 1 described above as porous silica particles was added from the middle part of the twin-screw kneading extruder (downstream part of the kneading disk), and mixed and dispersed. At this time, the mixture feed amount was 35 parts by mass / Hr, the barrel temperature was 270 ° C., and the screw rotation speed was 250 rpm. Thereafter, the resin was cooled with a cooling bath, and then cut with a letterer to obtain a resin composition chip having a major axis of about 4 mm, a minor axis of about 4 mm, and a length of about 3 mm. The obtained resin composition chip is shown in Table 4.
 [参考例2~5、参考比較例1~3]
 使用する多孔質シリカ粒子、PPE、SPSの使用割合を表3に記載のとおりとする以外は、参考例1と同様にして樹脂組成物チップを得た。あわせて表4に示す。
[Reference Examples 2 to 5, Reference Comparative Examples 1 to 3]
A resin composition chip was obtained in the same manner as in Reference Example 1 except that the usage ratios of the porous silica particles, PPE, and SPS used were as shown in Table 3. The results are also shown in Table 4.
 [参考例6]
 多孔質シリカ粒子の他に、平均粒径Bが0.3μmの球状シリコーン樹脂粒子を4質量部用い、SPSの使用割合を表1に記載のとおりとする以外は、参考例1と同様にして樹脂組成物チップを得た。あわせて表4に示す。
[Reference Example 6]
In addition to the porous silica particles, 4 parts by mass of spherical silicone resin particles having an average particle size B of 0.3 μm were used, and the same as in Reference Example 1 except that the use ratio of SPS was as shown in Table 1. A resin composition chip was obtained. The results are also shown in Table 4.
 [参考比較例4]
 使用する多孔質シリカ粒子に変えて、平均粒径Bが2.0μmの球状シリカ粒子(非多孔質)を用いる以外は、参考例1と同様にして樹脂組成物チップを得た。あわせて表4に示す。
[Reference Comparative Example 4]
A resin composition chip was obtained in the same manner as in Reference Example 1 except that spherical silica particles (non-porous) having an average particle size B of 2.0 μm were used instead of the porous silica particles used. The results are also shown in Table 4.
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000006
[実施例21]
 参考例1で得られた樹脂組成物チップ(マスターチップA)、ポリフェニレンエーテル樹脂(三菱エンジニアリングプラスチック製ユピエースPX-100L)、シンジオタクチック構造のポリスチレン系樹脂(出光興産製ザレック60ZC)、ポリフェニレンエーレル樹脂(三菱エンジニアリングプラスチック製ユピエースPX-100L)に酸化防止剤としてチバ・スペシャルティ・ケミカルズ社製イルガノックス1010を5重量%含有させたマスターチップをそれぞれ乾燥した後、表5記載の組成のフィルムが得られる割合でこれらを混合して押出機に供給し、300℃で溶融し、ダイスリットから押出し後、50℃に冷却されたキャスティングドラム上で冷却固化し、未延伸シートを作成した。なお、酸化防止剤はフィルムの製膜過程で一部飛散されるので、原料の混合物中の酸化防止剤含有量は多めとしてフィルム中の含有量が1重量%となるように調整した。
[Example 21]
Resin composition chip (master chip A) obtained in Reference Example 1, polyphenylene ether resin (Mitsubishi Engineering Plastics Iupiace PX-100L), syndiotactic polystyrene resin (Zarek 60ZC made by Idemitsu Kosan), polyphenylene ether After drying master chips containing 5% by weight of Irganox 1010 manufactured by Ciba Specialty Chemicals as an antioxidant in resin (Iupiace PX-100L manufactured by Mitsubishi Engineering Plastics), a film having the composition shown in Table 5 was obtained. These were mixed at a ratio and supplied to an extruder, melted at 300 ° C., extruded from a die slit, and cooled and solidified on a casting drum cooled to 50 ° C. to prepare an unstretched sheet. In addition, since antioxidant was partly scattered in the film forming process of the film, the antioxidant content in the mixture of raw materials was increased so that the content in the film was 1% by weight.
 この未延伸シートを140℃で縦方向(機械軸方向)に3.5倍延伸し、続いてテンターに導いた後、横方向(機械軸方向と厚み方向とに垂直な方向)に4.5倍延伸した。その際、横方向の延伸速度は5000%/分とし、横方向の延伸の温度は、等分の4段階に別け、第1段階の温度を126℃、最終段階の温度を145℃とした。その後250℃で9秒間熱固定をし、さらに180℃まで冷却する間に横方向に2%弛緩処理をして、厚み2.5μmの二軸延伸フィルムを得てロール状に巻き取った。得られたフィルムの特性を表4に示す。 This unstretched sheet was stretched 3.5 times in the longitudinal direction (machine axis direction) at 140 ° C., and subsequently led to a tenter, and then 4.5 times in the lateral direction (direction perpendicular to the machine axis direction and the thickness direction). The film was stretched twice. At that time, the transverse stretching speed was 5000% / min, the transverse stretching temperature was divided into four equal parts, the first stage temperature was 126 ° C., and the final stage temperature was 145 ° C. Thereafter, the film was heat-fixed at 250 ° C. for 9 seconds, and further subjected to a 2% relaxation treatment in the transverse direction while cooling to 180 ° C. to obtain a biaxially stretched film having a thickness of 2.5 μm and wound into a roll. Table 4 shows the properties of the obtained film.
 [実施例22~24、26、29,30,33~37、比較例8~10、12、13]
 表5~7に記載のとおりのマスターチップを用い、得られるフィルムの組成が表5~7に記載となるように、ポリフェニレンエーテル樹脂、ポリカーボネート樹脂、シンジオタクチック構造のポリスチレン系樹脂および酸化防止剤含有マスターチップを併用する以外は実施例21と同様な操作を繰り返した。得られた延伸フィルムの評価結果を表5~7に示す。なお、実施例25、26においては、酸化防止剤含有マスターチップとしてイルガノックス1010を5重量%含有させたシンジオタクチック構造のポリスチレン系樹脂(出光興産製ザレック60ZC)を用いた。
[Examples 22 to 24, 26, 29, 30, 33 to 37, Comparative Examples 8 to 10, 12, and 13]
Using a master chip as described in Tables 5-7, and so that the composition of the film obtained is as described in Tables 5-7, polyphenylene ether resin, polycarbonate resin, syndiotactic polystyrene resin and antioxidant The same operation as in Example 21 was repeated except that the contained master chip was used in combination. The evaluation results of the obtained stretched film are shown in Tables 5 to 7. In Examples 25 and 26, a syndiotactic polystyrene resin (Idemitsu Kosan Zarek 60ZC) containing 5% by weight of Irganox 1010 was used as an antioxidant-containing master chip.
 [実施例25、27、28、31、32、比較例11]
 得られるフィルムの組成が表5~7に記載となるように、ポリフェニレンエーテル樹脂、シンジオタクチック構造のポリスチレン系樹脂、多孔質シリカ粒子および酸化防止剤を、参考例1と同様に混合して先ず樹脂組成物チップを得た。得られた樹脂組成物を乾燥し、実施例21と同様に製膜して二軸延伸フィルムを得た。得られた延伸フィルムの評価結果を表5~7に示す。
[Examples 25, 27, 28, 31, 32, Comparative Example 11]
First, a polyphenylene ether resin, a polystyrene resin having a syndiotactic structure, porous silica particles and an antioxidant were mixed in the same manner as in Reference Example 1 so that the composition of the resulting film was as shown in Tables 5-7. A resin composition chip was obtained. The obtained resin composition was dried and formed into a film in the same manner as in Example 21 to obtain a biaxially stretched film. The evaluation results of the obtained stretched film are shown in Tables 5 to 7.
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000009
Figure JPOXMLDOC01-appb-T000009
 表5~7中のPCは、ビスフェノールA型ポリカーボネート(出光石油化学製  出光ポリカーボネートA300、ガラス転移温度が145℃)である。 PC in Tables 5 to 7 is a bisphenol A type polycarbonate (Idemitsu Petrochemicals Idemitsu Polycarbonate A300, glass transition temperature 145 ° C.).
 また、表5~7中の、Irg1010はペンタエリスリトールテトラキス〔3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート〕(チバ・スペシャルティ・ケミカルズ社製:商品名IRGANOX1010)を、Irg1098はN,N’-ビス3-(3'5'ジ-t-ブチル-4'-ヒドロキシフェニル)プロピオニルヘキサメチレンジアミン(チバ・スペシャルティ・ケミカルズ社製:商品名IRGANOX1098)、Irg565は2,4-ビス(n-オクチルチオ)-6-(4'-ヒドロキシ-3,5-ジ-t-ブチルアニリノ)-1,3,5-トリアジン(チバ・スペシャルティ・ケミカルズ社製:商品名IRGANOX565)である。 In Tables 5 to 7, Irg1010 is pentaerythritol tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate] (manufactured by Ciba Specialty Chemicals: trade name IRGANOX1010). Irg1098 is N, N′-bis-3- (3′5′di-t-butyl-4′-hydroxyphenyl) propionylhexamethylenediamine (manufactured by Ciba Specialty Chemicals: trade name IRGANOX1098), and Irg565 is 2,4. -Bis (n-octylthio) -6- (4'-hydroxy-3,5-di-t-butylanilino) -1,3,5-triazine (manufactured by Ciba Specialty Chemicals: trade name IRGANOX 565).
 第1の本発明の配向フィルムは、耐削れ性と巻取り性に優れることから、特にフィルムコンデンサー用のベースフィルムとして特に好適に使用することができる。 The oriented film of the first aspect of the present invention is particularly suitable as a base film for a film capacitor because it is excellent in abrasion resistance and winding property.
 また、第2の本発明の延伸フィルムは、粒子の分散性に優れると共に、粒子に起因して生ずるボイドの径が小さいので、耐削れ性、取扱い性、絶縁破壊特性(絶縁破壊電圧およびそのばらつき)に優れ、特にフィルムコンデンサー用として好適に使用することができる。 In addition, the stretched film of the second aspect of the present invention is excellent in particle dispersibility and has a small void diameter caused by the particles, so that it has excellent wear resistance, handleability, and dielectric breakdown characteristics (dielectric breakdown voltage and variations thereof). In particular, it can be suitably used as a film capacitor.

Claims (13)

  1.  シンジオタクチック構造のスチレン系重合体と平均粒径が0.5~5.0μmの多孔質粒子を含む樹脂組成物からなり、多孔質粒子の含有量は該樹脂組成物の質量を基準として0.01質量%以上3質量%以下の範囲であって、
    (1)樹脂組成物がシリコーンオイルを含有し、シリコーンオイルの含有量は該多孔質粒子の質量を基準として、0.1~3質量%の範囲であること、または
    (2)多孔質粒子が、平均粒径Aが0.5~5μm、DBA値が200ミリモル/kg以下である多孔質シリカ粒子であること
    のいずれかを満足することを特徴とする延伸フィルム。
    It comprises a resin composition comprising a styrene polymer having a syndiotactic structure and porous particles having an average particle size of 0.5 to 5.0 μm, and the content of the porous particles is 0 based on the mass of the resin composition. In the range of not less than 01% by mass and not more than 3% by mass,
    (1) The resin composition contains silicone oil, and the silicone oil content is in the range of 0.1 to 3% by mass based on the mass of the porous particles, or (2) the porous particles are A stretched film characterized by satisfying any of the following: porous silica particles having an average particle diameter A of 0.5 to 5 μm and a DBA value of 200 mmol / kg or less.
  2.  シンジオタクチック構造のスチレン系重合体と平均粒径が0.5~5.0μmの多孔質粒子とシリコーンオイルを含む樹脂組成物からなり、多孔質粒子の含有量は該樹脂組成物の質量を基準として0.01質量%以上3質量%以下の範囲で、シリコーンオイルの含有量は該多孔質粒子の質量を基準として、0.1~3質量%の範囲である請求項1記載の延伸フィルム。 It comprises a resin composition comprising a styrenic polymer having a syndiotactic structure, porous particles having an average particle size of 0.5 to 5.0 μm and silicone oil, and the content of the porous particles is the mass of the resin composition. 2. The stretched film according to claim 1, wherein the content of the silicone oil is in the range of 0.1 to 3% by mass based on the mass of the porous particles in a range of 0.01% by mass to 3% by mass as a standard. .
  3.  シンジオタクチック構造のポリスチレン系樹脂と、平均粒径Aが0.5~5μm、DBA値が200ミリモル/kg以下である多孔質シリカ粒子を含む樹脂組成物からなる延伸フィルムであって、該多孔質シリカ粒子の含有量が樹脂組成物質量を基準として0.01~3質量%である請求項1記載の延伸フィルム。 A stretched film comprising a polystyrene resin having a syndiotactic structure and a porous silica particle having an average particle diameter A of 0.5 to 5 μm and a DBA value of 200 mmol / kg or less, 2. The stretched film according to claim 1, wherein the content of the porous silica particles is 0.01 to 3% by mass based on the amount of the resin composition material.
  4.  樹脂組成物が、熱可塑性非晶樹脂を含有する請求項1~3のいずれかに記載の延伸フィルム。 The stretched film according to any one of claims 1 to 3, wherein the resin composition contains a thermoplastic amorphous resin.
  5.  熱可塑性非晶樹脂を、フィルムの質量に対して5質量%以上48質量%以下含有する請求項1~3のいずれかに記載の延伸フィルム。 The stretched film according to any one of claims 1 to 3, comprising a thermoplastic amorphous resin in an amount of 5% by mass to 48% by mass with respect to the mass of the film.
  6.  厚み方向の屈折率が1.575以上1.635以下である請求項1~3のいずれかに記載の延伸フィルム。 The stretched film according to any one of claims 1 to 3, wherein the refractive index in the thickness direction is from 1.575 to 1.635.
  7.  酸化防止剤を、フィルムの質量に対して0.1質量%以上5質量%以下含有する請求項1~3のいずれかに記載の延伸フィルム。 The stretched film according to any one of claims 1 to 3, comprising an antioxidant in an amount of 0.1% by mass to 5% by mass with respect to the mass of the film.
  8.  前記酸化防止剤の熱分解温度が250℃以上である請求項1~3のいずれかにに記載の延伸フィルム。 The stretched film according to any one of claims 1 to 3, wherein the thermal decomposition temperature of the antioxidant is 250 ° C or higher.
  9.  多孔質粒子もしくは多孔質シリカ粒子の圧縮率が20~90%の範囲にある請求項1~3のいずれかに記載の延伸フィルム。 The stretched film according to any one of claims 1 to 3, wherein the compressibility of the porous particles or the porous silica particles is in the range of 20 to 90%.
  10.  平均粒径が0.01μm以上0.5μm未満である粒子を、0.01質量%以上3質量%以下の範囲で含有する請求項1~3のいずれかに記載の延伸フィルム。 The stretched film according to any one of claims 1 to 3, comprising particles having an average particle diameter of 0.01 µm or more and less than 0.5 µm in a range of 0.01 mass% or more and 3 mass% or less.
  11.  フィルム中に含まれる最大長25μm以上の粗大凝集粒子の数が1m当たり10個以下である請求項1~3のいずれかに記載の延伸フィルム。 The stretched film according to any one of claims 1 to 3, wherein the number of coarse aggregated particles having a maximum length of 25 µm or more contained in the film is 10 or less per 1 m 2 .
  12.  フィルム中に含まれる該多孔質粒子もしくは多孔質シリカ粒子の周りに発生する下記式(1)で表わされるボイド比が50%以下である請求項1~3のいずれかに記載の延伸フィルム。
     ボイド率=((粒子周囲のボイド径-粒子径)/粒子周囲のボイド径)×100  ・・・(1)
    (1)ボイド率=((粒子周囲のボイド径-粒子径)/粒子周囲のボイド径)×100
    The stretched film according to any one of claims 1 to 3, wherein a void ratio represented by the following formula (1) generated around the porous particles or porous silica particles contained in the film is 50% or less.
    Void ratio = ((void diameter around particle−particle diameter) / void diameter around particle) × 100 (1)
    (1) Void ratio = ((void diameter around particles−particle diameter) / void diameter around particles) × 100
  13.  コンデンサに用いられる請求項1~3のいずれかに記載の延伸フィルム。 The stretched film according to any one of claims 1 to 3, which is used for a capacitor.
PCT/JP2015/068369 2014-06-27 2015-06-25 Stretched film WO2015199184A1 (en)

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JPH0939088A (en) * 1995-08-01 1997-02-10 Fuji Photo Film Co Ltd Manufacture of polystyrene film
JPH0939066A (en) * 1995-08-01 1997-02-10 Fuji Photo Film Co Ltd Manufacture of polystyrene film and unoriented film to be used therefor
JP2012246372A (en) * 2011-05-26 2012-12-13 Teijin Ltd High-insulating film
JP2013241626A (en) * 2013-08-30 2013-12-05 Teijin Ltd High-insulating film
JP2015048462A (en) * 2013-09-04 2015-03-16 帝人株式会社 Resin composition

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JPH0939088A (en) * 1995-08-01 1997-02-10 Fuji Photo Film Co Ltd Manufacture of polystyrene film
JPH0939066A (en) * 1995-08-01 1997-02-10 Fuji Photo Film Co Ltd Manufacture of polystyrene film and unoriented film to be used therefor
JP2012246372A (en) * 2011-05-26 2012-12-13 Teijin Ltd High-insulating film
JP2013241626A (en) * 2013-08-30 2013-12-05 Teijin Ltd High-insulating film
JP2015048462A (en) * 2013-09-04 2015-03-16 帝人株式会社 Resin composition

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