WO2015188554A1 - 一种电子束扩散截面修整装置及方法 - Google Patents

一种电子束扩散截面修整装置及方法 Download PDF

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Publication number
WO2015188554A1
WO2015188554A1 PCT/CN2014/088830 CN2014088830W WO2015188554A1 WO 2015188554 A1 WO2015188554 A1 WO 2015188554A1 CN 2014088830 W CN2014088830 W CN 2014088830W WO 2015188554 A1 WO2015188554 A1 WO 2015188554A1
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Prior art keywords
electron beam
permanent magnets
magnetic poles
yokes
group
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PCT/CN2014/088830
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English (en)
French (fr)
Inventor
黄江
樊明武
余调琴
张力戈
左晨
杨军
熊永前
刘开锋
吴接力
曹磊
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Huazhong University of Science and Technology
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Huazhong University of Science and Technology
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Priority to KR1020157037295A priority Critical patent/KR101681000B1/ko
Priority to JP2016526439A priority patent/JP6045756B2/ja
Priority to US14/895,708 priority patent/US9767985B2/en
Publication of WO2015188554A1 publication Critical patent/WO2015188554A1/zh
Anticipated expiration legal-status Critical
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/143—Permanent magnetic lenses
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/093—Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/12—Arrangements for controlling cross-section of ray or beam; Arrangements for correcting aberration of beam, e.g. due to lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/083—Beam forming
    • H01J2237/0835—Variable cross-section or shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/14—Lenses magnetic
    • H01J2237/1405—Constructional details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means

Definitions

  • the invention is applied to the technical field of electron beam radiation processing, and particularly relates to an electron beam diffusion section trimming device and method.
  • the interaction between nuclear radiation and matter causes the irradiated material to ionize or excite, release orbital electrons, form free radicals, change its physical properties or chemical composition, become a desired new substance, or make an organism (microorganism) Etc.)
  • the product is treated based on the radiation method to improve product performance, called radiation processing. Radiation processing is different from traditional machining or thermal processing. High-energy electrons or gamma rays have a strong penetrating ability. They can penetrate deep into the material and "process" at the molecular level. In fact, nano-processing technology.
  • the processor is a high-energy ray and the highly active intermediate it initiates, not the thermal motion of the molecule, and does not substantially produce a thermal effect. Therefore, radiation processing has low energy consumption, no residue, and less environmental pollution. Radiation processing is increasingly used in industry, agriculture, medicine, biology, and environmental protection.
  • a radioactive isotope such as a cobalt source
  • the other is a charged particle accelerator such as an electron accelerator.
  • the advantage of the electron accelerator is that the energy is controllable; the electron beam acts on the irradiated product, the utilization efficiency is high; there is no disposal problem of the radioactive waste source; the power is not consumed during the shutdown; the production process has little pollution except for a small amount of ozone. . Therefore, electron accelerators have a tendency to be adopted by more users in radiation processing.
  • the beam spot diameter is usually about 1 cm
  • the electron beam current is generally between 10 and 50 kW, and there is also a beam current of more than 100 kW.
  • the electron beam energy is concentrated in this small area. The range cannot be directly used for radiation processing products, and the concentrated energy is easy to cause product damage or uneven irradiation dose. Therefore, after the electron beam leaves the accelerator, it is irradiated Before the body, an electron beam dissipating device must be installed. At present, the scanning magnet method is adopted, and the magnet is powered by a sawtooth power source.
  • Fig. 1(a) is a structural diagram of an accelerator scanning magnet with a flow rate of 0.5 MeV and a flow of 50 mA
  • Fig. 1(b) is a schematic view of the scanning principle.
  • the electron beam scanning method has the following disadvantages: it not only consumes electric power, but also makes it difficult to uniformly irradiate a large-sized multi-component product.
  • the scanning process inevitably produces a retrace, and the transmission speed and the scanning frequency are improperly matched, which may cause the dose of the object to be received to be uneven.
  • Driving the electron beam is evenly scattered and irradiated onto the irradiated product, specifically, the first group of permanent magnets are used to uniformly spread the electron beams, and the second group of permanent magnets is used to shape the periphery of the scattered electron beams.
  • the program is applied to the actual situation, there are two problems:
  • the Applicant has found that the electron bunch formed by the above patent is uniformly distributed within a range of 1000 mm (length) * 400 mm (width). However, in the current practical application, all electron beams are scanned, and the longitudinal length of the scanned electron beam is generally about 10 mm. In order to broaden the electron beam and improve the irradiation quality, longitudinal scanning is added, but only the vertical scanning can be achieved.
  • the longitudinal dimension of the titanium window of the scanning box currently used is generally less than 100mm, but the above-mentioned patent "an electron beam diffusing device for radiation processing" corresponds to a longitudinal width of the scanning box of more than 400mm, if this solution is to be adopted, the beam The lower unit must undergo major equipment modifications, hindering its application in existing radiation processing production.
  • the electron bunches are required to be evenly distributed to avoid energy concentration and easy product damage or uneven irradiation dose.
  • the electron bunch of the above patent is distributed by the lateral defocusing of the magnetic field formed by the magnetic pole to be dispersed, and the uniformity of the magnetic field can ensure the uniformity of the electron bunch, but how to ensure The uniformity of the magnetic field is not described in the above patent.
  • the present invention provides an electron beam diffusing section trimming device, which aims to reasonably compress the longitudinal dimension of the diffused electron bunch to have a longitudinal dimension. Approaching 80mm, it not only ensures the uniformity of irradiation and the irradiation efficiency, but also maintains the limited range of the existing titanium window.
  • An electron beam diffusion cross-section dressing device comprises two sets of permanent magnets, wherein the first set of permanent magnets comprises four magnetic poles, and the four magnetic poles are fixed in pairs on the upper and lower yokes, and the opposite polarities of opposite magnetic poles are opposite.
  • the magnetic field formed by the four magnetic poles stretches and laterally compresses the electron beam, so that the electron beam diffuses into an approximately elliptical shape;
  • the second group of permanent magnets includes eight magnetic poles, and the eight magnetic poles are fixed in pairs in the upper, lower, and left directions.
  • the opposite magnetic poles are opposite in polarity, and the magnetic fields formed by the eight magnetic poles trim the edges of the scattered electron bunches to form an approximately rectangular shape;
  • the utility model further comprises four longitudinal positioning connection mechanisms, wherein the upper ends of the upper and lower yokes of the first group of permanent magnets are respectively mounted on the left and right yokes by a longitudinal alignment connection mechanism, and the upper and lower magnetic fields of the second group of permanent magnets are respectively The two ends of the yoke are respectively mounted on the left and right yokes by a longitudinal alignment connection mechanism, and the upper and lower yokes of the first group of permanent magnets are synchronously moved toward the center between them by operating the four longitudinal alignment connection mechanisms.
  • a support pad placed between adjacent magnetic poles of the same side yoke is further included for preventing two adjacent magnetic poles from attracting each other due to opposite polarities, thereby causing the magnetic pole to be offset toward the middle.
  • the surface of the yoke is processed with a mounting groove having an interference fit with the size of the magnetic pole surface for placing the magnetic pole, which is initially fixed by the suction force of the magnetic pole itself, and is fixed by the aluminum alloy fixing frame. Further tightening.
  • a spacer placed between the mounting groove and the magnetic pole is further included.
  • the longitudinal alignment connection mechanism is implemented by: providing upper and lower strip-shaped through holes on the left or right yoke for placing the ends of the upper and lower yokes, and fixing the yoke by screws Inside the through hole, a mark is marked on the wall of the through hole to determine the position of the upper and lower yokes by the vernier caliper.
  • the invention also provides an electron beam diffusion cross-section dressing method, the purpose of which is to reasonably compress the longitudinal dimension of the diffused electron bunches so that the longitudinal dimension thereof approaches 80 mm, thereby ensuring the irradiation uniformity and the irradiation efficiency. Excellent, and maintained within the limited range of the existing titanium window.
  • An electron beam diffusion cross-section trimming method based on an electron beam diffusing device comprising two sets of permanent magnets, the first set of permanent magnets comprising four magnetic poles, the four magnetic poles being fixed in pairs in upper and lower magnetic fields On the yoke, the opposite magnetic poles are opposite in polarity, and the magnetic fields formed by the four magnetic poles stretch and transversely compress the electron beam in the longitudinal direction, so that the electron beam is diffused into an approximately elliptical shape;
  • the second group of permanent magnets includes eight magnetic poles. The eight magnetic poles are fixed in pairs on the upper, lower, left and right yokes, and opposite poles of opposite magnetic poles, the magnetic fields formed by the eight magnetic poles are trimmed to form an approximately rectangular shape of the edges of the scattered electron bunches;
  • the method is specifically:
  • the invention adopts two sets of permanent magnets to uniformly disperse, shape and longitudinally compress the electron beam, so that the longitudinal dimension of the electron beam approaches 80 mm, on the one hand, the irradiation uniformity and the irradiation efficiency are optimized, and on the other hand, the existing drawing box is maintained.
  • the existing general-purpose electron beam scanning equipment is directly replaced, and the electron beam processing equipment is upgraded without changing the structure of the device under the existing irradiation accelerator.
  • the whole device has no power consumption, has simple structure, low cost, convenient installation and good practicability.
  • the use of the passive electron beam diffusion device of the present invention replaces the widely used electron beam scanning device, not only does not need to scan the power supply completely, saves electric energy, and eliminates the additional cost and low operating efficiency brought by the failure of the power supply device, and improves the titanium film.
  • the chance of damage essentially eliminates electron beam retracement and guarantees the quality of the electron beam processing products.
  • FIG. 1 is a schematic view of a scanning magnet
  • FIG. 1(a) is a structural view of a scanning magnet
  • FIG. 1(b) is a schematic diagram of a scanning magnet.
  • Figure 2 is an overall structural view of the present invention
  • Figure 2(a) is a front view
  • Figure 2(b) is a side view.
  • FIG. 3 is a partial structural view of the present invention
  • FIG. 3(a) is a front view of the first group of permanent magnets
  • FIG. 3(b) is a side view of the first group of permanent magnets
  • FIG. 3(c) is a second group of permanent magnets
  • Fig. 3(d) is a side view of the second group of permanent magnets.
  • FIG. 4 is a schematic view showing the assembly structure of the magnetic pole yoke of the present invention.
  • Figure 5 is a schematic view of the longitudinal alignment connection structure of the present invention.
  • Figure 6 is a schematic view showing the adjustment of the distance between two sets of magnets of the present invention.
  • Fig. 7 is a schematic view showing the actual installation structure of the accelerator of the present invention
  • Fig. 7(a) is a front view
  • Fig. 7(b) is a side view.
  • FIG. 8 is a schematic view showing the distribution of electrons on a radiation object after being diffused by a permanent magnet when applied to a 0.5 MeV accelerator.
  • Figure 9 is a schematic view showing the distribution of electrons on a radiating object after being diffused by a permanent magnet when applied to a 0.3 MeV accelerator.
  • the present invention has been made in the prior art electron beam diffusing apparatus for radiation processing to achieve the technical object of the present invention.
  • the existing electron beam diffusing device for radiation processing comprises two sets of permanent magnets, and the first set of permanent magnets I comprises four magnetic poles 15, 16, 17, 18 fixed in pairs in the upper and lower magnetic fields.
  • the yokes 12, 14 are opposite in polarity to the adjacent magnetic poles.
  • the magnets of the group are used to stretch the electron beam in the longitudinal direction and compress laterally so that the electron beam is diffused into an approximately elliptical shape;
  • the second group of permanent magnets II includes eight The magnetic poles 25 to 32, the eight magnetic poles are fixed in pairs on the upper, lower, left and right yokes, and the opposite magnetic poles are opposite in polarity.
  • the magnetic fields formed by the eight magnetic poles trim the edges of the scattered electron bunches. , forming an approximate rectangle.
  • the electron beam group obtained by the above-mentioned conventional electron beam diffusing device has a longitudinal width corresponding to a scanning box of more than 400 mm, which cannot be adapted to the longitudinal dimension within 100 mm of the currently used titanium window of the scanning box. Therefore, it is necessary to compress the longitudinal dimension of the electron bunch.
  • the scanning magnets currently used are limited by the scanning power supply, and can only sweep the vertical dimension to 35mm. If it is large, it will have a great influence on the scanning uniformity. Therefore, in specific applications, it should be improved as much as possible.
  • the final irradiation width is provided by the scanning power supply, and can only sweep the vertical dimension to 35mm. If it is large, it will have a great influence on the scanning uniformity. Therefore, in specific applications, it should be improved as much as possible.
  • the lock compresses the longitudinal dimension of the electron bunch to 80mm, which maximizes the use of the titanium window area and does not require modification of existing accelerator equipment, while uniform irradiation Degree and irradiation efficiency are optimal.
  • the present invention utilizes a first set of permanent magnets to evenly spread the electron beam and perform the first longitudinal compression of the bunch; the second set of permanent magnets is used to spread the electron beam
  • the periphery is shaped and further a second longitudinal compression bunch approaching to 80 mm. Referring to Figures 2 to 3, the specific implementation is as follows:
  • the upper and lower yokes 12, 14 of the first group of permanent magnets I are respectively attached to the left and right yokes 11, 13 by longitudinal alignment connection mechanisms, and the upper, lower, left and right yokes 11 to 14 are enclosed.
  • the upper and lower yokes 22, 24 of the second group of permanent magnets II are respectively mounted on the left and right yokes 21, 23 by longitudinal alignment connection mechanisms, and the upper, lower, left and right yokes 21 to 24 are enclosed.
  • the elliptical edge is trimmed by the magnetic field formed by the second set of permanent magnets to form an approximately rectangular shape.
  • the connecting mechanism is then operated such that the upper and lower yokes are closely adjacent to the center of the rectangle, reducing the spacing between the upper and lower magnetic poles, achieving a second longitudinal compression of the bunch.
  • the first set of permanent magnets cooperate with the second set of permanent magnets, repeatedly adjusted, and cooperate until the longitudinal compression of the bunch is approximated to 80 mm.
  • the invention combines the first group of permanent magnets and the second group of permanent magnets as a supplement, and cooperates to complete longitudinal compression. This is because when the electron bunch passes through the first group of permanent magnets, it is compressed in the longitudinal direction, similar to the principle of the convex lens. When the electron bunch propagates to the second set of permanent magnets, its direction and velocity of movement cause it to be less affected by the second set of permanent magnets.
  • the magnetic pole installation and adjustment of the device of the present invention is as shown in FIG. 4. Due to the magnetic pole machining and magnetization error, including the yoke processing process and the installation error, the end faces of the two magnetic poles on the same side close to the center are not on the same horizontal surface, resulting in permanent magnet generation. The magnetic field is unevenly distributed in the center, resulting in uneven diffusion of the electron bunch, and the final diffusion cross section does not achieve the undesirable results of the design.
  • the invention is arranged on the yoke and the mounting groove of the magnetic pole surface has an interference fit, and the magnetic pole is placed in the mounting groove, and the magnetic pole itself is preliminarily fixed by the suction force of the magnetic yoke, and the aluminum alloy fixing frame 35 is adopted. It is further fastened, and the aluminum alloy holder 35 is fixed to the yoke by fastening screws 37.
  • the invention also places an iron supporting pad 36 between adjacent magnetic poles on the same yoke side, preventing the two adjacent magnetic poles from attracting each other due to opposite polarities, thereby causing the problem that the magnetic poles are offset toward the middle.
  • the technical effect of ensuring a consistent magnetic field alignment Since the magnetic force between the magnets is large, an iron support pad 36 is placed in the middle of the aluminum alloy holder outside the magnetic pole to ensure that the magnetic pole does not deflect by the suction force.
  • soft iron spacers 38 of different thicknesses such as 1 mm, 2 mm, and 5 mm are added to the square grooves, and the material thereof is the same as that of the yoke. Since the magnet and the yoke itself have a large suction force, in order to facilitate the removal of the magnet, it is necessary to machine a threaded through hole at the bottom of the square groove.
  • Fig. 5 shows an implementation of the longitudinal alignment connection mechanism of the two sets of permanent magnets: the upper and lower yokes serve as adjustment yokes, and the left and right yokes serve as fixed yokes.
  • a square-shaped through hole is formed on the fixed yoke, and both sides of the adjusting yoke can be placed therein, and the relative positions of the two yokes can be fixed by screws, the screws are loosened during adjustment, and the adjusting yoke is moved to a specified position.
  • the relative position is determined by the vernier caliper.
  • the accuracy of this adjustment method can reach 0.1mm, and the adjustment range on both sides is 30mm.
  • the four corner points of the first group of magnets of the present invention and the four corner points of the second group of magnets are connected one by one through the sliding rods 39.
  • the specific implementation manner is as follows: 41 is a fixed seat, which is fixed at The second set of magnets is connected to the first set of magnets via a slide bar 39, and the bearing 40 functions as a positioning after the first set of magnets are moved.
  • the octapole iron platform In use, the octapole iron platform is in a fixed state, the quadrupole iron platform is moved parallel thereto by four linear sliding rods 39, and the four sliding rods 39 are fixed on the octapole iron through the four fixing seats 41, and the second group of permanent magnets
  • Four bearings 40 are mounted on the four corners.
  • the bearing sleeve is connected to the sliding rod and can move up and down freely.
  • the threaded rod is fixed by a double nut locking mechanism 43 to lock the distance between the two sets of magnets.
  • This adjustment method can achieve an accuracy of 0.1mm and an adjustment range of 50mm. It has very good adjustment precision and achieves the technical effect of making the electron bunch diffusion uniform.
  • Fig. 7 is a structural view showing the mounting of the Aibang irradiation accelerator according to the present invention.
  • the present invention can directly replace the scanning magnet at the scanning chamber position of the accelerator.
  • the invention is also positioned by a set of brackets 44 beneath the longitudinal compression device.
  • the lower part of the bracket is fastened and screwed to the screw of the scan box 45, and the upper surface is also tightly connected with the magnet to play the role of the center of the magnet and the center of the scan box, and has the technical effect of good adjustment precision and good stability.
  • the effect of the present invention will be specifically described by taking the application effect of the present invention on a 0.3 MeV, 0.5 MeV irradiation accelerator as an example.
  • the electron beam of the 0.5MeV accelerator is 15mm in diameter when the invention is passed, and the electron beam passes through the conventional scanning magnet, including lateral and longitudinal scanning, and the size of the electron beam after scanning at the titanium film is 650 mm (length) * 35 mm ( width).
  • the size of the electron beam diffused at the titanium window can reach 780 mm (length) * 80 mm (width), compared to the original scanning mode.
  • the width and length of the irradiation are greatly improved.
  • FIG. 8 and FIG. 9 are respectively schematic diagrams showing the distribution of electrons on a radiating object after being diffused by a permanent magnet when applied to a 0.5 MeV, 0.3 MeV accelerator. It can be seen that the present invention can be well adapted to different energies by fine adjustment.
  • the accelerator diffuses the electron bunch into a range of 800 mm (length) * 80 mm (width).

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Abstract

一种电子束扩散截面修整装置及方法，装置包括两组永磁铁，第一组永磁铁（I）构成的磁场将电子束扩散为近似椭圆形；第二组永磁铁(II)构成的磁场对电子束团边缘进行修整形成近似矩形；通过操作四个纵向调位连接机构，使得第一组永磁铁（I）的上、下磁轭（12、14）朝向它们之间的中心同步移动，对近似椭圆形的电子束进行首次纵向压缩，以及使得第二组永磁铁（II）的上、下磁轭(22、24)朝向它们之间的中心同步移动，对近似矩形的电子束再次纵向压缩，直到电子束团纵向尺寸被压缩逼近至80mm。该装置及方法对扩散后的电子束团纵向尺寸进行合理压缩，既保证辐照均匀度及辐照效率最优，又维持现有描盒钛窗的限定范围内。

Description

一种电子束扩散截面修整装置及方法 【技术领域】
本发明应用于电子束辐射加工技术领域，具体涉及一种电子束扩散截面修整装置及方法。
【背景技术】
利用核辐射与物质相互作用，被照射物质产生电离或激发，释放出轨道电子，形成自由基，使它的物理性能或化学组成发生改变，变成所期望的新物质，或使生物体(微生物等)受到不可恢复的损失或破坏，达到辐照灭菌的目的。基于辐射方法对产品进行处理，改善产品性能，称为辐射加工。辐射加工不同于传统的机械加工或热加工，高能电子或γ射线具有很强的穿透能力，可深入到物质内部，在分子的层面上进行“加工”，实际上是纳米加工技术。加工者是高能射线以及它引发的高度活性的中间物，不是分子的热运动，基本不产生热效应。因此，辐射加工能耗低、无残留物、少环境污染问题，辐射加工在工业、农业、医学、生物、环保中得到越来越多的应用。
目前用于辐射加工的辐射源有两类，一类是放射性同位素如钴源，另一类是带电粒子加速器如电子加速器。电子加速器的优点是能量可控；电子束基本作用于被照射产品，利用效率高；没有放射性废源的处理问题；停机时不消耗电力；整个生产过程中除产生少量臭氧外，几乎不污染环境。因此电子加速器在辐射加工中有更多用户采用的趋势。
从电子辐照加速器加速后电子束束斑直径通常在1cm左右，电子束流功率大体在10-50千瓦之间，也有超过100千瓦的电子束流，电子束能量集中在这一不大的面积范围，不能直接用于辐射加工产品，集中的能量易造成产品损伤或照射剂量不均匀。因此，电子束离开加速器后，在辐射到物 体之前，必须安装一个电子束散开装置。目前都采用扫描磁铁方法，磁铁由一锯齿波电源供电，类似于电视机中的行扫描把电子束在横向扫开，束下装置带动被照射物体在纵向匀速通过电子束，相当电视机中的帧扫描作用，尽可能使被辐照物体接受到均匀的剂量，基本解决了上述矛盾。图1(a)为0.5MeV能量、50mA流强的加速器扫描磁铁结构图,图1(b)为扫描原理示意图。
但是电子束扫描方式存在如下缺点：它不仅要消耗电能，也难以使大尺寸异构件产品受到均匀辐照。此外，扫描过程不可避免产生回扫，加上传动速度与扫描频率配合不当，有可能造成被照物体接受剂量的不均匀。
申请人之前申请的中国专利“一种用于辐射加工的电子束扩散装置”，授权号：ZL 201010532758.1，从理论上提出了解决电子束扫描方式存在问题的技术方案，其关注于不需要使用电力驱动，使电子束均匀散开照射到被辐照的产品上，具体是利用第一组永磁铁作用是将电子束均匀散开，第二组永磁铁是把散开的电子束的周边进行整形来实现的，但将该方案应用于实际时还存在以下两个问题：
(1)申请人发现上述专利形成的电子束团均匀分布在1000mm(长)*400mm(宽)的范围内。但在目前实际应用中，所有的电子束都采用扫描方式，扫描后的电子束纵向尺寸一般都在10mm左右，为了使电子束展宽，提高辐照质量，附加了纵向扫描，但也只能达到30mm，因此目前使用的扫描盒钛窗的纵向尺寸一般在100mm以内，但上述专利“一种用于辐射加工的电子束扩散装置”对应的扫描盒纵向宽度大于400mm，如果要采用该方案，束下装置必须进行大的设备改造，阻碍了其在现有的辐射加工生产中推广应用。
(2)电子束团要求均匀分布，以避免能量集中易造成产品损伤或照射剂量不均匀。上述专利的电子束团通过磁极构成的磁场横向散焦纵向聚焦从而散开，只有保证磁场的均匀性才能保证电子束团的均匀性，但如何保 证磁场的均匀性并没有在上述专利中有所记载。
【发明内容】
为了克服现有用于辐射加工的电子束扩散装置的缺陷，本发明提供了一种电子束扩散截面修整装置，其目的在于，对扩散后的电子束团的纵向尺寸进行合理压缩，使其纵向尺寸逼近80mm，既保证辐照均匀度及辐照效率最优，又维持在现有描盒钛窗的限定范围内。
一种电子束扩散截面修整装置，包括包含两组永磁铁,第一组永磁铁包含四个磁极，该四个磁极成对固定在上、下磁轭上，相对及相邻磁极极性相反，这四个磁极构成的磁场将电子束在纵向拉伸、横向压缩，使得电子束扩散为近似椭圆形；第二组永磁铁包含有八个磁极，八个磁极成对固定在上、下、左、右磁轭上，相对及相邻磁极极性相反，这八个磁极构成的磁场对散开的电子束团边缘进行修整形成近似矩形；
还包括四个纵向调位连接机构，第一组永磁铁的上、下磁轭两端分别通过一个纵向调位连接机构安装于左、右磁轭上，第二组永磁铁的上、下磁轭两端分别通过一个纵向调位连接机构安装于左、右磁轭上，通过操作四个纵向调位连接机构，使得第一组永磁铁的上、下磁轭朝向它们之间的中心同步移动，对近似椭圆形的电子束进行首次纵向压缩，以及使得第二组永磁铁的上、下磁轭朝向它们之间的中心同步移动，对近似矩形的电子束再次纵向压缩，反复首次纵向压缩操作直到电子束团纵向尺寸被压缩逼近至80mm。
进一步地，还包括放置在同侧磁轭相邻磁极间的支撑垫块，用于防止两相邻磁极由于极性相反相互吸引，导致磁极向中间偏移角度。
进一步地，还包括：
用于将第一组永磁铁的四磁轭连接形成的四个角点和第二组永磁铁的四磁轭连接形成的四个角点一一对应连接的四根螺杆，其中一组永磁体相对螺杆固定，另一组永磁铁可沿螺杆上下移动，以此调整一组永磁铁与第 二组永磁铁之间间距；以及用于固定第一组永磁铁与第二组永磁铁之间间距的双螺母锁紧机构。
进一步地，所述磁轭表面加工有与磁极端面尺寸过盈配合的安装槽，用于放置磁极，通过磁极本身对磁轭的吸力对其初步固定，并通过铝合金固定架的方式将其进一步紧固。
进一步地，还包括放置于安装槽与磁极之间的垫片。
进一步地，所述纵向调位连接机构的实现方式为：在左或右磁轭上开设有上、下条状通孔，用于放置上、下磁轭的端部，通过螺钉固定磁轭于通孔内，通孔壁上标有刻度以通过游标卡尺确定上、下磁轭位置。
本发明还提供了一种电子束扩散截面修整方法，其目的在于，对扩散后的电子束团的纵向尺寸进行合理压缩，使其纵向尺寸逼近80mm，既保证辐照均匀度及辐照效率最优，又维持在现有描盒钛窗的限定范围内。
一种基于电子束扩散装置的电子束扩散截面修整方法，所述电子束扩散装置包括包含两组永磁铁,第一组永磁铁包含四个磁极，该四个磁极成对固定在上、下磁轭上，相对及相邻磁极极性相反，这四个磁极构成的磁场将电子束在纵向拉伸、横向压缩，使得电子束扩散为近似椭圆形；第二组永磁铁包含有八个磁极，八个磁极成对固定在上、下、左、右磁轭上，相对及相邻磁极极性相反，这八个磁极构成的磁场对散开的电子束团边缘进行修整形成近似矩形；
该方法具体为：
驱使第一组永磁铁的上、下磁轭朝向它们之间的中心同步移动，对近似椭圆形的电子束进行首次纵向压缩；驱使第二组永磁铁的上、下磁轭朝向它们之间的中心同步移动，对近似矩形的电子束再次纵向压缩；反复首次纵向压缩和再次纵向压缩操作，直到电子束团纵向尺寸被压缩逼近至80mm。
本发明的技术效果体现在：
本发明采用两组永磁铁对电子束均匀散开、整形并纵向压缩，使电子束纵向尺寸逼近80mm，一方面保证辐照均匀度及辐照效率最优，另一方面维持在现有描盒钛窗的限定范围内，不改变现有辐照加速器束下装置结构的情况下，直接取代现有通用的电子束扫描设备，使电子束加工装备升级换代。整个装置没有电能消耗，结构简单、造价低，安装方便，实用性好。
应用本发明非能动电子束扩散设备替代目前广泛采用的电子束扫描装置，不仅完全不用扫描电源，节约电能，而且排除了电源设备故障带来的附加成本以及低的运行效率，同时改善了钛膜受损的几率，根本上消除了电子束回扫，保证了电子束加工产品的质量。
【附图说明】
图1为扫描磁铁示意图，图1(a)为扫描磁铁结构图，图1(b)为扫描磁铁原理示意图。
图2为本发明整体结构图，图2(a)为正视图，图2(b)为侧视图。
图3为本发明分体结构图，图3(a)为第一组永磁铁正视图，图3(b)为第一组永磁铁侧视图，图3(c)为第二组永磁铁正视图，图3(d)为第二组永磁铁侧视图。
图4为本发明磁极磁轭装配结构示意图。
图5为本发明纵向调位连接结构示意图。
图6为本发明两组磁铁间距调整示意图。
图7为本发明加速器实际安装结构示意图，图7(a)为主视图，图7(b)为侧视图。
图8为本发明应用到0.5MeV加速器时，电子通过永磁铁扩散后，在辐射物体上的分布示意图。
图9为本发明应用到0.3MeV加速器时，电子通过永磁铁扩散后，在辐射物体上的分布示意图。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本发明进行进一步详细说明。应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。此外，下面所描述的本发明各个实施方式中所涉及到的技术特征只要彼此之间未构成冲突就可以相互组合。
本发明是在现有的用于辐射加工的电子束扩散装置进行了改进以实现本发明技术目的。现有的用于辐射加工的电子束扩散装置包括包含两组永磁铁,第一组永磁铁I包含有四个磁极15，16，17，18，该四个磁极成对固定在上、下磁轭12，14上，相对及相邻磁极极性相反，本组磁铁的作用是将电子束在纵向拉伸，横向压缩，使得电子束扩散为近似椭圆形；第二组永磁铁II包含有八个磁极25～32，八个磁极成对固定在上、下、左、右磁轭上，相对及相邻磁极极性相反，这八个磁极构成的磁场对散开的电子束团边缘进行修整，形成近似矩形。
如本发明说明书背景技术部分所述，上述现有电子束扩散装置得到的电子束团对应的扫描盒纵向宽度大于400mm，不能适应目前使用的扫描盒钛窗的100mm以内纵向尺寸。因此，需要对电子束团的纵向尺寸进行压缩。但另一方面，目前使用的扫描磁铁由于受扫描电源限制，最大只能将纵向尺寸扫到35mm，再大的话就会对扫描均匀度产生很大的影响，所以在具体应用中，应尽量提升最终的辐照宽度。综合考虑现有扫描盒尺寸和钛膜结构因素，锁定将电子束团的纵向尺寸压缩到80mm，这样可以最大化的利用钛窗面积，并且不需要对现有加速器设备进行改动，同时辐照均匀度及辐照效率最优。
为了实现对电子束团的纵向尺寸进行压缩，本发明利用第一组永磁铁将电子束均匀散开，并进行束团第一次的纵向压缩；利用第二组永磁铁将散开的电子束的周边进行整形，并进一步的第二次纵向压缩束团逼近至80mm。请参见图2～3，具体实现方式如下：
第一组永磁铁I的上、下磁轭12，14两端分别通过纵向调位连接机构安装于左、右磁轭11，13上，上、下、左、右磁轭11～14围成一矩形。首先利用第一组永磁铁将电子束均匀散开，然后操作该连接机构，使得上、下磁轭同步长地向矩形中心靠近，减小了上下磁极之间的间距，在纵向减小了磁场大小，从而实现对束团第一次纵向压缩。
第二组永磁铁II的上、下磁轭22，24两端分别通过纵向调位连接机构安装于左、右磁轭21，23上，上、下、左、右磁轭21～24围成一矩形。首先利用第二组永磁铁本组磁铁形成的磁场对椭圆形的边缘进行修整，形成近似矩形。然后操作该连接机构，使得上、下磁轭同步长地向矩形中心靠近，减小了上下磁极之间的间距，实现对束团第二次纵向压缩。
本发明中第一组永磁铁与第二组永磁铁配合，反复调节，协作直到将束团纵向压缩逼近至80mm为止。本发明以第一组永磁铁为主、第二组永磁铁为辅，协作完成纵向压缩，这是因为当电子束团通过第一组永磁铁时，会在纵向被压缩，与凸透镜原理类似，当电子束团扩散到第二组永磁铁时，其运动方向及速度使得其受第二组永磁铁影响较小。
上、下磁轭向矩形中心靠近时需要同步长移动，以保证电子束团时刻处于压缩装置中心，保证最终扩散的束团达到均匀扩散的效果。
本发明装置的磁极安装与调节如图4所示，由于存在磁极加工、充磁误差，包括磁轭加工工艺和安装误差，同一侧的两磁极靠近中心的端面不在同一水平面上，导致永磁铁产生的磁场在其中心分布不均匀，从而导致电子束团扩散不均匀，最终扩散截面达不到设计要求的不良结果。本发明在磁轭上加工和磁极端面尺寸过盈配合的安装槽，将磁极放置入安装槽内，通过磁极本身对磁轭的吸力将其初步固定，并通过铝合金固定架35的方式将其进一步紧固，铝合金固定架35通过紧固螺钉37固定于磁轭上。
本发明还在同一磁轭侧的相邻磁极间放置铁质的支撑垫块36，防止两相邻磁极由于极性相反相互吸引，导致磁极向中间偏移角度的问题，起到 保证磁场一致对中的技术效果。由于磁铁间的磁力很大，在磁极外部的铝合金固定架中间放置铁质的支撑垫块36，保证磁极不会因吸力而偏转角度。
为了能调节磁铁在垂直磁轭方向上的位置，在方槽内加入1mm、2mm、5mm等不同厚度的软铁垫片38，其材质与磁轭相同。由于磁铁和磁轭本身吸力也很大，为了方便磁铁的取出，需要在方槽底部加工螺纹通孔。
图5所示为两组永磁铁的纵向调位连接机构的实现方式为：上、下磁轭作为调节磁轭，左、右磁轭作为固定磁轭。在固定磁轭上加工方条状的通孔，调节磁轭的两侧可以放入其中，通过螺钉可以固定两个磁轭的相对位置，调节时松开螺钉，移动调节磁轭到指定位置。通过游标卡尺确定相对位置，这种调节方式的精度可以达到0.1mm，两边调节范围有30mm。
如图6所示，本发明第一组磁铁的四个角点与第二组磁铁的四个角点通过滑杆39一一对应相接，具体实现方式为：41为固定座，其固定在第二组磁铁上，并通过滑杆39与第一组磁铁进行连接，轴承40起到第一组磁铁移动后的定位作用。
使用时，八极铁平台处于固定状态，四极铁平台通过四根直线滑杆39实现与其平行移动，四根滑杆39通过四个固定座41固定在八极铁上，第二组永磁铁的四个角上安装四个轴承40，轴承套接在滑杆上并可上下自由移动，八极铁平台两侧有两根螺纹杆42，将第一组永磁铁和第二组永磁铁连接，螺纹杆通过双螺母锁紧机构43固定，以锁定两组磁铁之间的距离。这种调节方式的精度可以达到0.1mm，调节范围有50mm。具有非常好的调节精度，达到使得电子束团扩散均匀的技术效果。
图7为本发明在爱邦辐照加速器安装结构图，本发明可以直接放置于加速器的扫描室位置对扫描磁铁进行替换。本发明还在纵向压缩装置下方通过一组支架44进行定位。支架下部与扫描盒45的螺钉紧固连接，上表面同样和磁铁紧固连接，以起到磁铁的中心与扫描盒的中心重合的作用，具有调节精度好、稳定度好的技术效果。
以本发明在0.3MeV，0.5MeV辐照加速器上的应用效果为例，来具体说明本发明的作用。0.5MeV加速器电子束团经过本发明时的束团直径为15mm，电子束通过传统扫描磁铁后，包括横向和纵向扫描，钛膜处电子束团扫描后的尺寸为：650mm(长)*35mm(宽)。而该电子束通过具有非能动截面纵向压缩功能的电子束扩散装置后，电子束的扩散在钛窗处的尺寸可以达到780mm(长)*80mm(宽)，相比于原有的扫描方式，大大提高了辐照的宽度及长度。
图8图9分别是为本发明应用到0.5MeV、0.3MeV加速器时，电子通过永磁铁扩散后，在辐射物体上的分布示意图，可以看出，本发明通过微调，可以很好的适应不同能量的加速器，使电子束团扩散到800mm(长)*80mm(宽)范围内。
本领域的技术人员容易理解，以上所述仅为本发明的较佳实施例而已，并不用以限制本发明，凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等，均应包含在本发明的保护范围之内。

Claims (7)

  1. 一种电子束扩散截面修整装置，包括包含两组永磁铁,第一组永磁铁包含四个磁极，该四个磁极成对固定在上、下磁轭上，相对及相邻磁极极性相反，这四个磁极构成的磁场将电子束在纵向拉伸、横向压缩，使得电子束扩散为近似椭圆形；第二组永磁铁包含有八个磁极，八个磁极成对固定在上、下、左、右磁轭上，相对及相邻磁极极性相反，这八个磁极构成的磁场对散开的电子束团边缘进行修整形成近似矩形；
    其特征在于，还包括四个纵向调位连接机构，第一组永磁铁的上、下磁轭两端分别通过一个纵向调位连接机构安装于左、右磁轭上，第二组永磁铁的上、下磁轭两端分别通过一个纵向调位连接机构安装于左、右磁轭上，通过操作四个纵向调位连接机构，使得第一组永磁铁的上、下磁轭朝向它们之间的中心同步移动，对近似椭圆形的电子束进行首次纵向压缩，以及使得第二组永磁铁的上、下磁轭朝向它们之间的中心同步移动，对近似矩形的电子束再次纵向压缩，反复纵向压缩操作直到电子束团纵向尺寸被压缩逼近至80mm。
  2. 根据权利要求1所述的一种电子束扩散截面修整装置，其特征在于，还包括放置在同侧磁轭相邻磁极间的支撑垫块，用于防止两相邻磁极由于极性相反相互吸引，导致磁极向中间偏移角度。
  3. 根据权利要求1所述的一种电子束扩散截面修整装置，其特征在于，还包括：
    用于将第一组永磁铁的四磁轭连接形成的四个角点和第二组永磁铁的四磁轭连接形成的四个角点一一对应连接的四根滑杆，其中一组永磁体相对滑杆固定，另一组永磁铁可沿滑杆上下移动，以此调整一组永磁铁与第二组永磁铁之间间距；以及
    用于固定第一组永磁铁与第二组永磁铁之间间距的双螺母螺杆锁紧机 构。
  4. 根据权利要求1或2或3所述的一种电子束扩散截面修整装置，其特征在于，所述磁轭表面加工有与磁极端面尺寸过盈配合的安装槽，用于放置磁极，通过磁极本身对磁轭的吸力对其初步固定，并通过铝合金固定架的方式将其进一步紧固。
  5. 根据权利要求4所述的一种电子束扩散截面修整装置，其特征在于，还包括放置于安装槽与磁极之间的垫片。
  6. 根据权利要求1或2或3所述的一种电子束扩散截面修整装置，其特征在于，所述纵向调位连接机构的实现方式为：在左或右磁轭上开设有上、下条状通孔，用于放置上、下磁轭的端部，通过螺钉固定磁轭于通孔内，通孔壁上标有刻度以通过游标卡尺确定上、下磁轭位置。
  7. 一种基于电子束扩散装置的电子束扩散截面修整方法，所述电子束扩散装置包括包含两组永磁铁,第一组永磁铁包含四个磁极，该四个磁极成对固定在上、下磁轭上，相对及相邻磁极极性相反，这四个磁极构成的磁场将电子束在纵向拉伸、横向压缩，使得电子束扩散为近似椭圆形；第二组永磁铁包含有八个磁极，八个磁极成对固定在上、下、左、右磁轭上，相对及相邻磁极极性相反，这八个磁极构成的磁场对散开的电子束团边缘进行修整形成近似矩形；
    其特征在于，该方法具体为：
    驱使第一组永磁铁的上、下磁轭朝向它们之间的中心同步移动，对近似椭圆形的电子束进行首次纵向压缩；驱使第二组永磁铁的上、下磁轭朝向它们之间的中心同步移动，对近似矩形的电子束再次纵向压缩；反复首次纵向压缩和再次纵向压缩操作，直到电子束团纵向尺寸被压缩逼近至80mm。
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