WO2015143907A1 - Method for preparing high thermal conductive graphite film-copper composite material - Google Patents

Method for preparing high thermal conductive graphite film-copper composite material Download PDF

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WO2015143907A1
WO2015143907A1 PCT/CN2014/095456 CN2014095456W WO2015143907A1 WO 2015143907 A1 WO2015143907 A1 WO 2015143907A1 CN 2014095456 W CN2014095456 W CN 2014095456W WO 2015143907 A1 WO2015143907 A1 WO 2015143907A1
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film
graphite film
furnace
copper
copper composite
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PCT/CN2014/095456
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French (fr)
Chinese (zh)
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赖优萍
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苏州格优碳素新材料有限公司
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Publication of WO2015143907A1 publication Critical patent/WO2015143907A1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/343Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one DLC or an amorphous carbon based layer, the layer being doped or not
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only

Definitions

  • the invention particularly relates to a method for preparing a highly thermally conductive graphite film-copper composite.
  • the traditional heat dissipating material is a high thermal conductivity metal such as copper, silver or aluminum.
  • the product needs cannot be met, and the natural graphite film has higher thermal conductivity and lower density. , good material stability, so gradually in the electronics industry is widely used.
  • the natural graphite film is made of natural flake graphite or coal tar pitch. After acidifying the raw material, the natural graphite layer is expanded by heating to obtain a worm-like structure, and then calendered under high temperature and high pressure conditions with the bonding material to obtain a film-like graphite sheet.
  • the thermal conductivity of natural graphite film generally does not exceed 400W/(m•K), and there are disadvantages such as easy powder drop, so it is increasingly unable to meet the heat dissipation requirements of current portable digital products.
  • the patent application No. 201210227634.8 discloses a method for manufacturing a highly thermally conductive graphite film, which uses the most raw material of polyimide film, and is carbonized and graphite. The two processes are as follows: a.
  • a polyimide film as a raw material, adding graphite paper between each layer of polyimide film; b, a polyimide layer separated by graphite paper at intervals
  • the amine film is placed in a carbonization furnace and carbonized in a nitrogen or argon atmosphere at a carbonization temperature of 100 ° C to 1400 ° C for a period of time ranging from 1 hour to 6 hours; c, graphitization after carbonization, and graphitization in a nitrogen or argon atmosphere In the middle, the temperature is controlled at about 2500 ° C -3000 ° C, controlled within 12 hours.
  • the graphite film is a layered crystal material, and the planar thermal conductivity of the synthetic graphite film can reach 1400-1800 W/(m•K). However, its axial thermal conductivity is only 5-10 W/(m•K).
  • the technical problem to be solved by the present invention is to overcome the deficiencies of the prior art and to provide a preparation method of a highly thermally conductive graphite film capable of significantly improving the axial thermal conductivity of a graphite film.
  • the technical solution adopted by the present invention is:
  • a method for preparing a high thermal conductivity graphite film-copper composite material comprises the following steps:
  • step b Put the treated original film in step a into a high temperature furnace, close the furnace, raise the temperature and control the temperature at 300 °C-700 °C, and keep the pressure inside the furnace at 0.05 Pa-15. Pa, time control is 1-10 hours;
  • step g Further electroplating the graphite film on the basis of step g to obtain a high thermal conductivity graphite film-copper composite.
  • the original film in the step a is one of a polyamide film or a polyimide film.
  • the original film is fixed with a graphite frame in a high temperature furnace.
  • the tension is controlled between 0.1 kg and 20 kg.
  • the plating solution for performing electroless copper plating has a pH of 11.0-12.0.
  • the plating temperature of the electroless copper plating is from 45 ° C to 50 ° C.
  • the plating time of the electroless copper plating is performed for 1-10 minutes.
  • the inert gas in step c is nitrogen
  • the inert gas in step d is argon
  • the inert gas in step e is argon.
  • step b the high temperature furnaces in step b, step c, step d and step e are the same.
  • step b the high temperature furnaces in step b, step c, step d and step e are not the same.
  • the plating solution for performing electroless copper plating contains a copper salt, a reducing agent, a complexing agent, a stabilizer, a pH adjuster, and an additive.
  • the main function of the copper salt is to provide copper ions.
  • the copper salt may be copper sulfate, copper chloride, basic copper carbonate, copper tartrate or copper acetate.
  • the present application is preferably copper sulfate pentahydrate.
  • the complexing agent may be selected from sodium potassium tartrate, sodium citrate, sodium gluconate, triethanolamine, tetrahydroxypropylethylenediamine, glycerol, glycolic acid, EDTA, and is preferably EDTA.
  • the reducing agent may be selected from the group consisting of formaldehyde, sodium hypophosphite, sodium borohydride, hydrazine, and dimethylaminoborane.
  • the present application is preferably sodium hypophosphite.
  • the stabilizer may be selected from the group consisting of methanol, sodium cyanide, thiourea, alkyl mercaptan, dihydroxy nitrogenbenzene, and bipyridine.
  • the present application is preferably a bipyridine.
  • Additives and surfactants can be used as additives.
  • the electroplating copper process of the present application is: pickling ⁇ plating copper ⁇ 2-3 grade pure water washing ⁇ drying ⁇ 2-3 grade pure water washing ⁇ drying.
  • the main components of the plating solution include: copper sulfate, sulfuric acid, hydrochloric acid, brightener and leveling agent.
  • Electroplating copper concentration of sulfuric acid 2mol/l, concentration of copper sulfate 0.7mol/l, Add a small amount of hydrochloric acid and leveling agent, the current density is 0.02A/cm2, and pay attention to replenish the consumed material during the electroplating process.
  • Washing Use deionized water and rinse repeatedly.
  • Dry Store in a cool, dry place and air dry.
  • Washing Rinse with deionized water repeatedly.
  • Drying Place in an infrared oven for 30 minutes.
  • the invention adopts a polymer film as a main raw material, activates a surface group of the film by plasma treatment, and then heats the temperature in stages and simultaneously controls factors such as atmosphere and pressure to prepare a crystalline carbon foam film whose main component is carbon element, and then passes through rolling. Or a lamination process to obtain a highly thermally conductive graphite film having a soft surface and a uniform thickness. On the surface of the graphite film, a layer of copper having a smooth surface and fine crystals is obtained by electroless copper plating, followed by electroplating a layer of copper. A high thermal conductivity graphite film-copper composite material, which can significantly improve the axial thermal conductivity of the graphite film.
  • the present invention has the following advantages compared with the prior art:
  • Plasma treatment makes the surface of the original film clean and surface activated, and at the same time, the shrinkage rate of the graphite film and the surface spot defects can be reduced.
  • a carbon foam film having a good self-foaming effect can be obtained by using different atmospheres and pressures (inert atmosphere or reduced pressure) and temperature changes in different time periods during the heating process.
  • the present invention can obtain a smooth and smooth copper plating layer of about 10 micrometers, and the axial thermal conductivity of the graphite film-copper composite material can reach 60 W/mK.
  • the polyamide film is used as the original film, and the treated polyamide film is fixed by a graphite frame in a high-temperature furnace for heat treatment, and the heat treatment is performed in the same high-temperature furnace.
  • the process is: closing the high-temperature furnace, The temperature in the furnace was raised to 500 ° C, and the pressure was reduced to 10 Pa using a vacuum pump. The temperature was maintained for 1 hour and then the temperature was raised, and the temperature was raised to 2 hours. At 1000 ° C, nitrogen gas is introduced into the high temperature furnace, while the vacuum pump is continuously used to maintain the pressure in the furnace at 40 Pa. The temperature is maintained for 2 hours, the temperature is increased, and the temperature is raised to 2400 ° C in 3 hours. Argon gas is introduced into the high temperature furnace to maintain the furnace.
  • the internal pressure is 30Pa, the temperature is maintained for 2 hours, and the temperature is raised to 2900 °C in one hour.
  • the argon flow rate is increased and the vacuum pump displacement is reduced.
  • the pressure in the furnace is controlled at 1.5 atm for 3 hours, and then naturally cooled and cooled.
  • Electroless copper plating is performed on the obtained graphite film to control electroless copper plating.
  • the bath has a pH of 11.0 and is plated for 1 minute at a plating temperature of 45 ° C.
  • the electroless copper plating bath includes copper sulfate pentahydrate, EDTA, sodium hypophosphite, surfactant, bipyridine and pH.
  • the adjusting agent after the electroless copper plating is completed, continues to electroplating copper to obtain a high thermal conductivity graphite film-copper composite material, wherein the process of electroplating copper is: pickling ⁇ plating copper ⁇ 2-3 grade pure water washing ⁇ drying ⁇ 2-3 grade pure water wash ⁇ dry,
  • the main components of the plating solution include: copper sulfate, sulfuric acid, hydrochloric acid, brightener and leveling agent.
  • the thickness of the copper plating layer was 10 ⁇ m, and the axial thermal conductivity of the graphite film-copper composite was ⁇ 40 W/mK.
  • the polyimide film is used as the original film, and the treated polyamide film is fixed by a graphite frame in a high-temperature furnace for heat treatment, and the heat treatment is performed in the same high-temperature furnace.
  • the process is: closing the high-temperature furnace , the temperature in the furnace was raised to 300 ° C, and the pressure was reduced to 1 Pa using a vacuum pump, and the temperature was maintained for 5 hours, and the temperature was raised to 2 hours.
  • nitrogen gas was introduced into the high temperature furnace, while the vacuum pump was continuously used to maintain the pressure in the furnace at 10 Pa.
  • the temperature was maintained for 3 hours, and the temperature was raised to 1600 ° C in 3 hours.
  • the nitrogen gas was continuously introduced into the high temperature furnace to maintain the furnace.
  • the internal pressure is 10Pa
  • the temperature is maintained for 2 hours
  • the temperature is increased to 2600 ° C in 1 hour
  • the nitrogen flow rate is increased and the vacuum pump displacement is reduced
  • the pressure in the furnace is controlled at 0.5 atm
  • the time is maintained for 3 hours
  • the natural cooling is cooled and the hair is obtained.
  • the foamed graphite film is finally rolled into a foamed graphite film, and the tension is controlled at 2 kg to obtain a highly thermally conductive graphite film having a soft and smooth surface.
  • Electroless copper plating is performed on the obtained graphite film to control the electroless copper plating.
  • the bath has a pH of 12.0 and is plated for 10 minutes at a plating temperature of 50 ° C.
  • the electroless copper plating bath includes copper sulfate pentahydrate, EDTA, sodium hypophosphite, surfactant, bipyridine and pH adjustment.
  • the copper plating is continued to obtain a high thermal conductivity graphite film-copper composite material, wherein the process of electroplating copper is: pickling acid ⁇ electroplating copper ⁇ 2-3 grade pure water washing ⁇ drying Dry ⁇ 2-3 grade pure water wash ⁇ dry,
  • the main components of the plating solution include: copper sulfate, sulfuric acid, hydrochloric acid, brightener and leveling agent.
  • the thickness of the copper plating layer was 10 ⁇ m, and the axial thermal conductivity of the graphite film-copper composite was ⁇ 40 W/mK.
  • the polyimide film is used as the original film, and the treated polyamide film is fixed by a graphite frame in a high temperature furnace for heat treatment, and the heat treatment is performed in different high temperature furnaces.
  • the process is as follows: In a high temperature furnace, the high temperature furnace is closed, the temperature in the furnace is raised to 650 ° C, and the pressure is reduced to 15 Pa using a vacuum pump. The temperature is maintained for 1 hour and then the temperature is raised, and the temperature is raised to 2 hours. At 1100 ° C, argon gas was introduced into the high temperature furnace while continuing to use the vacuum pump to maintain the pressure in the furnace at 50 Pa for 1 hour; then in the second high temperature furnace, the high temperature furnace was closed and the temperature in the furnace was raised within 2 hours.
  • argon gas is introduced into the high temperature furnace, while the vacuum pump is continuously used to maintain the pressure in the furnace at 30 Pa, and the temperature is maintained for 1 hour, and the temperature is raised to 2900 ° C in one hour to increase the flow rate of the argon gas and reduce the displacement of the vacuum pump.
  • the pressure in the furnace is controlled at 1.5 atm for 2 hours, and then naturally cooled down to obtain a foamed graphite film. Finally, the foamed graphite film is rolled, and the tension is controlled at 10 kg to obtain a soft and smooth surface.
  • the thermally conductive graphite film is subjected to electroless copper plating on the basis of the obtained graphite film, and the plating solution for controlling electroless copper plating has a pH of 11.0, and is plated at a plating temperature of 48 ° C for 5 minutes, wherein the electroless copper plating solution includes Copper sulfate pentahydrate, EDTA, sodium hypophosphite, surfactant, bipyridine and pH adjuster, after electroless copper plating is completed, electroplating copper is continued to obtain a high thermal conductivity graphite film-copper composite material, wherein Copper electroplating process: electroless copper plating ⁇ pickling ⁇ pure water washing ⁇ drying stage 2-3 2-3 ⁇ pure water washing ⁇ drying stage,
  • the main components of the plating solution include: copper sulfate, sulfuric acid, hydrochloric acid, brightener and leveling agent.
  • the thickness of the copper plating layer was 10 ⁇ m, and the axial thermal conductivity of the graphite film-copper composite was ⁇ 40 W/mK.
  • a polyimide film is used as a raw material, graphite paper is added between each layer of polyimide film, and a polyimide film which is cross-laminated with graphite paper is placed in a carbonization furnace to be carbonized and carbonized in a nitrogen atmosphere.
  • the temperature is 1200 ° C, the time is controlled at 3 hours; the graphitization is carried out in an argon atmosphere, the temperature is controlled at about 2800 ° C, and the temperature is controlled at 5 hours.
  • the experimental results show that the plane of thermal conductivity of the graphite film is ⁇ 1600 W/mK; vertical direction 5.3 W/mK.

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  • Inorganic Chemistry (AREA)
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Abstract

The present invention relates to a method for preparing a high thermal conductive graphite film-copper composite material. A macromolecular film is used as a major raw material; the surface groups of the film are activated through a plasma treatment, and then the factors of atmosphere, pressure etc. are controlled while increasing the temperature in stages to prepare a crystalline carbon foam film with a major component of carbon element, which further undergoes a rolling or laminating process to obtain a high thermal conductive graphite film having a soft and smooth surface and a uniform thickness; a layer of copper having a smooth surface and fine crystals is obtained on the surface of this graphite film through a chemical copper plating method; and subsequently, a layer of copper is further electroplated so as to prepare the high thermal conductive graphite film-copper composite material. The graphite film-copper composite material prepared using the method of the present invention has an axial thermal conductivity coefficient which can reach 60 W/mK.

Description

一种高导热石墨膜-铜复合材料的制备方法  Method for preparing high thermal conductivity graphite film-copper composite material
技术领域Technical field
本发明具体涉及一种高导热石墨膜-铜复合材料的制备方法。The invention particularly relates to a method for preparing a highly thermally conductive graphite film-copper composite.
背景技术Background technique
随着半导体技术的快速发展,以及数码产品(如手机、平板电脑等)对便携性能的要求越来越高,这使得相关厂家迫切需要提高电子产品内部空间的利用率,但是,运行中所产生的热量不易排出、易于迅速积累而形成高温,很显然,高温会降低电子设备的性能、可靠性和使用寿命。因此,当前电子行业对于作为热控系统核心部件的散热材料提出越来越高的要求,迫切需要一种高效导热、轻便的材料迅速将热量传递出去,保障电子设备正常运行。With the rapid development of semiconductor technology and the increasing requirements for portable products of digital products (such as mobile phones, tablet computers, etc.), there is an urgent need for manufacturers to improve the utilization of internal space of electronic products, but generated during operation. The heat is not easily discharged, and it is easy to accumulate quickly to form a high temperature. Obviously, high temperature will reduce the performance, reliability and service life of electronic equipment. Therefore, the current electronic industry is increasingly demanding heat-dissipating materials as the core components of the thermal control system. There is an urgent need for a highly efficient heat-conducting, lightweight material to quickly transfer heat out to ensure the normal operation of electronic equipment.
传统的散热材料是铜、银、铝之类的高导热的金属,但是随着电子元器件发热量的提高,已无法满足产品需要,而天然石墨膜具有更高的导热性,较低的密度,良好的材料稳定性,所以逐步在电子行业得到广泛的应用。The traditional heat dissipating material is a high thermal conductivity metal such as copper, silver or aluminum. However, as the heat generation of electronic components increases, the product needs cannot be met, and the natural graphite film has higher thermal conductivity and lower density. , good material stability, so gradually in the electronics industry is widely used.
天然石墨膜是以天然鳞片石墨或煤沥青为原料,将原料酸化后,加热使得天然石墨层间膨胀,得到蠕虫状结构,然后通过与粘结材料高温高压条件下压延,得到膜状的石墨片,但是天然石墨膜的导热系数一般不超过400W/(m•K),还有易于掉粉等缺点,所以日益无法满足当前便携式数码产品的散热要求。The natural graphite film is made of natural flake graphite or coal tar pitch. After acidifying the raw material, the natural graphite layer is expanded by heating to obtain a worm-like structure, and then calendered under high temperature and high pressure conditions with the bonding material to obtain a film-like graphite sheet. However, the thermal conductivity of natural graphite film generally does not exceed 400W/(m•K), and there are disadvantages such as easy powder drop, so it is increasingly unable to meet the heat dissipation requirements of current portable digital products.
目前,为满足散热的要求,人工合成石墨膜也已经在研发中,申请号为201210227634.8的专利公开了一种高导热石墨膜的制造方法,它采用聚酰亚胺薄膜最为原材料,经过碳化与石墨化二个过程,其工艺过程如下:a、选择聚酰亚胺薄膜作为原材料,在每一层聚酰亚胺薄膜之间加入石墨纸;b、将间隔有石墨纸交叉层叠后的聚酰亚胺薄膜放入炭化炉中在氮气或氩气环境中碳化,碳化温度100℃-1400℃,时间控制在1小时-6小时;c、碳化后进行石墨化,石墨化也是在氮气或氩气环境中进行,温度控制在2500℃-3000℃左右,控制在12小时以内。At present, in order to meet the requirements of heat dissipation, a synthetic graphite film has also been under development. The patent application No. 201210227634.8 discloses a method for manufacturing a highly thermally conductive graphite film, which uses the most raw material of polyimide film, and is carbonized and graphite. The two processes are as follows: a. Selecting a polyimide film as a raw material, adding graphite paper between each layer of polyimide film; b, a polyimide layer separated by graphite paper at intervals The amine film is placed in a carbonization furnace and carbonized in a nitrogen or argon atmosphere at a carbonization temperature of 100 ° C to 1400 ° C for a period of time ranging from 1 hour to 6 hours; c, graphitization after carbonization, and graphitization in a nitrogen or argon atmosphere In the middle, the temperature is controlled at about 2500 ° C -3000 ° C, controlled within 12 hours.
石墨膜是层状晶体材料,人工合成石墨膜的平面导热系数可达1400-1800W/(m•K), 但其轴向导热系数只有5-10 W/(m•K)。The graphite film is a layered crystal material, and the planar thermal conductivity of the synthetic graphite film can reach 1400-1800 W/(m•K). However, its axial thermal conductivity is only 5-10 W/(m•K).
发明内容Summary of the invention
本发明所要解决的技术问题是克服现有技术的不足,提供一种能明显改善石墨膜轴向导热系数的高导热石墨膜的制备方法。The technical problem to be solved by the present invention is to overcome the deficiencies of the prior art and to provide a preparation method of a highly thermally conductive graphite film capable of significantly improving the axial thermal conductivity of a graphite film.
为解决以上技术问题,本发明采取的技术方案是:In order to solve the above technical problems, the technical solution adopted by the present invention is:
一种高导热石墨膜-铜复合材料的制备方法,包括如下步骤:A method for preparing a high thermal conductivity graphite film-copper composite material comprises the following steps:
a对原膜进行等离子处理;a plasma treatment of the original film;
b将步骤a中经过处理的原膜放入高温炉中,封闭炉子,升温并控制温度在300℃-700℃,保持炉内压力在0.05 Pa-15 Pa,时间控制在1-10小时;b Put the treated original film in step a into a high temperature furnace, close the furnace, raise the temperature and control the temperature at 300 °C-700 °C, and keep the pressure inside the furnace at 0.05 Pa-15. Pa, time control is 1-10 hours;
c继续升温,控制高温炉温度在700℃-1200℃,向高温炉中通入惰性气体,保持炉内压力在10 Pa-50 Pa,时间控制在1-10小时;c continue to heat up, control the temperature of the high temperature furnace at 700 ° C -1200 ° C, into the high temperature furnace into the inert gas, keep the pressure inside the furnace at 10 Pa-50 Pa, time control is 1-10 hours;
d继续升温,控制高温炉温度在1600℃-2500℃,向高温炉中继续通入惰性气体,保持炉内压力在5 Pa-30 Pa,时间控制在1-10小时;d continue to heat up, control the temperature of the high temperature furnace at 1600 ° C -2500 ° C, continue to pass inert gas into the high temperature furnace, keep the pressure inside the furnace at 5 Pa-30 Pa, time control is 1-10 hours;
e继续升温,控制高温炉温度在2500℃-3000℃,向高温炉中增加惰性气体流量,保持炉内压力在0.5 atm-1.5 atm,时间控制在1-10小时,自然降温冷却后,得到碳泡沫膜;e continue to heat up, control the temperature of the high temperature furnace at 2500 ° C -3000 ° C, increase the flow of inert gas into the high temperature furnace, keep the pressure inside the furnace at 0.5 Atm-1.5 atm, time control is 1-10 hours, after natural cooling and cooling, a carbon foam film is obtained;
f将步骤e中得到的碳泡沫膜进行辊压或层压,得到高导热石墨膜;f rolling or laminating the carbon foam film obtained in the step e to obtain a high thermal conductive graphite film;
g在步骤f中得到的石墨膜表面进行化学镀铜;g electroless copper plating on the surface of the graphite film obtained in step f;
h在步骤g的基础上进一步对石墨膜进行电镀铜,得到高导热石墨膜-铜复合材料。h Further electroplating the graphite film on the basis of step g to obtain a high thermal conductivity graphite film-copper composite.
优选地,步骤a中的原膜为聚酰胺膜或聚酰亚胺膜中的一种。Preferably, the original film in the step a is one of a polyamide film or a polyimide film.
优选地,原膜在高温炉中用石墨框固定。Preferably, the original film is fixed with a graphite frame in a high temperature furnace.
优选地,在步骤f中,张力控制在0.1 kg-20 kg。Preferably, in step f, the tension is controlled between 0.1 kg and 20 kg.
优选地,在步骤f中,进行化学镀铜的镀液pH值为11.0-12.0。Preferably, in step f, the plating solution for performing electroless copper plating has a pH of 11.0-12.0.
优选地,在步骤g中,进行化学镀铜的镀覆温度为45℃-50℃。Preferably, in step g, the plating temperature of the electroless copper plating is from 45 ° C to 50 ° C.
优选地,在步骤g中,进行化学镀铜的施镀时间为1-10分钟。Preferably, in step g, the plating time of the electroless copper plating is performed for 1-10 minutes.
优选地,步骤c中的惰性气体为氮气,步骤d中的惰性气体为氩气,步骤e中的惰性气体为氩气。Preferably, the inert gas in step c is nitrogen, the inert gas in step d is argon, and the inert gas in step e is argon.
优选地,步骤b、步骤c、步骤d和步骤e中的高温炉为同一个。Preferably, the high temperature furnaces in step b, step c, step d and step e are the same.
优选地,步骤b、步骤c、步骤d和步骤e中的高温炉不是同一个。Preferably, the high temperature furnaces in step b, step c, step d and step e are not the same.
在步骤g中,进行化学镀铜的镀液包含铜盐、还原剂、络合剂、稳定剂、pH调节剂和添加剂。In step g, the plating solution for performing electroless copper plating contains a copper salt, a reducing agent, a complexing agent, a stabilizer, a pH adjuster, and an additive.
铜盐的主要作用是提供铜离子,铜盐可以选用硫酸铜、氯化铜、碱式碳酸铜、酒石酸铜或醋酸铜,本申请优选为五水硫酸铜。The main function of the copper salt is to provide copper ions. The copper salt may be copper sulfate, copper chloride, basic copper carbonate, copper tartrate or copper acetate. The present application is preferably copper sulfate pentahydrate.
络合剂可以选用酒石酸钾钠、柠檬酸钠、葡萄糖酸钠、三乙醇胺、四羟丙基乙二胺、甘油、甘醇酸、EDTA,本申请优选为EDTA。The complexing agent may be selected from sodium potassium tartrate, sodium citrate, sodium gluconate, triethanolamine, tetrahydroxypropylethylenediamine, glycerol, glycolic acid, EDTA, and is preferably EDTA.
还原剂可选用甲醛、次磷酸钠、硼氢化钠、肼、二甲氨基硼烷,本申请优选为次磷酸钠。The reducing agent may be selected from the group consisting of formaldehyde, sodium hypophosphite, sodium borohydride, hydrazine, and dimethylaminoborane. The present application is preferably sodium hypophosphite.
稳定剂可选用甲醇、氰化钠、硫代尿素、烷基硫醇、二羟基氮苯、二联吡啶,本申请优选为二联吡啶。The stabilizer may be selected from the group consisting of methanol, sodium cyanide, thiourea, alkyl mercaptan, dihydroxy nitrogenbenzene, and bipyridine. The present application is preferably a bipyridine.
添加剂可选用促进剂、表面活性剂。Additives and surfactants can be used as additives.
本申请电镀铜工艺流程为:浸酸→电镀铜→2-3级纯水洗→晾干→2-3级纯水洗→烘干, 电镀液主要成分包括:硫酸铜、硫酸、盐酸、光亮剂和整平剂。The electroplating copper process of the present application is: pickling→plating copper→2-3 grade pure water washing→drying→2-3 grade pure water washing→drying. The main components of the plating solution include: copper sulfate, sulfuric acid, hydrochloric acid, brightener and leveling agent.
电镀铜具体步骤如下:The specific steps for electroplating copper are as follows:
浸酸:将石墨膜浸泡在5%的稀硫酸溶液中,保持12小时。Pickling: The graphite film was immersed in a 5% dilute sulfuric acid solution for 12 hours.
电镀铜:硫酸的浓度2mol/l, 硫酸铜的浓度0.7mol/l, 加入少量盐酸和整平剂,电流密度为0.02A/cm2,电镀过程中,注意补充消耗掉的物质。Electroplating copper: concentration of sulfuric acid 2mol/l, concentration of copper sulfate 0.7mol/l, Add a small amount of hydrochloric acid and leveling agent, the current density is 0.02A/cm2, and pay attention to replenish the consumed material during the electroplating process.
水洗:使用去离子水,反复冲洗。Washing: Use deionized water and rinse repeatedly.
晾干:放在阴凉干燥处,自然风干。Dry: Store in a cool, dry place and air dry.
水洗:重复使用去离子水冲洗。Washing: Rinse with deionized water repeatedly.
烘干:放在红外烘箱中处理30分钟。Drying: Place in an infrared oven for 30 minutes.
本发明以高分子薄膜为主要原料,通过等离子处理活化薄膜表面基团,然后分段升温并同时控制气氛和压力等因素,制备出主要成分为碳元素的结晶性碳泡沫膜,再通过辊压或层压工艺,得到表面柔软光滑、厚度均匀的高导热石墨膜,在此石墨膜表面,通过化学镀铜的方法,得到一层表面光滑、晶体细小的铜,接着再电镀一层铜,制备出高导热的石墨膜-铜复合材料,该复合材料能明显改善石墨膜轴向导热系数。The invention adopts a polymer film as a main raw material, activates a surface group of the film by plasma treatment, and then heats the temperature in stages and simultaneously controls factors such as atmosphere and pressure to prepare a crystalline carbon foam film whose main component is carbon element, and then passes through rolling. Or a lamination process to obtain a highly thermally conductive graphite film having a soft surface and a uniform thickness. On the surface of the graphite film, a layer of copper having a smooth surface and fine crystals is obtained by electroless copper plating, followed by electroplating a layer of copper. A high thermal conductivity graphite film-copper composite material, which can significantly improve the axial thermal conductivity of the graphite film.
由于以上技术方案的采用,本发明与现有技术相比具有如下优点:Due to the adoption of the above technical solutions, the present invention has the following advantages compared with the prior art:
(1)等离子处理使得原膜表面清洁和表面活化,同时可以减少石墨膜的收缩率和表面点状不良。(1) Plasma treatment makes the surface of the original film clean and surface activated, and at the same time, the shrinkage rate of the graphite film and the surface spot defects can be reduced.
(2)采用石墨框固定原膜,可以减少原膜加工过程中的收缩率。(2) Fixing the original film with a graphite frame can reduce the shrinkage rate during the processing of the original film.
(3)升温过程中在不同时间段采用不同的气氛和压力(惰性气氛或减压)以及温度变化,能够得到良好自发泡效果的碳泡沫膜。(3) A carbon foam film having a good self-foaming effect can be obtained by using different atmospheres and pressures (inert atmosphere or reduced pressure) and temperature changes in different time periods during the heating process.
(4)本发明可以得到10微米左右的平整光滑的镀铜层,该石墨膜-铜复合材料的轴向导热系数可达60 W/mK。(4) The present invention can obtain a smooth and smooth copper plating layer of about 10 micrometers, and the axial thermal conductivity of the graphite film-copper composite material can reach 60 W/mK.
具体实施方式detailed description
以下结合具体实施例对本发明做进一步详细说明。应理解,这些实施例是用于说明本发明的基本原理、主要特征和优点,而本发明不受以下实施例的范围限制。实施例中采用的实施条件可以根据具体要求做进一步调整,未注明的实施条件通常为常规实验中的条件。The present invention will be further described in detail below in conjunction with specific embodiments. The embodiments are intended to be illustrative of the basic principles, main features and advantages of the invention, and the invention is not limited by the scope of the following embodiments. The implementation conditions employed in the examples can be further adjusted according to specific requirements, and the unspecified implementation conditions are usually the conditions in the conventional experiment.
实施例1Example 1
以聚酰胺膜作为原膜,对其进行等离子处理,将经过处理的聚酰胺膜用石墨框固定放入高温炉中进行热处理,热处理在同一高温炉中进行,其过程为:封闭高温炉,将炉内温度升至500℃,并使用真空泵减压至10Pa,时间保持1小时之后继续升温,2小时升温至 1000℃,向高温炉中通入氮气,同时继续使用真空泵,保持炉内压力为40Pa,时间保持2小时之后继续升温,3小时内升温至2400℃,向高温炉中通入氩气,保持炉内压力在30Pa,时间保持2小时之后继续升温,1小时内升温至2900℃,提高氩气流量并降低真空泵排量,控制炉内压力在1.5atm,时间保持3小时,之后自然降温冷却,得到发泡状的石墨膜,最后将发泡状的石墨膜进行辊压,张力控制在8kg,得到表面柔软光滑的高导热石墨膜,在得到的石墨膜基础上进行化学镀铜,控制化学镀铜的镀液pH值为11.0,在镀覆温度为45℃下施镀1分钟,其中,化学镀铜的镀液包括五水硫酸铜、EDTA、次磷酸钠、表面活性剂、二联吡啶和pH调节剂,在化学镀铜完成后继续进行电镀铜,得到高导热石墨膜-铜复合材料,其中,电镀铜的工艺流程为:浸酸→电镀铜→2-3级纯水洗→晾干→2-3级纯水洗→烘干, 电镀液的主要成分包括:硫酸铜、硫酸、盐酸、光亮剂和整平剂。The polyamide film is used as the original film, and the treated polyamide film is fixed by a graphite frame in a high-temperature furnace for heat treatment, and the heat treatment is performed in the same high-temperature furnace. The process is: closing the high-temperature furnace, The temperature in the furnace was raised to 500 ° C, and the pressure was reduced to 10 Pa using a vacuum pump. The temperature was maintained for 1 hour and then the temperature was raised, and the temperature was raised to 2 hours. At 1000 ° C, nitrogen gas is introduced into the high temperature furnace, while the vacuum pump is continuously used to maintain the pressure in the furnace at 40 Pa. The temperature is maintained for 2 hours, the temperature is increased, and the temperature is raised to 2400 ° C in 3 hours. Argon gas is introduced into the high temperature furnace to maintain the furnace. The internal pressure is 30Pa, the temperature is maintained for 2 hours, and the temperature is raised to 2900 °C in one hour. The argon flow rate is increased and the vacuum pump displacement is reduced. The pressure in the furnace is controlled at 1.5 atm for 3 hours, and then naturally cooled and cooled. Foamed graphite film, finally, the foamed graphite film is rolled, the tension is controlled at 8kg, and a highly thermally conductive graphite film with a soft surface is obtained. Electroless copper plating is performed on the obtained graphite film to control electroless copper plating. The bath has a pH of 11.0 and is plated for 1 minute at a plating temperature of 45 ° C. The electroless copper plating bath includes copper sulfate pentahydrate, EDTA, sodium hypophosphite, surfactant, bipyridine and pH. The adjusting agent, after the electroless copper plating is completed, continues to electroplating copper to obtain a high thermal conductivity graphite film-copper composite material, wherein the process of electroplating copper is: pickling→plating copper→2-3 grade pure water washing→drying→ 2-3 grade pure water wash → dry, The main components of the plating solution include: copper sulfate, sulfuric acid, hydrochloric acid, brightener and leveling agent.
实验测得,镀铜层厚度为10微米,该石墨膜-铜复合材料的轴向导热系数≥40 W/mK。The thickness of the copper plating layer was 10 μm, and the axial thermal conductivity of the graphite film-copper composite was ≥40 W/mK.
实施例2Example 2
以聚酰亚胺膜作为原膜,对其进行等离子处理,将经过处理的聚酰胺膜用石墨框固定放入高温炉中进行热处理,热处理在同一高温炉中进行,其过程为:封闭高温炉,将炉内温度升至300℃,并使用真空泵减压至1Pa,时间保持5小时之后继续升温,2小时升温至 720℃,向高温炉中通入氮气,同时继续使用真空泵,保持炉内压力为10Pa,时间保持3小时之后继续升温,3小时内升温至1600℃,继续向高温炉中通入氮气,保持炉内压力在10Pa,时间保持2小时之后继续升温,1小时内升温至2600℃,提高氮气流量并降低真空泵排量,控制炉内压力在0.5atm,时间保持3小时,之后自然降温冷却,得到发泡状的石墨膜,最后将发泡状的石墨膜进行辊压,张力控制在2kg,得到表面柔软光滑的高导热石墨膜,在得到的石墨膜基础上进行化学镀铜,控制化学镀铜的镀液pH值为12.0,在镀覆温度为50℃下施镀10分钟,其中,化学镀铜的镀液包括五水硫酸铜、EDTA、次磷酸钠、表面活性剂、二联吡啶和pH调节剂,在化学镀铜完成后继续进行电镀铜,得到高导热石墨膜-铜复合材料,其中,电镀铜的工艺流程为:浸酸→电镀铜→2-3级纯水洗→晾干→2-3级纯水洗→烘干, 电镀液的主要成分包括:硫酸铜、硫酸、盐酸、光亮剂和整平剂。The polyimide film is used as the original film, and the treated polyamide film is fixed by a graphite frame in a high-temperature furnace for heat treatment, and the heat treatment is performed in the same high-temperature furnace. The process is: closing the high-temperature furnace , the temperature in the furnace was raised to 300 ° C, and the pressure was reduced to 1 Pa using a vacuum pump, and the temperature was maintained for 5 hours, and the temperature was raised to 2 hours. At 720 ° C, nitrogen gas was introduced into the high temperature furnace, while the vacuum pump was continuously used to maintain the pressure in the furnace at 10 Pa. The temperature was maintained for 3 hours, and the temperature was raised to 1600 ° C in 3 hours. The nitrogen gas was continuously introduced into the high temperature furnace to maintain the furnace. The internal pressure is 10Pa, the temperature is maintained for 2 hours, the temperature is increased to 2600 ° C in 1 hour, the nitrogen flow rate is increased and the vacuum pump displacement is reduced, the pressure in the furnace is controlled at 0.5 atm, the time is maintained for 3 hours, and then the natural cooling is cooled and the hair is obtained. The foamed graphite film is finally rolled into a foamed graphite film, and the tension is controlled at 2 kg to obtain a highly thermally conductive graphite film having a soft and smooth surface. Electroless copper plating is performed on the obtained graphite film to control the electroless copper plating. The bath has a pH of 12.0 and is plated for 10 minutes at a plating temperature of 50 ° C. The electroless copper plating bath includes copper sulfate pentahydrate, EDTA, sodium hypophosphite, surfactant, bipyridine and pH adjustment. After the electroless copper plating is completed, the copper plating is continued to obtain a high thermal conductivity graphite film-copper composite material, wherein the process of electroplating copper is: pickling acid → electroplating copper → 2-3 grade pure water washing → drying Dry → 2-3 grade pure water wash → dry, The main components of the plating solution include: copper sulfate, sulfuric acid, hydrochloric acid, brightener and leveling agent.
实验测得,镀铜层厚度为10微米,该石墨膜-铜复合材料的轴向导热系数≥40 W/mK。The thickness of the copper plating layer was 10 μm, and the axial thermal conductivity of the graphite film-copper composite was ≥40 W/mK.
实施例3Example 3
以聚酰亚胺膜作为原膜,对其进行等离子处理,将经过处理的聚酰胺膜用石墨框固定放入高温炉中进行热处理,热处理在不同高温炉中进行,其过程为:在第一个高温炉中,封闭高温炉,将炉内温度升至650℃,并使用真空泵减压至15Pa,时间保持1小时之后继续升温,2小时升温至 1100℃,向高温炉中通入氩气,同时继续使用真空泵,保持炉内压力为50Pa,时间保持1小时;之后在第二个高温炉中,封闭高温炉,将炉内温度2小时内升温至2400℃,向高温炉中通入氩气,同时继续使用真空泵,保持炉内压力在30Pa,时间保持1小时之后继续升温,1小时内升温至2900℃,提高氩气流量并降低真空泵排量,控制炉内压力在1.5atm,时间保持2小时,之后自然降温冷却,得到发泡状的石墨膜,最后将发泡状的石墨膜进行辊压,张力控制在10kg,得到表面柔软光滑的高导热石墨膜,在得到的石墨膜基础上进行化学镀铜,控制化学镀铜的镀液pH值为11.0,在镀覆温度为48℃下施镀5分钟,其中,化学镀铜的镀液包括五水硫酸铜、EDTA、次磷酸钠、表面活性剂、二联吡啶和pH调节剂,在化学镀铜完成后继续进行电镀铜,得到高导热石墨膜-铜复合材料,其中,电镀铜的工艺流程为:浸酸→电镀铜→2-3级纯水洗→晾干→2-3级纯水洗→烘干, 电镀液的主要成分包括:硫酸铜、硫酸、盐酸、光亮剂和整平剂。The polyimide film is used as the original film, and the treated polyamide film is fixed by a graphite frame in a high temperature furnace for heat treatment, and the heat treatment is performed in different high temperature furnaces. The process is as follows: In a high temperature furnace, the high temperature furnace is closed, the temperature in the furnace is raised to 650 ° C, and the pressure is reduced to 15 Pa using a vacuum pump. The temperature is maintained for 1 hour and then the temperature is raised, and the temperature is raised to 2 hours. At 1100 ° C, argon gas was introduced into the high temperature furnace while continuing to use the vacuum pump to maintain the pressure in the furnace at 50 Pa for 1 hour; then in the second high temperature furnace, the high temperature furnace was closed and the temperature in the furnace was raised within 2 hours. At 2400 ° C, argon gas is introduced into the high temperature furnace, while the vacuum pump is continuously used to maintain the pressure in the furnace at 30 Pa, and the temperature is maintained for 1 hour, and the temperature is raised to 2900 ° C in one hour to increase the flow rate of the argon gas and reduce the displacement of the vacuum pump. The pressure in the furnace is controlled at 1.5 atm for 2 hours, and then naturally cooled down to obtain a foamed graphite film. Finally, the foamed graphite film is rolled, and the tension is controlled at 10 kg to obtain a soft and smooth surface. The thermally conductive graphite film is subjected to electroless copper plating on the basis of the obtained graphite film, and the plating solution for controlling electroless copper plating has a pH of 11.0, and is plated at a plating temperature of 48 ° C for 5 minutes, wherein the electroless copper plating solution includes Copper sulfate pentahydrate, EDTA, sodium hypophosphite, surfactant, bipyridine and pH adjuster, after electroless copper plating is completed, electroplating copper is continued to obtain a high thermal conductivity graphite film-copper composite material, wherein Copper electroplating process: electroless copper plating → pickling → pure water washing → drying stage 2-3 2-3 → pure water washing → drying stage, The main components of the plating solution include: copper sulfate, sulfuric acid, hydrochloric acid, brightener and leveling agent.
实验测得,镀铜层厚度为10微米,该石墨膜-铜复合材料的轴向导热系数≥40 W/mK。The thickness of the copper plating layer was 10 μm, and the axial thermal conductivity of the graphite film-copper composite was ≥40 W/mK.
对比例1Comparative example 1
采用聚酰亚胺薄膜作为原材料,在每一层聚酰亚胺薄膜之间加入石墨纸,将间隔有石墨纸交叉层叠后的聚酰亚胺薄膜放入炭化炉中在氮气环境中碳化,碳化温度1200℃,时间控制在3小时;石墨化是在氩气环境中进行,温度控制在2800℃左右,控制在5小时。实验测得该石墨膜的导热系数平面向≥1600 W/mK;垂直向5.3 W/mK。A polyimide film is used as a raw material, graphite paper is added between each layer of polyimide film, and a polyimide film which is cross-laminated with graphite paper is placed in a carbonization furnace to be carbonized and carbonized in a nitrogen atmosphere. The temperature is 1200 ° C, the time is controlled at 3 hours; the graphitization is carried out in an argon atmosphere, the temperature is controlled at about 2800 ° C, and the temperature is controlled at 5 hours. The experimental results show that the plane of thermal conductivity of the graphite film is ≥1600 W/mK; vertical direction 5.3 W/mK.
以上对本发明做了详尽的描述,实施例的说明只是用于帮助理解本发明的方法及其核心思想,其目的在于让熟悉此领域技术的人士能够了解本发明的内容并据以实施,并不能以此限制本发明的保护范围。凡根据本发明精神实质所作的等效变化或修饰,都应涵盖在本发明的保护范围之内。The present invention has been described in detail above, and the description of the embodiments is only to assist in understanding the method of the present invention and its core idea, and the purpose of the present invention is to enable those skilled in the art to understand the contents of the present invention and implement it. This limits the scope of protection of the present invention. Equivalent variations or modifications made in accordance with the spirit of the invention are intended to be included within the scope of the invention.

Claims (10)

1. 一种高导热石墨膜-铜复合材料的制备方法,其特征在于:包括如下步骤: A method for preparing a high thermal conductivity graphite film-copper composite material, comprising the steps of:
a对原膜进行等离子处理;a plasma treatment of the original film;
b将步骤a中经过处理的原膜放入高温炉中,封闭炉子,升温并控制温度在300℃-700℃,保持炉内压力在0.05 Pa-15 Pa,时间控制在1-10小时;b Put the treated original film in step a into a high temperature furnace, close the furnace, raise the temperature and control the temperature at 300 °C-700 °C, and keep the pressure inside the furnace at 0.05 Pa-15. Pa, time control is 1-10 hours;
c继续升温,控制高温炉温度在700℃-1200℃,向高温炉中通入惰性气体,保持炉内压力在10 Pa-50 Pa,时间控制在1-10小时;c continue to heat up, control the temperature of the high temperature furnace at 700 ° C -1200 ° C, into the high temperature furnace into the inert gas, keep the pressure inside the furnace at 10 Pa-50 Pa, time control is 1-10 hours;
d继续升温,控制高温炉温度在1600℃-2500℃,向高温炉中继续通入惰性气体,保持炉内压力在5 Pa-30 Pa,时间控制在1-10小时;d continue to raise temperature, control the temperature of the high temperature furnace at 1600 °C -2500 °C, continue to pass inert gas into the high temperature furnace, keep the pressure inside the furnace at 5 Pa-30 Pa, time control is 1-10 hours;
e继续升温,控制高温炉温度在2500℃-3000℃,向高温炉中增加惰性气体流量,保持炉内压力在0.5 atm-1.5 atm,时间控制在1-10小时,自然降温冷却后,得到碳泡沫膜;e continue to heat up, control the temperature of the high temperature furnace at 2500 ° C -3000 ° C, increase the inert gas flow to the high temperature furnace, keep the pressure inside the furnace at 0.5 atm-1.5 Atm, the time is controlled in 1-10 hours, after natural cooling and cooling, a carbon foam film is obtained;
f将步骤e中得到的碳泡沫膜进行辊压或层压,得到高导热石墨膜;f rolling or laminating the carbon foam film obtained in the step e to obtain a high thermal conductive graphite film;
g在步骤f中得到的石墨膜表面进行化学镀铜;g electroless copper plating on the surface of the graphite film obtained in step f;
h在步骤g的基础上进一步对石墨膜进行电镀铜,得到高导热石墨膜-铜复合材料。h Further electroplating the graphite film on the basis of step g to obtain a high thermal conductivity graphite film-copper composite.
2. 根据权利要求1所述的高导热石墨膜-铜复合材料的制备方法,其特征在于:所述步骤a中的原膜为聚酰胺膜或聚酰亚胺膜中的一种。2. The method for producing a highly thermally conductive graphite film-copper composite according to claim 1, wherein the original film in the step a is one of a polyamide film or a polyimide film.
3. 根据权利要求1所述的高导热石墨膜-铜复合材料的制备方法,其特征在于:所述原膜在所述高温炉中用石墨框固定。3. The method for producing a highly thermally conductive graphite film-copper composite according to claim 1, wherein the original film is fixed by a graphite frame in the high temperature furnace.
4. 根据权利要求1所述的高导热石墨膜-铜复合材料的制备方法,其特征在于:在所述步骤f中,张力控制在0.1 kg-20 kg。4. The method for preparing a high thermal conductivity graphite film-copper composite according to claim 1, wherein in the step f, the tension is controlled at 0.1 kg-20 Kg.
5. 根据权利要求1所述的高导热石墨膜-铜复合材料的制备方法,其特征在于:在所述步骤g中,进行化学镀铜的镀液pH值为11.0-12.0。5. The method for preparing a high thermal conductivity graphite film-copper composite according to claim 1, wherein in the step g, the plating solution for performing electroless copper plating has a pH of 11.0-12.0.
6. 根据权利要求1所述的高导热石墨膜-铜复合材料的制备方法,其特征在于:在所述步骤g中,进行化学镀铜的镀覆温度为45℃-50℃。6. The method for producing a highly thermally conductive graphite film-copper composite according to claim 1, wherein in the step g, the plating temperature of the electroless copper plating is 45 ° C to 50 ° C.
7. 根据权利要求1所述的高导热石墨膜-铜复合材料的制备方法,其特征在于:在所述步骤g中,进行化学镀铜的施镀时间为1-10分钟。7. The method for producing a highly thermally conductive graphite film-copper composite according to claim 1, wherein in the step g, the plating time of the electroless copper plating is 1-10 minutes.
8. 根据权利要求1所述的高导热石墨膜-铜复合材料的制备方法,其特征在于:步骤c中的惰性气体为氮气,步骤d中的惰性气体为氩气,步骤e中的惰性气体为氩气。8. The method for preparing a high thermal conductivity graphite film-copper composite according to claim 1, wherein the inert gas in the step c is nitrogen, the inert gas in the step d is argon, and the inert gas in the step e is argon. gas.
9. 根据权利要求1所述的高导热石墨膜-铜复合材料的制备方法,其特征在于:步骤b、步骤c、步骤d和步骤e中的高温炉为同一个。9. The method for preparing a high thermal conductivity graphite film-copper composite according to claim 1, wherein the high temperature furnaces in the step b, the step c, the step d and the step e are the same.
10. 根据权利要求1所述的高导热石墨膜-铜复合材料的制备方法,其特征在于:步骤b、步骤c、步骤d和步骤e中的高温炉不是同一个。10. The method for preparing a high thermal conductivity graphite film-copper composite according to claim 1, wherein the high temperature furnaces in the step b, the step c, the step d and the step e are not the same.
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