WO2015141421A1 - Compound, resin, and composition - Google Patents
Compound, resin, and composition Download PDFInfo
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- WO2015141421A1 WO2015141421A1 PCT/JP2015/055498 JP2015055498W WO2015141421A1 WO 2015141421 A1 WO2015141421 A1 WO 2015141421A1 JP 2015055498 W JP2015055498 W JP 2015055498W WO 2015141421 A1 WO2015141421 A1 WO 2015141421A1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
- C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
- C07C69/54—Acrylic acid esters; Methacrylic acid esters
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
- C07D277/62—Benzothiazoles
- C07D277/64—Benzothiazoles with only hydrocarbon or substituted hydrocarbon radicals attached in position 2
- C07D277/66—Benzothiazoles with only hydrocarbon or substituted hydrocarbon radicals attached in position 2 with aromatic rings or ring systems directly attached in position 2
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
- C08F12/22—Oxygen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
- C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
- C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
- C07C2603/18—Fluorenes; Hydrogenated fluorenes
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/40—Ortho- or ortho- and peri-condensed systems containing four condensed rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/52—Ortho- or ortho- and peri-condensed systems containing five condensed rings
Definitions
- the present invention relates to a compound, a resin and a composition.
- Patent Document 1 discloses a monofunctional fluorene compound represented by a predetermined formula (claim 1). According to Patent Document 1, it is described that the fluorene compound is useful as a raw material capable of imparting excellent optical properties (high refractive index and the like) (paragraph [0022]).
- an object of the present invention is to provide a compound and a resin that exhibit excellent solubility and a high refractive index, and a composition containing the resin.
- a compound represented by the following general formula (1) (2) The compound according to (1) above, wherein at least one of Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring which may have a substituent. (3) Resin which has a repeating unit represented by General formula (2) mentioned later. (4) The resin according to (3) above, having a weight average molecular weight of 2,000 to 100,000. (5) A composition containing the resin according to (3) or (4).
- a compound and a resin exhibiting excellent solubility and a high refractive index, and a composition containing the above resin can be provided.
- (meth) acryl represents acryl or methacryl
- (meth) acrylate represents acrylate or methacrylate.
- a numerical range expressed using “to” in this specification means a range including numerical values described before and after “to” as a lower limit value and an upper limit value.
- R 1 represents a hydrogen atom or an alkyl group.
- the number of carbon atoms of the alkyl group is not particularly limited, but is preferably 1 to 10.
- the alkyl group may be linear or branched.
- L represents a divalent linking group.
- the divalent linking group is not particularly limited.
- a linear, branched or cyclic divalent aliphatic hydrocarbon group for example, an alkylene group such as a methylene group, an ethylene group, or a propylene group
- Aromatic hydrocarbon group for example, phenylene group
- R L represents a hydrogen atom or an alkyl group (preferably having 1
- the bivalent coupling group represented by the following general formula (L) is mentioned, for example.
- L 1 represents a single bond, an ester group (—COO—), an amide group (—CONR L —) or an ether group (—O—).
- the definition of RL is as described above.
- L 2 represents a single bond or a divalent organic group.
- the divalent organic group is a linear, branched or cyclic divalent aliphatic hydrocarbon group (for example, an alkylene group such as a methylene group, an ethylene group or a propylene group), a linear, branched or cyclic group.
- a divalent aromatic hydrocarbon group for example, a phenylene group or a combination thereof is preferable.
- the combined groups are ether group (—O—), ester group (—COO—), amide group (—CONR 222 —), urethane group (—NHCOO—), urea group (—NH—CO—NH—). It may be a group combined through The definition of RL is as described above.
- Specific examples of L 2 include a methylene group, an ethylene group, a propylene group, a butylene group, a phenylene group, and a group in which these groups are substituted with a methoxy group, a hydroxyl group, a chlorine atom, a bromine atom, a fluorine atom, or the like. Furthermore, the group etc. which combined these are mentioned.
- L 3 represents a single bond, —CO 2 —, —CO—, —O—CO—O—, —SO 3 —, —CONR L —, —NHCOO—, —O—, —S—, —SO 2 NR L —, or —NR L — is represented.
- the definition of RL is as described above.
- * 1 represents a bonding position with the carbon atom to which R 1 in the general formula (1) is bonded.
- * 2 represents a bonding position with Ar 1 in the general formula (1). That is, when L in the general formula (1) is a divalent linking group represented by the general formula (L), the general formula (1) is represented by the following general formula (1a).
- Ar 1 represents an arylene group or a heteroarylene group which may have a substituent (for example, a substituent W described later).
- the arylene group is not particularly limited, but an arylene group having 6 to 30 carbon atoms is preferable, and an arylene group having 6 to 20 carbon atoms is more preferable.
- Specific examples of the ring constituting the arylene group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorene ring, a triphenylene ring, a pyrene ring, a naphthacene ring, and a biphenyl ring.
- the heteroarylene group is not particularly limited, but a heteroarylene group comprising a 5-membered, 6-membered or 7-membered ring or a condensed ring thereof, or a heteroarylene group comprising a condensed ring of the above-mentioned arylene group and heteroarylene is preferred.
- the hetero atom contained in the heteroarylene group include an oxygen atom, a sulfur atom, and a nitrogen atom.
- ring constituting the heteroarylene group examples include furan ring, thiophene ring, pyrrole ring, oxazole ring, isoxazole ring, oxadiazole ring, thiazole ring, isothiazole ring, thiadiazole ring, imidazole ring, pyrazole ring, Triazole ring, furazane ring, tetrazole ring, pyridine ring, pyridazine ring, pyrimidine ring, pyrazine ring, triazine ring, tetrazine ring, benzofuran ring, isobenzofuran ring, benzothiophene ring, indole ring, indoline ring, isoindole ring, benzoxazole Ring, benzothiazole ring, indazole ring, benzimidazole ring, quinoline ring, isoquinoline ring,
- Ar 1 is preferably a divalent polycyclic aromatic hydrocarbon group or a divalent polycyclic aromatic heterocyclic group which may have a substituent (for example, a substituent W described later). It is more preferably a valent polycyclic aromatic hydrocarbon group.
- a divalent polycyclic aromatic hydrocarbon group is a divalent group of a polycyclic aromatic hydrocarbon ring (a divalent group formed by removing two hydrogen atoms from a polycyclic aromatic hydrocarbon ring. Group). Definitions, specific examples and preferred embodiments of the polycyclic aromatic hydrocarbon ring are as described below.
- a divalent polycyclic aromatic heterocyclic group is a divalent group of a polycyclic aromatic heterocyclic ring (a divalent group formed by removing two hydrogen atoms from a polycyclic aromatic heterocyclic ring). is there.
- the definition, specific examples and preferred embodiments of the polycyclic aromatic heterocycle are as described below.
- Ar 2 represents an aryl group or a heteroaryl group which may have a substituent (for example, a substituent W described later).
- the aryl group is not particularly limited, but is preferably an aryl group having 6 to 30 carbon atoms, and more preferably an aryl group having 6 to 20 carbon atoms. Specific examples of the ring constituting the aryl group are the same as those in the case where Ar 1 is an arylene group.
- the heteroaryl group is not particularly limited, but a heteroaryl group composed of a 5-membered, 6-membered or 7-membered ring or a condensed ring thereof is preferable.
- Ar 2 is preferably a monovalent polycyclic aromatic hydrocarbon group or monovalent polycyclic aromatic heterocyclic group which may have a substituent (for example, substituent W described later). It is more preferably a valent polycyclic aromatic hydrocarbon group.
- the monovalent polycyclic aromatic hydrocarbon group is a monovalent group of a polycyclic aromatic hydrocarbon ring (a monovalent group formed by removing one hydrogen atom from a polycyclic aromatic hydrocarbon ring). Group). Definitions, specific examples and preferred embodiments of the polycyclic aromatic hydrocarbon ring are as described below.
- a monovalent polycyclic aromatic heterocyclic group is a monovalent group of a polycyclic aromatic heterocyclic ring (a monovalent group formed by removing one hydrogen atom from a polycyclic aromatic heterocyclic ring). is there.
- the definition, specific examples and preferred embodiments of the polycyclic aromatic heterocycle are as described below.
- Ar 3 and Ar 4 each independently represent an aryl ring or a heteroaryl ring which may have a substituent (for example, a substituent W described later).
- a substituent for example, a substituent W described later.
- Specific examples and preferred embodiments of the aryl ring are the same as those in the case where Ar 2 is an aryl group.
- Specific examples and preferred embodiments of the heteroaryl ring are the same as those in the case where Ar 2 is a heteroaryl group.
- Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring or a polycyclic aromatic heterocycle which may have a substituent (for example, substituent W described later).
- the polycyclic aromatic hydrocarbon ring is an aromatic hydrocarbon ring having two or more rings, more specifically, two or more monocyclic aromatic hydrocarbon rings (benzene rings). It is a condensed ring having. Among these, a ring in which two or more monocyclic aromatic hydrocarbon rings are condensed is preferable.
- polycyclic aromatic hydrocarbon ring examples include naphthalene ring, anthracene ring, phenanthrene ring, fluorene ring, acenaphthylene ring, chrysene ring, fluoranthene ring, pyrene ring, triphenylene ring, tetracene ring, benzopyrene ring, picene ring, perylene Ring, pentacene ring, hexacene ring, heptacene ring, coronene ring and the like.
- a naphthalene ring is preferable.
- the polycyclic aromatic heterocyclic ring is an aromatic heterocyclic ring having two or more rings, more specifically, having two or more rings and one or more monocyclic aromatic rings.
- a condensed ring having a heterocyclic ring is preferable. .
- polycyclic aromatic heterocycle examples include an acridine ring, a benzoquinoline ring, a carbazole ring, a phenazine ring, a phenanthridine ring, a phenanthroline ring, a carboline ring, a cyclazine ring, a quindrine ring, a tepenidine ring, a quinindrin ring, and a triphenodi.
- the monocyclic heterocyclic ring constituting the polycyclic aromatic heterocyclic ring is not particularly limited, and specific examples thereof include a monocyclic ring among the specific examples of the ring constituting the heteroarylene group when Ar 1 is a heteroarylene group. Can be mentioned.
- At least one of Ar 3 and Ar 4 is preferably a polycyclic aromatic hydrocarbon ring which may have a substituent (for example, a substituent W described later). Further, one of Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring or polycyclic aromatic heterocycle which may have a substituent (for example, substituent W described later), and the other is a substituent ( For example, a monocyclic aromatic hydrocarbon ring or monocyclic aromatic heterocyclic ring which may have a substituent W) described later is preferable. Among them, one of Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring which may have a substituent (for example, substituent W described later), and the other is a substituent (for example, a substituent described later). It is more preferable that it is a monocyclic aromatic hydrocarbon ring which may have W).
- the substituent that Ar 1 to Ar 4 has is not particularly limited, but is preferably an aryl group or a heteroaryl group which may have a substituent (for example, substituent W described later), and is represented by the following formula (Z) It is more preferable that it is group represented by these.
- Z 1 represents an arylene group or a heteroarylene group. Of these, an arylene group is preferable.
- Z 2 represents an aryl group or a heteroaryl group. Of these, a heteroaryl group is preferable.
- Specific examples of the ring constituting the arylene group and aryl group are the same as those of Ar 1 to Ar 4 described above. Of these, a benzene ring is preferred.
- ring constituting the heteroarylene group and heteroaryl group examples include furan ring, thiophene ring, pyrrole ring, oxazole ring, isoxazole ring, oxadiazole ring, thiazole ring, isothiazole ring, thiadiazole ring, imidazole.
- the molecular weight of the partial structure represented by the following general formula (a) in the general formula (1) is not particularly limited, but is preferably 320 to 2000, more preferably 400 to 1500, and 500 to 1000. More preferably it is.
- the number of carbon atoms in the partial structure represented by the general formula (a) is not particularly limited, but is preferably 30 to 100, and more preferably 40 to 70.
- a preferred embodiment of the compound of the present invention includes, for example, a compound represented by the following general formula (1b).
- each R independently represents a hydrogen atom or a substituent (for example, a substituent W described later).
- group represented by the general formula (Z) mentioned above is preferable.
- p and q are integers different from each other because the solubility of the compound represented by the general formula (1b) is more excellent.
- q is preferably an integer greater than p.
- the compound of the present invention exhibits the desired effect is not clear, but is estimated as follows. That is, as shown in the general formula (1) described later, in the compound of the present invention, at least one of two rings (aryl ring or heteroaryl ring) condensed to a 5-membered ring is a polycyclic aromatic ring (polycyclic aromatic carbonization). A hydrogen ring or a polycyclic aromatic heterocycle). Therefore, the planarity of the whole molecule is low and the density of carbon atoms is high. As a result, the compounds of the present invention are believed to exhibit excellent solubility and high refractive index. These are because the solubility and refractive index are insufficient when both of the two rings condensed to a 5-membered ring are monocyclic benzene rings as shown in Comparative Examples described later. Also guessed.
- Substituent W It describes about the substituent W in this specification.
- substituent W include a halogen atom, an alkyl group (including a cycloalkyl group, a bicycloalkyl group, and a tricycloalkyl group), an alkenyl group (including a cycloalkenyl group and a bicycloalkenyl group), an alkynyl group, an aryl group, Heteroaryl group, cyano group, hydroxy group, nitro group, carboxy group, alkoxy group, aryloxy group, silyloxy group, heteroaryloxy group, acyloxy group, carbamoyloxy group, alkoxycarbonyloxy group, aryloxycarbonyloxy group, amino Groups (including anilino groups), ammonio groups, acylamino groups, aminocarbonylamino groups, alkoxycarbonylamino groups, aryloxycarbonylamino groups, sulfamoyl,
- the compound of the present invention can be synthesized by a known method or a combination of known methods. Although the specific example of the compound of this invention is shown below, it is not limited to these.
- the resin of the present invention has a repeating unit represented by the following general formula (2).
- R 1 in the above-mentioned general formula (1) L , Ar 1 , Ar 2 , Ar 3 and Ar 4 are the same.
- the resin of the present invention may have a repeating unit other than the repeating unit represented by the general formula (2).
- the ratio of the repeating unit represented by the general formula (2) to the entire repeating unit in the resin of the present invention is not particularly limited, but is preferably 30 mol% or more, more preferably 50 mol% or more, and 70 mol. % Or more is more preferable, and 90 mol% or more is particularly preferable.
- the upper limit is not particularly limited, but is 100 mol% (homopolymer).
- the molecular weight of the resin of the present invention is not particularly limited, but the weight average molecular weight (Mw) is preferably 1,000 to 100,000, and more preferably 1,000 to 30,000. In this specification, the weight average molecular weight is a polystyrene equivalent value measured by GPC (eluent: THF).
- a resin represented by the following general formula (2b) can be mentioned.
- R 1, L, the definition of Ar 1 and Ar 2 specific examples and preferred embodiments, respectively, R 1 in the formula (1) described above, L, Ar 1 and Ar 2 Is the same.
- the definitions, specific examples and preferred embodiments of R, p and q are the same as R, p and q in the general formula (1b).
- the method for synthesizing the resin of the present invention is not particularly limited, and a preferred embodiment includes a method of polymerizing the above-described compound of the present invention as a monomer.
- monomers other than the compound of this invention can be used as a copolymerization component. Such a monomer is not particularly limited.
- the composition of the present invention is a composition containing the above-described resin of the present invention.
- the composition of the present invention may contain other components as long as it is not contrary to the gist of the present invention.
- Such components include solvents, initiators, monomers, dispersants, plasticizers, heat stabilizers, mold release agents, and the like. Examples of these components include the contents after paragraph [0013] of JP 2012-251125 A (corresponding international publication 2012/153826) and JP 2012-255148 A (corresponding international publication 2012-2012). No. 157784), the contents of paragraph [0019] onward can be incorporated, and these contents are incorporated in the present specification.
- the content of the resin of the present invention in the composition of the present invention is not particularly limited, but is preferably 10 to 100% by mass, more preferably 20 to 90% by mass, and 30 to 90% by mass. More preferably.
- the use of the compound of the present invention, the resin of the present invention, and the composition containing the above resin is not particularly limited.
- lenses glasses lenses, lenses for digital cameras, Fresnel lenses) , Prism lenses, etc.
- optical overcoat agent hard coat agent
- antireflection film optical fiber
- optical waveguide LED sealing material
- LED flattening material micro-OLED substrate
- the compound of this invention is useful as a monomer for synthesize
- FIG. 1 is a cross-sectional view of one pixel of one embodiment of a micro OLED using the compound of the present invention as a base material for a color filter.
- the micro OLED 100 includes a substrate 10, an organic EL element 20, a protective film 30, a base layer 40, and color filters (red color filter: 50R, green color filter: 50G, blue color filter: 50B).
- the underlayer 40 is a layer formed using the compound of the present invention.
- the pitch (center-to-center distance) p of the organic EL element 20 is, for example, 30 ⁇ m or less, and preferably 1 to 5 ⁇ m. That is, the dimension of the organic EL element 20 is extremely small.
- the protective film 30 has a thickness of 0.5 to 10 ⁇ m, for example, and is made of, for example, silicon nitride.
- the method for forming the underlayer 40 is not particularly limited, and examples thereof include a method of applying and curing the compound of the present invention.
- the micro OLED 100 may include other members (for example, a reflector or the like). In the case where irregularities are generated on the surface of the protective film 30 due to the provision of a reflector or the like, the base layer 40 also functions as a planarizing layer. That is, the compound of the present invention is also useful as a leveling agent.
- step A-3 The specific synthesis scheme and synthesis method (steps A to D) for A-3 are shown below. Other compounds were synthesized by the same method.
- the Mw is a polystyrene equivalent value measured by GPC (solvent: THF).
- the GPC measurement conditions are shown below.
- ⁇ Main body HLC-8220GPC (Tosoh) Column: a guard column (HZ-L), TSK gel Super (HZM-M), TSK gel Super (HZ4000), TSK gel Super (HZ3000), TSK gel Super (HZ2000) connected Eluent: tetrahydrofuran Liquid feeding conditions: Sample pump 0.35 mL / min, reference pump 0.2 mL / min -Column temperature control: 40 ° C ⁇ Measurement sample: 0.1 wt% concentration (0.5 ⁇ m membrane filter filtration) ⁇ Injection amount: 10 ⁇ m ⁇ Measurement time: 26 minutes
- Examples 1, 3, 5 and 7 which are compounds represented by the general formula (1) described above and the general formulas described above are compared with the compounds of Comparative Example 1 which are known compounds.
- Examples 2, 4, 6 and 8, which are resins having a repeating unit represented by (2), exhibited excellent solubility and a high refractive index.
- 5 to 8 showed better solubility.
- Examples 5 to 8 in which Ar 1 in the general formula (1) or (2) is a divalent polycyclic aromatic hydrocarbon group showed a higher refractive index.
- the display device (micro OLED) of the above-described embodiment shown in FIG. 1 is prepared by using the compounds and homopolymers of the above-described examples and copolymers of each of the above-described compounds and methyl methacrylate for the underlayer of the color filter. Then, it was confirmed that the compounds and resins of the present invention are useful for display devices (micro OLED).
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Abstract
The purpose of the present invention is to provide: a compound and a resin that exhibit excellent dissolubility and a high refractive index; and a composition that includes said resin. This compound is a compound represented by general formula (1).
Description
本発明は、化合物、樹脂および組成物に関する。
The present invention relates to a compound, a resin and a composition.
従来、光学材料等に使用される化合物(例えば、モノマー)や樹脂に対して、溶解性や高い屈折率が求められている。
このようななか、特許文献1には、所定の式で表される単官能性のフルオレン化合物が開示されている(請求項1)。特許文献1によれば、上記フルオレン化合物は優れた光学的特性(高屈折率など)を付与できる原料として有用である旨が記載されている([0022]段落)。 Conventionally, solubility and high refractive index are required for compounds (eg, monomers) and resins used in optical materials and the like.
Under such circumstances,Patent Document 1 discloses a monofunctional fluorene compound represented by a predetermined formula (claim 1). According to Patent Document 1, it is described that the fluorene compound is useful as a raw material capable of imparting excellent optical properties (high refractive index and the like) (paragraph [0022]).
このようななか、特許文献1には、所定の式で表される単官能性のフルオレン化合物が開示されている(請求項1)。特許文献1によれば、上記フルオレン化合物は優れた光学的特性(高屈折率など)を付与できる原料として有用である旨が記載されている([0022]段落)。 Conventionally, solubility and high refractive index are required for compounds (eg, monomers) and resins used in optical materials and the like.
Under such circumstances,
近年、光学部品の高機能化や小型化などの要求に伴い、光学材料等に使用される化合物や樹脂に対して溶解性や屈折率のさらなる向上が求められている。
本発明者らは、特許文献1に記載の化合物について検討したところ、その溶解性や屈折率は必ずしも昨今求められているレベルに達しておらず、さらなる向上が必要であることを見出した。 2. Description of the Related Art In recent years, with the demand for higher functionality and miniaturization of optical components, further improvements in solubility and refractive index have been demanded for compounds and resins used for optical materials and the like.
The present inventors examined the compound described inPatent Document 1, and found that its solubility and refractive index did not necessarily reach the levels required recently, and further improvement is necessary.
本発明者らは、特許文献1に記載の化合物について検討したところ、その溶解性や屈折率は必ずしも昨今求められているレベルに達しておらず、さらなる向上が必要であることを見出した。 2. Description of the Related Art In recent years, with the demand for higher functionality and miniaturization of optical components, further improvements in solubility and refractive index have been demanded for compounds and resins used for optical materials and the like.
The present inventors examined the compound described in
そこで、本発明は、上記実情を鑑みて、優れた溶解性および高い屈折率を示す化合物および樹脂ならびに上記樹脂を含有する組成物を提供することを課題とする。
Therefore, in view of the above circumstances, an object of the present invention is to provide a compound and a resin that exhibit excellent solubility and a high refractive index, and a composition containing the resin.
本発明者らは、上記課題を解決するため鋭意検討した結果、特定の一般式で表される化合物および樹脂が優れた溶解性および高い屈折率を示すことを見出し、本発明を完成させた。すなわち、本発明者らは、以下の構成により上記課題が解決できることを見出した。
As a result of intensive studies to solve the above problems, the present inventors have found that compounds and resins represented by a specific general formula exhibit excellent solubility and a high refractive index, and have completed the present invention. That is, the present inventors have found that the above problem can be solved by the following configuration.
(1) 後述する一般式(1)で表される化合物。
(2) Ar3およびAr4の少なくとも一方が置換基を有していてもよい多環芳香族炭化水素環である、上記(1)に記載の化合物。
(3) 後述する一般式(2)で表される繰り返し単位を有する樹脂。
(4) 重量平均分子量が2,000~100,000である、上記(3)に記載の樹脂。
(5) 上記(3)または(4)に記載の樹脂を含有する組成物。 (1) A compound represented by the following general formula (1).
(2) The compound according to (1) above, wherein at least one of Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring which may have a substituent.
(3) Resin which has a repeating unit represented by General formula (2) mentioned later.
(4) The resin according to (3) above, having a weight average molecular weight of 2,000 to 100,000.
(5) A composition containing the resin according to (3) or (4).
(2) Ar3およびAr4の少なくとも一方が置換基を有していてもよい多環芳香族炭化水素環である、上記(1)に記載の化合物。
(3) 後述する一般式(2)で表される繰り返し単位を有する樹脂。
(4) 重量平均分子量が2,000~100,000である、上記(3)に記載の樹脂。
(5) 上記(3)または(4)に記載の樹脂を含有する組成物。 (1) A compound represented by the following general formula (1).
(2) The compound according to (1) above, wherein at least one of Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring which may have a substituent.
(3) Resin which has a repeating unit represented by General formula (2) mentioned later.
(4) The resin according to (3) above, having a weight average molecular weight of 2,000 to 100,000.
(5) A composition containing the resin according to (3) or (4).
以下に示すように、本発明によれば、優れた溶解性および高い屈折率を示す化合物および樹脂ならびに上記樹脂を含有する組成物を提供することができる。
As described below, according to the present invention, a compound and a resin exhibiting excellent solubility and a high refractive index, and a composition containing the above resin can be provided.
以下に、本発明の化合物および樹脂ならびに上記樹脂を含有する組成物について説明する。
なお、本明細書において、(メタ)アクリルとは、アクリルまたはメタクリルを表し、(メタ)アクリレートとは、アクリレートまたはメタクリレートを表す。
さらに、本明細書において「~」を用いて表される数値範囲は、「~」の前後に記載される数値を下限値および上限値として含む範囲を意味する。 Below, the compound and resin of this invention and the composition containing the said resin are demonstrated.
In the present specification, (meth) acryl represents acryl or methacryl, and (meth) acrylate represents acrylate or methacrylate.
Furthermore, a numerical range expressed using “to” in this specification means a range including numerical values described before and after “to” as a lower limit value and an upper limit value.
なお、本明細書において、(メタ)アクリルとは、アクリルまたはメタクリルを表し、(メタ)アクリレートとは、アクリレートまたはメタクリレートを表す。
さらに、本明細書において「~」を用いて表される数値範囲は、「~」の前後に記載される数値を下限値および上限値として含む範囲を意味する。 Below, the compound and resin of this invention and the composition containing the said resin are demonstrated.
In the present specification, (meth) acryl represents acryl or methacryl, and (meth) acrylate represents acrylate or methacrylate.
Furthermore, a numerical range expressed using “to” in this specification means a range including numerical values described before and after “to” as a lower limit value and an upper limit value.
[化合物]
本発明の化合物は、下記一般式(1)で表される。 [Compound]
The compound of the present invention is represented by the following general formula (1).
本発明の化合物は、下記一般式(1)で表される。 [Compound]
The compound of the present invention is represented by the following general formula (1).
上記一般式(1)中、R1は水素原子またはアルキル基を表す。アルキル基の炭素数は特に制限されないが、1~10であることが好ましい。アルキル基は直鎖状であっても分岐状であってもよい。
In the general formula (1), R 1 represents a hydrogen atom or an alkyl group. The number of carbon atoms of the alkyl group is not particularly limited, but is preferably 1 to 10. The alkyl group may be linear or branched.
上記一般式(1)中、Lは2価の連結基を表す。2価の連結基は特に制限されないが、例えば、直鎖状、分岐状若しくは環状の2価の脂肪族炭化水素基(例えば、メチレン基、エチレン基、プロピレン基などのアルキレン基)、2価の芳香族炭化水素基(例えば、フェニレン基)、-O-、-S-、-SO2-、-NRL-、-CO-、-NH-、-COO-、-CONRL-、-O-CO-O-、-SO3-、-NHCOO-、-SO2NRL-、-NH-CO-NH-、単結合またはこれらを2種以上組み合わせた基(例えば、アルキレンオキシ基、アルキレンオキシカルボニル基、アルキレンカルボニルオキシ基など)などが挙げられる。ここで、RLは、水素原子またはアルキル基(好ましくは炭素数1~10)を表す。
In the general formula (1), L represents a divalent linking group. The divalent linking group is not particularly limited. For example, a linear, branched or cyclic divalent aliphatic hydrocarbon group (for example, an alkylene group such as a methylene group, an ethylene group, or a propylene group), a divalent group Aromatic hydrocarbon group (for example, phenylene group), —O—, —S—, —SO 2 —, —NR L —, —CO—, —NH—, —COO—, —CONR L —, —O— CO—O—, —SO 3 —, —NHCOO—, —SO 2 NR L —, —NH—CO—NH—, a single bond or a group combining two or more of these (eg, alkyleneoxy group, alkyleneoxycarbonyl Group, alkylenecarbonyloxy group, etc.). Here, R L represents a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms).
Lの好適な態様としては、例えば、下記一般式(L)で表される2価の連結基が挙げられる。
As a suitable aspect of L, the bivalent coupling group represented by the following general formula (L) is mentioned, for example.
上記一般式(L)中、L1は、単結合、エステル基(-COO-)、アミド基(-CONRL-)またはエーテル基(-O-)を表す。RLの定義は上述のとおりである。
上記一般式(L)中、L2は、単結合または2価の有機基を表す。2価の有機基は、直鎖状、分岐状若しくは環状の2価の脂肪族炭化水素基(例えば、メチレン基、エチレン基、プロピレン基などのアルキレン基)、直鎖状、分岐状若しくは環状の2価の芳香族炭化水素基(例えば、フェニレン基)、または、これらを組み合わせた基であることが好ましい。上記組み合わせた基は、エーテル基(-O-)、エステル基(-COO-)、アミド基(-CONR222-)、ウレタン基(-NHCOO-)、ウレア基(-NH-CO-NH-)を介して組み合わせた基であってもよい。RLの定義は上述のとおりである。L2の具体例としては、メチレン基、エチレン基、プロピレン基、ブチレン基、フェニレン基、および、これらの基が、メトキシ基、ヒドロキシル基、塩素原子、臭素原子、フッ素原子等で置換されたもの、さらには、これらを組み合わせた基などが挙げられる。
上記一般式(L)中、L3は、単結合、-CO2-、-CO-、-O-CO-O-、-SO3-、-CONRL-、-NHCOO-、-O-、-S-、-SO2NRL-、または、-NRL-を表す。RLの定義は上述のとおりである。 In the general formula (L), L 1 represents a single bond, an ester group (—COO—), an amide group (—CONR L —) or an ether group (—O—). The definition of RL is as described above.
In the general formula (L), L 2 represents a single bond or a divalent organic group. The divalent organic group is a linear, branched or cyclic divalent aliphatic hydrocarbon group (for example, an alkylene group such as a methylene group, an ethylene group or a propylene group), a linear, branched or cyclic group. A divalent aromatic hydrocarbon group (for example, a phenylene group) or a combination thereof is preferable. The combined groups are ether group (—O—), ester group (—COO—), amide group (—CONR 222 —), urethane group (—NHCOO—), urea group (—NH—CO—NH—). It may be a group combined through The definition of RL is as described above. Specific examples of L 2 include a methylene group, an ethylene group, a propylene group, a butylene group, a phenylene group, and a group in which these groups are substituted with a methoxy group, a hydroxyl group, a chlorine atom, a bromine atom, a fluorine atom, or the like. Furthermore, the group etc. which combined these are mentioned.
In the general formula (L), L 3 represents a single bond, —CO 2 —, —CO—, —O—CO—O—, —SO 3 —, —CONR L —, —NHCOO—, —O—, —S—, —SO 2 NR L —, or —NR L — is represented. The definition of RL is as described above.
上記一般式(L)中、L2は、単結合または2価の有機基を表す。2価の有機基は、直鎖状、分岐状若しくは環状の2価の脂肪族炭化水素基(例えば、メチレン基、エチレン基、プロピレン基などのアルキレン基)、直鎖状、分岐状若しくは環状の2価の芳香族炭化水素基(例えば、フェニレン基)、または、これらを組み合わせた基であることが好ましい。上記組み合わせた基は、エーテル基(-O-)、エステル基(-COO-)、アミド基(-CONR222-)、ウレタン基(-NHCOO-)、ウレア基(-NH-CO-NH-)を介して組み合わせた基であってもよい。RLの定義は上述のとおりである。L2の具体例としては、メチレン基、エチレン基、プロピレン基、ブチレン基、フェニレン基、および、これらの基が、メトキシ基、ヒドロキシル基、塩素原子、臭素原子、フッ素原子等で置換されたもの、さらには、これらを組み合わせた基などが挙げられる。
上記一般式(L)中、L3は、単結合、-CO2-、-CO-、-O-CO-O-、-SO3-、-CONRL-、-NHCOO-、-O-、-S-、-SO2NRL-、または、-NRL-を表す。RLの定義は上述のとおりである。 In the general formula (L), L 1 represents a single bond, an ester group (—COO—), an amide group (—CONR L —) or an ether group (—O—). The definition of RL is as described above.
In the general formula (L), L 2 represents a single bond or a divalent organic group. The divalent organic group is a linear, branched or cyclic divalent aliphatic hydrocarbon group (for example, an alkylene group such as a methylene group, an ethylene group or a propylene group), a linear, branched or cyclic group. A divalent aromatic hydrocarbon group (for example, a phenylene group) or a combination thereof is preferable. The combined groups are ether group (—O—), ester group (—COO—), amide group (—CONR 222 —), urethane group (—NHCOO—), urea group (—NH—CO—NH—). It may be a group combined through The definition of RL is as described above. Specific examples of L 2 include a methylene group, an ethylene group, a propylene group, a butylene group, a phenylene group, and a group in which these groups are substituted with a methoxy group, a hydroxyl group, a chlorine atom, a bromine atom, a fluorine atom, or the like. Furthermore, the group etc. which combined these are mentioned.
In the general formula (L), L 3 represents a single bond, —CO 2 —, —CO—, —O—CO—O—, —SO 3 —, —CONR L —, —NHCOO—, —O—, —S—, —SO 2 NR L —, or —NR L — is represented. The definition of RL is as described above.
上記一般式(L)中、*1は、一般式(1)中のR1が結合する炭素原子との結合位置を表す。
また、上記一般式(L)中、*2は、一般式(1)中のAr1との結合位置を表す。
すなわち、一般式(1)中のLが一般式(L)で表される2価の連結基である場合、一般式(1)は下記一般式(1a)で表される。 In the general formula (L), * 1 represents a bonding position with the carbon atom to which R 1 in the general formula (1) is bonded.
In the general formula (L), * 2 represents a bonding position with Ar 1 in the general formula (1).
That is, when L in the general formula (1) is a divalent linking group represented by the general formula (L), the general formula (1) is represented by the following general formula (1a).
また、上記一般式(L)中、*2は、一般式(1)中のAr1との結合位置を表す。
すなわち、一般式(1)中のLが一般式(L)で表される2価の連結基である場合、一般式(1)は下記一般式(1a)で表される。 In the general formula (L), * 1 represents a bonding position with the carbon atom to which R 1 in the general formula (1) is bonded.
In the general formula (L), * 2 represents a bonding position with Ar 1 in the general formula (1).
That is, when L in the general formula (1) is a divalent linking group represented by the general formula (L), the general formula (1) is represented by the following general formula (1a).
上記一般式(1)中、Ar1は、置換基(例えば、後述する置換基W)を有していてもよいアリーレン基またはヘテロアリーレン基を表す。
上記アリーレン基は特に制限されないが、炭素数6~30のアリーレン基が好ましく、炭素数6~20のアリーレン基がより好ましい。アリーレン基を構成する環の具体例としては、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、フルオレン環、トリフェニレン環、ピレン環、ナフタセン環、ビフェニル環(2個のフェニル基は任意の連結様式で連結してもよい)、ターフェニル基(3個のフェニル基は任意の連結様式で連結してもよい)などが挙げられる。
上記ヘテロアリーレン基は特に制限されないが、5員、6員もしくは7員の環またはその縮合環からなるヘテロアリーレン基、上述のアリーレン基とヘテロアリーレンの縮合環からなるヘテロアリーレン基が好ましい。ヘテロアリーレン基に含まれるヘテロ原子としては、酸素原子、硫黄原子、窒素原子など挙げられる。ヘテロアリーレン基を構成する環の具体例としては、フラン環、チオフェン環、ピロール環、オキサゾール環、イソオキサゾール環、オキサジアゾール環、チアゾール環、イソチアゾール環、チアジアゾール環、イミダゾール環、ピラゾール環、トリアゾール環、フラザン環、テトラゾール環、ピリジン環、ピリダジン環、ピリミジン環、ピラジン環、トリアジン環、テトラジン環、ベンゾフラン環、イソベンゾフラン環、ベンゾチオフェン環、インドール環、インドリン環、イソインドール環、ベンゾオキサゾール環、ベンゾチアゾール環、インダゾール環、ベンゾイミダゾール環、キノリン環、イソキノリン環、シンノリン環、フタラジン環、キナゾリン環、キノキサリン環、ジベンゾフラン環、ジベンゾチオフェン環、カルバゾール環、アクリジン環、フェナントリジン環、フェナントロリン環、フェナジン環、ナフチリジン環、プリン環、プテリジン環などが挙げられる。
Ar1は、置換基(例えば、後述する置換基W)を有していてもよい2価の多環芳香族炭化水素基または2価の多環芳香族複素環基であることが好ましく、2価の多環芳香族炭化水素基であることがより好ましい。ここで、2価の多環芳香族炭化水素基とは多環芳香族炭化水素環の2価の基(多環芳香族炭化水素環から2つの水素原子を取り除くことで形成される2価の基)である。多環芳香族炭化水素環の定義、具体例および好適な態様は後述のとおりである。また、2価の多環芳香族複素環基とは多環芳香族複素環の2価の基(多環芳香族複素環から2つの水素原子を取り除くことで形成される2価の基)である。多環芳香族複素環の定義、具体例および好適な態様は後述のとおりである。 In the general formula (1), Ar 1 represents an arylene group or a heteroarylene group which may have a substituent (for example, a substituent W described later).
The arylene group is not particularly limited, but an arylene group having 6 to 30 carbon atoms is preferable, and an arylene group having 6 to 20 carbon atoms is more preferable. Specific examples of the ring constituting the arylene group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorene ring, a triphenylene ring, a pyrene ring, a naphthacene ring, and a biphenyl ring. And a terphenyl group (three phenyl groups may be connected in an arbitrary connection manner).
The heteroarylene group is not particularly limited, but a heteroarylene group comprising a 5-membered, 6-membered or 7-membered ring or a condensed ring thereof, or a heteroarylene group comprising a condensed ring of the above-mentioned arylene group and heteroarylene is preferred. Examples of the hetero atom contained in the heteroarylene group include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the ring constituting the heteroarylene group include furan ring, thiophene ring, pyrrole ring, oxazole ring, isoxazole ring, oxadiazole ring, thiazole ring, isothiazole ring, thiadiazole ring, imidazole ring, pyrazole ring, Triazole ring, furazane ring, tetrazole ring, pyridine ring, pyridazine ring, pyrimidine ring, pyrazine ring, triazine ring, tetrazine ring, benzofuran ring, isobenzofuran ring, benzothiophene ring, indole ring, indoline ring, isoindole ring, benzoxazole Ring, benzothiazole ring, indazole ring, benzimidazole ring, quinoline ring, isoquinoline ring, cinnoline ring, phthalazine ring, quinazoline ring, quinoxaline ring, dibenzofuran ring, dibenzothiophene ring, carbazole ring Acridine ring, phenanthridine ring, phenanthroline ring, phenazine ring, naphthyridine ring, purine ring and pteridine ring.
Ar 1 is preferably a divalent polycyclic aromatic hydrocarbon group or a divalent polycyclic aromatic heterocyclic group which may have a substituent (for example, a substituent W described later). It is more preferably a valent polycyclic aromatic hydrocarbon group. Here, a divalent polycyclic aromatic hydrocarbon group is a divalent group of a polycyclic aromatic hydrocarbon ring (a divalent group formed by removing two hydrogen atoms from a polycyclic aromatic hydrocarbon ring. Group). Definitions, specific examples and preferred embodiments of the polycyclic aromatic hydrocarbon ring are as described below. A divalent polycyclic aromatic heterocyclic group is a divalent group of a polycyclic aromatic heterocyclic ring (a divalent group formed by removing two hydrogen atoms from a polycyclic aromatic heterocyclic ring). is there. The definition, specific examples and preferred embodiments of the polycyclic aromatic heterocycle are as described below.
上記アリーレン基は特に制限されないが、炭素数6~30のアリーレン基が好ましく、炭素数6~20のアリーレン基がより好ましい。アリーレン基を構成する環の具体例としては、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、フルオレン環、トリフェニレン環、ピレン環、ナフタセン環、ビフェニル環(2個のフェニル基は任意の連結様式で連結してもよい)、ターフェニル基(3個のフェニル基は任意の連結様式で連結してもよい)などが挙げられる。
上記ヘテロアリーレン基は特に制限されないが、5員、6員もしくは7員の環またはその縮合環からなるヘテロアリーレン基、上述のアリーレン基とヘテロアリーレンの縮合環からなるヘテロアリーレン基が好ましい。ヘテロアリーレン基に含まれるヘテロ原子としては、酸素原子、硫黄原子、窒素原子など挙げられる。ヘテロアリーレン基を構成する環の具体例としては、フラン環、チオフェン環、ピロール環、オキサゾール環、イソオキサゾール環、オキサジアゾール環、チアゾール環、イソチアゾール環、チアジアゾール環、イミダゾール環、ピラゾール環、トリアゾール環、フラザン環、テトラゾール環、ピリジン環、ピリダジン環、ピリミジン環、ピラジン環、トリアジン環、テトラジン環、ベンゾフラン環、イソベンゾフラン環、ベンゾチオフェン環、インドール環、インドリン環、イソインドール環、ベンゾオキサゾール環、ベンゾチアゾール環、インダゾール環、ベンゾイミダゾール環、キノリン環、イソキノリン環、シンノリン環、フタラジン環、キナゾリン環、キノキサリン環、ジベンゾフラン環、ジベンゾチオフェン環、カルバゾール環、アクリジン環、フェナントリジン環、フェナントロリン環、フェナジン環、ナフチリジン環、プリン環、プテリジン環などが挙げられる。
Ar1は、置換基(例えば、後述する置換基W)を有していてもよい2価の多環芳香族炭化水素基または2価の多環芳香族複素環基であることが好ましく、2価の多環芳香族炭化水素基であることがより好ましい。ここで、2価の多環芳香族炭化水素基とは多環芳香族炭化水素環の2価の基(多環芳香族炭化水素環から2つの水素原子を取り除くことで形成される2価の基)である。多環芳香族炭化水素環の定義、具体例および好適な態様は後述のとおりである。また、2価の多環芳香族複素環基とは多環芳香族複素環の2価の基(多環芳香族複素環から2つの水素原子を取り除くことで形成される2価の基)である。多環芳香族複素環の定義、具体例および好適な態様は後述のとおりである。 In the general formula (1), Ar 1 represents an arylene group or a heteroarylene group which may have a substituent (for example, a substituent W described later).
The arylene group is not particularly limited, but an arylene group having 6 to 30 carbon atoms is preferable, and an arylene group having 6 to 20 carbon atoms is more preferable. Specific examples of the ring constituting the arylene group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a fluorene ring, a triphenylene ring, a pyrene ring, a naphthacene ring, and a biphenyl ring. And a terphenyl group (three phenyl groups may be connected in an arbitrary connection manner).
The heteroarylene group is not particularly limited, but a heteroarylene group comprising a 5-membered, 6-membered or 7-membered ring or a condensed ring thereof, or a heteroarylene group comprising a condensed ring of the above-mentioned arylene group and heteroarylene is preferred. Examples of the hetero atom contained in the heteroarylene group include an oxygen atom, a sulfur atom, and a nitrogen atom. Specific examples of the ring constituting the heteroarylene group include furan ring, thiophene ring, pyrrole ring, oxazole ring, isoxazole ring, oxadiazole ring, thiazole ring, isothiazole ring, thiadiazole ring, imidazole ring, pyrazole ring, Triazole ring, furazane ring, tetrazole ring, pyridine ring, pyridazine ring, pyrimidine ring, pyrazine ring, triazine ring, tetrazine ring, benzofuran ring, isobenzofuran ring, benzothiophene ring, indole ring, indoline ring, isoindole ring, benzoxazole Ring, benzothiazole ring, indazole ring, benzimidazole ring, quinoline ring, isoquinoline ring, cinnoline ring, phthalazine ring, quinazoline ring, quinoxaline ring, dibenzofuran ring, dibenzothiophene ring, carbazole ring Acridine ring, phenanthridine ring, phenanthroline ring, phenazine ring, naphthyridine ring, purine ring and pteridine ring.
Ar 1 is preferably a divalent polycyclic aromatic hydrocarbon group or a divalent polycyclic aromatic heterocyclic group which may have a substituent (for example, a substituent W described later). It is more preferably a valent polycyclic aromatic hydrocarbon group. Here, a divalent polycyclic aromatic hydrocarbon group is a divalent group of a polycyclic aromatic hydrocarbon ring (a divalent group formed by removing two hydrogen atoms from a polycyclic aromatic hydrocarbon ring. Group). Definitions, specific examples and preferred embodiments of the polycyclic aromatic hydrocarbon ring are as described below. A divalent polycyclic aromatic heterocyclic group is a divalent group of a polycyclic aromatic heterocyclic ring (a divalent group formed by removing two hydrogen atoms from a polycyclic aromatic heterocyclic ring). is there. The definition, specific examples and preferred embodiments of the polycyclic aromatic heterocycle are as described below.
上記一般式(1)中、Ar2は、置換基(例えば、後述する置換基W)を有していてもよいアリール基またはヘテロアリール基を表す。
上記アリール基は特に制限されないが、炭素数6~30のアリール基が好ましく、炭素数6~20のアリール基がより好ましい。アリール基を構成する環の具体例は上記Ar1がアリーレン基である場合と同じである。
上記ヘテロアリール基は特に制限されないが、5員、6員もしくは7員の環またはその縮合環からなるヘテロアリール基が好ましい。ヘテロアリール基に含まれるヘテロ原子およびヘテロアリール基を構成する環の具体例は上記Ar1がヘテロアリーレン基である場合と同じである。
Ar2は、置換基(例えば、後述する置換基W)を有していてもよい1価の多環芳香族炭化水素基または1価の多環芳香族複素環基であることが好ましく、1価の多環芳香族炭化水素基であることがより好ましい。ここで、1価の多環芳香族炭化水素基とは多環芳香族炭化水素環の1価の基(多環芳香族炭化水素環から1つの水素原子を取り除くことで形成される1価の基)である。多環芳香族炭化水素環の定義、具体例および好適な態様は後述のとおりである。また、1価の多環芳香族複素環基とは多環芳香族複素環の1価の基(多環芳香族複素環から1つの水素原子を取り除くことで形成される1価の基)である。多環芳香族複素環の定義、具体例および好適な態様は後述のとおりである。 In the general formula (1), Ar 2 represents an aryl group or a heteroaryl group which may have a substituent (for example, a substituent W described later).
The aryl group is not particularly limited, but is preferably an aryl group having 6 to 30 carbon atoms, and more preferably an aryl group having 6 to 20 carbon atoms. Specific examples of the ring constituting the aryl group are the same as those in the case where Ar 1 is an arylene group.
The heteroaryl group is not particularly limited, but a heteroaryl group composed of a 5-membered, 6-membered or 7-membered ring or a condensed ring thereof is preferable. Specific examples of the hetero atom contained in the heteroaryl group and the ring constituting the heteroaryl group are the same as those in the case where Ar 1 is a heteroarylene group.
Ar 2 is preferably a monovalent polycyclic aromatic hydrocarbon group or monovalent polycyclic aromatic heterocyclic group which may have a substituent (for example, substituent W described later). It is more preferably a valent polycyclic aromatic hydrocarbon group. Here, the monovalent polycyclic aromatic hydrocarbon group is a monovalent group of a polycyclic aromatic hydrocarbon ring (a monovalent group formed by removing one hydrogen atom from a polycyclic aromatic hydrocarbon ring). Group). Definitions, specific examples and preferred embodiments of the polycyclic aromatic hydrocarbon ring are as described below. A monovalent polycyclic aromatic heterocyclic group is a monovalent group of a polycyclic aromatic heterocyclic ring (a monovalent group formed by removing one hydrogen atom from a polycyclic aromatic heterocyclic ring). is there. The definition, specific examples and preferred embodiments of the polycyclic aromatic heterocycle are as described below.
上記アリール基は特に制限されないが、炭素数6~30のアリール基が好ましく、炭素数6~20のアリール基がより好ましい。アリール基を構成する環の具体例は上記Ar1がアリーレン基である場合と同じである。
上記ヘテロアリール基は特に制限されないが、5員、6員もしくは7員の環またはその縮合環からなるヘテロアリール基が好ましい。ヘテロアリール基に含まれるヘテロ原子およびヘテロアリール基を構成する環の具体例は上記Ar1がヘテロアリーレン基である場合と同じである。
Ar2は、置換基(例えば、後述する置換基W)を有していてもよい1価の多環芳香族炭化水素基または1価の多環芳香族複素環基であることが好ましく、1価の多環芳香族炭化水素基であることがより好ましい。ここで、1価の多環芳香族炭化水素基とは多環芳香族炭化水素環の1価の基(多環芳香族炭化水素環から1つの水素原子を取り除くことで形成される1価の基)である。多環芳香族炭化水素環の定義、具体例および好適な態様は後述のとおりである。また、1価の多環芳香族複素環基とは多環芳香族複素環の1価の基(多環芳香族複素環から1つの水素原子を取り除くことで形成される1価の基)である。多環芳香族複素環の定義、具体例および好適な態様は後述のとおりである。 In the general formula (1), Ar 2 represents an aryl group or a heteroaryl group which may have a substituent (for example, a substituent W described later).
The aryl group is not particularly limited, but is preferably an aryl group having 6 to 30 carbon atoms, and more preferably an aryl group having 6 to 20 carbon atoms. Specific examples of the ring constituting the aryl group are the same as those in the case where Ar 1 is an arylene group.
The heteroaryl group is not particularly limited, but a heteroaryl group composed of a 5-membered, 6-membered or 7-membered ring or a condensed ring thereof is preferable. Specific examples of the hetero atom contained in the heteroaryl group and the ring constituting the heteroaryl group are the same as those in the case where Ar 1 is a heteroarylene group.
Ar 2 is preferably a monovalent polycyclic aromatic hydrocarbon group or monovalent polycyclic aromatic heterocyclic group which may have a substituent (for example, substituent W described later). It is more preferably a valent polycyclic aromatic hydrocarbon group. Here, the monovalent polycyclic aromatic hydrocarbon group is a monovalent group of a polycyclic aromatic hydrocarbon ring (a monovalent group formed by removing one hydrogen atom from a polycyclic aromatic hydrocarbon ring). Group). Definitions, specific examples and preferred embodiments of the polycyclic aromatic hydrocarbon ring are as described below. A monovalent polycyclic aromatic heterocyclic group is a monovalent group of a polycyclic aromatic heterocyclic ring (a monovalent group formed by removing one hydrogen atom from a polycyclic aromatic heterocyclic ring). is there. The definition, specific examples and preferred embodiments of the polycyclic aromatic heterocycle are as described below.
上記一般式(1)中、Ar3およびAr4は、それぞれ独立に置換基(例えば、後述する置換基W)を有していてもよいアリール環またはヘテロアリール環を表す。
上記アリール環の具体例および好適な態様は、上記Ar2がアリール基である場合と同じである。また、上記ヘテロアリール環の具体例および好適な態様は、上記Ar2がヘテロアリール基である場合と同じである。 In the general formula (1), Ar 3 and Ar 4 each independently represent an aryl ring or a heteroaryl ring which may have a substituent (for example, a substituent W described later).
Specific examples and preferred embodiments of the aryl ring are the same as those in the case where Ar 2 is an aryl group. Specific examples and preferred embodiments of the heteroaryl ring are the same as those in the case where Ar 2 is a heteroaryl group.
上記アリール環の具体例および好適な態様は、上記Ar2がアリール基である場合と同じである。また、上記ヘテロアリール環の具体例および好適な態様は、上記Ar2がヘテロアリール基である場合と同じである。 In the general formula (1), Ar 3 and Ar 4 each independently represent an aryl ring or a heteroaryl ring which may have a substituent (for example, a substituent W described later).
Specific examples and preferred embodiments of the aryl ring are the same as those in the case where Ar 2 is an aryl group. Specific examples and preferred embodiments of the heteroaryl ring are the same as those in the case where Ar 2 is a heteroaryl group.
ただし、Ar3およびAr4の少なくとも一方は置換基(例えば、後述する置換基W)を有していてもよい多環芳香族炭化水素環または多環芳香族複素環である。
ここで、多環芳香族炭化水素環とは、2個以上の環を有する芳香族炭化水素環であり、より具体的には、2個以上の単環芳香族炭化水素環(ベンゼン環)を有する縮合環である。なかでも、2個以上の単環芳香族炭化水素環同士が縮環した環であるのが好ましい。
多環芳香族炭化水素環の具体例としては、ナフタレン環、アントラセン環、フェナントレン環、フルオレン環、アセナフチレン環、クリセン環、フルオランテン環、ピレン環、トリフェニレン環、テトラセン環、ベンゾピレン環、ピセン環、ペリレン環、ペンタセン環、ヘキサセン環、ヘプタセン環、コロネン環などが挙げられる。なかでも、ナフタレン環が好ましい。
また、多環芳香族複素環とは、2個以上の環を有する芳香族複素環であり、より具体的には、2個以上の環を有し、かつ、1個以上の単環芳香族複素環を有する縮合環である。なかでも、1個以上の単環芳香族炭化水素環と1個以上の単環複素環とが縮環した環、または、2個以上の単環複素環が縮環した環であるのが好ましい。
多環芳香族複素環の具体例としては、アクリジン環、ベンゾキノリン環、カルバゾール環、フェナジン環、フェナントリジン環、フェナントロリン環、カルボリン環、サイクラジン環、キンドリン環、テペニジン環、キニンドリン環、トリフェノジチアジン環、トリフェノジオキサジン環、フェナントラジン環、アントラジン環、ペリミジン環、ジアザカルバゾール環(カルボリン環を構成する炭素原子の任意の1つが窒素原子で置き換わったものを表す)、フェナントロリン環、ジベンゾフラン環、ジベンゾチオフェン環、ナフトフラン環、ナフトチオフェン環、ベンゾジフラン環、ベンゾジチオフェン環、ナフトジフラン環、ナフトジチオフェン環、アントラフラン環、アントラジフラン環、アントラチオフェン環、アントラジチオフェン環、チアントレン環、フェノキサチイン環、チオファントレン環(ナフトチオフェン環)などが挙げられる。
多環芳香族複素環を構成する単環複素環は特に制限されないが、その具体例としては、上記Ar1がヘテロアリーレン基である場合のヘテロアリーレン基を構成する環の具体例のうち単環のものが挙げられる。例えば、フラン環、チオフェン環、ピロール環、オキサゾール環、イソオキサゾール環、オキサジアゾール環、チアゾール環、イソチアゾール環、チアジアゾール環、イミダゾール環、ピラゾール環、トリアゾール環、フラザン環、テトラゾール環、ピリジン環、ピリダジン環、ピリミジン環、ピラジン環、トリアジン環、テトラジン環などが挙げられる。 However, at least one of Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring or a polycyclic aromatic heterocycle which may have a substituent (for example, substituent W described later).
Here, the polycyclic aromatic hydrocarbon ring is an aromatic hydrocarbon ring having two or more rings, more specifically, two or more monocyclic aromatic hydrocarbon rings (benzene rings). It is a condensed ring having. Among these, a ring in which two or more monocyclic aromatic hydrocarbon rings are condensed is preferable.
Specific examples of the polycyclic aromatic hydrocarbon ring include naphthalene ring, anthracene ring, phenanthrene ring, fluorene ring, acenaphthylene ring, chrysene ring, fluoranthene ring, pyrene ring, triphenylene ring, tetracene ring, benzopyrene ring, picene ring, perylene Ring, pentacene ring, hexacene ring, heptacene ring, coronene ring and the like. Among these, a naphthalene ring is preferable.
The polycyclic aromatic heterocyclic ring is an aromatic heterocyclic ring having two or more rings, more specifically, having two or more rings and one or more monocyclic aromatic rings. A condensed ring having a heterocyclic ring. Among these, a ring in which one or more monocyclic aromatic hydrocarbon rings and one or more monocyclic heterocycles are condensed, or a ring in which two or more monocyclic heterocycles are condensed is preferable. .
Specific examples of the polycyclic aromatic heterocycle include an acridine ring, a benzoquinoline ring, a carbazole ring, a phenazine ring, a phenanthridine ring, a phenanthroline ring, a carboline ring, a cyclazine ring, a quindrine ring, a tepenidine ring, a quinindrin ring, and a triphenodi. A thiazine ring, a triphenodioxazine ring, a phenanthrazine ring, an anthrazine ring, a perimidine ring, a diazacarbazole ring (representing any one of carbon atoms constituting a carboline ring replaced by a nitrogen atom), a phenanthroline ring, Dibenzofuran ring, dibenzothiophene ring, naphthofuran ring, naphthothiophene ring, benzodifuran ring, benzodithiophene ring, naphthodifuran ring, naphthodithiophene ring, anthrafuran ring, anthradifuran ring, anthrathiophene ring, anthradithiophene ring Ring, thianthrene ring, phenoxathiin ring, thio fan train ring (naphthothiophene ring) and the like.
The monocyclic heterocyclic ring constituting the polycyclic aromatic heterocyclic ring is not particularly limited, and specific examples thereof include a monocyclic ring among the specific examples of the ring constituting the heteroarylene group when Ar 1 is a heteroarylene group. Can be mentioned. For example, furan ring, thiophene ring, pyrrole ring, oxazole ring, isoxazole ring, oxadiazole ring, thiazole ring, isothiazole ring, thiadiazole ring, imidazole ring, pyrazole ring, triazole ring, furazane ring, tetrazole ring, pyridine ring , Pyridazine ring, pyrimidine ring, pyrazine ring, triazine ring, tetrazine ring and the like.
ここで、多環芳香族炭化水素環とは、2個以上の環を有する芳香族炭化水素環であり、より具体的には、2個以上の単環芳香族炭化水素環(ベンゼン環)を有する縮合環である。なかでも、2個以上の単環芳香族炭化水素環同士が縮環した環であるのが好ましい。
多環芳香族炭化水素環の具体例としては、ナフタレン環、アントラセン環、フェナントレン環、フルオレン環、アセナフチレン環、クリセン環、フルオランテン環、ピレン環、トリフェニレン環、テトラセン環、ベンゾピレン環、ピセン環、ペリレン環、ペンタセン環、ヘキサセン環、ヘプタセン環、コロネン環などが挙げられる。なかでも、ナフタレン環が好ましい。
また、多環芳香族複素環とは、2個以上の環を有する芳香族複素環であり、より具体的には、2個以上の環を有し、かつ、1個以上の単環芳香族複素環を有する縮合環である。なかでも、1個以上の単環芳香族炭化水素環と1個以上の単環複素環とが縮環した環、または、2個以上の単環複素環が縮環した環であるのが好ましい。
多環芳香族複素環の具体例としては、アクリジン環、ベンゾキノリン環、カルバゾール環、フェナジン環、フェナントリジン環、フェナントロリン環、カルボリン環、サイクラジン環、キンドリン環、テペニジン環、キニンドリン環、トリフェノジチアジン環、トリフェノジオキサジン環、フェナントラジン環、アントラジン環、ペリミジン環、ジアザカルバゾール環(カルボリン環を構成する炭素原子の任意の1つが窒素原子で置き換わったものを表す)、フェナントロリン環、ジベンゾフラン環、ジベンゾチオフェン環、ナフトフラン環、ナフトチオフェン環、ベンゾジフラン環、ベンゾジチオフェン環、ナフトジフラン環、ナフトジチオフェン環、アントラフラン環、アントラジフラン環、アントラチオフェン環、アントラジチオフェン環、チアントレン環、フェノキサチイン環、チオファントレン環(ナフトチオフェン環)などが挙げられる。
多環芳香族複素環を構成する単環複素環は特に制限されないが、その具体例としては、上記Ar1がヘテロアリーレン基である場合のヘテロアリーレン基を構成する環の具体例のうち単環のものが挙げられる。例えば、フラン環、チオフェン環、ピロール環、オキサゾール環、イソオキサゾール環、オキサジアゾール環、チアゾール環、イソチアゾール環、チアジアゾール環、イミダゾール環、ピラゾール環、トリアゾール環、フラザン環、テトラゾール環、ピリジン環、ピリダジン環、ピリミジン環、ピラジン環、トリアジン環、テトラジン環などが挙げられる。 However, at least one of Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring or a polycyclic aromatic heterocycle which may have a substituent (for example, substituent W described later).
Here, the polycyclic aromatic hydrocarbon ring is an aromatic hydrocarbon ring having two or more rings, more specifically, two or more monocyclic aromatic hydrocarbon rings (benzene rings). It is a condensed ring having. Among these, a ring in which two or more monocyclic aromatic hydrocarbon rings are condensed is preferable.
Specific examples of the polycyclic aromatic hydrocarbon ring include naphthalene ring, anthracene ring, phenanthrene ring, fluorene ring, acenaphthylene ring, chrysene ring, fluoranthene ring, pyrene ring, triphenylene ring, tetracene ring, benzopyrene ring, picene ring, perylene Ring, pentacene ring, hexacene ring, heptacene ring, coronene ring and the like. Among these, a naphthalene ring is preferable.
The polycyclic aromatic heterocyclic ring is an aromatic heterocyclic ring having two or more rings, more specifically, having two or more rings and one or more monocyclic aromatic rings. A condensed ring having a heterocyclic ring. Among these, a ring in which one or more monocyclic aromatic hydrocarbon rings and one or more monocyclic heterocycles are condensed, or a ring in which two or more monocyclic heterocycles are condensed is preferable. .
Specific examples of the polycyclic aromatic heterocycle include an acridine ring, a benzoquinoline ring, a carbazole ring, a phenazine ring, a phenanthridine ring, a phenanthroline ring, a carboline ring, a cyclazine ring, a quindrine ring, a tepenidine ring, a quinindrin ring, and a triphenodi. A thiazine ring, a triphenodioxazine ring, a phenanthrazine ring, an anthrazine ring, a perimidine ring, a diazacarbazole ring (representing any one of carbon atoms constituting a carboline ring replaced by a nitrogen atom), a phenanthroline ring, Dibenzofuran ring, dibenzothiophene ring, naphthofuran ring, naphthothiophene ring, benzodifuran ring, benzodithiophene ring, naphthodifuran ring, naphthodithiophene ring, anthrafuran ring, anthradifuran ring, anthrathiophene ring, anthradithiophene ring Ring, thianthrene ring, phenoxathiin ring, thio fan train ring (naphthothiophene ring) and the like.
The monocyclic heterocyclic ring constituting the polycyclic aromatic heterocyclic ring is not particularly limited, and specific examples thereof include a monocyclic ring among the specific examples of the ring constituting the heteroarylene group when Ar 1 is a heteroarylene group. Can be mentioned. For example, furan ring, thiophene ring, pyrrole ring, oxazole ring, isoxazole ring, oxadiazole ring, thiazole ring, isothiazole ring, thiadiazole ring, imidazole ring, pyrazole ring, triazole ring, furazane ring, tetrazole ring, pyridine ring , Pyridazine ring, pyrimidine ring, pyrazine ring, triazine ring, tetrazine ring and the like.
Ar3およびAr4の少なくとも一方は置換基(例えば、後述する置換基W)を有していてもよい多環芳香族炭化水素環であるのが好ましい。
また、Ar3およびAr4の一方が置換基(例えば、後述する置換基W)を有していてもよい多環芳香族炭化水素環または多環芳香族複素環であり、他方が置換基(例えば、後述する置換基W)を有していてもよい単環芳香族炭化水素環または単環芳香族複素環であるのが好ましい。なかでも、Ar3およびAr4の一方が置換基(例えば、後述する置換基W)を有していてもよい多環芳香族炭化水素環であり、他方が置換基(例えば、後述する置換基W)を有していてもよい単環芳香族炭化水素環であるのがより好ましい。 At least one of Ar 3 and Ar 4 is preferably a polycyclic aromatic hydrocarbon ring which may have a substituent (for example, a substituent W described later).
Further, one of Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring or polycyclic aromatic heterocycle which may have a substituent (for example, substituent W described later), and the other is a substituent ( For example, a monocyclic aromatic hydrocarbon ring or monocyclic aromatic heterocyclic ring which may have a substituent W) described later is preferable. Among them, one of Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring which may have a substituent (for example, substituent W described later), and the other is a substituent (for example, a substituent described later). It is more preferable that it is a monocyclic aromatic hydrocarbon ring which may have W).
また、Ar3およびAr4の一方が置換基(例えば、後述する置換基W)を有していてもよい多環芳香族炭化水素環または多環芳香族複素環であり、他方が置換基(例えば、後述する置換基W)を有していてもよい単環芳香族炭化水素環または単環芳香族複素環であるのが好ましい。なかでも、Ar3およびAr4の一方が置換基(例えば、後述する置換基W)を有していてもよい多環芳香族炭化水素環であり、他方が置換基(例えば、後述する置換基W)を有していてもよい単環芳香族炭化水素環であるのがより好ましい。 At least one of Ar 3 and Ar 4 is preferably a polycyclic aromatic hydrocarbon ring which may have a substituent (for example, a substituent W described later).
Further, one of Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring or polycyclic aromatic heterocycle which may have a substituent (for example, substituent W described later), and the other is a substituent ( For example, a monocyclic aromatic hydrocarbon ring or monocyclic aromatic heterocyclic ring which may have a substituent W) described later is preferable. Among them, one of Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring which may have a substituent (for example, substituent W described later), and the other is a substituent (for example, a substituent described later). It is more preferable that it is a monocyclic aromatic hydrocarbon ring which may have W).
Ar1~Ar4が有する置換基は特に制限されないが、置換基(例えば、後述する置換基W)を有していてもよいアリール基またはヘテロアリール基であることが好ましく、下記式(Z)で表される基であることがより好ましい。
The substituent that Ar 1 to Ar 4 has is not particularly limited, but is preferably an aryl group or a heteroaryl group which may have a substituent (for example, substituent W described later), and is represented by the following formula (Z) It is more preferable that it is group represented by these.
上記一般式(Z)中、Z1は、アリーレン基またはヘテロアリーレン基を表す。なかでも、アリーレン基であることが好ましい。
上記一般式(Z)中、Z2は、アリール基またはヘテロアリール基を表す。なかでも、ヘテロアリール基であることが好ましい。
上記アリーレン基およびアリール基を構成する環の具体例は上述したAr1~Ar4と同じである。なかでも、ベンゼン環が好ましい。
上記ヘテロアリーレン基およびヘテロアリール基を構成する環の具体例としては、フラン環、チオフェン環、ピロール環、オキサゾール環、イソオキサゾール環、オキサジアゾール環、チアゾール環、イソチアゾール環、チアジアゾール環、イミダゾール環、ピラゾール環、トリアゾール環、フラザン環、テトラゾール環、ピリジン環、ピリダジン環、ピリミジン環、ピラジン環、トリアジン環、テトラジン環、ベンゾフラン環、イソベンゾフラン環、ベンゾチオフェン環、インドール環、インドリン環、イソインドール環、ベンゾオキサゾール環、ベンゾチアゾール環、インダゾール環、ベンゾイミダゾール環、キノリン環、イソキノリン環、シンノリン環、フタラジン環、キナゾリン環、キノキサリン環、ジベンゾフラン環、ジベンゾチオフェン環、カルバゾール環、アクリジン環、フェナントリジン環、フェナントロリン環、フェナジン環、ナフチリジン環、プリン環、プテリジン環などが挙げられる。なかでも、ベンゾチアゾール環が好ましい。
上記一般式(Z)中、*は結合位置を表す。 In the general formula (Z), Z 1 represents an arylene group or a heteroarylene group. Of these, an arylene group is preferable.
In the general formula (Z), Z 2 represents an aryl group or a heteroaryl group. Of these, a heteroaryl group is preferable.
Specific examples of the ring constituting the arylene group and aryl group are the same as those of Ar 1 to Ar 4 described above. Of these, a benzene ring is preferred.
Specific examples of the ring constituting the heteroarylene group and heteroaryl group include furan ring, thiophene ring, pyrrole ring, oxazole ring, isoxazole ring, oxadiazole ring, thiazole ring, isothiazole ring, thiadiazole ring, imidazole. Ring, pyrazole ring, triazole ring, furazane ring, tetrazole ring, pyridine ring, pyridazine ring, pyrimidine ring, pyrazine ring, triazine ring, tetrazine ring, benzofuran ring, isobenzofuran ring, benzothiophene ring, indole ring, indoline ring, iso Indole ring, benzoxazole ring, benzothiazole ring, indazole ring, benzimidazole ring, quinoline ring, isoquinoline ring, cinnoline ring, phthalazine ring, quinazoline ring, quinoxaline ring, dibenzofuran ring, dibenzothiol Fen ring, carbazole ring, acridine ring, phenanthridine ring, phenanthroline ring, phenazine ring, naphthyridine ring, purine ring and pteridine ring. Of these, a benzothiazole ring is preferable.
In the general formula (Z), * represents a bonding position.
上記一般式(Z)中、Z2は、アリール基またはヘテロアリール基を表す。なかでも、ヘテロアリール基であることが好ましい。
上記アリーレン基およびアリール基を構成する環の具体例は上述したAr1~Ar4と同じである。なかでも、ベンゼン環が好ましい。
上記ヘテロアリーレン基およびヘテロアリール基を構成する環の具体例としては、フラン環、チオフェン環、ピロール環、オキサゾール環、イソオキサゾール環、オキサジアゾール環、チアゾール環、イソチアゾール環、チアジアゾール環、イミダゾール環、ピラゾール環、トリアゾール環、フラザン環、テトラゾール環、ピリジン環、ピリダジン環、ピリミジン環、ピラジン環、トリアジン環、テトラジン環、ベンゾフラン環、イソベンゾフラン環、ベンゾチオフェン環、インドール環、インドリン環、イソインドール環、ベンゾオキサゾール環、ベンゾチアゾール環、インダゾール環、ベンゾイミダゾール環、キノリン環、イソキノリン環、シンノリン環、フタラジン環、キナゾリン環、キノキサリン環、ジベンゾフラン環、ジベンゾチオフェン環、カルバゾール環、アクリジン環、フェナントリジン環、フェナントロリン環、フェナジン環、ナフチリジン環、プリン環、プテリジン環などが挙げられる。なかでも、ベンゾチアゾール環が好ましい。
上記一般式(Z)中、*は結合位置を表す。 In the general formula (Z), Z 1 represents an arylene group or a heteroarylene group. Of these, an arylene group is preferable.
In the general formula (Z), Z 2 represents an aryl group or a heteroaryl group. Of these, a heteroaryl group is preferable.
Specific examples of the ring constituting the arylene group and aryl group are the same as those of Ar 1 to Ar 4 described above. Of these, a benzene ring is preferred.
Specific examples of the ring constituting the heteroarylene group and heteroaryl group include furan ring, thiophene ring, pyrrole ring, oxazole ring, isoxazole ring, oxadiazole ring, thiazole ring, isothiazole ring, thiadiazole ring, imidazole. Ring, pyrazole ring, triazole ring, furazane ring, tetrazole ring, pyridine ring, pyridazine ring, pyrimidine ring, pyrazine ring, triazine ring, tetrazine ring, benzofuran ring, isobenzofuran ring, benzothiophene ring, indole ring, indoline ring, iso Indole ring, benzoxazole ring, benzothiazole ring, indazole ring, benzimidazole ring, quinoline ring, isoquinoline ring, cinnoline ring, phthalazine ring, quinazoline ring, quinoxaline ring, dibenzofuran ring, dibenzothiol Fen ring, carbazole ring, acridine ring, phenanthridine ring, phenanthroline ring, phenazine ring, naphthyridine ring, purine ring and pteridine ring. Of these, a benzothiazole ring is preferable.
In the general formula (Z), * represents a bonding position.
一般式(1)中の下記一般式(a)で表される部分構造の分子量は特に制限されないが、320~2000であることが好ましく、400~1500であることがより好ましく、500~1000であることがさらに好ましい。
一般式(a)で表される部分構造の炭素数は特に制限されないが、30~100であることが好ましく、40~70であることがより好ましい。 The molecular weight of the partial structure represented by the following general formula (a) in the general formula (1) is not particularly limited, but is preferably 320 to 2000, more preferably 400 to 1500, and 500 to 1000. More preferably it is.
The number of carbon atoms in the partial structure represented by the general formula (a) is not particularly limited, but is preferably 30 to 100, and more preferably 40 to 70.
一般式(a)で表される部分構造の炭素数は特に制限されないが、30~100であることが好ましく、40~70であることがより好ましい。 The molecular weight of the partial structure represented by the following general formula (a) in the general formula (1) is not particularly limited, but is preferably 320 to 2000, more preferably 400 to 1500, and 500 to 1000. More preferably it is.
The number of carbon atoms in the partial structure represented by the general formula (a) is not particularly limited, but is preferably 30 to 100, and more preferably 40 to 70.
本発明の化合物の好適な態様としては、例えば、下記一般式(1b)で表される化合物が挙げられる。
A preferred embodiment of the compound of the present invention includes, for example, a compound represented by the following general formula (1b).
上記一般式(1b)中、R1、L、Ar1およびAr2の定義、具体例および好適な態様は、それぞれ、上述した一般式(1)中のR1、L、Ar1およびAr2と同じである。
上記一般式(1b)中、Rはそれぞれ独立に水素原子または置換基(例えば、後述する置換基W)を表す。なかでも、上述した一般式(Z)で表される基が好ましい。
上記一般式(1b)中、pおよびqはそれぞれ独立に0以上の整数を表す。ただし、pおよびqの少なくとも一方は1以上の整数である。pおよびqは0~3の整数であることが好ましく、0~2の整数であることがより好ましく、0または1であることがさらに好ましい。
なお、pおよびqは繋がっているベンゼン環の数を表す。例えば、p=0、q=1の場合の場合、一般式(1b)は下記一般式(1b-1)を表す。 In the general formula (1b), R 1, L, the definition of Ar 1 and Ar 2, specific examples and preferred embodiments, respectively, R 1 in the formula (1) described above, L, Ar 1 and Ar 2 Is the same.
In the general formula (1b), each R independently represents a hydrogen atom or a substituent (for example, a substituent W described later). Especially, group represented by the general formula (Z) mentioned above is preferable.
In the general formula (1b), p and q each independently represent an integer of 0 or more. However, at least one of p and q is an integer of 1 or more. p and q are preferably integers of 0 to 3, more preferably integers of 0 to 2, and even more preferably 0 or 1.
Note that p and q represent the number of connected benzene rings. For example, when p = 0 and q = 1, the general formula (1b) represents the following general formula (1b-1).
上記一般式(1b)中、Rはそれぞれ独立に水素原子または置換基(例えば、後述する置換基W)を表す。なかでも、上述した一般式(Z)で表される基が好ましい。
上記一般式(1b)中、pおよびqはそれぞれ独立に0以上の整数を表す。ただし、pおよびqの少なくとも一方は1以上の整数である。pおよびqは0~3の整数であることが好ましく、0~2の整数であることがより好ましく、0または1であることがさらに好ましい。
なお、pおよびqは繋がっているベンゼン環の数を表す。例えば、p=0、q=1の場合の場合、一般式(1b)は下記一般式(1b-1)を表す。 In the general formula (1b), R 1, L, the definition of Ar 1 and Ar 2, specific examples and preferred embodiments, respectively, R 1 in the formula (1) described above, L, Ar 1 and Ar 2 Is the same.
In the general formula (1b), each R independently represents a hydrogen atom or a substituent (for example, a substituent W described later). Especially, group represented by the general formula (Z) mentioned above is preferable.
In the general formula (1b), p and q each independently represent an integer of 0 or more. However, at least one of p and q is an integer of 1 or more. p and q are preferably integers of 0 to 3, more preferably integers of 0 to 2, and even more preferably 0 or 1.
Note that p and q represent the number of connected benzene rings. For example, when p = 0 and q = 1, the general formula (1b) represents the following general formula (1b-1).
一般式(1b)で表される化合物の溶解性がより優れる理由から、pおよびqは互いに異なる整数であることが好ましい。qはpより大きい整数であることが好ましい。
It is preferable that p and q are integers different from each other because the solubility of the compound represented by the general formula (1b) is more excellent. q is preferably an integer greater than p.
本発明の化合物が所望の効果を示す理由は明らかではないが、およそ以下のとおりと推測される。すなわち、後述する一般式(1)のとおり、本発明の化合物は5員環に縮環した2つの環(アリール環またはヘテロアリール環)の少なくとも一方が多環芳香族環(多環芳香族炭化水素環または多環芳香族複素環)である。そのため、分子全体の平面性が低く、また、炭素原子の密度が高い。結果として、本発明の化合物は優れた溶解性および高い屈折率を示すものと考えられる。これらのことは、後述する比較例が示すように、5員環に縮環した2つの環がいずれも単環であるベンゼン環である場合には溶解性および屈折率ともに不十分となることからも推測される。
The reason why the compound of the present invention exhibits the desired effect is not clear, but is estimated as follows. That is, as shown in the general formula (1) described later, in the compound of the present invention, at least one of two rings (aryl ring or heteroaryl ring) condensed to a 5-membered ring is a polycyclic aromatic ring (polycyclic aromatic carbonization). A hydrogen ring or a polycyclic aromatic heterocycle). Therefore, the planarity of the whole molecule is low and the density of carbon atoms is high. As a result, the compounds of the present invention are believed to exhibit excellent solubility and high refractive index. These are because the solubility and refractive index are insufficient when both of the two rings condensed to a 5-membered ring are monocyclic benzene rings as shown in Comparative Examples described later. Also guessed.
(置換基W)
本明細書における置換基Wについて記載する。
置換基Wとしては、例えば、ハロゲン原子、アルキル基(シクロアルキル基、ビシクロアルキル基、トリシクロアルキル基を含む)、アルケニル基(シクロアルケニル基、ビシクロアルケニル基を含む)、アルキニル基、アリール基、ヘテロアリール基、シアノ基、ヒドロキシ基、ニトロ基、カルボキシ基、アルコキシ基、アリールオキシ基、シリルオキシ基、ヘテロアリールオキシ基、アシルオキシ基、カルバモイルオキシ基、アルコキシカルボニルオキシ基、アリールオキシカルボニルオキシ基、アミノ基(アニリノ基を含む)、アンモニオ基、アシルアミノ基、アミノカルボニルアミノ基、アルコキシカルボニルアミノ基、アリールオキシカルボニルアミノ基、スルファモイルアミノ基、アルキルまたはアリールスルホニルアミノ基、メルカプト基、アルキルチオ基、アリールチオ基、ヘテロ環チオ基、スルファモイル基、スルホ基、アルキルまたはアリールスルフィニル基、アルキルまたはアリールスルホニル基、アシル基、アリールオキシカルボニル基、アルコキシカルボニル基、カルバモイル基、アリールまたはヘテロ環アゾ基、イミド基、ホスフィノ基、ホスフィニル基、ホスフィニルオキシ基、ホスフィニルアミノ基、ホスホノ基、シリル基、ヒドラジノ基、ウレイド基、ボロン酸基(-B(OH)2)、ホスファト基(-OPO(OH)2)、スルファト基(-OSO3H)、その他の公知の置換基などが挙げられる。 (Substituent W)
It describes about the substituent W in this specification.
Examples of the substituent W include a halogen atom, an alkyl group (including a cycloalkyl group, a bicycloalkyl group, and a tricycloalkyl group), an alkenyl group (including a cycloalkenyl group and a bicycloalkenyl group), an alkynyl group, an aryl group, Heteroaryl group, cyano group, hydroxy group, nitro group, carboxy group, alkoxy group, aryloxy group, silyloxy group, heteroaryloxy group, acyloxy group, carbamoyloxy group, alkoxycarbonyloxy group, aryloxycarbonyloxy group, amino Groups (including anilino groups), ammonio groups, acylamino groups, aminocarbonylamino groups, alkoxycarbonylamino groups, aryloxycarbonylamino groups, sulfamoylamino groups, alkyl or arylsulfonylamino groups, Lucapto group, alkylthio group, arylthio group, heterocyclic thio group, sulfamoyl group, sulfo group, alkyl or arylsulfinyl group, alkyl or arylsulfonyl group, acyl group, aryloxycarbonyl group, alkoxycarbonyl group, carbamoyl group, aryl or hetero Ring azo group, imide group, phosphino group, phosphinyl group, phosphinyloxy group, phosphinylamino group, phosphono group, silyl group, hydrazino group, ureido group, boronic acid group (-B (OH) 2 ), phosphato Examples thereof include a group (—OPO (OH) 2 ), a sulfato group (—OSO 3 H), and other known substituents.
本明細書における置換基Wについて記載する。
置換基Wとしては、例えば、ハロゲン原子、アルキル基(シクロアルキル基、ビシクロアルキル基、トリシクロアルキル基を含む)、アルケニル基(シクロアルケニル基、ビシクロアルケニル基を含む)、アルキニル基、アリール基、ヘテロアリール基、シアノ基、ヒドロキシ基、ニトロ基、カルボキシ基、アルコキシ基、アリールオキシ基、シリルオキシ基、ヘテロアリールオキシ基、アシルオキシ基、カルバモイルオキシ基、アルコキシカルボニルオキシ基、アリールオキシカルボニルオキシ基、アミノ基(アニリノ基を含む)、アンモニオ基、アシルアミノ基、アミノカルボニルアミノ基、アルコキシカルボニルアミノ基、アリールオキシカルボニルアミノ基、スルファモイルアミノ基、アルキルまたはアリールスルホニルアミノ基、メルカプト基、アルキルチオ基、アリールチオ基、ヘテロ環チオ基、スルファモイル基、スルホ基、アルキルまたはアリールスルフィニル基、アルキルまたはアリールスルホニル基、アシル基、アリールオキシカルボニル基、アルコキシカルボニル基、カルバモイル基、アリールまたはヘテロ環アゾ基、イミド基、ホスフィノ基、ホスフィニル基、ホスフィニルオキシ基、ホスフィニルアミノ基、ホスホノ基、シリル基、ヒドラジノ基、ウレイド基、ボロン酸基(-B(OH)2)、ホスファト基(-OPO(OH)2)、スルファト基(-OSO3H)、その他の公知の置換基などが挙げられる。 (Substituent W)
It describes about the substituent W in this specification.
Examples of the substituent W include a halogen atom, an alkyl group (including a cycloalkyl group, a bicycloalkyl group, and a tricycloalkyl group), an alkenyl group (including a cycloalkenyl group and a bicycloalkenyl group), an alkynyl group, an aryl group, Heteroaryl group, cyano group, hydroxy group, nitro group, carboxy group, alkoxy group, aryloxy group, silyloxy group, heteroaryloxy group, acyloxy group, carbamoyloxy group, alkoxycarbonyloxy group, aryloxycarbonyloxy group, amino Groups (including anilino groups), ammonio groups, acylamino groups, aminocarbonylamino groups, alkoxycarbonylamino groups, aryloxycarbonylamino groups, sulfamoylamino groups, alkyl or arylsulfonylamino groups, Lucapto group, alkylthio group, arylthio group, heterocyclic thio group, sulfamoyl group, sulfo group, alkyl or arylsulfinyl group, alkyl or arylsulfonyl group, acyl group, aryloxycarbonyl group, alkoxycarbonyl group, carbamoyl group, aryl or hetero Ring azo group, imide group, phosphino group, phosphinyl group, phosphinyloxy group, phosphinylamino group, phosphono group, silyl group, hydrazino group, ureido group, boronic acid group (-B (OH) 2 ), phosphato Examples thereof include a group (—OPO (OH) 2 ), a sulfato group (—OSO 3 H), and other known substituents.
本発明の化合物は公知の方法または公知の方法を組み合わせることにより合成することができる。以下に本発明の化合物の具体例を示すが、これらに限定されるものではない。
The compound of the present invention can be synthesized by a known method or a combination of known methods. Although the specific example of the compound of this invention is shown below, it is not limited to these.
[樹脂]
本発明の樹脂は、下記一般式(2)で表される繰り返し単位を有する。 [resin]
The resin of the present invention has a repeating unit represented by the following general formula (2).
本発明の樹脂は、下記一般式(2)で表される繰り返し単位を有する。 [resin]
The resin of the present invention has a repeating unit represented by the following general formula (2).
上記一般式(2)中、R1、L、Ar1、Ar2、Ar3およびAr4の定義、具体例および好適な態様は、それぞれ、上述した一般式(1)中のR1、L、Ar1、Ar2、Ar3およびAr4と同じである。
In the general formula (2), R 1, L , Ar 1, Ar 2, Ar 3 and the definition of Ar 4, specific examples and preferred embodiments, respectively, R 1 in the above-mentioned general formula (1), L , Ar 1 , Ar 2 , Ar 3 and Ar 4 are the same.
本発明の樹脂は、一般式(2)で表される繰り返し単位以外の繰り返し単位を有していてもよい。
本発明の樹脂中の全繰り返し単位に対する一般式(2)で表される繰り返し単位が占める割合は特に制限されないが、30mol%以上であることが好ましく、50mol%以上であることがより好ましく、70mol%以上であることがさらに好ましく、90mol%以上であることが特に好ましい。上限は特に制限されないが、100mol%(ホモポリマー)である。 The resin of the present invention may have a repeating unit other than the repeating unit represented by the general formula (2).
The ratio of the repeating unit represented by the general formula (2) to the entire repeating unit in the resin of the present invention is not particularly limited, but is preferably 30 mol% or more, more preferably 50 mol% or more, and 70 mol. % Or more is more preferable, and 90 mol% or more is particularly preferable. The upper limit is not particularly limited, but is 100 mol% (homopolymer).
本発明の樹脂中の全繰り返し単位に対する一般式(2)で表される繰り返し単位が占める割合は特に制限されないが、30mol%以上であることが好ましく、50mol%以上であることがより好ましく、70mol%以上であることがさらに好ましく、90mol%以上であることが特に好ましい。上限は特に制限されないが、100mol%(ホモポリマー)である。 The resin of the present invention may have a repeating unit other than the repeating unit represented by the general formula (2).
The ratio of the repeating unit represented by the general formula (2) to the entire repeating unit in the resin of the present invention is not particularly limited, but is preferably 30 mol% or more, more preferably 50 mol% or more, and 70 mol. % Or more is more preferable, and 90 mol% or more is particularly preferable. The upper limit is not particularly limited, but is 100 mol% (homopolymer).
本発明の樹脂の分子量は特に制限されないが、重量平均分子量(Mw)が1,000~100,000であることが好ましく、1,000~30,000であることがより好ましい。
なお、本明細書において重量平均分子量は、GPC(溶離液:THF)により測定されたポリスチレン換算値である。 The molecular weight of the resin of the present invention is not particularly limited, but the weight average molecular weight (Mw) is preferably 1,000 to 100,000, and more preferably 1,000 to 30,000.
In this specification, the weight average molecular weight is a polystyrene equivalent value measured by GPC (eluent: THF).
なお、本明細書において重量平均分子量は、GPC(溶離液:THF)により測定されたポリスチレン換算値である。 The molecular weight of the resin of the present invention is not particularly limited, but the weight average molecular weight (Mw) is preferably 1,000 to 100,000, and more preferably 1,000 to 30,000.
In this specification, the weight average molecular weight is a polystyrene equivalent value measured by GPC (eluent: THF).
本発明の樹脂の好適な態様としては、例えば、下記一般式(2b)で表される樹脂が挙げられる。
As a preferred embodiment of the resin of the present invention, for example, a resin represented by the following general formula (2b) can be mentioned.
上記一般式(2b)中、R1、L、Ar1およびAr2の定義、具体例および好適な態様は、それぞれ、上述した一般式(1)中のR1、L、Ar1およびAr2と同じである。
上記一般式(2b)中、R、pおよびqの定義、具体例および好適な態様は、それぞれ、上述した一般式(1b)中のR、pおよびqと同じである。 In the general formula (2b), R 1, L, the definition of Ar 1 and Ar 2, specific examples and preferred embodiments, respectively, R 1 in the formula (1) described above, L, Ar 1 and Ar 2 Is the same.
In the general formula (2b), the definitions, specific examples and preferred embodiments of R, p and q are the same as R, p and q in the general formula (1b).
上記一般式(2b)中、R、pおよびqの定義、具体例および好適な態様は、それぞれ、上述した一般式(1b)中のR、pおよびqと同じである。 In the general formula (2b), R 1, L, the definition of Ar 1 and Ar 2, specific examples and preferred embodiments, respectively, R 1 in the formula (1) described above, L, Ar 1 and Ar 2 Is the same.
In the general formula (2b), the definitions, specific examples and preferred embodiments of R, p and q are the same as R, p and q in the general formula (1b).
本発明の樹脂が所望の効果を示す理由は明らかではないが、上述した本発明の化合物が所望の効果を示す理由と同様の理由が推測される。
The reason why the resin of the present invention exhibits the desired effect is not clear, but the reason similar to the reason why the above-described compound of the present invention exhibits the desired effect is presumed.
(合成方法)
本発明の樹脂の合成方法は特に制限されないが、好適な態様としては、例えば、上述した本発明の化合物をモノマーとして重合する方法が挙げられる。なお、本発明の趣旨に反しない限りにおいて、本発明の化合物以外のモノマーを共重合成分として使用することができる。
そのようなモノマーとしては特に制限されないが、例えば、メチル(メタ)アクリレート、ブチル(メタ)アクリレート、ヘキシル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、ベンジル(メタ)アクリレート、ステアリル(メタ)アクリレートなどの無置換(メタ)アクリル酸エステル類、2,2,2-トリフルオロエチル(メタ)アクリレート、3,3,3-トリフルオロプロピル(メタ)アクリレート、2-(パーフルオロヘキシル)エチルアクリレート、2-クロロエチル(メタ)アクリレートなどのハロゲン置換(メタ)アクリル酸エステル類、ブチル(メタ)アクリルアミド、イソプロピル(メタ)アクリルアミド、オクチル(メタ)アクリルアミド、2-エチルヘキシルアクリルアミド、ジメチル(メタ)アクリルアミドなどの(メタ)アクリルアミド類、スチレン、α―メチルスチレンなどのスチレン類、N-ビニルカルバゾール、酢酸ビニル、N-ビニルアセトアミド、N-ビニルカプロラクタムなどのビニル化合物類や、その他にジメチルアミノエチル(メタ)アクリレート、ジエチルアミノエチル(メタ)アクリレート、2-エチルチオ-エチル(メタ)アクリレート、(メタ)アクリル酸、2-ヒドロキシエチル(メタ)アクリレートなどが挙げられる。 (Synthesis method)
The method for synthesizing the resin of the present invention is not particularly limited, and a preferred embodiment includes a method of polymerizing the above-described compound of the present invention as a monomer. In addition, unless it is contrary to the meaning of this invention, monomers other than the compound of this invention can be used as a copolymerization component.
Such a monomer is not particularly limited. For example, methyl (meth) acrylate, butyl (meth) acrylate, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate , Unsubstituted (meth) acrylic esters such as stearyl (meth) acrylate, 2,2,2-trifluoroethyl (meth) acrylate, 3,3,3-trifluoropropyl (meth) acrylate, 2- (par Halogen-substituted (meth) acrylic acid esters such as fluorohexyl) ethyl acrylate and 2-chloroethyl (meth) acrylate, butyl (meth) acrylamide, isopropyl (meth) acrylamide, octyl (meth) acrylamide, 2-ethyl (Meth) acrylamides such as silacrylamide and dimethyl (meth) acrylamide, styrenes such as styrene and α-methylstyrene, vinyl compounds such as N-vinylcarbazole, vinyl acetate, N-vinylacetamide, N-vinylcaprolactam, Other examples include dimethylaminoethyl (meth) acrylate, diethylaminoethyl (meth) acrylate, 2-ethylthio-ethyl (meth) acrylate, (meth) acrylic acid, 2-hydroxyethyl (meth) acrylate, and the like.
本発明の樹脂の合成方法は特に制限されないが、好適な態様としては、例えば、上述した本発明の化合物をモノマーとして重合する方法が挙げられる。なお、本発明の趣旨に反しない限りにおいて、本発明の化合物以外のモノマーを共重合成分として使用することができる。
そのようなモノマーとしては特に制限されないが、例えば、メチル(メタ)アクリレート、ブチル(メタ)アクリレート、ヘキシル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、ベンジル(メタ)アクリレート、ステアリル(メタ)アクリレートなどの無置換(メタ)アクリル酸エステル類、2,2,2-トリフルオロエチル(メタ)アクリレート、3,3,3-トリフルオロプロピル(メタ)アクリレート、2-(パーフルオロヘキシル)エチルアクリレート、2-クロロエチル(メタ)アクリレートなどのハロゲン置換(メタ)アクリル酸エステル類、ブチル(メタ)アクリルアミド、イソプロピル(メタ)アクリルアミド、オクチル(メタ)アクリルアミド、2-エチルヘキシルアクリルアミド、ジメチル(メタ)アクリルアミドなどの(メタ)アクリルアミド類、スチレン、α―メチルスチレンなどのスチレン類、N-ビニルカルバゾール、酢酸ビニル、N-ビニルアセトアミド、N-ビニルカプロラクタムなどのビニル化合物類や、その他にジメチルアミノエチル(メタ)アクリレート、ジエチルアミノエチル(メタ)アクリレート、2-エチルチオ-エチル(メタ)アクリレート、(メタ)アクリル酸、2-ヒドロキシエチル(メタ)アクリレートなどが挙げられる。 (Synthesis method)
The method for synthesizing the resin of the present invention is not particularly limited, and a preferred embodiment includes a method of polymerizing the above-described compound of the present invention as a monomer. In addition, unless it is contrary to the meaning of this invention, monomers other than the compound of this invention can be used as a copolymerization component.
Such a monomer is not particularly limited. For example, methyl (meth) acrylate, butyl (meth) acrylate, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate , Unsubstituted (meth) acrylic esters such as stearyl (meth) acrylate, 2,2,2-trifluoroethyl (meth) acrylate, 3,3,3-trifluoropropyl (meth) acrylate, 2- (par Halogen-substituted (meth) acrylic acid esters such as fluorohexyl) ethyl acrylate and 2-chloroethyl (meth) acrylate, butyl (meth) acrylamide, isopropyl (meth) acrylamide, octyl (meth) acrylamide, 2-ethyl (Meth) acrylamides such as silacrylamide and dimethyl (meth) acrylamide, styrenes such as styrene and α-methylstyrene, vinyl compounds such as N-vinylcarbazole, vinyl acetate, N-vinylacetamide, N-vinylcaprolactam, Other examples include dimethylaminoethyl (meth) acrylate, diethylaminoethyl (meth) acrylate, 2-ethylthio-ethyl (meth) acrylate, (meth) acrylic acid, 2-hydroxyethyl (meth) acrylate, and the like.
[組成物]
本発明の組成物は、上述した本発明の樹脂を含有する組成物である。
本発明の組成物は、本発明の趣旨に反しない限りにおいて、他の成分を含有してもよい。そのような成分としては、溶剤、開始剤、モノマー、分散剤、可塑剤、熱安定剤、離型剤などが挙げられる。これらの成分としては、例えば、特開2012-251125号公報(対応する国際公開第2012/153826号)の段落[0013]以降の内容や特開2012-255148号公報(対応する国際公開第2012-157784号)の段落[0019]以降の内容が援用でき、これらの内容は本願明細書に取り込まれる。
本発明の組成物中の本発明の樹脂の含有量は特に制限されないが、10~100質量%であることが好ましく、20~90質量%であることがより好ましく、30~90質量%であることがさらに好ましい。 [Composition]
The composition of the present invention is a composition containing the above-described resin of the present invention.
The composition of the present invention may contain other components as long as it is not contrary to the gist of the present invention. Such components include solvents, initiators, monomers, dispersants, plasticizers, heat stabilizers, mold release agents, and the like. Examples of these components include the contents after paragraph [0013] of JP 2012-251125 A (corresponding international publication 2012/153826) and JP 2012-255148 A (corresponding international publication 2012-2012). No. 157784), the contents of paragraph [0019] onward can be incorporated, and these contents are incorporated in the present specification.
The content of the resin of the present invention in the composition of the present invention is not particularly limited, but is preferably 10 to 100% by mass, more preferably 20 to 90% by mass, and 30 to 90% by mass. More preferably.
本発明の組成物は、上述した本発明の樹脂を含有する組成物である。
本発明の組成物は、本発明の趣旨に反しない限りにおいて、他の成分を含有してもよい。そのような成分としては、溶剤、開始剤、モノマー、分散剤、可塑剤、熱安定剤、離型剤などが挙げられる。これらの成分としては、例えば、特開2012-251125号公報(対応する国際公開第2012/153826号)の段落[0013]以降の内容や特開2012-255148号公報(対応する国際公開第2012-157784号)の段落[0019]以降の内容が援用でき、これらの内容は本願明細書に取り込まれる。
本発明の組成物中の本発明の樹脂の含有量は特に制限されないが、10~100質量%であることが好ましく、20~90質量%であることがより好ましく、30~90質量%であることがさらに好ましい。 [Composition]
The composition of the present invention is a composition containing the above-described resin of the present invention.
The composition of the present invention may contain other components as long as it is not contrary to the gist of the present invention. Such components include solvents, initiators, monomers, dispersants, plasticizers, heat stabilizers, mold release agents, and the like. Examples of these components include the contents after paragraph [0013] of JP 2012-251125 A (corresponding international publication 2012/153826) and JP 2012-255148 A (corresponding international publication 2012-2012). No. 157784), the contents of paragraph [0019] onward can be incorporated, and these contents are incorporated in the present specification.
The content of the resin of the present invention in the composition of the present invention is not particularly limited, but is preferably 10 to 100% by mass, more preferably 20 to 90% by mass, and 30 to 90% by mass. More preferably.
[用途]
本発明の化合物および本発明の樹脂ならびに上記樹脂を含有する組成物(以下、本発明の化合物等とも言う)の用途は特に制限されないが、例えば、レンズ(眼鏡レンズ、デジタルカメラ用レンズ、フレネルレンズ、プリズムレンズなど)、光学用オーバーコート剤、ハードコート剤、反射防止膜、光ファイバー、光導波路、LED用封止材料、LED用平坦化材料、マイクロOLED用下地剤、太陽光電池用コーティング材として有用である。
なお、本発明の化合物は、一般式(2)で表される繰り返し単位を有する樹脂を合成するためのモノマーとして有用である。 [Usage]
The use of the compound of the present invention, the resin of the present invention, and the composition containing the above resin (hereinafter also referred to as the compound of the present invention) is not particularly limited. For example, lenses (glasses lenses, lenses for digital cameras, Fresnel lenses) , Prism lenses, etc.), optical overcoat agent, hard coat agent, antireflection film, optical fiber, optical waveguide, LED sealing material, LED flattening material, micro-OLED substrate, solar cell coating material It is.
In addition, the compound of this invention is useful as a monomer for synthesize | combining resin which has a repeating unit represented by General formula (2).
本発明の化合物および本発明の樹脂ならびに上記樹脂を含有する組成物(以下、本発明の化合物等とも言う)の用途は特に制限されないが、例えば、レンズ(眼鏡レンズ、デジタルカメラ用レンズ、フレネルレンズ、プリズムレンズなど)、光学用オーバーコート剤、ハードコート剤、反射防止膜、光ファイバー、光導波路、LED用封止材料、LED用平坦化材料、マイクロOLED用下地剤、太陽光電池用コーティング材として有用である。
なお、本発明の化合物は、一般式(2)で表される繰り返し単位を有する樹脂を合成するためのモノマーとして有用である。 [Usage]
The use of the compound of the present invention, the resin of the present invention, and the composition containing the above resin (hereinafter also referred to as the compound of the present invention) is not particularly limited. For example, lenses (glasses lenses, lenses for digital cameras, Fresnel lenses) , Prism lenses, etc.), optical overcoat agent, hard coat agent, antireflection film, optical fiber, optical waveguide, LED sealing material, LED flattening material, micro-OLED substrate, solar cell coating material It is.
In addition, the compound of this invention is useful as a monomer for synthesize | combining resin which has a repeating unit represented by General formula (2).
[マイクロOLED]
次に、本発明の化合物等をカラーフィルタの下地剤として使用したマイクロOLED(マイクロ有機発光ダイオード)について図面を参照して説明する。
図1は、本発明の化合物等をカラーフィルタの下地剤として使用したマイクロOLEDの一態様の1画素分の断面図である。
マイクロOLED100は、基板10と有機EL素子20と保護膜30と下地層40とカラーフィルタ(赤色カラーフィルタ:50R、緑色カラーフィルタ:50G、青色カラーフィルタ:50B)とを備える。ここで、下地層40は本発明の化合物等を使用して形成される層である。
有機EL素子20のピッチ(中心間距離)pは、例えば、30μm以下であり、好ましくは、1~5μmである。すなわち、有機EL素子20の寸法が極めて小さい。
保護膜30は、例えば、厚みが0.5~10μmであり、例えば、窒化ケイ素により構成されている。
下地層40を形成する方法は特に制限されないが、例えば、本発明の化合物等を塗布し、硬化させる方法などが挙げられる。
マイクロOLED100は他の部材(例えば、リフレクターなど)を備えてもよい。リフレクターを備えることなどにより保護膜30の表面に凹凸が生じた場合、下地層40は平坦化層としても機能する。すなわち、本発明の化合物等は平坦化剤としても有用である。 [Micro OLED]
Next, a micro OLED (micro organic light emitting diode) using the compound of the present invention as a base material for a color filter will be described with reference to the drawings.
FIG. 1 is a cross-sectional view of one pixel of one embodiment of a micro OLED using the compound of the present invention as a base material for a color filter.
Themicro OLED 100 includes a substrate 10, an organic EL element 20, a protective film 30, a base layer 40, and color filters (red color filter: 50R, green color filter: 50G, blue color filter: 50B). Here, the underlayer 40 is a layer formed using the compound of the present invention.
The pitch (center-to-center distance) p of theorganic EL element 20 is, for example, 30 μm or less, and preferably 1 to 5 μm. That is, the dimension of the organic EL element 20 is extremely small.
Theprotective film 30 has a thickness of 0.5 to 10 μm, for example, and is made of, for example, silicon nitride.
The method for forming theunderlayer 40 is not particularly limited, and examples thereof include a method of applying and curing the compound of the present invention.
Themicro OLED 100 may include other members (for example, a reflector or the like). In the case where irregularities are generated on the surface of the protective film 30 due to the provision of a reflector or the like, the base layer 40 also functions as a planarizing layer. That is, the compound of the present invention is also useful as a leveling agent.
次に、本発明の化合物等をカラーフィルタの下地剤として使用したマイクロOLED(マイクロ有機発光ダイオード)について図面を参照して説明する。
図1は、本発明の化合物等をカラーフィルタの下地剤として使用したマイクロOLEDの一態様の1画素分の断面図である。
マイクロOLED100は、基板10と有機EL素子20と保護膜30と下地層40とカラーフィルタ(赤色カラーフィルタ:50R、緑色カラーフィルタ:50G、青色カラーフィルタ:50B)とを備える。ここで、下地層40は本発明の化合物等を使用して形成される層である。
有機EL素子20のピッチ(中心間距離)pは、例えば、30μm以下であり、好ましくは、1~5μmである。すなわち、有機EL素子20の寸法が極めて小さい。
保護膜30は、例えば、厚みが0.5~10μmであり、例えば、窒化ケイ素により構成されている。
下地層40を形成する方法は特に制限されないが、例えば、本発明の化合物等を塗布し、硬化させる方法などが挙げられる。
マイクロOLED100は他の部材(例えば、リフレクターなど)を備えてもよい。リフレクターを備えることなどにより保護膜30の表面に凹凸が生じた場合、下地層40は平坦化層としても機能する。すなわち、本発明の化合物等は平坦化剤としても有用である。 [Micro OLED]
Next, a micro OLED (micro organic light emitting diode) using the compound of the present invention as a base material for a color filter will be described with reference to the drawings.
FIG. 1 is a cross-sectional view of one pixel of one embodiment of a micro OLED using the compound of the present invention as a base material for a color filter.
The
The pitch (center-to-center distance) p of the
The
The method for forming the
The
以下、実施例により、本発明についてさらに詳細に説明するが、本発明はこれらに限定されるものではない。
Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited to these.
<化合物の合成>
公知の方法により下記A-1~A-4(実施例1、3、5および7の化合物)および下記C-1(比較例1の化合物)を合成した。なお、各化合物の同定はNMRにより行った。図2にA-3の1H-NMRチャートを示す。また、図3にA-4の1H-NMRチャートを示す。 <Synthesis of compounds>
The following A-1 to A-4 (compounds of Examples 1, 3, 5 and 7) and C-1 (compound of Comparative Example 1) were synthesized by a known method. Each compound was identified by NMR. FIG. 2 shows a 1 H-NMR chart of A-3. FIG. 3 shows a 1 H-NMR chart of A-4.
公知の方法により下記A-1~A-4(実施例1、3、5および7の化合物)および下記C-1(比較例1の化合物)を合成した。なお、各化合物の同定はNMRにより行った。図2にA-3の1H-NMRチャートを示す。また、図3にA-4の1H-NMRチャートを示す。 <Synthesis of compounds>
The following A-1 to A-4 (compounds of Examples 1, 3, 5 and 7) and C-1 (compound of Comparative Example 1) were synthesized by a known method. Each compound was identified by NMR. FIG. 2 shows a 1 H-NMR chart of A-3. FIG. 3 shows a 1 H-NMR chart of A-4.
以下にA-3について具体的な合成スキームおよび合成方法(工程A~D)を示す。なお、他の化合物についても同様の方法により合成した。
The specific synthesis scheme and synthesis method (steps A to D) for A-3 are shown below. Other compounds were synthesized by the same method.
(工程A)
マグネシウム,削り状(和光純薬(株)製)15.8g(0.2171mol)をテトラヒドロフラン200mLで攪拌しているところに2-ブロモナフタレン(東京化成工業(株)製)134.9g(0.6514mol)のテトラヒドロフラン溶液600mLを滴下しGrignard試薬をした。その後0℃に冷却し、11H-ベンゾ[b]フルオレン-11-オン(東京化成工業製)50gのTHF溶液600mLを滴下した。滴下後、30分攪拌した後に飽和塩化アンモニウム水溶液を滴下し、反応を停止した。分液、濃縮して得られたオイルをカラムクロマトグラフィー(ヘキサン/酢酸エチル=4/1)による精製を行い目的の三級アルコール65g(83.5%)を得た。 (Process A)
While stirring 15.8 g (0.2171 mol) of magnesium, shaving (manufactured by Wako Pure Chemical Industries, Ltd.) with 200 mL of tetrahydrofuran, 134.9 g (0.8 .mu.m) of 2-bromonaphthalene (manufactured by Tokyo Chemical Industry Co., Ltd.) is stirred. A solution of 6514 mol) in tetrahydrofuran (600 mL) was added dropwise to give a Grignard reagent. Thereafter, the mixture was cooled to 0 ° C., and 600 mL of a THF solution containing 50 g of 11H-benzo [b] fluoren-11-one (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise. After dripping, after stirring for 30 minutes, saturated ammonium chloride aqueous solution was dripped, and reaction was stopped. The oil obtained by liquid separation and concentration was purified by column chromatography (hexane / ethyl acetate = 4/1) to obtain 65 g (83.5%) of the desired tertiary alcohol.
マグネシウム,削り状(和光純薬(株)製)15.8g(0.2171mol)をテトラヒドロフラン200mLで攪拌しているところに2-ブロモナフタレン(東京化成工業(株)製)134.9g(0.6514mol)のテトラヒドロフラン溶液600mLを滴下しGrignard試薬をした。その後0℃に冷却し、11H-ベンゾ[b]フルオレン-11-オン(東京化成工業製)50gのTHF溶液600mLを滴下した。滴下後、30分攪拌した後に飽和塩化アンモニウム水溶液を滴下し、反応を停止した。分液、濃縮して得られたオイルをカラムクロマトグラフィー(ヘキサン/酢酸エチル=4/1)による精製を行い目的の三級アルコール65g(83.5%)を得た。 (Process A)
While stirring 15.8 g (0.2171 mol) of magnesium, shaving (manufactured by Wako Pure Chemical Industries, Ltd.) with 200 mL of tetrahydrofuran, 134.9 g (0.8 .mu.m) of 2-bromonaphthalene (manufactured by Tokyo Chemical Industry Co., Ltd.) is stirred. A solution of 6514 mol) in tetrahydrofuran (600 mL) was added dropwise to give a Grignard reagent. Thereafter, the mixture was cooled to 0 ° C., and 600 mL of a THF solution containing 50 g of 11H-benzo [b] fluoren-11-one (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise. After dripping, after stirring for 30 minutes, saturated ammonium chloride aqueous solution was dripped, and reaction was stopped. The oil obtained by liquid separation and concentration was purified by column chromatography (hexane / ethyl acetate = 4/1) to obtain 65 g (83.5%) of the desired tertiary alcohol.
(工程B)
工程Aで得られた三級アルコール62g(0.1730mol)と2-ナフトール(東京化成工業(株)製)29.9g(0.2076mol)、3-メルカプトプロピオン酸(東京化成工業(株)製)2.8g(0.02595mol)のトルエン600mL溶液を60℃に加熱した。その溶液にメタンスルホン酸(東京化成工業(株)製)249.9g(2.595mol)を滴下した。滴下後、1時間攪拌した後に水と酢酸エチルを添加し、分液、濃縮して得られたオイルをカラムクロマトグラフィー(ヘキサン/酢酸エチル=3/1)による精製を行い目的のナフトール付加体77g(91.9%)を得た。 (Process B)
62 g (0.1730 mol) of tertiary alcohol obtained in Step A, 29.9 g (0.2076 mol) of 2-naphthol (manufactured by Tokyo Chemical Industry Co., Ltd.), 3-mercaptopropionic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) ) A solution of 2.8 g (0.02595 mol) in 600 mL of toluene was heated to 60 ° C. To the solution, 249.9 g (2.595 mol) of methanesulfonic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise. After the dropwise addition, the mixture was stirred for 1 hour, water and ethyl acetate were added, and the oil obtained by liquid separation and concentration was purified by column chromatography (hexane / ethyl acetate = 3/1) to obtain 77 g of the desired naphthol adduct. (91.9%) was obtained.
工程Aで得られた三級アルコール62g(0.1730mol)と2-ナフトール(東京化成工業(株)製)29.9g(0.2076mol)、3-メルカプトプロピオン酸(東京化成工業(株)製)2.8g(0.02595mol)のトルエン600mL溶液を60℃に加熱した。その溶液にメタンスルホン酸(東京化成工業(株)製)249.9g(2.595mol)を滴下した。滴下後、1時間攪拌した後に水と酢酸エチルを添加し、分液、濃縮して得られたオイルをカラムクロマトグラフィー(ヘキサン/酢酸エチル=3/1)による精製を行い目的のナフトール付加体77g(91.9%)を得た。 (Process B)
62 g (0.1730 mol) of tertiary alcohol obtained in Step A, 29.9 g (0.2076 mol) of 2-naphthol (manufactured by Tokyo Chemical Industry Co., Ltd.), 3-mercaptopropionic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) ) A solution of 2.8 g (0.02595 mol) in 600 mL of toluene was heated to 60 ° C. To the solution, 249.9 g (2.595 mol) of methanesulfonic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise. After the dropwise addition, the mixture was stirred for 1 hour, water and ethyl acetate were added, and the oil obtained by liquid separation and concentration was purified by column chromatography (hexane / ethyl acetate = 3/1) to obtain 77 g of the desired naphthol adduct. (91.9%) was obtained.
(工程C)
工程Bで得られたナフトール付加体74g(0.1527mol)と炭酸エチレン(東京化成工業(株)製)26.9g(0.3054mol)、炭酸カリウム(和光純薬(株)製)42.2g(0.3054mol)のジメチルホルムアルデヒド溶液740mLを110℃で3時間攪拌した。原料の消失を確認後、水酸化カリウム18.8%水溶液91gを添加した。原料の炭酸エチレンの消失を確認後、水と酢酸エチルを添加し、分液、濃縮して得られた目的のアルコール68g(84.3%)を得た。 (Process C)
74 g (0.1527 mol) of naphthol adduct obtained in Step B, 26.9 g (0.3054 mol) of ethylene carbonate (manufactured by Tokyo Chemical Industry Co., Ltd.), 42.2 g of potassium carbonate (manufactured by Wako Pure Chemical Industries, Ltd.) 740 mL of a dimethylformaldehyde solution (0.3054 mol) was stirred at 110 ° C. for 3 hours. After confirming disappearance of the raw materials, 91 g of an aqueous 18.8% potassium hydroxide solution was added. After confirming the disappearance of the starting ethylene carbonate, water and ethyl acetate were added, and the mixture was separated and concentrated to obtain 68 g (84.3%) of the desired alcohol.
工程Bで得られたナフトール付加体74g(0.1527mol)と炭酸エチレン(東京化成工業(株)製)26.9g(0.3054mol)、炭酸カリウム(和光純薬(株)製)42.2g(0.3054mol)のジメチルホルムアルデヒド溶液740mLを110℃で3時間攪拌した。原料の消失を確認後、水酸化カリウム18.8%水溶液91gを添加した。原料の炭酸エチレンの消失を確認後、水と酢酸エチルを添加し、分液、濃縮して得られた目的のアルコール68g(84.3%)を得た。 (Process C)
74 g (0.1527 mol) of naphthol adduct obtained in Step B, 26.9 g (0.3054 mol) of ethylene carbonate (manufactured by Tokyo Chemical Industry Co., Ltd.), 42.2 g of potassium carbonate (manufactured by Wako Pure Chemical Industries, Ltd.) 740 mL of a dimethylformaldehyde solution (0.3054 mol) was stirred at 110 ° C. for 3 hours. After confirming disappearance of the raw materials, 91 g of an aqueous 18.8% potassium hydroxide solution was added. After confirming the disappearance of the starting ethylene carbonate, water and ethyl acetate were added, and the mixture was separated and concentrated to obtain 68 g (84.3%) of the desired alcohol.
(工程D)
工程Cで得られたアルコールを68g(0.1286mol)のテトラヒドロフラン1000mL溶液にトリエチルアミン(和光純薬(株)製)52.1g(0.5145mol)を加え、0℃に冷却した。次にアクリル酸クロライド(東京化成工業(株)製)23.3g(0.2573mol)を滴下し、30分攪拌した。原料が消失していることを確認後、水と酢酸エチルを添加し、分液、濃縮して得られたオイルに酢酸エチルを加え30%溶液にし、0℃に冷却したメタノールに滴下し、析出してきた目的の化合物(A-3)45g(60.0%)をろ過により回収した。 (Process D)
Triethylamine (manufactured by Wako Pure Chemical Industries, Ltd.) (52.1 g, 0.5145 mol) was added to a solution of 68 g (0.1286 mol) of tetrahydrofuran obtained in Step C in 1000 mL of tetrahydrofuran and cooled to 0 ° C. Next, 23.3 g (0.2573 mol) of acrylic acid chloride (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise and stirred for 30 minutes. After confirming the disappearance of the raw materials, water and ethyl acetate were added, followed by liquid separation and concentration. Ethyl acetate was added to the resulting oil to make a 30% solution, which was then added dropwise to methanol cooled to 0 ° C. 45 g (60.0%) of the desired compound (A-3) thus obtained was recovered by filtration.
工程Cで得られたアルコールを68g(0.1286mol)のテトラヒドロフラン1000mL溶液にトリエチルアミン(和光純薬(株)製)52.1g(0.5145mol)を加え、0℃に冷却した。次にアクリル酸クロライド(東京化成工業(株)製)23.3g(0.2573mol)を滴下し、30分攪拌した。原料が消失していることを確認後、水と酢酸エチルを添加し、分液、濃縮して得られたオイルに酢酸エチルを加え30%溶液にし、0℃に冷却したメタノールに滴下し、析出してきた目的の化合物(A-3)45g(60.0%)をろ過により回収した。 (Process D)
Triethylamine (manufactured by Wako Pure Chemical Industries, Ltd.) (52.1 g, 0.5145 mol) was added to a solution of 68 g (0.1286 mol) of tetrahydrofuran obtained in Step C in 1000 mL of tetrahydrofuran and cooled to 0 ° C. Next, 23.3 g (0.2573 mol) of acrylic acid chloride (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise and stirred for 30 minutes. After confirming the disappearance of the raw materials, water and ethyl acetate were added, followed by liquid separation and concentration. Ethyl acetate was added to the resulting oil to make a 30% solution, which was then added dropwise to methanol cooled to 0 ° C. 45 g (60.0%) of the desired compound (A-3) thus obtained was recovered by filtration.
<樹脂の合成>
得られた各化合物(A-1~A-4およびC-1)をモノマーとして用いて、公知の方法により樹脂(実施例および比較例の各樹脂)を合成した。
・実施例2の樹脂:A-1のホモポリマー(Mw:7300)
・実施例4の樹脂:A-2のホモポリマー(Mw:6500)
・実施例6の樹脂:A-3のホモポリマー(Mw:7500)
・実施例8の樹脂:A-4のホモポリマー(Mw:7900)
・比較例2の樹脂:C-1のホモポリマー(Mw:6000) <Resin synthesis>
Using the obtained compounds (A-1 to A-4 and C-1) as monomers, resins (respective resins in Examples and Comparative Examples) were synthesized by a known method.
Resin of Example 2: A-1 homopolymer (Mw: 7300)
Resin of Example 4: Homopolymer of A-2 (Mw: 6500)
Resin of Example 6: A-3 homopolymer (Mw: 7500)
Resin of Example 8: A-4 homopolymer (Mw: 7900)
Resin of Comparative Example 2: C-1 homopolymer (Mw: 6000)
得られた各化合物(A-1~A-4およびC-1)をモノマーとして用いて、公知の方法により樹脂(実施例および比較例の各樹脂)を合成した。
・実施例2の樹脂:A-1のホモポリマー(Mw:7300)
・実施例4の樹脂:A-2のホモポリマー(Mw:6500)
・実施例6の樹脂:A-3のホモポリマー(Mw:7500)
・実施例8の樹脂:A-4のホモポリマー(Mw:7900)
・比較例2の樹脂:C-1のホモポリマー(Mw:6000) <Resin synthesis>
Using the obtained compounds (A-1 to A-4 and C-1) as monomers, resins (respective resins in Examples and Comparative Examples) were synthesized by a known method.
Resin of Example 2: A-1 homopolymer (Mw: 7300)
Resin of Example 4: Homopolymer of A-2 (Mw: 6500)
Resin of Example 6: A-3 homopolymer (Mw: 7500)
Resin of Example 8: A-4 homopolymer (Mw: 7900)
Resin of Comparative Example 2: C-1 homopolymer (Mw: 6000)
なお、上記Mwは、GPC(溶媒:THF)により測定されたポリスチレン換算値である。以下にGPC測定条件を示す。
・本体:HLC-8220GPC(東ソー製)
・カラム:ガードカラム(HZ-L)、TSK gel Super(HZM-M)、TSK gel Super(HZ4000)、TSK gel Super(HZ3000)、TSK gel Super(HZ2000)を連結したもの
・溶離液:テトラヒドロフラン
・送液条件:サンプルポンプ 0.35mL/min、リファレンスポンプ 0.2mL/min
・カラム温調:40℃
・測定サンプル:0.1wt%濃度(0.5μmメンプレンフィルターろ過実施)
・注入量:10μm
・測定時間:26分 The Mw is a polystyrene equivalent value measured by GPC (solvent: THF). The GPC measurement conditions are shown below.
・ Main body: HLC-8220GPC (Tosoh)
Column: a guard column (HZ-L), TSK gel Super (HZM-M), TSK gel Super (HZ4000), TSK gel Super (HZ3000), TSK gel Super (HZ2000) connected Eluent: tetrahydrofuran Liquid feeding conditions: Sample pump 0.35 mL / min, reference pump 0.2 mL / min
-Column temperature control: 40 ° C
・ Measurement sample: 0.1 wt% concentration (0.5 μm membrane filter filtration)
・ Injection amount: 10 μm
・ Measurement time: 26 minutes
・本体:HLC-8220GPC(東ソー製)
・カラム:ガードカラム(HZ-L)、TSK gel Super(HZM-M)、TSK gel Super(HZ4000)、TSK gel Super(HZ3000)、TSK gel Super(HZ2000)を連結したもの
・溶離液:テトラヒドロフラン
・送液条件:サンプルポンプ 0.35mL/min、リファレンスポンプ 0.2mL/min
・カラム温調:40℃
・測定サンプル:0.1wt%濃度(0.5μmメンプレンフィルターろ過実施)
・注入量:10μm
・測定時間:26分 The Mw is a polystyrene equivalent value measured by GPC (solvent: THF). The GPC measurement conditions are shown below.
・ Main body: HLC-8220GPC (Tosoh)
Column: a guard column (HZ-L), TSK gel Super (HZM-M), TSK gel Super (HZ4000), TSK gel Super (HZ3000), TSK gel Super (HZ2000) connected Eluent: tetrahydrofuran Liquid feeding conditions: Sample pump 0.35 mL / min, reference pump 0.2 mL / min
-Column temperature control: 40 ° C
・ Measurement sample: 0.1 wt% concentration (0.5 μm membrane filter filtration)
・ Injection amount: 10 μm
・ Measurement time: 26 minutes
以下にA-3のホモポリマーおよびC-1のホモポリマーについて具体的な合成方法を示す。なお、他のホモポリマーについても同様の方法により合成した。
The specific synthesis method for the homopolymer A-3 and the homopolymer C-1 is shown below. Other homopolymers were synthesized by the same method.
(A-3のホモポリマーの合成)
A-3(2g)(3.43mmol)とV-601(和光純薬(株)製)0.158g(0.686mmol)の40wt%シクロヘキサノン溶液4.26gを80℃のシクロヘキサン溶液0.9gに2時間かけて滴下した。滴下後、2時間攪拌した後にV-601(0.079g)(0.345mmol)を添加した。さらに90℃で2時間攪拌した後に、100℃で1時間攪拌し、2時間攪拌した。最後にシクロヘキサノン1.67gを追加してA-3のホモポリマー30%シクロヘキサノン溶液を得た。残存モノマーはNMRで観測されなかった。 (Synthesis of A-3 homopolymer)
4.26 g of a 40 wt% cyclohexanone solution of A-3 (2 g) (3.43 mmol) and V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) 0.158 g (0.686 mmol) into 0.9 g of a cyclohexane solution at 80 ° C. It was dripped over 2 hours. After dropping, the mixture was stirred for 2 hours, and then V-601 (0.079 g) (0.345 mmol) was added. Furthermore, after stirring at 90 degreeC for 2 hours, it stirred at 100 degreeC for 1 hour, and stirred for 2 hours. Finally, 1.67 g of cyclohexanone was added to obtain a 30% cyclohexanone solution of A-3 homopolymer. Residual monomer was not observed by NMR.
A-3(2g)(3.43mmol)とV-601(和光純薬(株)製)0.158g(0.686mmol)の40wt%シクロヘキサノン溶液4.26gを80℃のシクロヘキサン溶液0.9gに2時間かけて滴下した。滴下後、2時間攪拌した後にV-601(0.079g)(0.345mmol)を添加した。さらに90℃で2時間攪拌した後に、100℃で1時間攪拌し、2時間攪拌した。最後にシクロヘキサノン1.67gを追加してA-3のホモポリマー30%シクロヘキサノン溶液を得た。残存モノマーはNMRで観測されなかった。 (Synthesis of A-3 homopolymer)
4.26 g of a 40 wt% cyclohexanone solution of A-3 (2 g) (3.43 mmol) and V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) 0.158 g (0.686 mmol) into 0.9 g of a cyclohexane solution at 80 ° C. It was dripped over 2 hours. After dropping, the mixture was stirred for 2 hours, and then V-601 (0.079 g) (0.345 mmol) was added. Furthermore, after stirring at 90 degreeC for 2 hours, it stirred at 100 degreeC for 1 hour, and stirred for 2 hours. Finally, 1.67 g of cyclohexanone was added to obtain a 30% cyclohexanone solution of A-3 homopolymer. Residual monomer was not observed by NMR.
(C-1のホモポリマーの合成)
C-1(2g)(3.43mmol)とV-601(和光純薬(株)製)0.213g(0.92mmol)の15wt%シクロヘキサノン溶液10.1gを80℃のシクロヘキサン溶液3.4gに2時間かけて滴下した。滴下後、2時間攪拌した後にV-601(0.101g)(0.46mmol)を添加した。さらに2時間攪拌した後に、100℃に昇温し、2時間攪拌した。C-1のホモポリマー15%シクロヘキサノン溶液を得た。残存モノマーはNMRで観測されなかった。 (Synthesis of C-1 homopolymer)
10.1 g of 15 wt% cyclohexanone solution of 0.21 g (0.92 mmol) of C-1 (2 g) (3.43 mmol) and V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) was added to 3.4 g of cyclohexane solution at 80 ° C. It was dripped over 2 hours. After dropping, the mixture was stirred for 2 hours, and then V-601 (0.101 g) (0.46 mmol) was added. After further stirring for 2 hours, the temperature was raised to 100 ° C. and stirring was performed for 2 hours. A C-1 homopolymer 15% cyclohexanone solution was obtained. Residual monomer was not observed by NMR.
C-1(2g)(3.43mmol)とV-601(和光純薬(株)製)0.213g(0.92mmol)の15wt%シクロヘキサノン溶液10.1gを80℃のシクロヘキサン溶液3.4gに2時間かけて滴下した。滴下後、2時間攪拌した後にV-601(0.101g)(0.46mmol)を添加した。さらに2時間攪拌した後に、100℃に昇温し、2時間攪拌した。C-1のホモポリマー15%シクロヘキサノン溶液を得た。残存モノマーはNMRで観測されなかった。 (Synthesis of C-1 homopolymer)
10.1 g of 15 wt% cyclohexanone solution of 0.21 g (0.92 mmol) of C-1 (2 g) (3.43 mmol) and V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) was added to 3.4 g of cyclohexane solution at 80 ° C. It was dripped over 2 hours. After dropping, the mixture was stirred for 2 hours, and then V-601 (0.101 g) (0.46 mmol) was added. After further stirring for 2 hours, the temperature was raised to 100 ° C. and stirring was performed for 2 hours. A C-1 homopolymer 15% cyclohexanone solution was obtained. Residual monomer was not observed by NMR.
<溶解性の評価>
各化合物およびホモポリマーのシクロヘキサノンに対する溶解度(飽和溶液濃度)を調べ、以下の基準から溶解性を評価した。結果を表1に示す。AまたはBであることが好ましく、Aであることがより好ましい。
・A:溶解度が30wt%以上
・B:溶解度が20wt%超30wt%未満
・C:溶解度が20wt%以下 <Evaluation of solubility>
The solubility (saturated solution concentration) of each compound and homopolymer in cyclohexanone was examined, and the solubility was evaluated from the following criteria. The results are shown in Table 1. A or B is preferable, and A is more preferable.
・ A: Solubility is 30 wt% or more ・ B: Solubility is more than 20 wt% and less than 30 wt% ・ C: Solubility is 20 wt% or less
各化合物およびホモポリマーのシクロヘキサノンに対する溶解度(飽和溶液濃度)を調べ、以下の基準から溶解性を評価した。結果を表1に示す。AまたはBであることが好ましく、Aであることがより好ましい。
・A:溶解度が30wt%以上
・B:溶解度が20wt%超30wt%未満
・C:溶解度が20wt%以下 <Evaluation of solubility>
The solubility (saturated solution concentration) of each compound and homopolymer in cyclohexanone was examined, and the solubility was evaluated from the following criteria. The results are shown in Table 1. A or B is preferable, and A is more preferable.
・ A: Solubility is 30 wt% or more ・ B: Solubility is more than 20 wt% and less than 30 wt% ・ C: Solubility is 20 wt% or less
<屈折率の評価>
各化合物およびホモポリマーについてプロピレングリコールモノメチルエーテルアセテート溶液(5wt%)を調製し、スピン塗布して、100℃2分で乾燥させ、膜を調製した。次いで、得られた膜について屈折率(波長:500nm)を測定した(装置:大日本スクリーン製造(株)製エリプソ式膜厚測定装置 REシリーズ、RE-3320)。
そして、以下の基準から屈折率を評価した。結果を表1に示す。AまたはBであることが好ましく、Aであることがより好ましい。
・A:屈折率が1.70以上
・B:屈折率が1.65超1.70未満
・C:屈折率が1.65以下 <Evaluation of refractive index>
A propylene glycol monomethyl ether acetate solution (5 wt%) was prepared for each compound and homopolymer, spin-coated, and dried at 100 ° C. for 2 minutes to prepare a film. Next, the refractive index (wavelength: 500 nm) of the obtained film was measured (apparatus: Ellipso film thickness measuring apparatus RE series, RE-3320 manufactured by Dainippon Screen Mfg. Co., Ltd.).
And the refractive index was evaluated from the following criteria. The results are shown in Table 1. A or B is preferable, and A is more preferable.
-A: Refractive index is 1.70 or more-B: Refractive index is more than 1.65 and less than 1.70-C: Refractive index is 1.65 or less
各化合物およびホモポリマーについてプロピレングリコールモノメチルエーテルアセテート溶液(5wt%)を調製し、スピン塗布して、100℃2分で乾燥させ、膜を調製した。次いで、得られた膜について屈折率(波長:500nm)を測定した(装置:大日本スクリーン製造(株)製エリプソ式膜厚測定装置 REシリーズ、RE-3320)。
そして、以下の基準から屈折率を評価した。結果を表1に示す。AまたはBであることが好ましく、Aであることがより好ましい。
・A:屈折率が1.70以上
・B:屈折率が1.65超1.70未満
・C:屈折率が1.65以下 <Evaluation of refractive index>
A propylene glycol monomethyl ether acetate solution (5 wt%) was prepared for each compound and homopolymer, spin-coated, and dried at 100 ° C. for 2 minutes to prepare a film. Next, the refractive index (wavelength: 500 nm) of the obtained film was measured (apparatus: Ellipso film thickness measuring apparatus RE series, RE-3320 manufactured by Dainippon Screen Mfg. Co., Ltd.).
And the refractive index was evaluated from the following criteria. The results are shown in Table 1. A or B is preferable, and A is more preferable.
-A: Refractive index is 1.70 or more-B: Refractive index is more than 1.65 and less than 1.70-C: Refractive index is 1.65 or less
表1から分かるように、公知の化合物である比較例1の化合物と比較して、上述した一般式(1)で表される化合物である実施例1、3、5および7ならびに上述した一般式(2)で表される繰り返し単位を有する樹脂である実施例2、4、6および8は、優れた溶解性と高い屈折率を示した。なかでも、一般式(1)または(2)中のAr3およびAr4の一方が多環芳香族炭化水素環であり、他方が単環芳香族炭化水素環である、実施例1、2および5~8は、より優れた溶解性を示した。そのなかでも、一般式(1)または(2)中のAr1が2価の多環芳香族炭化水素基である実施例5~8はより高い屈折率を示した。
As can be seen from Table 1, Examples 1, 3, 5 and 7 which are compounds represented by the general formula (1) described above and the general formulas described above are compared with the compounds of Comparative Example 1 which are known compounds. Examples 2, 4, 6 and 8, which are resins having a repeating unit represented by (2), exhibited excellent solubility and a high refractive index. Among them, Examples 1, 2 and 1 in which one of Ar 3 and Ar 4 in the general formula (1) or (2) is a polycyclic aromatic hydrocarbon ring and the other is a monocyclic aromatic hydrocarbon ring. 5 to 8 showed better solubility. Among them, Examples 5 to 8 in which Ar 1 in the general formula (1) or (2) is a divalent polycyclic aromatic hydrocarbon group showed a higher refractive index.
また、各化合物(A-1~A-4およびC-1)およびメタクリル酸メチルをモノマーとして用いて、各化合物とメタクリル酸メチルとの共重合体(各化合物/メタクリル酸メチル=80質量%/20質量%)を合成し、上述のとおり溶解性および屈折率を評価したところ、C-1を使用した共重合体と比較して、A-1~A-4を使用した共重合体は優れた溶解性と高い屈折率を示した。
Further, using each compound (A-1 to A-4 and C-1) and methyl methacrylate as monomers, a copolymer of each compound and methyl methacrylate (each compound / methyl methacrylate = 80 mass% / 20% by mass) and the solubility and refractive index were evaluated as described above. The copolymer using A-1 to A-4 was superior to the copolymer using C-1. High solubility and high refractive index.
上述した実施例の各化合物およびホモポリマーならびに上述した各化合物とメタクリル酸メチルとの共重合体をカラーフィルタの下地層にそれぞれ用いて、上述した図1の態様の表示装置(マイクロOLED)を作製し、本発明の化合物および樹脂が表示装置(マイクロOLED)に有用であることを確認した。
The display device (micro OLED) of the above-described embodiment shown in FIG. 1 is prepared by using the compounds and homopolymers of the above-described examples and copolymers of each of the above-described compounds and methyl methacrylate for the underlayer of the color filter. Then, it was confirmed that the compounds and resins of the present invention are useful for display devices (micro OLED).
10 基板
20 有機EL素子
30 保護膜
40 下地層
50R 赤色カラーフィルタ
50G 緑色カラーフィルタ
50B 青色カラーフィルタ
100 マイクロOLED DESCRIPTION OFSYMBOLS 10 Board | substrate 20 Organic EL element 30 Protective film 40 Underlayer 50R Red color filter 50G Green color filter 50B Blue color filter 100 Micro OLED
20 有機EL素子
30 保護膜
40 下地層
50R 赤色カラーフィルタ
50G 緑色カラーフィルタ
50B 青色カラーフィルタ
100 マイクロOLED DESCRIPTION OF
Claims (5)
- 下記一般式(1)で表される化合物。ここで、R1は水素原子またはアルキル基、Lは2価の連結基、Ar1は置換基を有していてもよいアリーレン基またはヘテロアリーレン基、Ar2は置換基を有していてもよいアリール基またはヘテロアリール基、Ar3およびAr4はそれぞれ独立に置換基を有していてもよいアリール環またはヘテロアリール環を表す。ただし、Ar3およびAr4の少なくとも一方は置換基を有していてもよい多環芳香族炭化水素環または多環芳香族複素環である。
- 前記Ar3および前記Ar4の少なくとも一方が置換基を有していてもよい多環芳香族炭化水素環である、請求項1に記載の化合物。 The compound according to claim 1, wherein at least one of Ar 3 and Ar 4 is a polycyclic aromatic hydrocarbon ring which may have a substituent.
- 下記一般式(2)で表される繰り返し単位を有する樹脂。ここで、R1は水素原子またはアルキル基、Lは2価の連結基、Ar1は置換基を有していてもよいアリーレン基またはヘテロアリーレン基、Ar2は置換基を有していてもよいアリール基またはヘテロアリール基、Ar3およびAr4はそれぞれ独立に置換基を有していてもよいアリール環またはヘテロアリール環を表す。ただし、Ar3およびAr4のうち少なくとも一方は置換基を有していてもよい多環芳香族炭化水素環または多環芳香族複素環である。
- 重量平均分子量が2,000~100,000である、請求項3に記載の樹脂。 The resin according to claim 3, having a weight average molecular weight of 2,000 to 100,000.
- 請求項3または4に記載の樹脂を含有する組成物。 A composition containing the resin according to claim 3 or 4.
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