WO2015141000A1 - Water faucet device having bactericidal function, and sink - Google Patents

Water faucet device having bactericidal function, and sink Download PDF

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Publication number
WO2015141000A1
WO2015141000A1 PCT/JP2014/057853 JP2014057853W WO2015141000A1 WO 2015141000 A1 WO2015141000 A1 WO 2015141000A1 JP 2014057853 W JP2014057853 W JP 2014057853W WO 2015141000 A1 WO2015141000 A1 WO 2015141000A1
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WIPO (PCT)
Prior art keywords
water
plasma
plasma generator
faucet device
water outlet
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PCT/JP2014/057853
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French (fr)
Japanese (ja)
Inventor
明範 山本
川野 裕三
秋山 秀典
Original Assignee
株式会社タカギ
国立大学法人 熊本大学
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Application filed by 株式会社タカギ, 国立大学法人 熊本大学 filed Critical 株式会社タカギ
Priority to PCT/JP2014/057853 priority Critical patent/WO2015141000A1/en
Priority to JP2016508427A priority patent/JP6174241B2/en
Publication of WO2015141000A1 publication Critical patent/WO2015141000A1/en

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    • EFIXED CONSTRUCTIONS
    • E03WATER SUPPLY; SEWERAGE
    • E03CDOMESTIC PLUMBING INSTALLATIONS FOR FRESH WATER OR WASTE WATER; SINKS
    • E03C1/00Domestic plumbing installations for fresh water or waste water; Sinks
    • E03C1/02Plumbing installations for fresh water
    • E03C1/04Water-basin installations specially adapted to wash-basins or baths
    • E03C1/046Adding soap, disinfectant, or the like in the supply line or at the water outlet
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L9/00Disinfection, sterilisation or deodorisation of air
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/46Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/4608Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00Specific treatment goals
    • C02F2303/04Disinfection
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2307/00Location of water treatment or water treatment device
    • C02F2307/06Mounted on or being part of a faucet, shower handle or showerhead

Definitions

  • the present invention relates to a faucet device having a sterilizing function and a sink.
  • Patent Document 1 discloses a sterilization apparatus including a blower for supplying plasma to a predetermined position.
  • Patent Document 2 discloses a cleaning device including a mist generator containing plasma.
  • hand washing with water is one of the most basic hygiene controls. Bacteria and dirt attached to the hand can be washed away with water, and sterilization is possible by using a soap having a bactericidal action.
  • washing may be performed using alcohol in addition to hand washing. is there.
  • the present invention provides a faucet device and a sink capable of performing a more advanced sterilization treatment on an object while providing the user with a sense similar to that of conventional cleaning using water discharged from the faucet device.
  • the purpose is to provide.
  • the faucet device includes a water outlet, a valve that switches between discharge and stop of water from the water outlet, and a plasma generator.
  • a plasma generator so-called “plasma” such as ions, radicals, and electrons is generated by discharge to gas.
  • the water outlet is formed in the perfect or incomplete ring so that the water discharged
  • the opening from which the plasma is released is provided at a position surrounded by the water outlet so that the plasma from the plasma generator is supplied into the hollow portion of the water flow.
  • the flow of water from the water outlet serves as a plasma guide.
  • the plasma can be surrounded by a “curtain” of water.
  • a blower for pushing the plasma toward the hollow portion of the water flow may be employed.
  • the faucet device includes a water outlet, a valve that switches between discharge and stop of water from the water outlet, a plasma generator, and a trajectory of water discharged from the water outlet.
  • a guide for guiding plasma from the plasma generator is provided at a cleaning position where water hits an object to be processed.
  • the plasma generated by the plasma generator is supplied to the cleaning position through the guide, and the object (hand, product, instrument, etc.) placed at this position is cleaned with water and plasma
  • the sterilization process can be performed.
  • a plasma flow channel for example, a tube directed from the plasma generator toward the cleaning position can be cited.
  • a guide and a blower for sweeping the plasma may be used in combination.
  • helium gas may be supplied to the plasma generator, and the plasma generator may generate helium radicals.
  • Helium tends to maintain the radical state for a long time compared to other radical sources (eg, oxygen, chlorine, etc.). For this reason, the use of helium has an advantage that it is easy to ensure the distance from the plasma generator to the cleaning position. If the time from radical generation to extinction is about 100 nanoseconds to 1 second, the distance from the tip of the electrode of the plasma generator to the cleaning position should be set to 5 to 50 cm (preferably about 30 cm). Is possible. Further, if the plasma moves or the moved plasma generates a new plasma at the cleaning position, radicals are generated at the cleaning position, and cleaning is possible regardless of the radical extinction time.
  • hydroxyl radicals are generated when the radicals contained in the plasma from the plasma generator hit the water from the water outlet.
  • Hydroxy radicals have high reactivity and oxidizing power compared to oxygen radicals, chlorine radicals, and the like, and thus have a high bactericidal effect.
  • a sink with a sterilizing function.
  • a sink according to an aspect of the present invention includes the faucet device according to the first or second aspect, and a tub provided at a position for receiving water from the faucet device and having a drain outlet. According to this sink, the plasma generated by the plasma generator is supplied to the cleaning position, and the object (hand, product, instrument, etc.) placed at this position is cleaned with water and sterilized with plasma. Can be implemented.
  • the trough portion has a plasma generator.
  • the sink includes a faucet device and a tub.
  • a faucet device has a water outlet and a valve which switches discharge and stop of water from a water outlet.
  • the trough portion is provided at a position to receive water from the faucet device, and is in the middle of a trajectory of water discharged from the drain port, the plasma generator, and the water discharge port, and water is supplied to the object to be treated.
  • a guide for guiding the plasma from the plasma generator at the cleaning position where the According to this sink, the plasma generated by the plasma generator is supplied to the cleaning position through the guide, and the objects (hands, products, instruments, etc.) placed at this position are cleaned with water and sterilized with plasma.
  • a plasma flow channel for example, a tube directed from the plasma generator toward the cleaning position
  • a guide and a blower for sweeping the plasma may be used in combination.
  • the faucet device or sink is a control unit that controls the plasma generator so that the plasma generator automatically generates plasma when water discharge from the spout is started. May be further provided.
  • any of a DC power source, an AC power source, a high frequency power source and a pulse power source may be adopted, but from the viewpoint of reducing heat loss, high efficiency discharge and extending the life of the plasma generator, etc. It is preferable to employ a pulse power supply.
  • FIG. 1 It is a perspective view which shows the water faucet device which concerns on 1st embodiment of this invention, and a sink provided with this. It is a schematic diagram which expands and shows the peripheral part of the water outlet of the water faucet device shown in FIG. It is a perspective view which shows the state which discharge
  • the sink 100 with a sterilization function shown in FIG. 1 includes a faucet device 20A and a tub 40. According to the sink 100, it is possible for a user to perform a higher degree of sterilization treatment on an object to be cleaned (hands, products, instruments, etc.) while having the same feeling as conventional cleaning using water. is there. That is, by disposing the target object at a position (cleaning position P) where the water hits in the middle of the trajectory of the water discharged from the spout 1, it is possible to carry out a sterilization process using plasma in addition to cleaning with water. it can.
  • the tub 40 is provided at a position below the water outlet 1 of the faucet device 20 ⁇ / b> A and receiving water from the water outlet 1.
  • the tub portion 40 has a drain port 41a provided at the bottom and a plug 41b for closing the drain port 41a.
  • the stopper 41b By operating a handle (not shown), the stopper 41b can be moved in the vertical direction, so that the opening / closing of the drain port 41a can be switched.
  • the opening 42 is for preventing water from overflowing in a state where the drain port 41a is closed by the stopper 41b.
  • the opening 42 is provided at a position slightly lower than the upper end 40 a of the tub portion 40.
  • the faucet device 20 ⁇ / b> A includes a faucet unit 2, a faucet unit 3, and a plasma generator 10.
  • the faucet unit 2 includes a pedestal 4, a mixed faucet (valve) 6, and a lever 7.
  • a cylindrical faucet cover 8 that protrudes upward is provided at the center of the base 4.
  • the mixed faucet 6 is accommodated in a faucet cover 8.
  • the faucet cover 8 is rotatable about a vertical axis, and a spout 9 protruding obliquely upward is provided on the outer periphery of the faucet cover 8.
  • the lever 7 is disposed on the faucet cover 8 and connected to the mixing faucet 6.
  • a water supply pipe and a hot water supply pipe are connected to the mixing tap 6.
  • the mixing tap 6 is not limited to said type, A various type is employable. Instead of the mixing tap 6, for example, a total of two valves may be employed to adjust the flow rates of cold water and hot water, respectively.
  • a spout 1 is provided on the lower surface on the tip side of the spout 9.
  • the water discharge port 1 is formed in an annular shape, whereby a water flow F having a hollow portion Fa can be generated from the water discharge port 1 (see FIG. 3).
  • the water flow F having the hollow portion Fa serves as a plasma guide. That is, the plasma PS from the plasma generator 10 passes through the hollow portion Fa and reaches the cleaning position P.
  • the plasma generator 10 is disposed in the vicinity of the annular spout 1 (see FIG. 6), and an opening 15a through which plasma is emitted is provided at a position surrounded by the spout 1. Thereby, plasma can be supplied into the hollow portion Fa.
  • the plasma from the plasma generator 10 By making the plasma from the plasma generator 10 surrounded by a “curtain” of water, it is possible to sufficiently suppress the interference of the plasma PS with the surrounding gas (for example, air). As a result, the plasma PS is cleaned. It becomes possible to deliver to the position P more reliably.
  • the surrounding gas for example, air
  • the shape of the water discharge port 1 is not a perfect ring shape. May be. As shown in FIGS. 4 and 5, the shape of the water discharge port 1 may be an incomplete ring shape.
  • the water discharge port 1 shown in FIG. 4 is formed in a C shape.
  • the water outlet 1 shown in FIG. 5 includes a large number of openings 1 a arranged so as to surround the plasma generator 10.
  • the spout 1 When the spout 1 has an incomplete annular shape, that is, when there is a portion (intermittent portion) that is not open in the middle of the spout 1 formed along the annular line, the intermittent portion along the annular line.
  • the value of (A / (A + B)) is preferably 0.8 or less, more preferably 0.8. 5 or less, more preferably 0.3 or less.
  • the guide function by the water flow F can be sufficiently increased.
  • FIG. 5 illustrates a mode in which the water outlet 1 is configured by a large number of openings 1a arranged along one annular line, but the mode of the water outlet 1 is not limited thereto.
  • the guide function by the water flow F can be made higher.
  • the number of annular lines for disposing the openings is preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less.
  • the arrangement of the water outlet 1 is not limited to an annular shape, and may be rectangular or triangular, for example.
  • FIG. 6 is a cross-sectional view schematically showing the internal structure of the spout 9.
  • a flow path 9 a for supplying water from the mixing faucet 6 to the spout 1 a plasma generator 10 built in the tip of the spout 9, and the voltage of the pulse power supply 30 to the plasma generator 10 are provided with a plurality of cables 30a and 30b, and a flow path 9b for supplying air from the blower 35 to the plasma generator 10.
  • FIG. 7 is a cross-sectional view schematically showing the plasma generator 10.
  • the plasma generator 10 includes a rod-shaped electrode 11a, a cylindrical insulator 12 arranged to cover the outside of the electrode 11a, and a cylinder arranged to cover the outside of the insulator 12. And a ground electrode 11b.
  • the electrode 11a extends in the direction of the opening 11c of the ground electrode 11b.
  • the high voltage cable 30a is connected to the electrode 11a, and the ground cable 30b is connected to the ground electrode 11b.
  • the ground electrode 11b has an opening 11c at the tip.
  • Examples of the material of the electrode 11a and the ground electrode 11b include metals such as tungsten, aluminum, copper, and iron. Among these, tungsten has a high melting point and excellent hardness (strength).
  • the lower limit of the diameter of the electrode 11a is preferably 0.01 mm, more preferably 0.1 mm, even more preferably 0.5 mm, while the upper limit is preferably 10 mm, more preferably 5 mm. And more preferably 3 mm. If the diameter of the electrode 11a is less than 0.01 mm, the electrode 11a is likely to be broken or vibrates during use, while if the diameter exceeds 10 mm, the electrode 11a tends to hinder gas flow.
  • the lower limit of the length of the electrode 11a is preferably 5 mm, more preferably 10 mm, even more preferably 20 mm, while the upper limit is preferably 100 mm, more preferably 70 mm, and still more preferably. Is 50 mm or less.
  • the length of the electrode 11a is less than 5 mm, it is difficult to secure a sufficient area for discharge, and the amount of plasma generated tends to be insufficient. On the other hand, if the length exceeds 100 mm, the support for the electrode 11a or a large scale is required. It is easy to need a proper countermeasure against electric leakage.
  • the lower limit value of the opening diameter of the ground electrode 11b is preferably 0.5 mm, more preferably 1 mm, still more preferably 5 mm, while the upper limit value is preferably 30 mm, more preferably 20 mm. Yes, more preferably 10 mm. If the opening diameter of the earth electrode 11b is less than 0.5 mm, the generated plasma tends to be difficult to reach far away. On the other hand, if it exceeds 30 mm, a large blower or the like that generates a large flow of air is required. Cheap.
  • the earth electrode 11b has an opening 11c at the center of a disk-shaped plate as shown in FIG.
  • the lower limit value of the length in the extending direction of the opening 11c (the thickness of the plate) is preferably 1 mm, more preferably 1.3 mm, still more preferably 1.5 mm, while the upper limit value is Preferably it is 5 mm, More preferably, it is 4.5 mm, More preferably, it is 4 mm. If the length in the extending direction of the opening 11c is less than 1 mm, the strength of the ground electrode 11b tends to be insufficient, while if it exceeds 5 mm, the weight and cost of the ground electrode 11b tend to be excessive.
  • Examples of the material of the insulator 12 include ceramic, resin, glass, paper, and the like. Since ceramic has a high dielectric breakdown voltage, the use of ceramic has the advantage that excellent reliability can be obtained and the apparatus can be miniaturized. Resins have the advantages of relatively high dielectric breakdown voltage and high processability.
  • the tip of the plasma generator 10 is covered with an insulator 15 to ensure the safety of the user.
  • Plasma PS is emitted from an opening 15 a provided in the insulator 15.
  • the opening 15 a is provided at a position surrounded by the water outlet 1.
  • the faucet device 20A includes a blower 35 for sweeping away the plasma.
  • the air from the blower 35 passes through the flow path 9b, reaches the plasma generator 10, and is injected together with the plasma PS from the opening 15a.
  • the blower 35 By using the blower 35, the plasma can be delivered to the cleaning position P more reliably.
  • a blower equipped with devices such as a pump and a fan can be adopted. You may comprise a blower using the gas cylinder filled with gas.
  • Plasma PS is generated by the discharge by the plasma generator 10.
  • the atmosphere in the place where the discharge is generated may be air, but may be a mixed gas of a specific gas type and air.
  • Specific gas species include rare gases such as helium, neon, and argon; halogens such as fluorine and chlorine; water vapor; nitrogen and oxygen.
  • the advantages of the rare gas are that it is chemically inert and easy to handle, and it is easy to maintain the plasma state.
  • the advantage of halogen is its high ability to decompose substances such as ionization energy, electron affinity, and electronegativity.
  • the advantages of nitrogen and oxygen are that they are inexpensive and abundantly used, and that they generate various radicals.
  • the advantage of water vapor is that it contributes to an increase in the amount of hydroxy radicals that are highly sterilizing.
  • These gas types may be used alone, or two or more gas types may be used in combination. These gas species are easily plasmatized by discharge, and have the property that the radical state is maintained for a relatively long time.
  • the specific gas type may be introduced into a pipe for transferring air from the blower 35 to the plasma generator 10, and a flow path for the specific gas type is provided in the plasma generator.
  • the gas species may be directly introduced into the plasma generator 10.
  • the above specific gas species may be used alone or in combination of two or more.
  • One or more kinds of the specific gas species may be supplied to the plasma generator 10 as they are, or a mixed gas of the specific gas type and air may be supplied to the plasma generator 10.
  • the volume ratio of the specific gas species in the mixed gas is preferably 0.3 or more, more preferably 0.5 or more, and further preferably 0.8 or more. By setting the volume ratio to 0.3 or more, it is easy to generate a sufficient amount of plasma from the plasma generator 10.
  • the distance from the tip of electrode 11a of plasma generator 10 to the cleaning position is set to 5 to 50 cm (preferably about 30 cm). Is possible.
  • the distance from the tip of the electrode 11a of the plasma generator 10 to the surface of the tub 40 is preferably set to 20 to 60 cm.
  • a pulse power source is adopted as the power source of the plasma generator 10 (see FIG. 6).
  • the pulse power supply can be manufactured using, for example, a DC power source, a capacitor, a semiconductor switch, a booster, a magnetic switch, and the like (see FIG. 8).
  • the maximum operating voltage of the pulse power supply is preferably 1 to 100 kV
  • the pulse rise time is preferably 1 to 100 ns
  • the maximum switching frequency is preferably 0.1 to 20 kHz.
  • a DC power source or a high frequency power source may be employed.
  • discharge forms include corona discharge, glow discharge, arc discharge, and silent discharge.
  • arc discharge or silent discharge it is preferable to generate arc discharge or silent discharge by a pulse power source from the viewpoint of efficiently generating active oxygen species or hydroxy radicals effective for sterilization.
  • the faucet device 20 ⁇ / b> A is configured so that when the discharge of water from the spout 1 is started, the plasma generator 10 automatically generates plasma. It is preferable to further include a control unit 50 for controlling 10.
  • the control unit 50 can be configured using, for example, a sensor or a computer.
  • the plasma PS can stably reach the cleaning position P by the water flow F having the hollow portion Fa.
  • cleaning by water and the sterilization process by a radical can be implemented simultaneously.
  • the plasma from the plasma generator and water come into contact with each other at the cleaning position P, it is possible to generate hydroxy radicals having high sterilizing ability in the vicinity of the object.
  • the faucet device 20A it is possible to expect a sterilizing effect for both bacteria and viruses by plasma. It is considered that various radicals (particularly hydroxy radicals having strong oxidizing power) react with proteins and lipids constituting bacteria and viruses and destroy them to inactivate bacteria and viruses and eliminate infectivity.
  • various radicals particularly hydroxy radicals having strong oxidizing power
  • FIG. 9 is a perspective view of the sink 200 according to the second embodiment.
  • the faucet device 20B shown in FIG. 9 is different from the first embodiment in that the plasma generator 10 is provided in the spout 9. The plasma is emitted toward the cleaning position P by passing through the cylindrical guide 60.
  • the air from the blower 35 see FIG.
  • the material of the guide 60 examples include materials such as resin and metal. Among these, a resin material is preferable from the viewpoint of processability, water resistance, and chemical resistance.
  • FIG. 10 is a perspective view of the sink 300 according to the third embodiment.
  • the sink 300 shown in FIG. 10 is different from the first and second embodiments in that the plasma generator 10 is provided in the tub 40.
  • the sink 300 shown in FIG. 10 is arranged so as to be aligned with the faucet device 20C and the faucet device 20C that automatically discharges water by the action of the sensor when the object to be cleaned (such as a hand) is arranged at the cleaning position P.
  • a water soap supply plug 70 arranged at a position opposite to the plasma generator 10 and in line with the water faucet device 20C.
  • the plasma PS is emitted toward the cleaning position P by passing through the cylindrical guide 60.
  • the air from the blower 35 can be supplied to the plasma generator 10.
  • SYMBOLS 1 Water outlet, 1a ... Opening (water outlet), 6 ... Mixed water tap (valve), 10 ... Plasma generator, 15a ... Opening from which plasma is emitted, 20A, 20B, 20C ... Water faucet device, 30 ... Pulse Power source, 35 ... blower, 40 ... trough part, 50 ... control part, 60 ... guide, 100, 200, 300 ... sink, F ... flow of water, Fa ... hollow part, P ... cleaning position, PS ... plasma.

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Abstract

One embodiment of a water faucet device according to the present invention is equipped with: a water spout; a valve for switching between the discharge of water through the water spout and the termination of the discharge of water; and a plasma generator. The water spout is formed in the shape of a complete or incomplete ring so that the flow of water discharged through the water spout can have a hollow part formed therein, and an opening through which plasma can be discharged is provided at a position surrounded by the water spout.

Description

殺菌機能付き水栓装置及びシンクWater faucet device with sterilization function and sink
 本発明は殺菌機能を有する水栓装置及びシンクに関する。 The present invention relates to a faucet device having a sterilizing function and a sink.
 プラズマを利用して手、製品及び器具などを殺菌するための装置が知られている。例えば、特許文献1は、プラズマを所定の位置に供給するための送風機を備える殺菌装置を開示する。特許文献2は、プラズマを含むミストの発生器を備える洗浄装置を開示する。 An apparatus for sterilizing hands, products and instruments using plasma is known. For example, Patent Document 1 discloses a sterilization apparatus including a blower for supplying plasma to a predetermined position. Patent Document 2 discloses a cleaning device including a mist generator containing plasma.
特許第5347098号公報Japanese Patent No. 5347098 特許第4536936号公報Japanese Patent No. 4536936
 ところで、水を使用した手洗いは最も基本的な衛生管理の一つである。手に付着した菌及び汚れを水によって流すことができ、殺菌作用を有する石けんを使用すれば、殺菌も可能である。しかし、より高度な衛生管理が必要とされる場所(例えば病院)においては、手洗いのみでは十分に取り除くことができない菌に対処するため、手洗いに加えてアルコールなどを使用して洗浄を行う場合がある。 By the way, hand washing with water is one of the most basic hygiene controls. Bacteria and dirt attached to the hand can be washed away with water, and sterilization is possible by using a soap having a bactericidal action. However, in places where higher hygiene management is required (for example, hospitals), in order to deal with bacteria that cannot be sufficiently removed by hand washing alone, washing may be performed using alcohol in addition to hand washing. is there.
 本発明は、ユーザーにとっては水栓装置から吐出される水を使用した従来の洗浄と同様の感覚でありながら、対象物に対してより高度な殺菌処理を施すことが可能な水栓装置及びシンクを提供することを目的とする。 The present invention provides a faucet device and a sink capable of performing a more advanced sterilization treatment on an object while providing the user with a sense similar to that of conventional cleaning using water discharged from the faucet device. The purpose is to provide.
 本発明の第一の態様に係る水栓装置は、吐水口と、吐水口からの水の放出と停止とを切り替えるバルブと、プラズマ生成器とを備える。プラズマ生成器ではガスへの放電によって、イオン、ラジカル、電子などのいわゆる「プラズマ」が生成する。そして、吐水口から放出される水が中空部を有する流れを形成するように、吐水口は完全又は不完全な環状に形成されている。これに加え、プラズマ生成器からのプラズマが水の流れの中空部内に供給されるように、プラズマが放出される開口は吐水口に囲われた位置に設けられている。この水栓装置によれば、吐水口からの水の流れがプラズマのガイドの役割を果たす。すなわち、水の流れの中空部にプラズマを導入することで、プラズマを水の「カーテン」で囲うことができる。これにより、プラズマが周辺の気体(例えば空気)に干渉されることを十分に抑制でき、その結果、プラズマを洗浄位置にまでより確実に届けることが可能となる。更に確実にプラズマを洗浄位置まで届けることを可能にするため、水の流れの中空部内に向けてプラズマを押し流すための送風機を採用してもよい。 The faucet device according to the first aspect of the present invention includes a water outlet, a valve that switches between discharge and stop of water from the water outlet, and a plasma generator. In the plasma generator, so-called “plasma” such as ions, radicals, and electrons is generated by discharge to gas. And the water outlet is formed in the perfect or incomplete ring so that the water discharged | emitted from a water outlet forms the flow which has a hollow part. In addition to this, the opening from which the plasma is released is provided at a position surrounded by the water outlet so that the plasma from the plasma generator is supplied into the hollow portion of the water flow. According to this faucet device, the flow of water from the water outlet serves as a plasma guide. That is, by introducing plasma into the hollow portion of the water flow, the plasma can be surrounded by a “curtain” of water. Thereby, it can fully suppress that plasma interferes with surrounding gas (for example, air), As a result, it becomes possible to deliver a plasma more reliably to a cleaning position. Further, in order to make it possible to reliably deliver the plasma to the cleaning position, a blower for pushing the plasma toward the hollow portion of the water flow may be employed.
 本発明の第二の態様に係る水栓装置は、吐水口と、吐水口からの水の放出と停止とを切り替えるバルブと、プラズマ生成器と、吐水口から放出される水の軌道の途中であって処理の対象物に対して水が当たる洗浄位置に、プラズマ生成器からのプラズマを導くガイドとを備える。この水栓装置によれば、プラズマ生成器で発生したプラズマがガイドを通じて洗浄位置にまで供給され、この位置に配置される対象物(手、製品及び器具など)に対し、水による洗浄と、プラズマによる殺菌処理とを実施することができる。ガイドの例として、プラズマ生成器から洗浄位置の方向に向けられたプラズマ用流路(例えばチューブ)を挙げることができる。より確実にプラズマを洗浄位置まで届けることを可能にするため、ガイドと、プラズマを押し流すための送風機とを併用してもよい。 The faucet device according to the second aspect of the present invention includes a water outlet, a valve that switches between discharge and stop of water from the water outlet, a plasma generator, and a trajectory of water discharged from the water outlet. A guide for guiding plasma from the plasma generator is provided at a cleaning position where water hits an object to be processed. According to this faucet device, the plasma generated by the plasma generator is supplied to the cleaning position through the guide, and the object (hand, product, instrument, etc.) placed at this position is cleaned with water and plasma The sterilization process can be performed. As an example of the guide, a plasma flow channel (for example, a tube) directed from the plasma generator toward the cleaning position can be cited. In order to more reliably deliver the plasma to the cleaning position, a guide and a blower for sweeping the plasma may be used in combination.
 本発明の各態様において、プラズマ生成器に対してヘリウムガスを供給できるように構成されており、プラズマ生成器はヘリウムのラジカルを発生させるものであってもよい。ヘリウムは、他のラジカル源(例えば、酸素、塩素など)と比較して長い時間にわたってラジカルの状態を維持しやすい。このため、ヘリウムを使用することで、プラズマ生成器から洗浄位置までの距離を確保しやすいという利点がある。ラジカルが発生してから消滅するまでの時間が100ナノ秒~1秒程度であれば、プラズマ生成器の電極の先端から洗浄位置までの距離を5~50cm(好ましくは30cm程度)に設定することが可能である。更に、プラズマの移動、あるいは移動したプラズマが新たなプラズマを洗浄位置において生成すれば、洗浄位置においてラジカルが生成され、ラジカルの消滅時間に関係なく洗浄が可能である。 In each aspect of the present invention, helium gas may be supplied to the plasma generator, and the plasma generator may generate helium radicals. Helium tends to maintain the radical state for a long time compared to other radical sources (eg, oxygen, chlorine, etc.). For this reason, the use of helium has an advantage that it is easy to ensure the distance from the plasma generator to the cleaning position. If the time from radical generation to extinction is about 100 nanoseconds to 1 second, the distance from the tip of the electrode of the plasma generator to the cleaning position should be set to 5 to 50 cm (preferably about 30 cm). Is possible. Further, if the plasma moves or the moved plasma generates a new plasma at the cleaning position, radicals are generated at the cleaning position, and cleaning is possible regardless of the radical extinction time.
 洗浄位置において、吐水口からの水にプラズマ生成器からのプラズマに含まれるラジカルが当たることによってヒドロキシラジカルが発生することが好ましい。ヒドロキシラジカルは、酸素のラジカル、塩素のラジカルなどと比較して高い反応性と酸化力を有するため、高い殺菌効果を有する。また、プラズマ生成器における放電によって発生する紫外線が洗浄位置の対象物に照射されるようにしてもよい。紫外線は殺菌性を有するため、対象物の殺菌に寄与することが期待できる。 In the cleaning position, it is preferable that hydroxyl radicals are generated when the radicals contained in the plasma from the plasma generator hit the water from the water outlet. Hydroxy radicals have high reactivity and oxidizing power compared to oxygen radicals, chlorine radicals, and the like, and thus have a high bactericidal effect. Moreover, you may make it the ultraviolet-ray generated by the discharge in a plasma generator irradiate the target object of a washing position. Since ultraviolet rays have bactericidal properties, it can be expected to contribute to the sterilization of objects.
 更に、本発明は殺菌機能付きシンクを提供する。本発明の一態様に係るシンクは、上記第一又は第二に係る態様の水栓装置と、この水栓装置からの水を受ける位置に設けられ且つ排水口を有するたらい部とを備える。このシンクによれば、プラズマ生成器で発生したプラズマが洗浄位置にまで供給され、この位置に配置される対象物(手、製品及び器具など)に対し、水による洗浄と、プラズマによる殺菌処理とを実施することができる。 Furthermore, the present invention provides a sink with a sterilizing function. A sink according to an aspect of the present invention includes the faucet device according to the first or second aspect, and a tub provided at a position for receiving water from the faucet device and having a drain outlet. According to this sink, the plasma generated by the plasma generator is supplied to the cleaning position, and the object (hand, product, instrument, etc.) placed at this position is cleaned with water and sterilized with plasma. Can be implemented.
 本発明の第二の態様に係るシンクは、たらい部がプラズマ生成器を有する。このシンクは、水栓装置と、たらい部とを備える。そして、水栓装置は、吐水口と、吐水口からの水の放出と停止とを切り替えるバルブとを有する。たらい部は、水栓装置からの水を受ける位置に設けられ、且つ、排水口と、プラズマ生成器と、吐水口から放出される水の軌道の途中であって処理の対象物に対して水が当たる洗浄位置に、プラズマ生成器からのプラズマを導くガイドとを有する。このシンクによれば、プラズマ生成器で発生したプラズマがガイドを通じて洗浄位置にまで供給され、この位置に配置される対象物(手、製品及び器具など)に対し、水による洗浄と、プラズマによる殺菌処理とを実施することができる。ガイドの例として、プラズマ生成器から洗浄位置の方向に向けられたプラズマ用流路(例えばチューブ)を挙げることができる。より確実にプラズマを洗浄位置まで届けることを可能にするため、ガイドと、プラズマを押し流すための送風機とを併用してもよい。 In the sink according to the second aspect of the present invention, the trough portion has a plasma generator. The sink includes a faucet device and a tub. And a faucet device has a water outlet and a valve which switches discharge and stop of water from a water outlet. The trough portion is provided at a position to receive water from the faucet device, and is in the middle of a trajectory of water discharged from the drain port, the plasma generator, and the water discharge port, and water is supplied to the object to be treated. And a guide for guiding the plasma from the plasma generator at the cleaning position where the According to this sink, the plasma generated by the plasma generator is supplied to the cleaning position through the guide, and the objects (hands, products, instruments, etc.) placed at this position are cleaned with water and sterilized with plasma. Processing. As an example of the guide, a plasma flow channel (for example, a tube) directed from the plasma generator toward the cleaning position can be cited. In order to more reliably deliver the plasma to the cleaning position, a guide and a blower for sweeping the plasma may be used in combination.
 ユーザーの利便性の観点から、上記水栓装置又はシンクは、吐水口からの水の放出が開始されると、プラズマ生成器がプラズマを自動的に発生するようにプラズマ生成器を制御する制御部を更に備えてもよい。 From the viewpoint of user convenience, the faucet device or sink is a control unit that controls the plasma generator so that the plasma generator automatically generates plasma when water discharge from the spout is started. May be further provided.
 プラズマ生成器の電源として、直流電源、交流電源、高周波電源及びパルス電源のいずれを採用してもよいが、熱損失の低減、高効率な放電及びプラズマ生成器の長寿命化等の観点から、パルス電源を採用することが好ましい。 As the power source of the plasma generator, any of a DC power source, an AC power source, a high frequency power source and a pulse power source may be adopted, but from the viewpoint of reducing heat loss, high efficiency discharge and extending the life of the plasma generator, etc. It is preferable to employ a pulse power supply.
 本発明によれば、ユーザーにとっては水栓装置から吐出される水を使用した従来の洗浄と同様の感覚でありながら、対象物に対してより高度な殺菌処理を施すことが可能である。 According to the present invention, it is possible for a user to perform a more advanced sterilization treatment on an object while having the same feeling as a conventional cleaning using water discharged from a faucet device.
本発明の第一実施形態に係る水栓装置及びこれを備えるシンクを示す斜視図である。It is a perspective view which shows the water faucet device which concerns on 1st embodiment of this invention, and a sink provided with this. 図1に示す水栓装置の吐水口の周辺部分を拡大して示す模式図である。It is a schematic diagram which expands and shows the peripheral part of the water outlet of the water faucet device shown in FIG. 図2に示す吐水口から水を放出し且つプラズマ生成器からプラズマを放出している状態を示す斜視図である。It is a perspective view which shows the state which discharge | releases water from the water outlet shown in FIG. 2, and has discharged | emitted the plasma from the plasma generator. 吐水口の形状の他の例を示す斜視図である。It is a perspective view which shows the other example of the shape of a water outlet. 吐水口の形状の更に他の例を示す斜視図である。It is a perspective view which shows the further another example of the shape of a water outlet. 図1に示す水栓装置が備えるスパウトの内部構造を模式的に示す断面図である。It is sectional drawing which shows typically the internal structure of the spout with which the faucet device shown in FIG. 1 is provided. 図6に示すスパウトに内蔵されたプラズマ生成器を模式的に示す断面図である。It is sectional drawing which shows typically the plasma generator incorporated in the spout shown in FIG. パルス電源の一例を示す回路図である。It is a circuit diagram which shows an example of a pulse power supply. 本発明の第二実施形態に係る水栓装置を備えるシンクを示す斜視図である。It is a perspective view showing a sink provided with a faucet device concerning a second embodiment of the present invention. 本発明の第三実施形態に係る水栓装置を備えるシンクを示す斜視図である。It is a perspective view showing a sink provided with a faucet device concerning a third embodiment of the present invention.
 以下、図面を参照しながら本発明の実施形態について説明する。なお、説明において、同一要素又は同一機能を有する要素には同一符号を用いることとし、重複する説明は省略する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the description, the same reference numerals are used for the same elements or elements having the same function, and a duplicate description is omitted.
<第一実施形態>
 図1に示す殺菌機能付きシンク100は、水栓装置20Aと、たらい部40とを備える。シンク100によれば、ユーザーにとっては水を使用した従来の洗浄と同様の感覚でありながら、洗浄の対象物(手、製品及び器具など)に対してより高度な殺菌処理を施すことが可能である。すなわち、吐水口1から放出される水の軌道の途中であって水が当たる位置(洗浄位置P)に対象物を配置することで、水による洗浄に加え、プラズマによる殺菌処理を実施することができる。
<First embodiment>
The sink 100 with a sterilization function shown in FIG. 1 includes a faucet device 20A and a tub 40. According to the sink 100, it is possible for a user to perform a higher degree of sterilization treatment on an object to be cleaned (hands, products, instruments, etc.) while having the same feeling as conventional cleaning using water. is there. That is, by disposing the target object at a position (cleaning position P) where the water hits in the middle of the trajectory of the water discharged from the spout 1, it is possible to carry out a sterilization process using plasma in addition to cleaning with water. it can.
 たらい部40は、水栓装置20Aの吐水口1よりも下方であって吐水口1からの水を受ける位置に設けられている。たらい部40は、底部に設けられた排水口41aと、これを閉塞するための栓41bと有する。図示しないハンドルを操作することによって栓41bを上下方向に移動させることができ、これにより、排水口41aの開閉を切り替えることができる。開口42は、栓41bで排水口41aを閉塞させた状態において水が溢れるのを防止するためのものである。開口42は、たらい部40の上端40aよりも少し低い位置に設けられている。 The tub 40 is provided at a position below the water outlet 1 of the faucet device 20 </ b> A and receiving water from the water outlet 1. The tub portion 40 has a drain port 41a provided at the bottom and a plug 41b for closing the drain port 41a. By operating a handle (not shown), the stopper 41b can be moved in the vertical direction, so that the opening / closing of the drain port 41a can be switched. The opening 42 is for preventing water from overflowing in a state where the drain port 41a is closed by the stopper 41b. The opening 42 is provided at a position slightly lower than the upper end 40 a of the tub portion 40.
 以下、水栓装置20Aの構成について説明する。水栓装置20Aは、水栓ユニット2と、蛇口ユニット3と、プラズマ生成器10とを備える。水栓ユニット2は、台座4と、混合水栓(バルブ)6と、レバー7とを有する。台座4の中央には、上方に突出する円筒状の水栓カバー8が設けられている。混合水栓6は水栓カバー8内に収容されている。水栓カバー8は鉛直軸線を中心に回動自在となっており、水栓カバー8の外周には、斜め上方に突出したスパウト9が設けられている。レバー7は水栓カバー8の上に配置され、混合水栓6に接続されている。混合水栓6には給水配管及びは給湯配管が接続されている。なお、混合水栓6は、上記のタイプに限定されず、種々のタイプを採用可能である。混合水栓6の代わりに、例えば、冷水及び温水の流量をそれぞれ調整するために計二つのバルブを採用してもよい。 Hereinafter, the configuration of the faucet device 20A will be described. The faucet device 20 </ b> A includes a faucet unit 2, a faucet unit 3, and a plasma generator 10. The faucet unit 2 includes a pedestal 4, a mixed faucet (valve) 6, and a lever 7. A cylindrical faucet cover 8 that protrudes upward is provided at the center of the base 4. The mixed faucet 6 is accommodated in a faucet cover 8. The faucet cover 8 is rotatable about a vertical axis, and a spout 9 protruding obliquely upward is provided on the outer periphery of the faucet cover 8. The lever 7 is disposed on the faucet cover 8 and connected to the mixing faucet 6. A water supply pipe and a hot water supply pipe are connected to the mixing tap 6. In addition, the mixing tap 6 is not limited to said type, A various type is employable. Instead of the mixing tap 6, for example, a total of two valves may be employed to adjust the flow rates of cold water and hot water, respectively.
 レバー7の先端側を上下方向に操作することで、水の放出と停止とを切り替えることができる。また、レバー7を左右方向に回転させることで、水の温度調整が可能である。給水配管からの水と給湯配管からの湯は、混合水栓6を通ってスパウト9に送られる。混合水栓6によれば、レバー7の上下方向の動きに連動して湯水の流出量を調節することが可能であり、またレバー7の左右方向の回転に連動して湯水の混合比率を調節可能である。水栓カバー8を回動させることによりスパウト9の向きを変え、湯水の流出方向を変えることが可能である。なお、水栓カバー8は台座4に対して回動自在でなくてもよく、つまりスパウト9の向きは固定されていてもよい。また、ユーザーによってレバー7が操作される手動式水栓の代わりに、センサーによって水の放出と停止が制御される自動水栓を採用してもよい。 It is possible to switch between water discharge and stop by operating the tip side of the lever 7 in the vertical direction. Moreover, the temperature of water can be adjusted by rotating the lever 7 in the left-right direction. Water from the water supply pipe and hot water from the hot water supply pipe are sent to the spout 9 through the mixing tap 6. According to the mixing tap 6, it is possible to adjust the outflow amount of hot water in conjunction with the vertical movement of the lever 7, and to adjust the mixing ratio of hot water in conjunction with the horizontal rotation of the lever 7. Is possible. By rotating the faucet cover 8, the direction of the spout 9 can be changed, and the outflow direction of the hot water can be changed. The faucet cover 8 may not be rotatable with respect to the base 4, that is, the direction of the spout 9 may be fixed. Moreover, you may employ | adopt the automatic faucet which discharge | release and stop of water are controlled by a sensor instead of the manual faucet which the lever 7 is operated by the user.
 スパウト9の先端側の下面に、吐水口1が設けられている。図2に示すように、吐水口1は環状に形成されており、これにより、中空部Faを有する水の流れFを吐水口1から生じさせることができる(図3参照)。中空部Faを有する水の流れFは、プラズマのガイドの役割を果たす。すなわち、プラズマ生成器10からのプラズマPSは、中空部Fa内を通過して洗浄位置Pにまで至る。プラズマ生成器10は、環状の吐水口1の近傍に配置されており(図6参照)、またプラズマが放出される開口15aは吐水口1に囲われた位置に設けられている。これにより、中空部Fa内にプラズマを供給することができる。プラズマ生成器10からのプラズマを水の「カーテン」で囲んだ状態とすることで、プラズマPSが周辺の気体(例えば空気)に干渉されることを十分に抑制でき、その結果、プラズマPSを洗浄位置Pにまでより確実に届けることが可能となる。 A spout 1 is provided on the lower surface on the tip side of the spout 9. As shown in FIG. 2, the water discharge port 1 is formed in an annular shape, whereby a water flow F having a hollow portion Fa can be generated from the water discharge port 1 (see FIG. 3). The water flow F having the hollow portion Fa serves as a plasma guide. That is, the plasma PS from the plasma generator 10 passes through the hollow portion Fa and reaches the cleaning position P. The plasma generator 10 is disposed in the vicinity of the annular spout 1 (see FIG. 6), and an opening 15a through which plasma is emitted is provided at a position surrounded by the spout 1. Thereby, plasma can be supplied into the hollow portion Fa. By making the plasma from the plasma generator 10 surrounded by a “curtain” of water, it is possible to sufficiently suppress the interference of the plasma PS with the surrounding gas (for example, air). As a result, the plasma PS is cleaned. It becomes possible to deliver to the position P more reliably.
 なお、ここでは吐水口1が完全な環状である場合を例示したが、水の流れFがプラズマのガイドとしての役割を十分に果たすことができる限り、吐水口1の形状は完全な環状ではなくてもよい。図4及び図5に示すように、吐水口1の形状は不完全な環状であってもよい。図4に示す吐水口1はC字状に形成されている。図5に示す吐水口1は、プラズマ生成器10を囲うように配置された多数の開口1aからなる。吐水口1が不完全な環状である場合、すなわち、環状線に沿って形成された吐水口1の途中に開口していない部分(間欠部)が存在する場合、上記環状線に沿った間欠部の長さの合計をA、上記環状線に沿った吐水口の長さの合計をBとすると、(A/(A+B))の値は好ましくは0.8以下であり、より好ましくは0.5以下であり、更に好ましくは0.3以下である。当該値が0.8以下とすることで、水の流れFによるガイド機能を十分高くすることができる。 In addition, although the case where the water discharge port 1 was a perfect ring shape was illustrated here, as long as the flow F of water can fully fulfill | perform the role as a plasma guide, the shape of the water discharge port 1 is not a perfect ring shape. May be. As shown in FIGS. 4 and 5, the shape of the water discharge port 1 may be an incomplete ring shape. The water discharge port 1 shown in FIG. 4 is formed in a C shape. The water outlet 1 shown in FIG. 5 includes a large number of openings 1 a arranged so as to surround the plasma generator 10. When the spout 1 has an incomplete annular shape, that is, when there is a portion (intermittent portion) that is not open in the middle of the spout 1 formed along the annular line, the intermittent portion along the annular line. When the sum of the lengths is A and the sum of the lengths of the water discharge ports along the annular line is B, the value of (A / (A + B)) is preferably 0.8 or less, more preferably 0.8. 5 or less, more preferably 0.3 or less. When the value is 0.8 or less, the guide function by the water flow F can be sufficiently increased.
 図5には、一つの環状線に沿って配置された多数の開口1aによって吐水口1が構成される態様を例示したが、吐水口1の態様はこれに限定されない。例えば、複数列の吐水口、すなわち、多数の開口1aからなる吐水口1の外側及び/又は内側に別の環状線に沿って配置された多数の開口を更に形成してもよい。吐水口の配置を二重以上とすることで、水の流れFによるガイド機能をより高くすることができる。装置のコンパクト化の観点から、開口を配置する環状線の数は好ましくは10以下であり、より好ましくは5以下であり、更に好ましくは3以下である。吐水口1からの水の流れFがプラズマのガイドとしての役割を十分に果たすことができる限り、吐水口1の配置は環状に限定されず、例えば矩形又は三角形であってもよい。 FIG. 5 illustrates a mode in which the water outlet 1 is configured by a large number of openings 1a arranged along one annular line, but the mode of the water outlet 1 is not limited thereto. For example, you may further form many opening arrange | positioned along another cyclic | annular line in the outer side and / or inner side of the water outlet 1 which consists of multiple rows of water outlets, ie, many opening 1a. By making the arrangement of the spouts more than double, the guide function by the water flow F can be made higher. From the viewpoint of compacting the apparatus, the number of annular lines for disposing the openings is preferably 10 or less, more preferably 5 or less, and even more preferably 3 or less. As long as the water flow F from the water outlet 1 can sufficiently serve as a plasma guide, the arrangement of the water outlet 1 is not limited to an annular shape, and may be rectangular or triangular, for example.
 図6は、スパウト9の内部構造を模式的示す断面図である。スパウト9内には、混合水栓6からの水を吐水口1まで供給する流路9aと、スパウト9の先端部に内蔵されたプラズマ生成器10と、プラズマ生成器10にパルス電源30の電圧を印加するための複数のケーブル30a,30bと、送風機35からの空気をプラズマ生成器10まで供給する流路9bとを備える。 FIG. 6 is a cross-sectional view schematically showing the internal structure of the spout 9. In the spout 9, a flow path 9 a for supplying water from the mixing faucet 6 to the spout 1, a plasma generator 10 built in the tip of the spout 9, and the voltage of the pulse power supply 30 to the plasma generator 10 Are provided with a plurality of cables 30a and 30b, and a flow path 9b for supplying air from the blower 35 to the plasma generator 10.
 図7は、プラズマ生成器10を模式的に示す断面図である。図7に示すとおり、プラズマ生成器10は、棒状の電極11aと、電極11aの外側を覆うように配置された筒状の絶縁体12と、絶縁体12の外側を覆うように配置された筒状のアース電極11bとを有する。電極11aはアース電極11bの開口11cの方向に延びている。電極11aに高圧ケーブル30aが接続され、他方、アース電極11bにアースケーブル30bが接続されている。電極11aとアース電極11bとの間にパルス電圧が印加されると、両者の間で放電が発生し、これによりプラズマが生じる。アース電極11bは、先端部に開口11cを有する。電極11a及びアース電極11bの材質としては、タングステン、アルミニウム、銅、鉄などの金属が挙げられる。このうち、タングステンは融点が高く、また優れた硬度(強度)を有する。 FIG. 7 is a cross-sectional view schematically showing the plasma generator 10. As shown in FIG. 7, the plasma generator 10 includes a rod-shaped electrode 11a, a cylindrical insulator 12 arranged to cover the outside of the electrode 11a, and a cylinder arranged to cover the outside of the insulator 12. And a ground electrode 11b. The electrode 11a extends in the direction of the opening 11c of the ground electrode 11b. The high voltage cable 30a is connected to the electrode 11a, and the ground cable 30b is connected to the ground electrode 11b. When a pulse voltage is applied between the electrode 11a and the ground electrode 11b, a discharge is generated between them, thereby generating plasma. The ground electrode 11b has an opening 11c at the tip. Examples of the material of the electrode 11a and the ground electrode 11b include metals such as tungsten, aluminum, copper, and iron. Among these, tungsten has a high melting point and excellent hardness (strength).
 電極11aの直径の下限値は好ましくは0.01mmであり、より好ましくは0.1mmであり、更に好ましくは0.5mmであり、他方、その上限値は好ましくは10mmであり、より好ましくは5mmであり、更に好ましくは3mmである。電極11aの直径が0.01mm未満であると、使用時に折れたり、振動が発生したりしやすく、他方、直径が10mmを超えると電極11aが気体の流れを妨げやすい。電極11aの長さの下限値は好ましくは5mmであり、より好ましくは10mmであり、更に好ましくは20mmであり、他方、その上限値は好ましくは100mmであり、より好ましくは70mmであり、更に好ましくは50mm以下である。電極11aの長さが5mm未満であると、放電のための面積を十分に確保しにくく、プラズマの発生量が不十分となりやすく、他方、長さが100mmを超えると電極11a用のサポート又は大掛かりな漏電対策が必要となりやすい。 The lower limit of the diameter of the electrode 11a is preferably 0.01 mm, more preferably 0.1 mm, even more preferably 0.5 mm, while the upper limit is preferably 10 mm, more preferably 5 mm. And more preferably 3 mm. If the diameter of the electrode 11a is less than 0.01 mm, the electrode 11a is likely to be broken or vibrates during use, while if the diameter exceeds 10 mm, the electrode 11a tends to hinder gas flow. The lower limit of the length of the electrode 11a is preferably 5 mm, more preferably 10 mm, even more preferably 20 mm, while the upper limit is preferably 100 mm, more preferably 70 mm, and still more preferably. Is 50 mm or less. If the length of the electrode 11a is less than 5 mm, it is difficult to secure a sufficient area for discharge, and the amount of plasma generated tends to be insufficient. On the other hand, if the length exceeds 100 mm, the support for the electrode 11a or a large scale is required. It is easy to need a proper countermeasure against electric leakage.
 アース電極11bの開口直径の下限値は、好ましくは0.5mmであり、より好ましくは1mmであり、更に好ましくは5mmであり、他方、その上限値は好ましくは30mmであり、より好ましくは20mmであり、更に好ましくは10mmである。アース電極11bの開口直径が0.5mm未満であると、発生したプラズマを遠くまで到達させにくくなる傾向にあり、他方、30mmを超えると、大流量の気流を発生させる大型の送風機等が必要となりやすい。 The lower limit value of the opening diameter of the ground electrode 11b is preferably 0.5 mm, more preferably 1 mm, still more preferably 5 mm, while the upper limit value is preferably 30 mm, more preferably 20 mm. Yes, more preferably 10 mm. If the opening diameter of the earth electrode 11b is less than 0.5 mm, the generated plasma tends to be difficult to reach far away. On the other hand, if it exceeds 30 mm, a large blower or the like that generates a large flow of air is required. Cheap.
 アース電極11bは、図7に示すとおり、円板状のプレートの中央部に開口11cを有する。開口11cの延在方向の長さ(上記プレートの厚さ)の下限値は好ましくは1mmであり、より好ましくは1.3mmであり、更に好ましくは1.5mmであり、他方、その上限値は好ましくは5mmであり、より好ましくは4.5mmであり、更に好ましくは4mmである。開口11cの延在方向の長さが1mm未満であると、アース電極11bの強度が不十分となりやすく、他方、5mmを超えるとアース電極11bの重量及びコストが過剰となりやすい。 The earth electrode 11b has an opening 11c at the center of a disk-shaped plate as shown in FIG. The lower limit value of the length in the extending direction of the opening 11c (the thickness of the plate) is preferably 1 mm, more preferably 1.3 mm, still more preferably 1.5 mm, while the upper limit value is Preferably it is 5 mm, More preferably, it is 4.5 mm, More preferably, it is 4 mm. If the length in the extending direction of the opening 11c is less than 1 mm, the strength of the ground electrode 11b tends to be insufficient, while if it exceeds 5 mm, the weight and cost of the ground electrode 11b tend to be excessive.
 絶縁体12の材質としては、セラミック、樹脂、ガラス、紙などが挙げられる。セラミックは絶縁破壊電圧が高いため、セラミックを採用すると、優れた信頼性が得られるとともに装置を小型化できるという利点がある。樹脂は絶縁破壊電圧が比較的高く、また加工性が高いという利点がある。 Examples of the material of the insulator 12 include ceramic, resin, glass, paper, and the like. Since ceramic has a high dielectric breakdown voltage, the use of ceramic has the advantage that excellent reliability can be obtained and the apparatus can be miniaturized. Resins have the advantages of relatively high dielectric breakdown voltage and high processability.
 図6に示すように、プラズマ生成器10の先端部は、ユーザーの安全性を確保するため、絶縁体15で覆われている。絶縁体15に設けられた開口15aからプラズマPSが放出される。開口15aは、吐水口1によって囲われた位置に設けられている。開口15aから勢いよくプラズマを噴射させるため、水栓装置20Aはプラズマを押し流すための送風機35を備える。送風機35からの空気は、流路9bを通過した後、プラズマ生成器10に至り、開口15aからプラズマPSとともに噴射される。送風機35を使用することで、プラズマをより確実に洗浄位置Pまで届けることができる。送風機としてはポンプ及びファンなどの機器を備えたものを採用できる。ガスが充填されたガスボンベを使用して送風機を構成してもよい。 As shown in FIG. 6, the tip of the plasma generator 10 is covered with an insulator 15 to ensure the safety of the user. Plasma PS is emitted from an opening 15 a provided in the insulator 15. The opening 15 a is provided at a position surrounded by the water outlet 1. In order to jet plasma vigorously from the opening 15a, the faucet device 20A includes a blower 35 for sweeping away the plasma. The air from the blower 35 passes through the flow path 9b, reaches the plasma generator 10, and is injected together with the plasma PS from the opening 15a. By using the blower 35, the plasma can be delivered to the cleaning position P more reliably. As the blower, a blower equipped with devices such as a pump and a fan can be adopted. You may comprise a blower using the gas cylinder filled with gas.
 プラズマ生成器10による放電によってプラズマPSが発生する。放電を生じさせる場の雰囲気は空気であってもよいが、特定のガス種と空気との混合ガスであってもよい。特定のガス種としては、ヘリウム、ネオン、アルゴンなどの希ガス;フッ素、塩素などのハロゲン;水蒸気;窒素及び酸素などが挙げられる。このうち、希ガスの利点は化学的に不活性であり扱いが容易であり、またプラズマ状態を維持しやすい点である。ハロゲンの利点はイオン化エネルギー、電子親和力、電気陰性度などの物質分解能力が高い点である。窒素及び酸素の利点は安価であり豊富に利用されている点、また様々なラジカルを生成する点である。水蒸気の利点は殺菌力の高いヒドロキシラジカルの生成量増大に寄与する点である。なお、これらのガス種はそれぞれ単体で用いてもよいが、2以上のガス種を組み合わせて使用してもよい。これらのガス種は放電によってプラズマ化しやすく、またラジカルの状態が比較的長時間にわたって維持されるという性質を有する。特定のガス種を使用する場合は、送風機35からプラズマ生成器10へと空気を移送する配管内に特定のガス種を導入してもよいし、特定のガス種用の流路をプラズマ生成器10にまで設け、プラズマ生成器10に当該ガス種を直接導入してもよい。 Plasma PS is generated by the discharge by the plasma generator 10. The atmosphere in the place where the discharge is generated may be air, but may be a mixed gas of a specific gas type and air. Specific gas species include rare gases such as helium, neon, and argon; halogens such as fluorine and chlorine; water vapor; nitrogen and oxygen. Among these, the advantages of the rare gas are that it is chemically inert and easy to handle, and it is easy to maintain the plasma state. The advantage of halogen is its high ability to decompose substances such as ionization energy, electron affinity, and electronegativity. The advantages of nitrogen and oxygen are that they are inexpensive and abundantly used, and that they generate various radicals. The advantage of water vapor is that it contributes to an increase in the amount of hydroxy radicals that are highly sterilizing. These gas types may be used alone, or two or more gas types may be used in combination. These gas species are easily plasmatized by discharge, and have the property that the radical state is maintained for a relatively long time. When a specific gas type is used, the specific gas type may be introduced into a pipe for transferring air from the blower 35 to the plasma generator 10, and a flow path for the specific gas type is provided in the plasma generator. The gas species may be directly introduced into the plasma generator 10.
 上記特定のガス種は1種を単独で使用してもよく、複数種を組み合わせて使用してもよい。また、1種又は複数種の上記特定のガス種をプラズマ生成器10にそのまま供給してもよいし、上記特定のガス種と空気の混合ガスをプラズマ生成器10に供給してもよい。当該混合ガスに占める上記特定のガス種の体積割合は、好ましくは0.3以上であり、より好ましくは0.5以上であり、更に好ましくは0.8以上である。この体積割合を0.3以上とすることで、プラズマ生成器10から十分量のプラズマを発生させやすい。 The above specific gas species may be used alone or in combination of two or more. One or more kinds of the specific gas species may be supplied to the plasma generator 10 as they are, or a mixed gas of the specific gas type and air may be supplied to the plasma generator 10. The volume ratio of the specific gas species in the mixed gas is preferably 0.3 or more, more preferably 0.5 or more, and further preferably 0.8 or more. By setting the volume ratio to 0.3 or more, it is easy to generate a sufficient amount of plasma from the plasma generator 10.
 上記特定のガス種のなかでも、ヘリウムは他のガス種と比較して長い時間にわたってプラズマの状態を維持しやすい。このため、ヘリウムを使用することで、プラズマ生成器10から洗浄位置Pにまでの距離を確保しやすいという利点がある。ラジカルが発生してから消滅するまでの時間が100ナノ秒~1秒程度であれば、プラズマ生成器10の電極11aの先端から洗浄位置までの距離を5~50cm(好ましくは30cm程度)に設定することが可能である。洗浄位置Pまでより確実にプラズマを到達させるため、送風機からの送風量を調節したり、プラズマが通過する流路に円管又は先細ノズルを配置したりするなどの工夫をしてもよい。なお、殺菌効果と使い勝手の両立の観点から、プラズマ生成器10の電極11aの先端から、たらい部40の表面までの距離を20~60cmに設定することが好ましい。 Among the above specific gas types, helium tends to maintain the plasma state for a long time compared to other gas types. For this reason, there is an advantage that it is easy to secure a distance from the plasma generator 10 to the cleaning position P by using helium. If the time from generation of radicals to extinction is about 100 nanoseconds to 1 second, the distance from the tip of electrode 11a of plasma generator 10 to the cleaning position is set to 5 to 50 cm (preferably about 30 cm). Is possible. In order to make the plasma reach the cleaning position P more reliably, it may be devised to adjust the amount of air blown from the blower or to arrange a circular tube or a tapered nozzle in the flow path through which the plasma passes. From the standpoint of achieving both a bactericidal effect and ease of use, the distance from the tip of the electrode 11a of the plasma generator 10 to the surface of the tub 40 is preferably set to 20 to 60 cm.
 本実施形態においては、プラズマ生成器10の電源としてパルス電源を採用している(図6参照)。パルス電源30を使用することで、電子及びイオンのうち、質量が軽い電子を選択的に加速させることができ、これにより低温のプラズマを発生させることができる。その結果、不必要な熱の発生を抑制でき、熱損失を低減できる。パルス電源は、例えば、直流電源、コンデンサ、半導体スイッチ、昇圧器、磁気スイッチ等を使用して作製することができる(図8参照)。パルス電源の最大動作電圧は好ましくは1~100kVであり、パルス立ち上がり時間は好ましくは1~100nsであり、最大スイッチング周波数は好ましくは0.1~20kHzである。なお、パルス電源の代わりに、例えば直流電源又は高周波電源を採用してもよい。 In this embodiment, a pulse power source is adopted as the power source of the plasma generator 10 (see FIG. 6). By using the pulse power supply 30, electrons having a light mass among electrons and ions can be selectively accelerated, thereby generating low-temperature plasma. As a result, generation of unnecessary heat can be suppressed and heat loss can be reduced. The pulse power source can be manufactured using, for example, a DC power source, a capacitor, a semiconductor switch, a booster, a magnetic switch, and the like (see FIG. 8). The maximum operating voltage of the pulse power supply is preferably 1 to 100 kV, the pulse rise time is preferably 1 to 100 ns, and the maximum switching frequency is preferably 0.1 to 20 kHz. Instead of the pulse power source, for example, a DC power source or a high frequency power source may be employed.
 放電の形態としては、コロナ放電、グロー放電、アーク放電、無声放電等が挙げられる。これらの放電形態のうち、殺菌に有効な活性酸素種又はヒドロキシラジカルを効率的に発生させる観点から、パルス電源によるアーク放電又は無声放電を生じさせることが好ましい。 Examples of discharge forms include corona discharge, glow discharge, arc discharge, and silent discharge. Among these discharge modes, it is preferable to generate arc discharge or silent discharge by a pulse power source from the viewpoint of efficiently generating active oxygen species or hydroxy radicals effective for sterilization.
 図6に示すとおり、ユーザーの利便性の観点から、水栓装置20Aは吐水口1からの水の放出が開始されると、プラズマ生成器10がプラズマを自動的に発生するようにプラズマ生成器10を制御する制御部50を更に備えることが好ましい。制御部50は例えばセンサー又はコンピュータ等を使用して構成することができる。 As shown in FIG. 6, from the viewpoint of user convenience, the faucet device 20 </ b> A is configured so that when the discharge of water from the spout 1 is started, the plasma generator 10 automatically generates plasma. It is preferable to further include a control unit 50 for controlling 10. The control unit 50 can be configured using, for example, a sensor or a computer.
 本実施形態に係る水栓装置20Aによれば、中空部Faを有する水の流れFによってプラズマPSを洗浄位置Pまで安定的に到達させることができる。これにより、水による物理的な洗浄と、ラジカルによる殺菌処理を同時に実施することができる。特に、洗浄位置Pにおいてプラズマ生成器からのプラズマと水とが接触することにより、対象物の近傍で殺菌能力が高いヒドロキシラジカルを発生させることができる。 According to the faucet device 20A according to the present embodiment, the plasma PS can stably reach the cleaning position P by the water flow F having the hollow portion Fa. Thereby, the physical washing | cleaning by water and the sterilization process by a radical can be implemented simultaneously. In particular, when the plasma from the plasma generator and water come into contact with each other at the cleaning position P, it is possible to generate hydroxy radicals having high sterilizing ability in the vicinity of the object.
 水栓装置20Aによれば、プラズマによって細菌及びウイルスの両方を殺菌効果を期待できる。各種ラジカル(特に酸化力の強いヒドロキシラジカル)が細菌及びウイルスを構成する蛋白質及び脂質と反応し、これらを破壊することで細菌及びウイルスを不活化し感染性をなくすと考えられる。 According to the faucet device 20A, it is possible to expect a sterilizing effect for both bacteria and viruses by plasma. It is considered that various radicals (particularly hydroxy radicals having strong oxidizing power) react with proteins and lipids constituting bacteria and viruses and destroy them to inactivate bacteria and viruses and eliminate infectivity.
<第二実施形態>
 第一実施形態においては、図3に示すように、水の流れFがプラズマPSをガイドする役割を果たす場合を例示したが、プラズマ生成器10を吐水口1の近傍以外の位置に設けるとともに、プラズマ生成器10で発生したプラズマを洗浄位置Pに導くためのプラズマ用ガイドを水栓装置が具備してもよい。図9は第二実施形態に係るシンク200の斜視図である。図9に示す水栓装置20Bは、プラズマ生成器10がスパウト9に設けられている点において、第一実施形態と相違する。プラズマは筒状のガイド60を通過することによって洗浄位置Pに向けて放出される。本実施形態においては、より確実にプラズマPSを洗浄位置Pまで届けることを可能にするため、送風機35(図6参照)からの空気をプラズマ生成器10に供給できるように構成されている。ガイド60の材質としては樹脂、金属などの材料が挙げられ、これらのうち加工性、耐水性及び耐薬剤性の観点から樹脂材料が好ましい。
<Second embodiment>
In the first embodiment, as illustrated in FIG. 3, the case where the water flow F plays a role of guiding the plasma PS is illustrated, but the plasma generator 10 is provided at a position other than the vicinity of the water outlet 1, The faucet device may include a plasma guide for guiding the plasma generated by the plasma generator 10 to the cleaning position P. FIG. 9 is a perspective view of the sink 200 according to the second embodiment. The faucet device 20B shown in FIG. 9 is different from the first embodiment in that the plasma generator 10 is provided in the spout 9. The plasma is emitted toward the cleaning position P by passing through the cylindrical guide 60. In the present embodiment, the air from the blower 35 (see FIG. 6) can be supplied to the plasma generator 10 in order to more reliably deliver the plasma PS to the cleaning position P. Examples of the material of the guide 60 include materials such as resin and metal. Among these, a resin material is preferable from the viewpoint of processability, water resistance, and chemical resistance.
<第三実施形態>
 第一及び第二実施形態においては、水栓装置がプラズマ生成器10を備える場合を例示したが、シンクのたらい部40がプラズマ生成器10を備えてもよい。図10は第三実施形態に係るシンク300の斜視図である。図10に示すシンク300は、プラズマ生成器10がたらい部40に設けられている点において、第一及び第二実施形態と相違する。図10に示すシンク300は、洗浄位置Pに洗浄対象(手など)が配置されると、センサーの働きによって自動的に水を吐出する水栓装置20Cと、水栓装置20Cと並ぶように配置されたプラズマ生成器10と、プラズマ生成器10と反対側の位置であって水栓装置20Cと並ぶように配置された水石けん供給栓70とを備える。プラズマPSは筒状のガイド60を通過することによって洗浄位置Pに向けて放出される。より確実にプラズマPSを洗浄位置Pまで届けることを可能にするため、送風機35(図6参照)からの空気をプラズマ生成器10に供給できるように構成されている。
<Third embodiment>
In the first and second embodiments, the case where the faucet device includes the plasma generator 10 is illustrated, but the sink basin 40 may include the plasma generator 10. FIG. 10 is a perspective view of the sink 300 according to the third embodiment. The sink 300 shown in FIG. 10 is different from the first and second embodiments in that the plasma generator 10 is provided in the tub 40. The sink 300 shown in FIG. 10 is arranged so as to be aligned with the faucet device 20C and the faucet device 20C that automatically discharges water by the action of the sensor when the object to be cleaned (such as a hand) is arranged at the cleaning position P. And a water soap supply plug 70 arranged at a position opposite to the plasma generator 10 and in line with the water faucet device 20C. The plasma PS is emitted toward the cleaning position P by passing through the cylindrical guide 60. In order to more reliably deliver the plasma PS to the cleaning position P, the air from the blower 35 (see FIG. 6) can be supplied to the plasma generator 10.
 本発明によれば、ユーザーにとっては水栓装置から吐出される水を使用した従来の洗浄と同様の感覚でありながら、対象物に対してより高度な殺菌処理を施すことが可能である。 According to the present invention, it is possible for a user to perform a more advanced sterilization treatment on an object while having the same feeling as a conventional cleaning using water discharged from a faucet device.
1…吐水口、1a…開口(吐水口)、6…混合水栓(バルブ)、10…プラズマ生成器、15a…プラズマが放出される開口、20A,20B,20C…水栓装置、30…パルス電源、35…送風機、40…たらい部、50…制御部、60…ガイド、100,200,300…シンク、F…水の流れ、Fa…中空部、P…洗浄位置、PS…プラズマ。 DESCRIPTION OF SYMBOLS 1 ... Water outlet, 1a ... Opening (water outlet), 6 ... Mixed water tap (valve), 10 ... Plasma generator, 15a ... Opening from which plasma is emitted, 20A, 20B, 20C ... Water faucet device, 30 ... Pulse Power source, 35 ... blower, 40 ... trough part, 50 ... control part, 60 ... guide, 100, 200, 300 ... sink, F ... flow of water, Fa ... hollow part, P ... cleaning position, PS ... plasma.

Claims (13)

  1.  吐水口と、
     前記吐水口からの水の放出と停止とを切り替えるバルブと、
     プラズマ生成器と、
    を備え、
     前記吐水口から放出される水が中空部を有する流れを形成するように、前記吐水口は完全又は不完全な環状に形成されており、
     前記プラズマ生成器からのプラズマが前記水の流れの前記中空部内に供給されるように、前記プラズマが放出される開口は前記吐水口に囲われた位置に設けられている、殺菌機能付き水栓装置。
    The spout,
    A valve for switching between water discharge and stop from the water outlet;
    A plasma generator;
    With
    The water outlet is formed in a complete or incomplete ring shape so that the water discharged from the water outlet forms a flow having a hollow portion,
    A faucet with a sterilizing function, wherein an opening through which the plasma is released is provided at a position surrounded by the water outlet so that the plasma from the plasma generator is supplied into the hollow portion of the water flow apparatus.
  2.  吐水口と、
     前記吐水口からの水の放出と停止とを切り替えるバルブと、
     プラズマ生成器と、
     前記プラズマ生成器からのプラズマを、前記吐水口から放出される水の軌道の途中であって処理の対象物に対して水が当たる洗浄位置まで導くガイドと、
    を備える、殺菌機能付き水栓装置。
    The spout,
    A valve for switching between water discharge and stop from the water outlet;
    A plasma generator;
    A guide for guiding the plasma from the plasma generator to a cleaning position in the middle of a trajectory of water discharged from the spout and where water hits an object to be treated;
    A faucet device with a sterilizing function.
  3.  プラズマを押し流すための送風機を更に備える、請求項1又は2に記載の水栓装置。 The faucet device according to claim 1 or 2, further comprising a blower for sweeping away the plasma.
  4.  前記プラズマ生成器に対してヘリウムガスを供給できるように構成されており、前記プラズマ生成器はヘリウムのラジカルを発生させる、請求項1~3のいずれか一項に記載の水栓装置。 The faucet device according to any one of claims 1 to 3, wherein helium gas is supplied to the plasma generator, and the plasma generator generates helium radicals.
  5.  前記プラズマ生成器から洗浄位置までの距離は5~50cmの範囲である、請求項1~4のいずれか一項に記載の水栓装置。 The faucet device according to any one of claims 1 to 4, wherein a distance from the plasma generator to a cleaning position is in a range of 5 to 50 cm.
  6.  洗浄位置において、前記吐水口からの水に前記プラズマ生成器からのプラズマに含まれるラジカルが当たることによってヒドロキシラジカルが発生する、請求項1~5のいずれか一項に記載の水栓装置。 The faucet device according to any one of claims 1 to 5, wherein a hydroxyl radical is generated when a radical contained in the plasma from the plasma generator hits water from the spout at a cleaning position.
  7.  前記吐水口からの水の放出が開始されると、前記プラズマ生成器が自動的にプラズマを発生するように前記プラズマ生成器を制御する制御部を更に備える、請求項1~6のいずれか一項に記載の水栓装置。 7. The apparatus according to claim 1, further comprising a control unit that controls the plasma generator so that the plasma generator automatically generates plasma when the discharge of water from the water outlet is started. The water faucet device according to item.
  8.  前記プラズマ生成器の電源としてパルス電源を備える、請求項1~7のいずれか一項に記載の水栓装置。 The faucet device according to any one of claims 1 to 7, further comprising a pulse power source as a power source of the plasma generator.
  9.  請求項1~8のいずれか一項に記載の水栓装置と、
     前記水栓装置からの水を受ける位置に設けられ且つ排水口を有するたらい部と、
    を備える、殺菌機能付きシンク。
    A faucet device according to any one of claims 1 to 8,
    A trough portion provided at a position for receiving water from the faucet device and having a drain;
    Sink with sterilization function.
  10.  水栓装置と、たらい部とを備えるシンクであって、
     前記水栓装置は、吐水口と、前記吐水口からの水の放出と停止とを切り替えるバルブとを有し、
     前記たらい部は、前記水栓装置からの水を受ける位置に設けられ、且つ、排水口と、プラズマ生成器と、前記吐水口から放出される水の軌道の途中であって処理の対象物に対して水が当たる洗浄位置に、前記プラズマ生成器からのプラズマを導くガイドとを有する、殺菌機能付きシンク。
    A sink comprising a faucet device and a basin,
    The faucet device has a water outlet, and a valve that switches between discharging and stopping water from the water outlet,
    The trough portion is provided at a position to receive water from the faucet device, and is in the middle of a trajectory of water discharged from the drain port, the plasma generator, and the spout port, and is an object to be processed. A sink with a sterilizing function, having a guide for guiding the plasma from the plasma generator at a cleaning position where water hits.
  11.  プラズマを押し流すための送風機を更に備える、請求項10に記載のシンク。 The sink according to claim 10, further comprising a blower for flushing the plasma.
  12.  前記吐水口からの水の放出が開始されると、前記プラズマ生成器が自動的にプラズマを発生するように前記プラズマ生成器を制御する制御部を更に備える、請求項10又は11に記載のシンク。 12. The sink according to claim 10, further comprising a control unit that controls the plasma generator such that the plasma generator automatically generates plasma when water discharge from the water outlet is started. .
  13.  前記プラズマ生成器の電源としてパルス電源を備える、請求項10~12のいずれか一項に記載のシンク。 The sink according to any one of claims 10 to 12, comprising a pulse power source as a power source of the plasma generator.
PCT/JP2014/057853 2014-03-20 2014-03-20 Water faucet device having bactericidal function, and sink WO2015141000A1 (en)

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