WO2015105379A1 - Novel novolac hardener having alkoxysilyl group, method for preparing same, composition containing same, hardened product, and use thereof - Google Patents

Novel novolac hardener having alkoxysilyl group, method for preparing same, composition containing same, hardened product, and use thereof Download PDF

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Publication number
WO2015105379A1
WO2015105379A1 PCT/KR2015/000243 KR2015000243W WO2015105379A1 WO 2015105379 A1 WO2015105379 A1 WO 2015105379A1 KR 2015000243 W KR2015000243 W KR 2015000243W WO 2015105379 A1 WO2015105379 A1 WO 2015105379A1
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Prior art keywords
formula
composition
group
formulas
curing agent
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PCT/KR2015/000243
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French (fr)
Korean (ko)
Inventor
전현애
김윤주
박수진
박숙연
탁상용
박성환
Original Assignee
한국생산기술연구원
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Priority claimed from KR1020150002675A external-priority patent/KR101664948B1/en
Application filed by 한국생산기술연구원 filed Critical 한국생산기술연구원
Priority to JP2016545968A priority Critical patent/JP6282352B2/en
Priority to EP15735456.4A priority patent/EP3093304B1/en
Priority to US15/110,677 priority patent/US10519274B2/en
Priority to CN201580012579.6A priority patent/CN106103532B/en
Publication of WO2015105379A1 publication Critical patent/WO2015105379A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used

Definitions

  • New novolac curing agents having alkoxysilyl groups preparation methods thereof, compositions comprising the same, cured products and uses thereof
  • the present invention is a novel novolac curing agent having an alkoxysilyl group exhibiting excellent heat resistance in the composite (hereinafter also referred to as 'new novolac curing agent' or 'novolak curing agent of the present invention'), a method for preparing the same, a composition comprising the same, It relates to a cured product thereof and its use.
  • the present invention has in the composite material, an excellent heat resistance, specifically, the low thermal expansion characteristics, (also which includes a Tg less does not exhibit a glass transition temperature) Glass jeonyieun lift, and a group, alkoxysilyl group that exhibits good flame retardant New novolac curing agents, methods for preparing the same, compositions comprising the same, cured products thereof and uses thereof.
  • the low thermal expansion characteristics also which includes a Tg less does not exhibit a glass transition temperature
  • Glass jeonyieun lift and a group, alkoxysilyl group that exhibits good flame retardant New novolac curing agents, methods for preparing the same, compositions comprising the same, cured products thereof and uses thereof.
  • the thermal expansion coefficient of epoxy resin is about 50 ⁇ 80 ppm / ° C, and the thermal expansion coefficient of ceramic material and metal material which are inorganic particles (for example, the thermal expansion coefficient of silicon is 3 ⁇ 5 ppm / ° C, the thermal expansion coefficient of copper is 17ppm / ° C.)
  • the coefficient of thermal expansion is very large, several times to several ten times.
  • the coefficient of thermal expansion significantly limits the design and processing of parts.
  • new epoxy resins generally have (1) complexing epoxy resins with inorganic particles (inorganic fillers) and / or glass fibers or (2) reduced CTEs.
  • a method of designing has been used.
  • inorganic particles as epoxy resin and filler In the case of complexation, the use of a large amount of non-subsidiary silica particles of about 2-30 ⁇ size can reduce CTE.
  • the improved heat resistance in the composite material specifically, there is provided a new novolak curing agent having an alkoxysilyl group representing a low CTE and a high glass transition temperature and excellent flame retardancy.
  • the improved composites specifically low CTE, high glass transition temperature and good flame retardancy A method for producing a new novolac curing agent having an alkoxysilyl group is provided.
  • composition comprising a new novolac curing agent having an alkoxysilyl group which exhibits improved heat resistance in the composite, specifically low CTE, high glass transition temperature and good flame retardancy.
  • a cured product of a composition comprising a new novolac curing agent having an alkoxysilyl group exhibiting improved heat resistance properties, in particular low CTE, high glass transition temperature and excellent flame retardancy in the composite.
  • curing agent which has an alkoxylsilyl group is provided.
  • a novolak curing agent having at least one alkoxysilyl group selected from the group consisting of the following formulas (1-1) to (1-4). [Formula 1-1]
  • Z is one of the groups consisting of the following Chemical Formulas 1A to 1F.
  • X-cr And R is a C1-C10 straight or branched alkyl group.
  • At least one A is of formula A2 or A3, if at least one is A2, the remaining A is of formula B2 or hydrogen, if at least one is A3, the remaining A is hydrogen, and n is an integer of at least 1 .
  • R 3 is a straight or branched chain alkoxy group having 1 to 5 carbon atoms, the remainder is a straight chain black or branched alkyl group having 1 to 10 carbon atoms, m is an integer of 3 to 10 to be.
  • X is one group group consisting of the following formulas 2A to 2F.
  • R is a C1-C10 linear or branched alkyl group.
  • D may be represented by Formula B2, and the remainder may be hydrogen.
  • N is an integer of 1 or more. to be.
  • X is CI, Br, I,-S0 2 ⁇ CH 3 ,-S0 2 _CF 3 , or -0-S0 2 -C 6 — CH 3 )
  • R a to R c is a straight chain or molecular chain C1-C5 alkoxy group, and the rest is a straight chain black branched CI—C10 alkyl group.
  • X is And Where R is a C1-C10 straight or branched alkyl group.
  • R 3 is a linear or branched alkoxy group having 1 to 5 carbon atoms, the remainder is a straight chain black or branched alkyl group having 1 to 10 carbon atoms, and m is an integer of 3 to 10.
  • the first step corresponds to one equivalent of the hydroxy group of the starting material of one of Formulas IA-1 to IA-4.
  • a process for producing a novolak curing agent having an alkoxysilyl group which is carried out by reacting an alkylene group of the alkenyl compound of the formula [pi] to 0.01 to 10 equivalents.
  • the first step is a method for preparing a novolak curing agent having an alkoxysilyl group, which is performed by reacting for 120 hours at -20 ° C to 100 ° C for 1 hour.
  • the second step is an alkoxysilane equivalent to 1 equivalent of the alkenyl group of one of the intermediates of Formulas IB-1 to IB-4.
  • a process for producing a novolac curing agent having an alkoxysilyl group which is carried out by reacting to 0.1 equivalents to 5 equivalents.
  • the second step is a method for preparing a noblock curing agent having an alkoxysilyl group, which is carried out by reacting at 20 ° C. to 12 CTC for 1 to 72 hours.
  • a starting material of any one of the following formulas IA-1 to IA-4 is reacted with an alkoxysilane of the following formula ⁇ to have a structure of formula A3.
  • X is one of the groups consisting of the following Formulas 2A to 2F.
  • n is an integer of 1 or more.
  • R 3 is a straight or branched chain alkoxy group having 1 to 5 carbon atoms, the rest is a straight or branched chain alkyl group having 1 to 10 carbon atoms, and m is an integer of 3 to 10.
  • X is And R is a C1-C10 straight or branched alkyl group
  • the alkoxysilylation step is performed so that the alkoxysilane is 0.1 to 5 equivalents to 1 equivalent of the hydroxy group of the starting material of one of Formulas I A-1 to IA-4. the production method of the novolac curing agent having an "alkoxysilyl group provided that banung was performed.
  • the alkoxysilylation step provides a method for preparing a novolac curing agent having an alkoxysilyl group, which is performed by reacting at -20 ° C to 120 ° C for 1 to 72 hours.
  • a composition comprising an epoxy resin and a novolac curing agent having at least one alkoxysilyl group selected from the group consisting of the following formulas 1-1 to 1-4.
  • X is And R is a straight or branched chain alkyl group of Cl-ClO.
  • At least one A is of formula A2 or A3 and at least one is A2 Remaining A is the following formula B2 or hydrogen, when at least one is A3, the remaining A is hydrogen, n is an integer of 1 or more.
  • R 3 is a straight or branched chain alkoxy group having 1 to 5 carbon atoms, the rest is a straight or branched chain alkyl group having 1 to 10 carbon atoms, and m is an integer of 3 to 10. .
  • the epoxy resin is a glycidyl ether epoxy resin, glycidyl epoxy resin, glycidylamine epoxy resin And at least one composition selected from the group consisting of glycidyl ester epoxy resins.
  • the epoxy resin has a core structure of bisphenol, biphenyl, naphthalene, benzene, thiodiphenol, fluorene, anthracene, isocyanurate, and triphenylmethane.
  • a composition having 1,1,2,2-tetraphenylethane, tetraphenylmethane, 4,4'-diaminodiphenylmethane, aminophenol, alicyclic, aliphatic, or novolak unit is provided.
  • the epoxy resin is provided with a composition comprising an epoxy resin with or without an alkoxysilyl group.
  • a composition further comprising inorganic particles or / and fibers as a filler is provided.
  • the inorganic particles are at least one composition selected from the group consisting of silica, zirconia, titania, alumina, silicon nitride, aluminum nitride, and silsesquioxane.
  • the inorganic particles are provided with a composition containing 5 wt% to 95% based on the total weight of solids of the composition.
  • the inorganic particles A composition is provided that includes 30 wt% to 95% based on the total weight of solids.
  • the inorganic particles are provided in a range of 5 wt% to 6 (1 ⁇ 2 «based on the total weight of solids of the composition.
  • the fiber is glass fiber selected from the group consisting of E glass fiber, T glass fiber, S glass fiber, NE glass fiber, H glass fiber, and quartz; and liquid crystal polyester fiber, polyethylene terephthalate fiber, wholly aromatic fiber, polybenzoxazole fiber, nylon fiber, polyethylene naphthalate fiber, polypropylene fiber, polyethersulfone fiber, polyvinylidene fluoride fiber, polyethylene sulfide fibers, ⁇ and a polyether selected from the group consisting of ketone fiber At least one composition selected from the group consisting of organic fibers is provided.
  • the fiber was provided with the composition which is E glass fiber .
  • the composition is the T glass fiber in 19th aspect.
  • a composition is provided which comprises from 10 wt% to 90 3 ⁇ 4 with respect to the total weight of solids.
  • a composition further comprising inorganic particles is provided.
  • a composition further comprising an alkoxysilyl group semi-aqueous catalyst is provided.
  • the alkoxysilyl group reaction catalyst is selected from nitric acid, sulfuric acid, hydrochloric acid, acetic acid, phosphoric acid, ammonia, K0H, NH 4 0H, amine, transition metal alkoxide, and tin (t in) compound.
  • At least one composition selected from the group consisting of is provided.
  • the composition is provided in which the semi-aqueous catalyst is contained in an amount of 0.01 phr to 10 phr relative to the epoxy resin having an alkoxysilyl group.
  • a composition further comprising water is provided.
  • the electronic material containing the composition in any one of 10th-27th aspect is provided. According to the 29th opinion, the 10th to 27th opinions
  • a substrate comprising. According to the thirtieth opinion, tenth to twenty-seventh opinion
  • a film comprising is provided.
  • a laminate comprising a metal worm on a base layer made of the composition of any one of the tenth to twenty-seventh aspects.
  • a printed wiring board including a laminated board is provided.
  • a semiconductor device including a printed wiring board is provided.
  • a semiconductor packaging material comprising the composition of any one of the tenth to twenty-seventh aspects.
  • a semiconductor device including a semiconductor packaging material is provided.
  • an adhesive comprising the composition of any one of the tenth to twenty seventh aspects.
  • a paint comprising the composition of any one of the crabs 10 to 27.
  • a composite material comprising the composition of any one of the tenth to twenty seventh aspects.
  • a prepreg comprising the composition of any one of the tenth to twenty-seventh symptoms.
  • positioned at the prepreg is provided.
  • the cured product of any one of the tenth to twenty-seventh symptom compositions is provided.
  • a cured product of the composition having a thermal expansion coefficient of 60 ppm / ° C. or less is provided.
  • the glass transition temperature does not represent a higher or a glass transition temperature greater than 100 ° C is provided in the.
  • composition comprising a new novolac curing agent having an alkoxysilyl group according to the present invention is used in the composite and / or cured product to form an interfacial bond between an alkoxysilyl group and a filler (fibers and / or inorganic particles) and to react an alkoxysilyl group with an epoxy and a curing agent.
  • the formation of further chemical bonds by means of improved heat resistance. That is, the CTE of the epoxy composite is reduced and the glass transition degree is increased or the glass transition temperature is not exhibited (hereinafter referred to as 'Tg lease').
  • curing agent which has the alkoxy silyl group by this invention shows the outstanding flame retardance by introduction of the alkoxy silyl group.
  • the novel novolak curing agent having an alkoxysilyl group according to the present invention is easy to be solidified (sol id) to an epoxy resin having an alkoxysilyl group, so that it is easy to be applied to a process requiring a solid phase sample, and brittleness of the cured product. (br it leness) and adhesion are improved.
  • the composition according to the present invention to a metal film of a substrate, the chemical film of the functional group on the surface of the metal film and the alkoxysilyl group is applied to the metal film. Excellent adhesion.
  • FIG. 1 is a result of measuring the length change with the temperature of the glass fiber composite body by Example 1 and the comparative example 1.
  • FIG. 1 is a result of measuring the length change with the temperature of the glass fiber composite body by Example 1 and the comparative example 1.
  • the present invention has improved heat resistance properties when forming a composite using a composition comprising a curing agent having an alkoxysilyl group, specifically having a low CTE and a high Tg (including Tg lease) and / or having an alkoxysilyl group having excellent flame retardancy in the cured product. It is to provide a new novolac curing agent, a method for preparing the same, a curing agent composition and a cured product comprising the same, and uses thereof.
  • composite or epoxy composite refers to a cured product of a composition comprising an epoxy resin curing agent and a filler (fibers and / or inorganic particles).
  • the term "cured or epoxy cured product” refers to a cured product of a composition comprising an epoxy resin and a curing agent.
  • cured material of a composition is said.
  • the cured product may include a semi-cargo.
  • inorganic particles And / or a cured product reinforced with fibers so that the cured product has a broader meaning than the composite, but an inorganic particle. And / or a cured product reinforced with fibers may be understood to have the same meaning as the composite.
  • the new novolac curing agent according to the present invention forms an interfacial bond with the surface of the filler (fibers and / or inorganic particles) and / or an alkoxysilyl group, an epoxide group and a phenol group and a chemical bond when the complex is formed by curing. Therefore, it shows low CTE and high glass transition temperature synergistic effect or Tg-less (less). Therefore, the dimensional stability is improved.
  • the cured product including the novolac curing agent according to the present invention exhibits excellent flame retardancy.
  • composition according to the present invention is applied to a chemically treated metal film, for example, copper foil, and the like, and the alkoxysilyl group of the curing agent is applied to the metal surface.
  • a chemically treated metal film for example, copper foil, and the like
  • the alkoxysilyl group of the curing agent is applied to the metal surface.
  • it is chemically bonded with -0H group on the metal surface by treatment, it shows excellent adhesion with metal film.
  • a novolak curing agent having any one alkoxysilyl group selected from the group consisting of the following formulas I '1 to 1-4. [Formula I ⁇ 1]
  • Z is one of the groups consisting of the following Chemical Formulas 1A to 1F.
  • X is And R is a straight or branched alkyl group of CI—CIO.
  • At least one of the plurality of A is of formula A2 or A3; At least when one of A2, and when the remaining A are hydrogen or the formula B2, at least one of which is A3, and the remaining A are hydrogen.
  • n is 1 or more, for example, the integer of 1-1000.
  • R 3 and R 3 are an alkoxy group having 1 to 5 carbon atoms, preferably an alkoxy group having 3 to 3 carbon atoms. More preferably, it is a methoxy group or a special group. The remainder is a C1-C10 alkyl group, m is an integer of 3-10, Preferably it is an integer of 3-6.
  • the alkoxy group and the alkyl group may be straight chain black or branched chain.
  • an "alkoxy group” is a monovalent group which is —OR (R is an alkyl group), which may be linear or branched, In this specification, the branched chain and the branched chain may be used interchangeably.
  • an "alkyl group” refers to a monovalent ent hydrocarbon group, which may be linear or branched, and preferably 1 It has a carbon number of 10 to 10, More preferably, it has a carbon number of 1 to 5. Furthermore, the alkoxysilyl group by one Embodiment of the said invention is mentioned.
  • the novolac curing agent having exhibits low CTE and high glass transition temperature or Tg-less when forming a composite of the composition comprising the same.
  • the novolac curing agent having an alkoxysilyl group represented by Chemical Formulas 1-1 to 1-4 may be synthesized by the following method.
  • the manufacturing method of the novolak hardening agent which has an alkoxy silyl group mentioned later is simple and simple compared with the manufacturing method of the epoxy resin which has an alkoxy silyl group.
  • a reaction of a hydroxy group in the starting material by reaction of a starting material of one of the following formulas IA-1 to ⁇ -4 (hereinafter, also referred to as 'starting material' or 'starting material IA') and alkenyl of the formula
  • a starting material of one of the following formulas IA-1 to ⁇ -4 hereinafter, also referred to as 'starting material' or 'starting material IA'
  • alkenyl of the formula At least one of the alkenylated intermediates of any one of formulas IB ′ 1 to IB-4 (hereinafter referred to as “intermediate IB”).
  • X in Formula IA ′ 1 is one of a group consisting of Formulas 2A to 2F.
  • R is a C1-C10 linear or branched alkyl group.
  • n is an integer of 1 or more.
  • n is an integer of 1 or more, for example, an integer of 1 to 1000, which includes all integers in these ranges and any other smaller range of integers. It means.
  • p is 1 or 2.
  • is selected from the group consisting of the following formulas 3A to 3F One.
  • R is a C1-C10 linear or branched alkyl group.
  • At least one of a plurality of D may be represented by Formula B2, and the rest may be hydrogen.
  • n is an integer of 1 or more.
  • p is 1 or 2.
  • 1 is an integer of 1-8, Preferably it is an integer of 1-4.
  • Alkenylation the reaction of the first step, is carried out by reacting the starting material of one of the above formulas IA-1 to IA-4 with the alkenyl compound of the formula ⁇ , which reaction is carried out in the presence of a base and an optional solvent.
  • the starting material and the alkenyl compound may be reacted in the presence of a base and an optional solvent such that the alkenyl compound corresponds to 1 equivalent of the hydroxy group of the starting material and the alkenyl group is from 0.1 to 10 equivalents.
  • Get IB The reaction product is reacted with a stoichiometric equivalence ratio, and in consideration of this, the reaction product is reacted with the equivalence ratio to obtain a desired intermediate product IB.
  • the reaction temperature and reaction time of the first step reaction are dependent on the type of reactant, but, for example, the intermediate product IB is obtained by reacting the reaction at 20 ° C. to 100 ° C. for 1 hour to 120 hours.
  • bases examples include, but are not limited to, for example, KOH, NaOH, 2 C0 3 , Na 2 C0 3 , KHC0 3 , NaHC0 3) NaH, triethylamine, diisopropylethyl Amines. These bases may be used alone or in combination of two or more of them.
  • the base may be used in an amount of 0.01 to 5 equivalents based on 1 equivalent of the hydroxy group of the starting material IA in terms of reaction efficiency.
  • the solvent may optionally be used as necessary. For example, the solvent may not be used if the viscosity of the reactants at the reaction temperature is suitable for the reaction to proceed without reaction in the first step reaction.
  • the reaction product can be dissolved well, and any organic solvent can be used as long as it can be easily removed after the reaction without adversely affecting the reaction.
  • acetonitrile, tetrahydrofuran (THF), methyl ethyl ketone (MEK), dimethyl formamicle (DMF), dimethyl sul foxide (DMMS0), methylene chloride (MC), 3 ⁇ 40, alcohols and roluene can be used. have.
  • the intermediate product IB is obtained by alkoxysilylation.
  • curing agent of Formula 1-1 to 1-4 which has substituent A2 by one embodiment of the invention is obtained.
  • This reaction can be carried out in the presence of a catalyst and any solvent, in which case a platinum catalyst is preferred. In the second stage reaction.
  • the alkoxysilane of the general formula ⁇ is 0 to 1 equivalent of the alkenyl group of the intermediate product IB.
  • Intermediate IB is reacted with an alkoxysilane of the formula
  • R a to R c is a C1-C5 alkoxy group, preferably a C1-C3 alkoxy group, more preferably a mesophilic or ethoxy group and the remainder is an ⁇ - ⁇ alkyl group, the alkoxy group And the alkyl group may be straight chain black branched chain.
  • the reaction temperature and reaction time of the second stage reaction vary depending on the reactant, but for example, a novolak curing agent of the formulas 1-1 to 1-4 having a substituent A2 by reacting for 1 hour to 72 hours at 2CTC to 120 ° C. Is obtained.
  • the platinum catalyst that can be used in the second reaction reaction is not limited thereto.
  • a platinum catalyst of Pt3 ⁇ 4 or H 2 PtCl 6 may be used.
  • the platinum catalyst is preferably used in an amount of lxlO— 4 to 0.05 equivalents based on 1 equivalent of the alkenyl group of the intermediate product IB in terms of reaction efficiency.
  • the solvent in the second stage reaction can optionally be used as needed.
  • a separate water banung viscosity at the reaction temperature without a solvent, in the "second reaction step suitable for the reaction proceeds may not use a solvent.
  • a separate solvent is not required, which can be easily determined by those skilled in the art.
  • the reaction product can be dissolved well, and any aprotic solvent can be used as long as it can be easily removed after the reaction without any adverse effect on the reaction.
  • any aprotic solvent can be used as long as it can be easily removed after the reaction without any adverse effect on the reaction.
  • toluene, acetonitrile, tetrahydrofuran (THF), methyl ethyl ketone ( ⁇ ), dimethyl formamide (DMF), dimethyl sul foxide (DMSO), methylene chloride (MC), and the like Can be used.
  • solvents may be used alone or in combination of two or more.
  • the amount of the solvent used is not particularly limited, and may be used in a suitable amount and / or concentration within a range in which the reactants are sufficiently dissolved and do not adversely affect the reaction, and those skilled in the art may select appropriately in consideration of this. have.
  • An exemplary reaction method of the above-described preparation method (1) of Formula 1-1, wherein Z is IA, is as follows.
  • At least one of the plurality of substituents A of Formulas 1-1 to 1-4 is a structure of Formula A2 (ie, an alkoxysilyl group), and the rest May be hydrogen.
  • the number of alkoxysilyl groups in the formula (1-1) to (1-4) is the first of the reaction 1
  • the equivalence and reaction of the alkenyl compound can be varied by controlling the number of hydroxy groups to be alkenylated by controlling the degree. This can be appropriately adjusted by those skilled in the art in view of the reaction from the above disclosure.
  • the starting material is an alkoxysilylation of one of the formulas IA-1 to IA-4 to obtain a novolak curing agent of one of formulas 1-1 to 1-4 having a substituent of formula A3.
  • the alkoxysilylation step may be carried out in the presence of any base and any solvent.
  • the alkoxysilane having the isocyanate functional group of the starting material IA and the following formula ⁇ is 0.1 to 5 equivalents of the alkoxysilane having the isocyanate functional group of the formula ⁇ relative to 1 equivalent of the hydroxy group of the starting material IA.
  • At least one of to is an alkoxy group having 1 to 5 carbon atoms, preferably an alkoxy group having 1 to 3 carbon atoms, more preferably a methoxy group or an hydroxy group to be.
  • the hydroxy group is preferable in view of high reactivity, and the ethoxy value is preferable in view of sample stability and good reaction properties.
  • the remainder is an alkyl group having 1 to 10 carbon atoms, wherein the alkoxy group and the alkyl group may be linear or branched, m is an integer of 3 to 10, preferably an integer of 3 to 6.
  • the alkoxysilane having the starting material IA and the isocyanate functional group reacts with the hydroxy group of the starting material IA and the alkoxysilane in an equivalent ratio according to the stoichiometry, and thus taking into account the hydroxy group 1 of the starting material IA
  • the alkoxysilane having the starting material IA and the isocyanate functional group is reacted such that the equivalent weight of the alkoxysilane is from 0.01 equivalents to 5 equivalents.
  • the reaction temperature and reaction time of the alkoxysilylation step depend on the reaction water, but, for example, by reacting for 1 to 72 hours at 20 ° C. to 120 ° C.
  • a novolac curing agent of any one of formulas I ′ 1 to 1-4 having substituents of ⁇ ((3 ⁇ 4) ⁇ ⁇ ⁇ 3 ⁇ 43 ⁇ 43 ⁇ 4 is obtained.
  • the reaction of the alkoxysilylation step may be carried out in the presence of a base if necessary.
  • the use of a separate base may result in a faster reaction reaction, but examples of the base that can be used include, but are not limited to, for example, K 2 CO 3 , Na 2 CO 3 , KHCOs, NaHC0 3 , triethylamine
  • bases may be used alone or in combination of two or more.In the case of using a base, the base is 0.1 to 1 equivalent of hydroxy group of the starting material IA.
  • the solvent may be optionally used in the reaction of the alkoxysilylation step, for example, without the need for a separate solvent in the alkoxysilylation step. If the viscosity of the reactants in silver is suitable for the reaction to proceed, the solvent may not be used, i.e. if the viscosity of the reactants is low enough that the mixing and stirring of the reaction product can proceed smoothly without solvent, then no additional solvent is required. In the case of using a solvent, the possible solvent can dissolve the reaction product well, and any aproticity can be easily removed after the reaction without any adverse effect on the reaction.
  • a solvent may be used, including but not limited to, for example, toluene, acetonitrile, tetrahydrofuran (THF), methyl ethyl ketone (MEK), dimethyl formaniide (DMF), DMS0 (dimethyl sul foxide), Methylene chloride (MC) and the like may be used. These solvents may be used alone or in combination of two or more black.
  • the amount of the solvent used is not particularly limited and may be used in a suitable amount within a range in which the reaction product is sufficiently dissolved and does not adversely affect the reaction, and those skilled in the art may appropriately select it.
  • At least one of the plurality of substituents A of Formulas 1-1 to 1-4 is a structure of Formula A3 (ie, an alkoxysilyl group) and the rest is hydrogen Can be.
  • the number of alkoxysilyl groups in Chemical Formulas 1-1 to 1-4 refers to the equivalent of alkoxysilane and reaction temperature in the alkoxysilylation step. It can be varied by controlling the number of hydroxy groups to be epoxidized by controlling. This can be appropriately adjusted by those skilled in the art in view of reactivity from the above disclosure.
  • composition comprising an epoxy resin and at least one new novolac curing agent selected from the group consisting of the above formulas 1-1 to 1-4.
  • compositions provided in the present invention are used for electronic materials, for example, but not limited to, for example, semiconductor substrates such as IC substrates, build-up films, encapsulation materials (packaging materials), printed wiring boards, and the like. It can be used for various uses such as parts, adhesives, paints and composite materials.
  • any composition provided in the present invention may be a curable composition comprising an inorganic material.
  • composition according to any of the above and later embodiments of the present invention comprises as a curing agent at least one new novolac curing agent selected from the group consisting of Formulas 1—1 to 1-4 according to embodiments of the present invention.
  • a curing agent at least one new novolac curing agent selected from the group consisting of Formulas 1—1 to 1-4 according to embodiments of the present invention.
  • any kind and / or combination of compositions known in the art are included, and the epoxy resin constituting the composition, the curing agent of the present invention and conventional curing agents, curing accelerators (catalysts), inorganic materials (fillers) (Eg inorganic particles and / or Fiber) and other additives, and the mixing ratio is not limited.
  • the epoxy resin may be any conventional epoxy resin known in the art, but is not particularly limited, for example, glycidyl ether-based epoxy resin, glycidyl-based epoxy resin, glycidylamine-based It may be at least one selected from the group consisting of an epoxy resin and a glycidyl ester epoxy resin.
  • the epoxy resin has a core structure of bisphenol, biphenyl, naphthalene, benzene, thiodiphenol, fluorene (fhiorene), anthracene, isocyanurate, triphenylmethane, 1,1,2,2-tetraphenyl Ethane, tetraphenylmethane, 4,4'-diaminodiphenyl methane, aminophenol alicyclic, aliphatic, or glycidyl ether epoxy resin having a novolak unit, glycidyl epoxy resin, glycidylamine epoxy At least one selected from the group consisting of a resin and a glycidyl ester epoxy resin.
  • the conventional epoxy resin is bisphenol, biphenyl, naphthalene, fluorene benzene, thiodiphenol, fluorene, anthracene as a core structure.
  • the existing and epoxy resins may or may not have an alkoxysilyl group.
  • Any conventional curing agent generally known as a curing agent for resins, may be added, and as the existing curing agent, there is no particular limitation, for example, a novolac curing agent (a conventional novolak having no alkoxylsilyl group). Curing agents), amines, acid anhydrides and the like can be used. More specifically.
  • amine curing agent aliphatic amines, alicyclic amines, aromatic amines, other amines and modified polyamines can be used, and amine compounds containing two or more primary amine groups can be used.
  • amine curing agent examples include 4,4 ' ⁇ dimethylaniline (diamino diphenyl methane) (4 > 4'-Dimethylani 1 ine (di amino diphenyl methane, DAM or DDM), diamino diphenylsulfone (diamino di phenyl sul fone, DDS), m_ lung alkenylene di ⁇ min (m -phenyl ene diamine) aromatic amine, at least one selected from the group consisting of diethylene triamine (dieihylene tri amine, DETA), diethylene tetraamine ( diethylene tetramine, tri iethy lene tetramine (TETA), m-xylene diamine (MXDA), methane diamine (MDA), ⁇ , ⁇ '- Diethylenediamine (N, N '-di et hy 1 ened i amine, ⁇ , ⁇ ' -DEDA), t
  • phenol curing agent examples include, but are not limited to, phenol novolac resins, cresol novolac resins, bisphenol A novolac resins, xylene novolac resins, triphenyl novolac resins, biphenyl novolac resins and dicyclopentadiene novolacs. Resins, phenol P-xylene resins, phenol 4, 4'-dimethylbiphenylene resins, naphthalene phenol novolac resins and the like.
  • acid anhydride-based curing agents include, but are not limited to, dodecenyl succinic anhydride (DDSA), aliphatic acid anhydrides such as poly azelaic poly anhydride, and nucleohydrophthalic anhydrides.
  • DDSA dodecenyl succinic anhydride
  • aliphatic acid anhydrides such as poly azelaic poly anhydride
  • nucleohydrophthalic anhydrides examples include, but are not limited to, dodecenyl succinic anhydride (DDSA), aliphatic acid anhydrides such as poly azelaic poly anhydride, and nucleohydrophthalic anhydrides.
  • Alicyclics such as hydrhydroph halic anhydride (HHPA), methyl tetrahydrophthalic anhydride (MeTHPA) and methylnadic anhydride (MNA) Anhydride, trimellitic not hydride (Trimellitic Anhydride, TMA), pyromellitic dianhydride hydride (pyromellitic acid di anhydr ide, PMDA), benzophenone tetracarboxylic carboxy acid dianhydride hydride '(benzophenonetetracarboxyl ic di anhydr i de, BTDA Aromatic acid anhydrides, such as a), tetrabromophthalic anhydride (TBPA), and halogen-based acid anhydride compounds such as chlorendic anhydride.
  • HHPA hydrhydroph halic anhydride
  • MeTHPA methyl tetrahydrophthalic anhydride
  • MNA methylnadic anhydride
  • TMA trimellitic not hydride
  • the degree of curing of the epoxy composite can be adjusted to the degree of reaction between the curing agent and the epoxy resin, and the content of the curing agent can be adjusted based on the concentration of the epoxy group of the epoxy resin according to the desired degree of curing.
  • the equivalent reaction of the curing agent and the epoxy group is such that the epoxy equivalent / curing agent equivalent ratio is 0.5 to 2.0, and, for example, It is preferable to adjust and use a hardening
  • Any curing agent that can be used to cure the epoxy resins not otherwise described herein also depends on the concentration of the total epoxy groups in the composition of the present invention depending on the desired degree of cure and based on the concentration of the epoxy functional groups and the semi-aromatic functional groups of the curing agent. Suitable amounts can be used in combination, as is common in the art.
  • composition comprising the new novolac curing agent may further comprise an inorganic material (filler), for example inorganic particles and / or fibers, as needed, and for convenience the composition comprising the inorganic material " Composite compositions', as long as the composite composition comprises an epoxy resin, at least one new novolac curing agent and filler selected from the group consisting of Formulas 1-1 to 1-4.
  • iller for example inorganic particles and / or fibers
  • Composite compositions' as long as the composite composition comprises an epoxy resin, at least one new novolac curing agent and filler selected from the group consisting of Formulas 1-1 to 1-4.
  • any type and / or the combination is understood to include a composition, the epoxy resin constituting the composition, the curing agent of the present invention, a conventional curing agent, a curing accelerator (catalyst) which, weapon material (filler) (e.g., Inorganic particles and / or fibers) and other additives are not limited to the type and compounding ratio.
  • a curing accelerator catalyst
  • weapon material e.g., Inorganic particles and / or fibers
  • other additives are not limited to the type and compounding ratio.
  • any inorganic particles known to be used for reinforcement may be used, including but not limited to, consisting of silica (including, for example, fused silica and crystalline silica), zirconia, titania, alumina, silicon nitride and aluminum nitride At least one kind selected from the group consisting of at least one metal oxide selected from the group and silsesquioxane may be used, and the inorganic particles may be used alone or as a mixture with two or more kinds. In this case, it is preferable to use fused silica, although either crushed or spherical can be used.
  • the inorganic particles are not limited thereto, but inorganic particles having a particle size of 0.5 nm to several tens (for example, 50 to 100) may be used in consideration of the use of the composite, specifically, the dispersibility of the inorganic particles. Can be. Since the inorganic particles are dispersed in the epoxy resin, the inorganic particles of the above sizes are preferably used together due to the difference in dispersibility according to the particle size.
  • the inorganic particles may be suitably added to the epoxy resin according to the appropriate viscosity and use required for reducing and applying CTE of the epoxy composite.
  • the content of the inorganic particles is based on the total weight of solids of the composition, while in the case of epoxy cured products, based on the total weight of the epoxy cured product, 5 wt% to 95 wt 3 ⁇ 4, for example 5 wt% to 90 wt%, for example 10 wt% to 90wt3 ⁇ 4>, for example 30 wt% to 95wt, for example 30wt% to 90wt%, for example 5 wt% to 60wt%, for example 10wt to 50%.
  • the composition of the present invention is a semiconductor encapsulant
  • the content of the inorganic particles is, for example, relative to the total increase in the solid content of the composition, while in the case of epoxy cured products the total weight of the epoxy cured product. 30 wt% to 95 wt%, for example, 30 wt% to 90%.
  • the content of the inorganic particles in consideration of the CTE value and strength of the substrate for example, relative to the weight of the total solids of the composition, on the other hand In the case of 5 wt% to 60 wt%, for example 10 wt% to 50%, based on the total weight of the epoxy cured product.
  • the fiber is used as an inorganic material, any kind and dimension of fiber generally used in the art may be used.
  • the fiber is not limited thereto, and any fiber generally used for improving physical properties of the thermosetting resin and cured material may be used. Specifically glass fiber, organic fiber or a mixture of middles can be used.
  • glass fibers include glass fibers such as E glass fiber, T glass fiber, S glass fiber, NE glass fiber, D glass fiber, quartz glass fiber, and the like. Or T glass fibers.
  • Liquid crystalline polyester fiber polyethylene terephthalate fiber, Selected from the group consisting of wholly aromatic fibers, polybenzoxazole fibers, nylon heart oil, polyethylene naphthalate fibers, polypropylene fibers, polyether sulfone fibers, polyvinylidene fluoride fibers, polyethylene sulfide fibers, polymoetheretherketone fibers At least one kind alone or more than two kinds of black may be used together.
  • Composition comprising any new novolak light "agent of the present invention, for example, the content of fibers in the glass fiber composite composition 10wt3 ⁇ 4> to about 90wt% based on the total weight of the composition solids, for example, 30wt % To 70 wt%, and for example, 35 wt% to 65%.
  • the fiber content is 10 wt% to 90 wt%, for example 30 wt% to 70 wt%, and for example 35 wt%, based on the total weight of the cured product. % To 65%.
  • the resin content is lp w t% to 90 wt%, for example.
  • the content of the fiber is in the above range in terms of heat resistance improvement and processability.
  • the solid part except a fiber among the total solid content is normally called resin component, and in the composition containing a fiber, the quantity other than fiber is resin content (res in content).
  • any of the compositions of the present invention comprising the fibers may further comprise inorganic particles, if necessary.
  • the inorganic particles are in the range of lwt3 ⁇ 4 »to 70wt% based on the increase of the resin content in consideration of the improvement of physical properties and fairness. It can be formulated in amounts.
  • the type of inorganic particles that can be used is not particularly limited, any inorganic particles known in the art can be used, for example, the type of the inorganic particles can be used.
  • the composition according to any of the above and below embodiments of the present invention may further comprise an alkoxysilyl group reaction catalyst (hereinafter referred to as “banung catalyst”) as needed.
  • the composition containing the alkoxysilyl group reaction catalyst is called “reaction catalyst containing composition” for convenience.
  • the reaction catalyst-containing composition also includes at least one new novolac curing agent selected from the group consisting of Formulas 1-1 to 1-4, and the reaction catalyst, and an epoxy resin constituting the composition, the curing agent of the present invention.
  • the alkoxysilyl group reaction catalyst may be added for improved processability (eg, fast curing rate and / or low curing temperature).
  • the alkoxysilyl group semicoagulant is not limited thereto, but may include, for example, nitric acid, sulfuric acid, hydrochloric acid, acetic acid and phosphoric acid.
  • At least one inorganic acid selected from the group, ammonia 4OH, NH 4 0H, amines and transition metal alkoxides, metal oxides, metal organic acid salts and halides e.g.
  • dibutyltin Dilaurate (di t butyl in di l aurate), tin salts of octylate, tin (II) ethyl 2- nuclear Sano benzoate) is used at least one kinds selected from the group consisting of "Tin (n) compound), such as Can be. These may be used alone or in combination of two or more kinds.
  • the blending amount of the alkoxysilyl group reaction catalyst is not particularly limited, but considering the reaction properties, the alkoxysilyl group semi-amplification catalyst is 0.01 phr to 10 to the epoxy resin of the present invention. can be used as phr.
  • water may be further included in the composition including the alkoxysilyl group reaction catalyst.
  • the blending amount of water is not particularly limited, but may be 0.01 equivalent to 20 equivalents of water with respect to 1 equivalent of alkoxysilyl group in consideration of efficiency and reaction properties as a catalyst.
  • Any curing accelerator (curing catalyst) may be further included as necessary to promote the curing reaction. Also, in the case of the novolak curing agent, to improve the reactivity with the epoxy resin.
  • Hardening accelerators are usually used, and in view of the common technical knowledge of the art, it will be apparent to those skilled in the art that any of the above-mentioned and later described compositions may include a curing accelerator depending on the degree of curing reaction.
  • a curing accelerator any catalyst known in the art to be generally used for curing the composition can be used, and thus although, for example, a curing accelerator such as imidazole, tertiary amine, quaternary ammonium, organic acid salt, Lewis acid, phosphorus compound, etc. may be used.
  • curing accelerators may be used as latent in their microcapsule coating and complex salt formation. These may be used independently and may use 2 or more types together according to hardening conditions.
  • the compounding quantity of the said hardening accelerator is not specifically limited, It can mix
  • the epoxy resin may be 0.1 to 10 phr (parts per hundred resin, parts by weight per 100 parts by weight of epoxy resin), for example, 0.2 to 5 phr.
  • the curing accelerator is preferably used in the above content in terms of curing reaction promoting effect and curing reaction rate control.
  • the curing accelerator in the compounding amount in the above range By using it, the curing progresses rapidly and the throughput can be expected to be improved.
  • the composition is a release agent, surface treatment agent, flame retardant which is conventionally formulated for controlling the physical properties of the composition in a range that does not impair the physical properties of the composition.
  • Other additives such as antifoams, colorants, stabilizers, coupling agents, viscosity modifiers, diluents, rubbers, thermoplastics, etc. may also be blended as needed.
  • a composition according to the present invention is formed into a thin film, a composition having insufficient flexibility may cause bridging to cause cracking. This is the case, for example, when any composition of the present invention contains a large amount of inorganic particles.
  • rubber and / or thermoplastic resins may be added to compositions comprising any new novolac curing agent of the present invention to improve solubility in the composition.
  • Thermoplastic resins and rubber-modified epoxy resins can be used that are generally known in the art.
  • any rubber known in the art may be used as long as it is not dissolved in the solvent used in the composition and remains dispersed in the composition.
  • an acrylonitrile butadiene rubber for example. Butadiene rubber, acrylic rubber, core-shell rubber particles, cross-linked acrylonitrile butadiene rubber particles, cross-linked styrene butadiene rubber particles, acrylic rubber indenters and the like.
  • the average particle diameter is preferably in the range of 005 to 1 / im in terms of physical properties, and 0.2 to The range of 0.6 is more preferable. Rubber particles, see the above .
  • Thermoplastic resins include, but are not limited to, phenoxy resins, polyvinyl acetal resins. Polyimide resin, polyamideimide resin, polyether sulone resin, polysulfone resin and the like. These may be used alone or in combination of two or more.
  • the thermoplastic resin may be blended in an amount of, for example, 0.5 to 60% by weight, preferably 3 to 50% by weight, based on the weight of the solid content of the composition of the present invention.
  • composition comprising a composition, a composition of the present invention or a new novolak curing agent” refers to an epoxy resin and the novolak curing agent of the present invention as well as other components constituting the composition as needed, for example,
  • optional curing accelerators catalogsts
  • inorganic materials fillers
  • solvents may contain other additives formulated as needed in the art.
  • the solvent in the composition may optionally be used to appropriately adjust the solid content and / or viscosity of the composition in consideration of the processability of the composition and the like.
  • total weight of the solid content of the composition refers to the total weight of the components excluding the solvent among the components constituting the composition described above. Any of the compositions of the present invention provided in any of the above embodiments of the present invention may be used for electronic materials.
  • the electronic material is not limited to this, but, for example, not only a substrate build-up film for semiconductors, a prepreg, or a laminated plate on which a metal film is disposed on a substrate made of the composition of the present invention, but also a sealing material (packaging material), as well as printed wiring Electronic components such as substrates. It can also be applied to various applications such as adhesives, paints and composite materials. According to still another embodiment of the present invention, there is provided an electronic material comprising or consisting of any composition comprising the novolac curing agent of the present invention. Furthermore, there is also provided a semiconductor device comprising, consisting essentially of, or consisting of the electronic material.
  • the semiconductor device includes a semiconductor device and / or a semiconductor packaging material including (eg, mounting a semiconductor device) a printed wiring board comprising, or consisting essentially of, a composition comprising the novolac curing agent of the present invention. It may be a semiconductor device including a. Also provided are cured products, adhesives, paints, or composites comprising, consisting essentially of, or consisting of any of the compositions of the present invention provided in any of the embodiments of the present invention. According to another embodiment of the present invention, there is provided a cured product comprising, consisting essentially of, or consisting of the composition of the invention provided in any of the embodiments of the invention described above.
  • composition provided in any of the above-described embodiments of the present invention is used as a cured product when it is actually applied, for example, as an electronic material, and in the art, an epoxy resin and an inorganic component
  • the cured product of the composition comprising the filler is generally referred to as a composite.
  • the novel novolac curing agent provided in one embodiment of the present invention described above exhibits excellent heat resistance and excellent flame retardancy in the composite.
  • the composite has a low CTE, for example, 15 ppm / ° C. or less, for example 12 ppm / ° C. or less.
  • a CTE of 10 ppm / ° C or less for example, 8 ppm / ° C or less, for example, 6 ppm / ° C or less, for example, 4 ppmni / ° C or less.
  • the resin content of 30wt% to 60wt% (may have include an inorganic particles-resin content, that may not be included) in the composite are, for example, 10ppm / ° C or less, for example, 8ppm / ° C or less, e. For example, 6 ppm / ° C. or less, for example, 4 ppm / ° C. or less CTE.
  • any novel novolac curing agent according to the present invention as a curing agent a composite containing 60 to 80wt%, for example, 70 to 80wt% of inorganic particles, for example, silica particles as an inorganic material, 20ppmrc or less, For example, 15 ppm / ° C or less, for example, 10 ppm / ° C or less, for example, 8 ppm / ° C or less, for example, 6 ppm / ° C
  • CTE of 4 ppm / ° C or less is shown.
  • the composite according to the present invention may have a T g higher than locrc, for example, 130 ° C or more, for example, 250 ° C or more, or Tg-less.
  • the Tg value is excellent in Kk-Tock physical properties and does not particularly limit the upper limit of Tg.
  • the value indicated by the range means that each includes not only the lower limit value and the upper limit value of the range, but also any lower range between the ranges and all the numbers belonging to the range.
  • C1 to C10 are CI, C2, C3, C4. It is understood to include all of C5, C6, C7, C8, C9, C10.
  • the lower limit value or the upper limit value of the numerical range is not specified, and the smaller or larger the value is, the more preferable. It is understood to include any value.
  • a CTE below 4 ppm / ° C is understood to include all values between 4, 3.5, 3, 2.7, 2, 1.4, 1, 0.5 ppm / ° C, and the like.
  • the NMR data of the obtained final product is as follows.
  • Synthesis Example 5 Synthesis of Silylated Noble Curing Agent (Biphenyl Aralkyl Type Phenolic Resin) 15 g of biphenyl novolac curing agent (Formula 3, Meiwa Plastic Ind., Trade name MEH-7851SS), 4.57 g of trioxysilyl propyl isocyanate, and 150 nil of tetrahydrofuran (THF) were added to the flask, followed by mixing. Stirred at room temperature for 15 hours. After the reaction.
  • Biphenyl Aralkyl Type Phenolic Resin Silylated Noble Curing Agent
  • biphenyl novolac curing agent Forma 3, Meiwa Plastic Ind., Trade name MEH-7851SS
  • THF tetrahydrofuran
  • the NMR data of the obtained final product is as follows.
  • Synthesis Example 7 Synthesized silylated novolac hardener synthesis (polyfunctional phenolic resin) 15 g of a polyfunctional novolac curing agent (Formula 5, Meiwa Plastic Ind., MEH-7500-3S), 7.22 g of triethoxysilyl propyl isocyanate, and 150 ml of tetrahydrofuran (THF) were mixed, and then filled with argon. , and the mixture was stirred at 15 for phase time status.
  • a polyfunctional novolac curing agent Forma 5, Meiwa Plastic Ind., MEH-7500-3S
  • THF tetrahydrofuran
  • epoxy glass fiber composite (cured product) With the composition shown in Table 1, epoxy compound, and silica slurry (solid content of 70wt%, methyl ethyl ketone solvent, average silica size 1 / ⁇ ) of ⁇ , ⁇ -dimethyl Dissolve in acetamide to 40% solids. After mixing this mixed liquid at the speed of 1500 rpm for 1 hour, the hardening
  • An epoxy glass fiber composite containing a silylated curing agent was prepared by immersing glass fiber (N-Ttobo, T-glass) in this binder solution. The composite was then placed in a vacuum oven heated to 100 ° C to remove the solvent and then preheated to 12 CTC. The glass fiber composite was obtained by curing at a hot press for 2 hours at 120 ° C., 2 hours at 180 ° C. and 2 hours at a temperature of 200 ° C.-230 ° C.
  • Epoxy Filler Composite (Hardened) According to the composition shown in Table 2 below, epoxy compound, silica slurry (dispersion solution: methyl ethyl ketone solvent, silica average size 1) and polyvinyl acetal ⁇ , ⁇ ⁇ dimethylacet Dissolve the amide to 40% solids. The mixture was mixed for 1 hour and 30 minutes at a speed of 1500 rpm, followed by addition of a hardening agent and further mixing for 30 minutes.
  • thermo-mechanical analyzer Therm mechanical analysizer
  • Table 1 shows the results obtained in Example 1 and Comparative Example 1 (Table 1).
  • the specimen of the glass fiber composite film is 4X 16X0.
  • the specimen of the composite filler was prepared by the size of 5X5X3 ( ⁇ 3).

Abstract

The present invention relates to a novolac hardener having an alkoxysilyl group, the novolac hardener exhibiting excellent heat resistance characteristics, such as a low coefficient of thermal expansion (CTE) and an increase in the glass transition temperature, when forming a composite; a method for preparing the same; a composition containing the same; a hardened product; and a use thereof. According to an embodiment of the present invention, provided are a novolac hardener having an alkoxysilyl group of chemical formulas I-1 to I-4; a method for preparing the novolac hardener having an alkoxysilyl group of chemical formulas I-1 to I-4 through alkenylation and alkoxysilylation of the novolac hardener; a method for preparing the novolac hardener having an alkoxysilyl group of chemical formulas I-1 to I-4 through alkoxysilylation of the novolac hardener; a composition containing the novolac hardener having an alkoxysilyl group of chemical formulas I-1 to I-4; a hardened product thereof; and a use thereof. A composite comprising the novel hardener having an alkoxysilyl group according to the present invention exhibits a low CTE and a high glass transition temperature through a chemical bond between the alkoxysilyl group of the hardener and a phenol or epoxide group as well as a chemical bond between the alkoxysilyl group of the hardener and a filler.

Description

【명세서】  【Specification】
【발명의 명칭】  [Name of invention]
알콕시실릴기를 갖는 새로운 노볼락 경화제, 이의 제조 방법, 이를 포함하는 조성물, 경화물 및 이의 용도  New novolac curing agents having alkoxysilyl groups, preparation methods thereof, compositions comprising the same, cured products and uses thereof
【기술분야】 Technical Field
본. 발명은 복합체에서 우수한 내열 특성을 나타내는, 알콕시실릴기를 갖는 새로운 노볼락 경화제 (이하, '새로운 노볼락 경화제 ' 또는 '본 발명의 노볼락 경화제 '라 하기도 한다), 이의 제조방법, 이를 포함하는 조성물, 이의 경화물 및 이의 용도에 관한 것이다. 보다 상세하게, 본 발명은 복합체에서, 우수한 내열 특성, 구체적으로는 낮은 열팽창특성, 유리전이은도 상승 (이는 유리 전이 온도를 나타내지 않는 Tg 리스를 포함함), 및 우수한 난연성을 나타내는, 알콕시실릴기를 갖는 새로운 노볼락 경화제, 이의 제조방법, 이를 포함하는 조성물, 이의 경화물 및 이의 용도에 관한 것이다. example. The present invention is a novel novolac curing agent having an alkoxysilyl group exhibiting excellent heat resistance in the composite (hereinafter also referred to as 'new novolac curing agent' or 'novolak curing agent of the present invention'), a method for preparing the same, a composition comprising the same, It relates to a cured product thereof and its use. More specifically, the present invention has in the composite material, an excellent heat resistance, specifically, the low thermal expansion characteristics, (also which includes a Tg less does not exhibit a glass transition temperature) Glass jeonyieun lift, and a group, alkoxysilyl group that exhibits good flame retardant New novolac curing agents, methods for preparing the same, compositions comprising the same, cured products thereof and uses thereof.
【발명의 배경이 되는 기술】 ' - 에폭시 수지의 열팽창계수는 대략 50~80 ppm/ °C로 무기입자인 세라믹재료 및 금속재료의 열팽창계수 (예를 들어, 실리콘의 열팽창계수는 3~5 ppm/ °C이며, 구리의 열팽창계수는 17ppm/ °C임. )에 비하여 열팽창계수 값이 수배〜수십배 정도로 매우 크다. 따라서 , 예를 들어, 반도체 , 디스플레이 분야 등에서 에폭시 수지가 무기재료 또는 금속재료와 함께 사용되는 경우에, 서로 다른 열팽창계수로 인하여 부품 설계 및 가공이 현저하게 제한된다. 또한, 예를 들어 실리콘 웨이퍼와 에폭시 기판이 인접하여 사용되는 반도체 패키징 (packaging) 등의 경우나, 가스 배리어 특성을 부여하기 위해 무기차단막을 고분자 필름 위에 코팅하는 경우에, 소재간의 열팽창계수의 차이 (CTE— mismatch)로 인하여 무기층의 크랙 생성, 기판의 휨 발생 , 코팅충의 박리 (peeling-off), 기판 깨짐 등과 같은 제품불량이 발생한다. · 이와 같은 에폭시 수지의 큰 CTE 및 이로 인한 치수변화 (dimensional change)로 인하여 차세대 반도체 기판, PCB(printed circuit board), 패키징 (packaging), OTFK Organic Thin Film Transistor), 가요성 디스플레이 기판 (flexible display substrate) 등의 기술 개발이 제한된다. 구체적으로, 현재 반도체 및 PCB 분야에서는 금속 /세라믹 재료에 비해 매우 높은 CTE를 갖는 에폭시로 인하여, 고집적화, 고미세화, 폴렉서블화, 고성능화 등이 요구되는 차세대 부품 설계에 어려움을 겪고 있다. . 현재까지 에폭시 수지의 열팽창특성을 개선 (즉, 작은 열팽창계수)하기 위해서는 일반적으로 (1) 에폭시 수지를 무기입자 (무기필러) 및 /또는 유리섬유와 복합화하거나 (2) CTE가 감소된 새로운 에폭시 수지를 설계하는 방법이 사용되어 왔다. 열팽창 특성의 개선을 위해 에폭시 수지와 충전제로서 무기입자를 복합화하는 경우에는 약 2~30卿 크기의 실리카 무가입자를 다량 사용해야만 CTE 감소 효과를 볼 수 있다. 그러나, 다량의 무기입자 충진으로 인하여 가공성이 저하되는 문제가 수반된다. 즉, 다량의 무기입자로 인한 유동성 감소 및 협간 충진 시 보이드 형성 등의 문제가 발생할 수 있다. 또한, 유리섬유를 포함하는 에폭시 복합체의 CTE는 크게 감소되지만, 실리콘 칩 등에 비해 여전히 높은 CTE를보인다. 상기한 바와 같이 현재의 에폭시 복합체 기술의 한계로 인하여 차세대 반도체 기판 및 PCB 등과 같아 고집적된 고성능 전자부품의 제조가 제한된다. 따라서 종래 열경화성 복합체의 높은 CTE 및 이로 인한 내열특성 및 가공성 부족 등과 같은 문제를 극복하기 위한 개선된 열팽창 특성, 즉, 낮은 CTE 및 높은 유리전이은도 특성을 가진 에폭시 복합체의 개발이 요구된다. [Technological Background of the Invention] ' -The thermal expansion coefficient of epoxy resin is about 50 ~ 80 ppm / ° C, and the thermal expansion coefficient of ceramic material and metal material which are inorganic particles (for example, the thermal expansion coefficient of silicon is 3 ~ 5 ppm / ° C, the thermal expansion coefficient of copper is 17ppm / ° C.) The coefficient of thermal expansion is very large, several times to several ten times. Thus, for example, when the epoxy resin is used together with an inorganic material or a metal material in the semiconductor, display field, etc., The coefficient of thermal expansion significantly limits the design and processing of parts. In addition, for example, in the case of semiconductor packaging in which a silicon wafer and an epoxy substrate are used adjacent to each other, or when an inorganic barrier film is coated on a polymer film to impart gas barrier properties, the difference in coefficient of thermal expansion between materials ( CTE (mismatch) causes product defects such as inorganic layer cracking, substrate warpage, peeling off coatings, and substrate breakage. Due to the large CTE of this epoxy resin and the resulting dimensional change, next-generation semiconductor substrates, printed circuit boards (PCBs), packaging, OTFK Organic Thin Film Transistors, and flexible display substrates Technology development, etc.) is limited. Specifically, in the semiconductor and PCB field, due to the epoxy having a very high CTE compared to the metal / ceramic material, it is difficult to design the next-generation components that require high integration, high fineness, flexibility, and high performance. . To improve the thermal expansion properties (ie small coefficient of thermal expansion) of epoxy resins to date, new epoxy resins generally have (1) complexing epoxy resins with inorganic particles (inorganic fillers) and / or glass fibers or (2) reduced CTEs. A method of designing has been used. In order to improve the thermal expansion properties, inorganic particles as epoxy resin and filler In the case of complexation, the use of a large amount of non-subsidiary silica particles of about 2-30 卿 size can reduce CTE. However, there is a problem in that workability is degraded due to the filling of a large amount of inorganic particles. That is, problems such as reduced fluidity due to a large amount of inorganic particles and void formation during narrow filling may occur. In addition, the CTE of the epoxy composite including glass fibers is greatly reduced, but still shows a high CTE compared to silicon chips. As described above, due to the limitations of the current epoxy composite technology, the production of highly integrated high performance electronic components such as next-generation semiconductor substrates and PCBs is limited. Therefore, there is a need for the development of epoxy composites with improved thermal expansion properties, ie, low CTE and high glass transition properties, to overcome problems such as high CTE and the resulting heat resistance and lack of processability.
【발명의 내용】 [Content of invention]
【해결하고자 하는 과제】  Problem to be solved
본 발명의 일 실시형태에 의하면, 복합체에서 향상된 내열특성, 구체적으로는 낮은 CTE와 높은 유리전이 온도 및 우수한 난연성을 나타내는 알콕시실릴기를 갖는 새로운 노블락 경화제가 제공된다. 발명의 다른 실시형태에 의하면, 복합체에서 향상된 구체적으로는 낮은 CTE와 높은 유리전이 온도 및 우수한 난연성을 알콕시실릴기를 갖는 새로운 노볼락 경화제의 제조방법이 제공된다. According to the present i to name one embodiment, the improved heat resistance in the composite material, specifically, there is provided a new novolak curing agent having an alkoxysilyl group representing a low CTE and a high glass transition temperature and excellent flame retardancy. According to another embodiment of the invention, the improved composites specifically low CTE, high glass transition temperature and good flame retardancy A method for producing a new novolac curing agent having an alkoxysilyl group is provided.
본 발명의 다른 실시형태에 의하면, 복합체에서 향상된 내열특성, 구체적으로는 낮은 CTE와 높은 유리전이 온도 및 우수한 난연성을 나타내는 알콕시실릴기를 갖는 새로운 노볼락 경화제를 포함하는 조성물이 제공된다. According to another embodiment of the present invention, there is provided a composition comprising a new novolac curing agent having an alkoxysilyl group which exhibits improved heat resistance in the composite, specifically low CTE, high glass transition temperature and good flame retardancy.
나아가, 본 발명의 또 다른 실시형태에 의하면, 복합체에서 향상된 내열특성, 구체적으로는 낮은 CTE와 높은 유리전이 온도 및 우수한 난연성을 나타내는 알콕시실릴기를 갖는 새로운 노볼락 경화제를 포함하는 조성물의 경화물이 제공된다ᅳ Furthermore, according to another embodiment of the present invention, there is provided a cured product of a composition comprising a new novolac curing agent having an alkoxysilyl group exhibiting improved heat resistance properties, in particular low CTE, high glass transition temperature and excellent flame retardancy in the composite. ᅳ
또한, 본 발명의 다른 실시형태에 의하면 , 본 발명의 일 실시형태에 의한 알콕사실릴기를 갖는 새로운 노볼락 경화제를 포함하는 조성물의 용도가 제공된다. Moreover, according to another embodiment of this invention, the use of the composition containing the new novolak hardening | curing agent which has an alkoxylsilyl group by one embodiment of this invention is provided.
【과제의 해결 수단】 [Measures of problem]
제 1견지에 의하면, 하기 화학식 1-1 내지 1-4로 구성되는 그룹으로부터 선택되는 적어도 하나의 알콕시실릴기를 갖는 노볼락 경화제가 제공된다. [화학식 1-1]
Figure imgf000007_0001
According to the first aspect, there is provided a novolak curing agent having at least one alkoxysilyl group selected from the group consisting of the following formulas (1-1) to (1-4). [Formula 1-1]
Figure imgf000007_0001
(상기 화학식 1-1에서, Z는 하기 화학식 1A 내지 1F로 구성되는 그룹 중 하나이다 ·  (In Chemical Formula 1-1, Z is one of the groups consisting of the following Chemical Formulas 1A to 1F.
Figure imgf000007_0002
[화학식 1-3]
Figure imgf000008_0001
Figure imgf000007_0002
[Formula 1-3]
Figure imgf000008_0001
[화학식 1-4] [Formula 1-4]
Figure imgf000008_0002
Figure imgf000008_0002
(상기 화학식 1-4에서 p는 1 또는 2이며' (In the above formula 1-4 p is 1 or 2,
X-cr
Figure imgf000008_0003
이며
Figure imgf000008_0004
R은 C1-C10의 직쇄 또는 측쇄상 알킬기이다. )
X-cr
Figure imgf000008_0003
And
Figure imgf000008_0004
R is a C1-C10 straight or branched alkyl group. )
(상기 화학식 Iᅳ 1 내지 1-4에서, 적어도 하나의 A는 하기 화학식 A2 또는 A3이고, 적어도 하나가 A2인 경우에, 나머지 A는 하기 화학식 B2 또는 수소이고, 적어도 하나가 A3인 경우에, 나머지 A는 수소이며, n은 1이상의 정수이다. ) (In Chemical Formula I ′ 1 to 1-4, At least one A is of formula A2 or A3, if at least one is A2, the remaining A is of formula B2 or hydrogen, if at least one is A3, the remaining A is hydrogen, and n is an integer of at least 1 . )
[화학식 A2] [Formula A2]
-(CH2)m-SiRi 2R3 -(CH 2 ) m -SiRi 2 R 3
[화학식 A3] [Formula A3]
-CONH(CH2)m-SiRiR2R3 -CONH (CH 2 ) m -SiRiR 2 R 3
(상기 화학식 A2 및 A3에서, 내지 R3 중 적어도 하나는 탄소수 1 내지 5의 직쇄 혹은 분지쇄 알콕시기이고. 나머지는 탄소수 1 내지 10의 직쇄 흑은 분지쇄 알킬기이며, m은 3 내지 10의 정수이다. ) (In the formulas A2 and A3, at least one of to R 3 is a straight or branched chain alkoxy group having 1 to 5 carbon atoms, the remainder is a straight chain black or branched alkyl group having 1 to 10 carbon atoms, m is an integer of 3 to 10 to be. )
[화학식 B2] [Formula B2]
-(CH2) rCH=CH2 -(CH 2 ) rCH = CH 2
(식증, 1은 1 내지 8의 정수이다. ) 제 2견지에 의하면, 염기 및 임의의 용매 존재 하에서 하기 화학식 IA-1 내지 IA- 4 중 하나의 출발물질과 하기 화학식 Π의 알케닐 화합물을 반응시켜서 하기 화학식 IBᅳ 1 내지 IB-4 중 하나의 중간생성물을 형성하는 제 1 단계; 및 백금촉매 -및 임의의 용매 존재 하에서 상기 화학식 IB-1 내지 IB-4 중 하나의 중간생성물과 하기 화학식 ΙΠΑ의 알콕시실란을 반웅시켜서 화학식 A2의 구조를 갖는 화학식 Iᅳ 1 내지 화학식 Iᅳ 4 중 하나의 화합물을 형성하는 제 2 단계를 포함하는, 화학식 Iᅳ 1 내지 화학식 1—4 로 구성되는 그룹으로부터 선택되는 어느 하나의 알콕시실릴기를 갖는 노볼락 경화제의 제조방법이 제공된다. (Formula, 1 is an integer from 1 to 8.) According to the second aspect, the starting material of any one of the formulas (IA-1 to IA-4) and the alkenyl compound of the formula (Π) in the presence of a base and an optional solvent To form an intermediate of any one of the following Formulas IB ′ 1 to IB-4; And a platinum catalyst-and any one of formulas IB-1 to IB-4 above in the presence of any solvent. A second step of reacting an intermediate with an alkoxysilane of the formula (II) to form a compound of formula (I) 1 to compound (IV) having a structure of formula (A2); Provided is a method for producing a novolac curing agent having any one alkoxysilyl group selected from the group consisting of:
[화학식 IAᅳ 1] [Formula IA ᅳ 1]
(상기 화학식 IA— 1에서, X는 하기 화학식 2A 내지 2F로 구성되는 그룹 증 하나아다.  (In the above formula (IA-1), X is one group group consisting of the following formulas 2A to 2F.
Figure imgf000010_0002
[화학식 IA-2]
Figure imgf000010_0002
[Formula IA-2]
Figure imgf000011_0001
Figure imgf000011_0001
[화학식 IA-3]
Figure imgf000011_0002
[Formula IA-3]
Figure imgf000011_0002
[화학식 I.Aᅳ 4] [Formula I.A ᅳ 4]
Figure imgf000011_0003
Figure imgf000011_0003
(화학식 IA-4 중, p는 1 또는 2이며 xl은
Figure imgf000011_0004
이며
Figure imgf000012_0001
, R은 C1-C10의 직쇄 또는 분지쇄상 알킬기이다 . ) (상기 화학식 IA-1 내지 IA-4에서, n은 1이상의 정수이다. )
(In formula IA-4, p is 1 or 2 and xl is
Figure imgf000011_0004
And
Figure imgf000012_0001
, R is a C1-C10 straight or branched alkyl group. (In Formulas IA-1 to IA-4, n is an integer of 1 or more.)
[화학식 IB-1]
Figure imgf000012_0002
[Formula IB-1]
Figure imgf000012_0002
(상기 식에서, Π은 하기 화학삭 3A 내지 3F로 구성되는 그룹 중의 하나이다 ·  (Wherein Π is one of the groups consisting of the following chemical marks 3A to 3F)
Figure imgf000012_0003
[화학식 IB-2]
Figure imgf000013_0001
Figure imgf000012_0003
[Formula IB-2]
Figure imgf000013_0001
[화학식 IB-3]
Figure imgf000013_0002
Figure imgf000013_0003
[Formula IB-3]
Figure imgf000013_0002
Figure imgf000013_0003
Figure imgf000013_0004
Figure imgf000014_0001
에서 R은 C1-C10의 직쇄 혹은 분지쇄의 알킬기이다.) (상기 화학식 IB— 1 내지 IB-4에서, 적어도 하나의 D는 하기 화학식 B2이고, 나머지는 수소일 수 있으며. n은 1이상의 정수이다.)
Figure imgf000013_0004
Figure imgf000014_0001
In which R is a C1-C10 linear or branched alkyl group.) (In Formulas IB— 1 to IB-4, at least one D may be represented by Formula B2, and the remainder may be hydrogen. N is an integer of 1 or more. to be.)
[화학식 B2][Formula B2]
Figure imgf000014_0002
Figure imgf000014_0002
(식중, 1은 1 내지 8의 정수이다.)  (Wherein 1 is an integer from 1 to 8).
[화학식 Π] [Formula Π]
X-(CH2)rCH=CH2 X- (CH 2 ) rCH = CH 2
(식중, 1은 1 내지 8의 정수이고, X는 CI, Br, I, -으 S02ᅳ CH3, -으 S02_CF3, 또는 -0-S02-C6 — CH3 이다.) (Wherein 1 is an integer of 1 to 8, X is CI, Br, I,-S0 2 ᅳ CH 3 ,-S0 2 _CF 3 , or -0-S0 2 -C 6 — CH 3 )
[화학식 fflA] [Formula fflA]
HSiRaRbRc HSiR a R b Rc
(상기 식에서, Ra 내지 Rc 중 적어도 하나는 직쇄 혹은 분자쇄 C1-C5 알콕시기이고, 나머지는 직쇄 흑은 분지쇄 CI— C10 알킬기이다.) (In the above formula, at least one of R a to R c is a straight chain or molecular chain C1-C5 alkoxy group, and the rest is a straight chain black branched CI—C10 alkyl group.)
Figure imgf000015_0001
Figure imgf000015_0001
[화학식 1-2]
Figure imgf000015_0002
[화학식 Iᅳ 3]
[Formula 1-2]
Figure imgf000015_0002
[Formula I ᅳ 3]
Figure imgf000016_0001
Figure imgf000016_0001
[화학식 1-4]
Figure imgf000016_0002
[Formula 1-4]
Figure imgf000016_0002
(상기 화학식 1-4에서, p는 1 또는 2이고,  (In Formula 1-4, p is 1 or 2,
X는
Figure imgf000016_0003
이며
Figure imgf000016_0004
서 R은 C1-C10의 직쇄 또는 측쇄상 알킬기이다.)
X is
Figure imgf000016_0003
And
Figure imgf000016_0004
Where R is a C1-C10 straight or branched alkyl group.)
(상기 화학식 1-1 내지 1-4에서, 적어도 하나의 A는 하기 화학식 A2이고 : 나머지는 하기 화학식 B2또는 수소이고, n은 1이상의 정수이다.) [화학식 A2] (In Formulas 1-1 to 1-4, at least one A is Formula A2 : the remainder is Formula B2 or hydrogen, and n is an integer of 1 or more.) [Formula A2]
-(CH2)m-SiRiR2R3 -(CH 2 ) m -SiRiR 2 R 3
(상기 화학식 A2에서, 내지 R3중 적어도 하나는 탄소수 1 내지 5의 직쇄 혹은 분지쇄 알콕시기이고, 나머지는 탄소수 1 내지 10의 직쇄 흑은 분지쇄 알킬기이며, m은 3 내지 10의 정수이다. ) (In Formula A2, at least one of R 3 is a linear or branched alkoxy group having 1 to 5 carbon atoms, the remainder is a straight chain black or branched alkyl group having 1 to 10 carbon atoms, and m is an integer of 3 to 10. )
[화학식 B2] [Formula B2]
-(CH2) ,-CH=CH2 -(CH 2 ), -CH = CH 2
(식중, 1은 1 내지 8의 정수이다. ) 제 3견지에 의하면, 제 2견지에 있어서 상기 제 1단계는 상기 화학식 IA-1 내지 IA-4 중 하나의 출발물질의 히드록시 그룹 1 당량에 대하여 상기 화학식 Π의 알케닐 화합물의 알킬렌기가 0. 1 내지 10 당량이 되도록 반응시켜 수행되는 알콕시실릴기를 갖는 노볼락 경화제의 제조방법이 제공된다. 제 4견지에 의하면. 제 2견지에 있어서 상기 제 1 단계는 - 20°C 내지 100°C로 1시간 내자 120시간 동안 반웅시켜 수행되는 알콕시실릴기를 갖는 노볼락 경화제의 제조방법이 제공된다. 제 5견지에 의하면, 제 2견지에 있어서 상기 제 2 단계는 상기 화학식 IB-1 내지 IB-4 중 하나의 중간생성물의 알케닐 그룹 1당량에 대하여 알콕시실란이 0. 1 당량 내지 5 당량이 되도록 반웅시켜 수행되는 알콕시실릴기를 갖는 노볼락 경화제의 제조방법이 제공된다. 제 6견지에 의하면, 제 2견지에 있어서 상기 제 2 단계는 ᅳ 20°C 내지 12CTC로 1시간 내지 72시간 동안 반응시켜 수행되는 알콕시실릴기를 갖는 노블락 경화제의 제조방법이 제공된다. 제 7견지에 의하면, 임의의 염기 및 임의의 용매 존재하에서 하기 화학식 IA-1 내지 IA-4 중 하나의 출발물질과 하기 화학식 ΠΙΒ의 알콕시실란을 반응시켜서 화학식 A3의 구조를 갖는 화학식 1-1 내지 1-4 중 하나의 화합물을 형성하는 알콕시실릴화 단계를 포함하는, 화학식 1-1 내지 1-4로 구성되는 그룹으로부터 선택되는 어느 하나의 알콕시실릴기를 갖는 노볼락 경화제의 제조방법이 제공된다. (Wherein 1 is an integer of 1 to 8.) According to the third aspect, in the second aspect, the first step corresponds to one equivalent of the hydroxy group of the starting material of one of Formulas IA-1 to IA-4. There is provided a process for producing a novolak curing agent having an alkoxysilyl group, which is carried out by reacting an alkylene group of the alkenyl compound of the formula [pi] to 0.01 to 10 equivalents. According to my fourth opinion. In a second aspect, the first step is a method for preparing a novolak curing agent having an alkoxysilyl group, which is performed by reacting for 120 hours at -20 ° C to 100 ° C for 1 hour. According to the fifth aspect, in the second aspect, the second step is an alkoxysilane equivalent to 1 equivalent of the alkenyl group of one of the intermediates of Formulas IB-1 to IB-4. There is provided a process for producing a novolac curing agent having an alkoxysilyl group, which is carried out by reacting to 0.1 equivalents to 5 equivalents. According to a sixth aspect, in the second aspect, the second step is a method for preparing a noblock curing agent having an alkoxysilyl group, which is carried out by reacting at 20 ° C. to 12 CTC for 1 to 72 hours. According to the seventh aspect, in the presence of an arbitrary base and an optional solvent, a starting material of any one of the following formulas IA-1 to IA-4 is reacted with an alkoxysilane of the following formula ΠΙΒ to have a structure of formula A3. Provided is a method of preparing a novolak curing agent having any one alkoxysilyl group selected from the group consisting of Formulas 1-1 to 1-4, comprising an alkoxysilylation step to form one of 1-4 compounds.
[화학식 IA-1]
Figure imgf000018_0001
[Formula IA-1]
Figure imgf000018_0001
(상기 화학식 IA-1에서 X는 하기 화학식 2A 내지 2F로 구성되는 그룹 중 하나이다. (In Formula (IA-1), X is one of the groups consisting of the following Formulas 2A to 2F.
Figure imgf000019_0001
Figure imgf000019_0001
[화학식 IA-2]
Figure imgf000019_0002
Figure imgf000019_0003
[화학식 IA-4]
Figure imgf000020_0001
[Formula IA-2]
Figure imgf000019_0002
Figure imgf000019_0003
[Formula IA-4]
Figure imgf000020_0001
(상기 화학식 IA-4 중, p는 1 또는 2이고,  (In Formula IA-4, p is 1 or 2,
Figure imgf000020_0002
Figure imgf000020_0002
(상기 화학식 IA-1 내지 IA-4에서, n은 1이상의 정수이다. )  (In the above formulas IA-1 to IA-4, n is an integer of 1 or more.)
[화학식 ΠΒ] [Formula ΠΒ]
0CN-(CH2)m-SiRiR2R3 0CN- (CH 2 ) m -SiRiR 2 R 3
(상기 화학식 ΙΠΒ에서, 내지 R3 중 적어도 하나는 탄소수 1 내지 5의 직쇄 혹은 분지쇄 알콕시기이고 나머지는 탄소수 1 내지 10의 직쇄 혹은 분지쇄 알킬기이며, m은 3 내지 10의 .정수이다. ) (In the above formula (II), at least one of R 3 is a straight or branched chain alkoxy group having 1 to 5 carbon atoms, the rest is a straight or branched chain alkyl group having 1 to 10 carbon atoms, and m is an integer of 3 to 10.
 [화학식 1-3]  [Formula 1-3]
Figure imgf000022_0001
Figure imgf000022_0001
And
[화학식 1-4] [Formula 1-4]
Figure imgf000022_0002
Figure imgf000022_0002
(상기 화학식 1-4에서, p는 1 또는 2이고  (In Formula 1-4, p is 1 or 2 and
X는
Figure imgf000022_0003
이며
Figure imgf000022_0004
서 R은 C1-C10의 직쇄 또는 측쇄상 알킬기이다ᅳ )
X is
Figure imgf000022_0003
And
Figure imgf000022_0004
R is a C1-C10 straight or branched alkyl group
(상기 화학식 Iᅳ 1 내지 1-4에서, 적어도 하나의 A는 하기 화학식 A3이고 나머지는 수소이며, n은 1이상의 정수이다.) [화학식 A3] (In the above formulas I '1 to 1-4, at least one A is the following formula A3, the remainder is hydrogen, and n is an integer of 1 or more.) [Formula A3]
-C0NH(CH2)nrSiRiR2R3 -C0NH (CH 2 ) n rSiRiR 2 R 3
(상기 화학식 A3에서, 내지 ¾중 적어도 하나는 탄소수 1 내지 5의 직쇄 흑은 분지쇄 알콕시기이고, 나머지는 탄소수 1 내지 10의 직쇄 혹은 분지쇄 알킬기이며, m은 3 내지 10의 정수이다. ) 제 8견지에 의하면, 게 7견지에 있어서 상기 알콕시실릴화 단계는 상기 화학식 I A-1 내지 IA-4중 하나의 출발물질의 히드록시기 1당량에 대하여 알콕시실란이 0. 1 당량 내지 5 당량이 되도록 반웅시켜 수행되는'알콕시실릴기를 갖는 노볼락 경화제의 제조방법이 제공된다. 제 9견지에 의하면, 제 7견지에 있어서 상기 알콕시실릴화 단계는 ― 20°C 내지 120°C로 1시간 내지 72시간 동안 반웅시켜 수행되는 알콕시실릴기를 갖는 노볼락 경화제의 제조방법이 제공된다. 제 10견지에 의하면, 에폭시 수지 및 하기 화학식 1-1 내지 1—4로 구성되는 그룹으로부터 선택되는 적어도 하나의 알콕시실릴기를 갖는 노볼락 경화제를 포함하는 조성물이 제공된다. (In Formula A3, at least one of ¾ is a linear black alkoxy branched alkoxy group having 1 to 5 carbon atoms, the remainder is a straight or branched chain alkyl group having 1 to 10 carbon atoms, and m is an integer of 3 to 10.) According to the eighth aspect, in the seventh aspect, the alkoxysilylation step is performed so that the alkoxysilane is 0.1 to 5 equivalents to 1 equivalent of the hydroxy group of the starting material of one of Formulas I A-1 to IA-4. the production method of the novolac curing agent having an "alkoxysilyl group provided that banung was performed. According to a ninth aspect, in the seventh aspect, the alkoxysilylation step provides a method for preparing a novolac curing agent having an alkoxysilyl group, which is performed by reacting at -20 ° C to 120 ° C for 1 to 72 hours. According to a tenth aspect, there is provided a composition comprising an epoxy resin and a novolac curing agent having at least one alkoxysilyl group selected from the group consisting of the following formulas 1-1 to 1-4.
Figure imgf000024_0001
Figure imgf000024_0001
[화학식 1-2]
Figure imgf000024_0002
[화학식 1-3]
[Formula 1-2]
Figure imgf000024_0002
[Formula 1-3]
Figure imgf000025_0001
Figure imgf000025_0001
[화학식 1-4]
Figure imgf000025_0002
[Formula 1-4]
Figure imgf000025_0002
(상기 화학식 1-4에서ᅳ p는 1또는 2이고,  (In Formula 1-4, p is 1 or 2,
X는
Figure imgf000025_0003
이며
Figure imgf000025_0004
서 R은 Cl-ClO의 직쇄 또는 분지쇄상 알킬기이다.)
X is
Figure imgf000025_0003
And
Figure imgf000025_0004
R is a straight or branched chain alkyl group of Cl-ClO.)
(상기 화학식 1-1 내지 1-4에서,  (In the above formula 1-1 to 1-4,
적어도 하나의 A는 하기 화학식 A2 또는 A3이고 적어도 하나가 A2인 나머지 A는 하기 화학식 B2 또는 수소이고, 적어도 하나가 A3인 경우에, 나머지 A는 수소이며, n은 1이상의 정수이다. ) At least one A is of formula A2 or A3 and at least one is A2 Remaining A is the following formula B2 or hydrogen, when at least one is A3, the remaining A is hydrogen, n is an integer of 1 or more. )
[화학식 A2] . Formula A2.
-(CH2)m-SiRiR2R3 -(CH 2 ) m -SiRiR 2 R 3
[화학식 A3] [Formula A3]
-C0NH(CH2)m-Si i 2R3 -C0NH (CH 2 ) m -Si i 2 R 3
(상기 화학식 A2 및 A3에서, 내지 R3 중 적어도 하나는 탄소수 1 내지 5의 직쇄 혹은 분지쇄 알콕시기이고, 나머지는 탄소수 1 내지 10의 직쇄 혹은 분지쇄 알킬기이며, m은 3 내지 10의 정수이다. ) (In Formulas A2 and A3, at least one of to R 3 is a straight or branched chain alkoxy group having 1 to 5 carbon atoms, the rest is a straight or branched chain alkyl group having 1 to 10 carbon atoms, and m is an integer of 3 to 10. .)
[화학식 B2] [Formula B2]
-(CH2) ,-CH=CH2 -(CH 2 ), -CH = CH 2
(식 중, 1은 1 내지 8의 정수이다. ) 제 11견지에 의하면, 제 10견지에 있어서 상기 에폭시 수지는 글리시딜에테르계 에폭시 수지, 글리시딜계 에폭시 수지, 글리시딜아민계 에폭시 수지, 및 글리시딜에스테르계 에폭시 수지로 구성되는 그룹으로부터 선택되는 적어도 일종인 조성물이 제공된다. 제 12견지에 의하면, 제.11견지에 있어서, 상기 에폭시 수지는 코어구조로 비스페놀, 비페닐, 나프탈렌, 벤젠, 티오디페놀, 플루오렌 ( f luorene) , 안트라센, 이소시아누레이트, 트리페닐메탄, 1,1 , 2,2-테트라페닐에탄, 테트라페닐메탄, 4 , 4 ' -디아미노디페닐메탄, 아미노페놀, 지환족, 지방족, 또는 노볼락 유니트를 갖는 조성물이 제공된다. 제 13견지에 의하면, 제 11견지 또는 제 12견지에 있어서 상기 에폭시 수지는 알콕시실릴기를 갖거나 갖지 않는 에폭시 수지를 포함하는 조성물이 제공된다. 제 14견지에 의하면, 제 10견지에 있어서 충전제로서 무기입자 또는 /및 섬유를 추가로 포함하는 조성물이 제공된다. 제 15견지에 의하면, 제 14견지에 있어서 상기 무기입자는 실리카, 지르코니아, 티타니아, 알루미나, 질화규소, 질화알루미늄, 및 실세스퀴옥산으로 구성되는 그룹으로부터 선택되는 적어도 일종인 조성물이 제공된다. 제 16견지에 의하면, 제 14견지에 있어서 상기 무기입자는 상기 조성물의 고형분 총 중량을 기준으로 5wt% 내자 95 %로 포함되는 조성물이 제공된다. 제 17견지에 의하면, 제 16견지에 있어서 상기 무기입자는 상기 조성물의 고형분 총 중량을 기준으로 30wt% 내지 95 %로 포함되는 조성물이 제공된다. 제 18견지에 의하면, 제 16견지에 있어서 상기 무기입자는 상기 조성물의 고형분 총 중량을 기준으로 5wt% 내지 6(½«로 포함되는 조성물이 제공된다. 제 19견지에 의하면, 제 14견지에 있어서 상기 섬유는 E 유리섬유, T 유리섬유, S 유리섬유, NE 유리섬유, H 유리섬유, 및 석영으로 구성되는 그룹으로부터 선택되는 유리섬유; 및 액정 폴리에스테르 섬유, 폴리에틸렌테레프탈레이트 섬유, 전방향족 섬유, 폴리벤조옥사졸 섬유, 나일론 섬유, 폴리에틸렌 나프탈레이트 섬유,.폴리프로필렌 섬유, 폴리에테르 술폰 섬유, 폴리비닐리덴플로라이드 섬유, 폴리에틸렌 술파이드 섬유, 및 폴리에테르에테르케톤 섬유로 구성되는 그룹으로부터 선택되는 유기 섬유로 구성되는 그룹으로부터 선택되는 적어도 일종인 조성물이 제공된다. 제 20견지에 의하면, 제 19견지에 있어서 상기 섬유는 E 유리섬유인 조성물이 제공돤다. 제 21견지에 의하면, 제 19견지에 있어서 상기 섬유는 T 유리섬유인 조성물이 제공된다. 제 22견지에 의하면, 제 14견지에 있어서 상기 섬유는 상기 조성 고형분 총 중량에 대하여 10 wt% 내지 90 ¾로 포함되는 조성물이 제공된다. 제 23견지에 의하면, 제 14견지에 있어서 상기 충전제로서 섬유를 포함하는 경우에, 무기입자를 추가로 포함하는 조성물이 제공된다. 제 24견지에 의하면, 제 10견지에 있어서 알콕시실릴기 반웅촉매를 추가로 포함하는 조성물이 제공된다. 제 25견지에 의하면, 제 24견지에 있어서 상기 알콕시실릴기 반응촉매는 질산, 황산, 염산, 아세트산, 인산, 암모니아, K0H, NH40H , 아민, 전이 금속 알콕사이드, 및 주석 ( t in) 화합물로 구성되는 그룹으로부터 선택되는 적어도 일종인 조성물이 제공된다. 제 26견지에 의하면, 제 24견지에 있어서 상기 반웅촉매는 알콕시실릴기를 갖는 에폭시 수지에 대하여 0.01 phr 내지 10 phr로 포함되는 조성물이 제공된다. 제 27견지에 의하면, 제 24견지에 있어서 물을 추가적으로 포함하는 조성물이 제공된다. 제 28견지에 의하면, 제 10 내지 제 27견지 중 어느 하나의 조성물을 포함하는 전자재료가 제공된다. 제 29견지에 의하면, 제 10 내지 제 27견지 (In formula, 1 is an integer of 1-8.) According to the eleventh aspect, in the tenth aspect, the epoxy resin is a glycidyl ether epoxy resin, glycidyl epoxy resin, glycidylamine epoxy resin And at least one composition selected from the group consisting of glycidyl ester epoxy resins. According to a twelfth aspect, in the eleventh aspect, the epoxy resin has a core structure of bisphenol, biphenyl, naphthalene, benzene, thiodiphenol, fluorene, anthracene, isocyanurate, and triphenylmethane. A composition having 1,1,2,2-tetraphenylethane, tetraphenylmethane, 4,4'-diaminodiphenylmethane, aminophenol, alicyclic, aliphatic, or novolak unit is provided. According to the thirteenth aspect, in the eleventh or twelfth aspect, the epoxy resin is provided with a composition comprising an epoxy resin with or without an alkoxysilyl group. According to the fourteenth aspect, in the tenth aspect, a composition further comprising inorganic particles or / and fibers as a filler is provided. According to a fifteenth aspect, in the fourteenth aspect, the inorganic particles are at least one composition selected from the group consisting of silica, zirconia, titania, alumina, silicon nitride, aluminum nitride, and silsesquioxane. According to the sixteenth aspect, in the fourteenth aspect, the inorganic particles are provided with a composition containing 5 wt% to 95% based on the total weight of solids of the composition. According to a seventeenth aspect, in the sixteenth aspect, the inorganic particles A composition is provided that includes 30 wt% to 95% based on the total weight of solids. According to the eighteenth aspect, in the sixteenth aspect, the inorganic particles are provided in a range of 5 wt% to 6 (½ «based on the total weight of solids of the composition. According to the nineteenth aspect, in the fourteenth aspect The fiber is glass fiber selected from the group consisting of E glass fiber, T glass fiber, S glass fiber, NE glass fiber, H glass fiber, and quartz; and liquid crystal polyester fiber, polyethylene terephthalate fiber, wholly aromatic fiber, polybenzoxazole fiber, nylon fiber, polyethylene naphthalate fiber, polypropylene fiber, polyethersulfone fiber, polyvinylidene fluoride fiber, polyethylene sulfide fibers, and a polyether selected from the group consisting of ketone fiber At least one composition selected from the group consisting of organic fibers is provided. In the 19th aspect, the fiber was provided with the composition which is E glass fiber .. According to the 21st aspect, the composition is the T glass fiber in 19th aspect. In terms of the fiber is the composition A composition is provided which comprises from 10 wt% to 90 ¾ with respect to the total weight of solids. According to the twenty third aspect, when the fiber is included as the filler according to the fourteenth aspect, a composition further comprising inorganic particles is provided. According to the twenty-fourth aspect, in the tenth aspect, a composition further comprising an alkoxysilyl group semi-aqueous catalyst is provided. According to a twenty-fifth aspect, in the twenty-fourth aspect, the alkoxysilyl group reaction catalyst is selected from nitric acid, sulfuric acid, hydrochloric acid, acetic acid, phosphoric acid, ammonia, K0H, NH 4 0H, amine, transition metal alkoxide, and tin (t in) compound. At least one composition selected from the group consisting of is provided. According to a twenty sixth aspect, in the twenty fourth aspect, the composition is provided in which the semi-aqueous catalyst is contained in an amount of 0.01 phr to 10 phr relative to the epoxy resin having an alkoxysilyl group. According to a twenty seventh aspect, in the twenty fourth aspect, a composition further comprising water is provided. According to the 28th aspect, the electronic material containing the composition in any one of 10th-27th aspect is provided. According to the 29th opinion, the 10th to 27th opinions
포함하는 기판이 제공된다. 제 30견지에 의하면, 제 10 내지 제 27견지 Provided is a substrate comprising. According to the thirtieth opinion, tenth to twenty-seventh opinion
포함하는 필름이 제공된다. 제 31견지에 의하면, 제 10 내지 제 27견지 중 어느 하나의 조성물로 이루어진 기재층 상에 금속충을 포함하는 적층판이 제공된다. 제 32견지에 의하면, 제 31견지에 있어서 적층판을 포함하는 인쇄배선판이 제공된다. 제 33견지에 의하면, 제 32견지에 있어서 인쇄배선판을 포함하는 반도체 장치가 제공된다. 제 34견지에 의하면, 제 10 내지 제 27견지 중 어느 하나의 조성물을 포함하는 반도체 패키징 재료가 제공된다. 제 35견지에 의하면, 제 34견지에 있어서 반도체 패키징 재료를 포함하는 반도체 장치가 제공된다. 제 36견지에 의하면, 제 10 내지 제 27견지 중 어느 하나의 조성물을 포함하는 접착제가 제공된다. · 제 37견지에 의하면, 게 10 내지 제 27견지 중 어느 하나의 조성물을 포함하는 도료가 제공된다. 제 38견지에 의하면, 제 10 내지 제 27견지 중 어느 하나의 조성물을 포함하는 복합재료가 제공된다. 제 39견지에 의하면, 제 10 내지 제 27견지 증 어느 하나의 조성물을 포함하는 프리프레그가 제공된다. 제 40견지에 의하면, 제 39견지에 있어서 프리프레그에 금속층이 배치된 적층판이 제공된다. 제 41견지에 의하면, 제 10 내지 제 27견지 증 어느 하나의 조성물의 경화물이 제공된다. 제 42견지에 의하면, 제 41견지에 있어서 열팽창계수가 60ppm/ °C 이하인 조성물의 경화물이 제공된다. 제 43견지에' 의하면, 제 41견지에 있어서 유리전이온도가 100°C 보다 높거나 유리전이온도를 나타내지 않는 조성물의 경화물이 제공된다. A film comprising is provided. According to the thirty-first aspect, there is provided a laminate comprising a metal worm on a base layer made of the composition of any one of the tenth to twenty-seventh aspects. According to the thirty-second aspect, in the thirty-first aspect, a printed wiring board including a laminated board is provided. According to the thirty-third aspect, in the thirty-second aspect, a semiconductor device including a printed wiring board is provided. According to a thirty-fourth aspect, there is provided a semiconductor packaging material comprising the composition of any one of the tenth to twenty-seventh aspects. According to the thirty fifth aspect, in the thirty-fourth aspect, a semiconductor device including a semiconductor packaging material is provided. According to a thirty sixth aspect, there is provided an adhesive comprising the composition of any one of the tenth to twenty seventh aspects. According to a thirty seventh aspect, there is provided a paint comprising the composition of any one of the crabs 10 to 27. According to a thirty eighth aspect, there is provided a composite material comprising the composition of any one of the tenth to twenty seventh aspects. According to a thirty-ninth aspect, there is provided a prepreg comprising the composition of any one of the tenth to twenty-seventh symptoms. According to the 40th aspect, in the 39th aspect, the laminated board with a metal layer arrange | positioned at the prepreg is provided. According to a forty-first aspect, the cured product of any one of the tenth to twenty-seventh symptom compositions is provided. According to the forty-fourth aspect, in the forty-first aspect, a cured product of the composition having a thermal expansion coefficient of 60 ppm / ° C. or less is provided. 43 According to the aspect ", 41st aspect the cured product of the composition the glass transition temperature does not represent a higher or a glass transition temperature greater than 100 ° C is provided in the.
【발명의 효과】 【Effects of the Invention】
본 발명에 의한 알콕시실릴기를 갖는 새로운 노볼락 경화제를 포함하는 조성물은 복합체 및 /또는 경화물에서, 알콕시실릴기와 충전제 (섬유 및 /또는 무기입자)와의 계면 결합 및 알콕시실릴기와 에폭시 및 경화제와의 반응에 의한 추가 화학 결합의 형성으로, 향상된 내열특성을 갖는다. 즉, 에폭시 복합체의 CTE가 감소되고 유리전이은도가 상승하거나 유리전이온도를 나타내지 않는 (이하, ' Tg 리스'라 함) 효과를 나타낸다. 나아가, 본 발명에 의한 알콕시실릴기를 갖는 노볼락 경화제를 포함하는 조성물의 경화물은 알콕시실릴기의 도입에 의해, 우수한 난연성을 나타낸다. 또한, 본 발명에 의한 알콕시실릴기를 갖는 새로운 노볼락 경화제는 알콕시실릴기를 갖는 에폭시 수지에 비하예 고형 (sol id)화 하기가 용이하여 고상 시료가 요구되는 공정에 대한 적용이 용이하고, 경화물의 취성 (br i t t leness) 및 접착성이 향상된다. 더욱이 , 본 발명에 의한 조성물을 기판의 금속필름에 적용하는 경우에, 금속필름 표면의 작용기와 알콕시실릴기의 화학결합에 의해 금속필름에 대하여 우수한 접착력을 나타낸다. The composition comprising a new novolac curing agent having an alkoxysilyl group according to the present invention is used in the composite and / or cured product to form an interfacial bond between an alkoxysilyl group and a filler (fibers and / or inorganic particles) and to react an alkoxysilyl group with an epoxy and a curing agent. The formation of further chemical bonds by means of improved heat resistance. That is, the CTE of the epoxy composite is reduced and the glass transition degree is increased or the glass transition temperature is not exhibited (hereinafter referred to as 'Tg lease'). Furthermore, the hardened | cured material of the composition containing the novolak hardening | curing agent which has the alkoxy silyl group by this invention shows the outstanding flame retardance by introduction of the alkoxy silyl group. In addition, the novel novolak curing agent having an alkoxysilyl group according to the present invention is easy to be solidified (sol id) to an epoxy resin having an alkoxysilyl group, so that it is easy to be applied to a process requiring a solid phase sample, and brittleness of the cured product. (br it leness) and adhesion are improved. Furthermore, in the case of applying the composition according to the present invention to a metal film of a substrate, the chemical film of the functional group on the surface of the metal film and the alkoxysilyl group is applied to the metal film. Excellent adhesion.
【도면의 간단한 설명】 도 1은 실시예 1 및 비교예 1에 의한 유리섬유복합체의 온도에 따른 길이변화를 측정한 결과이다. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a result of measuring the length change with the temperature of the glass fiber composite body by Example 1 and the comparative example 1. FIG.
【발명을 실시하기 위한 구체적인 내용】 [Specific contents to carry out invention]
본 발명은 알콕시실릴기를 갖는 경화제를 포함한 조성물을 이용하여 복합체형성시, 개선된 내열특성, 구체적으로는 낮은 CTE 및 높은 Tg (Tg 리스 포함) 및 /또는 경화물에서 우수한 난연성을 갖는 알콕시실릴기를 갖는 새로운 노볼락 경화제, 이의 제조방법 , 이를 포함하는 경화제 조성물과 경화물 및 이의 용도를 제공하는 것이다. 본 발명에서 "복합체 또는 에폭시 복합체 "란 에폭시 수지 경화제 및 충전제 (섬유 및 /또는 무기입자)를 포함하는 조성물의 경화물을 말한다. 본 발명에서 "경화물 또는 에폭시 경화물 "이란 일반적인 의미로서 에폭시 수지 및 경화제를 포함하는 조성물의 경화물을 말하는 것으로, 에폭시 수지 및 경화제 이외에 충전제, 임의의 추가적인 경화제, 임의의 경화 촉매 및 기타 첨가제로 구성되는 그룹으로부터 선택되는 적어도 일종을 포함하는. 조성물의 경화물을 말한다. 또한, 상기 경화물은 반경화물을 포함할 수 있다. 일반적으로 무기입자 및 /또는 섬유가 보강된 경화물을 복합체라 하므로, 경화물은 복합체보다 넓은 의미이지만, 무기입자.및 /또는 섬유가 보강된 경화물은 복합체와 동일한 의미로 이해될 수 있다. The present invention has improved heat resistance properties when forming a composite using a composition comprising a curing agent having an alkoxysilyl group, specifically having a low CTE and a high Tg (including Tg lease) and / or having an alkoxysilyl group having excellent flame retardancy in the cured product. It is to provide a new novolac curing agent, a method for preparing the same, a curing agent composition and a cured product comprising the same, and uses thereof. In the present invention, "composite or epoxy composite" refers to a cured product of a composition comprising an epoxy resin curing agent and a filler (fibers and / or inorganic particles). As used herein, the term "cured or epoxy cured product" refers to a cured product of a composition comprising an epoxy resin and a curing agent. In addition to the epoxy resin and the curing agent, fillers, optional additional curing agents, optional curing catalysts, and other additives Comprising at least one selected from the group consisting of. The hardened | cured material of a composition is said. In addition, the cured product may include a semi-cargo. In general, inorganic particles And / or a cured product reinforced with fibers, so that the cured product has a broader meaning than the composite, but an inorganic particle. And / or a cured product reinforced with fibers may be understood to have the same meaning as the composite.
― 본 발명에 의한 새로운 노볼락 경화제는 경화에 의한 복합체 형성시, 알콕시실릴기가 충전제 (섬유 및 /또는 무기입자) 표면과의 계면 결합 및 /또는 알콕시실릴기와 에폭사이드기 및 페놀기와 화학결합을 형성하므로, 낮은 CTE 및 높은 유리전이온도 상승효과 또는 Tg-리스 ( less)를 나타낸다. 따라서, 치수안정성이 향상된다. 또한, 본 발명에 의한 노볼락 경화제를 포함하는 경화물은 우수한 난연성을 나타낸다ᅳ 나아가, 본 발명에 의한 조성물은 화학적으로 처리된 금속필름, 예를 들어 동박 등에 적용 시, 경화제의 알콕시실릴기가 금속표면 처리에 의한 금속표면의 -0H기 등과 화학결합하므로 금속필름과 우수한 접착력을 나타낸다. -The new novolac curing agent according to the present invention forms an interfacial bond with the surface of the filler (fibers and / or inorganic particles) and / or an alkoxysilyl group, an epoxide group and a phenol group and a chemical bond when the complex is formed by curing. Therefore, it shows low CTE and high glass transition temperature synergistic effect or Tg-less (less). Therefore, the dimensional stability is improved. In addition, the cured product including the novolac curing agent according to the present invention exhibits excellent flame retardancy. Furthermore, the composition according to the present invention is applied to a chemically treated metal film, for example, copper foil, and the like, and the alkoxysilyl group of the curing agent is applied to the metal surface. As it is chemically bonded with -0H group on the metal surface by treatment, it shows excellent adhesion with metal film.
1. 알콕시실릴기를 갖는 노볼락 경화제 1. Novolac curing agent having an alkoxysilyl group
본 발명의 일 실시형태에 의하면, 하기 화학식 Iᅳ 1 내지 1-4로 구성되는 그룹으로부터 선택된 어떠한 하나의 알콕시실릴기를 갖는 노볼락 경화제가 제공된다. [화학식 Iᅳ 1]
Figure imgf000035_0001
According to one embodiment of the present invention, there is provided a novolak curing agent having any one alkoxysilyl group selected from the group consisting of the following formulas I '1 to 1-4. [Formula I ᅳ 1]
Figure imgf000035_0001
상기 화학식 Iᅳ 1에서, Z는 하기 화학식 1A 내지 1F로 구성되는 그룹 중 하나이다.
Figure imgf000035_0002
In Chemical Formula I ′ 1, Z is one of the groups consisting of the following Chemical Formulas 1A to 1F.
Figure imgf000035_0002
1A 1B 1C  1A 1B 1C
Figure imgf000035_0003
[화학식 I一 3]
Figure imgf000036_0001
Figure imgf000035_0003
Formula I 一 3
Figure imgf000036_0001
[화학식 1-4] [Formula 1-4]
Figure imgf000036_0002
Figure imgf000036_0002
(화학식 Iᅳ 4에서, p는 1 또는 2이고  In formula I 4, p is 1 or 2
CHr, CH r ,
X는
Figure imgf000036_0003
이며
Figure imgf000036_0004
서 R은 CI— CIO의 직쇄 또는 측쇄상 알킬기이다.)
X is
Figure imgf000036_0003
And
Figure imgf000036_0004
R is a straight or branched alkyl group of CI—CIO.)
상기 화학식 1-1 내지 1-4에서, 다수의 A중 적어도 하나는 하기 화학식 A2 또는 A3이고; 적어도 하나가 A2인 경우에, 나머지 A는 하기 화학식 B2 또는 수소이고, 적어도 하나가 A3인 경우에 , 나머지 A는 수소이며, . In Chemical Formulas 1-1 to 1-4, At least one of the plurality of A is of formula A2 or A3; At least when one of A2, and when the remaining A are hydrogen or the formula B2, at least one of which is A3, and the remaining A are hydrogen.
n은 1이상, 예를 들어, 1 내지 1000의 정수이다.  n is 1 or more, for example, the integer of 1-1000.
[화학식 A2] [Formula A2]
-(CH2)m-S iR1R2R3 -(CH 2 ) m -S iR 1 R 2 R 3
[화학식 A3][Formula A3]
Figure imgf000037_0001
상기 화학식 A2 및 A3에서, 내지 R3증 적어도 하나는 탄소수 1 내지 5 알콕시기 바람직하게는 탄소수 내지 3의 알콕시기. 더욱 바람직하게는 메톡시기이거나 에특시기이다그 나머지는 탄소수 1 내지 10 알킬기이며, m은 3 내지 10의 정수, 바람직하게는 3 내지 6의 정수이다. 상기 알콕시기 및 알킬기는 직쇄 흑은 분지쇄일 수 있다.
Figure imgf000037_0001
In Chemical Formulas A2 and A3, at least one of R 3 and R 3 is an alkoxy group having 1 to 5 carbon atoms, preferably an alkoxy group having 3 to 3 carbon atoms. More preferably, it is a methoxy group or a special group. The remainder is a C1-C10 alkyl group, m is an integer of 3-10, Preferably it is an integer of 3-6. The alkoxy group and the alkyl group may be straight chain black or branched chain.
[화학식 B2][Formula B2]
Figure imgf000037_0002
Figure imgf000037_0002
(식중, 1은 1 내지 8의 정수이다ᅳ ) 상기 본 발명의 일 실시형태에 의한 알콕시실릴기를 갖는 노볼락 경화제에서, "상기 화학식 A2 및 A3에서, 바람직하게는 내지 ¾의 알콕시기 중 적어도 하나가 메록시인 것은 반응성 향상 측면에서 바람직하고, 에록시기인 것은 반웅안정성 측면, 즉 시료 안정성 및 /또는 우수한 반응성 측면에서 바람직하다. 본 명세서에서 , "알콕시기"는 —OR (R은 알킬기)인 1가 그룹으로서, 이는 직쇄상 또는 분지쇄일 수 있으며, 본 명세서에서 분지쇄와 측쇄는 상호 호환적으로 사용될 수 있다. 본 명세서에서 , "알킬기 "는 1가 (monoval ent ) 탄화수소 그룹을 말하여 , 이는 직쇄상 또는 분지쇄일 수 있고, 바람직하게는 1 내지 10의 탄소수를 가지며, 보다 바람직하게는 1 내지 5의 탄소수를 갖는 것이다. 나아가, 상기 본 발명의 일 실시형태에 의한, 알콕시실릴기를 갖는 노볼락 경화제는 이를 포함하는 조성물의 복합체 형성 시에, 낮은 CTE 및 높은 유리전이온도 또는 Tg-리스 ( less)를 나타낸다. (Wherein 1 is an integer of 1 to 8) In the novolak curing agent having an alkoxysilyl group according to an embodiment of the present invention, "In formulas A2 and A3, preferably at least one of the alkoxy groups of from ¾ to methoxy is preferable in terms of improving the reactivity, and Preference is given to the semi- stable stability, i.e., in terms of sample stability and / or good reactivity.In this specification, an "alkoxy group" is a monovalent group which is —OR (R is an alkyl group), which may be linear or branched, In this specification, the branched chain and the branched chain may be used interchangeably. In this specification, an "alkyl group" refers to a monovalent ent hydrocarbon group, which may be linear or branched, and preferably 1 It has a carbon number of 10 to 10, More preferably, it has a carbon number of 1 to 5. Furthermore, the alkoxysilyl group by one Embodiment of the said invention is mentioned. The novolac curing agent having exhibits low CTE and high glass transition temperature or Tg-less when forming a composite of the composition comprising the same.
2. 알콕시실릴기를 갖는 노볼락 경화제의 제조방법 2. Method for producing a novolac curing agent having an alkoxysilyl group
본 발명의 일 실시형태에 의한 상기 화학식 1-1 내지 1—4의 알콕시실릴기를 갖는 노볼락 경화제는 다음과 같은 방법으로 합성될 수 있다. 후술하는 알콕시실릴기를 갖는 노볼락 경화제의 제조방법은 알콕시실릴기를 갖는 에폭시 수지의 제조방법에 비하여 간단하고 단순하다. The novolac curing agent having an alkoxysilyl group represented by Chemical Formulas 1-1 to 1-4 according to one embodiment of the present invention may be synthesized by the following method. The manufacturing method of the novolak hardening agent which has an alkoxy silyl group mentioned later is simple and simple compared with the manufacturing method of the epoxy resin which has an alkoxy silyl group.
( 1) 화학식 A2를 갖는 화학식 1-1 내지 1-4의 알콕시실릴기를 갖는 노불락 경화제의 제조방법 (방법 1) 본 발명의 다른 실시형태에 의하면, 화학식 Α2의 치환기를 갖는 화학식 1-1 내지 1-4의 새로운 노볼락 경화제의 제조방법이 제공된다. 화학식 Α2의 치환기를 갖는 새로운 노볼락 경화제는 출발물질의 알케닐화 (제 1단계) 및 알콕시실릴화 (제 2단계)에 의한 방법으로 제조될 수 있다. 제 1단계에서 하기 화학식 IA-1 내지 ΙΑ-4 중 하나의 출발물질 (이하, '출발물질 ' 또는 '출발물잘 IA '라 하기도 함)과 하기 화학식 Π의 알케닐의 반웅으로 출발물질 중 히드록시기의 적어도 하나가 알케닐화된 화학식 IBᅳ 1 내지 IB-4 중 어느 하나의 중간생성물 (이하, '중간생성물 IB '라 함)을 형성한다. (1) Process for preparing a nobulac curing agent having an alkoxysilyl group of formulas 1-1 to 1-4 having formula A2 (Method 1) According to another embodiment of the present invention, formulas 1-1 to 1 having a substituent of formula A2 Provided are a method for producing a new novolac curing agent of 1-4. New novolac curing agents with substituents of formula A2 can be prepared by the process by alkenylation (first step) and alkoxysilylation (second step) of the starting materials. In the first step, a reaction of a hydroxy group in the starting material by reaction of a starting material of one of the following formulas IA-1 to ΙΑ-4 (hereinafter, also referred to as 'starting material' or 'starting material IA') and alkenyl of the formula At least one of the alkenylated intermediates of any one of formulas IB ′ 1 to IB-4 (hereinafter referred to as “intermediate IB”).
[화학식 IA-1]
Figure imgf000039_0001
[Formula IA-1]
Figure imgf000039_0001
상기 화학식 IAᅳ 1에서 X는 하기 화학식 2A 내지 2F로 구성되는 그룹 중 하나이다ᅳ X in Formula IA ′ 1 is one of a group consisting of Formulas 2A to 2F.
Figure imgf000040_0001
Figure imgf000040_0001
 [화학식 IA-4]  [Formula IA-4]
Figure imgf000041_0001
xl은
Figure imgf000041_0001
xl is
Figure imgf000041_0002
Figure imgf000041_0002
Figure imgf000041_0003
, R은 C1-C10의 직쇄 또는 측쇄상 알킬기이다. ) 상기 화학식 IA-1 내지 IA-4에서, n은 1이상의 정수이다. ) 구체적으로ᅳ 상기 화학식 IA-1 내지 IA-4에서, n은 1이상의 정수로, 예를 들어, 1 내지 1000의 정수이며, 이는 이들 범위의 모든 정수 및 어떠한 다른 보다 작은 범위의 정수를 포함하는 의미이다. 화학식 IA-4에서, p는 1 또는 2이다.
Figure imgf000041_0003
, R is a C1-C10 linear or branched alkyl group. In Formulas IA-1 to IA-4, n is an integer of 1 or more. Specifically, in Formulas IA-1 to IA-4, n is an integer of 1 or more, for example, an integer of 1 to 1000, which includes all integers in these ranges and any other smaller range of integers. It means. In formula (IA-4), p is 1 or 2.
[화학식 IB-1]
Figure imgf000041_0004
[Formula IB-1]
Figure imgf000041_0004
상기 식에서, Π은 하기 화학식 3A 내지 3F로 구성되는 그룹 중의 하나이다.
Figure imgf000042_0001
Figure imgf000042_0002
Figure imgf000042_0003
Figure imgf000042_0004
[화학식 IB-4]
Figure imgf000043_0001
In the formula, Π is selected from the group consisting of the following formulas 3A to 3F One.
Figure imgf000042_0001
Figure imgf000042_0002
Figure imgf000042_0003
Figure imgf000042_0004
[Formula IB-4]
Figure imgf000043_0001
(화학식 IB-4에서 x2
Figure imgf000043_0002
X2 in Formula IB-4
Figure imgf000043_0002
Figure imgf000043_0003
R은 C1-C10의 직쇄 혹은 분지쇄의 알킬기이다. )
Figure imgf000043_0003
R is a C1-C10 linear or branched alkyl group. )
상기 화학식 IB-1 내지 IB-4에서, 다수의 D중 적어도 하나는 하기 화학식 B2이고, 나머지는 수소일 수 있으며 ,  In Formulas IB-1 to IB-4, at least one of a plurality of D may be represented by Formula B2, and the rest may be hydrogen.
n은 1이상의 정수이다.  n is an integer of 1 or more.
,화학식 IB-4에서, p는 1 또는 2이다.  In formula IB-4, p is 1 or 2.
[화학식 B2]  [Formula B2]
-(CH2) rCH=CH2 -(CH 2 ) rCH = CH 2
식 중, 1은 1 내지 8의 정수이며, 바람직하게는 1 내지 4의 정수이다. [화학식 Π] In formula, 1 is an integer of 1-8, Preferably it is an integer of 1-4. [Formula Π]
X-(CH2)rCH=CH2 X- (CH 2 ) rCH = CH 2
식 중, 1은 1 내지 8의 정수이며, 바람직하게는 1 내지 4의 정수이고, X는 CI, Br 또는 I와 같은 할라이드, -으 S02-CH3, -0一 S02-CF3, 또는 ᅳ으 S02ᅳ C6H4- CH3 이다. · 상기 제 1 단계의 반응인 알케닐화는 상기 화학식 IA-1 내지 IA-4 중 하나의 출발물질과 상기 화학식 Π의 알케닐 화합물을 반응시켜서 행하며, 이와 같은 반웅은 염기 및 임의의 용매 존재 하에서 수행될 수 있다ᅳ 예를 들어, 출발물질과 알케닐 화합물은 상기 알케닐 화합물이 출발물질의 히드록시 그룹 1 당량에 대하며 알케닐기가 0.1 내지 10 당량이 되도록 염기 및 임의의 용매 존재하에서 반웅시켜서 중간생성물 IB를 얻는다. 상기 반웅물은 화학양론적 당량비로 반웅하여, 이를 고려하여 상기 당량비로 반웅시킴으로써 원하는 증간생성물 IB가 얻어진다. 상기 제 1단계 반웅의 반응온도 및 반응시간은 반응물의 종류에 따라 달라지지만, 예를 들어, ᅳ 20°C 내지 100 °C로 1시간 내지 120시간 동안 반웅시킴으로써 중간생성물 IB가 얻어진다. 사용 가능한 염기의 예로는 이로써 한정하는 것은 아니지만, 예를 들어 KOH, NaOH, 2C03, Na2C03, KHC03, NaHC03) NaH, 트리에틸아민, 디이소프로필에틸 아민을 들 수 있다. 이들 염기는 단독으로 흑은 2가지 이상의 함께 사용될 수 있다. 염기는 상기 출발물질 IA의 히드록시 그룹 1당량에 대하여 0. 1 당량 내지 5 당량으로 사용하는 것이 반웅효율 측면에서 좋다. 제 1단계 반웅에서 용매는 필요에 따라 임의로 사용될 수 있다. 예를 들어, 제 1단계 반웅에서 별도의 용매 없이도 반웅온도에서 반응물의 점도가 반응이 진행되기에 적합하면 용매를 사용하지 않을 수 있다..즉, 반응물와 혼합 및 교반이 용매 없이 원활하게 진행될 수 있을 정도로 반웅물의 점도가 낮아지면 별도의 용매를 필요로 하지 않으며, 이는 당업자가 용이하게 판단할 수 있다. 용매를 사용할 경우, 가능한 용매로는 반웅물을 잘 용해할 수 있으며, 반웅에 어떠한 악영향을 미치지 않고 반웅 후에 쉽게 제거될 수 있는 한 어떠한 유기용매가 사용될 수 있으며, 이로써 특히 한정하는 것은 아니지만, 예를 들어, 아세토니트릴, THF( tetra hydro fur an) , MEK(methyl ethyl ketone) , DMF( dimethyl formamicle) , DMS0( dimethyl sul foxide) , 메틸렌 클로라이드 (MC) , ¾0, 알코올류 및 롤루엔 등이 사용될 수 있다. 이들 용매는 단독으로 혹은 2가지 이상이 함께 사용될 수 았다. 용매의 사용양은 특히 한정되는 것은 아니며, 반웅물이 충분히 용해되고 반웅에 바람직하지 않은 영향을 미치지 않는 범위에서 적합한 양 및 /또는 농도로 사용될 수 있으며. 이 가술분야의 기술자는 이를 고려하여 적합하게 선택할 수 있다. 그 후, 제 2단계에서, 상기 중간생성물 I B를 알콕시실릴화하므로써 본 발명의 일 실시형태에 의한 치환기 A2를 갖는 화학식 1-1 내지 1—4의 노볼락 경화제가 얻어진다. 이와 같은 반웅은 촉매 및 임의의 용매 존재 하에서 수행될 수 있으며, 이때 사용될 수 있는 촉매로는 백금 촉매가 바람직하다. 제 2단계 반웅에서. 중간생성물 IB와 알콕시실란은 중간생성물 IB 의 알케닐 그룹과 알콕시실란이 화학양론에 따라 당량비로 반웅하므로, 이를 고려하여 상기 중간생성물 IB의 알케닐 그룹 1 당량에 대하여 하기 화학식 ΙΠΑ의 알콕시실란이 0. 1 당량 내지 5 당량이 되도록 중간생성물 IB와 하기 화학식 ΠΙΑ의 알콕시실란을 반응시킨다. Wherein 1 is an integer of 1 to 8, preferably an integer of 1 to 4, X is a halide such as CI, Br or I, -O S0 2 -CH 3 , -0 一 S0 2 -CF 3 , Or S S0 2 ᅳ C 6 H 4 -CH 3 . Alkenylation, the reaction of the first step, is carried out by reacting the starting material of one of the above formulas IA-1 to IA-4 with the alkenyl compound of the formula Π, which reaction is carried out in the presence of a base and an optional solvent. For example, the starting material and the alkenyl compound may be reacted in the presence of a base and an optional solvent such that the alkenyl compound corresponds to 1 equivalent of the hydroxy group of the starting material and the alkenyl group is from 0.1 to 10 equivalents. Get IB The reaction product is reacted with a stoichiometric equivalence ratio, and in consideration of this, the reaction product is reacted with the equivalence ratio to obtain a desired intermediate product IB. The reaction temperature and reaction time of the first step reaction are dependent on the type of reactant, but, for example, the intermediate product IB is obtained by reacting the reaction at 20 ° C. to 100 ° C. for 1 hour to 120 hours. Examples of bases that can be used include, but are not limited to, for example, KOH, NaOH, 2 C0 3 , Na 2 C0 3 , KHC0 3 , NaHC0 3) NaH, triethylamine, diisopropylethyl Amines. These bases may be used alone or in combination of two or more of them. The base may be used in an amount of 0.01 to 5 equivalents based on 1 equivalent of the hydroxy group of the starting material IA in terms of reaction efficiency. In the first stage reaction, the solvent may optionally be used as necessary. For example, the solvent may not be used if the viscosity of the reactants at the reaction temperature is suitable for the reaction to proceed without reaction in the first step reaction. That is, mixing and stirring with the reactants may proceed smoothly without solvent. If the viscosity of the reaction product is low enough, it does not require a separate solvent, which can be easily determined by those skilled in the art. In the case of using a solvent, as a possible solvent, the reaction product can be dissolved well, and any organic solvent can be used as long as it can be easily removed after the reaction without adversely affecting the reaction. For example, acetonitrile, tetrahydrofuran (THF), methyl ethyl ketone (MEK), dimethyl formamicle (DMF), dimethyl sul foxide (DMMS0), methylene chloride (MC), ¾0, alcohols and roluene can be used. have. These solvents may be used alone or in combination of two or more. The amount of the solvent used is not particularly limited and may be used in a suitable amount and / or concentration in a range in which the reaction product is sufficiently dissolved and does not adversely affect the reaction. Those skilled in the art can make appropriate selections in view of this. Then, in the second step, the intermediate product IB is obtained by alkoxysilylation. The novolak hardening | curing agent of Formula 1-1 to 1-4 which has substituent A2 by one embodiment of the invention is obtained. This reaction can be carried out in the presence of a catalyst and any solvent, in which case a platinum catalyst is preferred. In the second stage reaction. Since the intermediate product IB and the alkoxysilane react at an equivalence ratio of the alkenyl group and the alkoxysilane of the intermediate product IB according to the stoichiometry, in consideration of this, the alkoxysilane of the general formula ΙΠΑ is 0 to 1 equivalent of the alkenyl group of the intermediate product IB. Intermediate IB is reacted with an alkoxysilane of the formula
[화학식 ΙΠΑ] [Formula ΙΠΑ]
HSiRaRbRc HSiR a R b R c
상기 화학식 mA에서, Ra 내지 Rc중 적어도 하나는 C1-C5 알콕시기, 바람직하게는 C1-C3알콕시기, 더욱 바람직하게는 메특시기이거나 에특시기이고 나머지는 α-αο 알킬기이고, 상기 알콕시기 및 알킬기는 직쇄 흑은 분지쇄일 수 있다. 제 2단계 반응의 반웅온도 및 반웅시간은 반응물에 따라 다르지만, 예를 들어, 2CTC 내지 120°C에서 1시간 내지 72시간 뭏안 반웅시킴으로써 치환기 A2를 갖는 화학식 1-1 내지 1-4의 노볼락 경화제가 얻어진다. 상기 제 2단계 반웅에서 사용될 수 있는 백금촉매로는 이로써 한정하는 것은 아니지만, 예를 들어, Pt¾ 또는 H2PtCl6(CMoroplat ini c acid)의 백금촉매가 사용될 수 있다. 백금촉매는 중간생성물 IB의 알케닐 그룹 1 당량에 대하여 lxlO—4 내지 0.05 당량으로 사용하는 것이 반웅효율 측면에서 바람직하다. 제 2단계 반응에서 용매는 필요에 따라 임의로 사용될 수 있다. 예를 들어 , 제 ' 2 반응단계에서 별도의 용매 없이도 반응온도에서 반웅물의 점도가 반응이 진행되기에 적합하면 용매를 사용하지 않을 수 있다. 즉, 반웅물의 흔합 및 교반이 용매 없이 원활하게 진행될 수 있을 정도로 반웅물의 점도가 낮아지면 별도의 용매를 필요로 하지 않으며, 이는 당업자가 용이하게 판단할 수 있다. 용매를 사용할 경우에, 가능한 용매로는 반웅물을 잘 용해할 수 있으며, 반웅에 어떠한 악영향을 미치지 않고 반웅 후에 쉽게 제거될 수 있는 한 어떠한 비양성자성 용매 (aprot i c solvent )가 사용될 수 있다. 이로써 한정하는 것은 아니지만, 예를 들어 , 를루엔 , 아세토니트릴, THF( tetra hydro furan) , ΜΕΚ( methyl ethyl ketone) , DMF(dimethyl formamide) , DMS0(dimethyl sul foxide) , 메틸렌 클로라이드 (MC) 등이 사용될 수 있다. 이들 용매는 단독으로 혹은 2가지 이상이 함께 사용될 수 있다. 용매의 사용양은 특히 한정하는 것은 아니며, 반응물이 충분히 용해되고 반웅에 바람직하지 않은 영향을 미치지 않는 범위에서 적합한 양 및 /또는 농도로 사용될 수 있으며, 이 기술분야의 기술자는 이를 고려하여 적합하게 선택할 수 있다. Z가 IA인 화학식 1-1의 예시적인 상기 제조방법 ( 1)의 반웅스킴은 다음과 같다. In the above formula mA, at least one of R a to R c is a C1-C5 alkoxy group, preferably a C1-C3 alkoxy group, more preferably a mesophilic or ethoxy group and the remainder is an α-αο alkyl group, the alkoxy group And the alkyl group may be straight chain black branched chain. The reaction temperature and reaction time of the second stage reaction vary depending on the reactant, but for example, a novolak curing agent of the formulas 1-1 to 1-4 having a substituent A2 by reacting for 1 hour to 72 hours at 2CTC to 120 ° C. Is obtained. The platinum catalyst that can be used in the second reaction reaction is not limited thereto. For example, a platinum catalyst of Pt¾ or H 2 PtCl 6 (CMoroplat inc c acid) may be used. The platinum catalyst is preferably used in an amount of lxlO— 4 to 0.05 equivalents based on 1 equivalent of the alkenyl group of the intermediate product IB in terms of reaction efficiency. The solvent in the second stage reaction can optionally be used as needed. For example, a separate water banung viscosity at the reaction temperature without a solvent, in the "second reaction step suitable for the reaction proceeds may not use a solvent. That is, if the viscosity of the reaction product is low enough that the mixing and stirring of the reaction product can proceed smoothly without a solvent, a separate solvent is not required, which can be easily determined by those skilled in the art. In the case of using a solvent, as a possible solvent, the reaction product can be dissolved well, and any aprotic solvent can be used as long as it can be easily removed after the reaction without any adverse effect on the reaction. For example, but not limited to, toluene, acetonitrile, tetrahydrofuran (THF), methyl ethyl ketone (Μ), dimethyl formamide (DMF), dimethyl sul foxide (DMSO), methylene chloride (MC), and the like Can be used. These solvents may be used alone or in combination of two or more. The amount of the solvent used is not particularly limited, and may be used in a suitable amount and / or concentration within a range in which the reactants are sufficiently dissolved and do not adversely affect the reaction, and those skilled in the art may select appropriately in consideration of this. have. An exemplary reaction method of the above-described preparation method (1) of Formula 1-1, wherein Z is IA, is as follows.
Figure imgf000048_0001
상기 화학식 1-1 내지 1-4인 노볼락 경화제에서 정의된 바와 같이, 화학식 1 -1 내지 1-4의 다수의 치환기 A중 적어도 하나는 화학식 A2의 구조 (즉, 알콕시실릴기)이며, 나머지는 수소일 수 있다. 화학식 1-1 내지 1-4에서 알콕시실릴기의 수는, 상기 반웅 1의 제 1 단계에서, 알케닐 화합물의 당량 및 반웅은도를 제어하여 알케닐화되는 히드록시기의 수를 조절하므로써 달라질 수 있다. 이는 이 기술분야의 기술자가 상기한 개시사항으로부터 반웅성을 고려하여 적합하게 조절할 수 있다.
Figure imgf000048_0001
As defined in the novolac curing agent of Formulas 1-1 to 1-4, at least one of the plurality of substituents A of Formulas 1-1 to 1-4 is a structure of Formula A2 (ie, an alkoxysilyl group), and the rest May be hydrogen. The number of alkoxysilyl groups in the formula (1-1) to (1-4) is the first of the reaction 1 In the step, the equivalence and reaction of the alkenyl compound can be varied by controlling the number of hydroxy groups to be alkenylated by controlling the degree. This can be appropriately adjusted by those skilled in the art in view of the reaction from the above disclosure.
(2) 화학식 A3의 치환기를 갖는 화학식 1-1 내지 1-4의 알콕시실릴기를 갖는 노볼락 경화제의 제조방법 (방법 2) 본 발명의 또 다른 실시형태에 의하면, 화학식 A3의 치환기를 갖는 화학식 1 -1 내지 Iᅳ 4의 노볼락 경화제의 제조방법이 제공된다. 화학식 A3의 치환기를 갖는 화학식 1-1 내지 1-4의 노볼락 경화제는 출발물질을 알콕시실릴화하는 알콕시실릴화 단계에 의해 제조될 수 있다. 알콕시실릴화 단계에서 상기 출발물질은 화학식 IA— 1 내지 IA-4 중 하나를 알콕시실릴화하므로써 화학식 A3의 치환기를 갖는 화학식 1—1 내지 1-4중 하나의 노볼락 경화제가 얻어진다. 한편, 상기 알콕시실릴화 단계는 임의의 염기 및 임의의 용매 존재 하에서 수행될 수 있다. 알콕시실릴화 단계에서, 상기 출발물질 IA와 하기 화학식 ΠΙΒ의 이소시아네이트 작용기를 가진 알콕시실란은 출발물질 IA의 히드록시 그룹 1당량에 대하여 화학식 ΠΙΒ의 이소시아네이트 작용기를 가진 알콕시실란이 0. 1 당량 내지 5 당량이 되도톡 - 20 °C 내지 120°C에서 1시간 내지 72시간 동안 반웅시킨다. (2) Process for preparing a novolac curing agent having alkoxysilyl groups of formulas 1-1 to 1-4 having a substituent of formula A3 (Method 2) According to another embodiment of the present invention, formula (1) having a substituent of formula (A3) A method for producing a novolac curing agent of -1 to I14 is provided. The novolac curing agents of formulas 1-1 to 1-4 with substituents of formula A3 may be prepared by an alkoxysilylation step that alkoxysilylates the starting material. In the alkoxysilylation step, the starting material is an alkoxysilylation of one of the formulas IA-1 to IA-4 to obtain a novolak curing agent of one of formulas 1-1 to 1-4 having a substituent of formula A3. On the other hand, the alkoxysilylation step may be carried out in the presence of any base and any solvent. In the alkoxysilylation step, the alkoxysilane having the isocyanate functional group of the starting material IA and the following formula ΠΙΒ is 0.1 to 5 equivalents of the alkoxysilane having the isocyanate functional group of the formula ΠΙΒ relative to 1 equivalent of the hydroxy group of the starting material IA. Lee Dodoktok-from 20 ° C to 120 ° C for 1 to 72 hours Please reply.
[화학식 mB] [Formula mB]
0CN-(CH2)ni-SiRiR2R3 상기 화학식 ΙΠΒ에서, 내지 중 적어도 하나는 탄소수 1 내지 5 알콕시기이고, 바람직하게는 탄소수 1 내지 3의 알콕시기, 더욱 바람직하게는 메특시기이거나 에록시기이다. 메록시기는 반응성이 높다는 측면에서 바람직하고, 에톡시가는 시료 안정성 및 우수한 반웅성 측면에서 바람직하다. 그 나머지는 탄소수 1 내지 10. 알킬기이며, 상기 알콕시기 및 알킬기는 직쇄 혹은 분지쇄일 수 있고, m은 3 내지 10의 정수, 바람직하게는 3 내지 6의 정수이다. 상기 알콕시실릴화 단계에서, 출발물질 IA과 이소시아네이트 작용기를 가진 알콕시실란은 출발물질 IA의 히드록시그룹과 알콕시실란이 화학양론에 따라 당량비로 반응하므로, 이를 고려하여 상기 출발물잘 IA의 히드록시 그룹 1 당량에 대하여 알콕시실란이 0. 1 당량 내지 5 당량이 되도록 출발물질 IA과 이소시아네이트 작용기를 가진 알콕시실란을 반웅시킨다. 알콕시실릴화 단계의 반웅온도 및 반웅시간은 반웅물에 따라 다르지만, 예를 들어, — 20°C 내지 120°C에서 1시간 내지 72시간 동안 반웅시키므로써 ᅳ (ΌΝΗ((¾)η-^¾¾¾의 치환기를 갖는 화학식 Iᅳ 1 내지 화학식 1-4 중 하나의 노볼락 경화제가 얻어진다. 상기 알콕시실릴화 단계의 반웅은 필요에 따라 염기 존재 하에 행할 수 있다. 별도의 염기를 사용하는 경우 반웅속도를 보다 빠르게 할 수 있다. 사용가능한 염기의 예로는 이로써 한정하는 것은 아니지만, 예를 들어 K2C03 , Na2C03 , KHCOs , NaHC03, 트리에틸아민, 디이소프로필에틸아민 둥을 들 수 있다. 이들 염기는 단독으로 혹은 2가지 이상이 함께 사용될 수 있다. 염기를 사용하는 경우에, 염기는 출발물질 IA의 히드록시 그룹 1 당량에 대하여 0. 1 당량 내지 5 당량으로 사용하는 것이 반응효율 측면에서 좋다. 알콕시실릴화 단계의 반웅에서 용매는 필요에 따라 임의로 사용될 수 있다. 예를 들어, 알콕시실릴화 단계에서 별도의 용매 없이도 반웅은도에서 반응물의 점도가 반응이 진행되기에 적합하면 용매를 사용하지 않을 수 있다. 즉, 반웅물의 흔합 및 교반이 용매 없이 원활하게 진행될 수 있을 정도로 반응물의 점도가 낮아지면 별도의 용매를 필요로 하지 않으며, 이는 당업자가 용이하게 판단할 수 있다. 용매를 사용할 경우에, 가능한 용매로는 반웅물을 잘 용해할 수 있으며, 반웅에 어떠한 악영향을 미치지 않고 반웅 후에 쉽게 제거될 수 있는 한 어떠한 비양성자성 용매 (aprot i c solvent )가 사용될 수 있다. 이로써 한정하는 것은 아니지만, 예를 들어, 를루엔, 아세토니트릴 , THF( tetra hydro f uran) , MEK( methyl ethyl ketone) , DMF(d imethyl formaniide) , DMS0(dimethyl sul foxide) , 메틸렌클로라이드 (MC) 등이 사용될 수 있다ᅳ 이들 용매는 단독으로 흑은 2가지 이상이 함께 사용될 수 있다. 용매의 사용양은 특히 한정되는 것은 아니며, 반웅물이 충분히 용해되고 반웅에 바람직하지 않은 영향을 미치지 않는 범위에서 적합한 양으로 사용될 수 있으며, 이 기술분야의 기술자는 이를 고려하여 적합하게 선택할 수 있다. 0CN- (CH 2 ) ni- SiRiR 2 R 3 In the above formula (ΙΠΒ), at least one of to is an alkoxy group having 1 to 5 carbon atoms, preferably an alkoxy group having 1 to 3 carbon atoms, more preferably a methoxy group or an hydroxy group to be. The hydroxy group is preferable in view of high reactivity, and the ethoxy value is preferable in view of sample stability and good reaction properties. The remainder is an alkyl group having 1 to 10 carbon atoms, wherein the alkoxy group and the alkyl group may be linear or branched, m is an integer of 3 to 10, preferably an integer of 3 to 6. In the alkoxysilylation step, the alkoxysilane having the starting material IA and the isocyanate functional group reacts with the hydroxy group of the starting material IA and the alkoxysilane in an equivalent ratio according to the stoichiometry, and thus taking into account the hydroxy group 1 of the starting material IA The alkoxysilane having the starting material IA and the isocyanate functional group is reacted such that the equivalent weight of the alkoxysilane is from 0.01 equivalents to 5 equivalents. The reaction temperature and reaction time of the alkoxysilylation step depend on the reaction water, but, for example, by reacting for 1 to 72 hours at 20 ° C. to 120 ° C. (A novolac curing agent of any one of formulas I ′ 1 to 1-4 having substituents of ΌΝΗ ((¾) η − ^ ¾¾¾ is obtained.) The reaction of the alkoxysilylation step may be carried out in the presence of a base if necessary. The use of a separate base may result in a faster reaction reaction, but examples of the base that can be used include, but are not limited to, for example, K 2 CO 3 , Na 2 CO 3 , KHCOs, NaHC0 3 , triethylamine These bases may be used alone or in combination of two or more.In the case of using a base, the base is 0.1 to 1 equivalent of hydroxy group of the starting material IA. The use of equivalents to 5 equivalents is good in terms of reaction efficiency The solvent may be optionally used in the reaction of the alkoxysilylation step, for example, without the need for a separate solvent in the alkoxysilylation step. If the viscosity of the reactants in silver is suitable for the reaction to proceed, the solvent may not be used, i.e. if the viscosity of the reactants is low enough that the mixing and stirring of the reaction product can proceed smoothly without solvent, then no additional solvent is required. In the case of using a solvent, the possible solvent can dissolve the reaction product well, and any aproticity can be easily removed after the reaction without any adverse effect on the reaction. A solvent may be used, including but not limited to, for example, toluene, acetonitrile, tetrahydrofuran (THF), methyl ethyl ketone (MEK), dimethyl formaniide (DMF), DMS0 (dimethyl sul foxide), Methylene chloride (MC) and the like may be used. These solvents may be used alone or in combination of two or more black. The amount of the solvent used is not particularly limited and may be used in a suitable amount within a range in which the reaction product is sufficiently dissolved and does not adversely affect the reaction, and those skilled in the art may appropriately select it.
Z가 IA인 화학식 1-1의 예시적인 반응 2의 반응스킴은 다음과 같다. An exemplary reaction scheme of Reaction 2 of Formula 1-1 wherein Z is IA is as follows.
Figure imgf000052_0001
상기 화학식 1-1 내지 1-4의 노볼락 경화제에서 정의된 바와 같이, 화학식 1 -1 내지 1-4의 다수의 치환기 A 중 적어도 하나는 화학식 A3의 구조 (즉 알콕시실릴기)아고 나머지는 수소일 수 있다. 화학식 1-1 내지 1-4에서 알콕시실릴기의 수는 알콕시실릴화 단계에서, 알콕시실란의 당량 및 반응온도를 제어하여 에폭시화되는 히드록시기의 수를 조절하므로써 달라질 수 있다. 이는 이 기술분먀의 기술자가 상기한 개시사항으로부터 반응성을 고려하여 적합하게 조절할 수 있다.
Figure imgf000052_0001
As defined in the novolac curing agents of Formulas 1-1 to 1-4, at least one of the plurality of substituents A of Formulas 1-1 to 1-4 is a structure of Formula A3 (ie, an alkoxysilyl group) and the rest is hydrogen Can be. The number of alkoxysilyl groups in Chemical Formulas 1-1 to 1-4 refers to the equivalent of alkoxysilane and reaction temperature in the alkoxysilylation step. It can be varied by controlling the number of hydroxy groups to be epoxidized by controlling. This can be appropriately adjusted by those skilled in the art in view of reactivity from the above disclosure.
3. 새로운 노볼락 경화제를 포함하는 조성물 3. Compositions Containing New Novolac Curing Agents
본 발명의 또 다른 실시형태에 의하면 , 에폭시 수지 및 상기 화학식 1-1 내지 1-4 로 구성되는 그룹으로부터 선택되는 적어도 하나의 새로운 노볼락 경화제를 포함하는 조성물이 제공된다.  According to another embodiment of the present invention, there is provided a composition comprising an epoxy resin and at least one new novolac curing agent selected from the group consisting of the above formulas 1-1 to 1-4.
상기 본 발명에서 제공되는 어떠한 조성물은 전자재료용, 예를 들어, 이로써 한정하는 것은 아니지만, 반도체 기판, 예를 들어, IC 기판이나 빌드업 필름, 봉지재료 (패키징 재료) , 프린트 배선기판 등의 전자부품 용도, 접착제ᅳ 도료, 복합 재료 등 각종 용도로 사용될 수 있다. 또한, 상기 본 발명에서 제공되는 어떠한 조성물은 무기재료를 포함하는 경화성 조성물일 수 있다. Any of the compositions provided in the present invention are used for electronic materials, for example, but not limited to, for example, semiconductor substrates such as IC substrates, build-up films, encapsulation materials (packaging materials), printed wiring boards, and the like. It can be used for various uses such as parts, adhesives, paints and composite materials. In addition, any composition provided in the present invention may be a curable composition comprising an inorganic material.
본 발명의 상기한 및 후술하는 어떠한 실시형태에 의한 조성물에는 경화제로 본 발명의 실시형태에 의한 상기 화학식 1—1 내지 1-4로 구성되는 그룹으로부터 선택되는 적어도 하나의 새로운 노볼락 경화제를 포함하는 한, 종래 이 기술분야에 알려져 있는 어떠한 종류 및 /또는 배합의 조성물이 포함되는 것으로 이해되며, 조성물을 구성하는 에폭시 수지, 본 발명의 경화제 및 기존의 경화제, 경화촉진제 (촉매), 무기재료 (충전제) (예를 들어, 무기입자 및 /또는 섬유), 및 기타 첨가제의 종류 및 배합비를 한정하는 것은 아니다. 상기 에폭시 수지는 종래 이 기술분야에 알려져 있는 어떠한 기존의 에폭시 수지가 사용될 수 있으며, 특히 한정하는 것은 아니지만, 예를 들어, 글리시딜에테르계 에폭시 수지, 글리시딜계 에폭시 수지, 글리시딜아민계 에폭시 수지, 글리시딜에스테르계 에폭시 수지로 구성되는 그룹으로부터 선택된 적어도 일종일 수 있다. 나아가, 상기 에폭시 수지는 코어구조로 비스페놀, 비페닐, 나프탈텐, 벤젠, 티오디페놀, 플루오렌 (fhiorene), 안트라센, 이소시아누레이트, 트리페닐메탄, 1,1,2,2-테트라페닐에탄, 테트라페닐메탄, 4,4'-디아미노디페닐 메탄, 아미노페놀 지환족, 지방족, 또는 노볼락 유니트를 갖는 글리시딜에테르계 에폭시 수지, 글리시딜계 에폭시 수지, 글리시딜아민계 에폭시 수지, 글리시딜에스테르계 에폭시 수지로 구성되는 그룹으로부터 선택된 적어도 일종일 수 있다. 예를 들어, 상기 기존의 에폭시 수지는 코어구조로 비스페놀, 비페닐, 나프탈렌, 플루오렌 벤젠, 티오디페놀, 폴루오렌 (fluorene), 안트라센. 이소시아누레이트, 트리페닐메탄, 1,1,2,2-테트라페닐에탄, 테트라페닐메탄. 4,4'ᅳ디아미노디페닐메탄, 아미노페놀, 지환족, 지방족, 또는 노볼락 유니트를 갖는 글리시딜에테르계 에폭시 수지, 글리시딜계 에폭시 수지, 글리시딜아민계 에폭시 수지, 글리시딜에스테르계 에폭시 수지로 구성되는 그룹으로부터 선택된 적어도 일종일 수 있다. 나아가, 상기 기존와 에폭시 수지는 알콕시실릴기를 갖거나 갖지 않는 것일 수 있다. 본 발명의 상기한 및 후술하는 어떠한 실시형태에 의한 조성물에는, 경화제로는 본 발명의 '알콕시실릴화된 노볼락 경화제가 포함되며, 본 발명의 알콕시실릴화된 노볼락 경화제 '이외에, 추가로 에폭시 수지에 대한 경화제로 일반적으로 알려져 있는 어떠한 기존의 경화제가 첨가될 수 있으며, 기존의 경화제로는, 이로써 특히 한정하는 것은 아니지만, 예를 들어, 노볼락 경화제 (알콕사실릴기를 갖지 않는 종래의 노볼락 경화제), 아민, 산무수물 등이 사용될 수 있다. 보다 구체적으로 . 이로써 한정하는 것은 아니지만, 아민 경화제로는 지방족 아민, 지환족 아민 , 방향족 아민, 기타 아민 및 변성 폴리아민을 사용할 수 있으며, 2개 이상의 일차 아민기를 포함하는 아민 화합물을 사용할 수 있다. 상기 아민 경화제의 구체적인 예로는 4,4'ᅳ디메틸아닐린 (디아미노 디페닐 메탄) (4>4'-Dimethylani 1 ine(di amino di phenyl methane, DAM 또는 DDM) , 디아미노 디페닐설폰 (diamino di phenyl sul fone , DDS) , m_폐닐렌 디 < 민 (m-phenyl ene diamine)으로 구성되는 그룹으로부터 선택된 1종 이상의 방향족 아민 , 디에틸렌트리아민 (dieihylene tri amine, DETA) , 디에틸렌테트라아민 (diethylene tetramine) , 트리에틸렌테트라아민 ( tr iethy lene tetramine, TETA) , m-크실렌 디아민 (iᅳ xylene diamine. MXDA), 메탄 디아민 (methane diamine, MDA) , Ν,Ν'- 디에틸렌디아민 (N, N ' -d i et hy 1 ened i amine, Ν,Ν' -DEDA), 테트라에틸렌펜타아민 (tetraethyl enepent aami ne , TEPA ),및 핵사메틸렌디아민 ( hexamethy 1 ened i am i ne ) 으로 구성되는 그룹으로부터 선택된 적어도 1종 이상의 지방족 아민, 이소포론 디아민 (isophorone diamine, IPDI), N-아미노에틸 피레라진 (N-Aminoethyl piperazine, AEP), 비스 (4ᅳ아미노 3-메틸시클로핵실)메탄 (Bis(4-Aniino 3ᅳ Methyl eye 1 ohexy 1 )Methane , Larominc 260)으로 구성되는 그룹으로부터 선택된 1종 이상의 지환족아민, 디시안디아미드 (DICY) 등과 같은 기타 아민, 폴리아미드계, 에폭사이드계 등의 변성 아민을들 수 있다. 이로써 한정하는 것은 아니지만, 페놀 경화제의 예로는 페놀노볼락 수지, 크레졸 노볼락 수지, 비스페놀 A 노볼락 수지, 자일렌 노볼락 수지, 트리 페닐 노볼락 수지, 비페닐 노볼락 수지 디시클로펜타디엔 노볼락 수지, 페놀 P- 자일렌 수지, 페놀 4, 4'-디메틸비페닐렌 수지, 나프탈렌 페놀 노볼락 수지 등을 들 수 있다. 이로써 한정하는 것은 아니지만, 산무수물계 경화제의 예로는 도데세닐 숙신산무수물 (dodecenyl succinic anhydride, DDSA) , 폴리 아젤라익 폴리 안하이드리드 (poly azelaic poly anhydride), 등과 같은 지방족 산무수물, 핵사하이드로프탈릭 안하이드리드 (hexahydroph halic anhydride, HHPA) , 메틸 테트라하이드로프탈릭 안하이드리드 (methyl tetrahydrophthal ic anhydride, MeTHPA) , 메틸나딕 안하이드리드 (niethylnadic anhydride, MNA)등과 같은 지환족 산무수물, 트리멜리트 안하이드리드 (Trimellitic Anhydride, TMA), 피로멜리트산 디안하이드리드 (pyromellitic acid di anhydr ide, PMDA) , 벤조페논테트라카르복시 산 디안하이드리드' (benzophenonetetracarboxyl ic d i anhydr i de , BTDA) 등과 같은 방향족 산무수물, 테트라브로모프탈릭 안하이드리드 (tetrabroniophthalic anhydride. TBPA), 클로렌먹 안하이드리드 (chlorendic anhydride) 둥과 같은 할로겐계 산무수화합물 등을 들 수 있다. 일반적으로 경화제와 에폭시 수지의 반응 정도로 에폭시 복합체의 경화도를 조절할 수 있으며ᅳ 목적하는 경화도 범위에 따라 에폭시 수지의 에폭시기의 농도를 기준으로 하여 경화제의 함량을 조절할 수 있다. 예를 들어, 본발명의 경화제가 단독으로 사용되거나, 기존의 경화제와 흔합하여 사용되는 경우, 경화제와 에폭시 그룹의 당량 반웅에서는 에폭시 당량 /경화제 당량비가 0.5 내지 2.0이 되도록, 또한, 예를 들어, 0.8 내지 1.5이 되도록 경화제와 함량을 조절하여 사용하는 것이 바람직하다. 본 명세서에 별도로 기재하지 않은 에폭시 수지의 경화에 사용될 수 있는 어떠한 경화제 또한 원하는 경화도 범위에 따라 상기 본 발명의 조성물 중 총 에폭시기의 농도를 기준으로 하여 에폭시 작용기와 경화제의 반웅성 작용기의 화학양론적 양으로 적합하게 배합하여 사용할 수 있으며, 이는 이 기술분야에서 일반적이다. The composition according to any of the above and later embodiments of the present invention comprises as a curing agent at least one new novolac curing agent selected from the group consisting of Formulas 1—1 to 1-4 according to embodiments of the present invention. As such, it is understood that any kind and / or combination of compositions known in the art are included, and the epoxy resin constituting the composition, the curing agent of the present invention and conventional curing agents, curing accelerators (catalysts), inorganic materials (fillers) (Eg inorganic particles and / or Fiber) and other additives, and the mixing ratio is not limited. The epoxy resin may be any conventional epoxy resin known in the art, but is not particularly limited, for example, glycidyl ether-based epoxy resin, glycidyl-based epoxy resin, glycidylamine-based It may be at least one selected from the group consisting of an epoxy resin and a glycidyl ester epoxy resin. Further, the epoxy resin has a core structure of bisphenol, biphenyl, naphthalene, benzene, thiodiphenol, fluorene (fhiorene), anthracene, isocyanurate, triphenylmethane, 1,1,2,2-tetraphenyl Ethane, tetraphenylmethane, 4,4'-diaminodiphenyl methane, aminophenol alicyclic, aliphatic, or glycidyl ether epoxy resin having a novolak unit, glycidyl epoxy resin, glycidylamine epoxy At least one selected from the group consisting of a resin and a glycidyl ester epoxy resin. For example, the conventional epoxy resin is bisphenol, biphenyl, naphthalene, fluorene benzene, thiodiphenol, fluorene, anthracene as a core structure. Isocyanurate, triphenylmethane, 1,1,2,2-tetraphenylethane, tetraphenylmethane. 4,4 'ᅳ diaminodiphenylmethane, aminophenol, cycloaliphatic, aliphatic, or glycidyl ether epoxy resin having a novolak unit, glycidyl epoxy resin, glycidylamine epoxy resin, glycidyl It may be at least one selected from the group consisting of an ester epoxy resin. Furthermore, the existing and epoxy resins may or may not have an alkoxysilyl group. In the composition according to the above described and in some embodiments to be described later of the present invention, a curing agent as is "and includes the alkoxy silylated a novolac hardener, alkoxy silylated a novolac curing agents of the invention" of the present invention in addition to, the epoxy additionally Any conventional curing agent, generally known as a curing agent for resins, may be added, and as the existing curing agent, there is no particular limitation, for example, a novolac curing agent (a conventional novolak having no alkoxylsilyl group). Curing agents), amines, acid anhydrides and the like can be used. More specifically. Although not limited to this, as the amine curing agent, aliphatic amines, alicyclic amines, aromatic amines, other amines and modified polyamines can be used, and amine compounds containing two or more primary amine groups can be used. Specific examples of the amine curing agent include 4,4 'ᅳ dimethylaniline (diamino diphenyl methane) (4 > 4'-Dimethylani 1 ine (di amino diphenyl methane, DAM or DDM), diamino diphenylsulfone (diamino di phenyl sul fone, DDS), m_ lung alkenylene di <min (m -phenyl ene diamine) aromatic amine, at least one selected from the group consisting of diethylene triamine (dieihylene tri amine, DETA), diethylene tetraamine ( diethylene tetramine, tri iethy lene tetramine (TETA), m-xylene diamine (MXDA), methane diamine (MDA), Ν, Ν'- Diethylenediamine (N, N '-di et hy 1 ened i amine, Ν, Ν' -DEDA), tetraethylene pentaamine (TEPA), and hexamethy 1 ened i am i ne At least one aliphatic amine selected from the group consisting of: isophorone diamine (IPDI), N-aminoethyl pyrazine (AEP), bis (4 ᅳ amino 3-methylcyclonucleus) Other amines, polyamides, epoxides, such as one or more cycloaliphatic amines, dicyandiamides (DICY), etc. selected from the group consisting of methane (Bis (4-Aniino 3 ᅳ Methyl eye 1 ohexy 1) Methane, Larominc 260) Modified amines, such as a system, are mentioned. Examples of the phenol curing agent include, but are not limited to, phenol novolac resins, cresol novolac resins, bisphenol A novolac resins, xylene novolac resins, triphenyl novolac resins, biphenyl novolac resins and dicyclopentadiene novolacs. Resins, phenol P-xylene resins, phenol 4, 4'-dimethylbiphenylene resins, naphthalene phenol novolac resins and the like. Examples of acid anhydride-based curing agents include, but are not limited to, dodecenyl succinic anhydride (DDSA), aliphatic acid anhydrides such as poly azelaic poly anhydride, and nucleohydrophthalic anhydrides. Alicyclics such as hydrhydroph halic anhydride (HHPA), methyl tetrahydrophthalic anhydride (MeTHPA) and methylnadic anhydride (MNA) Anhydride, trimellitic not hydride (Trimellitic Anhydride, TMA), pyromellitic dianhydride hydride (pyromellitic acid di anhydr ide, PMDA), benzophenone tetracarboxylic carboxy acid dianhydride hydride '(benzophenonetetracarboxyl ic di anhydr i de, BTDA Aromatic acid anhydrides, such as a), tetrabromophthalic anhydride (TBPA), and halogen-based acid anhydride compounds such as chlorendic anhydride. In general, the degree of curing of the epoxy composite can be adjusted to the degree of reaction between the curing agent and the epoxy resin, and the content of the curing agent can be adjusted based on the concentration of the epoxy group of the epoxy resin according to the desired degree of curing. For example, when the curing agent of the present invention is used alone or in combination with an existing curing agent, the equivalent reaction of the curing agent and the epoxy group is such that the epoxy equivalent / curing agent equivalent ratio is 0.5 to 2.0, and, for example, It is preferable to adjust and use a hardening | curing agent so that it may become 0.8-1.5. Any curing agent that can be used to cure the epoxy resins not otherwise described herein also depends on the concentration of the total epoxy groups in the composition of the present invention depending on the desired degree of cure and based on the concentration of the epoxy functional groups and the semi-aromatic functional groups of the curing agent. Suitable amounts can be used in combination, as is common in the art.
나아가, 본 발명의 일 실시형태에 았어서, 본 발명의 상기한 및 후술하는 어떠한 실시형태에 의한 새로운 노볼락 경화제를 포함하는 조성물은 무기재료 (충전제) , 예를 들어, 무기입자 및 /또는 섬유를 필요에 따라 추가로 포함할 수 있으며, 무기재료를 포함하는 조성물을 편의상 "복합 조성물' '이라 한다. 상기 복합 조성물은 에폭시 수지, 상기 화학식 1-1 내지 1-4 로 구성되는 그룹으로부터 선택되는 적어도 하나의 새로운 노불락 경화제 및 충전제를 포함하는 한, -종래 이 기술분야에 알려져 있는 어떠한 종류 및 /또는 배합의 조성물이 포함되는 것으로 이해되며, 조성물을 구성하는 에폭시 수지, 본 발명의 경화제, 기존의 경화제, 경화촉진제 (촉매), 무기.재료 (충전제) (예를 들어, 무기입자 및 /또는 섬유), 및 기타 첨가제의 종류 및 배합비를 한정하는 것은 아니다. 무기입자로는 종래 열경화성 수지의 물성을 보강하기 위해 사용되는 것으로 알려져 있는 어떠한 무기입자가 사용될 수 있으며, 이로써 한정하는 것은 아니지만, 실리카 (예를 들어, 용융 실리카 및 결정성 실리카 포함), 지르코니아, 티타니아, 알루미나, 질화규소 및 질화알루미늄으로 구성되는 그룹으로부터 선택되는 적어도 일종의 금속산화물, 및 실세스퀴옥산으로 구성되는 그룹으로부터 선택되는 적어도 일종이 사용될 수 있다. 상기 무기입자는 단독으로 또는 2종 이상와 흔합물로 사용될 수 있다. 실리카를 특히 다량 배합하는 경우에는, 용융 실리카를 이용하는 것이 바람직하다. 용융 실리카는 파쇄상이나 구상의 어느 쪽도 사용 가능하지만, 용융 실리카의 배합량을 높이고, 또한 성형 재료의 용융 점도의 상승을 억제하기 위해서는, 구상의 것을 이용하는 것이 바람작하다. 상기 무기입자로는 이로써 한정하는 것은 아니지만, 복합체의 사용용도, 구체적으로는 무기입자의 분산성 등을 고려하여, 입자크기가 0.5nm 내지 수십 (예를 들어, 50 내지 100 )인 무기입자가 사용될 수 있다. 무기입자는 에폭시 수지에 분산되므로 입자크기에 따른 분산성의 차이로 인하여 상기한 크기의 무기입자가 함께 사용되는 것이 바람직하다. 뿐만 아니라, 무기입자의 배합량을 높이기 위해서는, 무기입자의 입자 분포가 보다 넓게 하여 배합하는 것이 바람직하다. - 본 발명의 일 실시형태에 의한 새로운 노볼락 경화제 및 에폭시 수지를 포함하는 조성물에서 상기 에폭시 수지에 대하여 무기입자는 에폭시 복합체의 CTE 감소 및 적용 시 요구되는 적정한 점도 및 용도에 따라 적합하게 첨가할 수 있는데, 무기입자의 함량은 조성물의 고형분의 총 중량을 기준으로, 한편 에폭시 경화물의 경우에는 에폭시 경화물의 총 증량을 기준으로 5 wt% 내지 95wt¾ , 예를 들어, 5wt% 내지 90wt% , 예를 들어 10wt% 내지 90wt¾> , 예를 들어, 30 wt% 내지 95wt , 예를 들어, 30wt% 내지 90wt% , 예를 들어, 5 wt% 내지 60wt% , 예를 들어, 10wt 내지 50 %일 수 있다. 보다 구체적으로, 일 예로서, 본 발명의 조성물이 반도체 봉지재 등으로 사용되는 경우에는, 이로써 한정하는 것은 아니지만, CTE 값과 재료 가공성을 고려하여 무기입자의 함량은 예를 들어, 상기 조성물의 고형분의 총 증량에 대하여, 한편 에폭시 경화물의 경우에는 에폭시 경화물의 총 중량을 기준으로 30 wt% 내지 95wt% , 예를 들어, 30wt% 내지 90 %일 수 있다. 또한 일 예로서, 상기 조성물이 반도체 기판 등으로 사용되는 경우에는, 기판의 CTE 값과 강도 등을 고려하여 무기입자의 함량은 예를 들어, 상기 조성물의 총 고형분의 중량에 대하여, 한편 에폭시 경화물의 경우에는 에폭시 경화물의 총 중량을 기준으로 5 wt 내지 60wt% , 예를 들어, 10wt% 내지 50 %일 수 있다. 한편, 섬유가 무기재료로 사용되는 경우에는, 이 기술분야에서 일반적으로 사용되는 어떠한 종류 및 치수의 섬유가사용될 수 있다. 섬유로는 이로써 한정하는 것은 아니지만, 종래 열경화 수지 .경화물의 물성 개선을 위해 사용되는 일반적인 어떠한 섬유가 사용될 수 있다. 구체적으로는 유리 섬유, 유기 섬유 또는 미들의 흔합물이 사용될 수 있다. 또한, 본 명세서에서 사용된 용어 '유리 섬유'는 유리 섬유뿐만 아니라, 유리 섬유직물, 유리 섬유 부직물 등을 포함하는 의미로 사용된다. 이로써 한정하는 것은 아니지만, 유리 섬유로는 E 유리섬유, T 유리섬유, S 유리섬유, NE 유리섬유, D 유리섬유, 석영 유리섬유 등의 유리 섬유를 예로 들 수 있.으며, 예를 들어, E 또는 T 유리 섬유를 예로 들 수 있다. 유기 섬유로는 이로써 특별히 한정하는 것은 아니지만, 액정 폴리에스테르 섬유, 폴리에틸렌 테레프탈레이트 섬유, 전방향족 섬유, 폴리벤조옥사졸 섬유, 나일론 심유, 폴리에틸렌 나프탈레이트 섬유, 폴리프로필렌 섬유, 폴리에테르 술폰 섬유, 폴리비닐리덴플로라이드 섬유, 폴리에틸렌 술파이드 섬유, 폴뫼에테르에테르케톤 섬유로 구성되는 그룹으로부터 선택된 적어도 일종이 단독으로 흑은 이종 이상이 함께 사용될 수 있다. Furthermore, according to one embodiment of the present invention, the above and later described of the present invention The composition comprising the new novolac curing agent according to any embodiment may further comprise an inorganic material (filler), for example inorganic particles and / or fibers, as needed, and for convenience the composition comprising the inorganic material " Composite compositions', as long as the composite composition comprises an epoxy resin, at least one new novolac curing agent and filler selected from the group consisting of Formulas 1-1 to 1-4. known any type and / or the combination is understood to include a composition, the epoxy resin constituting the composition, the curing agent of the present invention, a conventional curing agent, a curing accelerator (catalyst) which, weapon material (filler) (e.g., Inorganic particles and / or fibers) and other additives are not limited to the type and compounding ratio. Any inorganic particles known to be used for reinforcement may be used, including but not limited to, consisting of silica (including, for example, fused silica and crystalline silica), zirconia, titania, alumina, silicon nitride and aluminum nitride At least one kind selected from the group consisting of at least one metal oxide selected from the group and silsesquioxane may be used, and the inorganic particles may be used alone or as a mixture with two or more kinds. In this case, it is preferable to use fused silica, although either crushed or spherical can be used. In order to raise the compounding quantity of a silica and to suppress the raise of the melt viscosity of a molding material, it is preferable to use a spherical thing. The inorganic particles are not limited thereto, but inorganic particles having a particle size of 0.5 nm to several tens (for example, 50 to 100) may be used in consideration of the use of the composite, specifically, the dispersibility of the inorganic particles. Can be. Since the inorganic particles are dispersed in the epoxy resin, the inorganic particles of the above sizes are preferably used together due to the difference in dispersibility according to the particle size. In addition, in order to raise the compounding quantity of an inorganic particle, it is preferable to mix | blend and make the particle | grain distribution of inorganic particle wider. In the composition comprising a new novolac curing agent and an epoxy resin according to an embodiment of the present invention, the inorganic particles may be suitably added to the epoxy resin according to the appropriate viscosity and use required for reducing and applying CTE of the epoxy composite. The content of the inorganic particles is based on the total weight of solids of the composition, while in the case of epoxy cured products, based on the total weight of the epoxy cured product, 5 wt% to 95 wt ¾, for example 5 wt% to 90 wt%, for example 10 wt% to 90wt¾>, for example 30 wt% to 95wt, for example 30wt% to 90wt%, for example 5 wt% to 60wt%, for example 10wt to 50%. More specifically, as an example, the composition of the present invention is a semiconductor encapsulant When used, this is not limitative, but considering the CTE value and the material processability, the content of the inorganic particles is, for example, relative to the total increase in the solid content of the composition, while in the case of epoxy cured products the total weight of the epoxy cured product. 30 wt% to 95 wt%, for example, 30 wt% to 90%. In addition, as an example, when the composition is used as a semiconductor substrate, the content of the inorganic particles in consideration of the CTE value and strength of the substrate, for example, relative to the weight of the total solids of the composition, on the other hand In the case of 5 wt% to 60 wt%, for example 10 wt% to 50%, based on the total weight of the epoxy cured product. On the other hand, when the fiber is used as an inorganic material, any kind and dimension of fiber generally used in the art may be used. The fiber is not limited thereto, and any fiber generally used for improving physical properties of the thermosetting resin and cured material may be used. Specifically glass fiber, organic fiber or a mixture of middles can be used. In addition, the term 'glass fiber' as used herein is used to mean not only glass fiber, but also glass fiber fabric, glass fiber nonwoven fabric, and the like. Although not limited to this, glass fibers include glass fibers such as E glass fiber, T glass fiber, S glass fiber, NE glass fiber, D glass fiber, quartz glass fiber, and the like. Or T glass fibers. Although it does not specifically limit as an organic fiber by this, Liquid crystalline polyester fiber, polyethylene terephthalate fiber, Selected from the group consisting of wholly aromatic fibers, polybenzoxazole fibers, nylon heart oil, polyethylene naphthalate fibers, polypropylene fibers, polyether sulfone fibers, polyvinylidene fluoride fibers, polyethylene sulfide fibers, polymoetheretherketone fibers At least one kind alone or more than two kinds of black may be used together.
본 발명에 의한 어떠한 새로운 노볼락 경'화제를 포함하는 조성물, 예를 들어 , 유리섬유 복합체 조성물에서 섬유의 함량은 상기 조성물의 고형분의 총 중량을 기준으로 10wt¾> 내지 90wt% , 예를 들어, 30wt% 내지 70wt% , 또한 예를 들어, 35wt% 내지 65 %일 수 있다. 또한, 상기 조성물의 경화물, 예를 들어, 유리섬유 복합체에서, 섬유의 함량은 경화물의 총 중량을 기준으로 10wt% 내지 90wt% , 예를 들어, 30wt% 내지 70wt% , 또한 예를 들어 , 35wt% 내지 65 %일 수 있다. 따라서 , 레진 함량은 lpwt% 내지 90wt% , 예를 들어 . 30wt% 내지 70wt% . 또한 예를 들어, 35wt% 내지 65wt%일 수 있다. 섬유의 함량이 상기 범위인 것이 내열성 향상 및 가공성 측면에서 바람직하다. 한편, 섬유를 포함하는 조성물, 경화물 등에서, 통상, 총 고형분 중 섬유를 제외한 고형분 부분은 레진 성분으로 칭하여지며, 섬유를 포함하는 조성물에서, 섬유 이외의 양은 레진 함량 (res in content )이다. Composition comprising any new novolak light "agent of the present invention, for example, the content of fibers in the glass fiber composite composition 10wt¾> to about 90wt% based on the total weight of the composition solids, for example, 30wt % To 70 wt%, and for example, 35 wt% to 65%. Further, in the cured product of the composition, for example, glass fiber composites, the fiber content is 10 wt% to 90 wt%, for example 30 wt% to 70 wt%, and for example 35 wt%, based on the total weight of the cured product. % To 65%. Thus, the resin content is lp w t% to 90 wt%, for example. 30 wt% to 70 wt%. Also, for example, it may be 35wt% to 65wt%. It is preferable that the content of the fiber is in the above range in terms of heat resistance improvement and processability. On the other hand, in the composition containing a fiber, hardened | cured material, etc., the solid part except a fiber among the total solid content is normally called resin component, and in the composition containing a fiber, the quantity other than fiber is resin content (res in content).
나아가, 상기 섬유를 포함하는 어떠한 본 발명의 조성물에는 또한, 필요에 따라, 무기입자가 추가로 포함될 수 있다. 이때 무기입자는 물성 향상 및 공정성을 고려하여, 레진 함량의 증량을 기준으로 lwt¾» 내지 70wt% 범위와 양으로 배합될 수 았다. 이때, 사용될 수 있는 무기입자의 종류는 특히 한정되지 않으며, 이 기술분야에 알려져 있는 어떠한 무기입자가 사용될 수 있으며, 예를 들어, 상기한 무기입자의 종류가사용될 수 있다. Furthermore, any of the compositions of the present invention comprising the fibers may further comprise inorganic particles, if necessary. At this time, the inorganic particles are in the range of lwt¾ »to 70wt% based on the increase of the resin content in consideration of the improvement of physical properties and fairness. It can be formulated in amounts. At this time, the type of inorganic particles that can be used is not particularly limited, any inorganic particles known in the art can be used, for example, the type of the inorganic particles can be used.
본 발명의 또 다른 실시형태에 의하면, 본 발명의 상기한 및 후술하는 어떠한 실시형태에 의한 조성물은 알콕시실릴기 반응 촉매 (이하, "반웅 촉매"라 함)를 필요에 따라 추가로 포함할 수 있으며, 알콕시실릴기 반웅 촉매를 포함하는 조성물을 편의상 "반응 촉매 함유 조성물 "이라 한다. 상기 반웅 촉매 함유 조성물은 또한, 상기 화학식 1-1 내지 1—4로 구성되는 그룹으로부터 선택되는 적어도 하나의 새로운 노볼락 경화제 및 상기 반응 촉매를 포함하며, 조성물을 구성하는 에폭시 수지, 본발명의 경화제, 기존의 경화제, 경화촉진제 (촉매), 무기재료 (충전제) (예를 들어, 무기입자 및 /또는 섬유) , 및 기타 첨가제의 종류 및 배합비를 한정하는 것은 아니다. 상기 알콕시실릴기 반응촉매는 보다 향상된 공정성 (예를 들어 . 빠른 경화속도 및 /또는 낮은 경화온도)을 위하여 첨가될 수 있다. According to another embodiment of the present invention, the composition according to any of the above and below embodiments of the present invention may further comprise an alkoxysilyl group reaction catalyst (hereinafter referred to as "banung catalyst") as needed. The composition containing the alkoxysilyl group reaction catalyst is called "reaction catalyst containing composition" for convenience. The reaction catalyst-containing composition also includes at least one new novolac curing agent selected from the group consisting of Formulas 1-1 to 1-4, and the reaction catalyst, and an epoxy resin constituting the composition, the curing agent of the present invention. It does not limit the kind and compounding ratio of the existing hardening | curing agent, a hardening accelerator (catalyst), an inorganic material (filler) (for example, inorganic particle and / or fiber), and other additives. The alkoxysilyl group reaction catalyst may be added for improved processability (eg, fast curing rate and / or low curing temperature).
본 발명의 어떠한 실시형태에 의한 조성물에 알콕시실릴기 반웅촉매가 포함되는 경우에, 알콕시실릴기 반웅촉매로는 이로써 한정하는 것은 아니지만, 예를 들어, 질산, 황산, 염산, 아세트산 및 인산으로 구성되는 그룹으로부터 선택되는 적어도 일종의 무기산, 암모니아ᅳ OH , NH40H , 아민 및 전이 금속 알콕사이드, 금속산화물, 금속 유기산염 및 할라이드 (예를 들어. 디부틸틴 디라우레이트 (di butyl t in di l aurate) , 옥틸산의 주석염, 주석 ( I I ) 2- 에틸핵사노에이트) 등의 '주석 ( n) 화합물)로 구성되는 그룹으로부터 선택되는 적어도 일종이 사용될 수 있다. 이들은 단독으로 혹은 2종 이상이 함께 사용될 수 있다ᅳ 상기 알콕시실릴기 반응촉매의 배합량은 특별히 한정하지 않으나, 반웅성을 고려하여, 본 발명의 에폭시 수지에 대하여 알콕시실릴기 반웅촉매는 0.01 phr 내지 10 phr로 사용될 수 있다. 상기 알콕시실릴기 반웅촉매의 효율을 좋게 하기 위해, 알콕시실릴기 반웅 촉매를 포함하는 조성물에, 물이 추가로 포함될 수 있다. 이때 물의 배합량은 특별히 한정하지 않으나, 촉매로서의 효율 및 반웅성을 고려하여, 알콕시실릴기 1당량에 대하여 물 0.01 당량 내지 20 당량일 수 있다. 상기한 본 발명에서 제공되는 어떠한 새로운 노볼락 경화제를 포함하는 조성물에서. 경화반응을 촉진하도록 임의의 경화촉진제 (경화촉매)가 필요에 따라 추가로 포함될 수 있다. 또한, 노볼락 경화제의 경우에는 에폭시 수지와의 반응성 향상을 위해. 통상 경화촉진제가 사용되며, 이러한 이 기술분야의 통상의 기술 상식에 비추어, 상기한 상기한 및 후술하는 어떠한 상기 조성물이 경화반웅 정도에 따라 경화촉진제를 포함할 수 있음은 이 기술분야의 기술자에게 자명하다. 경화촉진제 (경화촉매)로는 이 기술분야에서 조성물의 경화에 일반적으로 사용되는 것으로 알려져 있는 어떠한 촉매가 사용될 수 있으며, 이로써 한정하는 것은 아니지만, 예를 들어, 이미다졸, 제 3급 아민, 제 4급 암모늄, 유기산염, 루이스산, 인 화합물 등의 경화촉진제가사용될 수 있다. 보다 구체적으로, 예를 들어, 2-메틸이미다졸 (2MZ), 2-운데실이미다졸, 2-에틸 4ᅳ메틸이미다졸 (2E4M) , 2-페닐이미다졸, 1ᅳ (2-시아노에틸) -2-알킬기 이미다졸, 2-헵타데실이미다졸 (heptadecylimidazole, 2HDI) 등의 이미다졸계; 벤질디메틸아민 (benzyl dimethyl amine, BDMA) , 트리스디메틸아미노메틸페놀 (DMP-30) , 디아자시클로운데센 (diazacycloundecene, DBU), 트리에틸렌디아민 등의 3급 아민 화합물; 테트라부틸암모늄브로마이드 등의 4급 암모늄염; 디아자비시클로운데센 (DBU)이나 DBU의 유기산염 ; 트리페닐포스핀, 인산에스테르 등의 인계 화합물, BF3-모노에틸 아민 (BFVMEA) 등과 같은 루이스산 등을 들 수 있으며, 이로써 한정하는 것은 아니다. 이들 경화촉진제는 이들의 마이크로 캡슐코팅 및 착염 형성 등으로 잠재화된 것을 사용할 수도 있다. 이들은 경화 조건에 따라 단독으로 사용할 수도 있고, 2종 이상을 병용할 수도 있다. 상기 경화 촉진제의 배합량은, 특히 한정하는 것은 아니며, 이 기술분야에서 일반적으로 사용되는 양으로 배합하여 사용할 수 있다. 예를 들어, 상기 에폭시 수지에 대하여 0.1 내지 ·10 phr( parts per hundred resin, 에폭시 수지 100중량부당의 중량부), 예를 들어, 0.2 내지 5 phr일 수 있다. 경화 촉진제는 경화반웅 촉진 효과 및 경화 반웅 속도 제어 측면에서 상기 함량으로 사용되는 것이 바람직하다. 상기 경화 촉진제를 상기 범위의 배합량으로 사용함으로써 빠르게 경화가 진행되며 작업처리량의 향상을 기대할 수 있다. 상기 조성물은 조성물의 물성을 손상시키지 않는 범위에서, 조성물의 물성조절을 위해 통상적으로 배합되는 이형제, 표면 처리제, 난연제. 가소제, 항균제, 레벨링제, . 소포제, 착색제, 안정제, 커플링제, 점도조절제, 희석제, 고무, 열가소성 수지 등의 기타 첨가제가 또한 필요에 따라 배합될 수 있다. 예를 들어, 본 발명에 의한 어떠한 조성물을 박막으로 조성하는 경우에, 유연성이 불충분한 조성물은 브리를 (br i t t le)하여 균열이 발생될 수 있다. 이는 예를 들어, 본 발명의 어떠한 조성물이 무기 입자를 다량 함유하는 경우에 그러하다. 따라서, 조성물에 가용성을 개선하기 위해, 본 발명의 어떠한 새로운 노볼락 경화제를 포함하는 조성물에 고무 및 /또는 열가소성 수지가 .첨가될 수 있다. 열가소성 수지 및 고무-개질된 에폭시 수지는 이 기술분야에 일반적으로 알려져 있는 것이 사용될 수 있다. 고무로는 조성물에 사용되는 용매에 용해되지 않고 조성물에 분산된 상태를 유지하는 한 이 기술분야에 알려져 있는 어떠한 고무 가 사용될 수 있다. 이로써 제한하는 것은 아니지만, 고무의 종류로는 예를 들어 , 아크릴로니트릴 부타디엔 고무. 부타티엔 고무, 아크릴 고무, 코어쉘형 고무 입자, 가교 아크릴로니트릴 부타디엔 고무 입자, 가교 스티렌 부타디엔 고무 입자, 아크릴 고무 압자 등을 들 수 있다. 이들은 단독으로 또는 2종 이상이 함께 사용될 수 있다. 고무 입자 형태를 사용하는 경우, 물성개선 측면에서 평균 입자 직경은 으 005 내지 1/im의 범위가 바람직하고, 0.2 내지 0.6 의 범위가 보다 바람직하다. 고무 입자는, 상기 본. 발명의 조성물의 고형분의 중량을 기준으로, 물성을 고려하여, 예를 들어, 0. 5 내지 10 중량 %로 배합될 수 있다. 열가소성 수지로는 이로써 제한하는 것은 아니지만, 페녹시 수지, 폴리비닐아세탈 수지. 폴리이미드 수지, 폴리아미드이미드 수지, 폴리에테르 술욘 수지, 폴리술폰 수지 등을 들 수 있다. 이들은 단독으로 또는 2종 이상이 함께 사용될 수 있다. 열가소성 수지는 상기 본 발명의 조성물의 고형분의 중량을 기준으로, 물성을 고려하여, 예를 들어, 0.5 내지 60 중량 % , 바람직하게는 3 내지 50 중량 %로 배합될 수 있다. 상기한 바와 같이. 본 명세서에서 사용된 용어 "조성물, 본 발명의 조성물 또는 새로운 노볼락 경화제를 포함하는 조성물 "은 에폭시 수지와 본 발명의 노볼락 경화제뿐만 아니라 필요에 따라 조성물을 구성하는 다른 구성성분, 예를 들어, 기존의 경화제, 임의의 경화촉진제 (촉매), 무기재료 (충천제), 예를 들어, 무기입자 및 /또는 섬유, 및 용매 이외의 이 기술분야에서 필요에 따라 배합되는 기타 첨가제를 포함할 수 있는 것으로 이해되며, 따라서 통상, 상기 조성물에서 용매는 조성물의 공정성 등을 고려하여 상기 조성물의 고형분 함량 및 /또는 점도를 적합하게 조절하도록 임의로 사용될 수 있다. 한편, 본 발명에서 사용된 용어 "조성물의 고형분의 총 중량"이란 상술한 조성물을 구성하는 성분 중 용매를 제외한 성분의 총 중량을 말한다. 상기 본 발명의 어떠한 실시형태에서 제공되는 어떠한 본 발명의 조성물은 전자재료용으로 사용될 수 있다. 전자 재료는 이로써 한정하는 것은 아니지만, 예를 들어, 반도체용 기판빌드 업 필름, 프리프레그, 또는 본 발명의 조성물로된 기재에 금속필름이 배치된 적층판, 봉지재료 (패키징 재료)뿐만 아니라, 인쇄 배선기판 등의 전자부품이다. 또한, 접착제, 도료 및 복합재료 등 각종 용도에 적용될 수 있다. 본 발명의 또 다른 실시형태에 의하면, 본 발명의 노볼락 경화제를 포함하는 어떠한 조성물을 포함하는 또는 이로 이루어진 전자재료가 제공된다. 나아가, 상기 전자재료를 포함하거나, 이로 필수적으로 구성되거나 또는 구성되는 반도체 장치가 또한 제공된다. 구체적으로 상기 반도체 장치는 본 발명의 노볼락 경화제를 포함하는 조성물을 포함하거나ᅳ 이로 필수적으로 구성되거나 또는 구성되는 인쇄배선판을 포함 (예를 들어, 반도체 소자 탑재)하는 반도체 장치 및 /또는 반도체 패키징 재료를 포함하는 반도체 장치일 수 있다. 또한, 상기 본 발명의 어떠한 실시형태에서 제공되는 어떠한 본 발명의 조성물을 포함하거나, 필수적으로 구성되거나 또는 구성되는 경화물, 접착제, 도료 또는 복합재료가 제공된다. 본 발명의 또 다른 실시형태에 의하면, 상기한 본 발명의 어떠한 실시형태에서 제공되는 본 발명의 조성물을 포함하거나, 필수적으로 구성되거나 또는 구성되는 경화물이 제공된다. 상기 본 발명의 어떠한 ·실시형태에서 제공되는 조성물은 실제 적용되는 경우에ᅳ 예를 들어 , 전자재료 등으로 적용되는 경우에는 경화물로서 사용되며, 이 기술분야에서 에폭시 수지와 무기 성분인 충전제를 포함하는 조성물의 경화물은 일반적으로 복합체로 칭하여진다. 상기한 본 발명의 일 실시형태에서 제공되는 새로운 노볼락 경화제는 복합체에서 우수한 내열특성 및 우수한 난연성을 나타낸다. 구체적으로, 복합체는 낮은 CTE, 예를 돌어, 15ppm/°C 이하, 예를 들어, 12ppm/°C 이하. 예를 들어 , 10ppm/°C 이하, 예를 들어ᅳ 8ppm/°C 이하, 예를 들어, 6ppm/°C 이하, 예를 들어, 4ppni/°C 이하의 CTE를 나타낸다. CTE 값은 작을수록 물성이 우수한 것으로 CTE의 하한값을 특히 한정하는 것은 아니다. 예를 들어, 경화제로서 본 발명에 의한 새로운 노볼락 경화제, 무기재료로서 유 ^ 섬유, 예를 들어, E-글라스 및 /또는 T-글라스 유리 섬유를 포함하고. 레진함량이 30wt% 내지 60wt% (레진 함량에는 무기입자가 포함될 수도' 있고 포함되지 않을 수도 있음)인 복합체는 예를 들어, 10ppm/°C 이하, 예를 들어, 8ppm/°C 이하, 예를 들어, 6ppm/°C 이하, 예를 들어, 4ppm/°C 이하의 CTE를 나타낸다. 또한, 예를 들어, 경화제로서 본 발명에 의한 어떠한 새로운 노볼락 경화제, 무기재료로서 무기입자, 예를 들어, 실리카 입자를 60 내지 80wt%, 예를 들어 70 내지 80wt% 포함하는 복합체는 20ppmrc 이하, 예를 들어, 15ppm/°C 이하, 예를 들어, 10ppm/°C 이하, 예를 들어, 8ppm/°C 이하, 예를 들어 , 6ppm/°C 이하, 예를 들어, 4ppm/°C 이하의 CTE를 나타낸다. 또한, 본 발명에 의한 복합체 (무기재료를 포함하는 경화물)는 Tg가 locrc 보다 높으며, 예를 들어 , 130°C 이상, 또한, 예를 들어, 250°C 이상 또는 Tg- 리스일 수 있다. Tg 값은 클수톡 물성이 우수한 것으로 Tg의 상한값을 특히 한정하는 것은 아니다. 본 명세서에서, 범위로 나타낸 값은 특히 달리 언급하지 않는 한 범위의 하한 값과 상한 값뿐만 아니라 범위 사이의 어떠한 하부 범위 및 그 범위에 속하는 모든 수를 각각 포함함을 의미한다. 예를 들어, C1 내지 C10은 CI, C2, C3, C4. C5, C6, C7, C8, C9, C10 모두를 포함하는 것으로 이해된다. 또한, 수치 범위 중 하한 값 또는 상한 값이 규정되지 않는 것은 수치가 작을수록 혹은 클수록 바람직한 것으로 특히 이들의 한계를 규정하지 않으며. 어떠한 값을 포함하는 것으로 이해된다. 예를 들어, 4ppm/°C 이하의 CTE는, 4, 3.5, 3, 2.7, 2, 1.4, 1, 0.5 ppm/°C 등 범위 사이의 모든 값을 포함하는 것으로 이해된다. 이하, 실시예를 통하여 본 발명에 대하여 상세히 설명한다. 하기 실시예는 본 발명을 예시하는 것으로 이로써 본 발명을 한정하는 것은 아니다. 합성예 1: 실릴화된 페놀노볼락 경화제 합성 플라스크에 페놀노볼락 경화제 (구조식 1, Meiwa Plastic Ind.사, 상품명 HF-1M) 15g, 트리에톡시실릴 프로필이소시아네이트 8.67g 및 테트라히드로퓨란 (THF) 150ml을 넣고 흔합한 후, 아르곤이 충전된 상태에서 15시간 동안 상온에서 교반하였다. 반웅 후, 증발기를 이용해 용매를 제거하여, 노볼락경화제의 히드록시기와 실릴 작용기의 농도비. 즉 [OH]: [Si] = 3.9 : 1 비율을 갖는 실릴화된 노볼락 경화제를 얻었다. 얻어진 최종 생성물의 NMR 데이터는 다음과 같다. When the alkoxysilyl group semicoagulant is included in the composition according to any embodiment of the present invention, the alkoxysilyl group semicoagulant is not limited thereto, but may include, for example, nitric acid, sulfuric acid, hydrochloric acid, acetic acid and phosphoric acid. At least one inorganic acid selected from the group, ammonia 4OH, NH 4 0H, amines and transition metal alkoxides, metal oxides, metal organic acid salts and halides (e.g. dibutyltin Dilaurate (di t butyl in di l aurate), tin salts of octylate, tin (II) ethyl 2- nuclear Sano benzoate) is used at least one kinds selected from the group consisting of "Tin (n) compound), such as Can be. These may be used alone or in combination of two or more kinds. The blending amount of the alkoxysilyl group reaction catalyst is not particularly limited, but considering the reaction properties, the alkoxysilyl group semi-amplification catalyst is 0.01 phr to 10 to the epoxy resin of the present invention. can be used as phr. In order to improve the efficiency of the alkoxysilyl group reaction catalyst, water may be further included in the composition including the alkoxysilyl group reaction catalyst. In this case, the blending amount of water is not particularly limited, but may be 0.01 equivalent to 20 equivalents of water with respect to 1 equivalent of alkoxysilyl group in consideration of efficiency and reaction properties as a catalyst. In a composition comprising any of the novel novolak curing agents provided in the invention described above. Any curing accelerator (curing catalyst) may be further included as necessary to promote the curing reaction. Also, in the case of the novolak curing agent, to improve the reactivity with the epoxy resin. Hardening accelerators are usually used, and in view of the common technical knowledge of the art, it will be apparent to those skilled in the art that any of the above-mentioned and later described compositions may include a curing accelerator depending on the degree of curing reaction. Do. As the curing accelerator (curing catalyst), any catalyst known in the art to be generally used for curing the composition can be used, and thus Although, for example, a curing accelerator such as imidazole, tertiary amine, quaternary ammonium, organic acid salt, Lewis acid, phosphorus compound, etc. may be used. More specifically, for example, 2-methylimidazole (2MZ), 2-undecylimidazole, 2-ethyl 4'methylimidazole (2E4M), 2-phenylimidazole, 1 '(2 Imidazoles such as -cyanoethyl) -2-alkyl group imidazole and 2-heptadecylimidazole (2HDI); Tertiary amine compounds such as benzyl dimethyl amine (BDMA), trisdimethylaminomethylphenol (DMP-30), diazacycloundecene (DBU) and triethylenediamine; Quaternary ammonium salts such as tetrabutylammonium bromide; Organic acid salts of diazabicyclo undecene (DBU) and DBU; Phosphoric compounds such as triphenylphosphine and phosphate ester, Lewis acids such as BF 3 -monoethyl amine (BFVMEA), and the like, and the like, and the like. These curing accelerators may be used as latent in their microcapsule coating and complex salt formation. These may be used independently and may use 2 or more types together according to hardening conditions. The compounding quantity of the said hardening accelerator is not specifically limited, It can mix | blend in the quantity generally used in this technical field, and can use. For example, the epoxy resin may be 0.1 to 10 phr (parts per hundred resin, parts by weight per 100 parts by weight of epoxy resin), for example, 0.2 to 5 phr. The curing accelerator is preferably used in the above content in terms of curing reaction promoting effect and curing reaction rate control. The curing accelerator in the compounding amount in the above range By using it, the curing progresses rapidly and the throughput can be expected to be improved. The composition is a release agent, surface treatment agent, flame retardant which is conventionally formulated for controlling the physical properties of the composition in a range that does not impair the physical properties of the composition. Plasticizers, antibacterial agents, leveling agents,. Other additives such as antifoams, colorants, stabilizers, coupling agents, viscosity modifiers, diluents, rubbers, thermoplastics, etc. may also be blended as needed. For example, in the case where a composition according to the present invention is formed into a thin film, a composition having insufficient flexibility may cause bridging to cause cracking. This is the case, for example, when any composition of the present invention contains a large amount of inorganic particles. Thus, rubber and / or thermoplastic resins may be added to compositions comprising any new novolac curing agent of the present invention to improve solubility in the composition. Thermoplastic resins and rubber-modified epoxy resins can be used that are generally known in the art. As the rubber, any rubber known in the art may be used as long as it is not dissolved in the solvent used in the composition and remains dispersed in the composition. Although not restrict | limited by this, As a kind of rubber, an acrylonitrile butadiene rubber, for example. Butadiene rubber, acrylic rubber, core-shell rubber particles, cross-linked acrylonitrile butadiene rubber particles, cross-linked styrene butadiene rubber particles, acrylic rubber indenters and the like. These may be used alone or in combination of two or more. In the case of using the rubber particle form, the average particle diameter is preferably in the range of 005 to 1 / im in terms of physical properties, and 0.2 to The range of 0.6 is more preferable. Rubber particles, see the above . Based on the weight of solids of the composition of the present invention, for example, in consideration of physical properties, it may be blended in an amount of 0.5 to 10% by weight. Thermoplastic resins include, but are not limited to, phenoxy resins, polyvinyl acetal resins. Polyimide resin, polyamideimide resin, polyether sulone resin, polysulfone resin and the like. These may be used alone or in combination of two or more. The thermoplastic resin may be blended in an amount of, for example, 0.5 to 60% by weight, preferably 3 to 50% by weight, based on the weight of the solid content of the composition of the present invention. As mentioned above. As used herein, the term "composition comprising a composition, a composition of the present invention or a new novolak curing agent" refers to an epoxy resin and the novolak curing agent of the present invention as well as other components constituting the composition as needed, for example, In addition to conventional curing agents, optional curing accelerators (catalysts), inorganic materials (fillers), for example inorganic particles and / or fibers, and solvents, may contain other additives formulated as needed in the art. It is understood that, therefore, in general, the solvent in the composition may optionally be used to appropriately adjust the solid content and / or viscosity of the composition in consideration of the processability of the composition and the like. On the other hand, the term "total weight of the solid content of the composition" used in the present invention refers to the total weight of the components excluding the solvent among the components constituting the composition described above. Any of the compositions of the present invention provided in any of the above embodiments of the present invention may be used for electronic materials. The electronic material is not limited to this, but, for example, not only a substrate build-up film for semiconductors, a prepreg, or a laminated plate on which a metal film is disposed on a substrate made of the composition of the present invention, but also a sealing material (packaging material), as well as printed wiring Electronic components such as substrates. It can also be applied to various applications such as adhesives, paints and composite materials. According to still another embodiment of the present invention, there is provided an electronic material comprising or consisting of any composition comprising the novolac curing agent of the present invention. Furthermore, there is also provided a semiconductor device comprising, consisting essentially of, or consisting of the electronic material. Specifically, the semiconductor device includes a semiconductor device and / or a semiconductor packaging material including (eg, mounting a semiconductor device) a printed wiring board comprising, or consisting essentially of, a composition comprising the novolac curing agent of the present invention. It may be a semiconductor device including a. Also provided are cured products, adhesives, paints, or composites comprising, consisting essentially of, or consisting of any of the compositions of the present invention provided in any of the embodiments of the present invention. According to another embodiment of the present invention, there is provided a cured product comprising, consisting essentially of, or consisting of the composition of the invention provided in any of the embodiments of the invention described above. The composition provided in any of the above-described embodiments of the present invention is used as a cured product when it is actually applied, for example, as an electronic material, and in the art, an epoxy resin and an inorganic component The cured product of the composition comprising the filler is generally referred to as a composite. The novel novolac curing agent provided in one embodiment of the present invention described above exhibits excellent heat resistance and excellent flame retardancy in the composite. Specifically, the composite has a low CTE, for example, 15 ppm / ° C. or less, for example 12 ppm / ° C. or less. For example, a CTE of 10 ppm / ° C or less, for example, 8 ppm / ° C or less, for example, 6 ppm / ° C or less, for example, 4 ppmni / ° C or less. The smaller the CTE value is, the better the physical properties are, and the CTE value is not particularly limited. For example, a novel novolac curing agent according to the present invention as a curing agent, oil ^ fiber as an inorganic material, for example, E-glass and / or T-glass glass fiber. The resin content of 30wt% to 60wt% (may have include an inorganic particles-resin content, that may not be included) in the composite are, for example, 10ppm / ° C or less, for example, 8ppm / ° C or less, e. For example, 6 ppm / ° C. or less, for example, 4 ppm / ° C. or less CTE. Further, for example, any novel novolac curing agent according to the present invention as a curing agent, a composite containing 60 to 80wt%, for example, 70 to 80wt% of inorganic particles, for example, silica particles as an inorganic material, 20ppmrc or less, For example, 15 ppm / ° C or less, for example, 10 ppm / ° C or less, for example, 8 ppm / ° C or less, for example, 6 ppm / ° C Hereinafter, for example, CTE of 4 ppm / ° C or less is shown. In addition, the composite according to the present invention (cured product containing an inorganic material) may have a T g higher than locrc, for example, 130 ° C or more, for example, 250 ° C or more, or Tg-less. . The Tg value is excellent in Kk-Tock physical properties and does not particularly limit the upper limit of Tg. In the present specification, the value indicated by the range means that each includes not only the lower limit value and the upper limit value of the range, but also any lower range between the ranges and all the numbers belonging to the range. For example, C1 to C10 are CI, C2, C3, C4. It is understood to include all of C5, C6, C7, C8, C9, C10. In addition, the lower limit value or the upper limit value of the numerical range is not specified, and the smaller or larger the value is, the more preferable. It is understood to include any value. For example, a CTE below 4 ppm / ° C is understood to include all values between 4, 3.5, 3, 2.7, 2, 1.4, 1, 0.5 ppm / ° C, and the like. Hereinafter, the present invention will be described in detail with reference to Examples. The following examples illustrate the invention but do not limit the invention. Synthesis Example 1 Synthesis of Silylated Phenol Novolac Curing Agent 15 g of a phenol novolac curing agent (Formula 1, Meiwa Plastic Ind., Trade name HF-1M), 8.67 g of triethoxysilyl propyl isocyanate, and 150 ml of tetrahydrofuran (THF) were mixed, and then filled with argon. Stir at room temperature for 15 hours. After reaction, the solvent was removed using an evaporator, and the concentration ratio of the hydroxyl group and the silyl functional group of the novolak curing agent. In other words, a silylated novolac curing agent having a ratio of [OH]: [Si] = 3.9: 1 was obtained. The NMR data of the obtained final product is as follows.
[구조식 1]
Figure imgf000070_0001
[Formula 1]
Figure imgf000070_0001
Ή NMR (400MHz, DMS0): δ= 9.43-8.93(m, 3.89H), 7.71(s, 0.97H), 7.26-6.51, (m, 20.71H), 3.94-3.55(111, 16.33H), 3.15-2.89(m, 2.57H), 1.62-1.44(m, 2.61H), 1.19-1.04(m, 11.98H), 0.66-0.43(m, 2.46H) 합성예 2: 실릴화된 페놀노볼락 경화제 합성 트리에록시실릴 프로필 이소시아네이트 11.44g을 사용한 것을 제외하고는 합성예 1과 동일한 방법으로 합성하여, 노볼락 경화제의 히드록시기와 실릴 작용기의 농도비, 즉 [OH]: [Si] = 2.6 : 1의 비율을 갖는 실릴화된 페놀노불락 경화제를 얻었다. NMR (400MHz, DMS0): δ = 9.43-8.93 (m, 3.89H), 7.71 (s, 0.97H), 7.26-6.51, (m, 20.71H), 3.94-3.55 (111, 16.33H), 3.15 -2.89 (m, 2.57H), 1.62-1.44 (m, 2.61H), 1.19-1.04 (m, 11.98H), 0.66-0.43 (m, 2.46H) Synthesis Example 2 Synthesis of silylated phenol novolac curing agent Synthesis was carried out in the same manner as in Synthesis Example 1, except that 11.44 g of triethoxysilyl propyl isocyanate was used, and the concentration ratio of the hydroxyl group and the silyl functional group of the novolak curing agent, that is, [OH]: [Si] = 2.6: 1 Having silylated phenol nobulac A curing agent was obtained.
¾ NMR (400MHz, DMSO): δ= 9.43— 8.93(ni, 3.11H), 7.71(s, 1.47H), 7.26-6.51 (m, 20.21H), 3.94-3.55(m, 18.55H), 3.15-2.89 (m, 3457H), 1.62-1.44(m, 3.48H), 1.19-1.04(m, 15.09H), 0.66-0.43(m, 3.63H) 합성예 3: 실릴화된 페놀노불락 경화제 합성 ¾ NMR (400 MHz, DMSO): δ = 9.43— 8.93 (ni, 3.11 H), 7.71 (s, 1.47 H), 7.26-6.51 (m, 20.21 H), 3.94-3.55 (m, 18.55 H), 3.15- 2.89 (m, 3 4 57H), 1.62-1.44 (m, 3.48H), 1.19-1.04 (m, 15.09H), 0.66-0.43 (m, 3.63H) Synthesis Example 3: Synthesized silylated phenol nobulac curing agent
(1)제 1단계: 플라스크에 페놀노볼락 경화제 (구조식 1, Meiwa Plastic IncL사, 상품명 HF-1M) 10g, NaOH 3.74g및 DMSO 250ml을 넣고 30분간 상은 교반하였다. 그 후 온도를 0°C로 낮추고 알릴 브로마이드 2.26g을 넣어 준 다음에, 2시간 동안 상온에서 교반하였다. 반응 후, 에틸아세테이트 400ml와 포화 NaCl 용액을 이용하여 워크업 (work up)한 후, 유기층을 분리하고 유기층에 MgS04를 넣어 남아있는 ¾0를 제거한 다음 셀라이트 필터로 여과하고 증발기를 이용해 용매를 제거하여, 작용기의 농도, 즉 [0H] : [allyl group] = 4 :1 비율을 갖는 알릴화된 노볼락 경화제를 얻었다. 얻어진 최종 생성물을 R 데이터는 다음과 같다. [구조식 1]
Figure imgf000072_0001
(1) First step: 10 g of a phenol novolac curing agent (Formula 1, Meiwa Plastic IncL, trade name HF-1M), 3.74 g of NaOH, and 250 ml of DMSO were added to the flask, and the phase was stirred for 30 minutes. Thereafter, the temperature was lowered to 0 ° C. and 2.26 g of allyl bromide was added thereto, followed by stirring at room temperature for 2 hours. After the reaction, the mixture was worked up using 400 ml of ethyl acetate and saturated NaCl solution, the organic layer was separated, MgS0 4 was added to the organic layer to remove the remaining ¾0, filtered through a celite filter, and the solvent was removed using an evaporator. Thus, an allylated novolac curing agent having a functional group concentration, that is, a ratio of [0H]: [allyl group] = 4: 1 was obtained. The R data of the obtained final product is as follows. [Formula 1]
Figure imgf000072_0001
¾ NMR (400MHz, DMSO): δ =7.14-6.70(m, 21.68H), 6.04-6.00(m, 1.35H), 5.41- 5.20(ni, 2.98H), 4.49-4.47(m, 3.01H), 4.17-3.80(m, 11.8H)  ¾ NMR (400 MHz, DMSO): δ = 7.14-6.70 (m, 21.68H), 6.04-6.00 (m, 1.35H), 5.41-5.20 (ni, 2.98H), 4.49-4.47 (m, 3.01H), 4.17-3.80 (m, 11.8H)
(2)제 2단계 : 플라스크에 상기 1단계에서 얻은 알릴화된 노볼락 경화제 10g, 트리에특시실란 2.85g, 백금 산화물 79mg 및 를루엔 100ml을 넣고 흔합한 후, 아르곤이 충전된 상태에서 85°C에서 24시간 동안 교반하였다. 반응 후, 얻은 조질의 생성물을 셀라이트 여과하고 증발기를 이용해 용매를 제거하여, 노불탁 경화제의 히드록시기와 실릴 작용기의 농도비, 즉 [OH]: [Si] = 1 : 1의 비율을 갖는 실릴화돤 페놀노볼락 경화제를 얻었다. 얻어진 최종 생성물의 NMR 데이터는 다음과 같다. 匪 R (400MHz. DMSO): δ =9.31(br.s, 4.92H), 7.14-6.70(m, 21.68H), 4.17- 3.80(m, 25.23H), 1.82-1.70(m, 2.78H), 1.24-1.20(m, 12.99H), 0.80-0.61(m, 2.60H) 합성예 4: 실릴화된 노블락 경화제 합성 (페놀아라킬수지) 플라스크에 구조식 2를 갖는 노볼락 경화제 (Mitsui Chemicals Inc.사, 상품명 XLC-4L) 15g, 트리에특시실릴 프로필이소시아네이트 7.31g 및 테트라히드로퓨란 (THF) 150ml을 넣고 혼합한 후, 아르곤이 충전된 상태에서 15시간 동안 상은에서 교반하였다. 반웅 후, 증발기를 이용해 용매를 제거하여 노볼락 경화제의 히드록시기와 실릴작 용기의 농도비, 즉 [OH]: [Si] = 2 : 1 비율을 갖는 실릴화된 노볼락 경화제를 얻었다. 얻어진 최종 생성물의 NMR 데이터는 다음과 같다. (2) Step 2: After mixing 10 g of the allylated novolac curing agent obtained in Step 1, 2.85 g of Triethisilane, 79 m g of platinum oxide, and 100 ml of toluene into a flask, Stir at 85 ° C. for 24 hours. After the reaction, the obtained crude product was filtered through Celite and the solvent was removed using an evaporator to obtain a silylated phenol having a ratio of the hydroxyl group and silyl functional group of the no-opaque curing agent, that is, [OH]: [Si] = 1: 1. A novolac curing agent was obtained. The NMR data of the obtained final product is as follows.匪 R (400 MHz.DMSO): δ = 9.31 (br.s, 4.92H), 7.14-6.70 (m, 21.68H), 4.17-3.80 (m, 25.23H), 1.82-1.70 (m, 2.78H), 1.24-1.20 (m, 12.99 H), 0.80-0.61 (m, 2.60 H) Synthesis Example 4 Synthesis of Silylated Noblock Curing Agent (Phenol Araki Resin) 15 g of a novolac curing agent (Mitsui Chemicals Inc., trade name XLC-4L) having Structural Formula 2 in a flask, 7.31 g of triethoxysilyl propyl isocyanate, and tetra 150 ml of hydrofuran (THF) was added and mixed, followed by stirring in phase silver for 15 hours in an argon-filled state. After the reaction, the solvent was removed using an evaporator to obtain a silylated novolac curing agent having a concentration ratio of the hydroxyl group of the novolak curing agent and the silyl product vessel, that is, the ratio [OH]: [Si] = 2: 1. The NMR data of the obtained final product is as follows.
[구조식 2]
Figure imgf000073_0001
[Formula 2]
Figure imgf000073_0001
Ή NMR (400MHz, DMS0): 5=9.31(br.s, 3.66H), 7.75(br.s, 1.98H), 7.08-6.68 (m 19.91H), 4.20-3.79(m, 12.84H), 3.32-3.12(m, 4.73H), 1.72-1.54(m, 4.27), 1.24-1.20(m, 18.72H), 0.80-0.61 (m, 4.17H). NMR (400 MHz, DMS0): 5 = 9.31 (br.s, 3.66H), 7.75 (br.s, 1.98H), 7.08-6.68 (m 19.91H), 4.20-3.79 (m, 12.84H), 3.32 -3.12 (m, 4.73H), 1.72-1.54 (m, 4.27), 1.24-1.20 (m, 18.72H), 0.80-0.61 (m, 4.17H).
합성예 5: 실릴화된 노블락경화제 합성 (바이페닐아라킬 타입 페놀수지) 플라스크에 비페닐 노볼락 경화제 (구조식 3, Meiwa Plastic Ind.사, 상품명 MEH-7851SS) 15g, 트리에특시실릴 프로필이소시아네이트 4.57g 및 테트라히드로퓨란 (THF) 150nil을 넣고 흔합한 후, 아르곤이 층전된 상태에서 15시간 동안 상온에서 교반하였다. 반응 후. 증발기를 이용해 용매를 제거하여 노볼락 경화제의 히드록시기와 실릴 작용기의 농도비, 즉 [OH]: [Si] = 3 : 1 비율을 갖는 실릴화된 노볼락 경화제를 얻었다. 얻어진 최종 생성물의 NMR 데이터는 다음과 같다. Synthesis Example 5 Synthesis of Silylated Noble Curing Agent (Biphenyl Aralkyl Type Phenolic Resin) 15 g of biphenyl novolac curing agent (Formula 3, Meiwa Plastic Ind., Trade name MEH-7851SS), 4.57 g of trioxysilyl propyl isocyanate, and 150 nil of tetrahydrofuran (THF) were added to the flask, followed by mixing. Stirred at room temperature for 15 hours. After the reaction. The solvent was removed using an evaporator to obtain a silylated novolak curing agent having a concentration ratio of the hydroxyl group and the silyl functional group of the novolak curing agent, that is, the ratio [OH]: [Si] = 3: 1. The NMR data of the obtained final product is as follows.
[구조식 3]
Figure imgf000074_0001
[Formula 3]
Figure imgf000074_0001
Ή NMR (400MHz , DMS0): 9.41(s, 0.78H), 9.26(s, 0.29H), 9.21(s, 0.59H), 7.88-6.61(m, 20.40H), 4.05-3.70(m, 8.27H), 3.15-2.85(m, 1.15H), 1.69-1.45(m, 1.12H), 1.28-1.05(m, 5.86H), 0.67-0.42(m, 1.16H), 합성예 6: 실릴화된 디시클로펜타디엔 노볼락 경화제 합성 플라스크에 디시클로펜타디엔 노볼락 경화제 (구조식 4, Nippon petrochemicals Co.사, 상품명 DCPDP) 15g, 트리에톡시실릴 프로필이소시아네이트 3.53g 및 테트라히드로퓨란 (THF) 150ml을 넣고 흔합한 후, 아르곤이 충전된 상태에서 15시간 동안 상온에서 교반하였다. 반웅 후, 증발기를 이용해 용매를 제거하여 노볼락 경화제의 히드록시기와 실릴 작용기의 농도비, 즉 [OH]: [Si] = 4 : 1 비율을 갖는 실릴화된 노볼락 경화제를 얻었다. 얻어진 최종 생성물의 NMR 데이터는 다음과 같다. 구조식 4]
Figure imgf000075_0001
NMR (400MHz, DMS0): 9.41 (s, 0.78H), 9.26 (s, 0.29H), 9.21 (s, 0.59H), 7.88-6.61 (m, 20.40H), 4.05-3.70 (m, 8.27H ), 3.15-2.85 (m, 1.15H), 1.69-1.45 (m, 1.12H), 1.28-1.05 (m, 5.86H), 0.67-0.42 (m, 1.16H), Synthesis Example 6: Silyzed dish Into the clopentadiene novolac curing agent synthetic flask, 15 g of dicyclopentadiene novolac curing agent (Formula 4, Nippon petrochemicals Co., trade name DCPDP), 3.53 g of triethoxysilyl propyl isocyanate and 150 ml of tetrahydrofuran (THF) After adding, with argon charged Stir at room temperature for 15 hours. After the reaction, the solvent was removed using an evaporator to obtain a silylated novolac curing agent having a concentration ratio of the hydroxyl group and the silyl functional group of the novolak curing agent, that is, [OH]: [Si] = 4: 1 ratio. The NMR data of the obtained final product is as follows. Structural Formula 4]
Figure imgf000075_0001
Ή NMR (400MHz,. DMS0): δ= 9.30(br.s, 3.11H), 7.80(br.s, 0.76H), 7.39- 6.59(m7 23.00H), 3.79-3.51(m, 7.88H), 3.10-2.61(m, 8.18H), 2.25-1.00(m. 50.26H), 0.65-0.51(ni, 1.61H) 합성예 7: 실릴화된 노볼락경화제 합성 (다관능성 페놀수지) 폴라스크에 다관능성 노볼락 경화제 (구조식 5, Meiwa Plastic Ind.사, 상품명 MEH-7500-3S) 15g, 트리에톡시실릴 프로필이소시아네이트 7.22g 및 테트라히드로퓨란 (THF) 150ml을 넣고 흔합한 후, 아르곤이 충전된 상태에서 15시간 동안 '상은에서 교반하였다. 반웅 후, 증발기를 이용해 용매를 제거하여 노볼락 경화제의 히드록시기와 실릴 작용기의 농도비, 즉 [OH]: [Si] = 4 : 1 비율을 갖는 실릴화된 노볼락 경화제를 얻었다. 얻어진 최종 생성물의 NMR 데이터는 다음과 같다. MR NMR (400 MHz, .DMS0): δ = 9.30 (br.s, 3.11H), 7.80 (br.s, 0.76H), 7.39-6.59 (m 7 23.00H), 3.79-3.51 (m, 7.88H) , 3.10-2.61 (m, 8.18H), 2.25-1.00 (m. 50.26H), 0.65-0.51 (ni, 1.61H) Synthesis Example 7: Synthesized silylated novolac hardener synthesis (polyfunctional phenolic resin) 15 g of a polyfunctional novolac curing agent (Formula 5, Meiwa Plastic Ind., MEH-7500-3S), 7.22 g of triethoxysilyl propyl isocyanate, and 150 ml of tetrahydrofuran (THF) were mixed, and then filled with argon. , and the mixture was stirred at 15 for phase time status. After the reaction, the solvent was removed using an evaporator to obtain a silylated novolac curing agent having a concentration ratio of the hydroxyl group and the silyl functional group of the novolak curing agent, that is, the ratio [OH]: [Si] = 4: 1. NMR of the final product obtained The data is as follows.
[구조식 5] [Structure 5]
Figure imgf000076_0001
Figure imgf000076_0001
¾ NMR (400MHz, DMS0): 6=9.19(br.s, 6.29H), 7.05-6.51 (m, 26.00H), 5.91(s, 0.57H), 5.58(m, 0.74H), 3.87-3.45(m, 12.75H), 3.15-2.91(m, 3.72H), 1.54- 1.48(m, 3.90H), 1.20-1.16(m, 18.45H), 0.67-0.50(m, 3.33H) 합성예 8: 실릴화된 크레졸노블락 경화제 합성 플라스크에 크레졸 노볼락 경화제 (구조식 6, DIC Corporation.사, 상품명 KA-1163 ) 15g, 트리에톡시실릴 프로필이소시아네이트 6.29g 및 테트라히드로퓨란 (THF) 150ml을 넣고 흔합한 '후, 아르곤이 충전된 상태에서 15시간 동안 상은에서 교반하였다. 반웅 후, 증발기를 이용해 용매를 제거하여 노볼락 경화제의 히드록시기와 실릴 작용기의 농도비, 즉 [OH]: [Si] = 4 : 1 비율을 갖는 실릴화된 노볼락 경화제를 얻었다. 얻어진 최종 생성물의 NMR 데이터는 다음과 같다. ¾ NMR (400MHz, DMS0): 6 = 9.19 (br.s, 6.29H), 7.05-6.51 (m, 26.00H), 5.91 (s, 0.57H), 5.58 (m, 0.74H), 3.87-3.45 ( m, 12.75H), 3.15-2.91 (m, 3.72H), 1.54- 1.48 (m, 3.90H), 1.20-1.16 (m, 18.45H), 0.67-0.50 (m, 3.33H) Synthesis Example 8: Silyl localized-cresol novolak curing agent cresol novolak curing agent in synthesis (Structure 6, DIC Corporation. Co., trade name: KA-1163) 15g, then, into the silyl-ethoxy propyl isocyanate and 6.29g tetrahydrofuran (THF) 150ml shake combined the tree Stir at phase silver for 15 hours with argon charged. After the reaction, the solvent was removed using an evaporator to obtain a silylated novolac curing agent having a concentration ratio of the hydroxyl group and the silyl functional group of the novolak curing agent, that is, the ratio [OH]: [Si] = 4: 1. The NMR data of the obtained final product is as follows.
Figure imgf000077_0001
Figure imgf000077_0001
Ή.Ν服 (400MHz, DMSO): 5=9.32(br.s, 2.99H), 7.77(br.s, 0.77H), 7.02-6.89(m, 10H), .4.24-3.36 (m, 12.25H), 3.18-3.01(m, 1.89H), 2.24-2.10(m, 12.88H), 1.73—1.40(m, 1.88H), 1.20-1.14(m, 9.99H), 0.64-0.50(m, 1.60H) 합성예 9: 실릴화된 비스페놀 A노볼락계 경화제 합성 플라스크에 비스페놀 A 노볼락계 경화제 (구조식 7, DIC Corporation.사, 상품명 VH-4150) 15g, 트리에특시실릴 프로필이소시아네이트 6.29g 및 테트라히드로퓨란 (THF) 150nil을 넣고 흔합한 후, 아르곤이 층전된 상태에서 15시간 동안 상온에서 교반하였다. 반웅 후 증발기를 이용해 용매를 제거하여 노볼락 경화제의 히드특시기와 실릴 작용기의 농도비, 즉 [OH]: [Si] = 4 : 1 비율을 갖는 실릴화된 노볼락 경화제를 얻었다. 얻어진 최종 생성물의 NMR 데이터는 다음과 같다. [구조식 7] Ν.Ν 服 (400MHz, DMSO): 5 = 9.32 (br.s, 2.99H), 7.77 (br.s, 0.77H), 7.02-6.89 (m, 10H), .4.24-3.36 (m, 12.25H ), 3.18-3.01 (m, 1.89H), 2.24-2.10 (m, 12.88H), 1.73—1.40 (m, 1.88H), 1.20-1.14 (m, 9.99H), 0.64-0.50 (m, 1.60H) Synthesis Example 9: 15 g of bisphenol A novolac curing agent (Formula 7, DIC Corporation., Trade name VH-4150) in a silylated bisphenol A novolac curing agent synthesis flask, 6.29 g of triethoxysilyl propyl isocyanate and tetra After hydrofuran (THF) 150nil was added and mixed, the mixture was stirred at room temperature for 15 hours in an argon-laminated state. After the reaction, the solvent was removed using an evaporator to obtain a silylated novolac curing agent having a concentration ratio between the hydride of the novolak curing agent and the silyl functional group, that is, the ratio [OH]: [Si] = 4: 1. The NMR data of the obtained final product is as follows. [Structure 7]
Figure imgf000078_0001
Figure imgf000078_0001
¾ NMR (400MHz, DMSO): 5=9.31(br.s, 7.65H), 7.76(br.s, 1.76H), 7.20-7.05(m. 16.00H), 6.89-6.75(m, 17.58H), 4.22-3.79(m, 37.28H), 3.36-3.28(m, 4.23H), 1.62-1.20(m, 62.11H), 0.67-0.51(m, 3.95H) 합성예 10: 실릴화된 나프탈렌 노볼락경화제 합성 플라스크에 나프탈렌 노볼락 경화제 (구조식 8, Nippon Kayaku C으사ᅳ 상품명 KAYAHARD CBN) 15g, 트리에톡시실릴 프로필이소시아네이트 5.38g 및 테트라히드로퓨란 (THF) 150ml을 넣고 흔합한 후, 아르곤이 충전된 상태에서 15시간 동안 상은에서 교반하였다. 반웅 후, 증발기를 이용해 용매를 제거하여 노볼락 경화제의 히드록시기와 실릴 작용기의 농도비, 즉 [OH]: [Si] = 4 : 1 비율을 갖는 실릴화된 노볼락 경화제를 얻었다. 얻어진 최종 생성물의 醒 R 데이터는 다음과 같다. [구조식 8]
Figure imgf000079_0001
¾ NMR (400 MHz, DMSO): 5 = 9.31 (br.s, 7.65H), 7.76 (br.s, 1.76H), 7.20-7.05 (m. 16.00H), 6.89-6.75 (m, 17.58H), 4.22-3.79 (m, 37.28H), 3.36-3.28 (m, 4.23H), 1.62-1.20 (m, 62.11H), 0.67-0.51 (m, 3.95H) Synthesis Example 10: Silylated naphthalene novolac hardener 15 g of naphthalene novolac curing agent (Scheme 8, Nippon Kayaku C, KAYAHARD CBN), 5.38 g of triethoxysilyl propyl isocyanate, and 150 ml of tetrahydrofuran (THF) were mixed, and then mixed with argon. Stir at phase silver for 15 h. After the reaction, the solvent was removed using an evaporator to obtain a silylated novolac curing agent having a concentration ratio of the hydroxyl group and the silyl functional group of the novolak curing agent, that is, [OH]: [Si] = 4: 1 ratio. The XR data of the obtained final product is as follows. [Structure 8]
Figure imgf000079_0001
n  n
Ή NMR (400MHz, DMSO) : δ= 9.30(br.s, 3.51H), 7.75 (br.s 0.72H), 8.03- 7.51(m, 11.99H), 7.39-6.85(m, 15.43H), 4.40-3.60(m, 23.77H), 3.35-3.25(m. 2.30H), 1.69-1.38(m, 2.21H), 1.21-1.05(m, 11.88H), 0.68-0.45(m, 1.92H) 물성평가:경화물 제조 및 내열특성 평가  NMR (400 MHz, DMSO): δ = 9.30 (br.s, 3.51H), 7.75 (br.s 0.72H), 8.03- 7.51 (m, 11.99H), 7.39-6.85 (m, 15.43H), 4.40 -3.60 (m, 23.77H), 3.35-3.25 (m. 2.30H), 1.69-1.38 (m, 2.21H), 1.21-1.05 (m, 11.88H), 0.68-0.45 (m, 1.92H) Hardening Preparation and Heat Resistance Evaluation
1. 에폭시 복합체 제조 1. Epoxy Composite Manufacturing
(1)에폭시 유리섬유 복합체 (경화물) 제조 하기 표 1의 조성으로, 에폭시 화합물, 및 실리카 슬러리 (고형분 함량 70wt%, 메틸에틸케톤용매, 실리카 평균 크기 1/ΛΙΙ)를 Ν,Ν-다이메틸아세트아마이드에 고형분 함량이 40 %이 되도록 녹인다. 이 흔합액을 1500 rpm의 속도로 1 시간 흔합한 후, 경화제를 넣고 추가로 50분간 더 흔합하였다. 그 후, 여기에. 마지막으로 경화 촉매를 넣고 10분간 더 흔합하여 실릴 경화제를 포함한 바인더 용액을 얻었다. 이 바인더 용액에 유리섬유 (Nittobo사, T-glass)를 침지하여 실릴화된 경화제를 포함하는 에폭시 유리섬유 복합물을 제조하였다. 그 후, 상기 복합물을 100°C로 가열된 진공 오본에 넣어 용매를 제거한 다음 12CTC로 예열된 핫 프레스에서 120°C에서 2시간, 180°C에서 2시간 그리고 200°C - 230°C의 온도에서 2시간 동안 경화시켜서 유리섬유 복합체 (4國 xi6mfflX0.1醒)을 얻었다. (1) Preparation of epoxy glass fiber composite (cured product) With the composition shown in Table 1, epoxy compound, and silica slurry (solid content of 70wt%, methyl ethyl ketone solvent, average silica size 1 / ΛΙΙ) of Ν, Ν-dimethyl Dissolve in acetamide to 40% solids. After mixing this mixed liquid at the speed of 1500 rpm for 1 hour, the hardening | curing agent was added and it mixed for further 50 minutes. After that, here. Finally, the curing catalyst was added and further mixed for 10 minutes to obtain a binder solution containing a silyl curing agent. An epoxy glass fiber composite containing a silylated curing agent was prepared by immersing glass fiber (N-Ttobo, T-glass) in this binder solution. The composite was then placed in a vacuum oven heated to 100 ° C to remove the solvent and then preheated to 12 CTC. The glass fiber composite was obtained by curing at a hot press for 2 hours at 120 ° C., 2 hours at 180 ° C. and 2 hours at a temperature of 200 ° C.-230 ° C.
(2) 에폭시 필러 복합체 (경화물)의 제조 하기 표 2의 조성으로, 에폭시 화합물, 실리카 슬러리 (분산용액: 메틸에틸케톤 용매, 실리카 평균 크기 1 ) 및 폴리비닐아세탈을 Ν,Νᅳ 다이메틸아세트아마이드에 고형분 함량이 40 %이 되도록 녹인다. 이 흔합액을 1500 rpm의 속도로 1 시간 30분 흔합한 후, 경.화제를 넣고 추가로 30분간 더 흔합하였다. 상기 흔합물을 100°C로 가열된 진공 오본에 넣어 용매를 제거한 다음 120 °C로 예열된 핫 프레스에서 120°C에서 2시간, 180 X에서 2시간 그리고 200 °C ~ 230 °C 에서 2시간 동안 경화시켜서 에폭시 필러 (무기입자) 복합체 (5醒 X 5匪 X 3議)를 얻었다. (2) Preparation of Epoxy Filler Composite (Hardened) According to the composition shown in Table 2 below, epoxy compound, silica slurry (dispersion solution: methyl ethyl ketone solvent, silica average size 1) and polyvinyl acetal Ν, Ν ᅳ dimethylacet Dissolve the amide to 40% solids. The mixture was mixed for 1 hour and 30 minutes at a speed of 1500 rpm, followed by addition of a hardening agent and further mixing for 30 minutes. 2-2 hours the common compound at 100 ° to put the vacuum Bon Festival heated to C, remove the solvent in a hot-press pre-heated to 120 ° C 120 ° C, in a 180 X 2 hours and 200 ° C ~ 230 ° C Curing to give an epoxy filler (inorganic particle) composite (5 × X 5 × X 3 ′).
2. 내열 물성 평가 2. Heat resistance property evaluation
상기한 방법으로 제조된 복합체의 내열특성을 평가하기 위하여, 은도에 따른 치수변화를 열 -기계 분석기 (Therm으 mechanical Analysizer)를 이용하여 평가하여 하기 표 1과 표 2에 나타내었다. 또한 도 1에는 실시예 1과 비교예 1 (표 1)에서 얻어진 결과를 나타내었다. 이때 유리섬유복합필름의 시편은 4X 16X0. K讓3)의 크기로, 필러복합체의 시편은 5X5X3(匪3)의 크기로 제조하였다. In order to evaluate the heat resistance characteristics of the composite prepared by the above method, the dimensional change according to the degree of silver is evaluated using a thermo-mechanical analyzer (Therm mechanical analysizer) is shown in Table 1 and Table 2. 1 shows the results obtained in Example 1 and Comparative Example 1 (Table 1). At this time, the specimen of the glass fiber composite film is 4X 16X0. A size of K讓3), the specimen of the composite filler was prepared by the size of 5X5X3 (匪3).
표 1, 표 2 및 도 1에 나타난 바와 같이 본 발명에 의해 획득한 경화물은 유리전이온도를 나타내지 않는 것 (Tg- l ess)을 확인할 수 있었다. 하기 표 1 및 2 에서 유리전이온도가 있는 복합체의 경우, 유리전이은도 이전 (Τ< ' )과 유리전이온도이후 (T>Tg)의 CTE 값이 달라서 , 이를 각각 αι과 α2 로 표기한다. 따라서, on (T<Tg)는 유리전이온도 이전의 은도구간에서의 CTE 값을 의미하는 것이다. 한편, 통상적으로 복합체 시료의 CTE 는 αι 값을 사용하므로, 하기 표 1 및 2에 (T<Tg)값을 나타내었다. As shown in Table 1, Table 2 and Figure 1 the cured product obtained by the present invention It was confirmed that the glass transition temperature was not shown (Tg-ess). In the following Table 1 and 2 in the case of the composite with a glass transition temperature, the glass transition temperature before (Τ <') and after the glass transition temperature (T> Tg), the CTE value is different, it is represented as αι and α 2 , respectively. Therefore, on (T <Tg) means the CTE value between the silver tools before the glass transition temperature. On the other hand, since the CTE of the composite sample typically uses αι values, (T <T g ) values are shown in Tables 1 and 2 below.
【표 1】 유리섬유 복합체 Table 1 Glass Fiber Composites
Figure imgf000082_0001
Figure imgf000082_0001
【표 2】 필러 복합체 Table 2 Filler Composite
Figure imgf000083_0002
Figure imgf000083_0002
주: 상기 표 1 및 2에서 사용된 화합물은 다음과 같음. Note: The compounds used in Tables 1 and 2 above are as follows.
(1) DGEBA: Diglycidyl ether of bisphenol A, Aklrich사, EE =190 (1) DGEBA: Diglycidyl ether of bisphenol A, Aklrich, EE = 190
(2) EXA4700: 바이나프탈렌계 에폭시 (EEW=162, DIC사) (2) EXA4700: Binaphthalene epoxy (EEW = 162, DIC Corporation)
Figure imgf000083_0001
(3) YX4000H : 바이페닐계 에폭시 (三菱化學 (株) )
Figure imgf000084_0001
Figure imgf000083_0001
(3) YX4000H: Biphenyl epoxy
Figure imgf000084_0001
(4) polydis: 고무 개질된 에폭시 (Strrukt이사) (4) polydis: rubber modified epoxy (Strrukt)
(5) HF-1M: 페놀노볼락계 경화제 (Meiwa Plastic Industries, HEW=107)
Figure imgf000084_0002
(5) HF-1M: phenol novolac curing agent (Meiwa Plastic Industries, HEW = 107)
Figure imgf000084_0002
(6) TPP: 트리페닐포스핀 (Aldrich사)  (6) TPP: triphenylphosphine (Aldrich)
(7) 2E4MZ: 2ᅳ에틸 -4—메틸 이미다졸 (Aldrich사) 상기 표 1에 나타낸 바와 같이, 본 발명의 에폭시 수지 및 알콕시실릴기를 갖는 노볼락 경화제를 포함하는 실시예 1 내지 실시예 12의 복합체는 알콕시실릴기를 갖지 않은 에폭시 수지 및 기존의 노볼락 경화제를 포함하는 비교예 1 및 비교예 2의 복합체에 비하여 낮은 CTE를 나타낼 뿐만 아니라 유리전이온도를 나타내지 않는 것으로 (Tgᅳ less, TgL), 내열성이 향상됨을 알 수 있었다ᅳ  (7) 2E4MZ: 2 ᅳ ethyl-4-methyl imidazole (Aldrich) As shown in Table 1, Examples 1 to 12 containing the novolak curing agent having an epoxy resin of the present invention and an alkoxysilyl group The composite exhibits not only low CTE but also glass transition temperature compared to the composites of Comparative Examples 1 and 2 including an epoxy resin having no alkoxysilyl group and a conventional novolak curing agent (Tg ᅳ less, TgL), It was found that the heat resistance was improved 향상

Claims

【특허청구범위】 【청구항 1】 하기 화학식 1-1 내지 1-4로 구성되 하나의 알콕시실릴기를 갖는 노볼락 경화제. [화학식 1-1] (상기 화학식 Iᅳ 1에서, Z는 하기 화학식 1A 내지 1F로 구성되는 그룹 증 하나이다. 1A 1B 1C [화학식 Iᅳ 2] X는 이며 R은 Cl-ClO의 직쇄 또는 측쇄상 알킬기이다. ) (상기 화학식 1-1 내지 1—4에서, . 적어도 하나의 A는 하기 화학식 A2 또는 A3이고, 적어도 하나가 A2인 경우에, 나머지 A는 하기 화학식 B2 또는 수소이고, 적어 H c 2도 하나가 A3인 경우에, 나머지 A는 수소이며, n은 1이상의 정수이다. ) [화학식 A2] -(CH2)m-SiRiR2R3 [화학식 A3] -C0NH(CH2)m-SiRiR2R3 (상기 화학식 A2 및 . A3에서, 내지 R3 중 적어도 하나는 탄소수 1 내지 5의 직쇄 혹은 분지쇄 알콕시기이고, 나머지는 탄소수 1 내지 10의 직쇄 혹은 분지쇄 알킬기이며, m은 3 내지 10의 정수이다. ) [화학식 B2] -(CH2) CH=CH2 (식중, 1은 1 내지 8의 정수이다. ) 【청구항 2】 염기 및 임의의 용매 존재 하에서 하기 화학식 IA-1 내지 IA— 4 중 하나의 출발물질과 하기 화학식 Π의 알케닐 화합물을 반웅시켜서 하기 화학식 IB-1 내지 IB-4 중 하나의 중간생성물을 형성하는 제 1 단계 ; 및 백금촉매 및 임의의 용매 존재 하에서 상기 화학식 IB-1 내지 IBᅳ 4 중 하나의 중간생성물과 하기 화학식 ΙΠΑ의 알콕시실란을 반웅시켜서 화학식 A2의 구조를 갖는 화학식 1-1 내지 화학식 1-4 중 하나의 화합물을 형성하는 제 2 단계를 포함하는, 화학식 1-1 내지 화학식 1—4 로 구성되는 그룹.으로부터 선택되는 어느 하나의 알콕시실릴기를 갖는 노볼락 경화제의 제조방법. [화학식 IA-1] (상기 화학식 IA-1에서, ' X는 하기 화학식 2A 내지 2F로 구성되는 그룹 중 하나이다. [화학식 IA-2] [화학식 IA-4] (화학식 IA-4 중, p는 1 또는 2이며 xl은 이며 R은 C1-C10의 직쇄 또는 분지쇄상 알킬기이다. ) (상기 화학식 IA-1 내지 IA-4에서, n은 1이상의 정수이다. ) 【Patent Claims】 【Claim 1】 A novolak curing agent having one alkoxysilyl group and having the following formulas 1-1 to 1-4. [Formula 1-1] (In the above formula I 1, Z is one of the groups consisting of the following formulas 1A to 1F. 1A 1B 1C [Formula I 2] It is an alkyl group. ) (In the above formulas 1-1 to 1-4, at least one A is the formula A2 or A3, and when at least one is A2, the remaining A is the formula B2 or hydrogen, and is written as H c When one of the 2 is A3, the remaining A is hydrogen, and n is an integer of 1 or more. ) [Formula A2] -(CH2)m-SiRiR2R3 [Formula A3] -C0NH(CH2)m-SiRiR2R3 (Formula A2 And in A3, at least one of to R3 is a straight-chain or branched alkoxy group having 1 to 5 carbon atoms, the remainder is a straight-chain or branched alkyl group having 1 to 10 carbon atoms, and m is an integer of 3 to 10. ) [Chemical formula B2] -(CH2) CH=CH2 (wherein, 1 is an integer from 1 to 8.) [Claim 2] In the presence of a base and an optional solvent, a starting material of one of the following formulas IA-1 to IA-4 and the following formula A first step of reacting an alkenyl compound of Π to form an intermediate product of the following formulas IB-1 to IB-4; And one of the formulas 1-1 to 1-4 having the structure of formula A2 by reacting an intermediate product of the formulas IB-1 to IBᅳ 4 with an alkoxysilane of the formula ΙΠΑ in the presence of a platinum catalyst and an optional solvent. A method for producing a novolak curing agent having any one alkoxysilyl group selected from the group consisting of Formulas 1-1 to 1-4, including a second step of forming a compound of. [Formula IA-1] (In the above formula IA-1, ' 1 or 2, xl is and R is a C1-C10 linear or branched alkyl group. ) (In the above formulas IA-1 to IA-4, n is an integer of 1 or more.)
[화학식 IB-1] [Formula IB-1]
Figure imgf000090_0004
Figure imgf000090_0004
(상기 식에서, Y1은 하기 화학식 3A 내지 3F로 구성되는 그룹 중의 하나이다. (In the above formula, Y1 is one of the groups consisting of the following formulas 3A to 3F.
Figure imgf000091_0001
Figure imgf000091_0002
Figure imgf000091_0001
Figure imgf000091_0002
[화학식 IB-2]
Figure imgf000091_0003
[Formula IB-2]
Figure imgf000091_0003
[화학식 IB-3]
Figure imgf000092_0001
[Formula IB-3]
Figure imgf000092_0001
[화학식 IB-4][Formula IB-4]
Figure imgf000092_0002
Figure imgf000092_0002
(상기 화학식 IB-4에서, p는 1 또는 2이고 (In the above formula IB-4, p is 1 or 2 and
x2
Figure imgf000092_0003
이며
Figure imgf000092_0004
R은 C1-C10의 직쇄 혹은 분지쇄의 알킬기이다. )
x2
Figure imgf000092_0003
and
Figure imgf000092_0004
R is a straight or branched C1-C10 alkyl group. )
(상기 화학식 IB-1 내지 IB-4에서, 적어도 하나의 D는 하기 화학식 B2이고 나머지는 수소일 수 있으며, n은 1이상의 정수이다. ) [화학식 B2] (In the above formulas IB-1 to IB-4, at least one D is the formula B2 below and the remainder may be hydrogen, and n is an integer of 1 or more.) [Formula B2]
-(CH2) CH=CH2 -(CH 2 ) CH=CH 2
(식중, 1은 1 내지 8의 정수이다.) (In the formula, 1 is an integer from 1 to 8.)
[화학식 Π ] [Formula Π]
X-(CH2),-CH=CH2 X-(CH 2 ),-CH=CH 2
(식중, 1은 1 내지 8의 정수이고, X는 CI, Br, I, -0-S02-CH3, -0_S02— CF3, 또는 -0-S02-C6H4-CH3 이다.) ( Wherein , 1 is an integer from 1 to 8 , and am.)
[화학식 ΠΙΑ] [Chemical formula ΠΙΑ]
HSiRaRb c HSiR a R bc
(상기 식에서, Ra 내지 Rc 중 적어도 하나는 직쇄 혹은 분지쇄 C1ᅳ C5 알콕시기이고, 나머지는 직쇄 흑은 분지쇄 C1-C10 알킬기이다.) (In the above formula, at least one of R a to R c is a straight-chain or branched C1-C5 alkoxy group, and the remainder is a straight-chain or branched C1-C10 alkyl group.)
[화학식 1-1] [Formula 1-1]
Figure imgf000093_0001
Figure imgf000093_0001
(상기 식에서, Z는 하기 화학식 1A 내지 1F로 구성되는 그룹 증 하나이다. (In the above formula, Z is one of the groups consisting of the following formulas 1A to 1F.
Figure imgf000094_0001
Figure imgf000094_0001
Figure imgf000094_0002
Figure imgf000094_0002
Figure imgf000094_0003
Figure imgf000094_0003
92 [화학식 1-3] 92 [Formula 1-3]
Figure imgf000095_0001
Figure imgf000095_0001
[화학식 1-4]
Figure imgf000095_0002
[Formula 1-4]
Figure imgf000095_0002
(상기 화학식 1-4에서, p는 1 또는 2이고 (In Formula 1-4, p is 1 or 2 and
이며
Figure imgf000095_0003
R은 CI— CIO의 직쇄 또는 측쇄상 알킬기이다. )
and
Figure imgf000095_0003
R is a linear or branched alkyl group of CI—CIO. )
(상기 화학식 1ᅳ1 내지 1-4에서, 적어도 하나의 A는 하기 화학식 A2이고 나머지는 하기 화학식 B2 또는 수소이고, n은 1이상의 정수이다. ) [화학식 A2] (In the above formulas 1-1 to 1-4, at least one A is the formula A2 and the rest are the formula B2 or hydrogen, and n is an integer of 1 or more.) [Formula A2]
-(CH2)m-SiRiR2R3 -(CH 2 ) m -SiRiR 2 R 3
(상기 화학식 A2에서, ¾ 내지 ¾중 적어도 하나는 탄소수 1 내지 5의 직쇄 혹은 분지쇄 알콕시기이고, 나머지는 탄소수 1 내지 10의 직쇄 혹은 분지쇄 알킬기이며, m은 3 내지 10의 정수이다. ) (In the above formula A2, at least one of ¾ to ¾ is a straight-chain or branched alkoxy group having 1 to 5 carbon atoms, the remainder is a straight-chain or branched alkyl group having 1 to 10 carbon atoms, and m is an integer of 3 to 10.)
[화학식 B2] [Formula B2]
-(CH2) ,-CH=CH2 -(CH 2 ) ,-CH=CH 2
(식중, 1은 1 내지 8의 정수이다. ) [청구항 3】 (In the formula, 1 is an integer from 1 to 8.) [Claim 3]
제 2항에 있어서, 상기 제 1단계는 상기 화학식 IA-1 내지 IA-4 중 하나의 출발물질의 히드록시 그룹 1 당량에 대하여 상기 화학식 Π의 알케닐 화합물의 알킬렌기가 0. 1 내지 10 당량이 되도록 반웅시켜 수행되는 알콕시실릴기를 갖는 노볼락 경화제의 제조방법 . The method of claim 2, wherein in the first step, the alkylene group of the alkenyl compound of the formula Π is 0.1 to 10 equivalents relative to 1 equivalent of the hydroxy group of the starting material of one of the formulas IA-1 to IA-4. A method for producing a novolak curing agent having an alkoxysilyl group, which is carried out by reacting to achieve this.
【청구항 4【Claim 4
제 2항에 있어서, 상기 제 1 단계는 - 20°C 내지 100°C로 1시간 내지 120시간 동안 반웅시켜 수행되는 알콕시실릴기를 갖는 노볼락 경화제의 제조방법. The method of claim 2, wherein the first step is performed by reacting at -20 ° C to 100 ° C for 1 hour to 120 hours.
[청구항 5】 [Claim 5]
제 2항에 있어서, 상기 제 2 단계는 상기 화학식 IB-1 내지 IB-4 중 하나의 중간생성물의 알케닐 그룹 1당량에 대하여 알콕시실란이 0.1 당량 내지 5 당량이 되도록 반응시켜 수행되는 알콕시실릴기를 갖는 노볼락 경화제의 제조방법. The method of claim 2, wherein the second step is performed by reacting an alkoxysilyl group in an amount of 0.1 to 5 equivalents of alkoxysilane relative to 1 equivalent of an alkenyl group of an intermediate product of formulas IB-1 to IB-4. Method for producing a novolac hardener having.
【청구항 6】 【Claim 6】
거 12항에 있어서, 상기 제 2 단계는 ᅳ 20°C 내지 12CTC로 1시간 내지 72시간 동안 반웅시켜 수행되는 알콕시실릴기를 갖는 노볼락 경화제의 제조방법. The method of claim 12, wherein the second step is carried out by reacting at 20°C to 12CTC for 1 hour to 72 hours.
【청구항 7】 【Claim 7】
임의의 염기 및 임의의 용매 존재하에서 하기 화학식 IA-1 내지 IA-4 중 하나의 출발물질과 하기 화학식 ΠΙΒ의 알콕시실란을 반웅시켜서 화학식 A3의 구조를 갖는 화학식 1—1 내지 1ᅳ4 중 하나의 화합물을 형성하는 알콕시실릴화 단계를 포함하는, 화학식 1-1 내지 1ᅳ4로 구성되는 그룹으로부터 선택되는 어느 하나의 알콕시실릴기를 갖는 노볼락 경화제의 제조방법ᅳ In the presence of any base and any solvent, a starting material of one of the following formulas IA-1 to IA-4 and an alkoxysilane of the following formula ΠΙΒ are reacted to produce one of the formulas 1—1 to 1ᅳ4 having the structure of formula A3. Method for producing a novolak curing agent having any one alkoxysilyl group selected from the group consisting of Formulas 1-1 to 1ᅳ4, including an alkoxysilylation step to form a compound.
[화학식 IAᅳ 1]
Figure imgf000097_0001
[Formula IAᅳ 1]
Figure imgf000097_0001
(상기 화학식 IA-1에서 X는 하기 화학식 2A 내지 2F로 구성되는 그룹 증 하나이다. (In the above formula (IA-1),
Figure imgf000098_0001
Figure imgf000098_0001
Figure imgf000098_0002
Figure imgf000098_0002
Figure imgf000098_0003
Figure imgf000098_0004
Figure imgf000098_0003
Figure imgf000098_0004
96 [화학식 IA-4]
Figure imgf000099_0001
96 [Formula IA-4]
Figure imgf000099_0001
(상기 화학식 IA-4 중, p는 1 또는 2이고, (In Formula IA-4, p is 1 or 2,
Xl읔
Figure imgf000099_0002
이며
Figure imgf000099_0003
, R은 C1-C10의 직쇄 또는 분지쇄상 알킬기이다. )
XL
Figure imgf000099_0002
and
Figure imgf000099_0003
,R is a C1-C10 straight or branched alkyl group. )
(상기 화학식 IA-1 내지 IA— 4에서, n은 1이상의 정수이다. ) (In the above formulas IA-1 to IA-4, n is an integer of 1 or more.)
[화학식 ΙΠΒ] [Chemical formula ΙΠΒ]
0CN-(CH2)m-SiR1R2R3 0CN-(CH 2 ) m -SiR 1 R 2 R 3
(상기 화학식 ΙΠΒ에서, 내지 ¾ 증 적어도 하나는 탄소수 1 내지 5의 직쇄 혹은 분지쇄 알콕시기이고 나머지는 탄소수 1 내지 10의 직쇄 혹은 분지쇄 알킬기이며 , !^은 3 내지 10의 정수이다. ) [화학식 1-1]
Figure imgf000100_0001
(In the above chemical formula ΙΠΒ, at least one of the groups 1 to ¾ is a straight-chain or branched alkoxy group having 1 to 5 carbon atoms, the remainder is a straight-chain or branched alkyl group having 1 to 10 carbon atoms, and !^ is an integer of 3 to 10.) [Formula 1-1]
Figure imgf000100_0001
(상기 식에서, Z는 하기 화학식 1A 내지 1F로 구성되는 그룹 중 하나이다.
Figure imgf000100_0002
(In the above formula, Z is one of the groups consisting of the following formulas 1A to 1F.
Figure imgf000100_0002
1A IB 1C
Figure imgf000100_0003
1A IB 1C
Figure imgf000100_0003
[화학식 1ᅳ2] [Formula 1ᅳ2]
Figure imgf000100_0004
[화학식 1-3]
Figure imgf000100_0004
[Formula 1-3]
Figure imgf000101_0001
Figure imgf000101_0001
[화학식 Iᅳ 4] [Formula Iᅳ 4]
Figure imgf000101_0002
Figure imgf000101_0002
(상기 화학식 1-4에서, p는 1 또는 2이고 (In Formula 1-4, p is 1 or 2 and
ΟΟ
CH ,C.H.,
Figure imgf000101_0003
Figure imgf000101_0003
이며
Figure imgf000101_0004
서 R은 C1-C10의 직쇄 또는 측쇄상 알킬기이다.)
and
Figure imgf000101_0004
Where R is a C1-C10 straight or branched alkyl group.)
(상기 화학식 1-1 내지 Iᅳ 4에서, 적어도 하나의 A는 하기 화학식 A3이고 나머지는 수소이며, n은 1이상의 정수이다.) [화학식 A3] (In the above formulas 1-1 to Iᅳ 4, at least one A is the formula A3 below, the rest are hydrogen, and n is an integer of 1 or more.) [Formula A3]
Figure imgf000102_0001
Figure imgf000102_0001
(상기 화학식 A3에서, 내지 R3중 적어도 하나는 탄소수 1 내지 5의 직쇄 혹은 분지쇄 알콕시기이고, 나머지는 탄소수 1 내지 10의 직쇄 혹은 분지쇄 알킬기이며, m은 3 내지 10의 정수이다. ) (In the above formula A3, at least one of R 3 to R 3 is a straight-chain or branched alkoxy group having 1 to 5 carbon atoms, the remainder is a straight-chain or branched alkyl group having 1 to 10 carbon atoms, and m is an integer of 3 to 10.)
【청구항 8】 【Claim 8】
제 7항에 있어서, 상기 알콕시실릴화 단계는 상기 화학식 I A-1 내지 IA- 4중 하나의 출발물질의 하드록시기 1당량에 대하여 알콕시실란이 0. 1 당량 내지 5 당량이 되도록 반응시켜 수행되는 알콕시실릴기를 갖는 노볼락 경화제의 제조방법. The method of claim 7, wherein the alkoxysilylation step is performed by reacting the alkoxysilane in an amount of 0.1 to 5 equivalents based on 1 equivalent of the hydroxyl group of one of the starting materials of formulas I A-1 to IA-4. A method for producing a novolak curing agent having an alkoxysilyl group.
【청구항 9】 【Claim 9】
제 7항에 있어서, 상기 알콕시실릴화 단계는 - 20°C 내지 120°C로 1시간 내지 72시간 동안 반웅시켜 수행되는 알콕시실릴기를 갖는 노볼락 경화제의 제조방법. The method of claim 7, wherein the alkoxysilylation step is performed by reacting at -20 ° C to 120 ° C for 1 hour to 72 hours.
【청구항 10] [Claim 10]
에폭시 수지 및 하기 화학식 Iᅳ 1 내지 1-4로 구성되는 그룹으로부터 선택되는 적어도 하나의 알콕시실릴기를 갖는 노볼락 경화제를 포함하는 조성물. [화학식 1-1]
Figure imgf000103_0001
A composition comprising an epoxy resin and a novolak curing agent having at least one alkoxysilyl group selected from the group consisting of the following formulas (Ieu) 1 to 1-4. [Formula 1-1]
Figure imgf000103_0001
(상기 식에서, Z는 하기 화학식 1A 내지 1F로 구성되는 그룹 중 하나이다. (In the above formula, Z is one of the groups consisting of the following formulas 1A to 1F.
Figure imgf000103_0002
Figure imgf000103_0002
1A 1B 1C 1A 1B 1C
Figure imgf000103_0003
Figure imgf000103_0003
Figure imgf000104_0001
Figure imgf000104_0001
[화학식 1-4]
Figure imgf000104_0002
[Formula 1-4]
Figure imgf000104_0002
(상기 화학식 1-4에서, p는 1 또는 2이고 (In Formula 1-4, p is 1 or 2 and
Figure imgf000104_0003
이며
Figure imgf000104_0004
R은 Ci-αο의 직쇄 또는 분지쇄상 알킬기이다. )
Figure imgf000104_0003
and
Figure imgf000104_0004
R is a straight or branched alkyl group of Ci-αο. )
(상기 화학식 1-1 내지 1—4에서, (In Formulas 1-1 to 1—4,
적어도 하나의 A는 하기 화학식 A2 또는 A3이고, 적어도 하나가 A2인 경우에 나머지 A는 하기 화학식 B2 또는 수소이고, 적어도 하나가 A3인 경우에, 나머지 A는 수소이며, n은 1이상의 정수이다. ) At least one A is of the following formula A2 or A3, and when at least one is A2 The remaining A is the formula B2 or hydrogen, and when at least one is A3, the remaining A is hydrogen, and n is an integer of 1 or more. )
[화학식 A2] [Formula A2]
-(CH2)m-SiR!R2R3 -(CH 2 ) m -SiR!R 2 R 3
[화학식 A3] [Formula A3]
-C0NH(CH2)m-SiRiR2R3 -C0NH(CH 2 ) m -SiRiR 2 R 3
(상기 화학식 A2 및 A3에서, 내지 ¾ 중 적어도 하나는 탄소수 1 내지 5의 직쇄 혹은 분지쇄 알콕시기이고, 나머지는 탄소수 1 내지 10의 직쇄 혹은 분지쇄 알킬기이며 . m은 3 내지 10의 정수이다. ) (In the above formulas A2 and A3, at least one of ¾ to ¾ is a straight-chain or branched alkoxy group having 1 to 5 carbon atoms, and the remainder is a straight-chain or branched alkyl group having 1 to 10 carbon atoms. m is an integer of 3 to 10. )
[화학식 B2] [Formula B2]
-(CH2) ,-CH=CH2 -(CH 2 ) ,-CH=CH 2
(식 중, 1은 1 내지 8의 정수이다. ) (In the formula, 1 is an integer from 1 to 8.)
【청구항 11】 【Claim 11】
제 10항에 있어서, 상기 에폭시 수지는 글리시딜에테르계 에폭시 수지, 글리시딜계 에폭시 수지, 글리시딜아민계 에폭시 수지, 및 글리시딜에스테르계 에폭시 수지로 구성되는 그룹으로부터 선택되는 적어도 일종인 조성물. The method of claim 10, wherein the epoxy resin is at least one selected from the group consisting of glycidyl ether-based epoxy resin, glycidyl-based epoxy resin, glycidylamine-based epoxy resin, and glycidyl ester-based epoxy resin. Composition.
【청구항 12】 . 【Claim 12】 .
제 11항에 있어서, 상기 에폭시 수지는 코어구조로 비스페놀, 비페닐, 나프탈렌, 벤젠, 티오디페놀, 플루오렌 (fluorene), 안트라센, 이소시아누레이트, 트리페닐메탄, 1,1,2,2-테트라페닐에탄, 테트라페닐메탄, 4,4'- 디아미노디페닐메탄, 아미노페놀, 지환족, 지방족. 또는 노볼락 유니트를 갖는 조성물, The method of claim 11, wherein the epoxy resin has a core structure of bisphenol, biphenyl, naphthalene, benzene, thiodiphenol, fluorene, anthracene, isocyanurate, triphenylmethane, 1, 1, 2, 2. -Tetraphenylethane, tetraphenylmethane, 4,4'-diaminodiphenylmethane, aminophenol, cycloaliphatic, aliphatic. or a composition having a novolak unit,
【청구항 13】 【Claim 13】
제 11항에 있어서, 상기 에폭시 수지는 알콕시실릴기를 갖거나 갖지 않는 에폭시 수지를 포함하는 조성물. The composition of claim 11, wherein the epoxy resin includes an epoxy resin with or without an alkoxysilyl group.
【청구항 14】 【Claim 14】
제 10항에 있어서, 충전제로서 무기입자 및 섬유로 이루어진 그룹으로부터 선택된 적어도 하나를 추가로 포함하는 조성물. The composition according to claim 10, further comprising at least one filler selected from the group consisting of inorganic particles and fibers.
【청구항 15】 . 【Claim 15】.
제 14항에 있어서, 상기 무기입자는 실리카, 지르코니아, 티타니아, 알루미나. 질화규소, 질화알투미늄, 및 실세스퀴옥산으로 구성되는 그룹으로부터 선택되는 적어도 일종인 조성물. The method of claim 14, wherein the inorganic particles are silica, zirconia, titania, or alumina. A composition that is at least one selected from the group consisting of silicon nitride, aluminum nitride, and silsesquioxane.
【청구항 16】 . . 【Claim 16】 . .
제 14항에 있어서, 상기 무기입자는 상기 조성물의 고형분 총 중량을 기준으로 5wt% 내지 95 %로 포함되는 조성물. The composition according to claim 14, wherein the inorganic particles are contained in an amount of 5 wt% to 95 wt% based on the total weight of solid content of the composition.
【청구항 17】 【Claim 17】
제 16항에 있어서. 상기 무기입자는 상기 조성물의 고형분 총 중량을 기준으로 30wt% 내지 95 %로 포함되는 조성물. In clause 16. A composition in which the inorganic particles are contained in an amount of 30 wt% to 95% based on the total weight of solid content of the composition.
【청구항 18] [Claim 18]
제 16항에 있어서, 상기 무기입자는 상기 조성물의 고형분 총 중량을 기준으로 5wt% 내지 60 %로 포함되는 조성물. The composition according to claim 16, wherein the inorganic particles are contained in an amount of 5 wt% to 60% based on the total weight of solid content of the composition.
[청구항 19】 [Claim 19]
제 14항에 있어서, 상기 섬유는 E 유리섬유, T 유리섬유, S 유리섬유, NE 유리섬유, H 유리섬유, 및 석영으로 구성되는 그룹으로부터 선택되는 유리섬유; 및 액정 폴리에스테르 섬유, 폴리에틸렌테레프탈레이트 섬유, 전방향족 섬유, 폴리벤조옥사졸 섬유, 나일론 섬유, 폴리에틸렌 나프탈레이트 섬유, 폴리프로필렌 섬유. 폴리에테르 술폰 섬유. 폴리비닐리덴플로라이드 섬유, 폴리에틸렌 술파이드 섬유, 및 폴리에테르에테르케톤 섬유로 구성되는 그룹으로부터 선택되는 유기 섬유로 구성되는 그룹으로부터 선택되는 적어도 일종인 조성물. The method of claim 14, wherein the fiber is glass fiber selected from the group consisting of E glass fiber, T glass fiber, S glass fiber, NE glass fiber, H glass fiber, and quartz; and liquid crystal polyester fibers, polyethylene terephthalate fibers, wholly aromatic fibers, polybenzoxazole fibers, nylon fibers, polyethylene naphthalate fibers, and polypropylene fibers. Polyether sulfone fiber. A composition that is at least one kind selected from the group consisting of organic fibers selected from the group consisting of polyvinylidene fluoride fibers, polyethylene sulfide fibers, and polyetheretherketone fibers.
【청구항 20] [Claim 20]
제 19항에 있어서, 상기 섬유는 E 유리섬유인 조성물. The composition of claim 19, wherein the fiber is E glass fiber.
【청구항 21】 . 【Claim 21】.
제 19항에 있어서, 상기 섬유는 T 유리섬유인 조성물. The composition of claim 19, wherein the fiber is T glass fiber.
[청구항 22】 [Claim 22]
제 14항에 있어서, 상기 섬유는 상기 조성물의 고형분 총 중량에 대하여 10 wt% 내지 90 %로 포함되는 조성물. The composition of claim 14, wherein the fiber is contained in an amount of 10 wt% to 90% based on the total weight of solid content of the composition.
【청구항 23】 【Claim 23】
제 14항에 있어서, 상기 충전제로서 섬유를 포함하는 경우에, 무기입자를 추가로 포함하는 조성물. The composition according to claim 14, wherein when the filler includes fiber, the composition further includes inorganic particles.
【청구항 24] ' 제 10항에 있어서, 알콕시실릴기 반응촉매를 추가로 포함하는 조성물. [Claim 24] The composition of claim 10, further comprising an alkoxysilyl group reaction catalyst.
【청구항 25】 【Claim 25】
제 24항에 있어서, 상기 알콕시실릴기 반웅촉매는 질산, 황산, 염산, 아세트산, 인산, 암모니아, KOH , NH40H , 아민, 전이 금속 알콕사이드, 및 주석 ( t in) 화합물로 구성되는 그룹으로부터 선택되는 적어도 일종인 조성물. The method of claim 24, wherein the alkoxysilyl group reaction catalyst is selected from the group consisting of nitric acid, sulfuric acid, hydrochloric acid, acetic acid, phosphoric acid, ammonia, KOH, NH 4 OH, amine, transition metal alkoxide, and tin (t in) compound. At least one kind of composition.
【청구항 26】 【Claim 26】
제 24항에 있어서, 상기 반응촉매는 알콕시실릴기를 갖는 에폭시 수지에 대하여 0.01 phr 내지 . 10 phr로 포함되는 조성물. The method of claim 24, wherein the reaction catalyst is used in an amount of 0.01 phr to . A composition comprising 10 phr.
【청구항 27】 【Claim 27】
제 24항에 있어서, 물을 추가적으로 포함하는 조성물. 【청구항 28】 25. The composition of claim 24, further comprising water. 【Claim 28】
제 10항 내지 제 27항 중 어느 한 항의 조성물을 포함하는 전자재료. I청구항 】 An electronic material comprising the composition of any one of claims 10 to 27. IClaim 】
제 10항 내지 제 27항 중 어느 한 항의 조성물을 포함하는 기판. , 【청구항 30】 A substrate comprising the composition of any one of claims 10 to 27. , 【Claim 30】
제 10항 내지 제 27항 중 어느 한 항의 조성물을 포함하는 필름. 【청구항 31】 A film comprising the composition of any one of claims 10 to 27. 【Claim 31】
제 10항 내지 제 27항 중 어느 한 항의 조성물로 이루어진 기재층 상에 금속층을 포함하는 적층판. 【청구항 32】 A laminate comprising a metal layer on a base layer made of the composition of any one of claims 10 to 27. 【Claim 32】
제 31항의 적충판을 포함하는 인쇄배선판. 【청구항 33】 Printed wiring board including the charging board of clause 31. 【Claim 33】
제 32항의 인쇄배선판을 포함하는 반도체 장치 . [청구항 34】 A semiconductor device comprising the printed wiring board of claim 32. [Claim 34]
제 10항 내지 제 27항 중 어느 한 항의 조성물을 포함하는 반도체 재료. 【청구항 35] A semiconductor material comprising the composition of any one of claims 10 to 27. [Claim 35]
제 34항의 반도체 패키징 재료를 포함하는 반도체 장치. 【청구항 36】 A semiconductor device comprising the semiconductor packaging material of claim 34. 【Claim 36】
제 10항 내지 제 27항 증 어느 한 항의 조성물을 포함하는 접착제. 【청구항 37】 An adhesive comprising the composition of any one of claims 10 to 27. 【Claim 37】
제 10항 내지 제 27항 중 어느 한 항의 조성물을 포함하는 도료ᅳ 【청구항 38】 Paint containing the composition of any one of claims 10 to 27 - [Claim 38]
제 10항 내지 제 27항 중 어느 한 항의 조성물을 포함하는 복합재료. 【청구항 39】 A composite material comprising the composition of any one of claims 10 to 27. 【Claim 39】
제 10항 내지 제 27항 중 어느 한 항의 조성물을 포함하는 프리프레그'. 【청구항 40】 ‘Prepreg’ comprising the composition of any one of claims 10 to 27. 【Claim 40】
제 39항의 프리프레그에 금속층이 배치된 적충판. 【청구항 41】 A red plate in which a metal layer is disposed on the prepreg of item 39. 【Claim 41】
제 10항 내지 제 27항 중 어느 한 항의 조성물의 경화물. 【청구항 42】 A cured product of the composition of any one of claims 10 to 27. 【Claim 42】
제 41항에 있어서, 열팽창계수가 60ppm/ °C 이하인 조성물의 경화물. Γ청구항 43】 The cured product of claim 41, wherein the composition has a thermal expansion coefficient of 60ppm/ ° C or less. ΓClaim 43]
제 41항에 있어서, 유리전이은도가 100°C 보다 높거나 유리전이온도를 나타내지 않는 조성물의 경화물. The cured product of claim 41, wherein the cured composition has a glass transition degree higher than 100 ° C or does not exhibit a glass transition temperature.
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JP2020522532A (en) * 2017-06-05 2020-07-30 コリア インスティチュート オブ インダストリアル テクノロジー Compound having alkoxysilyl group and active ester group, method for producing the same, composition containing the same and use
US11214583B2 (en) 2017-06-05 2022-01-04 Korea Institute Of Industrial Technology Compound having alkoxysilyl group and active ester group, method for preparing same, composition comprising same, and use

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