WO2015102149A1 - Composition for forming resin layer and flexible display substrate using the same - Google Patents
Composition for forming resin layer and flexible display substrate using the same Download PDFInfo
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- WO2015102149A1 WO2015102149A1 PCT/KR2014/001131 KR2014001131W WO2015102149A1 WO 2015102149 A1 WO2015102149 A1 WO 2015102149A1 KR 2014001131 W KR2014001131 W KR 2014001131W WO 2015102149 A1 WO2015102149 A1 WO 2015102149A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/068—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0041—Optical brightening agents, organic pigments
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/05—Alcohols; Metal alcoholates
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/10—Esters; Ether-esters
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2383/04—Polysiloxanes
Definitions
- the present invention relates to a composition for forming a resin layer, a flexible display substrate using the same, and a manufacturing method thereof.
- CTR cathode ray tube
- LCD liquid crystal displays
- OLED organic light emitting diodes
- a plastic substrate is an essential material necessary for realizing plastic flat panel displays or next-generation displays, and a demand for a plastic substrate is created in accordance with the development of the flexible display industry. Comparing the physical properties of a plastic substrate for realizing flexible displays with those of a conventional glass substrate, a plastic substrate is excellent in terms of weight, formability, non-breakability, design, roll-to-roll processability and the like, which are essential characteristics of flexible displays. However, in order for an optical plastic film to be used as a plastic substrate, it is required to improve the plastic substrate's physical properties, such as chemical resistance, thermal characteristics, air barrier properties and the like, which are poorer than those of a glass substrate.
- an object of the present invention is to provide a composition for forming a resin layer, which includes a silicon-based binder and an acrylic monomer or an epoxy resin, a flexible display substrate having improved heat resistance, which is manufactured using the composition, and a method of manufacturing the flexible display substrate.
- an aspect of the present invention provides a composition for forming a resin layer, including: a silicon-based binder having a structure of Formula 1 below; at least one compound selected from the group consisting of an acrylic monomer and an epoxy resin; and an initiator:
- R 1 to R 4 are the same as or different from one another, and are each independently an alkyl group of C 1 to C 12 , an allyl group of C 2 to C 12 , an aralkyl group of C 2 to C 12 or an alkenyl group of C 2 to C 12 ;
- R 5 and R 6 are the same as or different from each other, and are each independently hydrogen or a vinyl group; and S is an integer of 2 to 1000.
- the mixing ratio of the silicon-based binder and the compound may be 7: 3 to 1: 9 by weight.
- composition may further include: 9.5 to 70 wt% of the silicon-based binder; 30 to 90 wt% of the at least one compound selected from the group consisting of an acrylic monomer and an epoxy resin; and 0.5 to 20 wt% of the initiator.
- the acrylic monomer may be at least one selected from the group consisting of bisphenol-A ethylene oxide diacrylate, bisphenol-A ethylene oxide dimethacrylate, bisphenol-A ethoxylate diacrylate, bisphenol-A ethoxylate dimethacrylate, bisphenol-A polyethoxylate diacrylate, bisphenol-A diacrylate, bisphenol-S diacrylate, dicyclopentadienyl diacrylate, pentaerythritol triacrylate, tris(2-hydroxyethyl)isocyanurate triacrylate, pentaerythritol tetracrylate, bisphenol-A dimethacrylate, bisphenol-S dimethacrylate, dicyclopentadienyl dimethacrylate, pentaerythritol trimethacrylate, tris(2-hydroxyethyl)isocyanurate trimethacrylate, and pentaerythritol tetramethacrylate.
- the epoxy resin may be at least one selected from the group consisting of a glycidyl epoxy resin and an alicyclic epoxy resin.
- composition may further include a surfactant.
- composition may further include a solvent.
- Another aspect of the present invention provides flexible display substrate, including a glass fiber sheet impregnated with the composition.
- Still another aspect of the present invention provides a method of manufacturing a flexible display substrate including a glass fiber sheet and a resin layer formed on both sides of the glass fiber sheet, including the steps of: impregnating a glass fiber sheet with the composition for a resin layer of claim 1; and UV-irradiating the glass fiber sheet impregnated with the composition to UV-cure the glass fiber sheet.
- the method may include the steps of: impregnating a glass fiber sheet with the composition for a resin layer of; laminating a release film on both sides of the glass fiber sheet impregnated with the composition; UV-irradiating the glass fiber sheet laminated with the release film to UV-cure the glass fiber sheet; and separating the release film from the UV-cured glass fiber sheet.
- the method may further include the step of heating the UV-cured glass fiber sheet to 200 to 300°C to thermally cure the glass fiber sheet, after the step of UV-curing the glass fiber sheet.
- this flexible display substrate When a flexible display substrate is manufactured using the composition for forming a resin layer according to the present invention, this flexible display substrate has excellent formability, is transparent and flexible, and has excellent thermal expansibility, excellent heat resistance and excellent flame retardance. Therefore, this flexible display substrate can replace a conventional glass substrate.
- the present invention provides a composition for forming a resin layer, including: a silicon-based binder having a structure of Formula 1 below; at least one compound selected from the group consisting of an acrylic monomer and an epoxy resin; and an initiator:
- R 1 to R 4 are the same as or different from one another, and are each independently an alkyl group of C 1 to C 12 , an allyl group of C 2 to C 12 , an aralkyl group of C 2 to C 12 or an alkenyl group of C 2 to C 12 ;
- R 5 and R 6 are the same as or different from each other, and are each independently hydrogen or a vinyl group; and S is an integer of 2 to 1000.
- the acrylic monomer may be a 2-functional or more acrylic or methacrylic compound.
- the acrylic monomer may be at least one selected from the group consisting of bisphenol-A ethylene oxide diacrylate, bisphenol-A ethylene oxide dimethacrylate, bisphenol-A ethoxylate diacrylate, bisphenol-A ethoxylate dimethacrylate, bisphenol-A polyethoxylate diacrylate, bisphenol-A diacrylate, bisphenol-S diacrylate, dicyclopentadienyl diacrylate, pentaerythritol triacrylate, tris(2-hydroxyethyl)isocyanurate triacrylate, pentaerythritol tetracrylate, bisphenol-A dimethacrylate, bisphenol-S dimethacrylate, dicyclopentadienyl dimethacrylate, pentaerythritol trimethacrylate, tris(2-hydroxyethyl)iso
- the epoxy resin is referred to as a resin having at least one epoxy group.
- the epoxy group may be a glycidyl epoxy resin or an alicyclic epoxy resin.
- the glycidyl epoxy resin may be a bisphenol-A epoxy resin, a bisphenol-F epoxy resin, a bisphenol-S epoxy resin, a naphthalene-type epoxy resin or a hydrogenated compound thereof; an epoxy resin having a dicyclopentadiene backbone; an epoxy resin having a triglycidyl isocyanurate backbone; an epoxy resin having a cardo backbone; or an epoxy resin having a polysiloxane backbone.
- the alicyclic epoxy resin may be 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexanecarboxylate, 1,2,8,9-diepoxylimonene, ⁇ -caprolactone whose both ends are respectively ester-bonded with 3,4-epoycyclohexylmethanol and 3,4-epoxycyclohexane carboxylic acid, or an epoxy resin having a hydrogenated bisphenol-A backbone.
- the mixing ratio of the silicon-based binder and the compound may be 7: 3 to 1: 9 by weight. It is preferred that the silicon-based binder having high flexibility and heat resistance be used alone. However, the composition including only the silicon-based resin cannot be applied to a roll-to-roll process for attaching a release film unable to resist a temperature of 150°C or higher to both sides of a glass fiber sheet impregnated with the composition and curing the glass fiber sheet coated with the release film, because the thermal cure temperature thereof is 150°C or higher.
- the silicon-based binder when the silicon-based binder is mixed with an acrylic monomer or an epoxy resin and then used, a release film is attached to both sides of a glass fiber sheet impregnated with the composition, the glass fiber sheet is photocured, the release film is removed from the glass fiber sheet, and then the glass fiber sheet is thermally photocured.
- the release film can smoothly move along a roll without being sticky when this release film is removed before thermal curing after photocuring during a roll-to-roll process.
- the mixing ratio of the silicon-based binder and the compound exceeds 7:3, the release film cannot smoothly move along a roll without being sticky when this release film is removed before thermal curing after photocuring during a roll-to-roll process.
- the mixing ratio of the compound and the silicon-based binder does not reach 1:9, the content of the silicon-based binder in the composition is extremely low and thus the effects of improvement of flexibility and heat resistance cannot be expected.
- composition for forming a resin layer according to the present invention may further include an initiator for curing the above-mentioned silicon-based binder and compound.
- the initiator may be a photopolymerization initiator or thermopolymerization initiator.
- the photopolymerization initiator is referred to as a compound causing decomposition or bonding using lithographic exposure and creating active species capable of initiating the polymerization of the silicon-based binder with the acylic monomer or epoxy resin such as radical, anion, cation or the like.
- Examples of the photopolymerization initiator may include: acetophenone compounds, such as 4-(2-hydroxyethoxy)phenyl(2-hydroxy-2-propyl)ketone, ⁇ -hydroxy- ⁇ , ⁇ '-dimethylacetophenone, methoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, and 2-methyl-1-[4-(methylthio)-phenyl]-2-morpholinopropane-1; benzoin ether compounds, such as benzoin ethyl ether, benzoin isopropyl ether, and anisyl methy ether; ⁇ -ketol compounds, such as 2-methyl-2-hydroxypropiophenone; ketal compounds, such as benzyl dimethyl ketal; aromatic sulfonyl chloride compounds, such as 2-naphthalenesulfonyl chloride; photoactive oxime
- thermopolymerization initiator may include: organic peroxides, such as benzoyl peroxide, t-butyl perbenzoate, cumene hydroperoxide, diisopropyl peroxydicarbonate, di-n-propyl peroxydicarbonate, di(2-ethoxyethyl) peroxydicarbonate, t-butyl peroxyneodecanoate, t-butyl peroxypivalate, (3,5,5-trimethylhexanoyl) peroxide, dipropionyl peroxide, and diacetyl peroxide; and azo compounds, such as 2,2'-azobisisobutyronitrile, 2,2'-azobis(2-methylbutyronitrile, 1,1'-azobis(cyclohexane-1-carbonitrile), 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2'-azobis(2,4-dimethyl-4-methoxyvaleronitrile
- the composition for forming a resin layer may include 9.5 to 70 wt% of the silicon-based binder; 30 to 90 wt% of the at least one compound selected from the group consisting of an acrylic monomer and an epoxy resin; and 0.5 to 20 wt% of the initiator.
- the contents of the silicon-based binder, compound and initiator in the composition deviate from the above ranges, respectively, the heat resistance, thermal expansibility and flame retardance of the composition may be deteriorated.
- the composition for forming a resin layer may further include a surfactant and a solvent for the purpose of realizing specific functions.
- the surfactant is effective in modifying the surface of a resin layer, and, preferably, may be a silicon-based surfactant or a fluorine-based surfactant.
- the silicon-based surfactant may include a silicon group and an ionic group.
- the ionic group may be an anionic group. Specific examples of the anionic group may include carboxylate, sulfonate, phosphonate and the like.
- the surfactant In order for the surfactant to be converted into fumes during UV-curing or thermal curing in the process of manufacturing a flexible display substrate, it is preferred that the surfactant have a solid content of 80 to 100 wt% based 100 wt% of the total amount thereof and have a flash point of 100°C or higher.
- the surfactant be included in an amount of 0.005 to 5 parts by weight, preferably 0.01 to 1 parts by weight, based on 100 parts by weight of the solid content of the composition for forming a resin layer.
- the surfactant is included in an amount of less than 0.005 parts by weight, the effect of modifying the surface of a resin layer may be insufficient, and, when the surfactant is included in an amount of more than 5 parts by weight, the heat resistance of a resin layer may be deteriorated.
- the solvent may be selected from among ketones, ethers, esters, alcohols, hydrocarbons, acetonitrile, nitromethane, water, and mixtures thereof.
- the solvent may include: ketones, such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and the like; ethers, such as tetrahydrofuran, 1,4-dioxane, 1,2-dimethoxyethane and the like; esters, such as ethyl acetate, ethoxyethyl acetate and the like; alcohols, such as methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, 2-methyl-1-propanol, 2-methyl-2-propanol, 2-ethoxyethanol, 1-methoxy-2-propanol, 2-butoxyethanol and the like; hydrocarbons, such as n-hexane,
- the method of manufacturing a flexible display substrate may include the steps of: impregnating a glass fiber sheet with the composition for a resin layer; and UV-irradiating the glass fiber sheet impregnated with the composition to UV-cure the glass fiber sheet.
- the intensity of UV-irradiation may be changed depending on the kind of components included in the composition for forming a resin layer and the amount of the photopolymerization initiator. Further, it is preferred that a release film be laminated on both sides of the glass fiber sheet impregnated with the composition before the step of UV-curing the glass fiber sheet, and that the release film be separated from the both side of the glass fiber sheet after the step of UV-curing the glass fiber sheet.
- the temperature and pressure of a laminating machine may be adjusted according to the purpose of the present invention. As such, when the glass fiber sheet is laminated with the release film and then UV-cured, it is easy to uniformly control the final thickness of a resin layer formed after UV-irradiation.
- the method may further include the step of heating the UV-cured glass fiber sheet to thermally cure the glass fiber sheet, after the step of UV-curing the glass fiber sheet, depending on the kind of the composition applied to the glass fiber sheet.
- the thermal curing temperature may be 200 to 300°C
- the thermal curing time may be properly adjusted in consideration of the kind of the composition and the thermal curing temperature.
- the flexible substrate may include a glass fiber sheet impregnated with the composition for forming a resin layer.
- the flexible display substrate is manufactured by the above method, and may have a thickness of 10 to 200 um.
- the flexible display substrate is characterized in that it has excellent flexibility and heat resistance.
- this flexible display substrate may have a thermal expansion coefficient of 10 ppm/°C or less.
- a glass fiber sheet having a thickness of 40 to 60 um was impregnated with the composition for forming a resin layer at room temperature for 1 hour. Thereafter, a release film was laminated on both sides of the glass fiber sheet impregnated with the composition using a laminating machine, and then the glass fiber sheet laminated with the release film was UV-cured using a UV-exposing machine. Subsequently, the release film was removed from the both sides of the UV-cured glass fiber sheet, and then this glass fiber sheet was thermally cured, thereby finally obtaining a substrate.
- a glass fiber sheet having a thickness of 40 to 60 um was impregnated with the composition for forming a resin layer at room temperature for 1 hour. Thereafter, a release film was laminated on both sides of the glass fiber sheet impregnated with the composition using a laminating machine, and then the glass fiber sheet laminated with the release film was UV-cured using a UV-exposing machine. Subsequently, the release film was removed from the both sides of the UV-cured glass fiber sheet, and then this glass fiber sheet was thermally cured, thereby finally obtaining a substrate.
- compositions for forming a resin layer of Examples 1 and 2 25 wt% of bisphenol-A ethoxylate diacrylate, 15 wt% of ethoxylated bisphenol fluorene diacrylate (manufacturer: Hannong Chemical Co., Ltd., product name: BPF-022), 50 wt% of ethoxylated pentaerythritol tetracrylate (manufacturer: Hannong Chemical Co., Ltd., product name: PE-044) and 10 wt% of fluorene acrylate having a bivalent functional group (manufacturer: Miwon Chemical Co., Ltd., product name: HR-6082) were first mixed to obtain a mixture.
- the substrates of Examples 1 and 2 and Comparative Example 1 were first heated from room temperature to 330°C at a heating rate of 10 °C/min under an N 2 atmosphere of a thermo-mechanical analyzer (TMA), were cooled from 330°C to room temperature at a cooling rate of 5 °C/min, and were then second heated from room temperature to 330°C at a heating rate of 10 °C/min.
- TMA thermo-mechanical analyzer
- the CTEs of these substrates were measured at 50°C intervals from room temperature to 330°C, and then the average value thereof was calculated.
- each of the substrates of Examples 1 and 2 and Comparative Example 1 was heated from room temperature to 150°C at a heating rate of 10 °C/min under an N 2 atmosphere of a thermo-gravimetric analyzer (TGA), and then maintained at 150°C for 10 minutes. Then, each of the substrates was heated cooled from 150°C to 300°C at a heating rate of 10 °C/min, and was then maintained at 300°C for 1 hour and 10 minutes. The weight loss (%) thereof, which had been generated for 1 hour from 2 minutes to 62 minutes after it reached 300°C, was measured.
- TGA thermo-gravimetric analyzer
- the ⁇ Ra (roughness) of each of the substrates of Examples 1 and 2 and Comparative Example 1 was evaluated by measuring the surface roughness of each substrate having an area of 1mm x 1mm before and after heat treatment (250°C/10min) using a 10x magnification lens as a 3D profiler.
- the CTE of the substrate of Comparative Example 1 is 14 ppm/°C or less, whereas that of the Example 1 is 7 ppm/°C or less and that of Example 2 is 9 ppm/°C or less, and that the weight loss of the substrate of Comparative Example 1 is 1.5% or less, whereas that of Example 1 is 1.0% or less and that of Example 2 is 1.2% or less.
- the ⁇ Ra of the substrate of Comparative Example 1 is 600 nm or less, whereas that of Example 1 is 100 nm or less and that of Example 2 is 200 nm or less.
- this flexible display substrate When a flexible display substrate is manufactured using the composition for forming a resin layer according to the present invention, this flexible display substrate has excellent formability, is transparent and flexible, and has excellent thermal expansibility, excellent heat resistance and excellent flame retardance. Therefore, this flexible display substrate can replace a conventional glass substrate.
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Abstract
Disclosed herein is a composition for forming a resin layer, including: a silicon-based binder; at least one compound selected from the group consisting of an acrylic monomer and an epoxy resin; and an initiator. When a flexible display substrate is manufactured using the composition for forming a resin layer, this flexible display substrate has excellent formability, is transparent and flexible, and has excellent thermal expansibility, excellent heat resistance and excellent flame retardance. Therefore, this flexible display substrate can replace a conventional glass substrate.
Description
The present invention relates to a composition for forming a resin layer, a flexible display substrate using the same, and a manufacturing method thereof.
Recently, in display methods, the use of conventional cathode ray tube (CRT) displays has switched to flat panel displays, such as plasma display panels (PDPs), liquid crystal displays (LCDs), organic light emitting diodes (OLEDs) and the like. Particularly, research into flat panel displays has been actively conducted such that they can be realized into flexible displays in the future.
Meanwhile, a plastic substrate is an essential material necessary for realizing plastic flat panel displays or next-generation displays, and a demand for a plastic substrate is created in accordance with the development of the flexible display industry. Comparing the physical properties of a plastic substrate for realizing flexible displays with those of a conventional glass substrate, a plastic substrate is excellent in terms of weight, formability, non-breakability, design, roll-to-roll processability and the like, which are essential characteristics of flexible displays. However, in order for an optical plastic film to be used as a plastic substrate, it is required to improve the plastic substrate's physical properties, such as chemical resistance, thermal characteristics, air barrier properties and the like, which are poorer than those of a glass substrate.
For this purpose, there was proposed a method of impregnating a glass fiber sheet with resin. However, when a conventional film impregnated with only acrylic resin or epoxy resin is used, there are problems in that it is difficult to apply this film to a high-temperature process because it has poor heat resistance and in that it is difficult to apply this film to a substrate for flexible displays because it is brittle.
Accordingly, the present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a composition for forming a resin layer, which includes a silicon-based binder and an acrylic monomer or an epoxy resin, a flexible display substrate having improved heat resistance, which is manufactured using the composition, and a method of manufacturing the flexible display substrate.
In order to accomplish the above object, an aspect of the present invention provides a composition for forming a resin layer, including: a silicon-based binder having a structure of Formula 1 below; at least one compound selected from the group consisting of an acrylic monomer and an epoxy resin; and an initiator:
[Formula 1]
wherein R1 to R4 are the same as or different from one another, and are each independently an alkyl group of C1 to C12, an allyl group of C2 to C12, an aralkyl group of C2 to C12 or an alkenyl group of C2 to C12; R5 and R6 are the same as or different from each other, and are each independently hydrogen or a vinyl group; and S is an integer of 2 to 1000.
Here, the mixing ratio of the silicon-based binder and the compound may be 7: 3 to 1: 9 by weight.
Further, the composition may further include: 9.5 to 70 wt% of the silicon-based binder; 30 to 90 wt% of the at least one compound selected from the group consisting of an acrylic monomer and an epoxy resin; and 0.5 to 20 wt% of the initiator.
Further, the acrylic monomer may be at least one selected from the group consisting of bisphenol-A ethylene oxide diacrylate, bisphenol-A ethylene oxide dimethacrylate, bisphenol-A ethoxylate diacrylate, bisphenol-A ethoxylate dimethacrylate, bisphenol-A polyethoxylate diacrylate, bisphenol-A diacrylate, bisphenol-S diacrylate, dicyclopentadienyl diacrylate, pentaerythritol triacrylate, tris(2-hydroxyethyl)isocyanurate triacrylate, pentaerythritol tetracrylate, bisphenol-A dimethacrylate, bisphenol-S dimethacrylate, dicyclopentadienyl dimethacrylate, pentaerythritol trimethacrylate, tris(2-hydroxyethyl)isocyanurate trimethacrylate, and pentaerythritol tetramethacrylate.
Further, the epoxy resin may be at least one selected from the group consisting of a glycidyl epoxy resin and an alicyclic epoxy resin.
Further, the composition may further include a surfactant.
Further, the composition may further include a solvent.
Another aspect of the present invention provides flexible display substrate, including a glass fiber sheet impregnated with the composition.
Still another aspect of the present invention provides a method of manufacturing a flexible display substrate including a glass fiber sheet and a resin layer formed on both sides of the glass fiber sheet, including the steps of: impregnating a glass fiber sheet with the composition for a resin layer of claim 1; and UV-irradiating the glass fiber sheet impregnated with the composition to UV-cure the glass fiber sheet.
The method may include the steps of: impregnating a glass fiber sheet with the composition for a resin layer of; laminating a release film on both sides of the glass fiber sheet impregnated with the composition; UV-irradiating the glass fiber sheet laminated with the release film to UV-cure the glass fiber sheet; and separating the release film from the UV-cured glass fiber sheet.
The method may further include the step of heating the UV-cured glass fiber sheet to 200 to 300℃ to thermally cure the glass fiber sheet, after the step of UV-curing the glass fiber sheet.
When a flexible display substrate is manufactured using the composition for forming a resin layer according to the present invention, this flexible display substrate has excellent formability, is transparent and flexible, and has excellent thermal expansibility, excellent heat resistance and excellent flame retardance. Therefore, this flexible display substrate can replace a conventional glass substrate.
Hereinafter, the present invention will be described in detail.
The present invention provides a composition for forming a resin layer, including: a silicon-based binder having a structure of Formula 1 below; at least one compound selected from the group consisting of an acrylic monomer and an epoxy resin; and an initiator:
[Formula 1]
wherein R1 to R4 are the same as or different from one another, and are each independently an alkyl group of C1 to C12, an allyl group of C2 to C12, an aralkyl group of C2 to C12 or an alkenyl group of C2 to C12; R5 and R6 are the same as or different from each other, and are each independently hydrogen or a vinyl group; and S is an integer of 2 to 1000.
In the composition for forming a resin layer, the acrylic monomer may be a 2-functional or more acrylic or methacrylic compound. In this case, the acrylic monomer may be at least one selected from the group consisting of bisphenol-A ethylene oxide diacrylate, bisphenol-A ethylene oxide dimethacrylate, bisphenol-A ethoxylate diacrylate, bisphenol-A ethoxylate dimethacrylate, bisphenol-A polyethoxylate diacrylate, bisphenol-A diacrylate, bisphenol-S diacrylate, dicyclopentadienyl diacrylate, pentaerythritol triacrylate, tris(2-hydroxyethyl)isocyanurate triacrylate, pentaerythritol tetracrylate, bisphenol-A dimethacrylate, bisphenol-S dimethacrylate, dicyclopentadienyl dimethacrylate, pentaerythritol trimethacrylate, tris(2-hydroxyethyl)isocyanurate trimethacrylate, and pentaerythritol tetramethacrylate.
In the composition for forming a resin layer, the epoxy resin is referred to as a resin having at least one epoxy group. For example, the epoxy group may be a glycidyl epoxy resin or an alicyclic epoxy resin.
The glycidyl epoxy resin may be a bisphenol-A epoxy resin, a bisphenol-F epoxy resin, a bisphenol-S epoxy resin, a naphthalene-type epoxy resin or a hydrogenated compound thereof; an epoxy resin having a dicyclopentadiene backbone; an epoxy resin having a triglycidyl isocyanurate backbone; an epoxy resin having a cardo backbone; or an epoxy resin having a polysiloxane backbone.
The alicyclic epoxy resin may be 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexanecarboxylate, 1,2,8,9-diepoxylimonene, ε-caprolactone whose both ends are respectively ester-bonded with 3,4-epoycyclohexylmethanol and 3,4-epoxycyclohexane carboxylic acid, or an epoxy resin having a hydrogenated bisphenol-A backbone.
In the composition for forming a resin layer, the mixing ratio of the silicon-based binder and the compound may be 7: 3 to 1: 9 by weight. It is preferred that the silicon-based binder having high flexibility and heat resistance be used alone. However, the composition including only the silicon-based resin cannot be applied to a roll-to-roll process for attaching a release film unable to resist a temperature of 150℃ or higher to both sides of a glass fiber sheet impregnated with the composition and curing the glass fiber sheet coated with the release film, because the thermal cure temperature thereof is 150℃ or higher. Therefore, when the silicon-based binder is mixed with an acrylic monomer or an epoxy resin and then used, a release film is attached to both sides of a glass fiber sheet impregnated with the composition, the glass fiber sheet is photocured, the release film is removed from the glass fiber sheet, and then the glass fiber sheet is thermally photocured. In the case where the composition ratio of the silicon-based binder and the acrylic monomer or the epoxy resin is appropriately adjusted, the release film can smoothly move along a roll without being sticky when this release film is removed before thermal curing after photocuring during a roll-to-roll process. Therefore, when the mixing ratio of the silicon-based binder and the compound exceeds 7:3, the release film cannot smoothly move along a roll without being sticky when this release film is removed before thermal curing after photocuring during a roll-to-roll process. In contrast, when the mixing ratio of the compound and the silicon-based binder does not reach 1:9, the content of the silicon-based binder in the composition is extremely low and thus the effects of improvement of flexibility and heat resistance cannot be expected.
The composition for forming a resin layer according to the present invention may further include an initiator for curing the above-mentioned silicon-based binder and compound. The initiator may be a photopolymerization initiator or thermopolymerization initiator.
In the present invention, the photopolymerization initiator is referred to as a compound causing decomposition or bonding using lithographic exposure and creating active species capable of initiating the polymerization of the silicon-based binder with the acylic monomer or epoxy resin such as radical, anion, cation or the like. Examples of the photopolymerization initiator may include: acetophenone compounds, such as 4-(2-hydroxyethoxy)phenyl(2-hydroxy-2-propyl)ketone, α-hydroxy-α,α'-dimethylacetophenone, methoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, and 2-methyl-1-[4-(methylthio)-phenyl]-2-morpholinopropane-1; benzoin ether compounds, such as benzoin ethyl ether, benzoin isopropyl ether, and anisyl methy ether; α-ketol compounds, such as 2-methyl-2-hydroxypropiophenone; ketal compounds, such as benzyl dimethyl ketal; aromatic sulfonyl chloride compounds, such as 2-naphthalenesulfonyl chloride; photoactive oxime compounds, such as 1-phenone-1,1-propandione-2-(o-ethoxycarbonyl)oxime; benzophenone compounds, such as benzophenone, benzoyl benzoic acid, 3,3'-dimethyl-4-methoxybenzophenone, and 3,3',4,4'-tetra(t-butylperoxycarbonyl)benzophenone; diphenyl(2,4,6-trimethylbenzoyl phosphine oxide; and methylbenzoyl formate.
Examples of the thermopolymerization initiator may include: organic peroxides, such as benzoyl peroxide, t-butyl perbenzoate, cumene hydroperoxide, diisopropyl peroxydicarbonate, di-n-propyl peroxydicarbonate, di(2-ethoxyethyl) peroxydicarbonate, t-butyl peroxyneodecanoate, t-butyl peroxypivalate, (3,5,5-trimethylhexanoyl) peroxide, dipropionyl peroxide, and diacetyl peroxide; and azo compounds, such as 2,2'-azobisisobutyronitrile, 2,2'-azobis(2-methylbutyronitrile, 1,1'-azobis(cyclohexane-1-carbonitrile), 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2'-azobis(2,4-dimethyl-4-methoxyvaleronitrile), dimethyl-2,2'-azobis(2-methylpropionate), 4,4'-azobis(4-cyanovalerate), 2,2'-azobis(2-hydroxymethylpropionitrile), and 2,2'-azobis[2-(2-imidazoline-2-yl)propane].
The composition for forming a resin layer may include 9.5 to 70 wt% of the silicon-based binder; 30 to 90 wt% of the at least one compound selected from the group consisting of an acrylic monomer and an epoxy resin; and 0.5 to 20 wt% of the initiator. When the contents of the silicon-based binder, compound and initiator in the composition deviate from the above ranges, respectively, the heat resistance, thermal expansibility and flame retardance of the composition may be deteriorated.
In the present invention, if necessary, the composition for forming a resin layer may further include a surfactant and a solvent for the purpose of realizing specific functions.
The surfactant is effective in modifying the surface of a resin layer, and, preferably, may be a silicon-based surfactant or a fluorine-based surfactant. The silicon-based surfactant may include a silicon group and an ionic group. The ionic group may be an anionic group. Specific examples of the anionic group may include carboxylate, sulfonate, phosphonate and the like.
In order for the surfactant to be converted into fumes during UV-curing or thermal curing in the process of manufacturing a flexible display substrate, it is preferred that the surfactant have a solid content of 80 to 100 wt% based 100 wt% of the total amount thereof and have a flash point of 100℃ or higher.
Further, it is preferred that the surfactant be included in an amount of 0.005 to 5 parts by weight, preferably 0.01 to 1 parts by weight, based on 100 parts by weight of the solid content of the composition for forming a resin layer. When the surfactant is included in an amount of less than 0.005 parts by weight, the effect of modifying the surface of a resin layer may be insufficient, and, when the surfactant is included in an amount of more than 5 parts by weight, the heat resistance of a resin layer may be deteriorated.
The solvent may be selected from among ketones, ethers, esters, alcohols, hydrocarbons, acetonitrile, nitromethane, water, and mixtures thereof. Examples of the solvent may include: ketones, such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and the like; ethers, such as tetrahydrofuran, 1,4-dioxane, 1,2-dimethoxyethane and the like; esters, such as ethyl acetate, ethoxyethyl acetate and the like; alcohols, such as methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 2-butanol, 2-methyl-1-propanol, 2-methyl-2-propanol, 2-ethoxyethanol, 1-methoxy-2-propanol, 2-butoxyethanol and the like; hydrocarbons, such as n-hexane, n-heptane, iso-octane, benzene, toluene, xylene, gasoline, diesel, kerosene and the like; acetonitrile; nitromethane; and water. These solvents may be used independently or in a mixture of two or more.
The method of manufacturing a flexible display substrate may include the steps of: impregnating a glass fiber sheet with the composition for a resin layer; and UV-irradiating the glass fiber sheet impregnated with the composition to UV-cure the glass fiber sheet.
In the step of UV-curing the glass fiber sheet, the intensity of UV-irradiation may be changed depending on the kind of components included in the composition for forming a resin layer and the amount of the photopolymerization initiator. Further, it is preferred that a release film be laminated on both sides of the glass fiber sheet impregnated with the composition before the step of UV-curing the glass fiber sheet, and that the release film be separated from the both side of the glass fiber sheet after the step of UV-curing the glass fiber sheet. At the time of laminating the release film, the temperature and pressure of a laminating machine may be adjusted according to the purpose of the present invention. As such, when the glass fiber sheet is laminated with the release film and then UV-cured, it is easy to uniformly control the final thickness of a resin layer formed after UV-irradiation.
Further, the method may further include the step of heating the UV-cured glass fiber sheet to thermally cure the glass fiber sheet, after the step of UV-curing the glass fiber sheet, depending on the kind of the composition applied to the glass fiber sheet. In this case, the thermal curing temperature may be 200 to 300℃, and the thermal curing time may be properly adjusted in consideration of the kind of the composition and the thermal curing temperature. As such, in the step of thermal curing, the insufficiently UV-cured glass fiber sheet formed in the step of UV-curing is further thermally cured to sufficiently cure the glass fiber sheet, thus improving the heat resistance of a substrate as a final product.
The flexible substrate may include a glass fiber sheet impregnated with the composition for forming a resin layer.
The flexible display substrate is manufactured by the above method, and may have a thickness of 10 to 200 um.
The flexible display substrate is characterized in that it has excellent flexibility and heat resistance. For example, this flexible display substrate may have a thermal expansion coefficient of 10 ppm/℃ or less.
Hereinafter, the present invention will be described in more detail with reference to the following Examples, Comparative Example and Experimental Example. However, these Examples are set forth to illustrate the present invention, and the scope of the invention is not limited thereto.
Example 1
20 wt% of bisphenol-A ethylene oxide diacrylate (manufacturer: Miwon Chemical Co., Ltd., product name: Miramer M240), 30 wt% of bisphenol-A ethylene oxide dimethacrylate (manufacturer: KYOEISHA Corp., product name: BP-4EM) and 50 wt% of a silicon-based binder having a structure of Formula 1 above (R1 to R3: methyl group, R4: phenyl group, R5 to R6: vinyl group, S: 10) were mixed to obtain a first mixture. Then, 2 wt% of 1-hydroxycylclohexyl phenyl ketone (Irgacure 184, manufactured by BASF Corporation) and 2 wt% of benzoyl peroxide, based on the amount of the first mixture, were respectively added to the first mixture to obtain a second mixture. Then, the second mixture was stirred for 1 hour to prepare a composition for forming a resin layer.
A glass fiber sheet having a thickness of 40 to 60 um was impregnated with the composition for forming a resin layer at room temperature for 1 hour. Thereafter, a release film was laminated on both sides of the glass fiber sheet impregnated with the composition using a laminating machine, and then the glass fiber sheet laminated with the release film was UV-cured using a UV-exposing machine. Subsequently, the release film was removed from the both sides of the UV-cured glass fiber sheet, and then this glass fiber sheet was thermally cured, thereby finally obtaining a substrate.
Example 2
50 wt% of 3,4-epoxycyclohexylmethyl-3, 10 wt% of bisphenol-A ethylene oxide dimethacrylate and 40 wt% of a silicon-based binder having a structure of Formula 1 above (R1 to R3: methyl group, R4: phenyl group, R5 to R6: vinyl group, S: 10) were mixed to obtain a first mixture. Then, 2 wt% of benzoyl peroxide, based on the amount of the first mixture, were added to the first mixture to obtain a second mixture. Then, the second mixture was stirred for 1 hour to prepare a composition for forming a resin layer.
A glass fiber sheet having a thickness of 40 to 60 um was impregnated with the composition for forming a resin layer at room temperature for 1 hour. Thereafter, a release film was laminated on both sides of the glass fiber sheet impregnated with the composition using a laminating machine, and then the glass fiber sheet laminated with the release film was UV-cured using a UV-exposing machine. Subsequently, the release film was removed from the both sides of the UV-cured glass fiber sheet, and then this glass fiber sheet was thermally cured, thereby finally obtaining a substrate.
Comparative Example 1
Unlike the compositions for forming a resin layer of Examples 1 and 2, 25 wt% of bisphenol-A ethoxylate diacrylate, 15 wt% of ethoxylated bisphenol fluorene diacrylate (manufacturer: Hannong Chemical Co., Ltd., product name: BPF-022), 50 wt% of ethoxylated pentaerythritol tetracrylate (manufacturer: Hannong Chemical Co., Ltd., product name: PE-044) and 10 wt% of fluorene acrylate having a bivalent functional group (manufacturer: Miwon Chemical Co., Ltd., product name: HR-6082) were first mixed to obtain a mixture. Then, 2 wt% of 1-hydroxycylclohexyl phenyl ketone, based on the amount of the mixture, was added to the mixture, and stirred for 1 hour to prepare an impregnation solution. Thereafter, the impregnation solution was processed in the same manner as in Example 1, thereby finally obtaining a substrate.
Experimental Example
Regarding the substrates of Examples 1 and 2 and Comparative Example 1, the CTE (coefficient of thermal expansion), TGA (thermogravimetric analysis) and surface characteristics after heat treatment were evaluated, and the results thereof are given in Table 1 below.
<CTE measuring method>
The substrates of Examples 1 and 2 and Comparative Example 1 were first heated from room temperature to 330℃ at a heating rate of 10 ℃/min under an N2 atmosphere of a thermo-mechanical analyzer (TMA), were cooled from 330℃ to room temperature at a cooling rate of 5 ℃/min, and were then second heated from room temperature to 330℃ at a heating rate of 10 ℃/min. At the time of second heating the substrates, the CTEs of these substrates were measured at 50℃ intervals from room temperature to 330℃, and then the average value thereof was calculated.
<TGA analysis method>
Each of the substrates of Examples 1 and 2 and Comparative Example 1 was heated from room temperature to 150℃ at a heating rate of 10 ℃/min under an N2 atmosphere of a thermo-gravimetric analyzer (TGA), and then maintained at 150℃ for 10 minutes. Then, each of the substrates was heated cooled from 150℃ to 300℃ at a heating rate of 10 ℃/min, and was then maintained at 300℃ for 1 hour and 10 minutes. The weight loss (%) thereof, which had been generated for 1 hour from 2 minutes to 62 minutes after it reached 300℃, was measured.
<Surface characteristics evaluation method>
The ΔRa (roughness) of each of the substrates of Examples 1 and 2 and Comparative Example 1 was evaluated by measuring the surface roughness of each substrate having an area of 1mm x 1mm before and after heat treatment (250℃/10min) using a 10x magnification lens as a 3D profiler.
Table 1
| Class. | Ex. 1 | Ex. 2 | Comp. Ex. 1 |
| CTE | < 7 ppm/℃ | < 9 ppm/℃ | < 14 ppm/℃ |
| Weight loss (300℃ for 1hr) | < 1% | < 1.2% | < 1.5% |
| ΔRa (Roughness) | < 100nm | < 200nm | < 600nm |
As given in Table 1 above, it can be ascertained that the CTE of the substrate of Comparative Example 1 is 14 ppm/℃ or less, whereas that of the Example 1 is 7 ppm/℃ or less and that of Example 2 is 9 ppm/℃ or less, and that the weight loss of the substrate of Comparative Example 1 is 1.5% or less, whereas that of Example 1 is 1.0% or less and that of Example 2 is 1.2% or less. Further, it can be ascertained that the ΔRa of the substrate of Comparative Example 1 is 600 nm or less, whereas that of Example 1 is 100 nm or less and that of Example 2 is 200 nm or less.
Although the preferred embodiments of the present invention have been disclosed for illustrative purposes, those skilled in the art will appreciate that various modifications, additions and substitutions are possible, without departing from the scope and spirit of the invention as disclosed in the accompanying claims.
When a flexible display substrate is manufactured using the composition for forming a resin layer according to the present invention, this flexible display substrate has excellent formability, is transparent and flexible, and has excellent thermal expansibility, excellent heat resistance and excellent flame retardance. Therefore, this flexible display substrate can replace a conventional glass substrate.
Claims (11)
- A composition for forming a resin layer, comprising:a silicon-based binder having a structure of Formula 1 below;at least one compound selected from the group consisting of an acrylic monomer and an epoxy resin; andan initiator:[Formula 1]wherein R1 to R4 are the same as or different from one another, and are each independently an alkyl group of C1 to C12, an allyl group of C2 to C12, an aralkyl group of C2 to C12 or an alkenyl group of C2 to C12,R5 and R6 are the same as or different from each other, and are each independently hydrogen or a vinyl group, andS is an integer of 2 to 1000.
- The composition of claim 1, wherein a mixing ratio of the silicon-based binder and the compound is 7: 3 to 1: 9 by weight.
- The composition of claim 1, comprising: 9.5 to 70 wt% of the silicon-based binder; 30 to 90 wt% of the at least one compound selected from the group consisting of an acrylic monomer and an epoxy resin; and 0.5 to 20 wt% of the initiator.
- The composition of claim 1, wherein the acrylic monomer is at least one selected from the group consisting of bisphenol-A ethylene oxide diacrylate, bisphenol-A ethylene oxide dimethacrylate, bisphenol-A ethoxylate diacrylate, bisphenol-A ethoxylate dimethacrylate, bisphenol-A polyethoxylate diacrylate, bisphenol-A diacrylate, bisphenol-S diacrylate, dicyclopentadienyl diacrylate, pentaerythritol triacrylate, tris(2-hydroxyethyl)isocyanurate triacrylate, pentaerythritol tetracrylate, bisphenol-A dimethacrylate, bisphenol-S dimethacrylate, dicyclopentadienyl dimethacrylate, pentaerythritol trimethacrylate, tris(2-hydroxyethyl)isocyanurate trimethacrylate, and pentaerythritol tetramethacrylate.
- The composition of claim 1, wherein the epoxy resin is at least one selected from the group consisting of a glycidyl epoxy resin and an alicyclic epoxy resin.
- The composition of claim 1, further comprising a surfactant.
- The composition of claim 1, further comprising a solvent, wherein the solvent is selected from the group consisting of ketones, ethers, esters, alcohols, hydrocarbons, acetonitrile, nitromethane, water, and mixtures thereof.
- A flexible display substrate, comprising a glass fiber sheet impregnated with the composition of claim 1.
- A method of manufacturing a flexible display substrate including a glass fiber sheet and a resin layer formed on both sides of the glass fiber sheet, comprising the steps of:impregnating a glass fiber sheet with the composition for a resin layer of claim 1; andUV-irradiating the glass fiber sheet impregnated with the composition to UV-cure the glass fiber sheet.
- The method of claim 9, comprising the steps of:impregnating a glass fiber sheet with the composition for a resin layer of claim 1;laminating a release film on both sides of the glass fiber sheet impregnated with the composition;UV-irradiating the glass fiber sheet laminated with the release film to UV-cure the glass fiber sheet; andseparating the release film from the UV-cured glass fiber sheet.
- The method of claim 9, further comprising the step of heating the UV-cured glass fiber sheet to 200 to 300℃ to thermally cure the glass fiber sheet, after the step of UV-curing the glass fiber sheet.
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| Application Number | Priority Date | Filing Date | Title |
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| KR1020130167131A KR101575440B1 (en) | 2013-12-30 | 2013-12-30 | Composition for forming resin layer and flexible display substrate using the same |
| KR10-2013-0167131 | 2013-12-30 |
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| WO2015102149A1 true WO2015102149A1 (en) | 2015-07-09 |
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| KR (1) | KR101575440B1 (en) |
| TW (1) | TWI515280B (en) |
| WO (1) | WO2015102149A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018217682A1 (en) * | 2017-05-23 | 2018-11-29 | Alpha Assembly Solutions Inc. | Graphene enhanced and engineered materials for membrane touch switch and other flexible electronic structures |
| US20220153918A1 (en) * | 2020-11-17 | 2022-05-19 | Divergent Technologies, Inc. | Isocyanurate resin compositions |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102590498B1 (en) * | 2016-02-19 | 2023-10-19 | 삼성디스플레이 주식회사 | Flexible display device, method for fabricating window member of the same, hard coating composition |
| KR102169052B1 (en) * | 2019-01-15 | 2020-10-22 | 경상대학교산학협력단 | Photocurable composition for 3D printer |
| WO2021199838A1 (en) * | 2020-03-30 | 2021-10-07 | 宇部マテリアルズ株式会社 | Polypropylene resin composition, method for producing polypropylene resin composition, and molded object |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20090065220A (en) * | 2007-12-17 | 2009-06-22 | 제일모직주식회사 | Photosensitive resin composition and light shielding layer manufactured using the same |
| KR20090075525A (en) * | 2008-01-04 | 2009-07-08 | 주식회사 엘지화학 | Photosensitive silicone resin composition and cured film manufactured therefrom |
| KR20110125851A (en) * | 2010-05-14 | 2011-11-22 | (주)스마트이노베이션 | Resin composition for display card manufacturing and display card manufacturing method using the same |
| KR20120138610A (en) * | 2011-06-15 | 2012-12-26 | 코오롱인더스트리 주식회사 | The flexible display substrate |
| KR20130139133A (en) * | 2012-06-12 | 2013-12-20 | 제일모직주식회사 | Composite sheet, method for preparing thereof and display substrate comprising the same |
-
2013
- 2013-12-30 KR KR1020130167131A patent/KR101575440B1/en not_active Expired - Fee Related
-
2014
- 2014-02-12 WO PCT/KR2014/001131 patent/WO2015102149A1/en not_active Ceased
- 2014-02-17 TW TW103105091A patent/TWI515280B/en not_active IP Right Cessation
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20090065220A (en) * | 2007-12-17 | 2009-06-22 | 제일모직주식회사 | Photosensitive resin composition and light shielding layer manufactured using the same |
| KR20090075525A (en) * | 2008-01-04 | 2009-07-08 | 주식회사 엘지화학 | Photosensitive silicone resin composition and cured film manufactured therefrom |
| KR20110125851A (en) * | 2010-05-14 | 2011-11-22 | (주)스마트이노베이션 | Resin composition for display card manufacturing and display card manufacturing method using the same |
| KR20120138610A (en) * | 2011-06-15 | 2012-12-26 | 코오롱인더스트리 주식회사 | The flexible display substrate |
| KR20130139133A (en) * | 2012-06-12 | 2013-12-20 | 제일모직주식회사 | Composite sheet, method for preparing thereof and display substrate comprising the same |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018217682A1 (en) * | 2017-05-23 | 2018-11-29 | Alpha Assembly Solutions Inc. | Graphene enhanced and engineered materials for membrane touch switch and other flexible electronic structures |
| US11624000B2 (en) | 2017-05-23 | 2023-04-11 | Alpha Assembly Solutions Inc. | Graphene enhanced and engineered materials for membrane touch switch and other flexible electronic structures |
| US12497532B2 (en) | 2017-05-23 | 2025-12-16 | Alpha Assembly Solutions Inc. | Graphene enhanced and engineered materials for membrane touch switch and other flexible electronic structures |
| US20220153918A1 (en) * | 2020-11-17 | 2022-05-19 | Divergent Technologies, Inc. | Isocyanurate resin compositions |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20150078060A (en) | 2015-07-08 |
| TWI515280B (en) | 2016-01-01 |
| KR101575440B1 (en) | 2015-12-07 |
| TW201525093A (en) | 2015-07-01 |
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