WO2015072534A1 - Curable composition, method for producing cured film, cured film, and display device - Google Patents

Curable composition, method for producing cured film, cured film, and display device Download PDF

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WO2015072534A1
WO2015072534A1 PCT/JP2014/080148 JP2014080148W WO2015072534A1 WO 2015072534 A1 WO2015072534 A1 WO 2015072534A1 JP 2014080148 W JP2014080148 W JP 2014080148W WO 2015072534 A1 WO2015072534 A1 WO 2015072534A1
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group
component
curable composition
compound
mass
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PCT/JP2014/080148
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French (fr)
Japanese (ja)
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幹雄 中川
米澤 裕之
健太 山▲ざき▼
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富士フイルム株式会社
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Priority to JP2015547800A priority Critical patent/JP6254185B2/en
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C08F299/065Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes from polyurethanes with side or terminal unsaturations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/124Insulating layers formed between TFT elements and OLED elements

Definitions

  • the present invention relates to a curable composition, a method for producing a cured film, a cured film, and an organic EL display device and a liquid crystal display device using the cured film.
  • Flat panel displays such as liquid crystal display devices and organic EL display devices are widely used.
  • an electronic component such as a liquid crystal display element, an integrated circuit element, a solid-state imaging element, and an organic EL
  • a flattening film for imparting flatness to the surface of the electronic component, and for preventing deterioration and damage of the electronic component
  • a curable composition is used when forming a protective film or an interlayer insulating film for maintaining insulation.
  • a polarizing plate is provided on a glass substrate, a transparent conductive circuit layer such as indium tin oxide (ITO) and a thin film transistor (TFT) are formed, and covered with an interlayer insulating film to form a back plate.
  • ITO indium tin oxide
  • TFT thin film transistor
  • a polarizing plate is provided on a glass substrate, a pattern of a black matrix layer and a color filter layer is formed as necessary, and a transparent conductive circuit layer and an interlayer insulating film are sequentially formed as a top plate, and this back plate and The liquid crystal is manufactured by enclosing the liquid crystal between the two plates with the upper plate facing the spacer.
  • a conventional curable composition the composition described in patent document 1 or 2 is known.
  • a curable composition capable of obtaining a cured film excellent in adhesion to a substrate, surface roughness of the film surface, and touch panel characteristics under high temperature and high humidity, and the above curable composition It is providing the cured film which hardened the thing, its manufacturing method, and the organic electroluminescent display device and liquid crystal display device which have the said cured film.
  • Component A contains a polymerizable compound having an ethylenically unsaturated bond
  • Component B contains a polymerization initiator
  • Component C contains a blocked isocyanate compound
  • Component D contains an organic solvent, , A urethane (meth) acrylate having 6 or more functional groups, and the ratio of the urethane (meth) acrylate having 6 or more functional groups in the component A is 70 to 100% by mass, and the sum of the component A, the component B and the component C is A curable composition characterized in that the amount is 85% by mass or more based on the total organic solid content of the curable composition;
  • Component B contains an oxime ester compound
  • Component C is a blocked isocyanate compound that protects a compound selected from the group consisting of tolylene diisocyanate, diphenylmethane diisocyanate, hexamethylene diisocyanate,
  • Step 1 is the step of applying the curable composition according to any one of ⁇ 1> to ⁇ 6> on the substrate, and Step 2 is to remove the organic solvent from the applied curable composition.
  • the curing step is a step of curing the curable composition from which the organic solvent has been removed with light, and further includes a heat treatment step of heat-treating a cured film obtained by curing the curable composition with light after the curing step.
  • a method for producing a cured film according to ⁇ 7>, ⁇ 9> A cured film obtained by curing the curable composition according to any one of ⁇ 1> to ⁇ 6>, ⁇ 10>
  • the cured film according to ⁇ 9> which is a protective film
  • ⁇ 11> An organic EL display device having the cured film according to ⁇ 9> or ⁇ 10>, ⁇ 12> A liquid crystal display device having the cured film according to ⁇ 9> or ⁇ 10>.
  • a curable composition capable of obtaining a cured film having excellent adhesion to a substrate, surface roughness of the film surface, and touch panel characteristics under high temperature and high humidity, the curable composition is cured.
  • the cured film, the manufacturing method thereof, and the organic EL display device and liquid crystal display device having the cured film can be provided.
  • 1 shows a conceptual diagram of a configuration of an example of an organic EL display device.
  • a schematic cross-sectional view of a substrate in a bottom emission type organic EL display device is shown, and a planarizing film 4 is provided.
  • 1 is a conceptual diagram of a configuration of an example of a liquid crystal display device.
  • the schematic sectional drawing of the active matrix substrate in a liquid crystal display device is shown, and it has the cured film 17 which is an interlayer insulation film.
  • 1 is a conceptual diagram illustrating a configuration of an example of a liquid crystal display device having a touch panel function.
  • FIG. 5 shows a conceptual diagram of a configuration of another example of a liquid crystal display device having a touch panel function.
  • the organic EL element in the present invention refers to an organic electroluminescence element.
  • groups atomic groups
  • substitution and non-substitution includes not only those having no substituent but also those having a substituent.
  • the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • “(meth) acrylate” represents acrylate and methacrylate
  • “(meth) acryl” represents acryl and methacryl
  • “(meth) acryloyl” represents acryloyl and methacryloyl.
  • “polymerizable compound having an ethylenically unsaturated bond” or the like is also simply referred to as “component A” or the like.
  • “mass%” and “wt%” are synonymous, and “part by mass” and “part by weight” are synonymous. In the present invention, a combination of preferred embodiments is more preferred.
  • the molecular weight of the polymerizable compound having (Component A) an ethylenically unsaturated bond is measured by ESI-MS (electrospray ionization mass spectrometry). Moreover, about a polymer component, it is the weight average molecular weight of polystyrene conversion measured by the gel permeation chromatography when tetrahydrofuran (THF) is used as a solvent. Note that (A) a polymerizable compound having an ethylenically unsaturated bond is measured by gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent for compounds having a molecular weight of 5,001 or more. Polystyrene equivalent weight average molecular weight.
  • GPC gel permeation chromatography
  • the curable composition of the present invention includes (Component A) a polymerizable compound having an ethylenically unsaturated bond, (Component B) a polymerization initiator, and (Component C) a blocked isocyanate.
  • Component A a polymerizable compound having an ethylenically unsaturated bond
  • Component B a polymerization initiator
  • Component C a blocked isocyanate.
  • Component A contains a hexafunctional or higher urethane (meth) acrylate, and the ratio of the above hexafunctional or higher urethane (meth) acrylate in Component A is 70.
  • the total amount of Component A, Component B and Component C is 85% by mass or more based on the total organic solid content of the curable composition.
  • the curable composition of the present invention further comprises (Component E) an alkoxysilane compound, (Component F) inorganic particles, (Component G) (meth) acrylic copolymer, (Component H) mercapto compound, (Component W) interface.
  • Component E an alkoxysilane compound
  • Component F inorganic particles
  • Component G (meth) acrylic copolymer
  • Component H mercapto compound
  • Component W mercapto compound
  • Other components such as an activator may be included.
  • the curable composition of the present invention is preferably a composition in which the strength of the cured product is increased by heat-treating the cured product such as the obtained cured film after polymerization or subsequent to polymerization, It is more preferable that the composition contains a photopolymerization initiator as Component B, and is a composition in which the strength of the cured product is further increased by heat-treating the obtained cured product after polymerization by light.
  • the curable composition of the present invention contains (Component A) a polymerizable compound having an ethylenically unsaturated bond.
  • Component A only needs to have an ethylenically unsaturated bond, and may be a low molecular weight compound, an oligomer, or a polymer.
  • the content of component A is preferably 40% by mass or more, more preferably 50% by mass or more, and further preferably 60% by mass or more, based on the total solid content of the curable composition. It is preferably 70% by mass or more.
  • the upper limit is not particularly defined, but is preferably 99% by mass or less, and more preferably 95% by mass or less, for example.
  • solid content in a curable composition represents the component except volatile components, such as an organic solvent.
  • Component A contains hexafunctional or higher urethane (meth) acrylate, and the ratio of the above hexafunctional or higher urethane (meth) acrylate in Component A is 70 to 100% by mass, and 75 to 100% by mass. It is preferably 90 to 100% by mass, more preferably 95 to 100% by mass. The effect of this invention is more effectively exhibited as it is the said aspect.
  • the content of hexafunctional or higher urethane (meth) acrylate is preferably 40% by mass or more, more preferably 50% by mass or more, and 65% by mass with respect to the total solid content of the curable composition.
  • the upper limit is not particularly defined, but it is preferably 95% by mass or less.
  • the content of hexafunctional or higher urethane (meth) acrylate is preferably 60% by mass or more, more preferably 70% by mass or more, based on the total organic solid content of the curable composition.
  • the content is more preferably 80% by mass or more, and particularly preferably 80 to 95% by mass.
  • the total organic solid content means a solid content obtained by removing inorganic substances (such as inorganic particles) from the total solid content of the curable composition.
  • the organic solid content of a curable composition is preferable, as for content of 6 or more functional urethane (meth) acrylate, 70 mass% or more is more preferable, and 80 mass% or more is the most preferable.
  • the organic solid content here means the solid content of the organic material excluding organic particles such as polymer particles, inorganic particles such as metal oxide particles, and pigment components such as organic inorganic pigments from the solid content of the composition. Means.
  • the number of (meth) acryloxy groups in the hexafunctional or higher-functional urethane (meth) acrylate is preferably 8 or more, more preferably 10 or more, and still more preferably 12 or more.
  • the effect of this invention is more effectively exhibited as it is the said aspect.
  • the upper limit of the number of the (meth) acryloxy groups is not particularly limited, but is preferably 50 or less, more preferably 30 or less, and still more preferably 20 or less.
  • the curable composition of the present invention may contain only one type of hexafunctional or higher urethane (meth) acrylate, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.
  • the molecular weight of the hexafunctional or higher urethane (meth) acrylate is preferably 500 to 20,000, more preferably 650 to 6,000, and still more preferably 800 to 3,000, from the viewpoint of cured film hardness. The effect of this invention is more effectively exhibited as it is the said aspect.
  • the molecular weight of hexafunctional or higher urethane (meth) acrylate is the number average molecular weight in terms of polystyrene of GPC when the molecular weight is 1,000 or more.
  • the (meth) acryloxy group in the hexafunctional or higher urethane (meth) acrylate may be either an acryloxy group or a methacryloxy group, or may be both, but is preferably an acryloxy group.
  • the number of urethane bonds in the hexa- or more functional urethane (meth) acrylate is not particularly limited, but is preferably 1 to 30, more preferably 1 to 20, and still more preferably 2 to 10. It is particularly preferably 2 to 5, and most preferably 2 or 3.
  • the hexafunctional or higher urethane (meth) acrylate is preferably a hexafunctional or higher aliphatic urethane (meth) acrylate.
  • hexafunctional or more urethane (meth) acrylate has an isocyanuric ring structure.
  • the hexafunctional or higher urethane (meth) acrylate is a compound comprising a core portion having one or more urethane bonds and a terminal portion bonded to the core portion and having one or more (meth) acryloxy groups.
  • the core part is more preferably a compound having two or more terminal parts bonded thereto, more preferably a compound having 2 to 5 terminal parts bonded to the core part.
  • a compound in which 2 or 3 of the above terminal moieties are bound to the core part is particularly preferred.
  • the hexafunctional or more urethane (meth) acrylate is preferably a compound having at least a group represented by the following formula (Ae-1) or (Ae-2), and represented by the following formula (Ae-1). It is more preferable that the compound has at least a group.
  • the hexafunctional or higher urethane (meth) acrylate is a compound having two or more groups selected from the group consisting of a group represented by the following formula (Ae-1) and a group represented by the formula (Ae-2) It is more preferable that Further, the terminal portion in the hexafunctional or higher functional urethane (meth) acrylate is preferably a group represented by the following formula (Ae-1) or (Ae-2).
  • R each independently represents an acryloyl group or a methacryloyl group, and a wavy line portion represents a bonding position with another structure.
  • the hexafunctional or higher urethane (meth) acrylate is preferably a compound having at least a group represented by the following formula (Ac-1) or (Ac-2), and represented by the following formula (Ac-1): It is more preferable that the compound has at least the group represented.
  • the above-mentioned core portion in the urethane (meth) acrylate having 6 or more functionalities is represented by the following formula (Ac-1) or (Ac-2) from the viewpoints of hardness, low-temperature curability, adhesion, solvent resistance, and coatability. It is preferable that it is group represented.
  • L 1 to L 4 each independently represents a divalent hydrocarbon group having 2 to 20 carbon atoms, and the wavy line represents the bonding position with another structure Represents.
  • L 1 to L 4 are each independently preferably an alkylene group having 2 to 20 carbon atoms, more preferably an alkylene group having 2 to 10 carbon atoms, and an alkylene group having 4 to 8 carbon atoms. Is more preferable.
  • the alkylene group may have a branched or ring structure, but is preferably a linear alkylene group.
  • the urethane (meth) acrylate having 6 or more functional groups is represented by a group represented by the formula (Ac-1) or the formula (Ac-2), and a formula (Ae-1) or a formula (Ae-2). Particularly preferred are compounds in which two or three groups selected from the group consisting of groups are bonded.
  • hexafunctional or higher urethane (meth) acrylates preferably used in the present invention will be exemplified, but it goes without saying that the present invention is not limited to these.
  • examples of the urethane (meth) acrylate having 6 or more functional groups that can be used in the present invention include urethane addition polymerizable compounds produced by using an addition reaction between an isocyanate and a hydroxyl group, and JP-A-51-37193.
  • examples of such urethane acrylates are described in Japanese Patent Publications, JP-B-2-32293 and JP-B-2-16765, and these descriptions are incorporated in the present specification.
  • Examples include Laromer UA-9048, UA-9050, PR9052, EBECRYL 220, 5129, 8301, KRM8200, 8200AE, and 8452 available from Daicel Ornex Co., Ltd.
  • the curable composition of the present invention is a polymerizable compound having an ethylenically unsaturated bond other than hexafunctional or higher urethane (meth) acrylate (also referred to as “other polymerizable compounds having an ethylenically unsaturated bond”). It may be included but is preferably not included.
  • the polymerizable compound having an ethylenically unsaturated bond other than the hexafunctional or higher urethane (meth) acrylate may be a polymer (for example, a molecular weight of 2,000 or more) or a monomer (for example, a molecular weight of 2,000).
  • a molecular weight of 100 or more and less than 2,000 preferably a molecular weight of 100 or more and less than 2,000
  • a monomer is preferred.
  • a (meth) acrylate compound is preferable.
  • the number of functional groups of the (meth) acrylate compound is preferably 2 to 6, and more preferably 3 to 6.
  • pentaerythritol tri (meth) acrylate pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tri ((meth) acryloyloxyethyl) isocyanurate , Trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate ethylene oxide (EO) modified product, dipentaerythritol hexa (meth) acrylate EO modified product, and the like.
  • EO ethylene oxide
  • pentafunctional or lower urethane (meth) acrylate may be included as another polymerizable compound having an ethylenically unsaturated bond.
  • pentafunctional or lower urethane (meth) acrylate include the following compounds.
  • the curable composition of the present invention contains a polymerizable compound having an ethylenically unsaturated bond other than the hexafunctional or higher urethane (meth) acrylate, 0.1 to 20% by mass of the total solid content of the curable composition. It is preferably included in the range of 0.5 to 10% by mass, more preferably in the range of 1 to 5% by mass.
  • the curable composition of the present invention may contain only one type of polymerizable compound having an ethylenically unsaturated bond other than hexafunctional or higher urethane (meth) acrylate, and may contain two or more types. When two or more types are included, the total amount is preferably within the above range.
  • the curable composition of the present invention contains (Component B) a polymerization initiator.
  • the polymerization initiator preferably contains a radical polymerization initiator.
  • the radical polymerization initiator that can be used in the present invention is a compound that can initiate and accelerate polymerization of a hexafunctional or higher urethane (meth) acrylate compound by light and / or heat. Among these, a photopolymerization initiator is preferable, and a photoradical polymerization initiator is more preferable.
  • the “light” is not particularly limited as long as it is an active energy ray capable of imparting energy capable of generating a starting species from the component B by the irradiation, and is widely limited to ⁇ rays, ⁇ rays, X rays, ultraviolet rays. (UV), visible light, electron beam, and the like. Among these, light containing at least ultraviolet rays is preferable.
  • Examples of the photopolymerization initiator include oxime ester compounds, organic halogenated compounds, oxydiazole compounds, carbonyl compounds, ketal compounds, benzoin compounds, acridine compounds, organic peroxide compounds, azo compounds, coumarin compounds, azide compounds, metallocenes.
  • Examples include compounds, hexaarylbiimidazole compounds, organic boric acid compounds, disulfonic acid compounds, onium salt compounds, and acylphosphine (oxide) compounds.
  • oxime ester compounds and hexaarylbiimidazole compounds are preferable from the viewpoint of sensitivity, and oxime ester compounds are more preferable.
  • the oxime ester compound examples include compounds described in JP-A No. 2000-80068, JP-A No. 2001-233842, JP-T No. 2004-534797, JP-A No. 2007-231000, and JP-A No. 2009-134289. Can be used.
  • the oxime ester compound is preferably a compound represented by the following formula (1) or formula (2).
  • Ar represents an aromatic group or heteroaromatic group
  • R 1 represents an alkyl group, an aromatic group or an alkyloxy group
  • R 2 represents a hydrogen atom or an alkyl group. Further, R 2 may be bonded to an Ar group to form a ring.
  • Ar represents an aromatic group or a heteroaromatic group, and is preferably a group obtained by removing one hydrogen atom from a benzene ring, naphthalene ring or carbazole ring, and a naphthalenyl group or carbazoyl group which forms a ring together with R 2 More preferred.
  • R 1 represents an alkyl group, an aromatic group or an alkyloxy group, preferably a methyl group, an ethyl group, a benzyl group, a phenyl group, a naphthyl group, a methoxy group or an ethoxy group, and a methyl group, an ethyl group, a phenyl group or a methoxy group Groups are more preferred.
  • R 2 represents a hydrogen atom or an alkyl group, preferably a hydrogen atom or a substituted alkyl group, and more preferably a hydrogen atom, a substituted alkyl group that forms a ring with Ar, or a toluenethioalkyl group.
  • the oxime ester compound is more preferably a compound represented by the following formula (3), formula (4) or formula (5).
  • R 1 represents an alkyl group, an aromatic group or an alkoxy group
  • X represents —CH 2 —, —C 2 H 4 —, —O— or —S—
  • R 3 independently represents a halogen atom
  • R 4 are each independently an alkyl group, a phenyl group, an alkyl-substituted amino group, an arylthio group, an alkylthio group, an alkoxy group, an aryloxy group or a halogen atom
  • R 5 Represents a hydrogen atom, an alkyl group or an aryl group
  • R 6 represents an alkyl group
  • n1 and n2 each independently represents an integer of 0 to 6
  • n3 represents an integer of 0 to 5.
  • R 1 represents an alkyl group, an aromatic group or an alkoxy group, and a group represented by R 11 —X′-alkylene group— (R 11 represents an alkyl group or an aryl group, and X ′ represents a sulfur atom or an oxygen atom.
  • R 11 is preferably an aryl group, more preferably a phenyl group.
  • the alkyl group and aryl group as R 11 may be substituted with a halogen atom (preferably a fluorine atom, a chlorine atom or a bromine atom) or an alkyl group.
  • X is preferably a sulfur atom.
  • R 3 and R 4 can be bonded at any position on the aromatic ring.
  • R 4 represents an alkyl group, a phenyl group, an alkyl-substituted amino group, an arylthio group, an alkylthio group, an alkoxy group, an aryloxy group or a halogen atom, preferably an alkyl group, a phenyl group, an arylthio group or a halogen atom, an alkyl group, an arylthio group A group or a halogen atom is more preferred, and an alkyl group or a halogen atom is still more preferred.
  • the alkyl group an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group or an ethyl group is more preferable.
  • R 4 As a halogen atom, a chlorine atom, a bromine atom, or a fluorine atom is preferable.
  • the number of carbon atoms in R 4 is preferably 0 to 50, more preferably 0 to 20.
  • R 5 represents a hydrogen atom, an alkyl group or an aryl group, and an alkyl group is preferable.
  • the alkyl group an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group or an ethyl group is more preferable.
  • aryl group an aryl group having 6 to 10 carbon atoms is preferable.
  • R 6 represents an alkyl group, preferably an alkyl group having 1 to 5 carbon atoms, more preferably a methyl group or an ethyl group.
  • n1 and n2 each represent the number of substitutions of R 3 on the aromatic ring in formula (3) or formula (4), and n3 represents the number of substitutions of R 4 on the aromatic ring in formula (5).
  • n1 to n3 are each independently preferably an integer of 0 to 2, and more preferably 0 or 1.
  • oxime ester compounds preferably used in the present invention are shown below. However, it goes without saying that the oxime ester compounds used in the present invention are not limited to these. Me represents a methyl group and Ph represents a phenyl group.
  • organic halogenated compounds include: Wakabayashi et al., “Bull Chem. Soc. Japan” 42, 2924 (1969), US Pat. No. 3,905,815, Japanese Patent Publication No. 46-4605. JP, 48-34881, JP 55-3070, JP 60-239736, JP 61-169835, JP 61-169837, JP 62-58241, JP-A 62-212401, JP-A 63-70243, JP-A 63-298339, P. Examples include compounds described in Hut “Journal of Heterocyclic Chemistry” 1 (No. 3), (1970), and in particular, oxazole compounds substituted with a trihalomethyl group and s-triazine compounds.
  • hexaarylbiimidazole compounds include, for example, JP-B-6-29285, US Pat. Nos. 3,479,185, 4,311,783, and 4,622,286. Examples include various compounds described in the specification.
  • acylphosphine (oxide) compounds include monoacylphosphine oxide compounds and bisacylphosphine oxide compounds. Specific examples include Irgacure 819, Darocur 4265, Darocur TPO, etc. manufactured by Ciba Specialty Chemicals. Can be mentioned.
  • a polymerization initiator can be used 1 type or in combination of 2 or more types.
  • the total amount of the polymerization initiator in the curable composition of the present invention is preferably 0.5 to 30% by mass, more preferably 1 to 20% by mass, based on the total solid content in the composition.
  • the content is more preferably 1 to 10% by mass, and particularly preferably 2 to 5% by mass.
  • the total amount of the polymerization initiator in the curable composition of the present invention is 0.5 to 30% by mass with respect to the total solid content in the composition. Is preferably 1 to 20% by mass, more preferably 1 to 10% by mass, and particularly preferably 2 to 5% by mass.
  • a sensitizer can be added to the curable composition of the present invention.
  • Typical sensitizers that can be used in the present invention include those disclosed in Crivello [JV Crivello, Adv. In Polymer Sci., 62, 1 (1984)]. Examples include pyrene, perylene, acridine orange, thioxanthone, 2-chlorothioxanthone, benzoflavin, N-vinylcarbazole, 9,10-dibutoxyanthracene, anthraquinone, coumarin, ketocoumarin, phenanthrene, camphorquinone, and phenothiazine derivatives.
  • the sensitizer is preferably added in a proportion of 50 to 200% by mass with respect to the polymerization initiator.
  • the curable composition of the present invention contains (Component C) a blocked isocyanate compound.
  • component C a blocked isocyanate compound.
  • the blocked isocyanate compound is not particularly limited as long as it is a compound having a blocked isocyanate group, but is preferably a compound having two or more blocked isocyanate groups in one molecule from the viewpoint of curability.
  • the upper limit of the number of blocked isocyanate groups is not particularly defined, but is preferably 6 or less.
  • the skeleton of the blocked isocyanate compound is not particularly limited and may be any as long as it has two isocyanate groups in one molecule, and may be aliphatic, alicyclic or aromatic.
  • Polyisocyanate may be used.
  • a compound, a multimer thereof, and a prepolymer type skeleton compound derived from these compounds can be preferably used.
  • blocked isocyanate compounds that protect a compound selected from the group consisting of tolylene diisocyanate (TDI), diphenylmethane diisocyanate (MDI), hexamethylene diisocyanate (HDI), isophorone diisocyanate (IPDI), and multimers thereof.
  • a blocked isocyanate compound in which a compound selected from the group consisting of hexamethylene diisocyanate, isophorone diisocyanate, and multimers thereof is protected is more preferable.
  • the isocyanate compound multimer is not particularly limited as long as it is a dimer or higher multimer, and examples thereof include biuret bodies, isocyanurate bodies, and adduct bodies, and biuret bodies are preferred.
  • Examples of the matrix structure of the blocked isocyanate compound in the curable composition of the present invention include biuret type, isocyanurate type, adduct type, and bifunctional prepolymer type.
  • Examples of the blocking agent that forms the block structure of the blocked isocyanate compound include oxime compounds, lactam compounds, phenol compounds, alcohol compounds, amine compounds, active methylene compounds, pyrazole compounds, mercaptan compounds, imidazole compounds, and imide compounds. be able to.
  • oxime compounds, lactam compounds, phenol compounds, alcohol compounds, amine compounds, active methylene compounds, or pyrazole compounds are preferable, oxime compounds and lactam compounds are more preferable, oxime compounds are more preferable, and methyl ethyl ketone oxime is more preferable.
  • oxime compound include oxime and ketoxime, and specific examples include acetoxime, formaldoxime, cyclohexane oxime, methyl ethyl ketone oxime, cyclohexanone oxime, and benzophenone oxime.
  • lactam compound include ⁇ -caprolactam and ⁇ -butyrolactam.
  • Examples of the phenol compound include phenol, naphthol, cresol, xylenol, and halogen-substituted phenol.
  • Examples of the alcohol compound include methanol, ethanol, propanol, butanol, cyclohexanol, ethylene glycol monoalkyl ether, propylene glycol monoalkyl ether, and alkyl lactate.
  • Examples of the amine compound include primary amines and secondary amines, which may be aromatic amines, aliphatic amines, and alicyclic amines, and examples thereof include aniline, diphenylamine, ethyleneimine, and polyethyleneimine.
  • Examples of the active methylene compound include diethyl malonate, dimethyl malonate, ethyl acetoacetate, methyl acetoacetate and the like.
  • Examples of the pyrazole compound include pyrazole, methylpyrazole, dimethylpyrazole and the like.
  • Examples of the mercaptan compound include alkyl mercaptans and aryl mercaptans.
  • the blocked isocyanate compound that can be used in the curable composition of the present invention is commercially available.
  • Coronate AP Stable M Coronate 2503, 2515, 2507, 2513, 2555, Millionate MS-50 (above, Japan) Polyurethane Industry Co., Ltd.)
  • Takenate B-830, B-815N, B-820NSU, B-842N, B-84N, B-870N, B-874N, B-882N Mitsubishi Chemicals, Inc.
  • the content of the blocked isocyanate compound in the curable composition of the present invention is preferably in the range of 0.1 to 20% by mass, and preferably 0.5 to 10% by mass with respect to the total solid content of the curable composition. More preferably, it is contained in a range of 1 to 5% by mass.
  • the content of the blocked isocyanate compound in the curable composition of the present invention is preferably in the range of 0.1 to 20% by mass with respect to the total organic solid content of the curable composition, 0.5 to 10 More preferably, it is contained in the range of 1% by mass, and more preferably in the range of 1-5% by mass.
  • the weight ratio of component A to component C in the curable composition of the present invention is preferably 100: 1 to 10: 1, more preferably 50: 1 to 10: 1, and 20: 1 to More preferably, it is 10: 1.
  • the total amount of component A, component B, and component C is preferably 85% by mass or more, more preferably 90% by mass or more, and 95% by mass with respect to the total organic solid content of the curable composition. % Or more is more preferable.
  • the curable composition of the present invention may contain only one type of blocked isocyanate compound, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.
  • the curable composition of the present invention contains an organic solvent. It is preferable that the curable composition of this invention is prepared as a solution which melt
  • the organic solvent used in the curable composition of the present invention known solvents can be used, such as ethylene glycol monoalkyl ethers, ethylene glycol dialkyl ethers, ethylene glycol monoalkyl ether acetates, propylene glycol monoalkyl.
  • Ethers propylene glycol dialkyl ethers, propylene glycol monoalkyl ether acetates, diethylene glycol dialkyl ethers, diethylene glycol monoalkyl ether acetates, dipropylene glycol monoalkyl ethers, butylene glycol diacetates, dipropylene glycol dialkyl ethers, Dipropylene glycol monoalkyl ether acetates, alcohols, esters, ketones, Bromide, lactones and the like.
  • these solvents reference can be made to paragraph 0062 of JP-A-2009-098616.
  • propylene glycol monomethyl ether acetate diethylene glycol diethyl ether, diethylene glycol ethyl methyl ether, propylene glycol monomethyl ether, 1,3-butylene glycol diacetate, cyclohexanol acetate, propylene glycol diacetate, and tetrahydrofurfuryl alcohol are preferable.
  • the boiling point of the solvent is preferably 100 ° C. to 300 ° C., more preferably 120 ° C. to 250 ° C. from the viewpoint of applicability.
  • the organic solvent which can be used for this invention can be used individually by 1 type or in combination of 2 or more types. It is also preferred to use solvents having different boiling points in combination.
  • the content of the organic solvent in the curable composition of the present invention is 100 to 3,000 parts by mass per 100 parts by mass of the total solid content of the curable composition from the viewpoint of adjusting the viscosity to be suitable for coating. It is preferably 200 to 2,000 parts by mass, more preferably 250 to 1,000 parts by mass.
  • the solid content concentration in the curable composition of the present invention is preferably 3 to 50% by mass, and more preferably 20 to 40% by mass.
  • the viscosity of the curable composition of the present invention is preferably 1 to 200 mPa ⁇ s, more preferably 2 to 100 mPa ⁇ s, and most preferably 3 to 80 mPa ⁇ s.
  • the viscosity is preferably measured at 25 ⁇ 0.2 ° C. using a RE-80L rotational viscometer manufactured by Toki Sangyo Co., Ltd., for example.
  • the rotation speed during measurement is preferably 100 rpm for less than 5 mPa ⁇ s, 50 rpm for 5 mPa ⁇ s to less than 10 mPa ⁇ s, 20 rpm for 10 mPa ⁇ s to less than 30 mPa ⁇ s, and 10 rpm for 30 mPa ⁇ s or more.
  • the curable composition of the present invention preferably contains (Component E) an alkoxysilane compound.
  • the alkoxysilane compound that can be used in the curable composition of the present invention includes a base material, for example, a silicon compound such as silicon, silicon oxide, and silicon nitride, a metal such as gold, copper, molybdenum, titanium, and aluminum, and an insulating film. It is preferable that it is a compound which improves the adhesiveness of. Specifically, a known silane coupling agent or the like is also effective.
  • a silane coupling agent having an ethylenically unsaturated bond is preferred.
  • the silane coupling agent include ⁇ -aminopropyltrimethoxysilane, ⁇ -aminopropyltriethoxysilane, ⁇ -glycidoxypropyltrialkoxysilane, ⁇ -glycidoxypropyl dialkoxysilane, and ⁇ -methacryloxypropyl.
  • ⁇ -methacryloxypropyltrialkoxysilane, ⁇ -acryloxypropyltrialkoxysilane, vinyltrialkoxysilane, or ⁇ -glycidoxypropyltrialkoxysilane is more preferable. These can be used alone or in combination of two or more. Examples of commercially available products include KBM-403 and KBM-5103 manufactured by Shin-Etsu Chemical Co., Ltd.
  • the content of the alkoxysilane compound in the curable composition of the present invention is preferably 0.1 to 30 parts by mass and more preferably 2 to 20 parts by mass with respect to 100 parts by mass in total of the total solid content of the curable composition. 2 to 15 parts by mass is more preferable. Only one type of alkoxysilane compound may be included, or two or more types may be included. When two or more types are included, the total amount is preferably within the above range.
  • the curable composition of the invention preferably contains inorganic particles.
  • the hardness (strength) of the cured film becomes more excellent.
  • substrate can be improved by containing an inorganic particle.
  • the average particle size of the inorganic particles used in the present invention is preferably 1 to 200 nm, more preferably 5 to 100 nm, and most preferably 5 to 50 nm.
  • the average particle diameter is an arithmetic average obtained by measuring the particle diameter of 200 arbitrary particles with an electron microscope. When the particle shape is not spherical, the maximum outer diameter is taken as the particle diameter of the particle.
  • the porosity of the inorganic particles is preferably less than 10%, more preferably less than 3%, and most preferably no void.
  • the porosity of the particle is an arithmetic average of 200 of the area ratio between the void portion of the cross-sectional image obtained by an electron microscope and the entire particle.
  • inorganic particles Be, Mg, Ca, Sr, Ba, Sc, Y, La, Ce, Gd, Tb, Dy, Yb, Lu, Ti, Zr, Hf, Nb, Mo, W, Zn, B, Al Metal oxide particles containing atoms such as Si, Ge, Sn, Pb, Sb, Bi, and Te are preferable.
  • Silicon oxide, titanium oxide, titanium composite oxide, zinc oxide, zirconium oxide, indium / tin oxide, antimony / Tin oxide is more preferable, silicon oxide, titanium oxide, titanium composite oxide, zirconium oxide is more preferable, silicon oxide or titanium oxide is the stability of particles, availability, hardness of the cured film, transparency, This is particularly preferable from the viewpoint of adjusting the refractive index.
  • a silica is mentioned preferably and a silica particle is mentioned more preferably.
  • the silica particles are not particularly limited as long as they are inorganic oxide particles containing silicon dioxide, and particles containing silicon dioxide or a hydrate thereof as a main component (preferably 80% by mass or more) are preferable.
  • grains may contain the aluminate as a minor component (for example, less than 5 mass%). Examples of the aluminate that may be contained as a minor component include sodium aluminate and potassium aluminate.
  • the silica particles may contain inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide and ammonium hydroxide, and organic salts such as tetramethylammonium hydroxide.
  • Colloidal silica is exemplified as an example of such a compound.
  • a dispersion medium of colloidal silica Any of water, an organic solvent, and these mixtures may be sufficient. These may be used individually by 1 type and can also use 2 or more types together.
  • the particles can be used as a dispersion prepared by mixing and dispersing in a suitable dispersant and solvent using a mixing device such as a ball mill or a rod mill.
  • the content of the inorganic particles is preferably 1 part by mass or more, more preferably 5 parts by mass or more, and still more preferably 10 parts by mass or more per 100 parts by mass of the total solid content of the curable composition. Moreover, 80 mass parts or less are preferable, 50 mass parts or less are more preferable, 40 mass parts or less are further more preferable, and 30 mass parts or less are especially preferable.
  • One type of inorganic particles may be included, or two or more types may be included. When two or more types are included, the total amount is preferably within the above range.
  • the curable composition of the present invention may comprise (Component G) (meth) acrylic copolymer.
  • Monomers to be copolymerized with (meth) acrylic acid include styrene, methyl (meth) acrylate, ethyl (meth) acrylate, (alkylene substituted at the ⁇ -position such as styrene and ⁇ -methylstyrene, ( Meth) propyl acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, vinyl acetate, acrylonitrile, (meth) acrylamide, glycidyl (meth) acrylate, allyl glycidyl ether, glycidyl ethyl acrylate, crotonyl glycidyl ether, Crotonic acid glycidyl ether, (meth) acrylic acid chloride, benzyl (meth) (meth) acrylic acid chloride,
  • component G in the curable composition of the present invention is preferably 1 to 20% by mass, more preferably 1 to 15% by mass, and still more preferably 1 to 10% by mass.
  • the curable composition of the present invention preferably contains (Component H) a mercapto compound.
  • a mercapto compound By containing a mercapto compound, the obtained cured film has excellent film strength.
  • a monofunctional mercapto compound or a polyfunctional mercapto compound is preferably used.
  • the monofunctional mercapto compound either an aliphatic mercapto compound or an aromatic mercapto compound can be used. From the viewpoint of film strength, an aromatic mercapto compound is preferable.
  • monofunctional aliphatic mercapto compounds include 1-octanethiol, 1-dodecanethiol, ⁇ -mercaptopropionic acid, methyl-3-mercaptopropionate, 2-ethylhexyl-3-mercaptopropionate, Examples thereof include n-octyl-3-mercaptopropionate, methoxybutyl-3-mercaptopropionate, stearyl-3-mercaptopropionate.
  • monofunctional aromatic mercapto compound those represented by the following formula (I) are preferable.
  • X S represents an oxygen atom, a sulfur atom or N—R S
  • R S represents a hydrogen atom, an alkyl group or an aryl group
  • A represents a heterocycle together with N ⁇ C—X S Represents an atomic group to be formed.
  • R S represents a hydrogen atom, an alkyl group or an aryl group.
  • alkyl group include linear, branched, or cyclic alkyl groups having 1 to 20 carbon atoms, such as straight chain having 1 to 12 carbon atoms, branched or carbon atoms having 3 to 12 carbon atoms.
  • a cyclic alkyl group of several 5 to 10 is more preferable.
  • Specific examples thereof include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, octadecyl group.
  • aryl group examples include those having 1 to 3 benzene rings forming a condensed ring in addition to those having a monocyclic structure, and those having a benzene ring and a 5-membered unsaturated ring forming a condensed ring. it can.
  • phenyl group examples include phenyl group, naphthyl group, anthryl group, phenanthryl group, indenyl group, acenaphthenyl group, fluorenyl group and the like. In these, a phenyl group and a naphthyl group are more preferable.
  • alkyl groups and aryl groups may further have a substituent.
  • substituents that can be introduced include a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, and 2 to 2 carbon atoms.
  • A represents an atomic group that forms a heterocycle with N ⁇ C—X S.
  • atoms constituting this atomic group include a carbon atom, a nitrogen atom, a hydrogen atom, a sulfur atom, and a selenium atom.
  • the heterocycle formed by A and N ⁇ C—X S may further have a substituent, and examples of the substituent that can be introduced include substituents that can be introduced into the alkyl group and aryl group. The same thing is mentioned.
  • the monofunctional aromatic mercapto compound is more preferably a compound represented by the following formulas (II) to (V).
  • R S1 represents a hydrogen atom or an aryl group
  • X S1 independently represents a hydroxyl group, a halogen atom, an alkoxy group, an aryloxy group, an alkyl group or an aryl group
  • R S2 represents an alkyl group or an aryl group
  • n represents an integer of 0 to 4
  • m represents an integer of 0 to 5.
  • the halogen atom in the formulas (II) to (V) is preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
  • Examples of the alkoxy group and aryloxy group in the formulas (II) to (V) include a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butyloxy group, a pentyloxy group, a hexyloxy group, a dodecyloxy group, and a benzyloxy group.
  • the alkyl group in the formulas (II) to (V) is synonymous with the alkyl group represented by R S in the formula (I), and its preferred range is also the same.
  • the aryl group in the formulas (II) to (V) has the same meaning as the aryl group represented by R S in the formula (I), and the preferred range thereof is also the same.
  • Each group in formula (II) to formula (V) may further have a substituent, and the substituent can be introduced into the alkyl group or aryl group represented by R S in formula (I). These are the same as those listed as examples of the substituent.
  • n and m are preferably 0 from the viewpoint of solubility in an organic solvent.
  • the following compounds are more preferred. When these compounds are used, the film strength increases and the storage stability is also good.
  • Component H is preferably a polyfunctional mercapto compound from the viewpoint of adhesion to the substrate.
  • the polyfunctional mercapto compound means a compound having two or more mercapto groups (thiol groups) in the molecule.
  • a low molecular compound having a molecular weight of 100 or more is preferable, specifically, a molecular weight of 100 to 1,500 is more preferable, and 150 to 1,000 is still more preferable.
  • the number of functional groups of the polyfunctional mercapto compound is preferably 2 to 10 functions, more preferably 2 to 8 functions, and even more preferably 2 to 4 functions. When the number of functional groups is large, the film strength is excellent, while when the number of functional groups is small, the storage stability is excellent. In the case of the said range, these can be made compatible.
  • aliphatic polyfunctional mercapto compound a compound having two or more groups represented by the following formula (S-1) is preferable.
  • R 1S represents a hydrogen atom or an alkyl group
  • a 1S represents —CO— or —CH 2 —
  • the wavy line represents a bonding position with another structure.
  • the alkyl group for R 1S in formula (S-1) is a linear, branched, or cyclic alkyl group, and the carbon number is preferably 1 to 16, more preferably 1 to 10.
  • Specific examples of the alkyl group include methyl group, ethyl group, propyl group, i-propyl group, butyl group, s-butyl group, t-butyl group, pentyl group, hexyl group, 2-ethylhexyl group and the like.
  • R 1S is particularly preferably a hydrogen atom, a methyl group, an ethyl group, a propyl group, or an i-propyl group, and most preferably a methyl group or an ethyl group.
  • the polyfunctional mercapto compound is particularly preferably a compound represented by the following formula (S-2) having a plurality of groups represented by the above formula (S-1).
  • R 1S independently represents a hydrogen atom or an alkyl group
  • a 1S independently represents —CO— or —CH 2 —
  • L 1S represents an nS-valent linking group.
  • NS represents an integer of 2 to 6. From the viewpoint of synthesis, it is preferred that all R 1S are the same group, and all A 1S are preferably the same group.
  • R 1S in formula (S-2) has the same meaning as R 1S in formula (S-1), and the preferred range is also the same.
  • nS is preferably an integer of 2 to 4.
  • L 1S as the nS-valent linking group in the formula (S-2) is, for example, a divalent linking group such as — (CH 2 ) mS — (mS represents an integer of 2 to 6), trimethylol, etc.
  • a trivalent linking group such as an isocyanuric ring having three propane residues, — (CH 2 ) pS — (pS represents an integer of 2 to 6)
  • a tetravalent linking group such as a pentaerythritol residue
  • five And hexavalent linking groups such as a divalent linking group and a dipentaerythritol residue.
  • polyfunctional mercapto compound a secondary thiol is more preferable.
  • polyfunctional mercapto compound examples include ethylene glycol bisthiopropionate, butanediol bisthiopropionate, trimethylolpropane tris (3-mercaptopropionate), and tris [(3-mercaptopropionyloxy) ethyl].
  • polyfunctional mercapto compounds include pentaerythritol tetrakis (3-mercaptobutyrate), 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mercaptobutyryloxyethyl)- 1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione is preferred, and pentaerythritol tetrakis (3-mercaptobutyrate) is more preferred.
  • a mercapto compound may be used individually by 1 type, or may use 2 or more types together.
  • the content of the mercapto compound is preferably 0.1 to 15% by mass, more preferably 0.5 to 10% by mass, based on the total solid content of the curable composition. More preferably, it is 1 to 5% by mass. It is excellent in the point of coexistence with film
  • the curable composition of the present invention may contain a surfactant.
  • a surfactant any of anionic, cationic, nonionic, or amphoteric surfactants can be used, but a preferred surfactant is a nonionic surfactant.
  • the surfactant is preferably a nonionic surfactant, and more preferably a fluorosurfactant.
  • commercially available products such as MegaFuck F142D, F172, F173, F176, F177, F183, F479, F482, F554, and F780 are commercially available.
  • F781, F781-F, R30, R08, F-472SF, BL20, R-61, R-90 (manufactured by DIC Corporation), Florard FC-135, FC-170C, FC-430, FC-431, Novec FC-4430 (manufactured by Sumitomo 3M Limited), Asahi Guard AG7105, 7000, 950, 7600, Surflon S-112, S-113, S-131, S -141, S-145, S-382, SC-101, SC-102, SC-103, SC-104, SC-1 05, SC-106 (manufactured by Asahi Glass Co., Ltd.), F-top EF351, 352, 801, 802 (manufactured by Mitsubishi Materials Denka Kasei), and Footgent 250 (manufactured by Neos Co., Ltd.).
  • KP manufactured by Shin-Etsu Chemical Co., Ltd.
  • Polyflow manufactured by Kyoeisha Chemical Co., Ltd.
  • F-Top manufactured by Mitsubishi Materials Denka Kasei Co., Ltd.
  • MegaFuck manufactured by DIC Corporation
  • FLORARD manufactured by Sumitomo 3M Co., Ltd.
  • Asahi Guard manufactured by Surflon (manufactured by Asahi Glass Co., Ltd.)
  • PolyFox manufactured by OMNOVA
  • the surfactant includes a structural unit A and a structural unit B represented by the following formula (W), and has a polystyrene-reduced weight average molecular weight (Mw) of 1 measured by gel permeation chromatography using tetrahydrofuran as a solvent.
  • W polystyrene-reduced weight average molecular weight
  • Mw polystyrene-reduced weight average molecular weight
  • a copolymer having a molecular weight of 1,000 or more and 10,000 or less can be given.
  • R W1 and R W3 each independently represent a hydrogen atom or a methyl group
  • R W2 represents a linear alkylene group having 1 to 4 carbon atoms
  • R W4 represents a hydrogen atom or 1 carbon atom.
  • L W represents an alkylene group having 3 to 6 carbon atoms
  • p and q are mass percentages representing a polymerization ratio
  • p is a numerical value of 10% by mass to 80% by mass.
  • Q represents a numerical value of 20% by mass to 90% by mass
  • r represents an integer of 1 to 18, and s represents an integer of 1 to 10.
  • L W is preferably a branched alkylene group represented by the following formula (W-2).
  • R W5 in formula (W-2) represents an alkyl group having 1 to 4 carbon atoms, and is preferably an alkyl group having 1 to 3 carbon atoms in terms of compatibility and wettability to the coated surface. Two or three alkyl groups are more preferred.
  • the weight average molecular weight (Mw) of the copolymer is more preferably from 1,500 to 5,000.
  • the content of the surfactant in the curable composition of the present invention is preferably 0.001 to 5.0 parts by mass with respect to 100 parts by mass in the total solid content of the curable composition. More preferred is 01 to 2.0 parts by mass. Only one type of surfactant may be included, or two or more types of surfactants may be included. When two or more types are included, the total amount is preferably within the above range.
  • the curable composition of the present invention may contain other components such as a plasticizer, a polymerization inhibitor, a thermal acid generator, an acid multiplier, an antioxidant, an epoxy compound, and an oxetane compound. it can.
  • these components for example, those described in JP2009-98616A, JP2009-244801A, and other known ones can be used.
  • various ultraviolet absorbers described in “New Development of Polymer Additives (Nikkan Kogyo Shimbun Co., Ltd.)”, metal deactivators, and the like may be added to the curable composition of the present invention.
  • the curable resin composition of the present invention may contain an antioxidant.
  • an antioxidant a well-known antioxidant can be contained. By adding an antioxidant, there is an advantage that coloring of the cured film can be prevented, or a decrease in film thickness due to decomposition can be reduced, and heat resistant transparency is excellent.
  • antioxidants include phosphorus antioxidants, amides, hydrazides, hindered amine antioxidants, sulfur antioxidants, phenol antioxidants, ascorbic acids, zinc sulfate, sugars, Examples thereof include nitrates, sulfites, thiosulfates, and hydroxylamine derivatives.
  • phenolic antioxidants hindered amine antioxidants, phosphorus antioxidants, and sulfur antioxidants are particularly preferable from the viewpoint of coloring the cured film and reducing the film thickness, with phenolic antioxidants being the most preferred. preferable.
  • These may be used individually by 1 type and may mix 2 or more types. Specific examples include the compounds described in paragraphs 0026 to 0031 of JP-A-2005-29515, and the compounds described in paragraphs 0106 to 0116 of JP-A-2011-227106. Embedded in the book.
  • Preferred commercial products include ADK STAB AO-60, ADK STAB AO-80, ADK STAB AO-412S (above, manufactured by ADEKA Corporation), IRGANOX 1035, and IRGANOX 1098 (above, manufactured by BASF).
  • the content of the antioxidant is not particularly limited, but is preferably 0.01 to 10% by mass and preferably 0.02 to 5% by mass with respect to the total solid content of the curable composition. More preferably, it is 0.05 to 4% by mass.
  • the curable resin composition of the present invention may contain a polymerization inhibitor.
  • a polymerization inhibitor is used to perform hydrogen donation (or hydrogen donation), energy donation (or energy donation), electron donation (or electron donation), etc. to the polymerization initiation radical component generated from the polymerization initiator by exposure. It is a substance that plays a role of deactivating polymerization initiation radicals and prohibiting polymerization initiation.
  • compounds described in paragraphs 0154 to 0173 of JP2007-334322A can be used.
  • Preferable compounds include phenothiazine, phenoxazine, hydroquinone, hydroquinone monomethyl ether, and 3,5-dibutyl-4-hydroxytoluene.
  • the content of the polymerization inhibitor is not particularly limited, but is preferably 0.0001 to 5% by mass with respect to the total solid content of the curable composition.
  • the total content of component A is preferably 40 to 99% by mass and the content of component B is 0.5 to 30% by mass with respect to the total solid content of the curable composition of the present invention.
  • the content of component C is preferably 0.1 to 20% by mass
  • the content of component E is preferably 0 to 30% by mass
  • the content of component F is 0 to 50% by mass.
  • the content of component G is preferably 0 to 20% by mass
  • the content of component H is preferably 0 to 15% by mass
  • the content of component W is 0 to 5% by mass.
  • the content of component D is preferably 100 to 3,000 parts by mass per 100 parts by mass of the total solid content of the curable composition.
  • the content of component A is preferably 40 to 80% by mass and the content of component B is 0.5 to 30% by mass with respect to the total organic solid content of the curable composition of the present invention.
  • the content of component C is preferably 0.1 to 20% by mass.
  • the total amount of component A, component B, and component C is preferably 85% by mass or more, more preferably 90% by mass or more, and 95% by mass with respect to the total organic solid content of the curable composition. % Or more is more preferable.
  • the curable composition of the present invention may contain other components such as a plasticizer, a thermal acid generator, and an acid multiplication agent as necessary.
  • these components for example, those described in JP2009-98616A, JP2009-244801A, and other known ones can be used.
  • various ultraviolet absorbers described in “New Development of Polymer Additives (Nikkan Kogyo Shimbun Co., Ltd.)”, metal deactivators, and the like may be added to the curable composition of the present invention.
  • the curable composition of the present invention does not contain polymer particles.
  • the cured product of the present invention is a cured product obtained by curing the curable composition of the present invention.
  • the cured product is preferably a cured film.
  • cured material of this invention is the hardened
  • the method for producing a cured product of the present invention is not particularly limited as long as it is a method for producing a cured product by curing the curable composition of the present invention, but preferably includes the following steps 1 to 3.
  • the method for producing a cured product of the present invention more preferably includes the following steps 1 to 4.
  • the method for producing a cured product of the present invention is preferably a method for producing a cured film.
  • the curable composition of the present invention is preferably applied onto a substrate to form a wet film containing a solvent.
  • the substrate Before applying the curable composition to the substrate, the substrate can be cleaned such as alkali cleaning or plasma cleaning. Furthermore, the substrate surface can be treated with hexamethyldisilazane or the like after cleaning the substrate. By performing this treatment, the adhesiveness of the curable composition to the substrate tends to be improved.
  • the substrate include inorganic substrates, resins, and resin composite materials.
  • the inorganic substrate include glass, quartz, silicon, silicon nitride, and a composite substrate in which molybdenum, titanium, aluminum, copper, or the like is vapor-deposited on such a substrate.
  • the resins include polybutylene terephthalate, polyethylene terephthalate, polyethylene naphthalate, polybutylene naphthalate, polystyrene, polycarbonate, polysulfone, polyethersulfone, polyarylate, allyl diglycol carbonate, polyamide, polyimide, polyamideimide, polyetherimide, poly Fluorine resins such as benzazole, polyphenylene sulfide, polycycloolefin, norbornene resin, polychlorotrifluoroethylene, liquid crystal polymer, acrylic resin, epoxy resin, silicone resin, ionomer resin, cyanate resin, crosslinked fumaric acid diester, cyclic polyolefin, aromatic Substrate made of synthetic resin such as aromatic ether, maleimide-olefin, cellulose, episulfide resin It is below. These substrates are rarely used in the above-described form, and usually, a multilayer laminated structure such as a TFT element is
  • the substrate preferably includes a metal film formed by sputtering.
  • the metal is preferably titanium, copper, aluminum, indium, tin, manganese, nickel, cobalt, molybdenum, tungsten, chromium, silver, neodymium and oxides or alloys thereof, molybdenum, titanium, aluminum, copper and More preferably, these alloys are used.
  • a metal and a metal oxide may be used individually by 1 type, or may use multiple types together.
  • the coating method on the substrate is not particularly limited.
  • a method such as an inkjet method, a slit coating method, a spray method, a roll coating method, a spin coating method, a casting coating method, a slit and spin method, or a printing method may be used. it can.
  • the solvent removal step (2) it is preferable to remove the solvent from the applied film by vacuum (vacuum) and / or heating to form a dry coating film on the substrate.
  • the heating conditions for the solvent removal step are preferably 70 to 130 ° C. and about 30 to 300 seconds.
  • a polymerization initiating species is generated from the polymerization initiator by light and / or heat, polymerization is performed, and the curable composition from which the organic solvent has been removed is cured.
  • it is preferably a step of curing at least by light.
  • the light irradiation means that can be used in the step (3) is not particularly limited as long as it can be cured, but a mercury lamp, a metal halide lamp, a light emitting diode (LED), a laser diode (LD), a gas / solid laser, and the like can be used. Can be mentioned.
  • the amount of exposure in the step (3) is not particularly limited, but is preferably 50 to 3,000 mJ / cm 2 .
  • a step of exposing the entire surface from the viewpoint of improving the film hardness may be included.
  • energy exposure of about 50 to 3,000 mJ / cm 2 with a mercury lamp or an LED lamp.
  • (3) pattern exposure can be performed in the curing step, and (3) development step can be performed after the curing step.
  • the pattern exposure method is preferably a method using a mask or a direct drawing method using a laser or the like. It is preferable from the viewpoint of promoting curing that the light irradiation such as the entire surface exposure and pattern exposure in the step (3) is performed in a state where oxygen is blocked.
  • Examples of means for blocking oxygen include exposure in a nitrogen atmosphere and provision of an oxygen blocking film.
  • a known method or a known developer can be used.
  • the pattern exposure method and the development method described in JP 2011-186398 A and JP 2013-83937 A can be suitably used.
  • the heating temperature when curing by heat is preferably 180 ° C. or lower, more preferably 150 ° C. or lower, and further preferably 130 ° C. or lower.
  • the lower limit is preferably 80 ° C. or higher, more preferably 90 ° C. or higher.
  • the heating method is not particularly limited, and a known method can be used. For example, a hot plate, an oven, an infrared heater, etc. are mentioned.
  • the heating time is preferably about 1 to 30 minutes in the case of a hot plate, and about 20 to 120 minutes in other cases. Within this range, the substrate and the device can be cured without damage.
  • the heating can be performed at a lower temperature at the beginning and later at a higher temperature (addition of a middle baking step. For example, heating at 90 ° C. for 30 minutes first and then heating at 120 ° C. for 30 minutes later) .
  • cured material of this invention includes the process (heat treatment process, post-baking process) of heat-processing hardened
  • the cured product obtained by curing the curable composition of the present invention can obtain a cured product with higher strength by performing a heat treatment.
  • the temperature for the heat treatment is preferably 100 ° C. to 180 ° C., more preferably 110 ° C. to 150 ° C.
  • the time for the heat treatment is not particularly limited, but is preferably 1 minute to 360 minutes, more preferably 10 minutes to 240 minutes, and further preferably 30 minutes to 120 minutes.
  • the said heat processing may be performed continuously by hardening with light and / or heat, and may be performed sequentially.
  • the cured film of the present invention can be suitably used as a protective film or an interlayer insulating film.
  • a cured film having sufficient hardness can be obtained, for example, a cured film having a pencil hardness of 2H or more can be obtained. Since the protective film formed by curing the curable composition of the present invention is excellent in cured film properties, it is useful for applications in organic EL display devices and liquid crystal display devices.
  • a resist pattern formed using the curable composition of the present invention is used as a partition as a structural member of a MEMS device. Used as part of it.
  • MEMS devices include parts such as SAW filters, BAW filters, gyro sensors, display micro shutters, image sensors, electronic paper, inkjet heads, biochips, and sealants. More specific examples are exemplified in JP-T-2007-522531, JP-A-2008-250200, JP-A-2009-263544, and the like.
  • the curable composition of the present invention is excellent in flatness and transparency, for example, the bank layer (16) and the planarization film (57) described in FIG. 2 of JP-A-2011-107476, JP-A-2010-
  • a chemical film (12), a pixel isolation insulating film (14), and the like can also be used to form a chemical film (12), a pixel isolation insulating film (14), and the like.
  • spacers for keeping the thickness of the liquid crystal layer in the liquid crystal display device constant color filters for the liquid crystal display device, color filter protective films, facsimiles, electronic copying machines, imaging of on-chip color filters such as solid-state image sensors It can also be suitably used for a microlens of an optical system or an optical fiber connector.
  • the organic EL display device of the present invention has the cured film of the present invention.
  • the organic EL display device of the present invention is not particularly limited except that it has a planarizing film and an interlayer insulating film formed using the curable composition of the present invention, and various known organic materials having various structures.
  • An EL display device and a liquid crystal display device can be given.
  • specific examples of TFT (Thin-Film Transistor) included in the organic EL display device of the present invention include amorphous silicon-TFT, low-temperature polysilicon-TFT, oxide semiconductor TFT, and the like. Since the cured film of the present invention is excellent in electrical characteristics, it can be preferably used in combination with these TFTs.
  • FIG. 1 is a conceptual diagram of an example of an organic EL display device.
  • a schematic cross-sectional view of a substrate in a bottom emission type organic EL display device is shown, and a planarizing film 4 is provided.
  • a bottom gate type TFT 1 is formed on a glass substrate 6, and an insulating film 3 made of Si 3 N 4 is formed so as to cover the TFT 1.
  • a contact hole (not shown) is formed in the insulating film 3, and then a wiring 2 (height: 1.0 ⁇ m) connected to the TFT 1 through the contact hole is formed on the insulating film 3.
  • the wiring 2 is used to connect the TFT 1 with an organic EL element formed between the TFTs 1 or in a later process.
  • a planarizing film 4 is formed on the insulating film 3 in a state where the unevenness due to the wiring 2 is embedded.
  • a bottom emission type organic EL element is formed on the planarizing film 4 so as to be connected to the wiring 2 through the contact hole 7.
  • the first electrode 5 corresponds to the anode of the organic EL element.
  • An insulating film 8 having a shape covering the periphery of the first electrode 5 is formed.
  • a hole transport layer, an organic light-emitting layer, and an electron transport layer are sequentially deposited through a desired pattern mask, and then a first layer made of Al is formed on the entire surface above the substrate.
  • An active matrix organic material in which two electrodes are formed and sealed by bonding using a sealing glass plate and an ultraviolet curable epoxy resin, and each organic EL element is connected to a TFT 1 for driving it.
  • An EL display device is obtained.
  • the liquid crystal display device of the present invention has the cured film of the present invention.
  • the liquid crystal display device of the present invention is not particularly limited except that it has a protective film, a planarizing film, and an interlayer insulating film formed using the curable composition of the present invention, and is known in various structures.
  • a liquid crystal display device can be mentioned.
  • specific examples of TFTs (Thin-Film Transistors) included in the liquid crystal display device of the present invention include amorphous silicon-TFTs, low-temperature polysilicon-TFTs, and oxide semiconductor TFTs. Since the cured film of the present invention is excellent in electrical characteristics, it can be preferably used in combination with these TFTs.
  • Liquid crystal driving methods that can be taken by the liquid crystal display device of the present invention include a TN (Twisted Nematic) method, a VA (Virtual Alignment) method, an IPS (In-Place-Switching) method, an FFS (Fringe Field Switching) method, and an OCB (OCB) method. (Optically Compensated Bend) method.
  • the cured film of the present invention can also be used in a COA (Color Filter on Array) type liquid crystal display device.
  • the organic insulating film (115) disclosed in JP-A-2005-284291 and JP-A-2005 -346054 can be used as the organic insulating film (212).
  • the alignment method of the liquid crystal alignment film that the liquid crystal display device of the present invention can take include a rubbing alignment method and a photo alignment method.
  • the polymer orientation may be supported by a PSA (Polymer Sustained Alignment) technique described in JP-A Nos. 2003-149647 and 2011-257734.
  • the curable composition of this invention and the cured film of this invention are not limited to the said use, but can be used for various uses.
  • a protective film for example, in addition to a planarization film and an interlayer insulating film, it is suitable for a protective film, a spacer for keeping the thickness of a liquid crystal layer in a liquid crystal display device constant, a microlens provided on a color filter in a solid-state imaging device, Can be used.
  • FIG. 2 is a conceptual cross-sectional view showing an example of the active matrix type liquid crystal display device 10.
  • the color liquid crystal display device 10 is a liquid crystal panel having a backlight unit 12 on the back surface, and the liquid crystal panel includes all pixels disposed between two glass substrates 14 and 15 having a polarizing film attached thereto.
  • the elements of the TFT 16 corresponding to are arranged.
  • Each element formed on the glass substrate is wired with an ITO transparent electrode 19 that forms a pixel electrode through a contact hole 18 formed in the cured film 17.
  • an RGB color filter 22 in which a liquid crystal 20 layer and a black matrix are arranged is provided.
  • the light source of the backlight is not particularly limited, and a known light source can be used.
  • the liquid crystal display device can be a 3D (stereoscopic) type or a touch panel type. Further, it can be made flexible, and used as the second interlayer insulating film (48) described in JP2011-145686A and the interlayer insulating film (520) described in JP2009-258758A. Can do.
  • FIG. 3 is a conceptual diagram of an example of a liquid crystal display device having a touch panel function.
  • the cured film of the present invention is preferably applied to a protective film between the layers in FIG. 3, and is also preferably applied to an interlayer insulating film that separates the detection electrodes of the touch panel.
  • reference numeral 110 denotes a pixel substrate
  • 140 denotes a liquid crystal layer
  • 120 denotes a counter substrate
  • 130 denotes a sensor unit.
  • the pixel substrate 110 includes a polarizing plate 111, a transparent substrate 112, a common electrode 113, an insulating layer 114, a pixel electrode 115, and an alignment film 116 in order from the lower side of FIG.
  • the counter substrate 120 includes an alignment film 121, a color filter 122, and a transparent substrate 123 in order from the lower side of FIG.
  • the sensor unit 130 includes a retardation film 124, an adhesive layer 126, and a polarizing plate 127.
  • reference numeral 125 denotes a sensor detection electrode.
  • the cured film of the present invention includes an insulating layer (114) (also referred to as an interlayer insulating film) in the pixel substrate portion, various protective films (not shown), various protective films (not shown) in the pixel substrate portion, and a counter substrate portion. Can be used for various protective films (not shown), various protective films (not shown) for the sensor portion, and the like.
  • a statically driven liquid crystal display device can display a pattern with high designability by applying the present invention.
  • the present invention can be applied as an insulating film of a polymer network type liquid crystal as described in JP-A-2001-125086.
  • FIG. 4 is a conceptual diagram of the configuration of another example of a liquid crystal display device having a touch panel function.
  • a lower display panel 200 corresponding to a thin film transistor display panel provided with a thin film transistor (TFT) 440, and a color filter display panel provided with a plurality of color filters 330 on the surface facing the lower display panel 200 and facing the lower display panel 200.
  • TFT thin film transistor
  • the liquid crystal layer 400 formed between the lower display panel 200 and the upper display panel 300.
  • the liquid crystal layer 400 includes liquid crystal molecules (not shown).
  • the lower display panel 200 is disposed on the first insulating substrate 210, the thin film transistor (TFT) disposed on the first insulating substrate 210, the insulating film 280 formed on the upper surface of the thin film transistor (TFT), and the insulating film 280.
  • a pixel electrode 290 is included.
  • the thin film transistor (TFT) may include a gate electrode 220, a gate insulating film 240 covering the gate electrode 220, a semiconductor layer 250, ohmic contact layers 260 and 262, a source electrode 270, and a drain electrode 272.
  • a contact hole 282 is formed in the insulating film 280 so that the drain electrode 272 of the thin film transistor (TFT) is exposed.
  • the upper display panel 300 is disposed on one surface of the second insulating substrate 310, the light shielding members 320 arranged in a matrix, the color filter 330 disposed on the second insulating substrate 310, and the color filter 330. And a common electrode 370 for applying a voltage to the liquid crystal layer 400 corresponding to the pixel electrode 290 of the lower display panel 200.
  • a sensing electrode 410, an insulating film 420, a driving electrode 430, and a protective film 280 are disposed on the other surface of the second insulating substrate 310.
  • the sensing electrode 410, the insulating film 420, the drive electrode 430, and the like, which are constituent elements of the touch screen are formed together. be able to.
  • a cured film obtained by curing the curable composition of the present invention can be suitably used for the insulating film 420.
  • Synthesis of A-9 Synthesis and purification were conducted in the same manner as in Synthesis Example 1 except that the hexamethylene diisocyanate trimer in Synthesis Example 1 was changed to hexamethylene diisocyanate (manufactured by Tokyo Chemical Industry Co., Ltd.). A 10-functional urethane acrylate A-9 was obtained.
  • A-1 NK Oligo U-15HA (manufactured by Shin-Nakamura Chemical Co., Ltd., 15 functional groups)
  • A-2 UA-306H (manufactured by Kyoeisha Chemical Co., Ltd., 6 functional groups)
  • A-3 Laromer UA-9050 (manufactured by BASF, 8 functional groups)
  • A-4 NK Oligo U-10HA (manufactured by Shin-Nakamura Chemical Co., Ltd., 10 functional groups)
  • A-8 Compound synthesized according to Synthesis Example 1 (Synthetic product, 15 functional groups)
  • A-7 [Other polymerizable compounds having an ethylenically unsaturated bond] A-7: A-DPH (manufactured by Shin-Nakamura Chemical Co., Ltd., dipentaerythritol hexaacrylate, functional group number 6)
  • B-1 Compound B-1 below (Synthetic product, oxime ester compound)
  • B-2 Irgacure 379 (manufactured by BASF), acetophenone compound
  • F-1 PMA-ST (manufactured by Nissan Chemical Co., Ltd., silica fine particles, average particle size of 10 to 15 nm)
  • F-2 MIBK-ST-L (Nissan Chemical Co., Ltd., silica fine particles, average particle size 40-50 nm)
  • H-1 Karenz MT-PE1 (manufactured by Showa Denko KK)
  • H-2 Mercaptobenzothiazole (Tokyo Chemical Industry Co., Ltd.)
  • I-1 Irganox 1035 (manufactured by BASF)
  • I-2 Hydroquinone monomethyl ether (manufactured by Tokyo Chemical Industry Co., Ltd.)
  • reaction solution was added dropwise to 150 ml of distilled water cooled to 0 ° C., and the precipitated solid was subjected to suction filtration, washed with 200 ml of isopropyl alcohol cooled to 0 ° C., dried, and then compound B-1 (yield 19.5 g, yield). 99%).
  • Examples 1 to 41 and Comparative Examples 1 to 8) ⁇ Preparation of curable composition> As shown in Tables 1 to 4 below, each component was blended and stirred to obtain a solvent solution, which was filtered through a polytetrafluoroethylene filter having a pore size of 0.3 ⁇ m. Examples 1-41 and Comparative Example 1 Each of -8 curable compositions was obtained.
  • the unit of each component in the following Tables 1 to 4 is parts by mass excluding the ratio of component A + component B + component C in the organic solid content. Moreover, the mass part of solid content conversion is shown except an organic solvent.
  • a liquid crystal display device schematically shown in FIG. 4 was prepared using the compositions of the examples and comparative examples as protective films.
  • the protective film (insulating film, 420) was ink-jet coated with the curable composition obtained in each example of the present invention, pre-baked at 100 ° C. for 120 seconds, and 500 mJ / cm with a high-pressure mercury lamp. 2 (i-line conversion) light irradiation was performed, and further, baking was performed in an oven at 125 ° C. for 60 minutes.
  • the other part of the display device was manufactured according to Japanese Patent Laid-Open No. 2013-168125. After lighting for 1,000 hours under conditions of 60 ° C.
  • the cured film obtained by curing the curable composition of the present invention has adhesion to the substrate, surface roughness of the film surface, and touch panel under high temperature and high humidity. It was excellent in characteristics.

Abstract

The objective of the present invention is to provide: a curable composition with which a cured film can be obtained having excellent adhesion to substrates, surface roughness in the film surface, and touch panel properties under high temperatures and high humidities; a cured film which is obtained by curing the curable composition and a method for producing the same; and an organic EL display device and a liquid crystal display device which comprise the cured film. This curable composition comprises a polymerizable compound having an ethylenic unsaturated bond as component (A), a polymerization initiator as component (B), a blocked isocyanate compound as component (C) and an organic solvent as component (D), wherein the component (A) includes a hexa- or higher functional urethane (meth)acrylate, the proportion of the hexa- or higher functional urethane (meth)acrylate in the component (A) is 70 to 100 mass%, and the total amount of the components (A), (B), and (C) is 85 mass% or more with respect to the total organic solids of the curable composition.

Description

硬化性組成物、硬化膜の製造方法、硬化膜、及び、表示装置Curable composition, method for producing cured film, cured film, and display device
 本発明は、硬化性組成物、硬化膜の製造方法、硬化膜、並びに、上記硬化膜を用いた有機EL表示装置及び液晶表示装置に関する。 The present invention relates to a curable composition, a method for producing a cured film, a cured film, and an organic EL display device and a liquid crystal display device using the cured film.
 液晶表示装置、有機EL表示装置等のフラットパネルディスプレイが広く使用されている。従来、液晶表示素子、集積回路素子、固体撮像素子、有機ELなどの電子部品においては、一般に、電子部品表面の平坦性を付与するための平坦化膜、電子部品の劣化や損傷を防ぐための保護膜や絶縁性を保つための層間絶縁膜を形成する際に硬化性組成物が使用される。例えば、TFT型液晶表示素子は、ガラス基板上に偏光板を設け、酸化インジウムスズ(ITO)等の透明導電回路層及び薄膜トランジスタ(TFT)を形成し、層間絶縁膜で被覆して背面板とする一方、ガラス基板上に偏光板を設け、必要に応じてブラックマトリックス層及びカラーフィルタ層のパターンを形成し、更に透明導電回路層、層間絶縁膜を順次形成して上面板とし、この背面板と上面板とをスペーサーを介して対向させて両板間に液晶を封入して製造される。
 従来の硬化性組成物としては、特許文献1又は2に記載された組成物が知られている。
Flat panel displays such as liquid crystal display devices and organic EL display devices are widely used. Conventionally, in an electronic component such as a liquid crystal display element, an integrated circuit element, a solid-state imaging element, and an organic EL, generally, a flattening film for imparting flatness to the surface of the electronic component, and for preventing deterioration and damage of the electronic component A curable composition is used when forming a protective film or an interlayer insulating film for maintaining insulation. For example, in a TFT type liquid crystal display element, a polarizing plate is provided on a glass substrate, a transparent conductive circuit layer such as indium tin oxide (ITO) and a thin film transistor (TFT) are formed, and covered with an interlayer insulating film to form a back plate. On the other hand, a polarizing plate is provided on a glass substrate, a pattern of a black matrix layer and a color filter layer is formed as necessary, and a transparent conductive circuit layer and an interlayer insulating film are sequentially formed as a top plate, and this back plate and The liquid crystal is manufactured by enclosing the liquid crystal between the two plates with the upper plate facing the spacer.
As a conventional curable composition, the composition described in patent document 1 or 2 is known.
特開2011-126921号公報JP 2011-126921 A 特開2010-39475号公報JP 2010-39475 A
 本発明が解決しようとする課題は、基板に対する密着性、膜表面の表面あれ、及び、高温高湿下でのタッチパネル特性に優れた硬化膜を得ることができる硬化性組成物、上記硬化性組成物を硬化させた硬化膜及びその製造方法、並びに、上記硬化膜を有する有機EL表示装置及び液晶表示装置を提供することである。 Problems to be solved by the present invention include a curable composition capable of obtaining a cured film excellent in adhesion to a substrate, surface roughness of the film surface, and touch panel characteristics under high temperature and high humidity, and the above curable composition It is providing the cured film which hardened the thing, its manufacturing method, and the organic electroluminescent display device and liquid crystal display device which have the said cured film.
 本発明の上記課題は、以下の<1>、<7>、<9>、<11>又は<12>に記載の手段により解決された。好ましい実施態様である<2>~<6>、<8>及び<10>と共に以下に記載する。
 <1>成分Aとして、エチレン性不飽和結合を有する重合性化合物、成分Bとして、重合開始剤、成分Cとして、ブロックイソシアネート化合物、及び、成分Dとして、有機溶剤、を含有し、成分Aが、6官能以上のウレタン(メタ)アクリレートを含み、成分A中の上記6官能以上のウレタン(メタ)アクリレートの割合が、70~100質量%であり、成分Aと成分Bと成分Cとの合計量が硬化性組成物の全有機固形分に対し85質量%以上であることを特徴とする硬化性組成物、
 <2>成分Bが、オキシムエステル化合物を含む、<1>に記載の硬化性組成物、
 <3>成分Cが、トリレンジイソシアネート、ジフェニルメタンジイソシアネート、ヘキサメチレンジイソシアネート、イソホロンジイソシアネート、及び、これらの多量体よりなる群から選ばれた化合物を保護したブロックイソシアネート化合物である、<1>又は<2>に記載の硬化性組成物、
 <4>成分Cが、オキシム化合物、ラクタム化合物、フェノール化合物、アルコール化合物、アミン化合物、活性メチレン化合物、又は、ピラゾール化合物のいずれかによりブロック構造が形成された化合物である、<1>~<3>のいずれか1つに記載の硬化性組成物、
 <5>成分Aと成分Cの重量比率が、100:1~10:1である、<1>~<4>のいずれか1つに記載の硬化性組成物、
 <6>無機粒子を更に含有する、<1>~<5>のいずれか1つに記載の硬化性組成物、
 <7>工程1として、<1>~<6>のいずれか1つに記載の硬化性組成物を基板上に塗布する工程、工程2として、塗布された硬化性組成物から有機溶剤を除去する溶剤除去工程、及び、工程3として、有機溶剤が除去された硬化性組成物を光及び/又は熱により硬化する硬化工程、を含むことを特徴とする硬化膜の製造方法、
 <8>上記硬化工程が、有機溶剤が除去された硬化性組成物を光により硬化する工程であり、上記硬化工程後、硬化性組成物を光により硬化した硬化膜を熱処理する熱処理工程を更に含む、<7>に記載の硬化膜の製造方法、
 <9><1>~<6>のいずれか1つに記載の硬化性組成物を硬化してなる硬化膜、
 <10>保護膜である、<9>に記載の硬化膜、
 <11><9>又は<10>に記載の硬化膜を有する、有機EL表示装置、
 <12><9>又は<10>に記載の硬化膜を有する、液晶表示装置。
The above-mentioned problems of the present invention have been solved by means described in the following <1>, <7>, <9>, <11> or <12>. It is described below together with <2> to <6>, <8> and <10> which are preferred embodiments.
<1> Component A contains a polymerizable compound having an ethylenically unsaturated bond, Component B contains a polymerization initiator, Component C contains a blocked isocyanate compound, and Component D contains an organic solvent, , A urethane (meth) acrylate having 6 or more functional groups, and the ratio of the urethane (meth) acrylate having 6 or more functional groups in the component A is 70 to 100% by mass, and the sum of the component A, the component B and the component C is A curable composition characterized in that the amount is 85% by mass or more based on the total organic solid content of the curable composition;
<2> The curable composition according to <1>, wherein Component B contains an oxime ester compound,
<3> Component C is a blocked isocyanate compound that protects a compound selected from the group consisting of tolylene diisocyanate, diphenylmethane diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, and multimers thereof, <1> or <2 > Curable composition as described in>
<4> Component C is a compound in which a block structure is formed by any one of an oxime compound, a lactam compound, a phenol compound, an alcohol compound, an amine compound, an active methylene compound, or a pyrazole compound, <1> to <3 > The curable composition according to any one of
<5> The curable composition according to any one of <1> to <4>, wherein the weight ratio of Component A to Component C is 100: 1 to 10: 1.
<6> The curable composition according to any one of <1> to <5>, further containing inorganic particles,
<7> Step 1 is the step of applying the curable composition according to any one of <1> to <6> on the substrate, and Step 2 is to remove the organic solvent from the applied curable composition. A process for removing the solvent, and a process for curing the curable composition from which the organic solvent has been removed as a process 3 by light and / or heat.
<8> The curing step is a step of curing the curable composition from which the organic solvent has been removed with light, and further includes a heat treatment step of heat-treating a cured film obtained by curing the curable composition with light after the curing step. A method for producing a cured film according to <7>,
<9> A cured film obtained by curing the curable composition according to any one of <1> to <6>,
<10> The cured film according to <9>, which is a protective film,
<11> An organic EL display device having the cured film according to <9> or <10>,
<12> A liquid crystal display device having the cured film according to <9> or <10>.
 本発明によれば、基板に対する密着性、膜表面の表面あれ、及び、高温高湿下でのタッチパネル特性に優れた硬化膜を得ることができる硬化性組成物、上記硬化性組成物を硬化させた硬化膜及びその製造方法、並びに、上記硬化膜を有する有機EL表示装置及び液晶表示装置を提供することができた。 According to the present invention, a curable composition capable of obtaining a cured film having excellent adhesion to a substrate, surface roughness of the film surface, and touch panel characteristics under high temperature and high humidity, the curable composition is cured. The cured film, the manufacturing method thereof, and the organic EL display device and liquid crystal display device having the cured film can be provided.
有機EL表示装置の一例の構成概念図を示す。ボトムエミッション型の有機EL表示装置における基板の模式的断面図を示し、平坦化膜4を有している。1 shows a conceptual diagram of a configuration of an example of an organic EL display device. A schematic cross-sectional view of a substrate in a bottom emission type organic EL display device is shown, and a planarizing film 4 is provided. 液晶表示装置の一例の構成概念図を示す。液晶表示装置におけるアクティブマトリックス基板の模式的断面図を示し、層間絶縁膜である硬化膜17を有している。1 is a conceptual diagram of a configuration of an example of a liquid crystal display device. The schematic sectional drawing of the active matrix substrate in a liquid crystal display device is shown, and it has the cured film 17 which is an interlayer insulation film. タッチパネルの機能を有する液晶表示装置の一例の構成概念図を示す。1 is a conceptual diagram illustrating a configuration of an example of a liquid crystal display device having a touch panel function. タッチパネルの機能を有する液晶表示装置の他の一例の構成概念図を示す。FIG. 5 shows a conceptual diagram of a configuration of another example of a liquid crystal display device having a touch panel function.
 以下において、本発明の内容について詳細に説明する。以下に記載する構成要件の説明は、本発明の代表的な実施態様に基づいてなされることがあるが、本発明はそのような実施態様に限定されるものではない。なお、本願明細書において「~」とはその前後に記載される数値を下限値及び上限値として含む意味で使用される。また、本発明における有機EL素子とは、有機エレクトロルミネッセンス素子のことをいう。
 本明細書における基(原子団)の表記において、置換及び無置換を記していない表記は、置換基を有さないものと共に置換基を有するものをも包含するものである。例えば、「アルキル基」とは、置換基を有さないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含するものである。
 なお、本明細書中において、“(メタ)アクリレート”はアクリレート及びメタクリレートを表し、“(メタ)アクリル”はアクリル及びメタクリルを表し、“(メタ)アクリロイル”はアクリロイル及びメタクリロイルを表す。
 本発明において、「エチレン性不飽和結合を有する重合性化合物」等を、単に「成分A」等ともいう。
 また、本発明において、「質量%」と「重量%」とは同義であり、「質量部」と「重量部」とは同義である。
 また、本発明において、好ましい態様の組み合わせは、より好ましい。
Hereinafter, the contents of the present invention will be described in detail. The description of the constituent elements described below may be made based on typical embodiments of the present invention, but the present invention is not limited to such embodiments. In the present specification, “to” is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value. The organic EL element in the present invention refers to an organic electroluminescence element.
In the notation of groups (atomic groups) in this specification, the notation that does not indicate substitution and non-substitution includes not only those having no substituent but also those having a substituent. For example, the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
In the present specification, “(meth) acrylate” represents acrylate and methacrylate, “(meth) acryl” represents acryl and methacryl, and “(meth) acryloyl” represents acryloyl and methacryloyl.
In the present invention, “polymerizable compound having an ethylenically unsaturated bond” or the like is also simply referred to as “component A” or the like.
In the present invention, “mass%” and “wt%” are synonymous, and “part by mass” and “part by weight” are synonymous.
In the present invention, a combination of preferred embodiments is more preferred.
 本発明では、(成分A)エチレン性不飽和結合を有する重合性化合物の分子量はESI-MS(エレクトロスプレーイオン化質量分析法)により測定するものとする。また、ポリマー成分については、テトラヒドロフラン(THF)を溶剤とした場合のゲルパーミエーションクロマトグラフィで測定されるポリスチレン換算の重量平均分子量である。
 なお、(A)エチレン性不飽和結合を有する重合性化合物であっても、分子量5,001以上の化合物については、テトラヒドロフラン(THF)を溶剤とした場合のゲルパーミエーションクロマトグラフィ(GPC)で測定されるポリスチレン換算の重量平均分子量である。
In the present invention, the molecular weight of the polymerizable compound having (Component A) an ethylenically unsaturated bond is measured by ESI-MS (electrospray ionization mass spectrometry). Moreover, about a polymer component, it is the weight average molecular weight of polystyrene conversion measured by the gel permeation chromatography when tetrahydrofuran (THF) is used as a solvent.
Note that (A) a polymerizable compound having an ethylenically unsaturated bond is measured by gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent for compounds having a molecular weight of 5,001 or more. Polystyrene equivalent weight average molecular weight.
(硬化性組成物)
 本発明の硬化性組成物(以下、単に「組成物」ともいう。)は、(成分A)エチレン性不飽和結合を有する重合性化合物、(成分B)重合開始剤、(成分C)ブロックイソシアネート化合物、及び、(成分D)有機溶剤、を含有し、成分Aが、6官能以上のウレタン(メタ)アクリレートを含み、成分A中の上記6官能以上のウレタン(メタ)アクリレートの割合が、70~100質量%であり、成分Aと成分Bと成分Cとの合計量が硬化性組成物の全有機固形分中の85質量%以上であることを特徴とする。
 本発明の硬化性組成物は、更に、(成分E)アルコキシシラン化合物、(成分F)無機粒子、(成分G)(メタ)アクリル共重合体、(成分H)メルカプト化合物、(成分W)界面活性剤等、の他の成分を含んでいてもよい。
(Curable composition)
The curable composition of the present invention (hereinafter also simply referred to as “composition”) includes (Component A) a polymerizable compound having an ethylenically unsaturated bond, (Component B) a polymerization initiator, and (Component C) a blocked isocyanate. A component and (Component D) an organic solvent, Component A contains a hexafunctional or higher urethane (meth) acrylate, and the ratio of the above hexafunctional or higher urethane (meth) acrylate in Component A is 70. The total amount of Component A, Component B and Component C is 85% by mass or more based on the total organic solid content of the curable composition.
The curable composition of the present invention further comprises (Component E) an alkoxysilane compound, (Component F) inorganic particles, (Component G) (meth) acrylic copolymer, (Component H) mercapto compound, (Component W) interface. Other components such as an activator may be included.
 本発明の硬化性組成物は、重合後、又は、重合に続けて、得られた硬化膜等の硬化物を熱処理することにより、硬化物の強度がより高くなる組成物であることが好ましく、成分Bとして光重合開始剤を含有し、光による重合後、得られた硬化物を熱処理することにより、硬化物の強度がより高くなる組成物であることがより好ましい。 The curable composition of the present invention is preferably a composition in which the strength of the cured product is increased by heat-treating the cured product such as the obtained cured film after polymerization or subsequent to polymerization, It is more preferable that the composition contains a photopolymerization initiator as Component B, and is a composition in which the strength of the cured product is further increased by heat-treating the obtained cured product after polymerization by light.
(成分A)エチレン性不飽和結合を有する重合性化合物
 本発明の硬化性組成物は、(成分A)エチレン性不飽和結合を有する重合性化合物を含有する。
 成分Aは、エチレン性不飽和結合を有していればよく、低分子の化合物であっても、オリゴマーであっても、ポリマーであってもよい。
 また、成分Aの含有量は、硬化性組成物の全固形分に対し、40質量%以上であることが好ましく、50質量%以上であることがより好ましく、60質量%以上であることが更に好ましく、70質量%以上であることが特に好ましい。上限は特に定めるものではないが、例えば、99質量%以下であることが好ましく、95質量%以下であることがより好ましい。また、組成物が後述する無機粒子を配合する場合、80質量%以下であることが好ましく、75質量%以下であることがより好ましい。なお、硬化性組成物における「固形分」とは、有機溶剤等の揮発性成分を除いた成分を表す。
(Component A) Polymerizable compound having an ethylenically unsaturated bond The curable composition of the present invention contains (Component A) a polymerizable compound having an ethylenically unsaturated bond.
Component A only needs to have an ethylenically unsaturated bond, and may be a low molecular weight compound, an oligomer, or a polymer.
The content of component A is preferably 40% by mass or more, more preferably 50% by mass or more, and further preferably 60% by mass or more, based on the total solid content of the curable composition. It is preferably 70% by mass or more. The upper limit is not particularly defined, but is preferably 99% by mass or less, and more preferably 95% by mass or less, for example. Moreover, when mix | blending the inorganic particle which a composition mentions later, it is preferable that it is 80 mass% or less, and it is more preferable that it is 75 mass% or less. In addition, "solid content" in a curable composition represents the component except volatile components, such as an organic solvent.
<6官能以上のウレタン(メタ)アクリレート>
 成分Aは、6官能以上のウレタン(メタ)アクリレートを含み、成分A中の上記6官能以上のウレタン(メタ)アクリレートの割合が、70~100質量%であり、75~100質量%であることが好ましく、90~100質量%であることがより好ましく、95~100質量%であることが更に好ましい。上記態様であると、本発明の効果がより効果的に発揮される。
 また、6官能以上のウレタン(メタ)アクリレートの含有量は、硬化性組成物の全固形分に対し、40質量%以上であることが好ましく、50質量%以上であることがより好ましく、65質量%以上であることが更に好ましく、また、上限は特に定めるものではないが、95質量%以下であることが好ましい。
 また、6官能以上のウレタン(メタ)アクリレートの含有量は、硬化性組成物の全有機固形分に対して、60質量%以上であることが好ましく、70質量%以上であることがより好ましく、80質量%以上であることが更に好ましく、80~95質量%であることが特に好ましい。なお、全有機固形分とは硬化性組成物の全固形分中から無機物(無機粒子等)を除いた固形分のことをいう。
 また、6官能以上のウレタン(メタ)アクリレートの含有量は、硬化性組成物の有機固形分の、60質量%以上が好ましく、70質量%以上がより好ましく、80質量%以上が最も好ましい。なお、ここでいう有機固形分とは、組成物の固形分中からポリマー粒子などの有機粒子、金属酸化物粒子などの無機粒子、および有機無機顔料などの顔料成分を除いた、有機物の固形分を意味する。
 6官能以上のウレタン(メタ)アクリレートにおける(メタ)アクリロキシ基の数は、8以上であることが好ましく、10以上であることがより好ましく、12以上であることが更に好ましい。上記態様であると、本発明の効果がより効果的に発揮される。
 また、上記(メタ)アクリロキシ基の数の上限は特に制限はないが、50以下であることが好ましく、30以下であることがより好ましく、20以下であることが更に好ましい。
 本発明の硬化性組成物は、6官能以上のウレタン(メタ)アクリレートを1種類のみ含んでいてもよいし、2種類以上含んでいてもよい。2種類以上含む場合は、合計量が上記範囲となることが好ましい。
<6 or more urethane (meth) acrylate>
Component A contains hexafunctional or higher urethane (meth) acrylate, and the ratio of the above hexafunctional or higher urethane (meth) acrylate in Component A is 70 to 100% by mass, and 75 to 100% by mass. It is preferably 90 to 100% by mass, more preferably 95 to 100% by mass. The effect of this invention is more effectively exhibited as it is the said aspect.
The content of hexafunctional or higher urethane (meth) acrylate is preferably 40% by mass or more, more preferably 50% by mass or more, and 65% by mass with respect to the total solid content of the curable composition. The upper limit is not particularly defined, but it is preferably 95% by mass or less.
The content of hexafunctional or higher urethane (meth) acrylate is preferably 60% by mass or more, more preferably 70% by mass or more, based on the total organic solid content of the curable composition. The content is more preferably 80% by mass or more, and particularly preferably 80 to 95% by mass. The total organic solid content means a solid content obtained by removing inorganic substances (such as inorganic particles) from the total solid content of the curable composition.
Moreover, 60 mass% or more of the organic solid content of a curable composition is preferable, as for content of 6 or more functional urethane (meth) acrylate, 70 mass% or more is more preferable, and 80 mass% or more is the most preferable. The organic solid content here means the solid content of the organic material excluding organic particles such as polymer particles, inorganic particles such as metal oxide particles, and pigment components such as organic inorganic pigments from the solid content of the composition. Means.
The number of (meth) acryloxy groups in the hexafunctional or higher-functional urethane (meth) acrylate is preferably 8 or more, more preferably 10 or more, and still more preferably 12 or more. The effect of this invention is more effectively exhibited as it is the said aspect.
The upper limit of the number of the (meth) acryloxy groups is not particularly limited, but is preferably 50 or less, more preferably 30 or less, and still more preferably 20 or less.
The curable composition of the present invention may contain only one type of hexafunctional or higher urethane (meth) acrylate, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.
 6官能以上のウレタン(メタ)アクリレートの分子量は、硬化膜硬度の観点から、500~20,000が好ましく、650~6,000がより好ましく、800~3,000が更に好ましい。上記態様であると、本発明の効果がより効果的に発揮される。なお、6官能以上のウレタン(メタ)アクリレートの分子量は、分子量が1,000以上の場合は、GPCのポリスチレン換算数平均分子量である。 The molecular weight of the hexafunctional or higher urethane (meth) acrylate is preferably 500 to 20,000, more preferably 650 to 6,000, and still more preferably 800 to 3,000, from the viewpoint of cured film hardness. The effect of this invention is more effectively exhibited as it is the said aspect. In addition, the molecular weight of hexafunctional or higher urethane (meth) acrylate is the number average molecular weight in terms of polystyrene of GPC when the molecular weight is 1,000 or more.
 6官能以上のウレタン(メタ)アクリレートにおける(メタ)アクリロキシ基は、アクリロキシ基、メタクリロキシ基のいずれであっても、両方であってもよいが、アクリロキシ基であることが好ましい。
 6官能以上のウレタン(メタ)アクリレートにおけるウレタン結合の数は、特に制限はないが、1~30であることが好ましく、1~20であることがより好ましく、2~10であることが更に好ましく、2~5であることが特に好ましく、2又は3であることが最も好ましい。
 6官能以上のウレタン(メタ)アクリレートは、6官能以上の脂肪族ウレタン(メタ)アクリレートであることが好ましい。
 また、6官能以上のウレタン(メタ)アクリレートは、イソシアヌル環構造を有することが好ましい。
 また、6官能以上のウレタン(メタ)アクリレートは、1以上のウレタン結合を有するコア部分と、コア部分に結合し、かつ1以上の(メタ)アクリロキシ基を有する末端部分からなる化合物であることが好ましく、上記コア部分に、2個以上の上記末端部分が結合した化合物であることがより好ましく、上記コア部分に、2~5個の上記末端部分が結合した化合物であることが更に好ましく、上記コア部分に、2又は3個の上記末端部分が結合した化合物であることが特に好ましい。
The (meth) acryloxy group in the hexafunctional or higher urethane (meth) acrylate may be either an acryloxy group or a methacryloxy group, or may be both, but is preferably an acryloxy group.
The number of urethane bonds in the hexa- or more functional urethane (meth) acrylate is not particularly limited, but is preferably 1 to 30, more preferably 1 to 20, and still more preferably 2 to 10. It is particularly preferably 2 to 5, and most preferably 2 or 3.
The hexafunctional or higher urethane (meth) acrylate is preferably a hexafunctional or higher aliphatic urethane (meth) acrylate.
Moreover, it is preferable that hexafunctional or more urethane (meth) acrylate has an isocyanuric ring structure.
The hexafunctional or higher urethane (meth) acrylate is a compound comprising a core portion having one or more urethane bonds and a terminal portion bonded to the core portion and having one or more (meth) acryloxy groups. Preferably, the core part is more preferably a compound having two or more terminal parts bonded thereto, more preferably a compound having 2 to 5 terminal parts bonded to the core part. A compound in which 2 or 3 of the above terminal moieties are bound to the core part is particularly preferred.
 6官能以上のウレタン(メタ)アクリレートは、下記式(Ae-1)又は式(Ae-2)で表される基を少なくとも有する化合物であることが好ましく、下記式(Ae-1)で表される基を少なくとも有する化合物であることがより好ましい。また、6官能以上のウレタン(メタ)アクリレートは、下記式(Ae-1)で表される基及び式(Ae-2)で表される基よりなる群から選ばれた基を2以上有する化合物であることがより好ましい。
 また、6官能以上のウレタン(メタ)アクリレートにおける上記末端部分は、下記式(Ae-1)又は式(Ae-2)で表される基であることが好ましい。
The hexafunctional or more urethane (meth) acrylate is preferably a compound having at least a group represented by the following formula (Ae-1) or (Ae-2), and represented by the following formula (Ae-1). It is more preferable that the compound has at least a group. The hexafunctional or higher urethane (meth) acrylate is a compound having two or more groups selected from the group consisting of a group represented by the following formula (Ae-1) and a group represented by the formula (Ae-2) It is more preferable that
Further, the terminal portion in the hexafunctional or higher functional urethane (meth) acrylate is preferably a group represented by the following formula (Ae-1) or (Ae-2).
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000001
 式(Ae-1)及び式(Ae-2)中、Rはそれぞれ独立に、アクリロイル基又はメタクリロイル基を表し、波線部分は他の構造との結合位置を表す。 In the formula (Ae-1) and the formula (Ae-2), R each independently represents an acryloyl group or a methacryloyl group, and a wavy line portion represents a bonding position with another structure.
 また、6官能以上のウレタン(メタ)アクリレートは、下記式(Ac-1)又は式(Ac-2)で表される基を少なくとも有する化合物であることが好ましく、下記式(Ac-1)で表される基を少なくとも有する化合物であることがより好ましい。
 また、6官能以上のウレタン(メタ)アクリレートにおける上記コア部分は、硬度、低温硬化性、密着性、溶剤耐性、塗布性の観点で、下記式(Ac-1)又は式(Ac-2)で表される基であることが好ましい。
The hexafunctional or higher urethane (meth) acrylate is preferably a compound having at least a group represented by the following formula (Ac-1) or (Ac-2), and represented by the following formula (Ac-1): It is more preferable that the compound has at least the group represented.
In addition, the above-mentioned core portion in the urethane (meth) acrylate having 6 or more functionalities is represented by the following formula (Ac-1) or (Ac-2) from the viewpoints of hardness, low-temperature curability, adhesion, solvent resistance, and coatability. It is preferable that it is group represented.
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
 式(Ac-1)及び式(Ac-2)中、L1~L4はそれぞれ独立に、炭素数2~20の二価の炭化水素基を表し、波線部分は他の構造との結合位置を表す。
 L1~L4はそれぞれ独立に、炭素数2~20のアルキレン基であることが好ましく、炭素数2~10のアルキレン基であることがより好ましく、炭素数4~8のアルキレン基であることが更に好ましい。また、上記アルキレン基は、分岐や環構造を有していてもよいが、直鎖アルキレン基であることが好ましい。
 また、6官能以上のウレタン(メタ)アクリレートは、式(Ac-1)又は式(Ac-2)で表される基と、式(Ae-1)及び式(Ae-2)で表される基より成る群から選ばれた2又は3個の基とが結合した化合物であることが特に好ましい。
In formulas (Ac-1) and (Ac-2), L 1 to L 4 each independently represents a divalent hydrocarbon group having 2 to 20 carbon atoms, and the wavy line represents the bonding position with another structure Represents.
L 1 to L 4 are each independently preferably an alkylene group having 2 to 20 carbon atoms, more preferably an alkylene group having 2 to 10 carbon atoms, and an alkylene group having 4 to 8 carbon atoms. Is more preferable. The alkylene group may have a branched or ring structure, but is preferably a linear alkylene group.
Further, the urethane (meth) acrylate having 6 or more functional groups is represented by a group represented by the formula (Ac-1) or the formula (Ac-2), and a formula (Ae-1) or a formula (Ae-2). Particularly preferred are compounds in which two or three groups selected from the group consisting of groups are bonded.
 以下に、本発明で好ましく用いられる、6官能以上のウレタン(メタ)アクリレートを例示するが、本発明はこれらに限定されるものではないことは言うまでもない。 Hereinafter, hexafunctional or higher urethane (meth) acrylates preferably used in the present invention will be exemplified, but it goes without saying that the present invention is not limited to these.
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
 また、本発明で用いることができる6官能以上のウレタン(メタ)アクリレートとしては、イソシアネートと水酸基との付加反応を用いて製造されるウレタン付加重合性化合物が例示され、特開昭51-37193号公報、特公平2-32293号公報、特公平2-16765号公報に記載されているようなウレタンアクリレート類が例示され、これらの記載は本願明細書に組み込まれる。 Further, examples of the urethane (meth) acrylate having 6 or more functional groups that can be used in the present invention include urethane addition polymerizable compounds produced by using an addition reaction between an isocyanate and a hydroxyl group, and JP-A-51-37193. Examples of such urethane acrylates are described in Japanese Patent Publications, JP-B-2-32293 and JP-B-2-16765, and these descriptions are incorporated in the present specification.
 6官能以上のウレタン(メタ)アクリレートの市販品としては、新中村化学工業(株)から入手可能なU-6HA、UA-1100H、U-6LPA、U-15HA、U-6H、U-10HA、U-10PA、UA-53H、UA-33H(いずれも登録商標)や、共栄社化学(株)から入手可能なUA-306H、UA-306T、UA-306I、UA-510H、BASF社から入手可能なLaromer UA-9048、UA-9050、PR9052、ダイセルオルネクス(株)から入手可能なEBECRYL 220、5129、8301、KRM8200、8200AE、8452などが例示される。 Commercially available products of 6 or more functional urethane (meth) acrylates are U-6HA, UA-1100H, U-6LPA, U-15HA, U-6H, U-10HA, available from Shin-Nakamura Chemical Co., Ltd. U-10PA, UA-53H, UA-33H (all are registered trademarks) and UA-306H, UA-306T, UA-306I, UA-510H, available from BASF, available from Kyoeisha Chemical Co., Ltd. Examples include Laromer UA-9048, UA-9050, PR9052, EBECRYL 220, 5129, 8301, KRM8200, 8200AE, and 8452 available from Daicel Ornex Co., Ltd.
<その他のエチレン性不飽和結合を有する重合性化合物>
 本発明の硬化性組成物は、6官能以上のウレタン(メタ)アクリレート以外のエチレン性不飽和結合を有する重合性化合物(「その他のエチレン性不飽和結合を有する重合性化合物」ともいう。)を含んでいてもよいが、含まないことが好ましい。
 6官能以上のウレタン(メタ)アクリレート以外のエチレン性不飽和結合を有する重合性化合物としては、高分子(例えば、分子量2,000以上)であっても、単量体(例えば、分子量2,000未満、好ましくは、分子量100以上2,000未満)であってもよく、単量体が好ましい。
 その他のエチレン性不飽和結合を有する重合性化合物としては、(メタ)アクリレート化合物が好ましい。(メタ)アクリレート化合物の官能基の数は、2~6が好ましく、3~6がより好ましい。このような構成とすることにより、本発明の効果がより効果的に発揮される。
 具体的には、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、トリ((メタ)アクリロイルオキシエチル)イソシアヌレート、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレートエチレンオキサイド(EO)変性体、ジペンタエリスリトールヘキサ(メタ)アクリレートEO変性体などが挙げられる。
 また、その他のエチレン性不飽和結合を有する重合性化合物としては、5官能以下のウレタン(メタ)アクリレートを含んでいてもよい。5官能以下のウレタン(メタ)アクリレートとしては、下記化合物が例示される。
<Other polymerizable compounds having an ethylenically unsaturated bond>
The curable composition of the present invention is a polymerizable compound having an ethylenically unsaturated bond other than hexafunctional or higher urethane (meth) acrylate (also referred to as “other polymerizable compounds having an ethylenically unsaturated bond”). It may be included but is preferably not included.
The polymerizable compound having an ethylenically unsaturated bond other than the hexafunctional or higher urethane (meth) acrylate may be a polymer (for example, a molecular weight of 2,000 or more) or a monomer (for example, a molecular weight of 2,000). Less than that, preferably a molecular weight of 100 or more and less than 2,000), and a monomer is preferred.
As the polymerizable compound having another ethylenically unsaturated bond, a (meth) acrylate compound is preferable. The number of functional groups of the (meth) acrylate compound is preferably 2 to 6, and more preferably 3 to 6. By adopting such a configuration, the effect of the present invention is more effectively exhibited.
Specifically, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tri ((meth) acryloyloxyethyl) isocyanurate , Trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate ethylene oxide (EO) modified product, dipentaerythritol hexa (meth) acrylate EO modified product, and the like.
Moreover, as another polymerizable compound having an ethylenically unsaturated bond, pentafunctional or lower urethane (meth) acrylate may be included. Examples of the pentafunctional or lower urethane (meth) acrylate include the following compounds.
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
 本発明の硬化性組成物は、6官能以上のウレタン(メタ)アクリレート以外のエチレン性不飽和結合を有する重合性化合物を含む場合、硬化性組成物の全固形分の0.1~20質量%の範囲で含むことが好ましく、0.5~10質量%の範囲で含むことがより好ましく、1~5質量%の範囲で含むことが更に好ましい。
 本発明の硬化性組成物は、6官能以上のウレタン(メタ)アクリレート以外のエチレン性不飽和結合を有する重合性化合物を1種類のみ含んでいてもよいし、2種類以上含んでいてもよい。2種類以上含む場合は、合計量が上記範囲となることが好ましい。
When the curable composition of the present invention contains a polymerizable compound having an ethylenically unsaturated bond other than the hexafunctional or higher urethane (meth) acrylate, 0.1 to 20% by mass of the total solid content of the curable composition. It is preferably included in the range of 0.5 to 10% by mass, more preferably in the range of 1 to 5% by mass.
The curable composition of the present invention may contain only one type of polymerizable compound having an ethylenically unsaturated bond other than hexafunctional or higher urethane (meth) acrylate, and may contain two or more types. When two or more types are included, the total amount is preferably within the above range.
(成分B)重合開始剤
 本発明の硬化性組成物は、(成分B)重合開始剤を含有する。
 重合開始剤としては、ラジカル重合開始剤を含むことが好ましい。
 本発明に用いることができるラジカル重合開始剤は、光及び/又は熱により6官能以上のウレタン(メタ)アクリレート化合物の重合を開始、促進可能な化合物である。中でも、光重合開始剤が好ましく、光ラジカル重合開始剤がより好ましい。
 「光」とは、その照射により成分Bより開始種を発生させることができるエネルギーを付与することができる活性エネルギー線であれば、特に制限はなく、広くα線、γ線、X線、紫外線(UV)、可視光線、電子線などを包含するものである。これらの中でも、紫外線を少なくとも含む光が好ましい。
(Component B) Polymerization initiator The curable composition of the present invention contains (Component B) a polymerization initiator.
The polymerization initiator preferably contains a radical polymerization initiator.
The radical polymerization initiator that can be used in the present invention is a compound that can initiate and accelerate polymerization of a hexafunctional or higher urethane (meth) acrylate compound by light and / or heat. Among these, a photopolymerization initiator is preferable, and a photoradical polymerization initiator is more preferable.
The “light” is not particularly limited as long as it is an active energy ray capable of imparting energy capable of generating a starting species from the component B by the irradiation, and is widely limited to α rays, γ rays, X rays, ultraviolet rays. (UV), visible light, electron beam, and the like. Among these, light containing at least ultraviolet rays is preferable.
 光重合開始剤としては、例えば、オキシムエステル化合物、有機ハロゲン化化合物、オキシジアゾール化合物、カルボニル化合物、ケタール化合物、ベンゾイン化合物、アクリジン化合物、有機過酸化化合物、アゾ化合物、クマリン化合物、アジド化合物、メタロセン化合物、ヘキサアリールビイミダゾール化合物、有機ホウ酸化合物、ジスルホン酸化合物、オニウム塩化合物、アシルホスフィン(オキシド)化合物が挙げられる。これらの中でも、感度の点から、オキシムエステル化合物、ヘキサアリールビイミダゾール化合物が好ましく、オキシムエステル化合物がより好ましい。 Examples of the photopolymerization initiator include oxime ester compounds, organic halogenated compounds, oxydiazole compounds, carbonyl compounds, ketal compounds, benzoin compounds, acridine compounds, organic peroxide compounds, azo compounds, coumarin compounds, azide compounds, metallocenes. Examples include compounds, hexaarylbiimidazole compounds, organic boric acid compounds, disulfonic acid compounds, onium salt compounds, and acylphosphine (oxide) compounds. Among these, oxime ester compounds and hexaarylbiimidazole compounds are preferable from the viewpoint of sensitivity, and oxime ester compounds are more preferable.
 オキシムエステル化合物としては、特開2000-80068号公報、特開2001-233842号公報、特表2004-534797号公報、特開2007-231000号公報、特開2009-134289号公報に記載の化合物を使用できる。
 オキシムエステル化合物は、下記式(1)又は式(2)で表される化合物であることが好ましい。
Examples of the oxime ester compound include compounds described in JP-A No. 2000-80068, JP-A No. 2001-233842, JP-T No. 2004-534797, JP-A No. 2007-231000, and JP-A No. 2009-134289. Can be used.
The oxime ester compound is preferably a compound represented by the following formula (1) or formula (2).
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
 式(1)又は式(2)中、Arは芳香族基又はヘテロ芳香族基を表し、R1はアルキル基、芳香族基又はアルキルオキシ基を表し、R2は水素原子又はアルキル基を表し、更にR2はAr基と結合し環を形成してもよい。 In formula (1) or formula (2), Ar represents an aromatic group or heteroaromatic group, R 1 represents an alkyl group, an aromatic group or an alkyloxy group, and R 2 represents a hydrogen atom or an alkyl group. Further, R 2 may be bonded to an Ar group to form a ring.
 Arは、芳香族基又はヘテロ芳香族基を表し、ベンゼン環、ナフタレン環又はカルバゾール環から水素原子を1つ除いた基であることが好ましく、R2と共に環を形成したナフタレニル基、カルバゾイル基がより好ましい。
 R1は、アルキル基、芳香族基又はアルキルオキシ基を表し、メチル基、エチル基、ベンジル基、フェニル基、ナフチル基、メトキシ基又はエトキシ基が好ましく、メチル基、エチル基、フェニル基又はメトキシ基がより好ましい。
 R2は、水素原子又はアルキル基を表し、水素原子又は置換アルキル基が好ましく、水素原子、Arと共に環を形成する置換アルキル基又はトルエンチオアルキル基がより好ましい。
Ar represents an aromatic group or a heteroaromatic group, and is preferably a group obtained by removing one hydrogen atom from a benzene ring, naphthalene ring or carbazole ring, and a naphthalenyl group or carbazoyl group which forms a ring together with R 2 More preferred.
R 1 represents an alkyl group, an aromatic group or an alkyloxy group, preferably a methyl group, an ethyl group, a benzyl group, a phenyl group, a naphthyl group, a methoxy group or an ethoxy group, and a methyl group, an ethyl group, a phenyl group or a methoxy group Groups are more preferred.
R 2 represents a hydrogen atom or an alkyl group, preferably a hydrogen atom or a substituted alkyl group, and more preferably a hydrogen atom, a substituted alkyl group that forms a ring with Ar, or a toluenethioalkyl group.
 オキシムエステル化合物は、下記式(3)、式(4)又は式(5)で表される化合物であることが更に好ましい。 The oxime ester compound is more preferably a compound represented by the following formula (3), formula (4) or formula (5).
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 式(3)~式(5)中、R1はアルキル基、芳香族基又はアルコキシ基を表し、Xは-CH2-、-C24-、-O-又は-S-を表し、R3はそれぞれ独立に、ハロゲン原子を表し、R4はそれぞれ独立に、アルキル基、フェニル基、アルキル置換アミノ基、アリールチオ基、アルキルチオ基、アルコキシ基、アリールオキシ基又はハロゲン原子を表し、R5は水素原子、アルキル基又はアリール基を表し、R6はアルキル基を表し、n1及びn2はそれぞれ独立に、0~6の整数を表し、n3は0~5の整数を表す。 In the formulas (3) to (5), R 1 represents an alkyl group, an aromatic group or an alkoxy group, X represents —CH 2 —, —C 2 H 4 —, —O— or —S—, R 3 independently represents a halogen atom, R 4 are each independently an alkyl group, a phenyl group, an alkyl-substituted amino group, an arylthio group, an alkylthio group, an alkoxy group, an aryloxy group or a halogen atom, R 5 Represents a hydrogen atom, an alkyl group or an aryl group, R 6 represents an alkyl group, n1 and n2 each independently represents an integer of 0 to 6, and n3 represents an integer of 0 to 5.
 R1はアルキル基、芳香族基又はアルコキシ基を表し、R11-X’-アルキレン基-で表される基(R11はアルキル基又はアリール基を表し、X’は硫黄原子又は酸素原子を表す。)が好ましい。R11はアリール基が好ましく、フェニル基がより好ましい。R11としての、アルキル基及びアリール基は、ハロゲン原子(好ましくは、フッ素原子、塩素原子若しくは臭素原子)又はアルキル基で置換されていてもよい。
 Xは硫黄原子が好ましい。
 R3及びR4は、芳香環上の任意の位置で結合することができる。
 R4はアルキル基、フェニル基、アルキル置換アミノ基、アリールチオ基、アルキルチオ基、アルコキシ基、アリールオキシ基又はハロゲン原子を表し、アルキル基、フェニル基、アリールチオ基又はハロゲン原子が好ましく、アルキル基、アリールチオ基又はハロゲン原子がより好ましく、アルキル基又はハロゲン原子が更に好ましい。アルキル基としては、炭素数1~5のアルキル基が好ましく、メチル基又はエチル基がより好ましい。ハロゲン原子としては、塩素原子、臭素原子又はフッ素原子が好ましい。
 また、R4の炭素数は、0~50であることが好ましく、0~20であることがより好ましい。
 R5は水素原子、アルキル基又はアリール基を表し、アルキル基が好ましい。アルキル基としては、炭素数1~5のアルキル基が好ましく、メチル基又はエチル基がより好ましい。アリール基としては、炭素数6~10のアリール基が好ましい。
 R6はアルキル基を表し、炭素数1~5のアルキル基が好ましく、メチル基又はエチル基がより好ましい。
 n1及びn2はそれぞれ、式(3)又は式(4)における芳香環上のR3の置換数を表し、n3は式(5)における芳香環上のR4の置換数を表す。
 n1~n3はそれぞれ独立に、0~2の整数であることが好ましく、0又は1であることがより好ましい。
R 1 represents an alkyl group, an aromatic group or an alkoxy group, and a group represented by R 11 —X′-alkylene group— (R 11 represents an alkyl group or an aryl group, and X ′ represents a sulfur atom or an oxygen atom. Are preferred). R 11 is preferably an aryl group, more preferably a phenyl group. The alkyl group and aryl group as R 11 may be substituted with a halogen atom (preferably a fluorine atom, a chlorine atom or a bromine atom) or an alkyl group.
X is preferably a sulfur atom.
R 3 and R 4 can be bonded at any position on the aromatic ring.
R 4 represents an alkyl group, a phenyl group, an alkyl-substituted amino group, an arylthio group, an alkylthio group, an alkoxy group, an aryloxy group or a halogen atom, preferably an alkyl group, a phenyl group, an arylthio group or a halogen atom, an alkyl group, an arylthio group A group or a halogen atom is more preferred, and an alkyl group or a halogen atom is still more preferred. As the alkyl group, an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group or an ethyl group is more preferable. As a halogen atom, a chlorine atom, a bromine atom, or a fluorine atom is preferable.
The number of carbon atoms in R 4 is preferably 0 to 50, more preferably 0 to 20.
R 5 represents a hydrogen atom, an alkyl group or an aryl group, and an alkyl group is preferable. As the alkyl group, an alkyl group having 1 to 5 carbon atoms is preferable, and a methyl group or an ethyl group is more preferable. As the aryl group, an aryl group having 6 to 10 carbon atoms is preferable.
R 6 represents an alkyl group, preferably an alkyl group having 1 to 5 carbon atoms, more preferably a methyl group or an ethyl group.
n1 and n2 each represent the number of substitutions of R 3 on the aromatic ring in formula (3) or formula (4), and n3 represents the number of substitutions of R 4 on the aromatic ring in formula (5).
n1 to n3 are each independently preferably an integer of 0 to 2, and more preferably 0 or 1.
 以下に、本発明で好ましく用いられるオキシムエステル化合物の例を示す。しかしながら、本発明で用いられるオキシムエステル化合物がこれらに限定されるものではないことは言うまでもない。なお、Meはメチル基を表し、Phはフェニル基を表す。 Examples of oxime ester compounds preferably used in the present invention are shown below. However, it goes without saying that the oxime ester compounds used in the present invention are not limited to these. Me represents a methyl group and Ph represents a phenyl group.
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
 有機ハロゲン化化合物の例としては、具体的には、若林等、「Bull Chem. Soc. Japan」42、2924(1969)、米国特許第3,905,815号明細書、特公昭46-4605号公報、特開昭48-36281号公報、特開昭55-32070号公報、特開昭60-239736号公報、特開昭61-169835号公報、特開昭61-169837号公報、特開昭62-58241号公報、特開昭62-212401号公報、特開昭63-70243号公報、特開昭63-298339号公報、M.P.Hutt“Journal of Heterocyclic Chemistry”1(No3),(1970)等に記載の化合物が挙げられ、特に、トリハロメチル基が置換したオキサゾール化合物、s-トリアジン化合物が挙げられる。 Specific examples of organic halogenated compounds include: Wakabayashi et al., “Bull Chem. Soc. Japan” 42, 2924 (1969), US Pat. No. 3,905,815, Japanese Patent Publication No. 46-4605. JP, 48-34881, JP 55-3070, JP 60-239736, JP 61-169835, JP 61-169837, JP 62-58241, JP-A 62-212401, JP-A 63-70243, JP-A 63-298339, P. Examples include compounds described in Hut “Journal of Heterocyclic Chemistry” 1 (No. 3), (1970), and in particular, oxazole compounds substituted with a trihalomethyl group and s-triazine compounds.
 ヘキサアリールビイミダゾール化合物の例としては、例えば、特公平6-29285号公報、米国特許第3,479,185号、同第4,311,783号、同第4,622,286号等の各明細書に記載の種々の化合物が挙げられる。 Examples of hexaarylbiimidazole compounds include, for example, JP-B-6-29285, US Pat. Nos. 3,479,185, 4,311,783, and 4,622,286. Examples include various compounds described in the specification.
 アシルホスフィン(オキシド)化合物としては、モノアシルホスフィンオキサイド化合物、及び、ビスアシルホスフィンオキサイド化合物が例示でき、具体的には例えば、チバ・スペシャルティ・ケミカルズ社製のイルガキュア819、ダロキュア4265、ダロキュアTPOなどが挙げられる。 Examples of the acylphosphine (oxide) compounds include monoacylphosphine oxide compounds and bisacylphosphine oxide compounds. Specific examples include Irgacure 819, Darocur 4265, Darocur TPO, etc. manufactured by Ciba Specialty Chemicals. Can be mentioned.
 重合開始剤は、1種又は2種以上を組み合わせて用いることができる。
 本発明の硬化性組成物における重合開始剤の総量は、組成物中の全固形分に対して、0.5~30質量%であることが好ましく、1~20質量%であることがより好ましく、1~10質量%であることが更に好ましく、2~5質量%であることが特に好ましい。
 また、組成物が後述する無機粒子を含有する場合、本発明の硬化性組成物における重合開始剤の総量は、組成物中の全固形分に対して、0.5~30質量%であることが好ましく、1~20質量%であることがより好ましく、1~10質量%であることが更に好ましく、2~5質量%であることが特に好ましい。
A polymerization initiator can be used 1 type or in combination of 2 or more types.
The total amount of the polymerization initiator in the curable composition of the present invention is preferably 0.5 to 30% by mass, more preferably 1 to 20% by mass, based on the total solid content in the composition. The content is more preferably 1 to 10% by mass, and particularly preferably 2 to 5% by mass.
Further, when the composition contains inorganic particles described later, the total amount of the polymerization initiator in the curable composition of the present invention is 0.5 to 30% by mass with respect to the total solid content in the composition. Is preferably 1 to 20% by mass, more preferably 1 to 10% by mass, and particularly preferably 2 to 5% by mass.
<増感剤>
 本発明の硬化性組成物には、重合開始剤の他に、増感剤を加えることもできる。
 本発明において用いることができる典型的な増感剤としては、クリベロ〔J. V. Crivello, Adv. in Polymer Sci., 62, 1 (1984)〕に開示しているものが挙げられ、具体的には、ピレン、ペリレン、アクリジンオレンジ、チオキサントン、2-クロロチオキサントン、ベンゾフラビン、N-ビニルカルバゾール、9,10-ジブトキシアントラセン、アントラキノン、クマリン、ケトクマリン、フェナントレン、カンファーキノン、フェノチアジン誘導体などを挙げることができる。増感剤は、重合開始剤に対し、50~200質量%の割合で添加することが好ましい。
<Sensitizer>
In addition to the polymerization initiator, a sensitizer can be added to the curable composition of the present invention.
Typical sensitizers that can be used in the present invention include those disclosed in Crivello [JV Crivello, Adv. In Polymer Sci., 62, 1 (1984)]. Examples include pyrene, perylene, acridine orange, thioxanthone, 2-chlorothioxanthone, benzoflavin, N-vinylcarbazole, 9,10-dibutoxyanthracene, anthraquinone, coumarin, ketocoumarin, phenanthrene, camphorquinone, and phenothiazine derivatives. The sensitizer is preferably added in a proportion of 50 to 200% by mass with respect to the polymerization initiator.
 (成分C)ブロックイソシアネート化合物
 本発明の硬化性組成物は、(成分C)ブロックイソシアネート化合物を含有する。
 成分Cを含有することにより、高温高湿下でのタッチパネル特性に優れた硬化膜を得ることができる硬化性組成物が得られる。
 ブロックイソシアネート化合物としては、ブロックイソシアネート基を有する化合物であれば特に制限はないが、硬化性の観点から、1分子内に2以上のブロックイソシアネート基を有する化合物であることが好ましい。ブロックイソシアネート基の数の上限は、特に定めるものではないが、6以下が好ましい。
 また、ブロックイソシアネート化合物としては、その骨格は特に限定されるものではなく、1分子中にイソシアネート基を2個有するものであればどのようなものでもよく、脂肪族、脂環族又は芳香族のポリイソシアネートであってよいが、例えば、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、イソホロンジイソシアネート、1,6-ヘキサメチレンジイソシアネート、1,3-トリメチレンジイソシアネート、1,4-テトラメチレンジイソシアネート、2,2,4-トリメチルヘキサメチレンジイソシアネート、2,4,4-トリメチルヘキサメチレンジイソシアネート、1,9-ノナメチレンジイソシアネート、1,10-デカメチレンジイソシアネート、1,4-シクロヘキサンジイソシアネート、2,2’-ジエチルエーテルジイソシアネート、ジフェニルメタン-4,4’-ジイソシアネート、o-キシレンジイソシアネート、m-キシレンジイソシアネート、p-キシレンジイソシアネート、メチレンビス(シクロヘキシルイソシアネート)、シクロヘキサン-1,3-ジメチレンジイソシアネート、シクロヘキサン-1,4-ジメチレレンジイソシアネート、1,5-ナフタレンジイソシアネート、p-フェニレンジイソシアネート、3,3’-メチレンジトリレン-4,4’-ジイソシアネート、4,4’-ジフェニルエーテルジイソシアネート、テトラクロロフェニレンジイソシアネート、ノルボルナンジイソシアネート、水素化1,3-キシリレンジイソシアネート、水素化1,4-キシリレンジイソシアネート等のイソシアネート化合物、並びに、これらの多量体、及び、これらの化合物から派生するプレポリマー型の骨格の化合物を好適に用いることができる。これらの中でも、トリレンジイソシアネート(TDI)やジフェニルメタンジイソシアネート(MDI)、ヘキサメチレンジイソシアネート(HDI)、イソホロンジイソシアネート(IPDI)、及び、これらの多量体よりなる群から選ばれた化合物を保護したブロックイソシアネート化合物が好ましく、ヘキサメチレンジイソシアネート、イソホロンジイソシアネート、及び、これらの多量体よりなる群から選ばれた化合物を保護したブロックイソシアネート化合物がより好ましい。
 イソシアネート化合物の多量体としては、2量体以上の多量体であれば特に制限はなく、ビウレット体、イソシアヌレート体、アダクト体等を例示することができ、ビウレット体が好ましい。
(Component C) Blocked isocyanate compound The curable composition of the present invention contains (Component C) a blocked isocyanate compound.
By containing component C, the curable composition which can obtain the cured film excellent in the touch-panel characteristic under high temperature, high humidity is obtained.
The blocked isocyanate compound is not particularly limited as long as it is a compound having a blocked isocyanate group, but is preferably a compound having two or more blocked isocyanate groups in one molecule from the viewpoint of curability. The upper limit of the number of blocked isocyanate groups is not particularly defined, but is preferably 6 or less.
Further, the skeleton of the blocked isocyanate compound is not particularly limited and may be any as long as it has two isocyanate groups in one molecule, and may be aliphatic, alicyclic or aromatic. Polyisocyanate may be used. For example, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, isophorone diisocyanate, 1,6-hexamethylene diisocyanate, 1,3-trimethylene diisocyanate, 1,4-tetrazine Methylene diisocyanate, 2,2,4-trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, 1,9-nonamethylene diisocyanate, 1,10-decamethylene diisocyanate, 1,4-cyclohexane diisocyanate, 2 2'-diethyl ether diisocyanate, diphenylmethane-4,4'-diisocyanate, o-xylene diisocyanate, m-xylene diisocyanate, p-xylene diisocyanate, methylene bis (cyclohexyl isocyanate), cyclohexane-1,3-dimethylene diisocyanate, cyclohexane-1 , 4-dimethylene diisocyanate, 1,5-naphthalene diisocyanate, p-phenylene diisocyanate, 3,3'-methylene ditolylene-4,4'-diisocyanate, 4,4'-diphenyl ether diisocyanate, tetrachlorophenylene diisocyanate, norbornane diisocyanate , Isocyanation of hydrogenated 1,3-xylylene diisocyanate, hydrogenated 1,4-xylylene diisocyanate, etc. A compound, a multimer thereof, and a prepolymer type skeleton compound derived from these compounds can be preferably used. Among these, blocked isocyanate compounds that protect a compound selected from the group consisting of tolylene diisocyanate (TDI), diphenylmethane diisocyanate (MDI), hexamethylene diisocyanate (HDI), isophorone diisocyanate (IPDI), and multimers thereof. A blocked isocyanate compound in which a compound selected from the group consisting of hexamethylene diisocyanate, isophorone diisocyanate, and multimers thereof is protected is more preferable.
The isocyanate compound multimer is not particularly limited as long as it is a dimer or higher multimer, and examples thereof include biuret bodies, isocyanurate bodies, and adduct bodies, and biuret bodies are preferred.
 本発明の硬化性組成物におけるブロックイソシアネート化合物の母構造としては、ビウレット型、イソシアヌレート型、アダクト型、2官能プレポリマー型等を挙げることができる。
 上記ブロックイソシアネート化合物のブロック構造を形成するブロック剤としては、オキシム化合物、ラクタム化合物、フェノール化合物、アルコール化合物、アミン化合物、活性メチレン化合物、ピラゾール化合物、メルカプタン化合物、イミダゾール系化合物、イミド系化合物等を挙げることができる。これらの中でも、オキシム化合物、ラクタム化合物、フェノール化合物、アルコール化合物、アミン化合物、活性メチレン化合物、又は、ピラゾール化合物が好ましく、オキシム化合物、及び、ラクタム化合物がより好ましく、オキシム化合物が更に好ましく、メチルエチルケトンオキシムが特に好ましい。
 上記オキシム化合物としては、オキシム、及び、ケトオキシムが挙げられ、具体的には、アセトキシム、ホルムアルドキシム、シクロヘキサンオキシム、メチルエチルケトンオキシム、シクロヘキサノンオキシム、ベンゾフェノンオキシム等が例示できる。
 上記ラクタム化合物としては、ε-カプロラクタム、γ-ブチロラクタム等が例示できる。
 上記フェノール化合物としては、フェノール、ナフトール、クレゾール、キシレノール、ハロゲン置換フェノール等が例示できる。
 上記アルコール化合物としては、メタノール、エタノール、プロパノール、ブタノール、シクロヘキサノール、エチレングリコールモノアルキルエーテル、プロピレングリコールモノアルキルエーテル、乳酸アルキル等が例示できる。
 上記アミン化合物としては、第1級アミン及び第2級アミンが挙げられ、芳香族アミン、脂肪族アミン、脂環族アミンいずれでもよく、アニリン、ジフェニルアミン、エチレンイミン、ポリエチレンイミン等が例示できる。
 前記活性メチレン化合物としては、マロン酸ジエチル、マロン酸ジメチル、アセト酢酸エチル、アセト酢酸メチル等が例示できる。
 上記ピラゾール化合物としては、ピラゾール、メチルピラゾール、ジメチルピラゾール等が例示できる、
 上記メルカプタン化合物としては、アルキルメルカプタン、アリールメルカプタン等が例示できる。
Examples of the matrix structure of the blocked isocyanate compound in the curable composition of the present invention include biuret type, isocyanurate type, adduct type, and bifunctional prepolymer type.
Examples of the blocking agent that forms the block structure of the blocked isocyanate compound include oxime compounds, lactam compounds, phenol compounds, alcohol compounds, amine compounds, active methylene compounds, pyrazole compounds, mercaptan compounds, imidazole compounds, and imide compounds. be able to. Among these, oxime compounds, lactam compounds, phenol compounds, alcohol compounds, amine compounds, active methylene compounds, or pyrazole compounds are preferable, oxime compounds and lactam compounds are more preferable, oxime compounds are more preferable, and methyl ethyl ketone oxime is more preferable. Particularly preferred.
Examples of the oxime compound include oxime and ketoxime, and specific examples include acetoxime, formaldoxime, cyclohexane oxime, methyl ethyl ketone oxime, cyclohexanone oxime, and benzophenone oxime.
Examples of the lactam compound include ε-caprolactam and γ-butyrolactam.
Examples of the phenol compound include phenol, naphthol, cresol, xylenol, and halogen-substituted phenol.
Examples of the alcohol compound include methanol, ethanol, propanol, butanol, cyclohexanol, ethylene glycol monoalkyl ether, propylene glycol monoalkyl ether, and alkyl lactate.
Examples of the amine compound include primary amines and secondary amines, which may be aromatic amines, aliphatic amines, and alicyclic amines, and examples thereof include aniline, diphenylamine, ethyleneimine, and polyethyleneimine.
Examples of the active methylene compound include diethyl malonate, dimethyl malonate, ethyl acetoacetate, methyl acetoacetate and the like.
Examples of the pyrazole compound include pyrazole, methylpyrazole, dimethylpyrazole and the like.
Examples of the mercaptan compound include alkyl mercaptans and aryl mercaptans.
 本発明の硬化性組成物に使用できるブロックイソシアネート化合物は、市販品として入手可能であり、例えば、コロネートAPステーブルM、コロネート2503、2515、2507、2513、2555、ミリオネートMS-50(以上、日本ポリウレタン工業(株)製)、タケネートB-830、B-815N、B-820NSU、B-842N、B-846N、B-870N、B-874N、B-882N(以上、三井化学(株)製)、デュラネート17B-60P、17B-60PX、17B-60P、TPA-B80X、TPA-B80E、MF-B60X、MF-B60B、MF-K60X、MF-K60B、E402-B80B、SBN-70D、SBB-70P、K6000(以上、旭化成ケミカルズ(株)製)、デスモジュールBL1100、BL1265 MPA/X、BL3575/1、BL3272MPA、BL3370MPA、BL3475BA/SN、BL5375MPA、VPLS2078/2、BL4265SN、PL340、PL350、スミジュールBL3175(以上、住化バイエルウレタン(株)製)等を好ましく使用することができる。 The blocked isocyanate compound that can be used in the curable composition of the present invention is commercially available. For example, Coronate AP Stable M, Coronate 2503, 2515, 2507, 2513, 2555, Millionate MS-50 (above, Japan) Polyurethane Industry Co., Ltd.), Takenate B-830, B-815N, B-820NSU, B-842N, B-84N, B-870N, B-874N, B-882N (Mitsui Chemicals, Inc.) , Duranate 17B-60P, 17B-60PX, 17B-60P, TPA-B80X, TPA-B80E, MF-B60X, MF-B60B, MF-K60X, MF-K60B, E402-B80B, SBN-70D, SBB-70P, K6000 (above, manufactured by Asahi Kasei Chemicals Corporation), Death Joule BL1100, BL1265 MPA / X, BL3575 / 1, BL3272MPA, BL3370MPA, BL3475BA / SN, BL5375MPA, VPLS2078 / 2, BL4265SN, PL340, PL350, Sumijoule BL3175 (above, manufactured by Sumika Bayer Urethane Co., Ltd.) and the like are preferable Can be used.
 本発明の硬化性組成物におけるブロックイソシアネート化合物の含有量は、硬化性組成物の全固形分に対し、0.1~20質量%の範囲で含むことが好ましく、0.5~10質量%の範囲で含むことがより好ましく、1~5質量%の範囲で含むことが更に好ましい。
 また、本発明の硬化性組成物におけるブロックイソシアネート化合物の含有量は、硬化性組成物の全有機固形分に対し、0.1~20質量%の範囲で含むことが好ましく、0.5~10質量%の範囲で含むことがより好ましく、1~5質量%の範囲で含むことが更に好ましい。
 本発明の硬化性組成物中の成分Aと成分Cの重量比率は、100:1~10:1であることが好ましく、50:1~10:1であることがより好ましく、20:1~10:1であることが更に好ましい。
 また、成分Aと成分Bと成分Cとの合計量は、硬化性組成物の全有機固形分に対し85質量%以上であることが好ましく、90質量%以上であることがより好ましく、95質量%以上であることが更に好ましい。
 本発明の硬化性組成物は、ブロックイソシアネート化合物を1種類のみ含んでいてもよいし、2種類以上含んでいてもよい。2種類以上含む場合は、合計量が上記範囲となることが好ましい。
The content of the blocked isocyanate compound in the curable composition of the present invention is preferably in the range of 0.1 to 20% by mass, and preferably 0.5 to 10% by mass with respect to the total solid content of the curable composition. More preferably, it is contained in a range of 1 to 5% by mass.
In addition, the content of the blocked isocyanate compound in the curable composition of the present invention is preferably in the range of 0.1 to 20% by mass with respect to the total organic solid content of the curable composition, 0.5 to 10 More preferably, it is contained in the range of 1% by mass, and more preferably in the range of 1-5% by mass.
The weight ratio of component A to component C in the curable composition of the present invention is preferably 100: 1 to 10: 1, more preferably 50: 1 to 10: 1, and 20: 1 to More preferably, it is 10: 1.
The total amount of component A, component B, and component C is preferably 85% by mass or more, more preferably 90% by mass or more, and 95% by mass with respect to the total organic solid content of the curable composition. % Or more is more preferable.
The curable composition of the present invention may contain only one type of blocked isocyanate compound, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.
(成分D)有機溶剤
 本発明の硬化性組成物は、有機溶剤を含有する。本発明の硬化性組成物は、必須成分である成分A、成分B及び成分Cと、後述の任意成分とを、有機溶剤に溶解又は分散した溶液として調製されることが好ましい。
 本発明の硬化性組成物に使用される有機溶剤としては、公知の溶剤を用いることができ、エチレングリコールモノアルキルエーテル類、エチレングリコールジアルキルエーテル類、エチレングリコールモノアルキルエーテルアセテート類、プロピレングリコールモノアルキルエーテル類、プロピレングリコールジアルキルエーテル類、プロピレングリコールモノアルキルエーテルアセテート類、ジエチレングリコールジアルキルエーテル類、ジエチレングリコールモノアルキルエーテルアセテート類、ジプロピレングリコールモノアルキルエーテル類、ブチレングリコールジアセテート類、ジプロピレングリコールジアルキルエーテル類、ジプロピレングリコールモノアルキルエーテルアセテート類、アルコール類、エステル類、ケトン類、アミド類、ラクトン類等が例示できる。これらの溶剤の具体例としては、特開2009-098616号公報の段落0062を参照できる。
(Component D) Organic solvent The curable composition of the present invention contains an organic solvent. It is preferable that the curable composition of this invention is prepared as a solution which melt | dissolved or disperse | distributed the component A, the component B, and the component C which are essential components, and the below-mentioned arbitrary component in the organic solvent.
As the organic solvent used in the curable composition of the present invention, known solvents can be used, such as ethylene glycol monoalkyl ethers, ethylene glycol dialkyl ethers, ethylene glycol monoalkyl ether acetates, propylene glycol monoalkyl. Ethers, propylene glycol dialkyl ethers, propylene glycol monoalkyl ether acetates, diethylene glycol dialkyl ethers, diethylene glycol monoalkyl ether acetates, dipropylene glycol monoalkyl ethers, butylene glycol diacetates, dipropylene glycol dialkyl ethers, Dipropylene glycol monoalkyl ether acetates, alcohols, esters, ketones, Bromide, lactones and the like. As specific examples of these solvents, reference can be made to paragraph 0062 of JP-A-2009-098616.
 具体的には、プロピレングリコールモノメチルエーテルアセテート、ジエチレングリコールジエチルエーテル、ジエチレングリコールエチルメチルエーテル、プロピレングリコールモノメチルエーテル、1,3-ブチレングリコールジアセテート、シクロヘキサノールアセテート、プロピレングリコールジアセテート、テトラヒドロフルフリルアルコールが好ましい。 Specifically, propylene glycol monomethyl ether acetate, diethylene glycol diethyl ether, diethylene glycol ethyl methyl ether, propylene glycol monomethyl ether, 1,3-butylene glycol diacetate, cyclohexanol acetate, propylene glycol diacetate, and tetrahydrofurfuryl alcohol are preferable.
 溶剤の沸点は、塗布性の観点から、100℃~300℃が好ましく、120℃~250℃がより好ましい。
 本発明に用いることができる有機溶剤は、1種単独、又は、2種以上を併用することができる。沸点の異なる溶剤を併用することも好ましい。
 本発明の硬化性組成物における有機溶剤の含有量は、塗布に適した粘度に調整するという観点から、硬化性組成物の全固形分100質量部あたり、100~3,000質量部であることが好ましく、200~2,000質量部であることがより好ましく、250~1,000質量部であることが更に好ましい。
 本発明の硬化性組成物における固形分濃度としては、3~50質量%が好ましく、20~40質量%であることがより好ましい。
The boiling point of the solvent is preferably 100 ° C. to 300 ° C., more preferably 120 ° C. to 250 ° C. from the viewpoint of applicability.
The organic solvent which can be used for this invention can be used individually by 1 type or in combination of 2 or more types. It is also preferred to use solvents having different boiling points in combination.
The content of the organic solvent in the curable composition of the present invention is 100 to 3,000 parts by mass per 100 parts by mass of the total solid content of the curable composition from the viewpoint of adjusting the viscosity to be suitable for coating. It is preferably 200 to 2,000 parts by mass, more preferably 250 to 1,000 parts by mass.
The solid content concentration in the curable composition of the present invention is preferably 3 to 50% by mass, and more preferably 20 to 40% by mass.
 本発明の硬化性組成物の粘度は、1~200mPa・sが好ましく、2~100mPa・sがより好ましく、3~80mPa・sが最も好ましい。粘度は、例えば、東機産業(株)製のRE-80L型回転粘度計を用いて、25±0.2℃で測定することが好ましい。測定時の回転速度は、5mPa・s未満は100rpm、5mPa・s以上10mPa・s未満は50rpm、10mPa・s以上30mPa・s未満は20rpm、30mPa・s以上は10rpmで、それぞれ行うことが好ましい。 The viscosity of the curable composition of the present invention is preferably 1 to 200 mPa · s, more preferably 2 to 100 mPa · s, and most preferably 3 to 80 mPa · s. The viscosity is preferably measured at 25 ± 0.2 ° C. using a RE-80L rotational viscometer manufactured by Toki Sangyo Co., Ltd., for example. The rotation speed during measurement is preferably 100 rpm for less than 5 mPa · s, 50 rpm for 5 mPa · s to less than 10 mPa · s, 20 rpm for 10 mPa · s to less than 30 mPa · s, and 10 rpm for 30 mPa · s or more.
(成分E)アルコキシシラン化合物
 本発明の硬化性組成物は、(成分E)アルコキシシラン化合物を含有することが好ましい。アルコキシシラン化合物を含有すると、本発明の硬化性組成物により形成された膜と基板との密着性をより向上できる。
 本発明の硬化性組成物に用いることができるアルコキシシラン化合物は、基材、例えば、シリコン、酸化シリコン、窒化シリコン等のシリコン化合物、金、銅、モリブデン、チタン、アルミニウム等の金属と絶縁膜との密着性を向上させる化合物であることが好ましい。具体的には、公知のシランカップリング剤等も有効である。エチレン性不飽和結合を有するシランカップリング剤が好ましい。
 シランカップリング剤としては、例えば、γ-アミノプロピルトリメトキシシラン、γ-アミノプロピルトリエトキシシラン、γ-グリシドキシプロピルトリアルコキシシラン、γ-グリシドキシプロピルジアルコキシシラン、γ-メタクリロキシプロピルトリアルコキシシラン、γ-メタクリロキシプロピルジアルコキシシラン、γ-クロロプロピルトリアルコキシシラン、γ-メルカプトプロピルトリアルコキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリアルコキシシラン、ビニルトリアルコキシシランが挙げられる。これらのうち、γ-メタクリロキシプロピルトリアルコキシシラン、γ-アクリロキシプロピルトリアルコキシシラン、ビニルトリアルコキシシラン、又は、γ-グリシドキシプロピルトリアルコキシシランがより好ましい。これらは1種単独又は2種以上を組み合わせて使用することができる。
 市販品としては、信越化学工業(株)製KBM-403やKBM-5103が例示される。
(Component E) Alkoxysilane Compound The curable composition of the present invention preferably contains (Component E) an alkoxysilane compound. When the alkoxysilane compound is contained, the adhesion between the film formed from the curable composition of the present invention and the substrate can be further improved.
The alkoxysilane compound that can be used in the curable composition of the present invention includes a base material, for example, a silicon compound such as silicon, silicon oxide, and silicon nitride, a metal such as gold, copper, molybdenum, titanium, and aluminum, and an insulating film. It is preferable that it is a compound which improves the adhesiveness of. Specifically, a known silane coupling agent or the like is also effective. A silane coupling agent having an ethylenically unsaturated bond is preferred.
Examples of the silane coupling agent include γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-glycidoxypropyltrialkoxysilane, γ-glycidoxypropyl dialkoxysilane, and γ-methacryloxypropyl. Trialkoxysilane, γ-methacryloxypropyl dialkoxysilane, γ-chloropropyltrialkoxysilane, γ-mercaptopropyltrialkoxysilane, β- (3,4-epoxycyclohexyl) ethyltrialkoxysilane, vinyltrialkoxysilane It is done. Of these, γ-methacryloxypropyltrialkoxysilane, γ-acryloxypropyltrialkoxysilane, vinyltrialkoxysilane, or γ-glycidoxypropyltrialkoxysilane is more preferable. These can be used alone or in combination of two or more.
Examples of commercially available products include KBM-403 and KBM-5103 manufactured by Shin-Etsu Chemical Co., Ltd.
 本発明の硬化性組成物におけるアルコキシシラン化合物の含有量は、硬化性組成物の全固形分の合計100質量部に対し、0.1~30質量部が好ましく、2~20質量部がより好ましく、2~15質量部が更に好ましい。
 アルコキシシラン化合物は、1種類のみでもよいし、2種類以上含んでいてもよい。2種類以上含む場合、合計量が上記範囲となることが好ましい。
The content of the alkoxysilane compound in the curable composition of the present invention is preferably 0.1 to 30 parts by mass and more preferably 2 to 20 parts by mass with respect to 100 parts by mass in total of the total solid content of the curable composition. 2 to 15 parts by mass is more preferable.
Only one type of alkoxysilane compound may be included, or two or more types may be included. When two or more types are included, the total amount is preferably within the above range.
(成分F)無機粒子
 本発明の硬化性組成物は、無機粒子を含有することが好ましい。無機粒子を含有することにより、硬化膜の硬度(強度)がより優れたものとなる。また、無機粒子を含有することにより、基板への密着性を向上させることができる。
 本発明で用いる無機粒子の平均粒径は、1~200nmが好ましく、5~100nmがより好ましく、5~50nmが最も好ましい。平均粒径は、電子顕微鏡により任意の粒子200個の粒子径を測定し、その算術平均をいう。また、粒子の形状が球形でない場合には、外径の最大径を粒子の粒子径とする。
 また、硬化膜の硬度の観点から、無機粒子の空隙率は、10%未満が好ましく、3%未満がより好ましく、空隙が無いことが最も好ましい。粒子の空隙率は電子顕微鏡による断面画像の空隙部分と粒子全体との面積比の、200個の算術平均である。
 無機粒子としては、Be、Mg、Ca、Sr、Ba、Sc、Y、La、Ce、Gd、Tb、Dy、Yb、Lu、Ti、Zr、Hf、Nb、Mo、W、Zn、B、Al、Si、Ge、Sn、Pb、Sb、Bi、Te等の原子を含む金属酸化物粒子が好ましく、酸化ケイ素、酸化チタン、チタン複合酸化物、酸化亜鉛、酸化ジルコニウム、インジウム/スズ酸化物、アンチモン/スズ酸化物がより好ましく、酸化ケイ素、酸化チタン、チタン複合酸化物、酸化ジルコニウムがより好ましく、酸化ケイ素又は酸化チタンが、粒子の安定性、入手しやすさ、硬化膜の硬度、透明性、屈折率調整等の観点から特に好ましい。
(Component F) Inorganic particles The curable composition of the invention preferably contains inorganic particles. By containing the inorganic particles, the hardness (strength) of the cured film becomes more excellent. Moreover, the adhesiveness to a board | substrate can be improved by containing an inorganic particle.
The average particle size of the inorganic particles used in the present invention is preferably 1 to 200 nm, more preferably 5 to 100 nm, and most preferably 5 to 50 nm. The average particle diameter is an arithmetic average obtained by measuring the particle diameter of 200 arbitrary particles with an electron microscope. When the particle shape is not spherical, the maximum outer diameter is taken as the particle diameter of the particle.
Moreover, from the viewpoint of the hardness of the cured film, the porosity of the inorganic particles is preferably less than 10%, more preferably less than 3%, and most preferably no void. The porosity of the particle is an arithmetic average of 200 of the area ratio between the void portion of the cross-sectional image obtained by an electron microscope and the entire particle.
As inorganic particles, Be, Mg, Ca, Sr, Ba, Sc, Y, La, Ce, Gd, Tb, Dy, Yb, Lu, Ti, Zr, Hf, Nb, Mo, W, Zn, B, Al Metal oxide particles containing atoms such as Si, Ge, Sn, Pb, Sb, Bi, and Te are preferable. Silicon oxide, titanium oxide, titanium composite oxide, zinc oxide, zirconium oxide, indium / tin oxide, antimony / Tin oxide is more preferable, silicon oxide, titanium oxide, titanium composite oxide, zirconium oxide is more preferable, silicon oxide or titanium oxide is the stability of particles, availability, hardness of the cured film, transparency, This is particularly preferable from the viewpoint of adjusting the refractive index.
 酸化ケイ素としては、シリカが好ましく挙げられ、シリカ粒子がより好ましく挙げられる。
 シリカ粒子としては、二酸化ケイ素を含む無機酸化物の粒子であれば特に問題はなく、二酸化ケイ素又はその水和物を主成分(好ましくは80質量%以上)として含む粒子が好ましい。上記粒子は、少量成分(例えば、5質量%未満)としてアルミン酸塩を含んでいてもよい。少量成分として含まれることがあるアルミン酸塩としては、アルミン酸ナトリウム、アルミン酸カリウムなどが挙げられる。また、シリカ粒子は、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、水酸化アンモニウム等の無機塩類やテトラメチルアンモニウムヒドロキシド等の有機塩類が含まれていてもよい。このような化合物の例として、コロイダルシリカが例示される。
 コロイダルシリカの分散媒としては特に制限はなく、水、有機溶剤、及び、これらの混合物のいずれであってもよい。これらは、1種単独で使用してもよいし、2種以上を併用することもできる。
 本発明において、粒子は、適当な分散剤及び溶剤中でボールミル、ロッドミル等の混合装置を用いて混合・分散することにより調製された分散液として使用に供することもできる。なお、本発明の硬化性組成物において、コロイダルシリカがコロイド状態で存在していることを必須とするものではない。
 無機粒子の含有量は、硬度の観点から、硬化性組成物の全固形分100質量部あたり、1質量部以上が好ましく、5質量部以上がより好ましく、10質量部以上が更に好ましい。また、80質量部以下が好ましく、50質量部以下がより好ましく、40質量部以下が更に好ましく、30質量部以下が特に好ましい。
 無機粒子は、1種類のみ含んでいてもよいし、2種類以上含んでいてもよい。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。
As a silicon oxide, a silica is mentioned preferably and a silica particle is mentioned more preferably.
The silica particles are not particularly limited as long as they are inorganic oxide particles containing silicon dioxide, and particles containing silicon dioxide or a hydrate thereof as a main component (preferably 80% by mass or more) are preferable. The said particle | grains may contain the aluminate as a minor component (for example, less than 5 mass%). Examples of the aluminate that may be contained as a minor component include sodium aluminate and potassium aluminate. The silica particles may contain inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide and ammonium hydroxide, and organic salts such as tetramethylammonium hydroxide. Colloidal silica is exemplified as an example of such a compound.
There is no restriction | limiting in particular as a dispersion medium of colloidal silica, Any of water, an organic solvent, and these mixtures may be sufficient. These may be used individually by 1 type and can also use 2 or more types together.
In the present invention, the particles can be used as a dispersion prepared by mixing and dispersing in a suitable dispersant and solvent using a mixing device such as a ball mill or a rod mill. In the curable composition of the present invention, it is not essential that the colloidal silica exists in a colloidal state.
From the viewpoint of hardness, the content of the inorganic particles is preferably 1 part by mass or more, more preferably 5 parts by mass or more, and still more preferably 10 parts by mass or more per 100 parts by mass of the total solid content of the curable composition. Moreover, 80 mass parts or less are preferable, 50 mass parts or less are more preferable, 40 mass parts or less are further more preferable, and 30 mass parts or less are especially preferable.
One type of inorganic particles may be included, or two or more types may be included. When two or more types are included, the total amount is preferably within the above range.
(成分G)(メタ)アクリル共重合体
 本発明の硬化性組成物は、(成分G)(メタ)アクリル共重合体を含んでもよい。
 (メタ)アクリル酸と共重合させるモノマーとしては、スチレン及びα-メチルスチレン等のα位にアルキル基が置換していてもよいスチレン、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸プロピル、(メタ)アクリル酸イソプロピル、(メタ)アクリル酸ブチル、酢酸ビニル、アクリロニトリル、(メタ)アクリルアミド、グリシジル(メタ)アクリレート、アリルグリシジルエーテル、エチルアクリル酸グリシジル、クロトニルグリシジルエーテル、クロトン酸グリシジルエーテル、(メタ)アクリル酸クロライド、ベンジル(メタ)アクリレート、ヒドロキシエチル(メタ)アクリレート、N-メチロールアクリルアミド、N,N-ジメチルアクリルアミド、N-メタクリロイルモルホリン、N,N-ジメチルアミノエチル(メタ)アクリレート、N,N-ジメチルアミノエチルアクリルアミドなどのモノマーを共重合させた共重合体が挙げられる。これらのモノマーはアクリル酸と単独で共重合させてもよいし、2以上のモノマーを用いてもよい。
 また、(メタ)アクリル酸及びα位にアルキル基が置換していてもよいスチレンを共重合成分として含有する共重合体が好ましい。
 本発明の硬化性組成物の成分Gの含有量は、1~20質量%が好ましく、1~15質量%がより好ましく、1~10質量%が更に好ましい。
(Component G) (Meth) acrylic copolymer The curable composition of the present invention may comprise (Component G) (meth) acrylic copolymer.
Monomers to be copolymerized with (meth) acrylic acid include styrene, methyl (meth) acrylate, ethyl (meth) acrylate, (alkylene substituted at the α-position such as styrene and α-methylstyrene, ( Meth) propyl acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, vinyl acetate, acrylonitrile, (meth) acrylamide, glycidyl (meth) acrylate, allyl glycidyl ether, glycidyl ethyl acrylate, crotonyl glycidyl ether, Crotonic acid glycidyl ether, (meth) acrylic acid chloride, benzyl (meth) acrylate, hydroxyethyl (meth) acrylate, N-methylolacrylamide, N, N-dimethylacrylamide, N-methacryloylmorpholine, N, N-di Examples thereof include copolymers obtained by copolymerizing monomers such as methylaminoethyl (meth) acrylate and N, N-dimethylaminoethylacrylamide. These monomers may be copolymerized alone with acrylic acid, or two or more monomers may be used.
Further, a copolymer containing (meth) acrylic acid and styrene optionally substituted with an alkyl group at the α-position as a copolymerization component is preferable.
The content of component G in the curable composition of the present invention is preferably 1 to 20% by mass, more preferably 1 to 15% by mass, and still more preferably 1 to 10% by mass.
(成分H)メルカプト化合物
 本発明の硬化性組成物は、(成分H)メルカプト化合物を含有することが好ましい。メルカプト化合物を含有することにより、得られる硬化膜の膜強度に優れる。
 メルカプト化合物としては、単官能メルカプト化合物、多官能メルカプト化合物が好適に用いられる。
(Component H) Mercapto Compound The curable composition of the present invention preferably contains (Component H) a mercapto compound. By containing a mercapto compound, the obtained cured film has excellent film strength.
As the mercapto compound, a monofunctional mercapto compound or a polyfunctional mercapto compound is preferably used.
 単官能メルカプト化合物としては、脂肪族メルカプト化合物、芳香族メルカプト化合物のどちらも用いることができるが、膜強度の観点では、芳香族メルカプト化合物が好ましい。
 単官能脂肪族メルカプト化合物としては、具体的には、1-オクタンチオール、1-ドデカンチオール、β-メルカプトプロピオン酸、メチル-3-メルカプトプロピオネート、2-エチルヘキシル-3-メルカプトプロピオネート、n-オクチル-3-メルカプトプロピオネート、メトキシブチル-3-メルカプトプロピオネート、ステアリル-3-メルカプトプロピオネート等が挙げられる。
As the monofunctional mercapto compound, either an aliphatic mercapto compound or an aromatic mercapto compound can be used. From the viewpoint of film strength, an aromatic mercapto compound is preferable.
Specific examples of monofunctional aliphatic mercapto compounds include 1-octanethiol, 1-dodecanethiol, β-mercaptopropionic acid, methyl-3-mercaptopropionate, 2-ethylhexyl-3-mercaptopropionate, Examples thereof include n-octyl-3-mercaptopropionate, methoxybutyl-3-mercaptopropionate, stearyl-3-mercaptopropionate.
 単官能芳香族メルカプト化合物としては、下記式(I)で表されるものが好ましい。 As the monofunctional aromatic mercapto compound, those represented by the following formula (I) are preferable.
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 式(I)中、XSは酸素原子、硫黄原子又はN-RSを表し、RSは、水素原子、アルキル基又はアリール基を表し、Aは、N=C-XSと共にヘテロ環を形成する原子団を表す。 In the formula (I), X S represents an oxygen atom, a sulfur atom or N—R S , R S represents a hydrogen atom, an alkyl group or an aryl group, and A represents a heterocycle together with N═C—X S Represents an atomic group to be formed.
 式(I)において、RSは、水素原子、アルキル基又はアリール基を表す。
 上記アルキル基としては、炭素数が1~20の直鎖状、分岐状又は環状のアルキル基を挙げることができ、炭素数1~12の直鎖状、炭素数3~12の分岐状又は炭素数5~10の環状のアルキル基がより好ましい。その具体例としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基、ドデシル基、トリデシル基、ヘキサデシル基、オクタデシル基、エイコシル基、イソプロピル基、イソブチル基、s-ブチル基、t-ブチル基、イソペンチル基、ネオペンチル基、1-メチルブチル基、イソヘキシル基、2-エチルヘキシル基、2-メチルヘキシル基、シクロヘキシル基、シクロペンチル基、2-ノルボルニル基等を挙げることができる。
 上記アリール基としては、単環構造のものに加え、1~3個のベンゼン環が縮合環を形成したもの、ベンゼン環と5員不飽和環とが縮合環を形成したものなどを挙げることができる。具体例としては、フェニル基、ナフチル基、アントリル基、フェナントリル基、インデニル基、アセナフテニル基、フルオレニル基等を挙げることができる。これらの中では、フェニル基、ナフチル基がより好ましい。
In the formula (I), R S represents a hydrogen atom, an alkyl group or an aryl group.
Examples of the alkyl group include linear, branched, or cyclic alkyl groups having 1 to 20 carbon atoms, such as straight chain having 1 to 12 carbon atoms, branched or carbon atoms having 3 to 12 carbon atoms. A cyclic alkyl group of several 5 to 10 is more preferable. Specific examples thereof include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, octadecyl group. , Eicosyl group, isopropyl group, isobutyl group, s-butyl group, t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group And 2-norbornyl group.
Examples of the aryl group include those having 1 to 3 benzene rings forming a condensed ring in addition to those having a monocyclic structure, and those having a benzene ring and a 5-membered unsaturated ring forming a condensed ring. it can. Specific examples include phenyl group, naphthyl group, anthryl group, phenanthryl group, indenyl group, acenaphthenyl group, fluorenyl group and the like. In these, a phenyl group and a naphthyl group are more preferable.
 これらのアルキル基やアリール基は、更に置換基を有していてもよく、導入しうる置換基としては、炭素数1~20の直鎖状、分岐状又は環状のアルキル基、炭素数2~20の直鎖状、分岐状又は環状のアルケニル基、炭素数2~20のアルキニル基、炭素数6~20のアリール基、炭素数1~20のアシルオキシ基、炭素数2~20のアルコキシカルボニルオキシ基、炭素数7~20のアリールオキシカルボニルオキシ基、炭素数1~20のカルバモイルオキシ基、炭素数1~20のカルボンアミド基、炭素数1~20のスルホンアミド基、炭素数1~20のカルバモイル基、スルファモイル基、炭素数1~20の置換スルファモイル基、炭素数1~20のアルコキシ基、炭素数6~20のアリールオキシ基、炭素数7~20のアリールオキシカルボニル基、炭素数2~20のアルコキシカルボニル基、炭素数1~20のN-アシルスルファモイル基、炭素数1~20のN-スルファモイルカルバモイル基、炭素数1~20のアルキルスルホニル基、炭素数6~20のアリールスルホニル基、炭素数2~20のアルコキシカルボニルアミノ基、炭素数7~20のアリールオキシカルボニルアミノ基、アミノ基、炭素原子数1~20の置換アミノ基、炭素数1~20のイミノ基、炭素数3~20のアンモニオ基、カルボキシ基、スルホ基、オキシ基、メルカプト基、炭素数1~20のアルキルスルフィニル基、炭素数6~20のアリールスルフィニル基、炭素数1~20のアルキルチオ基、炭素数6~20のアリールチオ基、炭素数1~20のウレイド基、炭素数2~20のヘテロ環基、炭素数1~20のアシル基、スルファモイルアミノ基、炭素数1~2の置換スルファモイルアミノ基、炭素数2~20のシリル基、イソシアネート基、イソシアニド基、ハロゲン原子(例えば、フッ素原子、塩素原子、臭素原子等)、シアノ基、ニトロ基、オニウム基、水酸基等が挙げられる。 These alkyl groups and aryl groups may further have a substituent. Examples of the substituent that can be introduced include a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, and 2 to 2 carbon atoms. 20 linear, branched or cyclic alkenyl groups, alkynyl groups having 2 to 20 carbon atoms, aryl groups having 6 to 20 carbon atoms, acyloxy groups having 1 to 20 carbon atoms, alkoxycarbonyloxy having 2 to 20 carbon atoms Group, aryloxycarbonyloxy group having 7 to 20 carbon atoms, carbamoyloxy group having 1 to 20 carbon atoms, carbonamido group having 1 to 20 carbon atoms, sulfonamide group having 1 to 20 carbon atoms, and 1 to 20 carbon atoms Carbamoyl group, sulfamoyl group, substituted sulfamoyl group having 1 to 20 carbon atoms, alkoxy group having 1 to 20 carbon atoms, aryloxy group having 6 to 20 carbon atoms, aryl having 7 to 20 carbon atoms Xoxycarbonyl group, C2-C20 alkoxycarbonyl group, C1-C20 N-acylsulfamoyl group, C1-C20 N-sulfamoylcarbamoyl group, C1-C20 alkylsulfonyl Group, arylsulfonyl group having 6 to 20 carbon atoms, alkoxycarbonylamino group having 2 to 20 carbon atoms, aryloxycarbonylamino group having 7 to 20 carbon atoms, amino group, substituted amino group having 1 to 20 carbon atoms, carbon An imino group having 1 to 20 carbon atoms, an ammonio group having 3 to 20 carbon atoms, a carboxy group, a sulfo group, an oxy group, a mercapto group, an alkylsulfinyl group having 1 to 20 carbon atoms, an arylsulfinyl group having 6 to 20 carbon atoms, carbon An alkylthio group having 1 to 20 carbon atoms, an arylthio group having 6 to 20 carbon atoms, a ureido group having 1 to 20 carbon atoms, and a hete having 2 to 20 carbon atoms A cyclic group, an acyl group having 1 to 20 carbon atoms, a sulfamoylamino group, a substituted sulfamoylamino group having 1 to 2 carbon atoms, a silyl group having 2 to 20 carbon atoms, an isocyanate group, an isocyanide group, a halogen atom (for example, , Fluorine atom, chlorine atom, bromine atom, etc.), cyano group, nitro group, onium group, hydroxyl group and the like.
 また、式(I)において、Aは、N=C-XSと共にヘテロ環を形成する原子団を表す。
 この原子団を構成する原子としては、炭素原子、窒素原子、水素原子、硫黄原子、セレン原子等が挙げられる。
 なお、AとN=C-XSとで形成されるヘテロ環は、更に置換基を有していてもよく、導入しうる置換基としては、上記アルキル基やアリール基に導入可能な置換基と同様のものが挙げられる。
In Formula (I), A represents an atomic group that forms a heterocycle with N═C—X S.
Examples of atoms constituting this atomic group include a carbon atom, a nitrogen atom, a hydrogen atom, a sulfur atom, and a selenium atom.
The heterocycle formed by A and N═C—X S may further have a substituent, and examples of the substituent that can be introduced include substituents that can be introduced into the alkyl group and aryl group. The same thing is mentioned.
 また、単官能芳香族メルカプト化合物は、下記式(II)~式(V)で表される化合物であることがより好ましい。 The monofunctional aromatic mercapto compound is more preferably a compound represented by the following formulas (II) to (V).
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 式(II)~式(V)中、RS1は、水素原子又はアリール基を表し、XS1はそれぞれ独立に、水酸基、ハロゲン原子、アルコキシ基、アリーロキシ基、アルキル基又はアリール基を表し、RS2は、アルキル基又はアリール基を表し、nは0~4の整数を表し、mは0~5の整数を表す。 In formulas (II) to (V), R S1 represents a hydrogen atom or an aryl group, and X S1 independently represents a hydroxyl group, a halogen atom, an alkoxy group, an aryloxy group, an alkyl group or an aryl group, and R S2 represents an alkyl group or an aryl group, n represents an integer of 0 to 4, and m represents an integer of 0 to 5.
 式(II)~式(V)におけるハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子が好ましい。
 式(II)~式(V)におけるアルコキシ基及びアリーロキシ基としては、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブチルオキシ基、ペンチルオキシ基、ヘキシルオキシ基、ドデシルオキシ基、ベンジルオキシ基、アリルオキシ基、フェネチルオキシ基、カルボキシエチルオキシ基、メトキシカルボニルエチルオキシ基、エトキシカルボニルエチルオキシ基、メトキシエトキシ基、フェノキシエトキシ基、メトキシエトキシエトキシ基、エトキシエトキシエトキシ基、モルホリノエトキシ基、モルホリノプロピルオキシ基、アリロキシエトキシエトキシ基、フェノキシ基、トリルオキシ基、キシリルオキシ基、メシチルオキシ基、クメチルオキシ基、メトキシフェニルオキシ基、エトキシフェニルオキシ基、クロロフェニルオキシ基、ブロモフェニルオキシ基、アセチルオキシ基、ベンゾイルオキシ基、ナフチルオキシ基等が挙げられる。
 式(II)~式(V)におけるアルキル基は、式(I)のRSで表されるアルキル基と同義であり、その好ましい範囲も同様である。
 また、式(II)~式(V)におけるアリール基は、式(I)のRSで表されるアリール基と同義であり、その好ましい範囲も同様である。
 式(II)~式(V)における各基は、更に置換基を有していてもよく、その置換基としては、式(I)のRSで表されるアルキル基やアリール基に導入可能な置換基として挙げられているものと同様である。
The halogen atom in the formulas (II) to (V) is preferably a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
Examples of the alkoxy group and aryloxy group in the formulas (II) to (V) include a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butyloxy group, a pentyloxy group, a hexyloxy group, a dodecyloxy group, and a benzyloxy group. , Allyloxy group, phenethyloxy group, carboxyethyloxy group, methoxycarbonylethyloxy group, ethoxycarbonylethyloxy group, methoxyethoxy group, phenoxyethoxy group, methoxyethoxyethoxy group, ethoxyethoxyethoxy group, morpholinoethoxy group, morpholinopropyloxy Group, allyloxyethoxyethoxy group, phenoxy group, tolyloxy group, xylyloxy group, mesityloxy group, cumyloxy group, methoxyphenyloxy group, ethoxyphenyloxy group, chloro Eniruokishi group, bromophenyl group, acetyloxy group, benzoyloxy group, naphthyloxy group and the like.
The alkyl group in the formulas (II) to (V) is synonymous with the alkyl group represented by R S in the formula (I), and its preferred range is also the same.
In addition, the aryl group in the formulas (II) to (V) has the same meaning as the aryl group represented by R S in the formula (I), and the preferred range thereof is also the same.
Each group in formula (II) to formula (V) may further have a substituent, and the substituent can be introduced into the alkyl group or aryl group represented by R S in formula (I). These are the same as those listed as examples of the substituent.
 式(II)~式(V)中、n及びmが0であることが、有機溶剤への溶解性の観点でより好ましい。
 式(II)~式(V)の化合物のうち、より好ましいのは以下の化合物である。これらの化合物を用いると膜強度が高まり、更に保存安定性も良好である。
In the formulas (II) to (V), n and m are preferably 0 from the viewpoint of solubility in an organic solvent.
Of the compounds of formula (II) to formula (V), the following compounds are more preferred. When these compounds are used, the film strength increases and the storage stability is also good.
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 成分Hは、基板に対する密着性の観点では、多官能メルカプト化合物が好ましい。
 本発明において多官能メルカプト化合物とは、メルカプト基(チオール基)を分子内に2個以上有する化合物を意味する。多官能メルカプト化合物としては、分子量100以上の低分子化合物が好ましく、具体的には、分子量100~1,500であることがより好ましく、150~1,000が更に好ましい。
 多官能メルカプト化合物の官能基数としては、2~10官能が好ましく、2~8官能がより好ましく、2~4官能が更に好ましい。官能基数が大きくなると膜強度に優れる一方、官能基数が小さいと保存安定性に優れる。上記範囲の場合、これらを両立することができる。
Component H is preferably a polyfunctional mercapto compound from the viewpoint of adhesion to the substrate.
In the present invention, the polyfunctional mercapto compound means a compound having two or more mercapto groups (thiol groups) in the molecule. As the polyfunctional mercapto compound, a low molecular compound having a molecular weight of 100 or more is preferable, specifically, a molecular weight of 100 to 1,500 is more preferable, and 150 to 1,000 is still more preferable.
The number of functional groups of the polyfunctional mercapto compound is preferably 2 to 10 functions, more preferably 2 to 8 functions, and even more preferably 2 to 4 functions. When the number of functional groups is large, the film strength is excellent, while when the number of functional groups is small, the storage stability is excellent. In the case of the said range, these can be made compatible.
 脂肪族多官能メルカプト化合物としては、下記式(S-1)で表される基を2個以上有する化合物が好ましい。 As the aliphatic polyfunctional mercapto compound, a compound having two or more groups represented by the following formula (S-1) is preferable.
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
 式(S-1)中、R1Sは水素原子又はアルキル基を表し、A1Sは-CO-又は-CH2-を表し、波線部分は他の構造との結合位置を表す。 In formula (S-1), R 1S represents a hydrogen atom or an alkyl group, A 1S represents —CO— or —CH 2 —, and the wavy line represents a bonding position with another structure.
 多官能メルカプト化合物としては、式(S-1)で表される基を2以上6以下有する化合物が好ましく、式(S-1)で表される基を2以上4以下有する化合物が更に好ましい。
 式(S-1)中のR1Sにおけるアルキル基としては、直鎖、分岐、及び環状のアルキル基であり、炭素数の範囲としては1~16が好ましく、1~10がより好ましい。アルキル基の具体例としては、メチル基、エチル基、プロピル基、i-プロピル基、ブチル基、s-ブチル基、t-ブチル基、ペンチル基、へキシル基、2-エチルへキシル基等であり、メチル基、エチル基、プロピル基又はi-プロピル基が好ましい。
 R1Sとしては、水素原子、メチル基、エチル基、プロピル基、i-プロピル基が特に好ましく、メチル基又はエチル基が最も好ましい。
As the polyfunctional mercapto compound, a compound having 2 to 6 groups represented by the formula (S-1) is preferable, and a compound having 2 to 4 groups represented by the formula (S-1) is more preferable.
The alkyl group for R 1S in formula (S-1) is a linear, branched, or cyclic alkyl group, and the carbon number is preferably 1 to 16, more preferably 1 to 10. Specific examples of the alkyl group include methyl group, ethyl group, propyl group, i-propyl group, butyl group, s-butyl group, t-butyl group, pentyl group, hexyl group, 2-ethylhexyl group and the like. And a methyl group, an ethyl group, a propyl group or an i-propyl group is preferred.
R 1S is particularly preferably a hydrogen atom, a methyl group, an ethyl group, a propyl group, or an i-propyl group, and most preferably a methyl group or an ethyl group.
 本発明において、多官能メルカプト化合物としては、上記式(S-1)で表される基を複数個有する下記式(S-2)で表される化合物であることが特に好ましい。 In the present invention, the polyfunctional mercapto compound is particularly preferably a compound represented by the following formula (S-2) having a plurality of groups represented by the above formula (S-1).
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 式(S-2)中、R1Sはそれぞれ独立に、水素原子又はアルキル基を表し、A1Sはそれぞれ独立に、-CO-又は-CH2-を表し、L1SはnS価の連結基を表し、nSは2~6の整数を表す。合成上の観点からは、R1Sは全て同じ基であることが好ましく、また、A1Sは全て同じ基であることが好ましい。 In the formula (S-2), R 1S independently represents a hydrogen atom or an alkyl group, A 1S independently represents —CO— or —CH 2 —, and L 1S represents an nS-valent linking group. NS represents an integer of 2 to 6. From the viewpoint of synthesis, it is preferred that all R 1S are the same group, and all A 1S are preferably the same group.
 式(S-2)中のR1Sは、上記式(S-1)中のR1Sと同義であり、好ましい範囲も同様である。nSは2~4の整数が好ましい。
 式(S-2)中のnS価の連結基であるL1Sとしては、例えば-(CH2mS-(mSは2~6の整数を表す。)などの二価の連結基、トリメチロールプロパン残基、-(CH2pS-(pSは2~6の整数を表す。)を3個有するイソシアヌル環などの三価の連結基、ペンタエリスリトール残基などの四価の連結基又は五価の連結基、ジペンタエリスリトール残基などの六価の連結基が挙げられる。
R 1S in formula (S-2) has the same meaning as R 1S in formula (S-1), and the preferred range is also the same. nS is preferably an integer of 2 to 4.
L 1S as the nS-valent linking group in the formula (S-2) is, for example, a divalent linking group such as — (CH 2 ) mS — (mS represents an integer of 2 to 6), trimethylol, etc. A trivalent linking group such as an isocyanuric ring having three propane residues, — (CH 2 ) pS — (pS represents an integer of 2 to 6), a tetravalent linking group such as a pentaerythritol residue, or five And hexavalent linking groups such as a divalent linking group and a dipentaerythritol residue.
 更に、多官能メルカプト化合物としては、第二級チオールがより好ましい。 Further, as the polyfunctional mercapto compound, a secondary thiol is more preferable.
 多官能メルカプト化合物として具体的には、エチレングリコールビスチオプロピオネート、ブタンジオールビスチオプロピオネート、トリメチロールプロパントリス(3-メルカプトプロピオネート)、トリス[(3-メルカプトプロピオニルオキシ)エチル]イソシアヌレート、ペンタエリスリトールテトラキス(3-メルカプトプロピオネート)、テトラエチレングリコールビス(3-メルカプトプロピオネート)、ジペンタエリスリトールヘキサキス(3-メルカプトプロピオネート)、ペンタエリスリトールテトラキス(3-メルカプトブチレート)、1,4-ビス(3-メルカプトブチリルオキシ)ブタン、1,3,5-トリス(3-メルカプトブチリルオキシエチル)-1,3,5-トリアジン-2,4,6(1H,3H,5H)-トリオン、1,2-ベンゼンジチオール、1,3-ベンゼンジチオール、1,2-エタンジチオール、1,3-プロパンジチオール、1,6-ヘキサメチレンジチオール、2,2’-(エチレンジチオ)ジエタンチオール、meso-2,3-ジメルカプトコハク酸、p-キシレンジチオール、m-キシレンジチオール、ジ(メルカプトエチル)エーテル等を例示することができる。 Specific examples of the polyfunctional mercapto compound include ethylene glycol bisthiopropionate, butanediol bisthiopropionate, trimethylolpropane tris (3-mercaptopropionate), and tris [(3-mercaptopropionyloxy) ethyl]. Isocyanurate, pentaerythritol tetrakis (3-mercaptopropionate), tetraethylene glycol bis (3-mercaptopropionate), dipentaerythritol hexakis (3-mercaptopropionate), pentaerythritol tetrakis (3-mercaptobutyrate) Rate), 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mercaptobutyryloxyethyl) -1,3,5-triazine-2,4,6 (1H , 3H, 5 ) -Trione, 1,2-benzenedithiol, 1,3-benzenedithiol, 1,2-ethanedithiol, 1,3-propanedithiol, 1,6-hexamethylenedithiol, 2,2 '-(ethylenedithio) di Examples include ethanethiol, meso-2,3-dimercaptosuccinic acid, p-xylenedithiol, m-xylenedithiol, di (mercaptoethyl) ether, and the like.
 多官能メルカプト化合物としては、ペンタエリスリトールテトラキス(3-メルカプトブチレート)、1,4-ビス(3-メルカプトブチリルオキシ)ブタン、1,3,5-トリス(3-メルカプトブチリルオキシエチル)-1,3,5-トリアジン-2,4,6(1H,3H,5H)-トリオンが好ましく挙げられ、ペンタエリスリトールテトラキス(3-メルカプトブチレート)がより好ましく挙げられる。 Examples of polyfunctional mercapto compounds include pentaerythritol tetrakis (3-mercaptobutyrate), 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mercaptobutyryloxyethyl)- 1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione is preferred, and pentaerythritol tetrakis (3-mercaptobutyrate) is more preferred.
 本発明において、メルカプト化合物は、1種単独で用いても、2種以上を併用してもよい。
 本発明において、メルカプト化合物の含有量は、硬化性組成物の全固形分に対して、0.1~15質量%であることが好ましく、0.5~10質量%であることがより好ましく、1~5質量%であることが更に好ましい。上記範囲であると、膜強度と保存安定性との両立の点で優れる。
In this invention, a mercapto compound may be used individually by 1 type, or may use 2 or more types together.
In the present invention, the content of the mercapto compound is preferably 0.1 to 15% by mass, more preferably 0.5 to 10% by mass, based on the total solid content of the curable composition. More preferably, it is 1 to 5% by mass. It is excellent in the point of coexistence with film | membrane strength and storage stability as it is the said range.
(成分W)界面活性剤  
 本発明の硬化性組成物は、界面活性剤を含有してもよい。
 界面活性剤としては、アニオン系、カチオン系、ノニオン系、又は、両性のいずれでも使用することができるが、好ましい界面活性剤はノニオン系界面活性剤である。界面活性剤は、ノニオン系界面活性剤が好ましく、フッ素系界面活性剤がより好ましい。
 本発明に用いることができる界面活性剤としては、例えば、市販品である、メガファックF142D、同F172、同F173、同F176、同F177、同F183、同F479、同F482、同F554、同F780、同F781、同F781-F、同R30、同R08、同F-472SF、同BL20、同R-61、同R-90(DIC(株)製)、フロラードFC-135、同FC-170C、同FC-430、同FC-431、Novec FC-4430(住友スリーエム(株)製)、アサヒガードAG7105,7000,950,7600、サーフロンS-112、同S-113、同S-131、同S-141、同S-145、同S-382、同SC-101、同SC-102、同SC-103、同SC-104、同SC-105、同SC-106(旭硝子(株)製)、エフトップEF351、同352、同801、同802(三菱マテリアル電子化成(株)製)、フタージェント250(ネオス(株)製)が挙げられる。また、上記以外にも、KP(信越化学工業(株)製)、ポリフロー(共栄社化学(株)製)、エフトップ(三菱マテリアル電子化成(株)製)、メガファック(DIC(株)製)、フロラード(住友スリーエム(株)製)、アサヒガード、サーフロン(旭硝子(株)製)、PolyFox(OMNOVA社製)等の各シリーズを挙げることができる。
(Component W) Surfactant
The curable composition of the present invention may contain a surfactant.
As the surfactant, any of anionic, cationic, nonionic, or amphoteric surfactants can be used, but a preferred surfactant is a nonionic surfactant. The surfactant is preferably a nonionic surfactant, and more preferably a fluorosurfactant.
As the surfactant that can be used in the present invention, for example, commercially available products such as MegaFuck F142D, F172, F173, F176, F177, F183, F479, F482, F554, and F780 are commercially available. F781, F781-F, R30, R08, F-472SF, BL20, R-61, R-90 (manufactured by DIC Corporation), Florard FC-135, FC-170C, FC-430, FC-431, Novec FC-4430 (manufactured by Sumitomo 3M Limited), Asahi Guard AG7105, 7000, 950, 7600, Surflon S-112, S-113, S-131, S -141, S-145, S-382, SC-101, SC-102, SC-103, SC-104, SC-1 05, SC-106 (manufactured by Asahi Glass Co., Ltd.), F-top EF351, 352, 801, 802 (manufactured by Mitsubishi Materials Denka Kasei), and Footgent 250 (manufactured by Neos Co., Ltd.). . In addition to the above, KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (manufactured by Kyoeisha Chemical Co., Ltd.), F-Top (manufactured by Mitsubishi Materials Denka Kasei Co., Ltd.), MegaFuck (manufactured by DIC Corporation) , FLORARD (manufactured by Sumitomo 3M Co., Ltd.), Asahi Guard, Surflon (manufactured by Asahi Glass Co., Ltd.), PolyFox (manufactured by OMNOVA), and the like.
 また、界面活性剤としては、下記式(W)で表される構成単位A及び構成単位Bを含み、テトラヒドロフランを溶媒としてゲルパーミエーションクロマトグラフィで測定されるポリスチレン換算の重量平均分子量(Mw)が1,000以上10,000以下である共重合体を好ましい例として挙げることができる。 In addition, the surfactant includes a structural unit A and a structural unit B represented by the following formula (W), and has a polystyrene-reduced weight average molecular weight (Mw) of 1 measured by gel permeation chromatography using tetrahydrofuran as a solvent. As a preferable example, a copolymer having a molecular weight of 1,000 or more and 10,000 or less can be given.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 式(W)中、RW1及びRW3はそれぞれ独立に、水素原子又はメチル基を表し、RW2は炭素数1以上4以下の直鎖アルキレン基を表し、RW4は水素原子又は炭素数1以上4以下のアルキル基を表し、LWは炭素数3以上6以下のアルキレン基を表し、p及びqは重合比を表す質量百分率であり、pは10質量%以上80質量%以下の数値を表し、qは20質量%以上90質量%以下の数値を表し、rは1以上18以下の整数を表し、sは1以上10以下の整数を表す。 In formula (W), R W1 and R W3 each independently represent a hydrogen atom or a methyl group, R W2 represents a linear alkylene group having 1 to 4 carbon atoms, and R W4 represents a hydrogen atom or 1 carbon atom. Represents an alkyl group having 4 or less, L W represents an alkylene group having 3 to 6 carbon atoms, p and q are mass percentages representing a polymerization ratio, and p is a numerical value of 10% by mass to 80% by mass. Q represents a numerical value of 20% by mass to 90% by mass, r represents an integer of 1 to 18, and s represents an integer of 1 to 10.
 上記LWは、下記式(W-2)で表される分岐アルキレン基であることが好ましい。式(W-2)におけるRW5は、炭素数1以上4以下のアルキル基を表し、相溶性と被塗布面に対する濡れ性の点で、炭素数1以上3以下のアルキル基が好ましく、炭素数2又は3のアルキル基がより好ましい。
 式(W)におけるpとqとの和(p+q)は、p+q=100、すなわち、100質量%であることが好ましい。
 上記共重合体の重量平均分子量(Mw)は、1,500以上5,000以下がより好ましい。
L W is preferably a branched alkylene group represented by the following formula (W-2). R W5 in formula (W-2) represents an alkyl group having 1 to 4 carbon atoms, and is preferably an alkyl group having 1 to 3 carbon atoms in terms of compatibility and wettability to the coated surface. Two or three alkyl groups are more preferred.
The sum (p + q) of p and q in the formula (W) is preferably p + q = 100, that is, 100% by mass.
The weight average molecular weight (Mw) of the copolymer is more preferably from 1,500 to 5,000.
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 本発明の硬化性組成物における界面活性剤の含有量は、配合する場合、硬化性組成物の全固形分中100質量部に対して、0.001~5.0質量部が好ましく、0.01~2.0質量部がより好ましい。
 界面活性剤は、1種類のみ含んでいてもよいし、2種類以上含んでいてもよい。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。
When blended, the content of the surfactant in the curable composition of the present invention is preferably 0.001 to 5.0 parts by mass with respect to 100 parts by mass in the total solid content of the curable composition. More preferred is 01 to 2.0 parts by mass.
Only one type of surfactant may be included, or two or more types of surfactants may be included. When two or more types are included, the total amount is preferably within the above range.
<その他の成分>
 本発明の硬化性組成物には、必要に応じて、可塑剤、重合禁止剤、熱酸発生剤、酸増殖剤、酸化防止剤、エポキシ化合物、オキセタン化合物等のその他の成分を添加することができる。これらの成分については、例えば、特開2009-98616号公報、特開2009-244801号公報に記載のもの、その他公知のものを用いることができる。また、“高分子添加剤の新展開((株)日刊工業新聞社)”に記載の各種紫外線吸収剤や、金属不活性化剤等を本発明の硬化性組成物に添加してもよい。
<Other ingredients>
If necessary, the curable composition of the present invention may contain other components such as a plasticizer, a polymerization inhibitor, a thermal acid generator, an acid multiplier, an antioxidant, an epoxy compound, and an oxetane compound. it can. As these components, for example, those described in JP2009-98616A, JP2009-244801A, and other known ones can be used. Further, various ultraviolet absorbers described in “New Development of Polymer Additives (Nikkan Kogyo Shimbun Co., Ltd.)”, metal deactivators, and the like may be added to the curable composition of the present invention.
<<酸化防止剤>>
 本発明の硬化性樹脂組成物は、酸化防止剤を含有してもよい。酸化防止剤としては、公知の酸化防止剤を含有することができる。酸化防止剤を添加することにより、硬化膜の着色を防止できる、又は、分解による膜厚減少を低減でき、また、耐熱透明性に優れるという利点がある。
 このような酸化防止剤としては、例えば、リン系酸化防止剤、アミド類、ヒドラジド類、ヒンダードアミン系酸化防止剤、イオウ系酸化防止剤、フェノール系酸化防止剤、アスコルビン酸類、硫酸亜鉛、糖類、亜硝酸塩、亜硫酸塩、チオ硫酸塩、ヒドロキシルアミン誘導体などを挙げることができる。これらの中では、硬化膜の着色、膜厚減少の観点から特にフェノール系酸化防止剤、ヒンダードアミン系酸化防止剤、リン系酸化防止剤、イオウ系酸化防止剤が好ましく、フェノール系酸化防止剤が最も好ましい。これらは1種単独で用いてもよいし、2種以上を混合してもよい。
 具体例としては、特開2005-29515号公報の段落0026~0031に記載の化合物、特開2011-227106号公報の段落0106~0116に記載の化合物を挙げる事ができ、これらの内容は本願明細書に組み込まれる。
 好ましい市販品として、アデカスタブAO-60、アデカスタブAO-80、アデカスタブAO-412S(以上、(株)ADEKA製)、イルガノックス1035、イルガノックス1098(以上、BASF社製)を挙げることができる。
 酸化防止剤の含有量は、特に制限はないが、硬化性組成物の全固形分に対して、0.01~10質量%であることが好ましく、0.02~5質量%であることがより好ましく、0.05~4質量%であることが更に好ましい。
<< Antioxidant >>
The curable resin composition of the present invention may contain an antioxidant. As an antioxidant, a well-known antioxidant can be contained. By adding an antioxidant, there is an advantage that coloring of the cured film can be prevented, or a decrease in film thickness due to decomposition can be reduced, and heat resistant transparency is excellent.
Examples of such antioxidants include phosphorus antioxidants, amides, hydrazides, hindered amine antioxidants, sulfur antioxidants, phenol antioxidants, ascorbic acids, zinc sulfate, sugars, Examples thereof include nitrates, sulfites, thiosulfates, and hydroxylamine derivatives. Of these, phenolic antioxidants, hindered amine antioxidants, phosphorus antioxidants, and sulfur antioxidants are particularly preferable from the viewpoint of coloring the cured film and reducing the film thickness, with phenolic antioxidants being the most preferred. preferable. These may be used individually by 1 type and may mix 2 or more types.
Specific examples include the compounds described in paragraphs 0026 to 0031 of JP-A-2005-29515, and the compounds described in paragraphs 0106 to 0116 of JP-A-2011-227106. Embedded in the book.
Preferred commercial products include ADK STAB AO-60, ADK STAB AO-80, ADK STAB AO-412S (above, manufactured by ADEKA Corporation), IRGANOX 1035, and IRGANOX 1098 (above, manufactured by BASF).
The content of the antioxidant is not particularly limited, but is preferably 0.01 to 10% by mass and preferably 0.02 to 5% by mass with respect to the total solid content of the curable composition. More preferably, it is 0.05 to 4% by mass.
<<重合禁止剤>>
 本発明の硬化性樹脂組成物は、重合禁止剤を含有してもよい。重合禁止剤とは、露光により重合開始剤から発生した重合開始ラジカル成分に対して水素供与(又は、水素授与)、エネルギー供与(又は、エネルギー授与)、電子供与(又は、電子授与)などを実施し、重合開始ラジカルを失活させ、重合開始を禁止する役割をはたす物質である。例えば、特開2007-334322号公報の段落0154~0173に記載の化合物などを用いることができる。
 好ましい化合物として、フェノチアジン、フェノキサジン、ヒドロキノン、ヒドロキノンモノメチルエーテル、3,5-ジブチル-4-ヒドロキシトルエンを挙げることができる。
 重合禁止剤の含有量は、特に制限はないが、硬化性組成物の全固形分に対して、0.0001~5質量%であることが好ましい。
<< Polymerization inhibitor >>
The curable resin composition of the present invention may contain a polymerization inhibitor. A polymerization inhibitor is used to perform hydrogen donation (or hydrogen donation), energy donation (or energy donation), electron donation (or electron donation), etc. to the polymerization initiation radical component generated from the polymerization initiator by exposure. It is a substance that plays a role of deactivating polymerization initiation radicals and prohibiting polymerization initiation. For example, compounds described in paragraphs 0154 to 0173 of JP2007-334322A can be used.
Preferable compounds include phenothiazine, phenoxazine, hydroquinone, hydroquinone monomethyl ether, and 3,5-dibutyl-4-hydroxytoluene.
The content of the polymerization inhibitor is not particularly limited, but is preferably 0.0001 to 5% by mass with respect to the total solid content of the curable composition.
<各成分の含有量>
 本発明の硬化性組成物の全固形分に対し、成分Aの総含有量は、40~99質量%であることが好ましく、成分Bの含有量は0.5~30質量%であることが好ましく、成分Cの含有量は0.1~20質量%であることが好ましく、成分Eの含有量は0~30質量%であることが好ましく、成分Fの含有量は0~50質量%であることが好ましく、成分Gの含有量は0~20質量%であることが好ましく、成分Hの含有量は0~15質量%であることが好ましく、成分Wの含有量は0~5質量%であることが好ましい。
 また、成分Dの含有量は硬化性組成物の全固形分100質量部あたり、100~3,000質量部であることが好ましい。
 また、本発明の硬化性組成物の全有機固形分に対し、成分Aの含有量は40~80質量%であることが好ましく、成分Bの含有量は0.5~30質量%であることが好ましく、成分Cの含有量は0.1~20質量%であることが好ましい。
 また、成分Aと成分Bと成分Cとの合計量は、硬化性組成物の全有機固形分に対し85質量%以上であることが好ましく、90質量%以上であることがより好ましく、95質量%以上であることが更に好ましい。
<Content of each component>
The total content of component A is preferably 40 to 99% by mass and the content of component B is 0.5 to 30% by mass with respect to the total solid content of the curable composition of the present invention. Preferably, the content of component C is preferably 0.1 to 20% by mass, the content of component E is preferably 0 to 30% by mass, and the content of component F is 0 to 50% by mass. Preferably, the content of component G is preferably 0 to 20% by mass, the content of component H is preferably 0 to 15% by mass, and the content of component W is 0 to 5% by mass. It is preferable that
The content of component D is preferably 100 to 3,000 parts by mass per 100 parts by mass of the total solid content of the curable composition.
The content of component A is preferably 40 to 80% by mass and the content of component B is 0.5 to 30% by mass with respect to the total organic solid content of the curable composition of the present invention. The content of component C is preferably 0.1 to 20% by mass.
The total amount of component A, component B, and component C is preferably 85% by mass or more, more preferably 90% by mass or more, and 95% by mass with respect to the total organic solid content of the curable composition. % Or more is more preferable.
<その他の成分>
 本発明の硬化性組成物には、必要に応じて、可塑剤、熱酸発生剤、酸増殖剤等のその他の成分を添加することができる。これらの成分については、例えば、特開2009-98616号公報、特開2009-244801号公報に記載のもの、その他公知のものを用いることができる。また、“高分子添加剤の新展開((株)日刊工業新聞社)”に記載の各種紫外線吸収剤や、金属不活性化剤等を本発明の硬化性組成物に添加してもよい。また、本発明の硬化性組成物はポリマー粒子を含まない方が好ましい。
<Other ingredients>
The curable composition of the present invention may contain other components such as a plasticizer, a thermal acid generator, and an acid multiplication agent as necessary. As these components, for example, those described in JP2009-98616A, JP2009-244801A, and other known ones can be used. Further, various ultraviolet absorbers described in “New Development of Polymer Additives (Nikkan Kogyo Shimbun Co., Ltd.)”, metal deactivators, and the like may be added to the curable composition of the present invention. Moreover, it is preferable that the curable composition of the present invention does not contain polymer particles.
(硬化物及びその製造方法)
 本発明の硬化物は、本発明の硬化性組成物を硬化させた硬化物である。上記硬化物としては、硬化膜であることが好ましい。また、本発明の硬化物は、本発明の硬化物の製造方法により得られた硬化物であることが好ましい。
 本発明の硬化物の製造方法は、本発明の硬化性組成物を硬化させ硬化物を製造する方法であれば、特に制限はないが、以下の1~3の工程を含むことが好ましい。
工程1として、本発明の硬化性組成物を基板上に塗布する塗布工程
工程2として、塗布された硬化性組成物から溶剤を除去する溶剤除去工程
工程3として、有機溶剤が除去された硬化性組成物を光及び/又は熱により硬化する硬化工程
 また、本発明の硬化物の製造方法は、以下の1~4の工程を含むことがより好ましい。
(Hardened product and manufacturing method thereof)
The cured product of the present invention is a cured product obtained by curing the curable composition of the present invention. The cured product is preferably a cured film. Moreover, it is preferable that the hardened | cured material of this invention is the hardened | cured material obtained by the manufacturing method of the hardened | cured material of this invention.
The method for producing a cured product of the present invention is not particularly limited as long as it is a method for producing a cured product by curing the curable composition of the present invention, but preferably includes the following steps 1 to 3.
As the process 1, as the application process 2 for applying the curable composition of the present invention on the substrate, as the solvent removal process 3 as the solvent removing process 3 for removing the solvent from the applied curable composition, the curable composition from which the organic solvent has been removed. Curing Step for Curing the Composition with Light and / or Heat Further, the method for producing a cured product of the present invention more preferably includes the following steps 1 to 4.
工程1として、本発明の硬化性組成物を基板上に塗布する塗布工程
工程2として、塗布された硬化性組成物から有機溶剤を除去する溶剤除去工程
工程3として、有機溶剤が除去された硬化性組成物を光により硬化する硬化工程
工程4として、光により硬化した硬化物を熱処理する熱処理工程
 また、上記本発明の硬化物の製造方法は、硬化膜の製造方法であることが好ましい。
As step 1, as the coating step 2 for applying the curable composition of the present invention on the substrate, as the solvent removing step 3 for removing the organic solvent from the applied curable composition, the curing with the organic solvent removed As a curing process step 4 for curing the curable composition with light, a heat treatment step for heat-treating the cured product cured with light Further, the method for producing a cured product of the present invention is preferably a method for producing a cured film.
 (1)の塗布工程では、本発明の硬化性組成物を基板上に塗布して溶剤を含む湿潤膜とすることが好ましい。硬化性組成物を基板へ塗布する前にアルカリ洗浄やプラズマ洗浄といった基板の洗浄を行うことができる。更に基板洗浄後にヘキサメチルジシラザン等で基板表面を処理することができる。この処理を行うことにより、硬化性組成物の基板への密着性が向上する傾向にある。
 上記の基板としては、無機基板、樹脂、樹脂複合材料などが挙げられる。
 無機基板としては、例えば、ガラス、石英、シリコン、シリコンナイトライド、及び、それらのような基板上にモリブデン、チタン、アルミ、銅などを蒸着した複合基板が挙げられる。
 樹脂としては、ポリブチレンテレフタレート、ポリエチレンテレフタレート、ポリエチレンナフタレート、ポリブチレンナフタレート、ポリスチレン、ポリカーボネート、ポリスルホン、ポリエーテルスルホン、ポリアリレート、アリルジグリコールカーボネート、ポリアミド、ポリイミド、ポリアミドイミド、ポリエーテルイミド、ポリベンズアゾール、ポリフェニレンサルファイド、ポリシクロオレフィン、ノルボルネン樹脂、ポリクロロトリフルオロエチレン等のフッ素樹脂、液晶ポリマー、アクリル樹脂、エポキシ樹脂、シリコーン樹脂、アイオノマー樹脂、シアネート樹脂、架橋フマル酸ジエステル、環状ポリオレフィン、芳香族エーテル、マレイミドーオレフィン、セルロース、エピスルフィド樹脂等の合成樹脂からなる基板が挙げられる。これらの基板は、上記の形態のまま用いられる場合は少なく、通常、最終製品の形態によって、例えば、TFT素子のような多層積層構造が形成されている。
In the application step (1), the curable composition of the present invention is preferably applied onto a substrate to form a wet film containing a solvent. Before applying the curable composition to the substrate, the substrate can be cleaned such as alkali cleaning or plasma cleaning. Furthermore, the substrate surface can be treated with hexamethyldisilazane or the like after cleaning the substrate. By performing this treatment, the adhesiveness of the curable composition to the substrate tends to be improved.
Examples of the substrate include inorganic substrates, resins, and resin composite materials.
Examples of the inorganic substrate include glass, quartz, silicon, silicon nitride, and a composite substrate in which molybdenum, titanium, aluminum, copper, or the like is vapor-deposited on such a substrate.
The resins include polybutylene terephthalate, polyethylene terephthalate, polyethylene naphthalate, polybutylene naphthalate, polystyrene, polycarbonate, polysulfone, polyethersulfone, polyarylate, allyl diglycol carbonate, polyamide, polyimide, polyamideimide, polyetherimide, poly Fluorine resins such as benzazole, polyphenylene sulfide, polycycloolefin, norbornene resin, polychlorotrifluoroethylene, liquid crystal polymer, acrylic resin, epoxy resin, silicone resin, ionomer resin, cyanate resin, crosslinked fumaric acid diester, cyclic polyolefin, aromatic Substrate made of synthetic resin such as aromatic ether, maleimide-olefin, cellulose, episulfide resin It is below. These substrates are rarely used in the above-described form, and usually, a multilayer laminated structure such as a TFT element is formed depending on the form of the final product.
 本発明の硬化性組成物は、スパッタリングにより製膜された金属膜や金属酸化物に対する密着がよいため、基板としては、スパッタリングにより製膜された金属膜を含むことが好ましい。金属としては、チタン、銅、アルミニウム、インジウム、スズ、マンガン、ニッケル、コバルト、モリブデン、タングステン、クロム、銀、ネオジウム及びこれらの酸化物又は合金であることが好ましく、モリブデン、チタン、アルミニウム、銅及びこれらの合金であることが更に好ましい。なお、金属や金属酸化物は1種単独で用いても、複数種を併用してもよい。 Since the curable composition of the present invention has good adhesion to a metal film or metal oxide formed by sputtering, the substrate preferably includes a metal film formed by sputtering. The metal is preferably titanium, copper, aluminum, indium, tin, manganese, nickel, cobalt, molybdenum, tungsten, chromium, silver, neodymium and oxides or alloys thereof, molybdenum, titanium, aluminum, copper and More preferably, these alloys are used. In addition, a metal and a metal oxide may be used individually by 1 type, or may use multiple types together.
 基板への塗布方法は特に限定されず、例えば、インクジェット法、スリットコート法、スプレー法、ロールコート法、回転塗布法、流延塗布法、スリットアンドスピン法、印刷法等の方法を用いることができる。 The coating method on the substrate is not particularly limited. For example, a method such as an inkjet method, a slit coating method, a spray method, a roll coating method, a spin coating method, a casting coating method, a slit and spin method, or a printing method may be used. it can.
 (2)の溶剤除去工程では、塗布された上記の膜から、減圧(バキューム)及び/又は加熱等により、溶剤を除去して基板上に乾燥塗膜を形成させることが好ましい。溶剤除去工程の加熱条件は、好ましくは70~130℃で30~300秒間程度である。
 また、上記溶剤除去工程においては、硬化性組成物中の有機溶剤を完全に除去する必要がなく、少なくとも一部が除去されればよい。
In the solvent removal step (2), it is preferable to remove the solvent from the applied film by vacuum (vacuum) and / or heating to form a dry coating film on the substrate. The heating conditions for the solvent removal step are preferably 70 to 130 ° C. and about 30 to 300 seconds.
Moreover, in the said solvent removal process, it is not necessary to remove the organic solvent in a curable composition completely, and at least one part should just be removed.
 (3)の硬化工程では、光及び/又は熱により、重合開始剤より重合開始種を発生させ、重合を行い、有機溶剤が除去された硬化性組成物を硬化する工程である。工程(3)においては、光により少なくとも硬化する工程であることが好ましい。
 工程(3)に用いることができる光照射手段としては、硬化可能であれば特に制限はないが、水銀ランプ、メタルハライドランプ、発光ダイオード(LED)、レーザーダイオード(LD)、ガス・固体レーザー等が挙げられる。
 また、工程(3)における露光量としても、特に制限はないが、50~3,000mJ/cm2であることが好ましい。
 更に本発明では、(2)溶剤を除去する工程後、(3)熱硬化する工程前に、膜硬度向上の観点から全面露光する工程を含んでいてもよい。この場合水銀灯やLEDランプなどで50~3,000mJ/cm程度のエネルギー露光することが好ましい。
 また、パターン形成のために、(3)硬化工程において、パターン露光を行うこともでき、また、(3)硬化工程後、現像の工程を行うこともできる。パターン露光の方法はマスクを用いる方法や、レーザーなどによる直接描画などの方法が好ましい。
 工程(3)におけるこれら全面露光やパターン露光等の光照射は、酸素遮断された状態で行うことが、硬化促進の観点から好ましい。酸素を遮断する手段としては、窒素雰囲気下で露光したり、酸素遮断膜を設けることが例示される。
 パターン露光及び現像については、公知の方法や公知の現像液を用いることができる。例えば、特開2011-186398号公報、特開2013-83937号公報に記載のパターン露光方法及び現像方法を好適に用いることができる。
In the curing step (3), a polymerization initiating species is generated from the polymerization initiator by light and / or heat, polymerization is performed, and the curable composition from which the organic solvent has been removed is cured. In the step (3), it is preferably a step of curing at least by light.
The light irradiation means that can be used in the step (3) is not particularly limited as long as it can be cured, but a mercury lamp, a metal halide lamp, a light emitting diode (LED), a laser diode (LD), a gas / solid laser, and the like can be used. Can be mentioned.
Further, the amount of exposure in the step (3) is not particularly limited, but is preferably 50 to 3,000 mJ / cm 2 .
Furthermore, in the present invention, after the step of (2) removing the solvent and before the step of (3) thermosetting, a step of exposing the entire surface from the viewpoint of improving the film hardness may be included. In this case, it is preferable to perform energy exposure of about 50 to 3,000 mJ / cm 2 with a mercury lamp or an LED lamp.
For pattern formation, (3) pattern exposure can be performed in the curing step, and (3) development step can be performed after the curing step. The pattern exposure method is preferably a method using a mask or a direct drawing method using a laser or the like.
It is preferable from the viewpoint of promoting curing that the light irradiation such as the entire surface exposure and pattern exposure in the step (3) is performed in a state where oxygen is blocked. Examples of means for blocking oxygen include exposure in a nitrogen atmosphere and provision of an oxygen blocking film.
For pattern exposure and development, a known method or a known developer can be used. For example, the pattern exposure method and the development method described in JP 2011-186398 A and JP 2013-83937 A can be suitably used.
 工程(3)において、熱により硬化を行う場合の加熱温度としては、180℃以下が好ましく、150℃以下がより好ましく、130℃以下が更に好ましい。下限値は、80℃以上が好ましく、90℃以上がより好ましい。
 加熱の方法は特に限定されず、公知の方法を用いることができる。例えば、ホットプレート、オーブン、赤外線ヒーターなどが挙げられる。
 また、加熱時間としては、ホットプレートの場合は1分~30分程度が好ましく、それ以外の場合は20分~120分程度が好ましい。この範囲で基板、装置へのダメージ無く硬化することができる。加熱後の形状調整の観点から、加熱を、初めはより低温で、後により高温で行うこともできる(ミドルベーク工程の追加。例えば、初めに90℃30分加熱し、後に120℃30分加熱)。
In the step (3), the heating temperature when curing by heat is preferably 180 ° C. or lower, more preferably 150 ° C. or lower, and further preferably 130 ° C. or lower. The lower limit is preferably 80 ° C. or higher, more preferably 90 ° C. or higher.
The heating method is not particularly limited, and a known method can be used. For example, a hot plate, an oven, an infrared heater, etc. are mentioned.
The heating time is preferably about 1 to 30 minutes in the case of a hot plate, and about 20 to 120 minutes in other cases. Within this range, the substrate and the device can be cured without damage. From the viewpoint of shape adjustment after heating, the heating can be performed at a lower temperature at the beginning and later at a higher temperature (addition of a middle baking step. For example, heating at 90 ° C. for 30 minutes first and then heating at 120 ° C. for 30 minutes later) .
 本発明の硬化物の製造方法は、上記硬化工程後、硬化物を熱処理する工程(熱処理工程、ポストベーク工程)を含むことが好ましく、上記(4)光により硬化した硬化物を熱処理する工程を含むことがより好ましい。本発明の硬化製組成物を硬化して得られた硬化物は、熱処理を行うことにより、より強度に優れた硬化物を得ることができる。
 上記熱処理の温度としては、100℃~180℃であることが好ましく、110℃~150℃であることがより好ましい。
 また、上記熱処理の時間としては、特に制限はないが、1分~360分が好ましく、10分~240分がより好ましく、30分~120分が更に好ましい。
 また、上記熱処理は、光及び/又は熱により硬化に連続して行ってもよいし、逐次に行ってもよい。
It is preferable that the manufacturing method of the hardened | cured material of this invention includes the process (heat treatment process, post-baking process) of heat-processing hardened | cured material after the said hardening process, The process of heat-treating the hardened | cured material hardened | cured by said (4) light. More preferably. The cured product obtained by curing the curable composition of the present invention can obtain a cured product with higher strength by performing a heat treatment.
The temperature for the heat treatment is preferably 100 ° C. to 180 ° C., more preferably 110 ° C. to 150 ° C.
The time for the heat treatment is not particularly limited, but is preferably 1 minute to 360 minutes, more preferably 10 minutes to 240 minutes, and further preferably 30 minutes to 120 minutes.
Moreover, the said heat processing may be performed continuously by hardening with light and / or heat, and may be performed sequentially.
 本発明の硬化膜は、保護膜や層間絶縁膜として好適に用いることができる。
 本発明の硬化性組成物により、充分な硬度のある硬化膜が得られ、例えば、鉛筆硬度が2H以上である硬化膜が得られる。本発明の硬化性組成物を硬化して形成された保護膜は、硬化膜物性に優れるため、有機EL表示装置や液晶表示装置の用途に有用である。
The cured film of the present invention can be suitably used as a protective film or an interlayer insulating film.
By the curable composition of the present invention, a cured film having sufficient hardness can be obtained, for example, a cured film having a pencil hardness of 2H or more can be obtained. Since the protective film formed by curing the curable composition of the present invention is excellent in cured film properties, it is useful for applications in organic EL display devices and liquid crystal display devices.
 本発明の硬化性組成物は、硬化性及び硬化膜特性に優れるため、MEMSデバイスの構造部材として、本発明の硬化性組成物を用いて形成されたレジストパターンを隔壁としたり、機械駆動部品の一部として組み込んで使用される。このようなMEMS用デバイスとしては、例えば、SAWフィルター、BAWフィルター、ジャイロセンサー、ディスプレイ用マイクロシャッター、イメージセンサー、電子ペーパー、インクジェットヘッド、バイオチップ、封止剤等の部品が挙げられる。より具体的な例は、特表2007-522531号公報、特開2008-250200号公報、特開2009-263544号公報等に例示されている。 Since the curable composition of the present invention is excellent in curability and cured film properties, a resist pattern formed using the curable composition of the present invention is used as a partition as a structural member of a MEMS device. Used as part of it. Examples of such MEMS devices include parts such as SAW filters, BAW filters, gyro sensors, display micro shutters, image sensors, electronic paper, inkjet heads, biochips, and sealants. More specific examples are exemplified in JP-T-2007-522531, JP-A-2008-250200, JP-A-2009-263544, and the like.
 本発明の硬化性組成物は、平坦性や透明性に優れるため、例えば、特開2011-107476号公報の図2に記載のバンク層(16)及び平坦化膜(57)、特開2010-9793号公報の図4(a)に記載の隔壁(12)及び平坦化膜(102)、特開2010-27591号公報の図10に記載のバンク層(221)及び第3層間絶縁膜(216b)、特開2009-128577号公報の図4(a)に記載の第2層間絶縁膜(125)及び第3層間絶縁膜(126)、特開2010-182638号公報の図3に記載の平坦化膜(12)及び画素分離絶縁膜(14)などの形成に用いることもできる。この他、液晶表示装置における液晶層の厚みを一定に保持するためのスペーサー、液晶表示装置のカラーフィルタやカラーフィルタ保護膜、ファクシミリ、電子複写機、固体撮像素子等のオンチップカラーフィルタの結像光学系あるいは光ファイバコネクタのマイクロレンズにも好適に用いることができる。 Since the curable composition of the present invention is excellent in flatness and transparency, for example, the bank layer (16) and the planarization film (57) described in FIG. 2 of JP-A-2011-107476, JP-A-2010- The partition wall (12) and the planarization film (102) described in FIG. 4 (a) of Japanese Patent No. 9793, and the bank layer (221) and the third interlayer insulating film (216b) described in FIG. 10 of Japanese Patent Application Laid-Open No. 2010-27591. ), The second interlayer insulating film (125) and the third interlayer insulating film (126) described in FIG. 4A of JP-A-2009-128577, and the flatness described in FIG. 3 of JP-A-2010-182638. It can also be used to form a chemical film (12), a pixel isolation insulating film (14), and the like. In addition, spacers for keeping the thickness of the liquid crystal layer in the liquid crystal display device constant, color filters for the liquid crystal display device, color filter protective films, facsimiles, electronic copying machines, imaging of on-chip color filters such as solid-state image sensors It can also be suitably used for a microlens of an optical system or an optical fiber connector.
<有機EL表示装置>
 本発明の有機EL表示装置は、本発明の硬化膜を有することを特徴とする。
 本発明の有機EL表示装置としては、上記本発明の硬化性組成物を用いて形成される平坦化膜や層間絶縁膜を有すること以外は特に制限されず、様々な構造をとる公知の各種有機EL表示装置や液晶表示装置を挙げることができる。
 例えば、本発明の有機EL表示装置が有するTFT(Thin-Film Transistor)の具体例としては、アモルファスシリコン-TFT、低温ポリシリコンーTFT、酸化物半導体TFT等が挙げられる。本発明の硬化膜は電気特性に優れるため、これらのTFTに組み合わせて好ましく用いることができる。
 図1は、有機EL表示装置の一例の構成概念図である。ボトムエミッション型の有機EL表示装置における基板の模式的断面図を示し、平坦化膜4を有している。
 ガラス基板6上にボトムゲート型のTFT1を形成し、このTFT1を覆う状態でSi34から成る絶縁膜3が形成されている。絶縁膜3に、ここでは図示を省略したコンタクトホールを形成した後、このコンタクトホールを介してTFT1に接続される配線2(高さ1.0μm)が絶縁膜3上に形成されている。配線2は、TFT1間、又は、後の工程で形成される有機EL素子とTFT1とを接続するためのものである。
 更に、配線2の形成による凹凸を平坦化するために、配線2による凹凸を埋め込む状態で絶縁膜3上に平坦化膜4が形成されている。
 平坦化膜4上には、ボトムエミッション型の有機EL素子が形成されている。すなわち、平坦化膜4上に、ITOからなる第一電極5が、コンタクトホール7を介して配線2に接続させて形成されている。また、第一電極5は、有機EL素子の陽極に相当する。
 第一電極5の周縁を覆う形状の絶縁膜8が形成されており、この絶縁膜8を設けることによって、第一電極5とこの後の工程で形成する第二電極との間のショートを防止することができる。
 更に、図1には図示していないが、所望のパターンマスクを介して、正孔輸送層、有機発光層、電子輸送層を順次蒸着して設け、次いで、基板上方の全面にAlから成る第二電極を形成し、封止用ガラス板と紫外線硬化型エポキシ樹脂を用いて貼り合わせることで封止し、各有機EL素子にこれを駆動するためのTFT1が接続されてなるアクティブマトリックス型の有機EL表示装置が得られる。
<Organic EL display device>
The organic EL display device of the present invention has the cured film of the present invention.
The organic EL display device of the present invention is not particularly limited except that it has a planarizing film and an interlayer insulating film formed using the curable composition of the present invention, and various known organic materials having various structures. An EL display device and a liquid crystal display device can be given.
For example, specific examples of TFT (Thin-Film Transistor) included in the organic EL display device of the present invention include amorphous silicon-TFT, low-temperature polysilicon-TFT, oxide semiconductor TFT, and the like. Since the cured film of the present invention is excellent in electrical characteristics, it can be preferably used in combination with these TFTs.
FIG. 1 is a conceptual diagram of an example of an organic EL display device. A schematic cross-sectional view of a substrate in a bottom emission type organic EL display device is shown, and a planarizing film 4 is provided.
A bottom gate type TFT 1 is formed on a glass substrate 6, and an insulating film 3 made of Si 3 N 4 is formed so as to cover the TFT 1. A contact hole (not shown) is formed in the insulating film 3, and then a wiring 2 (height: 1.0 μm) connected to the TFT 1 through the contact hole is formed on the insulating film 3. The wiring 2 is used to connect the TFT 1 with an organic EL element formed between the TFTs 1 or in a later process.
Further, in order to flatten the unevenness due to the formation of the wiring 2, a planarizing film 4 is formed on the insulating film 3 in a state where the unevenness due to the wiring 2 is embedded.
On the planarizing film 4, a bottom emission type organic EL element is formed. That is, the first electrode 5 made of ITO is formed on the planarizing film 4 so as to be connected to the wiring 2 through the contact hole 7. The first electrode 5 corresponds to the anode of the organic EL element.
An insulating film 8 having a shape covering the periphery of the first electrode 5 is formed. By providing the insulating film 8, a short circuit between the first electrode 5 and the second electrode formed in the subsequent process is prevented. can do.
Further, although not shown in FIG. 1, a hole transport layer, an organic light-emitting layer, and an electron transport layer are sequentially deposited through a desired pattern mask, and then a first layer made of Al is formed on the entire surface above the substrate. An active matrix organic material in which two electrodes are formed and sealed by bonding using a sealing glass plate and an ultraviolet curable epoxy resin, and each organic EL element is connected to a TFT 1 for driving it. An EL display device is obtained.
<液晶表示装置>
 本発明の液晶表示装置は、本発明の硬化膜を有することを特徴とする。
 本発明の液晶表示装置としては、上記本発明の硬化性組成物を用いて形成される保護膜、平坦化膜や層間絶縁膜を有すること以外は特に制限されず、様々な構造をとる公知の液晶表示装置を挙げることができる。
 例えば、本発明の液晶表示装置が有するTFT(Thin-Film Transistor)の具体例としては、アモルファスシリコン-TFT、低温ポリシリコンーTFT、酸化物半導体TFT等が挙げられる。本発明の硬化膜は電気特性に優れるため、これらのTFTに組み合わせて好ましく用いることができる。
 また、本発明の液晶表示装置が取りうる液晶駆動方式としてはTN(Twisted Nematic)方式、VA(Virtical Alignment)方式、IPS(In-Place-Switching)方式、FFS(Fringe Field Switching)方式、OCB(Optically Compensated Bend)方式などが挙げられる。
 パネル構成においては、COA(Color Filter on Array)方式の液晶表示装置でも本発明の硬化膜を用いることができ、例えば、特開2005-284291号公報の有機絶縁膜(115)や、特開2005-346054号公報の有機絶縁膜(212)として用いることができる。また、本発明の液晶表示装置が取りうる液晶配向膜の具体的な配向方式としてはラビング配向法、光配向方などが挙げられる。また、特開2003-149647号公報や特開2011-257734号公報に記載のPSA(Polymer Sustained Alignment)技術によってポリマー配向支持されていてもよい。
 また、本発明の硬化性組成物及び本発明の硬化膜は、上記用途に限定されず種々の用途に使用することができる。例えば、平坦化膜や層間絶縁膜以外にも、保護膜や、液晶表示装置における液晶層の厚みを一定に保持するためのスペーサーや固体撮像素子においてカラーフィルタ上に設けられるマイクロレンズ等に好適に用いることができる。
<Liquid crystal display device>
The liquid crystal display device of the present invention has the cured film of the present invention.
The liquid crystal display device of the present invention is not particularly limited except that it has a protective film, a planarizing film, and an interlayer insulating film formed using the curable composition of the present invention, and is known in various structures. A liquid crystal display device can be mentioned.
For example, specific examples of TFTs (Thin-Film Transistors) included in the liquid crystal display device of the present invention include amorphous silicon-TFTs, low-temperature polysilicon-TFTs, and oxide semiconductor TFTs. Since the cured film of the present invention is excellent in electrical characteristics, it can be preferably used in combination with these TFTs.
Liquid crystal driving methods that can be taken by the liquid crystal display device of the present invention include a TN (Twisted Nematic) method, a VA (Virtual Alignment) method, an IPS (In-Place-Switching) method, an FFS (Fringe Field Switching) method, and an OCB (OCB) method. (Optically Compensated Bend) method.
In the panel configuration, the cured film of the present invention can also be used in a COA (Color Filter on Array) type liquid crystal display device. For example, the organic insulating film (115) disclosed in JP-A-2005-284291 and JP-A-2005 -346054 can be used as the organic insulating film (212). Specific examples of the alignment method of the liquid crystal alignment film that the liquid crystal display device of the present invention can take include a rubbing alignment method and a photo alignment method. Further, the polymer orientation may be supported by a PSA (Polymer Sustained Alignment) technique described in JP-A Nos. 2003-149647 and 2011-257734.
Moreover, the curable composition of this invention and the cured film of this invention are not limited to the said use, but can be used for various uses. For example, in addition to a planarization film and an interlayer insulating film, it is suitable for a protective film, a spacer for keeping the thickness of a liquid crystal layer in a liquid crystal display device constant, a microlens provided on a color filter in a solid-state imaging device, Can be used.
 図2は、アクティブマトリックス方式の液晶表示装置10の一例を示す概念的断面図である。このカラー液晶表示装置10は、背面にバックライトユニット12を有する液晶パネルであって、液晶パネルは、偏光フィルムが貼り付けられた2枚のガラス基板14,15の間に配置されたすべての画素に対応するTFT16の素子が配置されている。ガラス基板上に形成された各素子には、硬化膜17中に形成されたコンタクトホール18を通して、画素電極を形成するITO透明電極19が配線されている。ITO透明電極19の上には、液晶20の層とブラックマトリックスを配置したRGBカラーフィルタ22が設けられている。
 バックライトの光源としては、特に限定されず公知の光源を用いることができる。例えば、白色LED、青色・赤色・緑色などの多色LED、蛍光灯(冷陰極管)、有機ELなどを挙げることができる。
 また、液晶表示装置は、3D(立体視)型のものとしたり、タッチパネル型のものとしたりすることも可能である。更にフレキシブル型にすることも可能であり、特開2011-145686号公報に記載の第2層間絶縁膜(48)や、特開2009-258758号公報に記載の層間絶縁膜(520)として用いることができる。
FIG. 2 is a conceptual cross-sectional view showing an example of the active matrix type liquid crystal display device 10. The color liquid crystal display device 10 is a liquid crystal panel having a backlight unit 12 on the back surface, and the liquid crystal panel includes all pixels disposed between two glass substrates 14 and 15 having a polarizing film attached thereto. The elements of the TFT 16 corresponding to are arranged. Each element formed on the glass substrate is wired with an ITO transparent electrode 19 that forms a pixel electrode through a contact hole 18 formed in the cured film 17. On the ITO transparent electrode 19, an RGB color filter 22 in which a liquid crystal 20 layer and a black matrix are arranged is provided.
The light source of the backlight is not particularly limited, and a known light source can be used. For example, white LED, multicolor LED such as blue, red, and green, fluorescent lamp (cold cathode tube), organic EL, and the like can be mentioned.
Further, the liquid crystal display device can be a 3D (stereoscopic) type or a touch panel type. Further, it can be made flexible, and used as the second interlayer insulating film (48) described in JP2011-145686A and the interlayer insulating film (520) described in JP2009-258758A. Can do.
 タッチパネル型としては、いわゆる、インセル型(例えば、特表2012-517051号公報の図5、図6、図7、図8)、いわゆる、オンセル型(例えば、特開2012-43394号公報の図14、国際公開第2012/141148号の図2(b))、OGS型、TOL型、その他の構成(例えば、特開2013-164871号公報の図6)を挙げることができる。
 また、図3は、タッチパネルの機能を有する液晶表示装置の一例の構成概念図を示す。
 例えば、本発明の硬化膜は、図3における、各層の間に保護膜に適用することが好適であり、また、タッチパネルの検出電極間を隔てる層間絶縁膜に適用することも好適である。なお、タッチパネルの検出電極としては、銀、銅、アルミニウム、チタン、モリブデン、これらの合金であることが好ましい。
 図3において、110は画素基板を、140は液晶層を、120は対向基板を、130はセンサ部をそれぞれ示している。画素基板110は、図3の下側から順に、偏光板111、透明基板112、共通電極113、絶縁層114、画素電極115、配向膜116を有している。対向基板120は、図3の下側から順に、配向膜121、カラーフィルタ122、透明基板123を有している。センサ部130は、位相差フィルム124、接着層126、偏光板127をそれぞれ有している。また、図3中、125は、センサ用検出電極である。本発明の硬化膜は、画素基板部分の絶縁層(114)(層間絶縁膜ともいう。)や各種保護膜(図示せず)、画素基板部分の各種保護膜(図示せず)、対向基板部分の各種保護膜(図示せず)、センサ部分の各種保護膜(図示せず)等に使用できる。
As the touch panel type, a so-called in-cell type (for example, FIG. 5, FIG. 6, FIG. 7 and FIG. 8 of JP 2012-517051 A), a so-called on-cell type (for example, FIG. 14 of JP 2012-43394 A). 2 (b) of International Publication No. 2012/141148), OGS type, TOL type, and other configurations (for example, FIG. 6 of JP 2013-164871 A).
FIG. 3 is a conceptual diagram of an example of a liquid crystal display device having a touch panel function.
For example, the cured film of the present invention is preferably applied to a protective film between the layers in FIG. 3, and is also preferably applied to an interlayer insulating film that separates the detection electrodes of the touch panel. In addition, as a detection electrode of a touch panel, it is preferable that they are silver, copper, aluminum, titanium, molybdenum, and these alloys.
In FIG. 3, reference numeral 110 denotes a pixel substrate, 140 denotes a liquid crystal layer, 120 denotes a counter substrate, and 130 denotes a sensor unit. The pixel substrate 110 includes a polarizing plate 111, a transparent substrate 112, a common electrode 113, an insulating layer 114, a pixel electrode 115, and an alignment film 116 in order from the lower side of FIG. The counter substrate 120 includes an alignment film 121, a color filter 122, and a transparent substrate 123 in order from the lower side of FIG. The sensor unit 130 includes a retardation film 124, an adhesive layer 126, and a polarizing plate 127. In FIG. 3, reference numeral 125 denotes a sensor detection electrode. The cured film of the present invention includes an insulating layer (114) (also referred to as an interlayer insulating film) in the pixel substrate portion, various protective films (not shown), various protective films (not shown) in the pixel substrate portion, and a counter substrate portion. Can be used for various protective films (not shown), various protective films (not shown) for the sensor portion, and the like.
 更に、スタティック駆動方式の液晶表示装置でも、本発明を適用することで意匠性の高いパターンを表示させることも可能である。例として、特開2001-125086号公報に記載されているようなポリマーネットワーク型液晶の絶縁膜として本発明を適用することができる。 Furthermore, a statically driven liquid crystal display device can display a pattern with high designability by applying the present invention. As an example, the present invention can be applied as an insulating film of a polymer network type liquid crystal as described in JP-A-2001-125086.
 また、図4は、タッチパネルの機能を有する液晶表示装置の他の一例の構成概念図である。
 薄膜トランジスタ(TFT)440が具備された薄膜トランジスタ表示板に相当する下部表示板200、下部表示板200と対向して下部表示板200と対向する面に複数のカラーフィルタ330が具備されたカラーフィルタ表示板に相当する上部表示板300、及び下部表示板200と上部表示板300の間に形成された液晶層400を含む。液晶層400は液晶分子(図示せず)を含む。
FIG. 4 is a conceptual diagram of the configuration of another example of a liquid crystal display device having a touch panel function.
A lower display panel 200 corresponding to a thin film transistor display panel provided with a thin film transistor (TFT) 440, and a color filter display panel provided with a plurality of color filters 330 on the surface facing the lower display panel 200 and facing the lower display panel 200. And the liquid crystal layer 400 formed between the lower display panel 200 and the upper display panel 300. The liquid crystal layer 400 includes liquid crystal molecules (not shown).
 下部表示板200は、第1絶縁基板210、第1絶縁基板210の上に配置する薄膜トランジスタ(TFT)、薄膜トランジスタ(TFT)の上面に形成された絶縁膜280、及び絶縁膜280の上に配置する画素電極290を含む。薄膜トランジスタ(TFT)は、ゲート電極220、ゲート電極220を覆うゲート絶縁膜240、半導体層250、オーミックコンタクト層260、262、ソース電極270、及び、ドレイン電極272を含むことができる。
 絶縁膜280には薄膜トランジスタ(TFT)のドレイン電極272が露出するようにコンタクトホール282が形成されている。
The lower display panel 200 is disposed on the first insulating substrate 210, the thin film transistor (TFT) disposed on the first insulating substrate 210, the insulating film 280 formed on the upper surface of the thin film transistor (TFT), and the insulating film 280. A pixel electrode 290 is included. The thin film transistor (TFT) may include a gate electrode 220, a gate insulating film 240 covering the gate electrode 220, a semiconductor layer 250, ohmic contact layers 260 and 262, a source electrode 270, and a drain electrode 272.
A contact hole 282 is formed in the insulating film 280 so that the drain electrode 272 of the thin film transistor (TFT) is exposed.
 上部表示板300は、第2絶縁基板310の一面の上に配置して、マトリックス状に配列された遮光部材320、第2絶縁基板310の上に配置するカラーフィルタ330、及びカラーフィルタ330の上に配置し、下部表示板200の画素電極290と対応して、液晶層400に電圧を印加する共通電極370を含む。 The upper display panel 300 is disposed on one surface of the second insulating substrate 310, the light shielding members 320 arranged in a matrix, the color filter 330 disposed on the second insulating substrate 310, and the color filter 330. And a common electrode 370 for applying a voltage to the liquid crystal layer 400 corresponding to the pixel electrode 290 of the lower display panel 200.
 図4に示す液晶表示装置において、第2絶縁基板310の他の一面にはセンシング電極410、絶縁膜420、駆動電極430、及び、保護膜280を配置する。このように、図4に示す液晶表示装置の製造においては、上部表示板300を形成する時に、タッチスクリーンの構成要素であるセンシング電極410、絶縁膜420、及び、駆動電極430などを共に形成することができる。特に、本発明の硬化性組成物を硬化した硬化膜は、絶縁膜420に好適に用いることができる。 In the liquid crystal display device shown in FIG. 4, a sensing electrode 410, an insulating film 420, a driving electrode 430, and a protective film 280 are disposed on the other surface of the second insulating substrate 310. As described above, in the manufacture of the liquid crystal display device shown in FIG. 4, when the upper display panel 300 is formed, the sensing electrode 410, the insulating film 420, the drive electrode 430, and the like, which are constituent elements of the touch screen, are formed together. be able to. In particular, a cured film obtained by curing the curable composition of the present invention can be suitably used for the insulating film 420.
 以下に実施例を挙げて本発明を更に具体的に説明する。
 以下の実施例に示す材料、使用量、割合、処理内容、処理手順等は、本発明の趣旨を逸脱しない限り、適宜、変更することができる。したがって、本発明の範囲は以下に示す具体例に限定されるものではない。なお、特に断りのない限り、「部」、「%」は質量基準である。
The present invention will be described more specifically with reference to the following examples.
The materials, amounts used, ratios, processing details, processing procedures, and the like shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. Unless otherwise specified, “part” and “%” are based on mass.
<合成例1>A-8の合成
 ヘキサメチレンジイソシアネート三量体(旭化成(株)製 TPA-100)50.4gとジペンタエリスリトールペンタアクリレート(Aldrich社製をカラム精製して得た)157.4gをトルエン溶媒中で混合し、硬化触媒としてU-CAT SA 102(サンアプロ(株)製)0.2gを添加して、窒素雰囲気下60℃で6時間加熱した。
 放冷後、反応混合物をシリカゲルカラムクロマトグラフィーで精製、分取して15官能のウレタンアクリレートA-8を得た。
<Synthesis Example 1> Synthesis of A-8 50.4 g of hexamethylene diisocyanate trimer (TPA-100 manufactured by Asahi Kasei Corporation) and 157.4 g of dipentaerythritol pentaacrylate (obtained by column purification from Aldrich) Were mixed in a toluene solvent, 0.2 g of U-CAT SA 102 (manufactured by San Apro) was added as a curing catalyst, and heated at 60 ° C. for 6 hours in a nitrogen atmosphere.
After allowing to cool, the reaction mixture was purified by silica gel column chromatography and fractionated to obtain 15-functional urethane acrylate A-8.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
<合成例2>A-9の合成
 合成例1におけるヘキサメチレンジイソシアネート三量体をヘキサメチレンジイソシアネート(東京化成工業(株)製)に変更した以外は、合成例1と同様に合成、精製して10官能のウレタンアクリレートA-9を得た。
<Synthesis Example 2> Synthesis of A-9 Synthesis and purification were conducted in the same manner as in Synthesis Example 1 except that the hexamethylene diisocyanate trimer in Synthesis Example 1 was changed to hexamethylene diisocyanate (manufactured by Tokyo Chemical Industry Co., Ltd.). A 10-functional urethane acrylate A-9 was obtained.
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
<(成分A)エチレン性不飽和結合を有する重合性化合物>
〔6官能以上のウレタン(メタ)アクリレート〕
 A-1:NKオリゴ U-15HA (新中村化学工業(株)製、官能基数15)
 A-2:UA-306H (共栄社化学(株)製、官能基数6)
 A-3:Laromer UA-9050 (BASF社製、官能基数8)
 A-4:NKオリゴ U-10HA (新中村化学工業(株)製、官能基数10)
 A-5:NKオリゴ U-10PA (新中村化学工業(株)製、官能基数10)
 A-6:NKオリゴ U-2PPA (新中村化学工業(株)製、官能基数2)
 A-8:合成例1に従って合成した化合物 (合成品、官能基数15)
 A-9:合成例2に従って合成した化合物 (合成品、官能基数10)
<(Component A) polymerizable compound having an ethylenically unsaturated bond>
[6 or more functional urethane (meth) acrylates]
A-1: NK Oligo U-15HA (manufactured by Shin-Nakamura Chemical Co., Ltd., 15 functional groups)
A-2: UA-306H (manufactured by Kyoeisha Chemical Co., Ltd., 6 functional groups)
A-3: Laromer UA-9050 (manufactured by BASF, 8 functional groups)
A-4: NK Oligo U-10HA (manufactured by Shin-Nakamura Chemical Co., Ltd., 10 functional groups)
A-5: NK Oligo U-10PA (manufactured by Shin-Nakamura Chemical Co., Ltd., 10 functional groups)
A-6: NK Oligo U-2PPA (Shin Nakamura Chemical Co., Ltd., functional group number 2)
A-8: Compound synthesized according to Synthesis Example 1 (Synthetic product, 15 functional groups)
A-9: Compound synthesized according to Synthesis Example 2 (Synthetic product, 10 functional groups)
〔その他のエチレン性不飽和結合を有する重合性化合物〕
 A-7:A-DPH (新中村化学工業(株)製、ジペンタエリスリトールヘキサアクリレート、官能基数6)
[Other polymerizable compounds having an ethylenically unsaturated bond]
A-7: A-DPH (manufactured by Shin-Nakamura Chemical Co., Ltd., dipentaerythritol hexaacrylate, functional group number 6)
<(成分B)ラジカル重合開始剤>
 B-1:下記化合物B-1 (合成品、オキシムエステル化合物)
 B-2:Irgacure379 (BASF社製)、アセトフェノン化合物
<(Component B) radical polymerization initiator>
B-1: Compound B-1 below (Synthetic product, oxime ester compound)
B-2: Irgacure 379 (manufactured by BASF), acetophenone compound
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
<(成分C)ブロックイソシアネート化合物>
 C-1:下記化合物C-1 (合成品、イソホロンジイソシアネートのメチルエチルケトンオキシム保護化合物)
 C-2:下記化合物C-2 (合成品、ヘキサメチレンジイソシアネート3量体のメチルエチルケトンオキシム保護化合物)
 C-3:下記化合物C-3 (合成品、ジフェニルメタンジイソシアネートのメチルエチルケトンオキシム保護化合物)
 C-4:下記化合物C-4 (合成品、ヘキサメチレンジイソシアネート3量体のεカプロラクタム保護化合物)
<(Component C) blocked isocyanate compound>
C-1: Compound C-1 below (Synthetic product, methyl ethyl ketone oxime protecting compound of isophorone diisocyanate)
C-2: Compound C-2 below (Synthetic product, methyl ethyl ketone oxime protecting compound of hexamethylene diisocyanate trimer)
C-3: Compound C-3 below (Synthetic product, methyl ethyl ketone oxime protecting compound of diphenylmethane diisocyanate)
C-4: Compound C-4 below (Synthetic product, ε-caprolactam protecting compound of hexamethylene diisocyanate trimer)
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
<(成分D)有機溶剤>
 D-1:プロピレングリコールモノメチルエーテルアセテート ((株)ダイセル製)
 D-2:メチルエチルジグリコール ((株)ダイセル製)
<(Component D) Organic solvent>
D-1: Propylene glycol monomethyl ether acetate (manufactured by Daicel Corporation)
D-2: Methyl ethyl diglycol (manufactured by Daicel Corporation)
<(成分E)アルコキシシラン化合物>
 E-1:KBM-403 (3-グリシドキシプロピルトリメトキシシラン、信越化学工業(株)製)
 E-2:KBM-5103 (3-アクリロキシプロピルトリメトキシシラン、信越化学工業(株)製)
<(Component E) alkoxysilane compound>
E-1: KBM-403 (3-glycidoxypropyltrimethoxysilane, manufactured by Shin-Etsu Chemical Co., Ltd.)
E-2: KBM-5103 (3-acryloxypropyltrimethoxysilane, manufactured by Shin-Etsu Chemical Co., Ltd.)
<(成分F)無機粒子>
 F-1:PMA-ST (日産化学(株)製、シリカ微粒子、平均粒子径10~15nm)
 F-2:MIBK-ST-L (日産化学(株)製、シリカ微粒子、平均粒子径40~50nm)
<(Component F) inorganic particles>
F-1: PMA-ST (manufactured by Nissan Chemical Co., Ltd., silica fine particles, average particle size of 10 to 15 nm)
F-2: MIBK-ST-L (Nissan Chemical Co., Ltd., silica fine particles, average particle size 40-50 nm)
<(成分G)(メタ)アクリル共重合体>
 G-1: Joncryl 67 (BASF社製、スチレン-アクリル酸共重合体)
<(Component G) (Meth) acrylic copolymer>
G-1: Joncryl 67 (manufactured by BASF, styrene-acrylic acid copolymer)
<(成分H)メルカプト化合物>
 H-1:カレンズMT-PE1 (昭和電工(株)製)
 H-2:メルカプトベンゾチアゾール (東京化成工業(株)製)
<(成分I)その他添加剤>
 I-1:イルガノックス1035 (BASF社製)
 I-2:ヒドロキノンモノメチルエーテル(東京化成工業(株)製)
<(Component H) mercapto compound>
H-1: Karenz MT-PE1 (manufactured by Showa Denko KK)
H-2: Mercaptobenzothiazole (Tokyo Chemical Industry Co., Ltd.)
<(Component I) Other additives>
I-1: Irganox 1035 (manufactured by BASF)
I-2: Hydroquinone monomethyl ether (manufactured by Tokyo Chemical Industry Co., Ltd.)
<(成分W)界面活性剤>
 W-1:メガファックF554 (DIC(株)製)、フッ素系界面活性剤
 W-2:FTX-218((株)ネオス製)、界面活性剤
<(Component W) Surfactant>
W-1: Megafax F554 (manufactured by DIC Corporation), fluorine-based surfactant W-2: FTX-218 (manufactured by Neos Corporation), surfactant
<化合物B-1の合成>
<<化合物Aの合成>>
 エチルカルバゾール(100.0g、0.512mol)をクロロベンゼン260mlに溶解し、0℃に冷却後、塩化アルミニウム(70.3g、0.527mol)を加えた。続いてo-トルオイルクロリド(81.5g、0.527mol)を40分かけて滴下し、室温(25℃、以下同様)に昇温して3時間撹拌した。次に、0℃に冷却後、塩化アルミニウム(75.1g、0.563mol)を加えた。4-クロロブチリルクロリド(79.4g、0.563mol)を40分かけて滴下し、室温に昇温して3時間撹拌した。35質量%塩酸水溶液156mlと蒸留水392mlとの混合溶液を0℃に冷却し、反応溶液を滴下した。析出した固体を吸引濾過後、蒸留水とメタノールとで洗浄し、アセトニトリルで再結晶後、下記構造の化合物A(収量164.4g、収率77%)を得た。
<Synthesis of Compound B-1>
<< Synthesis of Compound A >>
Ethylcarbazole (100.0 g, 0.512 mol) was dissolved in 260 ml of chlorobenzene, and after cooling to 0 ° C., aluminum chloride (70.3 g, 0.527 mol) was added. Subsequently, o-toluoyl chloride (81.5 g, 0.527 mol) was added dropwise over 40 minutes, the temperature was raised to room temperature (25 ° C., the same applies hereinafter), and the mixture was stirred for 3 hours. Next, after cooling to 0 ° C., aluminum chloride (75.1 g, 0.563 mol) was added. 4-Chlorobutyryl chloride (79.4 g, 0.563 mol) was added dropwise over 40 minutes, and the mixture was warmed to room temperature and stirred for 3 hours. A mixed solution of 156 ml of 35 mass% hydrochloric acid aqueous solution and 392 ml of distilled water was cooled to 0 ° C., and the reaction solution was added dropwise. The precipitated solid was filtered with suction, washed with distilled water and methanol, and recrystallized from acetonitrile to obtain Compound A having the following structure (yield 164.4 g, yield 77%).
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
<<化合物Bの合成>>
 上記で得られた化合物A(20.0g、47.9mmol)をテトラヒドロフラン(THF)64mlに溶解し、4-クロロベンゼンチオール(7.27g、50.2mmol)とヨウ化ナトリウム(0.7g、4.79mmol)とを加えた。続いて反応液に水酸化ナトリウム(2.0g、50.2mmol)を加え、2時間還流した。次に、0℃に冷却後、SM-28(11.1g、57.4mmol、ナトリウムメトキシド28%メタノール溶液、和光純薬工業(株)製)を20分かけて滴下し、室温に昇温して2時間撹拌した。次に、0℃に冷却後、亜硝酸イソペンチル(6.73g、57.4mmol)を20分かけて滴下し、室温に昇温して3時間撹拌した。反応液をアセトン120mlに希釈し、0℃に冷却した0.1N塩酸水溶液に滴下した。析出した固体を吸引濾過後、蒸留水で洗浄した。続いてアセトニトリルで再結晶し、下記構造の化合物B(収量17.0g、収率64%)を得た。
<< Synthesis of Compound B >>
Compound A (20.0 g, 47.9 mmol) obtained above was dissolved in 64 ml of tetrahydrofuran (THF), and 4-chlorobenzenethiol (7.27 g, 50.2 mmol) and sodium iodide (0.7 g, 4. 79 mmol). Subsequently, sodium hydroxide (2.0 g, 50.2 mmol) was added to the reaction solution, and the mixture was refluxed for 2 hours. Next, after cooling to 0 ° C., SM-28 (11.1 g, 57.4 mmol, sodium methoxide 28% methanol solution, manufactured by Wako Pure Chemical Industries, Ltd.) was added dropwise over 20 minutes, and the temperature was raised to room temperature. And stirred for 2 hours. Next, after cooling to 0 ° C., isopentyl nitrite (6.73 g, 57.4 mmol) was added dropwise over 20 minutes, and the mixture was warmed to room temperature and stirred for 3 hours. The reaction solution was diluted with 120 ml of acetone and added dropwise to a 0.1N hydrochloric acid aqueous solution cooled to 0 ° C. The precipitated solid was filtered with suction and washed with distilled water. Subsequently, recrystallization was performed with acetonitrile to obtain a compound B having the following structure (yield: 17.0 g, yield: 64%).
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
<<化合物B-1の合成>>
 化合物B(18.0g、32.4mmol)を90mlのN-メチルピロリドン(NMP)に溶解し、トリエチルアミン(Et3N、3.94g、38.9mmol)を加えた。次に、0℃に冷却後、アセチルクロライド(AcCl、3.05g、38.9mmol)を20分かけて滴下後、室温に昇温して2時間撹拌した。反応液を0℃に冷却した蒸留水150mlに滴下し、析出した固体を吸引濾過後、0℃に冷却したイソプロピルアルコール200mlで洗浄し、乾燥後、化合物B-1(収量19.5g、収率99%)を得た。
<< Synthesis of Compound B-1 >>
Compound B (18.0 g, 32.4 mmol) was dissolved in 90 ml N-methylpyrrolidone (NMP) and triethylamine (Et 3 N, 3.94 g, 38.9 mmol) was added. Next, after cooling to 0 ° C., acetyl chloride (AcCl, 3.05 g, 38.9 mmol) was added dropwise over 20 minutes, and then the mixture was warmed to room temperature and stirred for 2 hours. The reaction solution was added dropwise to 150 ml of distilled water cooled to 0 ° C., and the precipitated solid was subjected to suction filtration, washed with 200 ml of isopropyl alcohol cooled to 0 ° C., dried, and then compound B-1 (yield 19.5 g, yield). 99%).
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
 また、得られた化合物B-1の構造はNMRにて同定した。
 1H-NMR(400MHz,CDCl3)δ=8.86(s,1H),8.60(s,1H),8.31(d,1H,J=8.0Hz),8.81(d,1H,J=8.0Hz),7.51-7.24(m,10H),7.36(q,2H,7.4Hz),3.24-3.13(m,4H),2.36(s,3H),2.21(s,3H),1.50(t,3H,7.4Hz)。
Further, the structure of the obtained compound B-1 was identified by NMR.
1 H-NMR (400 MHz, CDCl 3 ) δ = 8.86 (s, 1H), 8.60 (s, 1H), 8.31 (d, 1H, J = 8.0 Hz), 8.81 (d , 1H, J = 8.0 Hz), 7.51-7.24 (m, 10H), 7.36 (q, 2H, 7.4 Hz), 3.24-3.13 (m, 4H), 2 .36 (s, 3H), 2.21 (s, 3H), 1.50 (t, 3H, 7.4 Hz).
(実施例1~41、及び、比較例1~8)
<硬化性組成物の調製>
 下記表1~表4に記載のように各成分を配合・撹拌して溶剤溶液とし、孔径0.3μmのポリテトラフルオロエチレン製フィルターで濾過して、実施例1~41、及び、比較例1~8の硬化性組成物をそれぞれ得た。下記表1~表4の各成分の単位は、有機固形分中の成分A+成分B+成分Cの比率を除き、質量部である。また、有機溶剤以外は、固形分換算の質量部を示す。
(Examples 1 to 41 and Comparative Examples 1 to 8)
<Preparation of curable composition>
As shown in Tables 1 to 4 below, each component was blended and stirred to obtain a solvent solution, which was filtered through a polytetrafluoroethylene filter having a pore size of 0.3 μm. Examples 1-41 and Comparative Example 1 Each of -8 curable compositions was obtained. The unit of each component in the following Tables 1 to 4 is parts by mass excluding the ratio of component A + component B + component C in the organic solid content. Moreover, the mass part of solid content conversion is shown except an organic solvent.
〔膜特性評価〕
<密着性の評価>
 上記で調合された各組成物を、銅が蒸着された基板上にスピンコートし、100℃、120秒のプリベークを行い、膜厚2.0μmの塗布膜を得た。次に高圧水銀灯により500mJ/cm(i線換算)の光照射を行い、更にオーブンで125℃、60分間ベークを行うことにより硬化膜を作成した。得られた硬化膜について、JIS K5600に準拠した方法で100マスのクロスカット試験を行い、密着性を評価した。
 また、上記で調合された各組成物を、ITOが蒸着された基板上にスピンコートし、上記と同条件にて作製された硬化膜についても、JIS K5600に準拠した方法で100マスのクロスカット試験を行い、密着性を評価した。以下の評価は、条件1、2、3が実用範囲である。評価結果を表5~表6に示す。
 1: 全くはがれが見られない。
 2: わずかにはがれるが、はがれる割合が2%未満である。
 3: はがれる割合が2%以上5%未満である。
 4: はがれる割合が5%以上15%未満である。
 5: はがれる割合が15%以上である。
(Membrane property evaluation)
<Evaluation of adhesion>
Each composition prepared above was spin-coated on a copper-deposited substrate and pre-baked at 100 ° C. for 120 seconds to obtain a coating film having a thickness of 2.0 μm. Next, light irradiation of 500 mJ / cm 2 (i-line conversion) was performed with a high-pressure mercury lamp, and a cured film was prepared by baking in an oven at 125 ° C. for 60 minutes. About the obtained cured film, the crosscut test of 100 squares was done by the method based on JISK5600, and adhesiveness was evaluated.
Each composition prepared above was spin-coated on a substrate on which ITO was vapor-deposited, and a cured film produced under the same conditions as above was also subjected to a cross cut of 100 squares by a method in accordance with JIS K5600. Tests were conducted to evaluate adhesion. In the following evaluation, Conditions 1, 2, and 3 are practical ranges. The evaluation results are shown in Tables 5 to 6.
1: No peeling at all.
2: Slightly peels off, but peels off less than 2%.
3: The peeling rate is 2% or more and less than 5%.
4: The peeling rate is 5% or more and less than 15%.
5: The peeling rate is 15% or more.
<表面あれの評価>
 上記で調合された各組成物を、銅基板上にスピンコートし、100℃、120秒のプリベークを行い、膜厚2.0μmの塗布膜を得た。次に高圧水銀灯により500mJ/cm2(i線換算)の光照射を行い、更にオーブンで125℃、60分間ベークを行うことにより硬化膜を作成した。硬化膜表面を光学顕微鏡(オリンパス(株)製)500倍にて観察し、面状を評価した。以下の評価は、1、2、3が実用範囲である。評価結果を表5~表6に示す。
 1:表面あれが全く見られない。
 2:ごく一部に表面あれが見られる。
 3:表面あれが点在して見られる。
 4:表面あれが全体に渡って見られる。
 5:表面あれ及び皺が全体に渡って見られる。
<Evaluation of surface roughness>
Each composition prepared above was spin-coated on a copper substrate and pre-baked at 100 ° C. for 120 seconds to obtain a coating film having a thickness of 2.0 μm. Next, light irradiation of 500 mJ / cm 2 (i-line conversion) was performed with a high-pressure mercury lamp, and a cured film was prepared by baking in an oven at 125 ° C. for 60 minutes. The surface of the cured film was observed with an optical microscope (Olympus Co., Ltd.) 500 times, and the surface condition was evaluated. In the following evaluation, 1, 2, and 3 are practical ranges. The evaluation results are shown in Tables 5 to 6.
1: No surface roughness is seen at all.
2: Surface roughness is seen in a very small part.
3: Surface roughness is scattered.
4: Surface roughness can be seen throughout.
5: Surface roughness and wrinkles are seen throughout.
〔タッチパネル特性評価〕
<高温高湿下でのタッチ検出能の評価>
 各実施例及び比較例の組成物を保護膜として用いて、図4に概略図を示す液晶表示装置を作成した。具体的には、保護膜(絶縁膜、420)は、本発明の各実施例で得られた硬化性組成物をインクジェット塗布し、100℃、120秒のプリベークを行い、高圧水銀灯により500mJ/cm2(i線換算)の光照射を行い、更にオーブンで125℃、60分間ベークを行うことにより形成した。表示装置のその他の部分は特開2013-168125号公報に従って作製した。60℃、85%条件下、1,000時間点灯させた後に画面内各所をタッチし、タッチ検出能を評価した。1、2、3が実用範囲である。評価結果を表5~表6に示す。
 1:画面内いずれの場所でも感度・精度よく検出できる。
 2:画面端部でのみ、ごくまれに検出できないことがある。
 3:画面端部及び端部以外の部分で、ごくまれに検出できないことがある。
 4:画面端部で、検出できないことがときどきある。
 5:画面端部及び端部以外の部分で、検出できないことがときどきある。
[Touch panel characteristics evaluation]
<Evaluation of touch detectability under high temperature and high humidity>
A liquid crystal display device schematically shown in FIG. 4 was prepared using the compositions of the examples and comparative examples as protective films. Specifically, the protective film (insulating film, 420) was ink-jet coated with the curable composition obtained in each example of the present invention, pre-baked at 100 ° C. for 120 seconds, and 500 mJ / cm with a high-pressure mercury lamp. 2 (i-line conversion) light irradiation was performed, and further, baking was performed in an oven at 125 ° C. for 60 minutes. The other part of the display device was manufactured according to Japanese Patent Laid-Open No. 2013-168125. After lighting for 1,000 hours under conditions of 60 ° C. and 85%, each part of the screen was touched to evaluate touch detection ability. 1, 2, and 3 are practical ranges. The evaluation results are shown in Tables 5 to 6.
1: Sensitive and accurate detection is possible anywhere on the screen.
2: Very rarely detected only at the edge of the screen.
3: Very rarely detected at the edge of the screen and at portions other than the edge.
4: Sometimes it cannot be detected at the edge of the screen.
5: Sometimes it is not possible to detect the screen edge and other parts than the edge.
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000031
Figure JPOXMLDOC01-appb-T000031
Figure JPOXMLDOC01-appb-T000032
Figure JPOXMLDOC01-appb-T000032
 上記表1~表6より明らかなように、本発明の硬化性組成物を硬化して得られた硬化膜は、基板に対する密着性、膜表面の表面あれ、及び、高温高湿下でのタッチパネル特性に優れたものであった。 As is apparent from Tables 1 to 6, the cured film obtained by curing the curable composition of the present invention has adhesion to the substrate, surface roughness of the film surface, and touch panel under high temperature and high humidity. It was excellent in characteristics.
 1:TFT(薄膜トランジスタ)、2:配線、3:絶縁膜、4:平坦化膜、5:第一電極、6:ガラス基板、7:コンタクトホール、8:絶縁膜、10:液晶表示装置、12:バックライトユニット、14,15:ガラス基板、16:TFT、17:硬化膜、18:コンタクトホール、19:ITO透明電極、20:液晶、22:カラーフィルタ、110:画素基板、111:偏光板、112:透明基板、113:共通電極、114:絶縁層、115:画素電極、116:配向膜、120:対向基板、121:配向膜、122:カラーフィルタ、123:透明基板、124:位相差フィルム、126:接着層、127:偏光板、130:センサ部、140:液晶層、200:下部表示板、210:第1絶縁基板、220:ゲート電極、240:ゲート絶縁膜、250:半導体層、260,262:オーミックコンタクト層、270:ソース電極、272:ドレイン電極、280:絶縁膜、282:コンタクトホール、290:画像電極、300:上部表示板、310:第2絶縁基板、320:遮光部材、330:カラーフィルタ、370:共通電極、400:液晶層、410:センシング電極、420:絶縁膜、430:駆動電極、440:TFT 1: TFT (thin film transistor), 2: wiring, 3: insulating film, 4: flattening film, 5: first electrode, 6: glass substrate, 7: contact hole, 8: insulating film, 10: liquid crystal display device, 12 : Backlight unit, 14, 15: Glass substrate, 16: TFT, 17: Cured film, 18: Contact hole, 19: ITO transparent electrode, 20: Liquid crystal, 22: Color filter, 110: Pixel substrate, 111: Polarizing plate 112: transparent substrate, 113: common electrode, 114: insulating layer, 115: pixel electrode, 116: alignment film, 120: counter substrate, 121: alignment film, 122: color filter, 123: transparent substrate, 124: phase difference Film: 126: Adhesive layer, 127: Polarizing plate, 130: Sensor part, 140: Liquid crystal layer, 200: Lower display panel, 210: First insulating substrate, 220: Gate electrode, 24 : Gate insulating film, 250: semiconductor layer, 260, 262: ohmic contact layer, 270: source electrode, 272: drain electrode, 280: insulating film, 282: contact hole, 290: image electrode, 300: upper display panel, 310 : Second insulating substrate, 320: light shielding member, 330: color filter, 370: common electrode, 400: liquid crystal layer, 410: sensing electrode, 420: insulating film, 430: drive electrode, 440: TFT

Claims (12)

  1.  成分Aとして、エチレン性不飽和結合を有する重合性化合物、
     成分Bとして、重合開始剤、
     成分Cとして、ブロックイソシアネート化合物、及び、
     成分Dとして、有機溶剤、を含有し、
     成分Aが、6官能以上のウレタン(メタ)アクリレートを含み、
     成分A中の前記6官能以上のウレタン(メタ)アクリレートの割合が、70~100質量%であり、
     成分Aと成分Bと成分Cとの合計量が硬化性組成物の全有機固形分に対し85質量%以上であることを特徴とする
     硬化性組成物。
    As component A, a polymerizable compound having an ethylenically unsaturated bond,
    As component B, a polymerization initiator,
    As component C, a blocked isocyanate compound, and
    Component D contains an organic solvent,
    Component A contains a hexafunctional or higher urethane (meth) acrylate,
    The ratio of the hexafunctional or higher urethane (meth) acrylate in Component A is 70 to 100% by mass,
    A curable composition, wherein the total amount of component A, component B, and component C is 85% by mass or more based on the total organic solid content of the curable composition.
  2.  成分Bが、オキシムエステル化合物を含む、請求項1に記載の硬化性組成物。 The curable composition according to claim 1, wherein Component B comprises an oxime ester compound.
  3.  成分Cが、トリレンジイソシアネート、ジフェニルメタンジイソシアネート、ヘキサメチレンジイソシアネート、イソホロンジイソシアネート、及び、これらの多量体よりなる群から選ばれた化合物を保護したブロックイソシアネート化合物である、請求項1又は2に記載の硬化性組成物。 The curing according to claim 1 or 2, wherein Component C is a blocked isocyanate compound that protects a compound selected from the group consisting of tolylene diisocyanate, diphenylmethane diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, and multimers thereof. Sex composition.
  4.  成分Cが、オキシム化合物、ラクタム化合物、フェノール化合物、アルコール化合物、アミン化合物、活性メチレン化合物、又は、ピラゾール化合物のいずれかによりブロック構造が形成された化合物である、請求項1~3のいずれか1項に記載の硬化性組成物。 The component C is a compound in which a block structure is formed by any of an oxime compound, a lactam compound, a phenol compound, an alcohol compound, an amine compound, an active methylene compound, or a pyrazole compound. The curable composition according to item.
  5.  成分Aと成分Cの重量比率が、100:1~10:1である、請求項1~4のいずれか1項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 4, wherein the weight ratio of Component A to Component C is 100: 1 to 10: 1.
  6.  無機粒子を更に含有する、請求項1~5のいずれか1項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 5, further comprising inorganic particles.
  7.  工程1として、請求項1~6のいずれか1項に記載の硬化性組成物を基板上に塗布する工程、
     工程2として、塗布された硬化性組成物から有機溶剤を除去する溶剤除去工程、及び、
     工程3として、有機溶剤が除去された硬化性組成物を光及び/又は熱により硬化する硬化工程、を含むことを特徴とする
     硬化膜の製造方法。
    As step 1, a step of applying the curable composition according to any one of claims 1 to 6 on a substrate,
    As step 2, a solvent removal step of removing the organic solvent from the applied curable composition, and
    Step 3 includes a curing step of curing the curable composition from which the organic solvent has been removed by light and / or heat, and a method for producing a cured film.
  8.  前記硬化工程が、有機溶剤が除去された硬化性組成物を光により硬化する工程であり、
     前記硬化工程後、硬化性組成物を光により硬化した硬化膜を熱処理する熱処理工程を更に含む、請求項7に記載の硬化膜の製造方法。
    The curing step is a step of curing with light the curable composition from which the organic solvent has been removed,
    The manufacturing method of the cured film of Claim 7 which further includes the heat processing process of heat-processing the cured film which hardened the curable composition with light after the said hardening process.
  9.  請求項1~6のいずれか1項に記載の硬化性組成物を硬化してなる硬化膜。 A cured film obtained by curing the curable composition according to any one of claims 1 to 6.
  10.  保護膜である、請求項9に記載の硬化膜。 The cured film according to claim 9, which is a protective film.
  11.  請求項9又は10に記載の硬化膜を有する、有機EL表示装置。 An organic EL display device having the cured film according to claim 9 or 10.
  12.  請求項9又は10に記載の硬化膜を有する、液晶表示装置。 A liquid crystal display device having the cured film according to claim 9.
PCT/JP2014/080148 2013-11-15 2014-11-14 Curable composition, method for producing cured film, cured film, and display device WO2015072534A1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017090803A (en) * 2015-11-16 2017-05-25 東京応化工業株式会社 Photosensitive resin composition for forming interlayer insulation film, interlayer insulation film, method for forming interlayer insulation film, and device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008231163A (en) * 2007-03-16 2008-10-02 Toppan Printing Co Ltd Composition for forming hardcoat layer, and hardcoat film obtained using the same and its manufacturing method
WO2008140018A1 (en) * 2007-05-11 2008-11-20 Sekisui Chemical Co., Ltd. Curable resin composition for column spacer, column spacer, and liquid-crystal display element
JP2009086660A (en) * 2007-09-12 2009-04-23 Dainippon Printing Co Ltd Optical layered body, method of producing the same, polarizer and image display device
JP2009222799A (en) * 2008-03-13 2009-10-01 Sekisui Chem Co Ltd Curable resin composition for column spacer, column spacer, and liquid crystal display element

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008231163A (en) * 2007-03-16 2008-10-02 Toppan Printing Co Ltd Composition for forming hardcoat layer, and hardcoat film obtained using the same and its manufacturing method
WO2008140018A1 (en) * 2007-05-11 2008-11-20 Sekisui Chemical Co., Ltd. Curable resin composition for column spacer, column spacer, and liquid-crystal display element
JP2009086660A (en) * 2007-09-12 2009-04-23 Dainippon Printing Co Ltd Optical layered body, method of producing the same, polarizer and image display device
JP2009222799A (en) * 2008-03-13 2009-10-01 Sekisui Chem Co Ltd Curable resin composition for column spacer, column spacer, and liquid crystal display element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017090803A (en) * 2015-11-16 2017-05-25 東京応化工業株式会社 Photosensitive resin composition for forming interlayer insulation film, interlayer insulation film, method for forming interlayer insulation film, and device

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