WO2015070254A1 - Revêtement antireflet multicouches - Google Patents

Revêtement antireflet multicouches Download PDF

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Publication number
WO2015070254A1
WO2015070254A1 PCT/US2014/065097 US2014065097W WO2015070254A1 WO 2015070254 A1 WO2015070254 A1 WO 2015070254A1 US 2014065097 W US2014065097 W US 2014065097W WO 2015070254 A1 WO2015070254 A1 WO 2015070254A1
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WO
WIPO (PCT)
Prior art keywords
coating
substrate
layer
less
layers
Prior art date
Application number
PCT/US2014/065097
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English (en)
Inventor
Phong Ngo
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General Plasma, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Plasma, Inc. filed Critical General Plasma, Inc.
Publication of WO2015070254A1 publication Critical patent/WO2015070254A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only

Definitions

  • the present invention relates in general to antireflection coatings, and in particular to a multiple layer vacuum deposited coatings that are produced by a highly uniform and stable plasma enhanced chemical vapor deposition (PECVD) process.
  • PECVD plasma enhanced chemical vapor deposition
  • Anti-reflective (AR) coatings can enhance the performance and the user experience of display products such as cell phones and tablet computers as well as many other products.
  • AR coatings on display products have met with limited market penetration owing to the technological problems of depositing AR coatings of sufficient quality and performance.
  • prior art AR coatings are not neutral in color. That is, the color both in transmission and reflection should be the natural light color not blue, green or some other color.
  • the reflectance color seen in prior art AR coatings is due to non-uniformity and process drift during deposition. This lack of layer thickness control results in unacceptable rainbow colors being visible in reflection when attempts at neutral color coating designs are made. To avoid this, prior art AR coating designs are shifted to the blue, green or purple. In this way, variations appear only as different shades of blue, green, etc. rather than a rainbow effect.
  • the color of prior art AR coatings is also detrimentally affected by the use of only 4 optical layers and the absorption in these layers at the blue and red ends of the visible spectrum.
  • Prior art AR coatings are also not sufficiently durable.
  • the scratch resistance and environmental stability specifications for touch display AR coatings are far more stringent than those for camera lenses or museum glass. Due to existing deposition technologies such as sputtering and evaporation, the materials to deposit AR coatings with sufficient production rate tend to be soft and result in AR coatings softer than glass.
  • a common sputtered AR coating material is niobium oxide ( ⁇ Os). This high index material sputters relatively rapidly and target poisoning is comparatively minimal.
  • Nb205 has a hardness of only 3.5Gpa compared to strengthened glass hardness of 7.6GPa (as measured by nano -indentation hardness measurement).
  • the AR coating has a more neutral color with a* at -2 and b* at 0. However, the overall reflectance is higher at 2%.
  • Suzuki et al. discloses a durable AR coating for a timepiece faceplate.
  • the coating is a multi-layer stack of silicon nitride and silicon dioxide.
  • the disclosure relates to the content of silicon nitride in the outside surface of the coating.
  • an AR coating for a touch display must have absolute reflection in the visible range (425-675nm) of less than 1% with color in reflection of less than ⁇ 1.5 for both a* and b*. Additionally, the AR must have less than 2% optical absorption across the visible range. Finally, the AR coating must be highly durable, scratch resistant and environmentally stabile. The hardness of such a coating must equal or exceed 9.0Gpa in nano -indentation hardness. Where prior art AR coatings have succeeded at achieving one or two of the requirements for low reflection, neutral color, low absorption and durability, A cell phone or tablet computer will not have AR display functionality until all four of these requirements are met in one AR coating product.
  • a transparent substrate with an antireflection coating is provided that includes at least six layers in overlying contact on the surface.
  • the AR coating has an absolute reflection of less than 1% over the visible spectrum from 425 nm to 675 nm, and a neutral color such that a* is less than ⁇ 1.5 and b* is less than ⁇ 1.5 over the entire substrate.
  • the AR coating has a nano- indentation hardness greater than 9GPa.
  • a process of making such a coating includes the insertion of a substrate into a plasma enhanced chemical vapor deposition (PECVD) apparatus. An AC ion source is energized in the PECVD apparatus in the presence of a first precursor and ammonia to form a first layer of the coating. At least 5 more layers of the coating are deposited on the first layer.
  • PECVD plasma enhanced chemical vapor deposition
  • FIG. 1 is a cross-section view schematically illustrating a six layer anti-reflection coating stack in accordance with the present invention with the extent of the individual layers being distorted for visual clarity;
  • FIG. 2A are graphs of the actual coating for % reflectance as a function of visible wavelength (nm) for a six layer alternating layer Si3N 4 /Si0 2 / Si3N 4 /Si0 2 /Si3N 4 /Si0 2 structure per FIG. lwith the substrate being 300 mm x 600 mm x 1mm thick borosilicate glass;
  • FIG 2B shows a table of the individual layer thicknesses and for the resulting a* b* color in reflection for FIG. 2A;
  • FIG. 3 shows graphs of reflectance as a percentage as a function of visible wavelength (nm) for a six alternating layer Si 3 N 4 /Si0 2 /Si 3 N 4 /Si0 2 /Si 3 N 4 /Si0 2 AR coating and a four layer Si 3 N 4 /Si0 2 /Si 3 N 4 /Si0 2 AR coating;
  • FIG. 4A are graphs of the transmittance, reflectance and total response for the S1 3 N 4 of the inventive AR coating
  • FIG. 4B are graphs of the transmittance, reflectance and total response for a typical sputtered S1 3 N 4 optical coating.
  • FIG. 5 are graphs showing the % reflection over the visible spectrum of 31 AR coating samples made using the inventive method.
  • the present invention has utility as an optical coating.
  • the inventor has found that the display industry requirements for AR coating color in reflection are a* and b* must not exceed ⁇ 1.5 and the overall reflection must be less than 1%.
  • range is intended to encompass not only the end point values of the range but also intermediate values of the range as explicitly being included within the range and varying by the last significant figure of the range.
  • a recited range from 1 to 4 is intended to include 1-2, 1-3, 2-4, 3-4, and 1-4.
  • optical thickness is defined as the physical thickness of a layer multiplied by the refractive index (RI) of that layer at 632 nm. Visible light is generally accepted, and defined herein, as being light within a wavelength range between about 425 and 675 nm.
  • FIG. 1 schematically illustrates an anti-reflection coating in accordance with the present invention.
  • Coating 20 is a structure of six layers.
  • a first layer 34 adjacent to the substrate, has an RI greater than 1.6 at a wavelength of about 632 nm.
  • a specific material for layer 34 is silicon nitride (SiN).
  • Other possible materials for this high index layer include aluminum nitride (A1N), silicon oxy-nitride (SiO x N y ) and aluminum oxy-nitride (AION).
  • the second layer 32 is a low index layer of a non-absorbing material having a refractive index between about 1.44 and 1.52.
  • a specific material for this layer is silicon dioxide (Si0 2 ).
  • Additional layers 28 and 24 are formed of materials with the same refractive index as layer 34, namely, greater than 1.6 at a wavelength of about 632 nm; or such layers are each independently formed of a material of a different refractive index to achieve a desired reflectivity coating 20.
  • Layers 26 and 22 are formed of materials with the same refractive index as layer 32, namely, between 1.44 and 1.52. Alternatively, such layers are each independently formed of a material of a different refractive index to achieve a desired reflectivity coating 20.
  • layers 34, 28, and 24 are all SiN and layers 32, 26, and 22 are all Si0 2 .
  • FIG 2 A shows the % reflection over the visible range (425 nm to 675 nm) for the inventive 6 layer coating.
  • FIG 2B shows a table of the individual layer thicknesses and for the resulting a* b* color in reflection. As can be seen, the absolute reflectance response is less than 1% over the entire visual range. Additionally, the reflection color of the coating is truly neutral with a* and b* values of 0.0003 and -0.0104, respectively. This is well within the industry reflection color specification of ⁇ 1.5 for both a* and b*.
  • the AR coating must practically have 6 rather than 4 layers.
  • 4 layer AR designs are acceptable in applications like windows or picture frames where higher reflectance in the blue and red is overlooked by our photonic response. In displays however, full color output to the user is a requirement and any color attenuation or internal reflection is unacceptable.
  • FIG 3 shows reflection in percent of both 4 and 6 layer AR coatings. As can be seen, the 6 layer AR has the required ⁇ 1% reflectance across the full visible band width (425 nm-675 nm).
  • Four layer AR coatings can be made with a sufficient low reflectance performance. However, this requires high index materials such as Ti0 2 or Nb 2 0 5 . These materials are too soft to meet display durability requirements.
  • Another important advantage of the inventive AR coating is the lack of any absorption over the visible range.
  • the SiN deposited by the inventive PECVD process using AC Ion Sources is non-absorbing across the visible spectrum as shown in FIG 4A.
  • Sputtered SiN films have absorption in the range of 400-500 nm as shown in FIG 4B. This absorption is unacceptable to the display industry.
  • the PECVD layers of the present invention are enabled by the AC ion source sold by General Plasma, Inc. in Arlington Arizona and detailed in WO2010077659.
  • This source couples two electrodes across an alternating current, mid frequency power supply.
  • the electrodes span the width of the substrate (inclusive of carriers holding many small substrates) and the substrate(s) is moved past the electrodes.
  • a plasma and ion beam deposition zone is formed along the length of the source (the width of the substrate) between the substrate and source. Highly uniform coatings are deposited within this deposition zone, to within ⁇ 1.5% optical thickness variation. As the substrate passes through this deposition zone at a constant conveyance speed equally uniform coating are deposited along the substrate length.
  • Two other aspects of the AC ion source to make the inventive AR coatings possible 1) highly stable and repeatable deposition process over days and weeks and 2) The deposited films are dense and amorphous, highly adherent to the substrate and environmentally stable.
  • FIG. 5 shows the reflectance over the visual spectrum for 31 samples of the inventive 6 layer AR coating. These samples, coated on both sides have a standard deviation variation of only 1%. This repeatability is not practically possible in sputtering.
  • a PECVD process with AC ion sources is generally conducted in the sequence and according to the guidelines below. These illustrative steps are for a Si 2 N 3 coating process. The process steps for other materials are similar other than precursor and gas changes. While helpful as starting points, the process settings given will vary according to product requirements and substrate materials. [0027] 1) Place a substrate to be coated into the vacuum coating chamber and evacuate the chamber to base pressure of approximately 0.05 Pa or less.
  • Typical power densities are 5 kW to 20 kW per meter of substrate width.
  • the precursor flow to ammonia flow ratio should be about 1 : 1 to 1 :2.
  • the final deposition zone process pressure should be in the range of 0.2 Pa to 2 Pa.
  • [0031] 5) Move the substrate through the deposition zone at a constant rate. For one set of process precursor, gas and power supply settings, the substrate travel rate through the deposition zone then determines the coating thickness. Due to the repeatability of the AC ion source PECVD process, the process settings for each AR layer can be determined by depositing and measuring individual layers. The multilayer AR stack is then deposited without breaking vacuum using the previously determined settings from the individual layer depositions.
  • PECVD coating chambers can be configured to accommodate different substrate sizes and production quantity requirements. For instance, to coat 150 mm x 100 mm glass pieces with a six layer AR where the annual production requirement is many millions of pieces, the coating chambers can be designed to accommodate carriers that hold many glass pieces. For instance, with 150 mm x 100 mm glass pieces, a carrier 1.5 m high by 1.8 m long can hold approximately 150 pieces.
  • Such an in-line system can be configured with several AC ion sources such that each AC ion source deposits one layer of the multilayer AR stack. In this case, the AC ion source deposition zone spans the width of the carrier, 1.5 m, such that all the glass pieces are uniformly coated.
  • the carrier is moved past the AC ion sources at a constant speed.
  • the process settings of each AC ion source are adjusted so the layer thickness and film properties are correct for the constant speed shared by all the layers.
  • Many other configurations will be evident to those skilled in the art. These will include roll to roll batch systems, large single sheet glass coating systems and smaller, rotating drum configurations. In all configurations, the substrate is moved relative to the AC ion source to effect PECVD coating uniformity.
  • the inventive AR coating can be deposited on both large and small substrates.
  • Large substrates are defined as having at least one dimension larger than 150 mm.
  • Large substrates can also be automotive windshields or building windows exceeding 3 meters in width.
  • Small substrates would include timepiece faceplates and camera lenses.
  • Substrates of a variety of shapes and contours can also be coated. For instance, substrates can be flat like window glass or curved like an automotive windshield. They can also be of any shape, square, round, etc. and can have holes or other features. They can also be flexible like a polymer film.
  • the inventive AR coating can be deposited on only one side of a transparent substrate or both sides.
  • Current LCD and OLED displays use index matching adhesive to attach the cover glass to other display components. This eliminates reflections from the inside glass surface. In this case, the inventive AR coating is deposited only on the outside surface.
  • the substrate can be any transparent material including glasses, sapphire and clear polymers. Other materials can also used for the AR coating layers. For instance, Aluminum nitride can replace SiN for a high index layer. Other potential sufficiently hard materials are A1NO (( ⁇ 1 ) ⁇ ⁇ ( ⁇ 2 ⁇ 3) ⁇ 0.30 ⁇ x ⁇ 0.37) and SiNO (SiO x N y ,).
  • Example 1 The present invention is further detailed with respect to the following examples.
  • Example 1
  • FIG. 2 shows a graph of percent reflectance over the visible light spectrum for the coated piece.
  • the coating process is as follows: The piece is secured in a carrier which is then loaded into a single-ended, vertical coater.
  • the coater has a PECVD process chamber with a single alternating current ion source (ACIS) from General Plasma, Inc., (Tucson, Arizona, USA). It is appreciated that a PECVD apparatus that only has a single ACIS deposits PECVD layers one at a time.
  • ACIS alternating current ion source
  • the process chamber After the process chamber reaches base pressure, ammonia gas is delivered to the deposition zone, the ACIS is turned on and silane gas is delivered to the deposition zone. Then the glass substrate is conveyed past the ACIS and the first S1 3 N 4 layer is deposited (RI 1.93, physical thickness 13.21 nm). After the pass, silane gas flow is stopped, the power supply is shut off and ammonia gas is turned off. Then oxygen gas is delivered to the deposition zone, the power supply is turned on to the correct setting and silane is again delivered to the deposition zone. The second AR layer, S1O 2 (RI 1.46, physical thickness 41.83 nm), is then deposited by moving the substrate through the process chamber to receive the PECVD coating.
  • S1O 2 RI 1.46, physical thickness 41.83 nm
  • Additional high and low index layers are deposited by repeating these steps.
  • the resulting layers are: S1 3 N 4 (RI 1.93, physical thickness 48.86nm), Si0 2 (RI 1.46, physical thickness 13.71nm), Si 3 N 4 (RI 1.93, physical thickness 68.05nm), Si0 2 (RI 1.46, physical thickness 93.03 nm). Note that no metrology is performed inside the vacuum chamber. Prior to the complete stack deposition, the individual layer thickness and RI are measured using a Filmetric F20 spectrophotometer and a Metricone 2010/M Prism coupler respectively. Once the precursor and gas flows, AC plasma power and conveyor speed settings are determined for each layer, the complete stack is made by repeating these settings to make each layer.
  • SIMS Secondary Ion Mass Spectrometry
  • the reflection over the visible spectrum from 425nm to 675nm is less than 1% and the reflection is approximately constant over that region.
  • the environmental stability and durability of the coated sample was tested according to the following: 1) Cutting a 10 x 10 1mm spaced grid on one side of the sample. 2) Applying 3M Scotch tape 620 to the sample and then rapidly removing the tape. 3) Inspecting the grid squares for any sign of delamination or cracking. 4) Immersing the sample in boiling water for 10 minutes. 5) Repeating steps 2 and 3. 6) Immersing the sample in a heated (80°C) salt bath for 24 hours. 7) Repeating steps 2 and 3. In all cases inspection of the grid squares shows no sign of delamination or cracking.
  • the environmental stability of the inventive AR coating meets the display industry requirement for hardness and scratch resistance.
  • the coating hardness was measured by nano-indentation hardness test at 9 locations on the substrate.
  • the average hardness was 9.33 ⁇ 0.47 GPa. This hardness exceeds that of strengthened glass which has a hardness of 7.6 ⁇ 0.08 GPa and meets the display industry requirement for hardness and scratch resistance for an AR coating.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Cette invention concerne un substrat transparent pourvu d'un revêtement antireflet qui comprend au moins six couches en contact sus-jacent sur la surface. Le revêtement AR a une réflexion absolue inférieure à 1 % sur le spectre visible de 425 à 675 nm, une couleur neutre telle que a* est inférieur à ±1,5 et b* est inférieur à ±1.5 sur tout le substrat et une dureté par nanoindentation supérieure à 9 GPa. Un procédé de préparation dudit revêtement comprend l'insertion d'un substrat dans un appareil de dépôt chimique en phase vapeur assisté par plasma (PECVD). Une source d'ions CA est excitée dans l'appareil PECVD en présence d'un premier précurseur et d'ammoniac pour former une première couche dudit revêtement. Au moins 5 autres couches de revêtement sont déposées sur la première couche.
PCT/US2014/065097 2013-11-11 2014-11-11 Revêtement antireflet multicouches WO2015070254A1 (fr)

Applications Claiming Priority (2)

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US201361902659P 2013-11-11 2013-11-11
US61/902,659 2013-11-11

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140335330A1 (en) * 2013-05-07 2014-11-13 Corning Incorporated Low-Color Scratch-Resistant Articles with a Multilayer Optical Film
WO2020146320A1 (fr) * 2019-01-11 2020-07-16 General Plasma Inc. Revêtements antireflets pour dispositifs mobiles et leurs procédés de fabrication
US10948629B2 (en) 2018-08-17 2021-03-16 Corning Incorporated Inorganic oxide articles with thin, durable anti-reflective structures
US10995404B2 (en) 2014-08-01 2021-05-04 Corning Incorporated Scratch-resistant materials and articles including the same
US11002885B2 (en) 2015-09-14 2021-05-11 Corning Incorporated Scratch-resistant anti-reflective articles
US11231526B2 (en) 2013-05-07 2022-01-25 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US11267973B2 (en) 2014-05-12 2022-03-08 Corning Incorporated Durable anti-reflective articles
US11667565B2 (en) 2013-05-07 2023-06-06 Corning Incorporated Scratch-resistant laminates with retained optical properties

Citations (5)

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Publication number Priority date Publication date Assignee Title
US20010002295A1 (en) * 1995-02-23 2001-05-31 Charles-Edward Anderson Transparent substrate with antireflection coating
US20020141064A1 (en) * 2001-01-10 2002-10-03 Jau-Jier Chu Anti-reflection high conductivity multi-layer coating for flat crt products
EP1965229A2 (fr) * 2007-02-28 2008-09-03 Corning Incorporated Éléments sophistiqués revêtus de fluor pour systèmes laser
US20090104385A1 (en) * 2006-03-10 2009-04-23 Saint-Gobain Glass France Antireflection-coated transparent substrate exhibiting neutral color in reflection
US20110226611A1 (en) * 2008-12-08 2011-09-22 Madocks John E Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewith

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010002295A1 (en) * 1995-02-23 2001-05-31 Charles-Edward Anderson Transparent substrate with antireflection coating
US20020141064A1 (en) * 2001-01-10 2002-10-03 Jau-Jier Chu Anti-reflection high conductivity multi-layer coating for flat crt products
US20090104385A1 (en) * 2006-03-10 2009-04-23 Saint-Gobain Glass France Antireflection-coated transparent substrate exhibiting neutral color in reflection
EP1965229A2 (fr) * 2007-02-28 2008-09-03 Corning Incorporated Éléments sophistiqués revêtus de fluor pour systèmes laser
US20110226611A1 (en) * 2008-12-08 2011-09-22 Madocks John E Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewith

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11667565B2 (en) 2013-05-07 2023-06-06 Corning Incorporated Scratch-resistant laminates with retained optical properties
US9359261B2 (en) * 2013-05-07 2016-06-07 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US11231526B2 (en) 2013-05-07 2022-01-25 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US20140335330A1 (en) * 2013-05-07 2014-11-13 Corning Incorporated Low-Color Scratch-Resistant Articles with a Multilayer Optical Film
US11714213B2 (en) 2013-05-07 2023-08-01 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US11267973B2 (en) 2014-05-12 2022-03-08 Corning Incorporated Durable anti-reflective articles
US10995404B2 (en) 2014-08-01 2021-05-04 Corning Incorporated Scratch-resistant materials and articles including the same
US11002885B2 (en) 2015-09-14 2021-05-11 Corning Incorporated Scratch-resistant anti-reflective articles
US11698475B2 (en) 2015-09-14 2023-07-11 Corning Incorporated Scratch-resistant anti-reflective articles
US10948629B2 (en) 2018-08-17 2021-03-16 Corning Incorporated Inorganic oxide articles with thin, durable anti-reflective structures
US11567237B2 (en) 2018-08-17 2023-01-31 Corning Incorporated Inorganic oxide articles with thin, durable anti-reflective structures
US11906699B2 (en) 2018-08-17 2024-02-20 Corning Incorporated Inorganic oxide articles with thin, durable anti reflective structures
WO2020146320A1 (fr) * 2019-01-11 2020-07-16 General Plasma Inc. Revêtements antireflets pour dispositifs mobiles et leurs procédés de fabrication

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