WO2015064174A1

WO2015064174A1 - Texture-etching liquid, liquid additive for texture-etching liquid, textured substrate, method for manufacturing textured substrate, and solar cell

Info

Publication number: WO2015064174A1
Application number: PCT/JP2014/071170
Authority: WO
Inventors: 村上　貴志; 松岡　敏文
Original assignee: 日本酢ビ・ポバール株式会社
Priority date: 2013-11-01
Filing date: 2014-08-11
Publication date: 2015-05-07
Also published as: TW201518476A; JP2015088713A; TWI632226B; JP6109713B2

Abstract

This invention: provides, at low cost, a texture-etching liquid and a liquid additive therefor that make it easy to stably reproduce a highly uniform pattern of minute pyramidal concavities and convexities that is suitable for use in a monocrystalline solar cell or the like; uses said texture-etching liquid to provide a textured substrate having a uniform pattern of minute pyramidal concavities and convexities; and provides a high-efficiency solar cell using said textured substrate. Either a texture-etching liquid containing an alkali component, a tannin, and a stilbene derivative or a texture-etching liquid to which a liquid additive containing a tannin with a concentration of up to 30 wt.% and a stilbene derivative with a concentration of up to 30 wt.% is added is used to manufacture a silicon substrate with at least one surface thereof textured and a solar cell that contains said silicon substrate with (one of) the textured surface(s) thereof on a light-receiving-surface side.

Description

Texture etching solution, additive solution for texture etching solution, texture forming substrate, method for producing texture forming substrate, and solar cell

The present invention is for texture formation used for the purpose of forming fine irregularities called texture on the surface {plane orientation (100)} of a single crystal silicon substrate for use in, for example, a single crystal silicon solar cell. The present invention relates to an etching solution (hereinafter also referred to as “texture etching solution” or simply “etching solution”). More specifically, with respect to the texture etchant composition, an additive solution used to produce the texture etchant and a textured silicon substrate produced using the texture etchant (hereinafter simply “ Also referred to as “texture substrate”), a method for producing the texture substrate, and a solar cell produced using the texture substrate.

At present, the method used for the manufacture of consumer solar cells is generally a method combining the thermal diffusion method and the screen printing method with an emphasis on cost reduction. The details are as follows, for example.

First, a p-type silicon substrate obtained by slicing a single crystal silicon ingot pulled up by the Czochralski (CZ) method or a polycrystalline silicon ingot produced by a cast method by a multi-wire method is prepared. Next, surface damage is removed with an alkaline solution, a fine texture having a maximum height of about 10 μm is formed on the surface of the silicon substrate, and an n-type diffusion layer is formed on the surface of the substrate by a thermal diffusion method. Further, TiO ₂ or SiN is deposited on the light receiving surface with a film thickness of, for example, about 70 nm to form an antireflection film. Next, using a screen printing method, a back electrode is formed by printing and baking a material mainly composed of aluminum over the entire back surface of the light receiving surface. On the other hand, the light-receiving surface electrode is formed by printing and baking a material containing silver as a main component, for example, in a comb-teeth shape having a width of about 100 to 200 μm.

In such a method for manufacturing a consumer solar cell, when a fine texture is formed on a substrate surface using a single crystal silicon substrate, a single crystal silicon substrate having a plane orientation (100) is used. A method of forming a texture using a simple texture etching solution has been proposed.

Specifically, as a conventional texture etching solution, an etching solution in which ethylene glycol is added to an alkaline medium made of sodium hydroxide (NaOH) or potassium hydroxide (KOH) is used, and this is performed at 60 to 80 ° C. By heating and immersing the silicon wafer in this solution for 5 to 20 minutes and performing wet etching, pyramidal irregularities are formed on the surface of the silicon wafer, and the amount of etching solution consumed can be increased by adding the necessary medium. There is a supplement (for example, see Patent Document 1).

In addition, an etching solution to which sodium hydroxide or sodium hydrogen carbonate (NaHCO ₃ ) is added based on sodium carbonate (Na ₂ CO ₃ ) is heated to 80 ° C. to 100 ° C., and a single crystal is taken as a guide for 30 minutes. By dipping the silicon wafer and performing wet etching, a pyramidal uneven portion suitable for a crystalline silicon solar cell is formed on the surface of the single crystal silicon wafer with low reflectivity, and continuously without changing the etching solution. In the case of performing processing, there is one that replenishes an amount of water or etching solution that evaporates during processing. As another conventional technique, a silicon wafer is immersed for 10 to 30 minutes in an etching solution in which isopropyl alcohol (hereinafter also referred to as “IPA”) is added to sodium hydroxide or potassium hydroxide heated to 60 to 95 ° C. By doing so, an etching solution for forming a pyramidal concavo-convex portion (texture structure) is also included (see, for example, Patent Document 2).

As another aspect, it is based on sodium hydroxide or potassium hydroxide, and contains one or more of lignin, celluloses, ketones, esters, etc., and sodium hydrogen carbonate (NaHCO ₃ ) or potassium hydrogen carbonate The etching solution to which (KHCO ₃ ) has been added is heated to 60 to 85 ° C., and the silicon wafer is immersed in this solution for 2 to 30 minutes and wet-etched, so that it is suitable for a crystalline silicon solar cell with low reflectance. An etchant that can stably form pyramidal irregularities is also included (see, for example, Patent Document 3).

Further, an etching solution based on sodium hydroxide or potassium hydroxide and added with polyvinyl alcohol (PVA) and sodium hydrogen carbonate (NaHCO ₃ ) or potassium hydrogen carbonate (KHCO ₃ ) is heated to 85 ° C. Also, an etchant that can stably form pyramidal irregularities suitable for crystalline silicon solar cells with low reflectivity by immersing a silicon wafer in this solution for 13 minutes and performing wet etching (for example, (See Patent Document 4).

However, with such a conventional texture etching solution, an actual reproduction experiment was performed under the prescribed conditions described in those specifications. There is a problem that it is difficult to reproduce easily and stably, and is not practically industrially available, takes an etching time, and is inferior in productivity.

Furthermore, it is ideal that fine and uniform pyramid-shaped irregularities are formed in the electrode patterning process after the solar cell manufacturing process, but the uniform and fine pyramid is formed in the conventional texture etching solution. There is a problem that the uneven portion cannot be obtained. As a result, when the conventional texture etching solution is used, there is a problem that the variation in the characteristics of the solar cells is large, and it is difficult to stably manufacture the high-efficiency solar cells.

In addition, when IPA or ethylene glycol is added, these compounds themselves are dangerous substances, and alkali and alcohol are mixed in the waste liquid, and equipment for waste liquid treatment is required, resulting in high costs and reliable waste liquid treatment. Failure to do so could have a negative impact on the environment.

Furthermore, when IPA is added, if it is used at a temperature near the boiling point, not only does the composition of the texture etching solution become unstable due to evaporation of the IPA, but also there is a risk of ignition, so an explosion-proof facility is required and consumption There is also a problem that the cost increases, such as the need for replenishment as needed.

On the other hand, an etching solution that does not use IPA in which lignin or the like and sodium hydrogen carbonate or potassium hydrogen carbonate are added to an alkaline aqueous solution is 0.5 to 18% by weight in order to obtain a uniform and fine pyramidal uneven portion more stably. A relatively large amount of sodium hydrogen carbonate or potassium hydrogen carbonate is required, and the material cost is still high.

JP 2000-1792 A JP 2000-183378 A JP 2005-019605 A JP 2009-123811 A

The present invention has been made in view of the above circumstances, and is suitable for single crystal solar cell applications and the like, and a texture etching solution for easily and stably reproducing a fine pyramid-shaped uneven portion having excellent uniformity on a silicon substrate, and An object of the present invention is to provide an additive solution for a texture etching solution in an industrially advantageous manner. It is another object of the present invention to provide a texture substrate having a uniform and fine pyramidal uneven portion using the texture etching solution. Furthermore, it aims at providing the highly efficient photovoltaic cell using the said texture board | substrate.

As a result of intensive studies to achieve the above object, the present inventors have found that the object can be achieved by containing at least one tannin and a stilbene derivative in the etching solution. Based on the findings, further research has been made and the present invention has been completed.

That is, the present invention relates to the following inventions.
[1] A texture etching solution comprising an alkali component, tannins, and a stilbene derivative.
[2] The texture etching solution according to [1], further comprising at least one lignin.
[3] The above-mentioned [1] or [2], further comprising an ultra-low polymerization degree polyvinyl alcohol resin having a polymerization degree of 120 or less and / or a carboxyl group-modified polyvinyl alcohol resin having a modification degree of 10% or more. ] The texture etching liquid of description.
[4] The texture etching solution according to any one of [1] to [3], wherein the tannin is condensed tannin.
[5] The stilbene derivative is hexasodium-2,2 ′-{vinylenebis [(3-sulfonato-4,1-phenylene) imino [6- (diethylamino) -1,3,5-triazine-4,2- Diyl] imino]} bis (benzene-1,4-disulfonate) and one selected from the group consisting of 1,3,5-triazinyl-derivatives of 4,4′-diaminostilbene-2,2′-disulfonic acid The texture etching solution according to any one of [1] to [4] above, which contains the above.
[6] The texture etching solution according to any one of [2] to [5], wherein the lignin contains one or more selected from the group consisting of lignin and sodium lignin sulfonate. .
[7] The texture etching solution according to any one of [1] to [6], wherein the alkali component is sodium hydroxide or potassium hydroxide.
[8] The texture etching solution as described in [7] above, wherein the concentration of sodium hydroxide or potassium hydroxide is 0.5 to 12% by weight.
[9] Any one of [1] to [8] above, wherein the tannin concentration is 1.0% by weight or less and the stilbene derivative concentration is 1.0% by weight or less. Texture etchant.
[10] The texture etching solution according to any one of [2] to [9], wherein the concentration of lignin is 1.0% by weight or less.
[11] The texture etching solution according to any one of [3] to [10], wherein the concentration of the polyvinyl alcohol-based resin is 1.0% by weight or less.
[12] The tannins and stilbene derivative are contained, the tannins concentration is 30% by weight or less, and the stilbene derivative concentration is 30% by weight or less. The additive liquid for texture etching liquid used for manufacture of the texture etching liquid of any one.
[13] The production of the texture etching solution according to any one of [2] to [11], further comprising lignins, wherein the concentration of the lignins is 30% by weight or less. Additive solution for texture etching solution used in
[14] Furthermore, it contains an ultra-low polymerization degree polyvinyl alcohol resin having a polymerization degree of 120 or less and / or a carboxyl group-modified polyvinyl alcohol resin having a modification degree of 10% or more, and the concentration of the polyvinyl alcohol resin is 30% by weight. The additive solution for texture etching solution used for the production of the texture etching solution according to any one of the above [3] to [13], which is not more than%.
[15] Manufactured by adding the texture etching solution according to any one of [1] to [11] or the additive solution for etching solution according to any one of [12] to [14]. A silicon substrate in which a texture is formed on at least one surface of the substrate surface using the texture etching solution prepared.
[16] An etching solution produced by adding the texture etching solution according to any one of [1] to [11] or the additive solution for an etching solution according to [12] to [14]. The method for producing a silicon substrate according to [16] above, further comprising a step of reacting with the silicon substrate within a range of 60 to 95 ° C.
[17] A solar cell comprising the silicon substrate according to [15], wherein a textured surface is directed at least on the light receiving surface side.

According to the present invention, a texture etching solution and an additive solution for a texture etching solution, which are suitable for single crystal solar cell applications and the like, can easily and stably reproduce fine pyramid-shaped uneven portions with excellent uniformity on a silicon substrate. Can be provided industrially advantageously. Moreover, the texture board | substrate which has a uniform and fine pyramid-shaped uneven | corrugated | grooved part can be provided using the said texture etching liquid. Furthermore, by using the texture substrate, high-efficiency solar cells can be stably provided as a result.

FIG. 1 shows a laser micrograph of a substrate treated with the texture etching solution of Example 1. FIG. 2 shows a laser micrograph of the substrate treated with the texture etching solution of Example 2. FIG. 3 shows a laser micrograph of the substrate treated with the texture etching solution of Example 3. FIG. 4 shows a laser micrograph of the substrate treated with the texture etching solution of Example 4. FIG. 5 shows a laser micrograph of the substrate treated with the texture etching solution of Example 5. FIG. 6 shows a laser micrograph of the substrate treated with the texture etching solution of Example 6. FIG. 7 shows a laser micrograph of the substrate treated with the texture etching solution of Example 7. FIG. 8 shows a laser micrograph of the substrate treated with the texture etching solution of Example 8. FIG. 9 shows a laser micrograph of the substrate treated with the texture etching solution of Example 9. FIG. 10 shows a laser micrograph of the substrate treated with the texture etching solution of Example 10. FIG. 11 shows a laser micrograph of the substrate treated with the texture etching solution of Example 11. FIG. 12 shows a laser micrograph of the substrate treated with the texture etching solution of Example 12. FIG. 13 shows a laser micrograph of the substrate treated with the texture etching solution of Comparative Example 1. FIG. 14 shows a laser micrograph of the substrate treated with the texture etching solution of Comparative Example 2. FIG. 15 shows a laser micrograph of the substrate treated with the texture etching solution of Comparative Example 3. FIG. 16 shows a laser micrograph of the substrate treated with the texture etching solution of Comparative Example 4.

The texture etching solution of the present invention is characterized by containing an alkali component, tannins, and a stilbene derivative. In the texture etching solution of the present invention, the tannins and the stilbene derivatives are not particularly limited as long as at least one of each of the tannins and stilbene derivatives is contained. The texture etching solution of the present invention only needs to contain at least an alkali component, a tannin, and a stilbene derivative, and any component used for the texture etching solution other than the above components (for example, described later) as long as the effects of the present invention are not hindered. Lignins, polyvinyl alcohol resins (hereinafter also referred to as “PVA resins”) and the like may be added.

In the present invention, tannins, stilbene derivatives, lignins, and PVA resins (hereinafter collectively referred to as “additive components”) are used more appropriately than when used alone as additives. The etching suppressing effect and the texture forming effect can be controlled, and the texture can be formed without a gap. Therefore, a lower reflectance can be obtained also for the obtained silicon substrate.

In addition, since the additive component of the present invention can be textured effectively in a very small amount, it is possible to provide a texture etching solution and an additive solution for texture etching solution at low cost. As a result, it is possible to reduce the manufacturing cost of the texture substrate and the solar battery cell.

Explain about tannins. Tannins are classified into two types, hydrolyzed and condensed. The hydrolyzable tannin is not particularly limited, and examples thereof include tannic acid, which is formed by binding gallic acid, which is a kind of benzoic acid, and a monosaccharide. The structure of tannic acid is shown below.

Condensed tannin is a polymer substance derived from flavonoids, and is formed by polymerization of units constituting flavonoids. The structure of catechin, a kind of flavonoid, is shown below.

Also, the structure of mimosa (or Watul) tannin, which is a kind of condensed tannin, is shown below.

¡Tannins are characterized by a strong astringency when put in the mouth. This is said to be due to the tannins binding to and denaturing proteins of the tongue and oral mucosa, and the mucosal degeneration effect of such tannins is called “convergence action”.

Thus, tannins mean a compound having the above-mentioned characteristics and a specific structure, which is clearly different from other phenolic substances.

The tannins in the present invention are not particularly limited, but it is particularly preferable to use condensed tannins because it can form a texture with a uniform and fine structure in a plane with a relatively small amount of addition. Further, the condensed tannin may be obtained by modifying the insoluble matter to be water-soluble by sulfite treatment.

Examples of condensed tannins include mimosa (or Watle) tannins and quebracho tannins. The condensed tannin in the present invention is one selected from the group consisting of (−)-epicatechin, (−)-epicatechin gallate, (−)-epigallocatechin and (−)-epigallocatechin gallate. The condensed tannin obtained by polymerizing the above catechin compounds may be used. These tannins may be used alone or in combination of two or more.

Next, the stilbene derivative will be described. The structure of trans stilbene, which is the basic skeleton of stilbene derivatives, is shown below.

Examples of the stilbene derivative include those containing the cis stilbene skeleton shown below in addition to those containing the trans stilbene skeleton.

The stilbene derivative of the present invention means a group of compounds containing the trans stilbene or cis stilbene as a basic skeleton.

The stilbene derivative in the present invention is not particularly limited as long as it contains the trans stilbene or cis stilbene as a basic skeleton, but hexasodium-2,2 ′-{vinylene bis [(3-sulfonato-4,1-phenylene ) Imino [6- (diethylamino) -1,3,5-triazine-4,2-diyl] imino]} bis (benzene-1,4-disulfonate) and 4,4′-diaminostilbene-2,2 A 1,3,5-triazinyl-derivative of '-disulfonic acid and the like are particularly preferable because a uniform texture can be formed with a relatively small amount of addition. These stilbene derivatives may be used alone or in combination of two or more.

The following is a kind of stilbene derivative, hexasodium-2,2 ′-{vinylenebis [(3-sulfonato-4,1-phenylene) imino [6- (diethylamino) -1,3,5-triazine-4,2 -Diyl] imino]} bis (benzene-1,4-disulfonate).

As another aspect of the present invention, a texture etching solution containing at least one lignin and / or PVA-based resin as another additive component may be mentioned.

The lignins in the present invention are not particularly limited, but lignin extracted by alkali or the like when producing paper pulp from wood in the paper industry and / or sodium lignin sulfonate used as a water reducing agent for concrete, etc. Is preferable from the viewpoint of cost. In addition, lignin obtained by a method using hydrolysis with a phenol solution in sulfuric acid or a method using high-temperature high-pressure water may be used. An example of lignin structure is shown below.

The PVA-based resin used in the present invention has a moderate effect of suppressing the etching of silicon from an alkaline aqueous solution, can control the degree of etching by the amount added, and excessively forms the texture of other additive components. From the point of not hindering, an ultra-low polymerization degree PVA resin and / or a carboxyl group-modified PVA resin is preferable. The degree of polymerization of the ultra-low polymerization degree PVA resin is preferably 120 or less, more preferably 20 to 40. The degree of polymerization is measured according to the method described in JIS K 6726 (1994). Further, the degree of modification of the ruboxyl group-modified PVA resin is preferably 10% or more, more preferably 10 to 30%. A known technique can be used as a method for producing the PVA resin. As a method for producing the ultra-low polymerization degree PVA resin, for example, a known method using a polymerization solvent having a large chain transfer constant such as isopropyl alcohol (for example, a method described in JP-A-51-87594) is used. be able to. As a method for producing the carboxyl group-modified PVA resin, for example, a carboxyl group-containing vinyl monomer and a vinyl ester monomer can be copolymerized using a polymerization catalyst and then saponified by a known method.

Moreover, if it is the said PVA-type resin, there will be no restriction | limiting about the structure of another part, The part may be a sulfonic acid modified PVA resin, a carbonyl group modified PVA resin, an ethylene oxide modified PVA resin, PVA resin having a 1,2-diol structural unit in the chain may be used.

Further, since the PVA resin is used by adding to an alkaline aqueous solution, there is no particular limitation on the degree of saponification. For example, in the production of a texture etching solution, a polyvinyl acetate resin may be added to the PVA resin used in the present invention.

In addition to the additive components described above, some of the components of known texture etching solutions such as IPA and ethylene glycol may be used in combination. Further, an additive component such as a simple phenol compound (for example, vanillin or the like) alone that does not exhibit a sufficient texture forming effect when added in a small amount may be used in combination.

The etching solution of the present invention contains a base alkali component. Although it does not specifically limit as said alkali component, Sodium hydroxide and potassium hydroxide are preferable from the surface of reagent cost. Furthermore, other alkaline components such as tetramethylammonium hydroxide (TMAH) may be used as long as the effects of the present invention are not hindered.

In consideration of the lifetime in continuous use of the texture etching solution and the reagent cost, the alkali component (preferably the concentration of sodium hydroxide or potassium hydroxide) is 0.5 to 12% by weight in the texture etching solution of the present invention. preferable. In consideration of the above points, the concentration of tannins in the etching solution of the present invention is not particularly limited, but is preferably 1.0% by weight or less, more preferably 0.0000001 to 0.5% by weight. In consideration of the above points, the concentration of the stilbene derivative in the etching solution of the present invention is not particularly limited, but is preferably 1.0% by weight or less, and more preferably 0.0000001 to 0.5% by weight.

When lignins are used in combination, the concentration of lignins in the texture etching solution is not particularly limited, but is preferably 1.0% by weight or less, more preferably 0.0000001 to 0.5% by weight, and 0.0000001 to 0%. More preferred is .05% by weight.

When the PVA resin is used in combination, the concentration of the PVA resin in the texture etching solution is not particularly limited, but is preferably 1.0% by weight or less, more preferably 0.0000001 to 0.5% by weight, and 0.0000001 to 0.05 weight% is further more preferable.

Needless to say, if the concentration of the additive component is too low, the texture is not formed. However, if the concentration of the additive component is too high, the etching suppression effect becomes too high, and the solar with good productivity and low reflectance. Problems such as the inability to form an optimal texture for battery applications occur.

As another aspect of the present invention, there is an additive solution for producing the etching solution. In order to easily produce the texture etching solution, an additive solution for the texture etching solution in which the tannins and the stilbene derivative are dissolved in a solvent (for example, pure water) at a high concentration is prepared and used. Can do.

The concentration of tannins in the additive solution for texture etching solution is preferably 30% by weight or less, and more preferably 5% by weight or less. Further, the concentration of the stilbene derivative in the additive solution for texture etching solution is preferably 30% by weight or less, and more preferably 5% by weight or less.

When lignins are used in combination, the concentration of lignins in the additive solution for texture etching solution is preferably 30% by weight or less, and more preferably 5% by weight or less.

When the PVA resin is used in combination, the concentration of the PVA resin in the additive solution for texture etching solution is preferably 30% by weight or less, and more preferably 5% by weight or less.

If the concentration of these additive components becomes too high, the additive components may not be completely dissolved and precipitation may occur, resulting in problems due to uneven concentration.

By using the texture etching solution and reacting the surface of the silicon substrate with the texture etching solution, it is possible to obtain a silicon substrate having an in-plane uniform fine structure texture formed on at least one surface of the silicon substrate.

As another aspect of the present invention, there is a method for producing a silicon substrate, which comprises a step of reacting an etching solution produced by adding the etching solution or the additive solution with a silicon substrate within a range of 60 to 95 ° C. It is done. By the reaction step, a silicon substrate in which a texture having a uniform in-plane fine structure is formed on at least one surface of the substrate surface is obtained.

The silicon substrate used in the manufacturing method is not particularly limited, but it is preferable to use a single crystal silicon substrate having a surface orientation of (100). The silicon substrate used for the manufacturing method can be a substrate after slicing cut out from a single crystal silicon ingot, and a substrate obtained by removing a damage layer due to slicing with an acid or alkaline etching solution in advance is used. Also good.

In the reaction step, the reaction temperature between the etching solution and the silicon substrate is not particularly limited, but is usually 60 to 95 ° C. and 65 to 90 ° C. because a fine texture can be formed on at least one surface of the substrate surface. Is preferred. The reaction time is not particularly limited, but is preferably 1 to 50 minutes, more preferably 1 to 20 minutes, and further preferably 1 to 15 minutes. As reaction conditions, the reaction is more preferably carried out at 60 to 95 ° C. for 1 to 50 minutes.

The reaction step is preferably performed by a method of immersing a silicon substrate in a texture etching solution under the above conditions from the viewpoint that a texture can be formed using a simple apparatus. Moreover, it is preferable from the point which can remove the abrasive grain, cutting oil, etc. at the time of a slice by washing | cleaning before the said reaction by a uniform in-plane texture.

In addition, in the reaction process, in addition to controlling the temperature and time, the carrier containing the silicon substrate is swung, the texture etching solution is stirred, or the overflow is circulated in order to allow the texture solution to uniformly react with the substrate surface. It is preferable from the viewpoint that a uniform texture can be formed. As another method, texture formation may be performed only on one side of the substrate using an apparatus that reacts only one side of the silicon substrate with the texture etching solution.

As a method for producing a solar cell using the textured silicon substrate, a general method for producing a crystalline solar cell can be used, and the textured surface according to the present invention is directed at least on the light receiving surface side. Is preferable in order to stably obtain a high-efficiency solar cell.

The average reflectance of the silicon substrate of the present invention at a wavelength of 400 to 1100 nm is preferably 18.0% or less, more preferably 15.0% or less. The measuring method of the average reflectance is as described in Examples described later. The texture size of the silicon substrate of the present invention is preferably 1 to 10 μm, and more preferably 1 to 5 μm. The method for measuring the texture size is as described in Examples described later. Further, it is preferable that the texture formed on the silicon substrate is not only fine within the texture size range but also has a uniform size and little variation. The silicon substrate of the present invention is more preferably manufactured using the above-mentioned etching solution, having an average reflectance of 15.0% or less and a texture size of 1 to 10 μm.

The present invention includes embodiments in which the above configurations are combined in various ways within the technical scope of the present invention as long as the effects of the present invention are exhibited.

EXAMPLES Next, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to these examples at all, and many variations are within the technical idea of the present invention. This is possible by those with ordinary knowledge.

[Example 1]
25% by weight aqueous solution of sodium hydroxide, 1% by weight additive solution of mimosa (or wattle) tannin as an additive, hexasodium-2,2 ′-{vinylenebis [(3-sulfonato- 4,1-phenylene) imino [6- (diethylamino) -1,3,5-triazine-4,2-diyl] imino]} bis (benzene-1,4-disulfonate) (hereinafter “stilbene derivative compound A 1% by weight additive solution and water were mixed, and a texture etching solution was prepared so that the concentration of each component would be the value described in Table 1 below.

[Example 2]
An aqueous solution of 25% by weight of sodium hydroxide, an additive solution of 1% by weight of mimosa (or wattle) tannin as an additive, and 4,4′-diaminostilbene-2,2′-disulfonic acid which is a kind of stilbene derivative. A 1% by weight additive solution of 1,3,5-triazinyl-derivative (hereinafter referred to as “stilbene derivative compound B”) and water are mixed, and the concentrations of the respective components are as shown in Table 1 below. The texture etching liquid was manufactured so that it might become.

[Example 3]
Concentration of each component by mixing 25% by weight aqueous solution of sodium hydroxide, 1% by weight additive solution of quebracho tannin as additive, 1% by weight additive solution of stilbene derivative compound A, and water The texture etching solution was manufactured so that the values shown in Table 1 below were obtained.

[Example 4]
Concentration of each component by mixing 25% by weight aqueous solution of sodium hydroxide, 1% by weight additive solution of quebracho tannin as an additive, 1% by weight additive solution of stilbene derivative compound B, and water The texture etching solution was manufactured so that the values shown in Table 1 below were obtained.

[Example 5]
25% by weight aqueous solution of sodium hydroxide, 1% by weight additive solution of mimosa (or Watul) tannin as additive, 1% by weight additive solution of stilbene derivative compound A, and 1% by weight of sodium lignin sulfonate A texture etching solution was prepared by mixing the additive solution and water so that the concentration of each component was a value shown in Table 1 below.

[Example 6]
25% by weight aqueous solution of sodium hydroxide, 1% by weight additive solution of mimosa (or Watle) tannin as additive, 1% by weight additive solution of stilbene derivative compound B, and 1% by weight additive of lignin A texture etching solution was produced by mixing the solution and water so that the concentration of each component was a value shown in Table 1 below.

[Example 7]
25% by weight aqueous solution of sodium hydroxide, 1% by weight additive solution of quebracho tannin as additive, 1% by weight additive solution of stilbene derivative compound A, 1% by weight additive solution of lignin, A texture etching solution was produced by mixing with water so that the concentration of each component was a value described in Table 1 below.

[Example 8]
25% by weight aqueous solution of sodium hydroxide, 1% by weight additive solution of quebracho tannin as additive, 1% by weight additive solution of stilbene derivative compound B, and 1% by weight additive of sodium lignin sulfonate A texture etching solution was produced by mixing the solution and water so that the concentration of each component was a value shown in Table 1 below.

[Example 9]
25% by weight aqueous solution of sodium hydroxide, 1% by weight additive solution of mimosa (or Watle) tannin as additive, 1% by weight additive solution of stilbene derivative compound B, carboxyl group-modified PVA (degree of modification 20) %) 0.1% by weight additive solution and water were mixed to prepare a texture etching solution so that the concentration of each component was a value shown in Table 1 below.

[Example 10]
Sodium hydroxide 25 wt% aqueous solution, 1 wt% additive solution of quebracho tannin as additive, 1 wt% additive solution of stilbene derivative compound A, ultra low polymerization degree PVA (polymerization degree 30) A texture etching solution was prepared by mixing 0.1% by weight of the additive solution and water so that the concentration of each component was a value shown in Table 1 below.

[Example 11]
25% by weight aqueous solution of sodium hydroxide, 1% by weight additive solution of mimosa (or wattle) tannin as additive, 1% by weight additive solution of stilbene derivative compound A, and 1% by weight additive of lignin The solution is mixed with a 0.1% by weight additive solution of ultra-low polymerization degree PVA (polymerization degree 30) and water so that the concentration of each component becomes the value shown in Table 1 below. Manufactured.

[Example 12]
25% by weight aqueous solution of sodium hydroxide, 1% by weight additive solution of quebracho tannin as additive, 1% by weight additive solution of stilbene derivative compound B, and 1% by weight additive of sodium lignin sulfonate Solution, 0.1% by weight additive solution of carboxyl group-modified PVA (degree of modification 20%), and water are mixed, and the texture etching solution so that the concentration of each component becomes the value described in Table 1 below. Manufactured.

[Comparative Example 1]
A 25% by weight aqueous solution of sodium hydroxide, an additive solution of 1% by weight of vanillin represented by the following formula as an additive, and water are mixed so that the concentration of each component becomes a value described in Table 1 below. A texture etchant was produced.

[Comparative Example 2]
A texture etching solution is prepared by mixing 25% by weight aqueous solution of sodium hydroxide, 1% by weight additive solution of lignin as an additive, and water so that the concentration of each component becomes the value shown in Table 1 below. did.

[Comparative Example 3]
A sodium hydroxide 25 wt% aqueous solution, a normal PVA resin (polymerization degree 500) 0.1 wt% additive solution as an additive, and water are mixed, and the concentration of each component is a value described in Table 1 below. An etching solution was produced so that

[Comparative Example 4]
A 25 wt% sodium hydroxide aqueous solution, IPA (97 wt%) as an additive, and water were mixed to prepare a texture etching solution so that the concentration of each component was a value shown in Table 1 below.

With respect to the silicon substrates obtained using the etching solutions of the examples and comparative examples shown in Table 1 below, the respective reflectances were measured using a spectral reflectance measuring device (trade name: MPC-3100 / UV-3150, manufactured by Shimadzu Corporation). ) Was used to measure the reflectance at a wavelength of 300 to 1200 nm in the reflectance measurement mode. The average reflectance in the following Table 1 is an average reflectance at a wavelength of 400 to 1100 nm. Texture size is measured in simple mode with a 408 nm purple laser using a laser microscope (trade name: VK X-200, manufactured by Keyence Corporation), and a scale is additionally displayed on the obtained image. And measured.

In the table, the degree of polymerization of the PVA-based resin used in the examples and comparative examples is 500 unless otherwise specified.

1 to 16 show laser micrographs of the obtained silicon substrates. 1 to 4, it can be seen that a fine texture of about 1 to 5 μm is formed by adding tannins and a stilbene derivative to the etching solution. 5 to 8, it can be seen that a fine texture of about 1 to 5 μm is formed by adding tannins, stilbene derivatives, and lignins to the etching solution. 9 to 10, it can be seen that a fine texture of about 1 to 5 μm is formed by adding tannins, stilbene derivatives, carboxyl group-modified PVA or ultra-low polymerization degree PVA to the etching solution. From FIG. 11 to FIG. 12, a fine texture of about 1 to 5 μm is formed by adding tannins, stilbene derivatives, lignins, carboxyl group-modified PVA or ultra-low polymerization degree PVA to the etching solution. I understand.

As shown in FIG. 13, no texture was formed even when only vanillin was added, and the silicon substrate became a glossy surface with a high average reflectance.

As shown in FIG. 14, a fine texture of 1 μm or less was formed by adding lignin alone, but the average reflectance was high.

As shown in FIG. 15, when only a normal PVA resin (polymerization degree 500) was added, a pyramid-shaped texture was not formed, and the average reflectance was high.

As shown in FIG. 16, a texture of 1 to 15 μm was formed by the addition of IPA, but various textures were formed, which were not uniform. The average reflectance was relatively high.

From the above results, it was confirmed that a texture can be formed effectively by using a texture etching solution containing at least one kind of tannins and stilbene derivatives of the present invention.

[Example 13]
Boron-doped (p-type) single crystal silicon ingot pulled up by Czochralski (CZ) method is sliced with a wire saw, and a single crystal silicon substrate with a plane orientation (100) (substrate size: 156.5 mm square, specific resistance 1 to 3Ω · cm).
Next, a textured substrate was produced using the etching solution and etching conditions of Example 8.

Next, using this texture substrate, a single crystal solar battery cell was produced by the following method.
First, an n-type diffusion layer was formed on the substrate surface by a thermal diffusion method using POCl ₃ gas. Next, an SiN film having a thickness of about 80 nm was deposited on the light receiving surface by PE-CVD to form an antireflection film. Next, the back electrode was formed by printing and baking the electrode material which has aluminum as a main component over the back surface of a light-receiving surface using the screen printing method. Finally, an electrode material mainly composed of silver was formed on the light-receiving surface side by printing and baking in a comb-teeth shape having a width of about 100 μm to produce a solar battery cell.

[Example 14]
A textured substrate was prepared using the etching solution and etching conditions of Example 12, and solar cells were prepared in the same manner as in Example 13 except that.

[Comparative Example 5]
A texture-formed substrate was prepared using the etching solution and etching conditions of Comparative Example 4, and solar cells were prepared in the same manner as in Example 13 except that.

The solar cells obtained in Example 13, Example 14, and Comparative Example 5 were subjected to a solar simulator (light intensity: 1 kW / m ² , spectrum: AM1.5 global, trade name: cell) in an atmosphere at 25 ° C. The current-voltage characteristics were measured under a tester manufactured by NPC Corporation. Table 2 shows the characteristic average values and standard deviation values of 20 solar cells obtained in the examples and comparative examples.

From the above results, it was confirmed that the photovoltaic cell according to the present invention has higher photoelectric conversion efficiency and can reduce variation in cell characteristics as compared with the comparative example.
It could be confirmed.

The etching solution of the present invention is useful for the production of silicon substrates and solar cells. In particular, the etching solution is useful for easily and stably forming a fine pyramidal uneven portion having excellent uniformity on at least one surface of the silicon substrate surface.

Claims

A texture etching solution comprising an alkali component, tannins, and a stilbene derivative.
The texture etching solution according to claim 1, further comprising at least one lignin.
The texture etching according to claim 1 or 2, further comprising an ultra-low polymerization degree polyvinyl alcohol resin having a polymerization degree of 120 or less and / or a carboxyl group-modified polyvinyl alcohol resin having a modification degree of 10% or more. liquid.
4. The texture etching solution according to claim 1, wherein the tannin is condensed tannin.
The stilbene derivative is hexasodium-2,2 ′-{vinylenebis [(3-sulfonato-4,1-phenylene) imino [6- (diethylamino) -1,3,5-triazine-4,2-diyl] imino. ]} One or more selected from the group consisting of bis (benzene-1,4-disulfonate) and 1,3,5-triazinyl-derivatives of 4,4′-diaminostilbene-2,2′-disulfonic acid The texture etching solution according to any one of claims 1 to 4, wherein:
The texture etching solution according to any one of claims 2 to 5, wherein the lignin contains one or more selected from the group consisting of lignin and sodium lignin sulfonate.
The texture etching solution according to any one of claims 1 to 6, wherein the alkali component is sodium hydroxide or potassium hydroxide.
The texture etching solution according to claim 7, wherein the concentration of sodium hydroxide or potassium hydroxide is 0.5 to 12% by weight.
The texture etching solution according to any one of claims 1 to 8, wherein the concentration of tannins is 1.0% by weight or less and the concentration of the stilbene derivative is 1.0% by weight or less.
The texture etching solution according to any one of claims 2 to 9, wherein the concentration of lignin is 1.0% by weight or less.
The texture etching solution according to any one of claims 3 to 10, wherein the concentration of the polyvinyl alcohol-based resin is 1.0% by weight or less.
The tannin and the stilbene derivative are contained, the concentration of the tannin is 30% by weight or less, and the concentration of the stilbene derivative is 30% by weight or less. Additive solution for texture etching solution used for the production of texture etching solution.
The texture etching used for producing the texture etching solution according to any one of claims 2 to 11, further comprising lignins, wherein the concentration of the lignins is 30% by weight or less. Liquid additive liquid.
Furthermore, it contains a very low polymerization degree polyvinyl alcohol resin having a polymerization degree of 120 or less and / or a carboxyl group-modified polyvinyl alcohol resin having a modification degree of 10% or more, and the concentration of the polyvinyl alcohol resin is 30% by weight or less. The additive solution for a texture etching solution used for the production of the texture etching solution according to any one of claims 3 to 11, wherein the additive solution is used.
A texture etchant produced by adding the texture etchant according to any one of claims 1 to 11 or the additive solution for an etchant according to any one of claims 12 to 14, A silicon substrate having a texture formed on at least one surface of the substrate surface.
An etching solution prepared by adding the texture etching solution according to any one of claims 1 to 11 or the additive solution for etching solution according to claims 12 to 14, and a silicon substrate and an etching solution at 60 to 95 ° C. The method for producing a silicon substrate according to claim 15, further comprising a step of reacting within a range.
A solar cell comprising the silicon substrate according to claim 15 and having a textured surface directed at least on the light receiving surface side.