WO2015053397A1 - Cationically photocurable coating composition, method for forming coating film, and article coated with same - Google Patents

Cationically photocurable coating composition, method for forming coating film, and article coated with same Download PDF

Info

Publication number
WO2015053397A1
WO2015053397A1 PCT/JP2014/077231 JP2014077231W WO2015053397A1 WO 2015053397 A1 WO2015053397 A1 WO 2015053397A1 JP 2014077231 W JP2014077231 W JP 2014077231W WO 2015053397 A1 WO2015053397 A1 WO 2015053397A1
Authority
WO
WIPO (PCT)
Prior art keywords
formula
group
hydrolyzable silane
coating composition
compound represented
Prior art date
Application number
PCT/JP2014/077231
Other languages
French (fr)
Japanese (ja)
Inventor
加藤 敦也
綾 境口
彰典 永井
Original Assignee
関西ペイント株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 関西ペイント株式会社 filed Critical 関西ペイント株式会社
Priority to JP2015541654A priority Critical patent/JP6530316B2/en
Publication of WO2015053397A1 publication Critical patent/WO2015053397A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • C09D183/06Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08Saturated oxiranes
    • C08G65/10Saturated oxiranes characterised by the catalysts used
    • C08G65/105Onium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/22Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/44Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2312/00Crosslinking
    • C08L2312/06Crosslinking by radiation

Definitions

  • the present invention relates to a photocation curable coating composition, a coating film forming method, and a coated article thereof.
  • Silsesquioxane is a general term for a series of network-like polysiloxanes having a basic structural unit of T units and a ladder-type, cage-type, and three-dimensional network type (random type) structure. Since this silsesquioxane is soluble in a general organic solvent, unlike silica, which is a complete inorganic substance represented by the general formula SiO 2 , it is easy to handle, processability such as film formation and the like. It has the feature of excellent moldability.
  • photocuring is a technology that modifies the surface of the substrate by irradiating and curing the viscous liquid applied to the substrate (metal, plastic, woodworking product, etc.) with light (for example, ultraviolet rays).
  • Photocuring is a technique that utilizes a chemical reaction initiated by light, and is classified into a radical polymerization system and a cationic polymerization system based on the difference in the initiation reaction mechanism.
  • radical polymerization systems cationic polymerization systems are less susceptible to cure inhibition by oxygen, cure shrinkage is small, and curing of areas where light irradiation does not reach because of the long life of active species and curing by heating gradually progress.
  • application to various fields has been studied.
  • Patent Documents 1 and 2 relate to a photocationic curable resin composition containing a silsesquioxane compound having an oxetanyl group and a cationic polymerization initiator.
  • This composition was excellent in surface hardness and compatibility, but was cured by being irradiated with ultraviolet rays 5 times, and when it was irradiated once with ultraviolet rays, its curability and scratch resistance were insufficient.
  • Patent Document 3 relates to a composition comprising an ultraviolet curable epoxy functional organopolysiloxane having an increased ability to solubilize an onium salt photoinitiator and an onium salt initiator.
  • This composition was excellent in compatibility with the onium salt initiator, but the scratch resistance was insufficient.
  • Patent Documents 4 and 5 relate to a cationic polymerization initiator having a cationic polymerization initiating ability.
  • this cationic polymerization initiator does not contain toxic elements such as arsenic and antimony, and has good compatibility with other cationic polymerizable compounds and excellent curability. However, this was a case where the curl resistance was insufficient.
  • JP-A-11-116682 Japanese Patent Laid-Open No. 11-199673 JP-A-1-297421 Japanese Patent Publication No. 2005-116038 JP 2012-22227 A
  • the present invention has been made in view of the above circumstances, and an object of the present invention is to provide a photocationic curable coating composition having excellent transparency and curling resistance and scratch resistance of the resulting cured coating film, and It is providing the coating-film formation method.
  • a photocationic curable coating composition comprising a silsesquioxane compound (a) containing at least one photocationically polymerizable group and an iodonium salt photoacid generator (b),
  • the photocationically polymerizable group-containing silsesquioxane compound (a) is It is obtained by hydrolytic condensation of a hydrolyzable silane compound represented by formula (I) and / or a hydrolyzable silane compound represented by formula (II).
  • a photocationically curable coating composition Based on the total amount with the hydrolyzable silane compound represented by 55 to 100 mol% of a hydrolyzable silane compound represented by the formula (I), A photocationically curable coating composition, wherein the hydrolyzable silane compound represented by the formula (II) is 0 to 45 mol%.
  • R 1 represents a divalent alkylene group having 1 to 6 carbon atoms.
  • X is a halogen element or an alkoxy group having 1 to 6 carbon atoms, and the three Xs may be the same or different.
  • R 2 SiX 3 (II) [Formula (II) is a compound other than formula (I), and R 2 represents an optionally substituted monovalent organic group having 1 to 18 carbon atoms.
  • X is a halogen element or an alkoxy group having 1 to 6 carbon atoms, and the three Xs may be the same or different.
  • Item 2. The photocationic curable coating composition according to Item 1, wherein the photoacid generator (b) is an iodonium salt photoacid generator represented by the following formula (III).
  • R 3 represents an organic group bonded to I (iodine atom), and two R 3 s may be the same as or different from each other.
  • [Y] ⁇ is a phosphate anion represented by the formula (IV) or a boron compound anion represented by the formula (V), and Rf in the formula (IV) is fluorine in which all or part of the hydrogen atoms are fluorine.
  • An alkyl group which may be substituted with an atom is represented.
  • b is an integer of 0 to 5.
  • the b Rf's may be the same or different.
  • Item 3. Item 3.
  • Item 4. The photocationically curable coating composition according to any one of Items 1 to 3, further comprising a sensitizer (d).
  • Item 5 The photocationically curable coating composition according to any one of Items 1 to 4, wherein the epoxy equivalent of the photocationically polymerizable group-containing silsesquioxane compound (a) is 10 to 500 g / equivalent.
  • Item 6 When the cured coating film having a film thickness of 5 ⁇ m is formed on the acrylic resin plate having a thickness of 3 mm, the Martens hardness measured by a super micro hardness tester at a temperature of 23 ° C. and a load of 20 mN is 0.5. Item 6.
  • Item 7 A photocationically curable coating composition according to any one of Items 1 to 6 is applied on an object to be coated so that the dry film thickness is 1 to 10 ⁇ m, and setting and / or preheating is performed.
  • a coating film forming method characterized by irradiating with light after applying.
  • the present invention relates to an article having a film formed by the method for forming a coating film according to Item 7.
  • the photocationic curable coating composition of the present invention When the photocationic curable coating composition of the present invention is used, a cured coating film having excellent transparency can be obtained. Furthermore, according to the photocationic curable coating composition of the present invention, it is possible to obtain a cured coating film that can be cured at a low dose and that is excellent in curling resistance and scratch resistance of the resulting cured coating film.
  • the photocationic curable coating composition of the present invention contains a silsesquioxane compound (a) and an iodonium salt photoacid generator (b). This will be described in detail below.
  • silsesquioxane compound means only a silsesquioxane compound having a structure in which all Si—OH groups (hydroxysilyl groups) are hydrolyzed and condensed. Instead, it may also include a ladder structure in which Si—OH groups remain, an incomplete cage structure, and a random condensate silsesquioxane compound.
  • the ratio of the silsesquioxane compound having a structure in which all Si—OH groups are hydrolyzed and condensed is 80 mass% in the silsesquioxane compound as the component (a). % Or more, preferably 90% by mass or more, and more preferably 100% by mass from the viewpoint of liquid stability and scratch resistance.
  • the silsesquioxane compound (a) contains at least one cationic polymerizable group.
  • the cation polymerizable group means a group that polymerizes in the presence of an initiator that gives a cation, and specifically includes, for example, an epoxy group (for example, an alicyclic epoxy group, a glycidyl group). Etc.), oxetane ring, vinyl ether group, methylol group, alkoxymethylol group, dioxolane group, trioxane group, styryl group and the like.
  • the silsesquioxane compound (a) is obtained by hydrolytic condensation of a hydrolyzable silane represented by the formula (I) and / or a hydrolyzable silane represented by the formula (II). It is a thing.
  • R 1 represents a divalent alkylene group having 1 to 6 carbon atoms.
  • X is a halogen element or an alkoxy group having 1 to 6 carbon atoms, and the three Xs may be the same or different.
  • R 2 SiX 3 (II) [Formula (II) is a compound other than formula (I), and R 2 represents an optionally substituted monovalent organic group having 1 to 18 carbon atoms.
  • X is a halogen element or an alkoxy group having 1 to 6 carbon atoms, and the three Xs may be the same or different. ].
  • R 1 in the formula (I) is bonded to a silicon atom constituting the silsesquioxane compound.
  • a three-membered ring containing oxygen is generically called an oxirane ring or an epoxy group.
  • the “alicyclic epoxy group” refers to those having an epoxy group in the ring of a cycloaliphatic group such as a cyclohexane ring and a cyclooctane ring, and the silsesquiquine component (a) of the present invention.
  • an alicyclic epoxy group-containing hydrolyzable silane having a structure represented by the formula (I) is used as an essential component.
  • the silsesquioxane compound as the component (a) is excellent in compatibility and reactivity with the iodonium salt photoacid generator, and therefore in the presence of the photoacid generator. And cured by light irradiation. Therefore, the cured coating film obtained by the photocationic curable coating composition of the present invention is excellent in transparency.
  • the alicyclic epoxy group is a part of the cationic photopolymerizable group of the silsesquioxane compound as the component (a) or From the viewpoint of scratch resistance of the cured coating film, the content is preferably 55 to 100 mol%, more preferably 75 to 100 mol%, and particularly preferably 90 to 100 mol%. .
  • R 1 in the formula (I) is not particularly limited as long as it is a divalent hydrocarbon group having 1 to 6 carbon atoms. Specific examples include methylene group, ethylene group, 1,2-propylene group, 1,3-propylene group, 1,2-butylene group, 1,4-butylene group, hexylene group and the like. Among these, a divalent hydrocarbon group having 2 to 4 carbon atoms is preferable from the viewpoint of scratch resistance of the resulting cured coating film.
  • the silsesquioxane compound as component (a) has an alicyclic epoxy group in a specific ratio, but other organic groups are not particularly limited.
  • organic groups examples include organic groups such as alkyl groups such as methyl group and ethyl group, 3-glycidyloxypropyl group, glycidyl group, oxetanyl group, vinyl group and phenyl group. Especially, it is preferable that a glycidyl group, an oxetanyl group, or a methyl group is included from a sclerosing
  • the weight average molecular weight of the silsesquioxane compound (a) is from 1,000 to 100,000, more preferably from 1,000 to 100,000, from the viewpoint of the viscosity and paintability of the photocationic curable coating composition. Within the range of 10,000 is preferred.
  • the weight average molecular weight of the silsesquioxane compound as component (a) is “HLC (registered trademark) -8120GPC” (trade name, manufactured by Tosoh Corporation) as a gel permeation chromatograph.
  • TSKgel registered trademark
  • G4000HXL TSKgel (registered trademark) G4000HXL
  • TSKgel registered trademark) G3000HXL
  • TSKgel registered trademark) G2500HXL
  • TSKgel registered trademark
  • G2000HXL trade names, all manufactured by Tosoh Corporation
  • a total of four lines can be used, and a differential refractometer can be used as a detector, and measurement can be performed under conditions of mobile phase: tetrahydrofuran, measurement temperature: 40 ° C., and flow rate: 1 mL / min.
  • silsesquioxane compound as component (a) can be obtained by combining a production method used for production of general silsesquioxane and a conventionally known chemical reaction. For example, the following production It can be manufactured using a method.
  • Manufacturing method p examples include a production method using a hydrolyzable silane having a photocationically polymerizable group as a starting material.
  • a hydrolyzable silane represented by the above formula (I) as a starting material is subjected to hydrolysis condensation in the presence of a catalyst to produce a silsesquioxane compound as component (a). Is mentioned.
  • R 1 represents a divalent alkylene group having 1 to 6 carbon atoms.
  • examples of the divalent alkylene group having 1 to 6 carbon atoms include methylene group, ethylene group, n-propylene group, isopropylene group, n-butylene group, n-pentylene group, n-hexylene group and the like. Is mentioned.
  • the alkylene group is preferably an alkylene group having 1 to 3 carbon atoms.
  • X is a halogen element or an alkoxy group having 1 to 6 carbon atoms, and the three Xs may be the same or different.
  • examples of the halogen atom include fluorine, chlorine, bromine, iodine and the like.
  • examples of the alkoxy group having 1 to 6 carbon atoms include a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, an n-butoxy group, an isobutoxy group, a tert-butoxy group, and an n-pentyloxy group. And n-hexyloxy group.
  • Specific examples of X include chlorine, methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, isobutoxy group, tert-butoxy group and the like.
  • hydrolyzable silane represented by the formula (I) examples include 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, 2 -(3,4-epoxycyclohexyl) ethyltrichlorosilane and the like.
  • the hydrolyzable silane of the formula (II) other than the hydrolyzable silane represented by the formula (I) may be used, and hydrolytic condensation is performed together with the hydrolyzable silane represented by the formula (I).
  • the silsesquioxane compound is not particularly limited as long as it can produce the compound.
  • R 2 in the formula (II) is preferably a monovalent organic group having 1 to 18 carbon atoms from the viewpoint of scratch resistance, and may be linear or branched, and 1 to 3 (preferably 1 May have a cyclic structure and may contain a urethane bond, an ester bond, an ether bond, or the like.
  • the organic group represented by R 2 includes a hydrocarbon group (an alkyl group having 1 to 18 carbon atoms, an aryl group having 6 to 18 carbon atoms (such as a phenyl group), an alkenyl group having 2 to 18 carbon atoms), Examples thereof include hydrocarbon groups interrupted by the urethane bond, ester bond, ether bond and the like.
  • the number of these bonds is not limited.
  • the number of the above-mentioned bonds per organic group is 1 to 3, preferably 1 Is mentioned.
  • the number of carbon atoms in the organic group includes the number of carbons included in these bonds.
  • the carbon number of the methylcarbamoylethyl group (CH 3 —NH— (C ⁇ O) —O—C 2 H 4 —) is 4, and the propionyloxybutyl group (C 2 H 5 — (C ⁇ O)
  • the number of carbon atoms of —O—C 4 H 8 —) is 7, and the number of carbon atoms of the ethoxypropyl group (C 2 H 5 —O—C 3 H 6 —) is 5.
  • substituents such as an amino group, a glycidyl group, a (meth) acrylate group, and an oxetane ring, in the side chain and / or the terminal.
  • the number of substituents is not limited.
  • the number of the substituents per organic group is 1 to 3, preferably 1.
  • the carbon number of the substituent is not included in the carbon number of the “organic group”.
  • a glycidyl butyl group ((C 2 H 3 O) —C 4 H 8 —) corresponds to a butyl group, which is an organic group having 4 carbon atoms, substituted with one glycidyl group
  • the methyl-4-oxo-hex-5-en-1-yl group (CH 3 — (C ⁇ CH 2 ) — (C ⁇ O) —C 3 H 6 —) is propyl which is an organic group having 3 carbon atoms. This corresponds to a group in which one methacrylate group is substituted.
  • hydrolyzable silane represented by the formula (II) examples include alkyltrialkoxysilanes such as methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, and ethyltriethoxysilane; phenyltrimethoxysilane, phenyltrimethoxysilane, and the like.
  • Phenyltrialkoxysilane such as ethoxysilane; (Meth) acryloyl such as 3- (meth) acryloyloxypropyltrimethoxysilane, 3- (meth) acryloyloxypropyltriethoxysilane, 3- (meth) acryloyloxypropyltrialkoxysilane Oxy group-containing alkyltrialkoxysilane; 3-glycidyloxypropyltrimethoxysilane, glycidyl group-containing alkyltrialkoxysilane such as 3-glycidyloxypropyltriethoxysilane Examples include vinyl group-containing trialkoxysilanes such as vinyltrimethoxysilane and vinyltriethoxysilane; oxetane ring-containing alkyltrialkoxysilanes such as 3-[(3-ethyloxetane-3-yl) methoxy] propyltrimeth
  • methyltrialkoxysilane, glycidyl group-containing alkyltrialkoxysilane, and oxetane ring-containing alkyltrialkoxysilane are preferable from the viewpoint of curability and scratch resistance.
  • silsesquioxane compound (a) those obtained by hydrolytic condensation of a hydrolyzable silane containing the hydrolyzable silane represented by the formula (I) are preferable.
  • the hydrolyzable silane used as the raw material of the silsesquioxane compound (a) may further contain a hydrolyzable silane represented by the formula (II).
  • the containing silsesquioxane compound (a) is: With respect to the total molar mass of the hydrolyzable silane represented by the formula (I) and the formula (II), Hydrolyzable silane 55-100 mol% represented by the formula (I), Hydrolyzable silane represented by the formula (II) 0 to 45 mol%, In particular, from the viewpoint of scratch resistance, the following range is preferable.
  • the hydrolyzable silane represented by the formula (I) is particularly in the range of 80 to 100 mol%, more particularly 90 to 100 mol%, and the hydrolyzable silane represented by the formula (II) is 0 to 20 mol%, more particularly in the range of 0 to 10 mol / g.
  • the amount of the hydrolyzable silane represented by the formula (II) being 0 mol% means that the silane is not used at all.
  • a catalyst can be used when producing the silsesquioxane compound as component (a).
  • a basic catalyst is preferably used.
  • the basic catalyst include alkali metal hydroxides such as potassium hydroxide, sodium hydroxide and cesium hydroxide, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrabutylammonium hydroxide, benzyltrimethyl
  • ammonium hydroxide salts such as ammonium hydroxide and ammonium fluoride salts such as tetrabutylammonium fluoride.
  • the amount of the catalyst used is not particularly limited, but if it is too much, there are problems such as high costs and difficulty in removal, and if it is too small, the reaction may be slow. Therefore, it is preferably in the range of 0.0001 to 1.0 mol, more preferably 0.0005 to 0.1 mol, per mol of hydrolyzable silane.
  • hydrolyzing and condensing hydrolyzable silane water is usually used.
  • the quantity ratio of hydrolyzable silane and water is not particularly limited.
  • the amount of water used is from 0.1 to 100 mol, more preferably from 0.5 to 3 mol, based on 1 mol of hydrolyzable silane in terms of the yield and purity of the silsesquioxane compound having the desired structure. It is preferable to be within the ratio.
  • the water to be used may be substituted with the water, and water may be added separately.
  • an organic solvent may be used. It is preferable to use an organic solvent from the viewpoint of preventing gelation and adjusting the viscosity during production.
  • organic solvent polar organic solvents and nonpolar organic solvents can be used alone or as a mixture.
  • polar organic solvent lower alcohols such as methanol, ethanol and 2-propanol, ketones such as acetone and methyl isobutyl ketone, and ethers such as tetrahydrofuran are used. Particularly, acetone and tetrahydrofuran have a low boiling point and the system is uniform. And the reactivity is improved.
  • nonpolar organic solvent a hydrocarbon solvent is preferable, and an organic solvent having a boiling point higher than that of water such as toluene and xylene is preferable.
  • an organic solvent azeotropic with water such as toluene efficiently removes water from the system. This is preferable because it is possible.
  • mixing a polar organic solvent and a nonpolar organic solvent provides the above-described advantages, so that it is preferably used as a mixed solvent.
  • the reaction temperature during the hydrolytic condensation is usually 0 to 200 ° C., preferably 10 to 190 ° C., more preferably 10 to 120 ° C. Although this reaction can be carried out regardless of pressure, a pressure range of 0.02 to 0.2 MPa is preferable, and a pressure range of 0.08 to 0.15 MPa is particularly preferable.
  • the reaction is usually completed in about 1 to 15 hours.
  • the condensation reaction proceeds with hydrolysis, and most of the hydrolyzable group of the hydrolyzable silane [specifically, for example, X in the formula (I), preferably 100% is hydroxyl. It is possible to condense liquid stability and scratch resistance by hydrolysis to a group (OH group) and further condensing most of the OH group, preferably 80% or more, more preferably 90% or more, and particularly preferably 100%. To preferred.
  • the alcohol, solvent, and catalyst generated by the reaction may be removed from the mixed solution after hydrolysis condensation by a known method.
  • the obtained product may be further purified by removing the catalyst by various purification methods such as washing, column separation, and adsorption with a solid adsorbent according to the purpose. From the viewpoint of efficiency, it is preferable to remove the catalyst by washing with water.
  • the product obtained by this production method includes a silsesquioxane compound having a structure in which all Si—OH groups (hydroxysilyl groups) are hydrolyzed and condensed.
  • a silsesquioxane compound having a ladder structure in which Si—OH groups remain, an incomplete cage structure, and / or a random condensate may be included, and is a component (A) obtained by this production method.
  • the silsesquioxane compound may contain these ladder structures, incomplete cage structures, and / or random condensates.
  • the silsesquioxane compound as the component (a) obtained by the above production method has a ratio of the silsesquioxane compound having a structure in which all Si—OH groups are hydrolyzed and condensed, preferably 80% by mass or more, More preferably, it is 90% by mass or more from the viewpoint of liquid stability and scratch resistance.
  • the photocationic curable coating composition of the present invention contains an iodonium salt photoacid generator (b).
  • the iodonium salt-based photoacid generator (b) is a compound that generates a cation (acid) by light and can serve as an initiator for cationic polymerization.
  • the photoacid generator (b) is preferably an iodonium salt photoacid generator represented by the following formula (III). *
  • R 3 represents an organic group bonded to I (iodine atom), and two R 3 s may be the same or different from each other.
  • [Y] ⁇ is a phosphate anion represented by the formula (IV) or a boron compound anion represented by the formula (V), and Rf in the formula (IV) is fluorine in which all or part of the hydrogen atoms are fluorine.
  • An alkyl group which may be substituted with an atom is represented.
  • b is an integer of 0 to 5. The b Rf's may be the same or different.
  • R 3 is an aryl group having 6 to 30 carbon atoms, a heterocyclic group having 4 to 30 carbon atoms, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or an alkynyl group having 2 to 30 carbon atoms.
  • the aryl group having 6 to 30 carbon atoms includes monocyclic aryl groups such as phenyl groups and condensed naphthyl, anthracenyl, phenanthrenyl, pyrenyl, chrysenyl, naphthacenyl, benzanthracenyl, anthraquinolyl, fluorenyl, naphthoquinone, anthraquinone, etc. And a polycyclic aryl group.
  • heterocyclic group having 4 to 30 carbon atoms examples include cyclic groups containing 1 to 3 heteroatoms such as oxygen, nitrogen and sulfur, which may be the same or different.
  • monocyclic heterocyclic groups such as thienyl, furanyl, pyranyl, pyrrolyl, oxazolyl, thiazolyl, pyridyl, pyrimidyl, pyrazinyl and indolyl, benzofuranyl, isobenzofuranyl, benzothienyl, isobenzothienyl, quinolyl, isoquinolyl, quinoxalinyl, quinazolinyl , Carbazolyl, acridinyl, phenothiazinyl, phenazinyl, xanthenyl, thiantenyl, phenoxazinyl, phenoxathinyl, chromanyl, isochromanyl, dibenzothienyl,
  • alkyl group having 1 to 30 carbon atoms examples include linear alkyl groups such as methyl, ethyl, propyl, butyl, hexadecyl, okdadecyl, isopropyl, isobutyl, sec-butyl, tert-butyl, isopentyl, neopentyl, tert-pentyl, isohexyl, etc.
  • a cycloalkyl group such as cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl.
  • alkenyl group having 2 to 30 carbon atoms examples include linear or branched such as vinyl, allyl, 1-propenyl, isopropenyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-methyl-1-propenyl Can be mentioned.
  • alkynyl group having 2 to 30 carbon atoms examples include linear or branched ethynyl, 1-propynyl, 2-propynyl, 1-butynyl, 2-butynyl, 3-butynyl, 1-methyl-2-propynyl and the like. Things.
  • the aryl group having 6 to 30 carbon atoms, the heterocyclic group having 4 to 30 carbon atoms, the alkyl group having 1 to 30 carbon atoms, the alkenyl group having 2 to 30 carbon atoms, or the alkynyl group having 2 to 30 carbon atoms is at least 1
  • the substituent may include a linear alkyl group having 1 to 18 carbon atoms such as methyl, ethyl, propyl, butyl, okdadecyl; isopropyl, isobutyl, sec-butyl, tert-butyl A branched alkyl group having 1 to 18 carbon atoms; a cycloalkyl group having 3 to 18 carbon atoms such as cyclopropyl, cyclobutyl, cyclopentyl and cyclohexyl; a hydroxy group; methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, sec-butoxy, straight-
  • arylthio groups having 6 to 20 carbon atoms; methylthio, ethylthio, propylthio, tert-butylthio, neopentylthio, dodecylthio, etc.
  • a heterocyclic group having 4 to 20 carbon atoms such as nyl; an aryloxy group having 6 to 10 carbon atoms such as phenoxy and naphthyloxy; methylsulfinyl, ethylsulfinyl, propylsulfinyl, tert-pentylsulfinyl, octylsulfur Linear or branched alkylsulfinyl groups having 1 to 18 carbon atoms such as ynyl; arylsul
  • iodonium cation examples include diphenyliodonium, di-p-tolyliodonium, bis (4-dodecylphenyl) iodonium, bis (4-methoxyphenyl) iodonium, bis (4-ethoxyphenyl) iodonium, (4-octyloxy Phenyl) phenyliodonium, bis (4-decyloxy) phenyliodonium, 4- (2-hydroxytetradecyloxy) phenylphenyliodonium, 4-isopropylphenyl (p-tolyl) iodonium, 4-isobutylphenyl (p-tolyl) iodonium, etc. Iodonium ion.
  • Rf represents an alkyl group in which all or part of the hydrogen atoms may be substituted with fluorine atoms.
  • the alkyl group include linear alkyl groups such as methyl, ethyl, propyl, butyl, pentyl and octyl; branched alkyl groups such as isopropyl, isobutyl, sec-butyl and tert-butyl; and cyclopropyl, cyclobutyl and cyclopentyl.
  • a cycloalkyl group such as cyclohexyl, etc., and a preferable carbon number is 1 to 4.
  • all or part of the hydrogen atoms may be substituted with fluorine atoms, and the substitution ratio is 80% or more, more preferably 90% or more, particularly 100% from the viewpoint of polymerization curability and scratch resistance. It is preferable that
  • Rf is a linear or branched alkyl group having 1 to 4 carbon atoms and a fluorine atom substitution rate of 100%.
  • Specific examples include CF 3 , CF 3 CF 2 , (CF 3 ) 2 CF , CF 3 CF 2 CF 2, CF 3 CF 2 CF 2 CF 2, (CF 3) 2 CFCF 2, CF 3 CF 2 (CF 3) CF, include (CF 3) 3 C.
  • particularly preferred Rf is a linear or branched unsubstituted alkyl group having 1 to 4 carbon atoms, and specific examples include CH 3 , CH 3 CH 2 , (CH 3 ) 2. CH, CH 3 CH 2 CH 2 , CH 3 CH 2 CH 2 CH 2, (CH 3) 2 CHCH 2, CH 3 CH 2 (CH 3) CH, include (CH 3) 3 C.
  • [Y] ⁇ is preferably a phosphate anion represented by formula (IV).
  • the number b of Rf is an integer of 0 to 5, more preferably 1 to 4, more preferably 2 or 3, from the viewpoint of scratch resistance.
  • the b Rf's may be the same or different.
  • preferred phosphate anions include fluorinated phosphate anions ([PF 6 ] ⁇ ), [(CF 3 CF 2 ) 3 PF 3 ] ⁇ , [(CF 3 CF 2 CF 2 ) 3 PF 3 ] ⁇ , [((CF 3 ) 2 CF) 3 PF 3 ] ⁇ , [((CF 3 ) 2 CF) 2 PF 4 ] ⁇ , [((CF 3 ) 2 CFCF 2 ) 3 PF 3 ] ⁇ and Fluorinated alkyl phosphate anions such as [((CF 3 ) 2 CFCF 2 ) 2 PF 4 ] — and the like can be mentioned.
  • the anionic species is particularly preferably a fluorinated alkyl phosphate anion.
  • particularly preferred phosphate anions include ([PF 6 ] ⁇ ) and [(CH 3 CH 2 ) 3 PF 3 ] ⁇ , [(CH 3 CH 2 CH 2 ) 3 PF 3 ] ⁇ , [((CH 3 ) 2 CH) 3 PF 3 ] ⁇ , [((CH 3 ) 2 CH) 2 PF 4 ] ⁇ , [((CH 3 ) 2 CHCH 2 ) 3 PF 3] - and [((CH 3) 2 CHCH 2) 2 PF 4] - , and the like fluorinated alkyl phosphate anion, such as.
  • iodonium salt photoacid generator (b) a commercially available product can be used.
  • Irgacure (registered trademark) 250 trade name, fluorinated iodonium phosphate salt manufactured by BASF
  • IK-1 examples include San Apro, trade name, fluorinated alkyl phosphate iodonium salt
  • PI-2074 Rhone Plan, trade name, fluorinated phenyl borate iodonium salt
  • the photoacid generator may be dissolved in advance in a solvent that does not inhibit cationic polymerization. .
  • Solvents include carbonates such as propylene carbonate, ethylene carbonate, 1,2-butylene carbonate, dimethyl carbonate and diethyl carbonate; ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl isoamyl ketone and 2-heptanone; ethylene glycol, ethylene glycol Multivalents such as monoacetate, diethylene glycol, diethylene glycol monoacetate, propylene glycol, propylene glycol monoacetate, dipropylene glycol, and dipropylene glycol monoacetate monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether, or monophenyl ether Alcohols and derivatives thereof; cyclic amines such as dioxane Ethyl formate, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, methyl ace
  • the blending ratio of the photoacid generator (b) is preferably in the range of 0.1 to 15 parts by mass, more preferably 0.5 to 8 parts by mass with respect to 100 parts by mass of the total weight of the component (a).
  • photocationic curable coating composition of the present invention may further contain other photocationically polymerizable group-containing compound (c).
  • the other photocationically polymerizable group-containing compound (c) is a compound other than the component (a), which is ionically polymerized using a cation as a chain carrier (growth seed).
  • a compound having one or more photocationically polymerizable groups particularly an epoxy group-containing compound and / or an oxetane compound in which the photocationically polymerizable group is an epoxy group and / or an oxetane ring.
  • the epoxy group include an oxiranyl group, a glycidyl group, and an alicyclic epoxy group (such as an epoxycycloalkyl group).
  • the compound examples include a glycidyl group-containing compound having one or more glycidyl groups, and an oxetane ring.
  • An oxetane compound having one or more, an epoxy group-containing oxetane compound having at least one oxetane ring and an epoxy group hereinafter referred to as an epoxy group-containing oxetane compound
  • an alicyclic epoxy having at least one alicyclic epoxy group It is preferably at least one selected from the group-containing compound group.
  • the glycidyl group-containing compound is a compound having at least one glycidyl group in the molecule, and examples of the compound having one glycidyl group include phenyl glycidyl ether and butyl glycidyl ether, and a compound having two or more epoxy groups.
  • Contains ethylene glycol diglycidyl ether, hexanediol diglycidyl ether, tetraethylene glycol diglycidyl ether, trimethylolpropane triglycidyl ether, bisphenol A diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, novolac type epoxy compound, glycidyl group An acrylic resin etc. are mentioned.
  • the glycidyl group-containing acrylic resin is, for example, a glycidyl group-containing polymerizable unsaturated monomer (hereinafter sometimes abbreviated as “glycidyl monomer”) and, if necessary, other polymerizable monomers copolymerizable with these monomers. It is obtained by copolymerizing a saturated monomer (hereinafter, sometimes abbreviated as “other monomer”).
  • any polymerizable unsaturated monomer containing a glycidyl group can be used without particular limitation.
  • Typical examples thereof include glycidyl acrylate, glycidyl methacrylate, methyl glycidyl acrylate, methyl glycidyl methacrylate, and allyl glycidyl.
  • examples thereof include ether and vinyl glycidyl ether. Of these, glycidyl acrylate and glycidyl methacrylate are preferably used.
  • the other monomer copolymerizable with the glycidyl monomer is a monomer that is appropriately used as required according to the intended performance of the resulting glycidyl group-containing acrylic resin, such as methyl acrylate, methyl methacrylate, ethyl Acrylate, ethyl methacrylate, n-, i- or t-butyl acrylate, n-, i- or t-butyl methacrylate, hexyl acrylate, hexyl methacrylate, octyl acrylate, octyl methacrylate, lauryl acrylate, lauryl methacrylate, stearyl acrylate, stearyl C1-C24 alkyl or cycloalkyl ester of acrylic acid or methacrylic acid such as methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, etc.
  • acrylic acid or methacrylic acid such as 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate Hydroxyalkyl esters; ⁇ , ⁇ -ethylenically unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic acid, itaconic acid, crotonic acid; acrylamide, methacrylamide, N-methyl acrylamide, N-ethyl methacrylamide, diacetone acrylamide N-methylolacrylamide, N-methylolmethacrylamide, N-methoxymethylacrylamide, N-butoxymethylacrylamide, etc.
  • acrylic acid or methacrylic acid such as 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 4-hydroxybutyl acrylate, 4-
  • Rilamide or derivatives thereof aromatic vinyl monomers such as styrene, vinyltoluene, ⁇ -methylstyrene; vinyl propionate, vinyl acetate, acrylonitrile, methacrylonitrile, vinyl pivalate, and veova monomer (made by Shell Chemical Co., vinyl of branched fatty acids) Ester), Silaplane (registered trademark) FM0711, FM0721, FM0721 (all of which are manufactured by Chisso Corp., polydimethylsiloxane macromonomer having a methacryloyl group at the end). . Of these monomers, styrene and methyl methacrylate are particularly preferred.
  • the glycidyl group-containing acrylic resin is a solution polymerization, bulk polymerization, emulsion polymerization, suspension polymerization of the monomer component consisting of the above glycidyl monomer and other monomers as required, for example, in the presence or absence of a radical polymerization initiator. It can obtain by superposing
  • the glycidyl group-containing acrylic resin preferably has a weight average molecular weight in the range of 1,000 to 100,000, particularly 2,000 to 50,000.
  • the blending ratio of each monomer component in the polymerization of the glycidyl group-containing acrylic resin is preferably within the following range with respect to 100 parts by mass of the total amount of monomer components.
  • Glycidyl monomer 10 to 100 parts by mass, preferably 20 to 80 parts by mass, Other monomers: 0 to 90 parts by mass, preferably 20 to 80 parts by mass.
  • the concentration of glycidyl groups is preferably in the range of 0.1 to 7.0 equivalent / kg, particularly 0.2 to 5.0 equivalent / kg.
  • the oxetane compound is a compound having at least one oxetane ring in the molecule, and is preferably a compound having 1 to 3 oxetane rings.
  • Compounds having one oxetane ring include 3-ethyl-3-methoxymethyloxetane, 3-ethyl-3-ethoxymethyloxetane, 3-ethyl-3-butoxymethyloxetane, 3-ethyl-3-hexyloxymethyloxetane, 3-methyl-3-hydroxymethyloxetane, 3-ethyl-3-hydroxymethyloxetane, 3-ethyl-3-allyloxymethyloxetane, 3-ethyl-3- (2'-hydroxyethyl) oxymethyloxetane, 3- Ethyl-3- (2′-hydroxy-3′-phenoxypropyl) oxymethyloxetane, 3-ethyl-3- (2′-hydroxy-3′-butoxypropyl) oxymethyloxetane, 3-ethyl-3- [2 '-(2 "-ethoxyethyl) oxymethyl] oxet
  • the compound having two or more oxetane rings is a compound having at least two oxetane rings capable of photocationic polymerization (hereinafter referred to as a polyoxetane compound).
  • a polyoxetane compound for example, di [1-ethyl (3-oxetanyl)] methyl ether; xylylene bisoxetane; reaction product of 3-lower alkyl-3-hydroxyoxetane and polyisocyanate compound; 3-lower alkyl-3-hydroxyoxetane and alcohol A reaction product of 3-lower alkyl-3-hydroxyoxetane with a polycarboxylic acid, and the like.
  • the 3-lower alkyl-3-hydroxyoxetane include 3-methyl-3-hydroxymethyloxetane and 3-ethyl-3-hydroxymethyloxetane.
  • the epoxy group-containing oxetane compound is a compound having one or more oxetane rings and epoxy groups in the molecule (hereinafter referred to as an epoxy group-containing oxetane compound), preferably including a compound having a molecular weight of less than 1,000, Specific examples include compounds represented by the following formula (VI).
  • R 4 represents a hydrogen atom, a fluorine atom, a linear or branched alkyl group having 1 to 6 carbon atoms, a linear or branched fluoroalkyl group having 1 to 6 carbon atoms, or an allyl group
  • R 5 represents an epoxy group
  • a typical example of the epoxy-containing oxetane compound is a compound in the above formula (VI) in which R 4 is an ethyl group and R 5 is a glycidyl group or a 3,4-epoxycyclohexylmethyl group.
  • the alicyclic epoxy group-containing compound is a compound having at least one such alicyclic epoxy group in the molecule and is a compound other than the compound (a), and preferably has 2 to 3 alicyclic epoxy groups. And a compound having a weight average molecular weight of less than 2,000 and more preferably 100 to 1,500.
  • the alicyclic epoxy group-containing compound preferably has an epoxy equivalent of 50 to 500 g / equivalent, particularly 100 to 300 g / equivalent, from the viewpoint of reaction rate.
  • the epoxy equivalent is the number of grams of resin containing 1 gram equivalent of an epoxy group measured by a method according to JIS K7236.
  • alicyclic epoxy group-containing compound examples include dicyclopentadiene dioxide, bis (2,3-epoxycyclopentyl) ether, epoxycyclohexenecarboxylic acid ethylene glycol diester, bis (3,4-epoxycyclohexylmethyl) adipate Bis (4,5-epoxy-2-methylcyclohexylmethyl) adipate, ethylene glycol-bis (3,4-epoxycyclohexanecarboxylate), 3 ′, 4′-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate 3,4-epoxy-6-methylcyclohexylmethyl-3,4-epoxy-6-methylcyclohexanecarboxylate, 1,2,5,6-diepoxy-4,7-methanoperhydroindene, 2- (3, 4- Epoxycyclohexyl) -3 ', 4'-epoxy-1,3-dioxane-5-
  • Celoxide (registered trademark) 2000 Celoxide (registered trademark) 2021P
  • Celoxide (registered trademark) 2081 Celoxide (registered trademark) 3000 (all , Trade name, manufactured by Daicel Chemical Industries, Ltd.).
  • photocationically polymerizable group-containing compound (c) in addition to the above compound group, for example, butyl vinyl ether, isobutyl vinyl ether, octadecyl vinyl ether, cyclohexyl vinyl ether, butanediol monovinyl ether, butanediol divinyl ether, cyclohexanedimethanol Divinyl ether, cyclohexanedimethanol monovinyl ether, diethylene glycol divinyl ether, ethylene glycol divinyl ether, ethylene glycol monovinyl ether, diethylene glycol monovinyl ether, triethylene glycol divinyl ether, triethylene glycol monovinyl ether, tetraethylene glycol divinyl ether, tetraethylene glycol monovinyl ether Tert-butyl vinyl ether, tert-acyl vinyl ether, ethylhexyl vinyl ether, dode
  • the content of the other photocationically polymerizable compound (c) is preferably 50 parts by mass or less and 30 parts by mass or less with respect to 100 parts by mass of the component (a) from the viewpoint of curling resistance.
  • the photocationic curable coating composition of the present invention may be solventless or may further contain an organic solvent. *
  • organic solvent examples include alcohol solvents such as methanol, ethanol, butanol, methyl isobutyl carbinol, 2-ethyl hexanol and benzyl alcohol; ketone solvents such as acetone and methyl isobutyl ketone; ethyl acetate, butyl acetate, methyl benzoate, Ester solvents such as methyl propionate; ether solvents such as cyclohexanone, tetrahydrofuran, dioxane, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, isopropyl glycol; diethylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3 -Glycol ether aromatic hydrocarbon solvents such as methoxybutyl acetate, aliphatic hydrocarbons Agents. These can be used in appropriate combination depending on the purpose such as adjustment of viscosity and adjustment
  • organic solvents it is preferable to use an organic solvent having a boiling point of 100 ° C. or less from the viewpoint of finish and curability.
  • organic solvents it is preferable to use at least one selected from dimethoxyethane.
  • composition of the present invention may further contain a sensitizer (d).
  • the sensitizer (d) usually absorbs at a wavelength longer than the maximum absorption wavelength indicated by the iodonium salt photoacid generator (b), and initiates polymerization by the iodonium salt photoacid generator (b). It is a compound that promotes.
  • the sensitizer (d) is preferably a compound that absorbs light having a wavelength longer than 350 nm.
  • the iodonium salt-based photoacid generator (b) usually exhibits maximum absorption at a wavelength near or shorter than 300 nm, generates a cationic species or a Lewis acid in response to light at a wavelength near the iodonium salt photoacid generator, Cationic polymerization of the oxan compound (a) is initiated, but if the sensitizer (d) as described above is added, it will be sensitive to light having a longer wavelength, particularly longer than 350 nm. .
  • Examples of the sensitizer (d) include anthracene sensitizers and thioxanthone sensitizers.
  • anthracene sensitizer examples include, for example, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 9,10-dipropoxyanthracene, 9,10-diisopropoxyanthracene, 9,10-dibutoxyanthracene, 9,10-dipentyloxyanthracene, 9,10-dihexyloxyanthracene, 9,10-bis (2-methoxyethoxy) anthracene, 9,10-bis (2-ethoxyethoxy) anthracene, 9,10-bis (2-butoxyethoxy) anthracene, 9,10-bis (3-butoxypropoxy) anthracene, 2-methyl- or 2-ethyl-9,10-dimethoxyanthracene, 2-methyl- or 2-ethyl-9,10-diethoxyanthracene, 2-methyl- or 2-ethyl-9,10-dipropoxyanthracene, 2-
  • thioxanthone sensitizer examples include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, chloropropoxythioxanthone, and the like.
  • a commercial item can be used as said sensitizer (d).
  • Examples of commercially available anthracene sensitizers include “Anthracure (registered trademark) UVS-1331”, “Anthracure (registered trademark) UVS-1221” (manufactured by Kawasaki Kasei Kogyo Co., Ltd.) and the like.
  • Examples of commercially available thioxanthone sensitizers include “KAYACURE (registered trademark) DETX-S” (manufactured by Nippon Kayaku Co., Ltd.), “Speedcure (registered trademark) ITX”, and “Speedcure (registered trademark) DETX”. "Speedcure (registered trademark) CPTX” (manufactured by LAMBSON).
  • an anthracene sensitizer is preferably used as the sensitizer (d).
  • the solid content of the sensitizer is selected from the above-mentioned sills from the viewpoint of the scratch resistance of the formed coating film and the storage stability of the coating composition. It is in the range of 0.01 to 10 parts by weight, preferably 0.05 to 8 parts by weight, more preferably 0.1 to 5 parts by weight with respect to 100 parts by weight of the solid content of the sesquioxane compound (a). Is preferred.
  • composition of the present invention may further contain an auxiliary sensitizer (e).
  • auxiliary sensitizer (e) is a compound that further promotes the action of the sensitizer.
  • the auxiliary sensitizer (e) is not particularly limited, and various types can be used.
  • a naphthalene-based auxiliary sensitizer can be preferably used.
  • Specific examples of the naphthalene-based auxiliary sensitizer include, for example, 4-methoxy-1-naphthol, 4-ethoxy-1-naphthol, 4-propoxy-1-naphthol, 4-butoxy-1-naphthol, 4-hexyloxy-1-naphthol, 1,4-dimethoxynaphthalene, 1-ethoxy-4-methoxynaphthalene, 1,4-diethoxynaphthalene, 1,4-dipropoxynaphthalene, Examples thereof include 1,4-dibutoxynaphthalene.
  • the solid content of the auxiliary sensitizer (e) depends on the scratch resistance of the formed coating film and the storage of the coating composition. From the viewpoint of stability, 0.01 to 10 parts by mass, preferably 0.05 to 8 parts by mass, and more preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the solid content of the silsesquioxane compound (a). It is preferable to be within the range of 5 parts by mass.
  • the composition of the present invention may further contain various additives, saturated resins and the like.
  • the additive include a thermal acid generator, an ultraviolet absorber, a light stabilizer, a polymerization inhibitor, an antioxidant, an antifoaming agent, a surface conditioner, a flow conditioner, a plasticizer, and a colorant.
  • the saturated resin include a saturated acrylic resin, a saturated polyester resin, a saturated urethane resin, these gel particles, and fine particle powder.
  • the non-volatile content of the photocationic curable coating composition of the present invention is not particularly limited, but is 20 to 100% by mass, and further 25 to 70% from the viewpoint of smoothness of the coating film and shortening of the drying time. Within the range of mass% is preferable.
  • the non volatile matter of the cation curable coating composition of this invention is the value which totaled the mass of all the components mix
  • the photocationic curable coating composition of the present invention has a coating film surface when a cured coating film having a thickness of 5 ⁇ m is formed on an acrylic resin plate having a thickness of 3 mm.
  • a coating film having a Martens hardness measured at 20 mN of 0.5 to 350 N / mm 2 can be formed.
  • the “acrylic resin plate having a thickness of 3 mm” means a plate made by Mitsubishi Rayon Co., Ltd. and Acrylite (registered trademark) L001 having a thickness of 3 mm.
  • the Martens hardness is 150 to 340 N / mm 2 and the elastic recovery rate of the coating film is 70% or more.
  • the elastic recovery rate is preferably 74% or more, more preferably 83% or more from the viewpoint of scratch resistance.
  • “Martens hardness (HM)” in the present invention is the hardness of the coating film obtained from the test load and the indentation surface area when indented from the surface of the coating film by the Vickers indenter, and is an index of the hardness of the object surface.
  • the “elastic recovery rate ( ⁇ IT)” in the present invention is a numerical representation of how much the recessed coating film returns, and is the ratio of elastic work (elastic deformation / total deformation).
  • the ratio of the elastic work amount can also be stopped by (W elast / W total ) ⁇ 100.
  • W elast is the work of elastic recovery [ Nmm ]
  • W total is the total indentation work [Nmm].
  • the numerical value of each work amount can be measured and determined together with the Martens hardness measurement.
  • a coating film having a large “elastic recovery rate” has elasticity and good scratch resistance.
  • a coating film having a Martens hardness of the coating film formed by the present coating composition, and more preferably an elastic recovery rate in the above range or more, has an appropriate balance between hardness and elasticity, and scratched the coating film. Sometimes, even if the scar is recovered, it is easy to return to the original coating state, and the scratch resistance is extremely excellent.
  • the cured coating is a cured and dried state as defined in JIS K 5600-1-1 (2004), that is, the center of the coating surface is strongly sandwiched between the thumb and index finger, and the coating surface is dented by a fingerprint. It is a coating film in which the movement of the coating film is not felt, the center of the coating surface is rapidly rubbed with a fingertip, and the coating surface is not rubbed.
  • the uncured coating film is a state where the coating film has not reached the above-mentioned cured and dried state, and includes a dry-to-touch state and a semi-cured and dried state as defined in JIS K 5600-1-1.
  • the photocationic curable coating composition is applied on the object to be coated so that the dry film thickness is 1 to 10 ⁇ m, and setting and / or After preheating, light irradiation is performed.
  • This step of setting and / or preheating is performed to reduce the volatile content of the coating film immediately after coating or to remove the volatile content, and can be performed by an air blow, an IR furnace or the like.
  • Setting can usually be performed by leaving the coated article to stand in a dust-free atmosphere at room temperature for 30 to 600 seconds.
  • Preheating (preheating) can be usually performed by heating the coated article in a drying furnace at a temperature of 40 to 90 ° C., preferably 50 to 70 ° C. for 1 to 30 minutes.
  • air blow can be usually performed by blowing air heated to a normal temperature or a temperature of 25 ° C. to 80 ° C. on the coated surface of the object to be coated.
  • the preheating time can usually be 30 seconds to 600 seconds.
  • the heating temperature condition at the time of performing the preheating is not particularly limited, but the component that volatilizes by heat, for example, the other photocationically polymerizable compound (c) contains a low boiling point compound ( In the case of containing less than 150 ° C.), the heating temperature is preferably less than 70 ° C., more preferably 40 ° C. to 70 ° C.
  • heat from a light source for example, heat generated by a lamp
  • the light irradiation may be performed in a state where the object to be coated is heated (a state having residual heat).
  • a primer layer, an electrodeposition coating layer, an intermediate coating layer, a top coating layer, etc. are formed in advance by applying a primer coating, a cationic electrodeposition coating, an intermediate coating, a top coating, etc. May be.
  • the dry film thickness is preferably in the range of 1 to 10 ⁇ m, more preferably 1 to 8 ⁇ m, in view of the appearance and curability of the coating film, scratch resistance, and curl resistance.
  • the curling property can be observed in terms of the degree of cure shrinkage of the coating composition.
  • the coating plate after the photocationic curable coating composition is formed on the surface of the plastic substrate is placed on a horizontal table with the coating surface facing up. Then, the distance (lifting distance) between the four corners of the test piece and the horizontal table can be measured and evaluated by the total length. The smaller the shrinkage during curing, the smaller the total length and the better the curl resistance.
  • the light irradiation source in the light irradiation step is not particularly limited, and is an ultrahigh pressure, high pressure, medium pressure, low pressure mercury lamp, chemical lamp, KrF excimer laser, ArF excimer laser, extreme ultraviolet (EUV: Extreme). Examples thereof include an Ultra Violet lamp, an X-ray, and an electron beam (e-beam), a carbon arc lamp, a xenon lamp, a metal halide lamp, a fluorescent lamp, an LED (light emitting diode) lamp, a tungsten lamp, and the sun.
  • the said irradiation source can be used individually or in combination of 2 or more types.
  • the light referred to in the present invention includes sunlight, laser light, radiated light (infrared rays, visible rays, ultraviolet rays, ⁇ rays, ⁇ rays, X rays) and the like, and is not particularly limited to visible rays.
  • the light has a function of activating a compound that generates a cation (acid) by light irradiation and advancing a cation polymerization reaction.
  • Irradiation amount varies depending radiation source, for example, when using a high pressure mercury lamp, 10 ⁇ 500mJ / cm 2 in the integrated irradiation dose, it is possible to further curing in the range of 50 ⁇ 120mJ / cm 2.
  • the light irradiation may be performed in an air atmosphere or an inert gas atmosphere.
  • a step of heating the coating film after light irradiation may be provided.
  • the distortion of the coating film generated by curing the coating film by light irradiation can be alleviated.
  • the heating may improve the hardness or adhesion of the coating film.
  • the heating temperature is preferably within the temperature range shown above.
  • the product form of the article in which the film is formed with the photocationic curable coating composition of the present invention is not particularly limited. However, since it has excellent transparency and scratch resistance, it can be particularly suitably used as a hard coat agent. .
  • Article to be coated (a) an acrylic resin plate: 100 ⁇ 150 mm having a thickness of 3mm was cut into an acrylic resin plate (Mitsubishi Rayon Co., Ltd. ACRYLITE (R) L001, a methacrylic resin plate [polymethyl methacrylate and methyl methacrylate An article to be coated (a) was obtained by degreasing a copolymer of n-butyl acrylate with a content of 88% or more] with isopropyl alcohol.
  • PET resin sheet A4 size, 100 ⁇ m thick polyethylene terephthalate resin sheet (trade name “Cosmo Shine (registered trademark) A4100” manufactured by Toyobo Co., Ltd.) was used as the article to be coated (b).
  • Coating film formation method (A) After coating each cationic curable coating composition on a coated material with a bar coater under a condition that the film thickness after curing is 5 ⁇ m, and preheating at 60 ° C. for 30 seconds to remove the solvent. Then, ultraviolet rays (peak top wavelength 365 nm) were irradiated with an ultraviolet irradiation device under the condition of an integrated irradiation amount of 100 mJ / cm 2 to obtain a cured coating film.
  • UV irradiation device belt conveyor type UV irradiation device
  • Lamp 240 W / cm 2 high-pressure mercury lamp (1 lamp number) (Heraeus Noblelight Fusion Ubuy Co., Ltd.)
  • Lamp output 60% Illuminance (measured with UV integrated light meter UIT (registered trademark) -250, photoreceiver UVD-C365 (manufactured by USHIO INC.)): 140 mW / cm 2 ⁇
  • Irradiation distance 10cm ⁇
  • UV-LED 96 lamps
  • Illuminance measured with UV integrated light meter UIT-250, receiver UVD-C365
  • Irradiation distance 1cm
  • Integrated irradiation dose measured with UV integrated light meter UIT-250, photoreceiver UVD-C365
  • conveyor speed Speed 2 m / min Total irradiation dose equivalent to 500 mJ / cm 2 .
  • Example (Example 1) Photocationic curable coating composition No. 1 A 50% nonvolatile solution of the product (A-1) obtained in Production Example 1, a photoacid generator (Note 1) of the following formula (B-1), and BYK-333 (Note 10) in a mass ratio of 100 5: 0.1, diluted with methyl ethyl ketone to a non-volatile content of 40%, stirred, and photocationic curable coating composition No. 1 was produced.
  • Table 2 shows the blending amount of each component by mass ratio.
  • a cured coating film obtained by curing the obtained photocationic curable coating composition by the coating film forming method (a) was allowed to stand for 1 hour in an atmosphere of 23 ° C. and 50% relative humidity within 30 minutes after curing.
  • the plate was used as a test plate.
  • the coating film had a Martens hardness (Note 11) of 245 N / mm 2 and an elastic recovery rate (Note 12) of 81%.
  • Table 2 also shows the Martens hardness and the elastic recovery rate of the coating film obtained by curing the obtained photocationic curable coating composition.
  • the notes in the table are as follows. (Note 1)
  • Photoacid generator No. B-1 An iodonium salt-based photocationic polymerizable initiator represented by the above formula (B-1), (Note 2)
  • Photoacid generator No. B-2 an iodonium salt-based photocationic polymerizable initiator represented by the above formula (B-2), (Note 3)
  • Photoacid generator No. B-3 An iodonium salt-based photocationically polymerizable initiator represented by the above formula (B-3), (Note 4)
  • Photoacid generator No. B-4 a sulfonium salt-based photocationically polymerizable initiator represented by the above formula (B-4), (Note 5)
  • Component C-1 Celoxide (registered trademark) 2012P (trade name, manufactured by Daicel Corporation, compound represented by the following formula C-1, epoxy equivalent of 118 to 145 g / equivalent.
  • Component C-2 Aron Oxetane (registered trademark) OXT-221 (trade name, manufactured by Toagosei Co., Ltd., compound represented by the following formula (C-2), boiling point 119 ° C./0.67 kPa ,
  • ⁇ Measurement procedure> (1-1) Load is applied until the load reaches 10 mN at a speed of 20 mN / 25 seconds. (1-2) Unloading until the load reaches 0.4mN at the same speed. The above procedure was repeated while changing the measurement position, and three data points were taken for each sample.
  • Example 19 On the object to be coated (b), the photocation curable coating composition No. 1 obtained in Example 1 was used. 1 was applied, and the coated sheet cured by the method of the coating film forming method (a) was left as it was for 1 hour in an atmosphere of 23 ° C. and 50% relative humidity within 30 minutes after curing as a test sample, It used for various evaluation. The evaluation results are shown in Table 3.
  • Example 19 test samples were prepared and subjected to various evaluations in the same manner as in Example 19 except that the objects to be coated, the coating film forming method, and the cured film thickness were those described in Table 3. The evaluation results are shown in Table 3. The notes in the table are as follows.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Molecular Biology (AREA)
  • Paints Or Removers (AREA)
  • Epoxy Resins (AREA)
  • Silicon Polymers (AREA)

Abstract

The present invention addresses the problem of providing: a cationically photocurable coating composition which has excellent transparency and provides a cured coating film having excellent curling resistance and excellent scratch resistance; and a method for forming a coating film. The present invention provides a cationically photocurable coating composition which contains a silsesquioxane compound (a) and an iodonium salt-based photoacid generator (b). The cationically photopolymerizable group-containing silsesquioxane compound (a) is obtained by hydrolysis-condensation of a hydrolyzable silane compound represented by formula (I) or a mixture of a hydrolyzable silane compound represented by formula (I) and a hydrolyzable silane compound represented by formula (II). With respect to the blending ratio of the mixture of a hydrolyzable silane compound represented by formula (I) and a hydrolyzable silane compound represented by formula (II), the ratio of the hydrolyzable silane compound represented by formula (I) is 55-100% by mole and the ratio of the hydrolyzable silane compound represented by formula (II) is 0-45% by mole based on the total amount of the hydrolyzable silane compounds represented by formula (I) and/or formula (II).

Description

光カチオン硬化性塗料組成物及び塗膜形成方法、その塗装物品Photocationic curable coating composition, coating film forming method, and coated article thereof
 [関連出願の相互参照]
 本出願は、2013年10月11日に出願された、日本国特許出願第2013-213328号明細書(その開示全体が参照により本明細書中に援用される)に基づく優先権を主張する。
[Cross-reference of related applications]
This application claims priority based on Japanese Patent Application No. 2013-213328 filed on Oct. 11, 2013, the entire disclosure of which is incorporated herein by reference.
 本発明は、光カチオン硬化性塗料組成物及び塗膜形成方法、その塗装物品に関する。 The present invention relates to a photocation curable coating composition, a coating film forming method, and a coated article thereof.
 シルセスキオキサンは、基本構成単位がT単位であり、梯子型、籠型及び三次元網目型(ランダム型)の構造をとる一連のネットワーク状ポリシロキサンの総称である。このシルセスキオキサンは、一般式SiOで示される完全な無機物質であるシリカとは異なり一般的な有機溶媒に可溶であることから、取り扱いが容易であり、成膜等の加工性及び成形性に優れるという特徴を有する。 Silsesquioxane is a general term for a series of network-like polysiloxanes having a basic structural unit of T units and a ladder-type, cage-type, and three-dimensional network type (random type) structure. Since this silsesquioxane is soluble in a general organic solvent, unlike silica, which is a complete inorganic substance represented by the general formula SiO 2 , it is easy to handle, processability such as film formation and the like. It has the feature of excellent moldability.
 一方、光硬化を利用する表面効果技術は、基板(金属、プラスチック、木工製品など)に塗布した粘性液体に、光(例えば紫外線など)を照射して硬化させ、基板の表面を修飾する技術である。光硬化は、光によって開始される化学反応を利用した技術であり、その開始反応機構の違いから、ラジカル重合系とカチオン重合系とに分類される。カチオン重合系はラジカル重合系と比べると、酸素による硬化阻害を受け難いこと、硬化収縮が小さいこと、活性種の寿命が長いため光照射が届かないところの硬化及び加熱による硬化も徐々に進むことなどの特長を有することから、近年、様々な分野への応用が検討されている。 On the other hand, surface effect technology using photocuring is a technology that modifies the surface of the substrate by irradiating and curing the viscous liquid applied to the substrate (metal, plastic, woodworking product, etc.) with light (for example, ultraviolet rays). is there. Photocuring is a technique that utilizes a chemical reaction initiated by light, and is classified into a radical polymerization system and a cationic polymerization system based on the difference in the initiation reaction mechanism. Compared to radical polymerization systems, cationic polymerization systems are less susceptible to cure inhibition by oxygen, cure shrinkage is small, and curing of areas where light irradiation does not reach because of the long life of active species and curing by heating gradually progress. In recent years, application to various fields has been studied.
 特許文献1及び2の発明は、オキセタニル基を有するシルセスキオキサン化合物とカチオン性重合開始剤を含有する光カチオン硬化性樹脂組成物に関するものである。この組成物は、表面硬度および相溶性に優れるが、紫外線照射を5回行なって硬化しており、紫外線照射を1回行なった場合には、硬化性と耐擦傷性が不十分であった。 The inventions of Patent Documents 1 and 2 relate to a photocationic curable resin composition containing a silsesquioxane compound having an oxetanyl group and a cationic polymerization initiator. This composition was excellent in surface hardness and compatibility, but was cured by being irradiated with ultraviolet rays 5 times, and when it was irradiated once with ultraviolet rays, its curability and scratch resistance were insufficient.
 特許文献3の発明は、オニウム塩光開始剤を可溶化させる能力を高めた紫外線硬化可能なエポキシ官能性オルガノポリシロキサンとオニウム塩開始剤を含む組成物に関するものである。この組成物は、オニウム塩開始剤との相溶性に優れるが耐擦傷性が不十分となる場合であった。 The invention of Patent Document 3 relates to a composition comprising an ultraviolet curable epoxy functional organopolysiloxane having an increased ability to solubilize an onium salt photoinitiator and an onium salt initiator. This composition was excellent in compatibility with the onium salt initiator, but the scratch resistance was insufficient.
 一方、特許文献4及び5の発明は、カチオン重合開始能を有するカチオン重合開始剤に関するものである。このカチオン重合開始剤を用いると、砒素、アンチモンなどの毒性元素を含まず、また、他のカチオン重合性化合物との相溶性が良く硬化性に優れる。しかしながら、耐カール性が不十分となる場合であった。 On the other hand, the inventions of Patent Documents 4 and 5 relate to a cationic polymerization initiator having a cationic polymerization initiating ability. When this cationic polymerization initiator is used, it does not contain toxic elements such as arsenic and antimony, and has good compatibility with other cationic polymerizable compounds and excellent curability. However, this was a case where the curl resistance was insufficient.
特開平11-116682号公報JP-A-11-116682 特開平11-199673号公報Japanese Patent Laid-Open No. 11-199673 特開平1-297421号公報JP-A-1-297421 特再公表2005-116038号公報Japanese Patent Publication No. 2005-116038 特開2012-22227号公報JP 2012-22227 A
 本発明は上記事情に鑑みてなされたものであり、本発明の目的は、透明性に優れ、かつ、得られる硬化塗膜の耐カール性及び耐擦傷性に優れる光カチオン硬化性塗料組成物及び塗膜形成方法を提供することにある。 The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a photocationic curable coating composition having excellent transparency and curling resistance and scratch resistance of the resulting cured coating film, and It is providing the coating-film formation method.
 本発明者らは、上記課題を解決するために鋭意検討を重ねた結果、特定の光カチオン重合性基を含有するシルセスキオキサン化合物(a)と、ヨードニウム塩系光酸発生剤(b)を用いることにより、上記課題を解決することができることを見出し、本発明を完成するに至った。 As a result of intensive studies to solve the above problems, the present inventors have found that a silsesquioxane compound (a) containing a specific photocationically polymerizable group and an iodonium salt photoacid generator (b). It was found that the above-mentioned problems can be solved by using, and the present invention has been completed.
 すなわち本発明は、
 項1.少なくとも1つ以上の光カチオン重合性基を含有するシルセスキオキサン化合物(a)と、ヨードニウム塩系光酸発生剤(b)と、を含む光カチオン硬化性塗料組成物であって、
該光カチオン重合性基含有シルセスキオキサン化合物(a)が、
式(I)で表される加水分解性シラン化合物及び/又は式(II)で表される加水分解性シラン化合物を加水分解縮合して得られたものであり、式(I)と式(II)で表される加水分解性シラン化合物との総量を基準に、
式(I)で表される加水分解性シラン化合物が55~100モル%、
式(II)で表される加水分解性シラン化合物が0~45モル%である、光カチオン硬化性塗料組成物。
That is, the present invention
Item 1. A photocationic curable coating composition comprising a silsesquioxane compound (a) containing at least one photocationically polymerizable group and an iodonium salt photoacid generator (b),
The photocationically polymerizable group-containing silsesquioxane compound (a) is
It is obtained by hydrolytic condensation of a hydrolyzable silane compound represented by formula (I) and / or a hydrolyzable silane compound represented by formula (II). ) Based on the total amount with the hydrolyzable silane compound represented by
55 to 100 mol% of a hydrolyzable silane compound represented by the formula (I),
A photocationically curable coating composition, wherein the hydrolyzable silane compound represented by the formula (II) is 0 to 45 mol%.
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
[式(I)中、Rは2価の炭素数1~6のアルキレン基を示す。Xはハロゲン元素又は炭素数1~6のアルコキシ基であり、3つのXはそれぞれ同一でも又は異なっていてもよい。]  
 RSiX  (II)
[式(II)は、式(I)以外の化合物であって、Rは、置換されていても良い炭素数1~18の1価の有機基を示す。Xはハロゲン元素又は炭素数1~6のアルコキシ基であり、3つのXはそれぞれ同一でも又は異なっていてもよい。]
 項2.前記光酸発生剤(b)が、下記式(III)で表されるヨードニウム塩系光酸発生剤であることを特徴とする項1に記載の光カチオン硬化性塗料組成物。  
[In the formula (I), R 1 represents a divalent alkylene group having 1 to 6 carbon atoms. X is a halogen element or an alkoxy group having 1 to 6 carbon atoms, and the three Xs may be the same or different. ]
R 2 SiX 3 (II)
[Formula (II) is a compound other than formula (I), and R 2 represents an optionally substituted monovalent organic group having 1 to 18 carbon atoms. X is a halogen element or an alkoxy group having 1 to 6 carbon atoms, and the three Xs may be the same or different. ]
Item 2. Item 2. The photocationic curable coating composition according to Item 1, wherein the photoacid generator (b) is an iodonium salt photoacid generator represented by the following formula (III).
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
 [式(III)中、RはI(ヨウ素原子)に結合している有機基を表し、2個のRは互いに同一であっても異なってもよい。[Y]は、式(IV)で表されるリン酸アニオン又は式(V)で表されるホウ素化合物アニオンであって、式(IV)中のRfは水素原子の全て又は一部がフッ素原子で置換されていてもよいアルキル基を表す。bは0~5の整数である。b個のRfはそれぞれ同一であっても異なっていてもよい。]
 項3.さらに、その他の光カチオン重合性基含有化合物(c)をシルセスキオキサン化合物(a)100質量部に対して、50質量部以下含有するものである項1又は2に記載の光カチオン硬化性塗料組成物。
[In Formula (III), R 3 represents an organic group bonded to I (iodine atom), and two R 3 s may be the same as or different from each other. [Y] is a phosphate anion represented by the formula (IV) or a boron compound anion represented by the formula (V), and Rf in the formula (IV) is fluorine in which all or part of the hydrogen atoms are fluorine. An alkyl group which may be substituted with an atom is represented. b is an integer of 0 to 5. The b Rf's may be the same or different. ]
Item 3. Item 3. The photocationic curability according to item 1 or 2, further comprising 50 parts by mass or less of another photocationically polymerizable group-containing compound (c) with respect to 100 parts by mass of the silsesquioxane compound (a). Paint composition.
 項4.さらに、増感剤(d)を含有する項1~3のいずれか1項に記載の光カチオン硬化性塗料組成物。 Item 4. Item 4. The photocationically curable coating composition according to any one of Items 1 to 3, further comprising a sensitizer (d).
 項5.該光カチオン重合性基含有シルセスキオキサン化合物(a)のエポキシ当量が、10~500g/当量である項1~4のいずれか1項に記載の光カチオン硬化性塗料組成物。 Item 5. Item 5. The photocationically curable coating composition according to any one of Items 1 to 4, wherein the epoxy equivalent of the photocationically polymerizable group-containing silsesquioxane compound (a) is 10 to 500 g / equivalent.
 項6.厚さ3mmのアクリル樹脂板上に膜厚5μmの硬化塗膜を形成したときの塗膜表面を超微小硬さ試験装置により温度23℃・荷重20mN下で測定したマルテンス硬度が、0.5~350N/mmとなる塗膜を形成できる項1~5のいずれか1項に記載の光カチオン硬化性塗料組成物。 Item 6. When the cured coating film having a film thickness of 5 μm is formed on the acrylic resin plate having a thickness of 3 mm, the Martens hardness measured by a super micro hardness tester at a temperature of 23 ° C. and a load of 20 mN is 0.5. Item 6. The photocationically curable coating composition according to any one of Items 1 to 5, which can form a coating film having a thickness of 350 N / mm 2 .
 項7.被塗物上に、項1~6のいずれか1項に記載の光カチオン硬化性塗料組成物を乾燥膜厚が1~10μmとなるように塗装して、セッティングおよび/または予備加熱を施した後、光照射することを特徴とする塗膜形成方法。 Item 7. A photocationically curable coating composition according to any one of Items 1 to 6 is applied on an object to be coated so that the dry film thickness is 1 to 10 μm, and setting and / or preheating is performed. A coating film forming method characterized by irradiating with light after applying.
 項8.項7に記載の塗膜形成方法により被膜が形成された物品
に関する。
Item 8. The present invention relates to an article having a film formed by the method for forming a coating film according to Item 7.
 本発明の光カチオン硬化性塗料組成物を用いると、透明性に優れる硬化塗膜を得ることができる。さらに本発明の光カチオン硬化性塗料組成物によれば、低照射量で硬化可能であり、得られる硬化塗膜の耐カール性及び耐擦傷性にも優れた硬化塗膜を得ることができる。 When the photocationic curable coating composition of the present invention is used, a cured coating film having excellent transparency can be obtained. Furthermore, according to the photocationic curable coating composition of the present invention, it is possible to obtain a cured coating film that can be cured at a low dose and that is excellent in curling resistance and scratch resistance of the resulting cured coating film.
 本発明の光カチオン硬化性塗料組成物は、シルセスキオキサン化合物(a)、及びヨードニウム塩系光酸発生剤(b)を含有する。以下詳細に説明する。 The photocationic curable coating composition of the present invention contains a silsesquioxane compound (a) and an iodonium salt photoacid generator (b). This will be described in detail below.
 (a)成分であるシルセスキオキサン化合物
 本明細書において「シルセスキオキサン化合物」は、Si-OH基(ヒドロキシシリル基)の全てが加水分解縮合した構造のシルセスキオキサン化合物のみを意味するのではなく、Si-OH基が残存したラダー構造、不完全籠型構造、ランダム縮合体のシルセスキオキサン化合物をも含むことができる。
(A) Silsesquioxane Compound as Component In this specification, “silsesquioxane compound” means only a silsesquioxane compound having a structure in which all Si—OH groups (hydroxysilyl groups) are hydrolyzed and condensed. Instead, it may also include a ladder structure in which Si—OH groups remain, an incomplete cage structure, and a random condensate silsesquioxane compound.
 (a)成分であるシルセスキオキサン化合物は、Si-OH基の全てが加水分解縮合した構造のシルセスキオキサン化合物の割合が、(a)成分であるシルセスキオキサン化合物中に80質量%以上、好ましくは90質量%以上、より好ましくは100質量%であることが液安定性及び耐擦傷性の点から好ましい。 In the silsesquioxane compound as the component (a), the ratio of the silsesquioxane compound having a structure in which all Si—OH groups are hydrolyzed and condensed is 80 mass% in the silsesquioxane compound as the component (a). % Or more, preferably 90% by mass or more, and more preferably 100% by mass from the viewpoint of liquid stability and scratch resistance.
 本発明において、シルセスキオキサン化合物(a)は、少なくとも1つ以上のカチオン重合性基を含有する。本発明において、カチオン重合性基とは、カチオンを与える開始剤が存在すると、連鎖的に重合する基を意味し、具体的には、例えば、エポキシ基(例えば、脂環式エポキシ基、グリシジル基等)、オキセタン環、ビニルエーテル基、メチロール基、アルコキシメチロール基、ジオキソラン基、トリオキサン基、スチリル基等が挙げられる。本発明において、該シルセスキオキサン化合物(a)は、式(I)で表される加水分解性シラン及び/又は式(II)で表される加水分解性シランを加水分解縮合して得られたものである。 In the present invention, the silsesquioxane compound (a) contains at least one cationic polymerizable group. In the present invention, the cation polymerizable group means a group that polymerizes in the presence of an initiator that gives a cation, and specifically includes, for example, an epoxy group (for example, an alicyclic epoxy group, a glycidyl group). Etc.), oxetane ring, vinyl ether group, methylol group, alkoxymethylol group, dioxolane group, trioxane group, styryl group and the like. In the present invention, the silsesquioxane compound (a) is obtained by hydrolytic condensation of a hydrolyzable silane represented by the formula (I) and / or a hydrolyzable silane represented by the formula (II). It is a thing.
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
[式(I)中、Rは2価の炭素数1~6のアルキレン基を示す。Xはハロゲン元素又は炭素数1~6のアルコキシ基であり、3つのXはそれぞれ同一でも又は異なっていてもよい。]  
 RSiX  (II)
[式(II)は、式(I)以外の化合物であって、Rは、置換されていても良い炭素数1~18の1価の有機基を示す。Xはハロゲン元素又は炭素数1~6のアルコキシ基であり、3つのXはそれぞれ同一でも又は異なっていてもよい。]。
[In the formula (I), R 1 represents a divalent alkylene group having 1 to 6 carbon atoms. X is a halogen element or an alkoxy group having 1 to 6 carbon atoms, and the three Xs may be the same or different. ]
R 2 SiX 3 (II)
[Formula (II) is a compound other than formula (I), and R 2 represents an optionally substituted monovalent organic group having 1 to 18 carbon atoms. X is a halogen element or an alkoxy group having 1 to 6 carbon atoms, and the three Xs may be the same or different. ].
 なお前記式(I)中のRは、シルセスキオキサン化合物を構成するケイ素原子と結合している。一般的に、酸素を含む3員環をオキシラン環又はエポキシ基と総称する。そのうち、「脂環式エポキシ基」とは、例えば、シクロヘキサン環、シクロオクタン環等の環状脂肪族基の環内にエポキシ基を有するものを示すが、本発明の(a)成分であるシルセスキオキサン化合物を合成する際には、脂環式エポキシ基を有する化合物のうち、式(I)で表される構造の脂環式エポキシ基含有加水分解性シランを必須成分として用いる。 R 1 in the formula (I) is bonded to a silicon atom constituting the silsesquioxane compound. Generally, a three-membered ring containing oxygen is generically called an oxirane ring or an epoxy group. Among them, the “alicyclic epoxy group” refers to those having an epoxy group in the ring of a cycloaliphatic group such as a cyclohexane ring and a cyclooctane ring, and the silsesquiquine component (a) of the present invention. When synthesizing an oxane compound, among the compounds having an alicyclic epoxy group, an alicyclic epoxy group-containing hydrolyzable silane having a structure represented by the formula (I) is used as an essential component.
 該脂環式エポキシ基を有することにより、(a)成分であるシルセスキオキサン化合物は、ヨードニウム塩系光酸発生剤との相溶性と反応性に優れることから、該光酸発生剤存在下で光照射により硬化する。そのため、本発明の光カチオン硬化性塗料組成物により得られる硬化塗膜は、透明性に優れる。 By having the alicyclic epoxy group, the silsesquioxane compound as the component (a) is excellent in compatibility and reactivity with the iodonium salt photoacid generator, and therefore in the presence of the photoacid generator. And cured by light irradiation. Therefore, the cured coating film obtained by the photocationic curable coating composition of the present invention is excellent in transparency.
 (a)成分であるシルセスキオキサン化合物が有する、光カチオン重合性基のうち脂環式エポキシ基は、(a)成分であるシルセスキオキサン化合物が有する光カチオン重合性基の一部又は全部であり、その含有率は、硬化塗膜の耐擦傷性の点から、そのうちの55~100モル%、さらに75~100モル%、さらに特に90~100モル%の範囲内であることが好ましい。 Among the cationic photopolymerizable groups of the silsesquioxane compound as the component (a), the alicyclic epoxy group is a part of the cationic photopolymerizable group of the silsesquioxane compound as the component (a) or From the viewpoint of scratch resistance of the cured coating film, the content is preferably 55 to 100 mol%, more preferably 75 to 100 mol%, and particularly preferably 90 to 100 mol%. .
 前記式(I)中のRは、炭素数1~6の2価の炭化水素基であれば特に限定されるものではない。具体的には例えば、メチレン基、エチレン基、1、2-プロピレン基、1、3-プロピレン基、1、2-ブチレン基、1、4-ブチレン基、ヘキシレン基等が挙げられる。なかでも、炭素数2~4の2価の炭化水素基であることが、得られる硬化塗膜の耐擦傷性の点から好ましい。 R 1 in the formula (I) is not particularly limited as long as it is a divalent hydrocarbon group having 1 to 6 carbon atoms. Specific examples include methylene group, ethylene group, 1,2-propylene group, 1,3-propylene group, 1,2-butylene group, 1,4-butylene group, hexylene group and the like. Among these, a divalent hydrocarbon group having 2 to 4 carbon atoms is preferable from the viewpoint of scratch resistance of the resulting cured coating film.
 (a)成分であるシルセスキオキサン化合物は、脂環式エポキシ基を特定の割合で有するが、その他の有機基は特に限定されるものではない。 The silsesquioxane compound as component (a) has an alicyclic epoxy group in a specific ratio, but other organic groups are not particularly limited.
 その他の有機基としては、例えば、メチル基、エチル基等のアルキル基、3-グリシジルオキシプロピル基、グリシジル基、オキセタニル基、ビニル基、フェニル基などの有機基が挙げられる。なかでも、硬化性の点から、グリシジル基、オキセタニル基又はメチル基を含むことが好ましい。 Examples of other organic groups include organic groups such as alkyl groups such as methyl group and ethyl group, 3-glycidyloxypropyl group, glycidyl group, oxetanyl group, vinyl group and phenyl group. Especially, it is preferable that a glycidyl group, an oxetanyl group, or a methyl group is included from a sclerosing | hardenable point.
 前記(a)成分のシルセスキオキサン化合物の重量平均分子量は、光カチオン硬化性塗料組成物の粘度及び塗装性の点から、重量平均分子量が1,000~100,000、さらに1,000~10,000の範囲内が好ましい。 The weight average molecular weight of the silsesquioxane compound (a) is from 1,000 to 100,000, more preferably from 1,000 to 100,000, from the viewpoint of the viscosity and paintability of the photocationic curable coating composition. Within the range of 10,000 is preferred.
 本明細書において、(a)成分であるシルセスキオキサン化合物の重量平均分子量は、ゲルパーミエーションクロマトグラフ装置として、「HLC(登録商標)-8120GPC」(商品名、東ソー社製)を使用し、カラムとして、「TSKgel(登録商標) G4000HXL」、「TSKgel(登録商標) G3000HXL」、「TSKgel(登録商標) G2500HXL」及び「TSKgel(登録商標) G2000HXL」(商品名、いずれも東ソー社製)の計4本を使用し、検出器として、示差屈折率計を使用し、移動相:テトラヒドロフラン、測定温度:40℃、流速:1mL/minの条件下で測定することができる。 In this specification, the weight average molecular weight of the silsesquioxane compound as component (a) is “HLC (registered trademark) -8120GPC” (trade name, manufactured by Tosoh Corporation) as a gel permeation chromatograph. As columns, “TSKgel (registered trademark) G4000HXL”, “TSKgel (registered trademark) G3000HXL”, “TSKgel (registered trademark) G2500HXL” and “TSKgel (registered trademark) G2000HXL” (trade names, all manufactured by Tosoh Corporation) A total of four lines can be used, and a differential refractometer can be used as a detector, and measurement can be performed under conditions of mobile phase: tetrahydrofuran, measurement temperature: 40 ° C., and flow rate: 1 mL / min.
 (a)成分であるシルセスキオキサン化合物の製造方法  
 (a)成分であるシルセスキオキサン化合物は、一般的なシルセスキオキサンの製造に用いられている製造方法と従来公知の化学反応とを組み合わせることにより得ることができ、例えば、以下の製造方法を用いて製造することができる。
(A) Method for producing silsesquioxane compound as component
The silsesquioxane compound as component (a) can be obtained by combining a production method used for production of general silsesquioxane and a conventionally known chemical reaction. For example, the following production It can be manufactured using a method.
  製造方法p
 製造方法pとしては、光カチオン重合性基を有する加水分解性シランを出発物質として用いた製造方法が挙げられる。
Manufacturing method p
Examples of the production method p include a production method using a hydrolyzable silane having a photocationically polymerizable group as a starting material.
 具体的には例えば、出発物質に前記式(I)で表される加水分解性シランを、触媒の存在下で加水分解縮合を行なって(a)成分であるシルセスキオキサン化合物を製造する方法が挙げられる。 Specifically, for example, a hydrolyzable silane represented by the above formula (I) as a starting material is subjected to hydrolysis condensation in the presence of a catalyst to produce a silsesquioxane compound as component (a). Is mentioned.
 式(I)中、Rは2価の炭素数1~6のアルキレン基を示す。本発明において、2価の炭素数1~6のアルキレン基としては、例えば、メチレン基、エチレン基、n-プロピレン基、イソプロピレン基、n-ブチレン基、n-ペンチレン基、n-ヘキシレン基等が挙げられる。上記アルキレン基としては、炭素数1~3のアルキレン基が好ましい。Xはハロゲン元素又は炭素数1~6のアルコキシ基であり、3つのXはそれぞれ同一でも又は異なっていてもよい。本発明において、ハロゲン原子としては、例えば、フッ素、塩素、臭素、ヨウ素等が挙げられる。本発明において、炭素数1~6のアルコキシ基としては、例えば、メトキシ基、エトキシ基、n-プロポキシ基、イソプロポキシ基、n-ブトキシ基、イソブトキシ基、tert-ブトキシ基、n-ペンチルオキシ基、n-ヘキシルオキシ基等が挙げられる。Xとしては、具体的には、塩素、メトキシ基、エトキシ基、n-プロポキシ基、イソプロポキシ基、n-ブトキシ基、イソブトキシ基、tert-ブトキシ基等が挙げられる。 In the formula (I), R 1 represents a divalent alkylene group having 1 to 6 carbon atoms. In the present invention, examples of the divalent alkylene group having 1 to 6 carbon atoms include methylene group, ethylene group, n-propylene group, isopropylene group, n-butylene group, n-pentylene group, n-hexylene group and the like. Is mentioned. The alkylene group is preferably an alkylene group having 1 to 3 carbon atoms. X is a halogen element or an alkoxy group having 1 to 6 carbon atoms, and the three Xs may be the same or different. In the present invention, examples of the halogen atom include fluorine, chlorine, bromine, iodine and the like. In the present invention, examples of the alkoxy group having 1 to 6 carbon atoms include a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, an n-butoxy group, an isobutoxy group, a tert-butoxy group, and an n-pentyloxy group. And n-hexyloxy group. Specific examples of X include chlorine, methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, isobutoxy group, tert-butoxy group and the like.
 前記式(I)で表される加水分解性シランの具体例としては、2-(3、4-エポキシシクロヘキシル)エチルトリメトキシシラン、2-(3、4-エポキシシクロヘキシル)エチルトリエトキシシラン、2-(3、4-エポキシシクロヘキシル)エチルトリクロロシラン等が挙げられる。 Specific examples of the hydrolyzable silane represented by the formula (I) include 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, 2 -(3,4-epoxycyclohexyl) ethyltrichlorosilane and the like.
 前記式(I)で表される加水分解性シラン以外の前記式(II)の加水分解性シランを用いても良く、前記式(I)で表される加水分解性シランとともに加水分解縮合することによりシルセスキオキサン化合物を製造できるものであれば特に限定されるものではない。 The hydrolyzable silane of the formula (II) other than the hydrolyzable silane represented by the formula (I) may be used, and hydrolytic condensation is performed together with the hydrolyzable silane represented by the formula (I). The silsesquioxane compound is not particularly limited as long as it can produce the compound.
 式(II)中、式(I)以外の化合物であって、Rは、置換されていても良い炭素数1~18の1価の有機基を示す。Xは前記と同じである。 In the formula (II), compounds other than the formula (I), wherein R 2 represents an optionally substituted monovalent organic group having 1 to 18 carbon atoms. X is the same as described above.
 前記式(II)中のRは、耐擦傷性の点から、炭素数1~18の1価の有機基が好ましく、直鎖でも分岐していてもよく、1~3個(好ましくは1個の)環状構造を有していもよく、ウレタン結合、エステル結合、エーテル結合等を含んでいてもよい。従って、Rで表わされる有機基としては、炭化水素基(炭素数1~18のアルキル基、炭素数6~18のアリール基(フェニル基等)、炭素数2~18のアルケニル基等)、上記ウレタン結合、エステル結合、エーテル結合等で中断された炭化水素基等が挙げられる。上記有機基にウレタン結合、エステル結合、エーテル結合等が含まれる場合、これらの結合の数は限定されないが、例えば、有機基1個当たりの上記結合の数が1~3個、好ましくは1個が挙げられる。本発明において、有機基にウレタン結合、エステル結合、エーテル結合等が含まれる場合、有機基の炭素数は、これらの結合に含まれる炭素の数も含めたものを示す。従って、例えば、メチルカルバモイルエチル基(CH-NH-(C=O)-O-C-)の炭素数は4となり、プロピオニルオキシブチル基(C-(C=O)-O-C-)の炭素数は7となり、エトキシプロピル基(C-O-C-)の炭素数は5となる。また、側鎖及び/又は末端に、アミノ基、グリシジル基、(メタ)アクリレート基、オキセタン環などの置換基を有していても良い。上記有機基が置換基を有する場合、置換基の数は限定されないが、例えば、有機基1個当たりの上記置換基の数としては、1~3個、好ましくは1個が挙げられる。本発明において、有機基が置換基を有する場合、当該置換基の炭素数は「有機基」の炭素数に含まれないものとする。従って、例えば、グリシジルブチル基((CO)-C-)は炭素数4の有機基であるブチル基にグリシジル基が1個置換しているものに相当し、5-メチル-4-オキソ-へキソ-5-エン-1-イル基(CH-(C=CH)-(C=O)-C-)は炭素数3の有機基であるプロピル基にメタクリレート基が1個置換しているものに相当する。 R 2 in the formula (II) is preferably a monovalent organic group having 1 to 18 carbon atoms from the viewpoint of scratch resistance, and may be linear or branched, and 1 to 3 (preferably 1 May have a cyclic structure and may contain a urethane bond, an ester bond, an ether bond, or the like. Accordingly, the organic group represented by R 2 includes a hydrocarbon group (an alkyl group having 1 to 18 carbon atoms, an aryl group having 6 to 18 carbon atoms (such as a phenyl group), an alkenyl group having 2 to 18 carbon atoms), Examples thereof include hydrocarbon groups interrupted by the urethane bond, ester bond, ether bond and the like. When the organic group includes a urethane bond, an ester bond, an ether bond, etc., the number of these bonds is not limited. For example, the number of the above-mentioned bonds per organic group is 1 to 3, preferably 1 Is mentioned. In the present invention, when the organic group includes a urethane bond, an ester bond, an ether bond, or the like, the number of carbon atoms in the organic group includes the number of carbons included in these bonds. Therefore, for example, the carbon number of the methylcarbamoylethyl group (CH 3 —NH— (C═O) —O—C 2 H 4 —) is 4, and the propionyloxybutyl group (C 2 H 5 — (C═O) The number of carbon atoms of —O—C 4 H 8 —) is 7, and the number of carbon atoms of the ethoxypropyl group (C 2 H 5 —O—C 3 H 6 —) is 5. Moreover, you may have substituents, such as an amino group, a glycidyl group, a (meth) acrylate group, and an oxetane ring, in the side chain and / or the terminal. When the organic group has a substituent, the number of substituents is not limited. For example, the number of the substituents per organic group is 1 to 3, preferably 1. In the present invention, when the organic group has a substituent, the carbon number of the substituent is not included in the carbon number of the “organic group”. Thus, for example, a glycidyl butyl group ((C 2 H 3 O) —C 4 H 8 —) corresponds to a butyl group, which is an organic group having 4 carbon atoms, substituted with one glycidyl group, The methyl-4-oxo-hex-5-en-1-yl group (CH 3 — (C═CH 2 ) — (C═O) —C 3 H 6 —) is propyl which is an organic group having 3 carbon atoms. This corresponds to a group in which one methacrylate group is substituted.
 前記式(II)で示される加水分解性シランとしては、例えば、メチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン等のアルキルトリアルコキシシラン;フェニルトリメトキシシラン、フェニルトリエトキシシラン等のフェニルトリアルコキシシラン;3-(メタ)アクリロイルオキシプロピルトリメトキシシラン、3-(メタ)アクリロイルオキシプロピルトリエトキシシラン、3-(メタ)アクリロイルオキシプロピルトリアルコキシシラン等の(メタ)アクリロイルオキシ基含有アルキルトリアルコキシシラン;3-グリシジルオキシプロピルトリメトキシシラン、3-グリシジルオキシプロピルトリエトキシシラン等のグリシジル基含有アルキルトリアルコキシシラン;ビニルトリメトキシシラン、ビニルトリエトキシシラン等のビニル基含有トリアルコキシシラン;3-[(3-エチルオキセタン-3-イル)メトキシ]プロピルトリメトキシシラン等のオキセタン環含有アルキルトリアルコキシシラン等が挙げられる。 Examples of the hydrolyzable silane represented by the formula (II) include alkyltrialkoxysilanes such as methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, and ethyltriethoxysilane; phenyltrimethoxysilane, phenyltrimethoxysilane, and the like. Phenyltrialkoxysilane such as ethoxysilane; (Meth) acryloyl such as 3- (meth) acryloyloxypropyltrimethoxysilane, 3- (meth) acryloyloxypropyltriethoxysilane, 3- (meth) acryloyloxypropyltrialkoxysilane Oxy group-containing alkyltrialkoxysilane; 3-glycidyloxypropyltrimethoxysilane, glycidyl group-containing alkyltrialkoxysilane such as 3-glycidyloxypropyltriethoxysilane Examples include vinyl group-containing trialkoxysilanes such as vinyltrimethoxysilane and vinyltriethoxysilane; oxetane ring-containing alkyltrialkoxysilanes such as 3-[(3-ethyloxetane-3-yl) methoxy] propyltrimethoxysilane. .
 特に硬化性と耐擦傷性の点から、メチルトリアルコキシシラン、グリシジル基含有アルキルトリアルコキシシラン、オキセタン環含有アルキルトリアルコキシシランが好ましい。 In particular, methyltrialkoxysilane, glycidyl group-containing alkyltrialkoxysilane, and oxetane ring-containing alkyltrialkoxysilane are preferable from the viewpoint of curability and scratch resistance.
 シルセスキオキサン化合物(a)としては、前記式(I)で表される加水分解性シランを含む加水分解性シランを加水分解縮合することに得られるものが好ましい。シルセスキオキサン化合物(a)の原料となる加水分解性シランは、前記式(II)で表される加水分解性シランをさらに含んでいても良い。本発明の好ましい一実施形態において、含有シルセスキオキサン化合物(a)は、
前記式(I)及び前記式(II)で表される加水分解性シランの合計モル質量に対して、
前記式(I)で表される加水分解性シラン55~100モル%と、
前記式(II)で表される加水分解性シラン0~45モル%と、
を加水分解縮合して得られたもので、特に耐擦傷性の点から、下記範囲であることが好ましい。
As the silsesquioxane compound (a), those obtained by hydrolytic condensation of a hydrolyzable silane containing the hydrolyzable silane represented by the formula (I) are preferable. The hydrolyzable silane used as the raw material of the silsesquioxane compound (a) may further contain a hydrolyzable silane represented by the formula (II). In a preferred embodiment of the present invention, the containing silsesquioxane compound (a) is:
With respect to the total molar mass of the hydrolyzable silane represented by the formula (I) and the formula (II),
Hydrolyzable silane 55-100 mol% represented by the formula (I),
Hydrolyzable silane represented by the formula (II) 0 to 45 mol%,
In particular, from the viewpoint of scratch resistance, the following range is preferable.
 前記式(I)で表される加水分解性シランが、特に80~100モル%、さらに特に90~100モル%の範囲内、前記式(II)で表される加水分解性シランが、0~20モル%、さらに特に0~10モル/gの範囲内。前記式(II)で表される加水分解性シランの配合量が0モル%とは、該シランをまったく使用しないことを意味する。 The hydrolyzable silane represented by the formula (I) is particularly in the range of 80 to 100 mol%, more particularly 90 to 100 mol%, and the hydrolyzable silane represented by the formula (II) is 0 to 20 mol%, more particularly in the range of 0 to 10 mol / g. The amount of the hydrolyzable silane represented by the formula (II) being 0 mol% means that the silane is not used at all.
 (a)成分であるシルセスキオキサン化合物を製造する際には、触媒を使用することができる。前記触媒としては、塩基性触媒が好適に用いられる。塩基性触媒としては、具体的には例えば、水酸化カリウム、水酸化ナトリウム、水酸化セシウム等のアルカリ金属水酸化物、テトラメチルアンモニウムヒドロキシド、テトラエチルアンモニウムヒドロキシド、テトラブチルアンモニウムヒドロキシド、ベンジルトリメチルアンモニウムヒドロキシド等の水酸化アンモニウム塩、テトラブチルアンモニウムフルオリド等のフッ化アンモニウム塩等が挙げられる。 A catalyst can be used when producing the silsesquioxane compound as component (a). As the catalyst, a basic catalyst is preferably used. Specific examples of the basic catalyst include alkali metal hydroxides such as potassium hydroxide, sodium hydroxide and cesium hydroxide, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrabutylammonium hydroxide, benzyltrimethyl Examples thereof include ammonium hydroxide salts such as ammonium hydroxide and ammonium fluoride salts such as tetrabutylammonium fluoride.
 前記触媒の使用量は、特に限定されるものではないが、多すぎるとコスト高になる、除去が困難となる等の問題があり、少ないと反応が遅くなる場合がある。そのため、好ましくは加水分解性シラン1モルに対して0.0001~1.0モル、より好ましくは0.0005~0.1モルの範囲である。 The amount of the catalyst used is not particularly limited, but if it is too much, there are problems such as high costs and difficulty in removal, and if it is too small, the reaction may be slow. Therefore, it is preferably in the range of 0.0001 to 1.0 mol, more preferably 0.0005 to 0.1 mol, per mol of hydrolyzable silane.
 加水分解性シランを加水分解縮合する場合は、通常、水を使用する。加水分解性シランと水との量比は、特に限定されるものでない。水の使用量は、所望とする構造のシルセスキオキサン化合物の収率と、純度の点から、加水分解性シラン1モルに対し、水0.1~100モル、さらに0.5~3モルの割合内であることが好ましい。また、使用する水は塩基性触媒を水溶液として用いる場合はその水で代用してもよいし、別途水を加えてもよい。 When hydrolyzing and condensing hydrolyzable silane, water is usually used. The quantity ratio of hydrolyzable silane and water is not particularly limited. The amount of water used is from 0.1 to 100 mol, more preferably from 0.5 to 3 mol, based on 1 mol of hydrolyzable silane in terms of the yield and purity of the silsesquioxane compound having the desired structure. It is preferable to be within the ratio. Moreover, when using a basic catalyst as aqueous solution, the water to be used may be substituted with the water, and water may be added separately.
 前記加水分解縮合において、有機溶媒は使用してもよい。有機溶媒を用いることは、ゲル化を防止する点及び製造時の粘度を調節できる点から好ましい。有機溶媒としては、極性有機溶媒、非極性有機溶媒を単独又は混合物として用いることができる。 In the hydrolysis condensation, an organic solvent may be used. It is preferable to use an organic solvent from the viewpoint of preventing gelation and adjusting the viscosity during production. As the organic solvent, polar organic solvents and nonpolar organic solvents can be used alone or as a mixture.
 極性有機溶媒としては、メタノール、エタノール、2-プロパノール等の低級アルコール類、アセトン、メチルイソブチルケトン等のケトン類、テトラヒドロフラン等のエーテル類が用いられるが、特にアセトン、テトラヒドロフランは沸点が低く系が均一になり反応性が向上することから好ましい。非極性有機溶媒としては、炭化水素系溶媒が好ましく、トルエン、キシレン等の水よりも沸点が高い有機溶媒が好ましく、特にトルエン等の水と共沸する有機溶媒は系内から水を効率よく除去できるため好ましい。特に、極性有機溶媒と非極性有機溶媒とを混合することで、前述したそれぞれの利点が得られるため混合溶媒として用いることが好ましい。 As the polar organic solvent, lower alcohols such as methanol, ethanol and 2-propanol, ketones such as acetone and methyl isobutyl ketone, and ethers such as tetrahydrofuran are used. Particularly, acetone and tetrahydrofuran have a low boiling point and the system is uniform. And the reactivity is improved. As the nonpolar organic solvent, a hydrocarbon solvent is preferable, and an organic solvent having a boiling point higher than that of water such as toluene and xylene is preferable. In particular, an organic solvent azeotropic with water such as toluene efficiently removes water from the system. This is preferable because it is possible. In particular, mixing a polar organic solvent and a nonpolar organic solvent provides the above-described advantages, so that it is preferably used as a mixed solvent.
 加水分解縮合時の反応温度としては、通常0~200℃、好ましくは10~190℃、更に好ましくは10~120℃である。また、この反応は圧力によらず実施できるが、0.02~0.2MPaの圧力範囲が好ましく、特に0.08~0.15MPaの圧力範囲が好ましい。当該反応は、通常、1~15時間程度で終了する。 The reaction temperature during the hydrolytic condensation is usually 0 to 200 ° C., preferably 10 to 190 ° C., more preferably 10 to 120 ° C. Although this reaction can be carried out regardless of pressure, a pressure range of 0.02 to 0.2 MPa is preferable, and a pressure range of 0.08 to 0.15 MPa is particularly preferable. The reaction is usually completed in about 1 to 15 hours.
 加水分解縮合反応では、加水分解と共に縮合反応が進行し、加水分解性シランの加水分解性基[具体的には例えば、前記式(I)中のX]の大部分、好ましくは100%がヒドロキシル基(OH基)に加水分解され、更にそのOH基の大部分、好ましくは80%以上、より好ましくは90%以上、特に好ましくは100%を縮合させることが液安定性及び耐擦傷性の点から好ましい。 In the hydrolysis-condensation reaction, the condensation reaction proceeds with hydrolysis, and most of the hydrolyzable group of the hydrolyzable silane [specifically, for example, X in the formula (I), preferably 100% is hydroxyl. It is possible to condense liquid stability and scratch resistance by hydrolysis to a group (OH group) and further condensing most of the OH group, preferably 80% or more, more preferably 90% or more, and particularly preferably 100%. To preferred.
 加水分解縮合後の混合液からは、反応で生成したアルコール、溶媒及び触媒を公知の手法で除去してもよい。なお、得られた生成物は、その目的に応じて、触媒を洗浄、カラム分離、固体吸着剤による吸着等の各種の精製法によって除去し、更に精製してもよい。効率の点から水洗により触媒を除去することが好ましい。 The alcohol, solvent, and catalyst generated by the reaction may be removed from the mixed solution after hydrolysis condensation by a known method. The obtained product may be further purified by removing the catalyst by various purification methods such as washing, column separation, and adsorption with a solid adsorbent according to the purpose. From the viewpoint of efficiency, it is preferable to remove the catalyst by washing with water.
 ここで、前記加水分解縮合において100%縮合しない場合には、本製造方法により得られる生成物には、Si-OH基(ヒドロキシシリル基)の全てが加水分解縮合した構造のシルセスキオキサン化合物以外に、Si-OH基が残存したラダー構造、不完全籠型構造及び/又はランダム縮合体のシルセスキオキサン化合物が含まれる場合があるが、本製造方法により得られる(A)成分であるシルセスキオキサン化合物は、それらラダー構造、不完全籠型構造及び/又はランダム縮合体を含んでいてもよい。なお、上記製造方法により得られる(a)成分であるシルセスキオキサン化合物は、Si-OH基の全てが加水分解縮合した構造のシルセスキオキサン化合物の割合が、好ましくは80質量%以上、より好ましくは90質量%以上であることが、液安定性及び耐擦傷性の点から好ましい。 Here, when 100% condensation does not occur in the hydrolysis condensation, the product obtained by this production method includes a silsesquioxane compound having a structure in which all Si—OH groups (hydroxysilyl groups) are hydrolyzed and condensed. In addition, a silsesquioxane compound having a ladder structure in which Si—OH groups remain, an incomplete cage structure, and / or a random condensate may be included, and is a component (A) obtained by this production method. The silsesquioxane compound may contain these ladder structures, incomplete cage structures, and / or random condensates. Note that the silsesquioxane compound as the component (a) obtained by the above production method has a ratio of the silsesquioxane compound having a structure in which all Si—OH groups are hydrolyzed and condensed, preferably 80% by mass or more, More preferably, it is 90% by mass or more from the viewpoint of liquid stability and scratch resistance.
 ヨードニウム塩系光酸発生剤(b)
 本発明の光カチオン硬化性塗料組成物は、ヨードニウム塩系光酸発生剤(b)を含有する。  
ヨードニウム塩系光酸発生剤(b)は、光によってカチオン(酸)を発生する化合物であり、カチオン重合の開始剤となりうる。
Iodonium salt photoacid generator (b)
The photocationic curable coating composition of the present invention contains an iodonium salt photoacid generator (b).
The iodonium salt-based photoacid generator (b) is a compound that generates a cation (acid) by light and can serve as an initiator for cationic polymerization.
 特に透明性と耐擦傷性の点から、該光酸発生剤(b)が、下記式(III)で表されるヨードニウム塩系光酸発生剤であることが好ましい。   In particular, from the viewpoint of transparency and scratch resistance, the photoacid generator (b) is preferably an iodonium salt photoacid generator represented by the following formula (III). *
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 式(III)中、RはI(ヨウ素原子)に結合している有機基を表し、2個のRは互いに同一であっても異なってもよい。[Y]は、式(IV)で表されるリン酸アニオン又は式(V)で表されるホウ素化合物アニオンであって、式(IV)中のRfは水素原子の全て又は一部がフッ素原子で置換されていてもよいアルキル基を表す。bは0~5の整数である。b個のRfはそれぞれ同一であっても異なっていてもよい。 In formula (III), R 3 represents an organic group bonded to I (iodine atom), and two R 3 s may be the same or different from each other. [Y] is a phosphate anion represented by the formula (IV) or a boron compound anion represented by the formula (V), and Rf in the formula (IV) is fluorine in which all or part of the hydrogen atoms are fluorine. An alkyl group which may be substituted with an atom is represented. b is an integer of 0 to 5. The b Rf's may be the same or different.
 Rとしては、炭素数6~30のアリール基、炭素数4~30の複素環基、炭素数1~30のアルキル基、炭素数2~30のアルケニル基または炭素数2~30のアルキニル基を表し、これらはアルキル、ヒドロキシ、アルコキシ、アルキルカルボニル、アリールカルボニル、アルコキシカルボニル、アリールオキシカルボニル、アリールチオカルボニル、アシロキシ、アリールチオ、アルキルチオ、アリール、複素環、アリールオキシ、アルキルスルフィニル、アリールスルフィニル、アルキルスルホニル、アリールスルホニル、アルキレンオキシ、アミノ、シアノ、ニトロの各基およびハロゲンなどにより置換されていてもよい。 R 3 is an aryl group having 6 to 30 carbon atoms, a heterocyclic group having 4 to 30 carbon atoms, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or an alkynyl group having 2 to 30 carbon atoms. Which represent alkyl, hydroxy, alkoxy, alkylcarbonyl, arylcarbonyl, alkoxycarbonyl, aryloxycarbonyl, arylthiocarbonyl, acyloxy, arylthio, alkylthio, aryl, heterocycle, aryloxy, alkylsulfinyl, arylsulfinyl, alkylsulfonyl , Arylsulfonyl, alkyleneoxy, amino, cyano, nitro groups, halogen and the like.
 上記において炭素数6~30のアリール基としては、フェニル基などの単環式アリール基およびナフチル、アントラセニル、フェナンスレニル、ピレニル、クリセニル、ナフタセニル、ベンズアントラセニル、アントラキノリル、フルオレニル、ナフトキノン、アントラキノンなどの縮合多環式アリール基が挙げられる。 In the above, the aryl group having 6 to 30 carbon atoms includes monocyclic aryl groups such as phenyl groups and condensed naphthyl, anthracenyl, phenanthrenyl, pyrenyl, chrysenyl, naphthacenyl, benzanthracenyl, anthraquinolyl, fluorenyl, naphthoquinone, anthraquinone, etc. And a polycyclic aryl group.
 炭素数4~30の複素環基としては、酸素、窒素、硫黄などの複素原子を1~3個含む環状のものが挙げられ、これらは同一であっても異なっていてもよく、具体例としてはチエニル、フラニル、ピラニル、ピロリル、オキサゾリル、チアゾリル、ピリジル、ピリミジル、ピラジニルなどの単環式複素環基およびインドリル、ベンゾフラニル、イソベンゾフラニル、ベンゾチエニル、イソベンゾチエニル、キノリル、イソキノリル、キノキサリニル、キナゾリニル、カルバゾリル、アクリジニル、フェノチアジニル、フェナジニル、キサンテニル、チアントレニル、フェノキサジニル、フェノキサチイニル、クロマニル、イソクロマニル、ジベンゾチエニル、キサントニル、チオキサントニル、ジベンゾフラニルなどの縮合多環式複素環基が挙げられる。 Examples of the heterocyclic group having 4 to 30 carbon atoms include cyclic groups containing 1 to 3 heteroatoms such as oxygen, nitrogen and sulfur, which may be the same or different. Are monocyclic heterocyclic groups such as thienyl, furanyl, pyranyl, pyrrolyl, oxazolyl, thiazolyl, pyridyl, pyrimidyl, pyrazinyl and indolyl, benzofuranyl, isobenzofuranyl, benzothienyl, isobenzothienyl, quinolyl, isoquinolyl, quinoxalinyl, quinazolinyl , Carbazolyl, acridinyl, phenothiazinyl, phenazinyl, xanthenyl, thiantenyl, phenoxazinyl, phenoxathinyl, chromanyl, isochromanyl, dibenzothienyl, xanthonyl, thioxanthonyl, dibenzofuranyl, etc. And the like.
 炭素数1~30のアルキル基としてはメチル、エチル、プロピル、ブチル、ヘキサデシル、オクダデシルなどの直鎖アルキル基、イソプロピル、イソブチル、sec-ブチル、tert-ブチル、イソペンチル、ネオペンチル、tert-ペンチル、イソヘキシルなどの分岐アルキル基、シクロプロピル、シクロブチル、シクロペンチル、シクロヘキシルなどのシクロアルキル基が挙げられる。また、炭素数2~30のアルケニル基としては、ビニル、アリル、1-プロペニル、イソプロペニル、1-ブテニル、2-ブテニル、3-ブテニル、1-メチル-1-プロペニルなどの直鎖または分岐状のものが挙げられる。さらに、炭素数2~30のアルキニル基としては、エチニル、1-プロピニル、2-プロピニル、1-ブチニル、2-ブチニル、3-ブチニル、1-メチル-2-プロピニルなどの直鎖または分岐状のものが挙げられる。 Examples of the alkyl group having 1 to 30 carbon atoms include linear alkyl groups such as methyl, ethyl, propyl, butyl, hexadecyl, okdadecyl, isopropyl, isobutyl, sec-butyl, tert-butyl, isopentyl, neopentyl, tert-pentyl, isohexyl, etc. And a cycloalkyl group such as cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl. Examples of the alkenyl group having 2 to 30 carbon atoms include linear or branched such as vinyl, allyl, 1-propenyl, isopropenyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-methyl-1-propenyl Can be mentioned. Further, examples of the alkynyl group having 2 to 30 carbon atoms include linear or branched ethynyl, 1-propynyl, 2-propynyl, 1-butynyl, 2-butynyl, 3-butynyl, 1-methyl-2-propynyl and the like. Things.
 上記の炭素数6~30のアリール基、炭素数4~30の複素環基、炭素数1~30のアルキル基、炭素数2~30のアルケニル基または炭素数2~30のアルキニル基は少なくとも1種の置換基を有してもよく、置換基の例としては、メチル、エチル、プロピル、ブチル、オクダデシルなど炭素数1~18の直鎖アルキル基;イソプロピル、イソブチル、sec-ブチル、tert-ブチルなど炭素数1~18の分岐アルキル基;シクロプロピル、シクロブチル、シクロペンチル、シクロヘキシルなど炭素数3~18のシクロアルキル基;ヒドロキシ基;メトキシ、エトキシ、プロポキシ、イソプロポキシ、ブトキシ、イソブトキシ、sec-ブトキシ、tert-ブトキシ、ドデシルオキシなど炭素数1~18の直鎖または分岐のアルコキシ基;アセチル、プロピオニル、ブタノイル、2-メチルプロピオニル、ヘプタノイル、2-メチルブタノイル、3-メチルブタノイル、オクタノイルなど炭素数2~18の直鎖または分岐のアルキルカルボニル基;ベンゾイル、ナフトイルなど炭素数7~11のアリールカルボニル基;メトキシカルボニル、エトキシカルボニル、プロポキシカルボニル、イソプロポキシカルボニル、ブトキシカルボニル、イソブトキシカルボニル、sec-ブトキシカルボニル、tert-ブトキシカルボニルなど炭素数2~19の直鎖または分岐のアルコキシカルボニル基;フェノキシカルボニル、ナフトキシカルボニルなど炭素数7~11のアリールオキシカルボニル基;フェニルチオカルボニル、ナフトキシチオカルボニルなど炭素数7~11のアリールチオカルボニル基;アセトキシ、エチルカルボニルオキシ、プロピルカルボニルオキシ、イソブチルカルボニルオキシ、sec-ブチルカルボニルオキシ、tert-ブチルカルボニルオキシ、オクタデシルカルボニルオキシなど炭素数2~19の直鎖または分岐のアシロキシ基;フェニルチオ、ビフェニリルチオ、メチルフェニルチオ、クロロフェニルチオ、ブロモフェニルチオ、フルオロフェニルチオ、ヒドロキシフェニルチオ、メトキシフェニルチオ、ナフチルチオ、4-[4-(フェニルチオ)ベンゾイル]フェニルチオ、4-[4-(フェニルチオ)フェノキシ]フェニルチオ、4-[4-(フェニルチオ)フェニル]フェニルチオ、4-(フェニルチオ)フェニルチオ、4-ベンゾイルフェニルチオ、4-ベンゾイル-クロロフェニルチオ、4-ベンゾイル-メチルチオフェニルチオ、4-(メチルチオベンゾイル)フェニルチオ、4-(p-tert-ブチルベンゾイル)フェニルチオ、など炭素数6~20のアリールチオ基;メチルチオ、エチルチオ、プロピルチオ、tert-ブチルチオ、ネオペンチルチオ、ドデシルチオなど炭素数1~18の直鎖または分岐のアルキルチオ基;フェニル、トリル、ジメチルフェニル、ナフチルなど炭素数6~10のアリール基;チエニル、フラニル、ピラニル、キサンテニル、クロマニル、イソクロマニル、キサントニル、チオキサントニル、ジベンゾフラニルなど炭素数4~20の複素環基;フェノキシ、ナフチルオキシなど炭素数6~10のアリールオキシ基;メチルスルフィニル、エチルスルフィニル、プロピルスルフィニル、tert-ペンチルスルフィニル、オクチルスルフィニルなど炭素数1~18の直鎖または分岐のアルキルスルフィニル基;フェニルスルフィニル、トリルスルフィニル、ナフチルスルフィニルなど炭素数6~10のアリールスルフィニル基;メチルスルホニル、エチルスルホニル、プロピルスルホニル、イソプロピルスルホニル、ブチルスルホニル、オクチルスルホニルなど炭素数1~18の直鎖または分岐のアルキルスルホニル基;フェニルスルホニル、トリルスルホニル(トシル基)、ナフチルスルホニルなど炭素数の6~10のアリールスルホニル基;アルキレンオキシ基;シアノ基;ニトロ基;フッ素、塩素、臭素、ヨウ素などのハロゲンなどが挙げられる。 The aryl group having 6 to 30 carbon atoms, the heterocyclic group having 4 to 30 carbon atoms, the alkyl group having 1 to 30 carbon atoms, the alkenyl group having 2 to 30 carbon atoms, or the alkynyl group having 2 to 30 carbon atoms is at least 1 Examples of the substituent may include a linear alkyl group having 1 to 18 carbon atoms such as methyl, ethyl, propyl, butyl, okdadecyl; isopropyl, isobutyl, sec-butyl, tert-butyl A branched alkyl group having 1 to 18 carbon atoms; a cycloalkyl group having 3 to 18 carbon atoms such as cyclopropyl, cyclobutyl, cyclopentyl and cyclohexyl; a hydroxy group; methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, sec-butoxy, straight-chain or branched alkoxy groups having 1 to 18 carbon atoms such as tert-butoxy and dodecyloxy; acetyl, Linear or branched alkylcarbonyl groups having 2 to 18 carbon atoms such as lopionyl, butanoyl, 2-methylpropionyl, heptanoyl, 2-methylbutanoyl, 3-methylbutanoyl, octanoyl; benzoyl, naphthoyl and the like having 7 to 11 carbon atoms Arylcarbonyl group; methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, sec-butoxycarbonyl, tert-butoxycarbonyl, etc. linear or branched alkoxycarbonyl group having 2 to 19 carbon atoms; phenoxy Aryloxycarbonyl groups having 7 to 11 carbon atoms such as carbonyl and naphthoxycarbonyl; arylthiocarbonyl groups having 7 to 11 carbon atoms such as phenylthiocarbonyl and naphthoxythiocarbonyl; Straight chain or branched acyloxy groups having 2 to 19 carbon atoms such as toxyl, ethylcarbonyloxy, propylcarbonyloxy, isobutylcarbonyloxy, sec-butylcarbonyloxy, tert-butylcarbonyloxy, octadecylcarbonyloxy; phenylthio, biphenylylthio, Methylphenylthio, chlorophenylthio, bromophenylthio, fluorophenylthio, hydroxyphenylthio, methoxyphenylthio, naphthylthio, 4- [4- (phenylthio) benzoyl] phenylthio, 4- [4- (phenylthio) phenoxy] phenylthio, 4 -[4- (phenylthio) phenyl] phenylthio, 4- (phenylthio) phenylthio, 4-benzoylphenylthio, 4-benzoyl-chlorophenylthio, 4-benzoyl-me Ruthiophenylthio, 4- (methylthiobenzoyl) phenylthio, 4- (p-tert-butylbenzoyl) phenylthio, etc. arylthio groups having 6 to 20 carbon atoms; methylthio, ethylthio, propylthio, tert-butylthio, neopentylthio, dodecylthio, etc. Straight chain or branched alkylthio group having 1 to 18 carbon atoms; aryl group having 6 to 10 carbon atoms such as phenyl, tolyl, dimethylphenyl, naphthyl; thienyl, furanyl, pyranyl, xanthenyl, chromanyl, isochromanyl, xanthonyl, thioxanthonyl, dibenzofuran A heterocyclic group having 4 to 20 carbon atoms such as nyl; an aryloxy group having 6 to 10 carbon atoms such as phenoxy and naphthyloxy; methylsulfinyl, ethylsulfinyl, propylsulfinyl, tert-pentylsulfinyl, octylsulfur Linear or branched alkylsulfinyl groups having 1 to 18 carbon atoms such as ynyl; arylsulfinyl groups having 6 to 10 carbon atoms such as phenylsulfinyl, tolylsulfinyl, naphthylsulfinyl; methylsulfonyl, ethylsulfonyl, propylsulfonyl, isopropylsulfonyl, butylsulfonyl A linear or branched alkylsulfonyl group having 1 to 18 carbon atoms such as octylsulfonyl; an arylsulfonyl group having 6 to 10 carbon atoms such as phenylsulfonyl, tolylsulfonyl (tosyl group) and naphthylsulfonyl; an alkyleneoxy group; a cyano group; Nitro group; halogen such as fluorine, chlorine, bromine and iodine.
 ヨードニウムカチオンの具体例としては、ジフェニルヨードニウム、ジ-p-トリルヨードニウム、ビス(4-ドデシルフェニル)ヨードニウム、ビス(4-メトキシフェニル)ヨードニウム、ビス(4-エトキシフェニル)ヨードニウム、(4-オクチルオキシフェニル)フェニルヨードニウム、ビス(4-デシルオキシ)フェニルヨードニウム、4-(2-ヒドロキシテトラデシルオキシ)フェニルフェニルヨードニウム、4-イソプロピルフェニル(p-トリル)ヨードニウムおよび4-イソブチルフェニル(p-トリル)ヨードニウムなどのヨードニウムイオンが挙げられる。 Specific examples of the iodonium cation include diphenyliodonium, di-p-tolyliodonium, bis (4-dodecylphenyl) iodonium, bis (4-methoxyphenyl) iodonium, bis (4-ethoxyphenyl) iodonium, (4-octyloxy Phenyl) phenyliodonium, bis (4-decyloxy) phenyliodonium, 4- (2-hydroxytetradecyloxy) phenylphenyliodonium, 4-isopropylphenyl (p-tolyl) iodonium, 4-isobutylphenyl (p-tolyl) iodonium, etc. Iodonium ion.
 式(IV)中の、Rfは水素原子の全て又は一部がフッ素原子で置換されていてもよいアルキル基又を表す。アルキル基の具体例としては、メチル、エチル、プロピル、ブチル、ペンチル、オクチルなどの直鎖アルキル基;イソプロピル、イソブチル、sec-ブチル、tert-ブチルなどの分岐アルキル基;さらにシクロプロピル、シクロブチル、シクロペンチル、シクロヘキシルなどのシクロアルキル基などが挙げられ、好ましい炭素数は1~4である。アルキル基は、水素原子の全て又は一部がフッ素原子で置換されていてもよく、その置換割合は、重合硬化性及び耐擦傷性の点から、80%以上、さらに90%以上、とくに100%であることが好ましい。 In the formula (IV), Rf represents an alkyl group in which all or part of the hydrogen atoms may be substituted with fluorine atoms. Specific examples of the alkyl group include linear alkyl groups such as methyl, ethyl, propyl, butyl, pentyl and octyl; branched alkyl groups such as isopropyl, isobutyl, sec-butyl and tert-butyl; and cyclopropyl, cyclobutyl and cyclopentyl. And a cycloalkyl group such as cyclohexyl, etc., and a preferable carbon number is 1 to 4. In the alkyl group, all or part of the hydrogen atoms may be substituted with fluorine atoms, and the substitution ratio is 80% or more, more preferably 90% or more, particularly 100% from the viewpoint of polymerization curability and scratch resistance. It is preferable that
 特に好ましいRfは、炭素数が1~4、かつフッ素原子の置換率が100%の直鎖または分岐アルキル基であり、具体例としては、CF、CFCF、(CFCF、CFCFCF、CFCFCFCF、(CFCFCF、CFCF(CF)CF、(CFCが挙げられる。 Particularly preferred Rf is a linear or branched alkyl group having 1 to 4 carbon atoms and a fluorine atom substitution rate of 100%. Specific examples include CF 3 , CF 3 CF 2 , (CF 3 ) 2 CF , CF 3 CF 2 CF 2, CF 3 CF 2 CF 2 CF 2, (CF 3) 2 CFCF 2, CF 3 CF 2 (CF 3) CF, include (CF 3) 3 C.
 別の実施形態において、特に好ましいRfは、炭素数が1~4の直鎖または分岐状の未置換のアルキル基であり、具体例としては、CH、CHCH、(CHCH、CHCHCH、CHCHCHCH、(CHCHCH、CHCH(CH)CH、(CHCが挙げられる。 In another embodiment, particularly preferred Rf is a linear or branched unsubstituted alkyl group having 1 to 4 carbon atoms, and specific examples include CH 3 , CH 3 CH 2 , (CH 3 ) 2. CH, CH 3 CH 2 CH 2 , CH 3 CH 2 CH 2 CH 2, (CH 3) 2 CHCH 2, CH 3 CH 2 (CH 3) CH, include (CH 3) 3 C.
 式(III)において、透明性の点から、[Y]が式(IV)で表されるリン酸アニオンであることが好ましい。 In formula (III), from the viewpoint of transparency, [Y] is preferably a phosphate anion represented by formula (IV).
 式(IV)においてRfの個数bは、0~5の整数であり、耐擦傷性の点から、さらに1~4であり、さらに特に2または3であることが好ましい。b個のRfはそれぞれ同一であっても異なっていてもよい。 In the formula (IV), the number b of Rf is an integer of 0 to 5, more preferably 1 to 4, more preferably 2 or 3, from the viewpoint of scratch resistance. The b Rf's may be the same or different.
 好ましいリン酸アニオンの具体例としては、フッ素化リン酸アニオンである([PF)や;[(CFCFPF、[(CFCFCFPF、[((CFCF)PF、[((CFCF)PF、[((CFCFCFPFおよび[((CFCFCFPFなどのフッ素化アルキルリン酸アニオンなどが挙げられる。硬化性、塗膜の透明性及び耐擦傷性の点から、アニオン種としては、フッ素化アルキルリン酸アニオンであることが特に好ましい。 Specific examples of preferred phosphate anions include fluorinated phosphate anions ([PF 6 ] ), [(CF 3 CF 2 ) 3 PF 3 ] , [(CF 3 CF 2 CF 2 ) 3 PF 3 ] , [((CF 3 ) 2 CF) 3 PF 3 ] , [((CF 3 ) 2 CF) 2 PF 4 ] , [((CF 3 ) 2 CFCF 2 ) 3 PF 3 ] and Fluorinated alkyl phosphate anions such as [((CF 3 ) 2 CFCF 2 ) 2 PF 4 ] and the like can be mentioned. From the viewpoints of curability, transparency of the coating film and scratch resistance, the anionic species is particularly preferably a fluorinated alkyl phosphate anion.
 別の実施形態において、特に好ましいリン酸アニオンの具体例としては、フッ素化リン酸アニオンである([PF)や;[(CHCHPF、[(CHCHCHPF、[((CHCH)PF、[((CHCH)PF、[((CHCHCHPFおよび[((CHCHCHPFなどのフッ素化アルキルリン酸アニオンなどが挙げられる。 In another embodiment, specific examples of particularly preferred phosphate anions include ([PF 6 ] ) and [(CH 3 CH 2 ) 3 PF 3 ] , [(CH 3 CH 2 CH 2 ) 3 PF 3 ] , [((CH 3 ) 2 CH) 3 PF 3 ] , [((CH 3 ) 2 CH) 2 PF 4 ] , [((CH 3 ) 2 CHCH 2 ) 3 PF 3] - and [((CH 3) 2 CHCH 2) 2 PF 4] - , and the like fluorinated alkyl phosphate anion, such as.
 ヨードニウム塩系光酸発生剤(b)としては、市販品を使用することができ、例えば、イルガキュア(登録商標)250(BASF社製、商品名、フッ素化リン酸ヨードニウム塩)、IK-1(サンアプロ社製、商品名、フッ素化アルキルリン酸ヨードニウム塩)、PI-2074(ローヌプラン社製、商品名、フッ素化フェニルホウ酸ヨードニウム塩)などが挙げられる。 As the iodonium salt photoacid generator (b), a commercially available product can be used. For example, Irgacure (registered trademark) 250 (trade name, fluorinated iodonium phosphate salt manufactured by BASF), IK-1 ( Examples include San Apro, trade name, fluorinated alkyl phosphate iodonium salt) and PI-2074 (Rhone Plan, trade name, fluorinated phenyl borate iodonium salt).
 光酸発生剤は、カチオン重合を阻害しない溶剤にあらかじめ溶かしておいてもよい。     The photoacid generator may be dissolved in advance in a solvent that does not inhibit cationic polymerization. .
 溶剤としては、プロピレンカーボネート、エチレンカーボネート、1、2-ブチレンカーボネート、ジメチルカーボネート及びジエチルカーボネートなどのカーボネート類;アセトン、メチルエチルケトン、シクロヘキサノン、メチルイソアミルケトン、2-ヘプタノンなどのケトン類;エチレングリコール、エチレングリコールモノアセテート、ジエチレングリコール、ジエチレングリコールモノアセテート、プロピレングリコール、プロピレングリコールモノアセテート、ジプロピレングリコール、及びジプロピレングリコールモノアセテートのモノメチルエーテル、モノエチルエーテル、モノプロピルエーテル、モノブチルエーテル、又はモノフェニルエーテルなどの多価アルコール類及びその誘導体;ジオキサンのような環式エーテル類;蟻酸エチル、乳酸メチル、乳酸エチル、酢酸メチル、酢酸エチル、酢酸ブチル、ピルビン酸メチル、アセト酢酸メチル、アセト酢酸エチル、ピルビン酸エチル、エトキシ酢酸エチル、メトキシプロピオン酸メチル、エトキシプロピオン酸エチル、2-ヒドロキシプロピオン酸メチル、2-ヒドロキシプロピオン酸エチル、2-ヒドロキシ-2-メチルプロピオン酸エチル、2-ヒドロキシ-3-メチルブタン酸メチル、3-メトキシブチルアセテート、3-メチル-3-メトキシブチルアセテートなどのエステル類;トルエン、キシレンなどの芳香族炭化水素類等が挙げられる。 Solvents include carbonates such as propylene carbonate, ethylene carbonate, 1,2-butylene carbonate, dimethyl carbonate and diethyl carbonate; ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl isoamyl ketone and 2-heptanone; ethylene glycol, ethylene glycol Multivalents such as monoacetate, diethylene glycol, diethylene glycol monoacetate, propylene glycol, propylene glycol monoacetate, dipropylene glycol, and dipropylene glycol monoacetate monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether, or monophenyl ether Alcohols and derivatives thereof; cyclic amines such as dioxane Ethyl formate, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, methyl acetoacetate, ethyl acetoacetate, ethyl pyruvate, ethyl ethoxyacetate, methyl methoxypropionate, ethyl ethoxypropionate Methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, methyl 2-hydroxy-3-methylbutanoate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl Examples include esters such as acetate; aromatic hydrocarbons such as toluene and xylene.
 光酸発生剤(b)の配合割合は、上記(a)成分の総合計量100質量部に対して、0.1~15質量部、さらに0.5~8質量部の範囲が好ましい。 The blending ratio of the photoacid generator (b) is preferably in the range of 0.1 to 15 parts by mass, more preferably 0.5 to 8 parts by mass with respect to 100 parts by mass of the total weight of the component (a).
 その他の光カチオン重合性化合物(c)
 本発明の光カチオン硬化性塗料組成物は、さらに、その他の光カチオン重合性基含有化合物(c)を含有してもよい。
Other photocationically polymerizable compounds (c)
The photocationic curable coating composition of the present invention may further contain other photocationically polymerizable group-containing compound (c).
 その他の光カチオン重合性基含有化合物(c)は、カチオンを連鎖担体(成長種)としてイオン重合する、前記(a)成分以外の化合物である。中でも、硬化性とコストバランスの点から、光カチオン重合性基を1個以上有する化合物、特に該光カチオン重合性基がエポキシ基及び/又はオキセタン環である、エポキシ基含有化合物及び/又はオキセタン化合物であることが好ましい。エポキシ基としては、オキシラニル基、グリシジル基、脂環式エポキシ基(エポキシシクロアルキル基等)などが挙げられるが、具体的な化合物としては、グリシジル基を1個以上有するグリシジル基含有化合物、オキセタン環を1個以上有するオキセタン化合物、オキセタン環とエポキシ基とを1個以上ずつ有するエポキシ基含有オキセタン化合物(以下、エポキシ基含有オキセタン化合物という)、脂環式エポキシ基を1個以上有する脂環式エポキシ基含有化合物郡から選ばれる少なくとも1種であることが好ましい。 The other photocationically polymerizable group-containing compound (c) is a compound other than the component (a), which is ionically polymerized using a cation as a chain carrier (growth seed). Among them, from the viewpoint of curability and cost balance, a compound having one or more photocationically polymerizable groups, particularly an epoxy group-containing compound and / or an oxetane compound in which the photocationically polymerizable group is an epoxy group and / or an oxetane ring. It is preferable that Examples of the epoxy group include an oxiranyl group, a glycidyl group, and an alicyclic epoxy group (such as an epoxycycloalkyl group). Specific examples of the compound include a glycidyl group-containing compound having one or more glycidyl groups, and an oxetane ring. An oxetane compound having one or more, an epoxy group-containing oxetane compound having at least one oxetane ring and an epoxy group (hereinafter referred to as an epoxy group-containing oxetane compound), and an alicyclic epoxy having at least one alicyclic epoxy group It is preferably at least one selected from the group-containing compound group.
 グリシジル基含有化合物は、分子中にグリシジル基を少なくとも1個有する化合物であり、グリシジル基を1個有する化合物としては、フェニルグリシジルエーテル、ブチルグリシジルエーテル等があり、エポキシ基を2個以上有する化合物としては、エチレングリコールジグリシジルエーテル、ヘキサンジオールジグリシジルエーテル、テトラエチレングリコールジグリシジルエーテル、トリメチロールプロパントリグリシジルエーテル、ビスフェノールAジグリシジルエーテル、水添ビスフェノールAジグリシジルエーテル、ノボラック型エポキシ化合物、グリシジル基含有アクリル樹脂などが挙げられる。 The glycidyl group-containing compound is a compound having at least one glycidyl group in the molecule, and examples of the compound having one glycidyl group include phenyl glycidyl ether and butyl glycidyl ether, and a compound having two or more epoxy groups. Contains ethylene glycol diglycidyl ether, hexanediol diglycidyl ether, tetraethylene glycol diglycidyl ether, trimethylolpropane triglycidyl ether, bisphenol A diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, novolac type epoxy compound, glycidyl group An acrylic resin etc. are mentioned.
 グリシジル基含有アクリル樹脂は、例えば、グリシジル基含有重合性不飽和モノマー(以下、「グリシジルモノマー」と略称することがある)及び必要に応じて、これらのモノマーと共重合可能なその他の重合性不飽和モノマー(以下、「他のモノマー」と略称することがある)を共重合することにより得られる。 The glycidyl group-containing acrylic resin is, for example, a glycidyl group-containing polymerizable unsaturated monomer (hereinafter sometimes abbreviated as “glycidyl monomer”) and, if necessary, other polymerizable monomers copolymerizable with these monomers. It is obtained by copolymerizing a saturated monomer (hereinafter, sometimes abbreviated as “other monomer”).
 上記グリシジルモノマーとしては、グリシジル基を含有する重合性不飽和モノマーであれば特に制限なく使用することができるが、その代表例として、グリシジルアクリレート、グリシジルメタクリレート、メチルグリシジルアクリレート、メチルグリシジルメタクリレート、アリルグリシジルエーテル、ビニルグリシジルエーテルなどを挙げることができる。これらのうち、グリシジルアクリレート、グリシジルメタクリレートが好適に使用される。 As the glycidyl monomer, any polymerizable unsaturated monomer containing a glycidyl group can be used without particular limitation. Typical examples thereof include glycidyl acrylate, glycidyl methacrylate, methyl glycidyl acrylate, methyl glycidyl methacrylate, and allyl glycidyl. Examples thereof include ether and vinyl glycidyl ether. Of these, glycidyl acrylate and glycidyl methacrylate are preferably used.
 上記グリシジルモノマーと共重合可能な他のモノマーは、得られるグリシジル基含有アクリル樹脂の目的とする性能などに応じ、必要に応じて適宜使用されるモノマーであり、例えば、メチルアクリレート、メチルメタクリレート、エチルアクリレート、エチルメタクリレート、n-,i-又はt-ブチルアクリレート、n-,i-もしくはt-ブチルメタアクリレート、ヘキシルアクリレート、ヘキシルメタクリレート、オクチルアクリレート、オクチルメタクリレート、ラウリルアクリレート、ラウリルメタクリレート、ステアリルアクリレート、ステアリルメタクリレート、シクロヘキシルアクリレート、シクロヘキシルメタクリレート等の如きアクリル酸又はメタクリル酸の炭素数1~24のアルキル又はシクロアルキルエステル;2-ヒドロキシエチルアクリレート、2-ヒドロキシエチルメタクリレート、2-ヒドロキシプロピルアクリレート、2-ヒドロキシプロピルメタクリレート、4-ヒドロキシブチルアクリレート、4-ヒドロキシブチルメタクリレートなどのアクリル酸又はメタクリル酸の炭素数1~8個のヒドロキシアルキルエステル;アクリル酸、メタクリル酸、マレイン酸、イタコン酸、クロトン酸などのα,β-エチレン性不飽和カルボン酸;アクリルアミド、メタクリルアミド、N-メチルアクリルアミド、N-エチルメタクリルアミド、ジアセトンアクリルアミド、N-メチロールアクリルアミド、N-メチロールメタクリルアミド、N-メトキシメチルアクリルアミド、N-ブトキシメチルアクリルアミドなどのアクリルアミドもしくはメタクリルアミド又はこれらの誘導体;スチレン、ビニルトルエン、α-メチルスチレンなどの芳香族ビニル単量体;プロピオン酸ビニル、酢酸ビニル、アクリロニトリル、メタクリロニトリル、ビニルピバレート、ベオバモノマー(シェル化学社製、分岐脂肪酸のビニルエステル)、サイラプレーン(登録商標)FM0711、同FM0721、同FM0725(以上、いずれもチッソ社製、末端にメタクリロイル基を有するポリジメチルシロキサンマクロモノマー)などのその他のビニル単量体を挙げることができる。これらのモノマーのうち、スチレン、メチルメタクリレートが特に好適である。 The other monomer copolymerizable with the glycidyl monomer is a monomer that is appropriately used as required according to the intended performance of the resulting glycidyl group-containing acrylic resin, such as methyl acrylate, methyl methacrylate, ethyl Acrylate, ethyl methacrylate, n-, i- or t-butyl acrylate, n-, i- or t-butyl methacrylate, hexyl acrylate, hexyl methacrylate, octyl acrylate, octyl methacrylate, lauryl acrylate, lauryl methacrylate, stearyl acrylate, stearyl C1-C24 alkyl or cycloalkyl ester of acrylic acid or methacrylic acid such as methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, etc. 1 to 8 carbon atoms of acrylic acid or methacrylic acid such as 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate Hydroxyalkyl esters; α, β-ethylenically unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic acid, itaconic acid, crotonic acid; acrylamide, methacrylamide, N-methyl acrylamide, N-ethyl methacrylamide, diacetone acrylamide N-methylolacrylamide, N-methylolmethacrylamide, N-methoxymethylacrylamide, N-butoxymethylacrylamide, etc. Rilamide or derivatives thereof; aromatic vinyl monomers such as styrene, vinyltoluene, α-methylstyrene; vinyl propionate, vinyl acetate, acrylonitrile, methacrylonitrile, vinyl pivalate, and veova monomer (made by Shell Chemical Co., vinyl of branched fatty acids) Ester), Silaplane (registered trademark) FM0711, FM0721, FM0721 (all of which are manufactured by Chisso Corp., polydimethylsiloxane macromonomer having a methacryloyl group at the end). . Of these monomers, styrene and methyl methacrylate are particularly preferred.
 グリシジル基含有アクリル樹脂は、上記グリシジルモノマー及び必要に応じて他のモノマーからなるモノマー成分を、例えばラジカル重合開始剤の存在下または不存在下に、溶液重合、塊状重合、乳化重合、懸濁重合などのそれ自体既知の重合方法にて重合することにより得ることができる。グリシジル基含有アクリル樹脂は、重量平均分子量が一般に1,000~100,000、特に2,000~50,000の範囲内にあることが好適である。 The glycidyl group-containing acrylic resin is a solution polymerization, bulk polymerization, emulsion polymerization, suspension polymerization of the monomer component consisting of the above glycidyl monomer and other monomers as required, for example, in the presence or absence of a radical polymerization initiator. It can obtain by superposing | polymerizing by the polymerization method known per se. The glycidyl group-containing acrylic resin preferably has a weight average molecular weight in the range of 1,000 to 100,000, particularly 2,000 to 50,000.
 グリシジル基含有アクリル樹脂の重合における各モノマー成分の配合割合は、モノマー成分合計量100質量部に対し、以下の範囲内にあることが好適である。 The blending ratio of each monomer component in the polymerization of the glycidyl group-containing acrylic resin is preferably within the following range with respect to 100 parts by mass of the total amount of monomer components.
 グリシジルモノマー:10~100質量部、好ましくは20~80質量部、
 他のモノマー:0~90質量部、好ましくは20~80質量部。
Glycidyl monomer: 10 to 100 parts by mass, preferably 20 to 80 parts by mass,
Other monomers: 0 to 90 parts by mass, preferably 20 to 80 parts by mass.
 グリシジル基含有アクリル樹脂において、グリシジル基の濃度は、一般に0.1~7.0当量/kg、特に0.2~5.0当量/kgの範囲内にあることが好ましい。 In the glycidyl group-containing acrylic resin, the concentration of glycidyl groups is preferably in the range of 0.1 to 7.0 equivalent / kg, particularly 0.2 to 5.0 equivalent / kg.
 オキセタン化合物は、分子中にオキセタン環を少なくとも1個以上有する化合物であり、オキセタン環を1~3個有する化合物であることが好ましい。 The oxetane compound is a compound having at least one oxetane ring in the molecule, and is preferably a compound having 1 to 3 oxetane rings.
 オキセタン環を1個有する化合物は、3-エチル-3-メトキシメチルオキセタン、3-エチル-3-エトキシメチルオキセタン、3-エチル-3-ブトキシメチルオキセタン、3-エチル-3-ヘキシルオキシメチルオキセタン、3-メチル-3-ヒドロキシメチルオキセタン、3-エチル-3-ヒドロキシメチルオキセタン、3-エチル-3-アリルオキシメチルオキセタン、3-エチル-3-(2′-ヒドロキシエチル)オキシメチルオキセタン、3-エチル-3-(2′-ヒドロキシ-3′-フェノキシプロピル)オキシメチルオキセタン、3-エチル-3-(2′-ヒドロキシ-3′-ブトキシプロピル)オキシメチルオキセタン、3-エチル-3-〔2′-(2′′-エトキシエチル)オキシメチル〕オキセタン、3-エチル-3-(2′-ブトキシエチル)オキシメチルオキセタン、3-エチル-3-ベンジルオキシメチルオキセタン、3-エチル-3-(p-tert-ブチルベンジルオキシメチル)オキセタン、3-エチル-3-(フェノキシメチル)オキサタン、3-エチルー3-(2-エチルヘキシロキシメチル)オキセタンなどが挙げられる。 Compounds having one oxetane ring include 3-ethyl-3-methoxymethyloxetane, 3-ethyl-3-ethoxymethyloxetane, 3-ethyl-3-butoxymethyloxetane, 3-ethyl-3-hexyloxymethyloxetane, 3-methyl-3-hydroxymethyloxetane, 3-ethyl-3-hydroxymethyloxetane, 3-ethyl-3-allyloxymethyloxetane, 3-ethyl-3- (2'-hydroxyethyl) oxymethyloxetane, 3- Ethyl-3- (2′-hydroxy-3′-phenoxypropyl) oxymethyloxetane, 3-ethyl-3- (2′-hydroxy-3′-butoxypropyl) oxymethyloxetane, 3-ethyl-3- [2 '-(2 "-ethoxyethyl) oxymethyl] oxetane, 3-ethyl 3- (2'-butoxyethyl) oxymethyloxetane, 3-ethyl-3-benzyloxymethyloxetane, 3-ethyl-3- (p-tert-butylbenzyloxymethyl) oxetane, 3-ethyl-3- (phenoxy Methyl) oxatan, 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane and the like.
 オキセタン環を2個以上(例えば、2~3個、好ましくは2個)有する化合物は、光カチオン重合可能なオキセタン環を分子中に少なくとも2個有する化合物(以下、ポリオキセタン化合物という)であり、例えば、ジ[1-エチル(3-オキセタニル)]メチルエーテル;キシリレンビスオキセタン;3-低級アルキル-3-ヒドロキシオキセタンとポリイソシアネート化合物との反応物;3-低級アルキル-3-ヒドロキシオキセタンとアルコールとの反応物;3-低級アルキル-3-ヒドロキシオキセタンとポリカルボン酸との反応物等が挙げられる。上記3-低級アルキル-3-ヒドロキシオキセタンとしては、例えば、3-メチル-3-ヒドロキシメチルオキセタン、3-エチル-3-ヒドロキシメチルオキセタン等が挙げられる。 The compound having two or more oxetane rings (for example, 2 to 3, preferably 2) is a compound having at least two oxetane rings capable of photocationic polymerization (hereinafter referred to as a polyoxetane compound). For example, di [1-ethyl (3-oxetanyl)] methyl ether; xylylene bisoxetane; reaction product of 3-lower alkyl-3-hydroxyoxetane and polyisocyanate compound; 3-lower alkyl-3-hydroxyoxetane and alcohol A reaction product of 3-lower alkyl-3-hydroxyoxetane with a polycarboxylic acid, and the like. Examples of the 3-lower alkyl-3-hydroxyoxetane include 3-methyl-3-hydroxymethyloxetane and 3-ethyl-3-hydroxymethyloxetane.
 エポキシ基含有オキセタン化合物は、分子中にオキセタン環とエポキシ基とをそれぞれ1個以上有する化合物(以下、エポキシ基含有オキセタン化合物という)であり、好ましくは分子量が1,000未満の化合物を包含し、具体的には、例えば下記式(VI)で示される化合物を挙げることができる。 The epoxy group-containing oxetane compound is a compound having one or more oxetane rings and epoxy groups in the molecule (hereinafter referred to as an epoxy group-containing oxetane compound), preferably including a compound having a molecular weight of less than 1,000, Specific examples include compounds represented by the following formula (VI).
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
 式(VI)中、Rは、水素原子、フッ素原子、炭素原子数1~6の直鎖もしくは分岐アルキル基、炭素原子数1~6の直鎖もしくは分岐フルオロアルキル基又はアリル基を表し、Rはエポキシ基を表わす。 In the formula (VI), R 4 represents a hydrogen atom, a fluorine atom, a linear or branched alkyl group having 1 to 6 carbon atoms, a linear or branched fluoroalkyl group having 1 to 6 carbon atoms, or an allyl group, R 5 represents an epoxy group.
 エポキシ含有オキセタン化合物の代表例としては、上記式(VI)において、Rがエチル基であり且つRがグリシジル基又は3、4-エポキシシクロヘキシルメチル基である場合の化合物が挙げられる。 A typical example of the epoxy-containing oxetane compound is a compound in the above formula (VI) in which R 4 is an ethyl group and R 5 is a glycidyl group or a 3,4-epoxycyclohexylmethyl group.
 脂環式エポキシ基含有化合物は、かかる脂環式エポキシ基を分子中に少なくとも1個有する化合物であり前記化合物(a)以外の化合物であり、脂環式エポキシ基を好ましくは2~3個有し、かつ重量平均分子量が2,000未満、さらに100~1,500の化合物であることが好ましい。また、脂環式エポキシ基含有化合物は、反応速度の点から、50~500g/当量、特に100~300g/当量のエポキシ当量を有することが好ましい。ここで、エポキシ当量とは、JIS K7236に準拠した方法により測定した1グラム当量のエポキシ基を含む樹脂のグラム数である。 The alicyclic epoxy group-containing compound is a compound having at least one such alicyclic epoxy group in the molecule and is a compound other than the compound (a), and preferably has 2 to 3 alicyclic epoxy groups. And a compound having a weight average molecular weight of less than 2,000 and more preferably 100 to 1,500. The alicyclic epoxy group-containing compound preferably has an epoxy equivalent of 50 to 500 g / equivalent, particularly 100 to 300 g / equivalent, from the viewpoint of reaction rate. Here, the epoxy equivalent is the number of grams of resin containing 1 gram equivalent of an epoxy group measured by a method according to JIS K7236.
 該脂環式エポキシ基含有化合物の具体例としては、ジシクロペンタジエンジオキサイド、ビス(2、3-エポキシシクロペンチル)エーテル、エポキシシクロヘキセンカルボン酸エチレングリコールジエステル、ビス(3、4-エポキシシクロヘキシルメチル)アジペート、ビス(4、5-エポキシ-2-メチルシクロヘキシルメチル)アジペート、エチレングリコール-ビス(3、4-エポキシシクロヘキサンカルボキシレート)、3´、4´-エポキシシクロヘキシルメチル-3、4-エポキシシクロヘキサンカルボキシレート、3、4-エポキシ-6-メチルシクロヘキシルメチル-3、4-エポキシ-6-メチルシクロヘキサンカルボキシレート、1、2、5、6-ジエポキシ-4、7-メタノペルヒドロインデン、2-(3、4-エポキシシクロヘキシル)-3´、4´-エポキシ-1、3-ジオキサン-5-スピロシクロヘキサン、1、2-エチレンジオキシ-ビス(3、4-エポキシシクロヘキシルメタン)、ジ-2、3-エポキシシクロペンチルエ-テル、4´、5´-エポキシ-2´-メチルシクロヘキシルメチル-4、5-エポキシ-2-メチルシクロヘキサンカルボキシート、4-オキシラニル-1、2-エポキシシクロヘキサンなどが挙げられる。 Specific examples of the alicyclic epoxy group-containing compound include dicyclopentadiene dioxide, bis (2,3-epoxycyclopentyl) ether, epoxycyclohexenecarboxylic acid ethylene glycol diester, bis (3,4-epoxycyclohexylmethyl) adipate Bis (4,5-epoxy-2-methylcyclohexylmethyl) adipate, ethylene glycol-bis (3,4-epoxycyclohexanecarboxylate), 3 ′, 4′-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate 3,4-epoxy-6-methylcyclohexylmethyl-3,4-epoxy-6-methylcyclohexanecarboxylate, 1,2,5,6-diepoxy-4,7-methanoperhydroindene, 2- (3, 4- Epoxycyclohexyl) -3 ', 4'-epoxy-1,3-dioxane-5-spirocyclohexane, 1,2-ethylenedioxy-bis (3,4-epoxycyclohexylmethane), di-2,3-epoxycyclopentyl Examples include ether, 4 ′, 5′-epoxy-2′-methylcyclohexylmethyl-4, 5-epoxy-2-methylcyclohexanecarboxylate, 4-oxiranyl-1, 2-epoxycyclohexane and the like.
 該脂環式エポキシ基含有化合物としては市販品を用いることができ、例えば、セロキサイド(登録商標)2000、セロキサイド(登録商標)2021P、セロキサイド(登録商標)2081、セロキサイド(登録商標)3000(いずれも、商品名、ダイセル化学社製)等が挙げられる。 Commercially available products can be used as the alicyclic epoxy group-containing compound. For example, Celoxide (registered trademark) 2000, Celoxide (registered trademark) 2021P, Celoxide (registered trademark) 2081, Celoxide (registered trademark) 3000 (all , Trade name, manufactured by Daicel Chemical Industries, Ltd.).
 さらに、その他の光カチオン重合性基含有化合物(c)としては、前記化合物郡以外に、例えば、ブチルビニルエーテル、イソブチルビニルエーテル、オクタデシルビニルエーテル、シクロヘキシルビニルエーテル、ブタンジオールモノビニルエーテル、ブタンジオールジビニルエーテル、シクロヘキサンジメタノールジビニルエーテル、シクロヘキサンジメタノールモノビニルエーテル、ジエチレングリコールジビニルエーテル、エチレングリコールジビニルエーテル、エチレングリコールモノビニルエーテル、ジエチレングリコールモノビニルエーテル、トリエチレングリコールジビニルエーテル、トリエチレングリコールモノビニルエーテル、テトラエチレングリコールジビニルエーテル、テトラエチレングリコールモノビニルエーテル、tert-ブチルビニルエーテル、tert-アシルビニルエーテル、エチルヘキシルビニルエーテル、ドデシルビニルエーテル、エチレングリコールブチルビニルエーテル、ヘキサンジオールジビニルエーテル、ヘキサンジオールモノビニルエーテル、トリメチロールプロパントリビニルエーテル、トリメチロールプロパンジビニルエーテル、トリメチロールプロパンモノビニルエーテル、ネオペンチルグリコールジビニルエーテル、ネオペンチルグリコールモノビニルエーテル、グリセロールジビニルエーテル、グリセロールトリビニルエーテル、ジグリセロールトリビニルエーテル、ソルビトールテトラビニルエーテル、アリルビニルエーテル、4-ビニルエーテルスチレン、ハイドロキノンジビニルエーテル、フェニルビニルエーテル等の化合物、あるいは、オキシラニル基含有エポキシシクロヘキサンのアルコール付加物、水酸基をビニルエーテル変性したモノマー又はポリマー、その他スチレン、αメチルスチレン、ジビニルベンゼン、ポリブタジエン系ポリマー、ビニルカルバゾール等のカチオン重合性を有するモノマーあるいはポリマーなどで、単独あるいは数種類混合して用いても差し支えない。 Further, as other photocationically polymerizable group-containing compound (c), in addition to the above compound group, for example, butyl vinyl ether, isobutyl vinyl ether, octadecyl vinyl ether, cyclohexyl vinyl ether, butanediol monovinyl ether, butanediol divinyl ether, cyclohexanedimethanol Divinyl ether, cyclohexanedimethanol monovinyl ether, diethylene glycol divinyl ether, ethylene glycol divinyl ether, ethylene glycol monovinyl ether, diethylene glycol monovinyl ether, triethylene glycol divinyl ether, triethylene glycol monovinyl ether, tetraethylene glycol divinyl ether, tetraethylene glycol monovinyl ether Tert-butyl vinyl ether, tert-acyl vinyl ether, ethylhexyl vinyl ether, dodecyl vinyl ether, ethylene glycol butyl vinyl ether, hexanediol divinyl ether, hexanediol monovinyl ether, trimethylolpropane trivinyl ether, trimethylolpropane divinyl ether, trimethylolpropane monovinyl ether , Neopentyl glycol divinyl ether, neopentyl glycol monovinyl ether, glycerol divinyl ether, glycerol trivinyl ether, diglycerol trivinyl ether, sorbitol tetravinyl ether, allyl vinyl ether, 4-vinyl ether styrene, hydroquinone divinyl ether, phenyl vinyl Compounds such as ethers, or alcohol adducts of oxiranyl group-containing epoxycyclohexane, monomers or polymers in which the hydroxyl group is modified with vinyl ether, and other monomers having cationic polymerization properties such as styrene, α-methylstyrene, divinylbenzene, polybutadiene-based polymers, and vinylcarbazole Alternatively, a polymer or the like may be used alone or in combination.
 その他の光カチオン重合性化合物(c)の含有量は、耐カール性の点から、(a)成分100質量部に対して、50質量部以下、30質量部以下が好ましい。 The content of the other photocationically polymerizable compound (c) is preferably 50 parts by mass or less and 30 parts by mass or less with respect to 100 parts by mass of the component (a) from the viewpoint of curling resistance.
 本発明の光カチオン硬化性塗料組成物は、無溶剤でもよく、さらに有機溶剤を含有してもよい。   The photocationic curable coating composition of the present invention may be solventless or may further contain an organic solvent. *
 有機溶剤としては、メタノール、エタノール、ブタノール、メチルイソブチルカルビノール、2-エチルヘキサノール、ベンジルアルコール等のアルコール系溶剤;アセトン、メチルイソブチルケトン等のケトン系溶剤;酢酸エチル、酢酸ブチル、安息香酸メチル、プロピオン酸メチル等のエステル系溶剤;シクロヘキサノン、テトラヒドロフラン、ジオキサン、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテル、イソプロピルグリコール等のエーテル系溶剤;ジエチレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、3-メトキシブチルアセテート等のグリコールエーテル芳香族炭化水素系溶剤、脂肪族炭化水素類系溶剤が挙げられる。これらは、粘度の調整、塗布性の調整等の目的に応じて適宜組み合わせて使用することができる。 Examples of the organic solvent include alcohol solvents such as methanol, ethanol, butanol, methyl isobutyl carbinol, 2-ethyl hexanol and benzyl alcohol; ketone solvents such as acetone and methyl isobutyl ketone; ethyl acetate, butyl acetate, methyl benzoate, Ester solvents such as methyl propionate; ether solvents such as cyclohexanone, tetrahydrofuran, dioxane, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, isopropyl glycol; diethylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3 -Glycol ether aromatic hydrocarbon solvents such as methoxybutyl acetate, aliphatic hydrocarbons Agents. These can be used in appropriate combination depending on the purpose such as adjustment of viscosity and adjustment of coating property.
 仕上がり性と硬化性の点から、上記有機溶剤の中でも、沸点100℃以下の有機溶剤を用いることが好ましく、中でも、作業性と溶解性の点から、メタノール、エタノール、アセトン、メチルエチルケトン、酢酸エチル、ジメトキシエタンの中から選ばれる少なくとも1種を用いることが好ましい。 Among the above organic solvents, it is preferable to use an organic solvent having a boiling point of 100 ° C. or less from the viewpoint of finish and curability. Among them, methanol, ethanol, acetone, methyl ethyl ketone, ethyl acetate, It is preferable to use at least one selected from dimethoxyethane.
 本発明の組成物はさらに、増感剤(d)を含有しても良い。上記増感剤(d)は、通常、前記ヨードニウム塩系光酸発生剤(b)が示す極大吸収波長よりも長い波長に吸収を示し、ヨードニウム塩系光酸発生剤(b)による重合開始反応を促進させる化合物である。 The composition of the present invention may further contain a sensitizer (d). The sensitizer (d) usually absorbs at a wavelength longer than the maximum absorption wavelength indicated by the iodonium salt photoacid generator (b), and initiates polymerization by the iodonium salt photoacid generator (b). It is a compound that promotes.
 増感剤(d)は、350nmよりも長い波長の光に吸収を示す化合物であることが好ましい。前記のヨードニウム塩系光酸発生剤(b)は、通常300nm付近またはそれよりも短い波長に極大吸収を示し、その付近の波長の光に感応してカチオン種またはルイス酸を発生し、シルセスキオキサン化合物(a)のカチオン重合を開始させるが、上記のような増感剤(d)を配合すれば、それよりも長い波長、特に350nmよりも長い波長の光にも感応するようになる。 The sensitizer (d) is preferably a compound that absorbs light having a wavelength longer than 350 nm. The iodonium salt-based photoacid generator (b) usually exhibits maximum absorption at a wavelength near or shorter than 300 nm, generates a cationic species or a Lewis acid in response to light at a wavelength near the iodonium salt photoacid generator, Cationic polymerization of the oxan compound (a) is initiated, but if the sensitizer (d) as described above is added, it will be sensitive to light having a longer wavelength, particularly longer than 350 nm. .
 上記増感剤(d)としては、例えば、アントラセン系増感剤、チオキサントン系増感剤等が挙げられる。 Examples of the sensitizer (d) include anthracene sensitizers and thioxanthone sensitizers.
 上記アントラセン系増感剤の具体例としては、例えば、
9,10-ジメトキシアントラセン、
9,10-ジエトキシアントラセン、
9,10-ジプロポキシアントラセン、
9,10-ジイソプロポキシアントラセン、
9,10-ジブトキシアントラセン、
9,10-ジペンチルオキシアントラセン、
9,10-ジヘキシルオキシアントラセン、
9,10-ビス(2-メトキシエトキシ)アントラセン、
9,10-ビス(2-エトキシエトキシ)アントラセン、
9,10-ビス(2-ブトキシエトキシ)アントラセン、
9,10-ビス(3-ブトキシプロポキシ)アントラセン、
2-メチル-または2-エチル-9,10-ジメトキシアントラセン、
2-メチル-または2-エチル-9,10-ジエトキシアントラセン、
2-メチル-または2-エチル-9,10-ジプロポキシアントラセン、
2-メチル-または2-エチル-9,10-ジイソプロポキシアントラセン、
2-メチル-または2-エチル-9,10-ジブトキシアントラセン、
2-メチル-または2-エチル-9,10-ジペンチルオキシアントラセン、
2-メチル-または2-エチル-9,10-ジヘキシルオキシアントラセン、
等が挙げられる。
Specific examples of the anthracene sensitizer include, for example,
9,10-dimethoxyanthracene,
9,10-diethoxyanthracene,
9,10-dipropoxyanthracene,
9,10-diisopropoxyanthracene,
9,10-dibutoxyanthracene,
9,10-dipentyloxyanthracene,
9,10-dihexyloxyanthracene,
9,10-bis (2-methoxyethoxy) anthracene,
9,10-bis (2-ethoxyethoxy) anthracene,
9,10-bis (2-butoxyethoxy) anthracene,
9,10-bis (3-butoxypropoxy) anthracene,
2-methyl- or 2-ethyl-9,10-dimethoxyanthracene,
2-methyl- or 2-ethyl-9,10-diethoxyanthracene,
2-methyl- or 2-ethyl-9,10-dipropoxyanthracene,
2-methyl- or 2-ethyl-9,10-diisopropoxyanthracene,
2-methyl- or 2-ethyl-9,10-dibutoxyanthracene,
2-methyl- or 2-ethyl-9,10-dipentyloxyanthracene,
2-methyl- or 2-ethyl-9,10-dihexyloxyanthracene,
Etc.
 また、前記チオキサントン系増感剤としては、例えば、2-イソプロピルチオキサントン、4-イソプロピルチオキサントン、2,4-ジエチルチオキサントン、クロロプロポキシチオキサントン等が挙げられる。 Examples of the thioxanthone sensitizer include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, chloropropoxythioxanthone, and the like.
 上記増感剤(d)としては市販品を使用することができる。前記アントラセン系増感剤の市販品としては、例えば、「アントラキュアー(登録商標) UVS-1331」、「アントラキュアー(登録商標) UVS-1221」(以上、川崎化成工業社製)等が挙げられる。
また、上記チオキサントン系増感剤の市販品としては、例えば、「KAYACURE(登録商標) DETX-S」(日本化薬社製)、「Speedcure(登録商標) ITX」、「Speedcure(登録商標) DETX」、「Speedcure(登録商標) CPTX」(以上、LAMBSON社製)等が挙げられる。
A commercial item can be used as said sensitizer (d). Examples of commercially available anthracene sensitizers include “Anthracure (registered trademark) UVS-1331”, “Anthracure (registered trademark) UVS-1221” (manufactured by Kawasaki Kasei Kogyo Co., Ltd.) and the like. .
Examples of commercially available thioxanthone sensitizers include “KAYACURE (registered trademark) DETX-S” (manufactured by Nippon Kayaku Co., Ltd.), “Speedcure (registered trademark) ITX”, and “Speedcure (registered trademark) DETX”. "Speedcure (registered trademark) CPTX" (manufactured by LAMBSON).
 本発明の塗料組成物においては、上記増感剤(d)としてアントラセン系増感剤を使用することが好ましい。 In the coating composition of the present invention, an anthracene sensitizer is preferably used as the sensitizer (d).
 本発明の塗料組成物が上記増感剤を含有する場合、該増感剤の固形分含有量は、形成される塗膜の耐擦傷性及び塗料組成物の貯蔵安定性の観点から、前記シルセスキオキサン化合物(a)の固形分100質量部に対して、0.01~10質量部、好ましくは0.05~8質量部、さらに好ましくは0.1~5質量部の範囲内であることが好適である。 When the coating composition of the present invention contains the above sensitizer, the solid content of the sensitizer is selected from the above-mentioned sills from the viewpoint of the scratch resistance of the formed coating film and the storage stability of the coating composition. It is in the range of 0.01 to 10 parts by weight, preferably 0.05 to 8 parts by weight, more preferably 0.1 to 5 parts by weight with respect to 100 parts by weight of the solid content of the sesquioxane compound (a). Is preferred.
 本発明の組成物はさらに、補助増感剤(e)を含有しても良い。該補助増感剤(e)は、上記増感剤の作用を一層促進させる化合物である。 The composition of the present invention may further contain an auxiliary sensitizer (e). The auxiliary sensitizer (e) is a compound that further promotes the action of the sensitizer.
 上記補助増感剤(e)としては特に制限されず、各種のものを使用することができるが、例えば、ナフタレン系補助増感剤を好適に使用することができる。該ナフタレン系補助増感剤の具体例としては、例えば、
 4-メトキシ-1-ナフトール、
4-エトキシ-1-ナフトール、
4-プロポキシ-1-ナフトール、
4-ブトキシ-1-ナフトール、
4-ヘキシルオキシ-1-ナフトール、
1,4-ジメトキシナフタレン、
1-エトキシ-4-メトキシナフタレン、
1,4-ジエトキシナフタレン、
1,4-ジプロポキシナフタレン、
1,4-ジブトキシナフタレン
等が挙げられる。
The auxiliary sensitizer (e) is not particularly limited, and various types can be used. For example, a naphthalene-based auxiliary sensitizer can be preferably used. Specific examples of the naphthalene-based auxiliary sensitizer include, for example,
4-methoxy-1-naphthol,
4-ethoxy-1-naphthol,
4-propoxy-1-naphthol,
4-butoxy-1-naphthol,
4-hexyloxy-1-naphthol,
1,4-dimethoxynaphthalene,
1-ethoxy-4-methoxynaphthalene,
1,4-diethoxynaphthalene,
1,4-dipropoxynaphthalene,
Examples thereof include 1,4-dibutoxynaphthalene.
 本発明の塗料組成物が上記補助増感剤(e)を含有する場合、該補助増感剤(e)の固形分含有量は、形成される塗膜の耐擦傷性及び塗料組成物の貯蔵安定性の観点から、前記シルセスキオキサン化合物(a)の固形分100質量部に対して、0.01~10質量部、好ましくは0.05~8質量部、さらに好ましくは0.1~5質量部の範囲内であることが好適である。 When the coating composition of the present invention contains the auxiliary sensitizer (e), the solid content of the auxiliary sensitizer (e) depends on the scratch resistance of the formed coating film and the storage of the coating composition. From the viewpoint of stability, 0.01 to 10 parts by mass, preferably 0.05 to 8 parts by mass, and more preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the solid content of the silsesquioxane compound (a). It is preferable to be within the range of 5 parts by mass.
 本発明の組成物はさらに、各種添加剤、飽和樹脂等を配合しても良い。添加剤としては、例えば、熱酸発生剤、紫外線吸収剤、光安定剤、重合禁止剤、酸化防止剤、消泡剤、表面調整剤、流動調整剤、可塑剤、着色剤等が挙げられる。飽和樹脂としては、例えば、飽和アクリル樹脂、飽和ポリエステル樹脂、飽和ウレタン樹脂、これらのゲル粒子、微粒子粉等が挙げられる。 
 本発明の光カチオン硬化性塗料組成物の不揮発分は特に限定されるものではないが、塗膜の平滑性及び乾燥時間の短縮化の点から、20~100質量%であり、さらに25~70質量%の範囲内が好ましい。なお、本発明のカチオン硬化性塗料組成物の不揮発分は、溶剤以外の配合する全成分の質量を合計した値である。
The composition of the present invention may further contain various additives, saturated resins and the like. Examples of the additive include a thermal acid generator, an ultraviolet absorber, a light stabilizer, a polymerization inhibitor, an antioxidant, an antifoaming agent, a surface conditioner, a flow conditioner, a plasticizer, and a colorant. Examples of the saturated resin include a saturated acrylic resin, a saturated polyester resin, a saturated urethane resin, these gel particles, and fine particle powder.
The non-volatile content of the photocationic curable coating composition of the present invention is not particularly limited, but is 20 to 100% by mass, and further 25 to 70% from the viewpoint of smoothness of the coating film and shortening of the drying time. Within the range of mass% is preferable. In addition, the non volatile matter of the cation curable coating composition of this invention is the value which totaled the mass of all the components mix | blended except a solvent.
 本発明の光カチオン硬化性塗料組成物は、厚さ3mmのアクリル樹脂板上に膜厚5μmの硬化塗膜を形成したときの塗膜表面を超微小硬さ試験装置により温度23℃・荷重20mN下で測定したマルテンス硬度が、0.5~350N/mmとなる塗膜を形成できる。当該実施形態において、「厚さ3mmのアクリル樹脂板」とは、三菱レイヨン(株)社製、アクリライト(登録商標)L001の厚さ3mmの板を意味する。 The photocationic curable coating composition of the present invention has a coating film surface when a cured coating film having a thickness of 5 μm is formed on an acrylic resin plate having a thickness of 3 mm. A coating film having a Martens hardness measured at 20 mN of 0.5 to 350 N / mm 2 can be formed. In this embodiment, the “acrylic resin plate having a thickness of 3 mm” means a plate made by Mitsubishi Rayon Co., Ltd. and Acrylite (registered trademark) L001 having a thickness of 3 mm.
 さらに、耐擦傷性の点から、マルテンス硬度が150~340N/mmでかつ、塗膜の弾性回復率が70%以上となることが好ましい。弾性回復率は、耐擦傷性の点から、74%以上、さらに特に83%以上が好ましい。 Further, from the viewpoint of scratch resistance, it is preferable that the Martens hardness is 150 to 340 N / mm 2 and the elastic recovery rate of the coating film is 70% or more. The elastic recovery rate is preferably 74% or more, more preferably 83% or more from the viewpoint of scratch resistance.
 本発明における「マルテンス硬度(HM)」は、ビッカース圧子により塗膜表面から押し込んだときの試験荷重と押し込み表面積から求められる塗膜の硬さであり、物体表面の硬度の指標となる。 “Martens hardness (HM)” in the present invention is the hardness of the coating film obtained from the test load and the indentation surface area when indented from the surface of the coating film by the Vickers indenter, and is an index of the hardness of the object surface.
 具体的には、下記式に試験荷重と押し込み深さの値を代入することにより算出される値である。  
 式 HM=F/(26.43×h)  
 F:試験荷重(mN)
 h:押し込み深さ(μm)。
Specifically, it is a value calculated by substituting the value of the test load and the indentation depth into the following equation.
Formula HM = F / (26.43 × h 2 )
F: Test load (mN)
h: Indentation depth (μm).
 本発明における「弾性回復率(ηIT)」は、凹んだ塗膜がどの程度戻るかを数値的に表わしたもので、弾性仕事量の割合(弾性変形量/全体変形)のことである。弾性仕事量の割合は、(Welast/Wtotal)×100でもとめることができる。ここで、Welastは弾性回復の仕事量〔Nmm〕、Wtotalは押込み総仕事量〔Nmm〕のことである。それぞれの仕事量の数値は、上記マルテンス硬度測定と併せて測定でき、求めることができる。「弾性回復率」が大きい塗膜は弾性があり、耐擦傷性が良好である。 The “elastic recovery rate (ηIT)” in the present invention is a numerical representation of how much the recessed coating film returns, and is the ratio of elastic work (elastic deformation / total deformation). The ratio of the elastic work amount can also be stopped by (W elast / W total ) × 100. Here, W elast is the work of elastic recovery [ Nmm ], and W total is the total indentation work [Nmm]. The numerical value of each work amount can be measured and determined together with the Martens hardness measurement. A coating film having a large “elastic recovery rate” has elasticity and good scratch resistance.
 本塗料組成物により形成される塗膜のマルテンス硬度及びさらに望ましくは弾性回復率が上記の範囲以上にある塗膜は、適度の硬さと弾性とをバランスよく兼備しており、塗膜を引っ掻いた時に、傷痕が回復してもとの塗膜状態に戻り易く、耐擦傷性が極めて優れている。 A coating film having a Martens hardness of the coating film formed by the present coating composition, and more preferably an elastic recovery rate in the above range or more, has an appropriate balance between hardness and elasticity, and scratched the coating film. Sometimes, even if the scar is recovered, it is easy to return to the original coating state, and the scratch resistance is extremely excellent.
 本発明において、硬化塗膜とは、JIS K 5600-1-1(2004)に規定された硬化乾燥状態、すなわち、塗面の中央を親指と人差指とで強く挟んで、塗面に指紋によるへこみが付かず、塗膜の動きが感じられず、また、塗面の中央を指先で急速に繰り返しこすって、塗面にすり跡が付かない状態の塗膜である。一方、未硬化塗膜とは、塗膜が上記硬化乾燥状態に至っていない状態であって、JIS K 5600-1-1に規定さ
れた、指触乾燥状態及び半硬化乾燥状態をも含むものである。
In the present invention, the cured coating is a cured and dried state as defined in JIS K 5600-1-1 (2004), that is, the center of the coating surface is strongly sandwiched between the thumb and index finger, and the coating surface is dented by a fingerprint. It is a coating film in which the movement of the coating film is not felt, the center of the coating surface is rapidly rubbed with a fingertip, and the coating surface is not rubbed. On the other hand, the uncured coating film is a state where the coating film has not reached the above-mentioned cured and dried state, and includes a dry-to-touch state and a semi-cured and dried state as defined in JIS K 5600-1-1.
 塗膜形成方法  
 本発明の光カチオン硬化性塗料組成物の塗膜形成方法は、被塗物上に、光カチオン硬化性塗料組成物を乾燥膜厚が1~10μmとなるように塗装して、セッティングおよび/または予備加熱を施した後、光照射する。
Coating method
In the method of forming a coating film of the photocationic curable coating composition of the present invention, the photocationic curable coating composition is applied on the object to be coated so that the dry film thickness is 1 to 10 μm, and setting and / or After preheating, light irradiation is performed.
 この、セッティングおよび/又は予備加熱を施す工程は、塗装直後の塗膜の揮発分を減少させるまたは揮発分を除去するために行なわれ、エアブロー、IR炉等で行うことができる。セッティングは、通常、塗装された被塗物をほこりのない雰囲気に室温で30秒~600秒放置することにより行うことができる。予備加熱(プレヒート)は、通常、塗装された被塗物を乾燥炉内で、40~90℃、好ましくは50~70℃の温度で1~30分間加熱することにより行うことができる。また、エアブローを行う場合には、通常、被塗物の塗装面に常温または25℃~80℃の温度に加熱された空気を吹き付けることにより行うことができる。予備加熱時間は、通常、30秒~600秒行うことができる。 This step of setting and / or preheating is performed to reduce the volatile content of the coating film immediately after coating or to remove the volatile content, and can be performed by an air blow, an IR furnace or the like. Setting can usually be performed by leaving the coated article to stand in a dust-free atmosphere at room temperature for 30 to 600 seconds. Preheating (preheating) can be usually performed by heating the coated article in a drying furnace at a temperature of 40 to 90 ° C., preferably 50 to 70 ° C. for 1 to 30 minutes. In addition, air blow can be usually performed by blowing air heated to a normal temperature or a temperature of 25 ° C. to 80 ° C. on the coated surface of the object to be coated. The preheating time can usually be 30 seconds to 600 seconds.
 上記予備加熱を行う際の加熱温度条件は、特に限定されるものではないが、熱により揮発する成分_例えばその他の光カチオン重合性化合物(c)のうち、低沸点の化合物を含有する場合(150℃未満)_を含有する場合、加熱温度を70℃未満、さらに40℃~70℃とすることが好ましい。 The heating temperature condition at the time of performing the preheating is not particularly limited, but the component that volatilizes by heat, for example, the other photocationically polymerizable compound (c) contains a low boiling point compound ( In the case of containing less than 150 ° C.), the heating temperature is preferably less than 70 ° C., more preferably 40 ° C. to 70 ° C.
 また、加熱と光照射とを併せて行う際には、光線の照射源からの熱(例えばランプが発する熱)を熱源としてもよい。さらに、加熱の後に光照射を行う際には、被塗物が熱を帯びた状態(余熱を持った状態)で光照射を行なってもよい。 Further, when heating and light irradiation are performed in combination, heat from a light source (for example, heat generated by a lamp) may be used as a heat source. Further, when light irradiation is performed after heating, the light irradiation may be performed in a state where the object to be coated is heated (a state having residual heat).
 被塗物としては、特に限定されるものではない。具体的には例えば、金属、セラミックス、ガラス、プラスチック、木材等が挙げられる。また、被塗物には、例えば、プライマー塗料、カチオン電着塗料、中塗り塗料、上塗り塗料等を塗装することにより、予めプライマー層、電着塗膜層、中塗り層、上塗り層等が形成されていてもよい。 There is no particular limitation on the object to be coated. Specific examples include metals, ceramics, glass, plastics, wood, and the like. In addition, a primer layer, an electrodeposition coating layer, an intermediate coating layer, a top coating layer, etc. are formed in advance by applying a primer coating, a cationic electrodeposition coating, an intermediate coating, a top coating, etc. May be.
 乾燥膜厚としては、塗膜の外観及び硬化性、耐擦傷性、耐カール性の点から、1~10μm、さらに1~8μmの範囲内であることが好ましい。 The dry film thickness is preferably in the range of 1 to 10 μm, more preferably 1 to 8 μm, in view of the appearance and curability of the coating film, scratch resistance, and curl resistance.
 カール性は、塗料組成物の硬化収縮の程度を見ることができ、例えば、光カチオン硬化性塗料組成物をプラスチック基材表面に形成した後の塗装板を水平台の上に塗面を上にして、試験片の4つの隅角部と水平台との距離(浮き上がり距離)を測定し、その合計長さにより評価することができる。硬化時の収縮がおきにくいものほど、合計長さは小さくなり耐カール性が良好である。 The curling property can be observed in terms of the degree of cure shrinkage of the coating composition. For example, the coating plate after the photocationic curable coating composition is formed on the surface of the plastic substrate is placed on a horizontal table with the coating surface facing up. Then, the distance (lifting distance) between the four corners of the test piece and the horizontal table can be measured and evaluated by the total length. The smaller the shrinkage during curing, the smaller the total length and the better the curl resistance.
 前記光照射する工程における、光の照射源は、特に限定されるものではなく、超高圧、高圧、中圧、低圧の水銀灯、ケミカルランプ、KrFエキシマレーザ、ArFエキシマレーザ、極紫外線(EUV:Extreme Ultra Violet)灯、X線、および電子線(e-beam)、カーボンアーク灯、キセノン灯、メタルハライド灯、蛍光灯、LED(発光ダイオード)灯、タングステン灯、太陽等が挙げられる。上記照射源は単独で又は2種以上組み合わせて使用することができる。
本発明でいう光とは、太陽光、レーザー光、放射光(赤外線、可視光線、紫外線、β線、γ線、X線)などを含み、特に可視光線に限定されない。光は、光照射によってカチオン(酸)を発生させる化合物を活性化させ、また、カチオン重合反応を進行させる働きがある。
The light irradiation source in the light irradiation step is not particularly limited, and is an ultrahigh pressure, high pressure, medium pressure, low pressure mercury lamp, chemical lamp, KrF excimer laser, ArF excimer laser, extreme ultraviolet (EUV: Extreme). Examples thereof include an Ultra Violet lamp, an X-ray, and an electron beam (e-beam), a carbon arc lamp, a xenon lamp, a metal halide lamp, a fluorescent lamp, an LED (light emitting diode) lamp, a tungsten lamp, and the sun. The said irradiation source can be used individually or in combination of 2 or more types.
The light referred to in the present invention includes sunlight, laser light, radiated light (infrared rays, visible rays, ultraviolet rays, β rays, γ rays, X rays) and the like, and is not particularly limited to visible rays. The light has a function of activating a compound that generates a cation (acid) by light irradiation and advancing a cation polymerization reaction.
 照射量は、照射源によって異なるが、例えば、高圧水銀灯を使用した場合、積算照射量で10~500mJ/cm、さらに50~120mJ/cmの範囲内で硬化が可能である。 Irradiation amount varies depending radiation source, for example, when using a high pressure mercury lamp, 10 ~ 500mJ / cm 2 in the integrated irradiation dose, it is possible to further curing in the range of 50 ~ 120mJ / cm 2.
 光照射は、大気雰囲気下で行なってもよく、また不活性ガス雰囲気下で行なっても良い。 The light irradiation may be performed in an air atmosphere or an inert gas atmosphere.
 また、光照射後に塗膜を加熱する工程を設けてもよい。後加熱をすることによって、光照射による塗膜の硬化により発生した塗膜の歪みを緩和することができる。さらにこの加熱によって塗膜の硬度、又は付着性の向上を行なうことができる場合がある。加熱温度は前記に示した温度の範囲内が好適である。 Further, a step of heating the coating film after light irradiation may be provided. By post-heating, the distortion of the coating film generated by curing the coating film by light irradiation can be alleviated. Further, the heating may improve the hardness or adhesion of the coating film. The heating temperature is preferably within the temperature range shown above.
 本発明の光カチオン硬化性塗料組成物により被膜が形成された物品の製品形態は特に限定されないが、優れた透明性と耐擦傷性を有することから、ハードコート剤として特に好適に用いることができる。 The product form of the article in which the film is formed with the photocationic curable coating composition of the present invention is not particularly limited. However, since it has excellent transparency and scratch resistance, it can be particularly suitably used as a hard coat agent. .
 以下、実施例を挙げて本発明をさらに詳細に説明する。尚、「部」及び「%」は、別記しない限り「質量部」及び「質量%」を示す。なお、本実施例における構造解析及び測定は、本明細書に記載の前記分析装置に加え、以下の分析装置及び測定方法により行なった。
 (29Si-NMR)
 装置:JEOL社製 FT-NMR EX-400
 溶媒:CDCl
 内部標準物質:テトラメチルシラン。
Hereinafter, the present invention will be described in more detail with reference to examples. “Part” and “%” indicate “part by mass” and “% by mass” unless otherwise specified. The structural analysis and measurement in this example were performed by the following analyzer and measurement method in addition to the analyzer described in this specification.
( 29 Si-NMR)
Apparatus: FT-NMR EX-400 manufactured by JEOL
Solvent: CDCl 3
Internal standard: Tetramethylsilane.
 (製造例1)
 還流冷却器、温度計、空気導入管、攪拌機を取り付けたセパラブルフラスコに、メチルエチルケトン800部、脱イオン水22部、及びテトラブチルアンモニウムフルオリド0.5部を配合し、攪拌しながら溶解させた。ここに2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン200部を投入し、40℃にて12時間反応させた。生成物をロータリーエバポレーターで濃縮し、生成物(A-1)の不揮発分50%溶液を得た。
(Production Example 1)
In a separable flask equipped with a reflux condenser, a thermometer, an air inlet tube, and a stirrer, 800 parts of methyl ethyl ketone, 22 parts of deionized water, and 0.5 part of tetrabutylammonium fluoride were blended and dissolved while stirring. . 200 parts of 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane was added thereto and reacted at 40 ° C. for 12 hours. The product was concentrated with a rotary evaporator to obtain a 50% non-volatile solution of the product (A-1).
 生成物(A-1)について29Si-NMR分析を行なった結果、Siに結合した3つの酸素原子が全て他のSiと結合したT3構造に由来する-70ppm付近のピークのみが確認された。   As a result of 29 Si-NMR analysis of the product (A-1), only a peak around −70 ppm derived from the T3 structure in which all three oxygen atoms bonded to Si were bonded to other Si was confirmed.
 生成物(A-1)についてGPC測定を行なった結果、重量平均分子量は1,500であった。   As a result of GPC measurement of the product (A-1), the weight average molecular weight was 1,500. *
 生成物(A-1)のエポキシ当量は、178g/eqであった。   The epoxy equivalent of the product (A-1) was 178 g / eq. *
 生成物(A-1)についての前記29Si-NMR、重量平均分子量、エポキシ当量の結果から、生成物(A-1)が、ケイ素原子に直接に結合した有機基の全てが下記式(P-I)で表される有機基   From the results of the 29 Si-NMR, the weight average molecular weight, and the epoxy equivalent for the product (A-1), all of the organic groups in which the product (A-1) is directly bonded to the silicon atom are represented by the following formula (P Organic group represented by -I)
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
を有するシルセスキオキサン化合物であることが確認された。 It was confirmed to be a silsesquioxane compound having
 (製造例2~9)
 製造例1において、各成分の配合を表1に示すものとする以外は製造例1と同様にして、実施例2~9の不揮発分50%の生成物(A-2)~(A-9)を得た。表1に示す各成分の配合比率はモル比であり、各生成物の重量平均分子量及びエポキシ当量も併せて示す。
(Production Examples 2 to 9)
In Production Example 1, products (A-2) to (A-9) having a non-volatile content of 50% in Examples 2 to 9 were prepared in the same manner as in Production Example 1 except that the composition of each component was as shown in Table 1. ) The compounding ratio of each component shown in Table 1 is a molar ratio, and the weight average molecular weight and epoxy equivalent of each product are also shown.
Figure JPOXMLDOC01-appb-T000012
Figure JPOXMLDOC01-appb-T000012
 被塗物
 (a)アクリル樹脂板:100×150mmに裁断した厚さ3mmのアクリル樹脂板(三菱レイヨン(株)社製 アクリライト(登録商標)L001、メタクリル樹脂板〔ポリメチルメタクリレートおよびメチルメタクリレートとn-ブチルアクリレートとの共重合物の含有量が88%以上〕をイソプロピルアルコールで脱脂したものを被塗物(a)とした。
Article to be coated (a) an acrylic resin plate: 100 × 150 mm having a thickness of 3mm was cut into an acrylic resin plate (Mitsubishi Rayon Co., Ltd. ACRYLITE (R) L001, a methacrylic resin plate [polymethyl methacrylate and methyl methacrylate An article to be coated (a) was obtained by degreasing a copolymer of n-butyl acrylate with a content of 88% or more] with isopropyl alcohol.
 (b)PET樹脂シート:A4サイズ、厚さ100μmのポリエチレンテレフタレート樹脂シート(東洋紡(株)社製、商品名「コスモシャイン(登録商標)A4100」)を被塗物(b)とした。 (B) PET resin sheet: A4 size, 100 μm thick polyethylene terephthalate resin sheet (trade name “Cosmo Shine (registered trademark) A4100” manufactured by Toyobo Co., Ltd.) was used as the article to be coated (b).
 (c)ガラス板:100×150mm厚さ3mmのガラス板をイソプロピルアルコールで脱脂し、エキシマ処理したものを被塗物(c)とした。 (C) Glass plate: A glass plate 100 × 150 mm thick 3 mm degreased with isopropyl alcohol and subjected to excimer treatment was used as the article to be coated (c).
 塗膜形成方法
 (イ)被塗物に、各カチオン硬化性塗料組成物をバーコーターで硬化後の膜厚が5μmとなる条件で塗装し、60℃で30秒プレヒートして溶剤を除去した後、紫外線照射装置で、紫外線(ピークトップ波長365nm)を積算照射量100mJ/cmとなる条件で照射し、塗膜を硬化させたものを得た。
・紫外線照射装置:ベルトコンベア式UV照射装置
・ランプ:240W/cm 高圧水銀灯(ランプ個数1個)
   (ヘレウス・ノーブルライト・フュージョン・ユーブイ株式会社)
・ランプ出力:60%
・照度(紫外線積算光量計UIT(登録商標)-250、受光器UVD-C365(ウシオ電機株式会社製)で測定):140mW/cm
・照射距離:10cm
・積算照射量(紫外線積算光量計UIT(登録商標)-250、受光器UVD-C365で測定)コンベアスピードにより調整
 スピード 10m/min=積算照射量100mJ/cm相当
 (ロ)上記の塗膜形成方法(イ)のうち、使用ランプ、照射距離、積算照射量を下記のものとする以外は、塗膜形成方法(イ)と同様の方法で硬化させた。
・ランプ:192W 365nmUV-LED(ランプ個数96個)
・照度(紫外線積算光量計UIT-250、受光器UVD-C365で測定):630mW/cm
・照射距離:1cm
・積算照射量(紫外線積算光量計UIT-250、受光器UVD-C365で測定)コンベアスピードにより調整
 スピード 2m/min=積算照射量500mJ/cm相当。
Coating film formation method (A) After coating each cationic curable coating composition on a coated material with a bar coater under a condition that the film thickness after curing is 5 μm, and preheating at 60 ° C. for 30 seconds to remove the solvent. Then, ultraviolet rays (peak top wavelength 365 nm) were irradiated with an ultraviolet irradiation device under the condition of an integrated irradiation amount of 100 mJ / cm 2 to obtain a cured coating film.
・ Ultraviolet irradiation device: belt conveyor type UV irradiation device ・ Lamp: 240 W / cm 2 high-pressure mercury lamp (1 lamp number)
(Heraeus Noblelight Fusion Ubuy Co., Ltd.)
・ Lamp output: 60%
Illuminance (measured with UV integrated light meter UIT (registered trademark) -250, photoreceiver UVD-C365 (manufactured by USHIO INC.)): 140 mW / cm 2
・ Irradiation distance: 10cm
· Integrated irradiation dose (accumulated UV actinometer UIT (registered trademark) -250, photodetector measured by UVD-C365) adjusted by a conveyor speed Speed 10 m / min = cumulative dose 100 mJ / cm 2 corresponds (b) above film-forming Curing was carried out in the same manner as in the coating film forming method (a) except that the lamp used, the irradiation distance, and the integrated irradiation amount were as follows.
・ Lamp: 192W 365nm UV-LED (96 lamps)
Illuminance (measured with UV integrated light meter UIT-250, receiver UVD-C365): 630 mW / cm 2
・ Irradiation distance: 1cm
・ Integrated irradiation dose (measured with UV integrated light meter UIT-250, photoreceiver UVD-C365) Adjusted by conveyor speed Speed 2 m / min = Total irradiation dose equivalent to 500 mJ / cm 2 .
 実施例
 (実施例1)光カチオン硬化性塗料組成物No.1
 製造例1で得られた生成物(A-1)の不揮発分50%溶液および下記式(B-1)の光酸発生剤(注1)、BYK-333(注10)を質量比で100:5:0.1となるように配合し、メチルエチルケトンで不揮発分40%まで希釈し攪拌し、光カチオン硬化性塗料組成物No.1を製造した。表2に各成分の配合量を質量比で示した。  
Example (Example 1) Photocationic curable coating composition No. 1
A 50% nonvolatile solution of the product (A-1) obtained in Production Example 1, a photoacid generator (Note 1) of the following formula (B-1), and BYK-333 (Note 10) in a mass ratio of 100 5: 0.1, diluted with methyl ethyl ketone to a non-volatile content of 40%, stirred, and photocationic curable coating composition No. 1 was produced. Table 2 shows the blending amount of each component by mass ratio.
 得られた光カチオン硬化性塗料組成物を前記塗膜形成方法(イ)により硬化させた硬化塗膜を、硬化後30分以内に23℃、50%相対湿度の雰囲気下に1時間放置後の板を試験板とした。塗膜のマルテンス硬度(注11)は245N/mm、弾性回復率(注12)は81%であった。 A cured coating film obtained by curing the obtained photocationic curable coating composition by the coating film forming method (a) was allowed to stand for 1 hour in an atmosphere of 23 ° C. and 50% relative humidity within 30 minutes after curing. The plate was used as a test plate. The coating film had a Martens hardness (Note 11) of 245 N / mm 2 and an elastic recovery rate (Note 12) of 81%.
 (実施例2~18および比較例1~3)光カチオン硬化性塗料組成物No.2~21 実施例1において、各成分の配合を表2に示すものとする以外は実施例1と同様にして、実施例2~18および比較例1~3の不揮発分40%の光カチオン硬化性塗料組成物No.2~21を得た。表2に示す塗料組成物の配合は各成分の質量比である。 (Examples 2 to 18 and Comparative Examples 1 to 3) Photocationic curable coating composition No. 2 to 21 Photocationic curing of Examples 2 to 18 and Comparative Examples 1 to 3 having a nonvolatile content of 40% in the same manner as in Example 1 except that the composition of each component in Table 1 is as shown in Table 2 Paint composition no. 2-21 were obtained. The composition of the coating composition shown in Table 2 is a mass ratio of each component.
 得られた光カチオン硬化性塗料組成物を硬化した塗膜のマルテンス硬度および弾性回復率を表2に併せて示す。表中注は下記のとおりである。
(注1)
Table 2 also shows the Martens hardness and the elastic recovery rate of the coating film obtained by curing the obtained photocationic curable coating composition. The notes in the table are as follows.
(Note 1)
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
光酸発生剤No.B-1:上記式(B-1)で示されるヨードニウム塩系光カチオン重合性開始剤、
(注2)
Photoacid generator No. B-1: An iodonium salt-based photocationic polymerizable initiator represented by the above formula (B-1),
(Note 2)
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
光酸発生剤No.B-2:上記式(B-2)で示されるヨードニウム塩系光カチオン重合性開始剤、
(注3)
Photoacid generator No. B-2: an iodonium salt-based photocationic polymerizable initiator represented by the above formula (B-2),
(Note 3)
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
光酸発生剤No.B-3:上記式(B-3)で示されるヨードニウム塩系光カチオン重合性開始剤、
(注4)
Photoacid generator No. B-3: An iodonium salt-based photocationically polymerizable initiator represented by the above formula (B-3),
(Note 4)
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
光酸発生剤No.B-4:上記式(B-4)で示されるスルホニウム塩系光カチオン重合性開始剤、
(注5)成分C-1:セロキサイド(登録商標) 2012P(商品名、株式会社ダイセル社製、下記式C-1で表される化合物、エポキシ当量118~145g/当量。
Photoacid generator No. B-4: a sulfonium salt-based photocationically polymerizable initiator represented by the above formula (B-4),
(Note 5) Component C-1: Celoxide (registered trademark) 2012P (trade name, manufactured by Daicel Corporation, compound represented by the following formula C-1, epoxy equivalent of 118 to 145 g / equivalent.
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
(注6)成分C-2:アロンオキセタン(登録商標)OXT-221(商品名、東亞合成(株)社製、下記式(C-2)で表される化合物、沸点119℃/0.67kPa、 (Note 6) Component C-2: Aron Oxetane (registered trademark) OXT-221 (trade name, manufactured by Toagosei Co., Ltd., compound represented by the following formula (C-2), boiling point 119 ° C./0.67 kPa ,
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
(注7)成分C-3:アロンオキセタン(登録商標)OXT-101(商品名、東亞合成(株)社製、下記式(C-3)で表される化合物、沸点105℃/0.93kPa、 (Note 7) Component C-3: Aron Oxetane (registered trademark) OXT-101 (trade name, manufactured by Toagosei Co., Ltd., compound represented by the following formula (C-3), boiling point 105 ° C./0.93 kPa ,
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
(注8)成分D-1:アントラキュアー(登録商標) UVS-1331(商品名、川崎化成(株)社製、下記式(D-1)で表されるアントラセン化合物、増感剤、 (Note 8) Component D-1: Anthracure (registered trademark) UVS-1331 (trade name, manufactured by Kawasaki Kasei Co., Ltd., anthracene compound represented by the following formula (D-1), sensitizer,
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
 (注9)成分D-2:「アントラキュアー(登録商標) ET-2201」(商品名、川崎化成(株)社製、補助増感剤)
(注10)BYK(登録商標)-333:商品名、ビックケミー社製、ポリエーテル変性ジメチルポリシロキンサン、表面調整剤
(注11、12)マルテンス硬度および弾性回復率:
<測定方法>
 各試験板のマルテンス硬度を、フィッシャースコープ(登録商標)HM200S(商品名、(株)フィッシャー・インストルメンツ社製)を用いて、23℃、50%相対湿度の雰囲気下、20mN/25秒の荷重をかけ測定した。圧子はビッカース四角錐(材質:ダイヤモンド)を用い、プリズム部1山の中央付近が圧子作用点となるようにサンプルの位置を調節した。
(Note 9) Component D-2: “Anthracure (registered trademark) ET-2201” (trade name, manufactured by Kawasaki Kasei Co., Ltd., auxiliary sensitizer)
(Note 10) BYK (registered trademark) -333: trade name, manufactured by Big Chemie, polyether-modified dimethylpolysiloxane, surface conditioner (Note 11, 12) Martens hardness and elastic recovery rate:
<Measurement method>
The Martens hardness of each test plate was measured using a Fischerscope (registered trademark) HM200S (trade name, manufactured by Fisher Instruments Co., Ltd.) under a load of 20 mN / 25 seconds in an atmosphere of 23 ° C. and 50% relative humidity. And measured. A Vickers square pyramid (material: diamond) was used as the indenter, and the position of the sample was adjusted so that the vicinity of the center of one peak of the prism portion was the indenter action point.
 <測定手順>
(1-1)速度20mN/25秒で荷重10mNに達するまで荷重を負荷。
(1-2)同速度で荷重0.4mNに達するまで除荷。
測定位置を変えながら、以上の手順を繰り返し行い、1サンプルにつき3点データを取った。
<算出方法>
 上記測定方法で得られた、試験力と圧子の押込み深さとの関係よりマルテンス硬度および弾性回復率を求めた。マルテンス硬度(HM)および弾性回復率(ηIT)は、超微小硬さ試験システム付属の解析ソフトを用いて算出した。
<Measurement procedure>
(1-1) Load is applied until the load reaches 10 mN at a speed of 20 mN / 25 seconds.
(1-2) Unloading until the load reaches 0.4mN at the same speed.
The above procedure was repeated while changing the measurement position, and three data points were taken for each sample.
<Calculation method>
The Martens hardness and the elastic recovery rate were determined from the relationship between the test force and the indentation depth obtained by the above measurement method. The Martens hardness (HM) and the elastic recovery rate (ηIT) were calculated using analysis software attached to the ultra micro hardness test system.
Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000021
 (実施例19)
 被塗物(b)上に、実施例1で得られた光カチオン硬化性塗料組成物No.1を塗装し、前記塗膜形成方法(イ)の方法により硬化させた塗装シートを、硬化後30分以内に23℃、50%相対湿度の雰囲気下に1時間放置したものを試験サンプルとし、各種評価に供した。評価結果を表3に示す。
(Example 19)
On the object to be coated (b), the photocation curable coating composition No. 1 obtained in Example 1 was used. 1 was applied, and the coated sheet cured by the method of the coating film forming method (a) was left as it was for 1 hour in an atmosphere of 23 ° C. and 50% relative humidity within 30 minutes after curing as a test sample, It used for various evaluation. The evaluation results are shown in Table 3.
 (実施例20~39、比較例4~6)
 実施例19において、被塗物、塗膜形成方法、硬化膜厚を表3に記載のものとする以外は、実施例19と同様に、試験サンプルを作成し、各種評価に供した。評価結果を表3に示す。表中注は下記のとおりである。
(Examples 20 to 39, Comparative Examples 4 to 6)
In Example 19, test samples were prepared and subjected to various evaluations in the same manner as in Example 19 except that the objects to be coated, the coating film forming method, and the cured film thickness were those described in Table 3. The evaluation results are shown in Table 3. The notes in the table are as follows.
 (注13)<付着性>
 JIS K 5600-5-6(1990)に準じて素地に達するまで塗膜に1mm×1mmのゴバン目100個を作り、その面に粘着テープを貼着し、急激に剥がした後に、塗面に残ったゴバン目積層膜の数を評価した。
 S :残存個数/全体個数=100個/100個で縁欠けなし
 AA :残存個数/全体個数=100個/100個で縁欠け5個以下である
 B :残存個数/全体個数=99個~90個/100個、
             又は100個/100個で縁欠け6個以上
 C :残存個数/全体個数=89個以下/100個。
(Note 13) <Adhesiveness>
According to JIS K 5600-5-6 (1990), make 100 1mm × 1mm gobangs on the coating film until it reaches the substrate, and apply adhesive tape on the surface, and then remove it rapidly. The number of the remaining Gobanchi laminated films was evaluated.
S: remaining number / total number = 100/100 and no edge loss AA: remaining number / total number = 100/100 and no more than 5 edge defects B: remaining number / total number = 99 to 90 Pieces / 100 pieces,
Alternatively, 100/100 and 6 or more edges are missing. C: Remaining number / total number = 89 or less / 100.
 (注14)<透明性>  
 各試験サンプルの外観(目視)と、着色性を評価した。外観は、塗膜のにごり、ワレ等異常の有無を確認した。にごり、ワレ等異常のない塗膜をAAとした。にごり、ワレ等異常のある塗膜をBとする。
(Note 14) <Transparency>
The appearance (visual observation) and colorability of each test sample were evaluated. Appearance was checked for the presence or absence of abnormalities such as dirt and cracks in the coating film. A film having no abnormalities such as dust and cracks was designated as AA. A coating film having an abnormality such as dust and cracks is designated as B.
 着色性 (初期)〔△b〕:b値の測定は、「CR-300」(コニカミノルタ社製、商品名)にて行なった。各試験サンプルについて、被塗物のb値と、試験サンプルのb値との差(Δb)を測定し、着色性を下記の通り評価した。△bが1.2以下であれば実用上問題ないレベルである。 Colorability (initial) [Δb]: The b value was measured with “CR-300” (trade name, manufactured by Konica Minolta). For each test sample, the difference (Δb) between the b value of the object to be coated and the b value of the test sample was measured, and the colorability was evaluated as follows. If Δb is 1.2 or less, it is at a level that causes no practical problems.
 (注15)<耐カール性>
 各塗装シートの中央部分を10cm角に切り出して測定用試料とした。評価は4隅の反りを定規で計測し、その4点の合計を各試験サンプルにおけるカール値とした。
数値が小さいほど良好な値である。  
 S :5mm未満
 AA :5mm以上20mm未満
 B :20mm以上50mm未満
 C :50mm以上
なお、被塗物がガラス板の場合は測定していない。
(Note 15) <Curl resistance>
A central portion of each coated sheet was cut into a 10 cm square and used as a measurement sample. In the evaluation, warping at four corners was measured with a ruler, and the total of the four points was taken as the curl value for each test sample.
The smaller the value, the better the value.
S: Less than 5 mm AA: 5 mm or more and less than 20 mm B: 20 mm or more and less than 50 mm C: 50 mm or more It is not measured when the object to be coated is a glass plate.
 (注16)<耐擦傷性>
 スチールウール法:各試験サンプルの塗膜面に市販のスチールウール(#0000)を荷重1000gで50往復擦り、塗膜を目視で観察し下記の基準に従って評価した。耐擦傷性がよいため、傷の個数で評価した。  
 S :ワレ、剥がれがない、若しくは傷がまったくない
 AA :ワレ、剥がれがない、若しくは傷の数が5個未満である
 A:ワレ、剥がれがない、若しくは傷が5個以上10個未満認められるが実用上問題ない
 B :ワレ、剥がれがない、若しくは傷が10個以上20個未満認められる
 C :ワレ、剥がれ、若しくは著しい傷等が認められる。
(Note 16) <Abrasion resistance>
Steel wool method: Commercial steel wool (# 0000) was rubbed 50 times with a load of 1000 g on the coating surface of each test sample, and the coating film was visually observed and evaluated according to the following criteria. Since scratch resistance is good, the number of scratches was evaluated.
S: No cracks, no peeling, or no scratches AA: No cracks, no peeling, or less than 5 scratches A: No cracks, no peeling, or 5 to less than 10 scratches B: No cracking or peeling, or 10 or more and less than 20 scratches are observed C: Cracking, peeling, or significant scratches are observed.
Figure JPOXMLDOC01-appb-T000022
Figure JPOXMLDOC01-appb-T000022

Claims (8)

  1. シルセスキオキサン化合物(a)と、ヨードニウム塩系光酸発生剤(b)とを含む光カチオン硬化性塗料組成物であって、
    該シルセスキオキサン化合物(a)が、
    式(I)で表される加水分解性シラン化合物、又は式(I)で表される加水分解性シラン化合物及び式(II)で表される加水分解性シラン化合物の混合物を加水分解縮合して得られたものであり、該式(I)で表される加水分解性シラン化合物及び式(II)で表される加水分解性シラン化合物の混合物の配合割合が、式(I)と式(II)で表される加水分解性シラン化合物との総量を基準に、
    式(I)で表される加水分解性シラン化合物が55~100モル%、
    式(II)で表される加水分解性シラン化合物が0~45モル%である、光カチオン硬化性塗料組成物。
    Figure JPOXMLDOC01-appb-C000001
    [式(I)中、Rは2価の炭素数1~6のアルキレン基を示す。Xはハロゲン元素又は炭素数1~6のアルコキシ基であり、3つのXはそれぞれ同一でも又は異なっていてもよい。]  
     RSiX  (II)
    [式(II)中、Rは、置換されていても良い炭素数1~18の1価の有機基を示す。Xはハロゲン元素又は炭素数1~6のアルコキシ基であり、3つのXはそれぞれ同一でも又は異なっていてもよい。ただし、式(I)で表わされる化合物を除く]
    A photocationic curable coating composition comprising a silsesquioxane compound (a) and an iodonium salt photoacid generator (b),
    The silsesquioxane compound (a) is
    Hydrolyzing and condensing the hydrolyzable silane compound represented by the formula (I) or the hydrolyzable silane compound represented by the formula (I) and the hydrolyzable silane compound represented by the formula (II) The blending ratio of the mixture of the hydrolyzable silane compound represented by the formula (I) and the hydrolyzable silane compound represented by the formula (II) is the formula (I) and the formula (II ) Based on the total amount with the hydrolyzable silane compound represented by
    55 to 100 mol% of a hydrolyzable silane compound represented by the formula (I),
    A photocationically curable coating composition, wherein the hydrolyzable silane compound represented by the formula (II) is 0 to 45 mol%.
    Figure JPOXMLDOC01-appb-C000001
    [In the formula (I), R 1 represents a divalent alkylene group having 1 to 6 carbon atoms. X is a halogen element or an alkoxy group having 1 to 6 carbon atoms, and the three Xs may be the same or different. ]
    R 2 SiX 3 (II)
    [In Formula (II), R 2 represents an optionally substituted monovalent organic group having 1 to 18 carbon atoms. X is a halogen element or an alkoxy group having 1 to 6 carbon atoms, and the three Xs may be the same or different. However, the compound represented by the formula (I) is excluded]
  2. 前記光酸発生剤(b)が、下記式(III)で表されるヨードニウム塩系光酸発生剤であることを特徴とする請求項1に記載の光カチオン硬化性塗料組成物。
    Figure JPOXMLDOC01-appb-C000002
    Figure JPOXMLDOC01-appb-C000003
     [式(III)中、RはI(ヨウ素原子)に結合している有機基を表し、2個のRは互いに同一であっても異なってもよい。[Y]は、式(IV)で表されるリン酸アニオン又は式(V)で表されるホウ素化合物アニオンであって、式(IV)中のRfは水素原子の全て又は一部がフッ素原子で置換されていてもよいアルキル基を表す。bは0~5の整数である。b個のRfはそれぞれ同一であっても異なっていてもよい。]
    The photocationic curable coating composition according to claim 1, wherein the photoacid generator (b) is an iodonium salt photoacid generator represented by the following formula (III).
    Figure JPOXMLDOC01-appb-C000002
    Figure JPOXMLDOC01-appb-C000003
    [In Formula (III), R 3 represents an organic group bonded to I (iodine atom), and two R 3 s may be the same as or different from each other. [Y] is a phosphate anion represented by the formula (IV) or a boron compound anion represented by the formula (V), and Rf in the formula (IV) is fluorine in which all or part of the hydrogen atoms are fluorine. An alkyl group which may be substituted with an atom is represented. b is an integer of 0 to 5. The b Rf's may be the same or different. ]
  3. さらに、その他の光カチオン重合性基含有化合物(c)をシルセスキオキサン化合物(a)100質量部に対して、50質量部以下含有するものである請求項1又は2に記載の光カチオン硬化性塗料組成物。 The photocationic curing according to claim 1 or 2, further comprising 50 parts by mass or less of the other photocationically polymerizable group-containing compound (c) with respect to 100 parts by mass of the silsesquioxane compound (a). Coating composition.
  4. さらに、増感剤(d)を含有する請求項1~3のいずれか1項に記載の光カチオン硬化性塗料組成物。 The photocationic curable coating composition according to any one of claims 1 to 3, further comprising a sensitizer (d).
  5. 該シルセスキオキサン化合物(a)のエポキシ当量が、10~500g/当量である請求項1~4のいずれか1項に記載の光カチオン硬化性塗料組成物。 The photocationically curable coating composition according to any one of claims 1 to 4, wherein the epoxy equivalent of the silsesquioxane compound (a) is 10 to 500 g / equivalent.
  6. 厚さ3mmのアクリル樹脂板上に膜厚5μmの硬化塗膜を形成したときの塗膜表面を超微小硬さ試験装置により温度23℃・荷重20mN下で測定したマルテンス硬度が、0.5~350N/mmとなる塗膜を形成できる請求項1~5のいずれか1項に記載の光カチオン硬化性塗料組成物。 When the cured coating film having a film thickness of 5 μm is formed on the acrylic resin plate having a thickness of 3 mm, the Martens hardness measured by a super micro hardness tester at a temperature of 23 ° C. and a load of 20 mN is 0.5. The photocationically curable coating composition according to any one of claims 1 to 5, which can form a coating film having a thickness of 350 N / mm 2 .
  7. 被塗物上に、請求項1~6のいずれか1項に記載の光カチオン硬化性塗料組成物を乾燥膜厚が1~10μmとなるように塗装して、セッティングおよび/または予備加熱を施した後、光照射することを特徴とする塗膜形成方法。 A photocationic curable coating composition according to any one of claims 1 to 6 is applied onto an object to be coated so that the dry film thickness is 1 to 10 μm, and setting and / or preheating is performed. Then, the method of forming a coating film is characterized by irradiating with light.
  8. 請求項7に記載の塗膜形成方法により被膜が形成された物品。
     
    An article on which a coating film is formed by the coating film forming method according to claim 7.
PCT/JP2014/077231 2013-10-11 2014-10-10 Cationically photocurable coating composition, method for forming coating film, and article coated with same WO2015053397A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2015541654A JP6530316B2 (en) 2013-10-11 2014-10-10 Photocationically curable coating composition, method of forming coating film, coated article thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-213328 2013-10-11
JP2013213328 2013-10-11

Publications (1)

Publication Number Publication Date
WO2015053397A1 true WO2015053397A1 (en) 2015-04-16

Family

ID=52813210

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2014/077231 WO2015053397A1 (en) 2013-10-11 2014-10-10 Cationically photocurable coating composition, method for forming coating film, and article coated with same

Country Status (2)

Country Link
JP (1) JP6530316B2 (en)
WO (1) WO2015053397A1 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016204114A1 (en) * 2015-06-17 2016-12-22 株式会社ダイセル Curable composition, adhesive sheet, cured product, laminate, production method for adhesive sheet, and device
WO2018207647A1 (en) * 2017-05-09 2018-11-15 株式会社ダイセル Composition for forming insulating film, insulating film, and semiconductor device including insulating film
EP3470484A1 (en) * 2017-10-16 2019-04-17 Samsung Electronics Co., Ltd. Composition, article, window for electronic device, and electronic device
WO2019188441A1 (en) * 2018-03-30 2019-10-03 富士フイルム株式会社 Composition for forming hard coat layer, hard coat film, article having hard coat film, image display device, and method for manufacturing hard coat film
WO2020059726A1 (en) * 2018-09-18 2020-03-26 富士フイルム株式会社 Hard coat composition, hard coat film, article having hard coat film, image display, and method for manufacturing hard coat film
JPWO2020110966A1 (en) * 2018-11-27 2021-09-30 富士フイルム株式会社 Hard-coated film, articles with hard-coated film, and image display devices
CN114539915A (en) * 2022-02-07 2022-05-27 厦门三德信科技股份有限公司 Low-shrinkage high-hardness flexible fingerprint hardening prevention coating and preparation method thereof
KR20220165184A (en) 2021-06-07 2022-12-14 후지필름 가부시키가이샤 Composition for forming cured layer, laminate, method for manufacturing laminate, article having laminate, image display device and flexible display
US11773253B2 (en) * 2016-12-09 2023-10-03 Lg Chem, Ltd. Encapsulating composition

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004284221A (en) * 2003-03-24 2004-10-14 Sumitomo Chem Co Ltd Transparent base material with cured film and curable composition therefor
JP2005018054A (en) * 2003-06-03 2005-01-20 Shin Etsu Chem Co Ltd Antireflection film material, antireflection film using the same and pattern forming method
JP2007204611A (en) * 2006-02-02 2007-08-16 Kri Inc Silsesquioxane-containing cellulose derivative resin composition
JP2010113209A (en) * 2008-11-07 2010-05-20 Shin-Etsu Chemical Co Ltd Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
JP2011006610A (en) * 2009-06-26 2011-01-13 Nagase Chemtex Corp Transparent composite
JP2011079927A (en) * 2009-10-06 2011-04-21 Nagase Chemtex Corp Transparent composite material
JP2011256357A (en) * 2010-05-12 2011-12-22 Nagase Chemtex Corp Composition for hard coat, hard coat film, and display device
JP2012022227A (en) * 2010-07-16 2012-02-02 San Apro Kk Energy ray-curable composition containing iodonium alkyl fluorophosphate-based photoacid generator
JP2012116989A (en) * 2010-12-02 2012-06-21 Nagase Chemtex Corp Resin lens and optical resin composition

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004284221A (en) * 2003-03-24 2004-10-14 Sumitomo Chem Co Ltd Transparent base material with cured film and curable composition therefor
JP2005018054A (en) * 2003-06-03 2005-01-20 Shin Etsu Chem Co Ltd Antireflection film material, antireflection film using the same and pattern forming method
JP2007204611A (en) * 2006-02-02 2007-08-16 Kri Inc Silsesquioxane-containing cellulose derivative resin composition
JP2010113209A (en) * 2008-11-07 2010-05-20 Shin-Etsu Chemical Co Ltd Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
JP2011006610A (en) * 2009-06-26 2011-01-13 Nagase Chemtex Corp Transparent composite
JP2011079927A (en) * 2009-10-06 2011-04-21 Nagase Chemtex Corp Transparent composite material
JP2011256357A (en) * 2010-05-12 2011-12-22 Nagase Chemtex Corp Composition for hard coat, hard coat film, and display device
JP2012022227A (en) * 2010-07-16 2012-02-02 San Apro Kk Energy ray-curable composition containing iodonium alkyl fluorophosphate-based photoacid generator
JP2012116989A (en) * 2010-12-02 2012-06-21 Nagase Chemtex Corp Resin lens and optical resin composition

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11066586B2 (en) 2015-06-17 2021-07-20 Daicel Corporation Curable composition, adhesive sheet, cured product, laminate, method for producing adhesive sheet, and device
JPWO2016204114A1 (en) * 2015-06-17 2018-05-10 株式会社ダイセル Curable composition, adhesive sheet, cured product, laminate, method for producing adhesive sheet, and apparatus
WO2016204114A1 (en) * 2015-06-17 2016-12-22 株式会社ダイセル Curable composition, adhesive sheet, cured product, laminate, production method for adhesive sheet, and device
US11773253B2 (en) * 2016-12-09 2023-10-03 Lg Chem, Ltd. Encapsulating composition
WO2018207647A1 (en) * 2017-05-09 2018-11-15 株式会社ダイセル Composition for forming insulating film, insulating film, and semiconductor device including insulating film
JP2018188563A (en) * 2017-05-09 2018-11-29 株式会社ダイセル Composition for forming insulating film, insulating film, and semiconductor device including insulating film
EP3470484A1 (en) * 2017-10-16 2019-04-17 Samsung Electronics Co., Ltd. Composition, article, window for electronic device, and electronic device
WO2019188441A1 (en) * 2018-03-30 2019-10-03 富士フイルム株式会社 Composition for forming hard coat layer, hard coat film, article having hard coat film, image display device, and method for manufacturing hard coat film
JPWO2019188441A1 (en) * 2018-03-30 2021-02-12 富士フイルム株式会社 A composition for forming a hard coat layer, a hard coat film, an article having a hard coat film, an image display device, and a method for producing the hard coat film.
CN112469790A (en) * 2018-09-18 2021-03-09 富士胶片株式会社 Hard coating composition, hard coating film, article having hard coating film, image display device, and method for producing hard coating film
CN112469790B (en) * 2018-09-18 2022-02-11 富士胶片株式会社 Hard coating composition, hard coating film, article having hard coating film, image display device, and method for producing hard coating film
WO2020059726A1 (en) * 2018-09-18 2020-03-26 富士フイルム株式会社 Hard coat composition, hard coat film, article having hard coat film, image display, and method for manufacturing hard coat film
JPWO2020110966A1 (en) * 2018-11-27 2021-09-30 富士フイルム株式会社 Hard-coated film, articles with hard-coated film, and image display devices
JP7281481B2 (en) 2018-11-27 2023-05-25 富士フイルム株式会社 HARD COAT FILM, ARTICLE INCLUDED WITH HARD COAT FILM, AND IMAGE DISPLAY DEVICE
KR20220165184A (en) 2021-06-07 2022-12-14 후지필름 가부시키가이샤 Composition for forming cured layer, laminate, method for manufacturing laminate, article having laminate, image display device and flexible display
CN114539915A (en) * 2022-02-07 2022-05-27 厦门三德信科技股份有限公司 Low-shrinkage high-hardness flexible fingerprint hardening prevention coating and preparation method thereof

Also Published As

Publication number Publication date
JPWO2015053397A1 (en) 2017-03-09
JP6530316B2 (en) 2019-06-12

Similar Documents

Publication Publication Date Title
JP6530316B2 (en) Photocationically curable coating composition, method of forming coating film, coated article thereof
US11560453B2 (en) Polyorganosilsesquioxane, hard coat film, adhesive sheet, and laminate
JP2886853B1 (en) Cationic polymerizable coating composition
TWI498357B (en) An organic silicon compound having an oxetanyl group, a process for producing the same, and a hardened composition
US8293448B2 (en) Resin composition for stereolithography
JP3976778B2 (en) Oxetane compound and curable composition containing the same
WO2019146659A1 (en) Resin composition for forming hard coating layer
JP6545482B2 (en) Photo- or thermosetting resin composition, cured product and laminate
JP5297079B2 (en) Silicon compound having fluorene skeleton and polymerizable composition thereof
JP4003264B2 (en) COMPOUND HAVING OXETANYL GROUP, PROCESS FOR PRODUCING THE SAME, AND ACTIVE ENERGY RAY CURABLE COMPOSITION COMPRISING THE COMPOUND
JPH08231938A (en) Active energy ray curing type adhesive composition for laminate
JPH0320374A (en) Epoxysiloxane curing accelerator
JPH08218296A (en) Active energy beam-curable composition for paper coating
JP7069449B2 (en) Curable compositions, adhesive sheets, cured products, laminates, and equipment
JP2019001995A (en) Ultraviolet-curable resin composition, method of manufacturing organic el light-emitting device, and organic el light-emitting device
WO2017006664A1 (en) Photocurable composition, and cured material and optical component using same
EP1215254A2 (en) Radiation-curable organopolysiloxane composition
JP2006063261A (en) Photosensitive composition
JP3938946B2 (en) Active energy ray-curable composition for plastic coating
TWI832858B (en) Active energy ray curable composition
JPWO2013146651A1 (en) Cyclic ether group-containing (meth) acrylate
WO2004099286A1 (en) Cationically photopolymerizable resin composition and optical disk surface protection material
WO2004029126A1 (en) Hardening accelerator for cationic polymerization type composition
JP2002060483A (en) Active energy ray-curable resin composition
JP2008297271A (en) Oxetane compound and curable composition

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14851592

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2015541654

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 14851592

Country of ref document: EP

Kind code of ref document: A1