WO2015034291A1 - Touch panel using transparent conductive photosensitive film and method for manufacturing same - Google Patents

Touch panel using transparent conductive photosensitive film and method for manufacturing same Download PDF

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Publication number
WO2015034291A1
WO2015034291A1 PCT/KR2014/008329 KR2014008329W WO2015034291A1 WO 2015034291 A1 WO2015034291 A1 WO 2015034291A1 KR 2014008329 W KR2014008329 W KR 2014008329W WO 2015034291 A1 WO2015034291 A1 WO 2015034291A1
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WIPO (PCT)
Prior art keywords
touch panel
transparent
transparent conductive
electrode
photosensitive film
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PCT/KR2014/008329
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French (fr)
Korean (ko)
Inventor
박준영
정주현
송영진
노수천
서초란
한원희
이성림
허용
장성욱
Original Assignee
주식회사 티메이
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Application filed by 주식회사 티메이 filed Critical 주식회사 티메이
Publication of WO2015034291A1 publication Critical patent/WO2015034291A1/en

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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present invention relates to a manufacturing method of a touch panel, and in particular, a touch panel using a transparent conductive photosensitive film to implement a touch sensor and a touch panel and a manufacturing method of laminating a bottom electrode and a top electrode without using an adhesive layer. It is about.
  • the touch panel is an input device that can be easily used by anyone by interactively and intuitively operating a computer or the like by touching a button with a finger.
  • Such a touch panel has a resistive method, a capacitive method, an infrared method, an ultrasonic method, and the like, depending on a method of sensing a touch, and a resistive method is currently used, but it is advantageous for durability and light and simple characteristics in the future. The use of capacitive methods will be increased.
  • the capacitive touch panel particularly the touch screen, has an indium tin oxide (ITO) made of a transparent conductor on a transparent insulator film such as polyethylene terephthalate (PET) or glass, and a silver paste on the edge of the ITO.
  • ITO indium tin oxide
  • PET polyethylene terephthalate
  • a pad made of a lead wire is laminated up and down by adding an adhesive layer or an insulator layer.
  • ITO is composed of X-axis ITO having X-axis electrostatic electrodes formed at equal intervals and Y-axis ITO having Y-axis electrostatic electrodes formed at equal intervals so as to be stacked.
  • the touch screen formed as above is a controller that receives a touch signal according to a user's touch and outputs a coordinate signal.
  • the electrostatic electrodes arranged side by side on the X axis or the Y axis are arranged at different distances from the lead wire. Since different electrostatic electrodes are disposed between them, each electrostatic electrode has different electrical characteristics when viewed from the part where the lead wire is connected.
  • FIG. 1 is a view showing a state in which a bottom electrode of an X-axis capacitive electrode and a top electrode of a Y-axis capacitive electrode are laminated in a conventional capacitive touch panel.
  • the bottom electrode 10 having the X-axis capacitive electrode and the top electrode 20 having the Y-axis capacitive electrode are manufactured, respectively, and then laminated using the OCA (Optical Clear Adhesive) 30. Then, a window is attached to manufacture a touch panel.
  • OCA Optical Clear Adhesive
  • the bottom electrode 10 and the top electrode 20 form a plurality of electrostatic electrodes on the upper surface of the insulator layer 40 as ITO 50 and are connected to one end of each electrostatic electrode to exclude the window area of the touch panel.
  • the wiring electrode representing the metal lead in the edge region is formed of the metal layer 60.
  • an optical clear adhesive (OCA) 30 is essentially added. Accordingly, the conventional touch panel has a disadvantage in that it is expensive because two sheets of ITO film and OCA 30 are used to make one touch panel product.
  • the present invention provides a touch panel and a manufacturing method for laminating a bottom electrode and a top electrode without using an adhesive layer by implementing a touch sensor using a transparent conductive photosensitive film. Its purpose is to.
  • a plurality of first axis electrostatic electrodes corresponding to the window area of the touch panel and spaced apart at intervals of a predetermined distance are formed by selectively removing the transparent conductive layer and connected to one end of each first axis electrostatic electrode. Selectively removing the metal layer by forming a plurality of metal conductors which are edge regions of the metal layer; And
  • a transparent conductive photosensitive film of a transparent material After forming a transparent conductive photosensitive film of a transparent material on the upper surface of the touch panel, and selectively removes the transparent conductive photosensitive film from the layer formed of the transparent conductive photosensitive film, each of which is spaced apart from each of the first axis electrostatic electrode by a predetermined distance And forming a second electrode of the touch electrode that is an edge region of the touch panel connected to one end of each of the second axis electrostatic electrodes.
  • first metal conductors which are edge regions of the touch panel connected to one end of each first axis electrostatic electrode by selectively removing the metal layer
  • second metal conductors which are edge regions of the touch panel, connected to one end of the axis electrostatic electrode.
  • a plurality of first axis electrostatic electrodes corresponding to the window area of the touch panel and spaced apart at intervals of a predetermined distance, and a plurality of metal conductors that are edge regions of the touch panel connected to one end of each first axis electrostatic electrode; Forming a metal mesh structure having a fine pattern including one metal layer;
  • a transparent conductive photosensitive film of a transparent material After forming a transparent conductive photosensitive film of a transparent material on the upper surface of the touch panel, and selectively removes the transparent conductive photosensitive film from the layer formed of the transparent conductive photosensitive film, each of which is spaced apart from each of the first axis electrostatic electrode by a predetermined distance And forming a second electrode of the touch electrode that is an edge region of the touch panel connected to one end of each of the second axis electrostatic electrodes.
  • each of the second shaft electrostatic capacities crossing a predetermined distance from each of the first axis electrostatic electrode in the layer formed of the second transparent conductive photosensitive film Forming an electrode by selectively removing the second transparent conductive photosensitive film;
  • first metal conductors which are edge regions of the touch panel connected to one end of each first axis electrostatic electrode by selectively removing the metal layer
  • second metal conductors which are edge regions of the touch panel, connected to one end of the axis electrostatic electrode.
  • An insulator layer formed of an organic insulator or an inorganic insulator, a transparent conductive layer formed on an upper surface of the insulator layer and corresponding to the window region of the touch panel and forming a plurality of first axis electrostatic electrodes spaced at intervals of a predetermined distance;
  • a bottom electrode forming a plurality of metal conductors, which are edge regions of the touch panel, connected to one end of the plurality of first axis electrostatic electrodes;
  • a transparent conductive photosensitive film made of a transparent material is used as a wiring electrode, which is an edge region of each touch panel connected to one end of each of the second axis electrostatic electrode and the second axis electrostatic electrode, which intersects with each of the first axis electrostatic electrodes at a predetermined distance.
  • the transparent conductive photosensitive film includes a top electrode formed of a transparent insulating material, and a transparent photosensitive resin layer made of a transparent insulating material, and a transparent conductive material which is a conductive material of a transparent material stacked thereon, and an upper surface of the bottom electrode.
  • the top electrode is laminated on the transparent photosensitive resin layer.
  • An insulator layer formed of an organic insulator or an inorganic insulator, a transparent conductive layer formed on an upper surface of the insulator layer and corresponding to the window region of the touch panel and forming a plurality of first axis electrostatic electrodes spaced at intervals of a predetermined distance;
  • a bottom electrode forming a plurality of first metal conductors, which are edge regions of a touch panel connected to one end of the plurality of first axis electrostatic electrodes;
  • a transparent conductive photosensitive film made of a transparent material that corresponds to the window area of the touch panel and forms a respective second axis electrostatic electrode crossing the first axis electrostatic electrode at a predetermined distance from the first axis electrostatic electrode, and one end of the second axis electrostatic electrode
  • a top electrode forming a plurality of second metal conductors, which are edge regions of the touch panel connected to the touch panel, wherein the transparent conductive photosensitive film comprises a transparent photosensitive resin layer made of a transparent insulating material, and a transparent material stacked thereon It is made of a transparent conductive material of the conductive material, and the top electrode on the upper surface of the transparent conductive layer is laminated by a transparent photosensitive resin layer.
  • An insulator layer made of an organic insulator or an inorganic insulator, a plurality of first axis electrostatic electrodes formed on an upper surface of the insulator layer, corresponding to the window region of the touch panel, and spaced apart at regular intervals, and each first axis electrostatic
  • a bottom electrode for forming a plurality of metal conductors, which are edge regions of a touch panel connected to one end of the electrode, in a fine pattern metal mesh structure formed of one metal layer;
  • a transparent conductive photosensitive film made of a transparent material is used as a wiring electrode, which is an edge region of each touch panel connected to one end of each of the second axis electrostatic electrode and the second axis electrostatic electrode, which intersects with each of the first axis electrostatic electrodes at a predetermined distance.
  • the transparent conductive photosensitive film includes a top electrode formed of a transparent insulating material, and a transparent photosensitive resin layer made of a transparent insulating material, and a transparent conductive material which is a conductive material of a transparent material stacked thereon, and an upper surface of the bottom electrode.
  • the top electrode is laminated on the transparent photosensitive resin layer.
  • a first transparent conductive photosensitive film made of a transparent material that corresponds to the window area of the touch panel and is spaced apart at intervals of a predetermined distance, and is connected to one end of each first axis electrostatic electrode;
  • a bottom electrode forming a plurality of first metal conductors, which are edge regions of the touch panel;
  • a second transparent conductive photosensitive film made of a transparent material corresponding to the window area of the touch panel and forming respective second axis electrostatic electrodes crossing the first axis electrostatic electrodes at a predetermined distance from each other, and each second axis electrostatic
  • a top electrode forming a plurality of second metal conductors, which are edge regions of the touch panel connected to one end of the electrode, wherein the first transparent conductive photosensitive film and the second transparent conductive photosensitive film are made of a transparent insulating material. It is made of a transparent photosensitive resin layer and a transparent conductive material which is a conductive material of a transparent material laminated thereon, the top electrode on the top surface of the bottom electrode is laminated by the transparent photosensitive resin layer of the second transparent conductive photosensitive film.
  • the present invention has the effect of lowering the raw material cost and the process cost by implementing a touch sensor using a transparent conductive photosensitive film.
  • the present invention has the effect of slimming the electrode through the use of a transparent conductive photosensitive film of about 5 ⁇ m because OCA is not used because the laminated with the light-transmissive photosensitive resin layer when the bottom electrode and the top electrode is laminated.
  • the present invention has the effect of improving the productivity by simplifying the manufacturing process of the existing touch panel.
  • FIG. 1 is a view showing a state in which a bottom electrode of an X-axis capacitive electrode and a top electrode of a Y-axis capacitive electrode are laminated in a conventional capacitive touch panel.
  • FIGS. 2 to 4 are diagrams showing a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a first embodiment of the present invention with a layer structure in a side view.
  • FIG. 5 is a plan view illustrating a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a first embodiment of the present invention.
  • FIG. 6 is a perspective view illustrating a touch panel using a transparent conductive photosensitive film according to a first embodiment of the present invention.
  • FIG. 7 is a plan view illustrating a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a second embodiment of the present invention.
  • FIG. 8 is a view conceptually showing a patterning method of a conductive polymer according to a second embodiment of the present invention.
  • FIG. 9 is a diagram illustrating a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a third exemplary embodiment of the present invention in a layer structure from the side.
  • FIG. 10 is a plan view illustrating a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a third embodiment of the present invention.
  • FIGS. 2 to 4 are diagrams showing a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a first embodiment of the present invention in a layer structure from the side
  • FIG. 5 is a transparent according to the first embodiment of the present invention.
  • 6 is a plan view illustrating a method of manufacturing a touch panel using a conductive photosensitive film
  • FIG. 6 is a perspective view illustrating a touch panel using a transparent conductive photosensitive film according to a first embodiment of the present invention.
  • an index matching layer 112 is formed on an upper surface of the insulator layer 110.
  • the transparent conductive layer 120 is formed thereon, and the metal layer 130 is formed on the upper surface of the transparent conductive layer 120.
  • the insulator layer 110 is formed of an organic insulator or an inorganic insulator of a transparent material, and the organic insulator is polyimide or polyethylene terephthalate (PET), polyethylenenaphthalate (PEN), polycarbonate, PC), acrylic plastic material, and the inorganic insulator is made of glass material and optically treated glass material.
  • Index-Matching (112) is a coating to form an insulating film layer using an insulating material having a difference in refractive index with the transparent conductive layer 120, and to treat the presence or absence of ITO after the ITO (120) pattern to be,
  • the index matching layer 112 forms a pattern on the transparent conductive layer 120, and then improves the visibility phenomenon due to the difference in reflectance between the portions with and without the transparent conductive layer 120.
  • the index matching layer 112 is an insulating layer having a refractive index that can improve the visibility of the circuit of the transparent conductive layer 120.
  • the index matching layer 112 means that the lower layer of the ITO 120 is optically treated so that the portion of the ITO and the portion of the non-existent ITO film are not detected by the eye when the capacitive ITO film is manufactured.
  • the index matching layer 112 may raise SiO 2 , TiO 2, Ceo 2, or the like by a dry method (deposition), or may perform a chemical treatment by a wet method.
  • the index matching layer 112 may have an insulating layer such as SiO 2 , TiO 2, Ceo 2, or Nb 2 O 5 having a refractive index capable of compensating for the height of the transparent conductive layer 120 in a single or multiple layer structure. Form.
  • a transparent conductive layer 120 is a transparent conductive oxide (Transparent Conducting Oxide, TCO) and formed of a conductive material of transparent material, such as, specifically, including ITO or IZO (Indium Zinc Oxide) or ITO, IZO, SnO 2, AZO It is formed of a transparent conductive material.
  • TCO Transparent Conducting Oxide
  • the transparent conductive layer (ITO film, etc.) 120 of the present invention includes an index matching layer (insulation layer) 112 on the bottom surface.
  • the metal layer 130 includes Cu, Cu alloy, Ag, Ag alloy, Ni + Cr, Ni + Ni alloy, Mo / Ag, Mo / Al / Mo, Ni + Cr / Cu / Ni + Cr, Ni alloy / Cu, Ni All conductive materials including alloy / Cu / Ni alloy, Mo / APC, Cu / Ni + Cu + Ti, Ni + Cu + Ti / Cu / Ni + Cu + Ti, APC (silver, palladium, copper alloy), carbon It is a concept which is formed by the well-known technique of printing, vapor deposition, paste, and application
  • the metal layer 130 may be formed of an Ag paste, or a variety of methods may be used, such as depositing copper.
  • the metal layer 130 may use various metals and is preferably copper or aluminum in consideration of ease of manufacture and electrical conductivity.
  • the metal layer 130 may be formed by a known method such as laminating, vapor deposition, or coating.
  • the present invention forms a first photosensitive material 140 on the upper surface of the metal layer 130, the first pattern formed UV irradiation using the artwork film 142 forms a pattern on the first photosensitive material 140 (exposure), and forms an open pattern on the first photosensitive material 140 using a weak alkali solution (developing) ).
  • the present invention illustrates the first artwork film 142 in which the pattern is formed
  • the present invention is not limited thereto, and any pattern tool may be used, and using the equipment for directly implementing the pattern without the pattern tool. An exposure process may also be performed.
  • the process of forming the first photosensitive material 140 is formed by coating a liquid photoresist or laminating a dry film.
  • a coating process may be used, and in the case of using an insulating material of SiO 2 or TiO 2 , a deposition process may be used.
  • the present invention uses an acidic chemical to the first photosensitive material 140 having an open pattern to form the transparent conductive layer 120 and the metal layer 130. Etching or simultaneous etching is performed, and the first photosensitive material 140 is removed using a strong alkali chemical to form the electrostatic electrode pattern 122 and the wiring electrode pattern 132 (etching process, peeling process). 3 (e) and 3 (f) are subjected to lamination, exposure, development, etching, and peeling by a process of primary photolithography.
  • the electrostatic electrode pattern 122 is a portion corresponding to the window area (the area where the screen is displayed) of the touch panel, and represents a bar pattern indicating a plurality of electrostatic electrodes formed spaced at a predetermined distance apart, and the user's touch pattern Represents an area.
  • the electrostatic electrode pattern 122 of the present invention includes a plurality of X-axis electrostatic electrodes 122b and each of the Y-axis electrostatic electrodes 122a crossing at right angles with a predetermined distance from the X-axis electrostatic electrodes 122b. Include.
  • the wiring electrode pattern 132 is a circuit representing a metal lead of an edge region excluding the window region of the touch panel.
  • the wiring electrode pattern 132 is connected outwardly from one end of each electrostatic electrode to detect the user's touch pattern and leads. It includes a metal electrode portion of the FPCB bonding region connected to one end of the electrode is exposed to the outside and coupled with the flexible printed circuit board (FPCB).
  • the wiring electrode pattern 132 of the present invention is spaced apart from the wiring electrode pattern 132a connected to one end of each of the Y-axis electrostatic electrodes 122a and the respective Y-axis electrostatic electrodes 122a by a predetermined distance in a right angle direction.
  • a wiring electrode pattern 132b connected to one end of the plurality of intersecting X-axis electrostatic electrodes 122a is formed through selective etching.
  • the present invention provides a metal layer formed on the electrostatic electrode pattern 122 which is a window area of a touch panel by a process of secondary photolithography. 130 is selectively removed to leave the transparent conductive layer 120.
  • the present invention forms a plurality of X-axis electrostatic electrodes 122b corresponding to the window region of the touch panel and spaced apart at intervals of a predetermined distance from the transparent conductive layer 120.
  • a plurality of metal conductors 132b which are edge regions of the touch panel connected to one end of each of the X-axis electrostatic electrodes 122b, are formed of the metal layer 130.
  • the process of secondary photolithography is subjected to laminating, exposure, developing, etching, and peeling processes which are the same processes as those of the above-described primary photolithography.
  • the present invention includes a plurality of X-axis electrostatic electrodes 122b made of a transparent conductive layer 120 and a wiring made of a metal layer 130.
  • a transparent conductive photosensitive film 160 of a transparent material is formed on the upper surface of the touch panel (laminating, coating or deposition process).
  • the transparent conductive photosensitive film 160 includes a transparent photosensitive resin layer 162 and a transparent conductive material 164 stacked thereon.
  • the thickness of the transparent conductive photosensitive film 160 is generally 1-100 ⁇ m, preferably 2.5-50 ⁇ m, and 2.5-10 ⁇ m may be used for mass productivity and cost reduction. That is, the top electrode 200 may be made of a transparent conductive photosensitive film 160, thereby making it possible to slim down the thickness.
  • the transparent photosensitive resin layer 162 includes a transparent dry film, an organic insulator or an inorganic insulator of a transparent material as a transparent insulating material.
  • the transparent conductive material 164 is a conductive and photosensitive transparent material, carbon nanotube (CNT), graphene, conductive polymer, silver nanowires (AGNW), hybrid AGNW ( CNT + AGNW), formed of a transparent conductive material composed of hybrid graphene (AGNW + graphene) and the like, and conductive polymer, Cu, Cu alloy, Ag, Ag alloy, Ni + Cr, Ni + Ni alloy, Mo / Ag, Mo / Al / Mo, Ni + Cr / Cu / Ni + Cr, Ni alloy / Cu, Ni alloy / Cu / Ni alloy, Mo / APC, Cu / Ni + Cu + Ti, Ni + Cu + Ti / Cu / Ni + The concept includes all conductive materials such as Cu + Ti, carbon, and transparent conducting oxide (TCO).
  • TCO transparent conducting oxide
  • the present invention is transparent in the layer formed of the transparent conductive photosensitive film 160 by the photolithography exposure and development process.
  • the photosensitive resin layer 162 and the transparent conductive material 164 stacked thereon are selectively removed to connect the plurality of Y-axis electrostatic electrodes 122a and 164 to one end of each of the Y-axis electrostatic electrodes 122a and 164.
  • the wiring electrode patterns 132a and 164 are formed.
  • a pattern is formed on the transparent conductive photosensitive film 160 (exposure), and is transparent using a weak alkali solution.
  • a pattern is formed on the conductive photosensitive film 160 (development).
  • the pattern formed on the transparent conductive photosensitive film 160 has a plurality of Y-axis electrostatic electrodes 122a and 164 and the wiring electrode patterns 132a and 164 as shown in FIGS. 4 (j) and 5 (c). It means a pattern in which an area not applicable is opened.
  • the present invention illustrates the second artwork film 154 having a pattern
  • the present invention is not limited thereto. Any pattern tool having a pattern may be used, and any device that directly implements the pattern without the pattern tool may be used. An exposure process may also be performed.
  • the plurality of X-axis electrostatic electrodes and the Y-axis electrostatic electrodes are formed in a bar pattern, but the present invention is not limited thereto and may be variously applied, such as a square, a circle, a diamond, a polygon, and a random pattern.
  • the bottom electrode 100 forms a plurality of X-axis electrostatic electrodes on the upper surface of the insulator layer 110 as the ITO 120 and is connected to one end of each X-axis electrostatic electrode.
  • the wiring electrode patterns 132b and 130 of the edge region excluding the window region of the panel are formed of the metal layer 130.
  • the top electrode 200 includes a plurality of Y-axis electrostatic electrodes 122a and 164 made of a transparent conductive photosensitive film 160 including a transparent photosensitive resin layer 162 and a transparent conductive material 164 and each of the Y-axis electrostatic electrodes ( The wiring electrode patterns 132a and 164 connected to one end of the 122a and 164 are formed.
  • the light-transmissive photosensitive resin layer 162 serves as insulation and a contact agent between the top electrode 200 and the bottom electrode 100.
  • the present invention uses only one sheet of the ITO film and the metal film (bottom electrode 100), and in the case of the top electrode 200, since the metal trace is short, both the transparent electrode and the metal electrode are made of the transparent conductive material 164 without metal. Can be implemented.
  • FIG. 7 is a plan view illustrating a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a second embodiment of the present invention
  • FIG. 8 conceptually illustrates a method of patterning a conductive polymer according to a second embodiment of the present invention. It is a figure shown.
  • the manufacturing method of the touch panel of the second embodiment of the present invention will be described in detail with the focus on the differences, and the description overlapping with the above-described manufacturing method of the touch panel of the first embodiment of the present invention will be omitted.
  • the metal layer 130 is formed on the upper surface of the transparent conductive layer 120.
  • one end of each of the plurality of X-axis electrostatic electrodes 122b and 120 formed of the transparent conductive layer 120 and the X-axis electrostatic electrodes 122b and 120 formed of the metal layer 130 is formed by a photolithography process. Wiring electrode patterns 132b and 130 connected thereto are formed.
  • the present invention forms a transparent photosensitive resin layer 160 including a transparent photosensitive resin layer 162 made of a transparent insulating material on the upper surface of the touch panel, and a transparent conductive material 164 made of a conductive polymer thereon. .
  • the conductive polymer 164 may be polythiophene-based, polypyrrole-based, polyaniline-based, polyacetylene-based, polyphenylene-based, or the like, and is particularly preferable for the PEDOT / PSS compound among polythiophene-based compounds.
  • One or more types of the above-described organic compounds may be mixed and used.
  • the conductivity may be increased.
  • the conductive polymer 164 maintains conductivity by the structure of the double bond benzene ring.
  • the conductive polymer 164 can be removed by the wet process, the wet process, as shown in Figure 8, by reacting with the etchant (ETCHANT) 170 to boil the structure of the double bond benzene ring to make a single bond conductive Can be eliminated.
  • ECHANT etchant
  • the conductive polymer 164 is made of the non-conductive polymer 166, the polymer layer is maintained as it is, but the conductivity is lost, and the conductivity does not return to the double bond without a special catalyst.
  • the present invention forms a transparent conductive photosensitive film 160 of a transparent material on the upper surface of the touch panel, and then a portion corresponding to the plurality of Y-axis electrostatic electrodes 122a and 164 and a respective Y-axis electrostatic electrode by a wet process.
  • the non-conductive polymer 166 maintains the conductivity of the conductive polymer 164 of the wiring electrode patterns 132a and 164 connected to one end of the 122a and 164, and loses the conductivity of the conductive polymer 164 in the non-pattern region. (Conductive polymer patterning process).
  • the present invention covers the FPCB bonding area to which the printed circuit board is bonded with a conductive polymer to prevent corrosion of the oxidation generating area, to prevent the problem of metal cracking by external pressure, and to act as a buffer during FPCB bonding, and to separate sealing and water repellent.
  • the coating process is omitted, reducing the process cost.
  • the present invention has excellent visibility in terms of visibility by implementing a touch sensor by using the characteristics of the conductive polymer, and thus an index matching layer process is unnecessary.
  • the present invention has advantages in terms of productivity and cost because the coating speed of the conductive polymer is superior to that of ITO or metal deposition.
  • FIG. 9 is a view illustrating a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a third embodiment of the present invention in a layer structure from the side
  • FIG. 10 is a transparent conductive photosensitive film according to a third embodiment of the present invention. It is a figure which showed the manufacturing method of the touchscreen using the plane.
  • an index matching layer is formed on an upper surface of the insulator layer 110. And forming a transparent conductive layer 120 thereon, and then forming a plurality of X-axis electrostatic electrodes 122b and 120 in a layer formed of the transparent conductive layer 120 by a photolithography process. do.
  • the present invention forms a plurality of X-axis electrostatic electrodes 122b including the transparent conductive layer 120, and then A transparent conductive photosensitive film 160 of transparent material is formed on the upper surface.
  • the present invention provides a transparent photosensitive resin layer in a layer formed of a transparent conductive photosensitive film 160 by an exposure and development process of photolithography. 162 and the transparent conductive material 164 stacked thereon are selectively removed to form a plurality of Y-axis electrostatic electrodes 122a and 164.
  • the metal layer 130 is formed by a photolithography process. Selectively removes the wiring electrode pattern 132b connected to one end of each of the X-axis electrostatic electrodes 122b and 120, and the wiring electrode connected to one end of each of the Y-axis electrostatic electrodes 122a and 160.
  • the pattern 132a is formed simultaneously.
  • the wiring electrode pattern 132b of the bottom electrode 100 and the wiring electrode pattern 132a of the top electrode 200 are formed of a metal layer 130, and are coated with silver paste printing or silver paste using ink for silk screen printing. It is then simultaneously formed in one process, such as photosensitive silver paste printing to implement a pattern by photolithography exposure and development processes.
  • the structure of the touch panel of the first embodiment is difficult and the chip design is difficult or the metal section is long, it may have the structure of the touch panel of the third embodiment.
  • the metal layer 130 is formed on the upper surface of the insulator layer 110, and a plurality of metal layers 130 are formed by a photolithography process.
  • the X-axis electrostatic electrode 122b and the wiring electrode pattern 132b connected to one end of each X-axis electrostatic electrode 122b are formed. That is, the photolithography process is performed by dry film laminating, exposure, development, metal etching, peeling process.
  • the plurality of X-axis electrostatic electrodes 122b form a fine pattern metal mesh structure through the plurality of first linear electrode portions and the plurality of second linear electrode portions that cross each of the first linear electrode portions.
  • the metal mesh structure of the fine pattern is formed by performing the photolithography process (Wet process) to form the electrostatic electrode pattern 122b, the metal layer 130 is removed and patterned into a direct mesh structure or the metal layer 130 is deposited.
  • Various embodiments may be formed using a laser etching method to form a mesh structure.
  • the present invention forms a transparent conductive photosensitive film 160 on the upper surface of the touch panel, the transparent photosensitive resin layer 162 in the layer formed of the transparent conductive photosensitive film 160 by the exposure and development process of photolithography. And the plurality of Y-axis electrostatic electrodes 122a and 164 and the wiring electrode patterns 132a connected to one end of each of the Y-axis electrostatic electrodes 122a and 164 by selectively removing the transparent conductive material 164 stacked thereon. 164).
  • the bottom electrode 100 is formed of a metal mesh structure having a fine pattern formed of the metal layer 130, and the top electrode 200 is formed of a transparent conductive photosensitive film 160.
  • the manufacturing method of the touch panel according to the fifth embodiment of the present invention will be described in detail with the focus on the differences from the description overlapping with the manufacturing method of the touch panel of the third embodiment of the present invention described above. .
  • the transparent photosensitive resin layer 162 and the transparent conductive material stacked thereon are formed in the layer formed of the transparent conductive photosensitive film 160 by the photolithography exposure and development process. 164 is selectively removed to form a plurality of X-axis electrostatic electrodes 122b and 120.
  • the present invention after forming a plurality of X-axis electrostatic electrode 122b made of a transparent conductive photosensitive film 160, to form a transparent conductive photosensitive film 160 of a transparent material on the upper surface of the touch panel.
  • the present invention selectively removes the transparent photosensitive resin layer 162 and the transparent conductive material 164 stacked thereon from the layer formed of the transparent conductive photosensitive film 160 by the photolithography exposure and development process.
  • Y-axis electrostatic electrodes 122a and 164 are formed.
  • each of the X-axis electrostatic electrodes 122b and 120 is selectively removed by the photolithography process. And a wiring electrode pattern 132b connected to each other and a wiring electrode pattern 132a connected to one end of each of the Y-axis electrostatic electrodes 122a and 160 are simultaneously formed.
  • the wiring electrode pattern 132b of the bottom electrode 100 and the wiring electrode pattern 132a of the top electrode 200 are formed of a metal layer 130, and are coated with silver paste printing or silver paste using ink for silk screen printing. It is then simultaneously formed in one process, such as photosensitive silver paste printing to implement a pattern by photolithography exposure and development processes.
  • the transparent conductive material 164 is made of a conductive polymer to maintain the conductivity of the conductive polymer 164, and the The conductivity of the conductive polymer 164 may be lost to make it a non-conductive polymer 166 (conductive polymer patterning process).
  • insulator layer 112 index matching layer
  • 122a Y-axis electrostatic electrode 122b: X-axis electrostatic electrode
  • metal layer 132 wiring electrode pattern
  • first photosensitive material 142 first artwork film
  • second artwork film 160 transparent conductive photosensitive film
  • the present invention has the effect of lowering the raw material cost and the process cost by implementing a touch sensor using a transparent conductive photosensitive film.
  • the present invention has the effect of slimming the electrode through the use of a transparent conductive photosensitive film of about 5 ⁇ m because OCA is not used because the laminated with the light-transmissive photosensitive resin layer when the bottom electrode and the top electrode is laminated.
  • the present invention has the effect of improving the productivity by simplifying the manufacturing process of the existing touch panel.

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Abstract

A method for manufacturing a touch panel comprises the steps of: forming a plurality of first-axis electrostatic electrodes, which are formed on a window area of a touch panel and formed to be separated at a uniform distance, by selectively removing a transparent conductive layer, and forming a plurality of metal conducting wires, which are formed on an edge area of the touch panel connected to one end of each of the first-axis electrostatic electrodes, by selectively removing a metal layer; and forming a transparent conductive photosensitive film made from a transparent material on the upper surface of the touch panel, and then selectively removing the transparent conductive photosensitive film from a layer comprising the transparent conductive photosensitive film, to form second-axis electrostatic electrodes which are separated at a specific distance away from and which cross each of the first electrostatic electrodes, and forming a wiring electrode which is formed on an edge area of the touch panel connected to one end of each of the second-axis electrostatic electrodes.

Description

투명 전도성 감광필름을 이용한 터치 패널 및 제조 방법Touch panel and manufacturing method using transparent conductive photosensitive film
본 발명은 터치 패널의 제조 방법에 관한 것으로서, 특히 투명 전도성 감광필름을 이용하여 터치 센서를 구현하여 접착제층을 사용하지 않고 바텀(Bottom) 전극과 탑(Top) 전극을 합지하는 터치 패널 및 제조 방법에 관한 것이다.The present invention relates to a manufacturing method of a touch panel, and in particular, a touch panel using a transparent conductive photosensitive film to implement a touch sensor and a touch panel and a manufacturing method of laminating a bottom electrode and a top electrode without using an adhesive layer. It is about.
일반적으로 터치 패널은 버튼을 손가락으로 접촉하여 컴퓨터 등을 대화적, 직감적으로 조작함으로써 누구나 쉽게 사용할 수 있는 입력 장치이다.In general, the touch panel is an input device that can be easily used by anyone by interactively and intuitively operating a computer or the like by touching a button with a finger.
이러한 터치 패널은 접촉을 감지하는 방식에 따라 저항막 방식과 정전용량 방식, 적외선방식, 초음파 방식 등이 사용되고 있으며, 현재는 저항막 방식이 많이 사용되어지고 있으나, 향후 내구성 및 경박 단소한 특성에 유리한 정전용량 방식의 사용이 증가될 것이다.Such a touch panel has a resistive method, a capacitive method, an infrared method, an ultrasonic method, and the like, depending on a method of sensing a touch, and a resistive method is currently used, but it is advantageous for durability and light and simple characteristics in the future. The use of capacitive methods will be increased.
이와 같은 상기 정전용량방식의 터치 패널, 특히 터치스크린은 그 구조가 PET(Polyethylene Terephthalate)나 유리 등의 투명한 절연체 필름 상에 투광 도전체로 이루어진 ITO(Indium Tin Oxide)와, ITO의 테두리에 실버 페이스트 등의 리드선으로 이루어진 패드를 접착제층이나 절연체층을 부가하여 상하로 적층하여 구성된다.The capacitive touch panel, particularly the touch screen, has an indium tin oxide (ITO) made of a transparent conductor on a transparent insulator film such as polyethylene terephthalate (PET) or glass, and a silver paste on the edge of the ITO. A pad made of a lead wire is laminated up and down by adding an adhesive layer or an insulator layer.
여기서, ITO는 X축의 X축 정전전극을 등 간격으로 형성한 X축 ITO와 Y축의 Y축 정전전극을 등 간격으로 형성한 Y축 ITO로 구성하여 적층되도록 한다.Here, ITO is composed of X-axis ITO having X-axis electrostatic electrodes formed at equal intervals and Y-axis ITO having Y-axis electrostatic electrodes formed at equal intervals so as to be stacked.
위와 같이 형성된 터치스크린은 사용자의 터치에 따른 터치 신호를 컨트롤러가 입력 받아서 좌표 신호를 출력하는 것이다.The touch screen formed as above is a controller that receives a touch signal according to a user's touch and outputs a coordinate signal.
그런데 이와 같이 X축 또는 Y축에 나란하게 배치되는 정전전극은 리드선으로부터 각각 다른 이격거리를 가지고 배치된다. 이들 사이에는 다른 정전전극이 배치되므로 리드선이 연결되는 부분에서 바라보면 각각의 정전전극은 서로 다른 전기적 특성을 가지게 된다.As described above, the electrostatic electrodes arranged side by side on the X axis or the Y axis are arranged at different distances from the lead wire. Since different electrostatic electrodes are disposed between them, each electrostatic electrode has different electrical characteristics when viewed from the part where the lead wire is connected.
이하에서는 이러한 터치 패널의 종래 기술에 관하여 도 1를 참조하여 설명한다.Hereinafter, a conventional technology of such a touch panel will be described with reference to FIG. 1.
도 1은 종래의 정전용량 방식의 터치 패널에서 X축 정전전극의 바텀(Bottom) 전극과 Y축 정전전극의 탑(Top) 전극을 합지하는 상태를 나타낸 도면이다.1 is a view showing a state in which a bottom electrode of an X-axis capacitive electrode and a top electrode of a Y-axis capacitive electrode are laminated in a conventional capacitive touch panel.
종래의 정전용량 방식의 터치 패널은 X축 정전전극을 갖는 바텀 전극(10)과 Y축 정전전극을 갖는 탑 전극(20)을 각각 제작한후 OCA(Optical Clear Adhesive)(30)를 이용하여 합지한 후 윈도우를 부착하여 터치 패널을 제조한다.In the conventional capacitive touch panel, the bottom electrode 10 having the X-axis capacitive electrode and the top electrode 20 having the Y-axis capacitive electrode are manufactured, respectively, and then laminated using the OCA (Optical Clear Adhesive) 30. Then, a window is attached to manufacture a touch panel.
바텀 전극(10)과 탑 전극(20)은 절연체층(40)의 상부면에 복수개의 정전전극을 ITO(50)로 형성하고 각각의 정전전극의 일측 끝단에 연결되어 터치 패널의 원도우 영역을 제외한 가장자리 영역의 금속 도선을 나타내는 배선전극을 금속층(60)으로 형성한다.The bottom electrode 10 and the top electrode 20 form a plurality of electrostatic electrodes on the upper surface of the insulator layer 40 as ITO 50 and are connected to one end of each electrostatic electrode to exclude the window area of the touch panel. The wiring electrode representing the metal lead in the edge region is formed of the metal layer 60.
이러한 종래의 정전방식 터치 패널은 바텀 전극(10)과 탑 전극(20)을 각각 제작하므로 바텀 전극(10)과 탑 전극(20)에 사용되는 ITO 필름이 2장 필요하였다.Since the conventional capacitive touch panel manufactures the bottom electrode 10 and the top electrode 20, respectively, two ITO films used for the bottom electrode 10 and the top electrode 20 were required.
바텀 전극(10)과 탑 전극(20)은 합지할 때 OCA(Optical Clear Adhesive)(30)가 필수적으로 부가되어야 한다. 따라서, 종래의 터치 패널은 하나의 터치 패널 제품을 만들기위해 ITO 필름과 OCA(30)가 각각 두 장이 사용되기 때문에 가격적으로 비싼 단점이 있다.When the bottom electrode 10 and the top electrode 20 are laminated, an optical clear adhesive (OCA) 30 is essentially added. Accordingly, the conventional touch panel has a disadvantage in that it is expensive because two sheets of ITO film and OCA 30 are used to make one touch panel product.
종래의 터치 패널은 바텀 전극(10)과 탑 전극(20)의 제조시 ITO와 메탈 증착 가공 공정이 구현되어야 하므로 높은 원자재 비용과 공정 과정이 복잡한 단점이 있었다.In the conventional touch panel, since the ITO and the metal deposition process must be implemented when the bottom electrode 10 and the top electrode 20 are manufactured, high cost of raw materials and a complicated process are complicated.
이와 같은 문제점을 해결하기 위하여, 본 발명은 투명 전도성 감광필름을 이용하여 터치 센서를 구현하여 접착제층을 사용하지 않고 바텀(Bottom) 전극과 탑(Top) 전극을 합지하는 터치 패널 및 제조 방법을 제공하는데 그 목적이 있다.In order to solve this problem, the present invention provides a touch panel and a manufacturing method for laminating a bottom electrode and a top electrode without using an adhesive layer by implementing a touch sensor using a transparent conductive photosensitive film. Its purpose is to.
상기 목적을 달성하기 위하여, 본 발명의 특징에 따른 터치 패널의 제조 방법은,In order to achieve the above object, the manufacturing method of the touch panel according to the characteristics of the present invention,
터치 패널의 원도우 영역에 해당하고 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극을 투명 도전층을 선택적으로 제거하여 형성하고, 각각의 제1축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 금속 도선을 금속층을 선택적으로 제거하여 형성하는 단계; 및A plurality of first axis electrostatic electrodes corresponding to the window area of the touch panel and spaced apart at intervals of a predetermined distance are formed by selectively removing the transparent conductive layer and connected to one end of each first axis electrostatic electrode. Selectively removing the metal layer by forming a plurality of metal conductors which are edge regions of the metal layer; And
터치 패널의 상부면에 투명한 재질의 투명 전도성 감광필름을 형성한 후, 투명 전도성 감광필름으로 형성된 층에서 투명 전도성 감광필름을 선택적으로 제거하여 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극과, 각각의 제2축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 배선전극을 형성하는 단계를 포함한다.After forming a transparent conductive photosensitive film of a transparent material on the upper surface of the touch panel, and selectively removes the transparent conductive photosensitive film from the layer formed of the transparent conductive photosensitive film, each of which is spaced apart from each of the first axis electrostatic electrode by a predetermined distance And forming a second electrode of the touch electrode that is an edge region of the touch panel connected to one end of each of the second axis electrostatic electrodes.
본 발명의 특징에 따른 터치 패널의 제조 방법은,Method for manufacturing a touch panel according to a feature of the invention,
터치 패널의 원도우 영역에 해당하고 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극을 투명 도전층을 선택적으로 제거하여 형성하는 단계;Selectively removing the transparent conductive layer from the plurality of first axis electrostatic electrodes corresponding to the window area of the touch panel and spaced apart at intervals of a predetermined distance;
터치 패널의 상부면에 투명한 재질의 투명 전도성 감광필름을 형성한 후, 투명 전도성 감광필름으로 형성된 층에서 투명 전도성 감광필름을 선택적으로 제거하여 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극을 형성하는 단계; 및After forming a transparent conductive photosensitive film of a transparent material on the upper surface of the touch panel, and selectively removes the transparent conductive photosensitive film from the layer formed of the transparent conductive photosensitive film, each of which is spaced apart from each of the first axis electrostatic electrode by a predetermined distance Forming a second axis electrostatic electrode; And
터치 패널의 상부면에 금속층을 형성한 후, 금속층을 선택적으로 제거하여 각각의 제1축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 제1 금속 도선과, 각각의 제2축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 제2 금속 도선을 동시에 형성하는 단계를 포함한다.After the metal layer is formed on the upper surface of the touch panel, a plurality of first metal conductors, which are edge regions of the touch panel connected to one end of each first axis electrostatic electrode by selectively removing the metal layer, and each second And simultaneously forming a plurality of second metal conductors, which are edge regions of the touch panel, connected to one end of the axis electrostatic electrode.
본 발명의 특징에 따른 터치 패널의 제조 방법은,Method for manufacturing a touch panel according to a feature of the invention,
터치 패널의 원도우 영역에 해당하고 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극과, 각각의 제1축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 금속 도선을 하나의 금속층으로 이루어진 미세 패턴의 메탈 메쉬 구조로 형성하는 단계; 및A plurality of first axis electrostatic electrodes corresponding to the window area of the touch panel and spaced apart at intervals of a predetermined distance, and a plurality of metal conductors that are edge regions of the touch panel connected to one end of each first axis electrostatic electrode; Forming a metal mesh structure having a fine pattern including one metal layer; And
터치 패널의 상부면에 투명한 재질의 투명 전도성 감광필름을 형성한 후, 투명 전도성 감광필름으로 형성된 층에서 투명 전도성 감광필름을 선택적으로 제거하여 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극과, 각각의 제2축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 배선전극을 형성하는 단계를 포함한다.After forming a transparent conductive photosensitive film of a transparent material on the upper surface of the touch panel, and selectively removes the transparent conductive photosensitive film from the layer formed of the transparent conductive photosensitive film, each of which is spaced apart from each of the first axis electrostatic electrode by a predetermined distance And forming a second electrode of the touch electrode that is an edge region of the touch panel connected to one end of each of the second axis electrostatic electrodes.
본 발명의 특징에 따른 터치 패널의 제조 방법은,Method for manufacturing a touch panel according to a feature of the invention,
터치 패널의 원도우 영역에 해당하고 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극을 투명한 재질의 제1 투명 전도성 감광필름을 선택적으로 제거하여 형성하는 단계;Selectively removing the first transparent conductive photosensitive film of a transparent material from a plurality of first axis electrostatic electrodes corresponding to the window area of the touch panel and spaced apart at intervals of a predetermined distance;
터치 패널의 상부면에 투명한 재질의 제2 투명 전도성 감광필름을 형성한 후, 제2 투명 전도성 감광필름으로 형성된 층에서 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극을 제2 투명 전도성 감광필름을 선택적으로 제거하여 형성하는 단계; 및After forming the second transparent conductive photosensitive film of a transparent material on the upper surface of the touch panel, each of the second shaft electrostatic capacities crossing a predetermined distance from each of the first axis electrostatic electrode in the layer formed of the second transparent conductive photosensitive film Forming an electrode by selectively removing the second transparent conductive photosensitive film; And
터치 패널의 상부면에 금속층을 형성한 후, 금속층을 선택적으로 제거하여 각각의 제1축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 제1 금속 도선과, 각각의 제2축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 제2 금속 도선을 동시에 형성하는 단계를 포함한다.After the metal layer is formed on the upper surface of the touch panel, a plurality of first metal conductors, which are edge regions of the touch panel connected to one end of each first axis electrostatic electrode by selectively removing the metal layer, and each second And simultaneously forming a plurality of second metal conductors, which are edge regions of the touch panel, connected to one end of the axis electrostatic electrode.
본 발명의 특징에 따른 터치 패널은,Touch panel according to a feature of the invention,
유기 절연체 또는 무기 절연체로 이루어진 절연체층과, 절연체층의 상부면에 형성되고 터치 패널의 원도우 영역에 해당하며 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극을 형성하는 투명 도전층과, 복수개의 제1축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 금속 도선을 형성하는 바텀(Bottom) 전극; 및An insulator layer formed of an organic insulator or an inorganic insulator, a transparent conductive layer formed on an upper surface of the insulator layer and corresponding to the window region of the touch panel and forming a plurality of first axis electrostatic electrodes spaced at intervals of a predetermined distance; A bottom electrode forming a plurality of metal conductors, which are edge regions of the touch panel, connected to one end of the plurality of first axis electrostatic electrodes; And
각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극과 제2축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 배선전극을 투명한 재질의 투명 전도성 감광필름으로 형성하는 탑(Top) 전극을 포함하고, 투명 전도성 감광필름은 투명 절연 물질로 이루어진 투명 감광성 수지층과, 그 위에 적층된 투명한 재질의 전도성 물질인 투명 전도성 물질로 이루어지며, 바텀 전극의 상부면에 탑 전극을 투명 감광성 수지층에 의해 합지된다.A transparent conductive photosensitive film made of a transparent material is used as a wiring electrode, which is an edge region of each touch panel connected to one end of each of the second axis electrostatic electrode and the second axis electrostatic electrode, which intersects with each of the first axis electrostatic electrodes at a predetermined distance. The transparent conductive photosensitive film includes a top electrode formed of a transparent insulating material, and a transparent photosensitive resin layer made of a transparent insulating material, and a transparent conductive material which is a conductive material of a transparent material stacked thereon, and an upper surface of the bottom electrode. The top electrode is laminated on the transparent photosensitive resin layer.
본 발명의 특징에 따른 터치 패널은,Touch panel according to a feature of the invention,
유기 절연체 또는 무기 절연체로 이루어진 절연체층과, 절연체층의 상부면에 형성되고 상기 터치 패널의 원도우 영역에 해당하며 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극을 형성하는 투명 도전층과, 복수개의 제1축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 제1 금속 도선을 형성하는 바텀(Bottom) 전극; 및An insulator layer formed of an organic insulator or an inorganic insulator, a transparent conductive layer formed on an upper surface of the insulator layer and corresponding to the window region of the touch panel and forming a plurality of first axis electrostatic electrodes spaced at intervals of a predetermined distance; A bottom electrode forming a plurality of first metal conductors, which are edge regions of a touch panel connected to one end of the plurality of first axis electrostatic electrodes; And
터치 패널의 원도우 영역에 해당하고, 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극을 형성하는 투명한 재질의 투명 전도성 감광필름과, 제2축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 제2 금속 도선을 형성하는 탑(Top) 전극을 포함하고, 투명 전도성 감광필름은 투명 절연 물질로 이루어진 투명 감광성 수지층과, 그 위에 적층된 투명한 재질의 전도성 물질인 투명 전도성 물질로 이루어지며, 투명 도전층의 상부면에 탑 전극을 투명 감광성 수지층에 의해 합지한다.A transparent conductive photosensitive film made of a transparent material that corresponds to the window area of the touch panel and forms a respective second axis electrostatic electrode crossing the first axis electrostatic electrode at a predetermined distance from the first axis electrostatic electrode, and one end of the second axis electrostatic electrode A top electrode forming a plurality of second metal conductors, which are edge regions of the touch panel connected to the touch panel, wherein the transparent conductive photosensitive film comprises a transparent photosensitive resin layer made of a transparent insulating material, and a transparent material stacked thereon It is made of a transparent conductive material of the conductive material, and the top electrode on the upper surface of the transparent conductive layer is laminated by a transparent photosensitive resin layer.
본 발명의 특징에 따른 터치 패널은,Touch panel according to a feature of the invention,
유기 절연체 또는 무기 절연체로 이루어진 절연체층과, 절연체층의 상부면에 형성되고 터치 패널의 원도우 영역에 해당하며 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극과, 각각의 제1축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 금속 도선을 하나의 금속층으로 이루어진 미세 패턴의 메탈 메쉬 구조로 형성하는 바텀(Bottom) 전극; 및An insulator layer made of an organic insulator or an inorganic insulator, a plurality of first axis electrostatic electrodes formed on an upper surface of the insulator layer, corresponding to the window region of the touch panel, and spaced apart at regular intervals, and each first axis electrostatic A bottom electrode for forming a plurality of metal conductors, which are edge regions of a touch panel connected to one end of the electrode, in a fine pattern metal mesh structure formed of one metal layer; And
각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극과 제2축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 배선전극을 투명한 재질의 투명 전도성 감광필름으로 형성하는 탑(Top) 전극을 포함하고, 투명 전도성 감광필름은 투명 절연 물질로 이루어진 투명 감광성 수지층과, 그 위에 적층된 투명한 재질의 전도성 물질인 투명 전도성 물질로 이루어지며, 바텀 전극의 상부면에 탑 전극을 투명 감광성 수지층에 의해 합지된다.A transparent conductive photosensitive film made of a transparent material is used as a wiring electrode, which is an edge region of each touch panel connected to one end of each of the second axis electrostatic electrode and the second axis electrostatic electrode, which intersects with each of the first axis electrostatic electrodes at a predetermined distance. The transparent conductive photosensitive film includes a top electrode formed of a transparent insulating material, and a transparent photosensitive resin layer made of a transparent insulating material, and a transparent conductive material which is a conductive material of a transparent material stacked thereon, and an upper surface of the bottom electrode. The top electrode is laminated on the transparent photosensitive resin layer.
본 발명의 특징에 따른 터치 패널은,Touch panel according to a feature of the invention,
터치 패널의 원도우 영역에 해당하며 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극을 형성하는 투명한 재질의 제1 투명 전도성 감광필름과, 각각의 제1축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 제1 금속 도선을 형성하는 바텀(Bottom) 전극; 및A first transparent conductive photosensitive film made of a transparent material that corresponds to the window area of the touch panel and is spaced apart at intervals of a predetermined distance, and is connected to one end of each first axis electrostatic electrode; A bottom electrode forming a plurality of first metal conductors, which are edge regions of the touch panel; And
터치 패널의 원도우 영역에 해당하고, 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극을 형성하는 투명한 재질의 제2 투명 전도성 감광필름과, 각각의 제2축 정전전극의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 제2 금속 도선을 형성하는 탑(Top) 전극을 포함하고, 제1 투명 전도성 감광필름과 제2 투명 전도성 감광필름은 투명 절연 물질로 이루어진 투명 감광성 수지층과, 그 위에 적층된 투명한 재질의 전도성 물질인 투명 전도성 물질로 이루어지며, 바텀 전극의 상부면에 탑 전극을 제2 투명 전도성 감광필름의 투명 감광성 수지층에 의해 합지된다.A second transparent conductive photosensitive film made of a transparent material corresponding to the window area of the touch panel and forming respective second axis electrostatic electrodes crossing the first axis electrostatic electrodes at a predetermined distance from each other, and each second axis electrostatic A top electrode forming a plurality of second metal conductors, which are edge regions of the touch panel connected to one end of the electrode, wherein the first transparent conductive photosensitive film and the second transparent conductive photosensitive film are made of a transparent insulating material. It is made of a transparent photosensitive resin layer and a transparent conductive material which is a conductive material of a transparent material laminated thereon, the top electrode on the top surface of the bottom electrode is laminated by the transparent photosensitive resin layer of the second transparent conductive photosensitive film.
전술한 구성에 의하여, 본 발명은 투명 전도성 감광필름을 이용하여 터치 센서를 구현하여 원자재 비용과 공정 비용을 낮출 수 있는 효과가 있다.By the above-described configuration, the present invention has the effect of lowering the raw material cost and the process cost by implementing a touch sensor using a transparent conductive photosensitive film.
본 발명은 바텀 전극과 탑 전극의 합지시 투광 감광성 수지층으로 합지되기 때문에 OCA가 사용되지 않고 5㎛ 정도의 투명 전도성 감광필름의 사용을 통한 전극을 슬림(Slim)화 하는 효과가 있다.The present invention has the effect of slimming the electrode through the use of a transparent conductive photosensitive film of about 5㎛ because OCA is not used because the laminated with the light-transmissive photosensitive resin layer when the bottom electrode and the top electrode is laminated.
본 발명은 기존의 터치 패널의 제조 공정을 간소화하여 생산성을 향상시키는 효과가 있다.The present invention has the effect of improving the productivity by simplifying the manufacturing process of the existing touch panel.
도 1은 종래의 정전용량 방식의 터치 패널에서 X축 정전전극의 바텀(Bottom) 전극과 Y축 정전전극의 탑(Top) 전극을 합지하는 상태를 나타낸 도면이다.1 is a view showing a state in which a bottom electrode of an X-axis capacitive electrode and a top electrode of a Y-axis capacitive electrode are laminated in a conventional capacitive touch panel.
도 2 내지 도 4는 본 발명의 제1 실시예에 따른 투명 전도성 감광필름을 이용한 터치 패널의 제조 방법을 측면에서의 층 구조로 나타낸 도면이다.2 to 4 are diagrams showing a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a first embodiment of the present invention with a layer structure in a side view.
도 5는 본 발명의 제1 실시예에 따른 투명 전도성 감광필름을 이용한 터치 패널의 제조 방법을 평면에서 나타낸 도면이다.5 is a plan view illustrating a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a first embodiment of the present invention.
도 6은 본 발명의 제1 실시예에 따른 투명 전도성 감광필름을 이용한 터치 패널을 나타낸 사시도이다.6 is a perspective view illustrating a touch panel using a transparent conductive photosensitive film according to a first embodiment of the present invention.
도 7은 본 발명의 제2 실시예에 따른 투명 전도성 감광필름을 이용한 터치 패널의 제조 방법을 평면에서 나타낸 도면이다.7 is a plan view illustrating a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a second embodiment of the present invention.
도 8은 본 발명의 제2 실시예에 따른 전도성 고분자의 패턴닝 방법을 개념적으로 나타낸 도면이다.8 is a view conceptually showing a patterning method of a conductive polymer according to a second embodiment of the present invention.
도 9는 본 발명의 제3 실시예에 따른 투명 전도성 감광필름을 이용한 터치 패널의 제조 방법을 측면에서의 층 구조로 나타낸 도면이다.9 is a diagram illustrating a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a third exemplary embodiment of the present invention in a layer structure from the side.
도 10은 본 발명의 제3 실시예에 따른 투명 전도성 감광필름을 이용한 터치 패널의 제조 방법을 평면에서 나타낸 도면이다.10 is a plan view illustrating a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a third embodiment of the present invention.
아래에서는 첨부한 도면을 참고로 하여 본 발명의 실시예에 대하여 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 용이하게 실시할 수 있도록 상세히 설명한다. 그러나 본 발명은 여러 가지 상이한 형태로 구현될 수 있으며 여기에서 설명하는 실시예에 한정되지 않는다. 그리고 도면에서 본 발명을 명확하게 설명하기 위해서 설명과 관계없는 부분은 생략하였으며, 명세서 전체를 통하여 유사한 부분에 대해서는 유사한 도면 부호를 붙였다.DETAILED DESCRIPTION Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention. In the drawings, parts irrelevant to the description are omitted in order to clearly describe the present invention, and like reference numerals designate like parts throughout the specification.
명세서 전체에서, 어떤 부분이 어떤 구성요소를 "포함"한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.Throughout the specification, when a part is said to "include" a certain component, it means that it can further include other components, without excluding other components unless specifically stated otherwise.
도 2 내지 도 4는 본 발명의 제1 실시예에 따른 투명 전도성 감광필름을 이용한 터치 패널의 제조 방법을 측면에서의 층 구조로 나타낸 도면이고, 도 5는 본 발명의 제1 실시예에 따른 투명 전도성 감광필름을 이용한 터치 패널의 제조 방법을 평면에서 나타낸 도면이며, 도 6은 본 발명의 제1 실시예에 따른 투명 전도성 감광필름을 이용한 터치 패널을 나타낸 사시도이다.2 to 4 are diagrams showing a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a first embodiment of the present invention in a layer structure from the side, and FIG. 5 is a transparent according to the first embodiment of the present invention. 6 is a plan view illustrating a method of manufacturing a touch panel using a conductive photosensitive film, and FIG. 6 is a perspective view illustrating a touch panel using a transparent conductive photosensitive film according to a first embodiment of the present invention.
도 2의 (a)에 도시된 바와 같이, 본 발명의 제1 실시예에 따른 터치 패널의 제조 방법은 절연체층(110)의 상면에 인덱스 매칭층(Index-Matching)(112)을 형성하고, 그 위에 투명 도전층(120)을 형성하며, 투명 도전층(120)의 상면에 금속층(130)을 형성한다. 여기서, 절연체층(110)은 투명한 재질의 유기 절연체 또는 무기 절연체로 형성되고, 유기 절연체는 폴리이미드 또는 폴리에틸렌 테레프탈레이트(Polyethylene Terephthalate, PET), 폴리에틸렌나프탈레이트(Polyethylenenaphthalate, PEN), 폴리카보네이트(Polycarbonate, PC), 아크릴의 플라스틱 소재를 포함하며 무기 절연체는 글라스(Glass) 소재, 광학 처리된 글라스 소재로 이루어진다.As shown in FIG. 2A, in the method of manufacturing the touch panel according to the first embodiment of the present invention, an index matching layer 112 is formed on an upper surface of the insulator layer 110. The transparent conductive layer 120 is formed thereon, and the metal layer 130 is formed on the upper surface of the transparent conductive layer 120. Here, the insulator layer 110 is formed of an organic insulator or an inorganic insulator of a transparent material, and the organic insulator is polyimide or polyethylene terephthalate (PET), polyethylenenaphthalate (PEN), polycarbonate, PC), acrylic plastic material, and the inorganic insulator is made of glass material and optically treated glass material.
인덱스 매칭층(Index-Matching)(112)은 투명 도전층(120)과의 굴절율 차이가 있는 절연 소재를 이용하여 절연막층을 형성하고, ITO(120) 패턴후 ITO 유무가 확인되지 않도록 처리하는 코팅이다,Index-Matching (112) is a coating to form an insulating film layer using an insulating material having a difference in refractive index with the transparent conductive layer 120, and to treat the presence or absence of ITO after the ITO (120) pattern to be,
인덱스 매칭층(112)은 투명 도전층(120) 상에 패턴을 형성한 후 투명 도전층(120)이 있고 없는 부분의 반사율 차이로 인해 시인 현상을 개선하는 역할을 한다.The index matching layer 112 forms a pattern on the transparent conductive layer 120, and then improves the visibility phenomenon due to the difference in reflectance between the portions with and without the transparent conductive layer 120.
인덱스 매칭층(112)은 투명 도전층(120) 상에 패턴이 형성된 경우, 투명 도전층(120)의 회로가 보이는 시인성을 개선할 수 있는 굴절율을 가진 절연막층이다.When the pattern is formed on the transparent conductive layer 120, the index matching layer 112 is an insulating layer having a refractive index that can improve the visibility of the circuit of the transparent conductive layer 120.
인덱스 매칭층(112)은 정전 용량의 ITO 필름 제작시 ITO가 존재하는 부분과 존재하지 않는 부분이 눈에서 감지하지 못하도록 ITO(120)의 하부층에 광학 처리를 하는 것을 의미한다.The index matching layer 112 means that the lower layer of the ITO 120 is optically treated so that the portion of the ITO and the portion of the non-existent ITO film are not detected by the eye when the capacitive ITO film is manufactured.
인덱스 매칭층(112)은 건식 방식(증착)으로 SiO2,TiO2, Ceo2 등을 올리는 경우도 있고, 습식 방식으로 약품 처리를 하는 경우도 있다.The index matching layer 112 may raise SiO 2 , TiO 2, Ceo 2, or the like by a dry method (deposition), or may perform a chemical treatment by a wet method.
인덱스 매칭층(112)은 투명 도전층(120)의 높이를 보상할 수 있는 굴절율을 보유하고 있는 SiO2,TiO2, Ceo2, Nb2O5 등의 절연막층을 단독 또는 복수개의 층 구조로 형성한다.The index matching layer 112 may have an insulating layer such as SiO 2 , TiO 2, Ceo 2, or Nb 2 O 5 having a refractive index capable of compensating for the height of the transparent conductive layer 120 in a single or multiple layer structure. Form.
투명 도전층(120)은 투명 전도성 산화물(Transparent Conducting Oxide, TCO)와 같은 투명한 재질의 전도성 물질로 형성되며, 구체적으로는 ITO 또는 IZO(Indium Zinc Oxide)를 포함하거나 ITO, IZO, SnO2, AZO로 이루어지는 투명 전도성 물질로 형성한다.A transparent conductive layer 120 is a transparent conductive oxide (Transparent Conducting Oxide, TCO) and formed of a conductive material of transparent material, such as, specifically, including ITO or IZO (Indium Zinc Oxide) or ITO, IZO, SnO 2, AZO It is formed of a transparent conductive material.
본 발명의 투명 도전층(ITO 필름 등)(120)은 하부면에 인덱스 매칭층(절연막층)(112)을 포함하고 있다.The transparent conductive layer (ITO film, etc.) 120 of the present invention includes an index matching layer (insulation layer) 112 on the bottom surface.
금속층(130)은 Cu, Cu alloy, Ag, Ag alloy, Ni+Cr, Ni+Ni alloy, Mo/Ag, Mo/Al/Mo, Ni+Cr/Cu/Ni+Cr, Ni alloy/Cu, Ni alloy/Cu/Ni alloy, Mo/APC, Cu/Ni+Cu+Ti, Ni+Cu+Ti/Cu/Ni+Cu+Ti, APC(은, 팔라듐, 구리 합금), 카본 등 전도성 물질을 모두 포함하는 개념이고 인쇄, 증착, 페이스트 및 도포의 공지된 기술로 형성한다.The metal layer 130 includes Cu, Cu alloy, Ag, Ag alloy, Ni + Cr, Ni + Ni alloy, Mo / Ag, Mo / Al / Mo, Ni + Cr / Cu / Ni + Cr, Ni alloy / Cu, Ni All conductive materials including alloy / Cu / Ni alloy, Mo / APC, Cu / Ni + Cu + Ti, Ni + Cu + Ti / Cu / Ni + Cu + Ti, APC (silver, palladium, copper alloy), carbon It is a concept which is formed by the well-known technique of printing, vapor deposition, paste, and application | coating.
예를 들면, 금속층(130)은 Ag 페이스트로 형성할 수 있고, 구리를 증착시킬 수도 있는 등 다양한 방법이 가능하다.For example, the metal layer 130 may be formed of an Ag paste, or a variety of methods may be used, such as depositing copper.
금속층(130)은 다양한 금속을 사용할 수 있으며 제조의 용이성 및 전기 전도도를 고려하여 구리 또는 알루미늄으로 하는 것이 바람직하다.The metal layer 130 may use various metals and is preferably copper or aluminum in consideration of ease of manufacture and electrical conductivity.
금속층(130)을 형성하는 방법은 라미네이팅이나 기상 증착, 코팅과 같은 공지의 방법을 사용할 수 있다.The metal layer 130 may be formed by a known method such as laminating, vapor deposition, or coating.
다음으로, 도 2의 (b), (c), (d)에 도시된 바와 같이, 본 발명은 금속층(130)의 상부면에 제1 감광성 소재(140)를 형성하고, 패턴이 형성된 제1 아트워크 필름(142)을 이용하여 UV 조사하면, 제1 감광성 소재(140)에 패턴을 형성하며(노광), 약한 알칼리 용액을 이용하여 제1 감광성 소재(140)에 개방 패턴을 형성한다(현상).Next, as shown in (b), (c), (d) of Figure 2, the present invention forms a first photosensitive material 140 on the upper surface of the metal layer 130, the first pattern formed UV irradiation using the artwork film 142 forms a pattern on the first photosensitive material 140 (exposure), and forms an open pattern on the first photosensitive material 140 using a weak alkali solution (developing) ).
본 발명은 패턴이 형성된 제1 아트워크 필름(142)을 예시하고 있지만, 이에 한정하지 않고 패턴이 형성된 패턴 툴(Tool)이면 어떠한 것도 가능하며, 패턴 툴 없이 직접적으로 패턴을 구현하는 장비를 이용하여 노광 공정을 수행할 수도 있다.Although the present invention illustrates the first artwork film 142 in which the pattern is formed, the present invention is not limited thereto, and any pattern tool may be used, and using the equipment for directly implementing the pattern without the pattern tool. An exposure process may also be performed.
또한, 제1 감광성 소재(140)를 형성하는 공정은 액상 포토 레지스트를 코팅하거나 드라이필름을 라미네이팅하여 형성한다. 이외에 액상 타입의 실리콘, 에폭시 소재를 사용하는 경우 코팅 공정을, SiO2, TiO2의 절연 물질을 사용하는 경우, 증착 공정을 사용할 수 있다.In addition, the process of forming the first photosensitive material 140 is formed by coating a liquid photoresist or laminating a dry film. In addition, in the case of using a liquid type silicon or epoxy material, a coating process may be used, and in the case of using an insulating material of SiO 2 or TiO 2 , a deposition process may be used.
이어서, 본 발명은 도 3의 (e), (f)에 도시된 바와 같이, 개방 패턴이 형성된 제1 감광성 소재(140)에 산성 약품을 이용하여 투명 도전층(120)과 금속층(130)을 선택 또는 동시에 에칭하고 강알칼리 약품을 이용하여 제1 감광성 소재(140)를 제거하여 정전전극 패턴(122)과 배선전극 패턴(132)을 형성한다(에칭 공정, 박리 공정). 여기서, 도 3의 (e), (f)는 1차 포토리소그래피(Photolithography)의 공정에 의해 라미네이팅, 노광, 현상, 에칭, 박리 과정을 거친다.Subsequently, as shown in FIGS. 3E and 3F, the present invention uses an acidic chemical to the first photosensitive material 140 having an open pattern to form the transparent conductive layer 120 and the metal layer 130. Etching or simultaneous etching is performed, and the first photosensitive material 140 is removed using a strong alkali chemical to form the electrostatic electrode pattern 122 and the wiring electrode pattern 132 (etching process, peeling process). 3 (e) and 3 (f) are subjected to lamination, exposure, development, etching, and peeling by a process of primary photolithography.
정전전극 패턴(122)은 터치 패널의 원도우 영역(화면이 표시되는 영역)에 해당하는 부분으로 일정거리의 간격마다 이격되어 형성된 복수개의 정전전극을 나타내는 바(Bar) 패턴을 나타내며, 사용자의 터치 패턴 영역을 나타낸다.The electrostatic electrode pattern 122 is a portion corresponding to the window area (the area where the screen is displayed) of the touch panel, and represents a bar pattern indicating a plurality of electrostatic electrodes formed spaced at a predetermined distance apart, and the user's touch pattern Represents an area.
본 발명의 정전전극 패턴(122)은 복수개의 X축 정전전극(122b)과, 각각의 X축 정전전극(122b)과 일정거리 이격되어 직각 방향으로 교차되는 각각의 Y축 정전전극(122a)을 포함한다.The electrostatic electrode pattern 122 of the present invention includes a plurality of X-axis electrostatic electrodes 122b and each of the Y-axis electrostatic electrodes 122a crossing at right angles with a predetermined distance from the X-axis electrostatic electrodes 122b. Include.
배선전극 패턴(132)은 터치 패널의 원도우 영역을 제외한 가장 자리 영역의 금속 도선을 나타내는 회로로서, 각각의 정전전극의 일측 끝단으로부터 외측으로 연결되어 사용자의 터치 패턴을 감지 및 제어하는 리드선 전극과 리드선 전극의 일측 끝단과 연결되어 외부로 노출되고 연성회로기판(Flexible Printed Circuit Board, FPCB)과 결합되는 FPCB 본딩 영역의 금속 전극 부분을 포함한다.The wiring electrode pattern 132 is a circuit representing a metal lead of an edge region excluding the window region of the touch panel. The wiring electrode pattern 132 is connected outwardly from one end of each electrostatic electrode to detect the user's touch pattern and leads. It includes a metal electrode portion of the FPCB bonding region connected to one end of the electrode is exposed to the outside and coupled with the flexible printed circuit board (FPCB).
본 발명의 배선전극 패턴(132)은 각각의 Y축 정전전극(122a)의 일측 끝단과 연결되는 배선전극 패턴(132a)과, 각각의 Y축 정전전극(122a)과 일정거리 이격되어 직각 방향으로 교차하는 복수개의 X축 정전전극(122a)의 일측 끝단과 연결되는 배선전극 패턴(132b)을 선택 에칭을 통해 형성한다.The wiring electrode pattern 132 of the present invention is spaced apart from the wiring electrode pattern 132a connected to one end of each of the Y-axis electrostatic electrodes 122a and the respective Y-axis electrostatic electrodes 122a by a predetermined distance in a right angle direction. A wiring electrode pattern 132b connected to one end of the plurality of intersecting X-axis electrostatic electrodes 122a is formed through selective etching.
다음으로, 도 3의 (g)와, 도 5의 (a)에 도시된 바와 같이, 본 발명은 2차 포토리소그래피의 공정에 의해 터치 패널의 원도우 영역인 정전전극 패턴(122)에 형성된 금속층(130)을 선택적으로 제거하고 투명 도전층(120)을 남긴다.Next, as shown in FIGS. 3G and 5A, the present invention provides a metal layer formed on the electrostatic electrode pattern 122 which is a window area of a touch panel by a process of secondary photolithography. 130 is selectively removed to leave the transparent conductive layer 120.
따라서, 도 5의 (a)와 같이, 본 발명은 터치 패널의 원도우 영역에 해당하고 일정거리의 간격마다 이격되어 형성된 복수개의 X축 정전전극(122b)을 투명 도전층(120)으로 형성하고, 각각의 X축 정전전극(122b)의 일측 끝단과 연결되는 터치 패널의 가장 자리 영역인 복수개의 금속 도선(132b)을 금속층(130)으로 형성된다.Therefore, as shown in FIG. 5A, the present invention forms a plurality of X-axis electrostatic electrodes 122b corresponding to the window region of the touch panel and spaced apart at intervals of a predetermined distance from the transparent conductive layer 120. A plurality of metal conductors 132b, which are edge regions of the touch panel connected to one end of each of the X-axis electrostatic electrodes 122b, are formed of the metal layer 130.
여기서, 2차 포토리소그래피의 공정은 전술한 1차 포토리소그래피의 공정과 동일한 공정인 라미네이팅, 노광, 현상, 에칭, 박리 과정을 거친다.Here, the process of secondary photolithography is subjected to laminating, exposure, developing, etching, and peeling processes which are the same processes as those of the above-described primary photolithography.
이하에서의 포토리소그래피의 공정은 라미네이팅, 노광, 현상, 에칭, 박리 과정을 거치므로 중복된 설명을 생략한다.Since the photolithography process is performed through laminating, exposure, development, etching, and peeling processes, redundant description thereof will be omitted.
다음으로, 도 4의 (h)와 도 5의 (b)에 도시된 바와 같이, 본 발명은 투명 도전층(120)으로 이루어진 복수개의 X축 정전전극(122b)과 금속층(130)으로 이루어진 배선전극 패턴(132b)을 형성한 후, 터치 패널의 상부면에 투명한 재질의 투명 전도성 감광필름(160)을 형성한다(라미네이팅, 코팅 또는 증착 공정). 여기서, 투명 전도성 감광필름(160)은 투명 감광성 수지층(162)과 그 위에 적층된 투명 전도성 물질(164)를 포함한다.Next, as shown in FIGS. 4H and 5B, the present invention includes a plurality of X-axis electrostatic electrodes 122b made of a transparent conductive layer 120 and a wiring made of a metal layer 130. After forming the electrode pattern 132b, a transparent conductive photosensitive film 160 of a transparent material is formed on the upper surface of the touch panel (laminating, coating or deposition process). Here, the transparent conductive photosensitive film 160 includes a transparent photosensitive resin layer 162 and a transparent conductive material 164 stacked thereon.
투명 전도성 감광필름(160)의 두께는 일반적으로 1-100㎛이고, 바람직하게는 2.5-50㎛를 사용할 수 있으며 양산성 및 비용 감소를 위해 2.5-10㎛를 사용할 수 있다. 즉 탑 전극(200)은 투명 전도성 감광필름(160)으로 구성할 수 있어 두께를 슬림화 할 수 있다.The thickness of the transparent conductive photosensitive film 160 is generally 1-100 μm, preferably 2.5-50 μm, and 2.5-10 μm may be used for mass productivity and cost reduction. That is, the top electrode 200 may be made of a transparent conductive photosensitive film 160, thereby making it possible to slim down the thickness.
투명 감광성 수지층(162)은 투명 절연 물질로서 투명 드라이 필름, 투명한 재질의 유기 절연체 또는 무기 절연체를 포함한다.The transparent photosensitive resin layer 162 includes a transparent dry film, an organic insulator or an inorganic insulator of a transparent material as a transparent insulating material.
투명 전도성 물질(164)은 전도성과 감광성이 있는 투명한 재질의 물질로서 탄소나노튜브(Carbon Nano Tube, CNT), 그라핀(Graphene), 전도성 폴리머, 은 나노와이어(Silver Nanowires, AGNW), Hybrid AGNW(CNT+AGNW), Hybrid 그라핀(AGNW+그라핀) 등으로 이루어지는 투명 전도성 물질로 형성하며, 전도성 고분자, Cu, Cu alloy, Ag, Ag alloy, Ni+Cr, Ni+Ni alloy, Mo/Ag, Mo/Al/Mo, Ni+Cr/Cu/Ni+Cr, Ni alloy/Cu, Ni alloy/Cu/Ni alloy, Mo/APC, Cu/Ni+Cu+Ti, Ni+Cu+Ti/Cu/Ni+Cu+Ti, 카본, 투명 전도성 산화물(Transparent Conducting Oxide, TCO) 등 전도성 물질을 모두 포함하는 개념이다.The transparent conductive material 164 is a conductive and photosensitive transparent material, carbon nanotube (CNT), graphene, conductive polymer, silver nanowires (AGNW), hybrid AGNW ( CNT + AGNW), formed of a transparent conductive material composed of hybrid graphene (AGNW + graphene) and the like, and conductive polymer, Cu, Cu alloy, Ag, Ag alloy, Ni + Cr, Ni + Ni alloy, Mo / Ag, Mo / Al / Mo, Ni + Cr / Cu / Ni + Cr, Ni alloy / Cu, Ni alloy / Cu / Ni alloy, Mo / APC, Cu / Ni + Cu + Ti, Ni + Cu + Ti / Cu / Ni + The concept includes all conductive materials such as Cu + Ti, carbon, and transparent conducting oxide (TCO).
다음으로, 도 4의 (i), (j)와 도 5의 (c)에 도시된 바와 같이, 본 발명은 포토리소그래피의 노광 및 현상 공정에 의해 투명 전도성 감광필름(160)으로 형성된 층에서 투명 감광성 수지층(162)과 그 위에 적층된 투명 전도성 물질(164)을 선택적으로 제거하여 복수개의 Y축 정전전극(122a, 164)과 각각의 Y축 정전전극(122a, 164)의 일측 끝단과 연결된 배선전극 패턴(132a, 164)을 형성한다.Next, as shown in FIGS. 4 (i), (j) and 5 (c), the present invention is transparent in the layer formed of the transparent conductive photosensitive film 160 by the photolithography exposure and development process. The photosensitive resin layer 162 and the transparent conductive material 164 stacked thereon are selectively removed to connect the plurality of Y-axis electrostatic electrodes 122a and 164 to one end of each of the Y-axis electrostatic electrodes 122a and 164. The wiring electrode patterns 132a and 164 are formed.
더욱 상세하게 설명하면, 본 발명은 패턴이 형성된 제2 아트워크 필름(154)을 이용하여 UV 조사하면, 투명 전도성 감광필름(160)에 패턴을 형성하고(노광), 약한 알칼리 용액을 이용하여 투명 전도성 감광필름(160)에 패턴을 형성한다(현상). 여기서, 투명 전도성 감광필름(160)에 형성된 패턴은 도 4의 (j)와 도 5의 (c)와 같이, 복수개의 Y축 정전전극(122a, 164)과 배선전극 패턴(132a, 164)이 해당하지 않는 영역이 개방된 패턴을 의미한다.In more detail, in the present invention, when UV irradiation is performed using the patterned second artwork film 154, a pattern is formed on the transparent conductive photosensitive film 160 (exposure), and is transparent using a weak alkali solution. A pattern is formed on the conductive photosensitive film 160 (development). Here, the pattern formed on the transparent conductive photosensitive film 160 has a plurality of Y-axis electrostatic electrodes 122a and 164 and the wiring electrode patterns 132a and 164 as shown in FIGS. 4 (j) and 5 (c). It means a pattern in which an area not applicable is opened.
본 발명은 패턴이 형성된 제2 아트워크 필름(154)을 예시하고 있지만, 이에 한정하지 않고 패턴이 형성된 패턴 툴(Tool)이면 어떠한 것도 가능하며, 패턴 툴 없이 직접적으로 패턴을 구현하는 장비를 이용하여 노광 공정을 수행할 수도 있다.Although the present invention illustrates the second artwork film 154 having a pattern, the present invention is not limited thereto. Any pattern tool having a pattern may be used, and any device that directly implements the pattern without the pattern tool may be used. An exposure process may also be performed.
본 발명은 복수의 X축 정전전극과 Y축 정전전극을 바(Bar) 패턴으로 형성하고 있으나 이에 한정하지 않고 사각, 원형, 다이아몬드, 다각형 및 무작위 패턴 등 다양하게 적용할 수 있다.In the present invention, the plurality of X-axis electrostatic electrodes and the Y-axis electrostatic electrodes are formed in a bar pattern, but the present invention is not limited thereto and may be variously applied, such as a square, a circle, a diamond, a polygon, and a random pattern.
도 6에 도시된 바와 같이, 바텀 전극(100)은 절연체층(110)의 상부면에 복수개의 X축 정전전극을 ITO(120)로 형성하고 각각의 X축 정전전극의 일측 끝단에 연결되어 터치 패널의 원도우 영역을 제외한 가장 자리 영역의 배선전극 패턴(132b, 130)을 금속층(130)으로 형성한다.As shown in FIG. 6, the bottom electrode 100 forms a plurality of X-axis electrostatic electrodes on the upper surface of the insulator layer 110 as the ITO 120 and is connected to one end of each X-axis electrostatic electrode. The wiring electrode patterns 132b and 130 of the edge region excluding the window region of the panel are formed of the metal layer 130.
탑 전극(200)은 투명 감광성 수지층(162)과 투명 전도성 물질(164)를 포함한 투명 전도성 감광필름(160)으로 이루어진 복수개의 Y축 정전전극(122a, 164)과 각각의 Y축 정전전극(122a, 164)의 일측 끝단과 연결된 배선전극 패턴(132a, 164)을 형성한다.The top electrode 200 includes a plurality of Y-axis electrostatic electrodes 122a and 164 made of a transparent conductive photosensitive film 160 including a transparent photosensitive resin layer 162 and a transparent conductive material 164 and each of the Y-axis electrostatic electrodes ( The wiring electrode patterns 132a and 164 connected to one end of the 122a and 164 are formed.
바텀 전극(100)과 탑 전극(200)의 합지는 탑 전극(200)의 투광 감광성 수지층(162)으로 합지되기 때문에 OCA가 사용되지 않아 OCA 가공 비용이나 재료비 공정이 감소하여 원가 절감과 가공 공정이 감소되는 효과가 있다.Since the bottom electrode 100 and the top electrode 200 are laminated to the light-transmitting photosensitive resin layer 162 of the top electrode 200, OCA is not used, thereby reducing the OCA processing cost or material cost process, thereby reducing the cost and processing process. This has the effect of being reduced.
투광 감광성 수지층(162)은 탑 전극(200)과 바텀 전극(100)의 절연과 접촉제 역할을 수행한다.The light-transmissive photosensitive resin layer 162 serves as insulation and a contact agent between the top electrode 200 and the bottom electrode 100.
본 발명은 ITO 필름과 메탈 필름을 한 장만 사용하고(바텀 전극(100)), 탑 전극(200)의 경우, 메탈 트레이스가 짧기 때문에 메탈 없이 투명 전도성 물질(164)로 투명전극과 금속전극을 모두 구현할 수 있다.The present invention uses only one sheet of the ITO film and the metal film (bottom electrode 100), and in the case of the top electrode 200, since the metal trace is short, both the transparent electrode and the metal electrode are made of the transparent conductive material 164 without metal. Can be implemented.
도 7은 본 발명의 제2 실시예에 따른 투명 전도성 감광필름을 이용한 터치 패널의 제조 방법을 평면에서 나타낸 도면이고, 도 8은 본 발명의 제2 실시예에 따른 전도성 고분자의 패턴닝 방법을 개념적으로 나타낸 도면이다.7 is a plan view illustrating a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a second embodiment of the present invention, and FIG. 8 conceptually illustrates a method of patterning a conductive polymer according to a second embodiment of the present invention. It is a figure shown.
본 발명의 제2 실시예의 터치 패널의 제조 방법은 전술한 본 발명의 제1 실시예의 터치 패널의 제조 방법과 중복되는 설명을 생략하고 차이점을 중심으로 상세하게 설명한다.The manufacturing method of the touch panel of the second embodiment of the present invention will be described in detail with the focus on the differences, and the description overlapping with the above-described manufacturing method of the touch panel of the first embodiment of the present invention will be omitted.
본 발명의 제2 실시예에 따른 터치 패널의 제조 방법은 절연체층(110)의 상면에 인덱스 매칭층(Index-Matching)(112)을 형성하고, 그 위에 투명 도전층(120)을 형성한 후, 투명 도전층(120)의 상면에 금속층(130)을 형성한다.In the method of manufacturing the touch panel according to the second embodiment of the present invention, after forming an index-matching layer 112 on the upper surface of the insulator layer 110 and forming a transparent conductive layer 120 thereon, The metal layer 130 is formed on the upper surface of the transparent conductive layer 120.
본 발명은 포토리소그래피의 공정에 의해 투명 도전층(120)으로 이루어진 복수개의 X축 정전전극(122b, 120)과, 금속층(130)으로 이루어진 각각의 X축 정전전극(122b, 120)의 일측 끝단에 연결된 배선전극 패턴(132b, 130)을 형성한다.According to the present invention, one end of each of the plurality of X-axis electrostatic electrodes 122b and 120 formed of the transparent conductive layer 120 and the X-axis electrostatic electrodes 122b and 120 formed of the metal layer 130 is formed by a photolithography process. Wiring electrode patterns 132b and 130 connected thereto are formed.
다음으로, 본 발명은 터치 패널의 상부면에 투명 절연 물질로 이루어진 투명 감광성 수지층(162)과, 그 위에 전도성 고분자로 이루어진 투명 전도성 물질(164)을 포함한 투명 전도성 감광필름(160)을 형성한다.Next, the present invention forms a transparent photosensitive resin layer 160 including a transparent photosensitive resin layer 162 made of a transparent insulating material on the upper surface of the touch panel, and a transparent conductive material 164 made of a conductive polymer thereon. .
전도성 고분자(164)는 유기계 화합물로 폴리티오펜계, 폴리피롤계, 폴리아닐린계, 폴리아세틸렌계, 폴리페닐렌계 등이 사용될 수 있으며, 특히 폴리티오펜계 중에서도 PEDOT/PSS 화합물의 경우가 가장 바람직하고, 전술한 유기계 화합물 중 1종 이상을 혼합하여 사용할 수 있다.The conductive polymer 164 may be polythiophene-based, polypyrrole-based, polyaniline-based, polyacetylene-based, polyphenylene-based, or the like, and is particularly preferable for the PEDOT / PSS compound among polythiophene-based compounds. One or more types of the above-described organic compounds may be mixed and used.
또한, 전술한 유기계 화합물에 카본 나노튜브 등을 더 혼합하는 경우 전도성을 높일 수 있다.In addition, when the carbon nanotubes and the like are further mixed with the organic compound, the conductivity may be increased.
전도성 고분자(164)는 2중 결합 벤젠고리의 구조에 의해 전도성을 유지한다.The conductive polymer 164 maintains conductivity by the structure of the double bond benzene ring.
전도성 고분자(164)는 습식 공정에 의해 전도성을 없앨 수 있는데 습식 공정은 도 8에 도시된 바와 같이, 부식액(ETCHANT)(170)과 반응시켜 2중 결합 벤젠고리의 구조를 끓어 단일 결합으로 만들면 전도성을 없앨 수 있다.The conductive polymer 164 can be removed by the wet process, the wet process, as shown in Figure 8, by reacting with the etchant (ETCHANT) 170 to boil the structure of the double bond benzene ring to make a single bond conductive Can be eliminated.
이와 같이 전도성 고분자(164)를 비전도성 고분자(166)로 만들면 고분자층을 그대로 유지하되 전도성을 잃게 되며 특별한 촉매제 없이 다시 2중 결합으로 복원되지 않으므로 전도성이 원상 복귀하지 않는다.As such, when the conductive polymer 164 is made of the non-conductive polymer 166, the polymer layer is maintained as it is, but the conductivity is lost, and the conductivity does not return to the double bond without a special catalyst.
본 발명은 터치 패널의 상부면에 투명한 재질의 투명 전도성 감광필름(160)을 형성한 후, 습식 공정에 의해 복수개의 Y축 정전전극(122a, 164)에 해당하는 부분과 각각의 Y축 정전전극(122a, 164)의 일측 끝단과 연결된 배선전극 패턴(132a, 164)의 전도성 고분자(164)의 전도성을 유지하고, 패턴이 아닌 영역의 전도성 고분자(164)의 전도성을 잃게 하여 비전도성 고분자(166)로 만든다(전도성 고분자 패턴닝 공정).The present invention forms a transparent conductive photosensitive film 160 of a transparent material on the upper surface of the touch panel, and then a portion corresponding to the plurality of Y-axis electrostatic electrodes 122a and 164 and a respective Y-axis electrostatic electrode by a wet process. The non-conductive polymer 166 maintains the conductivity of the conductive polymer 164 of the wiring electrode patterns 132a and 164 connected to one end of the 122a and 164, and loses the conductivity of the conductive polymer 164 in the non-pattern region. (Conductive polymer patterning process).
본 발명은 인쇄회로기판이 결합되는 FPCB 본딩 영역을 전도성 고분자로 커버하여 산화 발생 구역의 부식을 방지하고 외부의 압력으로 금속 균열되는 문제점을 방지하고 FPCB 본딩시 완충 역할을 수행하며 별도의 실링, 발수 코팅 공정이 생략되어 공정 비용이 감소된다.The present invention covers the FPCB bonding area to which the printed circuit board is bonded with a conductive polymer to prevent corrosion of the oxidation generating area, to prevent the problem of metal cracking by external pressure, and to act as a buffer during FPCB bonding, and to separate sealing and water repellent. The coating process is omitted, reducing the process cost.
본 발명은 전도성 고분자의 특성을 이용하여 터치 센서를 구현함으로써 시인성 측면에서 우수하며 이로 인하여 인덱스 매칭층 공정이 불필요하다.The present invention has excellent visibility in terms of visibility by implementing a touch sensor by using the characteristics of the conductive polymer, and thus an index matching layer process is unnecessary.
본 발명은 전도성 고분자의 코팅 속도가 ITO 또는 메탈 증착 속도에 비해 월등히 뛰어나기 때문에 생산성 및 단가적인 측면에서 장점이 있다.The present invention has advantages in terms of productivity and cost because the coating speed of the conductive polymer is superior to that of ITO or metal deposition.
도 9는 본 발명의 제3 실시예에 따른 투명 전도성 감광필름을 이용한 터치 패널의 제조 방법을 측면에서의 층 구조로 나타낸 도면이고, 도 10은 본 발명의 제3 실시예에 따른 투명 전도성 감광필름을 이용한 터치 패널의 제조 방법을 평면에서 나타낸 도면이다.9 is a view illustrating a method of manufacturing a touch panel using a transparent conductive photosensitive film according to a third embodiment of the present invention in a layer structure from the side, and FIG. 10 is a transparent conductive photosensitive film according to a third embodiment of the present invention. It is a figure which showed the manufacturing method of the touchscreen using the plane.
본 발명의 제3 실시예의 터치 패널의 제조 방법은 전술한 본 발명의 제1 실시예의 터치 패널의 제조 방법과 중복되는 설명을 생략하고 차이점을 중심으로 상세하게 설명한다.The manufacturing method of the touch panel according to the third embodiment of the present invention will be described in detail with the focus on the differences and the description overlapping with the above-described manufacturing method of the touch panel of the first embodiment of the present invention.
본 발명의 제3 실시예에 따른 터치 패널의 제조 방법은 도 9의 (a)와 도 10의 (a)에 도시된 바와 같이, 절연체층(110)의 상면에 인덱스 매칭층(Index-Matching)(112)을 형성하고, 그 위에 투명 도전층(120)을 형성한 후, 포토리소그래피의 공정에 의해 투명 도전층(120)으로 형성한 층에서 복수개의 X축 정전전극(122b, 120)을 형성한다.In the method of manufacturing the touch panel according to the third embodiment of the present invention, as shown in FIGS. 9A and 10A, an index matching layer is formed on an upper surface of the insulator layer 110. And forming a transparent conductive layer 120 thereon, and then forming a plurality of X-axis electrostatic electrodes 122b and 120 in a layer formed of the transparent conductive layer 120 by a photolithography process. do.
다음으로, 도 9의 (b)와 도 10의 (b)에 도시된 바와 같이, 본 발명은 투명 도전층(120)으로 이루어진 복수개의 X축 정전전극(122b)을 형성한 후, 터치 패널의 상부면에 투명한 재질의 투명 전도성 감광필름(160)을 형성한다.Next, as shown in FIGS. 9B and 10B, the present invention forms a plurality of X-axis electrostatic electrodes 122b including the transparent conductive layer 120, and then A transparent conductive photosensitive film 160 of transparent material is formed on the upper surface.
다음으로, 도 9의 (b)와 도 10의 (b)에 도시된 바와 같이, 본 발명은 포토리소그래피의 노광 및 현상 공정에 의해 투명 전도성 감광필름(160)으로 형성된 층에서 투명 감광성 수지층(162)과 그 위에 적층된 투명 전도성 물질(164)을 선택적으로 제거하여 복수개의 Y축 정전전극(122a, 164)을 형성한다.Next, as shown in FIGS. 9B and 10B, the present invention provides a transparent photosensitive resin layer in a layer formed of a transparent conductive photosensitive film 160 by an exposure and development process of photolithography. 162 and the transparent conductive material 164 stacked thereon are selectively removed to form a plurality of Y-axis electrostatic electrodes 122a and 164.
다음으로, 도 9의 (c)와 도 10의 (c)에 도시된 바와 같이, 본 발명은 터치 패널의 상부면에 금속층(130)을 형성한 후, 포토리소그래피의 공정에 의해 금속층(130)을 선택적으로 제거하여 각각의 X축 정전전극(122b, 120)의 일측 끝단과 연결되는 배선전극 패턴(132b)과, 각각의 Y축 정전전극(122a, 160))의 일측 끝단과 연결되는 배선전극 패턴(132a)을 동시에 형성한다.Next, as shown in FIGS. 9C and 10C, after forming the metal layer 130 on the upper surface of the touch panel, the metal layer 130 is formed by a photolithography process. Selectively removes the wiring electrode pattern 132b connected to one end of each of the X-axis electrostatic electrodes 122b and 120, and the wiring electrode connected to one end of each of the Y-axis electrostatic electrodes 122a and 160. The pattern 132a is formed simultaneously.
바텀 전극(100)의 배선전극 패턴(132b)과 탑 전극(200)의 배선전극 패턴(132a)은 금속층(130)으로 이루어져 있으며, 실크 스크린 인쇄용 잉크를 사용하여 실버 페이스트 인쇄 또는 실버 페이스트를 도포한 후 포토리소그래피의 노광 및 현상 공정에 의해 패턴을 구현하는 감광성 실버 페이스트 인쇄 등 한 번의 공정으로 동시에 형성된다.The wiring electrode pattern 132b of the bottom electrode 100 and the wiring electrode pattern 132a of the top electrode 200 are formed of a metal layer 130, and are coated with silver paste printing or silver paste using ink for silk screen printing. It is then simultaneously formed in one process, such as photosensitive silver paste printing to implement a pattern by photolithography exposure and development processes.
칩(Chip) 성능이 좋거나 본 발명의 제1 실시예와 같이, 탑 전극(200)의 배선전극 패턴(132a)이 바텀 전극(100)의 배선전극 패턴(132b)보다 구간 길이가 짧은 경우, 제1 실시예의 터치 패널의 구조를 가지며, 칩 설계가 난해하거나 메탈 구간이 길어지는 경우, 제3 실시예의 터치 패널의 구조를 가질 수 있다.When the chip performance is good or the wiring electrode pattern 132a of the top electrode 200 is shorter than the wiring electrode pattern 132b of the bottom electrode 100 as in the first embodiment of the present invention, When the structure of the touch panel of the first embodiment is difficult and the chip design is difficult or the metal section is long, it may have the structure of the touch panel of the third embodiment.
다른 실시예로서, 본 발명의 제4 실시예에 따른 터치 패널의 제조 방법은 절연체층(110)의 상면에 금속층(130)을 형성하고, 포토리소그래피의 공정에 의해 금속층(130)으로 이루어진 복수개의 X축 정전전극(122b)과, 각각의 X축 정전전극(122b)의 일측 끝단에 연결된 배선전극 패턴(132b)을 형성한다. 즉, 포토리소그래피의 공정은 드라이필름 라미네이팅, 노광, 현상, 메탈 에칭, 박리 공정을 수행한다.In another embodiment, in the method of manufacturing the touch panel according to the fourth embodiment of the present invention, the metal layer 130 is formed on the upper surface of the insulator layer 110, and a plurality of metal layers 130 are formed by a photolithography process. The X-axis electrostatic electrode 122b and the wiring electrode pattern 132b connected to one end of each X-axis electrostatic electrode 122b are formed. That is, the photolithography process is performed by dry film laminating, exposure, development, metal etching, peeling process.
포토리소그래피의 공정시 복수개의 X축 정전전극(122b)은 복수개의 제1 선형 전극부들과 각각의 제1 선형 전극부들과 상호 교차하는 복수개의 제2 선형 전극부들을 통해 미세 패턴의 메탈 메쉬 구조를 형성한다.In the photolithography process, the plurality of X-axis electrostatic electrodes 122b form a fine pattern metal mesh structure through the plurality of first linear electrode portions and the plurality of second linear electrode portions that cross each of the first linear electrode portions. Form.
미세 패턴의 메탈 메쉬 구조는 포토리소그래피의 공정(Wet 공정)을 수행하여 정전전극 패턴(122b)을 형성하는 경우, 금속층(130)을 제거하여 직접 메쉬 구조로 패터닝하거나 금속층(130)을 증착한 후 레이저 에칭 방법을 이용하여 메쉬 구조로 형성하는 등 다양한 실시예(그라비아 옵셋 인쇄, 리버스 인쇄, Nano Imprinting 등)가 있을 수 있다.When the metal mesh structure of the fine pattern is formed by performing the photolithography process (Wet process) to form the electrostatic electrode pattern 122b, the metal layer 130 is removed and patterned into a direct mesh structure or the metal layer 130 is deposited. Various embodiments (gravure offset printing, reverse printing, nano imprinting, etc.) may be formed using a laser etching method to form a mesh structure.
다음으로, 본 발명은 터치 패널의 상부면에 투명 전도성 감광필름(160)을 형성하고, 포토리소그래피의 노광 및 현상 공정에 의해 투명 전도성 감광필름(160)으로 형성된 층에서 투명 감광성 수지층(162)과 그 위에 적층된 투명 전도성 물질(164)을 선택적으로 제거하여 복수개의 Y축 정전전극(122a, 164)과 각각의 Y축 정전전극(122a, 164)의 일측 끝단과 연결된 배선전극 패턴(132a, 164)을 형성한다.Next, the present invention forms a transparent conductive photosensitive film 160 on the upper surface of the touch panel, the transparent photosensitive resin layer 162 in the layer formed of the transparent conductive photosensitive film 160 by the exposure and development process of photolithography. And the plurality of Y-axis electrostatic electrodes 122a and 164 and the wiring electrode patterns 132a connected to one end of each of the Y-axis electrostatic electrodes 122a and 164 by selectively removing the transparent conductive material 164 stacked thereon. 164).
바텀 전극(100)은 금속층(130)으로 이루어진 미세 패턴의 메탈 메쉬 구조로 형성하고, 탑 전극(200)은 투명 전도성 감광필름(160)으로 형성한다.The bottom electrode 100 is formed of a metal mesh structure having a fine pattern formed of the metal layer 130, and the top electrode 200 is formed of a transparent conductive photosensitive film 160.
또 다른 실시예로서, 본 발명의 제5 실시예에 따른 터치 패널의 제조 방법은 전술한 본 발명의 제3 실시예의 터치 패널의 제조 방법과 중복되는 설명을 생략하고 차이점을 중심으로 상세하게 설명한다.As still another embodiment, the manufacturing method of the touch panel according to the fifth embodiment of the present invention will be described in detail with the focus on the differences from the description overlapping with the manufacturing method of the touch panel of the third embodiment of the present invention described above. .
본 발명의 제5 실시예에 따른 터치 패널의 제조 방법은 포토리소그래피의 노광 및 현상 공정에 의해 투명 전도성 감광필름(160)으로 형성된 층에서 투명 감광성 수지층(162)과 그 위에 적층된 투명 전도성 물질(164)을 선택적으로 제거하여 복수개의 X축 정전전극(122b, 120)을 형성한다.In the method of manufacturing the touch panel according to the fifth embodiment of the present invention, the transparent photosensitive resin layer 162 and the transparent conductive material stacked thereon are formed in the layer formed of the transparent conductive photosensitive film 160 by the photolithography exposure and development process. 164 is selectively removed to form a plurality of X-axis electrostatic electrodes 122b and 120.
다음으로, 본 발명은 투명 전도성 감광필름(160)으로 이루어진 복수개의 X축 정전전극(122b)을 형성한 후, 터치 패널의 상부면에 투명한 재질의 투명 전도성 감광필름(160)을 형성한다.Next, the present invention after forming a plurality of X-axis electrostatic electrode 122b made of a transparent conductive photosensitive film 160, to form a transparent conductive photosensitive film 160 of a transparent material on the upper surface of the touch panel.
다음으로, 본 발명은 포토리소그래피의 노광 및 현상 공정에 의해 투명 전도성 감광필름(160)으로 형성된 층에서 투명 감광성 수지층(162)과 그 위에 적층된 투명 전도성 물질(164)을 선택적으로 제거하여 복수개의 Y축 정전전극(122a, 164)을 형성한다.Next, the present invention selectively removes the transparent photosensitive resin layer 162 and the transparent conductive material 164 stacked thereon from the layer formed of the transparent conductive photosensitive film 160 by the photolithography exposure and development process. Y-axis electrostatic electrodes 122a and 164 are formed.
다음으로, 본 발명은 터치 패널의 상부면에 금속층(130)을 형성한 후, 포토리소그래피의 공정에 의해 금속층(130)을 선택적으로 제거하여 각각의 X축 정전전극(122b, 120)의 일측 끝단과 연결되는 배선전극 패턴(132b)과, 각각의 Y축 정전전극(122a, 160))의 일측 끝단과 연결되는 배선전극 패턴(132a)을 동시에 형성한다.Next, after the metal layer 130 is formed on the upper surface of the touch panel, one side end of each of the X-axis electrostatic electrodes 122b and 120 is selectively removed by the photolithography process. And a wiring electrode pattern 132b connected to each other and a wiring electrode pattern 132a connected to one end of each of the Y-axis electrostatic electrodes 122a and 160 are simultaneously formed.
바텀 전극(100)의 배선전극 패턴(132b)과 탑 전극(200)의 배선전극 패턴(132a)은 금속층(130)으로 이루어져 있으며, 실크 스크린 인쇄용 잉크를 사용하여 실버 페이스트 인쇄 또는 실버 페이스트를 도포한 후 포토리소그래피의 노광 및 현상 공정에 의해 패턴을 구현하는 감광성 실버 페이스트 인쇄 등 한 번의 공정으로 동시에 형성된다.The wiring electrode pattern 132b of the bottom electrode 100 and the wiring electrode pattern 132a of the top electrode 200 are formed of a metal layer 130, and are coated with silver paste printing or silver paste using ink for silk screen printing. It is then simultaneously formed in one process, such as photosensitive silver paste printing to implement a pattern by photolithography exposure and development processes.
제3 실시예 내지 제5 실시예는 전술한 제2 실시예와 같이, 투명 전도성 물질(164)을 전도성 고분자로 구성하여 패턴 영역을 전도성 고분자(164)의 전도성을 유지하고, 패턴이 아닌 영역의 전도성 고분자(164)의 전도성을 잃게 하여 비전도성 고분자(166)로 만들 수 있다(전도성 고분자 패턴닝 공정).In the third to fifth embodiments, like the second embodiment, the transparent conductive material 164 is made of a conductive polymer to maintain the conductivity of the conductive polymer 164, and the The conductivity of the conductive polymer 164 may be lost to make it a non-conductive polymer 166 (conductive polymer patterning process).
이상에서 설명한 본 발명의 실시예는 장치 및/또는 방법을 통해서만 구현이 되는 것은 아니며, 본 발명의 실시예의 구성에 대응하는 기능을 실현하기 위한 프로그램, 그 프로그램이 기록된 기록 매체 등을 통해 구현될 수도 있으며, 이러한 구현은 앞서 설명한 실시예의 기재로부터 본 발명이 속하는 기술분야의 전문가라면 쉽게 구현할 수 있는 것이다.The embodiments of the present invention described above are not implemented only by the apparatus and / or method, but may be implemented through a program for realizing a function corresponding to the configuration of the embodiments of the present invention, a recording medium on which the program is recorded, and the like. Such implementations may be readily implemented by those skilled in the art from the description of the above-described embodiments.
이상에서 본 발명의 실시예에 대하여 상세하게 설명하였지만 본 발명의 권리범위는 이에 한정되는 것은 아니고 다음의 청구범위에서 정의하고 있는 본 발명의 기본 개념을 이용한 당업자의 여러 변형 및 개량 형태 또한 본 발명의 권리범위에 속하는 것이다.Although the embodiments of the present invention have been described in detail above, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concepts of the present invention defined in the following claims are also provided. It belongs to the scope of rights.
[부호의 설명][Description of the code]
110: 절연체층 112: 인덱스 매칭층110: insulator layer 112: index matching layer
120: 투명 도전층 122: 정전전극 패턴120: transparent conductive layer 122: electrostatic electrode pattern
122a: Y축 정전전극 122b: X축 정전전극122a: Y-axis electrostatic electrode 122b: X-axis electrostatic electrode
130: 금속층 132: 배선전극 패턴130: metal layer 132: wiring electrode pattern
132a: 제1 배선전극 패턴 132b: 제2 배선전극 패턴132a: first wiring electrode pattern 132b: second wiring electrode pattern
140: 제1 감광성 소재 142: 제1 아트워크 필름140: first photosensitive material 142: first artwork film
154: 제2 아트워크 필름 160: 투명 전도성 감광필름154: second artwork film 160: transparent conductive photosensitive film
162: 투명 감광성 수지층 166: 비전도성 고분자 162: transparent photosensitive resin layer 166: non-conductive polymer
164: 투명 전도성 물질, 전도성 고분자 170: 부식액164: transparent conductive material, conductive polymer 170: corrosion solution
전술한 구성에 의하여, 본 발명은 투명 전도성 감광필름을 이용하여 터치 센서를 구현하여 원자재 비용과 공정 비용을 낮출 수 있는 효과가 있다.By the above-described configuration, the present invention has the effect of lowering the raw material cost and the process cost by implementing a touch sensor using a transparent conductive photosensitive film.
본 발명은 바텀 전극과 탑 전극의 합지시 투광 감광성 수지층으로 합지되기 때문에 OCA가 사용되지 않고 5㎛ 정도의 투명 전도성 감광필름의 사용을 통한 전극을 슬림(Slim)화 하는 효과가 있다.The present invention has the effect of slimming the electrode through the use of a transparent conductive photosensitive film of about 5㎛ because OCA is not used because the laminated with the light-transmissive photosensitive resin layer when the bottom electrode and the top electrode is laminated.
본 발명은 기존의 터치 패널의 제조 공정을 간소화하여 생산성을 향상시키는 효과가 있다.The present invention has the effect of improving the productivity by simplifying the manufacturing process of the existing touch panel.

Claims (13)

  1. 터치 패널의 제조 방법에 있어서,In the manufacturing method of a touch panel,
    상기 터치 패널의 원도우 영역에 해당하고 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극을 투명 도전층을 선택적으로 제거하여 형성하고, 상기 각각의 제1축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 금속 도선을 금속층을 선택적으로 제거하여 형성하는 단계; 및A plurality of first axis electrostatic electrodes corresponding to the window area of the touch panel and spaced apart at intervals of a predetermined distance are formed by selectively removing the transparent conductive layer, and connected to one end of each of the first axis electrostatic electrodes Selectively removing a plurality of metal conductors, which are edge regions of the touch panel, from the metal layer; And
    상기 터치 패널의 상부면에 투명한 재질의 투명 전도성 감광필름을 형성한 후, 상기 투명 전도성 감광필름으로 형성된 층에서 상기 투명 전도성 감광필름을 선택적으로 제거하여 상기 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극과, 상기 각각의 제2축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 배선전극을 형성하는 단계After forming a transparent conductive photosensitive film of a transparent material on the upper surface of the touch panel, selectively removing the transparent conductive photosensitive film from the layer formed of the transparent conductive photosensitive film to be spaced a predetermined distance from each of the first axis electrostatic electrode Forming each of the second axis electrostatic electrodes that cross each other and a wiring electrode that is an edge region of the touch panel connected to one end of each of the second axis electrostatic electrodes;
    를 포함하는 터치 패널의 제조 방법.Method of manufacturing a touch panel comprising a.
  2. 터치 패널의 제조 방법에 있어서,In the manufacturing method of a touch panel,
    상기 터치 패널의 원도우 영역에 해당하고 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극을 투명 도전층을 선택적으로 제거하여 형성하는 단계;Selectively removing the transparent conductive layer from the plurality of first axis electrostatic electrodes corresponding to the window area of the touch panel and spaced apart at intervals of a predetermined distance;
    상기 터치 패널의 상부면에 투명한 재질의 투명 전도성 감광필름을 형성한 후, 상기 투명 전도성 감광필름으로 형성된 층에서 상기 투명 전도성 감광필름을 선택적으로 제거하여 상기 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극을 형성하는 단계; 및After forming a transparent conductive photosensitive film of a transparent material on the upper surface of the touch panel, selectively removing the transparent conductive photosensitive film from the layer formed of the transparent conductive photosensitive film to be spaced a predetermined distance from each of the first axis electrostatic electrode Forming the second axis electrostatic electrode to cross each other; And
    상기 터치 패널의 상부면에 금속층을 형성한 후, 상기 금속층을 선택적으로 제거하여 상기 각각의 제1축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 제1 금속 도선과, 상기 각각의 제2축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 제2 금속 도선을 동시에 형성하는 단계Forming a metal layer on an upper surface of the touch panel, and selectively removing the metal layer to form a plurality of first metal conductors which are edge regions of the touch panel connected to one end of each of the first axis electrostatic electrodes; Simultaneously forming a plurality of second metal conductors, which are edge regions of the touch panel, connected to one end of each of the second axis electrostatic electrodes;
    를 포함하는 터치 패널의 제조 방법.Method of manufacturing a touch panel comprising a.
  3. 터치 패널의 제조 방법에 있어서,In the manufacturing method of a touch panel,
    상기 터치 패널의 원도우 영역에 해당하고 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극과, 상기 각각의 제1축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 금속 도선을 하나의 금속층으로 이루어진 미세 패턴의 메탈 메쉬 구조로 형성하는 단계; 및A plurality of first axis electrostatic electrodes corresponding to the window area of the touch panel and spaced apart at intervals of a predetermined distance, and a plurality of edge regions of the touch panel connected to one end of each of the first axis electrostatic electrodes; Forming a metal conductive wire in a fine pattern metal mesh structure formed of one metal layer; And
    상기 터치 패널의 상부면에 투명한 재질의 투명 전도성 감광필름을 형성한 후, 상기 투명 전도성 감광필름으로 형성된 층에서 상기 투명 전도성 감광필름을 선택적으로 제거하여 상기 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극과, 상기 각각의 제2축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 배선전극을 형성하는 단계After forming a transparent conductive photosensitive film of a transparent material on the upper surface of the touch panel, selectively removing the transparent conductive photosensitive film from the layer formed of the transparent conductive photosensitive film to be spaced a predetermined distance from each of the first axis electrostatic electrode Forming each of the second axis electrostatic electrodes that cross each other, and a wiring electrode which is an edge region of the touch panel connected to one end of each of the second axis electrostatic electrodes;
    를 포함하는 터치 패널의 제조 방법.Method of manufacturing a touch panel comprising a.
  4. 터치 패널의 제조 방법에 있어서,In the manufacturing method of a touch panel,
    상기 터치 패널의 원도우 영역에 해당하고 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극을 투명한 재질의 제1 투명 전도성 감광필름을 선택적으로 제거하여 형성하는 단계;Selectively removing the first transparent conductive photosensitive film made of a transparent material from a plurality of first axis electrostatic electrodes corresponding to the window area of the touch panel and spaced apart at intervals of a predetermined distance;
    상기 터치 패널의 상부면에 투명한 재질의 제2 투명 전도성 감광필름을 형성한 후, 상기 제2 투명 전도성 감광필름으로 형성된 층에서 상기 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극을 상기 제2 투명 전도성 감광필름을 선택적으로 제거하여 형성하는 단계; 및After forming a second transparent conductive photosensitive film of a transparent material on the upper surface of the touch panel, each of the first crossing the first axis electrostatic electrode and a predetermined distance in the layer formed of the second transparent conductive photosensitive film Forming a biaxial electrostatic electrode by selectively removing the second transparent conductive photosensitive film; And
    상기 터치 패널의 상부면에 금속층을 형성한 후, 상기 금속층을 선택적으로 제거하여 상기 각각의 제1축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 제1 금속 도선과, 상기 각각의 제2축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 제2 금속 도선을 동시에 형성하는 단계Forming a metal layer on an upper surface of the touch panel, and selectively removing the metal layer to form a plurality of first metal conductors which are edge regions of the touch panel connected to one end of each of the first axis electrostatic electrodes; Simultaneously forming a plurality of second metal conductors, which are edge regions of the touch panel, connected to one end of each of the second axis electrostatic electrodes;
    를 포함하는 터치 패널의 제조 방법.Method of manufacturing a touch panel comprising a.
  5. 제1항 내지 제4항 중 어느 한 항에 있어서,The method according to any one of claims 1 to 4,
    상기 투명 전도성 감광필름, 상기 제1 투명 전도성 감광필름, 상기 제2 투명 전도성 감광필름은 투명 절연 물질로 이루어진 투명 감광성 수지층과, 그 위에 적층되고 전도성과 감광성이 있는 투명한 재질의 물질로서 탄소나노튜브(Carbon Nano Tube, CNT), 그라핀(Graphene), 전도성 폴리머, 은 나노와이어(Silver Nanowires, AGNW), Hybrid AGNW(CNT+AGNW), Hybrid 그라핀(AGNW+그라핀), 전도성 고분자, Cu, Cu alloy, Ag, Ag alloy, Ni+Cr, Ni+Ni alloy, Mo/Ag, Mo/Al/Mo, Ni+Cr/Cu/Ni+Cr, Ni alloy/Cu, Ni alloy/Cu/Ni alloy, Mo/APC, Cu/Ni+Cu+Ti, Ni+Cu+Ti/Cu/Ni+Cu+Ti, 카본, 투명 전도성 산화물(Transparent Conducting Oxide) 중 하나의 물질인 터치 패널의 제조 방법.The transparent conductive photosensitive film, the first transparent conductive photosensitive film, and the second transparent conductive photosensitive film include a transparent photosensitive resin layer made of a transparent insulating material, and a carbon nanotube as a material of a transparent material laminated on the conductive material and having a photosensitive property. (Carbon Nano Tube, CNT), Graphene, Conductive Polymer, Silver Nanowires (AGNW), Hybrid AGNW (CNT + AGNW), Hybrid Graphene (AGNW + Graphene), Conductive Polymer, Cu, Cu alloy, Ag, Ag alloy, Ni + Cr, Ni + Ni alloy, Mo / Ag, Mo / Al / Mo, Ni + Cr / Cu / Ni + Cr, Ni alloy / Cu, Ni alloy / Cu / Ni alloy, Mo / APC, Cu / Ni + Cu + Ti, Ni + Cu + Ti / Cu / Ni + Cu + Ti, carbon, a method of manufacturing a touch panel which is a material of transparent conducting oxide (Transparent Conducting Oxide).
  6. 제1항에 있어서,The method of claim 1,
    상기 배선전극을 형성하는 단계는, Forming the wiring electrode,
    상기 터치 패널의 상부면에 투명 절연 물질로 이루어진 투명 감광성 수지층과, 그 위에 전도성 고분자로 이루어진 투명 전도성 물질을 포함한 투명 전도성 감광필름을 형성하는 단계; 및Forming a transparent conductive photosensitive film including a transparent photosensitive resin layer made of a transparent insulating material on the upper surface of the touch panel and a transparent conductive material made of a conductive polymer thereon; And
    부식액과 반응시켜 2중 결합 벤젠고리의 구조를 끓어 단일 결합으로 만들어 전도성을 없애는 습식 공정에 의해 상기 투명 전도성 감광필름으로 형성된 층에서 상기 각각의 제2축 정전전극과 상기 배선전극의 전도성 고분자의 전도성을 유지하고 상기 각각의 제2축 정전전극과 상기 배선전극에 해당하지 않는 부분의 전도성 고분자의 전도성을 잃게 하여 비전도성 고분자로 만드는 단계The conductivity of the conductive polymer of each of the second axis electrostatic electrode and the wiring electrode in the layer formed of the transparent conductive photosensitive film by a wet process of reacting with a corrosion solution to remove the conductivity by boiling the structure of the double bond benzene ring to form a single bond. Maintaining the conductivity and losing the conductivity of the conductive polymers in the portions not corresponding to the respective second axis electrostatic electrodes and the wiring electrodes to form non-conductive polymers.
    를 포함하는 터치 패널의 제조 방법.Method of manufacturing a touch panel comprising a.
  7. 제1항에 있어서,The method of claim 1,
    상기 각각의 제2축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 배선전극은 상기 각각의 제1축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 금속 도선보다 구간 길이가 짧게 형성되는 터치 패널의 제조 방법.The wiring electrode, which is an edge region of the touch panel connected to one end of each of the second axis electrostatic electrodes, is a plurality of metals that are edge regions of the touch panel connected to one end of each of the first axis electrostatic electrodes. A method of manufacturing a touch panel in which a section length is shorter than a conductive line.
  8. 터치 패널에 있어서,In the touch panel,
    유기 절연체 또는 무기 절연체로 이루어진 절연체층과, 상기 절연체층의 상부면에 형성되고 상기 터치 패널의 원도우 영역에 해당하며 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극을 형성하는 투명 도전층과, 상기 복수개의 제1축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 금속 도선을 형성하는 바텀(Bottom) 전극; 및An insulator layer formed of an organic insulator or an inorganic insulator, and a transparent conductive layer formed on an upper surface of the insulator layer and forming a plurality of first axis electrostatic electrodes corresponding to the window region of the touch panel and spaced apart at regular intervals. And a bottom electrode forming a plurality of metal conductors, which are edge regions of the touch panel, connected to one end of the plurality of first axis electrostatic electrodes; And
    상기 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극과 상기 제2축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 배선전극을 투명한 재질의 투명 전도성 감광필름으로 형성하는 탑(Top) 전극을 포함하고, 상기 투명 전도성 감광필름은 투명 절연 물질로 이루어진 투명 감광성 수지층과, 그 위에 적층된 투명한 재질의 전도성 물질인 투명 전도성 물질로 이루어지며, 상기 바텀 전극의 상부면에 상기 탑 전극을 상기 투명 감광성 수지층에 의해 합지되는 터치 패널.The second electrode of the first electrode and the wiring electrode, which is an edge region of the touch panel connected to one end of the second electrode of the second electrode, the transparent electrode is made of a transparent material A top electrode formed of a conductive photosensitive film, wherein the transparent conductive photosensitive film is formed of a transparent photosensitive resin layer made of a transparent insulating material and a transparent conductive material which is a conductive material of a transparent material stacked thereon; The top panel is laminated on the top surface of the bottom electrode by the transparent photosensitive resin layer.
  9. 터치 패널에 있어서,In the touch panel,
    유기 절연체 또는 무기 절연체로 이루어진 절연체층과, 상기 절연체층의 상부면에 형성되고 상기 터치 패널의 원도우 영역에 해당하며 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극을 형성하는 투명 도전층과, 상기 복수개의 제1축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 제1 금속 도선을 형성하는 바텀(Bottom) 전극; 및An insulator layer formed of an organic insulator or an inorganic insulator, and a transparent conductive layer formed on an upper surface of the insulator layer and forming a plurality of first axis electrostatic electrodes corresponding to the window region of the touch panel and spaced apart at regular intervals. And a bottom electrode forming a plurality of first metal conductors, which are edge regions of the touch panel, connected to one end of the plurality of first axis electrostatic electrodes; And
    상기 터치 패널의 원도우 영역에 해당하고, 상기 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극을 형성하는 투명한 재질의 투명 전도성 감광필름과, 상기 제2축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 제2 금속 도선을 형성하는 탑(Top) 전극을 포함하고, 상기 투명 전도성 감광필름은 투명 절연 물질로 이루어진 투명 감광성 수지층과, 그 위에 적층된 투명한 재질의 전도성 물질인 투명 전도성 물질로 이루어지며, 상기 투명 도전층의 상부면에 상기 탑 전극을 상기 투명 감광성 수지층에 의해 합지하는 터치 패널.A transparent conductive photosensitive film made of a transparent material corresponding to the window area of the touch panel and forming respective second axis electrostatic electrodes crossing the first axis electrostatic electrode at a predetermined distance and intersecting with each other, and the second axis electrostatic electrode A top electrode forming a plurality of second metal conductors, which are edge regions of the touch panel connected to one end of the touch panel, wherein the transparent conductive photosensitive film comprises a transparent photosensitive resin layer made of a transparent insulating material, and A touch panel comprising a transparent conductive material which is a conductive material of a transparent material laminated on the top, and laminating the top electrode on the upper surface of the transparent conductive layer by the transparent photosensitive resin layer.
  10. 터치 패널에 있어서,In the touch panel,
    유기 절연체 또는 무기 절연체로 이루어진 절연체층과, 상기 절연체층의 상부면에 형성되고 상기 터치 패널의 원도우 영역에 해당하며 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극과, 상기 각각의 제1축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 금속 도선을 하나의 금속층으로 이루어진 미세 패턴의 메탈 메쉬 구조로 형성하는 바텀(Bottom) 전극; 및An insulator layer formed of an organic insulator or an inorganic insulator, a plurality of first axis electrostatic electrodes formed on an upper surface of the insulator layer, corresponding to the window region of the touch panel, and spaced at intervals of a predetermined distance; A bottom electrode forming a plurality of metal conductors, which are edge regions of the touch panel, connected to one end of the uniaxial electrostatic electrode in a fine pattern metal mesh structure formed of one metal layer; And
    상기 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극과 상기 제2축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 배선전극을 투명한 재질의 투명 전도성 감광필름으로 형성하는 탑(Top) 전극을 포함하고, 상기 투명 전도성 감광필름은 투명 절연 물질로 이루어진 투명 감광성 수지층과, 그 위에 적층된 투명한 재질의 전도성 물질인 투명 전도성 물질로 이루어지며, 상기 바텀 전극의 상부면에 상기 탑 전극을 상기 투명 감광성 수지층에 의해 합지되는 터치 패널.The second electrode of the first electrode and the wiring electrode, which is an edge region of the touch panel connected to one end of the second electrode of the second electrode, the transparent electrode is made of a transparent material A top electrode formed of a conductive photosensitive film, wherein the transparent conductive photosensitive film is formed of a transparent photosensitive resin layer made of a transparent insulating material and a transparent conductive material which is a conductive material of a transparent material stacked thereon; The top panel is laminated on the top surface of the bottom electrode by the transparent photosensitive resin layer.
  11. 터치 패널에 있어서,In the touch panel,
    상기 터치 패널의 원도우 영역에 해당하며 일정거리의 간격마다 이격되어 형성된 복수개의 제1축 정전전극을 형성하는 투명한 재질의 제1 투명 전도성 감광필름과, 상기 각각의 제1축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 제1 금속 도선을 형성하는 바텀(Bottom) 전극; 및A first transparent conductive photosensitive film made of a transparent material corresponding to the window area of the touch panel and spaced apart at intervals of a predetermined distance, and having one end of each of the first axis electrostatic electrodes; A bottom electrode forming a plurality of first metal conductors, which are edge regions of the touch panel, connected to each other; And
    상기 터치 패널의 원도우 영역에 해당하고, 상기 각각의 제1축 정전전극과 일정거리 이격되어 교차되는 각각의 제2축 정전전극을 형성하는 투명한 재질의 제2 투명 전도성 감광필름과, 상기 각각의 제2축 정전전극의 일측 끝단과 연결되는 상기 터치 패널의 가장 자리 영역인 복수개의 제2 금속 도선을 형성하는 탑(Top) 전극을 포함하고, 상기 제1 투명 전도성 감광필름과 상기 제2 투명 전도성 감광필름은 투명 절연 물질로 이루어진 투명 감광성 수지층과, 그 위에 적층된 투명한 재질의 전도성 물질인 투명 전도성 물질로 이루어지며, 상기 바텀 전극의 상부면에 상기 탑 전극을 상기 제2 투명 전도성 감광필름의 투명 감광성 수지층에 의해 합지되는 터치 패널.A second transparent conductive photosensitive film made of a transparent material corresponding to the window area of the touch panel and forming respective second axis electrostatic electrodes crossing the first axis electrostatic electrodes at a predetermined distance from each other; And a top electrode forming a plurality of second metal conductors, which are edge regions of the touch panel, connected to one end of the biaxial electrostatic electrode, wherein the first transparent conductive photosensitive film and the second transparent conductive photosensitive member are formed. The film is made of a transparent photosensitive resin layer made of a transparent insulating material and a transparent conductive material which is a conductive material of a transparent material stacked thereon, and the top electrode on the top surface of the bottom electrode is transparent of the second transparent conductive photosensitive film. The touch panel laminated by the photosensitive resin layer.
  12. 제8항 내지 제11항 중 어느 한 항에 있어서,The method according to any one of claims 8 to 11,
    상기 투명 전도성 물질, 상기 제1 투명 전도성 감광필름, 상기 제2 투명 전도성 감광필름은 전도성과 감광성이 있는 투명한 재질의 물질로서 탄소나노튜브(Carbon Nano Tube, CNT), 그라핀(Graphene), 전도성 폴리머, 은 나노와이어(Silver Nanowires, AGNW), Hybrid AGNW(CNT+AGNW), Hybrid 그라핀(AGNW+그라핀), 전도성 고분자, Cu, Cu alloy, Ag, Ag alloy, Ni+Cr, Ni+Ni alloy, Mo/Ag, Mo/Al/Mo, Ni+Cr/Cu/Ni+Cr, Ni alloy/Cu, Ni alloy/Cu/Ni alloy, Mo/APC, Cu/Ni+Cu+Ti, Ni+Cu+Ti/Cu/Ni+Cu+Ti, 카본, 투명 전도성 산화물(Transparent Conducting Oxide) 중 하나의 물질인 터치 패널.The transparent conductive material, the first transparent conductive photosensitive film, and the second transparent conductive photosensitive film are carbon nanotubes (CNTs), graphene (Graphene), conductive polymers as materials of transparent and conductive materials. Silver Nanowires (AGNW), Hybrid AGNW (CNT + AGNW), Hybrid Graphene (AGNW + Graphene), Conductive Polymer, Cu, Cu alloy, Ag, Ag alloy, Ni + Cr, Ni + Ni alloy, Mo / Ag, Mo / Al / Mo, Ni + Cr / Cu / Ni + Cr, Ni alloy / Cu, Ni alloy / Cu / Ni alloy, Mo / APC, Cu / Ni + Cu + Ti, Ni + Cu + Ti Touch panel, which is one of / Cu / Ni + Cu + Ti, carbon, or transparent conducting oxide.
  13. 제8항에 있어서,The method of claim 8,
    상기 투명 전도성 물질이 전도성 고분자인 경우, 상기 제2축 정전전극과 상기 배선전극을 전도성 고분자의 전도성을 유지하고 나머지 영역의 전도성 고분자의 전도성을 잃게 하여 비전도성 고분자로 만드는 터치 패널.When the transparent conductive material is a conductive polymer, the second axis electrostatic electrode and the wiring electrode to maintain the conductivity of the conductive polymer and to lose the conductivity of the conductive polymer of the remaining area to make a non-conductive polymer.
PCT/KR2014/008329 2013-09-06 2014-09-04 Touch panel using transparent conductive photosensitive film and method for manufacturing same WO2015034291A1 (en)

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