WO2014204078A1

WO2014204078A1 - Chemical vapor deposition apparatus for high-speed deposition at ambient temperature with tube-type filter trap, system for remotely controlling same, and deposition method using same

Info

Publication number: WO2014204078A1
Application number: PCT/KR2014/000699
Authority: WO
Inventors: 장태순
Original assignee: 주식회사 우리정도
Priority date: 2013-06-17
Filing date: 2014-01-24
Publication date: 2014-12-24

Abstract

The present invention provides a chemical vapor deposition apparatus for high-speed deposition at an ambient temperature with a tube-type filter trap. The chemical vapor deposition apparatus for high-speed deposition includes: a heating unit including a vaporizing furnace in which a first heater is installed to vaporize a dimer material that is a chemical vapor deposition raw material into a dimer in a polymer state after the dimer material is fed into the vaporizing furnace, thereby reducing the volume and manufacturing costs of equipment, reducing a process time due to a continuous deposition process, and easily and efficiently managing equipment control by an end user and a pyrolysis furnace connected and installed on one side of the vaporizing furnace to supply the dimer and in which a second heater is installed to dissolve the dimer in the polymer state into a monomer in a unimolecular state; a vacuum deposition unit connected and installed on one side of the pyrolysis furnace of the heating unit and including a deposition chamber receiving an adherend therein and forming a vacuum deposition space so that a monomer unimolecular gas, which is supplied into the pyrolysis furnace, is deposited on a surface of the adherend, and a vacuum pump that is driven to generate vacuum within the deposition chamber; a filter trap coupled and installed on the vacuum deposition unit to mutually connect the vacuum pump to the deposition chamber and configured to deposit and extract the excessive monomer generated in the vacuum generation process using the vacuum pump and the deposition process; a measuring unit including a temperature sensor that is installed in each of the vaporizing furnace and the pyrolysis furnace to measure the temperature of each of the vaporizing furnace and the pyrolysis furnace, and a vacuum sensor installed in the deposition chamber to measure a vacuum value generated from the vacuum pump; a control box including a display window for displaying the temperature and vacuum value which are measured by the temperature sensor and the vacuum sensor of the measuring unit, and a plurality of power buttons for operating a first heater and second heater of the heating unit and applying a standby power and main power into the vacuum pump; and a control unit mounted in the control box to apply a control signal into each of the first heater, the second heater, and the vacuum pump according to the measurement signal inputted from the temperature sensor and vacuum sensor of the measuring unit, wherein the control unit is capable of setting reference values with respect to the temperature and vacuum values. The control unit controls a tube-type filter trap that preliminarily heats each of the first and second heaters to the preset temperature and maintains the preheated state when the standby power is applied to the control box.

Description

Room temperature chemical vapor deposition apparatus for high speed deposition with tubular filter trap, remote control system and its deposition method

The present invention relates to a room temperature chemical vapor deposition apparatus having a tubular filter trap, a remote control system and a deposition method thereof, and more particularly, by applying a tubular filter trap for depositing and depositing monomers instead of a cooler. It effectively reduces the volume and production cost of the facility, maintains the preheating temperature to enable initial start-ups, promotes continuous deposition, reduces work time efficiently, and manages a large number of affiliated facilities at the headquarters. The present invention relates to a room temperature chemical vapor deposition apparatus for high-speed deposition having a tubular filter trap capable of easily controlling a facility for a general manager of a merchant and efficiently controlling and managing a facility, and a remote control system and a deposition method thereof.

Recently, as part of the development of new materials, various materials have been applied to various purposes in the form of thin films, and in the case of high-tech industrial technology, hardness, corrosion resistance, thermal conductivity, waterproof performance, etc. are required as functionality, or importance of electrical and optical properties is important. It's getting a lot of attention.

Representative methods of the thin film formation technology are largely divided into chemical vapor deposition (CVD) and physical vapor deposition (PVD), and the thin film formation by CVD method is the contribution of high-speed particles compared to the PVD method. Due to its small size, the damage to the surface of the substrate is advantageous, and thus it is widely used, and it is also an area that is rushing to develop technology internationally.

Chemical Vapor Deposition (CVD) is a method of depositing a gaseous compound on a heated substrate, and more recently, with the development of more technology, the product is deposited on a surface by reacting on a substrate surface at room temperature.

Chemical Vapor Deposition (CVD) is the most widely used commercially available thin film manufacturing technology and is a very important unit process especially in the production process of semiconductor integrated circuits. This is because chemical vapor deposition has many inherent advantages, despite the high reaction temperatures, complex reaction pathways, and the fact that most gases are very dangerous.

The strength of chemical vapor deposition (CVD) is that the first melting point can be easily manufactured at a temperature lower than the melting point, the second purity is high, and the third can be mass-produced, which is less expensive than physical vapor deposition. It is possible to deposit various kinds of elements and compounds, and because the control range of the process conditions is very wide, it is easy to obtain a thin film of various characteristics and has a good stepp coating (STEPCOVERAGE).

Chemical Vapor Deposition (CVD) is a process in which a gas filled in a vacuum chamber is heated to a high temperature or causes a chemical reaction near or on the surface of a deposit which is at room temperature, and the resulting solid substance adheres to the surface of the workpiece.

On the other hand, recently, thanks to the development of various technologies for electronic products, they have been widely applied to our daily life. Most of them are composed of electric and electronic parts or circuits, but the products are unprotected from invasion by moisture or water. It is being released.

In addition, with the development of such various electronic products, on the other hand, technology development to complement the waterproof performance of these products is being made. Among them, a representative technique is a chemical vapor deposition method of a polymer organic compound in the form of a dimer. It is a method of thin coating on the PCB surface of electronic products.

As described above, in order to coat a dimer, which is a polymer organic compound having direct waterproofing property, to a PCB substrate, since the PCB substrate, which is a workpiece, cannot be heated to a high temperature, deposition is usually performed in a vacuum chamber at room temperature.

Room temperature chemical vapor deposition is rapidly being applied to many heat-sensitive electronic components because the deposition coating takes place without direct heating of the workpiece itself. For example, technology development is rushing to be widely applied to LED boards for PCBs, electronic cores, medical devices, rare earth magnets, PDPs, rubber products, and micromachines.

[Revision under Rule 91 03.04.2014]
As shown in FIG. 17, the general structure of the room temperature type chemical vapor deposition equipment is composed of a vaporization furnace and a decomposition furnace, a deposition chamber, a cooler, and a vacuum pump, all connected in one passage to be a final stage of the vacuum pump. Is constructed in such a way that a vacuum is created in all zones when is started.

[Revision under Rule 91 03.04.2014]
Deleted and Moved to drawings.

[Revision under Rule 91 03.04.2014]
In FIG. 17, the dimer material introduced into the gasification furnace is usually vaporized in a range of 60 to 200 ° C., and then passed to the decomposition furnace. In the decomposition furnace, a dimer in a vaporized polymer state is usually cut near 500 to 700 ° C. It is converted into monomer, the molecular form.

The monomeric monomer in the gas form repeats the process of constantly hitting and falling off the surface of the workpiece in a chamber at room temperature. According to the literature, it is very slowly conformal with a probability of 1% or less. It is known that (Conformal) coating deposition takes place.

[Revision under Rule 91 03.04.2014]
Since the vacuum pump installed at the rightmost side of FIG. 17 creates a vacuum throughout the operation of the equipment, the entire raw material flow is made along the passage of the vaporization furnace, the decomposition furnace, the deposition chamber, the chiller trap (cooler) and the vacuum pump. .

Looking at the state of the technology development of the room temperature type chemical vapor deposition equipment as described above, Korean Patent Publication No. 38920 (2009.04.21.) Has a vaporization unit for vaporizing the deposition raw material, decomposition furnace for thermal decomposition of the vaporized deposition raw material, And a polymerization chamber for polymerizing the pyrolyzed deposition raw material to deposit a coating film on the surface of the adherend, wherein the vaporization unit, the decomposition furnace and the polymerization chamber are connected by heat resistant pipes, and an opening / closing valve is installed between the vaporization unit and the decomposition furnace. The chemical vapor deposition apparatus and the chemical vapor deposition method are known, wherein the polymerization chamber is connected to a vacuum apparatus through a cooling trap by a vacuum pipe, and the same apparatus is also disclosed in US Patent US5709753A and US6406544B1. Is known.

However, in the conventional room temperature type chemical vapor deposition equipment, the monomer of a single molecule that has passed into the deposition chamber does not have 100% deposition coating on the deposit, and a portion of the monomer passes over the vacuum pump, and usually 10 to 20% is not used and the vacuum pump is not used. The excess dimer enters into the vacuum pump and is primarily coated inside the pump pipe or further contaminates the oil in the vacuum pump, resulting in a rapid drop in vacuum efficiency.

In addition, the faster the coating operation speed, the greater the amount of monomer entering the deposition chamber, and thus the proportion of the monomer to be passed to the vacuum pump increases proportionally. Naturally, the amount of pumping will be increased.

In order to prevent the excess monomers from being passed to the vacuum pump, a method is generally used to install a cooler in the middle, and monomers passing through the cooler continuously cooled to about minus 50 to 120 degrees Celsius have a sudden drop in temperature. It is rapidly precipitated and precipitates in the form of coarse polymer on the surface of the cooler. In the related art, about 95% of the monomers passing through the cooler are precipitated and some small amount is deposited on the inner wall of the cooler or passed into a vacuum pump.

As a result, less than about 1% of the input dimer is known to be passed to the vacuum pump and mixed in the vacuum pump oil. That is, despite the installation of the cooler, the cooler pump oil needs to be replaced after a certain period of time.

Therefore, the oil replacement cycle is shortened or the vacuum pump is damaged due to the monomers that have been passed through the vacuum pump, and thus the monomer passing through the inside of the cooler is rapidly lowered in temperature by installing a cooler at the front of the vacuum pump. However, the cryogenic cooler is banned from the use of freon refrigerants and is converted into an expensive equipment structure using helium and liquid nitrogen. There is a serious problem in economics because it increases the cost, and also consumes a lot of maintenance costs due to the high power consumption.

Furthermore, the conventional room temperature chemical vapor deposition equipment has a structure in which both the vaporization furnace and the decomposition furnace extend only in the longitudinal direction, as well as the large size of the cooler, which makes it impossible to reduce the overall equipment. Due to the large volume, only a facility can be built only in a factory of a coating company specializing in a sufficient facility space.

In general, a chemical vapor deposition apparatus (CVD) is equipped with a heater for heating the input material to be vaporized into a polymer state in a vaporization furnace and then to a monomolecular form in a decomposition furnace, respectively. With the maintenance of the value, the vacuum quality and temperature control are very important because the deposition quality by the operation varies greatly from the influence of the different temperature zones on the gasification furnace and the decomposition furnace by the heater. In other words, the work is being carried out from the heaters of the gasification furnace and decomposition furnace with greatly different required temperature ranges through the heating stages of 2 to 10 steps, in order for the gasification furnace and the decomposition furnace to reach the set time required for the operation, respectively. This is to control each temperature increase rate and to minimize overshooting of the heater generated during the heating process.

However, in the case of the conventional chemical vapor deposition apparatus (CVD), the vacuum temperature, the vaporization furnace by the heater and the heating temperature of the decomposition furnace are the primary quality in the device structure to produce a high-quality product that controls the coating material of nano units in microns. Since the work preparation time for optimizing these conditions is long, the work time (small equipment 1-2 hours, large equipment 5-6 hours) takes a lot of problems.

In addition, in the past, due to the need to arbitrarily adjust the conditions of each parameter by the experience of old skilled workers, these coatings are made only on-demand within the factory of a specialized company. There is a problem that it is difficult to respond immediately to the customer's needs in the retail type stores that must be worked in real time at the request of the customer, such as coating or discoloration prevention coating of accessories products.

Therefore, there is an urgent need to develop a technology for a management system that can collectively manage a large number of equipment so that it can be easily operated and controlled by non-professional workers in general stores as well as chemical vapor deposition equipment that can be installed in small spaces such as general stores and stores. It is true.

The present invention is to solve the above problems, while minimizing the overall volume of the installation by configuring a tubular filter trap that can deposit and deposit monomo instead of the cooler while reducing the length of the vaporization furnace and decomposition furnace as much as possible The purpose of the present invention is to provide a room temperature chemical vapor deposition apparatus for rapid deposition, a remote control system, and a deposition method thereof, which have a tubular filter trap that can significantly reduce the production cost of a product and be widely used in general stores or stores.

In addition, the present invention is configured to maintain the heater in a constant heating state to the temperature just before the chemical reaction of the material to the vaporization furnace and decomposition furnace to improve the quality of the product while minimizing the overall working time to achieve high-speed deposition work The present invention provides a room temperature chemical vapor deposition apparatus for a high-speed deposition having a tubular filter trap, a remote control system, and a deposition method for practical use of a device having a function capable of continuously and continuously working.

In addition, the present invention is configured to be able to collectively manage a variety of individual information from a plurality of deposition apparatus located in a general store or store, it is possible to control the equipment from the general manager of each store as well as easy and efficient management efficiency of the equipment from the head office It is to provide a room temperature chemical vapor deposition apparatus for high-speed deposition having a tubular filter trap that can be increased, a remote control system and a deposition method thereof.

The room temperature chemical vapor deposition apparatus having a tubular filter trap proposed by the present invention is a vaporization furnace in which a first heater is installed to inject a dimer material, which is a chemical vapor deposition raw material, into a polymer dimer, and the vaporization furnace. A heating unit configured to be connected to one side of the furnace so as to be supplied with a dimer, and a decomposition furnace in which a second heater is installed to decompose the dimer in a polymer state into a monomer having a monomolecular form; It is connected to one side by the decomposition of the heating unit is provided to accommodate the adherend therein to form a deposition space by vacuum so that the monomeric monomer in the form of gas supplied from the decomposition furnace can be deposited on the surface of the adherend A vacuum deposition unit comprising a deposition chamber and a vacuum pump provided to generate a vacuum in the deposition chamber; A filter trap coupled to the vacuum pump and the deposition chamber in the vacuum deposition unit, the filter trap being configured to deposit and deposit excess monomers generated during the vacuum generation process and the deposition process according to the vacuum pump; A temperature sensor provided in each of the vaporization furnace and the decomposition furnace, the temperature sensor being provided to measure individual temperatures, and a vacuum sensor installed in the deposition chamber and capable of measuring a vacuum value generated from the vacuum pump; Wealth; A display window for displaying the temperature and the vacuum value measured by the temperature sensor and the vacuum sensor of the measuring unit, a plurality of power buttons for applying the pre-power and the main power to the vacuum pump as well as the operation of the first heater and the second heater of the heating unit A control box consisting of; The control signal is applied to the first heater, the second heater, and the vacuum pump according to the measurement signals mounted in the control box and input from the temperature sensor and the vacuum sensor of the measurement unit, and set reference values for the temperature and the vacuum value. And a control unit, the control unit being configured to enable pre-heating of the first heater and the second heater to a predetermined temperature, respectively, when preliminary power is applied from the control box.

The vaporization path is configured to extend in the longitudinal direction having a front and rear width.

And a quartz tube detachably coupled inside the connection passage interconnecting the vaporization furnace and the decomposition furnace, wherein the quartz tube forms a hook end extending in the shape of a fallopian tube.

The vaporization furnace constitutes an inlet which is provided on one side of the vaporization furnace and a lid member in which a heating wire is built in is formed so that replacement and coupling of the quartz tube can be easily performed.

In another aspect, the present invention may further comprise a cooling fan installed on one side of the vaporization furnace of the heating unit and blown toward the first heater to cool the vaporization furnace.

The control unit is configured to maintain a cooling state by applying a control signal for changing the operation state to the cooling fan when a signal indicating the operation stop of the equipment at the end of the operation while the vacuum value of the deposition chamber is dropped.

The control unit applies a control signal for changing the cooling fan to an operation stop state when a signal for shortly pressing the stop button of the power button of the control box is input, and a signal for long pressing the stop button of the power button of the control box is input. When the cooling fan is applied to the control signal for changing to the restart state is made to set the cooling rate by the cooling fan manually.

The second heater of the decomposition furnace forms a gentle curve, and the “∪” shape is repeatedly zigzag and bent.

The filter trap is formed of a sponge in contact with a trap tube connected to form a passage in which internal communication is possible between the deposition chamber and the vacuum pump, and a monomer contained in the trap tube and moved from the deposition chamber. It is made of a filter member formed of a mesh.

The trap tube of the filter trap may include a first trap tube connected to one side of the deposition chamber, a second trap tube coupled to one end of the first trap tube and connected to the vacuum pump, and the first trap tube connected to the vacuum pump. It consists of a clamp member for connecting the trap pipe and the second trap pipe.

The filter member of the filter trap is provided in the first trap tube and is formed in the first inductively induced deposition, and the inside of the second trap tube and passed through the first filter member. And a second filter member which is formed to induce deposition deposition secondary to the monomer.

The filter member is composed of a material selected from polyethylene, polypropylene, polyether, and polyester, but the density of the first filter member is 20 to 30 ppi and the density of the second filter member is 40 to 60 ppi.

The control unit obtains replacement information for consumables for each of the components of the heating unit, the vacuum deposition unit, and the filter trap, and applies a control signal to restart the equipment according to the operator's input signal.

The control unit applies a control signal for changing the operating state to the first heater when the input signal of the preliminary power is applied from the control box to maintain the vaporization furnace at 30-80 ° C., which is a preheating set temperature. A control signal for changing to the operating state is also applied to the second heater to maintain the decomposition furnace at 100-600 ° C., which is a preheating set temperature.

In the control unit, when the input signal of the main power is applied from the control box in the preheating state, the vacuum pump operates, but when the measured value input from the vacuum sensor is less than or equal to a set value (10 to 100 mtorr), the second heater and the first heating unit. And a control signal operating in a heated state is sequentially applied. When the temperature of the decomposition furnace by the second heater input from the temperature sensor reaches a set value (500 to 700 ° C.) or more, the first heating is performed. The controller maintains the elevated temperature by applying a control signal that operates the heating state.

And the room temperature chemical vapor deposition apparatus management system for high-speed deposition having a tubular filter trap according to the present invention is mounted to be connected to the control unit of the room temperature chemical vapor deposition apparatus for high-speed deposition having a tubular filter trap for the temperature and vacuum value input from the measurement unit An affiliate server comprising a reader module for acquiring driving information of a facility input to the controller, including measurement information, and an interface provided to connect the reader module to a computer communication network; And a main server configured to receive measurement information and driving information obtained from the affiliated server in real time through a computer communication network, and to transmit the operating conditions of a device including a setting reference value to the affiliated server to be remotely controlled.

Between the affiliated server and the main server, a fixed type dynamic IP method of assigning a unique resource locator (URL) through a dynamic domain name service (DDNS) configuration of a router is used.

The main server has a storage medium and is configured to be output on a monitor, and a high-temperature deposition chemical vapor deposition apparatus having a tubular filter trap from the affiliate server provided on the storage medium of the main body and a plurality of affiliate stores And a control program configured to receive the individual measurement information and the driving information on the monitor and output them on the monitor, and to transmit control signals for setting reference values of the affiliate server and operating conditions of the apparatus.

The control program receives a signal from the affiliate server and stores information on each store in the affiliated store "store name, equipment status and vacuum status, processing elapsed time, vaporization furnace temperature and decomposition furnace temperature, vacuum value, contact point, temperature and vacuum degree communication. And a main screen window which is provided to collectively output on one screen of the monitor for each separated list such as "status display", and to output on the screen of the monitor so that detailed information for each list of the main screen window can be checked. Configure the detail screen window.

The main screen window includes an additional function tab configured to perform additional functions. The additional function tab includes a monitor stop tab for disconnecting whether data is transmitted or received, and a setting condition for data reception amount. It includes a setting tab, a list management tab for monitoring work status of each store, and an alarm tab for transmitting an alarm and a text message when an equipment error occurs.

The detail screen window comprises an information screen related to the "working state of the vaporization furnace and decomposition furnace, the deposition chamber", including the "current operation state" of the equipment for the store when selecting the "store name" from the list of the main screen window However, the screen window of the monitor consists of four divided screens.

Selecting the "presence operation state" from the list of the detail screen window is configured to set whether or not to "check the working status and change the equipment control conditions" of the store.

In addition, the present invention is provided to be downloaded to the storage medium of the mobile terminal and configured to check the operation status and operation status of the equipment by transmitting and receiving information in real time online through the communication connected to the control program of the main server on the network. It is also possible to further comprise a mobile application program.

The mobile application program is installed on the terminal of the head office manager and is always configured to receive the operation status information of each store equipment controlled by the control program of the main server and configured to be able to send a text message about the abnormal information of the equipment Characters related to the presence or absence of an abnormality received from the main application program can be received by the application program, the operation status of the corresponding store equipment installed in the terminal of the merchant owner or manager of the store and controlled by the control program of the main server. It consists of a member application program is configured to be able to check the message.

And the room temperature chemical vapor deposition method for high-speed deposition having a tubular filter trap according to the present invention is the first vaporization furnace and decomposition furnace to form a coating film for waterproofing, insulating or discoloration by polymerizing the chemical vapor deposition material on the surface of the adherend Room temperature chemical vapor deposition method for vaporizing and decomposing chemical vapor deposition material by heating from a heater and a second heater, and depositing a monomer, which is chemical vapor deposition material, to a deposition agent located in the deposition chamber while maintaining a vacuum inside the deposition chamber from a vacuum pump. In the preliminary power supply from the control box to operate the first heater and the second heater and the temperature of the vaporization furnace and the decomposition furnace to measure the temperature from the temperature sensor, respectively, the preheating to a predetermined set temperature on the control unit Preheating to maintain after; Operating a main power source from the control box while the vaporization furnace and the decomposition furnace are preheated to operate the vacuum pump to generate a vacuum while measuring a vacuum from a vacuum sensor in the deposition chamber; Operating the first heater and the second heater when the vacuum value of the deposition chamber is equal to or lower than a set value input to the controller, and heating the vaporization furnace and the decomposition furnace to a temperature capable of chemical vapor deposition, respectively; ; And cooling the heat of the elevated temperature of the vaporization furnace and the decomposition furnace to the set temperature in the preheating step after the operation is completed in the deposition chamber.

In the preheating step, the set temperature of the vaporization furnace is heated to maintain 30 to 80 ° C., and the set temperature of the decomposition furnace is heated to maintain 100 to 600 ° C.

In the temperature heating step, the first heater and the second heater are sequentially operated only when the vacuum value in the deposition chamber by the vacuum pump is 10 to 100 mtorr or less, and the control unit applies a control signal to the second heater. First heating the decomposing furnace to a working temperature of 650 ~ 700 ℃, and when the temperature of the decomposition furnace reaches a set value (500 ~ 700 ℃) or more, the control unit applies a control signal to the first heater The vaporization furnace is configured to heat the secondary temperature rise to 120 ~ 180 ℃ working temperature.

According to the present invention, a room temperature chemical vapor deposition apparatus having a tubular filter trap according to the present invention, a remote control system, and a deposition method thereof constitute a tubular filter trap instead of a cooler, thereby lowering the manufacturing cost of the equipment and improving the price competitiveness and improving the equipment. It is possible to reduce the economic burden by reducing the cost of maintenance. Furthermore, with the tubular filter trap, the overall volume of the gasification furnace and the decomposition furnace can be reduced to be widely used in general types of stores, and the shops can meet the customer's work requirements (waterproof, insulation, or discoloration coating film, etc.). Respond promptly to gain economic benefits and increase the quality of services.

In addition, the room temperature chemical vapor deposition apparatus having a tubular filter trap according to the present invention, the remote control system, and the deposition method thereof separately set a preliminary power supply and a main power supply, and maintain the preheating state at a temperature immediately before the material chemical reaction by the preliminary power supply. Since it is configured to control, it can reduce the work time of 1/3 to 1/5 compared to the existing equipment, and can promote the continuous work progress and greatly increase the product productivity (5 to 7 times). Get

In addition, a room temperature chemical vapor deposition apparatus having a tubular filter trap according to the present invention, a remote control system and a method for the deposition thereof constitute a vacuum trap for depositing and depositing monomers from a filter member having a sponge-like mesh structure. It has the effect of improving productivity by extending the service life of the pump oil and the replacement period of the pump oil, and reducing the volumetric rate, thereby reducing the working time due to vacuum.

In addition, the room temperature chemical vapor deposition apparatus having a tubular filter trap according to the present invention, and the remote control system and its deposition method comprises the first filter member and the second filter member to induce deposition deposition of the double structure In addition, it is possible to maintain the performance of the vacuum pump and improve the vacuum efficiency by two deposition deposition operations. Furthermore, all the filter members are made of a flexible material, so that cleaning and replacement work are very simple.

In addition, a room temperature chemical vapor deposition apparatus having a tubular filter trap according to the present invention, a remote control system and a deposition method thereof have a vacuum value of a deposition chamber with a time difference of reaching a predetermined set temperature for a vaporization furnace and a decomposition furnace. Since the control conditions are controlled to match, there is an effect that can significantly improve the coating quality by preventing overshooting in advance.

In addition, the room temperature chemical vapor deposition apparatus for high-speed deposition having a tubular filter trap according to the present invention, and the remote control system and its deposition method are cooling fans to adjust the cooling temperature of the vaporization furnace after the operation to maintain the cooling temperature of the decomposition furnace constant Since it is configured to achieve a smooth continuous operation in accordance with the time difference of the mutual cooling temperature between the vaporization furnace and the decomposition furnace has an effect that can further improve the productivity of the product.

In addition, the room temperature chemical vapor deposition apparatus having a tubular filter trap according to the present invention, the remote control system, and the deposition method thereof can simultaneously transmit and receive individual various state information from the head office to a plurality of deposition apparatuses provided in each affiliated store. Since it is configured so that the facility can be easily controlled by the general manager of the affiliated store, the management of the facility can be facilitated by the head office, and the maintenance is easy and the performance of the facility can be continuously maintained.

1 is a front view showing an embodiment of a room temperature chemical vapor deposition apparatus according to the present invention.

Figure 2 is a plan view showing an embodiment of a room temperature chemical vapor deposition apparatus according to the present invention.

Figure 3 is a block diagram showing an embodiment of a room temperature chemical vapor deposition apparatus according to the present invention.

Figure 4 is a partial cross-sectional view showing a bonding state of the quartz tube in one embodiment of the room temperature chemical vapor deposition apparatus according to the present invention.

Figure 5 is a partially enlarged view showing another embodiment of the heating unit in one embodiment of a room temperature chemical vapor deposition apparatus according to the present invention.

Figure 6 is an enlarged cross-sectional view showing a filter trap in one embodiment of a room temperature chemical vapor deposition apparatus according to the present invention.

7 is a conceptual diagram schematically showing an embodiment of a room temperature chemical vapor deposition apparatus remote control system according to the present invention.

Figure 8 is a block diagram schematically showing an embodiment of a room temperature chemical vapor deposition apparatus remote control system according to the present invention.

Figure 9 is an exemplary view showing a main screen window in the room temperature chemical vapor deposition apparatus remote control system according to the present invention.

10 to 12 are each an exemplary view showing a screen state by the selection of the additional function tab in the room temperature chemical vapor deposition apparatus remote control system according to the present invention.

13 to 14 are each an exemplary view showing a detailed screen window in the room temperature chemical vapor deposition apparatus remote control system according to the present invention.

15 is a conceptual diagram schematically showing another embodiment of a room temperature chemical vapor deposition apparatus remote control system according to the present invention.

16 is a block diagram showing an embodiment of a room temperature chemical vapor deposition method according to the present invention.

According to the present invention, a vaporization furnace in which a first heater is installed to inject a dimer material, which is a chemical vapor deposition raw material, into a polymer dimer, and a polymer state connected to one side of the vaporization furnace may be supplied. A heating unit comprising a decomposition furnace in which a second heater is installed to decompose the dimer into monomers having a monomolecular form; It is connected to one side by the decomposition of the heating unit is provided to accommodate the adherend therein to form a deposition space by vacuum so that the monomeric monomer in the form of gas supplied from the decomposition furnace can be deposited on the surface of the adherend A vacuum deposition unit comprising a deposition chamber and a vacuum pump provided to generate a vacuum in the deposition chamber; A filter trap coupled to the vacuum pump and the deposition chamber in the vacuum deposition unit, the filter trap being configured to deposit and deposit excess monomers generated during the vacuum generation process and the deposition process according to the vacuum pump; A temperature sensor provided in each of the vaporization furnace and the decomposition furnace, the temperature sensor being provided to measure individual temperatures, and a vacuum sensor installed in the deposition chamber and capable of measuring a vacuum value generated from the vacuum pump; Wealth; A display window for displaying the temperature and the vacuum value measured by the temperature sensor and the vacuum sensor of the measuring unit, a plurality of power buttons for applying the pre-power and the main power to the vacuum pump as well as the operation of the first heater and the second heater of the heating unit A control box consisting of; The control signal is applied to the first heater, the second heater, and the vacuum pump according to the measurement signals mounted in the control box and input from the temperature sensor and the vacuum sensor of the measurement unit, and set reference values for the temperature and the vacuum value. And a control unit, wherein the control unit includes a tubular filter trap configured to preheat the first heater and the second heater to a set temperature, respectively, and to maintain a preheating state when pre-power is applied from the control box. Room temperature chemical vapor deposition apparatus for high-speed deposition having a feature of the technical configuration.

In addition, the vaporization furnace is characterized by the technical configuration of a room temperature chemical vapor deposition apparatus having a tubular filter trap extending in the longitudinal direction having a front and rear width.

In addition, the high-temperature chemical vapor deposition apparatus having a tubular filter trap comprising a quartz tube detachably coupled to the interior of the connecting passage interconnecting the vaporization furnace and the decomposition furnace is characterized in the technical configuration.

In addition, the quartz tube is characterized by a technical configuration of a room temperature chemical vapor deposition apparatus for a high-speed deposition having a tubular filter trap including a hook end formed on one side to form a fallopian tube.

In addition, the vaporization furnace at room temperature for high-speed deposition having a tubular filter trap including an inlet is provided on one side of the vaporization furnace and the lid member is formed on the inner side to facilitate the replacement coupling of the quartz tube easily The chemical vapor deposition apparatus is characterized by a technical configuration.

In another aspect, the present invention provides a room temperature chemical vapor deposition apparatus for high-speed deposition having a tubular filter trap further includes a cooling fan installed on one side of the gasification furnace of the heating unit and blown toward the first heater to cool the gasification furnace. It is characterized by the technical configuration.

In addition, the control unit applies a control signal for changing the operation state to the cooling fan when a signal indicating the operation stop of the equipment according to the end of the vacuum chamber of the deposition chamber is applied to the tubular filter trap to maintain the cooling state A high temperature vapor deposition chemical vapor deposition apparatus having the characteristics of the technical configuration.

In addition, the control unit applies a control signal for changing the cooling fan to an operation stop state when a signal for shortly pressing the stop button of the power button of the control box is input, and a signal for long pressing the stop button of the power button of the control box is A technical configuration of a high-temperature deposition apparatus for high-speed deposition having a tubular filter trap configured to manually set a cooling rate by the cooling fan by applying a control signal to change the cooling fan to a restart state when inputted is a technical feature.

In addition, the second heater of the decomposition furnace is characterized by a technical configuration of a room temperature chemical vapor deposition apparatus for a high-speed deposition having a tubular filter trap that is formed in a gentle curved curve, and the "∪" shape is repeatedly zigzag.

In addition, the filter trap may be trapped in contact with the trap tube connected to form an internally interconnected passage between the deposition chamber and the vacuum pump, and the monomer contained in the trap tube and moved from the deposition chamber to form a sponge. A room temperature chemical vapor deposition apparatus having a tubular filter trap including a filter member formed of a mesh of the present invention is characterized by a technical configuration.

In addition, the trap tube of the filter trap is a first trap tube is connected to one side of the deposition chamber, a second trap tube is fastened to one end of the first trap tube and connected to the vacuum pump, and the first A high temperature vapor deposition chemical vapor deposition apparatus having a tubular filter trap including a first trap tube and a clamp member interconnecting the second trap tube is characterized by a technical configuration.

The filter member of the filter trap may include a first filter member provided inside the first trap tube and formed to induce deposition deposition first, and an inside of the second trap tube to provide the first filter member. A high temperature vapor deposition chemical vapor deposition apparatus having a tubular filter trap including a second filter member formed to induce deposition deposition on a coarse monomer in a secondary manner is characterized by a technical configuration.

In addition, the filter member is composed of a material selected from polyethylene, polypropylene, polyether, polyester, wherein the first filter member has a density of 20 to 30 ppi and the second filter member has a density of 40 to 60 ppi. A high temperature chemical vapor deposition apparatus having a trap is characterized by a technical configuration.

In addition, the control unit obtains the replacement information for the consumables for each of the components of the heating unit, vacuum deposition unit, and filter trap, and has a tubular filter trap for applying a control signal to restart the equipment according to the operator's input signal. The chemical vapor deposition apparatus is characterized by a technical configuration.

In addition, when the input signal of the preliminary power is applied from the control box, the control unit applies a control signal for changing the operating state to the first heater to maintain the vaporization furnace at 30 to 80 ° C., which is a preheating set temperature. A high temperature deposition chemical vapor deposition apparatus having a tubular filter trap for applying a control signal for changing the operating state to the second heater so as to keep the decomposition furnace heated to 100 to 600 ° C., which is a preheating set temperature, as a technical feature. do.

In the control unit, when the input signal of the main power is applied from the control box in the preheating state, the vacuum pump is operated, but if the measured value input from the vacuum sensor is less than or equal to a set value (10 to 100 mtorr), the second heater and the first heater. A control signal operating in a heated state is sequentially applied to the heater, and when the temperature of the decomposition furnace by the second heater input from the temperature sensor reaches a set value (500 to 700 ° C.) or more, the first A technical configuration of a high-temperature deposition room temperature chemical vapor deposition apparatus having a tubular filter trap that maintains a elevated temperature by applying a control signal for operating the heater in a heated state is a feature of the technical configuration.

In addition, the present invention is mounted to connect to the control unit of the room temperature chemical vapor deposition apparatus for high-speed deposition having a tubular filter trap to obtain the drive information of the equipment input to the control unit, including the measurement information on the temperature and vacuum value input from the measurement unit An affiliate server comprising a reader module and an interface provided such that the reader module can be connected to a computer communication network; A main server configured to receive measurement information and driving information obtained from the affiliated server in real time through a computer communication network, and to transmit the operating conditions of a device including a setting reference value to the affiliated server to be remotely controlled. It is characterized by the technical configuration of the room temperature chemical vapor deposition apparatus remote control system having a high speed deposition.

In addition, between the affiliate server and the main server, room temperature chemistry for high-speed deposition with a tubular filter trap using a fixed-type floating IP method that assigns a unique URL (uniform resource locator) through a dynamic domain name service (DDNS) configuration of the router. The evaporation device remote control system is characterized by a technical configuration.

In addition, the main server is provided with a storage medium and configured to be output on the monitor, the room temperature chemical vapor deposition for high-speed deposition having a tubular filter trap from the affiliated server provided on the storage medium of the main body portion and a plurality of affiliated stores And a tubular filter trap comprising a control program configured to receive individual measurement information and driving information of a device and output the same on the monitor, wherein the control program is configured to transmit control signals for setting reference values of the affiliate server and operating conditions of the device. The room temperature chemical vapor deposition device remote control system for high speed deposition is characterized by the technical configuration.

In addition, the control program receives the signal from the affiliate server, and stores the information of each store in the affiliated store name, equipment status and vacuum status, processing elapsed time, vaporization furnace temperature and decomposition furnace temperature, vacuum value, contact point, temperature and vacuum degree. Main screen window which is provided to collectively output on one screen of the monitor for each divided list such as "communication status display", and to output on the screen of the monitor so that detailed information for each list of the main screen window can be checked. Features of the technical configuration of a room temperature chemical vapor deposition apparatus remote control system for a high-speed deposition having a tubular filter trap including a detailed screen window.

In addition, the main screen window includes an additional function tab configured to perform additional functions, and the additional function tab includes a monitor stop tab for disconnecting whether data is transmitted and received, and setting conditions for data reception amount. The high-temperature chemical vapor deposition apparatus remote control system has a tubular filter trap that includes a setting tab, a list management tab for monitoring work status of each store, and an alarm tap for alarm occurrence and text message in case of equipment failure. It is characterized by the configuration.

In addition, the detail screen window, if you select the "store name" of the list of the main screen window, the information screen related to the "working state of the vaporization furnace, decomposition furnace, deposition chamber", including the "current operation state" of the equipment for the store It is characterized by a technical configuration of a room temperature chemical vapor deposition apparatus remote control system for high-speed deposition having a tubular filter trap configured to consist of four split screens on the screen of the monitor.

In addition, by selecting the "current operating state" from the list of the detailed screen window, the room temperature chemical vapor deposition apparatus for high-speed deposition having a tubular filter trap configured to set whether or not to "check the working status and change the equipment control conditions" of the store The control system is characterized by the technical configuration.

In addition, the present invention is provided to be downloaded to the storage medium of the mobile terminal and configured to check the operation status and operation status of the equipment by transmitting and receiving information in real time online through the communication connected to the control program of the main server on the network. Features of the technical configuration of the room temperature chemical vapor deposition apparatus remote control system for high-speed deposition having a tubular filter trap further comprising a mobile application program.

In addition, the mobile application program is installed on the terminal of the head office manager and is configured to receive the operation status information of each store equipment controlled by the control program of the main server at all times and to send a text message about the abnormal information of the equipment Receives the application status of the application and the operation status of the corresponding store equipment installed on the terminal of the merchant owner or the person in charge of the store and controlled by the control program of the main server and related to abnormality received from the main application program. A technical configuration of a room temperature chemical vapor deposition apparatus remote control system for high-speed deposition having a tubular filter trap including an affiliated application program configured to identify a text message is a feature of the technical configuration.

In addition, the present invention is to vaporize the chemical vapor deposition material by heating the vaporization furnace and decomposition furnace from the first and second heaters in order to polymerize the chemical vapor deposition material on the surface of the adherend to form a coating film for waterproofing, insulation or discoloration prevention In the normal temperature chemical vapor deposition method of decomposing and maintaining the inside of the deposition chamber from a vacuum pump in a vacuum state, and depositing a monomer, which is a chemical vapor deposition material, to an adherent located in the deposition chamber, by operating a preliminary power source from a control box. Operating a heater and the second heater, and measuring the temperatures of the vaporization furnace and the decomposition furnace from a temperature sensor, respectively, preheating the preheater to a predetermined temperature on a control unit and maintaining the same; Operating a main power source from the control box while the vaporization furnace and the decomposition furnace are preheated to operate the vacuum pump to generate a vacuum while measuring a vacuum from a vacuum sensor in the deposition chamber; Operating the first heater and the second heater when the vacuum value of the deposition chamber is equal to or lower than a set value input to the controller, and heating the vaporization furnace and the decomposition furnace to a temperature capable of chemical vapor deposition, respectively; ; Cooling the heat of the elevated temperature of the vaporization furnace and the decomposition furnace after the operation in the deposition chamber to the set temperature in the preheating step; Room temperature chemical vapor deposition for high-speed deposition having a tubular filter trap including a The method is characterized by the technical configuration.

Next, a preferred embodiment of a room temperature chemical vapor deposition apparatus having a tubular filter trap according to the present invention will be described in detail with reference to the drawings.

First, one embodiment of the high-temperature chemical vapor deposition apparatus having a tubular filter trap according to the present invention, as shown in Figures 1 to 3, the heating unit 10, the vacuum deposition unit 20, and the filter trap ( 30), the measuring unit 40, the control box 50, and the control unit 60 are included.

The overall configuration of the present invention (heating unit 10, vacuum deposition unit 20, etc.) is a structure that is connected to each other by a passage inside each other in communication with each other outside to accommodate all the configurations of the present invention to protect from the outside It is preferable to comprise the case 5 which has a function which can be provided.

The heating unit 10 is to perform a function of heating twice to form a monomer in a state capable of depositing a chemical vapor deposition material on the adherend, it is composed of a vaporization furnace 11 and a decomposition furnace (13).

The vaporization furnace 11 is provided so that the chemical vapor deposition material to be deposited on various kinds of adherend for the first time, it is formed to be able to input the dimer material of the chemical vapor deposition material therein.

The vaporization furnace 11 has a structure in which the internal space can be heated to vaporize the dimer material introduced therein into a polymer dimer, but the first heater 12 is installed inside to provide a temperature in the vaporization furnace 11. It is configured to raise the.

The vaporization furnace 11 is formed to extend to a predetermined length so that a dimer material is introduced into the vaporization furnace 11 so as to form a predetermined volume of space that can be heated from the heat source of the first heater 12.

The vaporization furnace 11 is configured to extend in the longitudinal direction, the length of which has a front and rear width. That is, the overall length of the vaporization furnace 11 extends toward the front and rear width directions based on the left and right longitudinal directions in which the general configuration (heating unit 10, vacuum deposition unit 20, etc.) of the present invention are sequentially arranged. It is configured to achieve.

When the vaporization furnace 11 is configured to extend in the longitudinal direction having the length before and after the width as described above, it is possible to reduce the volume of the overall installation compared to the conventional installation installed to extend in the left and right longitudinal direction.

As shown in FIG. 4, the connection passage 15 interconnecting the vaporization furnace 11 and the decomposition furnace 13 includes a quartz tube 16 that is detachably inserted and installed therein. .

The quartz tube 16 has a pipe shape and is configured to have a transparent shape as a whole.

The quartz tube 16 is formed to extend toward the extended longitudinal direction of the decomposition furnace 13, and has a locking end 17 so that one end forms a fallopian tube shape and extends outward. That is, the locking end 17 is formed to be caught on one end of the gas passage 11 inside the connection passage 15 when engaging the quartz tube 16 toward the connection passage 15. .

When the quartz tube 16 having the locking end 17 is configured as described above, it is possible to prevent the separation of the position when the vacuum is applied or released, and the internal pipe of the second heater 14 of the decomposition furnace 13 can be prevented. Exactly matched with the inlet, there is no gap between the vaporization furnace 11 and the quartz tube 16 to prevent external spillage of the vaporized gas, and all vaporized gas is moved only inside the quartz tube 16 to significantly improve the efficiency of coating quality. It is possible to raise.

In the vaporization furnace 11 is provided with an inlet port (19) is provided on one side of the vaporization furnace 11 and the lid member 19 is provided with a heating wire inside so that the replacement coupling of the quartz tube 16 can be easily made ( 18).

When the inlet 18 is configured as described above, it is possible to facilitate smooth replacement from the difficult replacement problem of the quartz tube 16 as the vaporization furnace 11 extends in the longitudinal direction of the front and rear widths.

As shown in FIG. 5, the present invention is installed at one side of the vaporization furnace 11 of the heating unit 10 and blows toward the first heater 12 to enable cooling of the vaporization furnace 11. It further comprises a cooling fan (70).

The cooling fan 70 cools the vaporization furnace 11 and performs a function of matching the cooling rate and timing of the decomposition furnace 13. That is, the cooling fan 70 is the decomposition furnace heated from the second heater 14 that is relatively higher than the temperature (60 ~ 200 ℃) of the vaporization furnace 11 heated from the first heater 12 ( Since the temperature lowering speed with respect to the temperature (500 ~ 700 ℃) of 13) proceeds faster, the decomposition furnace by the vaporization furnace 11 and the second heater 14 by the first heater 12 ( It is configured to forcibly cool the vaporization furnace 11 to the first heater 12 from the cooling fan 70 to adjust the temperature drop rate to the same time zone up to the preheating temperature of 13).

The cooling fan 70 is controlled according to the signal of the controller 60. That is, the control unit 60 applies a control signal for changing the operation state to the cooling fan 70 when a signal indicating the stop of operation of the equipment at the end of the operation is input while the vacuum value of the deposition chamber 21 drops. It is made to maintain a cooling state.

As described above, when the cooling fan 70 forcibly cooling toward the first heater 12 of the vaporization furnace 11 is configured, the preheating temperature (100 to 600 ° C.) of the second heater 14 is maintained at room temperature cooling. Eliminates the time difference (usually 2 ~ 3 times) between falling time and falling time to the preheating temperature (30 ~ 80 ℃) of the first heater 12, thus preventing work delays and at the same time smoothing continuous products It is possible to further improve productivity.

In addition, the cooling fan 70 may be configured to be controlled manually from the signal of the control unit 60 according to the button operation of the control box 50.

The control unit 60 applies a control signal for changing the cooling fan 70 to an operation stop state when a signal for shortly pressing the stop button of the power button 53 of the control box 50 is input, and the control box When a signal for long pressing the stop button of the power button 53 of 50 is inputted, a cooling signal by the cooling fan 70 is manually set by applying a control signal for changing the cooling fan 70 into a restarting state. Configure it to be.

When the cooling fan 70 is configured to be manually controlled as described above, it is possible to flexibly control the cooling rate of the first heater 12 in accordance with the cooling rate of the second heater 14 from the influence of the season or the ambient temperature. It is possible.

The decomposition furnace 13 is located on one side of the vaporization furnace 11 is connected so as to communicate with the interior of the vaporization furnace 11 is installed so that the dimer vaporized in the polymer state in the vaporization furnace 11 can be supplied. do.

The decomposition furnace 13 is provided with a second heater 14 to heat the inner space supplied with the dimer. That is, the decomposition furnace 13 is configured to generate heat from the second heater 14 so as to decompose the polymer dimer into monomers in the form of a single molecule.

The second heater 14 of the decomposition furnace 13 forms a gentle curve and is formed such that the "∪" shape is repeatedly zigzag to form a curved structure.

When the second heater 14 having a curved structure is formed as a gentle curve as described above, the length of the decomposition furnace 13 may be reduced in correspondence to the curved volume of the second heater 14, and thus the overall structure of the second heater 14 may be reduced. It is possible to reduce the volume of the equipment and at the same time maintain the internal stagnation time, thus maintaining high working performance.

The vacuum deposition unit 20 is configured to be coated on the adherend from the raw material supplied in the monomer state from the heating unit 10, and is composed of a deposition chamber 21 and a vacuum pump 23.

The deposition chamber 21 is connected to the structure in which the interior is in communication with each other on one side of the decomposition furnace (13).

The deposition chamber 21 has a deposition space in which the deposition operation by the monomer supplied from the decomposition furnace 13 can be performed. That is, the deposition chamber 21 is provided to accommodate the adherend therein and forms a deposition space by vacuum so that the monomeric monomer in the form of gas supplied from the decomposition furnace 13 can be deposited on the surface of the adherend. do.

The deposition space of the deposition chamber 21 has a structure in which all sides are sealed to generate a vacuum through the vacuum pump 23, and the coating deposition by vacuum is formed on the surface of the adherend.

The vacuum pump 23 is provided at one side of the deposition chamber 21 to generate a vacuum in the deposition chamber 21.

As shown in FIG. 1, the filter trap 30 is coupled to the vacuum pump 23 and the deposition chamber 21 to be connected to each other. That is, the filter trap 30 is formed to form a passage in which the vacuum pump 23 and the deposition chamber 21 communicate with each other.

As shown in FIGS. 1 and 6, the filter trap 30 is configured to deposit and deposit extra monomers generated during the vacuum generation process and the deposition process according to the vacuum pump 23. 31) and the filter member 33.

The trap tube 31 is formed in a pipe tube shape and is connected between the deposition chamber 21 and the vacuum pump 23 so as to form a passage communicating with each other.

The trap tube 31 is coupled to one end of the first trap tube 31a and the first trap tube 31a connected to one side of the deposition chamber 21, and is disposed on the vacuum pump 23. The second trap pipe 31b to be connected and installed, and the clamp member 35 for connecting the first trap pipe 31a and the second trap pipe 31b to each other.

The first trap tube 31a is formed to extend in a small linear shape on the upper side of the upper portion of the deposition chamber 21, the second trap tube 31b is coupled to one end of the first trap tube 31a, The vacuum pump 23 is formed to extend in a gentle curved curve.

The first trap pipe 31a and the second trap pipe 31b are preferably configured to include a packing (not shown in the drawing) that can increase the sealing efficiency in contact with each other.

The clamp member 35 is provided with a tightening means 36 (bolts, screws, etc.) having a structure that can tighten or loosen while applying a bonding force to the first trap pipe (31a) and the second trap pipe (31b). . That is, the clamp member 35 fastens the first trap pipe 31a and the second trap pipe 31b integrally by the fastening means 36, but operates the first clamping means 36 to operate the first trap pipe 31a. It is comprised so that the trap pipe 31a and the said 2nd trap pipe 31b may be disassembled smoothly.

When the clamp member 35 is configured as described above, the trap tube 31 is easily disassembled, so that the separation or replacement operation for the cleaning of the filter member 33 is easy and the operation is easily performed.

The filter member 33 is inserted and accommodated in the trap tube 31, and is provided to deposit and deposit a monomer in contact with the monomer moved from the deposition chamber 21.

The filter member 33 is provided in the first trap tube 31a and is formed in the first filter member 33a which is formed to induce deposition of the first primary and the second trap tube 31b. And a second filter member 33b provided to induce deposition of secondary deposition on the monomer having passed through the first filter member 33a.

When the filter member 33 is configured to deposit and deposit the monomer twice in the above manner, it is possible to maintain and maintain the vacuum efficiency very easily.

The filter member 33 has a sponge-type mesh structure so that air can flow smoothly along the trap tube 31. That is, the filter member 33 forms a sponge-like mesh structure so as not to receive a large resistance to generate a vacuum in the deposition chamber 21 from the vacuum pump 23, but precipitates monomers from the filter member 33. Thousands of layers of sponges are in contact with each other.

The filter member 33 is made of a flexible material, but the material usable as the filter member 33 is made of a material selected from polyethylene, polypropylene, polyether, polyester, and sometimes thousands of layers of expensive price. It is also possible to use a thin threaded metal material, and the metal material can be used to remove the coating film, which has the advantage of reuse. The metal material should be a material that is inexpensive and easy to process in the form of a thread, such as iron, copper, aluminum, and stainless steel. In addition, by sintering the metal powder can be produced in a form containing fine pores can be used.

When the filter member 33 is all made of a flexible material as described above, it is possible to handle the cleaning and replacement of the filter member 33 very easily.

The second filter member 33b of the filter member 33 is formed to have a denser density than the first filter member 33a. That is, the density of the first filter member 33a is 20 to 30 ppi, and the density of the second filter member 33b is 40 to 60 ppi.

In the configuration of the filter member 33, only the first filter member 33a can be provided. That is, since the length of the first filter member 33a is extended by 2 to 5 times, the first filter member 33a may be configured instead of the second filter member 33b.

The measuring unit 40 is composed of a temperature sensor 41 for measuring the temperature of the heating unit 10, and a vacuum sensor 43 for measuring the vacuum value of the vacuum deposition unit 20.

The temperature sensor 41 is provided in the vaporization furnace 11 and the decomposition furnace 13, respectively, so as to be able to measure individual temperatures. That is, the temperature sensor 41 is installed on the vaporization furnace 11 to measure the internal temperature of the vaporization furnace 11 which is heated up from the first heater 12, and the temperature sensor 41 is the It is also provided on the cracking furnace 13, and it is comprised so that the internal temperature of the cracking furnace 13 heated up from the said 2nd heater 14 is measurable.

The temperature sensor 41 is preferably configured using a digital temperature sensor to effectively transmit or display the measurement signal to the control unit 60.

The vacuum sensor 43 is installed in the deposition chamber 21 and is formed to measure a vacuum value generated from the vacuum pump 23.

The vacuum sensor 43 is preferably configured using a digital pressure sensor for the same reason as the temperature measuring unit 40.

In the deposition chamber 21 in which the vacuum sensor 43 is mounted, a filtering means having the same shape as that of the filter member 33 is provided to prevent a phenomenon in which monomers are deposited on the vacuum sensor 43. It is preferable to comprise such a).

The control box 50 is configured to be linked to the control unit 60, and outputs the measurement signal input to the control unit 60 as well as configured to be controlled by the user.

As shown in FIG. 1, the control box 50 includes a display window 51 displaying the temperature and the vacuum value measured by the temperature sensor 41 and the vacuum sensor 43 of the measuring unit 40, respectively. The first heater 12 and the second heater 14 as well as a plurality of power buttons 53 for applying a drive signal to the vacuum pump 23.

The display window 51 is configured to display the temperature of the vaporization furnace 11 and the decomposition furnace 13 according to the first heater 12 and the second heater 14 separately. That is, the controller 60 receives the temperature measurement signal of the vaporization furnace 11 heated by the first heater 12 from the temperature sensor 41 and displays it on the display window 51. The control unit 60 receives the temperature measurement signal of the decomposition furnace 13 heated by the two heaters 14 from the temperature sensor 41 and configures the display unit 51 to be displayed on a separate display window 51.

The display window 51 displaying the measurement signal for the temperature applied to the temperature sensor 41 is configured to display a predetermined set temperature from the user together with the measured temperature input from the temperature sensor 41 in real time. It is preferable.

The plurality of power buttons 53 are primarily provided with a power button 53 for applying preliminary power to drive the preheating according to the first heater 12 and the second heater 14. The first heater 12 and the second heater 14, as well as the power button 53 for applying a main power to drive the vacuum pump 23 is provided separately.

It is also possible to configure a timer 55 in the control box 50 to set the input operation time.

The control unit 60 is mounted in the control box 50 and includes a first heater 12 provided in the vaporization furnace 11 and a second heater 14 provided in the decomposition furnace 13. Control by applying a control signal to the vacuum pump 23, respectively, is configured to apply the corresponding control signal divided according to the measurement signal input from the temperature sensor 41 and the vacuum sensor 43.

For example, the controller 60 determines whether the first heater 12 and the second heater 14 are driven according to the internal temperatures of the vaporization furnace 11 and the decomposition furnace 13. And controlling the driving of the vacuum pump 23 according to the internal vacuum value of the deposition chamber 21 according to the measurement signal of the vacuum sensor 43. .

The control unit 60 is provided to set the reference value for the temperature of each of the vaporization furnace 11 and the decomposition furnace 13, as well as to set the reference value for the vacuum value of the deposition chamber 21. .

The reference value of the control unit 60 is set to 60 ~ 200 ℃ in the case of the vaporization furnace 11 so that the temperature of the vaporization furnace 11 according to the heating of the first heater 12 is 60 ~ 200 ℃ The temperature of the decomposition furnace 13 in accordance with the heating of the second heater 14 by controlling to increase the temperature up to a set temperature in the range, in the case of the decomposition furnace 13 is set to 500 ~ 700 ℃. The temperature is controlled to be raised to the set temperature in the range of ℃. In addition, the deposition chamber 21 is set to 10 ~ 100mtorr to control the vacuum value by the vacuum pump 23 to reach a set value in the range of 10 ~ 100mtorr.

The control unit 60 obtains replacement information for consumables for each of the components of the heating unit 10, the vacuum deposition unit 20, and the filter trap 30, and generates a control signal to restart the equipment according to the input signal of the operator. Is authorized.

For example, the control unit 60 sets the related information of the replacement time or the cleaning time of the filter member 33 and the quartz tube 16, the pump oil or the rubber o-ring, etc. during the configuration of the overall equipment as a program. Set the replacement cycle according to the number of flashes of the timer (not shown in the drawing), the controller 60 flashes the corresponding lamp (not shown in the drawing) together with a warning alarm to notify the controller 60 of replacement of consumables, and after replacing the corresponding consumables. The control signal is applied to restart the equipment only when the operator presses a separate reset button.

When the preliminary power is applied from the control box 50, the controller 60 preheats the first heater 12 and the second heater 24 to a set temperature, respectively, but the vaporization furnace 11 and the decomposition are performed. With respect to the furnace 13, the temperature of the preheated state heated up from normal temperature is maintained so that control is possible.

The set temperature of the preheating state through the control unit 60 is the temperature just before the chemical reaction of the chemical vapor deposition material of the coating material occurs, the preheating set temperature of the vaporization furnace 11 is set to achieve 30 ~ 80 ℃ Preheating set temperature of the decomposition furnace 13 is set to achieve 100 ~ 600 ℃.

When the input signal of the preliminary power is applied from the control box 50, the control unit 60 applies a control signal for changing the operating state to the first heater 12 so that the vaporization furnace 11 is a preheating set temperature. Control to keep heating at 30 ~ 80 ℃.

In addition, when the input signal of the preliminary power is applied from the control box 50, the control unit 60 applies a control signal to the second heater 14 along with the first heater 12 to change the operating state to the The decomposition furnace 13 is controlled to maintain heating at 100 to 600 ° C., which is a preheating set temperature.

The control unit 60 controls the vacuum pump 23 to operate when an input signal of main power is applied from the control box 50 in the preheating state.

In the control unit 60, when the main power is applied by the operation of the power button 53 of the control box 50, the vacuum pump 23 is operated but at the same time as the operation of the vacuum pump 23, the first heater 12 ) And the operation of the second heater 14 to be paused, and when the measured value of the vacuum by the vacuum sensor 43 reaches the set value (10 to 100 mtorr or less) input to the controller 60, The first heater 12 and the second heater 14 is controlled to restart.

That is, the control unit 60 generates the deposition chamber 21 in a vacuum state by operating the vacuum pump 23, but the measurement value input from the vacuum sensor 43 is input to the control unit 60. If the value is 10 to 100 mtorr or less, the second heater 14 and the first heater 12 are controlled to maintain the elevated temperature by applying a control signal that operates in a heated state.

The control unit 60 controls the second heater 14 and the first heater 12 to be sequentially operated. That is, when the measured value of the deposition chamber 21 input from the vacuum sensor 43 reaches 10 to 100 mtorr, the controller 60 preferentially applies a heating operation signal to the second heater 14 to the decomposition furnace. When the temperature of (13) is raised and the temperature of the decomposition furnace 13 by the second heater 14 input from the temperature sensor 41 has reached a set value (500 to 700 ° C.) or more. A control signal for operating the first heater 12 in a heated state is applied to control the temperature of the vaporization furnace 11 to be raised.

As described above, when the vacuum value of the deposition chamber 21 by the vacuum pump 23 is 10 to 100 mtorr or less, when the second heater 14 and the first heater 12 are controlled to drive, the deposition chamber 21 It is possible to achieve the time to reach the lowest vacuum value in the c) and the optimum temperature for the vaporization furnace 11 and the decomposition furnace 13 in the same time zone, thereby reducing the working time.

In addition, when the vacuum value of the deposition chamber 21 by the vacuum pump 23 is 10 to 100 mtorr or less, when the second heater 14 and the first heater 12 are controlled to be driven sequentially, the second heater ( 14, the first heater 12 is heated up in a state where the temperature of the cracking furnace 13 does not reach the set value (500-700 ° C) due to a failure of the furnace or the ambient temperature, and the polymer is transferred to the cracking furnace 13. It is possible to prevent coating defects in any case because it prevents the coming phenomenon.

The first heater 12 is heated to increase the temperature so that the working temperature of the vaporization furnace 11 is 120 ~ 180 ℃. That is, the first heater 12 is heated up to achieve a working temperature of 120 ~ 180 ℃ starting from the temperature of 30 ~ 80 ℃ set to the preheating according to the initial startup of the vaporization furnace (11).

In addition, the second heater 14 is heated to raise the temperature so that the working temperature of the decomposition furnace 13 is 650 ~ 700 ℃. That is, the second heater 14 increases the temperature of the decomposition furnace 13 so as to achieve a working temperature of 650 to 700 ° C. starting from a temperature of 100 to 600 ° C. set to preheating according to the initial startup.

In the controller 60, when the vacuum value of the deposition chamber 21 reaches a set value of 10 to 100 mtorr or less, the second heater 14 is preferentially operated, and then the first heater 12 is continuously operated. To control. That is, the controller 60 operates the second heater 14 only when the temperature of the decomposition furnace 13 by the temperature sensor 41 reaches the set value (500 to 700 ° C.) or more. The heater 12 is operated to control the temperature to be raised from the temperature directly below 30 ~ 80 ℃.

In addition, the control unit 60 is configured to release the state of the preheating mode in which the first heater 12 and the second heater 14 are continuously maintained in the state where power is applied from the control box 50. It is also possible. That is, the first heater 12 and the second heater 14 is configured so that the pre-heating state can be released when a predetermined time elapses after the previous operation.

Furthermore, in the control unit 60, the temperature of the vaporization furnace 11 and the decomposition furnace 13, which are preheated for the second operation after the first deposition operation, falls to the temperature of the vaporization furnace 11 and is maintained for a predetermined time, and then the operation signal is applied again. If there is no, it can be configured to switch to the complete stop mode.

When the control unit 60 is controlled to switch to the work release and stop mode as described above, it is possible to cut off the power supply from the continuous maintenance of the pre-heating state to reduce the energy use.

That is, according to the high-temperature chemical vapor deposition apparatus having a tubular filter trap according to the present invention constituted as described above, since the tubular filter trap 30 is configured in place of the cooler, the production cost of the equipment is lowered to improve the price competitiveness and the equipment. It is possible to reduce the economic burden by reducing the cost of maintenance. Furthermore, by reducing the volume of the overall equipment according to the vaporization furnace 11 and the decomposition furnace 13 together with the tubular filter trap 30, it can be widely used in general types of stores and the like. It is possible to improve the quality of service as well as economic benefits by immediately responding to insulation or anti-tarnish coating film).

In addition, the present invention is configured to separate the preliminary power supply and the main power supply, but to maintain the preheating state at the temperature just before the material chemical reaction by the preliminary power supply, thereby reducing the work time of 1/3 to 1/5 compared to the existing equipment. In addition, it is possible to greatly increase the productivity of the product (5 to 7 times) by promoting continuous work progress.

In addition, the room temperature chemical vapor deposition apparatus having a tubular filter trap according to the present invention constitutes a filter trap 30 capable of depositing and depositing monomers from the filter member 33 having a sponge-like mesh structure. It is possible to improve productivity by extending the service life of the pump and the replacement period of the pump oil, and reducing the working volume due to the small volume ratio.

Next, a system for remotely controlling an embodiment of a room temperature chemical vapor deposition apparatus for high-speed deposition having a tubular filter trap according to the present invention configured as described above will be described.

One embodiment of a room temperature chemical vapor deposition apparatus remote control system for high-speed deposition having a tubular filter trap according to the present invention includes an affiliate server 100 and a main server 200 as shown in FIGS. 7 and 8. .

The affiliated server 100 is provided for each affiliated store having an associated structure from the head office, and is configured to be connected to the control unit 60 of the room temperature chemical vapor deposition apparatus having a tubular filter trap of the present invention.

The affiliate server 100 acquires the overall driving information of the equipment input to the control unit 60, including the signal of the measurement unit 40 provided to transmit the measurement signal to the control unit 60 (110) And, the reader module 110 is composed of an interface 120 provided to be connected to the computer communication network.

The leader module 110 and the interface 120, which are the components of the affiliate server 100, form a structure mounted in equipment forming a room temperature chemical vapor deposition apparatus having a tubular filter trap of the present invention.

The reader module 110 acquires measurement information on temperature and vacuum value input from the measurement unit 40. That is, the temperature of the heating unit 10 measured by the temperature sensor 41 of the measuring unit 40 is obtained through the control unit 60, and the vacuum measured by the vacuum sensor 43 of the measuring unit 40. The vacuum value of the vapor deposition part 20 is provided so that the said control part 60 may be acquired.

In addition to the information by the measuring unit 40, the reader module 110 acquires whether the facility is driven according to the operation information of the facility, that is, the operation of the power switch, or information related to the error of the facility, and further, the replacement or cleaning operation in the facility is performed. It is formed so as to obtain maintenance information on the necessary consumables (for example, the filter member 33, etc.).

The relevant information of the replacement time or the cleaning time of the filter member 33 of the facility is determined from the vacuum value transmitted from the vacuum sensor 43. In addition, since the failure of the vacuum sensor 43 or the poor vacuum value due to the poor sealing of the deposition chamber 21 and the like may lead to confusion of the replacement information, the control unit 60 sets the replacement cycle according to the number of timer operations. It is also possible to use a method of flashing the corresponding lamp to inform consumable replacement. Furthermore, to prevent operator error, the machine can be restarted only when the operator presses the reset button after replacing consumables.

The replacement cycle for the consumables may be applied to all items that need regular replacement or cleaning according to the production amount, such as quartz tube 16, pump oil, rubber o-ring, etc., in addition to the filter member 33.

The interface 120 is a communication connector that allows the reader module 110 to be connected to a computer communication network to enable the transmission and reception of information, which can be both wired and wireless, but uses a wireless interface as it transmits and receives information in connection with a plurality of affiliated stores. It is desirable to. That is, the mutual control method between the affiliate server 100 and the main server 200 is configured to apply a wireless remote transmission and reception method through the Internet that is used in each store of the head office and the affiliate store.

In the communication method between the head office and each affiliated store, that is, the affiliated server 100 and the main server 200, it is also possible to use a fixed IP system to connect a dedicated Internet to give a dedicated fixed IP for equipment of each affiliated store. Although it is more economical to use the floating IP to reduce the cost of using the leased line, in order to solve the problem of the communication error by changing the floating IP setting arbitrarily, the unique URL ( It is also possible to use a static floating IP scheme that imposes a uniform resource locator.

The main server 200 is provided at one head office that manages a plurality of affiliated stores and transmits and receives information to and from the affiliate server 100 through a computer communication network or remotely controls a facility through the affiliate server 100. do.

The main server 200 receives individual measurement information and driving information obtained from the affiliate server 100 in real time through a computer communication network, and provides the affiliate server 100 with operating conditions of a device including a setting reference value associated with a facility. It is configured to be remotely controlled by transmission, and comprises a main body 210 and a control program 220.

The main body 210 is a hardware element installed in the head office, provided with a storage medium therein, and has a monitor 215 to form a structure that can be output to the outside.

The control program 220 is stored on the storage medium of the main body 210 to be driven through the main body 210.

The control program 220 receives and outputs the individual measurement information and driving information for the high-temperature deposition chemical vapor deposition apparatus having a tubular filter trap from the affiliate server 100 for each of the plurality of affiliate stores and outputs them on the monitor 215. The control program 220 may be configured to transmit control signals for setting reference values of the affiliate server 100 and operating conditions of the apparatus.

The control program 220 receives the signal of the affiliate server 100, the main screen window 221 for outputting the total information of each store of the affiliated store on one screen as a whole, so that you can check the detailed information content A detailed screen window 225 is provided to output on the screen of the monitor 215.

The main screen window 221, as shown in Figure 9, and outputs the information for each store of the affiliated list by the store name, equipment state and vacuum state, processing elapsed time, vaporization furnace temperature and decomposition furnace temperature, vacuum A list of values, contacts, temperatures, and vacuums, such as an indication of communication status, is formed.

The display of the equipment state indicates whether it is in operation or not running, and in the case of the display of the vacuum state, the vacuum quality of the deposition chamber 21 is displayed. In addition, in the case of the processing elapsed time, the elapsed time since the installation of the equipment in the list of "Run Time" on the main screen window 221, the evaporation furnace 11 temperature and decomposition furnace 13 temperature is " 1st Temp "and" 2nd Temp "are displayed, but the present temperature and the set temperature can be checked together. In addition, the temperature and vacuum degree communication state is displayed to display each communication state with the temperature sensor 41 and the vacuum sensor 43 together with the color.

The main screen window 221 configures an additional function tab 223 capable of performing additional functions.

The additional function tab 223 is provided at an upper end of one side (right side in FIG. 9) of the main screen window 221, and the monitor stop tab 223a for disconnecting whether data is transmitted or received, and setting for data reception amount. A setting tab 223b for changing the condition, a list management tab 223c for monitoring work status of each store, and an alarm tab 223d for transmitting an alarm and a text message in the event of equipment failure.

If the user selects and clicks on the setting tab 223b, as shown in FIG. 10, the data monitoring interval is adjusted according to a network state during wireless Internet transmission and reception. That is, the screen window which can change the interval for monitoring the measurement information by the vacuum sensor 43 together with the interval for monitoring the measurement information by the temperature sensor 41 in the device is formed on the monitor 215.

When the setting tab 223b for adjusting the monitoring interval of data is configured as described above, it is possible to prevent the phenomenon of overloading in the process of transmitting and receiving data.

In addition, when the list management tab 223c is selected and clicked from the additional function tab 223, a screen window for checking the cumulative work time and cumulative work count for each equipment is output on the monitor 215 as shown in FIG. .

When the list management tab 223c configured to check the amount of work as described above, it is possible to smoothly check the replacement cycle for the consumables in the equipment, such as the filter member 33 at the head office as well as timely delivery to the person in charge of each store It is possible to do

In addition, when the alarm tab 223d is selected and clicked among the additional function tabs 223, a screen window for sending texts according to an abnormality of the device may be output on the monitor 215 as shown in FIG. In other words, the screen window by the alarm tab 223d may transmit a message related to the corresponding content for each temperature or vacuum value, but the message content may be used to selectively use a pre-stored message.

The detail screen window 225 is provided to output on the screen of the monitor 215 so that detailed information for each list of the main screen window 221 can be checked.

The detail screen window 225 is selected by clicking on the "store name" of the list of the main screen window 221, including the "current operation state" of the equipment for the store, "gasification furnace 11 and decomposition furnace ( 13), an information screen related to " the working state of the deposition chamber 21 "

As described above, the detail screen window 225 includes four divided screens on the screen window of the monitor 215. For example, a screen corresponding to the running state of the equipment is provided on the upper left side of the monitor 215, and the information on the temperature of the vaporization furnace 11 and the temperature of the decomposition furnace 13 is displayed on the monitor 215. It is provided at the lower left and right sides, respectively, and is configured to include information on the vacuum value of the deposition chamber 21 on the upper right side of the monitor 215.

The screen for the current operating state of the detail screen window 225 is provided to indicate the operation state for the job. That is, the detailed screen window 225 outputs the operation status so that the operation status can be checked step by step, and is displayed in five stages (work preparation, waiting, working, work completion, OFF).

The suspension operation state screen of the detail screen window 225 is provided so as to indicate the vacuum state from the information on the vacuum value, and outputs so that it can be displayed as a color change with the text. For example, if it is maintained within the set value in relation to the vacuum value of the deposition chamber 21, it is displayed as "GOOD" of green, and yellow "READY" when the operation is possible again at any time after cooling is completed or the temperature is raised. It is displayed as ", and if it is out of the setting value, it is displayed as red" BAD "and printed out.

In addition, the current running state screen of the detail screen window 225 is formed to be able to output the time to show in real time the elapsed time up to the present after the operation of the equipment with the set working time.

If the user selects and clicks the "current operating state" from the list of the detail screen window 225, as shown in FIG.

In order to determine the operation status in the above, the number of operating hours of the equipment as well as the temperature of the vaporization furnace 11 and the temperature of the decomposition furnace 13, the vacuum value of the deposition chamber 21 is displayed, and the reference value currently set in the equipment to check It is formed to be. Furthermore, it is preferable to set the period so as to grasp the daily operation status and to form a graph.

Changing the control conditions of the equipment together with the grasp of the working status in the above, as well as the working time set in the store, the reference set temperature of the vaporization furnace 11 and the decomposition furnace 13, the reference set vacuum value of the deposition chamber 21 It is formed to change the control conditions of the equipment according to.

For example, in changing and setting the reference set temperatures of the vaporization furnace 11 and the decomposition furnace 13, the preset heating temperature SV1 and the final arrival temperature SV2 are newly inputted and changed. In addition, in changing the reference vacuum setting value of the deposition chamber 21, the vacuum value setting ON indicating the start of the temperature rise of the second heater 14 in the decomposition furnace 13 and the vacuum value of the deposition chamber 21 are changed. Input the set value (OFF) which automatically stops the operation when it does not reach the set vacuum value within a certain time, and change the setting (SP1), and the vacuum value of the deposition chamber 21 does not reach the set vacuum value within the predetermined time. The setting value (SP2) is inputted by inputting an indication value (ON) at which an alarm is sounded and an indication value (OFF) which is automatically stopped when a vacuum failure occurs.

The screen for the working status of the vaporization furnace 11, decomposition furnace 13, and the deposition chamber 21 is formed so as to output the individual data values in digital numbers and graphs in real time.

In the case of the graph above, a red line indicating a lower limit line and an upper limit line of a control condition is output along with a blue line indicating a current temperature and a vacuum value.

And another embodiment of the room temperature chemical vapor deposition apparatus remote control system for high-speed deposition having a tubular filter trap according to the present invention is provided as a downloadable to the storage medium of the mobile terminal 3, as shown in FIG. It further comprises a mobile application program 300 configured to check the operation status and operation status of the equipment by transmitting and receiving information in real time online through the communication connected to the control program 220 on the network of the network 200) It is also possible.

The mobile terminal 3 is formed in a portable form, and maintains a connection state with the mobile application program 300 through a wired or wireless communication network such as mobile communication or the Internet, and is provided from the mobile application program 300. Information is displayed on a given display. For example, the mobile terminal 3 is a concept of collectively a terminal having a predetermined arithmetic function by providing a predetermined memory means such as a mobile phone, a smart phone, a PDA, and the like by mounting a predetermined microprocessor.

The mobile application program 300 appears in the form of a small icon on the screen of the mobile terminal 3 so that it can be selected by the user when downloaded and stored from the mobile terminal 3.

The mobile application program 300 is divided into the main application program 310 installed in the terminal of the head office manager, and the affiliated application program 320 installed in the terminal of the merchant owner or manager in charge of the store.

The main application program 310 is constantly receiving the operation status information of each store equipment controlled by the control program 220 of the main server 200 and the text message for the abnormal information of the equipment for the affiliated application It is configured to be sendable to the program 320.

The affiliated application program 320 can receive the operation status of the corresponding store equipment controlled by the control program 220 of the main server 200 so as to be able to check the status of abnormality received from the main application program 310 It is possible to check the text message related to the presence or absence.

In other words, according to the remote control system for a high temperature deposition chemical vapor deposition apparatus having a tubular filter trap according to the present invention configured as described above, it is possible to send and receive individual status information from the head office for a plurality of deposition apparatuses provided in a plurality of affiliated stores. Since it is possible to control the facility from the general manager of the affiliated store, it is possible to collectively manage the facility from the head office, so that it is easy to maintain and maintain the performance of the facility.

Next, in one embodiment of the room temperature chemical vapor deposition apparatus having a tubular filter trap according to the present invention constituted as described above, the high-speed vapor deposition having a tubular filter trap according to the present invention is a process that is deposited under the control of the controller An embodiment of a wearable room temperature chemical vapor deposition apparatus will be described with reference to FIG. 16.

First, the vaporization furnace 11 and the decomposition furnace 13 are first heater 12 and second heater 14 to polymerize chemical vapor deposition material on the surface of the adherend to form a coating film for waterproofing, insulation or discoloration prevention. To vaporize and decompose the chemical vapor deposition raw material, and to maintain the inside of the deposition chamber 21 in a vacuum state from the vacuum pump 23, depositing a monomer which is a chemical vapor deposition material toward an adherend located in the deposition chamber 21. In the room temperature chemical vapor deposition method, it comprises a preheating step (S10), a vacuum generation step (S20), a heating up step (S30), and a cooling step (S40).

In the preheating step (S10), since the first heater 12 and the second heater 14 are operated by operating a preliminary power source from the control box 50, the vaporization furnace 11 and the decomposition furnace 13 are operated. Preheat each.

The vaporization furnace 11 and the decomposition furnace 13 are each preheated to a predetermined set temperature on the controller 60 and then maintained for a predetermined time. That is, the set temperature of the vaporization furnace 11 is controlled to maintain 30 to 80 ° C., and the control unit 60 controls the set temperature of the decomposition furnace 13 to be maintained at 100 to 600 ° C. .

In the preheating by the first heater 12 and the second heater 14, the temperature of the vaporization furnace 11 and the decomposition furnace 13 is respectively measured from the temperature sensor 41 to control the controller 60. Since the measurement signal is transmitted to the preliminary heating temperature for the vaporization furnace 11 and the decomposition furnace 13 is controlled.

In the vacuum generation step (S20), when the vaporization furnace 11 and the decomposition furnace 13 are preheated and the main power is operated from the control box 50, the vacuum pump 23 is operated to the deposition chamber. A vacuum is created in 21.

The vacuum value of the deposition chamber 21 by the vacuum pump 23 is generated starting from 760torr at atmospheric pressure up to 10-30mtorr.

The vacuum value of the deposition chamber 21 measures the vacuum from the vacuum sensor 43, but the vacuum value measured from the vacuum sensor 43 is transmitted to the controller 60 and marked on the control box 50 at the same time. do.

In the temperature heating step (S30), the first heater 12 and the second heater 14 are operated in conjunction with each other, but the temperature of the vaporization furnace 11 and the decomposition furnace 13 to the temperature at which the chemical vapor deposition is possible, respectively. Heat as possible.

The first heater 12 and the second heater 14 is operated from the control signal of the control unit 60 according to the vacuum value of the deposition chamber 21, but the deposition chamber measured by the vacuum sensor 43 The first heater 12 and the second heater (if the vacuum value of (21) is less than or equal to the set value (40 to 50% higher than the minimum vacuum value required for the deposition operation) input on the control unit 60 ( The control signal is transmitted to 14).

That is, in the temperature heating step (S30), the first heater 12 and the second heater 14 only operate when the vacuum value in the deposition chamber 21 by the vacuum pump 23 is maintained at 10 to 100 mtorr or less. While operating, the vaporization furnace 11 is heated to a working temperature of 120 ~ 180 ℃ and the decomposition furnace 13 is heated to a heating temperature of 650 ~ 700 ℃.

In the temperature heating step S30, when the vacuum value in the deposition chamber 21 is maintained at 10 to 100 mtorr or less, the first heater 12 and the second heater 14 are sequentially formed from the controller 60. Control to run. That is, when a measurement signal of the vacuum value of the vacuum sensor 43 is detected to be 10 to 100 mtorr or less, the control unit 60 applies a control signal to the second heater 14 to work the decomposition furnace 13. The first heating is heated to a temperature of 650 ~ 700 ℃ (S31), when the temperature of the decomposition furnace 13 reaches a set value (500 ~ 700 ℃) or more in the first heater (12) A second control temperature is applied to the vaporization furnace 11 by heating a second temperature to 120 ~ 180 ℃ working temperature (S33).

In the cooling step (S40), after finishing the work in the deposition chamber 21, the heat of the elevated temperature of the vaporization furnace 11 and the decomposition furnace 13 to heat the set temperature in the preheating step (S10) It is cooled to (30-80 degreeC by vaporization, 100-600 degreeC by decomposition).

To summarize the features of the present invention, firstly, the equipment was simplified to the maximum, and the price of the equipment was greatly reduced, and it was succeeded in miniaturization so that it could be used on the office desk of a general store, and secondly, the user interface was simplified. In addition, the general public can easily operate it, and when the control part that requires skill is needed, the remote headquarters is designed for remote control. Since only experienced workers were able to control the equipment, it was able to completely overcome the areas where coating work was possible only in the workplace of a specialized company, and after a long period of research and development to purchase and handle this equipment even in the first general store. It's the first product specifically designed.

In the above, a room temperature chemical vapor deposition apparatus having a tubular filter trap according to the present invention, a remote control system, and a preferred embodiment of the deposition method have been described, but the present invention is not limited thereto. Various modifications can be made within the scope of the accompanying drawings, which also fall within the scope of the present invention.

Room temperature chemical vapor deposition apparatus for high-speed deposition having a tubular filter trap according to the present invention, and its remote control system and its deposition method are extremely compact so as to simplify the equipment as much as possible, greatly lowering the equipment price and placing it on the office desk of a general store. It is designed to simplify the user interface (UI) so that the general public can easily operate it and at the same time, it is designed to be remotely controlled from the headquarters when the control part that requires skill is needed. Waterproof coating or accessory product inside the smartphone There is industrial applicability in the field of thin film formation used for anti-discoloration coating of a film.

Claims

The dimer material, which is a chemical vapor deposition raw material, is introduced into the vaporization furnace in which the first heater is installed to vaporize the polymer dimer, and the dimer in the polymer state is connected to one side of the vaporization furnace. A heating unit configured to include a decomposition furnace in which a second heater is installed to decompose the monomer into a monomolecular form;

It is connected to one side by the decomposition of the heating unit is provided to accommodate the adherend therein to form a deposition space by vacuum so that the monomeric monomer in the form of gas supplied from the decomposition furnace can be deposited on the surface of the adherend A vacuum deposition unit comprising a deposition chamber and a vacuum pump driven to generate a vacuum in the deposition chamber;

A filter trap coupled to the vacuum pump and the deposition chamber in the vacuum deposition unit, the filter trap being configured to deposit and deposit excess monomers generated during the vacuum generation process and the deposition process according to the vacuum pump;

A temperature sensor provided in each of the vaporization furnace and the decomposition furnace, the temperature sensor being provided to measure individual temperatures, and a vacuum sensor installed in the deposition chamber and capable of measuring a vacuum value generated from the vacuum pump; Wealth;

A display window for displaying the temperature and the vacuum value measured by the temperature sensor and the vacuum sensor of the measuring unit, a plurality of power buttons for applying the pre-power and the main power to the vacuum pump as well as the operation of the first heater and the second heater of the heating unit A control box consisting of;

The control signal is applied to the first heater, the second heater, and the vacuum pump according to the measurement signals mounted in the control box and input from the temperature sensor and the vacuum sensor of the measurement unit, and set reference values for the temperature and the vacuum value. It includes a control unit that is possibly provided,

When the preliminary power is applied from the control box, the control unit preheats the first heater and the second heater to a set temperature, respectively, and controls the preheating state. Chemical vapor deposition apparatus.
The method according to claim 1,

Room temperature chemical vapor deposition apparatus for a high-speed deposition having a tubular filter trap characterized in that the evaporation path is formed extending in the longitudinal direction having a front and rear width.
The method according to claim 1,

Room temperature chemical vapor deposition apparatus having a tubular filter trap comprising a quartz tube detachably coupled inside the connecting passage interconnecting the vaporization furnace and the decomposition furnace.
The method according to claim 3,

Room temperature chemical vapor deposition apparatus for high-speed deposition having a tubular filter trap formed on one end of the quartz tube comprises a hook end extending outward to form a fallopian tube shape.
The method according to claim 3,

The vaporization furnace has a tubular filter trap having a tubular filter trap is provided on one side of the vaporization furnace to form a lid member to the inside of the vaporization furnace to facilitate the replacement coupling of the quartz tube at room temperature for high-speed deposition Chemical vapor deposition apparatus.
The method according to claim 1,

A room temperature chemical vapor deposition apparatus for high-speed deposition having a tubular filter trap further comprising a cooling fan installed on one side of the vaporization furnace and blowing toward the first heater to cool the vaporization furnace.
The method according to claim 6,

The control unit applies a control signal for changing the operation state to the cooling fan to maintain the cooling state when a signal indicating the operation stop of the equipment according to the end of the work as the vacuum value of the deposition chamber is dropped Room temperature chemical vapor deposition apparatus having a high speed deposition.
The method according to claim 6,

The control unit applies a control signal for changing the cooling fan to an operation stop state when a signal for shortly pressing the stop button of the power button of the control box is input, and a signal for long pressing the stop button of the power button of the control box is input. And a control signal for changing the cooling fan into a restarting state when the cooling fan is in operation, wherein the cooling fan is configured to manually set the cooling rate by the cooling fan.
The method according to claim 1,

The second heater of the decomposition furnace forms a gentle curve and the "∪" shape is zigzag repeatedly bent at room temperature chemical vapor deposition apparatus having a tubular filter trap, characterized in that formed.
The method according to claim 1,

The filter trap may have a trap shape in which a trap tube is connected between the deposition chamber and the vacuum pump so as to communicate with each other, and the monomers received in the trap tube and moved from the deposition chamber may precipitate. Room temperature chemical vapor deposition apparatus having a tubular filter trap comprising a filter member formed of a mesh of the high speed deposition.
The method according to claim 10,

The trap tube of the filter trap may include a first trap tube connected to one side of the deposition chamber, a second trap tube fastened to one end of the first trap tube and connected to the vacuum pump; Room temperature chemical vapor deposition apparatus having a tubular filter trap comprising a trap member for interconnecting the first trap tube and the second trap tube.
The method according to claim 11,

The filter member of the filter trap may include a first filter member provided inside the first trap tube and formed to induce deposition deposition first, and an inside of the second trap tube to provide the first filter member. Room temperature chemical vapor deposition apparatus having a tubular filter trap comprising a second filter member which is formed to induce deposition deposition secondary to the coarse monomer.
The method according to claim 12,

The filter member is composed of a non-metallic material selected from polyethylene, polypropylene, polyether, polyester, or is composed of a metallic material or a metal sintered product of copper, iron, aluminum, stainless steel, Density is 20 ~ 30ppi and the density of the second filter member is a room temperature chemical vapor deposition apparatus for a high-speed deposition having a tubular filter trap, characterized in that a 40 ~ 60ppi.
The method according to claim 1,

The control unit obtains replacement information for consumables for each of the heating unit, the vacuum deposition unit, and the filter trap, and applies a control signal to restart the equipment according to the input signal of the operator. Room temperature chemical vapor deposition equipment.
The method according to claim 1,

The control unit applies a control signal for changing the operating state to the first heater when the input signal of the preliminary power is applied from the control box to maintain the vaporization furnace at 30-80 ° C., which is a preheating set temperature. Room temperature chemical vapor deposition apparatus having a tubular filter trap for applying the control signal to the second heater to change the operating state to maintain the decomposition furnace to be heated to 100 ~ 600 ℃ preheating set temperature.
The method according to claim 1,

In the control unit, when the input signal of the main power is applied from the control box in the preheating state, the vacuum pump operates, but when the measured value input from the vacuum sensor is less than or equal to a set value (10 to 100 mtorr), the second heater and the first heating unit. And a control signal operating in a heated state is sequentially applied. When the temperature of the decomposition furnace by the second heater input from the temperature sensor reaches a set value (500 to 700 ° C.) or more, the first heating is performed. A room temperature chemical vapor deposition apparatus having a tubular filter trap configured to apply a control signal for operating the apparatus in a heated state to maintain a elevated temperature.
Drive information of the equipment input to the control unit, including measurement information on the temperature and vacuum value input from the measuring unit and mounted to the control unit of the high-temperature chemical vapor deposition apparatus having a tubular filter trap according to claim 1 to claim 16 An affiliate server configured to acquire a reader module, and an interface provided such that the reader module can be connected to a computer communication network;

A main server configured to receive measurement information and driving information obtained from the affiliated server in real time through a computer communication network, and to transmit the operating conditions of a device including a setting reference value to the affiliated server to be remotely controlled. Room temperature chemical vapor deposition apparatus remote control system for high speed deposition.
The method according to claim 17,

High speed expansion having a tubular filter trap between the affiliate server and the main server using a fixed type floating IP scheme for assigning a unique URL (uniform resource locator) through a dynamic domain name service (DDNS) configuration of the router. Wearing room temperature chemical vapor deposition remote control system.
The method according to claim 17,

The main server includes a main body unit having a storage medium and configured to be output on a monitor, and a high temperature chemical vapor deposition at room temperature for vapor deposition having a tubular filter trap from the affiliate server at each of a plurality of affiliate stores. A tubular filter trap comprising a control program configured to receive individual measurement information and driving information of a device and to output it on the monitor, wherein the control program is configured to transmit control signals for setting reference values of the affiliate server and operating conditions of the device. Room temperature chemical vapor deposition apparatus remote control system for high speed deposition.
The method according to claim 19,

The control program receives a signal from the affiliate server and stores information on each store in the affiliated store "store name, equipment status and vacuum status, processing elapsed time, vaporization furnace temperature and decomposition furnace temperature, vacuum value, contact point, temperature and vacuum degree communication. And a main screen window which is provided to collectively output on one screen of the monitor for each separated list such as "status display", and to output on the screen of the monitor so that detailed information for each list of the main screen window can be checked. Room temperature chemical vapor deposition apparatus remote control system having a tubular filter trap including a detail window.
The method of claim 20,

The main screen window includes an additional function tab for performing additional functions,

The additional function tab includes a monitor stop tab for disconnecting transmission / reception of data, a setting tab for changing setting conditions for data reception amount, a list management tab for monitoring operation status of each store, an alarm occurrence and a text in case of equipment failure. Room temperature chemical vapor deposition apparatus remote control system for high-speed deposition having a tubular filter trap comprising an alarm tap for transmitting a message.
The method of claim 20,

The detail screen window comprises an information screen related to the "working state of the vaporization furnace and decomposition furnace, the deposition chamber", including the "current operation state" of the equipment for the store when selecting the "store name" from the list of the main screen window A room temperature chemical vapor deposition apparatus remote control system having a tubular filter trap consisting of four split screens on the screen of the monitor.
The method according to claim 22,

Remote control of a room temperature chemical vapor deposition apparatus for high-speed deposition with a tubular filter trap configured to set whether to "check the working status and change the equipment control conditions" of the corresponding store by selecting the "presence operation state" from the list of the detailed screen window system.
The method according to claim 19,

The mobile application program is provided to be downloaded to the storage medium of the mobile terminal and configured to check the operation status and operation status of the equipment by transmitting / receiving information online in real time through a communication connected to the control program of the main server via a network. Room temperature chemical vapor deposition apparatus remote control system for high-speed deposition having a tubular filter trap further comprising.
The method of claim 24,

The mobile application program is installed on the terminal of the head office manager and is always configured to receive the operation status information of each store equipment controlled by the control program of the main server and configured to be able to send a text message about the abnormal information of the equipment Characters related to the presence or absence of an abnormality received from the main application program can be received by the application program, the operation status of the corresponding store equipment installed in the terminal of the merchant owner or manager of the store and controlled by the control program of the main server. A room temperature chemical vapor deposition apparatus remote control system for rapid deposition with a tubular filter trap comprising an application program for affiliates configured to identify messages.
In order to polymerize the chemical vapor deposition material on the surface of the adherend to form a coating film for waterproofing, insulation or discoloration prevention, the vaporization furnace and the decomposition furnace are heated from the first and second heaters to vaporize and decompose the chemical vapor deposition material, and vacuum In the room temperature chemical vapor deposition method of maintaining a vacuum chamber inside the deposition chamber from the pump to deposit a monomer which is a chemical vapor deposition material to the deposition agent located in the deposition chamber,

By operating a preliminary power supply from a control box, the first heater and the second heater are operated, and the temperatures of the vaporization furnace and the decomposition furnace are measured from a temperature sensor, respectively, but preheated to a predetermined set temperature on a control unit. Preheating;

Operating a main power source from the control box while the vaporization furnace and the decomposition furnace are preheated to operate the vacuum pump to generate a vacuum while measuring a vacuum from a vacuum sensor in the deposition chamber;

Operating the first heater and the second heater when the vacuum value of the deposition chamber is equal to or lower than a set value input to the controller, and heating the vaporization furnace and the decomposition furnace to a temperature capable of chemical vapor deposition, respectively; ;

Cooling the heat of the elevated temperature of the vaporization furnace and the decomposition furnace after the operation in the deposition chamber to the set temperature in the preheating step; Room temperature chemistry for high-speed deposition having a tubular filter trap comprising a Vapor deposition method.
The method of claim 26,

In the preheating step, the set temperature of the vaporization furnace is heated to maintain 30 ~ 80 ℃, the set temperature of the decomposition furnace is heated to maintain the set temperature of 100 ~ 600 ℃ room temperature for high-speed deposition having a tubular filter trap. Chemical vapor deposition method.
The method of claim 26,

In the temperature heating step, the first heater and the second heater are sequentially operated only when the vacuum value in the deposition chamber by the vacuum pump is 10 to 100 mtorr or less, and the control unit applies a control signal to the second heater. First heating the decomposing furnace to a working temperature of 650 ~ 700 ℃, and when the temperature of the decomposition furnace reaches a set value (500 ~ 700 ℃) or more, the control unit applies a control signal to the first heater Room temperature chemical vapor deposition method for high-speed deposition having a tubular filter trap, characterized in that for heating the vaporization furnace at a temperature of 120 ~ 180 ℃ the secondary temperature.