WO2014201951A1 - 一种三自由度外差光栅干涉仪位移测量系统 - Google Patents

一种三自由度外差光栅干涉仪位移测量系统 Download PDF

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Publication number
WO2014201951A1
WO2014201951A1 PCT/CN2014/079227 CN2014079227W WO2014201951A1 WO 2014201951 A1 WO2014201951 A1 WO 2014201951A1 CN 2014079227 W CN2014079227 W CN 2014079227W WO 2014201951 A1 WO2014201951 A1 WO 2014201951A1
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grating
measurement
interferometer
measuring
dual
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English (en)
French (fr)
Inventor
朱煜
王磊杰
张鸣
刘召
成荣
杨开明
徐登峰
叶伟楠
张利
赵彦坡
秦慧超
田丽
张金
尹文生
穆海华
胡金春
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Tsinghua University
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Tsinghua University
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Priority to US14/900,111 priority Critical patent/US9903704B2/en
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02022—Interferometers characterised by the beam path configuration contacting one object by grazing incidence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Definitions

  • the invention relates to a grating measuring system, in particular to a three-degree-of-freedom heterodyne grating interferometer measuring system.
  • the grating measuring system is widely used in many electromechanical devices.
  • the measurement principle of the grating measurement system is mainly based on the principle of moiré fringe and the principle of diffraction interference.
  • the grating measuring system based on the Moire fringe principle has become the first choice for displacement measurement of many electromechanical devices due to its long distance measurement, low cost and easy assembly.
  • the accuracy is usually on the order of micrometers. For general industrial applications.
  • a lithography machine in semiconductor manufacturing equipment is a key device in the fabrication of semiconductor chips.
  • the ultra-precision workpiece stage is the core subsystem of the lithography machine, which is used to carry the high-speed ultra-precision step-scan motion by carrying the mask and the silicon wafer.
  • the ultra-precision workpiece table is the most representative type of ultra-precision motion system with its high speed, high acceleration, large stroke, ultra-precision, multi-degree of freedom and other motion characteristics.
  • the ultra-precision workpiece stage usually uses a dual-frequency laser interferometer measurement system to measure the multi-degree of freedom displacement of the ultra-precision workpiece table.
  • the dual-frequency laser interferometer is difficult to improve due to environmental sensitivity, measurement speed, large space occupation, high price, and poor dynamic characteristics of the measurement target workpiece table.
  • a series of problems make it difficult to meet higher measurement needs.
  • US2010/0321665 A1 (Publication Date December 23, 2010), which mainly utilizes one-dimensional Or a two-dimensional plane grating with a readhead to measure the horizontal large stroke displacement of the workpiece table.
  • the vertical displacement measurement uses sensors such as eddy current or interferometer, but the application of various sensors limits the measurement accuracy of the workpiece table.
  • US Patent Publication No. US2011/0255096 A1 (Publication Date, October 20, 2011) discloses a grating measuring system applied to a lithography machine ultra-precision workpiece stage, which also uses a one-dimensional or two-dimensional grating to match a specific The reading head realizes the displacement measurement, and the horizontal and vertical displacement measurement can be performed simultaneously, but the structure is complicated;
  • US2011/0096334 A1 discloses a heterodyne interferometer.
  • a grating is used as the target mirror in the interferometer, but the interferometer can only achieve one-dimensional measurement.
  • Japanese scholar GA0WEI proposed a single frequency two using the principle of diffraction interference in the research paper "Design and construction of a two_degree_of-freedom l inear encoder for nanometric measurement of stage position and straightness.
  • Precision Engineering 34 (2010) 145-155" Dimensional grating measurement system which can measure horizontal and vertical displacement at the same time, but because of the single-frequency laser, the measurement signal is susceptible to interference, and the accuracy is difficult to guarantee.
  • a heterodyne grating interferometer measuring system using the principle of optical beat frequency is sought, which can realize simultaneous measurement of three linear degrees of freedom displacement; the measuring system measures short optical path and environmental sensitivity Low, measurement signal is easy to handle, resolution and accuracy can reach sub-nanometer or even higher; at the same time, the grating interferometer measurement system also has the advantages of simple structure, small size, light weight, easy installation and convenient application.
  • the measurement system is used as the ultra-precision workpiece table displacement measuring device, which can effectively reduce the shortage of the laser interferometer measuring system in the ultra-precision workpiece table application, and improve the performance of the ultra-precision workpiece table of the lithography machine.
  • the three-degree-of-freedom heterodyne grating interferometer displacement measuring system can also be applied to precision measurement of multi-degree-of-freedom displacement of a workpiece table of a precision machine tool, a coordinate measuring machine, a semiconductor detecting device, and the like.
  • a three-degree-of-freedom heterodyne grating interferometer displacement measuring system comprising: a dual-frequency laser, a grating interferometer, a measuring grating, four receivers and an electronic signal processing component;
  • the grating interferometer comprises a polarization beam splitter, a reference grating (22) a first refractive element and a second refractive element; wherein the reference grating and the measurement grating each adopt a two-dimensional reflective grating;
  • the dual-frequency laser emits a dual-frequency orthogonally polarized laser beam, which is incident on the polarization beam splitter after being coupled to the polarization beam splitter, and the transmitted light is the reference light, and the reflected light is the measurement light;
  • the reference light is incident on the reference grating to generate four diffractive reflected reference lights, and the four reference beams are deflected by the first refractive element to form four parallel reference beams, and the four parallel reference beams are retroreflected to the polarizing beam splitter and transmitted;
  • the measuring light is incident on the measuring grating to generate four diffractive reflected measuring lights, and the four measuring lights are deflected by the second refractive element to form four parallel measuring lights, and the four parallel measuring lights are retroreflected to the polarizing beam splitter and reflected;
  • the four transmitted reference light and the four reflected light are respectively combined to form four measuring optical signals, and the four measuring optical signals are respectively transmitted through optical fibers to four receivers for processing to form four measuring electrical signals, and four measuring electrical signals.
  • the signal is input to an electronic signal processing unit for processing;
  • the dual-frequency laser also outputs a reference electrical signal to the electronic signal processing component.
  • the electronic signal processing component outputs a three-degree-of-freedom linearity. Displacement.
  • Both the first refractive element and the second refractive element described in the present invention employ two right-angle prisms in the xoy plane and two right-angle prisms integrated in the XOZ plane.
  • Both the first refractive element and the second refractive element described in the present invention employ a lens.
  • the preferred technical solution of the present invention is: the receiver and the electronic signal processing component are integrated into an integrated structure, and the four-way measurement optical signal and the one-way reference electrical signal output by the dual-frequency laser are input to the integrated structure for processing, The linear motion displacement of the xy direction and the z-direction three degrees of freedom is output.
  • the three-degree-of-freedom heterodyne grating interferometer displacement measuring system has the following advantages and outstanding effects - the measuring system can realize simultaneous measurement of three linear degrees of freedom displacement; the measuring system measures short optical path and environmental sensitivity Low performance, easy to process measurement signals, resolution and accuracy up to sub-nanometer or higher; and the grating interferometer measurement system
  • the system also has the advantages of simple structure, small size, light weight, easy installation and convenient application. It is applied to the displacement measurement of the ultra-precision workpiece table of the lithography machine. Compared with the measurement system of the laser interferometer, the volume and quality of the workpiece table can be effectively reduced, and the dynamic performance of the workpiece table can be greatly improved. Comprehensive performance improvement.
  • the three-degree-of-freedom heterodyne grating interferometer displacement measuring system can also be applied to precision measurement of multi-degree-of-freedom displacement of a workpiece table of a precision machine tool, a coordinate measuring machine, a semiconductor detecting device, and the like.
  • FIG. 1 is a schematic diagram of a displacement measuring system of a first heterodyne grating interferometer of the present invention.
  • FIG. 2 is a schematic view showing the internal structure of the first grating interferometer of the present invention.
  • FIG. 3 is a schematic diagram of a displacement measuring system of a second heterodyne grating interferometer of the present invention.
  • FIG. 4 is a schematic view showing the internal structure of a second grating interferometer of the present invention.
  • 1 dual-frequency laser 2 grating interferometer, 3 measuring grating, 4 receiver, 5 electronic signal processing components, 6 integrated structure; 21 polarizing beam splitter, 22 reference grating, 23 refractive prism, 24 - lens.
  • FIG. 1 is a schematic diagram of a displacement measuring system of a first heterodyne grating interferometer according to the present invention.
  • the three-degree-of-freedom heterodyne grating interferometer displacement measuring system comprises a dual-frequency laser 1, a grating interferometer 2, a measuring grating 3, a receiver 4, an electronic signal processing component 5, and the measuring grating 3 is a two-dimensional reflection.
  • Type grating is a two-dimensional reflection.
  • FIG. 2 is a schematic diagram showing the internal structure of the first grating interferometer of the present invention.
  • the grating interferometer 2 includes a polarization beam splitter 21, a reference grating 22, a first refractive element, and a second refractive element.
  • the reference grating 22 is a two-dimensional reflective grating, and the first refractive element and the second refractive element are both located at xoy.
  • the two right-angle prisms of the plane and the two right-angle prisms of the through plane are integrated with the refractive prisms 23.
  • the dual-frequency laser 1 emits a dual-frequency orthogonally polarized laser light, which is incident on the polarization beam splitter 21 after being coupled to the polarization beam splitter 21, and the transmitted light is the reference light, and the reflected light is the measurement light;
  • the reference grating 22 four diffractive reflected reference lights are generated, and the four reference beams are deflected by the refractive prism 23 to form four parallel reference beams, and the four parallel reference beams are retroreflected to the polarizing beam splitter 21 for transmission;
  • the measuring light is incident to Four gratings of diffracted reflection measurement light are generated after the grating 3 is measured, and four beams of measurement light are deflected by the refractive prism 23 to form four parallel measurement lights, and four parallel measurement lights are retroreflected to the polarization beam splitter 21 for reflection;
  • four beams of transmitted reference light and The four beam reflection measuring lights are respectively combined to form four measuring optical signals, and the four measuring
  • the processing component 5 performs processing; the dual-frequency laser 1 also outputs a beam of reference electrical signals to the electronic signal processing component 5; 3 with respect to the grating interferometer 2 and z-direction to make xy (z motion to a minute, range of motion about LMM) during linear movement of three degrees of freedom, the electronic signal processing section 5 outputs the three degrees of freedom of linear displacement.
  • FIG. 3 is a schematic diagram of a displacement measuring system for a second heterodyne grating interferometer according to the present invention.
  • the receiver 4 and the electronic signal processing unit 5 are integrated into an integrated structure 6, and the four-way measurement optical signal and one reference electrical signal output from the dual-frequency laser are input to the integrated structure 6.
  • the xy direction and the z-direction three-degree-of-freedom linear motion displacement are output.
  • the measurement system adopts this integrated structure 6 to effectively reduce the number of system components, improve the system's anti-interference ability, and improve system integration.
  • FIG. 4 is a schematic diagram showing the internal structure of a second grating interferometer according to the present invention.
  • the first refraction element and the second refraction element in the internal structure of the grating interferometer employ a lens 24.
  • the lens 24 Compared with the refractive prism 23, the lens 24 has the advantages of simple structure, easy processing, and easy installation.
  • the three-degree-of-freedom heterodyne grating interferometer displacement measuring system can also be applied to precision measurement of multi-degree-of-freedom displacement of a workpiece table such as a precision machine tool, a coordinate measuring machine, and a semiconductor detecting device.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)

Abstract

一种三自由度外差光栅干涉仪位移测量系统，包括双频激光器（1）、光栅干涉仪（2）、测量光栅（3）、接收器（4）、电子信号处理部件（5）；光栅干涉仪（2）包括偏振分光镜（21）、参考光栅（22）、折光元件（23，24）；该测量系统基于光栅衍射、光学多普勒效应和光学拍频原理实现位移测量。双频激光器（1）出射的双频激光入射至光栅干涉仪（2）、测量光栅（3）后输出四路光信号至接收器（4），后至电子信号处理部件（5）。当光栅干涉仪（2）与测量光栅（3）做三自由度线性相对运动时，系统可输出三个线性位移。该测量系统能够实现亚纳米甚至更高分辨率及精度，且能够同时测量三个线性位移。该测量系统具有对环境不敏感、测量精度高、体积小、质量轻等优点，作为光刻机超精密工件台位置测量系统可提升工件台综合性能。

Description

一种三自由度外差光栅干涉仪位移测量系统
技术领域
本发明涉及一种光栅测量系统， 特别涉及一种三自由度外差光栅干涉仪测量系统。
背景技术
光栅测量系统作为一种典型的位移传感器广泛应用于众多机电设备。 光栅测量系统的测 量原理主要基于莫尔条纹原理和衍射干涉原理。 基于莫尔条纹原理的光栅测量系统作为一种 发展成熟的位移传感器以其测距长、 成本低、 易于装调等众多优点成为众多机电设备位移测 量的首选， 但精度通常在微米量级， 常见于一般工业应用。
半导体制造装备中的光刻机是半导体芯片制作中的关键设备。 超精密工件台是光刻机的 核心子系统， 用于承载掩模板和硅片完成高速超精密步进扫描运动。超精密工件台以其高速、 高加速、 大行程、 超精密、 多自由度等运动特点成为超精密运动系统中最具代表性的一类系 统。 为实现上述运动， 超精密工件台通常采用双频激光干涉仪测量系统测量超精密工件台多 自由度位移。 然而随着测量精度、 测量距离、 测量速度等运动指标的不断提高， 双频激光干 涉仪以环境敏感性、 测量速度难以提高、 占用空间大、 价格昂贵、 测量目标工件台动态特性 差等存在的一系列问题， 从而难以满足更高的测量需求。
针对上述问题， 世界上超精密测量领域的各大公司及研究机构展开了一系列的研究， 研 究主要集中于基于衍射干涉原理的光栅测量系统， 研究成果在诸多专利论文中均有揭露。 美 国专利文献 US7, 102, 729 B2 (公开日 2005年 8月 4日）、 US7, 483， 120 B2 (公开日 2007年 11月 15 日）、 US7, , 940, 392 B2 (公开日 2009年 12月 24 日）、 公开号 US2010/0321665 A1 (公开日 2010年 12月 23日）公开了一种应用于光刻机超精密工件台的平面光栅测量系统及 布置方案， 该测量系统主要利用一维或二维的平面光栅配合读数头测量工件台水平大行程位 移， 垂直方向位移测量采用电涡流或干涉仪等传感器， 但多种传感器的应用限制工件台测量 精度。 美国专利文献公开号 US2011/0255096 A1 (公开日 2011年 10月 20日） 公开了一种应 用于光刻机超精密工件台的光栅测量系统， 该测量系统亦采用一维或二维光栅配合特定的读 数头实现位移测量， 可同时进行水平向和垂向位移测量， 但结构复杂； 美国专利文献公开号 US2011/0096334 A1 (公开日 2011年 4月 28日） 公开了一种外差干涉仪， 该干涉仪中采用光 栅作为目标镜， 但该干涉仪仅能实现一维测量。 日本学者 GA0WEI 在研究论文 "Design and construction of a two_degree_of—freedom l inear encoder for nanometric measurement of stage position and straightness. Precision Engineering 34 (2010) 145-155 " 中提出 了一种利用衍射干涉原理的单频二维光栅测量系统， 该光栅测量系统可同时实现水平和垂直 向的位移测量， 但由于采用单频激光， 测量信号易受干扰， 精度难以保证。 中国专利文献申 请号 201210449244. 9 (申请日 2012年 11月 09日） 及 201210448734· 7 (申请日 2012年 11 月 09日）分别公开了一种外差光栅干涉仪测量系统， 两种干涉仪测量系统中的读数头结构中 均采用了四分之一波片用于改变光束的偏振态， 光学结构复杂， 同时光学元件的非理想性将 导致测量误差。
发明内容
考虑到上述技术方案的局限， 寻求一种利用光学拍频原理的外差光栅干涉仪测量系统， 该测量系统能够实现三个线性自由度位移的同时测量； 该测量系统测量光路短、 环境敏感性 低、 测量信号易于处理， 分辨率与精度可达亚纳米甚至更高； 同时该光栅干涉仪测量系统还 具有结构简洁、 体积小、 质量轻、 易于安装、 方便应用等优点。 采用该测量系统作为超精密 工件台位移测量装置， 能够有效的降低激光干涉仪测量系统在超精密工件台应用中的不足， 使光刻机超精密工件台性能提升。 该三自由度外差光栅干涉仪位移测量系统还可应用于精密 机床、 三坐标测量机、 半导体检测设备等的工件台多自由度位移的精密测量。
本发明的技术方案如下：
一种三自由度外差光栅干涉仪位移测量系统， 其特征在于： 包括双频激光器、 光栅干涉 仪、测量光栅、四个接收器和电子信号处理部件；光栅干涉仪包括偏振分光镜、参考光栅（22)、 第一折光元件和第二折光元件； 所述的参考光栅、 测量光栅均采用二维反射型光栅；
双频激光器出射双频正交偏振激光经光纤耦合入射至偏振分光镜后分光， 透射光为参考 光， 反射光为测量光；
所述参考光入射至参考光栅后产生四束衍射反射参考光， 四束参考光经第一折光元件后 偏转形成四束平行参考光， 四束平行参考光回射至偏振分光镜后透射；
所述测量光入射至测量光栅后产生四束衍射反射测量光， 四束测量光经第二折光元件后 偏转形成四束平行测量光， 四束平行测量光回射至偏振分光镜后反射；
四束透射参考光和四束反射测量光分别两两重合形成四路测量光信号， 四路测量光信号 分别经光纤传输至四个接收器进行处理分别形成四路测量电信号， 四路测量电信号输入至电 子信号处理部件进行处理；
双频激光器同时也输出一束参考电信号至电子信号处理部件； 当测量光栅相对于光栅干 涉仪做 xy向和 z向三个自由度的线性运动时， 电子信号处理部件将输出三自由度线性位移。
本发明中所述的第一折光元件和第二折光元件均采用位于 xoy平面的两个直角棱镜和位 于 XOZ平面的两个直角棱镜集成的折光棱镜。
本发明中所述的第一折光元件和第二折光元件均采用透镜。
本发明优选技术方案是： 所述的接收器与电子信号处理部件集成为一体化结构， 所述的 四路测量光信号和双频激光器输出的一路参考电信号输入至一体化结构进行处理后， 输出 xy 向和 z向三自由度线性运动位移。
本发明所提供的一种三自由度外差光栅干涉仪位移测量系统具有以下优点及突出性效 果- 该测量系统能够实现三个线性自由度位移的同时测量； 该测量系统测量光路短、 环境敏 感性低、 测量信号易于处理， 分辨率与精度可达亚纳米甚至更高； 同时该光栅干涉仪测量系 统还具有结构简洁、 体积小、 质量轻、 易于安装、 方便应用等优点。 应用于光刻机超精密工 件台的位移测量， 对比激光干涉仪测量系统， 在满足测量需求的基础上， 可有效的降低工件 台体积、 质量， 大大提高工件台的动态性能， 使工件台整体性能综合提高。 该三自由度外差 光栅干涉仪位移测量系统还可应用于精密机床、 三坐标测量机、 半导体检测设备等的工件台 多自由度位移的精密测量中。
附图说明
图 1为本发明第一种外差光栅干涉仪位移测量系统示意图。
图 2为本发明第一种光栅干涉仪内部结构示意图。
图 3为本发明第二种外差光栅干涉仪位移测量系统示意图。
图 4为本发明第二种光栅干涉仪内部结构示意图。
图中， 1 双频激光器， 2 光栅干涉仪， 3 测量光栅， 4 接收器， 5 电子 信号处理部件， 6 一体化结构； 21 偏振分光镜， 22 参考光栅， 23 折光棱镜， 24——透镜。
具体实施方式
下面结合附图对本发明的结构、 原理和具体实施方式作进一步地详细描述。
请参考图 1， 图 1为本发明第一种外差光栅干涉仪位移测量系统示意图。 如图 1所示， 该三自由度外差光栅干涉仪位移测量系统包括双频激光器 1、 光栅干涉仪 2、 测量光栅 3、 接 收器 4、 电子信号处理部件 5， 测量光栅 3为二维反射型光栅。
请参考图 2， 图 2为本发明第一种光栅干涉仪内部结构示意图。 所述的光栅干涉仪 2包 括偏振分光镜 21、 参考光栅 22、 第一折光元件、 第二折光元件， 参考光栅 22为二维反射型 光栅， 第一折光元件和第二折光元件均采用位于 xoy平面的两个直角棱镜和位于通平面的 两个直角棱镜集成的折光棱镜 23。
结合图 1、 图 2阐述测量系统原理， 双频激光器 1出射双频正交偏振激光经光纤耦合入 射至偏振分光镜 21后分光， 透射光为参考光， 反射光为测量光； 参考光入射至参考光栅 22 后产生四束衍射反射参考光， 四束参考光经折光棱镜 23后偏转形成四束平行参考光， 四束平 行参考光回射至偏振分光镜 21后透射；所述测量光入射至测量光栅 3后产生四束衍射反射测 量光， 四束测量光经折光棱镜 23后偏转形成四束平行测量光， 四束平行测量光回射至偏振分 光镜 21后反射； 四束透射参考光和四束反射测量光分别两两重合形成四路测量光信号， 四路 测量光信号分别经光纤传输至四个接收器 4进行处理分别形成四路测量电信号， 四路测量电 信号输入至电子信号处理部件 5进行处理； 双频激光器 1同时也输出一束参考电信号至电子 信号处理部件 5; 当测量光栅 3相对于光栅干涉仪 2做 xy向和 z向 （z向为微小运动， 运动 范围约 lmm) 三个自由度的线性运动时， 电子信号处理部件 5将输出三自由度线性位移。
三自由度运动位移的表达式为 x=kxX (α -β)、 y= kyX (γ- δ ) , z=kzX (α +β + γ + δ ) , kx=Ax/43i， k = Ay/4 n , kz= λ /4 ( 1+cos Θ ) ，式中 α、 β、 γ、 δ为电子信号处理卡的读数 值， Λχ、 Ay为光栅常数， λ为激光波长， Θ为光栅衍射角， 取Λx=Λϊ=l μm， λ=632.8nm, α、 β、 γ、 δ的相位分辨率为 2 π /1024， 外差光栅干涉仪的 x、 y和 ζ的测量分辨率分别 为 0. 49nm、 0. 49nm禾卩 0· 18nm。
请参考图 3， 图 3为本发明第二种外差光栅干涉仪位移测量系统示意图。 如图 3所示， 所述的接收器 4与电子信号处理部件 5集成为一体化结构 6， 所述的四路测量光信号和双频 激光器输出的一路参考电信号输入至一体化结构 6进行处理后，输出 xy向和 z向三自由度线 性运动位移。 测量系统采用这种一体化结构 6可有效的减少系统部件数量， 提高系统的抗干 扰能力， 提高系统集成性。
请参考图 4， 图 4为本发明第二种光栅干涉仪内部结构示意图。 如图 4所示， 光栅干涉 仪内部结构中的第一折光元件和第二折光元件均采用透镜 24。 对比折光棱镜 23， 透镜 24具 有结构简洁、 易于加工、 便于安装等优点。
上述实施方式中给出的测量系统及结构方案能够实现三个线性自由度位移的同时测量； 且系统测量光路短、 环境敏感性低、 测量信号易于处理， 分辨率与精度可达亚纳米甚至更高； 同时该光栅干涉仪测量系统还具有结构简洁、 体积小、 质量轻、 易于安装、 方便应用等优点。 应用于光刻机超精密工件台的位移测量， 对比激光干涉仪测量系统， 在满足测量需求的基础 上， 可有效的降低工件台体积、 质量， 大大提高工件台的动态性能， 使工件台整体性能综合 提高。 该三自由度外差光栅干涉仪位移测量系统还可应用于精密机床、 三坐标测量机、 半导 体检测设备等的工件台多自由度位移的精密测量中。

Claims

权 利 要 求 书
1.一种三自由度外差光栅干涉仪位移测量系统， 其特征在于： 包括双频激光器 （1 )、 光 栅干涉仪 （2)、 测量光栅 （3)、 四个接收器 （4)和电子信号处理部件 （5 ); 光栅干涉仪 （2 ) 包括偏振分光镜（21 )、参考光栅（22)、第一折光元件和第二折光元件；所述的参考光栅（22)、 测量光栅 （3 ) 均采用二维反射型光栅；
双频激光器（1 ) 出射双频正交偏振激光经光纤耦合入射至偏振分光镜（21 )后分光， 透 射光为参考光， 反射光为测量光；
所述参考光入射至参考光栅 （22 ) 后产生四束衍射反射参考光， 四束参考光经第一折光 元件后偏转形成四束平行参考光， 四束平行参考光回射至偏振分光镜 （21 ) 后透射；
所述测量光入射至测量光栅（3 )后产生四束衍射反射测量光， 四束测量光经第二折光元 件后偏转形成四束平行测量光， 四束平行测量光回射至偏振分光镜 （21 ) 后反射；
四束透射参考光和四束反射测量光分别两两重合形成四路测量光信号， 四路测量光信号 分别经光纤传输至四个接收器（4)进行处理分别形成四路测量电信号， 四路测量电信号输入 至电子信号处理部件 （5 ) 进行处理；
双频激光器（1 ) 同时也输出一束参考电信号至电子信号处理部件（5 ); 当测量光栅（3 ) 相对于光栅干涉仪（2 )做 xy向和 z向三个自由度的线性运动时， 电子信号处理部件 （5 )将 输出三自由度线性位移。
2.根据权利要求 1所述的一种三自由度外差光栅干涉仪位移测量系统， 其特征在于： 所 述的第一折光元件和第二折光元件均采用位于 xoy平面的两个直角棱镜和位于通平面的两 个直角棱镜集成的折光棱镜 （23)。
3. 根据权利要求 1所述的一种三自由度外差光栅干涉仪位移测量系统， 其特征在于： 所 述的第一折光元件和第二折光元件均采用透镜 （24)。
4.根据权利要求 1-3任一权力要求所述的一种三自由度外差光栅干涉仪位移测量系统， 其特征在于： 所述的接收器 （4) 与电子信号处理部件 （5 ) 集成为一体化结构 （6)， 所述的 四路测量光信号和双频激光器输出的一路参考电信号输入至一体化结构（6 )进行处理后， 输 出 xy向和 z向三自由度线性运动位移。
PCT/CN2014/079227 2013-06-19 2014-06-05 一种三自由度外差光栅干涉仪位移测量系统 Ceased WO2014201951A1 (zh)

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